CN105333817B - Using the measuring method of optical maser wavelength amendment type planar reflector laser interference instrument - Google Patents
Using the measuring method of optical maser wavelength amendment type planar reflector laser interference instrument Download PDFInfo
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- CN105333817B CN105333817B CN201510847923.5A CN201510847923A CN105333817B CN 105333817 B CN105333817 B CN 105333817B CN 201510847923 A CN201510847923 A CN 201510847923A CN 105333817 B CN105333817 B CN 105333817B
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02062—Active error reduction, i.e. varying with time
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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Abstract
The present invention relates to a kind of Precision Inspection and instrument fields, more particularly to a kind of optical maser wavelength amendment type planar reflector laser interference instrument and its measuring method, the optical maser wavelength amendment type planar reflector laser interference instrument, including lasing light emitter, fixed pan speculum, photodetector, measurement plane reflector apparatus and spectroscope, the measurement plane reflector apparatus includes measurement plane speculum and accurate displacement device, and the accurate displacement device provides the displacement in the same direction or reversed with testee displacement for the measurement plane speculum.In the application, the fractional part △ L for exceeding half of optical maser wavelength in testee actual displacement are also measured and are added in displacement detecting result, so that the displacement result obtained measured by the laser interferometer of the application is more accurate, optical maser wavelength is modified in measurement process simultaneously, reduce influence of the environmental change to laser interference ranging, further improve the measurement accuracy of laser interferometer of the present invention.
Description
Technical field
It is more particularly to a kind of to be put down using optical maser wavelength amendment type the present invention relates to a kind of Precision Inspection and instrument field
The measuring method of face reflector laser interference instrument.
Background technology
The appearance of laser is rapidly developed ancient interference technique, and laser has brightness height, good directionality, list
Color and the features such as good coherence, laser interferometry techniques comparative maturity.Laser interferometry system is widely used
It is general：The detection measured such as linear scale, grating, gauge block, precision lead screw of accurate length, angle；Detection and localization in precision instrument
Control, the correction of system such as precision optical machinery；Position detecting system in large scale integrated circuit special equipment and detecting instrument；It is micro-
Measurement of small size etc..At present, in most of laser interference length-measuring systems, Michelson's interferometer or similar is all employed
Light channel structure, for example, currently used single frequency laser interferometer.
Single frequency laser interferometer is the light beam sent from laser, is divided into two-way by spectroscope after beam-expanding collimation, and divides
Congregation is not reflected from stationary mirror and moving reflector generate interference fringe on spectroscope.When moving reflector moves
When dynamic, the light intensity of interference fringe changes is converted to electric impulse signal by the photo-electric conversion element in receiver and electronic circuit etc.,
Input forward-backward counter calculates overall pulse number N after shaped, amplification, then by electronic computer by calculating formula L=N × λ/2, formula
Middle λ is optical maser wavelength, calculates the displacement L of moving reflector.
In actual use, the inventors of the present application found that current single frequency laser interferometer is only to laser interference ripple
Integer part is counted, i.e. can only most it is capable and experienced relate to when, i.e., most strong constructive interference when counted, and for laser interference
In the process, then it is difficult to count during non-most strong constructive interference, so that, measurement accuracy is limited to the wavelength of laser, precision
The integral multiple of half of optical maser wavelength is only, but in actually measuring, the shift value that testee generates usually all is random
, it is impossible to just it is the integral multiple of half of optical maser wavelength, i.e., should also there are the fractional part beyond half of optical maser wavelength
Partial distance can not be reflected by above-mentioned receiver, so can not also calculate.Simultaneously because atmospheric environment
Variation, if temperature, humidity and the variation of air pressure, optical maser wavelength change in the environment, this directly contributes laser interference
The precision of ranging reduces.
Although in conventional arts, the half wavelength of laser has had high precision, with science skill
The progress of art, in Technology of Precision Measurement field, the required precision of accurate measurement is higher and higher, the essence of this half of optical maser wavelength
Degree, cannot increasingly meet the requirement of people again.
So based on above-mentioned deficiency, there is an urgent need for a kind of laser interferometer for being capable of providing more high measurement accuracy at present.
The content of the invention
It is an object of the invention to be directed to current laser interferometer precision to be limited to optical maser wavelength, and measuring environment is to laser
The deficiency that wavelength has a direct impact provides a kind of laser interferometer and its measuring method with more high measurement accuracy.
In order to realize foregoing invention purpose, the present invention provides following technical schemes：
A kind of optical maser wavelength amendment type planar reflector laser interference instrument, including lasing light emitter, fixed pan speculum, photoelectricity
Detector, measurement plane reflector apparatus and spectroscope, the measurement plane reflector apparatus include measurement plane speculum with
Accurate displacement device, the laser beam that the lasing light emitter projects are divided into first laser beam and second laser beam after the spectroscope,
First laser beam is to the fixed pan speculum, the light splitting described in directive again after fixed pan speculum reflection
Mirror, then the photodetector described in directive after spectroscope, second laser beam is to the measurement plane speculum, through the measurement
Spectroscope described in directive again after plane mirror reflection, the photodetector described in directive after spectroscope, first laser beam with
Second laser beam is interfered in photodetector described in directive, and the measurement plane speculum is arranged on the accurate displacement
On device, the accurate displacement device is arranged on testee, and the accurate displacement device is the measurement plane speculum
It provides and testee displacement displacement in the same direction or reversed.
In the said program of the application, since measurement plane speculum is arranged on accurate displacement device, and accurate position
Moving device is arranged on testee, and when testee is subjected to displacement, testee drives accurate displacement device, and then drives
Measurement plane speculum, in this way, when testee is subjected to displacement, in displacement process, due to the change of second laser Shu Guangcheng
Change so that, first laser beam and the interference state of second laser beam also change therewith, start before measuring work, start accurate position
Moving device makes measurement plane speculum generate displacement, the displacement of the direction of displacement and testee of the measurement plane speculum
Direction on the same line, when photodetector detects most strong constructive interference, stops accurate displacement device, and photoelectricity is visited
It surveys device and counts clearing, then start to measure the displacement of testee again, become in first laser beam and second laser beam interferometer state
During change, the times N of the most strong constructive interference of photodetectors register terminates when testee moves, when remaining static,
Photodetector stops counting；At this point, measurement plane speculum is made in the direction of displacement of testee by accurate displacement device
Upper movement, and photodetector is observed, when photodetector detects most strong constructive interference, stop accurate displacement device, and
It is the shift value △ L that measurement plane speculum provides to read accurate displacement device.
If displacement △ L are identical with the direction of displacement of testee, shift value L=N × λ that testee is actual to be generated/
2+ (λ/2- △ L), wherein △ L ＜ λ/2, λ is optical maser wavelength in formula；
If the direction of displacement of displacement △ L and testee on the contrary, if, shift value L=N × λ that testee is actual to be generated/
2+ △ L, wherein △ L ＜ λ/2, λ is optical maser wavelength in formula.
In this way, by said structure, will also be surveyed beyond half of optical maser wavelength fractional part △ L in testee actual displacement
It measures to add in displacement detecting result, so that the displacement result obtained measured by the laser interferometer of the application is more
Accurately, accuracy is higher than half of optical maser wavelength, is specifically dependent upon the displacement accuracy that accurate displacement device can be provided.
As the preferred embodiment of the application, the accurate displacement device includes support platform and is arranged on the support platform
On driving device, the support platform is engaged with the testee, and the driving device is measurement plane reflection
Mirror provides the displacement on testee direction of displacement.
As the preferred embodiment of the application, the driving device is Piezoelectric driving device.
In the present solution, the function ceramics that can be converted mechanical energy and electric energy mutually using Piezoelectric driving device
Material, the micro-displacement of the deformation quantity very little generated under electric field action, no more than thousand a ten thousandths of size itself,
With good repetitive distortion recovery capability, stability is good, precision is high, further improves the essence of the application accurate displacement device
True property and reliability.
As the preferred embodiment of the application, the accurate displacement device further includes first be arranged in the support platform
Displacement piece and the second displacement part being arranged in first displacement piece, the driving device match with first displacement piece
It closes, provides the displacement along the support platform for first displacement piece, first displacement piece has one compared with its displacement
The inclined inclined-plane in direction, the second displacement part are slidably arranged on the inclined-plane of first displacement piece, make the second displacement
Part can be slided along the inclined-plane of first displacement piece, be closely fitted between first displacement piece and second displacement part, the survey
Amount plane mirror is arranged on the second displacement part, and restraint device is additionally provided in the support platform, described about to get one's things ready
The limitation second displacement part is put along the movement on the first displacement piece direction of displacement so that when the first displacement piece is by the drive
When dynamic device drives and generates displacement, the second displacement part is driven by first displacement piece and generates displacement, also, described
The direction of displacement of second displacement part and the direction of displacement of first displacement piece are perpendicular, the inclined-plane of first displacement piece and its
The angle of direction of displacement is A degree, 0<A<45.
In the said program of the application, driving device is engaged with the first displacement piece, is provided for the first displacement piece along branch
The displacement of platform is supportted, the first displacement piece has one compared with the inclined inclined-plane of its direction of displacement, and second displacement part is slidably arranged in
On the inclined-plane of first displacement piece, make second displacement part that can be slided along the inclined-plane of the first displacement piece, when accurate displacement device works,
Driving device provides certain displacement and promotes the first displacement piece, at this point, since restraint device limits second displacement part along first
Movement on displacement piece direction of displacement makes the direction of displacement of second displacement part and the direction of displacement of the first displacement piece perpendicular, such as
This, the displacement of second displacement part and driving device are related for the displacement that the first displacement piece provides, also with the first displacement piece
Inclined-plane is related to the angle of its direction of displacement.
That is, if the inclined-plane of the first displacement piece and the angle of its direction of displacement are A degree, when the displacement that driving device provides is
During X, second displacement part is Y=Xtan (A) in the displacement generated in the driving device direction of motion, in this way, when folder
When angle A is less than 45 degree, a displacement for being less than X values will be obtained, when further reducing included angle A, displacement Y also subtracts therewith
It is small, so so that in the scheme of the application, accurate displacement device directly enhances this in a manner of changing precision by stroke
Apply for the precision of accurate displacement device, also just further improve the measurement accuracy of the application laser interferometer.
As the preferred embodiment of the application, it is additionally provided between first displacement piece and the support platform with magnetism
Magnetic part, the second displacement part has magnetism, and the second displacement part and the magnetic part are there is a natural attraction between the sexes state.So that
First displacement piece can keep fitting closely with second displacement part when being promoted, and ensure the essence of the application accurate displacement device
Degree, and then ensure the measurement accuracy of the application laser interferometer.
As the preferred embodiment of the application, the second displacement part is an integral structure with the measurement plane speculum.
In said program, second displacement part is an integral structure with measurement plane speculum, that is to say, that directly
One reflecting surface in two displacement pieces is set, makes itself to form measurement plane speculum, in this way, simplifying the application laser interferometer
Structure, facilitate debugging and use.
In actual measuring environment, the measurement accuracy of laser interferometer is also influenced by actual measuring environment, due in reality
In the measuring environment of border, temperature, humidity and the variation of air pressure of air can all cause the variation of air dielectric, so that swashing
The wavelength of light can also change so that there are errors for final result of calculation；
Although at present, there is also the device of measurement air refraction, to the atmospheric temperature, humidity and air pressure of single locus
It measures, optical maser wavelength is modified by wavelength compensation formula, but it is merely able to be detected local air, and
In the displacement measurement field of the application, since its displacement is carried out in a region, the air of each position in the region
Each parameter is all there are variant, situations such as being especially in the presence of larger temperature gradient, moist gradient and barometric gradient, is joined with single-point
Number corrects optical maser wavelength, and there will be large errors.
So it for these reasons, in this application, is detected in measurement process under current measuring environment, the ring of laser
Border effective wavelength λ ', thus directly avoid different zones air refraction it is different and the problem of bring, in this way, reduce environment because
The error that element is brought, and then the further measurement accuracy for improving the application laser interferometer.
Disclosed herein as well is a kind of measurement sides for above-mentioned optical maser wavelength amendment type planar reflector laser interference instrument
Method includes following step：
Step 1：Planar reflector laser interference instrument of the present invention is installed；
Step 2：Measurement plane reflector apparatus is arranged on testee；
Step 3：Optical maser wavelength amendment type planar reflector laser interference instrument is debugged, makes to form satisfactory light path, and
And first laser beam is made to be in interference state with second laser beam；
Step 4：Start before measuring work, start accurate displacement device, measurement plane speculum is made to generate displacement, it is described
The direction of displacement of measurement plane speculum and the direction of displacement of testee on the same line, when photodetector detects most
During strong constructive interference, stop accurate displacement device, and photodetector is counted and is reset；
Step 5：Start to measure work, testee starts to move, and photodetectors register first laser beam and second swashs
The times N of the most strong constructive interference of light beam；
Step 6：Testee displacement terminates, and remains static, and is again started up accurate displacement device, makes measurement plane
Speculum generate displacement, the direction of displacement of the measurement plane speculum and the direction of displacement of testee on the same line,
When photodetector detects most strong constructive interference again, stop the accurate displacement device, stop measurement plane speculum
Only；
Step 7：It is the shift value △ L that the measurement plane speculum provides to read accurate displacement device；
Step 8：Record the most strong constructive interference times N of photodetectors register and measurement plane reflection in measurement process
Mirror shift value △ L.
Step 9：Accurate displacement device is again started up, traverse measurement plane mirror makes the most strong phase of photodetectors register
The number M, M of long interference are positive integer, and read the corresponding measurement plane mirror displacements value Z of M times most strong constructive interference.According to
Z=M × λ '/2 are drawn under current measuring environment, effective wavelength λ '=2Z/M of laser.
Step 10：Calculate the shift value of testee.
If displacement △ L are identical with the direction of displacement of testee, the shift value L=N that testee is actual to be generated ×
λ '/2+ (λ '/2- △ L), wherein △ L ＜ λ '/2, λ ' is laser effective wavelength in formula；
If the direction of displacement of displacement △ L and testee on the contrary, if, shift value L=N that testee is actual to be generated ×
λ '/2+ △ L, wherein △ L ＜ λ '/2, λ ' is laser effective wavelength in formula.
The measuring method of the application, since measurement plane mirror displacements value △ L to be added to the shift value of testee
In, directly enhance the measurement accuracy of testee displacement.Meanwhile by detecting the effective wavelength λ ' in measuring environment, i.e., pair
The wavelength of laser is modified, and is so reduced the error that environmental factor is brought, and then is further improved the application laser and do
The measurement accuracy of interferometer.
As the preferred embodiment of the application, into step 9, the most strong constructive interference can also be most the step 4
Weak destructive interference.In the present solution, during measuring, photodetector is record first laser beam and second laser beam
The number of most weak destructive interference so can still obtain the shift value L of a higher testee of precision.
Compared with prior art, beneficial effects of the present invention：
1st, the fractional part △ L for exceeding half of optical maser wavelength in testee actual displacement are also measured into supplement in place
It moves in testing result, so that the displacement result obtained measured by the laser interferometer of the application is more accurate, precision is high
In half of optical maser wavelength, the displacement accuracy that accurate displacement device can be provided is specifically dependent upon；
2nd, the effective wavelength λ ' of laser in measuring environment is detected, optical maser wavelength is modified, in this way, reducing environmental factor
The error brought, and then the further measurement accuracy for improving the application laser interferometer.
Description of the drawings：
Fig. 1 is the light path schematic diagram of laser interferometer structure of the present invention；
Fig. 2 is the schematic diagram that measurement plane speculum is an integral structure with second displacement part in the present invention,
It is marked in figure：
1- lasing light emitters, 2- fixed pan speculums, 3- photodetectors, 4- measurement plane reflector apparatus, 5- spectroscopes,
6- measurement plane speculums, 7- accurate displacement devices, 8- first laser beams, 9- second laser beams, 10- testees, 11- supports
Platform, 12- driving devices, the first displacement pieces of 13-, 14- second displacement parts, 15- inclined-planes, 16- restraint devices, 17- magnetic parts.
Specific embodiment
With reference to test example and specific embodiment, the present invention is described in further detail.But this should not be understood
Following embodiment is only limitted to for the scope of the above-mentioned theme of the present invention, it is all that this is belonged to based on the technology that present invention is realized
The scope of invention.
Embodiment 1,
As shown in Figure 1, 2, a kind of optical maser wavelength amendment type planar reflector laser interference instrument including lasing light emitter 1, is fixed and put down
Face speculum 2, photodetector 3, measurement plane reflector apparatus 4 and spectroscope 5, the measurement plane reflector apparatus 4 wrap
Include measurement plane speculum 6 and accurate displacement device 7, the laser beam that the lasing light emitter 1 projects is divided into the after the spectroscope 5
One laser beam 8 and second laser beam 9, fixed pan speculum 2 described in 8 directive of first laser beam are reflected through the fixed pan
Spectroscope 5 described in directive, then the photodetector 3 described in directive after spectroscope 5 again after mirror 2 reflects, 9 directive of second laser beam
The measurement plane speculum 6, the spectroscope 5 described in directive again after the measurement plane speculum 6 reflection, through spectroscope 5
Photodetector 3 described in directive afterwards, first laser beam 8 occur dry with second laser beam 9 in photodetector 3 described in directive
It relates to, the measurement plane speculum 6 is arranged on the accurate displacement device 7, and the accurate displacement device 7 is arranged on measured object
On body 10, the accurate displacement device 7 provides in the same direction or reversed with 10 displacement of testee for the measurement plane speculum 6
Displacement.
In the present embodiment, since measurement plane speculum 6 is arranged on accurate displacement device 7, and accurate displacement device 7
It is arranged on testee 10, when testee 10 is subjected to displacement, testee 10 drives accurate displacement device 7, and then band
Dynamic measurement plane speculum 6, in this way, when testee 10 is subjected to displacement, in displacement process, due to 9 light of second laser beam
The variation of journey so that first laser beam 8 and the interference state of second laser beam 9 also change therewith, start before measuring work, start
Accurate displacement device 7 makes measurement plane speculum 6 generate displacement, the direction of displacement and measured object of the measurement plane speculum 6
The direction of displacement of body 10 on the same line, when photodetector 3 detects most strong constructive interference, stops accurate displacement device
7, and photodetector 3 is counted into clearing, then start to measure the displacement of testee 10 again, in first laser beam 8 and second
In 9 interference state change procedure of laser beam, photodetector 3 records the times N of most strong constructive interference, when testee 10 moves
Terminate, when remaining static, photodetector 3 stops counting；At this point, reflect measurement plane by accurate displacement device 7
Mirror 6 moves on the direction of displacement of testee 10, and observes photodetector 3, when photodetector 3 detects that most strong phase is grown
During interference, stop accurate displacement device 7, and it is the shift value △ L that measurement plane speculum 6 provides to read accurate displacement device 7.
If displacement △ L are identical with the direction of displacement of testee 10, the shift value L=N that testee 10 actually generates
× λ/2+ (λ/2- △ L), wherein △ L ＜ λ/2, λ is optical maser wavelength in formula；
And if displacement △ L and testee 10 direction of displacement on the contrary, if, shift value L that testee 10 actually generates
=N × λ/2+ △ L, wherein △ L ＜ λ/2, λ is optical maser wavelength in formula.
In this way, by said structure, the fractional part △ L of half of optical maser wavelength will be exceeded in 10 actual displacement of testee
Also measure and add in displacement detecting result, so that the displacement knot obtained measured by the laser interferometer of the application
Fruit is more accurate, and precision is higher than half of optical maser wavelength, is specifically dependent upon the displacement accuracy that accurate displacement device 7 can be provided.
Embodiment 2,
As shown in Figure 1, 2, laser interferometer as described in Example 1, the accurate displacement device 7 include support platform 11
With the driving device 12 being arranged in the support platform 11, the support platform 11 is engaged with the testee 10, institute
It states driving device 12 and provides the displacement on 10 direction of displacement of testee, the driving dress for the measurement plane speculum 6
12 are put as Piezoelectric driving device.
In the present embodiment, the Piezoelectric driving device 12 used can convert mechanical energy and electric energy mutually
Ceramic material, the deformation quantity very little generated under electric field action are no more than thousand a ten thousandths of size itself
Micro-displacement has good repetitive distortion recovery capability, and stability is good, precision is high, further improves smart in the present embodiment
The precision of dense bit moving device 7.
Embodiment 3,
As shown in Figure 1, 2, laser interferometer as described in Example 2, the accurate displacement device 7, which further includes, is arranged on institute
State the first displacement piece 13 and the second displacement part 14 being arranged in first displacement piece 13 in support platform 11, the driving
Device 12 is engaged with first displacement piece 13, and the displacement along the support platform 11 is provided for first displacement piece 13,
First displacement piece 13 has one compared with the inclined inclined-plane 15 of its direction of displacement, and the second displacement part 14 is slidably arranged in
On the inclined-plane 15 of first displacement piece 13, make the second displacement part 14 that can be slided along the inclined-plane 15 of first displacement piece 13
It is dynamic, it is closely fitted between first displacement piece 13 and second displacement part 14, the measurement plane speculum 6 is arranged on described the
In two displacement pieces 14, restraint device 16 is additionally provided in the support platform 11, the restraint device 16 limits the second
Part 14 is moved along the movement on 13 direction of displacement of the first displacement piece so that when the first displacement piece 13 is by 12 band of driving device
When moving and generating displacement, the second displacement part 14 is driven by first displacement piece 13 and generates displacement, also, described second
The direction of displacement of displacement piece 14 and the direction of displacement of first displacement piece 13 are perpendicular, the inclined-plane 15 of first displacement piece 13
Angle with its direction of displacement is A degree, preferably 0<A<45.
In embodiment, driving device 12 is engaged with the first displacement piece 13, is provided for the first displacement piece 13 flat along support
The displacement of platform 11, the first displacement piece 13 have one compared with the inclined inclined-plane 15 of its direction of displacement, and the slip of second displacement part 14 is set
It puts on the inclined-plane 15 of the first displacement piece 13, makes second displacement part 14 that can be slided along the inclined-plane 15 of the first displacement piece 13, in precision
When gearshift 7 works, driving device 12 provides certain displacement and promotes the first displacement piece 13, at this point, due to restraint device
16 limitation second displacement parts 14 make the direction of displacement and the of second displacement part 14 along the movement on 13 direction of displacement of the first displacement piece
The direction of displacement of one displacement piece 13 is perpendicular, in this way, the displacement of second displacement part 14 is the first displacement piece with driving device 12
13 displacements provided are related, also related with the angle of its direction of displacement to the inclined-plane 15 of the first displacement piece 13.
That is, if the inclined-plane 15 of the first displacement piece 13 and the angle of its direction of displacement are A degree, when the position that driving device 12 provides
When shifting amount is X, second displacement part 14 is Y=Xtan (A) in the displacement generated in 12 direction of motion of driving device.
Preferably, when included angle A is less than 45 degree, a displacement for being less than X values, when further reducing included angle A, position will be obtained
Shifting amount Y also reduces therewith, so so that in the present embodiment, accurate displacement device 7 by stroke in a manner of changing precision, directly
The precision for improving the present embodiment accurate displacement device 7 is connect, also just further improves the survey of the present embodiment laser interferometer
Accuracy of measurement.
Embodiment 4,
As shown in Fig. 2, laser interferometer as described in Example 3, first displacement piece 13 and the support platform 11
Between be additionally provided with the magnetic magnetic part 17 of tool, the second displacement part 14 has magnetism, the second displacement part 14 and institute
Magnetic part 17 is stated as there is a natural attraction between the sexes state, the second displacement part 14 is an integral structure with the measurement plane speculum 6.Make
The first displacement piece 13 is obtained when being promoted, measurement plane speculum 6 can keep fitting closely with second displacement part 14, ensure this
Apply for the precision of accurate displacement device 7, and then ensure the measurement accuracy of the application laser interferometer, second displacement part 14 and measurement
Plane mirror 6 is an integral structure, that is to say, that a reflecting surface is directly set on second displacement part 14, makes itself shape
Into measurement plane speculum 6, in this way, simplifying the structure of the present embodiment laser interferometer, facilitate debugging and use.
Embodiment 5,
As shown in Figure 1, 2, a kind of measuring method for above-mentioned optical maser wavelength amendment type planar reflector laser interference instrument,
It includes following step：
Step 1：Planar reflector laser interference instrument of the present invention is installed；
Step 2：Measurement plane reflector apparatus 4 is arranged on testee 10；
Step 3：Optical maser wavelength amendment type planar reflector laser interference instrument is debugged, makes to form satisfactory light path, and
And first laser beam 8 is made to be in interference state with second laser beam 9；
Step 4：Start before measuring work, start accurate displacement device 7, measurement plane speculum 6 is made to generate displacement, institute
The direction of displacement of the direction of displacement of measurement plane speculum 6 and testee 10 is stated on the same line, when photodetector 3 is examined
When measuring most strong constructive interference, stop accurate displacement device 7, and photodetector 3 is counted into clearing；
Step 5：Start to measure work, testee 10 starts to move, and photodetector 3 records first laser beam 8 and the
The times N of the most strong constructive interference of dual-laser beam 9；
Step 6：10 displacement of testee terminates, and remains static, and is again started up accurate displacement device 7, puts down measurement
Face speculum 6 generates displacement, and the direction of displacement of the measurement plane speculum 6 is with the direction of displacement of testee 10 with always
On line, when photodetector 3 detects most strong constructive interference again, stop the accurate displacement device 7, make measurement plane anti-
Mirror 6 is penetrated to stop；
Step 7：Read the shift value △ L that accurate displacement device 7 provides for the measurement plane speculum 6；
Step 8：Record the most strong constructive interference times N and measurement plane reflection that photodetector 3 records in measurement process
6 shift value △ L of mirror.
Step 9：Accurate displacement device 7 is again started up, traverse measurement plane mirror 6 makes photodetector 3 record most
The number M, M of strong constructive interference are positive integer, and read corresponding 6 shift value of measurement plane speculum of M times most strong constructive interference
Z.It according to Z=M × λ '/2, draws under current measuring environment, effective wavelength λ '=2Z/M of laser.
Step 10：Calculate the shift value of testee 10.
If displacement △ L are identical with the direction of displacement of testee 10, the shift value L=N that testee 10 actually generates
× λ '/2+ (λ '/2- △ L), wherein △ L ＜ λ '/2, λ ' is laser effective wavelength in formula；
If displacement △ L and testee 10 direction of displacement on the contrary, if, shift value L=N that testee 10 actually generates
× λ '/2+ △ L, wherein △ L ＜ λ '/2, λ ' is laser effective wavelength in formula.
The measuring method of the present embodiment, since 6 shift value △ L of measurement plane speculum to be added to the position of testee 10
The measurement accuracy of 10 displacement of testee is directly enhanced in shifting value.Meanwhile by detecting the effective wavelength λ ' in measuring environment,
The wavelength of laser is modified, so reduces the error that environmental factor is brought, and then further improves the application and swash
The measurement accuracy of optical interferometer.
Embodiment 6,
As shown in Figure 1, 2, measuring method as described in Example 5, the step 4 into step 9, grow by the most strong phase
Interference can also be most weak destructive interference.In the present solution, during measuring, photodetector 3 is that record first swashs
Light beam 8 and the number of the most weak destructive interference of second laser beam 9, so can still obtain a higher testee of precision 10
Shift value L.
Above example is only to illustrate the present invention and not limits technical solution described in the invention, although this explanation
Book is with reference to above-mentioned each embodiment to present invention has been detailed description, but the present invention is not limited to above-mentioned specific implementation
Mode, therefore any modify to the present invention or equivalent substitution；And the technical side of all spirit and scope for not departing from invention
Case and its improvement, should be covered by the scope of the claims of the present invention.
Claims (2)
1. a kind of measuring method using optical maser wavelength amendment type planar reflector laser interference instrument, which is characterized in that it includes
Following step：
Step 1：The optical maser wavelength amendment type planar reflector laser interference instrument is installed；
Step 2：Measurement plane reflector apparatus is arranged on testee；
Step 3：Optical maser wavelength amendment type planar reflector laser interference instrument is debugged, makes to form satisfactory light path, also,
First laser beam is made to be in interference state with second laser beam；
Step 4：Start before measuring work, start accurate displacement device, measurement plane speculum is made to generate displacement, the measurement
The direction of displacement of plane mirror and the direction of displacement of testee on the same line, when photodetector detects most strong phase
During long interference, stop accurate displacement device, and photodetector is counted and is reset；
Step 5：Start to measure work, testee starts to move, photodetectors register first laser beam and second laser beam
The times N of most strong constructive interference；
Step 6：Testee displacement terminates, and remains static, and is again started up accurate displacement device, reflects measurement plane
Mirror generates displacement, and the direction of displacement of the measurement plane speculum and the direction of displacement of testee on the same line, work as light
When electric explorer detects most strong constructive interference again, stop the accurate displacement device, stop measurement plane speculum；
Step 7：It is the shift value △ L that the measurement plane speculum provides to read accurate displacement device；
Step 8：Record the most strong constructive interference times N of photodetectors register and measurement plane speculum position in measurement process
Shifting value △ L；
Step 9：Accurate displacement device is again started up, traverse measurement plane mirror makes photodetectors register most strong mutually long dry
The number M, M related to is positive integer, and reads the corresponding measurement plane mirror displacements value Z of M times most strong constructive interference；According to Z=M
× λ '/2 are drawn under current measuring environment, effective wavelength λ '=2Z/ M of laser；
Step 10：Calculate the shift value of testee；
If displacement △ L are identical with the direction of displacement of testee, actual shift value L=N × λ '/2 generated of testee
+（λ’/2-△L）, wherein △ L ＜ λ '/2, λ ' is laser effective wavelength in formula；
If the direction of displacement of displacement △ L and testee on the contrary, if, actual shift value L=N × λ '/2+ generated of testee
△ L, wherein △ L ＜ λ '/2, λ ' is laser effective wavelength in formula；
The optical maser wavelength amendment type planar reflector laser interference instrument, including lasing light emitter, fixed pan speculum, photodetection
Device, measurement plane reflector apparatus and spectroscope, the measurement plane reflector apparatus include measurement plane speculum and precision
Gearshift, the laser beam that the lasing light emitter projects are divided into first laser beam and second laser beam after the spectroscope, and first
Fixed pan speculum described in laser beam directive, the spectroscope described in directive again after fixed pan speculum reflection, then
The photodetector described in directive after spectroscope, second laser beam is to the measurement plane speculum, through the measurement plane
Spectroscope described in directive again after speculum reflection, the photodetector described in directive after spectroscope, first laser beam and second
Laser beam is interfered in photodetector described in directive, and the measurement plane speculum is arranged on the accurate displacement device
On, the accurate displacement device is arranged on testee, and the accurate displacement device provides for the measurement plane speculum
The displacement in the same direction or reversed with testee displacement.
2. the measuring method as described in claim 1, which is characterized in that the step 4 is into step 9, the most strong phase
Long interference can also be most weak destructive interference.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2108918A1 (en) * | 2008-04-07 | 2009-10-14 | Mitutoyo Corporation | Laser interferometer, measurement method and measurement program |
| CN102490027A (en) * | 2011-12-16 | 2012-06-13 | 深圳市大族激光科技股份有限公司 | Lifting platform |
| CN102645269A (en) * | 2012-05-18 | 2012-08-22 | 山东省科学院海洋仪器仪表研究所 | Sound pressure monitoring device of ocean background noise |
| CN104697442A (en) * | 2015-03-30 | 2015-06-10 | 北方民族大学 | Motion-compensated plane reflection mirror laser interferometer and using method |
| CN104713474A (en) * | 2015-03-30 | 2015-06-17 | 北方民族大学 | Multi-beam ladder plane mirror laser interferometer |
| CN205120038U (en) * | 2015-11-27 | 2016-03-30 | 成都信息工程大学 | Laser wavelength revises formula planar mirror laser interferometer |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11142243A (en) * | 1997-11-13 | 1999-05-28 | Yokogawa Electric Corp | Interferometer and fourier transform-type spectral apparatus using the same |
-
2015
- 2015-11-27 CN CN201510847923.5A patent/CN105333817B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2108918A1 (en) * | 2008-04-07 | 2009-10-14 | Mitutoyo Corporation | Laser interferometer, measurement method and measurement program |
| CN102490027A (en) * | 2011-12-16 | 2012-06-13 | 深圳市大族激光科技股份有限公司 | Lifting platform |
| CN102645269A (en) * | 2012-05-18 | 2012-08-22 | 山东省科学院海洋仪器仪表研究所 | Sound pressure monitoring device of ocean background noise |
| CN104697442A (en) * | 2015-03-30 | 2015-06-10 | 北方民族大学 | Motion-compensated plane reflection mirror laser interferometer and using method |
| CN104713474A (en) * | 2015-03-30 | 2015-06-17 | 北方民族大学 | Multi-beam ladder plane mirror laser interferometer |
| CN205120038U (en) * | 2015-11-27 | 2016-03-30 | 成都信息工程大学 | Laser wavelength revises formula planar mirror laser interferometer |
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