CN102971644B - Mo collimating apparatus and use the X-ray detector of this Mo collimating apparatus, X ray checking device and CT device - Google Patents

Mo collimating apparatus and use the X-ray detector of this Mo collimating apparatus, X ray checking device and CT device Download PDF

Info

Publication number
CN102971644B
CN102971644B CN201180029382.5A CN201180029382A CN102971644B CN 102971644 B CN102971644 B CN 102971644B CN 201180029382 A CN201180029382 A CN 201180029382A CN 102971644 B CN102971644 B CN 102971644B
Authority
CN
China
Prior art keywords
plate
collimating apparatus
hole
ray detector
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201180029382.5A
Other languages
Chinese (zh)
Other versions
CN102971644A (en
Inventor
笠本诚
山本慎一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Materials Co Ltd
Original Assignee
Toshiba Corp
Toshiba Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Materials Co Ltd filed Critical Toshiba Corp
Publication of CN102971644A publication Critical patent/CN102971644A/en
Application granted granted Critical
Publication of CN102971644B publication Critical patent/CN102971644B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/025Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment
    • A61B6/02Arrangements for diagnosis sequentially in different planes; Stereoscopic radiation diagnosis
    • A61B6/03Computed tomography [CT]
    • A61B6/032Transmission computed tomography [CT]
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00Apparatus or devices for radiation diagnosis; Apparatus or devices for radiation diagnosis combined with radiation therapy equipment
    • A61B6/06Diaphragms

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Measurement Of Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

The invention provides a kind of Mo collimating apparatus and use the X-ray detector of this Mo collimating apparatus, X ray checking device and CT device.According to embodiment, the Mo plate that Mo collimating apparatus has thickness of slab is 0.02 ~ 0.3mm carries out stacked laminate construction.The hole portion that multiple minor face or diameter are 0.1 ~ 1.0mm is provided with in Mo plate.Each hole portion forms the through hole of upper surface to lower surface of through duplexer.

Description

Mo collimating apparatus and use the X-ray detector of this Mo collimating apparatus, X ray checking device and CT device
Technical field
Embodiment of the present invention relates to Mo collimating apparatus and uses the X-ray detector of Mo collimating apparatus, X ray checking device and CT device.
Background technology
In the field such as medical diagnosis, industrial nondestructive inspection, use the radiation inspecting apparatus such as X-ray tomograph (X ray CT device).X ray CT device has following structure, namely, by the X-ray tube (x-ray source) carried out in fan-shaped fan beam x-ray bombardment and, the X-ray detector obtained that to be arranged to multiple x-ray detection device is oppositely disposed, and makes the fault surface of measured body appear at central authorities.In X ray CT device, from X-ray tube, measured body is carried out to the irradiation of fan beam X ray, and in X-ray detector, the X ray absorption data through measured body is collected, afterwards by resolving (X ray absorptivity on each position, computed tomography face to these X ray absorption data in a computer, and reappear the image corresponding to X ray absorptivity), the tomography of measured body is reproduced.
Be configured with the flash layer that the X ray through measured body is detected in X-ray detector, be configured with by the collimating apparatus prevented for the purpose of scattered ray in its front.Existing collimating apparatus adopts the shape of slit arranged perpendicular to flash layer, the scattered ray on channel direction can only be removed, but by being made lattice-shaped, the scattered ray on channel direction can not only be removed, also can remove the scattered ray on slice direction, therefore can improve the resolution of image.Thus, a kind of design alteration from shape of slit to lattice-shaped is now needed.
Up to the present, for the collimating apparatus of lattice-shaped, such as, as shown in Figure 23 of Jap.P. No. 2731162 publication (patent documentation 1), the plate of comb-shaped is intersected and assembles.Although according to the metal that stereotype is softer like that, be easily processed into comb-shaped plate, due to environmental problem, lead does not want by the material used as far as possible.Consider to use Mo plate to replace stereotype although have, because Mo plate is comparatively hard, therefore the processing of comb-shaped is very complicated.In addition, because the thickness of comb-shaped plate is the thin plate of about 0.1 ~ 0.2mm, therefore be difficult to perfectly combine.Therefore, disclose in Japanese Patent Laid-Open 2007-3521 publication (patent documentation 2) and split porose sheet material and carry out stacked, and the method for stop is carried out with supporting member, in Japanese Patent Laid-Open 2008-168125 publication (patent documentation 3), disclose the stepped construction that sept is set each other at sheet material.
Owing to being the structure employing other parts such as supporting member, sept, the rise of the complicated of manufacturing process and cost therefore cannot be suppressed.In addition, because patent documentation 2 is separated at certain intervals by Mo plate and arranges in the vertical, will have the structure of overhead as top cover in multiple hole, therefore manufacturing process becomes more complicated.
Prior art document
Patent documentation
Patent documentation 1: Jap.P. No. 2731162 publication
Patent documentation 2: Japanese Patent Laid-Open 2007-3521 publication
Patent documentation 3: Japanese Patent Laid-Open 2008-168125 publication
Summary of the invention
Invent problem to be solved
As mentioned above, the assembling procedure of the lattice-shaped collimating apparatus of prior art is more complicated.In addition, owing to needing the installing component such as supporting member, sept in addition, therefore cannot fully reduce costs.
For solving above problem, the invention provides a kind of Mo collimating apparatus, this Mo collimating apparatus simplifies assembling procedure, therefore can improve yield rate.
The technical scheme that technical solution problem adopts
According to embodiment of the present invention, provide a kind of Mo collimating apparatus, Mo (molybdenum) plate that this Mo collimating apparatus has thickness of slab is 0.02 ~ 0.3mm carries out stacked laminate construction.The hole portion that multiple minor face or diameter are 0.1 ~ 1.0mm is provided with in Mo plate.Each hole portion forms the through hole of upper surface to lower surface of through duplexer.
In addition, the section of through hole is straight line or step-difference shape, and preferably, the jump of step-difference shape is within 0 ~ 0.010mm.In addition, preferably, the jump of step-difference shape is positioned at end regions more than 0 and in the jump region of below 0.010mm, and the jump of step-difference shape is that the non-jump region of 0mm is positioned at central area.In addition, preferably, when drafting runs through the straight line of each through hole, each straight line points to a fixed-focus.In addition, preferably, the laminates number of Mo plate is 10 ~ 300.In addition, preferably, the thickness of collimating apparatus is at more than 10mm.In addition, preferably, collimating apparatus has R shape.In addition, preferably, be the laminate construction of fixedly carrying out integration by utilizing welding or bonding agent.
In addition, when 2 ~ 50 Mo plates are set to 1 group, Mo collimating apparatus can comprise multiple groups.Preferably, each group is had and is interconnected by the hole portion of adjacent Mo plate and the through hole of the straight line formed, and the maximum jump of the through hole between adjacent sets is 0.001 ~ 0.1mm.
In addition, according to embodiment there is provided a kind of X-ray detector using Mo collimating apparatus as above.In addition, the X ray checking device employing multiple Mo collimating apparatus is also applicable to.Also the CT device employing X-ray detector of the present invention is applicable to further.
The effect of invention
Embodiment of the present invention carries out stacked stepped construction owing to employing to Mo plate, therefore can simplify assembling procedure, thus can improve yield rate.In addition, due to also without the need to using other parts such as supporting member, sept, therefore also can reduce costs.
Accompanying drawing explanation
Fig. 1 is the figure of an example of the Mo collimating apparatus represented involved by embodiment of the present invention.
Fig. 2 is the figure of the example representing Mo plate.
Fig. 3 is the figure of another example representing Mo plate.
Fig. 4 is the figure of an example of the focus of the Mo collimating apparatus represented involved by embodiment of the present invention.
Fig. 5 is the figure of another example of the focus of the Mo collimating apparatus represented involved by embodiment of the present invention.
Fig. 6 is the figure of the example representing through hole.
Fig. 7 is the figure of another example of the Mo collimating apparatus represented involved by embodiment of the present invention.
Fig. 8 is the figure of an example of the R shape representing the Mo collimating apparatus had involved by embodiment of the present invention.
Fig. 9 represents the figure to the example that the multiple collimating apparatuss involved by embodiment arrange.
Figure 10 is the figure of an example of the X-ray detector represented involved by embodiment.
Figure 11 is the figure of an example of the X ray checking device represented involved by embodiment.
Figure 12 is the major part amplification view of the through hole shown in Fig. 6.
Figure 13 is the major part amplification view of the through hole shown in Fig. 7.
Embodiment
The feature of the Mo collimating apparatus involved by embodiment of the present invention is, have thickness of slab be the Mo plate of 0.02 ~ 0.3mm carry out stacked after in the Mo collimating apparatus of laminate construction that obtains, Mo plate is provided with the hole portion that multiple minor face or diameter are 0.1 ~ 1.0mm, and each hole portion forms the through hole of upper surface to lower surface of through duplexer.
Mo plate can be the pure Mo of more than purity 99.9wt, also can be the Mo alloy of Re, Ti, the Zr etc. adding 1 ~ 30wt% in Mo.
The thickness of slab of Mo plate is 0.02 ~ 0.3mm.If thickness of slab is less than 0.02mm, is then difficult to process so thin Mo plate, the principal element of cost increase can be become on the contrary.On the other hand, if thicker than 0.3mm, then for the hereinafter described situation being processed into R shape, due to resilience, will be difficult to maintain shape.Therefore, the thickness of slab of Mo plate is 0.02 ~ 0.3mm, is preferably 0.1 ~ 0.2mm.
An example of Mo plate is illustrated in Fig. 2 and Fig. 3.The bond length that in figure, 2 is Mo plate, 5 is hole portion, 6 is screw stop portion, L is Mo plate long edge lengths, W is Mo plate.
The hole portion that multiple minor face or diameter are 0.1 ~ 1.0mm is provided with in Mo plate.Hole portion is of a size of 0.1 ~ 1.0mm, more preferably 0.4 ~ 0.7mm.
The shape in hole portion is not particularly limited as polygon, circles etc. such as quadrilateral (square, rectangle) or hexagons, but for the adjustment in jump region, is preferably quadrilateral.If the minor face in hole portion or diameter are less than 0.1mm, then can because of the too small and very difficult manufacture in hole.On the other hand, if more than 1.0mm, then the performance of collimating apparatus can reduce.In addition, although be not particularly limited the quantity in hole portion, preferably arrange multiple to make it become in fact latticed.
In addition, Fig. 3 is the structure being provided with screw stop portion, but the length L of Mo plate only represents the length in the region being provided with hole portion, does not comprise this screw stop portion.
The present invention have to this Mo plate carry out stacked after the laminate construction that obtains.The laminates number of Mo plate is 10 ~ 10000, more preferably 10 ~ 300.If laminates number is less than 10, then collimating apparatus is inadequate in a thickness direction; If more than 10000, then can may there is harmful effect because collimating apparatus becomes overweight causing when being loaded into X-ray detector.The more preferably duplexer of 100 ~ 250.
An example of Mo collimating apparatus is illustrated in Fig. 1.In figure, 1 be Mo collimating apparatus, 2 be Mo plate, 3 be region centered by end regions, 4, the L length that is Mo plate, the H thickness that is Mo collimating apparatus.In addition, in statu quo carrying out stacked structure to Mo plate, namely the length L of Mo plate becomes the length L of Mo collimating apparatus.
In the present invention, in the laminate construction of Mo plate, hole portion is formed as the through hole of through upper surface to lower surface.This refers to the through hole of through hole on upper surface portion to following table face portion corresponding respectively.Thus, each hole portion has the effect of calibration.
In addition, the section of through hole is straight line or step-difference shape, and preferably, step-difference shape is within 0 ~ 0.010mm.An example of through hole is illustrated in Fig. 6.Step-difference shape 0mm indicates that without the non-jump region of jump, i.e. so-called section be the shape of straight line.In addition, step-difference shape is that 0.010mm represents that the skew of the Mo plate directly overlapped up and down has the jump region of the jump of 0.010mm.Preferably, the deviation range of Mo plate is 0 ~ 0.005mm (0 ~ 5 μm).
In addition, preferably, step-difference shape is positioned at end regions more than 0 and in the jump region of below 0.010mm, and step-difference shape is that the non-jump region of 0mm is positioned at central area.End regions 3 for set length L as 100 time, the region of 0 ~ 10,90 ~ 100.Central area 4 for set length L as 100 time, the region of 45 ~ 55.
Figure 12 is the schematic diagram after the part in the hole portion 5 of Mo collimating apparatus end regions 3 in Fig. 6 being amplified.Figure 12 represents the jump between the hole portion in a through hole.In Figure 12, the hole portion 5a of Mo plate 2a and, the hole portion 5b of adjacent with Mo plate 2a Mo plate 2b forms a through hole.The position of the hole portion 5a of Mo plate 2a has skew relative to the position of the hole portion 5b of Mo plate 2b.Jump d be the wall portion 22 of Mo plate 2a with the border of hole portion 5a and, surround the distance of the wall portion 23 of the Mo plate 2b of hole portion 5b.
Due to jump region be present in end regions, non-jump region is present in central area, therefore can realize when draw run through the straight line of each through hole time, each straight line points to the structure of a fixed-focus (X ray occurring source).An example of the focus of Mo collimating apparatus is illustrated in Fig. 4 and Fig. 5.Preferably, have like that in the equipment of annular detector at such as CT device, to the collimating apparatus of calibrating through the X ray of measured body from x-ray source (X-ray tube) also with the R shape approximation of annulus.For this reason, preferably, jump region is set at end regions, non-jump region is set in central area, and make through hole point to the direction of a fixed-focus.
When can confirm to draw the straight line running through each through hole by the following method, each straight line points to the structure of a fixed-focus (X ray occurring source).Not abnormal in the output obtained when collimating apparatus being loaded into X-ray detector by confirmation, can judge to achieve this structure.
When each through hole being formed at collimating apparatus points to a fixed-focus (X ray occurring source), the jump formed at end regions is maximum.In addition, in order to form this shape, the Mo plate changing the position in hole by etching is adjusted, and to carry out stacked method be effective.In addition, in order to measure jump size in the collimating apparatus of finished product, the section on Mo plate length direction can be got, and jump size is measured.The section of length direction can be arbitrary section.
In addition, also there is following methods and make through hole point to a fixed-focus direction, that is, make the hole portion be arranged on stacked Mo plate diminish gradually.In addition, when laminates number is more, the principal element that size different plate in hole portion is cost increase is prepared in the stacking order of Mo plate, therefore, there is following methods, namely 10 ~ 20% (such as the situation of stacked 200, every 10 ~ 20% that is 20 ~ 40) every laminates number make hole portion size reduce.
Another example of Mo collimating apparatus is illustrated in Fig. 7.In Fig. 7,2 be Mo plate, 3 for region, 5 centered by end regions, 4 be hole portion, 7-1 ~ 7-4 represents multi-disc Mo plate 2 as each group when 1 group.In each group of 7-1 ~ 7-4, the through hole that the hole portion 5 of adjacent Mo plate 2 is interconnected to each other and is formed is perpendicular to the upper and lower surface of Mo plate 2, and longitudinal cross-section is rectilinear form.That is, the through hole be formed at respectively in group 7-1 ~ 7-4 is unified into linearity.In each group of 7-1 ~ 7-4, the through hole of central area 4 is arranged on same position substantially, but for the through hole of end regions 3, the position between each group is different.Therefore, if carry out stacked to the Mo plate 2 of group 7-1 ~ 7-4, then at the straight through hole of central area 4 shape of Mo collimating apparatus 1, the through hole of step-difference shape can be formed at the end regions 3 of Mo collimating apparatus 1.
Figure 13 is the schematic diagram after a part for the through hole of Mo collimating apparatus end regions 3 in Fig. 7 being amplified.There is skew in the through hole 81 be connected to form by the hole portion 5 of Mo plate 2 of group 7-1 and, the through hole 82 that is connected to form by the hole portion of the Mo plate 2 organizing 7-2.Through hole 81 and through hole 82 form a through hole.The wall portion of the Mo plate 2 surrounding through hole 81 is labeled as 24, the wall portion of the Mo plate 2 surrounding through hole 82 is labeled as 25.Jump d be through hole 82 with the border of the wall portion 25 of Mo plate 2 and, surround the distance of the wall portion 24 of the Mo plate 2 of through hole 81.
For the situation making the shape in hole portion diminish gradually, need the quantity etching raw sheet identical with laminates number.That is, to stacked 200, then 200 are needed to etch raw sheet.Inevitably cost increase will be caused according to this way.Therefore, using the duplexer of 2 ~ 50 Mo plates as 1 group, and make the hole portion shape in 1 group unified.That is, the through hole of straight line is set in 1 group.Preferably, on this basis, structure is adjusted, make maximum jump between adjacent sets between 0.001 ~ 0.1mm.In central area 4, the straight through hole of hole portion 5 shape.On the other hand, preferably, in end regions 3, be provided with jump between each group through hole, the through hole be connected to form to each other by the through hole of each group points to a fixed-focus direction.Maximum jump represents jump maximum in the jump of through hole between adjacent sets.The jump of the through hole between adjacent sets can be identical, also can change respectively.In addition, the laminates number of 1 group is 2 ~ 50, and the laminates number of each group can be identical, also can be different.
According to this structure, such as, for the situation of the collimating apparatus of stacked 200 of manufacture, if be 1 group with 20,10 groups are divided into.For 10 groups, if then 10 etching raw sheets.Compared with arranging all different etching raw sheet of every sheet Mo plate, cost can be made greatly to reduce.
In addition, can following methods be exemplified, as: the Mo plate defining same holes portion is carried out stacked after make it with R shape or carry out stacked to the Mo plate in advance with R shape.
In addition, by adopting laminate construction, be easy to make collimating apparatus thickness H reach more than 10mm, form thicker collimating apparatus.Such as, the image of measured body is detected at CT device neutral body.Therefore, not only need to make hole portion longitudinally × transversely arrange, also need in a thickness direction to calibrate.
In addition, preferably, at least there is the side that more than has jump on the stacked direction on minor face or long limit in the side of Mo calibrating device.For in X ray checking device by multiple collimating apparatus and the situation of row arrangement, particularly for as CT device, X ray checking device carries out the structure that rotates around measured body, need to make collimating apparatus point to a fixed-focus direction.Therefore, when collimation device is fixed, occurred directional problems, be arranged on by which, which is arranged on down.
For the situation making hole portion size reduce gradually, if make the size of uppermost Mo plate and nethermost Mo plate also reduce gradually, due to can by visual judge which upper, which under, therefore improve the installation capability for X-ray detector.In addition, by make stacked after Mo collimating apparatus with R shape also can make collimating apparatus produce directivity, improve installation capability.An example of the collimating apparatus with R shape is illustrated in Fig. 8.Form multiple Mo plates 2 of collimating apparatus 1 1~ 2 5in, the upper and lower surface of each plate is all bending towards below.In addition, uppermost Mo plate 2 1the nethermost Mo plate 2 of area ratio 5area little.By to such Mo plate 2 1~ 2 5carry out stacked and make its integration, becoming the collimating apparatus 1 of circular shape.
When making Mo collimating apparatus with R shape, being added by punch process equal stress and carrying out.Because Mo plate is the material that rigidity is stronger, therefore, Mo thickness of slab thicker (such as the thickness of slab of Mo plate be 0.2mm more than) or Mo plate longer situation stronger for R shape, the resilience of Mo plate is comparatively strong, and in order to maintain R shape, the screw stop shown in Fig. 3 is necessary.Therefore, the structure shortened gradually by the length L of Mo plate is as stepped construction, and to give substantial R shape be also effective.Owing to being carry out stacked to the Mo plate that length L shortens gradually, therefore its side can have little jump.Now, give R shape owing to not carrying out collimation device by extra-stress, therefore make hole portion size diminish gradually, form step-difference shape.
In addition, preferably, by utilizing the side integration fixedly making the laminate structure of Mo plate of welding or bonding agent.Here, side refers to the surface of exposing the long limit of Mo plate or the stepped construction of minor face.Fig. 6 and Fig. 7 is an example of the side of exposing the long limit of Mo plate or the stepped construction of minor face.Preferably, after hole portion forms through hole, in order to maintain the jump region of regulation, make laminate structure integration.Especially, as CT device, X-ray examination is equipped in the equipment carrying out around measured body rotating, the intensity of collimating apparatus itself is also needs.
Welding be not particularly limited as gas welding, arc welding, electric resistance welding, EBW (electron beam welding) etc., but due to welding position preferably little as much as possible, therefore preferred electron bundle weldering.Although be not particularly limited to welding position, preferably, this side is welded in line from upper surface to lower surface.In addition, preferably, the length L of Mo plate once welds every about 3cm.
In addition, what utilize bonding agent is fixedly at side coating adhesive, and carries out integration.Preferably, the bonding agent of use is the heat-curable adhesive such as epoxy resin, silicones.
Mo collimating apparatus as above is applicable to X-ray detector.Mo collimating apparatus involved by embodiment of the present invention can be applied to any side in X-ray tube side and detecting device side, but the Mo collimating apparatus with R shape (the such substantial R shape of Fig. 5 is also included) is effective for detecting device side (side to the X ray through measured body detects).CT device X-ray detector is rotated around measured body and carries out the device that measures.Therefore, preferably, in the detecting device of toroidal (ring-type) surrounding measured body, Mo collimating apparatus also possesses R shape.In addition, preferably, multiple collimating apparatus is loaded to coordinate the detecting device of toroidal.
Next, the manufacture method of Mo collimating apparatus is described.The manufacture method of the Mo collimating apparatus involved by embodiment of the present invention is not particularly limited, but can adopt following manufacture method for obtaining good yield rate.
First, the Mo plate that thickness of slab is 0.02 ~ 0.3mm is prepared.By rolling, Mo plate is processed into thin plate.In addition, if desired, the method for by etching, thin plate being carried out to processing further can also be used.
In Mo plate, the operation in providing holes portion can exemplify out lithography, punch process, Laser Processing, linear cutter etc.In order to form netted hole portion as shown in Figure 2 on the Mo plate of below thickness of slab 0.2mm, be preferably lithography.On the other hand, for the situation forming reticulated cell portion on the Mo plate of thickness of slab more than 0.2mm, be preferably punch process.In addition, the Mo plate being provided with screw stop portion is made as required.
Then carry out stacked to the Mo plate being provided with hole portion with regulation sheet number.For the situation not arranging screw stop portion, made the side integration of laminate structure by welding or bonding agent.Now, only the part involved by the portion of outermost hole is welded or coating adhesive.
Afterwards, carry out stress as required and add, make it with R shape.In addition, stress adds as punch process.According to laminate structure, even if then carry out additional R shape by punch process, hole portion also maintains through hole, can form the offset area of regulation.The stamping pressure of additional R shape is preferably 1 ~ 100MPa, more preferably 30 ~ 80MPa.In addition, preferably carry out under the high temperature of 400 ~ 600 DEG C.In addition, preferably after punch process, at 700 ~ 900 DEG C, stress elimination thermal treatment is carried out.
In addition, when with R shape, also can carry out that stress is additional makes it have R shape in advance to Mo plate, then carry out stacked to this plate.In addition, for making every a slice all with the situation of R shape, stamping pressure is 1 ~ 80MPa, is preferably 1 ~ 50MPa.In addition, preferably carry out under the high temperature of 400 ~ 600 DEG C.In addition, preferably after punch process, at 700 ~ 900 DEG C, stress elimination thermal treatment is carried out.
When with R shape, can by carrying out the stacked jump region forming regulation to identical Mo plate.Especially, jump region is formed in end regions.In other words, can by carrying out the Mo plate with same holes portion stacked and giving R shape and form the collimating apparatus that end regions has jump region, central area exists non-jump region.Therefore, owing to can use the Mo plate with same holes portion, therefore production is better.The situation of this set R shape is effective for the larger collimating apparatus that the length L forming Mo plate is more than 90mm.
In addition, for the situation not arranging R shape, the Mo plate preparing to change hole portion size in advance or change hole position Mo plate as laminate structure.The situation not arranging R shape is effective for the length L forming Mo plate less than the less collimating apparatus of 90mm.In order to calibrate efficiently the fan beam X ray sent from X-ray tube, be preferably the R shape pointing to fan beam center (x-ray bombardment source).For the situation not forming R shape, substantial R shape can be formed by the length L of multiple Mo plate is carried out arrangement less than the less collimating apparatus of 90mm.
In addition, if use the Mo plate changing hole portion size in advance or the Mo plate changing hole position can obtain the laminate structure needed, then not especially to size, position limits, but there is following methods, namely, such as, when preparing to be provided with multiple minor face or diameter and being the netted Mo plate in the hole portion of 0.1 ~ 1.0mm, with every laminates number 10 ~ 20% (for the situation of stacked 200, every 20 ~ 40) make the size in hole reduce 0.0001 ~ 0.010mm, or make length L reduction 0.005 ~ 0.010mm (becoming the diminishing shape of Mo plate) change the method for hole position.
In addition, preferably, laminate structure integration is made by welding or coating adhesive.For the situation of not carrying out the integration utilizing welding or coating adhesive, screw stop portion as shown in Figure 3 is preferably set in end.In addition, also can use structure and the screw stop structure both sides of integration simultaneously.For this situation, also can arrange for Mo plate location peristome as location division to replace screw stop portion.In addition, illustrate in Fig. 3 and the example of a hole as screw stop portion is respectively set at two ends, but also can adopt the structure that multiple (such as, 2 ~ 3) screw stop portion is set in side.Also by arranging respectively multiple (2 ~ 3) in end, differentiation can be carried out to hole, location and screw stop hole and uses.
Owing to employing the laminate structure of Mo plate, therefore the contraposition in each hole portion is easier to, and yield rate is better.To the scheme that the plate of comb-shaped engages as prior art, except the comb shape of not all just in time engages, otherwise unacceptable product will be become.In contrast, according to stepped construction, be then easy to carry out contraposition.In addition, make side integration by welding or coating adhesive, the parts that sept, supporting member etc. are unnecessary can not be used.
As mentioned above, according to the Mo collimating apparatus involved by embodiment of the present invention, owing to easily carrying out the contraposition in hole portion, therefore fabrication yield is very high.In addition, make side integration by welding or coating adhesive, the intensity of collimating apparatus can be made to improve.According to this collimating apparatus, be namely used in the device making X-ray detector in rotary moving as CT device, also can maintain shape, the bad of deformation can not be produced.Its result, can provide the high X-ray detector of reliability or use the CT device of this X-ray detector.
Fig. 9 illustrates the example multiple collimating apparatus 1 being carried out arranging.Each collimating apparatus 1 is identical with Fig. 8, comprises Mo plate 2 1~ 2 5.In the X ray checking device as CT device, X-ray detector is circular, circular arc or fan-shaped, therefore also collimator arrangement is circular, circular arc or fan-shaped.An example of X-ray detector is illustrated in Figure 10.X-ray detector 31 is laminated in this order by collimating apparatus 1, flash layer 20 and photoelectric conversion part (photodiode) 21.In addition, an example of X ray checking device is illustrated in Figure 11.X ray checking device 10 comprises x-ray source 11 (X-ray irradiator) and the X-ray detector shown in Figure 10 31.The X-ray transparent measured body 12 penetrated from x-ray source 11 (X-ray irradiator) arrives X-ray detector 31.In X-ray detector 31, can scattered x-ray be removed by arranging collimating apparatus 1, only the direct X ray by collimating apparatus 1 through hole being converted to light in flash layer 20, and this light can being responded in photoelectric conversion part 21, being converted into electric signal.In computing machine 13, the electric signal after conversion in photoelectric conversion part 21 is processed, the image 15 in display 14 can be obtained.In addition, in Figure 11, x-ray source 11 is focus.
Embodiment
(embodiment 1 ~ embodiment 5)
Mo board size and hole portion size Mo plate as shown in table 1 is manufactured by lithography.The laminate structure of sheet number shown in table 1 is formed with this Mo plate.Its punch process become the R shape of R1070 to come to form R shape, and carry out stress elimination thermal treatment at 800 DEG C.Afterwards, side is welded, manufacture the Mo collimating apparatus of integration.In addition, Mo plate uses the Mo that purity is more than 99.9wt%.In addition, every sheet Mo plate is all arrange multiple hole portion nettedly.
The yield rate of the Mo collimating apparatus obtained is investigated.In addition, the step-difference shape in the hole portion of end regions, central area is investigated.In addition, vibration test is carried out to investigate permanance.In addition, for the step-difference shape in the hole portion of end regions, central area, in through hole, offset maximum jump in the plate of Mo up and down that overlaps and investigate.In addition, for permanance, Mo collimating apparatus is come and gone 50 times in 1 minute between the distance of 50cm, and what produce deformation is expressed as "×", and what do not produce deformation is expressed as "○".In addition, yield rate is the ratio producing certified products.Table 2 illustrates its result.
In addition, comparative example 1 is combined into except lattice-shaped except using the Mo plate of comb-shaped, has prepared the Mo collimating apparatus with embodiment 1 same size.Also identical mensuration is carried out to comparative example 1.
[table 1]
[table 2]
Mo collimating apparatus involved by the present embodiment is owing to having stepped construction, and therefore its yield rate is 100%, and permanance is also very excellent.In addition, owing to being made it with R shape by punch process, therefore on the side of short brink, jump is formed with based on Mo plate thickness.In addition, end regions is formed with jump region.In addition, central area does not have jump.Region beyond end regions and central area, portion has jump in hole, and its value is below the jump value of end regions.
On the other hand, for the intermeshing Mo collimating apparatus of comb-shaped plate in comparative example 1, the hole portion of upper surface and lower surface does not have overlap, but owing to being difficult to engage the comb-shaped Mo thin plate that thickness is 0.07mm, yield rate is on duty mutually.
(embodiment 6 ~ embodiment 9)
Upper surface Mo board size, lower surface Mo board size are as shown in table 3, and the Mo plate that preparation size diminishes, to form duplexer, makes the size in the middle of it be reduced to the size of lower surface Mo plate gradually.In addition, netted Mo plate is set by etching processing, hole portion is reduced gradually in units of 30 ~ 50, and the hole portion be arranged on upper surface Mo plate all becomes through hole.Laminate structure is all fixed side by coating adhesive.
The mensuration identical with embodiment 1 is carried out to each Mo collimating apparatus.Table 4 illustrates its result.In addition, the region beyond end regions and central area, portion has jump in hole, and its value is below the jump value of end regions.
[table 3]
[table 4]
Embodiment 6 ~ 9 is the structure shown in Fig. 4.Due to this structure be only carry out stacked, therefore yield rate and excellent in te pins of durability.In addition, for the embodiment 8 making Mo board size reduce and embodiment 9, jump is formed with in the side of short brink.Jump mentioned here is not the jump in hole portion, and it is stepped to refer to that the minor face of Mo plate is laminated into.
(embodiment 10 ~ embodiment 15)
Prepare the Mo plate (more than Mo purity 99.9wt%) of longitudinal 100mm × horizontal 20mm × thickness 0.05mm.Then, using the sheet number shown in table 5 as 1 group, making has the Mo collimating apparatus of the stepped construction of 200 as embodiment 10 ~ 13.In addition, use identical Mo plate making layer lamination number be the Mo collimating apparatus of 5000 as embodiment 14, making layer lamination number is that the Mo collimating apparatus of 9500 is as embodiment 15.In embodiment 11, being 1 group with 20, after stacked 5 groups, is 1 group with 50, on this sandwich stacked 2 groups again.In addition, in embodiment 15, being 1 group with 20, after stacked 200 groups, is 1 group with 10, on this sandwich stacked 550 groups again.The Mo collimating apparatus of embodiment 10 ~ 15 adopts the structure shown in Fig. 7.In addition, carried out the formation in hole portion by etching, and hole portion size is unified into the netted of 0.5mm × 0.5mm.In addition, be rectilinear form by carrying out stacked and through hole that is that formed to Mo plate unified in each group.In adjacent group, the through hole in each group switching centre region is arranged on same position.The through hole of part beyond each group switching centre region is arranged positions different between the groups.
In addition, screw stop hole portion is set in the end of each Mo plate.When assembling Mo collimating apparatus, at screw stop with inserting pressing fixture in the portion of hole, and carry out stacked successively.After stacked end, by resin adhesive, peripheral part (four sides) is adhesively fixed.Similarly to Example 1, the investigation of yield rate and permanance is carried out.Following table 5 shows the maximum jump in the jump in the through hole of step-difference shape, between group.In addition, in the central area of Mo collimating apparatus, the jump of through hole is 0mm, the part beyond central area and end regions, and the jump of through hole is less than maximum jump.
[table 5]
As known from Table 5, by arranging straight line through hole in 1 group, the maximum jump each other of the through hole between adjacent sets being set to 0.001 ~ 0.1mm, improve the yield rate of collimating apparatus, permanance.Especially, carry out stacked owing to inserting stationary fixture in screw stop hole portion, bad when therefore not having stacked.In addition, because etching raw sheet only need be identical with the quantity of group, therefore can significantly reduce costs.
(embodiment 1A ~ embodiment 15A, comparative example 1A)
Use the Mo collimating apparatus of embodiment 1 ~ embodiment 15 and comparative example 1, and attach it to the side detecting measured body in CT device X-ray detector.After carrying out the detection of CT image respectively, all clearly can detect 3-D view.It can thus be appreciated that the Mo collimating apparatus involved by the present embodiment not only possesses the collimating apparatus performance identical with existing product, and the yield rate of collimating apparatus and intensity higher.In other words, can confirm that the skew in the hole portion involved by the present embodiment can not have problems when taking CT image.
In addition, for the Mo collimating apparatus involved by embodiment, the side of short brink there is jump, can learn which side be which side of upper surface is lower surface, therefore easily distinguishes directivity when being installed to X ray checking device by visual.In addition, even if owing to not using the particular component such as sept, supporting member also can maintain through hole, therefore also can reduce costs from this starting point.
Although be illustrated several embodiment of the present invention, these embodiments only exemplarily present, and do not really want to limit invention scope.These new embodiments are implemented by other various mode, in the scope not departing from invention main idea, can carry out various omission, displacement, change.These embodiments and distortion thereof are all included in scope of invention and main idea, and in the invention be included in described in Patent right requirement and equivalency range thereof.
Label declaration
1Mo collimating apparatus, 2Mo plate, 3 end regions, 4 central areas, 5 hole portions, 6 screw stop portions, 7-1 ~ 7-4 group

Claims (19)

1. an X-ray detector, is characterized in that,
This X-ray detector comprises the Mo collimating apparatus stacked gradually, the flash layer adjacent with described Mo collimating apparatus and the photoelectric conversion part adjacent with described flash layer,
The Mo plate that described Mo collimating apparatus has thickness of slab is more than 0.02mm below 0.3mm carries out stacked laminate construction,
Described Mo plate is provided with hole portion that multiple minor face is more than 0.1mm below 1.0mm or is provided with the hole portion that multiple diameter is more than 0.1mm below 1.0mm, each described hole portion forms the through hole of upper surface to lower surface of through described laminate construction,
The section of described through hole is straight line or step-difference shape, and described step-difference shape is within more than 0 0.01mm,
Described step-difference shape is positioned at end regions more than 0 and in the jump region of below 0.010mm, and described step-difference shape is that the non-jump region of 0mm is positioned at central area.
2. an X-ray detector,
This X-ray detector comprises the Mo collimating apparatus stacked gradually, the flash layer adjacent with described Mo collimating apparatus and the photoelectric conversion part adjacent with described flash layer,
The Mo plate that described Mo collimating apparatus has thickness of slab is more than 0.02mm below 0.3mm carries out stacked laminate construction,
Described Mo plate is provided with hole portion that multiple minor face is more than 0.1mm below 1.0mm or is provided with the hole portion that multiple diameter is more than 0.1mm below 1.0mm, each described hole portion forms the through hole of upper surface to lower surface of through described laminate construction,
It is characterized in that,
Comprise multiple groups, each group has more than 2 50 the following stated Mo plates,
Described group is had respectively and is interconnected by the described hole portion of described Mo plate and the through hole of the straight line formed,
The maximum jump of the described through hole between adjacent described group is more than 0.001mm below 0.1mm,
The section of described through hole is straight line or step-difference shape, and jump region is positioned at end regions, and non-jump region is positioned at central area.
3. X-ray detector as claimed in claim 1 or 2, is characterized in that,
When drafting runs through the straight line of through hole described in each, each described straight line points to a fixed-focus.
4. X-ray detector as claimed in claim 1 or 2, is characterized in that,
The laminates number of described Mo plate is more than 10 less than 10000.
5. X-ray detector as claimed in claim 3, is characterized in that,
The laminates number of described Mo plate is more than 10 less than 10000.
6. the X-ray detector as described in any one of claim 1,2,5, is characterized in that,
The thickness of described Mo collimating apparatus is more than 10mm.
7. X-ray detector as claimed in claim 3, is characterized in that,
The thickness of described Mo collimating apparatus is more than 10mm.
8. X-ray detector as claimed in claim 4, is characterized in that,
The thickness of described Mo collimating apparatus is more than 10mm.
9. the X-ray detector as described in any one of claim 1,2,5,7,8, is characterized in that,
X-ray detector has R shape.
10. X-ray detector as claimed in claim 3, is characterized in that,
X-ray detector has R shape.
11. X-ray detectors as claimed in claim 4, is characterized in that,
X-ray detector has R shape.
12. X-ray detectors as claimed in claim 6, is characterized in that,
X-ray detector has R shape.
13. X-ray detectors as described in any one of claim 1,2,5,7,8,10,11,12, is characterized in that,
Described laminate construction is, by utilize welding or bonding agent fixedly make described Mo plate integration.
14. X-ray detectors as claimed in claim 3, is characterized in that,
Described laminate construction is, by utilize welding or bonding agent fixedly make described Mo plate integration.
15. X-ray detectors as claimed in claim 4, is characterized in that,
Described laminate construction is, by utilize welding or bonding agent fixedly make described Mo plate integration.
16. X-ray detectors as claimed in claim 6, is characterized in that,
Described laminate construction is, by utilize welding or bonding agent fixedly make described Mo plate integration.
17. X-ray detectors as claimed in claim 9, is characterized in that,
Described laminate construction is, by utilize welding or bonding agent fixedly make described Mo plate integration.
18. 1 kinds of X ray checking devices, is characterized in that,
Comprise multiple Mo collimating apparatus as described in as described in any one of claim 1 to 17.
19. 1 kinds of CT devices, is characterized in that,
Comprise the X-ray detector as described in any one of claim 1 to 18.
CN201180029382.5A 2010-09-14 2011-09-13 Mo collimating apparatus and use the X-ray detector of this Mo collimating apparatus, X ray checking device and CT device Active CN102971644B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010-206169 2010-09-14
JP2010206169 2010-09-14
PCT/JP2011/070875 WO2012036160A1 (en) 2010-09-14 2011-09-13 Mo COLLIMATOR AND X-RAY DETECTOR USING SAME, X-RAY INSPECTION DEVICE, AND CT DEVICE

Publications (2)

Publication Number Publication Date
CN102971644A CN102971644A (en) 2013-03-13
CN102971644B true CN102971644B (en) 2016-03-16

Family

ID=45831619

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180029382.5A Active CN102971644B (en) 2010-09-14 2011-09-13 Mo collimating apparatus and use the X-ray detector of this Mo collimating apparatus, X ray checking device and CT device

Country Status (3)

Country Link
JP (3) JPWO2012036160A1 (en)
CN (1) CN102971644B (en)
WO (1) WO2012036160A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6448206B2 (en) * 2014-03-31 2019-01-09 株式会社フジキン Multilayer X-ray grid, manufacturing apparatus and manufacturing method thereof
CN104237278A (en) * 2014-09-09 2014-12-24 中国科学院上海应用物理研究所 Fast three-dimensional fluorescence CT system and fast three-dimensional fluorescence CT method based on synchrotron radiation
KR101772324B1 (en) 2016-04-18 2017-08-28 고려대학교 산학협력단 Variable pin-hole collimator and radiation imaging device using the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6185278B1 (en) * 1999-06-24 2001-02-06 Thermo Electron Corp. Focused radiation collimator
US6225631B1 (en) * 1995-06-20 2001-05-01 Centre National De La Recherche Scientifique (Cnrs) Non-invasive radio-imaging analysis, in particular for examining small animals in vivo, and method for using same
CN101385650A (en) * 2007-09-10 2009-03-18 通用电气公司 Computed tomography system and apparatus

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52133871A (en) * 1976-05-06 1977-11-09 Hitachi Cable Honeyycomb structural bodies and method of fabricating the same
US4465540A (en) * 1979-05-03 1984-08-14 Albert Richard D Method of manufacture of laminate radiation collimator
US4288697A (en) * 1979-05-03 1981-09-08 Albert Richard D Laminate radiation collimator
JPS6361178A (en) * 1986-09-02 1988-03-17 Toshiba Corp Preparation of detector for x-ray ct
JPH0479939A (en) * 1990-07-23 1992-03-13 Shimadzu Corp Collimator
IL109143A (en) * 1993-04-05 1999-03-12 Cardiac Mariners Inc X-ray detector for a low dosage scanning beam digital x-ray imaging system
US5606589A (en) * 1995-05-09 1997-02-25 Thermo Trex Corporation Air cross grids for mammography and methods for their manufacture and use
JP3639855B2 (en) * 1998-10-30 2005-04-20 理学電機工業株式会社 X-ray fluorescence analyzer
JP2000249767A (en) * 1998-12-28 2000-09-14 Toshiba Corp Manufacture of gamma-ray collimator, gamma-ray collimator and nuclear medical diagnostic device
JP2001324569A (en) * 2000-05-12 2001-11-22 Acrorad Co Ltd Nuclear medicine diagnostic probe
US20040052332A1 (en) * 2002-09-13 2004-03-18 Banchieri Andrew J. X-ray collimator and a method of making an x-ray collimator
JP4184839B2 (en) * 2003-03-13 2008-11-19 株式会社東芝 Multi-segment diaphragm device
CN1270326C (en) * 2004-07-15 2006-08-16 杭州华源伽玛医疗设备投资有限公司 Cross arranged double row hole collimaator for radiotherapy device
EP1713090B1 (en) * 2005-04-15 2010-01-20 Kabushiki Kaisha Toshiba X-ray CT apparatus collimator and X-ray CT apparatus
JP5011482B2 (en) * 2005-07-19 2012-08-29 ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー X-ray CT system
JP4718949B2 (en) * 2005-09-22 2011-07-06 株式会社東芝 X-ray CT apparatus and X-ray CT apparatus manufacturing method
KR100987855B1 (en) * 2006-05-31 2010-10-13 가부시키가이샤 시마즈세이사쿠쇼 Radiation image pick-up device
US20080165922A1 (en) * 2007-01-09 2008-07-10 Brian David Yanoff Laminated ct collimator and method of making same
US7486764B2 (en) * 2007-01-23 2009-02-03 General Electric Company Method and apparatus to reduce charge sharing in pixellated energy discriminating detectors
JP2009232955A (en) * 2008-03-26 2009-10-15 Toshiba Corp X-ray ct apparatus, collimator and manufacturing method of collimator

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6225631B1 (en) * 1995-06-20 2001-05-01 Centre National De La Recherche Scientifique (Cnrs) Non-invasive radio-imaging analysis, in particular for examining small animals in vivo, and method for using same
US6185278B1 (en) * 1999-06-24 2001-02-06 Thermo Electron Corp. Focused radiation collimator
CN101385650A (en) * 2007-09-10 2009-03-18 通用电气公司 Computed tomography system and apparatus

Also Published As

Publication number Publication date
JP6290352B2 (en) 2018-03-07
JP2016026289A (en) 2016-02-12
WO2012036160A1 (en) 2012-03-22
JPWO2012036160A1 (en) 2014-02-03
CN102971644A (en) 2013-03-13
JP2017037084A (en) 2017-02-16

Similar Documents

Publication Publication Date Title
CN102971644B (en) Mo collimating apparatus and use the X-ray detector of this Mo collimating apparatus, X ray checking device and CT device
JP5581321B2 (en) X-ray CT system
US9064611B2 (en) 2D collimator for a radiation detector and method for manufacturing such a 2D collimator
EP1634303B1 (en) Anti-scattering x-ray collimator for ct scanners
CN104246905B (en) The scattering radiation grids of CT detectors
US6304626B1 (en) Two-dimensional array type of X-ray detector and computerized tomography apparatus
JP2012013530A (en) Diffraction grating, method for manufacturing the same, and radiographic device
JP4901919B2 (en) X-ray computed tomography apparatus and X-ray detection apparatus manufacturing method
JP6100631B2 (en) Radiation detection apparatus, radiation tomography apparatus, and method of assembling radiation detection apparatus
US20110081004A1 (en) Secondary collimator and method of making the same
CN102686161B (en) X-ray detector and X-ray CT device
CN103845066A (en) X-ray anti-scatter grid lattice structure, detector device and medical image system
JP2012112882A (en) Grid for radiographic imaging, manufacturing method thereof, and radiographic imaging system
EP2770805A2 (en) X-ray imaging system including flat panel type X-ray generator, X-ray generator, and electron emission device
RU2013157871A (en) STATIONARY DEVICE OF COMPUTER TOMOGRAPHY
JP2009118943A (en) Radiation detector and x-ray ct apparatus
JP2013088265A (en) Radiation collimator and method for manufacturing the radiation collimator
JP5059521B2 (en) Method for producing scattered radiation removal grid
WO2008023430A1 (en) Hollow grid and its manufacturing method
JP2012160339A (en) Battery pack and battery connection method
JP2000193750A (en) Two-dimensional array type x-ray detector, its manufacture, and ct scanner using it
JP5504104B2 (en) Mo collimator, X-ray detector using the same, and CT apparatus
CN219742723U (en) Anti-scattering grid and CT imaging equipment
US11249034B2 (en) X-ray Talbot capturing apparatus
JP2007136050A (en) X-ray detector array

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant