CN104144796A - Security label and a method for the production thereof - Google Patents
Security label and a method for the production thereof Download PDFInfo
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- CN104144796A CN104144796A CN201380012081.0A CN201380012081A CN104144796A CN 104144796 A CN104144796 A CN 104144796A CN 201380012081 A CN201380012081 A CN 201380012081A CN 104144796 A CN104144796 A CN 104144796A
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- laser lithography
- optically variable
- variable element
- metal layer
- carrier
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/405—Marking
- B42D25/41—Marking using electromagnetic radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
- B42D25/29—Securities; Bank notes
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
- G09F3/0291—Labels or tickets undergoing a change under particular conditions, e.g. heat, radiation, passage of time
- G09F3/0294—Labels or tickets undergoing a change under particular conditions, e.g. heat, radiation, passage of time where the change is not permanent, e.g. labels only readable under a special light, temperature indicating labels and the like
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- B42D2033/24—
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
- G09F2003/0276—Safety features, e.g. colour, prominent part, logo
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- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Manufacturing & Machinery (AREA)
- Accounting & Taxation (AREA)
- Business, Economics & Management (AREA)
- Finance (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Credit Cards Or The Like (AREA)
Abstract
The invention relates to a forgery-proof carrier (1) having at least one metallized layer (2), into which at least one optically variable element (6) is introduced, the at least one optically variable element (6) having a non-individual embossed structure (A), wherein the at least one optically variable element (6) has an individual laser-lithographic structure (B) with a resolution of less than 20 [mu]m.
Description
Technical field
The present invention relates to a kind of false proof carrier limiting according to the aforementioned characteristic of claim 1, and a kind of method of producing false proof carrier.
Background technology
To the false proof protection for product, file and evaluation, use optically variable element.Optically variable element includes the structure that resolution ratio is very high, and it can produce special optical effect.Such structure is difficult to copy, and conventionally cannot manufacture by common printing technology.Optically variable element can comprise the structure that bore hole is visible and verify, also can comprise the structure of available simple or special fetch equipment check.Optically variable element is known, and can use according to various ways.Optically variable element comprises, for example, and hologram, striograph (cinegram) and photoetching figure (lithograms).The structure comprising in optically variable element can be hologram, special rainbow hologram (special rainbow hologram), transmission hologram, reflection hologram, two-dimensional hologram, three-dimensional hologram, fourier hologram, Fresnel hologram, volume hologram and kino hologram (kinoforms).Such hologram directly optics produces, or available computers is calculated.In addition, can comprise diffraction structure, particularly diffraction grating.Can comprise refraction structure, as Fresnel lens or flash of light grating.Can comprise dispersing element, as scatterer.In document, describe numerous other and can be included in the structure in optically variable element.Various structures can partly overlap, to the effect of two or more can be provided in the same area of optically variable element.Various structures can be for being configured to graphic elements, and for example guilloching, identifies image, line, face etc.Also can further configure character element, such as letter, numeral or alphanumeric sequence number, micro explanation (microscripts).Also further configuration feature element, as bar code or other machine-readable structure.Various structures and element be with suitable Combination of Methods, forms the global design of varying optical elements, the security of As soon as possible Promising Policy varying optical elements,, all requirements such as functional and aesthetic impression.
Optically variable element can be manufactured with replica technique (replication process).For this reason, elaborate a main knurling mould with special global design.Main knurling mould like this can be manufactured by beamwriter lithography method or by dot matrix (dot-matrix method), in this case, can realize high resolution ratio.The in the situation that of beamwriter lithography method, can realize the little resolution ratio to several nanometers.The in the situation that of dot matrix or other interference technique, can produce the little diffraction grating to hundreds of nanometer grating constant.Can produce duplicate knurling mould from main knurling mould thus, and can further by it, produce duplicate knurling mould.Then, in moulding process, use this knurling mould to impress a large amount of optically variable elements.In such imprint process, the optically variable element producing is all the same substantially.
EP0420261B1 is immediate prior art, and it discloses a kind of method, wherein, by the difference at imprint process, modify, introduce personalized measure, so that optically variable element prepared by imprint process is safer, and in optically variable element, introduce additional data.By this way, batch information or sequence number information can be added in this optically variable element.Yet described personalized method is restricted and relate to the destruction, bridge joint (bridging) of specific region in former design or stop using, because original design cannot be passed through above-mentioned measures to reform.Particularly, by described personalized method, can not produce the absolute construction of holography, diffraction or other optically-variables.
Summary of the invention
The object of the invention is to make carrier to there is better anti-counterfeit capability, and their production method is provided.
About goods, this object is to realize by having the false proof carrier of the feature of claim 1.Preferred improvement is the theme of goods dependent claims.
False proof carrier according to the present invention can have multiple structure.Especially, it can be configured to self-adhesive label or be heat seal mateiral.The shape of described label shape or heat seal mould can be any required shape, for example circular, ellipse, polygon, fillet polygon etc.The in the situation that of heat seal mateiral, global design also can be configured to rectangular band shape, is sealed in the whole length of substrate.This band can pass through landing card, transportation season ticket or banknote and known.Surprisingly, have been found that working as this optically variable element has dependent patterned structure, and when described at least one optically variable element also has resolution ratio and is less than the independent laser lithography structure of 20 microns, the anti-forgery security of the carrier of described optically variable element can improve.False proof carrier according to the present invention comprises at least one metal layer, and preferably, described dependent patterned structure and independent laser lithography structure are introduced in identical metal layer.By introduce in combination dependent patterned structure and independent laser lithography structure in same optically variable element, it is copied to the quite difficulty that becomes.
For this reason, the resolution ratio of described photolithographic structures, for being less than 20 microns, is preferably less than 5 microns.In this case, the resolution ratio that is less than 20 microns or 5 microns means that this construction package has the development length that is less than 20 microns or 5 microns, and is less than the distance to each other of 20 microns or 5 microns.Preferably on each assembly, observe these development lengths and spacing, but at least on a plurality of assemblies, observe these development lengths and spacing.In the situation that pixel being incorporated into described metal layer by laser, this resolution ratio means that the diameter of single pixel should be less than 20 microns or 5 microns, and pixel spacing to each other should be less than 20 microns or 5 microns.
Term carrier should be by broad understanding in the application, and can comprise deformable band, banded multilayer film particularly, adhesive tape, but also runner band.
Varying optical elements or a plurality of varying optical elements are along described carrier and preferably along described carrier layout.Preferably, described carrier is discerptible between described optically variable element, make each independent optically variable element can be again as can adhesive bond or thermosealed label, holographic point (holospot) etc.
As the base material of carrier, particularly can use metalized film or metalized coated.In this case, can first impress, then metallization, vice versa.The burr of impression can be impressed into metal layer.This metal layer is not stamped destruction, and as reflecting layer, so that the light by patterned structure diffraction is reflected back in space.
In many application, for example, in order to increase security, what may wish is partly de-metallization of metal layer.In the situation that the optically variable element of impression, this independently completes in the second technique mutually with impression conventionally.
DE3430111 C1 has described such process.Before metallization, can partly apply a release layer, it washes off together with metal layer after metallization.In the position that does not apply release layer, metal is retained.The metal level exact matching terrestrial reference level pressure India side that can produce relatively described part de-metallization here, to difficulty.In addition the personalization of this de-metallization is not described.Owing to applying described release layer by typography in these methods, the resolution ratio of the method is limited.Typically, realized the minimum of a value of 20 microns.
By DE4131964 A1, the independently possibility of de-metallization has been described.Here, use laser grooving and scribing method to make independently the metal level de-metallization of hologram.Yet in the method, holography, diffraction or other optically-variable absolute construction can not be generated by laser beam.In addition, the resolution ratio of such laser grooving and scribing method when de-metallization is limited.Typically, realized the minimum of a value of 20 microns.
In directly producing optically variable element, to personalization without any restriction.In this case, this optically variable element is not to be manufactured by replica technique, but is introduced directly in target substrate or intermediate product.For example, this can complete by the light-sensitive surface that exposes separately in later step.Another example is high-resolution laser photoetching technique, wherein, under laser beam auxiliary, the structure of expectation is introduced directly into laser-sensitive layer.In this case, there are the follow-up improved method of needs and optically variable element not to need again further improved those methods.In this case, high-resolution laser photoetching process can distinguish with conventional laser scribing method, because only have high-resolution laser photoetching technique, is likely to realize very little physical dimension, so that use exposure structure to become possibility as optically variable element.Below, will be only with reference to high-resolution laser photoetching technique, wherein, base resolution and physical dimension, for being less than 20 microns, are preferably less than 5 microns.
In laser lithography method, structure to be exposed is transferred to substrate by means of laser beam.This structure to be exposed is predetermined or calculating through computer installation, and exist in the mode of image or vector data.Laser stepper is controlled laser beam with respect to the position of described substrate with described image or vector data, and controls intensity and the action time of inciding laser beam in substrate.In laser lithography, established several different methods.For example, writing light beam can be fixed in space, and substrate can move with respect to this.Also substrate can be fixed in space, and write light beam and move with respect to substrate.In addition can be also that substrate and described laser beam all move.Also can regulate and write light beam with flat light modulator, thereby expose relatively large area of base simultaneously.Same principle, writes light beam and substrate is removable.
In laser lithography, resolution ratio is to be limited by used wavelength and the optical principle of using.In order to produce the structure of the resolution ratio with maximum possible, preferably use short wavelength.Suitable wavelength is in the scope of 0.2 micron to 10 microns, preferably in the scope of 0.2 micron to 1 micron.Shorter wavelength is possible equally.Use these wavelength, can be created in effective structure in visible-range (wavelength is approximately 0.4 micron to 0.7 micron).Therefore, it can produce the diffraction grating of the grating constant of visible ray magnitude, and it has the large angle of diffraction, therefore can perceive particularly well.Hologram also has the corresponding large angle of diffraction.Preparing optically variable element can only use high-resolution laser photoetching technique, and in this case, base resolution must be less than 20 microns, is preferably less than 5 microns.
Due to this manufacture method, the optical element that use laser lithography is manufactured is personalized designs completely.All structures can separate configurations.This can by the auxiliary of numerical value or alphanumeric sequence number or by graphic element independently, for example image or guilloching complete.
As the base material of Laser lithography, the in the situation that of embossing optically variable element, particularly use metalized film or metalized coated.In this case, will adjust wavelength, intensity, pulse length, shape and the write energy of laser beam, so that the specific precalculated position of base material de-metallization, and therefore become transparent or semitransparent.This is by ablation (ablating) metal level, by carrying out towards described exposure position edge moving metal layer or by described metal level is changed into transparent or semitransparent oxide skin(coating).Also may there is the mixing of above-mentioned three kinds of effects.De-metallization can be directed with respect to other structure exact matching ground being produced by laser lithography, because they can introduce in identical exposure process.Due to the Laser lithography in the situation that, de-metallization occurs with high-resolution laser photoetching process in principle, therefore can produce high-resolution de-metallization structure.These comprise micro description (microscripts), diffusing structure, gray value or GTG wedge (gray step wedges).Such gray value can be produced by suitable rasterizing (rastering) in halftoning method, and in some regions, this halftoning method only becomes grating at a part of de-metallization in this region.The in the situation that of GTG wedge, by comply with rasterizing in this region, increase gradually de-metallization surface ratio.
The in the situation that of Laser lithography, except complete de-metallization, also can reduce metal layer thickness by the laser energy of introducing in accurate adjustment ablation process.By reducing metal layer thickness, the light transmittance of metal level increases.Gray value or GTG wedge also can produce in this way.
By high-resolution laser photoetching, producing optically variable element is limited definitely.For example, base resolution is limited by the used optical principle that swashs light wavelength and use that writes.Due to high writing rate and the object of the high yield therefore obtaining be to realize producing in enormous quantities, expectation further reduces resolution ratio because like this, the larger region of just can exposing in the short period of time.The typical base resolution of using is in this case 0.5 micron to 5 microns.In laser lithography, therefore can suppose limited resolution ratio.For producing diffraction structure, for example grating or hologram, due to this limited resolution ratio, the not every angle of diffraction can realize.In addition, the phase place or the Modulation and Amplitude Modulation that by laser lithography, in material, realize are unsatisfactory, therefore, do not reach the theoretical maximum diffraction efficiency of diffraction structure.
According to the present invention, have been found that restriction that embossing optically variable element is suffered and the suffered restriction of optically variable element of laser lithography manufacture are part complementations.For example, embossing optically variable element can not be personalized completely straight from the shoulder, and the optically variable element that laser lithography is manufactured can.Embossing optically variable element can only be in the second processing step de-metallization, and the optically variable element that laser lithography is manufactured can exact matching ground exposure and de-metallization in a technique.The de-metallization of embossing optically variable element carries out with low resolution ratio, and de-metallization in laser lithography technique can be undertaken by the complete resolution ratio of this technique.The optically variable element of laser lithography manufacture is normally subject to the restriction of limited resolution ratio, and embossing optically variable element does not have such restriction.In addition, they are subject to the restriction of limited diffraction efficiency conventionally, and can obtain very high diffraction efficiency with optically variable element.
According to the present invention, have been found that existence had both been suitable for the base material that embossing optically variable element is also applicable to the optically variable element of laser lithography manufacture.This material is metalized film or the coating of composite bed.In order to allow efficient laser lithography coating, optical thickness (OT) should be as much as possible little.On the other hand, when OT hour, corresponding the tailing off of degree of reflection of metal layer.The described scope of having found applicable OT is 0.1 to 10, is preferably 0.8 to 3.
With regard to the method, by thering is the method for claim 11 feature, can realize this object.Preferred improvement is the theme of dependent claims.
According to the present invention, dependent patterned structure is impressed into the metal level of carrier, and by means of laser by laser lithography exposure structure to metal layer.The described photolithographic structures that exposure produces has the resolution ratio that is less than 20 microns, be preferably less than 5 microns, and patterned structure forms at least one optically variable element together with photolithographic structures.But, also can consider 1 micron or less high-resolution.
In the preferred embodiment of the present invention, optically variable element is impressed in the first processing step, and laser lithography exposure in the second processing step.In another embodiment of the invention, by the laser lithography exposure in the first processing step of described optically variable element, and impress in the second processing step.In another embodiment of the invention, first described optically variable element is impressed, with after-applied (preferably can adhesive bond or sealing) to goods, and laser lithography exposure in further processing step subsequently.In this case, described goods may be, for example, and product, the packing of product, sign, bank note, file, plastic cards, film or label.
As the base material of the optically variable element relevant with the present invention, suitable is not only can impress but also material that can laser lithography exposure.Especially, these are metalized coated or film, polymer film particularly, PET for example, PMMA, PVC, BOPP.Preferably, in composite bed, wherein there is other layer in described metalized coated or film, for example further coating or film, especially thin polymer film or adhesive phase, for example acrylic ester adhesive mixed thing or hotmelt.Base material preferably has at least label material of one deck adhesive phase.In another preferred embodiment, base material is a kind of heat-sealing film that contains metal layer and hotmelt.In another preferred embodiment, base material is the cold seal film that comprises metal layer.The metallization of described coating or film can be by evaporation, sputter or by printing and produce with metallic pigments China ink.This metallization can be on the surface of base material, or also can be positioned at inside.
According to the present invention, the processing of the impression of this optically variable element is carried out with a kind of dependent global design, and it is structure massive duplication and that particularly can contain all known embossing optically variable elements.This dependent global design is called as patterned structure.
The global design of laser lithography exposure can comprise structure static, that repeat and structure sequence, that change, for example numeral or alphanumeric sequence number, the hologram of this sequence number or individual volume graphic.The global design of described laser lithography exposure also can contain the region that de-metallization or de-metallization are grating.The global design of laser lithography exposure is called laser lithography structure.
According to the present invention, described dependent patterned structure forms at least one optically variable element together with described independent laser lithography structure.In this case, described patterned structure and described laser lithography structure or its independent region, the layout that can be spatially separated from each other.In addition, described patterned structure and described laser lithography structure or its independent region, layout that can be partially or completely overlapping.In addition, described patterned structure and described laser lithography structure or its independent region, can be alternate mixed or arrange across.
Rely on of the present inventionly, can produce a kind of optically variable element, its comprise the structure that can only be manufactured by impression specially and the structure that can only be manufactured by laser lithography specially both.By the combination of this patterned structure and laser lithography structure, independently structure can be with graphics mode and logical course combination.Independently structure can complement each other.Because laser lithography provides the possibility of de-metallization, the isolated area of this patterned structure can destroy individually.
Combination by this patterned structure and laser lithography structure, can form new structure, and the traditional optical variable element that this structure can not never be produced according to the inventive method is learnt.For example, by being used in the de-metallization of resolution ratio high as far as possible in laser lithography, the structure of patterned structure can partially or completely be destroyed.This destruction can be carried out separately.Because described de-metallization has high resolution ratio, can in de-metallization, use rasterizing, this patterned structure is destroyed gradually in these positions.Particularly, by rasterizing, likely when de-metallization, produce a kind of gamma characteristic (gray profile), make thus described patterned structure produce gamma characteristic, this is that the perceptible gradual change of a kind of human eye transforms.This structure cannot be prepared by conventional method.Except rasterizing, also can realize gray value or the gamma characteristic in de-metallization by being modulated at controllably the laser power of using in laser lithography exposure.Another example of new construction is meticulous diffraction structure, for example line or point, and it has high-diffraction efficiency and any required angle of diffraction, and it can be independently.In this case, the predetermined diffraction region of embossed designs is de-metallization substantially, makes to only have fine structure to retain.The metallization fine structure of these reservations can have very high diffraction efficiency and any required angle of diffraction, because these two factors are determined by impression, and because they are produced by laser lithography, can be independently and high-resolution.High-resolution laser lithography is given described structure fineness, and its resolution ratio is significantly higher than the resolution ratio of other de-metallization method.
A kind of preferred embodiment in, the exposure of described laser lithography can impress accurately relatively to be carried out ordinatedly.This can realize under the following conditions,, if in the making of optically variable element, first impressed, carries out subsequently laser lithography that is.Accurate cooperation can guarantee by the special measure in laser lithography, for example, by detected the feature of precreping structure by trigger sensor or video camera, guarantees accurate cooperation.Such feature can be included embossed designs specially in, to realize highly accurately, coordinates.Because in mass transport, laser lithography has pinpoint accuracy and navigation accuracy (guide fidelity) conventionally, and laser lithography design does not have the requirement of exception with respect to the accurate orientation that coordinates of described embossed designs to laser lithography.Can realize the exact matching of the resolution ratio magnitude of laser lithography.
If, in process of production, first carrying out laser lithography and then impress, so described impression can accurately be coupled in the structure of being introduced by laser lithography.For this reason, first, the position of laser lithography structure need to be detected by trigger sensor or camera head, and then, this position need to be adjusted in the position of described impression.This can pass through the horizontal or time bias of imprint process, or completes by expansion base bottom material.
In another embodiment of the invention, by precreping structure or the laser lithography structure suitably selected, the accurate coupling that can solve two structures is directed.For example, if the graphic element that wherein one of two structures comprise continuous repetition for example guilloching, sinusoidal line, jaggies, band or dot pattern, so, because structure repeats, exact matching there is no need.Preferred use does not need the patterned structure with laser lithography structure exact matching.
This false proof carrier with optically variable element can seal or can adhesive bond to goods, product for example, the packing of product, sign, file, banknote, plastic clip etc.Also can be after carrier being made on other label, by this label sealing or can adhesive bond, afterwards by carrier itself again can adhesive bond to goods.In both cases, can make the design of described goods or described other label adapt to the design of described optically variable element.This is suitable especially when the subregion de-metallization of described carrier.Then, in the subregion of de-metallization, can see the lower floor's design on described goods or described other label.This may be because de-metallization subregion becomes transparent or semitransparent shape.In this mode, except patterned structure and laser lithography structure, in this configuration, also can comprise the basic engineering of described goods or described other label.This basic engineering can combine by suitable mode and patterned structure and specified embossed designs and the lithography design of laser lithography structure.In this case, except figure combination, also can carry out logical combination.Described basic engineering both can comprise static elements also can comprise independent element, and for example, they can be manufactured by printing technology independently.Independent element can be numeral or alphanumeric sequence number, bar code or independently figure.The stand-alone assembly of described basic engineering can be combined according to the stand-alone assembly of logic and figure and laser lithography design.For example, described basic engineering can comprise numeral or the alphanumeric sequence number repeating wholly or in part with laser lithography design.Described basic engineering and laser lithography design can comprise numeral or alphanumeric numbering, and they are bonded to each other by database or by mathematical operation.But the static elements of described basic engineering also may combine with the independent element of laser lithography design.For example, in laser lithography design, can make independently subregion de-metallization, this makes it possible to see the certain areas of basic engineering.By this way, for example, can see individually numeral or the colored region of described basic engineering.
Accompanying drawing explanation
Below by auxiliary lower the present invention that describes of the illustrative embodiments in 11 accompanying drawings, wherein:
Fig. 1 shows according to ribbon carrier of the present invention, and it has embossing and the lithography design that there is no accurately cooperation.
Fig. 2 shows the ribbon carrier of embossed designs and the lithography design with accurate cooperation.
Fig. 3 shows the carrier according to Fig. 1, and each separate label has mark line.
Fig. 4 shows the carrier according to Fig. 2, and each separate label has mark line.
Fig. 5 shows 5 kinds of embodiment individually, its embossed designs and lithography design and mark line associated configuration.
Fig. 6 has shown embossed designs, and the GTG of lithography design and combination wedges meter.
Fig. 7 has shown that the fine structure design of being manufactured by embossed designs and the fine structure of being manufactured by lithography design design.
The Combination Design being formed by embossed designs and laser lithography design shown in Fig. 8.
The another kind of example of the Combination Design being formed by embossed designs and laser lithography design shown in Fig. 9.
Figure 10 has shown embossed designs, laser lithography design, the Combination Design on label, surface of package and the label that is applied to this surface of package.
Figure 11 has shown embossed designs, laser lithography design, the Combination Design on label, surface of package and the label that is applied to this surface of package.
Fig. 1 shows the carrier 1 with metal layer 2, and it had both comprised that embossed designs A also comprised laser lithography design B.
The specific embodiment
The Reference numeral of quoting refers to this embossed designs A or this laser lithography design B on the one hand, but also refers to patterned structure or the laser lithography structure in metal layer 2 simultaneously, design A, and B is based on described patterned structure or laser lithography structure.
Continuously wave and three parallel lines represent the placeholder for static structure (placeholder) of described embossed designs A.Sequence number and the ellipse representation laser lithography design independence of B and the placeholder of static structure.Described placeholder is done symbolically to understand, and represents any structure that can manufacture by imprint process or laser lithography.This layout and number of symbols are also only interpreted as for example.
Described impression and laser lithography exposure do not coordinate each other accurately.This can find out with respect to the migration of wave from this sequence number.But, because sequence number is always positioned on wave, so these two kinds of composite designs are together.This combination is to be undertaken by the fixed vertical relation of two kinds of designs.
Fig. 2 shows embossed designs A and laser lithography designs the carrier that B accurately coordinates each other.Impression A and laser lithography exposure B coordinate each other accurately.This can not find out with respect to the fact of wave migration from sequence number.By accurate cooperation, the complete combination of these two kinds design energy together.This combination is that the fixing horizontal and vertical relation of B is carried out by two kinds of design A.
Fig. 3 has shown the carrier 1 having according to the embossed designs A that there is no each other exact matching of Fig. 1 and lithography design B, has shown that mark line 7 at individual optical elements 6 around.Therefore what broken circle represented is for the mark line 7 of label or for carrying out the mold shape of heat seal application, and represents to use the border of the optically variable element 6 on the object of optically variable element 6.Mark line 7 is also nonessential is circular, but can have the shape of any other expectation, for example oval, polygon, fillet polygon etc.
Accurate cooperation do not arrange each other for described impression A and laser lithography exposure B.But described laser lithography exposure B arranges with respect to the border of optically variable element 6 and accurate cooperation of the border of carrier 1, so that each optically variable element 6 carries out unique personalization.
Fig. 4 shows carrier 1, wherein impresses A and laser lithography exposure B and coordinates accurately each other and arrange with respect to the border of optically variable element 6 and accurate cooperation of the border of carrier 1.
In Fig. 5, broken circle represents is for the label line 7 of label or for the shape of heat seal application mould, is therefore also the border of optically variable element 6 in final products.Illustrated the various possible layout of structure A, B.What region A represented is the structure of embossed designs, and region B represents is the structure of laser lithography design.Independently structure A, B are separated from each other, also can be partially or completely overlapping.In a kind of design, some subregions also can be overlapping and other subregions are not overlapping.Except shown in layout, alternate layout mixed or that intersect is also possible.
According to Fig. 6, embossed designs is comprised of the region A that contains patterned structure.Laser lithography design is comprised of the region B of high-resolution gration GTG wedge 8.In this embodiment, GTG wedge 8 never de-metallization to de-metallization gradually transition change.By this way, transition ground is destroyed gradually in the B of region for embossed area A, so concerning observer, patterned structure merges gradually.If patterned structure is glimmer the diffraction grating of low-light of color of rainbow, so this flicker will progressively be faded out in the B of region.If patterned structure is hologram, visually hologram can fade out gradually in the B of region.Mark line 7 limits the border of optically variable element 6 again.
By this way, produce a kind of structure that can not only can not only be produced by laser lithography by embossed technology production.
According to Fig. 7, embossed designs is comprised of the region A that contains patterned structure.The region B that laser lithography design is retained by de-metallization and meticulous high-resolution line by bulk zone forms.By this way, in the B of region, only leave the meticulous embossed lines of embossed area A.If patterned structure is glimmer the diffraction grating of low-light of color of rainbow, these fine lines low-light of rainbow color that also can glimmer so.The mode that these gratings can not be manufactured by laser lithography technique by them now configures.
By this way, produce a kind of structure that can not can not be produced by laser lithography separately by imprint process separately.Mark line 7 limits the border of optically variable element 6 again.
In Fig. 8, embossed designs A is by identifying, and exquisite button Suo Wen and full surf zone (dash area) form.These three regions can be comprised of different structure; For example, described sign can be configured to rainbow hologram, described in turn round Suo Wen and be configured to 2D hologram, described full surf zone is configured to refraction or diffraction structure.Laser lithography design B is comprised of square structure, two fine rules, first sequence number and the second antitone sequences number.The fourier hologram with stand-alone content that described square structure is produced by computer, described two fine rules can be comprised of diffraction grating, and described sequence number above can be comprised of Fresnel hologram.For the situation of the antitone sequence of bottom number, the perimeter of sequence number is by de-metallization.
If these two kinds of designs are all incorporated into metal layer 2 according to the present invention, obtained the optically variable element 6 of Combination Design.On the one hand, this design by comprising that respectively a kind of separated regions in two kinds of designs forms, for example, identifies or fourier hologram.On the other hand, it is comprised of the structure that partly overlaps, as turns round Suo Wen, strain line and First ray number.And it is comprised of combining structure, anti-explicit second sequence number of laser lithography is for example loaded with refraction or the diffraction structure of impression processing in numeral.
By this way, produce a kind of cannot be by independent impression or the structure of being produced by independent laser lithography.
Fig. 8 shows the logical combination of embossed designs A and laser lithography design B.In embossed designs A, there is numeral 1 to 5.According to last bit digital of the sequence number of laser lithography design B, retain separately the region of last bit digital of duplicate serial numbers.This optically variable element 6 has represented logical combination.
That first Figure 10 shows is embossed designs A, is then lithography design B, in the 3rd image of Figure 10, has shown the combination of embossed designs A and lithography design B.The 3rd image representation be the optically variable element 6 of label form.The below Serial No. of laser lithography design B is transparent.The 4th image shows has the surface 11 of goods that is expressed as the structure of wavy structure in the application, and described goods are for example packed.Due to optically variable element 6 is applied on the surface 11 of goods, the described structure that is positioned at transparent region 10 belows of described optically variable element 6 can see through described region and glitter.
By the mode of similar Figure 10, shown in Figure 11 is the logical combination between the structure on surface 11, and it is provided with one group of sequence number extraly.According to last bit digital of sequence number, by the independent de-metallization in region 10.Numeral 1-5 is that static state is printed on the surface 11 of goods; By de-metallization region 10, can see the correspondence numeral on surface 11.
Reference numerals list
1 carrier
2 metal layers
6 optical elements
7 mark lines
8 grey photometric wedges
10 de-metallizations/transparent region
11 surfaces
A embossed designs
The design of B laser lithography
Claims (17)
1. a false proof carrier (1) with at least one metal layer (2), introduce and have at least one optically variable element (6) therein, and described at least one optically variable element (6) has dependent patterned structure (A), it is characterized in that:
Described at least one optically variable element (6) has independently laser lithography structure (B), and this laser lithography structure has the resolution ratio that is less than 20 microns.
2. false proof carrier as claimed in claim 1 (1), is characterized in that, described resolution ratio is less than 5 microns.
3. false proof carrier as claimed in claim 1 or 2 (1), is characterized in that: described patterned structure (A) and described laser lithography structure (B) are incorporated into same metal layer (2).
4. the false proof carrier (1) as described in claim 1,2 or 3, is characterized in that: described patterned structure (A) and described laser lithography structure (B) are at least overlapping at some subregions.
5. the false proof carrier (1) as described in claim 1 to 4 at least one, is characterized in that, the layout that described patterned structure (A) and described laser lithography structure (B) accurately coordinate each other.
6. as the false proof carrier (1) as described at least one in claim 1 to 5, it is characterized in that, described laser lithography structure (B) is at least at subregion (10) de-metallization at least partly.
7. false proof carrier as claimed in claim 6 (1), is characterized in that, described subregion (10) is de-metallization completely.
8. the false proof carrier (1) as described in claim 6 or 7, is characterized in that, described subregion (10) is as grating de-metallization.
9. false proof carrier as claimed in claim 8 (1), is characterized in that, in subregion (10), the rasterizing of described de-metallization increases gradually.
10. the false proof carrier (1) as described at least one in aforementioned claim, is characterized in that, described optically variable element (6) is transparent in subregion (10).
11. 1 kinds of manufacture methods with the false proof carrier (1) of at least one metal layer (2), it is manufactured by following steps
A kind of dependent patterned structure of embossing processing (A) in described metal layer (2) and by means of laser independently laser lithography structure (B) photolithographic exposure in metal layer (2),
To be less than the resolution ratio of the 20 microns described photolithographic structures (B) that exposes,
By patterned structure (A) and described photolithographic structures (B), form together described at least one optically variable element (6).
12. methods as claimed in claim 11, it is characterized in that, dependent patterned structure (A) is first embossing in described metal layer (2) along described carrier (1), and then, independently laser lithography structure (B) is exposed in described metal layer (2).
13. methods as claimed in claim 11, it is characterized in that, independently laser lithography structure (B) is first exposed in metal layer (2) along described carrier (1), and subsequently, dependent patterned structure (A) is embossing in described metal layer (2).
14. as at least one described method in claim 11,12 or 13, it is characterized in that, described laser lithography structure (B) and described patterned structure (A) be being incorporated in metal layer (2) of accurate cooperation each other.
15. as the method as described at least one in claim 11 to 14, it is characterized in that, subregion (11) de-metallization of described photolithographic structures (B) is to transparent degree, the subregion of described patterned structure (A) is arranged with respect to territory, described clear sub-regions (10), makes them pass through territory, clear sub-regions (10) flash of light.
16. as the method as described at least one in claim 11 to 15, it is characterized in that, described carrier (1) is separated between described optically variable element (6), and described optically variable element (6) is applied in goods, particularly packing.
17. methods as claimed in claim 16, is characterized in that, described optically variable element (6) is provided with territory, clear sub-regions (11), and the surface of described goods sign sees through territory, described clear sub-regions (10) flash of light.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012203350A DE102012203350A1 (en) | 2012-03-02 | 2012-03-02 | Security label and a method for its production |
| DE102012203350.5 | 2012-03-02 | ||
| PCT/EP2013/053167 WO2013127650A1 (en) | 2012-03-02 | 2013-02-18 | Security label and a method for the production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104144796A true CN104144796A (en) | 2014-11-12 |
| CN104144796B CN104144796B (en) | 2016-08-24 |
Family
ID=47740945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380012081.0A Active CN104144796B (en) | 2012-03-02 | 2013-02-18 | False proof carrier and manufacture method thereof |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP2819851B1 (en) |
| CN (1) | CN104144796B (en) |
| DE (1) | DE102012203350A1 (en) |
| WO (1) | WO2013127650A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107709033A (en) * | 2015-04-22 | 2018-02-16 | 蒂萨斯克里博斯有限责任公司 | The manufacture method of safety element and safety element |
| CN107771129A (en) * | 2015-06-15 | 2018-03-06 | 蒂萨斯克里博斯有限责任公司 | Safety label with gap tilt effect |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012213502B4 (en) * | 2012-07-31 | 2022-12-22 | Scribos Gmbh | heat seal film |
| DE102014200595B4 (en) * | 2014-01-15 | 2019-08-22 | Tesa Scribos Gmbh | Safety arrangement and method for producing a safety arrangement |
| DE102015202106A1 (en) | 2015-02-06 | 2016-08-11 | Tesa Scribos Gmbh | Optically variable security element |
| DE102016214407A1 (en) * | 2016-08-04 | 2018-02-08 | Tesa Scribos Gmbh | Optically variable security element |
| DE102016216878A1 (en) | 2016-09-06 | 2018-03-08 | Tesa Scribos Gmbh | Security label with metal layer |
| DE102017215288B3 (en) | 2017-08-31 | 2018-12-27 | Tesa Scribos Gmbh | Holographic multilayer film, product packaging, portion capsule, beverage preparation system, process for producing a holographic multilayer film and method for operating a beverage preparation system |
| DE102021203749A1 (en) | 2021-04-15 | 2022-10-20 | Scribos Gmbh | Security label, series of security labels, authentication system with a series of security labels, and method of manufacturing a security label |
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- 2013-02-18 CN CN201380012081.0A patent/CN104144796B/en active Active
- 2013-02-18 EP EP13705157.9A patent/EP2819851B1/en active Active
- 2013-02-18 WO PCT/EP2013/053167 patent/WO2013127650A1/en active Application Filing
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| CN101208206A (en) * | 2005-04-29 | 2008-06-25 | 格姆普拉斯公司 | Method for the laser marking of a card |
| DE102006032234A1 (en) * | 2006-07-12 | 2008-01-17 | Tesa Scribos Gmbh | Method for applying a security feature to a security document and security document with a security feature |
| CN101678697A (en) * | 2007-05-23 | 2010-03-24 | L·F·M·扎赫迪 | Film element for detecting authenticity |
| WO2010028758A1 (en) * | 2008-09-10 | 2010-03-18 | Giesecke & Devrient Gmbh | Method for producing a security or value document |
| CN102292219A (en) * | 2009-03-04 | 2011-12-21 | 欧贝特科技公司 | Security element for a value document |
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| CN107709033A (en) * | 2015-04-22 | 2018-02-16 | 蒂萨斯克里博斯有限责任公司 | The manufacture method of safety element and safety element |
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| CN107771129A (en) * | 2015-06-15 | 2018-03-06 | 蒂萨斯克里博斯有限责任公司 | Safety label with gap tilt effect |
| CN107771129B (en) * | 2015-06-15 | 2020-02-07 | 蒂萨斯克里博斯有限责任公司 | Security tag with tilting effect |
| US10618341B2 (en) | 2015-06-15 | 2020-04-14 | Tesa Scribos Gmbh | Security label with tilt effect |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2819851B1 (en) | 2016-04-13 |
| WO2013127650A1 (en) | 2013-09-06 |
| DE102012203350A1 (en) | 2013-09-05 |
| CN104144796B (en) | 2016-08-24 |
| EP2819851A1 (en) | 2015-01-07 |
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