WO2024075641A1 - Polymer material for use in dentistry - Google Patents
Polymer material for use in dentistry Download PDFInfo
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- WO2024075641A1 WO2024075641A1 PCT/JP2023/035577 JP2023035577W WO2024075641A1 WO 2024075641 A1 WO2024075641 A1 WO 2024075641A1 JP 2023035577 W JP2023035577 W JP 2023035577W WO 2024075641 A1 WO2024075641 A1 WO 2024075641A1
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- WIPO (PCT)
- Prior art keywords
- mass
- compounds
- dental
- transition metal
- acid
- Prior art date
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- 239000002861 polymer material Substances 0.000 title abstract description 5
- 239000000178 monomer Substances 0.000 claims abstract description 52
- 230000002378 acidificating effect Effects 0.000 claims abstract description 43
- 150000003623 transition metal compounds Chemical class 0.000 claims abstract description 38
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 22
- 239000002253 acid Substances 0.000 claims abstract description 17
- 239000007787 solid Substances 0.000 claims abstract description 9
- 238000011282 treatment Methods 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 113
- 239000000945 filler Substances 0.000 claims description 16
- 239000003504 photosensitizing agent Substances 0.000 claims description 13
- 150000003624 transition metals Chemical group 0.000 claims description 9
- 239000003999 initiator Substances 0.000 claims description 7
- 239000005749 Copper compound Substances 0.000 claims description 6
- 150000001880 copper compounds Chemical class 0.000 claims description 6
- 238000000354 decomposition reaction Methods 0.000 claims description 6
- 150000001869 cobalt compounds Chemical class 0.000 claims description 5
- 150000002506 iron compounds Chemical class 0.000 claims description 5
- 230000000737 periodic effect Effects 0.000 claims description 5
- 150000003682 vanadium compounds Chemical class 0.000 claims description 5
- 150000001845 chromium compounds Chemical class 0.000 claims description 4
- 150000002697 manganese compounds Chemical class 0.000 claims description 4
- 150000003752 zinc compounds Chemical class 0.000 claims description 4
- 230000000379 polymerizing effect Effects 0.000 claims description 3
- -1 amine compound Chemical class 0.000 description 66
- 238000006116 polymerization reaction Methods 0.000 description 47
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 24
- 150000003254 radicals Chemical class 0.000 description 15
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000003446 ligand Substances 0.000 description 12
- 150000003839 salts Chemical class 0.000 description 12
- 229910001428 transition metal ion Inorganic materials 0.000 description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 11
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 10
- JEHKKBHWRAXMCH-UHFFFAOYSA-M benzenesulfinate Chemical compound [O-]S(=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-M 0.000 description 10
- 239000010949 copper Substances 0.000 description 9
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 8
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- JJLJMEJHUUYSSY-UHFFFAOYSA-L copper(II) hydroxide Inorganic materials [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- QAQJMLQRFWZOBN-LAUBAEHRSA-N L-ascorbyl-6-palmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@H](O)[C@H]1OC(=O)C(O)=C1O QAQJMLQRFWZOBN-LAUBAEHRSA-N 0.000 description 5
- 235000000072 L-ascorbyl-6-palmitate Nutrition 0.000 description 5
- 239000011786 L-ascorbyl-6-palmitate Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 4
- BVQVLAIMHVDZEL-UHFFFAOYSA-N 1-phenyl-1,2-propanedione Chemical group CC(=O)C(=O)C1=CC=CC=C1 BVQVLAIMHVDZEL-UHFFFAOYSA-N 0.000 description 4
- VLUWLNIMIAFOSY-UHFFFAOYSA-N 2-methylbenzenesulfinic acid Chemical compound CC1=CC=CC=C1S(O)=O VLUWLNIMIAFOSY-UHFFFAOYSA-N 0.000 description 4
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Natural products OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 125000004104 aryloxy group Chemical group 0.000 description 4
- 235000010323 ascorbic acid Nutrition 0.000 description 4
- 239000011668 ascorbic acid Substances 0.000 description 4
- 229960005070 ascorbic acid Drugs 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical group C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 229930006711 bornane-2,3-dione Natural products 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000011572 manganese Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- SPSPIUSUWPLVKD-UHFFFAOYSA-N 2,3-dibutyl-6-methylphenol Chemical compound CCCCC1=CC=C(C)C(O)=C1CCCC SPSPIUSUWPLVKD-UHFFFAOYSA-N 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- BLORRZQTHNGFTI-ZZMNMWMASA-L calcium-L-ascorbate Chemical compound [Ca+2].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] BLORRZQTHNGFTI-ZZMNMWMASA-L 0.000 description 3
- 239000004202 carbamide Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 3
- AEJIMXVJZFYIHN-UHFFFAOYSA-N copper;dihydrate Chemical compound O.O.[Cu] AEJIMXVJZFYIHN-UHFFFAOYSA-N 0.000 description 3
- 125000005520 diaryliodonium group Chemical group 0.000 description 3
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical class OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 3
- 150000004992 toluidines Chemical class 0.000 description 3
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- XASAPYQVQBKMIN-UHFFFAOYSA-K ytterbium(iii) fluoride Chemical compound F[Yb](F)F XASAPYQVQBKMIN-UHFFFAOYSA-K 0.000 description 3
- JAEZSIYNWDWMMN-UHFFFAOYSA-N 1,1,3-trimethylthiourea Chemical compound CNC(=S)N(C)C JAEZSIYNWDWMMN-UHFFFAOYSA-N 0.000 description 2
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- XCBBNTFYSLADTO-UHFFFAOYSA-N 2,3-Octanedione Chemical compound CCCCCC(=O)C(C)=O XCBBNTFYSLADTO-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- RVBUGGBMJDPOST-UHFFFAOYSA-N 2-thiobarbituric acid Chemical class O=C1CC(=O)NC(=S)N1 RVBUGGBMJDPOST-UHFFFAOYSA-N 0.000 description 2
- KSMGAOMUPSQGTB-UHFFFAOYSA-N 9,10-dibutoxyanthracene Chemical compound C1=CC=C2C(OCCCC)=C(C=CC=C3)C3=C(OCCCC)C2=C1 KSMGAOMUPSQGTB-UHFFFAOYSA-N 0.000 description 2
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- OCUCCJIRFHNWBP-IYEMJOQQSA-L Copper gluconate Chemical class [Cu+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O OCUCCJIRFHNWBP-IYEMJOQQSA-L 0.000 description 2
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 2
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical class C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 2
- PDQAZBWRQCGBEV-UHFFFAOYSA-N Ethylenethiourea Chemical compound S=C1NCCN1 PDQAZBWRQCGBEV-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 150000000996 L-ascorbic acids Chemical class 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- IPCRBOOJBPETMF-UHFFFAOYSA-N N-acetylthiourea Chemical compound CC(=O)NC(N)=S IPCRBOOJBPETMF-UHFFFAOYSA-N 0.000 description 2
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- AFPRJLBZLPBTPZ-UHFFFAOYSA-N acenaphthoquinone Chemical compound C1=CC(C(C2=O)=O)=C3C2=CC=CC3=C1 AFPRJLBZLPBTPZ-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- MMCPOSDMTGQNKG-UHFFFAOYSA-N anilinium chloride Chemical compound Cl.NC1=CC=CC=C1 MMCPOSDMTGQNKG-UHFFFAOYSA-N 0.000 description 2
- 150000001454 anthracenes Chemical class 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- UCGFRIAOVLXVKL-UHFFFAOYSA-N benzylthiourea Chemical compound NC(=S)NCC1=CC=CC=C1 UCGFRIAOVLXVKL-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 235000010376 calcium ascorbate Nutrition 0.000 description 2
- 229940047036 calcium ascorbate Drugs 0.000 description 2
- 239000011692 calcium ascorbate Substances 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 239000004568 cement Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 2
- 239000000805 composite resin Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(i) oxide Chemical compound [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- BVXOPEOQUQWRHQ-UHFFFAOYSA-N dibutyl phosphite Chemical compound CCCCOP([O-])OCCCC BVXOPEOQUQWRHQ-UHFFFAOYSA-N 0.000 description 2
- LXCYSACZTOKNNS-UHFFFAOYSA-N diethoxy(oxo)phosphanium Chemical compound CCO[P+](=O)OCC LXCYSACZTOKNNS-UHFFFAOYSA-N 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- 125000005594 diketone group Chemical group 0.000 description 2
- NFORZJQPTUSMRL-UHFFFAOYSA-N dipropan-2-yl hydrogen phosphite Chemical compound CC(C)OP(O)OC(C)C NFORZJQPTUSMRL-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical class [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 150000002790 naphthalenes Chemical class 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- CHJUOCDSZWMLRU-UHFFFAOYSA-N oxo(dipropoxy)phosphanium Chemical compound CCCO[P+](=O)OCCC CHJUOCDSZWMLRU-UHFFFAOYSA-N 0.000 description 2
- UPWOEMHINGJHOB-UHFFFAOYSA-N oxo(oxocobaltiooxy)cobalt Chemical compound O=[Co]O[Co]=O UPWOEMHINGJHOB-UHFFFAOYSA-N 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical compound CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- POXAIQSXNOEQGM-UHFFFAOYSA-N propan-2-ylthiourea Chemical compound CC(C)NC(N)=S POXAIQSXNOEQGM-UHFFFAOYSA-N 0.000 description 2
- 239000007870 radical polymerization initiator Substances 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- YEMGQZDWLLBIEY-UHFFFAOYSA-M sodium;2-anilinoacetate Chemical compound [Na+].[O-]C(=O)CNC1=CC=CC=C1 YEMGQZDWLLBIEY-UHFFFAOYSA-M 0.000 description 2
- KFZUDNZQQCWGKF-UHFFFAOYSA-M sodium;4-methylbenzenesulfinate Chemical compound [Na+].CC1=CC=C(S([O-])=O)C=C1 KFZUDNZQQCWGKF-UHFFFAOYSA-M 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 150000003455 sulfinic acids Chemical class 0.000 description 2
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 2
- 150000003585 thioureas Chemical class 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 2
- 125000004953 trihalomethyl group Chemical group 0.000 description 2
- KJWHEZXBZQXVSA-UHFFFAOYSA-N tris(prop-2-enyl) phosphite Chemical compound C=CCOP(OCC=C)OCC=C KJWHEZXBZQXVSA-UHFFFAOYSA-N 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- MCVVDMSWCQUKEV-UHFFFAOYSA-N (2-nitrophenyl)methyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC1=CC=CC=C1[N+]([O-])=O MCVVDMSWCQUKEV-UHFFFAOYSA-N 0.000 description 1
- DLDWUFCUUXXYTB-UHFFFAOYSA-N (2-oxo-1,2-diphenylethyl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC(C=1C=CC=CC=1)C(=O)C1=CC=CC=C1 DLDWUFCUUXXYTB-UHFFFAOYSA-N 0.000 description 1
- DSJDHQOKMCDBEW-UHFFFAOYSA-O (4,7-dihydroxynaphthalen-1-yl)-dimethylsulfanium Chemical compound C1=C(O)C=C2C([S+](C)C)=CC=C(O)C2=C1 DSJDHQOKMCDBEW-UHFFFAOYSA-O 0.000 description 1
- KDVSSSAHDLDHCI-UHFFFAOYSA-O (4,8-dihydroxynaphthalen-1-yl)-dimethylsulfanium Chemical compound C1=CC(O)=C2C([S+](C)C)=CC=C(O)C2=C1 KDVSSSAHDLDHCI-UHFFFAOYSA-O 0.000 description 1
- XLQMBODNBLKPIP-UHFFFAOYSA-O (4-hydroxynaphthalen-1-yl)-dimethylsulfanium Chemical compound C1=CC=C2C([S+](C)C)=CC=C(O)C2=C1 XLQMBODNBLKPIP-UHFFFAOYSA-O 0.000 description 1
- QAEDNLDMOUKNMI-UHFFFAOYSA-O (4-hydroxyphenyl)-dimethylsulfanium Chemical compound C[S+](C)C1=CC=C(O)C=C1 QAEDNLDMOUKNMI-UHFFFAOYSA-O 0.000 description 1
- JZDQKBZKFIWSNW-UHFFFAOYSA-N (4-methoxyphenyl)-phenyliodanium Chemical compound C1=CC(OC)=CC=C1[I+]C1=CC=CC=C1 JZDQKBZKFIWSNW-UHFFFAOYSA-N 0.000 description 1
- CGGPPTKPILLONI-UHFFFAOYSA-N (4-methyl-4-propan-2-ylcyclohexa-1,5-dien-1-yl)-phenyliodanium Chemical compound C1=CC(C(C)C)(C)CC=C1[I+]C1=CC=CC=C1 CGGPPTKPILLONI-UHFFFAOYSA-N 0.000 description 1
- RCOCMILJXXUEHU-UHFFFAOYSA-N (4-methylphenyl)-diphenylsulfanium Chemical compound C1=CC(C)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 RCOCMILJXXUEHU-UHFFFAOYSA-N 0.000 description 1
- VQVGJEIVVJBMCV-UHFFFAOYSA-N (4-octoxyphenyl)-phenyliodanium Chemical compound C1=CC(OCCCCCCCC)=CC=C1[I+]C1=CC=CC=C1 VQVGJEIVVJBMCV-UHFFFAOYSA-N 0.000 description 1
- MFNBODQBPMDPPQ-UHFFFAOYSA-N (4-tert-butylphenyl)-diphenylsulfanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 MFNBODQBPMDPPQ-UHFFFAOYSA-N 0.000 description 1
- RGXLDQDGZYZGEE-UHFFFAOYSA-N (4-tert-butylphenyl)-phenyliodanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=CC=C1 RGXLDQDGZYZGEE-UHFFFAOYSA-N 0.000 description 1
- FSJSYDFBTIVUFD-XHTSQIMGSA-N (e)-4-hydroxypent-3-en-2-one;oxovanadium Chemical compound [V]=O.C\C(O)=C/C(C)=O.C\C(O)=C/C(C)=O FSJSYDFBTIVUFD-XHTSQIMGSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- JGTNAGYHADQMCM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-M 0.000 description 1
- DAGYIBAJYLJURE-UHFFFAOYSA-N 1,1,3,3-tetra(propan-2-yl)thiourea Chemical compound CC(C)N(C(C)C)C(=S)N(C(C)C)C(C)C DAGYIBAJYLJURE-UHFFFAOYSA-N 0.000 description 1
- TVHNLHDFHIHBRL-UHFFFAOYSA-N 1,1,3,3-tetracyclohexylthiourea Chemical compound C1CCCCC1N(C1CCCCC1)C(=S)N(C1CCCCC1)C1CCCCC1 TVHNLHDFHIHBRL-UHFFFAOYSA-N 0.000 description 1
- ZSPQVOFATJEJMT-UHFFFAOYSA-N 1,1,3,3-tetraethylthiourea Chemical compound CCN(CC)C(=S)N(CC)CC ZSPQVOFATJEJMT-UHFFFAOYSA-N 0.000 description 1
- MZRATIPJHWLMQH-UHFFFAOYSA-N 1,1,3-tricyclohexylthiourea Chemical compound C1CCCCC1N(C1CCCCC1)C(=S)NC1CCCCC1 MZRATIPJHWLMQH-UHFFFAOYSA-N 0.000 description 1
- HXMRAWVFMYZQMG-UHFFFAOYSA-N 1,1,3-triethylthiourea Chemical compound CCNC(=S)N(CC)CC HXMRAWVFMYZQMG-UHFFFAOYSA-N 0.000 description 1
- VDUTWHBYCATQBI-UHFFFAOYSA-N 1,1,3-tripropylthiourea Chemical compound CCCNC(=S)N(CCC)CCC VDUTWHBYCATQBI-UHFFFAOYSA-N 0.000 description 1
- LOURZMYQPMDBSR-UHFFFAOYSA-N 1,3,2-dioxathiane 2-oxide Chemical compound O=S1OCCCO1 LOURZMYQPMDBSR-UHFFFAOYSA-N 0.000 description 1
- WDXYVJKNSMILOQ-UHFFFAOYSA-N 1,3,2-dioxathiolane 2-oxide Chemical compound O=S1OCCO1 WDXYVJKNSMILOQ-UHFFFAOYSA-N 0.000 description 1
- OTSKHUNLOQPIGN-UHFFFAOYSA-N 1,3,5-trimethyl-1,3-diazinane-2,4,6-trione Chemical compound CC1C(=O)N(C)C(=O)N(C)C1=O OTSKHUNLOQPIGN-UHFFFAOYSA-N 0.000 description 1
- IBOLUHNETCLUEH-UHFFFAOYSA-N 1,3-benzothiazole;copper Chemical compound [Cu].C1=CC=C2SC=NC2=C1 IBOLUHNETCLUEH-UHFFFAOYSA-N 0.000 description 1
- KREOCUNMMFZOOS-UHFFFAOYSA-N 1,3-di(propan-2-yl)thiourea Chemical compound CC(C)NC(S)=NC(C)C KREOCUNMMFZOOS-UHFFFAOYSA-N 0.000 description 1
- KAJICSGLHKRDLN-UHFFFAOYSA-N 1,3-dicyclohexylthiourea Chemical compound C1CCCCC1NC(=S)NC1CCCCC1 KAJICSGLHKRDLN-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- VVSASNKOFCZVES-UHFFFAOYSA-N 1,3-dimethyl-1,3-diazinane-2,4,6-trione Chemical compound CN1C(=O)CC(=O)N(C)C1=O VVSASNKOFCZVES-UHFFFAOYSA-N 0.000 description 1
- NFQAQKVFBFWVKQ-UHFFFAOYSA-N 1,3-dimethyl-5-(2-methylpropyl)-1,3-diazinane-2,4,6-trione Chemical compound CC(C)CC1C(=O)N(C)C(=O)N(C)C1=O NFQAQKVFBFWVKQ-UHFFFAOYSA-N 0.000 description 1
- UGFMJBRXTRUGJC-UHFFFAOYSA-N 1,3-dimethyl-5-phenyl-1,3-diazinane-2,4,6-trione Chemical compound O=C1N(C)C(=O)N(C)C(=O)C1C1=CC=CC=C1 UGFMJBRXTRUGJC-UHFFFAOYSA-N 0.000 description 1
- FBQJKKPQBMSWEP-UHFFFAOYSA-N 1,3-diphenyl-1,3-diazinane-2,4,6-trione Chemical compound O=C1CC(=O)N(C=2C=CC=CC=2)C(=O)N1C1=CC=CC=C1 FBQJKKPQBMSWEP-UHFFFAOYSA-N 0.000 description 1
- AUXGIIVHLRLBSG-UHFFFAOYSA-N 1,3-dipropylthiourea Chemical compound CCCNC(=S)NCCC AUXGIIVHLRLBSG-UHFFFAOYSA-N 0.000 description 1
- LJSLYKNKVQMIJY-UHFFFAOYSA-N 1,4-diethoxynaphthalene Chemical compound C1=CC=C2C(OCC)=CC=C(OCC)C2=C1 LJSLYKNKVQMIJY-UHFFFAOYSA-N 0.000 description 1
- FWWRTYBQQDXLDD-UHFFFAOYSA-N 1,4-dimethoxynaphthalene Chemical compound C1=CC=C2C(OC)=CC=C(OC)C2=C1 FWWRTYBQQDXLDD-UHFFFAOYSA-N 0.000 description 1
- APQSQLNWAIULLK-UHFFFAOYSA-N 1,4-dimethoxynaphthalene Natural products C1=CC=C2C(C)=CC=C(C)C2=C1 APQSQLNWAIULLK-UHFFFAOYSA-N 0.000 description 1
- DABBHRQKJNIVFT-UHFFFAOYSA-N 1,5-dimethyl-1,3-diazinane-2,4,6-trione Chemical compound CC1C(=O)NC(=O)N(C)C1=O DABBHRQKJNIVFT-UHFFFAOYSA-N 0.000 description 1
- GYQQFWWMZYBCIB-UHFFFAOYSA-N 1-[diazo-(4-methylphenyl)sulfonylmethyl]sulfonyl-4-methylbenzene Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C)C=C1 GYQQFWWMZYBCIB-UHFFFAOYSA-N 0.000 description 1
- JFZVSHAMRZPOPA-UHFFFAOYSA-N 1-[n-(2-hydroxypropyl)-4-methylanilino]propan-2-ol Chemical compound CC(O)CN(CC(C)O)C1=CC=C(C)C=C1 JFZVSHAMRZPOPA-UHFFFAOYSA-N 0.000 description 1
- LRWQENBAFMBIJR-UHFFFAOYSA-N 1-adamantylthiourea Chemical compound C1C(C2)CC3CC2CC1(NC(=S)N)C3 LRWQENBAFMBIJR-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- AFBBKYQYNPNMAT-UHFFFAOYSA-N 1h-1,2,4-triazol-1-ium-3-thiolate Chemical compound SC=1N=CNN=1 AFBBKYQYNPNMAT-UHFFFAOYSA-N 0.000 description 1
- NOAZYCPSGIRVAQ-UHFFFAOYSA-N 1h-benzimidazole;copper Chemical compound [Cu].C1=CC=C2NC=NC2=C1 NOAZYCPSGIRVAQ-UHFFFAOYSA-N 0.000 description 1
- AXRCEHYJECLXMD-UHFFFAOYSA-N 2,3-dihydroxy-1,2-diphenylpropan-1-one;4-methylbenzenesulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1.C=1C=CC=CC=1C(O)(CO)C(=O)C1=CC=CC=C1 AXRCEHYJECLXMD-UHFFFAOYSA-N 0.000 description 1
- URJAUSYMVIZTHC-UHFFFAOYSA-N 2,4,6-tris(tribromomethyl)-1,3,5-triazine Chemical compound BrC(Br)(Br)C1=NC(C(Br)(Br)Br)=NC(C(Br)(Br)Br)=N1 URJAUSYMVIZTHC-UHFFFAOYSA-N 0.000 description 1
- DXUMYHZTYVPBEZ-UHFFFAOYSA-N 2,4,6-tris(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DXUMYHZTYVPBEZ-UHFFFAOYSA-N 0.000 description 1
- JJPKWNXRUDKBQT-UHFFFAOYSA-N 2,4-bis(trichloromethyl)-6-[2-(3,4,5-trimethoxyphenyl)ethenyl]-1,3,5-triazine Chemical compound COC1=C(OC)C(OC)=CC(C=CC=2N=C(N=C(N=2)C(Cl)(Cl)Cl)C(Cl)(Cl)Cl)=C1 JJPKWNXRUDKBQT-UHFFFAOYSA-N 0.000 description 1
- GUKYYIQMUCVKHI-UHFFFAOYSA-N 2-(2,4-dichlorophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC1=CC(Cl)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 GUKYYIQMUCVKHI-UHFFFAOYSA-N 0.000 description 1
- DQMOHZLFVGYNAN-UHFFFAOYSA-N 2-(2-phenylethenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=CC=2C=CC=CC=2)=N1 DQMOHZLFVGYNAN-UHFFFAOYSA-N 0.000 description 1
- UKTRUOJPSJPVOZ-UHFFFAOYSA-N 2-(4-bromophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC(Br)=CC=2)=N1 UKTRUOJPSJPVOZ-UHFFFAOYSA-N 0.000 description 1
- ZQVHTTABFLHMPA-UHFFFAOYSA-N 2-(4-chlorophenoxy)-5-nitropyridine Chemical compound N1=CC([N+](=O)[O-])=CC=C1OC1=CC=C(Cl)C=C1 ZQVHTTABFLHMPA-UHFFFAOYSA-N 0.000 description 1
- WJKHYAJKIXYSHS-UHFFFAOYSA-N 2-(4-chlorophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(Cl)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 WJKHYAJKIXYSHS-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- MPNIGZBDAMWHSX-UHFFFAOYSA-N 2-(4-methylphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(C)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MPNIGZBDAMWHSX-UHFFFAOYSA-N 0.000 description 1
- OZIUQIJHFBCZBX-UHFFFAOYSA-N 2-(4-methylsulfanylphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(SC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 OZIUQIJHFBCZBX-UHFFFAOYSA-N 0.000 description 1
- IZBVPPRIBFECNZ-UHFFFAOYSA-N 2-(4-phenylphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC(=CC=2)C=2C=CC=CC=2)=N1 IZBVPPRIBFECNZ-UHFFFAOYSA-N 0.000 description 1
- WPTIDPUGZXGDEV-UHFFFAOYSA-N 2-[2-(2-methoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound COC1=CC=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 WPTIDPUGZXGDEV-UHFFFAOYSA-N 0.000 description 1
- ZJRNXDIVAGHETA-UHFFFAOYSA-N 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=C(OC)C(OC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 ZJRNXDIVAGHETA-UHFFFAOYSA-N 0.000 description 1
- WCXDCXLNIUKQHG-UHFFFAOYSA-N 2-[2-(4-butoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OCCCC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 WCXDCXLNIUKQHG-UHFFFAOYSA-N 0.000 description 1
- MCNPOZMLKGDJGP-UHFFFAOYSA-N 2-[2-(4-methoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MCNPOZMLKGDJGP-UHFFFAOYSA-N 0.000 description 1
- JUVSRZCUMWZBFK-UHFFFAOYSA-N 2-[n-(2-hydroxyethyl)-4-methylanilino]ethanol Chemical compound CC1=CC=C(N(CCO)CCO)C=C1 JUVSRZCUMWZBFK-UHFFFAOYSA-N 0.000 description 1
- SAFWZKVQMVOANB-UHFFFAOYSA-N 2-[tert-butylsulfonyl(diazo)methyl]sulfonyl-2-methylpropane Chemical compound CC(C)(C)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(C)(C)C SAFWZKVQMVOANB-UHFFFAOYSA-N 0.000 description 1
- SCVJRXQHFJXZFZ-KVQBGUIXSA-N 2-amino-9-[(2r,4s,5r)-4-hydroxy-5-(hydroxymethyl)oxolan-2-yl]-3h-purine-6-thione Chemical compound C1=2NC(N)=NC(=S)C=2N=CN1[C@H]1C[C@H](O)[C@@H](CO)O1 SCVJRXQHFJXZFZ-KVQBGUIXSA-N 0.000 description 1
- CZNJCUMJHDYOHK-UHFFFAOYSA-N 2-anilinoacetic acid;potassium Chemical compound [K].OC(=O)CNC1=CC=CC=C1 CZNJCUMJHDYOHK-UHFFFAOYSA-N 0.000 description 1
- PAAVDLDRAZEFGW-UHFFFAOYSA-N 2-butoxyethyl 4-(dimethylamino)benzoate Chemical compound CCCCOCCOC(=O)C1=CC=C(N(C)C)C=C1 PAAVDLDRAZEFGW-UHFFFAOYSA-N 0.000 description 1
- VDLWSAISTMYDDE-UHFFFAOYSA-N 2-chlorobenzenesulfinic acid Chemical compound OS(=O)C1=CC=CC=C1Cl VDLWSAISTMYDDE-UHFFFAOYSA-N 0.000 description 1
- VSBMUFBTTYXBRL-UHFFFAOYSA-N 2-decylbenzenesulfinic acid Chemical compound CCCCCCCCCCC1=CC=CC=C1S(O)=O VSBMUFBTTYXBRL-UHFFFAOYSA-N 0.000 description 1
- ZYTLBGZACQWGKA-UHFFFAOYSA-N 2-dodecylbenzenesulfinic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)=O ZYTLBGZACQWGKA-UHFFFAOYSA-N 0.000 description 1
- SURWYRGVICLUBJ-UHFFFAOYSA-N 2-ethyl-9,10-dimethoxyanthracene Chemical compound C1=CC=CC2=C(OC)C3=CC(CC)=CC=C3C(OC)=C21 SURWYRGVICLUBJ-UHFFFAOYSA-N 0.000 description 1
- BAYXLVMXINVZPT-UHFFFAOYSA-N 2-ethylbenzenesulfinic acid Chemical compound CCC1=CC=CC=C1S(O)=O BAYXLVMXINVZPT-UHFFFAOYSA-N 0.000 description 1
- IQBZKCNTYYYQIX-UHFFFAOYSA-N 2-fluorobenzenesulfinic acid Chemical compound OS(=O)C1=CC=CC=C1F IQBZKCNTYYYQIX-UHFFFAOYSA-N 0.000 description 1
- DILXLMRYFWFBGR-UHFFFAOYSA-N 2-formylbenzene-1,4-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(S(O)(=O)=O)C(C=O)=C1 DILXLMRYFWFBGR-UHFFFAOYSA-N 0.000 description 1
- RFRBGLIRLVDHBN-UHFFFAOYSA-N 2-methyl-2-(4-methylphenyl)sulfonyl-1-(4-methylsulfanylphenyl)propan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)S(=O)(=O)C1=CC=C(C)C=C1 RFRBGLIRLVDHBN-UHFFFAOYSA-N 0.000 description 1
- GOTIJEQQGSMAIN-UHFFFAOYSA-N 2-methyl-4,6-bis(tribromomethyl)-1,3,5-triazine Chemical compound CC1=NC(C(Br)(Br)Br)=NC(C(Br)(Br)Br)=N1 GOTIJEQQGSMAIN-UHFFFAOYSA-N 0.000 description 1
- LETDRANQSOEVCX-UHFFFAOYSA-N 2-methyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 LETDRANQSOEVCX-UHFFFAOYSA-N 0.000 description 1
- QXIZOVTVSPHVGI-UHFFFAOYSA-M 2-methylbenzenesulfinate;tetraethylazanium Chemical compound CC[N+](CC)(CC)CC.CC1=CC=CC=C1S([O-])=O QXIZOVTVSPHVGI-UHFFFAOYSA-M 0.000 description 1
- ZTEVZRQIBGJEHG-UHFFFAOYSA-N 2-naphthalen-1-yl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C3=CC=CC=C3C=CC=2)=N1 ZTEVZRQIBGJEHG-UHFFFAOYSA-N 0.000 description 1
- HAZQZUFYRLFOLC-UHFFFAOYSA-N 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC=CC=2)=N1 HAZQZUFYRLFOLC-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DOSGQNSHFPTAOA-UHFFFAOYSA-N 2-propyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound CCCC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DOSGQNSHFPTAOA-UHFFFAOYSA-N 0.000 description 1
- JZXVADSBLRIAIB-UHFFFAOYSA-N 2-pyrrolidin-2-ylethanol Chemical compound OCCC1CCCN1 JZXVADSBLRIAIB-UHFFFAOYSA-N 0.000 description 1
- WGKYSFRFMQHMOF-UHFFFAOYSA-N 3-bromo-5-methylpyridine-2-carbonitrile Chemical compound CC1=CN=C(C#N)C(Br)=C1 WGKYSFRFMQHMOF-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- TXRCQKVSGVJWAW-UHFFFAOYSA-N 4,4-dimethylimidazolidine-2-thione Chemical compound CC1(C)CNC(=S)N1 TXRCQKVSGVJWAW-UHFFFAOYSA-N 0.000 description 1
- HLRSJFGEPWTQTK-UHFFFAOYSA-M 4-chlorobenzenesulfinate tetraethylazanium Chemical compound CC[N+](CC)(CC)CC.[O-]S(=O)c1ccc(Cl)cc1 HLRSJFGEPWTQTK-UHFFFAOYSA-M 0.000 description 1
- ABSVDMATLPWCST-UHFFFAOYSA-M 4-chlorobenzenesulfinate tetramethylazanium Chemical compound C[N+](C)(C)C.[O-]S(=O)c1ccc(Cl)cc1 ABSVDMATLPWCST-UHFFFAOYSA-M 0.000 description 1
- MECOXVVMBWDGQX-UHFFFAOYSA-M 4-chlorobenzenesulfinate;tetrabutylazanium Chemical compound [O-]S(=O)C1=CC=C(Cl)C=C1.CCCC[N+](CCCC)(CCCC)CCCC MECOXVVMBWDGQX-UHFFFAOYSA-M 0.000 description 1
- CEJCDRZCNCZZIK-UHFFFAOYSA-N 4-chlorobenzenesulfinic acid N-methylaniline Chemical compound CNc1ccccc1.OS(=O)c1ccc(Cl)cc1 CEJCDRZCNCZZIK-UHFFFAOYSA-N 0.000 description 1
- ZJNNHKQNMNWLCT-UHFFFAOYSA-N 4-chlorobenzenesulfinic acid ethanamine Chemical compound CCN.OS(=O)c1ccc(Cl)cc1 ZJNNHKQNMNWLCT-UHFFFAOYSA-N 0.000 description 1
- TZDKWCRWHKLLCM-UHFFFAOYSA-N 4-chlorobenzenesulfinic acid pyridine Chemical compound c1ccncc1.OS(=O)c1ccc(Cl)cc1 TZDKWCRWHKLLCM-UHFFFAOYSA-N 0.000 description 1
- MFWFDRBPQDXFRC-UHFFFAOYSA-N 4-hydroxypent-3-en-2-one;vanadium Chemical compound [V].CC(O)=CC(C)=O.CC(O)=CC(C)=O.CC(O)=CC(C)=O MFWFDRBPQDXFRC-UHFFFAOYSA-N 0.000 description 1
- FXJVNINSOKCNJP-UHFFFAOYSA-M 4-methylbenzenesulfinate Chemical compound CC1=CC=C(S([O-])=O)C=C1 FXJVNINSOKCNJP-UHFFFAOYSA-M 0.000 description 1
- PWULUIBXNJTGDC-UHFFFAOYSA-N 4-methylbenzenesulfinic acid;pyridine Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])=O)C=C1 PWULUIBXNJTGDC-UHFFFAOYSA-N 0.000 description 1
- GVACZXXDTBZOFK-UHFFFAOYSA-N 4-methylbenzenesulfinic acid;tetrabutylazanium Chemical compound CC1=CC=C(S(O)=O)C=C1.CCCC[N+](CCCC)(CCCC)CCCC GVACZXXDTBZOFK-UHFFFAOYSA-N 0.000 description 1
- LQJJSQXSILDYFT-UHFFFAOYSA-N 4-methylbenzenesulfinic acid;tetramethylazanium Chemical compound C[N+](C)(C)C.CC1=CC=C(S(O)=O)C=C1 LQJJSQXSILDYFT-UHFFFAOYSA-N 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- ZVNHORPINPVWMI-UHFFFAOYSA-N 5-(4-methylpentan-2-yl)-1,3-diazinane-2,4,6-trione Chemical compound CC(C)CC(C)C1C(=O)NC(=O)NC1=O ZVNHORPINPVWMI-UHFFFAOYSA-N 0.000 description 1
- HTKIZIQFMHVTRJ-UHFFFAOYSA-N 5-butyl-1,3-diazinane-2,4,6-trione Chemical compound CCCCC1C(=O)NC(=O)NC1=O HTKIZIQFMHVTRJ-UHFFFAOYSA-N 0.000 description 1
- RATSVJLVTJDKSI-UHFFFAOYSA-N 5-cyclohexyl-1,3-diazinane-2,4,6-trione Chemical compound O=C1NC(=O)NC(=O)C1C1CCCCC1 RATSVJLVTJDKSI-UHFFFAOYSA-N 0.000 description 1
- ANBKBYQJFJUEBR-UHFFFAOYSA-N 5-cyclohexyl-1,3-dimethyl-1,3-diazinane-2,4,6-trione Chemical compound O=C1N(C)C(=O)N(C)C(=O)C1C1CCCCC1 ANBKBYQJFJUEBR-UHFFFAOYSA-N 0.000 description 1
- FMTLDVACNZDTQL-UHFFFAOYSA-N 5-ethyl-1,3-diazinane-2,4,6-trione Chemical compound CCC1C(=O)NC(=O)NC1=O FMTLDVACNZDTQL-UHFFFAOYSA-N 0.000 description 1
- QBCQXNDNMOHQIU-UHFFFAOYSA-N 5-ethyl-1,3-dimethyl-1,3-diazinane-2,4,6-trione Chemical compound CCC1C(=O)N(C)C(=O)N(C)C1=O QBCQXNDNMOHQIU-UHFFFAOYSA-N 0.000 description 1
- GFPIGNBQTXNNAG-UHFFFAOYSA-N 5-propan-2-yl-1,3-diazinane-2,4,6-trione Chemical compound CC(C)C1C(=O)NC(=O)NC1=O GFPIGNBQTXNNAG-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- ROSMRLPYRKRAGN-UHFFFAOYSA-N 9,10-diethoxy-1-[(4-nitrophenyl)methyl]anthracene-2-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=C2C(OCC)=C3C=CC=CC3=C(OCC)C2=C1CC1=CC=C([N+]([O-])=O)C=C1 ROSMRLPYRKRAGN-UHFFFAOYSA-N 0.000 description 1
- GJNKQJAJXSUJBO-UHFFFAOYSA-N 9,10-diethoxyanthracene Chemical compound C1=CC=C2C(OCC)=C(C=CC=C3)C3=C(OCC)C2=C1 GJNKQJAJXSUJBO-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- RAGVFPXNNBOQQO-UHFFFAOYSA-M Br[Fe] Chemical compound Br[Fe] RAGVFPXNNBOQQO-UHFFFAOYSA-M 0.000 description 1
- UYIQCBUQBNWFDJ-UHFFFAOYSA-J C(CCCCCCCCCCCCCCCCC)(=O)[O-].[V+4].C(CCCCCCCCCCCCCCCCC)(=O)[O-].C(CCCCCCCCCCCCCCCCC)(=O)[O-].C(CCCCCCCCCCCCCCCCC)(=O)[O-] Chemical compound C(CCCCCCCCCCCCCCCCC)(=O)[O-].[V+4].C(CCCCCCCCCCCCCCCCC)(=O)[O-].C(CCCCCCCCCCCCCCCCC)(=O)[O-].C(CCCCCCCCCCCCCCCCC)(=O)[O-] UYIQCBUQBNWFDJ-UHFFFAOYSA-J 0.000 description 1
- MKSHZAOITYYXQI-UHFFFAOYSA-N CNC=1C(=CC=CC1)C.C1=C(C=CC2=CC=CC=C12)S(=O)O Chemical compound CNC=1C(=CC=CC1)C.C1=C(C=CC2=CC=CC=C12)S(=O)O MKSHZAOITYYXQI-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ORJNYRSOZHSOFM-UHFFFAOYSA-L ClC1=CC=C(C=C1)S(=O)[O-].ClC1=CC=C(C=C1)S(=O)[O-].[Ba+2] Chemical compound ClC1=CC=C(C=C1)S(=O)[O-].ClC1=CC=C(C=C1)S(=O)[O-].[Ba+2] ORJNYRSOZHSOFM-UHFFFAOYSA-L 0.000 description 1
- 229910021580 Cobalt(II) chloride Inorganic materials 0.000 description 1
- 229910021503 Cobalt(II) hydroxide Inorganic materials 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000004277 Ferrous carbonate Substances 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910021575 Iron(II) bromide Inorganic materials 0.000 description 1
- 229910021577 Iron(II) chloride Inorganic materials 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 150000000994 L-ascorbates Chemical class 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- VLCDUOXHFNUCKK-UHFFFAOYSA-N N,N'-Dimethylthiourea Chemical compound CNC(=S)NC VLCDUOXHFNUCKK-UHFFFAOYSA-N 0.000 description 1
- FLVIGYVXZHLUHP-UHFFFAOYSA-N N,N'-diethylthiourea Chemical compound CCNC(=S)NCC FLVIGYVXZHLUHP-UHFFFAOYSA-N 0.000 description 1
- FCSHMCFRCYZTRQ-UHFFFAOYSA-N N,N'-diphenylthiourea Chemical compound C=1C=CC=CC=1NC(=S)NC1=CC=CC=C1 FCSHMCFRCYZTRQ-UHFFFAOYSA-N 0.000 description 1
- KQJQICVXLJTWQD-UHFFFAOYSA-N N-Methylthiourea Chemical compound CNC(N)=S KQJQICVXLJTWQD-UHFFFAOYSA-N 0.000 description 1
- GMEHFXXZSWDEDB-UHFFFAOYSA-N N-ethylthiourea Chemical compound CCNC(N)=S GMEHFXXZSWDEDB-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- OFSAUHSCHWRZKM-UHFFFAOYSA-N Padimate A Chemical compound CC(C)CCOC(=O)C1=CC=C(N(C)C)C=C1 OFSAUHSCHWRZKM-UHFFFAOYSA-N 0.000 description 1
- 239000004260 Potassium ascorbate Substances 0.000 description 1
- UHGKYJXJYJWDAM-UHFFFAOYSA-N Propylthiourea Chemical compound CCCNC(N)=S UHGKYJXJYJWDAM-UHFFFAOYSA-N 0.000 description 1
- DFPOZTRSOAQFIK-UHFFFAOYSA-N S,S-dimethyl-beta-propiothetin Chemical compound C[S+](C)CCC([O-])=O DFPOZTRSOAQFIK-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- MNOILHPDHOHILI-UHFFFAOYSA-N Tetramethylthiourea Chemical compound CN(C)C(=S)N(C)C MNOILHPDHOHILI-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 1
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 1
- 229910021541 Vanadium(III) oxide Inorganic materials 0.000 description 1
- GLGXSTXZLFQYKJ-UHFFFAOYSA-N [cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane Chemical compound C1CCCCC1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1CCCCC1 GLGXSTXZLFQYKJ-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 1
- 125000005228 aryl sulfonate group Chemical group 0.000 description 1
- LEZYOBCWPRUIEA-UHFFFAOYSA-N azane;4-methylbenzenesulfinic acid Chemical compound [NH4+].CC1=CC=C(S([O-])=O)C=C1 LEZYOBCWPRUIEA-UHFFFAOYSA-N 0.000 description 1
- FTIXLYRNICNDJE-UHFFFAOYSA-N azanium 4-chlorobenzenesulfinate Chemical compound ClC1=CC=C(C=C1)S(=O)[O-].[NH4+] FTIXLYRNICNDJE-UHFFFAOYSA-N 0.000 description 1
- WJKQWSMSCNSBFO-UHFFFAOYSA-N azanium;naphthalene-2-sulfinate Chemical compound [NH4+].C1=CC=CC2=CC(S(=O)[O-])=CC=C21 WJKQWSMSCNSBFO-UHFFFAOYSA-N 0.000 description 1
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 1
- HNYOPLTXPVRDBG-UHFFFAOYSA-N barbituric acid Chemical compound O=C1CC(=O)NC(=O)N1 HNYOPLTXPVRDBG-UHFFFAOYSA-N 0.000 description 1
- 150000007656 barbituric acids Chemical class 0.000 description 1
- GYUMTAPSXISUIS-UHFFFAOYSA-L barium(2+);4-methylbenzenesulfinate Chemical compound [Ba+2].CC1=CC=C(S([O-])=O)C=C1.CC1=CC=C(S([O-])=O)C=C1 GYUMTAPSXISUIS-UHFFFAOYSA-L 0.000 description 1
- GKGINNLGHSJHDV-UHFFFAOYSA-L barium(2+);benzenesulfinate Chemical compound [Ba+2].[O-]S(=O)C1=CC=CC=C1.[O-]S(=O)C1=CC=CC=C1 GKGINNLGHSJHDV-UHFFFAOYSA-L 0.000 description 1
- PTLQZMHQLLYYLP-UHFFFAOYSA-M benzenesulfinate;benzyl(trimethyl)azanium Chemical compound [O-]S(=O)C1=CC=CC=C1.C[N+](C)(C)CC1=CC=CC=C1 PTLQZMHQLLYYLP-UHFFFAOYSA-M 0.000 description 1
- DHXJFECNLYYCDM-UHFFFAOYSA-N benzyl(dimethyl)sulfanium Chemical compound C[S+](C)CC1=CC=CC=C1 DHXJFECNLYYCDM-UHFFFAOYSA-N 0.000 description 1
- GCQNBIQDEIUKOD-UHFFFAOYSA-M benzyl(trimethyl)azanium;naphthalene-2-sulfinate Chemical compound C[N+](C)(C)CC1=CC=CC=C1.C1=CC=CC2=CC(S(=O)[O-])=CC=C21 GCQNBIQDEIUKOD-UHFFFAOYSA-M 0.000 description 1
- MWPUSWNISCYUNR-UHFFFAOYSA-N bis(3-nitrophenyl)iodanium Chemical compound [O-][N+](=O)C1=CC=CC([I+]C=2C=C(C=CC=2)[N+]([O-])=O)=C1 MWPUSWNISCYUNR-UHFFFAOYSA-N 0.000 description 1
- QRMFGEKERJAYSQ-UHFFFAOYSA-N bis(4-chlorophenyl)iodanium Chemical compound C1=CC(Cl)=CC=C1[I+]C1=CC=C(Cl)C=C1 QRMFGEKERJAYSQ-UHFFFAOYSA-N 0.000 description 1
- DWBJZABVMXQFPV-UHFFFAOYSA-N bis(4-methoxyphenyl)iodanium Chemical compound C1=CC(OC)=CC=C1[I+]C1=CC=C(OC)C=C1 DWBJZABVMXQFPV-UHFFFAOYSA-N 0.000 description 1
- DNFSNYQTQMVTOK-UHFFFAOYSA-N bis(4-tert-butylphenyl)iodanium Chemical compound C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 DNFSNYQTQMVTOK-UHFFFAOYSA-N 0.000 description 1
- YVECZSPKOWOZPN-UHFFFAOYSA-N bis(prop-2-enyl) sulfite Chemical compound C=CCOS(=O)OCC=C YVECZSPKOWOZPN-UHFFFAOYSA-N 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- UIFVGWNLHVCKCX-UHFFFAOYSA-N butan-1-amine 4-chlorobenzenesulfinic acid Chemical compound CCCCN.OS(=O)c1ccc(Cl)cc1 UIFVGWNLHVCKCX-UHFFFAOYSA-N 0.000 description 1
- XUPCLXDANQVGBJ-UHFFFAOYSA-N butan-1-amine 4-methylbenzenesulfinic acid Chemical compound C1(=CC=C(C=C1)S(=O)[O-])C.C(CCC)[NH3+] XUPCLXDANQVGBJ-UHFFFAOYSA-N 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 150000003940 butylamines Chemical class 0.000 description 1
- FRTJZAOCSSPZCF-UHFFFAOYSA-L calcium 4-chlorobenzenesulfinate Chemical compound ClC1=CC=C(C=C1)S(=O)[O-].ClC1=CC=C(C=C1)S(=O)[O-].[Ca+2] FRTJZAOCSSPZCF-UHFFFAOYSA-L 0.000 description 1
- 229940064002 calcium hypophosphite Drugs 0.000 description 1
- 229910001382 calcium hypophosphite Inorganic materials 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- GBAOBIBJACZTNA-UHFFFAOYSA-L calcium sulfite Chemical compound [Ca+2].[O-]S([O-])=O GBAOBIBJACZTNA-UHFFFAOYSA-L 0.000 description 1
- 235000010261 calcium sulphite Nutrition 0.000 description 1
- BJDPAJOHFVBAJK-UHFFFAOYSA-L calcium;2-methylbenzenesulfinate Chemical compound [Ca+2].CC1=CC=CC=C1S([O-])=O.CC1=CC=CC=C1S([O-])=O BJDPAJOHFVBAJK-UHFFFAOYSA-L 0.000 description 1
- JPLNMWITWCOINR-UHFFFAOYSA-L calcium;4-methylbenzenesulfinate Chemical compound [Ca+2].CC1=CC=C(S([O-])=O)C=C1.CC1=CC=C(S([O-])=O)C=C1 JPLNMWITWCOINR-UHFFFAOYSA-L 0.000 description 1
- CQTBCRGSMDMCKL-UHFFFAOYSA-L calcium;benzenesulfinate Chemical compound [Ca+2].[O-]S(=O)C1=CC=CC=C1.[O-]S(=O)C1=CC=CC=C1 CQTBCRGSMDMCKL-UHFFFAOYSA-L 0.000 description 1
- FAYYUXPSKDFLEC-UHFFFAOYSA-L calcium;dioxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [Ca+2].[O-]S([O-])(=O)=S FAYYUXPSKDFLEC-UHFFFAOYSA-L 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- OBWXQDHWLMJOOD-UHFFFAOYSA-H cobalt(2+);dicarbonate;dihydroxide;hydrate Chemical compound O.[OH-].[OH-].[Co+2].[Co+2].[Co+2].[O-]C([O-])=O.[O-]C([O-])=O OBWXQDHWLMJOOD-UHFFFAOYSA-H 0.000 description 1
- IUYLTEAJCNAMJK-UHFFFAOYSA-N cobalt(2+);oxygen(2-) Chemical compound [O-2].[Co+2] IUYLTEAJCNAMJK-UHFFFAOYSA-N 0.000 description 1
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(II) oxide Inorganic materials [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 229910000335 cobalt(II) sulfate Inorganic materials 0.000 description 1
- UBEWDCMIDFGDOO-UHFFFAOYSA-N cobalt(II,III) oxide Inorganic materials [O-2].[O-2].[O-2].[O-2].[Co+2].[Co+3].[Co+3] UBEWDCMIDFGDOO-UHFFFAOYSA-N 0.000 description 1
- BZRRQSJJPUGBAA-UHFFFAOYSA-L cobalt(ii) bromide Chemical compound Br[Co]Br BZRRQSJJPUGBAA-UHFFFAOYSA-L 0.000 description 1
- LBFUKZWYPLNNJC-UHFFFAOYSA-N cobalt(ii,iii) oxide Chemical compound [Co]=O.O=[Co]O[Co]=O LBFUKZWYPLNNJC-UHFFFAOYSA-N 0.000 description 1
- PKSIZOUDEUREFF-UHFFFAOYSA-N cobalt;dihydrate Chemical compound O.O.[Co] PKSIZOUDEUREFF-UHFFFAOYSA-N 0.000 description 1
- JUPWRUDTZGBNEX-UHFFFAOYSA-N cobalt;pentane-2,4-dione Chemical compound [Co].CC(=O)CC(C)=O.CC(=O)CC(C)=O.CC(=O)CC(C)=O JUPWRUDTZGBNEX-UHFFFAOYSA-N 0.000 description 1
- 238000012669 compression test Methods 0.000 description 1
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical compound [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 229910000009 copper(II) carbonate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- ZKXWKVVCCTZOLD-FDGPNNRMSA-N copper;(z)-4-hydroxypent-3-en-2-one Chemical compound [Cu].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O ZKXWKVVCCTZOLD-FDGPNNRMSA-N 0.000 description 1
- SVOAENZIOKPANY-CVBJKYQLSA-L copper;(z)-octadec-9-enoate Chemical compound [Cu+2].CCCCCCCC\C=C/CCCCCCCC([O-])=O.CCCCCCCC\C=C/CCCCCCCC([O-])=O SVOAENZIOKPANY-CVBJKYQLSA-L 0.000 description 1
- VURZAXVELVEAAN-UHFFFAOYSA-L copper;1,3-benzothiazole-2-thiolate Chemical compound [Cu+2].C1=CC=C2SC([S-])=NC2=C1.C1=CC=C2SC([S-])=NC2=C1 VURZAXVELVEAAN-UHFFFAOYSA-L 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- GSCLWPQCXDSGBU-UHFFFAOYSA-L copper;phthalate Chemical compound [Cu+2].[O-]C(=O)C1=CC=CC=C1C([O-])=O GSCLWPQCXDSGBU-UHFFFAOYSA-L 0.000 description 1
- XPLSDXJBKRIVFZ-UHFFFAOYSA-L copper;prop-2-enoate Chemical compound [Cu+2].[O-]C(=O)C=C.[O-]C(=O)C=C XPLSDXJBKRIVFZ-UHFFFAOYSA-L 0.000 description 1
- KLMIJCPYCOMSQF-UHFFFAOYSA-N copper;propane-1,3-diamine Chemical compound [Cu].NCCCN KLMIJCPYCOMSQF-UHFFFAOYSA-N 0.000 description 1
- LROWILPKXRHMNL-UHFFFAOYSA-N copper;thiourea Chemical compound [Cu].NC(N)=S LROWILPKXRHMNL-UHFFFAOYSA-N 0.000 description 1
- 125000000332 coumarinyl group Chemical class O1C(=O)C(=CC2=CC=CC=C12)* 0.000 description 1
- 235000019854 cupric carbonate Nutrition 0.000 description 1
- 239000011646 cupric carbonate Substances 0.000 description 1
- 235000019856 cupric gluconate Nutrition 0.000 description 1
- 239000011642 cupric gluconate Substances 0.000 description 1
- 150000003946 cyclohexylamines Chemical class 0.000 description 1
- LEEHHPPLIOFGSC-UHFFFAOYSA-N cyclohexylthiourea Chemical compound NC(=S)NC1CCCCC1 LEEHHPPLIOFGSC-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000005548 dental material Substances 0.000 description 1
- NVJBFARDFTXOTO-UHFFFAOYSA-N diethyl sulfite Chemical compound CCOS(=O)OCC NVJBFARDFTXOTO-UHFFFAOYSA-N 0.000 description 1
- 150000005332 diethylamines Chemical class 0.000 description 1
- BBLSYMNDKUHQAG-UHFFFAOYSA-L dilithium;sulfite Chemical compound [Li+].[Li+].[O-]S([O-])=O BBLSYMNDKUHQAG-UHFFFAOYSA-L 0.000 description 1
- JTNDNBUJMQNEGL-UHFFFAOYSA-N dimethyl(phenacyl)sulfanium Chemical compound C[S+](C)CC(=O)C1=CC=CC=C1 JTNDNBUJMQNEGL-UHFFFAOYSA-N 0.000 description 1
- HUDDJECNGKLELJ-UHFFFAOYSA-M diphenyl-(4-phenylsulfanylphenyl)sulfanium;chloride Chemical compound [Cl-].C=1C=C([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1SC1=CC=CC=C1 HUDDJECNGKLELJ-UHFFFAOYSA-M 0.000 description 1
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical class C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 1
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 1
- FGRVOLIFQGXPCT-UHFFFAOYSA-L dipotassium;dioxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [K+].[K+].[O-]S([O-])(=O)=S FGRVOLIFQGXPCT-UHFFFAOYSA-L 0.000 description 1
- IIKLEMKAKOISSP-UHFFFAOYSA-N dipropan-2-yl sulfite Chemical compound CC(C)OS(=O)OC(C)C IIKLEMKAKOISSP-UHFFFAOYSA-N 0.000 description 1
- MAIQPVFXODAAIG-UHFFFAOYSA-N dipropyl sulfite Chemical compound CCCOS(=O)OCCC MAIQPVFXODAAIG-UHFFFAOYSA-N 0.000 description 1
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethyl mercaptane Natural products CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
- 150000003947 ethylamines Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- RAQDACVRFCEPDA-UHFFFAOYSA-L ferrous carbonate Chemical compound [Fe+2].[O-]C([O-])=O RAQDACVRFCEPDA-UHFFFAOYSA-L 0.000 description 1
- 235000019268 ferrous carbonate Nutrition 0.000 description 1
- 239000004222 ferrous gluconate Substances 0.000 description 1
- 235000013924 ferrous gluconate Nutrition 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- YAMHXTCMCPHKLN-UHFFFAOYSA-N imidazolidin-2-one Chemical compound O=C1NCCN1 YAMHXTCMCPHKLN-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- AQBLLJNPHDIAPN-LNTINUHCSA-K iron(3+);(z)-4-oxopent-2-en-2-olate Chemical compound [Fe+3].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O AQBLLJNPHDIAPN-LNTINUHCSA-K 0.000 description 1
- LIKBJVNGSGBSGK-UHFFFAOYSA-N iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Fe+3].[Fe+3] LIKBJVNGSGBSGK-UHFFFAOYSA-N 0.000 description 1
- IEECXTSVVFWGSE-UHFFFAOYSA-M iron(3+);oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Fe+3] IEECXTSVVFWGSE-UHFFFAOYSA-M 0.000 description 1
- PVFSDGKDKFSOTB-UHFFFAOYSA-K iron(3+);triacetate Chemical compound [Fe+3].CC([O-])=O.CC([O-])=O.CC([O-])=O PVFSDGKDKFSOTB-UHFFFAOYSA-K 0.000 description 1
- 229910000015 iron(II) carbonate Inorganic materials 0.000 description 1
- 229910021506 iron(II) hydroxide Inorganic materials 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- NPFOYSMITVOQOS-UHFFFAOYSA-K iron(III) citrate Chemical compound [Fe+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NPFOYSMITVOQOS-UHFFFAOYSA-K 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229910000462 iron(III) oxide hydroxide Inorganic materials 0.000 description 1
- 229910021519 iron(III) oxide-hydroxide Inorganic materials 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- LNOZJRCUHSPCDZ-UHFFFAOYSA-L iron(ii) acetate Chemical compound [Fe+2].CC([O-])=O.CC([O-])=O LNOZJRCUHSPCDZ-UHFFFAOYSA-L 0.000 description 1
- GYCHYNMREWYSKH-UHFFFAOYSA-L iron(ii) bromide Chemical compound [Fe+2].[Br-].[Br-] GYCHYNMREWYSKH-UHFFFAOYSA-L 0.000 description 1
- VRIVJOXICYMTAG-IYEMJOQQSA-L iron(ii) gluconate Chemical compound [Fe+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O VRIVJOXICYMTAG-IYEMJOQQSA-L 0.000 description 1
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- NGBOPQGPOHMAGY-UHFFFAOYSA-M lithium;2-methylbenzenesulfinate Chemical compound [Li+].CC1=CC=CC=C1S([O-])=O NGBOPQGPOHMAGY-UHFFFAOYSA-M 0.000 description 1
- MSUZXYWQEDRGFN-UHFFFAOYSA-M lithium;4-methylbenzenesulfinate Chemical compound [Li+].CC1=CC=C(S([O-])=O)C=C1 MSUZXYWQEDRGFN-UHFFFAOYSA-M 0.000 description 1
- NVSKMOMNGUJKCL-UHFFFAOYSA-M lithium;benzenesulfinate Chemical compound [Li+].[O-]S(=O)C1=CC=CC=C1 NVSKMOMNGUJKCL-UHFFFAOYSA-M 0.000 description 1
- 229940062135 magnesium thiosulfate Drugs 0.000 description 1
- MUZDAAUUCSJIRK-UHFFFAOYSA-L magnesium;benzenesulfinate Chemical compound [Mg+2].[O-]S(=O)C1=CC=CC=C1.[O-]S(=O)C1=CC=CC=C1 MUZDAAUUCSJIRK-UHFFFAOYSA-L 0.000 description 1
- TZKHCTCLSRVZEY-UHFFFAOYSA-L magnesium;dioxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [Mg+2].[O-]S([O-])(=O)=S TZKHCTCLSRVZEY-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- DBQGARDMYOMOOS-UHFFFAOYSA-N methyl 4-(dimethylamino)benzoate Chemical compound COC(=O)C1=CC=C(N(C)C)C=C1 DBQGARDMYOMOOS-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- GYVGXEWAOAAJEU-UHFFFAOYSA-N n,n,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C=C1 GYVGXEWAOAAJEU-UHFFFAOYSA-N 0.000 description 1
- HKJNHYJTVPWVGV-UHFFFAOYSA-N n,n-diethyl-4-methylaniline Chemical compound CCN(CC)C1=CC=C(C)C=C1 HKJNHYJTVPWVGV-UHFFFAOYSA-N 0.000 description 1
- BGAPSUYNXVVTHA-UHFFFAOYSA-N n,n-diethylethanamine;naphthalene-2-sulfinic acid Chemical compound CCN(CC)CC.C1=CC=CC2=CC(S(=O)O)=CC=C21 BGAPSUYNXVVTHA-UHFFFAOYSA-N 0.000 description 1
- DQMWMUMCNOJLSI-UHFFFAOYSA-N n-carbamothioylbenzamide Chemical compound NC(=S)NC(=O)C1=CC=CC=C1 DQMWMUMCNOJLSI-UHFFFAOYSA-N 0.000 description 1
- IQBYDPCDBRUPCU-UHFFFAOYSA-N n-methylaniline;4-methylbenzenesulfinic acid Chemical compound CNC1=CC=CC=C1.CC1=CC=C(S(O)=O)C=C1 IQBYDPCDBRUPCU-UHFFFAOYSA-N 0.000 description 1
- ICYDASAGOZFWIC-UHFFFAOYSA-N naphthalene-1-sulfinic acid Chemical compound C1=CC=C2C(S(=O)O)=CC=CC2=C1 ICYDASAGOZFWIC-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229920000847 nonoxynol Polymers 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- SJDXYUDKQYOEES-UHFFFAOYSA-L oxalate;oxovanadium(2+) Chemical compound [V+2]=O.[O-]C(=O)C([O-])=O SJDXYUDKQYOEES-UHFFFAOYSA-L 0.000 description 1
- KFAFTZQGYMGWLU-UHFFFAOYSA-N oxo(oxovanadiooxy)vanadium Chemical compound O=[V]O[V]=O KFAFTZQGYMGWLU-UHFFFAOYSA-N 0.000 description 1
- DYYSJNQVLWANCC-UHFFFAOYSA-N oxolan-2-ylmethylthiourea Chemical compound NC(=S)NCC1CCCO1 DYYSJNQVLWANCC-UHFFFAOYSA-N 0.000 description 1
- RBFRVUKIVGOWND-UHFFFAOYSA-L oxygen(2-);vanadium(4+);sulfate Chemical compound [O-2].[V+4].[O-]S([O-])(=O)=O RBFRVUKIVGOWND-UHFFFAOYSA-L 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000004986 phenylenediamines Chemical class 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 235000019275 potassium ascorbate Nutrition 0.000 description 1
- 229940017794 potassium ascorbate Drugs 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- CONVKSGEGAVTMB-RXSVEWSESA-M potassium-L-ascorbate Chemical compound [K+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] CONVKSGEGAVTMB-RXSVEWSESA-M 0.000 description 1
- MQXBJGDCPQIMPM-UHFFFAOYSA-M potassium;2-methylbenzenesulfinate Chemical compound [K+].CC1=CC=CC=C1S([O-])=O MQXBJGDCPQIMPM-UHFFFAOYSA-M 0.000 description 1
- KQZLTJGDWZAZPQ-UHFFFAOYSA-M potassium;4-chlorobenzenesulfinate Chemical compound [K+].[O-]S(=O)C1=CC=C(Cl)C=C1 KQZLTJGDWZAZPQ-UHFFFAOYSA-M 0.000 description 1
- YVHWGMMGEAQQRT-UHFFFAOYSA-M potassium;4-methylbenzenesulfinate Chemical compound [K+].CC1=CC=C(S([O-])=O)C=C1 YVHWGMMGEAQQRT-UHFFFAOYSA-M 0.000 description 1
- LZSBNSVOXWMXLL-UHFFFAOYSA-M potassium;benzenesulfinate Chemical compound [K+].[O-]S(=O)C1=CC=CC=C1 LZSBNSVOXWMXLL-UHFFFAOYSA-M 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- SLUHLANJIVXTRQ-UHFFFAOYSA-N pyridin-2-ylthiourea Chemical compound NC(=S)NC1=CC=CC=N1 SLUHLANJIVXTRQ-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 235000010378 sodium ascorbate Nutrition 0.000 description 1
- PPASLZSBLFJQEF-RKJRWTFHSA-M sodium ascorbate Substances [Na+].OC[C@@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RKJRWTFHSA-M 0.000 description 1
- 229960005055 sodium ascorbate Drugs 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- PPASLZSBLFJQEF-RXSVEWSESA-M sodium-L-ascorbate Chemical compound [Na+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RXSVEWSESA-M 0.000 description 1
- KHDBMTLGTSGEEG-UHFFFAOYSA-M sodium;2-methylbenzenesulfinate Chemical compound [Na+].CC1=CC=CC=C1S([O-])=O KHDBMTLGTSGEEG-UHFFFAOYSA-M 0.000 description 1
- CHLCPTJLUJHDBO-UHFFFAOYSA-M sodium;benzenesulfinate Chemical compound [Na+].[O-]S(=O)C1=CC=CC=C1 CHLCPTJLUJHDBO-UHFFFAOYSA-M 0.000 description 1
- JGGFVSGYTHUAOQ-UHFFFAOYSA-M sodium;naphthalene-2-sulfinate Chemical compound [Na+].C1=CC=CC2=CC(S(=O)[O-])=CC=C21 JGGFVSGYTHUAOQ-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- YDOSLMFOLKFQBA-UHFFFAOYSA-L strontium naphthalene-2-sulfinate Chemical compound [Sr+2].C1=CC=CC2=CC(S(=O)[O-])=CC=C21.C1=CC=CC2=CC(S(=O)[O-])=CC=C21 YDOSLMFOLKFQBA-UHFFFAOYSA-L 0.000 description 1
- JBROWOKLRZQSRX-UHFFFAOYSA-L strontium;benzenesulfinate Chemical compound [Sr+2].[O-]S(=O)C1=CC=CC=C1.[O-]S(=O)C1=CC=CC=C1 JBROWOKLRZQSRX-UHFFFAOYSA-L 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- CNALVHVMBXLLIY-IUCAKERBSA-N tert-butyl n-[(3s,5s)-5-methylpiperidin-3-yl]carbamate Chemical compound C[C@@H]1CNC[C@@H](NC(=O)OC(C)(C)C)C1 CNALVHVMBXLLIY-IUCAKERBSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical class CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical class CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- STDMRMREKPZQFJ-UHFFFAOYSA-H tricopper;2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Cu+2].[Cu+2].[Cu+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O STDMRMREKPZQFJ-UHFFFAOYSA-H 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- IHIXIJGXTJIKRB-UHFFFAOYSA-N trisodium vanadate Chemical compound [Na+].[Na+].[Na+].[O-][V]([O-])([O-])=O IHIXIJGXTJIKRB-UHFFFAOYSA-N 0.000 description 1
- NCPXQVVMIXIKTN-UHFFFAOYSA-N trisodium;phosphite Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])[O-] NCPXQVVMIXIKTN-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- IBYSTTGVDIFUAY-UHFFFAOYSA-N vanadium monoxide Chemical compound [V]=O IBYSTTGVDIFUAY-UHFFFAOYSA-N 0.000 description 1
- ZOYIPGHJSALYPY-UHFFFAOYSA-K vanadium(iii) bromide Chemical compound [V+3].[Br-].[Br-].[Br-] ZOYIPGHJSALYPY-UHFFFAOYSA-K 0.000 description 1
- 229910000352 vanadyl sulfate Inorganic materials 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
- A61K6/62—Photochemical radical initiators
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
- A61K6/64—Thermal radical initiators
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/70—Preparations for dentistry comprising inorganic additives
Definitions
- the present invention relates to a dental polymeric material.
- dental polymerization materials containing a polymerizable monomer and a radical polymerization initiator are known for use in prosthetic treatment of missing teeth, etc.
- a dental polymerization material using a photopolymerization initiator as the radical polymerization initiator has been proposed (see, for example, Patent Document 1).
- the dental polymerization material of Patent Document 1 contains a radical polymerization monomer, an ⁇ -diketone compound, an amine compound, and an aryl iodonium salt.
- dental polymer materials require a high hardening depth to accommodate treatment at deep sites.
- the dental polymerized material of Patent Document 1 has the disadvantage that it does not cure sufficiently in deep areas where light does not reach, resulting in a low curing depth. Furthermore, because dental polymerized materials are continuously subjected to forces such as occlusal force, there is a demand for improved mechanical strength.
- the present invention aims to provide a dental polymeric material that has a high hardening depth and excellent mechanical strength.
- the present invention [1] is a dental polymerizable material for polymerizing a non-acidic monomer having no acidic group and an ethylenically unsaturated group in dental treatment, the dental polymerizable material containing a photoacid generator, a transition metal compound, and a reducing agent, the transition metal compound being solid in the dental polymerizable material, and being soluble in the acid generated by decomposition of the photoacid generator.
- the present invention [2] includes the dental polymeric material described in [1] above, which contains the non-acidic monomer and does not contain an acidic monomer.
- the present invention [3] includes the dental polymeric material described in [1] or [2] above, in which the transition metal compound contains a transition metal atom belonging to the fourth period of the periodic table.
- the present invention [4] includes a dental polymeric material according to any one of [1] to [3] above, in which the transition metal compound is at least one selected from the group consisting of copper compounds, iron compounds, cobalt compounds, chromium compounds, zinc compounds, manganese compounds, and vanadium compounds.
- the present invention [5] includes a dental polymerizable material according to any one of [1] to [4] above, in which the photoacid generator is soluble in the non-acidic monomer.
- the present invention [6] further includes a dental polymeric material according to any one of [1] to [5] above, which contains a filler.
- the present invention [7] further includes a dental polymeric material according to any one of [1] to [6] above, which contains a photosensitizer.
- the present invention [8] further includes a dental polymerizable material according to any one of [1] to [7] above, which contains a photopolymerization initiator.
- the present invention [9] includes a dental polymeric material described in any one of [1] to [8] above, which is a one-component type.
- the photoacid generator decomposes upon irradiation with light, generating radicals and acid.
- the radicals generated from the photoacid generator photopolymerize the nonacidic monomer.
- the acid generated from the photoacid generator dissolves the transition metal compound, generating transition metal ions.
- the generated transition metal ions react chemically with a reducing agent to generate radicals.
- the radicals generated by the chemical reaction chemically polymerize the nonacidic monomer. Since photopolymerization and chemical polymerization occur simultaneously, the degree of polymerization increases and the mechanical strength improves.
- the heat of polymerization generated by photopolymerization and chemical polymerization causes decomposition into the photoacid generator, and polymerization proceeds (frontal polymerization) even in deep areas where light does not directly reach, resulting in a high cure depth.
- the dental polymerization material may be, for example, a one-component dental polymerization material.
- one-component dental polymerization materials do not require mixing before use. If the one-component dental polymerization material has self-adhesive properties, it can be used by applying it directly to tooth structure. On the other hand, if the one-component dental polymerization material does not have self-adhesive properties, it can be used in combination with a pretreatment material.
- Self-adhesive means that the material has sufficient adhesion to tooth structure even without applying a pretreatment material to the tooth structure.
- pretreatment materials are used in dental treatment, for example, to improve the adhesion between one-component dental polymerizable materials and at least one of a prosthesis and tooth structure.
- Examples of one-component dental polymerizable materials include one-component polymerizable composite resins and one-component polymerizable cements.
- One-component polymerizable composite resins are used in dental treatment to fill missing teeth.
- One-component polymerizable cements are used to attach prosthetic devices to missing teeth.
- the one-component dental polymerizable material of the present invention contains a photoacid generator, a transition metal compound, and a reducing agent as essential components for polymerizing a non-acidic monomer that does not have an acidic group but has an ethylenically unsaturated group.
- the one-component dental polymeric material preferably contains a non-acidic monomer and does not contain an acidic monomer.
- the one-component dental polymerization material may not contain non-acidic monomers and may not contain acidic monomers. In this case, the one-component dental polymerization material is used to polymerize the monomers.
- Non-acidic monomers do not have an acidic group and have an ethylenically unsaturated group.
- ethylenically unsaturated groups examples include acryloyl groups, methacryloyl groups, and vinyl groups.
- Non-acidic monomers are monomers that do not have an acidic group and are classified into non-acidic monomers that have a hydroxyl group, non-acidic monomers that have a urethane bond, and non-acidic monomers that do not have a hydroxyl group or a urethane bond.
- non-acidic monomers having a hydroxyl group examples include mono(meth)acrylates and di(meth)acrylates.
- Examples of mono(meth)acrylates having a hydroxyl group include 2-hydroxyethyl(meth)acrylate, 3-hydroxypropyl(meth)acrylate, 6-hydroxyhexyl(meth)acrylate, and dihydroxypropyl mono(meth)acrylate.
- a preferred example of a mono(meth)acrylate having a hydroxyl group is 2-hydroxyethyl(meth)acrylate.
- An example of a di(meth)acrylate having a hydroxyl group is a bisphenol A derivative.
- An example of a bisphenol A derivative having a hydroxyl group is 2,2-bis[4-(3-(meth)acryloyloxy-2-hydroxypropoxy)phenyl]propane (Bis-GMA).
- UDMA UDMA
- Examples of mono(meth)acrylates that do not have a hydroxyl group or a urethane bond include alkyl(meth)acrylates.
- Examples of alkyl(meth)acrylates include methyl(meth)acrylate, ethyl(meth)acrylate, and butyl(meth)acrylate.
- di(meth)acrylates that do not have hydroxyl groups or urethane bonds include alkanediol di(meth)acrylates, polyoxyalkylene group-containing di(meth)acrylates, and bisphenol A derivatives.
- alkanediol di(meth)acrylates examples include ethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, and neopentyl glycol di(meth)acrylate.
- polyoxyalkylene group-containing di(meth)acrylate is a polyoxyethylene group-containing di(meth)acrylate.
- polyoxyethylene group-containing di(meth)acrylates examples include triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, and nonaethylene glycol di(meth)acrylate, and preferably triethylene glycol di(meth)acrylate (TEGDMA).
- TEGDMA triethylene glycol di(meth)acrylate
- An example of a bisphenol A derivative that does not have a hydroxyl group or a urethane bond is ethylene oxide-modified bisphenol A di(meth)acrylate.
- Non-acidic monomers can be used alone or in combination of two or more types. It is preferable to use two or more types of non-acidic monomers in combination.
- Non-acidic monomer is the combination of UDMA and TEGDMA.
- the proportion of non-acidic monomer in the one-component dental polymeric material is, for example, 5% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more, even more preferably 20% by mass or more, particularly preferably 25% by mass or more, and, for example, 95% by mass or less, preferably 80% by mass or less, more preferably 65% by mass or less, even more preferably 50% by mass or less, particularly preferably 40% by mass or less.
- the content of the non-acidic monomer is, for example, 500 parts by mass or more, preferably 1000 parts by mass or more, more preferably 1500 parts by mass or more, and for example, 5000 parts by mass or less, preferably 4000 parts by mass or less, more preferably 3000 parts by mass or less, per 100 parts by mass of the photoacid generator.
- a photoacid generator is a compound that decomposes when exposed to light such as visible light and/or ultraviolet light, generating radicals and acid.
- the radicals generated from the photoacid generator photopolymerize non-acidic monomers.
- the acid generated from the photoacid generator dissolves transition metal compounds and generates transition metal ions.
- the generated transition metal ions react chemically with a reducing agent to generate radicals.
- the radicals generated by the chemical reaction chemically polymerize the non-acidic monomers.
- the photoacid generator is preferably soluble in the non-acidic monomers described above.
- photoacid generators examples include ionic photoacid generators and nonionic photoacid generators.
- Ionic photoacid generators include, for example, iodonium salt compounds and sulfonium salt compounds.
- iodonium salt compounds include diaryliodonium compounds.
- the diaryliodonium salt compound is a compound represented by the following general formula (1).
- R1 to R4 each represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkenyl group, an alkoxy group, an aryloxy group, or a nitro group, and X represents an anion.
- R1 to R4 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkenyl group, an alkoxy group, an aryloxy group, or a nitro group, and X represents an anion.
- Halogen atoms include, for example, fluoro, chloro, bromo, and iodine groups.
- alkyl groups include hydrocarbon groups having 1 to 20 carbon atoms. Specific examples include methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, pentyl, isopentyl, and hexyl groups.
- Aryl groups include, for example, hydrocarbon groups having 6 to 14 carbon atoms. Specific examples include phenyl groups, p-methylphenyl groups, p-chlorophenyl groups, and naphthyl groups.
- alkenyl groups include hydrocarbon groups having 1 to 6 carbon atoms. Specific examples include vinyl groups, allyl groups, isopropenyl groups, butenyl groups, 2-phenylethenyl groups, and 2-(substituted phenyl)ethenyl groups.
- alkoxy groups include alkoxy groups having 1 to 6 carbon atoms. Specific examples include methoxy, ethoxy, propoxy, and butoxy groups.
- Aryloxy groups include, for example, aryloxy groups having 6 to 14 carbon atoms. Specific examples include phenoxy, p-methoxyphenyl, and p-octyloxyphenyl.
- R1 to R4 are preferably hydrogen atoms or alkyl groups.
- diaryliodonium salt compounds include diaryliodonium salt compounds consisting of cations of diphenyliodonium, bis(p-chlorophenyl)iodonium, ditolyliodonium, bis(p-tert-butylphenyl)iodonium, p-isopropylphenyl-p-methylphenyliodonium, bis(m-nitrophenyl)iodonium, p-tert-butylphenylphenyliodonium, p-methoxyphenylphenyliodonium, bis(p-methoxyphenyl)iodonium, and p-octyloxyphenylphenyliodonium, and anions of chloride, bromide, p-toluenesulfonate, trifluoromethanesulfonate, trifluorotris(pentafluoroethyl)phosphate, tetrafluorobo
- a preferred diaryliodonium salt compound is a diaryliodonium salt compound consisting of a p-isopropylphenyl-p-methylphenyliodonium cation and a trifluorotris(pentafluoroethyl)phosphate anion.
- Sulfonium salt compounds include, for example, dimethylphenacylsulfonium, dimethylbenzylsulfonium, dimethyl-4-hydroxyphenylsulfonium, dimethyl-4-hydroxynaphthylsulfonium, dimethyl-4,7-dihydroxynaphthylsulfonium, dimethyl-4,8-dihydroxynaphthylsulfonium, triphenylsulfonium, p-tolyldiphenylsulfonium, p-tert-butylphenyldiphenylsulfonium, and diphenyl-4-phenylthiophenylsulfonium chloride, bromide, p-toluenesulfonate, trifluoromethanesulfonate, tetrafluoroborate, tetrakispentafluorophenylborate, tetrakispentafluorophenylgal
- Ionic photoacid generators are preferably iodonium salt compounds.
- Nonionic photoacid generators include, for example, s-triazine compounds having a trihalomethyl group as a substituent, diazomethane compounds, sulfone compounds, sulfonate compounds, and arylsulfonate compounds.
- Examples of s-triazine compounds having a trihalomethyl group as a substituent include 2,4,6-tris(trichloromethyl)-s-triazine, 2,4,6-tris(tribromomethyl)-s-triazine, 2-methyl-4,6-bis(trichloromethyl)-s-triazine, 2-methyl-4,6-bis(tribromomethyl)-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methylthiophenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-chlorophenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2,4-dichlorophenyl)-4,6-bis(trichloromethyl)-s
- Diazomethane compounds include, for example, bis(cyclohexylsulfonyl)diazomethane, bis(tert-butylsulfonyl)diazomethane, and bis(4-methylphenylsulfonyl)diazomethane.
- sulfone compound 2-methyl-2-([4-methylphenyl]sulfonyl)-1-(4-[methylthio]phenyl)-1-propanone.
- sulfonic acid ester compounds and arylsulfonic acid ester compounds include benzoin tosylate, ⁇ -methylolbenzoin tosylate, o-nitrobenzyl p-toluenesulfonate, and p-nitrobenzyl-9,10-diethoxyanthracene-2-sulfonate.
- Photoacid generators can be used alone or in combination of two or more types.
- the proportion of the photoacid generator in the one-component dental polymerizable material is, for example, 0.1% by mass or more, preferably 0.5% by mass or more, more preferably 1.0% by mass or more, and even more preferably 1.5% by mass or more, and is, for example, 10% by mass or less, preferably 5% by mass or less, and more preferably 3% by mass or less.
- the content of the photoacid generator is, for example, 1 part by mass or more, preferably 3 parts by mass or more, more preferably 5 parts by mass or more, and for example, 30 parts by mass or less, preferably 20 parts by mass or less, more preferably 10 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
- Transition metal compounds At least a part of the transition metal compound is soluble in acid. Preferably, the entire transition metal compound is soluble in acid.
- the transition metal compound is soluble in acid generated by decomposition of a photoacid generator in a one-component dental polymerizable material. By dissolving in acid, transition metal ions are generated. The transition metal ions react chemically with a reducing agent to generate radicals. The generated radicals polymerize non-acidic monomers.
- the transition metal compound contains a transition metal atom that belongs to the fourth period of the periodic table.
- the periodic table is the IUPAC Periodic Table of the Elements (version date 1 December 2018).
- transition metal atoms include scandium (Sc), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), and gallium (Ga).
- Preferred examples of transition metal atoms include vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), copper (Cu), and zinc (Zn), and more preferably copper (Cu).
- transition metal compounds include oxides, hydroxides, halides, carboxylates, sulfates, nitrates, carbonates, and complexes of transition metals.
- halides include chlorides and bromides.
- carboxylates include formates, acetates, oleates, acrylates, gluconates, phthalates, and citrates.
- Transition metal complexes have a transition metal atom as the central metal and ligands that coordinate to the transition metal atom.
- Examples of the ligands include diketone-based ligands, amine-based ligands, thiol-based ligands, urea-based ligands, and thiourea-based ligands.
- Examples of the diketone-based ligands include acetylacetonate.
- Examples of the amine-based ligands include alkanediamines, benzimidazole, and benzothiazole.
- Examples of the thiol-based ligands include mercaptoethanol, mercaptotriazole, mercaptobenzothiazole, and mercaptobenzimidazole.
- Examples of the urea-based ligands include urea and ethyleneurea.
- Examples of the thiourea-based ligands include thiourea, acetylthiourea, pyridylthiourea, and ethylenethiourea.
- transition metal compounds include copper compounds, iron compounds, cobalt compounds, chromium compounds, zinc compounds, manganese compounds, and vanadium compounds.
- the transition metal compound is at least one selected from the group consisting of copper compounds, iron compounds, cobalt compounds, chromium compounds, zinc compounds, manganese compounds, and vanadium compounds.
- copper compounds include copper(II) hydroxide, copper(I) chloride, copper(II) chloride, copper(I) bromide, copper(II) bromide, copper(II) formate, copper(I) acetate, copper(II) acetate, copper(II) sulfate, copper(II) nitrate, copper(II) iodide, basic copper(II) carbonate, copper(I) oxide, copper(II) oxide, metallic copper, copper(II) oleate, copper(II) acrylate, copper(II) gluconate, copper(II) phthalate, copper(II) citrate, copper(II) acetylacetonate, copper mercaptobenzothiazole, copper 1,3-propanediamine, copper benzimidazole, copper benzothiazole, and copper thiourea.
- copper(II) hydroxide is used.
- iron compounds include iron(II) hydroxide, iron(III) oxide hydroxide, iron(II) chloride, iron(III) chloride, iron(I) bromide, iron(II) bromide, iron(II) acetate, iron(III) acetate, iron(II) carbonate, iron(II) oxide, iron(III) oxide, iron(II,III) oxide, metallic iron, iron(II) sulfate, iron(III) sulfate, iron(III) acetylacetonate, iron(III) citrate, and iron(II) gluconate.
- cobalt compounds include cobalt(II) hydroxide, cobalt(II) chloride, cobalt(II) acetate, cobalt(II) bromide, basic cobalt carbonate, cobalt(II) sulfate, cobalt(II) oxide, cobalt(III) oxide, cobalt(II,III) oxide, metallic cobalt, cobalt(II) nitrate, and cobalt(III) acetylacetonate.
- vanadium compounds include vanadium(III) chloride, vanadium(III) bromide, metallic vanadium, vanadium(II) oxide, vanadium(III) oxide, vanadium(V) oxide, vanadium(IV) oxyacetylacetonate, vanadium(III) acetylacetonate, oxovanadium(IV) oxalate, vanadium(IV) stearate, vanadium(IV) oxide sulfate, ammonium vanadate(V), and sodium orthovanadate(V).
- a transition metal compound As a transition metal compound, a copper compound is preferably used.
- the transition metal compound is solid in the one-component dental polymerizable material. That is, the one-component dental polymerizable material contains the components in the one-component dental polymerizable material and a powder of a transition metal compound that is insoluble in water and may be obtained by moisture absorption during storage. At 20°C and 1 atm, the transition metal compound is solid. The amount of the transition metal compound dissolved in 100 g of water at 20°C and 1 atm is, for example, 5 g or less, preferably 4 g or less, and more preferably 3 g or less. That is, in the one-component dental polymerizable material, the transition metal compound being solid means that at least a part of the transition metal compound is solid, and may be partially dissolved.
- the average particle size of the powder is not limited, but if it is too large, it is likely to settle, and if it is too small, the specific surface area becomes too large and the amount that can be dispersed decreases. Therefore, the average particle size is, for example, 0.01 ⁇ m or more, preferably 0.1 ⁇ m or more, more preferably 1 ⁇ m or more, and, for example, 500 ⁇ m or less, preferably 100 ⁇ m or less, and more preferably 50 ⁇ m or less.
- Transition metal compounds can be used alone or in combination of two or more types.
- the blending ratio of the transition metal compound in the one-component dental polymeric material is, for example, 0.0001 mass% or more, preferably 0.0005 mass% or more, more preferably 0.001 mass% or more, even more preferably 0.01 mass% or more, and, for example, 1 mass% or less, preferably 0.5 mass% or less, more preferably 0.1 mass% or less, even more preferably 0.05 mass% or less.
- the content of the transition metal compound is, for example, 0.01 parts by mass or more, preferably 0.03 parts by mass or more, more preferably 0.05 parts by mass or more, and for example, 3 parts by mass or less, preferably 1 part by mass or less, more preferably 0.5 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
- the content of the transition metal compound is, for example, 0.5 parts by mass or more, preferably 1.0 parts by mass or more, more preferably 1.5 parts by mass or more, and for example, 8 parts by mass or less, preferably 5 parts by mass or less, more preferably 3 parts by mass or less, per 100 parts by mass of the photoacid generator.
- the reducing agent reduces the transition metal ions.
- the reducing agent is oxidized by the transition metal ions.
- the reducing agent is oxidized by the transition metal ions to generate radicals.
- the reducing agent may be any agent that reduces the above-mentioned transition metal ions, without any particular limitations.
- reducing agents include aromatic amine compounds, sulfinic acid compounds or their salts, thiourea compounds, thiosulfate compounds, phosphorous acid compounds, sulfurous acid compounds, (thio)barbituric acid compounds or their salts, ascorbic acid compounds or their salts, and ascorbic acid ester compounds or their salts.
- aromatic amine compounds include aromatic tertiary amines and aromatic amino acids.
- aromatic tertiary amines examples include N,N-dialkyltoluidine, N,N-bis(hydroxyalkyl)toluidine, N,N-dialkylaniline, and dialkylaminobenzoic acid esters.
- N,N-dialkyl toluidines examples include N,N-dimethyl-p-toluidine (DMPT) and N,N-diethyl-p-toluidine.
- N,N-bis(hydroxyalkyl)toluidine examples include N,N-bis(2-hydroxyethyl)-p-toluidine and N,N-bis(2-hydroxypropyl)-p-toluidine.
- N,N-dialkylanilines examples include N,N-dimethylaniline and N,N-diethylaniline.
- dialkylaminobenzoate esters examples include methyl 4-(dimethylamino)benzoate, ethyl 4-(dimethylamino)benzoate (EDAB), 2-butoxyethyl 4-(dimethylamino)benzoate, and isoamyl 4-(dimethylamino)benzoate.
- Aromatic amino acids include, for example, N-phenylglycine acid, sodium N-phenylglycine (SPG), and potassium N-phenylglycine.
- Sulfinic acid compounds and their salts include, for example, aromatic sulfinic acids and their salts.
- Aromatic sulfinic acids include, for example, benzenesulfinic acid, o-toluenesulfinic acid, p-toluenesulfinic acid, ethylbenzenesulfinic acid, decylbenzenesulfinic acid, dodecylbenzenesulfinic acid, chlorobenzenesulfinic acid, fluorobenzenesulfinic acid, and naphthalenesulfinic acid.
- Salts of aromatic sulfinic acid compounds include, for example, lithium benzenesulfinate, sodium benzenesulfinate, potassium benzenesulfinate, magnesium benzenesulfinate, calcium benzenesulfinate, strontium benzenesulfinate, barium benzenesulfinate, butylamine salt of benzenesulfinate, aniline salt of benzenesulfinate, toluidine salt of benzenesulfinate, phenylenediamine salt of benzenesulfinate, diethylamine salt of benzenesulfinate, diphenylamine salt of benzenesulfinate, triethylamine salt of benzenesulfinate, tributylamine salt of benzenesulfinate, ammonium salt of benzenesulfinate, tetraethylamine salt of benzenesulfinate, tetra
- Thiourea compounds include, for example, thiourea, methylthiourea, ethylthiourea, n-propylthiourea, isopropylthiourea, cyclohexylthiourea, benzylthiourea, phenylthiourea, acetylthiourea, benzoylthiourea, adamantylthiourea, (2-pyridyl)thiourea (PTU), 1-(2-tetrahydrofurfuryl)-2-thiourea, N,N'-dimethylthiourea, N,N'-diethylthiourea, N,N'-di-n-propylthiourea, and N,N'-di -isopropylthiourea, N,N'-dicyclohexylthiourea, N,N'-diphenylthiourea, trimethylthiourea (TM
- thiosulfate compounds include sodium thiosulfate, calcium thiosulfate, potassium thiosulfate, and magnesium thiosulfate.
- Examples of phosphorous compounds include inorganic phosphorous compounds and organic phosphorous compounds.
- inorganic phosphite compounds include calcium hypophosphite and sodium phosphite.
- organic phosphite compounds include diethyl phosphite, dibutyl phosphite, diisopropyl phosphite, di-n-propyl phosphite, triphenyl phosphite, triallyl phosphite, diethyl phosphite, dibutyl phosphite, diisopropyl phosphite, di-n-propyl phosphite, triphenyl phosphite, and triallyl phosphite.
- sulfite compounds include inorganic sulfite compounds and organic sulfite compounds.
- inorganic sulfite compounds include lithium sulfite, sodium sulfite, potassium sulfite, calcium sulfite, and sodium hydrogen sulfite.
- organic sulfite compounds include diethyl sulfite, di-n-propyl sulfite, diisopropyl sulfite, glycol sulfite, 1,3-propylene sulfite, and diallyl sulfite.
- (Thio)barbituric acid compounds and their salts include, for example, barbituric acid, 1,3-dimethylbarbituric acid, 1,3-diphenylbarbituric acid, 1,5-dimethylbarbituric acid, 5-butylbarbituric acid, 5-ethylbarbituric acid, 5-isopropylbarbituric acid, 5-cyclohexylbarbituric acid, 1,3,5-trimethylbarbituric acid, 1,3-dimethyl-5-ethylbarbituric acid, 1,3-dimethyl-n-butylbarbituric acid, 1,3-dimethyl-5-isobutylbarbituric acid, 1,3-dimethyl-5-cyclohexylbarbituric acid, 1,3-dimethyl-5-phenylbarbituric acid, 1-cyclohexyl-5-ethylbarbituric acid, thiobarbituric acid, and alkali metal or alkaline earth metal salts thereof
- ascorbic acid compounds and salts thereof include sodium ascorbate, calcium ascorbate, and potassium ascorbate.
- Ascorbate salts calcium ascorbate is preferred.
- ascorbic acid ester compounds and their salts include ascorbic acid palmitate, sodium salt of ascorbic acid palmitate, calcium salt of ascorbic acid palmitate, and potassium salt of ascorbic acid palmitate.
- a preferred example of the salt of an ascorbic acid ester is potassium salt of ascorbic acid palmitate.
- Reducing agents can be used alone or in combination of two or more types.
- the reducing agent is preferably a salt of an ascorbic acid compound.
- the mixing ratio of the reducing agent in the one-component dental polymerizable material is, for example, 0.01% by mass or more, preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and even more preferably 1.0% by mass or more, and, for example, 30% by mass or less, preferably 10% by mass or less, more preferably 5% by mass or less, and even more preferably 3% by mass or less.
- the content of the reducing agent is, for example, 1 part by mass or more, preferably 2 parts by mass or more, more preferably 3 parts by mass or more, and for example, 10 parts by mass or less, preferably 7 parts by mass or less, more preferably 5 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
- the content of the reducing agent is, for example, 10 parts by mass or more, preferably 30 parts by mass or more, more preferably 50 parts by mass or more, and for example, 100 parts by mass or less, preferably 85 parts by mass or less, more preferably 70 parts by mass or less, relative to 100 parts by mass of the photoacid generator.
- the one-component dental polymerizable material may contain a filler, if necessary.
- the filler may be any of the conventionally known fillers that can be used in dental materials.
- Specific examples of the filler include silica, silica alumina, alumina, alumina quartz, glass, titania, zirconia, and ytterbium fluoride.
- Examples of silica include fumed silica.
- the filler may be surface-treated with a silane coupling agent or the like to be made hydrophobic or hydrophilic.
- Fillers can be used alone or in combination of two or more types.
- a filler As a filler, a combination of silica and ytterbium fluoride is preferred.
- the filler content in the one-component dental polymeric material is, for example, 0.5% by mass or more, preferably 5% by mass or more, more preferably 15% by mass or more, even more preferably 30% by mass or more, and particularly preferably 50% by mass or more, and is, for example, 95% by mass or less, preferably 80% by mass or less, more preferably 65% by mass or less, and even more preferably 60% by mass or less.
- the content of the filler is, for example, 30 parts by mass or more, preferably 50 parts by mass or more, more preferably 100 parts by mass or more, and for example, 500 parts by mass or less, preferably 300 parts by mass or less, more preferably 200 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
- the content of the filler is, for example, 1,000 parts by mass or more, preferably 2,000 parts by mass or more, more preferably 2,500 parts by mass or more, and for example, 7,000 parts by mass or less, preferably 4,000 parts by mass or less, more preferably 3,500 parts by mass or less, per 100 parts by mass of the photoacid generator.
- the one-component dental polymerizable material may contain a photosensitizer, if necessary.
- the photosensitizer transmits the energy it obtains by absorbing light to the photoacid generator, accelerating the decomposition of the photoacid generator.
- photosensitizers include ketone compounds, anthracene compounds, naphthalene compounds, thioxanthone compounds, and coumarin compounds.
- Ketone compounds include, for example, ⁇ -diketone compounds.
- ⁇ -diketone compounds include camphorquinone, benzil, diacetyl, acetylbenzoyl, 2,3-pentadione, 2,3-octadione, 4,4'-dimethoxybenzyl, 4,4'-oxybenzyl, 9,10-phenanthrenequinone, and acenaphthenequinone.
- anthracene compounds include 9,10-diethoxyanthracene, 9,10-dibutoxyanthracene, and 2-ethyl-9,10-dimethoxyanthracene.
- Naphthalene compounds include, for example, 1,4-dimethoxynaphthalene and 1,4-diethoxynaphthalene.
- Photosensitizers can be used alone or in combination of two or more types.
- the photosensitizer is an anthracene compound.
- the proportion of the photosensitizer in the one-component dental polymeric material is, for example, 0.001% by mass or more, preferably 0.005% by mass or more, more preferably 0.01% by mass or more, and, for example, 10% by mass or less, preferably 5% by mass or less, more preferably 1% by mass or less.
- the content of the photosensitizer is, for example, 0.01 parts by mass or more, preferably 0.05 parts by mass or more, more preferably 0.1 parts by mass or more, and for example, 5 parts by mass or less, preferably 3 parts by mass or less, more preferably 1 part by mass or less, per 100 parts by mass of the non-acidic monomer.
- the content of the photosensitizer is, for example, 1 part by mass or more, preferably 1.5 parts by mass or more, more preferably 2 parts by mass or more, and for example, 20 parts by mass or less, preferably 10 parts by mass or less, more preferably 5 parts by mass or less, per 100 parts by mass of the photoacid generator.
- the one-component dental polymerizable material may contain, as necessary, a polymerization inhibitor, a photopolymerization initiator, an acid amplifier, a thickener, a silane coupling agent, an ultraviolet absorbing agent, a fluorescent agent, a pigment, and a solvent.
- a photopolymerization initiator is a compound that is excited and starts polymerization when exposed to light such as visible light and/or ultraviolet light. Photopolymerization initiators do not include photoacid generators.
- photopolymerization initiators examples include ketone compounds and acylphosphine oxide compounds, with ketone compounds being preferred.
- Ketone compounds include, for example, ⁇ -diketone compounds.
- ⁇ -diketone compounds include camphorquinone, benzil, diacetyl, acetylbenzoyl, 2,3-pentadione, 2,3-octadione, 4,4'-dimethoxybenzyl, 4,4'-oxybenzyl, 9,10-phenanthrenequinone, and acenaphthenequinone, and preferably camphorquinone.
- polymerization inhibitors examples include dibutylhydroxytoluene (BHT) and 4-methoxyphenol (MeHQ), and preferably dibutylhydroxytoluene.
- the proportion of the polymerization inhibitor in the one-component dental polymerization material is, for example, 0.01% by mass or more, preferably 0.1% by mass or more, more preferably 0.3% by mass or more, and, for example, 10% by mass or less, preferably 5% by mass or less, more preferably 1% by mass or less.
- the content of the polymerization inhibitor is, for example, 0.1 parts by mass or more, preferably 0.5 parts by mass or more, more preferably 1 part by mass or more, and for example, 5 parts by mass or less, preferably 3 parts by mass or less, more preferably 2 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
- the content of the polymerization inhibitor is, for example, 0.1 parts by mass or more, preferably 1 part by mass or more, more preferably 5 parts by mass or more, and for example, 70 parts by mass or less, preferably 50 parts by mass or less, more preferably 30 parts by mass or less, per 100 parts by mass of the photoacid generator.
- One-component dental polymeric materials can be applied to tooth structure alone or in combination with a pretreatment material.
- the photoacid generator decomposes, generating radicals and acid.
- the radicals generated from the photoacid generator photopolymerize nonacidic monomers.
- the acid generated from the photoacid generator dissolves transition metal compounds and generates transition metal ions.
- the generated transition metal ions react chemically with a reducing agent to generate radicals.
- the radicals generated by the chemical reaction polymerize the nonacidic monomers.
- the heat of polymerization generated by photopolymerization and chemical polymerization also causes decomposition of the photoacid generator, and polymerization progresses (frontal polymerization), even in deep areas where light does not directly reach.
- dental polymerizable materials polymerize nonacidic monomers during dental treatment.
- frontal polymerization occurs, allowing for a high cure depth.
- the transition metal compound is a solid in the one-component dental polymerizable material. Therefore, the reaction between the transition metal compound and the reducing agent in the one-component dental polymerizable material can be suppressed.
- the dental polymerizable material is a one-component dental polymerizable material.
- the dental polymerization material may be a multi-component dental polymerization material.
- multi-component dental polymerization materials include two-component dental polymerization materials.
- Two-component dental polymerization materials have, for example, component A and component B.
- Two-component dental polymerization materials are used, for example, by mixing components A and B.
- Two-component dental polymerization materials are also used, for example, by applying component A and then component B. If a two-component dental polymerization material has self-adhesive properties, it can be used by applying it directly to tooth structure.
- a two-component dental polymerization material does not have self-adhesive properties, it can be used in combination with a pretreatment material.
- At least one of components A and B contains a photoacid generator, a transition metal compound, and a reducing agent, and optionally contains a non-acidic monomer, a filler, a photosensitizer, and other additives.
- component B located on the surface that is irradiated with light contains a photoacid generator, and at least one of components A and B contains a transition metal compound and a reducing agent, and optionally a non-acidic monomer, a filler, a photosensitizer, and other additives.
- component A may contain a photoacid generator.
- the dental polymerizable material may contain no non-acidic monomers and no acidic monomers. In this case, the dental polymerizable material is used to polymerize the monomers.
- the dental polymeric material may not contain a filler.
- the dental polymeric material can be used as a dental coating material.
- UDMA [2,2,4-trimethylhexamethylenebis(2-carbamoyloxyethyl)]dimethacrylate
- TEGDMA triethylene glycol di(meth)acrylate
- IK-1 Photoacid generator (iodonium salt) manufactured by San-Apro Co., Ltd.
- DBA 9,10-dibutoxyanthracene
- CQ camphorquinone
- Cu(OH) 2 copper(II) hydroxide
- CaAA calcium ascorbate dihydrate
- BHT dibutylhydroxytoluene
- R812 fumed silica manufactured by Aerosil YbF 3 : ytterbium fluoride
- Example 1 the transition metal compound (Cu(OH) 2 ) was a solid in the one-part dental polymerizable material.
- the dental polymeric material of the present invention is suitable for use in dental treatment to fill missing teeth and to adhere prosthetic devices to missing teeth.
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Abstract
This polymer material for use in dentistry is used, in dental treatments, to polymerize a nonacidic monomer that does not have acidic groups but does have ethylenic unsaturated groups. The polymer material for use in dentistry contains a photoacid generator, a transition metal compound, and a reducing agent. The transition metal compound is a solid in the polymer material for use in dentistry and can be dissolved by the acid generated when the photoacid generator decomposes.
Description
本発明は、歯科用重合材料に関する。
The present invention relates to a dental polymeric material.
従来、歯の欠損部などを補綴するために、重合性単量体とラジカル重合開始剤を含む歯科用重合材料が知られている。このような歯科用重合材料において、ラジカル重合開始剤として、光重合開始剤を用いた歯科用重合材料が提案されている(例えば、特許文献1参照。)。詳しくは、特許文献1の歯科用重合材料は、ラジカル重合単量体、α-ジケトン化合物、アミン化合物、および、アリールヨウドニウム塩を含んでいる。
Conventionally, dental polymerization materials containing a polymerizable monomer and a radical polymerization initiator are known for use in prosthetic treatment of missing teeth, etc. Among such dental polymerization materials, a dental polymerization material using a photopolymerization initiator as the radical polymerization initiator has been proposed (see, for example, Patent Document 1). In detail, the dental polymerization material of Patent Document 1 contains a radical polymerization monomer, an α-diketone compound, an amine compound, and an aryl iodonium salt.
一方、歯科用重合材料は、深部における治療に対応するため、高い硬化深度が求められている。
On the other hand, dental polymer materials require a high hardening depth to accommodate treatment at deep sites.
しかしながら、特許文献1の歯科用重合材料は、光の届かない深部において、硬化が十分でなく、硬化深度が低いという不具合がある。さらに、歯科用重合材料には、咬合力などの力が継続的にかかるため、機械的強度の向上が求められている。
However, the dental polymerized material of Patent Document 1 has the disadvantage that it does not cure sufficiently in deep areas where light does not reach, resulting in a low curing depth. Furthermore, because dental polymerized materials are continuously subjected to forces such as occlusal force, there is a demand for improved mechanical strength.
本発明は、高い硬化深度を有し、さらに、機械的強度に優れる歯科用重合材料を提供することにある。
The present invention aims to provide a dental polymeric material that has a high hardening depth and excellent mechanical strength.
本発明[1]は歯科治療において、酸性基を有さずエチレン性不飽和基を有する非酸性モノマーを重合させるための歯科用重合材料であって、光酸発生剤と、遷移金属化合物と、還元剤とを含有し、前記遷移金属化合物は、前記歯科用重合材料中において固体であり、前記光酸発生剤が分解することにより生じる酸で溶解可能である歯科用重合材料を含んでいる。
The present invention [1] is a dental polymerizable material for polymerizing a non-acidic monomer having no acidic group and an ethylenically unsaturated group in dental treatment, the dental polymerizable material containing a photoacid generator, a transition metal compound, and a reducing agent, the transition metal compound being solid in the dental polymerizable material, and being soluble in the acid generated by decomposition of the photoacid generator.
本発明[2]は、前記非酸性モノマーを含有し、酸性モノマーを含有しない、上記[1]に記載の歯科用重合材料を含んでいる。
The present invention [2] includes the dental polymeric material described in [1] above, which contains the non-acidic monomer and does not contain an acidic monomer.
本発明[3]は、前記遷移金属化合物は、周期律表の第4周期に属する遷移金属原子を含有する、上記[1]または[2]に記載の歯科用重合材料を含んでいる。
The present invention [3] includes the dental polymeric material described in [1] or [2] above, in which the transition metal compound contains a transition metal atom belonging to the fourth period of the periodic table.
本発明[4]は、前記遷移金属化合物は、銅化合物、鉄化合物、コバルト化合物、クロム化合物、亜鉛化合物、マンガン化合物、および、バナジウム化合物からなる群から選択される少なくとも1つである、上記[1]~[3]のいずれか一項に記載の歯科用重合材料を含んでいる。
The present invention [4] includes a dental polymeric material according to any one of [1] to [3] above, in which the transition metal compound is at least one selected from the group consisting of copper compounds, iron compounds, cobalt compounds, chromium compounds, zinc compounds, manganese compounds, and vanadium compounds.
本発明[5]は、前記光酸発生剤は、前記非酸性モノマーに可溶である、上記[1]~[4]のいずれか一項に記載の歯科用重合材料を含んでいる。
The present invention [5] includes a dental polymerizable material according to any one of [1] to [4] above, in which the photoacid generator is soluble in the non-acidic monomer.
本発明[6]は、さらに、フィラーを含む、上記[1]~[5]のいずれか一項に記載の歯科用重合材料を含んでいる。
The present invention [6] further includes a dental polymeric material according to any one of [1] to [5] above, which contains a filler.
本発明[7]は、さらに、光増感剤を含む、上記[1]~[6]のいずれか一項に記載の歯科用重合材料を含んでいる。
The present invention [7] further includes a dental polymeric material according to any one of [1] to [6] above, which contains a photosensitizer.
本発明[8]は、さらに、光重合開始剤を含む、上記[1]~[7]のいずれか一項に記載の歯科用重合材料を含んでいる。
The present invention [8] further includes a dental polymerizable material according to any one of [1] to [7] above, which contains a photopolymerization initiator.
本発明[9]は、1剤型である、上記[1]~[8]のいずれか一項に記載の歯科用重合材料を含んでいる。
The present invention [9] includes a dental polymeric material described in any one of [1] to [8] above, which is a one-component type.
本発明の歯科用重合材料は、光照射によって、光酸発生剤が分解し、ラジカルと酸とが発生する。光酸発生剤から発生したラジカルにより、非酸性モノマーが光重合する。さらに、光酸発生剤から発生した酸が、遷移金属化合物を溶解することで、遷移金属イオンを発生する。発生した遷移金属イオンと還元剤が化学反応をし、ラジカルを発生する。化学反応により発生したラジカルにより、非酸性モノマーが化学重合する。光重合および化学重合が併せて起こるため、重合度が上がり、機械的強度が向上する。また、光重合および化学重合で発生する、重合熱により、光が直接届かない深部においても、光酸発生剤に分解し、重合が進む(フロンタル重合)ため、高い硬化深度を有する。
In the dental polymerizable material of the present invention, the photoacid generator decomposes upon irradiation with light, generating radicals and acid. The radicals generated from the photoacid generator photopolymerize the nonacidic monomer. Furthermore, the acid generated from the photoacid generator dissolves the transition metal compound, generating transition metal ions. The generated transition metal ions react chemically with a reducing agent to generate radicals. The radicals generated by the chemical reaction chemically polymerize the nonacidic monomer. Since photopolymerization and chemical polymerization occur simultaneously, the degree of polymerization increases and the mechanical strength improves. In addition, the heat of polymerization generated by photopolymerization and chemical polymerization causes decomposition into the photoacid generator, and polymerization proceeds (frontal polymerization) even in deep areas where light does not directly reach, resulting in a high cure depth.
<1剤型歯科用重合材料>
本発明における、歯科用重合材料として、例えば、1剤型歯科用重合材料が挙げられる。 <One-component dental polymerizable material>
In the present invention, the dental polymerization material may be, for example, a one-component dental polymerization material.
本発明における、歯科用重合材料として、例えば、1剤型歯科用重合材料が挙げられる。 <One-component dental polymerizable material>
In the present invention, the dental polymerization material may be, for example, a one-component dental polymerization material.
1剤型歯科用重合材料は、2剤型歯科用重合材料と異なり、使用前の混合が不要である。1剤型歯科用重合材料が、自己接着性を有する場合、歯質に直接塗布して使用可能である。それに対して、1剤型歯科用重合材料が、自己接着性を有さない場合、前処理材と組み合わせて、使用可能である。
Unlike two-component dental polymerization materials, one-component dental polymerization materials do not require mixing before use. If the one-component dental polymerization material has self-adhesive properties, it can be used by applying it directly to tooth structure. On the other hand, if the one-component dental polymerization material does not have self-adhesive properties, it can be used in combination with a pretreatment material.
なお、「自己接着性」とは、前処理材を歯質に塗布しなくても、歯質に対して十分な接着性を有することを意味する。
"Self-adhesive" means that the material has sufficient adhesion to tooth structure even without applying a pretreatment material to the tooth structure.
また、前処理材は、歯科治療において、例えば、1剤型歯科用重合材料と、補綴物および歯質の少なくとも一方との接着性を向上させるために用いられる。
In addition, pretreatment materials are used in dental treatment, for example, to improve the adhesion between one-component dental polymerizable materials and at least one of a prosthesis and tooth structure.
1剤型歯科用重合材料として、例えば、1剤型重合性コンポジットレジン、および、1剤型重合性セメントが挙げられる。1剤型重合性コンポジットレジンは、歯科治療において、歯の欠損部を充填に用いられる。1剤型重合性セメントは、歯の欠損部位への補綴物の接着に用いられる。
Examples of one-component dental polymerizable materials include one-component polymerizable composite resins and one-component polymerizable cements. One-component polymerizable composite resins are used in dental treatment to fill missing teeth. One-component polymerizable cements are used to attach prosthetic devices to missing teeth.
本発明における、1剤型歯科用重合材料は、酸性基を有さずエチレン性不飽和基を有する非酸性モノマーを重合させるために、必須成分として、光酸発生剤と、遷移金属化合物と、還元剤とを含有する。
The one-component dental polymerizable material of the present invention contains a photoacid generator, a transition metal compound, and a reducing agent as essential components for polymerizing a non-acidic monomer that does not have an acidic group but has an ethylenically unsaturated group.
また、1剤型歯科用重合材料は、好ましくは、非酸性モノマーを含有し、酸性モノマーを含有しない。
In addition, the one-component dental polymeric material preferably contains a non-acidic monomer and does not contain an acidic monomer.
1剤型歯科用重合材料は、非酸性モノマー、および、酸性モノマーを含有しなくてもよい。この場合、1剤型歯科用重合材料は、モノマーを重合させるために用いられる。
The one-component dental polymerization material may not contain non-acidic monomers and may not contain acidic monomers. In this case, the one-component dental polymerization material is used to polymerize the monomers.
[非酸性モノマー]
非酸性モノマーは、酸性基を有さず、エチレン性不飽和基を有する。 [Non-acidic monomers]
Non-acidic monomers do not have an acidic group and have an ethylenically unsaturated group.
非酸性モノマーは、酸性基を有さず、エチレン性不飽和基を有する。 [Non-acidic monomers]
Non-acidic monomers do not have an acidic group and have an ethylenically unsaturated group.
エチレン性不飽和基として、例えば、アクリロイル基、メタクリロイル基、および、ビニル基が挙げられる。
Examples of ethylenically unsaturated groups include acryloyl groups, methacryloyl groups, and vinyl groups.
なお、以下の説明において、「アクリロイル」および「メタクリロイル」を「(メタ)アクリロイル」と記載する。また、「アクリレート」および「メタクリレート」を「(メタ)アクリレート」と記載する。
In the following explanation, "acryloyl" and "methacryloyl" will be written as "(meth)acryloyl". Also, "acrylate" and "methacrylate" will be written as "(meth)acrylate".
非酸性モノマーは、水酸基を有する非酸性モノマーと、ウレタン結合を有する非酸性モノマーと、水酸基およびウレタン結合を有さない非酸性モノマーとに分類される酸性基を有さないモノマーである。
Non-acidic monomers are monomers that do not have an acidic group and are classified into non-acidic monomers that have a hydroxyl group, non-acidic monomers that have a urethane bond, and non-acidic monomers that do not have a hydroxyl group or a urethane bond.
水酸基を有する非酸性モノマーとして、例えば、モノ(メタ)アクリレート、および、ジ(メタ)アクリレートが挙げられる。
Examples of non-acidic monomers having a hydroxyl group include mono(meth)acrylates and di(meth)acrylates.
水酸基を有するモノ(メタ)アクリレートとして、例えば、2-ヒドロキシエチル(メタ)アクリレート、3-ヒドロキシプロピル(メタ)アクリレート、6-ヒドロキシヘキシル(メタ)アクリレート、および、ジヒドロキシプロピルモノ(メタ)アクリレートが挙げられる。水酸基を有するモノ(メタ)アクリレートとして、好ましくは、2-ヒドロキシエチル(メタ)アクリレートが挙げられる。
Examples of mono(meth)acrylates having a hydroxyl group include 2-hydroxyethyl(meth)acrylate, 3-hydroxypropyl(meth)acrylate, 6-hydroxyhexyl(meth)acrylate, and dihydroxypropyl mono(meth)acrylate. A preferred example of a mono(meth)acrylate having a hydroxyl group is 2-hydroxyethyl(meth)acrylate.
水酸基を有するジ(メタ)アクリレートとして、例えば、ビスフェノールA誘導体が挙げられる。水酸基を有するビスフェノールA誘導体として、例えば、2,2-ビス[4-(3-(メタ)アクリロイルオキシ-2-ヒドロキシプロポキシ)フェニル]プロパン(Bis-GMA)が挙げられる。
An example of a di(meth)acrylate having a hydroxyl group is a bisphenol A derivative. An example of a bisphenol A derivative having a hydroxyl group is 2,2-bis[4-(3-(meth)acryloyloxy-2-hydroxypropoxy)phenyl]propane (Bis-GMA).
ウレタン結合を有する非酸性モノマーとして、例えば、[2,2,4-トリメチルヘキサメチレンビス(2-カルバモイルオキシエチル)]ジ(メタ)アクリレート(UDMA)が挙げられる。
An example of a non-acidic monomer having a urethane bond is [2,2,4-trimethylhexamethylenebis(2-carbamoyloxyethyl)]di(meth)acrylate (UDMA).
水酸基およびウレタン結合を有さない非酸性モノマーとして、例えば、モノ(メタ)アクリレート、および、ジ(メタ)アクリレートが挙げられる。
Examples of non-acidic monomers that do not have a hydroxyl group or a urethane bond include mono(meth)acrylates and di(meth)acrylates.
水酸基およびウレタン結合を有さないモノ(メタ)アクリレートとして、例えば、アルキル(メタ)アクリレートが挙げられる。アルキル(メタ)アクリレートとして、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、および、ブチル(メタ)アクリレートが挙げられる。
Examples of mono(meth)acrylates that do not have a hydroxyl group or a urethane bond include alkyl(meth)acrylates. Examples of alkyl(meth)acrylates include methyl(meth)acrylate, ethyl(meth)acrylate, and butyl(meth)acrylate.
水酸基およびウレタン結合を有さないジ(メタ)アクリレートとして、例えば、アルカンジオールジ(メタ)アクリレート、ポリオキシアルキレン基含有ジ(メタ)アクリレート、および、ビスフェノールA誘導体が挙げられる。
Examples of di(meth)acrylates that do not have hydroxyl groups or urethane bonds include alkanediol di(meth)acrylates, polyoxyalkylene group-containing di(meth)acrylates, and bisphenol A derivatives.
アルカンジオールジ(メタ)アクリレートとして、例えば、エチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、および、ネオペンチルグリコールジ(メタ)アクリレートが挙げられる。
Examples of alkanediol di(meth)acrylates include ethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, and neopentyl glycol di(meth)acrylate.
ポリオキシアルキレン基含有ジ(メタ)アクリレートとして、例えば、ポリオキシエチレン基含有ジ(メタ)アクリレートが挙げられる。
An example of a polyoxyalkylene group-containing di(meth)acrylate is a polyoxyethylene group-containing di(meth)acrylate.
ポリオキシエチレン基含有ジ(メタ)アクリレートとして、例えば、トリエチレングリコールジ(メタ)アクリレート、テトラエチレングリコールジ(メタ)アクリレート、および、ノナエチレングリコールジ(メタ)アクリレートが挙げられ、好ましくは、トリエチレングリコールジ(メタ)アクリレート(TEGDMA)が挙げられる。
Examples of polyoxyethylene group-containing di(meth)acrylates include triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, and nonaethylene glycol di(meth)acrylate, and preferably triethylene glycol di(meth)acrylate (TEGDMA).
水酸基およびウレタン結合を有さないビスフェノールA誘導体として、例えば、エチレンオキサイド変性ビスフェノールAジ(メタ)アクリレートが挙げられる。
An example of a bisphenol A derivative that does not have a hydroxyl group or a urethane bond is ethylene oxide-modified bisphenol A di(meth)acrylate.
非酸性モノマーは、単独使用または2種類以上併用できる。非酸性モノマーは、2種類以上併用することが好ましい。
Non-acidic monomers can be used alone or in combination of two or more types. It is preferable to use two or more types of non-acidic monomers in combination.
非酸性モノマーとして、例えば、UDMAおよびTEGDMAの併用が挙げられる。
An example of a non-acidic monomer is the combination of UDMA and TEGDMA.
1剤型歯科用重合材料中の非酸性モノマーの配合割合は、例えば、5質量%以上、好ましくは、10質量%以上、より好ましくは、15質量%以上、さらに好ましくは、20質量%以上、とりわけ好ましくは、25質量%以上であり、また、例えば、95質量%以下、好ましくは、80質量%以下、より好ましくは、65質量%以下、さらに好ましくは、50質量%以下、とりわけ好ましくは、40質量%以下である。
The proportion of non-acidic monomer in the one-component dental polymeric material is, for example, 5% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more, even more preferably 20% by mass or more, particularly preferably 25% by mass or more, and, for example, 95% by mass or less, preferably 80% by mass or less, more preferably 65% by mass or less, even more preferably 50% by mass or less, particularly preferably 40% by mass or less.
1剤型歯科用重合材料において、非酸性モノマーの含有量は、光酸発生剤100質量部に対して、例えば、500質量部以上、好ましくは、1000質量部以上、より好ましくは、1500質量部以上、また、例えば、5000質量部以下、好ましくは、4000質量部以下、より好ましくは、3000質量部以下である。
In one-component dental polymerizable materials, the content of the non-acidic monomer is, for example, 500 parts by mass or more, preferably 1000 parts by mass or more, more preferably 1500 parts by mass or more, and for example, 5000 parts by mass or less, preferably 4000 parts by mass or less, more preferably 3000 parts by mass or less, per 100 parts by mass of the photoacid generator.
[光酸発生剤]
光酸発生剤は、可視光および/または紫外線などの光を受けることによって、分解し、ラジカルおよび酸を発生する化合物である。詳しくは後述するが、光酸発生剤から発生したラジカルにより、非酸性モノマーが光重合する。さらに、光酸発生剤から発生した酸が、遷移金属化合物を溶解し、遷移金属イオンを発生する。発生した遷移金属イオンと還元剤が化学反応し、ラジカルを発生する。化学反応で発生したラジカルにより、非酸性モノマーが化学重合する。 [Photoacid generator]
A photoacid generator is a compound that decomposes when exposed to light such as visible light and/or ultraviolet light, generating radicals and acid. As will be described in detail later, the radicals generated from the photoacid generator photopolymerize non-acidic monomers. Furthermore, the acid generated from the photoacid generator dissolves transition metal compounds and generates transition metal ions. The generated transition metal ions react chemically with a reducing agent to generate radicals. The radicals generated by the chemical reaction chemically polymerize the non-acidic monomers.
光酸発生剤は、可視光および/または紫外線などの光を受けることによって、分解し、ラジカルおよび酸を発生する化合物である。詳しくは後述するが、光酸発生剤から発生したラジカルにより、非酸性モノマーが光重合する。さらに、光酸発生剤から発生した酸が、遷移金属化合物を溶解し、遷移金属イオンを発生する。発生した遷移金属イオンと還元剤が化学反応し、ラジカルを発生する。化学反応で発生したラジカルにより、非酸性モノマーが化学重合する。 [Photoacid generator]
A photoacid generator is a compound that decomposes when exposed to light such as visible light and/or ultraviolet light, generating radicals and acid. As will be described in detail later, the radicals generated from the photoacid generator photopolymerize non-acidic monomers. Furthermore, the acid generated from the photoacid generator dissolves transition metal compounds and generates transition metal ions. The generated transition metal ions react chemically with a reducing agent to generate radicals. The radicals generated by the chemical reaction chemically polymerize the non-acidic monomers.
また、光酸発生剤は、好ましくは、上記した非酸性モノマーに可溶である。
The photoacid generator is preferably soluble in the non-acidic monomers described above.
光酸発生剤として、例えば、イオン性光酸発生剤、および、非イオン性光酸発生剤が挙げられる。
Examples of photoacid generators include ionic photoacid generators and nonionic photoacid generators.
イオン性光酸発生剤として、例えば、ヨードニウム塩化合物、および、スルホニウム塩化合物が挙げられる。
Ionic photoacid generators include, for example, iodonium salt compounds and sulfonium salt compounds.
ヨードニウム塩化合物として、例えば、ジアリールヨードニウム化合物が挙げられる。
Examples of iodonium salt compounds include diaryliodonium compounds.
ジアリールヨードニウム塩化合物は、下記一般式(1)で示される化合物である。
The diaryliodonium salt compound is a compound represented by the following general formula (1).
(式中、R1~R4は、水素原子、ハロゲン原子、アルキル基、アリール基、アルケニル基、アルコキシ基、アリールオキシ基、または、ニトロ基を示し、Xはアニオンを示す。)
上記一般式(1)において、R1~R4は、互いに同一または相異なって、水素原子、ハロゲン原子、アルキル基、アリール基、アルケニル基、アルコキシ基、アリールオキシ基、または、ニトロ基を示し、かつ、Xはアニオンを示す。 (In the formula, R1 to R4 each represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkenyl group, an alkoxy group, an aryloxy group, or a nitro group, and X represents an anion.)
In the above general formula (1), R1 to R4 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkenyl group, an alkoxy group, an aryloxy group, or a nitro group, and X represents an anion.
上記一般式(1)において、R1~R4は、互いに同一または相異なって、水素原子、ハロゲン原子、アルキル基、アリール基、アルケニル基、アルコキシ基、アリールオキシ基、または、ニトロ基を示し、かつ、Xはアニオンを示す。 (In the formula, R1 to R4 each represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkenyl group, an alkoxy group, an aryloxy group, or a nitro group, and X represents an anion.)
In the above general formula (1), R1 to R4 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkenyl group, an alkoxy group, an aryloxy group, or a nitro group, and X represents an anion.
ハロゲン原子として、例えば、フルオロ基、クロロ基、ブロモ基、および、ヨード基が挙げられる。
Halogen atoms include, for example, fluoro, chloro, bromo, and iodine groups.
アルキル基として、例えば、炭素数1~20の炭化水素基が挙げられる。具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、sec-ブチル基、ペンチル基、イソペンチル基、および、ヘキシル基が挙げられる。
Examples of alkyl groups include hydrocarbon groups having 1 to 20 carbon atoms. Specific examples include methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, pentyl, isopentyl, and hexyl groups.
アリール基として、例えば、炭素数6~14の炭化水素基が挙げられる。具体的には、フェニル基、p-メチルフェニル基、p-クロロフェニル基、および、ナフチル基が挙げられる。
Aryl groups include, for example, hydrocarbon groups having 6 to 14 carbon atoms. Specific examples include phenyl groups, p-methylphenyl groups, p-chlorophenyl groups, and naphthyl groups.
アルケニル基として、例えば、炭素数1~6の炭化水素基が挙げられる。具体的には、ビニル基、アリル基、イソプロペニル基、ブテニル基、2-フェニルエテニル基、および、2-(置換フェニル)エテニル基が挙げられる。
Examples of alkenyl groups include hydrocarbon groups having 1 to 6 carbon atoms. Specific examples include vinyl groups, allyl groups, isopropenyl groups, butenyl groups, 2-phenylethenyl groups, and 2-(substituted phenyl)ethenyl groups.
アルコキシ基として、例えば、炭素数1~6のアルコキシ基が挙げられる。具体的には、メトキシ基、エトキシ基、プロポキシ基、および、ブトキシ基が挙げられる。
Examples of alkoxy groups include alkoxy groups having 1 to 6 carbon atoms. Specific examples include methoxy, ethoxy, propoxy, and butoxy groups.
アリールオキシ基として、例えば、炭素数6~14のアリールオキシ基が挙げられる。具体的には、フェノキシ、p-メトキシフェニル、および、p-オクチルオキシフェニルが挙げられる。
Aryloxy groups include, for example, aryloxy groups having 6 to 14 carbon atoms. Specific examples include phenoxy, p-methoxyphenyl, and p-octyloxyphenyl.
R1~R4は、好ましくは、水素原子、または、アルキル基である。
R1 to R4 are preferably hydrogen atoms or alkyl groups.
ジアリールヨードニウム塩化合物として、例えば、ジフェニルヨードニウム、ビス(p-クロロフェニル)ヨードニウム、ジトリルヨードニウム、ビス(p-tert-ブチルフェニル)ヨードニウム、p-イソプロピルフェニル-p-メチルフェニルヨードニウム、ビス(m-ニトロフェニル)ヨードニウム、p-tert-ブチルフェニルフェニルヨードニウム、p-メトキシフェニルフェニルヨードニウム、ビス(p-メトキシフェニル)ヨードニウム、および、p-オクチルオキシフェニルフェニルヨードニウムのカチオンと、クロリド、ブロミド、p-トルエンスルホナート、トリフルオロメタンスルホナート、トリフルオロトリス(ペンタフルオロエチル)フォスフェート、テトラフルオロボレート、テトラキスペンタフルオロフェニルボレート、テトラキスペンタフルオロフェニルガレート、ヘキサフルオロフォスフェート、ヘキサフルオロアルセナート、ヘキサフルオロアンチモネート、ノナフルオロブタンスルポナートのアニオンとからなるジアリールヨードニウム塩化合物が挙げられる。ジアリールヨードニウム塩化合物として、好ましくは、p-イソプロピルフェニル-p-メチルフェニルヨードニウムのカチオンと、トリフルオロトリス(ペンタフルオロエチル)フォスフェートのアニオンからなるジアリールヨードニウム塩化合物が挙げられる。
Examples of diaryliodonium salt compounds include diaryliodonium salt compounds consisting of cations of diphenyliodonium, bis(p-chlorophenyl)iodonium, ditolyliodonium, bis(p-tert-butylphenyl)iodonium, p-isopropylphenyl-p-methylphenyliodonium, bis(m-nitrophenyl)iodonium, p-tert-butylphenylphenyliodonium, p-methoxyphenylphenyliodonium, bis(p-methoxyphenyl)iodonium, and p-octyloxyphenylphenyliodonium, and anions of chloride, bromide, p-toluenesulfonate, trifluoromethanesulfonate, trifluorotris(pentafluoroethyl)phosphate, tetrafluoroborate, tetrakispentafluorophenylborate, tetrakispentafluorophenylgallate, hexafluorophosphate, hexafluoroarsenate, hexafluoroantimonate, and nonafluorobutanesulfonate. A preferred diaryliodonium salt compound is a diaryliodonium salt compound consisting of a p-isopropylphenyl-p-methylphenyliodonium cation and a trifluorotris(pentafluoroethyl)phosphate anion.
スルホニウム塩化合物として、例えば、ジメチルフェナシルスルホニウム、ジメチルベンジルスルホニウム、ジメチル-4-ヒドロキシフェニルスルホニウム、ジメチル-4-ヒドロキシナフチルスルホニウム、ジメチル-4,7-ジヒドロキシナフチルスルホニウム、ジメチル-4,8-ジヒドロキシナフチルスルホニウム、トリフェニルスルホニウム、p-トリルジフェニルスルホニウム、p-tert-ブチルフェニルジフェニルスルホニウム、および、ジフェニル-4-フェニルチオフェニルスルホニウムのクロリド、ブロミド、p-トルエンスルホナート、トリフルオロメタンスルホナート、テトラフルオロボレート、テトラキスペンタフルオロフェニルボレート、テトラキスペンタフルオロフェニルガレート、ヘキサフルオロフォスフェート、ヘキサフルオロアルセナート、および、ヘキサフルオロアンチモネート塩が挙げられる。
Sulfonium salt compounds include, for example, dimethylphenacylsulfonium, dimethylbenzylsulfonium, dimethyl-4-hydroxyphenylsulfonium, dimethyl-4-hydroxynaphthylsulfonium, dimethyl-4,7-dihydroxynaphthylsulfonium, dimethyl-4,8-dihydroxynaphthylsulfonium, triphenylsulfonium, p-tolyldiphenylsulfonium, p-tert-butylphenyldiphenylsulfonium, and diphenyl-4-phenylthiophenylsulfonium chloride, bromide, p-toluenesulfonate, trifluoromethanesulfonate, tetrafluoroborate, tetrakispentafluorophenylborate, tetrakispentafluorophenylgallate, hexafluorophosphate, hexafluoroarsenate, and hexafluoroantimonate salts.
イオン性光酸発生剤として、好ましくは、ヨードニウム塩化合物が挙げられる。
Ionic photoacid generators are preferably iodonium salt compounds.
非イオン性光酸発生剤として、例えば、トリハロメチル基を置換基として有するs-トリアジン化合物、ジアゾメタン化合物、スルホン化合物、スルホン酸エステル化合物、および、アリールスルホン酸エステル化合物が挙げられる。
Nonionic photoacid generators include, for example, s-triazine compounds having a trihalomethyl group as a substituent, diazomethane compounds, sulfone compounds, sulfonate compounds, and arylsulfonate compounds.
トリハロメチル基を置換基として有するs-トリアジン化合物として、例えば、2,4,6-トリス(トリクロロメチル)-s-トリアジン、2,4,6-トリス(トリブロモメチル)-s-トリアジン、2-メチル-4,6-ビス(トリクロロメチル)-s-トリアジン、2-メチル-4,6-ビス(トリブロモメチル)-s-トリアジン、2-フェニル-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(p-メトキシフェニル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(p-メチルチオフェニル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(p-クロロフェニル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(2,4-ジクロロフェニル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(p-ブロモフェニル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(p-トリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-n-プロピル-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(α,α,β-トリクロロエチル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-スチリル-4,6-ビス(トリクロロメチル)-s-トリアジン、2-[2-(p-メトキシフェニル)エテニル]-4,6-ビス(トリクロロメチル)-s-トリアジン、2-[2-(o-メトキシフェニル)エテニル]-4,6-ビス(トリクロロメチル)-s-トリアジン、2-[2-(p-ブトキシフェニル)エテニル]-4,6-ビス(トリクロロメチル)-s-トリアジン、2-[2-(3,4-ジメトキシフェニル)エテニル]-4,6-ビス(トリクロロメチル)-s-トリアジン、2-[2-(3,4,5-トリメトキシフェニル)エテニル]-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(1-ナフチル)-4,6-ビス(トリクロロメチル)-s-トリアジン、および、2-(4-ビフェニリル)-4,6-ビス(トリクロロメチル)-s-トリアジンを挙げられる。
Examples of s-triazine compounds having a trihalomethyl group as a substituent include 2,4,6-tris(trichloromethyl)-s-triazine, 2,4,6-tris(tribromomethyl)-s-triazine, 2-methyl-4,6-bis(trichloromethyl)-s-triazine, 2-methyl-4,6-bis(tribromomethyl)-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methylthiophenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-chlorophenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2,4-dichlorophenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-bromophenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-n-propyl-4 ,6-bis(trichloromethyl)-s-triazine, 2-(α,α,β-trichloroethyl)-4,6-bis(trichloromethyl)-s-triazine, 2-styryl-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(p-methoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(o-methoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(p-butoxyphenyl)ethenyl ]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(3,4,5-trimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-(1-naphthyl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(4-biphenylyl)-4,6-bis(trichloromethyl)-s-triazine.
ジアゾメタン化合物として、例えば、ビス(シクロヘキシルスルホニル)ジアゾメタン、ビス(tert-ブチルスルホニル)ジアゾメタン、および、ビス(4-メチルフェニルスルホニル)ジアゾメタンが挙げられる
Diazomethane compounds include, for example, bis(cyclohexylsulfonyl)diazomethane, bis(tert-butylsulfonyl)diazomethane, and bis(4-methylphenylsulfonyl)diazomethane.
スルホン化合物として、例えば、2-メチル-2-([4-メチルフェニル]スルホニル)-1-(4-[メチルチオ]フェニル)-1-プロパノンが挙げられる。
An example of a sulfone compound is 2-methyl-2-([4-methylphenyl]sulfonyl)-1-(4-[methylthio]phenyl)-1-propanone.
スルホン酸エステル化合物、および、アリールスルホン酸エステル化合物として、例えば、ベンゾイントシレート、α-メチロールベンゾイントシレート、o-ニトロベンジルp-トルエンスルホナート、および、p-ニトロベンジル-9,10-ジエトキシアントラセン-2-スルホナートを挙げられる。
Examples of sulfonic acid ester compounds and arylsulfonic acid ester compounds include benzoin tosylate, α-methylolbenzoin tosylate, o-nitrobenzyl p-toluenesulfonate, and p-nitrobenzyl-9,10-diethoxyanthracene-2-sulfonate.
光酸発生剤は、単独使用または2種類以上併用できる。
Photoacid generators can be used alone or in combination of two or more types.
1剤型歯科用重合材料中の光酸発生剤の配合割合は、例えば、0.1質量%以上、好ましくは、0.5質量%以上、より好ましくは、1.0質量%以上、さらに好ましくは、1.5質量%以上であり、また、例えば、10質量%以下、好ましくは、5質量%以下、より好ましくは、3質量%以下である。
The proportion of the photoacid generator in the one-component dental polymerizable material is, for example, 0.1% by mass or more, preferably 0.5% by mass or more, more preferably 1.0% by mass or more, and even more preferably 1.5% by mass or more, and is, for example, 10% by mass or less, preferably 5% by mass or less, and more preferably 3% by mass or less.
1剤型歯科用重合材料において、光酸発生剤の含有量は、非酸性モノマー100質量部に対して、例えば、1質量部以上、好ましくは、3質量部以上、より好ましくは、5質量部以上、また、例えば、30質量部以下、好ましくは、20質量部以下、より好ましくは、10質量部以下である。
In one-component dental polymerizable materials, the content of the photoacid generator is, for example, 1 part by mass or more, preferably 3 parts by mass or more, more preferably 5 parts by mass or more, and for example, 30 parts by mass or less, preferably 20 parts by mass or less, more preferably 10 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
[遷移金属化合物]
遷移金属化合物の少なくとも一部は、酸に可溶である。好ましくは、遷移金属化合物の全部は、酸に可溶である。遷移金属化合物は、1剤型歯科用重合材料中の光酸発生剤の分解により生じる酸に溶解可能である。酸に溶解することによって、遷移金属イオンを生じる。遷移金属イオンは、還元剤と化学反応し、ラジカルを発生する。発生したラジカルにより、非酸性モノマーが重合する。 [Transition metal compounds]
At least a part of the transition metal compound is soluble in acid. Preferably, the entire transition metal compound is soluble in acid. The transition metal compound is soluble in acid generated by decomposition of a photoacid generator in a one-component dental polymerizable material. By dissolving in acid, transition metal ions are generated. The transition metal ions react chemically with a reducing agent to generate radicals. The generated radicals polymerize non-acidic monomers.
遷移金属化合物の少なくとも一部は、酸に可溶である。好ましくは、遷移金属化合物の全部は、酸に可溶である。遷移金属化合物は、1剤型歯科用重合材料中の光酸発生剤の分解により生じる酸に溶解可能である。酸に溶解することによって、遷移金属イオンを生じる。遷移金属イオンは、還元剤と化学反応し、ラジカルを発生する。発生したラジカルにより、非酸性モノマーが重合する。 [Transition metal compounds]
At least a part of the transition metal compound is soluble in acid. Preferably, the entire transition metal compound is soluble in acid. The transition metal compound is soluble in acid generated by decomposition of a photoacid generator in a one-component dental polymerizable material. By dissolving in acid, transition metal ions are generated. The transition metal ions react chemically with a reducing agent to generate radicals. The generated radicals polymerize non-acidic monomers.
遷移金属化合物は、周期律表の第4周期に属する遷移金属原子を含有する。なお、周期律表は、IUPAC Periodic Table of the Elements(version date 1 December 2018)である。
The transition metal compound contains a transition metal atom that belongs to the fourth period of the periodic table. The periodic table is the IUPAC Periodic Table of the Elements (version date 1 December 2018).
遷移金属原子として、具体的には、スカンジウム(Sc)、チタン(Ti)、バナジウム(V)、クロム(Cr)、マンガン(Mn)、鉄(Fe)、コバルト(Co)、ニッケル(Ni)、銅(Cu)、亜鉛(Zn)、および、ガリウム(Ga)が挙げられる。遷移金属原子として、好ましくは、バナジウム(V)、クロム(Cr)、マンガン(Mn)、鉄(Fe)、コバルト(Co)、銅(Cu)、および、亜鉛(Zn)が挙げられ、より好ましくは、銅(Cu)が挙げられる。
Specific examples of transition metal atoms include scandium (Sc), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), and gallium (Ga). Preferred examples of transition metal atoms include vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), copper (Cu), and zinc (Zn), and more preferably copper (Cu).
遷移金属化合物として、例えば、遷移金属の酸化物、水酸化物、ハロゲン化物、カルボン酸塩、硫酸塩、硝酸塩、炭酸塩、錯体が挙げられる。ハロゲン化物として、例えば、塩化物、臭化物が挙げられる。カルボン酸塩として、例えば、ギ酸塩、酢酸塩、オレイン酸、アクリル酸塩、グルコン酸塩、フタル酸塩、および、クエン酸塩が挙げられる。
Examples of transition metal compounds include oxides, hydroxides, halides, carboxylates, sulfates, nitrates, carbonates, and complexes of transition metals. Examples of halides include chlorides and bromides. Examples of carboxylates include formates, acetates, oleates, acrylates, gluconates, phthalates, and citrates.
遷移金属の錯体は、中心金属としての遷移金属原子と、遷移金属原子に配位する配位子とを有する。
Transition metal complexes have a transition metal atom as the central metal and ligands that coordinate to the transition metal atom.
配位子として、例えば、ジケトン系配位子、アミン系配位子、チオール系配位子、尿素系配位子および、チオ尿素系配位子が挙げられる。ジケトン系配位子として、例えば、アセチルアセトナートが挙げられる。アミン系配位子として、例えば、アルカンジアミン、ベンズイミダゾール、ベンゾチアゾールが挙げられる。チオール系配位子として、例えば、メルカプトエタノール、メルカプトトリアゾール、メルカプトベンゾチアゾール、および、メルカプトベンゾイミダゾールが挙げられる。尿素系配位子として、例えば、尿素、および、エチレン尿素が挙げられる。チオ尿素系配位子として、例えば、チオ尿素、アセチルチオ尿素、ピリジルチオ尿素、および、エチレンチオ尿素が挙げられる。
Examples of the ligands include diketone-based ligands, amine-based ligands, thiol-based ligands, urea-based ligands, and thiourea-based ligands. Examples of the diketone-based ligands include acetylacetonate. Examples of the amine-based ligands include alkanediamines, benzimidazole, and benzothiazole. Examples of the thiol-based ligands include mercaptoethanol, mercaptotriazole, mercaptobenzothiazole, and mercaptobenzimidazole. Examples of the urea-based ligands include urea and ethyleneurea. Examples of the thiourea-based ligands include thiourea, acetylthiourea, pyridylthiourea, and ethylenethiourea.
遷移金属化合物として、例えば、銅化合物、鉄化合物、コバルト化合物、クロム化合物、亜鉛化合物、マンガン化合物、および、バナジウム化合物が挙げられる。換言すれば、遷移金属化合物は、例えば、銅化合物、鉄化合物、コバルト化合物、クロム化合物、亜鉛化合物、マンガン化合物、および、バナジウム化合物からなる群から選択される少なくとも1つである。
Examples of transition metal compounds include copper compounds, iron compounds, cobalt compounds, chromium compounds, zinc compounds, manganese compounds, and vanadium compounds. In other words, the transition metal compound is at least one selected from the group consisting of copper compounds, iron compounds, cobalt compounds, chromium compounds, zinc compounds, manganese compounds, and vanadium compounds.
銅化合物として、例えば、水酸化銅(II)、塩化銅(I)、塩化銅(II)、臭化銅(I)、臭化銅(II)、ギ酸銅(II)、酢酸銅(I)、酢酸銅(II)、硫酸銅(II)、硝酸銅(II)、ヨウ化銅(I)、塩基性炭酸銅(II)、酸化銅(I)、酸化銅(II)、金属銅、オレイン酸銅(II)、アクリル酸銅(II)、グルコン酸銅(II)、フタル酸銅(II)、クエン酸銅(II)、銅(II)アセチルアセトナート、メルカプトベンゾチアゾール銅、1,3-プロパンジアミン銅、ベンズイミダゾール銅、ベンゾチアゾール銅、および、チオ尿素銅が挙げられる。銅化合物として、好ましくは、水酸化銅(II)が挙げられる。
Examples of copper compounds include copper(II) hydroxide, copper(I) chloride, copper(II) chloride, copper(I) bromide, copper(II) bromide, copper(II) formate, copper(I) acetate, copper(II) acetate, copper(II) sulfate, copper(II) nitrate, copper(II) iodide, basic copper(II) carbonate, copper(I) oxide, copper(II) oxide, metallic copper, copper(II) oleate, copper(II) acrylate, copper(II) gluconate, copper(II) phthalate, copper(II) citrate, copper(II) acetylacetonate, copper mercaptobenzothiazole, copper 1,3-propanediamine, copper benzimidazole, copper benzothiazole, and copper thiourea.
Preferably, copper(II) hydroxide is used.
鉄化合物として、例えば、水酸化鉄(II)、酸化水酸化鉄(III)、塩化鉄(II)、塩化鉄(III)、臭化鉄(I)、臭化鉄(II)、酢酸鉄(II)、酢酸鉄(III)、炭酸鉄(II)、酸化鉄(II)、酸化鉄(III)、酸化鉄(II、III)、金属鉄、硫酸鉄(II)、硫酸鉄(III)、鉄(III)アセチルアセトナート、クエン酸鉄(III)、および、グルコン酸鉄(II)が挙げられる。
Examples of iron compounds include iron(II) hydroxide, iron(III) oxide hydroxide, iron(II) chloride, iron(III) chloride, iron(I) bromide, iron(II) bromide, iron(II) acetate, iron(III) acetate, iron(II) carbonate, iron(II) oxide, iron(III) oxide, iron(II,III) oxide, metallic iron, iron(II) sulfate, iron(III) sulfate, iron(III) acetylacetonate, iron(III) citrate, and iron(II) gluconate.
コバルト化合物として、例えば、水酸化コバルト(II)、塩化コバルト(II)、酢酸コバルト(II)、臭化コバルト(II)、塩基性炭酸コバルト、硫酸コバルト(II)、酸化コバルト(II)、酸化コバルト(III)、酸化コバルト(II、III)、金属コバルト、硝酸コバルト(II)、および、コバルト(III)アセチルアセトナートが挙げられる。
Examples of cobalt compounds include cobalt(II) hydroxide, cobalt(II) chloride, cobalt(II) acetate, cobalt(II) bromide, basic cobalt carbonate, cobalt(II) sulfate, cobalt(II) oxide, cobalt(III) oxide, cobalt(II,III) oxide, metallic cobalt, cobalt(II) nitrate, and cobalt(III) acetylacetonate.
バナジウム化合物として、例えば、塩化バナジウム(III)、臭化バナジウム(III)、金属バナジウム、酸化バナジウム(II)、酸化バナジウム(III)、酸化バナジウム(V)、バナジウム(IV)オキシアセチルアセトナート、バナジウム(III)アセチルアセトナート、シュウ酸オキソバナジウム(IV)、ステアリン酸化バナジウム(IV)、酸化硫酸バナジウム(IV)、バナジン(V)酸アンモニウム、および、オルトバナジン(V)酸ナトリウムが挙げられる。
Examples of vanadium compounds include vanadium(III) chloride, vanadium(III) bromide, metallic vanadium, vanadium(II) oxide, vanadium(III) oxide, vanadium(V) oxide, vanadium(IV) oxyacetylacetonate, vanadium(III) acetylacetonate, oxovanadium(IV) oxalate, vanadium(IV) stearate, vanadium(IV) oxide sulfate, ammonium vanadate(V), and sodium orthovanadate(V).
遷移金属化合物として、好ましくは、銅化合物が挙げられる。
As a transition metal compound, a copper compound is preferably used.
遷移金属化合物は、1剤型歯科用重合材料中において固体である。つまり、1剤型歯科用重合材料は、1剤型歯科用重合材料中の成分、および、保管中の吸湿により獲得し得る水分に不溶な遷移金属化合物の粉粒体を含有する。20℃1気圧において、遷移金属化合物は固体である。20℃1気圧における、水100gに対する遷移金属化合物の溶解量は、例えば、5g以下、好ましくは、4g以下、より好ましくは、3g以下である。すなわち、1剤型歯科用重合材料中において、遷移金属化合物が固体であるとは、遷移金属金属化合物の少なくとも一部が固体であればよく、部分的に溶解していてもよい。粉粒体の平均粒径は限定されないが、過大であると沈降しやすく、過小であると比表面積が過大となり、分散可能な量が減少する。そのため、平均粒径は、例えば、0.01μm以上、好ましくは、0.1μm以上、より好ましくは、1μm以上であり、また、例えば、500μm以下、好ましくは、100μm以下、より好ましくは、50μm以下である。
The transition metal compound is solid in the one-component dental polymerizable material. That is, the one-component dental polymerizable material contains the components in the one-component dental polymerizable material and a powder of a transition metal compound that is insoluble in water and may be obtained by moisture absorption during storage. At 20°C and 1 atm, the transition metal compound is solid. The amount of the transition metal compound dissolved in 100 g of water at 20°C and 1 atm is, for example, 5 g or less, preferably 4 g or less, and more preferably 3 g or less. That is, in the one-component dental polymerizable material, the transition metal compound being solid means that at least a part of the transition metal compound is solid, and may be partially dissolved. The average particle size of the powder is not limited, but if it is too large, it is likely to settle, and if it is too small, the specific surface area becomes too large and the amount that can be dispersed decreases. Therefore, the average particle size is, for example, 0.01 μm or more, preferably 0.1 μm or more, more preferably 1 μm or more, and, for example, 500 μm or less, preferably 100 μm or less, and more preferably 50 μm or less.
遷移金属化合物は、単独使用または2種類以上併用できる。
Transition metal compounds can be used alone or in combination of two or more types.
1剤型歯科用重合材料中の遷移金属化合物の配合割合は、例えば、0.0001質量%以上、好ましくは、0.0005質量%以上、より好ましくは、0.001質量%以上、さらに好ましくは、0.01質量%以上であり、また、例えば、1質量%以下、好ましくは、0.5質量%以下、より好ましくは、0.1質量%以下、さらに好ましくは、0.05質量%以下である。
The blending ratio of the transition metal compound in the one-component dental polymeric material is, for example, 0.0001 mass% or more, preferably 0.0005 mass% or more, more preferably 0.001 mass% or more, even more preferably 0.01 mass% or more, and, for example, 1 mass% or less, preferably 0.5 mass% or less, more preferably 0.1 mass% or less, even more preferably 0.05 mass% or less.
1剤型歯科用重合材料において、遷移金属化合物の含有量は、非酸性モノマー100質量部に対して、例えば、0.01質量部以上、好ましくは、0.03質量部以上、より好ましくは、0.05質量部以上、また、例えば、3質量部以下、好ましくは、1質量部以下、より好ましくは、0.5質量部以下である。
In the one-component dental polymeric material, the content of the transition metal compound is, for example, 0.01 parts by mass or more, preferably 0.03 parts by mass or more, more preferably 0.05 parts by mass or more, and for example, 3 parts by mass or less, preferably 1 part by mass or less, more preferably 0.5 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
1剤型歯科用重合材料において、遷移金属化合物の含有量は、光酸発生剤100質量部に対して、例えば、0.5質量部以上、好ましくは、1.0質量部以上、より好ましくは、1.5質量部以上、また、例えば、8質量部以下、好ましくは、5質量部以下、より好ましくは、3質量部以下である。
In a one-component dental polymerizable material, the content of the transition metal compound is, for example, 0.5 parts by mass or more, preferably 1.0 parts by mass or more, more preferably 1.5 parts by mass or more, and for example, 8 parts by mass or less, preferably 5 parts by mass or less, more preferably 3 parts by mass or less, per 100 parts by mass of the photoacid generator.
[還元剤]
還元剤は、遷移金属イオンを還元する。言い換えると、還元剤は、遷移金属イオンによって酸化される。還元剤が遷移金属イオンによって酸化されることにより、ラジカルを発生する。 [Reducing Agent]
The reducing agent reduces the transition metal ions. In other words, the reducing agent is oxidized by the transition metal ions. The reducing agent is oxidized by the transition metal ions to generate radicals.
還元剤は、遷移金属イオンを還元する。言い換えると、還元剤は、遷移金属イオンによって酸化される。還元剤が遷移金属イオンによって酸化されることにより、ラジカルを発生する。 [Reducing Agent]
The reducing agent reduces the transition metal ions. In other words, the reducing agent is oxidized by the transition metal ions. The reducing agent is oxidized by the transition metal ions to generate radicals.
還元剤として、上記した遷移金属イオンを還元するものであれば、特に制限なく用いられる。還元剤として、例えば、芳香族アミン化合物、スルフィン酸化合物またはその塩、チオ尿素化合物、チオ硫酸化合物、亜リン酸化合物、亜硫酸化合物、(チオ)バルビツール酸化合物またはその塩、アスコルビン酸化合物またはその塩、および、アスコルビン酸のエステル化合物またはその塩が挙げられる。
The reducing agent may be any agent that reduces the above-mentioned transition metal ions, without any particular limitations. Examples of reducing agents include aromatic amine compounds, sulfinic acid compounds or their salts, thiourea compounds, thiosulfate compounds, phosphorous acid compounds, sulfurous acid compounds, (thio)barbituric acid compounds or their salts, ascorbic acid compounds or their salts, and ascorbic acid ester compounds or their salts.
芳香族アミン化合物として、例えば、芳香族第三級アミン、および、芳香族アミノ酸が挙げられる。
Examples of aromatic amine compounds include aromatic tertiary amines and aromatic amino acids.
芳香族第三級アミンとして、例えば、N,N-ジアルキルトルイジン、N,N-ビス(ヒドロキシアルキル)トルイジン、N,N-ジアルキルアニリン、および、ジアルキルアミノ安息香酸エステルが挙げられる。
Examples of aromatic tertiary amines include N,N-dialkyltoluidine, N,N-bis(hydroxyalkyl)toluidine, N,N-dialkylaniline, and dialkylaminobenzoic acid esters.
N,N-ジアルキルトルイジンとして、例えば、N,N-ジメチル-p-トルイジン(DMPT)、および、N,N-ジエチル-p-トルイジンが挙げられる。
Examples of N,N-dialkyl toluidines include N,N-dimethyl-p-toluidine (DMPT) and N,N-diethyl-p-toluidine.
N,N-ビス(ヒドロキシアルキル)トルイジンとして、例えば、N,N-ビス(2-ヒドロキシエチル)-p-トルイジン、および、N,N-ビス(2-ヒドロキシプロピル)-p-トルイジンが挙げられる。
Examples of N,N-bis(hydroxyalkyl)toluidine include N,N-bis(2-hydroxyethyl)-p-toluidine and N,N-bis(2-hydroxypropyl)-p-toluidine.
N,N-ジアルキルアニリンとして、例えば、N,N-ジメチルアニリン、および、N,N-ジエチルアニリンが挙げられる。
Examples of N,N-dialkylanilines include N,N-dimethylaniline and N,N-diethylaniline.
ジアルキルアミノ安息香酸エステルとして、例えば、4-(ジメチルアミノ)安息香酸メチル、4-(ジメチルアミノ)安息香酸エチル(EDAB)、4-(ジメチルアミノ)安息香酸2-ブトキシエチル、および、4-(ジメチルアミノ)安息香酸イソアミルが挙げられる。
Examples of dialkylaminobenzoate esters include methyl 4-(dimethylamino)benzoate, ethyl 4-(dimethylamino)benzoate (EDAB), 2-butoxyethyl 4-(dimethylamino)benzoate, and isoamyl 4-(dimethylamino)benzoate.
芳香族アミノ酸として、例えば、N-フェニルグリシン酸、N-フェニルグリシン酸ナトリウム(SPG)、および、N-フェニルグリシン酸カリウムが挙げられる。
Aromatic amino acids include, for example, N-phenylglycine acid, sodium N-phenylglycine (SPG), and potassium N-phenylglycine.
スルフィン酸化合物、および、その塩として、例えば、芳香族スルフィン酸、および、その塩が挙げられる。芳香族スルフィン酸として、例えば、ベンゼンスルフィン酸、o-トルエンスルフィン酸、p-トルエンスルフィン酸、エチルベンゼンスルフィン酸、デシルベンゼンスルフィン酸、ドデシルベンゼンスルフィン酸、クロロベンゼンスルフィン酸、フルオロベンゼンスルフィン酸、および、ナフタレンスルフィン酸が挙げられる。
Sulfinic acid compounds and their salts include, for example, aromatic sulfinic acids and their salts. Aromatic sulfinic acids include, for example, benzenesulfinic acid, o-toluenesulfinic acid, p-toluenesulfinic acid, ethylbenzenesulfinic acid, decylbenzenesulfinic acid, dodecylbenzenesulfinic acid, chlorobenzenesulfinic acid, fluorobenzenesulfinic acid, and naphthalenesulfinic acid.
芳香族スルフィン酸化合物の塩として、例えば、ベンゼンスルフィン酸リチウム、ベンゼンスルフィン酸ナトリウム、ベンゼンスルフィン酸カリウム、ベンゼンスルフィン酸マグネシウム、ベンゼンスルフィン酸カルシウム、ベンゼンスルフィン酸ストロンチウム、ベンゼンスルフィン酸バリウム、ベンゼンスルフィン酸ブチルアミン塩、ベンゼンスルフィン酸アニリン塩、ベンゼンスルフィン酸トルイジン塩、ベンゼンスルフィン酸フェニレンジアミン塩、ベンゼンスルフィン酸ジエチルアミン塩、ベンゼンスルフィン酸ジフェニルアミン塩、ベンゼンスルフィン酸トリエチルアミン塩、ベンゼンスルフィン酸トリブチルアミン塩、ベンゼンスルフィン酸アンモニウム塩、ベンゼンスルフィン酸テトラメチルアンモニウム、ベンゼンスルフィン酸トリメチルベンジルアンモニウム、o-トルエンスルフィン酸リチウム、o-トルエンスルフィン酸ナトリウム、o-トルエンスルフィン酸カリウム、o-トルエンスルフィン酸カルシウム、o-トルエンスルフィン酸シクロヘキシルアミン塩、o-トルエンスルフィン酸アニリン塩、o-トルエンスルフィ酸アンモニウム塩、o-トルエンスルフィン酸テトラエチルアンモニウム、p-トルエンスルフィン酸リチウム、p-トルエンスルフィン酸ナトリウム(STS)、p-トルエンスルフィン酸カリウム、p-トルエンスルフィン酸カルシウム、p-トルエンスルフィン酸バリウム、p-トルエンスルフィン酸エチルアミン塩、p-トルエンスルフィン酸ブチルアミン塩、p-トルエンスルフィン酸トルイジン塩、p-トルエンスルフィン酸N-メチルアニリン塩、p-トルエンスルフィン酸ピリジン塩、p-トルエンスルフィン酸アンモニウム塩、p-トルエンスルフィン酸テトラメチルアンモニウム、p-トルエンスルフィン酸テトラエチルアンモニウム、p-トルエンスルフィン酸テトラブチルアンモニウム、β-ナフタレンスルフィン酸ナトリウム、β-ナフタレンスルフィン酸ストロンチウム、β-ナフタレンスルフィン酸トリエチルアミン、β-ナフタレンスルフィン酸N-メチルトルイジン、β-ナフタレンスルフィン酸アンモニウム、β-ナフタレンスルフィン酸トリメチルベンジルアンモニウム、p-クロロベンゼンスルフィン酸リチウム、p-クロロベンゼンスルフィン酸ナトリウム、p-クロロベンゼンスルフィン酸カリウム、p-クロロベンゼンスルフィン酸カルシウム、p-クロロベンゼンスルフィン酸バリウム、p-クロロベンゼンスルフィン酸エチルアミン塩、p-クロロベンゼンスルフィン酸ブチルアミン塩、p-クロロベンゼンスルフィン酸トルイジン塩、p-クロロベンゼンスルフィン酸N-メチルアニリン塩、p-クロロベンゼンスルフィン酸ピリジン塩、p-クロロベンゼンスルフィン酸アンモニウム塩、p-クロロベンゼンスルフィン酸テトラメチルアンモニウム、p-クロロベンゼンスルフィン酸テトラエチルアンモニウム、および、p-クロロベンゼンスルフィン酸テトラブチルアンモニウムが挙げられる。
Salts of aromatic sulfinic acid compounds include, for example, lithium benzenesulfinate, sodium benzenesulfinate, potassium benzenesulfinate, magnesium benzenesulfinate, calcium benzenesulfinate, strontium benzenesulfinate, barium benzenesulfinate, butylamine salt of benzenesulfinate, aniline salt of benzenesulfinate, toluidine salt of benzenesulfinate, phenylenediamine salt of benzenesulfinate, diethylamine salt of benzenesulfinate, diphenylamine salt of benzenesulfinate, triethylamine salt of benzenesulfinate, tributylamine salt of benzenesulfinate, ammonium salt of benzenesulfinate, tetraethylamine salt of benzenesulfinate, tetramethyl ... tetramethylammonium, trimethylbenzylammonium benzenesulfinate, lithium o-toluenesulfinate, sodium o-toluenesulfinate, potassium o-toluenesulfinate, calcium o-toluenesulfinate, cyclohexylamine salt of o-toluenesulfinate, aniline salt of o-toluenesulfinate, ammonium salt of o-toluenesulfinate, tetraethylammonium o-toluenesulfinate, lithium p-toluenesulfinate, sodium p-toluenesulfinate (STS), potassium p-toluenesulfinate, calcium p-toluenesulfinate, barium p-toluenesulfinate, ethylamine salt of p-toluenesulfinate, p-toluenesulfinic acid butylamine salt, p-toluenesulfinic acid toluidine salt, p-toluenesulfinic acid N-methylaniline salt, p-toluenesulfinic acid pyridine salt, p-toluenesulfinic acid ammonium salt, p-toluenesulfinic acid tetramethylammonium, p-toluenesulfinic acid tetraethylammonium, p-toluenesulfinic acid tetrabutylammonium, β-naphthalenesulfinic acid sodium salt, β-naphthalenesulfinic acid strontium salt, β-naphthalenesulfinic acid triethylamine salt, β-naphthalenesulfinic acid N-methyltoluidine salt, β-naphthalenesulfinic acid ammonium salt, β-naphthalenesulfinic acid trimethylbenzylammonium salt, p-chlorobenzenesulfinic acid lithium salt p-chlorobenzenesulfinic acid sodium salt, p-chlorobenzenesulfinic acid potassium salt, p-chlorobenzenesulfinic acid calcium salt, p-chlorobenzenesulfinic acid barium salt, p-chlorobenzenesulfinic acid ethylamine salt, p-chlorobenzenesulfinic acid butylamine salt, p-chlorobenzenesulfinic acid toluidine salt, p-chlorobenzenesulfinic acid N-methylaniline salt, p-chlorobenzenesulfinic acid pyridine salt, p-chlorobenzenesulfinic acid ammonium salt, p-chlorobenzenesulfinic acid tetramethylammonium salt, p-chlorobenzenesulfinic acid tetraethylammonium salt, and p-chlorobenzenesulfinic acid tetrabutylammonium salt.
チオ尿素化合物として、例えば、チオ尿素、メチルチオ尿素、エチルチオ尿素、n-プロピルチオ尿素、イソプロピルチオ尿素、シクロヘキシルチオ尿素、ベンジルチオ尿素、フェニルチオ尿素、アセチルチオ尿素、ベンゾイルチオ尿素、アダマンチルチオ尿素、(2-ピリジル)チオ尿素(PTU)、1-(2-テトラヒドロフルフリル)-2-チオ尿素、N,N’-ジメチルチオ尿素、N,N’-ジエチルチオ尿素、N,N’-ジ-n-プロピルチオ尿素、N,N’-ジ-イソプロピルチオ尿素、N,N’-ジシクロヘキシルチオ尿素、N,N’-ジフェニルチオ尿素、トリメチルチオ尿素(TMTU)、トリエチルチオ尿素、トリ-n-プロピルチオ尿素、トリイソプロピルチオ尿素、トリシクロヘキシルチオ尿素、テトラメチルチオ尿素、テトラエチルチオ尿素、テトラ-n-プロピルチオ尿素、テトライソプロピルチオ尿素、テトラシクロヘキシルチオ尿素、エチレンチオ尿素、および、4,4-ジメチルエチレンチオ尿素が挙げられる。
Thiourea compounds include, for example, thiourea, methylthiourea, ethylthiourea, n-propylthiourea, isopropylthiourea, cyclohexylthiourea, benzylthiourea, phenylthiourea, acetylthiourea, benzoylthiourea, adamantylthiourea, (2-pyridyl)thiourea (PTU), 1-(2-tetrahydrofurfuryl)-2-thiourea, N,N'-dimethylthiourea, N,N'-diethylthiourea, N,N'-di-n-propylthiourea, and N,N'-di -isopropylthiourea, N,N'-dicyclohexylthiourea, N,N'-diphenylthiourea, trimethylthiourea (TMTU), triethylthiourea, tri-n-propylthiourea, triisopropylthiourea, tricyclohexylthiourea, tetramethylthiourea, tetraethylthiourea, tetra-n-propylthiourea, tetraisopropylthiourea, tetracyclohexylthiourea, ethylenethiourea, and 4,4-dimethylethylenethiourea.
チオ硫酸化合物として、例えば、チオ硫酸ナトリウム、チオ硫酸カルシウム、チオ硫酸カリウム、および、チオ硫酸マグネシウムが挙げられる。
Examples of thiosulfate compounds include sodium thiosulfate, calcium thiosulfate, potassium thiosulfate, and magnesium thiosulfate.
亜リン酸化合物として、例えば、無機亜リン酸化合物、および、有機亜リン酸化合物が挙げられる。
Examples of phosphorous compounds include inorganic phosphorous compounds and organic phosphorous compounds.
無機亜リン酸化合物として、例えば、次亜リン酸カルシウム、および、亜リン酸ナトリウムが挙げられる。
Examples of inorganic phosphite compounds include calcium hypophosphite and sodium phosphite.
有機亜リン酸化合物として、例えば、亜リン酸ジエチル、亜リン酸ジブチル、亜リン酸ジイソプロピル、亜リン酸ジ-n-プロピル、亜リン酸トリフェニル、亜リン酸トリアリル亜リン酸ジエチル、亜リン酸ジブチル、亜リン酸ジイソプロピル、亜リン酸ジ-n-プロピル、亜リン酸トリフェニル、および、亜リン酸トリアリルが挙げられる。
Examples of organic phosphite compounds include diethyl phosphite, dibutyl phosphite, diisopropyl phosphite, di-n-propyl phosphite, triphenyl phosphite, triallyl phosphite, diethyl phosphite, dibutyl phosphite, diisopropyl phosphite, di-n-propyl phosphite, triphenyl phosphite, and triallyl phosphite.
亜硫酸化合物として、例えば、無機亜硫酸化合物、および、有機亜硫酸化合物が挙げられる。
Examples of sulfite compounds include inorganic sulfite compounds and organic sulfite compounds.
無機亜硫酸化合物として、例えば、亜硫酸リチウム、亜硫酸ナトリウム、亜硫酸カリウム、亜硫酸カルシウム、および、亜硫酸水素ナトリウムが挙げられる。
Examples of inorganic sulfite compounds include lithium sulfite, sodium sulfite, potassium sulfite, calcium sulfite, and sodium hydrogen sulfite.
有機亜硫酸化合物として、例えば、亜硫酸ジエチル、亜硫酸ジ-n-プロピル、亜硫酸ジイソプロピル、亜硫酸グリコール、1,3-プロピレンサルファイト、および、ジアリルサルファイトが挙げられる。
Examples of organic sulfite compounds include diethyl sulfite, di-n-propyl sulfite, diisopropyl sulfite, glycol sulfite, 1,3-propylene sulfite, and diallyl sulfite.
(チオ)バルビツール酸化合物、および、その塩として、例えば、バルビツール酸、1,3-ジメチルバルビツール酸、1,3-ジフェニルバルビツール酸、1,5-ジメチルバルビツール酸、5-ブチルバルビツール酸、5-エチルバルビツール酸、5-イソプロピルバルビツール酸、5-シクロヘキシルバルビツール酸、1,3,5-トリメチルバルビツール酸、1,3-ジメチル-5-エチルバルビツール酸、1,3-ジメチル-n-ブチルバルビツール酸、1,3-ジメチル-5-イソブチルバルビツール酸、1,3-ジメチル-5-シクロヘキシルバルビツール酸、1,3-ジメチル-5-フェニルバルビツール酸、1-シクロヘキシル-5-エチルバルビツール酸、チオバルビツール酸、および、これらのアルカリ金属塩またはアルカリ土類金属塩が挙げられる。
(Thio)barbituric acid compounds and their salts include, for example, barbituric acid, 1,3-dimethylbarbituric acid, 1,3-diphenylbarbituric acid, 1,5-dimethylbarbituric acid, 5-butylbarbituric acid, 5-ethylbarbituric acid, 5-isopropylbarbituric acid, 5-cyclohexylbarbituric acid, 1,3,5-trimethylbarbituric acid, 1,3-dimethyl-5-ethylbarbituric acid, 1,3-dimethyl-n-butylbarbituric acid, 1,3-dimethyl-5-isobutylbarbituric acid, 1,3-dimethyl-5-cyclohexylbarbituric acid, 1,3-dimethyl-5-phenylbarbituric acid, 1-cyclohexyl-5-ethylbarbituric acid, thiobarbituric acid, and alkali metal or alkaline earth metal salts thereof.
アスコルビン酸化合物、および、その塩として、例えば、アスコルビン酸ナトリウム、アスコルビン酸カルシウム、および、アスコルビン酸カリウムが挙げられる。アスコルビン酸塩として、好ましくは、アスコルビン酸カルシウムが挙げられる。
Examples of ascorbic acid compounds and salts thereof include sodium ascorbate, calcium ascorbate, and potassium ascorbate. Ascorbate salts, calcium ascorbate is preferred.
アスコルビン酸のエステル化合物、および、その塩として、例えば、アスコルビン酸パルミテート、アスコルビン酸パルミテートのナトリウム塩、アスコルビン酸パルミテートのカルシウム塩、および、アスコルビン酸パルミテートのカリウム塩が挙げられる。アスコルビン酸のエステルの塩として、好ましくは、アスコルビン酸パルミテートのカリウム塩が挙げられる。
Examples of ascorbic acid ester compounds and their salts include ascorbic acid palmitate, sodium salt of ascorbic acid palmitate, calcium salt of ascorbic acid palmitate, and potassium salt of ascorbic acid palmitate. A preferred example of the salt of an ascorbic acid ester is potassium salt of ascorbic acid palmitate.
還元剤は、単独使用または2種以上併用できる。
Reducing agents can be used alone or in combination of two or more types.
還元剤として、好ましくは、アスコルビン酸化合物の塩が挙げられる。
The reducing agent is preferably a salt of an ascorbic acid compound.
1剤型歯科用重合材料中の還元剤の配合割合は、例えば、0.01質量%以上、好ましくは、0.1質量%以上、より好ましくは、0.5質量%以上、さらに好ましくは、1.0質量%以上であり、また、例えば、30質量%以下、好ましくは、10質量%以下、より好ましくは、5質量%以下、さらに好ましくは、3質量%以下である。
The mixing ratio of the reducing agent in the one-component dental polymerizable material is, for example, 0.01% by mass or more, preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and even more preferably 1.0% by mass or more, and, for example, 30% by mass or less, preferably 10% by mass or less, more preferably 5% by mass or less, and even more preferably 3% by mass or less.
1剤型歯科用重合材料において、還元剤の含有量は、非酸性モノマー100質量部に対して、例えば、1質量部以上、好ましくは、2質量部以上、より好ましくは、3質量部以上、また、例えば、10質量部以下、好ましくは、7質量部以下、より好ましくは、5質量部以下である。
In one-component dental polymeric materials, the content of the reducing agent is, for example, 1 part by mass or more, preferably 2 parts by mass or more, more preferably 3 parts by mass or more, and for example, 10 parts by mass or less, preferably 7 parts by mass or less, more preferably 5 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
1剤型歯科用重合材料において、還元剤の含有量は、光酸発生剤100質量部に対して、例えば、10質量部以上、好ましくは、30質量部以上、より好ましくは、50質量部以上、また、例えば、100質量部以下、好ましくは、85質量部以下、より好ましくは、70質量部以下である。
In one-component dental polymerizable materials, the content of the reducing agent is, for example, 10 parts by mass or more, preferably 30 parts by mass or more, more preferably 50 parts by mass or more, and for example, 100 parts by mass or less, preferably 85 parts by mass or less, more preferably 70 parts by mass or less, relative to 100 parts by mass of the photoacid generator.
[フィラー]
1剤型歯科用重合材料は、必要により、フィラーを含有してもよい。 [Filler]
The one-component dental polymerizable material may contain a filler, if necessary.
1剤型歯科用重合材料は、必要により、フィラーを含有してもよい。 [Filler]
The one-component dental polymerizable material may contain a filler, if necessary.
フィラーとして、歯科材料に用いることができる従来公知のフィラーが挙げられる。具体的には、フィラーとして、例えば、シリカ、シリカアルミナ、アルミナ、アルミナ石英、ガラス、チタニア、ジルコニア、および、フッ化イッテルビウムが挙げられる。シリカとして、例えば、フュームドシリカが挙げられる。フィラーは、シランカップリング剤などで表面処理されることにより、疎水化または親水化されていてもよい。
The filler may be any of the conventionally known fillers that can be used in dental materials. Specific examples of the filler include silica, silica alumina, alumina, alumina quartz, glass, titania, zirconia, and ytterbium fluoride. Examples of silica include fumed silica. The filler may be surface-treated with a silane coupling agent or the like to be made hydrophobic or hydrophilic.
フィラーは、単独使用または2種以上併用できる。
Fillers can be used alone or in combination of two or more types.
フィラーとして、好ましくは、シリカおよびフッ化イッテルビウムの併用が挙げられる。
As a filler, a combination of silica and ytterbium fluoride is preferred.
1剤型歯科用重合材料中のフィラーの配合割合は、例えば、0.5質量%以上、好ましくは、5質量%以上、より好ましくは、15質量%以上、さらに好ましくは、30質量%以上、とりわけ好ましくは、50質量%以上であり、また、例えば、95質量%以下、好ましくは、80質量%以下、より好ましくは、65質量%以下、さらに好ましくは、60質量%以下である。
The filler content in the one-component dental polymeric material is, for example, 0.5% by mass or more, preferably 5% by mass or more, more preferably 15% by mass or more, even more preferably 30% by mass or more, and particularly preferably 50% by mass or more, and is, for example, 95% by mass or less, preferably 80% by mass or less, more preferably 65% by mass or less, and even more preferably 60% by mass or less.
1剤型歯科用重合材料において、フィラーの含有量は、非酸性モノマー100質量部に対して、例えば、30質量部以上、好ましくは、50質量部以上、より好ましくは、100質量部以上、また、例えば、500質量部以下、好ましくは、300質量部以下、より好ましくは、200質量部以下である。
In one-component dental polymeric materials, the content of the filler is, for example, 30 parts by mass or more, preferably 50 parts by mass or more, more preferably 100 parts by mass or more, and for example, 500 parts by mass or less, preferably 300 parts by mass or less, more preferably 200 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
1剤型歯科用重合材料において、フィラーの含有量は、光酸発生剤100質量部に対して、例えば、1000質量部以上、好ましくは、2000質量部以上、より好ましくは、2500質量部以上、また、例えば、7000質量部以下、好ましくは、4000質量部以下、より好ましくは、3500質量部以下である。
In one-component dental polymerizable materials, the content of the filler is, for example, 1,000 parts by mass or more, preferably 2,000 parts by mass or more, more preferably 2,500 parts by mass or more, and for example, 7,000 parts by mass or less, preferably 4,000 parts by mass or less, more preferably 3,500 parts by mass or less, per 100 parts by mass of the photoacid generator.
[光増感剤]
1剤型歯科用重合材料は、必要により、光増感剤を含有してもよい。 [Photosensitizer]
The one-component dental polymerizable material may contain a photosensitizer, if necessary.
1剤型歯科用重合材料は、必要により、光増感剤を含有してもよい。 [Photosensitizer]
The one-component dental polymerizable material may contain a photosensitizer, if necessary.
光増感剤は、自らが光を吸収して得たエネルギーを上記光酸発生剤に伝搬させることで、光酸発生剤の分解を促進する。
The photosensitizer transmits the energy it obtains by absorbing light to the photoacid generator, accelerating the decomposition of the photoacid generator.
光増感剤として、例えば、ケトン化合物、アントラセン化合物、ナフタレン化合物、チオキサントン化合物、および、クマリン化合物が挙げられる。
Examples of photosensitizers include ketone compounds, anthracene compounds, naphthalene compounds, thioxanthone compounds, and coumarin compounds.
ケトン化合物として、例えば、α-ジケトン化合物が挙げられる。
Ketone compounds include, for example, α-diketone compounds.
α-ジケトン化合物として、例えば、カンファーキノン、ベンジル、ジアセチル、アセチルベンゾイル、2,3-ペンタジオン、2,3-オクタジオン、4,4’-ジメトキシベンジル、4,4’-オキシベンジル、9,10-フェナンスレンキノン、および、アセナフテンキノンが挙げられる。
Examples of α-diketone compounds include camphorquinone, benzil, diacetyl, acetylbenzoyl, 2,3-pentadione, 2,3-octadione, 4,4'-dimethoxybenzyl, 4,4'-oxybenzyl, 9,10-phenanthrenequinone, and acenaphthenequinone.
アントラセン化合物として、例えば、9,10-ジエトキシアントラセン、9,10-ジブトキシアントラセン、および、2-エチル-9,10-ジメトキシアントラセンが挙げられる。
Examples of anthracene compounds include 9,10-diethoxyanthracene, 9,10-dibutoxyanthracene, and 2-ethyl-9,10-dimethoxyanthracene.
ナフタレン化合物として、例えば、1,4-ジメトキシナフタレン、および、1,4-ジエトキシナフタレンが挙げられる。
Naphthalene compounds include, for example, 1,4-dimethoxynaphthalene and 1,4-diethoxynaphthalene.
光増感剤は、単独使用または2種以上併用できる。
Photosensitizers can be used alone or in combination of two or more types.
光増感剤として、好ましくは、アントラセン化合物が挙げられる。
Preferably, the photosensitizer is an anthracene compound.
1剤型歯科用重合材料中の光増感剤の配合割合は、例えば、0.001質量%以上、好ましくは、0.005質量%以上、より好ましくは、0.01質量%以上であり、また、例えば、10質量%以下、好ましくは、5質量%以下、より好ましくは、1質量%以下である。
The proportion of the photosensitizer in the one-component dental polymeric material is, for example, 0.001% by mass or more, preferably 0.005% by mass or more, more preferably 0.01% by mass or more, and, for example, 10% by mass or less, preferably 5% by mass or less, more preferably 1% by mass or less.
1剤型歯科用重合材料において、光増感剤の含有量は、非酸性モノマー100質量部に対して、例えば、0.01質量部以上、好ましくは、0.05質量部以上、より好ましくは、0.1質量部以上、また、例えば、5質量部以下、好ましくは、3質量部以下、より好ましくは、1質量部以下である。
In one-component dental polymeric materials, the content of the photosensitizer is, for example, 0.01 parts by mass or more, preferably 0.05 parts by mass or more, more preferably 0.1 parts by mass or more, and for example, 5 parts by mass or less, preferably 3 parts by mass or less, more preferably 1 part by mass or less, per 100 parts by mass of the non-acidic monomer.
1剤型歯科用重合材料において、光増感剤の含有量は、光酸発生剤100質量部に対して、例えば、1質量部以上、好ましくは、1.5質量部以上、より好ましくは、2質量部以上、また、例えば、20質量部以下、好ましくは、10質量部以下、より好ましくは、5質量部以下である。
In one-component dental polymerizable materials, the content of the photosensitizer is, for example, 1 part by mass or more, preferably 1.5 parts by mass or more, more preferably 2 parts by mass or more, and for example, 20 parts by mass or less, preferably 10 parts by mass or less, more preferably 5 parts by mass or less, per 100 parts by mass of the photoacid generator.
[その他の添加剤]
1剤型歯科用重合材料は、必要により、重合禁止剤、光重合開始剤、酸増殖剤、増粘剤、シランカップリング剤、紫外線吸収剤、蛍光剤、顔料、および、溶媒を含有してもよい。 [Other additives]
The one-component dental polymerizable material may contain, as necessary, a polymerization inhibitor, a photopolymerization initiator, an acid amplifier, a thickener, a silane coupling agent, an ultraviolet absorbing agent, a fluorescent agent, a pigment, and a solvent.
1剤型歯科用重合材料は、必要により、重合禁止剤、光重合開始剤、酸増殖剤、増粘剤、シランカップリング剤、紫外線吸収剤、蛍光剤、顔料、および、溶媒を含有してもよい。 [Other additives]
The one-component dental polymerizable material may contain, as necessary, a polymerization inhibitor, a photopolymerization initiator, an acid amplifier, a thickener, a silane coupling agent, an ultraviolet absorbing agent, a fluorescent agent, a pigment, and a solvent.
光重合開始剤は、可視光および/または紫外線などの光を受けることによって、励起されて重合を開始する化合物である。光重合開始剤には、光酸発生剤を含まない。
A photopolymerization initiator is a compound that is excited and starts polymerization when exposed to light such as visible light and/or ultraviolet light. Photopolymerization initiators do not include photoacid generators.
光重合開始剤として、例えば、ケトン化合物、および、アシルホスフィンオキサイド化合物が挙げられ、好ましくは、ケトン化合物が挙げられる。
Examples of photopolymerization initiators include ketone compounds and acylphosphine oxide compounds, with ketone compounds being preferred.
ケトン化合物として、例えば、α-ジケトン化合物が挙げられる。
Ketone compounds include, for example, α-diketone compounds.
α-ジケトン化合物として、例えば、カンファーキノン、ベンジル、ジアセチル、アセチルベンゾイル、2,3-ペンタジオン、2,3-オクタジオン、4,4’-ジメトキシベンジル、4,4’-オキシベンジル、9,10-フェナンスレンキノン、および、アセナフテンキノンが挙げられ、好ましくは、カンファーキノンが挙げられる。
Examples of α-diketone compounds include camphorquinone, benzil, diacetyl, acetylbenzoyl, 2,3-pentadione, 2,3-octadione, 4,4'-dimethoxybenzyl, 4,4'-oxybenzyl, 9,10-phenanthrenequinone, and acenaphthenequinone, and preferably camphorquinone.
重合禁止剤として、例えば、ジブチルヒドロキシトルエン(BHT)、および、4-メトキシフェノール(MeHQ)が挙げられ、好ましくは、ジブチルヒドロキシトルエンが挙げられる。
Examples of polymerization inhibitors include dibutylhydroxytoluene (BHT) and 4-methoxyphenol (MeHQ), and preferably dibutylhydroxytoluene.
1剤型歯科用重合材料中の重合禁止剤の配合割合は、例えば、0.01質量%以上、好ましくは、0.1質量%以上、より好ましくは、0.3質量%以上であり、また、例えば、10質量%以下、好ましくは、5質量%以下、より好ましくは、1質量%以下である。
The proportion of the polymerization inhibitor in the one-component dental polymerization material is, for example, 0.01% by mass or more, preferably 0.1% by mass or more, more preferably 0.3% by mass or more, and, for example, 10% by mass or less, preferably 5% by mass or less, more preferably 1% by mass or less.
1剤型歯科用重合材料において、重合禁止剤の含有量は、非酸性モノマー100質量部に対して、例えば、0.1質量部以上、好ましくは、0.5質量部以上、より好ましくは、1質量部以上、また、例えば、5質量部以下、好ましくは、3質量部以下、より好ましくは、2質量部以下である。
In one-component dental polymerization materials, the content of the polymerization inhibitor is, for example, 0.1 parts by mass or more, preferably 0.5 parts by mass or more, more preferably 1 part by mass or more, and for example, 5 parts by mass or less, preferably 3 parts by mass or less, more preferably 2 parts by mass or less, per 100 parts by mass of the non-acidic monomer.
1剤型歯科用重合材料において、重合禁止剤の含有量は、光酸発生剤100質量部に対して、例えば、0.1質量部以上、好ましくは、1質量部以上、より好ましくは、5質量部以上、また、例えば、70質量部以下、好ましくは、50質量部以下、より好ましくは、30質量部以下である。
In one-component dental polymerization materials, the content of the polymerization inhibitor is, for example, 0.1 parts by mass or more, preferably 1 part by mass or more, more preferably 5 parts by mass or more, and for example, 70 parts by mass or less, preferably 50 parts by mass or less, more preferably 30 parts by mass or less, per 100 parts by mass of the photoacid generator.
<反応機構>
次に、上記した1剤型歯科用重合材料の反応機構について説明する。 <Reaction mechanism>
Next, the reaction mechanism of the one-component dental polymerizable material will be described.
次に、上記した1剤型歯科用重合材料の反応機構について説明する。 <Reaction mechanism>
Next, the reaction mechanism of the one-component dental polymerizable material will be described.
1剤型歯科用重合材料は、単独で歯質に塗布する、または、前処理材と組み合わせて使用可能である。
One-component dental polymeric materials can be applied to tooth structure alone or in combination with a pretreatment material.
1剤型歯科用重合材料を、歯質に塗布し、可視光/および紫外線などの光を照射すると、光酸発生剤が分解し、ラジカルと酸とが発生する。光酸発生剤から発生したラジカルにより、非酸性モノマーが光重合する。さらに、光酸発生剤から発生した酸が、遷移金属化合物を溶解し、遷移金属イオンを発生する。発生した遷移金属イオンと還元剤が化学反応し、ラジカルを発生する。化学反応により発生したラジカルにより、非酸性モノマーが重合する。また、光重合および化学重合で発生する、重合熱により、光が直接届かない深部においても、光酸発生剤の分解が起こり、重合が進む(フロンタル重合)。つまり、歯科用重合材料は、歯科治療において、非酸性モノマーを重合させる。
When a one-component dental polymerizable material is applied to tooth structure and irradiated with visible light and/or ultraviolet light, the photoacid generator decomposes, generating radicals and acid. The radicals generated from the photoacid generator photopolymerize nonacidic monomers. The acid generated from the photoacid generator dissolves transition metal compounds and generates transition metal ions. The generated transition metal ions react chemically with a reducing agent to generate radicals. The radicals generated by the chemical reaction polymerize the nonacidic monomers. The heat of polymerization generated by photopolymerization and chemical polymerization also causes decomposition of the photoacid generator, and polymerization progresses (frontal polymerization), even in deep areas where light does not directly reach. In other words, dental polymerizable materials polymerize nonacidic monomers during dental treatment.
<作用効果>
1剤型歯科用重合材料によれば、光重合および化学重合が併せて起こるため、重合度が上がり、機械的強度が向上することができる。 <Action and effect>
According to the one-component dental polymerization material, photopolymerization and chemical polymerization occur simultaneously, so that the degree of polymerization is increased and the mechanical strength can be improved.
1剤型歯科用重合材料によれば、光重合および化学重合が併せて起こるため、重合度が上がり、機械的強度が向上することができる。 <Action and effect>
According to the one-component dental polymerization material, photopolymerization and chemical polymerization occur simultaneously, so that the degree of polymerization is increased and the mechanical strength can be improved.
また、フロンタル重合が起こるため、高い硬化深度を有することができる。
In addition, frontal polymerization occurs, allowing for a high cure depth.
さらに、遷移金属化合物は、1剤型歯科用重合材料中において固体である。そのため、1剤型歯科用重合材料中で遷移金属化合物と還元剤とが反応することを抑制できる。
Furthermore, the transition metal compound is a solid in the one-component dental polymerizable material. Therefore, the reaction between the transition metal compound and the reducing agent in the one-component dental polymerizable material can be suppressed.
その結果、1剤型歯科用重合材料の経時的な増粘または硬化を抑制できる。
As a result, thickening or hardening of one-component dental polymerizable materials over time can be suppressed.
<変形例>
以下の各変形例において、上記した一実施形態と同様の材料については、その詳細な説明を省略する。また、各変形例は、特記する以外、一実施形態と同様の作用効果を奏することができる。さらに、一実施形態およびその変形例を適宜組み合わせることができる。 <Modification>
In the following modified examples, detailed description of the same materials as those in the above-mentioned embodiment will be omitted. In addition, each modified example can achieve the same effects as those in the first embodiment unless otherwise specified. Furthermore, the first embodiment and its modified examples can be appropriately combined.
以下の各変形例において、上記した一実施形態と同様の材料については、その詳細な説明を省略する。また、各変形例は、特記する以外、一実施形態と同様の作用効果を奏することができる。さらに、一実施形態およびその変形例を適宜組み合わせることができる。 <Modification>
In the following modified examples, detailed description of the same materials as those in the above-mentioned embodiment will be omitted. In addition, each modified example can achieve the same effects as those in the first embodiment unless otherwise specified. Furthermore, the first embodiment and its modified examples can be appropriately combined.
上記した一実施形態では、歯科用重合材料は、1剤型歯科用重合材料である。
In one embodiment described above, the dental polymerizable material is a one-component dental polymerizable material.
しかし、歯科用重合材料は、多剤型歯科用重合材料であってもよい。多剤型歯科用重合材料として、例えば、2剤型歯科用重合材料が挙げられる。2剤型歯科用重合材料は、例えば、A剤と、B剤とを有する。2剤型歯科用重合材料は、例えば、A剤とB剤とを混合して使用される。また、2剤型歯科用重合材料は、例えば、A剤を塗布した後に、B剤を塗布して使用される。2剤型歯科用重合材料が、自己接着性を有する場合、歯質に直接塗布して使用可能である。それに対して、2剤型歯科用重合材料が、自己接着性を有さない場合、前処理材と組み合わせて、使用可能である。
However, the dental polymerization material may be a multi-component dental polymerization material. Examples of multi-component dental polymerization materials include two-component dental polymerization materials. Two-component dental polymerization materials have, for example, component A and component B. Two-component dental polymerization materials are used, for example, by mixing components A and B. Two-component dental polymerization materials are also used, for example, by applying component A and then component B. If a two-component dental polymerization material has self-adhesive properties, it can be used by applying it directly to tooth structure. On the other hand, if a two-component dental polymerization material does not have self-adhesive properties, it can be used in combination with a pretreatment material.
2剤型歯科用重合材料において、A剤とB剤とを混合して使用される場合、A剤およびB剤の少なくとも一方は、光酸発生剤、遷移金属化合物、および、還元剤を含有し、必要により、非酸性モノマー、フィラー、光増感剤、および、その他の添加物を含有する。
When components A and B are mixed together in a two-component dental polymeric material, at least one of components A and B contains a photoacid generator, a transition metal compound, and a reducing agent, and optionally contains a non-acidic monomer, a filler, a photosensitizer, and other additives.
2剤型歯科用重合材料において、A剤を塗布した後に、B剤を塗布して使用される場合、光照射をされる表面に位置するB剤は、光酸発生剤を含有し、A剤およびB剤の少なくとも一方は、遷移金属化合物、および、還元剤を含有し、必要により、非酸性モノマー、フィラー、光増感剤、および、その他の添加物を含有する。さらに、A剤は、光酸発生剤を含有してもよい。
In a two-component dental polymeric material, when component A is applied first, followed by component B, component B located on the surface that is irradiated with light contains a photoacid generator, and at least one of components A and B contains a transition metal compound and a reducing agent, and optionally a non-acidic monomer, a filler, a photosensitizer, and other additives. Furthermore, component A may contain a photoacid generator.
歯科用重合材料は、非酸性モノマー、および、酸性モノマーを含有しなくてもよい。この場合、歯科用重合材料は、モノマーを重合するために用いられる。
The dental polymerizable material may contain no non-acidic monomers and no acidic monomers. In this case, the dental polymerizable material is used to polymerize the monomers.
また、歯科用重合材料は、フィラーを含有しなくてもよい。この場合、歯科用重合材料は、歯科用コーティング材として用いることが可能である。
The dental polymeric material may not contain a filler. In this case, the dental polymeric material can be used as a dental coating material.
以下に実施例および比較例を示し、本発明をさらに具体的に説明する。なお、本発明は、何ら実施例および比較例に限定されない。また、以下の記載において用いられる配合割合(含有割合)、物性値、パラメータなどの具体的数値は、上記の「発明を実施するための形態」において記載されている、それらに対応する配合割合(含有割合)、物性値、パラメータなど該当記載の上限(「以下」、「未満」として定義されている数値)または下限(「以上」、「超過」として定義されている数値)に代替することができる。
The present invention will be described in more detail below with reference to examples and comparative examples. Note that the present invention is in no way limited to the examples and comparative examples. Furthermore, the specific numerical values of the blending ratio (content ratio), physical property values, parameters, etc. used in the following description can be replaced with the upper limit (a numerical value defined as "equal to or less than") or lower limit (a numerical value defined as "equal to or more than" or "exceeding") of the corresponding blending ratio (content ratio), physical property value, parameter, etc. described in the above "Form for carrying out the invention."
実施例および比較例で使用する各成分を以下に示す。
The components used in the examples and comparative examples are listed below.
UDMA:[2,2,4-トリメチルヘキサメチレンビス(2-カルバモイルオキシエチル)]ジメタクリレート
TEGDMA:トリエチレングリコールジ(メタ)アクリレート
IK-1:サンアプロ社製 光酸発生剤(ヨードニウム塩)
DBA:9,10-ジブトキシアントラセン
CQ:カンファーキノン
Cu(OH)2:水酸化銅(II)
CaAA:アスコルビン酸カルシウム二水和物
BHT:ジブチルヒドロキシトルエン
R812:アエロジル社製フュームドシリカ
YbF3:フッ化イッテルビウム UDMA: [2,2,4-trimethylhexamethylenebis(2-carbamoyloxyethyl)]dimethacrylate TEGDMA: triethylene glycol di(meth)acrylate IK-1: Photoacid generator (iodonium salt) manufactured by San-Apro Co., Ltd.
DBA: 9,10-dibutoxyanthracene CQ: camphorquinone Cu(OH) 2 : copper(II) hydroxide
CaAA: calcium ascorbate dihydrate BHT: dibutylhydroxytoluene R812: fumed silica manufactured by Aerosil YbF 3 : ytterbium fluoride
TEGDMA:トリエチレングリコールジ(メタ)アクリレート
IK-1:サンアプロ社製 光酸発生剤(ヨードニウム塩)
DBA:9,10-ジブトキシアントラセン
CQ:カンファーキノン
Cu(OH)2:水酸化銅(II)
CaAA:アスコルビン酸カルシウム二水和物
BHT:ジブチルヒドロキシトルエン
R812:アエロジル社製フュームドシリカ
YbF3:フッ化イッテルビウム UDMA: [2,2,4-trimethylhexamethylenebis(2-carbamoyloxyethyl)]dimethacrylate TEGDMA: triethylene glycol di(meth)acrylate IK-1: Photoacid generator (iodonium salt) manufactured by San-Apro Co., Ltd.
DBA: 9,10-dibutoxyanthracene CQ: camphorquinone Cu(OH) 2 : copper(II) hydroxide
CaAA: calcium ascorbate dihydrate BHT: dibutylhydroxytoluene R812: fumed silica manufactured by Aerosil YbF 3 : ytterbium fluoride
<1剤型歯科用重合材料の調製>
表1の処方に従って、各成分を混合し、1剤型歯科用重合材料を調製した。 <Preparation of one-component dental polymerizable material>
According to the formulation in Table 1, each component was mixed to prepare a one-component dental polymerizable material.
表1の処方に従って、各成分を混合し、1剤型歯科用重合材料を調製した。 <Preparation of one-component dental polymerizable material>
According to the formulation in Table 1, each component was mixed to prepare a one-component dental polymerizable material.
実施例1および各比較例では、遷移金属化合物(Cu(OH)2)は、1剤型歯科用重合材料中で固体であった。
In Example 1 and each of the Comparative Examples, the transition metal compound (Cu(OH) 2 ) was a solid in the one-part dental polymerizable material.
<評価>
[機械的強度]
実施例1および各比較例の1剤型歯科用重合材料を、直径4mm、厚さ3mmの穴をあけたフッ素樹脂製の圧縮試験用型枠に充填後、歯科用照射機(JETLITE3000、J.Morita社製)で、両面を各10秒間光照射した。その後、37℃のオーブンにて、24時間静置し、硬化させた。各硬化物の機械的強度(圧縮強度)を、ユニバーサル試験機(AG-10knXPlus、島津製作所社製)で測定した。機械的強度に関して、以下の基準で評価した。結果を表1に示す。
{基準}
〇:500MPa以上
×:500MPa未満、または、硬化不十分のため、測定不可 <Evaluation>
[Mechanical strength]
The one-component dental polymerizable materials of Example 1 and each Comparative Example were filled into a compression test mold made of fluororesin with a hole of 4 mm diameter and 3 mm thickness, and then both sides were irradiated with light for 10 seconds each using a dental irradiator (JETLITE 3000, manufactured by J. Morita Co., Ltd.). Then, the material was left to stand in an oven at 37°C for 24 hours to cure. The mechanical strength (compressive strength) of each cured product was measured using a universal testing machine (AG-10knXPlus, manufactured by Shimadzu Corporation). The mechanical strength was evaluated according to the following criteria. The results are shown in Table 1.
{standard}
◯: 500 MPa or more ×: Less than 500 MPa or insufficient curing, measurement not possible
[機械的強度]
実施例1および各比較例の1剤型歯科用重合材料を、直径4mm、厚さ3mmの穴をあけたフッ素樹脂製の圧縮試験用型枠に充填後、歯科用照射機(JETLITE3000、J.Morita社製)で、両面を各10秒間光照射した。その後、37℃のオーブンにて、24時間静置し、硬化させた。各硬化物の機械的強度(圧縮強度)を、ユニバーサル試験機(AG-10knXPlus、島津製作所社製)で測定した。機械的強度に関して、以下の基準で評価した。結果を表1に示す。
{基準}
〇:500MPa以上
×:500MPa未満、または、硬化不十分のため、測定不可 <Evaluation>
[Mechanical strength]
The one-component dental polymerizable materials of Example 1 and each Comparative Example were filled into a compression test mold made of fluororesin with a hole of 4 mm diameter and 3 mm thickness, and then both sides were irradiated with light for 10 seconds each using a dental irradiator (JETLITE 3000, manufactured by J. Morita Co., Ltd.). Then, the material was left to stand in an oven at 37°C for 24 hours to cure. The mechanical strength (compressive strength) of each cured product was measured using a universal testing machine (AG-10knXPlus, manufactured by Shimadzu Corporation). The mechanical strength was evaluated according to the following criteria. The results are shown in Table 1.
{standard}
◯: 500 MPa or more ×: Less than 500 MPa or insufficient curing, measurement not possible
[硬化深度]
実施例1および各比較例の1剤型歯科用重合材料を、直径5mm、長さ30mm以上のガラスチューブに、30mm以上充填し、1剤型歯科用重合材料が充填されたガラスチューブの先端から10mmだけ残し、その他の部分を黒のビニールテープで巻き、遮光した。1剤型歯科用重合材料が充填されたガラスチューブに対して、横から10秒間光照射した。その後、37℃のオーブンにて、24時間静置し、硬化させ、硬化深度を測定した。
硬化深度に関して、以下の基準で評価した。結果を表1に示す。
{基準}
〇:30mm以上
△:15mm以上30mm未満
×:15mm未満 [Cure depth]
The one-component dental polymerization material of Example 1 and each comparative example was filled into a glass tube with a diameter of 5 mm and a length of 30 mm or more to a depth of 30 mm or more, and the glass tube filled with the one-component dental polymerization material was left with only 10 mm from the tip, and the other part was wrapped with black vinyl tape to block light. The glass tube filled with the one-component dental polymerization material was irradiated with light from the side for 10 seconds. Then, it was left to stand in an oven at 37°C for 24 hours to harden, and the hardening depth was measured.
The cure depth was evaluated according to the following criteria. The results are shown in Table 1.
{standard}
◯: 30 mm or more △: 15 mm or more but less than 30 mm ×: less than 15 mm
実施例1および各比較例の1剤型歯科用重合材料を、直径5mm、長さ30mm以上のガラスチューブに、30mm以上充填し、1剤型歯科用重合材料が充填されたガラスチューブの先端から10mmだけ残し、その他の部分を黒のビニールテープで巻き、遮光した。1剤型歯科用重合材料が充填されたガラスチューブに対して、横から10秒間光照射した。その後、37℃のオーブンにて、24時間静置し、硬化させ、硬化深度を測定した。
硬化深度に関して、以下の基準で評価した。結果を表1に示す。
{基準}
〇:30mm以上
△:15mm以上30mm未満
×:15mm未満 [Cure depth]
The one-component dental polymerization material of Example 1 and each comparative example was filled into a glass tube with a diameter of 5 mm and a length of 30 mm or more to a depth of 30 mm or more, and the glass tube filled with the one-component dental polymerization material was left with only 10 mm from the tip, and the other part was wrapped with black vinyl tape to block light. The glass tube filled with the one-component dental polymerization material was irradiated with light from the side for 10 seconds. Then, it was left to stand in an oven at 37°C for 24 hours to harden, and the hardening depth was measured.
The cure depth was evaluated according to the following criteria. The results are shown in Table 1.
{standard}
◯: 30 mm or more △: 15 mm or more but less than 30 mm ×: less than 15 mm
なお、上記発明は、本発明の例示の実施形態として提供したが、これは単なる例示にすぎず、限定的に解釈してはならない。当該技術分野の当業者によって明らかな本発明の変形例は、後記請求の範囲に含まれるものである。
The above invention is provided as an exemplary embodiment of the present invention, but this is merely an example and should not be interpreted as limiting. Modifications of the present invention that are obvious to those skilled in the art are intended to be included in the scope of the claims below.
本発明の歯科用重合材料は、歯科治療において、歯の欠損部を充填および歯の欠損部位への補綴物の接着などに好適に用いられる。
The dental polymeric material of the present invention is suitable for use in dental treatment to fill missing teeth and to adhere prosthetic devices to missing teeth.
Claims (9)
- 歯科治療において、酸性基を有さずエチレン性不飽和基を有する非酸性モノマーを重合させるための歯科用重合材料であって、
光酸発生剤と、
遷移金属化合物と、
還元剤と
を含有し、
前記遷移金属化合物は、前記歯科用重合材料中において固体であり、前記光酸発生剤が分解することにより生じる酸で溶解可能である、歯科用重合材料。 A dental polymerizable material for polymerizing a non-acidic monomer having no acidic group and an ethylenically unsaturated group in dental treatment, comprising:
A photoacid generator;
A transition metal compound;
A reducing agent,
A dental polymerizable material, wherein the transition metal compound is solid in the dental polymerizable material and is soluble in an acid generated by decomposition of the photoacid generator. - 前記非酸性モノマーを含有し、酸性モノマーを含有しない、請求項1に記載の歯科用重合材料。 The dental polymeric material according to claim 1, which contains the non-acidic monomer and does not contain an acidic monomer.
- 前記遷移金属化合物は、周期律表の第4周期に属する遷移金属原子を含有する、請求項1に記載の歯科用重合材料。 The dental polymeric material according to claim 1, wherein the transition metal compound contains a transition metal atom belonging to the fourth period of the periodic table.
- 前記遷移金属化合物は、銅化合物、鉄化合物、コバルト化合物、クロム化合物、亜鉛化合物、マンガン化合物、および、バナジウム化合物からなる群から選択される少なくとも1つである、請求項1に記載の歯科用重合材料。 The dental polymeric material according to claim 1, wherein the transition metal compound is at least one selected from the group consisting of copper compounds, iron compounds, cobalt compounds, chromium compounds, zinc compounds, manganese compounds, and vanadium compounds.
- 前記光酸発生剤は、前記非酸性モノマーに可溶である、請求項2に記載の歯科用重合材料。 The dental polymerizable material according to claim 2, wherein the photoacid generator is soluble in the non-acidic monomer.
- さらに、フィラーを含む、請求項1に記載の歯科用重合材料。 The dental polymeric material according to claim 1, further comprising a filler.
- さらに、光増感剤を含む、請求項1に記載の歯科用重合材料。 The dental polymeric material according to claim 1, further comprising a photosensitizer.
- さらに、光重合開始剤を含む、請求項1に記載の歯科用重合材料。 The dental polymerizable material according to claim 1, further comprising a photopolymerization initiator.
- 1剤型である、請求項1に記載の歯科用重合材料。 The dental polymeric material according to claim 1, which is a one-component type.
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