CN105189808B

CN105189808B - Film group, film particle and manufacture method

Info

Publication number: CN105189808B
Application number: CN201380075548.6A
Authority: CN
Inventors: 李亨坤
Original assignee: Individual
Current assignee: Individual
Priority date: 2011-04-26
Filing date: 2013-04-17
Publication date: 2018-03-13
Anticipated expiration: 2033-04-17
Also published as: KR20120121299A; WO2012148192A2; CN105189808A; WO2012148192A3

Abstract

The present invention relates to film group and the film group manufacture method and, film particle and the film particle manufacture method, the film group is included under home state by the coated material of mixing and with least two film layers and more than one layer coated material being mixed between at least two film layers existing for released state, the film layer its maximum length under initial evaporation state is more than 100 times of thin film layer thickness, the ratio between its length of film layer mixed with the coated material and thickness are more than 2 times, the film particle is after the film group removes more than a part for the coated material, manufactured by the process further crushed, the manufacturing issue of the device in look-ahead technique is can solve the problem that according to the present invention, maintenance problem, the pollution problem of film in itself, waste all problems such as the energy.

Description

Film group, film particle and manufacture method

Technical field

The present invention relates to the film group produced by physical vapor deposition method, film particle and manufacture method.

Physical vapor deposition is also referred to as dry type plated film, is the environmentally friendly and harmless method of nature, therefore be compared to wet method It is used in one of the film forming method in various fields.

Background technology

Recently, widely used in every field using nano-particle or particulate to manufacture the technology of product.

Field and product using particulate and its manufacture method are as described below.As the material for manufacturing conductive paste Material is used in manufacture in green product LED core using the particulate being made up of silver-colored (Ag) or copper (Cu) or silver-bearing copper composite bed Pigment, cosmetic material, suncream particle, pigment particles, sintering particle, the electricity mixed in the cement mortar of piece, paint and ink The important materials of pond active material, solar cell, thermoelectric element, insulation component, catalyst particles, nano combined material etc. and In technology.

The content of the invention

The particulate or nano-particle in order to improve its quality and purity and the characteristic to be realized and it is preferred that using passing through The dry type film plating process of physical vapor deposition process.But the dry type film plating process by physical vapor deposition process is largely true Completed in empty container, therefore productivity reduces, and cost uprises.Therefore, used in production building site by chemical wet process Particulate production method rather than the physical vapor deposition method.

When producing particulate by physical vapor deposition method because of unavoidable reason, very low and product the cost of its productivity It is very high, therefore be restricted using field or product.

Two classes are roughly divided into for solving the look-ahead technique of described problem, two class (IN SITU) state all in the original location After the lower film layer for smearing large area or volume, it is discharged to outside vacuum tank, and is crushed, manufactures film group or film Particle.

Technical Analysis is carried out in detailed below.

First, the first kind is the United States Patent (USP) 6398999BI forms such as Avery Dennison Corp, is utilized in the original location under state After the multi-layer thin film layer manufacture film layer to be obtained, using film layer acquisition film group or film particle, as above in order to make Plural layers are made, soluble (or release) film layer is deposited by evaporation coating method between film layer and film layer hands over to manufacture For after the plural layers group of the film layer to be obtained of arrangement multilayer and soluble film layer, it is discharged to outside vacuum tank, Carry out after once crushing, further crushed after being dissolved to dissolve the soluble film layer in solvent, by This obtains film particle.

Second class is the form of United States Patent (USP) 4168986 such as Polaroid Corp, before the film layer to be obtained is deposited, After soluble (or release) film layer is vaporized on above coated base material first in vacuum tank, evaporation is described to be wanted The film layer of acquisition, and in order under state in the original location, separate the film layer from coated material, disengagement chamber is sent to, molten After solubility (or release) film layer of the dissolving evaporation is separated in agent, coated material is re-moved to evaporation Chamber side, soluble film layer and the film layer to be obtained, and the process repeatedly are deposited again, so as to largely produce film grain Son.

Described two mass production methods necessarily improve the productivity of film particle by physical vapor deposition method, and reduce into This, but be actually unable in because of problems with being adapted on production building site or critical constraints.

The first method in look-ahead technique, alternately the film layer to be obtained and soluble film layer and according to Secondary evaporation, and be the mode during one circulates while being deposited, therefore, except for evaporating the film layer to be obtained Outside evaporation source (EVAPORATION SOURCE), there is additionally required for evaporate soluble film layer evaporation source, for supplying The additional dress such as the evaporation supply unit for answering the evaporation source energy and/or the evaporation shield (SHUTTER) that is incorporated into evaporation source Put, therefore the manufacture of vacuum plant and structure are extremely complex and maximize, and the implementation and operation management of process are also highly difficult.

Bigger problem is, for the alternately film layer the to be obtained evaporation and soluble film layer evaporation, it is necessary to Described two materials are evaporated in a cycle period simultaneously.It is inevitable in identical vacuum tank when evaporating two materials simultaneously Inside make the steam phase counterdiffusion of described two materials and interfere, thus cause to contain different materials in each film layer.This Substantially reduce the purity, quality and characteristic of each film layer.

In addition to described problem, the soluble film layer is mainly formed using the high organic matter of vapour pressure, because of institute The pollution of vacuum tank inside and vacuum comb and vacuum pump system etc. caused by stating inorganic matter steam is as time goes by It will gradually become serious, thus can influence total system.

By as above process, when polluting vavuum pump and system because of the pollution sources, damage production completely is eventually resulted in The result of apparatus function.Therefore, the first method needs solve the pollution problem for described device and film and film The problems such as characteristic reduces.

The second method in look-ahead technique, before the film layer to be obtained is deposited, applied first After soluble film layer is deposited above layer base material, has to be deposited above the coated base material of soluble film layer in the evaporation and want The film layer of acquisition, the separation container region for separating film is then delivered to, using designated solvent from the coated base After material separates the film layer to be obtained, the coated base material of separating film layer is retransmitted to evaporation region, repeatedly Evaporation and separation circuit, film particle is collected so as to a large amount of in the separation container for completing the separation circuit.It is described thin Although peplomer production method concept idea is outstanding, there are various problems in implementation process, therefore, because of the manufacture of its device Or operation and product mass defect the problems such as and be difficult to.

Described two mass production methods use the process that soluble film layer is deposited with steam condition, therefore in order to improve The vapour pressure of the solable matter is, it is necessary to be heated to the heating process of high temperature.In order to implement the heating process, it is necessary to increase Heating source is powered, therefore with wasting energy problem.

Bigger problem is, in order to separate the soluble film layer, not only needs that being applied for film layer evaporation will be completed Layer base material is sent to separation container region, alsos for the coated base material for completing thin film separation being retransmitted to evaporated receptacles area Domain, described its vacuum of evaporated receptacles and separation container can be different, but vacuum environment and space needs are identical.Therefore, in order to point Solvent its steam used from the soluble film layer reaches serious level, and is diffused into the evaporated receptacles region and forms For pollution sources, so as to trigger problem in various parts and region.

In order to solve described problem, the present invention provides film group manufacture method, the film group thus manufactured and film particle, For the method raising productivity and quality by not triggering problem above, substantial amounts of film group is produced under state in the original location, and Thus film group and film are manufactured.The method that coated material is inserted between film layer and film layer, it is using removal because of institute The method of pollution problem caused by stating the high vapour pressure of each material, so as to not trigger problem above, and it can obtain thin The film group that film layer and coated material are mixed.

The present invention has the effect that.That is, as with very high quality and characteristic, and environmentally friendly film production Method uses physical vapor deposition method, thus, it is possible to largely supply film group and film with low price.

When manufacturing the film group and film particle, the size, structure and cost of vacuum plant can not only be reduced, also The space needed during production and area can be greatly reduced, therefore being capable of the low economical film of production cost.

When manufacturing the film group and film particle, the quality of product in itself is improved, and greatly reduce vacuum plant Contamination phenomenon and fault rate, the manpower needed during maintenance, part cost and time is greatly reduced.

Brief description of the drawings

Fig. 1 (first) is the state diagram that coated material 3 and film layer 1 are alternately coated with supporting base material 5.

Fig. 1 (second) is the state diagram that coated material 3 is removed in the state of Fig. 1 (first).

Fig. 1 (third) is the state diagram that film layer 1 is pulverized more than 1 time in the state of Fig. 1 (second).

Fig. 2 (first) is the once state diagram of evaporated film layer 1 in the one side of coated material 3.

Fig. 2 (second) is towards the state diagram that push-in film layer 1 is mixed in coated material 3 in the state of Fig. 2 (first).

Fig. 2 (third) is the state diagram of secondary evaporated film layer 1 on coated material 3 under Fig. 2 (second) state.

Fig. 2 (fourth) is that the film layer 1 being further deposited towards push-in in coated material 3 in the state of Fig. 2 (third) is carried out The state diagram of mixing.

Fig. 2 (penta) is the state diagram of evaporated film layer 1 three times on coated material 3 under Fig. 2 (fourth) state.

Fig. 2 (oneself) is that the film layer 1 being further deposited towards push-in in coated material 3 in the state of Fig. 2 (penta) is carried out The state diagram of mixing.

Fig. 2 (heptan) is the state diagram of four evaporated film layers 1 on coated material 3 under Fig. 2 (oneself) state.

Fig. 3 (first) is the state diagram of the film layer 1 that evaporation possesses coated material 3 in supporting base material 5.

Fig. 3 (second) is separating film layer 1 and the state diagram that is collected in other space in the state of Fig. 3 (first).

Fig. 3 (third) is the state diagram of evaporated film layer 1 again on coated material 3 under Fig. 3 (second) state.

Fig. 3 (fourth) be in the state of Fig. 3 (third) separating film layer 1 and collected in other space and Fig. 3 (second) The state diagram that film layer 1 is collected together.

Fig. 3 (penta) is the state diagram of evaporated film layer 1 again on coated material 3 under Fig. 3 (fourth) state.

Fig. 3 (oneself) be in the state of Fig. 3 (penta) separating film layer 1 and collected in other space and Fig. 3 (second) The state diagram that film layer 1 is collected together.

Fig. 4 (first) is that possess the state diagram for having coated base material 7.

Fig. 4 (second) is the state diagram that evaporation has film layer 1 on one of coated base material.

Fig. 4 (third) is the state diagram that separation material 9 is engaged in the film layer of evaporation.

Fig. 4 (fourth) is the state diagram that the film layer of evaporation and separation material separate from coated base material simultaneously.

Fig. 4 (penta) is that evaporation has the state diagram of film layer 1 again on coated base material.

Fig. 4 (oneself) is bonded to the state diagram of separation material in the film layer of evaporation.

Fig. 4 (heptan) is the state diagram that the film layer of evaporation and separation material separate from coated base material simultaneously.

Reference：

1：Film layer, 3：Coated material, 5：Carrier (supporting base material), 7：Coated base material, 9：Separation material

For the optimal morphology to carry out an invention

In order to solve described problem, the film group of a form of the invention, it is included under home state by mixing Coated material and with existing for released state at least two film layers and be mixed between at least two film layers one Layer above coated material, the film layer its maximum length under evaporation state is more than 100 times of thin film layer thickness, with institute It is more than 2 times to state the ratio between its length of film layer and thickness of the mixing of coated material.

The film layer is the film layer formed by physical vapor deposition method (physical vapor deposition), At least a portion of the film layer is formed on the surface of the coated material during evaporation, and at least one in the film layer Layer is after the coated material is further formed at least on other thin film layers under state in the original location, to pass through physical vapor deposition Method is formed more than a part for the coated material further formed, in the coated material further formed At least a portion be by without the process being deposited with steam condition and under state in the original location with keeping described being applied The state of the specified range viscosity of the mobility of layer material applies physics strength to the coated material and conjugated and shape to cause Thickness into, the film layer is less than more than 0.1 nanometer 50 microns, and the coated material is fluidity substance or plastic Property material, at least one surface mass of coated material saturated vapor pressure at 25 DEG C is below 100 supports, is softened simultaneously Point is less than 650 DEG C.

The thickness of film layer described in described its thickness ratio of coated material of the film layer coating time point is thick, and viscosity is More than 10cps, it is blended at least a portion in the coated material between the film layer and is also deposited without with steam condition Process and to keep the state of the mobility of coated material to cause displacement, mixed in the original location under state, be blended in institute The mixed processes for stating the coated material between at least two film layers are at least one layer of film layer shapes in the film layer Into behind the surface of the coated material, state is completed in the original location, and the coated material mixed under the home state is not By the way of coated material is dissolved in solvent, without solvent by least applying physical force to the coated material Amount is mixed, and at least a portion in the film layer of the final film group is crushed as 1/ of size in film vapor deposition process Less than 100 use.

The film group of other forms of the present invention, it is included under home state by the coated material of mixing and to divide From at least two film layers and more than one layer coated material being mixed between at least two film layers existing for state, The film layer its maximum length under evaporation state is more than 100 times of thin film layer thickness, is mixed with the coated material Its length of film layer and the ratio between thickness be more than 2 times.

The film layer is the film layer formed by physical vapor deposition method (physical vapor deposition), At least a portion of the film layer is formed on the surface of the coated material during evaporation, and at least one in the film layer Layer is to form the part in other more than one layer film layer and coated material under state by physical vapor deposition method in the original location The one of the residual fraction (or carrier) for the coated material for separating and exposing from the coated material (or carrier) together The part of coated material more than part or further supplied to the residual fraction (or carrier) of the coated material with On film layer, at least a portion in the coated material further supplied is by being deposited without with steam condition Process and in the original location under state with the state of the specified range viscosity with the mobility for keeping the coated material to institute State coated material application physics strength to supply to cause displacement, the thickness of the film layer is more than 0.1 nanometer 50 microns Hereinafter, the coated material is fluidity substance or plastic material, at least one surface thing of the coated material Matter at 25 DEG C saturated vapor pressure be 100 supports below, while softening point be less than 650 DEG C, the institute of the film layer coating time point State that the thickness of film layer described in coated material its thickness ratio is thick, and viscosity is more than 10cps, is blended between the film layer At least a portion also passes through coated material and described one layer without the process being deposited with steam condition in coated material Above film layer other a part of (or carriers) separation from the coated material and the process collected together, and with it is described thin Film layer is mixed under state in the original location together, the mixing work for the coated material being blended between at least two film layers Sequence is that at least one layer of film layer in the film layer is formed behind the surface of the coated material, and state is complete in the original location Into the coated material mixed under the home state in solvent by the way of coated material is not dissolved, without molten Agent and by applying physics strength to the coated material and the film layer, and by the film layer at least crush once with On mixed, at least a portion in the film layer of the final film group is crushed as 1/ of size in film vapor deposition process Less than 100 use.

The present invention other another forms film group, its be included under home state by the separation material of mixing and with At least two film layers and more than one layer separation material being mixed between at least two film layers existing for released state, The film layer its maximum length under evaporation state is more than 100 times of thin film layer thickness, is mixed with the separation material The ratio between its length of film layer and thickness are more than 2 times.

The film layer is to form the thin of (coating) by physical vapor deposition method (physical vapor deposition) Film layer, at least a portion of the film layer is formed in the part on the surface of coated base material 7 during evaporation, is formed in institute After stating in a part for coated substrate surface, after being engaged in the original location under state with the separation material 9, with the separation material Separated together from the coated base material, at least one layer in the film layer is initially formed on the coated base material After more than one layer film layer engages with the separation material, together with the separation material after the coated base material separates, Re-form on the coated base material and separated under state in the original location, its difference of at least two layers in the film layer Formed in the coated base material and different from the time point of coated base material separation, at least one in the coated base material Part surface is the face of the process at least separated twice after more than one layer film layer described in identical place forming repeatedly, described point From material entered in the original location under state by physics strength rather than evaporation process without the process being deposited with steam condition Row movement and engaged with the film layer, separated also by physics strength together with the film layer from the coated base material, With specified range viscosity with the time point engaged with the film layer and specified material of the period with mobility, the film The bonding force of film layer and the separation material described in the bonding force ratio of layer and the coated base material is weak, the thickness of the film layer Spend for less than more than 0.1 nanometer 50 microns, the separation material is fluidity substance or plastic material, while at least one Surface mass saturated vapor pressure at 25 DEG C is below 100 supports, and softening point is less than 650 DEG C, the mistake engaged with the film layer Using physics strength rather than process is deposited at least a portion during journey and mixing, in the film layer of the film group At least a portion is crushed less than 1/100 for size in film vapor deposition process to use.

The coated base material is the concept different from coated material, and the part for being preferably manufactured as at least surface has Release.Coated substrate material can be the material with release in itself, but can also form one in coated substrate surface Layer above release layer uses.This is in order to which the film layer for being vaporized on the coated substrate surface is separated into material with described When material separates together, process can be easily accomplished.Now, assign the method for release and be not belonging in scope of the invention, can Implemented by known look-ahead technique.The various materials such as aluminium, aluminum oxide epithelium, rubber resin, silica epithelium, Teflon can be used Material, but be not limited thereto.

Film group's manufacture method of other another forms of the present invention, it is included under home state is applied by mixing Layer material and with existing for released state at least two film layers and be mixed between at least two film layers one layer with Upper coated material, the film layer its maximum length under evaporation state is more than 100 times of thin film layer thickness, with the quilt The ratio between its length of film layer of coating material mixing and thickness are more than 2 times.

The manufacture method includes：The step of preparing more than one coated material (plural numbers)；Prepare more than one coatings The step of material (plural number)；The step coated material and coating material being loaded into (load) to vacuum tank；Institute State coated material at least a portion smear formed by the coating material and formed by physical vapor deposition method one layer with The step a of upper film layer；At least one of shape further above in more than one layer of film layer of the step a floating coats Into the step b of (or mobile) coated material；The coated material further formed in the step b or step b2 is at least The step a2 of a part of further more than one layer film layer that coating is formed by the coating material；In the step a2 floating coats More than one layer of film layer at least one of step b2 for forming (or mobile) coated material further above；And The step r of process from the step a2 to step b2 more than twice repeatedly, the coated material be fluidity substance or Plastic material, at the same at least one surface mass at 25 DEG C saturated vapor pressure be 100 supports below, softening point be 650 DEG C with Under, at least when formation further forms (or mobile) coated material in the step b and step b2, the coated material Be by without the process being deposited with steam condition and with the specified range with the mobility for keeping the coated material The state of viscosity, at least formed to coated material application physics strength to cause displacement.

The step a, step b, step a2, step b2 and step r are to complete in the original location under state, are at least blended in institute The mixed processes for stating the coated material between more than two layers film layer are at least one layer of film layer shapes in the film layer Into after on the coated material surface, completed in the original location under state, the coated material mixed under the home state Not by the way of coated material is dissolved in solvent, without solvent by applying physics strength to the coated material Mixed, the thickness of film layer described in described its thickness ratio of coated material of at least described film layer coating time point is thick, glues Spend for more than 10cps.

The manufacture method includes：The step of preparing coated material；The step of preparing more than one coating materials；By institute State coated material and coating material is loaded into step in vacuum tank；Smeared at least a portion of the coated material The step 2a for more than the one layer film layer for being formed by the coating material and being formed by physical vapor deposition method；From the coated Material (or carrier) is separated in more than one layer of film layer of the step 2a floating coats and the coated material at least The step d of a part；In the original location under state, pass through the remaining coated material in the step d (or step d3) Residual part or carrier material further supply the step S of coated material；The coated material further supplied in the step S The step 2a3 for more than the one layer film layer that at least a portion coating of material is formed by the coating material；From the coated material Expect at least one of (or carrier) separation in more than one layer of the film layer and the coated material of the step 2a3 floating coats Partial step d3；And the step 2r of the process from the step S to step 2a3, d3 more than twice repeatedly, the quilt Coating material is fluidity substance or plastic material, while at least one surface mass saturated vapor pressure at 25 DEG C is Below 100 supports, softening point is less than 650 DEG C, and the coated material mixed under the home state with film layer is to keep one The state of secondary flowing above property is moved to change position during specifying, and coated is further supplied in the step S During material, the coated material be by without the process being deposited with steam condition and with keeping the coated material The state of the specified range viscosity of the mobility of material, at least apply physics strength to the coated material to cause displacement, by This is supplied.

The step 2a, step d, step S, step 2a3, step d3 and step 2r are to complete in the original location under state, extremely The mixed processes for the coated material being blended in less between more than two layers film layer are at least one in the film layer After layer film layer is formed on the coated material surface, complete under state, mixed under the home state in the original location Coated material not by the way of coated material is dissolved in solvent, without solvent by the coated material and The film layer applies physics strength and the film layer is crushed at least once and mixed, at least described film layer coating The thickness of film layer described in described its thickness ratio of coated material of time point is thick, and viscosity is more than 10cps.

Film group's manufacture method of other another forms of the present invention, it is included under home state is applied by mixing Layer material and with existing for released state at least two film layers and be mixed between at least two film layers one layer with Upper separation material, the film layer its maximum length under evaporation state are more than 100 times of thin film layer thickness, are separated with described The ratio between its length of film layer of material mixing and thickness are more than 2 times.

The manufacture method includes：The step of preparing coated base material；The step of preparing more than one coating materials；Prepare The step of more than one separation materials；Vacuum is set or is loaded into by the coated base material, coating material and separation material to hold Step in device；Smear and formed by the coating material and by physical vapor deposition side at least a portion of the coated base material The step 3a for more than the one layer film layer that method is formed；More than the one layer film layer of the step 3a floating coats of being bonded with each other and described The step l of separation material；The film layer and separation material being bonded with each other from the separation of coated base material in the step l Step m；After the step m (or step m5) part for the coated base material that the part at least surface is exposed with On more than the one layer film layer that coating is formed by the coating material and formed by physical vapor deposition method again step 3a5； More than the one layer film layer of the step 3a5 floating coats that is bonded with each other and the step 15 of the separation material；From coated base material Separate the step m5 of the film layer and separation material that are bonded with each other in the step 15；And repeatedly more than twice from institute State step 3a5 to step 15, m5 step 3r, the step 3a, step l, step m, step 3a5, step 15, step m5 and Step 3r is to complete in the original location under state, and the separation material mixed under the home state with the film layer is without molten Agent and mixed by applying physics strength, in the mixed process, the film layer and the separation material at least powder It is broken once, the separation material be without the process being deposited with steam condition and in the original location under state by physics strength without It is that evaporation process is moved and engaged with the film layer, is also applied by physics strength together with the film layer from described Layer base material separation, with specified range viscosity with the time point engaged with the film layer and specified thing of the period with mobility The bonding force of film layer and the separation material described in the bonding force ratio of matter, the film layer and the coated base material is weak, institute State that the average thickness of separation material is thicker than the average thickness of the film layer, the thickness of the film layer is more than 0.1 nanometer 50 Micron is following, and the separation material is fluidity substance or plastic material, while at least one surface mass is at 25 DEG C Saturated vapor pressure is below 100 supports, and softening point is less than 650 DEG C, during the process engaged with the film layer and mixing At least a portion be crushed using physics strength rather than evaporation process, at least a portion in the film layer of the film group Used for less than 1/100 of size in film vapor deposition process.

According in film group's manufacture method of other another forms of the present invention, the coated material is the stream under normal temperature Dynamic property material.The coated material is thermoplastic material, in the original location in order to have mobility during specifying under state, and is It is by heating the state heated, also can is the form of the present invention.Described coated material at least a portion is located at Above supporting base material, it can be made as that there is designated shape with independence (free-standing) state as thermoplasticity material.

According to the present invention other another forms film group's manufacture method in, in the step b, step b2, step S In, at least a portion in the coated material further supplied is not from the movement of other places and supplied, but described Film layer through coating cause displacement and positioned at the film layer bottom coated material a part be exposed and again by The coated material of supply.

According in film group's manufacture method of other another forms of the present invention, quilt is further formed in the step b The method of coating material is selected from the method for increase coated material in the film layer of the step a floating coats and will be in the step A part in the coated material of the film layer bottom of rapid a floating coats is moved to the side on the film layer top of step a floating coats One or more of method.

According in film group's manufacture method of other another forms of the present invention, the pulverizing process is in the original location under state Complete, untill the pulverizing process start to finish in specified period, applied what the film layer with the crushing mixed Layer material forms at least one layer of film layer further above.In the present invention, home state refers to what is carried out in film process The state completed in vacuum tank, i.e., under atmospheric pressure state, rested on before unloading the coated material or film layer true State in empty container.

According in the film particle of other another forms of the present invention, the coated material is removed from the film group More than a part, and the size specified to reach further is crushed to obtain.

According to the present invention other another forms film particle manufacture method in, it is enterprising in the film group manufacture method One stepping is about to the step that the film group is unloaded to outside vacuum tank, removed more than a part for the coated material Step and further crushing are the step of specifying size.All film particles obtained in the present invention can enter according to known technology One step provides after with the analysis of particle size and classifying step.

According in film group's manufacture method of other another forms of the present invention, a part in the film layer above is The film layer of multi-ply construction comprising at least two layers other materials.For example, at least one layer of chemical stability of the film layer Chemical stability of one layer higher than other.

According in film group's manufacture method of other another forms of the present invention, the time point of the film layer, institute is being deposited State the surface configuration of coated material as at least two solid figure be in depression the form of portion and/or protuberance, the film Layer (plural number) at least a portion it is formed above be three-dimensional shape.

According in the film group of other another forms of the present invention, the film layer is multi-ply construction, the film of outer surface Layer is the coated material high compared to other film layer chemical stability.

According in the film group of other another forms of the present invention, at least one layer in the film layer is that have to block purple The film of outside line characteristic (absorption and/or reflection function).

According in the film group of other another forms of the present invention, at least a portion in the film layer is ceramic material Material.

According in the film group of other another forms of the present invention, at least a portion in the film layer is cosmetics material Material or tinting dye.

According in the film group of other another forms of the present invention, at least a portion in the film layer is conducting metal Or heat conducting material.

According in the film group of other another forms of the present invention, at least a portion its length in the film layer/wide The ratio of degree is more than 10, with the long banding with form or with designated shape section.Its width of the film of the form and The scale of length is nanoscale or micron order, and this is advantageous for the construction of industry, can manufactured by nano wire etc..

According in film group's manufacture method of other another forms of the present invention, the coated material is formed at what is specified More than the one side of carrier (supporting base material), the carrier (supporting base material) is film or roller or tape loop.

For the form to carry out an invention

When the manufacture method of the explanation present invention, illustrate for each step as the step a, step b, step d have area Not, it will thus be appreciated that the implementation time point of each step is had any different, but each step being arranged in order in each step can be embodied as Rapid to implement region iterative cycles simultaneously, it is advantageous to improve productivity.A form for implementing the process can as above institute State, coated material described in the one side arrangement above in specified carrier, the carrier can be used long film morphology or revolve repeatedly The roller or tape loop turned, but be not limited thereto.

The present invention has the multi-ply construction comprising the film group or film particle and more than two layers other materials, but The film group or film particle that solid is formed can be used in cosmetic material, pigment, coating, medical material, electronic material, catalysis The various fields such as agent particle or cell active materials.Moreover, the useful form as the film, at least one layer of conduction Degree or thermal conductivity are more than other layer electrical conductivities or thermal conductivity.The construction can be each as the actual load of electronic component or distribution etc. Electronics connection unit is planted to use.

The film group of the present invention or film particle its coated material be stream material or plastic material, thus it is described respectively At least a portion in individual film layer is specifying specified period of time point without solvent with regard to that can be separated from each other and mutual position Change.As described above, coated material may be selected from one kind in fluidity substance or plastic material, saturated vapor pressure makes Formation with substantially low vapour pressure to prevent influence physical vapor deposition film.

The mixing refers to the material comprising film layer, coated material and more than the one layer film layer further formed such as The state being neatly laminated shown in Fig. 1 (first) and the shape being mutually mixed as shown in Fig. 2 (heptan) and Fig. 3 (oneself) with chaotic state State.The film layer under initial evaporation state its maximum length be thin film layer thickness less than 100 when, quality can be enhanced, But productivity is substantially reduced without economy, when the ratio between with the length/thickness of film layer under the coated admixture For less than 2 when, be not film (THIN FILM) form but nano-particle (NANO PARTICLE) form, therefore can not produce Present invention film particle to be provided.

In order to produce a large amount of film layers with appointed thickness, it is necessary to distinguish the film layer and film under state in the original location The mixing of coated material between layer, but the mixing of coated material needs not move through steam condition.Because by When the method between film layer and film layer is vaporized under steam condition to be mixed, the steam phase of other each materials Counterdiffusion and mix, produce polluter and reduce the purity and quality of film, and vacuum plant and part can also be triggered The problems such as pollution and raising cost.

Therefore, in order to mix coated material, this hair without steam condition and between the film layer and film layer Bright coated materials'use fluidity substance or plastic material, and suitably using the characteristic of the material and to be separated from each other shape The film layer and film layer is deposited in state.The coated material be fluidity substance especially normal temperature fluidity substance when, without Heating, therefore process is very simple.

But in order that the film layer has three-dimensional shape or designated shape, when the coated material is mobility During material, accurate Adjusting Shape can be restricted.Now, imprinted using heating fluidity substance or thermoplasticity material and use During method, the solid figure of the surface imprint film to be manufactured of the usable mould (MOLD) heated in the coated material Shape, therefore being capable of the continuous production film corresponding with the three-dimensional shape on the mould.

As described above, during using mobility coated material, using evaporization process without be deposited through steam condition Process just can be between the film layer using mechanical force mixing coated material, therefore, it is possible to provide to solve above steam The mutual pollution problem of molecule or the film group of the state manufacture of other problemses.

The process can only be formed after coated material surface at least one layer of film in the film layer and implemented, now It could complete to mix with least one layer of film layer, and completion could keep high productivity under state in the original location.

At least one layer in the film layer is is further formed at least one under the coated material in the original location state Formed after on layer film layer in the coated material surface, could largely produce film, now also should be by physical vapor deposition method Formation could meet the above purpose of the present invention.

The coated material is without using by heating the process being evaporated, but the normal temperature shape preferably in vacuum plant Its saturated vapor forces down under state.Under normal temperature state in vacuum plant, saturated vapor pressure is in the material below 100 supports, is satisfied It is more low better with vapour pressure.Although come when using more than the material of 100 supports as coated material in use, because of physical vapor deposition device Structure and characteristic and it is variant, but cause and seriously ask because hindering the steam of coated material or pollutes the formation of film layer Topic.

The coated material needs to refer at least under state in the original location to move by applying physics strength in periodically Process, it is therefore desirable to using fluidity substance or plastic material, the coated material is softened to may move state Softening point is more low better.

But in order to widen the range of choice of coated material substance, the softening point is preferably less than 650 DEG C.When making When being higher than the coated material of the temperature with softening point, need to consume many energy in order to which temperature is brought up into the softening point, And physical vapor deposition device also for processing high temperature coated material and its structure complicates, therefore tight choosing construction and material.

The coated material that the film layer smears time point is formed as film thickness described in thickness ratio.Coated material Thickness when being formed as the thickness of thin than the film layer, it is necessary to using physical vapor deposition method, use the physical vapor deposition method shape Into coated material, it is the method for departing from scope, and non-in order to implement the structure of this method its physical vapor deposition device It is often complicated, and the process needed is also strict.

In the original location under state, the coated material of the mixing does not include solvent.Most solvent its vapour pressure is very It is high and the reason for as vacuum in pollution vacuum plant, and the numerous parts such as vavuum pump can also be influenceed.Therefore, it is described Coated material causes displacement with the state of no solvent, and is mixed with the film layer.

Finally, less than the 1/100 of the size being at least partly crushed in the film layer of the film group during for process is deposited, As above crushing process it is a part of can in the original location during implement, but can be as needed and after being unloaded to vacuum tank outside Carried out using crushing and sorting special purpose device.

When the viscosity of the coated material is below 10cps, the film layer is difficult to holding under evaporation state and referred to The film morphology of fixed condition, and its thickness will also belong in prescribed limit.

When thin film layer thickness is less than 0.1 nanometer, it is difficult to film layer form is kept, it is described thin when higher than 50 microns Film layer is difficult to be ground into trickle film, and waste of materials, and film vapor deposition expense also increases.The film obtained using conditions above Group under state or is unloaded in the state of vacuum tank outside in the original location, can produce the area of time point compared to evaporation by powder Broken is the film particle of less than 1/100 size.

Industrial utilization possibility

Membrane according to the invention group, film and manufacture method, as the materials'use for manufacturing conductive paste The particulate being made up of silver-colored (Ag) or copper (Cu) or silver-bearing copper composite bed, but also it is used in water of the manufacture in green product LED chip Pigment, cosmetic material, suncream particle, pigment particles, sintering particle, the battery-active mixed in mud, paint and ink The important materials and technology of material, solar cell, thermoelectric element, insulation component, catalyst particles, nano combined material etc. In.

Claims

1. a kind of film group, its be included under home state by the coated material of mixing and with existing for released state at least Two film layers and more than one layer coated material being mixed between at least two film layers, the film layer are being deposited Its maximum length is more than 100 times of thin film layer thickness under state, the final quilt in the state of being mixed with the coated material The ratio between its length of the film layer of crushing and thickness are more than 2 times, it is characterised in that

The film layer is the film layer formed by physical vapor deposition method, and at least a portion of the film layer is formed during evaporation On the surface of the coated material, at least one layer in the film layer is that the coated material enters under state in the original location One step is supplied after at least on other thin film layers, is formed by physical vapor deposition method in the coated further supplied More than a part for material, at least a portion in the coated material further supplied is by without with vaporous The process of state evaporation and in the original location under state with the state of the viscosity with the mobility for keeping the coated material to described Coated material application mechanical force is supplied to cause displacement, and the thickness of the film layer is less than more than 0.1 nanometer 50 microns, The coated material is fluidity substance or plastic material, and at least one surface mass of the coated material is 25 At DEG C saturated vapor pressure be 100 supports below, while softening point be less than 650 DEG C,

In the state of the film layer coating is completed, the thickness of film layer described in described its thickness ratio of coated material is thick, glues Spend for more than 10cps, be blended in the coated material between the film layer at least a portion also without with steam condition The process of evaporation and to keep the state of the mobility of coated material to cause displacement, mixed in the original location under state, mix The mixed processes of coated material between at least two film layers are at least one layer of films in the film layer Layer is formed behind the surface of the coated material, and state is completed in the original location, is mixed under the home state together with film layer The coated material of conjunction is the state that film layer is crushed and mixed out of orderly in coated material in mixed process, no By the way of coated material is dissolved in solvent, in order to cause the coated for the viscosity for remaining able to flowing without solvent The displacement of material and apply mechanical force to the coated material by least and mixed, the film layer of the final film group In at least a portion be crushed less than 1/100 for area in film vapor deposition process to use, the home state is true Keep the state of vacuum inside empty container, i.e., the state film layer or film group not being unloaded to outside vacuum tank.

2. a kind of film group, its be included under home state by the coated material of mixing and with existing for released state at least Two film layers and more than one layer coated material being mixed between at least two film layers, the film layer are being deposited Its maximum length is more than 100 times of thin film layer thickness under state, the final quilt in the state of being mixed with the coated material The ratio between its length of the film layer of crushing and thickness are more than 2 times, it is characterised in that

The film layer is the film layer formed by physical vapor deposition method, and at least a portion of the film layer is formed during evaporation On the surface of the coated material, at least one layer in the film layer is in the original location under state by physical vapor deposition method Formed separated together with a part for coated material from the coated material or carrier in other more than one layer film layer and The residual fraction or the part above of carrier or the residual fraction to the coated material of the coated material exposed Or film layer more than a part for the coated material further supplied of carrier, in the coated material further supplied At least a portion be by without the process being deposited with steam condition and under state in the original location with keeping described being applied The state of the viscosity of the mobility of layer material is supplied, the film to coated material application mechanical force to cause displacement The thickness of layer is less than more than 0.1 nanometer 50 microns, and the coated material is fluidity substance or plastic material, described At least one surface mass of coated material at 25 DEG C saturated vapor pressure be 100 supports below, while softening point be 650 DEG C with Under, in the state of the film layer coating is completed, the thickness of film layer described in described its thickness ratio of coated material is thick, viscosity For more than 10cps, it is blended at least a portion in the coated material between the film layer and is also steamed without with steam condition The process of plating and pass through coated material together with more than the one layer film layer from other parts of the coated material Or carrier separation and the process collected, and mixed in the original location under state together with the film layer, be blended in it is described at least The mixed processes of coated material between two film layers are that at least one layer of film layer in the film layer is formed in institute Behind the surface for stating coated material, state is completed in the original location, and the coated material mixed under the home state does not use The mode of dissolving coated material in solvent, in order to cause the coated material for the viscosity for remaining able to flowing without solvent The displacement of material and the film layer and by applying mechanical force to the coated material and the film layer, and by the film Layer is at least crushed more than once and mixed, and at least a portion in the film layer of the final film group is crushed steams for film Less than the 1/100 of area uses in plating process, and the home state is the state that vacuum is kept inside vacuum tank, i.e., not State film layer or film group being unloaded to outside vacuum tank.

3. a kind of film group, it is included under home state by the separation material of mixing and with existing for released state at least two Layer film layer and more than one layer separation material being mixed between at least two film layers, the film layer is in evaporation state Its lower maximum length is more than 100 times of thin film layer thickness, is finally crushed in the state of being mixed with the separation material The ratio between its length of film layer and thickness are more than 2 times, it is characterised in that

The film layer is that the film layer of coating is formed by physical vapor deposition method, at least a portion of film layer during evaporation Formed in the part on coated base material (7) surface, after being formed in a part for the coated substrate surface, After being engaged under home state with the separation material (9), separate and receive from the coated base material together with the separation material Collection at least accumulates more than two layers so as to form film group with the film layer that separation material mixes in the film group, At least one layer in the film layer is that more than one layer film layer being initially formed on the coated base material separates with described After material engagement, together with the separation material after the coated base material separates, re-formed in the original location under state in institute State on coated base material and separated, at least two layers in the film layer its be respectively formed at the coated base material and from The time point of the coated base material separation is different, and at least a portion surface in the coated base material is at least to exist twice repeatedly The face of the process separated after more than one layer film layer described in identical place forming, the separation material are without with steam condition The process of evaporation and in the original location under state by mechanical force rather than evaporation process move engage with the film layer, and also Separated, had untill completion is engaged with the film layer from the coated base material together with the film layer by mechanical force The material of the viscosity of mobility is kept, film layer described in the bonding force ratio of the film layer and the coated base material and described point Weak from the bonding force of material, the thickness of the film layer is less than more than 0.1 nanometer 50 microns, and the separation material is mobility Material or plastic material, while at least one surface mass saturated vapor pressure at 25 DEG C is that softening point is below 100 supports Less than 650 DEG C, at least a portion during the process engaged with the film layer and mixing uses so that separation material is moved Dynamic mechanical force rather than evaporation process, at least a portion in the film layer of the film group are crushed as film vapor deposition process Less than the 1/100 of middle area uses, and the home state is the state that vacuum is kept inside vacuum tank, i.e., not by film Layer or film group are unloaded to the state outside vacuum tank.

4. film group according to any one of claim 1 to 3, it is characterised in that at least one layer in the film layer It is with the film for blocking characteristic ultraviolet.

5. film group according to any one of claim 1 to 3, it is characterised in that the film layer is multi-ply construction, outside The film layer on surface is the coated material high compared to other film layer chemical stability.

6. film group according to any one of claim 1 to 3, it is characterised in that at least one in the film layer It is selected from one or more of metal material, semi-conducting material, ceramic material.

7. film group according to any one of claim 1 to 3, it is characterised in that at least one in the film layer It is divided into cosmetic material or tinting dye.

8. film group according to any one of claim 1 to 3, it is characterised in that at least one in the film layer It is divided into conducting metal or or heat conducting material.

9. film group according to any one of claim 1 to 3, it is characterised in that at least one in the film layer The ratio for dividing length/width is more than 10, with the long banding with form or with designated shape section.

10. a kind of film group manufacture method, it is included under home state by the coated material of mixing and with released state Existing at least two film layers and more than one layer coated material being mixed between at least two film layers are described thin Film layer its maximum length under evaporation state is more than 100 times of thin film layer thickness, in the shape mixed with the coated material The ratio between its length of film layer finally pulverized and thickness are more than 2 times under state, it is characterised in that

The manufacture method includes：The step of preparing more than one coated materials；The step of preparing more than one coating materials； The step coated material and coating material being loaded into vacuum tank；In at least a portion of the coated material Smear the step a for more than the one layer film layer for being formed by the coating material and being formed by physical vapor deposition method；In the step At least one of step b for supplying coated material further above in more than one layer of film layer of rapid a floating coats；Institute State one layer that the further coating of at least a portion for the coated material further supplied in step b is formed by the coating material The step a2 of above film layer；Enter one above at least a portion in more than one layer of film layer of the step a2 floating coats Step forms the step b2 of supply coated material；And repeatedly more than twice process from the step a2 to step b2 the step of R, the coated material is fluidity substance or plastic material, while at least one surface mass saturation at 25 DEG C is steamed Vapour pressure is below 100 supports, and softening point is less than 650 DEG C, is at least further formed and is applied in the step b and step b2 in formation During layer material, the coated material be by without the process being deposited with steam condition and with keeping the coated The state of the viscosity of the mobility of material, at least formed to coated material application mechanical force to cause displacement,

The step a, step b, step a2, step b2 and step r are to complete in the original location under state, are at least blended in described two The mixed processes of coated material between layer above film layer are that at least one layer of film layer in the film layer is formed After on the coated material surface, completed in the original location under state, the quilt being mixed together under the home state with film layer Coating material is the state that film layer is crushed and mixed out of orderly in coated material in mixed process, is not used The mode of dissolving coated material in solvent, mixed without solvent by applying mechanical force to the coated material, The thickness of film layer described in described its thickness ratio of coated material is thick at least in the state of the film layer coating is completed, viscosity For more than 10cps, the home state is the state that vacuum is kept inside vacuum tank, i.e., does not unload film layer or film group The state being downloaded to outside vacuum tank.

11. film group manufacture method according to claim 10, it is characterised in that enter one in the step b, step b2 Walk at least a portion in the coated material of supply be not from other places are mobile and supply, it is but described through coating Film layer causes displacement and is located at the quilt that a part for the coated material of the film layer bottom is exposed and is supplied again Coating material.

12. a kind of film group manufacture method, it is included under home state by the coated material of mixing and with released state Existing at least two film layers and more than one layer coated material being mixed between at least two film layers are described thin Film layer its maximum length under evaporation state is more than 100 times of thin film layer thickness, in the shape mixed with the coated material The ratio between its length of film layer finally pulverized and thickness are more than 2 times under state, it is characterised in that

The manufacture method includes：The step of preparing coated material；The step of preparing more than one coating materials；By the quilt Coating material and coating material are loaded into the step in vacuum tank；Smeared at least a portion of the coated material by institute State the step 2a for more than the one layer film layer that coating material is formed and formed by physical vapor deposition method；From the coated material Or carrier separates at least a portion in more than one layer of the film layer and the coated material of the step 2a floating coats Step d；In the original location under state, pass through the residual part or carrier material of the remaining coated material in the step d Further supply the step S of coated material；At least a portion for the coated material further supplied in the step S applies The step 2a3 for more than the one layer film layer that layer is formed by the coating material；From the coated material or carrier separation in institute State more than one layer of film layer of step 2a3 floating coats and the step d3 of at least a portion in the coated material；And The step 2r of the process from the step S to step 2a3, d3, the coated material are mobility more than twice repeatedly Material or plastic material, while at least one surface mass saturated vapor pressure at 25 DEG C is that softening point is below 100 supports Less than 650 DEG C, the coated material mixed under the home state with film layer is to keep once the state of flowing above property Move to change position, when coated material is further supplied in the step S, the coated material is by not By the process that is deposited with steam condition with the state of the viscosity with the mobility for keeping the coated material, at least to The coated material applies mechanical force to cause displacement, is thus supplied,

The step 2a, step d, step S, step 2a3, step d3 and step 2r are to complete in the original location under state,

The mixed processes for the coated material being at least blended between more than two layers film layer are in the film layer After at least one layer of film layer is formed on the coated material surface, completed in the original location under state, under the home state The coated material of mixing in solvent by the way of coated material is not dissolved, without solvent by the coated Material and the film layer apply mechanical force and the film layer is crushed at least once and mixed, at least described in completion The thickness of film layer described in described its thickness ratio of coated material is thick in the state of film layer coating, and viscosity is more than 10cps, institute It is the state that vacuum is kept inside vacuum tank to state home state, i.e., film layer or film group is not unloaded to outside vacuum tank The state in portion.

13. film group manufacture method according to claim 12, it is characterised in that further supplied in the step S The coated material at least a portion be not but the film layer through coating from other places are mobile and supply Cause displacement and be located at the coated material that a part for the coated material of the film layer bottom is exposed and is supplied again Material.

14. film group manufacture method according to claim 12, it is characterised in that the pulverizing process is state in the original location Lower completion, untill the pulverizing process start to finish in specified period, in the quilt that the film layer with the crushing mixes Coating material forms at least one layer of film layer further above.

15. film group's manufacture method according to claim 10 or 12, it is characterised in that the coated material is in normal temperature It is free-flowing material down.

16. film group's manufacture method according to claim 10 or 12, it is characterised in that the coated material is formed at It is more than the carrier or the one side of supporting base material specified, the carrier or supporting base material in film, roller, tape loop it is a kind of with On.

17. a kind of film group manufacture method, it is included under home state is deposited by the separation material of mixing with released state At least two film layers and more than one layer separation material being mixed between at least two film layers, the film layer Its maximum length is more than 100 times of thin film layer thickness under evaporation state, in the state of being mixed with the separation material most The ratio between pulverized its length of film layer and thickness are more than 2 times eventually, it is characterised in that

The manufacture method includes：The step of preparing coated base material；The step of preparing more than one coating materials；Prepare a kind of The step of above separation material；The coated base material, coating material and separation material are set or be loaded into vacuum tank The step of；Smear and formed by the coating material and by physical vapor deposition method shape at least a portion of the coated base material Into more than one layer film layer step 3a；Be bonded with each other the step 3a floating coats more than one layer film layer and the separation The step l of material；The step of film layer and separation material being bonded with each other in the step l being separated from coated base material m；The coated base material that the part at least surface is exposed after the step m a part more than again coating by institute State the step 3a5 for more than the one layer film layer that coating material is formed and formed by physical vapor deposition method；Be bonded with each other the step More than one layer film layer of rapid 3a5 floating coats and the step 15 of the separation material；Separated from coated base material in the step The step m5 of the film layer and separation material that are bonded with each other in 15；And repeatedly more than twice from the step 3a5 to step Rapid 15, m5 step 3r, the step 3a, step l, step m, step 3a5, step 15, step m5 and step 3r are in original Completed under the state of position, the separation material mixed under the home state with the film layer is without solvent and by institute State film layer and separation material applies mechanical force and mixed, in the mixed process, the film layer and the separation material Material at least crushes once, and the separation material is to pass through machinery under state in the original location without the process being deposited with steam condition Power rather than evaporation process move and engaged with the film layer, also by mechanical force together with the film layer from described Coated base material is separated and collected so as to form film group, with the film layer that separation material mixes in the film group At least accumulate more than two layers, the separation material is with the viscosity with mobility untill completion is engaged with the film layer The bonding force of film layer and the separation material described in the bonding force ratio of material, the film layer and the coated base material is weak, The average thickness of the separation material is thicker than the average thickness of the film layer, and the thickness of the film layer is more than 0.1 nanometer Less than 50 microns, the separation material is fluidity substance or plastic material, while at least one surface mass is at 25 DEG C Lower saturated vapor pressure is below 100 supports, and softening point is less than 650 DEG C, the process of the process engaged with the film layer and mixing In at least a portion be crushed using mechanical force rather than evaporation process, at least a portion in the film layer of the film group Used for less than 1/100 of area in film vapor deposition process, the home state is the holding vacuum inside vacuum tank State, i.e., the state not being unloaded to film layer or film group outside vacuum tank.

18. film group's manufacture method according to any one of claim 10,12 and 17, it is characterised in that the film A part in layer is above is the film layer of the multi-ply construction comprising at least two layers other materials.

19. film group's manufacture method according to any one of claim 10,12 and 17, it is characterised in that in evaporation institute State the time point of film layer, the surface of the coated material or coated base material includes with designated shape the solid figure at least two Be in depression portion and/or protuberance, and at least a portion in the film layer formed above is three-dimensional shape.

20. a kind of film particle, it is characterised in that from the institute manufactured by the film group manufacture method of claim 10 or 12 State film group to remove more than at least a portion of the coated material, and further crushed the size specified to reach and come Obtain.

21. a kind of film particle, it is characterised in that described thin from being manufactured by film group manufacture method described in claim 17 Film group removes more than at least a portion of the separation material, and is further crushed the size specified to reach to obtain.

22. a kind of film particle manufacture method, it is characterised in that further comprise：Will be any in claim 10,12 and 17 The film group manufactured in by the film group manufacture method is unloaded to step outside vacuum tank, removes the quilt The step of at least a portion of coating material or separation material and further crushing are the step of specifying size.