CN109544637B - Double-target fixed verification device - Google Patents
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- CN109544637B CN109544637B CN201811212846.6A CN201811212846A CN109544637B CN 109544637 B CN109544637 B CN 109544637B CN 201811212846 A CN201811212846 A CN 201811212846A CN 109544637 B CN109544637 B CN 109544637B
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- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/80—Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
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Abstract
The invention discloses a double-target fixed verification device, which comprises: the device comprises a horizontal workbench, a linear guide rail, a test target mounting platform and a device to be tested mounting platform, wherein the linear guide rail is arranged on the horizontal workbench to be arranged along the horizontal direction, and a graduated scale is arranged on the horizontal workbench along the horizontal direction; the test target installation platform is used for bearing a test target; the test target mounting platform is slidably arranged on the linear guide rail; the device to be tested mounting platform is used for bearing the device to be tested, the device to be tested is provided with a third reflecting mirror and a fourth reflecting mirror, the positions of the third reflecting mirror and the fourth reflecting mirror are related to the positions of the first reflecting mirror and the second reflecting mirror, so that laser is enabled to fall on a central calibration line of a graduated scale corresponding to the extending direction of a group of plane mirrors after multiple reflection between the third reflecting mirror and the fourth reflecting mirror of the plane of the device to be tested and the first reflecting mirror and the second reflecting mirror of the corresponding position on the plane of the test target.
Description
Technical Field
The invention relates to the technical field of machine vision, in particular to a double-target fixed verification device.
Background
Binocular stereoscopic vision is a method for acquiring three-dimensional geometric information of an object from a plurality of images based on the parallax principle. In a machine vision system, a binocular vision system generally acquires two digital images of an object from different angles at the same time by a double camera, or acquires two digital images of the object from different angles at different times by a single camera, recovers three-dimensional geometric information of the object based on a parallax principle, and reconstructs the three-dimensional shape and position of the object.
In order to reconstruct the three-dimensional shape and position of an object, binocular vision errors are controlled, and the errors are mainly concentrated in the visual axial depth range, while calibration verification devices in the prior art mainly depend on mechanical processing precision and auxiliary sensor precision. Particularly, when the range to be measured is large, the machining precision and the problems of the mechanical material can cause the precision of the whole verification platform to be unable to be ensured. Disclosure of Invention
The present invention provides a dual-objective authentication device for overcoming at least one of the problems in the prior art.
In order to achieve the above object, the present invention provides a dual-target authentication device, comprising: horizontal workstation, linear guide, test target mounting platform and equipment to be tested mounting platform, wherein:
the linear guide rail is arranged on the horizontal workbench to be arranged along the horizontal direction, and a distance scale is arranged on the horizontal workbench along the horizontal direction;
the test target mounting platform is used for bearing a test target, the test target is a workpiece with test calibration characteristics, a first laser source capable of emitting laser vertically downwards is arranged on the side edge of a plane where the test target is located, and a first reflecting mirror and a second reflecting mirror are arranged on the plane where the test target is located;
the test target mounting platform is slidably arranged on the linear guide rail, and the distance between the plane of the test target and the plane of the equipment to be tested is set by adjusting the position of the test target platform on the linear guide rail;
the device to be tested is a machine stereoscopic vision device, a second laser source, a third reflecting mirror, a third laser source and a fourth reflecting mirror are arranged on a plane where the device to be tested is located, the positions of the third reflecting mirror, the fourth reflecting mirror and the positions of the first reflecting mirror and the second reflecting mirror are related, so that laser emitted by the second laser source and laser emitted by the third laser source are located on a central calibration line of a laser detection scale corresponding to the extending direction of a group of reflecting mirrors after multiple reflections between the third reflecting mirror, the fourth reflecting mirror and the first reflecting mirror and the second reflecting mirror at corresponding positions on the plane where the device to be tested is located.
Optionally, the machine stereoscopic vision device is a stereoscopic vision device based on infrared structured light or a laser scanning stereoscopic vision device.
Optionally, the laser detection graduated scale is provided with graduated lines longitudinally spaced by 1mm.
Optionally, the first mirror, the second mirror, the third mirror and the fourth mirror are plane mirrors; the first mirror is opposite to the third mirror, and the second mirror is opposite to the fourth mirror.
Optionally, the rotation or pitching position of the plane of the device to be tested is adjusted according to the positions of the laser and the central calibration line of the laser detection scale on the plane of the device to be tested, so that the laser point falls on the central calibration line.
Alternatively, the variation of the angle of incidence is achieved by a micrometer knob of the second laser source or of the third laser source mounting portion for different test distances.
Optionally, the second laser source and the third laser source are both laser level bars, and the device further includes: a first refractive mirror and a second refractive mirror; the first refractor is used for refracting the laser emitted by the second laser source and enabling the laser emitted by the second laser source to be reflected between the third reflector and the first reflector for a plurality of times; the second refractor is used for refracting the laser emitted by the third laser source and enabling the laser emitted by the third laser source to be reflected between the fourth reflector and the second reflector for a plurality of times.
Optionally, the first refractive mirror and the second refractive mirror are both 45 ° mirrors.
The embodiment of the specification provides a set of double-target fixed verification device, which is a remote parallelism assurance platform for measuring a working plane (or a working plane called a test target mounting platform) and a working plane to be measured (or a working plane called a device mounting platform to be measured), and is used for measuring the precision of machine stereoscopic vision, and has the following beneficial effects: in a longer distance range, the high-precision parallelism of the working surfaces of the measuring platform (or the test target mounting platform) and the platform to be tested (the device to be tested mounting platform) is provided through the correction of two paths of lasers (corresponding to the second laser source and the third laser source).
Drawings
In order to more clearly illustrate the embodiments of the invention or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of the working principle of a dual-target verification device according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of calibration plate error direction;
FIG. 3 is a schematic diagram of a correction principle of a dual-target verification device about a yaw angle according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of analysis of angular deviation about yaw provided by an embodiment of the present invention;
FIG. 5 is a schematic diagram of the correction principle of the dual-target verification device with respect to pitch angle according to the embodiment of the present invention;
FIG. 6 is a schematic diagram of a pitch angle deviation analysis provided by an embodiment of the present invention;
FIG. 7 is a schematic diagram of a dual-target verification device according to an embodiment of the present invention regarding the reflection amplification principle of a deviation angle (for example, a yaw angle);
FIG. 8 is a front view of a dual-objective verification device according to an embodiment of the present invention;
FIG. 9 is a top view of a dual-objective verification device according to an embodiment of the present invention;
fig. 10 is a schematic perspective view of a dual-target verification device according to an embodiment of the present invention;
FIG. 11 is a schematic perspective view of another dual-objective verification device according to an embodiment of the present invention;
fig. 12 is a schematic perspective view of an installation plane of a device under test according to an embodiment of the present invention.
In the drawings, symbols are described as follows:
1 horizontal workbench, 2 linear guide rail, 3 test target mounting platform, 31 first reflector, 32 second reflector, 4 equipment to be tested mounting platform, 41 second laser source 42 third mirror, 43 third laser source, 44 fourth mirror, 45 first refractive 4 mirror, 46 second refractive mirror, 47 laser detection scale, 48 laser detection scale.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without any inventive effort, are intended to be within the scope of the invention.
Referring to fig. 8 to 12, an embodiment of the present invention provides a dual-target authentication apparatus, which includes: the device comprises a horizontal workbench 1, a linear guide rail 2, a test target mounting platform 3 and a device to be tested mounting platform 4.
The horizontal table 1 is for providing support, and its upper surface is a horizontal plane. In order to facilitate the measurement of the distance between the plane of the test target (or the working plane of the test target mounting platform) and the plane of the device under test (or the working plane of the device under test mounting platform), a distance scale may be provided on the horizontal table 1, so that the distance can be directly read, and the length direction of the distance scale is preferably consistent with the extending direction of the linear guide rail 2. In other embodiments, the distance between the two planes may be measured by a distance measuring instrument, which is not limited in this embodiment.
The linear guide 2 is arranged on the horizontal table 1, which may be arranged in a horizontal direction, i.e. the extending direction of the linear guide 2 is a horizontal direction, in which case the length direction of the distance scale is also a horizontal direction.
The test target mounting platform 3 is used for bearing a test target, wherein the test target is a workpiece with a test calibration characteristic, namely, the workpiece with the test calibration characteristic is mounted on the test target mounting platform 3, and the workpiece can be a calibration plate or a workpiece to be tested. The plane bearing the test object is the installation plane of the test object or the plane where the test object is located. A first laser source is provided on the side edge of the plane, which emits laser light vertically downwards, which impinges on a distance scale on the horizontal table 1, so that the distance between the two planes can be measured accurately. The first mirror 31 and the second mirror 32 are disposed on a plane on which the test target is located. The mirror and the mirrors described below may also be referred to as mirrors. In FIG. 10, the first mirror 31 is located at the right side edge of the plane of the test object, and the second mirror 32 is located at the upper edge of the plane of the test object
The test target mounting platform 3 and/or the device to be tested mounting platform 4 are slidably arranged on the linear guide rail 2, and the distance between the two platforms is adjusted by correspondingly adjusting the positions of the test target mounting platform 3 and/or the device to be tested mounting platform 4 on the linear guide rail 2, so that the distance between the plane of the test target and the plane of the device to be tested described below is adjusted to reach a set distance (or called experimental distance). In application, the device to be tested mounting platform 4 is usually fixedly arranged at one end of the linear guide rail 2, the test target mounting platform 3 is slidingly arranged on the linear guide rail 2, and the distance between the two platforms is adjusted by adjusting the position of the test target mounting platform 3 on the linear guide rail 2.
The device to be tested mounting platform 4 is used for bearing the device to be tested 5, the device to be tested 5 is a machine stereoscopic vision device, namely, the machine stereoscopic vision device is mounted on the device to be tested mounting platform 4, and the machine stereoscopic vision device can be an infrared structured light stereoscopic vision device or a laser scanning stereoscopic vision device. The plane bearing the device to be tested is the installation plane of the device to be tested or the plane where the device to be tested is located, and is opposite to the plane bearing the test target. The plane of the device to be tested is provided with a second laser source 41, a third reflecting mirror 42, a third laser source 43 and a fourth reflecting mirror 44, the positions of the third reflecting mirror 42 and the fourth reflecting mirror 44 are related to the positions of the first reflecting mirror 31 and the second reflecting mirror 32, so that the laser emitted by the second laser source 41 and the laser emitted by the third laser source 43 fall on the central calibration line of the laser detection scale corresponding to the extending direction of a group of reflecting mirrors after being reflected for multiple times between the third reflecting mirror 42 and the fourth reflecting mirror 44 which are arranged on the plane of the device to be tested and the first reflecting mirror 31 and the second reflecting mirror 32 which are arranged at the corresponding positions on the plane of the test target. That is, the positions of the third mirror 42 and the first mirror 31 are correlated so that the laser light emitted from the second laser light source 41 falls on the laser light detection scale 47 in the direction in which the third mirror extends or the laser light detection scale in the direction in which the first mirror 31 extends after multiple reflections between the third mirror 42 and the first mirrors 31. Specifically, the third mirror 42 is located opposite to the first mirror 31, and as shown in fig. 11 to 12, the third mirror 42 is disposed at the left edge of the plane of the device under test. The positions of the fourth mirror 44 and the second mirror 32 are correlated so that the laser light emitted from the third laser light source 43 falls on the laser light detection scale 48 in the direction in which the fourth mirror extends or the laser light detection scale in the direction in which the second mirror extends after multiple reflections between the fourth mirror 44 and the second mirror 32. Specifically, the fourth mirror 44 and the second mirror 32 are positioned opposite to each other, and as shown in fig. 11 to 12, the fourth mirror 44 is disposed at the upper edge of the plane in which the device under test is located. Preferably, the third mirror 42 and the fourth mirror 44 are disposed vertically, and the first mirror 31 and the second mirror 32 are disposed vertically. The first and third mirrors 31 and 42 and the second and fourth mirrors 32 and 44 are plane mirrors for reflecting the laser light emitted from the second or third laser light source 41 or 43. In order to achieve the expected experimental effect, the width of each reflecting mirror is required to be free from interference with the experimental effect, so that when the parallelism of two planes (the plane of the device to be tested and the plane of the test target) is greatly different, the laser can still be projected on the reflecting mirror, and the width of the reflecting mirror can be as wide as possible, but the plane of the device to be tested and the plane of the test target are not interfered. The laser detection scale includes: the ruler body, the central calibration line and the scale line. The length direction of the ruler body and the extending direction of the central calibration line are consistent with the extending direction (or length direction) of the reflecting mirror, the middle parts of the calibration lines are vertically arranged on the central calibration line, namely, the two sides of the central calibration line are vertically provided with the calibration lines, and the interval between the adjacent calibration lines is 1mm. When the parallelism of the two planes is within the preset precision range, the laser emitted by the second laser source 41 or the third laser source 43 falls on the central calibration line of the laser detection graduated scale after being reflected for a plurality of times; when the two planes are deviated in parallelism, the laser light emitted from the second laser light source 41 and the laser light emitted from the third laser light source 43 fall on either one of both sides of the center calibration line after being reflected a plurality of times.
In order to facilitate reflection of laser light between two planes, the second laser source 41 and the third laser source 43 are both laser level bars, and the dual-target verification device further includes: a first refractive mirror 45 and a second refractive mirror 46. The first refractive mirror 45 is for refracting the laser light emitted from the second laser light source 41, and reflecting the laser light emitted from the second laser light source 41 between the third reflective mirror 42 and the first reflective mirror 31 a plurality of times. The second refraction mirror 46 is for refracting the laser light emitted from the third laser light source 43 and reflecting the laser light emitted from the third laser light source 43 between the fourth reflection mirror 44 and the second reflection mirror 32 a plurality of times. The first refractive mirror 45 and the second refractive mirror 46 are preferably both 45 ° mirrors. In application, the position of the 45 ° mirror is determined by the position of the laser impinging on the mirror, and the laser landing point should be on the mirror centerline. Likewise, the laser detection scale is also collinear with the center line of the corresponding mirror. The position of the laser level ruler is required to meet the condition that laser energy is emitted to a 45-degree reflecting mirror and falls on the reflecting mirror of the plane of the equipment to be tested after turning back in two planes for the first time. The third mirror 42 or the fourth mirror 44 is near the edge of the 45 deg. mirror, flush, and is connected to the 45 deg. mirror.
In application, since the test target mounting platform 3 has no rotational degree of freedom after being mounted, the test target mounting platform 4 needs to be provided with an euler angle adjuster for adjusting the position of the plane bearing the test target in the euler angle direction, so that the plane has rotational degrees of freedom in each euler angle direction, and when the parallelism of the two planes is deviated, the laser falls on the central calibration line of the laser detection scale provided with the extending directions of the third reflector 42 and the fourth reflector 44 on the plane of the test target after multiple reflections, so as to meet the adjustment of the degrees of freedom of the two planes (the plane of the test target and the plane of the test target). In application, the euler angle adjuster may be a rotary tilt ramp. The device to be tested mounting platform 4 aligns the laser point to the central calibration line position of the laser detection graduated scale as much as possible, and the corresponding axial parallel error can be ensured. The laser detection graduated scale is respectively arranged in the extending direction of the third reflecting mirror and the extending direction of the fourth reflecting mirror. The micrometer knob of the laser source installation part on the equipment installation platform 4 to be tested can be adjusted according to the requirements to realize the change of the incident angle according to different test distances.
The following describes the working principle of the dual-target verification device provided in this embodiment:
referring to fig. 1, this principle is mainly based on the amplification of the offset incidence angle by the laser reflection of the laser level and mirror (or mirror), and the comparison of the result with the final error calibration.
Referring to FIG. 2, the error of the calibration plate is represented by three directions, such as yaw (Y direction in the figure, rotating the object about the Y-axis), pith (P direction in the figure, rotating the object about the x-axis), and roll (R direction in the figure, rotating the object about the z-axis). Since the calibration plate itself has no rotational degrees of freedom after installation, a method is required to be applied to make the plane of the glasses parallel to the calibration plane by adjusting the three directions of the plane of the glasses. The error correction analysis process is mainly described in terms of yaw and pitch. It should be noted that: the calibration plate corresponds to the test target mounting platform, and the eye plane corresponds to the device to be tested mounting platform.
Correction of the yaw angle. Referring to fig. 3, the front face of the right rear panel in fig. 3 is taken as a reference plane through the laser level ruler, a tiny angle alpha is formed between the laser level ruler and the XZ plane, when laser is emitted to a reflector at a position corresponding to the calibration plate, the laser is reflected back to the corresponding reflector at the position of the eyeglass plane, and after the angle of incidence alpha beta 1 is amplified, the laser finally irradiates a certain point on the numerical error calibration reference line of the eyeglass plane after being amplified by reflection for a plurality of times. If the calibration plate deviates from the plane of the glasses in the yaw direction, the laser can fall on the left and right sides of the calibration datum line and even exceed the error calibration area. The position of the laser light spot in the error calibration area is changed by adjusting the rotary sliding table (see the rear picture) of the glasses base, so that the light spot finally falls on the vertical calibration line, and the deviation of the calibration plate and the glasses plane in the yaw direction can be corrected. The deviation analysis is schematically shown in fig. 4.
pitch angle correction. Referring to fig. 5, the correction principle is similar to that of the yaw angle, the upper surface of the right lower panel in fig. 5 is taken as a reference, a tiny angle beta is formed between the upper surface and the YZ direction, after laser is reflected for a plurality of times, an incident angle beta 1 is amplified, and finally a laser spot is located on a horizontal error calibration reference line. If the calibration plate and the plane of the glasses have deviation on the pitch angle, the laser can fall on the upper and lower sides of the datum line, and the deviation is too large and even exceeds an error calibration area. Through adjusting the beta-axis sliding table of the glasses mounting base, the deviation of the calibration plate and the glasses plane in the pitch direction can be corrected by observing the position of the laser spot falling on the reference line. A schematic of the deviation analysis is shown in fig. 6.
Algorithm precision: schematic diagram 7 can be obtained according to the principle of optical path reflection in optics. The principle of offset angle reflection amplification, as shown in fig. 7, is that the offset angle is doubled every time the laser reflects back and forth (the Yaw angle is the same as the pitch angle algorithm). The principle of verifying the deviation angle through laser reflection can amplify the tiny deviation to a macroscopic multiple, and the more the round trip times, the more obvious the amplifying effect.
In theory, the minimum length scope of people's eye vision is 2mm, and the laser facula can be adjusted to 2mm, and the precision of this scheme can reach: when the distance is measured for 2m, the precision error is 38.2um; the accuracy error was 1.186um at 50mm test distance.
Deviation accuracy algorithm: as shown in fig. 7, the deviation angle is doubled for each round trip of laser reflection (the Yaw angle is the same as the pitch angle algorithm). If the calibration plate deviates by 0.1mm at this angle, corresponding to sin (yaw/pitch) =0.1/200, yaw/pitch≡0.03 °, assuming that the mirrors are wide enough, α is set to reflect the laser light two times when the two mirrors are 2m apart, then the final laser spot should fall at the calibration reference line position at a distance from the reference line of:
L(max)＝2000*(sin(yaw)+sin(2yaw)+sin(3yaw)+sin(4yaw))≈10.467mm＝104.67*0.1mm。
the minimum test distance is 50 mm:
l (min) =50×sin (yaw) +sin (2 yaw) +.+sin ((4×2000/50) yaw))=50×cos (a/2) -cos (n×a+a/2))/(2 sin (a/2)))/(50×6.748= 337.385 mm=3373.85×0.1mm, where N is the number of laser turns.
From this, it was demonstrated that two back and forth reflections at a distance of 2m would amplify the deviation by more than 100 times, and the same mirror length would amplify 3373.85 times after reflecting several times at a distance of 50 mm.
In theory, the minimum length range of human eye visual inspection is 2mm, and the laser facula can be adjusted to 2mm, so the precision of this scheme can reach: when the distance is measured for 2m, the accuracy error is 0.1/(10.467/4) =38.2 um; at a test distance of 50mm, the accuracy error is 0.1/(337.385/4) =1.186 um.
The following describes the use process of the dual-target verification device provided by the invention:
the operator pushes the base under the test target mounting platform 3 by hand on the front surface of the double-target fixed verification device so as to move on the linear slide rail 2; the test distance is determined by a distance scale of a laser line vertically emitted downwards by a first laser source at the side edge of the plane where the test target is located on the table surface of the horizontal workbench 1, so that an operator can move the plane where the test target is located to the experimental distance to be tested;
turning on a second laser source 41 on the device to be tested mounting platform 4, enabling laser to be emitted onto a 45-degree reflecting mirror (namely a first refractive mirror 45) from the laser source, refracting the laser to a reflecting mirror on a plane where a test target is located perpendicularly to the plane where the device to be tested is located, reflecting the laser on two planes, namely, the plane where the test target is located and the plane where the device to be tested is located, finally enabling the laser to fall on the plane where the device to be tested, and adjusting the rotation position of the plane where the device to be tested is located according to the positions of the laser and a central calibration line on a laser detection scale on the plane where the device to be tested is located, so that the laser point falls on the central calibration line. And then turning on a third laser source 43 on the installation platform of the device to be tested, executing according to the steps, and adjusting the pitching position of the plane of the device to be tested according to the positions of the laser and the central calibration line on the laser detection scale on the plane of the device to be tested, so that the laser point falls on the central calibration line.
Those of ordinary skill in the art will appreciate that: the drawing is a schematic diagram of one embodiment and the modules or flows in the drawing are not necessarily required to practice the invention.
Those of ordinary skill in the art will appreciate that: the modules in the apparatus of the embodiments may be distributed in the apparatus of the embodiments according to the description of the embodiments, or may be located in one or more apparatuses different from the present embodiments with corresponding changes. The modules of the above embodiments may be combined into one module, or may be further split into a plurality of sub-modules.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (5)
1. A dual targeting verification device, comprising: horizontal workstation, linear guide, test target mounting platform and equipment to be tested mounting platform, wherein:
the linear guide rail is arranged on the horizontal workbench to be arranged along the horizontal direction, and a distance scale is arranged on the horizontal workbench along the horizontal direction;
the test target mounting platform is used for bearing a test target, the test target is a workpiece with test calibration characteristics, a first laser source capable of emitting laser vertically downwards is arranged on the side edge of a plane where the test target is located, and a first reflecting mirror and a second reflecting mirror are arranged on the plane where the test target is located;
the test target mounting platform is slidably arranged on the linear guide rail, and the distance between the plane of the test target and the plane of the equipment to be tested is set by adjusting the position of the test target platform on the linear guide rail;
the device to be tested is a machine stereoscopic vision device, a second laser source, a third reflecting mirror, a third laser source and a fourth reflecting mirror are arranged on a plane where the device to be tested is located, and the positions of the third reflecting mirror and the first reflecting mirror are opposite; the fourth reflecting mirror is opposite to the second reflecting mirror; the third reflecting mirror and the fourth reflecting mirror are vertically arranged, the first reflecting mirror and the second reflecting mirror are vertically arranged, and the reflected light falls on a central calibration line on the laser detection scale corresponding to the extending direction of one group of reflecting mirrors after multiple reflection;
the rotation or pitching position of the plane of the equipment to be tested is adjusted according to the positions of the laser and the central calibration line of the laser detection graduated scale on the plane of the equipment to be tested so that the laser point falls on the central calibration line;
for different test distances, the change of the incident angle is realized through a micrometer knob of the second laser source or the third laser source mounting part;
the second laser source and the third laser source are both laser level bars, and the device further comprises: a first refractive mirror and a second refractive mirror;
the first refractor is used for refracting the laser emitted by the second laser source and enabling the laser emitted by the second laser source to be reflected between the third reflector and the first reflector for a plurality of times; the second refractor is used for refracting the laser emitted by the third laser source and enabling the laser emitted by the third laser source to be reflected between the fourth reflector and the second reflector for a plurality of times.
2. The apparatus of claim 1, wherein the machine stereoscopic device is an infrared structured light based stereoscopic device or a laser scanning stereoscopic device.
3. The device of claim 1 wherein the laser detection scale has graduation marks spaced longitudinally by 1mm.
4. The apparatus of claim 1, wherein the first mirror, the second mirror, the third mirror, and the fourth mirror are planar mirrors;
the first mirror is opposite to the third mirror, and the second mirror is opposite to the fourth mirror.
5. The apparatus of claim 1, wherein the first refractive mirror and the second refractive mirror are each 45 ° mirrors.
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