CN105737879A - Micron grade raster calibration sample wafer with step height - Google Patents
Micron grade raster calibration sample wafer with step height Download PDFInfo
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- CN105737879A CN105737879A CN201610115896.7A CN201610115896A CN105737879A CN 105737879 A CN105737879 A CN 105737879A CN 201610115896 A CN201610115896 A CN 201610115896A CN 105737879 A CN105737879 A CN 105737879A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D18/00—Testing or calibrating apparatus or arrangements provided for in groups G01D1/00 - G01D15/00
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Abstract
The invention discloses a micron grade raster calibration sample wafer with a step height, relating to the micro-nano measurement kind device calibration field. The micron grade raster calibration sample wafer with step height comprises a substrate, at least one group of raster structures of the same cycle sizes arranged on the substrate and a metal layer covering the raster structure surface; the group of the raster structures of the same one cycle sizes comprises a one-dimension X direction grid bar structure of the same one cycle size, the one-dimension Y direction grid bar structure of the same one cycle size and a two-dimension grid structure of the same one cycle size; the one dimension X direction grid bar structure and the plurality of grid bars in the one dimension Y direction grid bar structure are arranged along the X direction and the Y direction; the plurality of grids in the two dimension grid structure are arranged along the X direction and the Y direction; and the grid bars and the grids are of protruded step height structures. The sample wafer has multiple magnitudes, has multiple structures, avoids the frequent displacement of the sample wafers and improves the calibration efficiency.
Description
Technical field
The present invention relates to the calibration field of micro-nano measurement quasi-instrument.
Background technology
Along with nanosecond science and technology, life sciences flourish, micro-nano measurement quasi-instrument is widely used in the process quality control of front line science research, product design and large-scale production.This quasi-instrument mainly has scanning electron microscope, atomic force microscope, transmission electron microscope, ambient electronic microscope, PSTM etc., and they are mainly used in observing, analyzing the accurate measurement of the physics, chemical phenomenon and the associated arguments that occur in micron or nanometer range.Wherein being most widely used of scanning electron microscope and atomic force microscope.
Scanning electron microscope (scanningelectronmicroscope), is called for short scanning electron microscope (SEM), is a kind of utilize electron beam scanning sample surfaces thus obtaining the ultramicroscope of sample message.The enlargement ratio of scanning electron microscope, from several times to hundreds of thousands times, is almost obtained in each industry and is widely applied.At semiconductor applications, machining feature size has been enter into deep-submicron and nanometer scale, and traditional optical microscope is helpless, it is necessary to could measure the size of below submicron by means of scanning electron microscope.
Atomic force microscope (AFM) is to utilize the van der Waals interaction between atom to present the surface characteristic of sample, is possible not only to measure the sample characteristics of for example of X, Y-direction in certain limit, it is also possible to measure the sample characteristics of for example of Z-direction in certain limit.Application in semiconductor applications is very extensive.
China is one and about has thousands of, every the microbeam analytical tool big country being worth millions of units, and wherein scanning electron microscope there are about nearly thousand, and atomic force microscope there are about hundreds of platform.They are widely used in research and production unit, and the popularity rate of instrument is significantly high.
At present, most scanning electron microscopies are only used the copper mesh print that producer provides that enlargement ratio and the distortion of Instruments Image are debugged and calibrated when instrument is installed by the engineer of manufacturer, and due to scanning electron microscope be adopt electron beam pointwise progressive scan imaging, X, Y-direction scanning image size by the impact by X, Y-direction scanning electron circuit.Along with the increase of the time of use, the electronic circuit of instrument can change, thus affecting the quality of scanning electron microscope image.As when Measuring Object length, deviation in various degree is there is between general and exact value, also often find because the scanning difference of X, Y-direction causes image different at the enlargement ratio of X, Y-direction, and the Y/X coefficient of measured value given by X, Y-direction is also different under different amplification；Additionally, the image of scanning electron microscope is also often distorted, especially even more serious in low power situation.Owing to lacking the verifying print of uniform sizes, scanning electron microscope creates many adverse consequencess in application aspect, as in the processing of microelectronic component, owing to lacking unified scale calibration, the error that can make electronic device processing dimension reaches 30%, causing inefficacy or index off-design requirement, similar problem is of common occurrence in real work.For atomic force microscope, its output data have the enlargement ratio having two: two dimensional surface size being analogous to scanning electron microscope of metering value meaning, the namely sweep limits of the X of scanatron, Y-direction；Another is that atomic force microscope has significantly high Depth resolution (Z-direction), and what have a depth direction can the ability of quantitative test simultaneously.The accuracy of this quasi-instrument directly affects the accuracy of its measurement result, therefore a kind of micron order verifying print with shoulder height of this patent main inventive, for calibrating image enlargement ratio and the depth survey characteristic of this quasi-instrument.
The supplier of current raster standard sample of photo includes NANOSENSORS company of the VLSI company of the U.S., Germany etc., and they mainly provide monodrome print.Problems existing and defect are mainly reflected in:
1, the size range of current print can not be completely covered the print scope that calibration instrument uses, and one-dimentional structure and two-dimensional structure is not produced on finished product on same print jointly.
2, the enlargement ratio that calibration instrument is different needs to use various sizes of print, and print currently on sale is all monodrome print, needs repeatedly to change print, have a strong impact on calibration efficiency in calibration process.
Summary of the invention
The technical problem to be solved is to provide a kind of micron order grating with shoulder height and calibrates print, and this print has various structures, measurement scope is wide, avoid and frequently change print in calibration process, easy to use, improves calibration efficiency.
For solving above-mentioned technical problem, the technical solution used in the present invention is: a kind of micron order grating with shoulder height calibrates print, including substrate and the optical grating construction of least one set same period size arranged in substrate and the metal level covering optical grating construction surface；The optical grating construction of described one group of same period size includes the two-dimensional grid structure of the one-dimensional X-direction structure of grid of same period size, the one-dimensional Y-direction structure of grid of same period size and same period size, several grizzly bars in described one-dimensional X-direction structure of grid and one-dimensional Y-direction structure of grid arrange with Y-direction equalization respectively in X direction, several grids in described two-dimensional grid structure arrange with Y-direction equalization in X direction, and described grizzly bar and grid are the shoulder height structure of projection.
The technical scheme optimized further is described least one set is 7 groups, its periodic dimensions respectively 100 μm, 50 μm, 20 μm, 10 μm, 5 μm, 2 μm, 1 μm.
The shoulder height value that technical scheme is described grizzly bar and grid optimized further is 180nm.
The technical scheme optimized further is that described substrate adopts silicon materials, and described optical grating construction adopts silicon nitride material.
The optical grating construction that technical scheme is several different cycles sizes optimized further is equipped with variable labelling and the tracking mark of correspondence.
Adopt and have the beneficial effects that produced by technique scheme: the print of present invention design includes one-dimensional X-direction structure, one-dimensional Y-direction structure, two-dimensional grid structure, shoulder height structure, avoid conventional sample structure single, value is single, calibration process constantly to be changed print, the problem such as loaded down with trivial details especially, and adopt the method that subregion is designed to be distributed in same template by 7 various sizes of sample structure, can entirety be used for calibrating this quasi-instrument, and multiple enlargement ratios and the depth characteristic thereof of print and this instrument of adjustable need not be replaced, in each region, all it is labelled with the design value of this size print simultaneously, indicate tracking mark simultaneously, user of service is helped conveniently to search out the sample structure of required size.
Accompanying drawing explanation
Fig. 1 is overall structure schematic diagram of the present invention；
Fig. 2 is the schematic diagram of the single optical grating construction of the present invention；
Fig. 3 is that the present embodiment uses the AFM one-dimensional grating print datagram that periodic dimensions is 2 μm measured；
Fig. 4 is that the present embodiment uses the AFM two-dimensional grid print datagram that periodic dimensions is 10 μm measured；
Fig. 5 is the present embodiment periodic dimensions is the one-dimensional grating print confirmatory measurement datagram of 2 μm；
Fig. 6 is the present embodiment periodic dimensions is the two-dimensional grid print confirmatory measurement datagram of 10 μm；
Wherein, 1 substrate, 2 optical grating constructions, 3 one-dimensional X-direction structure of grids, 4 one-dimensional Y-direction structure of grids, 5 two-dimensional grid structures.
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, it is clear that described embodiment is only a part of embodiment of the present invention, rather than whole embodiments.Based on the embodiment in the present invention, the every other embodiment that those of ordinary skill in the art obtain under not making creative work premise, broadly fall into the scope of protection of the invention.
As depicted in figs. 1 and 2, the invention discloses a kind of micron order grating with shoulder height and calibrate print, including substrate 1 and the optical grating construction 2 of least one set same period size arranged on the base 1 and the metal level covering optical grating construction 2 surface；The optical grating construction 2 of described one group of same period size includes the two-dimensional grid structure 5 of the one-dimensional X-direction structure of grid 3 of same period size, the one-dimensional Y-direction structure of grid 4 of same period size and same period size, several grizzly bars in described one-dimensional X-direction structure of grid 3 and one-dimensional Y-direction structure of grid 4 arrange with Y-direction equalization respectively in X direction, several grids in described two-dimensional grid structure 5 arrange with Y-direction equalization in X direction, and described grizzly bar and grid are the shoulder height structure of projection.
The embodiment optimized further is described least one set is 7 groups, its periodic dimensions respectively 100 μm, 50 μm, 20 μm, 10 μm, 5 μm, 2 μm, 1 μm.
The shoulder height value that embodiment is described grizzly bar and grid optimized further is 180nm.
The embodiment optimized further is that described substrate 1 adopts silicon materials, and described optical grating construction 2 adopts silicon nitride material.
The optical grating construction that embodiment is several different cycles sizes 2 optimized further is equipped with variable labelling and the tracking mark of correspondence.
The present invention has been effectively combined structure and the size of existing business test sample, have developed the micron order verifying print with shoulder height, it is applied to calibration scan Electronic Speculum and atomic force microscope, by designed, designed print size and structure distribution figure, and make checking print, effectively raise the measurement accuracy of this quasi-instrument.
The present invention is made up of one-dimensional X-direction structure, one-dimensional Y-direction structure, two-dimensional grid structure, as shown in Figure 1, being divided into 9 regions, contain 7 different sizes such as 100 μm, 50 μm, 20 μm, 10 μm, 5 μm, 2 μm, 1 μm, step depth is of a size of 180nm.And in each region, all it is labelled with the design value of this size print, indicates tracking mark simultaneously, help user of service conveniently to search out the sample structure of required size.
With shoulder height micron order grating calibrate print making step, specific as follows:
(1) selection of print
The material selection of print needs to consider the complexity of processing, the stability of print and image quality during for calibration instrument etc. factors.By consulting related data, in conjunction with existing semiconductor processing conditions, the material making standard sample of photo is chosen as: Choice of substrate materials silicon, and the material of optical grating construction is silicon nitride, and surface covers metal level.
Selecting silicon to be because silicon as backing material is important semi-conducting material, is widely used in microelectronic industry, and its chemical property is highly stable, is adapted to be processed into the standard sample of photo of special equipment in multiple microelectronic industry.Selecting face on a silicon substrate to deposit one layer of silicon nitride for processing optical grating construction, the reason selecting silicon nitride is that silicon nitride is relative with the contrast of silicon better, and the advantage that silicon nitride hardness is big, fine and close, technique existence is very big；Consider that print is applied to calibration scan Electronic Speculum, it is necessary to possess electric conductivity, finally ensure that it possesses electric conductivity at its surface sputtering metal level.
(2) graphic designs of print
The present invention uses L-Edit Software on Drawing figure, design drawing not only includes the one-dimensional X-direction structure of 7 sizes, one-dimensional Y-direction structure, further comprises the two-dimensional grid structure of each size, so the reason of design need not rotate the different enlargement ratios of print and adjustable X-direction and Y-direction when being calibration scan Electronic Speculum, make lattice structure to be used for calibrating pattern distortion, with ledge structure for calibrating the depth measurement ability of atomic force microscope, meet the use function of print.The print domain of design is as shown in Figure 1.
Need when graphic designs to consider in following two: 1) print of what structure is applicable to calibration scan Electronic Speculum and atomic force microscope 2) different enlargement ratios use various sizes of prints, how the print of sizes is conveniently applied in calibration operation.
In order to solve problem above, the present invention, in conjunction with the needs of current microelectronic industry, devises the micron order grating print with shoulder height.Print size is intended being chosen as: 100 μm, 50 μm, 20 μm, 10 μm, 5 μm, 2 μm, 1 μm, step depth value is 180nm, and structure makes a peacekeeping two-dimensional grating respectively, and one-dimentional structure makes X-direction and Y-direction respectively, two-dimensional structure makes grid graph, as shown in Figure 2.
The different enlargement ratios of scanning electron microscope to use various sizes of print, during current alignment scanning electron microscope, calibration personnel needs according to being selected the print of corresponding size to put in the workbench of scanning electron microscope successively by the enlargement ratio of school instrument, the each enlargement ratio of metering process alignment takes around 0.5 hour, this process includes the preparation of print, is loaded into workbench, measurement process etc., one scanning electron microscope of calibration needs to use the print of 5 kinds of sizes under normal circumstances, consuming time be approximately 2.5 ~ 3 hours, metering process is not only loaded down with trivial details and also during special charges.
In order to solve these problems we have employed subregion design method 7 various sizes of structure of grids of micron order grating print are all distributed on same mask, and on mask, design tracking mark, the convenient position finding each size during metering, the print processed only needs the structure that mobile working platform finds various sizes to be calibrated in a calibration process, compares and saves time.It is equally applicable to enlargement ratio and the depth measurement ability of calibration atomic force microscope.
(3) processing of print
The present invention adopts the method processing print of projection lithography, Laser-beam plate-making technology is utilized to make mask plate, mask plate is of a size of 60mm × 60mm, the ratio that reduces of projection lithography is 5:1, the print overall dimensions produced is 12mm × 12mm, includes 7 sizes, 9 grid spaces, can the overall enlargement ratio for calibration instrument and depth measurement ability, and the process measured need not be replaced multiple enlargement ratios of print and such instrument of adjustable.
In order to print to be carried out gluing, exposure, development by better etched diffraction grating structure in the course of processing, then get rid of the water stain residue such as grade on print, then perform etching, be finally completed the processing of print.
DATA REASONING:
The present invention adopts the atomic force microscope (AFM) print to producing to carry out the measurement of grill width and shoulder height.The grill width of grating print is the distance between the two edges line of every grating, and step depth is the top edge difference in height with its lower limb of grating；The present invention is when measuring the grill width of grating print, first a more uniform periodic optical grating of ratio in AFM scan image is chosen, its grill width and shoulder height are repeated measuring six times by the analysis software adopting AFM, and meansigma methods is as the grill width value of this periodic optical grating and shoulder height value.
The present invention print for periodic dimensions for 2 μm and 10 μm, illustrates measurement process, and measurement result is as shown in Figure 3, Figure 4.
Fig. 3 select a periodic optical grating therein carry out width measure, six its width values of position measurement of uniform design on this grating, it is respectively as follows: 2.015 μm, 2.014 μm, 2.012 μm, 2.012 μm, 2.016 μm, 2.015 μm, taking its meansigma methods width measurements as this section of periodic optical grating, result is 2.014 μm.Same these six positions of selection carry out elevation carrection, be respectively as follows: 180.67nm, 180.56 μm, 180.61nm, 180.71nm, 180.85 μm, 180.69 μm, taking its meansigma methods shoulder height measurement result as this section of periodic optical grating, result is 180.68nm.
Table 1 cycle is the grating measuring result of 2 μm
A period grid in Fig. 4 is uniformly chosen 6 its width values of position measurement, it is respectively as follows: 10.078 μm, 10.081 μm, 10.079 μm, 10.089 μm, 10.096 μm, 10.091 μm, taking its meansigma methods width measurements as this period grid, result is 10.086 μm；Same select these six positions to carry out elevation carrection, be respectively as follows: 180.45nm, 180.33 μm, 180.72nm, 180.65nm, 180.58 μm, 180.67 μm, take its meansigma methods as its shoulder height measurement result, result is 180.68nm.
Table 2 cycle is the measurement result of the grid print of 10 μm
Test data verification:
In order to verify the test result of micron order grating print, we use scanning electron microscope that the grating print made has been carried out grill width and measure checking, use white light interferometer that the print made is carried out shoulder height and measure checking.
Measurement device title: scanning electron microscope；Model: S-4800；Plane No.: 9278-10
Use the print measurement to making of this equipment, for periodic dimensions be 2 μm grating grizzly bar and raster grid that periodic dimensions is 10 μm, use the Survey Software that scanning electron microscope self is with to measure the size of print.
These 5 periodic optical gratings are selected to carry out width measure, three its width values of position measurement of uniform design on these 5 gratings, it is respectively as follows: 10.033 μm, 10.045 μm, 10.033 μm, average the grill width meansigma methods as five cycles, finally calculating the width value of single periodic optical grating, result is 2.007 μm.
These 2 period grids are selected to carry out width measure, three its width values of position measurement of uniform design on these 2 gratings, it is respectively as follows: 20.009 μm, 20.009 μm, 20.009 μm, average the raster width meansigma methods as two cycles, finally calculating the width value of single period grid, result is 10.005 μm.
By measurement data above it can be seen that the relative error of its value is respectively less than 3%, meet the requirement to micron order grating print in JJG550-88 " scanning electron microscope tries vertification regulation ".
Measurement device title: white light interferometer；Model: GT-X8.Use the print measurement to making of this equipment, for periodic dimensions be 2 μm grating grizzly bar and raster grid that periodic dimensions is 10 μm, use white light interferometer to measure the shoulder height of relevant position, measurement result figure is as shown in Figure 5,6.
Fig. 5 select wherein any period grating carry out shoulder height measurement, its shoulder height value of six position measurements of uniform design on this grating, it is respectively as follows: 0.1779 μm, 0.1777 μm, 0.1821 μm, 0.1861 μm, 0.1829 μm, 0.1797 μm, average the shoulder height value as this periodic optical grating, result is 0.1811 μm, is 181.1nm.
Fig. 6 select wherein any period grid carry out shoulder height measurement, its shoulder height value of six position measurements of uniform design on this grid, it is respectively as follows: 0.1793 μm, 0.1821 μm, 0.1795 μm, 0.1792 μm, 0.1813 μm, 0.1817 μm, average the shoulder height value as this periodic optical grating, result is 0.1805 μm, is 180.5nm.
Claims (5)
1. the micron order grating with shoulder height calibrates print, it is characterised in that: include substrate (1) and go up the optical grating construction (2) of the least one set same period size arranged in substrate (1) and cover the metal level on optical grating construction (2) surface；The optical grating construction (2) of described one group of same period size includes the two-dimensional grid structure (5) of the one-dimensional X-direction structure of grid (3) of same period size, the one-dimensional Y-direction structure of grid (4) of same period size and same period size, several grizzly bars in described one-dimensional X-direction structure of grid (3) and one-dimensional Y-direction structure of grid (4) arrange with Y-direction equalization respectively in X direction, several grids in described two-dimensional grid structure (5) arrange with Y-direction equalization in X direction, and described grizzly bar and grid are the shoulder height structure of projection.
2. the micron order grating with shoulder height according to claim 1 calibrates print, it is characterised in that: described least one set is 7 groups, its periodic dimensions respectively 100 μm, 50 μm, 20 μm, 10 μm, 5 μm, 2 μm, 1 μm.
3. the micron order grating with shoulder height according to claim 1 calibrates print, it is characterised in that: the shoulder height value of described grizzly bar and grid is 180nm.
4. the micron order grating with shoulder height according to claim 1 calibrates print, it is characterised in that: described substrate (1) adopts silicon materials, and described optical grating construction (2) adopts silicon nitride material.
5. the micron order grating with shoulder height according to claim 1 calibrates print, it is characterised in that: the optical grating construction (2) of several different cycles sizes is equipped with variable labelling and the tracking mark of correspondence.
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| CN110646639A (en) * | 2019-09-17 | 2020-01-03 | 西安交通大学 | Standard template for calibrating nano measuring instrument and preparation method thereof |
| CN111024017A (en) * | 2019-12-04 | 2020-04-17 | 中国电子科技集团公司第十三研究所 | Film thickness sample and preparation method of film thickness sample |
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