CN109612758B - Debugging method and debugging machine platform of coating equipment - Google Patents

Debugging method and debugging machine platform of coating equipment Download PDF

Info

Publication number
CN109612758B
CN109612758B CN201811540663.7A CN201811540663A CN109612758B CN 109612758 B CN109612758 B CN 109612758B CN 201811540663 A CN201811540663 A CN 201811540663A CN 109612758 B CN109612758 B CN 109612758B
Authority
CN
China
Prior art keywords
glass
test
debugging
film
mother glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201811540663.7A
Other languages
Chinese (zh)
Other versions
CN109612758A (en
Inventor
潘柏松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HKC Co Ltd
Original Assignee
HKC Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HKC Co Ltd filed Critical HKC Co Ltd
Priority to CN201811540663.7A priority Critical patent/CN109612758B/en
Publication of CN109612758A publication Critical patent/CN109612758A/en
Priority to PCT/CN2019/123578 priority patent/WO2020125449A1/en
Application granted granted Critical
Publication of CN109612758B publication Critical patent/CN109612758B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M99/00Subject matter not provided for in other groups of this subclass
    • G01M99/008Subject matter not provided for in other groups of this subclass by doing functionality tests
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemically Coating (AREA)

Abstract

The invention discloses a debugging method and a debugging machine for coating equipment. The debugging method comprises the following steps: preparing test mother glass; coating a film on the test mother glass; detecting the coated test plain glass, and judging that the coating equipment is successfully debugged if the coated test plain glass meets the standard; if the standard is not met, the debugging failure of the coating equipment is judged, the step of pulling out the coated test mother glass is executed, and the step of coating the test mother glass is executed again. Through continuous detection, the coating equipment is adjusted to have the best parameters, mass production of products is carried out, and the production efficiency is improved.

Description

Debugging method and debugging machine platform of coating equipment
Technical Field
The invention relates to the technical field of display, in particular to a debugging method and a debugging machine for coating equipment.
Background
With the development of display technology, the demand of people for display panels is increasing. In the manufacturing process of the display panel, the mother glass needs to be coated by a coating apparatus, such as a vacuum ion Deposition (PVD) apparatus, and the coating apparatus is coated and then subjected to subsequent manufacturing processes, such as exposure, development, etching, and the like, to form the display panel.
In the process of coating, because the requirements of the coating technology and the coating environment are high, for example, the requirement of the film thickness and the like, after the coating equipment is restarted or the product specification and the coating environment are changed, the situation that the preset requirement is not met is easy to occur during coating, so that the product is unqualified and the material is wasted.
Disclosure of Invention
The invention aims to provide a debugging method and a debugging machine for coating equipment, which can prevent the coating equipment from going down and improve the utilization rate of the mother glass.
The invention discloses a method for debugging coating equipment, which is characterized by comprising the following steps:
a: preparing test mother glass;
b: coating a film on the test mother glass;
c: detecting the coated test plain glass, and judging that the coating equipment is successfully debugged if the coated test plain glass meets the standard; if the standard is not met, judging that the debugging of the coating equipment fails, and executing the step D;
d: and D, pulling the coated plain glass, debugging the coating equipment, and then re-executing the step B.
Optionally, in the step B, a step of initializing a current film drawing number M equal to 0 is further included;
in the step D, the method also comprises the step of recording the membrane pulling times M which is M + 1;
in the step D, after the step of removing the film from the coated mother glass, the method further comprises the following steps:
e: judging whether the current film drawing times M meet the condition that M is larger than or equal to a first preset threshold value, and executing the step F if the current film drawing times M meet the condition that M is larger than or equal to the first preset threshold value; if not, executing step G;
f: marking the drawn plain glass as product plain glass, replacing a new piece of plain glass as the plain glass for the current machine test, and executing the step B again;
and G, using the plain glass for the current machine test to execute the step B again.
Optionally, the first preset threshold is equal to 2.
Optionally, the step B includes a step of recording a film pulling condition, where the film pulling condition includes a successful film pulling or an unsuccessful film pulling;
in the step E, if the current film pulling condition is initialized to be unsuccessful, the current film pulling frequency M meets the condition that the condition M is not less than a first preset threshold value, and if the film pulling condition is successful, the step F is executed; otherwise, step G is executed.
Optionally, in the step F, the glass marked as the product mother glass is placed until the coating equipment is successfully debugged, and then is used as the product processing mother glass.
Optionally, in the step B, a step of initializing a current film drawing number M equal to 0 is further included;
in the step D, the method also comprises the step of recording the membrane pulling times M which is M + 1;
in the step D, after the step of removing the film from the coated mother glass, the method further comprises the following steps:
e: judging whether the current film drawing times M meet the condition that M is more than or equal to 2, if so, executing a step F1; if not, executing step G;
f1: returning the test mother glass after the membrane is pulled out to the step B again, and executing the step F2 after the step B is executed;
f2: c, executing the step C, if the detection in the step C meets the standard, successfully debugging, and taking the test mother glass as the product mother glass; if the detection in the step C does not meet the standard, the debugging fails, the coated plain glass is directly scrapped, a new piece of plain glass is replaced to be used as the plain glass for the current machine table test, and the step B is executed again;
and G, using the plain glass for the current machine test to execute the step B again.
Optionally, in step C, after the film plating device is judged to be successfully debugged, the following steps are further performed:
h: cleaning the test mother glass;
i: and (5) performing film drawing on the washed mother glass in the step h to obtain the mother glass for the product.
The invention also discloses a debugging method of the coating equipment, which is characterized by comprising the following steps:
a, preparing test mother glass;
b: coating the test element glass, and initializing the current film drawing frequency M to be 0; initializing the current film pulling condition as unsuccessful film pulling;
c: detecting the coated test plain glass, judging that the machine is successfully debugged if the coated test plain glass meets the standard, and executing the step i; if the current debugging fails, executing the step d;
d: cleaning the test mother glass;
e: drawing the membrane of the cleaned test mother glass; recording the current film pulling condition, and recording the current film pulling frequency M as M + 1;
f: judging whether the current membrane drawing times M meet the condition that M is more than or equal to 2, if so, executing the step g; if not, executing the step h;
marking the test mother glass after membrane drawing as product mother glass, replacing a new mother glass as the current test mother glass of the machine, and executing the step b again;
h, using the plain glass for the current machine test to re-execute the step b;
i: cleaning the test mother glass;
j: and (5) performing film drawing on the washed mother glass in the step h to obtain the mother glass for the product.
The invention also discloses a debugging machine table of the coating equipment, which comprises:
the detection device is used for detecting the test plain glass coated by the coating equipment;
the judging device is used for acquiring the detection result of the detecting device and judging the detection result according to a preset standard;
the film pulling device is used for pulling the film of the test element glass which is judged to be not in accordance with the preset standard in the judging device; and the film pulling device sends the film pulled test element glass to film coating equipment for secondary film coating.
Optionally, the debugging machine further includes a control system, the control system records the film pulling times or the film pulling conditions in the film pulling device, and the control system includes at least one field for recording the film pulling times or the film pulling conditions.
Compared with the scheme of directly coating the unmounted vacuum ion coating equipment, the method has the advantages that the coating equipment is debugged, the element glass for testing after coating is prepared and detected, if the detection meets the standard, the debugging is successful, if the detection does not meet the standard, the current debugging is judged to fail, the element glass for testing after coating and detected is subjected to film pulling, the coating before coating is removed so as not to influence the detection, and after the coating equipment is debugged, the coating equipment is subjected to coating again; and then, detecting again, wherein the process is continued until the detection meets the standard and the debugging is successful. The detection criteria are set by the person skilled in the art as the case may be.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the application, are incorporated in and constitute a part of this specification, illustrate embodiments of the application and together with the description serve to explain the principles of the application. It is obvious that the drawings in the following description are only some embodiments of the application, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. In the drawings:
FIG. 1 is a flow chart of a debugging method according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a debugging method flow including a membrane pull record according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a debugging method flow for product conversion according to an embodiment of the invention;
FIG. 4 is a flow diagram illustrating a debugging method for debugging a successful product transfer according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of a debugging method flow for product conversion according to another embodiment of the present invention;
fig. 6 is a schematic diagram of a debugging platform and a coating apparatus according to another embodiment of the invention.
100, debugging a machine table; 110. a detection device; 120. a judging device; 130. a film drawing device; 140. a management and control system; 200. provided is a coating device.
Detailed Description
It is to be understood that the terminology, the specific structural and functional details disclosed herein are for the purpose of describing particular embodiments only, and are representative, but that the present application may be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein.
In the description of the present application, the terms "first", "second" are used for descriptive purposes only and are not to be construed as indicating relative importance or as implicitly indicating the number of technical features indicated. Thus, unless otherwise specified, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature; "plurality" means two or more. The terms "comprises" and "comprising," and any variations thereof, are intended to cover a non-exclusive inclusion, such that one or more other features, integers, steps, operations, elements, components, and/or combinations thereof may be present or added.
Further, terms of orientation or positional relationship indicated by "center", "lateral", "upper", "lower", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, are described based on the orientation or relative positional relationship shown in the drawings, are simply for convenience of description of the present application, and do not indicate that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present application.
Furthermore, unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly and may include, for example, fixed connections, removable connections, and integral connections; can be mechanically or electrically connected; either directly or indirectly through intervening media, or through both elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate. The invention will be further elucidated with reference to the drawings and alternative embodiments.
As shown in fig. 1, an embodiment of the present invention discloses a method for debugging a coating apparatus, including the steps of:
a: preparing test mother glass;
b: coating a film on the test mother glass;
c: detecting the coated test plain glass, and judging that the coating equipment is successfully debugged if the coated test plain glass meets the standard; if the standard is not met, judging that the debugging of the coating equipment fails, and executing the step D;
d: and D, pulling the coated plain glass, debugging the coating equipment, and then re-executing the step B.
Debugging coating equipment, detecting the coated plain glass by preparing the test plain glass, if the detection meets the standard, successfully debugging, then not needing to debug the coating equipment, if not, judging that the current debugging fails, removing the film from the coated tested plain glass, and removing the previous coating to avoid influencing the detection; and then, detecting again, wherein the process is continued until the detection meets the standard and the debugging is successful. The detection standard is set by a person skilled in the art according to specific conditions, the debugging is successful only when the coating equipment meets the detection standard, and if the coating equipment does not meet the detection standard, the debugging is unsuccessful, and the debugging is continued until the standard is met.
As shown in fig. 2, in an embodiment, the step B includes a step of initializing a current film-pulling number M equal to 0, and the step D includes a step of recording the film-pulling number M equal to M +1, and after the step of performing film-pulling on the coated mother glass, the step D further includes the following steps:
e: judging whether the current film drawing times M meet the condition that M is larger than or equal to a first preset threshold value, and executing the step F if the current film drawing times M meet the condition that M is larger than or equal to the first preset threshold value; if not, executing step G;
f: marking the drawn plain glass as product plain glass, replacing a new piece of plain glass as the plain glass for the current machine test, and executing the step B again;
and G, using the plain glass for the current machine test to execute the step B again.
The test plain glass can become thin along with the increase of the membrane pulling times, after the test plain glass becomes thin, fragments can appear in the process of coating or membrane pulling, and once the fragments can cause downtime, the influence on coating equipment is very large.
In one embodiment, the first predetermined threshold is equal to 2. In the scheme, except that the film is removed every time, the mother glass is also affected and thinned by the solvent, actual test and verification are carried out, after the film is pulled out for three times, namely when the film pulling times M are equal to 3, the mother glass for test is very thin, and at the moment, if the mother glass is continuously used, downtime is probably caused, so that the first preset threshold value is set to be equal to 2, and the downtime is not easy to happen as long as M is not equal to 3. Of course, as the performance of the machine platform increases, the value of the first preset threshold may also be greater than 2, such as 3, 4, or 5.
In an embodiment, step B includes a step of recording a film pulling condition, where the film pulling condition includes a successful film pulling or an unsuccessful film pulling; in the step E, the current film pulling frequency M meets the preset condition that M is not less than a first preset threshold, and when the film pulling condition is successful, the step F is executed; otherwise, step G is executed.
And simultaneously setting two conditions of film drawing conditions and film drawing times, firstly determining whether film drawing is successful, if so, determining the next step according to whether the film drawing times meet the requirements, and if not, continuing to draw the film, so that the error input of some previous plain glass subjected to film drawing for many times can be prevented, and the detection is continued.
In one embodiment, in step F, the glass marked as the product mother glass is placed until the coating equipment is successfully debugged, and then is used as the product processing mother glass.
In the scheme, in order to prevent the membrane pulling times from being excessive, the test mother glass is marked as the product mother glass and is used as the product processing mother glass, so that the condition that the test mother glass becomes thinner to cause breakdown due to the excessive membrane pulling times can be prevented, the mother glass cannot be broken during product processing, the raw material of the mother glass can be reduced, and the loss is reduced.
In the step D, an acid solvent is used during film drawing, and the acid solvent and the metal used during film plating can generate chemical reaction, so that the film drawing can be uniform and thorough, the influence of doping on detection is avoided, and other solvents which can achieve the effect can also be used during film drawing.
As shown in fig. 3, in an embodiment, the step B includes a step of initializing that the current film drawing time M is 0;
in the step D, the method also comprises the step of recording the membrane pulling times M which is M + 1;
in the step D, after the step of removing the film from the coated mother glass, the method further comprises the following steps:
e: judging whether the current film drawing times M meet the condition that M is more than or equal to 2, if so, executing a step F1; if not, executing step G;
f1: b, the test mother glass after the membrane is pulled out is executed again, and F2 is executed after the step B is executed;
f2: c, executing the step C, if the detection in the step C meets the standard, successfully debugging, and taking the test mother glass as the product mother glass; if the detection in the step C does not meet the standard, the debugging fails, the coated plain glass is directly scrapped, a new piece of plain glass is replaced to be used as the plain glass for the current machine table test, and the step B is executed again;
and G, using the plain glass for the current machine test to execute the step B again.
In the scheme, when the preset condition is met, namely the film pulling times are equal to 2 times, after film coating detection is carried out again, the mother glass for the test after three film coating is directly scrapped, and the downtime condition is prevented.
And in addition, after debugging fails, judging whether the step M is more than or equal to 2, if M is more than or equal to 2, scrapping, and if not, cleaning the subsequent steps.
In an embodiment, in the step C, after determining that the debugging of the coating device is failed, the following steps are further performed:
h: cleaning the test mother glass;
the coated test mother glass is cleaned before film removal, so that dust on the test mother glass can be washed off first, and the film removal can be more thorough.
As shown in fig. 4, in an embodiment, in the step C, after determining that the debugging of the coating apparatus is successful, the following steps are further performed:
h: cleaning the test mother glass;
i: c, drawing the film of the washed mother glass in the step H to obtain mother glass for the product;
further, the film drawing frequency M can be judged whether to meet the condition that the M is more than or equal to 2, if so, the film drawing is carried out on the cleaned mother glass in the step H, the mother glass is used as a product mother glass, and if not, the mother glass is directly discarded.
If the first debugging result of the test mother glass meets the detection standard, the test mother glass can be cleaned and pulled out of the membrane to be directly used as the product mother glass and can be continuously used next time.
As shown in fig. 5, as another embodiment of the present invention, a method for debugging a plating apparatus is disclosed, which includes:
a, preparing test mother glass;
b: coating the test element glass, and initializing the current film drawing frequency M to be 0; initializing the current film pulling condition as unsuccessful film pulling;
c: detecting the coated test plain glass, judging that the machine is successfully debugged if the coated test plain glass meets the standard, and executing the step i; if the current debugging fails, executing the step d;
d: cleaning the test mother glass;
e: drawing the membrane of the cleaned test mother glass; recording the current film pulling condition, and recording the current film pulling frequency M as M + 1;
f: judging whether the current membrane drawing times M meet the condition that M is more than or equal to 2, if so, executing the step g; if not, executing the step h;
marking the test mother glass after membrane drawing as product mother glass, replacing a new mother glass as the current test mother glass of the machine, and executing the step b again;
h, using the plain glass for the current machine test to re-execute the step b;
i: cleaning the test mother glass;
j: and (e) performing film drawing on the washed mother glass in the step i to obtain the mother glass for the product.
Firstly, preparing test mother glass, then coating the test mother glass, initializing the current film pulling times and the film pulling condition, wherein the current film pulling times is initialized to be M-0, the film pulling condition is unsuccessful film pulling (N), judging the standard of a machine table for setting detection parameters, detecting and judging the coated test mother glass, if the judgment result is in line, debugging is successful, and then the test mother glass can be cleaned, and then directly transferring the product mother glass; and if the debugging fails, cleaning and pulling the membrane by using the test plain glass, judging whether the membrane pulling times are more than or equal to 2, executing the different steps according to different results, and finishing the successful debugging.
As shown in fig. 6, as another embodiment of the present invention, a debugging platform 100 of a plating device 200 is disclosed, which includes:
the detection device 110 is used for detecting the test plain glass coated by the coating equipment 200;
the judging device 120 is used for acquiring the detection result of the detecting device 110 and judging the detection result according to a preset standard;
the film pulling device 130 is used for pulling the film of the test element glass which is judged to be not in accordance with the preset standard in the judging device; the film removing device 130 sends the test mother glass after film removal to the film coating equipment 200 for coating again.
The debugging machine is provided with a detection device 110 which is mainly used for detecting the plain glass for testing after the film coating equipment 200, a result is obtained after detection, the obtained result is judged according to the preset standard in the judgment device 120, the condition of conformity or nonconformity can occur after judgment, and then when the result is satisfied, the film removing device does not need to remove the film, if the result is not satisfied, the film is removed, the film removing device 130 sends the plain glass for testing after film removal to the film coating equipment for film coating again, and the steps are repeated, so that the test is known to be in accordance with the standard.
In an embodiment, the debugging machine further includes a management and control system 140, and the management and control system 140 includes at least one field for recording the number of times of film removal or the film removal condition. Of course, the staff can look up the report to make the conversion,
the plain glass product is transferred by the staff, the staff can look over the report form, determine which can be transferred, the management and control system 140 is for preventing the wrong condition of transfer from happening, the management and control system 140 is operated by the computer, the missing condition can not occur, a field is set, the number of times of film pulling can be recorded in the field, the film pulling condition can also be recorded, and the comparison reference can be made.
Of course, the management and control system 140 may also include two fields, one for recording the film removal condition and the other for recording the film removal times.
It should be noted that, the limitations of the steps involved in the present disclosure are not considered to limit the order of the steps without affecting the implementation of the specific embodiments, and the steps written in the foregoing may be executed first, or executed later, or even executed simultaneously, and as long as the present disclosure can be implemented, all should be considered to belong to the protection scope of the present disclosure.
The technical solution of the present invention can be widely applied to various display panels, such as a Twisted Nematic (TN) display panel, an In-Plane Switching (IPS) display panel, a Vertical Alignment (VA) display panel, and a Multi-Domain Vertical Alignment (MVA) display panel, and of course, other types of display panels, such as an Organic Light-Emitting Diode (OLED) display panel, can be applied to the above solution.
The foregoing is a more detailed description of the invention in connection with specific alternative embodiments, and the practice of the invention should not be construed as limited to those descriptions. For those skilled in the art to which the invention pertains, several simple deductions or substitutions can be made without departing from the spirit of the invention, and all shall be considered as belonging to the protection scope of the invention.

Claims (8)

1. A method for debugging coating equipment is characterized by comprising the following steps:
a: preparing test mother glass;
b: coating a film on the test mother glass;
c: detecting the coated test plain glass, and judging that the coating equipment is successfully debugged if the coated test plain glass meets the standard; if the standard is not met, judging that the debugging of the coating equipment fails, and executing the step D;
d: c, drawing the coated plain glass, debugging the coating equipment, and executing the step B again;
in the step B, the method further comprises the step of initializing the current membrane drawing times M = 0;
in the step D, the method also comprises the step of recording the membrane drawing times M = M + 1;
in the step D, after the step of removing the film from the coated mother glass, the method further comprises the following steps:
e: judging whether the current film drawing times M meet the condition that M is larger than or equal to a first preset threshold value, and executing the step F if the current film drawing times M meet the condition that M is larger than or equal to the first preset threshold value; if not, executing step G;
f: marking the drawn plain glass as product plain glass, replacing a new piece of plain glass as the plain glass for the current machine test, and executing the step B again;
and G, re-executing the step B by using the test plain glass of the current coating equipment.
2. The method for debugging a plating device according to claim 1, wherein the first predetermined threshold is equal to 2.
3. The debugging method of a coating equipment according to claim 2, wherein the step B comprises the step of recording the film pulling condition, wherein the film pulling condition comprises successful film pulling or unsuccessful film pulling;
in the step E, if the current film pulling condition is initialized to be unsuccessful, the current film pulling frequency M meets the condition that the condition M is not less than a first preset threshold value, and if the film pulling condition is successful, the step F is executed; otherwise, step G is executed.
4. The method according to claim 2, wherein in step F, the glass marked as the product mother glass is used as the product processing mother glass after the coating device is successfully debugged.
5. A method for debugging coating equipment is characterized by comprising the following steps:
a: preparing test mother glass;
b: coating a film on the test mother glass;
c: detecting the coated test plain glass, and judging that the coating equipment is successfully debugged if the coated test plain glass meets the standard; if the standard is not met, judging that the debugging of the coating equipment fails, and executing the step D;
d: c, drawing the coated plain glass, debugging the coating equipment, and executing the step B again;
in the step B, the method further comprises the step of initializing the current membrane drawing times M = 0;
in the step D, the method also comprises the step of recording the membrane drawing times M = M + 1;
in the step D, after the step of removing the film from the coated mother glass, the method further comprises the following steps:
e: judging whether the current film drawing times M meet the condition that M is more than or equal to 2, if so, executing a step F1; if not, executing step G;
f1: b, the test mother glass after the membrane is pulled out is executed again, and F2 is executed after the step B is executed;
f2: c, executing the step C, if the detection in the step C meets the standard, successfully debugging, and taking the test mother glass as the product mother glass; if the detection in the step C does not meet the standard, the debugging fails, the coated plain glass is directly scrapped, a new piece of plain glass is replaced to be used as the plain glass for the current machine table test, and the step B is executed again;
and G, using the plain glass for the current machine test to execute the step B again.
6. The method for debugging a plating device according to claim 1 or 5, wherein in the step C, after the successful debugging of the plating device is determined, the following steps are further performed:
h: cleaning the test mother glass;
i: and D, drawing the film of the washed mother glass in the step H to obtain the mother glass for the product.
7. A method for debugging coating equipment is characterized by comprising the following steps:
a, preparing test mother glass;
b: coating a film on the test mother glass, and initializing the current film drawing times M = 0; initializing the current film pulling condition as unsuccessful film pulling;
c: detecting the coated test plain glass, judging that the machine is successfully debugged if the coated test plain glass meets the standard, and executing the step i; if the current debugging fails, executing the step d;
d: cleaning the test mother glass;
e: drawing the membrane of the cleaned test mother glass; recording the current film drawing condition, and recording the current film drawing times M = M + 1;
f: judging whether the current membrane drawing times M meet the condition that M is more than or equal to 2, if so, executing the step g; if not, executing the step h;
marking the test mother glass after membrane drawing as product mother glass, replacing a new mother glass as the current test mother glass, and executing the step b again;
h, re-executing the step b by using the current test plain glass;
i: cleaning the test mother glass;
j: and (5) performing film drawing on the washed mother glass in the step h to obtain the mother glass for the product.
8. A debugging machine of a coating device, characterized in that the debugging machine adopts the debugging method of the coating device as claimed in any one of claims 1 to 7 to debug the coating device.
CN201811540663.7A 2018-12-17 2018-12-17 Debugging method and debugging machine platform of coating equipment Active CN109612758B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201811540663.7A CN109612758B (en) 2018-12-17 2018-12-17 Debugging method and debugging machine platform of coating equipment
PCT/CN2019/123578 WO2020125449A1 (en) 2018-12-17 2019-12-06 Debugging method and debugging machine for coating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811540663.7A CN109612758B (en) 2018-12-17 2018-12-17 Debugging method and debugging machine platform of coating equipment

Publications (2)

Publication Number Publication Date
CN109612758A CN109612758A (en) 2019-04-12
CN109612758B true CN109612758B (en) 2021-04-02

Family

ID=66010226

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811540663.7A Active CN109612758B (en) 2018-12-17 2018-12-17 Debugging method and debugging machine platform of coating equipment

Country Status (2)

Country Link
CN (1) CN109612758B (en)
WO (1) WO2020125449A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109612758B (en) * 2018-12-17 2021-04-02 惠科股份有限公司 Debugging method and debugging machine platform of coating equipment

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05299827A (en) * 1992-04-17 1993-11-12 Furukawa Electric Co Ltd:The Apparatus for forming solder layer on circuit board
US7274463B2 (en) * 2003-12-30 2007-09-25 Sensory Analytics Anodizing system with a coating thickness monitor and an anodized product
CN102108494A (en) * 2009-12-23 2011-06-29 财团法人工业技术研究院 Deposition method for microcrystalline silicon thin films and device for monitoring plasma assisted deposition
CN102219396A (en) * 2011-04-12 2011-10-19 成都南玻玻璃有限公司 Temperable gold low-emissivity coated glass and manufacturing method thereof
CN102838298A (en) * 2012-08-31 2012-12-26 东莞南玻工程玻璃有限公司 Large-area glass film-coating debugging sheet carrier
CN103400890A (en) * 2013-07-08 2013-11-20 浙江晶科能源有限公司 Reworking technology for striping re-plating of crystal silicon solar cell PECVD (plasma enhanced chemical vapor deposition) chromatic aberration slice
CN103616392A (en) * 2013-11-21 2014-03-05 同济大学 Data processing method of X-ray reflectivity, fluorescence intensity and fluorescence spectrum of optical thin film

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1234906C (en) * 2003-04-11 2006-01-04 精碟科技股份有限公司 Deposition equipment
EP2334743A1 (en) * 2008-09-17 2011-06-22 3M Innovative Properties Company Light diffusive pressure sensitive adhesive
CN102162801A (en) * 2010-12-28 2011-08-24 中国建筑材料检验认证中心有限公司天津分公司 Method and equipment for testing shading performance of coated glass, filmed glass or film-coating glass
CN102674697B (en) * 2011-03-18 2014-04-02 北京市太阳能研究所有限公司 Method for preparing minus reflection antireflection glass through etching
CN102353636B (en) * 2011-06-17 2013-03-06 常州天合光能有限公司 Method for testing anti-reflection rate of laminated photovoltaic assembly-used ethylene/vinyl acetate copolymer (EVA) on glass
CN103528998B (en) * 2013-09-30 2016-06-22 湖南普照科技发展有限公司 Coated photovoltaic glass light transmittance detection method
CN109612758B (en) * 2018-12-17 2021-04-02 惠科股份有限公司 Debugging method and debugging machine platform of coating equipment

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05299827A (en) * 1992-04-17 1993-11-12 Furukawa Electric Co Ltd:The Apparatus for forming solder layer on circuit board
US7274463B2 (en) * 2003-12-30 2007-09-25 Sensory Analytics Anodizing system with a coating thickness monitor and an anodized product
CN102108494A (en) * 2009-12-23 2011-06-29 财团法人工业技术研究院 Deposition method for microcrystalline silicon thin films and device for monitoring plasma assisted deposition
CN102219396A (en) * 2011-04-12 2011-10-19 成都南玻玻璃有限公司 Temperable gold low-emissivity coated glass and manufacturing method thereof
CN102838298A (en) * 2012-08-31 2012-12-26 东莞南玻工程玻璃有限公司 Large-area glass film-coating debugging sheet carrier
CN103400890A (en) * 2013-07-08 2013-11-20 浙江晶科能源有限公司 Reworking technology for striping re-plating of crystal silicon solar cell PECVD (plasma enhanced chemical vapor deposition) chromatic aberration slice
CN103616392A (en) * 2013-11-21 2014-03-05 同济大学 Data processing method of X-ray reflectivity, fluorescence intensity and fluorescence spectrum of optical thin film

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
日本EBV—6DA型镀膜机及其安装调试;李懋廉等;《光学机械》;19830630(第3期);第59-66页 *
真空阴极溅射镀膜产品的开发调试;宋兰英;《中国制笔》;19971231(第2期);第26-29页 *

Also Published As

Publication number Publication date
CN109612758A (en) 2019-04-12
WO2020125449A1 (en) 2020-06-25

Similar Documents

Publication Publication Date Title
TW202009705A (en) Method and system for automatically managing a fault event occurring in a datacenter system
CN109612758B (en) Debugging method and debugging machine platform of coating equipment
CN106776251B (en) Monitoring data processing device and method
CN108572308B (en) Fault diagnosis method and system
US20190087251A1 (en) Runtime failure detection and correction
CN107015532B (en) Display panel online quality control method and device
JP2015097047A (en) Determination device, determination program, and determination method
CN101996107A (en) Operation interruption automatic recovering system and method
CN106020984A (en) Creation method and apparatus of processes in electronic device
CN105912447A (en) Monitoring method for embedded program execution order
US11003538B2 (en) Automatically configuring boot order in recovery operations
CN109408772A (en) To the restoration methods of the abnormal data in continuity data
CN115903508B (en) Robust deadlock detection method of flexible manufacturing system based on Petri network
CN108229586B (en) The detection method and system of a kind of exceptional data point in data
CN101621818A (en) Method and device for processing fault alarm
JP2017167578A (en) Incident management system
WO2022183643A1 (en) Processing method and processing apparatus for out-of-control behavior in semiconductor manufacturing process
US20220043432A1 (en) System for detecting semiconductor process and method for detecting semiconductor process
US20150148933A1 (en) Monitor system and method for semiconductor processes
US11841627B2 (en) Display panel test method comprising the step of automatically searching for an alignment mark by obtaining position information of the display panel and display panel test device
CN111240872A (en) Self-service equipment diagnosis method based on cloud computing
CN114858208A (en) Sulfur hexafluoride gas fault early warning method and system
CN102623369A (en) Wafer test method
CN111289610A (en) Substrate crack detection method and system and storage medium
CN108957296B (en) Circuit health detection method based on entanglement relation discrimination

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant