CN110736721B - Glass plate refractive index uniformity detection device and detection method based on diffraction grating - Google Patents
Glass plate refractive index uniformity detection device and detection method based on diffraction grating Download PDFInfo
- Publication number
- CN110736721B CN110736721B CN201810797550.9A CN201810797550A CN110736721B CN 110736721 B CN110736721 B CN 110736721B CN 201810797550 A CN201810797550 A CN 201810797550A CN 110736721 B CN110736721 B CN 110736721B
- Authority
- CN
- China
- Prior art keywords
- diffraction grating
- light
- adjustable
- wavelength
- waves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
Abstract
The invention relates to a glass plate refractive index uniformity detection device and a detection method based on a diffraction grating, the device comprises a wavelength-adjustable light source, a beam expander, a pinhole diaphragm, a collimating lens, an adjustable slit and a reflective planar diffraction grating are sequentially arranged along the direction of an optical axis of emergent light of the wavelength-adjustable light source, an incident included angle of 20-45 degrees is formed between a working surface of the reflective planar diffraction grating 6 and the optical axis of the emergent light, an optical imaging lens and a CCD image acquisition system are vertically and sequentially arranged below the reflective planar diffraction grating, and the CCD image acquisition system is connected with a computer; and a piece to be measured is arranged between the reflection type plane diffraction grating and the optical imaging lens. The optical path system realizes the non-contact measurement of the spatial refractive index uniformity distribution of the optical glass with large thickness and large refractive index change.
Description
Technical Field
The invention belongs to the field of optical detection, relates to a light diffraction technology, a spectrum analysis technology and a computer image and data processing technology, and particularly relates to a device and a method for detecting the refractive index uniformity of a glass plate based on a diffraction grating.
Background
The optical glass is a main material for manufacturing optical devices such as optical lenses, optical prisms, optical reflectors, spectroscopes, optical fibers, lasers and the like, and the performance of the optical devices is directly influenced by the uniformity of the refractive index of the optical glass. Therefore, the uniformity measurement of optical glass is a research hotspot in the field of optics.
The traditional method for detecting the refractive index of the optical glass mainly comprises the following steps: (1) a needle inserting method; (2) a spectrometer. The incident angle and the refraction angle are mainly measured, and the refractive index of the glass brick is obtained according to the refraction law of glass. The two methods have the advantages of direct measurement, simple measuring instrument and convenient operation. The defects are that the contact type measurement is adopted, the workpiece to be measured is abraded, the measurement precision is low, and the average refractive index of the optical glass is detected.
The non-contact measurement method comprises the following steps: mainly interferometric measurements. The interference method measurement is to measure interference fringes formed by reflection of the upper surface and the lower surface of the optical glass by using a Michelson interferometer, and perform image and data processing on the interference fringes to obtain the spatial refractive index distribution of the optical flat glass. The method has the advantages that the space refractive index distribution is measured and detected in a non-contact mode, and the measurement precision is high. The method has the disadvantages that the measurement range is small due to the limitation of interference conditions, and the method is generally suitable for measuring the optical glass material with small thickness and small refractive index change.
There are two main types of optical detection methods based on diffraction gratings: (1) utilizing a transmissive diffraction grating; (2) a reflective diffraction grating is utilized. The two methods mainly utilize the light splitting performance of the diffraction grating to measure the average refractive index of the liquid, the measurement range is large, and the measurement method is simple. The disadvantage is that the measurement is the liquid average refractive index and the measurement accuracy is low.
Disclosure of Invention
The application provides a glass plate refractive index uniformity detection device and a detection method based on a diffraction grating, and solves the problem that in the prior art, the refractive index detection precision of optical glass with large thickness and large refractive index change is not high.
In order to achieve the purpose, the technical scheme of the invention is as follows:
the glass plate refractive index uniformity detection device based on the diffraction grating comprises a wavelength-adjustable light source, wherein a beam expander, a pinhole diaphragm, a collimating mirror, an adjustable slit and a reflective planar diffraction grating are sequentially arranged along the optical axis direction of emergent light of the wavelength-adjustable light source, an incident included angle of 20-45 degrees is formed between the working surface of the reflective planar diffraction grating 6 and the optical axis of the emergent light, an optical imaging lens and a CCD image acquisition system are vertically and sequentially arranged below the reflective planar diffraction grating, and the CCD image acquisition system is connected with a computer; and a piece to be measured is arranged between the reflection type plane diffraction grating and the optical imaging lens.
Further, the focal length of the collimating mirror is equal to the distance from the collimating mirror to the pinhole diaphragm.
Furthermore, the adjustable range of the slit width of the adjustable slit is 0-10 mm.
The glass plate refractive index uniformity detection method based on the diffraction grating comprises the following steps:
step 4, adjusting the reflective plane diffraction grating to enable the appropriate linear plane light waves to be incident obliquely, wherein the reflected light waves are diffraction light waves;
step 5, adjusting the reflective plane diffraction grating to enable + 1-order diffraction waves to be converged through the optical imaging lens, obtaining a diffraction pattern A on an image plane of the optical imaging lens, and adjusting the CCD image acquisition system to receive the diffraction pattern A;
and 8, comparing the diffraction pattern B with the diffraction pattern A by the computer to obtain the spatial distribution information of the refractive index of the to-be-detected piece.
The invention has the beneficial effects that:
the optical path system realizes the non-contact measurement of the spatial refractive index uniformity distribution of the optical glass with large thickness and large refractive index change. The method combines the ultrastrong light splitting performance of the reflection type diffraction grating with the data processing technology of a computer, can measure the average refractive index of the optical glass, can also measure the uniformity of the spatial refractive index, and has the advantages of high measurement precision, wide measurement range and simple operation.
Drawings
FIG. 1 is a schematic view of the overall structure of the apparatus of the present invention;
FIG. 2 is a schematic view of the measurement path of diffraction pattern A of the present invention;
FIG. 3 is a schematic diagram of the measurement path of diffraction pattern B of the present invention;
in the figure, 1-wavelength adjustable light source, 2-beam expander, 3-pinhole diaphragm, 4-collimating mirror, 5-adjustable slit, 6-reflection type plane diffraction grating, 7-to-be-measured piece, 8-optical imaging lens, 9-CCD image acquisition system, 10-computer, 11-plane monochromatic light wave, 12-normal, 13-0 order diffraction beam, 14- +1 order diffraction beam, 15-600mm +1 order diffraction beam, 16- +1 order diffraction angle, 17-standard glass plate, 18-incidence angle, 19-to-be-measured piece-free light and 20-to-be-measured piece-free light.
Detailed Description
The present invention will be described in further detail with reference to the following detailed description and accompanying drawings. Wherein like elements in different embodiments are numbered with like associated elements. In the following description, numerous details are set forth in order to provide a better understanding of the present application. However, one skilled in the art will readily recognize that some of the features may be omitted or replaced with other elements, materials, methods in different instances. In some instances, certain operations related to the present application have not been shown or described in detail in order to avoid obscuring the core of the present application from excessive description, and it is not necessary for those skilled in the art to describe these operations in detail, so that they may be fully understood from the description in the specification and the general knowledge in the art.
Referring to fig. 1, the device for detecting the refractive index uniformity of a glass plate based on a diffraction grating comprises a wavelength-adjustable light source 1, wherein a beam expander 2, a pinhole diaphragm 3, a collimating lens 4, an adjustable slit 5 and a reflective planar diffraction grating 6 are sequentially arranged along the optical axis direction of emergent light of the wavelength-adjustable light source 1, an incident included angle of 20-45 degrees is formed between the working surface of the reflective planar diffraction grating 6 and the optical axis of the emergent light, an optical imaging lens 8 and a CCD image acquisition system 9 are vertically and sequentially arranged below the reflective planar diffraction grating 6, and the CCD image acquisition system 9 is connected with a computer 10; and a to-be-detected piece 7 is arranged between the reflection type plane diffraction grating 6 and the optical imaging lens 8.
The wavelength-adjustable light source 1 is a xenon lamp light source, and the wavelength adjusting range of the xenon lamp light source is 400nm-800 nm.
The linear logarithm of the reflective planar diffraction grating 6 is 600/mm, and the aperture is 50mm × 50 mm.
The aperture of the pinhole diaphragm 3 is 1.5 mm.
The focal length of the collimator lens 4 is equal to the distance from the collimator lens 4 to the pinhole diaphragm 3.
The adjustable range of the slit width of the adjustable slit 5 is 0-10mm, and the slit length is 30 mm.
The focal length of the optical imaging lens 8 is 25mm, the caliber of the optical imaging lens is 30mm, and the distance between the reflective plane diffraction grating 6 and the optical imaging lens 8 is 100 mm.
The glass plate refractive index uniformity detection method based on the diffraction grating comprises the following steps:
step 4, adjusting the reflective planar diffraction grating 6 to enable the linear planar light waves to be obliquely incident with the incident angle of alpha (20-45 degrees) and the reflected light waves to be + 1-order diffracted light waves, wherein the linear logarithm of the reflective planar diffraction grating 6 is 600/mm, and the aperture of the reflective planar diffraction grating is 50mm multiplied by 50 mm;
step 5, adjusting the diffracted light wave + 1-order diffracted wave of the reflective planar diffraction grating 6 to converge through the optical imaging lens 8, wherein the focal length of the optical imaging lens 8 is 25mm, the caliber of the optical imaging lens is 30mm, the distance between the reflective planar diffraction grating 6 and the optical imaging lens 8 is 100mm, fixing the image surface behind the optical imaging lens 8 by using an optoelectronic fixing processing system, so that a clear diffraction pattern A is obtained on the image surface behind the optical imaging lens 8, and receiving the diffraction pattern A by using a CCD image acquisition system 9;
And 7, adding the to-be-detected piece 7 in front of (without contact with) the reflective plane diffraction grating 6 to obtain a variable diffraction light wave on an image plane of the optical imaging lens 8, and adjusting the CCD image acquisition system 9 to receive the diffraction pattern B.
The test principle is as follows: as shown in fig. 3, for the optical system calibrated in step 6, the line pair number of the diffraction grating is 600/mm, and the equation of the diffraction grating is substituted:
d(sinα±sinθ)=mλ
wherein: alpha is an incident angle, theta is a diffraction angle,m is the diffraction order, which is the wavelength of the incident light wave.
Selecting a diffraction order m as +1 order, setting the incidence angle as the incidence angle calibrated in the step 6, substituting the diffraction grating equation when the wavelength of the wavelength-adjustable light source 1 is changed from a visible light range of 400nm-800nm, and calculating that the +1 order diffraction angle range is 14-29 degrees, the divergence angle is 15 degrees, if the distance from the selected diffraction grating 6 to the optical lens 9 is 100mm, the focal length of the optical lens is 25mm, and the general aperture is 30mm (larger than the size of the projection light spot). According to the geometrical optical knowledge, the position of the image plane and the magnification beta of the optical lens can be calculated.
As shown in fig. 3, the formula of the law of refraction:
n1sinθ1=n2sinθ2
wherein: n is a radical of an alkyl radical1Is the refractive index of the incident medium, n2Is refractive index of the refractive medium, theta1Is the angle of incidence, θ2Is the angle of refraction.
It can be known that the refraction angle of the added to-be-measured piece 7 is smaller than the angle of the added to-be-measured piece 7, as shown in fig. 3, the light 19 of the added to-be-measured piece 7 and the light 20 of the added to-be-measured piece 7 have a certain separation distance d, the distance d can be acquired and calculated by the CCD image acquisition system 9, if the thickness h and the incident angle theta of the to-be-measured piece 7 are known, the distance d is calculated1Establishing a mathematical model of the refractive index n and related parameters of the to-be-measured piece through a geometric relation formed by a refraction law and a linear propagation law of light beams:
wherein: n is the refractive index of the object 7 to be measured, theta1The incident angle, h is the thickness of the dut, and d is the distance separating the light 19 without the dut and the light 20 with the dut.
The refractive index variation delta n of the piece to be measured and a related parameter mathematical model are as follows:
wherein: n is the refractive index of the object to be measured, theta1The incident angle, h, the thickness of the test object, and Δ d, the variation of the distance separating the light 19 of the test object 7 and the light 20 of the test object 7.
and (4) calculating the average value n and the variable quantity delta n of the refractive index of the to-be-measured piece according to the mathematical model established in the step (7) and the tested parameters d 'and delta d'.
And 9, adjusting the wavelength of the wavelength-adjustable light source 1 to change from the range of 400nm to 800nm, scanning and collecting a plurality of diffraction patterns A without the to-be-detected piece 7 by taking the wavelength difference value 5nm as a step length, respectively storing the plurality of diffraction patterns B with the to-be-detected piece 7, processing by utilizing the established model and the compiled software, and calculating to obtain the spatial refractive index distribution information of the to-be-detected piece.
The present invention has been described in terms of specific examples, which are provided to aid understanding of the invention and are not intended to be limiting. For a person skilled in the art to which the invention pertains, several simple deductions, modifications or substitutions may be made according to the idea of the invention.
Claims (1)
1. The method for detecting the uniformity of the refractive index of the glass plate based on the diffraction grating is characterized by comprising the following steps of:
step 1, adjusting the position of a beam expander to converge light beams emitted by a light source with adjustable wavelength to one point, adding a pinhole diaphragm at the convergence point, filtering stray light and enabling the emitted light waves to be spherical waves;
step 2, adjusting the position of the collimating mirror to enable incident spherical waves to become planar light waves after passing through;
step 3, adjusting the width of the adjustable slit to enable the planar light waves to pass through the slit and then emit appropriate linear planar light waves;
step 4, adjusting the reflective plane diffraction grating to enable the appropriate linear plane light waves to be incident obliquely, wherein the reflected light waves are diffraction light waves;
step 5, adjusting the reflective plane diffraction grating to enable + 1-order diffraction waves to be converged through the optical imaging lens, obtaining a diffraction pattern A on an image plane of the optical imaging lens, and adjusting the CCD image acquisition system to receive the diffraction pattern A;
step 6, in order to uniformly project + 1-order diffraction waves with the wavelength of 400nm-800nm onto a receiving surface of the CCD, selecting the central wavelength of 600nm of an adjustable light source to calibrate a light beam incident angle, and adjusting the light beam incident angle to enable the diffraction waves with the wavelength of 600nm to vertically incident on the receiving surface of the CCD to serve as a central coordinate received by the CCD;
step 7, adding a to-be-detected piece between the reflective plane diffraction grating and the optical imaging lens, obtaining diffracted light waves B refracted by the to-be-detected piece on an image plane of the optical imaging lens, and adjusting the CCD image acquisition system to receive the diffraction pattern B;
step 8, comparing the diffraction pattern B with the diffraction pattern A by the computer to obtain the spatial distribution information of the refractive index of the to-be-detected piece;
the detection device adopted by the detection method comprises a wavelength-adjustable light source (1), wherein a beam expander (2), a pinhole diaphragm (3), a collimating lens (4), an adjustable slit (5) and a reflective planar diffraction grating (6) are sequentially arranged along the optical axis direction of emergent light of the wavelength-adjustable light source (1), an incident included angle of 20-45 degrees is formed between the working surface of the reflective planar diffraction grating (6) and the optical axis of the emergent light, an optical imaging lens (8) and a CCD image acquisition system (9) are vertically and sequentially arranged below the reflective planar diffraction grating (6), and the CCD image acquisition system (9) is connected with a computer (10); a to-be-detected piece (7) is arranged between the reflection type plane diffraction grating (6) and the optical imaging lens (8);
the focal length of the collimating mirror (4) is equal to the distance from the collimating mirror (4) to the pinhole diaphragm (3);
the adjustable range of the slit width of the adjustable slit (5) is 0-10 mm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810797550.9A CN110736721B (en) | 2018-07-18 | 2018-07-18 | Glass plate refractive index uniformity detection device and detection method based on diffraction grating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810797550.9A CN110736721B (en) | 2018-07-18 | 2018-07-18 | Glass plate refractive index uniformity detection device and detection method based on diffraction grating |
Publications (2)
Publication Number | Publication Date |
---|---|
CN110736721A CN110736721A (en) | 2020-01-31 |
CN110736721B true CN110736721B (en) | 2022-05-24 |
Family
ID=69235650
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810797550.9A Active CN110736721B (en) | 2018-07-18 | 2018-07-18 | Glass plate refractive index uniformity detection device and detection method based on diffraction grating |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110736721B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111880317B (en) * | 2020-05-08 | 2022-05-06 | 东莞埃科思科技有限公司 | Simulation system and method of laser projection module |
CN111812933A (en) * | 2020-08-10 | 2020-10-23 | 陈方 | Grating space imaging projection optical system |
CN114184580B (en) * | 2021-12-08 | 2023-10-03 | 中国人民解放军国防科技大学 | High-precision measuring method for refractive index of glass cylinder |
CN114894712B (en) * | 2022-03-25 | 2023-08-25 | 业成科技(成都)有限公司 | Optical measuring equipment and correction method thereof |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH067102B2 (en) * | 1989-02-06 | 1994-01-26 | 工業技術院長 | High stability interferometer for refractive index measurement |
BG51420A1 (en) * | 1991-06-14 | 1993-05-14 | Ts Lab Za Optichen Zapis I Obr | Device for measurement of difference between the refractive indexes |
US6842286B2 (en) * | 2002-09-03 | 2005-01-11 | Agilent Technologies, Inc. | Optical system and methods that compensate for changes in atmospheric conditions |
JP5008650B2 (en) * | 2008-12-25 | 2012-08-22 | キヤノン株式会社 | Refractive index distribution measuring method and refractive index distribution measuring apparatus |
KR101118274B1 (en) * | 2009-12-21 | 2012-06-12 | 연세대학교 산학협력단 | Method and apparatus for measuring refractive index profile |
JP5857499B2 (en) * | 2011-07-26 | 2016-02-10 | 株式会社ニコン | measuring device |
CN202433173U (en) * | 2012-01-04 | 2012-09-12 | 西北工业大学 | Device for measuring diffraction efficiency of reflective grating by parabolic reflector |
CN107110778B (en) * | 2014-10-31 | 2020-01-07 | 康宁股份有限公司 | High-precision measurement of the refractive index distribution of a cylindrical glass body |
CN205719966U (en) * | 2016-06-07 | 2016-11-23 | 西京学院 | A kind of measuring device for liquid refractive index based on optical grating diffraction |
CN106680244B (en) * | 2017-01-21 | 2020-10-09 | 西南交通大学 | Non-contact type measuring device and method for refractive index of plate glass |
CN107271038A (en) * | 2017-07-03 | 2017-10-20 | 中国科学院长春光学精密机械与物理研究所 | A kind of high resolution spectrometer system |
CN107870160A (en) * | 2017-11-13 | 2018-04-03 | 西安工业大学 | A kind of measuring method of optical material face refractive index |
-
2018
- 2018-07-18 CN CN201810797550.9A patent/CN110736721B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN110736721A (en) | 2020-01-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110736721B (en) | Glass plate refractive index uniformity detection device and detection method based on diffraction grating | |
US4340306A (en) | Optical system for surface topography measurement | |
US20130010286A1 (en) | Method and device of differential confocal and interference measurement for multiple parameters of an element | |
CN103267743B (en) | A kind of apparatus for measuring refractive index and method | |
US4387994A (en) | Optical system for surface topography measurement | |
CN105181298B (en) | Multiple reflections formula confocal laser Long focal length measurement method and apparatus | |
CN104111163A (en) | Convex lens focal length measuring device and method | |
CN101545760A (en) | Optical transmission spherical surface detector | |
CN104165758B (en) | Lens focal length measuring device and method based on Fizeau interferomenter | |
CN104833486B (en) | Multiple reflections formula laser differential confocal Long focal length measurement method and apparatus | |
CN105115444A (en) | Detection device and detection method of off-axis parabolic mirror surface shape precision | |
CN104215176A (en) | High accuracy optical interval measurement device and method | |
CN104359655A (en) | Off-axis parabolic mirror focal length detection device and method | |
JP2013186017A (en) | Aspheric surface shape measurement method, aspheric surface shape measurement device, optical element processing device and optical element | |
CN110132125A (en) | Grating shearing interferometric optical element defect detecting device and detection method | |
CN112556991A (en) | Lens refractive index measuring device and measuring method thereof | |
CN104154868A (en) | Bifocal lens-based non-contact lens central thickness measuring device | |
CN112902875B (en) | Aspheric reflector curvature radius detection device and method | |
CN113483995A (en) | Detection system and method for refractive index distribution of self-focusing lens | |
CN103438831A (en) | Detection device and detection method of off-axis elliptical mirror | |
CN210863101U (en) | Lens refractive index measuring device | |
CN112857592A (en) | Compact laser wavelength measuring device and measuring method thereof | |
TWI570397B (en) | Optical evaluation of lenses and lens molds | |
WO2023098349A1 (en) | Optical lens parameter measurement device and method | |
CN108572160B (en) | Refractometer for measuring refractive index distribution |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |