CN107045242A - Electrochromic structure and forming method thereof - Google Patents
Electrochromic structure and forming method thereof Download PDFInfo
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- CN107045242A CN107045242A CN201610084091.0A CN201610084091A CN107045242A CN 107045242 A CN107045242 A CN 107045242A CN 201610084091 A CN201610084091 A CN 201610084091A CN 107045242 A CN107045242 A CN 107045242A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/155—Electrodes
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Abstract
A kind of electrochromic structure and forming method thereof, wherein electrochromic structure includes：Substrate；First conductive layer；Colour change function layer；Second conductive layer；First electrode, belongs to the side of colour change function layer together with the second conductive layer, and first electrode is electrically isolated with the second conductive layer and sequentially passes through the second conductive layer and colour change function layer is electrically connected with the first conductive layer；Second electrode, belongs to the side of colour change function layer together with the second conductive layer, is electrically connected with the second conductive layer.By the present invention in that first electrode and second electrode are respectively positioned on the second conductive layer surface, and first electrode and second electrode are multiple, so as to improve the uniformity coefficient of electric field between the first conductive layer and the second conductive layer by adjusting distribution of electrodes, so as to improve the change color uniformity of colour change function layer, improve the problem of electrochromic structure color change is slow, and then be conducive to expanding the area of electrochomeric glass, make the discoloration of large area electrochomeric glass faster, evenly.
Description
Technical field
The present invention relates to glass technology field, more particularly to a kind of electrochromic structure and forming method thereof.
Background technology
Electrochromism refers in the presence of extra electric field, reflectivity, transmissivity and the absorptivity of material
Can be according to the change reversible with polarity generation of the size of electric field etc. characteristic.In glass surface, electroluminescent become is set
Color structure formation electrochomeric glass, can control to realize the control to glass transmission performance by voltage.
Reported according to USGBC, the energy expenditure of building accounts for the near of overall energy resource consumption
40%：The heat that the bad window of isolation performance is lost accounts for the 10%~30% of building winter heat loss；
And summer penetrates the light that window enters interior of building, then increase the energy required for indoor refrigeration.According to
Estimation, the energy loss that the U.S. is caused due to glass of building window every year is worth about 20,000,000,000 dollars.
Electrochomeric glass can control the light transmission capacity and dazzle amount of glass, can to the light transmission capacity of glass and
Optimized through the heat of glass, keep indoor conditions comfortable, building room is maintained so as to reduce
The energy expenditure of interior temperature.Therefore, developing rapidly with material technology, electrochomeric glass has been opened
Beginning, it is big to be progressively applied to automobile anti-dazzle light reflection mirror, vehicle dormer window, window of high speed railway, aircraft windows, top grade
The fields such as the cladding glass in tall building.And gradually reducing with comprehensive use cost, electrochomeric glass energy
It is enough progressively to substitute Low-e glass, it is widely used in the intelligent building of energy-conserving and environment-protective.
With the expansion that electrochomeric glass is applied in building field, the demand of large area electrochomeric glass
Will be more and more.But in the prior art the electrochomeric glass of large area often exist change colour it is uneven,
The performance issue such as color change is slow.
The content of the invention
The problem of present invention is solved is to provide a kind of electrochromic structure and forming method thereof, to improve raising
The performance of electrochomeric glass.
To solve the above problems, the present invention provides a kind of electrochromic structure, including：
Substrate, the substrate surface is formed with the first conductive layer；Colour change function layer, leads positioned at described first
Electric layer surface；Second conductive layer, positioned at the colour change function layer surface；First electrode, it is conductive with second
Layer belongs to the side of colour change function layer together, the first electrode be electrically isolated with second conductive layer and
Sequentially pass through second conductive layer and colour change function layer is electrically connected with first conductive layer；Second electrode,
Belong to the side of the colour change function layer together with the second conductive layer, electrically connected with second conductive layer.
Optionally, first conductive layer includes the first isolated area and the first conducting region being electrically isolated from each other,
The quantity of first isolated area is one or more；The quantity of first conducting region is one or more；
The first electrode is electrically connected with first conductive layer of first conducting region.
Optionally, the electrochromic structure also includes：Through the first groove of first conductive layer,
First conductive layer is divided into multiple first isolated areas and multiple first conducting regions by the first groove.
Optionally, the first groove extends in " several " font, and the multiple first isolated area is mutually interconnected
It is logical, form comb form；The multiple first conducting region is interconnected, and forms the comb with the first isolated area
The comb form that tooth is engaged.
Optionally, the width range of the first groove is 1 micron~50 microns.
Optionally, the width range of first isolated area is 1 micron~500 microns, first conducting region
Width range be 1 centimetre~500 centimetres.
Optionally, second conductive layer includes the second isolated area and the second conducting region being electrically isolated from each other,
The quantity of second isolated area is one or more, the quantity of second conducting region one or to be multiple；
The first electrode is located at second conductive layer surface of the second isolated area；The second electrode is located at the
Second conductive layer surface of two conducting regions, the first electrode and multiple second electrodes are staggered.
Optionally, second isolated area and first isolated area are mutual in the projection of the substrate surface
Stagger.
Optionally, the second electrode and the first isolation zone position are mutually corresponded to.
Optionally, the electrochromic structure also includes：Through the second groove of second conductive layer,
Second conductive layer is divided into multiple second isolated areas and multiple second conducting regions by the second groove.
Optionally, the second groove extends in " several " font, and the multiple second isolated area is mutually interconnected
It is logical, form comb form；The multiple second conducting region is interconnected, and forms the comb with the second isolated area
The comb form that tooth figure is engaged.
Optionally, the width range of the second groove is 1 micron~50 microns.
Optionally, the width range of second isolated area is in 1 micron~500 micrometer ranges described second
The width range of conducting region is 1 centimetre~500 centimetres.
Optionally, second conductive layer includes the second isolated area and the second conducting region being electrically isolated from each other；
The first electrode is located at second conductive layer surface of the second isolated area；The second electrode is located at the
Second conductive layer surface of two conducting regions, the first electrode and multiple second electrodes are staggered.
Optionally, the colour change function layer includes one or more functions layer, and each functional layer includes electroluminescent
Photochromic layer, ion storage and the ion conducting layer between electrochromic layer and ion storage.
Optionally, the substrate is light transmissive material.
Optionally, the substrate includes substrate of glass or flexible substrates.
Optionally, the electrochromic structure also includes being located between the substrate and first conductive layer
Barrier layer.
Optionally, the material of first conductive layer and/or second conductive layer includes transparent conductive oxide
Thing.
Accordingly, the present invention also provides a kind of forming method of electrochromic structure, including：
Substrate is provided, the substrate surface is formed with the first conductive layer；Formed and be located at first conductive layer
The colour change function layer on surface；Form the second conductive layer positioned at the colour change function layer surface；Formation is located at
The first electrode of second conductive layer surface, the first electrode and second conductive layer are electrically isolated and successively
Electrically connected through second conductive layer and colour change function layer with first conductive layer；Formed and be located at second
The second electrode of conductive layer surface, the second electrode is electrically connected with second conductive layer.
Optionally, the forming method also includes：The first groove through first conductive layer is formed,
First conductive layer is divided into the first isolated area and the first conducting region by the first groove；First electricity
Pole is electrically connected with the first conductive layer of first conducting region.
Optionally, the first groove extends in " several " font, forms multiple first isolated areas and multiple
First conducting region, the multiple first isolated area is interconnected and forms comb form；The multiple first passes
Lead area to be interconnected, form the comb form being engaged with the broach of the first isolated area.
Optionally, the forming method also includes：The second groove through second conductive layer is formed,
Second conductive layer is divided into the second isolated area and the second conducting region by the second groove；First electricity
Pole is located at second conductive layer surface of the second isolated area；The second electrode is located at the second conducting region
Second conductive layer surface.
Optionally, the second groove extends in " several " font, forms multiple second conducting regions and multiple
Second isolated area, the multiple second isolated area is interconnected, and forms comb form；The multiple second
Conducting region is interconnected, and forms the comb form being engaged with the broach figure of the second isolated area.
Optionally, the first groove and/or second groove are formed by way of laser scribing.
Optionally, forming first electrode includes：Formation sequentially passes through second conductive layer and the discoloration
3rd groove of functional layer；Conductive material is filled into the 3rd groove to form the first electrode.
Optionally, the 3rd groove is formed by way of laser scribing.
Optionally, the width range of the 3rd groove is 1 micron~50 microns.
Optionally, the first electrode and/or second electrode are plated by silk-screen printing, vacuum thermal evaporation respectively
Film, vacuum magnetron sputtering coating film, the mode of vacuum ionic source plated film or inkjet printing are formed.
Optionally, the forming method also includes：Before the first conductive layer is formed, covering substrate is formed
The barrier layer on surface.
Optionally, forming the colour change function layer includes：Form one or more functions layer, the function
Layer include electrochromic layer, ion storage and between electrochromic layer and ion storage from
Sub- conducting shell.
Compared with prior art, technical scheme has advantages below：
The embodiment of the present invention is by making first electrode and second electrode be respectively positioned on the second conductive layer surface, energy
Enough cause more convenient for electrochromic structure application voltage.Moreover, the of the embodiment of the present invention
One electrode and second electrode are multiple, so as to improve the first conductive layer by adjusting distribution of electrodes
And second electric field between conductive layer uniformity coefficient, it is equal so as to the discoloration that improves the colour change function layer
Evenness, improves the problem of electrochromic structure color change is slow, and then is conducive to expanding electrochomeric glass
Area, make the discoloration of large area electrochomeric glass faster, evenly.
Further, the second isolated area and the first isolated area of the embodiment of the present invention are in the substrate surface
Projection is mutually staggered, by making first electrode and second electrode position stagger, and reduces second electrode and the
Occur leaking electricity between one conductive layer or short-circuit possibility, improve the stability of the electrochromic structure,
Extend the service life of the electrochomeric glass.
, can be with by isolated area in addition, the second electrode of the embodiment of the present invention is corresponding with the first isolated area
Prevent second electrode voltage is excessive from causing the breakdown electric leakage caused of conductive layer or short circuit problem.
Brief description of the drawings
Fig. 1 is a kind of schematic top plan view of electrochromic structure；
Fig. 2 is a kind of schematic top plan view of electrochromic structure；
Fig. 3 is a kind of schematic top plan view of electrochromic structure；
Fig. 4 is the schematic flow sheet of the embodiment of forming method one of electrochromic structure of the present invention；
Fig. 5 to Figure 15 is that each step of the embodiment of forming method one of electrochromic structure of the present invention centre is tied
The structural representation of structure.
Embodiment
From background technology, in the prior art the electrochomeric glass of large area exist change colour it is uneven,
The performance issue such as color change is slow.In conjunction with electrochromic structure in electrochomeric glass in the prior art
The reason for its performance issue of structural analysis：
A kind of driving of electrochomeric glass is disclosed in Patent No. CN104898345A Chinese patent
Arrangement (referring to figs. 1 to Fig. 3).
As shown in figure 1, the electrochromic structure includes：The He of the first conductive layer 11 for forming electric field
Second conductive layer 12, for realize the first conductive layer 11 and the second conductive layer 12 and power electric connection the
One electrode 13 and second electrode 14 and the change between the first conductive layer 11 and the second conductive layer 12
Color functional layer.
As shown in Fig. 2 first electrode 23 and the difference of second electrode 24 position in the electrochromic structure
In the both sides of the first conductive layer 21 and the second conductive layer 22, in electrochromic structure as described in Figure 3
One electrode 33 and second electrode 34 are located at the both sides of the first conductive layer 31 and the second conductive layer 32 respectively.
In above-mentioned three kinds of electrochromic structures, first electrode and second electrode may be contained within electrochromic layer
Four side edge.Due to formed the first conductive layer and the second conductive layer transparent oxide conductor electrical conductivity compared with
Difference, higher voltage drop can be formed during on-load voltage in the first conductive layer and the second conductive layer,
So as to cause the first conductive layer and the voltage of the second conductive layer central area to be less than the voltage of fringe region, from
And cause electrochromic structure uneven, the problem of color change is inconsistent that change colour occur in colourshifting process,
Thus it also limit the area of electrochomeric glass, it is difficult to meet the requirement of large area electrochomeric glass.
The specific embodiment of the present invention is described in detail below in conjunction with the accompanying drawings.
Fig. 4 is the schematic flow sheet of the embodiment of forming method one of electrochromic structure of the present invention.
Fig. 5 to Figure 15 is that each step of the embodiment of forming method one of electrochromic structure of the present invention centre is tied
The structural representation of structure.
With reference to step S100 in Fig. 4, with reference to reference to Fig. 5, there is provided substrate 100, the surface of substrate 100
It is formed with the first conductive layer 110.
The substrate 100 is used to provide physical support platform.The substrate 100 include the first face and with institute
State the second relative face of the first face.The substrate 100 can be that flexible substrates can also be rigid basement.
The substrate 100 can be light transmissive material.In certain embodiments, the substrate 100 is glass.
First conductive layer 110 is formed on the first face of the substrate 100 or the second face, and described
One conductive layer 110 is used to on-load voltage form electric field.The material of first conductive layer 110 includes saturating
Bright conductive oxide (Transparent Conductive Oxide, TCO).Specifically, described first is conductive
Layer 110 can mix oxygen for tin indium oxide (ITO), zinc-tin oxide (IZO), zinc oxide aluminum (AZO), fluorine
Change the one or more in the materials such as tin (FTO), gallium doped stannum oxide (GTO)；Can also be conductive
Transparent nitride include one kind in the material such as titanium nitride, titanium oxynitrides, tantalum nitride and tantalum nitride oxide
Or it is a variety of；It can also be the grapheme material of electrically conducting transparent；It can also be other transparent metal or alloy
Material.The thickness range of first conductive layer 110 is 10 nanometers~1000 nanometers.Optionally, one
In a little embodiments, the thickness range of first conductive layer 110 is 300 nanometers~600 nanometers.
It should be noted that in order to avoid foreign ion diffuses into first conductive layer 110, so that shadow
The electric conductivity of first conductive layer 110 is rung, therefore the electrochromic structure is also included positioned at described
Barrier layer 101 between substrate 100 and first conductive layer 110, so the forming method can be with
Including：Before the first conductive layer 110 is formed, the barrier layer 101 on covering substrate 100 surface is formed.
In certain embodiments, the substrate 100 is soda-lime glass, in order to avoid the sodium ion in soda-lime glass
Diffuse into the first conductive layer 110 and reduce the electrical conductivity of first conductive layer 110, it is described to stop
Layer 101 is one or more compositions in the materials such as silica, silicon nitride, silicon oxynitride, aluminum oxide
Sodium ion barrier layer.
In certain embodiments, the material of the substrate 100 is glass, can be directly in the electricity formed
Cause pressing glass on color changing structure to constitute electrochomeric glass, the structure of electrochomeric glass can be simplified,
Reduce the weight of electrochomeric glass.
The quantity of the electrochromic structure is not limited, in further embodiments, can be by by institute
State electrochromic structure clamping and form electrochromic structure between two blocks of glass, so as to reduce to technique machine
The requirement of platform, reduces manufacturing cost.
With reference to Fig. 6 to Fig. 8, the colour change function layer 120 positioned at the surface of the first conductive layer 110 is formed.
With reference to Fig. 6 and Fig. 7, wherein Fig. 6 is the schematic top plan view of the intermediate structure of the electrochromic structure,
Fig. 7 is the cross section structure diagram along AA lines in Fig. 6.In order to improve the first conductive layer 110 with it is follow-up
Electric isolution between formed second electrode, it is to avoid the problem of occurring leaking electricity or be short-circuit, described first leads
Electric layer 110 includes the first isolated area 110i for being electrically isolated from each other and the first conducting region 110t, described first every
Quantity from area 110i is one or more, and the quantity of the first conducting region 110t is one or more.
The width range of the first isolated area 110i is 1 micron~500 microns, the first conducting region 110t
Width range be 1 centimetre~500 centimetres.In order to improve the electrochromic structure change Color uniformity and
Color change, optionally, the width range of the first isolated area 110i is 5 microns~50 microns, institute
The width range for stating the first conducting region 110t is 5 centimetres~50 centimetres.
With reference to step S110 in Fig. 4, and combine with reference to Fig. 6 and Fig. 7, to simplify device architecture, reduction
In technology difficulty, some embodiments of the invention, the electrochromic structure also includes：Through described first
The first groove 111 of conductive layer 110, the first isolated area 110i and the first conducting region 110t it
Between isolated by first groove 111.
Specifically, it can be formed before colour change function layer 120 is formed and run through first conductive layer 110
First groove 111.The first groove 111 can be that what is so formed is more along the extension of " several " font
Connection forms connection between pectination, multiple first conducting region 110t and forms comb between individual first isolated area 110i
Shape, the pectination and the pectination of multiple first isolated area 110i formation of the multiple first conducting region 110t formation
Broach mutually compensate for.First isolated area 110i width (broach width) scope is 5 centimetres~50
Centimetre, the width range between adjacent fingers being the first conducting region 110t, the first conducting region 110t is 5 lis
Rice~50 centimetres.The width range of the first groove 111 is 1 micron~50 microns.Optionally, it is described
The width range of first groove 111 is 2 microns~10 microns to improve the first isolated area 110i and the
Insulating properties between one conducting region 110t.
The first groove 111 can be formed by way of laser scribing in first conductive layer 110.
Specifically, described first can be formed by visible light lasers line technique or infrared light laser scribe process
Groove 111.In addition, during laser scribe process pulse can also be used using firm power output
Power output.Optionally, in certain embodiments, described first is formed by pulse laser hatched manner
Groove 111, the pulses range is 5KHz~500KHz, and laser power scope is 0.1 watt~10
Watt.In some embodiments, laser power scope is 0.5 watt~5 watts.It should be noted that passing through laser
The way that the mode of line forms the first groove 111 is only an example, and the present invention is to forming described the
The specific method of one groove 111 is not limited.
It should be noted that with reference to step S111 in Fig. 4, in certain embodiments, described the is being formed
It is described to be formed before the step of forming colour change function layer 120 after the step of one groove 111
Method also includes：Dust is cleared up remaining, to obtain the artistic face of cleaning.
With reference to step S200 in Fig. 4, and combination refers to Fig. 8, is formed and is located at first conductive layer 110
The colour change function layer 120 on surface.
The colour change function layer 120 is used to change color under voltage control.The colour change function layer 120
Including one or more functions layer, the step of forming colour change function layer 120 includes：Formed one or
Multiple functional layers, the functional layer includes electrochromic layer, ion storage and positioned at electrochromic layer
Ion conducting layer between ion storage.
Wherein, the electrochromic layer is used for that redox reaction, color to occur under DC Electric Field
Change, can be changed for color after cathodic electrochromic metal oxide, i.e. ion implanting
Metal oxide, such as oxygen debt tungsten oxide (WOx, 2.7<x<3), titanium oxide (TiO2), vanadium oxide (V2O5)、
Niobium oxide (Nb2O5), molybdenum oxide (MoO3), tantalum oxide (Ta2O5) etc. one or more in material；
Can also be lithium, sodium, potassium, vanadium or titanium doped cathodic electrochromic metal oxide.Specifically, institute
The thickness range for stating electrochromic layer is 10 nanometers~1000 nanometers.Optionally, the electrochromic layer
Thickness range is 300 nanometers~600 nanometers.
The ion conducting layer is used to transmit ion, can be Li2O、Li2O2、Li3N、LiI、LiF、
SiO2、Al2O3、Nb2O3、LiTaO3、LiNbO3、La2TiO7、Li2WO4, oxygen-rich oxide tungsten (WOx,
3<x<3.5)、HWO3、ZrO2、HfO2、LaTiO3、SrTiO3、BaTiO3、LiPO3Deng in material
One or more.Specifically, the thickness range of the ion conducting layer is 10 nanometers~300 nanometers.Can
Choosing, the thickness range of the ion conducting layer is 20 nanometers~150 nanometers.
The ion storage is used to store electrically corresponding ion, keeps the ionic equilibrium of whole system,
The metal oxide that can be changed for color after anode electrochromic metal oxides, i.e. elemental release,
Such as vanadium oxide (V2O5), chromium oxide (Cr2O3), manganese oxide (Mn2O3), iron oxide (Fe2O3), oxygen
Change cobalt (Co2O3), nickel oxide (Ni2O3), yttrium oxide (IrO2), nickel-tungsten oxide, nickel oxide vanadium, oxygen
Change the one or more in the materials such as NiTi, nickel oxide niobium, nickel oxide molybdenum, nickel oxide tantalum；Can also be
Mixed-metal oxides LixNiyMzOa, wherein 0<x<10,0<y<1,0<z<10,
(0.5x+1+0.5y+z)<a<(0.5x+1+0.5y+3.5z), wherein M can be Al, Cr, Zr, W, V,
The metallic elements such as Nb, Hf, Y, Mn.Specifically, the ion storage thickness range is 10 nanometers
~1000 nanometers.Optionally, the ion storage thickness range is 100 nanometers~300 nanometers.
In addition, the step of formation of embodiment of the present invention functional layer includes：Along remote substrate 100
Direction, sequentially forms electrochromic layer, ion conducting layer and ion storage；Or along away from substrate
100 direction, sequentially forms ion storage, ion conducting layer and electrochromic layer.Specifically, can
To pass through the film deposition such as chemical vapor deposition, physical vapour deposition (PVD) and ald technique formation institute
State functional layer.
It should be noted that the colour change function layer 120 is also filled up in the first groove 111.
With reference to step S300 in Fig. 4, and combination refers to Fig. 9, is formed and is located at colour change function layer 120
Second conductive layer 130 on surface.
Second conductive layer 130 is used to on-load voltage form electric field.Second conductive layer 130
Material also includes transparent conductive oxide (Transparent Conductive Oxide, TCO).Specifically,
Second conductive layer 130 can for tin indium oxide (ITO), zinc-tin oxide (IZO), zinc oxide aluminum (AZO),
Fluorine mixes the one or more in the materials such as tin oxide (FTO), gallium doped stannum oxide (GTO)；Can also
It is that conductive transparent nitride is included in the materials such as titanium nitride, titanium oxynitrides, tantalum nitride and tantalum nitride oxide
One or more；It can also be the grapheme material of electrically conducting transparent；It can also be other transparent metals
Or alloy material.The thickness range of second conductive layer 130 is 10 nanometers~1000 nanometers.Optionally,
In certain embodiments, the thickness range of second conductive layer 130 is 300 nanometers~600 nanometers.Tool
Body, the film deposition work such as chemical vapor deposition, physical vapour deposition (PVD) and ald can be passed through
Skill forms second conductive layer 130.
Afterwards, the first electrode positioned at the second conductive layer surface, the first electrode and described second are formed
Conductive layer is electrically isolated and sequentially passes through second conductive layer and colour change function layer and first conductive layer electricity
Connection；The second electrode positioned at the second conductive layer surface is formed, the second electrode is conductive with described second
Layer electrical connection.Described in detail with reference to reference to figures 10 to Figure 15.
With reference to Figure 10, the schematic top plan view of the electrochromic structure intermediate structure is provided, Figure 11 is figure
Along the cross section structure diagram of BB lines in 10.Second conductive layer 130 includes the be electrically isolated from each other
Two isolated area 130i and the second conducting region 130t, the second isolated area 130i quantity are described to be multiple
Second conducting region 130t quantity is multiple.
To simplify device architecture, reduce in technology difficulty, some embodiments of the invention, second isolation
Isolated between area 130i and the second conducting region 130t by second groove 132.Specifically, join
Step S310 in Fig. 4 is examined, can be formed after second conductive layer 130 is formed through described the
The second groove 132 of two conductive layers 130, the second groove 132 can be to extend along " several " font,
Connection forms pectination between the multiple second isolated area 130i so formed, multiple second conducting region 130t it
Between connection form pectination, the pectination and multiple second isolated areas of the multiple second conducting region 130t formation
The broach of the pectination of 130i formation is mutually compensated for, and (broach of comb is wide for the second isolated area 130i width
Degree) scope be 5 microns~50 microns, between adjacent fingers be the second conducting region 130t, the second conducting region
130t width range is in 5 centimetres~50 cm ranges.
It should be noted that to avoid the occurrence of the circuit problems such as electric leakage, short circuit, the second isolated area 130i
Projection with the first isolated area 110i on the surface of substrate 100 is mutually staggered, that is to say, that institute
State the projection of the second isolated area 130i and the first isolated area 110i on the surface of substrate 100 not overlapping.
The width range of the second groove 132 is 1 micron~50 microns.Optionally, the second groove
132 width range is 2 microns~10 microns to improve the second isolated area 130i and the second conducting region
Insulating properties between 130t.
The second groove 132 can by way of laser scribing in second conductive layer 130 shape
Into.Specifically, can be by that ray laser line technique or infrared light laser scribe process can be formed into described
Second groove 132.In addition, be able to can also be used using firm power output during laser scribe process
Pulse power is exported.Optionally, in certain embodiments, form described by pulse laser hatched manner
Second groove 132, the pulses range is 5KHz~500KHz, and laser power scope is 0.1 watt
~10 watts.In some embodiments, laser power scope is 0.5 watt~5 watts.It should be noted that by swashing
The way that the mode of light line forms the second groove 132 is only an example, and the present invention is described to being formed
The specific method of second groove 132 is not limited.
It should be noted that with reference to step S311 in Fig. 4, the step of second groove 132 are formed
Afterwards, the forming method can also include cleaning dust remnants, improve the system of the electrochromic structure
Make yields.
Figure 12 to Figure 15 shows to form the first electrode 141 and second positioned at the surface of the second conductive layer 130
The schematic diagram of the intermediate structure of electrode 142, wherein Figure 12 and Figure 14 are schematic top plan views, and Figure 13 is figure
Along the cross section structure diagram of CC lines in 12, Figure 15 is the sectional view along DD lines in Figure 14.
With reference to step S410 in Fig. 4, and combine with reference to Figure 12 and Figure 13, be initially formed and sequentially pass through institute
State the 3rd groove 133 of the second conductive layer 130 and colour change function layer 120.
The width range of 3rd groove 133 is 1 micron~50 microns.In order to reduce technology difficulty, carry
Height manufacture yields, optionally, the width range of the 3rd groove 133 is 2 microns~10 micrometer ranges
It is interior.
3rd groove 133 can be formed by way of laser scribing.Specifically, can be by can
See that ray laser line technique or infrared light laser scribe process form the 3rd groove 133.In addition, laser
It can also can be exported during technique of ruling using firm power output using pulse power.Optionally,
In certain embodiments, the 3rd groove 133, the pulse frequency are formed by pulse laser hatched manner
Rate scope is 5KHz~500KHz, and laser power scope is 0.1 watt~10 watts.In some embodiments, swash
Reference optical power is 0.5 watt~5 watts.It should be noted that forming described by way of laser scribing
The way of three grooves 133 is only an example, specific method of the present invention to formation the 3rd groove 133
Do not limit.
It should be noted that with reference to step S411 in Fig. 4, the step of the 3rd groove 133 are formed
Afterwards, the forming method can also include cleaning dust remnants, to improve the electrochromic structure
Manufacture yields.
With reference to step S420 in Fig. 4, with reference to Figure 14 and Figure 15, after the 3rd groove 133 is formed,
Conductive material is filled into the 3rd groove 133, the first electrode 141 is formed；Led described second
The surface of electric layer 130 is formed in second electrode 142, the isolated area 130i of second electrode 142 and second
Second conductive layer 130 is electrically connected.The second electrode 142 can be with first electrode 141 same
Formed in step.
The first electrode 141 and the second electrode 142 are used for respectively to first conductive layer 110
With the on-load voltage signal of the second conductive layer 130 so that the first conductive layer 110 and the second conductive layer 130
Between form electric field, with realize to colour change function layer 120 color control.
Electric isolution between the second isolated area 130i and the second conducting region 130t realizes described
Electric isolution between one electrode 141 and second electrode 142, makes first electrode 141 and second electrode 142
The surface of second conductive layer 130 can be located at, make the first electrode 141 and the second electrode
142 can be uniformly distributed in the electrochromic structure surface, so as to improve the He of the first conductive layer 110
The uniformity coefficient of electric field between second conductive layer 130, the discoloration for improving the colour change function layer 120 is uniform
Degree, improves the problem of electrochromic structure color change is slow, and then is conducive to expanding electrochomeric glass
Area, makes the discoloration of large area electrochomeric glass faster, evenly.
Meanwhile, the electric isolution between the first isolated area 110i and the first conducting region 110t can
Improve electricity between first conductive layer 110 of the isolated area 110i of first electrode 141 and first every
From the possibility that the circuit problem such as reduction electric leakage, short circuit occurs improves the manufacture electrochromic structure
Yields, improves the performance of the electrochromic structure, extends the service life of the electrochromic structure.
In addition, the second electrode 142 and the first isolated area 110i positions are mutually corresponded to, and first
Isolated area 110i isolates with the first conducting region 110t, and electric isolution can be further improved here, and reduction punctures
Risk.
The material of the first electrode 141 and second electrode 142 can be metal.The first electrode 141
Or the second electrode 142 can be plated by silk-screen printing, vacuum thermal evaporation plated film, vacuum magnetic-control sputtering
The modes such as film, vacuum ionic source plated film, inkjet printing are formed.
In order to simplify device architecture, improve in manufacture yields, some embodiments of the invention, formed
First electrode 141 can be parallel to each other with the second groove 132, and the second electrode 142 can be with
The first groove 111 is parallel to each other.In addition, the first electrode 141 and the second electrode 142
Between can also be parallel to each other.
, can be mutual between the first electrode 141 when the quantity of the first electrode 141 is more than 1
It is parallel；, can also between the second electrode 142 when the quantity of the second electrode 142 is more than 1
It is parallel to each other.
In addition, the uniformity in order to improve electric field between first electrode 141 and second electrode 142, described
Cross arrangement between second electrode 142 and first electrode 141, i.e., when the electrochromic structure is including more
When individual first electrode 141 or multiple second electrodes 142, the first electrode 141 is uniformly distributed in adjacent
Between second electrode 142, or the second electrode 142 be uniformly distributed in adjacent first electrode 141 it
Between.
In example as shown in figure 15, the quantity of the first electrode 141 is 2, the second electrode
142 quantity is 3.One first electrode 141, and described the are set between adjacent second electrode 142
The distance of one electrode 141 to adjacent second electrode 142 is equal；One is set between adjacent first electrode 141
Individual second electrode 142, and the distance of the second electrode 142 to adjacent first electrode 141 is equal.
In other implementations, the quantity of electrode can be carried out according to the size of actual electrochromic structure
Arrange.In certain embodiments, a pair of first electrodes and second electrode can be set within the specific limits.
I.e. in the above-described embodiments, first conductive layer and the second conductive layer can be divided into corresponding multiple
Isolated area and multiple conducting regions, if in fact, area is little, they can only be set to one respectively,
There was only 1 pair of first electrode and second electrode, but first electrode and second electrode are respectively positioned on electroluminescent change
The side of chromatograph.In certain embodiments, first conductive layer can not be even isolated, and only second
Conductive layer is divided into multiple isolated areas and multiple conducting regions, can solve electrochromism under large area uniform
The problem of.
It should be noted that in some embodiments of the invention, first conductive layer 110, electroluminescent change
Chromatograph 120, the second conductive layer 130 and first electrode 141 and second electrode 142 are all located at the substrate
100 side, but this way is only an example, the present invention is not limited this.The present invention other
In embodiment, the electrochromic structure can also include being located at described the first of the both sides of substrate 100 respectively
Conductive layer 110, electrochromic layer 120, the second conductive layer 130 and first electrode 141 and second electrode
142。
Accordingly, the present invention also provides a kind of electrochromic structure, with reference to Figure 14 and Figure 15, shows this
The structural representation of the embodiment of invention electrochromic structure one, wherein Figure 14 is the electrochromic structure
Top view, Figure 15 is the sectional view along DD lines in Figure 14.
The electrochromic structure includes：Substrate 100, the surface of substrate 100 is formed with the first conductive layer
110.Colour change function layer 120, positioned at the surface of the first conductive layer 110；Second conductive layer 130, position
In the colour change function layer surface；First electrode 141, the colour change function is belonged to together with the second conductive layer 130
Layer side, the first electrode 141 is electrically isolated with second conductive layer 130 and sequentially passed through described
Second conductive layer 130 and colour change function layer 120 are electrically connected with first conductive layer 110；Positioned at second
The second electrode 142 on the surface of conductive layer 130, the second electrode 142 and the electricity of the second conductive layer 130
Connection.
To sum up, the embodiment of the present invention is by making first electrode and second electrode be respectively positioned on the second conductive layer surface,
Enable to more convenient for electrochromic structure application voltage.Moreover, the embodiment of the present invention
First electrode and second electrode are multiple, so as to improve the first conduction by adjusting distribution of electrodes
The uniformity coefficient of electric field between layer and the second conductive layer, so as to improve the discoloration of the colour change function layer
The uniformity, improves the problem of electrochromic structure color change is slow, and then is conducive to expanding electrochromism glass
The area of glass, makes the discoloration of large area electrochomeric glass faster, evenly.
Although present disclosure is as above, the present invention is not limited to this.Any those skilled in the art,
Without departing from the spirit and scope of the present invention, it can make various changes or modifications, therefore the guarantor of the present invention
Shield scope should be defined by claim limited range.
Claims (31)
1. a kind of electrochromic structure, it is characterised in that including：
Substrate, the substrate surface is formed with the first conductive layer；
Colour change function layer, positioned at first conductive layer surface；
Second conductive layer, positioned at the colour change function layer surface；
First electrode, belongs to the side of colour change function layer together with the second conductive layer, the first electrode with
Second conductive layer is electrically isolated and sequentially passes through second conductive layer and colour change function layer and described the
One conductive layer is electrically connected；
Second electrode, belongs to the side of the colour change function layer together with the second conductive layer, conductive with described second
Layer electrical connection.
2. electrochromic structure as claimed in claim 1, it is characterised in that first conductive layer includes phase
The first isolated area being mutually electrically isolated and the first conducting region, the quantity of first isolated area is one or many
It is individual；The quantity of first conducting region is one or more；
The first electrode is electrically connected with first conductive layer of first conducting region.
3. electrochromic structure as claimed in claim 2, it is characterised in that the electrochromic structure is also wrapped
Include：Through the first groove of first conductive layer, the first groove divides first conductive layer
For multiple first isolated areas and multiple first conducting regions.
4. electrochromic structure as claimed in claim 3, it is characterised in that the first groove is in " several "
Font extends, and the multiple first isolated area is interconnected, and forms comb form；
The multiple first conducting region is interconnected, and forms the comb being engaged with the broach of the first isolated area
Shape.
5. electrochromic structure as claimed in claim 3, it is characterised in that the width model of the first groove
Enclose for 1 micron~50 microns.
6. electrochromic structure as claimed in claim 2, it is characterised in that the width of first isolated area
Scope is 1 micron~500 microns, and the width range of first conducting region is 1 centimetre~500 centimetres.
7. electrochromic structure as claimed in claim 2, it is characterised in that second conductive layer includes phase
The second isolated area being mutually electrically isolated and the second conducting region, the quantity of second isolated area is one or many
It is individual, the quantity of second conducting region one or to be multiple；
The first electrode is located at second conductive layer surface of the second isolated area；
The second electrode is located at second conductive layer surface of the second conducting region, the first electrode and many
Individual second electrode is staggered.
8. electrochromic structure as claimed in claim 7, it is characterised in that second isolated area and described
First isolated area mutually staggers in the projection of the substrate surface.
9. electrochromic structure as claimed in claim 7, it is characterised in that the second electrode and described
One isolation zone position is mutually corresponded to.
10. electrochromic structure as claimed in claim 7, it is characterised in that the electrochromic structure is also wrapped
Include：Through the second groove of second conductive layer, the second groove divides second conductive layer
For multiple second isolated areas and multiple second conducting regions.
11. electrochromic structure as claimed in claim 10, it is characterised in that the second groove is in " several "
Font extends, and the multiple second isolated area is interconnected, and forms comb form；
The multiple second conducting region is interconnected, and forms what is be engaged with the broach figure of the second isolated area
Comb form.
12. electrochromic structure as claimed in claim 10, it is characterised in that the width model of the second groove
Enclose for 1 micron~50 microns.
13. electrochromic structure as claimed in claim 7, it is characterised in that the width of second isolated area
Scope is that in 1 micron~500 micrometer ranges, the width range of second conducting region is 1 centimetre~500
Centimetre.
14. electrochromic structure as claimed in claim 1, it is characterised in that second conductive layer includes phase
The second isolated area being mutually electrically isolated and the second conducting region；
The first electrode is located at second conductive layer surface of the second isolated area；
The second electrode be located at the second conducting region second conductive layer surface, the first electrode and
Multiple second electrodes are staggered.
15. electrochromic structure as claimed in claim 1, it is characterised in that the colour change function layer includes one
Individual or multiple functional layers, each functional layer includes electrochromic layer, ion storage and positioned at electroluminescent
Ion conducting layer between photochromic layer and ion storage.
16. electrochromic structure as claimed in claim 1, it is characterised in that the substrate is light transmissive material.
17. electrochromic structure as claimed in claim 1, it is characterised in that the substrate includes substrate of glass
Or flexible substrates.
18. electrochromic structure as claimed in claim 1, it is characterised in that the electrochromic structure is also wrapped
Include positioned at the barrier layer between the substrate and first conductive layer.
19. electrochromic structure as claimed in claim 1, it is characterised in that first conductive layer and/or institute
Stating the material of the second conductive layer includes transparent conductive oxide.
20. a kind of forming method of electrochromic structure, it is characterised in that including：
Substrate is provided, the substrate surface is formed with the first conductive layer；
Form the colour change function layer positioned at first conductive layer surface；
Form the second conductive layer positioned at the colour change function layer surface；
Form the first electrode positioned at the second conductive layer surface, the first electrode and second conductive layer
Be electrically isolated and sequentially pass through second conductive layer and colour change function layer electrically connected with first conductive layer；
Form the second electrode positioned at the second conductive layer surface, the second electrode and second conductive layer
Electrical connection.
21. forming method as claimed in claim 20, it is characterised in that the forming method also includes：Formed
Through the first groove of first conductive layer, first conductive layer is divided into by the first groove
One isolated area and the first conducting region；
The first electrode is electrically connected with the first conductive layer of first conducting region.
22. forming method as claimed in claim 21, it is characterised in that the first groove is in " several " font
Extension, forms multiple first isolated areas and multiple first conducting regions, and the multiple first isolated area is mutual
Connection forms comb form；The multiple first conducting region is interconnected, and is formed and the first isolated area
The comb form that broach is engaged.
23. forming method as claimed in claim 21, it is characterised in that the forming method also includes：Formed
Through the second groove of second conductive layer, second conductive layer is divided into by the second groove
Two isolated areas and the second conducting region；
The first electrode is located at second conductive layer surface of the second isolated area；
The second electrode is located at second conductive layer surface of the second conducting region.
24. forming method as claimed in claim 23, it is characterised in that the second groove is in " several " font
Extension, forms multiple second conducting regions and multiple second isolated areas, and the multiple second isolated area is mutual
Connection, forms comb form；The multiple second conducting region is interconnected, and is formed and the second isolated area
The comb form that is engaged of broach figure.
25. forming method as claimed in claim 23, it is characterised in that the first groove and/or the second ditch
Groove is formed by way of laser scribing.
26. forming method as claimed in claim 20, it is characterised in that forming first electrode includes：
Form the 3rd groove for sequentially passing through second conductive layer and colour change function layer；
Conductive material is filled into the 3rd groove to form the first electrode.
27. forming method as claimed in claim 26, it is characterised in that the 3rd groove passes through laser scribing
Mode formed.
28. forming method as claimed in claim 26, it is characterised in that the width range of the 3rd groove is
1 micron~50 microns.
29. forming method as claimed in claim 20, it is characterised in that the first electrode and/or the second electricity
Pole passes through silk-screen printing, vacuum thermal evaporation plated film, vacuum magnetron sputtering coating film, vacuum ionic source respectively
The mode of plated film or inkjet printing is formed.
30. forming method as claimed in claim 20, it is characterised in that the forming method also includes：In shape
Into before the first conductive layer, the barrier layer of covering substrate surface is formed.
31. forming method as claimed in claim 20, it is characterised in that forming the colour change function layer includes：
One or more functions layer is formed, the functional layer includes electrochromic layer, ion storage and position
Ion conducting layer between electrochromic layer and ion storage.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610084091.0A CN107045242A (en) | 2016-02-06 | 2016-02-06 | Electrochromic structure and forming method thereof |
| PCT/CN2016/081231 WO2017133104A1 (en) | 2016-02-06 | 2016-05-06 | Electrochromic structure and method of forming same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610084091.0A CN107045242A (en) | 2016-02-06 | 2016-02-06 | Electrochromic structure and forming method thereof |
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