WO2023231962A1 - Grating, and method and device for fabricating grating - Google Patents

Grating, and method and device for fabricating grating Download PDF

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Publication number
WO2023231962A1
WO2023231962A1 PCT/CN2023/096830 CN2023096830W WO2023231962A1 WO 2023231962 A1 WO2023231962 A1 WO 2023231962A1 CN 2023096830 W CN2023096830 W CN 2023096830W WO 2023231962 A1 WO2023231962 A1 WO 2023231962A1
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WIPO (PCT)
Prior art keywords
colloid
force
particles
grating
particle
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PCT/CN2023/096830
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French (fr)
Chinese (zh)
Inventor
李志海
张适
王浩宇
蒋珺楠
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华为技术有限公司
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Publication of WO2023231962A1 publication Critical patent/WO2023231962A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings

Definitions

  • the present application relates to the field of optical technology, and more specifically, to a grating, a method and equipment for making a grating.
  • Grating is a very widely used and important high-resolution dispersive optical element, which occupies a very important position in modern academic instruments.
  • volume holographic gratings have the characteristics of high diffraction efficiency, easy manufacturing, and easy elimination of ghosts, and are an important development direction of gratings.
  • holographic gratings are generally manufactured using holographic lithography technology.
  • gratings made by holographic lithography technology have low grating refractive index contrast, that is, the refraction of different areas within the grating period.
  • the rate difference is relatively low, which constrains the grating to obtain better optical performance.
  • This application provides a grating, a grating manufacturing method and equipment, which can improve the grating refractive index contrast and obtain a grating with better optical performance.
  • the first aspect provides a method for making a grating, which includes: applying force at intervals on a colloid containing particles to aggregate the particles in the colloid in zones; solidifying the colloid to form a grating with a preset period, and the period of the grating is There is a corresponding relationship with the separation distance of the applied force.
  • the separation distance of the applied force can be understood as the interval at which the applied force is applied.
  • the interval at which the force is applied may be 1 nm to 10 ⁇ m.
  • the method of making gratings can complete the production of gratings by applying force on the colloid at intervals and then solidifying the colloid.
  • the production method is simple, and at the same time, there is a corresponding relationship between the period of the grating and the separation distance of the force.
  • Gratings with different periods can be made by setting the intervals of the applied forces.
  • the particle selection range is large, and particles with a higher refractive index can be selected to make gratings, thereby improving the grating refractive index contrast and obtaining gratings with better optical properties.
  • the grating includes a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
  • the number of particles in the non-particle aggregation area in the grating is less than the number of particles in the particle aggregation area, so that the refractive index of the particle aggregation area is greater than the refractive index of the non-particle aggregation area, thereby forming a grating with a certain refractive index contrast.
  • the refractive index of the particle aggregation region is greater than the refractive index of the non-particle aggregation region.
  • the refractive index contrast of the grating is the difference between the refractive index of the particle gathering area and the refractive index of the non-particle gathering area.
  • the grating made by the method of making gratings provided in this application includes a particle gathering area and a non-particle gathering area, and the refractive index of the particle gathering area is greater than the refractive index of the non-particle gathering area. It can be selected by selecting a higher refractive index.
  • the particles make gratings, which can improve the grating refractive index contrast and obtain gratings with better optical properties.
  • the difference between the refractive index of the particle aggregation region and the refractive index of the non-particle aggregation region is greater than or equal to 0.2.
  • the difference between the refractive index of the particle gathering area and the refractive index of the non-particle gathering area is greater than or equal to 0.2, that is, the grating refraction.
  • the rate contrast is greater than or equal to 0.2, and the grating refractive index contrast can be further improved compared to the existing technology.
  • the method before applying force at intervals on the particle-containing colloid, the method further includes: laying the particle-containing colloid on the first surface of the substrate.
  • the method of making a grating provided by this application can make the surface of the colloid smoother by laying the colloid containing particles on the first surface of the substrate, so that the surface of the grating produced is smoother.
  • the method further includes: arranging a cover plate on a side of the particle-containing colloid away from the first surface.
  • the method of making a grating provided by this application forms a sandwich structure by arranging a base body or cover plates on both sides of the colloid, thereby avoiding contamination of the colloid when a force is exerted on the colloid.
  • applying force at intervals on the colloid containing particles to cause the particles in the colloid to aggregate in zones includes: applying force at intervals on one side of the colloid containing particles. , so that the particles in the colloid are aggregated in zones; or, forces are applied at intervals on both sides of the colloid containing particles, so that the particles in the colloid are aggregated in zones.
  • forces can be applied at intervals on the side of the colloid away from the matrix to cause the particles in the colloid to aggregate in zones; forces can also be applied at intervals on the side of the matrix away from the colloid, so that the particles in the colloid can aggregate in zones.
  • the method for making gratings can apply force on one side of the colloid or on both sides of the colloid; when a force is applied on one side of the colloid, the particles in the colloid can aggregate in zones, and A grating with a gradient structure can be formed; when force is applied on both sides of the colloid at the same time, the particles in the colloid can form a uniform grating structure, so that gratings can be produced in different ways according to actual needs.
  • the particle aggregation area corresponds to the area where the force is applied.
  • colloids have certain fluidity.
  • the particles in the colloid can move toward the area where the force is applied, that is, the particle aggregation area corresponds to the area where the force is applied.
  • the acting force is a non-contact induction force.
  • the non-contact induction force is magnetic force and the particles are magnetic particles; or the non-contact induction force is electrostatic force and the particles are charged particles.
  • the colloid is solidified to form a preset period
  • the grating includes: when the force application time exceeds the preset time, the colloid is thermally cured or light cured to form a grating with a preset period, in which the particles in the colloid are fully gathered within the force application time.
  • the application time of the force can be judged based on the aggregation of particles in the colloid.
  • the application time of this force is 1s to 10s.
  • a grating with a preset period can be formed.
  • the method of making a grating is relatively simple and easy to operate. Furthermore, by selecting particles with different refractive indexes, gratings with different refractive index contrasts can be produced.
  • the magnitude of the magnetic force is 0.001T to 10T, and T is the magnetic force unit Tesla.
  • the magnitude of the magnetic force can be determined based on actual conditions.
  • the magnitude of the magnetic force can be determined based on factors such as the composition of the colloid and the composition of the particles.
  • the greater the viscosity of the colloid the greater the magnetic force that needs to be applied; when the viscosity of the colloid is smaller, the smaller the magnetic force that needs to be applied.
  • the smaller the particle's induction of the magnetic field the greater the magnetic force that needs to be applied; when the particle's induction of the magnetic field is greater, the smaller the magnetic force that needs to be applied.
  • the colloid may be a material with thermal curing or light curing, for example, polymethylmethacrylate PMMA, polydimethylsiloxane PDMS.
  • the above-mentioned particles may be any of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4. Nickel.
  • the particle-containing colloid can be made by mixing the colloid and particles of the above-mentioned materials. Since the particles (such as Fe 3 O 4 ) can be affected by magnetic force or electrostatic force, when When a magnetic force or electrostatic force is applied to a colloid containing particles, the particles (such as Fe 3 O 4 ) in the colloid can move in the direction of the applied magnetic force or electrostatic force, thereby forming a grating with a certain period.
  • a grating including a cured colloid.
  • the cured colloid includes a particle aggregation area and a non-particle aggregation area.
  • the particle aggregation area and the non-particle aggregation area are formed by applying forces at intervals on the colloid.
  • the particle aggregation areas Zone corresponds to the area where the force is applied.
  • the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
  • the refractive index of the particle aggregation region is greater than the refractive index of the non-particle aggregation region.
  • the grating provided by this application includes a solidified colloid.
  • the number of particles in the non-particle aggregation area in the solidified colloid is less than the number of particles in the particle aggregation area, so that the refractive index of the particle aggregation area is greater than the refractive index of the non-particle aggregation area, thereby forming A grating with a certain refractive index contrast.
  • the difference between the refractive index of the particle gathering area and the refractive index of the non-particle gathering area is greater, that is, the formed grating refraction
  • the rate contrast is greater.
  • the resulting grating has better optical properties.
  • the difference between the refractive index of the particle aggregation region and the refractive index of the non-particle aggregation region is greater than or equal to 0.2.
  • the refractive index contrast of the grating is the difference between the refractive index of the particle-concentrated region and the refractive index of the non-particle-concentrated region.
  • the refractive index contrast of the grating provided by this application can reach 0.2 and above. Compared with the grating produced by the existing technology, it has better grating refractive index contrast and optical performance.
  • the acting force is a non-contact induction force.
  • the non-contact induction force is magnetic force and the particles are magnetic particles; or the non-contact induction force is electrostatic force and the particles are charged particles.
  • the acting force is magnetic force
  • the magnitude of the magnetic force is 0.001T to 10T
  • T is the magnetic force unit Tesla.
  • the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS.
  • the particles are any one of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , Nickel.
  • gratings produced in the embodiments of the present application can be used in augmented reality AR optical waveguides, in lasers, and in automotive head-up displays (HUDs).
  • a third aspect provides a device, which includes the grating of the second aspect and any implementation thereof.
  • a device for making gratings including: a force application module and a curing module.
  • the force application module is used to apply force at intervals on a colloid containing particles so as to aggregate the particles in the colloid in zones;
  • the curing module is used to solidify the colloid to form a grating with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
  • the grating includes a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
  • the refractive index of the particle aggregation region is greater than the refractive index of the non-particle aggregation region.
  • the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area is greater than or equal to 0.2.
  • the particle-containing colloid is laid on the first surface of the substrate.
  • a cover plate is provided on the first surface, and the cover plate is in contact with the colloid and completely covers the colloid.
  • the force application module is also used to: apply force at intervals on one side of the colloid containing particles to cause the particles in the colloid to aggregate in zones; or, on the colloid containing particles, Force is exerted on both sides of the colloid to cause the particles in the colloid to aggregate in zones.
  • the particle aggregation area corresponds to the area where the force is applied.
  • the acting force is a non-contact induction force.
  • the non-contact induction force is magnetic force and the particles are magnetic particles; or the non-contact induction force is electrostatic force and the particles are charged particles.
  • the curing module is also used to: when the force application time exceeds a preset time, thermally solidify or light-cure the colloid to form a grating with a preset period, where , the particles in the colloid are fully aggregated within the time when the force is applied.
  • the force is magnetic force
  • the magnitude of the magnetic force is 0.001T to 10T
  • T is the magnetic force unit Tesla.
  • the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS.
  • the particles are any one of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , Nickel.
  • FIG. 1 is a schematic flow chart of a method for making a grating provided by an embodiment of the present application.
  • FIG. 2 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • FIG. 3 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • FIG. 4 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • FIG. 5 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • FIG. 6 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • Figure 7 is a schematic diagram of a grating provided by an embodiment of the present application.
  • Figure 8 is a schematic diagram of an equipment for making gratings provided by an embodiment of the present application.
  • grating is a very widely used and important high-resolution dispersive optical element. It occupies a very important position in modern advanced learning instruments.
  • Gratings can include surface relief gratings and volume phase holographic gratings (volume phase holographic grating, VPHG). Surface relief gratings have regular engraved lines and seventeen surfaces; volume phase holographic gratings are also called volume holographic gratings. This grating has very good Optical properties and design flexibility, superior stability and consistency. Volume holographic gratings are therefore ideally suited for laser pulse compression, spectrometry, optical coherence tomography, and astronomy.
  • volume holographic gratings Compared with surface relief gratings, volume holographic gratings have the characteristics of high diffraction efficiency, easy manufacturing, and easy elimination of ghosts. They are an important development direction of gratings.
  • Volume holographic grating is an optical element with a periodic structure. It usually interferes directly inside the micron-thick photosensitive polymer film through double-beam holographic exposure to form light and dark interference fringes, thereby causing the refractive index period inside the material. sexual changes. This period is generally a nanoscale grating structure, which is of the same order as the wavelength of visible light, so the light can be effectively modulated and the direction of light transmission is changed by diffracting the incident light.
  • Volume holographic gratings are commonly used in augmented reality (AR) optical waveguides.
  • AR augmented reality
  • light modulation is achieved through volume holographic grating diffraction, allowing the displayed content to be directly projected into the human eye.
  • holographic gratings are generally manufactured using holographic lithography technology.
  • laser light is emitted and transmitted through different optical paths to form interference on the substrate and generate interference fringes, thereby exposing the holographic photosensitive material.
  • the exposed holographic photosensitive material absorbs photons and produces a cross-linking reaction, thereby changing the refractive index and obtaining a grating with periodic changes in refractive index.
  • the gratings made by holographic lithography technology have a low grating refractive index contrast, that is, the refractive index differences in different areas within the grating period are low, which constrains the grating to obtain better results.
  • Optical properties are generally manufactured using holographic lithography technology.
  • the embodiments of the present application provide a grating, a method and equipment for making a grating, which can improve the grating refractive index contrast and provide a grating with better optical performance.
  • FIG. 1 is a schematic flow chart of a method for making a grating provided by an embodiment of the present application.
  • Figure 1 shows a side view of a grating.
  • the method may include steps 101 to 104. The specific steps are as follows:
  • the particle-containing colloid 110 can be obtained by adding particles to the colloid and mixing and stirring. Therefore, it can be understood that the particle-containing colloid 110 has a certain fluidity, and the colloid can be liquid or semi-liquid. .
  • the material of the colloid is a curable material (a material that can be thermally cured or light-cured), that is, the colloid can form a solid colloid (ie, a grating) through thermal curing or light-curing.
  • the colloid may be made of materials such as polyethylene (PE), polypropylene (PP), polystyrene (PS), etc.
  • the colloid may be polymethyl methacrylate (PMMA) and/or polydimethylsiloxane (PDMS).
  • PMMA polymethyl methacrylate
  • PDMS polydimethylsiloxane
  • the particles contained in the colloid may be magnetic particles or other charged particles.
  • the magnetic particles or charged particles in the colloid can move with a certain displacement in the colloid.
  • the particles may be any of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , and nickel Ni, which is not limited in this application.
  • the particle-containing colloid 110 can be a mixture of colloid and particles. Since the particles (such as Fe 3 O 4 ) can be affected by magnetic force or electrostatic force, when magnetic force or electrostatic force is exerted on the particle-containing colloid, When electrostatic force is applied, the particles in the colloid (such as Fe 3 O 4 ) can move in the direction of the magnetic force or electrostatic force, thus forming a certain circumference. period raster.
  • the particle-containing colloid 110 has a certain thickness, and the thickness can be set according to actual needs.
  • the thickness of the particle-containing colloid 110 can be set to 5 ⁇ m to 15 ⁇ m, which is not limited in this application.
  • the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown at 130 in Figure 1.
  • the particles on the side closer to the force 120 will move toward the position where the force is applied under the action of the force; Particles on the side farther away from the force 120 may remain motionless.
  • the particles in the colloid form a gradient structure along the thickness direction, thereby forming a gradient grating.
  • the force 120 can be a non-contact induction force, which can be understood as having an influence on the object without direct contact with the object.
  • the force 120 can include magnetic force or electrostatic force.
  • the force 120 can be a magnetic force
  • the particles in the colloid can be magnetic particles, that is, the magnetic particles in the colloid can move toward the position where the magnetic force is exerted under the influence of the magnetic force.
  • the force 120 may be an electrostatic force
  • the particles in the colloid may be charged particles. That is, the charged particles in the colloid may move toward the position where the electrostatic force is applied under the action of the electrostatic force.
  • the magnitude of the magnetic force may be 0.001T to 10T, and T is the magnetic force unit Tesla.
  • the magnitude of the magnetic force can be determined based on actual conditions.
  • the magnitude of the magnetic force can be determined based on factors such as the composition of the colloid and the composition of the particles.
  • the greater the viscosity of the colloid the greater the magnetic force that needs to be applied; when the viscosity of the colloid is smaller, the smaller the magnetic force that needs to be applied.
  • the smaller the particle's induction of the magnetic field the greater the magnetic force that needs to be applied; when the particle's induction of the magnetic field is greater, the smaller the magnetic force that needs to be applied.
  • the force 120 exerted at this interval may be a uniform force.
  • the particles in the colloid can form a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
  • the refractive index of the particle gathering area of the thus formed grating should be greater than the refractive index of the non-particle gathering area.
  • this region of particle accumulation corresponds to the region where force 120 is exerted. That is, when the force 120 is applied to the colloid 110 containing particles, the particles in the colloid can move toward the area where the force is applied, so that the particle aggregation area corresponds to the area where the force 120 is applied.
  • the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area can be as high as 0.2 and above.
  • the contrast ratio is about 0.05 to 0.1 higher, which can break through the refractive index bottleneck of the holographic grating and achieve a breakthrough in the refractive index modulation coefficient.
  • the particle-containing colloid 110 is solidified to form a grating 130 with a preset period, and there is a corresponding relationship between the period of the grating 130 and the separation distance of the force 120.
  • the particles in the colloid achieve partition aggregation and can form a gradient structure.
  • the particles that have been processed in steps 102 and 103 The final colloid is cured to form a grating 130 with a preset period.
  • the colloid when the force application time exceeds the preset time, the colloid is thermally cured or light cured to form a grating with a preset period, in which the particles in the colloid are fully aggregated within the application time of the force 120 .
  • the application time of the force can be judged based on the aggregation of particles in the colloid. Generally, the application time of the force is 1s to 10s.
  • the interval at which the force is applied can be set according to the period of the grating that needs to be made.
  • the interval at which the applied force is applied can be understood as the interval distance at which the applied force is applied, and the interval at which the applied force is applied is 1 nm to 10 ⁇ m.
  • the grating structure produced through steps 101 to 104 can form a gradient grating structure because the force is only applied to one side of the colloid, and the number of particles in the particle aggregation area of the formed grating structure is greater than that in the non-particle aggregation area.
  • the number of particles in the area that is, the refractive index of the particle aggregation area is greater than the refractive index of the non-particle aggregation area (or an area with fewer particles), so that a grating with a certain refractive index contrast can be formed.
  • the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area will also be greater, resulting in a grating Features higher grating refractive index contrast and better optical performance.
  • FIG. 2 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • Figure 2 shows a side view of the grating.
  • the method may include steps 201 to 204.
  • the specific steps are as follows:
  • the matrix 111 can provide mechanical support for the particle-containing colloid 110.
  • the material of the matrix 111 can be, for example, metal materials (such as copper, steel, iron, aluminum), glass, organic materials (such as resin), etc. This application is This is not a limitation.
  • step 101 For other contents of this step, please refer to step 101 and will not be described again here.
  • the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 130.
  • the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 130.
  • step 104 For the specific content of this step, please refer to step 104, which will not be described again here.
  • the method for making a grating lays the colloid containing particles on the first surface of the substrate, so that the surface of the colloid can be made smoother, so that the surface of the grating produced is smoother. Furthermore, by applying force on one side of the colloid, a gradient grating structure can be obtained. Furthermore, by selecting particles with a higher refractive index to make gratings, the resulting gratings have higher refractive index contrast and better optical properties.
  • FIG. 3 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • Figure 3 shows a side view of the grating.
  • the method may include steps 301 to 304.
  • the specific steps are as follows:
  • a cover plate 112 is provided on the side of the particle-containing colloid 110 away from the first surface.
  • the matrix 111 can provide mechanical support for the particle-containing colloid 110 .
  • the materials of the base 111 and the cover 112 may be, for example, metal materials (such as copper, steel, iron, aluminum), glass, organic materials (such as resin), etc., which are not limited in this application.
  • the base 111 and the cover 112 are used together to form a sandwich structure with the particle-containing colloid 110, that is, the base 111, the particle-containing colloid 110 and the cover 112 form a sandwich structure, thereby preventing the particle-containing colloid from being When force is applied on 110, the colloid is contaminated and a purer grating is obtained.
  • step 101 For other contents of this step, please refer to step 101 and will not be described again here.
  • the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 130.
  • the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 130.
  • the particle-containing colloid 110 is solidified to form a grating 130 with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
  • step 104 For the specific content of this step, please refer to step 104, which will not be described again here.
  • the method of making a grating provided in the embodiment of the present application forms a sandwich structure by arranging a base body or a cover plate on both sides of the colloid, thereby avoiding contamination of the colloid when a force is exerted on the colloid. Furthermore, by applying force on one side of the colloid, a gradient grating structure can be obtained. Furthermore, by selecting particles with a higher refractive index to make gratings, the resulting gratings have higher refractive index contrast and better optical properties.
  • FIG. 4 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • Figure 4 shows a side view of the grating.
  • the method may include steps 401 to 404.
  • the specific steps are as follows:
  • step 101 For details of this step, please refer to step 101, which will not be described again here.
  • the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown at 140 in Figure 4.
  • the particle-containing colloid 110 is solidified to form a grating 140 with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
  • step 104 For other contents of this step, please refer to step 104 and will not be described again here.
  • the grating structure obtained through steps 401 to 404 can form a uniform grating structure due to the uniform force exerted on both sides of the colloid at intervals, and the number of particles in the particle aggregation area in the formed grating structure is greater than that in the non-particle aggregation area.
  • the number of particles that is, the refractive index of the particle aggregation area is greater than the refractive index of the non-particle aggregation area (or an area with fewer particles), so that a grating with a certain refractive index contrast can be formed.
  • the large selection range of particles when selecting fold When gratings are made from particles with higher refractive index, the resulting gratings have higher refractive index contrast and better optical properties.
  • FIG. 5 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • Figure 5 shows a side view of the grating.
  • the method may include steps 501 to 504. The specific steps are as follows:
  • the matrix 111 can provide mechanical support for the particle-containing colloid 110.
  • the material of the matrix 111 can be, for example, metal materials (such as copper, steel, iron, aluminum), glass, organic materials (such as resin), etc. This application is This is not a limitation.
  • step 101 For other contents of this step, please refer to step 101 and will not be described again here.
  • the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 140.
  • the particle-containing colloid 110 is solidified to form a grating 140 with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
  • step 104 For the specific content of this step, please refer to step 104, which will not be described again here.
  • the method for making a grating lays the colloid containing particles on the first surface of the substrate, so that the surface of the colloid can be made smoother, so that the surface of the grating produced is smoother.
  • a uniform grating structure can be obtained.
  • the grating made by selecting particles with higher refractive index has higher grating refractive index contrast and better optical performance.
  • FIG. 6 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
  • Figure 6 shows a side view of the grating.
  • the method may include steps 601 to 604. The specific steps are as follows:
  • the matrix 111 can provide mechanical support for the particle-containing colloid 110 .
  • the materials of the base 111 and the cover 112 may be, for example, metal materials (such as copper, steel, iron, aluminum), glass, organic materials (such as resin), etc., which are not limited in this application.
  • the base 111 and the cover 112 are used together to form a sandwich structure with the particle-containing colloid 110, that is, the base 111, the particle-containing colloid 110 and the cover 112 form a sandwich structure, thereby preventing the particle-containing colloid from being When force is applied on 110, the colloid is contaminated and a purer grating is obtained.
  • step 101 For other contents of this step, please refer to step 101 and will not be described again here.
  • 602-603 Apply forces 120 at intervals on both sides of the particle-containing colloid 110 to cause the particles in the colloid to aggregate in zones.
  • the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 140.
  • the particle-containing colloid 110 is solidified to form a grating 140 with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
  • step 104 For the specific content of this step, please refer to step 104, which will not be described again here.
  • the method of making a grating provided in the embodiment of the present application forms a sandwich structure by arranging a base body or a cover plate on both sides of the colloid, thereby avoiding contamination of the colloid when a force is exerted on the colloid.
  • a uniform grating structure can be obtained.
  • the grating made by selecting particles with higher refractive index has higher grating refractive index contrast and better optical performance.
  • Figure 7 is a schematic diagram of a grating provided by an embodiment of the present application.
  • Figure 7 shows a top view of the grating.
  • FIGS. 1 to 6 Through any method of making a grating shown in FIGS. 1 to 6 , a top view of the grating structure as shown in FIG. 7 can be obtained.
  • the grating produced by any of the grating producing methods shown in Figures 1 to 3 has a gradient structure.
  • a more uniform grating structure can be obtained by using any of the methods of making gratings shown in FIGS. 4 to 6 .
  • the grating shown in Figure 7 may include a cured colloid (ie, a colloid obtained by a curing process).
  • the colloid includes a particle aggregation area and a non-particle aggregation area.
  • the particle aggregation area and the non-particle aggregation area are formed by applying effects on the colloid at intervals. Formed by a force, the particle accumulation area corresponds to the area where the force is applied.
  • the number of particles in the non-particle aggregation region is less than the number of particles in the particle aggregation region, and the refractive index of the particle aggregation region is greater than the refractive index of the non-particle aggregation region.
  • the difference between the refractive index of the particle-aggregated region and the refractive index of the non-particle-aggregated region can be as high as 0.2 or more.
  • the contrast ratio is about 0.05 to 0.1 higher, which can break through the refractive index bottleneck of the holographic grating and achieve a breakthrough in the refractive index modulation coefficient.
  • the force is a non-contact induction force.
  • the particles are magnetic particles; when the non-contact induction force is electrostatic force, the particles are charged particles.
  • the acting force is magnetic force
  • the magnitude of the magnetic force is 0.001T to 10T
  • T is the magnetic force unit Tesla.
  • the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS.
  • the particles are any one of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , and nickel Ni.
  • the grating made by the embodiment of the present application can be used in an augmented reality AR optical waveguide, in a laser, and in a car's head-up display (HUD).
  • HUD head-up display
  • the grating obtained by the method provided in the embodiments of the present application can break through the limitation of the refractive index of the holographic grating and obtain higher grating refractive index contrast and better optical performance.
  • Figure 8 is a schematic diagram of an equipment for making gratings provided by an embodiment of the present application.
  • the device 800 for making gratings includes a force application module 810 and a curing module 820.
  • the force application module 810 is used to apply force at intervals on the colloid containing particles to aggregate the particles in the colloid in zones;
  • the curing module 820 is used to For solidifying the colloid to form a grating with a preset period, there is a corresponding relationship between the period of the grating and the separation distance of the applied force.
  • the grating includes a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
  • the refractive index of the particle-aggregated region is greater than the refractive index of the non-particle-aggregated region.
  • the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area is greater than or equal to 0.2.
  • the particle-containing colloid is laid on the first surface of the substrate.
  • a cover plate is provided on a side of the particle-containing colloid away from the first surface.
  • the particle accumulation area corresponds to the area where the force is applied.
  • the force application module 810 is also used to: apply force at intervals on one side of the colloid containing particles to aggregate the particles in the colloid in zones; or, apply forces at intervals on both sides of the colloid containing particles, In order to make the particles in the colloid aggregate in zones. That is to say, a force is applied at intervals on the side of the colloid away from the matrix to cause the particles in the colloid to aggregate in zones; or, a force is applied at intervals on the side of the matrix away from the colloid to cause the particles in the colloid to aggregate in zones; or, Apply forces at intervals on the side of the colloid away from the matrix and on the side of the matrix away from the colloid at intervals to cause the particles in the colloid to aggregate in zones.
  • the force is a non-contact induction force.
  • the non-contact induction force is magnetic force, and the particles are magnetic particles; or, the non-contact induction force is electrostatic force, and the particles are charged particles.
  • the curing module 820 is also used to: when the force application time exceeds the preset time, the colloid is thermally cured or light cured to form a grating with a preset period, wherein the particles in the colloid are Fully gathered inside.
  • the acting force is magnetic force
  • the magnitude of the magnetic force is 0.001T to 10T
  • T is the magnetic force unit Tesla.
  • the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS.
  • the particles are any one of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , and nickel Ni.
  • this application also provides a device, which device includes a grating made by any of the above methods, or includes any of the above grating structures.

Abstract

A grating (130), and a method and device (800) for fabricating a grating (130). The grating (130) comprises a cured colloid (110), wherein the cured colloid (110) comprises a particle aggregation area and a non-particle aggregation area, the particle aggregation area and the non-particle aggregation area are formed by applying an acting force (120) to the colloid (110) at intervals, that is, under the effect of the acting force (120), particles in the colloid (110) move to the areas where the acting force (120) is applied, so as to form the particle aggregation area, such that the refractive index of the particle aggregation area is greater than the refractive index of the non-particle aggregation area. In addition, since the selection range of the particles is relatively large, particles with a higher refractive index can be selected to participate in the fabrication of the grating (130), such that the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area is greater, that is, the refractive index contrast of the formed grating (130) is greater. Therefore, the grating (130), which is fabricated by means of the method and device for fabricating a grating (130), has a higher grating (130) refractive index contrast and a better optical performance.

Description

一种光栅、制作光栅的方法及设备Grating, method and equipment for making grating
本申请要求于2022年06月01日提交中国专利局、申请号为202210620416.8、申请名称为“一种光栅、制作光栅的方法及设备”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims priority to the Chinese patent application submitted to the China Patent Office on June 1, 2022, with application number 202210620416.8 and the application title "A grating, a method and equipment for making a grating", the entire content of which is incorporated by reference in in this application.
技术领域Technical field
本申请涉及光学技术领域,更具体地,涉及一种光栅、制作光栅的方法及设备。The present application relates to the field of optical technology, and more specifically, to a grating, a method and equipment for making a grating.
背景技术Background technique
光栅是一种应用非常广泛而重要的高分辨率的色散光学元件,在现代先学仪器中占有相当重要的地位。其中,体全息光栅具有衍射效率高、易于制造,易于消除鬼影等特点,是光栅的重要发展方向。Grating is a very widely used and important high-resolution dispersive optical element, which occupies a very important position in modern academic instruments. Among them, volume holographic gratings have the characteristics of high diffraction efficiency, easy manufacturing, and easy elimination of ghosts, and are an important development direction of gratings.
现有的体全息光栅一般使用全息光刻技术进行制造,但由于全息光刻材料的限制,通过全息光刻技术制作而成的光栅,光栅折射率对比度偏低,即光栅周期内不同区域的折射率差值偏低,从而约束了光栅获得更好的光学性能。Existing volume holographic gratings are generally manufactured using holographic lithography technology. However, due to the limitations of holographic lithography materials, gratings made by holographic lithography technology have low grating refractive index contrast, that is, the refraction of different areas within the grating period. The rate difference is relatively low, which constrains the grating to obtain better optical performance.
因此,如何提高光栅折射率对比度,提供具有更好的光学性能的光栅成为亟待解决的问题。Therefore, how to improve the grating refractive index contrast and provide gratings with better optical performance has become an urgent problem to be solved.
发明内容Contents of the invention
本申请提供一种光栅、制作光栅的方法及设备,可以提高光栅折射率对比度,获得具有更好的光学性能的光栅。This application provides a grating, a grating manufacturing method and equipment, which can improve the grating refractive index contrast and obtain a grating with better optical performance.
第一方面,提供了一种制作光栅的方法,包括:在含粒子的胶体上间隔施加作用力,以使胶体内的粒子分区聚集;对胶体进行固化,形成预设周期的光栅,光栅的周期与作用力的间隔距离之间存在对应关系。The first aspect provides a method for making a grating, which includes: applying force at intervals on a colloid containing particles to aggregate the particles in the colloid in zones; solidifying the colloid to form a grating with a preset period, and the period of the grating is There is a corresponding relationship with the separation distance of the applied force.
其中,作用力的间隔距离可以理解为施加作用力的间隔。通过在含粒子的胶体的不同位置施加作用力,可以形成不同周期的光栅。Among them, the separation distance of the applied force can be understood as the interval at which the applied force is applied. By applying forces at different locations in the particle-containing colloid, gratings of different periods can be formed.
可选地,施加作用力的间隔可以为1nm至10μm。Alternatively, the interval at which the force is applied may be 1 nm to 10 μm.
本申请提供的制作光栅的方法,通过在胶体上间隔施加作用力后对胶体进行固化即可完成光栅制作,制作方法简单,同时可以根据光栅的周期与作用力的间隔距离之间存在对应关系,通过设置作用力的间隔可以制作不同周期的光栅。此外,粒子的选择范围较大,可以选择折射率更高的粒子制作光栅,从而可以提高光栅折射率对比度,获得具有更好的光学性能的光栅。The method of making gratings provided by this application can complete the production of gratings by applying force on the colloid at intervals and then solidifying the colloid. The production method is simple, and at the same time, there is a corresponding relationship between the period of the grating and the separation distance of the force. Gratings with different periods can be made by setting the intervals of the applied forces. In addition, the particle selection range is large, and particles with a higher refractive index can be selected to make gratings, thereby improving the grating refractive index contrast and obtaining gratings with better optical properties.
结合第一方面,在第一方面的某些实现方式中,光栅包括粒子聚集区和非粒子聚集区,非粒子聚集区的粒子数少于粒子聚集区的粒子数。In connection with the first aspect, in some implementations of the first aspect, the grating includes a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
应理解,光栅中的非粒子聚集区的粒子数少于粒子聚集区的粒子数,从而使得粒子聚集区的折射率大于非粒子聚集区的折射率,进而可以形成具有一定折射率对比度的光栅。 It should be understood that the number of particles in the non-particle aggregation area in the grating is less than the number of particles in the particle aggregation area, so that the refractive index of the particle aggregation area is greater than the refractive index of the non-particle aggregation area, thereby forming a grating with a certain refractive index contrast.
结合第一方面,在第一方面的某些实现方式中,粒子聚集区的折射率大于非粒子聚集区的折射率。In conjunction with the first aspect, in some implementations of the first aspect, the refractive index of the particle aggregation region is greater than the refractive index of the non-particle aggregation region.
可以理解的是,光栅的折射率对比度为该粒子聚集区的折射率与该非粒子聚集区的折射率之间的差值。It can be understood that the refractive index contrast of the grating is the difference between the refractive index of the particle gathering area and the refractive index of the non-particle gathering area.
通过本申请提供的制作光栅的方法制作而成的光栅,其包括粒子聚集区和非粒子聚集区,且粒子聚集区的折射率大于非粒子聚集区的折射率,可以通过选择折射率更高的粒子制作光栅,从而可以提高光栅折射率对比度,获得具有更好的光学性能的光栅。The grating made by the method of making gratings provided in this application includes a particle gathering area and a non-particle gathering area, and the refractive index of the particle gathering area is greater than the refractive index of the non-particle gathering area. It can be selected by selecting a higher refractive index. The particles make gratings, which can improve the grating refractive index contrast and obtain gratings with better optical properties.
结合第一方面,在第一方面的某些实现方式中,粒子聚集区的折射率与非粒子聚集区的折射率的差值大于或等于0.2。In conjunction with the first aspect, in some implementations of the first aspect, the difference between the refractive index of the particle aggregation region and the refractive index of the non-particle aggregation region is greater than or equal to 0.2.
通过本申请提供的制作光栅的方法制作而成的光栅相对于现有技术制作而成的光栅,粒子聚集区的折射率与非粒子聚集区的折射率的差值大于或等于0.2,即光栅折射率对比度大于或等于0.2,相对于现有技术可以进一步提高光栅折射率对比度。Compared with gratings made by the prior art, the difference between the refractive index of the particle gathering area and the refractive index of the non-particle gathering area is greater than or equal to 0.2, that is, the grating refraction. The rate contrast is greater than or equal to 0.2, and the grating refractive index contrast can be further improved compared to the existing technology.
结合第一方面,在第一方面的某些实现方式中,在在含粒子的胶体上间隔施加作用力之前,该方法还包括:将含粒子的胶体铺设于基体的第一表面。In conjunction with the first aspect, in some implementations of the first aspect, before applying force at intervals on the particle-containing colloid, the method further includes: laying the particle-containing colloid on the first surface of the substrate.
本申请提供的制作光栅的方法,通过将含粒子的胶体铺设于基体的第一表面,可以使胶体表面更加平整,从而制作的光栅表面更加平滑。The method of making a grating provided by this application can make the surface of the colloid smoother by laying the colloid containing particles on the first surface of the substrate, so that the surface of the grating produced is smoother.
结合第一方面,在第一方面的某些实现方式中,该方法还包括:在所述含粒子的胶体远离所述第一表面的一侧设置盖板。In conjunction with the first aspect, in some implementations of the first aspect, the method further includes: arranging a cover plate on a side of the particle-containing colloid away from the first surface.
本申请提供的制作光栅的方法,通过在胶体的两侧设置基体或盖板,形成一种夹心的结构,从而使得在胶体上施加作用力时,可以避免对胶体产生污染。The method of making a grating provided by this application forms a sandwich structure by arranging a base body or cover plates on both sides of the colloid, thereby avoiding contamination of the colloid when a force is exerted on the colloid.
结合第一方面,在第一方面的某些实现方式中,在含粒子的胶体上间隔施加作用力,以使胶体内的粒子分区聚集,包括:在含粒子的胶体的一侧间隔施加作用力,以使胶体内的粒子分区聚集;或者,在含粒子的胶体的两侧间隔施加作用力,以使胶体内的粒子分区聚集。Combined with the first aspect, in some implementations of the first aspect, applying force at intervals on the colloid containing particles to cause the particles in the colloid to aggregate in zones includes: applying force at intervals on one side of the colloid containing particles. , so that the particles in the colloid are aggregated in zones; or, forces are applied at intervals on both sides of the colloid containing particles, so that the particles in the colloid are aggregated in zones.
更为具体地,在本申请实施例中,可以在胶体远离基体的一侧间隔施加作用力,以使胶体内的粒子分区聚集;也可以在基体远离胶体的一侧间隔施加作用力,以使胶体内的粒子分区聚集;还可以在胶体远离基体的一侧和在基体远离胶体的一侧均间隔施加作用力,以使胶体内的粒子分区聚集。More specifically, in the embodiments of the present application, forces can be applied at intervals on the side of the colloid away from the matrix to cause the particles in the colloid to aggregate in zones; forces can also be applied at intervals on the side of the matrix away from the colloid, so that the particles in the colloid can aggregate in zones. The particles in the colloid aggregate in zones; forces can also be applied at intervals on the side of the colloid away from the matrix and on the side of the matrix away from the colloid, so that the particles in the colloid aggregate in zones.
本申请提供的制作光栅的方法,可以在胶体的一侧施加作用力,也可以在胶体的两侧施加作用力;当在胶体的一侧施加作用力时,胶体内的粒子可以分区聚集,并且可以形成一种渐变结构的光栅;当在胶体的两侧同时施加作用力时,胶体内的粒子可以形成均匀的光栅结构,从而可以根据实际需求使用不同的方式进行光栅的制作。The method for making gratings provided by this application can apply force on one side of the colloid or on both sides of the colloid; when a force is applied on one side of the colloid, the particles in the colloid can aggregate in zones, and A grating with a gradient structure can be formed; when force is applied on both sides of the colloid at the same time, the particles in the colloid can form a uniform grating structure, so that gratings can be produced in different ways according to actual needs.
结合第一方面,在第一方面的某些实现方式中,粒子聚集区与作用力施加的区域相对应。In connection with the first aspect, in some implementations of the first aspect, the particle aggregation area corresponds to the area where the force is applied.
应理解,胶体具有一定的流动性,当在胶体上施加作用力时,胶体内的粒子可以向施加作用力的区域进行移动,即粒子聚集区与作用力施加的区域相对应。It should be understood that colloids have certain fluidity. When a force is exerted on the colloid, the particles in the colloid can move toward the area where the force is applied, that is, the particle aggregation area corresponds to the area where the force is applied.
结合第一方面,在第一方面的某些实现方式中,作用力为非接触感应力。Combined with the first aspect, in some implementations of the first aspect, the acting force is a non-contact induction force.
结合第一方面,在第一方面的某些实现方式中,非接触感应力为磁力,粒子为磁性粒子;或者,非接触感应力为静电力,粒子为带电粒子。Combined with the first aspect, in some implementations of the first aspect, the non-contact induction force is magnetic force and the particles are magnetic particles; or the non-contact induction force is electrostatic force and the particles are charged particles.
结合第一方面,在第一方面的某些实现方式中,对所述胶体进行固化,形成预设周期 的光栅,包括:当作用力施加时间超过预设时间时,对胶体进行热固化或者光固化,形成预设周期的光栅,其中,胶体内的粒子在作用力施加时间内充分聚集。Combined with the first aspect, in some implementations of the first aspect, the colloid is solidified to form a preset period The grating includes: when the force application time exceeds the preset time, the colloid is thermally cured or light cured to form a grating with a preset period, in which the particles in the colloid are fully gathered within the force application time.
其中,作用力的施加时间可以根据胶体内粒子聚集情况进行判断。一般情况下,该作用力的施加时间为1s至10s。Among them, the application time of the force can be judged based on the aggregation of particles in the colloid. Generally, the application time of this force is 1s to 10s.
可以理解的是,当施加的作用力较大时,粒子聚集速度较快,作用力施加时间也就较短;当施加的作用力较小时,粒子聚集的速度较慢,作用力施加时间也就较长。It can be understood that when the applied force is larger, the particles gather faster and the force application time is shorter; when the applied force is smaller, the particles gather slower and the force application time is shorter. longer.
本申请提供的制作光栅的方法,当在胶体上施加作用力的时间超过一定时间时,可以判断为该胶体内的粒子在作用力施加时间内充分聚集,从而再对胶体进行固化(即热固化或光固化),即可形成预设周期的光栅,该制作光栅的方法相对简单,便于操作。此外,通过选择不同折射率的粒子,可以制作具有不同折射率对比度的光栅。According to the method of making gratings provided by this application, when the time for applying force on the colloid exceeds a certain time, it can be judged that the particles in the colloid have fully gathered within the time when the force is applied, and then the colloid is cured (i.e., thermal curing). or light curing), a grating with a preset period can be formed. The method of making a grating is relatively simple and easy to operate. Furthermore, by selecting particles with different refractive indexes, gratings with different refractive index contrasts can be produced.
结合第一方面,在第一方面的某些实现方式中,该作用力为磁力时,磁力大小为0.001T至10T,T为磁力单位特斯拉。Combined with the first aspect, in some implementations of the first aspect, when the force is magnetic force, the magnitude of the magnetic force is 0.001T to 10T, and T is the magnetic force unit Tesla.
应理解,该磁力大小可以根据实际情况进行确定,例如,该磁力的大小可以根据胶体的成分和粒子的成分等因素确定。It should be understood that the magnitude of the magnetic force can be determined based on actual conditions. For example, the magnitude of the magnetic force can be determined based on factors such as the composition of the colloid and the composition of the particles.
在一些实施例中,若粒子成分等其他因素相同时,当胶体的粘度越大,需要施加的磁力也就越大;当胶体的粘度越小,需要施加的磁力也就越小。In some embodiments, if other factors such as particle composition are the same, the greater the viscosity of the colloid, the greater the magnetic force that needs to be applied; when the viscosity of the colloid is smaller, the smaller the magnetic force that needs to be applied.
在一些实施例中,若胶体成分等其他因素相同时,当粒子对磁场感应越小,需要施加的磁力也就越大;当粒子对磁场感应越大,需要施加的磁力也就越小。In some embodiments, if other factors such as the colloid composition are the same, the smaller the particle's induction of the magnetic field, the greater the magnetic force that needs to be applied; when the particle's induction of the magnetic field is greater, the smaller the magnetic force that needs to be applied.
结合第一方面,在第一方面的某些实现方式中,胶体可以是具有热固化或光固化的材料,例如,聚甲基丙烯酸甲酯PMMA、聚二甲基硅氧烷PDMS。In connection with the first aspect, in some implementations of the first aspect, the colloid may be a material with thermal curing or light curing, for example, polymethylmethacrylate PMMA, polydimethylsiloxane PDMS.
结合第一方面,在第一方面的某些实现方式中,上述粒子可以为以下任意一种:四氧化三铁Fe3O4、铁酸亚钴CoFe2O4,锰酸亚钴MnFe2O4,镍Ni。Combined with the first aspect, in some implementations of the first aspect, the above-mentioned particles may be any of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4. Nickel.
在本申请提供的制作光栅的方法中,含粒子的胶体可以是通过对上述材质的胶体和粒子混合而成的,由于粒子(例如Fe3O4)可以受到磁力或静电力的影响,从而当在含粒子的胶体上施加磁力或静电力时,胶体中的粒子(例如Fe3O4)可以向施加磁力或静电力的方向移动,从而可以形成一定周期的光栅。In the method of making a grating provided in this application, the particle-containing colloid can be made by mixing the colloid and particles of the above-mentioned materials. Since the particles (such as Fe 3 O 4 ) can be affected by magnetic force or electrostatic force, when When a magnetic force or electrostatic force is applied to a colloid containing particles, the particles (such as Fe 3 O 4 ) in the colloid can move in the direction of the applied magnetic force or electrostatic force, thereby forming a grating with a certain period.
第二方面,提供了一种光栅,包括固化胶体,该固化胶体中包括粒子聚集区和非粒子聚集区,粒子聚集区和非粒子聚集区是通过在胶体上间隔施加作用力形成的,粒子聚集区与作用力施加的区域相对应。In a second aspect, a grating is provided, including a cured colloid. The cured colloid includes a particle aggregation area and a non-particle aggregation area. The particle aggregation area and the non-particle aggregation area are formed by applying forces at intervals on the colloid. The particle aggregation areas Zone corresponds to the area where the force is applied.
结合第二方面,在第二方面的某些实现方式中,该非粒子聚集区的粒子数少于该粒子聚集区的粒子数。Combined with the second aspect, in some implementations of the second aspect, the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
结合第二方面,在第二方面的某些实现方式中,粒子聚集区的折射率大于非粒子聚集区的折射率。In conjunction with the second aspect, in some implementations of the second aspect, the refractive index of the particle aggregation region is greater than the refractive index of the non-particle aggregation region.
本申请提供的光栅包括固化胶体,该固化胶体中的非粒子聚集区的粒子数少于粒子聚集区的粒子数,从而使得粒子聚集区的折射率大于非粒子聚集区的折射率,进而可以形成具有一定折射率对比度的光栅。此外,由于粒子的选择范围较大,当选择折射率更高的粒子制作光栅时,粒子聚集区的折射率与该非粒子聚集区的折射率之间的差值更大,即形成的光栅折射率对比度更大。得到的光栅具有更好的光学性能。The grating provided by this application includes a solidified colloid. The number of particles in the non-particle aggregation area in the solidified colloid is less than the number of particles in the particle aggregation area, so that the refractive index of the particle aggregation area is greater than the refractive index of the non-particle aggregation area, thereby forming A grating with a certain refractive index contrast. In addition, due to the large selection range of particles, when particles with a higher refractive index are selected to make a grating, the difference between the refractive index of the particle gathering area and the refractive index of the non-particle gathering area is greater, that is, the formed grating refraction The rate contrast is greater. The resulting grating has better optical properties.
结合第二方面,在第二方面的某些实现方式中,粒子聚集区的折射率与非粒子聚集区的折射率的差值大于或等于0.2。 Combined with the second aspect, in some implementations of the second aspect, the difference between the refractive index of the particle aggregation region and the refractive index of the non-particle aggregation region is greater than or equal to 0.2.
应理解,光栅的折射率对比度为该粒子聚集区的折射率与该非粒子聚集区的折射率之间的差值。It should be understood that the refractive index contrast of the grating is the difference between the refractive index of the particle-concentrated region and the refractive index of the non-particle-concentrated region.
本申请提供的光栅的折射率对比度能够达到0.2及以上,相对于现有技术制作的光栅,具有更好的光栅折射率对比度和光学性能。The refractive index contrast of the grating provided by this application can reach 0.2 and above. Compared with the grating produced by the existing technology, it has better grating refractive index contrast and optical performance.
结合第二方面,在第二方面的某些实现方式中,作用力为非接触感应力。Combined with the second aspect, in some implementations of the second aspect, the acting force is a non-contact induction force.
结合第二方面,在第二方面的某些实现方式中,非接触感应力为磁力,粒子为磁性粒子;或者,非接触感应力为静电力,粒子为带电粒子。Combined with the second aspect, in some implementations of the second aspect, the non-contact induction force is magnetic force and the particles are magnetic particles; or the non-contact induction force is electrostatic force and the particles are charged particles.
结合第二方面,在第二方面的某些实现方式中,该作用力为磁力,该磁力大小为0.001T至10T,T为磁力单位特斯拉。Combined with the second aspect, in some implementations of the second aspect, the acting force is magnetic force, the magnitude of the magnetic force is 0.001T to 10T, and T is the magnetic force unit Tesla.
结合第二方面,在第二方面的某些实现方式中,胶体为聚甲基丙烯酸甲酯PMMA和/或聚二甲基硅氧烷PDMS。Combined with the second aspect, in some implementations of the second aspect, the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS.
结合第二方面,在第二方面的某些实现方式中,粒子为以下任意一种:四氧化三铁Fe3O4、铁酸亚钴CoFe2O4,锰酸亚钴MnFe2O4,镍Ni。Combined with the second aspect, in some implementations of the second aspect, the particles are any one of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , Nickel.
应理解,本申请实施例制作而成的光栅可以应用于增强现实AR光波导中,可以应用于激光器中,还可以应用于汽车的抬头显示器HUD中。It should be understood that the gratings produced in the embodiments of the present application can be used in augmented reality AR optical waveguides, in lasers, and in automotive head-up displays (HUDs).
第三方面,提供一种设备,该设备包括第二方面及其任意一种实现方式的光栅。A third aspect provides a device, which includes the grating of the second aspect and any implementation thereof.
第四方面,提供了一种制作光栅的设备,包括:施力模块和固化模块,该施力模块,用于在含粒子的胶体上间隔施加作用力,以使胶体内的粒子分区聚集;该固化模块,用于对胶体进行固化,形成预设周期的光栅,光栅的周期与作用力的间隔距离之间存在对应关系。In a fourth aspect, a device for making gratings is provided, including: a force application module and a curing module. The force application module is used to apply force at intervals on a colloid containing particles so as to aggregate the particles in the colloid in zones; The curing module is used to solidify the colloid to form a grating with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
结合第四方面,在第四方面的某些实现方式中,光栅包括粒子聚集区和非粒子聚集区,非粒子聚集区的粒子数少于粒子聚集区的粒子数。Combined with the fourth aspect, in some implementations of the fourth aspect, the grating includes a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
结合第四方面,在第四方面的某些实现方式中,粒子聚集区的折射率大于非粒子聚集区的折射率。In connection with the fourth aspect, in some implementations of the fourth aspect, the refractive index of the particle aggregation region is greater than the refractive index of the non-particle aggregation region.
结合第四方面,在第四方面的某些实现方式中,粒子聚集区的折射率与非粒子聚集区的折射率的差值大于或等于0.2。Combined with the fourth aspect, in some implementations of the fourth aspect, the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area is greater than or equal to 0.2.
结合第四方面,在第四方面的某些实现方式中,含粒子的胶体铺设于基体的第一表面。Combined with the fourth aspect, in some implementations of the fourth aspect, the particle-containing colloid is laid on the first surface of the substrate.
结合第四方面,在第四方面的某些实现方式中,第一表面上设置有盖板,盖板与胶体接触并完全覆盖该胶体。In conjunction with the fourth aspect, in some implementations of the fourth aspect, a cover plate is provided on the first surface, and the cover plate is in contact with the colloid and completely covers the colloid.
结合第四方面,在第四方面的某些实现方式中,施力模块还用于:在含粒子的胶体的一侧间隔施加作用力,以使胶体内的粒子分区聚集;或者,在含粒子的胶体的两侧间隔施加作用力,以使胶体内的粒子分区聚集。Combined with the fourth aspect, in some implementations of the fourth aspect, the force application module is also used to: apply force at intervals on one side of the colloid containing particles to cause the particles in the colloid to aggregate in zones; or, on the colloid containing particles, Force is exerted on both sides of the colloid to cause the particles in the colloid to aggregate in zones.
结合第四方面,在第四方面的某些实现方式中,粒子聚集区与作用力施加的区域相对应。In combination with the fourth aspect, in some implementations of the fourth aspect, the particle aggregation area corresponds to the area where the force is applied.
结合第四方面,在第四方面的某些实现方式中,作用力为非接触感应力。Combined with the fourth aspect, in some implementations of the fourth aspect, the acting force is a non-contact induction force.
结合第四方面,在第四方面的某些实现方式中,非接触感应力为磁力,粒子为磁性粒子;或者,非接触感应力为静电力,粒子为带电粒子。Combined with the fourth aspect, in some implementations of the fourth aspect, the non-contact induction force is magnetic force and the particles are magnetic particles; or the non-contact induction force is electrostatic force and the particles are charged particles.
结合第四方面,在第四方面的某些实现方式中,固化模块还用于:当作用力施加时间超过预设时间时,对胶体进行热固化或者光固化,形成预设周期的光栅,其中,胶体内的粒子在作用力施加时间内充分聚集。 Combined with the fourth aspect, in some implementations of the fourth aspect, the curing module is also used to: when the force application time exceeds a preset time, thermally solidify or light-cure the colloid to form a grating with a preset period, where , the particles in the colloid are fully aggregated within the time when the force is applied.
结合第四方面,在第四方面的某些实现方式中,该作用力为磁力,该磁力大小为0.001T至10T,T为磁力单位特斯拉。Combined with the fourth aspect, in some implementations of the fourth aspect, the force is magnetic force, the magnitude of the magnetic force is 0.001T to 10T, and T is the magnetic force unit Tesla.
结合第四方面,在第四方面的某些实现方式中,胶体为聚甲基丙烯酸甲酯PMMA和/或聚二甲基硅氧烷PDMS。Combined with the fourth aspect, in some implementations of the fourth aspect, the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS.
结合第四方面,在第四方面的某些实现方式中,粒子为以下任意一种:四氧化三铁Fe3O4、铁酸亚钴CoFe2O4,锰酸亚钴MnFe2O4,镍Ni。Combined with the fourth aspect, in some implementations of the fourth aspect, the particles are any one of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , Nickel.
附图说明Description of the drawings
图1是本申请实施例提供的一种制作光栅的方法示意性流程图。FIG. 1 is a schematic flow chart of a method for making a grating provided by an embodiment of the present application.
图2是本申请实施例提供的另一种制作光栅的方法示意性流程图。FIG. 2 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
图3是本申请实施例提供的另一种制作光栅的方法示意性流程图。FIG. 3 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
图4是本申请实施例提供的另一种制作光栅的方法示意性流程图。FIG. 4 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
图5是本申请实施例提供的另一种制作光栅的方法示意性流程图。FIG. 5 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
图6是本申请实施例提供的另一种制作光栅的方法示意性流程图。FIG. 6 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application.
图7是本申请实施例提供的一种光栅示意图。Figure 7 is a schematic diagram of a grating provided by an embodiment of the present application.
图8是本申请实施例提供的一种制作光栅的设备示意图。Figure 8 is a schematic diagram of an equipment for making gratings provided by an embodiment of the present application.
具体实施方式Detailed ways
下面将结合附图,对本申请中的技术方案进行描述。The technical solutions in this application will be described below with reference to the accompanying drawings.
以下实施例中所使用的术语只是为了描述特定实施例的目的,而并非旨在作为对本申请的限制。如在本申请的说明书和所附权利要求书中所使用的那样,单数表达形式“一个”、“一种”、“上述”和“该”旨在也包括例如“一个或多个”这种表达形式,除非其上下文中明确地有相反指示。在本说明书中描述的参考“一个实施例”或“一些实施例”等意味着在本申请的一个或多个实施例中包括结合该实施例描述的特定特征、结构或特点。由此,在本说明书中的不同之处出现的语句“在一个实施例中”、“在一些实施例中”、“在其他一些实施例中”、“在另外一些实施例中”等不是必然都参考相同的实施例,而是意味着“一个或多个但不是所有的实施例”,除非是以其他方式另外特别强调。术语“包括”、“包含”、“具有”及它们的变形都意味着“包括但不限于”,除非是以其他方式另外特别强调。The terminology used in the following examples is for the purpose of describing specific embodiments only and is not intended to limit the application. As used in the specification and appended claims of this application, the singular expressions "a," "an," "the" and "the" are intended to also include, for example, "one or more" form of expression unless its context clearly indicates otherwise. Reference in this specification to "one embodiment" or "some embodiments" or the like means that a particular feature, structure or characteristic described in connection with the embodiment is included in one or more embodiments of the application. Therefore, the phrases "in one embodiment", "in some embodiments", "in other embodiments", "in other embodiments", etc. appearing in different places in this specification are not necessarily References are made to the same embodiment, but rather to "one or more but not all embodiments" unless specifically stated otherwise. The terms “including,” “includes,” “having,” and variations thereof all mean “including but not limited to,” unless otherwise specifically emphasized.
在本申请的实施例中,“第一”、“第二”以及各种数字编号只是为了描述方便进行的区分,并不用来限制本申请实施例的范围。下文各过程的序号的大小并不意味着执行顺序的先后,各过程的执行顺序应以其功能和内在逻辑确定,而不应对本申请实施例的实施过程构成任何限定。此外,在本申请实施例中,“110”、“120”、“130”等字样仅为了描述方便作出的标识,并不是对执行步骤的次序进行限定。在本申请实施例中,“当……时”、“若”以及“如果”等描述均指在某种客观情况下设备会做出相应的处理,并非是限定时间,且也不要求设备在实现时一定要有判断的动作,也不意味着存在其它限定。In the embodiments of the present application, “first”, “second” and various numerical numbers are only used for convenience of description and are not used to limit the scope of the embodiments of the present application. The sequence numbers of each process below do not mean the order of execution. The execution order of each process should be determined by its functions and internal logic, and should not constitute any limitation on the implementation process of the embodiment of the present application. In addition, in the embodiments of the present application, words such as “110”, “120”, and “130” are only used for convenience of description and do not limit the order of execution of steps. In the embodiments of this application, descriptions such as "when", "if" and "if" all mean that the device will perform corresponding processing under certain objective circumstances. They do not limit the time, and do not require the device to be in There must be judgment actions during implementation, and it does not mean that there are other restrictions.
需要说明的是,本申请中,“示例性的”或者“例如”等词用于表示作例子、例证或说明。本申请中被描述为“示例性的”或者“例如”的任何实施例或设计方案不应被解释为比其他实施例或设计方案更优选或更具优势。确切而言,使用“示例性的”或者“例如”等词旨在以具体方式呈现相关概念。It should be noted that in this application, words such as “exemplary” or “for example” are used to represent examples, illustrations or explanations. Any embodiment or design described herein as "exemplary" or "such as" is not intended to be construed as preferred or advantageous over other embodiments or designs. Rather, use of the words "exemplary" or "such as" is intended to present the concept in a concrete manner.
如背景技术中所述,光栅是一种应用非常广泛而重要的高分辨率的色散光学元件,在 现代先学仪器中占有相当重要的地位。光栅可以包括表面浮雕光栅和体相位全息光栅(volume phase holographic grating,VPHG),表面浮雕光栅具有规则的刻线和精致的表面;体相位全息光栅又称为体全息光栅,这种光栅拥有非常好的光学特性和设计灵活性、优越的稳定性和一致性。因此,体全息光栅非常适用于激光脉冲压缩、光谱仪、光学相干断层扫描以及天文学。As mentioned in the background art, grating is a very widely used and important high-resolution dispersive optical element. It occupies a very important position in modern advanced learning instruments. Gratings can include surface relief gratings and volume phase holographic gratings (volume phase holographic grating, VPHG). Surface relief gratings have regular engraved lines and exquisite surfaces; volume phase holographic gratings are also called volume holographic gratings. This grating has very good Optical properties and design flexibility, superior stability and consistency. Volume holographic gratings are therefore ideally suited for laser pulse compression, spectrometry, optical coherence tomography, and astronomy.
体全息光栅相对于表面浮雕光栅而言,具有衍射效率高、易于制造,易于消除鬼影等特点,是光栅的重要发展方向。体全息光栅是一种具有周期结构的光学元件,它一般通过双光束全息曝光的方式,直接在微米级厚度感光聚合物薄膜内部干涉形成明暗分布的干涉条纹,从而引起了材料内部的折射率周期性变化。这个周期一般是纳米级的光栅结构,与可见光波长为一个量级,于是便可以对光线进行有效调制,通过对入射光发生衍射作用,从而改变光的传输方向。体全息光栅常用在增强现实(augmented reality,AR)光波导中,在AR光波导的应用中,通过体全息光栅衍射,实现光的调制,可以让显示的内容直接投射到人眼中。Compared with surface relief gratings, volume holographic gratings have the characteristics of high diffraction efficiency, easy manufacturing, and easy elimination of ghosts. They are an important development direction of gratings. Volume holographic grating is an optical element with a periodic structure. It usually interferes directly inside the micron-thick photosensitive polymer film through double-beam holographic exposure to form light and dark interference fringes, thereby causing the refractive index period inside the material. sexual changes. This period is generally a nanoscale grating structure, which is of the same order as the wavelength of visible light, so the light can be effectively modulated and the direction of light transmission is changed by diffracting the incident light. Volume holographic gratings are commonly used in augmented reality (AR) optical waveguides. In the application of AR optical waveguides, light modulation is achieved through volume holographic grating diffraction, allowing the displayed content to be directly projected into the human eye.
现有的体全息光栅一般使用全息光刻技术进行制造,全息光刻技术中通过发射激光,经过不同的光路传输,在基板上形成干涉,产生干涉条纹,从而对全息感光材料进行曝光。被曝光的全息感光材料吸收光子,产生交联反应,从而使折射率发生变化,得到折射率周期变化的光栅。然而由于全息光刻材料的限制,通过全息光刻技术制作而成的光栅,其光栅折射率对比度偏低,即光栅周期内不同区域的折射率差值偏低,从而约束了光栅获得更好的光学性能。Existing volume holographic gratings are generally manufactured using holographic lithography technology. In holographic lithography technology, laser light is emitted and transmitted through different optical paths to form interference on the substrate and generate interference fringes, thereby exposing the holographic photosensitive material. The exposed holographic photosensitive material absorbs photons and produces a cross-linking reaction, thereby changing the refractive index and obtaining a grating with periodic changes in refractive index. However, due to the limitations of holographic lithography materials, the gratings made by holographic lithography technology have a low grating refractive index contrast, that is, the refractive index differences in different areas within the grating period are low, which constrains the grating to obtain better results. Optical properties.
因此,本申请实施例提供了一种光栅、制作光栅的方法和设备,能够提高光栅折射率对比度,提供具有更好的光学性能的光栅。Therefore, the embodiments of the present application provide a grating, a method and equipment for making a grating, which can improve the grating refractive index contrast and provide a grating with better optical performance.
图1是本申请实施例提供的一种制作光栅的方法示意性流程图。图1示出的是光栅的侧视图。该方法可以包括步骤101至步骤104,具体步骤如下:FIG. 1 is a schematic flow chart of a method for making a grating provided by an embodiment of the present application. Figure 1 shows a side view of a grating. The method may include steps 101 to 104. The specific steps are as follows:
101,获取含粒子的胶体110。101. Obtain particle-containing colloid 110.
应理解,该含粒子的胶体110可以是在胶体中添加粒子,进行混合搅拌得到的,因此,可以理解的是,该含粒子的胶体110具有一定的流动性,该胶体可以为液体或者半液体。It should be understood that the particle-containing colloid 110 can be obtained by adding particles to the colloid and mixing and stirring. Therefore, it can be understood that the particle-containing colloid 110 has a certain fluidity, and the colloid can be liquid or semi-liquid. .
其中,该胶体的材料为可固化材料(可进行热固化或光固化的材料),即该胶体通过热固化或光固化,可以形成固体胶体(即光栅)。示例性的,该胶体的材料例如可以是聚乙烯(polyethylene,PE)、聚丙烯(polypropylene,PP)、聚苯乙烯(polystyrene,PS)等材料。Wherein, the material of the colloid is a curable material (a material that can be thermally cured or light-cured), that is, the colloid can form a solid colloid (ie, a grating) through thermal curing or light-curing. For example, the colloid may be made of materials such as polyethylene (PE), polypropylene (PP), polystyrene (PS), etc.
可选地,该胶体可以为聚甲基丙烯酸甲酯(polymethyl methacrylate,PMMA)和/或聚二甲基硅氧烷(polydimethylsiloxane,PDMS)。Alternatively, the colloid may be polymethyl methacrylate (PMMA) and/or polydimethylsiloxane (PDMS).
应理解,该胶体中含有的粒子可以是磁性粒子,也可以是其他带电粒子。当在该胶体上施加相应的磁力或者相应的静电力时,该胶体中的磁性粒子或者带电粒子可以在胶体中进行一定位移的移动。It should be understood that the particles contained in the colloid may be magnetic particles or other charged particles. When a corresponding magnetic force or a corresponding electrostatic force is applied to the colloid, the magnetic particles or charged particles in the colloid can move with a certain displacement in the colloid.
可选地,该粒子可以为以下任意一种:四氧化三铁Fe3O4、铁酸亚钴CoFe2O4,锰酸亚钴MnFe2O4,镍Ni,本申请对此不作限定。Alternatively, the particles may be any of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , and nickel Ni, which is not limited in this application.
也就是说,该含粒子的胶体110可以是对胶体和粒子混合而成的,由于粒子(例如Fe3O4)可以受到磁力或静电力的影响,从而当在含粒子的胶体上施加磁力或静电力时,胶体中的粒子(例如Fe3O4)可以向施加磁力或静电力的方向移动,从而可以形成一定周 期的光栅。That is to say, the particle-containing colloid 110 can be a mixture of colloid and particles. Since the particles (such as Fe 3 O 4 ) can be affected by magnetic force or electrostatic force, when magnetic force or electrostatic force is exerted on the particle-containing colloid, When electrostatic force is applied, the particles in the colloid (such as Fe 3 O 4 ) can move in the direction of the magnetic force or electrostatic force, thus forming a certain circumference. period raster.
还应理解,该含粒子的胶体110具有一定的厚度,厚度的大小可以根据实际需求进行设置,例如,该含粒子的胶体110的厚度可以设置为5μm至15μm,本申请对此不作限定。It should also be understood that the particle-containing colloid 110 has a certain thickness, and the thickness can be set according to actual needs. For example, the thickness of the particle-containing colloid 110 can be set to 5 μm to 15 μm, which is not limited in this application.
102-103,在含粒子的胶体110的一侧间隔施加作用力120,以使所述胶体内的粒子分区聚集。102-103. Apply force 120 at intervals on one side of the particle-containing colloid 110 to cause the particles in the colloid to aggregate in zones.
具体地,当在含粒子的胶体110的一侧间隔施加作用力120时,该胶体中的粒子在该作用力120的作用下实现分区集聚,形成如图1中130所示的结构。Specifically, when a force 120 is applied at intervals on one side of the particle-containing colloid 110, the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown at 130 in Figure 1.
当在该含粒子的胶体110沿厚度方向的一侧间隔施加作用力120时,距离该作用力120较近一侧的粒子会在该作用力的作用下,向该作用力施加的位置移动;而距离该作用力120较远的一侧的粒子,则可能保持不动。在这种情况下,该胶体中的粒子沿该厚度方向上形成渐变结构,由此可以形成渐变的光栅。When a force 120 is applied at intervals on one side of the particle-containing colloid 110 along the thickness direction, the particles on the side closer to the force 120 will move toward the position where the force is applied under the action of the force; Particles on the side farther away from the force 120 may remain motionless. In this case, the particles in the colloid form a gradient structure along the thickness direction, thereby forming a gradient grating.
应理解,该作用力120可以为非接触感应力,该非接触感应力可以理解为不与物体直接接触即可对物体产生影响,例如,该作用力120可以包括磁力或静电力。It should be understood that the force 120 can be a non-contact induction force, which can be understood as having an influence on the object without direct contact with the object. For example, the force 120 can include magnetic force or electrostatic force.
在一些实施例中,该作用力120可以为磁力,该胶体中的粒子可以为磁性粒子,即该胶体中的磁性粒子在受到磁力的作用下,可以向该磁力施加的位置移动。In some embodiments, the force 120 can be a magnetic force, and the particles in the colloid can be magnetic particles, that is, the magnetic particles in the colloid can move toward the position where the magnetic force is exerted under the influence of the magnetic force.
在另外一些实施例中,该作用力120可以为静电力,该胶体中的粒子可以为带电粒子,即该胶体中的带电粒子在受到静电力的作用下,可以向该静电力施加的位置移动。In other embodiments, the force 120 may be an electrostatic force, and the particles in the colloid may be charged particles. That is, the charged particles in the colloid may move toward the position where the electrostatic force is applied under the action of the electrostatic force. .
可选地,当该作用力为磁力时,该磁力大小可以为0.001T至10T,T为磁力单位特斯拉。Optionally, when the force is magnetic force, the magnitude of the magnetic force may be 0.001T to 10T, and T is the magnetic force unit Tesla.
应理解,该磁力大小可以根据实际情况进行确定,例如,该磁力的大小可以根据胶体的成分和粒子的成分等因素确定。It should be understood that the magnitude of the magnetic force can be determined based on actual conditions. For example, the magnitude of the magnetic force can be determined based on factors such as the composition of the colloid and the composition of the particles.
在一些实施例中,若粒子成分等其他因素相同时,当胶体的粘度越大,需要施加的磁力也就越大;当胶体的粘度越小,需要施加的磁力也就越小。In some embodiments, if other factors such as particle composition are the same, the greater the viscosity of the colloid, the greater the magnetic force that needs to be applied; when the viscosity of the colloid is smaller, the smaller the magnetic force that needs to be applied.
在另外一些实施例中,若胶体成分等其他因素相同时,当粒子对磁场感应越小,需要施加的磁力也就越大;当粒子对磁场感应越大,需要施加的磁力也就越小。In other embodiments, if other factors such as the colloid composition are the same, the smaller the particle's induction of the magnetic field, the greater the magnetic force that needs to be applied; when the particle's induction of the magnetic field is greater, the smaller the magnetic force that needs to be applied.
可选地,该间隔施加的作用力120可以是大小均匀的作用力。在该作用力120的作用下,该胶体中的粒子可以形成粒子聚集区和非粒子聚集区,且该非粒子聚集区的粒子数少于该粒子聚集区的粒子数。由此形成的光栅其粒子聚集区的折射率应大于非粒子聚集区的折射率。Optionally, the force 120 exerted at this interval may be a uniform force. Under the action of the force 120, the particles in the colloid can form a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area. The refractive index of the particle gathering area of the thus formed grating should be greater than the refractive index of the non-particle gathering area.
应理解,该粒子聚集区与作用力120施加的区域相对应。即当在含粒子的胶体110上施加作用力120时,胶体内的粒子可以向施加作用力的区域进行移动,从而使得粒子聚集区与作用力120施加的区域相对应。It should be understood that this region of particle accumulation corresponds to the region where force 120 is exerted. That is, when the force 120 is applied to the colloid 110 containing particles, the particles in the colloid can move toward the area where the force is applied, so that the particle aggregation area corresponds to the area where the force 120 is applied.
可选地,粒子聚集区的折射率与非粒子聚集区的折射率的差值(即折射率对比度)可高达0.2及以上。相对于现有技术得到的光栅折射率对比度高出约0.05至0.1左右,从而可以突破全息光栅折射率瓶颈,折射率调制系数获得突破。Optionally, the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area (ie, the refractive index contrast) can be as high as 0.2 and above. Compared with the grating refractive index contrast obtained by the existing technology, the contrast ratio is about 0.05 to 0.1 higher, which can break through the refractive index bottleneck of the holographic grating and achieve a breakthrough in the refractive index modulation coefficient.
104,对含粒子的胶体110进行固化,形成预设周期的光栅130,且光栅130的周期与作用力120的间隔距离之间存在对应关系。104. The particle-containing colloid 110 is solidified to form a grating 130 with a preset period, and there is a corresponding relationship between the period of the grating 130 and the separation distance of the force 120.
具体地,该含粒子的胶体110通过步骤102和103中的处理后,胶体内的粒子实现分区聚集,并且可以形成渐变的结构,当胶体中的粒子充分聚集后,对经过步骤102和103处理后的胶体进行固化,可以形成预设周期的光栅130。 Specifically, after the particle-containing colloid 110 is processed in steps 102 and 103, the particles in the colloid achieve partition aggregation and can form a gradient structure. When the particles in the colloid are fully aggregated, the particles that have been processed in steps 102 and 103 The final colloid is cured to form a grating 130 with a preset period.
可选地,当作用力施加时间超过预设时间时,对胶体进行热固化或者光固化,形成预设周期的光栅,其中,胶体内的粒子在作用力120施加时间内充分聚集。Optionally, when the force application time exceeds the preset time, the colloid is thermally cured or light cured to form a grating with a preset period, in which the particles in the colloid are fully aggregated within the application time of the force 120 .
应理解,作用力的施加时间可以根据胶体内粒子聚集情况进行判断.一般情况下,该作用力的施加时间为1s至10s。It should be understood that the application time of the force can be judged based on the aggregation of particles in the colloid. Generally, the application time of the force is 1s to 10s.
可以理解的是,当施加的作用力较大时,粒子聚集速度较快,作用力施加时间也就较短;当施加的作用力较小时,粒子聚集的速度较慢,作用力施加时间也就较长。It can be understood that when the applied force is larger, the particles gather faster and the force application time is shorter; when the applied force is smaller, the particles gather slower and the force application time is shorter. longer.
应理解,通过固化形成的光栅结构,该光栅结构的光栅的周期与作用力的间隔之间存在对应关系。也就是说,施加作用力的间隔可以根据需要制作的光栅的周期而设定。施加作用力的间隔可以理解为作用力的间隔距离,施加作用力的间隔为1nm至10μm。It should be understood that in the grating structure formed by solidification, there is a corresponding relationship between the period of the grating of the grating structure and the interval of the applied force. That is to say, the interval at which the force is applied can be set according to the period of the grating that needs to be made. The interval at which the applied force is applied can be understood as the interval distance at which the applied force is applied, and the interval at which the applied force is applied is 1 nm to 10 μm.
通过步骤101至步骤104制作而成的光栅结构,由于只在胶体的一侧施加作用力,从而可以形成一种渐变的光栅结构,且形成的光栅结构中粒子聚集区的粒子数大于非粒子聚集区的粒子数,即粒子聚集区的折射率大于非粒子聚集区(或粒子较少的区域)的折射率,从而可以形成具有一定折射率对比度的光栅。此外,由于粒子的选择范围较大,当选择折射率更高的粒子制作光栅时,粒子聚集区的折射率与非粒子聚集区的折射率之间的差值也会更大,从而得到的光栅具有更高的光栅折射率对比度和更好的光学性能。The grating structure produced through steps 101 to 104 can form a gradient grating structure because the force is only applied to one side of the colloid, and the number of particles in the particle aggregation area of the formed grating structure is greater than that in the non-particle aggregation area. The number of particles in the area, that is, the refractive index of the particle aggregation area is greater than the refractive index of the non-particle aggregation area (or an area with fewer particles), so that a grating with a certain refractive index contrast can be formed. In addition, due to the large selection range of particles, when particles with a higher refractive index are selected to make a grating, the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area will also be greater, resulting in a grating Features higher grating refractive index contrast and better optical performance.
图2是本申请实施例提供的另一种制作光栅的方法示意性流程图。图2示出的是光栅的侧视图。该方法可以包括步骤201至步骤204,具体步骤如下:FIG. 2 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application. Figure 2 shows a side view of the grating. The method may include steps 201 to 204. The specific steps are as follows:
201,获取含粒子的胶体110,将所述含粒子的胶体110铺设于基体111的第一表面。201. Obtain the particle-containing colloid 110, and lay the particle-containing colloid 110 on the first surface of the substrate 111.
应理解,基体111可以为含粒子的胶体110提供机械支撑作用,基体111的材料例如可以是金属材料(如铜、钢、铁、铝)、玻璃、有机材料(如树脂)等,本申请对此不作限定。It should be understood that the matrix 111 can provide mechanical support for the particle-containing colloid 110. The material of the matrix 111 can be, for example, metal materials (such as copper, steel, iron, aluminum), glass, organic materials (such as resin), etc. This application is This is not a limitation.
该步骤其他内容可以参考步骤101,在此不再赘述。For other contents of this step, please refer to step 101 and will not be described again here.
202-203,在含粒子的胶体110的一侧间隔施加作用力120,以使所述胶体内的粒子分区聚集。202-203, apply force 120 at intervals on one side of the particle-containing colloid 110 to aggregate the particles in the colloid in zones.
可选地,当在含粒子的胶体110远离基体111的一侧间隔施加作用力120时,该胶体中的粒子在该作用力120的作用下实现分区集聚,形成如130所示的结构。Optionally, when a force 120 is applied at intervals on the side of the particle-containing colloid 110 away from the matrix 111, the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 130.
可选地,当在基体111远离胶体110的一侧间隔施加作用力时,该胶体中的粒子在该作用力120的作用下实现分区集聚,形成如130所示的结构。Optionally, when a force is applied at intervals on the side of the matrix 111 away from the colloid 110, the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 130.
该步骤其他内容可以参考步骤102-103,在此不再赘述。For other details of this step, please refer to steps 102-103, which will not be described again here.
204,对含粒子的胶体110进行固化,形成预设周期的光栅130,光栅的周期与作用力的间隔距离之间存在对应关系。204. Solidify the particle-containing colloid 110 to form a grating 130 with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
该步骤具体内容可以参考步骤104,在此不再赘述。For the specific content of this step, please refer to step 104, which will not be described again here.
本申请实施例提供的制作光栅的方法,通过将含粒子的胶体铺设于基体的第一表面上,可以使胶体表面更加平整,从而制作的光栅表面更加平滑。此外,通过在胶体的一侧施加作用力,可以得到一种渐变的光栅结构。进一步地,通过选择折射率更高的粒子制作光栅,得到的光栅具有更高的折射率对比度和更好的光学性能。The method for making a grating provided by the embodiment of the present application lays the colloid containing particles on the first surface of the substrate, so that the surface of the colloid can be made smoother, so that the surface of the grating produced is smoother. Furthermore, by applying force on one side of the colloid, a gradient grating structure can be obtained. Furthermore, by selecting particles with a higher refractive index to make gratings, the resulting gratings have higher refractive index contrast and better optical properties.
图3是本申请实施例提供的另一种制作光栅的方法示意性流程图。图3示出的是光栅的侧视图。该方法可以包括步骤301至步骤304,具体步骤如下:FIG. 3 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application. Figure 3 shows a side view of the grating. The method may include steps 301 to 304. The specific steps are as follows:
301,获取含粒子的胶体110,将所述含粒子的胶体110铺设于基体111的第一表面,此外,在含粒子的胶体110远离所述第一表面的一侧设置盖板112。 301. Obtain the particle-containing colloid 110 and lay the particle-containing colloid 110 on the first surface of the substrate 111. In addition, a cover plate 112 is provided on the side of the particle-containing colloid 110 away from the first surface.
应理解,基体111可以为含粒子的胶体110提供机械支撑作用。基体111和盖板112的材料例如可以是金属材料(如铜、钢、铁、铝)、玻璃、有机材料(如树脂)等,本申请对此不作限定。It should be understood that the matrix 111 can provide mechanical support for the particle-containing colloid 110 . The materials of the base 111 and the cover 112 may be, for example, metal materials (such as copper, steel, iron, aluminum), glass, organic materials (such as resin), etc., which are not limited in this application.
还应理解,基体111和盖板112搭配使用,与该含粒子的胶体110形成一个夹心结构,即基体111、含粒子的胶体110和盖板112形成夹心结构,从而防止当在含粒子的胶体110上施加作用力时,对胶体产生污染,获得更加纯净的光栅。It should also be understood that the base 111 and the cover 112 are used together to form a sandwich structure with the particle-containing colloid 110, that is, the base 111, the particle-containing colloid 110 and the cover 112 form a sandwich structure, thereby preventing the particle-containing colloid from being When force is applied on 110, the colloid is contaminated and a purer grating is obtained.
该步骤其他内容可以参考步骤101,在此不再赘述。For other contents of this step, please refer to step 101 and will not be described again here.
302-303,在含粒子的胶体110的一侧间隔施加作用力120,以使所述胶体内的粒子分区聚集。302-303, apply force 120 at intervals on one side of the particle-containing colloid 110 to aggregate the particles in the colloid in zones.
可选地,当在含粒子的胶体110远离基体111的一侧间隔施加作用力120时,该胶体中的粒子在该作用力120的作用下实现分区集聚,形成如130所示的结构。Optionally, when a force 120 is applied at intervals on the side of the particle-containing colloid 110 away from the matrix 111, the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 130.
可选地,当在基体111远离胶体110的一侧间隔施加作用力时,该胶体中的粒子在该作用力120的作用下实现分区集聚,形成如130所示的结构。Optionally, when a force is applied at intervals on the side of the matrix 111 away from the colloid 110, the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 130.
该步骤其他内容可以参考步骤102-103,在此不再赘述。For other details of this step, please refer to steps 102-103, which will not be described again here.
304,对含粒子的胶体110进行固化,形成预设周期的光栅130,光栅的周期与作用力的间隔距离之间存在对应关系。304. The particle-containing colloid 110 is solidified to form a grating 130 with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
该步骤具体内容可以参考步骤104,在此不再赘述。For the specific content of this step, please refer to step 104, which will not be described again here.
本申请实施例提供的制作光栅的方法,通过在胶体的两侧设置基体或盖板,形成一种夹心的结构,从而使得在胶体上施加作用力时,可以避免对胶体产生污染。此外,通过在胶体的一侧施加作用力,可以得到一种渐变的光栅结构。进一步地,通过选择折射率更高的粒子制作光栅,得到的光栅具有更高的折射率对比度和更好的光学性能。The method of making a grating provided in the embodiment of the present application forms a sandwich structure by arranging a base body or a cover plate on both sides of the colloid, thereby avoiding contamination of the colloid when a force is exerted on the colloid. Furthermore, by applying force on one side of the colloid, a gradient grating structure can be obtained. Furthermore, by selecting particles with a higher refractive index to make gratings, the resulting gratings have higher refractive index contrast and better optical properties.
图4是本申请实施例提供的另一种制作光栅的方法示意性流程图。图4示出的是光栅的侧视图。该方法可以包括步骤401至步骤404,具体步骤如下:FIG. 4 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application. Figure 4 shows a side view of the grating. The method may include steps 401 to 404. The specific steps are as follows:
401,获取含粒子的胶体110。401. Obtain particle-containing colloid 110.
该步骤具体可以参考步骤101,在此不再赘述。For details of this step, please refer to step 101, which will not be described again here.
402-403,在含粒子的胶体110的两侧间隔施加作用力120,以使所述胶体内的粒子分区聚集。402-403, apply forces 120 at intervals on both sides of the particle-containing colloid 110 to cause the particles in the colloid to aggregate in zones.
具体地,当在含粒子的胶体110的两侧间隔施加作用力120时,该胶体中的粒子在该作用力120的作用下实现分区集聚,形成如图4中140所示的结构。Specifically, when the force 120 is applied at intervals on both sides of the particle-containing colloid 110, the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown at 140 in Figure 4.
当在该含粒子的胶体110沿厚度方向的两侧间隔施加作用力120时,该含粒子的胶体110的两侧的粒子均会在该作用力120的作用下,向该作用力施加的位置移动,因此,可以形成均匀结构的光栅。When a force 120 is applied at intervals on both sides of the particle-containing colloid 110 along the thickness direction, the particles on both sides of the particle-containing colloid 110 will move toward the position where the force is applied under the action of the force 120 movement, therefore, a uniformly structured grating can be formed.
该步骤其他内容可以参考步骤102-103,在此不再赘述。For other details of this step, please refer to steps 102-103, which will not be described again here.
404,对含粒子的胶体110进行固化,形成预设周期的光栅140,光栅的周期与作用力的间隔距离之间存在对应关系。404. The particle-containing colloid 110 is solidified to form a grating 140 with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
该步骤其他内容可以参考步骤104,在此不再赘述。For other contents of this step, please refer to step 104 and will not be described again here.
通过步骤401至步骤404得到的光栅结构,由于在胶体的两侧间隔施加大小均匀的作用力,可以形成均匀的光栅结构,且形成的光栅结构中粒子聚集区的粒子数大于非粒子聚集区的粒子数,即粒子聚集区的折射率大于非粒子聚集区(或粒子较少的区域)的折射率,从而可以形成具有一定折射率对比度的光栅。此外,由于粒子的选择范围较大,当选择折 射率更高的粒子制作光栅时,得到的光栅具有更高的折射率对比度和更好的光学性能。The grating structure obtained through steps 401 to 404 can form a uniform grating structure due to the uniform force exerted on both sides of the colloid at intervals, and the number of particles in the particle aggregation area in the formed grating structure is greater than that in the non-particle aggregation area. The number of particles, that is, the refractive index of the particle aggregation area is greater than the refractive index of the non-particle aggregation area (or an area with fewer particles), so that a grating with a certain refractive index contrast can be formed. In addition, due to the large selection range of particles, when selecting fold When gratings are made from particles with higher refractive index, the resulting gratings have higher refractive index contrast and better optical properties.
图5是本申请实施例提供的另一种制作光栅的方法示意性流程图。图5示出的是光栅的侧视图。该方法可以包括步骤501至步骤504,具体步骤如下:FIG. 5 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application. Figure 5 shows a side view of the grating. The method may include steps 501 to 504. The specific steps are as follows:
501,获取含粒子的胶体110,将所述含粒子的胶体110铺设于基体111的第一表面。501. Obtain the particle-containing colloid 110, and lay the particle-containing colloid 110 on the first surface of the substrate 111.
应理解,基体111可以为含粒子的胶体110提供机械支撑作用,基体111的材料例如可以是金属材料(如铜、钢、铁、铝)、玻璃、有机材料(如树脂)等,本申请对此不作限定。It should be understood that the matrix 111 can provide mechanical support for the particle-containing colloid 110. The material of the matrix 111 can be, for example, metal materials (such as copper, steel, iron, aluminum), glass, organic materials (such as resin), etc. This application is This is not a limitation.
该步骤其他内容可以参考步骤101,在此不再赘述。For other contents of this step, please refer to step 101 and will not be described again here.
502-503,在含粒子的胶体110的两侧间隔施加作用力120,以使所述胶体内的粒子分区聚集。502-503, apply forces 120 at intervals on both sides of the particle-containing colloid 110 to cause the particles in the colloid to aggregate in zones.
具体地,当在含粒子的胶体110的两侧间隔施加作用力120时,该胶体中的粒子在该作用力120的作用下实现分区集聚,形成如140所示的结构。Specifically, when the force 120 is applied at intervals on both sides of the particle-containing colloid 110, the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 140.
当在该含粒子的胶体110沿厚度方向的两侧间隔施加作用力120时,该含粒子的胶体110的两侧的粒子均会在该作用力120的作用下,向该作用力施加的位置移动,因此,可以形成均匀结构的光栅。When a force 120 is applied at intervals on both sides of the particle-containing colloid 110 along the thickness direction, the particles on both sides of the particle-containing colloid 110 will move toward the position where the force is applied under the action of the force 120 movement, therefore, a uniformly structured grating can be formed.
该步骤其他内容可以参考步骤102-103,在此不再赘述。For other details of this step, please refer to steps 102-103, which will not be described again here.
504,对含粒子的胶体110进行固化,形成预设周期的光栅140,光栅的周期与作用力的间隔距离之间存在对应关系。504. The particle-containing colloid 110 is solidified to form a grating 140 with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
该步骤具体内容可以参考步骤104,在此不再赘述。For the specific content of this step, please refer to step 104, which will not be described again here.
本申请实施例提供的制作光栅的方法,通过将含粒子的胶体铺设于基体的第一表面上,可以使胶体表面更加平整,从而制作的光栅表面更加平滑。此外,由于在胶体的两侧同时间隔施加大小均匀的作用力,可以得到均匀的光栅结构。进一步地,通过选择折射率更高的粒子制作而成的光栅,具有更高的光栅折射率对比度和更好的光学性能。The method for making a grating provided by the embodiment of the present application lays the colloid containing particles on the first surface of the substrate, so that the surface of the colloid can be made smoother, so that the surface of the grating produced is smoother. In addition, since uniform forces are applied to both sides of the colloid simultaneously and at intervals, a uniform grating structure can be obtained. Furthermore, the grating made by selecting particles with higher refractive index has higher grating refractive index contrast and better optical performance.
图6是本申请实施例提供的另一种制作光栅的方法示意性流程图。图6示出的是光栅的侧视图。该方法可以包括步骤601至步骤604,具体步骤如下:FIG. 6 is a schematic flow chart of another method for making a grating provided by an embodiment of the present application. Figure 6 shows a side view of the grating. The method may include steps 601 to 604. The specific steps are as follows:
601,获取含粒子的胶体110,将所述含粒子的胶体110铺设于基体111的第一表面,此外,在含粒子的胶体110远离所述第一表面的一侧设置盖板112。601. Obtain the particle-containing colloid 110, lay the particle-containing colloid 110 on the first surface of the substrate 111, and set a cover 112 on the side of the particle-containing colloid 110 away from the first surface.
应理解,基体111可以为含粒子的胶体110提供机械支撑作用。基体111和盖板112的材料例如可以是金属材料(如铜、钢、铁、铝)、玻璃、有机材料(如树脂)等,本申请对此不作限定。It should be understood that the matrix 111 can provide mechanical support for the particle-containing colloid 110 . The materials of the base 111 and the cover 112 may be, for example, metal materials (such as copper, steel, iron, aluminum), glass, organic materials (such as resin), etc., which are not limited in this application.
还应理解,基体111和盖板112搭配使用,与该含粒子的胶体110形成一个夹心结构,即基体111、含粒子的胶体110和盖板112形成夹心结构,从而防止当在含粒子的胶体110上施加作用力时,对胶体产生污染,获得更加纯净的光栅。It should also be understood that the base 111 and the cover 112 are used together to form a sandwich structure with the particle-containing colloid 110, that is, the base 111, the particle-containing colloid 110 and the cover 112 form a sandwich structure, thereby preventing the particle-containing colloid from being When force is applied on 110, the colloid is contaminated and a purer grating is obtained.
该步骤其他内容可以参考步骤101,在此不再赘述。For other contents of this step, please refer to step 101 and will not be described again here.
602-603,在含粒子的胶体110的两侧间隔施加作用力120,以使所述胶体内的粒子分区聚集。602-603: Apply forces 120 at intervals on both sides of the particle-containing colloid 110 to cause the particles in the colloid to aggregate in zones.
具体地,当在含粒子的胶体110的两侧间隔施加作用力120时,该胶体中的粒子在该作用力120的作用下实现分区集聚,形成如140所示的结构。Specifically, when the force 120 is applied at intervals on both sides of the particle-containing colloid 110, the particles in the colloid achieve zone aggregation under the action of the force 120, forming a structure as shown in 140.
当在该含粒子的胶体110沿厚度方向的两侧间隔施加作用力120时,该含粒子的胶体110的两侧的粒子均会在该作用力120的作用下,向该作用力施加的位置移动,因此,可 以形成均匀结构的光栅。When a force 120 is applied at intervals on both sides of the particle-containing colloid 110 along the thickness direction, the particles on both sides of the particle-containing colloid 110 will move toward the position where the force is applied under the action of the force 120 mobile, therefore, can to form a uniformly structured grating.
该步骤其他内容可以参考步骤102-103,在此不再赘述。For other details of this step, please refer to steps 102-103, which will not be described again here.
604,对含粒子的胶体110进行固化,形成预设周期的光栅140,光栅的周期与作用力的间隔距离之间存在对应关系。604. The particle-containing colloid 110 is solidified to form a grating 140 with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the applied force.
该步骤具体内容可以参考步骤104,在此不再赘述。For the specific content of this step, please refer to step 104, which will not be described again here.
本申请实施例提供的制作光栅的方法,通过在胶体的两侧设置基体或盖板,形成一种夹心的结构,从而使得在胶体上施加作用力时,可以避免对胶体产生污染。此外,由于在胶体的两侧同时间隔施加大小均匀的作用力,可以得到均匀的光栅结构。进一步地,通过选择折射率更高的粒子制作而成的光栅,具有更高的光栅折射率对比度和更好的光学性能。The method of making a grating provided in the embodiment of the present application forms a sandwich structure by arranging a base body or a cover plate on both sides of the colloid, thereby avoiding contamination of the colloid when a force is exerted on the colloid. In addition, since uniform forces are applied to both sides of the colloid simultaneously and at intervals, a uniform grating structure can be obtained. Furthermore, the grating made by selecting particles with higher refractive index has higher grating refractive index contrast and better optical performance.
图7是本申请实施例提供的一种光栅示意图。图7示出了光栅的俯视图。Figure 7 is a schematic diagram of a grating provided by an embodiment of the present application. Figure 7 shows a top view of the grating.
通过图1至图6中任一所示的制作光栅的方法,均可以得到如图7所示光栅结构的俯视图。通过图1至图3中任一所示的制作光栅的方法制作而成的光栅,具有渐变的结构。通过图4至图6中任一所示的制作光栅的方法,能够获得更为均匀的光栅结构。Through any method of making a grating shown in FIGS. 1 to 6 , a top view of the grating structure as shown in FIG. 7 can be obtained. The grating produced by any of the grating producing methods shown in Figures 1 to 3 has a gradient structure. A more uniform grating structure can be obtained by using any of the methods of making gratings shown in FIGS. 4 to 6 .
如图7所示的光栅可以包括固化胶体(即进行固化处理得到的胶体),该胶体中包括粒子聚集区和非粒子聚集区,粒子聚集区和非粒子聚集区是通过在胶体上间隔施加作用力形成的,粒子聚集区与作用力施加的区域相对应。The grating shown in Figure 7 may include a cured colloid (ie, a colloid obtained by a curing process). The colloid includes a particle aggregation area and a non-particle aggregation area. The particle aggregation area and the non-particle aggregation area are formed by applying effects on the colloid at intervals. Formed by a force, the particle accumulation area corresponds to the area where the force is applied.
应理解,该非粒子聚集区的粒子数少于该粒子聚集区的粒子数,该粒子聚集区的折射率大于该非粒子聚集区的折射率。It should be understood that the number of particles in the non-particle aggregation region is less than the number of particles in the particle aggregation region, and the refractive index of the particle aggregation region is greater than the refractive index of the non-particle aggregation region.
可选地,该粒子聚集区的折射率与该非粒子聚集区的折射率的差值(即折射率对比度)可高达0.2及以上。相对于现有技术得到的光栅折射率对比度高出约0.05至0.1左右,从而可以突破全息光栅折射率瓶颈,折射率调制系数获得突破。Optionally, the difference between the refractive index of the particle-aggregated region and the refractive index of the non-particle-aggregated region (ie, the refractive index contrast) can be as high as 0.2 or more. Compared with the grating refractive index contrast obtained by the existing technology, the contrast ratio is about 0.05 to 0.1 higher, which can break through the refractive index bottleneck of the holographic grating and achieve a breakthrough in the refractive index modulation coefficient.
可选地,该作用力为非接触感应力。可选地,当该非接触感应力为磁力时,该粒子为磁性粒子;当该非接触感应力为静电力时,该粒子为带电粒子。Optionally, the force is a non-contact induction force. Optionally, when the non-contact induction force is magnetic force, the particles are magnetic particles; when the non-contact induction force is electrostatic force, the particles are charged particles.
可选地,该作用力为磁力,该磁力大小为0.001T至10T,T为磁力单位特斯拉。Optionally, the acting force is magnetic force, and the magnitude of the magnetic force is 0.001T to 10T, and T is the magnetic force unit Tesla.
可选地,该胶体为聚甲基丙烯酸甲酯PMMA和/或聚二甲基硅氧烷PDMS。Optionally, the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS.
可选地,该粒子为以下任意一种:四氧化三铁Fe3O4、铁酸亚钴CoFe2O4,锰酸亚钴MnFe2O4,镍Ni。Optionally, the particles are any one of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , and nickel Ni.
应理解,本申请实施例制作而成的光栅可以应用于增强现实AR光波导中,可以应用于激光器中,还可以应用于汽车的抬头显示器(head up display,HUD)中。It should be understood that the grating made by the embodiment of the present application can be used in an augmented reality AR optical waveguide, in a laser, and in a car's head-up display (HUD).
通过本申请实施例提供的方法得到的光栅,能够突破全息光栅折射率的限制,获得更高的光栅折射率对比度和更好的光学性能。The grating obtained by the method provided in the embodiments of the present application can break through the limitation of the refractive index of the holographic grating and obtain higher grating refractive index contrast and better optical performance.
图8是本申请实施例提供的一种制作光栅的设备示意图。Figure 8 is a schematic diagram of an equipment for making gratings provided by an embodiment of the present application.
该制作光栅的设备800包括施力模块810和固化模块820,该施力模块810,用于在含粒子的胶体上间隔施加作用力,以使胶体内的粒子分区聚集;该固化模块820,用于对胶体进行固化,形成预设周期的光栅,光栅的周期与作用力的间隔距离之间存在对应关系。The device 800 for making gratings includes a force application module 810 and a curing module 820. The force application module 810 is used to apply force at intervals on the colloid containing particles to aggregate the particles in the colloid in zones; the curing module 820 is used to For solidifying the colloid to form a grating with a preset period, there is a corresponding relationship between the period of the grating and the separation distance of the applied force.
可选地,光栅包括粒子聚集区和非粒子聚集区,非粒子聚集区的粒子数少于粒子聚集区的粒子数。Optionally, the grating includes a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
可选地,粒子聚集区的折射率大于非粒子聚集区的折射率。Optionally, the refractive index of the particle-aggregated region is greater than the refractive index of the non-particle-aggregated region.
可选地,粒子聚集区的折射率与非粒子聚集区的折射率的差值大于或等于0.2。Optionally, the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area is greater than or equal to 0.2.
可选地,含粒子的胶体铺设于基体的第一表面。 Optionally, the particle-containing colloid is laid on the first surface of the substrate.
可选地,在含粒子的胶体远离第一表面的一侧设置盖板。Optionally, a cover plate is provided on a side of the particle-containing colloid away from the first surface.
可选地,粒子聚集区与作用力施加的区域相对应。Optionally, the particle accumulation area corresponds to the area where the force is applied.
可选地,该施力模块810还用于:在含粒子的胶体的一侧间隔施加作用力,以使胶体内的粒子分区聚集;或者,在含粒子的胶体的两侧间隔施加作用力,以使胶体内的粒子分区聚集。也就是说,在胶体远离基体的一侧间隔施加作用力,以使胶体内的粒子分区聚集;或者,在基体远离胶体的一侧间隔施加作用力,以使胶体内的粒子分区聚集;或者,在胶体远离基体的一侧和在基体远离胶体的一侧同时间隔施加作用力,以使胶体内的粒子分区聚集。Optionally, the force application module 810 is also used to: apply force at intervals on one side of the colloid containing particles to aggregate the particles in the colloid in zones; or, apply forces at intervals on both sides of the colloid containing particles, In order to make the particles in the colloid aggregate in zones. That is to say, a force is applied at intervals on the side of the colloid away from the matrix to cause the particles in the colloid to aggregate in zones; or, a force is applied at intervals on the side of the matrix away from the colloid to cause the particles in the colloid to aggregate in zones; or, Apply forces at intervals on the side of the colloid away from the matrix and on the side of the matrix away from the colloid at intervals to cause the particles in the colloid to aggregate in zones.
可选地,作用力为非接触感应力。可选地,非接触感应力为磁力,粒子为磁性粒子;或者,非接触感应力为静电力,粒子为带电粒子。Optionally, the force is a non-contact induction force. Alternatively, the non-contact induction force is magnetic force, and the particles are magnetic particles; or, the non-contact induction force is electrostatic force, and the particles are charged particles.
可选地,该固化模块820还用于:当作用力施加时间超过预设时间时,对胶体进行热固化或者光固化,形成预设周期的光栅,其中,胶体内的粒子在作用力施加时间内充分聚集。Optionally, the curing module 820 is also used to: when the force application time exceeds the preset time, the colloid is thermally cured or light cured to form a grating with a preset period, wherein the particles in the colloid are Fully gathered inside.
可选地,该作用力为磁力,该磁力大小为0.001T至10T,T为磁力单位特斯拉。Optionally, the acting force is magnetic force, and the magnitude of the magnetic force is 0.001T to 10T, and T is the magnetic force unit Tesla.
可选地,胶体为聚甲基丙烯酸甲酯PMMA和/或聚二甲基硅氧烷PDMS。Optionally, the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS.
可选地,粒子为以下任意一种:四氧化三铁Fe3O4、铁酸亚钴CoFe2O4,锰酸亚钴MnFe2O4,镍Ni。Optionally, the particles are any one of the following: ferric oxide Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , and nickel Ni.
此外,本申请还提供一种设备,该设备包括上述任一种方法制作而成的光栅,或者,包括上述任一种光栅结构。In addition, this application also provides a device, which device includes a grating made by any of the above methods, or includes any of the above grating structures.
本领域普通技术人员可以意识到,结合本文中所公开的实施例描述的各示例的单元及算法步骤,能够以电子硬件、或者计算机软件和电子硬件的结合来实现。这些功能究竟以硬件还是软件方式来执行,取决于技术方案的特定应用和设计约束条件。专业技术人员可以对每个特定的应用来使用不同方法来实现所描述的功能,但是这种实现不应认为超出本申请的范围。Those of ordinary skill in the art will appreciate that the units and algorithm steps of each example described in conjunction with the embodiments disclosed herein can be implemented with electronic hardware, or a combination of computer software and electronic hardware. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. Skilled artisans may implement the described functionality using different methods for each specific application, but such implementations should not be considered beyond the scope of this application.
以上所述,仅为本申请的具体实施方式,但本申请的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本申请揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本申请的保护范围之内。因此,本申请的保护范围应以所述权利要求的保护范围为准。 The above are only specific embodiments of the present application, but the protection scope of the present application is not limited thereto. Any person familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed in the present application. should be covered by the protection scope of this application. Therefore, the protection scope of this application should be subject to the protection scope of the claims.

Claims (33)

  1. 一种制作光栅的方法,其特征在于,包括:A method of making gratings, characterized by including:
    在含粒子的胶体上间隔施加作用力,以使所述胶体内的粒子分区聚集;Apply force at intervals on the colloid containing particles to cause the particles in the colloid to aggregate in zones;
    对所述胶体进行固化,形成预设周期的光栅,所述光栅的周期与所述作用力的间隔距离之间存在对应关系。The colloid is solidified to form a grating with a preset period, and there is a corresponding relationship between the period of the grating and the separation distance of the force.
  2. 根据权利要求1所述的方法,其特征在于,所述光栅包括粒子聚集区和非粒子聚集区,所述非粒子聚集区的粒子数少于所述粒子聚集区的粒子数。The method of claim 1, wherein the grating includes a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the number of particles in the particle aggregation area.
  3. 根据权利要求2所述的方法,其特征在于,所述粒子聚集区的折射率大于所述非粒子聚集区的折射率。The method of claim 2, wherein the refractive index of the particle aggregation region is greater than the refractive index of the non-particle aggregation region.
  4. 根据权利要求2或3所述的方法,其特征在于,所述粒子聚集区的折射率与所述非粒子聚集区的折射率的差值大于或等于0.2。The method according to claim 2 or 3, characterized in that the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area is greater than or equal to 0.2.
  5. 根据权利要求1至4中任一项所述的方法,其特征在于,在所述在含粒子的胶体上间隔施加作用力之前,所述方法还包括:The method according to any one of claims 1 to 4, characterized in that, before applying force at intervals on the colloid containing particles, the method further includes:
    将所述含粒子的胶体铺设于基体的第一表面。The particle-containing colloid is laid on the first surface of the substrate.
  6. 根据权利要求5所述的方法,其特征在于,所述方法还包括:The method of claim 5, further comprising:
    在所述含粒子的胶体远离所述第一表面的一侧设置盖板。A cover plate is provided on the side of the particle-containing colloid away from the first surface.
  7. 根据权利要求1至6中任一项所述的方法,其特征在于,所述在含粒子的胶体上间隔施加作用力,以使所述胶体内的粒子分区聚集,包括:The method according to any one of claims 1 to 6, characterized in that applying force at intervals on the colloid containing particles to cause the particles in the colloid to aggregate in zones includes:
    在所述含粒子的胶体的一侧间隔施加作用力,以使所述胶体内的粒子分区聚集;或者,Apply force at intervals on one side of the particle-containing colloid to cause the particles in the colloid to aggregate in zones; or,
    在所述含粒子的胶体的两侧间隔施加作用力,以使所述胶体内的粒子分区聚集。Forces are applied at intervals on both sides of the particle-containing colloid to cause the particles in the colloid to aggregate in zones.
  8. 根据权利要求1至7中任一项所述的方法,其特征在于,所述作用力为非接触感应力。The method according to any one of claims 1 to 7, characterized in that the acting force is a non-contact induction force.
  9. 根据权利要求8所述的方法,其特征在于,所述非接触感应力为磁力,所述粒子为磁性粒子;或者,所述非接触感应力为静电力,所述粒子为带电粒子。The method according to claim 8, wherein the non-contact induction force is magnetic force and the particles are magnetic particles; or the non-contact induction force is electrostatic force and the particles are charged particles.
  10. 根据权利要求1至9中任一项所述的方法,其特征在于,所述对所述胶体进行固化,形成预设周期的光栅,包括:The method according to any one of claims 1 to 9, characterized in that solidifying the colloid to form a grating with a preset period includes:
    当所述作用力施加时间超过预设时间时,对所述胶体进行热固化或者光固化,形成预设周期的光栅,其中,所述胶体内的粒子在所述作用力施加时间内充分聚集。When the force application time exceeds the preset time, the colloid is thermally cured or light cured to form a grating with a preset period, wherein the particles in the colloid are fully aggregated within the force application time.
  11. 根据权利要求1至10中任一项所述的方法,其特征在于,所述作用力为磁力,所述磁力大小为0.001T至10T,T为磁力单位特斯拉。The method according to any one of claims 1 to 10, characterized in that the acting force is magnetic force, the magnitude of the magnetic force is 0.001T to 10T, and T is the magnetic force unit Tesla.
  12. 根据权利要求1至11中任一项所述的方法,其特征在于,所述胶体为聚甲基丙烯酸甲酯PMMA和/或聚二甲基硅氧烷PDMS,所述粒子为以下任意一种:四氧化三铁Fe3O4、铁酸亚钴CoFe2O4,锰酸亚钴MnFe2O4,镍Ni。The method according to any one of claims 1 to 11, characterized in that the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS, and the particles are any one of the following : Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , nickel Ni.
  13. 一种光栅,其特征在于,包括:A grating characterized by including:
    固化胶体,所述固化胶体中包括粒子聚集区和非粒子聚集区,所述粒子聚集区和所述非粒子聚集区是通过在所述胶体上间隔施加作用力形成的,所述粒子聚集区与作用力施加的区域相对应。Solidified colloid, the solidified colloid includes a particle aggregation area and a non-particle aggregation area, the particle aggregation area and the non-particle aggregation area are formed by applying force on the colloid at intervals, the particle aggregation area and the non-particle aggregation area are Corresponds to the area where the force is applied.
  14. 根据权利要求13所述的光栅,其特征在于,所述非粒子聚集区的粒子数少于所 述粒子聚集区的粒子数。The grating according to claim 13, wherein the number of particles in the non-particle agglomeration area is less than The number of particles in the particle aggregation area.
  15. 根据权利要求13或14所述的光栅,其特征在于,所述粒子聚集区的折射率大于所述非粒子聚集区的折射率。The grating according to claim 13 or 14, wherein the refractive index of the particle gathering area is greater than the refractive index of the non-particle gathering area.
  16. 根据权利要求13至15中任一项所述的光栅,其特征在于,所述粒子聚集区的折射率与所述非粒子聚集区的折射率的差值大于或等于0.2。The grating according to any one of claims 13 to 15, wherein the difference between the refractive index of the particle gathering area and the refractive index of the non-particle gathering area is greater than or equal to 0.2.
  17. 根据权利要求13至16中所述的光栅,其特征在于,所述作用力为非接触感应力。The grating according to claims 13 to 16, characterized in that the acting force is a non-contact induction force.
  18. 根据权利要求17所述的光栅,其特征在于,所述非接触感应力为磁力,所述粒子为磁性粒子;或者,所述非接触感应力为静电力,所述粒子为带电粒子。The grating according to claim 17, wherein the non-contact induction force is magnetic force and the particles are magnetic particles; or the non-contact induction force is electrostatic force and the particles are charged particles.
  19. 根据权利要求13至18中任一项所述的光栅,其特征在于,所述作用力为磁力,所述磁力大小为0.001T至10T,T为磁力单位特斯拉。The grating according to any one of claims 13 to 18, characterized in that the acting force is magnetic force, the magnitude of the magnetic force is 0.001T to 10T, and T is the magnetic force unit Tesla.
  20. 根据权利要求13至19中任一项所述的光栅,其特征在于,所述胶体为聚甲基丙烯酸甲酯PMMA和/或聚二甲基硅氧烷PDMS,所述粒子为以下任意一种:四氧化三铁Fe3O4、铁酸亚钴CoFe2O4,锰酸亚钴MnFe2O4,镍Ni。The grating according to any one of claims 13 to 19, characterized in that the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS, and the particles are any one of the following : Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , nickel Ni.
  21. 一种设备,其特征在于,包括如权利要求13至20中任一项所述的光栅。A device, characterized by comprising a grating according to any one of claims 13 to 20.
  22. 一种制作光栅的设备,其特征在于,包括:A device for making gratings, which is characterized by including:
    施力模块,用于在含粒子的胶体上间隔施加作用力,以使所述胶体内的粒子分区聚集;A force application module is used to apply force at intervals on the colloid containing particles, so as to cause the particles in the colloid to aggregate in zones;
    固化模块,用于对所述胶体进行固化,形成预设周期的光栅,所述光栅的周期与所述作用力的间隔距离之间存在对应关系。A curing module is used to solidify the colloid to form a grating with a preset period. There is a corresponding relationship between the period of the grating and the separation distance of the force.
  23. 根据权利要求22所述的设备,其特征在于,所述光栅包括粒子聚集区和非粒子聚集区,所述非粒子聚集区的粒子数少于所述粒子聚集区的粒子数。The device according to claim 22, wherein the grating includes a particle aggregation area and a non-particle aggregation area, and the number of particles in the non-particle aggregation area is less than the particle number in the particle aggregation area.
  24. 根据权利要求23所述的设备,其特征在于,所述粒子聚集区的折射率大于所述非粒子聚集区的折射率。The apparatus of claim 23, wherein the refractive index of the particle-aggregated region is greater than the refractive index of the non-particle-aggregated region.
  25. 根据权利要求23或24所述的设备,其特征在于,所述粒子聚集区的折射率与所述非粒子聚集区的折射率的差值大于或等于0.2。The device according to claim 23 or 24, characterized in that the difference between the refractive index of the particle aggregation area and the refractive index of the non-particle aggregation area is greater than or equal to 0.2.
  26. 根据权利要求22至25中任一项所述的设备,其特征在于,所述含粒子的胶体铺设于基体的第一表面。The device according to any one of claims 22 to 25, wherein the particle-containing colloid is laid on the first surface of the substrate.
  27. 根据权利要求26所述的设备,其特征在于,在所述含粒子的胶体远离所述第一表面的一侧设置有盖板。The apparatus according to claim 26, wherein a cover plate is provided on a side of the particle-containing colloid away from the first surface.
  28. 根据权利要求22至27中任一项所述的设备,其特征在于,所述施力模块还用于:The device according to any one of claims 22 to 27, characterized in that the force application module is also used for:
    在所述含粒子的胶体的一侧间隔施加作用力,以使所述胶体内的粒子分区聚集;或者,Apply force at intervals on one side of the particle-containing colloid to cause the particles in the colloid to aggregate in zones; or,
    在所述含粒子的胶体的两侧间隔施加作用力,以使所述胶体内的粒子分区聚集。Forces are applied at intervals on both sides of the particle-containing colloid to cause the particles in the colloid to aggregate in zones.
  29. 根据权利要求22至28中任一项所述的设备,其特征在于,所述作用力为非接触感应力。The device according to any one of claims 22 to 28, wherein the force is a non-contact induction force.
  30. 根据权利要求29所述的设备,其特征在于,所述非接触感应力为磁力,所述粒子为磁性粒子;或者,所述非接触感应力为静电力,所述粒子为带电粒子。The device according to claim 29, wherein the non-contact induction force is magnetic force and the particles are magnetic particles; or the non-contact induction force is electrostatic force and the particles are charged particles.
  31. 根据权利要求22至30中任一项所述的设备,其特征在于,所述固化模块还用于:当所述作用力施加时间超过预设时间时,对所述胶体进行热固化或者光固化,形成预设周期的光栅,其中,所述胶体内的粒子在所述作用力施加时间内充分聚集。The device according to any one of claims 22 to 30, characterized in that the curing module is also used to: perform thermal curing or light curing of the colloid when the force application time exceeds a preset time. , forming a grating with a preset period, in which the particles in the colloid are fully aggregated within the force application time.
  32. 根据权利要求22至31中任一项所述的设备,其特征在于,所述作用力为磁力,所述磁力大小为0.001T至10T,T为磁力单位特斯拉。 The device according to any one of claims 22 to 31, characterized in that the acting force is magnetic force, the magnitude of the magnetic force is 0.001T to 10T, and T is the magnetic force unit Tesla.
  33. 根据权利要求22至32中任一项所述的设备,其特征在于,所述胶体为聚甲基丙烯酸甲酯PMMA和/或聚二甲基硅氧烷PDMS,所述粒子为以下任意一种:四氧化三铁Fe3O4、铁酸亚钴CoFe2O4,锰酸亚钴MnFe2O4,镍Ni。 The device according to any one of claims 22 to 32, characterized in that the colloid is polymethylmethacrylate PMMA and/or polydimethylsiloxane PDMS, and the particles are any one of the following : Fe 3 O 4 , cobalt ferrite CoFe 2 O 4 , cobalt manganate MnFe 2 O 4 , nickel Ni.
PCT/CN2023/096830 2022-06-01 2023-05-29 Grating, and method and device for fabricating grating WO2023231962A1 (en)

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