GB1399961A - Method of forming a patterned transparent electro-conductive film on a substrate - Google Patents
Method of forming a patterned transparent electro-conductive film on a substrateInfo
- Publication number
- GB1399961A GB1399961A GB2034673A GB2034673A GB1399961A GB 1399961 A GB1399961 A GB 1399961A GB 2034673 A GB2034673 A GB 2034673A GB 2034673 A GB2034673 A GB 2034673A GB 1399961 A GB1399961 A GB 1399961A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- per cent
- paste
- transparent
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
- H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Liquid Crystal (AREA)
Abstract
1399961 Printed circuits ASAHI GLASS CO Ltd 30 April 1973 20346/73 Heading H1R [Also in Division H4] A method of forming a patterned transparent electro-conductive film on a substrate comprises (a) printing a paste containing a heat decomposable vehicle and inorganic oxide particles over predetermined parts of the substrate, and drying the paste, (b) depositing a low valency metal oxide on the pasted substrate, and (c) heating the substrate in an oxidizing atmosphere such that the low valency oxide is oxidized to a higher valency transparent electro-conductive metal oxide and the vehicle is decomposed whereby the inorganic particles in the printed paste, and the transparent metal oxide deposited theron, can be removed, for example by wiping off with a soft cloth. The paste is screen printed on those regions of the soda-lime silicate glass substrate on which the transparent film is not required and may comprise 40-80 wt. per cent of particles of titania, silica, zinc oxide or alumina of 10-0À01Á average diameter and 60-20 wt. per cent of the vehicle which may comprise 0À05-10 wt. per cent of a resin binder in a solvent with up to 0À1 wt. per cent of a surfactant. In an example the paste comprises 40-70 wt. per cent of finely powdered TiO 2 and 60-30 wt. per cent of a solution of 0À5-4 wt. per cent of nitrocellulose in butyl carbitol acetate. The transparent conductive film may comprise a high valency oxide of one or more of In, Sn, Zr and Cd, and is preferably 15-30 wt. per cent SnO 2 and 85-70 wt. percent In 2 O 3 . A layer of low valency tin and indium oxides may be formed by vapourising tin and indium metal in a vacuum chamber to which oxygen at 10<SP>-2</SP>-10<SP>-3</SP> torr is supplied, the reaction taking place at room temperature. The substrate is then heated in an oxygen-containing atmosphere at 350-550‹ C. to convert to the higher oxides and evaporate the vehicle. Alternatively a mixture of low valency tin and indium oxides may be evaporated directly from a boat in a vacuum chamber on to the substrate. The transparent electrode plate may be used for liquid crystal display apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2034673A GB1399961A (en) | 1973-04-30 | 1973-04-30 | Method of forming a patterned transparent electro-conductive film on a substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2034673A GB1399961A (en) | 1973-04-30 | 1973-04-30 | Method of forming a patterned transparent electro-conductive film on a substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1399961A true GB1399961A (en) | 1975-07-02 |
Family
ID=10144432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2034673A Expired GB1399961A (en) | 1973-04-30 | 1973-04-30 | Method of forming a patterned transparent electro-conductive film on a substrate |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB1399961A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2928256A1 (en) * | 1978-07-17 | 1980-01-31 | Rockwell International Corp | Transparent conductor pattern prodn. - by diffusing pattern of modifying material into oxidisable layer to produce local conduction zones within overall insulation |
| EP0080629A1 (en) * | 1981-11-17 | 1983-06-08 | Robert Bosch Gmbh | Paste for imprinting substrates by means of an elastically deformable forme |
| DE3908068A1 (en) * | 1989-03-13 | 1990-09-20 | Nokia Unterhaltungselektronik | Method for producing interconnects on a substrate panel for liquid-crystal cells |
-
1973
- 1973-04-30 GB GB2034673A patent/GB1399961A/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2928256A1 (en) * | 1978-07-17 | 1980-01-31 | Rockwell International Corp | Transparent conductor pattern prodn. - by diffusing pattern of modifying material into oxidisable layer to produce local conduction zones within overall insulation |
| EP0080629A1 (en) * | 1981-11-17 | 1983-06-08 | Robert Bosch Gmbh | Paste for imprinting substrates by means of an elastically deformable forme |
| DE3908068A1 (en) * | 1989-03-13 | 1990-09-20 | Nokia Unterhaltungselektronik | Method for producing interconnects on a substrate panel for liquid-crystal cells |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |