CN105884207A - Glass coating structure, fingerprint detection device and mobile terminal - Google Patents
Glass coating structure, fingerprint detection device and mobile terminal Download PDFInfo
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- CN105884207A CN105884207A CN201511019440.2A CN201511019440A CN105884207A CN 105884207 A CN105884207 A CN 105884207A CN 201511019440 A CN201511019440 A CN 201511019440A CN 105884207 A CN105884207 A CN 105884207A
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- nitrogen
- titanium
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- 238000000576 coating method Methods 0.000 title claims abstract description 159
- 239000011248 coating agent Substances 0.000 title claims abstract description 155
- 239000011521 glass Substances 0.000 title claims abstract description 101
- 238000001514 detection method Methods 0.000 title claims abstract description 49
- NCMAYWHYXSWFGB-UHFFFAOYSA-N [Si].[N+][O-] Chemical compound [Si].[N+][O-] NCMAYWHYXSWFGB-UHFFFAOYSA-N 0.000 claims abstract description 121
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 66
- 239000000758 substrate Substances 0.000 claims abstract description 38
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 33
- 239000001301 oxygen Substances 0.000 claims abstract description 33
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 33
- LGLRLDQPSSWHKG-UHFFFAOYSA-N [N]=O.[Ti] Chemical compound [N]=O.[Ti] LGLRLDQPSSWHKG-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000007747 plating Methods 0.000 claims description 273
- HEGVYZJCELUPOJ-UHFFFAOYSA-N [N].[O].[Ti] Chemical group [N].[O].[Ti] HEGVYZJCELUPOJ-UHFFFAOYSA-N 0.000 claims description 147
- 239000000049 pigment Substances 0.000 claims description 16
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims description 12
- 241000222065 Lycoperdon Species 0.000 claims description 11
- 241000768494 Polymorphum Species 0.000 claims description 11
- 239000003921 oil Substances 0.000 claims description 9
- 230000000694 effects Effects 0.000 abstract description 45
- 150000001875 compounds Chemical class 0.000 abstract description 17
- 239000011247 coating layer Substances 0.000 abstract description 9
- 238000009413 insulation Methods 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 413
- 238000000034 method Methods 0.000 description 77
- 238000004519 manufacturing process Methods 0.000 description 21
- 239000003990 capacitor Substances 0.000 description 18
- 238000007789 sealing Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 12
- 238000007639 printing Methods 0.000 description 11
- 239000010939 rose gold Substances 0.000 description 11
- 229910001112 rose gold Inorganic materials 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 9
- 239000010936 titanium Substances 0.000 description 9
- 229910052719 titanium Inorganic materials 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 8
- 238000003825 pressing Methods 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 125000004433 nitrogen atom Chemical group N* 0.000 description 7
- 125000004430 oxygen atom Chemical group O* 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 5
- 230000004313 glare Effects 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- UBMXAAKAFOKSPA-UHFFFAOYSA-N [N].[O].[Si] Chemical compound [N].[O].[Si] UBMXAAKAFOKSPA-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 235000014692 zinc oxide Nutrition 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 208000031481 Pathologic Constriction Diseases 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 210000001215 vagina Anatomy 0.000 description 2
- 241000628997 Flos Species 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000000739 chaotic effect Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
- G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
- G06V40/12—Fingerprints or palmprints
- G06V40/13—Sensors therefor
- G06V40/1306—Sensors therefor non-optical, e.g. ultrasonic or capacitive sensing
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Multimedia (AREA)
- Theoretical Computer Science (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention provides a glass coating structure, a fingerprint detection device and a mobile terminal. The glass coating structure comprises a glass substrate, the lower surface of the glass substrate is downwards provided with titanium-nitrogen oxide coating layers and silicon-nitrogen oxide coating layers, and the titanium-nitrogen oxide coating layers and silicon-nitrogen oxide coating layers are alternately stacked. In the molecular formula of titanium-nitrogen oxide and the molecular formula of silicon-nitrogen oxide in the coating layers, the ratio of nitrogen and the proportion of oxygen are the same and range from 0.4:1 to 1.5:1. The titanium-nitrogen oxide coating layers and the silicon-nitrogen oxide coating layers are alternately arranged on the lower surface of the glass substrate, the proportion of nitrogen and the ratio of oxygen in coating compounds are the same and range from 0.4:1 to 1.5:1, and accordingly on the premise that insulation performance is guaranteed, the glass coating structure with a mirror surface effect is obtained; besides, influences of the thickness of a coating on fingerprint detection are controlled in a very small range.
Description
Patent application claims filing date October 20, Application No. in 2015
The priority of the Chinese patent application of 2015106834730, and by above-mentioned patent application to quote
During mode is incorporated herein in full.
Technical field
The present invention relates to a kind of glass coating structure, finger print detection device and mobile terminal, especially relate to
And a kind of be applied to fingerprint detection glass coating structure, comprise this glass coating structure fingerprint inspection
Survey device and the mobile terminal comprising this finger print detection device.
Background technology
At present, fingerprint identification technology has been applied on the products such as mobile terminal (such as computer).Its
In, the application of electric capacity pressing type fingerprint detection method is relatively broad, is divided into the most again active pressing inspection
Survey and passive type pressing detection.
The ultimate principle of passive type pressing detection is as it is shown in figure 1, whole detecting system includes: be positioned at
The capacitive fingerprint sensing device 10 of bottom and covering isolation on capacitive fingerprint sensing device 10
Layer (or being protective layer, be also the region that directly contacts of finger) 11, wherein, capacitance type fingerprint
Sensor 10 includes (exemplary in figure marking out 5 with multiple capacitor plates of two-dimensional array
Individual capacitor plate P1-P5), after the skin of finger 12 is fitted with sealing coat 11, finger 12
Skin and capacitor plate between formed electric capacity, due to the existence of fingerprint, on microcosmic formed as figure
Situation shown in 1, the skin of finger 12 and sealing coat 11 surface define many places ridge and valley, hands
Distance between diverse location and each capacitor plate of the skin of finger 12 is unequal, thus,
Each capacitor plate just creates different capacitances between the skin of finger 12.Such as at ridge
The capacitance that place is formed is Cv, and the capacitance formed at valley is Cr, by measuring these electric capacity
Value, it is possible to acquisition information in fingerprint, i.e. each capacitor plate, as a pixel, are collected
Information in fingerprint.
The principle of active pressing detection is as in figure 2 it is shown, increase on the basis of passive type detecting system
Having added the becket 13 being looped around around sealing coat 11, becket 13 is connected with bottom circuit, gold
The effect belonging to ring 13 is used to wake up the capacitive fingerprint sensing device 10 of bottom up and pass through becket
13 apply certain current signal to finger 12, thus increase the charge number on the skin of finger 12
Amount, and then enhance the signal detected by capacitor plate.Pass through as it is shown on figure 3, it illustrates
The fingerprint image signal that the detection of capacitive fingerprint sensing device is presented.
In above-mentioned fingerprint detection system, the upper and lower surface of sealing coat 11 have to be by insulation material
Material is formed, and not so will destroy the electric capacity between skin and the capacitor plate of finger 12, thus nothing
Method detects finger print information.Additionally, in the detecting system with becket 13, sealing coat 11
The part contacted with becket 13 also must be insulation, if sealing coat 11 conducts electricity, becket
Electric current on 13 will flow through sealing coat 11, thus causes signal chaotic, cannot detect equally
Finger print information.
Additionally, due to the detection range of the capacitor plate array of capacitive fingerprint sensing device 10 is the least,
It is close apart from capacitor plate array that this is accomplished by finger 12, i.e. requires that sealing coat 11 thickness can not be very
Greatly, fingerprint detection effect can the most also be affected.Especially for the system of passive type pressing detection,
Capacitive fingerprint sensing device 10 is more sensitive to the thickness of the sealing coat 11 that top covers, it is impossible to make
With the bigger sealing coat 11 of thickness.
Along with developing rapidly of the mobile terminal such as mobile phone, panel computer, mobile terminal trend towards thin
The most constantly investigating aesthetic while type, the region that sealing coat 11 is covered namely is carried out
The region of fingerprint recognition, it is typically in more prominent position on mobile terminals, such as, arranges
In the bonnet centre position of mobile phone, or it is arranged on the bottom etc. in mobile phone front.Therefore, fingerprint is known
Other region aesthetic measure will directly affect the overall appearance of mobile phone.But, due to above-mentioned many
Limiting, the mobile terminal of the fingerprint detection mode of employing electric capacity pressing type of the prior art, it refers to
The sealing coat 11 in stricture of vagina identification region uses the materials such as pottery or plastics mostly, the most only
The insulation package effect of simple realization protection capacitive fingerprint sensing device 10, but, at fingerprint
Glass-mirror cannot be realized on detection device.
In prior art, the coating technique of glass-mirror is the most ripe, but, due to general mirror
Face plated film, will not be higher to insulating properties and thickness requirement, typically can use the mode of direct plating metal,
Or realized the effect wanted by the plated film of multilamellar, the film plating layer so formed the thickest or
Person is on-insulated, therefore, it is impossible to meet the thickness requirement of fingerprint detection.Additionally, above-mentioned fingerprint inspection
Examining system itself uses capacitance detecting principle, and the skin of finger 12 divides with capacitor plate array
Not as the two poles of the earth of electric capacity, according to capacitance calculation formula, the size of electric capacity except with capacitance pole
Distance dependent between plate, the most relevant with the medium between capacitor plate, the introducing of film plating layer will
Increase the media quantity between capacitor plate, thus affect the size of capacitance, the thickness of film plating layer
The biggest, the impact on capacitance is the biggest, therefore, in order to fingerprint detection does not causes serious shadow
Ring, the most also cannot allow to there is the thickest film plating layer and exist.
Summary of the invention
It is an object of the invention to provide a kind of glass coating structure, finger print detection device and move eventually
End, it is possible to fingerprint detection influential effect less on the premise of so that fingerprint detection region presents mirror
Face effect.
To achieve these goals, the invention provides a kind of glass coating structure, including a glass
Substrate, lower surface at described glass substrate is down-set alternately laminated titanium-nitrogen-oxygen compound plated film
Layer and silicon nitrogen oxides film plating layer, wherein, the titanium-nitrogen-oxygen compound in each film plating layer and silicon nitrogen oxygen
In the molecular formula of compound, nitrogen is identical with the ratio of oxygen, and span is 0.4:1 to 1.5:1.
Present invention also offers a kind of finger print detection device, including: capacitive fingerprint sensing device,
The top of described capacitive fingerprint sensing device is pasted with above-mentioned glass coating structure.
Invention further provides a kind of mobile terminal including above-mentioned finger print detection device, described movement
Offering the opening for carrying out fingerprint detection on the bonnet of terminal, described finger print detection device is positioned at
Described lower opening portion, the above of the glass coating structure of described finger print detection device reveals from described opening
Go out.
Glass coating structure, finger print detection device and the mobile terminal that the present invention provides, by glass
The lower surface of glass substrate replaces titanizing nitrogen oxides film plating layer and silicon nitrogen oxides film plating layer, and makes plating
Nitrogen in stratification compound is identical with the ratio of oxygen, and carries out value in the range of 0.4:1 to 1.5:1,
Thus on the premise of ensureing insulating properties, it is achieved that there is the glass coating structure of mirror effect, and
And the impact of fingerprint detection is controlled in the least scope by the thickness of coating itself.
Accompanying drawing explanation
Fig. 1 is one of schematic diagram of fingerprint detection principle of prior art；
Fig. 2 is the two of the schematic diagram of the fingerprint detection principle of prior art；
Fig. 3 is the schematic diagram of the fingerprint detection picture signal of prior art；
One of schematic diagram of glass coating structure of Fig. 4 embodiment of the present invention；
Fig. 5 is the two of the schematic diagram of the glass coating structure of the embodiment of the present invention；
Fig. 6 is the Principle of plating schematic diagram of the embodiment of the present invention；
Fig. 7 is the reflectance curve schematic diagram that in the embodiment of the present invention two, first group of film structure is corresponding
One of；
Fig. 8 is the reflectance curve schematic diagram that in the embodiment of the present invention two, second group of film structure is corresponding
Two；
Fig. 9 is the reflectance curve schematic diagram that in the embodiment of the present invention two, the 3rd group of film structure is corresponding
Three；
Figure 10 is the reflectance curve signal that in the embodiment of the present invention three, first group of film structure is corresponding
One of figure；
Figure 11 is the reflectance curve signal that in the embodiment of the present invention three, second group of film structure is corresponding
The two of figure；
Figure 12 is the 3rd group of reflectance curve that film structure is corresponding signal in the embodiment of the present invention three
The three of figure；
Figure 13 is the reflectance curve signal that in the embodiment of the present invention four, first group of film structure is corresponding
One of figure；
Figure 14 is the reflectance curve signal that in the embodiment of the present invention four, second group of film structure is corresponding
The two of figure；
Figure 15 is the 3rd group of reflectance curve that film structure is corresponding signal in the embodiment of the present invention four
The three of figure；
Figure 16 is that the reflectance curve that in the embodiment of the present invention 12, first group of film structure is corresponding shows
One of it is intended to；
Figure 17 is that the reflectance curve that in the embodiment of the present invention 12, second group of film structure is corresponding shows
The two of intention；
Figure 18 is that in the embodiment of the present invention 12, the 3rd group of reflectance curve that film structure is corresponding shows
The three of intention；
Figure 19 is that the reflectance curve that in the embodiment of the present invention 18, first group of film structure is corresponding shows
One of it is intended to；
Figure 20 is that the reflectance curve that in the embodiment of the present invention 18, second group of film structure is corresponding shows
The two of intention；
Figure 21 is that in the embodiment of the present invention 18, the 3rd group of reflectance curve that film structure is corresponding shows
The three of intention.
Detailed description of the invention
Below in conjunction with the accompanying drawings the embodiment of the present invention is described in detail.
The principle of the embodiment of the present invention is, by alternately plating titanium-nitrogen-oxygen at the lower surface of glass substrate
Compound film plating layer and silicon nitrogen oxides film plating layer, realize mirror effect, the most also to ensure insulation
Property and by the THICKNESS CONTROL of overall coating in the thinnest scope, thus to reduce and fingerprint examined
The impact surveyed.
Specifically, as it is shown on figure 3, the present embodiment relates to a kind of glass coating structure, mainly apply
In electric capacity pressing type fingerprint detection system, serve as cover on capacitive fingerprint sensing device every
Absciss layer, the structure of this glass coating include glass substrate 1 and described glass substrate following table towards
The alternately laminated titanium-nitrogen-oxygen compound film plating layer 2 of lower setting and silicon nitrogen oxides film plating layer 3, multilamellar
The overall film plating layer structure that film plating layer is formed is also referred to as film system.
The glass coating structure of the embodiment of the present invention, including a glass substrate, at described glass substrate
Lower surface down-set have alternately laminated titanium-nitrogen-oxygen compound film plating layer and silicon nitrogen oxides plated film
Layer, wherein, in the molecular formula of the titanium-nitrogen-oxygen compound in each film plating layer and silicon nitrogen oxides, nitrogen
Identical with the ratio of oxygen, span is 0.4:1 to 1.5:1.
In said structure, by using alternately laminated titanium-nitrogen-oxygen compound film plating layer and silicon nitrogen to aoxidize
Thing film plating layer, and identical with the ratio of oxygen by controlling nitrogen, the refractive index of titanium-nitrogen-oxygen compound is controlled
At about 1.8-2.1, the refractive index of silicon nitrogen oxides is controlled at about 1.3-1.4, in combination with layer
Number and the controls of thickness, in the case of integral thickness is relatively thin, it is achieved that mirror effect, and
There is insulating properties, do not interfere with the detection of fingerprint sensor.
Specifically, owing to the size of capacitance is affected by the distance between capacitor plate, at this
In the structure of inventive embodiments, it is possible to it is (required meeting to control the thinnest by overall coating film thickness
On the premise of effect, it is possible to control within 1um), therefore, for the electric capacity of fingerprint sensor
Value detection impact is the least.
Additionally, the size of capacitance also can be affected by the medium of the filling between capacitor plate,
When filler kind is the most, also capacitance can be affected, in the reality of the present invention
Execute in the coating structure of example, use only two kinds of nitrogen oxides as coating, therefore, at finger skin
The kind of the material between skin and capacitor plate array is less, and does not has metal class coating, and
The integral thickness of coating is the thinnest, and between capacitor plate for the angle of filler, impact is also
It is reduced to the least.
The most preferably, titanium-nitrogen-oxygen compound film plating layer is positioned at ground floor, plates titanium-nitrogen-oxygen the most at first
Compound film plating layer, owing to the luminance factor of titanium-nitrogen-oxygen compound is higher, therefore, is located at ground floor
Whole film system can be made to present more gorgeous color.
Specifically, the following number of plies, thickness and titanium-nitrogen-oxygen compound and silicon nitrogen oxides can be used
Plated film ratio, realize mirror effect: described titanium-nitrogen-oxygen compound film plating layer and described silicon nitrogen oxides
The film plating layer sum of film plating layer is 4-7 layer, coating gross thickness between 100nm to 950nm,
The total thickness of the film plating layer of the gross thickness of the film plating layer of described titanium-nitrogen-oxygen compound and described silicon nitrogen oxides
The ratio of degree is between 0.4 to 1.65.It is seen from the above data that by reasonably carrying out film system
Design, it is possible to the gross thickness of film plating layer is arranged and controls within 1um, the electricity to fingerprint sensor
Capacitance detection impact is the least.
Correspondingly, the producing principle of above-mentioned glass coating structure as shown in Figure 6, the glass of the present embodiment
Glass coating structure can use NCVM (non-conducting vacuum plating) technique to realize.Specifically,
Vacuum space as shown in Figure 6 is set, and is passed through the fixing nitrogen of ratio and oxygen wherein, its
In, nitrogen is 0.4:1 to 1.5:1 with the span of the ratio of oxygen, is then alternately performed titanium nitrogen
Oxide coating layer generation process and silicon nitrogen oxides film plating layer generation process, thus at glass substrate
Lower surface be formed down alternately laminated silicon nitrogen oxides film plating layer and titanium-nitrogen-oxygen compound film plating layer.
Wherein, titanium-nitrogen-oxygen compound film plating layer generation process is particularly as follows: excite by electron gun and be arranged on
Titanium material in described confined space, makes described titanium material evaporate, with the nitrogen in described confined space
After gas and oxygen react, the lower surface at glass substrate is formed down titanium-nitrogen-oxygen compound film plating layer.
Silicon nitrogen oxides film plating layer generation process includes: excited by electron gun be arranged on described airtight
Silicon raw material in space, makes described silicon raw material evaporate, with the nitrogen in described confined space and oxygen
After reacting, the lower surface at glass substrate is formed down silicon nitrogen oxides film plating layer.
It is alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generates work
The number of times of sequence depends on the number of plies finally to obtain, and the thickness of every layer is by controlling each titanium-nitrogen-oxygen
Compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process realize.
In above-mentioned technique, the nitrogen being passed through by control and the ratio of oxygen, realize plated film
The control of the ratio of nitrogen-atoms and oxygen atom in the compound of layer, thus reach titanium-nitrogen-oxygen compound and
The adjustment of the reflectance of silicon nitrogen oxides, thus the refractive index of titanium-nitrogen-oxygen compound is controlled at 1.8-2.1
Left and right, controls the refractive index of silicon nitrogen oxides at about 1.3-1.4, in combination with the number of plies and thickness
Control, in the case of integral thickness is relatively thin, it is achieved that the mirror effect that effect is the most beautiful.
The present embodiment employing technique, owing to only used two kinds of common metals and semi-conducting material, therefore,
Its technique realizes upper relatively simple, it is simple to carry out Mass production.
Additionally, the most preferably, in coating process, first carry out titanium-nitrogen-oxygen compound film plating layer raw
Become operation so that titanium-nitrogen-oxygen compound film plating layer is positioned at ground floor, due to the reflectance of titanium-nitrogen-oxygen compound
The highest, therefore, it is located at ground floor and whole film system can be made to present more gorgeous color.
Specifically can be by the control (such as plated film time, operation number of times etc.) of process, it is achieved
The plated film ratio of the above-mentioned number of plies, thickness and titanium-nitrogen-oxygen compound and silicon nitrogen oxides, the most described titanium nitrogen
The film plating layer sum of oxide coating layer and described silicon nitrogen oxides film plating layer is 4-7 layer, and coating is total
Thickness between 100nm to 950nm, the gross thickness of the film plating layer of described titanium-nitrogen-oxygen compound and institute
State the ratio of gross thickness of the film plating layer of silicon nitrogen oxides between 0.4 to 1.65.
Separately below as a example by the minute surface coating structure of rose gold, silver color and tarnish these three color
Technical scheme of the invention below is described, wherein, the structural representation of three kinds of colors and manufacture are former
Reason schematic diagram all uses Fig. 4 to Fig. 6 to carry out exemplary explanation.
Wherein, the detailed description of the invention of the mirror effect of the corresponding rose gold of embodiment one to ten, implement
The detailed description of the invention of the mirror effect of the corresponding silver color of example ten one to ten six, embodiment ten seven to two ten
The detailed description of the invention of the mirror effect of two corresponding tarnish, embodiment 23 and 24 is this
The concrete application product embodiment of bright glass coating structure.
Embodiment one
As it is shown on figure 3, the present embodiment relates to a kind of glass coating structure, be mainly used in electric capacity by
In pressure type fingerprint detection system, serve as the sealing coat covered on capacitive fingerprint sensing device, should
The structure of glass coating includes glass basic 1 and down-set at the lower surface of described glass substrate
Alternately laminated titanium-nitrogen-oxygen compound film plating layer 2 and silicon nitrogen oxides film plating layer 3, multicoating layer institute
The overall film plating layer structure formed is also referred to as film system.
Wherein, titanium-nitrogen-oxygen compound is with the molecular formula of silicon nitrogen oxides, and the ratio of nitrogen and oxygen is substantially
Between 1.3:1 to 1.5:1, in actual applications, as the scheme more selected, by nitrogen and the ratio of oxygen
Example is positioned at 1.4:1, i.e. titanium-nitrogen-oxygen compound and silicon nitrogen oxides molecular formula can be expressed as TINxOy
And SINxOy, wherein x=1.4y.
In said structure, have employed titanium-nitrogen-oxygen compound film plating layer and described silicon nitrogen oxides film plating layer
Alternately laminated coating structure, realizes the mirror effect of glass substrate, before ensureing insulating properties
Put, it is possible to realize brightly painted mirror effect with the coating that integral thickness is relatively thin.
Specifically, by the ratio by nitrogen-atoms in titanium-nitrogen-oxygen compound and silicon nitrogen oxides Yu oxygen atom
Control between 1.3:1 to 1.5:1, the reflectance of titanium-nitrogen-oxygen compound and silicon nitrogen oxides is carried out
Adjust, the refractive index of titanium-nitrogen-oxygen compound is controlled about 1.84, by the refractive index of silicon nitrogen oxides
Control about 1.31, in combination with the number of plies and the control of thickness, in the situation that integral thickness is relatively thin
Under, it is achieved that the mirror effect of the rose gold that effect is the most beautiful.Rose gold color mentioned here
Corresponding optical wavelength substantially in the range of 565-570nm, L=80, A value of this color
=8.65-11.1, B value=0.9-3.4.
The most preferably, titanium-nitrogen-oxygen compound film plating layer is positioned at ground floor, plates titanium-nitrogen-oxygen the most at first
Compound film plating layer, owing to the luminance factor of titanium-nitrogen-oxygen compound is higher, therefore, is located at ground floor
Whole film system can be made to present more gorgeous color.
In the present embodiment, described titanium-nitrogen-oxygen compound film plating layer 2 and described silicon nitrogen oxides film plating layer
The film plating layer sum of 3 can be 5-7 layer, and coating gross thickness can control at 280nm to 1000nm
Between.It addition, in an embodiment of the present invention, the thickness of glass substrate can be at 170-180um
In the range of, preferably 175um.
Embodiment two
The present embodiment, on the basis of embodiment one, gives a kind of concrete coating structure: described
Film plating layer sum is 5 layers, and the gross thickness of the film plating layer of described titanium-nitrogen-oxygen compound aoxidizes with described silicon nitrogen
The ratio of the gross thickness of the film plating layer of thing is between 1.55 to 1.65, it is ensured that this ratio just can be
Only realize the mirror effect of rose gold in the case of 5 layers of film plating layer of plating, and can be by gross thickness control
Make at below 500nm, thus reduce the impact on capacitance detecting.
Wherein, the structure of every layer can use following thickness to distribute:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 45-70nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 55-90nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 45-70nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 55-90nm；
Described layer 5 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 95-150nm；
Wherein, ground floor is identical with the thickness of third layer, and the thickness of the second layer and the 4th layer is identical,
And the thickness of the second layer and the 4th layer is more than the thickness of ground floor with third layer.
Specifically, three groups of concrete film structure examples in following table are given:
In upper table, the reflectance curve of three groups of film structures is as shown in Figure 7 to 9, and wherein transverse axis is sat
Being designated as wavelength (nm), the longitudinal axis is refractive index (%), the curve chart transverse and longitudinal coordinate of following example
Identical.
Embodiment three
The present embodiment, on the basis of embodiment one, gives another kind of concrete coating structure: institute
Stating film plating layer sum is 6 layers, the gross thickness of the film plating layer of described titanium-nitrogen-oxygen compound and described silicon nitrogen oxygen
The ratio of the gross thickness of the film plating layer of compound is between 0.8 to 0.9, it is ensured that this ratio just can be
Only realize the mirror effect of rose gold in the case of 6 layers of film plating layer of plating, and can be by gross thickness control
Make at below 600nm, thus reduce the impact on capacitance detecting.
Wherein, the structure of every layer can use following thickness to distribute:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 75-95nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 75-95nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 75-95nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 75-95nm；
Described layer 5 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 75-95nm；
Described layer 6 film plating layer is silicon nitrogen oxides coating, and thickness range is 110-135nm；
Wherein, the thickness of ground floor, third layer and layer 5 is identical, the second layer and the 4th layer
Thickness is identical, and the thickness of the second layer and the 4th layer is more than, third layer and the thickness of layer 5.
Specifically, three groups of concrete film structure examples in following table are given:
In upper table, the reflectance curve of three groups of film structures is as shown in Figure 10 to Figure 12.
Embodiment four
The present embodiment, on the basis of embodiment one, gives another concrete coating structure: institute
Stating film plating layer sum is 7 layers, the gross thickness of the film plating layer of described titanium-nitrogen-oxygen compound and described silicon nitrogen oxygen
The ratio of the gross thickness of the film plating layer of compound is between 1.4 to 1.5, it is ensured that this ratio just can be
Only realize the mirror effect of rose gold in the case of 7 layers of film plating layer of plating, and can be by gross thickness control
Make at below 950nm, thus reduce the impact on capacitance detecting.
Wherein, the structure of every layer can use following thickness to distribute:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 65-130nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 65-130nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 65-130nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 65-130nm；
Described layer 5 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 65-130nm；
Described layer 6 film plating layer is silicon nitrogen oxides coating, and thickness range is 65-130nm；
Described layer 7 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 80-170nm；
Wherein, the thickness of ground floor to layer 6 is identical, and the thickness of layer 7 is more than ground floor to the
The thickness of six layers.
Specifically, three groups of concrete film structure examples in following table are given:
| Layer numbering | First group | Second group | 3rd group |
| Ground floor (TINxOy) | 99nm | 66nm | 129nm |
| The second layer (SINxOy) | 99nm | 66nm | 129nm |
| Third layer (TINxOy) | 99nm | 66nm | 129nm |
| 4th layer of (SINxOy) | 99nm | 66nm | 129nm |
| Layer 5 (TINxOy) | 99nm | 66nm | 129nm |
| Layer 6 (SINxOy) | 99nm | 66nm | 129nm |
| Layer 7 (TINxOy) | 128nm | 84nm | 165nm |
| Gross thickness | 722nm | 480nm | 939nm |
| TINxOyWith SINxOyThickness ratio | 1.43 | 1.42 | 1.42 |
In upper table, the reflectance curve of three groups of film structures is as shown in Figure 13 to Figure 16.
Embodiment five
As it is shown in figure 5, the present embodiment is on the basis of the various embodiments described above, under whole coating
Side is provided with one layer of ink layer, by arranging ink layer, it is possible to preferably carries out shading, prevents miscellaneous
The interference of light, for the color that invention is to be realized, preferably printing gray oil layer of ink, gray oil layer of ink
Background color can be adjusted, thus present more preferable rose gold effect.
Further, it is also possible to printing gray oil layer of ink when, print certain pierced pattern,
Such as, the pierced pattern of printing fingerprint figure, openwork part and the part of non-hollow out, in light transmission
There are differences with in reflexive, thus from upper strata glass observe will at mirrored background under present
Corresponding pattern such that it is able to realize finger-print region and be identified or decorate.Preferably, permissible
The pigment being different from Lycoperdon polymorphum Vitt is set in pierced pattern again, is formed instead with Lycoperdon polymorphum Vitt it is highly preferred that fill
The pigment of difference, thus allow pattern become apparent from.
Embodiment six
The present embodiment mainly illustrates to manufacture the glass coating structure manufacture method of above-described embodiment one, as
Shown in 6, the glass coating structure of the present embodiment can use NCVM (non-conducting vacuum plating)
Technique realizes.
Specifically, vacuum space as shown in Figure 6 is set, and the ratio that is passed through wherein is at 1.3:1
Nitrogen and oxygen (preferably, the ratio of being passed through is nitrogen and the oxygen of 1.4:1) between 1.5:1,
Then it is alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generates work
Sequence, thus the lower surface of glass substrate be formed down alternately laminated silicon nitrogen oxides film plating layer and
Titanium-nitrogen-oxygen compound film plating layer.
Wherein, titanium-nitrogen-oxygen compound film plating layer generation process is particularly as follows: excite by electron gun and be arranged on
Titanium material in described confined space, makes described titanium material evaporate, with the nitrogen in described confined space
After gas and oxygen react, the lower surface at glass substrate is formed down titanium-nitrogen-oxygen compound film plating layer.
Silicon nitrogen oxides film plating layer generation process includes: excited by electron gun be arranged on described airtight
Silicon raw material in space, makes described silicon raw material evaporate, with the nitrogen in described confined space and oxygen
After reacting, the lower surface at glass substrate is formed down silicon nitrogen oxides film plating layer.
It is alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generates work
The number of times of sequence depends on the number of plies finally to obtain, and the thickness of every layer is by controlling each titanium-nitrogen-oxygen
Compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process realize.
In above-mentioned technique, the nitrogen being passed through by control and the ratio of oxygen, realize plated film
The control of the ratio of nitrogen-atoms and oxygen atom in the compound of layer, thus reach titanium-nitrogen-oxygen compound and
The adjustment of the reflectance of silicon nitrogen oxides, thus the refractive index of titanium-nitrogen-oxygen compound is controlled 1.84
Left and right, controls the refractive index of silicon nitrogen oxides about 1.31, in combination with the number of plies and thickness
Control, in the case of integral thickness is relatively thin, it is achieved that the minute surface of the rose gold that effect is the most beautiful
Effect.The present embodiment uses technique, owing to only used two kinds of common metals and semi-conducting material,
Therefore, its technique realizes upper relatively simple, it is simple to carry out Mass production.
Additionally, the most preferably, in coating process, first carry out titanium-nitrogen-oxygen compound film plating layer raw
Become operation so that titanium-nitrogen-oxygen compound film plating layer is positioned at ground floor, due to the reflectance of titanium-nitrogen-oxygen compound
The highest, therefore, it is located at ground floor and whole film system can be made to present more gorgeous color.
Additionally, in the present embodiment, film plating layer sum can control at 5-7 layer, coating gross thickness
Can control between 280nm to 1000nm, it addition, in an embodiment of the present invention, glass
The thickness of substrate can be in the range of 170-180um, preferably 175um.
Embodiment seven
The present embodiment relates to the manufacture method manufacturing the coating structure of above-described embodiment two, including: hand over
(permissible for execution titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process
It is alternately performed five times can realize), making described film plating layer sum is 5 layers, and described titanium-nitrogen-oxygen
The gross thickness of the film plating layer of compound exists with the ratio of the gross thickness of the film plating layer of described silicon nitrogen oxides
Between 1.55 to 1.65.
Specifically, by being alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and the plating of silicon nitrogen oxides
Film layer operation, generates the coating structure of following thickness:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 45-70nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 55-90nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 45-70nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 55-90nm；
Described layer 5 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 95-150nm；
Wherein, ground floor is identical with the thickness of third layer, and the thickness of the second layer and the 4th layer is identical,
And the thickness of the second layer and the 4th layer is more than the thickness of ground floor with third layer.
Wherein, the thickness of every layer can realize by controlling the plated film time, the concrete thickness of every layer
Example in embodiment two it is stated that do not repeating at this.
Embodiment eight
The present embodiment relates to the manufacture method manufacturing the coating structure of above-described embodiment three, is alternately performed
Titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process (can alternately be held
Row can realize for six times), making described film plating layer sum is 6 layers, the plated film of described titanium-nitrogen-oxygen compound
The ratio of the gross thickness of the gross thickness of layer and the film plating layer of described silicon nitrogen oxides is between 0.8 to 0.9.
Specifically, by being alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and the plating of silicon nitrogen oxides
Film layer operation, generates the coating structure of following thickness:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 75-95nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 75-95nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 75-95nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 75-95nm；
Described layer 5 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 75-95nm；
Described layer 6 film plating layer is silicon nitrogen oxides coating, and thickness range is 110-135nm；
Wherein, the thickness of ground floor, third layer and layer 5 is identical, the second layer and the 4th layer
Thickness identical, and the thickness of the second layer and the 4th layer is more than, third layer and the thickness of layer 5
Degree.
Wherein, the thickness of every layer can realize by controlling the plated film time, the concrete thickness of every layer
Example in embodiment three it is stated that do not repeating at this.
Embodiment nine
The present embodiment relates to the manufacture method manufacturing the coating structure of above-described embodiment four, is alternately performed
Titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process (can alternately be held
Row can realize for seven times), described film plating layer sum is 7 layers, the film plating layer of described titanium-nitrogen-oxygen compound
Gross thickness and the ratio of gross thickness of film plating layer of described silicon nitrogen oxides between 1.4 to 1.5.
Specifically, by being alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and the plating of silicon nitrogen oxides
Film layer operation, generates the coating structure of following thickness coating:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 65-130nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 65-130nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 65-130nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 65-130nm；
Described layer 5 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 65-130nm；
Described layer 6 film plating layer is silicon nitrogen oxides coating, and thickness range is 65-130nm；
Described layer 7 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 80-170nm；
Wherein, the thickness of ground floor to layer 6 is identical, and the thickness of layer 7 is more than ground floor to the
The thickness of six layers.
Wherein, the thickness of every layer can realize by controlling the plated film time, the concrete thickness of every layer
Example in embodiment four it is stated that do not repeating at this.
Embodiment ten
The present embodiment mainly illustrates to make the structure that above-described embodiment five relates to.Lead in the present embodiment
Cross ink printing equipment, be alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides
After film plating layer generation process, at one layer of ink layer printed below of coating such that it is able to preferably enter
Row shading, prevents the interference of veiling glare, for the color that invention is to be realized, preferably prints gray ink
Layer, it is possible to background color is adjusted, thus presents more preferable rose gold effect.
Further, may include that printing has in coating one layer of gray oil layer of ink printed below
The gray oil layer of ink of fingerprint graph pierced pattern, is different from Lycoperdon polymorphum Vitt having being partially filled with of hollow out
Pigment；Only can also print pierced pattern and be not filled with pigment.Wherein, fill preferably with Lycoperdon polymorphum Vitt shape
Become the pigment of contrast, thus allow pattern become apparent from.
Embodiment 11
As shown in Figure 4, the present embodiment relates to a kind of glass coating structure, be mainly used in electric capacity by
In pressure type fingerprint detection system, serve as the sealing coat covered on capacitive fingerprint sensing device, should
The structure of glass coating includes glass basic 1 and down-set at the lower surface of described glass substrate
Alternately laminated titanium-nitrogen-oxygen compound film plating layer 2 and silicon nitrogen oxides film plating layer 3, multicoating layer institute
The overall film plating layer structure formed is also referred to as film system.
Wherein, titanium-nitrogen-oxygen compound is with the molecular formula of silicon nitrogen oxides, and nitrogen substantially exists with the ratio of oxygen
Between 0.8:1 to 1:1, in actual applications, the most preferably, the ratio of nitrogen with oxygen is positioned at
0.9:1, i.e. titanium-nitrogen-oxygen compound and silicon nitrogen oxides molecular formula can be expressed as TINxOyAnd SINxOy,
Wherein x=0.9y.
In said structure, have employed titanium-nitrogen-oxygen compound film plating layer and described silicon nitrogen oxides film plating layer
Alternately laminated coating structure, realizes the mirror effect of glass substrate, before ensureing insulating properties
Put, it is possible to realize brightly painted mirror effect with the coating that integral thickness is relatively thin.
Specifically, by the ratio by nitrogen-atoms in titanium-nitrogen-oxygen compound and silicon nitrogen oxides Yu oxygen atom
Control between 0.8:1 to 1:1, the reflectance of titanium-nitrogen-oxygen compound and silicon nitrogen oxides is carried out
Adjust, the refractive index of titanium-nitrogen-oxygen compound is controlled about 1.92, by the refractive index of silicon nitrogen oxides
Control about 1.35, in combination with the number of plies and the control of thickness, in the situation that integral thickness is relatively thin
Under, it is achieved that the mirror effect of the silver color that effect is the most beautiful.The L=75 of silver color mentioned here,
A value=-1.5-0.8, B value=-2.5-5.6.
The most preferably, titanium-nitrogen-oxygen compound film plating layer is positioned at ground floor, plates titanium-nitrogen-oxygen the most at first
Compound film plating layer, owing to the luminance factor of titanium-nitrogen-oxygen compound is higher, therefore, is located at ground floor
Whole film system can be made to present more gorgeous color.
In the present embodiment, described titanium-nitrogen-oxygen compound film plating layer 2 and described silicon nitrogen oxides film plating layer
The film plating layer sum of 3 is 6 layers, and coating gross thickness can control between 300nm to 550nm.
It addition, in an embodiment of the present invention, the thickness of glass substrate can be in the scope of 170-180um
In, preferably 175um.
Embodiment 12
The present embodiment, on the basis of embodiment stone 11, gives a kind of concrete coating structure:
Described film plating layer sum is 6 layers, the gross thickness of the film plating layer of described titanium-nitrogen-oxygen compound and described silicon nitrogen
The ratio of the gross thickness of the film plating layer of oxide is between 0.4 to 0.5, it is ensured that this ratio just can
The mirror effect of silver color is realized in the case of only plating 6 layers of film plating layer, and can be by gross thickness control
Make at below 550nm, thus reduce the impact on capacitance detecting.
Wherein, the structure of every layer can use following thickness to distribute:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 50-80nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 70-120nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 20-40nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 60-105nm；
Described layer 5 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 30-45nm；
Described layer 6 film plating layer is silicon nitrogen oxides coating, and thickness range is 85-145nm；
Wherein, the thickness of the layer 6 thickness more than first five layer any one layer.
Specifically, three groups of concrete film structure examples in following table are given:
In upper table, the reflectance curve of three groups of film structures is as shown in Figure 16 to Figure 18, wherein transverse axis
Coordinate is wavelength (nm), and the longitudinal axis is refractive index (%), and the curve chart transverse and longitudinal of following example is sat
Mark identical.
Embodiment 13
As it is shown in figure 5, the present embodiment is on the basis of the various embodiments described above 11 and embodiment 12,
One layer of black ink layer it has been provided with, by arranging ink layer, it is possible to more in the lower section of whole coating
Carry out well shading, prevent the interference of veiling glare.
Further, it is also possible to process black ink layer when, print certain pierced pattern,
Such as, the pierced pattern of printing fingerprint figure, openwork part and the part of non-hollow out, in light transmission
There are differences with in reflexive, thus from upper strata glass observe will at mirrored background under present
Corresponding pattern such that it is able to realize finger-print region and be identified or decorate.Preferably, permissible
The pigment being different from black is set in pierced pattern again, is formed instead with Lycoperdon polymorphum Vitt it is highly preferred that fill
The pigment of difference, such as, fills Chinese white, thus allows pattern become apparent from.
Embodiment 14
The present embodiment mainly illustrates to manufacture the glass coating structure manufacture method of above-described embodiment 11,
As indicated with 6, the glass coating structure of the present embodiment can use NCVM (non-conducting vacuum plating)
Technique realizes.
Specifically, vacuum space as shown in Figure 6 is set, and the ratio that is passed through wherein is at 0.8:1
Nitrogen and oxygen between 1:1, be then alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon
Nitrogen oxides film plating layer generation process, thus it is formed down alternately laminated at the lower surface of glass substrate
Silicon nitrogen oxides film plating layer and titanium-nitrogen-oxygen compound film plating layer.
Wherein, titanium-nitrogen-oxygen compound film plating layer generation process is particularly as follows: excite by electron gun and be arranged on
Titanium material in described confined space, makes described titanium material evaporate, with the nitrogen in described confined space
After gas and oxygen react, the lower surface at glass substrate is formed down titanium-nitrogen-oxygen compound film plating layer.
Silicon nitrogen oxides film plating layer generation process includes: excited by electron gun be arranged on described airtight
Silicon raw material in space, makes described silicon raw material evaporate, with the nitrogen in described confined space and oxygen
After reacting, the lower surface at glass substrate is formed down silicon nitrogen oxides film plating layer.
It is alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generates work
The number of times of sequence depends on the number of plies finally to obtain, and the thickness of every layer is by controlling each titanium-nitrogen-oxygen
Compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process realize.
In above-mentioned technique, the nitrogen being passed through by control and the ratio of oxygen, realize plated film
The control of the ratio of nitrogen-atoms and oxygen atom in the compound of layer, thus reach titanium-nitrogen-oxygen compound and
The adjustment of the reflectance of silicon nitrogen oxides, thus the refractive index of titanium-nitrogen-oxygen compound is controlled 1.92
Left and right, controls the refractive index of silicon nitrogen oxides about 1.35, in combination with the number of plies and thickness
Control, in the case of integral thickness is relatively thin, it is achieved that the minute surface effect of the silver color that effect is the most beautiful
Really.The present embodiment uses technique, owing to only used two kinds of common metals and semi-conducting material,
Therefore, its technique realizes upper relatively simple, it is simple to carry out Mass production.
Additionally, the most preferably, in coating process, first carry out titanium-nitrogen-oxygen compound film plating layer raw
Become operation so that titanium-nitrogen-oxygen compound film plating layer is positioned at ground floor, due to the reflectance of titanium-nitrogen-oxygen compound
The highest, therefore, it is located at ground floor and whole film system can be made to present more gorgeous color.
Additionally, in the present embodiment, film plating layer sum can control at 6 layers, and coating gross thickness can
To control between 300nm to 550nm, it addition, in an embodiment of the present invention, glass base
The thickness of plate can be in the range of 170-180um, preferably 175um.
Embodiment 15
The present embodiment relates to the manufacture method manufacturing the coating structure of above-described embodiment 12, including:
It is alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process (can
Can realize being alternately performed six times), making described film plating layer sum is 6 layers, and described titanium nitrogen
The gross thickness of the film plating layer of oxide exists with the ratio of the gross thickness of the film plating layer of described silicon nitrogen oxides
Between 0.4 to 0.5.
Specifically, by being alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and the plating of silicon nitrogen oxides
Film layer operation, generates the coating structure of following thickness:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 50-80nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 70-120nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 20-40nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 60-105nm；
Described layer 5 film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 30-45nm；
Described layer 6 film plating layer is silicon nitrogen oxides coating, and thickness range is 85-145nm；
Wherein, the thickness of the layer 6 thickness more than first five layer any one layer.
Wherein, the thickness of every layer can realize by controlling the plated film time, the concrete thickness of every layer
Example in embodiment 12 it is stated that do not repeating at this.
Embodiment 16
The present embodiment mainly illustrates to make the structure that above-described embodiment 13 relates to.In the present embodiment
By ink printing equipment, it is being alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and the oxidation of silicon nitrogen
After thing film plating layer generation process, in one layer of black ink layer printed below of coating such that it is able to more
Carry out well shading, prevent the interference of veiling glare.
Further, may include that printing has finger in coating one layer of black ink layer printed below
The black ink layer of stricture of vagina figure pierced pattern, is different from the face of Lycoperdon polymorphum Vitt having being partially filled with of hollow out
Material；Only can also print pierced pattern and be not filled with pigment.Wherein, fill and preferably formed with black
The pigment of contrast, such as, fills Chinese white, thus allows pattern become apparent from.
Embodiment 17
As shown in Figure 4, the present embodiment relates to a kind of glass coating structure, be mainly used in electric capacity by
In pressure type fingerprint detection system, serve as the sealing coat covered on capacitive fingerprint sensing device, should
The structure of glass coating includes glass basic 1 and down-set at the lower surface of described glass substrate
Alternately laminated titanium-nitrogen-oxygen compound film plating layer 2 and silicon nitrogen oxides film plating layer 3, multicoating layer institute
The overall film plating layer structure formed is also referred to as film system.
Wherein, titanium-nitrogen-oxygen compound is with the molecular formula of silicon nitrogen oxides, and nitrogen substantially exists with the ratio of oxygen
Between 0.4:1 to 0.6:1, in actual applications, the most preferably, by the ratio location of nitrogen with oxygen
At 0.5:1, i.e. titanium-nitrogen-oxygen compound and silicon nitrogen oxides molecular formula can be expressed as TINxOyWith
SINxOy, wherein x=0.5y.
In said structure, have employed titanium-nitrogen-oxygen compound film plating layer and described silicon nitrogen oxides film plating layer
Alternately laminated coating structure, realizes the mirror effect of glass substrate, before ensureing insulating properties
Put, it is possible to realize brightly painted mirror effect with the coating that integral thickness is relatively thin.
Specifically, by the ratio by nitrogen-atoms in titanium-nitrogen-oxygen compound and silicon nitrogen oxides Yu oxygen atom
Control between 0.4:1 to 0.6:1, the reflectance of titanium-nitrogen-oxygen compound and silicon nitrogen oxides is carried out
Adjust, the refractive index of titanium-nitrogen-oxygen compound is controlled about 2.08, by the refractive index of silicon nitrogen oxides
Control about 1.39, in combination with the number of plies and the control of thickness, in the situation that integral thickness is relatively thin
Under, it is achieved that the mirror effect of the tarnish that effect is the most beautiful.The L=54 of tarnish mentioned here,
A value=-3.5-2.9, B value=-7.6-6.1.
The most preferably, titanium-nitrogen-oxygen compound film plating layer is positioned at ground floor, plates titanium-nitrogen-oxygen the most at first
Compound film plating layer, owing to the luminance factor of titanium-nitrogen-oxygen compound is higher, therefore, is located at ground floor
Whole film system can be made to present more gorgeous color.
In the present embodiment, described titanium-nitrogen-oxygen compound film plating layer 2 and described silicon nitrogen oxides film plating layer
The film plating layer sum of 3 is 4 layers, and coating gross thickness can control between 100nm to 150nm.
It addition, in an embodiment of the present invention, the thickness of glass substrate can be in the scope of 170-180um
In, preferably 175um.
Embodiment 18
The present embodiment, on the basis of embodiment 17, gives a kind of concrete coating structure: institute
Stating film plating layer sum is 4 layers, the gross thickness of the film plating layer of described titanium-nitrogen-oxygen compound and described silicon nitrogen oxygen
The ratio of the gross thickness of the film plating layer of compound is between 0.4 to 0.5, it is ensured that this ratio just can be
Only realize the mirror effect of tarnish in the case of 4 layers of film plating layer of plating, and can be by gross thickness control
At below 150nm, thus reduce the impact on capacitance detecting.
Wherein, the structure of every layer can use following thickness to distribute:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 5-10nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 50-85nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 25-40nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 15-25nm.
Specifically, three groups of concrete film structure examples in following table are given:
In upper table, the reflectance curve of three groups of film structures is as shown in Figure 7 to 9, and wherein transverse axis is sat
Being designated as wavelength (nm), the longitudinal axis is refractive index (%), the curve chart transverse and longitudinal coordinate of following example
Identical.
Embodiment 19
As it is shown in figure 5, the present embodiment is on the basis of above-described embodiment 17 and 18, whole
The lower section of coating is provided with one layer of black ink layer, by arranging ink layer, it is possible to preferably carry out
Shading, prevents the interference of veiling glare.
Further, it is also possible to process black ink layer when, print certain pierced pattern,
Such as, the pierced pattern of printing fingerprint figure, openwork part and the part of non-hollow out, in light transmission
There are differences with in reflexive, thus from upper strata glass observe will at mirrored background under present
Corresponding pattern such that it is able to realize finger-print region and be identified or decorate.Preferably, permissible
The pigment being different from black is set in pierced pattern again, is formed instead with Lycoperdon polymorphum Vitt it is highly preferred that fill
The pigment of difference, such as, fills Chinese white, thus allows pattern become apparent from.
Embodiment 20
The present embodiment mainly illustrates to manufacture the glass coating structure manufacture method of above-described embodiment 17,
As indicated with 6, the glass coating structure of the present embodiment can use NCVM (non-conducting vacuum plating)
Technique realizes.
Specifically, vacuum space as shown in Figure 6 is set, and the ratio that is passed through wherein is at 0.4:1
Nitrogen between 0.6:1 and oxygen (preferably, the ratio of nitrogen and oxygen is 0.5:1), so
After be alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process,
Thus it is formed down alternately laminated silicon nitrogen oxides film plating layer and titanium at the lower surface of glass substrate
Nitrogen oxides film plating layer.
Wherein, titanium-nitrogen-oxygen compound film plating layer generation process is particularly as follows: excite by electron gun and be arranged on
Titanium material in described confined space, makes described titanium material evaporate, with the nitrogen in described confined space
After gas and oxygen react, the lower surface at glass substrate is formed down titanium-nitrogen-oxygen compound film plating layer.
Silicon nitrogen oxides film plating layer generation process includes: excited by electron gun be arranged on described airtight
Silicon raw material in space, makes described silicon raw material evaporate, with the nitrogen in described confined space and oxygen
After reacting, the lower surface at glass substrate is formed down silicon nitrogen oxides film plating layer.
It is alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generates work
The number of times of sequence depends on the number of plies finally to obtain, and the thickness of every layer is by controlling each titanium-nitrogen-oxygen
Compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process realize.
In above-mentioned technique, the nitrogen being passed through by control and the ratio of oxygen, realize plated film
The control of the ratio of nitrogen-atoms and oxygen atom in the compound of layer, thus reach titanium-nitrogen-oxygen compound and
The adjustment of the reflectance of silicon nitrogen oxides, thus the refractive index of titanium-nitrogen-oxygen compound is controlled 2.08
Left and right, controls the refractive index of silicon nitrogen oxides about 1.39, in combination with the number of plies and thickness
Control, in the case of integral thickness is relatively thin, it is achieved that the minute surface effect of the tarnish that effect is the most beautiful
Really.The present embodiment uses technique, owing to only used two kinds of common metals and semi-conducting material,
Therefore, its technique realizes upper relatively simple, it is simple to carry out Mass production.
Additionally, the most preferably, in coating process, first carry out titanium-nitrogen-oxygen compound film plating layer raw
Become operation so that titanium-nitrogen-oxygen compound film plating layer is positioned at ground floor, due to the reflectance of titanium-nitrogen-oxygen compound
The highest, therefore, it is located at ground floor and whole film system can be made to present more gorgeous color.
Additionally, in the present embodiment, film plating layer sum can control at 4 layers, and coating gross thickness can
To control between 100nm to 150nm, it addition, in an embodiment of the present invention, glass base
The thickness of plate can be in the range of 170-180um, preferably 175um.
Embodiment 21
The present embodiment relates to the manufacture method manufacturing the coating structure of above-described embodiment two, including: hand over
(permissible for execution titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process
It is alternately performed four times can realize), making described film plating layer sum is 4 layers, and described titanium-nitrogen-oxygen
The ratio of the gross thickness of the film plating layer of compound and the gross thickness of the film plating layer of described silicon nitrogen oxides is 0.4
Between 0.5.
Specifically, by being alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and the plating of silicon nitrogen oxides
Film layer operation, generates the coating structure of following thickness:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 5-10nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 50-85nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 25-40nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 15-25nm.
Wherein, the thickness of every layer can realize by controlling the plated film time, the concrete thickness of every layer
Example in embodiment 18 it is stated that do not repeating at this.
Embodiment 22
The present embodiment mainly illustrates to make the structure that above-described embodiment 19 relates to.In the present embodiment
By ink printing equipment, it is being alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and the oxidation of silicon nitrogen
After thing film plating layer generation process, in one layer of black ink layer printed below of coating such that it is able to more
Carry out well shading, prevent the interference of veiling glare.
Further, may include that printing has in coating one layer of black ink layer printed below
The black ink layer of fingerprint graph pierced pattern, is different from Lycoperdon polymorphum Vitt having being partially filled with of hollow out
Pigment；Only can also print pierced pattern and be not filled with pigment.Wherein, fill preferably with black shape
Become the pigment of contrast, such as, fill Chinese white, thus allow pattern become apparent from.
Embodiment 23
The present embodiment relates to a kind of finger print detection device, including: capacitive fingerprint sensing device, this electricity
Appearance formula fingerprint sensor can be the arbitrary a capacitive fingerprint sensing device used in prior art,
Can be active capacitive fingerprint sensing device (fingerprint sensor that such as FPC company produces),
It can also be passive type capacitive fingerprint sensing device.Paste on the top of above-mentioned capacitive fingerprint sensing device
With the glass coating structure of the various embodiments described above, using as sealing coat or protective layer, plated film
One facing to the capacitor plate array of capacitive fingerprint sensing device, glass above externally, be used for connecing
Fingertip grain leather skin.
Embodiment 24
The present embodiment relates to the mobile terminal of a kind of finger print detection device comprising embodiment 11, example
Such as mobile phone, panel computer etc., the bonnet of mobile terminal offers for carrying out fingerprint detection
Opening, described finger print detection device is positioned at described lower opening portion, the glass of described finger print detection device
The above of coating structure exposes from described opening.In said structure, the region of fingerprint recognition is arranged
After mobile terminal, by offering opening on bonnet, allow and there is the Flos Rosae Rugosae of mirror effect
The glass of gold color exposes, as the region of fingerprint recognition.Owing to the glass of the embodiment of the present invention plates
Layer can present beautiful rose gold mirror effect, therefore, it is possible to make the fingerprint of mobile terminal know
Other regional anomaly is substantially with attractive in appearance, it is possible to the overall appearance effect of deduction mobile terminal.
Last it is noted that various embodiments above is only in order to illustrate technical scheme, and
Non-to its restriction；Although the present invention being described in detail with reference to foregoing embodiments, ability
The those of ordinary skill in territory is it is understood that it still can be to the technology described in foregoing embodiments
Scheme is modified, or the most some or all of technical characteristic is carried out equivalent；And this
A little amendments or replacement, do not make the essence of appropriate technical solution depart from various embodiments of the present invention technology
The scope of scheme.
Claims (21)
1. a mobile terminal, including shell, it is characterised in that described shell is provided with opening,
Described opening part is provided with finger print detection device, and described finger print detection device includes glass coating structure,
Described glass coating structure includes that glass substrate and film plating layer, described film plating layer are arranged on described glass
The side of substrate.
Mobile terminal the most according to claim 1, it is characterised in that described fingerprint detection
Device also includes that fingerprint sensor, described glass coating structure are attached to described fingerprint sensor side.
Mobile terminal the most according to claim 2, it is characterised in that described film plating layer position
Between described fingerprint sensor and described glass substrate.
Mobile terminal the most according to claim 1, it is characterised in that described film plating layer is
Alternately laminated film plating layer.
Mobile terminal the most according to claim 4, it is characterised in that described alternately laminated
Film plating layer constituted by the film plating layer of at least two nitrogen oxides is alternately laminated.
Mobile terminal the most according to claim 5, it is characterised in that described at least two
The film plating layer of oxynitride is titanium-nitrogen-oxygen compound film plating layer and silicon nitrogen oxides film plating layer.
Mobile terminal the most according to claim 6, it is characterised in that described titanium-nitrogen-oxygen
Thing film plating layer is positioned at ground floor, and described silicon nitrogen oxides film plating layer is positioned at the second layer.
8. according to the mobile terminal described in claim 6 or 7, it is characterised in that described titanium nitrogen
Oxide is with the molecular formula of silicon nitrogen oxides, and the ratio of nitrogen and oxygen is between 0.4:1 to 1.5:1.
9. according to the mobile terminal according to any one of right 1-7, it is characterised in that described
The side of film plating layer is provided with ink layer.
Mobile terminal the most according to claim 9, it is characterised in that described ink layer
For gray oil layer of ink.
11. mobile terminals according to claim 10, it is characterised in that in described Lycoperdon polymorphum Vitt
In ink layer, having pierced pattern or have filling pattern, described filling pattern is filled with difference
Pigment in Lycoperdon polymorphum Vitt.
12. 1 kinds of glass coating structures, including glass substrate, it is characterised in that described glass
Coating structure also includes that film plating layer, described film plating layer are arranged on the side of described glass substrate.
13. glass coating structures according to claim 12, it is characterised in that described plating
Film layer is alternately laminated film plating layer.
14. glass coating structures according to claim 13, it is characterised in that described friendship
Film plating layer for stacking is constituted by the film plating layer of at least two oxynitride is alternately laminated.
15. glass coating structures according to claim 14, it is characterised in that described extremely
The film plating layer of few two kinds of oxynitride is titanium-nitrogen-oxygen compound film plating layer and silicon nitrogen oxides film plating layer.
16. glass coating structures according to claim 15, it is characterised in that described titanium
Nitrogen oxides film plating layer is positioned at ground floor, and described silicon nitrogen oxides film plating layer is positioned at the second layer.
17. according to the glass coating structure described in claim 15 or 16, it is characterised in that
Described titanium-nitrogen-oxygen compound is with the molecular formula of silicon nitrogen oxides, and nitrogen arrives at 0.4:1 with the ratio of oxygen
Between 1.5:1.
18. exist according to the glass coating structure according to any one of claim 12-16, its feature
In, the side of described film plating layer is provided with ink layer.
19. glass coating structures according to claim 18, it is characterised in that described oil
Layer of ink is gray oil layer of ink.
20. glass coating structures according to claim 19, it is characterised in that described
In gray oil layer of ink, having pierced pattern or have filling pattern, described filling pattern is filled with
It is different from the pigment of Lycoperdon polymorphum Vitt.
21. 1 kinds of finger print detection devices, it is characterised in that including: fingerprint sensor, in institute
The top stating fingerprint sensor is pasted with the glass plating described in any one of the claims 12 to 20
Rotating fields.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
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| CN2015106834730 | 2015-10-20 | ||
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| CN201511019440.2A Pending CN105884207A (en) | 2015-10-20 | 2015-12-30 | Glass coating structure, fingerprint detection device and mobile terminal |
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| CN (1) | CN105884207A (en) |
| WO (1) | WO2017067078A1 (en) |
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| ES2951308T3 (en) * | 2017-06-26 | 2023-10-19 | Saint Gobain | Glazing with solar control properties comprising a layer of titanium oxynitride |
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| JPH04285033A (en) * | 1991-03-12 | 1992-10-09 | Central Glass Co Ltd | Tision-based multilayer thin film-coated glass and its production |
| US20030228413A1 (en) * | 2002-06-11 | 2003-12-11 | Konica Corporation | Surface treatment method and optical part |
| CN102089684A (en) * | 2008-05-15 | 2011-06-08 | 巴斯夫公司 | Method of making thin film structure and compositions thereof |
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| CN103793689A (en) * | 2014-01-27 | 2014-05-14 | 南昌欧菲光科技有限公司 | Fingerprint recognition sensor packaging structure, electronic device and method for manufacturing fingerprint recognition sensor |
| CN205295160U (en) * | 2015-10-20 | 2016-06-08 | 乐视移动智能信息技术（北京）有限公司 | Glass plating layer structure , fingerprint detection device and mobile terminal |
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| FR2898295B1 (en) * | 2006-03-10 | 2013-08-09 | Saint Gobain | TRANSPARENT ANTIREFLECTION SUBSTRATE WITH NEUTRAL COLOR IN REFLECTION |
| CN104166846A (en) * | 2014-08-26 | 2014-11-26 | 南昌欧菲生物识别技术有限公司 | Fingerprint recognition sensor packaging structure and ultra-thin glass manufacturing method |
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| JPH04285033A (en) * | 1991-03-12 | 1992-10-09 | Central Glass Co Ltd | Tision-based multilayer thin film-coated glass and its production |
| US20030228413A1 (en) * | 2002-06-11 | 2003-12-11 | Konica Corporation | Surface treatment method and optical part |
| CN102089684A (en) * | 2008-05-15 | 2011-06-08 | 巴斯夫公司 | Method of making thin film structure and compositions thereof |
| CN102615875A (en) * | 2012-03-22 | 2012-08-01 | 东莞劲胜精密组件股份有限公司 | Discontinuous metallic silver membrane and membrane coating method for same |
| CN103793689A (en) * | 2014-01-27 | 2014-05-14 | 南昌欧菲光科技有限公司 | Fingerprint recognition sensor packaging structure, electronic device and method for manufacturing fingerprint recognition sensor |
| CN205295160U (en) * | 2015-10-20 | 2016-06-08 | 乐视移动智能信息技术（北京）有限公司 | Glass plating layer structure , fingerprint detection device and mobile terminal |
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| WO2017067078A1 (en) | 2017-04-27 |
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