FR2987844B1 - REACTOR WITH AN OPEN SUBSTRATE HOLDER - Google Patents

REACTOR WITH AN OPEN SUBSTRATE HOLDER

Info

Publication number
FR2987844B1
FR2987844B1 FR1200683A FR1200683A FR2987844B1 FR 2987844 B1 FR2987844 B1 FR 2987844B1 FR 1200683 A FR1200683 A FR 1200683A FR 1200683 A FR1200683 A FR 1200683A FR 2987844 B1 FR2987844 B1 FR 2987844B1
Authority
FR
France
Prior art keywords
reactor
substrate holder
open substrate
open
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1200683A
Other languages
French (fr)
Other versions
FR2987844A1 (en
Inventor
Franck Pouch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ATON IND
Original Assignee
ATON IND
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ATON IND filed Critical ATON IND
Priority to FR1200683A priority Critical patent/FR2987844B1/en
Publication of FR2987844A1 publication Critical patent/FR2987844A1/en
Priority to FR1400215A priority patent/FR3000503A1/en
Application granted granted Critical
Publication of FR2987844B1 publication Critical patent/FR2987844B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
FR1200683A 2012-03-07 2012-03-07 REACTOR WITH AN OPEN SUBSTRATE HOLDER Expired - Fee Related FR2987844B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR1200683A FR2987844B1 (en) 2012-03-07 2012-03-07 REACTOR WITH AN OPEN SUBSTRATE HOLDER
FR1400215A FR3000503A1 (en) 2012-03-07 2014-01-29 REACTOR WITH INTERNAL HEATING MEANS.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1200683A FR2987844B1 (en) 2012-03-07 2012-03-07 REACTOR WITH AN OPEN SUBSTRATE HOLDER

Publications (2)

Publication Number Publication Date
FR2987844A1 FR2987844A1 (en) 2013-09-13
FR2987844B1 true FR2987844B1 (en) 2014-07-18

Family

ID=46062417

Family Applications (2)

Application Number Title Priority Date Filing Date
FR1200683A Expired - Fee Related FR2987844B1 (en) 2012-03-07 2012-03-07 REACTOR WITH AN OPEN SUBSTRATE HOLDER
FR1400215A Withdrawn FR3000503A1 (en) 2012-03-07 2014-01-29 REACTOR WITH INTERNAL HEATING MEANS.

Family Applications After (1)

Application Number Title Priority Date Filing Date
FR1400215A Withdrawn FR3000503A1 (en) 2012-03-07 2014-01-29 REACTOR WITH INTERNAL HEATING MEANS.

Country Status (1)

Country Link
FR (2) FR2987844B1 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000323487A (en) * 1999-05-14 2000-11-24 Tokyo Electron Ltd Sheet-by-sheet type heat treatment device
US6344631B1 (en) * 2001-05-11 2002-02-05 Applied Materials, Inc. Substrate support assembly and processing apparatus
JP4640938B2 (en) * 2002-11-22 2011-03-02 アプライド マテリアルズ インコーポレイテッド Backside heating chamber
US6888104B1 (en) * 2004-02-05 2005-05-03 Applied Materials, Inc. Thermally matched support ring for substrate processing chamber
EP2420588A1 (en) * 2010-08-16 2012-02-22 Applied Materials, Inc. Thermal management of film deposition processes
US8979087B2 (en) * 2011-07-29 2015-03-17 Applied Materials, Inc. Substrate supporting edge ring with coating for improved soak performance
CN103074606A (en) * 2012-02-22 2013-05-01 光达光电设备科技（嘉兴）有限公司 Graphite plate, reaction chamber with graphite plate, and substrate heating method

Also Published As

Publication number Publication date
FR2987844A1 (en) 2013-09-13
FR3000503A1 (en) 2014-07-04

Similar Documents

Publication Publication Date Title
UA26621S (en) CONNECTOR WITH HOLDER FOR ELECTRONIC DEVICES
CO6821899A2 (en) Margin gesture
DK3542843T3 (en) SINGLE USE PEN FOR MULTIPLE USES
DK2374531T3 (en) REACTOR
DE112013002360T8 (en) The reagent
IT1403577B1 (en) VESSEL DEVICE
IT1403578B1 (en) VESSEL DEVICE
BR112015006244A2 (en) coated substrate
DK2855530T3 (en) Anti-transglutaminase 2 antibodies
FR2967986B1 (en) DOUBLE GLASS HOLDER
FI20116111L (en) Micromanipulator arrangement
DK2500470T3 (en) The main-wagging
FR3000244B1 (en) INTERFACE MODULE
DK2788050T3 (en) SPRAYER HOLDER
FR3000245B1 (en) INTERFACE MODULE
DE102011051335A8 (en) Substrate holder
DE112012003417A5 (en) ammeter
FR2987844B1 (en) REACTOR WITH AN OPEN SUBSTRATE HOLDER
FI20125871A (en) The carrier
DE102011106569A8 (en) holder
ES1077741Y (en) GRAPHOMOTRICITY NOTEBOOK
ES1076984Y (en) PALLOT CARRIER
FR2972519B1 (en) LIGHTING DEVICE
ES1075163Y (en) THREAD HOLDER
FR2976958B1 (en) CLOSURE SUPPORT DEVICE

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 5

ST Notification of lapse

Effective date: 20171130