WO2023143042A1 - Exposure apparatus - Google Patents

Exposure apparatus Download PDF

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Publication number
WO2023143042A1
WO2023143042A1 PCT/CN2023/071529 CN2023071529W WO2023143042A1 WO 2023143042 A1 WO2023143042 A1 WO 2023143042A1 CN 2023071529 W CN2023071529 W CN 2023071529W WO 2023143042 A1 WO2023143042 A1 WO 2023143042A1
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WO
WIPO (PCT)
Prior art keywords
exposure
roller
masking
masking film
speed
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PCT/CN2023/071529
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French (fr)
Chinese (zh)
Inventor
刘萧松
李克强
吴志阳
卢毅
Original Assignee
宁德时代新能源科技股份有限公司
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Application filed by 宁德时代新能源科技股份有限公司 filed Critical 宁德时代新能源科技股份有限公司
Publication of WO2023143042A1 publication Critical patent/WO2023143042A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Definitions

  • the present application relates to the field of exposure technology, and more specifically, to an exposure device.
  • Exposure equipment is a device that uses ultraviolet light emitted by a light source to transfer image information on a transparent body (such as a film sheet) to the surface of the material. It is widely used in printing, flexible electronics and other fields. During the mass production process, the material is continuously conveyed along the conveyor belt or in other ways, and the film is fixed between the light source and the material to expose the material.
  • the embodiment of the present application provides an exposure device, which can provide continuous exposure for materials so as to improve exposure efficiency and exposure performance.
  • an embodiment of the present application provides an exposure device, the device comprising: an exposure device for exposing materials; a feeding device for continuously transporting the materials to the exposure device at a first speed along the feeding direction Exposure area; a masking device, used for continuously conveying a masking film to the exposure area at the first speed along the feeding direction, and the masking film is used for regional shading when the exposure device exposes the material; The feeding device and the masking device make the feeding path of the material and the masking film coincide when entering the exposure area.
  • the exposure equipment has a masking device capable of continuously transporting the masking film to the exposure area.
  • the masking film is no longer fixed between the light source and the material, but passes through the exposure area together with the material at the same speed and direction , to achieve continuous exposure; and, during the exposure process, the masking film and the material always maintain the same movement path, which can ensure that the pattern on the masking film is exposed to the material quickly, completely and consistently, with good pattern consistency; in addition, the exposure The pattern does not need to be consistent with the traveling direction of the material, which enables the exposure equipment to process continuous complex patterns, improves the working efficiency of the exposure equipment, and improves the exposure performance of the exposure equipment.
  • the covering device includes: a first discharging roller, a first driving roller and a first receiving roller; wherein, the first discharging roller and the first receiving roller are respectively arranged on the On both sides of the exposure device, the first driving roller rotates at the first speed as a linear speed, so that the masking film continuously enters the exposure area at the first speed.
  • the masking device transports the masking film in a roll-to-roll manner, and can control the motion state of the masking film by controlling the speed and direction of rotation of the first driving roller, thereby realizing flexible control of the masking film and helping to improve exposure Equipment flexibility.
  • the masking device includes: a first driven roller for supporting the masking film so that the masking film passes through the exposure area and leaves the exposure area continuously at the first speed .
  • the movement state of the masking film in the exposure area is precisely controlled by setting the first driven roller so that the masking film between the first driving roller and the first driven roller passes through and leaves the exposure area stably.
  • the covering device further includes: a first guide roller, arranged between the first discharge roller and the first driving roller and/or between the first driven roller and the first driving roller. Between a receiving roller, it is used to support the masking film so that the masking film is transported according to the arrangement path of the first guide roller.
  • the masking film is conveyed according to the arrangement path of the guiding rollers, which facilitates the control of the conveying path of the masking film.
  • the feeding device includes: a second discharging roller, a second driving roller, and a second receiving roller; wherein, the second discharging roller and the second receiving roller are respectively arranged on the The two sides of the exposure device, the second driving roller rotates at the first speed as the linear speed, so that the material and the masking film are rolled by the first driving roller and the second driving roller And continuously enter the exposure area at the first speed.
  • the roll-to-roll material delivery method is adopted, so that the material can be collected quickly after processing, and the working efficiency of the exposure device can be improved; secondly, by controlling the speed and rotation direction of the second driving roller that transports the material, it can Control the movement state of the material, realize the flexible control of the material, and help to improve the flexibility of the exposure equipment; moreover, the second driving roller and the first driving roller form a rolling pressure, so that the conveying path of the masking film and the material is the same, and can be entered synchronously In the exposure area, while improving the consistency of the masking film and material movement, it can also be controlled by a set of control system to reduce the rotation error between the roller shaft and the roller shaft, and further improve the consistency of the masking film and material movement.
  • the feeding device includes: a second driven roller for supporting the material so that the material passes through the exposure area and leaves the exposure area continuously at the first speed.
  • the second driven roller when the second driven roller is set at a position corresponding to the first driven roller, it can also form a rolling pressure on the exposed masking film and material, so that the roller between the driving roller and the driven roller The masking film and materials can pass through and leave the exposure area smoothly; by setting the second driven roller, the movement state of the materials in the exposure area can be precisely controlled, helping to improve the movement stability of the masking film and materials in the exposure area.
  • the feeding device further includes: a second guide roller, arranged between the second discharge roller and the second driving roller and/or arranged between the second driven roller and the second driving roller. Between the second receiving rollers, it is used to support the materials, so that the materials are transported according to the arrangement path of the second guide rollers.
  • the movement trajectory of the material can be supported and designed by setting the second guide roller, so that the material can move along the required trajectory, which facilitates the design of the exposure equipment to be more compact, while improving the stability of the movement of the material.
  • the volume of the exposure equipment is reduced.
  • the exposure device includes: a plurality of light sources arranged in a row along the feeding direction.
  • the exposure area of the material in the exposure area at the same time can be increased, thereby improving the working efficiency of the exposure equipment.
  • the apparatus includes: a first exposure device and a second exposure device respectively disposed on a first side of the material and a second side opposite to the first side.
  • the apparatus comprises: a first masking device and a second masking device disposed on the first side and the second side, respectively.
  • both sides of the material can be exposed simultaneously when the material passes through the exposure area, thereby improving the working efficiency of the exposure equipment.
  • the masking film of the first masking means has the same pattern as the masking film of the second masking means.
  • the pattern of the masking film on both sides of the material is the same, so that the exposed material can have completely consistent and corresponding patterns on both sides, so that structures such as through holes are formed in some application scenarios, so that the exposure equipment can Applied in the hole making process, the application scene of the exposure equipment is expanded.
  • Fig. 1 is a schematic structural diagram of a vehicle of the present application
  • Fig. 2 is a schematic structural diagram of a battery of the present application
  • Fig. 3 is a schematic structural diagram of an exposure device of the present application.
  • Fig. 4 is a schematic structural diagram of a masking film of the present application.
  • Fig. 5 is a schematic structural view of another exposure device of the present application.
  • the general processing method is: coating photoresist on the surface of the current collector, covering the processed masking film, exposing the exposure source through the exposure source, after developing the patterned photoresist on the masking film, and then etching the current collector. Recesses are formed on the surface of the current collector.
  • the masking film is fixed between the light source and the current collector.
  • the current collector is usually a continuous copper foil strip or aluminum foil strip, and its surface is coated with photoresist, which can be compared with the light source. With the masking film being shipped continuously.
  • the current collector since the positions of the masking film and the light source are fixed, the current collector needs to stay in the exposure area to wait for exposure during exposure. The fluid continues to be transported to the exposure area, so that the current collector needs to stay in the exposure area periodically, and the light source also needs to start exposure periodically, thus limiting the throughput of the exposure equipment.
  • the pattern on the masking film needs to be consistent with the direction in which the current collector is transported, which limits the diversification of exposure patterns and makes it impossible to expose complex patterns.
  • the present application provides an exposure device, which enables the ring-shaped masking film and the current collector to move synchronously in the exposure area through the masking device, and can provide the current collector. Continuous exposure improves exposure efficiency and exposure performance.
  • the embodiments of the present application take the processing of current collectors as an example, and the exposure equipment provided in the embodiments of the present application can be used, but not limited, to manufacture current collectors. It can also be used in the graphics processing operations of display panels, integrated circuits and semiconductors, and can also improve exposure efficiency, production efficiency and the complexity of exposure patterns.
  • batteries as a main power equipment, have been widely used in many fields such as electronic equipment, electric bicycles, electric motorcycles, electric vehicles, military equipment, and aerospace.
  • the vehicle 1 can be a fuel vehicle, a gas vehicle or a new energy vehicle, and the new energy vehicle can be a pure electric vehicle, a hybrid vehicle or an extended-range vehicle, etc. .
  • a motor 11 , a controller 12 and a battery 10 can be arranged inside the vehicle 1 , and the controller 12 is used to control the battery 10 to supply power to the motor 11 .
  • the battery 10 may be provided at the bottom or front or rear of the vehicle 1 .
  • the battery 10 can be used for power supply of the vehicle 1 , for example, the battery 10 can be used as an operating power source of the vehicle 1 , for a circuit system of the vehicle 1 , for example, for starting, navigating and running power requirements of the vehicle 1 .
  • the battery 10 can not only be used as an operating power source for the vehicle 1 , but can also be used as a driving power source for the vehicle 1 , replacing or partially replacing fuel or natural gas to provide driving power for the vehicle 1 .
  • a battery refers to a physical module including one or more battery cells to provide electrical energy.
  • the battery mentioned in this application may include a battery module or a battery pack, and the like.
  • Batteries generally include a case for enclosing one or more battery cells. The box can prevent liquid or other foreign objects from affecting the charging or discharging of the battery cells.
  • the battery may include multiple battery cells, wherein the multiple battery cells may be connected in series, in parallel or in parallel, and the hybrid connection refers to a mixture of series and parallel connections. Batteries can also be called battery packs.
  • a plurality of battery cells can be connected in series, parallel or mixed to form a battery module, and then a plurality of battery modules can be connected in series, parallel or mixed to form a battery. That is to say, multiple battery cells can directly form a battery, or form a battery module first, and then form a battery from the battery module.
  • the battery 10 may include a plurality of battery cells 20 .
  • the number of battery cells 20 can be set to any value. Multiple battery cells 20 can be connected in series, in parallel or in parallel to achieve greater capacity or power.
  • the battery cell 20 may include a lithium-ion secondary battery, a lithium-ion primary battery, a lithium-sulfur battery, a sodium-lithium-ion battery, a sodium-ion battery, or a magnesium-ion battery, which is not limited in this embodiment of the present application.
  • the battery cells 20 can also be referred to as battery cells.
  • the battery cell 20 includes an electrode assembly and an electrolyte, and the electrode assembly is composed of a positive electrode sheet, a negative electrode sheet and a diaphragm.
  • a battery cell works primarily by moving metal ions between the positive and negative plates.
  • the positive electrode sheet includes a positive electrode current collector and a positive electrode active material layer.
  • the positive electrode active material layer is coated on the surface of the positive electrode current collector.
  • the current collector not coated with the positive electrode active material layer protrudes from the current collector coated with the positive electrode active material layer.
  • the current collector coated with the positive electrode active material layer serves as the positive electrode tab.
  • the material of the positive electrode current collector can be aluminum, and the positive electrode active material can be lithium cobaltate, lithium iron phosphate, ternary lithium or lithium manganate.
  • the negative electrode sheet includes a negative electrode current collector and a negative electrode active material layer.
  • the negative electrode active material layer is coated on the surface of the negative electrode current collector.
  • the current collector without the negative electrode active material layer protrudes from the current collector coated with the negative electrode active material layer.
  • the current collector coated with the negative electrode active material layer serves as the negative electrode tab.
  • the material of the negative electrode current collector may be copper, and the negative electrode active material may be carbon or silicon.
  • the number of positive pole tabs is multiple and stacked together, and the number of negative pole tabs is multiple and stacked together.
  • the material of the diaphragm can be polypropylene (Polypropylene, PP) or polyethylene (Polyethylene, PE).
  • the electrode assembly may be a wound structure or a laminated structure, which is not limited in the embodiment of the present application.
  • Exposure equipment 300 includes:
  • Exposure device 301 used for exposing material 30;
  • the feeding device 302 is used to continuously transport the material 30 to the exposure area 301a of the exposure device 301 at a first speed along the feeding direction;
  • the masking device 303 is used to continuously convey the masking film 31 to the exposure area 301a at a first speed along the feeding direction.
  • the masking film 31 is used to perform regional shading when the exposure device 301 exposes the material 30.
  • the feeding device 302 and the masking device 303 make the material 30 coincides with the feeding path of the mask film 31 when it enters the exposure region 301a.
  • the material 30 includes a substrate and a photoresist coated thereon, and the substrate may be a current collector (a positive current collector or a negative current collector), a circuit board, and the like.
  • the exposure device 301 has a light source 3011, which can emit light in the UV band to the material, corresponding to the exposure area 301a. The light emitted by the exposure device 301 in this area is blocked by the masking film 31, so that the light part passes through the masking film 31 to reach the surface of the material 30 and light.
  • the engraving works.
  • the material 30 and the masking film 31 in the exposure area 301a move in the same direction and at the same speed, that is, the material 30 and the masking film 31 move synchronously in the exposure area 301a.
  • FIG. 4 it is a schematic structural view of a masking film 31 according to an embodiment of the present application.
  • the masking film 31 has a light-shielding portion 311 and a light-transmitting portion 312 , and the light-shielding portion 311 and/or the light-transmitting portion 312 constitute an exposure pattern on the masking film 31 .
  • the light shielding portion 311 shown in FIG. 4 is circular, and a plurality of light shielding portions 311 are arranged in a rectangular array.
  • the shape of the light-shielding portion 311 can also be in other forms, and the shape, quantity, and arrangement of the light-shielding portion 311 or the light-transmitting portion 312 can be set according to actual processing requirements, which is not limited in this application.
  • Photoresist also known as photoresist, refers to a thin corrosion-resistant material whose solubility changes through irradiation or radiation of ultraviolet light, electron beams, ion beams, X-rays, etc.
  • Photoresist can be a light-sensitive mixed liquid composed mainly of photosensitive resin, sensitizer and solvent. Using an appropriate selective photoresist, the desired pattern can be obtained on the surface.
  • the exposed part of the photoresist is melted, and the unexposed part remains, and this type of photoresist is a positive photoresist; in other embodiments, it can also be Yes, after the photoresist is exposed and developed, the exposed part is retained, while the unexposed part is dissolved.
  • This type of photoresist is a negative photoresist.
  • the exposure process uses light to project the pattern on the mask film 31 onto the photoresist after passing through the optical system, so as to realize pattern transfer.
  • the exposure equipment 300 provided in the embodiment of the present application, it can be understood that the exposure equipment 300 in the embodiment of the present application is a photolithography method that uses the light of the exposure device 301 to project the pattern on the masking film 31 onto the surface of the substrate after being irradiated by light. Glue on.
  • the light-transmitting portion 312 allows light to pass through and irradiate the photoresist on the substrate, and the light-shielding portion 311 prevents light from passing through the masking film 31 and irradiating the photoresist on the substrate.
  • the photoresist is a positive photoresist
  • the part of the photoresist that is irradiated by the light passing through the light-transmitting part 312 is dissolved to form a pattern consistent with the shape of the light-transmitting part 312, and the part corresponding to the light-shielding part 311
  • the photoresist remains.
  • the photoresist is a negative photoresist
  • the part of the photoresist that is irradiated by the light passing through the light-transmitting portion 312 is retained; 311 shapes consistent with the pattern.
  • the exposure equipment 300 has a masking device 303 capable of continuously transporting the masking film 31 to the exposure area 301a.
  • the masking film 31 is no longer fixed between the light source 3011 and the material 30, but together with the material 30 in the same
  • the speed and direction pass through the exposure area 301a to achieve continuous exposure; and, during the exposure process, the masking film 31 and the material 30 always maintain the same movement path, which can ensure that the pattern on the masking film 31 is exposed to the material 30 quickly, completely and consistently , has good pattern consistency; in addition, the exposure pattern does not need to be consistent with the traveling direction of the material 30, so that the exposure equipment 300 can process continuous complex patterns, and the exposure performance of the exposure equipment 300 can be improved while improving the working efficiency of the exposure equipment. .
  • the masking device 303 includes: a first unwinding roller 3032, a first driving roller 3031, and a first receiving roller 3033, and the first driving roller 3031 rotates at a first speed as a linear speed to The masking film 31 is continuously entered into the exposure region 301a at a first speed.
  • the first driving roller 3031 rotates to drive the first discharge roller 3032 to release the masking film 31, and the masking film 31 is exposed
  • the area 301a is recovered by the first take-up roll 3033 afterwards.
  • the first unwinding roller 3032 and/or the first receiving roller 3033 can also be driving rollers, which rotate at the same linear speed as the first driving roller 3031, so that the material 31 can move from unwinding to rewinding. The process is always moving forward at a constant speed.
  • the masking device 303 transports the masking film 31 in a roll-to-roll manner, so that while the masking film 31 and the material 30 move synchronously, the movement path of the masking film 31 and the material 30 can be adjusted through the arrangement of the rollers. Overlapping, finally in the exposure area 301a, the material 30 is exposed continuously to improve the exposure efficiency; by controlling the rotation speed and rotation direction of the first driving roller 3031, the movement state of the masking film 31 entering the exposure area 301a can be accurately controlled, thereby realizing the masking Flexible control of membrane 31.
  • the masking device 303 includes: a first driven roller 3034 for supporting the masking film 31 so that the masking film 31 passes through the exposure area 301 a and leaves the exposure area 301 a continuously at a first speed.
  • the first driven roller 3034 is arranged on the moving path of the masking film 31 after passing through the exposure device 301 , and the first driven roller 3034 can support the masking film 31 so that it is positioned between the first driving roller 3031 and the first driven roller 3034
  • the first drive roller 3031 rotates to drive the first driven roller 3034 to rotate in the same direction so that the masking film 31 rotates, and precisely controls the movement state of the masking film in the exposure area 301a while making the masking film 31 stably and continuously pass through the exposure area.
  • the region 301a improves the stability of the movement of the masking film 31 .
  • the masking film 31 is separated from the material 30 driven by the first receiving roller 3033 and recovered by the first receiving roller 3033 .
  • the masking device 303 further includes: a first guide roller 3035 disposed between the first unwinding roller 3032 and the first driving roller 3031 and/or between the first driven roller 3034 and the first receiving roller 3033 , used to support the masking film 31 so that the masking film 31 is transported along the arrangement path of the first guide rollers 3035 .
  • first discharge roller 3032 and the first driving roller 3031 between the first transmission roller 3034 and the first receiving roller 3033, all can be according to the size of the masking film 31, the first discharge roller 3032 and the first A certain number of first guide rollers 3035 are set by factors such as the distance between the driving rollers 3031, the distance between the first drive roller 3034 and the first receiving roller 3033, so that the masking film 31 is arranged according to the arrangement of the first guide rollers 3035
  • the path is conveyed, and the feeding path of the masking film 31 is reasonably set to facilitate the control of the feeding path of the masking film 31 .
  • first guide rollers 3035 may also be arranged between the first driving roller 3031 and the first driven roller 3034 to improve the stability of the movement of the masking film in the exposure area 301a sex.
  • the feeding device 302 includes: a second discharging roller 3022, a second driving roller 3021, and a second receiving roller 3023; wherein, the second discharging roller 3022 and the second receiving roller 3023 are respectively arranged on the exposure device 301
  • the two sides of the second driving roller 3021 rotate at the first speed as the linear speed, so that the material 30 and the masking film 31 are rolled by the first driving roller 3031 and the second driving roller 3021 and continuously enter the exposure area 301a at the first speed .
  • the second driving roller 3021 is arranged on the first driving roller 3031 matched position, and can form rolling pressure with the first driving roller 3031, so that the material 30 and the masking film 31 are rolled together after passing through the first driving roller 3031 and the second driving roller 3021, and the movement paths overlap, and can be completely
  • the consistent and synchronous motion passes through the exposure area 301 a, improving the consistency of the material 30 and the masking film 31 .
  • both the material 30 and the masking film 31 are transported in a roll-to-roll manner, so that the feeding device 302 and the masking device 303 can share a set of control systems, reduce the rotation error between the roller shafts, and improve the consistency of the roller shaft movement, thereby The consistency and stability of the movement of the masking film 31 and the material 30 are further improved.
  • the above rotation error includes but not limited to the starting time of the roller shaft, the rotation speed of the roller shaft and the like.
  • the material 30 and the masking film 31 can be continuously transported to the exposure area 301a and the movement state of the material 30 can be controlled; the rotation of the second receiving roller 3023 can separate the material 30 from the masking film 31
  • the exposed material 30 is recovered and wound into rolls for subsequent further processing.
  • the roll-to-roll material 30 is transported, so that the material 30 can be collected quickly after processing, and the working efficiency of the exposure device 300 is improved.
  • the feeding device 302 includes: a second driven roller 3024 for supporting the material 31 so that the material 31 passes through the exposure area 301 a and leaves the exposure area 301 a continuously at a first speed.
  • the second driven roller 3024 is arranged on the moving path of the material 30 after passing through the exposure device 301, and can support the material 30 to keep it flat in the exposure area 301a.
  • the second driven roller 3024 is arranged at a position matched with the first driven roller 3034 , so that the material 30 and the masking film 31 are rolled again at the first driven roller 3034 and the second driven roller 3024 .
  • the movement path of the material 30 between the driving roller and the driven roller is exactly the same as that of the masking film 31.
  • the material 30 and the masking film 31 between the driving roller and the driven roller can Entering and leaving the exposure area 301 a continuously and stably further improves the consistency and stability of the movement of the material 30 and the masking film 31 .
  • the feeding device 302 further includes: a second guide roller 3025, arranged between the second unwinding roller 3022 and the second driving roller 3021 and/or arranged between the second driven roller 3024 and the second receiving roller 3023 between them are used to support the material 30 so that the material 30 is conveyed according to the arrangement path of the second guide roller 3025 .
  • the number of the second guide rollers 3025 can be multiple, and their arrangement can be configured according to factors such as the length of the material 30 and the size of the exposure device 300; A certain number of second guide rollers are arranged between the roller 3021 and the second driven roller 3024 to support the material 30 and the masking film 31 to pass through the exposure area 301a continuously and stably.
  • the guide roller 3025 can support and design the movement track of the material 30, so that the material 30 can move along the required track, which facilitates the design of the exposure device 300 to be more compact, and improves the movement stability of the material 30. At the same time, the volume of the exposure device 300 is reduced.
  • the exposure device 301 includes: a plurality of light sources 3011 arranged in a row along the feeding direction.
  • multiple light sources 3011 can increase the area of the exposure area 301a, so that more materials 30 passing through the exposure area 301a are exposed.
  • a plurality of light sources 3011 are disposed between the first driving roller 3031 and the first driven roller 3034 of the masking device 303 . In other embodiments, the number of light source 3011 may be one.
  • the exposure area of the material 30 in the exposure area 301 a at the same time can be increased, thereby improving the working efficiency of the exposure device 300 .
  • FIG. 5 is a schematic structural diagram of another exposure device 300 according to an embodiment of the present application.
  • the exposure equipment 300 includes: a first exposure device 301 and a second exposure device 301', which are respectively disposed on a first side of the material 30 and a second side opposite to the first side.
  • the material 30 generally includes a substrate and a photoresist coated thereon, and the photoresist may be coated on one side or both sides of the substrate.
  • the material 30 needs to be exposed on both sides, so both sides of the substrate are coated with photoresist.
  • the material 30 includes a substrate and photoresist coated on both sides of the substrate.
  • the exposure equipment 300 includes: a first masking device 303 and a second masking device 303', which are respectively disposed on the first side and the second side.
  • the exposure device 300 has two masking devices 303 and 303' corresponding to the exposure device 301 and the exposure device 301' respectively, which can perform patterned exposure on both sides of the material 30 at the same time, further improving the performance of the exposure device 300. productivity and performance.
  • the material 30 is passed by the first driving roller 3031 of the masking device 303 and the third driving roller 303' of the masking device 303' together with the masking film 31 and the masking film 31'.
  • the driving roller 3031' rolls and enters the exposure area 301a.
  • the material 30, the masking film 31 and the masking film 31' pass through the exposure area 301a through the same feeding path, and after being rolled by the first driven roller 3034 of the masking device 303 and the third driven roller 3034' of the masking device 303, they are collected respectively.
  • the first masking device 303, the second masking device 303' and the feeding device 302 make the material 30 coincide with the feeding path of the masking film 31 and the masking film 31' when entering the exposure area 301a.
  • the masking film 31 of the first masking device 303 has the same pattern as the masking film 31' of the second masking device 303'.
  • the pattern of the masking film 31 on both sides of the material is the same as that of the masking film 31', so that the exposed material 30 can have completely consistent and corresponding patterns on both sides, thereby forming structures such as through holes in some application scenarios , so that the exposure equipment 300 can be applied in the hole-making process, and the application scenarios of the exposure equipment 300 are expanded.

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  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

An exposure apparatus (300), comprising: an exposure device (301) used for exposing a material (30); a feeding device (302) used for continuously conveying the material (30) to an exposure area (301a) of the exposure device (301) at a first speed in a feeding direction; and a covering device (303) used for continuously conveying a covering film (31) to the exposure area (301a) at a first speed in the feeding direction, the covering film (31) being used for carrying out regional shading when the exposure device (301) exposes the material (30), and the feeding device (302) and the covering device (303) enabling a feeding path of the material (30) to coincide with a feeding path of the covering film (31) when the material (30) and the covering film (31) enters the exposure area (301a). The exposure apparatus (300) can perform continuous exposure, thereby effectively improving exposure efficiency and exposure performance.

Description

一种曝光设备an exposure device

相关申请的交叉引用Cross References to Related Applications

本专利文件要求于2022年1月26日提交的发明名称为“一种曝光设备”的申请号为202220220979.3的中国专利申请的优先权和权益。上述专利申请的全部内容通过引用并入本专利文件公开内容的一部分。This patent document claims the priority and rights and interests of the Chinese patent application with the application number 202220220979.3 filed on January 26, 2022 with the title of invention "An Exposure Equipment". The entire content of the aforementioned patent application is incorporated by reference as part of the disclosure content of this patent document.

技术领域technical field

本申请涉及曝光技术领域,更为具体地,涉及一种曝光设备。The present application relates to the field of exposure technology, and more specifically, to an exposure device.

背景技术Background technique

曝光设备是一种利用光源发出的紫外线将透明体(如菲林片)上的图像信息转移至物料的表面的设备。被广泛应用于印刷、柔性电子等领域。在量产加工过程中,物料沿传送带或以其他方式被持续传送,菲林片被固定于光源和物料之间,从而对物料进行曝光。Exposure equipment is a device that uses ultraviolet light emitted by a light source to transfer image information on a transparent body (such as a film sheet) to the surface of the material. It is widely used in printing, flexible electronics and other fields. During the mass production process, the material is continuously conveyed along the conveyor belt or in other ways, and the film is fixed between the light source and the material to expose the material.

随着人们对生产效率的进一步追求,现有的曝光设备在运行过程中,物料需周期性地停留于菲林片下以进行曝光,限制了曝光设备的产能;菲林片上的图案需与物料被运送的方向一致,限制了曝光设备图案化加工的范围;并且由于物料需周期性地停留,曝光图案之间的衔接位置的精度无法控制,限制了曝光设备的加工性能。因此,如何提高曝光设备的效率与性能是一项丞待解决的问题。With people's further pursuit of production efficiency, during the operation of the existing exposure equipment, the material needs to stay under the film periodically for exposure, which limits the production capacity of the exposure equipment; the pattern on the film needs to be transported with the material The same direction limits the scope of exposure equipment patterning processing; and because the material needs to stay periodically, the accuracy of the joint position between exposure patterns cannot be controlled, which limits the processing performance of exposure equipment. Therefore, how to improve the efficiency and performance of the exposure equipment is a problem to be solved.

发明内容Contents of the invention

本申请实施例提供了一种曝光设备,能够为物料提供连续性的曝光从而提升曝光效率以及曝光性能。The embodiment of the present application provides an exposure device, which can provide continuous exposure for materials so as to improve exposure efficiency and exposure performance.

第一方面,本申请实施例提供一种曝光设备,所述设备包括:曝光装置,用于曝光物料;送料装置,用于沿送料方向以第一速度连续运送所述物料至所述曝光装置的曝光区域;掩盖装置,用于沿所述送料方向以所述 第一速度连续运送掩盖膜至所述曝光区域,所述掩盖膜用于在所述曝光装置曝光所述物料时进行区域性遮光;所述送料装置与所述掩盖装置使得所述物料与所述掩盖膜在进入所述曝光区域时的送料路径重合。In the first aspect, an embodiment of the present application provides an exposure device, the device comprising: an exposure device for exposing materials; a feeding device for continuously transporting the materials to the exposure device at a first speed along the feeding direction Exposure area; a masking device, used for continuously conveying a masking film to the exposure area at the first speed along the feeding direction, and the masking film is used for regional shading when the exposure device exposes the material; The feeding device and the masking device make the feeding path of the material and the masking film coincide when entering the exposure area.

本申请的实施例中,曝光设备具有与能够连续运送掩盖膜至曝光区域的掩盖装置,掩盖膜不再被固定于光源与物料之间,而是与物料一同以相同的速度和方向经过曝光区域,实现连续曝光;并且,在曝光过程中掩盖膜与物料始终保持相同的运动路径,能够保证掩盖膜上的图案快速、完全且一致地曝光至物料上,具有良好的图形一致性;另外,曝光图案无需与物料的行进方向一致,使得曝光设备能够进行连续复杂图案的加工,提高曝光设备工作效率的同时,还提升了曝光设备的曝光性能。In the embodiment of the present application, the exposure equipment has a masking device capable of continuously transporting the masking film to the exposure area. The masking film is no longer fixed between the light source and the material, but passes through the exposure area together with the material at the same speed and direction , to achieve continuous exposure; and, during the exposure process, the masking film and the material always maintain the same movement path, which can ensure that the pattern on the masking film is exposed to the material quickly, completely and consistently, with good pattern consistency; in addition, the exposure The pattern does not need to be consistent with the traveling direction of the material, which enables the exposure equipment to process continuous complex patterns, improves the working efficiency of the exposure equipment, and improves the exposure performance of the exposure equipment.

在一些实施例中,所述掩盖装置包括:第一放料辊、第一主动辊与第一收料辊;其中,所述第一放料辊与所述第一收料辊分别设置于所述曝光装置的两侧,所述第一主动辊以所述第一速度为线速度转动,以使所述掩盖膜以所述第一速度连续进入所述曝光区域。In some embodiments, the covering device includes: a first discharging roller, a first driving roller and a first receiving roller; wherein, the first discharging roller and the first receiving roller are respectively arranged on the On both sides of the exposure device, the first driving roller rotates at the first speed as a linear speed, so that the masking film continuously enters the exposure area at the first speed.

本申请的实施例中,掩盖装置采用卷对卷的方式运送掩盖膜,能够通过控制第一主动辊的转速与转动方向控制掩盖膜的运动状态,从而实现对掩盖膜的灵活控制,帮助提高曝光设备的灵活性。In the embodiment of the present application, the masking device transports the masking film in a roll-to-roll manner, and can control the motion state of the masking film by controlling the speed and direction of rotation of the first driving roller, thereby realizing flexible control of the masking film and helping to improve exposure Equipment flexibility.

在一些实施例中,所述掩盖装置包括:第一从动辊,用于支撑所述掩盖膜,以使所述掩盖膜经过所述曝光区域并以所述第一速度连续离开所述曝光区域。In some embodiments, the masking device includes: a first driven roller for supporting the masking film so that the masking film passes through the exposure area and leaves the exposure area continuously at the first speed .

本申请的实施例中,通过设置第一从动辊使得位于第一主动辊和第一从动辊之间的掩盖膜稳定地经过并离开曝光区域,精确控制曝光区域内掩盖膜的运动状态。In the embodiment of the present application, the movement state of the masking film in the exposure area is precisely controlled by setting the first driven roller so that the masking film between the first driving roller and the first driven roller passes through and leaves the exposure area stably.

在一些实施例中,所述掩盖装置还包括:第一导向辊,设置于所述第一放料辊与所述第一主动辊之间和/或所述第一从动辊与所述第一收料辊之间,用于支撑所述掩盖膜以使所述掩盖膜按照所述第一导向辊的排布路径被运送。In some embodiments, the covering device further includes: a first guide roller, arranged between the first discharge roller and the first driving roller and/or between the first driven roller and the first driving roller. Between a receiving roller, it is used to support the masking film so that the masking film is transported according to the arrangement path of the first guide roller.

本申请的实施例中,通过在掩盖膜的送料路径上设置导向辊,使得掩盖膜按照导向辊的排布路径被运送,便于对掩盖膜运送路径的控制。In the embodiment of the present application, by setting guide rollers on the feeding path of the masking film, the masking film is conveyed according to the arrangement path of the guiding rollers, which facilitates the control of the conveying path of the masking film.

在一些实施例中,所述送料装置包括:第二放料辊、第二主动辊以及第二收料辊;其中,所述第二放料辊与所述第二收料辊分别设置于所述曝光装置的两侧,所述第二主动辊以所述第一速度为线速度转动,以使所述物料与所述掩盖膜被所述第一主动辊与所述第二主动辊辊压并以所述第一速度连续进入所述曝光区域。In some embodiments, the feeding device includes: a second discharging roller, a second driving roller, and a second receiving roller; wherein, the second discharging roller and the second receiving roller are respectively arranged on the The two sides of the exposure device, the second driving roller rotates at the first speed as the linear speed, so that the material and the masking film are rolled by the first driving roller and the second driving roller And continuously enter the exposure area at the first speed.

本申请的实施例中,采用卷对卷的物料运送方式,使得物料在加工后能够迅速被收集,提高曝光装置的工作效率;其次,通过控制运送物料的第二主动辊的转速与转动方向能够控制物料的运动状态,实现对物料的灵活控制,帮助提高曝光设备的灵活性;并且,第二主动辊与第一主动辊形成辊压,使得掩盖膜与物料的运送路径相同,能够同步地进入曝光区域,提高掩盖膜与物料运动的一致性的同时还能够通过一套控制系统控制,降低辊轴与辊轴之间的转动误差,进一步提升掩盖膜与物料运动的一致性。In the embodiment of the present application, the roll-to-roll material delivery method is adopted, so that the material can be collected quickly after processing, and the working efficiency of the exposure device can be improved; secondly, by controlling the speed and rotation direction of the second driving roller that transports the material, it can Control the movement state of the material, realize the flexible control of the material, and help to improve the flexibility of the exposure equipment; moreover, the second driving roller and the first driving roller form a rolling pressure, so that the conveying path of the masking film and the material is the same, and can be entered synchronously In the exposure area, while improving the consistency of the masking film and material movement, it can also be controlled by a set of control system to reduce the rotation error between the roller shaft and the roller shaft, and further improve the consistency of the masking film and material movement.

在一些实施例中,所述送料装置包括:第二从动辊,用于支撑所述物料,以使所述物料经过所述曝光区域并以所述第一速度连续离开所述曝光区域。In some embodiments, the feeding device includes: a second driven roller for supporting the material so that the material passes through the exposure area and leaves the exposure area continuously at the first speed.

本申请的实施例中,第二从动辊设置于与第一从动辊对应的位置时,也能够对曝光后的掩盖膜和物料形成辊压,使得位于主动辊与从动辊之间的掩盖膜与物料能够平稳地经过并离开曝光区域;通过设置第二从动辊,能够精确控制曝光区域内物料的运动状态,帮助提升掩盖膜与物料在曝光区域的运动稳定性。In the embodiment of the present application, when the second driven roller is set at a position corresponding to the first driven roller, it can also form a rolling pressure on the exposed masking film and material, so that the roller between the driving roller and the driven roller The masking film and materials can pass through and leave the exposure area smoothly; by setting the second driven roller, the movement state of the materials in the exposure area can be precisely controlled, helping to improve the movement stability of the masking film and materials in the exposure area.

在一些实施例中,所述送料装置还包括:第二导向辊,设置于所述第二放料辊与所述第二主动辊之间和/或设置于所述第二从动辊与所述第二收料辊之间,用于支撑所述物料,以使所述物料按照所述第二导向辊的排布路径被运送。In some embodiments, the feeding device further includes: a second guide roller, arranged between the second discharge roller and the second driving roller and/or arranged between the second driven roller and the second driving roller. Between the second receiving rollers, it is used to support the materials, so that the materials are transported according to the arrangement path of the second guide rollers.

本申请的实施例中,通过设置第二导向辊能够支撑并设计物料的运动轨迹,使得物料能够沿需要的轨迹运动,便于将曝光设备的结构设计得更加紧凑,在提高物料运动稳定性的同时减小了曝光设备的体积。In the embodiment of the present application, the movement trajectory of the material can be supported and designed by setting the second guide roller, so that the material can move along the required trajectory, which facilitates the design of the exposure equipment to be more compact, while improving the stability of the movement of the material. The volume of the exposure equipment is reduced.

在一些实施例中,所述曝光装置包括:多个光源,多个所述光源沿所述送料方向排列设置。In some embodiments, the exposure device includes: a plurality of light sources arranged in a row along the feeding direction.

本申请的实施例中,通过设置多个光源,能够增大同一时间曝光区域中物料的曝光面积,从而提高曝光设备的工作效率。In the embodiment of the present application, by setting multiple light sources, the exposure area of the material in the exposure area at the same time can be increased, thereby improving the working efficiency of the exposure equipment.

在一些实施例中,所述设备包括:第一曝光装置与第二曝光装置,分别设置于所述物料的第一侧以及与所述第一侧相对的第二侧。In some embodiments, the apparatus includes: a first exposure device and a second exposure device respectively disposed on a first side of the material and a second side opposite to the first side.

在一些实施例中,所述设备包括:第一掩盖装置与第二掩盖装置,分别设置于所述第一侧与所述第二侧。In some embodiments, the apparatus comprises: a first masking device and a second masking device disposed on the first side and the second side, respectively.

本申请的实施例中,通过在物料两侧分别设置曝光装置与掩盖装置,能够在物料经过曝光区域时对物料的两侧同时进行曝光,从而提高曝光设备的工作效率。In the embodiment of the present application, by setting the exposure device and the masking device on both sides of the material, both sides of the material can be exposed simultaneously when the material passes through the exposure area, thereby improving the working efficiency of the exposure equipment.

在一些实施例中,所述第一掩盖装置的掩盖膜与所述第二掩盖装置的掩盖膜的图案相同。In some embodiments, the masking film of the first masking means has the same pattern as the masking film of the second masking means.

本申请的实施例中,物料两侧的掩盖膜的图案相同,使得经过曝光的物料能够在两侧具有完全一致且对应的图案,从而在一些应用场景中形成通孔等结构,使得曝光设备能够应用于制孔工艺中,扩展了曝光设备的应用场景。In the embodiment of the present application, the pattern of the masking film on both sides of the material is the same, so that the exposed material can have completely consistent and corresponding patterns on both sides, so that structures such as through holes are formed in some application scenarios, so that the exposure equipment can Applied in the hole making process, the application scene of the exposure equipment is expanded.

附图说明Description of drawings

为了更清楚地说明本申请实施例的技术方案,下面将对本申请实施例中所需要使用的附图作简单地介绍,显而易见地,下面所描述的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据附图获得其他的附图。In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the accompanying drawings that need to be used in the embodiments of the present application. Obviously, the accompanying drawings described below are only some embodiments of the present application. Those of ordinary skill in the art can also obtain other drawings based on the accompanying drawings on the premise of not paying creative efforts.

图1是本申请一种车辆的示意性结构图;Fig. 1 is a schematic structural diagram of a vehicle of the present application;

图2是本申请一种电池的示意性结构图;Fig. 2 is a schematic structural diagram of a battery of the present application;

图3是本申请一种曝光设备的示意性结构图;Fig. 3 is a schematic structural diagram of an exposure device of the present application;

图4是本申请一种掩盖膜的示意性结构图;Fig. 4 is a schematic structural diagram of a masking film of the present application;

图5是本申请另一种曝光设备的示意性结构图。Fig. 5 is a schematic structural view of another exposure device of the present application.

具体实施方式Detailed ways

下面结合附图和实施例对本申请的实施方式作进一步详细描述。 以下实施例的详细描述和附图用于示例性地说明本申请的原理,但不能用来限制本申请的范围,即本申请不限于所描述的实施例。The implementation manner of the present application will be further described in detail below with reference to the drawings and embodiments. The detailed description and drawings of the following embodiments are used to illustrate the principles of the application, but not to limit the scope of the application, that is, the application is not limited to the described embodiments.

在本申请的描述中,需要说明的是,除非另有说明,“多个”的含义是两个以上;术语“上”、“下”、“左”、“右”、“内”、“外”等指示的方位或位置关系仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。此外,术语“第一”、“第二”、“第三”等仅用于描述目的,而不能理解为指示或暗示相对重要性。“垂直”并不是严格意义上的垂直,而是在误差允许范围之内。“平行”并不是严格意义上的平行,而是在误差允许范围之内。In the description of this application, it should be noted that, unless otherwise specified, the meaning of "plurality" is more than two; the terms "upper", "lower", "left", "right", "inner", " The orientation or positional relationship indicated by "outside" and so on are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a reference to this application. Application Restrictions. In addition, the terms "first", "second", "third", etc. are used for descriptive purposes only and should not be construed as indicating or implying relative importance. "Vertical" is not strictly vertical, but within the allowable range of error. "Parallel" is not strictly parallel, but within the allowable range of error.

下述描述中出现的方位词均为图中示出的方向,并不是对本申请的具体结构进行限定。在本申请的描述中,还需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是直接相连,也可以通过中间媒介间接相连。对于本领域的普通技术人员而言,可视具体情况理解上述术语在本申请中的具体含义。The orientation words appearing in the following description are the directions shown in the figure, and do not limit the specific structure of the application. In the description of this application, it should also be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection", and "connection" should be interpreted in a broad sense, for example, it can be a fixed connection or a flexible connection. Disassembled connection, or integral connection; it can be directly connected or indirectly connected through an intermediary. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific situations.

本申请中术语“和/或”,仅仅是一种描述关联对象的关联关系,表示可以存在三种关系,例如,A和/或B,可以表示:存在A,同时存在A和B,存在B这三种情况。另外,本申请中字符“/”,一般表示前后关联对象是一种“或”的关系。The term "and/or" in this application is just an association relationship describing associated objects, which means that there may be three relationships, for example, A and/or B, which can mean: there is A, A and B exist at the same time, and B exists These three situations. In addition, the character "/" in this application generally indicates that the contextual objects are an "or" relationship.

除非另有定义,本申请所使用的所有的技术和科学术语与属于本申请的技术领域的技术人员通常理解的含义相同;本申请中在申请的说明书中所使用的术语只是为了描述具体的实施例的目的,不是旨在于限制本申请;本申请的说明书和权利要求书及上述附图说明中的术语“包括”和“具有”以及它们的任何变形,意图在于覆盖不排他的包含。本申请的说明书和权利要求书或上述附图中的术语“第一”、“第二”等是用于区别不同对象,而不是用于描述特定顺序或主次关系。Unless otherwise defined, all technical and scientific terms used in this application have the same meaning as commonly understood by those skilled in the technical field of this application; the terms used in this application in the description of the application are only to describe specific implementations The purpose of the example is not intended to limit the present application; the terms "comprising" and "having" and any variations thereof in the description and claims of the present application and the description of the above drawings are intended to cover non-exclusive inclusion. The terms "first", "second" and the like in the description and claims of the present application or the above drawings are used to distinguish different objects, rather than to describe a specific sequence or primary-subordinate relationship.

在本申请中提及“实施例”意味着,结合实施例描述的特定特征、结构或特性可以包含在本申请的至少一个实施例中。在说明书中的各个位 置出现该短语并不一定均是指相同的实施例,也不是与其它实施例互斥的独立的或备选的实施例。本领域技术人员显式地和隐式地理解的是,本申请所描述的实施例可以与其它实施例相结合。Reference in this application to an "embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the present application. The appearances of this phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are independent or alternative embodiments mutually exclusive of other embodiments. It is understood explicitly and implicitly by those skilled in the art that the embodiments described in this application can be combined with other embodiments.

实际生产生活中,为了提高活性物质层在集流体表面的稳定性以及提高集流体表面活性物质的负载量,通常在集流体的表面形成凹部,用于容纳部分活性物质层。因此,需要对集流体的表面进行加工。一般的加工方式为:在集流体表层涂覆光刻胶,覆盖加工好的掩盖膜,经过曝光源进行曝光处理,掩盖膜上的图形光刻胶显影后,再对集流体进行刻蚀,以在集流体的表面形成凹部。In actual production and life, in order to improve the stability of the active material layer on the surface of the current collector and increase the loading capacity of the active material on the surface of the current collector, a recess is usually formed on the surface of the current collector to accommodate part of the active material layer. Therefore, it is necessary to process the surface of the current collector. The general processing method is: coating photoresist on the surface of the current collector, covering the processed masking film, exposing the exposure source through the exposure source, after developing the patterned photoresist on the masking film, and then etching the current collector. Recesses are formed on the surface of the current collector.

在曝光设备量产加工集流体的过程中,掩盖膜被固定于光源和集流体之间,集流体通常是连续的铜箔带或铝箔带,其表面涂覆有光刻胶,能够相对于光源与掩盖膜被持续运送。在对集流体进行曝光处理时,由于掩盖膜与光源的位置固定,曝光时集流体需停留在曝光区域中等待曝光,曝光完成后需启动送料装置转移曝光好的集流体并将未曝光的集流体继续运送至曝光区域,使得集流体需周期性地停留于曝光区域,光源也需要周期性地启动曝光,从而限制了曝光设备的产能。另外,掩盖膜上的图案需与集流体被运送的方向一致,限制了曝光图案的多样化,无法进行复杂图案的曝光。During the mass production and processing of the current collector by the exposure equipment, the masking film is fixed between the light source and the current collector. The current collector is usually a continuous copper foil strip or aluminum foil strip, and its surface is coated with photoresist, which can be compared with the light source. With the masking film being shipped continuously. When exposing the current collector, since the positions of the masking film and the light source are fixed, the current collector needs to stay in the exposure area to wait for exposure during exposure. The fluid continues to be transported to the exposure area, so that the current collector needs to stay in the exposure area periodically, and the light source also needs to start exposure periodically, thus limiting the throughput of the exposure equipment. In addition, the pattern on the masking film needs to be consistent with the direction in which the current collector is transported, which limits the diversification of exposure patterns and makes it impossible to expose complex patterns.

有鉴于此,为了解决集流体曝光效率低以及曝光图形复杂度低的问题,本申请提供一种曝光设备,通过掩盖装置使得环形掩盖膜与集流体能够在曝光区域同步运动,能够为集流体提供连续性的曝从而提升曝光效率以及曝光性能。In view of this, in order to solve the problems of low exposure efficiency of the current collector and the low complexity of the exposure pattern, the present application provides an exposure device, which enables the ring-shaped masking film and the current collector to move synchronously in the exposure area through the masking device, and can provide the current collector. Continuous exposure improves exposure efficiency and exposure performance.

应理解,本申请实施例以集流体加工为示例,本申请实施例提供的曝光设备可以但不限用于制造集流体。也可以用于显示面板、集成电路和半导体等灵越的图形加工作业,同样能够提高曝光效率、生产效率以及曝光图案的复杂度。It should be understood that the embodiments of the present application take the processing of current collectors as an example, and the exposure equipment provided in the embodiments of the present application can be used, but not limited, to manufacture current collectors. It can also be used in the graphics processing operations of display panels, integrated circuits and semiconductors, and can also improve exposure efficiency, production efficiency and the complexity of exposure patterns.

近年来,电池作为一种主要的动力设备被广泛应用于电子设备、电动自行车、电动摩托车、电动汽车、军事装备、航空航天等多个领域。In recent years, batteries, as a main power equipment, have been widely used in many fields such as electronic equipment, electric bicycles, electric motorcycles, electric vehicles, military equipment, and aerospace.

例如,如图1所示,为本申请一种车辆1的结构示意图,车辆1 可以为燃油汽车、燃气汽车或新能源汽车,新能源汽车可以是纯电动汽车、混合动力汽车或增程式汽车等。车辆1的内部可以设置马达11,控制器12以及电池10,控制器12用来控制电池10为马达11的供电。例如,在车辆1的底部或车头或车尾可以设置电池10。电池10可以用于车辆1的供电,例如,电池10可以作为车辆1的操作电源,用于车辆1的电路系统,例如,用于车辆1的启动、导航和运行时的工作用电需求。在本申请的另一实施例中,电池10不仅仅可以作为车辆1的操作电源,还可以作为车辆1的驱动电源,替代或部分地替代燃油或天然气为车辆1提供驱动动力。For example, as shown in Figure 1, it is a schematic structural diagram of a vehicle 1 of the present application, the vehicle 1 can be a fuel vehicle, a gas vehicle or a new energy vehicle, and the new energy vehicle can be a pure electric vehicle, a hybrid vehicle or an extended-range vehicle, etc. . A motor 11 , a controller 12 and a battery 10 can be arranged inside the vehicle 1 , and the controller 12 is used to control the battery 10 to supply power to the motor 11 . For example, the battery 10 may be provided at the bottom or front or rear of the vehicle 1 . The battery 10 can be used for power supply of the vehicle 1 , for example, the battery 10 can be used as an operating power source of the vehicle 1 , for a circuit system of the vehicle 1 , for example, for starting, navigating and running power requirements of the vehicle 1 . In another embodiment of the present application, the battery 10 can not only be used as an operating power source for the vehicle 1 , but can also be used as a driving power source for the vehicle 1 , replacing or partially replacing fuel or natural gas to provide driving power for the vehicle 1 .

本申请中,电池是指包括一个或多个电池单体以提供电能的物理模块。例如,本申请中所提到的电池可以包括电池模块或电池包等。电池一般包括用于封装一个或多个电池单体的箱体。箱体可以避免液体或其他异物影响电池单体的充电或放电。In this application, a battery refers to a physical module including one or more battery cells to provide electrical energy. For example, the battery mentioned in this application may include a battery module or a battery pack, and the like. Batteries generally include a case for enclosing one or more battery cells. The box can prevent liquid or other foreign objects from affecting the charging or discharging of the battery cells.

为了满足不同的使用电力需求,电池可以包括多个电池单体,其中,多个电池单体之间可以串联或并联或混联,混联是指串联和并联的混合。电池也可以称为电池包。可选地,多个电池单体可以先串联或并联或混联组成电池模块,多个电池模块再串联或并联或混联组成电池。也就是说,多个电池单体可以直接组成电池,也可以先组成电池模块,电池模块再组成电池。In order to meet different power usage requirements, the battery may include multiple battery cells, wherein the multiple battery cells may be connected in series, in parallel or in parallel, and the hybrid connection refers to a mixture of series and parallel connections. Batteries can also be called battery packs. Optionally, a plurality of battery cells can be connected in series, parallel or mixed to form a battery module, and then a plurality of battery modules can be connected in series, parallel or mixed to form a battery. That is to say, multiple battery cells can directly form a battery, or form a battery module first, and then form a battery from the battery module.

例如,如图2所示,为本申请一种电池10的结构示意图,电池10可以包括多个电池单体20。电池单体20的数量可以设置为任意数值。多个电池单体20可通过串联、并联或混联的方式连接以实现较大的容量或功率。For example, as shown in FIG. 2 , which is a schematic structural diagram of a battery 10 of the present application, the battery 10 may include a plurality of battery cells 20 . The number of battery cells 20 can be set to any value. Multiple battery cells 20 can be connected in series, in parallel or in parallel to achieve greater capacity or power.

可选地,电池单体20可以包括锂离子二次电池、锂离子一次电池、锂硫电池、钠锂离子电池、钠离子电池或镁离子电池等,本申请实施例对此并不限定。在一些实施方式中,电池单体20也可称之为电芯。Optionally, the battery cell 20 may include a lithium-ion secondary battery, a lithium-ion primary battery, a lithium-sulfur battery, a sodium-lithium-ion battery, a sodium-ion battery, or a magnesium-ion battery, which is not limited in this embodiment of the present application. In some embodiments, the battery cells 20 can also be referred to as battery cells.

电池单体20包括电极组件和电解液,电极组件由正极片、负极片和隔膜组成。电池单体主要依靠金属离子在正极片和负极片之间移动来工作。正极片包括正极集流体和正极活性物质层,正极活性物质层涂覆于正极集流体的表面,未涂敷正极活性物质层的集流体凸出于已涂覆正极活性 物质层的集流体,未涂敷正极活性物质层的集流体作为正极极耳。以锂离子电池为例,正极集流体的材料可以为铝,正极活性物质可以为钴酸锂、磷酸铁锂、三元锂或锰酸锂等。负极片包括负极集流体和负极活性物质层,负极活性物质层涂覆于负极集流体的表面,未涂敷负极活性物质层的集流体凸出于已涂覆负极活性物质层的集流体,未涂敷负极活性物质层的集流体作为负极极耳。负极集流体的材料可以为铜,负极活性物质可以为碳或硅等。为了保证通过大电流而不发生熔断,正极极耳的数量为多个且层叠在一起,负极极耳的数量为多个且层叠在一起。隔膜的材质可以为聚丙烯(Polypropylene,PP)或聚乙烯(Polyethylene,PE)等。此外,电极组件可以是卷绕式结构,也可以是叠片式结构,本申请实施例并不限于此。The battery cell 20 includes an electrode assembly and an electrolyte, and the electrode assembly is composed of a positive electrode sheet, a negative electrode sheet and a diaphragm. A battery cell works primarily by moving metal ions between the positive and negative plates. The positive electrode sheet includes a positive electrode current collector and a positive electrode active material layer. The positive electrode active material layer is coated on the surface of the positive electrode current collector. The current collector not coated with the positive electrode active material layer protrudes from the current collector coated with the positive electrode active material layer. The current collector coated with the positive electrode active material layer serves as the positive electrode tab. Taking a lithium-ion battery as an example, the material of the positive electrode current collector can be aluminum, and the positive electrode active material can be lithium cobaltate, lithium iron phosphate, ternary lithium or lithium manganate. The negative electrode sheet includes a negative electrode current collector and a negative electrode active material layer. The negative electrode active material layer is coated on the surface of the negative electrode current collector. The current collector without the negative electrode active material layer protrudes from the current collector coated with the negative electrode active material layer. The current collector coated with the negative electrode active material layer serves as the negative electrode tab. The material of the negative electrode current collector may be copper, and the negative electrode active material may be carbon or silicon. In order to ensure that a large current is passed without fusing, the number of positive pole tabs is multiple and stacked together, and the number of negative pole tabs is multiple and stacked together. The material of the diaphragm can be polypropylene (Polypropylene, PP) or polyethylene (Polyethylene, PE). In addition, the electrode assembly may be a wound structure or a laminated structure, which is not limited in the embodiment of the present application.

如图3所示,为本申请实施例提供的一种曝光设备的示意性结构图。曝光设备300包括:As shown in FIG. 3 , it is a schematic structural diagram of an exposure device provided by an embodiment of the present application. Exposure equipment 300 includes:

曝光装置301,用于曝光物料30;Exposure device 301, used for exposing material 30;

送料装置302,用于沿送料方向以第一速度连续运送物料30至曝光装置301的曝光区域301a;The feeding device 302 is used to continuously transport the material 30 to the exposure area 301a of the exposure device 301 at a first speed along the feeding direction;

掩盖装置303,用于沿送料方向以第一速度连续运送掩盖膜31至曝光区域301a,掩盖膜31用于在曝光装置301曝光物料30时进行区域性遮光,送料装置302与掩盖装置303使得物料30与掩盖膜31在进入曝光区域301a时的送料路径重合。The masking device 303 is used to continuously convey the masking film 31 to the exposure area 301a at a first speed along the feeding direction. The masking film 31 is used to perform regional shading when the exposure device 301 exposes the material 30. The feeding device 302 and the masking device 303 make the material 30 coincides with the feeding path of the mask film 31 when it enters the exposure region 301a.

具体地,物料30包括基材以及涂覆于其上的光刻胶,基材可以是集流体(正极集流体或者负极集流体)、电路板等。曝光装置301具有光源3011,能够向物料发射UV波段的光线,对应曝光区域301a,该区域内曝光装置301发出的光线被掩盖膜31遮挡,使得光线部分透过掩盖膜31到达物料30表面与光刻胶发生作用。曝光过程中,曝光区域301a内物料30与掩盖膜31沿相同的方向以相同的速度运动,即物料30与掩盖膜31在曝光区域301a内同步运动。Specifically, the material 30 includes a substrate and a photoresist coated thereon, and the substrate may be a current collector (a positive current collector or a negative current collector), a circuit board, and the like. The exposure device 301 has a light source 3011, which can emit light in the UV band to the material, corresponding to the exposure area 301a. The light emitted by the exposure device 301 in this area is blocked by the masking film 31, so that the light part passes through the masking film 31 to reach the surface of the material 30 and light. The engraving works. During the exposure process, the material 30 and the masking film 31 in the exposure area 301a move in the same direction and at the same speed, that is, the material 30 and the masking film 31 move synchronously in the exposure area 301a.

如图4所示,为本申请实施例一种掩盖膜31的示意性结构图。掩盖膜31上具有遮光部311与透光部312,遮光部311和/或透光部312组成掩盖膜31上的曝光图案。As shown in FIG. 4 , it is a schematic structural view of a masking film 31 according to an embodiment of the present application. The masking film 31 has a light-shielding portion 311 and a light-transmitting portion 312 , and the light-shielding portion 311 and/or the light-transmitting portion 312 constitute an exposure pattern on the masking film 31 .

图4所示的遮光部311为圆形,多个遮光部311呈矩形阵列布置。在一些实施例中,遮光部311的形状也可以是其他形式,遮光部311或透光部312的形状、数量以及布置方式可根据实际加工需要进行设置,本申请对此不做限制。The light shielding portion 311 shown in FIG. 4 is circular, and a plurality of light shielding portions 311 are arranged in a rectangular array. In some embodiments, the shape of the light-shielding portion 311 can also be in other forms, and the shape, quantity, and arrangement of the light-shielding portion 311 or the light-transmitting portion 312 can be set according to actual processing requirements, which is not limited in this application.

光刻胶又称光致抗蚀剂,是指通过紫外光、电子束、离子束、X射线等的照射或者辐射,其溶解度发生变化的耐蚀剂刻薄材料。光刻胶可以是由感光树脂、增感剂和溶剂为主要成分的对光敏感的混合液体。采用适当的有选择性的光刻胶,可在表面上得到所需的图案。Photoresist, also known as photoresist, refers to a thin corrosion-resistant material whose solubility changes through irradiation or radiation of ultraviolet light, electron beams, ion beams, X-rays, etc. Photoresist can be a light-sensitive mixed liquid composed mainly of photosensitive resin, sensitizer and solvent. Using an appropriate selective photoresist, the desired pattern can be obtained on the surface.

在一些实施例中,光刻胶曝光、显影后,光刻胶曝光部分被熔解,未曝光部分保留下,这一类光刻胶为正性光刻胶;在另一些实施例中,也可以是,光刻胶曝光、显影后,曝光部分被保留下,而未曝光部分被溶解,这一类光刻胶为负性光刻胶。In some embodiments, after the photoresist is exposed and developed, the exposed part of the photoresist is melted, and the unexposed part remains, and this type of photoresist is a positive photoresist; in other embodiments, it can also be Yes, after the photoresist is exposed and developed, the exposed part is retained, while the unexposed part is dissolved. This type of photoresist is a negative photoresist.

曝光过程利用光照将掩盖膜31上的图形经过光学系后投影到光刻胶上,实现图案转移。对于本申请实施例提供的曝光设备300,可以理解为本申请实施例中的曝光设备300是利用曝光装置301的光线将掩盖膜31上的图案经过光线的照射后投影到基材表面的光刻胶上。透光部312允许光线透过并照射于基材上的光刻胶,遮光部311阻止光线透过掩盖膜31照射至基材上的光刻胶。若是光刻胶为正性光刻胶,则光刻胶被透过透光部312的光线照射的部分被溶解,形成与透光部312的形状一致的图案,与遮光部311相对应的部分的光刻胶则保留。若是光刻胶为负性光刻胶,则光刻胶被透过透光部312的光线照射的部分被保留;与遮光部311相对应的部分的光刻胶则被溶解,形成与遮光部311的形状一致的图案。The exposure process uses light to project the pattern on the mask film 31 onto the photoresist after passing through the optical system, so as to realize pattern transfer. For the exposure equipment 300 provided in the embodiment of the present application, it can be understood that the exposure equipment 300 in the embodiment of the present application is a photolithography method that uses the light of the exposure device 301 to project the pattern on the masking film 31 onto the surface of the substrate after being irradiated by light. Glue on. The light-transmitting portion 312 allows light to pass through and irradiate the photoresist on the substrate, and the light-shielding portion 311 prevents light from passing through the masking film 31 and irradiating the photoresist on the substrate. If the photoresist is a positive photoresist, the part of the photoresist that is irradiated by the light passing through the light-transmitting part 312 is dissolved to form a pattern consistent with the shape of the light-transmitting part 312, and the part corresponding to the light-shielding part 311 The photoresist remains. If the photoresist is a negative photoresist, the part of the photoresist that is irradiated by the light passing through the light-transmitting portion 312 is retained; 311 shapes consistent with the pattern.

本实施例中,曝光设备300具有与能够连续运送掩盖膜31至曝光区域301a的掩盖装置303,掩盖膜31不再被固定于光源3011与物料30之间,而是与物料30一同以相同的速度和方向经过曝光区域301a,实现连续曝光;并且,在曝光过程中掩盖膜31与物料30始终保持相同的运动路径,能够保证掩盖膜31上的图案快速、完全且一致地曝光至物料30上,具有良好的图形一致性;另外,曝光图案无需与物料30的行进方向一致,使得曝光设备300能够进行连续复杂图案的加工,提高曝光设备工作效率 的同时,还提升了曝光设备300的曝光性能。In this embodiment, the exposure equipment 300 has a masking device 303 capable of continuously transporting the masking film 31 to the exposure area 301a. The masking film 31 is no longer fixed between the light source 3011 and the material 30, but together with the material 30 in the same The speed and direction pass through the exposure area 301a to achieve continuous exposure; and, during the exposure process, the masking film 31 and the material 30 always maintain the same movement path, which can ensure that the pattern on the masking film 31 is exposed to the material 30 quickly, completely and consistently , has good pattern consistency; in addition, the exposure pattern does not need to be consistent with the traveling direction of the material 30, so that the exposure equipment 300 can process continuous complex patterns, and the exposure performance of the exposure equipment 300 can be improved while improving the working efficiency of the exposure equipment. .

下面介绍掩盖装置303的几种实现形式。Several implementation forms of the masking device 303 are introduced below.

可选地,请继续参见图3,掩盖装置303包括:第一放料辊3032、第一主动辊3031与第一收料辊3033,第一主动辊3031以第一速度为线速度转动,以使掩盖膜31以第一速度连续进入曝光区域301a。Optionally, please continue to refer to FIG. 3 , the masking device 303 includes: a first unwinding roller 3032, a first driving roller 3031, and a first receiving roller 3033, and the first driving roller 3031 rotates at a first speed as a linear speed to The masking film 31 is continuously entered into the exposure region 301a at a first speed.

具体地,第一放料辊3032上具有成卷的掩盖膜31,掩盖膜上具有连续的图案,第一主动辊3031转动,带动第一放料辊3032释放掩盖膜31、掩盖膜31经过曝光区域301a后被第一收料辊3033回收。Specifically, there is a roll of masking film 31 on the first discharge roller 3032, and the masking film has a continuous pattern, and the first driving roller 3031 rotates to drive the first discharge roller 3032 to release the masking film 31, and the masking film 31 is exposed The area 301a is recovered by the first take-up roll 3033 afterwards.

应理解,掩盖装置303中,第一放料辊3032和/或第一收料辊3033也可以是主动辊,与第一主动辊3031以相同线速度转动,使得物料31从放卷到收卷的过程始终匀速稳定前进。It should be understood that in the masking device 303, the first unwinding roller 3032 and/or the first receiving roller 3033 can also be driving rollers, which rotate at the same linear speed as the first driving roller 3031, so that the material 31 can move from unwinding to rewinding. The process is always moving forward at a constant speed.

本实施例中,掩盖装置303采用卷对卷的方式运送掩盖膜31,实现了掩盖膜31与物料30同步运动的同时,能够通过辊轴的排布设置使得掩盖膜31与物料30的运动路径重合,最终在曝光区域301a内,物料30被连续曝光,提升曝光效率;通过控制第一主动辊3031的转速与转动方向能够准确控制进入曝光区域301a的掩盖膜31的运动状态,从而实现对掩盖膜31的灵活控制。In this embodiment, the masking device 303 transports the masking film 31 in a roll-to-roll manner, so that while the masking film 31 and the material 30 move synchronously, the movement path of the masking film 31 and the material 30 can be adjusted through the arrangement of the rollers. Overlapping, finally in the exposure area 301a, the material 30 is exposed continuously to improve the exposure efficiency; by controlling the rotation speed and rotation direction of the first driving roller 3031, the movement state of the masking film 31 entering the exposure area 301a can be accurately controlled, thereby realizing the masking Flexible control of membrane 31.

可选地,掩盖装置303包括:第一从动辊3034,用于支撑掩盖膜31,以使掩盖膜31经过曝光区域301a并以第一速度连续离开曝光区域301a。Optionally, the masking device 303 includes: a first driven roller 3034 for supporting the masking film 31 so that the masking film 31 passes through the exposure area 301 a and leaves the exposure area 301 a continuously at a first speed.

具体地,第一从动辊3034设置于掩盖膜31经过曝光装置301后的运动路径上,第一从动辊3034能够支撑掩盖膜31使其在第一主动辊3031和第一从动辊3034之间保持平整;第一主动辊3031转动带动第一从动辊3034同向转动使得掩盖膜31转动,精确控制曝光区域301a内掩盖膜的运动状态的同时使得掩盖膜31稳定、连续地通过曝光区域301a,提升掩盖膜31运动的稳定性。经过第一从动辊3034后,掩盖膜31在第一收料辊3033的带动下与物料30分离并被第一收料辊3033回收。Specifically, the first driven roller 3034 is arranged on the moving path of the masking film 31 after passing through the exposure device 301 , and the first driven roller 3034 can support the masking film 31 so that it is positioned between the first driving roller 3031 and the first driven roller 3034 The first drive roller 3031 rotates to drive the first driven roller 3034 to rotate in the same direction so that the masking film 31 rotates, and precisely controls the movement state of the masking film in the exposure area 301a while making the masking film 31 stably and continuously pass through the exposure area. The region 301a improves the stability of the movement of the masking film 31 . After passing through the first driven roller 3034 , the masking film 31 is separated from the material 30 driven by the first receiving roller 3033 and recovered by the first receiving roller 3033 .

可选地,掩盖装置303还包括:第一导向辊3035,设置于第一放料辊3032与第一主动辊3031之间和/或第一从动辊3034与第一收料辊 3033之间,用于支撑掩盖膜31以使掩盖膜31按照第一导向辊3035的排布路径被运送。Optionally, the masking device 303 further includes: a first guide roller 3035 disposed between the first unwinding roller 3032 and the first driving roller 3031 and/or between the first driven roller 3034 and the first receiving roller 3033 , used to support the masking film 31 so that the masking film 31 is transported along the arrangement path of the first guide rollers 3035 .

具体地,在第一放料辊3032和第一主动辊3031之间、第一传动辊3034与第一收料辊3033之间均可根据掩盖膜31的尺寸、第一放料辊3032与第一主动辊3031之间的距离、第一传动辊3034与第一收料辊3033之间的距离等因素设置一定数量的第一导向辊3035,使得掩盖膜31按照第一导向辊3035的排布路径被运送,合理设置掩盖膜31的送料路径,便于对掩盖膜31送料路径的控制。Specifically, between the first discharge roller 3032 and the first driving roller 3031, between the first transmission roller 3034 and the first receiving roller 3033, all can be according to the size of the masking film 31, the first discharge roller 3032 and the first A certain number of first guide rollers 3035 are set by factors such as the distance between the driving rollers 3031, the distance between the first drive roller 3034 and the first receiving roller 3033, so that the masking film 31 is arranged according to the arrangement of the first guide rollers 3035 The path is conveyed, and the feeding path of the masking film 31 is reasonably set to facilitate the control of the feeding path of the masking film 31 .

应理解,当曝光区域301a的面积较大时,在第一主动辊3031与第一从动辊3034之间也可以设置一定数量的第一导向辊3035以提升曝光区域301a内掩盖膜运动的稳定性。It should be understood that when the area of the exposure area 301a is large, a certain number of first guide rollers 3035 may also be arranged between the first driving roller 3031 and the first driven roller 3034 to improve the stability of the movement of the masking film in the exposure area 301a sex.

请继续参见图3,下面对送料装置302进行介绍。Please continue to refer to FIG. 3 , and the feeding device 302 will be introduced below.

可选地,送料装置302包括:第二放料辊3022、第二主动辊3021以及第二收料辊3023;其中,第二放料辊3022与第二收料辊3023分别设置于曝光装置301的两侧,第二主动辊3021以第一速度为线速度转动,以使物料30与掩盖膜31被第一主动辊3031和第二主动辊3021辊压并以第一速度连续进入曝光区域301a。Optionally, the feeding device 302 includes: a second discharging roller 3022, a second driving roller 3021, and a second receiving roller 3023; wherein, the second discharging roller 3022 and the second receiving roller 3023 are respectively arranged on the exposure device 301 The two sides of the second driving roller 3021 rotate at the first speed as the linear speed, so that the material 30 and the masking film 31 are rolled by the first driving roller 3031 and the second driving roller 3021 and continuously enter the exposure area 301a at the first speed .

具体地,第二放料辊3022上具有成卷的未经曝光的物料30,第二放料辊3022转动能够释放未经曝光的物料30;第二主动辊3021设置于与第一主动辊3031相配合的位置,并能够与第一主动辊3031形成辊压,使得物料30与掩盖膜31经过第一主动辊3031和第二主动辊3021后被辊压至一起,运动路径重合,能够以完全一致且同步的运动状态经过曝光区域301a,提高物料30与掩盖膜31的一致性。另外,物料30与掩盖膜31均采用卷对卷的运送方式,使得送料装置302与掩盖装置303能够共用一套控制系统,降低辊轴之间的转动误差,提升辊轴运动的一致性,从而进一步提高掩盖膜31与物料30运动的一致性与稳定性。上述转动误差包括但不限于辊轴的启动时间、辊轴的转动速度等。通过控制第二主动辊3021的转动方向与转动速度能够持续运送物料30及掩盖膜31至曝光区域301a并控制物料30的运动状态;第二收料辊3023转动能够使得物料30与掩盖 膜31分离并回收曝光后的物料30,将其缠绕成卷便于后续进一步加工。Specifically, there is a roll of unexposed material 30 on the second discharge roller 3022, and the rotation of the second discharge roller 3022 can release the unexposed material 30; the second driving roller 3021 is arranged on the first driving roller 3031 matched position, and can form rolling pressure with the first driving roller 3031, so that the material 30 and the masking film 31 are rolled together after passing through the first driving roller 3031 and the second driving roller 3021, and the movement paths overlap, and can be completely The consistent and synchronous motion passes through the exposure area 301 a, improving the consistency of the material 30 and the masking film 31 . In addition, both the material 30 and the masking film 31 are transported in a roll-to-roll manner, so that the feeding device 302 and the masking device 303 can share a set of control systems, reduce the rotation error between the roller shafts, and improve the consistency of the roller shaft movement, thereby The consistency and stability of the movement of the masking film 31 and the material 30 are further improved. The above rotation error includes but not limited to the starting time of the roller shaft, the rotation speed of the roller shaft and the like. By controlling the rotation direction and rotation speed of the second driving roller 3021, the material 30 and the masking film 31 can be continuously transported to the exposure area 301a and the movement state of the material 30 can be controlled; the rotation of the second receiving roller 3023 can separate the material 30 from the masking film 31 The exposed material 30 is recovered and wound into rolls for subsequent further processing.

本实施例中,采用卷对卷的物料30运送方式,使得物料30在加工后能够迅速被收集,提高曝光设备300的工作效率。In this embodiment, the roll-to-roll material 30 is transported, so that the material 30 can be collected quickly after processing, and the working efficiency of the exposure device 300 is improved.

可选地,送料装置302包括:第二从动辊3024,用于支撑物料31,以使物料31经过曝光区域301a并以第一速度连续离开曝光区域301a。Optionally, the feeding device 302 includes: a second driven roller 3024 for supporting the material 31 so that the material 31 passes through the exposure area 301 a and leaves the exposure area 301 a continuously at a first speed.

具体地,第二从动辊3024设置于物料30经过曝光装置301后的运动路径上,能够支撑物料30使其在曝光区域301a内保持平整。优选地,第二从动辊3024设置于与第一从动辊3034相配合的位置,使得物料30与掩盖膜31在第一从动辊3034与第二从动辊3024处被再次辊压。由此,位于主动辊与从动辊之间的物料30与掩盖膜31的运动路径完全一致,通过控制两个主动辊的转动能够使得主动辊与从动辊之间的物料30与掩盖膜31连续、稳定地进入并离开曝光区域301a,进一步提升物料30与掩盖膜31运动的一致性与稳定性。Specifically, the second driven roller 3024 is arranged on the moving path of the material 30 after passing through the exposure device 301, and can support the material 30 to keep it flat in the exposure area 301a. Preferably, the second driven roller 3024 is arranged at a position matched with the first driven roller 3034 , so that the material 30 and the masking film 31 are rolled again at the first driven roller 3034 and the second driven roller 3024 . Thus, the movement path of the material 30 between the driving roller and the driven roller is exactly the same as that of the masking film 31. By controlling the rotation of the two driving rollers, the material 30 and the masking film 31 between the driving roller and the driven roller can Entering and leaving the exposure area 301 a continuously and stably further improves the consistency and stability of the movement of the material 30 and the masking film 31 .

可选地,送料装置302还包括:第二导向辊3025,设置于第二放料辊3022与第二主动辊3021之间和/或设置于第二从动辊3024与第二收料辊3023之间,用于支撑物料30,以使物料30按照第二导向辊3025的排布路径被运送。Optionally, the feeding device 302 further includes: a second guide roller 3025, arranged between the second unwinding roller 3022 and the second driving roller 3021 and/or arranged between the second driven roller 3024 and the second receiving roller 3023 between them are used to support the material 30 so that the material 30 is conveyed according to the arrangement path of the second guide roller 3025 .

应理解,第二导向辊3025的数量可以是多个,其排布方式可以根据物料30的长度、曝光设备300的尺寸等因素进行配置;当曝光区域301a较大时,也可以在第二主动辊3021与第二从动辊3024之间设置一定数量的第二导向辊,以支撑物料30以及掩盖膜31,使其连续稳定地通过曝光区域301a。It should be understood that the number of the second guide rollers 3025 can be multiple, and their arrangement can be configured according to factors such as the length of the material 30 and the size of the exposure device 300; A certain number of second guide rollers are arranged between the roller 3021 and the second driven roller 3024 to support the material 30 and the masking film 31 to pass through the exposure area 301a continuously and stably.

本实施例中,通过设置导向辊3025能够支撑并设计物料30的运动轨迹,使得物料30能够沿需要的轨迹运动,便于将曝光设备300的结构设计得更加紧凑,在提高物料30运动稳定性的同时减小了曝光设备300的体积。In this embodiment, the guide roller 3025 can support and design the movement track of the material 30, so that the material 30 can move along the required track, which facilitates the design of the exposure device 300 to be more compact, and improves the movement stability of the material 30. At the same time, the volume of the exposure device 300 is reduced.

可选地,曝光装置301包括:多个光源3011,多个光源3011沿送料方向排列设置。Optionally, the exposure device 301 includes: a plurality of light sources 3011 arranged in a row along the feeding direction.

具体地,多个光源3011能够增大曝光区域301a的面积,从而使 得更多经过曝光区域301a的物料30被曝光。多个光源3011均设置于掩盖装置303的第一主动辊3031和第一从动辊3034之间。其他实施例中,光源3011的数量可以是一个。Specifically, multiple light sources 3011 can increase the area of the exposure area 301a, so that more materials 30 passing through the exposure area 301a are exposed. A plurality of light sources 3011 are disposed between the first driving roller 3031 and the first driven roller 3034 of the masking device 303 . In other embodiments, the number of light source 3011 may be one.

本实施例中,通过设置多个光源3011,能够增大同一时间曝光区域301a中物料30的曝光面积,从而提高曝光设备300的工作效率。In this embodiment, by setting multiple light sources 3011 , the exposure area of the material 30 in the exposure area 301 a at the same time can be increased, thereby improving the working efficiency of the exposure device 300 .

图5为本申请实施例另一种曝光设备300的示意性结构图。FIG. 5 is a schematic structural diagram of another exposure device 300 according to an embodiment of the present application.

如图5所示,可选地,曝光设备300包括:第一曝光装置301与第二曝光装置301’,分别设置于物料30的第一侧以及与第一侧相对的第二侧。As shown in FIG. 5 , optionally, the exposure equipment 300 includes: a first exposure device 301 and a second exposure device 301', which are respectively disposed on a first side of the material 30 and a second side opposite to the first side.

应理解,物料30通常包括基材以及涂覆于其上的光刻胶,光刻胶可涂覆于基材的一侧或两侧。在一些应用场景中,需要对物料30进行双面曝光,因此在基材的两侧均涂覆有光刻胶。此时,物料30包括基材以及涂覆于基材两侧的光刻胶。通过在曝光设备300中设置两个相对的曝光装置301与曝光装置301’,能够分别在物料30的两侧同时对物料两侧进行曝光具有双面曝光功能。It should be understood that the material 30 generally includes a substrate and a photoresist coated thereon, and the photoresist may be coated on one side or both sides of the substrate. In some application scenarios, the material 30 needs to be exposed on both sides, so both sides of the substrate are coated with photoresist. At this time, the material 30 includes a substrate and photoresist coated on both sides of the substrate. By arranging two opposite exposure devices 301 and 301' in the exposure equipment 300, it is possible to simultaneously expose both sides of the material on both sides of the material 30, and has a double-sided exposure function.

可选地,曝光设备300包括:第一掩盖装置303与第二掩盖装置303’,分别设置于第一侧与第二侧。Optionally, the exposure equipment 300 includes: a first masking device 303 and a second masking device 303', which are respectively disposed on the first side and the second side.

具体地,曝光设备300具有两个分别与曝光装置301、曝光装置301’对应的掩盖装置303、掩盖装置303’,能够同时在物料30的两侧进行图案化曝光,进一步提升了曝光设备300的工作效率以及性能。Specifically, the exposure device 300 has two masking devices 303 and 303' corresponding to the exposure device 301 and the exposure device 301' respectively, which can perform patterned exposure on both sides of the material 30 at the same time, further improving the performance of the exposure device 300. productivity and performance.

在图5所示的曝光设备300中,物料30在经过第二主动辊3021后,与掩盖膜31、掩盖膜31’一起被掩盖装置303的第一主动辊3031与掩盖装置303’的第三主动辊3031’辊压并进入曝光区域301a。物料30掩盖膜31及掩盖膜31’以相同的送料路径经过曝光区域301a,被掩盖装置303的第一从动辊3034、掩盖装置303的第三从动辊3034’辊压后,分别被收卷,从而保证了曝光区域301a中物料30与掩盖膜31及掩盖膜31’运动的稳定性与一致性。即第一掩盖装置303、第二掩盖装置303’以及送料装置302使得物料30与掩盖膜31、掩盖膜31’在进入曝光区域301a时的送料路径重合。In the exposure equipment 300 shown in FIG. 5 , after passing through the second driving roller 3021, the material 30 is passed by the first driving roller 3031 of the masking device 303 and the third driving roller 303' of the masking device 303' together with the masking film 31 and the masking film 31'. The driving roller 3031' rolls and enters the exposure area 301a. The material 30, the masking film 31 and the masking film 31', pass through the exposure area 301a through the same feeding path, and after being rolled by the first driven roller 3034 of the masking device 303 and the third driven roller 3034' of the masking device 303, they are collected respectively. roll, thereby ensuring the stability and consistency of the movement of the material 30, the masking film 31 and the masking film 31' in the exposure area 301a. That is, the first masking device 303, the second masking device 303' and the feeding device 302 make the material 30 coincide with the feeding path of the masking film 31 and the masking film 31' when entering the exposure area 301a.

可选地,第一掩盖装置303的掩盖膜31与所述第二装掩盖装置303’的掩盖膜31’的图案相同。Optionally, the masking film 31 of the first masking device 303 has the same pattern as the masking film 31' of the second masking device 303'.

本实施例中,物料两侧的掩盖膜31与掩盖膜31’的图案相同,使得经过曝光的物料30能够在两侧具有完全一致且对应的图案,从而在一些应用场景中形成通孔等结构,使得曝光设备300能够应用于制孔工艺中,扩展了曝光设备300的应用场景。In this embodiment, the pattern of the masking film 31 on both sides of the material is the same as that of the masking film 31', so that the exposed material 30 can have completely consistent and corresponding patterns on both sides, thereby forming structures such as through holes in some application scenarios , so that the exposure equipment 300 can be applied in the hole-making process, and the application scenarios of the exposure equipment 300 are expanded.

虽然已经参考优选实施例对本申请进行了描述,但在不脱离本申请的范围的情况下,可以对其进行各种改进并且可以用等效物替换其中的部件。尤其是,只要不存在结构冲突,各个实施例中所提到的各项技术特征均可以任意方式组合起来。本申请并不局限于文中公开的特定实施例,而是包括落入权利要求的范围内的所有技术方案。While the application has been described with reference to a preferred embodiment, various modifications may be made and equivalents may be substituted for elements thereof without departing from the scope of the application. In particular, as long as there is no structural conflict, the technical features mentioned in the various embodiments can be combined in any manner. The present application is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims (11)

一种曝光设备,其特征在于,所述设备包括:An exposure device, characterized in that the device comprises: 曝光装置,用于曝光物料;Exposure device for exposing materials; 送料装置,用于沿送料方向以第一速度连续运送所述物料至所述曝光装置的曝光区域;a feeding device, configured to continuously transport the material to the exposure area of the exposure device at a first speed along the feeding direction; 掩盖装置,用于沿所述送料方向以所述第一速度连续运送掩盖膜至所述曝光区域,所述掩盖膜用于在所述曝光装置曝光所述物料时进行区域性遮光;a masking device, configured to continuously transport a masking film to the exposure area at the first speed along the feeding direction, and the masking film is used for regional shading when the exposure device exposes the material; 所述送料装置与所述掩盖装置使得所述物料与所述掩盖膜在进入所述曝光区域时的送料路径重合。The feeding device and the masking device make the feeding path of the material and the masking film coincide when entering the exposure area. 根据权利要求1所述的设备,其特征在于,所述掩盖装置包括:The apparatus of claim 1, wherein said masking means comprises: 第一放料辊、第一主动辊与第一收料辊;The first unwinding roller, the first driving roller and the first receiving roller; 其中,所述第一放料辊与所述第一收料辊分别设置于所述曝光装置的两侧,所述第一主动辊以所述第一速度为线速度转动,以使所述掩盖膜以所述第一速度连续进入所述曝光区域。Wherein, the first unwinding roller and the first receiving roller are respectively arranged on both sides of the exposure device, and the first driving roller rotates at the first speed as a linear speed, so that the covering Film enters said exposure zone continuously at said first speed. 根据权利要求2所述的设备,其特征在于,所述掩盖装置包括:The apparatus of claim 2, wherein said masking means comprises: 第一从动辊,用于支撑所述掩盖膜,以使所述掩盖膜经过所述曝光区域并以所述第一速度连续离开所述曝光区域。The first driven roller is used to support the masking film so that the masking film passes through the exposure area and leaves the exposure area continuously at the first speed. 根据权利要求3所述的设备,其特征在于,所述掩盖装置还包括:The apparatus according to claim 3, wherein said masking means further comprises: 第一导向辊,设置于所述第一放料辊与所述第一主动辊之间和/或所述第一从动辊与所述第一收料辊之间,用于支撑所述掩盖膜以使所述掩盖膜按照所述第一导向辊的排布路径被运送。A first guide roller, arranged between the first unwinding roller and the first driving roller and/or between the first driven roller and the first receiving roller, for supporting the cover film so that the masking film is conveyed along the arrangement path of the first guide roller. 根据权利要求2-4中任一项所述的设备,其特征在于,所述送料装置包括:The device according to any one of claims 2-4, wherein the feeding device comprises: 第二放料辊、第二主动辊以及第二收料辊;The second unwinding roller, the second driving roller and the second receiving roller; 其中,所述第二放料辊与所述第二收料辊分别设置于所述曝光装置的两侧,所述第二主动辊设置于与所述第一主动辊相配合的位置并以所述第一速度为线速度转动,以使所述物料与所述掩盖膜被所述第一主动辊与所述第二主动辊辊压并以所述第一速度连续进入所述曝光区域。Wherein, the second discharging roller and the second receiving roller are respectively arranged on both sides of the exposure device, and the second driving roller is arranged at a position matched with the first driving roller and The first speed is rotating at a linear speed, so that the material and the masking film are rolled by the first driving roller and the second driving roller and continuously enter the exposure area at the first speed. 根据权利要求5所述的设备,其特征在于,所述送料装置包括:The apparatus according to claim 5, wherein the feeding device comprises: 第二从动辊,用于支撑所述物料,以使所述物料经过所述曝光区域并以所述第一速度连续离开所述曝光区域。The second driven roller is used to support the material so that the material passes through the exposure area and leaves the exposure area continuously at the first speed. 根据权利要求6所述的设备,其特征在于,所述送料装置还包括:The device according to claim 6, wherein the feeding device further comprises: 第二导向辊,设置于所述第二放料辊与所述第二主动辊之间和/或设置于所述第二从动辊与所述第二收料辊之间,用于支撑所述物料,以使所述物料按照所述第二导向辊的排布路径被运送。The second guide roller is arranged between the second unwinding roller and the second driving roller and/or between the second driven roller and the second receiving roller for supporting the the materials so that the materials are transported according to the arrangement path of the second guide rollers. 根据权利要求1-7中任一项所述的设备,其特征在于,所述曝光装置包括:The apparatus according to any one of claims 1-7, wherein the exposure device comprises: 多个光源,多个所述光源沿所述送料方向排列设置。A plurality of light sources, the plurality of light sources are arranged in a row along the feeding direction. 根据权利要求1-8中任一项所述的设备,其特征在于,所述设备包括:The device according to any one of claims 1-8, wherein the device comprises: 第一曝光装置与第二曝光装置,分别设置于所述物料的第一侧以及与所述第一侧相对的第二侧。The first exposure device and the second exposure device are respectively arranged on the first side of the material and the second side opposite to the first side. 根据权利要求9所述的设备,其特征在于,所述设备包括:The device according to claim 9, characterized in that said device comprises: 第一掩盖装置与第二掩盖装置,分别设置于所述第一侧与所述第二侧。The first covering device and the second covering device are respectively arranged on the first side and the second side. 根据权利要求10所述的设备,其特征在于,所述第一掩盖装置的掩盖膜与所述第二掩盖装置的掩盖膜的图案相同。The apparatus of claim 10, wherein the masking film of the first masking means is of the same pattern as the masking film of the second masking means.
PCT/CN2023/071529 2022-01-26 2023-01-10 Exposure apparatus WO2023143042A1 (en)

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CN116360219A (en) * 2021-12-21 2023-06-30 宁德时代新能源科技股份有限公司 Exposure apparatus
CN217181403U (en) * 2022-01-26 2022-08-12 宁德时代新能源科技股份有限公司 Exposure equipment

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