WO2023229106A1 - Surface treatment device and surface treatment method for bioimplant medical device - Google Patents

Surface treatment device and surface treatment method for bioimplant medical device Download PDF

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Publication number
WO2023229106A1
WO2023229106A1 PCT/KR2022/013388 KR2022013388W WO2023229106A1 WO 2023229106 A1 WO2023229106 A1 WO 2023229106A1 KR 2022013388 W KR2022013388 W KR 2022013388W WO 2023229106 A1 WO2023229106 A1 WO 2023229106A1
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Prior art keywords
chamber
surface treatment
vacuum
packaging container
medical device
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PCT/KR2022/013388
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French (fr)
Korean (ko)
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이원오
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주식회사 큐브인스트루먼트
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Publication of WO2023229106A1 publication Critical patent/WO2023229106A1/en

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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C8/00Means to be fixed to the jaw-bone for consolidating natural teeth or for fixing dental prostheses thereon; Dental implants; Implanting tools
    • A61C8/0012Means to be fixed to the jaw-bone for consolidating natural teeth or for fixing dental prostheses thereon; Dental implants; Implanting tools characterised by the material or composition, e.g. ceramics, surface layer, metal alloy
    • A61C8/0013Means to be fixed to the jaw-bone for consolidating natural teeth or for fixing dental prostheses thereon; Dental implants; Implanting tools characterised by the material or composition, e.g. ceramics, surface layer, metal alloy with a surface layer, coating
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C13/00Dental prostheses; Making same
    • A61C13/01Palates or other bases or supports for the artificial teeth; Making same
    • A61C13/02Palates or other bases or supports for the artificial teeth; Making same made by galvanoplastic methods or by plating; Surface treatment; Enamelling; Perfuming; Making antiseptic
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00Dental auxiliary appliances
    • A61C19/02Protective casings, e.g. boxes for instruments; Bags
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C8/00Means to be fixed to the jaw-bone for consolidating natural teeth or for fixing dental prostheses thereon; Dental implants; Implanting tools
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C8/00Means to be fixed to the jaw-bone for consolidating natural teeth or for fixing dental prostheses thereon; Dental implants; Implanting tools
    • A61C8/0018Means to be fixed to the jaw-bone for consolidating natural teeth or for fixing dental prostheses thereon; Dental implants; Implanting tools characterised by the shape
    • A61C8/0022Self-screwing
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/3423Connecting means, e.g. electrical connecting means or fluid connections

Definitions

  • the present invention relates to a surface treatment device and method for removing surface foreign substances from medical devices for biological implantation, and more specifically, to removing traces of viruses and bacteria remaining after sterilization or sterilization of medical devices for biological transplantation using plasma. It relates to a surface treatment device and treatment method for medical devices for bioimplantation, which removes other organic substances including carbonized layers on the surface.
  • High-energy particles in the plasma state collide with the surface of various materials and transfer energy to the material surface.
  • This plasma has the characteristic of enabling various surface treatments because various physical/chemical reactions occur when it interacts with the material surface.
  • plasma surface treatment technology is being used in a variety of places, including micro-patterning technology and anti-fingerprint surface treatment technology for polymer films.
  • bioimplantable medical devices such as fixtures take a long time for bone fusion when implanted in the human body, so technology is needed to reduce biostabilization time or speed up treatment by removing surface impurities through a plasma treatment process during the production stage. It has been announced.
  • quartz glass which has a high ultraviolet transmittance, as a case, but the use of quartz glass causes an increase in cost.
  • the present invention was created to solve the above problems, and the purpose of the present invention is to remove traces of viruses and bacteria (dead viruses or bacteria) remaining after sterilization or sterilization of bioimplantable medical devices through plasma surface treatment. ) and remove other organic substances, including carbonized layers on the surface, to provide a surface treatment device and treatment method for medical devices for bioimplantation.
  • the present invention provides a surface treatment device and method for medical devices for bioimplantation that enable plasma surface treatment while the product is packaged.
  • a surface treatment device and treatment method for medical devices for bioimplants that enable plasma surface treatment at a desired location and with a desired intensity by varying the position of the electrode or controlling the position of the magnetic field through an external magnetic field generation means and control means, or by combining the two processes.
  • An apparatus for treating the surface of a medical device for biological implantation includes a case in which a medical device for plasma surface treatment is accommodated; a chamber portion in which the case is accommodated; an electrode unit provided in the chamber unit to charge the inside of the chamber unit by applying power; a vacuum passage formed in the case to form a vacuum inside the case, and a vacuum line provided in the chamber, one end of which is connected to a vacuum pressure forming means, and the other end of which communicates with the vacuum passage; and a gas passage formed in the case for injecting a process gas into the case, and a gas line provided in the chamber, one end of which is connected to a gas supply means, and the other end of which communicates with the gas passage.
  • the chamber unit includes a chamber cylinder 210 having an open upper and lower sides with a space formed therein to accommodate the inner packaging container 100;
  • a first cover 220 that seals one side of the chamber cylinder 210 and is provided with a vacuum line 225 for forming a vacuum inside the chamber cylinder 210; and
  • a second cover 230 that seals the other side of the chamber cylinder 210 and is provided with a gas line 235 for supplying process gas into the chamber cylinder 210.
  • first cover 220 is configured to fix and support the upper side of the inner packaging container 100 through the bottom when coupled to the chamber cylinder 210
  • second cover 230 is coupled to the chamber cylinder 210. It is configured to fix and support the lower side of the inner packaging container 100 through the upper end.
  • the electrode unit may be a first electrode provided in a ring shape along the circumference of the first cover, or a second electrode provided in a ring shape along the circumference of the chamber cylinder 210, or the first electrode. It includes both an electrode and a second electrode.
  • each second electrode 320 is configured to enable power on/off switching individually.
  • the case includes a case cylinder 110 with an open upper and lower side and a space formed therein to accommodate and fix the medical device S;
  • a first case cover 120 that seals one side of the case cylinder 110 and has a vacuum passage 125 for forming a vacuum inside the case cylinder 110;
  • the lower end of the first cover 220 is in close contact with the upper side of the inner packaging container 100 and communicates with the vacuum line 225 when the upper side of the inner packaging container 100 is fixed, and the gas flow path 135 is connected to the second cover.
  • the lower end of 220 is in close contact with the lower side of the inner packaging container 100 and communicates with the gas line 235 when the lower side of the inner packaging container 100 is fixed.
  • the surface treatment device includes a magnetic field generator 500 for generating a magnetic field around the chamber 200 and controlling the magnetic flux around the chamber 200 to vary the plasma density at a specific location inside the chamber 200. ) includes.
  • the magnetic field generator 500 is formed in a ring shape with a predetermined thickness, and has an inner diameter larger than the outer diameter of the chamber 200, so that it forms a radial direction between the chamber 200 and the magnetic field generator 500. It is configured to form a separation space along the magnetic field generator 500, and is provided with a first moving means to be able to move along the longitudinal direction of the chamber 200 to increase the plasma density in the vertical direction of the inner packaging container 100. It is configured to be variable.
  • the magnetic field generator 500 is configured to rotate through a second moving means that rotates along the circumferential direction with respect to the center of the chamber 200, and the center of the magnetic field generator 500 and the The centers of the second moving means are configured to be spaced apart so that the magnetic field generator 500 rotates eccentrically.
  • the surface treatment method using a surface treatment device for medical device for biological implantation includes the medical device installation step of installing the inner packaging container 100 in which the medical device (S) is packaged in the chamber 200 ( S10); The chamber 200 is sealed through the first or second covers 220 and 230, and a vacuum is applied inside the chamber 200 and the inner packaging container 100 through the vacuum line 225 and the vacuum passage 125.
  • a vacuum S20
  • a surface treatment step (S40) of generating plasma by applying power to the first electrode and the second electrode Turning off the power to stop plasma generation (S50); releasing the vacuum inside the chamber 200 (S60); and a step (S70) of opening the chamber portion 200 to retrieve the medical device S accommodated in the inner packaging container 100.
  • the surface treatment step (S40) changes the process pressure or type by varying the vacuum level inside the chamber 400 and adjusting the input amount of process gas, adjusting the power supply voltage for plasma generation, and adjusting the power frequency and shape of the electrode. It further includes a plasma density variable step (S45) of controlling the plasma density by adjusting and varying the magnetic flux around the chamber 400.
  • the surface treatment device and treatment method for a medical device for biological implantation of the present invention have the effect of reducing the biostabilization time and speeding up the treatment speed when implanting a medical device into a living body according to plasma treatment of the medical device for biological implantation. There is.
  • plasma surface treatment is possible while the product is packaged, which has the effect of preventing direct contact with external contamination or damage to the specially treated implant surface.
  • plasma surface treatment can be performed at a desired intensity at a desired location on the product, which has the effect of improving surface treatment quality as the surface treatment uniformity of products with various shapes is improved.
  • FIG. 1 is a front view of a surface treatment device for medical devices for biological implantation according to an embodiment of the present invention.
  • Figure 2 is a projected cross-sectional view of a surface treatment device for medical devices for living implants according to an embodiment of the present invention.
  • FIG. 3 is a power connection diagram of an electrode according to an embodiment of the present invention.
  • Figure 4 is a cross-sectional view of a packaging case according to an embodiment of the present invention.
  • Figure 5 is a plan view of the magnetic field generator according to an embodiment of the present invention.
  • FIGS 6 and 7 are plan schematic diagrams showing the operating principle of the magnetic field generator according to an embodiment of the present invention.
  • FIG. 1 shows a front view of a surface treatment apparatus 1000 (hereinafter referred to as “processing apparatus”) for a medical device for biological implantation according to an embodiment of the present invention.
  • the processing device 1000 accommodates a medical device for plasma processing and includes an inner packaging container 100 to prevent external contamination or surface damage to the medical device during transportation, distribution, and storage of the medical device, and an inner packaging container 100
  • a chamber unit 200 for accommodating the packaging container 100 and forming a vacuum inside the packaging container 100, supplying process gas, and generating plasma by charging the interior of the packaging container 100, and a chamber. It is provided on the outside of the unit 200 and includes a magnetic field generator 500 that generates a magnetic field and adjusts the plasma density by controlling the magnetic flux.
  • the inner packaging container 100 may have ventilation holes formed at both ends so that process gas is introduced, organic matter and impurities on the surface of the medical device are separated in a plasma state, and discharged through an exhaust or vacuum line.
  • Figure 2 shows a projected cross-sectional view of a processing device 1000 according to an embodiment of the present invention.
  • the chamber part 200 has a space formed inside to accommodate the inner packaging container 100, a chamber cylinder 210 with open upper and lower sides, and one side of the chamber cylinder 210 is sealed to form a chamber.
  • a first cover 220 equipped with a vacuum line 225 for forming a vacuum inside the cylinder 210, sealing the other side of the chamber cylinder 210, and supplying process gas into the chamber cylinder 210. It is configured to include a second cover 230 provided with a gas line 235.
  • the vacuum line 225 is shown as being provided on the first cover 220
  • the gas line 235 is shown as being provided on the second cover 230.
  • the vacuum line 225 is provided on the second cover 230.
  • the gas line 235 may be provided on the second cover 230.
  • the first cover 220 is configured to fix and support the upper side of the inner packaging container 100 through the bottom when coupled to the chamber cylinder 210
  • the second cover 230 is configured to secure and support the upper side of the inner packaging container 100 when coupled to the chamber cylinder 210. It is configured to fix and support the lower side of the inner packaging container 100.
  • the processing device 1000 includes a first electrode 310 provided along the circumference of the first cover 220 to charge the inside of the inner packaging container 100, and an electrode 310 formed along the circumference of the chamber cylinder 210. Includes 2 electrodes 320.
  • the second electrode 320 is formed in a ring shape surrounding the circumferential circumference of the chamber cylinder 210, and a plurality of second electrodes 320 may be spaced apart along the vertical direction of the chamber cylinder 210.
  • each second electrode 320 is configured to enable power on/off switching individually, so that the plasma surface treatment range can be determined according to the size or shape of the medical device.
  • Figure 3 shows a power connection diagram of a plurality of second electrodes 321, 322, 323, and 324 according to an embodiment of the present invention.
  • each of the second electrodes 321, 322, 323, and 324 has a switch S1, S2, S3, and S4, respectively. It can be provided. Therefore, it is configured to independently control the on and off of each switch (S1, S2, S3, and S4) to determine the plasma surface treatment range according to the size or shape of the medical device.
  • Figure 4 shows a cross-sectional view of an inner packaging container 100 for packaging according to an embodiment of the present invention.
  • the inner packaging container 100 has a space formed inside to accommodate and fix the medical device (S), a case cylinder 110 with the upper and lower sides open, and one side of the case cylinder 110 sealed.
  • the first case cover 120 which has a vacuum passage 125 for forming a vacuum inside the case cylinder 110, and the other side of the case cylinder 110 are sealed, and process gas is supplied into the case cylinder 110. It is configured to include a second case cover 130 on which a gas flow path 135 is formed.
  • the vacuum passage 125 is shown as being provided in the first case cover 120
  • the gas passage 135 is shown as being provided in the second case cover 130.
  • the vacuum passage 125 may be provided in the second case cover 130, and the gas passage 135 may be provided in the second case cover 130.
  • the vacuum passage 125 is in close contact with the upper side of the inner packaging container 100 at the lower end of the first cover 220 and communicates with the vacuum line 225 when the upper side of the inner packaging container 100 is fixed, and the gas passage 135 is
  • the lower end of the second cover 220 is configured to be in close contact with the lower side of the inner packaging container 100 and communicate with the gas line 235 when the lower side of the inner packaging container 100 is fixed.
  • the first case cover 120 is configured to fix and support the upper side of the medical device (S) through the bottom when coupled to the case cylinder 110
  • the second case cover 130 is configured to secure and support the upper side of the medical device (S) when coupled to the case cylinder 110. It is configured to fix and support the lower side of the medical device (S) through the top.
  • Figure 5 shows a plan view of the magnetic field generator 500 according to an embodiment of the present invention
  • Figures 6 and 7 show the operating principle of the magnetic field generator 500 according to an embodiment of the present invention.
  • a plan schematic diagram is shown.
  • the magnetic field generator 500 is provided to generate a magnetic field around the chamber 200 and control the magnetic flux around the chamber 200 to vary the plasma density at a specific location inside the chamber 200. Therefore, the magnetic field generator 500 may be a magnet or a solenoid.
  • the magnetic field generator 500 is formed in a ring shape with a predetermined thickness, and the inner diameter is formed to be larger than the outer diameter of the chamber 200, so that a space is formed along the radial direction between the chamber 200 and the magnetic field generator 500. It is configured to form this.
  • the magnetic field generator 500 is provided with a first moving means (not shown) so as to be movable along the longitudinal direction of the chamber 200, and is configured to vary the plasma density in the vertical direction of the inner packaging container 100. .
  • the magnetic field generator 500 is configured to rotate through the second moving means 550 so as to be able to rotate along the circumferential direction with respect to the center of the chamber 200.
  • the second moving means 550 is formed in a ring shape, accommodates the chamber 200 in the center, and is configured to rotate around the center (X1), which is the same as the center of the chamber 200.
  • the magnetic field generator 500 may be fixed to the second moving means 550, and its center (X2) may be arranged at a predetermined distance from the center (X1) of the second moving means (550).
  • the center (X2) of the magnetic field generator 500 and the center (X1) of the second moving means 550 are configured to be spaced apart so that the magnetic field generator 500 rotates eccentrically. Accordingly, when the magnetic field generator 500 rotates eccentrically, the point at which the inner diameter of the magnetic field generator 500 and the outer diameter of the chamber 200 are closest are configured to vary along the circumferential direction of the chamber 200. That is, as shown in FIG. 6, point A of the chamber 200 approaches the magnetic field generator 500 due to the eccentric rotation of the magnetic field generator 500, thereby increasing the plasma density at point A, and as shown in FIG. 7 As shown, point B of the chamber 200 may be configured to be close to the magnetic field generator 500 to increase the plasma density at point B.
  • the surface treatment uniformity of medical devices having various shapes is improved. This has the effect of improving the quality of plasma surface treatment of medical devices.
  • a medical device installation step (S10) is performed in which the inner packaging container 100 in which the medical device (S) is packaged is installed in the chamber 200.
  • the chamber 200 is sealed through the first or second covers 220 and 230, and a vacuum is applied inside the chamber 200 and the inner packaging container 100 through the vacuum line 225 and the vacuum passage 125.
  • a vacuum forming step (S20) is performed to form a .
  • a gas injection step (S30) is performed in which process gas is injected into the chamber 200 and the inner packaging container 100 through the gas line 235 and the gas flow path 135. .
  • a surface treatment step (S40) is performed in which plasma is generated by applying power to the first electrode and the second electrode while maintaining the process gas vacuum.
  • the surface treatment step (S40) is a process of removing impurities such as hydrocarbons and other organic substances from the surface of the medical device, a process of making the surface of the medical device hydrophilic by cleaning the surface so that bone bonding can proceed quickly when transplanting a living body, and a process of making the surface of the medical device hydrophilic when transplanting a living body.
  • a process can be performed to remove entotoxins that can cause exothermic reactions.
  • a plasma density variable step (S45) of controlling the plasma density by varying the surrounding magnetic flux, etc. may be performed.

Abstract

The present invention relates to a surface treatment device and a surface treatment method for removing foreign substances from the surface of a bioimplant medical device and, more specifically, to a surface treatment device and a surface treatment method for a bioimplant medical device, in which traces of viruses and germs remaining after the sterilization or disinfection of the bioimplant medical device are removed using plasma, and carbonized layers are removed from the surface.

Description

생체 이식용 의료기기의 표면 처리 장치 및 처리 방법Surface treatment device and treatment method for medical devices for bioimplantation
본 발명은 생체 이식용 의료기기의 표면 이물을 제거하기 위한 표면 처리 장치 및 방법에 관한 것으로, 더욱 상세하게는 플라즈마를 이용해 생체 이식용 의료기기의 살균 또는 멸균 후 잔존하는 바이러스 및 균의 흔적을 제거하고, 표면의 탄화층을 포함한 기타 유기물을 제거하는, 생체 이식용 의료기기 표면 처리 장치 및 처리 방법에 관한 것이다.The present invention relates to a surface treatment device and method for removing surface foreign substances from medical devices for biological implantation, and more specifically, to removing traces of viruses and bacteria remaining after sterilization or sterilization of medical devices for biological transplantation using plasma. It relates to a surface treatment device and treatment method for medical devices for bioimplantation, which removes other organic substances including carbonized layers on the surface.
플라즈마 상태의 높은 에너지 입자는 다양한 물질의 표면에 충돌하면서, 재료 표면에 에너지를 전달하며, 이러한 플라즈마는 물질 표면과 상호작용 시 다양한 물리/화학적 반응이 발생하기 때문에 다양한 표면처리가 가능한 특징을 갖는다.High-energy particles in the plasma state collide with the surface of various materials and transfer energy to the material surface. This plasma has the characteristic of enabling various surface treatments because various physical/chemical reactions occur when it interacts with the material surface.
일예로 각종 오염물질이 표면에 부착되지 않게 하거나 또는 쉽게 제거할 수 있는 방오 기능의 자가 정화 표면 처리기술, 임플란트와 골조직의 결합력을 높이는 표면 처리기술, 바이오 센서류나 전도성 잉크의 반도체 표면 패턴을 소형화하는 마이크로 패터닝 기술, 고분자 필름의 지문 방지 표면처리 기술 등 다양한 곳에서 플라즈마 표면처리 기술이 활용되고 있다. For example, self-purifying surface treatment technology with antifouling function that prevents various contaminants from attaching to the surface or easily removing them, surface treatment technology that increases the bonding strength between implants and bone tissue, and miniaturization of semiconductor surface patterns for biosensors or conductive inks. Plasma surface treatment technology is being used in a variety of places, including micro-patterning technology and anti-fingerprint surface treatment technology for polymer films.
특히 픽스쳐와 같은 생체 이식용 의료기기은, 인체에 이식 시 골 융합에 오랜 시간이 소요되기 때문에 생산단계에서 플라즈마 처리 공정을 통해 표면의 불순물을 제거하여 생체 안정화 시간을 줄이거나 치료속도를 빠르게 한 기술이 공지된 바 있다.In particular, bioimplantable medical devices such as fixtures take a long time for bone fusion when implanted in the human body, so technology is needed to reduce biostabilization time or speed up treatment by removing surface impurities through a plasma treatment process during the production stage. It has been announced.
그러나 생산, 운송, 유통, 보관 과정에서 시간이 지날수록 생체 이식용 의료기기의 표면에 불순물이 형성 등의 이유로 표면이 소수성으로 경시변화하기 때문에 생체 친화성을 유지함에 어려움이 있다.However, as time passes during production, transportation, distribution, and storage, impurities are formed on the surface of bioimplantable medical devices, making the surface change to hydrophobic over time, making it difficult to maintain biocompatibility.
이를 해결하기 위해 임플란트 시술 전에 픽스쳐의 표면처리를 시도하여 생체 친화성을 확보하려는 기술이 개발되고 있다. 플라즈마 표면처리나, 자외선을 조사하여 친수성 및 골 융합 효율을 향상시킬 수 있는 기술이 대표적이다. To solve this problem, technology is being developed to secure biocompatibility by treating the surface of the fixture before implant surgery. Representative technologies include plasma surface treatment and ultraviolet ray irradiation to improve hydrophilicity and bone fusion efficiency.
그러나 인체에 삽입되는 의료기기의 경우 무균성에 대한 보증이 요구되나, 플라즈마 표면처리나 자외선 조사 등을 위해 픽스쳐의 무균 포장을 제거하고, 외부에서 처리 또는 픽스쳐를 포장에서 분리하여 처리하는 방법의 경우 무균성 보증이 불가하고, 픽스쳐가 오염될 수 있는 문제가 추가적으로 발생한다. However, in the case of medical devices inserted into the human body, a guarantee of sterility is required, but in the case of removing the sterile packaging of the fixture for plasma surface treatment or ultraviolet irradiation, and processing it externally or separating the fixture from the packaging, sterility is required. Performance is not guaranteed, and additional problems such as fixture contamination may occur.
다른 예로 자외선 투과율이 높은 석영유리를 케이스로 사용하여 포장을 제거하지 않고 자외선을 조사하는 기술도 공지된 바 있으나, 석영유리로 인해 비용이 증가하는 문제가 발생한다.As another example, a technology has been known to irradiate ultraviolet rays without removing the packaging by using quartz glass, which has a high ultraviolet transmittance, as a case, but the use of quartz glass causes an increase in cost.
본 발명은 상기와 같은 문제점을 해결하기 위하여 안출된 것으로서 본 발명의 목적은, 플라즈마 표면 처리를 통해 생체 이식용 의료기기의 살균 또는 멸균 후 잔존하는 바이러스 및 균의 흔적(죽은 상태의 바이러스나, 균)을 제거하고, 표면의 탄화층을 포함한 기타 유기물을 제거하는, 생체 이식용 의료기기 표면 처리 장치 및 처리 방법을 제공함에 있다. The present invention was created to solve the above problems, and the purpose of the present invention is to remove traces of viruses and bacteria (dead viruses or bacteria) remaining after sterilization or sterilization of bioimplantable medical devices through plasma surface treatment. ) and remove other organic substances, including carbonized layers on the surface, to provide a surface treatment device and treatment method for medical devices for bioimplantation.
또한, 의료기기의 표면보호를 위해 제품이 내포장된 상태에서 플라즈마 표면 처리가 가능하도록 한 생체 이식용 의료기기 표면 처리 장치 및 처리 방법을 제공함에 있다. In addition, to protect the surface of the medical device, the present invention provides a surface treatment device and method for medical devices for bioimplantation that enable plasma surface treatment while the product is packaged.
또한, 전극의 위치 가변 또는 외부 자기장 발생 수단과 제어 수단을 통해 자기장의 위치 제어 또는 두가지 공정을 병행하여 원하는 위치에 원하는 강도로 플라즈마 표면처리가 가능하도록 한 생체 이식용 의료기기 표면 처리 장치 및 처리 방법을 제공함에 있다. In addition, a surface treatment device and treatment method for medical devices for bioimplants that enable plasma surface treatment at a desired location and with a desired intensity by varying the position of the electrode or controlling the position of the magnetic field through an external magnetic field generation means and control means, or by combining the two processes. In providing.
본 발명의 일실시 예에 따른 생체 이식용 의료기기 표면 처리 장치는, 플라즈마 표면 처리를 위한 의료기기가 수용되는 케이스; 상기 케이스가 수용되는 챔버부; 전원 인가를 통해 상기 챔버부 내부를 대전시키 위해 상기 챔버부에 구비되는 전극부; 상기 케이스 내부에 진공을 형성하기 위해 상기 케이스에 형성된 진공유로와, 상기 챔버에 구비되되 일단이 진공압 형성 수단에 연결되고, 타단이 상기 진공유로에 연통되는 진공라인; 및 상기 케이스 내부에 프로세스 개스를 주입하기 위해 상기 케이스에 형성된 가스유로와, 상기 챔버에 구비되되 일단이 가스 공급 수단에 연결되고, 타단이 상기 가스유로에 연통되는 가스라인을 포함한다. An apparatus for treating the surface of a medical device for biological implantation according to an embodiment of the present invention includes a case in which a medical device for plasma surface treatment is accommodated; a chamber portion in which the case is accommodated; an electrode unit provided in the chamber unit to charge the inside of the chamber unit by applying power; a vacuum passage formed in the case to form a vacuum inside the case, and a vacuum line provided in the chamber, one end of which is connected to a vacuum pressure forming means, and the other end of which communicates with the vacuum passage; and a gas passage formed in the case for injecting a process gas into the case, and a gas line provided in the chamber, one end of which is connected to a gas supply means, and the other end of which communicates with the gas passage.
또한, 상기 챔버부는, 상기 내포장 용기(100)이 수용되도록 내부에 공간이 형성되고, 상측과 하측이 개방 형성된 챔버실린더(210); 상기 챔버실린더(210)의 일측을 밀폐하며 챔버실린더(210) 내부의 진공 형성을 위한 진공라인(225)이 구비된 제1 커버(220); 및 상기 챔버실린더(210)의 타측을 밀폐하며, 챔버실린더(210) 내부로 프로세스 개스를 공급하기 위한 가스라인(235)이 구비된 제2 커버(230)를 포함한다. In addition, the chamber unit includes a chamber cylinder 210 having an open upper and lower sides with a space formed therein to accommodate the inner packaging container 100; A first cover 220 that seals one side of the chamber cylinder 210 and is provided with a vacuum line 225 for forming a vacuum inside the chamber cylinder 210; and a second cover 230 that seals the other side of the chamber cylinder 210 and is provided with a gas line 235 for supplying process gas into the chamber cylinder 210.
또한, 제1 커버(220)는 챔버실린더(210)에 결합 시 하단을 통해 내포장 용기(100)의 상측을 고정 및 지지하도록 구성되며, 제2 커버(230)는 챔버실린더(210)에 결합 시 상단을 통해 내포장 용기(100)의 하측을 고정 및 지지하도록 구성된다. In addition, the first cover 220 is configured to fix and support the upper side of the inner packaging container 100 through the bottom when coupled to the chamber cylinder 210, and the second cover 230 is coupled to the chamber cylinder 210. It is configured to fix and support the lower side of the inner packaging container 100 through the upper end.
또한, 상기 전극부는, 링 형으로 상기 제1 커버의 둘레를 따라 구비되는 제1 전극, 또는, 링 형으로 상기 챔버실린더(210)의 원주 방향 둘레를 따라 구비되는 제2 전극, 또는 상기 제1 전극과 제2 전극을 모두 포함한다.In addition, the electrode unit may be a first electrode provided in a ring shape along the circumference of the first cover, or a second electrode provided in a ring shape along the circumference of the chamber cylinder 210, or the first electrode. It includes both an electrode and a second electrode.
또한, 상기 제2 전극은, 복수 개가 상기 챔버실린더(210)의 상하 길이 방향을 따라 이격 배치되고, 각각의 제2 전극(320)은 개별적으로 전원 온오프 스위칭이 가능하도록 구성된다. In addition, a plurality of second electrodes are arranged to be spaced apart along the vertical direction of the chamber cylinder 210, and each second electrode 320 is configured to enable power on/off switching individually.
또한, 상기 케이스는, 상기 의료기기(S)이 수용 및 고정되도록 내부에 공간이 형성되고, 상측과 하측이 개방 형성된 케이스실린더(110); 상기 케이스실린더(110)의 일측을 밀폐하며 케이스실린더(110) 내부의 진공 형성을 위한 진공유로(125)가 형성된 제1 케이스커버(120); 상기 케이스실린더(110)의 타측을 밀폐하며, 케이스실린더(110) 내부로 프로세스 개스를 공급하기 위한 가스유로(135)가 형성된 제2 케이스커버(130)를 포함하고, 상기 진공유로(125)는 상기 제1 커버(220)의 하단이 내포장 용기(100) 상측에 밀착되어 내포장 용기(100)의 상측 고정 시 진공라인(225)과 연통되고, 상기 가스유로(135)는 상기 제2 커버(220)의 하단이 내포장 용기(100) 하측에 밀착되어 내포장 용기(100)의 하측 고정 시 가스라인(235)과 연통된다. In addition, the case includes a case cylinder 110 with an open upper and lower side and a space formed therein to accommodate and fix the medical device S; A first case cover 120 that seals one side of the case cylinder 110 and has a vacuum passage 125 for forming a vacuum inside the case cylinder 110; It includes a second case cover 130 that seals the other side of the case cylinder 110 and has a gas passage 135 for supplying process gas into the case cylinder 110, and the vacuum passage 125 is The lower end of the first cover 220 is in close contact with the upper side of the inner packaging container 100 and communicates with the vacuum line 225 when the upper side of the inner packaging container 100 is fixed, and the gas flow path 135 is connected to the second cover. The lower end of 220 is in close contact with the lower side of the inner packaging container 100 and communicates with the gas line 235 when the lower side of the inner packaging container 100 is fixed.
또한, 상기 표면 처리 장치는, 상기 챔버(200)의 주변에 자기장을 발생시키고, 챔버(200) 주변의 자속을 제어하여 챔버(200) 내부 특정 위치에서 플라즈마 밀도를 가변시키기 위한 자기장발생부(500)를 포함한다.In addition, the surface treatment device includes a magnetic field generator 500 for generating a magnetic field around the chamber 200 and controlling the magnetic flux around the chamber 200 to vary the plasma density at a specific location inside the chamber 200. ) includes.
또한, 상기 자기장발생부(500)는, 소정의 두께를 갖는 링 형으로 이루어지며, 내경이 챔버(200)의 외경보다 크게 형성되어 챔버(200)와 자기장발생부(500) 사이에 반경 방향을 따라 이격 공간이 형성되도록 구성되되, 상기 자기장발생부(500)는, 상기 챔버(200)의 길이 방향을 따라 이동 가능하도록 제1 이동수단을 구비하여 내포장 용기(100)의 상하 방향 플라즈마 밀도를 가변시킬 수 있도록 구성된다. In addition, the magnetic field generator 500 is formed in a ring shape with a predetermined thickness, and has an inner diameter larger than the outer diameter of the chamber 200, so that it forms a radial direction between the chamber 200 and the magnetic field generator 500. It is configured to form a separation space along the magnetic field generator 500, and is provided with a first moving means to be able to move along the longitudinal direction of the chamber 200 to increase the plasma density in the vertical direction of the inner packaging container 100. It is configured to be variable.
또한, 상기 자기장발생부(500)는, 상기 챔버(200)의 중심을 기준으로 원주 방향을 따라 회전하는 제2 이동수단을 통해 회전하도록 구성되되, 상기 자기장발생부(500)의 중심과, 상기 제2 이동수단의 중심이 이격되도록 구성되어 상기 자기장발생부(500)가 편심 회전하도록 구성된다. In addition, the magnetic field generator 500 is configured to rotate through a second moving means that rotates along the circumferential direction with respect to the center of the chamber 200, and the center of the magnetic field generator 500 and the The centers of the second moving means are configured to be spaced apart so that the magnetic field generator 500 rotates eccentrically.
본 발명의 일실시 예에 따른 생체 이식용 의료기기 표면 처리 장치를 이용한 표면 처리 방법은, 의료기기(S)이 포장된 내포장 용기(100)을 챔버(200)에 설치하는 의료기기 설치단계(S10); 상기 챔버(200)를 제1 또는 제2 커버(220, 230)를 통해 밀폐하고, 진공라인(225) 및 진공유로(125)를 통해 챔버(200) 및 내포장 용기(100) 내부에 진공을 형성하는 진공 형성 단계(S20); 가스라인(235) 및 가스유로(135)를 통해 챔버(200) 및 내포장 용기(100) 내부에 프로세스 개스를 주입하는 가스 주입 단계(S30); 제1 전극 및 제2 전극에 전원을 인가하여 플라즈마를 발생시키는 표면 처리 단계(S40); 전원을 오프 하여 플라즈마 발생을 중지시키는 단계(S50); 챔버(200) 내부의 진공을 해제하는 단계(S60); 및 챔버부(200)를 개방하여 내포장 용기(100)에 수용된 의료기기(S)을 회수하는 단계(S70)를 포함한다. The surface treatment method using a surface treatment device for medical device for biological implantation according to an embodiment of the present invention includes the medical device installation step of installing the inner packaging container 100 in which the medical device (S) is packaged in the chamber 200 ( S10); The chamber 200 is sealed through the first or second covers 220 and 230, and a vacuum is applied inside the chamber 200 and the inner packaging container 100 through the vacuum line 225 and the vacuum passage 125. forming a vacuum (S20); A gas injection step (S30) of injecting a process gas into the chamber 200 and the inner packaging container 100 through the gas line 235 and the gas flow path 135; A surface treatment step (S40) of generating plasma by applying power to the first electrode and the second electrode; Turning off the power to stop plasma generation (S50); releasing the vacuum inside the chamber 200 (S60); and a step (S70) of opening the chamber portion 200 to retrieve the medical device S accommodated in the inner packaging container 100.
아울러, 상기 표면 처리 단계(S40)는, 챔버(400) 내부의 진공도 가변, 프로세스 가스의 투입량 조절을 통해 공정 압력이나 종류를 변경하고, 플라즈마 발생을 위한 전원 전압 조절, 전원 주파수 및 전극의 형상을 조절하고, 챔버(400) 주변의 자속 가변 등을 통해 플라즈마 밀도를 제어하는 플라즈마 밀도 가변 단계(S45)를 더 포함한다.In addition, the surface treatment step (S40) changes the process pressure or type by varying the vacuum level inside the chamber 400 and adjusting the input amount of process gas, adjusting the power supply voltage for plasma generation, and adjusting the power frequency and shape of the electrode. It further includes a plasma density variable step (S45) of controlling the plasma density by adjusting and varying the magnetic flux around the chamber 400.
상기와 같은 구성에 의한 본 발명의 생체 이식용 의료기기 표면 처리 장치 및 처리 방법은, 생체 이식용 의료기기의 플라즈마 처리에 따라 의료기기의 생체 이식 시 생체 안정화 시간을 줄이고, 치료 속도를 빠르게 한 효과가 있다. The surface treatment device and treatment method for a medical device for biological implantation of the present invention according to the above configuration have the effect of reducing the biostabilization time and speeding up the treatment speed when implanting a medical device into a living body according to plasma treatment of the medical device for biological implantation. There is.
또한, 제품이 내포장된 상태에서 플라즈마 표면 처리가 가능하여 외부오염에 직접적으로 접촉하거나, 특수 표면 처리된 임플란트 표면이 손상되는 것을 방지한 효과가 있다. In addition, plasma surface treatment is possible while the product is packaged, which has the effect of preventing direct contact with external contamination or damage to the specially treated implant surface.
또한, 의료기기의 전처리, 멸균공정에서 표면에 잔존하는 바이러스나 균의 사체 또는 과정에서 발생한 엔토톡신 및 기타 유기물을 제거하여 의료기기의 생체 이식 시 피부, 혈액 또는 골조직의 염증을 방지한 효과가 있다. In addition, it is effective in preventing inflammation of the skin, blood, or bone tissue when implanting a medical device into a living body by removing dead bodies of viruses or bacteria remaining on the surface during the pretreatment and sterilization process of medical devices, or entotoxins and other organic substances generated during the process. .
또한, 제품의 원하는 위치에 원하는 강도로 플라즈마 표면 처리가 가능하여 다양한 형상을 갖는 제품의 표면 처리 균일도가 향상됨에 따라 표면 처리 품질을 향상시킬 수 있는 효과가 있다.In addition, plasma surface treatment can be performed at a desired intensity at a desired location on the product, which has the effect of improving surface treatment quality as the surface treatment uniformity of products with various shapes is improved.
도 1은 본 발명의 일실시 예에 따른 생체 이식용 의료기기 표면 처리 장치의 정면도1 is a front view of a surface treatment device for medical devices for biological implantation according to an embodiment of the present invention.
도 2는 본 발명의 일실시 예에 따른 생체 이식용 의료기기 표면 처리 장치의 투영 단면도Figure 2 is a projected cross-sectional view of a surface treatment device for medical devices for living implants according to an embodiment of the present invention.
도 3은 본 발명의 일실시 예에 따른 전극의 전원 연결도3 is a power connection diagram of an electrode according to an embodiment of the present invention.
도 4는 본 발명의 일실시 예에 따른 포장용 케이스의 단면도Figure 4 is a cross-sectional view of a packaging case according to an embodiment of the present invention.
도 5는 본 발명의 일실시 예에 따른 자기장발생부의 평면도Figure 5 is a plan view of the magnetic field generator according to an embodiment of the present invention.
도 6 및 도 7은 본 발명의 일실시 예에 따른 자기장발생부의 작동원리를 나타낸 평면 개략도Figures 6 and 7 are plan schematic diagrams showing the operating principle of the magnetic field generator according to an embodiment of the present invention.
<부호의 설명><Explanation of symbols>
1000 : 생체 이식용 의료기기 표면 처리 장치1000: Medical device surface treatment device for bioimplantation
100 : 케이스100: case
110 : 케이스 실린더110: case cylinder
120 : 제1 케이스커버120: 1st case cover
125 : 진공유로125: Vacuum passage
130 : 제2 케이스커버130: 2nd case cover
135 : 가스유로135: Gas flow path
200 : 챔버부200: Chamber part
210 : 챔버실린더210: Chamber cylinder
220 : 제1 커버220: first cover
225 : 진공라인225: Vacuum line
230 : 제2 커버230: second cover
235 : 가스라인235: gas line
310 : 제1 전극310: first electrode
320 : 제2 전극320: second electrode
500 : 자기장발생부500: Magnetic field generator
S : 의료기기S: Medical device
이하, 상기와 같은 본 발명의 일실시예에 대하여 도면을 참조하여 상세히 설명한다.Hereinafter, an embodiment of the present invention described above will be described in detail with reference to the drawings.
도 1에는 본 발명의 일실시 예에 따른 생체 이식용 의료기기 표면 처리 장치(1000)(이하 ‘처리 장치’)의 정면도가 도시되어 있다. 도시된 바와 같이 처리 장치(1000)는 플라즈마 처리를 위한 의료기기가 수용되며 의료기기의 운송, 유통 및 보관 시 의료기기의 외부 오염이나, 표면 손상을 방지하기 위한 내포장 용기(100)와, 내포장 용기(100)가 수용되며 내포장 용기(100) 내부에 진공을 형성하거나, 프로세스 가스를 공급하고, 내포장 용기(100) 내부를 대전시켜 플라즈마를 발생시키기 위한 챔버부(200)와, 챔버부(200)의 외측에 구비되며 자기장을 발생시켜 자속 제어에 의해 플라즈마 밀도를 조절하는 자기장발생부(500)를 포함한다. 내포장 용기(100)는, 프로세스 가스가 투입되고, 플라즈마 상태에서 유기물 및 의료기기 표면의 불순물을 분리하여 배기 또는 진공라인으로 배출가능하도록 양단에 통기구가 형성될 수 있다. Figure 1 shows a front view of a surface treatment apparatus 1000 (hereinafter referred to as “processing apparatus”) for a medical device for biological implantation according to an embodiment of the present invention. As shown, the processing device 1000 accommodates a medical device for plasma processing and includes an inner packaging container 100 to prevent external contamination or surface damage to the medical device during transportation, distribution, and storage of the medical device, and an inner packaging container 100 A chamber unit 200 for accommodating the packaging container 100 and forming a vacuum inside the packaging container 100, supplying process gas, and generating plasma by charging the interior of the packaging container 100, and a chamber. It is provided on the outside of the unit 200 and includes a magnetic field generator 500 that generates a magnetic field and adjusts the plasma density by controlling the magnetic flux. The inner packaging container 100 may have ventilation holes formed at both ends so that process gas is introduced, organic matter and impurities on the surface of the medical device are separated in a plasma state, and discharged through an exhaust or vacuum line.
도 2에는 본 발명의 일실시 예에 따른 처리 장치(1000)의 투영 단면도가 도시되어 있다. 도시된 바와 같이 챔버부(200)는 내포장 용기(100)이 수용되도록 내부에 공간이 형성되고, 상측과 하측이 개방 형성된 챔버실린더(210)와, 챔버실린더(210)의 일측을 밀폐하며 챔버실린더(210) 내부의 진공 형성을 위한 진공라인(225)이 구비된 제1 커버(220)와, 챔버실린더(210)의 타측을 밀폐하며, 챔버실린더(210) 내부로 프로세스 가스를 공급하기 위한 가스라인(235)이 구비된 제2 커버(230)를 포함하여 구성된다. 도면상에는 진공라인(225)이 제1 커버(220)에 구비되고, 가스라인(235)이 제2 커버(230)에 구비되는 것으로 도시되어 있으나, 진공라인(225)이 제2 커버(230)에 구비되고, 가스라인(235)이 제2 커버(230)에 구비될 수도 있다. 제1 커버(220)는 챔버실린더(210)에 결합 시 하단을 통해 내포장 용기(100)의 상측을 고정 및 지지하도록 구성되며, 제2 커버(230)는 챔버실린더(210)에 결합 시 상단을 통해 내포장 용기(100)의 하측을 고정 및 지지하도록 구성된다. Figure 2 shows a projected cross-sectional view of a processing device 1000 according to an embodiment of the present invention. As shown, the chamber part 200 has a space formed inside to accommodate the inner packaging container 100, a chamber cylinder 210 with open upper and lower sides, and one side of the chamber cylinder 210 is sealed to form a chamber. A first cover 220 equipped with a vacuum line 225 for forming a vacuum inside the cylinder 210, sealing the other side of the chamber cylinder 210, and supplying process gas into the chamber cylinder 210. It is configured to include a second cover 230 provided with a gas line 235. In the drawing, the vacuum line 225 is shown as being provided on the first cover 220, and the gas line 235 is shown as being provided on the second cover 230. However, the vacuum line 225 is provided on the second cover 230. and the gas line 235 may be provided on the second cover 230. The first cover 220 is configured to fix and support the upper side of the inner packaging container 100 through the bottom when coupled to the chamber cylinder 210, and the second cover 230 is configured to secure and support the upper side of the inner packaging container 100 when coupled to the chamber cylinder 210. It is configured to fix and support the lower side of the inner packaging container 100.
또한, 처리 장치(1000)는 내포장 용기(100) 내부를 대전시키기 위해 제1 커버(220)의 둘레를 따라 구비되는 제1 전극(310)과, 챔버실린더(210)의 둘레를 따라 형성된 제2 전극(320)을 포함한다. 이때 제2 전극(320)은 챔버실린더(210)의 원주 방향 둘레를 감싸는 형태의 링 형으로 이루어지며, 복수 개가 챔버실린더(210)의 상하 길이 방향을 따라 이격 배치될 수 있다. 또한 각각의 제2 전극(320)은 개별적으로 전원 온오프 스위칭이 가능하도록 구성되어 의료기기의 크기나 형상에 따라 플라즈마 표면 처리 범위를 결정할 수 있도록 구성된다. In addition, the processing device 1000 includes a first electrode 310 provided along the circumference of the first cover 220 to charge the inside of the inner packaging container 100, and an electrode 310 formed along the circumference of the chamber cylinder 210. Includes 2 electrodes 320. At this time, the second electrode 320 is formed in a ring shape surrounding the circumferential circumference of the chamber cylinder 210, and a plurality of second electrodes 320 may be spaced apart along the vertical direction of the chamber cylinder 210. Additionally, each second electrode 320 is configured to enable power on/off switching individually, so that the plasma surface treatment range can be determined according to the size or shape of the medical device.
도 3에는, 본 발명의 일실시 예에 따른 복수 개의 제2 전극(321, 322, 323, 324)의 전원 연결도가 도시되어 있다. Figure 3 shows a power connection diagram of a plurality of second electrodes 321, 322, 323, and 324 according to an embodiment of the present invention.
도시된 바와 같이 복수 개의 제2 전극(321, 322, 323, 324)은 병렬로 연결되며, 제2 전극(321, 322, 323, 324) 각각에는 스위치(S1, S2, S3, S4)가 각각 구비될 수 있다. 따라서 각각의 스위치(S1, S2, S3, S4)의 온오프를 독립적으로 제어하여 의료기기의 크기나 형상에 따라 플라즈마 표면 처리 범위를 결정할 수 있도록 구성된다.As shown, a plurality of second electrodes 321, 322, 323, and 324 are connected in parallel, and each of the second electrodes 321, 322, 323, and 324 has a switch S1, S2, S3, and S4, respectively. It can be provided. Therefore, it is configured to independently control the on and off of each switch (S1, S2, S3, and S4) to determine the plasma surface treatment range according to the size or shape of the medical device.
도 4에는, 본 발명의 일실시 예에 따른 포장용 내포장 용기(100)의 단면도가 도시되어 있다. 도시된 바와 같이 내포장 용기(100)은 의료기기(S)이 수용 및 고정되도록 내부에 공간이 형성되고, 상측과 하측이 개방 형성된 케이스실린더(110)와, 케이스실린더(110)의 일측을 밀폐하며 케이스실린더(110) 내부의 진공 형성을 위한 진공유로(125)가 형성된 제1 케이스커버(120)와, 케이스실린더(110)의 타측을 밀폐하며, 케이스실린더(110) 내부로 프로세스 가스를 공급하기 위한 가스유로(135)가 형성된 제2 케이스커버(130)를 포함하여 구성된다. 도면상에는 진공유로(125)가 제1 케이스커버(120)에 구비되고, 가스유로(135)가 제2 케이스커버(130)에 구비되는 것으로 도시되어 있으나, 진공라인(225) 및 가스라인(235)의 배치에 따라 진공유로(125)가 제2 케이스커버(130)에 구비되고, 가스유로(135)가 제2 케이스커버(130)에 구비될 수도 있다. 진공유로(125)는 제1 커버(220)의 하단이 내포장 용기(100) 상측에 밀착되어 내포장 용기(100)의 상측 고정 시 진공라인(225)과 연통되고, 가스유로(135)는 제2 커버(220)의 하단이 내포장 용기(100) 하측에 밀착되어 내포장 용기(100)의 하측 고정 시 가스라인(235)과 연통되도록 구성된다. Figure 4 shows a cross-sectional view of an inner packaging container 100 for packaging according to an embodiment of the present invention. As shown, the inner packaging container 100 has a space formed inside to accommodate and fix the medical device (S), a case cylinder 110 with the upper and lower sides open, and one side of the case cylinder 110 sealed. The first case cover 120, which has a vacuum passage 125 for forming a vacuum inside the case cylinder 110, and the other side of the case cylinder 110 are sealed, and process gas is supplied into the case cylinder 110. It is configured to include a second case cover 130 on which a gas flow path 135 is formed. In the drawing, the vacuum passage 125 is shown as being provided in the first case cover 120, and the gas passage 135 is shown as being provided in the second case cover 130. However, the vacuum line 225 and the gas line 235 ) Depending on the arrangement, the vacuum passage 125 may be provided in the second case cover 130, and the gas passage 135 may be provided in the second case cover 130. The vacuum passage 125 is in close contact with the upper side of the inner packaging container 100 at the lower end of the first cover 220 and communicates with the vacuum line 225 when the upper side of the inner packaging container 100 is fixed, and the gas passage 135 is The lower end of the second cover 220 is configured to be in close contact with the lower side of the inner packaging container 100 and communicate with the gas line 235 when the lower side of the inner packaging container 100 is fixed.
제1 케이스커버(120)는 케이스실린더(110)에 결합 시 하단을 통해 의료기기(S)의 상측을 고정 및 지지하도록 구성되며, 제2 케이스커버(130)는 케이스실린더(110)에 결합 시 상단을 통해 의료기기(S)의 하측을 고정 및 지지하도록 구성된다. The first case cover 120 is configured to fix and support the upper side of the medical device (S) through the bottom when coupled to the case cylinder 110, and the second case cover 130 is configured to secure and support the upper side of the medical device (S) when coupled to the case cylinder 110. It is configured to fix and support the lower side of the medical device (S) through the top.
도 5에는, 본 발명의 일실시 예에 따른 자기장발생부(500)의 평면도가 도시되어 있고, 도 6 및 도 7에는 본 발명의 일실시 예에 따른 자기장발생부(500)의 작동원리를 나타낸 평면 개략도가 도시되어 있다. Figure 5 shows a plan view of the magnetic field generator 500 according to an embodiment of the present invention, and Figures 6 and 7 show the operating principle of the magnetic field generator 500 according to an embodiment of the present invention. A plan schematic diagram is shown.
자기장발생부(500)는 챔버(200)의 주변에 자기장을 발생시키고, 챔버(200) 주변의 자속을 제어하여 챔버(200) 내부 특정 위치에서 플라즈마 밀도를 가변시키기 위해 구비된다. 따라서 자기장발생부(500)는 마그넷 또는 솔레노이드 일 수 있다. 또한 자기장발생부(500)는 소정의 두께를 갖는 링 형으로 이루어지며, 내경이 챔버(200)의 외경보다 크게 형성되어 챔버(200)와 자기장발생부(500) 사이에 반경 방향을 따라 이격 공간이 형성되도록 구성된다. 또한, 자기장발생부(500)는 챔버(200)의 길이 방향을 따라 이동 가능하도록 제1 이동수단(미도시)을 구비하여 내포장 용기(100)의 상하 방향 플라즈마 밀도를 가변시킬 수 있도록 구성된다. 또한 자기장발생부(500)는 챔버(200)의 중심을 기준으로 원주 방향을 따라 회전가능하도록 제2 이동수단(550)을 통해 회전하도록 구성된다. The magnetic field generator 500 is provided to generate a magnetic field around the chamber 200 and control the magnetic flux around the chamber 200 to vary the plasma density at a specific location inside the chamber 200. Therefore, the magnetic field generator 500 may be a magnet or a solenoid. In addition, the magnetic field generator 500 is formed in a ring shape with a predetermined thickness, and the inner diameter is formed to be larger than the outer diameter of the chamber 200, so that a space is formed along the radial direction between the chamber 200 and the magnetic field generator 500. It is configured to form this. In addition, the magnetic field generator 500 is provided with a first moving means (not shown) so as to be movable along the longitudinal direction of the chamber 200, and is configured to vary the plasma density in the vertical direction of the inner packaging container 100. . In addition, the magnetic field generator 500 is configured to rotate through the second moving means 550 so as to be able to rotate along the circumferential direction with respect to the center of the chamber 200.
이때 제2 이동수단(550)은 링 형으로 이루어지며, 중앙에 챔버(200)가 수용되고, 챔버(200)의 중심과 동일한 중심(X1)을 축으로 하여 회전 가능하도록 구성된다. 자기장발생부(500)는 제2 이동수단(550)에 고정되되, 중심(X2)이 제2 이동수단(550)의 중심(X1)과 소정거리 이격되어 배치될 수 있다. At this time, the second moving means 550 is formed in a ring shape, accommodates the chamber 200 in the center, and is configured to rotate around the center (X1), which is the same as the center of the chamber 200. The magnetic field generator 500 may be fixed to the second moving means 550, and its center (X2) may be arranged at a predetermined distance from the center (X1) of the second moving means (550).
즉 자기장발생부(500)의 중심(X2)과, 제2 이동수단(550)의 중심(X1)이 이격되도록 구성되어 자기장발생부(500)가 편심 회전하도록 구성된다. 이에 따라 자기장발생부(500)의 편심 회전 시 자기장발생부(500)의 내경과 챔버(200)의 외경이 가장 가까운 지점이 챔버(200)의 원주 방향을 따라 가변되도록 구성된다. 즉 도 6에 도시된 바와 같이 자기장발생부(500)의 편심 회전에 의해 챔버(200)의 A 지점이 자기장발생부(500)와 근접하여 A 지점의 플라즈마 밀도를 증가시키고, 도 7에 도시된 바와 같이 챔버(200)의 B 지점이 자기장발생부(500)와 근접되도록 하여 B 지점의 플라즈마 밀도를 증가시키도록 구성될 수 있다.That is, the center (X2) of the magnetic field generator 500 and the center (X1) of the second moving means 550 are configured to be spaced apart so that the magnetic field generator 500 rotates eccentrically. Accordingly, when the magnetic field generator 500 rotates eccentrically, the point at which the inner diameter of the magnetic field generator 500 and the outer diameter of the chamber 200 are closest are configured to vary along the circumferential direction of the chamber 200. That is, as shown in FIG. 6, point A of the chamber 200 approaches the magnetic field generator 500 due to the eccentric rotation of the magnetic field generator 500, thereby increasing the plasma density at point A, and as shown in FIG. 7 As shown, point B of the chamber 200 may be configured to be close to the magnetic field generator 500 to increase the plasma density at point B.
상기와 같은 자기장발생부(500)와 제1 및 제2 이동수단을 통해 내포장 용기(100) 내부 특정 위치의 플라즈마 밀도를 증가시킬 수 있도록 구성됨에 따라 다양한 형상을 갖는 의료기기의 표면 처리 균일도가 향상되고, 나아가 의료기기의 플라즈마 표면 처리 품질을 향상시킬 수 있는 효과가 있다.As it is configured to increase the plasma density at a specific location inside the inner packaging container 100 through the magnetic field generator 500 and the first and second moving means as described above, the surface treatment uniformity of medical devices having various shapes is improved. This has the effect of improving the quality of plasma surface treatment of medical devices.
이하에서는 상기와 같이 구성된 본 발명의 일실시 예에 따른 처리 장치(1000)를 이용한 생체 이식용 의료기기 표면 처리 방법에 대하여 설명한다.Hereinafter, a method of treating the surface of a medical device for biological implantation using the processing device 1000 according to an embodiment of the present invention configured as described above will be described.
우선 의료기기(S)이 포장된 내포장 용기(100)을 챔버(200)에 설치하는 의료기기 설치단계(S10)를 수행한다. First, a medical device installation step (S10) is performed in which the inner packaging container 100 in which the medical device (S) is packaged is installed in the chamber 200.
다음으로 챔버(200)를 제1 또는 제2 커버(220, 230)를 통해 밀폐하고, 진공라인(225) 및 진공유로(125)를 통해 챔버(200) 및 내포장 용기(100) 내부에 진공을 형성하는 진공 형성 단계(S20)를 수행한다. Next, the chamber 200 is sealed through the first or second covers 220 and 230, and a vacuum is applied inside the chamber 200 and the inner packaging container 100 through the vacuum line 225 and the vacuum passage 125. A vacuum forming step (S20) is performed to form a .
다음으로 설정된 진공도에 도달하는 지 확인 후 가스라인(235) 및 가스유로(135)를 통해 챔버(200) 및 내포장 용기(100) 내부에 프로세스 개스를 주입하는 가스 주입 단계(S30)를 수행한다. Next, after confirming that the set vacuum degree is reached, a gas injection step (S30) is performed in which process gas is injected into the chamber 200 and the inner packaging container 100 through the gas line 235 and the gas flow path 135. .
다음으로 프로세스 가스 진공도를 유지한 상태에서 제1 전극 및 제2 전극에 전원을 인가하여 플라즈마를 발생시키는 표면 처리 단계(S40)를 수행한다. 표면 처리 단계(S40)에서는 의료기기 표면의 탄화수소 및 기타 유기물 등의 불순물을 제거하는 공정, 생체 이식 시 골 접합이 빠르게 진행될 수 있도록 표면을 세정하여 의료기기 표면이 친수성을 갖도록 하는 공정 및 생체 이식 시 발열반응을 일으킬 수 있는 엔토톡신을 제거하는 공정이 수행될 수 있다.Next, a surface treatment step (S40) is performed in which plasma is generated by applying power to the first electrode and the second electrode while maintaining the process gas vacuum. The surface treatment step (S40) is a process of removing impurities such as hydrocarbons and other organic substances from the surface of the medical device, a process of making the surface of the medical device hydrophilic by cleaning the surface so that bone bonding can proceed quickly when transplanting a living body, and a process of making the surface of the medical device hydrophilic when transplanting a living body. A process can be performed to remove entotoxins that can cause exothermic reactions.
표면 처리 단계(S40) 중에는 챔버(400) 내부의 진공도 가변, 프로세스 가스의 투입량 조절을 통해 공정 압력이나 종류를 변경하고, 플라즈마 발생을 위한 전원 전압 조절, 전원 주파수 및 전극의 형상을 조절하고, 챔버(400) 주변의 자속 가변 등을 통해 플라즈마 밀도를 제어하는 플라즈마 밀도 가변 단계(S45)가 수행될 수 있다. During the surface treatment step (S40), the vacuum level inside the chamber 400 is changed, the process pressure or type is changed by adjusting the input amount of process gas, the power supply voltage for plasma generation is adjusted, the power frequency and the shape of the electrode are adjusted, and the chamber 400 is adjusted. (400) A plasma density variable step (S45) of controlling the plasma density by varying the surrounding magnetic flux, etc. may be performed.
다음으로 전원을 오프 하여 플라즈마 발생을 중지시키는 단계(S50), 챔버(200) 내부의 진공을 해제하는 단계(S60) 및 챔버부(200)를 개방하는 단계(70)를 통해 내포장 용기(100)에 수용된 의료기기(S)을 회수하여 공정을 마무리 한다. Next, turn off the power to stop plasma generation (S50), release the vacuum inside the chamber 200 (S60), and open the chamber 200 (70) to remove the inner packaging container 100. ) and complete the process by recovering the medical device (S) contained in it.
본 발명의 상기한 실시 예에 한정하여 기술적 사상을 해석해서는 안 된다. 적용범위가 다양함은 물론이고, 청구범위에서 청구하는 본 발명의 요지를 벗어남이 없이 당업자의 수준에서 다양한 변형 실시가 가능하다. 따라서 이러한 개량 및 변경은 당업자에게 자명한 것인 한 본 발명의 보호범위에 속하게 된다.The technical idea of the present invention should not be interpreted as limited to the above-described embodiments. Not only is the scope of application diverse, but various modifications can be made at the level of those skilled in the art without departing from the gist of the present invention as claimed in the claims. Therefore, such improvements and changes fall within the scope of protection of the present invention as long as they are obvious to those skilled in the art.

Claims (11)

  1. 플라즈마 표면 처리를 위한 의료기기가 수용되는 케이스;Case housing medical devices for plasma surface treatment;
    상기 케이스가 수용되는 챔버부;a chamber portion in which the case is accommodated;
    전원 인가를 통해 상기 챔버부 내부를 대전시키 위해 상기 챔버부에 구비되는 전극부;an electrode unit provided in the chamber unit to charge the inside of the chamber unit by applying power;
    상기 케이스 내부에 진공을 형성하기 위해 상기 케이스에 형성된 진공유로와, 상기 챔버에 구비되되 일단이 진공압 형성 수단에 연결되고, 타단이 상기 진공유로에 연통되는 진공라인; 및a vacuum passage formed in the case to form a vacuum inside the case, and a vacuum line provided in the chamber, one end of which is connected to a vacuum pressure forming means, and the other end of which communicates with the vacuum passage; and
    상기 케이스 내부에 프로세스 개스를 주입하기 위해 상기 케이스에 형성된 가스유로와, 상기 챔버에 구비되되 일단이 가스 공급 수단에 연결되고, 타단이 상기 가스유로에 연통되는 가스라인;a gas passage formed in the case for injecting a process gas into the case, and a gas line provided in the chamber, one end of which is connected to a gas supply means, and the other end of which communicates with the gas passage;
    을 포함하는, 생체 이식용 의료기기 표면 처리 장치.A medical device surface treatment device for bioimplantation, including a.
  2. 제 1항에 있어서,According to clause 1,
    상기 챔버부는, The chamber part,
    상기 내포장 용기(100)이 수용되도록 내부에 공간이 형성되고, 상측과 하측이 개방 형성된 챔버실린더(210);A chamber cylinder 210 having a space inside to accommodate the inner packaging container 100 and having open upper and lower sides;
    상기 챔버실린더(210)의 일측을 밀폐하며 챔버실린더(210) 내부의 진공 형성을 위한 진공라인(225)이 구비된 제1 커버(220); 및A first cover 220 that seals one side of the chamber cylinder 210 and is provided with a vacuum line 225 for forming a vacuum inside the chamber cylinder 210; and
    상기 챔버실린더(210)의 타측을 밀폐하며, 챔버실린더(210) 내부로 프로세스 개스를 공급하기 위한 가스라인(235)이 구비된 제2 커버(230);A second cover 230 that seals the other side of the chamber cylinder 210 and is provided with a gas line 235 for supplying process gas into the chamber cylinder 210;
    를 포함하는, 생체 이식용 의료기기 표면 처리 장치.A medical device surface treatment device for bioimplantation, including a.
  3. 제 2항에 있어서, According to clause 2,
    제1 커버(220)는 챔버실린더(210)에 결합 시 하단을 통해 내포장 용기(100)의 상측을 고정 및 지지하도록 구성되며, 제2 커버(230)는 챔버실린더(210)에 결합 시 상단을 통해 내포장 용기(100)의 하측을 고정 및 지지하도록 구성되는, 생체 이식용 의료기기 표면 처리 장치.The first cover 220 is configured to fix and support the upper side of the inner packaging container 100 through the bottom when coupled to the chamber cylinder 210, and the second cover 230 is configured to secure and support the upper side of the inner packaging container 100 when coupled to the chamber cylinder 210. A surface treatment device for a medical device for bioimplantation, configured to fix and support the lower side of the inner packaging container 100 through.
  4. 제 2항에 있어서,According to clause 2,
    상기 전극부는, The electrode part,
    링 형으로 상기 제1 커버의 둘레를 따라 구비되는 제1 전극,A first electrode provided in a ring shape along the circumference of the first cover,
    또는, 링 형으로 상기 챔버실린더(210)의 원주 방향 둘레를 따라 구비되는 제2 전극, Alternatively, a second electrode provided in a ring shape along the circumferential circumference of the chamber cylinder 210,
    또는 상기 제1 전극과 제2 전극을 모두 포함하는, 생체 이식용 의료기기 표면 처리 장치.Or a surface treatment device for a medical device for biological implantation, comprising both the first electrode and the second electrode.
  5. 제 4항에 있어서, According to clause 4,
    상기 제2 전극은, The second electrode is,
    복수 개가 상기 챔버실린더(210)의 상하 길이 방향을 따라 이격 배치되고, A plurality of pieces are spaced apart along the vertical direction of the chamber cylinder 210,
    각각의 제2 전극(320)은 개별적으로 전원 온오프 스위칭이 가능하도록 구성되는, 생체 이식용 의료기기 표면 처리 장치.Each second electrode 320 is configured to individually switch power on and off. A medical device surface treatment device for biological implantation.
  6. 제 2항에 있어서, According to clause 2,
    상기 케이스는, In the above case,
    상기 의료기기(S)이 수용 및 고정되도록 내부에 공간이 형성되고, 상측과 하측이 개방 형성된 케이스실린더(110);A case cylinder (110) with an open upper and lower side and a space formed therein to accommodate and fix the medical device (S);
    상기 케이스실린더(110)의 일측을 밀폐하며 케이스실린더(110) 내부의 진공 형성을 위한 진공유로(125)가 형성된 제1 케이스커버(120);A first case cover 120 that seals one side of the case cylinder 110 and has a vacuum passage 125 for forming a vacuum inside the case cylinder 110;
    상기 케이스실린더(110)의 타측을 밀폐하며, 케이스실린더(110) 내부로 프로세스 개스를 공급하기 위한 가스유로(135)가 형성된 제2 케이스커버(130)를 포함하고,It seals the other side of the case cylinder 110 and includes a second case cover 130 with a gas flow path 135 for supplying process gas into the case cylinder 110,
    상기 진공유로(125)는 상기 제1 커버(220)의 하단이 내포장 용기(100) 상측에 밀착되어 내포장 용기(100)의 상측 고정 시 진공라인(225)과 연통되고, 상기 가스유로(135)는 상기 제2 커버(220)의 하단이 내포장 용기(100) 하측에 밀착되어 내포장 용기(100)의 하측 고정 시 가스라인(235)과 연통되는, 생체 이식용 의료기기 표면 처리 장치.The vacuum flow path 125 is in close contact with the upper side of the inner packaging container 100 at the lower end of the first cover 220 and communicates with the vacuum line 225 when the upper side of the inner packaging container 100 is fixed, and the gas flow path ( 135) is a surface treatment device for medical devices for living implants, wherein the lower end of the second cover 220 is in close contact with the lower side of the inner packaging container 100 and communicates with the gas line 235 when the lower side of the inner packaging container 100 is fixed. .
  7. 제 1항에 있어서, According to clause 1,
    상기 표면 처리 장치는, The surface treatment device,
    상기 챔버(200)의 주변에 자기장을 발생시키고, 챔버(200) 주변의 자속을 제어하여 챔버(200) 내부 특정 위치에서 플라즈마 밀도를 가변시키기 위한 자기장발생부(500)를 포함하는, 생체 이식용 의료기기 표면 처리 장치.For bioimplantation, including a magnetic field generator 500 for generating a magnetic field around the chamber 200 and controlling the magnetic flux around the chamber 200 to vary the plasma density at a specific location inside the chamber 200. Medical device surface treatment device.
  8. 제 7항에 있어서, According to clause 7,
    상기 자기장발생부(500)는,The magnetic field generator 500,
    소정의 두께를 갖는 링 형으로 이루어지며, 내경이 챔버(200)의 외경보다 크게 형성되어 챔버(200)와 자기장발생부(500) 사이에 반경 방향을 따라 이격 공간이 형성되도록 구성되되, It is formed in a ring shape with a predetermined thickness, and the inner diameter is formed to be larger than the outer diameter of the chamber 200 so that a separation space is formed along the radial direction between the chamber 200 and the magnetic field generator 500,
    상기 자기장발생부(500)는,The magnetic field generator 500,
    상기 챔버(200)의 길이 방향을 따라 이동 가능하도록 제1 이동수단을 구비하여 내포장 용기(100)의 상하 방향 플라즈마 밀도를 가변시킬 수 있도록 구성되는, 생체 이식용 의료기기 표면 처리 장치.A surface treatment device for a medical device for bioimplantation, comprising a first moving means capable of moving along the longitudinal direction of the chamber 200 and configured to vary the plasma density in the vertical direction of the inner packaging container 100.
  9. 제 8항에 있어서, According to clause 8,
    상기 자기장발생부(500)는,The magnetic field generator 500,
    상기 챔버(200)의 중심을 기준으로 원주 방향을 따라 회전하는 제2 이동수단을 통해 회전하도록 구성되되, 상기 자기장발생부(500)의 중심과, 상기 제2 이동수단의 중심이 이격되도록 구성되어 상기 자기장발생부(500)가 편심 회전하도록 구성되는, 생체 이식용 의료기기 표면 처리 장치.It is configured to rotate through a second moving means that rotates along the circumferential direction based on the center of the chamber 200, and is configured so that the center of the magnetic field generator 500 and the center of the second moving means are spaced apart. A surface treatment device for a medical device for bioimplantation, wherein the magnetic field generator 500 is configured to rotate eccentrically.
  10. 제 1항 내지 제 9항의 생체 이식용 의료기기 표면 처리 장치를 이용한 표면 처리 방법에 있어서, In the surface treatment method using the surface treatment device for bioimplantable medical devices according to claims 1 to 9,
    의료기기(S)이 포장된 내포장 용기(100)을 챔버(200)에 설치하는 의료기기 설치단계(S10);A medical device installation step (S10) of installing the inner packaging container 100 in which the medical device (S) is packaged into the chamber 200;
    상기 챔버(200)를 제1 또는 제2 커버(220, 230)를 통해 밀폐하고, 진공라인(225) 및 진공유로(125)를 통해 챔버(200) 및 내포장 용기(100) 내부에 진공을 형성하는 진공 형성 단계(S20);The chamber 200 is sealed through the first or second covers 220 and 230, and a vacuum is applied inside the chamber 200 and the inner packaging container 100 through the vacuum line 225 and the vacuum passage 125. Vacuum forming step (S20);
    가스라인(235) 및 가스유로(135)를 통해 챔버(200) 및 내포장 용기(100) 내부에 프로세스 개스를 주입하는 가스 주입 단계(S30);A gas injection step (S30) of injecting a process gas into the chamber 200 and the inner packaging container 100 through the gas line 235 and the gas flow path 135;
    제1 전극 및 제2 전극에 전원을 인가하여 플라즈마를 발생시키는 표면 처리 단계(S40);A surface treatment step (S40) of generating plasma by applying power to the first electrode and the second electrode;
    전원을 오프 하여 플라즈마 발생을 중지시키는 단계(S50);Turning off the power to stop plasma generation (S50);
    챔버(200) 내부의 진공을 해제하는 단계(S60); 및releasing the vacuum inside the chamber 200 (S60); and
    챔버부(200)를 개방하여 내포장 용기(100)에 수용된 의료기기(S)을 회수하는 단계(S70);Retrieving the medical device (S) accommodated in the inner packaging container (100) by opening the chamber portion (200) (S70);
    를 포함하는, 표면 처리 방법.Including, a surface treatment method.
  11. 제 10항에 있어서, According to clause 10,
    상기 표면 처리 단계(S40)는,The surface treatment step (S40) is,
    챔버(400) 내부의 진공도 가변, 프로세스 가스의 투입량 조절을 통해 공정 압력이나 종류를 변경하고, 플라즈마 발생을 위한 전원 전압 조절, 전원 주파수 및 전극의 형상을 조절하고, 챔버(400) 주변의 자속 가변 등을 통해 플라즈마 밀도를 제어하는 플라즈마 밀도 가변 단계(S45)를 더 포함하는, 표면 처리 방법. Change the vacuum level inside the chamber 400, change the process pressure or type by adjusting the input amount of process gas, adjust the power supply voltage for plasma generation, adjust the power frequency and shape of the electrode, and change the magnetic flux around the chamber 400. A surface treatment method further comprising a plasma density variable step (S45) of controlling the plasma density through, etc.
PCT/KR2022/013388 2022-05-27 2022-09-06 Surface treatment device and surface treatment method for bioimplant medical device WO2023229106A1 (en)

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