GB2155650B - Method and apparatus for exposure - Google Patents

Method and apparatus for exposure

Info

Publication number
GB2155650B
GB2155650B GB08503115A GB8503115A GB2155650B GB 2155650 B GB2155650 B GB 2155650B GB 08503115 A GB08503115 A GB 08503115A GB 8503115 A GB8503115 A GB 8503115A GB 2155650 B GB2155650 B GB 2155650B
Authority
GB
United Kingdom
Prior art keywords
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08503115A
Other versions
GB8503115D0 (en
GB2155650A (en
Inventor
Hiroshi Echizen
Akiyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP59024282A external-priority patent/JPH0758678B2/en
Priority claimed from JP59024283A external-priority patent/JPS60170237A/en
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8503115D0 publication Critical patent/GB8503115D0/en
Publication of GB2155650A publication Critical patent/GB2155650A/en
Application granted granted Critical
Publication of GB2155650B publication Critical patent/GB2155650B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB08503115A 1984-02-14 1985-02-07 Method and apparatus for exposure Expired GB2155650B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59024282A JPH0758678B2 (en) 1984-02-14 1984-02-14 Exposure equipment
JP59024283A JPS60170237A (en) 1984-02-14 1984-02-14 Method for exposure

Publications (3)

Publication Number Publication Date
GB8503115D0 GB8503115D0 (en) 1985-03-13
GB2155650A GB2155650A (en) 1985-09-25
GB2155650B true GB2155650B (en) 1988-11-16

Family

ID=26361778

Family Applications (2)

Application Number Title Priority Date Filing Date
GB08503115A Expired GB2155650B (en) 1984-02-14 1985-02-07 Method and apparatus for exposure
GB08719915A Expired GB2192467B (en) 1984-02-14 1987-08-24 Method and apparatus for exposure

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB08719915A Expired GB2192467B (en) 1984-02-14 1987-08-24 Method and apparatus for exposure

Country Status (2)

Country Link
DE (1) DE3504938A1 (en)
GB (2) GB2155650B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106933040A (en) * 2015-12-30 2017-07-07 上海微电子装备有限公司 Litho machine splices illuminator and its method of adjustment

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2155647B (en) * 1984-02-01 1988-12-21 Canon Kk Exposure method and apparatus
GB2196132B (en) * 1984-02-01 1988-12-21 Canon Kk Exposure method and apparatus
US4804978A (en) * 1988-02-19 1989-02-14 The Perkin-Elmer Corporation Exposure control system for full field photolithography using pulsed sources
US5266445A (en) * 1991-10-31 1993-11-30 Intel Corporation Method of selectively irradiating a resist layer using radiation pulses
JPH06260384A (en) * 1993-03-08 1994-09-16 Nikon Corp Method for controlling amount of exposure
US6700950B1 (en) * 2002-10-31 2004-03-02 Inficon Lt Inc. Methods and systems for controlling critical dimension (CD) error
TWI240852B (en) * 2004-01-08 2005-10-01 Powerchip Semiconductor Corp Photolithograph system with variable shutter and method of using the same
JP6337757B2 (en) 2014-01-20 2018-06-06 東京エレクトロン株式会社 Exposure apparatus, resist pattern forming method, and storage medium
CN107145043A (en) * 2017-07-11 2017-09-08 上海镭慎光电科技有限公司 The exposure device and exposure method of silicon chip alignment mark

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4255046A (en) * 1979-09-19 1981-03-10 Xerox Corporation Variable output power supply for flash unit
JPS57198631A (en) * 1981-05-29 1982-12-06 Ibm Exposing method and device
JPS58100843A (en) * 1981-12-11 1983-06-15 Minolta Camera Co Ltd Light source device for exposure
GB2155647B (en) * 1984-02-01 1988-12-21 Canon Kk Exposure method and apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106933040A (en) * 2015-12-30 2017-07-07 上海微电子装备有限公司 Litho machine splices illuminator and its method of adjustment
CN106933040B (en) * 2015-12-30 2019-11-26 上海微电子装备（集团）股份有限公司 Litho machine splices lighting system and its method of adjustment

Also Published As

Publication number Publication date
GB8719915D0 (en) 1987-09-30
GB8503115D0 (en) 1985-03-13
DE3504938A1 (en) 1985-08-14
GB2192467A (en) 1988-01-13
DE3504938C2 (en) 1992-05-21
GB2192467B (en) 1988-11-16
GB2155650A (en) 1985-09-25

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20050206