WO2024129837A1 - Reduction of ferrous iron from azole-treated wastewater - Google Patents
Reduction of ferrous iron from azole-treated wastewater Download PDFInfo
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- WO2024129837A1 WO2024129837A1 PCT/US2023/083800 US2023083800W WO2024129837A1 WO 2024129837 A1 WO2024129837 A1 WO 2024129837A1 US 2023083800 W US2023083800 W US 2023083800W WO 2024129837 A1 WO2024129837 A1 WO 2024129837A1
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- Prior art keywords
- iron
- dosed
- wastewater stream
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- adjusted
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- 239000002351 wastewater Substances 0.000 title claims abstract description 168
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 title claims abstract description 28
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 title description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 171
- 229910052742 iron Inorganic materials 0.000 claims abstract description 86
- 239000000126 substance Substances 0.000 claims abstract description 67
- 238000000034 method Methods 0.000 claims abstract description 62
- 238000000926 separation method Methods 0.000 claims abstract description 43
- 239000007787 solid Substances 0.000 claims abstract description 33
- 239000007788 liquid Substances 0.000 claims abstract description 30
- 150000002506 iron compounds Chemical class 0.000 claims abstract description 28
- 229910001868 water Inorganic materials 0.000 claims abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 26
- -1 azole compound Chemical class 0.000 claims abstract description 25
- 238000005498 polishing Methods 0.000 claims abstract description 18
- 239000000047 product Substances 0.000 claims abstract description 17
- 239000002699 waste material Substances 0.000 claims abstract description 17
- 238000006243 chemical reaction Methods 0.000 claims abstract description 14
- 239000002244 precipitate Substances 0.000 claims abstract description 6
- 238000010979 pH adjustment Methods 0.000 claims description 25
- 238000001914 filtration Methods 0.000 claims description 14
- 230000005484 gravity Effects 0.000 claims description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 238000011144 upstream manufacturing Methods 0.000 claims description 7
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 claims description 6
- 235000008733 Citrus aurantifolia Nutrition 0.000 claims description 4
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 4
- 235000011941 Tilia x europaea Nutrition 0.000 claims description 4
- 238000004891 communication Methods 0.000 claims description 4
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 4
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 claims description 4
- 229910000360 iron(III) sulfate Inorganic materials 0.000 claims description 4
- 239000004571 lime Substances 0.000 claims description 4
- 239000012528 membrane Substances 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 150000003851 azoles Chemical class 0.000 description 20
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 15
- 238000011282 treatment Methods 0.000 description 13
- 235000012431 wafers Nutrition 0.000 description 10
- 239000007800 oxidant agent Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 235000014413 iron hydroxide Nutrition 0.000 description 5
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 5
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical class [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000010977 unit operation Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical class [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000005189 flocculation Methods 0.000 description 2
- 230000016615 flocculation Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001471 micro-filtration Methods 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- 238000004065 wastewater treatment Methods 0.000 description 2
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical compound C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 1
- FKASFBLJDCHBNZ-UHFFFAOYSA-N 1,3,4-oxadiazole Chemical compound C1=NN=CO1 FKASFBLJDCHBNZ-UHFFFAOYSA-N 0.000 description 1
- MBIZXFATKUQOOA-UHFFFAOYSA-N 1,3,4-thiadiazole Chemical compound C1=NN=CS1 MBIZXFATKUQOOA-UHFFFAOYSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical compound C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 1
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 1
- UHGULLIUJBCTEF-UHFFFAOYSA-N 2-aminobenzothiazole Chemical compound C1=CC=C2SC(N)=NC2=C1 UHGULLIUJBCTEF-UHFFFAOYSA-N 0.000 description 1
- JMTMSDXUXJISAY-UHFFFAOYSA-N 2H-benzotriazol-4-ol Chemical class OC1=CC=CC2=C1N=NN2 JMTMSDXUXJISAY-UHFFFAOYSA-N 0.000 description 1
- NNRAOBUKHNZQFX-UHFFFAOYSA-N 2H-benzotriazole-4-thiol Chemical class SC1=CC=CC2=C1NN=N2 NNRAOBUKHNZQFX-UHFFFAOYSA-N 0.000 description 1
- YTZPUTADNGREHA-UHFFFAOYSA-N 2h-benzo[e]benzotriazole Chemical compound C1=CC2=CC=CC=C2C2=NNN=C21 YTZPUTADNGREHA-UHFFFAOYSA-N 0.000 description 1
- ZDWPBMJZDNXTPG-UHFFFAOYSA-N 2h-benzotriazol-4-amine Chemical class NC1=CC=CC2=C1NN=N2 ZDWPBMJZDNXTPG-UHFFFAOYSA-N 0.000 description 1
- KFJDQPJLANOOOB-UHFFFAOYSA-N 2h-benzotriazole-4-carboxylic acid Chemical compound OC(=O)C1=CC=CC2=NNN=C12 KFJDQPJLANOOOB-UHFFFAOYSA-N 0.000 description 1
- UCFUJBVZSWTHEG-UHFFFAOYSA-N 4-(2-methylphenyl)-2h-triazole Chemical compound CC1=CC=CC=C1C1=CNN=N1 UCFUJBVZSWTHEG-UHFFFAOYSA-N 0.000 description 1
- XQHCBHNLRWLGQS-UHFFFAOYSA-N 4-(3-methylphenyl)-2h-triazole Chemical compound CC1=CC=CC(C2=NNN=C2)=C1 XQHCBHNLRWLGQS-UHFFFAOYSA-N 0.000 description 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 1
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 1
- JQSSWPIJSFUBKX-UHFFFAOYSA-N 5-(2-methylpropyl)-2h-benzotriazole Chemical compound C1=C(CC(C)C)C=CC2=NNN=C21 JQSSWPIJSFUBKX-UHFFFAOYSA-N 0.000 description 1
- PZBQVZFITSVHAW-UHFFFAOYSA-N 5-chloro-2h-benzotriazole Chemical compound C1=C(Cl)C=CC2=NNN=C21 PZBQVZFITSVHAW-UHFFFAOYSA-N 0.000 description 1
- ZWTWLIOPZJFEOO-UHFFFAOYSA-N 5-ethyl-2h-benzotriazole Chemical compound C1=C(CC)C=CC2=NNN=C21 ZWTWLIOPZJFEOO-UHFFFAOYSA-N 0.000 description 1
- SUPSFAUIWDRKKZ-UHFFFAOYSA-N 5-methoxy-2h-benzotriazole Chemical compound C1=C(OC)C=CC2=NNN=C21 SUPSFAUIWDRKKZ-UHFFFAOYSA-N 0.000 description 1
- CCBSHAWEHIDTIU-UHFFFAOYSA-N 5-propyl-2h-benzotriazole Chemical compound CCCC1=CC=C2NN=NC2=C1 CCBSHAWEHIDTIU-UHFFFAOYSA-N 0.000 description 1
- 241000251468 Actinopterygii Species 0.000 description 1
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical group NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000195493 Cryptophyta Species 0.000 description 1
- 239000012028 Fenton's reagent Substances 0.000 description 1
- 241000820057 Ithone Species 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000009303 advanced oxidation process reaction Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000007980 azole derivatives Chemical class 0.000 description 1
- 231100000693 bioaccumulation Toxicity 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 235000003891 ferrous sulphate Nutrition 0.000 description 1
- 239000011790 ferrous sulphate Substances 0.000 description 1
- 239000008394 flocculating agent Substances 0.000 description 1
- JKFAIQOWCVVSKC-UHFFFAOYSA-N furazan Chemical compound C=1C=NON=1 JKFAIQOWCVVSKC-UHFFFAOYSA-N 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- MGZTXXNFBIUONY-UHFFFAOYSA-N hydrogen peroxide;iron(2+);sulfuric acid Chemical compound [Fe+2].OO.OS(O)(=O)=O MGZTXXNFBIUONY-UHFFFAOYSA-N 0.000 description 1
- 125000001867 hydroperoxy group Chemical group [*]OO[H] 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 238000005374 membrane filtration Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000002674 ointment Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- YGNGABUJMXJPIJ-UHFFFAOYSA-N thiatriazole Chemical compound C1=NN=NS1 YGNGABUJMXJPIJ-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
Definitions
- aspects and embodiments disclosed herein relate to systems and methods for the reduction of iron from azole-treated chemical-mechanical polishing (CMP) wastewater.
- CMP chemical-mechanical polishing
- a method of removing iron from a wastewater stream including chemical mechanical polishing wastewater from which an azole compound has been previously removed by a Fenton’s reaction comprises adding an iron-containing chemical to the w astew ater stream to form an iron-dosed wastewater stream, adjusting a pH of the iron-dosed wastewater stream to a pH at which an iron compound precipitates from the iron-dosed wastewater stream, and performing solid/liquid separation on the pH-adjusted iron-dosed wastewater stream to separate the pH- adjusted iron-dosed wastewater stream into an iron-treated water stream with an iron concentration less than an iron concentration of the pH-adjusted iron-dosed wastewater stream and a waste product including the iron compound.
- adding the iron-containing chemical to the wastewater stream includes adding one of ferric sulfate or ferric chloride to the wastewater stream.
- adjusting the pH of the iron-dosed w astew ater stream includes adding one of sodium hydroxide or lime to the iron-dosed w astew ater stream.
- performing solid/liquid separation on the pH-adjusted iron- dosed wastewater stream includes performing a filtration operation on the pH-adjusted iron- dosed wastewater stream. In some embodiments, performing the filtration operation on the pH-adjusted iron- dosed wastewater stream includes filtering the pH-adjusted iron-dosed wastewater stream with a membrane filter.
- performing the filtration operation on the pH-adjusted iron- dosed wastewater stream includes filtering the pH-adjusted iron-dosed wastewater stream with one of a microfilter or an ultrafilter.
- performing solid/liquid separation on the pH-adjusted iron- dosed wastewater stream includes treating the pH-adjusted iron-dosed wastewater stream in a gravity -based separation system.
- the method further comprises facilitating solid/liquid separation of the pH-adjusted iron-dosed wastewater stream by adding a flocculant to the pH- adjusted iron-dosed wastewater stream one of upstream of or within the gravity -based separation system.
- the method further comprises facilitating solid/liquid separation of the pH-adjusted iron-dosed wastewater stream by adding a ballasting agent to the pH-adjusted iron-dosed wastewater stream one of upstream of or within the gravity-based separation system.
- adding the ballasting agent to the pH-adjusted iron-dosed wastewater stream one of upstream of or within the gravity-based separation system includes adding magnetite to the pH-adjusted iron-dosed wastewater stream.
- the method further comprises recovering magnetite from solids separated from the pH-adjusted iron-dosed wastewater stream.
- performing solid/liquid separation on the pH-adjusted iron- dosed wastewater stream includes removing silica from the pH-adjusted iron-dosed w astewater stream.
- the method results in the low- iron treated water stream having an iron concentration of less than 2 mg/1.
- the method results in the low iron treated water stream having an iron concentration of less than 0.5 mg/1.
- the method further comprises performing dewatering on the waste product.
- performing the dewatering includes removing water from the waste product in a filter press.
- method of treating chemical mechanical polisher (CMP) wastewater comprises removing an azole compound from the CMP wastewater via a Fenton’s reaction to form a second wastewater stream, adding an iron-containing chemical to the second w astew ater stream to form an iron- dosed wastewater stream, adjusting a pH of the iron-dosed wastewater stream to precipitate an iron compound from the iron-dosed waste ater stream, and separating the pH-adjusted iron-dosed wastewater stream into a treated water stream and a waste product including the iron compound.
- CMP chemical mechanical polisher
- a system for removing iron from chemical mechanical polishing wastew ater from which an azole compound has been previously removed by a Fenton’s reaction comprises a source of an iron- containing chemical configured to dose the wastewater stream with the iron-containing chemical and produce an iron-dosed w astew ater stream, a source of pH adjustment chemical configured to dose the iron-dosed w astewater stream with a sufficient amount of the pH adjustment chemical to cause an iron compound to precipitate from the iron-dosed wastewater stream, and a solid/liquid separation sub-system configured to separate the pH- adjusted iron-dosed wastewater stream into a treated water stream and a waste product including the iron compound.
- a method of facilitating removal of iron from chemical mechanical polishing wastewater from which an azole compound has been previously removed by a Fenton’s reaction comprises connecting a source of an iron-containing chemical to one of a vessel or conduit through which the w astew ater passes, the source of the iron-containing chemical configured to dose the wastewater stream with the iron- containing chemical and produce an iron-dosed wastewater stream, connecting a source of pH adjustment chemical to one of a vessel or conduit through w hich the iron- dosed wastewater stream passes, the source of pH adjustment chemical configured to dose the iron-dosed wastewater stream with a sufficient amount of the pH adjustment chemical to cause an iron compound to precipitate from the iron-dosed wastewater stream, and providing a solid/liquid separation sub-system configured to receive the pH-adjusted iron-dosed wastewater stream and separate the pH-adjusted iron-dosed wastewater stream into a treated water stream and a w aste product including the iron compound.
- the method further comprises providing a controller in communication with one of the source of iron-containing chemical or the source of pH adjustment chemical and configured to control an amount of chemical dosed by the one of the source of iron-containing chemical or the source of pH adjustment chemical based upon one or more measured parameters of one or more of the wastewater stream, the iron-dosed wastewater stream, or the pH-adjusted iron-dosed wastewater stream.
- FIG. 1 illustrates an example of a system as disclosed herein.
- the CMP planarization process involves a polishing comprising an oxidant, and abrasive, complexing agents, and additional additives to remove and/or etch semiconducting wafers during the manufacturing process.
- the polishing is performed with a polishing pad to remove excess copper from the semiconductor wafers. Silicon, copper, and various trace metals are removed from the silicon structure via the polishing slurry.
- the polishing slurry is introduced to the silicon wafer on a planarization table in conj unction with polishing pads. Oxidizing agents and etching solutions are introduced to control the removal of material.
- Ultrapure water (UPW) rinses are generally employed to remove debris from the silicon wafer.
- UPW from reverse osmosis (RO), demineralized, and polished water may also be used in the semiconductor fabrication facility tools to rinse the silicon wafer.
- RO reverse osmosis
- the wastewater from semiconductor fabrication plants or other industrial sources may include high levels of azoles, for example, from about 20 mg/1 up to about 200 mg/1 total azoles or greater, that are used as anticorrosive agents during the wafer planarization and polishing process.
- the wastewater from these processes may also include heavy metals, additional organic compounds, for example, alcohols, and/or surfactants such as ammonium salts, and inorganic abrasives, such as colloidal silica, all of which should be removed prior to discharge of the wastewater. These additional contaminants may be present at levels from about 0.01 wt% up to about 1 wt%.
- the wastewater may further have a high background total organic carbon (TOC) concentration, with the total azoles comprising a portion of the TOC.
- TOC total organic carbon
- oxidizers such as hydrogen peroxide (H2O2) are generally used to assist in dissolving copper from microchips and may be present in CMP wastewater at concentrations exceeding 1,000 mg/L or 0. 1 wt%.
- H2O2 hydrogen peroxide
- the increase in the degree of integration of modem semiconductor devices has increased the number of fine polishing steps that are carried out per wafer or microchip, thus increasing the volume of CMP wastewater produced requiring treatment.
- Azoles are not currently regulated for maximum contaminant levels (MCL) by regulatory authorities in the United States but are believed to have a negative impact on the environment upon discharge into open waterways. Recent evidence has indicated bioaccumulation of azoles in fish and incidences of toxicity of naturally occurring algae blooms, necessitating their removal from process water before discharge.
- MCL maximum contaminant levels
- azole compounds are widely used in the semiconductor industry as anticorrosive agents for copper during silicon wafer processing.
- examples of such azole compounds include, but are not limited to, imidazole, pyrazole, oxazole, isoxazole, thiazole, isothiazole, selenazole, 1,2,3-triazole, 1,2,4-triazole, 1,2,5-oxadiazole, 1,3,4-oxadiazole, 1,2,3-thiadiazole, 1.2,4-thiadiazole, 1,3,4-thiadiazole, tetrazole.
- 1,2,3,4-thiatriazole any derivatives thereof, amine salts thereof, and metal salts thereof.
- azole derivatives include compounds having a fused ring of an azole ring and a benzene ring or the like, such as indazole, benzimidazole, benzotriazole, and benzothiazole, and further include derivatives thereof, such as alkylbenzotriazoles (e.g., benzotriazole, o-tolyltriazole, m-tolyl tri azole, -tolvltnazole. 5-ethylbenzotriazole.
- 4-nitrobenzotriazole 4-nitrobenzotriazole), halobenzotriazoles (e g., 5- chlorobenzotriazole), hydroxyalkylbenzotriazoles, hydrobenzotriazoles, aminobenzotriazoles, (substituted aminomethyl)-tolyltriazole, carboxybenzotriazole, N-alkylbenzotriazoles, bisbenzotriazole, naphthotriazole, mercaptobenzothiazoles, aminobenzothiazole, amine salts thereof, and metal salts thereof.
- halobenzotriazoles e g., 5- chlorobenzotriazole
- hydroxyalkylbenzotriazoles hydrobenzotriazoles
- aminobenzotriazoles (substituted aminomethyl)-tolyltriazole
- carboxybenzotriazole N-alkylbenzotriazoles
- bisbenzotriazole naphthotriazole
- mercaptobenzothiazoles
- Azoles have high chemical stability and are thus difficult to remove from solution and, furthermore, are not easily biodegraded.
- the azole compounds are decomposed using an oxidizing agent having a high oxidizing power, such as ozone (O 3 ), ultraviolet (UV) light, hydrogen peroxide, or an advanced oxidation process where these oxidants are combined to treat collected wastewater.
- an oxidizing agent having a high oxidizing power such as ozone (O 3 ), ultraviolet (UV) light, hydrogen peroxide, or an advanced oxidation process where these oxidants are combined to treat collected wastewater.
- O 3 ozone
- UV light ultraviolet
- hydrogen peroxide hydrogen peroxide
- advanced oxidation process where these oxidants are combined to treat collected wastewater.
- the conventional processes for azole removal have several drawbacks due to the high chemical stability of the azole compounds. For example, for any of the conventional methods described above, large amounts of chemicals are required for the decomposition reactions, thus increasing the costs of treatment.
- the treatment limit for the iron is expected to be in the low single digit (mg/1) range (e.g., ⁇ 2 mg/1).
- various methods of reducing iron concentrations to acceptable levels are disclosed.
- One method utilizes a ballasted flocculation system (e.g.. CoMag® from Evoqua Water Technologies LLC, Pittsburgh, PA).
- Another method in accordance with the present disclosure utilizes microfiltration or ultrafiltration membranes.
- the effluent limit can be achieved by either method.
- the microfilter/ultrafilter may achieve, e.g., ⁇ 0.5 mg/1 iron.
- the ballasted flocculation system may achieve, e.g., 3 mg/1 iron, assuming 5 mg/1 TSS out of the floc. 5 mg/1 TSS contains about 2.5 mg/1 of insoluble iron plus about 0.5 mg/1 of soluble iron totaling about 3 mg/1 of iron in the treated wastewater.
- dissolved iron may be precipitated from the wastewater by increasing the pH of the wastewater by the addition of, for example, NaOH, lime, or other suitable chemicals until the pH of the wastewater is at a level at which the iron precipitates as, for example, iron hydroxide.
- iron in chemical mechanical polishing wastewater from which an azole compound has been previously removed by processes including addition of ferrous iron (e.g., Fenton’s reaction) to the wastewater tends not to precipitate as readily as expected with adjustments in pH. Without wishing to be bound to a particular theory’, this may be due to the presence of chelating material in the previously treated chemical mechanical polishing wastewater. It has been discovered that, counterintuitively, the addition of additional ferrous iron in the form of. for example, ferric sulfate or ferric chloride to CMP wastewater from which azole compound(s) have been previously removed as described above enhances the degree to which iron in the previously treated wastewater precipitates. Sufficient iron precipitates from the CMP wastewater after the additional ferrous iron addition such that after precipitation of the iron compounds, the resultant wastewater has a lower iron content than if the additional iron dosage was not performed.
- ferrous iron e.g., Fenton’s reaction
- CMP wastewater enters a first vessel/treatment operation 110 in which azoles may be removed from the CMP wastewater, for example, as described in US 2022/0298045.
- the first vessel/treatment operation 110 used to remove azoles from the CMP wastewater may be a dissolved iron treatment process, such as wastewater treatment system utilizing Fenton chemistry.
- the Fenton's reagent used for the removal of azoles may be formed by adding about 500 mg/1 to about 3,000 mg/1 of an oxidant, such as hydrogen peroxide or a persulfate salt, to about 50 mg/1 to about 300 mg/1 of a soluble iron compound (e.g..
- the Fenton's reactions may also decompose at least a portion of any hydrogen peroxide present in the CPM wastewater prior to the addition of a larger quantity 7 of hydrogen peroxide or a persulfate.
- the Fenton's reaction may occur in accordance with chemical equations (l)-(3):
- the persulfate salt and the hydroxyl, hydroperoxy!, and persulfate radicals formed by the oxidation of Fe 2+ or the reduction of Fe 3+ may react with and decompose the azoles in the CMP wastewater into primarily nitrogen oxides (NO2/NO3), carbon dioxide and water.
- NO2/NO3 nitrogen oxides
- carbon dioxide carbon dioxide
- the decomposition of a nitrogenous organic molecule, such as an azole may occur by the reaction illustrated in equation 4:
- the method may include introducing the dissolved iron compound and an oxidizer to the wastewater at an acidic pH to produce free radicals to decompose the azoles.
- the pH may be adjusted or maintained at a pH of about 3, such as between 2 and 5, by the addition of an acid, such as sulfuric acid.
- the oxidizer introduced into the wastewater may include a peroxide, such as hydrogen peroxide, or a persulfate salt such as ammonium persulfate, potassium persulfate, and sodium persulfate, and the invention is not limited by the type of oxidant added as part of the dissolved iron treatment system.
- peroxides produce hydroxyl and hydroperoxyl radicals and persulfates produce persulfate radicals when reacting with the dissolved iron compounds.
- the CMP wastew ater from which the azole compound has been removed may be directed into a mixing vessel 120 in which the pH of the wastewater is adjusted, for example, by the addition of NaOH or lime to a pH at which the precipitation of iron hydroxide occurs, for example, a pH between about 6 and 10 or about 8.
- precipitation of iron hydroxide from the CMP wastew ater from which the azole compound has been removed may be facilitated by the addition of an iron-containing compound such as ferric sulfate or ferric chloride to the CMP waste water to form an iron-dosed wastewater stream.
- the iron-containing compound and/or pH adjustment agent may be added directly into the mixing vessel 120 and/or into a conduit through which the CMP wastewater flows from the first vessel/treatment operation 110 into the mixing vessel 120.
- the iron dosing may occur before, after, or concurrent with the pH adjustment.
- mixing vessel 120 is illustrated as a separate unit operation, the mixing vessel may instead be a portion of the conduit 1 15, a static mixer disposed within the conduit 115, or other mixing system known in the art. Responsive to the iron dosing and pH adjustment an iron compound, for example, iron hydroxide will begin to precipitate out of solution.
- the pH-adjusted iron-dosed wastewater is then subjected to solid/liquid separation to separate the pH-adjusted iron-dosed wastewater stream into a low iron treated water stream having an iron content of, for example, less than 2 mg/1 or less than 0.5 mg/1, and a high iron waste product including the iron compound (e.g., iron hydroxide).
- iron compound e.g., iron hydroxide
- other solids such as slurry residue (e.g., silica) may also be separated from the pH-adjusted iron-dosed wastewater stream in the solid/liquid separation operation.
- slurry residue e.g., silica
- the stream is directed into a solid/liquid separation unit operation 130.
- the solid/liquid separation unit operation 130 is or includes a filtration operation.
- the filtration operation may utilize one or more membrane filtration units, for example, microfiltration or ultrafiltration units such as those available from Evoqua Water Technologies LLC.
- a gravity-based separation system may be utilized to perform the solid/liquid separation operation.
- one or more flocculants or ballasting agents as known in the art may be added to the pH-adjusted iron-dosed wastewater stream either upstream of or within a vessel used to perform the solid/liquid separation.
- the ballast may be or may include magnetite and the solid/liquid separation apparatus may include a CoMag® gravity separation apparatus from Evoqua Water Technologies LLC.
- the solids/liquid separation apparatus may separate the pH-adjusted iron-dosed wastewater stream into low iron treated water stream that may be discharged, recycled to the system or wafer factory, or sent for further treatment, and a high iron waste product including the iron compound.
- the high iron waste product may be sent to a downstream operation 135, for example, a filter press for additional solid/liquid separation or dewatering. Recovered water may be recycled back into the system or wafer factory, discharged to the environment, or sent for further processing.
- the downstream operation 135 may additionally or alternately include a ballast recovery system, for example, a magnetite recovery system.
- the ballast recovery system may include a shear mill, a hydrocyclone and/or a rotating drum comprising a fixed array of rare-earth magnets.
- ballast recovery system An example of a magnetic drum that may be utilized in embodiments of the presently disclosed ballast recovery system is disclosed in co-owned PCT application Publication No. WO 2014/088620. titled “MAGNETIC DRUM INLET SLIDE AND SCRAPER BLADE’ 7 which is incorporated herein by reference in its entirety for all purposes.
- the method may include connecting a source of an iron-containing chemical (“Iron dosing/pH adjustment” in FIG. 1) to one of a vessel 120 or conduit 115 through which the wastewater passes.
- the source of the iron-containing chemical is configured to dose the wastewater stream with the iron-containing chemical and produce an iron-dosed wastewater stream.
- the method may further include connecting a source of pH adjustment chemical (“Iron dosing/pH adjustment” in FIG. 1) to one of a vessel 120 or conduit 115 through which the iron-dosed wastewater stream passes.
- the source of pH adjustment chemical configured to dose the iron-dosed wastewater stream with a sufficient amount of the pH adjustment chemical to cause an iron compound to precipitate from the iron-dosed wastewater stream.
- the method may further include providing a solid/liquid separation sub-system 130 configured to receive the pH- adjusted iron-dosed wastewater stream and separate the pH-adjusted iron-dosed wastewater stream into a low iron treated water stream and a high iron waste product including the iron compound.
- the method may further include providing a controller in communication with one of the source of iron-containing chemical or the source of pH adjustment chemical and configured to control an amount of chemical dosed by the one of the source of iron- containing chemical or the source of pH adjustment chemical based upon one or more measured parameters of one or more of the wastewater stream, the iron-dosed wastewater stream, or the pH-adjusted iron-dosed wastewater stream.
- the controller is indicated at 140 in FIG. 1.
- Sensors S may be disposed in any of the unit operations 110, 120, 130, 135 and may provide the controller 140 with indications of any one or more of pH, temperature, pressure, one or more chemical concentrations, or any other useful property within any of the unit operations of the system.
- the controller 140 may be implemented as a general-purpose computer programmed to perform the functions disclosed herein or a specialized system such as an ASIC or FPGA.
- the term “plurality ” refers to tw o or more items or components.
- the terms “comprising,” “including,” “carrying,” “having,” “containing,” and “involving,” whether in the written description or the claims and the like, are open-ended terms, i.e., to mean “including but not limited to.” Thus, the use of such terms is meant to encompass the items listed thereafter, and equivalents thereof, as well as additional items. Only the transitional phrases “consisting of’ and “consisting essentially of,” are closed or semi-closed transitional phrases, respectively, with respect to the claims.
Landscapes
- Treatment Of Water By Oxidation Or Reduction (AREA)
Abstract
A method of removing iron from a wastewater stream including chemical mechanical polishing wastewater from which an azole compound has been previously removed by a Fenton's reaction. The method comprises adding an iron-containing chemical to the wastewater stream to form an iron-dosed wastewater stream, adjusting a pH of the iron-dosed wastewater stream to a pH at which an iron compound precipitates from the iron-dosed wastewater stream, and performing solid/liquid separation on the pH-adjusted iron-dosed wastewater stream to separate the pH-adjusted iron-dosed wastewater stream into a low iron treated water stream and a high iron waste product including the iron compound.
Description
REDUCTION OF FERROUS IRON FROM AZOLE-TREATED WASTEWATER
CROSS-REFERENCE TO RELATED APPLICATION
This application claims priority to U.S. Provisional Patent Application Serial No. 63/432,341, filed on December 13, 2022 and titled “‘Reduction of Ferrous Iron from Azole- Treated Wastewater/’ the entire disclosure of which is hereby incorporated herein by reference in its entirety for all purposes.
FIELD OF TECHNOLOGY
Aspects and embodiments disclosed herein relate to systems and methods for the reduction of iron from azole-treated chemical-mechanical polishing (CMP) wastewater. The methods disclosed herein provide for the reduction of iron from wastewater caused at least in part by the removal of concentrated azole compounds generated during semiconductor facility operations.
SUMMARY
In accordance w ith one aspect, there is provided a method of removing iron from a wastewater stream including chemical mechanical polishing wastewater from which an azole compound has been previously removed by a Fenton’s reaction. The method comprises adding an iron-containing chemical to the w astew ater stream to form an iron-dosed wastewater stream, adjusting a pH of the iron-dosed wastewater stream to a pH at which an iron compound precipitates from the iron-dosed wastewater stream, and performing solid/liquid separation on the pH-adjusted iron-dosed wastewater stream to separate the pH- adjusted iron-dosed wastewater stream into an iron-treated water stream with an iron concentration less than an iron concentration of the pH-adjusted iron-dosed wastewater stream and a waste product including the iron compound.
In some embodiments, adding the iron-containing chemical to the wastewater stream includes adding one of ferric sulfate or ferric chloride to the wastewater stream.
In some embodiments, adjusting the pH of the iron-dosed w astew ater stream includes adding one of sodium hydroxide or lime to the iron-dosed w astew ater stream.
In some embodiments, performing solid/liquid separation on the pH-adjusted iron- dosed wastewater stream includes performing a filtration operation on the pH-adjusted iron- dosed wastewater stream.
In some embodiments, performing the filtration operation on the pH-adjusted iron- dosed wastewater stream includes filtering the pH-adjusted iron-dosed wastewater stream with a membrane filter.
In some embodiments, performing the filtration operation on the pH-adjusted iron- dosed wastewater stream includes filtering the pH-adjusted iron-dosed wastewater stream with one of a microfilter or an ultrafilter.
In some embodiments, performing solid/liquid separation on the pH-adjusted iron- dosed wastewater stream includes treating the pH-adjusted iron-dosed wastewater stream in a gravity -based separation system.
In some embodiments, the method further comprises facilitating solid/liquid separation of the pH-adjusted iron-dosed wastewater stream by adding a flocculant to the pH- adjusted iron-dosed wastewater stream one of upstream of or within the gravity -based separation system.
In some embodiments, The method further comprises facilitating solid/liquid separation of the pH-adjusted iron-dosed wastewater stream by adding a ballasting agent to the pH-adjusted iron-dosed wastewater stream one of upstream of or within the gravity-based separation system.
In some embodiments, adding the ballasting agent to the pH-adjusted iron-dosed wastewater stream one of upstream of or within the gravity-based separation system includes adding magnetite to the pH-adjusted iron-dosed wastewater stream.
In some embodiments, The method further comprises recovering magnetite from solids separated from the pH-adjusted iron-dosed wastewater stream.
In some embodiments, performing solid/liquid separation on the pH-adjusted iron- dosed wastewater stream includes removing silica from the pH-adjusted iron-dosed w astewater stream.
In some embodiments, the method results in the low- iron treated water stream having an iron concentration of less than 2 mg/1.
In some embodiments, the method results in the low iron treated water stream having an iron concentration of less than 0.5 mg/1.
In some embodiments, The method further comprises performing dewatering on the waste product.
In some embodiments, performing the dewatering includes removing water from the waste product in a filter press.
In accordance with another aspect, there is provided method of treating chemical mechanical polisher (CMP) wastewater. The method comprises removing an azole compound from the CMP wastewater via a Fenton’s reaction to form a second wastewater stream, adding an iron-containing chemical to the second w astew ater stream to form an iron- dosed wastewater stream, adjusting a pH of the iron-dosed wastewater stream to precipitate an iron compound from the iron-dosed waste ater stream, and separating the pH-adjusted iron-dosed wastewater stream into a treated water stream and a waste product including the iron compound.
In accordance with another aspect, there is provided a system for removing iron from chemical mechanical polishing wastew ater from which an azole compound has been previously removed by a Fenton’s reaction. The system comprises a source of an iron- containing chemical configured to dose the wastewater stream with the iron-containing chemical and produce an iron-dosed w astew ater stream, a source of pH adjustment chemical configured to dose the iron-dosed w astewater stream with a sufficient amount of the pH adjustment chemical to cause an iron compound to precipitate from the iron-dosed wastewater stream, and a solid/liquid separation sub-system configured to separate the pH- adjusted iron-dosed wastewater stream into a treated water stream and a waste product including the iron compound.
In accordance with another aspect, there is provided a method of facilitating removal of iron from chemical mechanical polishing wastewater from which an azole compound has been previously removed by a Fenton’s reaction. The method comprises connecting a source of an iron-containing chemical to one of a vessel or conduit through which the w astew ater passes, the source of the iron-containing chemical configured to dose the wastewater stream with the iron- containing chemical and produce an iron-dosed wastewater stream, connecting a source of pH adjustment chemical to one of a vessel or conduit through w hich the iron- dosed wastewater stream passes, the source of pH adjustment chemical configured to dose the iron-dosed wastewater stream with a sufficient amount of the pH adjustment chemical to cause an iron compound to precipitate from the iron-dosed wastewater stream, and providing a solid/liquid separation sub-system configured to receive the pH-adjusted iron-dosed wastewater stream and separate the pH-adjusted iron-dosed wastewater stream into a treated water stream and a w aste product including the iron compound.
In some embodiments, The method further comprises providing a controller in communication with one of the source of iron-containing chemical or the source of pH adjustment chemical and configured to control an amount of chemical dosed by the one of the
source of iron-containing chemical or the source of pH adjustment chemical based upon one or more measured parameters of one or more of the wastewater stream, the iron-dosed wastewater stream, or the pH-adjusted iron-dosed wastewater stream.
BRIEF DESCRIPTION OF THE DRAWING
The accompanying drawing is not intended to be drawn to scale. In the drawing, each identical or nearly identical component that is illustrated is represented by a like numeral. For purposes of clarity, not even' component may be labeled. In the drawings:
FIG. 1 illustrates an example of a system as disclosed herein.
DETAILED DESCRIPTION
The CMP planarization process involves a polishing comprising an oxidant, and abrasive, complexing agents, and additional additives to remove and/or etch semiconducting wafers during the manufacturing process. The polishing is performed with a polishing pad to remove excess copper from the semiconductor wafers. Silicon, copper, and various trace metals are removed from the silicon structure via the polishing slurry. The polishing slurry is introduced to the silicon wafer on a planarization table in conj unction with polishing pads. Oxidizing agents and etching solutions are introduced to control the removal of material. Ultrapure water (UPW) rinses are generally employed to remove debris from the silicon wafer. UPW from reverse osmosis (RO), demineralized, and polished water may also be used in the semiconductor fabrication facility tools to rinse the silicon wafer.
In some instances, the wastewater from semiconductor fabrication plants or other industrial sources may include high levels of azoles, for example, from about 20 mg/1 up to about 200 mg/1 total azoles or greater, that are used as anticorrosive agents during the wafer planarization and polishing process. The wastewater from these processes may also include heavy metals, additional organic compounds, for example, alcohols, and/or surfactants such as ammonium salts, and inorganic abrasives, such as colloidal silica, all of which should be removed prior to discharge of the wastewater. These additional contaminants may be present at levels from about 0.01 wt% up to about 1 wt%. The wastewater may further have a high background total organic carbon (TOC) concentration, with the total azoles comprising a portion of the TOC. For example, oxidizers such as hydrogen peroxide (H2O2) are generally used to assist in dissolving copper from microchips and may be present in CMP wastewater
at concentrations exceeding 1,000 mg/L or 0. 1 wt%. The increase in the degree of integration of modem semiconductor devices has increased the number of fine polishing steps that are carried out per wafer or microchip, thus increasing the volume of CMP wastewater produced requiring treatment.
Azoles are not currently regulated for maximum contaminant levels (MCL) by regulatory authorities in the United States but are believed to have a negative impact on the environment upon discharge into open waterways. Recent evidence has indicated bioaccumulation of azoles in fish and incidences of toxicity of naturally occurring algae blooms, necessitating their removal from process water before discharge.
As described in US 8,801,937, the disclosure of which is herein incorporated by reference in its entirety for all purposes, azole compounds are widely used in the semiconductor industry as anticorrosive agents for copper during silicon wafer processing. Examples of such azole compounds include, but are not limited to, imidazole, pyrazole, oxazole, isoxazole, thiazole, isothiazole, selenazole, 1,2,3-triazole, 1,2,4-triazole, 1,2,5-oxadiazole, 1,3,4-oxadiazole, 1,2,3-thiadiazole, 1.2,4-thiadiazole, 1,3,4-thiadiazole, tetrazole. 1,2,3,4-thiatriazole, any derivatives thereof, amine salts thereof, and metal salts thereof. Examples of azole derivatives include compounds having a fused ring of an azole ring and a benzene ring or the like, such as indazole, benzimidazole, benzotriazole, and benzothiazole, and further include derivatives thereof, such as alkylbenzotriazoles (e.g., benzotriazole, o-tolyltriazole, m-tolyl tri azole, -tolvltnazole. 5-ethylbenzotriazole. 5-n- propylbenzotriazole, 5 -isobutylbenzotri azole, and 4-methylbenzotriazole), alkoxy benzotriazoles (e.g., 5-methoxybenzotriazole), alkylaminobenzotriazoles, alkylaminosulfonylbenzotriazoles, mercaptobenzotriazoles, hydroxybenzotriazoles, nitrobenzotriazoles (e.g.. 4-nitrobenzotriazole), halobenzotriazoles (e g., 5- chlorobenzotriazole), hydroxyalkylbenzotriazoles, hydrobenzotriazoles, aminobenzotriazoles, (substituted aminomethyl)-tolyltriazole, carboxybenzotriazole, N-alkylbenzotriazoles, bisbenzotriazole, naphthotriazole, mercaptobenzothiazoles, aminobenzothiazole, amine salts thereof, and metal salts thereof.
Azoles have high chemical stability and are thus difficult to remove from solution and, furthermore, are not easily biodegraded. In conventional wastewater treatments for azole-containing anticorrosive agents, the azole compounds are decomposed using an oxidizing agent having a high oxidizing power, such as ozone (O3), ultraviolet (UV) light, hydrogen peroxide, or an advanced oxidation process where these oxidants are combined to treat collected wastewater. The conventional processes for azole removal have several
drawbacks due to the high chemical stability of the azole compounds. For example, for any of the conventional methods described above, large amounts of chemicals are required for the decomposition reactions, thus increasing the costs of treatment.
US 2022/0298045, the disclosure of which is herein incorporated by reference in its entirety for all purposes, details a number of methods for treating CMP wastewater for azoles. However, while the disclosed methods effectively treat the wastewater for azoles, the measures to reduce azole concentration may also introduce ferrous iron in the form of, e.g., ferrous sulfate, into the wastewater. Elevated levels of ferrous iron in wastewater are also undesirable, so methods to reduce iron concentrations are also desired. Below are various methods for reducing iron concentrations in post-azole treated wastewater in accordance with aspects of the present disclosure.
As noted above, iron is added as a treatment chemical in the azole treatment process. In some embodiments, the treatment limit for the iron is expected to be in the low single digit (mg/1) range (e.g., < 2 mg/1). In accordance with the present disclosure, various methods of reducing iron concentrations to acceptable levels are disclosed. One method utilizes a ballasted flocculation system (e.g.. CoMag® from Evoqua Water Technologies LLC, Pittsburgh, PA). Another method in accordance with the present disclosure utilizes microfiltration or ultrafiltration membranes. The effluent limit can be achieved by either method. In some embodiments, the microfilter/ultrafilter may achieve, e.g., < 0.5 mg/1 iron. The ballasted flocculation system may achieve, e.g., 3 mg/1 iron, assuming 5 mg/1 TSS out of the floc. 5 mg/1 TSS contains about 2.5 mg/1 of insoluble iron plus about 0.5 mg/1 of soluble iron totaling about 3 mg/1 of iron in the treated wastewater.
To remove dissolved iron from wastewater one may first treat the wastewater to cause the dissolved iron to precipitate out as solid compounds or flocs which can then be removed by sohd/liquid separation systems such as filtration or gravity separation (e.g., CoMag® gravity separation apparatus from Evoqua Water Technologies LLC, Pittsburgh, PA). The dissolved iron may be precipitated from the wastewater by increasing the pH of the wastewater by the addition of, for example, NaOH, lime, or other suitable chemicals until the pH of the wastewater is at a level at which the iron precipitates as, for example, iron hydroxide. It has been observed that iron in chemical mechanical polishing wastewater from which an azole compound has been previously removed by processes including addition of ferrous iron (e.g., Fenton’s reaction) to the wastewater tends not to precipitate as readily as expected with adjustments in pH. Without wishing to be bound to a particular theory’, this may be due to the presence of chelating material in the previously treated chemical
mechanical polishing wastewater. It has been discovered that, counterintuitively, the addition of additional ferrous iron in the form of. for example, ferric sulfate or ferric chloride to CMP wastewater from which azole compound(s) have been previously removed as described above enhances the degree to which iron in the previously treated wastewater precipitates. Sufficient iron precipitates from the CMP wastewater after the additional ferrous iron addition such that after precipitation of the iron compounds, the resultant wastewater has a lower iron content than if the additional iron dosage was not performed.
One example of a system and method for the treatment of CMP wastewater is illustrated schematically in FIG. 1. CMP wastewater enters a first vessel/treatment operation 110 in which azoles may be removed from the CMP wastewater, for example, as described in US 2022/0298045. The first vessel/treatment operation 110 used to remove azoles from the CMP wastewater may be a dissolved iron treatment process, such as wastewater treatment system utilizing Fenton chemistry. The Fenton's reagent used for the removal of azoles may be formed by adding about 500 mg/1 to about 3,000 mg/1 of an oxidant, such as hydrogen peroxide or a persulfate salt, to about 50 mg/1 to about 300 mg/1 of a soluble iron compound (e.g.. ferrous (Fe2+) sulfate). The Fenton's reactions may also decompose at least a portion of any hydrogen peroxide present in the CPM wastewater prior to the addition of a larger quantity7 of hydrogen peroxide or a persulfate. The Fenton's reaction may occur in accordance with chemical equations (l)-(3):
Fe2+ + H2O2 - Fe3+ + HO. + OH (1)
Fe3+ + H2O2 Fe2+ + HOO. + H+ (2)
Fe2+ + S2Os 2 Fe3+ + SO4.’ + SO42 (3)
The persulfate salt and the hydroxyl, hydroperoxy!, and persulfate radicals formed by the oxidation of Fe2+ or the reduction of Fe3+ may react with and decompose the azoles in the CMP wastewater into primarily nitrogen oxides (NO2/NO3), carbon dioxide and water. Without wishing to be bound by any particular theory, the decomposition of a nitrogenous organic molecule, such as an azole, may occur by the reaction illustrated in equation 4:
CxNyHz + OH. CO2 + NO3 + H2O (4)
In some embodiments, when a dissolved iron compound is used for treating the wastewater comprising azoles, the method may include introducing the dissolved iron compound and an oxidizer to the wastewater at an acidic pH to produce free radicals to decompose the azoles. The pH may be adjusted or maintained at a pH of about 3, such as between 2 and 5, by the addition of an acid, such as sulfuric acid. The oxidizer introduced into the wastewater may include a peroxide, such as hydrogen peroxide, or a persulfate salt such as ammonium persulfate, potassium persulfate, and sodium persulfate, and the invention is not limited by the type of oxidant added as part of the dissolved iron treatment system. As described herein, peroxides produce hydroxyl and hydroperoxyl radicals and persulfates produce persulfate radicals when reacting with the dissolved iron compounds.
During the decomposition of azoles using a dissolved iron treatment system, a byproduct will be formed which comprises an excess of dissolved iron. To remove the dissolved iron, the CMP wastew ater from which the azole compound has been removed may be directed into a mixing vessel 120 in which the pH of the wastewater is adjusted, for example, by the addition of NaOH or lime to a pH at which the precipitation of iron hydroxide occurs, for example, a pH between about 6 and 10 or about 8. As noted above, precipitation of iron hydroxide from the CMP wastew ater from which the azole compound has been removed may be facilitated by the addition of an iron-containing compound such as ferric sulfate or ferric chloride to the CMP waste water to form an iron-dosed wastewater stream. The iron-containing compound and/or pH adjustment agent may be added directly into the mixing vessel 120 and/or into a conduit through which the CMP wastewater flows from the first vessel/treatment operation 110 into the mixing vessel 120. The iron dosing may occur before, after, or concurrent with the pH adjustment. Although mixing vessel 120 is illustrated as a separate unit operation, the mixing vessel may instead be a portion of the conduit 1 15, a static mixer disposed within the conduit 115, or other mixing system known in the art. Responsive to the iron dosing and pH adjustment an iron compound, for example, iron hydroxide will begin to precipitate out of solution.
The pH-adjusted iron-dosed wastewater is then subjected to solid/liquid separation to separate the pH-adjusted iron-dosed wastewater stream into a low iron treated water stream having an iron content of, for example, less than 2 mg/1 or less than 0.5 mg/1, and a high iron waste product including the iron compound (e.g., iron hydroxide). In some embodiments other solids such as slurry residue (e.g., silica) may also be separated from the pH-adjusted iron-dosed wastewater stream in the solid/liquid separation operation. To perform the solid/liquid separation on the pH-adjusted iron-dosed wastewater stream the stream is
directed into a solid/liquid separation unit operation 130. In some embodiments, the solid/liquid separation unit operation 130 is or includes a filtration operation. The filtration operation may utilize one or more membrane filtration units, for example, microfiltration or ultrafiltration units such as those available from Evoqua Water Technologies LLC. In other embodiments in addition to or as an alternative to filtration a gravity-based separation system may be utilized to perform the solid/liquid separation operation. To facilitate the solid/liquid separation in the gravity -based separation system one or more flocculants or ballasting agents as known in the art may be added to the pH-adjusted iron-dosed wastewater stream either upstream of or within a vessel used to perform the solid/liquid separation. In some embodiments, the ballast may be or may include magnetite and the solid/liquid separation apparatus may include a CoMag® gravity separation apparatus from Evoqua Water Technologies LLC.
The solids/liquid separation apparatus may separate the pH-adjusted iron-dosed wastewater stream into low iron treated water stream that may be discharged, recycled to the system or wafer factory, or sent for further treatment, and a high iron waste product including the iron compound. The high iron waste product may be sent to a downstream operation 135, for example, a filter press for additional solid/liquid separation or dewatering. Recovered water may be recycled back into the system or wafer factory, discharged to the environment, or sent for further processing. The downstream operation 135 may additionally or alternately include a ballast recovery system, for example, a magnetite recovery system. The ballast recovery system may include a shear mill, a hydrocyclone and/or a rotating drum comprising a fixed array of rare-earth magnets. An example of a magnetic drum that may be utilized in embodiments of the presently disclosed ballast recovery system is disclosed in co-owned PCT application Publication No. WO 2014/088620. titled “MAGNETIC DRUM INLET SLIDE AND SCRAPER BLADE’7 which is incorporated herein by reference in its entirety for all purposes.
Aspects and embodiments disclosed herein are also directed to a method of facilitating removal of iron from chemical mechanical polishing wastewater from which an azole compound has been previously removed by a Fenton’s reaction. The method may include connecting a source of an iron-containing chemical (“Iron dosing/pH adjustment” in FIG. 1) to one of a vessel 120 or conduit 115 through which the wastewater passes. The source of the iron-containing chemical is configured to dose the wastewater stream with the iron-containing chemical and produce an iron-dosed wastewater stream. The method may further include connecting a source of pH adjustment chemical (“Iron dosing/pH adjustment”
in FIG. 1) to one of a vessel 120 or conduit 115 through which the iron-dosed wastewater stream passes. The source of pH adjustment chemical configured to dose the iron-dosed wastewater stream with a sufficient amount of the pH adjustment chemical to cause an iron compound to precipitate from the iron-dosed wastewater stream. The method may further include providing a solid/liquid separation sub-system 130 configured to receive the pH- adjusted iron-dosed wastewater stream and separate the pH-adjusted iron-dosed wastewater stream into a low iron treated water stream and a high iron waste product including the iron compound.
The method may further include providing a controller in communication with one of the source of iron-containing chemical or the source of pH adjustment chemical and configured to control an amount of chemical dosed by the one of the source of iron- containing chemical or the source of pH adjustment chemical based upon one or more measured parameters of one or more of the wastewater stream, the iron-dosed wastewater stream, or the pH-adjusted iron-dosed wastewater stream. The controller is indicated at 140 in FIG. 1. Sensors S may be disposed in any of the unit operations 110, 120, 130, 135 and may provide the controller 140 with indications of any one or more of pH, temperature, pressure, one or more chemical concentrations, or any other useful property within any of the unit operations of the system. Communication lines between the controller 140 and iron dosing/pH adjustment source(s) are not shown for sake of clarity. The controller 140 may be implemented as a general-purpose computer programmed to perform the functions disclosed herein or a specialized system such as an ASIC or FPGA.
The phraseology and terminology used herein is for the purpose of description and should not be regarded as limiting. As used herein, the term “plurality ” refers to tw o or more items or components. The terms “comprising,” “including,” “carrying,” “having,” “containing,” and “involving,” whether in the written description or the claims and the like, are open-ended terms, i.e., to mean “including but not limited to.” Thus, the use of such terms is meant to encompass the items listed thereafter, and equivalents thereof, as well as additional items. Only the transitional phrases “consisting of’ and “consisting essentially of,” are closed or semi-closed transitional phrases, respectively, with respect to the claims. Use of ordinal terms such as “first,” “second,” “third,” and the like in the claims to modify a claim element does not by itself connote any priority, precedence, or order of one claim element over another or the temporal order in which acts of a method are performed, but are used merely as labels to distinguish one claim element having a certain name from another element having a same name (but for use of the ordinal term) to distinguish the claim elements.
Claims
1. A method of removing iron from a wastewater stream including chemical mechanical polishing wastewater from which an azole compound has been previously removed by a Fenton’s reaction, the method comprising: adding an iron-containing chemical to the wastewater stream to form an iron-dosed w astew ater stream; adjusting a pH of the iron-dosed w astew ater stream to a pH at w hich an iron compound precipitates from the iron-dosed wastewater stream; and performing solid/liquid separation on the pH-adjusted iron-dosed wastewater stream to separate the pH-adjusted iron-dosed wastewater stream into an iron-treated water stream with an iron concentration less than an iron concentration of the pH-adjusted iron-dosed wastewater stream and a waste product including the iron compound.
2. The method of claim 1, wherein adding the iron-containing chemical to the wastew ater stream includes adding one of ferric sulfate or ferric chloride to the w astew ater stream.
3. The method of claim 1, wherein adjusting the pH of the iron-dosed wastewater stream includes adding one of sodium hydroxide or lime to the iron-dosed wastewater stream.
4. The method of claim 1, wherein performing solid/liquid separation on the pH-adjusted iron-dosed wastewater stream includes performing a filtration operation on the pH-adjusted iron-dosed wastewater stream.
5. The method of claim 4, wherein performing the filtration operation on the pH- adjusted iron-dosed wastewater stream includes filtering the pH-adjusted iron-dosed wastewater stream with a membrane filter.
6. The method of claim 5, w herein performing the filtration operation on the pH- adjusted iron-dosed wastewater stream includes filtering the pH-adjusted iron-dosed wastewater stream with one of a microfilter or an ultrafilter.
7. The method of claim 1, wherein performing solid/liquid separation on the pH-adjusted iron-dosed wastewater stream includes treating the pH-adjusted iron-dosed wastewater stream in a gravity -based separation system.
8. The method of claim 7, further comprising facilitating solid/liquid separation of the pH-adjusted iron-dosed wastewater stream by adding a flocculant to the pH-adjusted iron- dosed wastewater stream one of upstream of or within the gravity-based separation system.
9. The method of claim 7, further comprising facilitating solid/liquid separation of the pH-adjusted iron-dosed wastewater stream by adding a ballasting agent to the pH-adjusted iron-dosed wastewater stream one of upstream of or within the gravity-based separation system.
10. The method of claim 9, wherein adding the ballasting agent to the pH-adjusted iron- dosed wastewater stream one of upstream of or within the gravity-based separation system includes adding magnetite to the pH-adjusted iron-dosed wastewater stream.
11. The method of claim 10, further comprising recovering magnetite from solids separated from the pH-adjusted iron-dosed wastewater stream.
12. The method of claim 1, wherein performing solid/liquid separation on the pH-adjusted iron-dosed wastewater stream includes removing silica from the pH-adjusted iron-dosed wastewater stream.
13. The method of claim 1, resulting in the low iron treated water stream having an iron concentration of less than 2 mg/1.
14. The method of claim 1, resulting in the low iron treated water stream having an iron concentration of less than 0.5 mg/1.
15. The method of claim 1, further comprising performing dewatering on the waste product.
16. The method of claim 15, wherein performing the dewatering includes removing water from the waste product in a filter press.
17. A method of treating chemical mechanical polisher (CMP) wastewater, the method comprising: removing an azole compound from the CMP wastewater via a Fenton’s reaction to form a second wastewater stream; adding an iron-containing chemical to the second wastewater stream to form an iron- dosed w astewater stream; adjusting a pH of the iron-dosed wastewater stream to precipitate an iron compound from the iron-dosed wastewater stream; and separating the pH-adjusted iron-dosed wastewater stream into a treated water stream and a waste product including the iron compound.
18. A system for removing iron from chemical mechanical polishing wastewater from which an azole compound has been previously removed by a Fenton’s reaction, the system comprising: a source of an iron-containing chemical configured to dose the w astew ater stream with the iron- containing chemical and produce an iron-dosed wastewater stream; a source of pH adjustment chemical configured to dose the iron-dosed wastewater stream with a sufficient amount of the pH adjustment chemical to cause an iron compound to precipitate from the iron-dosed w astew ater stream; and a solid/liquid separation sub-system configured to separate the pH-adjusted iron- dosed wastewater stream into a treated water stream and a waste product including the iron compound.
19. A method of facilitating removal of iron from chemical mechanical polishing wastewater from which an azole compound has been previously removed by a Fenton's reaction, the method comprising: connecting a source of an iron-containing chemical to one of a vessel or conduit through which the wastewater passes, the source of the iron-containing chemical configured to dose the wastewater stream with the iron-containing chemical and produce an iron-dosed wastewater stream:
connecting a source of pH adjustment chemical to one of a vessel or conduit through which the iron-dosed wastewater stream passes, the source of pH adjustment chemical configured to dose the iron-dosed wastewater stream with a sufficient amount of the pH adjustment chemical to cause an iron compound to precipitate from the iron-dosed wastewater stream; and providing a solid/liquid separation sub-system configured to receive the pH-adjusted iron-dosed wastewater stream and separate the pH-adjusted iron-dosed wastewater stream into a treated water stream and a waste product including the iron compound.
20. The method of claim 19, further providing a controller in communication with one of the source of iron-containing chemical or the source of pH adjustment chemical and configured to control an amount of chemical dosed by the one of the source of iron- containing chemical or the source of pH adjustment chemical based upon one or more measured parameters of one or more of the wastewater stream, the iron-dosed wastewater stream, or the pH-adjusted iron-dosed wastewater stream.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US202263432341P | 2022-12-13 | 2022-12-13 | |
US63/432,341 | 2022-12-13 |
Publications (1)
Publication Number | Publication Date |
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WO2024129837A1 true WO2024129837A1 (en) | 2024-06-20 |
Family
ID=91485821
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2023/083800 WO2024129837A1 (en) | 2022-12-13 | 2023-12-13 | Reduction of ferrous iron from azole-treated wastewater |
Country Status (1)
Country | Link |
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WO (1) | WO2024129837A1 (en) |
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2023
- 2023-12-13 WO PCT/US2023/083800 patent/WO2024129837A1/en unknown
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