WO2024050929A1 - Lanthanide metal-doped izo target material, preparation method therefor, and application thereof - Google Patents

Lanthanide metal-doped izo target material, preparation method therefor, and application thereof Download PDF

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Publication number
WO2024050929A1
WO2024050929A1 PCT/CN2022/126489 CN2022126489W WO2024050929A1 WO 2024050929 A1 WO2024050929 A1 WO 2024050929A1 CN 2022126489 W CN2022126489 W CN 2022126489W WO 2024050929 A1 WO2024050929 A1 WO 2024050929A1
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izo
doped
lanthanide metal
target
metal
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PCT/CN2022/126489
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French (fr)
Chinese (zh)
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陈明飞
刘永成
郭梓旋
王金科
徐胜利
陈明高
莫国仁
江长久
王志杰
李跃辉
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长沙壹纳光电材料有限公司
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Publication of WO2024050929A1 publication Critical patent/WO2024050929A1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/02—Compacting only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/1003—Use of special medium during sintering, e.g. sintering aid
    • B22F3/1007—Atmosphere
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/1017—Multiple heating or additional steps
    • B22F3/1021—Removal of binder or filler
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F5/00—Manufacture of workpieces or articles from metallic powder characterised by the special shape of the product
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
    • H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
    • H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005—Processes

Definitions

  • the invention relates to the technical field of optoelectronic functional materials, and in particular to a lanthanide metal-doped IZO target material and its preparation method and application.
  • the lanthanide metal-doped IZO target is a multi-element metal oxide semiconductor material. Due to its high transmittance and high carrier concentration, it can be used to produce large-size and high-resolution displays.
  • Ln-IZO targets are obtained by calcining Ln-IZO powder precursors prepared by chemical co-precipitation methods.
  • Ln-IZO powder with uniform and high sintering activity is pressed and molded and then sintered under certain conditions to obtain a high-density target.
  • Ln-IZO powder prepared by the conventional mixing method that is, directly mixing various oxide powders in proportion
  • the color of the target material after sintering is uneven, and low sintering activity will also cause its sintering density to be low.
  • relevant technicians will further increase the sintering temperature.
  • the increase in sintering temperature will easily cause the grain size of the target material to grow sharply, causing segregation of components and producing abnormal discharge effects during the sputtering coating process. , deteriorating the quality and characteristics of the film.
  • the present invention aims to solve at least one of the technical problems existing in the prior art.
  • the present invention proposes a lanthanide metal-doped IZO target and a preparation method thereof, which can improve the uniformity and density of the lanthanide metal-doped IZO target and ensure that sputtering is not prone to nodulation.
  • the present invention also proposes a method for preparing the above-mentioned lanthanide metal-doped IZO target.
  • the invention also proposes the application of the above-mentioned lanthanide metal-doped IZO target in the preparation of displays.
  • a first aspect of the present invention provides a lanthanide metal-doped IZO target, which includes in terms of mass percentage:
  • the Ln-based metal is selected from at least one selected from the group consisting of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, and lutetium.
  • the lanthanide metal-doped IZO target according to the embodiment of the present invention has at least the following beneficial effects: By controlling the proportion of each component in the lanthanide metal-doped IZO target, the lanthanide metal-doped IZO target obtained by the present invention
  • the material has the advantages of high density, uniform color and not easy to form nodules during the sputtering process.
  • the Ln-based metal is selected from at least one selected from the group consisting of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, and lutetium.
  • the Ln-based metal is selected from at least one selected from the group consisting of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, and lutetium.
  • the density of the lanthanide metal-doped IZO target is 98.0% to 99.3%.
  • the density of the lanthanide metal-doped IZO target is 98.5% to 99.22%.
  • a second aspect of the invention provides a method for preparing the above-mentioned lanthanide metal-doped IZO target, which includes the following preparation steps:
  • Step S1 Add a precipitating agent to the mixed solution of Ln-based metal salt, indium salt and zinc salt for precipitation, solid-liquid separation, drying and calcining the solid phase to obtain an Ln-IZO precursor; wherein, the Ln-based metal
  • the Ln-based metal in the salt is selected from at least one selected from the group consisting of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, and lutetium;
  • Step S2 Mix the Ln-IZO precursor with a dispersant and a binder to make a slurry, and spray-dry to obtain Ln-IZO powder;
  • Step S3 After molding and cold isostatic pressing the Ln-IZO powder in sequence, a blank target material is obtained;
  • Step S4 Sinter the blank target material to obtain the lanthanide metal-doped IZO target material.
  • the preparation method according to the embodiment of the present invention has at least the following beneficial effects: the present invention uses a chemical co-precipitation method and controls the precipitation process to prepare a powder with uniform sintering components and high sintering activity, and by controlling the sintering process, the target The high density of the material.
  • the Ln series metal salt is selected from at least one of Ln series metal sulfate, Ln series metal nitrate and Ln series metal chloride.
  • the indium salt is selected from at least one of indium sulfate, indium nitrate and indium chloride.
  • the zinc salt is selected from at least one of zinc sulfate, zinc nitrate and zinc chloride.
  • the precipitating agent is selected from inorganic bases and carbonates.
  • the inorganic base is selected from at least one of sodium hydroxide, potassium hydroxide, cesium hydroxide, ammonia monohydrate and ammonia water.
  • the inorganic base is sodium hydroxide or potassium hydroxide.
  • the carbonate is selected from at least one of sodium carbonate, potassium carbonate, cesium carbonate, sodium bicarbonate, potassium bicarbonate and cesium bicarbonate.
  • the carbonate is sodium carbonate.
  • the concentration of ammonia water is 25% to 28%.
  • the concentration of ammonia water is 28%.
  • the precipitating agent is preferably sodium hydroxide.
  • the relative density of the prepared lanthanide metal-doped IZO target is the same as that of adding other precipitating agents. The comparison is even better, 99.00%.
  • ammonia water is used as the precipitant, the relative density of the prepared lanthanide metal-doped IZO target is 98.5%, which is relatively low.
  • the pH value of the precipitation is 6-9.
  • the pH value of the precipitation is 6-8.
  • the pH value of the precipitation is an important factor affecting the quality of the lanthanide metal-doped IZO target.
  • the pH value is greater than 9
  • the prepared lanthanide metal-doped IZO target will be damaged due to excessive crystal growth. Nodulation is prone to occur during the sputtering process; when the precipitation pH value is 6 to 8, a higher relative density of the target can be obtained, and no nodulation will occur during the sputtering process.
  • step S1 the drying method is vacuum freeze drying.
  • the calcination temperature is 600°C to 1200°C.
  • the calcination temperature is 700°C to 900°C.
  • the calcination temperature is 800°C.
  • the calcination time is 1.5h to 2.5h.
  • the calcination time is 2 hours.
  • the model of the dispersant is CELUNA D-305, purchased from Chukyo Oils and Fats Co., Ltd.
  • the added amount of the dispersant is 0.5% to 2%.
  • the binder is polyvinyl alcohol, which is purchased from Shanghai Sinopharm Reagent Group Sinopharm Group with the item number 30153160.
  • the added amount of the binder is 2% to 4%.
  • the specific surface area of the Ln-IZO powder is 5 m 2 /g ⁇ 15 m 2 /g.
  • the specific surface area of the Ln-IZO powder is 10m 2 /g ⁇ 12m 2 /g.
  • the Ln-IZO powder under this specific surface area is more conducive to molding, and the elastic aftereffects of molding are smaller.
  • step S3 the molding pressure is 0.1Mpa ⁇ 0.8Mpa.
  • the pressure of the cold isostatic pressing is 200Mpa ⁇ 400Mpa.
  • step S4 the degumming temperature during the sintering process is 400°C to 700°C.
  • Degumming at this temperature can effectively remove the added dispersant and binder from the green body, making subsequent sintering easier.
  • the sintering temperature is 1100°C to 1400°C;
  • the sintering temperature is 1150°C to 1400°C;
  • the sintering temperature is too low, it is easy to cause the relative density of the target to be low, thereby reducing the quality of the target; and if the relative density is too high, nodulation is likely to occur during the target sputtering process, and the target's The crystals are coarse, so choosing the appropriate sintering temperature is crucial to improving the quality of the target.
  • the sintering pressure is 0.05Mpa ⁇ 0.3Mpa.
  • the sintering pressure is 0.2Mpa ⁇ 0.3Mpa.
  • Increasing the sintering pressure during the sintering process is beneficial to improving the quality of lanthanide metal-doped IZO targets.
  • the relative density of the target material increases significantly, and no nodulation occurs in the prepared target material during the sputtering process.
  • step S4 the sintering time is 550 min to 650 min.
  • the sintering time is 600 minutes.
  • a third aspect of the present invention provides an application of the above-mentioned lanthanide metal-doped IZO target in the preparation of displays.
  • the conditions should be carried out according to the conventional conditions or the conditions recommended by the manufacturer. If the manufacturer of the reagents or instruments used is not indicated, they are all conventional products that can be purchased commercially.
  • the dispersant was purchased from Chukyo Oils and Fats Co., Ltd., and the product number is CELUNA D-305;
  • the binder is PVA with a degree of polymerization of 1750 ⁇ 50. It was purchased from Shanghai Sinopharm Reagent Group with the item number of 30153160.
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 6 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 140 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 7 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 120 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanum series metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% wt% of Ln series metal praseodymium oxide, 85 wt% of indium oxide, and 10 wt% of zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage, 5% wt% of Ln-series metal praseodymium oxide, 85wt% indium oxide, and 10wt% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 9 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 100 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add precipitant KOH to the mixed solution of 0.3mol/L Ln-based metal salt praseodymium chloride, 0.3mol/L indium chloride and 0.3mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent sodium carbonate to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. , solid-liquid separation, washing the solid precipitate with deionized water, and vacuum freeze-drying it to obtain a powder product with a specific surface area of approximately 115m 2 /g, and calcining the powder product at 800°C. The calcination time is 2h, and a uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent ammonia water to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 120 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1100°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1150°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1250°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1300°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1350°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.05Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.1Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanum series metal-doped IZO target prepared in this embodiment includes 5% Ln series metal praseodymium oxide, 85% indium oxide and 10% zinc oxide in terms of mass percentage;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.15Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.2Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.25Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal cerium-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt cerium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal cerium-doped IZO target.
  • the lanthanum series metal cerium doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln series metal cerium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal lanthanum-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt lanthanum chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal lanthanum-doped IZO target.
  • the lanthanide metal lanthanum-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal lanthanum oxide, 85% indium oxide, and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal neodymium-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt neodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal neodymium-doped IZO target.
  • the lanthanide metal neodymium-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal neodymium oxide, 85% indium oxide, and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal europium-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt europium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal europium-doped IZO target.
  • the lanthanide metal europium-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal europium oxide, 85% indium oxide, and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 10 for precipitation. Solid-liquid separation, washing the solid precipitate with deionized water, and vacuum freeze-drying to obtain a powder product with a specific surface area of approximately 70 m 2 /g, and calcining the powder product at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1450°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
  • Step S1 Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
  • Step S2 Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying.
  • the specific surface area of the body is 10m 2 /g ⁇ 12m 2 /g;
  • Step S3 Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
  • Step S4 Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1500°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
  • the lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
  • the color is directly related to the density of the target. Generally, the yellower the color, the lower the density. “-” means not detected.
  • Example 1 the difference between Examples 1 to 4 and Comparative Example 1 is that the pH value of the precipitation is different.
  • the pH value is 7 to 8, a target with higher relative density and good color uniformity can be obtained, and the target The material is not prone to nodulation and segregation; when the pH value is 10 (as shown in Comparative Example 1), the density of the prepared target material is significantly reduced, and more serious nodulation and segregation occur.
  • Example 3 the difference between Example 3 and Examples 5 to 7 lies in the use of different precipitating agents.
  • the test results show that the type of precipitating agent has little effect on the color uniformity of the target material, but has a significant impact on the density of the target material. There is a certain influence.
  • the precipitating agent is sodium hydroxide, the relative density of the target material is the largest and can reach 99.00%.
  • Example 8 has the lowest sintering temperature of 1100°C.
  • the results show that the relative density of the target material obtained at this temperature is relatively high. Low, only 97.80%, and the color turns yellow, but it has no impact on its uniformity; when the sintering temperature is 1150°C ⁇ 1400°C, a relatively high target density can be obtained, among which when the sintering temperature is 1300°C ⁇ 1400°C When the sintering temperature reaches 1450°C and above (as shown in Comparative Examples 2 and 3), although a higher relative density can be obtained, Density, but there are nodules and coarse crystals.
  • the difference between Examples 15 to 20 is that the sintering pressure is different.
  • the results show that increasing the sintering pressure under the same conditions is beneficial to improving the sintering density, and the prepared target material is not prone to nodulation during the sputtering process.
  • Examples 20 to 24 the difference between Examples 20 to 24 is that the doped lanthanide metals are different.
  • the results show that the different lanthanide metal-doped IZO targets prepared by the preparation process of the present invention all have better performance. Relative density, and the color of the target material is uniform, and no nodulation occurs.
  • the preparation process of the lanthanide metal-doped IZO target of the present invention can solve the problems that occur in the preparation process of the lanthanide-doped target by adjusting the type of precipitant, controlling the precipitation pH value, sintering temperature and sintering pressure.
  • the sintering density is not high and is prone to uneven color and sputtering nodules, which provides an important reference value for the preparation of high-quality sputtered films.

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Abstract

A lanthanide metal-doped IZO target material, a preparation method therefor, and an application thereof. The lanthanide metal-doped IZO target material comprises in terms of mass percentage: 0.5%-10% Ln metal oxide, 60%-87% indium oxide, and 5%-15% zinc oxide. The Ln metal is at least one selected from lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium and lutetium. The lanthanide metal-doped IZO target material prepared by controlling the proportion of each component in the lanthanide metal-doped IZO target material in combination with chemical coprecipitation has the advantages of high density, uniform color, and not being prone to nodulation during a sputtering process, and has wide application value.

Description

一种镧系金属掺杂IZO靶材及其制备方法与应用A kind of lanthanide metal-doped IZO target material and its preparation method and application 技术领域Technical field
本发明涉及光电功能材料技术领域，尤其是涉及一种镧系金属掺杂IZO靶材及其制备方法与应用。The invention relates to the technical field of optoelectronic functional materials, and in particular to a lanthanide metal-doped IZO target material and its preparation method and application.
背景技术Background technique
镧系金属掺杂的IZO靶材是一种多元金属氧化物的半导体材料，由于其具备高透光性及高载流子浓度等特点，可用于制作大尺寸及高分辨率的显示器。The lanthanide metal-doped IZO target is a multi-element metal oxide semiconductor material. Due to its high transmittance and high carrier concentration, it can be used to produce large-size and high-resolution displays.
相关技术中，镧系掺杂的IZO薄膜多数是使用Ln-IZO靶材以溅射沉积的方式进行，其中Ln-IZO靶材是用化学共沉淀法制备的Ln-IZO粉末前驱体经过煅烧得到均匀的且烧结活性高的Ln-IZO粉末，压制成型后再经过一定的条件下进行烧结得到高致密度的靶材。并且，采用常规混合法(即直接使用各种氧化物粉末按照比例混合)制备的Ln-IZO粉末存在难以混合均匀，烧结活性低的特点，在实际生产过程中，成分分布的不均匀极容易造成烧结后靶材颜色不均匀，另外烧结活性低也会造成其烧结密度不高的情况。为了提高烧结密度，相关技术人员会进一步提高烧结温度，然而，烧结温度的提高易造成靶材的晶粒尺寸急剧长大，产生成分的偏析，在溅射镀膜的过程中产生不正常的放电效应，劣化薄膜的质量及特性。In related technologies, most lanthanide-doped IZO films are deposited by sputtering using Ln-IZO targets, where the Ln-IZO targets are obtained by calcining Ln-IZO powder precursors prepared by chemical co-precipitation methods. Ln-IZO powder with uniform and high sintering activity is pressed and molded and then sintered under certain conditions to obtain a high-density target. Moreover, Ln-IZO powder prepared by the conventional mixing method (that is, directly mixing various oxide powders in proportion) has the characteristics of difficulty in mixing evenly and low sintering activity. In the actual production process, uneven distribution of ingredients is easily caused. The color of the target material after sintering is uneven, and low sintering activity will also cause its sintering density to be low. In order to increase the sintering density, relevant technicians will further increase the sintering temperature. However, the increase in sintering temperature will easily cause the grain size of the target material to grow sharply, causing segregation of components and producing abnormal discharge effects during the sputtering coating process. , deteriorating the quality and characteristics of the film.
因此，仍需提高镧系金属掺杂IZO靶材的均一性和致密度，并保证溅射不易结瘤。Therefore, it is still necessary to improve the uniformity and density of lanthanide metal-doped IZO targets and ensure that sputtering is not prone to nodulation.
发明内容Contents of the invention
本发明旨在至少解决现有技术中存在的技术问题之一。为此，本发明提出一种镧系金属掺杂IZO靶材及其制备方法，能够提高镧系金属掺杂IZO靶材的均一性和致密度，并保证溅射不易结瘤。The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention proposes a lanthanide metal-doped IZO target and a preparation method thereof, which can improve the uniformity and density of the lanthanide metal-doped IZO target and ensure that sputtering is not prone to nodulation.
本发明还提出一种上述镧系金属掺杂IZO靶材的制备方法。The present invention also proposes a method for preparing the above-mentioned lanthanide metal-doped IZO target.
本发明还提出一种上述镧系金属掺杂IZO靶材在制备显示器中的应用。The invention also proposes the application of the above-mentioned lanthanide metal-doped IZO target in the preparation of displays.
本发明的第一方面，提供了一种镧系金属掺杂IZO靶材，按照质量百分比计包括：A first aspect of the present invention provides a lanthanide metal-doped IZO target, which includes in terms of mass percentage:
Ln系金属氧化物0.5％-10％、氧化铟60％～87％和氧化锌5％～15％；Ln metal oxide 0.5%-10%, indium oxide 60%-87% and zinc oxide 5%-15%;
所述Ln系金属选自镧、铈、镨、钕、钷、钐、铕、钆、铽、镝、钬、铒、铥、镱、镥中的至少一种。The Ln-based metal is selected from at least one selected from the group consisting of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, and lutetium.
根据本发明实施例的镧系金属掺杂IZO靶材，至少具有如下有益效果：本发明通过控制镧系金属掺杂IZO靶材中各成分的占比，所获得的镧系金属掺杂IZO靶材具有致密性高、颜色均 匀且溅射过程不易结瘤等优点。The lanthanide metal-doped IZO target according to the embodiment of the present invention has at least the following beneficial effects: By controlling the proportion of each component in the lanthanide metal-doped IZO target, the lanthanide metal-doped IZO target obtained by the present invention The material has the advantages of high density, uniform color and not easy to form nodules during the sputtering process.
根据本发明的一些实施例，按照质量百分比计包括：According to some embodiments of the present invention, it includes in terms of mass percentage:
Ln系金属氧化物0.5％-10％wt％、氧化铟60％～87％和氧化锌5％～15％；Ln metal oxide 0.5%-10%wt%, indium oxide 60%-87% and zinc oxide 5%-15%;
所述Ln系金属选自镧、铈、镨、钕、钷、钐、铕、钆、铽、镝、钬、铒、铥、镱、镥中的至少一种。The Ln-based metal is selected from at least one selected from the group consisting of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, and lutetium.
根据本发明的一些实施例，按照质量百分比计包括：According to some embodiments of the present invention, it includes in terms of mass percentage:
Ln系金属氧化物0.5％-10％wt％、氧化铟60％～87％和氧化锌5％～15％；Ln metal oxide 0.5%-10%wt%, indium oxide 60%-87% and zinc oxide 5%-15%;
所述Ln系金属选自镧、铈、镨、钕、钷、钐、铕、钆、铽、镝、钬、铒、铥、镱、镥中的至少一种。The Ln-based metal is selected from at least one selected from the group consisting of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, and lutetium.
根据本发明的一些实施例，所述镧系金属掺杂IZO靶材的密度为98.0％～99.3％。According to some embodiments of the present invention, the density of the lanthanide metal-doped IZO target is 98.0% to 99.3%.
根据本发明的一些实施例，所述镧系金属掺杂IZO靶材的密度为98.5％～99.22％。According to some embodiments of the present invention, the density of the lanthanide metal-doped IZO target is 98.5% to 99.22%.
本发明的第二方面，提供了一种上述镧系金属掺杂IZO靶材的制备方法，包括以下制备步骤：A second aspect of the invention provides a method for preparing the above-mentioned lanthanide metal-doped IZO target, which includes the following preparation steps:
步骤S1、向Ln系金属盐、铟盐和锌盐的混合溶液中加入沉淀剂进行沉淀，固液分离，取固相进行干燥、煅烧，得到Ln-IZO前驱体；其中，所述Ln系金属盐中的Ln系金属选自镧、铈、镨、钕、钷、钐、铕、钆、铽、镝、钬、铒、铥、镱、镥中的至少一种；Step S1: Add a precipitating agent to the mixed solution of Ln-based metal salt, indium salt and zinc salt for precipitation, solid-liquid separation, drying and calcining the solid phase to obtain an Ln-IZO precursor; wherein, the Ln-based metal The Ln-based metal in the salt is selected from at least one selected from the group consisting of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, and lutetium;
步骤S2、将所述Ln-IZO前驱体与分散剂、粘结剂混合制浆，进行喷雾干燥，得到Ln-IZO粉体；Step S2: Mix the Ln-IZO precursor with a dispersant and a binder to make a slurry, and spray-dry to obtain Ln-IZO powder;
步骤S3、将所述Ln-IZO粉体依次进行模压成型和冷等静压后，得到毛坯靶材；Step S3: After molding and cold isostatic pressing the Ln-IZO powder in sequence, a blank target material is obtained;
步骤S4、将所述毛坯靶材烧结，即得所述镧系金属掺杂IZO靶材。Step S4: Sinter the blank target material to obtain the lanthanide metal-doped IZO target material.
根据本发明实施例的制备方法，至少具有如下有益效果：本发明通过化学共沉淀的方法，通过控制沉淀工艺，制备出烧结成分均匀且烧结活性高的粉体，并通过控制烧结工艺，实现靶材的高致密度。The preparation method according to the embodiment of the present invention has at least the following beneficial effects: the present invention uses a chemical co-precipitation method and controls the precipitation process to prepare a powder with uniform sintering components and high sintering activity, and by controlling the sintering process, the target The high density of the material.
根据本发明的一些实施例，所述Ln系金属盐选自Ln系金属硫酸盐、Ln系金属硝酸盐和Ln系金属氯盐中的至少一种。According to some embodiments of the present invention, the Ln series metal salt is selected from at least one of Ln series metal sulfate, Ln series metal nitrate and Ln series metal chloride.
根据本发明的一些实施例，所述铟盐选自硫酸铟、硝酸铟和氯化铟中的至少一种。According to some embodiments of the present invention, the indium salt is selected from at least one of indium sulfate, indium nitrate and indium chloride.
根据本发明的一些实施例，所述锌盐选自硫酸锌、硝酸锌和氯化锌中的至少一种。According to some embodiments of the present invention, the zinc salt is selected from at least one of zinc sulfate, zinc nitrate and zinc chloride.
根据本发明的一些实施例，步骤S1中，所述沉淀剂选自无机碱和碳酸盐。According to some embodiments of the present invention, in step S1, the precipitating agent is selected from inorganic bases and carbonates.
根据本发明的一些实施例，所述无机碱选自氢氧化钠、氢氧化钾、氢氧化铯、一水合氨和氨水中的至少一种。According to some embodiments of the present invention, the inorganic base is selected from at least one of sodium hydroxide, potassium hydroxide, cesium hydroxide, ammonia monohydrate and ammonia water.
优选的，所述无机碱为氢氧化钠或氢氧化钾。Preferably, the inorganic base is sodium hydroxide or potassium hydroxide.
根据本发明的一些实施例，所述碳酸盐选自碳酸钠、碳酸钾、碳酸铯、碳酸氢钠、碳酸氢 钾和碳酸氢铯中的至少一种。According to some embodiments of the present invention, the carbonate is selected from at least one of sodium carbonate, potassium carbonate, cesium carbonate, sodium bicarbonate, potassium bicarbonate and cesium bicarbonate.
优选的，所述碳酸盐为碳酸钠。Preferably, the carbonate is sodium carbonate.
优选的，所述氨水的浓度为25％～28％。Preferably, the concentration of ammonia water is 25% to 28%.
优选的，所述氨水的浓度为28％。Preferably, the concentration of ammonia water is 28%.
在本发明中，沉淀剂优选为氢氧化钠，在其他条件相同的情况下，当沉淀剂为氢氧化钠时，所制得的镧系金属掺杂IZO靶材的相对密度与添加其他沉淀剂相比更为优异，为99.00％。而选用氨水为沉淀剂时，所制得的镧系金属掺杂IZO靶材的相对密度为98.5％，相对较低。In the present invention, the precipitating agent is preferably sodium hydroxide. Under other conditions being the same, when the precipitating agent is sodium hydroxide, the relative density of the prepared lanthanide metal-doped IZO target is the same as that of adding other precipitating agents. The comparison is even better, 99.00%. When ammonia water is used as the precipitant, the relative density of the prepared lanthanide metal-doped IZO target is 98.5%, which is relatively low.
根据本发明的一些实施例，所述沉淀的pH值为6～9。According to some embodiments of the present invention, the pH value of the precipitation is 6-9.
优选的，所述沉淀的pH值为6～8。Preferably, the pH value of the precipitation is 6-8.
沉淀的pH值是影响镧系金属掺杂IZO靶材质量的重要因素，在本发明中，当pH值大于9时，由于晶体生长过快，其所制备出来的镧系金属掺杂IZO靶材在溅射过程中易出现结瘤情况；而当沉淀pH值为6～8时，可获得较高的靶材相对密度，且溅射过程中不会出现结瘤现象。The pH value of the precipitation is an important factor affecting the quality of the lanthanide metal-doped IZO target. In the present invention, when the pH value is greater than 9, the prepared lanthanide metal-doped IZO target will be damaged due to excessive crystal growth. Nodulation is prone to occur during the sputtering process; when the precipitation pH value is 6 to 8, a higher relative density of the target can be obtained, and no nodulation will occur during the sputtering process.
根据本发明的一些实施例，步骤S1中，所述干燥的方式为真空冷冻干燥。According to some embodiments of the present invention, in step S1, the drying method is vacuum freeze drying.
采用真空冷冻干燥有利于防止纳米粉体的团聚。The use of vacuum freeze-drying is helpful to prevent the agglomeration of nanopowders.
根据本发明的一些实施例，所述煅烧的温度为600℃～1200℃。According to some embodiments of the present invention, the calcination temperature is 600°C to 1200°C.
根据本发明的一些实施例，所述煅烧的温度为700℃～900℃。According to some embodiments of the present invention, the calcination temperature is 700°C to 900°C.
优选的，所述煅烧的温度为800℃。Preferably, the calcination temperature is 800°C.
根据本发明的一些实施例，所述煅烧的时间为1.5h～2.5h。According to some embodiments of the present invention, the calcination time is 1.5h to 2.5h.
优选的，所述煅烧的时间为2h。Preferably, the calcination time is 2 hours.
根据本发明的一些实施例，所述分散剂的型号为CELUNA D-305，购买于中京油脂株式会社。According to some embodiments of the present invention, the model of the dispersant is CELUNA D-305, purchased from Chukyo Oils and Fats Co., Ltd.
根据本发明的一些实施例，所述分散剂的添加量为0.5％～2％。According to some embodiments of the present invention, the added amount of the dispersant is 0.5% to 2%.
根据本发明的一些实施例，所述粘结剂为聚乙烯醇，购于上海国药试剂集团国药集团，货号为30153160。According to some embodiments of the present invention, the binder is polyvinyl alcohol, which is purchased from Shanghai Sinopharm Reagent Group Sinopharm Group with the item number 30153160.
根据本发明的一些实施例，所述粘结剂的添加量为2％～4％。According to some embodiments of the present invention, the added amount of the binder is 2% to 4%.
根据本发明的一些实施例，步骤S2中，所述Ln-IZO粉体的比表面积为5m 2/g～15m 2/g。 According to some embodiments of the present invention, in step S2, the specific surface area of the Ln-IZO powder is 5 m 2 /g ~ 15 m 2 /g.
优选的，所述Ln-IZO粉体的比表面积为10m 2/g～12m 2/g。 Preferably, the specific surface area of the Ln-IZO powder is 10m 2 /g ~ 12m 2 /g.
在保留粉末烧结活性的情况下，该比表面积下的Ln-IZO粉体更利于成型，且模压成型的弹性后效更小。While retaining the powder sintering activity, the Ln-IZO powder under this specific surface area is more conducive to molding, and the elastic aftereffects of molding are smaller.
根据本发明的一些实施例，步骤S3中，所述模压成型的压力为0.1Mpa～0.8Mpa。According to some embodiments of the present invention, in step S3, the molding pressure is 0.1Mpa～0.8Mpa.
优选的，所述冷等静压的压力为200Mpa～400Mpa。Preferably, the pressure of the cold isostatic pressing is 200Mpa～400Mpa.
根据本发明的一些实施例，步骤S4中，所述烧结过程中脱胶的温度为400℃～700℃。According to some embodiments of the present invention, in step S4, the degumming temperature during the sintering process is 400°C to 700°C.
在该温度下进行脱胶能够有效将添加的分散剂及粘结剂完全从坯体脱出，易于后续的烧结。Degumming at this temperature can effectively remove the added dispersant and binder from the green body, making subsequent sintering easier.
根据本发明的一些实施例，步骤S4中，所述烧结温度为1100℃～1400℃；According to some embodiments of the present invention, in step S4, the sintering temperature is 1100°C to 1400°C;
优选的，所述烧结温度为1150℃～1400℃；Preferably, the sintering temperature is 1150°C to 1400°C;
在本发明中，烧结温度过低，容易导致靶材的相对密度较低，进而降低靶材的质量；而相对密度过高，在靶材溅射过程中容易出现结瘤现象，且靶材的晶体粗大，因此，选择合适的烧结温度对提高靶材的质量至关重要。In the present invention, if the sintering temperature is too low, it is easy to cause the relative density of the target to be low, thereby reducing the quality of the target; and if the relative density is too high, nodulation is likely to occur during the target sputtering process, and the target's The crystals are coarse, so choosing the appropriate sintering temperature is crucial to improving the quality of the target.
根据本发明的一些实施例，步骤S4中，所述烧结的压力为0.05Mpa～0.3Mpa。According to some embodiments of the present invention, in step S4, the sintering pressure is 0.05Mpa～0.3Mpa.
优选的，所述烧结的压力为0.2Mpa～0.3Mpa。Preferably, the sintering pressure is 0.2Mpa～0.3Mpa.
烧结压力过高时，对密度的提升效果不明显，同时对设备的要求更高，生产成本也更高，不利于工业生产。而烧结压力过低时，则难以达到提升密度的效果。When the sintering pressure is too high, the density improvement effect is not obvious. At the same time, the requirements for equipment are higher and the production cost is higher, which is not conducive to industrial production. When the sintering pressure is too low, it is difficult to achieve the effect of increasing density.
在烧结过程中提高烧结压力有利于提高镧系金属掺杂IZO靶材的质量。在本发明中，在其他制备条件相同的情况下，随着烧结压力的增加，靶材的相对密度显著提高，且制备的靶材在溅射过程中未出现结瘤现象。Increasing the sintering pressure during the sintering process is beneficial to improving the quality of lanthanide metal-doped IZO targets. In the present invention, when other preparation conditions are the same, as the sintering pressure increases, the relative density of the target material increases significantly, and no nodulation occurs in the prepared target material during the sputtering process.
根据本发明的一些实施例，步骤S4中，所述烧结的时间为550min～650min。According to some embodiments of the present invention, in step S4, the sintering time is 550 min to 650 min.
优选的，所述烧结的时间为600min。Preferably, the sintering time is 600 minutes.
本发明的第三方面，提供了一种上述镧系金属掺杂IZO靶材在制备显示器中的应用。A third aspect of the present invention provides an application of the above-mentioned lanthanide metal-doped IZO target in the preparation of displays.
由于该应用采用了上述实施例的镧系金属掺杂IZO靶材的全部技术方案，因此至少具有上述实施例的技术方案所带来的所有有益效果。Since this application adopts all the technical solutions of the lanthanide metal-doped IZO targets of the above embodiments, it has at least all the beneficial effects brought by the technical solutions of the above embodiments.
本发明的其它特征和优点将在随后的说明书中阐述，并且，部分地从说明书中变得显而易见，或者通过实施本发明而了解。Additional features and advantages of the invention will be set forth in the description which follows, and in part will be apparent from the description, or may be learned by practice of the invention.
具体实施方式Detailed ways
以下将结合实施例对本发明的构思及产生的技术效果进行清楚、完整地描述，以充分地理解本发明的目的、特征和效果。显然，所描述的实施例只是本发明的一部分实施例，而不是全部实施例，基于本发明的实施例，本领域的技术人员在不付出创造性劳动的前提下所获得的其他实施例，均属于本发明保护的范围。The concept of the present invention and the technical effects produced will be clearly and completely described below with reference to the embodiments, so as to fully understand the purpose, features and effects of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, other embodiments obtained by those skilled in the art without exerting creative efforts are all protection scope of the present invention.
本发明的描述中，参考术语“一个实施例”、“一些实施例”、“示意性实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明书中，对上述术语的示意性表述不一定指的是相同的实施例或示例。而且，描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施例或示例中以合适的方式结合。In the description of the present invention, reference to the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" is intended to be in conjunction with the description of the embodiment. or examples describe specific features, structures, materials, or characteristics that are included in at least one embodiment or example of the invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
实施例中未注明具体条件者，按照常规条件或制造商建议的条件进行。所用试剂或仪器未 注明生产厂商者，均为可以通过市售购买获得的常规产品。If the specific conditions are not specified in the examples, the conditions should be carried out according to the conventional conditions or the conditions recommended by the manufacturer. If the manufacturer of the reagents or instruments used is not indicated, they are all conventional products that can be purchased commercially.
在本发明实施例中，分散剂购买于中京油脂株式会社，货号为CELUNA D-305；In the embodiment of the present invention, the dispersant was purchased from Chukyo Oils and Fats Co., Ltd., and the product number is CELUNA D-305;
粘结剂为PVA，聚合度1750±50，购于上海国药试剂集团国药集团，货号为30153160。The binder is PVA with a degree of polymerization of 1750±50. It was purchased from Shanghai Sinopharm Reagent Group with the item number of 30153160.
实施例1Example 1
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至6进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为140m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 6 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 140 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1400℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，观察镧系金属掺杂IZO靶材的中毒情况，即在靶材的表面出现点状凸起物。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 and the coating was continued for 60 hours. The poisoning of the lanthanide metal-doped IZO target was observed, that is, point-like protrusions appeared on the surface of the target.
实施例2Example 2
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至7进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为120m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 7 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 120 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1400℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％wt％、氧化铟85wt％和氧化锌10wt％；The lanthanum series metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% wt% of Ln series metal praseodymium oxide, 85 wt% of indium oxide, and 10 wt% of zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.90％，颜色均一，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by using the method of this embodiment is 98.90%, the color is uniform, and no nodulation and crystal coarseness occur.
实施例3Example 3
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1400℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括Ln系金属镨氧化物5％wt％、氧化铟85wt％和氧化锌10wt％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage, 5% wt% of Ln-series metal praseodymium oxide, 85wt% indium oxide, and 10wt% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.00％，颜色均一，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by using the method of this embodiment is 99.00%, the color is uniform, and no nodulation and crystal coarseness occur.
实施例4Example 4
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至9进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为100m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 9 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 100 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1400℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.80％，颜色均一性相对有所下降，未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target obtained by the method of this embodiment is 98.80%, the color uniformity is relatively reduced, and no nodulation and crystal coarseness occur.
实施例5Example 5
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂KOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add precipitant KOH to the mixed solution of 0.3mol/L Ln-based metal salt praseodymium chloride, 0.3mol/L indium chloride and 0.3mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1400℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.90％，颜色均一，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by using the method of this embodiment is 98.90%, the color is uniform, and no nodulation and crystal coarseness occur.
实施例6Example 6
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂碳酸钠，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物 进行清洗，并将其进行真空冷冻干燥，得到比表面积约为115m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent sodium carbonate to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. , solid-liquid separation, washing the solid precipitate with deionized water, and vacuum freeze-drying it to obtain a powder product with a specific surface area of approximately 115m 2 /g, and calcining the powder product at 800°C. The calcination time is 2h, and a uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1400℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.70％，颜色均一，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by using the method of this embodiment is 98.70%, the color is uniform, and no nodulation and crystal coarseness occur.
实施例7Example 7
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂氨水，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为120m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent ammonia water to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 120 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1400℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.50％，颜色均一，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by using the method of this embodiment is 98.50%, the color is uniform, and no nodulation and crystal coarseness occur.
实施例8Example 8
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1100℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1100°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为97.80％，颜色发黄，均一性好，未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 97.80%, the color is yellow, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例9Example 9
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1150℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1150°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.00％，颜色轻微发黄，均一性好，未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 98.00%, the color is slightly yellow, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例10Example 10
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.10％，颜色轻微发黄，均一性好，未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 98.10%, the color is slightly yellow, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例11Example 11
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1250℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1250°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.30％，颜色轻微发黄，均一性好，未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 98.30%, the color is slightly yellow, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例12Example 12
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1300℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1300°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.50％，颜色为浅墨绿色，均一性好，未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 98.50%, the color is light dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例13Example 13
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1350℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1350°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.00％，颜色为墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.00%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例14Example 14
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1400℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.00％，颜色为墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.00%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例15Example 15
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.05Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.05Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.60％，颜色呈浅墨绿色，均一性好，未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 98.60%, the color is light dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例16Example 16
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.1Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.1Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanum series metal-doped IZO target prepared in this embodiment includes 5% Ln series metal praseodymium oxide, 85% indium oxide and 10% zinc oxide in terms of mass percentage;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2， 连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.00％，颜色呈墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power is 1.5W/cm 2 , and the coating is continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.00%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例17Example 17
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.15Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.15Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.10％，颜色呈墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.10%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例18Example 18
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.2Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.2Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.20％，颜色呈墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.20%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例19Example 19
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.25Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.25Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.21％，颜色呈墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.21%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例20Example 20
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.3Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.22％，颜色呈墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.22%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例21Example 21
本实施例为一种镧系金属铈掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal cerium-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化铈、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt cerium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.3Mpa条件下烧结10h，得到镧系金属铈掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal cerium-doped IZO target.
本实施例中制得的镧系金属铈掺杂IZO靶材，按照质量百分比计包括：Ln系金属铈氧化物5％、氧化铟85％和氧化锌10％；The lanthanum series metal cerium doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln series metal cerium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属铈掺杂IZO靶材进行镀膜测试，将所得镧系金属铈掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属铈掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.25％，颜色呈墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal cerium doped IZO target prepared in this embodiment, bind the obtained lanthanide metal cerium doped IZO target to a copper backing plate, and install it into the DC magnetron sputtering equipment Sputtering coating was performed, with the coating power being 1.5W/cm 2 and continuous coating for 60 hours, to detect the poisoning of the lanthanide metal cerium-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.25%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例22Example 22
本实施例为一种镧系金属镧掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal lanthanum-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镧、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液 中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt lanthanum chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.3Mpa条件下烧结10h，得到镧系金属镧掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal lanthanum-doped IZO target.
本实施例中制得的镧系金属镧掺杂IZO靶材，按照质量百分比计包括：Ln系金属镧氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal lanthanum-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal lanthanum oxide, 85% indium oxide, and 10% zinc oxide;
对本实施例制得的镧系金属镧掺杂IZO靶材进行镀膜测试，将所得镧系金属镧掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属镧掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.28％，颜色呈墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal lanthanum-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal lanthanum-doped IZO target to a copper backing plate, and install it into the DC magnetron sputtering equipment Sputter coating was performed, with the coating power being 1.5W/cm 2 and continuous coating for 60 hours, to detect the poisoning of the lanthanide metal lanthanum-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.28%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例23Example 23
本实施例为一种镧系金属钕掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal neodymium-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化钕、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt neodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.3Mpa条件下烧结10h，得到镧系金属钕掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal neodymium-doped IZO target.
本实施例中制得的镧系金属钕掺杂IZO靶材，按照质量百分比计包括：Ln系金属钕氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal neodymium-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal neodymium oxide, 85% indium oxide, and 10% zinc oxide;
对本实施例制得的镧系金属钕掺杂IZO靶材进行镀膜测试，将所得镧系金属钕掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为 1.5W/cm 2，连续镀膜60h，检测镧系金属钕掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.24％，颜色呈墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal neodymium-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal neodymium-doped IZO target to a copper backing plate, and install it into the DC magnetron sputtering equipment Sputtering coating was performed, with the coating power being 1.5W/cm 2 and continuous coating for 60 hours, to detect the poisoning of the lanthanide metal neodymium-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.24%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
实施例24Example 24
本实施例为一种镧系金属铕掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal europium-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化铕、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln metal salt europium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1200℃、压力为0.3Mpa条件下烧结10h，得到镧系金属铕掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1200°C and a pressure of 0.3Mpa for 10 hours to obtain a lanthanide metal europium-doped IZO target.
本实施例中制得的镧系金属铕掺杂IZO靶材，按照质量百分比计包括：Ln系金属铕氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal europium-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal europium oxide, 85% indium oxide, and 10% zinc oxide;
对本实施例制得的镧系金属铕掺杂IZO靶材进行镀膜测试，将所得镧系金属铕掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属铕掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.25％，颜色呈墨绿色，均一性好，且未出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal europium-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal europium-doped IZO target to a copper backing plate, and install it into the DC magnetron sputtering equipment Sputtering coating was performed, with the coating power being 1.5W/cm 2 and continuous coating for 60 hours, to detect the poisoning of the lanthanide metal europium-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.25%, the color is dark green, the uniformity is good, and no nodulation and crystal coarseness occur.
对比例1Comparative example 1
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至10进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为70m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 10 for precipitation. Solid-liquid separation, washing the solid precipitate with deionized water, and vacuum freeze-drying to obtain a powder product with a specific surface area of approximately 70 m 2 /g, and calcining the powder product at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1400℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1400°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为98.50％，颜色均一性相对较低，出现严重的结瘤和偏析现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 98.50%, the color uniformity is relatively low, and severe nodulation and segregation occur.
对比例2Comparative example 2
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1450℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1450°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.00％，颜色为墨绿色，出现了轻微结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target obtained by the method of this embodiment is 99.00%, the color is dark green, and there are slight nodules and coarse crystals.
对比例3Comparative example 3
本实施例为一种镧系金属掺杂IZO靶材的制备方法，具体包括以下步骤：This embodiment is a method for preparing a lanthanide metal-doped IZO target, which specifically includes the following steps:
步骤S1：向0.3mol/L Ln系金属盐氯化镨、0.3mol/L氯化铟和0.3mol/L氯化锌的混合溶液中加入沉淀剂NaOH，并调节沉淀pH值至8进行沉淀，固液分离，用去离子水对的固体沉淀物进行清洗，并将其进行真空冷冻干燥，得到比表面积约为110m 2/g的粉末产物，将该粉末产物置于800℃下进行煅烧，煅烧时间为2h，得到分布均匀的Ln-IZO前驱体； Step S1: Add the precipitating agent NaOH to the mixed solution of 0.3 mol/L Ln-based metal salt praseodymium chloride, 0.3 mol/L indium chloride and 0.3 mol/L zinc chloride, and adjust the precipitation pH value to 8 for precipitation. Solid-liquid separation, the solid precipitate is washed with deionized water, and vacuum freeze-dried to obtain a powder product with a specific surface area of approximately 110 m 2 /g. The powder product is calcined at 800°C. The time is 2h, and the uniformly distributed Ln-IZO precursor is obtained;
步骤S2：向上述Ln-IZO前驱体中添加1％的分散剂和3％的粘结剂，经过球磨获得浆料，然后通过喷雾干燥的方法制得Ln-IZO粉体，其Ln-IZO粉体的比表面积为10m 2/g～12m 2/g； Step S2: Add 1% dispersant and 3% binder to the above-mentioned Ln-IZO precursor, obtain a slurry through ball milling, and then prepare Ln-IZO powder by spray drying. The specific surface area of the body is 10m 2 /g ~ 12m 2 /g;
步骤S3：将所得的Ln-IZO粉体在0.1Mpa～0.8Mpa的压力下进行模压成型，并对其进行压力为200Mpa～400Mpa的冷等静压，获得毛坯靶材；Step S3: Molding the obtained Ln-IZO powder under a pressure of 0.1Mpa to 0.8Mpa, and subjecting it to cold isostatic pressing at a pressure of 200Mpa to 400Mpa to obtain a blank target material;
步骤S4：将上述成型的毛坯靶材置于450℃下进行脱胶，再置于温度为1500℃、压力为0Mpa条件下烧结10h，得到镧系金属掺杂IZO靶材。Step S4: Place the above-shaped blank target at 450°C for degumming, and then sinter it at a temperature of 1500°C and a pressure of 0 MPa for 10 hours to obtain a lanthanide metal-doped IZO target.
本实施例中制得的镧系金属掺杂IZO靶材，按照质量百分比计包括：Ln系金属镨氧化物5％、氧化铟85％和氧化锌10％；The lanthanide metal-doped IZO target prepared in this embodiment includes, in terms of mass percentage: 5% Ln-based metal praseodymium oxide, 85% indium oxide and 10% zinc oxide;
对本实施例制得的镧系金属掺杂IZO靶材进行镀膜测试，将所得镧系金属掺杂IZO靶材绑定至铜背板上，并将其安装至直流磁控溅射设备中进行溅射镀膜，其中镀膜的功率为1.5W/cm 2，连续镀膜60h，检测镧系金属掺杂IZO靶材的中毒情况。结果表明，采用本实施例方法获得的靶材的相对密度为99.01％，颜色为墨绿色，出现结瘤和晶体粗大的现象。 Conduct a coating test on the lanthanide metal-doped IZO target prepared in this embodiment, bind the obtained lanthanide metal-doped IZO target to a copper backing plate, and install it into a DC magnetron sputtering equipment for sputtering The coating power was 1.5W/cm 2 , and the coating was continuously coated for 60 hours to detect the poisoning of the lanthanide metal-doped IZO target. The results show that the relative density of the target material obtained by the method of this embodiment is 99.01%, the color is dark green, and nodules and crystals are coarse.
为了便于理解本发明方案，对上述实施例的工艺参数进行了汇总，其具体如表1所示：In order to facilitate understanding of the solution of the present invention, the process parameters of the above embodiments are summarized, as shown in Table 1:
表1：实施例1～20和对比例1～3的镧系金属掺杂IZO靶材的制备过程参数控制Table 1: Preparation process parameter control of lanthanide metal-doped IZO targets of Examples 1 to 20 and Comparative Examples 1 to 3
Figure PCTCN2022126489-appb-000001
Figure PCTCN2022126489-appb-000001
Figure PCTCN2022126489-appb-000002
Figure PCTCN2022126489-appb-000002
注：颜色与靶材的密度直接关联，一般颜色越黄密度越低，“-”表示未检测到。Note: The color is directly related to the density of the target. Generally, the yellower the color, the lower the density. “-” means not detected.
从表1中可以看出，实施例1～4和对比例1的区别在于沉淀pH值不同，当pH为7～8时可以获得相对密度较高、颜色均一性好的靶材，且该靶材不易出现结瘤和偏析现象；而当pH值为10时(如对比例1所示)，其制备得到的靶材密度明显降低，且出现了较为严重的结瘤和偏析现象。As can be seen from Table 1, the difference between Examples 1 to 4 and Comparative Example 1 is that the pH value of the precipitation is different. When the pH is 7 to 8, a target with higher relative density and good color uniformity can be obtained, and the target The material is not prone to nodulation and segregation; when the pH value is 10 (as shown in Comparative Example 1), the density of the prepared target material is significantly reduced, and more serious nodulation and segregation occur.
在本发明中，实施例3和实施例5～7的区别在于使用了不同的沉淀剂，测试结果表明，沉淀剂的种类对靶材的颜色均一性影响不大，但对靶材的密度具有一定的影响，其中当沉淀剂为氢氧化钠时，靶材的相对密度最大，能够达到99.00％。In the present invention, the difference between Example 3 and Examples 5 to 7 lies in the use of different precipitating agents. The test results show that the type of precipitating agent has little effect on the color uniformity of the target material, but has a significant impact on the density of the target material. There is a certain influence. When the precipitating agent is sodium hydroxide, the relative density of the target material is the largest and can reach 99.00%.
在本发明中，实施例8～14和对比例2～3的区别在于烧结温度不同，其中实施例8的烧结温度最低，为1100℃，结果表明，在该温度下获得的靶材相对密度较低，仅为97.80％，颜色发黄现象，但对其均一性未产生影响；当烧结温度为1150℃～1400℃时，能够获得相对较高靶材密度，其中当烧结温度为1300℃～1400℃时，所获得的靶材质量最佳，其相对密度达到98.5％以上；而当烧结温度到达1450℃及以上时(如对比例2和对比例3所示)，虽然能获得较高的相对密度，但是存在结瘤和晶体粗大的现象。In the present invention, the difference between Examples 8 to 14 and Comparative Examples 2 to 3 lies in the different sintering temperatures. Example 8 has the lowest sintering temperature of 1100°C. The results show that the relative density of the target material obtained at this temperature is relatively high. Low, only 97.80%, and the color turns yellow, but it has no impact on its uniformity; when the sintering temperature is 1150°C ~ 1400°C, a relatively high target density can be obtained, among which when the sintering temperature is 1300°C ~ 1400°C When the sintering temperature reaches 1450°C and above (as shown in Comparative Examples 2 and 3), although a higher relative density can be obtained, Density, but there are nodules and coarse crystals.
在本发明中，实施例15～20的区别在于烧结压力不同，结果表明，在相同条件下增加烧结压力有利于烧结密度的提高，且制备的靶材在溅射过程中不易出现结瘤现象。In the present invention, the difference between Examples 15 to 20 is that the sintering pressure is different. The results show that increasing the sintering pressure under the same conditions is beneficial to improving the sintering density, and the prepared target material is not prone to nodulation during the sputtering process.
此外，在本发明中，实施例20～24的区别在于掺杂的镧系金属不同，结果表明，采用本发明的制备工艺所制得的不同镧系金属掺杂IZO靶材均具有较好的相对密度，且靶材颜色均一，未发生结瘤情况。In addition, in the present invention, the difference between Examples 20 to 24 is that the doped lanthanide metals are different. The results show that the different lanthanide metal-doped IZO targets prepared by the preparation process of the present invention all have better performance. Relative density, and the color of the target material is uniform, and no nodulation occurs.
综上所述，采用本发明镧系金属掺杂IZO靶材的制备工艺，通过调节沉淀剂的类型、控制沉淀pH值和烧结温度及烧结压，能够解决镧系掺杂靶材制备过程中出现的烧结致密度不高、且 容易出现颜色不均匀及溅射结瘤的问题，为制备高质量的溅射薄膜提供了重要的参考价值。In summary, the preparation process of the lanthanide metal-doped IZO target of the present invention can solve the problems that occur in the preparation process of the lanthanide-doped target by adjusting the type of precipitant, controlling the precipitation pH value, sintering temperature and sintering pressure. The sintering density is not high and is prone to uneven color and sputtering nodules, which provides an important reference value for the preparation of high-quality sputtered films.
上面对本发明实施例作了详细说明，但是本发明不限于上述实施例，在所属技术领域普通技术人员所具备的知识范围内，还可以在不脱离本发明宗旨的前提下作出各种变化。此外，在不冲突的情况下，本发明的实施例及实施例中的特征可以相互组合。The embodiments of the present invention have been described in detail above. However, the present invention is not limited to the above-mentioned embodiments. Various changes can be made within the knowledge scope of those of ordinary skill in the art without departing from the gist of the present invention. In addition, the embodiments of the present invention and the features in the embodiments may be combined with each other without conflict.

Claims (10)

  1. 一种镧系金属掺杂IZO靶材，其特征在于，按照质量百分比计包括：A lanthanide metal-doped IZO target material, which is characterized in that it includes: in terms of mass percentage:
    Ln系金属氧化物0.5％～10％、氧化铟60％～87％和氧化锌5％～15％；Ln metal oxide 0.5% ~ 10%, indium oxide 60% ~ 87% and zinc oxide 5% ~ 15%;
    所述Ln系金属氧化物中，Ln系金属选自镧、铈、镨、钕、钷、钐、铕、钆、铽、镝、钬、铒、铥、镱、镥中的至少一种。In the Ln-based metal oxide, the Ln-based metal is selected from at least one selected from the group consisting of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, and lutetium.
  2. 根据权利要求1所述的镧系金属掺杂IZO靶材，其特征在于，所述镧系金属掺杂IZO靶材的密度为98.0％～99.3％。The lanthanide metal-doped IZO target according to claim 1, wherein the density of the lanthanide metal-doped IZO target is 98.0% to 99.3%.
  3. 一种如权利要求1或2所述的镧系金属掺杂IZO靶材的制备方法，其特征在于，包括以下制备步骤：A method for preparing a lanthanide metal-doped IZO target as claimed in claim 1 or 2, characterized in that it includes the following preparation steps:
    步骤S1、向Ln系金属盐、铟盐和锌盐的混合溶液中加入沉淀剂进行沉淀，固液分离，取固相进行干燥、煅烧，得到Ln-IZO前驱体；其中，所述Ln系金属盐中的Ln系金属如权利要求1或2所定义；Step S1: Add a precipitating agent to the mixed solution of Ln-based metal salt, indium salt and zinc salt for precipitation, solid-liquid separation, drying and calcining the solid phase to obtain an Ln-IZO precursor; wherein, the Ln-based metal The Ln series metal in the salt is as defined in claim 1 or 2;
    步骤S2、将所述Ln-IZO前驱体与分散剂、粘结剂制浆，进行喷雾干燥，得到Ln-IZO粉体；Step S2: Slurry the Ln-IZO precursor, dispersant, and binder, and spray-dry to obtain Ln-IZO powder;
    步骤S3、将所述Ln-IZO粉体依次进行模压成型和冷等静压后，得到毛坯靶材；Step S3: After molding and cold isostatic pressing the Ln-IZO powder in sequence, a blank target material is obtained;
    步骤S4、将所述毛坯靶材烧结，即得所述镧系金属掺杂IZO靶材。Step S4: Sinter the blank target material to obtain the lanthanide metal-doped IZO target material.
  4. 如权利要求3所述的镧系金属掺杂IZO靶材的制备方法，其特征在于，所述Ln系金属盐选自Ln系金属硫酸盐、Ln系金属硝酸盐和Ln系金属氯盐中的至少一种；The preparation method of lanthanum series metal-doped IZO target material according to claim 3, characterized in that the Ln series metal salt is selected from the group consisting of Ln series metal sulfate, Ln series metal nitrate and Ln series metal chloride salt. at least one;
    优选的，所述铟盐选自硫酸铟、硝酸铟和氯化铟中的至少一种；Preferably, the indium salt is selected from at least one of indium sulfate, indium nitrate and indium chloride;
    优选的，所述锌盐选自硫酸锌、硝酸锌和氯化锌中的至少一种。Preferably, the zinc salt is selected from at least one of zinc sulfate, zinc nitrate and zinc chloride.
  5. 如权利要求3所述的镧系金属掺杂IZO靶材的制备方法，其特征在于，步骤S1中，所述沉淀剂选自无机碱和碳酸盐；The preparation method of lanthanide metal-doped IZO target material according to claim 3, characterized in that, in step S1, the precipitating agent is selected from inorganic bases and carbonates;
    优选的，所述无机碱选自氢氧化钠、氢氧化钾、氢氧化铯、一水合氨和氨水中的至少一种；Preferably, the inorganic base is selected from at least one of sodium hydroxide, potassium hydroxide, cesium hydroxide, ammonia monohydrate and ammonia water;
    优选的，所述碳酸盐选自碳酸钠、碳酸钾、碳酸铯、碳酸氢钠、碳酸氢钾和碳酸氢铯中的至少一种；Preferably, the carbonate is selected from at least one of sodium carbonate, potassium carbonate, cesium carbonate, sodium bicarbonate, potassium bicarbonate and cesium bicarbonate;
    优选的，所述沉淀的pH值为6～9。Preferably, the pH value of the precipitation is 6-9.
  6. 如权利要求3所述的镧系金属掺杂IZO靶材的制备方法，其特征在于，步骤S1中，所述煅烧的温度为600℃～1200℃，所述煅烧的时间为1.5h～2.5h。The preparation method of lanthanide metal-doped IZO target material according to claim 3, characterized in that, in step S1, the calcination temperature is 600°C ~ 1200°C, and the calcination time is 1.5h ~ 2.5h .
  7. 如权利要求3所述的镧系金属掺杂IZO靶材的制备方法，其特征在于，步骤S2中， 所述Ln-IZO粉体的比表面积为5m 2/g～15m 2/g； The preparation method of lanthanide metal-doped IZO target material according to claim 3, characterized in that, in step S2, the specific surface area of the Ln-IZO powder is 5m 2 /g ~ 15m 2 /g;
    优选的，所述Ln-IZO粉体的比表面积为10m 2/g～12m 2/g。 Preferably, the specific surface area of the Ln-IZO powder is 10m 2 /g ~ 12m 2 /g.
  8. 如权利要求3所述的镧系金属掺杂IZO靶材的制备方法，其特征在于，步骤S3中，所述模压成型的压力为0.1Mpa～0.8Mpa；The preparation method of lanthanide metal-doped IZO target material according to claim 3, characterized in that, in step S3, the pressure of the molding is 0.1Mpa～0.8Mpa;
    优选的，所述冷等静压的压力为200Mpa～400Mpa。Preferably, the pressure of the cold isostatic pressing is 200Mpa～400Mpa.
  9. 如权利要求3所述的镧系金属掺杂IZO靶材的制备方法，其特征在于，步骤S4中，在所述烧结前进行脱胶，优选的，所述脱胶的温度为400℃～700℃；The preparation method of lanthanide metal-doped IZO target material according to claim 3, characterized in that, in step S4, degumming is performed before the sintering. Preferably, the degumming temperature is 400°C to 700°C;
    优选的，所述烧结的温度为1100℃～1400℃，更优选的，所述烧结的温度为1150℃～1400℃；Preferably, the sintering temperature is 1100°C to 1400°C, and more preferably, the sintering temperature is 1150°C to 1400°C;
    优选的，所述烧结的压力为0.05Mpa～0.3Mpa；Preferably, the sintering pressure is 0.05Mpa～0.3Mpa;
    优选的，所述烧结的时间为550min～650min。Preferably, the sintering time is 550 min to 650 min.
  10. 一种如权利要求1或2所述的镧系金属掺杂IZO靶材在制备显示器中的应用。An application of the lanthanide metal-doped IZO target as claimed in claim 1 or 2 in the preparation of displays.
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