AU2001227891A1 - Lithographic condenser - Google Patents

Lithographic condenser

Info

Publication number
AU2001227891A1
AU2001227891A1 AU2001227891A AU2789101A AU2001227891A1 AU 2001227891 A1 AU2001227891 A1 AU 2001227891A1 AU 2001227891 A AU2001227891 A AU 2001227891A AU 2789101 A AU2789101 A AU 2789101A AU 2001227891 A1 AU2001227891 A1 AU 2001227891A1
Authority
AU
Australia
Prior art keywords
lithographic
condenser
lithographic condenser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001227891A
Inventor
Henry N. Chapman
Keith A. Nugent
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of California
Original Assignee
University of California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of California filed Critical University of California
Publication of AU2001227891A1 publication Critical patent/AU2001227891A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2001227891A 2000-03-14 2001-01-12 Lithographic condenser Abandoned AU2001227891A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09525623 2000-03-14
US09/525,623 US6398374B1 (en) 1998-12-31 2000-03-14 Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography
PCT/US2001/001126 WO2001069321A1 (en) 2000-03-14 2001-01-12 Lithographic condenser

Publications (1)

Publication Number Publication Date
AU2001227891A1 true AU2001227891A1 (en) 2001-09-24

Family

ID=24093998

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001227891A Abandoned AU2001227891A1 (en) 2000-03-14 2001-01-12 Lithographic condenser

Country Status (3)

Country Link
US (1) US6398374B1 (en)
AU (1) AU2001227891A1 (en)
WO (1) WO2001069321A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001009684A1 (en) * 1999-07-30 2001-02-08 Carl Zeiss Control of the distribution of lighting in the exit pupil of an euv lighting system
DE10040998A1 (en) * 2000-08-22 2002-03-14 Zeiss Carl Projection exposure system
US7662263B2 (en) * 2002-09-27 2010-02-16 Euv Llc. Figure correction of multilayer coated optics
DE10317667A1 (en) * 2003-04-17 2004-11-18 Carl Zeiss Smt Ag Optical element for a lighting system
JP2005141158A (en) * 2003-11-10 2005-06-02 Canon Inc Illumination optical system and aligner
US7405871B2 (en) * 2005-02-08 2008-07-29 Intel Corporation Efficient EUV collector designs
US7917244B2 (en) * 2007-03-14 2011-03-29 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for reducing critical dimension side-to-side tilting error
JP4986754B2 (en) * 2007-07-27 2012-07-25 キヤノン株式会社 Illumination optical system and exposure apparatus having the same
US7872245B2 (en) * 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
US8757812B2 (en) * 2008-05-19 2014-06-24 University of Washington UW TechTransfer—Invention Licensing Scanning laser projection display devices and methods for projecting one or more images onto a surface with a light-scanning optical fiber
JP5061063B2 (en) * 2008-05-20 2012-10-31 ギガフォトン株式会社 Extreme ultraviolet light mirror and extreme ultraviolet light source device
JP6571092B2 (en) * 2013-09-25 2019-09-04 エーエスエムエル ネザーランズ ビー．ブイ． Beam delivery apparatus and method
US10823943B2 (en) * 2018-07-31 2020-11-03 Kla Corporation Plasma source with lamp house correction

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4521087A (en) * 1983-05-23 1985-06-04 International Business Machines Corporation Optical system with diffuser for transformation of a collimated beam into a self-luminous arc with required curvature and numerical aperture
US5581605A (en) * 1993-02-10 1996-12-03 Nikon Corporation Optical element, production method of optical element, optical system, and optical apparatus
US5361292A (en) * 1993-05-11 1994-11-01 The United States Of America As Represented By The Department Of Energy Condenser for illuminating a ring field
US5737137A (en) * 1996-04-01 1998-04-07 The Regents Of The University Of California Critical illumination condenser for x-ray lithography

Also Published As

Publication number Publication date
US6398374B1 (en) 2002-06-04
WO2001069321A1 (en) 2001-09-20

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