DE69819044D1 - Vervielfacher für laserwiederholfrequenz - Google Patents

Vervielfacher für laserwiederholfrequenz

Info

Publication number
DE69819044D1
DE69819044D1 DE69819044T DE69819044T DE69819044D1 DE 69819044 D1 DE69819044 D1 DE 69819044D1 DE 69819044 T DE69819044 T DE 69819044T DE 69819044 T DE69819044 T DE 69819044T DE 69819044 D1 DE69819044 D1 DE 69819044D1
Authority
DE
Germany
Prior art keywords
multiplier
repeat rate
laser repeat
laser
rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69819044T
Other languages
English (en)
Other versions
DE69819044T2 (de
Inventor
Yigal Katzir
Boris Kling
Paul Fenster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orbotech Ltd
Original Assignee
Orbotech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbotech Ltd filed Critical Orbotech Ltd
Application granted granted Critical
Publication of DE69819044D1 publication Critical patent/DE69819044D1/de
Publication of DE69819044T2 publication Critical patent/DE69819044T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
DE69819044T 1998-08-20 1998-08-20 Laserwiederholfrequenzvervielfacher Expired - Fee Related DE69819044T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IL1998/000398 WO2000011766A1 (en) 1998-08-20 1998-08-20 Laser repetition rate multiplier

Publications (2)

Publication Number Publication Date
DE69819044D1 true DE69819044D1 (de) 2003-11-20
DE69819044T2 DE69819044T2 (de) 2004-08-12

Family

ID=11062353

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69819044T Expired - Fee Related DE69819044T2 (de) 1998-08-20 1998-08-20 Laserwiederholfrequenzvervielfacher

Country Status (8)

Country Link
US (2) US6275514B1 (de)
EP (1) EP1105950B1 (de)
JP (1) JP2002523905A (de)
CN (1) CN1310871A (de)
AU (1) AU8882698A (de)
DE (1) DE69819044T2 (de)
IL (1) IL141487A (de)
WO (1) WO2000011766A1 (de)

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IL133889A (en) 2000-01-05 2007-03-08 Orbotech Ltd Pulse light pattern writer
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US6693930B1 (en) * 2000-12-12 2004-02-17 Kla-Tencor Technologies Corporation Peak power and speckle contrast reduction for a single laser pulse
US7453486B2 (en) 2000-12-13 2008-11-18 Orbotech Ltd Pulse light pattern writer
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US8665536B2 (en) * 2007-06-19 2014-03-04 Kla-Tencor Corporation External beam delivery system for laser dark-field illumination in a catadioptric optical system
US20090080467A1 (en) * 2007-09-24 2009-03-26 Andrei Starodoumov Pulse repetition frequency-multipler for fiber lasers
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JP5483176B2 (ja) * 2009-11-25 2014-05-07 独立行政法人理化学研究所 電磁波パルス列生成装置
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US9660339B2 (en) * 2010-12-04 2017-05-23 Chian Chiu Li Beam steering and manipulating apparatus and method
CN102162938B (zh) * 2011-04-14 2013-01-30 福州高意光学有限公司 一种提高脉冲激光器输出频率的光学结构
US9793673B2 (en) 2011-06-13 2017-10-17 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US8582611B2 (en) * 2012-01-20 2013-11-12 Coherent, Inc. Frequency-tripled fiber-MOPA
US9383753B1 (en) * 2012-09-26 2016-07-05 Google Inc. Wide-view LIDAR with areas of special attention
US9151940B2 (en) 2012-12-05 2015-10-06 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
JP6488298B2 (ja) 2013-08-09 2019-03-20 ケーエルエー−テンカー コーポレイション 改善した検出感度のマルチスポット照明
US9525265B2 (en) * 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
CN104538832A (zh) * 2014-11-19 2015-04-22 中国科学院光电研究院 脉冲激光时间域倍频装置
CN104503098A (zh) * 2014-11-26 2015-04-08 大族激光科技产业集团股份有限公司 激光合束系统
CN104934841A (zh) * 2015-06-23 2015-09-23 南京朗研光电科技有限公司 一种高能脉冲激光分离压缩方法及装置
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法

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Also Published As

Publication number Publication date
US20010021206A1 (en) 2001-09-13
US6765934B2 (en) 2004-07-20
EP1105950B1 (de) 2003-10-15
CN1310871A (zh) 2001-08-29
IL141487A0 (en) 2002-03-10
DE69819044T2 (de) 2004-08-12
AU8882698A (en) 2000-03-14
WO2000011766A1 (en) 2000-03-02
EP1105950A1 (de) 2001-06-13
IL141487A (en) 2004-07-25
US6275514B1 (en) 2001-08-14
JP2002523905A (ja) 2002-07-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee