WO2023093450A1 - Heating assembly and aerosol generating apparatus - Google Patents

Heating assembly and aerosol generating apparatus Download PDF

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Publication number
WO2023093450A1
WO2023093450A1 PCT/CN2022/128026 CN2022128026W WO2023093450A1 WO 2023093450 A1 WO2023093450 A1 WO 2023093450A1 CN 2022128026 W CN2022128026 W CN 2022128026W WO 2023093450 A1 WO2023093450 A1 WO 2023093450A1
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WO
WIPO (PCT)
Prior art keywords
layer
heating
substrate
infrared
temperature
Prior art date
Application number
PCT/CN2022/128026
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French (fr)
Chinese (zh)
Inventor
梁峰
刘小力
郭玉
Original Assignee
深圳麦时科技有限公司
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Publication of WO2023093450A1 publication Critical patent/WO2023093450A1/en

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    • AHUMAN NECESSITIES
    • A24TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24FSMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/40Constructional details, e.g. connection of cartridges and battery parts
    • AHUMAN NECESSITIES
    • A24TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24FSMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/40Constructional details, e.g. connection of cartridges and battery parts
    • A24F40/46Shape or structure of electric heating means
    • AHUMAN NECESSITIES
    • A24TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24FSMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/50Control or monitoring
    • AHUMAN NECESSITIES
    • A24TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24FSMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/50Control or monitoring
    • A24F40/53Monitoring, e.g. fault detection
    • AHUMAN NECESSITIES
    • A24TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24FSMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/50Control or monitoring
    • A24F40/57Temperature control

Definitions

  • the invention relates to the technical field of electronic atomization devices, in particular to a heating component and an aerosol generating device.
  • HNB aerosol generators have attracted more and more attention and favor because of their safety, convenience, health, and environmental protection.
  • the existing heat-not-burn aerosol generating device generally includes a heating assembly and a power supply assembly; wherein the heating assembly is used to heat and atomize the aerosol generating substrate when energized, and the power supply assembly is connected to the heating assembly for feeding the heating assembly powered by.
  • the heating assembly is used to heat and atomize the aerosol generating substrate when energized
  • the power supply assembly is connected to the heating assembly for feeding the heating assembly powered by.
  • external temperature measuring elements such as thermocouple temperature sensors are generally added to measure the temperature of the heating component in real time, so as to adjust the heating temperature at any time.
  • measuring temperature by adding a separate temperature measuring sensor or element will not only occupy a large space, but also be inconvenient to install.
  • the present application provides a heating assembly and an aerosol generating device.
  • the heating assembly can solve the existing problem of adding a separate temperature measuring sensor or temperature measuring element to measure temperature, which not only occupies a large space, but also is inconvenient to install.
  • the present application provides a heating assembly.
  • the heating assembly includes a substrate, an infrared layer, and a heating element; wherein, the substrate is used to accommodate aerosol-generating substrates; the infrared layer is arranged on the surface of the substrate and/or the infrared layer, and is used for radiating infrared rays during heating to heat and atomize the gas
  • the sol produces a substrate; the heating element is arranged on the substrate to heat the infrared layer when the electricity is applied; wherein, the heating element has a temperature coefficient of resistance (temperature coefficient of resistance, TCR) characteristic and can be used as a temperature sensor.
  • TCR temperature coefficient of resistance
  • the heating element is a heating layer, and the heating layer is arranged on the surface of the infrared layer away from the substrate.
  • the heating element is arranged on the surface of the substrate and arranged at intervals from the infrared layer.
  • the heating element is a heating layer, and the heating layer is arranged on the surface of the base body and between the base body and the infrared layer.
  • the present application provides a heating assembly.
  • the heating assembly includes a substrate, an infrared layer, a heating element, and a temperature measuring layer; wherein, the substrate is used to contain the aerosol generating substrate; the infrared layer is arranged on the surface of the substrate, and is used to radiate infrared rays during heating to heat and atomize the aerosol Generate a substrate; the heating element is arranged on the substrate for heating the infrared layer when energized; the temperature measuring layer is arranged on the surface of the substrate and/or the infrared layer, and is spaced from the heating element; wherein, the temperature measuring layer has a temperature coefficient of resistance ( TCR) characteristics.
  • TCR temperature coefficient of resistance
  • the temperature measuring layer is arranged on the surface of the substrate, and the temperature measuring layer and the infrared layer are located on the same surface of the substrate and arranged at intervals from each other.
  • the temperature measuring layer is arranged on the surface of the infrared layer away from the substrate, and the temperature measuring layer is arranged at intervals from the heating element.
  • the temperature measuring layer is arranged around the circumferential direction of the base body.
  • the temperature measuring layer is located at the end of the substrate.
  • the substrate is a hollow columnar body
  • the infrared layer is arranged on the outer surface of the hollow columnar body
  • the heating element is a heating layer arranged on the surface of the infrared layer away from the substrate.
  • the base body is a hollow columnar body
  • the infrared layer is arranged on the inner surface of the base body of the hollow columnar body
  • the heating element is a heating layer arranged on the surface of the infrared layer away from the base body.
  • the heating layer is located in the middle of the base body and is distributed in a wave shape along the circumferential direction of the base body.
  • the substrate is quartz.
  • the infrared layer, the heating element and the temperature measuring layer are all arranged on the outer surface of the substrate by silk screen printing or coating, and the area of the temperature measuring layer is smaller than that of the infrared layer.
  • the present application provides an aerosol generating device.
  • the aerosol generating device includes: a heating assembly, a power supply assembly and a controller; wherein, the heating assembly is used to heat and atomize the aerosol generating substrate when energized; the heating assembly is the heating assembly as mentioned above; the power supply assembly and the heating assembly
  • the heating assembly and the aerosol generating device provided by the application.
  • the heating component is provided with a substrate, so as to receive the aerosol generating substrate through the substrate.
  • an infrared layer is arranged on the surface of the substrate to radiate infrared rays when the infrared layer is heated, so that the substrate is heated and atomized by the radiated infrared rays to generate the substrate, thereby improving the heating efficiency, and the heating uniformity is better.
  • a heating element on the substrate and/or the infrared layer, the infrared layer is heated when the heating element is energized, so that the infrared layer radiates infrared rays.
  • the heating element has a temperature coefficient of resistance (TCR) characteristic, it can be used as a temperature sensor, so that the heating assembly can monitor the temperature value of the heating assembly by detecting the resistance value of the heating element.
  • TCR temperature coefficient of resistance
  • the element is in the form of a film, which can be directly deposited on the surface of the substrate and/or the infrared layer, without installing grooves on the surface of the substrate and/or the infrared layer or fixing it with screws or screws, so that the heating element not only Easy to set up and takes up little space.
  • the heating element can be selected to cover some specific positions of the substrate and/or the infrared layer and to cover a larger area of the substrate and/or the surface of the infrared layer according to actual needs, it is possible to control the surface of the substrate and/or the infrared layer.
  • the temperature measurement is performed in a specific area, and the temperature measurement accuracy is high, and the temperature measurement can be performed on most areas of the substrate and/or the infrared layer, effectively expanding the temperature measurement range of the heating component.
  • FIG. 1 is a schematic structural diagram of a heating assembly provided in the first embodiment of the present application
  • Fig. 2 is a schematic structural diagram of the heating assembly corresponding to Fig. 1;
  • Fig. 3 is a schematic structural diagram of a heating assembly provided in a second embodiment of the present application.
  • Fig. 4 is an A-A sectional view of the heating assembly shown in Fig. 3;
  • Fig. 5 is a schematic structural diagram of a heating assembly provided in a third embodiment of the present application.
  • Fig. 6 is a schematic structural diagram of the heating assembly corresponding to Fig. 5;
  • FIG. 7 is a schematic structural diagram of a heating assembly provided in a fourth embodiment of the present application.
  • Fig. 8 is a schematic structural diagram of the heating assembly corresponding to Fig. 7;
  • Fig. 9 is a schematic structural diagram of an aerosol generating device provided by an embodiment of the present application.
  • first”, “second”, and “third” in this application are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, features defined as “first”, “second”, and “third” may explicitly or implicitly include at least one of these features.
  • “plurality” means at least two, such as two, three, etc., unless otherwise specifically defined. All directional indications (such as up, down, left, right, front, back%) in the embodiments of the present application are only used to explain the relative positional relationship between the various components in a certain posture (as shown in the drawings) , sports conditions, etc., if the specific posture changes, the directional indication also changes accordingly.
  • Figure 1 is a schematic structural diagram of the heating assembly provided in the first embodiment of the present application
  • Figure 2 is a schematic structural diagram of the heating assembly corresponding to Figure 1; in this embodiment, a heating The assembly 10, the heating assembly 10 is specifically used for heating and atomizing the aerosol-generating substrate when energized to form an aerosol.
  • the heating assembly 10 can be used in different fields, such as electronic atomization and other fields.
  • the heating assembly 10 includes a substrate 11 , an infrared layer 12 and a heating element 13 . Wherein, the heating element 13 is used to generate heat when energized.
  • the base body 11 may be in the shape of a hollow column, and the hollow structure of the base body 11 is formed into a receiving cavity 111, and the receiving cavity 111 is used for storing the aerosol-generating substrate.
  • the aerosol-generating substrate can be a plant-grass-like substrate or a paste-like substrate.
  • the base body 11 is made of insulating material, and the base body 11 may be a high temperature resistant insulating material such as quartz glass, ceramics or mica, so as to prevent short circuit between two electrodes.
  • the substrate 11 can be transparent quartz.
  • the substrate 11 can also be made of conductive materials, and in this case an insulating layer can be coated on the surface of the substrate 11 .
  • the base body 11 is a cylindrical ceramic tube. It should be noted that, the inner surface of the base body 11 referred to in the following embodiments refers to the inner wall surface of the receiving cavity 111 , and the outer surface of the base body 11 refers to the outer wall surface of the receiving cavity 111 .
  • the infrared layer 12 is disposed on the surface of the substrate 11 for radiating infrared rays when heated to heat and atomize the aerosol generating substrate.
  • the infrared layer 12 can be formed on the inner surface or the outer surface of the substrate 11 by means of silk screen printing, sputtering, coating, printing and the like.
  • the infrared rays radiated from the infrared layer 12 are used to heat the aerosol-generating substrate, so that the heating efficiency is high, and the aerosol-generating substrate is baked more uniformly.
  • the infrared layer 12 may specifically be an infrared heating film, such as an infrared ceramic coating.
  • the thickness and area of the infrared heating film are not limited, and can be selected according to needs.
  • the infrared layer 12 can be a metal layer, a conductive ceramic layer or a conductive carbon layer.
  • the shape of the infrared layer 12 can be continuous film, porous mesh or strip.
  • the material, shape and size of the infrared layer 12 can be set as required.
  • the infrared layer 12 when the infrared layer 12 is electrified, it radiates infrared rays to heat the aerosol-generating substrate in the containing cavity 111 .
  • the wavelength of infrared heating is 2.5um-20um. According to the characteristics of heating aerosol to form a matrix, the heating temperature usually needs to be above 350°C, and the energy radiation extreme value is mainly in the 3-5um band.
  • the infrared layer 12 is specifically arranged on the outer surface of the substrate 11, and the entire outer surface of the substrate 11 can be formed with the infrared layer 12, so as to realize uniform heating while avoiding the generation of the heating element 13. After the heat is conducted through the substrate 11, the heat is lost, resulting in a large error in the temperature measurement result; at the same time, the problem of the infrared layer 12 being scratched by the aerosol-generated substrate is avoided.
  • FIG. 3 and FIG. 4 wherein FIG. 3 is a schematic structural diagram of the heating assembly provided in the second embodiment of the present application; FIG. 4 is a cross-sectional view of the heating assembly shown in FIG. 3 along the direction A-A.
  • the infrared layer 12 can also be formed on the inner surface of the substrate 11, which is not limited in the present application.
  • the heating element 13 is disposed on the surface of the substrate 11 and/or the infrared layer 12 for heating the infrared layer 12 when electrified. It can be understood that, in this embodiment, the infrared layer 12 itself does not generate heat, but the temperature of the infrared layer 12 itself changes after the heating element 13 transfers heat to the infrared layer 12 after being energized to generate heat.
  • the heating element 13 can also be formed by silk screen printing, sputtering, coating, printing and other methods.
  • the heating element 13 can specifically be a heating film; for example, a conductive film such as a copper film or an aluminum film.
  • the heating element 13 has a temperature coefficient of resistance (TCR) characteristic and can be used as a temperature sensor. That is, the resistance value of the heating element 13 has a monotonous one-to-one correspondence with its own temperature value. For example, the resistance value of the heating element 13 increases as its temperature increases; or, the resistance value of the heating element 13 decreases as its temperature increases. In this way, the heating component 10 can monitor the temperature value of the heating component 10 by detecting the resistance value of the heating element 13 , and then adjust the temperature field of the heating component 10 to achieve the best effect of puffing taste.
  • TCR temperature coefficient of resistance
  • the heating element 13 is in the form of a film, it can be directly deposited on the surface of the substrate 11 and/or the infrared layer 12, without the need for a layer on the substrate 11 and/or Mounting grooves are provided on the surface of the infrared layer 12 or fixed with screws or screws, so that the heating element 13 is not only easy to install, but also takes up less space.
  • the heating element 13 can be selected to cover some specific positions of the substrate 11 and/or the infrared layer 12 and to cover a larger area of the substrate 11 and/or the surface of the infrared layer 12 according to actual needs, the substrate 11 and the infrared layer 12 can be controlled.
  • the temperature measurement accuracy is high, and the temperature can be measured for most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the temperature measurement range of the heating component 10 .
  • the heating element 13 can at least cover the highest temperature region of the heating component 10, so as to avoid the problem that the local temperature is too high and affects the heating taste of the aerosol generating substrate. It can be understood that, in a specific embodiment, if the highest temperature region of the heating component 10 corresponds to a certain region of the substrate 11, the heating element 13 at least covers this position of the substrate 11; if the highest temperature region of the heating component 10 corresponds to A certain position of the infrared layer 12 , the heating element 13 at least covers this position of the infrared layer 12 .
  • the heating element 13 can be arranged in a circle along the circumferential direction of the base body 11 .
  • two electrodes can be set at two preset positions of the heating element 13 , and the two electrodes are respectively used to connect the positive lead and the negative lead to detect the resistance value of the heating element 13 .
  • the heating element 13 can also be in the shape of an arc with a notch along the circumferential direction of the base body 11, and the two ends where the notch of the heating element 13 is located can be formed as two electrodes to connect with the positive electrode lead and the negative electrode.
  • the lead connection is not limited in this application.
  • the heating element 13 can be distributed in a wave shape along the circumferential direction of the base body 11, so as to cover different regions of the heating component 10 as much as possible, and then sense the temperature of different positions of the heating component 10, so as to control the different regions of the heating component 10. The temperature of the area is monitored.
  • the heating element 13 is disposed in the middle of the base body 11 and undulates along the length direction of the base body 11 , thereby covering different regions along the length direction of the base body 11 .
  • the heating elements 13 can also be distributed in a linear, bent, point-like manner along the circumferential direction of the base body 11; this application does not limit this, and the specific distribution positions of the heating elements 13 It can be selected according to actual needs, as long as the temperature value of the heating component 10 can be detected in real time.
  • the infrared layer 12 and the heating element 13 can be arranged on the same surface of the substrate 11, or on different surfaces of the substrate 11, for example, one is arranged on the inner surface of the substrate 11, and the other is arranged on the inner surface of the substrate 11.
  • Heating element 13 can only be arranged on the surface of infrared layer 12, also can only be arranged on the surface of substrate 11, can also be arranged on the surface of infrared layer 12 and substrate 11 simultaneously, for example, a part is arranged on the surface of infrared layer 12, another part set on the surface of the substrate 11.
  • the temperature measuring layer 13 can be arranged on the surface of the infrared layer 12 facing away from the substrate 11 , or on the surface of the infrared layer 12 close to the substrate 11 .
  • the heating element 13 is only disposed on the surface of the infrared layer 12 away from the base 11 .
  • the infrared layer 12 can cover the entire surface of the base body 11, and when the infrared layer 12 is arranged on the outer surface of the base body 11, the specific structure of the heating assembly 10 is as shown in Figure 1; On the surface, the specific structure of the heating assembly 10 is shown in Fig. 3 and Fig. 4 .
  • the temperature of the heating element 13 increases continuously, and its resistance value changes with the change of its own temperature, thereby detecting the temperature of the heating assembly 10 by detecting the resistance value of the heating element 13 itself. value, and then adjust the temperature field of the heating component 10 to achieve the best effect of the taste of the puff.
  • the passive infrared layer 12 itself has a heat conduction function, the parts where the infrared layer 12 and the heating element 13 do not overlap can conduct heat; therefore, the area of the heating element 13 can be made close to or smaller than the area of the infrared layer 12.
  • the heating element 13 may be located in the middle of the base body 11 along its axial direction, and distributed around the outer surface of the base body 11 in a wave shape.
  • the heating element 13 is only arranged on the surface of the substrate 11 and is on the same plane as the infrared layer 12, so that after the heating element 13 is energized and generates heat, the heat is transferred to the substrate 11, and then transferred to the infrared layer through the substrate 11 12, so that the infrared layer 12 heats and radiates infrared rays.
  • the heating element 13 can be spaced apart from the infrared layer 12; or, the heating element 13 is located between the substrate 11 and the infrared layer 12, which is not limited in the present application.
  • both the heating element 13 and the infrared layer 12 are disposed on the base 11 and located on different surfaces of the base 11 .
  • the heating element 13 is arranged on the inner surface of the base body 11, and the infrared layer 12 is arranged on the outer surface of the base body 11. After the heating element 13 is energized, the temperature after heating is conducted to the base body 11, and the temperature of the base body 11 is further conducted to the infrared layer 12, thereby The infrared layer 12 is heated to radiate infrared rays.
  • the heating element 13 is disposed on the outer surface of the base 11
  • the infrared layer 12 is disposed on the inner surface of the base 11 .
  • a base body 11 is provided so as to accommodate the aerosol-generating substrate through the base body 11 .
  • the infrared layer 12 on the surface of the substrate 11 to radiate infrared rays when the infrared layer 12 is heated, the radiated infrared rays heat and atomize the aerosol to generate the substrate, thereby improving the heating efficiency, and the heating uniformity is better.
  • the heating element 13 on the substrate 11 and/or the infrared layer 12, the infrared layer 12 is heated when the heating element 13 is energized, so that the infrared layer 12 radiates infrared rays.
  • the heating element 13 has a temperature coefficient of resistance (TCR) characteristic, so that the heating assembly 10 can monitor the temperature value of the heating assembly 10 by detecting the resistance value of the heating element 13, compared with the prior art, the heating element 13 Not only is it easy to set up, but it also takes up less space.
  • the heating element 13 can be selected to cover some specific positions of the substrate 11 and/or the infrared layer 12 and to cover a larger area of the substrate 11 and/or the surface of the infrared layer 12 according to actual needs, the substrate 11 and the infrared layer 12 can be controlled.
  • the temperature measurement accuracy is high, and the temperature can be measured for most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the temperature measurement range of the heating component 10 .
  • FIG. 5 is a schematic structural diagram of a heating assembly provided in the third embodiment of the present application
  • FIG. 6 is a schematic structural diagram of the heating assembly corresponding to FIG. 5
  • another heating assembly 10 is provided.
  • the difference between the heating assembly 10 and the heating assembly 10 provided in the above-mentioned first embodiment is that the heating assembly 10 further includes a temperature measuring layer 14 .
  • the temperature measuring layer 14 has a temperature coefficient of resistance (TCR) characteristic. That is, the resistance value of the temperature measuring layer 14 has a monotonous one-to-one correspondence with its own temperature value. For example, the resistance value of the temperature measuring layer 14 increases as its temperature increases; or, the resistance value of the temperature measuring layer 14 decreases as its temperature increases.
  • TCR temperature coefficient of resistance
  • the heating component 10 can monitor the temperature value of the heating component 10 by detecting the resistance value of the temperature measuring layer 14 , and then adjust the temperature field of the heating component 10 to achieve the best effect of puffing taste.
  • the temperature-measuring layer 14 is in the form of a film, it can be directly deposited on the surface of the substrate 11 and/or the infrared layer 12 without the need Or the surface of the infrared layer 12 is provided with mounting grooves or fixed with screws or screws, so that the temperature measuring layer 14 is not only easy to install, but also takes up less space.
  • the resistance value of the heating element 13 can also be detected simultaneously to monitor the temperature value of the heating assembly 10, so as to improve the accuracy of the temperature monitoring result.
  • the heating element 13 may not have a temperature coefficient of resistance (TCR) characteristic, which is not limited in this embodiment.
  • the temperature measuring layer 14 can be formed on the surface of the substrate 11 and/or the infrared layer 12 by means of screen printing, sputtering, coating, printing, etc., and is spaced apart from the heating element 13 .
  • the temperature measuring layer 14 can select some specific positions covering the substrate 11 and/or the infrared layer 12 and select to cover the surface of the substrate 11 and/or the infrared layer 12 in a larger area according to actual needs, thereby being able to control the substrate 11 and/or a specific area on the surface of the infrared layer 12, the temperature measurement accuracy is high, and it is possible to measure the temperature of most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the temperature measurement of the heating element 10 scope.
  • the temperature measuring layer 14 may at least cover the highest temperature region of the heating component 10, so as to avoid the problem that the local temperature is too high and affects the heating taste of the aerosol generating substrate. It can be understood that, in a specific embodiment, if the highest temperature region of the heating component 10 corresponds to a certain region of the substrate 11, the temperature measuring layer 14 covers at least this position of the substrate 11; if the highest temperature region of the heating component 10 corresponds to At a certain position of the infrared layer 12 , the temperature measuring layer 14 at least covers the position of the infrared layer 12 .
  • the square resistance of the temperature measuring layer 14 is 1 ⁇ / ⁇ ⁇ 5 ⁇ / ⁇ , and the temperature coefficient of resistance of the temperature measuring layer 14 is 300ppm/°C ⁇ 3500ppm/°C. Further, the square resistance of the temperature measuring layer 14 is 2 ⁇ / ⁇ ⁇ 4 ⁇ / ⁇ , and the temperature coefficient of resistance of the temperature measuring layer 14 is 700ppm/°C ⁇ 2000ppm/°C.
  • the area of the temperature measuring layer 14 can be smaller than the area of the infrared layer 12, which can not only reduce energy consumption, and does not affect the heating effect of the infrared layer 12; at the same time, the overall temperature field of the infrared layer 12 can be consistent.
  • the ratio of the area of the temperature measuring layer 14 to the area of the infrared layer 12 may range from 1:5 to 1:10.
  • the resistance paste for preparing the temperature measuring layer 14 includes an organic vehicle, an inorganic binder and a conductive agent.
  • the number of parts of the organic vehicle is 10 to 20 parts
  • the number of parts of the inorganic binder is 30-45 parts
  • the number of conductive agent is 30-50 parts
  • the inorganic binder includes glass powder
  • the conductive agent is at least one selected from silver and palladium.
  • the organic carrier is at least one selected from terpineol, ethyl cellulose, butyl carbitol, polyvinyl butyral, tributyl citrate and polyamide wax.
  • the inorganic binder includes glass frit with a melting point of 700°C-780°C.
  • the temperature measuring layer 14 may be arranged in a circle along the circumferential direction of the base body 11 .
  • two electrodes can be set at two preset positions of the temperature measuring layer 14 , and the two electrodes are respectively used to connect the positive electrode lead and the negative electrode lead to detect the resistance value of the temperature measuring layer 14 .
  • the temperature-measuring layer 14 can also be in the shape of an arc with a gap along the circumferential direction of the substrate 11, and the two ends where the gap of the temperature-measuring layer 14 is located can be formed as two electrodes to connect with the positive electrode lead. It is connected to the negative electrode lead, which is not limited in this application.
  • the temperature measuring layer 14 may be distributed linearly along the circumferential direction of the substrate 11 to detect the temperature of a specific area of the heating assembly 10 .
  • the temperature measuring layer 14 may also be distributed in a linear, connected “Z” shape, U shape, bent shape, point shape, etc. along the circumferential direction of the base body 11 .
  • the material of the temperature measuring layer 14 and the heating element 13 may be the same.
  • the power of the temperature measuring layer 14 is greater than the power of the heating element 13 .
  • the temperature measuring layer 14 and the infrared layer 12 can be arranged on the same surface of the substrate 11, or on different surfaces of the substrate 11, for example, one is arranged on the inner surface of the substrate 11, and the other is arranged on the substrate 11. of the outer surface.
  • the temperature measuring layer 14 can only be arranged on the surface of the infrared layer 12, also can only be arranged on the surface of the substrate 11, can also be arranged on the surface of the infrared layer 12 and the substrate 11 at the same time, for example, a part is arranged on the surface of the infrared layer 12, and another A part is provided on the surface of the substrate 11 .
  • the temperature measuring layer 14 can be arranged on the surface of the infrared layer 12 facing away from the substrate 11 , or on the surface of the infrared layer 12 close to the substrate 11 .
  • the infrared layer 12 is arranged on the outer surface of the substrate 11 , and the temperature measuring layer 14 is only arranged on the surface of the infrared layer 12 facing away from the substrate 11 .
  • the heating element 13 is energized, the temperature of the heating element 13 increases, and the heat generated by the heating element 13 is transferred to the infrared layer 12, and then passed to the temperature measuring layer 14 through the infrared layer 12, so that the temperature of the temperature measuring layer 14 increases with the temperature of the infrared layer.
  • the temperature of the heating element 12 rises, and the resistance value of the temperature measuring layer 14 changes with the temperature change, and then the temperature value of the heating component 10 is monitored in real time by detecting the resistance value of the temperature measuring layer 14 .
  • the base body 11 is a hollow cylinder, and the infrared layer 12 covers the entire outer surface of the base body 11, which can avoid heat loss after the temperature of the heating element 13 conducts heat through the base body 11, resulting in large errors in temperature measurement results. Problems occur; at the same time, avoid the problem that the heating layer 12 is scratched by the aerosol-generating substrate.
  • the heating element 13 can be specifically located in the middle of the base 11 along its axial direction, and is arranged around the outer surface of the base 11 in a wave shape to improve heating uniformity; the temperature measuring layer 14 is arranged on the infrared The position near the end of the layer 12 is used to detect the temperature of a specific area of the heating element 10 .
  • the infrared layer 12 may also be disposed on the inner surface of the substrate 11, which is not limited in the present application.
  • FIG. 7 is a schematic structural diagram of a heating assembly provided in the fourth embodiment of the present application
  • FIG. 8 is a schematic structural diagram of the heating assembly corresponding to FIG. 7
  • the temperature measuring layer 14 is disposed on the surface of the substrate 11 , and is located on the same surface of the substrate 11 as the infrared layer 12 and is spaced apart.
  • the heating element 13 generates heat after being energized, and the temperature of the heating element 13 is conducted to the infrared layer 12, and then transferred to the surface of the substrate 11 through the infrared layer 12, and the temperature of the temperature measuring layer 14 arranged on the surface of the substrate 11 varies with the temperature of the substrate 11.
  • the temperature of the substrate 11 changes, and the resistance value of the temperature-measuring layer 14 changes with the change of temperature, so that the temperature value of the heating component 10 can be monitored in real time by detecting the resistance value of the temperature-measuring layer 14 .
  • the position of the temperature measuring layer 14 is selected to be arranged at any position of the base 11 or any position of the covering base 11 according to actual requirements.
  • the temperature measuring layer 14 may be disposed at the first end.
  • the temperature measuring layer 14 can be arranged in the middle of the substrate 11 , as shown in FIG. 1 . If you want to monitor the temperature of the first end portion and the second end portion of the substrate 11 simultaneously, then a plurality of temperature measuring layers 14 can be set, so that one temperature measuring layer 14 covers the first end portion, and another temperature measuring layer 14 covers the second end portion. end, so as to monitor the temperature of the corresponding position of the substrate 11.
  • the infrared layer 12 can be arranged on the first end of the outer surface of the substrate 11, and the temperature measuring layer 14 can be arranged on the second end of the substrate 11, and is spaced apart from the infrared layer 12, The temperature value of the second end of the substrate 11 is detected by detecting the resistance value of the temperature measuring layer 14 .
  • the base 11 is a hollow cylinder, and the infrared layer 12 is disposed on the outer surface of the base 11 and only exposes one end of the base 11 .
  • the temperature measuring layer 14 is disposed on the exposed area of the outer surface of the base body 11 , spaced apart from the infrared layer 12 , and the temperature measuring layer 14 is disposed around the base body 11 in a circumferential direction.
  • the temperature measuring layer 14 can be arranged in a circle along the circumferential direction of the base body 11, that is, the temperature measuring layer 14 is in a closed ring shape; of course, the temperature measuring layer 14 can also be arranged in an open ring shape along the circumferential direction of the base body 11, that is, The arc corresponding to the temperature measuring layer 14 is less than 360 degrees.
  • the temperature measuring layer 14 is disposed on the surface of the substrate 11 , and the temperature measuring layer 14 is specifically located between the substrate 11 and the infrared layer 12 . It can be understood that, in this embodiment, the temperature measuring layer 14 and the infrared layer 12 are located on the same surface of the substrate 11 .
  • the temperature measuring layer 14 is located on the surface of the substrate 11, and the temperature measuring layer 14, the infrared layer 12 and the heating element 13 are arranged on different surfaces of the substrate 11.
  • the infrared layer 12 and the heating element 13 are disposed on the inner surface of the substrate 11
  • the temperature measuring layer 14 is disposed on the outer surface of the substrate 11 .
  • the temperature of the heating element 13 is transmitted to the infrared layer 12 and the substrate 11 sequentially after being energized and heated, and the temperature of the substrate 11 is further conducted to the temperature measuring layer 14, so that the resistance of the temperature measuring layer 14 changes with its temperature.
  • the infrared layer 12 and the heating element 13 are disposed on the outer surface of the base 11
  • the temperature measuring layer 14 is disposed on the inner surface of the base 11 .
  • the temperature measuring layer 14 and the heating element 13 are located on the same surface of the substrate 11 , and the surface of the substrate 11 and the infrared layer 12 facing away from the substrate 11 can be provided with the temperature measuring layer 14 .
  • the temperature measuring layer 14 disposed on the surface of the substrate 11 and the infrared layer 12 facing away from the substrate 11 can be spaced apart from the heating element 13, and can be arranged in a circle along the circumferential direction of the substrate 11 and distributed in a straight line.
  • the temperature measuring layer 14 disposed on the substrate 11 and the temperature measuring layer 14 disposed on the surface of the infrared layer 12 facing away from the substrate 11 can be arranged at intervals or integrally formed.
  • the temperature measuring layer 14 can sense the temperature of the substrate 11 and the heating element 13 at the same time, so as to ensure that the temperature measuring layer 14 covers at least the heating element 10.
  • the highest temperature area avoids the problem that the highest temperature area of the heating component 10 appears in other areas not covered by the temperature measurement layer 14, resulting in large errors in temperature measurement results.
  • a base body 11 is provided so as to accommodate the aerosol-generating substrate through the base body 11 .
  • the infrared layer 12 on the surface of the substrate 11 to radiate infrared rays when the infrared layer 12 is heated, the radiated infrared rays heat and atomize the aerosol to generate the substrate, thereby improving the heating efficiency, and the heating uniformity is better.
  • the heating element 13 on the substrate 11, the infrared layer 12 is heated when the heating element 13 is energized, so that the infrared layer 12 radiates infrared rays.
  • the temperature measuring layer 14 is not only convenient to install, but also takes up less space.
  • the temperature measuring layer 14 can be selected to cover some specific positions of the base body 11 and/or the infrared layer 12 and to cover a larger area of the base body 11 and/or the surface of the infrared layer 12 according to actual needs, it is possible to control the base body 11 and/or a specific area on the surface of the infrared layer 12, the temperature measurement accuracy is high, and it is possible to measure the temperature of most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the temperature measurement of the heating element 10 scope.
  • FIG. 9 is a schematic structural diagram of an aerosol generating device provided by an embodiment of the present application.
  • an aerosol generating device 100 is provided.
  • the aerosol generating device 100 includes a heating component 10 , a power component 20 and a controller 30 .
  • the heating component 10 is used for heating and atomizing the aerosol-generating substrate to form an aerosol when energized.
  • the heating component 10 can specifically be the heating component 10 involved in any of the above-mentioned embodiments, and its specific structure and function can refer to the description of the specific structure and function of the heating component 10 in the above-mentioned embodiment, and can realize the same or similar technology effect, see below for details.
  • the power supply assembly 20 is connected to the heating assembly 10 for supplying power to the heating assembly 10 .
  • the heating assembly 10 and the power supply assembly 20 may be detachably connected to facilitate the replacement of the heating assembly 10 and improve the utilization rate of the power supply assembly 20 .
  • the power supply assembly 20 and the heating assembly 10 may also be provided integrally, which is not limited in this application.
  • the controller 30 is used to control the power supply assembly 20 to supply power to the heating assembly 10, and detect the resistance value of the temperature measuring layer 14 on the heating assembly 10 in real time, and monitor the temperature of the heating assembly 10 according to the resistance value, and then regulate the temperature field of the heating assembly 10, In order to achieve the best effect of smoking taste.
  • the aerosol generating device 100 further includes a casing 40 , and the heating assembly 10 is specifically housed in the casing 40 and connected to the power supply assembly 20 .
  • the aerosol generating device 100 provided in this embodiment, by setting the heating assembly 10 involved in any one of the above embodiments, makes the aerosol generating device 100 not only heat and atomize the aerosol generating substrate by using radiated infrared rays, to improve heating Efficiency and enhanced heating uniformity; and the temperature value of the heating element 10 can be detected by detecting the resistance value of the heating element 13 or the temperature measuring layer 14 to regulate the temperature field of the heating element 10 to achieve the best effect of smoking taste.
  • the heating element 13 or the temperature measuring layer 14 is in the form of a film, it can be directly deposited on the surface of the substrate 11 and/or the infrared layer 12 without installing and installing on the surface of the substrate 11 and/or the infrared layer 12. Grooves or fixing parts such as screws or screws are used to install and fix it, so that the heating element 13 or temperature measuring layer 14 is not only convenient to set up, but also takes up less space.
  • the heating element 13 or the temperature measuring layer 14 can be selected to cover some specific positions of the substrate 11 or the infrared layer 12 and to cover a larger area of the substrate 11 and/or the surface of the infrared layer 12 according to actual needs, thereby being able to
  • the temperature measurement is performed on a specific area on the surface of the substrate 11 and/or the infrared layer 12, the temperature measurement accuracy is high, and the temperature can be measured on most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the heating element 10. Temperature measurement range.

Abstract

A heating assembly and an aerosol generating apparatus. The heating assembly (10) comprises a base body (11), an infrared layer (12), and a heating element (13); the base body (11) is used for accommodating an aerosol generating substrate; the infrared layer (12) is arranged on the surface of the base body (11) and/or the infrared layer (12), and is used for radiating infrared rays during heating, so as to heat and atomize the aerosol generating substrate; the heating element (13) is arranged on the base body (11) and is used for heating the infrared layer (12) in the process of being energized; and the heating element (13) has a resistance temperature coefficient characteristic and can be used as a temperature sensor. The heating assembly (10) is convenient to arrange, and is small in occupied space.

Description

加热组件及气溶胶产生装置Heating element and aerosol generating device
相关申请的交叉引用Cross References to Related Applications
本申请基于2021年11月26日提交的中国专利申请2021114213272主张其优先权,此处通过参照引入其全部的记载内容。This application claims its priority based on Chinese patent application 2021114213272 submitted on November 26, 2021, and its entire description is incorporated herein by reference.
【技术领域】【Technical field】
本发明涉及电子雾化装置技术领域,尤其涉及一种加热组件及气溶胶产生装置。The invention relates to the technical field of electronic atomization devices, in particular to a heating component and an aerosol generating device.
【背景技术】【Background technique】
加热不燃烧(Heat Not Burning,HNB)气溶胶产生装置因其具有使用安全、方便、健康、环保等优点,而越来越受到人们的关注和青睐。Heat Not Burning (HNB) aerosol generators have attracted more and more attention and favor because of their safety, convenience, health, and environmental protection.
现有的加热不燃烧气溶胶产生装置,其一般包括加热组件和电源组件;其中,加热组件用于在通电时加热并雾化气溶胶产生基质,电源组件与加热组件连接,用于向加热组件供电。在具体加热过程中,经常需要实时监控加热组件或加热组件内气溶胶产生基质的温度,以随时调整温度场,满足不同的温度需求。目前,一般通过增设热电偶温度传感器等外置式测温元件对加热组件进行实时测温,以便于随时调整加热温度。The existing heat-not-burn aerosol generating device generally includes a heating assembly and a power supply assembly; wherein the heating assembly is used to heat and atomize the aerosol generating substrate when energized, and the power supply assembly is connected to the heating assembly for feeding the heating assembly powered by. In the specific heating process, it is often necessary to monitor the temperature of the heating element or the aerosol-generating substrate in the heating element in real time, so as to adjust the temperature field at any time to meet different temperature requirements. At present, external temperature measuring elements such as thermocouple temperature sensors are generally added to measure the temperature of the heating component in real time, so as to adjust the heating temperature at any time.
然而,通过增设单独的测温传感器或测温元件进行测温,不仅会占用较大空间,且安装较为不便。However, measuring temperature by adding a separate temperature measuring sensor or element will not only occupy a large space, but also be inconvenient to install.
【发明内容】【Content of invention】
本申请提高一种加热组件及气溶胶产生装置,该加热组件能够解决现有通过增设单独的测温传感器或测温元件进行测温,不仅会占用较大空间,且安装较为不便的问题。The present application provides a heating assembly and an aerosol generating device. The heating assembly can solve the existing problem of adding a separate temperature measuring sensor or temperature measuring element to measure temperature, which not only occupies a large space, but also is inconvenient to install.
第一方面,本申请提供一种加热组件。该加热组件包括基体、红外 层以及发热元件;其中,基体用于收容气溶胶产生基质;红外层设置于基体和/或红外层的表面,用于在加热时辐射红外线,以加热并雾化气溶胶产生基质;发热元件设置于基体上,用于在通电时加热红外层;其中,发热元件具有电阻温度系数(temperature coefficient of resistance,TCR)特性而可以作为温度传感器。In a first aspect, the present application provides a heating assembly. The heating assembly includes a substrate, an infrared layer, and a heating element; wherein, the substrate is used to accommodate aerosol-generating substrates; the infrared layer is arranged on the surface of the substrate and/or the infrared layer, and is used for radiating infrared rays during heating to heat and atomize the gas The sol produces a substrate; the heating element is arranged on the substrate to heat the infrared layer when the electricity is applied; wherein, the heating element has a temperature coefficient of resistance (temperature coefficient of resistance, TCR) characteristic and can be used as a temperature sensor.
其中,发热元件为发热层,发热层设置于红外层远离基体的表面。Wherein, the heating element is a heating layer, and the heating layer is arranged on the surface of the infrared layer away from the substrate.
其中,其中,发热元件设置于基体的表面且与红外层间隔设置。Wherein, wherein, the heating element is arranged on the surface of the substrate and arranged at intervals from the infrared layer.
其中,发热元件为发热层,发热层设置于基体的表面且位于基体与红外层之间。Wherein, the heating element is a heating layer, and the heating layer is arranged on the surface of the base body and between the base body and the infrared layer.
第二方面,本申请提供一种加热组件。该加热组件包括基体、红外层、发热元件以及测温层;其中,基体用于收容气溶胶产生基质;红外层设置于基体的表面,用于在加热时辐射红外线,以加热并雾化气溶胶产生基质;发热元件设置于基体上,用于在通电时加热红外层;测温层设置于基体和/或红外层的表面,且与发热元件间隔设置;其中,测温层具有电阻温度系数(TCR)特性。In a second aspect, the present application provides a heating assembly. The heating assembly includes a substrate, an infrared layer, a heating element, and a temperature measuring layer; wherein, the substrate is used to contain the aerosol generating substrate; the infrared layer is arranged on the surface of the substrate, and is used to radiate infrared rays during heating to heat and atomize the aerosol Generate a substrate; the heating element is arranged on the substrate for heating the infrared layer when energized; the temperature measuring layer is arranged on the surface of the substrate and/or the infrared layer, and is spaced from the heating element; wherein, the temperature measuring layer has a temperature coefficient of resistance ( TCR) characteristics.
其中,测温层设置于基体的表面,且测温层与红外层位于基体的同一表面并相互间隔设置。Wherein, the temperature measuring layer is arranged on the surface of the substrate, and the temperature measuring layer and the infrared layer are located on the same surface of the substrate and arranged at intervals from each other.
其中,测温层设置于红外层背离基体的一侧表面,且测温层与发热元件间隔设置。Wherein, the temperature measuring layer is arranged on the surface of the infrared layer away from the substrate, and the temperature measuring layer is arranged at intervals from the heating element.
其中,测温层围绕基体的周向方向一圈设置。Wherein, the temperature measuring layer is arranged around the circumferential direction of the base body.
其中,测温层位于基体的端部。Wherein, the temperature measuring layer is located at the end of the substrate.
其中,基体为中空柱状体,红外层设置于中空柱状体的外表面,发热元件为设置于红外层背离基体的一侧表面的发热层。Wherein, the substrate is a hollow columnar body, the infrared layer is arranged on the outer surface of the hollow columnar body, and the heating element is a heating layer arranged on the surface of the infrared layer away from the substrate.
其中,基体为中空柱状体,红外层设置于中空柱状体的基体的内表面,发热元件为设置于红外层背离基体的一侧表面的发热层。Wherein, the base body is a hollow columnar body, the infrared layer is arranged on the inner surface of the base body of the hollow columnar body, and the heating element is a heating layer arranged on the surface of the infrared layer away from the base body.
其中,发热层位于基体的中部且沿基体的周向方向呈波浪型分布。Wherein, the heating layer is located in the middle of the base body and is distributed in a wave shape along the circumferential direction of the base body.
其中,基体为石英。Wherein, the substrate is quartz.
其中,红外层、发热元件及测温层均通过丝印或涂覆方式设置在基体的外表面,且测温层的面积小于红外层的面积。Wherein, the infrared layer, the heating element and the temperature measuring layer are all arranged on the outer surface of the substrate by silk screen printing or coating, and the area of the temperature measuring layer is smaller than that of the infrared layer.
第三方面,本申请提供一种气溶胶产生装置。该气溶胶产生装置包括:加热组件、电源组件以及控制器;其中,加热组件用于在通电时加热并雾化气溶胶产生基质;加热组件为如上述所涉及的加热组件;电源组件与加热组件连接,用于向加热组件供电;控制器用于控制电源组件向加热组件供电,并实时检测发热元件或测温层的电阻值以及根据电阻值监测加热组件的温度。In a third aspect, the present application provides an aerosol generating device. The aerosol generating device includes: a heating assembly, a power supply assembly and a controller; wherein, the heating assembly is used to heat and atomize the aerosol generating substrate when energized; the heating assembly is the heating assembly as mentioned above; the power supply assembly and the heating assembly The connection is used to supply power to the heating component; the controller is used to control the power supply component to supply power to the heating component, detect the resistance value of the heating element or the temperature measuring layer in real time, and monitor the temperature of the heating component according to the resistance value.
本申请提供的加热组件及气溶胶产生装置。该加热组件通过设置基体,以通过基体收容气溶胶产生基质。同时,通过在基体的表面设置红外层,以在红外层加热时辐射红外线,从而通过辐射的红外线加热并雾化气溶胶产生基质,进而提高加热效率,且加热均匀性较好。另外,通过在基体和/或红外层上设置发热元件,以在发热元件通电时加热红外层,使红外层辐射红外线。此外,通过使发热元件具有电阻温度系数(TCR)特性而可以作为温度传感器,从而使得该加热组件可通过检测发热元件的电阻值以监测加热组件的温度值,相比于现有技术,由于发热元件呈膜状,其可直接沉积于基体和/或红外层表面,无需在基体和/或红外层表面设置安装槽或利用螺钉或螺丝等固定件对其进行安装固定,从而使得该发热元件不仅便于设置,且占用的空间较小。此外,由于该发热元件可根据实际需求选择覆盖基体和/或红外层的某些特定位置以及选择覆盖较大范围面积的基体和/或红外层表面,从而能够对基体和/或红外层表面的特定的区域进行测温,测温精确度较高,并能够对基体和/或红外层的大部分区域进行测温,有效扩大了加热组件的测温范围。The heating assembly and the aerosol generating device provided by the application. The heating component is provided with a substrate, so as to receive the aerosol generating substrate through the substrate. At the same time, an infrared layer is arranged on the surface of the substrate to radiate infrared rays when the infrared layer is heated, so that the substrate is heated and atomized by the radiated infrared rays to generate the substrate, thereby improving the heating efficiency, and the heating uniformity is better. In addition, by disposing a heating element on the substrate and/or the infrared layer, the infrared layer is heated when the heating element is energized, so that the infrared layer radiates infrared rays. In addition, by making the heating element have a temperature coefficient of resistance (TCR) characteristic, it can be used as a temperature sensor, so that the heating assembly can monitor the temperature value of the heating assembly by detecting the resistance value of the heating element. Compared with the prior art, due to the heating The element is in the form of a film, which can be directly deposited on the surface of the substrate and/or the infrared layer, without installing grooves on the surface of the substrate and/or the infrared layer or fixing it with screws or screws, so that the heating element not only Easy to set up and takes up little space. In addition, since the heating element can be selected to cover some specific positions of the substrate and/or the infrared layer and to cover a larger area of the substrate and/or the surface of the infrared layer according to actual needs, it is possible to control the surface of the substrate and/or the infrared layer. The temperature measurement is performed in a specific area, and the temperature measurement accuracy is high, and the temperature measurement can be performed on most areas of the substrate and/or the infrared layer, effectively expanding the temperature measurement range of the heating component.
【附图说明】【Description of drawings】
图1为本申请第一实施例提供的加热组件的结构示意图;FIG. 1 is a schematic structural diagram of a heating assembly provided in the first embodiment of the present application;
图2为图1所对应的加热组件的结构简图;Fig. 2 is a schematic structural diagram of the heating assembly corresponding to Fig. 1;
图3为本申请第二实施例提供的加热组件的结构示意图;Fig. 3 is a schematic structural diagram of a heating assembly provided in a second embodiment of the present application;
图4为图3所示加热组件的A-A向剖视图;Fig. 4 is an A-A sectional view of the heating assembly shown in Fig. 3;
图5为本申请第三实施例提供的加热组件的结构示意图;Fig. 5 is a schematic structural diagram of a heating assembly provided in a third embodiment of the present application;
图6为图5所对应的加热组件的结构简图;Fig. 6 is a schematic structural diagram of the heating assembly corresponding to Fig. 5;
图7为本申请第四实施例提供的加热组件的结构示意图;FIG. 7 is a schematic structural diagram of a heating assembly provided in a fourth embodiment of the present application;
图8为图7所对应的加热组件的结构简图;Fig. 8 is a schematic structural diagram of the heating assembly corresponding to Fig. 7;
图9为本申请一实施例提供的气溶胶产生装置的结构示意图。Fig. 9 is a schematic structural diagram of an aerosol generating device provided by an embodiment of the present application.
【具体实施方式】【Detailed ways】
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅是本申请的一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.
本申请中的术语“第一”、“第二”、“第三”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”、“第三”的特征可以明示或者隐含地包括至少一个该特征。本申请的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。本申请实施例中所有方向性指示(诸如上、下、左、右、前、后……)仅用于解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等,如果该特定姿态发生改变时,则该方向性指示也相应地随之改变。此外,术语“包括”和“具有”以及它们任何变形,意图在于覆盖不排他的包含。例如包含了一系列步骤或单元的过程、方法、系统、产品或设备没有限定于已列出的步骤或单元,而是可选地还包括没有列出的步骤或单元,或可选地还包括对于这些过程、方法、产品或设备固有的其它步骤或单元。The terms "first", "second", and "third" in this application are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, features defined as "first", "second", and "third" may explicitly or implicitly include at least one of these features. In the description of the present application, "plurality" means at least two, such as two, three, etc., unless otherwise specifically defined. All directional indications (such as up, down, left, right, front, back...) in the embodiments of the present application are only used to explain the relative positional relationship between the various components in a certain posture (as shown in the drawings) , sports conditions, etc., if the specific posture changes, the directional indication also changes accordingly. Furthermore, the terms "include" and "have", as well as any variations thereof, are intended to cover a non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units is not limited to the listed steps or units, but optionally also includes unlisted steps or units, or optionally further includes For other steps or units inherent in these processes, methods, products or apparatuses.
在本文中提及“实施例”意味着,结合实施例描述的特定特征、结构或特性可以包含在本申请的至少一个实施例中。在说明书中的各个位置出现该短语并不一定均是指相同的实施例,也不是与其它实施例互斥的独立的或备选的实施例。本领域技术人员显式地和隐式地理解的是,本文所描述的实施例可以与其它实施例相结合。Reference herein to an "embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the present application. The occurrences of this phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. It is understood explicitly and implicitly by those skilled in the art that the embodiments described herein can be combined with other embodiments.
下面结合附图和实施例对本申请进行详细的说明。The application will be described in detail below in conjunction with the accompanying drawings and embodiments.
请参阅图1和图2,图1为本申请第一实施例提供的加热组件的结构示意图;图2为图1所对应的加热组件的结构简图;在本实施例中,提供一种加热组件10,该加热组件10具体用于在通电时加热并雾化气溶胶产生基质以形成气溶胶。该加热组件10可用于不同的领域,比如电子雾化等领域。该加热组件10包括基体11、红外层12以及发热元件13。其中,发热元件13用于在通电时发热。Please refer to Figure 1 and Figure 2, Figure 1 is a schematic structural diagram of the heating assembly provided in the first embodiment of the present application; Figure 2 is a schematic structural diagram of the heating assembly corresponding to Figure 1; in this embodiment, a heating The assembly 10, the heating assembly 10 is specifically used for heating and atomizing the aerosol-generating substrate when energized to form an aerosol. The heating assembly 10 can be used in different fields, such as electronic atomization and other fields. The heating assembly 10 includes a substrate 11 , an infrared layer 12 and a heating element 13 . Wherein, the heating element 13 is used to generate heat when energized.
其中,基体11可呈中空柱状,基体11的中空结构形成为收容腔111,收容腔111用于收容气溶胶产生基质。其中,气溶胶产生基质可为植物草叶类基质或膏状基质等。基体11采用绝缘材料制备,基体11可以是石英玻璃、陶瓷或云母等耐高温的绝缘材料,以防止两个电极短路。优选地,基体11可为透明石英。当然,基体11也可以采用导电材料制备,此时可在基体11表面涂覆绝缘层。在一具体实施例中,基体11为圆柱状陶瓷管。需要说明的是,以下实施例中所涉及的基体11的内表面均指收容腔111的内壁面,基体11的外表面均指收容腔111的外壁面。Wherein, the base body 11 may be in the shape of a hollow column, and the hollow structure of the base body 11 is formed into a receiving cavity 111, and the receiving cavity 111 is used for storing the aerosol-generating substrate. Wherein, the aerosol-generating substrate can be a plant-grass-like substrate or a paste-like substrate. The base body 11 is made of insulating material, and the base body 11 may be a high temperature resistant insulating material such as quartz glass, ceramics or mica, so as to prevent short circuit between two electrodes. Preferably, the substrate 11 can be transparent quartz. Of course, the substrate 11 can also be made of conductive materials, and in this case an insulating layer can be coated on the surface of the substrate 11 . In a specific embodiment, the base body 11 is a cylindrical ceramic tube. It should be noted that, the inner surface of the base body 11 referred to in the following embodiments refers to the inner wall surface of the receiving cavity 111 , and the outer surface of the base body 11 refers to the outer wall surface of the receiving cavity 111 .
红外层12设置于基体11的表面,用于在加热时辐射红外线,以加热并雾化气溶胶产生基质。具体的,红外层12可采用丝印、溅射、涂敷、印刷等方式形成于基体11的内表面或外表面。利用红外层12辐射的红外线对气溶胶产生基质进行加热,加热效率较高,且对气溶胶产生基质的烘烤更加均匀。在具体实施例中,该红外层12具体可为红外发热膜,例如红外陶瓷涂层。红外发热膜的厚度和面积不限,可以根据需要选择。The infrared layer 12 is disposed on the surface of the substrate 11 for radiating infrared rays when heated to heat and atomize the aerosol generating substrate. Specifically, the infrared layer 12 can be formed on the inner surface or the outer surface of the substrate 11 by means of silk screen printing, sputtering, coating, printing and the like. The infrared rays radiated from the infrared layer 12 are used to heat the aerosol-generating substrate, so that the heating efficiency is high, and the aerosol-generating substrate is baked more uniformly. In a specific embodiment, the infrared layer 12 may specifically be an infrared heating film, such as an infrared ceramic coating. The thickness and area of the infrared heating film are not limited, and can be selected according to needs.
其中,红外层12可以为金属层、导电陶瓷层或导电碳层。红外层12的形状可以为连续的膜状,多孔的网状或条状。其中,红外层12的材料、形状和大小可以根据需要进行设置。在具体实施例中,红外层12通电时辐射红外线,以加热收容腔111中的气溶胶产生基质。其中,红外加热波长2.5um~20um,针对加热气溶胶形成基质的特点,通常加热温度需要350℃以上,能量辐射极值主要在3~5um波段。Wherein, the infrared layer 12 can be a metal layer, a conductive ceramic layer or a conductive carbon layer. The shape of the infrared layer 12 can be continuous film, porous mesh or strip. Wherein, the material, shape and size of the infrared layer 12 can be set as required. In a specific embodiment, when the infrared layer 12 is electrified, it radiates infrared rays to heat the aerosol-generating substrate in the containing cavity 111 . Among them, the wavelength of infrared heating is 2.5um-20um. According to the characteristics of heating aerosol to form a matrix, the heating temperature usually needs to be above 350°C, and the energy radiation extreme value is mainly in the 3-5um band.
在一实施例中,参见图1,红外层12具体设置于基体11的外表面,且基体11的整个外表面均可形成有红外层12,以在实现均匀加热的同 时,避免发热元件13产生的热量经基体11导热后,热量损失,导致温度测量结果误差较大的问题发生;同时,避免红外层12被气溶胶产生基质划伤的问题发生。以下实施例均以此为例。当然,在其它实施例中,参见图3和图4,其中,图3为本申请第二实施例提供的加热组件的结构示意图;图4为图3所示加热组件的A-A向剖视图。红外层12也可形成于基体11的内表面,本申请对此并不加以限制。In one embodiment, referring to FIG. 1, the infrared layer 12 is specifically arranged on the outer surface of the substrate 11, and the entire outer surface of the substrate 11 can be formed with the infrared layer 12, so as to realize uniform heating while avoiding the generation of the heating element 13. After the heat is conducted through the substrate 11, the heat is lost, resulting in a large error in the temperature measurement result; at the same time, the problem of the infrared layer 12 being scratched by the aerosol-generated substrate is avoided. The following embodiments all take this as an example. Of course, in other embodiments, refer to FIG. 3 and FIG. 4 , wherein FIG. 3 is a schematic structural diagram of the heating assembly provided in the second embodiment of the present application; FIG. 4 is a cross-sectional view of the heating assembly shown in FIG. 3 along the direction A-A. The infrared layer 12 can also be formed on the inner surface of the substrate 11, which is not limited in the present application.
发热元件13设置于基体11和/或红外层12的表面,用于在通电时加热红外层12。可以理解的是,在该实施例中,红外层12本身不发热,其是通过发热元件13在通电发热后将热量传递至红外层12后,红外层12的自身温度发生变化。具体的,发热元件13也可采用丝印、溅射、涂敷、印刷等方式形成。其中,发热元件13具体可为发热膜;比如铜膜或铝膜等可以导电的膜。The heating element 13 is disposed on the surface of the substrate 11 and/or the infrared layer 12 for heating the infrared layer 12 when electrified. It can be understood that, in this embodiment, the infrared layer 12 itself does not generate heat, but the temperature of the infrared layer 12 itself changes after the heating element 13 transfers heat to the infrared layer 12 after being energized to generate heat. Specifically, the heating element 13 can also be formed by silk screen printing, sputtering, coating, printing and other methods. Wherein, the heating element 13 can specifically be a heating film; for example, a conductive film such as a copper film or an aluminum film.
进一步地,该发热元件13具有电阻温度系数(TCR)特性而可以作为温度传感器。即发热元件13的电阻值与其本身的温度值具有单调的一一对应关系。比如,发热元件13的电阻值随其温度值的升高而升高;或,发热元件13的电阻值随其温度值的升高而降低。这样使得该加热组件10可通过检测发热元件13的电阻值以监测加热组件10的温度值,进而调控加热组件10的温度场,以达到抽吸口感的最佳效果。相比于现有技术中需要另设测温传感器等测温元件的方案,由于发热元件13呈膜状,其可直接沉积于基体11和/或红外层12表面,无需在基体11和/或红外层12表面设置安装槽或利用螺钉或螺丝等固定件对其进行安装固定,从而使得该发热元件13不仅便于设置,且占用的空间较小。此外,由于该发热元件13可根据实际需求选择覆盖基体11和/或红外层12的某些特定位置以及选择覆盖较大范围面积的基体11和/或红外层12表面,从而能够对基体11和/或红外层12表面的特定的区域进行测温,测温精确度较高,并能够对基体11和/或红外层12的大部分区域进行测温,有效扩大了加热组件10的测温范围。Further, the heating element 13 has a temperature coefficient of resistance (TCR) characteristic and can be used as a temperature sensor. That is, the resistance value of the heating element 13 has a monotonous one-to-one correspondence with its own temperature value. For example, the resistance value of the heating element 13 increases as its temperature increases; or, the resistance value of the heating element 13 decreases as its temperature increases. In this way, the heating component 10 can monitor the temperature value of the heating component 10 by detecting the resistance value of the heating element 13 , and then adjust the temperature field of the heating component 10 to achieve the best effect of puffing taste. Compared with the scheme in the prior art that requires additional temperature measuring elements such as temperature measuring sensors, since the heating element 13 is in the form of a film, it can be directly deposited on the surface of the substrate 11 and/or the infrared layer 12, without the need for a layer on the substrate 11 and/or Mounting grooves are provided on the surface of the infrared layer 12 or fixed with screws or screws, so that the heating element 13 is not only easy to install, but also takes up less space. In addition, since the heating element 13 can be selected to cover some specific positions of the substrate 11 and/or the infrared layer 12 and to cover a larger area of the substrate 11 and/or the surface of the infrared layer 12 according to actual needs, the substrate 11 and the infrared layer 12 can be controlled. /or a specific area on the surface of the infrared layer 12 is used for temperature measurement, the temperature measurement accuracy is high, and the temperature can be measured for most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the temperature measurement range of the heating component 10 .
在具体实施例中,发热元件13可至少覆盖加热组件10的最高温度区域,以避免局部温度过高而影响气溶胶产生基质的加热口感的问题发 生。可以理解的是,在具体实施例中,若加热组件10的最高温度区域对应于基体11的某一区域,则发热元件13至少覆盖基体11的该位置;若加热组件10的最高温度区域对应于红外层12的某一位置,则发热元件13至少覆盖红外层12的该位置。In a specific embodiment, the heating element 13 can at least cover the highest temperature region of the heating component 10, so as to avoid the problem that the local temperature is too high and affects the heating taste of the aerosol generating substrate. It can be understood that, in a specific embodiment, if the highest temperature region of the heating component 10 corresponds to a certain region of the substrate 11, the heating element 13 at least covers this position of the substrate 11; if the highest temperature region of the heating component 10 corresponds to A certain position of the infrared layer 12 , the heating element 13 at least covers this position of the infrared layer 12 .
如图1所示,发热元件13可沿基体11的周向方向一圈设置。在该实施例中,可在发热元件13的两个预设位置设置两个电极,两个电极分别用于连接正极引线和负极引线,以对该发热元件13的电阻值进行检测。当然,在其它实施例中,该发热元件13也可沿基体11的周向方向呈具有缺口的弧形状,发热元件13的缺口所在的两端可形成为两个电极,以与正极引线和负极引线连接,本申请对此并不加以限制。As shown in FIG. 1 , the heating element 13 can be arranged in a circle along the circumferential direction of the base body 11 . In this embodiment, two electrodes can be set at two preset positions of the heating element 13 , and the two electrodes are respectively used to connect the positive lead and the negative lead to detect the resistance value of the heating element 13 . Of course, in other embodiments, the heating element 13 can also be in the shape of an arc with a notch along the circumferential direction of the base body 11, and the two ends where the notch of the heating element 13 is located can be formed as two electrodes to connect with the positive electrode lead and the negative electrode. The lead connection is not limited in this application.
具体的,发热元件13可沿基体11的周向方向呈波浪形分布,以尽可能地覆盖加热组件10的不同区域,进而感测加热组件10的不同位置的温度,以对加热组件10的不同区域的温度进行监测。例如,当基体11为管状时,发热元件13设置于基体11的中部并沿着基体11长度方向波动,从而覆盖基体11长度方向的不同区域。当然,在其它实施例中,发热元件13也可沿基体11的周向方向呈直线型、弯折型、点状等方式分布;本申请对此并不加以限制,发热元件13的具体分布位置可根据实际需求进行选择,只要能够实时检测加热组件10的温度值即可。Specifically, the heating element 13 can be distributed in a wave shape along the circumferential direction of the base body 11, so as to cover different regions of the heating component 10 as much as possible, and then sense the temperature of different positions of the heating component 10, so as to control the different regions of the heating component 10. The temperature of the area is monitored. For example, when the base body 11 is tubular, the heating element 13 is disposed in the middle of the base body 11 and undulates along the length direction of the base body 11 , thereby covering different regions along the length direction of the base body 11 . Of course, in other embodiments, the heating elements 13 can also be distributed in a linear, bent, point-like manner along the circumferential direction of the base body 11; this application does not limit this, and the specific distribution positions of the heating elements 13 It can be selected according to actual needs, as long as the temperature value of the heating component 10 can be detected in real time.
在具体实施例中,红外层12和发热元件13可以设置于基体11的同一个表面,也可设置于基体11的不同表面,例如一个设置于基体11的内表面,另一个设置于基体11的外表面。发热元件13可以仅设置于红外层12的表面,也可以仅设置于基体11的表面,还可以同时设置于红外层12和基体11的表面,例如,一部分设置于红外层12的表面,另一部分设置于基体11的表面。测温层13可以设置于红外层12背离基体11的一侧表面,也可以设置于红外层12靠近基体11的一侧表面。In a specific embodiment, the infrared layer 12 and the heating element 13 can be arranged on the same surface of the substrate 11, or on different surfaces of the substrate 11, for example, one is arranged on the inner surface of the substrate 11, and the other is arranged on the inner surface of the substrate 11. The outer surface. Heating element 13 can only be arranged on the surface of infrared layer 12, also can only be arranged on the surface of substrate 11, can also be arranged on the surface of infrared layer 12 and substrate 11 simultaneously, for example, a part is arranged on the surface of infrared layer 12, another part set on the surface of the substrate 11. The temperature measuring layer 13 can be arranged on the surface of the infrared layer 12 facing away from the substrate 11 , or on the surface of the infrared layer 12 close to the substrate 11 .
在一实施例中,参见图1和图4,发热元件13仅设置于红外层12远离基体11的一侧表面。其中,红外层12可覆盖于基体11的整个表面,且在红外层12设置于基体11的外表面时,加热组件10的具体结构如图1所示;在红外层12设置于基体11的内表面时,加热组件10的具 体结构如图3和图4所示。在该实施例中,发热元件13通电后产生,发热元件13自身温度不断升高,其电阻值随自身温度的变化而变化,从而通过检测发热元件13自身的电阻值检测该加热组件10的温度值,进而调控加热组件10的温度场,以达到抽吸口感的最佳效果。In one embodiment, referring to FIG. 1 and FIG. 4 , the heating element 13 is only disposed on the surface of the infrared layer 12 away from the base 11 . Wherein, the infrared layer 12 can cover the entire surface of the base body 11, and when the infrared layer 12 is arranged on the outer surface of the base body 11, the specific structure of the heating assembly 10 is as shown in Figure 1; On the surface, the specific structure of the heating assembly 10 is shown in Fig. 3 and Fig. 4 . In this embodiment, after the heating element 13 is energized, the temperature of the heating element 13 increases continuously, and its resistance value changes with the change of its own temperature, thereby detecting the temperature of the heating assembly 10 by detecting the resistance value of the heating element 13 itself. value, and then adjust the temperature field of the heating component 10 to achieve the best effect of the taste of the puff.
在该实施例中,由于被动红外层12本身具有导热功能,红外层12与发热元件13没有重叠的部位可以通过导热;因此,可使发热元件13的面积接近或小于红外层12的面积。In this embodiment, since the passive infrared layer 12 itself has a heat conduction function, the parts where the infrared layer 12 and the heating element 13 do not overlap can conduct heat; therefore, the area of the heating element 13 can be made close to or smaller than the area of the infrared layer 12.
具体的,在该实施例中,发热元件13具体可位于基体11沿其轴向方向的中部位置,并环绕基体11的外表面一圈呈波浪型分布。Specifically, in this embodiment, the heating element 13 may be located in the middle of the base body 11 along its axial direction, and distributed around the outer surface of the base body 11 in a wave shape.
在另一实施例中,发热元件13仅设置于基体11的表面并与红外层12处于同一平面,以在发热元件13通电发热后,将热量传递至基体11,然后通过基体11传递至红外层12,以使红外层12加热辐射红外线。在该实施例中,发热元件13可与红外层12间隔设置;或,发热元件13位于基体11和红外层12之间,本申请对此并不加以限制。In another embodiment, the heating element 13 is only arranged on the surface of the substrate 11 and is on the same plane as the infrared layer 12, so that after the heating element 13 is energized and generates heat, the heat is transferred to the substrate 11, and then transferred to the infrared layer through the substrate 11 12, so that the infrared layer 12 heats and radiates infrared rays. In this embodiment, the heating element 13 can be spaced apart from the infrared layer 12; or, the heating element 13 is located between the substrate 11 and the infrared layer 12, which is not limited in the present application.
当然,在其它实施例中,发热元件13和红外层12均设置于基体11上,且位于基体11的不同表面。比如,发热元件13设置于基体11的内表面,红外层12设置于基体11的外表面,发热元件13通电后发热后的温度传导至基体11,基体11的温度进一步传导至红外层12,从而使得红外层12加热辐射红外线。或者,发热元件13设置于基体11的外表面,红外层12设置于基体11的内表面。Of course, in other embodiments, both the heating element 13 and the infrared layer 12 are disposed on the base 11 and located on different surfaces of the base 11 . For example, the heating element 13 is arranged on the inner surface of the base body 11, and the infrared layer 12 is arranged on the outer surface of the base body 11. After the heating element 13 is energized, the temperature after heating is conducted to the base body 11, and the temperature of the base body 11 is further conducted to the infrared layer 12, thereby The infrared layer 12 is heated to radiate infrared rays. Alternatively, the heating element 13 is disposed on the outer surface of the base 11 , and the infrared layer 12 is disposed on the inner surface of the base 11 .
本实施例提供的加热组件10,通过设置基体11,以通过基体11收容气溶胶产生基质。同时,通过在基体11的表面设置红外层12,以在红外层12加热时辐射红外线,从而通过辐射的红外线加热并雾化气溶胶产生基质,进而提高加热效率,且加热均匀性较好。另外,通过在基体11和/或红外层12上设置发热元件13,以在发热元件13通电时加热红外层12,使红外层12辐射红外线。此外,通过使发热元件13具有电阻温度系数(TCR)特性,从而使得该加热组件10可通过检测发热元件13的电阻值以监测加热组件10的温度值,相比于现有技术,该发热元件13不仅便于设置,且占用的空间较小。此外,由于该发热元件13可 根据实际需求选择覆盖基体11和/或红外层12的某些特定位置以及选择覆盖较大范围面积的基体11和/或红外层12表面,从而能够对基体11和/或红外层12表面的特定的区域进行测温,测温精确度较高,并能够对基体11和/或红外层12的大部分区域进行测温,有效扩大了加热组件10的测温范围。In the heating assembly 10 provided in this embodiment, a base body 11 is provided so as to accommodate the aerosol-generating substrate through the base body 11 . At the same time, by setting the infrared layer 12 on the surface of the substrate 11 to radiate infrared rays when the infrared layer 12 is heated, the radiated infrared rays heat and atomize the aerosol to generate the substrate, thereby improving the heating efficiency, and the heating uniformity is better. In addition, by disposing the heating element 13 on the substrate 11 and/or the infrared layer 12, the infrared layer 12 is heated when the heating element 13 is energized, so that the infrared layer 12 radiates infrared rays. In addition, by making the heating element 13 have a temperature coefficient of resistance (TCR) characteristic, so that the heating assembly 10 can monitor the temperature value of the heating assembly 10 by detecting the resistance value of the heating element 13, compared with the prior art, the heating element 13 Not only is it easy to set up, but it also takes up less space. In addition, since the heating element 13 can be selected to cover some specific positions of the substrate 11 and/or the infrared layer 12 and to cover a larger area of the substrate 11 and/or the surface of the infrared layer 12 according to actual needs, the substrate 11 and the infrared layer 12 can be controlled. /or a specific area on the surface of the infrared layer 12 is used for temperature measurement, the temperature measurement accuracy is high, and the temperature can be measured for most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the temperature measurement range of the heating component 10 .
请参阅图5和图6,其中,图5为本申请第三实施例提供的加热组件的结构示意图;图6为图5所对应的加热组件的结构简图。在本实施例中,提供另一种加热组件10,该加热组件10与上述第一实施例提供的加热组件10不同的是:该加热组件10还包括测温层14。该测温层14具有电阻温度系数(TCR)特性。即测温层14的电阻值与其本身的温度值具有单调的一一对应关系。比如,测温层14的电阻值随其温度值的升高而升高;或,测温层14的电阻值随其温度值的升高而降低。在该实施例中,加热组件10具体可通过检测测温层14的电阻值以监测加热组件10的温度值,进而调控加热组件10的温度场,以达到抽吸口感的最佳效果。相比于现有技术中需要另设测温传感器等测温元件的方案,由于测温层14呈膜状,其可直接沉积于基体11和/或红外层12表面,无需在基体11和/或红外层12表面设置安装槽或利用螺钉或螺丝等固定件对其进行安装固定,从而使得该测温层14不仅便于设置,且占用的空间较小。Please refer to FIG. 5 and FIG. 6 , wherein FIG. 5 is a schematic structural diagram of a heating assembly provided in the third embodiment of the present application; FIG. 6 is a schematic structural diagram of the heating assembly corresponding to FIG. 5 . In this embodiment, another heating assembly 10 is provided. The difference between the heating assembly 10 and the heating assembly 10 provided in the above-mentioned first embodiment is that the heating assembly 10 further includes a temperature measuring layer 14 . The temperature measuring layer 14 has a temperature coefficient of resistance (TCR) characteristic. That is, the resistance value of the temperature measuring layer 14 has a monotonous one-to-one correspondence with its own temperature value. For example, the resistance value of the temperature measuring layer 14 increases as its temperature increases; or, the resistance value of the temperature measuring layer 14 decreases as its temperature increases. In this embodiment, the heating component 10 can monitor the temperature value of the heating component 10 by detecting the resistance value of the temperature measuring layer 14 , and then adjust the temperature field of the heating component 10 to achieve the best effect of puffing taste. Compared with the scheme in the prior art that requires additional temperature-measuring elements such as temperature-measuring sensors, since the temperature-measuring layer 14 is in the form of a film, it can be directly deposited on the surface of the substrate 11 and/or the infrared layer 12 without the need Or the surface of the infrared layer 12 is provided with mounting grooves or fixed with screws or screws, so that the temperature measuring layer 14 is not only easy to install, but also takes up less space.
当然,在具体实施例中,也可同时检测发热元件13的电阻值来监测加热组件10的温度值,以提高温度值的监测结果的精确度。当然,在该实施例中,发热元件13也可不具有电阻温度系数(TCR)特性,本实施例对此并不加以限制。Of course, in a specific embodiment, the resistance value of the heating element 13 can also be detected simultaneously to monitor the temperature value of the heating assembly 10, so as to improve the accuracy of the temperature monitoring result. Of course, in this embodiment, the heating element 13 may not have a temperature coefficient of resistance (TCR) characteristic, which is not limited in this embodiment.
其中,该测温层14可采用丝印、溅射、涂敷、印刷等方式形成于基体11和/或红外层12的表面,且与发热元件13间隔设置。其中,由于该测温层14可根据实际需求选择覆盖基体11和/或红外层12的某些特定位置以及选择覆盖较大范围面积的基体11和/或红外层12表面,从而能够对基体11和/或红外层12表面的特定的区域进行测温,测温精确度较高,并能够对基体11和/或红外层12的大部分区域进行测温,有效 扩大了加热组件10的测温范围。Wherein, the temperature measuring layer 14 can be formed on the surface of the substrate 11 and/or the infrared layer 12 by means of screen printing, sputtering, coating, printing, etc., and is spaced apart from the heating element 13 . Wherein, because the temperature measuring layer 14 can select some specific positions covering the substrate 11 and/or the infrared layer 12 and select to cover the surface of the substrate 11 and/or the infrared layer 12 in a larger area according to actual needs, thereby being able to control the substrate 11 and/or a specific area on the surface of the infrared layer 12, the temperature measurement accuracy is high, and it is possible to measure the temperature of most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the temperature measurement of the heating element 10 scope.
具体的,测温层14可至少覆盖加热组件10的最高温度区域,以避免局部温度过高而影响气溶胶产生基质的加热口感的问题发生。可以理解的是,在具体实施例中,若加热组件10的最高温度区域对应于基体11的某一区域,则测温层14至少覆盖基体11的该位置;若加热组件10的最高温度区域对应于红外层12的某一位置,则测温层14至少覆盖红外层12的该位置。Specifically, the temperature measuring layer 14 may at least cover the highest temperature region of the heating component 10, so as to avoid the problem that the local temperature is too high and affects the heating taste of the aerosol generating substrate. It can be understood that, in a specific embodiment, if the highest temperature region of the heating component 10 corresponds to a certain region of the substrate 11, the temperature measuring layer 14 covers at least this position of the substrate 11; if the highest temperature region of the heating component 10 corresponds to At a certain position of the infrared layer 12 , the temperature measuring layer 14 at least covers the position of the infrared layer 12 .
在其中一个实施例中,测温层14的方阻为1Ω/□~5Ω/□,测温层14的电阻温度系数为300ppm/℃~3500ppm/℃。进一步地,测温层14的方阻为2Ω/□~4Ω/□,测温层14的电阻温度系数为700ppm/℃~2000ppm/℃。In one embodiment, the square resistance of the temperature measuring layer 14 is 1Ω/□˜5Ω/□, and the temperature coefficient of resistance of the temperature measuring layer 14 is 300ppm/°C˜3500ppm/°C. Further, the square resistance of the temperature measuring layer 14 is 2Ω/□˜4Ω/□, and the temperature coefficient of resistance of the temperature measuring layer 14 is 700ppm/°C˜2000ppm/°C.
其中,由于测温层14的电阻较大,且测温层14只实现测温功能,因此,在具体实施例中,测温层14的面积可小于红外层12的面积,这样不仅可以降低能耗,并且不影响红外层12的发热效果;同时,红外层12的整体温场可以达到一致。具体的,测温层14的面积与红外层12的面积比例范围可为1:5至1:10。Wherein, because the resistance of the temperature measuring layer 14 is relatively large, and the temperature measuring layer 14 only realizes the temperature measuring function, therefore, in a specific embodiment, the area of the temperature measuring layer 14 can be smaller than the area of the infrared layer 12, which can not only reduce energy consumption, and does not affect the heating effect of the infrared layer 12; at the same time, the overall temperature field of the infrared layer 12 can be consistent. Specifically, the ratio of the area of the temperature measuring layer 14 to the area of the infrared layer 12 may range from 1:5 to 1:10.
具体地,制备测温层14的电阻浆料包括有机载体、无机粘结剂和导电剂,以质量份数计,有机载体的份数为10份~20份,无机粘结剂的份数为30份~45份,导电剂的份数为30份~50份,无机粘结剂包括玻璃粉,导电剂选自银和钯中的至少一种。Specifically, the resistance paste for preparing the temperature measuring layer 14 includes an organic vehicle, an inorganic binder and a conductive agent. In terms of parts by mass, the number of parts of the organic vehicle is 10 to 20 parts, and the number of parts of the inorganic binder is 30-45 parts, the number of conductive agent is 30-50 parts, the inorganic binder includes glass powder, and the conductive agent is at least one selected from silver and palladium.
在其中一个实施例中,有机载体选自松油醇、乙基纤维素、丁基卡必醇、聚乙烯醇缩丁醛、柠檬酸三丁酯和聚酰胺蜡中的至少一种。In one embodiment, the organic carrier is at least one selected from terpineol, ethyl cellulose, butyl carbitol, polyvinyl butyral, tributyl citrate and polyamide wax.
在其中一个实施例中,无机粘结剂包括熔点为700℃~780℃的玻璃粉。In one embodiment, the inorganic binder includes glass frit with a melting point of 700°C-780°C.
如图5所示,测温层14可沿基体11的周向方向一圈设置。在该实施例中,可在测温层14的两个预设位置设置两个电极,两个电极分别用于连接正极引线和负极引线,以对该测温层14的电阻值进行检测。当然,在其它实施例中,该测温层14也可沿基体11的周向方向呈具有缺口的弧形状,测温层14的缺口所在的两端可形成为两个电极,以与 正极引线和负极引线连接,本申请对此并不加以限制。As shown in FIG. 5 , the temperature measuring layer 14 may be arranged in a circle along the circumferential direction of the base body 11 . In this embodiment, two electrodes can be set at two preset positions of the temperature measuring layer 14 , and the two electrodes are respectively used to connect the positive electrode lead and the negative electrode lead to detect the resistance value of the temperature measuring layer 14 . Of course, in other embodiments, the temperature-measuring layer 14 can also be in the shape of an arc with a gap along the circumferential direction of the substrate 11, and the two ends where the gap of the temperature-measuring layer 14 is located can be formed as two electrodes to connect with the positive electrode lead. It is connected to the negative electrode lead, which is not limited in this application.
具体的,测温层14可沿基体11的周向方向呈直线型分布,以对加热组件10的特定区域的温度进行检测。当然,在其它实施例中,测温层14也可沿基体11的周向方向呈直线型、连接的“Z”型、U形、弯折型、点状等方式分布。Specifically, the temperature measuring layer 14 may be distributed linearly along the circumferential direction of the substrate 11 to detect the temperature of a specific area of the heating assembly 10 . Of course, in other embodiments, the temperature measuring layer 14 may also be distributed in a linear, connected “Z” shape, U shape, bent shape, point shape, etc. along the circumferential direction of the base body 11 .
具体的,测温层14与发热元件13的材质可相同。其中,测温层14的功率大于发热元件13的功率。Specifically, the material of the temperature measuring layer 14 and the heating element 13 may be the same. Wherein, the power of the temperature measuring layer 14 is greater than the power of the heating element 13 .
在具体实施例中,测温层14和红外层12可以设置于基体11的同一个表面,也可以设置于基体11的不同表面,例如一个设置于基体11的内表面,另一个设置于基体11的外表面。测温层14可以仅设置于红外层12的表面,也可以仅设置于基体11的表面,还可以同时设置于红外层12和基体11的表面,例如,一部分设置于红外层12的表面,另一部分设置于基体11的表面。测温层14可以设置于红外层12背离基体11的一侧表面,也可以设置于红外层12靠近基体11的一侧表面。In a specific embodiment, the temperature measuring layer 14 and the infrared layer 12 can be arranged on the same surface of the substrate 11, or on different surfaces of the substrate 11, for example, one is arranged on the inner surface of the substrate 11, and the other is arranged on the substrate 11. of the outer surface. The temperature measuring layer 14 can only be arranged on the surface of the infrared layer 12, also can only be arranged on the surface of the substrate 11, can also be arranged on the surface of the infrared layer 12 and the substrate 11 at the same time, for example, a part is arranged on the surface of the infrared layer 12, and another A part is provided on the surface of the substrate 11 . The temperature measuring layer 14 can be arranged on the surface of the infrared layer 12 facing away from the substrate 11 , or on the surface of the infrared layer 12 close to the substrate 11 .
在第一个具体实施例中,如图5和图6所示,红外层12设置于基体11的外表面,测温层14仅设置于红外层12背离基体11的一侧表面。在发热元件13通电后,发热元件13的温度升高,发热元件13产生的热量传递至红外层12,然后通过红外层12传递至测温层14,以使测温层14的温度随红外层12的温度的升高而升高,测温层14的电阻值随其温度的变化而发生变化,进而通过检测测温层14的电阻值实时监测该加热组件10的温度值。In the first specific embodiment, as shown in FIG. 5 and FIG. 6 , the infrared layer 12 is arranged on the outer surface of the substrate 11 , and the temperature measuring layer 14 is only arranged on the surface of the infrared layer 12 facing away from the substrate 11 . After the heating element 13 is energized, the temperature of the heating element 13 increases, and the heat generated by the heating element 13 is transferred to the infrared layer 12, and then passed to the temperature measuring layer 14 through the infrared layer 12, so that the temperature of the temperature measuring layer 14 increases with the temperature of the infrared layer. The temperature of the heating element 12 rises, and the resistance value of the temperature measuring layer 14 changes with the temperature change, and then the temperature value of the heating component 10 is monitored in real time by detecting the resistance value of the temperature measuring layer 14 .
如图5所示,基体11为中空圆柱状,红外层12覆盖于基体11的整个外表面,这样能够避免发热元件13的温度经基体11导热后,热量损失,导致温度测量结果误差较大的问题发生;同时,避免发热层12被气溶胶产生基质划伤的问题发生。在该实施例中,发热元件13具体可位于基体11沿其轴向方向的中部位置,并呈波浪形环绕基体11的外表面一圈设置,以提高加热均匀性;测温层14设置于红外层12的靠近端部的位置,以对该加热组件10的特定区域的温度进行检测。当然,在其它实施例中,红外层12也可设置于基体11的内表面,本申请对此并 不加以限制。As shown in Figure 5, the base body 11 is a hollow cylinder, and the infrared layer 12 covers the entire outer surface of the base body 11, which can avoid heat loss after the temperature of the heating element 13 conducts heat through the base body 11, resulting in large errors in temperature measurement results. Problems occur; at the same time, avoid the problem that the heating layer 12 is scratched by the aerosol-generating substrate. In this embodiment, the heating element 13 can be specifically located in the middle of the base 11 along its axial direction, and is arranged around the outer surface of the base 11 in a wave shape to improve heating uniformity; the temperature measuring layer 14 is arranged on the infrared The position near the end of the layer 12 is used to detect the temperature of a specific area of the heating element 10 . Certainly, in other embodiments, the infrared layer 12 may also be disposed on the inner surface of the substrate 11, which is not limited in the present application.
在第二个具体实施例中,参见图7和图8,图7为本申请第四实施例提供的加热组件的结构示意图;图8为图7所对应的加热组件的结构简图。测温层14设置于基体11的表面,并与红外层12位于基体11的同一表面且间隔设置。在该具体实施例中,发热元件13通电后发热,发热元件13的温度传导至红外层12,然后通过红外层12传递至基体11的表面,设置于基体11表面的测温层14的温度随基体11的温度的变化而变化,测温层14的电阻值随其温度的变化而发生改变,从而通过检测测温层14的电阻值实时监测该加热组件10的温度值。In the second specific embodiment, see FIG. 7 and FIG. 8 , FIG. 7 is a schematic structural diagram of a heating assembly provided in the fourth embodiment of the present application; FIG. 8 is a schematic structural diagram of the heating assembly corresponding to FIG. 7 . The temperature measuring layer 14 is disposed on the surface of the substrate 11 , and is located on the same surface of the substrate 11 as the infrared layer 12 and is spaced apart. In this specific embodiment, the heating element 13 generates heat after being energized, and the temperature of the heating element 13 is conducted to the infrared layer 12, and then transferred to the surface of the substrate 11 through the infrared layer 12, and the temperature of the temperature measuring layer 14 arranged on the surface of the substrate 11 varies with the temperature of the substrate 11. The temperature of the substrate 11 changes, and the resistance value of the temperature-measuring layer 14 changes with the change of temperature, so that the temperature value of the heating component 10 can be monitored in real time by detecting the resistance value of the temperature-measuring layer 14 .
在该实施例中,测温层14的位置具体根据实际需求选择设置在基体11的任一位置或覆盖基体11的任一位置。比如,若要监测基体11的第一端部的温度,则可将测温层14设置于第一端部。若要监测基体11的中部的温度,则可将测温层14设置于基体11的中部位置,如图1所示。若要同时监测基体11的第一端部和第二端部的温度,则可设置多个测温层14,使一个测温层14覆盖第一端部,另一个测温层14覆盖第二端部,以对基体11的相应位置的温度进行监测。优选地,在一具体实施例中,红外层12可设置于基体11的外表面的第一端部,测温层14可设置于基体11的第二端部,且与红外层12间隔设置,以通过检测测温层14的电阻值检测基体11的第二端部的温度值。In this embodiment, the position of the temperature measuring layer 14 is selected to be arranged at any position of the base 11 or any position of the covering base 11 according to actual requirements. For example, if the temperature of the first end of the substrate 11 is to be monitored, the temperature measuring layer 14 may be disposed at the first end. If the temperature in the middle of the substrate 11 is to be monitored, the temperature measuring layer 14 can be arranged in the middle of the substrate 11 , as shown in FIG. 1 . If you want to monitor the temperature of the first end portion and the second end portion of the substrate 11 simultaneously, then a plurality of temperature measuring layers 14 can be set, so that one temperature measuring layer 14 covers the first end portion, and another temperature measuring layer 14 covers the second end portion. end, so as to monitor the temperature of the corresponding position of the substrate 11. Preferably, in a specific embodiment, the infrared layer 12 can be arranged on the first end of the outer surface of the substrate 11, and the temperature measuring layer 14 can be arranged on the second end of the substrate 11, and is spaced apart from the infrared layer 12, The temperature value of the second end of the substrate 11 is detected by detecting the resistance value of the temperature measuring layer 14 .
参见图7,基体11为中空圆柱状,红外层12设置于基体11的外表面且仅使基体11的一端暴露。测温层14设置于基体11的外表面暴露的区域,并与红外层12间隔设置,且测温层14沿基体11的周向方向环绕设置。其中,测温层14可沿基体11的周向方向一圈设置,即测温层14呈闭环状;当然,测温层14也可以沿基体11的周向方向呈开环状设置,即,测温层14所对应的弧度小于360度。Referring to FIG. 7 , the base 11 is a hollow cylinder, and the infrared layer 12 is disposed on the outer surface of the base 11 and only exposes one end of the base 11 . The temperature measuring layer 14 is disposed on the exposed area of the outer surface of the base body 11 , spaced apart from the infrared layer 12 , and the temperature measuring layer 14 is disposed around the base body 11 in a circumferential direction. Wherein, the temperature measuring layer 14 can be arranged in a circle along the circumferential direction of the base body 11, that is, the temperature measuring layer 14 is in a closed ring shape; of course, the temperature measuring layer 14 can also be arranged in an open ring shape along the circumferential direction of the base body 11, that is, The arc corresponding to the temperature measuring layer 14 is less than 360 degrees.
在第三个具体实施例中,测温层14设置于基体11的表面,且测温层14具体位于基体11与红外层12之间。可以理解的是,在该实施例中,测温层14和红外层12位于基体11的同一表面。In the third specific embodiment, the temperature measuring layer 14 is disposed on the surface of the substrate 11 , and the temperature measuring layer 14 is specifically located between the substrate 11 and the infrared layer 12 . It can be understood that, in this embodiment, the temperature measuring layer 14 and the infrared layer 12 are located on the same surface of the substrate 11 .
在第四个具体实施例中,测温层14位于基体11的表面,且测温层 14与红外层12和发热元件13设置于基体11的不同的表面。比如,红外层12和发热元件13设置于基体11的内表面,测温层14设置于基体11的外表面。发热元件13通电发热后的温度依次传导至红外层12和基体11,基体11的温度进一步传导至测温层14,从而使得测温层14的电阻随其温度的变化而发生改变。或者,红外层12和发热元件13设置于基体11的外表面,测温层14设置于基体11的内表面。In the fourth specific embodiment, the temperature measuring layer 14 is located on the surface of the substrate 11, and the temperature measuring layer 14, the infrared layer 12 and the heating element 13 are arranged on different surfaces of the substrate 11. For example, the infrared layer 12 and the heating element 13 are disposed on the inner surface of the substrate 11 , and the temperature measuring layer 14 is disposed on the outer surface of the substrate 11 . The temperature of the heating element 13 is transmitted to the infrared layer 12 and the substrate 11 sequentially after being energized and heated, and the temperature of the substrate 11 is further conducted to the temperature measuring layer 14, so that the resistance of the temperature measuring layer 14 changes with its temperature. Alternatively, the infrared layer 12 and the heating element 13 are disposed on the outer surface of the base 11 , and the temperature measuring layer 14 is disposed on the inner surface of the base 11 .
在第五个具体实施例中,测温层14与发热元件13位于基体11的同一表面,且基体11和红外层12背离基体11的一侧表面均可设置有测温层14。其中,设置于基体11和红外层12背离基体11的一侧表面上的测温层14可与发热元件13间隔设置,且可沿基体11的周向方向环绕一圈设置并呈直线状分布。其中,设置于基体11上的测温层14与设置于红外层12背离基体11的一侧表面上的测温层14可间隔设置或一体成型。In the fifth embodiment, the temperature measuring layer 14 and the heating element 13 are located on the same surface of the substrate 11 , and the surface of the substrate 11 and the infrared layer 12 facing away from the substrate 11 can be provided with the temperature measuring layer 14 . Wherein, the temperature measuring layer 14 disposed on the surface of the substrate 11 and the infrared layer 12 facing away from the substrate 11 can be spaced apart from the heating element 13, and can be arranged in a circle along the circumferential direction of the substrate 11 and distributed in a straight line. Wherein, the temperature measuring layer 14 disposed on the substrate 11 and the temperature measuring layer 14 disposed on the surface of the infrared layer 12 facing away from the substrate 11 can be arranged at intervals or integrally formed.
其中,通过在红外层12和基体11上均设置测温层14,能够使测温层14同时感测基体11和发热元件13的温度,以保证该测温层14至少覆盖该加热组件10的最高温度区域,避免发生该加热组件10的最高温度区域出现在测温层14未覆盖的其它区域,导致测温结果误差较大的问题发生。Wherein, by setting the temperature measuring layer 14 on the infrared layer 12 and the substrate 11, the temperature measuring layer 14 can sense the temperature of the substrate 11 and the heating element 13 at the same time, so as to ensure that the temperature measuring layer 14 covers at least the heating element 10. The highest temperature area avoids the problem that the highest temperature area of the heating component 10 appears in other areas not covered by the temperature measurement layer 14, resulting in large errors in temperature measurement results.
本实施例提供的加热组件10,通过设置基体11,以通过基体11收容气溶胶产生基质。同时,通过在基体11的表面设置红外层12,以在红外层12加热时辐射红外线,从而通过辐射的红外线加热并雾化气溶胶产生基质,进而提高加热效率,且加热均匀性较好。另外,通过在基体11上设置发热元件13,以在发热元件13通电时加热红外层12,使红外层12辐射红外线。此外,通过在基体11和/或红外层12的表面设置测温层14,并使测温层14具有电阻温度系数(TCR)特性,从而使得该加热组件10可通过检测测温层14的电阻值以监测加热组件10的温度值,相比于现有技术,该测温层14不仅便于设置,且占用的空间较小。此外,由于该测温层14可根据实际需求选择覆盖基体11和/或红外层12的某些特定位置以及选择覆盖较大范围面积的基体11和/或红外 层12表面,从而能够对基体11和/或红外层12表面的特定的区域进行测温,测温精确度较高,并能够对基体11和/或红外层12的大部分区域进行测温,有效扩大了加热组件10的测温范围。In the heating assembly 10 provided in this embodiment, a base body 11 is provided so as to accommodate the aerosol-generating substrate through the base body 11 . At the same time, by setting the infrared layer 12 on the surface of the substrate 11 to radiate infrared rays when the infrared layer 12 is heated, the radiated infrared rays heat and atomize the aerosol to generate the substrate, thereby improving the heating efficiency, and the heating uniformity is better. In addition, by disposing the heating element 13 on the substrate 11, the infrared layer 12 is heated when the heating element 13 is energized, so that the infrared layer 12 radiates infrared rays. In addition, by setting the temperature measuring layer 14 on the surface of the substrate 11 and/or the infrared layer 12, and making the temperature measuring layer 14 have a temperature coefficient of resistance (TCR) characteristic, so that the heating assembly 10 can detect the resistance of the temperature measuring layer 14 The value is used to monitor the temperature value of the heating component 10. Compared with the prior art, the temperature measuring layer 14 is not only convenient to install, but also takes up less space. In addition, since the temperature measuring layer 14 can be selected to cover some specific positions of the base body 11 and/or the infrared layer 12 and to cover a larger area of the base body 11 and/or the surface of the infrared layer 12 according to actual needs, it is possible to control the base body 11 and/or a specific area on the surface of the infrared layer 12, the temperature measurement accuracy is high, and it is possible to measure the temperature of most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the temperature measurement of the heating element 10 scope.
请参阅图9,图9为本申请一实施例提供的气溶胶产生装置的结构示意图。在本实施例中,提供一种气溶胶产生装置100。该气溶胶产生装置100包括加热组件10、电源组件20以及控制器30。Please refer to FIG. 9 . FIG. 9 is a schematic structural diagram of an aerosol generating device provided by an embodiment of the present application. In this embodiment, an aerosol generating device 100 is provided. The aerosol generating device 100 includes a heating component 10 , a power component 20 and a controller 30 .
其中,加热组件10用于在通电时加热并雾化气溶胶产生基质以形成气溶胶。该加热组件10具体可为上述任一实施例所涉及的加热组件10,其具体结构与功能可参见上述实施例中关于加热组件10的具体结构与功能的描述,且可实现相同或相似的技术效果,具体可参见下文。Wherein, the heating component 10 is used for heating and atomizing the aerosol-generating substrate to form an aerosol when energized. The heating component 10 can specifically be the heating component 10 involved in any of the above-mentioned embodiments, and its specific structure and function can refer to the description of the specific structure and function of the heating component 10 in the above-mentioned embodiment, and can realize the same or similar technology effect, see below for details.
电源组件20与加热组件10连接,用于向加热组件10供电。其中,加热组件10与电源组件20可以是可拆卸式连接,以方便更换加热组件10,提高电源组件20的利用率。当然,在其他实施例中,电源组件20与加热组件10也可以是一体设置,本申请对此并不加以限制。The power supply assembly 20 is connected to the heating assembly 10 for supplying power to the heating assembly 10 . Wherein, the heating assembly 10 and the power supply assembly 20 may be detachably connected to facilitate the replacement of the heating assembly 10 and improve the utilization rate of the power supply assembly 20 . Certainly, in other embodiments, the power supply assembly 20 and the heating assembly 10 may also be provided integrally, which is not limited in this application.
控制器30用于控制电源组件20向加热组件10供电,并实时检测加热组件10上测温层14的电阻值,以及根据电阻值监测加热组件10的温度,进而调控加热组件10的温度场,以达到抽吸口感的最佳效果。The controller 30 is used to control the power supply assembly 20 to supply power to the heating assembly 10, and detect the resistance value of the temperature measuring layer 14 on the heating assembly 10 in real time, and monitor the temperature of the heating assembly 10 according to the resistance value, and then regulate the temperature field of the heating assembly 10, In order to achieve the best effect of smoking taste.
在具体实施例中,该气溶胶产生装置100还包括壳体40,加热组件10具体容置在壳体40内,并与电源组件20连接。In a specific embodiment, the aerosol generating device 100 further includes a casing 40 , and the heating assembly 10 is specifically housed in the casing 40 and connected to the power supply assembly 20 .
本实施例提供的气溶胶产生装置100,通过设置上述任意一实施例所涉及的加热组件10,使得该气溶胶产生装置100不仅能够利用辐射的红外线加热并雾化气溶胶产生基质,以提高加热效率,并增强加热均匀性;且可通过检测发热元件13或测温层14的电阻值来检测加热组件10的温度值,以调控加热组件10的温度场,达到抽吸口感的最佳效果。同时,相比于现有技术,由于发热元件13或测温层14呈膜状,其可直接沉积于基体11和/或红外层12表面,无需在基体11和/或红外层12表面设置安装槽或利用螺钉或螺丝等固定件对其进行安装固定,从而使得该发热元件13或测温层14不仅便于设置,且占用的空间较小。另外,由于该发热元件13或测温层14可根据实际需求选择覆盖基体11或红 外层12的某些特定位置以及选择覆盖较大范围面积的基体11和/或红外层12表面,从而能够对基体11和/或红外层12表面的特定的区域进行测温,测温精确度较高,并能够对基体11和/或红外层12的大部分区域进行测温,有效扩大了加热组件10的测温范围。The aerosol generating device 100 provided in this embodiment, by setting the heating assembly 10 involved in any one of the above embodiments, makes the aerosol generating device 100 not only heat and atomize the aerosol generating substrate by using radiated infrared rays, to improve heating Efficiency and enhanced heating uniformity; and the temperature value of the heating element 10 can be detected by detecting the resistance value of the heating element 13 or the temperature measuring layer 14 to regulate the temperature field of the heating element 10 to achieve the best effect of smoking taste. At the same time, compared with the prior art, since the heating element 13 or the temperature measuring layer 14 is in the form of a film, it can be directly deposited on the surface of the substrate 11 and/or the infrared layer 12 without installing and installing on the surface of the substrate 11 and/or the infrared layer 12. Grooves or fixing parts such as screws or screws are used to install and fix it, so that the heating element 13 or temperature measuring layer 14 is not only convenient to set up, but also takes up less space. In addition, because the heating element 13 or the temperature measuring layer 14 can be selected to cover some specific positions of the substrate 11 or the infrared layer 12 and to cover a larger area of the substrate 11 and/or the surface of the infrared layer 12 according to actual needs, thereby being able to The temperature measurement is performed on a specific area on the surface of the substrate 11 and/or the infrared layer 12, the temperature measurement accuracy is high, and the temperature can be measured on most areas of the substrate 11 and/or the infrared layer 12, effectively expanding the heating element 10. Temperature measurement range.
以上仅为本申请的实施方式,并非因此限制本申请的专利范围,凡是利用本申请说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本申请的专利保护范围内。The above is only the implementation mode of this application, and does not limit the scope of patents of this application. Any equivalent structure or equivalent process conversion made by using the contents of this application specification and drawings, or directly or indirectly used in other related technical fields, All are included in the scope of patent protection of the present application in the same way.

Claims (15)

  1. 一种加热组件,其中,包括:A heating assembly, comprising:
    基体,用于收容气溶胶产生基质;a substrate for containing an aerosol-generating substrate;
    红外层,设置于所述基体的表面,用于在加热时辐射红外线,以加热并雾化所述气溶胶产生基质;An infrared layer, disposed on the surface of the substrate, is used to radiate infrared rays when heated to heat and atomize the aerosol-generating substrate;
    发热元件,设置于所述基体和/或所述红外层的表面,用于在通电时加热所述红外层;其中,所述发热元件具有电阻温度系数特性而可以作为温度传感器。The heating element is arranged on the surface of the substrate and/or the infrared layer, and is used to heat the infrared layer when electricity is applied; wherein, the heating element has a temperature coefficient of resistance characteristic and can be used as a temperature sensor.
  2. 根据权利要求1所述的加热组件,其中,所述发热元件为发热层,所述发热层设置于所述红外层远离所述基体的表面。The heating assembly according to claim 1, wherein the heating element is a heating layer, and the heating layer is disposed on a surface of the infrared layer away from the substrate.
  3. 根据权利要求1所述的加热组件,其中,所述发热元件设置于所述基体的表面且与所述红外层间隔设置。The heating assembly according to claim 1, wherein the heating element is disposed on the surface of the base body and spaced from the infrared layer.
  4. 根据权利要求1所述的加热组件,其中,所述发热元件为发热层,所述发热层设置于所述基体的表面且位于所述基体与所述红外层之间。The heating assembly according to claim 1, wherein the heating element is a heating layer, and the heating layer is disposed on the surface of the base body and located between the base body and the infrared layer.
  5. 一种加热组件,其中,包括:A heating assembly, comprising:
    基体,用于收容气溶胶产生基质;a substrate for containing an aerosol-generating substrate;
    红外层,设置于所述基体的表面,用于在加热时辐射红外线,以加热并雾化所述气溶胶产生基质;An infrared layer, disposed on the surface of the substrate, is used to radiate infrared rays when heated to heat and atomize the aerosol-generating substrate;
    发热元件,设置于所述基体上,用于在通电时加热所述红外层;a heating element, arranged on the substrate, for heating the infrared layer when energized;
    测温层,设置于所述基体和/或所述红外层的表面,且与所述发热元件间隔设置;其中,所述测温层具有电阻温度系数(TCR)特性。The temperature measuring layer is arranged on the surface of the substrate and/or the infrared layer, and is spaced apart from the heating element; wherein, the temperature measuring layer has a temperature coefficient of resistance (TCR) characteristic.
  6. 根据权利要求5所述的加热组件,其中,所述测温层设置于所述基体的表面,且所述测温层与所述红外层位于所述基体的同一表面并相互间隔设置。The heating assembly according to claim 5, wherein the temperature measuring layer is disposed on the surface of the substrate, and the temperature measuring layer and the infrared layer are located on the same surface of the substrate and are spaced from each other.
  7. 根据权利要求5所述的加热组件,其中,所述测温层设置于所述红外层背离所述基体的一侧表面,且所述测温层与所述发热元件间隔设置。The heating assembly according to claim 5, wherein the temperature measuring layer is disposed on a surface of the infrared layer facing away from the substrate, and the temperature measuring layer is spaced apart from the heating element.
  8. 根据权利要求5所述的加热组件,其中,所述测温层围绕所述基体的周向方向一圈设置。The heating assembly according to claim 5, wherein the temperature measuring layer is arranged around the circumferential direction of the base body.
  9. 根据权利要求5所述的加热组件,其中,所述测温层位于所述基体的端部。The heating assembly according to claim 5, wherein the temperature measuring layer is located at the end of the base.
  10. 根据权利要求5所述的加热组件,其中,所述基体为中空柱状体,所述红外层设置于所述中空柱状体的外表面,所述发热元件为设置于所述红外层背离所述基体的一侧表面的发热层。The heating assembly according to claim 5, wherein the substrate is a hollow columnar body, the infrared layer is arranged on the outer surface of the hollow columnar body, and the heating element is arranged on the infrared layer away from the substrate The heating layer on one side of the surface.
  11. 根据权利要求5所述的加热组件,其中,所述基体为中空柱状体,所述红外层设置于所述中空柱状体的基体的内表面,所述发热元件为设置于所述红外层背离所述基体的一侧表面的发热层。The heating assembly according to claim 5, wherein the base body is a hollow columnar body, the infrared layer is arranged on the inner surface of the base body of the hollow columnar body, and the heating element is arranged on the infrared layer away from the The heat generating layer on one side surface of the substrate.
  12. 根据权利要求10所述的加热组件,其中,所述发热层位于所述基体的中部且沿所述基体的周向方向呈波浪型分布。The heating assembly according to claim 10, wherein the heating layer is located in the middle of the base body and is distributed in a wave shape along the circumferential direction of the base body.
  13. 根据权利要求5所述的加热组件,其中,所述基体为石英。The heating assembly of claim 5, wherein said substrate is quartz.
  14. 根据权利要求5所述的加热组件,其中,所述红外层、所述发热元件及所述测温层均通过丝印或涂覆方式设置在所述基体的外表面,且所述测温层的面积小于所述红外层的面积。The heating assembly according to claim 5, wherein, the infrared layer, the heating element, and the temperature measuring layer are all arranged on the outer surface of the substrate by silk screen printing or coating, and the temperature measuring layer The area is smaller than the area of the infrared layer.
  15. 一种气溶胶产生装置,其中,包括:An aerosol generating device, comprising:
    加热组件,用于在通电时加热并雾化气溶胶产生基质;所述加热组件为如权利要求1所述的加热组件;A heating component for heating and atomizing the aerosol generating substrate when energized; the heating component is the heating component according to claim 1;
    电源组件,与所述加热组件连接,用于向所述加热组件供电;A power supply component, connected to the heating component, for supplying power to the heating component;
    控制器,用于控制所述电源组件向所述加热组件供电,并实时检测所述发热元件或所述测温层的电阻值以及根据所述电阻值监测所述加热组件的温度。The controller is used to control the power supply component to supply power to the heating component, detect the resistance value of the heating element or the temperature measuring layer in real time, and monitor the temperature of the heating component according to the resistance value.
PCT/CN2022/128026 2021-11-26 2022-10-27 Heating assembly and aerosol generating apparatus WO2023093450A1 (en)

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CN213604404U (en) * 2020-07-03 2021-07-06 深圳市合元科技有限公司 Aerosol generating device and infrared emitter
CN213604400U (en) * 2020-09-22 2021-07-06 深圳市合元科技有限公司 Aerosol generating device and infrared heater
CN114052297A (en) * 2021-11-26 2022-02-18 深圳麦时科技有限公司 Heating assembly and aerosol generating device

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