ZA858487B - Semi-transferred arc in a liquid stabilized plasma generator and method for utilizing the same - Google Patents

Semi-transferred arc in a liquid stabilized plasma generator and method for utilizing the same

Info

Publication number
ZA858487B
ZA858487B ZA858487A ZA858487A ZA858487B ZA 858487 B ZA858487 B ZA 858487B ZA 858487 A ZA858487 A ZA 858487A ZA 858487 A ZA858487 A ZA 858487A ZA 858487 B ZA858487 B ZA 858487B
Authority
ZA
South Africa
Prior art keywords
semi
utilizing
same
plasma generator
transferred arc
Prior art date
Application number
ZA858487A
Other languages
English (en)
Inventor
Jay F Schnackel
Karel Zverina
Original Assignee
Plasmafusion Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasmafusion Inc filed Critical Plasmafusion Inc
Publication of ZA858487B publication Critical patent/ZA858487B/xx

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K10/00Welding or cutting by means of a plasma
    • B23K10/02Plasma welding
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/341Arrangements for providing coaxial protecting fluids
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/36Circuit arrangements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/42Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/48Generating plasma using an arc
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/3421Transferred arc or pilot arc mode
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/3494Means for controlling discharge parameters

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Nozzles (AREA)
  • Physical Vapour Deposition (AREA)
ZA858487A 1984-11-13 1985-11-05 Semi-transferred arc in a liquid stabilized plasma generator and method for utilizing the same ZA858487B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/670,636 US4642440A (en) 1984-11-13 1984-11-13 Semi-transferred arc in a liquid stabilized plasma generator and method for utilizing the same

Publications (1)

Publication Number Publication Date
ZA858487B true ZA858487B (en) 1986-06-25

Family

ID=24691200

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA858487A ZA858487B (en) 1984-11-13 1985-11-05 Semi-transferred arc in a liquid stabilized plasma generator and method for utilizing the same

Country Status (8)

Country Link
US (1) US4642440A (xx)
EP (1) EP0182560A3 (xx)
JP (1) JPS61133159A (xx)
KR (1) KR900000507B1 (xx)
CN (1) CN85108977A (xx)
AU (1) AU557185B2 (xx)
BR (1) BR8505838A (xx)
ZA (1) ZA858487B (xx)

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US4853250A (en) * 1988-05-11 1989-08-01 Universite De Sherbrooke Process of depositing particulate material on a substrate
US5041713A (en) * 1988-05-13 1991-08-20 Marinelon, Inc. Apparatus and method for applying plasma flame sprayed polymers
US4902870A (en) * 1989-03-31 1990-02-20 General Electric Company Apparatus and method for transfer arc cleaning of a substrate in an RF plasma system
DD299613A7 (de) * 1990-02-26 1992-04-30 �������@������������@��k�� Verfahren zum stabilen betrieb von plasmatrons mit wasserdampf als plasmagas
EP0586756B1 (en) * 1990-05-29 2002-04-17 Sulzer Metco AG Plasma systems for thermal spraying of powders
US5225655A (en) * 1990-05-29 1993-07-06 Electro-Plasma, Inc. Plasma systems having improved thermal spraying
FR2714763B1 (fr) * 1993-12-30 1996-03-15 Framatome Sa Procédé et dispositif de réalisation d'un revêtement protecteur étanche sur une surface d'un composant de réacteur nucléaire et applications.
US5560844A (en) * 1994-05-26 1996-10-01 Universite De Sherbrooke Liquid film stabilized induction plasma torch
IL111063A0 (en) * 1994-09-26 1994-12-29 Plas Plasma Ltd A method for depositing a coating onto a substrate by means of thermal spraying and an apparatus for carrying out said method
EP0727504A3 (en) * 1995-02-14 1996-10-23 Gen Electric Plasma coating process for improved adhesive properties of coatings on objects
FR2836157B1 (fr) * 2002-02-19 2004-04-09 Usinor Procede de nettoyage de la surface d'un materiau enduit d'une susbstance organique, generateur et dispositif de mise en oeuvre
WO2004010747A1 (en) * 2002-07-19 2004-01-29 International Association Interm Plasmatron for spraying of coatings
WO2006059808A1 (ja) * 2004-12-03 2006-06-08 Kabushiki Kaisha Toyota Jidoshokki 液中プラズマ用電極、液中プラズマ発生装置および液中プラズマ発生方法
US8609196B2 (en) 2009-06-10 2013-12-17 Kennametal Inc. Spallation-resistant multilayer thermal spray metal coatings
US9034199B2 (en) 2012-02-21 2015-05-19 Applied Materials, Inc. Ceramic article with reduced surface defect density and process for producing a ceramic article
US9212099B2 (en) 2012-02-22 2015-12-15 Applied Materials, Inc. Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
US9090046B2 (en) 2012-04-16 2015-07-28 Applied Materials, Inc. Ceramic coated article and process for applying ceramic coating
US20130288037A1 (en) * 2012-04-27 2013-10-31 Applied Materials, Inc. Plasma spray coating process enhancement for critical chamber components
US9604249B2 (en) 2012-07-26 2017-03-28 Applied Materials, Inc. Innovative top-coat approach for advanced device on-wafer particle performance
US9343289B2 (en) 2012-07-27 2016-05-17 Applied Materials, Inc. Chemistry compatible coating material for advanced device on-wafer particle performance
US9865434B2 (en) 2013-06-05 2018-01-09 Applied Materials, Inc. Rare-earth oxide based erosion resistant coatings for semiconductor application
US9850568B2 (en) 2013-06-20 2017-12-26 Applied Materials, Inc. Plasma erosion resistant rare-earth oxide based thin film coatings
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts
CN108405873A (zh) * 2018-04-26 2018-08-17 白西燕 一种纳米金属微粉制备方法及其制备系统

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Also Published As

Publication number Publication date
BR8505838A (pt) 1986-08-12
AU557185B2 (en) 1986-12-11
EP0182560A3 (en) 1987-08-12
CN85108977A (zh) 1986-11-19
KR870005560A (ko) 1987-06-09
AU4936085A (en) 1986-05-22
JPS61133159A (ja) 1986-06-20
US4642440A (en) 1987-02-10
EP0182560A2 (en) 1986-05-28
KR900000507B1 (ko) 1990-01-31

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