WO2024136786A1 - Étiquette de sécurité hybride multicouche - Google Patents

Étiquette de sécurité hybride multicouche Download PDF

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Publication number
WO2024136786A1
WO2024136786A1 PCT/TR2023/050773 TR2023050773W WO2024136786A1 WO 2024136786 A1 WO2024136786 A1 WO 2024136786A1 TR 2023050773 W TR2023050773 W TR 2023050773W WO 2024136786 A1 WO2024136786 A1 WO 2024136786A1
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WIPO (PCT)
Prior art keywords
resist
lithography
security label
security
random
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PCT/TR2023/050773
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English (en)
Inventor
Mustafa Serdar Önses
Nuri Burak KİREMİTLER
Mustafa Kalay
Nail GÜNALTAY
Original Assignee
T.C. Erciyes Universitesi
Kayseri Universitesi Rektorlugu
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Application filed by T.C. Erciyes Universitesi, Kayseri Universitesi Rektorlugu filed Critical T.C. Erciyes Universitesi
Publication of WO2024136786A1 publication Critical patent/WO2024136786A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378—Special inks
    • B42D25/387—Special inks absorbing or reflecting ultraviolet light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/305—Associated digital information
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
    • G09F3/02—Forms or constructions
    • G09F3/0297—Forms or constructions including a machine-readable marking, e.g. a bar code

Definitions

  • the present invention relates to a multi-layered hybrid security label using lithography, which can be produced in harmony with the electronics industry, and a method of production of this label.
  • PUF platforms suitable for direct integration.
  • PUF platforms should be based on stochastic processes and suitable for producing random patterns without the need for an easy and complex infrastructure.
  • These platforms should be able to be integrated with deterministic barcoding processes when necessary.
  • Nanomaterials are randomly positioned in the PUF layer placed under a general electrode. Signals from these randomly distributed electrodes can be read as PUF keys with an integrated circuit.
  • W02010076733A1 relates to a semiconductor device developed for use in the manufacture of PUF.
  • a physical structure inside the device for the purpose of PUF includes a dielectric layer containing lead zinc titanate and silicon deposited thereon.
  • the dielectric layer has a rough surface. By depositing a conductive layer on this rough surface, a resistor with random values can be produced.
  • the patent document numbered CN103124979A is based on trapping the particles on a surface with deterministically determined roughness and using the random patterns obtained in the production of PUF.
  • the present invention relates to a hybrid security label developed using the lithography method, which has its own unique, unclonable structure such as fingerprints for electronic devices with flat surfaces such as processors and antennas, and the production method of this security label, in order to bring solutions to the above-mentioned technical problems and to bring new advantages to the relevant technical field.
  • the main object of the invention is to provide devices with a unique security tag, similar to a fingerprint, creating an unclonable and unique identity for each device.
  • Another object of the invention is to ensure that PUFs are patterned in desired geometries.
  • the security labels obtained in the present invention are obtained by the lithography method. Especially considering the electronics industry, lithography methods are the most common method encountered during the production phase. This allows for the simultaneous production of security labels without the need for any additional processing during the fabrication of electronic integrated circuits. In addition, it is a great advantage of the invention that deterministic and stochastic-based working security processes can be presented on a single label and have different options for production.
  • Another advantage of the invention is that it is possible to create the inner layer structure from multi-layered structures by selecting many methods.
  • the invention has the potential to be used with all electronic devices in general. Because every electronic device contains a fundamental processor or a basic integrated circuit. Since this situation brings with it the use of lithography, it has potential in terms of this application.
  • Figure 1 Particle size control: Particles of different size after electro spraying of resist solutions of different viscosity and soft baking step at 95 °C for the obtained structures.
  • Figure la Particles obtained by direct e-spraying of a commercially available resist solution named SU8-2 (having a viscosity of 45cSt).
  • Figure lb Particles obtained by direct e-spraying of a commercially available resist solution named SU8-10 (having a viscosity of 1050 cSt).
  • Figure 1c Particles obtained by e-spraying diluted resist at a ratio of 3:1 by volume with the use of cyclopentanone for SU8-2 resist.
  • Figure Id Particles obtained by e-spraying diluted resist at a ratio of 3:1 by volume with the use of cyclopentanone for SU8-10 resist.
  • Figure 2a Schematic illustration for electro -spraying
  • Figure 2b Schematic representation for lithography
  • Figure 3 PUF structures patterned in different sizes by maskless lithography; square frames with an edge length of 200-400-600 microns and resist particles randomly distributed within them.
  • Figure 3a Square structure with 200-micron edge length
  • Figure 3b 400-micron edge-length square structure
  • Figure 3c 600-micron edge-length square structure
  • Figure 4 Patterning of the resist particles deposited on the surface with electrospray in the form of a QR code by photolithography.
  • Figure 4a QR code structure forming the outer layer
  • Figure 4b A larger magnification (50x) image of a region selected over the QR code
  • Figure 4c Conversion of a close-up image into a black and white format for clear particle/gap determination
  • Figure 4d Transformation of the black and white image into a 256-bit barcode (inner layer)
  • Figure 5 Images obtained for stability tests; including images taken from the same point before and after each stability test.
  • the invention On the basis of the invention, a security label consisting of inner and outer layers with deterministic and stochastic working principle is obtained.
  • the invention has a multi-layered unclonable label structure.
  • the invention is about the use of randomness to be obtained on the surface with the resist solution used for lithography and creating multi-layered security labels from an outer label layer such as a barcode, QR code, text or shape patterned with lithography as a hybrid security label.
  • the invention provides a system and method for creating a physically unclonable function by accumulating resist solutions on the surface in a way that generates randomness (e.g., through electrospraying).
  • the invention is based on the deposition of resist solutions on the surface (Here, electro spraying process is used for this purpose in the production stage for electronic integration) and also on the methods of patterning the resist structures deposited on the surface with different lithography methods.
  • a resist coating is applied using a coating method that ensures randomness.
  • a coating method that ensures randomness.
  • PUF Physical Unclonable Function
  • the process of shaping the coated resist structure with lithography there is the process of shaping the coated resist structure with lithography.
  • photolithography, laser printing lithography and electron beam lithography methods can be selected for this situation.
  • the polymer-based solution which is called the resist and coated on the surface
  • the photoacid generators the monomers of the resist are activated (for the negative tone resist), the parts that see the light in this way are cross-linked on the surface, while the part that does not see the light maintains its initial state.
  • the development step is carried out with the developer solution included in the lithography step, which may differ for each resist (GBL for the SU8 resist mentioned above). This step is performed by immersing the lithography-treated sample (2) in a solution called developer and washing and rinsing it.
  • a label is produced with a resist layer that includes randomness (position, geometry, color) and when viewed with a larger objective, the random characteristics of the resist coating create a unique pattern.
  • the desired pattern is selected as a deterministic barcode shape, then, in a general framework a barcode will be observed, which is referred to as the outer layer in the invention.
  • the invention differs from the known state of the art by incorporating a coating method (such as electrospray or crystallization), a lithography step (e.g., photolithography, laser print lithography, electron-beam lithography) and image processing, matching and verification algorithms (MATLAB interface).
  • a coating method such as electrospray or crystallization
  • a lithography step e.g., photolithography, laser print lithography, electron-beam lithography
  • image processing, matching and verification algorithms MATLAB interface
  • the deterministic security label for example, the square code structure
  • the structure of the resist on the surface which contains random location, random shape or random color, forms the other security layer stochastically or in other words, with a randomness that cannot be repeated.
  • the first matching layer is a simple barcode, such as a QR code structure.
  • the source of randomness used determines the method to be used.
  • the source of randomness which is the basis of PUF structures, was created with this step.
  • the structure to be expressed by the outer layer refers to the shape of the resist structure on the surface, regardless of how the resist layer is transferred to the surface.
  • this outer layer is a QR code structure.
  • scanning the QR code is a phenomenon that forms the outer layer.
  • it is related to the deposition of the solution, which is called a resist and can be shaped by lithography, at random locations on the surface, not as a normal film. If we need to exemplify over Figure 4, when creating the QR code structure, instead of using a film-shaped resist structure to accumulate the resist layer on the surface as a process step before forming, the resist coating on the surface was preferred with the electrospray process.
  • the object here is to obtain particles in nano-micro sizes at random locations on the surface.
  • An example of this situation is the figure in Figure 4b.
  • a homogeneous film image not a particle, would be obtained on the surface, but the formation of resist particles at random locations was observed by the selected process step (electrospraying).
  • the selected process step electrospraying
  • images taken with a larger objective can first be translated into a black and white form (Figure 4c) and then into a barcode with the desired bit capacity ( Figure 4d) and a library can be created with these barcodes.
  • a library that requires direct image matching can be created without barcode dialing (with Figure 4b).
  • the second layer of security or the inner layer can be created in this way. For this purpose, during the application, the image to be taken from a certain region from the surface and the library can be searched and matching is provided. This process can be performed in a simple way using MATLAB image processing and image analysis algorithms. A security label principle is ensured by the matching status and whether there is a similar shape in the library.
  • a method that can be selected for this purpose is to produce structures that will act as physically unclonable functions (PUF) randomly positioned on surfaces by using electrohydrodynamic instabilities acting on solutions prepared from commercial resistbased materials by electro spraying method on the surface.
  • PAF physically unclonable functions
  • a process can be selected to obtain structures that can show random distribution at different locations on the surface or that are formed by a sub-process made on the surface with de-wetting instability.
  • the deposited resist in the form of a spray on the surface can be used as an PUF structure, which is not possible to obtain different structures in shape and the color differences that will occur in the resist structure.
  • lithography processes are used to create an outer layer that can serve as a deterministic security label for the structures obtained on the surface such as barcode, square code, shape, text. This can be used as the second security layer to be formed by enclosing the PUF structure in the first layer in a suitable outer frame.
  • the invention provides the fabrication method of a unclonable hybrid security label using the lithography method.
  • electrospray method by preparing the resist solutions directly or at appropriate parameters (such as dilution) by exposing the electrohydrodynamic forces to the droplets and depositing them directly on the surfaces to be placed on the collector in solid form in the form of droplets-particle, ensuring that the resist accumulated at random locations on the surface by lithography /maskless lithography /nano-printing method for the purpose of a second label layer is cross-linked on the surface or in the development step specific for each resist and included in the process step, dissolving the area outside the formation of the shape in the solvent for the negative resist exposed to light/electron in the step of removing the unexposed area from the surface, dissolving the area outside the formation of the shape in the solvent, for example, with the gamma-
  • electro spraying equipment mainly consists of four main components.
  • the first of these components is a conductive nozzle with small openings, such as a syringe-like chamber to contain solutions and a syringe needle to be placed at the tip of this chamber.
  • the second component is the syringe pump or a pneumatic feeding system. It ensures a constant volume of solution from the chamber is fed to the conductive end per unit time.
  • the third component is a fixed metal plate or movable cylinder drum positioned at a horizontally or a specific distance opposite the nozzle, which is used as a conductive platform for deposition of formed droplet-particles.
  • the final basic component is the high-voltage source, which is the driving force for the E- spray process.
  • the negative and positive outputs of the high voltage source are connected to the collector and nozzle, creating an electric field that allows the solution to be carried towards the collector spontaneously by the effect of electrostatic forces.
  • the solution from the reservoir is fed to the nozzle by the feeding unit, in the other word to the end of the nozzle.
  • the power supply creates an electric field between the conductive nozzle and the collector.
  • the surface on which the physically unclonable function (function structure) is to be accumulated is placed on this collector.
  • the electrohydrodynamic force generated by this electric field allows the solution sprayed from the nozzle to be scattered in particle form and move towards the collector.
  • the nozzle acts as an outlet for the solution.
  • the lithography method with an maskless laser lithography basically consists of 3 main components.
  • the first is preferably a laser source with a wavelength of 375 nm, which scans the surface by carrying energy onto the surface in order to crosslink the resist or break the bonds with the surface and remove it from the surface.
  • Wavelength can be preferred in the range of 200-400 nm. Selection can be made according to device features and intended use.
  • the second component is a horizontal axis with 3 (x-y-z) axis mobility that works integrated with various computer program interfaces where the substrate is placed under this laser source.
  • the vacuum pump that will perform the vacuum environment needed in the realization of the process and provide the vacuum conditions in the closed box where the system is located from the position of the horizontal axis.
  • surfaces with negative resist-based random structures produced by electro spraying on them are placed on the table with holes that allow them to be pulled with vacuum in order not to be affected by mechanical movements in the system.
  • a UV laser is focused on the surface by bringing it to the appropriate vertical distance with the surface by applying procedures that vary according to the laser lithography device used.
  • the coordinate/CAD programs and previously designed barcode geometries are transferred to the table and the UV laser scans the desired surface regions linearly with the movement of the table and treats these regions with light at the appropriate wavelength (exposure).
  • Resist forming PUF structures which are treated with light in sufficient time, form chemical bonds with each other. Then, with the development process, the structures in the regions that do not see light are removed from the environment by washing the surface in a suitable solvent, while the particles in the exposed areas remain in the location where they are located since they become chemically insoluble in the relevant solvent. As a result, PUFs are patterned in desired geometries.
  • the method of the invention can be applied with masked lithography methods other than maskless direct laser lithography.
  • Masks previously designed as security barcodes can be positioned on the electro sprayed surface. Because although the barcode structure is the same, the electro sprayed resist structure in it is unique for each produced sample (2).
  • operations can be performed with masked lithography. In this way, instead of using lasers for hours, the use of UV light sources in seconds can provide a great advantage in terms of speed, cost, practicality and mass production.
  • the masked lithography system also basically consists of 3 main components.
  • the first component is the UV light source that will allow the resist to be dosed, the UV source with a wavelength of 350 nm can transfer 13 kJ energy to the surface per second, thus ensuring a faster process.
  • the second component consists of the plane on the horizontal axis with the vacuum pump connected 3-axis movement in which the substrate is placed.
  • the third component is the mask (1) slot located between the UV light source and the substrate plane, designed for placing the middle mask (1), which is an integrated structure in the substrate plane.
  • the mask slot has a vacuum connection structure and can be disassembled and attached depending on the size of the mask (1) in order to keep the mask stable.
  • the last main component is the designed mask.
  • Glass, ceramic, metal or plastic structures can be preferred for the design of the mask (1), which can consist of various materials.
  • masks (1) designed with PUF structures electro sprayed on the surface as in the prior art and mask (1) alignment device ensure that the masks are aligned at the desired position on the surface.
  • Lithography masks are prepared with the principle that the UV light used can pass through unmasked areas and cannot pass through masked areas.
  • the PUF structures under the light-conducting regions of the produced masks are dosed with UV light and made chemically insoluble as in the previous method.
  • PUF structures formed at random locations by electro spraying method are obtained by using different viscosity resist solutions directly or by preparing (such as dilution). Different resists have been electro sprayed to illustrate the inventive concept regarding the availability of PUF structures of different sizes and geometries in the use of solutions of different viscosity.
  • the prepared solutions are electro sprayed onto different sized substrates taped with carbon tape on a movable conductor collector (in one example, a 70 mm diameter 100 mm wide metal rotary drum) or a stationary collector (in one example, a 100 mm x 200 mm steel leva) to produce random patterns deposited spontaneously on these substrates.
  • a movable conductor collector in one example, a 70 mm diameter 100 mm wide metal rotary drum
  • a stationary collector in one example, a 100 mm x 200 mm steel leva
  • the distance of the nozzle collector is 15 cm
  • the solution feed rate is 0.5 to 2 ml/h (h)
  • the applied voltage is 15 to 22 kV
  • the deposition time is 10 to 30 seconds.
  • PUF structures can be formed by electro spraying on a wide variety of substrates such as silicon, glass, metal surfaces, electronic chips and integrated circuits.
  • the first step of barcode formation is performed as a result of crosslinking of the resist to the surface or disconnection from the surface for the desired pattern.
  • solutions of different viscosities called SU8 were used. While this process is performed for the use of maskless lithography, the scanning speed of the laser is set in the range of 0.1-1 mm/s, the width of the laser on the surface is set to 1 micron, and the step range of the laser is set to 1-2 microns. Since the parameters here determine the amount of resist that will crosslink on the surface, optimum results were determined by experimenting with different speeds and different step intervals in the studies.
  • the barcode/QR code structure which exhibits the desired characteristics, can be read on the smartphone camera and the first stage of matching or label work can be carried out.
  • the unique patterns created by the resist on the surface are taken for each pixel in the large pattern through an optical microscope or lens integrated into the phone camera; the images are examined by various image analyzes applied through the computer program, and the unique random structure of each PUF structure is converted into binary keys consisting of 0 and Is and these keys are converted into 256-bit binary barcode shapes.
  • Randomness, homogeneity and uniqueness ratio and Hamming distances are analyzed from the images of the produced patterns to reveal the potential to be used as a PUF.
  • the application to be authentic ated-PUF structures integrated into the object or produced directly on it can be used for the authentication of that asset.
  • Exemplary embodiments of the invention Exemplary Embodiment 1:
  • continuous PUF structures were formed on silicon substrate of cumulatively controllable morphology and size thanks to SU8 solutions of different viscosities and different electro spraying parameters applied while creating patterned areas consisting of random PUF structures.
  • two different SU8 solutions with a viscosity of 45 cSt and 1050 cSt (stock per cent) were electro sprayed.
  • the solutions of SU8 (a kind of epoxy-based resist solution containing a resin group) to be electro sprayed were first taken into syringes with a volume of 10 mL. The syringe was used as a conductive nozzle with a flat tip at 18g opening.
  • Electro spraying was carried out by depositing 10x10 mm 2 surfaces on silicon substrates treated with fluoroalkyl silane molecules in the gas phase through carbon tape on the metal drum located at a horizontal distance of 15 cm from the syringe tip.
  • the solution was electro sprayed on these substrates at different solution feed rates (0.25, 0.5, 1, 1.5 and 2 mL/h) with different potential differences (15, 19 and 22 kV).
  • These structures were subjected to a preheating process called soft baking in order to increase the adhesion of the PUF structures, which are continuously accumulated on the electro sprayed surfaces, with the surface and to ensure shape homogeneity.
  • This process was carried out by holding the substrates containing PUF on a heating table at 95 °C for 5 minutes.
  • the application of different electro spraying parameters followed by the soft baking process is shown in Figure 1, where cumulatively average sizes of controllable PUF structures can be obtained.
  • the obtained structures were cross-linked under UV light with a wavelength of 365 nm
  • deposition was made on silicon substrates treated with fluoroalkyl silane molecules using two different SU8 resist solutions with different viscosity (45-1050 cSt) by electro spraying. 15-22 kV was selected as the potential difference applied during electro spraying and 0.25 to 2 mE/h as the solution feed rate.
  • the obtained PUF structures were subjected to soft baking by holding the substrates containing PUF on a hotplate at a temperature of 95°C for 5 minutes.
  • the layer of resist particles formed at random locations on the substrate was patterned in maskless lithography in order to apply the PUF structures as the second layer in order to be able to be patterned in specific regions.
  • the patterning process was carried out in square geometries of different sizes (200x200, 400x400, 600x600 pm 2 ).
  • the pattern structure in the desired geometries was realized by scanning the area on the silicon substrate of the UV laser at the coordinates entered in the CAD program.
  • the laser was selected as full power (1 Watt), the scanning speed as 0.1 mm per second, and the laser scanning step range as 1 micron. Due to the character of the SU8 resist, the resist is cross-linked where the negative laser scans.
  • the development process is carried out. This step is performed by immersing the resist in the SU8 developer for 45 seconds in order to remove the parts of the resist that are not exposed to scanning from the surface, and then a 30-second immersion is performed in the propanol to clean the developer solution on the surface.
  • the production steps of the patterned PUF structures are schematized.
  • SU8 PUFs patterned on square areas of different sizes are given.
  • Non-copyable keys were extracted from PUF structures patterned in different sizes and geometries. This process takes place by taking images from the surface at different magnifications with the use of an optical microscope, examining them with various image analyzes applied through the MATLAB program, and obtaining 256-bit binary codes from random PUF structures.
  • Figure 4 shows the extraction of the keys consisting of 0 and 1 bits obtained from a region consisting of a patterned PUF.
  • the SU8 resist (with a viscosity of 45 cSt) was deposited on the silicon substrate by electrospraying and then patterned in the form of QR codes by masked lithography method.
  • a 2-step authentication/security label was created.
  • electro spraying 1 mL/h feed rate and 19 kV potential difference were used as parameters.
  • Electro spraying was performed on surface modified silicon substrates with fluoroalkyl silane for 30 seconds.
  • the continuous PUF structure produced was subjected to preheating at 95°C for 5 minutes.
  • barcode transfer to the surface was performed using masked lithography.
  • the mask with a barcode shape on it is a glass-based structure.
  • the barcode structure to be transferred to the surface in these masks is designed to have 25x25 square and each square has 2-micron edge length. In order to create the desired barcode structure, some squares are transparent, and some squares are opaque within the barcode area on the mask (1).
  • the pattern created by the PUF structures in the selected unit square regions within the QR code structure is displayed with an optical microscope, and then 256-bit unclonable security keys are extracted from each specific image region in the MATLAB program.
  • PUF structures with 2-layer security verification produced by masked (1) lithography are defined.
  • solid patterns in the form of random, non-reproducible particle-droplets can be obtained by electro spraying SU8 solutions, and the usability of these patterns as PUF structures has been shown.
  • Unique 256-bit physical security switches were obtained with electrospray PUFs.
  • barcode structure can be observed with a smartphone camera; patterns consisting of random electrospray resist structures can be viewed directly under a light microscope. Controlling the structure-dimension scale at certain levels thanks to both the barcode structure and the electro spraying process ensures that this imaging process can also be done with lenses integrated into a smartphone.
  • a highly durable reusable PUF system is defined, which is produced using both maskless and masked lithography techniques under chemical effects and high temperature.
  • the stability of the patterned PUF systems, created with appropriate electrospray parameters and lithography procedures, is tested before and after prolonged exposure to high temperatures and organic solvents. The results demonstrate the chemical resistance and stability of the PUF system under challenging conditions, ensuring its long-term viability and repeatability of PUF keys.
  • PUF patterns produced in the form of QR codes have yielded 256-bit codes containing PUF keys. Subsequently, the samples (2) were heated at temperatures of 300°C and 450°C for 72 hours each. After each heating step, PUF morphology was compared with its preheating state by imaging under an optical microscope. No morphologically significant change was observed in PUF structures. On the other hand, the keys extracted before heating matched the keys extracted after heating.
  • An outer label layer which serves as the first matching layer, patterned with the lithography printing method to create multi-layered security labels and the use of nonrepeatable randomness obtained on the surface with the resist solution,
  • Lithography /maskless lithography/nano for the purpose of a second label layer (the situation intended to be expressed here, the main purpose of the photolithography process is to shape the solution called resist and in which we cover the surface with the use of a light source or electrons of appropriate wavelengths.
  • this process is carried out by clinging and forming the shape of the resist on the surface by cross-linking.) cross-linking of the resist accumulating at random locations on the surface by the printing method (When the resist interacts with UV light, photoacid generators in the resist are activated, this activates resin-based chemical monomers and starts to bond with the end part that wants to bond within the chemical structure, and as a result, a stable resist structure is obtained on the surface with the realization of a cross-linking.
  • this situation does not occur in the points that do not interact with the light, and these nonbonding parts in the developer solution form a bond with the solution and are ultimately removed from the surface) and by washing with the developer and removing from the surface, creating multi-layered security barcodes patterned on the surface in desired geometries (formation of irregular polygonal (such as hexagonal, octagonal) structures and formation of circular structures in general have been observed).
  • Lithography is performed to transfer the pattern structure determined as barcode on the surface after the production of random patterns that exhibit the desired characteristic features (for example, particles in random locations in each microscope image taken, particles with different geometry, structures that show different color formation according to their size when subjected to heat treatment, exhibit a characteristic structure that cannot be repeated for each particle).
  • desired characteristic features for example, particles in random locations in each microscope image taken, particles with different geometry, structures that show different color formation according to their size when subjected to heat treatment, exhibit a characteristic structure that cannot be repeated for each particle).
  • the above-mentioned lithography method can be applied in the invention with or without a mask.
  • the invention in question is a security label with a deterministic and stochastic working logic, characterized in that it comprises the following:
  • At least one deterministic outer layer with barcode structure which is the first matching layer and has different shapes formed by the resist structure in random position, geometry and colors formed by the resistive structure on the surface.
  • Other preferred embodiments of the invention comprise the following:
  • the resist coating is a resist coating made by electro-spraying Different dyes or polymers in order to increase the number of security layers.
  • the mentioned dyes are Rhodamine, Coumarin, Methylene Blue or Quantum dots.
  • the inner layer has random colors to be used as a security label in the inner layer.
  • the QR code serving as a deterministic security label for reading the outer layer using a smart device or camera is barcode, QR code, shape or text.
  • the resist mentioned in the method is a polymer-based solution coated on the surface.
  • the resist which can be shaped by the lithography mentioned in the art, is applied on the surface by accumulating at random locations, not as film.
  • the coating method with randomness mentioned in the method is the application of the electro-spraying method or the crystallization method using crystalline polymers with random irradiation in order to obtain at random locations by providing nanomicro -sized particle formation at random locations on the surface.
  • Photolithography laser printing lithography, electron beam lithography, masked or maskless lithography methods are used instead of the lithography method mentioned in the method.
  • the invention comprises the following:

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Abstract

L'invention concerne l'utilisation de la lithographie et une étiquette de sécurité hybride multicouche, qui peut être produite de façon à s'harmoniser avec l'industrie électronique, et le procédé de production de cette étiquette.
PCT/TR2023/050773 2022-12-20 2023-08-03 Étiquette de sécurité hybride multicouche WO2024136786A1 (fr)

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TR2022019755 2022-12-20
TR2022/019755 2022-12-20
TR2023/002032 2023-02-23
TR2023002032 2023-02-23

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995029475A1 (fr) * 1994-04-22 1995-11-02 Aquasol Limited Etiquette de securite
US6207240B1 (en) * 1998-08-14 2001-03-27 Clariant Gmbh Laser marking of effect coatings
US20110133445A1 (en) * 2009-12-08 2011-06-09 Sicpa Holding S.A. Marking based on modified chiral liquid crystal polymers

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995029475A1 (fr) * 1994-04-22 1995-11-02 Aquasol Limited Etiquette de securite
US6207240B1 (en) * 1998-08-14 2001-03-27 Clariant Gmbh Laser marking of effect coatings
US20110133445A1 (en) * 2009-12-08 2011-06-09 Sicpa Holding S.A. Marking based on modified chiral liquid crystal polymers

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