CN114654092B - Method and device for efficient processing and precise measurement of laser microstructure - Google Patents
Method and device for efficient processing and precise measurement of laser microstructure Download PDFInfo
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
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- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
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Abstract
The invention discloses a method and a device for efficient processing and precise measurement of a laser microstructure, and belongs to the technical field of laser processing and precise monitoring. When the focusing and measuring are carried out in the Z direction, the standard laser interferometer mirror group modules are symmetrically distributed on two sides of the center of the Z-direction air floatation movement axis module, so that on one hand, the Abbe error of a movement sensor can be effectively avoided; on the other hand, compared with a single standard laser interferometer mirror group module, the standard laser interferometer mirror group modules appearing in pairs can amplify the micro displacement of the axial motion, so that the micro displacement measurement error is effectively reduced, and the Z-direction processing and monitoring precision is improved. Meanwhile, a laser differential confocal fixed module for resisting surface inclination angle change and scattering is used for realizing Z-direction focusing and monitoring. The invention can synchronously realize the processing and the precision measurement of the laser microstructure, and can improve the precision of displacement sensing errors, thereby improving the processing precision and the measurement precision of the three-dimensional laser microstructure. The invention also has the following advantages: the overall structure has strong robustness, high stability and external impact disturbance resistance.
Description
Technical Field
The invention belongs to the field of laser precision machining and optical precision monitoring, and particularly relates to a method and a device for improving displacement sensing error precision and realizing high-efficiency machining and precision measurement of a laser microstructure.
Background
The rapid development of science and technology enables people to quickly learn to enter the micro world, the continuous updating and iteration of micro-nano manufacturing technology and the improvement of processing technology gradually appear and play an extremely important role in micro-nano devices which are miniaturized, compact, multifunctional and low in power consumption, and micro-nano systems based on micro-nano elements such as artificial skins, wearable systems and micro-surgical robots are deeply arranged in the living aspects of people. However, the size precision and the device performance of the micro-nano manufacturing device are further improved due to the defects and simplification of fine processing and monitoring means in the micro-nano manufacturing. The laser processing has high processing fineness, wide material adaptability and non-mask processing technology, so the laser processing plays an important role in processing a complex micro device sample structure. The fine processing of micro device structures depends on understanding the processing principles and the advancement of processing techniques, which rely heavily on precise micro-displacement control and real-time in-situ measurement of the geometric parameters of the microstructure during processing. Therefore, the improvement of precise micro-displacement control and the real-time in-situ measurement of the geometric parameters of the microstructure in the machining process are needed to be solved.
At present, a precise micro-displacement control device is mainly divided into a displacement table based on a capacitance sensor and a servo motor displacement drive control module device, the displacement table of the capacitance sensor is influenced by nonlinear errors, so that the precision is limited to a certain extent, and in addition, the whole displacement stroke of the displacement table is shorter, so that the micro-displacement control device is not suitable for processing large-scale micro devices. The servo motor displacement drive control module device can realize nanoscale drive through a nanoscale drive control module unit, but the servo motor displacement drive control module device also has nonlinear errors and the influence of external errors such as a grating ruler for realizing closed-loop feedback positions and the like.
In conclusion, the closed-loop control of the displacement platform based on the capacitance sensor and the servo motor displacement drive control module device can be realized through the high-precision micro-displacement measuring device, and the closed-loop control is fed back to the upper computer for further processing and compensation. In addition, it is very important to realize the in-situ geometric parameter measurement of the device to be processed and feed back the upper computer in real time to correct the processing parameters in the processing process.
Disclosure of Invention
The invention mainly aims to provide a method and a device for efficiently processing and precisely measuring a laser microstructure, which can synchronously realize the processing and precise measurement of the laser microstructure, improve the displacement sensing error precision and further improve the processing precision and the measurement precision of a three-dimensional laser microstructure. The invention also has the following advantages: the overall structure has strong robustness, high stability and external impact disturbance resistance.
The purpose of the invention is realized by the following technical scheme:
when the focusing and measuring are carried out in the Z direction, the standard laser interferometer mirror group modules are symmetrically distributed on two sides of the center of the Z-direction air floatation movement axis module, so that on one hand, the Abbe error of a movement sensor can be effectively avoided; on the other hand, the standard laser interferometer mirror group modules which appear in pairs can amplify the micro displacement of the Z-direction motion, so that the displacement error is effectively reduced, and the Z-direction processing and monitoring precision is improved.
Meanwhile, a gantry structure with good stability is adopted, a motion control module, a standard laser interferometer and a lens group module of the standard laser interferometer are utilized, and the motion control and error compensation are carried out by an upper computer after reflected light of a high-precision L-shaped standard flat crystal on an objective table is detected and calculated, so that the accurate adjustment and positioning of the motion attitude of the X/Y-direction air-floating motion axis module are realized, and the high-precision micro-displacement movement in an X/Y plane is realized. And meanwhile, the laser differential confocal focusing module resisting surface inclination angle change and scattering change is used for detecting the Z-position, so that high-precision processing and measurement of the microscale device are realized.
The invention discloses a method for efficiently processing and precisely measuring a laser microstructure, which comprises the following steps of:
the method comprises the following steps: the laser head of the laser interferometer with orthogonal characteristic polarization states is divided into a plurality of beams of light through the beam splitter prism, the Y-direction reflector group and the Z-direction reflector group, and the light beams of the light beams are respectively incident to the X-direction standard laser interferometer mirror group module, the Y-direction standard laser interferometer mirror group module and the Z-direction standard laser interferometer mirror group module. The X-direction standard laser interferometer mirror group module and the Y-direction standard laser interferometer mirror group module modulate incident light, then the incident light is incident on a standard L-shaped flat crystal to be reflected, and the incident light is received by the X/Y-direction standard laser interferometer mirror group module again and fed back to the standard laser interferometer. When the X-direction air-floatation motion axis module and the Y-direction air-floatation motion axis module are displaced, after reflected light of a high-precision L-shaped standard flat crystal is detected and calculated, a host computer performs motion control and error compensation, and the motion attitude of the X/Y-direction air-floatation motion axis module is accurately adjusted and positioned; realizing the precise micro-displacement control in the XY plane;
the X-direction air-floatation motion axis modules positioned on two sides of the base platform are required to be placed in parallel, and the Y-direction air-floatation motion axis modules are required to be orthogonal to the X-direction air-floatation motion axis modules; the upper computer realizes the precise motion control of the X/Y direction air-floating motion axis module through a motion control driving system;
after the incident light of the split laser interferometer passes through the polarization beam splitter prism, the P polarized light parallel to the incident plane continues to propagate to the corner cone prism to realize the reversal of the light propagation direction, and finally the P polarized light is detected by the detector through the polarization beam splitter prism and is used as the reference light calculated by the standard laser interferometer module; the S polarized light vertical to the incident plane is reflected by the polarization beam splitter prism, reaches the reflector through the upper side 1/4 wave plate, then passes through the upper side 1/4 wave plate again and then propagates downwards, at the moment, the S polarized light vertical to the incident plane becomes P polarized light, and the S polarized light is completely transmitted through the polarization beam splitter prism again and propagates downwards; the P polarized light passes through the lower side 1/4 wave plate, reaches the L-shaped flat crystal, is reflected, passes through the lower side 1/4 wave plate again, and then propagates upwards, and at the moment, the P polarized light with the parallel incident plane becomes S polarized light. The light passes through the polarization beam splitter prism and is reflected to the pyramid prism to change the transmission direction, and the reversed S-polarized light is transmitted to the polarization beam splitter prism again and is reflected; the S polarized light reaches the L-shaped flat crystal through the lower side 1/4 wave plate, is reflected, then passes through the lower side 1/4 wave plate again and is transmitted upwards, at the moment, the S polarized light becomes P polarized light, and the S polarized light completely transmits and is transmitted upwards after reaching the polarization beam splitter prism again; the P-polarized light is reflected by the upper 1/4 wave plate and the reflector, then passes through the upper 1/4 wave plate again, and propagates downward, and at this time, the P-polarized light becomes S-polarized light. The light is reflected on the polarization beam splitter prism and is finally detected by a detector to be used as the measuring light calculated by the standard laser interferometer module; the above process can realize precise measurement on the micro displacement; monitoring and calibrating the motion error of the X/Y-direction air-floating motion axis module through a standard laser interferometer module, and writing the result into an upper computer for compensation to realize X/Y-direction precise motion;
step two: incident light of the standard laser interferometer reaching the Z direction is modulated by 2Z-direction standard laser interferometer mirror group modules symmetrically distributed along the Z-direction air floatation motion axis module, then is incident to a reflecting mirror group (in the Z direction) carried on the Z-direction air floatation motion axis module to be reflected, is received again by the Z-direction standard laser interferometer mirror group module and is fed back to the standard laser interferometer. And the process of monitoring the integral light ray advancing track of the Z-direction air floatation movement axis module displacement is repeated twice for the optical path of a single standard laser interferometer mirror group module in the step I. When the Z-direction air floatation motion axis module is displaced, the measurement adjustment and compensation of the real-time motion attitude are realized through the control of the upper computer;
in addition, compared with a single standard laser interferometer mirror group module, the small error is amplified because the Z-direction movement is amplified, and the Z-direction error can be further compensated by writing error acquisition into an upper computer motion control module; realizing the precise motion control of the Z-direction air-floating motion axis module;
step three: the upper computer controls the laser module to realize the modulation of different parameters of the laser; laser is focused to the surface of the sample through an objective lens to realize the processing of the microstructure;
step four: the laser differential confocal focusing module with the surface inclination change resistance and the scattering change resistance is used for monitoring the Z direction of a processed device and realizing in-situ geometric parameter measurement of the device during processing; realizing Z-direction precise motion;
step five: repeating the first step to the fourth step, and utilizing multithreading of an upper computer to control and adjust the standard laser interferometer and the lens group module thereof, the motion control module, the laser differential confocal focusing module for resisting surface inclination angle change and scattering change and the laser module in real time, so as to realize high-precision processing of three-dimensional laser microstructure single points and realize in-situ measurement of microstructure geometric parameters;
step six: as shown in fig. 4, repeating the first to fifth steps, scanning, processing and monitoring the three-dimensional laser microstructure sample on the objective table from the point a, and implementing high-precision processing and in-situ parameter measurement on the three-dimensional laser microstructure sample according to a preset processing track.
Has the beneficial effects that:
1. according to the method and the device for efficiently processing and precisely measuring the laser microstructure, when focusing and measuring are carried out in the Z direction, the two standard laser interferometer group modules are symmetrically distributed on two sides of the center of the Z-direction air floatation motion axis module, so that on one hand, the Abbe error of a motion sensor can be effectively avoided; on the other hand, compared with a single standard laser interferometer mirror group module, the standard laser interferometer mirror group modules which appear in pairs can amplify the micro displacement of the Z-direction motion, so that the micro displacement measurement error is effectively reduced, and the Z-direction processing and monitoring precision is improved.
2. The invention discloses a method and a device for efficiently processing and precisely measuring a laser microstructure, which utilize multithread of an upper computer to control and adjust a standard laser interferometer, a lens group module of the standard laser interferometer, a motion control module, a laser differential confocal focusing module for resisting surface inclination angle change and scattering change and a laser module in real time, realize high-precision processing of a three-dimensional laser microstructure single point and in-situ measurement of parameters, and improve the processing precision and the monitoring efficiency of a micro device.
3. The invention discloses a method and a device for efficient processing and precise measurement of a laser microstructure, which adopt a gantry structure with good stability, utilize a motion control module, a standard laser interferometer and a lens group module thereof, and perform motion control and error compensation by an upper computer after detecting and calculating reflected light of a high-precision L-shaped standard flat crystal on an objective table, thereby realizing precise adjustment and positioning of the motion attitude of an X/Y-direction air-floating motion axis module and realizing high-precision micro-displacement movement in an XY plane. Meanwhile, the axial position detection is carried out by utilizing the laser differential confocal focusing module which resists the change of the surface inclination angle and the scattering change, so that the high-precision processing and measurement of the microscale device are realized.
4. The invention discloses a method and a device for efficient processing and precise measurement of a laser microstructure, which are used for realizing nanometer precision scanning of a three-dimensional laser microstructure to measure parameters by utilizing laser differential confocal zero-crossing triggering.
Drawings
FIG. 1 is a schematic view of the apparatus of the present invention;
FIG. 2 is a schematic diagram of the optical path of the X/Y direction standard laser interferometer mirror group module according to the present invention;
FIG. 3 is a schematic diagram of the optical path of the mirror group module of the Z-direction standard laser interferometer of the present invention;
FIG. 4 is a schematic view of the processing and monitoring scan of the present invention;
in the figure: the device comprises a laser head of a laser interferometer, a 2-fixed base station, a 3-gantry support frame, a 4-X-direction air-floating motion axis module, a 5-Y-direction standard laser interferometer mirror group module, a 6-Y-direction reflecting mirror group, a 7-beam splitter prism, an 8-X-direction standard laser interferometer mirror group module, a 9-Z-direction reflecting mirror group, a 10-laser differential confocal focusing module, a 11-processing laser source, 12-Z-direction 2 standard laser interferometer mirror group modules, a 13-reflecting mirror group (Z direction), a 14-Z-direction air-floating motion axis module, a 15-objective lens, a 16-standard L-shaped flat crystal, a 17-objective table, an 18-Y-direction air-floating motion axis module and a 19-upper computer.
101-standard laser interferometer laser source, 102-reflector, 103-1/4 wave plate, 104-pyramid reflector, 16-L standard flat crystal, 105-polarization beam splitter prism, 201-standard laser interferometer laser source, 202-reflector set, 203-1/4 wave plate, 204-pyramid reflector, 13-reflector set (Z direction), 205-fixed reflector set (Z direction) fixing seat, and 206-polarization beam splitter prism set.
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings and examples.
As shown in fig. 1, the method for efficiently processing and precisely measuring a laser microstructure disclosed in this embodiment includes the following specific steps:
the method comprises the following steps: the laser interferometer laser head 1 with orthogonal characteristic polarization state is divided into 3 beams of light by the beam splitter prism 7, the Y-direction reflector group 6 and the Z-direction reflector group 9, and the 3 beams of light are respectively incident to the X-direction standard laser interferometer mirror group module 5, the Y-direction standard laser interferometer mirror group module 8 and the Z-direction standard laser interferometer mirror group module 12. The X-direction standard laser interferometer mirror group module and the Y-direction standard laser interferometer mirror group module modulate incident light, then the incident light is incident on the standard L-shaped flat crystal 16 to be reflected, and the reflected light is received by the X/Y-direction standard laser interferometer mirror group module again and fed back to the standard laser interferometer. When the X-direction air-floating motion axis module 4 and the Y-direction air-floating motion axis module 18 are displaced, after reflected light of the high-precision L-shaped standard flat crystal is detected and calculated, the upper computer performs motion control and error compensation, and the motion postures of the X-axis and the Y-axis are accurately adjusted and positioned. And precise micro-displacement control in an XY plane is realized.
The X-direction air-floating motion axis modules 4 on the two sides of the base 2 must be placed in parallel, and the Y-direction air-floating motion axis module 18 must be orthogonal to the X-direction air-floating motion axis module. The upper computer 19 realizes the precise motion control of the X/Y direction air-floating motion axis module through a motion control driving system.
As shown in fig. 2, in the standard laser interferometer module for monitoring the X/Y-direction air-floating motion axis module, after an incident light 101 of the split laser interferometer passes through the polarization beam splitter prism 105, a P-polarized light parallel to an incident plane will continue to propagate to the pyramid prism 104 to realize the reverse direction of the light propagation direction, and finally the light is detected by the detector through the polarization beam splitter prism 105 and used as a reference light calculated by the standard laser interferometer module; the S-polarized light perpendicular to the incident surface is reflected by the polarization beam splitter prism 105, reaches the reflector 102 through the upper 1/4 wave plate 103, and then propagates downward through the upper 1/4 wave plate 103 again, and at this time, the S-polarized light perpendicular to the incident surface becomes P-polarized light, and is completely transmitted and propagates downward through the polarization beam splitter prism 105 again; the P-polarized light passes through the lower 1/4 wave plate 103, reaches the L-shaped flat crystal 16, is reflected, passes through the lower 1/4 wave plate 103 again, and propagates upward, and at this time, the P-polarized light with the parallel incident surface becomes S-polarized light. The light passes through the polarization beam splitter prism 105 and is reflected to the pyramid prism 104 to change the propagation direction, and the reversed S-polarized light propagates to the polarization beam splitter prism 105 again and is reflected; the S polarized light reaches the L-shaped plate 16 through the lower 1/4 wave plate 103, is reflected, then passes through the lower 1/4 wave plate 103 again, and propagates upward, and at this time, the S polarized light becomes P polarized light, and after reaching the polarization beam splitter prism 105 again, the S polarized light is completely transmitted and propagates upward; the P-polarized light is reflected by the upper 1/4 wave plate 103 and the mirror 102, and then propagates downward through the upper 1/4 wave plate 103 again, and at this time, the P-polarized light becomes S-polarized light. And is reflected at the polarization beam splitter prism 105 and finally detected by a detector as the measuring light calculated by the standard laser interferometer module; the above process can realize precise measurement on the micro displacement; monitoring and calibrating the motion error of the X/Y-direction air-floating motion axis module through a standard laser interferometer module, and writing the result into an upper computer for compensation to realize X/Y-direction precise motion;
step two: incident light of the standard laser interferometer reaching the Z direction is modulated by 2Z-direction standard laser interferometer mirror group modules 12 symmetrically distributed along the Z-direction air floatation movement axis module 14, then is incident to a reflecting mirror group (Z direction) 13 carried on the Z-direction air floatation movement axis module to be reflected, is received again by the Z-direction standard laser interferometer mirror group module 14 and is fed back to the standard laser interferometer. The process of monitoring the overall light ray advancing track of the Z-direction air-floating motion axis module displacement is repeated twice in the optical path of a single standard laser interferometer mirror group module in the step I, as shown in FIG. 3. When the Z-direction air floatation motion axis module is displaced, the measurement adjustment and compensation of the real-time motion attitude are realized through the control of the upper computer;
the Z-direction standard laser interferometer mirror group module 12 symmetrically distributed along the Z-direction air-floating motion axis module effectively avoids the Abbe error of the motion sensor in the process of synchronously moving with the Z-direction air-floating motion axis module, on one hand, the Z-direction standard laser interferometer mirror group module symmetrically distributed along the Z-direction air-floating motion axis module amplifies Z-direction movement, and in addition, compared with a single standard laser interferometer mirror group module, small errors are amplified, and the Z-direction errors can be further compensated and processed by writing error collection into the upper computer motion control module, so that precise motion control of the Z-direction air-floating motion axis module is realized.
Step three: the laser module 11 is controlled by the upper computer 19 to realize the modulation of different parameters of the laser. The laser is focused to the surface of the sample through the objective lens 15, and the processing of the microstructure is realized.
Step four: the laser differential confocal focusing module 10 with surface inclination change resistance and scattering change resistance is used for monitoring the Z direction of a processed device and realizing in-situ geometric parameter measurement of the device during processing. And Z-direction precise movement is realized.
Step five: and repeating the first step to the fourth step, and utilizing multithreading of an upper computer to control and adjust the standard laser interferometer, the motion control module and the laser module in real time, so that the high-precision processing of the three-dimensional laser microstructure single point is realized, and the in-situ measurement of the geometric parameters is realized.
Step six: as shown in fig. 4, repeating the first to fifth steps, scanning, processing and monitoring the three-dimensional laser microstructure sample on the stage 17 from the point a, and implementing high-precision processing and in-situ geometric parameter measurement on the three-dimensional laser microstructure sample according to a preset processing track.
As shown in fig. 1, the embodiment further discloses a device for efficiently processing and precisely measuring a laser microstructure, which is used for implementing the method for efficiently processing and precisely measuring a laser microstructure, and the device for efficiently processing and measuring a laser microstructure employs a nano-scale driving technology to implement nano-resolution positioning of the objective lens 15 and the objective table 17.
The laser head of the standard laser interferometer with orthogonal characteristic polarization state 1, a fixed base station 2, a gantry support frame 3, an X-direction air-floating motion axis module 4, a Y-direction standard laser interferometer mirror group module 5, a Y-direction reflector group 6, a beam splitter prism 7, an X-direction standard laser interferometer mirror group module 8, a Z-direction reflector group 9, a laser differential confocal focusing module 10, a processing laser source 11, Z-direction 2 standard laser interferometer mirror group modules 12 and a reflector group (Z-direction) 13, a fixed seat 206 of the fixed reflector group (Z-direction), a Z-direction air-floating motion axis module 14, an objective lens 15, a standard L-shaped flat crystal 16, a loading table 17, a Y-direction air-floating motion axis module 18 and an upper computer 19;
the X/Y-direction standard laser interferometer mirror group module is characterized by comprising: a laser interferometer laser source 101 with orthogonal characteristic polarization states, a mirror 102, a 1/4 wave plate 103, a pyramid mirror 104, an L-shaped standard flat crystal 16, and a polarization splitting prism 105.
Z is to standard laser interferometer mirror group module, its characterized in that includes: the laser interferometer comprises a laser interferometer laser source 201 with orthogonal characteristic polarization states, a reflector group 202, a 1/4 wave plate 203, a pyramid reflector 204, a reflector group (Z direction) 13, a fixed seat 205 for fixing the reflector group (Z direction), and a polarization splitting prism 206.
The fixed base platform 2 plays a role in supporting the whole device, the X-direction air floatation motion axis module 4 is installed on the base platform 2, the Y-direction air floatation motion axis module 18 is installed on the X-direction air floatation motion axis module 4, the X-direction air floatation motion axis modules 4 on two sides must be placed in parallel, the Y-direction air floatation motion axis module 18 must be orthogonal to the X-direction air floatation motion axis module 4, and the X-direction motion drives the Y-direction motion. A Z-direction air-floating movement axis module 14 and a laser differential confocal focusing module 10 are fixed on a gantry support frame 3, a Y-direction reflecting mirror group 6, a beam splitter prism 7, a Y-direction standard laser interferometer mirror group module 5 and an X-direction standard laser interferometer mirror group module 8 are arranged on a base platform 2 through fixing parts, Z-direction 2 standard laser interferometer mirror group modules 12 are fixed on the gantry support frame 3, a reflecting mirror group (Z-direction) module 13 is arranged on the Z-direction air-floating movement axis module 14 through a fixing seat 205 for fixing the reflecting mirror group (Z-direction), an objective lens 15 is arranged at the lower end of the Z-direction air-floating movement axis module 14, and a standard L-shaped flat crystal 16 and an objective table 17 are fixed on a Y-direction air-floating movement axis module 18.
The upper computer 19 realizes the displacement of the X/Y/Z-direction air-floatation motion axis module through the motion controller module, the L-shaped standard flat crystal 16 arranged on the Y-direction air-floatation guide rail motion module 18 generates relative displacement to the standard laser interferometer mirror group modules 5 and 8 arranged on the base platform 2, the reflector group (Z direction) 13 arranged on the Z-direction air-floatation guide rail motion module 14 generates relative displacement to the Z-direction 2 standard laser interferometer mirror group modules 12 arranged on the gantry support frame 3, and the laser interferometers perform position calculation and feed back to the upper computer for further processing and compensation at the moment, thereby realizing the high-precision displacement movement control in the X/Y/Z space.
The upper computer 19 realizes the modulation of laser parameters by controlling the laser module and focuses on a sample through the objective lens 15 arranged on the Z-direction air-floating movement axis module 14, so as to realize the fine processing of a high-precision microstructure, and in addition, the laser differential confocal focusing module 10 arranged on the gantry support frame 3 realizes the in-situ geometric parameter measurement of the microstructure in the processing process.
The above detailed description is intended to illustrate the objects, aspects and advantages of the present invention, and it should be understood that the above detailed description is only exemplary of the present invention and is not intended to limit the scope of the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (2)
1. A method for efficiently processing and precisely measuring a laser microstructure is characterized by comprising the following steps: the two standard laser interferometer mirror group modules are symmetrically distributed on two sides of the center of the Z-direction air floatation motion axis module, so that on one hand, the Abbe error of the motion sensor can be effectively avoided; on the other hand, the standard laser interferometer mirror group modules which appear in pairs can amplify the micro displacement of the Z-direction motion, so that the displacement error is effectively reduced, and the Z-direction processing and monitoring precision is improved;
meanwhile, a gantry structure with good stability is adopted, and a motion control module, a standard laser interferometer and a lens group module thereof are utilized, so that the motion control and error compensation are carried out by an upper computer after reflected light of a high-precision L-shaped standard flat crystal on an objective table is detected and calculated, the accurate adjustment and positioning of the motion attitude of the X/Y-direction air-floating motion axis module are realized, and high-precision micro-displacement movement in an X/Y plane is realized; meanwhile, a laser differential confocal focusing module which resists surface inclination angle change and scattering change is used for detecting the Z-direction position, so that high-precision processing and measurement of the microscale device are realized;
the method for efficiently processing and precisely measuring the laser microstructure comprises the following steps,
the method comprises the following steps: the laser head of the laser interferometer with orthogonal characteristic polarization state is divided into a plurality of beams of light through a beam splitter prism, a Y-direction reflecting mirror group and a Z-direction reflecting mirror group, and the beams of light are respectively incident to an X-direction standard laser interferometer mirror group module, a Y-direction standard laser interferometer mirror group module and a Z-direction standard laser interferometer mirror group module; the X-direction standard laser interferometer mirror group module and the Y-direction standard laser interferometer mirror group module are used for modulating incident light, then the incident light is incident on the L-shaped standard flat crystal to be reflected, and the reflected light is received by the X/Y-direction standard laser interferometer mirror group module again and fed back to the standard laser interferometer; when the X-direction air-floatation motion axis module and the Y-direction air-floatation motion axis module are displaced, after reflected light of a high-precision L-shaped standard flat crystal is detected and calculated, a host computer performs motion control and error compensation, and the motion attitude of the X/Y-direction air-floatation motion axis module is accurately adjusted and positioned; realizing the precise micro-displacement control in the XY plane;
the X-direction air-floatation motion axis modules positioned on the two sides of the base platform are required to be placed in parallel, and the Y-direction air-floatation motion axis modules are required to be orthogonal to the X-direction air-floatation motion axis modules; the upper computer realizes the precise motion control of the X/Y direction air-floating motion axis module through a motion control driving system;
after the incident light of the split laser interferometer passes through the polarization beam splitting prism, the P polarized light parallel to the incident plane continues to propagate to the pyramid prism to realize the reversal of the light propagation direction, and finally the P polarized light is detected by the detector through the polarization beam splitting prism and is used as the reference light calculated by the standard laser interferometer module; the S polarized light vertical to the incident plane is reflected by the polarization beam splitter prism, reaches the reflector through the upper side 1/4 wave plate, then passes through the upper side 1/4 wave plate again and then propagates downwards, at the moment, the S polarized light vertical to the incident plane is changed into P polarized light, and the P polarized light is completely transmitted through the polarization beam splitter prism again and propagates downwards; the P polarized light passes through the lower side 1/4 wave plate, reaches the L-shaped standard flat crystal, is reflected, passes through the lower side 1/4 wave plate again and then is transmitted upwards, and at the moment, the P polarized light with parallel incident planes becomes S polarized light; the light passes through the polarization beam splitter prism and is reflected to the pyramid prism to change the transmission direction, and the reversed S-polarized light is transmitted to the polarization beam splitter prism again and is reflected; the S polarized light reaches the L-shaped standard flat crystal through the lower side 1/4 wave plate, is reflected, then passes through the lower side 1/4 wave plate again and is transmitted upwards, at the moment, the S polarized light becomes P polarized light, and the S polarized light completely transmits and is transmitted upwards after reaching the polarization beam splitter prism again; the P polarized light is reflected by the 1/4 wave plate on the upper side and the reflector, then passes through the 1/4 wave plate on the upper side again and then is transmitted downwards, and at the moment, the P polarized light becomes S polarized light; the light is reflected on the polarization beam splitter prism and is finally detected by a detector to be used as the measuring light calculated by the standard laser interferometer module; the above process can realize precise measurement on the micro displacement; monitoring and calibrating the motion error of the X/Y-direction air-floating motion axis module through a standard laser interferometer module, and writing the result into an upper computer for compensation to realize X/Y-direction precise motion;
step two: incident light of the standard laser interferometer reaching the Z direction is modulated by 2Z-direction standard laser interferometer mirror group modules symmetrically distributed along the Z-direction air floatation movement axis module, then is incident to a Z-direction reflecting mirror group carried on the Z-direction air floatation movement axis module to be reflected, is received again by the Z-direction standard laser interferometer mirror group module and is fed back to the standard laser interferometer; the process of monitoring the overall light ray advancing track of the Z-direction air floatation motion axis module displacement is repeated twice for the optical path of a single standard laser interferometer mirror group module in the first step; when the Z-direction air floatation motion axis module is displaced, the measurement adjustment and compensation of the real-time motion attitude are realized through the control of the upper computer;
in addition, compared with a single standard laser interferometer mirror group module, the small error is amplified because the Z-direction movement is amplified, and the Z-direction error can be further compensated by writing error acquisition into an upper computer motion control module; realizing the precise motion control of the Z-direction air-floating motion axis module;
step three: the laser module is controlled by the upper computer, so that the modulation of different parameters of the laser is realized; laser is focused to the surface of the sample through an objective lens to realize the processing of the microstructure;
step four: the laser differential confocal focusing module with the surface inclination change resistance and the scattering change resistance is used for monitoring the Z direction of a processed device and realizing in-situ geometric parameter measurement of the device during processing; realizing Z-direction precise motion;
step five: repeating the first step to the fourth step, and utilizing multithreading of an upper computer to control and adjust the standard laser interferometer and the lens group module thereof, the motion control module, the laser differential confocal focusing module for resisting surface inclination angle change and scattering change and the laser module in real time, so as to realize high-precision processing of three-dimensional laser microstructure single points and realize in-situ measurement of microstructure geometric parameters;
step six: and repeating the first step to the fifth step, scanning, processing and monitoring the three-dimensional laser microstructure sample on the objective table from the point A, and realizing high-precision processing and in-situ parameter measurement of the three-dimensional laser microstructure sample according to a preset processing track.
2. A laser microstructure efficient machining and precision measurement device is used for achieving the laser microstructure efficient machining and precision measurement method according to claim 1, and is characterized in that: the laser interferometer comprises a laser head of a laser interferometer with orthogonal characteristic polarization state, a fixed base station, a gantry support frame, an X-direction air floatation motion axis module, a Y-direction standard laser interferometer mirror group module, a Y-direction reflector group, a beam splitter prism, an X-direction standard laser interferometer mirror group module, a Z-direction reflector group, a laser differential confocal focusing module, a processing laser source, 2Z-direction standard laser interferometer mirror group modules and Z-direction reflector groups, a fixed seat of the Z-direction fixed reflector group, a Z-direction air floatation motion axis module, an objective lens, an L-shaped standard flat crystal, a loading table, a Y-direction air floatation motion axis module and an upper computer;
the X-direction standard laser interferometer mirror group/Y-direction standard laser interferometer mirror group module comprises a laser interferometer laser source with orthogonal characteristic polarization state, a reflecting mirror, a 1/4 wave plate, a pyramid prism, an L-shaped standard flat crystal and a polarization splitting prism;
the Z-direction standard laser interferometer mirror group module comprises a laser interferometer laser source with orthogonal characteristic polarization state, a reflector group, a Z-direction reflector group, a 1/4 wave plate, a pyramid prism, a fixed seat for fixing the reflector group in the Z direction and a polarization splitting prism;
the X-direction air floatation motion shaft module is arranged on the base platform, the Y-direction air floatation motion shaft module is arranged on the X-direction air floatation motion shaft module, the X-direction air floatation motion shaft modules on two sides are required to be placed in parallel, the Y-direction air floatation motion shaft module is required to be perpendicular to the X-direction air floatation motion shaft module, and the X-direction motion drives the Y-direction motion; a Z-direction air-floatation motion axis module, a Z-direction reflecting mirror group and a laser differential confocal and fixed-focus module are fixed on a gantry support frame, the reflecting mirror group, a beam splitter prism and two groups of laser interferometer standard mirror group modules are arranged on a base station through fixing pieces, Z-direction 2 standard laser interferometer mirror group modules are fixed on the gantry, a Z-direction laser interferometer reflecting mirror group and an objective lens are arranged on the Z-direction air-floatation motion axis module, and an L-shaped standard flat crystal and an objective table are fixed on a Y-direction air-floatation motion axis module;
the upper computer realizes the displacement of the X/Y/Z-direction air floatation motion axis module through the motion controller module, the L-shaped standard flat crystal arranged on the Y-direction air floatation guide rail motion module generates relative displacement to the X/Y-direction standard laser interferometer group module arranged on the base station, the Z-direction reflecting mirror group arranged on the Z-direction air floatation guide rail motion module generates relative displacement to the standard laser interferometer group module arranged on the gantry support frame, and at the moment, the laser interferometer calculates the position and feeds the position back to the upper computer for further processing and compensation, thereby realizing the high-precision displacement movement control in the X/Y/Z space;
the upper computer realizes the modulation of laser parameters by controlling the laser module and focuses on a sample through an objective lens arranged on the Z-direction air-floatation motion axis module, so as to realize the fine processing of a high-precision microstructure, and in addition, the laser differential confocal focusing module arranged on the gantry supporting frame can realize the in-situ geometric parameter measurement of the microstructure in the processing process.
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