WO2024085082A1 - Vinyl compound, vinyl composition, vinyl resin cured product, prepreg, resin-attached film, resin-attached metal foil, metal-clad laminate, and printed wiring board - Google Patents

Vinyl compound, vinyl composition, vinyl resin cured product, prepreg, resin-attached film, resin-attached metal foil, metal-clad laminate, and printed wiring board Download PDF

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WO2024085082A1
WO2024085082A1 PCT/JP2023/037192 JP2023037192W WO2024085082A1 WO 2024085082 A1 WO2024085082 A1 WO 2024085082A1 JP 2023037192 W JP2023037192 W JP 2023037192W WO 2024085082 A1 WO2024085082 A1 WO 2024085082A1
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substituted
group
unsubstituted
rings
linked
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PCT/JP2023/037192
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French (fr)
Japanese (ja)
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七瀬 佐久川
大貴 田中
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住友化学株式会社
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B32B15/082Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising vinyl resins; comprising acrylic resins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/003Esters of saturated alcohols having the esterified hydroxy group bound to an acyclic carbon atom
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/94Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of polycyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/34Monomers containing two or more unsaturated aliphatic radicals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F16/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F16/36Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by a ketonic radical
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/44Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate

Definitions

  • the present invention relates to vinyl compounds, vinyl compositions, vinyl resin cured products, prepregs, resin-coated films, resin-coated metal foils, metal-clad laminates, and printed wiring boards.
  • a well-known example of a printed wiring board with high heat dissipation properties is the so-called thick copper board, which is made by making the copper (i.e. the copper pattern) that forms the circuit thicker than before, allowing more heat to be dissipated through the copper.
  • this thick copper board has the problem that it is not suitable for communication devices, which require compactness and light weight, because it is thick overall.
  • a known example of a printed wiring board with high heat dissipation properties is a metal-based board, which has a metal plate on one side that allows it to dissipate more heat through the metal plate.
  • this metal-based board requires an increased number of manufacturing steps, which increases the manufacturing costs of the communications device.
  • materials that contain resin as the main component and have high heat dissipation properties are known to contain a highly thermally conductive filler.
  • materials that contain filler have poor processability, which is an issue in that they are not suitable for manufacturing printed wiring boards.
  • Patent Document 1 A resin with high thermal conductivity has been disclosed as a material that can solve these problems.
  • Electronic materials used in high-speed communication devices are required to have high heat dissipation properties as well as low dielectric loss, and the resin disclosed in Patent Document 1 itself has thermal conductivity and low dielectric loss.
  • the thermal conductivity of the resin disclosed in Patent Document 1 is not sufficient, and there is room for improvement.
  • the monomer compound, which is the raw material for the resin it is desirable for the monomer compound, which is the raw material for the resin, to have good processability, so it is also required that the resin have a low melting point and high solubility in organic solvents used for processing.
  • a 1 is a substituted or unsubstituted m-valent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted m-valent cycloalkane group, an m-valent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocyclic rings) are linked by a single bond, an m-valent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, an m-valent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a
  • R5 is a substituted or unsubstituted divalent aromatic group (excluding a nitrogen-containing aromatic heterocyclic group), and when p is 2 or 3, multiple R5s may be the same or different from each other;
  • R 6 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group, and multiple R 6s may be the same or different from each other;
  • p is an integer from 1 to 3;
  • q is an integer from 1 to 3; * is the bonding position to X1 , ** represents the bonding position to the oxygen atom bonded to R 1 , the bonding position to R 1 , the bonding position to the oxygen atom bonded to R 3 C, or the bonding position to R 3 C.
  • A2 represents a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycle
  • a 1 and A 2 are groups having 14 or less carbon atoms (however, the number of carbon atoms does not include the number of carbon atoms of a substituent), The vinyl compound according to [1].
  • a vinyl composition comprising the vinyl compound according to any one of [1] to [3].
  • a vinyl resin cured product obtained by curing the vinyl compound according to any one of [1] to [3] or the vinyl composition according to [4].
  • a prepreg comprising the vinyl compound or semi-cured product thereof according to any one of [1] to [3], or the vinyl composition or semi-cured product thereof according to [4], and a fibrous base material.
  • a resin-attached film comprising a resin layer containing the vinyl compound or semi-cured product thereof according to any one of [1] to [3], or the vinyl composition or semi-cured product thereof according to [4], and a support film.
  • a resin-coated metal foil comprising a resin layer containing the vinyl compound or semi-cured product thereof according to any one of [1] to [3], or the vinyl composition or semi-cured product thereof according to [4], and a metal foil.
  • a metal-clad laminate comprising an insulating layer containing a cured product of the vinyl compound according to any one of [1] to [3] or a cured product of the vinyl composition according to [4], and a metal foil.
  • a metal-clad laminate comprising an insulating layer containing a cured product of the prepreg according to [6] and a metal foil.
  • a printed wiring board comprising an insulating layer containing a cured product of the vinyl compound according to any one of [1] to [3] or a cured product of the vinyl composition according to [4], and a conductor wiring.
  • a printed wiring board comprising an insulating layer containing a cured product of the prepreg according to [6] and a conductor wiring.
  • the present invention it is possible to provide a novel compound which can be used as a constituent material for printed wiring boards and which exhibits a low melting point and high solubility. It is also possible to provide a composition that contains the novel compound and that can give a cured product with high thermal conductivity.
  • FIG. 1 is a cross-sectional view showing a schematic example of a laminate structure obtained by using a vinyl compound according to one embodiment of the present invention.
  • FIG. 2 is a cross-sectional view showing a schematic diagram of another example of a laminate structure obtained by using a vinyl compound according to one embodiment of the present invention.
  • FIG. 2 is a cross-sectional view showing a schematic diagram of still another example of a laminate structure obtained by using a vinyl compound according to one embodiment of the present invention.
  • FIG. 2 is a cross-sectional view showing a schematic diagram of still another example of a laminate structure obtained by using a vinyl compound according to one embodiment of the present invention.
  • the vinyl compound of the present embodiment is represented by formula (1) or formula (2).
  • R is an acryloyl group, a methacryloyl group, or a vinylbenzyl group, and multiple Rs may be the same or different.
  • m R's it is preferable that at least one is a vinylbenzyl group, more preferably m-1 is a vinylbenzyl group, and even more preferably all m are vinylbenzyl groups.
  • the vinylbenzyl group represented by R is an o-vinylbenzyl group, an m-vinylbenzyl group, or a p-methylbenzyl group, preferably an m-vinylbenzyl group or a p-methylbenzyl group, and more preferably an m-vinylbenzyl group from the viewpoint of lowering the melting point of the vinyl compound.
  • the positions of the vinyl groups of the m vinylbenzyl groups in formula (1) or formula (2) may be the same or different.
  • a 1 is a substituted or unsubstituted m-valent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted m-valent cycloalkane group, an m-valent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocyclic rings) are linked by single bonds, an m-valent group in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds, an m-valent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by single bonds, a substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group, a group represented by R 1 (OR 2 -*) 3 , a group represented by R 1 (R 2 -*) 3 , a group represented by R 3 C(OR 2 -*)
  • the substituted or unsubstituted m-valent aromatic group represented by A 1 is a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted aromatic ring.
  • the aromatic ring may be a monocyclic ring, a condensed ring, or a heterocyclic ring.
  • the heteroatom contained in the heterocyclic ring may be a heteroatom other than a nitrogen atom, such as an oxygen atom or a sulfur atom. From the viewpoint of suppressing dielectric loss or reducing the dielectric tangent, it is preferable that the aromatic ring does not contain a heteroatom.
  • the substituted or unsubstituted m-valent aromatic group represented by A1 is preferably a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted monocyclic or fused ring aromatic ring, and more preferably a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted monocyclic aromatic ring.
  • the number of carbon atoms in the unsubstituted m-valent aromatic group represented by A1 is not particularly limited, but is preferably 3 to 20, more preferably 6 to 16, and further preferably 6 to 14.
  • the number of carbon atoms in the unsubstituted aromatic ring is synonymous with the number of carbon atoms in the unsubstituted m-valent aromatic group, and the preferred embodiments thereof are also the same.
  • unsubstituted aromatic rings include benzene, naphthalene, anthracene, phenanthrene, pyrene, triphenylene, perylene, furan, benzofuran, dibenzofuran, thiophene, benzothiophene, and dibenzothiophene, with benzene being preferred.
  • the substituent is preferably a substituent other than a hydroxy group, and is, for example, one or more groups selected from the group consisting of an alkyl group having 1 to 20 carbon atoms and an alkoxy group having 1 to 20 carbon atoms.
  • the alkyl group having 1 to 20 carbon atoms may be a known alkyl group.
  • alkyl groups having 1 to 20 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, isobutyl, n-pentyl, neopentyl, n-hexyl, n-octyl, 2-ethylhexyl, n-nonyl, n-decyl, n-dodecyl, n-tetradecyl, n-hexadecyl, n-octadecyl, and n-icosyl.
  • the number of carbon atoms in the alkyl group is preferably 1 to 8, and more preferably 1 to 4. Specific examples of these preferred alkyl groups are the same as the alkyl groups having the corresponding carbon numbers among the specific examples described
  • the alkoxy group having 1 to 20 carbon atoms may be a known alkoxy group.
  • alkoxy groups having 1 to 20 carbon atoms include methoxy, ethoxy, n-propyloxy, isopropyloxy, n-butoxy, sec-butoxy, tert-butoxy, isobutyloxy, n-pentyloxy, neopentyloxy, n-hexyloxy, n-octyloxy, 2-ethylhexyloxy, n-nonyloxy, n-decyloxy, n-dodecyloxy, n-tetradecyloxy, n-hexadecyloxy, n-octadecyloxy, and n-icosyloxy.
  • the number of carbon atoms in the alkoxy group is preferably 1 to 8, and more preferably 1 to 4. Specific examples of these preferred alkyl groups are the same as the alkyl
  • unsubstituted m-valent aromatic group represented by A1 include the following groups (* indicates the bonding position to X1 ).
  • the substituted or unsubstituted m-valent cycloalkane group represented by A 1 is a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted cycloalkane ring.
  • the cycloalkane ring may be a monocyclic ring, a condensed ring, or a heterocyclic ring.
  • the cycloalkane ring is a heterocyclic ring
  • examples of the heteroatom contained in the heterocyclic ring include an oxygen atom, a nitrogen atom, and a sulfur atom. From the viewpoint of suppressing dielectric loss or reducing dielectric tangent, it is preferable that the cycloalkane ring does not contain a heteroatom.
  • the cycloalkane ring is preferably a monocyclic ring or a condensed ring, and more preferably a monocyclic ring.
  • the cycloalkane group and the cycloalkane ring may be in a cis form, a trans form, or a mixture thereof, and in the case of a mixture, it is preferable that the proportion of the trans form is higher.
  • the number of carbon atoms in the unsubstituted m-valent cycloalkane group is not particularly limited, but is preferably 3 to 20, more preferably 6 to 16, and even more preferably 6 to 14.
  • the number of carbon atoms in the unsubstituted cycloalkane ring is synonymous with the number of carbon atoms in the unsubstituted m-valent cycloalkane group, and the preferred embodiments are the same.
  • unsubstituted cycloalkane rings include cyclopropane, cyclobutane, cyclopentane, cyclohexane, cycloheptane, cyclooctane, cyclononane, cyclodecane, cycloundecane, cyclododecane, cyclotridecane, cyclotetradecane, cyclopentadecane, cyclohexadecane, cycloheptadecane, cyclooctadecane, cyclononadecane, cycloicosane, decalin, adamantane, oxetane, tetrahydrofuran, tetrahydropyran, 1,4-dioxane, 1,3-dioxane, aziridine, pyrrolidine, piperidine, piperazine, morpholine, tetrahydrothioph
  • the substituent has the same meaning as the substituent that the m-valent aromatic group represented by A1 may have.
  • Preferred specific examples of the substituted or unsubstituted m-valent cycloalkane group represented by A 1 include the following groups (* indicates the bonding position to X 1 ).
  • the m-valent group represented by A1 in which two or more substituted or unsubstituted aromatic rings are linked by single bonds is a group obtained by removing m hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted aromatic rings are linked by single bonds.
  • the substituted or unsubstituted aromatic ring linked by a single bond is the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group (i.e., a substituted or unsubstituted aromatic ring formed by binding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), and the preferred embodiments thereof are also the same.
  • the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
  • compounds in which two or more unsubstituted aromatic rings are linked by a single bond include biphenyl, o-terphenyl, m-terphenyl, p-terphenyl, m-quarterphenyl, and p-quarterphenyl.
  • the m-valent group represented by A1 in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds is a group obtained by removing m hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds.
  • the substituted or unsubstituted cycloalkane ring linked by a single bond has the same meaning as the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group (i.e., a substituted or unsubstituted cycloalkane ring formed by binding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group), and the preferred embodiments thereof are also the same.
  • the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
  • compounds in which two or more unsubstituted cycloalkane rings are linked by single bonds include cyclopropylcyclohexane, bicyclohexyl, 1,3-dicyclohexylcyclohexane, 1,4-dicyclohexylcyclohexane, 1-cyclohexylpyrrolidine, and 4-cyclohexylmorpholine.
  • the m-valent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond represented by A 1 , is a group obtained by removing m hydrogen atoms from any position of a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond.
  • the substituted or unsubstituted aromatic ring and the substituted or unsubstituted cycloalkane ring linked by a single bond are respectively the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group) and the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group), and the preferred embodiments thereof are also the same.
  • the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1.
  • the total number of substituted or unsubstituted aromatic rings linked by single bonds and the number of substituted or unsubstituted cycloalkane rings is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
  • compounds in which one or more unsubstituted aromatic rings and one or more unsubstituted cycloalkane rings are linked by a single bond include cyclopropylbenzene, cyclopentylbenzene, cyclohexylbenzene, 1-cyclohexylnaphthalene, 2-cyclohexylnaphthalene, 2-phenyltetrahydrofuran, 1-phenyladamantane, 1,3-diphenyladamantane, 1,3,5,7-tetraphenyladamantane, 2-cyclohexylfuran, 4-phenylpiperidine, 2-cyclohexylthiophene, and 4-phenylmorpholine.
  • the substituted or unsubstituted, m-valent, linear saturated aliphatic hydrocarbon group represented by A1 is a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted linear saturated aliphatic hydrocarbon, and is preferably a group in which one hydrogen atom bonded to m different carbon atoms of a substituted or unsubstituted linear saturated aliphatic hydrocarbon has been removed from each of the carbon atoms.
  • the chain-like saturated aliphatic hydrocarbon may be a straight-chain saturated aliphatic hydrocarbon or a branched saturated aliphatic hydrocarbon.
  • the substituted or unsubstituted m-valent chain saturated aliphatic hydrocarbon group represented by A 1 is preferably a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted branched aliphatic hydrocarbon.
  • the number of carbon atoms in the unsubstituted m-valent chain saturated aliphatic hydrocarbon group represented by A1 is not particularly limited, but is preferably 1 to 10, more preferably 3 to 9, and even more preferably 5 to 8.
  • unsubstituted linear saturated aliphatic hydrocarbon represented by A1 include n-propane, n-butane, 2-methylpropane, n-pentane, 2-methylbutane, 2,2-dimethylpropane, n-hexane, 2-methylpentane, 3-methylpentane, 2,2-dimethylbutane, and 2,2,4,4-tetramethylpentane, and preferably 2,2-dimethylpropane.
  • the substituent has the same meaning as the substituent that the m-valent aromatic group represented by A1 may have.
  • Preferred specific examples of the substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group represented by A 1 include the following groups (* indicates the bonding position to X 1 ).
  • R 1 is a substituted or unsubstituted trivalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups);
  • R 2 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group, a group represented by **-R 4 (R 5 ) p R 4 -*, or a group represented by **-(R 6 O) q R 6 -*;
  • R 4 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group;
  • R 5 is a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups);
  • R 6 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group;
  • p is an integer from 1 to 3; and q is an integer from 1 to 3.
  • R 2s may be the same or different from each other.
  • Multiple R 4 may be the same or different from each other.
  • multiple R 5 may be the same or different from each other.
  • Multiple R 6 may be the same or different from each other.
  • * is the bonding position to X 1 ; ** is the bonding position to the oxygen atom bonded to R 1 when A 1 is a group represented by R 1 (OR 2 -*) 3 , and is the bonding position to R 1 when A 1 is a group represented by R 1 (R 2 -*) 3 .
  • the substituted or unsubstituted trivalent aromatic group represented by R 1 is a group obtained by removing three hydrogen atoms from any position of a substituted or unsubstituted aromatic ring.
  • This substituted or unsubstituted aromatic ring is the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A 1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), and the preferred embodiments thereof are also the same.
  • the substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group represented by R2 is a group obtained by removing two hydrogen atoms from any position of a substituted or unsubstituted linear saturated aliphatic hydrocarbon.
  • This substituted or unsubstituted linear saturated aliphatic hydrocarbon is the same as the substituted or unsubstituted linear saturated aliphatic hydrocarbon mentioned in the description of the substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group represented by A1 (i.e., a substituted or unsubstituted linear saturated aliphatic hydrocarbon obtained by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group), but preferred embodiments and specific examples of the substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group represented by R2 are as follows.
  • the substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R2 is preferably a group in which one hydrogen atom bonded to each of two different carbon atoms of a substituted or unsubstituted chain saturated aliphatic hydrocarbon has been removed from said carbon atoms, and is also preferably a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted straight-chain saturated aliphatic hydrocarbon.
  • the number of carbon atoms in the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R2 is not particularly limited, but is preferably 1 to 20, more preferably 2 to 16, and even more preferably 3 to 12.
  • unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R2 include a trimethylene group, a tetramethylene group, a pentamethylene group, a hexamethylene group, a 3-methylpentane-1,5-diyl group, a heptamethylene group, an octamethylene group, and a dodecamethylene group.
  • the substituent has the same meaning as the substituent that the m-valent aromatic group represented by A1 may have, and preferred embodiments thereof are also the same.
  • R 2 is a group represented by **-R 4 (R 5 ) p R 4 -*
  • the substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group represented by R 4 has the same meaning as the substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group represented by R 2 , and preferred embodiments and specific examples thereof are as follows:
  • the substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R4 is preferably a group in which one hydrogen atom bonded to each of two different carbon atoms of a substituted or unsubstituted chain saturated aliphatic hydrocarbon has been removed from said carbon atoms, and is also preferably a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted straight-chain saturated aliphatic hydrocarbon.
  • the number of carbon atoms in the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R4 is not particularly limited, but is preferably 1 to 4, more preferably 1 to 3, and even more preferably 1.
  • R4 Specific examples of the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R4 include a methylene group, an ethylene group, a propylene group, a trimethylene group, and a tetramethylene group.
  • R2 is a group represented by **- R4 ( R5 ) pR4- *
  • the substituted or unsubstituted divalent aromatic group represented by R5 is a group obtained by removing two hydrogen atoms from any position of a substituted or unsubstituted aromatic ring.
  • the substituted or unsubstituted aromatic ring has the same meaning as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), and the preferred embodiments thereof are also the same.
  • R 2 is a group represented by **-(R 6 O) q R 6 -*
  • the substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R 6 has the same meaning as the substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R 2 , and preferred embodiments and specific examples thereof are as follows:
  • the substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R6 is preferably a group in which one hydrogen atom bonded to each of two different carbon atoms of a substituted or unsubstituted chain saturated aliphatic hydrocarbon has been removed from said carbon atoms, and is also preferably a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted straight-chain saturated aliphatic hydrocarbon.
  • the number of carbon atoms in the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R 6 is not particularly limited, but is preferably 1 to 4, more preferably 1 to 3, and even more preferably 1 to 2.
  • R6 Specific examples of the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R6 include a methylene group, an ethylene group, a propylene group, a trimethylene group, and a tetramethylene group.
  • R 2 is a group represented by **-(R 6 O) q R 6 -*, q is an integer of 1 to 3, and preferably 2.
  • **-(R 6 O) q R 6 -* include **-CH 2 CH 2 OCH 2 CH 2 -*, **-(CH 2 CH 2 O) 2 CH 2 CH 2 -*, **-CH(CH 3 )CH 2 OCH(CH 3 )CH 2 -*, and **-(CH(CH 3 )CH 2 O) 2 CH(CH 3 )CH 2 -*.
  • R 1 (OR 2 -*) 3 Specific preferred examples of the group represented by R 1 (OR 2 -*) 3 include the following groups.
  • R 1 (R 2 -*) 3 Specific preferred examples of the group represented by R 1 (R 2 -*) 3 include the following groups.
  • R 2 has the same meaning as R 2 in the group represented by R 1 (OR 2 -*) 3 , and the preferred embodiments are also the same.
  • * is the bonding position to X 1 ; ** is the bonding position to the oxygen atom bonded to R 3 C when A 1 is a group represented by R 3 C(OR 2 -*) 3 , and is the bonding position to R 3 C when A 1 is a group represented by R 3 C(R 2 -*) 3.
  • R 3 is a hydrogen atom or a methyl group.
  • R 3 C(OR 2 -*) 3 Preferred specific examples of the group represented by R 3 C(OR 2 -*) 3 include the following groups.
  • R 3 C(R 2 -*) 3 Preferred specific examples of the group represented by R 3 C(R 2 -*) 3 include the following groups.
  • A2 represents a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings (excluding
  • a 2 's may be the same or different from each other.
  • * denotes the bonding position to X1 ; ** denotes the bonding position to the acryloyloxy group, methacryloyloxy group, or vinylbenzyloxy group in formula (1), or the bonding position to the acryloyloxyalkoxy group, methacryloyloxyalkoxy group, or vinylbenzyloxyalkoxy group in formula (2).
  • A2 preferably contains a double bond, since this increases the degree of orientation due to ⁇ - ⁇ stacking interactions, and as a result, a cured product having high thermal conductivity can be obtained. Therefore, A 2 is preferably a substituted or unsubstituted divalent aromatic group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a
  • 2 is a substituted or unsubstituted divalent aromatic group, a substituted or unsubstituted divalent cycloalkane group, a divalent group in which two or more substituted or unsubstituted aromatic rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, or a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond.
  • a substituted or unsubstituted divalent aromatic group a substituted or unsubstituted divalent cycloalkane group, a divalent group in which two substituted or unsubstituted aromatic rings are linked by a single bond
  • the substituted or unsubstituted divalent aromatic group represented by A2 is a group obtained by removing two hydrogen atoms from any position of a substituted or unsubstituted aromatic ring.
  • This substituted or unsubstituted aromatic ring is the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group.) and the preferred embodiments thereof are also the same.
  • the preferred embodiments of the substituted or unsubstituted divalent aromatic group represented by A2 are as follows.
  • the substituted or unsubstituted divalent aromatic group represented by A2 is preferably a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted monocyclic or fused ring aromatic ring, and is also preferably a group in which two hydrogen atoms have been removed from any position of an unsubstituted aromatic ring.
  • the number of carbon atoms in the substituted or unsubstituted divalent aromatic group represented by A2 is not particularly limited, but is preferably 3 to 20, more preferably 6 to 16, and even more preferably 6 to 14.
  • unsubstituted aromatic rings include benzene, naphthalene, anthracene, phenanthrene, pyrene, triphenylene, perylene, furan, benzofuran, dibenzofuran, thiophene, benzothiophene, and dibenzothiophene, and preferably benzene or naphthalene.
  • the substituent is preferably selected from the group consisting of an alkyl group having 1 to 2 carbon atoms and an alkoxy group having 1 to 2 carbon atoms.
  • the divalent aromatic group represented by A2 is unsubstituted, or if it has a substituent, the substituent is preferably selected from the group consisting of an alkyl group having 1 to 2 carbon atoms and an alkoxy group having 1 to 2 carbon atoms.
  • the divalent aromatic group represented by A2 is unsubstituted or has a substituent with small steric hindrance, the ⁇ - ⁇ stacking interaction between mesogenic skeletons is less likely to be hindered, and the degree of orientation is increased, so that a cured product having high thermal conductivity can be obtained.
  • substituted or unsubstituted divalent aromatic group represented by A2 include the following groups.
  • the substituted or unsubstituted divalent cycloalkane group represented by A2 is a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted cycloalkane ring.
  • This substituted or unsubstituted cycloalkane ring has the same meaning as the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group), and the preferred embodiments thereof are also the same.
  • Preferred specific examples of the substituted or unsubstituted divalent cycloalkane group represented by A2 include the following groups.
  • the substituted or unsubstituted divalent cycloalkene group represented by A2 is a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted cycloalkene ring.
  • the cycloalkene ring may be a monocyclic ring, a condensed ring, or a heterocyclic ring.
  • the cycloalkene ring is a heterocyclic ring
  • heteroatoms contained in the heterocyclic ring include an oxygen atom, a nitrogen atom, and a sulfur atom. From the viewpoint of suppressing dielectric loss or reducing dielectric tangent, it is preferable that the cycloalkene ring does not contain a heteroatom.
  • the cycloalkene ring is preferably a monocyclic ring or a condensed ring, and more preferably a monocyclic ring.
  • the number of double bonds contained in one cycloalkene ring is not particularly limited, but is preferably 1 to 3, more preferably 1 to 2, and even more preferably 1.
  • the position of the double bond contained in the cycloalkene ring is not particularly limited.
  • the cycloalkene group and the cycloalkene ring may be in a cis form, a trans form, or a mixture thereof, and in the case of a mixture, it is preferable that the proportion of the trans form is higher.
  • the number of carbon atoms in the unsubstituted divalent cycloalkene group is not particularly limited, but is preferably 4 to 20, more preferably 5 to 16, and even more preferably 6 to 14.
  • the number of carbon atoms in the unsubstituted cycloalkene ring is synonymous with the number of carbon atoms in the unsubstituted divalent cycloalkene group, and the preferred embodiments are the same.
  • unsubstituted cycloalkene rings include cyclopentene, cyclohexene, cycloheptene, cyclooctene, cyclononene, cyclopentadiene, 1,3-cyclohexadiene, 1,4-cyclohexadiene, 1,3-cycloheptadiene, 1,4-cycloheptadiene, 1,3-cyclooctadiene, 1,5-cyclooctadiene, 1,6-cyclodecadiene, 1,5-cyclododecadiene, 1,3,5-cycloheptatriene, 1,3,5-cyclooctatriene, and 1,5,9-cyclododecatriene.
  • the substituent has the same meaning as the substituent that the m-valent aromatic group represented by A1 may have.
  • Preferred specific examples of the substituted or unsubstituted divalent cycloalkene group represented by A2 include the following groups.
  • the divalent group represented by A2 in which two or more substituted or unsubstituted aromatic rings are linked by a single bond is a group obtained by removing two hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted aromatic rings are linked by a single bond.
  • the substituted or unsubstituted aromatic ring linked by a single bond is the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by binding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), and the preferred embodiments thereof are also the same.
  • the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
  • compounds in which two or more unsubstituted aromatic rings are linked by a single bond include biphenyl, o-terphenyl, m-terphenyl, p-terphenyl, m-quarterphenyl, and p-quarterphenyl.
  • the divalent group represented by A2 in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds is a group obtained by removing two hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds.
  • the substituted or unsubstituted cycloalkane ring linked by a single bond is the same as the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by binding a hydrogen atom to a bond of an m-valent cycloalkane group), and the preferred embodiments thereof are also the same.
  • the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
  • compounds in which two or more unsubstituted cycloalkane rings are linked by single bonds include cyclopropylcyclohexane, bicyclohexyl, 1,3-dicyclohexylcyclohexane, 1,4-dicyclohexylcyclohexane, 1-cyclohexylpyrrolidine, and 4-cyclohexylmorpholine.
  • the divalent group represented by A2 in which two or more substituted or unsubstituted cycloalkene rings are linked by single bonds is a group obtained by removing two hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted cycloalkene rings are linked by single bonds.
  • the substituted or unsubstituted cycloalkene ring linked by a single bond is the same as the substituted or unsubstituted cycloalkene ring mentioned in the description of the substituted or unsubstituted divalent cycloalkene group represented by A2 (i.e., a substituted or unsubstituted cycloalkene ring formed by binding a hydrogen atom to a bond of a substituted or unsubstituted divalent cycloalkene group), and the preferred embodiments thereof are also the same.
  • the number of substituted or unsubstituted cycloalkene rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
  • the divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond represented by A2 is a group obtained by removing two hydrogen atoms from any position of a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond.
  • the substituted or unsubstituted aromatic ring and the substituted or unsubstituted cycloalkane ring linked by a single bond are respectively the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group.) and the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group.) and the preferred embodiments thereof are the same.
  • the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1.
  • the total number of substituted or unsubstituted aromatic rings linked by single bonds and the number of substituted or unsubstituted cycloalkane rings is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
  • compounds in which one or more unsubstituted aromatic rings and one or more unsubstituted cycloalkane rings are linked by a single bond include cyclopropylbenzene, cyclopentylbenzene, cyclohexylbenzene, 1-cyclohexylnaphthalene, 2-cyclohexylnaphthalene, 2-phenyltetrahydrofuran, 1-phenyladamantane, 1,3-diphenyladamantane, 1,3,5,7-tetraphenyladamantane, 2-cyclohexylfuran, 4-phenylpiperidine, 2-cyclohexylthiophene, and 4-phenylmorpholine.
  • divalent group represented by A2 in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond include the following groups.
  • the divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond represented by A2 is a group obtained by removing two hydrogen atoms from any position of a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond.
  • the substituted or unsubstituted aromatic ring and the substituted or unsubstituted cycloalkene ring linked by a single bond are respectively the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group.) and the substituted or unsubstituted cycloalkene ring mentioned in the description of the substituted or unsubstituted divalent cycloalkene group represented by A2 (i.e., a substituted or unsubstituted cycloalkene ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted divalent cycloalkene group.) and the preferred embodiments thereof are the same.
  • divalent group represented by A2 in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond include the following groups.
  • the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkene rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1.
  • the total number of substituted or unsubstituted aromatic rings linked by single bonds and the number of substituted or unsubstituted cycloalkene rings is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
  • the divalent group represented by A2 in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond is a group in which two hydrogen atoms have been removed from any position of a compound in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond.
  • substituted or unsubstituted cycloalkane ring and the substituted or unsubstituted cycloalkene ring linked by a single bond are respectively synonymous with the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group) and the substituted or unsubstituted cycloalkene ring mentioned in the description of the substituted or unsubstituted divalent cycloalkene group represented by A2 (i.e., a substituted or unsubstituted cycloalkene ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted di
  • the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkene rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1.
  • the total number of substituted or unsubstituted cycloalkane rings and substituted or unsubstituted cycloalkene rings linked by single bonds is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
  • the divalent group represented by A2 in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by single bonds is a group obtained by removing two hydrogen atoms from any position of a compound in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by single bonds.
  • substituted or unsubstituted aromatic ring, substituted or unsubstituted cycloalkane ring, and substituted or unsubstituted cycloalkene ring linked by a single bond are respectively the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycl
  • the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkene rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1.
  • the total number of substituted or unsubstituted aromatic rings, substituted or unsubstituted cycloalkane rings, and substituted or unsubstituted cycloalkene rings linked by single bonds is preferably 3 to 10, more preferably 3 to 4, and even more preferably 3.
  • B 1 to B 4 are each a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond
  • a substituted or unsubstituted divalent aromatic group represented by B 1 to B 4 (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted A divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single
  • Each of Y 1 to Y 3 is an ester group (—COO— or —OCO—), a carbonyl group (—CO—) or an ether group (—O—), and is preferably an ester group.
  • A1 and A2 are also preferably, among the above-mentioned groups, a group having 3 to 14 carbon atoms or a group having 6 to 14 carbon atoms, provided that this number of carbon atoms does not include the number of carbon atoms of the substituent.
  • X 1 is a single bond, an ester group (-COO- or -OCO-), a carbonyl group (-CO-), or an ether group (-O-), preferably an ester group or a carbonyl group, and more preferably an ester group. Multiple X 1s may be the same or different from each other.
  • m is an integer from 3 to 6, preferably an integer from 3 to 5, more preferably 3 or 4, and even more preferably 3.
  • n is an integer from 1 to 20, preferably an integer from 1 to 12, more preferably an integer from 1 to 8, and even more preferably an integer from 2 to 6. Multiple n's may be the same or different.
  • Vinyl compound (1) has a low melting point and high solubility.
  • the melting point of the vinyl compound (1) is preferably less than 160°C. It is preferably 80°C or higher and less than 160°C, more preferably 90 to 155°C, and even more preferably 100 to 155°C. If the melting point of the vinyl compound is within the above range, it becomes easy to process it by melt kneading or the like, and the energy required for processing can also be reduced.
  • the vinyl compound (1) has high solubility in organic solvents when a coating solution prepared by dissolving the vinyl compound in an organic solvent is applied, and therefore has excellent workability, processability, and the like.
  • the organic solvent is not particularly limited, and examples thereof include hydrocarbon solvents such as hexane, benzene, and toluene; ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; ether solvents such as diethyl ether, isobutyl methyl ether, and tetrahydrofuran; and ester solvents such as methyl acetate, ethyl acetate, and isobutyl acetate.
  • vinyl compound (1) exhibits higher solubility in ether solvents than conventionally known vinyl compounds.
  • vinyl compound 1 and vinyl compound 2 in the Examples exhibit solubilities in ether solvents that are about 7 times and about 3 times, respectively, of conventionally known vinyl compounds.
  • the vinyl compound (1) is polymerizable and can form a vinyl resin cured product (described later) by polymerization (also referred to as "curing" in this specification). Therefore, the vinyl compound (1) can be suitably used to form a constituent material for the insulating layer of a printed wiring board, a heat dissipation material, and the like.
  • a 1 when A 1 contains a chain-like saturated aliphatic hydrocarbon group, A 2 is the mesogenic skeleton in vinyl compound (1).
  • a 1 when A 1 does not contain a chain-like saturated aliphatic hydrocarbon group, the structure in which A 1 , X 1 and A 2 are linked is the mesogenic skeleton in vinyl compound (1).
  • the mesogenic skeleton of vinyl compound (1) has a higher degree of orientation because it has a larger number of linked hydrocarbon rings than, for example, a conventional mesogenic skeleton having a structure in which two hydrocarbon rings are linked.
  • the resin which is the cured product of vinyl compound (1), exhibits high thermal conductivity due to having such a structure with a high degree of orientation.
  • resins that have hydroxyl groups tend to have high dielectric loss.
  • a resin that is a cured product of a compound (monomer) that has epoxy groups at its terminal has hydroxyl groups in the resin, and its dielectric loss is high.
  • the terminal of vinyl compound (1) is neither an epoxy group nor a hydroxy group, but a vinyl group (ethenyl group). Therefore, the cured product (polymer) of vinyl compound (1) has no hydroxy groups and therefore shows low dielectric loss.
  • the vinyl compound (1) can be produced, for example, by reacting a compound represented by formula (3) or formula (4) (sometimes referred to as "compound (A)” in this specification) with a compound represented by formula (5) (sometimes referred to as “compound (B)” in this specification) in the presence of a base.
  • Examples of the compound (A) include 1,3,5-tris(4-hydroxyphenyl)cyclohexane, 1,3,5-tris(3-methyl-4-hydroxyphenyl)cyclohexane, 1-(4-hydroxyphenyl)-3,5-bis(3-methyl-4-hydroxyphenyl)cyclohexane, 1-(3-methyl-4-hydroxyphenyl)-3,5-bis(4-hydroxyphenyl)cyclohexane, 1,3,5-tris(4-hydroxyphenyl)benzene, 1,3,5-tris(3-methyl-4- 1-(4-hydroxyphenyl)-3,5-bis(3-methyl-4-hydroxyphenyl)benzene, 1-(3-methyl-4-hydroxyphenyl)-3,5-bis(4-hydroxyphenyl)benzene, 1,3,5-tris(4-(4-hydroxyphenyl)cyclohexyl)benzene, 1,3,5-tris(4-hydroxyphenyl)-1,3,5-cyclo
  • the X represents a halogen atom, and examples of the halogen atom include a chlorine atom, a bromine atom, and an iodine atom.
  • compound (B) examples include acryloyl bromide, acryloyl chloride, methacryloyl bromide, methacryloyl chloride, o-vinylbenzyl bromide, m-vinylbenzyl bromide, p-vinylbenzyl bromide, o-vinylbenzyl chloride, m-vinylbenzyl chloride, and p-vinylbenzyl chloride.
  • Compound (B) may be used alone or in any combination and ratio of two or more kinds.
  • the amount of compound (B) used is usually preferably 2 to 100 equivalents, more preferably 2 to 50 equivalents, relative to compound (A).
  • the base may be either an inorganic base or an organic base.
  • the inorganic base include alkali metal hydrides such as sodium hydride and potassium hydride; alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; alkali metal carbonates such as sodium carbonate and potassium carbonate; and the like.
  • the organic base include pyridine.
  • the amount of the base used is preferably 2 to 5 equivalents relative to compound (A). When an organic base that is liquid under reaction conditions is used, such an organic base may be used in an excess amount to serve as a reaction solvent.
  • the reaction between compound (A) and compound (B) is usually carried out in a solvent by mixing compound (A), compound (B), and a base.
  • the order of mixing is not particularly limited.
  • the solvent is not particularly limited as long as it is a solvent inert to the reaction, but a hydrophilic solvent is preferred in that it is easy to suppress the generation of by-products.
  • the hydrophilic solvent include alcohol-based solvents such as methanol, ethanol, propanol, butanol, ethylene glycol, and propylene glycol; ketone-based solvents such as methyl ethyl ketone and methyl isobutyl ketone; aprotic polar solvents such as N,N-dimethylformamide, dimethyl sulfoxide, and N-methylpyrrolidone; and ether-based solvents such as tetrahydrofuran, dioxane, methoxymethyl ether, and diethoxyethane; and the like, either alone or in combination.
  • the organic base when an organic base that is liquid under reaction conditions is used as a base, the organic base may be used as a reaction solvent.
  • the solvent is preferably an ether solvent, an aprotic polar solvent, or a mixture thereof, more preferably an aprotic polar solvent, and particularly preferably N,N-dimethylformamide.
  • the amount of solvent used is preferably 1 to 20 mL, and more preferably 2 to 10 mL, per gram of compound (A).
  • the reaction between compound (A) and compound (B) may be carried out in the presence of a catalyst via a halogen exchange reaction.
  • a catalyst include alkali metal halides such as sodium iodide and potassium iodide; and quaternary ammonium halides such as tetrabutylammonium iodide.
  • the amount of the catalyst used is preferably 0.05 to 1 times by mass, more preferably 0.1 to 0.5 times by mass, based on the amount of compound (A) used.
  • the reaction between compound (A) and compound (B) may be carried out in the presence of a polymerization inhibitor.
  • a polymerization inhibitor examples include 2,6-di(tert-butyl)-p-cresol.
  • the amount of the polymerization inhibitor used is preferably 0.002 to 0.05 times, more preferably 0.004 to 0.02 times, by mass, the amount of compound (B) used.
  • the reaction may be carried out under normal pressure conditions or under reduced pressure conditions.
  • the reaction temperature is usually preferably 10 to 150°C.
  • water may be produced as a by-product as the reaction proceeds. In such cases, it is preferable to carry out the reaction while removing the by-product water from the reaction system, and it is preferable to carry out the reaction at a reaction temperature and pressure at which water is removed azeotropically.
  • the reaction time is usually preferably 1 to 24 hours.
  • the reaction liquid is cooled, water or a mixed solvent containing water is added, the precipitated solid is filtered off, and if necessary, a known post-treatment operation is carried out once or twice or more times to obtain vinyl compound (1).
  • a known post-treatment operation include stirring and washing the solid in water, a mixed solvent containing water, or an organic solvent; extraction of the solution in which the solid is dissolved (liquid separation), and the like.
  • the obtained vinyl compound (1) may be further purified by a conventional purification means if necessary.
  • the structure of the obtained vinyl compound (1) can be confirmed by a known method such as nuclear magnetic resonance (NMR) spectroscopy.
  • NMR nuclear magnetic resonance
  • the vinyl composition of the present embodiment contains a vinyl compound (1).
  • the vinyl composition of the present embodiment may be referred to as "vinyl composition (1).”
  • the vinyl composition (1) has a curing property and may contain only the vinyl compound (1), or may contain the vinyl compound (1) and other components other than the vinyl compound (1) within a range that does not impair the effects of the present invention.
  • the vinyl compound (1) may be cured by heating or by light irradiation. In the examples described later, it is cured by heating. When curing the vinyl composition (1), pressure may be applied to the vinyl composition (1).
  • the vinyl composition (1) can be suitably used to form a constituent material such as an insulating layer of a printed wiring board or a heat dissipation material.
  • the vinyl composition (1) may contain one type of vinyl compound (1) alone, or may contain two or more types in any combination and in any ratio.
  • the vinyl composition (1) contains two or more vinyl compounds (1) in which two or more R in one molecule are vinylbenzyl groups
  • these two or more vinyl compounds (1) are a mixture of multiple vinyl compounds (1) in which the vinyl groups in the terminal vinylbenzyl groups are different in position and the portions other than the vinylbenzyl groups are identical.
  • the number of moles of vinylbenzyl groups in the m-position of the vinyl group is preferably 30 to 90, more preferably 40 to 90, even more preferably 50 to 90, even more preferably 60 to 80, and particularly preferably 70 to 80.
  • the ratio of the number of moles of vinylbenzyl groups whose vinyl groups are in the p-position to the number of moles of vinylbenzyl groups whose vinyl groups are in the m-position is preferably 10/90 to 70/30, more preferably 10/90 to 60/40, even more preferably 10/90 to 50/50, even more preferably 20/80 to 40/60, and particularly preferably 20/80 to 30/70.
  • Examples of the other components contained in the vinyl composition (1) include a radical initiator; a filler; an additive; a solvent; a vinyl compound other than the vinyl compound (1) (sometimes referred to as “other vinyl compounds” in this specification); and a resin other than a polymer (cured product) of the vinyl compound (1) (sometimes referred to as "other resins" in this specification).
  • the additives include, for example, silane coupling agents, colorants, low stress components, release agents, antioxidants, defoamers, flow control agents, etc.
  • radical initiator examples include azo compounds and organic peroxides.
  • the filler may, for example, be silica powder such as fused crushed silica powder, fused spherical silica powder, crystalline silica powder, or secondary agglomerated silica powder; metal oxides such as alumina, titanium oxide, zinc oxide, tungsten carbide, or magnesium oxide; glass cloth (glass fiber); carbon fiber; nitrides such as boron nitride, aluminum nitride, silicon nitride, or titanium nitride; silicon carbide; aluminum hydroxide; talc; clay; or mica.
  • silica powder such as fused crushed silica powder, fused spherical silica powder, crystalline silica powder, or secondary agglomerated silica powder
  • metal oxides such as alumina, titanium oxide, zinc oxide, tungsten carbide, or magnesium oxide
  • glass cloth (glass fiber) glass fiber
  • carbon fiber carbon fiber
  • nitrides such as boron nitride, aluminum nit
  • the silane coupling agent may, for example, be ⁇ -glycidoxypropyltrimethoxysilane.
  • the colorant may, for example, be carbon black.
  • Examples of the low stress component include silicone oil and silicone rubber.
  • Examples of the release agent include natural wax, synthetic wax, higher fatty acid, metal salt of higher fatty acid, and paraffin.
  • the solvent contained in the vinyl composition (1) may, for example, be a ketone-based solvent such as methyl ethyl ketone or methyl isobutyl ketone; an aprotic polar solvent such as dimethyl sulfoxide or N-methylpyrrolidone; an ester-based solvent such as butyl acetate; a glycol-based solvent such as propylene glycol monomethyl ether; or an aromatic solvent such as toluene.
  • a ketone-based solvent such as methyl ethyl ketone or methyl isobutyl ketone
  • an aprotic polar solvent such as dimethyl sulfoxide or N-methylpyrrolidone
  • an ester-based solvent such as butyl acetate
  • a glycol-based solvent such as propylene glycol monomethyl ether
  • an aromatic solvent such as toluene.
  • the other vinyl compound is not particularly limited as long as it has a vinyl group and does not fall under the category of vinyl compound (1).
  • the other resin is not particularly limited as long as it is a resin other than a polymer of the vinyl compound (1).
  • the vinyl composition (1) may contain only one type of other component, or two or more types.
  • the content of the other components in the vinyl composition (1) can be selected arbitrarily depending on the type of the other components.
  • the content ratio of the vinyl compound (1) to the total content of components other than the solvent is preferably 80% by mass or more, and may be, for example, any of 85% by mass or more, 90% by mass or more, 95% by mass or more, 97% by mass or more, and 99% by mass or more. On the other hand, the ratio is 100% by mass or less.
  • the vinyl composition (1) having the ratio of 80% by mass or more is preferable because the effect obtained by containing the vinyl compound (1) is higher.
  • the vinyl compound (1) obtained by the above method can be used as it is as vinyl composition (1).
  • the vinyl composition (1) containing the other components can be obtained by mixing the vinyl compound (1) with the other components.
  • the vinyl resin cured product of the present embodiment is obtained by curing the vinyl compound (1) or the vinyl composition (1).
  • the vinyl resin cured product of this embodiment may be referred to as "vinyl resin cured product (1)”.
  • the vinyl resin cured product has high thermal conductivity due to the use of vinyl compound (1), making it suitable as a constituent material for printed wiring boards, and is particularly suitable as an insulating material for printed wiring boards.
  • the vinyl resin cured product, due to the use of vinyl compound (1), tends to have lower dielectric loss than epoxy resins used for conventional circuit boards.
  • the vinyl resin cured material (1) when the vinyl resin cured material (1) is a cured material of a vinyl compound (1), the vinyl resin cured material (1) may be a cured material of one type of vinyl compound (1) or may be a cured material of two or more types of vinyl compounds (1).
  • the vinyl resin cured product (1) is a cured product of the vinyl composition (1)
  • the vinyl resin cured product (1) may be a cured product of one type of vinyl composition (1) or a cured product of a mixture of two or more types of vinyl compositions (1).
  • the vinyl resin cured product (1) can be prepared, for example, by filling a mold with the vinyl compound (1) or the vinyl composition (1) as is, and, if necessary, applying pressure at a predetermined pressure with a press or the like while heating for a predetermined time to cause primary curing, and then further applying pressure at a predetermined pressure with a press or the like while heating for a predetermined time to cause complete curing; by heating the vinyl compound (1) or the vinyl composition (1) as is at a predetermined temperature to cause curing; by pouring the powder of the vinyl compound (1) or the vinyl composition (1) as is, or after melting it as necessary, into a mold and heating for a predetermined time while applying pressure at a predetermined pressure with a press or the like; by heating and melting the vinyl compound (1) and then applying pressure to a mold or the like while heating for a predetermined time to cause complete curing; and further heating the mold to form the molded product; a method of melting the vinyl compound (1) or vinyl composition (1) and injecting the resulting molten product into a preheated mold to
  • the heating temperature (curing temperature; complete curing temperature when curing is performed in multiple stages) when the vinyl compound (1) or the vinyl composition (1) is heated and cured is not particularly limited, but in order to increase the degree of curing of the vinyl compound (1) or the vinyl composition (1), it is preferably 140°C or higher, and more preferably 150°C or higher. In order to avoid excessive heating, the heating temperature is preferably 200°C or lower.
  • the heating time (curing time; when curing is performed in multiple stages, the heating time at the complete curing temperature) when the vinyl compound (1) or the vinyl composition (1) is heated and cured is not particularly limited, but in order to increase the degree of curing of the vinyl compound (1) or the vinyl composition (1), it is preferably 1 hour or more, and more preferably 2 hours or more. In order to avoid unnecessary curing operations, the heating time is preferably 10 hours or less.
  • the pressure applied when the vinyl compound (1) or the vinyl composition (1) is pressed and cured is not particularly limited, but in terms of increasing the degree of curing of the vinyl compound (1) or the vinyl composition (1), it is preferably 0.7 MPa or more, and more preferably 1.2 MPa or more. In terms of avoiding excessive pressurization, the pressure applied is preferably 3 MPa or less.
  • the thermal diffusivity of the vinyl resin cured product (1) is preferably 1.75 ⁇ 10 ⁇ 7 m 2 /s or more, more preferably 1.80 ⁇ 10 ⁇ 7 m 2 /s or more, and even more preferably 1.85 ⁇ 10 ⁇ 7 m 2 /s or more.
  • the upper limit of the thermal diffusivity of the vinyl resin cured product (1) is not particularly limited, and the thermal diffusivity may be 4.00 ⁇ 10 ⁇ 7 m 2 /s or less, 3.00 ⁇ 10 ⁇ 7 m 2 /s or less, or 2.50 ⁇ 10 ⁇ 7 m 2 /s or less.
  • the thermal diffusivity of the vinyl resin cured product (1) may be, for example, any one of 1.75 ⁇ 10 ⁇ 7 to 4.00 ⁇ 10 ⁇ 7 m 2 /s, 1.80 ⁇ 10 ⁇ 7 to 3.00 ⁇ 10 ⁇ 7 m 2 /s, and 1.85 ⁇ 10 ⁇ 7 to 2.50 ⁇ 10 ⁇ 7 m 2 /s.
  • the thermal diffusivity of the vinyl resin cured material (1) can be measured by temperature wave thermal analysis (TWA).
  • TWA temperature wave thermal analysis
  • the thermal diffusivity is measured using a commercially available thermal diffusivity measuring device, "ai-phase mobile" (manufactured by ai-phase Co., Ltd.).
  • the dielectric loss tangent of the vinyl resin cured product (1) at a frequency of 100 MHz is preferably 0.0050 or less, more preferably 0.0048 or less, and even more preferably 0.0046 or less.
  • the lower limit of the dielectric loss tangent of the vinyl resin cured product (1) is not particularly limited, and the dielectric loss tangent may be 0.0010 or more, 0.0020 or more, or 0.0030 or more.
  • the dielectric loss tangent of the vinyl resin cured material (1) at a frequency of 100 MHz may be, for example, any one of 0.0010 to 0.0050, 0.0020 to 0.0048, and 0.0030 to 0.0046, although these are only examples of the dielectric loss tangent of the vinyl resin cured material (1).
  • the dielectric loss tangent of the vinyl resin cured material (1) at a frequency of 100 MHz can be measured by a capacitance method using an impedance analyzer under the following conditions. Measurement method: Capacitance method Electrode type: 16453A Measurement environment: 23°C, 50% RH Applied voltage: 1V
  • the prepreg of the present embodiment contains a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and a fibrous base material.
  • the prepreg of this embodiment may be referred to as "prepreg (1)".
  • a laminate or the like can be easily manufactured by a normal method.
  • a desired laminate can be obtained by stacking a plurality of prepregs (1) to form a laminate, and molding and integrating the laminate by applying pressure while heating.
  • a printed wiring board (resin layer in a printed wiring board) obtained by using the prepreg (1) or the laminate has high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
  • the prepreg (1) can be produced by a method in which a solution of the vinyl compound (1) dissolved in a solvent is applied to or impregnated into a fibrous substrate; or a method in which the vinyl composition (1) or a dilution of the vinyl composition (1) diluted with a solvent is applied to or impregnated into a fibrous substrate, and the fibrous substrate after the application or impregnation is heated to semi-cure the vinyl compound (1) or the vinyl composition (1).
  • the heating temperature (semi-curing temperature) and heating time (semi-curing time) when semi-curing the vinyl compound (1) or the vinyl composition (1) can be appropriately set in consideration of the above-mentioned curing conditions (heating temperature and heating time) of the vinyl compound (1) or the vinyl composition (1) so that the vinyl compound (1) or the vinyl composition (1) is not completely cured.
  • the fibrous substrate is not particularly limited as long as it is a fibrous substrate, and may be any known substrate. More specific examples of fibrous substrates include woven and nonwoven fabrics of inorganic fibers such as glass fibers, and woven and nonwoven fabrics of organic fibers such as polyester.
  • the resin-attached film of this embodiment comprises a resin layer containing a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and a support film. More specifically, the resin-attached film of this embodiment may be, for example, a resin-attached film comprising the resin layer and the support film provided on one or both sides of the resin layer.
  • a laminate sheet is obtained by using a plurality of resin-attached films of this embodiment, removing the support film, stacking them together to form a laminate, and molding and integrating this laminate by heating and pressing.
  • the resin layer in the resin-attached film of this embodiment and the printed wiring board (resin layer in the printed wiring board) obtained using the resin layer or laminate sheet have high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
  • the support film may be, for example, a polyethylene terephthalate (PET) film.
  • PET polyethylene terephthalate
  • these support films may be the same as or different from each other.
  • at least one of the material and thickness of the two layers of support films is different from each other.
  • the resin-attached film of this embodiment can be produced by applying a solution of vinyl compound (1) dissolved in a solvent to the support film, or by applying vinyl composition (1) or a dilution of vinyl composition (1) diluted with a solvent to the support film, and then heating the layer of the coating to semi-cure the vinyl compound (1) or vinyl composition (1) in the coating.
  • the conditions for semi-cure of vinyl compound (1) or vinyl composition (1) at this time are the same as those for producing the prepreg described above.
  • the resin-attached metal foil of this embodiment comprises a resin layer containing a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and a metal foil. More specifically, the resin-attached metal foil of this embodiment may be, for example, a resin-attached metal foil comprising the resin layer and the metal foil provided on one or both sides of the resin layer. For example, the resin-attached metal foil of this embodiment may be used to further cure the semi-cured product to form a cured product, and the metal foil may be patterned to form a circuit, thereby forming a printed wiring board.
  • the resin-attached metal foil of this embodiment may be used to pattern the metal foil to form a circuit, and resin layers having such circuits may be laminated together with the circuit orientation aligned, and the semi-cured product may be further cured by applying pressure while heating, thereby forming a multilayer printed wiring board having a resin layer containing a cured product of the vinyl compound (1) or a cured product of the vinyl composition (1) as an insulating layer.
  • the resin layer in the resin-coated metal foil of this embodiment and the printed wiring board (resin layer in the printed wiring board) obtained using the resin-coated metal foil have high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
  • the metal foil may be, for example, a copper foil.
  • these metal foils may be the same or different from each other.
  • it means that at least one of the material and the thickness of the two layers of metal foil is different from each other.
  • the resin-coated metal foil of this embodiment can be manufactured in the same manner as the resin-coated film, except that the metal foil is used instead of the support film.
  • the metal-clad laminate of this embodiment comprises an insulating layer containing a cured product of a vinyl compound (1), a cured product of a vinyl composition (1), or a cured product of a prepreg (1), and a metal foil. More specifically, the metal-clad laminate of this embodiment may be, for example, a metal-clad laminate comprising the insulating layer and the metal foil provided on one or both sides of the insulating layer.
  • the metal-clad laminate of this embodiment can be made into a printed wiring board by, for example, patterning the metal foil therein to form a conductor wiring (circuit).
  • a multi-layer printed wiring board can be made by stacking such a plurality of printed wiring boards via a separately prepared insulating layer and applying pressure while heating.
  • the insulating layer in the metal-clad laminate of this embodiment and the printed wiring board obtained using the metal-clad laminate (the insulating layer in the printed wiring board) have high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
  • the metal foil provided in the metal-clad laminate of this embodiment is the same as the metal foil provided in the resin-coated metal foil described above.
  • these metal foils may be the same as each other or different from each other.
  • the insulating layer used separately when laminating the printed wiring board may be a known one, may be the resin layer in the resin-attached film described above, or the laminate sheet which is a laminate of a plurality of the resin layers, or may be the prepreg (1) described above, or the laminate obtained by overlapping a plurality of prepregs (1).
  • the insulating layer may be the resin layer, laminate sheet, prepreg (1), or laminate obtained by further curing the vinyl compound (1) or vinyl composition (1).
  • the metal-clad laminate of the present embodiment can be produced, for example, by laminating a metal foil on one or both sides of a prepreg (1), and applying pressure to the resulting laminate while heating, thereby further curing the vinyl compound (1) or a semi-cured product thereof, or the vinyl composition (1) or a semi-cured product thereof in the prepreg (1) to form a cured product, thereby forming an insulating layer and fusing the prepreg (1) and the metal foil.
  • the metal-clad laminate of the present embodiment may be produced, for example, by producing a prepreg (1) using the vinyl compound (1) or the vinyl composition (1) by the method described above, and then using this prepreg (1) by the method described above.
  • the metal-clad laminate of the present embodiment can also be produced, for example, by heating the above-mentioned resin-attached metal foil to further cure the vinyl compound (1) or a semi-cured product thereof, or the vinyl composition (1) or a semi-cured product thereof in the resin layer, thereby forming an insulating layer containing a cured product of the vinyl compound (1) or a cured product of the vinyl composition (1).
  • the printed wiring board of this embodiment comprises an insulating layer containing a cured product of a vinyl compound (1), a cured product of a vinyl composition (1), or a cured product of a prepreg (1), and a conductor wiring. More specifically, the printed wiring board of this embodiment may be, for example, a printed wiring board comprising the insulating layer and the conductor wiring provided on one or both sides of the insulating layer.
  • a multi-layer printed wiring board can be formed by stacking a plurality of printed wiring boards of this embodiment via a separately prepared insulating layer and applying pressure while heating.
  • the printed wiring board of this embodiment (the insulating layer in the printed wiring board) has high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
  • the material of the conductor wiring is the same as the metal of the metal foil included in the above-mentioned metal-clad laminate.
  • the insulating layer used separately when laminating the printed wiring board of this embodiment is the insulating layer described above. In the case where conductor wiring is provided on both sides of an insulating layer in a printed wiring board, the material and thickness of these conductor wirings may be the same as or different from each other.
  • the printed wiring board of this embodiment can be produced, for example, by patterning the metal foil in the above-mentioned metal-clad laminate to form conductor wiring (circuits).
  • the printed wiring board of the present embodiment can also be produced by, for example, heating the above-mentioned resin-attached metal foil to further cure the vinyl compound (1) or a semi-cured product thereof, or the vinyl composition (1) or a semi-cured product thereof in the resin layer, thereby forming an insulating layer containing a cured product of the vinyl compound (1) or a cured product of the vinyl composition (1), and then patterning the metal foil to form a conductor wiring (circuit).
  • the metal foil can be patterned by known methods such as etching.
  • FIG. 1 is a cross-sectional view showing a schematic example of a laminated structure of the present embodiment obtained using vinyl compound (1). Note that the figures used in the following explanation may show enlarged essential parts for the sake of convenience in order to make the features of the present invention easier to understand, and the dimensional ratios of each component may not necessarily be the same as in reality.
  • the laminated structure 1 shown here is configured to include a first layer 11 and a second layer 12 provided on one surface 11a of the first layer 11.
  • the first layer 11 is a layer obtained using a vinyl compound (1).
  • the second layer 12 is selected according to the type of laminated structure 1. Both the first layer 11 and the second layer 12 are in the form of a film or sheet.
  • the second layer 12 may be provided over the entire area of one surface 11a of the first layer 11, or may be provided in a partial area.
  • the laminate structure 1 is a resin-attached film.
  • the laminate structure 1 is a resin-coated metal foil.
  • the laminate structure 1 is a metal-clad laminate.
  • FIG. 2 is a cross-sectional view showing a schematic diagram of another example of the laminated structure of this embodiment obtained using vinyl compound (1).
  • FIG. 2 and subsequent figures the same components as those shown in the figures already described are given the same reference numerals as in the figures already described, and detailed description thereof will be omitted.
  • the laminated structure 2 shown here is configured to include a first layer 11 and a second layer 22 provided on one surface 11a of the first layer 11.
  • the second layer 22 is linear, and in FIG. 2, the cross section of the laminated structure 2 is formed to include a cross section along the linear length direction of the second layer 22.
  • the number of linear second layers 22 may be one or may be two or more.
  • the laminated structure 2 is the same as the laminated structure 1 shown in FIG. 1, except that the laminated structure 2 includes a linear second layer 22 instead of the film-like second layer 12.
  • the laminate structure 2 is a printed wiring board.
  • Both the laminated structure 1 and the laminated structure 2 shown in Figures 1 and 2 have nothing on the other surface 11b of the first layer 11, but may have a layer similar to the second layer 12 or the second layer 22.
  • FIG. 3 is a cross-sectional view that illustrates still another example of the laminate structure of the present embodiment obtained by using the vinyl compound (1).
  • the laminated structure 3 shown here is configured to include a first layer 11, a second layer 12 provided on one surface 11a of the first layer 11, and a third layer 13 provided on the other surface 11b of the first layer 11.
  • the third layer 13 is in the form of a film or sheet, and is selected according to the type of the laminated structure 1, similar to the second layer 12.
  • the arrangement of the third layer 13 on the other surface 11b of the first layer 11 is similar to the arrangement of the second layer 12 on the one surface 11a of the first layer 11.
  • the composition, shape, thickness, and size of the third layer 13 may be the same as or different from the composition, shape, thickness, and size of the second layer 12.
  • the third layer 13 may be provided over the entire area of the other surface 11b of the first layer 11, or may be provided in a partial area.
  • the laminated structure 3 is a resin-attached film.
  • the laminated structure 3 is a resin-coated metal foil.
  • the laminated structure 3 is a metal-clad laminate.
  • FIG. 4 is a cross-sectional view that illustrates still another example of the laminate structure of the present embodiment obtained by using the vinyl compound (1).
  • the laminated structure 4 shown here is configured to include a first layer 11, a second layer 22 provided on one surface 11a of the first layer 11, and a third layer 23 provided on the other surface 11b of the first layer 11.
  • the third layer 23 is linear, and in FIG. 4, the cross section of the laminated structure 4 is formed to include both a cross section along the linear length direction of the second layer 22 and a cross section along the linear length direction of the third layer 23.
  • the arrangement of the third layer 23 on the other surface 11b of the first layer 11 is similar to the arrangement of the second layer 22 on one surface 11a of the first layer 11.
  • the composition, length, thickness, and number of the third layer 23 may be the same as or different from the composition, length, thickness, and number of the second layer 22.
  • the number of linear third layers 23 may be one or more.
  • the laminate structure 4 is a printed wiring board.
  • room temperature refers to a temperature range of 15 to 40°C.
  • the conditions for measuring the melting point of vinyl compounds are shown below.
  • a glass pan filled with a vinyl compound was kept at 50° C. for 2 minutes using a differential scanning calorimeter (FP84HT manufactured by METTLER TLEDO), and then the temperature was raised by 5° C. per minute, and the pan was kept at 250° C. for 2 minutes, and the endothermic peak temperature was taken as the melting point.
  • the endothermic peak temperature on the lower side was taken as the melting point.
  • the conditions for measuring the solubility of vinyl compounds are shown below. At room temperature, 50 mg of a vinyl compound was placed in a screw tube, THF stored at room temperature was added dropwise, and the weight of the solution was measured when the monomer was completely dissolved. The value of 50 mg/weight (mg) of the solution was taken as the solubility (wt%).
  • the test conditions for the cured product are as follows.
  • (1) Thermal Diffusivity The thermal diffusivity was measured by the TWA method at room temperature using a thermal diffusivity measuring device "ai-phase mobile" (manufactured by ai-phase Corporation).
  • Example 1 Into a 500 mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, 24.0 g of trimethyl 1,3,5-benzenetricarboxylate, 55.3 g of 4-(trans-4-hydroxycyclohexyl)phenol, 1.2 g of dibutyltin oxide, and 120 mL of p-chlorotoluene were added and reacted at an internal temperature of about 180° C. for 15 hours.
  • Example 2 Into a 300 mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, 2.7 g of 1,3,5-benzenetricarbonyl trichloride, 6.6 g of hydroquinone, 3 mL of pyridine, and 130 mL of tetrahydrofuran were added and reacted at room temperature for 3 days.
  • Example 3 Into a 300 mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, 1.8 g of trimethylolethane, 13.7 g of methyl 6-hydroxy-2-naphthoate, 1.1 g of dibutyltin oxide, and 150 mL of p-chlorotoluene were added and reacted at an internal temperature of about 180° C. for 14 hours.
  • Comparative Example 1 In a 200 mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, 6.0 g of 4,4'-dihydroxy-2,2',3,3',5,5'-hexamethylbiphenyl, 0.06 g of 2,6-di(tert-butyl)-p-cresol, 12 g of potassium carbonate, 1.3 g of sodium iodide, 34 mL of N,N-dimethylformamide, and 10 g of 4-vinylbenzyl chloride were charged and reacted for 3 hours at an internal temperature of about 60°C.
  • the vinyl compounds obtained in Examples 1, 2, 3, and Comparative Example 1 were placed in the hollow plate of a mold, and heated for 1 hour at the primary curing temperature shown in Table 1 while applying a pressure of 1.5 MPa under reduced pressure. After that, the compounds were heated for 2 hours at 180°C while applying a pressure of 1.5 MPa to obtain a cured product having a thickness of 150 to 250 ⁇ m.
  • the present invention can be used for printed wiring boards in communication devices, and is particularly suitable for use in printed wiring boards in which the communication devices handle large amounts of data and are expected to generate a large amount of heat.

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Abstract

The present invention addresses the problem of providing a novel compound that can be used as a constituent material for printed wiring boards, has a low melting point and high solubility, and can be cured to provide a resin having high thermal conductivity and low dielectric loss. The present invention pertains to a vinyl compound represented by formula (1) or (2). (R is a (meth)acryloyl group or a vinylbenzyl group; A1 is a chain-like saturated aliphatic hydrocarbon group, or a group containing at least one selected from the group consisting of an aromatic group and a cycloalkane group; A2 is a group containing at least one selected from the group consisting of an aromatic group, a cycloalkane group, and a cycloalkene group; X1 is a single bond, an ester group, a carbonyl group, or an ether group; m is an integer of 3-6; and n is an integer of 1-20.)

Description

ビニル化合物、ビニル組成物、ビニル樹脂硬化物、プリプレグ、樹脂付きフィルム、樹脂付き金属箔、金属張積層板、及びプリント配線板Vinyl compounds, vinyl compositions, vinyl resin cured products, prepregs, resin-coated films, resin-coated metal foils, metal-clad laminates, and printed wiring boards
 本発明は、ビニル化合物、ビニル組成物、ビニル樹脂硬化物、プリプレグ、樹脂付きフィルム、樹脂付き金属箔、金属張積層板、及びプリント配線板に関する。 The present invention relates to vinyl compounds, vinyl compositions, vinyl resin cured products, prepregs, resin-coated films, resin-coated metal foils, metal-clad laminates, and printed wiring boards.
 通信機器が扱うデータの量や通信速度は、年々増加しており、それに伴い、信号の伝送速度を向上させるための高速通信技術が盛んに研究されている。通信機器が扱うデータの量が多い場合には、通信機器中の電子演算部品での発熱量が多くなり、プリント配線板では熱が蓄積されると、不具合が発生してしまう。そこで、プリント配線板には、放熱性が高いことが求められる。 The amount of data handled by communications devices and the communication speeds are increasing year by year, and as a result, there has been active research into high-speed communications technology to improve signal transmission speeds. When communications devices handle a large amount of data, the amount of heat generated by the electronic computing components in the devices increases, and if this heat accumulates in the printed wiring board, it can cause malfunctions. For this reason, printed wiring boards are required to have high heat dissipation properties.
 放熱性が高いプリント配線板としては、例えば、回路を形成している銅(すなわち銅パターン)の厚さを従来よりも厚くすることによって、この銅を介してより多くの熱を放出可能とした、所謂厚銅基板が知られている。しかし、この厚銅基板は、全体が厚くなるため、小型化や軽量化が求められる通信機器には適さないという問題点があった。 A well-known example of a printed wiring board with high heat dissipation properties is the so-called thick copper board, which is made by making the copper (i.e. the copper pattern) that forms the circuit thicker than before, allowing more heat to be dissipated through the copper. However, this thick copper board has the problem that it is not suitable for communication devices, which require compactness and light weight, because it is thick overall.
 放熱性が高いプリント配線板としては、その一方の面に金属板を設けることによって、この金属板を介してより多くの熱を放出可能とした、所謂金属ベース基板も知られている。しかし、この金属ベース基板は、その製造時の工程数が増大するため、通信機器の製造コストが増大してしまうという問題点があった。 A known example of a printed wiring board with high heat dissipation properties is a metal-based board, which has a metal plate on one side that allows it to dissipate more heat through the metal plate. However, this metal-based board requires an increased number of manufacturing steps, which increases the manufacturing costs of the communications device.
 一方、プリント配線板と同様に、樹脂を主要構成材料とし、放熱性が高い部材としては、熱伝導性が高い充填材(フィラー)を含有しているものが知られている。しかし、充填材を含有する材料は、加工性が悪いために、プリント配線板の製造には適さないという問題点があった。 On the other hand, like printed wiring boards, materials that contain resin as the main component and have high heat dissipation properties are known to contain a highly thermally conductive filler. However, materials that contain filler have poor processability, which is an issue in that they are not suitable for manufacturing printed wiring boards.
 これらの問題点を解決できる材料として、熱伝導性が高い樹脂が開示されている(特許文献1)。高速通信機器で用いる電子材料には、放熱性が高いことに加えて、誘電損失が低いことも求められており、特許文献1で開示されている樹脂は、それ自体が熱伝導性を有し、誘電損失も低い。 A resin with high thermal conductivity has been disclosed as a material that can solve these problems (Patent Document 1). Electronic materials used in high-speed communication devices are required to have high heat dissipation properties as well as low dielectric loss, and the resin disclosed in Patent Document 1 itself has thermal conductivity and low dielectric loss.
米国特許出願公開第2019/0194408号明細書US Patent Application Publication No. 2019/0194408
 しかし、特許文献1で開示されている樹脂の熱伝導性は十分であるとはいえず、改善の余地がある。また、プリント配線板等の放熱性部材を製造するにあたっては、樹脂の原料であるモノマー化合物は、良好な加工性を有することが望ましいため、融点が低いこと及び加工用有機溶媒への溶解性が高いことも求められている。 However, the thermal conductivity of the resin disclosed in Patent Document 1 is not sufficient, and there is room for improvement. In addition, when manufacturing heat dissipation components such as printed wiring boards, it is desirable for the monomer compound, which is the raw material for the resin, to have good processability, so it is also required that the resin have a low melting point and high solubility in organic solvents used for processing.
 本発明の課題は、プリント配線板の構成材料として利用でき、低融点及び高溶解性を示す新規化合物を提供することである。
 また、本発明の他の課題は、前記新規化合物を含む組成物であって、熱伝導性の高い硬化物を与え得る組成物を提供することである。
An object of the present invention is to provide a novel compound which can be used as a constituent material for printed wiring boards and which exhibits a low melting point and high solubility.
Another object of the present invention is to provide a composition containing the novel compound, which is capable of giving a cured product having high thermal conductivity.
 本発明は、以下の構成を採用する。
〔1〕 式(1)又は式(2)で表されるビニル化合物。
Figure JPOXMLDOC01-appb-C000002
(式中、
 Rは、アクリロイル基、メタクリロイル基、又はビニルベンジル基であり、複数のRは、互いに同一でも異なっていてもよく、
 Aは、置換若しくは無置換のm価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換のm価のシクロアルカン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結されたm価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結されたm価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結されたm価の基、置換若しくは無置換のm価の鎖状飽和脂肪族炭化水素基、R(OR-*)で表される基、R(R-*)で表される基、RC(OR-*)で表される基、又はRC(R-*)で表される基であり、
 Rは、置換若しくは無置換の3価の芳香族基(ただし、含窒素芳香族複素環基を除く。)であり、
 Rは、置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基、**-R(R-*で表される基、又は**-(RO)-*で表される基であり、複数のRは、互いに同一でも異なっていてもよく、
 Rは、水素原子又はメチル基であり、
 Rは、置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基であり、複数のRは、互いに同一でも異なっていてもよく、
 Rは、置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)であり、pが2又は3である場合、複数のRは、互いに同一でも異なっていてもよく、
 Rは、置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基であり、複数のRは、互いに同一でも異なっていてもよく、
 pは、1~3の整数であり、
 qは、1~3の整数であり、
 *は、Xとの結合位置であり、
 **は、Rに結合している酸素原子との結合位置、Rとの結合位置、RCに結合している酸素原子との結合位置、又はRCとの結合位置である。
 Aは、置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換の2価のシクロアルカン基、置換若しくは無置換の2価のシクロアルケン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、*-B-**で表される基、*-B-**で表される基、又*-B-**で表される基であり、複数のAは、互いに同一でも異なっていてもよく、
 B~Bは、それぞれ、置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換の2価のシクロアルカン基、置換若しくは無置換の2価のシクロアルケン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、又は1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基であり、
 Y~Yは、それぞれ、エステル基、カルボニル基、又はエーテル基であり、
 *は、Xとの結合位置であり、
 **は、式(1)中のアクリロイルオキシ基、メタクリロイルオキシ基、若しくはビニルベンジルオキシ基との結合位置、又は式(2)中のアクリロイルオキシアルコキシ基、メタクリロイルオキシアルコキシ基、若しくはビニルベンジルオキシアルコキシ基との結合位置であり、
 Xは、単結合、エステル基、カルボニル基、又はエーテル基であり、複数のXは、互いに同一でも異なっていてもよく、
 mは、3~6の整数であり、
 nは、1~20の整数であり、複数のnは、互いに同一でも異なっていてもよい。)
〔2〕 A及びAは、炭素数が14以下の基である(ただし、前記炭素数は、置換基の炭素数を含まない。)、〔1〕に記載のビニル化合物。
〔3〕 プリント配線板に用いられる、〔1〕又は〔2〕に記載のビニル化合物。
〔4〕 〔1〕~〔3〕のいずれかに記載のビニル化合物を含有する、ビニル組成物。
〔5〕 〔1〕~〔3〕のいずれかに記載のビニル化合物、又は〔4〕に記載のビニル組成物を硬化してなる、ビニル樹脂硬化物。
〔6〕 〔1〕~〔3〕のいずれかに記載のビニル化合物若しくはその半硬化物、又は〔4〕に記載のビニル組成物若しくはその半硬化物と、繊維質基材とを含む、プリプレグ。
〔7〕 〔1〕~〔3〕のいずれかに記載のビニル化合物若しくはその半硬化物、又は〔4〕に記載のビニル組成物若しくはその半硬化物を含む樹脂層と、支持フィルムとを備える、樹脂付きフィルム。
〔8〕 〔1〕~〔3〕のいずれかに記載のビニル化合物若しくはその半硬化物、又は〔4〕に記載のビニル組成物若しくはその半硬化物を含む樹脂層と、金属箔とを備える、樹脂付き金属箔。
〔9〕 〔1〕~〔3〕のいずれかに記載のビニル化合物の硬化物、又は〔4〕に記載のビニル組成物の硬化物を含む絶縁層と、金属箔とを備える、金属張積層板。
〔10〕 〔6〕に記載のプリプレグの硬化物を含む絶縁層と、金属箔とを備える、金属張積層板。
〔11〕 〔1〕~〔3〕のいずれかに記載のビニル化合物の硬化物、又は〔4〕に記載のビニル組成物の硬化物を含む絶縁層と、導体配線とを備える、プリント配線板。
〔12〕 〔6〕に記載のプリプレグの硬化物を含む絶縁層と、導体配線とを備える、プリント配線板。
The present invention employs the following configuration.
[1] A vinyl compound represented by formula (1) or formula (2):
Figure JPOXMLDOC01-appb-C000002
(Wherein,
R is an acryloyl group, a methacryloyl group, or a vinylbenzyl group, and a plurality of R may be the same or different from each other;
A 1 is a substituted or unsubstituted m-valent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted m-valent cycloalkane group, an m-valent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocyclic rings) are linked by a single bond, an m-valent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, an m-valent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group, a group represented by R 1 (OR 2 -*) 3 , a group represented by R 1 (R 2 -*) 3 , a group represented by R 3 C(OR 2 -*) 3 , or a group represented by R 3 C(R 2 -*) 3 ;
R 1 is a substituted or unsubstituted trivalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups);
R 2 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group, a group represented by **-R 4 (R 5 ) p R 4 -*, or a group represented by **-(R 6 O) q R 6 -*, and multiple R 2 may be the same or different from each other;
R3 is a hydrogen atom or a methyl group;
R4 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group, and multiple R4s may be the same or different from each other.
R5 is a substituted or unsubstituted divalent aromatic group (excluding a nitrogen-containing aromatic heterocyclic group), and when p is 2 or 3, multiple R5s may be the same or different from each other;
R 6 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group, and multiple R 6s may be the same or different from each other;
p is an integer from 1 to 3;
q is an integer from 1 to 3;
* is the bonding position to X1 ,
** represents the bonding position to the oxygen atom bonded to R 1 , the bonding position to R 1 , the bonding position to the oxygen atom bonded to R 3 C, or the bonding position to R 3 C.
A2 represents a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles), one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a group represented by *-B 1 Y 1 B 2 -**, a group represented by *-B 1 Y 1 B 2 Y 2 B 3 -**, or a group represented by *-B 1 Y 1 B 2 Y 2 B 3 Y 3 B 4 -**,
B 1 to B 4 each represent a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, one or more substituted or unsubstituted aromatic rings and one or more a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, or a divalent group in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond,
Y 1 to Y 3 each represent an ester group, a carbonyl group, or an ether group;
* is the bonding position to X1 ,
** represents the bonding position to the acryloyloxy group, methacryloyloxy group, or vinylbenzyloxy group in formula (1), or the bonding position to the acryloyloxyalkoxy group, methacryloyloxyalkoxy group, or vinylbenzyloxyalkoxy group in formula (2),
X 1 is a single bond, an ester group, a carbonyl group, or an ether group, and a plurality of X 1 may be the same or different from each other;
m is an integer from 3 to 6,
n is an integer from 1 to 20, and multiple n's may be the same or different.
[2] A 1 and A 2 are groups having 14 or less carbon atoms (however, the number of carbon atoms does not include the number of carbon atoms of a substituent), The vinyl compound according to [1].
[3] The vinyl compound according to [1] or [2], which is used for a printed wiring board.
[4] A vinyl composition comprising the vinyl compound according to any one of [1] to [3].
[5] A vinyl resin cured product obtained by curing the vinyl compound according to any one of [1] to [3] or the vinyl composition according to [4].
[6] A prepreg comprising the vinyl compound or semi-cured product thereof according to any one of [1] to [3], or the vinyl composition or semi-cured product thereof according to [4], and a fibrous base material.
[7] A resin-attached film comprising a resin layer containing the vinyl compound or semi-cured product thereof according to any one of [1] to [3], or the vinyl composition or semi-cured product thereof according to [4], and a support film.
[8] A resin-coated metal foil comprising a resin layer containing the vinyl compound or semi-cured product thereof according to any one of [1] to [3], or the vinyl composition or semi-cured product thereof according to [4], and a metal foil.
[9] A metal-clad laminate comprising an insulating layer containing a cured product of the vinyl compound according to any one of [1] to [3] or a cured product of the vinyl composition according to [4], and a metal foil.
[10] A metal-clad laminate comprising an insulating layer containing a cured product of the prepreg according to [6] and a metal foil.
[11] A printed wiring board comprising an insulating layer containing a cured product of the vinyl compound according to any one of [1] to [3] or a cured product of the vinyl composition according to [4], and a conductor wiring.
[12] A printed wiring board comprising an insulating layer containing a cured product of the prepreg according to [6] and a conductor wiring.
 本発明によれば、プリント配線板の構成材料として利用でき、低融点及び高溶解性を示す新規化合物を提供することができる。
 また、前記新規化合物を含む組成物であって、熱伝導性の高い硬化物を与え得る組成物を提供することができる。
According to the present invention, it is possible to provide a novel compound which can be used as a constituent material for printed wiring boards and which exhibits a low melting point and high solubility.
It is also possible to provide a composition that contains the novel compound and that can give a cured product with high thermal conductivity.
本発明の一実施形態に係るビニル化合物を用いて得られた積層構造体の一例を模式的に示す断面図である。FIG. 1 is a cross-sectional view showing a schematic example of a laminate structure obtained by using a vinyl compound according to one embodiment of the present invention. 本発明の一実施形態に係るビニル化合物を用いて得られた積層構造体の他の例を模式的に示す断面図である。FIG. 2 is a cross-sectional view showing a schematic diagram of another example of a laminate structure obtained by using a vinyl compound according to one embodiment of the present invention. 本発明の一実施形態に係るビニル化合物を用いて得られた積層構造体のさらに他の例を模式的に示す断面図である。FIG. 2 is a cross-sectional view showing a schematic diagram of still another example of a laminate structure obtained by using a vinyl compound according to one embodiment of the present invention. 本発明の一実施形態に係るビニル化合物を用いて得られた積層構造体のさらに他の例を模式的に示す断面図である。FIG. 2 is a cross-sectional view showing a schematic diagram of still another example of a laminate structure obtained by using a vinyl compound according to one embodiment of the present invention.
 以下、本発明の好適な実施形態について詳細に説明する。 The following describes in detail a preferred embodiment of the present invention.
<<ビニル化合物>>
 本実施形態のビニル化合物は、式(1)又は式(2)で表される。
<<Vinyl compounds>>
The vinyl compound of the present embodiment is represented by formula (1) or formula (2).
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 式(1)及び式(2)中、Rは、アクリロイル基、メタクリロイル基、又はビニルベンジル基であり、複数のRは、互いに同一でも異なっていてもよい。 In formula (1) and formula (2), R is an acryloyl group, a methacryloyl group, or a vinylbenzyl group, and multiple Rs may be the same or different.
 式(1)及び式(2)中、m個のRのうち、1個以上はビニルベンジル基であることが好ましく、m-1個がビニルベンジル基であることがより好ましく、m個全てがビニルベンジル基であることがさらに好ましい。 In formula (1) and formula (2), of the m R's, it is preferable that at least one is a vinylbenzyl group, more preferably m-1 is a vinylbenzyl group, and even more preferably all m are vinylbenzyl groups.
 Rで表されるビニルベンジル基は、o-ビニルベンジル基、m-ビニルベンジル基、又はp-メチルベンジル基であり、好ましくはm-ビニルベンジル基又はp-メチルベンジルであり、ビニル化合物の低融点化の観点から、より好ましくはm-ビニルベンジル基である。なお、式(1)又は式(2)中にm個あるビニルベンジル基のビニル基の位置は、互いに同一でも異なっていてもよい。 The vinylbenzyl group represented by R is an o-vinylbenzyl group, an m-vinylbenzyl group, or a p-methylbenzyl group, preferably an m-vinylbenzyl group or a p-methylbenzyl group, and more preferably an m-vinylbenzyl group from the viewpoint of lowering the melting point of the vinyl compound. Note that the positions of the vinyl groups of the m vinylbenzyl groups in formula (1) or formula (2) may be the same or different.
 式(1)及び式(2)中、Aは、置換若しくは無置換のm価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換のm価のシクロアルカン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結されたm価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結されたm価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結されたm価の基、置換若しくは無置換のm価の鎖状飽和脂肪族炭化水素基、R(OR-*)で表される基、R(R-*)で表される基、RC(OR-*)で表される基、又はRC(R-*)で表される基である。 In formula (1) and formula (2), A 1 is a substituted or unsubstituted m-valent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted m-valent cycloalkane group, an m-valent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocyclic rings) are linked by single bonds, an m-valent group in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds, an m-valent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by single bonds, a substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group, a group represented by R 1 (OR 2 -*) 3 , a group represented by R 1 (R 2 -*) 3 , a group represented by R 3 C(OR 2 -*) 3 , or a group represented by R 3 C(R 2 -*) 3 .
 Aで表される置換若しくは無置換のm価の芳香族基は、置換若しくは無置換の芳香族環の任意の位置からm個の水素原子を除いた基である。 The substituted or unsubstituted m-valent aromatic group represented by A 1 is a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted aromatic ring.
 本明細書において、芳香族環は、単環であってもよく、縮合環であってもよく、複素環であってもよい。芳香族環が複素環である場合、複素環に含まれるヘテロ原子としては、窒素原子以外のヘテロ原子、例えば、酸素原子及び硫黄原子等が挙げられる。誘電損失の抑制又は誘電正接の低減の観点から、芳香族環はヘテロ原子を含まないことが好ましい。 In this specification, the aromatic ring may be a monocyclic ring, a condensed ring, or a heterocyclic ring. When the aromatic ring is a heterocyclic ring, the heteroatom contained in the heterocyclic ring may be a heteroatom other than a nitrogen atom, such as an oxygen atom or a sulfur atom. From the viewpoint of suppressing dielectric loss or reducing the dielectric tangent, it is preferable that the aromatic ring does not contain a heteroatom.
 Aで表される置換若しくは無置換のm価の芳香族基は、置換若しくは無置換の単環式又は縮合環式の芳香族環の任意の位置からm個の水素原子を除いた基であることが好ましく、置換若しくは無置換の単環式芳香族環の任意の位置からm個の水素原子を除いた基であることがより好ましい。 The substituted or unsubstituted m-valent aromatic group represented by A1 is preferably a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted monocyclic or fused ring aromatic ring, and more preferably a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted monocyclic aromatic ring.
 Aで表される無置換のm価の芳香族基の炭素数は、特に限定されないが、好ましくは3~20、より好ましくは6~16、さらに好ましくは6~14である。無置換の芳香族環の炭素数は、無置換のm価の芳香族基の炭素数と同義であり、その好ましい態様も同様である。 The number of carbon atoms in the unsubstituted m-valent aromatic group represented by A1 is not particularly limited, but is preferably 3 to 20, more preferably 6 to 16, and further preferably 6 to 14. The number of carbon atoms in the unsubstituted aromatic ring is synonymous with the number of carbon atoms in the unsubstituted m-valent aromatic group, and the preferred embodiments thereof are also the same.
 無置換の芳香族環の具体例としては、ベンゼン、ナフタレン、アントラセン、フェナントレン、ピレン、トリフェニレン、ペリレン、フラン、ベンゾフラン、ジベンゾフラン、チオフェン、ベンゾチオフェン、及びジベンゾチオフェン等が挙げられ、好ましくはベンゼンである。 Specific examples of unsubstituted aromatic rings include benzene, naphthalene, anthracene, phenanthrene, pyrene, triphenylene, perylene, furan, benzofuran, dibenzofuran, thiophene, benzothiophene, and dibenzothiophene, with benzene being preferred.
 Aで表されるm価の芳香族基が置換基を有する場合、すなわち、芳香族環が置換基を有する場合、その置換基は、好ましくはヒドロキシ基以外の置換基であって、例えば炭素数1~20のアルキル基及び炭素数1~20のアルコキシ基からなる群から選択される1種以上の基である。 When the m-valent aromatic group represented by A1 has a substituent, that is, when the aromatic ring has a substituent, the substituent is preferably a substituent other than a hydroxy group, and is, for example, one or more groups selected from the group consisting of an alkyl group having 1 to 20 carbon atoms and an alkoxy group having 1 to 20 carbon atoms.
 炭素数1~20のアルキル基としては、公知のアルキル基であってもよい。炭素数1~20のアルキル基の具体例としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基、イソブチル基、n-ペンチル基、ネオペンチル基、n-ヘキシル基、n-オクチル基、2-エチルヘキシル基、n-ノニル基、n-デシル基、n-ドデシル基、n-テトラデシル基、n-ヘキサデシル基、n-オクタデシル基、及びn-イコシル基等が挙げられる。アルキル基の炭素数は、好ましくは1~8であり、より好ましくは1~4である。これらの好ましいアルキル基の具体例は、上記に記載の具体例のうち対応する炭素数を有するアルキル基と同様である。 The alkyl group having 1 to 20 carbon atoms may be a known alkyl group. Specific examples of alkyl groups having 1 to 20 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, isobutyl, n-pentyl, neopentyl, n-hexyl, n-octyl, 2-ethylhexyl, n-nonyl, n-decyl, n-dodecyl, n-tetradecyl, n-hexadecyl, n-octadecyl, and n-icosyl. The number of carbon atoms in the alkyl group is preferably 1 to 8, and more preferably 1 to 4. Specific examples of these preferred alkyl groups are the same as the alkyl groups having the corresponding carbon numbers among the specific examples described above.
 炭素数1~20のアルコキシ基としては、公知のアルコキシ基であってもよい。炭素数1~20のアルコキシ基の具体例としては、メトキシ基、エトキシ基、n-プロピルオキシ基、イソプロピルオキシ基、n-ブトキシ基、sec-ブトキシ基、tert-ブトキシ基、イソブチルオキシ基、n-ペンチルオキシ基、ネオペンチルオキシ基、n-ヘキシルオキシ基、n-オクチルオキシ基、2-エチルヘキシルオキシ基、n-ノニルオキシ基、n-デシルオキシ基、n-ドデシルオキシ基、n-テトラデシルオキシ基、n-ヘキサデシルオキシ基、n-オクタデシルオキシ基、及びn-イコシルオキシ基等が挙げられる。アルコキシ基の炭素数は、好ましくは1~8であり、より好ましくは1~4である。これらの好ましいアルキル基の具体例は、上記に記載の具体例のうち対応する炭素数を有するアルキル基と同様である。 The alkoxy group having 1 to 20 carbon atoms may be a known alkoxy group. Specific examples of alkoxy groups having 1 to 20 carbon atoms include methoxy, ethoxy, n-propyloxy, isopropyloxy, n-butoxy, sec-butoxy, tert-butoxy, isobutyloxy, n-pentyloxy, neopentyloxy, n-hexyloxy, n-octyloxy, 2-ethylhexyloxy, n-nonyloxy, n-decyloxy, n-dodecyloxy, n-tetradecyloxy, n-hexadecyloxy, n-octadecyloxy, and n-icosyloxy. The number of carbon atoms in the alkoxy group is preferably 1 to 8, and more preferably 1 to 4. Specific examples of these preferred alkyl groups are the same as the alkyl groups having the corresponding carbon numbers among the specific examples described above.
 Aで表される無置換のm価の芳香族基の好適な具体例としては、下記基が挙げられる(*は、Xとの結合位置である。)。 Specific preferred examples of the unsubstituted m-valent aromatic group represented by A1 include the following groups (* indicates the bonding position to X1 ).
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
 Aで表される置換若しくは無置換のm価のシクロアルカン基は、置換若しくは無置換のシクロアルカン環の任意の位置からm個の水素原子を除いた基である。 The substituted or unsubstituted m-valent cycloalkane group represented by A 1 is a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted cycloalkane ring.
 本明細書において、シクロアルカン環は、単環であってもよく、縮合環であってもよく、複素環であってもよい。シクロアルカン環が複素環である場合、複素環に含まれるヘテロ原子としては、例えば、酸素原子、窒素原子、及び硫黄原子等が挙げられる。誘電損失の抑制又は誘電正接の低減の観点から、シクロアルカン環はヘテロ原子を含まないことが好ましい。シクロアルカン環は、単環又は縮合環であることが好ましく、単環であることがより好ましい。
 また、本明細書において、シクロアルカン基及びシクロアルカン環は、シス体であってもよく、トランス体であってもよく、これらの混合物であってもよいが、混合物の場合はトランス体の割合が高いことが好ましい。
In this specification, the cycloalkane ring may be a monocyclic ring, a condensed ring, or a heterocyclic ring. When the cycloalkane ring is a heterocyclic ring, examples of the heteroatom contained in the heterocyclic ring include an oxygen atom, a nitrogen atom, and a sulfur atom. From the viewpoint of suppressing dielectric loss or reducing dielectric tangent, it is preferable that the cycloalkane ring does not contain a heteroatom. The cycloalkane ring is preferably a monocyclic ring or a condensed ring, and more preferably a monocyclic ring.
In addition, in this specification, the cycloalkane group and the cycloalkane ring may be in a cis form, a trans form, or a mixture thereof, and in the case of a mixture, it is preferable that the proportion of the trans form is higher.
 無置換のm価のシクロアルカン基の炭素数は、特に限定されないが、好ましくは3~20、より好ましくは6~16、さらに好ましくは6~14である。無置換のシクロアルカン環の炭素数は、無置換のm価のシクロアルカン基の炭素数と同義であり、その好ましい態様も同様である。 The number of carbon atoms in the unsubstituted m-valent cycloalkane group is not particularly limited, but is preferably 3 to 20, more preferably 6 to 16, and even more preferably 6 to 14. The number of carbon atoms in the unsubstituted cycloalkane ring is synonymous with the number of carbon atoms in the unsubstituted m-valent cycloalkane group, and the preferred embodiments are the same.
 無置換のシクロアルカン環の具体例としては、シクロプロパン、シクロブタン、シクロペンタン、シクロヘキサン、シクロへプタン、シクロオクタン、シクロノナン、シクロデカン、シクロウンデカン、シクロドデカン、シクロトリデカン、シクロテトラデカン、シクロペンタデカン、シクロヘキサデカン、シクロヘプタデカン、シクロオクタデカン、シクロノナデカン、シクロイコサン、デカリン、アダマンタン、オキセタン、テトラヒドロフラン、テトラヒドロピラン、1,4-ジオキサン、1,3-ジオキサン、アジリジン、ピロリジン、ピぺリジン、ピペラジン、モルホリン、テトラヒドロチオフェン、及びチアン等が挙げられる。 Specific examples of unsubstituted cycloalkane rings include cyclopropane, cyclobutane, cyclopentane, cyclohexane, cycloheptane, cyclooctane, cyclononane, cyclodecane, cycloundecane, cyclododecane, cyclotridecane, cyclotetradecane, cyclopentadecane, cyclohexadecane, cycloheptadecane, cyclooctadecane, cyclononadecane, cycloicosane, decalin, adamantane, oxetane, tetrahydrofuran, tetrahydropyran, 1,4-dioxane, 1,3-dioxane, aziridine, pyrrolidine, piperidine, piperazine, morpholine, tetrahydrothiophene, and thiane.
 Aで表されるm価のシクロアルカン基が置換基を有する場合、すなわち、シクロアルカン環が置換基を有する場合、その置換基は、Aで表されるm価の芳香族基が有していてもよい置換基と同義である。 When the m-valent cycloalkane group represented by A1 has a substituent, that is, when the cycloalkane ring has a substituent, the substituent has the same meaning as the substituent that the m-valent aromatic group represented by A1 may have.
 Aで表される置換若しくは無置換のm価のシクロアルカン基の好適な具体例としては、下記基が挙げられる(*は、Xとの結合位置である。)。 Preferred specific examples of the substituted or unsubstituted m-valent cycloalkane group represented by A 1 include the following groups (* indicates the bonding position to X 1 ).
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 Aで表される2以上の置換若しくは無置換の芳香族環が単結合で連結されたm価の基は、2以上の置換若しくは無置換の芳香族環が単結合で連結した化合物の任意の位置からm個の水素原子を除いた基である。単結合で連結される置換若しくは無置換の芳香族環は、置換若しくは無置換のm価の芳香族基の説明において言及した置換若しくは無置換の芳香族環(すなわち、置換若しくは無置換のm価の芳香族基の結合手に水素原子を結合してなる置換若しくは無置換の芳香族環。)と同義であり、その好ましい態様も同様である。 The m-valent group represented by A1 in which two or more substituted or unsubstituted aromatic rings are linked by single bonds is a group obtained by removing m hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted aromatic rings are linked by single bonds. The substituted or unsubstituted aromatic ring linked by a single bond is the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group (i.e., a substituted or unsubstituted aromatic ring formed by binding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), and the preferred embodiments thereof are also the same.
 2以上の置換若しくは無置換の芳香族環が単結合で連結した化合物において、単結合で連結される置換若しくは無置換の芳香族環の数は、2以上であれば特に限定されないが、好ましくは2~10、より好ましくは2~4、さらに好ましくは2である。 In a compound in which two or more substituted or unsubstituted aromatic rings are linked by single bonds, the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
 2以上の無置換の芳香族環が単結合で連結した化合物の具体例としては、ビフェニル、o-ターフェニル、m-ターフェニル、p-ターフェニル、m-クオーターフェニル、及びp-クオーターフェニル等が挙げられる。 Specific examples of compounds in which two or more unsubstituted aromatic rings are linked by a single bond include biphenyl, o-terphenyl, m-terphenyl, p-terphenyl, m-quarterphenyl, and p-quarterphenyl.
 Aで表される2以上の置換若しくは無置換のシクロアルカン環が単結合で連結されたm価の基は、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結した化合物の任意の位置からm個の水素原子を除いた基である。単結合で連結される置換若しくは無置換のシクロアルカン環は、置換若しくは無置換のm価のシクロアルカン基の説明において言及した置換若しくは無置換のシクロアルカン環(すなわち、置換若しくは無置換のm価のシクロアルカン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルカン環。)と同義であり、その好ましい態様も同様である。 The m-valent group represented by A1 in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds is a group obtained by removing m hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds. The substituted or unsubstituted cycloalkane ring linked by a single bond has the same meaning as the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group (i.e., a substituted or unsubstituted cycloalkane ring formed by binding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group), and the preferred embodiments thereof are also the same.
 2以上の置換若しくは無置換のシクロアルカン環が単結合で連結した化合物において、単結合で連結される置換若しくは無置換のシクロアルカン環の数は、2以上であれば特に限定されないが、好ましくは2~10、より好ましくは2~4、さらに好ましくは2である。 In a compound in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds, the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
 2以上の無置換のシクロアルカン環が単結合で連結した化合物の具体例としては、シクロプロピルシクロヘキサン、ビシクロヘキシル、1,3-ジシクロヘキシルシクロヘキサン、1,4-ジシクロヘキシルシクロヘキサン、1-シクロヘキシルピロリジン、及び4-シクロヘキシルモルホリン等が挙げられる。 Specific examples of compounds in which two or more unsubstituted cycloalkane rings are linked by single bonds include cyclopropylcyclohexane, bicyclohexyl, 1,3-dicyclohexylcyclohexane, 1,4-dicyclohexylcyclohexane, 1-cyclohexylpyrrolidine, and 4-cyclohexylmorpholine.
 Aで表される1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結されたm価の基は、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結した化合物の任意の位置からm個の水素原子を除いた基である。単結合で連結される置換若しくは無置換の芳香族環及び置換若しくは無置換のシクロアルカン環は、それぞれ、置換若しくは無置換のm価の芳香族基の説明において言及した置換若しくは無置換の芳香族環(すなわち、置換若しくは無置換のm価の芳香族基の結合手に水素原子を結合してなる置換若しくは無置換の芳香族環。)及び置換若しくは無置換のm価のシクロアルカン基の説明において言及した置換若しくは無置換のシクロアルカン環(すなわち、置換若しくは無置換のm価のシクロアルカン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルカン環。)と同義であり、その好ましい態様も同様である。 The m-valent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, represented by A 1 , is a group obtained by removing m hydrogen atoms from any position of a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond. The substituted or unsubstituted aromatic ring and the substituted or unsubstituted cycloalkane ring linked by a single bond are respectively the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group) and the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group), and the preferred embodiments thereof are also the same.
 1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結した化合物において、単結合で連結される置換若しくは無置換の芳香族環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1であり、単結合で連結される置換若しくは無置換のシクロアルカン環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1である。また、単結合で連結される置換若しくは無置換の芳香族環の数と置換若しくは無置換のシクロアルカン環の数との合計は、好ましくは2~10、より好ましくは2~4、さらに好ましくは2である。 In a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by single bonds, the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1. In addition, the total number of substituted or unsubstituted aromatic rings linked by single bonds and the number of substituted or unsubstituted cycloalkane rings is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
 1以上の無置換の芳香族環と1以上の無置換のシクロアルカン環が単結合で連結した化合物の具体例としては、シクロプロピルベンゼン、シクロペンチルベンゼン、シクロヘキシルベンゼン、1-シクロヘキシルナフタレン、2-シクロヘキシルナフタレン、2-フェニルテトラヒドロフラン、1-フェニルアダマンタン、1,3-ジフェニルアダマンタン、1,3,5,7-テトラフェニルアダマンタン、2-シクロヘキシルフラン、4-フェニルピぺリジン、2-シクロヘキシルチオフェン、及び4-フェニルモルホリン等が挙げられる。 Specific examples of compounds in which one or more unsubstituted aromatic rings and one or more unsubstituted cycloalkane rings are linked by a single bond include cyclopropylbenzene, cyclopentylbenzene, cyclohexylbenzene, 1-cyclohexylnaphthalene, 2-cyclohexylnaphthalene, 2-phenyltetrahydrofuran, 1-phenyladamantane, 1,3-diphenyladamantane, 1,3,5,7-tetraphenyladamantane, 2-cyclohexylfuran, 4-phenylpiperidine, 2-cyclohexylthiophene, and 4-phenylmorpholine.
 Aで表される置換若しくは無置換のm価の鎖状飽和脂肪族炭化水素基は、置換若しくは無置換の鎖状飽和脂肪族炭化水素の任意の位置からm個の水素原子を除いた基であり、置換若しくは無置換の鎖状飽和脂肪族炭化水素のm個の異なる炭素原子のそれぞれから当該炭素原子に結合した水素原子を1個ずつ除いた基であることが好ましい。 The substituted or unsubstituted, m-valent, linear saturated aliphatic hydrocarbon group represented by A1 is a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted linear saturated aliphatic hydrocarbon, and is preferably a group in which one hydrogen atom bonded to m different carbon atoms of a substituted or unsubstituted linear saturated aliphatic hydrocarbon has been removed from each of the carbon atoms.
 本明細書において、鎖状飽和脂肪族炭化水素は、直鎖状飽和脂肪族炭化水素であってもよく、分岐状飽和脂肪族炭化水素であってもよい。 In this specification, the chain-like saturated aliphatic hydrocarbon may be a straight-chain saturated aliphatic hydrocarbon or a branched saturated aliphatic hydrocarbon.
 Aで表される置換若しくは無置換のm価の鎖状飽和脂肪族炭化水素基は、置換若しくは無置換の分岐状脂肪族炭化水素の任意の位置からm個の水素原子を除いた基であることが好ましい。 The substituted or unsubstituted m-valent chain saturated aliphatic hydrocarbon group represented by A 1 is preferably a group in which m hydrogen atoms have been removed from any position of a substituted or unsubstituted branched aliphatic hydrocarbon.
 Aで表される無置換のm価の鎖状飽和脂肪族炭化水素基の炭素数は、特に限定されないが、好ましくは1~10、より好ましくは3~9、さらに好ましくは5~8である。 The number of carbon atoms in the unsubstituted m-valent chain saturated aliphatic hydrocarbon group represented by A1 is not particularly limited, but is preferably 1 to 10, more preferably 3 to 9, and even more preferably 5 to 8.
 Aで表される無置換の鎖状飽和脂肪族炭化水素の具体例としては、n-プロパン、n-ブタン、2-メチルプロパン、n-ペンタン、2-メチルブタン、2,2-ジメチルプロパン、n-ヘキサン、2-メチルペンタン、3-メチルペンタン、2,2-ジメチルブタン、及び2,2,4,4-テトラメチルペンタン等が挙げられ、好ましくは2,2-ジメチルプロパンである。 Specific examples of the unsubstituted linear saturated aliphatic hydrocarbon represented by A1 include n-propane, n-butane, 2-methylpropane, n-pentane, 2-methylbutane, 2,2-dimethylpropane, n-hexane, 2-methylpentane, 3-methylpentane, 2,2-dimethylbutane, and 2,2,4,4-tetramethylpentane, and preferably 2,2-dimethylpropane.
 Aで表されるm価の鎖状飽和脂肪族炭化水素基が置換基を有する場合、すなわち、鎖状飽和脂肪族炭化水素が置換基を有する場合、その置換基は、Aで表されるm価の芳香族基が有していてもよい置換基と同義である。 When the m-valent linear saturated aliphatic hydrocarbon group represented by A1 has a substituent, that is, when the linear saturated aliphatic hydrocarbon has a substituent, the substituent has the same meaning as the substituent that the m-valent aromatic group represented by A1 may have.
 Aで表される置換若しくは無置換のm価の鎖状飽和脂肪族炭化水素基の好適な具体例としては、下記基が挙げられる(*は、Xとの結合位置である。)。 Preferred specific examples of the substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group represented by A 1 include the following groups (* indicates the bonding position to X 1 ).
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 AがR(OR-*)で表される基又はR(R-*)で表される基である場合、Rは、置換若しくは無置換の3価の芳香族基(ただし、含窒素芳香族複素環基を除く。)であり;Rは、置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基、**-R(R-*で表される基、又は**-(RO)-*で表される基であり;Rは、置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基であり;Rは、置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)であり;Rは、置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基であり;pは、1~3の整数であり;qは、1~3の整数である。複数のRは、互いに同一でも異なっていてもよい。複数のRは、互いに同一でも異なっていてもよい。pが2又は3である場合、複数のRは、互いに同一でも異なっていてもよい。複数のRは、互いに同一でも異なっていてもよい。また、Rで表される基において、*は、Xとの結合位置であり;**は、AがR(OR-*)で表される基である場合にはRに結合している酸素原子との結合位置であり、AがR(R-*)で表される基である場合にはRとの結合位置である。 When A 1 is a group represented by R 1 (OR 2 -*) 3 or a group represented by R 1 (R 2 -*) 3 , R 1 is a substituted or unsubstituted trivalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups); R 2 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group, a group represented by **-R 4 (R 5 ) p R 4 -*, or a group represented by **-(R 6 O) q R 6 -*; R 4 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group; R 5 is a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups); R 6 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group; p is an integer from 1 to 3; and q is an integer from 1 to 3. Multiple R 2s may be the same or different from each other. Multiple R 4 may be the same or different from each other. When p is 2 or 3, multiple R 5 may be the same or different from each other. Multiple R 6 may be the same or different from each other. In addition, in the group represented by R 2 , * is the bonding position to X 1 ; ** is the bonding position to the oxygen atom bonded to R 1 when A 1 is a group represented by R 1 (OR 2 -*) 3 , and is the bonding position to R 1 when A 1 is a group represented by R 1 (R 2 -*) 3 .
 Rで表される置換若しくは無置換の3価の芳香族基は、置換若しくは無置換の芳香族環の任意の位置から3個の水素原子を除いた基である。この置換若しくは無置換の芳香族環は、Aで表される置換若しくは無置換のm価の芳香族基の説明において言及した置換若しくは無置換の芳香族環(すなわち、置換若しくは無置換のm価の芳香族基の結合手に水素原子を結合してなる置換若しくは無置換の芳香族環。)と同義であり、その好ましい態様も同様である。 The substituted or unsubstituted trivalent aromatic group represented by R 1 is a group obtained by removing three hydrogen atoms from any position of a substituted or unsubstituted aromatic ring. This substituted or unsubstituted aromatic ring is the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A 1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), and the preferred embodiments thereof are also the same.
 Rで表される置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基は、置換若しくは無置換の鎖状飽和脂肪族炭化水素の任意の位置から2個の水素原子を除いた基である。この置換若しくは無置換の鎖状飽和脂肪族炭化水素は、Aで表される置換若しくは無置換のm価の鎖状飽和脂肪族炭化水素基の説明において言及した置換若しくは無置換の鎖状飽和脂肪族炭化水素(すなわち、置換若しくは無置換のm価の鎖状飽和脂肪族炭化水素基の結合手に水素原子を結合してなる置換若しくは無置換の鎖状飽和脂肪族炭化水素)と同義であるが、Rで表される置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基の好ましい態様及び具体例は以下の通りである。 The substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group represented by R2 is a group obtained by removing two hydrogen atoms from any position of a substituted or unsubstituted linear saturated aliphatic hydrocarbon. This substituted or unsubstituted linear saturated aliphatic hydrocarbon is the same as the substituted or unsubstituted linear saturated aliphatic hydrocarbon mentioned in the description of the substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group represented by A1 (i.e., a substituted or unsubstituted linear saturated aliphatic hydrocarbon obtained by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group), but preferred embodiments and specific examples of the substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group represented by R2 are as follows.
 Rで表される置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基は、置換若しくは無置換の鎖状飽和脂肪族炭化水素の2個の異なる炭素原子のそれぞれから当該炭素原子に結合した水素原子を1個ずつ除いた基であることが好ましく、また、置換若しくは無置換の直鎖状飽和脂肪族炭化水素の任意の位置から2個の水素原子を除いた基であることも好ましい。 The substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R2 is preferably a group in which one hydrogen atom bonded to each of two different carbon atoms of a substituted or unsubstituted chain saturated aliphatic hydrocarbon has been removed from said carbon atoms, and is also preferably a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted straight-chain saturated aliphatic hydrocarbon.
 Rで表される無置換の2価の鎖状飽和脂肪族炭化水素基の炭素数は、特に限定されないが、好ましくは1~20、より好ましくは2~16、さらに好ましくは3~12である。 The number of carbon atoms in the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R2 is not particularly limited, but is preferably 1 to 20, more preferably 2 to 16, and even more preferably 3 to 12.
 Rで表される無置換の2価の鎖状飽和脂肪族炭化水素基の具体例としては、トリメチレン基、テトラメチレン基、ペンタメチレン基、ヘキサメチレン基、3-メチルペンタン-1,5-ジイル基、ヘプタメチレン基、オクタメチレン基、及びドデカメチレン基等が挙げられる。 Specific examples of the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R2 include a trimethylene group, a tetramethylene group, a pentamethylene group, a hexamethylene group, a 3-methylpentane-1,5-diyl group, a heptamethylene group, an octamethylene group, and a dodecamethylene group.
 Rで表される2価の鎖状飽和脂肪族炭化水素基が置換基を有する場合、その置換基は、Aで表されるm価の芳香族基が有していてもよい置換基と同義であり、その好ましい態様も同様である。 When the divalent chain saturated aliphatic hydrocarbon group represented by R2 has a substituent, the substituent has the same meaning as the substituent that the m-valent aromatic group represented by A1 may have, and preferred embodiments thereof are also the same.
 Rが**-R(R-*で表される基である場合、Rで表される置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基は、Rで表される置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基と同義であるが、その好ましい態様及び具体例は以下の通りである。 When R 2 is a group represented by **-R 4 (R 5 ) p R 4 -*, the substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group represented by R 4 has the same meaning as the substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group represented by R 2 , and preferred embodiments and specific examples thereof are as follows:
 Rで表される置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基は、置換若しくは無置換の鎖状飽和脂肪族炭化水素の2個の異なる炭素原子のそれぞれから当該炭素原子に結合した水素原子を1個ずつ除いた基であることが好ましく、また、置換若しくは無置換の直鎖状飽和脂肪族炭化水素の任意の位置から2個の水素原子を除いた基であることも好ましい。 The substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R4 is preferably a group in which one hydrogen atom bonded to each of two different carbon atoms of a substituted or unsubstituted chain saturated aliphatic hydrocarbon has been removed from said carbon atoms, and is also preferably a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted straight-chain saturated aliphatic hydrocarbon.
 Rで表される無置換の2価の鎖状飽和脂肪族炭化水素基の炭素数は、特に限定されないが、好ましくは1~4、より好ましくは1~3、さらに好ましくは1である。 The number of carbon atoms in the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R4 is not particularly limited, but is preferably 1 to 4, more preferably 1 to 3, and even more preferably 1.
 Rで表される無置換の2価の鎖状飽和脂肪族炭化水素基の具体例としては、メチレン基、エチレン基、プロピレン基、トリメチレン基、及びテトラメチレン基等が挙げられる。 Specific examples of the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R4 include a methylene group, an ethylene group, a propylene group, a trimethylene group, and a tetramethylene group.
 Rが**-R(R-*で表される基である場合、Rで表される置換若しくは無置換の2価の芳香族基は、置換若しくは無置換の芳香族環の任意の位置から2個の水素原子を除いた基である。置換若しくは無置換の芳香族環は、Aで表される置換若しくは無置換のm価の芳香族基の説明において言及した置換若しくは無置換の芳香族環(すなわち、置換若しくは無置換のm価の芳香族基の結合手に水素原子を結合してなる置換若しくは無置換の芳香族環。)と同義であり、その好ましい態様も同様である。 When R2 is a group represented by **- R4 ( R5 ) pR4- *, the substituted or unsubstituted divalent aromatic group represented by R5 is a group obtained by removing two hydrogen atoms from any position of a substituted or unsubstituted aromatic ring. The substituted or unsubstituted aromatic ring has the same meaning as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), and the preferred embodiments thereof are also the same.
 **-R(R-*で表される基の好適な具体例としては、下記基が挙げられる。 Specific preferred examples of the group represented by **-R 4 (R 5 ) p R 4 -* include the following groups.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 Rが**-(RO)-*で表される基である場合、Rで表される置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基は、Rで表される置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基と同義であるが、その好ましい態様及び具体例は以下の通りである。 When R 2 is a group represented by **-(R 6 O) q R 6 -*, the substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R 6 has the same meaning as the substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R 2 , and preferred embodiments and specific examples thereof are as follows:
 Rで表される置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基は、置換若しくは無置換の鎖状飽和脂肪族炭化水素の2個の異なる炭素原子のそれぞれから当該炭素原子に結合した水素原子を1個ずつ除いた基であることが好ましく、また、置換若しくは無置換の直鎖状飽和脂肪族炭化水素の任意の位置から2個の水素原子を除いた基であることも好ましい。 The substituted or unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R6 is preferably a group in which one hydrogen atom bonded to each of two different carbon atoms of a substituted or unsubstituted chain saturated aliphatic hydrocarbon has been removed from said carbon atoms, and is also preferably a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted straight-chain saturated aliphatic hydrocarbon.
 Rで表される無置換の2価の鎖状飽和脂肪族炭化水素基の炭素数は、特に限定されないが、好ましくは1~4、より好ましくは1~3、さらに好ましくは1~2である。 The number of carbon atoms in the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R 6 is not particularly limited, but is preferably 1 to 4, more preferably 1 to 3, and even more preferably 1 to 2.
 Rで表される無置換の2価の鎖状飽和脂肪族炭化水素基の具体例としては、メチレン基、エチレン基、プロピレン基、トリメチレン基、及びテトラメチレン基等が挙げられる。 Specific examples of the unsubstituted divalent chain saturated aliphatic hydrocarbon group represented by R6 include a methylene group, an ethylene group, a propylene group, a trimethylene group, and a tetramethylene group.
 Rが**-(RO)-*で表される基である場合、qは、1~3の整数であり、好ましくは2である。 When R 2 is a group represented by **-(R 6 O) q R 6 -*, q is an integer of 1 to 3, and preferably 2.
 **-(RO)-*で表される基の好適な具体例としては、**-CHCHOCHCH-*、**-(CHCHO)CHCH-*、**-CH(CH)CHOCH(CH)CH-*、及び**-(CH(CH)CHO)CH(CH)CH-*等が挙げられる。 Specific preferred examples of the group represented by **-(R 6 O) q R 6 -* include **-CH 2 CH 2 OCH 2 CH 2 -*, **-(CH 2 CH 2 O) 2 CH 2 CH 2 -*, **-CH(CH 3 )CH 2 OCH(CH 3 )CH 2 -*, and **-(CH(CH 3 )CH 2 O) 2 CH(CH 3 )CH 2 -*.
 R(OR-*)で表される基の好適な具体例としては、下記基が挙げられる。 Specific preferred examples of the group represented by R 1 (OR 2 -*) 3 include the following groups.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 R(R-*)で表される基の好適な具体例としては、下記基が挙げられる。 Specific preferred examples of the group represented by R 1 (R 2 -*) 3 include the following groups.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 AがRC(OR-*)又はRC(R-*)で表される基である場合、Rは、R(OR-*)で表される基中のRと同義であり、その好ましい態様も同様である。ただし、この場合、Rで表される基において、*は、Xとの結合位置であり;**は、AがRC(OR-*)で表される基である場合にはRCに結合している酸素原子との結合位置であり、AがRC(R-*)で表される基である場合にはRCとの結合位置である。また、Rは、水素原子又はメチル基である。 When A 1 is a group represented by R 3 C(OR 2 -*) 3 or R 3 C(R 2 -*) 3 , R 2 has the same meaning as R 2 in the group represented by R 1 (OR 2 -*) 3 , and the preferred embodiments are also the same. However, in this case, in the group represented by R 2 , * is the bonding position to X 1 ; ** is the bonding position to the oxygen atom bonded to R 3 C when A 1 is a group represented by R 3 C(OR 2 -*) 3 , and is the bonding position to R 3 C when A 1 is a group represented by R 3 C(R 2 -*) 3. R 3 is a hydrogen atom or a methyl group.
 RC(OR-*)で表される基の好適な具体例としては、下記基が挙げられる。 Preferred specific examples of the group represented by R 3 C(OR 2 -*) 3 include the following groups.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 RC(R-*)で表される基の好適な具体例としては、下記基が挙げられる。 Preferred specific examples of the group represented by R 3 C(R 2 -*) 3 include the following groups.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 式(1)及び式(2)中、Aは、置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換の2価のシクロアルカン基、置換若しくは無置換の2価のシクロアルケン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、*-B-**で表される基、*-B-**で表される基、又*-B-**で表される基である。複数のAは、互いに同一でも異なっていてもよい。なお、Aで表される基において、*は、Xとの結合位置であり;**は、式(1)中のアクリロイルオキシ基、メタクリロイルオキシ基、若しくはビニルベンジルオキシ基との結合位置、又は式(2)中のアクリロイルオキシアルコキシ基、メタクリロイルオキシアルコキシ基、若しくはビニルベンジルオキシアルコキシ基との結合位置である。 In formula (1) and formula (2), A2 represents a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles), one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a group represented by *-B 1 Y 1 B 2 -**, a group represented by *-B 1 Y 1 B 2 Y 2 B 3 -**, or a group represented by *-B 1 Y 1 B 2 Y 2 B 3 Y 3 B 4 -**. Multiple A 2 's may be the same or different from each other. In the group represented by A2 , * denotes the bonding position to X1 ; ** denotes the bonding position to the acryloyloxy group, methacryloyloxy group, or vinylbenzyloxy group in formula (1), or the bonding position to the acryloyloxyalkoxy group, methacryloyloxyalkoxy group, or vinylbenzyloxyalkoxy group in formula (2).
 Aは、π-πスタッキング相互作用により配向度が高くなる結果、高い熱伝導性を有する硬化物を与え得る点で、二重結合を含むことが好ましい。したがって、Aは、置換若しくは無置換の2価の芳香族基、置換若しくは無置換の2価のシクロアルケン基、2以上の置換若しくは無置換の芳香族環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、又は1以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基であることが好ましい。また、Aは、合成容易性の観点から、置換若しくは無置換の2価の芳香族基、置換若しくは無置換の2価のシクロアルカン基、2以上の置換若しくは無置換の芳香族環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、又は1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、又は1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基であることが好ましく、置換若しくは無置換の2価の芳香族基、置換若しくは無置換の2価のシクロアルカン基、2つの置換若しくは無置換の芳香族環が単結合で連結された2価の基、2つの置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1つの置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、又は2つの置換若しくは無置換の芳香族環と1つの置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基であることがより好ましい。 A2 preferably contains a double bond, since this increases the degree of orientation due to π-π stacking interactions, and as a result, a cured product having high thermal conductivity can be obtained. Therefore, A 2 is preferably a substituted or unsubstituted divalent aromatic group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, or a divalent group in which one or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) and one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond. From the viewpoint of ease of synthesis, 2 is a substituted or unsubstituted divalent aromatic group, a substituted or unsubstituted divalent cycloalkane group, a divalent group in which two or more substituted or unsubstituted aromatic rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, or a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond. and more preferably a substituted or unsubstituted divalent aromatic group, a substituted or unsubstituted divalent cycloalkane group, a divalent group in which two substituted or unsubstituted aromatic rings are linked by a single bond, a divalent group in which two substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one substituted or unsubstituted cycloalkane ring are linked by a single bond, or a divalent group in which two substituted or unsubstituted aromatic rings and one substituted or unsubstituted cycloalkene ring are linked by a single bond.
 Aで表される置換若しくは無置換の2価の芳香族基は、置換若しくは無置換の芳香族環の任意の位置から2個の水素原子を除いた基である。この置換若しくは無置換の芳香族環は、Aで表される置換若しくは無置換のm価の芳香族基の説明において言及した置換若しくは無置換の芳香族環(すなわち、置換若しくは無置換のm価の芳香族基の結合手に水素原子を結合してなる置換若しくは無置換の芳香族環。)と同義であり、その好ましい態様も同様である。Aで表される置換若しくは無置換の2価の芳香族基の好ましい態様は、以下の通りである。 The substituted or unsubstituted divalent aromatic group represented by A2 is a group obtained by removing two hydrogen atoms from any position of a substituted or unsubstituted aromatic ring. This substituted or unsubstituted aromatic ring is the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group.) and the preferred embodiments thereof are also the same. The preferred embodiments of the substituted or unsubstituted divalent aromatic group represented by A2 are as follows.
 Aで表される置換若しくは無置換の2価の芳香族基は、置換若しくは無置換の単環式又は縮合環式の芳香族環の任意の位置から2個の水素原子を除いた基であることが好ましく、また、無置換の芳香族環の任意の位置から2個の水素原子を除いた基であることも好ましい。 The substituted or unsubstituted divalent aromatic group represented by A2 is preferably a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted monocyclic or fused ring aromatic ring, and is also preferably a group in which two hydrogen atoms have been removed from any position of an unsubstituted aromatic ring.
 Aで表される置換若しくは無置換の2価の芳香族基の炭素数は、特に限定されないが、好ましくは3~20、より好ましくは6~16、さらに好ましくは6~14である。 The number of carbon atoms in the substituted or unsubstituted divalent aromatic group represented by A2 is not particularly limited, but is preferably 3 to 20, more preferably 6 to 16, and even more preferably 6 to 14.
 無置換の芳香族環の具体例としては、ベンゼン、ナフタレン、アントラセン、フェナントレン、ピレン、トリフェニレン、ペリレン、フラン、ベンゾフラン、ジベンゾフラン、チオフェン、ベンゾチオフェン、及びジベンゾチオフェン等が挙げられ、好ましくはベンゼン又はナフタレンである。 Specific examples of unsubstituted aromatic rings include benzene, naphthalene, anthracene, phenanthrene, pyrene, triphenylene, perylene, furan, benzofuran, dibenzofuran, thiophene, benzothiophene, and dibenzothiophene, and preferably benzene or naphthalene.
 Aで表される2価の芳香族基が置換基を有する場合、その置換基は、炭素数1~2のアルキル基及び炭素数1~2のアルコキシ基からなる群から選択されることが好ましい。 When the divalent aromatic group represented by A2 has a substituent, the substituent is preferably selected from the group consisting of an alkyl group having 1 to 2 carbon atoms and an alkoxy group having 1 to 2 carbon atoms.
 上述の通り、Aで表される2価の芳香族基は、無置換であるか、置換基を有する場合には、当該置換基が炭素数1~2のアルキル基及び炭素数1~2のアルコキシ基からなる群から選択されることが好ましい。Aで表される2価の芳香族基が無置換であるか、立体障害の小さい置換基を有する場合には、メソゲン骨格同士のπ-πスタッキング相互作用が阻害されにくく、配向度が高くなる結果、高い熱伝導性を有する硬化物を与え得るためである。 As described above, the divalent aromatic group represented by A2 is unsubstituted, or if it has a substituent, the substituent is preferably selected from the group consisting of an alkyl group having 1 to 2 carbon atoms and an alkoxy group having 1 to 2 carbon atoms. When the divalent aromatic group represented by A2 is unsubstituted or has a substituent with small steric hindrance, the π-π stacking interaction between mesogenic skeletons is less likely to be hindered, and the degree of orientation is increased, so that a cured product having high thermal conductivity can be obtained.
 Aで表される置換若しくは無置換の2価の芳香族基の好適な具体例としては、下記基が挙げられる。 Specific preferred examples of the substituted or unsubstituted divalent aromatic group represented by A2 include the following groups.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 Aで表される置換若しくは無置換の2価のシクロアルカン基は、置換若しくは無置換のシクロアルカン環の任意の位置から2個の水素原子を除いた基である。この置換若しくは無置換のシクロアルカン環は、Aで表される置換若しくは無置換のm価のシクロアルカン基の説明において言及した置換若しくは無置換のシクロアルカン環(すなわち、置換若しくは無置換のm価のシクロアルカン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルカン環。)と同義であり、その好ましい態様も同様である。 The substituted or unsubstituted divalent cycloalkane group represented by A2 is a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted cycloalkane ring. This substituted or unsubstituted cycloalkane ring has the same meaning as the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group), and the preferred embodiments thereof are also the same.
 Aで表される置換若しくは無置換の2価のシクロアルカン基の好適な具体例としては、下記基が挙げられる。 Preferred specific examples of the substituted or unsubstituted divalent cycloalkane group represented by A2 include the following groups.
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 Aで表される置換若しくは無置換の2価のシクロアルケン基は、置換若しくは無置換のシクロアルケン環の任意の位置から2個の水素原子を除いた基である。 The substituted or unsubstituted divalent cycloalkene group represented by A2 is a group in which two hydrogen atoms have been removed from any position of a substituted or unsubstituted cycloalkene ring.
 本明細書において、シクロアルケン環は、単環であってもよく、縮合環であってもよく、複素環であってもよい。シクロアルケン環が複素環である場合、複素環に含まれるヘテロ原子としては、例えば、酸素原子、窒素原子、及び硫黄原子等が挙げられる。誘電損失の抑制又は誘電正接の低減の観点から、シクロアルケン環はヘテロ原子を含まないことが好ましい。シクロアルケン環は、単環又は縮合環であることが好ましく、単環であることがより好ましい。1つのシクロアルケン環に含まれる二重結合の数は、特に限定されないが、好ましくは1~3、より好ましくは1~2、さらに好ましくは1である。また、シクロアルケン環に含まれる二重結合の位置は、特に限定されない。
 また、本明細書において、シクロアルケン基及びシクロアルケン環は、シス体であってもよく、トランス体であってもよく、これらの混合物であってもよいが、混合物の場合はトランス体の割合が高いことが好ましい。
In this specification, the cycloalkene ring may be a monocyclic ring, a condensed ring, or a heterocyclic ring. When the cycloalkene ring is a heterocyclic ring, examples of heteroatoms contained in the heterocyclic ring include an oxygen atom, a nitrogen atom, and a sulfur atom. From the viewpoint of suppressing dielectric loss or reducing dielectric tangent, it is preferable that the cycloalkene ring does not contain a heteroatom. The cycloalkene ring is preferably a monocyclic ring or a condensed ring, and more preferably a monocyclic ring. The number of double bonds contained in one cycloalkene ring is not particularly limited, but is preferably 1 to 3, more preferably 1 to 2, and even more preferably 1. In addition, the position of the double bond contained in the cycloalkene ring is not particularly limited.
In addition, in this specification, the cycloalkene group and the cycloalkene ring may be in a cis form, a trans form, or a mixture thereof, and in the case of a mixture, it is preferable that the proportion of the trans form is higher.
 無置換の2価のシクロアルケン基の炭素数は、特に限定されないが、好ましくは4~20、より好ましくは5~16、さらに好ましくは6~14である。無置換のシクロアルケン環の炭素数は、無置換の2価のシクロアルケン基の炭素数と同義であり、その好ましい態様も同様である。 The number of carbon atoms in the unsubstituted divalent cycloalkene group is not particularly limited, but is preferably 4 to 20, more preferably 5 to 16, and even more preferably 6 to 14. The number of carbon atoms in the unsubstituted cycloalkene ring is synonymous with the number of carbon atoms in the unsubstituted divalent cycloalkene group, and the preferred embodiments are the same.
 無置換のシクロアルケン環の具体例としては、シクロペンテン、シクロヘキセン、シクロへプテン、シクロオクテン、シクロノネン、シクロペンタジエン、1,3-シクロへキサジエン、1,4-シクロへキサジエン、1,3-シクロヘプタジエン、1,4-シクロヘプタジエン、1,3-シクロオクタジエン、1,5-シクロオクタジエン、1,6-シクロデカジエン、1,5-シクロドデカジエン、1,3,5-シクロヘプタトリエン、1,3,5-シクロオクタトリエン、及び1,5,9-シクロドデカトリエン等が挙げられる。 Specific examples of unsubstituted cycloalkene rings include cyclopentene, cyclohexene, cycloheptene, cyclooctene, cyclononene, cyclopentadiene, 1,3-cyclohexadiene, 1,4-cyclohexadiene, 1,3-cycloheptadiene, 1,4-cycloheptadiene, 1,3-cyclooctadiene, 1,5-cyclooctadiene, 1,6-cyclodecadiene, 1,5-cyclododecadiene, 1,3,5-cycloheptatriene, 1,3,5-cyclooctatriene, and 1,5,9-cyclododecatriene.
 2価のシクロアルケン基が置換基を有する場合、すなわち、シクロアルケン環が置換基を有する場合、その置換基は、Aで表されるm価の芳香族基が有していてもよい置換基と同義である。 When the divalent cycloalkene group has a substituent, that is, when the cycloalkene ring has a substituent, the substituent has the same meaning as the substituent that the m-valent aromatic group represented by A1 may have.
 Aで表される置換若しくは無置換の2価のシクロアルケン基の好適な具体例としては、下記基が挙げられる。 Preferred specific examples of the substituted or unsubstituted divalent cycloalkene group represented by A2 include the following groups.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 Aで表される2以上の置換若しくは無置換の芳香族環が単結合で連結された2価の基は、2以上の置換若しくは無置換の芳香族環が単結合で連結した化合物の任意の位置から2個の水素原子を除いた基である。単結合で連結される置換若しくは無置換の芳香族環は、Aで表される置換若しくは無置換のm価の芳香族基の説明において言及した置換若しくは無置換の芳香族環(すなわち、置換若しくは無置換のm価の芳香族基の結合手に水素原子を結合してなる置換若しくは無置換の芳香族環。)と同義であり、その好ましい態様も同様である。 The divalent group represented by A2 in which two or more substituted or unsubstituted aromatic rings are linked by a single bond is a group obtained by removing two hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted aromatic rings are linked by a single bond. The substituted or unsubstituted aromatic ring linked by a single bond is the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by binding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), and the preferred embodiments thereof are also the same.
 2以上の置換若しくは無置換の芳香族環が単結合で連結した化合物において、単結合で連結される置換若しくは無置換の芳香族環の数は、2以上であれば特に限定されないが、好ましくは2~10、より好ましくは2~4、さらに好ましくは2である。 In a compound in which two or more substituted or unsubstituted aromatic rings are linked by single bonds, the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
 2以上の無置換の芳香族環が単結合で連結した化合物の具体例としては、ビフェニル、o-ターフェニル、m-ターフェニル、p-ターフェニル、m-クオーターフェニル、及びp-クオーターフェニル等が挙げられる。 Specific examples of compounds in which two or more unsubstituted aromatic rings are linked by a single bond include biphenyl, o-terphenyl, m-terphenyl, p-terphenyl, m-quarterphenyl, and p-quarterphenyl.
 Aで表される2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基は、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結した化合物の任意の位置から2個の水素原子を除いた基である。単結合で連結される置換若しくは無置換のシクロアルカン環は、Aで表される置換若しくは無置換のm価のシクロアルカン基の説明において言及した置換若しくは無置換のシクロアルカン環(すなわち、m価のシクロアルカン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルカン環。)と同義であり、その好ましい態様も同様である。 The divalent group represented by A2 in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds is a group obtained by removing two hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds. The substituted or unsubstituted cycloalkane ring linked by a single bond is the same as the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by binding a hydrogen atom to a bond of an m-valent cycloalkane group), and the preferred embodiments thereof are also the same.
 2以上の置換若しくは無置換のシクロアルカン環が単結合で連結した化合物において、単結合で連結される置換若しくは無置換のシクロアルカン環の数は、2以上であれば特に限定されないが、好ましくは2~10、より好ましくは2~4、さらに好ましくは2である。 In a compound in which two or more substituted or unsubstituted cycloalkane rings are linked by single bonds, the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
 2以上の無置換のシクロアルカン環が単結合で連結した化合物の具体例としては、シクロプロピルシクロヘキサン、ビシクロヘキシル、1,3-ジシクロヘキシルシクロヘキサン、1,4-ジシクロヘキシルシクロヘキサン、1-シクロヘキシルピロリジン、及び4-シクロヘキシルモルホリン等が挙げられる。 Specific examples of compounds in which two or more unsubstituted cycloalkane rings are linked by single bonds include cyclopropylcyclohexane, bicyclohexyl, 1,3-dicyclohexylcyclohexane, 1,4-dicyclohexylcyclohexane, 1-cyclohexylpyrrolidine, and 4-cyclohexylmorpholine.
 Aで表される2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基は、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結した化合物の任意の位置から2個の水素原子を除いた基である。単結合で連結される置換若しくは無置換のシクロアルケン環は、Aで表される置換若しくは無置換の2価のシクロアルケン基の説明において言及した置換若しくは無置換のシクロアルケン環(すなわち、置換若しくは無置換の2価のシクロアルケン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルケン環。)と同義であり、その好ましい態様も同様である。 The divalent group represented by A2 in which two or more substituted or unsubstituted cycloalkene rings are linked by single bonds is a group obtained by removing two hydrogen atoms from any position of a compound in which two or more substituted or unsubstituted cycloalkene rings are linked by single bonds. The substituted or unsubstituted cycloalkene ring linked by a single bond is the same as the substituted or unsubstituted cycloalkene ring mentioned in the description of the substituted or unsubstituted divalent cycloalkene group represented by A2 (i.e., a substituted or unsubstituted cycloalkene ring formed by binding a hydrogen atom to a bond of a substituted or unsubstituted divalent cycloalkene group), and the preferred embodiments thereof are also the same.
 2以上の置換若しくは無置換のシクロアルケン環が単結合で連結した化合物において、単結合で連結される置換若しくは無置換のシクロアルケン環の数は、2以上であれば特に限定されないが、好ましくは2~10、より好ましくは2~4、さらに好ましくは2である。 In a compound in which two or more substituted or unsubstituted cycloalkene rings are linked by single bonds, the number of substituted or unsubstituted cycloalkene rings linked by single bonds is not particularly limited as long as it is two or more, but is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
 Aで表される1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基は、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結した化合物の任意の位置から2個の水素原子を除いた基である。単結合で連結される置換若しくは無置換の芳香族環及び置換若しくは無置換のシクロアルカン環は、それぞれ、Aで表される置換若しくは無置換のm価の芳香族基の説明において言及した置換若しくは無置換の芳香族環(すなわち、置換若しくは無置換のm価の芳香族基の結合手に水素原子を結合してなる置換若しくは無置換の芳香族環。)及びAで表される置換若しくは無置換のm価のシクロアルカン基の説明において言及した置換若しくは無置換のシクロアルカン環(すなわち、置換若しくは無置換のm価のシクロアルカン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルカン環。)と同義であり、その好ましい態様も同様である。 The divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond represented by A2 is a group obtained by removing two hydrogen atoms from any position of a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond. The substituted or unsubstituted aromatic ring and the substituted or unsubstituted cycloalkane ring linked by a single bond are respectively the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group.) and the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group.) and the preferred embodiments thereof are the same.
 1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結した化合物において、単結合で連結される置換若しくは無置換の芳香族環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1であり、単結合で連結される置換若しくは無置換のシクロアルカン環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1である。また、単結合で連結される置換若しくは無置換の芳香族環の数と置換若しくは無置換のシクロアルカン環の数との合計は、好ましくは2~10、より好ましくは2~4、さらに好ましくは2である。 In a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by single bonds, the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1. In addition, the total number of substituted or unsubstituted aromatic rings linked by single bonds and the number of substituted or unsubstituted cycloalkane rings is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
 1以上の無置換の芳香族環と1以上の無置換のシクロアルカン環が単結合で連結した化合物の具体例としては、シクロプロピルベンゼン、シクロペンチルベンゼン、シクロヘキシルベンゼン、1-シクロヘキシルナフタレン、2-シクロヘキシルナフタレン、2-フェニルテトラヒドロフラン、1-フェニルアダマンタン、1,3-ジフェニルアダマンタン、1,3,5,7-テトラフェニルアダマンタン、2-シクロヘキシルフラン、4-フェニルピぺリジン、2-シクロヘキシルチオフェン、及び4-フェニルモルホリン等が挙げられる。 Specific examples of compounds in which one or more unsubstituted aromatic rings and one or more unsubstituted cycloalkane rings are linked by a single bond include cyclopropylbenzene, cyclopentylbenzene, cyclohexylbenzene, 1-cyclohexylnaphthalene, 2-cyclohexylnaphthalene, 2-phenyltetrahydrofuran, 1-phenyladamantane, 1,3-diphenyladamantane, 1,3,5,7-tetraphenyladamantane, 2-cyclohexylfuran, 4-phenylpiperidine, 2-cyclohexylthiophene, and 4-phenylmorpholine.
 Aで表される1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基の好適な具体例としては、下記基が挙げられる。 [0043] Specific preferred examples of the divalent group represented by A2 in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond include the following groups.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 Aで表される1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基は、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結した化合物の任意の位置から2個の水素原子を除いた基である。単結合で連結される置換若しくは無置換の芳香族環及び置換若しくは無置換のシクロアルケン環は、それぞれ、Aで表される置換若しくは無置換のm価の芳香族基の説明において言及した置換若しくは無置換の芳香族環(すなわち、置換若しくは無置換のm価の芳香族基の結合手に水素原子を結合してなる置換若しくは無置換の芳香族環。)及びAで表される置換若しくは無置換の2価のシクロアルケン基の説明において言及した置換若しくは無置換のシクロアルケン環(すなわち、置換若しくは無置換の2価のシクロアルケン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルケン環。)と同義であり、その好ましい態様も同様である。 The divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond represented by A2 is a group obtained by removing two hydrogen atoms from any position of a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond. The substituted or unsubstituted aromatic ring and the substituted or unsubstituted cycloalkene ring linked by a single bond are respectively the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group.) and the substituted or unsubstituted cycloalkene ring mentioned in the description of the substituted or unsubstituted divalent cycloalkene group represented by A2 (i.e., a substituted or unsubstituted cycloalkene ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted divalent cycloalkene group.) and the preferred embodiments thereof are the same.
 Aで表される1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基の好適な具体例としては、下記基が挙げられる。 [0043] Specific preferred examples of the divalent group represented by A2 in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond include the following groups.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結した化合物において、単結合で連結される置換若しくは無置換の芳香族環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1であり、単結合で連結される置換若しくは無置換のシクロアルケン環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1である。また、単結合で連結される置換若しくは無置換の芳香族環の数と置換若しくは無置換のシクロアルケン環の数との合計は、好ましくは2~10、より好ましくは2~4、さらに好ましくは2である。 In a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by single bonds, the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkene rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1. In addition, the total number of substituted or unsubstituted aromatic rings linked by single bonds and the number of substituted or unsubstituted cycloalkene rings is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
 Aで表される1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基は、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結した化合物の任意の位置から2個の水素原子を除いた基である。単結合で連結される置換若しくは無置換のシクロアルカン環及び置換若しくは無置換のシクロアルケン環は、それぞれ、Aで表される置換若しくは無置換のm価のシクロアルカン基の説明において言及した置換若しくは無置換のシクロアルカン環(すなわち、置換若しくは無置換のm価のシクロアルカン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルカン環。)及びAで表される置換若しくは無置換の2価のシクロアルケン基の説明において言及した置換若しくは無置換のシクロアルケン環(すなわち、置換若しくは無置換の2価のシクロアルケン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルケン環。)と同義であり、その好ましい態様も同様である。 The divalent group represented by A2 in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond is a group in which two hydrogen atoms have been removed from any position of a compound in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond. The substituted or unsubstituted cycloalkane ring and the substituted or unsubstituted cycloalkene ring linked by a single bond are respectively synonymous with the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group) and the substituted or unsubstituted cycloalkene ring mentioned in the description of the substituted or unsubstituted divalent cycloalkene group represented by A2 (i.e., a substituted or unsubstituted cycloalkene ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted divalent cycloalkene group), and preferred aspects thereof are also the same.
 1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結した化合物において、単結合で連結される置換若しくは無置換のシクロアルカン環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1であり、単結合で連結される置換若しくは無置換のシクロアルケン環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1である。また、単結合で連結される置換若しくは無置換のシクロアルカン環の数と置換若しくは無置換のシクロアルケン環の数との合計は、好ましくは2~10、より好ましくは2~4、さらに好ましくは2である。 In a compound in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by single bonds, the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkene rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1. In addition, the total number of substituted or unsubstituted cycloalkane rings and substituted or unsubstituted cycloalkene rings linked by single bonds is preferably 2 to 10, more preferably 2 to 4, and even more preferably 2.
 Aで表される1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基は、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結した化合物の任意の位置から2個の水素原子を除いた基である。単結合で連結される置換若しくは無置換の芳香族環、置換若しくは無置換のシクロアルカン環、及び置換若しくは無置換のシクロアルケン環は、それぞれ、Aで表される置換若しくは無置換のm価の芳香族基の説明において言及した置換若しくは無置換の芳香族環(すなわち、置換若しくは無置換のm価の芳香族基の結合手に水素原子を結合してなる置換若しくは無置換の芳香族環。)、Aで表される置換若しくは無置換のm価のシクロアルカン基の説明において言及した置換若しくは無置換のシクロアルカン環(すなわち、置換若しくは無置換のm価のシクロアルカン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルカン環。)、及びAで表される置換若しくは無置換の2価のシクロアルケン基の説明において言及した置換若しくは無置換のシクロアルケン環(すなわち、置換若しくは無置換の2価のシクロアルケン基の結合手に水素原子を結合してなる置換若しくは無置換のシクロアルケン環。)と同義であり、その好ましい態様も同様である。 The divalent group represented by A2 in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by single bonds is a group obtained by removing two hydrogen atoms from any position of a compound in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by single bonds. The substituted or unsubstituted aromatic ring, substituted or unsubstituted cycloalkane ring, and substituted or unsubstituted cycloalkene ring linked by a single bond are respectively the same as the substituted or unsubstituted aromatic ring mentioned in the description of the substituted or unsubstituted m-valent aromatic group represented by A1 (i.e., a substituted or unsubstituted aromatic ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent aromatic group), the substituted or unsubstituted cycloalkane ring mentioned in the description of the substituted or unsubstituted m-valent cycloalkane group represented by A1 (i.e., a substituted or unsubstituted cycloalkane ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted m-valent cycloalkane group), and the substituted or unsubstituted cycloalkene ring mentioned in the description of the substituted or unsubstituted divalent cycloalkene group represented by A2 (i.e., a substituted or unsubstituted cycloalkene ring formed by bonding a hydrogen atom to a bond of a substituted or unsubstituted divalent cycloalkene group), and the preferred embodiments thereof are also the same.
 1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結した化合物において、単結合で連結される置換若しくは無置換の芳香族環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1であり、単結合で連結される置換若しくは無置換のシクロアルカン環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1であり、単結合で連結される置換若しくは無置換のシクロアルケン環の数は、1以上であれば特に限定されないが、好ましくは1~5、より好ましくは1~3、さらに好ましくは1である。また、単結合で連結される置換若しくは無置換の芳香族環の数と置換若しくは無置換のシクロアルカン環の数と置換若しくは無置換のシクロアルケン環の数との合計は、好ましくは3~10、より好ましくは3~4、さらに好ましくは3である。 In a compound in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by single bonds, the number of substituted or unsubstituted aromatic rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, the number of substituted or unsubstituted cycloalkane rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1, and the number of substituted or unsubstituted cycloalkene rings linked by single bonds is not particularly limited as long as it is 1 or more, but is preferably 1 to 5, more preferably 1 to 3, and even more preferably 1. In addition, the total number of substituted or unsubstituted aromatic rings, substituted or unsubstituted cycloalkane rings, and substituted or unsubstituted cycloalkene rings linked by single bonds is preferably 3 to 10, more preferably 3 to 4, and even more preferably 3.
 Aが*-B-**で表される基、*-B-**で表される基、又*-B-**で表される基である場合、B~Bは、それぞれ、置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換の2価のシクロアルカン基、置換若しくは無置換の2価のシクロアルケン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、又は1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基であり;Y~Yは、それぞれ、エステル基、カルボニル基、又はエーテル基である。 When A 2 is a group represented by *-B 1 Y 1 B 2 -**, a group represented by *-B 1 Y 1 B 2 Y 2 B 3 -**, or a group represented by *-B 1 Y 1 B 2 Y 2 B 3 Y 3 B 4 -**, B 1 to B 4 are each a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, or a divalent group in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond; and Y 1 to Y 3 each represent an ester group, a carbonyl group, or an ether group.
 B~Bで表される置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換の2価のシクロアルカン基、置換若しくは無置換の2価のシクロアルケン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、及び1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基は、それぞれ、Aで表される置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換の2価のシクロアルカン基、置換若しくは無置換の2価のシクロアルケン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、及び1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基と同義であり、その好ましい態様も同様である。 A substituted or unsubstituted divalent aromatic group represented by B 1 to B 4 (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted A divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, and a divalent group in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond are each represented by the following formula: a substituted or unsubstituted divalent aromatic group represented by the formula (2) (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted and a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, and a divalent group in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, and preferred aspects thereof are also the same.
 Y~Yは、それぞれ、エステル基(-COO-又は-OCO-)、カルボニル基(-CO-)、又はエーテル基(-O-)であり、好ましくはエステル基である。 Each of Y 1 to Y 3 is an ester group (—COO— or —OCO—), a carbonyl group (—CO—) or an ether group (—O—), and is preferably an ester group.
 A及びAは、融点の低いビニル化合物を得る観点から、上述した基のうち、炭素数3~14の基又は炭素数6~14の基であることも好ましい。ただし、この炭素数は、置換基の炭素数を含まないものとする。 From the viewpoint of obtaining a vinyl compound having a low melting point, A1 and A2 are also preferably, among the above-mentioned groups, a group having 3 to 14 carbon atoms or a group having 6 to 14 carbon atoms, provided that this number of carbon atoms does not include the number of carbon atoms of the substituent.
 式(1)及び式(2)中、Xは、単結合、エステル基(-COO-又は-OCO-)、カルボニル基(-CO-)、又はエーテル基(-O-)であり、好ましくはエステル基又はカルボニル基であり、より好ましくはエステル基である。複数のXは、互いに同一でも異なっていてもよい。 In formula (1) and formula (2), X 1 is a single bond, an ester group (-COO- or -OCO-), a carbonyl group (-CO-), or an ether group (-O-), preferably an ester group or a carbonyl group, and more preferably an ester group. Multiple X 1s may be the same or different from each other.
 式(1)及び式(2)中、mは、3~6の整数であり、好ましくは3~5の整数、より好ましくは3又は4、さらに好ましくは3である。 In formula (1) and formula (2), m is an integer from 3 to 6, preferably an integer from 3 to 5, more preferably 3 or 4, and even more preferably 3.
 式(2)中、nは、1~20の整数であり、好ましくは1~12の整数、より好ましくは1~8の整数、さらに好ましくは2~6の整数である。複数のnは、互いに同一でも異なっていてもよい。 In formula (2), n is an integer from 1 to 20, preferably an integer from 1 to 12, more preferably an integer from 1 to 8, and even more preferably an integer from 2 to 6. Multiple n's may be the same or different.
 本明細書においては、本実施形態の式(1)又は式(2)で表されるビニル化合物を「ビニル化合物(1)」ということがある。ビニル化合物(1)は、融点が低く、溶解性も高い。 In this specification, the vinyl compound represented by formula (1) or formula (2) of this embodiment may be referred to as "vinyl compound (1)." Vinyl compound (1) has a low melting point and high solubility.
 ビニル化合物(1)の融点は、160℃未満であることがより好ましい。好ましくは80℃以上160℃未満であり、より好ましくは90~155℃以下であり、さらに好ましく100~155℃である。ビニル化合物の融点が上記範囲であれば、溶融混練等による加工が容易となり、また、加工に要するエネルギーを抑制することもできる。 The melting point of the vinyl compound (1) is preferably less than 160°C. It is preferably 80°C or higher and less than 160°C, more preferably 90 to 155°C, and even more preferably 100 to 155°C. If the melting point of the vinyl compound is within the above range, it becomes easy to process it by melt kneading or the like, and the energy required for processing can also be reduced.
 ビニル化合物(1)は、ビニル化合物を有機溶媒に溶解した塗布液の塗布といった加工を行う際の有機溶媒への溶解性が高いため、作業性及び加工性等に優れる。
 有機溶媒としては、特に限定されず、例えばヘキサン、ベンゼン、及びトルエン等の炭化水素系溶媒;アセトン、メチルエチルケトン、及びメチルイソブチルケトン等のケトン系溶媒;ジエチルエーテル、イソブチルメチルエーテル、及びテトラヒドロフラン等のエーテル系溶媒;酢酸メチル、酢酸エチル、及び酢酸イソブチル等のエステル系溶媒;等が挙げられる。
 後述する実施例に示すように、ビニル化合物(1)は、エーテル系溶媒に対して従来公知のビニル化合物より高い溶解度を示す。具体的には、実施例のビニル化合物1及びビニル化合物2は、エーテル系溶媒に対して従来公知のビニル化合物のそれぞれ約7倍及び約3倍の溶解度を示す。
The vinyl compound (1) has high solubility in organic solvents when a coating solution prepared by dissolving the vinyl compound in an organic solvent is applied, and therefore has excellent workability, processability, and the like.
The organic solvent is not particularly limited, and examples thereof include hydrocarbon solvents such as hexane, benzene, and toluene; ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; ether solvents such as diethyl ether, isobutyl methyl ether, and tetrahydrofuran; and ester solvents such as methyl acetate, ethyl acetate, and isobutyl acetate.
As shown in the Examples below, vinyl compound (1) exhibits higher solubility in ether solvents than conventionally known vinyl compounds. Specifically, vinyl compound 1 and vinyl compound 2 in the Examples exhibit solubilities in ether solvents that are about 7 times and about 3 times, respectively, of conventionally known vinyl compounds.
 ビニル化合物(1)は、重合性を有し、重合(本明細書においては「硬化」ともいう)により、後述するビニル樹脂硬化物を形成することができる。したがって、ビニル化合物(1)は、プリント配線板の絶縁層や放熱材料等の構成材料を形成するために好適に用いることができる。 The vinyl compound (1) is polymerizable and can form a vinyl resin cured product (described later) by polymerization (also referred to as "curing" in this specification). Therefore, the vinyl compound (1) can be suitably used to form a constituent material for the insulating layer of a printed wiring board, a heat dissipation material, and the like.
 式(1)中、Aに鎖状飽和脂肪族炭化水素基が含まれる場合、Aが、ビニル化合物(1)におけるメソゲン骨格である。一方、式(1)中、Aに鎖状飽和脂肪族炭化水素基が含まれない場合、A、X、及びAが連結した構造が、ビニル化合物(1)におけるメソゲン骨格である。ビニル化合物(1)のメソゲン骨格は、例えば、従来の2個の炭化水素環が連結した構造のメソゲン骨格よりも、連結した炭化水素環の数が多いため、配向度が高くなる。ビニル化合物(1)の硬化物である樹脂は、このような配向度の高い構造を有することにより、高い熱伝導性を示す. In formula (1), when A 1 contains a chain-like saturated aliphatic hydrocarbon group, A 2 is the mesogenic skeleton in vinyl compound (1). On the other hand, in formula (1), when A 1 does not contain a chain-like saturated aliphatic hydrocarbon group, the structure in which A 1 , X 1 and A 2 are linked is the mesogenic skeleton in vinyl compound (1). The mesogenic skeleton of vinyl compound (1) has a higher degree of orientation because it has a larger number of linked hydrocarbon rings than, for example, a conventional mesogenic skeleton having a structure in which two hydrocarbon rings are linked. The resin, which is the cured product of vinyl compound (1), exhibits high thermal conductivity due to having such a structure with a high degree of orientation.
 一方、ヒドロキシ基を有する樹脂は、誘電損失が高い傾向にある。例えば、末端部にエポキシ基を有する化合物(モノマー)の硬化物である樹脂は、樹脂中に水酸基を有しており、その誘電損失は高い。これに対して、ビニル化合物(1)の末端部は、エポキシ基及びヒドロキシ基のいずれでもなく、ビニル基(エテニル基)である。したがって、ビニル化合物(1)の硬化物(重合体)は、ヒドロキシ基を有さないため、低誘電損失を示す。 On the other hand, resins that have hydroxyl groups tend to have high dielectric loss. For example, a resin that is a cured product of a compound (monomer) that has epoxy groups at its terminal has hydroxyl groups in the resin, and its dielectric loss is high. In contrast, the terminal of vinyl compound (1) is neither an epoxy group nor a hydroxy group, but a vinyl group (ethenyl group). Therefore, the cured product (polymer) of vinyl compound (1) has no hydroxy groups and therefore shows low dielectric loss.
<<ビニル化合物の製造方法>>
 ビニル化合物(1)は、例えば、式(3)又は式(4)で表される化合物(本明細書においては、「化合物(A)」ということがある)と、式(5)で表される化合物(本明細書においては、「化合物(B)」ということがある)とを塩基の存在下で反応させることで製造できる。
<<Method of producing vinyl compound>>
The vinyl compound (1) can be produced, for example, by reacting a compound represented by formula (3) or formula (4) (sometimes referred to as "compound (A)" in this specification) with a compound represented by formula (5) (sometimes referred to as "compound (B)" in this specification) in the presence of a base.
Figure JPOXMLDOC01-appb-C000019
(式中、A、X、A、m、及びnは、それぞれ上記と同一の意味を表す。)
Figure JPOXMLDOC01-appb-C000019
(In the formula, A 1 , X 1 , A 2 , m, and n each have the same meaning as above.)
XR   (5)
(式中、Xは、ハロゲン原子を表し;Rは、上記と同一の意味を表す。)
XR (5)
(In the formula, X represents a halogen atom; R has the same meaning as above.)
 前記化合物(A)としては、例えば、1,3,5-トリス(4-ヒドロキシフェニル)シクロヘキサン、1,3,5-トリス(3-メチル-4-ヒドロキシフェニル)シクロヘキサン、1-(4-ヒドロキシフェニル)-3,5-ビス(3-メチル-4-ヒドロキシフェニル)シクロヘキサン、1-(3-メチル-4-ヒドロキシフェニル)-3,5-ビス(4-ヒドロキシフェニル)シクロヘキサン、1,3,5-トリス(4-ヒドロキシフェニル)ベンゼン、1,3,5-トリス(3-メチル-4-ヒドロキシフェニル)ベンゼン、1-(4-ヒドロキシフェニル)-3,5-ビス(3-メチル-4-ヒドロキシフェニル)ベンゼン、1-(3-メチル-4-ヒドロキシフェニル)-3,5-ビス(4-ヒドロキシフェニル)ベンゼン、1,3,5-トリス(4-(4-ヒドロキシフェニル)シクロヘキシル)ベンゼン、1,3,5-トリス(4-ヒドロキシフェニル) 1,3,5-シクロヘキサントリカルボキシレート、1,3,5-トリス(3-メチル-4-ヒドロキシフェニル) 1,3,5-シクロヘキサントリカルボキシレート、1-(4-ヒドロキシフェニル)-3,5-ビス(3-メチル-4-ヒドロキシフェニル) 1,3,5-シクロヘキサントリカルボキシレート、1-(3-メチル-4-ヒドロキシフェニル)-3,5-ビス(4-ヒドロキシフェニル) 1,3,5-シクロヘキサントリカルボキシレート、1,3,5-トリス(4-ヒドロキシフェニル) 1,3,5-ベンゼントリカルボキシレート、1,3,5-トリス(3-メチル-4-ヒドロキシフェニル) 1,3,5-ベンゼントリカルボキシレート、1-(3-メチル-4-ヒドロキシフェニル)-3,5-ビス(4-ヒドロキシフェニル) 1,3,5-ベンゼントリカルボキシレート、1-(4-ヒドロキシフェニル)-3,5-ビス(3-メチル-4-ヒドロキシフェニル) 1,3,5-ベンゼントリカルボキシレート、1,3,5-トリス(4-(4-ヒドロキシフェニル)シクロヘキシル) 1,3,5-ベンゼントリカルボキシレート、1,3,5-トリス(4-ヒドロキシフェニルカルボニルオキシ)シクロヘキサン、1,3,5-トリス(3-メチル-4-ヒドロキシフェニルカルボニルオキシ)シクロヘキサン、1-(4-ヒドロキシフェニルカルボニルオキシ)-3,5-ビス(3-メチル-4-ヒドロキシフェニルカルボニルオキシ)シクロヘキサン、1-(3-メチル-4-ヒドロキシフェニルカルボニルオキシ)-3,5-ビス(4-ヒドロキシフェニルカルボニルオキシ)シクロヘキサン、1,3,5-トリス(4-ヒドロキシフェニルカルボニルオキシ)ベンゼン、1,3,5-トリス(3-メチル-4-ヒドロキシフェニルカルボニルオキシ)ベンゼン、1-(4-ヒドロキシフェニルカルボニルオキシ)-3,5-ビス(3-メチル-4-ヒドロキシフェニルカルボニルオキシ)ベンゼン、1-(3-メチル-4-ヒドロキシフェニルカルボニルオキシ)-3,5-ビス(4-ヒドロキシフェニルカルボニルオキシ)ベンゼン、1,3,5-トリス(4-(4-ヒドロキシフェニル)シクロヘキシルカルボニルオキシ)ベンゼン、1,3,5-トリス(4-ヒドロキシフェニルカルボニル)シクロヘキサン、1,3,5-トリス(3-メチル-4-ヒドロキシフェニルカルボニル)シクロヘキサン、1-(4-ヒドロキシフェニルカルボニル)-3,5-ビス(3-メチル-4-ヒドロキシフェニルカルボニル)シクロヘキサン、1-(3-メチル-4-ヒドロキシフェニルカルボニル)-3,5-ビス(4-ヒドロキシフェニルカルボニル)シクロヘキサン、1,3,5-トリス(4-ヒドロキシフェニルカルボニル)ベンゼン、1,3,5-トリス(3-メチル-4-ヒドロキシフェニルカルボニル)ベンゼン、1-(4-ヒドロキシフェニルカルボニル)-3,5-ビス(3-メチル-4-ヒドロキシフェニルカルボニル)ベンゼン、1-(3-メチル-4-ヒドロキシフェニルカルボニル)-3,5-ビス(4-ヒドロキシフェニルカルボニル)ベンゼン、1,3,5-トリス(4-(4-ヒドロキシフェニル)シクロヘキシルカルボニル)ベンゼン、これらの2-ヒドロキシエチルエーテル、これらの3-ヒドロキシプロピルエーテル、及びこれらの4-ヒドロキシブチルエーテル等が挙げられる。化合物(A)は、公知の有機合成法、例えば、エステル合成方法、ケトン合成方法、エーテル合成方法、又はこれらに準じた方法を単独で又は組み合わせて行うにより製造することができる。 Examples of the compound (A) include 1,3,5-tris(4-hydroxyphenyl)cyclohexane, 1,3,5-tris(3-methyl-4-hydroxyphenyl)cyclohexane, 1-(4-hydroxyphenyl)-3,5-bis(3-methyl-4-hydroxyphenyl)cyclohexane, 1-(3-methyl-4-hydroxyphenyl)-3,5-bis(4-hydroxyphenyl)cyclohexane, 1,3,5-tris(4-hydroxyphenyl)benzene, 1,3,5-tris(3-methyl-4- 1-(4-hydroxyphenyl)-3,5-bis(3-methyl-4-hydroxyphenyl)benzene, 1-(3-methyl-4-hydroxyphenyl)-3,5-bis(4-hydroxyphenyl)benzene, 1,3,5-tris(4-(4-hydroxyphenyl)cyclohexyl)benzene, 1,3,5-tris(4-hydroxyphenyl)-1,3,5-cyclohexanetricarboxylate, 1,3,5-tris(3-methyl-4-hydroxyphenyl)-1,3,5-cyclohexanetricarboxylate, Cyclohexanetricarboxylate, 1-(4-hydroxyphenyl)-3,5-bis(3-methyl-4-hydroxyphenyl)-1,3,5-cyclohexanetricarboxylate, 1-(3-methyl-4-hydroxyphenyl)-3,5-bis(4-hydroxyphenyl)-1,3,5-cyclohexanetricarboxylate, 1,3,5-tris(4-hydroxyphenyl)-1,3,5-benzenetricarboxylate, 1,3,5-tris(3-methyl-4-hydroxyphenyl)-1,3,5- Benzenetricarboxylate, 1-(3-methyl-4-hydroxyphenyl)-3,5-bis(4-hydroxyphenyl)-1,3,5-benzenetricarboxylate, 1-(4-hydroxyphenyl)-3,5-bis(3-methyl-4-hydroxyphenyl)-1,3,5-benzenetricarboxylate, 1,3,5-tris(4-(4-hydroxyphenyl)cyclohexyl)-1,3,5-benzenetricarboxylate, 1,3,5-tris(4-hydroxyphenylcarbonyloxy)cyclohexyl cyclohexane, 1,3,5-tris(3-methyl-4-hydroxyphenylcarbonyloxy)cyclohexane, 1-(4-hydroxyphenylcarbonyloxy)-3,5-bis(3-methyl-4-hydroxyphenylcarbonyloxy)cyclohexane, 1-(3-methyl-4-hydroxyphenylcarbonyloxy)-3,5-bis(4-hydroxyphenylcarbonyloxy)cyclohexane, 1,3,5-tris(4-hydroxyphenylcarbonyloxy)benzene, 1,3,5-tris(3-methyl-4-hydroxyphenylcarbonyloxy) 1-(4-hydroxyphenylcarbonyloxy)-3,5-bis(3-methyl-4-hydroxyphenylcarbonyloxy)benzene, 1-(3-methyl-4-hydroxyphenylcarbonyloxy)-3,5-bis(4-hydroxyphenylcarbonyloxy)benzene, 1,3,5-tris(4-(4-hydroxyphenyl)cyclohexylcarbonyloxy)benzene, 1,3,5-tris(4-hydroxyphenyl)cyclohexylcarbonyloxy)benzene, Examples of the hydroxyethyl ether include hexane, 1,3,5-tris(3-methyl-4-hydroxyphenylcarbonyl)cyclohexane, 1-(4-hydroxyphenylcarbonyl)-3,5-bis(3-methyl-4-hydroxyphenylcarbonyl)cyclohexane, 1-(3-methyl-4-hydroxyphenylcarbonyl)-3,5-bis(4-hydroxyphenylcarbonyl)cyclohexane, 1,3,5-tris(4-hydroxyphenylcarbonyl)benzene, 1,3,5-tris(3-methyl-4-hydroxyphenylcarbonyl)benzene, 1-(4-hydroxyphenylcarbonyl)-3,5-bis(3-methyl-4-hydroxyphenylcarbonyl)benzene, 1-(3-methyl-4-hydroxyphenylcarbonyl)-3,5-bis(4-hydroxyphenylcarbonyl)benzene, 1,3,5-tris(4-(4-hydroxyphenyl)cyclohexylcarbonyl)benzene, 2-hydroxyethyl ethers thereof, 3-hydroxypropyl ethers thereof, and 4-hydroxybutyl ethers thereof. Compound (A) can be produced by known organic synthesis methods, such as an ester synthesis method, a ketone synthesis method, an ether synthesis method, or methods similar thereto, either alone or in combination.
 前記Xは、ハロゲン原子を表し、前記ハロゲン原子としては、例えば、塩素原子、臭素原子、ヨウ素原子等が挙げられる。 The X represents a halogen atom, and examples of the halogen atom include a chlorine atom, a bromine atom, and an iodine atom.
 化合物(B)としては、例えば、アクリロイルブロマイド、アクリロイルクロライド、メタクリロイルブロマイド、メタクリロイルクロライド、o-ビニルベンジルブロマイド、m-ビニルベンジルブロマイド、p-ビニルベンジルブロマイド、o-ビニルベンジルクロライド、m-ビニルベンジルクロライド、及びp-ビニルベンジルクロライド等が挙げられる。化合物(B)は、1種単独で用いてもよく、2種以上を任意の組み合わせ及び比率で用いてもよい。 Examples of compound (B) include acryloyl bromide, acryloyl chloride, methacryloyl bromide, methacryloyl chloride, o-vinylbenzyl bromide, m-vinylbenzyl bromide, p-vinylbenzyl bromide, o-vinylbenzyl chloride, m-vinylbenzyl chloride, and p-vinylbenzyl chloride. Compound (B) may be used alone or in any combination and ratio of two or more kinds.
 化合物(B)の使用量は、化合物(A)に対して、通常好ましくは2~100当量、より好ましくは2~50当量である。 The amount of compound (B) used is usually preferably 2 to 100 equivalents, more preferably 2 to 50 equivalents, relative to compound (A).
 前記塩基は、無機塩基及び有機塩基のいずれであってもよい。
 前記無機塩基としては、例えば、水素化ナトリウム及び水素化カリウム等のアルカリ金属水素化物;例えば、水酸化ナトリウム及び水酸化カリウム等のアルカリ金属水酸化物;例えば、炭酸ナトリウム及び炭酸カリウム等の炭酸アルカリ金属塩;等が挙げられる。
 前記有機塩基としては、例えば、ピリジン等が挙げられる。塩基の使用量は、化合物(A)に対して、好ましくは2~5当量である。反応条件下で液体である有機塩基を用いる場合は、かかる有機塩基を、反応溶媒を兼ねて過剰量用いてもよい。
The base may be either an inorganic base or an organic base.
Examples of the inorganic base include alkali metal hydrides such as sodium hydride and potassium hydride; alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; alkali metal carbonates such as sodium carbonate and potassium carbonate; and the like.
Examples of the organic base include pyridine. The amount of the base used is preferably 2 to 5 equivalents relative to compound (A). When an organic base that is liquid under reaction conditions is used, such an organic base may be used in an excess amount to serve as a reaction solvent.
 化合物(A)と化合物(B)との反応は、通常溶媒中で、化合物(A)と化合物(B)と塩基とを混合することにより行う。その混合順序は特に限定されない。 The reaction between compound (A) and compound (B) is usually carried out in a solvent by mixing compound (A), compound (B), and a base. The order of mixing is not particularly limited.
 前記溶媒は、反応に不活性な溶媒であれば特に限定されないが、副生成物の生成が抑制されやすいという点で、親水性溶媒が好ましい。前記親水性溶媒としては、例えば、メタノール、エタノール、プロパノール、ブタノール、エチレングリコール、及びプロピレングリコール等のアルコール系溶媒;例えば、メチルエチルケトン及びメチルイソブチルケトン等のケトン系溶媒;例えば、N,N-ジメチルホルムアミド、ジメチルスルホキシド、及びN-メチルピロリドン等の非プロトン性極性溶媒;例えば、テトラヒドロフラン、ジオキサン、メトキシメチルエーテル、及びジエトキシエタン等のエーテル系溶媒;等の単独又は混合溶媒が挙げられる。また、反応条件下で液体である有機塩基を塩基として用いる場合には、前記有機塩基を反応溶媒として用いてもよい。
 これらの中でも、溶媒は、エーテル系溶媒、非プロトン性極性溶媒及びこれらの混合溶媒であることが好ましく、非プロトン性極性溶媒であることがより好ましく、N,N-ジメチルホルムアミドであることが特に好ましい。
The solvent is not particularly limited as long as it is a solvent inert to the reaction, but a hydrophilic solvent is preferred in that it is easy to suppress the generation of by-products. Examples of the hydrophilic solvent include alcohol-based solvents such as methanol, ethanol, propanol, butanol, ethylene glycol, and propylene glycol; ketone-based solvents such as methyl ethyl ketone and methyl isobutyl ketone; aprotic polar solvents such as N,N-dimethylformamide, dimethyl sulfoxide, and N-methylpyrrolidone; and ether-based solvents such as tetrahydrofuran, dioxane, methoxymethyl ether, and diethoxyethane; and the like, either alone or in combination. In addition, when an organic base that is liquid under reaction conditions is used as a base, the organic base may be used as a reaction solvent.
Among these, the solvent is preferably an ether solvent, an aprotic polar solvent, or a mixture thereof, more preferably an aprotic polar solvent, and particularly preferably N,N-dimethylformamide.
 溶媒の使用量は、化合物(A)1gあたり1~20mLであることが好ましく、2~10mLであることがより好ましい。 The amount of solvent used is preferably 1 to 20 mL, and more preferably 2 to 10 mL, per gram of compound (A).
 化合物(A)と化合物(B)との反応は、触媒の存在下で、ハロゲン交換反応を経由させて行ってもよい。
 前記触媒としては、例えば、ヨウ化ナトリウム及びヨウ化カリウム等のアルカリ金属ハロゲン化物;例えば、テトラブチルアンモニウムアイオダイド等のハロゲン化第4級アンモニウム;等が挙げられる。
 触媒を使用する場合、その使用量は、化合物(A)の使用量に対して、好ましくは0.05~1質量倍、より好ましくは0.1~0.5質量倍である。
The reaction between compound (A) and compound (B) may be carried out in the presence of a catalyst via a halogen exchange reaction.
Examples of the catalyst include alkali metal halides such as sodium iodide and potassium iodide; and quaternary ammonium halides such as tetrabutylammonium iodide.
When a catalyst is used, the amount of the catalyst used is preferably 0.05 to 1 times by mass, more preferably 0.1 to 0.5 times by mass, based on the amount of compound (A) used.
 化合物(A)と化合物(B)との反応は、重合禁止剤の存在下で行ってもよい。前記重合禁止剤としては、例えば、2,6-ジ(tert-ブチル)-p-クレゾール等が挙げられる。重合禁止剤を使用する場合、その使用量は、化合物(B)の使用量に対して、好ましくは0.002~0.05質量倍、より好ましくは0.004~0.02質量倍である。 The reaction between compound (A) and compound (B) may be carried out in the presence of a polymerization inhibitor. Examples of the polymerization inhibitor include 2,6-di(tert-butyl)-p-cresol. When a polymerization inhibitor is used, the amount of the polymerization inhibitor used is preferably 0.002 to 0.05 times, more preferably 0.004 to 0.02 times, by mass, the amount of compound (B) used.
 反応は常圧条件下で行ってもよいし、減圧条件下で行ってもよい。反応温度は、通常好ましくは10~150℃である。なお、本反応では、反応の進行に伴い、水が副生する場合があるが、その場合には、副生する水を反応系外へ除去しながら反応を行うことが好ましく、水が共沸除去される反応温度や反応圧力で反応を行うことが好ましい。反応時間は、通常好ましくは1~24時間である。 The reaction may be carried out under normal pressure conditions or under reduced pressure conditions. The reaction temperature is usually preferably 10 to 150°C. In this reaction, water may be produced as a by-product as the reaction proceeds. In such cases, it is preferable to carry out the reaction while removing the by-product water from the reaction system, and it is preferable to carry out the reaction at a reaction temperature and pressure at which water is removed azeotropically. The reaction time is usually preferably 1 to 24 hours.
 反応終了後、例えば、反応液を冷却し、水、又は水を含む混合溶媒を加えて、析出した固体を濾別し、必要に応じて、公知の後処理操作を1回又は2回以上行うことで、ビニル化合物(1)が得られる。前記後処理操作としては、例えば、水、水を含む混合溶媒、又は有機溶媒中での前記固体の撹拌洗浄;前記固体を溶解させた溶液の抽出(分液)等が挙げられる。得られたビニル化合物(1)は、必要に応じて、通常の精製手段によってさらに精製してもよい。 After the reaction is completed, for example, the reaction liquid is cooled, water or a mixed solvent containing water is added, the precipitated solid is filtered off, and if necessary, a known post-treatment operation is carried out once or twice or more times to obtain vinyl compound (1). Examples of the post-treatment operation include stirring and washing the solid in water, a mixed solvent containing water, or an organic solvent; extraction of the solution in which the solid is dissolved (liquid separation), and the like. The obtained vinyl compound (1) may be further purified by a conventional purification means if necessary.
 得られたビニル化合物(1)は、例えば、核磁気共鳴(NMR)法等の公知の方法によって、その構造を確認できる。 The structure of the obtained vinyl compound (1) can be confirmed by a known method such as nuclear magnetic resonance (NMR) spectroscopy.
<<ビニル組成物>>
 本実施形態のビニル組成物は、ビニル化合物(1)を含有する。
 本明細書においては、本実施形態のビニル組成物を「ビニル組成物(1)」ということがある。
<<Vinyl Composition>>
The vinyl composition of the present embodiment contains a vinyl compound (1).
In this specification, the vinyl composition of the present embodiment may be referred to as "vinyl composition (1)."
 前記ビニル組成物(1)は、硬化性を有し、ビニル化合物(1)のみを含有していてもよいし、ビニル化合物(1)を含有し、且つ、本発明の効果を損なわない範囲で、ビニル化合物(1)以外の他の成分を含有していてもよい。ビニル化合物(1)は、加熱することにより硬化してもよいし、光照射により硬化してもよい。後述する実施例においては、加熱することにより硬化している。ビニル組成物(1)を硬化させるときは、ビニル組成物(1)に圧力を加えてもよい。ビニル組成物(1)は、プリント配線板の絶縁層や放熱材料等の構成材料を形成するために好適に用いることができる。 The vinyl composition (1) has a curing property and may contain only the vinyl compound (1), or may contain the vinyl compound (1) and other components other than the vinyl compound (1) within a range that does not impair the effects of the present invention. The vinyl compound (1) may be cured by heating or by light irradiation. In the examples described later, it is cured by heating. When curing the vinyl composition (1), pressure may be applied to the vinyl composition (1). The vinyl composition (1) can be suitably used to form a constituent material such as an insulating layer of a printed wiring board or a heat dissipation material.
<ビニル化合物(1)>
 ビニル組成物(1)は、ビニル化合物(1)を1種単独で含有していてもよく、2種以上を任意の組み合わせ及び比率で含有していてもよい。
<Vinyl compound (1)>
The vinyl composition (1) may contain one type of vinyl compound (1) alone, or may contain two or more types in any combination and in any ratio.
 ビニル組成物(1)中に、1分子中2以上のRがビニルベンジル基であるビニル化合物(1)が2種以上含まれる場合、これら2種以上のビニル化合物(1)は、末端基であるビニルベンジル基が有するビニル基の位置が異なり、且つ、ビニルベンジル基以外の部分が同一であるビニル化合物(1)複数種の混合物であることが好ましい。 When the vinyl composition (1) contains two or more vinyl compounds (1) in which two or more R in one molecule are vinylbenzyl groups, it is preferable that these two or more vinyl compounds (1) are a mixture of multiple vinyl compounds (1) in which the vinyl groups in the terminal vinylbenzyl groups are different in position and the portions other than the vinylbenzyl groups are identical.
 例えば、1分子中2以上のRがビニルベンジル基であるビニル化合物(1)を2種以上含有するビニル組成物(1)において、1分子中2以上のRがビニルベンジル基であるビニル化合物(1)の全ビニルベンジル基のモル数を100とした場合、ビニル基の位置がm位のビニルベンジル基のモル数は、好ましくは30~90、より好ましくは40~90、さらに好ましくは50~90、さらにより好ましくは60~80、特に好ましくは70~80である。また、例えば、ビニル基の位置がp位のビニルベンジル基のモル数とビニル基の位置がm位のビニルベンジル基のモル数との比(p-ビニルベンジル基のモル数/m-ビニルベンジル基のモル数;本明細書においては、「p/m比」ということがある。)は、好ましくは10/90~70/30、より好ましくは10/90~60/40、さらに好ましくは10/90~50/50、さらにより好ましくは20/80~40/60、特に好ましくは20/80~30/70である。ビニル基の位置がm位のビニルベンジル基のモル数又はp/m比が上記範囲であることにより、ビニル化合物(1)の混合物は、より低い温度で融解するため、ビニル化合物の加工性を向上することができる。 For example, in a vinyl composition (1) containing two or more types of vinyl compounds (1) in which two or more R in one molecule are vinylbenzyl groups, if the total number of moles of vinylbenzyl groups in the vinyl compounds (1) in which two or more R in one molecule are vinylbenzyl groups is taken as 100, the number of moles of vinylbenzyl groups in the m-position of the vinyl group is preferably 30 to 90, more preferably 40 to 90, even more preferably 50 to 90, even more preferably 60 to 80, and particularly preferably 70 to 80. For example, the ratio of the number of moles of vinylbenzyl groups whose vinyl groups are in the p-position to the number of moles of vinylbenzyl groups whose vinyl groups are in the m-position (number of moles of p-vinylbenzyl groups/number of moles of m-vinylbenzyl groups; sometimes referred to as the "p/m ratio" in this specification) is preferably 10/90 to 70/30, more preferably 10/90 to 60/40, even more preferably 10/90 to 50/50, even more preferably 20/80 to 40/60, and particularly preferably 20/80 to 30/70. By having the number of moles of vinylbenzyl groups whose vinyl groups are in the m-position or the p/m ratio in the above range, the mixture of vinyl compounds (1) melts at a lower temperature, and the processability of the vinyl compounds can be improved.
<他の成分>
 ビニル組成物(1)が含有する前記他の成分としては、例えば、ラジカル開始剤;充填材;添加剤;溶媒;ビニル化合物(1)以外のビニル化合物(本明細書においては、「他のビニル化合物」ということがある);ビニル化合物(1)の重合体(硬化物)以外の樹脂(本明細書においては、「他の樹脂」ということがある)等が挙げられる。
<Other Ingredients>
Examples of the other components contained in the vinyl composition (1) include a radical initiator; a filler; an additive; a solvent; a vinyl compound other than the vinyl compound (1) (sometimes referred to as "other vinyl compounds" in this specification); and a resin other than a polymer (cured product) of the vinyl compound (1) (sometimes referred to as "other resins" in this specification).
 前記添加剤としては、例えば、シランカップリング剤、着色剤、低応力成分、離型剤、酸化防止剤、消泡剤、流れ調整剤等が挙げられる。 The additives include, for example, silane coupling agents, colorants, low stress components, release agents, antioxidants, defoamers, flow control agents, etc.
 前記ラジカル開始剤としては、例えば、アゾ化合物、有機過酸化物等が挙げられる。 Examples of the radical initiator include azo compounds and organic peroxides.
 前記充填材としては、例えば、溶融破砕シリカ粉末、溶融球状シリカ粉末、結晶シリカ粉末、二次凝集シリカ粉末等のシリカ粉末;例えば、アルミナ、酸化チタン、酸化亜鉛、炭化タングステン、酸化マグネシウム等の金属酸化物;ガラスクロス(ガラス繊維);カーボンファイバー;例えば、窒化ホウ素、窒化アルミニウム、窒化ケイ素、窒化チタン等の窒化物;炭化ケイ素;水酸化アルミニウム;タルク;クレイ;マイカ等が挙げられる。 The filler may, for example, be silica powder such as fused crushed silica powder, fused spherical silica powder, crystalline silica powder, or secondary agglomerated silica powder; metal oxides such as alumina, titanium oxide, zinc oxide, tungsten carbide, or magnesium oxide; glass cloth (glass fiber); carbon fiber; nitrides such as boron nitride, aluminum nitride, silicon nitride, or titanium nitride; silicon carbide; aluminum hydroxide; talc; clay; or mica.
 前記シランカップリング剤としては、例えば、γ-グリシドキシプロピルトリメトキシシラン等が挙げられる。
 前記着色剤としては、例えば、カーボンブラック等が挙げられる。
 前記低応力成分としては、例えば、シリコーンオイル、シリコーンゴム等が挙げられる。
 前記離型剤としては、例えば、天然ワックス、合成ワックス、高級脂肪酸、高級脂肪酸の金属塩、パラフィン等が挙げられる。
The silane coupling agent may, for example, be γ-glycidoxypropyltrimethoxysilane.
The colorant may, for example, be carbon black.
Examples of the low stress component include silicone oil and silicone rubber.
Examples of the release agent include natural wax, synthetic wax, higher fatty acid, metal salt of higher fatty acid, and paraffin.
 ビニル組成物(1)が含有する前記溶媒としては、例えば、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒;例えば、ジメチルスルホキシド、N-メチルピロリドン等の非プロトン性極性溶媒;例えば、酢酸ブチル等のエステル系溶媒;例えば、プロピレングリゴールモノメチルエーテル等のグリコール系溶媒;例えば、トルエン等の芳香族系溶媒等が挙げられる。 The solvent contained in the vinyl composition (1) may, for example, be a ketone-based solvent such as methyl ethyl ketone or methyl isobutyl ketone; an aprotic polar solvent such as dimethyl sulfoxide or N-methylpyrrolidone; an ester-based solvent such as butyl acetate; a glycol-based solvent such as propylene glycol monomethyl ether; or an aromatic solvent such as toluene.
 前記他のビニル化合物は、ビニル基を有し、且つ、ビニル化合物(1)に該当しない化合物であれば、特に限定されない。
 前記他の樹脂は、ビニル化合物(1)の重合体以外の樹脂であれば、特に限定されない。
The other vinyl compound is not particularly limited as long as it has a vinyl group and does not fall under the category of vinyl compound (1).
The other resin is not particularly limited as long as it is a resin other than a polymer of the vinyl compound (1).
 ビニル組成物(1)が含有する前記他の成分は、1種のみであってもよいし、2種以上であってもよい。 The vinyl composition (1) may contain only one type of other component, or two or more types.
 ビニル組成物(1)の前記他の成分の含有量は、前記他の成分の種類に応じて任意に選択できる。
 ビニル組成物(1)において、溶媒以外の成分の総含有量に対する、ビニル化合物(1)の含有量の割合は、80質量%以上であることが好ましく、例えば、85質量%以上、90質量%以上、95質量%以上、97質量%以上、及び99質量%以上のいずれかであってもよい。一方、前記割合は100質量%以下である。前記割合が80質量%以上であるビニル組成物(1)は、ビニル化合物(1)を含有していることにより得られる効果が、より高くなり好ましい。
The content of the other components in the vinyl composition (1) can be selected arbitrarily depending on the type of the other components.
In the vinyl composition (1), the content ratio of the vinyl compound (1) to the total content of components other than the solvent is preferably 80% by mass or more, and may be, for example, any of 85% by mass or more, 90% by mass or more, 95% by mass or more, 97% by mass or more, and 99% by mass or more. On the other hand, the ratio is 100% by mass or less. The vinyl composition (1) having the ratio of 80% by mass or more is preferable because the effect obtained by containing the vinyl compound (1) is higher.
 上記の方法で得られたビニル化合物(1)は、そのままビニル組成物(1)として用いることができる。前記他の成分を含有するビニル組成物(1)は、ビニル化合物(1)と前記他の成分を混合することで得られる。 The vinyl compound (1) obtained by the above method can be used as it is as vinyl composition (1). The vinyl composition (1) containing the other components can be obtained by mixing the vinyl compound (1) with the other components.
<<ビニル樹脂硬化物>>
 本実施形態のビニル樹脂硬化物は、ビニル化合物(1)又はビニル組成物(1)を硬化してなるものである。
 本明細書においては、本実施形態のビニル樹脂硬化物を「ビニル樹脂硬化物(1)」ということがある。
<<Cured vinyl resin>>
The vinyl resin cured product of the present embodiment is obtained by curing the vinyl compound (1) or the vinyl composition (1).
In this specification, the vinyl resin cured product of this embodiment may be referred to as "vinyl resin cured product (1)".
 ビニル樹脂硬化物は、ビニル化合物(1)を用いていることにより、その熱伝導性が高く、プリント配線板の構成材料として好適であり、なかでもプリント配線板を構成する絶縁材料として、特に好適である。ビニル樹脂硬化物は、ビニル化合物(1)を用いることにより、従来の基板用に使用されるエポキシ樹脂に比べて誘電損失が低い傾向となる。 The vinyl resin cured product has high thermal conductivity due to the use of vinyl compound (1), making it suitable as a constituent material for printed wiring boards, and is particularly suitable as an insulating material for printed wiring boards. The vinyl resin cured product, due to the use of vinyl compound (1), tends to have lower dielectric loss than epoxy resins used for conventional circuit boards.
 ビニル樹脂硬化物(1)がビニル化合物(1)の硬化物である場合、ビニル樹脂硬化物(1)は、1種のビニル化合物(1)の硬化物であってもよいし、2種以上のビニル化合物(1)の硬化物であってもよい。
 ビニル樹脂硬化物(1)がビニル組成物(1)の硬化物である場合、ビニル樹脂硬化物(1)は、1種のビニル組成物(1)の硬化物であってもよいし、2種以上のビニル組成物(1)の混合物の硬化物であってもよい。
When the vinyl resin cured material (1) is a cured material of a vinyl compound (1), the vinyl resin cured material (1) may be a cured material of one type of vinyl compound (1) or may be a cured material of two or more types of vinyl compounds (1).
When the vinyl resin cured product (1) is a cured product of the vinyl composition (1), the vinyl resin cured product (1) may be a cured product of one type of vinyl composition (1) or a cured product of a mixture of two or more types of vinyl compositions (1).
 ビニル樹脂硬化物(1)は、例えば、ビニル化合物(1)又はビニル組成物(1)をそのまま金型に充填し、必要によりプレス機等で所定の圧力で加圧しながら、所定の時間加熱して一次硬化し、さらにプレス機等で所定の圧力で加圧しながら、所定の時間加熱して完全硬化する方法;ビニル化合物(1)又はビニル組成物(1)を、そのまま所定の温度で加熱することで硬化させる方法;ビニル化合物(1)又はビニル組成物(1)の粉体をそのまま、又は必要に応じて溶融させ、金型に注ぎ、プレス機等で所定の圧力で加圧しながら、所定の時間加熱する方法;ビニル化合物(1)又はビニル組成物(1)を加熱溶融させて金型等に注ぎ、前記金型をさらに加熱することで成形する方法;ビニル化合物(1)又はビニル組成物(1)を溶融させ、得られた溶融物を、予め加熱された金型に注入して硬化する方法;ビニル化合物(1)又はビニル組成物(1)を部分硬化させ、得られた部分硬化物を粉砕して得られた粉末を金型に充填し、充填粉末を溶融成形する方法;ビニル化合物(1)又はビニル組成物(1)をそのまま、又は必要に応じて溶媒に溶解させ、必要により撹拌しながら部分硬化させて、得られた溶液をキャストした後、溶媒を通風乾燥等で乾燥除去し、必要に応じてプレス機等で所定の圧力で加圧しながら、所定の時間加熱する方法等で製造できる。 The vinyl resin cured product (1) can be prepared, for example, by filling a mold with the vinyl compound (1) or the vinyl composition (1) as is, and, if necessary, applying pressure at a predetermined pressure with a press or the like while heating for a predetermined time to cause primary curing, and then further applying pressure at a predetermined pressure with a press or the like while heating for a predetermined time to cause complete curing; by heating the vinyl compound (1) or the vinyl composition (1) as is at a predetermined temperature to cause curing; by pouring the powder of the vinyl compound (1) or the vinyl composition (1) as is, or after melting it as necessary, into a mold and heating for a predetermined time while applying pressure at a predetermined pressure with a press or the like; by heating and melting the vinyl compound (1) and then applying pressure to a mold or the like while heating for a predetermined time to cause complete curing; and further heating the mold to form the molded product; a method of melting the vinyl compound (1) or vinyl composition (1) and injecting the resulting molten product into a preheated mold to harden it; a method of partially hardening the vinyl compound (1) or vinyl composition (1), grinding the resulting partially hardened product, filling the resulting powder into a mold, and melt-molding the filled powder; a method of dissolving the vinyl compound (1) or vinyl composition (1) as is or as necessary in a solvent, partially hardening it while stirring as necessary, casting the resulting solution, and then drying and removing the solvent by ventilation drying or the like, and heating it for a predetermined time while applying a predetermined pressure with a press or the like as necessary.
 ビニル化合物(1)又はビニル組成物(1)を加熱して硬化させるときの加熱温度(硬化温度;複数段階で硬化を行う場合は、完全硬化温度)は、特に限定されないが、ビニル化合物(1)又はビニル組成物(1)の硬化度がより高くなる点では、140℃以上であることが好ましく、150℃以上であることがより好ましい。前記加熱温度は、過剰な加熱が避けられる点では、200℃以下であることが好ましい。 The heating temperature (curing temperature; complete curing temperature when curing is performed in multiple stages) when the vinyl compound (1) or the vinyl composition (1) is heated and cured is not particularly limited, but in order to increase the degree of curing of the vinyl compound (1) or the vinyl composition (1), it is preferably 140°C or higher, and more preferably 150°C or higher. In order to avoid excessive heating, the heating temperature is preferably 200°C or lower.
 ビニル化合物(1)又はビニル組成物(1)を加熱して硬化させるときの加熱時間(硬化時間;複数段階で硬化を行う場合は、完全硬化温度における加熱時間)は、特に限定されないが、ビニル化合物(1)又はビニル組成物(1)の硬化度がより高くなる点では、1時間以上であることが好ましく、2時間以上であることがより好ましい。前記加熱時間は、不要な硬化作業が避けられる点では、10時間以下であることが好ましい。 The heating time (curing time; when curing is performed in multiple stages, the heating time at the complete curing temperature) when the vinyl compound (1) or the vinyl composition (1) is heated and cured is not particularly limited, but in order to increase the degree of curing of the vinyl compound (1) or the vinyl composition (1), it is preferably 1 hour or more, and more preferably 2 hours or more. In order to avoid unnecessary curing operations, the heating time is preferably 10 hours or less.
 ビニル化合物(1)又はビニル組成物(1)を加圧して硬化させるときの加圧圧力(硬化時の圧力)は、特に限定されないが、ビニル化合物(1)又はビニル組成物(1)の硬化度がより高くなる点では、0.7MPa以上であることが好ましく、1.2MPa以上であることがより好ましい。前記加圧圧力は、過剰な加圧が避けられる点では、3MPa以下であることが好ましい。 The pressure applied when the vinyl compound (1) or the vinyl composition (1) is pressed and cured (pressure during curing) is not particularly limited, but in terms of increasing the degree of curing of the vinyl compound (1) or the vinyl composition (1), it is preferably 0.7 MPa or more, and more preferably 1.2 MPa or more. In terms of avoiding excessive pressurization, the pressure applied is preferably 3 MPa or less.
 ビニル樹脂硬化物(1)の熱拡散率は、1.75×10-7/s以上であることが好ましく、1.80×10-7/s以上であることがより好ましく、1.85×10-7/s以上であることがさらに好ましい。熱拡散率が上記範囲であると、熱伝導率が高い傾向となる。ビニル樹脂硬化物(1)の熱拡散率の上限値は、特に限定されず、前記熱拡散率は、4.00×10-7/s以下であってもよいし、3.00×10-7/s以下であってもよいし、2.50×10-7/s以下であってもよい。
 ビニル樹脂硬化物(1)の熱拡散率は、例えば、1.75×10-7~4.00×10-7/s、1.80×10-7~3.00×10-7/s、及び1.85×10-7~2.50×10-7/sのいずれかであってもよい。
The thermal diffusivity of the vinyl resin cured product (1) is preferably 1.75×10 −7 m 2 /s or more, more preferably 1.80×10 −7 m 2 /s or more, and even more preferably 1.85×10 −7 m 2 /s or more. When the thermal diffusivity is in the above range, the thermal conductivity tends to be high. The upper limit of the thermal diffusivity of the vinyl resin cured product (1) is not particularly limited, and the thermal diffusivity may be 4.00×10 −7 m 2 /s or less, 3.00×10 −7 m 2 /s or less, or 2.50×10 −7 m 2 /s or less.
The thermal diffusivity of the vinyl resin cured product (1) may be, for example, any one of 1.75×10 −7 to 4.00×10 −7 m 2 /s, 1.80× 10 −7 to 3.00×10 −7 m 2 /s, and 1.85×10 −7 to 2.50×10 −7 m 2 /s.
 ビニル樹脂硬化物(1)の熱拡散率は、温度波熱分析法(TWA法)により測定できる。本実施例では、市販の熱拡散率測定装置「ai-phase mobile」(株式会社アイフェイズ製)で測定している。 The thermal diffusivity of the vinyl resin cured material (1) can be measured by temperature wave thermal analysis (TWA). In this example, the thermal diffusivity is measured using a commercially available thermal diffusivity measuring device, "ai-phase mobile" (manufactured by ai-phase Co., Ltd.).
 周波数100MHzにおける、ビニル樹脂硬化物(1)の誘電正接は、0.0050以下であることが好ましく、0.0048以下であることがより好ましく、0.0046以下であることがさらに好ましい。ビニル樹脂硬化物(1)の前記誘電正接の下限値は、特に限定されず、前記誘電正接は、0.0010以上であってもよいし、0.0020以上であってもよいし、0.0030以上であってもよい。
 周波数100MHzにおける、ビニル樹脂硬化物(1)の誘電正接は、例えば、0.0010~0.0050、0.0020~0.0048、及び0.0030~0.0046のいずれかであってもよい。ただし、これらはビニル樹脂硬化物(1)の前記誘電正接の一例である。
The dielectric loss tangent of the vinyl resin cured product (1) at a frequency of 100 MHz is preferably 0.0050 or less, more preferably 0.0048 or less, and even more preferably 0.0046 or less. The lower limit of the dielectric loss tangent of the vinyl resin cured product (1) is not particularly limited, and the dielectric loss tangent may be 0.0010 or more, 0.0020 or more, or 0.0030 or more.
The dielectric loss tangent of the vinyl resin cured material (1) at a frequency of 100 MHz may be, for example, any one of 0.0010 to 0.0050, 0.0020 to 0.0048, and 0.0030 to 0.0046, although these are only examples of the dielectric loss tangent of the vinyl resin cured material (1).
 周波数100MHzにおける、ビニル樹脂硬化物(1)の誘電正接は、インピーダンスアナライザーを用いた容量法によって、以下の条件で測定できる。
 ・測定方法:容量法
 ・電極型式:16453A
 ・測定環境:23℃、50%RH
 ・印加電圧:1V
The dielectric loss tangent of the vinyl resin cured material (1) at a frequency of 100 MHz can be measured by a capacitance method using an impedance analyzer under the following conditions.
Measurement method: Capacitance method Electrode type: 16453A
Measurement environment: 23°C, 50% RH
Applied voltage: 1V
<<プリプレグ>>
 本実施形態のプリプレグは、ビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物と、繊維質基材とを含む。
 本明細書においては、本実施形態のプリプレグを「プリプレグ(1)」ということがある。プリプレグ(1)を用いることで、通常の方法により、積層板等を容易に製造できる。例えば、複数枚のプリプレグ(1)を重ね合わせて積層物とし、この積層物を加熱しながら加圧して成形し、一体化させることにより、目的とする積層板が得られる。
 プリプレグ(1)又は前記積層板を用いて得られたプリント配線板(プリント配線板中の樹脂層)は、ビニル化合物(1)を用いていることにより、その熱伝導性が高く、且つ誘電損失が低い。
<<Prepreg>>
The prepreg of the present embodiment contains a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and a fibrous base material.
In this specification, the prepreg of this embodiment may be referred to as "prepreg (1)". By using the prepreg (1), a laminate or the like can be easily manufactured by a normal method. For example, a desired laminate can be obtained by stacking a plurality of prepregs (1) to form a laminate, and molding and integrating the laminate by applying pressure while heating.
A printed wiring board (resin layer in a printed wiring board) obtained by using the prepreg (1) or the laminate has high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
 プリプレグ(1)は、ビニル化合物(1)を溶媒に溶解させた溶液を繊維質基材に塗布若しくは含浸する方法;又はビニル組成物(1)若しくはビニル組成物(1)を溶媒で希釈した希釈物を、繊維質基材に塗布若しくは含浸した後、この塗布若しくは含浸後の繊維質基材を加熱し、ビニル化合物(1)又はビニル組成物(1)を半硬化させる方法;により製造できる。 The prepreg (1) can be produced by a method in which a solution of the vinyl compound (1) dissolved in a solvent is applied to or impregnated into a fibrous substrate; or a method in which the vinyl composition (1) or a dilution of the vinyl composition (1) diluted with a solvent is applied to or impregnated into a fibrous substrate, and the fibrous substrate after the application or impregnation is heated to semi-cure the vinyl compound (1) or the vinyl composition (1).
 ビニル化合物(1)又はビニル組成物(1)を半硬化させるときの加熱温度(半硬化温度)と加熱時間(半硬化時間)は、ビニル化合物(1)又はビニル組成物(1)の上述の硬化条件(加熱温度と加熱時間)を考慮して、ビニル化合物(1)又はビニル組成物(1)が完全硬化しないように、適宜設定できる。 The heating temperature (semi-curing temperature) and heating time (semi-curing time) when semi-curing the vinyl compound (1) or the vinyl composition (1) can be appropriately set in consideration of the above-mentioned curing conditions (heating temperature and heating time) of the vinyl compound (1) or the vinyl composition (1) so that the vinyl compound (1) or the vinyl composition (1) is not completely cured.
 前記繊維質基材は、繊維状の基材であれば特に限定されず、公知のものであってよい。繊維質基材として、より具体的には、例えば、ガラス繊維等の無機質繊維の織布及び不織布、ポリエステル等の有機質繊維の織布及び不織布等が挙げられる。 The fibrous substrate is not particularly limited as long as it is a fibrous substrate, and may be any known substrate. More specific examples of fibrous substrates include woven and nonwoven fabrics of inorganic fibers such as glass fibers, and woven and nonwoven fabrics of organic fibers such as polyester.
<<樹脂付きフィルム>>
 本実施形態の樹脂付きフィルムは、ビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物を含む樹脂層と、支持フィルムとを備える。本実施形態の樹脂付きフィルムとして、より具体的には、例えば、前記樹脂層と、前記樹脂層の一方の面上又は両面上に設けられた前記支持フィルムと、を備える樹脂付きフィルムが挙げられる。本実施形態の複数枚の樹脂付きフィルムを用い、支持フィルムを取り除いて、重ね合わせて積層物とし、この積層物を加熱しながら加圧して成形し、一体化することにより、積層シートが得られる。本実施形態の樹脂付きフィルム中の樹脂層、及び前記樹脂層又は積層シートを用いて得られたプリント配線板(プリント配線板中の樹脂層)は、ビニル化合物(1)を用いていることにより、その熱伝導性が高く、且つ誘電損失が低い。
<<Film with resin>>
The resin-attached film of this embodiment comprises a resin layer containing a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and a support film. More specifically, the resin-attached film of this embodiment may be, for example, a resin-attached film comprising the resin layer and the support film provided on one or both sides of the resin layer. A laminate sheet is obtained by using a plurality of resin-attached films of this embodiment, removing the support film, stacking them together to form a laminate, and molding and integrating this laminate by heating and pressing. The resin layer in the resin-attached film of this embodiment and the printed wiring board (resin layer in the printed wiring board) obtained using the resin layer or laminate sheet have high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
 前記支持フィルムとしては、例えば、ポリエチレンテレフタレート(PET)製フィルム等が挙げられる。
 樹脂付きフィルムにおいて、樹脂層の両面上に支持フィルムが設けられている場合、これら支持フィルムは、互いに同一であってもよいし、互いに異なっていてもよい。本明細書においては、樹脂付きフィルムの場合に限らず、2層の支持フィルムが互いに異なるとは、2層の支持フィルムの材質及び厚さの少なくとも一方が互いに異なることを意味する。
The support film may be, for example, a polyethylene terephthalate (PET) film.
In the case of a resin-attached film, when a support film is provided on both sides of a resin layer, these support films may be the same as or different from each other. In this specification, not only in the case of a resin-attached film, but also in the case of two layers of support films being different from each other, it means that at least one of the material and thickness of the two layers of support films is different from each other.
 本実施形態の樹脂付きフィルムは、ビニル化合物(1)を溶媒に溶解させた溶液を前記支持フィルムに塗布するか、又はビニル組成物(1)、若しくはビニル組成物(1)を溶媒で希釈した希釈物を、前記支持フィルムに塗布した後、この塗布物の層を加熱し、この塗布物中のビニル化合物(1)又はビニル組成物(1)を半硬化させることにより、製造できる。このときのビニル化合物(1)又はビニル組成物(1)を半硬化させるときの条件は、先に説明したプリプレグの製造時の条件と同じである。 The resin-attached film of this embodiment can be produced by applying a solution of vinyl compound (1) dissolved in a solvent to the support film, or by applying vinyl composition (1) or a dilution of vinyl composition (1) diluted with a solvent to the support film, and then heating the layer of the coating to semi-cure the vinyl compound (1) or vinyl composition (1) in the coating. The conditions for semi-cure of vinyl compound (1) or vinyl composition (1) at this time are the same as those for producing the prepreg described above.
<<樹脂付き金属箔>>
 本実施形態の樹脂付き金属箔は、ビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物を含む樹脂層と、金属箔とを備える。本実施形態の樹脂付き金属箔として、より具体的には、例えば、前記樹脂層と、前記樹脂層の一方の面上又は両面上に設けられた前記金属箔と、を備える樹脂付き金属箔が挙げられる。例えば、本実施形態の樹脂付き金属箔を用いて、前記半硬化物をさらに硬化させて硬化物とし、金属箔をパターニングして回路を形成することで、プリント配線板とすることができる。また、本実施形態の樹脂付き金属箔を用いて、金属箔をパターニングして回路を形成し、このような回路を備える樹脂層同士を、回路の向きを揃えて積層し、加熱しながら加圧して、前記半硬化物をさらに硬化させることにより、ビニル化合物(1)の硬化物、又はビニル組成物(1)の硬化物を含む樹脂層を絶縁層として備えた多層のプリント配線板とすることができる。本実施形態の樹脂付き金属箔中の樹脂層、及び前記樹脂付き金属箔を用いて得られたプリント配線板(プリント配線板中の樹脂層)は、ビニル化合物(1)を用いていることにより、その熱伝導性が高く、且つ誘電損失が低い。
<<Metal foil with resin>>
The resin-attached metal foil of this embodiment comprises a resin layer containing a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and a metal foil. More specifically, the resin-attached metal foil of this embodiment may be, for example, a resin-attached metal foil comprising the resin layer and the metal foil provided on one or both sides of the resin layer. For example, the resin-attached metal foil of this embodiment may be used to further cure the semi-cured product to form a cured product, and the metal foil may be patterned to form a circuit, thereby forming a printed wiring board. In addition, the resin-attached metal foil of this embodiment may be used to pattern the metal foil to form a circuit, and resin layers having such circuits may be laminated together with the circuit orientation aligned, and the semi-cured product may be further cured by applying pressure while heating, thereby forming a multilayer printed wiring board having a resin layer containing a cured product of the vinyl compound (1) or a cured product of the vinyl composition (1) as an insulating layer. The resin layer in the resin-coated metal foil of this embodiment and the printed wiring board (resin layer in the printed wiring board) obtained using the resin-coated metal foil have high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
 前記金属箔としては、例えば、銅箔等が挙げられる。
 樹脂付き金属箔において、樹脂層の両面上に金属箔が設けられている場合、これら金属箔は、互いに同一であってもよいし、互いに異なっていてもよい。本明細書においては、樹脂付き金属箔の場合に限らず、2層の金属箔が互いに異なるとは、2層の金属箔の材質及び厚さの少なくとも一方が互いに異なることを意味する。
The metal foil may be, for example, a copper foil.
In the case of the resin-coated metal foil, when the metal foil is provided on both sides of the resin layer, these metal foils may be the same or different from each other. In this specification, not only in the case of the resin-coated metal foil, but also in the case of the two layers of metal foil being different from each other, it means that at least one of the material and the thickness of the two layers of metal foil is different from each other.
 本実施形態の樹脂付き金属箔は、前記支持フィルムに代えて前記金属箔を用いる点を除けば、前記樹脂付きフィルムの場合と同じ方法で製造できる。 The resin-coated metal foil of this embodiment can be manufactured in the same manner as the resin-coated film, except that the metal foil is used instead of the support film.
<<金属張積層板>>
 本実施形態の金属張積層板は、ビニル化合物(1)の硬化物、ビニル組成物(1)の硬化物、又はプリプレグ(1)の硬化物を含む絶縁層と、金属箔とを備える。本実施形態の金属張積層板として、より具体的には、例えば、前記絶縁層と、前記絶縁層の一方の面上又は両面上に設けられた前記金属箔と、を備える金属張積層板が挙げられる。本実施形態の金属張積層板は、例えば、その中の金属箔をパターニングして導体配線(回路)を形成することにより、プリント配線板とすることができる。さらに、このような複数枚のプリント配線板を、別途用意した絶縁層を介して積層し、加熱しながら加圧することにより、多層のプリント配線板とすることができる。本実施形態の金属張積層板中の絶縁層、及び前記金属張積層板を用いて得られたプリント配線板(プリント配線板中の絶縁層)は、ビニル化合物(1)を用いていることにより、その熱伝導性が高く、且つ誘電損失が低い。
<<Metal-clad laminate>>
The metal-clad laminate of this embodiment comprises an insulating layer containing a cured product of a vinyl compound (1), a cured product of a vinyl composition (1), or a cured product of a prepreg (1), and a metal foil. More specifically, the metal-clad laminate of this embodiment may be, for example, a metal-clad laminate comprising the insulating layer and the metal foil provided on one or both sides of the insulating layer. The metal-clad laminate of this embodiment can be made into a printed wiring board by, for example, patterning the metal foil therein to form a conductor wiring (circuit). Furthermore, a multi-layer printed wiring board can be made by stacking such a plurality of printed wiring boards via a separately prepared insulating layer and applying pressure while heating. The insulating layer in the metal-clad laminate of this embodiment and the printed wiring board obtained using the metal-clad laminate (the insulating layer in the printed wiring board) have high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
 本実施形態の金属張積層板が備える前記金属箔は、上述の樹脂付き金属箔が備える金属箔と同様である。
 金属張積層板において、絶縁層の両面上に金属箔が設けられている場合、これら金属箔は、互いに同一であってもよいし、互いに異なっていてもよい。
The metal foil provided in the metal-clad laminate of this embodiment is the same as the metal foil provided in the resin-coated metal foil described above.
In the metal-clad laminate, when metal foils are provided on both sides of the insulating layer, these metal foils may be the same as each other or different from each other.
 プリント配線板の積層時に別途用いる前記絶縁層は、公知のものであってもよいし、上述の樹脂付きフィルム中の前記樹脂層、又は複数枚の前記樹脂層の積層物である前記積層シートであってもよいし、上述のプリプレグ(1)、又は複数枚のプリプレグ(1)を重ね合わせて得られた前記積層板であってもよい。又は、これら樹脂層、積層シート、プリプレグ(1)、又は積層板において、ビニル化合物(1)又はビニル組成物(1)をさらに硬化させたものが、前記絶縁層であってもよい。 The insulating layer used separately when laminating the printed wiring board may be a known one, may be the resin layer in the resin-attached film described above, or the laminate sheet which is a laminate of a plurality of the resin layers, or may be the prepreg (1) described above, or the laminate obtained by overlapping a plurality of prepregs (1). Alternatively, the insulating layer may be the resin layer, laminate sheet, prepreg (1), or laminate obtained by further curing the vinyl compound (1) or vinyl composition (1).
 本実施形態の金属張積層板は、例えば、プリプレグ(1)の一方の面上又は両面上に、金属箔を積層し、これにより得られた積層物を加熱しながら加圧することにより、プリプレグ(1)中のビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物を、さらに硬化させて硬化物とし、絶縁層を形成するとともに、プリプレグ(1)と金属箔を融着させることにより、製造できる。
 本実施形態の金属張積層板は、例えば、ビニル化合物(1)又はビニル組成物(1)を用いて、先に説明した方法でプリプレグ(1)を製造し、このプリプレグ(1)を用いて上記の方法で製造してもよい。
 本実施形態の金属張積層板は、例えば、上述の樹脂付き金属箔を加熱して、前記樹脂層中のビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物をさらに硬化させることにより、ビニル化合物(1)の硬化物、又はビニル組成物(1)の硬化物を含む絶縁層を形成することでも、製造できる。
The metal-clad laminate of the present embodiment can be produced, for example, by laminating a metal foil on one or both sides of a prepreg (1), and applying pressure to the resulting laminate while heating, thereby further curing the vinyl compound (1) or a semi-cured product thereof, or the vinyl composition (1) or a semi-cured product thereof in the prepreg (1) to form a cured product, thereby forming an insulating layer and fusing the prepreg (1) and the metal foil.
The metal-clad laminate of the present embodiment may be produced, for example, by producing a prepreg (1) using the vinyl compound (1) or the vinyl composition (1) by the method described above, and then using this prepreg (1) by the method described above.
The metal-clad laminate of the present embodiment can also be produced, for example, by heating the above-mentioned resin-attached metal foil to further cure the vinyl compound (1) or a semi-cured product thereof, or the vinyl composition (1) or a semi-cured product thereof in the resin layer, thereby forming an insulating layer containing a cured product of the vinyl compound (1) or a cured product of the vinyl composition (1).
<<プリント配線板>>
 本実施形態のプリント配線板は、ビニル化合物(1)の硬化物、ビニル組成物(1)の硬化物、又はプリプレグ(1)の硬化物を含む絶縁層と、導体配線とを備える。本実施形態のプリント配線板として、より具体的には、例えば、前記絶縁層と、前記絶縁層の一方の面上又は両面上に設けられた前記導体配線と、を備えるプリント配線板が挙げられる。本実施形態の複数枚のプリント配線板を、別途用意した絶縁層を介して積層し、加熱しながら加圧することにより、多層のプリント配線板とすることができる。本実施形態のプリント配線板(プリント配線板中の絶縁層)は、ビニル化合物(1)を用いていることにより、その熱伝導性が高く、且つ誘電損失が低い。
<<Printed wiring board>>
The printed wiring board of this embodiment comprises an insulating layer containing a cured product of a vinyl compound (1), a cured product of a vinyl composition (1), or a cured product of a prepreg (1), and a conductor wiring. More specifically, the printed wiring board of this embodiment may be, for example, a printed wiring board comprising the insulating layer and the conductor wiring provided on one or both sides of the insulating layer. A multi-layer printed wiring board can be formed by stacking a plurality of printed wiring boards of this embodiment via a separately prepared insulating layer and applying pressure while heating. The printed wiring board of this embodiment (the insulating layer in the printed wiring board) has high thermal conductivity and low dielectric loss due to the use of the vinyl compound (1).
 前記導体配線の材質は、上述の金属張積層板が備える金属箔の金属と同じである。本実施形態のプリント配線板の積層時に別途用いる前記絶縁層は、先に説明した絶縁層である。
 プリント配線板において、絶縁層の両面上に導体配線が設けられている場合、これら導体配線の材質及び厚さは、互いに同一であってもよいし、互いに異なっていてもよい。
The material of the conductor wiring is the same as the metal of the metal foil included in the above-mentioned metal-clad laminate. The insulating layer used separately when laminating the printed wiring board of this embodiment is the insulating layer described above.
In the case where conductor wiring is provided on both sides of an insulating layer in a printed wiring board, the material and thickness of these conductor wirings may be the same as or different from each other.
 本実施形態のプリント配線板は、例えば、上述の金属張積層板において、金属箔をパターニングして導体配線(回路)を形成することにより、製造できる。
 本実施形態のプリント配線板は、例えば、上述の樹脂付き金属箔を加熱して、前記樹脂層中のビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物をさらに硬化させることにより、ビニル化合物(1)の硬化物、又はビニル組成物(1)の硬化物を含む絶縁層を形成し、さらに、金属箔をパターニングして導体配線(回路)を形成することでも、製造できる。
 金属箔は、エッチング等の公知の方法でパターニングできる。
The printed wiring board of this embodiment can be produced, for example, by patterning the metal foil in the above-mentioned metal-clad laminate to form conductor wiring (circuits).
The printed wiring board of the present embodiment can also be produced by, for example, heating the above-mentioned resin-attached metal foil to further cure the vinyl compound (1) or a semi-cured product thereof, or the vinyl composition (1) or a semi-cured product thereof in the resin layer, thereby forming an insulating layer containing a cured product of the vinyl compound (1) or a cured product of the vinyl composition (1), and then patterning the metal foil to form a conductor wiring (circuit).
The metal foil can be patterned by known methods such as etching.
 図1は、ビニル化合物(1)を用いて得られた本実施形態の積層構造体の一例を模式的に示す断面図である。なお、以降の説明で用いる図は、本発明の特徴を判り易くするために、便宜上、要部となる部分を拡大して示している場合があり、各構成要素の寸法比率等が実際と同じであるとは限らない。 FIG. 1 is a cross-sectional view showing a schematic example of a laminated structure of the present embodiment obtained using vinyl compound (1). Note that the figures used in the following explanation may show enlarged essential parts for the sake of convenience in order to make the features of the present invention easier to understand, and the dimensional ratios of each component may not necessarily be the same as in reality.
 ここに示す積層構造体1は、第1層11と、第1層11の一方の面11a上に設けられた第2層12と、を備えて構成されている。第1層11は、ビニル化合物(1)を用いて得られた層である。第2層12は、積層構造体1の種類に応じて選択される。第1層11及び第2層12はいずれも、フィルム状又はシート状である。第2層12は、第1層11の一方の面11aの全域に設けられていてもよいし、一部の領域に設けられていてもよい。 The laminated structure 1 shown here is configured to include a first layer 11 and a second layer 12 provided on one surface 11a of the first layer 11. The first layer 11 is a layer obtained using a vinyl compound (1). The second layer 12 is selected according to the type of laminated structure 1. Both the first layer 11 and the second layer 12 are in the form of a film or sheet. The second layer 12 may be provided over the entire area of one surface 11a of the first layer 11, or may be provided in a partial area.
 第1層11が、ビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物を含む樹脂層であり、第2層12が支持フィルムである場合の積層構造体1は、樹脂付きフィルムである。
 第1層11が、ビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物を含む樹脂層であり、第2層12が金属箔である場合の積層構造体1は、樹脂付き金属箔である。
 第1層11が、ビニル化合物(1)の硬化物、ビニル組成物(1)の硬化物、又はプリプレグ(1)の硬化物を含む絶縁層であり、第2層12が金属箔である場合の積層構造体1は、金属張積層板である。
In the case where the first layer 11 is a resin layer containing a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and the second layer 12 is a support film, the laminate structure 1 is a resin-attached film.
In the case where the first layer 11 is a resin layer containing a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and the second layer 12 is a metal foil, the laminate structure 1 is a resin-coated metal foil.
When the first layer 11 is an insulating layer containing a cured product of a vinyl compound (1), a cured product of a vinyl composition (1), or a cured product of a prepreg (1), and the second layer 12 is a metal foil, the laminate structure 1 is a metal-clad laminate.
 図2は、ビニル化合物(1)を用いて得られた本実施形態の積層構造体の他の例を模式的に示す断面図である。なお、図2以降の図において、既に説明済みの図に示すものと同じ構成要素には、その説明済みの図の場合と同じ符号を付し、その詳細な説明は省略する。 FIG. 2 is a cross-sectional view showing a schematic diagram of another example of the laminated structure of this embodiment obtained using vinyl compound (1). In FIG. 2 and subsequent figures, the same components as those shown in the figures already described are given the same reference numerals as in the figures already described, and detailed description thereof will be omitted.
 ここに示す積層構造体2は、第1層11と、第1層11の一方の面11a上に設けられた第2層22と、を備えて構成されている。第2層22は線状であり、図2において、積層構造体2の断面は、第2層22の線長方向に沿った断面を含んで形成されている。線状の第2層22の数は、1本であってもよいし、2本以上であってもよい。積層構造体2は、フィルム状の第2層12に代えて、線状の第2層22を備えている点を除けば、図1に示す積層構造体1と同じである。
 第1層11が、ビニル化合物(1)の硬化物、ビニル組成物(1)の硬化物、又はプリプレグ(1)の硬化物を含む絶縁層であり、第2層22が導体配線である場合の積層構造体2は、プリント配線板である。
The laminated structure 2 shown here is configured to include a first layer 11 and a second layer 22 provided on one surface 11a of the first layer 11. The second layer 22 is linear, and in FIG. 2, the cross section of the laminated structure 2 is formed to include a cross section along the linear length direction of the second layer 22. The number of linear second layers 22 may be one or may be two or more. The laminated structure 2 is the same as the laminated structure 1 shown in FIG. 1, except that the laminated structure 2 includes a linear second layer 22 instead of the film-like second layer 12.
In the case where the first layer 11 is an insulating layer containing a cured product of a vinyl compound (1), a cured product of a vinyl composition (1), or a cured product of a prepreg (1), and the second layer 22 is a conductor wiring, the laminate structure 2 is a printed wiring board.
 図1~図2に示す積層構造体1及び積層構造体2はいずれも、第1層11の他方の面11b上に何も備えていないが、第2層12又は第2層22と同様の層を備えていてもよい。 Both the laminated structure 1 and the laminated structure 2 shown in Figures 1 and 2 have nothing on the other surface 11b of the first layer 11, but may have a layer similar to the second layer 12 or the second layer 22.
 図3は、ビニル化合物(1)を用いて得られた本実施形態の積層構造体のさらに他の例を模式的に示す断面図である。
 ここに示す積層構造体3は、第1層11と、第1層11の一方の面11a上に設けられた第2層12と、第1層11の他方の面11b上に設けられた第3層13と、を備えて構成されている。第3層13は、フィルム状又はシート状であり、第2層12と同様に、積層構造体1の種類に応じて選択される。第1層11の他方の面11b上での第3層13の配置の態様は、第1層11の一方の面11a上での第2層12の配置の態様と同様である。第3層13の組成、形状、厚さ及び大きさはそれぞれ、第2層12の組成、形状、厚さ及び大きさと同一であってもよいし、異なっていてもよい。例えば、第3層13は、第1層11の他方の面11bの全域に設けられていてもよいし、一部の領域に設けられていてもよい。
FIG. 3 is a cross-sectional view that illustrates still another example of the laminate structure of the present embodiment obtained by using the vinyl compound (1).
The laminated structure 3 shown here is configured to include a first layer 11, a second layer 12 provided on one surface 11a of the first layer 11, and a third layer 13 provided on the other surface 11b of the first layer 11. The third layer 13 is in the form of a film or sheet, and is selected according to the type of the laminated structure 1, similar to the second layer 12. The arrangement of the third layer 13 on the other surface 11b of the first layer 11 is similar to the arrangement of the second layer 12 on the one surface 11a of the first layer 11. The composition, shape, thickness, and size of the third layer 13 may be the same as or different from the composition, shape, thickness, and size of the second layer 12. For example, the third layer 13 may be provided over the entire area of the other surface 11b of the first layer 11, or may be provided in a partial area.
 第1層11が、ビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物を含む樹脂層であり、第2層12及び第3層13が支持フィルムである場合の積層構造体3は、樹脂付きフィルムである。
 第1層11が、ビニル化合物(1)若しくはその半硬化物、又はビニル組成物(1)若しくはその半硬化物を含む樹脂層であり、第2層12及び第3層13が金属箔である場合の積層構造体3は、樹脂付き金属箔である。
 第1層11が、ビニル化合物(1)の硬化物、ビニル組成物(1)の硬化物、又はプリプレグ(1)の硬化物を含む絶縁層であり、第2層12及び第3層13が金属箔である場合の積層構造体3は、金属張積層板である。
In the case where the first layer 11 is a resin layer containing a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and the second layer 12 and the third layer 13 are support films, the laminated structure 3 is a resin-attached film.
In the case where the first layer 11 is a resin layer containing a vinyl compound (1) or a semi-cured product thereof, or a vinyl composition (1) or a semi-cured product thereof, and the second layer 12 and the third layer 13 are metal foils, the laminated structure 3 is a resin-coated metal foil.
In the case where the first layer 11 is an insulating layer containing a cured product of a vinyl compound (1), a cured product of a vinyl composition (1), or a cured product of a prepreg (1), and the second layer 12 and the third layer 13 are metal foils, the laminated structure 3 is a metal-clad laminate.
 図4は、ビニル化合物(1)を用いて得られた本実施形態の積層構造体のさらに他の例を模式的に示す断面図である。
 ここに示す積層構造体4は、第1層11と、第1層11の一方の面11a上に設けられた第2層22と、第1層11の他方の面11b上に設けられた第3層23と、を備えて構成されている。第3層23は線状であり、図4において、積層構造体4の断面は、第2層22の線長方向に沿った断面と、第3層23の線長方向に沿った断面と、をともに含んで形成されている。第1層11の他方の面11b上での第3層23の配置の態様は、第1層11の一方の面11a上での第2層22の配置の態様と同様である。第3層23の組成、長さ、太さ及び本数はそれぞれ、第2層22の組成、長さ、太さ及び本数と同一であってもよいし、異なっていてもよい。例えば、線状の第3層23の数は、1本であってもよいし、2本以上であってもよい。
 第1層11が、ビニル化合物(1)の硬化物、ビニル組成物(1)の硬化物、又はプリプレグ(1)の硬化物を含む絶縁層であり、第2層22及び第3層23が導体配線である場合の積層構造体4は、プリント配線板である。
FIG. 4 is a cross-sectional view that illustrates still another example of the laminate structure of the present embodiment obtained by using the vinyl compound (1).
The laminated structure 4 shown here is configured to include a first layer 11, a second layer 22 provided on one surface 11a of the first layer 11, and a third layer 23 provided on the other surface 11b of the first layer 11. The third layer 23 is linear, and in FIG. 4, the cross section of the laminated structure 4 is formed to include both a cross section along the linear length direction of the second layer 22 and a cross section along the linear length direction of the third layer 23. The arrangement of the third layer 23 on the other surface 11b of the first layer 11 is similar to the arrangement of the second layer 22 on one surface 11a of the first layer 11. The composition, length, thickness, and number of the third layer 23 may be the same as or different from the composition, length, thickness, and number of the second layer 22. For example, the number of linear third layers 23 may be one or more.
In the case where the first layer 11 is an insulating layer containing a cured product of a vinyl compound (1), a cured product of a vinyl composition (1), or a cured product of a prepreg (1), and the second layer 22 and the third layer 23 are conductor wirings, the laminate structure 4 is a printed wiring board.
 以下、本発明を実施例によりさらに詳細に説明するが、本発明はこれら実施例に限定されるものではない。
 なお、以下の実施例において、「室温」とは、15~40℃の温度範囲を意味する。
The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples.
In the following examples, "room temperature" refers to a temperature range of 15 to 40°C.
 ビニル化合物の融点の測定条件を示す。
 ビニル化合物を充填したガラス製パンを示差走査熱量測定装置(METTLER TLEDO製FP84HT)を用い、50℃で2分間保持した後、1分あたり5℃昇温させ、250℃で2分間保持し、吸熱ピーク温度を融点とした。吸熱ピークが複数ある場合には、低温側の吸熱ピーク温度を融点とした。
The conditions for measuring the melting point of vinyl compounds are shown below.
A glass pan filled with a vinyl compound was kept at 50° C. for 2 minutes using a differential scanning calorimeter (FP84HT manufactured by METTLER TLEDO), and then the temperature was raised by 5° C. per minute, and the pan was kept at 250° C. for 2 minutes, and the endothermic peak temperature was taken as the melting point. When there were multiple endothermic peaks, the endothermic peak temperature on the lower side was taken as the melting point.
 ビニル化合物の溶解度の測定条件を示す。
 室温にて、ビニル化合物50mgをスクリュー管に仕込み、室温で保管していたТHFを滴下し、モノマーが完溶した時点の溶液の重量を測定した。50mg/溶液の重量(mg)の値を溶解度(wt%)とした。
The conditions for measuring the solubility of vinyl compounds are shown below.
At room temperature, 50 mg of a vinyl compound was placed in a screw tube, THF stored at room temperature was added dropwise, and the weight of the solution was measured when the monomer was completely dissolved. The value of 50 mg/weight (mg) of the solution was taken as the solubility (wt%).
 硬化物の試験条件を示す。
(1)熱拡散率
 熱拡散率測定装置「ai-phase mobile」(株式会社アイフェイズ製)を用いて、室温でTWA法にて測定した。
The test conditions for the cured product are as follows.
(1) Thermal Diffusivity The thermal diffusivity was measured by the TWA method at room temperature using a thermal diffusivity measuring device "ai-phase mobile" (manufactured by ai-phase Corporation).
実施例1
 温度計、冷却管及び攪拌装置を備えた500mLの四つ口フラスコに、トリメチル1,3,5-ベンゼントリカルボキシレート24.0g、4-(トランス-4-ヒドロキシシクロヘキシル)フェノール55.3g、ジブチルスズオキシド1.2g、p-クロロトルエン120mLを加えて、内温約180℃で15時間反応させた。
Example 1
Into a 500 mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, 24.0 g of trimethyl 1,3,5-benzenetricarboxylate, 55.3 g of 4-(trans-4-hydroxycyclohexyl)phenol, 1.2 g of dibutyltin oxide, and 120 mL of p-chlorotoluene were added and reacted at an internal temperature of about 180° C. for 15 hours.
 反応終了後、室温まで冷却し、メタノール36mLを仕込み、2時間撹拌した後に、析出した固体を濾取してメタノールで洗浄した。得られた固体を減圧条件下で乾燥させ、1,3,5-トリス(トランス-4-(4-ヒドロキシフェニル)シクロヘキシル) 1,3,5-ベンゼントリカルボキシレートを34.8g得た。 After the reaction was completed, the mixture was cooled to room temperature, 36 mL of methanol was added, and the mixture was stirred for 2 hours. The precipitated solid was then filtered and washed with methanol. The solid was dried under reduced pressure to obtain 34.8 g of 1,3,5-tris(trans-4-(4-hydroxyphenyl)cyclohexyl) 1,3,5-benzenetricarboxylate.
 温度計、冷却管及び攪拌装置を備えた200mLの四つ口フラスコに、1,3,5-トリス(トランス-4-(4-ヒドロキシフェニル)シクロヘキシル) 1,3,5-ベンゼントリカルボキシレート5.0g、2,6-ジ(tert-ブチル)-p-クレゾール0.05g、炭酸カリウム7.2g、ヨウ化ナトリウム0.3g、N,N-ジメチルホルムアミド35mL及びビニルベンジルクロライド(m、p位置異性体の混合物)4.6gを仕込み、内温約60℃で6時間反応させた。 In a 200mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, 5.0g of 1,3,5-tris(trans-4-(4-hydroxyphenyl)cyclohexyl) 1,3,5-benzenetricarboxylate, 0.05g of 2,6-di(tert-butyl)-p-cresol, 7.2g of potassium carbonate, 0.3g of sodium iodide, 35mL of N,N-dimethylformamide, and 4.6g of vinylbenzyl chloride (mixture of m,p positional isomers) were charged and reacted at an internal temperature of approximately 60°C for 6 hours.
 反応終了後、室温まで冷却し、水40mLとヘキサン30mLを仕込み、10分撹拌した後に、析出した固体を濾取してヘキサン、水、メタノールで洗浄した。得られた固体をトルエンに溶解させて、水で洗浄した。得られた溶液から溶液を一部減圧除去した後に、得られた濃縮液にメタノールを加えて撹拌した後、析出した固体を濾取して減圧条件下で乾燥させ、ビニル化合物1を4.5g得た。純度:96.5%(液体クロマトグラフィー面積百分率値)。 After the reaction was completed, the mixture was cooled to room temperature, 40 mL of water and 30 mL of hexane were added, and the mixture was stirred for 10 minutes. The precipitated solid was then filtered and washed with hexane, water, and methanol. The resulting solid was dissolved in toluene and washed with water. After some of the solvent was removed from the resulting solution under reduced pressure, methanol was added to the resulting concentrated liquid and stirred. The precipitated solid was then filtered and dried under reduced pressure to obtain 4.5 g of vinyl compound 1. Purity: 96.5% (liquid chromatography area percentage value).
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
実施例2
 温度計、冷却管及び攪拌装置を備えた300mLの四つ口フラスコに、1,3,5-ベンゼントリカルボニル トリクロライド2.7g、ハイドロキノン6.6g、ピリジン3mL、テトラヒドロフラン130mLを加えて、室温で3日間反応させた。
Example 2
Into a 300 mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, 2.7 g of 1,3,5-benzenetricarbonyl trichloride, 6.6 g of hydroquinone, 3 mL of pyridine, and 130 mL of tetrahydrofuran were added and reacted at room temperature for 3 days.
 反応終了後、溶媒を留去し、得られた固体をシリカゲルカラムで精製し、1,3,5-トリス(4-ヒドロキシフェニル) 1,3,5-ベンゼントリカルボキシレートを1.3g得た。 After the reaction was completed, the solvent was distilled off and the resulting solid was purified using a silica gel column to obtain 1.3 g of 1,3,5-tris(4-hydroxyphenyl) 1,3,5-benzenetricarboxylate.
 温度計、冷却管及び攪拌装置を備えた100mLの四つ口フラスコに、1,3,5-トリス(4-ヒドロキシフェニル)1,3,5-ベンゼントリカルボキシレート1.3g、2,6-ジ(tert-ブチル)-p-クレゾール0.01g、炭酸カリウム2.8g、ヨウ化ナトリウム0.1g、N,N-ジメチルホルムアミド25mL及びビニルベンジルクロライド(m、p位置異性体の混合物)1.9gを仕込み、内温約60℃で13時間反応させた。 In a 100mL four-neck flask equipped with a thermometer, condenser, and stirrer, 1.3g of 1,3,5-tris(4-hydroxyphenyl)-1,3,5-benzenetricarboxylate, 0.01g of 2,6-di(tert-butyl)-p-cresol, 2.8g of potassium carbonate, 0.1g of sodium iodide, 25mL of N,N-dimethylformamide, and 1.9g of vinylbenzyl chloride (mixture of m,p positional isomers) were charged and reacted at an internal temperature of approximately 60°C for 13 hours.
 反応終了後、室温まで冷却し、水40mLを仕込み、10分撹拌した後に、析出した固体を濾取してヘキサン、水、メタノールで洗浄した。得られた固体をトルエンに溶解させてメタノールを加えて撹拌した後、析出した固体を濾取して減圧条件下で乾燥させ、ビニル化合物2を0.4g得た。純度:70.6%(液体クロマトグラフィー面積百分率値)。 After the reaction was completed, the mixture was cooled to room temperature, 40 mL of water was added, and the mixture was stirred for 10 minutes. The precipitated solid was then filtered and washed with hexane, water, and methanol. The resulting solid was dissolved in toluene, methanol was added, and the mixture was stirred. The precipitated solid was then filtered and dried under reduced pressure to obtain 0.4 g of vinyl compound 2. Purity: 70.6% (liquid chromatography area percentage value).
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
実施例3
 温度計、冷却管および攪拌装置を備えた300mLの四つ口フラスコに、トリメチロールエタン1.8g、6-ヒドロキシ-2-ナフトエ酸メチル13.7g、ジブチルスズオキシド1.1g、p-クロロトルエン150mLを加えて、内温約180℃で14時間反応させた。
Example 3
Into a 300 mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, 1.8 g of trimethylolethane, 13.7 g of methyl 6-hydroxy-2-naphthoate, 1.1 g of dibutyltin oxide, and 150 mL of p-chlorotoluene were added and reacted at an internal temperature of about 180° C. for 14 hours.
 反応終了後、室温まで冷却し、反応液の上澄みをデカンテーションで除き、固体をメタノールで洗浄した。得られた固体を減圧条件下で乾燥させ、固体Aを得た。洗浄に用いたメタノールに水を加えて析出した固体を濾取して、減圧条件下で乾燥させ、固体Bを得た。固体Aと固体Bとを合わせて、化合物1を6.0g得た。 After the reaction was completed, the reaction solution was cooled to room temperature, the supernatant was removed by decantation, and the solid was washed with methanol. The resulting solid was dried under reduced pressure to obtain solid A. Water was added to the methanol used for washing, and the precipitated solid was collected by filtration and dried under reduced pressure to obtain solid B. Solid A and solid B were combined to obtain 6.0 g of compound 1.
 温度計、冷却管および攪拌装置を備えた200mLの四つ口フラスコに、化合物1を6.0g、2,6-ジ(tert-ブチル)-p-クレゾール0.06g、炭酸カリウム9.8g、ヨウ化ナトリウム0.3g、N,N-ジメチルホルムアミド65mL及びビニルベンジルクロライド(m、p位置異性体の混合物)7.3gを仕込み、内温約60℃で8時間反応させた。 6.0 g of compound 1, 0.06 g of 2,6-di(tert-butyl)-p-cresol, 9.8 g of potassium carbonate, 0.3 g of sodium iodide, 65 mL of N,N-dimethylformamide, and 7.3 g of vinylbenzyl chloride (mixture of m,p positional isomers) were placed in a 200 mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, and the mixture was allowed to react for 8 hours at an internal temperature of approximately 60°C.
 反応終了後、室温まで冷却し、水40mLとヘキサン30mLを仕込み、撹拌した後に、析出した固体を濾取してヘキサン、水、メタノールで洗浄した。得られた固体をトルエンに溶解させて、水で洗浄した。得られた溶液から溶液を一部減圧除去した後に、得られた濃縮液にメタノールを加えて撹拌した後、析出した固体を濾取して減圧条件下で乾燥させ、ビニル化合物3を4.0g得た。純度:73.4%(液体クロマトグラフィー面積百分率値)。 After the reaction was completed, the mixture was cooled to room temperature, 40 mL of water and 30 mL of hexane were added, and the mixture was stirred. The precipitated solid was then filtered and washed with hexane, water, and methanol. The resulting solid was dissolved in toluene and washed with water. After some of the solvent was removed from the resulting solution under reduced pressure, methanol was added to the resulting concentrated liquid and stirred. The precipitated solid was then filtered and dried under reduced pressure to obtain 4.0 g of vinyl compound 3. Purity: 73.4% (liquid chromatography area percentage value).
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
比較例1
 温度計、冷却管及び攪拌装置を備えた200mLの四つ口フラスコに、4,4’-ジヒドロキシ-2,2’,3,3’,5,5’-ヘキサメチルビフェニル6.0g、2,6-ジ(tert-ブチル)-p-クレゾール0.06g、炭酸カリウム12g、ヨウ化ナトリウム1.3g、N,N-ジメチルホルムアミド34mL及び4-ビニルベンジルクロライド10gを仕込み、内温約60℃で3時間反応させた。反応終了後、トルエン121gと水34mLを加えて撹拌し、ろ過して不溶物を除去した。得られた溶液を分液し、水で3回分液洗浄した。得られた溶液をろ過して不溶物を除去した後、トルエンを減圧除去した。得られた固体にメタノール56mLと2,6-ジ(tert-ブチル)-p-クレゾール0.07gを加えて室温で撹拌した。懸濁液中の固体を濾取し、減圧条件下で乾燥させ、ビニル化合物4を9.4g得た。純度:99.1%(液体クロマトグラフィー面積百分率値)。
Comparative Example 1
In a 200 mL four-neck flask equipped with a thermometer, a condenser, and a stirrer, 6.0 g of 4,4'-dihydroxy-2,2',3,3',5,5'-hexamethylbiphenyl, 0.06 g of 2,6-di(tert-butyl)-p-cresol, 12 g of potassium carbonate, 1.3 g of sodium iodide, 34 mL of N,N-dimethylformamide, and 10 g of 4-vinylbenzyl chloride were charged and reacted for 3 hours at an internal temperature of about 60°C. After the reaction was completed, 121 g of toluene and 34 mL of water were added and stirred, and the mixture was filtered to remove insoluble matter. The resulting solution was separated and washed three times with water. The resulting solution was filtered to remove insoluble matter, and then the toluene was removed under reduced pressure. 56 mL of methanol and 0.07 g of 2,6-di(tert-butyl)-p-cresol were added to the obtained solid and stirred at room temperature. The solid in the suspension was collected by filtration and dried under reduced pressure to obtain 9.4 g of vinyl compound 4. Purity: 99.1% (liquid chromatography area percentage value).
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 実施例1、実施例2、実施例3、及び比較例1で得たビニル化合物を、金型の板状の中空部に入れ、減圧下で1.5MPaの圧力で加圧しながら表1に示す一次硬化温度で1時間加熱した後、1.5MPaの圧力をかけながら180℃で2時間加熱することにより、厚さ150~250μmの硬化物を得た。 The vinyl compounds obtained in Examples 1, 2, 3, and Comparative Example 1 were placed in the hollow plate of a mold, and heated for 1 hour at the primary curing temperature shown in Table 1 while applying a pressure of 1.5 MPa under reduced pressure. After that, the compounds were heated for 2 hours at 180°C while applying a pressure of 1.5 MPa to obtain a cured product having a thickness of 150 to 250 μm.
 ビニル化合物の融点、及び、硬化物の熱拡散率の値を表1に示す。
Figure JPOXMLDOC01-appb-T000024
The melting points of the vinyl compounds and the thermal diffusivities of the cured products are shown in Table 1.
Figure JPOXMLDOC01-appb-T000024
 本発明は、通信機器中のプリント配線板に利用可能であり、通信機器が扱うデータの量が多く、発熱量が多くなることが想定される場合のプリント配線板に利用するのに、特に好適である。 The present invention can be used for printed wiring boards in communication devices, and is particularly suitable for use in printed wiring boards in which the communication devices handle large amounts of data and are expected to generate a large amount of heat.
 1、2、3、4・・積層構造体
 11・・・・・・・第1層
 11a・・・・・・第1層の一方の面
 11b・・・・・・第1層の他方の面
 12、22・・・・第2層
 13、23・・・・第3層
1, 2, 3, 4...Laminated structure 11...First layer 11a...One surface of the first layer 11b...Other surface of the first layer 12, 22... Second layer 13, 23...Third layer

Claims (12)

  1.  式(1)又は式(2)で表されるビニル化合物。
    Figure JPOXMLDOC01-appb-C000001
    (式中、
     Rは、アクリロイル基、メタクリロイル基、又はビニルベンジル基であり、複数のRは、互いに同一でも異なっていてもよく、
     Aは、置換若しくは無置換のm価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換のm価のシクロアルカン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結されたm価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結されたm価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結されたm価の基、置換若しくは無置換のm価の鎖状飽和脂肪族炭化水素基、R(OR-*)で表される基、R(R-*)で表される基、RC(OR-*)で表される基、又はRC(R-*)で表される基であり、
     Rは、置換若しくは無置換の3価の芳香族基(ただし、含窒素芳香族複素環基を除く。)であり、
     Rは、置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基、**-R(R-*で表される基、又は**-(RO)-*で表される基であり、複数のRは、互いに同一でも異なっていてもよく、
     Rは、水素原子又はメチル基であり、
     Rは、置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基であり、複数のRは、互いに同一でも異なっていてもよく、
     Rは、置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)であり、pが2又は3である場合、複数のRは、互いに同一でも異なっていてもよく、
     Rは、置換若しくは無置換の2価の鎖状飽和脂肪族炭化水素基であり、複数のRは、互いに同一でも異なっていてもよく、
     pは、1~3の整数であり、
     qは、1~3の整数であり、
     *は、Xとの結合位置であり、
     **は、Rに結合している酸素原子との結合位置、Rとの結合位置、RCに結合している酸素原子との結合位置、又はRCとの結合位置である。
     Aは、置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換の2価のシクロアルカン基、置換若しくは無置換の2価のシクロアルケン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、*-B-**で表される基、*-B-**で表される基、又*-B-**で表される基であり、複数のAは、互いに同一でも異なっていてもよく、
     B~Bは、それぞれ、置換若しくは無置換の2価の芳香族基(ただし、含窒素芳香族複素環基を除く。)、置換若しくは無置換の2価のシクロアルカン基、置換若しくは無置換の2価のシクロアルケン基、2以上の置換若しくは無置換の芳香族環(ただし、含窒素芳香族複素環を除く。)が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルカン環が単結合で連結された2価の基、2以上の置換若しくは無置換のシクロアルケン環が単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環とが単結合で連結された2価の基、1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基、又は1以上の置換若しくは無置換の芳香族環と1以上の置換若しくは無置換のシクロアルカン環と1以上の置換若しくは無置換のシクロアルケン環とが単結合で連結された2価の基であり、
     Y~Yは、それぞれ、エステル基、カルボニル基、又はエーテル基であり、
     *は、Xとの結合位置であり、
     **は、式(1)中のアクリロイルオキシ基、メタクリロイルオキシ基、若しくはビニルベンジルオキシ基との結合位置、又は式(2)中のアクリロイルオキシアルコキシ基、メタクリロイルオキシアルコキシ基、若しくはビニルベンジルオキシアルコキシ基との結合位置であり、
     Xは、単結合、エステル基、カルボニル基、又はエーテル基であり、複数のXは、互いに同一でも異なっていてもよく、
     mは、3~6の整数であり、
     nは、1~20の整数であり、複数のnは、互いに同一でも異なっていてもよい。)
    A vinyl compound represented by formula (1) or formula (2):
    Figure JPOXMLDOC01-appb-C000001
    (Wherein,
    R is an acryloyl group, a methacryloyl group, or a vinylbenzyl group, and a plurality of R may be the same or different from each other;
    A 1 is a substituted or unsubstituted m-valent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted m-valent cycloalkane group, an m-valent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocyclic rings) are linked by a single bond, an m-valent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, an m-valent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a substituted or unsubstituted m-valent linear saturated aliphatic hydrocarbon group, a group represented by R 1 (OR 2 -*) 3 , a group represented by R 1 (R 2 -*) 3 , a group represented by R 3 C(OR 2 -*) 3 , or a group represented by R 3 C(R 2 -*) 3 ;
    R 1 is a substituted or unsubstituted trivalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups);
    R 2 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group, a group represented by **-R 4 (R 5 ) p R 4 -*, or a group represented by **-(R 6 O) q R 6 -*, and multiple R 2 may be the same or different from each other;
    R3 is a hydrogen atom or a methyl group;
    R4 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group, and multiple R4s may be the same or different from each other.
    R5 is a substituted or unsubstituted divalent aromatic group (excluding a nitrogen-containing aromatic heterocyclic group), and when p is 2 or 3, multiple R5s may be the same or different from each other;
    R 6 is a substituted or unsubstituted divalent linear saturated aliphatic hydrocarbon group, and multiple R 6s may be the same or different from each other;
    p is an integer from 1 to 3;
    q is an integer from 1 to 3;
    * is the bonding position to X1 ,
    ** represents the bonding position to the oxygen atom bonded to R 1 , the bonding position to R 1 , the bonding position to the oxygen atom bonded to R 3 C, or the bonding position to R 3 C.
    A2 represents a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles), one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a group represented by *-B 1 Y 1 B 2 -**, a group represented by *-B 1 Y 1 B 2 Y 2 B 3 -**, or a group represented by *-B 1 Y 1 B 2 Y 2 B 3 Y 3 B 4 -**,
    B 1 to B 4 each represent a substituted or unsubstituted divalent aromatic group (excluding nitrogen-containing aromatic heterocyclic groups), a substituted or unsubstituted divalent cycloalkane group, a substituted or unsubstituted divalent cycloalkene group, a divalent group in which two or more substituted or unsubstituted aromatic rings (excluding nitrogen-containing aromatic heterocycles) are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkane rings are linked by a single bond, a divalent group in which two or more substituted or unsubstituted cycloalkene rings are linked by a single bond, one or more substituted or unsubstituted aromatic rings and one or more a divalent group in which one or more substituted or unsubstituted aromatic rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, a divalent group in which one or more substituted or unsubstituted cycloalkane rings and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond, or a divalent group in which one or more substituted or unsubstituted aromatic rings, one or more substituted or unsubstituted cycloalkane rings, and one or more substituted or unsubstituted cycloalkene rings are linked by a single bond,
    Y 1 to Y 3 each represent an ester group, a carbonyl group, or an ether group;
    * is the bonding position to X1 ,
    ** represents the bonding position to the acryloyloxy group, methacryloyloxy group, or vinylbenzyloxy group in formula (1), or the bonding position to the acryloyloxyalkoxy group, methacryloyloxyalkoxy group, or vinylbenzyloxyalkoxy group in formula (2),
    X 1 is a single bond, an ester group, a carbonyl group, or an ether group, and a plurality of X 1 may be the same or different from each other;
    m is an integer from 3 to 6,
    n is an integer from 1 to 20, and multiple n's may be the same or different.
  2.  A及びAは、炭素数が14以下の基である(ただし、前記炭素数は、置換基の炭素数を含まない。)、請求項1に記載のビニル化合物。 The vinyl compound according to claim 1, wherein A 1 and A 2 are groups having 14 or less carbon atoms (provided that the number of carbon atoms does not include the number of carbon atoms of the substituents).
  3.  プリント配線板に用いられる、請求項1に記載のビニル化合物。 The vinyl compound according to claim 1, which is used in printed wiring boards.
  4.  請求項1に記載のビニル化合物を含有する、ビニル組成物。 A vinyl composition containing the vinyl compound according to claim 1.
  5.  請求項1~3のいずれか1項に記載のビニル化合物、又は請求項4に記載のビニル組成物を硬化してなる、ビニル樹脂硬化物。 A vinyl resin cured product obtained by curing the vinyl compound according to any one of claims 1 to 3 or the vinyl composition according to claim 4.
  6.  請求項1~3のいずれか1項に記載のビニル化合物若しくはその半硬化物、又は請求項4に記載のビニル組成物若しくはその半硬化物と、繊維質基材とを含む、プリプレグ。 A prepreg comprising the vinyl compound or semi-cured product thereof according to any one of claims 1 to 3, or the vinyl composition or semi-cured product thereof according to claim 4, and a fibrous base material.
  7.  請求項1~3のいずれか1項に記載のビニル化合物若しくはその半硬化物、又は請求項4に記載のビニル組成物若しくはその半硬化物を含む樹脂層と、支持フィルムとを備える、樹脂付きフィルム。 A resin-attached film comprising a resin layer containing the vinyl compound or semi-cured product thereof according to any one of claims 1 to 3, or the vinyl composition or semi-cured product thereof according to claim 4, and a support film.
  8.  請求項1~3のいずれか1項に記載のビニル化合物若しくはその半硬化物、又は請求項4に記載のビニル組成物若しくはその半硬化物を含む樹脂層と、金属箔とを備える、樹脂付き金属箔。 A resin-coated metal foil comprising a resin layer containing the vinyl compound or semi-cured product thereof according to any one of claims 1 to 3, or the vinyl composition or semi-cured product thereof according to claim 4, and a metal foil.
  9.  請求項1~3のいずれか1項に記載のビニル化合物の硬化物、又は請求項4に記載のビニル組成物の硬化物を含む絶縁層と、金属箔とを備える、金属張積層板。 A metal-clad laminate comprising an insulating layer containing a cured product of the vinyl compound according to any one of claims 1 to 3 or a cured product of the vinyl composition according to claim 4, and a metal foil.
  10.  請求項6に記載のプリプレグの硬化物を含む絶縁層と、金属箔とを備える、金属張積層板。 A metal-clad laminate comprising an insulating layer containing the cured prepreg of claim 6 and a metal foil.
  11.  請求項1~3のいずれか1項に記載のビニル化合物の硬化物、又は請求項4に記載のビニル組成物の硬化物を含む絶縁層と、導体配線とを備える、プリント配線板。 A printed wiring board comprising an insulating layer containing a cured product of the vinyl compound according to any one of claims 1 to 3 or a cured product of the vinyl composition according to claim 4, and a conductor wiring.
  12.  請求項6に記載のプリプレグの硬化物を含む絶縁層と、導体配線とを備える、プリント配線板。 A printed wiring board comprising an insulating layer containing the cured product of the prepreg according to claim 6 and conductor wiring.
PCT/JP2023/037192 2022-10-19 2023-10-13 Vinyl compound, vinyl composition, vinyl resin cured product, prepreg, resin-attached film, resin-attached metal foil, metal-clad laminate, and printed wiring board WO2024085082A1 (en)

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JP5454749B1 (en) * 2012-07-25 2014-03-26 Dic株式会社 Radical curable compound, method for producing radical curable compound, radical curable composition, cured product thereof, and composition for resist material
WO2015080141A1 (en) * 2013-11-28 2015-06-04 Jnc株式会社 Photocurable inkjet ink
US20160160008A1 (en) * 2014-12-05 2016-06-09 Elite Electronic Material (Kunshan) Co., Ltd. Aromatic tetrafunctional vinylbenzyl resin composition and use thereof
JP7060181B1 (en) * 2020-06-03 2022-04-26 Dic株式会社 Curable resin, curable resin composition, and cured product

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Publication number Priority date Publication date Assignee Title
JPH11124515A (en) * 1997-10-23 1999-05-11 Nippon Kayaku Co Ltd Resin composition and cured substance thereof
JP5454749B1 (en) * 2012-07-25 2014-03-26 Dic株式会社 Radical curable compound, method for producing radical curable compound, radical curable composition, cured product thereof, and composition for resist material
WO2015080141A1 (en) * 2013-11-28 2015-06-04 Jnc株式会社 Photocurable inkjet ink
US20160160008A1 (en) * 2014-12-05 2016-06-09 Elite Electronic Material (Kunshan) Co., Ltd. Aromatic tetrafunctional vinylbenzyl resin composition and use thereof
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