WO2023217824A1 - Lampe de désinfection avec réflecteur - Google Patents

Lampe de désinfection avec réflecteur Download PDF

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Publication number
WO2023217824A1
WO2023217824A1 PCT/EP2023/062354 EP2023062354W WO2023217824A1 WO 2023217824 A1 WO2023217824 A1 WO 2023217824A1 EP 2023062354 W EP2023062354 W EP 2023062354W WO 2023217824 A1 WO2023217824 A1 WO 2023217824A1
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WO
WIPO (PCT)
Prior art keywords
reflector
radiation
light
generating system
wavelength
Prior art date
Application number
PCT/EP2023/062354
Other languages
English (en)
Inventor
Petrus Hendrikus Antonis
Patrick Cyriel VAN DE VOORDE
Jan Alfons STOFFELS
Jacek Kloska
Johan Philippe W. DUCHATEAU
René Theodorus WEGH
Johan Leopold V. HENDRIX
Original Assignee
Signify Holding B.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Signify Holding B.V. filed Critical Signify Holding B.V.
Publication of WO2023217824A1 publication Critical patent/WO2023217824A1/fr

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Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/0005—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor for pharmaceuticals, biologicals or living parts
    • A61L2/0011—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor for pharmaceuticals, biologicals or living parts using physical methods
    • A61L2/0029—Radiation
    • A61L2/0047—Ultraviolet radiation
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
    • A61L2/08—Radiation
    • A61L2/10—Ultraviolet radiation
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00—Disinfection, sterilisation or deodorisation of air
    • A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
    • A61L9/18—Radiation
    • A61L9/20—Ultraviolet radiation

Definitions

  • the invention relates to a radiation generating system and to a method for treating a gas, such as air, or a surface.
  • UV emitting lamps are known in the art.
  • US 10071262 B2 describes an apparatus and method for generating at least one bactericidal radiation, comprising an overhead surgical illumination system or a surgeon's surgical headlight system comprising; comprising an excilamp configured to generate the at least one bactericidal radiation having a peak wavelength provided in a range of 190 nanometers (nm) to 230 nm, wherein the peak wavelength is 207 nm or 222 nm; comprising at least one filter arrangement which includes a band pass filter, or a combination of a low pass filter and a high pass filter, wherein the at least one filter arrangement is configured to; comprising preventing all ultraviolet wavelengths of the at least one generated bactericidal radiation that are outside of the range of 190 to 230 nm from passing through the at least one filter arrangement; and comprising allowing all wavelengths in the range of 190 to 230 nm to pass through the at least one filter arrangement; and comprising fluoresce visible light in response to the at least
  • UV light has been used for disinfection for over 100 years. Wavelengths between about 190 nm and 300 nm may be strongly absorbed by nucleic acids, which may result in defects in an organism’s genome. This may be desired for inactivating (killing), bacteria and viruses, but may also have undesired side effects for humans. Therefore, the selection of wavelength of radiation, intensity of radiation and duration of irradiation may be limited in environments where people may reside such as offices, public transport, cinema’s, restaurants, shops, etc., thus limiting the disinfection capacity. Especially in such environments, additional measures of disinfection may be advantageous to prevent the spread of bacteria and viruses such as influenza or novel (corona) viruses like CO VID-19, SARS, and MERS.
  • influenza or novel (corona) viruses like CO VID-19, SARS, and MERS.
  • Other disinfection systems may use one or more anti-microbial and/or antiviral means to disinfect a space or an object.
  • anti-microbial and/or antiviral means may be chemical agents which may raise concerns.
  • the chemical agents may also be harmful for people and pets.
  • the disinfecting light may especially comprise ultraviolet (UV) radiation (and/or optionally violet radiation), i.e., the light may comprise a wavelength selected from the ultraviolet wavelength range (and/or optionally the violet wavelength range).
  • UV radiation and/or optionally violet radiation
  • the light may comprise a wavelength selected from the ultraviolet wavelength range (and/or optionally the violet wavelength range).
  • other wavelengths are herein not excluded.
  • the ultraviolet wavelength range is defined as light in a wavelength range from 100 to 380 nm and can be divided into different types of UV light / UV wavelength ranges (Table 1). Different UV wavelengths of radiation may have different properties and thus may have different compatibility with human presence and may have different effects when used for disinfection (Table 1).
  • Table 1 Properties of different types of UV, violet, and NIR wavelength light
  • UV-A may be (relatively) safe and may inactivate (kill) bacteria, but may be less effective in inactivating (killing) viruses.
  • UV-B may be (relatively) safe when a low dose (i.e. low exposure time and/or low intensity) is used, may inactivate (kill) bacteria, and may be moderately effective in inactivating (killing) viruses.
  • UV-B may also have the additional benefit that it can be used effectively in the production of vitamin D in a skin of a person or animal.
  • Near UV-C may be relatively unsafe, but may effectively inactivating, especially kill bacteria and viruses.
  • Far UV-C may also be effective in inactivating (killing) bacteria and viruses, but may be (relatively to other UV-C wavelength ranges) (rather) safe.
  • Far-UV light may generate some ozone which may be harmful for human beings and animals.
  • Extreme UV-C may also be effective in inactivating (killing) bacteria and viruses, but may be relatively unsafe.
  • Extreme UV-C may generate ozone which may be undesired when exposed to human beings or animals.
  • ozone may be desired and may contribute to disinfection, but then its shielding from humans and animals may be desired.
  • table “+” for ozone production especially implies that ozone is produced which may be useful for disinfection applications, but may be harmful for humans / animals when they are exposed to it. Hence, in many applications this “+” may actually be undesired while in others, it may be desired.
  • the types of light indicated in above table may in embodiments be used to sanitize air and/or surfaces.
  • inactivating and “killing” with respect to a virus may herein especially refer to damaging the virus in such a way that the virus can no longer infect and/or reproduce in a host cell, i.e., the virus may be (essentially) harmless after inactivation or killing.
  • the light may comprise a wavelength in the UV-A range. In further embodiments, the light may comprise a wavelength in the UV-B range. In further embodiments, the light may comprise a wavelength in the Near UV-C range. In further embodiments, the light may comprise a wavelength in the Far UV-C range. In further embodiments, the light may comprise a wavelength in the extreme UV-C range.
  • the Near UV-C, the Far UV-C and the extreme UV-C ranges may herein also collectively be referred to as the UV-C range.
  • the light may comprise a wavelength in the UV-C range. In other embodiments, the light may comprise violet radiation.
  • light or radiation described herein may also be indicated as disinfection light.
  • the present invention focusses, amongst others, on KrCl excimer discharge lamps.
  • Such lamps may especially emit at a wavelength of about 222 nm, which may, as indicated above, be relatively safe and be relatively efficient in reducing e.g. the virus load.
  • the (about) 222 nm peak may have a relatively narrow band width.
  • Prior art solutions may have as disadvantage a relatively high emission of undesired wavelengths, such as at about 258 nm (chlorine molecular radiation), and/or a relatively low efficiency. Other disadvantages of the prior art may be the removal of more radiation than necessary. Yet, prior art solutions may have less desirable beam shapes.
  • the present invention may have as object to overcome or ameliorate at least one of the disadvantages of the prior art, or to provide a useful alternative.
  • the invention provides a radiation generating system comprising an excimer lamp, a and optics.
  • the radiation generating system may further comprise a light chamber.
  • the excimer lamp may comprise a discharge vessel.
  • the discharge vessel may contain a gas composition comprising chlorine and krypton.
  • the excimer lamp may be configured to generate in an operational mode radiation having one or more wavelengths in the wavelength range of 200-300 nm.
  • the optics may in embodiments comprise a first reflector and a second reflector.
  • the discharge vessel may be configured between the first reflector and the second reflector.
  • the first reflector may be configured to reflect at least part of the radiation in a direction of the second reflector.
  • the excimer lamp, the first reflector, and the second reflector may be configured such that at least part of the radiation can only escape from the radiation generating system via at least a reflection at the second reflector.
  • the second reflector may have a first wavelength averaged reflection R1 in a first wavelength range 210-245 nm and a second wavelength averaged reflection R2 in a second wavelength range of 250-270 nm.
  • the second reflector may in embodiments have a third wavelength averaged reflection R3 in a third wavelength range of 190 nm and smaller, such as the 160-190 nm wavelength range.
  • R2/Rl ⁇ 0.6 may apply.
  • R3/Rl ⁇ 0.6 may apply.
  • the radiation generating system may be configured to generate system light comprising at least part of the radiation reflected at the second reflector.
  • the invention may provide a disinfection lamp with reflector. Therefore, in specific embodiments, the invention provides a radiation generating system comprising an excimer lamp, a light chamber, and optics wherein the excimer lamp comprises a discharge vessel, wherein the discharge vessel contains a gas composition comprising chlorine and krypton; wherein the excimer lamp is configured to generate in an operational mode radiation having one or more wavelengths in the wavelength range of 200-300 nm; wherein the optics comprises a first reflector and a second reflector; wherein the discharge vessel is configured between the first reflector and the second reflector; wherein the first reflector is configured to reflect at least part of the radiation in a direction of the second reflector; wherein the excimer lamp, the first reflector, and the second reflector are configured such that at least part of the radiation can only escape from the radiation generating system via at least a reflection at
  • the present system it may be possible to more efficiently disinfect bacteria and/or viruses.
  • the system may provide more power, and may thus have more impact upon the disinfection speed and/or the versatility of the type of bacteria and/or viruses which may be treated. Further, the higher efficiency of the system may also allow a reduction of the power, would this be desirable. Further, with the present system, it may be possible to provide a desirable beam shape, such as e.g. a batwing shape beam.
  • the invention may provide a radiation generating system comprising an excimer lamp and optics, and optionally a light chamber.
  • the radiation generating system may comprise an excimer lamp.
  • the excimer lamp may be a radiation source (or light source), especially an ultraviolet light source.
  • the excimer lamp may work on the principle of a dielectric barrier discharge, which refers to the electric disharge in an insulating medium configured between two condunctors (or electrodes) upon the application of electricity.
  • the excimer lamp may apply a potential difference (for example by aplying an alternating current) between two electrodes configured on either side of a vessel containg a gas composition (typically comprising halides).
  • the excimer lamp may comprise a discharge vessel.
  • the discharge vessel may contain a gas composition comprising chlorine and krypton, more especially chlorine, neon and krypton i.e.
  • gas composition may comprise Ch, Ne and Kr.
  • other components may also be possible, but especially at least 90 %, even more especially at least 95% of the gas composition may consist of Ch, Ne and Kr. Even more especially, 98% or more of the gas composition consists of Ch, and Kr.
  • Other components that could be available may e.g. be one or more of Ne, Ar, Br2, N2, or H2, such as one or more of Ar and N2.
  • specific embodiments of the gas composition are provided (see further below).
  • the combination of Kr and Ch may provide the radiation in the range 200-300 nm.
  • the excimer lamp may be configured to generate in an operational mode radiation having one or more wavelengths in the wavelength range of 200-300 nm.
  • operation mode may e.g. refer to which discharge conditions the gas composition is subjected (see further also below).
  • the discharge vessel may contain a gas composition, which may be brought to discharge and generate radiation, including UV radiation.
  • this radiation can inactivate harmful viruses by destroying their DNA/RNA, and/or inactivate other parts of the virus proteins. Further, as indicated above, this radiation (in certain desirable wavelengths) may be absorbed by skin to produce vitamin D.
  • the radiation generating system may comprise a light chamber.
  • the light chamber may enclose at least a part of the radiation generating system.
  • the walls of the light chamber may be reflective for radiation (or light), especially ultraviolet light.
  • the reflective walls of the light chamber may be reflective for radiation in the wavelength range of 200-300 nm.
  • the light chamber in embodiments of the radiation generating system may be cuboidal in geometry.
  • the light chamber may comprise two reflective walls, especially three reflective walls, especially four reflective walls, more especially five reflective walls.
  • the light chamber may (also) have, in embodiments, a pentagonal, a hexagonal or a higher order polygonal cross-section.
  • the light chamber may comprise at least a part comprising a chamber exit window.
  • radiation or light
  • the light chamber may be defined by at least the one or more walls and the chamber exit window.
  • parts of the wall may be reflective for the radiation.
  • the term “reflective” with regards to the light of the discharge vessel may herein refer to at least 50% of incident light source light being reflected, such as at least 60%, especially at least 70%, such as at least 80%, especially at least 90%, such as at least 95%, under perpendicular irradiation.
  • the percentages may refer to percentages based on Watts.
  • the term “wall” may also include a bottom (or bottom wall) (and optionally in embodiments a closure).
  • the radiation generating system may comprise optics.
  • optics may especially refer to elements that may interact with light, such as by reflecting, absorbing or transmitting radiation (especially light, such as especially ultraviolet light).
  • the optics may comprise a first reflector and a second reflector.
  • the first reflector may be especially reflective for ultraviolet light, such as light in the wavelength 200-300 nm.
  • the second reflector may (also) be reflective for light, such as especially ultraviolet light, more especially such as light in the wavelength 200-300 nm.
  • the second reflector may be selective in the wavelengths of light reflected, meaning that the second reflector may preferentially reflect light in a certain range of wavelengths (see below) and have a lower reflectivity for wavelengths outside such range. Exposure to ultraviolet radiation may be harmful, especially in high doses.
  • the second reflector may provide the advantage of selectively reflecting (only) wavelengths of ultraviolet light not or less harmful to humans (or living organisms).
  • the second reflector may be configured to reflect (only) the wavelengths of ultraviolet light that may be harmful to living organisms, such as for use in a disinfection device.
  • the first reflector may have a relatively constant reflectivity of the wavelength range, or at least in those wavelength ranges where the excimer lamp provides its radiation.
  • the first reflector may have a substantially wavelength independent reflection, at least in the 210-245 nm wavelength range, more especially in the 210-270 nm wavelength range, yet even more especially in the 200-300 nm wavelength range. For instance, differences in reflection from an average reflection in the indicated wavelength range(s) may be less than 30%, such as less than 20%.
  • the first reflector may have a wavelength dependent reflection.
  • the discharge vessel may be configured between the first reflector and the second reflector.
  • the excimer lamp may provide radiation, such as ultraviolet light of wavelengths in the range 200-300 nm in a radial direction.
  • the radiation may be provided over an angle 0, wherein theta is the angle over which radiation is provided i.e. the extremities of the cone of light (in a cross-sectional view) extend by an angle 9/2 in the clockwise and anti-clockwise direction measured from a line perpendicular to a system exit window and passing through the center of the excimer lamp.
  • the discharge vessel may have a cylindrical shape.
  • over 360° radiation maybe provided by the discharge vessel during operation.
  • in the entire 360° radiation may be provided.
  • a majority of the radiation provided by the excimer lamp over at least about 120° may be reflected (at least once, by at least one of the reflectors).
  • radiation provided by the excimer lamp over at least about 270°, such as even up to about 360° may be reflected (at least once, by at least one of the reflectors).
  • the light or radiation may be reflected by the first reflector and/or the second reflector. Further, at least part of the radiation incident on the first reflector may be reflected in the direction of the second reflector.
  • the first reflector may be configured to reflect at least part of the radiation (from the discharge vessel) in a direction of the second reflector. This may provide the advantage of protecting the user from direct exposure to radiation provided by the excimer lamp. In embodiments, at least 30% of the radiation generated by the excimer lamp may be reflected by the first reflector (at least once), such as at least about 40%, even more especially at least about 50%. A substantial part of the light reflected at the first reflector may reach the second reflector.
  • At least 70%, more especially at least 80% of the radiation generated by the excimer lamp may reach the second reflector.
  • the radiation of the excimer lamp may reach the second reflector directly or after reflection at the first reflector.
  • a (minor) part may reach the second reflector after at least a reflection at a reflective wall of the light chamber.
  • the excimer lamp may provide radiation which may be reflected by the first reflector and/or the second reflector.
  • the excimer lamp, the first reflector, and the second reflector may be configured such that at least part of the radiation can (only) escape from the radiation generating system via at least a reflection at the second reflector.
  • the majority of the system light provided by the radiation generating system may comprise radiation reflected at the second reflector, such as 60% of the system light, such as especially 70% of the system light, more especially 80% of the system light.
  • the second reflector such as 60% of the system light, such as especially 70% of the system light, more especially 80% of the system light.
  • the percentages may refer to percentage of the total spectral power (of the radiation or system light).
  • the second reflector may have a first wavelength averaged reflection R1 in a first wavelength range 210-245 nm, a second wavelength averaged reflection R2 in a second wavelength range of 250-270 nm, and optionally a third wavelength averaged reflection R3 in a third wavelength range of 190 nm and smaller.
  • the second reflector may be selective of the wavelength of the reflected wavelength.
  • Wavelength of ultraviolet light in about the range 250-270 nm may especially be harmful to living organisms.
  • the desirable averaged wavelength safe for exposure (for living organisms or people) may especially be in the range 210-245 nm; for this reason a wavelength averaged reflection R1 may be relatively high.
  • the third wavelength averaged reflection R3 in a wavelength range of 190 nm or smaller may (not-necessarily) be harmful but may yet be an undesirable wavelength of reflection.
  • KrCl excimer lamps do not have an emission at a wavelength equal to or lower than 190 nm.
  • the second reflector may be reflective for desirable wavelengths such as wavelength averaged reflection R1 and absorptive and/or transmissive for undesirable wavelength averaged reflection such as R2 and optionally R3.
  • the first and/or second reflector may have an absorption of at least 65%, such as 80% or 90% or more, for the second wavelength range, and an absorption of at the most 35%, such as 20% or 10% or less for the first wavelength range.
  • R2/Rl ⁇ 0.6 meaning the (undesirable) wavelength averaged reflection R2 may be at least 60% lower than the (desirable) averaged reflection Rl, such as especially 40% lower or (R2/Rl ⁇ 0.4), more especially 20% lower (or R2/Rl ⁇ 0.2), most especially 10% (or R2/Rl ⁇ 0.1).
  • the averaged reflection R3 may especially be lower than the (desirable) averaged reflection Rl, such as 60% lower than the (desirable) averaged reflection Rl, such as especially 40% lower or (R3/Rl ⁇ 0.4), more especially 20% lower (or R3/Rl ⁇ 0.2), most especially 10% (or R3/Rl ⁇ 0.1).
  • Rl >50% and R2 ⁇ 20%, and optionally R3 ⁇ 20%. More especially, in embodiments Rl>60% and/or R2 ⁇ 15%, and optionally R3 ⁇ 15%.
  • the second reflector may reflect desirable radiation in another direction than less desirable radiation; and/or the second reflector may absorb, or transmit less desirable (or undesirable) radiation (more than desirable radiation).
  • Desirable radiation may especially be radiation in the wavelength range of 210-245 nm.
  • Less desirable radiation may especially be in the wavelength range of 250-270 nm.
  • safety issues may be more relevant in this range (of 250-270 nm) than in the range of 210-245 nm.
  • Less desirable radiation may also be radiation with wavelengths equal to or smaller than about 190 nm, such as selected from the wavelength range of 160-190 nm. Note that percentages of transmission and/or reflection herein may especially be based upon perpendicular irradiation.
  • the radiation generating system may provide system light, which comprises a majority of desirable wavelength radiation, while the undesirable wavelength may be minimized to improve safety.
  • the radiation generating system may be configured to generate system light comprising at least part of the radiation reflected at the second reflector.
  • the radiation generating system may provide (desirable) reflected radiation.
  • the first reflector reflects radiation generated by the excimer lamp, thus, protecting humans (or living organisms) from direct exposure to radiation.
  • the first reflector may increase the output of the radiation generating system by reflecting (at least a part of) the radiation towards the second reflector.
  • the second reflector may reflect the radiation incident on its surface, wherein the source of the radiation may be radiation generated by the excimer lamp, directly or reflected via the first reflector (especially a combination of both).
  • the radiation provided by the excimer lamp may be a primary source of radiation and the radiation reflected from the first reflector (onto the second reflector) may be a secondary source of radiation.
  • the ratio of light incident on the second reflector may be in dependence of the spatial configuration of the optics and the excimer lamp within the light chamber.
  • the second reflector may absorb, transmit, or deflect undesirable (or harmful) wavelengths in the radiation provided. Therefore, in embodiments, the system light may comprise (desirable) and safe wavelengths reflected by the second reflector.
  • the radiation generating system may be configured to provide (some) radiation (or light) of the harmful wavelengths (such as wavelengths in the range 250-270 nm). This may be important to provide a device for (enhanced) disinfection.
  • the system light may comprise radiation, or radiation reflected from the first reflector, or radiation reflected by the second reflector. Therefore, in specific embodiments R2/Rl>0.01, such as more especially R2/Rl>0.1. In specific embodiments 0.01 ⁇ R2/Rl ⁇ 0.8, such R2/Rl ⁇ 0.4 or 0.01 ⁇ R2/Rl ⁇ 0.6, like especially R2/Rl ⁇ 0.2 or 0.1 l ⁇ R2/Rl ⁇ 0.4
  • the system may comprise a chamber exit window (or “light exit”, like an end window or an (other) optical element, or an opening, from which the system light may escape to the external of the system.
  • the system may comprise a housing, comprising such light exit.
  • the housing may at least partly enclose one or more light generating devices and one or more (other) optical elements.
  • the system may comprise a light chamber, wherein the light chamber may at least partially host the first reflector and/or the second reflector, and may at least partly host the discharge vessel.
  • the light chamber may have reflective walls.
  • the housing may comprise an exit window or “chamber exit window”.
  • the light chamber may be comprised by a housing of the system. In embodiments, the light chamber may be at least part of the housing of the system.
  • the chamber exit window may be different from the system exit window. However, in other embodiments, the chamber exit window may be the same as the system exit window.
  • the system exit window may be the opening via which system light may be outcoupled from the radiation generating system.
  • the chamber exit window may be a part of the light chamber via which radiation may be outcoupled from the light chamber.
  • the system exit window may comprise the chamber exit window. Window (i.e. the chamber exit window or the system exit window or both) may essentially be an opening via which radiation may escape.
  • the chamber exit window or the system exit window or both may (also) comprise an optical filter (or layer) via which radiation may escape.
  • the optical filter may be wavelength selective for the radiation generated by the discharge vessel during operation (of the system).
  • an optical filter for a window may have a wavelength dependent transmission.
  • the optical filter may have a first wavelength averaged transmission T1 in a first wavelength range 210- 245 nm, and a second wavelength averaged transmission T2 in a second wavelength range of 250-270 nm, wherein T2/Tl ⁇ 0.6.
  • the optical filter may have a third wavelength averaged transmission T3 in a third wavelength range of 190 nm and smaller; wherein T3/Tl ⁇ 0.6; and wherein T3 ⁇ 20%.
  • the first reflector (or the second reflector or both) may be made of one or more of polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF).
  • PTFE polytetrafluoroethylene
  • PVDF polyvinylidene fluoride
  • other materials may also be possible.
  • the first reflector may be metallic.
  • the first reflector may be diffusively reflective or specular reflective for the radiation.
  • part of the radiation impinging on the first reflector (or the second reflector or both) may be diffusively reflected and part of the radiation may be specularly reflected.
  • a region of the first reflector close to a plane through an axis of elongation of the first reflector and an axis of elongation of the discharge vessel may be specular reflective.
  • regions of the first reflector further away from such plane may be diffusively reflective. Therefore, in embodiments the first reflector may be configured to reflect at least part of the radiation diffusively.
  • the first reflector may be curved.
  • the first reflector may be curved in one direction, such as to have a semi-cylinder-like shape.
  • the term “semi-cylinder-like” or “semi-cylindrical” may refer to a shape substantially identical to a semi-cylinder. However, it may also refer to a distortion thereof, like a semi-oval cross- sectional shape.
  • the first reflector may have a curved reflector surface, but the first reflector may also have a facetted reflector surface. Further, referring to e.g. a circle.
  • An arc for example a semi-circle
  • the angle of curvature is the angle between two lines each connecting the center of the circle (of which the arc is a part) and the extremities of the arc.
  • a semi-circle would imply a curvature of 180°.
  • the semi-circle may also be smaller, like ranging a range selected from 45-180°, such as selected from the range of 45-135°.
  • semi-cylinder-like cross-sectional shape may also refer to a circle segment (also having an angle relative to the circle of which it is a segment smaller than 180°, such as selected from the range of 45-135°.
  • the first reflector may (also) be curved in two directions, such as to have a concave (or convex) shape. Yet further, in embodiments, the first reflector may be curved in at least one direction, defining a first reflector cavity.
  • “cavity” may refer to the formation of a surface which may enclose the discharge vessel over at least about 120° (especially when assuming an essentially cylindrical cross-section), such as at least about 150°, such as at least 270°.
  • cavities may be formed from a monolithic first reflector by hollowing or removing material (for example a metal or PTFE) from an object and polishing the inner surface.
  • cavities may also be formed by covering an object (or the discharge vessel) using a plurality of first reflectors, or a curved first reflector, or a segmented first reflector.
  • the first reflector may be curved in at least one direction, defining a first reflector cavity and the discharge vessel may be at least partly configured within the first reflector cavity. This may provide the advantage of reflecting radiation (or light) from the first reflector towards the second reflector. Hence, preventing the outcoupling of harmful or undesirable radiation.
  • the first reflector may be partially curved about an axis of elongation.
  • the excimer lamp may be configured between the vertex and the center of curvature of the (curved) first reflector.
  • the first reflector may reflect the light from the excimer lamp incident on its surface in the direction of the second reflector.
  • the first reflector reflects a majority of the light (from the excimer lamp) over at least about 120° (especially when assuming an essentially cylindrical cross-section), such as at least about 150°, such as at least 270° incident on its surface towards the second reflector.
  • the first reflector may prevent the direct outcoupling of light from the excimer lamp.
  • the first reflector may reduce (or completely prevent) outcoupling of harmful radiation.
  • the first reflector may comprise a planar first cross-sectional shape. This may especially be a flat shape with no curvature in any direction.
  • the first reflector may comprise nl segments. Especially, where nl is 2, wherein nl is 3, such as especially 4, such as especially 5 or more. Further, the nl segments may form a first reflector cavity. In further embodiments, the two segments may be connected along an edge such that they form an angle between them. Yet further, a multitude of different shapes for the first reflector may be formed be combining one or more segments. Note that (in embodiments) the segments may be connected along one or two edges, such that the surface normal of all segments lie in the same plane i.e. the segmented first reflector may be configured to reflect light analogous to a (curved) first reflector, curved in one direction. In other embodiments, the segments may be connected along all edges to form a three-dimensional configuration, wherein the first reflector may reflect radiation analogous to a (curved) first reflector curved in two directions.
  • each segment may have a flat cross-sectional shape, or the segment may be curved in one or two directions.
  • the first reflector may comprise a combination of segments having flat cross-sectional shapes as well as curved segments (curved in one or more directions).
  • the combination of two segments comprising a flat cross-sectional shape and two reflectors having a semicylinder cross-section, a W-shaped first reflector may be formed.
  • the first reflector may comprise four segments.
  • the two segments may have a semi-cylinder cross-sectional shape and two segments may have a flat cross-sectional shape.
  • two of the semi-cylindrical cross-sectional shaped segments may be joined along an edge.
  • the segments having the semi-cylindrical cross-sectional shape may be joined such that a center line defining a middle intersects the edge along where these two segments are joined.
  • the two segments having a flat cross-sectional shape may be configured on either side of the middle.
  • the two segments having a flat cross-sectional shape may be joined to the free edge of the semi- cylindrical cross-sectional shaped first reflectors.
  • the first reflector may comprise a single monolithic body that may be W- shaped i.e. not necessarily comprising a plurality of segments.
  • a W-shaped first reflector may provide the advantage of focusing the radiation provided by the excimer lamp i.e.
  • the curved segments (or sections) of the first reflector may focus the radiation (provided by the excimer lamp) onto specific regions on the second reflector (before they are reflected further by the second reflector), and (ii) the flat segments (or sections) may be useful in reflecting the radiation that is not reflected by the curved segments (or sections) of the first reflector.
  • a W-shaped first reflector may be used in combination with a plurality k3 of second reflectors segments, wherein k3 may be 2, such as especially 3, such as especially 4 or more.
  • the adjacent second reflector segments may be configured to provide an opening between them by positioning the segments at a distance dr2 apart.
  • the W-shaped first reflector may provide the advantage of focusing the radiation (provided by the excimer lamp), such that the radiation is reflected off the second reflector segment before being escaped from the radiation generating system.
  • the first reflector may be configured upstream of the excimer lamp, the excimer lamp may be configured upstream of the second reflector, the second reflector may be configured upstream of the system exit window.
  • first reflector may provide the advantage of higher degree of control in directing the reflected radiation towards the second reflector. Further, the first reflector comprising segments may be easier to manufacture as compared to curved reflectors.
  • the discharge vessel may be elongated (along a discharge vessel axis).
  • the first reflector may also be elongated.
  • the axes of elongation of the discharge vessel and the first reflector may be configured essentially parallel.
  • the radiation generating system may comprise a plurality n2 of first reflectors.
  • n2 may be at least 2, such as at least 3, such as at least 4.
  • at least two of the n2 plurality of first reflectors may be arranged such that they form an opening between them i.e. a first reflector opening.
  • a set of two adjacent first reflectors may have a mutual distance (drl) providing the first reflector opening.
  • drl is not necessarily constant and hence may be varied. Meaning, the distance drl between two adjacent first reflectors may be different from the distance drl between two (other) first reflectors.
  • the adjacent first reflectors may (also) be configured at an angle with respect to one another.
  • the set of two adjacent first reflectors may be configured such that part of the radiation may be propagated through the first reflector opening.
  • at least two closest first reflectors may be connected such that they form a V-shaped configuration.
  • the mutual distance (drl) may vary along a direction.
  • the first reflectors may be arranged such that at least a part of the radiation of the excimer lamp may escape via the openings between the n2 plurality of first reflectors. Especially, the radiation of the excimer lamp may escape with at least one reflection at one of the two adjacent first reflectors.
  • the n2 first reflectors may be configured closer to the system exit window than the second reflector.
  • the second reflector may be configured upstream of the excimer lamp
  • the excimer lamp may be configured upstream of the plurality n2 of first reflectors
  • the plurality n2 of first reflectors may be configured upstream of the system exit window.
  • the radiation generating system may comprise a plurality n2 of first reflectors, wherein n2 is at least 2, wherein a set of two adjacent first reflectors may have a mutual distance (drl) providing a first reflector opening, wherein the set of two adjacent first reflectors may be configured such that part of the radiation propagates through the first reflector opening, with at least one reflection at one of the two adjacent first reflectors; wherein relative to a system exit window via which system light escapes from the radiation generating system, along an optical path of the system light, the n2 first reflectors are configured closer to the system exit window than the second reflector.
  • n2 is at least 2
  • a set of two adjacent first reflectors may have a mutual distance (drl) providing a first reflector opening
  • the set of two adjacent first reflectors may be configured such that part of the radiation propagates through the first reflector opening, with at least one reflection at one of the two adjacent first reflectors
  • the n2 first reflectors are configured closer
  • the system may comprise a second reflector.
  • the second reflector may have different shapes.
  • the second reflector may comprise a double semi-cylinder- like cross-sectional shape. Especially, comprising two reflector regions, each comprising a semi-cylinder-like cross-sectional shape, where (i) a center line defining a middle between the two reflector regions, and (ii) a discharge vessel axis (A) of the discharge vessel may be configured in a single place.
  • the outcoupling of the radiation from the light chamber may be increased.
  • Good outcoupling may also be obtained with the second reflector which has a kind of W-shape.
  • two of such shapes, especially configured parallel may be comprised by the second reflector.
  • essentially any embodiment described above in relation to the semi- cylinder-like cross-sectional shape may also apply to the double semi-cylinder-like cross- sectional shaped reflector.
  • the second reflector may have a double semi- cylinder-like cross-sectional shape, comprising two reflector regions, each having a semi- cylinder-like cross-sectional shape.
  • a center line defining a middle between the two reflector regions i.e. the two semi-cylinder-like reflector regions comprised by the second reflector
  • a discharge vessel axis (A) of the discharge vessel may be configured in a single plane.
  • the second reflector may be monolithic, even when comprising a semi-cylinder-like cross-sectional shape.
  • the first reflector (or the second reflector or both) may comprise a plurality of segments to achieve one or more geometric configurations.
  • these geometric configurations may (also) be achieved using a monolithic first reflector (or second reflector or both).
  • the second reflector may comprise one or more dichroic filters.
  • Dichroic reflectors or filters are known in the art, and it will be apparent to the person skilled in the art that such reflectors may be used to selectively reflect specific wavelengths of light.
  • dichroic mirrors may be used to reflect light of desirable wavelengths such as to provide the first wavelength averaged reflection R1 as opposed to the less desired wavelengths, such as to provide the second wavelength averaged reflection R2 (and optionally the third wavelength average reflection R3).
  • certain optical filters such as dichroic filters with a cutoff at about 245 nm instead of 230 nm, may improve the output provided by the radiation generating system by 6%, such as 7%, especially up to about 8%.
  • Dichroic mirrors work on the principle of thin-film interference.
  • Dichroic mirrors may comprise a series of thin films or membranes, where light incident on the top layer of a membrane may be reflected from its surface. Further, a part of the light transmitted through the membrane may be reflected again at the bottom layer. Hence, the delay in the two reflections may cause the light to constructively interfere reinforcing certain wavelengths while negating other wavelengths.
  • the dichroic reflectors may be configured to reflect (e.g. by constructive interference) the wavelength averaged reflection R1 and negate (for instance by destructive interference) wavelength averaged reflection R2 (and R3).
  • the spectral transmission characteristics and/or reflection characteristics may be created.
  • the dichroic mirror may essentially be flat and hence may be provided on the second reflector in a flat configuration.
  • the second reflector may comprise a plurality of segments.
  • a multitude of different shapes, such as a curved shape may be achieved by series of connected segments.
  • a curved (segmented) second reflector may comprise dichroic filters i.e. each individual connected segment may comprise a dichroic filter (or mirror).
  • the second reflector may comprise one or more dichroic mirrors. Further, in embodiments, the first reflector may also comprise one or more dichroic filters.
  • the second reflector may comprise a planar second cross- sectional shape.
  • the second reflector may have a flat shape without a curvature in any direction.
  • the second reflector may comprises n3 segments.
  • n3 may be at least 2, such as at least 3, such as at least 4.
  • a segmented second reflector provides the advantage of configuring the second reflector in a curved shape. This may be useful in directing radiation incident on the second reflector in a particular direction.
  • the second reflector may be used to reflect wavelength averaged reflection R2 in the direction of the chamber exit window.
  • the second reflector may comprise segments comprising a flat cross-sectional shape, wherein at least one edge of each segment is connected to another segment. Further, the angle between the reflective surface of two segments may be selected from the range 90-180°. Hence, in embodiments, two segments may help form a V-shaped second reflector.
  • the segments may have a flat cross- sectional profile or a curved cross-sectional profile.
  • the second reflector may (also) be configured in a U-shaped configuration.
  • the second reflector comprising 4 or more segments may be configured in a W-shaped configuration.
  • the segmented second reflector may be configured in a plurality of different configurations.
  • the second reflector (for example in a U-shaped) configuration may form (or enclose) a second reflector cavity.
  • the discharge vessel may be at least partly configured within the second reflector cavity. Configuring the discharge vessel within the cavity formed by the second reflector, may provide the advantage of reflecting a majority of the radiation from the discharge vessel over at least about 120° (especially when assuming an essentially cylindrical cross-section), such as at least about 150°, such as at least 270°.
  • the discharge vessel may be elongated (along a discharge vessel axis).
  • the second reflector may also be elongated.
  • the axes of elongation of the discharge vessel and the second reflector may be configured essentially parallel.
  • the axes of elongation of the discharge vessel, the first reflector and the second reflector may be configured essentially parallel.
  • the second reflector may be curved. Especially, the second reflector may be curved in one direction, such as to have a semi-cylinder-like shape.
  • the term “semi-cylinder-like” or “semi-cylindrical” may refer to a shape substantially identical to a semi-cylinder. However, it may also refer to a distortion thereof, like a semi-oval cross- sectional shape.
  • the second reflector may have a curved reflector surface, but the second reflector may also have a facetted reflector surface. Further, referring to e.g. a circle.
  • An arc for example a semi-circle
  • the angle of curvature is the angle between two lines each connecting the center of the circle (of which the arc is a part) and the extremities of the arc.
  • a semi-circle would imply a curvature of 180°.
  • the semi-circle may also be smaller, like ranging a range selected from 45-180°, such as selected from the range of 45-135°.
  • semi-cylinder-like cross-sectional shape may also refer to a circle segment (also having an angle relative to the circle of which it is a segment smaller than 180°, such as selected from the range of 45-135°.
  • the second reflector may (also) be curved in two directions, such as to have a concave (or convex) shape. Yet further, in embodiments, the second reflector may be curved in at least one direction, defining a second reflector cavity.
  • “cavity” may refer to the formation of a surface which may enclose the discharge vessel over at least about 120° (especially when assuming an essentially cylindrical cross-section), such as at least about 150°, such as at least 270°.
  • cavities may be formed from a monolithic second reflector by hollowing or removing material (for example a metal or PTFE) from an object and polishing the inner surface.
  • cavities may also be formed by covering an object (or the discharge vessel) using a plurality of second reflectors, or a curved second reflector, or a segmented second reflector.
  • the second reflector may be curved in at least one direction, defining a second reflector cavity and the discharge vessel may be at least partly configured within the second reflector cavity. This may provide the advantage of reflecting radiation (or light) from the second reflector towards the second reflector. Hence, preventing the outcoupling of harmful or undesirable radiation.
  • the second reflector may be partially curved about an axis of elongation.
  • the excimer lamp may be configured between the vertex and the center of curvature of the (curved) second reflector.
  • the second reflector may reflect the light from the excimer lamp incident on its surface in the direction of the first reflector.
  • the second reflector reflects a majority of the light (from the excimer lamp) over at least about 120° (especially when assuming an essentially cylindrical cross-section), such as at least about 150°, such as at least 270° incident on its surface towards the second reflector.
  • the second reflector may comprise a planar second cross-sectional shape. This may especially be a flat shape with no curvature in any direction.
  • the second reflector may comprise n3 segments. Especially, where n3 is 2, wherein n3 is 3, such as especially 4, such as especially 5 or more. Further, the n3 segments may form a second reflector cavity. In further embodiments, the two segments may be connected along an edge such that they form an angle between them. Yet further, a multitude of different shapes for the second reflector may be formed be combining one or more segments. Note that (in embodiments) the segments may be connected along one or two edges, such that the surface normal of all segments lie in the same plane i.e. the segmented second reflector may be configured to reflect light analogous to a (curved) second reflector, curved in one direction. In other embodiments, the segments may be connected along all edges to form a three-dimensional configuration, wherein the second reflector may reflect radiation analogous to a (curved) second reflector curved in two directions.
  • each segment may have a flat cross-sectional shape, or the segment may be curved in one or two directions.
  • the second reflector may comprise a combination of segments having flat cross-sectional shapes as well as curved segments (curved in one or more directions).
  • the combination of two segments comprising a flat cross-sectional shape and two reflectors having a semi-cylinder cross-section, a W-shaped second reflector may be formed.
  • the second reflector may comprise four segments.
  • the two segments may have a semi-cylinder cross-sectional shape and two segments may have a flat cross-sectional shape.
  • two of the semi-cylindrical cross-sectional shaped segments may be joined along an edge.
  • the segments having the semi-cylindrical cross-sectional shape may be joined such that a center line defining a middle intersects the edge along where these two segments are joined.
  • the two segments having a flat cross-sectional shape may be configured on either side of the middle.
  • the two segments having a flat cross-sectional shape may be joined to the free edge of the semi- cylindrical cross-sectional shaped second reflectors.
  • the second reflector may comprise a single monolithic body that may be W-shaped i.e. not necessarily comprising a plurality of segments.
  • the radiation generating system may comprise a plurality n4 of second reflectors.
  • n4 may at least 2, such as especially at least 3, such as especially at least 4.
  • a set of two adjacent second reflectors may have a mutual distance (dr2) providing a second reflector opening.
  • the distance dr2 is not necessarily fixed.
  • the distance dr2 between two adjacent second reflectors may be different from the distance dr2 between two (other) adjacent second reflectors.
  • two pairs of second reflectors i.e. 4 second reflectors
  • At least two closest second reflectors may be connected such that they form a V-shaped configuration.
  • the mutual distance (dr2) may vary along a direction.
  • the (at least 4) second reflectors may form two or more openings via which radiation may escape.
  • the set of two adjacent second reflectors may be configured such that part of the radiation propagates through the second reflector opening.
  • the n4 second reflectors may be configured closer to the system exit window than the first reflector. Meaning, that along the optical path, the first reflector may be configured upstream of the discharge vessel, the discharge vessel may be configured upstream of the second reflector, and the second reflector may be configured upstream of the system exit window.
  • the first reflector and the second reflector may be configured parallel to each other.
  • the first reflector may comprise a planar first cross-sectional shape and the second reflector may comprise a planar second cross- sectional shape.
  • the first reflector, the second reflector and a chamber exit window may be configured parallel.
  • the planar first cross-sectional shape may have a smaller area than the planar second cross-sectional shape. Therefore, in embodiments, the first reflector and the second reflector may be configured parallel, such that the planar first cross-sectional shape has a smaller area than the planar second cross-sectional shape.
  • the radiation provided by the excimer lamp may be reflected at the first reflector.
  • the first reflector may essentially block a part of the radiation from being escaped from the light chamber.
  • the radiation reflected from the second reflector (either directly or following a reflection from the first reflector) may also be blocked by the first reflector.
  • the larger cross-sectional area of the second reflector may increase the surface area from which light may be reflected.
  • selecting a first reflector with a smaller cross-sectional area as compared to the second reflector less radiation may be blocked by the first reflector and more radiation may be reflected from the second reflector.
  • this choice of having a first reflector with a smaller cross-sectional area than the second reflector may increase the amount of radiation outcoupled from the system.
  • the first reflector may have a cross-sectional area larger than the cross-sectional area of the second reflector.
  • it may be of interest to outcouple light towards the sides of the light chamber (as opposed to directly in front of the light chamber).
  • selecting the first reflector to have a cross-sectional area larger than the second reflector may be useful in facilitating such an embodiment.
  • the discharge vessel may have a vessel length LD and the first reflector may have a first reflector length LI. In embodiments, they may be about the same. However, one may (thus) be larger than the other or the other may be larger than the one.
  • the discharge vessel has a vessel length (LD) and the first reflector has a first reflector length (LI), wherein O.75*LD ⁇ L1 ⁇ 1.1*LD.
  • the second reflector may have a second reflector length L2.
  • the vessel length LD and the second reflector length L2 may be about the same. However, one may (thus) be larger than the other or the other may be larger than the one.
  • the discharge vessel has a vessel length (LD) and the second reflector has a second reflector length (L2), wherein 0.75*LD ⁇ L2 ⁇ l. l*LD. Further, in embodiments O.9 ⁇ L1/L2 ⁇ 1.1.
  • the second reflector may comprise a luminescent material.
  • a luminescent material may convert light incident on it, such as radiation incident on the surface of the luminescent material, into luminescent material light.
  • the luminescent material herein may be selected from a luminescent material that is reflective or transmissive for radiation with a wavelength selected from the first wavelength range and is less reflective, more especially higher absorbing for radiation with a wavelength selected from the second wavelength range, for example, the luminescent material may have an absorption of at least 65%, such as 80% or 90% or more, for the second wavelength range, and an absorption of at the most 35%, such as 20% or 10% or less for the first wavelength range.
  • the luminescent material may have a higher reflectivity for radiation with a wavelength selected from the first wavelength range than for radiation with a wavelength selected from the second wavelength range. More especially, in embodiments the luminescent material may have a higher wavelength averaged reflectivity in the first wavelength range (i.e. first wavelength averaged reflection) than in the second wavelength range (i.e. second wavelength averaged reflection). As indicated above, in embodiments R2/Rl ⁇ 0.6.
  • the luminescent material may comprise Ca(i- x -y)SO4:Pr x 3+ ,My + where M + is an alkaline metal ion like Li + or Na + .
  • the luminescent material may comprise Sr(i- X . y)SO4:Pr x 3+ ,M y + where M + is an alkaline metal ion like Li + or Na + .
  • the luminescent material may comprise LiLu(i- X )F4:Pr x 3+ .
  • the luminescent material may comprise LiY(i- X )F4:Pr x 3+ .
  • the luminescent material may comprise La(i- X )PO4: Pr x 3+ .
  • the luminescent material may comprise (Lu(i-y)Gd y )3A150i2:Ce x 3+ .
  • the luminescent material may comprise Sc(i- X )PO4:Ce x 3+ .
  • the luminescent material may comprise Lu(i- X )PO4:Ce x 3+ .
  • the luminescent material may comprise Y(i. X )PO4:Ce x 3+ .
  • the luminescent material may comprise Gd(i- X )PO4:Ce x 3+ .
  • the luminescent material may comprise a cerium doped aluminate.
  • the luminescent material may comprise (M)(A)i20i9:Ce 3+ , wherein M comprises one or more of Sr, Ba, and Ca, especially at least, or exclusively, Sr, and wherein A comprises one or more of Al and Ga, especially at least, or exclusively, Al.
  • the aluminate such as e.g. indicated, may for instance comprise 0.1-5 mol% Ce.
  • the luminescent material may comprise Sr(i- X )SiO3:Pb x 2+ . In general, 0.01 ⁇ x ⁇ 0.2, though other values may also be possible. Combinations of two or more luminescent materials may also be selected. Suitable luminescent material are amongst others described in WO2022043167A2, which is herein incorporated by reference. In specific embodiments, the luminescent material may be based on praseodymium (Pr).
  • the discharge lamp (more especially the discharge vessel) may have an (essentially) cylindrical design.
  • the electrodes may be configured external of the cylinder (see further also below).
  • the discharge vessel may at least partly be defined by a discharge vessel wall.
  • a discharge vessel wall may especially comprise quartz.
  • the discharge vessel wall may comprise e.g. CaF2, MgF2, or AI2O3 (sapphire or PCA).
  • the electrodes may enclose the discharge vessel over at least about 120° (especially when assuming an essentially cylindrical cross-section), such as at least about 150°. Especially, the electrodes may enclose the discharge vessel over at least 180°, even more especially at least 270°, like in embodiments 360°.
  • the electrodes (at least partly enclosing the discharge vessel) may be thin plate-like electrodes (e.g. in embodiments up to about a few pms thickness) (especially when assuming an essentially cylindrical cross-section). In other embodiments, the electrodes (at least partly enclosing the discharge vessel) may be mesh-like electrodes (especially when assuming an essentially cylindrical cross-section).
  • the distance between the electrodes may be selected from the range of about 4-10 mm, such as about 5-10 mm.
  • the discharge vessel may have an inner diameter (DI) selected from the range of 4-10 mm
  • the discharge vessel may have a vessel wall having a wall thickness (dl) selected from the range of 0.4-2.0 mm
  • the electrodes may be configured external of the discharge vessel
  • the electrodes have an inter electrode distance 11 selected from the range of 4-10 mm.
  • the (cylindrical) discharge vessel may in embodiments have a length (LI) selected from the range of at least about 10 mm, such as especially at least about 15 mm, like in embodiments 15-80 mm, like e.g. in the range of about 15-50 mm. However, larger than about 80 mm may also be possible.
  • the discharge vessel may have a wall thickness dl selected from the range of 0.4-2.0 mm, like at least about 0.7 mm, such as up to about 1.5 mm, like 0.5-1.5 mm, such s 0.7-1.2 mm.
  • the discharge vessel may have an outer diameter selected from the range of about 4.5-12 mm, such as e.g. selected from the range of about 4-8 mm.
  • the electrodes may have a width (W2), defined parallel to a length axis of the discharge vessel, which is individually selected for the two electrodes from the range of 2- 45% of the length of the discharge vessel. Even more especially, each electrode may have a width selected from the range of 10-30% of the electrode length. The dimensions of the electrodes may especially be selected such that the electrodes have an inter electrode distance 11 selected from the range of 4-10 mm.
  • One of the electrodes may be earthed. As indicated above, in embodiments the electrodes may comprise mesh electrodes. With mesh electrodes, less light may be blocked.
  • the radiation generating system may be configured to provide in an operational mode pulsed potential differences to the electrodes, wherein the potential difference may be selected from the range of 3.5-7.5 kV, especially selected from the range of 4-6.5 kV, such as in embodiments selected from the range of 4.5-5 kV.
  • the pulse frequency selected from the range 0.5-200 kHz, like at least 1 kHz, such as especially at least 2 kHz, such as selected from the range of 7.5-150 KHz, like especially selected from the range of about 10-100 kHz.
  • the discharge vessel emits radiation (“discharge vessel radiation”) having a desirable spectral power distribution.
  • the radiation generating system may further comprise electrodes functionally coupled to the discharge vessel, wherein in an operational mode, the radiation generating system is configured to provide pulsed potential differences to the electrodes, wherein the potential difference may be selected from the range of 4.5-5 kV, with a pulse frequency selected from the range of 0.5-200 kHz, like 10-100 kHz.
  • the functional coupling of the electrodes may include an at least partial enclose of the discharge vessel.
  • the electrodes may be in physical contact with the discharge vessel.
  • the pulsed potential differences have a pulse width selected from the range of 0.25-5 ps, such as selected from the range of 0.7-1.5 ps.
  • the excimer lamp may be a dielectric barrier discharge (DBD) lamp.
  • DBD dielectric barrier discharges are a mercury free source of UV radiation.
  • halogens like bromine and chlorine may enable the generation of UV in the range of about 200-230 nm.
  • this radiation can inactivate harmful viruses by destroying their DNA/RNA, and/or inactivate other parts of the virus proteins.
  • Their wavelength is substantially long enough to prevent the generation of substantial amounts of ozone and substantially short enough not the reach the living skin cells or the cornea of humans possibly present when the UV source is operational.
  • Dielectric barrier based radiation lamps are known in the art, and are for instance described in US2010/0164410; U. Kogelschatz, Dielectric-Barrier Discharges: Their History, Discharge Physics, and Industrial Applications. Plasma Chemistry and Plasma Processing 23, 1-46, https://doi.Org/10.1023/A: 1022470901385; WO 2006/006139; and R. Brandenburg, Dielectric barrier discharges: progress on plasma sources and on the understanding of regimes and single fdaments, Plasma Sources Science and Technology, Vol. 26, No. 5, 1-29, including corrigendum, which four disclosures are herein incorporated by reference.
  • dielectric-barrier discharge is the electrical discharge between two electrodes separated by an insulating dielectric barrier.
  • DBD devices can be made in many configurations, typically planar, using parallel plates separated by a dielectric or cylindrical, using coaxial plates with a dielectric tube between them. Other shapes may also be possible, such as tubular or coaxial tubular.
  • the basic principle of these lamps may be the generation and emission of radiation by means of a dielectric barrier discharge.
  • a dielectric barrier discharge usually, at least one of the two electrodes of such a lamp is located outside the discharge volume. In embodiments, both electrodes of the lamp are located outside the discharge volume.
  • the discharge volume comprises a discharge gas, wherein the energy supply may be accomplished by capacitive coupling through the wall(s) of the discharge vessel (discharge envelope) into the discharge volume, in order to initiate within this volume the gas discharge and the excitation and emission of radiation.
  • dielectric barrier discharge lamps may be used as an alternative to conventional mercury based discharge lamps in a wide area of applications, where a radiation of a certain wavelength has to be generated for a variety of purposes.
  • UV radiation with wavelengths of between about 170 nm and about 380 nm for industrial purposes such as wastewater treatment, disinfection of gases and fluids, especially of drinking water, dichlorination or production of ultra-pure water, activation and cleaning of surfaces, curing of lacquers, inks or paints, ozone generation, or for liquid crystal display (LCD) backlighting or photocopiers and others.
  • dielectric barrier discharge lamps are of increasing importance especially as a source for generating and/or emitting high intensity and high power ultraviolet (UV) radiation in a narrow and well defined spectral range with high efficiency and high radiation intensity.
  • WO 2006/006139 (incorporated herein by reference), for instance, describes a dielectric barrier discharge lamp comprising a discharge gap being at least partly formed and/or surrounded by at least an inner wall and an outer wall, wherein at least one of the walls is a dielectric wall and at least one of the walls has an at least partly transparent part, a filling located inside the discharge gap, at least a first electrical contacting means for contacting the outer wall and a second electrical contacting means for contacting the inner wall, and at least one multifunctional means which is arranged adjacent to the discharge gap and which on the one hand serves as an improved and optimized ignition aid, especially for initial ignition or ignition after a long pause, and on the other hand serves at least as guiding means for easily arranging two walls towards each other, thereby forming an optimized discharge gap especially for coaxial dielectric barrier discharge lamps.
  • the dielectric barrier discharge lamp may comprise a discharge volume which is delimited by a first and a second wall, wherein (during operation) both walls are exposed to different electrical potentials by means of a power supply for exciting a gas discharge within the discharge volume.
  • the dielectric barrier discharge lamp may comprise a discharge volume which is delimited by essentially a single wall, wherein (during operation) different parts of the wall are exposed to different electrical potentials by means of a power supply for exciting a gas discharge within the discharge volume.
  • the (excimer) lamp is of the dielectric barrier discharge lamp type.
  • the excimer lamp may comprise a discharge vessel.
  • the discharge vessel may be tubular or coaxial tubular.
  • the discharge vessel may have a disc shape or an oval shape.
  • the shape may refer to a cross-sectional shape.
  • the discharge vessel may be coaxially shaped. Embodiments of coaxially shaped discharge vessels are described in US8174191, which is herein incorporated by reference.
  • the excimer lamp may comprise a geometry selected from the group comprising tube shape, tube shape with tubular electrodes, coaxial, disk shaped, and oval shaped. In further embodiments, at least a part of the excimer lamp may be covered by a mesh. In embodiments, the excimer lamp may comprise multiple burners.
  • the system light may have a spectral power distribution in the 200-300 nm wavelength range with 95-100% of the spectral power within the 210-245 nm wavelength range and 0-5% of the spectral power within the 250-270 nm wavelength range
  • the combination of the excimer lamp and the second reflector (and the first reflector) may provide system light have a substantial part of the spectral intensity in the 200- 230 nm wavelength range and a relatively small, but not necessarily zero, part in the 230-300 wavelength range. Intensities at other wavelengths are herein not excluded, but it is especially referred herein to the 200-300 nm wavelength range.
  • the system light may have a spectral power distribution in the 200-300 nm wavelength range with 95- 100% of the spectral power within the 200-230 nm wavelength range and 0-5% of the spectral power within the 230-300 nm wavelength range.
  • the system light has 0.5-3% of the spectral power within the 230-300 nm wavelength range (relative to the total spectral power in the 200-300 nm wavelength range), with less than 0.5% of the spectral power in the (second) wavelength range of 250-270 nm (relative to the total spectral power in the 200-300 nm wavelength range).
  • the total the spectral in tensity in the 200-300 nm wavelength range in embodiments less than 0.5% may be in the 250-270 nm wavelength range (relative to the total spectral power in the 200-300 nm wavelength range).
  • the spectral power of the system light comprises radiation reflected at the second reflector.
  • the spectral power distribution may also include intensity which may be less desirable.
  • optics are applied which may be used to optimize the generation and outcoupling of a desired spectral power distribution and/or intensity of radiation from the system.
  • the radiation generating system may also comprise (or may be functionally coupled to) a control system to control the excimer lamp, especially its operation. Further embodiments in relation to controlling the excimer lamp are described below.
  • the gas composition may comply with the following conditions: a total gas pressure P is selected from the range of 50-500 mbar, a Ch gas partial pressure pci2 is selected from the range of 0.5-4 mbar, a Ne/Kr partial pressure ratio R ⁇ c .Kr is selected from the range of 0.5-10, a Kr partial pressure p& selected from the range of over 15 mbar.
  • the gas composition may comprise at least 33% Ne.
  • the Ne/Kr partial pressure ratio Rxe.Kr may comply with the formula RNe,Kr ⁇ (0.03*P/mbar)-4. Yet further, for total gas pressures P below 150 mbar applies that Rxe.Kr is at least 0.5.
  • the gas composition may comprise Ch, Ne and Kr.
  • Other components may also be possible, but especially at least 90 %, even more especially at least 95% of the gas composition consists of Ch, Ne and Kr. Even more especially, 98% or more of the gas composition consists of Ch, Ne and Kr.
  • Other components that could be available may e.g. be one or more of Ar, Br2, N2, or H2, such as one or more of Ar and N2.
  • a composition consisting of essentially Ch, Ne and Kr appeared to provide the best results in terms of efficiency and desired emission.
  • the combination of Kr and Ch may especially provide the desired radiation of about 222 nm.
  • the total gas pressure (herein also indicated with “P”) in the discharge vessel may be about 40-1000 mbar, such as about 50-650 mbar.
  • the total gas pressure may especially be selected from the range of at least about 50 mbar and/or at maximum about 500 mbar.
  • especially the total gas pressure may be selected from the range of 50-500 mbar, such as at least 100 mbar.
  • the total gas pressure especially refers to the gas pressure in the discharge vessel at ambient temperature (and (thus) not in an operational mode), especially at about 24°C.
  • the gas composition may comprise at least about 0.5 mbar Ch (partial pressure).
  • Ch partial pressure
  • the amount of chlorine here referring to Ch
  • the chlorine partial pressure is not higher than about 4 mbar, even more especially not higher than 3.5 mbar.
  • the chlorine partial pressure may be at maximum about 3 mbar.
  • the Ch gas partial pressure pCh may be selected from the range of 0.5-3 mbar. Ch gas partial pressures pCh outside these ranges may lead to a reduction in output and efficiency. Especially, this partial pressure refers to ambient temperature (and (thus) not in an operational mode), especially at about 24°C. Partial pressures are herein also indicated with “p”.
  • the Kr partial pressure pKr may be selected from the range of over 10 mbar, even more especially at least about 15 mbar, such as at least about 16.5 mbar.
  • a too low or too high Kr partial pressure may lead to performance issues.
  • Kr gas partial pressures pKr outside these indicated ranges may lead to a reduction in output and/or efficiency.
  • the amount i.e.
  • Kr partial pressure of Kr may be larger than at lower total pressures, and at lower total pressures within the herein indicated total pressure ranges the amount of Kr may be lower than at higher total pressures.
  • the Kr partial pressure is not higher than about 67% of the total pressure, such as not higher than about 64% of the total pressure.
  • the Kr partial pressure may be at maximum about 50% of the total pressure.
  • these partial pressure refer to ambient temperature (and (thus) not in an operational mode), especially at about 20°C.
  • the gas composition comprises at least 25, such as at least 30% neon. Even more especially, the gas composition comprises at least 33% neon in the composition.
  • Ne/Kr partial pressure ratios RNe,Kr the relatively high performance and/or relatively low 258 nm intensity may be obtained, or that operation may be easier than outside the ratio range, such as in terms of voltage, frequency, startup, etc.
  • a relatively high Ne/Kr partial pressure ratio RNe,Kr may provide a relatively low about 258 nm contribution.
  • Kr performance especially efficiency may start to decrease.
  • especially the partial pressure ratio RNe,Kr is not larger than about 20, such as not larger than 10, like not larger than about 6, especially not larger than about 5.
  • too small partial pressure ratio RNe,Kr also the performance may start to decrease.
  • RNe,Kr may not be smaller than about 0.5.
  • RNe,Kr is at least 0.5.
  • the Ne/Kr partial pressure ratio RNe,Kr may be selected from the range of 1-10, especially not larger than 6, like selected from the range of 1-5. Even more especially, the Ne/Kr partial pressure ratio RNe,Kr may be selected from the range of 1.5-4.5, such as 1.5-4. With these Ne/Kr partial pressure ratios, simulations and tests were executed which gave relatively high efficiencies.
  • the Ne/Kr partial pressure ratio may be over 5, such as in the range of 5-20, like up to about, such as selected from the range of 5-10.
  • the discharge vessel may contain a gas composition, which gas composition may comply with the following conditions, especially at about 20 °C: (a) a total gas pressure P may be selected from the range of 50-500 mbar; (b) a Ch gas partial pressure pCh may be selected from the range of 0.5-3 mbar; (c) a Ne/Kr partial pressure ratio RNe,Kr may be selected from the range of 0.5-20; (d) a Kr partial pressure pKr may be selected from the range of over 15 mbar; and (e) at least 33% Ne.
  • the light chamber may comprise (a) reflective walls and (b) a chamber exit window. As described above, the internal walls of the light chamber may be reflective.
  • the inner walls of the light chamber may be specularly reflective or diffusive reflective. Yet further, some of the walls of the light chamber may be specularly reflective, while the remaining walls may be diffusively reflective.
  • the inner walls of the light chamber may comprise the first reflector. In other embodiments, the inner walls of the light chamber may comprise the second reflector.
  • the light chamber may comprise the first reflector or the second reflector, such as the inner walls of the light chamber may be the first reflector or the second reflector.
  • the chamber exit window may be an opening via which radiation may escape.
  • the chamber exit window may be an opening via which radiation may escape.
  • the chamber exit window may (also) comprise an optical filter.
  • the filter may be selective for specific wavelength of radiation (or light), (see also above).
  • the system may comprise the system exit window via which system light may escape.
  • the light chamber may enclose the discharge vessel, the first reflector and the second reflector.
  • the discharge vessel, the first reflector and the second reflector may be configured within the light chamber.
  • the radiation generating system may be configured to generate a beam of system light.
  • a beam of light refers to directional projection of light (or radiation).
  • the beam of light may have a solid angle of illumination such as a beam angle.
  • the radiation generating system in an operational mode may be configured to generate a beam of system light.
  • the beam of system light may have an optical axis (O).
  • the optical axis may be an imaginary line along the direction of propagation of light.
  • the optical axis (O) may be along the center of the beam of light, such that the beam of light may be aligned radially symmetric about the optical axis (O).
  • At least 50% of the spectral power (in Watt) may be at a beam angle 2*9 larger than 100°.
  • the beam angle is angle over which light may be spread.
  • the angle 9 may be measured from the farthest ray of light to the optical axis.
  • the beam angle may essentially be 2*9.
  • the beam angle may be at least 100°, such as at least 120°, such as at least 140°, such as at least 160°.
  • the beam angle may be defined by the full width half maximum.
  • system light may be provided as batwing beam.
  • the first reflector, the second reflector, and the discharge vessel may be configured such that the beam of system light escaping from the system may have a wavelegnth dependendent angular distribution.
  • optically filtered light may have a more narrow beam shape and optically unfiltered light may have a broader beam shape.
  • the former may have a relatively more lambertian shape than the latter, and the latter may have a relatively more batwing shape than the former.
  • some light of the discharge vessel may escape from the system without being reflected at the second reflector.
  • essentially no light escapes from the system without having been reflected at least once at the second reflector.
  • the invention may provide a method for treating a gas or a surface external of the radiation generating system.
  • the method may comprise providing the radiation to the gas or the surface with the radiation generating system.
  • the method may comprise exposing air (external from the system) to the radiation from the system.
  • the method for treating air may comprise: exposing air to the radiation from the system.
  • the method may provide one or more of disinfection of pathogens, removal of particles and dust, and removal of odors.
  • the treatment of the air may comprise disinfection of (the) air.
  • the method may comprise exposing a surface to the radiation from the system. The surface may be selected from a desk, a floor, a wall, a kitchen counter, a door handle, a tap, a handrail, a control panel, etc.
  • the embodiments described above in relation to the system of the present invention may also apply for the method of the invention.
  • the radiation may be provided in a space, e.g. in the method for treating a gas or a surface (available in the space).
  • the system may comprise a control system or may be functionally coupled to a control system.
  • the control system may especially be configured to control the (excimer) lamp.
  • the control system may control the excimer lamp in dependence of a sensor signal, a time scheme (or timer), or a user input (signal).
  • controlling and similar terms especially refer at least to determining the behavior or supervising the running of an element.
  • controlling and similar terms may e.g. refer to imposing behavior to the element (determining the behavior or supervising the running of an element), etc., such as e.g. measuring, displaying, actuating, opening, shifting, changing temperature, etc..
  • controlling and similar terms may additionally include monitoring.
  • controlling and similar terms may include imposing behavior on an element and also imposing behavior on an element and monitoring the element.
  • the controlling of the element can be done with a control system, which may also be indicated as “controller”.
  • the control system and the element may thus at least temporarily, or permanently, functionally be coupled.
  • the element may comprise the control system.
  • the control system and element may not be physically coupled. Control can be done via wired and/or wireless control.
  • the term “control system” may also refer to a plurality of different control systems, which especially are functionally coupled, and of which e.g. one control system may be a master control system and one or more others may be slave control systems.
  • a control system may comprise or may be functionally coupled to a user interface.
  • the control system may also be configured to receive and execute instructions form a remote control.
  • the control system may be controlled via an App on a device, such as a portable device, like a Smartphone or I-phone, a tablet, etc..
  • the device is thus not necessarily coupled to the lighting system, but may be (temporarily) functionally coupled to the lighting system.
  • control system may (also) be configured to be controlled by an App on a remote device.
  • the control system of the lighting system may be a slave control system or control in a slave mode.
  • the lighting system may be identifiable with a code, especially a unique code for the respective lighting system.
  • the control system of the lighting system may be configured to be controlled by an external control system which has access to the lighting system on the basis of knowledge (input by a user interface of with an optical sensor (e.g. QR code reader) of the (unique) code.
  • the lighting system may also comprise means for communicating with other systems or devices, such as on the basis of Bluetooth, WIFI, LiFi, ZigBee, BLE or WiMAX, or another wireless technology.
  • the system, or apparatus, or device may execute an action in a “mode” or “operation mode” or “mode of operation” or “operational mode”.
  • an action or stage, or step may be executed in a “mode” or “operation mode” or “mode of operation” or “operational mode”.
  • This does not exclude that the system, or apparatus, or device may also be adapted for providing another controlling mode, or a plurality of other controlling modes. Likewise, this may not exclude that before executing the mode and/or after executing the mode one or more other modes may be executed.
  • a control system may be available, that is adapted to provide at least the controlling mode.
  • the choice of such modes may especially be executed via a user interface, though other options, like executing a mode in dependence of a sensor signal or a (time) scheme, may also be possible.
  • the operation mode may in embodiments also refer to a system, or apparatus, or device, that can only operate in a single operation mode (i.e. “on”, without further tunability).
  • control system may control in dependence of one or more of an input signal of a user interface, a sensor signal (of a sensor), and a timer.
  • timer may refer to a clock and/or a predetermined time scheme.
  • the control system may e.g. control the intensity of the radiation of the excimer lamp via e.g. pulse-width modulation. For instance, in embodiments by reducing or increasing the pulse frequency, the intensity of the discharge vessel radiation may be reduced or increased, respectively.
  • the (radiation generating) system may comprise a sensor or may be functionally coupled to a sensor.
  • the sensor may be functionally coupled to a control system.
  • the system more especially the excimer lamp, may be operated in dependence of a sensor signal of a sensor.
  • the senor may be selected from the group comprising a movement sensor, a presence sensor, a distance sensor, an ion sensor, a gas sensor, a volatile organic compound sensor, a pathogen sensor, an airflow sensor, a sound sensor, a temperature sensor, and a humidity sensor.
  • a movement sensor may be used to sense people.
  • a movement sensor may also be used to sense the number of people.
  • a movement sensor may also be used to sense an activity level of the people (e.g. occupied or non-occupied working cubicle or fitness room).
  • a presence sensor may be used to sense people.
  • a presence sensor may also be used to sense the number of people.
  • a presence sensor may also be used to sense an activity level of the people (e.g. occupied or non-occupied working cubicle or fitness room).
  • a distance sensor may be used to sense one or more dimensions of a space for which the ionizer device is used.
  • a distance sensor may also be used to sense distances between people.
  • the ion sensor may comprise a positive ion sensor. Additionally or alternatively, the ion sensor may comprise a negative ion sensor.
  • the ion sensor may be used to sense the effect of the ionizer device (the more ions, the better the air treatment may be).
  • a gas sensor may be used to sense gas one or more gas components. The gas sensor may be used to sense whether ventilation is sufficient or insufficient. The gas sensor may e.g. (thus) also be used to sense the number of people and/or an activity level of the people.
  • a volatile organic compound (VOG) sensor may be used to sense one or more volatile organic compounds. The VOG sensor may be used to sense whether ventilation is sufficient or insufficient. The VOG sensor may e.g. (thus) also be used to sense the number of people and/or an activity level of the people.
  • the pathogen sensor may comprise a sensor for one or more of bacteria, viruses, and spores.
  • the pathogen sensor may be used to sense whether ventilation is sufficient or insufficient.
  • the pathogen sensor may e.g. (thus) also be used to sense the number of people and/or an activity level of the people.
  • An airflow sensor may be used to sense an airflow.
  • the airflow sensor may be used to sense whether ventilation is sufficient or insufficient.
  • the airflow sensor may e.g. (thus) also be used to sense the number of people and/or an activity level of the people.
  • a sound sensor may be used to sense sound.
  • the sound sensor may be used to sense whether ventilation is sufficient or insufficient.
  • the sound sensor may e.g. (thus) also be used to sense the number of people and/or an activity level of the people.
  • the temperature sensor may be used to sense temperature.
  • the humidity sensor may be used to sense (air) humidity. On the basis thereon, it may be determined whether pathogens may be more detrimental or less detrimental (as there seems to be a relation between humidity and transferability of e.g. airborne pathogens).
  • the (radiation generating) system may comprise a grid of a plurality of lamps or luminaires. Such grid may be installed in a roof or ceiling.
  • the individual DBD lamps or luminaires may be functionally connected to the control system.
  • the individual DBD lamps or luminaires in the grid may comprise a sensor, especially one or more of a radiation sensor and an air flow sensor.
  • a first DBD lamp or luminaire may adjust its settings based on the one or more sensor signals of one or more second DBD lamps or luminaires.
  • the individual DBD lamps or luminaires, especially the control systems thereof may communicate with one another.
  • the individual DBD lamps or luminaires may comprise means for communicating with other units, systems or devices, such as on the basis of Bluetooth, WIFI, LiFi, ZigBee, BLE or WiMAX, or another wireless technology.
  • settings of a first DBD lamp or luminaire of the grid may depend on the settings of a second DBD lamp or luminaire of the grid., wherein the settings may comprise one or more of device radiation intensity, location, etc.
  • the system may be comprised in a single DBD lamp or luminaire.
  • the invention also provides a (DBD) lamp or a luminaire comprising the light generating system as defined herein.
  • the luminaire may further comprise a light chamber, optical elements, louvres, etc.
  • the lamp or luminaire may further comprise a light chamber enclosing the light generating system.
  • the lamp or luminaire may comprise a light window (or a chamber exit window) in the light chamber or a light chamber opening, through which the system light may escape from the light chamber.
  • space may for instance relate to a (part of) hospitality area, such as a restaurant, a hotel, a clinic, or a hospital, etc..
  • the term “space” may also relate to (a part of) an office, a department store, a warehouse, a cinema, a church, a theatre, a library, etc.
  • the term “space” may also relate to (a part of) a working space in a vehicle, such as a cabin of a truck, a cabin of an air plane, a cabin of a vessel (ship), a cabin of a car, a cabin of a crane, a cabin of an engineering vehicle like a tractor, etc.
  • space may also relate to (a part of) a working space, such as an office, a (production) plant, a power plant (like a nuclear power plant, a gas power plant, a coal power plant, etc.), etc.
  • the term “space” may also relate to a control room, a security room, etc.
  • the term “space” may herein refer to an indoor space.
  • the term “space” may also relate to a toilet room or bathroom.
  • the term “space” may also relate to an elevator.
  • the term “space” may also refer to a conference room, a school room, an indoor hallway, an indoor corridor, an indoor space in an elderly home, an indoor space in a nursing home, etc.
  • the term “space” may refer to an indoor sport space, like a gym, a gymnastics hall, in indoor ball sport space, a ballet room, a swimming pool, a changing room, etc.
  • the term “space” may refer to an (indoor) bar, an (indoor) disco, etc. The method may be executed in dependence of a sensor signal of a sensor (see further also above).
  • light and radiation are herein interchangeably used, unless clear from the context that the term “light” only refers to visible light.
  • the terms “light” and “radiation” may thus refer to UV radiation, visible light, and IR radiation.
  • Fig. 1 schematically depict an embodiment of the invention
  • FIG. 2a-2c and Figs. 3a-3c schematically depict some aspects and embodiments.
  • FIG. 4 schematically depicts an embodiment of an application.
  • the schematic drawings are not necessarily to scale.
  • Fig. 1 schematically depicts an embodiment of a radiation generating system 1000, which may comprise an excimer lamp 100, a light chamber 510, and optics 450.
  • the excimer lamp 100 may comprise a discharge vessel 400.
  • the discharge vessel 400 may contain a gas composition 405 comprising chlorine, neon, and krypton.
  • the excimer lamp 100 may be configured to generate in an operational mode radiation 101 having one or more wavelengths in the wavelength range of 200-300 nm.
  • the optics 450 may comprise a first reflector 410 and a second reflector 420.
  • the discharge vessel 400 may be configured between the first reflector 410 and the second reflector 420.
  • the first reflector 410 may be configured to reflect at least part of the radiation 101 in a direction of the second reflector 420.
  • the excimer lamp 100, the first reflector 410, and the second reflector 420 may be configured such that at least part of the radiation 101 can only escape from the radiation generating system 1000 via at least a reflection at the second reflector 420.
  • the second reflector 420 may have a first wavelength averaged reflection R1 in a first wavelength range 210-245 nm and a second wavelength averaged reflection R2 in a second wavelength range of 250-270 nm.
  • the second reflector 420 may have a third wavelength averaged reflection R3 in a third wavelength range of 190 nm and smaller.
  • the radiation generating system 1000 may be configured to generate system light 1001 comprising at least part of the radiation 101 reflected at the second reflector 420.
  • Rl>50%, R2 ⁇ 20%, and R3 ⁇ 20% may apply.
  • at least 80% of the spectral power of the system light 1001 may comprise radiation 101 reflected at the second reflector 420.
  • the first reflector 410 may comprise a planar first cross- sectional shape.
  • the second reflector 420 may comprise a planar second cross-sectional shape.
  • the first reflector 410 and the second reflector 420 may be configured parallel.
  • the planar first cross-sectional shape may have a smaller area than the planar second cross-sectional shape. Many other possible shapes are schematically depicted in Figs. 2a.
  • the system exit window 1020 may comprise a luminescent material 200.
  • the luminescent material may comprise phosphor material.
  • the excimer lamp 100 may be of the dielectric barrier discharge lamp type.
  • the discharge vessel 400 may be coaxially shaped.
  • the discharge vessel 400 may be a tubular discharge vessel 400.
  • the system light 1001 may have a spectral power distribution in the 200-300 nm wavelength range with 95-100% of the spectral power within the 210-245 nm wavelength range and 0-5% of the spectral power within the 250-270 nm wavelength range.
  • the gas composition 405 may comply with the following conditions: a total gas pressure P is selected from the range of 50-500 mbar, a Ch gas partial pressure pci2 is selected from the range of 0.5-4 mbar, a Ne/Kr partial pressure ratio R ⁇ c .Kr is selected from the range of 0.5-10, a Kr partial pressure p& selected from the range of over 15 mbar, at least 33% Ne, and the Ne/Kr partial pressure ratio R ⁇ c .Kr complies with the formula RNe,Kr ⁇ (0.03*P/mbar)-4. Especially, for total gas pressures P below 150 mbar applies that R-Ne.Kr is at least 0.5.
  • the light chamber 510 may comprise (a) reflective walls 512 and (b) a chamber exit window 511. Especially, the light chamber 510 may enclose the discharge vessel 400, the first reflector 410 and the second reflector 420. Further, the radiation generating system 1000 may be configured to generate a beam 1011 of system light 1001 (see also Fig. 4). Especially, the beam 1011 of system light 1001 may have an optical axis (O). In embodiments, in at least one cross-section of the beam 1011 parallel to the optical axis (O), at least 50% of the spectral power in Watt may be at a beam angle 2*9 larger than 100°.
  • Reference Ax indicates an axis of the discharge vessel 400.
  • the discharge vessel 400 may be elongated (perpendicular to the plane of drawing).
  • Reference RAI indicates an axis of elongation of the first reflector 410.
  • the first reflector 410 may be elongated (perpendicular to the plane of drawing).
  • Reference RA2 indicates an axis of elongation of the second reflector 420.
  • the second reflector 410 may be elongated (perpendicular to the plane of drawing).
  • the axes Ax, RAI, and RA2 may be configured parallel. Referring to e.g. Fig.
  • a majority of the radiation 101 provided by the excimer lamp over at least about 120° (especially when assuming an essentially cylindrical cross-section), such as at least about 150°, may be reflected (at least once, by at least one of the reflectors).
  • the invention may provide a method for treating a gas or a surface external of the radiation generating system 1000.
  • the method may comprise providing the radiation 101 to the gas or the surface with the radiation generating system 1000.
  • Fig. 2A schematically depicts several embodiments of the radiation generating system, particularly demonstrating the configuration of the first reflector and the second reflector in embodiments. Hence, specific embodiments of the invention are described herein.
  • the first reflector 410 may have a planar cross-sectional shape and the second reflector 420 may (also) have a planar cross-sectional shape.
  • the first reflector 410 may be configured closer to the chamber exit window 511 than the second reflector 420.
  • the second reflector 420 may have a larger cross- sectional area than the first reflector 410.
  • the first reflector 410 may be curved in at least one direction defining a first reflector cavity 415. Further, the discharge vessel 400 may be at least partly configured within the first reflector cavity 415. Especially, the second reflector may have a planar cross-sectional shape. Yet further, the first reflector may be configured closer to the chamber exit window 511 than the second reflector 420.
  • the first reflector 410 may be curved in at least one direction defining a first reflector cavity 415. Further, the discharge vessel 400 may be at least partly configured within the first reflector cavity 415. Especially, the second reflector 420 may comprise n3 segments 441, wherein n3 is 3. Further, the second reflector 420 comprising 3 segments may be joined along an edge (or opposite edges), such that the segments form an angle of 90° between two segments. Yet further, the first reflector may be configured closer to the chamber exit window 511 than the second reflector 420.
  • the first reflector 410 may have a planar cross-sectional shape
  • the second reflector 420 may comprise n3 segments 441, wherein n3 is 3.
  • the n3 segments 441 may form a second reflector cavity 425, wherein the discharge vessel 400 is at least partly configured within the second reflector cavity 425.
  • the second reflector 420 comprising 3 segments may be joined along an edge (or opposite edges), such that the segments form an angle larger than 90° between two segments.
  • the first reflector 410 may be curved in at least one direction defining a first reflector cavity 415
  • the second reflector 420 may be curved in at least one direction defining a second reflector cavity 425.
  • the discharge vessel 400 may be configured either in the first reflector cavity 415, or the second reflector cavity 425.
  • the first reflector 410 may have a planar configuration, and the second reflector 420 may be curved at least in one direction, such that the second reflector defines a second reflector cavity 425.
  • the discharge vessel 400 may be configured within the second reflector cavity 425.
  • the first reflector 410 may have a planar configuration, and the second reflector 420 may be curved in at least one direction.
  • the second reflector 420 may be reflective on the concave side of the second reflector 420.
  • the second reflector may essentially be reflective in a manner similar to a concave mirror.
  • the cross-sectional area of the first reflector 410 may be larger than the cross- sectional area of the second reflector 420.
  • the first reflector 410 may be curved in at least one direction defining a first reflector cavity 415. Further, the discharge vessel 400 may be at least partly configured within the first reflector cavity 415.
  • the second reflector 420 may comprise a double semi-cylinder-like cross-sectional shape, comprising two reflector regions 421, each comprising a semi-cylinder-like cross-sectional shape. Hence, the second reflector 420 may have a W-shape. Wherein (i) a center line 422 defining a middle between the two reflector regions 421, (ii) a discharge vessel axis (A) of the discharge vessel 400, and a center line 412 of the first reflector 410 may be configured in single a plane.
  • the first reflector 410 may have a planar cross-sectional shape
  • the second reflector 420 may comprise a double semi-cylinder-like cross-sectional shape, comprising two reflector regions 421, each comprising a semi-cylinder-like cross- sectional shape.
  • the second reflector 420 may have a W-shape.
  • the first reflector 410 may have a planar cross-sectional shape.
  • the light chamber 510 may comprise the second reflector 420, i.e. the inner walls of the light chamber 510 may be the second reflector 420.
  • the first reflector may have a planar cross-sectional shape.
  • the radiation generating system 1000 may comprise a plurality n4 of second reflectors 420, wherein n4 is at least 2, wherein a set of two adjacent second reflectors 420 have a mutual distance (dr2) providing a second reflector opening 427.
  • the set of two adjacent second reflectors 420 may be configured such that part of the radiation from the discharge vessel 400 propagates through the second reflector opening 427. Specifically, with at least one reflection at one of the two adjacent second reflectors 420.
  • the n4 second reflectors 420 are configured closer to the system exit window 1020 than the first reflector 410.
  • the radiation generating system 1000 may comprise a plurality n2 of first reflectors 410, wherein n2 is at least 2, wherein a set of two adjacent first reflectors 410 have a mutual distance (drl) providing a first reflector opening 417.
  • the set of two adjacent first reflectors 410 may be configured such that part of the radiation from the discharge vessel 400 propagates through the first reflector opening 417, with at least one reflection at one of the two adjacent first reflectors 410.
  • the n2 first reflectors 410 may be configured closer to the system exit window 1020 than the second reflector 420.
  • the first reflector 410 may comprises nl segments 431, wherein nl is at least 2, such as 3. Especially, the nl segments 431 form a first reflector cavity 415. Further, the discharge vessel 400 may be at least partly configured within the first reflector cavity 415. Yet further, the second reflector may have a planar cross-section.
  • Fig. 2a Some of the schematically depicted embodiments of Fig. 2a may allow that under larger angles some light of the discharge vessel may escape from the system 1000 without being reflected at the second reflector.
  • Fig. 2B schematically depicts an embodiment (I) of the second reflector 420.
  • the second reflector 420 may comprise one or more dichroic filters 470, wherein the dichroic filter 470 may be provided on a support 429.
  • the figure also further depicts an embodiment (II) of the second reflector 420, which may comprise a luminescent material 200.
  • the figure also depicts an embodiment (III), wherein the second reflector may comprise a plurality of segments (joined to form the second reflector). Especially, the segments may be joined such that the second reflector 420 is curved in one direction. Further, each segment may comprise either the dichroic filter or the luminescent material.
  • Luminescent materials are described above. An example is e.g.
  • M comprises one or more of Sr, Ba, and Ca
  • A comprises one or more of Al and Ga, such as SrAli20i9:Ce 3+
  • the aluminate may for instance comprise 0.1-5 mol% Ce.
  • Fig. 2c schematically depicts in perspective view an embodiment analogous to embodiment V of Fig. 2a. Aspects described in relation to this drawing, may also apply to other embodiments schematically depicted in Fig. 2a.
  • Reference Ax refers to the discharge vessel axis and references RAI and RA2 refers to the reflector axes of the first reflector 410 and second reflector 420, respectively. In these embodiments, the axes are axes of elongation.
  • LD refers to the length of the discharge vessel 400.
  • LI refers to the length of the first reflector 410;
  • L2 refers to the length of the second reflector 420.
  • Figs. 3 A-3B depict some selective reflective properties of the second reflector. On the y-axis, the reflectiveness is indicated, and on the x-axis the wavelength in nanometers.
  • Curve a in Fig. 3 A schematically depicts a kind of binary optical (second) reflector 420, having high reflectivity in the 170-245 nm range and above about 275 nm, but essentially zero in between 245-275 nm.
  • Curves b and c schematically show other embodiments, wherein the reflectivity dependence over the wavelength is more gradual, and may also not necessarily drop to about 0% reflectivity, but e.g. on average about a few % reflectivity in the less desired wavelength ranges. Note that the choice of about 170 nm, about 245 nm, and about 275 may also be different in other embodiments.
  • Fig. 3C schematically depicts the light distribution curve (or candlepower distribution curve), herein the form of a batwing distribution.
  • This figure depicts an embodiment of the angular distribution of system light 1001 provided by the light generating system or lighting device.
  • the numbers on the axes can be ignored.
  • the optical axis may be the vertical axis from the value of 0 in the middle at the top to the value of -2.5 in the middle at the bottom of the graph.
  • Fig. 4 schematically depicts an embodiment of a lighting device 1200.
  • a lighting device 1200 may be selected from the group of a lamp 1, a luminaire 2, a projector device 3, a disinfection device, a photochemical reactor, and an optical wireless communication device, comprising the light generating system 1000 as described herein.
  • Reference 301 indicates a user interface which may be functionally coupled with the control system 300 comprised by or functionally coupled to the light generating system 1000.
  • the figure also schematically depicts an embodiment of lamp 1 comprising the light generating system 1000.
  • Reference 3 indicates a projector device or projector system, which may be used to project images, such as at a wall, which may also comprise the light generating system 1000.
  • such lighting device may be a lamp 1, a luminaire 2, a projector device 3, a disinfection device, or an optical wireless communication device.
  • Lighting device light escaping from the lighting device 1200 is indicated with reference 1201.
  • Lighting device light 1201 may essentially consist of system light 1001, and may in specific embodiments thus be system light 1001.
  • Reference 310 indicates a sensor element which may be configured to provide a sensor signal to the control system 300.
  • Reference 1300 indicates a space, such as an office or a living room.
  • UV- C (200-280 nm) radiation can effectively render viruses ineffective even at relatively low doses. This makes UV treatment of surfaces an interesting candidate to fight the spread of these kind of viruses through contact with contaminated surfaces.
  • short wavelength UV radiation can give rise to DNA mutations if the radiation hits the unprotected skin. For lamps using Hg 254 nm radiation which are commonly used disinfection lamps this limits the allowable exposure in areas where humans are present or may be present.
  • far-UV wavelengths ⁇ 230 nm
  • the UV radiation source is based on a KrCl excimer discharge.
  • multiple UV sources may be applied in the UV system.
  • the UV source may be based on a tubular geometry, e.g. single tube, coaxial, etc. In embodiments, the UV source may be based on a disc shape or oval geometry.
  • upstream and downstream relate to an arrangement of items or features relative to the propagation of the light from a light generating means (here the especially the light source), wherein relative to a first position within a beam of light from the light generating means, a second position in the beam of light closer to the light generating means is “upstream”, and a third position within the beam of light further away from the light generating means is “downstream”.
  • a phrase “item 1 and/or item 2” and similar phrases may relate to one or more of item 1 and item 2.
  • the term “comprising” may in an embodiment refer to "consisting of' but may in another embodiment also refer to "containing at least the defined species and optionally one or more other species”.
  • any reference signs placed between parentheses shall not be construed as limiting the claim.
  • Use of the verb "to comprise” and its conjugations does not exclude the presence of elements or steps other than those stated in a claim.
  • the words “comprise”, “comprising”, and the like are to be construed in an inclusive sense as opposed to an exclusive or exhaustive sense; that is to say, in the sense of “including, but not limited to”.
  • the invention may be implemented by means of hardware comprising several distinct elements, and by means of a suitably programmed computer.
  • a device claim, or an apparatus claim, or a system claim enumerating several means, several of these means may be embodied by one and the same item of hardware.
  • the mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage.
  • the invention (thus) provides a software product, which, when running on a computer is capable of bringing about (one or more embodiments of) the method as described herein.
  • the invention also provides a control system that may control the device, apparatus, or system, or that may execute the herein described method or process. Yet further, the invention also provides a computer program product, when running on a computer which is functionally coupled to or comprised by the device, apparatus, or system, controls one or more controllable elements of such device, apparatus, or system.
  • the invention further applies to a device, apparatus, or system comprising one or more of the characterizing features described in the description and/or shown in the attached drawings.
  • the invention further pertains to a method or process comprising one or more of the characterizing features described in the description and/or shown in the attached drawings.

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Veterinary Medicine (AREA)
  • Public Health (AREA)
  • General Health & Medical Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Engineering & Computer Science (AREA)
  • Molecular Biology (AREA)
  • Medicinal Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Chemical & Material Sciences (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Abstract

L'invention concerne un système de génération de rayonnement (1000) comprenant une lampe à excimères (100), une chambre de lumière (510) et un élément optique (450), la lampe à excimères (100) comprenant un tube à décharge (400), le tube à décharge (400) contenant une composition de gaz (405) comprenant du chlore, du néon et du krypton ; la lampe à excimères (100) étant conçue pour générer, dans un mode de fonctionnement, un rayonnement (101) ayant une ou plusieurs longueurs d'onde dans la plage de longueurs d'onde de 200 à 300 nm ; l'élément optique (450) comprenant un premier réflecteur (410) et un second réflecteur (420) ; le tube à décharge (400) étant conçu entre le premier réflecteur (410) et le second réflecteur (420) ; le premier réflecteur (410) étant conçu pour réfléchir au moins une partie du rayonnement (101) dans une direction du second réflecteur (420) ; la lampe à excimères (100), le premier réflecteur (410) et le second réflecteur (420) étant conçus de telle sorte qu'au moins une partie du rayonnement (101) ne puisse s'échapper du système de génération de rayonnement (1000) que par l'intermédiaire d'au moins une réflexion au niveau du second réflecteur (420) ; le second réflecteur (420) ayant une première réflexion R1 moyennée sur les longueurs d'onde dans une première plage de longueurs d'onde de 210 à 245 nm, une deuxième réflexion R2 moyennée sur les longueurs d'onde dans une deuxième plage de longueurs d'onde de 250 à 270 nm et une troisième réflexion R3 moyennée sur les longueurs d'onde dans une troisième plage de longueurs d'onde inférieures ou égales à 190 nm, les relations R2/R1 ≤ 0,6 et R3/R1 ≤ 0,6 étant satisfaites ; le système de génération de rayonnement (1000) étant conçu pour générer une lumière de système (1001) comprenant au moins une partie du rayonnement (101) réfléchi au niveau du second réflecteur (420).
PCT/EP2023/062354 2022-05-12 2023-05-10 Lampe de désinfection avec réflecteur WO2023217824A1 (fr)

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Citations (6)

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Publication number Priority date Publication date Assignee Title
WO2006006139A1 (fr) 2004-07-09 2006-01-19 Philips Intellectual Property & Standards Gmbh Lampe a decharge a barriere dielectrique avec moyen multifonctionnel integre
US20100164410A1 (en) 2007-04-18 2010-07-01 Koninklijke Philips Electronics N.V. Dielectric barrier discharge lamp
US8174191B2 (en) 2008-07-15 2012-05-08 Osram Ag Dielectric barrier discharge lamp configured as a coaxial double tube having a getter
US10071262B2 (en) 2011-03-07 2018-09-11 The Trustees Of Columbia University In The City Of New York Apparatus, method, and system for selectively effecting and/or killing bacteria
CN109630981A (zh) * 2017-10-06 2019-04-16 波音公司 用于光照组件的反射器系统
WO2022043167A2 (fr) 2020-08-26 2022-03-03 Signify Holding B.V. Dispositif d'émission d'uv lointain, luminophore (combinaison), luminaire, système de désinfection et utilisation

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WO2006006139A1 (fr) 2004-07-09 2006-01-19 Philips Intellectual Property & Standards Gmbh Lampe a decharge a barriere dielectrique avec moyen multifonctionnel integre
US20100164410A1 (en) 2007-04-18 2010-07-01 Koninklijke Philips Electronics N.V. Dielectric barrier discharge lamp
US8174191B2 (en) 2008-07-15 2012-05-08 Osram Ag Dielectric barrier discharge lamp configured as a coaxial double tube having a getter
US10071262B2 (en) 2011-03-07 2018-09-11 The Trustees Of Columbia University In The City Of New York Apparatus, method, and system for selectively effecting and/or killing bacteria
CN109630981A (zh) * 2017-10-06 2019-04-16 波音公司 用于光照组件的反射器系统
WO2022043167A2 (fr) 2020-08-26 2022-03-03 Signify Holding B.V. Dispositif d'émission d'uv lointain, luminophore (combinaison), luminaire, système de désinfection et utilisation

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Title
BRANDENBURG: "Dielectric barrier discharges: progress on plasma sources and on the understanding of regimes and single filaments,", PLASMA SOURCES SCIENCE AND TECHNOLOGY, vol. 26, no. 5, pages 1 - 29
U.KOGELSCHATZ: "Dielectric-Barrier Discharges:Their History, Discharge Physics, and Industrial Applications.", PLASMA CHEMISTRY AND PLASMA PROCESSING, vol. 23, pages 1 - 46

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