CN115305454B - Magnetron device and magnetron sputtering equipment - Google Patents
Magnetron device and magnetron sputtering equipment Download PDFInfo
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- CN115305454B CN115305454B CN202211030289.2A CN202211030289A CN115305454B CN 115305454 B CN115305454 B CN 115305454B CN 202211030289 A CN202211030289 A CN 202211030289A CN 115305454 B CN115305454 B CN 115305454B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The invention provides a magnetron device and magnetron sputtering equipment, which comprises a rotating shaft, a rotating cross beam, a magnetron assembly and two limiting assemblies, wherein the rotating shaft can rotate around a first axis of the rotating shaft along a first direction or a second direction opposite to the first direction; the rotating shaft and the rotating cross beam are connected in a relatively rotatable mode around a second axis; the magnetron assembly is connected with the rotary cross beam; the two limiting assemblies are arranged on the rotary cross beam and are oppositely arranged at two sides of the second axis along the extending direction of the rotary cross beam, the rotary shaft is positioned between the two limiting assemblies, and a positioning structure for positioning and matching with the limiting assemblies is arranged on the rotary shaft; the positioning structure is used for being matched with the corresponding limiting assembly when the rotating shaft rotates to a preset position along the first direction or the second direction, so that the rotating shaft and the rotating cross beam synchronously rotate. The magnetron device provided by the invention can solve the problem of motor torque overload alarm caused by amplified motor disturbance.
Description
Technical Field
The invention relates to the field of magnetron sputtering equipment, in particular to a magnetron device and magnetron sputtering equipment.
Background
The top structure of a typical physical vapor deposition (Physical Vapor Deposition, hereinafter referred to as PVD) apparatus is shown in fig. 1, which includes a target 03 and a cooling cavity 02 disposed above the target 03, wherein the cooling cavity 02 is made of an insulating material or a combination of an insulating material and a metal material, the cooling cavity 02 is filled with cooling water 05, a magnetron is immersed in the cooling water 05, and the cooling water 05 is used for cooling heat generated during sputtering of the target 03; the output power of the sputtering power supply 04 is directly or indirectly fed into the target 03, and the driving mechanism 01 for driving the magnetron to rotate is generally composed of a rotating shaft, a motor, a transmission assembly and other components.
Magnetron (Magnet) is the core of magnetron sputtering, and in the semiconductor industry, in order to prevent particles/clusters sputtered from the target 03 from forming redeposition and thus particles on the surface of the target 03, it is generally required that the magnetron device is capable of achieving full target erosion. However, with the continuous development and iteration of semiconductor technology, higher requirements are put on PVD deposition technology, especially in some processes requiring hole filling, in order to improve the step coverage of holes, reduce the difference in coverage between wafer center and edge, and require finer and more strict control of the sputtering area, which is contradictory to the realization of all-target corrosion.
The magnetic control device with double magnetrons and double positions solves the contradiction well, but the magnetic control device can sporadically generate the phenomenon that tiny disturbance of a motor is amplified, so that the torque of the motor is overloaded to generate an alarm.
Disclosure of Invention
The invention aims to at least solve one of the technical problems in the prior art, and provides a magnetron device and magnetron sputtering equipment, which can solve the problem of motor torque overload alarm caused by motor disturbance amplified.
To achieve one of the objects of the present invention, there is provided a magnetron apparatus comprising: the magnetron comprises a rotating shaft, a rotating cross beam, a magnetron assembly and two limiting assemblies, wherein the rotating shaft can rotate around a first axis of the rotating shaft along a first direction or a second direction opposite to the first direction; the rotating shaft and the rotating cross beam are connected in a relatively rotatable mode around a second axis; the magnetron assembly is connected with the rotary cross beam;
the two limiting assemblies are arranged on the rotary cross beam, and are oppositely arranged on two sides of the second axis along the extending direction of the rotary cross beam, the rotary shaft is positioned between the two limiting assemblies, and a positioning structure for positioning and matching with the limiting assemblies is arranged on the rotary shaft;
the positioning structure is used for being matched with the corresponding limiting assembly when the rotating shaft rotates to a preset position along the first direction or the second direction, so that the rotating shaft and the rotating cross beam synchronously rotate.
Optionally, each limiting component comprises a limiting plate, a movable limiting piece and a pushing component, wherein,
the limiting plate is arranged on the rotary cross beam, a matching through hole is formed in the limiting plate, and the movable limiting piece is arranged in the matching through hole and can extend or retract relative to the matching through hole;
the pushing component is arranged on the rotary cross beam, and is used for pushing the movable limiting piece to extend out of the matching through hole and match with the positioning structure when the rotary shaft rotates to the preset position; the pushing assembly is further used for enabling the movable limiting piece to retract into the matching through hole so as to release the matching of the movable limiting piece and the positioning structure.
Optionally, a limiting block is further disposed on the limiting plate, and when the rotating shaft rotates to the preset position, the limiting block abuts against the rotating shaft to block the rotating shaft from continuing to rotate.
Optionally, the positioning structure is a limiting recess disposed on the rotating shaft, and when the rotating shaft rotates to the preset position, a part of the movable limiting member is located in the limiting recess.
Optionally, the movable limiting piece is a sphere; the diameter of the openings at both ends of the fitting through hole is smaller than the maximum diameter of the sphere to movably define the sphere in the fitting through hole.
Optionally, the outer surface of the movable limiting piece in the limiting concave part is matched with the inner surface of the limiting concave part.
Optionally, the pushing component comprises a base, a pushing piece, a first positioning column and a second positioning column, wherein,
the base is connected with the rotary cross beam, and the pushing piece is rotatably connected with the surface of the base, which is away from the rotary cross beam, through a pivot; the first positioning column and the second positioning column are arranged on the surface, deviating from the rotary cross beam, of the base and are positioned on two sides of the pushing piece, and the pushing piece abuts against the first positioning column when rotating to a first position and abuts against the second positioning column when rotating to a second position;
when the pushing piece is positioned at the second position, the movable limiting piece can be pushed to extend out of the matching through hole, and the movable limiting piece is limited to be positioned at a position matched with the positioning structure; when the pushing piece is located at the first position, the limit of the movable limiting piece can be released.
Optionally, the pushing component further comprises a reset elastic piece, one end of the reset elastic piece is connected with the pushing piece, the other end of the reset elastic piece is connected with the rotating cross beam, and the reset elastic piece is used for resetting the pushing piece to the first position under the action of no driving force.
Optionally, the pushing piece comprises a push rod and a water blocking piece, wherein one end of the push rod is used for pushing the movable limiting piece to extend out of the matching through hole, and the other end of the push rod is connected with the water blocking piece; the water retaining sheet is used for driving the ejector rod to rotate to the second position against the elastic force of the reset elastic piece under the action of water resistance when the magnetron device is immersed in water.
As another technical scheme, the invention also provides magnetron sputtering equipment, which comprises a process chamber, wherein a target is arranged at the top of the process chamber, and a cooling cavity containing cooling water is arranged above the target.
The invention has the following beneficial effects:
the magnetron device provided by the invention is characterized in that two limiting assemblies and a positioning structure are arranged on a rotary beam, and when the rotary shaft rotates to a preset position along a first direction or a second direction opposite to the first direction, the rotary shaft is matched with the corresponding limiting assemblies so as to enable the rotary shaft and the rotary beam to synchronously rotate. Through the cooperation of location structure and spacing subassembly, can inject the relative position between rotation axis and the rotatory crossbeam, make the two constitute rigid connection, this kind of connected mode can remain the relative fixation of rotation axis and rotatory crossbeam all the time, can not receive the influence of motor rotational speed disturbance to can improve connection stability, avoid the motor torque overload warning's that is aroused because of the motor disturbance is enlarged problem.
The magnetron sputtering equipment provided by the invention can improve the connection stability and avoid the problem of motor torque overload alarm caused by amplified motor disturbance by adopting the magnetron device provided by the invention.
Drawings
FIG. 1 is a partial block diagram of a PVD apparatus of the prior art;
FIG. 2 is a block diagram of a magnetron apparatus according to an embodiment of the invention;
FIG. 3 is a block diagram of a limiting plate employed in an embodiment of the present invention;
FIG. 4 is a vertical cross-sectional view of the stop plate of FIG. 3;
FIG. 5 is a vertical cross-section at area A of FIG. 4;
FIG. 6 is a view showing the movable stopper according to the embodiment of the present invention extended leftward;
FIG. 7 is a view showing the movable stopper according to the embodiment of the present invention extended rightward;
FIG. 8 is a top view of a magnetron apparatus according to an embodiment of the invention;
FIG. 9 is a block diagram of a base, a first positioning column, and a second positioning column employed in an embodiment of the present invention;
FIG. 10 is a diagram showing the state of the pushing member used in the embodiment of the present invention when the movable stopper is pushed to protrude from the mating through hole;
fig. 11 to 13 are views showing the process of matching the magnetron device with two limiting assemblies when the rotation shaft rotates from right to left and then from left to right.
Detailed Description
In order to enable those skilled in the art to better understand the technical scheme of the present invention, the temperature control device and the reaction chamber using the same provided by the present invention are described in detail below with reference to the accompanying drawings.
In the description of the present invention, it should be noted that the directions or positional relationships indicated by the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. are based on the directions or positional relationships shown in the drawings, are merely for convenience of describing the present invention and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present invention will be understood in specific cases by those of ordinary skill in the art.
In addition, the technical features of the different embodiments of the present invention described below may be combined with each other as long as they do not collide with each other.
Referring to fig. 2, an embodiment of the present invention provides a magnetron apparatus, which includes: the magnetron device comprises a rotating shaft 3, a rotating cross beam 1, a magnetron assembly and two limiting assemblies 5, wherein the rotating shaft 3 can rotate around a first axis O1 of the rotating shaft along a first direction or a second direction opposite to the first direction; the rotary shaft 3 is connected, for example, directly or through a transmission structure, to a driving source (not shown in the drawings) for providing a rotational driving force so that the rotary shaft 3 can rotate in either forward or reverse directions (i.e., a first direction or a second direction opposite thereto). The driving source is, for example, a motor.
The rotation shaft 3 is rotatably connected to the rotation cross member 1 about a second axis O2, which second axis O2 is arranged eccentrically to the first axis O1, and optionally the second axis O2 is parallel to the first axis O1, for example both are arranged in a vertical direction. Since the second axis O2 is disposed eccentrically to the first axis O1, the rotation shaft 3 rotates around its own first axis O1 and also rotates around the second axis O2 with respect to the rotation cross member 1. Alternatively, the rotation shaft 3 and the rotation beam 1 may be rotatably connected through a linear bearing 4, but the embodiment of the present invention is not limited thereto, and the rotation connection may be implemented in any other manner in practical applications.
The magnetron assembly is connected with the rotating cross beam. Optionally, the magnetron assembly includes two magnetrons 2, both of which are connected with the rotary beam 1, and may be specifically located below the rotary beam 1, and the two magnetrons 2 are relatively disposed on two sides of the first axis O1 along the extending direction of the rotary beam 1, and weights of the two magnetrons 2 are designed to make the weights of the two magnetrons 2 identical, so as to ensure uniformity of stress of the linear bearing. Meanwhile, the radial distances of the two magnetrons 2 from the first axis are different. When the rotation shaft 3 rotates clockwise, the rotation shaft 3 rotates to a position close to the right magnetron 2 with respect to the rotation cross member 1, and at this time, the radial distance between the right magnetron 2 and the first axis O1 is smaller than the radial distance between the left magnetron 2 and the first axis O1; when the rotation shaft 3 rotates counterclockwise, the rotation shaft 3 rotates to a position close to the left magnetron 2 with respect to the rotation cross member 1, and at this time, the radial distance between the left magnetron 2 and the first axis O1 is smaller than the radial distance between the right magnetron 2 and the first axis O1. When the process is carried out, the magnetrons 2 far away from the first axis O1 are deactivated by being positioned above the grounding point, and the magnetrons 2 close to the first axis O1 are normally activated, so that the switching between the inside and the outside of the target range of the two magnetrons 2 can be controlled by switching the rotation direction of the rotating shaft 3, and different process requirements can be met. In practical applications, the number of magnetrons 2 may be one or more than three, which is not particularly limited in the embodiment of the present invention.
The two limiting assemblies 5 are arranged on the rotary beam 1 and are oppositely arranged at two sides of the first axis O1 along the extending direction of the rotary beam 1, the rotary shaft 3 is positioned between the two limiting assemblies 5, and a positioning structure for positioning and matching with the limiting assemblies 5 is arranged on the rotary shaft 3; the positioning structure is used for being matched with the corresponding limiting assembly 5 when the rotating shaft 3 rotates to a preset position along the first direction or the second direction, so that the rotating shaft 3 and the rotating cross beam 1 synchronously rotate. The preset positions are set, for example, at positions close to the two magnetrons 2, respectively, so that the radial distances of the two magnetrons 2 from the first axis O1 are different. In practical applications, the preset position can be adaptively adjusted according to different structures of the magnetron assemblies.
The positioning structure on the rotating shaft 3 is matched with the limiting component 5, so that the relative position between the rotating shaft 3 and the rotating beam 1 can be limited, the rotating shaft 3 and the rotating beam 1 form rigid connection, the relative fixation of the rotating shaft 3 and the rotating beam 1 can be always kept by the connection mode, the influence of motor rotation speed disturbance can be avoided, the connection stability can be improved, and the problem of motor torque overload alarm caused by motor disturbance amplified is avoided.
The above-mentioned limit assemblies 5 may have various structures, in some alternative embodiments, please refer to fig. 2 to 10, each limit assembly 5 includes a limit plate 51, a movable limit piece 52 and a pushing assembly 53, wherein the limit plate 51 is disposed on the rotating beam 1, and optionally, the plate surfaces of the limit plates 51 in the two limit assemblies 5 are opposite to each other and are all vertically disposed. The limiting plate 51 is provided with a matching through hole 511, and the movable limiting piece 52 is arranged in the matching through hole 511 and can extend or retract relative to the matching through hole 511; the pushing component 53 is disposed on the rotating beam 1, and when the rotating shaft 3 rotates to the preset position, the pushing component 53 is used for pushing the movable limiting piece 52 to extend out of the matching through hole 511 and match with the positioning structure on the rotating shaft 3, and at this time, the relative position between the rotating shaft 3 and the rotating beam 1 can be limited, so that the two form a rigid connection; the pushing assembly 5 is further configured to enable the movable limiting member 52 to retract into the engaging through hole 511, so as to release the engagement between the movable limiting member 52 and the positioning structure on the rotating shaft 3, and at this time, the rotating shaft 3 and the rotating beam 1 can rotate relatively to allow the rotating shaft 3 to rotate reversely. Alternatively, as shown in fig. 4, the engaging through hole 511 penetrates the limiting plate 51 in the thickness direction of the limiting plate 51, and the movable limiting member 52 may protrude with respect to the plate surface of the limiting plate 51 when protruding with respect to the engaging through hole 511.
In some alternative embodiments, in order to limit the rotation shaft 3 to the preset position to further improve the limiting reliability, as shown in fig. 3, a limiting block 512 is further disposed on the limiting plate 51, and when the rotation shaft 3 rotates to the preset position, the limiting block 512 abuts against the rotation shaft 3 to block the rotation shaft 3 from further rotating. In this case, the rotating shaft 3 is not only blocked by the limiting block 512, but also rigidly connected with the rotating beam 1 by the cooperation of the movable limiting piece 52 and the positioning structure on the rotating shaft 3, so that the rotating shaft 3 and the rotating beam 1 can be kept relatively fixed all the time and cannot be influenced by the disturbance of the motor rotation speed.
Specifically, as shown in fig. 2 and 3, the rotating shaft 3 is cylindrical, the limiting block 512 adopts a wedge structure, and an inclined plane on the wedge structure can be matched with the outer circumferential surface of the rotating shaft 3 when the rotating shaft 3 rotates to a preset position, so that impact force on the rotating shaft 3 can be reduced, and damage to the rotating shaft 3 is avoided. In addition, the limiting block 512 is disposed on the plate surface of the limiting plate 51 and is located at a side close to the rotating shaft 3, and when the limiting block 512 abuts against the rotating shaft 3, the rotating shaft 3 is opposite to the plate surface of the limiting plate 51, so that the position of the positioning structure on the rotating shaft 3 corresponds to the position of the movable limiting member 52, and when the movable limiting member 52 protrudes from the engaging through hole 511, the positioning structure on the rotating shaft 3 can be engaged.
In some alternative embodiments, as shown in fig. 10, the positioning structure on the rotating shaft 3 is a limiting recess 31 provided on the rotating shaft 3, and when the rotating shaft 3 rotates to the preset position, a part of the movable limiting member 52 (i.e., a portion 52b protruding from the mating through hole 511) is located in the limiting recess 31. Specifically, when the rotating shaft 3 rotates to the preset position, the pushing component 53 pushes the movable limiting piece 52 to extend out of the matching through hole 511 and extend into the limiting concave part 31, and at this time, the relative position between the rotating shaft 3 and the rotating beam 1 can be limited, so that the two can form a rigid connection; the pushing assembly 53 also enables the movable stopper 52 to be removed from the stopper recess 31 and retracted into the fitting through hole 511, at which time relative rotation between the rotating shaft 3 and the rotating beam 1 can be generated to allow the rotating shaft 3 to reversely rotate. Of course, in practical application, the positioning structure of the movable limiting member 52 and the rotating shaft 3 may be any other matching manner, which is not particularly limited in the embodiment of the present invention.
In some alternative embodiments, as shown in fig. 4 to 7, the movable stopper 52 is a sphere; as shown in fig. 5, both end opening diameters D1 of the fitting through holes 511 are smaller than the maximum diameter D2 of the sphere to movably define the sphere in the fitting through holes 511. It is easily understood that a portion of the sphere having a diameter smaller than the opening diameter D1 of the fitting through hole 511 (i.e., the portion 52b protruding from the fitting through hole 511 in fig. 10) may protrude out of the fitting through hole, and a portion of the sphere having a diameter larger than the opening diameter D1 of the fitting through hole (i.e., the middle portion 52a of the sphere in fig. 5) may be restrained in the fitting through hole 511, thereby both ensuring that the sphere does not completely escape from the fitting through hole 511 and enabling a portion of the sphere to protrude out of the fitting through hole 511. The above-mentioned sphere is simply and reliably fitted to the fitting through hole 511. As shown in fig. 6 and 7, by adopting the above-described fitting manner of the ball with the fitting through hole 511, a part of the ball may protrude from the fitting through hole 511 toward the left side end in fig. 6, or may protrude from the fitting through hole 511 toward the right side end in fig. 7. Further alternatively, the diameter of the sphere may satisfy: while a portion of the ball protrudes from one of the ends of the mating through hole 511, another portion of the ball is retracted from the other end of the mating through hole 511, which helps to free the movable stopper (i.e., ball) 52 of the push assembly 53. It should be noted that, in practical applications, the movable limiting member 52 may be a column, a rod, or any other structure, which is not particularly limited in the embodiment of the present invention.
In addition, alternatively, the outer surface of the movable stopper 52 located in the stopper recess 31 (i.e., the outer surface of the portion 52b protruding from the fitting through hole 511) is fitted with the inner surface of the stopper recess 31, so that the fitting reliability of the movable stopper 52 with the stopper recess 31 can be further improved, and the rigid connection of the rotation shaft 3 with the rotation cross member 1 can be ensured.
The structure of the pushing assembly 53 may be various, and in some alternative embodiments, as shown in fig. 8 and 9, the pushing assembly 53 includes a base 531, a pushing member 532, a first positioning post 533a and a second positioning post 533b, where the base 531 is connected to the rotating beam 1, and the pushing member 532 is rotatably connected to a surface of the base 531 facing away from the rotating beam through a pivot 534, and in particular, as shown in fig. 9, a surface of the base 531 facing away from the rotating beam 1 (i.e., a top surface in fig. 9) is provided with a mounting hole 531a, and the pivot 534 is connected to the mounting hole 531a, for example, the mounting hole 531a is a threaded hole, and the pivot 534 penetrates the pushing member 532 and is in threaded connection with the threaded hole. The first positioning column 533a and the second positioning column 533b are disposed on the surface of the base 531 facing away from the rotating beam 1 and are located on two sides of the pushing member 532, and the pushing member 532 abuts against the first positioning column 533a when rotating to the first position and abuts against the second positioning column 533b when rotating to the second position, that is, the pushing member 532 may be limited to the first position and the second position by the first positioning column 533a and the second positioning column 533 b. Moreover, as shown in fig. 8, the pusher 532 on the left is located at the second position, where the pusher 532 abuts against the second positioning post 533b, so that the pusher 532 can be limited to the second position, where the pusher 532 can push the movable stopper (e.g., a portion of a sphere) 52 to protrude from the engagement through hole 511, and limit the movable stopper 52 to be located at a position engaged with the positioning structure (e.g., the limit recess 31), that is, the pusher 532 always applies a pushing force to the movable stopper 52; the pusher 532 on the right is in the first position, and the pusher 532 can release the limit on the movable limiter 52, i.e., the pusher 532 does not apply a pushing force to the movable limiter 52, so that the movable limiter 52 can automatically disengage from the positioning structure (e.g., the limit recess 31). As shown in fig. 6 and 7, when the movable stopper 52 (i.e., a sphere) is in a free state, it is freely movable in the fitting through hole 511, and at this time, the rigid connection of the rotation shaft 3 to the rotation cross member 1 is released, and the rotation shaft 3 can be reversely rotated.
The pushing member 532 may be rotated between the first position and the second position by a driving force of a driving source, which may be a motor, a cylinder, a hydraulic cylinder, or the like, or may be driven by water resistance when the rotating shaft 3 rotates the rotating cross member 1 under an environmental condition that the magnetron apparatus is immersed in water. Taking the top structure of the PVD apparatus shown in fig. 1 as an example, a cooling cavity 02 above the target 03 is filled with cooling water 05, and the magnetron is immersed in the cooling water 05, and the cooling water 05 is used to cool heat generated during sputtering of the target 03. The magnetron device provided by the embodiment of the invention can be applied to the PVD equipment as well, namely, the magnetron device can be immersed in cooling water 05, and under the environmental condition, when the rotating shaft 3 drives the rotating beam 1 to rotate, the driving force can be obtained by means of the resistance of the cooling water 05.
In some alternative embodiments, as shown in fig. 8, the pushing assembly 53 further includes a restoring elastic member 535, where one end of the restoring elastic member 535 is connected to the pushing member 532, and the other end of the restoring elastic member 535 is connected to the rotating beam 1, and the restoring elastic member 535 is used to restore the pushing member 532 to the first position (i.e., the position where the pushing member 532 on the right side in fig. 8) when not receiving the driving force. In this way, the pushing member 532 may rotate from the first position to the second position (i.e., the position of the pushing member 532 on the left in fig. 8) against the elastic force of the restoring elastic member 535 under the driving force of the driving source, and be restored from the second position to the first position under the elastic force of the restoring elastic member 535 when the driving source stops providing the driving force.
Alternatively, as shown in fig. 8, the restoring elastic member 535 is an extension spring, a mounting plate 536 is disposed on the rotating beam 1, one end of the extension spring is fixedly connected to the mounting plate 536, the other end of the extension spring is fixedly connected to the pushing member 532, the extension spring is located at the first position when the extension spring is in the original state (i.e., the state where the extension spring on the right side in fig. 8 is located), and the extension spring is located in the extended state (i.e., the state where the extension spring on the left side in fig. 8 is located) when the pushing member 532 is rotated from the first position to the second position under the driving force of the driving source.
In some alternative embodiments, in an environment where the magnetron apparatus is immersed in water, the pushing member 532 may include a push rod 532a and a water blocking piece 532b as shown in fig. 8 when the driving force is obtained by means of the resistance of water, wherein one end of the push rod 532a is used to push the movable stopper 52 to protrude from the fitting through hole 511, and the other end of the push rod 532a is connected to the water blocking piece 532 b; the water blocking piece 532b is used for blocking waterForce (i.e. F Water resistance ) The push rod 532a is driven to rotate to the second position against the elastic force of the reset elastic member 535. Specifically, when the rotation shaft 3 rotates the rotation cross member 1 and reaches a certain rotation speed, the water resistance (i.e., F Water resistance ) The elastic force of the restoring elastic member 535 is increased to a magnitude sufficient to overcome, so that the water blocking piece 532b drives the push rod 532a to rotate. When the rotation direction of the rotation shaft 3 needs to be switched, the rotation speed of the rotation shaft 3 is gradually reduced until the rotation is stopped, in the process, the resistance of the water received by the water blocking piece 532b is gradually reduced until the resistance is smaller than the elastic force of the reset elastic piece 535, and at the moment, the water blocking piece 532b drives the ejector rod 532a to reset to the first position under the elastic force of the reset elastic piece 535. Alternatively, when the restoring elastic member 535 is an extension spring, the connection position of the extension spring and the pushing member 532 is located at one end of the push rod 532a near the water blocking piece 532b, so that the direction of the elastic force applied by the extension spring can be opposite to the resistance direction of water. In addition, the water blocking piece 532b may be replaced with another member having a sufficient water blocking area, which generates a driving force by using the resistance of water, and the embodiment of the present invention is not particularly limited.
The working process of the magnetron device provided by the embodiment of the invention is as follows: as shown in fig. 11, the rotation shaft 3 is at the initial position and is at a stationary state, at this time, the water blocking pieces 532b at both sides thereof are not driven, and the ejector rods 532a at both sides thereof are at the first position. As shown in fig. 12, when the rotating shaft 3 rotates counterclockwise from the initial position to the preset position, it abuts against the left limiting block 512, at this time, the rotating shaft 3 drives the rotating beam 1 to rotate counterclockwise, and before the rotating shaft 3 reaches the preset position, the rotating beam 1 is still. When the rotation shaft 3 rotates the rotation cross member 1 and reaches a certain rotation speed, the water resistance (i.e., F Water resistance ) The spring force of the restoring spring 535 is increased enough to overcome the left side, so that the left water blocking piece 532b drives the push rod 532a to rotate until the push rod 532a abuts against the second positioning post 533b, i.e. reaches the second position, where the push rod 532a can push the movable limiting member (e.g. a part of a sphere) 52 protrude from the mating through hole 511 and define that the movable stopper 52 is located at a position to be mated with the positioning structure (e.g., the stopper recess 31), i.e., the pusher 532 always applies a pushing force to the movable stopper 52, so that the relative position between the rotation shaft 3 and the rotation cross member 1 can be defined so that the two constitute a rigid connection. As shown in fig. 13, when the rotation direction of the rotation shaft 3 needs to be switched, that is, to rotate clockwise, firstly, the rotation shaft 3 gradually decelerates to stop in the process of rotating counterclockwise, in this process, the resistance of the water received by the left water blocking piece 532b gradually decreases until the resistance is smaller than the elastic force of the reset elastic piece 535, at this time, under the action of the elastic force of the reset elastic piece 535, the left water blocking piece 532b drives the ejector rod 532a to reset to the first position, no thrust is applied to the movable limiting piece 52 any more, so that the movable limiting piece 52 can be automatically separated from the positioning structure (for example, the limiting concave portion 31), at this time, the rigid connection between the rotation shaft 3 and the rotation beam 1 is released, the rotation shaft 3 can reversely rotate in the clockwise direction until the rotation shaft abuts against the right limiting piece 512, at this time, the rotation shaft 3 drives the rotation beam 1 to continue rotating clockwise, and the rigid connection is consistent with the manner adopted in the counterclockwise rotation.
In summary, in the magnetron device provided by the embodiment of the invention, the two limiting assemblies and the positioning structure arranged on the rotating shaft are arranged on the rotating beam, and when the rotating shaft rotates to a preset position along the first direction or the second direction opposite to the first direction, the positioning structure is matched with the corresponding limiting assemblies so as to enable the rotating shaft and the rotating beam to synchronously rotate. Through the cooperation of location structure and spacing subassembly, can inject the relative position between rotation axis and the rotatory crossbeam, make the two constitute rigid connection, this kind of connected mode can remain the relative fixation of rotation axis and rotatory crossbeam all the time, can not receive the influence of motor rotational speed disturbance to can improve connection stability, avoid the motor torque overload warning's that is aroused because of the motor disturbance is enlarged problem.
As another technical scheme, the embodiment of the invention also provides magnetron sputtering equipment, which comprises a process chamber, wherein a target is arranged at the top of the process chamber, and a cooling cavity containing cooling water is arranged above the target.
The magnetron sputtering device provided by the embodiment of the invention can improve the connection stability and avoid the problem of motor torque overload alarm caused by amplified motor disturbance.
It is to be understood that the above embodiments are merely illustrative of the application of the principles of the present invention, but not in limitation thereof. Various modifications and improvements may be made by those skilled in the art without departing from the spirit and substance of the invention, and are also considered to be within the scope of the invention.
Claims (10)
1. A magnetron apparatus characterized by comprising: the magnetron comprises a rotating shaft, a rotating cross beam, a magnetron assembly and two limiting assemblies, wherein the rotating shaft can rotate around a first axis of the rotating shaft along a first direction or a second direction opposite to the first direction; the rotating shaft and the rotating cross beam are connected in a relatively rotatable mode around a second axis; the magnetron assembly is connected with the rotary cross beam;
the two limiting assemblies are arranged on the rotary cross beam, and are oppositely arranged on two sides of the second axis along the extending direction of the rotary cross beam, the rotary shaft is positioned between the two limiting assemblies, and a positioning structure for positioning and matching with the limiting assemblies is arranged on the rotary shaft;
the positioning structure is used for being matched with the corresponding limiting assembly when the rotating shaft rotates to a preset position along the first direction or the second direction, so that the rotating shaft and the rotating cross beam synchronously rotate.
2. The magnetron apparatus of claim 1 wherein each of the spacing assemblies includes a spacing plate, a movable spacing member, and a push assembly, wherein,
the limiting plate is arranged on the rotary cross beam, a matching through hole is formed in the limiting plate, and the movable limiting piece is arranged in the matching through hole and can extend or retract relative to the matching through hole;
the pushing component is arranged on the rotary cross beam, and is used for pushing the movable limiting piece to extend out of the matching through hole and match with the positioning structure when the rotary shaft rotates to the preset position; the pushing assembly is further used for enabling the movable limiting piece to retract into the matching through hole so as to release the matching of the movable limiting piece and the positioning structure.
3. The magnetron apparatus of claim 2 wherein a stopper is further provided on the stopper plate, and the stopper abuts against the rotation shaft to block the rotation shaft from continuing to rotate when the rotation shaft rotates to the preset position.
4. The magnetron apparatus of claim 2 wherein the locating structure is a limit recess provided on the rotating shaft in which a portion of the movable limit piece is located when the rotating shaft rotates to the preset position.
5. The magnetron apparatus of claim 2 wherein the movable stop is a sphere; the diameter of the openings at both ends of the fitting through hole is smaller than the maximum diameter of the sphere to movably define the sphere in the fitting through hole.
6. The magnetron apparatus of claim 4 wherein an outer surface of the movable stop located in the stop recess mates with an inner surface of the stop recess.
7. The magnetron apparatus of claim 2 wherein the push assembly includes a base, a push member, a first positioning post, and a second positioning post, wherein,
the base is connected with the rotary cross beam, and the pushing piece is rotatably connected with the surface of the base, which is away from the rotary cross beam, through a pivot; the first positioning column and the second positioning column are arranged on the surface, deviating from the rotary cross beam, of the base and are positioned on two sides of the pushing piece, and the pushing piece abuts against the first positioning column when rotating to a first position and abuts against the second positioning column when rotating to a second position;
when the pushing piece is positioned at the second position, the movable limiting piece can be pushed to extend out of the matching through hole, and the movable limiting piece is limited to be positioned at a position matched with the positioning structure; when the pushing piece is located at the first position, the limit of the movable limiting piece can be released.
8. The magnetron apparatus of claim 7 wherein the push assembly further comprises a return spring having one end connected to the push member and the other end connected to the rotating beam, the return spring being configured to return the push member to the first position when not subjected to the driving force.
9. The magnetron apparatus of claim 8 wherein the pushing member includes a push rod and a water blocking piece, wherein one end of the push rod is used for pushing the movable limiting member to protrude from the fitting through hole, and the other end of the push rod is connected with the water blocking piece; the water retaining sheet is used for driving the ejector rod to rotate to the second position against the elastic force of the reset elastic piece under the action of water resistance when the magnetron device is immersed in water.
10. Magnetron sputtering apparatus comprising a process chamber, a target being provided on top of the process chamber and a cooling chamber containing cooling water being provided above the target, characterized in that it further comprises a magnetron device according to any one of claims 1 to 9 immersed in the cooling water in the cooling chamber.
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| CN202211030289.2A CN115305454B (en) | 2022-08-26 | 2022-08-26 | Magnetron device and magnetron sputtering equipment |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202211030289.2A CN115305454B (en) | 2022-08-26 | 2022-08-26 | Magnetron device and magnetron sputtering equipment |
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| CN115305454B true CN115305454B (en) | 2023-09-08 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6228236B1 (en) * | 1999-10-22 | 2001-05-08 | Applied Materials, Inc. | Sputter magnetron having two rotation diameters |
| CN101195906A (en) * | 2006-10-27 | 2008-06-11 | 应用材料股份有限公司 | Position controlled dual magnetron |
| CN105793976A (en) * | 2013-10-24 | 2016-07-20 | 梅耶博格（德国）股份有限公司 | Multi-magnet arrangement |
| CN108950499A (en) * | 2017-05-18 | 2018-12-07 | 北京北方华创微电子装备有限公司 | Magnetron rotational structure, magnetron assembly and reaction chamber |
| CN114156149A (en) * | 2021-11-25 | 2022-03-08 | 北京北方华创微电子装备有限公司 | Magnetron device and semiconductor processing equipment |
-
2022
- 2022-08-26 CN CN202211030289.2A patent/CN115305454B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6228236B1 (en) * | 1999-10-22 | 2001-05-08 | Applied Materials, Inc. | Sputter magnetron having two rotation diameters |
| CN101195906A (en) * | 2006-10-27 | 2008-06-11 | 应用材料股份有限公司 | Position controlled dual magnetron |
| CN105793976A (en) * | 2013-10-24 | 2016-07-20 | 梅耶博格（德国）股份有限公司 | Multi-magnet arrangement |
| CN108950499A (en) * | 2017-05-18 | 2018-12-07 | 北京北方华创微电子装备有限公司 | Magnetron rotational structure, magnetron assembly and reaction chamber |
| CN114156149A (en) * | 2021-11-25 | 2022-03-08 | 北京北方华创微电子装备有限公司 | Magnetron device and semiconductor processing equipment |
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| CN115305454A (en) | 2022-11-08 |
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