JP2000214318A - Color filter and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a color filter having excellent reliability and its producing method by which decrease in the spectral trasmittance as a color filter is not caused in the production process of a panel such as film formation and wiring of transparent electrodes, and defects such as changes in the electric resistance of the transparent electrodes are not caused. SOLUTION: In the color filter consisting of a substrate 10 and a dye layer 11 regularly arranged between an overcoat layer on the substrate 10 and the substrate 10, the overcoat layer is formed by successively laminating a low melting point glass layer 12 containing 50 to 65 wt.% PbO and 25 to 35 wt.% SiO2 and an insulating metal oxide layer 13 comprising SiO2, SiON, Al2O3, Ta2O5, TiO2, Y2O3, LiO2 or multiple oxides of these. The overcoat layer covers the dye layers 11.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is provided in various display devices such as a plasma display, an electroluminescence display, a field emission display, a liquid crystal display, and a solid-state image pickup device, and has a reduced reflectance.
The present invention relates to a color filter used for color synthesis or color separation and a method for manufacturing the same.

[0002]

2. Description of the Related Art For example, in a color liquid crystal display,
Need a color filter to perform color display,
A color filter prepared by a known method such as a dyeing method or a pigment dispersion method is used. This is to color a resin layer using an organic dye or an organic pigment to form a color filter. In a plasma display, it has been proposed to use a color filter in order to improve contrast when displaying an image. As described above, in some electronic display devices, color filters are indispensable for improving color display and image quality.

[0003] In the case of a plasma display,
The fabrication process includes conditions for firing at about 450-600 ° C. If a color filter for a liquid crystal display is diverted to a color filter for a plasma display, the organic dyes, organic pigments, and resin binders constituting the filter will burn or decompose in such a production process, and the characteristics as a color filter will be obtained. I will not be able to.

As a solution to this problem, it has been proposed to use a heat-resistant inorganic pigment formed on a substrate as a color filter. This means that a paste obtained by mixing an inorganic pigment with an appropriate binder resin and a solvent is patterned at a predetermined position on a predetermined substrate by a method such as screen printing, and then the binder resin and the solvent are removed by firing, This is to obtain an inorganic pigment filter. In this case, since the color filter is made of an inorganic material, it can withstand a high-temperature process involved in manufacturing a plasma display.

[0005]

When a color filter is used in a plasma display, an electroluminescence display, a field emission display, or the like, a transparent electrode is used for scanning or maintaining a pixel to be lit, according to each panel structure. Wired above or below the filter. In particular, when importance is placed on the influence of the drive voltage margin, a transparent electrode is formed above the color filter. Therefore, in order for the display device to operate normally, it is important that the transparent electrode has uniform electric characteristics and does not cause disconnection or pinholes.

In order to satisfy such demands, it has been proposed that a transparent electrode is not formed directly on a dye layer, but is formed on a glass overcoat layer after forming it.
However, a low-melting glass frit must be used for the overcoat glass material, and the particle size is limited to 10 μm or less even when the particles are finely divided. Outbreak was inevitable.

Further, the low melting point glass frit must satisfy the glass properties and matching property of the substrate glass so as to be compatible with the display manufacturing process, and the softening point and the thermal expansion coefficient are increased by introducing PbO into the frit component. Must be appropriately controlled.

However, such a color filter having a low-melting glass layer formed as an overcoat on a colorant, when a transparent electrode is wired on the upper part in a paneling step, a heating process for manufacturing a display causes a gap between the transparent electrode and the low-melting glass layer. Interaction increases the electrical resistance of the electrode and changes the surface shape of the overcoat layer (wrinkles, cracks, etc.)
There was also the problem of doing it at the same time.

Accordingly, the present invention has been made to solve the above-mentioned conventional problems, and an object of the present invention is to provide a low-melting-point glass layer which can be matched with a substrate glass for a color filter, and which is suitable for a display manufacturing process. An object of the present invention is to provide a color filter which can solve the problem of generation of holes and cracks and can maintain panel display quality, and a method of manufacturing the same.

Another object of the present invention is to solve the problem that the electric resistance of the wiring electrode is increased and the surface shape of the low-melting glass layer is changed (wrinkles, cracks, etc.) even after each panel assembling step, and high reliability is achieved. An object of the present invention is to provide a color filter capable of realizing high-quality display characteristics having a characteristic and a method of manufacturing the same.

[0011]

In order to achieve the above object, a color filter according to the present invention comprises a color filter in which a dye layer is regularly arranged between a substrate and an overcoat layer formed on the substrate. in, the overcoat layer is PbO50~65 wt%, the low-melting point glass layer and SiO ₂ containing SiO ₂ 25 to 35 wt%, SiO
N, Al ₂ O ₃ , Ta ₂ O ₅ , TiO ₂ , Nb ₂ O ₅ ,
A color filter, which is obtained by sequentially laminating an insulating metal oxide layer formed of Y ₂ O ₃ , LiO ₂ or a composite oxide thereof, and covering the dye layer. is there.

Further, in the method of manufacturing a color filter according to the present invention, the dye layer on the substrate is regularly and regularly placed at a predetermined position on the substrate using a dye paste composed of an inorganic pigment, a binder resin and a solvent. And a step of performing baking to remove organic components in the dye layer,
A step of forming a low-melting glass layer so as to cover the entire surface of the dye layer and the substrate using a low-melting glass paste composed of a low-melting glass frit having a particle size of 10 μm or less, a binder resin and a solvent, and This is a method for producing a color filter, which comprises firing to remove organic components in the low-melting glass layer and soften the low-melting glass frit.

Further, in the method of manufacturing a color filter according to the present invention, after the step of removing organic components in the low-melting glass layer by softening and softening the low-melting glass frit, an insulating metal group having a light-transmitting property is obtained. A method for manufacturing a color filter, comprising laminating an oxide layer.

[0014]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a cross-sectional view illustrating an embodiment of a color filter according to the present invention. As shown in FIG. 1, a glass substrate 10 and dye layers 11R, 11G, and 11B of each color are patterned and arranged at predetermined positions.
And a light-transmitting low-melting glass layer 12 and a light-transmitting insulating metal oxide layer 13 covering the light-transmitting low-melting glass layer 12 are sequentially laminated.

As the substrate, those used for ordinary color filters can be applied, and soda lime glass, heat-resistant alkali-free plate glass such as borosilicate glass, aluminosilicate glass, or the like can be used.

The dye layer 11 is regularly formed at a predetermined position on the substrate using an inorganic pigment paste composed of an inorganic pigment, a binder resin and a solvent, and then fired.

As an inorganic pigment, for example, Fe ₂ O ₃ is used as a red pigment, and TiO ₂ —CoO—N is used as a green pigment.
iO-ZnO, CoO-CrO- TiO 2 -Al
₂ O ₃ , blue pigments such as CoO-Al ₂ O ₃ -CrO, C
oO-Al ₂ O ₃ or the like can be used, and in addition, pigments such as yellow, brown, and black are used depending on the application.

It is important that the binder resin has a composition capable of removing organic substances by firing. In particular,
It is necessary to decompose in an atmosphere in which the amount of introduced oxygen is limited, and no carbonaceous substance or the like should be left after firing. Thus, alkyl acrylates, polyalkyl acrylates,
Or an acrylic copolymer such as alkyl methacrylate, polyalkyl methacrylate, or various copolymers thereof, or a cellulose compound in which a part or all of hydroxyl groups are etherified with a hydrocarbon residue having 1 to 3 carbon atoms. Used as a binder resin.

As the organic solvent, an inert liquid organic solvent can be used, and the boiling point is preferably in the range of 100 to 350 ° C. Suitable solvents for this include ketones such as cyclohexanone, methyl ethyl ketone, methyl isobutyl ketone, terpenes or kerosenes such as α or β terpinol, dibutyl phthalate, butyl carbitol, butyl carbitol acetate, hexamethylene, glycol, And mixtures with other solvents such as high boiling alcohols and alcohol esters. These solvents are appropriately selected and used in order to obtain desired viscosity and volatility requirements for various coating methods.

As a method for regularly forming a dye layer on a glass substrate, a printing method, a photolithography method, or the like may be used with a dye paste composed of the inorganic pigment, a binder resin and a solvent. .

In the case of the printing method, there is a screen printing method in which a dye paste is pressed and applied through a screen mesh having a predetermined shape to form a pattern. In addition, the printing can be performed by various printing methods such as a lithographic offset printing method.

In the photolithography method, an inorganic pigment is kneaded in an appropriate photosensitive resin, the obtained dye paste is applied on a substrate, and this is exposed to light using a predetermined photomask, and thereafter, Develop and pattern.

As the low melting point glass, PbO
50-65 wt%, used those containing SiO ₂ 25 to 35 wt% as a basic configuration. PbO 50% by weight
Below this, the softening point of the glass increases and a high firing temperature step is required. For this reason, depending on the substrate to be used, distortion or deformation occurs, and the substrate to be selected is restricted. When the content of PbO is 65% by weight or more, vitrification tends to be difficult.

On the other hand, if the SiO ₂ content is 25% by weight or less, the strength and the acid resistance tend to decrease, and in particular, the chemical resistance tends to decrease and peeling tends to occur in the electrode wiring etching step. When the SiO ₂ content is 35% by weight or more, the softening point of the glass frit becomes high, and the tendency that devitrification and pinholes tend to remain is recognized.

With a composition obtained by adding BaO, ZnO, B ₂ O ₃ , Na ₂ O, K ₂ O or F ₂ in addition to the basic components of PbO and SiO ₂ , the softening point and the thermal expansion coefficient of the glass frit can be reduced. It can be appropriately controlled and used.

It is important that the binder resin used as the low-melting glass paste has a composition capable of removing organic substances by firing. In particular, it is necessary to decompose in an atmosphere in which the amount of introduced oxygen is limited, and no carbonaceous substance or the like should remain after firing. Therefore, an acrylic copolymer such as alkyl acrylate, polyalkyl acrylate, or alkyl methacrylate, polyalkyl methacrylate, or various copolymers thereof, or a part or all of the hydroxyl groups is a carbon having 1 to 3 carbon atoms. A cellulose compound etherified with a hydrogen residue is used as a binder resin.

As the organic solvent, an inert liquid organic solvent can be used, and the boiling point is preferably in the range of 100 to 350 ° C. Suitable solvents for this include ketones such as cyclohexanone, methyl ethyl ketone, methyl isobutyl ketone, terpenes such as α or β terpinol, or kerosene, dibutyl phthalate, butyl carbitol, butyl carbitol acetate, hexamethylene, glycol And mixtures with other solvents such as high boiling alcohols and alcohol esters. These solvents are appropriately selected and used in order to obtain desired viscosity and volatility requirements for various coating methods.

In order to form a low-melting glass layer on a substrate on which a dye layer has been formed, a screen-printing method is used using a low-melting glass paste composed of a low-melting glass frit having a particle size of 10 μm or less, a binder resin and a solvent. It can be applied by a dip coating method, a spin coating method, or the like. When the glass frit particle size is 10 μm or more, it is difficult to obtain surface smoothness even when softening is performed in a firing step, so that the glass frit particle size is preferably equal to or less than the above size.

As the light-transmitting insulating metal oxide layer,
SiO ₂ , SiON, Al ₂ O ₃ , Ta ₂ O ₅ , TiO
₂ , Nb ₂ O ₅ , Y ₂ O _3, and those formed from composite oxides thereof are used.

The light-transmitting insulating metal oxide layer may be formed by electron beam evaporation, sputtering, in which a raw material for forming a thin film is heated in a vacuum to deposit the sublimate on the low-melting glass layer. A vapor phase method such as a chemical vapor deposition method is exemplified. In addition, using an organic metal compound soluble in an organic solvent,
This solution is applied onto a low-melting glass layer, and is then thermally decomposed or oxidized to form a film of an insulating metal oxide film.

In the gas phase method, a film component is physically transferred to the gas phase. An inert gas such as argon or a reactive gas such as oxygen is appropriately introduced, and the coating is applied from the surface of the insulating metal oxide raw material. By releasing the film components, an insulating metal oxide layer having light transmittance can be deposited on the low melting point glass layer with good control.

In the liquid phase method, metal organic acid salts, metal alkoxides, chelate compounds and the like are known as raw materials capable of forming a uniform film without causing powderization by coating and thermal decomposition. Each of these compounds has a structure in which a metal is bonded to an alkyl group via an oxygen atom, and a metal oxide is formed after thermal decomposition.

The metal element of the organometallic compound is silicon,
At least one of alumina, tantalum, titanium, niobium, yttrium, and lithium is used.

These starting materials are dissolved in a suitable solvent,
Coating is performed by an immersion method, a doctor blade method, a spin coating method, or the like. Thereafter, baking is performed, and thermal decomposition and oxidation are performed to form an insulating metal oxide film.

In addition, a metal colloid solution in which a metal colloid having a particle size of about 50 nm is adjusted to a liquid state is applied and dried to obtain a water-containing gel coating film of the metal colloid solution, followed by firing to obtain a metal oxide. You can do things.

As described above, every time a pigment layer and a low-melting glass layer are formed, or after the pigment layer is formed from the low-melting glass layer to the insulating metal oxide layer, the organic components are removed by batch firing to remove the low-melting glass. And sintering of the insulating metal oxide layer is also possible. When baking is carried out collectively by the latter method, the color filter manufacturing process is simplified, and it is possible to reduce the manufacturing time and the manufacturing cost.

The structure of the color filter of the present invention is such that a dye layer, a light-transmitting low-melting glass layer, and a light-transmitting insulating metal oxide are sequentially formed on a substrate. In a conventional color filter, a transparent electrode (ITO: indium tin oxide) is placed on the low melting glass layer during the display manufacturing process.
After the heat treatment step, the lead oxide (PbO) component of the low melting point glass layer and the In _{2 of the} transparent electrode were formed.
The O ₃ or SnO ₂ component reacted with each other, causing an increase in the electrode resistance. Further, in this reaction process, deformation (wrinkles, cracks) of the surface shape of the low-melting glass layer was simultaneously induced. To avoid this problem, SiO ₂ , SiON, Al which can be formed on the low melting point glass layer
₂ O ₃ , Ta ₂ O ₅ , TiO ₂ , Nb ₂ O ₅ , Y ₂ O ₃
Further, the inventors have found a light-transmitting insulating metal oxide layer formed from these composite oxides, and have achieved the present invention.

[0038]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A color filter and a method of manufacturing a color filter according to the present invention will be described below with reference to the accompanying drawings, which schematically show the state of each stage. The materials used in the description, and the material processing conditions such as temperature and time are just examples, and the drawings used in the description outline the present invention in terms of the size, shape and arrangement of each component. It is shown.

Example 1 100 parts by weight of "Cobalt Blue X" manufactured by Toyo Pigment Co., Ltd. as a blue pigment, 10 parts by weight of ethyl cellulose (manufactured by Kanto Chemical) and 40 parts by weight of α-terpineol (manufactured by Kanto Chemical) as a binder resin. The mixture was mixed to prepare a blue paste obtained by dispersing the mixture in a roll mill.

The blue paste was printed using a screen plate of polyester 300 mesh having openings in stripes, and a line width of 150 μm and a pitch of 220 μm was formed on a low expansion alkali-free glass substrate 10 (thermal expansion coefficient: 48 × 10 ⁻⁷ ).
μm, 8 μm-thick stripe pattern dye layer 11B
Was formed by printing (see FIG. 2).

Similarly, "ND-801" manufactured by Nippon Denko KK was used as a green pigment, and BASF was used as a red pigment.
Dispersed and pasted together with a binder resin using "Sico Trans Red L-2817" manufactured by the company, the screen plate was aligned, and a green stripe dye layer 11G and a red stripe dye layer 11R were printed at predetermined positions. (See FIG. 3). Both had a line width of 150 μm and a film thickness of 8 μm.

Thereafter, the paste was baked at 420 ° C. in the air for 30 minutes, and the organic components ethyl cellulose and α-terpineol in the paste were removed by burning and evaporating. In this manner, the dye layers 11B, 11G, and 11R made of only the blue, green, and red inorganic pigments were formed on the glass substrate 10.

Next, a low melting point glass frit was prepared according to the following procedure. 62% by weight of PbO as glass raw material, Si
O ₂ 28% by weight, B ₂ O ₃ 5% by weight, Na ₂ O 2.
Using a crucible at a ratio of 5% by weight and _2.5 % by weight of F ₂ ,
Melting was carried out at 300 ° C. until the bubbles disappeared. After the melting was completed, the mixture was poured into pure water to obtain a glass powder having an appropriate particle size. Further, an appropriate electrolyte mill additive was added, mixed with water, and pulverized by a ball mill. Thus, having a particle size distribution of a particle size of 7 to 3 μm, a softening point of 560 ° C.,
A low melting point glass frit having a coefficient of thermal expansion of 53 × 10 ⁻⁷ was prepared.

In addition, the low melting point glass frit 100
The weight part was added to 2.5 parts by weight of ethyl cellulose (manufactured by Kanto Chemical Co., Ltd.) and 20 parts by weight of 2-(-ethoxyethoxy) ethanol, and this was dispersed by a three-roll mill to prepare a low-melting glass paste.

Then, on a glass substrate 10 on which a dye layer 11 having a blue, green, and red strap pattern is formed at a predetermined position, the entire area of the pattern is coated with this low-melting glass paste using a screen plate of polyester 300 mesh. It was applied solid to include. The applied film thickness was 20 μm.

Then, at 420 ° C. for 60 minutes and 58
Baking was performed in a continuous process at 0 ° C. for 30 minutes, and the organic components ethyl cellulose and 2-
(2-ethoxyethoxy) Ethanol is removed by burning and evaporating, and the low melting point glass frit is further softened, and blue, green, and red dye layers 11B and 11 are formed on the glass substrate 10.
G, 11R and the low-melting glass layer 12 were sequentially laminated (see FIG. 4).

Then, Ar and oxygen are introduced into the sputtering gas by a magnetron-sputtering apparatus at an appropriate mixing ratio, and a SiO ₂ thin film is formed on the low-melting glass layer 12 as a light-transmitting insulating metal oxide layer. The film was formed to a thickness of 1000 °.

Through the above steps, blue and blue
A color filter having a structure in which green and red dye layers 11B, 11G, and 11R, a low-melting glass layer 12, and a light-transmitting insulating metal oxide layer 13 were sequentially laminated was manufactured (see FIG. 1).

The color filters thus obtained were transferred to an ITO film forming process as a display device assembling process. An ITO film (Indium) is formed on the upper surface of the color filter substrate.
Tin Oxide) is deposited to a thickness of 150 by sputtering.
The film was formed at 0 ° and further annealed.

The designed ITO sheet resistance on the color filter substrate was as low as 20 Ω / □ as designed. In addition, the surface shape of the low melting point glass layer was able to obtain a good color filter substrate with a smooth upper surface free from problems such as deformation (wrinkles), deterioration, and cracks.

<Embodiment 2> Blue, green and red pastes were repeatedly printed on a low expansion alkali-free glass substrate 10 by screen printing in the same manner as in Embodiment 1 to obtain a line width of 1.
50 μm, 8 μm-thick striped dye layer 11B
11G and 11R were formed. Then, in an oxidizing atmosphere,
Baking was performed at 00 ° C. for 60 minutes to remove organic components of the color filter.

Thereafter, as shown in FIG. 4, a low-melting glass paste was coated on a glass substrate 10 on which a dye layer 11 having a blue, green, and red strap pattern was formed at a predetermined position. The solid was applied so as to cover the entire area of the pattern. The coating thickness is 2
It was 0 μm.

Next, at 420 ° C. for 60 minutes and 58
Baking is performed in a continuous process at 0 ° C. for 30 minutes, and the organic components in the low-melting glass paste are removed by burning and evaporating. Further, the low-melting glass frit is softened, and blue, green, and red are formed on the glass substrate 10. Dye layers 11B, 11G, 11R
And the low-melting glass layer 12 were sequentially laminated.

Then, Ar and oxygen were introduced into the sputtering gas by a magnetron-sputtering apparatus at an appropriate mixing ratio, and a thin SiO ₂ thin film was formed on the low-melting glass layer 12 as a light-transmitting insulating metal oxide layer. The film was formed to a thickness of 1000 °.

Through the above steps, a color filter substrate having a structure in which the dye layer 11, the low-melting glass layer 12, and the light-transmitting insulating metal oxide layer 13 are sequentially laminated on the glass substrate 10 was manufactured (see FIG. 1). .

The color filter thus obtained was transferred to an ITO film forming process as a display device assembling process. An ITO film (Indium) is formed on the upper surface of the color filter substrate.
Tin Oxide) is deposited to a thickness of 150 by sputtering.
The film was formed at 0 ° and further annealed.

With respect to the ITO sheet resistance value on the obtained color filter substrate, the designed low resistance of 20 Ω / □ was obtained. In addition, the surface shape of the low melting point glass layer was able to obtain a good color filter substrate with a smooth upper surface free from problems such as deformation (wrinkles), deterioration, and cracks.

<Example 3> Blue, green and red pastes were repeatedly printed on a low expansion alkali-free glass substrate 10 by a screen printing method in the same manner as in Example 1 to obtain a line width of 1
50 μm, 8 μm-thick striped dye layer 11B
11G and 11R were formed. Then, in an oxidizing atmosphere,
Baking was performed at 00 ° C. for 60 minutes to remove organic components of the color filter.

Thereafter, as shown in FIG. 4, on a glass substrate 10 having a dye layer 11 of blue, green, and red strap patterns formed at predetermined positions, the low-melting glass paste was screen-printed with a polyester mesh of 300 mesh. Was applied in a solid pattern so as to cover the entire area of the pattern. The applied film thickness was 20 μm.

Then, at 420 ° C. for 60 minutes and 58
Baking is performed in a continuous process at 0 ° C. for 30 minutes, and the organic components in the low-melting glass paste are removed by burning and evaporating. Further, the low-melting glass frit is softened, and blue, green, and red are formed on the glass substrate 10. Dye layers 11B, 11G, 11R
And the low-melting glass layer 12 were sequentially laminated.

Subsequently, a colloidal silicic acid and caustic soda were separately heated, reacted and dissolved in an autoclave, and a spherical silicic anhydride (SiO ₂ ) having a particle system of 10 to 20 nm and a solid content ratio of 20% in water was obtained. A dispersed colloid solution was prepared. This anhydrous silicic acid solution was applied to the entire surface of the low-melting glass layer 12 by spin coating. After that, it is slowly dried, and after passing through a hydrogel from a colloid solution, it is baked to obtain 1500 as a light-transmitting insulating metal oxide layer 13.
The SIO ₂ film of Å was obtained. Thus, on the soda-lime glass substrate 10, the dye layers 11R, 11G, and 11B, the low-melting glass layer 12, and the insulating metal oxide layer 1 having light transmittance are formed.
3 were sequentially formed.

The dye layer 1 is formed on the glass substrate by the above steps.
1. A color filter substrate having a structure in which a low-melting glass layer 12 and a light-transmitting insulating metal oxide layer 13 were sequentially laminated was manufactured (see FIG. 1). The color filter thus obtained was transferred to an ITO film forming process as a display device assembling process. An ITO film (Indi) is formed on the upper surface of the color filter substrate.
um Tin Oxide) was formed into a film having a thickness of 1500 ° by a sputtering method, and further annealed.

The designed ITO sheet resistance on the color filter substrate was as low as 20 Ω / □ as designed. The surface shape of the low-melting-point glass layer was able to obtain a good color filter substrate having a smooth upper surface without problems such as deformation (wrinkles), deterioration, and cracks.

<Example 4> In the same manner as in Example 1, a low-expansion non-alkali glass substrate 10 was repeatedly printed with blue, green, and red pastes by a screen printing method to obtain a line width of 1.
50 μm, 8 μm-thick striped dye layer 11B
11G and 11R were formed. Then, in an oxidizing atmosphere,
Baking was performed at 00 ° C. for 60 minutes to remove organic components of the color filter.

Thereafter, as shown in FIG. 4, the low-melting glass paste was applied to a screen plate of polyester 300 mesh on a glass substrate 10 having a dye layer 11 of blue, green and red strap patterns formed at predetermined positions. Was applied in a solid pattern so as to cover the entire area of the pattern. The applied film thickness was 20 μm.

Next, at 420 ° C. for 60 minutes and 58
Baking is performed in a continuous process at 0 ° C. for 30 minutes, and the organic components in the low-melting glass paste are removed by burning and evaporating. Further, the low-melting glass frit is softened, and blue, green, and red are formed on the glass substrate 10. Dye layers 11B, 11G, 11R
And the low-melting glass layer 12 were sequentially laminated.

Next, a colloid solution in which lithium silicate (SiO ₂ / LiO ₂ molar ratio 3.5) having a particle diameter of 10 to 20 nm was dispersed in water at a solid content ratio of 20% was similarly applied to the entire surface of the substrate by spin coating. . After that, after gently drying and passing the hydrogel from the colloid solution,
After firing, the light-transmitting insulating metal oxide layer 13
500Å lithium silicate (SiO ₂ / LiO ₂ )
A film was obtained. Thus, the dye layers 11B, 11G, and 11R, the low-melting glass layer 12, and the light-transmitting insulating metal oxide layer 13 were sequentially formed on the soda-lime glass substrate 10.

The dye layer 1 is formed on the glass substrate by the above steps.
1. A color filter substrate having a structure in which a low-melting glass layer 12 and a light-transmitting insulating metal oxide layer 13 were sequentially laminated was manufactured (see FIG. 1). The color filter thus obtained was transferred to an ITO film forming process as a display device assembling process. An ITO film (Indi) is formed on the upper surface of the color filter substrate.
um Tin Oxide) was formed into a film having a thickness of 1500 ° by a sputtering method, and further annealed.

The designed ITO sheet resistance on the color filter substrate was as low as 20 Ω / □ as designed. The surface shape of the low-melting-point glass layer was able to obtain a good color filter substrate having a smooth upper surface without problems such as deformation (wrinkles), deterioration, and cracks.

<Comparative Example 1> Blue, green, and red pastes were repeatedly printed on the low-expansion non-alkali glass substrate 10 by a screen printing method in the same manner as in Example 1 to obtain a line width of 1.
50 μm, 8 μm-thick striped dye layer 11B
11G and 11R were formed. Then, in an oxidizing atmosphere,
Baking was performed at 00 ° C. for 60 minutes to remove organic components of the color filter.

Thereafter, as shown in FIG. 4, on a glass substrate 10 on which a dye layer 11 having a blue, green and red strap pattern is formed at a predetermined position, Pb is then used as a glass material.
Low melting glass frit having an average particle size of 5 μm composed of O, SiO ₂ , B ₂ O ₃ , Na ₂ O and F ₂ is ethyl cellulose (manufactured by Kanto Chemical) as a binder resin, and α-terpineol (manufactured by Kanto Chemical) is used as an organic solvent. ) And a predetermined ratio to prepare an overcoat paste.

Thereafter, the low-melting glass paste was applied to a glass substrate 10 on which a dye layer 11 having a blue, green and red strap pattern was formed at a predetermined position.
Using a 0-mesh screen slab, solid coating was performed so as to cover the entire pattern. The applied film thickness was 20 μm.

Then, at 420 ° C. for 60 minutes and 58
Baking is performed in a continuous process at 0 ° C. for 30 minutes, and the organic components in the low-melting glass paste are removed by burning and evaporating. Further, the low-melting glass frit is softened, and blue, green, and red are formed on the glass substrate 10. Dye layers 11B, 11G, 11R
And the low-melting glass layer 12 were sequentially laminated.

The dye layer 1 is formed on the glass substrate by the above steps.
1. A color filter substrate in which only the low melting point glass layer 12 was sequentially laminated was manufactured.

The color filter thus obtained was transferred to an ITO film forming process as a display device assembling process. An ITO film (Indium) is formed on the upper surface of the color filter substrate.
Tin Oxide) is deposited to a thickness of 150 by sputtering.
The film was formed at 0 ° and further annealed.

The ITO sheet resistance of the obtained color filter substrate was 300 to 5000 with respect to the designed value of 20 Ω / □.
Greatly increased to Ω / □. The surface shape of the low-melting glass layer was deformed (wrinkled) over the entire area. Due to the surface roughness, the surface scattering increased, the transparency decreased, and the spectral transmittance characteristic of the color filter decreased by several tens%.

In this comparative example, the ITO resistance value increased and the low melting point glass layer was deformed through the annealing step after the ITO film formation, but the sputter plasma temperature increased the substrate temperature in the ITO film formation step. And cause the exact same problem.

<Comparative Example 2> Blue, green, and red pastes were repeatedly printed on the low-expansion non-alkali glass substrate 10 by a screen printing method in the same manner as in Example 1 to obtain a line width of 1.
50 μm, 8 μm-thick striped dye layer 11B
11G and 11R were formed. Then, in an oxidizing atmosphere,
Baking was performed at 00 ° C. for 60 minutes to remove organic components of the color filter.

Thereafter, as shown in FIG. 4, on a glass substrate 10 on which a dye layer 11 having a blue, green and red strap pattern is formed at a predetermined position, Pb is then used as a glass material.
O 67% by weight, SiO ₂ 23% by weight, B ₂ O ₃ 5% by weight, Na ₂ O _2.5 % by weight, F _{2 2.5} % by weight, average particle diameter 13 μm, softening point 530 ° C., coefficient of thermal expansion A low melting glass frit of 61 × 10 ⁻⁷ was prepared. This low melting glass frit was kneaded with ethyl cellulose (manufactured by Kanto Kagaku) as a binder resin and α-terpineol (manufactured by Kanto Kagaku) as an organic solvent at a predetermined ratio to prepare a low melting point glass paste.

Thereafter, the low-melting glass paste was applied to a polyester 30 on a glass substrate 10 having a blue, green and red strap pattern dye layer 11 formed at a predetermined position.
Using a 0-mesh screen slab, solid coating was performed so as to cover the entire pattern. The applied film thickness was 20 μm.

Next, at 420 ° C. for 60 minutes and 58
Baking is performed in a continuous process at 0 ° C. for 30 minutes, and the organic components in the low-melting glass paste are removed by burning and evaporating. Further, the low-melting glass frit is softened, and blue, green, and red are formed on the glass substrate 10. Dye layers 11B, 11G, 11R
And the low-melting glass layer 12 were sequentially laminated.

The dye layer 1 was formed on the glass substrate by the above steps.
1. A color filter substrate in which only the low melting point glass layer 12 was sequentially laminated was manufactured. However, in the color filter substrate thus obtained, since the thermal expansion coefficient of the glass substrate 10 and the thermal expansion coefficient of the low melting point glass layer 12 could not be matched, many cracks occurred in the low melting point glass layer.

The color filters thus obtained were transferred to an ITO film forming process as a display device assembling process. An ITO film (Indium) is formed on the upper surface of the color filter substrate.
Tin Oxide) is deposited to a thickness of 150 by sputtering.
The film was formed at 0 ° and further annealed.

The ITO sheet resistance of the obtained color filter substrate was 1000 to 200 with respect to the designed value of 20 Ω / □.
It greatly increased to 0Ω / □. Further, the surface shape of the low-melting glass layer was deformed (wrinkled) over the entire region, and cracks were further increased. Due to the surface roughness, the surface scattering increased, the transparency decreased, and the spectral transmittance characteristic of the color filter decreased by several tens%.

Table 1 summarizes the conditions used in this example and the comparative example, and the results obtained.

[0086]

[Table 1]

[0087]

According to the color filter of the present invention and the manufacturing method of the present invention capable of manufacturing the color filter, even if the color filter goes through a series of panel manufacturing processes such as high-temperature firing and transparent electrode wiring, the transparent electrode can be produced. And the transparency of the low-melting glass layer with respect to the glass substrate can be maintained without lowering, and the reliability as a display can be significantly improved.

[0088]

[Brief description of the drawings]

FIG. 1 is a sectional view of a color filter of the present invention.

FIG. 2 is a cross-sectional view illustrating a process of manufacturing a color filter according to an embodiment of the present invention.

FIG. 3 is a cross-sectional view illustrating a process of manufacturing a color filter according to an embodiment of the present invention.

FIG. 4 is a cross-sectional view illustrating a process of manufacturing a color filter according to an embodiment of the present invention.

[Explanation of symbols]

 Reference Signs List 10 glass substrate 11 dye layer 12 light-transmitting low-melting glass layer 13 light-transmitting insulating metal oxide layer

Claims (3)

[Claims] In a color filter in which a dye layer is regularly arranged between a substrate and an overcoat layer formed on the substrate, the overcoat layer contains 50 to 65% by weight of PbO and 25 to 35% by weight of SiO _2. Containing low melting point glass layer and SiO ₂ , SiON, Al ₂ O ₃ , Ta ₂ O ₅ ,
An insulating metal oxide layer formed of TiO ₂ , Nb ₂ O ₅ , Y ₂ O ₃ , LiO _2, or a composite oxide thereof is sequentially laminated, and covers the pigment layer. A color filter, characterized in that: 2. A process in which a dye layer on a substrate is regularly formed at a predetermined position on a substrate by using a dye paste composed of an inorganic pigment, a binder resin and a solvent. Using a low-melting glass paste composed of a low-melting glass frit having a particle size of 10 μm or less, a binder resin and a solvent, so as to cover the entire surface of the dye layer and the substrate. A method for producing a color filter, comprising: forming a low-melting glass layer; and then baking to remove organic components in the low-melting glass layer and soften the low-melting glass frit. 3. The method for producing a color filter according to claim 2, wherein after the step of removing the organic component in the low melting point glass layer and softening the low melting point glass frit by firing,
A method for manufacturing a color filter, comprising laminating an insulating metal oxide layer having light transmittance.