CN113310434A - Method for measuring perpendicularity of two-dimensional linear motion platform - Google Patents
Method for measuring perpendicularity of two-dimensional linear motion platform Download PDFInfo
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- CN113310434A CN113310434A CN202110585976.XA CN202110585976A CN113310434A CN 113310434 A CN113310434 A CN 113310434A CN 202110585976 A CN202110585976 A CN 202110585976A CN 113310434 A CN113310434 A CN 113310434A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
- G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
- G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
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Abstract
The invention discloses a method for measuring the verticality of a two-dimensional linear motion platform, which comprises a linear motion platform, a first collimation assembly, a second collimation assembly and a reflector, taking the measurement of the motion error of the linear motion platform in the X direction as an example, the first semiconductor laser is moved along the X direction, after the operations of collimation, light splitting, turning, secondary light splitting, focusing and the like are carried out on the light beam, wherein one path of light beam is incident to a second CCD device in a manner of converging image points, the other path of light beam is incident to a second four-quadrant photoelectric detector in a manner of being parallel to the optical axis, the error information of the angle, the straightness and the flatness of a measuring point is calculated by utilizing the displacement deviation of the image point on the second CCD device and the position deviation of the center of the light beam on the second four-quadrant detector, the measurement is completed in the Y direction according to the steps, and the verticality error of the two-dimensional linear motion platform is calculated by utilizing the straightness measurement results of the two shafts. The invention does not need measuring instruments such as an interferometer and the like, saves the cost and improves the overall measuring efficiency.
Description
Technical Field
The invention relates to the technical field of precision optical measurement, in particular to a method for measuring the verticality of a two-dimensional linear motion platform.
Background
The two-dimensional linear motion platform is widely applied to the fields of photoetching, wafer detection, automatic optical detection and the like in the semiconductor industry. The exploration of the verticality measuring method of the key technical index is an important research content in the field. The results of the existing research are as follows: (1) the dual-frequency laser interferometer developed by the American aglent company has the characteristic of high-precision real-time performance in the aspect of measuring the verticality error. The whole measuring process needs to use a high-precision L mirror. (2) The verticality error of the linear motion platform can be calculated by using an XL80 laser interferometer produced by the British RANISHAW company on the basis of measuring the straightness of two shafts step by step in sequence. The measurement process needs to be done with the straightness measuring secondary optical components it produces. (3) The RLE series laser interferometers produced by the British RANISHAW company are used, two or a pair of laser interferometers are needed to finish the verticality measurement, the advantages of no need of light splitting, relatively simple collimation and the like are achieved, and a high-precision L-shaped mirror is also needed in the whole measurement process.
The measurement method adopts the principle of laser interference to carry out measurement, and a laser interference system needs to be purchased or built, or the measurement can be carried out by means of an L mirror which is difficult to process and extremely high in cost. Methods for measuring perpendicularity based on improvements to laser collimators have not been reported.
Disclosure of Invention
The invention provides a method for measuring the perpendicularity of a two-dimensional linear motion platform, which solves the problems that an interferometer or a special L mirror is required to be used in the current optical measurement of the perpendicularity, and each index needs to be separately measured independently.
In order to achieve the purpose, the invention provides the following technical scheme: a method for measuring the perpendicularity of a two-dimensional linear motion platform comprises the following steps:
the device comprises a linear motion platform, a reflector, a first collimation assembly and a second collimation assembly, wherein the reflector is arranged at one corner of the surface of the linear motion platform, the first collimation assembly and the second collimation assembly are respectively arranged at two adjacent sides of the linear motion platform, the first collimation assembly and the second collimation assembly are symmetrical about the reflector, the first collimation assembly comprises a first semiconductor laser arranged on the surface of the linear motion platform, a first laser collimation beam expanding system and a first spectroscope which are fixed above the linear motion platform in a suspension manner, a second spectroscope, a first convergent lens, a first telescope system, a first CCD device and a first four-quadrant photoelectric detector which are arranged outside the linear motion platform, and the second collimation assembly comprises a second semiconductor laser arranged at the adjacent side of the surface of the linear motion platform, a first focusing lens, a first CCD device and a first four-quadrant photoelectric detector, The second laser collimation beam expanding system and the third beam splitter are fixed above the linear motion platform in a suspending manner, and the fourth beam splitter, the second converging lens, the second telescope system, the second CCD device and the second four-quadrant photoelectric detector are arranged outside the linear motion platform;
secondly, collimating the instrument, transmitting a laser beam by a first semiconductor laser, focusing the laser beam on a second CCD device along a first laser collimation and beam expansion system through a first spectroscope, a reflector, a third spectroscope, a fourth spectroscope and a second convergent lens, transmitting the laser beam by a second semiconductor laser, and focusing the laser beam on the first CCD device along a second laser collimation and expansion system through the third spectroscope, the reflector, the first spectroscope, the second spectroscope and the first convergent lens;
thirdly, adjusting the first semiconductor laser, the second semiconductor laser and the reflector by using a precision adjusting mechanism to enable image points received by the first CCD device and the second CCD device to be positioned at the center positions of respective view fields;
fourthly, adjusting the positions, pitching and yawing of the first four-quadrant photoelectric detector and the second four-quadrant photoelectric detector to enable the laser beam to accurately enter the central positions of the two photoelectric detectors, and completely finishing the collimation and correction of the instrument;
fifthly, measuring the angle, the straightness and the flatness of the linear motion platform in the X direction, starting a first semiconductor laser, closing a second semiconductor laser, keeping the second semiconductor laser still, enabling the first semiconductor laser to move along the X direction, setting a plurality of measuring points in the whole movement process of the X direction, respectively reading the displacement deviation of an image point on a second CCD device and the displacement deviation of a laser beam on a second four-quadrant photoelectric detector at the first measuring point, completing the error measurement of the point, then sequentially completing the measurement of the angle, the straightness and the flatness errors of all the measuring points arranged in the X direction, and fitting the straightness error value of the linear motion platform in the X direction by using a least square method;
sixthly, measuring the angle, the straightness and the flatness of the linear motion platform in the Y direction, starting a second semiconductor laser, closing the first semiconductor laser, keeping the first semiconductor laser still, enabling the second semiconductor laser to move along the Y direction, setting a plurality of measuring points in the whole movement process of the Y direction, respectively reading the displacement deviation of an image point on a first CCD (charge coupled device) and the displacement deviation of a laser beam on a first four-quadrant photoelectric detector at the first measuring point, completing the error measurement of the point, then sequentially completing the measurement of the angle, the straightness and the flatness errors of all the measuring points arranged in the Y direction, and fitting the straightness error value of the linear motion platform in the Y direction by using a least square method;
seventhly, calculating the perpendicularity of the two-dimensional linear motion platform, and calculating perpendicularity error information of the motion axis of the two-dimensional linear motion platform by using the straightness information fitted in the fifth step and the sixth step;
and eighthly, finishing the measurement of the angle error, the straightness error, the planeness error and the perpendicularity error of the two shafts of the X shaft and the Y shaft of the linear motion platform, and finishing the measurement.
Further, in the second step, an optical axis of the laser beam emitted by the first semiconductor laser device reaching the second CCD device and an optical axis of the laser beam emitted by the second semiconductor laser device reaching the first CCD device are perpendicular to each other.
Furthermore, in the third step, the precision adjusting mechanism is mainly used for adjusting the translation, the pitching and the yawing of the first semiconductor laser, the second semiconductor laser, the first four-quadrant photodetector, the second quadrant photodetector and the reflector.
Furthermore, in the fifth step and the sixth step, in the measuring process, the reflector is always in a static state, the plane processing precision of the reflector can directly influence the laser collimation precision, and the proposed flatness technical index is that the PV value is less than lambda/10.
Furthermore, in the fifth step and the sixth step, the first CCD device and the second CCD device undertake the signal receiving tasks of instrument collimation and angle measurement, and accurately read the displacement change of the image point after the laser is focused by the lens by using the corresponding data processing algorithm, the first four-quadrant photodetector and the second four-quadrant photodetector are responsible for receiving the straightness error and the flatness error, and the displacement change information of the laser beam center on the target surface of the detector is obtained by using the corresponding data processing algorithm.
Further, the data processing algorithm and the calculation of the verticality are integrated into a software testing system.
Compared with the prior art, the invention has the beneficial effects that:
1. all indexes of the two-dimensional linear motion platform are measured without using an interferometer or a special L mirror, so that the cost can be saved.
2. The angle, straightness, flatness and perpendicularity of the two shafts of the two-dimensional linear motion platform can be measured simultaneously, independent separate measurement is not needed, and overall measurement efficiency is improved.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention.
In the drawings:
FIG. 1 is a schematic diagram of the construction of a measurement system according to the present invention;
FIG. 2 is a flow chart of a measurement method of the present invention;
reference numbers in the figures: 1. a linear motion stage; 2. a first collimating component; 201. a first semiconductor laser; 202. a first laser collimation beam expanding system; 203. a first beam splitter; 204. a second spectroscope; 205. a first converging lens; 206. a first telescope system; 207. a first CCD device; 208. a first four quadrant photodetector; 3. a second collimating assembly; 301. a second semiconductor laser; 302. a second laser collimation beam expanding system; 303. a third beam splitter; 304. a fourth spectroscope; 305. a second condenser lens; 306. a second telescope system; 307. a second CCD device; 308. a second fourth quadrant photodetector; 4. a mirror.
Detailed Description
The preferred embodiments of the present invention will be described in conjunction with the accompanying drawings, and it will be understood that they are described herein for the purpose of illustration and explanation and not limitation.
Example (b): the overall measurement structure is shown in fig. 1, wherein the XOY plane represents the plane of the two-axis linear motion platform 1, the horizontal direction is the X axis, the vertical direction is the Y axis,
as shown in fig. 2, a method for measuring the perpendicularity of a two-dimensional linear motion platform includes the following specific steps:
the method comprises the steps of firstly, installing an instrument, wherein the instrument comprises a moving platform 1, a reflector 4, a first collimation assembly 2 and a second collimation assembly 3, the reflector 4 is installed at one corner of the surface of the linear moving platform 1, the first collimation assembly 2 and the second collimation assembly 3 are respectively installed at two adjacent sides of the linear moving platform 1, the first collimation assembly 2 and the second collimation assembly 3 are symmetrical about the reflector 4, the first collimation assembly 2 comprises a first semiconductor laser 201 installed on the surface of the linear moving platform 1, a first laser collimation and beam expansion system 202 and a first spectroscope 203 which are suspended and fixed above the linear moving platform 1, and a second spectroscope 204, a first convergent lens 205, a first telescope system 206, a first CCD device 207 and a first four-quadrant photoelectric detector 208 which are installed outside the linear moving platform 1, the second collimation assembly 3 comprises a second semiconductor laser 301 arranged on the adjacent side of the surface of the linear motion platform 1, a second laser collimation and beam expansion system 302 and a third spectroscope 303 suspended and fixed above the linear motion platform 1, and a fourth spectroscope 304, a second convergent lens 305, a second telescope system 306, a second CCD device 307 and a second four-quadrant photodetector 308 arranged outside the linear motion platform 1;
secondly, the instrument is collimated, the laser beam emitted by the first semiconductor laser 201 is focused on the second CCD device 307 through the first beam splitter 203, the reflecting mirror 4, the third beam splitter 303, the fourth beam splitter 304 and the second converging lens 305 along the first laser collimation and beam expansion system 202, meanwhile, the laser beam emitted by the second semiconductor laser 301 is focused on the first CCD device 207 through the third beam splitter 303, the reflecting mirror 4, the first beam splitter 203, the second beam splitter 204 and the first converging lens 205 along the second laser collimation and beam expansion system 302, the optical axis of the laser beam emitted by the first semiconductor laser device 201 reaching the second CCD device 307 and the optical axis of the laser beam emitted by the second semiconductor laser device 301 reaching the first CCD device 207 are perpendicular to each other, wherein the processing precision of the plane of the reflector 4 can directly influence the laser collimation precision, and the proposed flatness technical index is that the PV value is less than lambda/10;
thirdly, a precision adjusting mechanism is used for adjusting the translation, the pitching and the deflection of the first semiconductor laser 201, the second semiconductor laser 301 and the reflector 4, so that the image points received by the first CCD device 207 and the second CCD device 307 are positioned at the center positions of the respective fields of view;
fourthly, adjusting the positions, pitching and yawing of the first four-quadrant photodetector 208 and the second four-quadrant photodetector 308 to enable the laser beam to accurately enter the central positions of the two photodetectors, and thus, completely finishing the collimation and correction of the instrument;
fifthly, measuring the angle, the straightness and the flatness of the linear motion platform 1 in the X direction, starting the first semiconductor laser 201, closing the second semiconductor laser 301, keeping the second semiconductor laser 301 still, enabling the first semiconductor laser 201 to move along the X direction, setting a plurality of measuring points in the whole movement process in the X direction, wherein the interval between each measuring point is 20mm, reading the offset difference of an image point on a second CCD device 307 and the displacement deviation of a laser beam on a second four-quadrant photoelectric detector 308 at the first measuring point, calculating the angle, the straightness and the flatness error information of the measuring point, wherein the second CCD device 307 takes the signal receiving tasks of collimation and angle measurement by an instrument, and accurately reads the displacement change of the image point after the laser is focused by a lens by utilizing a corresponding data processing algorithm, and the second four-quadrant photoelectric detector 308 is responsible for receiving the straightness error and the flatness error, acquiring displacement change information of a laser beam center on a detector target surface by using a corresponding data processing algorithm, integrating the corresponding measurement data reading and processing algorithm into a set of software testing system, sequentially completing measurement of angles, straightness and plane error of all measurement points in the X direction by the same method, and fitting a straightness error value in the X direction of the linear motion platform 1 by using a least square method, wherein the reflector 4 is always in a static state in the measurement process;
sixthly, measuring the angle, the straightness and the flatness of the linear motion platform 1 in the Y direction, starting the second semiconductor laser 301, closing the first semiconductor laser 201, keeping the first semiconductor laser 201 still, moving the second semiconductor laser 301 along the Y direction, setting a plurality of measuring points in the whole moving process in the Y direction, wherein the interval between each measuring point is 20mm, reading the displacement deviation of an image point on the first CCD device 207 and the displacement deviation of a laser beam on the first four-quadrant photoelectric detector 208 at the first measuring point, and respectively calculating the angle, the straightness and the flatness error information of the measuring point, wherein the first CCD device 207 takes charge of signal receiving tasks of collimation and angle measurement, and accurately reads the displacement change of the image point after the laser is focused by a lens by using a corresponding data processing algorithm, and the first four-quadrant photoelectric detector 208 takes charge of receiving the straightness error and the flatness error, the displacement change information of the laser beam center on the target surface of the detector is obtained by using a corresponding data processing algorithm, the corresponding data processing algorithm is integrated into a set of software testing system, the measurement of the angle, the straightness and the flatness error of all measuring points in the Y direction can be completed in sequence by the same principle, the straightness error value in the Y direction of the linear motion platform 1 is fitted by using a least square method, the reflector 4 is always in a static state in the measuring process, and it needs to be noted that the offset of the laser beam center accurately calculated by the four-quadrant detector can be influenced to a certain extent by the angle error. Therefore, before calculating the measurement results of the straightness and the flatness, the angle error information of the point needs to be deducted in advance by using the angle value and the projection mapping relation so as to obtain accurate measurement results of the straightness and the flatness;
seventhly, calculating the perpendicularity of the two-dimensional linear motion platform, and calculating perpendicularity error information of the motion axis of the two-dimensional linear motion platform by using the straightness information fitted in the fifth step and the sixth step;
and eighthly, finishing the measurement of the angle error, the straightness error, the planeness error and the perpendicularity error of the two shafts of the X shaft and the Y shaft of the linear motion platform 1, and finishing the measurement.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. A method for measuring the perpendicularity of a two-dimensional linear motion platform is characterized by comprising the following steps:
the device comprises a linear motion platform, a reflector, a first collimation assembly and a second collimation assembly, wherein the reflector is arranged at one corner of the surface of the linear motion platform, the first collimation assembly and the second collimation assembly are respectively arranged at two adjacent sides of the linear motion platform, the first collimation assembly and the second collimation assembly are symmetrical about the reflector, the first collimation assembly comprises a first semiconductor laser arranged on the surface of the linear motion platform, a first laser collimation beam expanding system and a first spectroscope which are fixed above the linear motion platform in a suspension manner, a second spectroscope, a first convergent lens, a first telescope system, a first CCD device and a first four-quadrant photoelectric detector which are arranged outside the linear motion platform, and the second collimation assembly comprises a second semiconductor laser arranged at the adjacent side of the surface of the linear motion platform, a first focusing lens, a first CCD device and a first four-quadrant photoelectric detector, The second laser collimation beam expanding system and the third beam splitter are fixed above the linear motion platform in a suspending manner, and the fourth beam splitter, the second converging lens, the second telescope system, the second CCD device and the second four-quadrant photoelectric detector are arranged outside the linear motion platform;
secondly, collimating the instrument, transmitting a laser beam by a first semiconductor laser, focusing the laser beam on a second CCD device along a first laser collimation and beam expansion system through a first spectroscope, a reflector, a third spectroscope, a fourth spectroscope and a second convergent lens, transmitting the laser beam by a second semiconductor laser, and focusing the laser beam on the first CCD device along a second laser collimation and expansion system through the third spectroscope, the reflector, the first spectroscope, the second spectroscope and the first convergent lens;
thirdly, adjusting the first semiconductor laser, the second semiconductor laser and the reflector by using a precision adjusting mechanism to enable image points received by the first CCD device and the second CCD device to be positioned at the center positions of respective view fields;
fourthly, adjusting the positions, pitching and yawing of the first four-quadrant photoelectric detector and the second four-quadrant photoelectric detector to enable the laser beam to accurately enter the central positions of the two photoelectric detectors, and completely finishing the collimation and correction of the instrument;
fifthly, measuring the angle, the straightness and the flatness of the linear motion platform in the X direction, starting a first semiconductor laser, closing a second semiconductor laser, keeping the second semiconductor laser still, enabling the first semiconductor laser to move along the X direction, setting a plurality of measuring points in the whole movement process of the X direction, respectively reading the displacement deviation of an image point on a second CCD device and the displacement deviation of a laser beam on a second four-quadrant photoelectric detector at the first measuring point, completing the error measurement of the point, then sequentially completing the measurement of the angle, the straightness and the flatness errors of all the measuring points arranged in the X direction, and fitting the straightness error value of the linear motion platform in the X direction by using a least square method;
sixthly, measuring the angle, the straightness and the flatness of the linear motion platform in the Y direction, starting a second semiconductor laser, closing the first semiconductor laser, keeping the first semiconductor laser still, enabling the second semiconductor laser to move along the Y direction, setting a plurality of measuring points in the whole movement process of the Y direction, respectively reading the displacement deviation of an image point on a first CCD (charge coupled device) and the displacement deviation of a laser beam on a first four-quadrant photoelectric detector at the first measuring point, completing the error measurement of the point, then sequentially completing the measurement of the angle, the straightness and the flatness errors of all the measuring points arranged in the Y direction, and fitting the straightness error value of the linear motion platform in the Y direction by using a least square method;
seventhly, calculating the perpendicularity of the two-dimensional linear motion platform, and calculating perpendicularity error information of the motion axis of the two-dimensional linear motion platform by using the straightness information fitted in the fifth step and the sixth step;
and eighthly, finishing the measurement of the angle error, the straightness error, the planeness error and the perpendicularity error of the two shafts of the X shaft and the Y shaft of the linear motion platform, and finishing the measurement.
2. The method for measuring the perpendicularity of the two-dimensional linear motion platform according to claim 1, wherein the method comprises the following steps: in the second step, the optical axis of the laser beam emitted by the first semiconductor laser device reaching the second CCD device and the optical axis of the laser beam emitted by the second semiconductor laser device reaching the first CCD device are perpendicular to each other.
3. The method for measuring the perpendicularity of the two-dimensional linear motion platform according to claim 1, wherein the method comprises the following steps: in the third step, the precision adjusting mechanism is mainly used for adjusting the translation, the pitching and the yawing of the first semiconductor laser, the second semiconductor laser, the first four-quadrant photoelectric detector, the second quadrant photoelectric detector and the reflector.
4. The method for measuring the perpendicularity of the two-dimensional linear motion platform according to claim 1, wherein the method comprises the following steps: in the fifth step and the sixth step, the reflecting mirror is always in a static state in the measuring process.
5. The method for measuring the perpendicularity of the two-dimensional linear motion platform according to claim 1, wherein the method comprises the following steps: in the fifth step and the sixth step, the first CCD device and the second CCD device undertake signal receiving tasks of instrument collimation and angle measurement, displacement change of an image point after laser is focused by the lens is accurately read by using a corresponding data processing algorithm, the first four-quadrant photoelectric detector and the second four-quadrant photoelectric detector are responsible for receiving straightness errors and flatness errors, and displacement change information of a laser beam center on a detector target surface is obtained by using the corresponding data processing algorithm.
6. The method for measuring the perpendicularity of the two-dimensional linear motion platform according to claim 5, wherein the method comprises the following steps: the data processing algorithm and the calculation of the perpendicularity are integrated into a set of software testing system.
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