CN106933040B - Litho machine splices lighting system and its method of adjustment - Google Patents
Litho machine splices lighting system and its method of adjustment Download PDFInfo
- Publication number
- CN106933040B CN106933040B CN201511022036.0A CN201511022036A CN106933040B CN 106933040 B CN106933040 B CN 106933040B CN 201511022036 A CN201511022036 A CN 201511022036A CN 106933040 B CN106933040 B CN 106933040B
- Authority
- CN
- China
- Prior art keywords
- visual field
- unit
- lighting system
- field
- adjustment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention discloses a kind of litho machine splicing lighting system and its methods of adjustment, litho machine splicing lighting system includes: along lighting unit, multiple light intensity transmitance adjusting means, multiple groups unit object lens, field stop and the luminous intensity measurement sensor being mounted on substrate motion platform that optical propagation direction is set gradually, and the field stop is adjustable field stop.The present invention does not need the adjustment for adjusting the field positions that more camera lens litho machine real estates can be realized in any eyeglass for participating in imaging, easy to operate, adjusting is quick by the way that adjustable field stop is arranged.
Description
Technical field
The present invention relates to IC manufacturing field, in particular to a kind of litho machine splicing lighting system and its adjustment side
Method.
Background technique
In flat display field, for substrate area by constantly expanding from generation to generation, litho machine need to provide big exposure field to guarantee
High yield.The visual field that exposes completely can be formed by multiple lesser unit objective angular fields are combined and spliced, by mask images and apply matrix
Exposure is realized in the synchronous scanning campaign of plate.Correspondingly, there is also multiple cell illuminations and the sides of illumination splicing for lighting system
Case demand, the scheme of splicing often bring the light intensity uniformity problem between cell illumination, influence the consistency for finally exposing line width,
In the splicing regions of two neighboring unit visual field, this problem is particularly acute.Therefore, in order to ensure that splicing illumination uniformity, it is also desirable to set
The method of meter measurement and compensation.
About field stitching mode, Nikon Corporation proposes a kind of photograph in the United States Patent (USP) of Publication No. US5729331
Bright structure: multiple unit object lens splicings, each unit object lens are divided into two layers, and every layer sets for the optics of Dyson or Offner form
Meter.The structure of lighting part is shown in Fig. 1, has a characteristic that light source emergent ray can firstly, light source 102 is one or more
Each unit illumination is sent to by separation conduction optical path 103；Each light after light balancing device 105, forms area in mask plane 8 respectively
Biggish illumination field of view 111, real estate field stop can be placed between the double-layer structure of projection lens, be designed as splicing it is trapezoidal,
Hexagon or other sliceable shapes；Real estate visual field can be adjusted by the optical textures such as offset flat-panel (102-107).
However, this design has how the light-intensity difference being not known between cell illumination is handled, and real estate visual field position
The measurement method set is not stated, and the separation of imaging with illumination is not also accomplished in adjustment.
Therefore, Nikon proposes the details of illumination intensity control, main thought are as follows: successively measure substrate by energy sensor
Face each unit visual field light intensity carries out magnitude of recruitment calculating by signal processing unit and issues adjustment order；By power control unit and
Filtering attenuation device makes light intensity adjustment, and energy sensor participates in closed-loop control during the adjustment；Real estate light intensity is with certain
Target value (such as: on the basis of some visual field, or use each visual field sampling light intensity average value etc.) for adjustment direction, emphasize each view
Field stitching portion light intensity value is equal.
Summary of the invention
The present invention provides a kind of litho machine splicing lighting system and its method of adjustment, to solve on existing in the prior art
State technical problem.
In order to solve the above technical problems, the present invention provides a kind of litho machine splicing lighting system, comprising: along optical propagation direction
The lighting unit that sets gradually, multiple light intensity transmitance adjusting means, multiple groups unit object lens, field stop and it is mounted on substrate
Luminous intensity measurement sensor on sports platform, the field stop are adjustable field stop.
Preferably, the lighting unit includes light source, optical fiber and even light unit, the light beam that the light source issues is by optical fiber
It is divided into after multiple light beams and is entered in each light intensity transmitance adjusting means through the even light of even light unit respectively.
Preferably, being additionally provided with energy of light source monitoring sensor between the light source and optical fiber.
Preferably, the adjustable field stop is driven by motor, for adjusting the sliceable view on substrate motion platform
.
Preferably, the adjustable field stop is set between the superstructure and understructure of the unit object lens.
Preferably, the six-degree-of-freedom information of the substrate motion platform is provided by position measuring system.
Preferably, the position measuring system is interferometer or coded scale.
Preferably, the field stop is rectangle, trapezoidal or hexagon.
The present invention also provides a kind of litho machines to splice lighting system method of adjustment, using the litho machine splicing illumination system
System, comprising:
Step 1: using the position of motor adjustment field stop to adjust the sliceable visual field on substrate motion platform；
Step 2: light intensity transmitance adjusting means being adjusted by the measured value of luminous intensity measurement sensor, so as to adjust sliceable
The light intensity of each unit visual field in visual field.
Preferably, the step 1 includes:
Step 11: being carried out using light and shade boundary position of the luminous intensity measurement sensor to unit visual field each in sliceable visual field
Search obtains the boundary position information of each unit visual field；
Step 12: according to the target position information of the boundary position information of each unit visual field and each unit visual field, meter
The adjustment amount for calculating and obtaining each field stop completes the compensation adjustment of each unit field positions according to each adjustment amount.
Preferably, in the step 11, using the light and shade boundary position of dichotomizing search each unit visual field.
Preferably, the dichotomy includes: the position range of each unit visual field border described in first whole measurement and positioning, then
Boundary position is searched for each unit visual field respectively and is gradually restrained, finally determines the boundary bit confidence of the unit visual field
Breath.
Preferably, in step 11: being scanned for the light and shade boundary position of unit visual field each in sliceable visual field
Step include: to sliceable visual field carry out entire scan sampling, and to scanning sample obtain light intensity and position data carry out it is slotting
Value calculates, and obtains the boundary position information of each unit visual field.
Preferably, step 12 includes: to carry out to the boundary position information and target position information of each unit visual field
Least square method calculates, to obtain the translation of each unit visual field, rotation parameter；It then, will be described using information process unit
The translation of each unit visual field, rotation parameter are converted to the adjustment amount of corresponding each field stop.
Preferably, the step 2 includes:
Step 21: utilizing the light intensity in the luminous intensity measurement sensor measurement each unit visual field；
Step 22: combining the light intensity target value of each unit visual field and light intensity to penetrate by the light intensity of each unit visual field
The transmitance of rate adjusting means calculates the transmitance setting value for obtaining each unit visual field；
Step 23: according to the transmitance setting value, controlling the movement of light intensity transmitance adjusting means, complete each unit view
The transmitance compensation of field.
Compared with prior art, the invention has the following advantages that
1, the present invention uses the boundary of light intensity energy sensor scanning field of view, it can be ensured that the splicing of field positions is accurate
Property, on the other hand also ensure light intensity consistency between unit visual field；
2, by the present invention in that with motor control field stop position without adjusting any eyeglass for participating in imaging, into
And realize the adjustment of the field positions of more camera lens litho machine real estates, and it is easy to operate, it adjusts quick；
3, it by the present invention in that making closed-loop control sensor with the light intensity energy sensor being located on substrate motion platform, uses
Energy of light source monitoring sensor directly monitors energy of light source state, improves the algorithm of light intensity splicing.
Detailed description of the invention
Fig. 1 is Nikon Corporation light structures schematic diagram in the prior art；
Fig. 2 is the structural schematic diagram that litho machine splices lighting system in the present invention；
Fig. 3 is the shape and distribution schematic diagram of field stop in the present invention；
Fig. 4 is the location diagram of luminous intensity measurement sensor and luminous intensity measurement point in visual field in the present invention；
Fig. 5 is unit field positions boundary scan schematic diagram in the present invention；
Fig. 6 is the flow diagram of field positions measurement and adjustment in the present invention；
Fig. 7 is that light intensity uniformity adjusts flow chart in the present invention；
Fig. 8 a~8c is the light intensity adjustment effect figure in the present invention.
Specific embodiment
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, with reference to the accompanying drawing to the present invention
Specific embodiment be described in detail.It should be noted that attached drawing of the present invention is all made of simplified form and uses non-essence
Quasi- ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
As shown in Fig. 2, litho machine of the invention splices lighting system, including light source 100, energy of light source monitor sensor
200, optical fiber 300, even light unit 400, light intensity transmitance adjusting means 500, unit object lens, field stop 800 and it is mounted on base
Luminous intensity measurement sensor 110 on plate sports platform, the unit object lens include superstructure 700 and understructure 900, wherein
Between the superstructure 700 and understructure 900 of the unit object lens that the field stop 800 is located at, the field stop 800 by
Motor driven adjustment, the shape of the field stop 800 constitute the sliceable visual field on real estate, each field stop 800
A unit visual field on counterpart substrate.In other words, the present invention directly uses motor control when carrying out field positions adjustment
The position of field stop 800 can be realized, and without adjusting any eyeglass for participating in imaging, adjust quick, it is easy to accomplish.
Specifically, by taking 2 light sources, 6 illumination paths as an example, the litho machine that the present invention will be described in detail splices to be shone the present embodiment
Bright system.With continued reference to Fig. 2, light source 100 is provided with two groups, and two groups of light sources 100 issue light beam and monitor sensor by energy of light source
It enters in the optical fiber 300 of multiple-input, multiple-output after 200 detections, and is had respectively entered in 6 even light units 400 after being divided into 6 beam optical paths,
Transmitance adjusting is carried out by light intensity transmitance adjusting means 500 again after the even light of every even light unit 400 of Shu Guangjing, projects mask
On 600, the light beam for being loaded with 600 information of mask enters the superstructure 700 of unit object lens, the visual field light through that can be driven by motor
Door screen 800 enters the understructure 900 of unit object lens, and projects on real estate, the luminous intensity measurement on substrate motion platform
The light intensity of the stitching portion for the unit visual field that the measurement of sensor 110 is formed by field stop 800.
The shape of the field stop 800 can be rectangle, trapezoidal or hexagon, and each figure, which can splice, to be integral.
For the isosceles trapezoid shown in Fig. 3, the base angle of the isosceles trapezoid is 45 °, i.e. visual field on substrate is spelled by 6 isosceles trapezoids
It connects integral, wherein the two sides of isosceles trapezoid are triangle splicing regions.Specifically, 6 field stops 800 are in two
Row arrangement and reciprocal correspondence.Specifically, first, third, the 5th field stop 801,803,805 arrange in a row, the first visual field
Interval region between diaphragm 801 and third field stop 803 matches with the second field stop 802, third, the 5th visual field light
Interval region between door screen 803,805 matches with the 4th field stop 804, the 6th field stop 806 and the 5th field stop
805 are correspondingly arranged.
More specifically, as shown in figure 4, luminous intensity measurement sensor 110 is provided with 7,7 luminous intensity measurement sensors
110 is corresponding with the position of visual field that field stop 800 is formed.The luminous intensity measurement sensor 110 can be with substrate motion platform one
Rise and move to first, third, the 5th field stop 801,803,805 is formed by visual field, while measuring 6 splicing regions
Then light intensity data steps to second, the four, the 6th field stops 802,804,806 and is formed by visual field, then measures simultaneously
The light intensity data of remaining 6 splicing regions.Wherein, the six-degree of freedom position information of substrate motion platform can be by position measuring system
As interferometer, coded scale provide.
Referring to figure 5. to Fig. 8 c, the present invention also provides a kind of litho machines to splice lighting system method of adjustment, comprising: step 1
That is the measurement and set-up procedure of field positions: using the position of motor adjustment field stop 800 to adjust on substrate motion platform
Sliceable visual field；Step 2 is the measurement and set-up procedure of visual field light intensity: passing through the measured value tune of luminous intensity measurement sensor 110
Light intensity transmitance adjusting means 500 is saved, so as to adjust the light intensity of unit visual field each in sliceable visual field.
Fig. 6 is please referred to, the step 1 that is to say that the measurement of field positions includes: with set-up procedure
Step 11: using luminous intensity measurement sensor 110 to the light and shade boundary position of unit visual field each in sliceable visual field
It scans for, obtains the boundary position information of each unit visual field；
Step 12: according to the target position information of the boundary position information of each unit visual field and each unit visual field, meter
The adjustment amount for calculating and obtaining each field stop completes the compensation adjustment of each unit field positions according to each adjustment amount.
There are two types of the boundary position informations of method acquiring unit visual field in the step 11, and one is use dichotomizing search
The light and shade boundary position of each unit visual field, the dichotomy include: the position of each unit visual field border described in first whole measurement and positioning
Range is set, then boundary position is searched for each unit visual field respectively and is gradually restrained, finally determines the side of the unit visual field
Boundary's location information.
Another method is: the step of scanning for the light and shade boundary position of unit visual field each in sliceable visual field packet
It includes: entire scan sampling being carried out to sliceable visual field, and interpolation calculation is carried out to the light intensity and position data of scanning sample acquisition,
Obtain the boundary position information of each unit visual field.
Certainly, it is arranged due to field stop 800 of the present invention at two rows, it in the actual operation process, can be first by institute
State that luminous intensity measurement sensor 110 is moved to first, third, the 5th field stop 801,803,805 is formed by visual field, simultaneously
The light and shade boundary for scanning three unit visual fields, obtains the boundary position information of each unit visual field；Again by luminous intensity measurement sensor 110
It is moved to second, the four, the 6th field stops 802,804,806 to be formed by visual field, obtains the other three unit visual field
Boundary position information.
Then, carrying out the field positions adjustment i.e. step 12 includes: according to each unit view obtained from above-mentioned steps
The boundary position information and target position information of field calculate the adjustment amount for obtaining field stop, complete the compensation tune of field positions
It is whole.Specifically can boundary position information to each unit visual field and target position information carry out least square method and calculate to obtain each list
The translation of first visual field, rotation parameter；And the translation of each unit visual field, rotation parameter are converted into visual field using information process unit
The adjustment amount of diaphragm 800.
As shown in figure 5, boundary position information is specially four measurement points of unit visual field border for some unit visual field
Position coordinates in the horizontal plane, four measurement points are embodied as P1~P4, if its target position is (x1,y1), (x2,y2),
(x3,y3), (x4,y4), the boundary position measured is (x1′,y1'), (x2′,y2'), (x3′,y3'), (x4′,y4′)。
Therefore, it is necessary to calculate the unit visual field physical location (x1′,y1'), (x2′,y2'), (x3′,y3'), (x4′,y4') phase
For target position (x1,y1), (x2,y2), (x3,y3), (x4,y4) translation and rotation parameter, be expressed as X to translation parameters Tx,
Y-direction translation parameters Ty and rotation parameter Rz.
Specifically used Least-squares minimization algorithm, equation are as follows:
In conjunction with formula (1) to formula (5), the X of the unit visual field can be obtained to translation parameters Tx, Y-direction translation parameters Ty
Then recycle information process unit that the translation of visual field, rotation parameter are converted to field stop 800 with rotation parameter Rz
Adjustment amount is moved by motor control field stop 800, can complete the compensation adjustment of field positions.
As shown in Fig. 7 to Fig. 8 c, the step 2 i.e. visual field luminous intensity measurement includes: with set-up procedure
Step 21: utilizing the light intensity in the luminous intensity measurement sensor 110 measurement each unit visual field；
Step 22: combining the light intensity target value of each unit visual field and light intensity to penetrate by the light intensity of each unit visual field
The transmitance of rate adjusting means 500 calculates the transmitance setting value for obtaining each unit visual field；
Step 23: according to the transmitance setting value, controlling light intensity transmitance adjusting means 500 and move, complete each list
The transmitance of first visual field compensates.
Specifically, if light intensity target value is Iref, the transmitance current value of light intensity transmitance adjusting means 500 is T1~T6.
First, third, 801,803,805 shape of the 5th field stop are measured using the luminous intensity measurement sensor 110 of real estate
At each unit visual field in light intensity, record the light intensity data of 6 measurement points, I1、I1’、I3、I3’、I5、I5’。
Similarly, second, the four, the 6th field stops 802,804,806 are measured using luminous intensity measurement sensor 110 to be formed
Each unit visual field in light intensity, record 6 measurement point light intensity datas, I2、I2’、I4、I4’、I6、I6’。
So, the transmitance setting value T of each light intensity transmitance adjusting means 500 is obtained using following calculating formulai':
The movement for controlling light intensity transmitance adjusting means 500, completes the compensation adjustment of transmitance.
Obviously, those skilled in the art can carry out various modification and variations without departing from spirit of the invention to invention
And range.If in this way, these modifications and changes of the present invention belong to the claims in the present invention and its equivalent technologies range it
Interior, then the invention is also intended to include including these modification and variations.
Claims (13)
1. a kind of litho machine splices lighting system, comprising: the lighting unit that sets gradually along optical propagation direction, multiple light intensity penetrate
Rate adjusting means, multiple groups unit object lens, field stop and the luminous intensity measurement sensor being mounted on substrate motion platform, the list
First object lens include superstructure and understructure, the field stop between the superstructure and the understructure,
It is characterized in that, the field stop is adjustable field stop, substrate is adjusted by adjusting the position of the adjustable field stop
Sliceable visual field on sports platform.
2. litho machine as described in claim 1 splices lighting system, which is characterized in that the lighting unit includes light source, optical fiber
With even light unit, the light beam that the light source issues is divided into after multiple light beams by optical fiber enters each light through the even light of even light unit respectively
In strong transmitance adjusting means.
3. litho machine as claimed in claim 2 splices lighting system, which is characterized in that between the light source and the optical fiber also
It is provided with energy of light source monitoring sensor.
4. litho machine as described in claim 1 splices lighting system, which is characterized in that the adjustable field stop is driven by motor
It is dynamic.
5. litho machine as described in claim 1 splices lighting system, which is characterized in that the adjustable field stop is set to institute
It states between the superstructure and understructure of unit object lens.
6. litho machine as described in claim 1 splices lighting system, which is characterized in that the field stop is rectangle, trapezoidal
Or hexagon.
7. a kind of litho machine splices lighting system method of adjustment, which is characterized in that using as described in any one of claim 1 to 6
Litho machine splice lighting system, comprising:
Step 1: adjustment field stop is to adjust the sliceable visual field on substrate motion platform；
Step 2: light intensity transmitance adjusting means being adjusted by the measured value of luminous intensity measurement sensor, so as to adjust sliceable visual field
In each unit visual field light intensity.
8. lighting system method of adjustment is spliced in photoetching as claimed in claim 7, which is characterized in that the step 1 includes:
Step 11: being searched using light and shade boundary position of the luminous intensity measurement sensor to unit visual field each in sliceable visual field
Rope obtains the boundary position information of each unit visual field；
Step 12: according to the target position information of the boundary position information of each unit visual field and each unit visual field, calculating simultaneously
The adjustment amount for obtaining each field stop completes the compensation adjustment of each unit field positions according to each adjustment amount.
9. lighting system method of adjustment is spliced in photoetching as claimed in claim 8, which is characterized in that in the step 11, use
The light and shade boundary position of dichotomizing search each unit visual field.
10. lighting system method of adjustment is spliced in photoetching as claimed in claim 9, which is characterized in that the dichotomy includes: elder generation
The position range of each unit visual field border described in whole measurement and positioning, then boundary position is searched for simultaneously to each unit visual field respectively
It gradually restrains, finally determines the boundary position information of the unit visual field.
11. lighting system method of adjustment is spliced in photoetching as claimed in claim 8, which is characterized in that in step 11: to sliceable
The step of light and shade boundary position of each unit visual field scans in visual field includes: to carry out entire scan to sliceable visual field to adopt
Sample, and to the light intensity and position data progress interpolation calculation that scanning sample obtains, obtain the boundary position of each unit visual field
Information.
12. lighting system method of adjustment is spliced in photoetching as claimed in claim 8, which is characterized in that step 12 includes: to described
The boundary position information and target position information of each unit visual field carry out least square method calculating, to obtain each unit visual field
Translation, rotation parameter；Then, the translation of each unit visual field, rotation parameter are converted into correspondence using information process unit
The adjustment amount of each field stop.
13. as lighting system method of adjustment is spliced in the described in any item photoetching of claim 7 to 12, which is characterized in that the step
Rapid 2 include:
Step 21: utilizing the light intensity in the luminous intensity measurement sensor measurement each unit visual field；
Step 22: the light intensity target value and light intensity transmitance tune of each unit visual field are combined by the light intensity of each unit visual field
The transmitance of device is saved, the transmitance setting value for obtaining each unit visual field is calculated；
Step 23: according to the transmitance setting value, controlling the movement of light intensity transmitance adjusting means, complete each unit visual field
Transmitance compensation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201511022036.0A CN106933040B (en) | 2015-12-30 | 2015-12-30 | Litho machine splices lighting system and its method of adjustment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201511022036.0A CN106933040B (en) | 2015-12-30 | 2015-12-30 | Litho machine splices lighting system and its method of adjustment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106933040A CN106933040A (en) | 2017-07-07 |
| CN106933040B true CN106933040B (en) | 2019-11-26 |
Family
ID=59442510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201511022036.0A Active CN106933040B (en) | 2015-12-30 | 2015-12-30 | Litho machine splices lighting system and its method of adjustment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106933040B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107966882B (en) * | 2017-08-10 | 2020-10-16 | 上海微电子装备（集团）股份有限公司 | Exposure apparatus and exposure method |
| WO2021169155A1 (en) * | 2020-02-25 | 2021-09-02 | 李德龙 | Beam shaping method and device employing full-image transfer for planar light sources |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2155650B (en) * | 1984-02-14 | 1988-11-16 | Canon Kk | Method and apparatus for exposure |
| CN102540736A (en) * | 2010-12-10 | 2012-07-04 | 上海微电子装备有限公司 | Uniformity compensation device applied to large field-of-view montage illumination |
| CN104570615A (en) * | 2013-10-29 | 2015-04-29 | 上海微电子装备有限公司 | Scanning exposure device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5729331A (en) * | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| US7092072B2 (en) * | 2004-07-02 | 2006-08-15 | Asml Netherlands B.V. | Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatus |
-
2015
- 2015-12-30 CN CN201511022036.0A patent/CN106933040B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2155650B (en) * | 1984-02-14 | 1988-11-16 | Canon Kk | Method and apparatus for exposure |
| CN102540736A (en) * | 2010-12-10 | 2012-07-04 | 上海微电子装备有限公司 | Uniformity compensation device applied to large field-of-view montage illumination |
| CN104570615A (en) * | 2013-10-29 | 2015-04-29 | 上海微电子装备有限公司 | Scanning exposure device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106933040A (en) | 2017-07-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106644410B (en) | A kind of camera module optical center location measurement method and system | |
| KR101476219B1 (en) | Method of manufacturing display device and apparatus using the same | |
| CN108760765A (en) | A kind of surface damage defect detecting device and method based on the shooting of side view camera | |
| US20190025048A1 (en) | Three-dimensional measuring device | |
| CN207439647U (en) | A kind of head-up display display performance combined test stand | |
| JP6522344B2 (en) | Height detection device, coating device and height detection method | |
| KR20130136806A (en) | Apparatus for testing display device module and method for testing the same | |
| US8810799B2 (en) | Height-measuring method and height-measuring device | |
| CN106933040B (en) | Litho machine splices lighting system and its method of adjustment | |
| CN108986170A (en) | A kind of line-scan digital camera method for correcting flat field suitable for field working conditions | |
| WO2016145772A1 (en) | Light source brightness adjusting system and method for critical dimension measuring device | |
| JP2012220558A (en) | Microscope device | |
| CN104869375B (en) | Three-dimensional smooth surface color corrected system and method in a kind of image edge-blending | |
| JP2011158718A (en) | Exposure apparatus, exposure method and method for manufacturing panel substrate for display | |
| CN108010071B (en) | System and method for measuring brightness distribution by using 3D depth measurement | |
| TW201819895A (en) | Detecting device for crystalline quality of LTPS backplane and method thereof | |
| CN106782233A (en) | Oled display screen detecting system and its application | |
| TW201248338A (en) | Exposure apparatus, exposure method, inspecting method of exposure apparatus and manufacturing method of display panel substrate | |
| JP5531883B2 (en) | Adjustment method | |
| CN104516210B (en) | Telecentric measuring method for photoetching machine lens | |
| JP2012002612A (en) | Calibration board and calibration apparatus equipped with this calibration board | |
| CN108709509A (en) | Profile camera, the mating contactless caliper of super-large diameter revolving body workpieces and contactless revolving body measurement method | |
| JP2011002401A (en) | Correction coefficient calculating method in luminance measuring apparatus, and luminance measuring apparatus | |
| CN106814547B (en) | A kind of detecting and correcting device and survey calibration method | |
| JP2010243212A (en) | Tilt detection method and device of the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information | ||
| CB02 | Change of applicant information |
Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Applicant after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Applicant before: Shanghai Micro Electronics Equipment Co., Ltd. |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant |