CN115305454A - Magnetron device and magnetron sputtering apparatus - Google Patents
Magnetron device and magnetron sputtering apparatus Download PDFInfo
- Publication number
- CN115305454A CN115305454A CN202211030289.2A CN202211030289A CN115305454A CN 115305454 A CN115305454 A CN 115305454A CN 202211030289 A CN202211030289 A CN 202211030289A CN 115305454 A CN115305454 A CN 115305454A
- Authority
- CN
- China
- Prior art keywords
- limiting
- rotating shaft
- rotating
- magnetron
- pushing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a magnetron device and magnetron sputtering equipment, which comprise a rotating shaft, a rotating beam, a magnetron assembly and two limiting assemblies, wherein the rotating shaft can rotate around a first axis of the rotating shaft along a first direction or a second direction opposite to the first direction; the rotating shaft is connected with the rotating beam in a manner of relatively rotating around a second axis; the magnetron component is connected with the rotary beam; the two limiting assemblies are arranged on the rotating beam and are oppositely arranged on two sides of the second axis along the extending direction of the rotating beam, the rotating shaft is positioned between the two limiting assemblies, and a positioning structure used for positioning and matching with the limiting assemblies is arranged on the rotating shaft; the positioning structure is used for being matched with the corresponding limiting assembly when the rotating shaft rotates to a preset position along the first direction or the second direction, so that the rotating shaft and the rotating beam rotate synchronously. The magnetron device provided by the invention can solve the problem of motor torque overload alarm caused by amplified motor disturbance.
Description
Technical Field
The invention relates to the field of magnetron sputtering equipment, in particular to a magnetron device and magnetron sputtering equipment.
Background
A top structure of a typical Physical Vapor Deposition (PVD) apparatus is shown in fig. 1, and includes a target 03 and a cooling cavity 02 disposed above the target 03, where the cooling cavity 02 is made of an insulating material or a combination of an insulating material and a metal material, the cooling cavity 02 is filled with cooling water 05, a magnetron is immersed in the cooling water 05, and the cooling water 05 is used for cooling heat generated by sputtering the target 03; the output power of the sputtering power supply 04 is directly or indirectly fed into the target 03, and the driving mechanism 01 for driving the magnetron to rotate generally comprises a rotating shaft, a motor, a transmission assembly and other components.
The magnetron (magnetron) is the core of magnetron sputtering, and in the semiconductor industry, in order to prevent particles/particle clusters sputtered from the target 03 from forming redeposition on the surface of the target 03 and further forming particles, the magnetron device is generally required to be capable of realizing full target corrosion. However, with the continuous development and iteration of semiconductor technology, higher requirements are placed on PVD deposition technology, and in particular, in some processes requiring hole filling, in order to improve the step coverage of holes and reduce the difference in coverage between wafer center and edge, finer and tighter control of the sputtering region is required, which is in contradiction with the realization of full target etching.
The contradiction is solved well by the appearance of the double-magnetic control tube and the double-position magnetic control device, however, the magnetic control device can occasionally cause the phenomenon that the torque of the motor is overloaded and an alarm is generated due to the amplification of the micro disturbance of the motor.
Disclosure of Invention
The invention aims to solve at least one technical problem in the prior art, and provides a magnetron device and magnetron sputtering equipment, which can solve the problem of motor torque overload alarm caused by amplified motor disturbance.
To achieve one of the objects of the present invention, there is provided a magnetron apparatus including: the device comprises a rotating shaft, a rotating beam, a magnetron assembly and two limiting assemblies, wherein the rotating shaft can rotate around a first axis of the rotating shaft along a first direction or a second direction opposite to the first direction; the rotating shaft and the rotating beam are connected in a relatively rotatable manner around a second axis; the magnetron assembly is connected with the rotating beam;
the two limiting assemblies are arranged on the rotating beam and are oppositely arranged on two sides of the second axis along the extending direction of the rotating beam, the rotating shaft is positioned between the two limiting assemblies, and a positioning structure used for being in positioning fit with the limiting assemblies is arranged on the rotating shaft;
the positioning structure is used for being matched with the corresponding limiting assembly when the rotating shaft rotates to a preset position along the first direction or the second direction, so that the rotating shaft and the rotating beam rotate synchronously.
Optionally, each of the limiting assemblies includes a limiting plate, a movable limiting member and a pushing assembly, wherein,
the limiting plate is arranged on the rotating beam, a matching through hole is formed in the limiting plate, and the movable limiting part is arranged in the matching through hole and can extend out or retract relative to the matching through hole;
the pushing assembly is arranged on the rotating cross beam and used for pushing the movable limiting piece to extend out of the matching through hole and match with the positioning structure when the rotating shaft rotates to the preset position; the pushing assembly is further used for enabling the movable limiting part to retract into the matching through hole so as to remove the matching between the movable limiting part and the positioning structure.
Optionally, the limiting plate is further provided with a limiting block, and when the rotating shaft rotates to the preset position, the limiting block abuts against the rotating shaft to block the rotating shaft from continuing to rotate.
Optionally, the positioning structure is a limiting concave portion disposed on the rotating shaft, and when the rotating shaft rotates to the preset position, a part of the movable limiting member is located in the limiting concave portion.
Optionally, the movable limiting part is a sphere; the diameter of the opening at the two ends of the matching through hole is smaller than the maximum diameter of the ball body, so that the ball body can be movably limited in the matching through hole.
Optionally, the outer surface of the movable limiting part in the limiting concave part is matched with the inner surface of the limiting concave part.
Optionally, the pushing assembly includes a base, a pushing member, a first positioning column and a second positioning column, wherein,
the base is connected with the rotating beam, and the pushing piece is rotationally connected with the surface of the base, which deviates from the rotating beam, through a pivot; the first positioning column and the second positioning column are arranged on the surface of the base, which is far away from the rotating cross beam, and are positioned on two sides of the pushing part, the pushing part abuts against the first positioning column when rotating to a first position, and abuts against the second positioning column when rotating to a second position;
when the pushing piece is located at the second position, the pushing piece can push the movable limiting piece to extend out of the matching through hole and limit the movable limiting piece to be located at a position matched with the positioning structure; when the pushing piece is located at the first position, the limiting of the movable limiting piece can be released.
Optionally, the pushing assembly further includes a reset elastic member, one end of the reset elastic member is connected to the pushing member, the other end of the reset elastic member is connected to the rotating beam, and the reset elastic member is used to reset the pushing member to the first position when the pushing member is not subjected to the driving force.
Optionally, the pushing element includes a push rod and a water blocking piece, wherein one end of the push rod is used for pushing the movable limiting element to extend out of the matching through hole, and the other end of the push rod is connected to the water blocking piece; the water blocking sheet is used for driving the ejector rod to rotate to the second position by overcoming the elasticity of the reset elastic piece under the resistance action of water when the magnetron device is immersed in the water.
As another technical scheme, the invention further provides magnetron sputtering equipment which comprises a process chamber, wherein a target is arranged at the top of the process chamber, a cooling cavity filled with cooling water is arranged above the target, and the magnetron device provided by the invention is immersed in the cooling water in the cooling cavity.
The invention has the following beneficial effects:
the magnetron device provided by the invention is characterized in that two limiting assemblies and a positioning structure are arranged on a rotating beam, and when the rotating shaft rotates to a preset position along a first direction or a second direction opposite to the first direction, the rotating shaft is matched with the corresponding limiting assemblies so as to enable the rotating shaft and the rotating beam to rotate synchronously. Through location structure and spacing subassembly cooperation, can inject the relative position between rotation axis and the rotatory crossbeam, make the two constitute rigid connection, this kind of connected mode can remain the relative fixed of rotation axis and rotatory crossbeam throughout, can not receive the influence of motor speed disturbance to can improve connection stability, avoid being enlargeed the problem of the motor moment of torsion overload warning that arouses because of the motor disturbance.
According to the magnetron sputtering device provided by the invention, the connection stability can be improved, and the problem of motor torque overload alarm caused by amplified motor disturbance is avoided.
Drawings
FIG. 1 is a partial block diagram of a PVD apparatus of the prior art;
fig. 2 is a structural view of a magnetron apparatus according to an embodiment of the present invention;
FIG. 3 is a block diagram of a limiting plate used in an embodiment of the invention;
figure 4 is a vertical section of the plate of restriction of figure 3;
FIG. 5 is a vertical cross-sectional view at area A of FIG. 4;
FIG. 6 is a state diagram illustrating a movable position limiting element according to an embodiment of the present invention extending to the left;
FIG. 7 is a diagram illustrating a state where the movable position limiting element extends to the right according to an embodiment of the present invention;
FIG. 8 is a top view of a magnetron apparatus according to an embodiment of the invention;
FIG. 9 is a diagram of a base, a first positioning post and a second positioning post used in an embodiment of the present invention;
FIG. 10 is a diagram illustrating a state of the pushing member used in the embodiment of the present invention when pushing the movable position-limiting member to extend from the through hole;
fig. 11 to 13 are diagrams illustrating the process of the magnetron device according to the embodiment of the present invention when the rotation shaft is rotated from right to left and then rotated from left to right in cooperation with two position-limiting assemblies.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the temperature control device and the reaction chamber using the same provided by the present invention are described in detail below with reference to the accompanying drawings.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In addition, the technical features involved in the different embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
Referring to fig. 2, an embodiment of the present invention provides a magnetron apparatus, including: the device comprises a rotating shaft 3, a rotating beam 1, a magnetron assembly and two limiting assemblies 5, wherein the rotating shaft 3 can rotate around a first axis O1 of the rotating shaft in a first direction or a second direction opposite to the first direction; the rotary shaft 3 is connected, for example, directly or through a transmission structure, to a drive source (not shown) for providing a rotational drive force to enable the rotary shaft 3 to rotate in a normal direction or a reverse direction (i.e., in a first direction or a second direction opposite thereto). The drive source is, for example, a motor.
The rotation axis 3 is connected to the rotating beam 1 in a relatively rotatable manner about a second axis O2, the second axis O2 being arranged eccentrically to the first axis O1, and optionally the second axis O2 is parallel to the first axis O1, for example both in a vertical direction. Since the second axis O2 is disposed eccentrically from the first axis O1, the rotary shaft 3 rotates about the second axis O2 with respect to the rotary beam 1 while rotating about its own first axis O1. Alternatively, the rotating shaft 3 and the rotating beam 1 may be rotatably connected through a linear bearing 4, however, the embodiment of the present invention is not limited to this, and in practical application, any other manner may be adopted to realize the rotational connection.
The magnetron assembly is connected with the rotating beam. Optionally, the magnetron assembly includes two magnetrons 2, both of which are connected to the rotating beam 1, and specifically may be located below the rotating beam 1, and the two magnetrons 2 are oppositely disposed on two sides of the first axis O1 along the extending direction of the rotating beam 1, and the weights of the two magnetrons 2 are the same by designing counterweights of the two magnetrons 2, so as to ensure the uniformity of the stress of the linear bearing. At the same time, the two magnetrons 2 are at different radial distances from the first axis. When the rotating shaft 3 rotates clockwise, the rotating shaft 3 rotates to a position close to the right magnetron 2 relative to the rotating beam 1, and at this time, the radial distance between the right magnetron 2 and the first axis O1 is smaller than the radial distance between the left magnetron 2 and the first axis O1; when the rotating shaft 3 rotates counterclockwise, the rotating shaft 3 rotates to a position close to the left magnetron 2 with respect to the rotating beam 1, and at this time, the radial distance from the left magnetron 2 to the first axis O1 is smaller than the radial distance from the right magnetron 2 to the first axis O1. When the process is carried out, the magnetron 2 far away from the first axis O1 is extinguished due to being positioned above the grounding point, and the magnetron 2 near to the first axis O1 is normally ignited, so that the two magnetrons 2 can be controlled to be switched between the inside and the outside of the target range by switching the rotation direction of the rotating shaft 3, and different process requirements can be met. In practical applications, the number of the magnetrons 2 may be one or more than three, and the embodiment of the invention is not particularly limited in this respect.
The two limiting assemblies 5 are arranged on the rotating beam 1 and are oppositely arranged on two sides of the first axis O1 along the extending direction of the rotating beam 1, the rotating shaft 3 is positioned between the two limiting assemblies 5, and a positioning structure used for positioning and matching with the limiting assemblies 5 is arranged on the rotating shaft 3; the positioning structure is used for being matched with the corresponding limiting assembly 5 when the rotating shaft 3 rotates to a preset position along the first direction or the second direction, so that the rotating shaft 3 and the rotating beam 1 synchronously rotate. The predetermined positions are set, for example, at positions respectively close to the two magnetrons 2 so that the two magnetrons 2 are different in radial distance from the first axis O1. In practical applications, the preset position can be adaptively adjusted according to different structures of the magnetron assembly.
Through the location structure on the rotation axis 3 and the spacing subassembly 5 cooperate, can inject the relative position between rotation axis 3 and the rotatory crossbeam 1, make the two constitute rigid connection, this kind of connected mode can keep rotation axis 3 and rotatory crossbeam 1 relatively fixed throughout, can not receive the influence of motor speed disturbance to can improve connection stability, avoid being enlargeed the problem of the motor moment of torsion overload warning that arouses because of the motor disturbance.
The structure of the limiting assemblies 5 may be various, in some optional embodiments, please refer to fig. 2 to fig. 10, each limiting assembly 5 includes a limiting plate 51, a movable limiting member 52 and a pushing assembly 53, wherein the limiting plate 51 is disposed on the rotating beam 1, and optionally, the plate surfaces of the limiting plates 51 in the two limiting assemblies 5 are opposite to each other and are both disposed vertically. The limiting plate 51 is provided with a matching through hole 511, and the movable limiting member 52 is disposed in the matching through hole 511 and can extend or retract relative to the matching through hole 511; the pushing assembly 53 is disposed on the rotating beam 1, and when the rotating shaft 3 rotates to the preset position, the pushing assembly 53 is configured to push the movable limiting member 52 to extend out of the matching through hole 511 and match with the positioning structure on the rotating shaft 3, so as to limit the relative position between the rotating shaft 3 and the rotating beam 1, and make the two form a rigid connection; the pushing assembly 5 is further configured to enable the movable limiting member 52 to retract into the engaging through hole 511, so as to disengage the movable limiting member 52 from the positioning structure on the rotating shaft 3, and at this time, the rotating shaft 3 and the rotating beam 1 can rotate relatively, so as to allow the rotating shaft 3 to rotate reversely. Alternatively, as shown in fig. 4, the engaging through hole 511 penetrates the limiting plate 51 in the thickness direction of the limiting plate 51, and the movable limiting member 52 may protrude from the plate surface of the limiting plate 51 when protruding relative to the engaging through hole 511.
In some optional embodiments, in order to limit the rotating shaft 3 at the preset position to further improve the limiting reliability, as shown in fig. 3, a limiting block 512 is further disposed on the limiting plate 51, and when the rotating shaft 3 rotates to the preset position, the limiting block 512 abuts against the rotating shaft 3 to block the rotating shaft 3 from continuing to rotate. In this case, the rotating shaft 3 is blocked by the limiting block 512, and forms a rigid connection with the rotating beam 1 under the cooperation of the movable limiting block 52 and the positioning structure on the rotating shaft 3, so that the rotating shaft 3 and the rotating beam 1 can be always kept relatively fixed, and the influence of the rotational speed disturbance of the motor is avoided.
Specifically, as shown in fig. 2 and 3, the rotating shaft 3 is cylindrical, the limiting block 512 adopts a wedge-shaped structure, and an inclined surface on the wedge-shaped structure can be matched with the outer peripheral surface of the rotating shaft 3 when the rotating shaft 3 rotates to a preset position, so that the impact force generated on the rotating shaft 3 can be reduced, and the rotating shaft 3 is prevented from being damaged. In addition, the stopper 512 is disposed on the plate surface of the stopper plate 51 and located on a side close to the rotating shaft 3, and when the stopper 512 abuts against the rotating shaft 3, the rotating shaft 3 faces the plate surface of the stopper plate 51, so that the position of the positioning structure on the rotating shaft 3 corresponds to the position of the movable stopper 52, and when the movable stopper 52 extends out of the engaging through hole 511, the movable stopper 52 can be engaged with the positioning structure on the rotating shaft 3.
In some alternative embodiments, as shown in fig. 10, the positioning structure on the rotating shaft 3 is a limiting recess 31 provided on the rotating shaft 3, and when the rotating shaft 3 rotates to the preset position, a part of the movable limiting member 52 (i.e., a part 52b extending from the fitting through hole 511) is located in the limiting recess 31. Specifically, when the rotating shaft 3 rotates to the preset position, the pushing assembly 53 pushes the movable limiting member 52 to extend out of the matching through hole 511 and into the limiting recess 31, so that the relative position between the rotating shaft 3 and the rotating beam 1 can be limited, and the two components form a rigid connection; the pushing assembly 53 can also move the movable limiting member 52 out of the limiting recess 31 and retract into the engaging through hole 511, so that the rotating shaft 3 and the rotating beam 1 can rotate relatively to each other, thereby allowing the rotating shaft 3 to rotate reversely. Of course, in practical applications, the movable limiting member 52 and the positioning structure on the rotating shaft 3 may be matched in any other way, and the embodiment of the present invention is not limited in this respect.
In some alternative embodiments, as shown in fig. 4 to fig. 7, the movable limiting member 52 is a sphere; as shown in fig. 5, both end opening diameters D1 of the fitting through hole 511 are smaller than a maximum diameter D2 of the ball to movably define the ball in the fitting through hole 511. It is easily understood that a portion of the ball having a diameter smaller than the opening diameter D1 of the fitting through-hole 511 (i.e., the portion 52b of fig. 10 protruding from the fitting through-hole 511) may protrude out of the fitting through-hole, and a portion having a diameter larger than the opening diameter D1 of the fitting through-hole (i.e., the middle portion 52a of the ball in fig. 5) may be confined in the fitting through-hole 511, thereby ensuring that the ball does not completely come out of the fitting through-hole 511, and enabling a portion of the ball to protrude out of the fitting through-hole 511. The ball body and the matching through hole 511 are simply and reliably matched. As shown in fig. 6 and 7, by adopting the above-described fitting manner of the spherical body with the fitting through hole 511, a part of the spherical body may protrude from the fitting through hole 511 to one end on the left side in fig. 6, or may protrude from the fitting through hole 511 to one end on the right side in fig. 7. Further optionally, the diameter of the sphere may be such that: when a portion of the ball protrudes from one end of the fitting through-hole 511, another portion of the ball is retracted from the other end of the fitting through-hole 511, which helps to release the movable stopper (i.e., the ball) 52 from the pushing member 53. It should be noted that, in practical applications, the movable limiting member 52 may also be a cylinder, a rod, or any other structure, and the embodiment of the present invention is not limited thereto.
In addition, optionally, the outer surface of the movable limiting member 52 in the limiting recess 31 (i.e., the outer surface of the portion 52b protruding from the fitting through hole 511) is fitted with the inner surface of the limiting recess 31, so that the fitting reliability of the movable limiting member 52 with the limiting recess 31 can be further improved, and the rigid connection of the rotating shaft 3 with the rotating beam 1 can be ensured.
The structure of the pushing assembly 53 can be various, in some alternative embodiments, as shown in fig. 8 and 9, the pushing assembly 53 includes a base 531, a pushing member 532, a first positioning column 533a and a second positioning column 533b, wherein the base 531 is connected to the rotating beam 1, the pushing member 532 is rotatably connected to a surface of the base 531 facing away from the rotating beam through a pivot 534, specifically, as shown in fig. 9, a surface (i.e., a top surface in fig. 9) of the base 531 facing away from the rotating beam 1 is provided with a mounting hole 531a, the pivot 534 is connected to the mounting hole 531a, for example, the mounting hole 531a is a threaded hole, and the pivot 534 penetrates through the pushing member 532 and is in threaded connection with the threaded hole. The first positioning column 533a and the second positioning column 533b are disposed on a surface of the base 531 away from the rotating beam 1, and are located on two sides of the pushing member 532, the pushing member 532 abuts against the first positioning column 533a when rotating to the first position, and abuts against the second positioning column 533b when rotating to the second position, that is, the first positioning column 533a and the second positioning column 533b can limit the pushing member 532 at the first position and the second position, respectively. Moreover, as shown in fig. 8, the pushing member 532 on the left side is located at the second position, and the pushing member 532 abuts against the second positioning column 533b, so that the pushing member 532 can be limited at the second position, and at the second position, the pushing member 532 can push the movable limiting member (for example, a part of a sphere) 52 to extend out from the matching through hole 511, and limit the movable limiting member 52 to be located at the position matched with the positioning structure (for example, the limiting concave portion 31), that is, the pushing member 532 always applies a pushing force to the movable limiting member 52; the push member 532 on the right side is located at the first position, and the push member 532 can release the position of the movable limiting member 52, that is, the push member 532 does not apply a pushing force to the movable limiting member 52, so that the movable limiting member 52 can automatically disengage from the positioning structure (e.g., the limiting recess 31). As shown in fig. 6 and 7, when the movable stopper 52 (i.e., the ball) is in a free state, it is freely movable in the fitting through hole 511, and at this time, the rigid connection between the rotating shaft 3 and the rotating beam 1 is released, and the rotating shaft 3 can perform reverse rotation.
The push member 532 may be rotated between the first position and the second position by a driving force of a driving source, which may be a motor, a cylinder, a hydraulic cylinder, or the like, or may obtain the driving force by resistance of water when the rotating shaft 3 rotates the rotating beam 1 under an environmental condition that the magnetron device is immersed in water. Taking the top structure of the PVD apparatus shown in fig. 1 as an example, a cooling chamber 02 is arranged above the target 03, the cooling chamber 02 is filled with cooling water 05, and the magnetron is immersed in the cooling water 05, and the cooling water 05 is used for cooling heat generated during sputtering of the target 03. The magnetron device provided by the embodiment of the invention can be also applied to the PVD equipment, namely, the magnetron device can be immersed in the cooling water 05, and under the environmental condition, when the rotating shaft 3 drives the rotating beam 1 to rotate, the driving force can be obtained by depending on the resistance of the cooling water 05.
In some alternative embodiments, as shown in fig. 8, the pushing assembly 53 further includes a return elastic member 535, one end of the return elastic member 535 is connected to the pushing member 532, the other end of the return elastic member 535 is connected to the rotating beam 1, and the return elastic member 535 is used for returning the pushing member 532 to the first position (i.e., the position of the pushing member 532 on the right side in fig. 8) when the pushing member 532 is not subjected to the driving force. Thus, the pusher 532 can be rotated from the first position to the second position (i.e., the position of the pusher 532 on the left side in fig. 8) against the elastic force of the return elastic member 535 by the driving force of the driving source, and can be returned from the second position to the first position by the elastic force of the return elastic member 535 when the driving force stops being supplied.
Alternatively, as shown in fig. 8, the return elastic member 535 is an extension spring, a mounting plate 536 is provided on the rotating beam 1, one end of the extension spring is fixedly connected to the mounting plate 536, the other end of the extension spring is fixedly connected to the pushing member 532, the pushing member 532 connected to the extension spring is located at the first position when the extension spring is in an original state (i.e., the state of the extension spring on the right side in fig. 8), and the extension spring is in an extended state (i.e., the state of the extension spring on the left side in fig. 8) when the pushing member 532 rotates from the first position to the second position by the driving force of the driving source.
In some alternative embodiments, when the pushing member 532 obtains the driving force by means of the resistance of water under the environmental condition that the magnetron device is immersed in water, as shown in fig. 8, the pushing member 532 includes a push rod 532a and a water stop piece 532b, wherein one end of the push rod 532a is used for pushing the movable limiting member 52 to extend out from the matching through hole 511, and the other end of the push rod 532a is connected with the water stop piece 532 b; the water deflector 532b is used for resistance in water (i.e., F) Water resistance ) The push rod 532a is driven to rotate to the second position against the elastic force of the return elastic member 535. Specifically, when the rotating shaft 3 rotates the rotating beam 1 and reaches a certain rotation speed, the water blocking piece 532b is subjected to water resistance (i.e., F) Water resistance ) Is increased to a magnitude enough to overcome the elastic force of the return elastic member 535, so that the water flapper 532b can drive the push rod 532a to rotate. When the rotation direction of the rotating shaft 3 needs to be switched, the rotation speed of the rotating shaft 3 is gradually reduced until the rotation speed is stopped, in the process, the resistance of the water borne by the water blocking piece 532b is gradually reduced until the resistance is smaller than the elastic force of the reset elastic piece 535, and at the moment, under the elastic force action of the reset elastic piece 535, the water blocking piece 532b drives the push rod 532a to reset to the first position. Alternatively, when the return elastic member 535 is an extension spring, the connection position of the extension spring and the pushing member 532 is located at one end of the push rod 532a close to the water deflector 532b, so that the direction of the elastic force applied by the extension spring can be opposite to the direction of the water resistance. In addition, the water blocking piece 532b may be replaced by another member having a sufficient water blocking area and generating a driving force by using water resistance, and the embodiment of the present invention is not particularly limited thereto.
Operation of a magnetron apparatus according to an embodiment of the inventionThe process is as follows: as shown in fig. 11, the rotating shaft 3 is at the initial position and at the stationary state, the water blocking pieces 532b at both sides are not driven, and the push rods 532a at both sides are at the first position. As shown in fig. 12, when the rotating shaft 3 rotates counterclockwise from the initial position to the preset position, it abuts against the left limiting block 512, at this time, the rotating shaft 3 drives the rotating beam 1 to rotate counterclockwise continuously, and before the rotating shaft 3 reaches the preset position, the rotating beam 1 is always in a stationary state. When the rotating shaft 3 rotates the rotating beam 1 and reaches a certain rotation speed, the water blocking piece 532b on the left side in fig. 12 is subjected to water resistance (i.e., F) Water resistance ) The elastic force of the left-side elastic return member 535 is increased to a magnitude enough to overcome the elastic force of the left-side elastic return member 535, so that the left-side water blocking piece 532b can drive the push rod 532a to rotate until the push rod 532a abuts against the second positioning column 533b, that is, a second position is reached, in which the push rod 532a can push the movable limiting member (for example, a part of a sphere) 52 to extend out of the through-hole 511, and the movable limiting member 52 is limited to be located at a position matched with the positioning structure (for example, the limiting concave portion 31), that is, the push member 532 always applies a pushing force to the movable limiting member 52, so that a relative position between the rotating shaft 3 and the rotating beam 1 can be limited, and the two components form a rigid connection. As shown in fig. 13, when the rotating shaft 3 needs to switch the rotating direction, that is, to rotate in the clockwise direction, first, the rotating shaft 3 gradually decelerates in the process of rotating in the counterclockwise direction until it stops, in this process, the resistance of water received by the left water blocking piece 532b gradually decreases until it is smaller than the elastic force of the elastic restoring member 535, at this time, under the elastic force of the elastic restoring member 535, the left water blocking piece 532b drives the ejector rod 532a to return to the first position, and no longer applies a thrust force to the movable limiting member 52, so that the movable limiting member 52 can automatically disengage from the positioning structure (for example, the limiting concave portion 31), at this time, the rigid connection between the rotating shaft 3 and the rotating beam 1 is released, the rotating shaft 3 can reversely rotate in the clockwise direction until it abuts against the right limiting block 512, at this time, the rotating shaft 3 can drive the rotating beam 1 to continue to rotate in the clockwise direction, and the rigid connection between the rotating shaft 3 and the rotating beam 1 is consistent with the above-mentioned manner adopted in the counterclockwise direction, and will not be described herein again.
In summary, in the magnetron apparatus provided in the embodiments of the present invention, the rotation beam is provided with two limiting assemblies and a positioning structure disposed on the rotation shaft, and when the rotation shaft rotates to a preset position along the first direction or the second direction opposite to the first direction, the rotation shaft and the rotation beam are matched with each other to rotate synchronously. Through location structure and spacing subassembly cooperation, can inject the relative position between rotation axis and the rotatory crossbeam, make the two constitute rigid connection, this kind of connected mode can remain the relative fixed of rotation axis and rotatory crossbeam throughout, can not receive the influence of motor speed disturbance to can improve connection stability, avoid being enlargeed the problem of the motor moment of torsion overload warning that arouses because of the motor disturbance.
As another technical solution, an embodiment of the present invention further provides a magnetron sputtering apparatus, including a process chamber, a target disposed at a top of the process chamber, and a cooling cavity containing cooling water disposed above the target, and the magnetron device provided in the embodiment of the present invention, where the magnetron device is immersed in the cooling water in the cooling cavity.
According to the magnetron sputtering device provided by the embodiment of the invention, the connection stability can be improved, and the problem of motor torque overload alarm caused by amplified motor disturbance is avoided.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (10)
1. A magnetron apparatus, comprising: the magnetic control device comprises a rotating shaft, a rotating beam, a magnetron assembly and two limiting assemblies, wherein the rotating shaft can rotate around a first axis of the rotating shaft along a first direction or a second direction opposite to the first direction; the rotating shaft and the rotating beam are connected in a relatively rotatable manner around a second axis; the magnetron assembly is connected with the rotating beam;
the two limiting assemblies are arranged on the rotating beam and are oppositely arranged on two sides of the second axis along the extending direction of the rotating beam, the rotating shaft is positioned between the two limiting assemblies, and a positioning structure used for being in positioning fit with the limiting assemblies is arranged on the rotating shaft;
the positioning structure is used for being matched with the corresponding limiting assembly when the rotating shaft rotates to a preset position along the first direction or the second direction, so that the rotating shaft and the rotating beam rotate synchronously.
2. The magnetron apparatus of claim 1, wherein each of the position limiting assemblies comprises a position limiting plate, a movable position limiting member, and a pushing assembly, wherein,
the limiting plate is arranged on the rotating beam, a matching through hole is formed in the limiting plate, and the movable limiting part is arranged in the matching through hole and can extend out or retract relative to the matching through hole;
the pushing assembly is arranged on the rotating beam, and is used for pushing the movable limiting piece to extend out of the matching through hole and be matched with the positioning structure when the rotating shaft rotates to the preset position; the pushing assembly is further used for enabling the movable limiting part to retract into the matching through hole so as to remove the matching between the movable limiting part and the positioning structure.
3. The magnetron apparatus of claim 2, wherein the position-limiting plate is further provided with a position-limiting block, and when the rotation shaft rotates to the preset position, the position-limiting block abuts against the rotation shaft to prevent the rotation shaft from rotating continuously.
4. The magnetron apparatus of claim 2, wherein the positioning structure is a limit recess provided on the rotation shaft, and a part of the movable stopper is located in the limit recess when the rotation shaft rotates to the preset position.
5. The magnetron apparatus of claim 2, wherein the movable stopper is a sphere; the diameter of the opening at the two ends of the matching through hole is smaller than the maximum diameter of the ball body, so that the ball body can be movably limited in the matching through hole.
6. The magnetron apparatus of claim 4 or 5, wherein an outer surface of the movable stopper in the stopper recess is fitted with an inner surface of the stopper recess.
7. The magnetron apparatus of claim 2, wherein the pushing assembly includes a base, a pusher, a first positioning post and a second positioning post, wherein,
the base is connected with the rotating beam, and the pushing piece is rotationally connected with the surface of the base, which deviates from the rotating beam, through a pivot; the first positioning column and the second positioning column are arranged on the surface of the base, which is far away from the rotating cross beam, and are positioned on two sides of the pushing part, the pushing part abuts against the first positioning column when rotating to a first position, and abuts against the second positioning column when rotating to a second position;
when the pushing piece is located at the second position, the pushing piece can push the movable limiting piece to extend out of the matching through hole and limit the movable limiting piece to be located at a position matched with the positioning structure; when the pushing piece is located at the first position, the limiting of the movable limiting piece can be released.
8. The magnetron apparatus of claim 7, wherein the pushing assembly further comprises a return spring, one end of the return spring is connected to the pushing member, and the other end of the return spring is connected to the rotating beam, and the return spring is configured to return the pushing member to the first position when the pushing member is not subjected to the driving force.
9. The magnetron apparatus of claim 8, wherein the pushing member includes a push rod and a water stop, wherein one end of the push rod is used for pushing the movable limiting member to extend out of the matching through hole, and the other end of the push rod is connected with the water stop; the water blocking sheet is used for driving the ejector rod to rotate to the second position by overcoming the elasticity of the reset elastic piece under the resistance action of water when the magnetron device is immersed in the water.
10. Magnetron sputtering equipment, comprising a process chamber, wherein a target is arranged at the top of the process chamber, and a cooling cavity filled with cooling water is arranged above the target, and the magnetron device is characterized by further comprising the magnetron device in any one of claims 1 to 9, and the magnetron device is immersed in the cooling water in the cooling cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211030289.2A CN115305454B (en) | 2022-08-26 | 2022-08-26 | Magnetron device and magnetron sputtering equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211030289.2A CN115305454B (en) | 2022-08-26 | 2022-08-26 | Magnetron device and magnetron sputtering equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115305454A true CN115305454A (en) | 2022-11-08 |
| CN115305454B CN115305454B (en) | 2023-09-08 |
Family
ID=83865465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211030289.2A Active CN115305454B (en) | 2022-08-26 | 2022-08-26 | Magnetron device and magnetron sputtering equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115305454B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6228236B1 (en) * | 1999-10-22 | 2001-05-08 | Applied Materials, Inc. | Sputter magnetron having two rotation diameters |
| US20080099329A1 (en) * | 2006-10-27 | 2008-05-01 | Applied Materials, Inc. | Position controlled dual magnetron |
| CN105793976A (en) * | 2013-10-24 | 2016-07-20 | 梅耶博格（德国）股份有限公司 | Multi-magnet arrangement |
| CN108950499A (en) * | 2017-05-18 | 2018-12-07 | 北京北方华创微电子装备有限公司 | Magnetron rotational structure, magnetron assembly and reaction chamber |
| CN114156149A (en) * | 2021-11-25 | 2022-03-08 | 北京北方华创微电子装备有限公司 | Magnetron device and semiconductor processing equipment |
-
2022
- 2022-08-26 CN CN202211030289.2A patent/CN115305454B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6228236B1 (en) * | 1999-10-22 | 2001-05-08 | Applied Materials, Inc. | Sputter magnetron having two rotation diameters |
| US20080099329A1 (en) * | 2006-10-27 | 2008-05-01 | Applied Materials, Inc. | Position controlled dual magnetron |
| CN101195906A (en) * | 2006-10-27 | 2008-06-11 | 应用材料股份有限公司 | Position controlled dual magnetron |
| CN105793976A (en) * | 2013-10-24 | 2016-07-20 | 梅耶博格（德国）股份有限公司 | Multi-magnet arrangement |
| CN108950499A (en) * | 2017-05-18 | 2018-12-07 | 北京北方华创微电子装备有限公司 | Magnetron rotational structure, magnetron assembly and reaction chamber |
| CN114156149A (en) * | 2021-11-25 | 2022-03-08 | 北京北方华创微电子装备有限公司 | Magnetron device and semiconductor processing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN115305454B (en) | 2023-09-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7018515B2 (en) | Selectable dual position magnetron | |
| TWI692541B (en) | Magnetron drive mechanism, magnetron assembly and reaction chamber | |
| TWI806436B (en) | Magnetron device and semiconductor process equipment | |
| US7093818B2 (en) | Embedded control valve using homopolar motor | |
| US20150187549A1 (en) | Magnetron sputtering apparatus | |
| CN115305454A (en) | Magnetron device and magnetron sputtering apparatus | |
| US7312680B2 (en) | Manual switch-off device of a permanent magnet switch operating mechanism | |
| EP2960404B1 (en) | Lock and rotary plug thereof | |
| KR100972812B1 (en) | Selectable dual position magnetron | |
| GB2517972A (en) | Circuit breaker | |
| CN110223903B (en) | Ion source baffle plate with uniform symmetrical arrangement and synchronous opening and closing | |
| KR101470518B1 (en) | A cyclotron and a stripping assembly for the cyclotron | |
| US20170327941A1 (en) | Sputtering apparatus and method of forming a layer using the same | |
| CN109830418B (en) | Scanning mechanism for driving magnetron, magnetron source and magnetron sputtering device | |
| JP5443181B2 (en) | Multi target sputtering system | |
| CN111304620A (en) | Semiconductor processing equipment and magnetron mechanism thereof | |
| CN111809157B (en) | Semiconductor process equipment and magnetron mechanism thereof | |
| KR101298768B1 (en) | Cylindrical sputtering cathode device | |
| CN110047680B (en) | Stop mechanism for effectively triggering microswitch and protecting electrical element | |
| CN102938358B (en) | Magnetron, sputtering cavity device and sputtering device | |
| US20190206662A1 (en) | Film forming unit for sputtering apparatus | |
| JP2012525667A (en) | Mechanical latching device for main drive | |
| CN115074687B (en) | Magnetron movement device, magnetron assembly and semiconductor process equipment | |
| CN113890267B (en) | Torque cancellation automatic locking device and method for torque motor and motor | |
| CN211879256U (en) | Limiting device for transmission system, transmission system and high-voltage switch |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |