WO2023090086A1 - Secondary monohydrofluoroalkane selective adduct and method for producing same - Google Patents

Secondary monohydrofluoroalkane selective adduct and method for producing same Download PDF

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WO2023090086A1
WO2023090086A1 PCT/JP2022/039834 JP2022039834W WO2023090086A1 WO 2023090086 A1 WO2023090086 A1 WO 2023090086A1 JP 2022039834 W JP2022039834 W JP 2022039834W WO 2023090086 A1 WO2023090086 A1 WO 2023090086A1
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substituents
formula
group optionally
compound represented
independently
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PCT/JP2022/039834
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Japanese (ja)
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積 森本
裕亮 東
実生也 鈴木
萌 細川
洋介 岸川
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国立大学法人 奈良先端科学技術大学院大学
ダイキン工業株式会社
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Priority claimed from JP2022118114A external-priority patent/JP7315186B2/en
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Publication of WO2023090086A1 publication Critical patent/WO2023090086A1/en

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    • C07C231/00Preparation of carboxylic acid amides
    • C07C231/12Preparation of carboxylic acid amides by reactions not involving the formation of carboxamide groups
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C233/00Carboxylic acid amides
    • C07C233/01Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C233/02Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having nitrogen atoms of carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
    • C07C233/04Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having nitrogen atoms of carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals with carbon atoms of carboxamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C233/05Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having nitrogen atoms of carboxamide groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals with carbon atoms of carboxamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • C07C255/01Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
    • C07C255/32Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring
    • C07C255/35Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring the carbon skeleton being further substituted by halogen atoms, or by nitro or nitroso groups
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C315/00Preparation of sulfones; Preparation of sulfoxides
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00Sulfones; Sulfoxides
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00Preparation of carboxylic acid esters
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00Preparation of carboxylic acid esters
    • C07C67/30Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
    • C07C67/333Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton
    • C07C67/343Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C67/347Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by addition to unsaturated carbon-to-carbon bonds
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/007Esters of unsaturated alcohols having the esterified hydroxy group bound to an acyclic carbon atom
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
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    • C07C69/63Halogen-containing esters of saturated acids
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62Halogen-containing esters
    • C07C69/65Halogen-containing esters of unsaturated acids
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    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/44Iso-indoles; Hydrogenated iso-indoles
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    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic System
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    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/38Phosphonic acids RP(=O)(OH)2; Thiophosphonic acids, i.e. RP(=X)(XH)2 (X = S, Se)
    • C07F9/40Esters thereof

Definitions

  • the present disclosure relates to selective adducts of secondary monohydrofluoroalkanes and methods for producing the same.
  • fluorine functional groups have mimic effects, blocking effects, and hydrophobic effects, fluorine functional groups are often introduced in the development of pharmaceuticals and agrochemicals.
  • a heptafluoroisopropyl group ((CF 3 ) 2 CF group) and the like have higher functions, and are known to exhibit higher activity than the CF 3 group when used in the insecticide flubendiamide, for example.
  • (CF 3 ) 2 CF group or the like As a method for introducing a (CF 3 ) 2 CF group or the like into an ethylenically unsaturated compound (double bond), a method utilizing a radical addition reaction is known.
  • (CF 3 ) 2 CF groups are introduced into ethylenically unsaturated compounds by preparing (CF 3 ) 2 CFAg from AgF and hexafluoropropene (HFP) (Non-Patent Document 1).
  • Non-Patent Document 1 has problems that AgF is expensive and usable reactants and substrates are limited. Methods for the addition, particularly regioselective addition, of secondary monohydrofluoroalkanes, rather than (CF 3 ) 2 CFAg, to ethylenically unsaturated compounds have not been investigated so far.
  • the main object of the present disclosure is to provide a selective adduct of secondary monohydrofluoroalkanes and a method for producing the same.
  • R 1 , R 2 , and R 3 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
  • RA is a hydrocarbon group optionally having one or more substituents
  • R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring
  • EWG is an electron withdrawing group
  • Any two of R 1 , R 2 , R 3 , and EWG may combine with each other to form a ring
  • R 4 and R 5 each independently optionally have one or more substituents, a fluor
  • a production method comprising the step of reacting a compound represented by in the presence of a base. Section 2.
  • Item 2. The production method according to Item 1, wherein the pKa of the base is in the range of 10-20.
  • the base is a quaternary ammonium salt, MHF p (where M is Na, K, or Cs and p is a number corresponding to the valence), and MF (where M is Na, K , or Cs).
  • MHF p where M is Na, K, or Cs
  • p is a number corresponding to the valence
  • MF where M is Na, K , or Cs
  • the base comprises a quaternary ammonium salt.
  • the quaternary ammonium salt is at least one selected from the group consisting of tetrabutylammonium fluoride, tetrabutylammonium hydroxide, tetramethylammonium fluoride, and tetramethylammonium hydroxide. manufacturing method. Item 6.
  • EWG is —COOR 6 , —COR 6 , —SO n R 6 , —CONR 7 R 8 , —PO(OR 9 )(OR 10 ), or a cyano group;
  • R 6 is a C 1-12 hydrocarbon group optionally having one or more substituents,
  • R 7 and R 8 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
  • R 9 and R 10 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents, n is 1 or 2;
  • Item 6. The production method according to any one of Items 1 to 5.
  • R 31 is a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents
  • R 61 is a C 1-12 alkyl group optionally having one or more substituents, a cycloalkyl group optionally having one or more substituents, or having one or more substituents is an aryl group that may be (However, when R61 is a C4 alkyl group optionally having one or more substituents, the C4 alkyl group is a branched C4 alkyl group.)
  • a compound represented by Item 13 A compound represented by Item 13.
  • R 32 is a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents
  • R 71 and R 81 are each independently a C 1-12 alkyl group optionally having one or more substituents, or an aryl group optionally having one or more substituents . (However, R 71 and R 81 are not C2 alkyl groups optionally having one or more substituents at the same time.)
  • R 11 , R 12 and R 13 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
  • RA is a hydrocarbon group optionally having one or more substituents
  • R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with R 16 is an electron withdrawing group
  • Any two of R 11 , R 12 , R 13 and R 16 may be bonded to each other to form a ring
  • R 14 and R 15 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen
  • R 1 , R 2 , and R 3 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
  • RA is a hydrocarbon group optionally having one or more substituents
  • R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents,
  • EWG is an electron withdrawing group, Any two of R 1 , R 2 , R 3 , and EWG may combine with each other to form a ring
  • R 4 and R 5 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents and a fluoroal
  • R 11 , R 12 and R 13 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
  • RA is a hydrocarbon group optionally having one or more substituents
  • R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with R 16 is an electron withdrawing group, Any two of R 11 , R 12 , R 13 and R 16 may be bonded to each other to form a ring, R 14 and R 15 each independently optionally have one or more substituents, a fluoroalkyl group
  • Item 16 The composition according to Item 15, containing 0.0001 to 150 parts by mass of the compound represented by Formula (4) per 100 parts by mass of the compound represented by Formula (3).
  • Item 17. 17 The composition according to Item 15 or 16, containing 0.0001 to 100 parts by mass of the compound represented by Formula (4) per 100 parts by mass of the compound represented by Formula (3).
  • Item 18. The composition according to any one of items 15 to 17, containing 0.0001 to 50 parts by mass of the compound represented by the formula (4) with respect to 100 parts by mass of the compound represented by the formula (3). thing.
  • Item 19 The composition according to any one of items 15 to 17, containing 0.0001 to 50 parts by mass of the compound represented by the formula (4) with respect to 100 parts by mass of the compound represented by the formula (3). thing.
  • R 21 , R 22 and R 23 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
  • RA is a hydrocarbon group optionally having one or more substituents
  • R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with Any two of R 21 , R 22 , and R 23 may combine with each other to form a ring
  • R 24 and R 25 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substitu
  • Item 15 that does not contain the compound represented by or contains more than 0 parts by mass and 50 parts by mass or less of the compound represented by the formula (5) with respect to 100 parts by mass of the compound represented by the formula (3) 19.
  • the present disclosure provides selective adducts of secondary monohydrofluoroalkanes and methods for producing the same.
  • room temperature can mean a temperature within the range of 10-40°C.
  • C nm (where n and m are each positive integers and n ⁇ m) means that the number of carbon atoms is n, as is commonly understood by those skilled in the art. It is equal to or greater than m and equal to or less than m.
  • hydrocarbon group is a concept that includes both saturated hydrocarbon groups and unsaturated hydrocarbon groups.
  • hydrocarbon groups include alkyl groups, alkenyl groups, alkynyl groups, cycloalkyl groups, cycloalkenyl groups, cycloalkadienyl groups, aryl groups, and aralkyl groups.
  • alkyl group includes, for example, methyl group, ethyl group, propyl group (n-propyl group, isopropyl group), butyl group (n-butyl group, isobutyl group, sec-butyl group, tert- butyl group), pentyl group, and hexyl group, straight or branched C 1-20 alkyl groups, and the like.
  • alkenyl group includes, for example, vinyl group, 1-propen-1-yl group, 2-propen-1-yl group, isopropenyl group, 2-buten-1-yl group, 4- Linear or branched C 2-20 alkenyl groups such as penten-1-yl group and 5-hexen-1-yl group are included.
  • alkynyl group includes, for example, ethynyl group, 1-propyn-1-yl group, 2-propyn-1-yl group, 4-pentyn-1-yl group, and 5-hexyne-1 and straight or branched chain C 2-20 alkynyl groups such as -yl groups.
  • cycloalkyl group includes, for example, C 3-10 cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl and adamantyl groups.
  • cycloalkenyl group includes, for example, C 3-10 cycloalkenyl groups such as cyclopropenyl group, cyclobutenyl group, cyclopentenyl group, cyclohexenyl group, and cycloheptenyl group.
  • cycloalkadienyl group includes, for example, a cyclobutadienyl group, a cyclopentadienyl group, a cyclohexadienyl group, a cycloheptadienyl group, a cyclooctadienyl group, and a cyclononadienyl group. and C 4-10 cycloalkadienyl groups such as cyclodecadienyl groups.
  • an "aryl group” can be, for example, monocyclic, bicyclic, tricyclic, or tetracyclic.
  • the “aryl group” includes, for example, C 6-18 aryl groups such as phenyl group, 1-naphthyl group, 2-naphthyl group, 2-biphenyl group, 3-biphenyl group, 4-biphenyl group and 2-anthryl group. and the like.
  • the "aralkyl group” includes, for example, a benzyl group, a phenethyl group, a diphenylmethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 2,2-diphenylethyl group, a 3-phenylpropyl group, and C 7-19 aryl groups such as 4-phenylbutyl, 5-phenylpentyl, 2-biphenylmethyl, 3-biphenylmethyl, and 4-biphenylmethyl groups.
  • the substituents of the "hydrocarbon group optionally having one or more substituents" include, for example, halogen atoms such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, a hydroxyl group, mercapto group, amino group, nitro group, cyano group and the like.
  • the number of substituents is, for example, one or more and the maximum substitutable number or less (eg, 2, 3, 4, or 5).
  • Examples of the "hydrocarbon group optionally having one or more substituents" include haloalkyl groups, hydroxyalkyl groups and the like.
  • haloalkyl group may be, for example, the above “alkyl group” substituted with one or more halogen atoms.
  • hydroxyalkyl group may be, for example, the above “alkyl group” substituted with one or more hydroxyl groups.
  • fluoroalkyl group is a concept that includes both non-perfluoroalkyl groups and perfluoroalkyl groups.
  • the "fluoroalkyl group” may be, for example, the above “alkyl group” substituted with one or more fluorine atoms.
  • fluoroalkyl group optionally containing an oxygen atom between carbon atoms for example, CF3- , CH 3 —CF 2 —, CHF 2 -CH 2 -, CF 3 —CH 2 —, CF 3 -CF 2 -, CF 3 —CF 2 —CH 2 —, CF 3 -CF 2 -CF 2 -, (CF 3 ) 2 CF-, CF 3 —O—CF 2 —, CF 3 —O—CF(CF 3 )—, CF 3 -CF 2 -CF 2 -CF 2 -, CF 3 -CF 2 -CF(CF 3 )-CF 2 -, CF 3 —O—CH 2 —CH 2 —, CF 3 —O—CH(CF 3 )—CH 2 —, CF 3 -O-CF 2 -CF 2 -, (CF 3 CF 2 )(CF 2 )CF-, (CF 3 ) 3 C-, CF 3 C-,
  • a fluoroalkyl group which may have one or more substituents and which may contain an oxygen atom between carbon atoms means the above "fluoroalkyl group which may contain an oxygen atom between carbon atoms” ” has one or more substituents (e.g., hydroxyl group, mercapto group, amino group, nitro and at least one selected from a cyano group, etc.).
  • fluoroalkoxy group is a concept that includes both non-perfluoroalkoxy groups and perfluoroalkoxy groups.
  • fluoroalkoxy group optionally containing an oxygen atom between carbon atoms for example, CF 3 —O—, CF 3 —CH 2 —O—, CF 3 -CF 2 -O-, CF 3 -CF 2 -CF 2 -O-, CF 3 -CF 2 -CF 2 -CF 2 -O-, CF 3 —O—CF 2 —O—, CF 3 -O-CF 2 -CF 2 -CF 2 -O-, CF 3 —O—CH 2 —CF 2 —CF 2 —O— CF 3 -CF 2 -O-CF 2 -CF 2 -O-, CF3 - CF2 - CF2 -O- CH2 - CF2 - CF2 -O-, CF 3
  • a fluoroalkoxy group which may have one or more substituents and which may contain an oxygen atom between carbon atoms refers to the above "a fluoroalkoxy group which may contain an oxygen atom between carbon atoms” ” has one or more substituents (e.g., hydroxyl group, mercapto group, amino group, nitro and at least one selected from a cyano group, etc.).
  • the term “electron-withdrawing group” refers to a functional group having a positive Hammett's substituent constant ⁇ p value.
  • the definition of the ⁇ p value and the ⁇ p value of each functional group can be referred to, for example, Hansch, C et al., Chem. Rev., 91, pp. 165-195 (1991).
  • R is a hydrocarbon group which may independently have one or more substituents.
  • the substituent that can optionally be substituted on the hydrocarbon group is preferably an electron-withdrawing group.
  • the number of substituents is, for example, one or more and the maximum substitutable number or less (eg, 2, 3, 4, or 5).
  • a method for producing a compound represented by formula (3) includes a step of reacting a compound represented by formula (1) with a compound represented by formula (2) in the presence of a base (hereinafter referred to as "step A”).
  • R 1 , R 2 and R 3 represented by formula (1) each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, or a hydrocarbon group optionally having one or more substituents.
  • -OR A , -COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A .
  • R 1 , R 2 , and R 3 are each independently preferably a hydrogen atom or a hydrocarbon group optionally having one or more substituents. It is more preferably a C 1-12 hydrocarbon group optionally having one or more substituents.
  • R 1 , R 2 , and R 3 are each independently hydrogen atom, alkyl group optionally having one or more substituents, cycloalkyl group optionally having one or more substituents, aryl optionally having one or more substituents or an aralkyl group optionally having one or more substituents, A hydrogen atom, an alkyl group optionally having one or more substituents, an aryl group optionally having one or more substituents, or an aralkyl optionally having one or more substituents more preferably a group, It is more preferably a hydrogen atom, an alkyl group optionally having one or more substituents, or an aryl group optionally having one or more substituents, A hydrogen atom, a C 1-12 alkyl group optionally having one or more substituents, or a C 6-12 aryl group optionally having one or more substituents is particularly preferred.
  • Suitable combinations of R 1 , R 2 and R 3 include, for example, (a) a combination in which R 1 and R 2 are hydrogen atoms and R 3 is a hydrocarbon group optionally having one or more substituents; (b) R 1 and R 2 are hydrogen atoms, and R 3 is an alkyl group optionally having one or more substituents, an aryl group optionally having one or more substituents, or a combination that is an aralkyl group optionally having one or more substituents, (c) R 1 and R 2 are hydrogen atoms, and R 3 is an alkyl group optionally having one or more substituents or an aryl group optionally having one or more substituents combination, (d) one of R 1 and R 2 is a hydrogen atom and the other is a hydrocarbon group optionally having a hydroxyl group, -OR A , -COOR A , -NR B R C , -NH-COR A , or a combination of —NH—COOR A and R
  • R A is a hydrocarbon group optionally having one or more substituents (eg, C 1-12 hydrocarbon group), preferably alkyl optionally having one or more substituents group (eg, C 1-12 alkyl group), aryl group optionally having one or more substituents (eg, C 6-12 aryl group), or having one or more substituents aralkyl group (eg, C 7-12 aralkyl group).
  • substituents eg, C 1-12 hydrocarbon group
  • alkyl optionally having one or more substituents group
  • aryl group optionally having one or more substituents
  • aralkyl group eg, C 7-12 aralkyl group
  • R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents (eg, a C 1-12 hydrocarbon group), preferably a hydrogen atom, Alkyl groups optionally having one or more substituents (eg C 1-12 alkyl groups), aryl groups optionally having one or more substituents (eg C 6-12 aryl groups ), or an aralkyl group optionally having one or more substituents (eg, a C 7-12 aralkyl group).
  • R B and R C may combine with each other to form a ring together with the adjacent nitrogen atoms. Examples of the ring include pyrrole, piperidine, 1,3-dioxoisoindoline and the like.
  • EWG is an electron withdrawing group.
  • EWG is preferably —COOR 6 , —COR 6 , —SO n R 6 , —CONR 7 R 8 , —PO(OR 9 )(OR 10 ), or a cyano group, and —COOR 6 , —CONR 7 R 8 , —SO n R 6 , —PO(OR 9 )(OR 10 ), or a cyano group is more preferred, and —COOR 6 , —CONR 7 R 8 , or a cyano group is even more preferred.
  • the 1,4-addition reaction of the compound represented by the formula (2) can be selectively allowed to proceed with respect to the compound represented by the formula (1) having such an EWG, and the 1,2-addition The reaction can be partially or completely inhibited.
  • R 6 is preferably a C 1-12 hydrocarbon group optionally having one or more substituents.
  • R 6 is an alkyl group optionally having one or more substituents, a cycloalkyl group optionally having one or more substituents, It is preferably an aryl group which may have one or more substituents, or an aralkyl group which may have one or more substituents.
  • R 6 is an alkyl group optionally having one or more substituents, an aryl group optionally having one or more substituents, or one or more substituents It is more preferably an aralkyl group optionally having one or more substituents, a C 1-12 alkyl group optionally having one or more substituents, a C 6 optionally having one or more substituents -12 aryl group or C 7-12 aralkyl group optionally having one or more substituents is more preferable.
  • R 7 and R 8 are each independently preferably a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents.
  • R 7 and R 8 are each independently a hydrogen atom, an alkyl group optionally having one or more substituents, optionally having one or more substituents A cycloalkyl group, an aryl group optionally having one or more substituents, or an aralkyl group optionally having one or more substituents is preferable, and a hydrogen atom, one or more substituents more preferably an alkyl group optionally having a group, an aryl group optionally having one or more substituents, or an aralkyl group optionally having one or more substituents, hydrogen atom, C 1-12 alkyl group optionally having one or more substituents, C 6-12 aryl group optionally having one or more substituents, or one or more substituents It is more preferably a C 7-12 aralkyl group optionally having
  • R 9 and R 10 are each independently preferably a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents.
  • R 9 and R 10 are each independently a hydrogen atom, an alkyl group optionally having one or more substituents, optionally having one or more substituents A cycloalkyl group, an aryl group optionally having one or more substituents, or an aralkyl group optionally having one or more substituents is preferable, and a hydrogen atom, one or more substituents more preferably an alkyl group optionally having a group, an aryl group optionally having one or more substituents, or an aralkyl group optionally having one or more substituents, hydrogen atom, C 1-12 alkyl group optionally having one or more substituents, C 6-12 aryl group optionally having one or more substituents, or one or more substituents It is more preferably a C 7-12 aralkyl group optionally having
  • R 1 , R 2 , R 3 , and EWG may combine with each other to form a ring.
  • the compound represented by formula (1) has R 1 (or R 2 ) and EWG bound together to form a ring, represented by any of the following formulas (1-1) to (1-5). It may be a compound that is
  • the compound represented by formula (1) is preferably a compound represented by any one of the following formulas (1-6) to (1-15).
  • R 33 , R 34 , R 35 , R 36 and R 37 are a hydrogen atom, a halogen atom, an alkyl group, or a fluoroalkyl group (preferably a trifluoromethyl group)
  • R 62 , R 63 , R 64 , R 65 , R 66 , R 67 , R 68 , RD , RE , RF , RG and RH are alkyl, cycloalkyl, aryl or aralkyl a group
  • R 72 and R 82 are each independently a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group
  • R91 and R101 are each independently a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group.
  • R 4 and R 5 represented by formula (2) each independently may have one or more substituents, and a fluoroalkyl group optionally containing an oxygen atom between carbon atoms , or a fluoroalkoxy group which may have one or more substituents and which may contain an oxygen atom between carbon atoms.
  • R 4 and R 5 are each independently a fluoroalkyl group optionally having one or more substituents, a fluoroalkoxy group optionally having one or more substituents, one or more It is preferably a fluoroalkoxyfluoroalkyl group which may have a substituent or a fluoroalkoxyfluoroalkoxy group which may have one or more substituents, and has one or more substituents.
  • a fluoroalkyl group optionally having one or more substituents or a fluoroalkoxy group optionally having one or more substituents
  • a fluoroC 1-10 alkyl group optionally having one or more substituents or a fluoro-C 1-10 alkoxy group optionally having one or more substituents, and an aspect in which these groups have no substituents is also preferred.
  • R 4 and R 5 are fluoroalkyl groups optionally having one or more substituents, and R 4 and R 5 are one or more A combination of optionally substituted fluoro-C 1-10 alkyl groups is more preferred.
  • R 4 and R 5 may combine with each other to form a ring.
  • the ring can be, for example, a 4-membered ring, a 5-membered ring, or a 6-membered ring.
  • the compound represented by formula (2) having the ring is preferably a compound represented by any one of the following formulas (2-1) to (2-7).
  • Suitable examples of the compound represented by formula (2) include 1,1,1,2,3,3,3-heptafluoropropane and the like.
  • R 4 and R 5 may be short chain substituents such as trifluoromethyl group (CF 3 —) or CF 3 CF 2 CF 2 CF 2 It may also be a long-chain substituent that is bulkier than CF 3 —, such as O—.
  • the amount of the compound represented by formula (2) is not particularly limited, but for example, 1 mol or more, 1.5 mol or more, or 2 mol or more per 1 mol of the compound represented by formula (1) is preferably 20 mol or less, 15 mol or less, or 10 mol or less.
  • the amount of the compound represented by formula (2) to be used can be within a range in which the above lower limit and the above upper limit are arbitrarily combined.
  • Base is not particularly limited, and any base can be used.
  • bases include linear tertiary amines such as N,N-diisopropylethylamine (DIPEA); 1,4-diazabicyclo[2.2.2]octane (DABCO) and 1,8-bis(dimethylaminonaphthalene).
  • cyclic amines such as diazabicycloundecene (DBU), diazabicyclononene (DBN) and other cyclic amidine bases, as well as quaternary ammonium salts, MH(Z) p (where M is a metal, Z is a halogen and p is a number corresponding to the valence), M(Z) k (where M is a metal, Z is a halogen, and k is a number corresponding to the valence of the metal ) and the like.
  • DBU diazabicycloundecene
  • DBN diazabicyclononene
  • MH(Z) p where M is a metal, Z is a halogen and p is a number corresponding to the valence
  • M(Z) k where M is a metal, Z is a halogen, and k is a number corresponding to the valence of the metal
  • Examples of the quaternary ammonium salt include the following formula (6): (In the formula, Q 1 to Q 4 are each independently a hydrocarbon group optionally having one or more substituents, and any two of Q 1 to Q 4 are bonded to each other. may form a ring, and X is halogen, OH, HSO 4 , SO 4 2- , BH 4 , BF 4 , ClO 4 , NO 3 or PF 6 .) or a hydrate thereof, tris(dimethylamino)sulfonium difluorotrimethylsilicate (TASF), and the like.
  • formula (6) In the formula, Q 1 to Q 4 are each independently a hydrocarbon group optionally having one or more substituents, and any two of Q 1 to Q 4 are bonded to each other. may form a ring, and X is halogen, OH, HSO 4 , SO 4 2- , BH 4 , BF 4 , ClO 4 , NO 3 or PF 6 .
  • Q 1 to Q 4 are each independently an alkyl group optionally having one or more substituents, a cycloalkyl group optionally having one or more substituents, one or more substituents It is preferably an aryl group which may have a group or an aralkyl group which may have one or more substituents, an alkyl group which may have one or more substituents or 1 It is more preferably an aryl group optionally having one or more substituents, more preferably an alkyl group optionally having one or more substituents, and a C 1-4 alkyl group. It is particularly preferred to have In addition, although a halogen atom, a hydroxyl group, a mercapto group, etc. are mentioned as said substituent, it is not limited to these.
  • Examples of the ring formed by combining any two of Q 1 to Q 4 include, but are not limited to, 5- or 6-membered rings of pyrrolidine, piperidine, morpholine, and the like.
  • the halogen represented by X is fluorine, chlorine, bromine or iodine, preferably fluorine.
  • X is preferably halogen or OH, more preferably fluorine or OH.
  • Suitable examples of the compound represented by formula (6) include tetrabutylammonium fluoride, tetrabutylammonium hydroxide, tetramethylammonium fluoride, tetramethylammonium hydroxide and the like.
  • M is preferably an alkali metal or an alkaline earth metal, more preferably an alkali metal, and further preferably Na, K, or Cs. preferable.
  • Z is preferably fluorine.
  • the MH(Z) p is preferably MHF p (where M is Na, K, or Cs, and p is a number corresponding to the valence), and the M(Z) k is MF (where M is Na, K, or Cs).
  • a base can be used individually by 1 type or in combination of 2 or more types.
  • the base is a quaternary ammonium salt, MHF p (where M is Na, K, or Cs and p is a number corresponding to the valence), and MF (where M is Na, K, or Cs.) preferably contains at least one selected from the group consisting of, more preferably a quaternary ammonium salt.
  • the quaternary ammonium salt is preferably at least one selected from the group consisting of tetrabutylammonium fluoride, tetrabutylammonium hydroxide, tetramethylammonium fluoride, and tetramethylammonium hydroxide.
  • the lower limit of the pKa of the base is, for example, 10, preferably 11, more preferably 12.
  • the upper limit of the pKa of the base is, for example, 20, preferably 16, more preferably 15.
  • the pKa of the base is, for example, within the range of 10-20, preferably within the range of 10-15.
  • Kagaku Binran Frundamentals Revised 6th Edition, The Chemical Society of Japan (Maruzen Publishing), and the like.
  • the amount of the base to be used is not particularly limited. It is preferably 5 mol or less, 4 mol or less, 3 mol or less, or 2 mol or less.
  • the amount of the base to be used can be within a range in which the above lower limit and the above upper limit are arbitrarily combined.
  • the reaction of solvent step A may be carried out in a solvent.
  • the solvent may be, for example, a nonpolar solvent, an aprotic polar solvent, or a protic polar solvent.
  • Examples of the solvent include, but are not limited to, the following solvents.
  • ⁇ Hydrocarbon solvents chain hydrocarbons such as n-hexane, aromatic hydrocarbons such as benzene, toluene, and p-xylene] ⁇ Halogen-based solvents
  • Haloalkanes such as dichloromethane, dichloroethane, and perfluorohexane
  • Haloarenes such as chlorobenzene
  • Haloalkylarenes such as trifluorotoluene and hexafluorometaxylene
  • Nitrile-based solvents e.g.
  • chain nitriles such as acetonitrile, propionitrile and acrylonitrile; cyclic nitriles such as benzonitrile] - Amide solvents
  • carboxylic acid amides e.g. chain amides such as formamide, N-methylformamide, N,N-dimethylformamide, cyclic amides such as N-methylpyrrolidone
  • phosphoric acid amides e.g.
  • Ether-based solvents [Examples: chain ethers such as diethyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, and triethylene glycol dimethyl ether; cyclic ethers such as tetrahydrofuran (THF) and dioxane] ⁇ Urea-based solvent [Example: N,N-dimethylpropylene urea] ⁇ Ester-based solvent [Example: Acetate ester] ⁇ Sulfoxide solvent [Example: dimethyl sulfoxide (DMSO)] ⁇ Nitro-based solvents [e.g. nitromethane, nitrobenzene] ⁇ Ketone solvent [Example: acetone, methyl ethyl ketone] ⁇ Mixed solvent of two or more of these
  • the solvent is preferably at least one selected from the group consisting of hydrocarbon solvents, ether solvents, amide solvents, sulfoxide solvents, and nitrile solvents.
  • the amount of the solvent used is not particularly limited, but for example, it is preferably 0.1 mL or more, 0.5 mL or more, or 1 mL or more, 100 mL or less, or 50 mL with respect to 1 mmol of the compound represented by formula (1). or less, or preferably 30 mL or less.
  • the amount of the solvent used can be within a range in which the above lower limit and the above upper limit are arbitrarily combined.
  • the drying agent step A reaction can be carried out in the presence or absence of water.
  • the amount of water may be, for example, 5 parts by mass or less with respect to 100 parts by mass of the reaction liquid.
  • the reaction of step A may be carried out in the presence of a drying agent.
  • desiccants include zeolite and the like.
  • zeolites include molecular sieves 3A, 4A, and 5A (Union Showa), Zeolum 3A and 4A (Tosoh), and the like.
  • the reaction of metal oxide step A can be carried out in the presence or absence of a metal oxide.
  • metal oxides include zeolite, silica, and alumina, which are mentioned as examples of the desiccant.
  • the amount of the metal oxide used is, for example, 100 parts by mass or more, 200 parts by mass or more, or preferably 300 parts by mass or more with respect to 100 parts by mass of the compound represented by formula (1), and 35000 parts by mass. Below, it is preferably 30,000 parts by mass or less, or 25,000 parts by mass or less.
  • the amount of the metal oxide used can be within a range in which the lower limit and the upper limit are arbitrarily combined.
  • the reaction temperature in step A is not particularly limited as long as the reaction proceeds.
  • the lower limit of the reaction temperature is, for example, ⁇ 20° C. or higher, preferably 0° C. or higher, and more preferably 10° C. or higher.
  • the upper limit of the reaction temperature is, for example, 150° C. or lower, preferably 120° C. or lower, and more preferably 100° C. or lower.
  • the reaction temperature can be in any combination of the lower limit and the upper limit.
  • the reaction time of step A is not particularly limited as long as the reaction proceeds.
  • the lower limit of the reaction time is, for example, 0.1 hour or longer, preferably 0.5 hour or longer, and more preferably 1 hour or longer.
  • the upper limit of the reaction time is, for example, 72 hours or less, preferably 50 hours or less.
  • the reaction time can be within a range in which the above lower limit and the above upper limit are arbitrarily combined.
  • Suitable combinations of R 1 , R 2 , R 3 , R 4 , R 5 and EWG include, for example, combinations shown in Table 1 below.
  • the method for producing the compound represented by formula (3) can include optional steps, for example, purification steps such as filtration, extraction, distillation, column chromatography, and washing.
  • R 11 , R 12 , R 13 , R 14 , R 15 and R 16 in the compound formula (4) represented by the formula (4) are respectively R 1 and R 2 in the formulas (1) to ( 3 ) , R 3 , R 4 , R 5 , and EWG.
  • Compounds of formula (4) can represent by-products of the step A reaction.
  • R 11 , R 12 and R 13 are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents (eg, a C 1-12 hydrocarbon group), R 16 is —COOR 17 , —CONR 18 R 19 , or a cyano group; R 17 is a C 1-12 hydrocarbon group optionally having one or more substituents, R 18 and R 19 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents, Any two of R 11 , R 12 , R 13 and R 16 may be bonded to each other to form a ring, R 14 and R 15 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may have an oxygen atom between the carbon atoms, and R 14 and R 15 may combine with each other to form a ring.
  • substituents eg,
  • n 2 or 3.
  • composition contains the compound represented by Formula (3) and the compound represented by Formula (4).
  • the upper limit of the content of the compound represented by formula (4) is, for example, 300 parts by mass, preferably 250 parts by mass, more preferably 200 parts by mass with respect to 100 parts by mass of the compound represented by formula (3). be.
  • the lower limit of the content of the compound represented by formula (4) is, for example, 0.0001 parts by mass, 0.0005 parts by mass, or 0.001 parts by mass with respect to 100 parts by mass of the compound represented by formula (3). , 0.005 parts by weight, or 0.01 parts by weight.
  • the upper limit of the content of the compound represented by formula (4) may be, for example, 9 mol, 8 mol, 7 mol, or 6 mol with respect to 1 mol of the compound represented by formula (3), It may be preferably 5 mol, 4 mol, 3 mol or 2 mol, more preferably 1 mol.
  • the lower limit of the content of the compound represented by formula (4) is, for example, 0.0001 mol, 0.0005 mol, 0.001 mol, 0.005, per 1 mol of the compound represented by formula (3). mol, or 0.01 mol.
  • the content of the compound represented by the formula (4) can be within a range in which the lower limit and the upper limit are arbitrarily combined.
  • Methods for quantifying the content of the compound represented by formula (4) include NMR, HPLC, IR, GC, GC/MS, and LC/MS methods. Among these, the GC/MS method is more suitable for quantifying trace components.
  • the composition has the following formula (5): (In the formula, R 21 , R 22 and R 23 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ; RA is a hydrocarbon group optionally having one or more substituents, R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, Any two of R 21 , R 22 , and R 23 may combine with each other to form a ring, R 24 and R 25 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may contain an oxygen
  • R 21 , R 22 , R 23 , R 24 and R 25 in formula (5) correspond to R 1 , R 2 , R 3 , R 4 and R 5 in formulas (1) to (3) respectively
  • the compound represented by the formula (5) is a compound represented by the formula (2) with respect to the compound represented by the formula (1) in which EWG is —COOR 6 or —CONR 7 R 8 . - may correspond to an adduct compound.
  • the content of the compound represented by formula (5) is, for example, 50 parts by mass or less, preferably 45 parts by mass or less, more preferably 40 parts by mass or less with respect to 100 parts by mass of the compound represented by formula (3). , more preferably 35 parts by mass or less, particularly preferably 30 parts by mass or less.
  • the content of the compound represented by formula (5) is, for 100 parts by mass of the compound represented by formula (3), for example, more than 0 parts by mass, 0.0001 parts by mass or more, 0.001 parts by mass or more, Or it can be 0.01 parts by mass or more.
  • the content of the compound represented by the formula (5) can be within a range in which the lower limit and the upper limit are arbitrarily combined.
  • the content of the compound represented by formula (5) can be quantified, for example, by the same method as the method for quantifying the content of the compound represented by formula (4).
  • the method for producing the compound represented by formula (3) of the present disclosure is represented by formula (2) for the compound represented by formula (1) in which EWG is —COOR 6 or —CONR 7 R 8
  • the 1,4-addition of the compound can be selectively allowed to proceed, and the 1,2-addition can be partially or completely suppressed. Accordingly, the present disclosure can also provide compositions that do not contain a compound of formula (5) (or that contain a compound of formula (5) below the detection limit).
  • Example 1 A 20 mL autoclave was charged with benzyl acrylate (41 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), and a 1.0 M solution of tetrabutylammonium fluoride in THF (0.25 mL, 0.25 mmol) at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis.
  • the yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 41%, and 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl
  • the yield of dibenzyl)propyl)glutarate was 3% (the yield (%) is a unit based on mol of the raw material (benzyl acrylate)).
  • Example 2 In a 20 mL autoclave, benzyl acrylate (41 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 50%.
  • Example 2A The yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 40%.
  • Example 2A By the same procedure as in Example 2 except that molecular sieves 3A were not used, the yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 54%.
  • the yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 34%.
  • Example 2B (i) molecular sieves 4A (300 mg), (ii) molecular sieves 5A (300 mg), (iii) inactivated molecular sieves 4A (300 mg), (iv) Al2O3 instead of molecular sieves 3A (300 mg).
  • Example 3 A 20 mL autoclave was charged with benzyl acrylate (41 mg, 0.25 mmol), DMSO (2 mL), tetrabutylammonium fluoride in 1.0 M THF (0.25 mL, 0.25 mmol) at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 20%. The yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 5%.
  • Example 4 A 20 mL autoclave was charged with benzyl acrylate (41 mg, 0.25 mmol), 1,4-dioxane (2 mL), tetrabutylammonium fluoride in 1.0 M THF (0.25 mL, 0.25 mmol) at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 17%. The yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 1%.
  • N-benzyl-N-methylacrylamide 44 mg, 0.25 mmol
  • N,N-dimethylformamide (1 mL)
  • 1.0 M THF solution of tetrabutylammonium fluoride (0.25 mL, 0.25 mmol) were added to a 20 mL autoclave at room temperature. I put it in. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 15 hours.
  • Example 6A As in Example 6, except that tetrabutylammonium fluoride in 1.0 M THF (0.25 mL, 0.25 mmol) was used instead of tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol). The work-up gave a 9% yield of benzyl 4,5,5,5-tetrafluoro-2-methyl-4-(trifluoromethyl)pentanoate.
  • Example 8 In a 20 mL autoclave, cinnamate nitrile (32 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg ) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 4,5,5,5-tetrafluoro-3-phenyl-4-(trifluoromethyl)pentanenitrile was 8%.
  • Example 10 In a 20 mL autoclave, phenyl vinyl sulfoxide (38 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg). was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 20 hours. After 20 hours, the pressure was released and the autoclave was opened for analysis. The yield of ((3,4,4,4-tetrafluoro-3-(trifluoromethyl)butyl)sulfinyl)benzene was 23%.
  • Example 11 In a 20 mL autoclave, diethyl benzylidenemalonate (62 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg ) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of diethyl 2-(2,3,3,3-tetrafluoro-1-phenyl-2-(trifluoromethyl)propyl)malonate was 33%.
  • Example 12 In a 20 mL autoclave, diethyl vinylphosphonate (41 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg ) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of diethyl (3,4,4,4-tetrafluoro-3-(trifluoromethyl)butyl)phosphonate was 20%.
  • Example 13 A 20 mL autoclave was charged with benzyl acrylate (41 mg, 0.25 mmol), N,N-dimethylacetamide (2 mL), and tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 47%. The yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 39%.
  • Example 14 In a 20 mL autoclave, 2-phenylpropan-2-yl acrylate (47.5 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 2-phenylpropan-2-yl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 60%.
  • Example 14A The same procedure as in Example 14 was performed except that the amount of N,N-dimethylformamide was changed to 0.5 mL, 1 mL, and 5 mL. The yields were 23%, 48%, and 43%, respectively. rice field. [Example 14B] The yield was 50% by the same procedure as in Example 14, except that the reaction time was changed to 10 hours.
  • Example 15 In a 20 mL autoclave, 1-phenylethyl acrylate (44 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 4A. (300 mg) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 43%.
  • Example 15A The yield of di(1-phenylethyl) 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 40%.
  • Example 15A By the same procedure as in Example 15 except that molecular sieves 4A were not used, the yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 45%. and the yield of di(1-phenylethyl) 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 26%.
  • Example 16 In a 20 mL autoclave, 2-phenylpropan-2-yl acrylate (47.5 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) , molecular sieves 4A (300 mg) were added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 2-phenylpropan-2-yl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 78%.
  • Example 17 In a 20 mL autoclave, (3s,5s,7s)-adamantan-1-yl acrylate (51.5 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) and molecular sieves 4A (300 mg) were added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis.
  • Example 17A By the same procedure as in Example 17 except that molecular sieves 4A was not used, 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoic acid (3s,5s,7s)-adamantane- The yield of 1-yl was 26%, and 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate di((3s,5s,7s)-adamantane-1 -yl) was 6%.
  • Example 19 In a 20 mL autoclave, 2-phenylpropan-2-yl acrylate (47.5 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) , N,N-diisopropylethylamine (32.3 mg, 0.25 mmol), molecular sieves 4A (300 mg) were charged at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis.
  • Example 19A The yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 80%.
  • Example 19A By the same procedure as in Example 19 except that molecular sieves 4A were not used, the yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 37%. Met.
  • Example 19B By the same procedure as in Example 19 except that N,N-diisopropylethylamine (32.3 mg, 0.25 mmol) was changed to diazabicycloundecene (38.1 mg, 0.25 mmol), 4,5,5,5 The yield of 1-phenylethyl-tetrafluoro-4-(trifluoromethyl)pentanoate was 44%.
  • Example 19C By the same procedure as in Example 19, except that N,N-diisopropylethylamine (32.3 mg, 0.25 mmol) was changed to 1,8-bis(dimethylamino)naphthalene (53.6 mg, 0.25 mmol), 4, The yield of 1-phenylethyl 5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 86%.
  • Example 19D Same as Example 19 except N,N-diisopropylethylamine (32.3 mg, 0.25 mmol) was replaced with 1,8-bis(dimethylamino)naphthalene (53.6 mg, 0.25 mmol) and no molecular sieves 4A was used.
  • Example 19E The yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 56%.
  • Example 19E In the same manner as in Example 19, except that N,N-diisopropylethylamine (32.3 mg, 0.25 mmol) was changed to 1,4-diazabicyclo[2.2.2]octane (28.0 mg, 0.25 mmol), 4, The yield of 1-phenylethyl 5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 83%.
  • Example 20 In a 20 mL autoclave, methyl 2-(1,3-dioxoisoindolin-2-yl)acrylate (58 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride/4 water. Hydrate (41 mg, 0.25 mmol) and molecular sieves 4A (300 mg) were added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of methyl 2-(1,3-dioxoisoindolin-2-yl)-4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 63%.
  • Example 21A By the same procedure as in Example 20 except that molecular sieves 4A was not used, 2-(1,3-dioxoisoindolin-2-yl)-4,5,5,5-tetrafluoro-4- The yield of methyl (trifluoromethyl)pentanoate was 75%.

Abstract

Provided are a secondary monohydrofluoroalkane selective adduct and a method for producing the same. A compound represented by formula (3) is produced by means of a method including a step for reacting a compound represented by formula (1) with a compound represented by formula (2) in the presence of a base. (In the formulae, R1, R2 and R3 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group which may have at least one substituent, -ORA, -CORA, -COOQ1, -CONRBRC, -NRBRC, -NH-CORA or -NH-COORA; RA represents a hydrocarbon group which may have at least one substituent; RB and RC each independently represent a hydrogen atom or a hydrocarbon group which may have at least one substituent, or RB and RC may be bound to each other to form a ring in conjunction with a nitrogen atom adjacent thereto; EWG represents an electron withdrawing group; two arbitrary radicals among R1, R2, R3 and EWG may be bound to each other to form a ring; and R4 and R5 each independently represent a fluoroalkyl group which may have at least one substituent and may contain an oxygen atom between carbon atoms therein, or a fluoroalkoxy group which may have at least one substituent and may contain an oxygen atom between carbon atoms therein, and R4 and R5 may be bound to each other to form a ring.)

Description

第2級モノヒドロフルオロアルカン類の選択的付加体及びその製造方法Selective adduct of secondary monohydrofluoroalkanes and method for producing the same
 本開示は、第2級モノヒドロフルオロアルカン類の選択的付加体及びその製造方法に関する。 The present disclosure relates to selective adducts of secondary monohydrofluoroalkanes and methods for producing the same.
 フッ素官能基はミミック効果、ブロック効果、疎水性効果を有することから、医農薬品開発においてフッ素官能基の導入がよくなされている。ヘプタフルオロイソプロピル基((CF3)2CF基)等はより高い機能を有しており、例えば殺虫剤フルベンジアミドに用いることでCF3基よりも高い活性を示すことが知られている。 Since fluorine functional groups have mimic effects, blocking effects, and hydrophobic effects, fluorine functional groups are often introduced in the development of pharmaceuticals and agrochemicals. A heptafluoroisopropyl group ((CF 3 ) 2 CF group) and the like have higher functions, and are known to exhibit higher activity than the CF 3 group when used in the insecticide flubendiamide, for example.
 (CF3)2CF基等をエチレン性不飽和化合物(二重結合)に導入する方法としては、ラジカル付加反応を利用する方法が知られている。例えばAgF及びヘキサフルオロプロペン(HFP)から(CF3)2CFAgを調製することによりエチレン性不飽和化合物に(CF3)2CF基を導入している(非特許文献1)。 As a method for introducing a (CF 3 ) 2 CF group or the like into an ethylenically unsaturated compound (double bond), a method utilizing a radical addition reaction is known. For example, (CF 3 ) 2 CF groups are introduced into ethylenically unsaturated compounds by preparing (CF 3 ) 2 CFAg from AgF and hexafluoropropene (HFP) (Non-Patent Document 1).
 非特許文献1の方法は、AgFが高価であること、使用できる反応剤や基質が限定的であるという問題がある。(CF3)2CFAgではなく、第2級モノヒドロフルオロアルカン類をエチレン性不飽和化合物に付加、特に位置選択的に付加する方法については、これまで検討されていない。 The method of Non-Patent Document 1 has problems that AgF is expensive and usable reactants and substrates are limited. Methods for the addition, particularly regioselective addition, of secondary monohydrofluoroalkanes, rather than (CF 3 ) 2 CFAg, to ethylenically unsaturated compounds have not been investigated so far.
 本開示は、第2級モノヒロドロフルオロアルカン類の選択的付加体及びその製造方法を提供することを主な課題とする。 The main object of the present disclosure is to provide a selective adduct of secondary monohydrofluoroalkanes and a method for producing the same.
 本開示は、以下の態様を包含する。
項1.
下記式(3):
Figure JPOXMLDOC01-appb-C000010
(式中、
、R、及びRは、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
は、1個以上の置換基を有していてもよい炭化水素基であり、
及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であるか、R及びRは、互いに結合して隣接する窒素原子と共に環を形成していてもよく、
EWGは電子求引基であり、
、R、R、及びEWGのうち任意の2つは互いに結合して環を形成していてもよく、
及びRは、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、
及びRは互いに結合して環を形成していてもよい。)
で表される化合物の製造方法であって、
下記式(1):
Figure JPOXMLDOC01-appb-C000011
(式中、R、R、R、及びEWGは前記と同じである。)
で表される化合物と、下記式(2):
Figure JPOXMLDOC01-appb-C000012
(式中、R及びRは前記と同じである。)
で表される化合物とを、塩基の存在下で反応させる工程を含む製造方法。
項2.
前記塩基のpKaが10~20の範囲内である、項1に記載の製造方法。
項3.
前記塩基が第4級アンモニウム塩、MHF(ここで、MはNa、K、又はCsであり、pは原子価に対応する数である。)、及びMF(ここで、MはNa、K、又はCsである。)からなる群より選択される少なくとも一種を含む、項1又は2に記載の製造方法。
項4.
前記塩基が第4級アンモニウム塩を含む、項1~3のいずれか一項に記載の製造方法。
項5.
前記第4級アンモニウム塩が、テトラブチルアンモニウムフルオリド、テトラブチルアンモニウムヒドロキシド、テトラメチルアンモニウムフルオリド、及びテトラメチルアンモニウムヒドロキシドからなる群より選択される少なくとも一種である、項3又は4に記載の製造方法。
項6.
前記式(1)及び(3)において、
EWGは-COOR、-COR、-SO、-CONR、-PO(OR)(OR10)、又はシアノ基であり、
は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
及びR10は、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
nは1又は2である、
項1~5のいずれか一項に記載の製造方法。
項7.
前記式(1)及び(3)において、
、R、及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基である
項1~6のいずれか一項に記載の製造方法。
項8.
前記式(2)及び(3)において、
及びRは、それぞれ独立して、フルオロC1-10アルキル基、又はフルオロC1-10アルコキシ基である、
項1~7のいずれか一項に記載の製造方法。
項9.
前記式(2)で表される化合物が1,1,1,2,3,3,3-ヘプタフルオロプロパンである、項1~8のいずれか一項に記載の製造方法。
項10.
前記反応を溶媒中で実施する、項1~9のいずれか一項に記載の製造方法。
項11.
前記溶媒は、炭化水素系溶媒、エーテル系溶媒、アミド系溶媒、スルホキシド系溶媒、及びニトリル系溶媒からなる群より選択される少なくとも一種である、項10に記載の製造方法。
項12.
下記式(3A):
Figure JPOXMLDOC01-appb-C000013
[式中、
31は水素原子、又は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
61は1個以上の置換基を有していてもよいC1-12アルキル基、1個以上の置換基を有していてもよいシクロアルキル基、又は1個以上の置換基を有していてもよいアリール基である。(但し、R61が1個以上の置換基を有していてもよいCアルキル基である場合、当該Cアルキル基は分岐鎖状Cアルキル基である。)]
で表される化合物。
項13.
下記式(3B):
Figure JPOXMLDOC01-appb-C000014
[式中、
32は水素原子、又は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
71及びR81は、それぞれ独立して、1個以上の置換基を有していてもよいC1-12アルキル基、又は1個以上の置換基を有していてもよいアリール基である。(但し、R71及びR81は同時に1個以上の置換基を有していてもよいCアルキル基ではない。)]
で表される化合物。
項14.
下記式(4):
Figure JPOXMLDOC01-appb-C000015
(式中、
11、R12、及びR13は、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
は、1個以上の置換基を有していてもよい炭化水素基であり、
及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であるか、R及びRは、互いに結合して隣接する窒素原子と共に環を形成していてもよく、
16は電子求引基であり、
11、R12、R13、及びR16のうち任意の2つは互いに結合して環を形成していてもよく、
14及びR15は、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、R14及びR15は互いに結合して環を形成していてもよく、
mは2又は3である。)
で表される化合物。
項15.
下記式(3):
Figure JPOXMLDOC01-appb-C000016
(式中、
、R、及びRは、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
は、1個以上の置換基を有していてもよい炭化水素基であり、
及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であり、
EWGは電子求引基であり、
、R、R、及びEWGのうち任意の2つは互いに結合して環を形成していてもよく、
及びRは、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有してもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、
及びRは互いに結合して環を形成していてもよい。)
で表される化合物と、
下記式(4):
Figure JPOXMLDOC01-appb-C000017
(式中、
11、R12、及びR13は、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
は、1個以上の置換基を有していてもよい炭化水素基であり、
及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であるか、R及びRは、互いに結合して隣接する窒素原子と共に環を形成していてもよく、
16は電子求引基であり、
11、R12、R13、及びR16のうち任意の2つは互いに結合して環を形成していてもよく、
14及びR15は、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、R14及びR15は互いに結合して環を形成していてもよく、
mは2又は3である。)
で表される化合物とを含有する組成物。
項16.
前記式(3)で表される化合物100質量部に対して前記式(4)で表される化合物を0.0001~150質量部含有する、項15に記載の組成物。
項17.
前記式(3)で表される化合物100質量部に対して前記式(4)で表される化合物を0.0001~100質量部含有する、項15又は16に記載の組成物。
項18.
前記式(3)で表される化合物100質量部に対して前記式(4)で表される化合物を0.0001~50質量部含有する、項15~17のいずれか一項に記載の組成物。
項19.
下記式(5):
Figure JPOXMLDOC01-appb-C000018
(式中、
21、R22、及びR23は、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
は、1個以上の置換基を有していてもよい炭化水素基であり、
及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であるか、R及びRは、互いに結合して隣接する窒素原子と共に環を形成していてもよく、
21、R22、及びR23のうち任意の2つは互いに結合して環を形成していてもよく、
24及びR25は、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、R24及びR25は互いに結合して環を形成していてもよく、
26は-OR27又は-NR2829であり、
27は1個以上の置換基を有していてもよい炭化水素基であり、
28及びR29は、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基である。)
で表される化合物を含有しない、又は前記式(3)で表される化合物100質量部に対して前記式(5)で表される化合物を0質量部超50質量部以下含有する、項15~18のいずれか一項に記載の組成物。
The present disclosure includes the following aspects.
Section 1.
Formula (3) below:
Figure JPOXMLDOC01-appb-C000010
(In the formula,
R 1 , R 2 , and R 3 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
RA is a hydrocarbon group optionally having one or more substituents,
R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with
EWG is an electron withdrawing group,
Any two of R 1 , R 2 , R 3 , and EWG may combine with each other to form a ring,
R 4 and R 5 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents and a fluoroalkoxy group which may contain an oxygen atom between carbon atoms,
R 4 and R 5 may combine with each other to form a ring. )
A method for producing a compound represented by
Formula (1) below:
Figure JPOXMLDOC01-appb-C000011
(Wherein, R 1 , R 2 , R 3 , and EWG are the same as above.)
and a compound represented by the following formula (2):
Figure JPOXMLDOC01-appb-C000012
(In the formula, R 4 and R 5 are the same as above.)
A production method comprising the step of reacting a compound represented by in the presence of a base.
Section 2.
Item 2. The production method according to Item 1, wherein the pKa of the base is in the range of 10-20.
Item 3.
The base is a quaternary ammonium salt, MHF p (where M is Na, K, or Cs and p is a number corresponding to the valence), and MF (where M is Na, K , or Cs).
Section 4.
Item 4. The production method according to any one of Items 1 to 3, wherein the base comprises a quaternary ammonium salt.
Item 5.
Item 3 or 4, wherein the quaternary ammonium salt is at least one selected from the group consisting of tetrabutylammonium fluoride, tetrabutylammonium hydroxide, tetramethylammonium fluoride, and tetramethylammonium hydroxide. manufacturing method.
Item 6.
In the above formulas (1) and (3),
EWG is —COOR 6 , —COR 6 , —SO n R 6 , —CONR 7 R 8 , —PO(OR 9 )(OR 10 ), or a cyano group;
R 6 is a C 1-12 hydrocarbon group optionally having one or more substituents,
R 7 and R 8 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
R 9 and R 10 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
n is 1 or 2;
Item 6. The production method according to any one of Items 1 to 5.
Item 7.
In the above formulas (1) and (3),
Any one of items 1 to 6, wherein R 1 , R 2 and R 3 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents The manufacturing method described in .
Item 8.
In the above formulas (2) and (3),
R 4 and R 5 are each independently a fluoroC 1-10 alkyl group or a fluoroC 1-10 alkoxy group;
Item 8. The production method according to any one of Items 1 to 7.
Item 9.
Item 9. The production method according to any one of items 1 to 8, wherein the compound represented by formula (2) is 1,1,1,2,3,3,3-heptafluoropropane.
Item 10.
Item 10. The production method according to any one of Items 1 to 9, wherein the reaction is carried out in a solvent.
Item 11.
Item 11. The production method according to Item 10, wherein the solvent is at least one selected from the group consisting of hydrocarbon solvents, ether solvents, amide solvents, sulfoxide solvents, and nitrile solvents.
Item 12.
Formula (3A) below:
Figure JPOXMLDOC01-appb-C000013
[In the formula,
R 31 is a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
R 61 is a C 1-12 alkyl group optionally having one or more substituents, a cycloalkyl group optionally having one or more substituents, or having one or more substituents is an aryl group that may be (However, when R61 is a C4 alkyl group optionally having one or more substituents, the C4 alkyl group is a branched C4 alkyl group.)]
A compound represented by
Item 13.
The following formula (3B):
Figure JPOXMLDOC01-appb-C000014
[In the formula,
R 32 is a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
R 71 and R 81 are each independently a C 1-12 alkyl group optionally having one or more substituents, or an aryl group optionally having one or more substituents . (However, R 71 and R 81 are not C2 alkyl groups optionally having one or more substituents at the same time.)]
A compound represented by
Item 14.
Formula (4) below:
Figure JPOXMLDOC01-appb-C000015
(In the formula,
R 11 , R 12 and R 13 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
RA is a hydrocarbon group optionally having one or more substituents,
R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with
R 16 is an electron withdrawing group,
Any two of R 11 , R 12 , R 13 and R 16 may be bonded to each other to form a ring,
R 14 and R 15 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may contain an oxygen atom between the carbon atoms, and R 14 and R 15 may be bonded to each other to form a ring,
m is 2 or 3; )
A compound represented by
Item 15.
Formula (3) below:
Figure JPOXMLDOC01-appb-C000016
(In the formula,
R 1 , R 2 , and R 3 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
RA is a hydrocarbon group optionally having one or more substituents,
R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents,
EWG is an electron withdrawing group,
Any two of R 1 , R 2 , R 3 , and EWG may combine with each other to form a ring,
R 4 and R 5 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents and a fluoroalkoxy group optionally containing an oxygen atom between carbon atoms,
R 4 and R 5 may combine with each other to form a ring. )
A compound represented by
Formula (4) below:
Figure JPOXMLDOC01-appb-C000017
(In the formula,
R 11 , R 12 and R 13 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
RA is a hydrocarbon group optionally having one or more substituents,
R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with
R 16 is an electron withdrawing group,
Any two of R 11 , R 12 , R 13 and R 16 may be bonded to each other to form a ring,
R 14 and R 15 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may contain an oxygen atom between the carbon atoms, and R 14 and R 15 may be bonded to each other to form a ring,
m is 2 or 3; )
A composition containing a compound represented by
Item 16.
Item 16. The composition according to Item 15, containing 0.0001 to 150 parts by mass of the compound represented by Formula (4) per 100 parts by mass of the compound represented by Formula (3).
Item 17.
17. The composition according to Item 15 or 16, containing 0.0001 to 100 parts by mass of the compound represented by Formula (4) per 100 parts by mass of the compound represented by Formula (3).
Item 18.
Item 18. The composition according to any one of items 15 to 17, containing 0.0001 to 50 parts by mass of the compound represented by the formula (4) with respect to 100 parts by mass of the compound represented by the formula (3). thing.
Item 19.
Formula (5) below:
Figure JPOXMLDOC01-appb-C000018
(In the formula,
R 21 , R 22 and R 23 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
RA is a hydrocarbon group optionally having one or more substituents,
R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with
Any two of R 21 , R 22 , and R 23 may combine with each other to form a ring,
R 24 and R 25 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may contain an oxygen atom between the carbon atoms, and R 24 and R 25 may be bonded to each other to form a ring,
R 26 is —OR 27 or —NR 28 R 29 ;
R 27 is a hydrocarbon group optionally having one or more substituents,
R 28 and R 29 are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents. )
Item 15 that does not contain the compound represented by or contains more than 0 parts by mass and 50 parts by mass or less of the compound represented by the formula (5) with respect to 100 parts by mass of the compound represented by the formula (3) 19. The composition of any one of claims 1-18.
 本開示により、第2級モノヒロドロフルオロアルカン類の選択的付加体及びその製造方法が提供される。 The present disclosure provides selective adducts of secondary monohydrofluoroalkanes and methods for producing the same.
 本明細書で引用した全ての刊行物、特許及び特許出願はそのまま引用により本明細書に組み入れられる。 All publications, patents and patent applications cited herein are hereby incorporated by reference as is.
<用語>
 本明細書中の記号及び略号は、特に限定のない限り、本明細書の文脈に沿い、本開示が属する技術分野において通常用いられる意味に理解できる。
<Term>
Unless otherwise specified, the symbols and abbreviations in this specification can be understood in accordance with the context of this specification and have meanings commonly used in the technical field to which this disclosure belongs.
 本明細書中、語句「含有する」は、語句「から本質的になる」、及び語句「からなる」を包含することを意図して用いられる。 In this specification, the phrase "contains" is intended to include the phrase "consisting essentially of" and the phrase "consisting of".
 本明細書中に記載されている工程、処理、又は操作は、特に断りのない限り、室温で実施され得る。 Any step, treatment, or operation described herein may be performed at room temperature unless otherwise specified.
 本明細書中、室温は、10~40℃の範囲内の温度を意味することができる。 In this specification, room temperature can mean a temperature within the range of 10-40°C.
 本明細書中、表記「Cn-m」(ここで、n及びmは、それぞれ、正の整数であり、n<mである。)は、当業者が通常理解する通り、炭素数がn以上且つm以下であることを表す。 In the present specification, the notation “C nm ” (where n and m are each positive integers and n<m) means that the number of carbon atoms is n, as is commonly understood by those skilled in the art. It is equal to or greater than m and equal to or less than m.
 本明細書中、「炭化水素基」は、飽和炭化水素基及び不飽和炭化水素基の双方を包含する概念である。「炭化水素基」としては、例えば、アルキル基、アルケニル基、アルキニル基、シクロアルキル基、シクロアルケニル基、シクロアルカジエニル基、アリール基、及びアラルキル基が挙げられる。 As used herein, the term "hydrocarbon group" is a concept that includes both saturated hydrocarbon groups and unsaturated hydrocarbon groups. Examples of "hydrocarbon groups" include alkyl groups, alkenyl groups, alkynyl groups, cycloalkyl groups, cycloalkenyl groups, cycloalkadienyl groups, aryl groups, and aralkyl groups.
 本明細書中、「アルキル基」としては、例えば、メチル基、エチル基、プロピル基(n-プロピル基、イソプロピル基)、ブチル基(n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基)、ペンチル基、及びヘキシル基等の、直鎖又は分岐鎖状のC1-20アルキル基等が挙げられる。 As used herein, the "alkyl group" includes, for example, methyl group, ethyl group, propyl group (n-propyl group, isopropyl group), butyl group (n-butyl group, isobutyl group, sec-butyl group, tert- butyl group), pentyl group, and hexyl group, straight or branched C 1-20 alkyl groups, and the like.
 本明細書中、「アルケニル基」としては、例えば、ビニル基、1-プロペン-1-イル基、2-プロペン-1-イル基、イソプロペニル基、2-ブテン-1-イル基、4-ペンテン-1-イル基、及び5-ヘキセン-1-イル基等の、直鎖状又は分岐鎖状のC2-20アルケニル基等が挙げられる。 As used herein, the "alkenyl group" includes, for example, vinyl group, 1-propen-1-yl group, 2-propen-1-yl group, isopropenyl group, 2-buten-1-yl group, 4- Linear or branched C 2-20 alkenyl groups such as penten-1-yl group and 5-hexen-1-yl group are included.
 本明細書中、「アルキニル基」としては、例えば、エチニル基、1-プロピン-1-イル基、2-プロピン-1-イル基、4-ペンチン-1-イル基、及び5-ヘキシン-1-イル基等の、直鎖状又は分岐鎖状のC2-20アルキニル基等が挙げられる。 As used herein, the "alkynyl group" includes, for example, ethynyl group, 1-propyn-1-yl group, 2-propyn-1-yl group, 4-pentyn-1-yl group, and 5-hexyne-1 and straight or branched chain C 2-20 alkynyl groups such as -yl groups.
 本明細書中、「シクロアルキル基」としては、例えば、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、アダマンチル基等の、C3-10シクロアルキル基等が挙げられる。 As used herein, the “cycloalkyl group” includes, for example, C 3-10 cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl and adamantyl groups.
 本明細書中、「シクロアルケニル基」としては、例えば、シクロプロペニル基、シクロブテニル基、シクロペンテニル基、シクロヘキセニル基、及びシクロヘプテニル基等の、C3-10シクロアルケニル基等が挙げられる。 As used herein, the “cycloalkenyl group” includes, for example, C 3-10 cycloalkenyl groups such as cyclopropenyl group, cyclobutenyl group, cyclopentenyl group, cyclohexenyl group, and cycloheptenyl group.
 本明細書中、「シクロアルカジエニル基」としては、例えば、シクロブタジエニル基、シクロペンタジエニル基、シクロヘキサジエニル基、シクロヘプタジエニル基、シクロオクタジエニル基、シクロノナジエニル基、及びシクロデカジエニル基等の、C4-10シクロアルカジエニル基が挙げられる。 As used herein, the "cycloalkadienyl group" includes, for example, a cyclobutadienyl group, a cyclopentadienyl group, a cyclohexadienyl group, a cycloheptadienyl group, a cyclooctadienyl group, and a cyclononadienyl group. and C 4-10 cycloalkadienyl groups such as cyclodecadienyl groups.
 本明細書中、「アリール基」は、例えば、単環性、2環性、3環性、又は4環性であることができる。「アリール基」としては、例えば、フェニル基、1-ナフチル基、2-ナフチル基、2-ビフェニル基、3-ビフェニル基、4-ビフェニル基、及び2-アンスリル基等の、C6-18アリール基等が挙げられる。 As used herein, an "aryl group" can be, for example, monocyclic, bicyclic, tricyclic, or tetracyclic. The “aryl group” includes, for example, C 6-18 aryl groups such as phenyl group, 1-naphthyl group, 2-naphthyl group, 2-biphenyl group, 3-biphenyl group, 4-biphenyl group and 2-anthryl group. and the like.
 本明細書中、「アラルキル基」としては、例えば、ベンジル基、フェネチル基、ジフェニルメチル基、1-ナフチルメチル基、2-ナフチルメチル基、2,2-ジフェニルエチル基、3-フェニルプロピル基、4-フェニルブチル基、5-フェニルペンチル基、2-ビフェニルメチル基、3-ビフェニルメチル基、及び4-ビフェニルメチル基等の、C7-19アリール基等が挙げられる。 As used herein, the "aralkyl group" includes, for example, a benzyl group, a phenethyl group, a diphenylmethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 2,2-diphenylethyl group, a 3-phenylpropyl group, and C 7-19 aryl groups such as 4-phenylbutyl, 5-phenylpentyl, 2-biphenylmethyl, 3-biphenylmethyl, and 4-biphenylmethyl groups.
 本明細書中、「1個以上の置換基を有していてもよい炭化水素基」の置換基としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシル基、メルカプト基、アミノ基、ニトロ基、シアノ基等が挙げられる。置換基の数は、例えば1個以上置換可能な最大数以下(例えば、2個、3個、4個、又は5個)である。「1個以上の置換基を有していてもよい炭化水素基」としては、例えば、ハロアルキル基、ヒドロキシアルキル基等が挙げられる。「ハロアルキル基」としては、例えば、前記「アルキル基」に1個以上のハロゲン原子が置換されたものであることができる。「ヒドロキシアルキル基」としては、例えば、前記「アルキル基」に1個以上のヒドロキシル基が置換されたものであることができる。 In the present specification, the substituents of the "hydrocarbon group optionally having one or more substituents" include, for example, halogen atoms such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, a hydroxyl group, mercapto group, amino group, nitro group, cyano group and the like. The number of substituents is, for example, one or more and the maximum substitutable number or less (eg, 2, 3, 4, or 5). Examples of the "hydrocarbon group optionally having one or more substituents" include haloalkyl groups, hydroxyalkyl groups and the like. The "haloalkyl group" may be, for example, the above "alkyl group" substituted with one or more halogen atoms. The "hydroxyalkyl group" may be, for example, the above "alkyl group" substituted with one or more hydroxyl groups.
 本明細書中、「フルオロアルキル基」は、非パーフルオロアルキル基及びパーフルオロアルキル基の双方を包含する概念である。「フルオロアルキル基」としては、例えば、前記「アルキル基」に1個以上のフッ素原子が置換されたものであることができる。「炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基」としては、例えば、
CF-、
CH-CF-、
CHF-CH-、
CF-CH-、
CF-CF-、
CF-CF-CH-、
CF-CF-CF-、
(CF)CF-、
CF-O-CF-、
CF-O-CF(CF)-、
CF-CF-CF-CF-、
CF-CF-CF(CF)-CF-、
CF-O-CH-CH-、
CF-O-CH(CF)-CH-、
CF-O-CF-CF-、
(CFCF)(CF)CF-、
(CF)C-、
CF-CF-O-CF-、
CF-CF-CF-CF-CF-、
CF-CF-O-CF-CF-、
CF-O-CF-O-CF-、
CF-CF-CF-CF-CF-CF-、
CF-CF-CF-O-CH-CF-、
CF-CF-CF-O-CF-CF-、
CF-CF-CF-CF-CF-CF-CF-、
CF-CF-CF-CF-CF-CF-CF-CF-、
CHF-CF-CF-CF-CF-CF-CF-CH-、
CF-CF(CF)-CF-、
CF-CF-CF(CF)-、
CF-CF-CF-O-CF(CF)-CF-、
CF-CF-CF-O-CF(CF)-CF-O-CF(CF)-CF-、及び
CF-CF-CF-O-[CF(CF)-CF-O-]-CF(CF)-CF
等の、直鎖状又は分岐鎖状の、フルオロC1-10アルキル基、フルオロC1-4アルコキシフルオロC1-4アルキル基、フルオロC1-4アルコキシフルオロC1-4アルコキシフルオロC1-4アルキル基等が挙げられる。「1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基」は、前記「炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基」に1個以上(1個以上置換可能な最大数以下、例えば、1個、2個、3個、4個、又は5個)の置換基(例えば、ヒドロキシル基、メルカプト基、アミノ基、ニトロ基、及びシアノ基から選択される少なくとも一種等)が置換されたものを包含する。
As used herein, the term "fluoroalkyl group" is a concept that includes both non-perfluoroalkyl groups and perfluoroalkyl groups. The "fluoroalkyl group" may be, for example, the above "alkyl group" substituted with one or more fluorine atoms. As the "fluoroalkyl group optionally containing an oxygen atom between carbon atoms", for example,
CF3- ,
CH 3 —CF 2 —,
CHF 2 -CH 2 -,
CF 3 —CH 2 —,
CF 3 -CF 2 -,
CF 3 —CF 2 —CH 2 —,
CF 3 -CF 2 -CF 2 -,
(CF 3 ) 2 CF-,
CF 3 —O—CF 2 —,
CF 3 —O—CF(CF 3 )—,
CF 3 -CF 2 -CF 2 -CF 2 -,
CF 3 -CF 2 -CF(CF 3 )-CF 2 -,
CF 3 —O—CH 2 —CH 2 —,
CF 3 —O—CH(CF 3 )—CH 2 —,
CF 3 -O-CF 2 -CF 2 -,
(CF 3 CF 2 )(CF 2 )CF-,
(CF 3 ) 3 C-,
CF 3 -CF 2 -O-CF 2 -,
CF 3 -CF 2 -CF 2 -CF 2 -CF 2 -,
CF 3 -CF 2 -O-CF 2 -CF 2 -,
CF 3 —O—CF 2 —O—CF 2 —,
CF 3 -CF 2 -CF 2 -CF 2 -CF 2 -CF 2 -,
CF 3 -CF 2 -CF 2 -O-CH 2 -CF 2 -,
CF 3 -CF 2 -CF 2 -O-CF 2 -CF 2 -,
CF 3 -CF 2 -CF 2 -CF 2 -CF 2 -CF 2 -CF 2 -,
CF 3 -CF 2 -CF 2 -CF 2 -CF 2 -CF 2 -CF 2 -CF 2 -,
CHF2 - CF2 - CF2 - CF2 - CF2 - CF2 - CF2 - CH2- ,
CF 3 -CF(CF 3 )-CF 2 -,
CF 3 -CF 2 -CF(CF 3 )-,
CF 3 -CF 2 -CF 2 -O-CF(CF 3 )-CF 2 -,
CF 3 -CF 2 -CF 2 -O-CF(CF 3 )-CF 2 -O-CF(CF 3 )-CF 2 - and CF 3 -CF 2 -CF 2 -O-[CF(CF 3 ) -CF 2 -O-] 2 -CF(CF 3 )-CF 2 -
Linear or branched fluoroC 1-10 alkyl groups, fluoroC 1-4 alkoxyfluoroC 1-4 alkyl groups, fluoroC 1-4 alkoxyfluoroC 1-4 alkoxyfluoroC 1- 4- alkyl group and the like. "A fluoroalkyl group which may have one or more substituents and which may contain an oxygen atom between carbon atoms" means the above "fluoroalkyl group which may contain an oxygen atom between carbon atoms" ” has one or more substituents (e.g., hydroxyl group, mercapto group, amino group, nitro and at least one selected from a cyano group, etc.).
 本明細書中、「フルオロアルコキシ基」は、非パーフルオロアルコキシ基及びパーフルオロアルコキシ基の双方を包含する概念である。「炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基」としては、例えば、
CF-O-、
CF-CH-O-、
CF-CF-O-、
CF-CF-CF-O-、
CF-CF-CF-CF-O-、
CF-O-CF-O-、
CF-O-CF-CF-CF-O-、
CF-O-CH-CF-CF-O-
CF-CF-O-CF-CF-O-、
CF-CF-CF-O-CH-CF-CF-O-、
CF-CF-CF-O-CF-CF-CF-O-、
CF-CF(CF)-O-、
CF-CF-CF(CF)-O-、
CF-CF(CF)-CF(CF)-O-、
CF-CF-CF-O-CF(CF)-CF-O-、
CF-CF-CF-O-[CF(CF)-CF-O-]-O-、及び
CF-CF-CF-O-[CF(CF)-CF-O-]-O-
等の、直鎖状又は分岐鎖状の、フルオロC1-10アルコキシ基、フルオロC1-4アルコキシフルオロC1-4アルコキシ基が挙げられる。「1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基」は、前記「炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基」に1個以上(1個以上置換可能な最大数以下、例えば、1個、2個、3個、4個、又は5個)の置換基(例えば、ヒドロキシル基、メルカプト基、アミノ基、ニトロ基、及びシアノ基から選択される少なくとも一種等)が置換されたものを包含する。
As used herein, the term "fluoroalkoxy group" is a concept that includes both non-perfluoroalkoxy groups and perfluoroalkoxy groups. As the "fluoroalkoxy group optionally containing an oxygen atom between carbon atoms", for example,
CF 3 —O—,
CF 3 —CH 2 —O—,
CF 3 -CF 2 -O-,
CF 3 -CF 2 -CF 2 -O-,
CF 3 -CF 2 -CF 2 -CF 2 -O-,
CF 3 —O—CF 2 —O—,
CF 3 -O-CF 2 -CF 2 -CF 2 -O-,
CF 3 —O—CH 2 —CF 2 —CF 2 —O—
CF 3 -CF 2 -O-CF 2 -CF 2 -O-,
CF3 - CF2 - CF2 -O- CH2 - CF2 - CF2 -O-,
CF 3 -CF 2 -CF 2 -O-CF 2 -CF 2 -CF 2 -O-,
CF 3 -CF(CF 3 )-O-,
CF 3 -CF 2 -CF(CF 3 )-O-,
CF 3 -CF(CF 3 )-CF(CF 3 )-O-,
CF 3 -CF 2 -CF 2 -O-CF(CF 3 )-CF 2 -O-,
CF 3 -CF 2 -CF 2 -O-[CF(CF 3 )-CF 2 -O-] 2 -O- and CF 3 -CF 2 -CF 2 -O-[CF(CF 3 )-CF 2 -O-] 3 -O-
Linear or branched fluoro-C 1-10 alkoxy groups, fluoro-C 1-4 alkoxyfluoro-C 1-4 alkoxy groups, such as. "A fluoroalkoxy group which may have one or more substituents and which may contain an oxygen atom between carbon atoms" refers to the above "a fluoroalkoxy group which may contain an oxygen atom between carbon atoms" ” has one or more substituents (e.g., hydroxyl group, mercapto group, amino group, nitro and at least one selected from a cyano group, etc.).
 本明細書において、「電子求引基」とは、ハメットの置換基定数σp値が正である官能基をいう。σp値の定義、及び、各官能基のσp値は、例えば、Hansch, C et al., Chem. Rev., 91, pp. 165-195 (1991) 等を参照することができる。「電子求引基」としては、例えば、
-COR、
-COOR、
-COSR、
-CONH
-CONHR、
-CON(R)
-CSR、
-CSOR、
-CSNH
-CSNHR、
-CSN(R)
-CN(シアノ基)、
-SOR、
-SOR、及び
-PO(OR)
等が挙げられる。
 ここで、Rは独立して1個以上の置換基を有していてもよい炭化水素基である。当該炭化水素基に任意に置換し得る置換基は、電子求引基であることが好ましく、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ニトロ基、シアノ基、-COH、-COR、-COOH、-COOR等が挙げられる。置換基の数は、例えば1個以上置換可能な最大数以下(例えば、2個、3個、4個、又は5個)である。
As used herein, the term “electron-withdrawing group” refers to a functional group having a positive Hammett's substituent constant σp value. The definition of the σp value and the σp value of each functional group can be referred to, for example, Hansch, C et al., Chem. Rev., 91, pp. 165-195 (1991). As the "electron-withdrawing group", for example,
-COR,
-COOR,
-COSR,
-CONH2 ,
-CONHR,
-CON(R) 2 ,
-CSR,
—CSOR,
-CSNH2 ,
—CSNHR,
-CSN(R) 2 ,
-CN (cyano group),
-SOR,
—SO 2 R, and —PO(OR) 2
etc.
Here, R is a hydrocarbon group which may independently have one or more substituents. The substituent that can optionally be substituted on the hydrocarbon group is preferably an electron-withdrawing group. , -COR, -COOH, -COOR and the like. The number of substituents is, for example, one or more and the maximum substitutable number or less (eg, 2, 3, 4, or 5).
<式(3)で表される化合物の製造方法>
 式(3)で表される化合物の製造方法は、式(1)で表される化合物と、式(2)で表される化合物とを、塩基の存在下で反応させる工程(以下、「工程A」という。)を含む。
<Method for Producing Compound Represented by Formula (3)>
A method for producing a compound represented by formula (3) includes a step of reacting a compound represented by formula (1) with a compound represented by formula (2) in the presence of a base (hereinafter referred to as "step A”).
式(1)で表される化合物
 R、R、及びRは、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORである。
 一実施形態において、R、R、及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であることが好ましく、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基であることがより好ましい。
 別の実施形態において、R、R、及びRは、それぞれ独立して、
水素原子、1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいシクロアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基であることが好ましく、
水素原子、1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基であることがより好ましく、
水素原子、1個以上の置換基を有していてもよいアルキル基、又は1個以上の置換基を有していてもよいアリール基であることが更に好ましく、
水素原子、1個以上の置換基を有していてもよいC1-12アルキル基、又は1個以上の置換基を有していてもよいC6-12アリール基であることが特に好ましい。
Compounds R 1 , R 2 and R 3 represented by formula (1) each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, or a hydrocarbon group optionally having one or more substituents. , -OR A , -COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A .
In one embodiment, R 1 , R 2 , and R 3 are each independently preferably a hydrogen atom or a hydrocarbon group optionally having one or more substituents. It is more preferably a C 1-12 hydrocarbon group optionally having one or more substituents.
In another embodiment, R 1 , R 2 , and R 3 are each independently
hydrogen atom, alkyl group optionally having one or more substituents, cycloalkyl group optionally having one or more substituents, aryl optionally having one or more substituents or an aralkyl group optionally having one or more substituents,
A hydrogen atom, an alkyl group optionally having one or more substituents, an aryl group optionally having one or more substituents, or an aralkyl optionally having one or more substituents more preferably a group,
It is more preferably a hydrogen atom, an alkyl group optionally having one or more substituents, or an aryl group optionally having one or more substituents,
A hydrogen atom, a C 1-12 alkyl group optionally having one or more substituents, or a C 6-12 aryl group optionally having one or more substituents is particularly preferred.
 R、R、及びRの好適な組合せとしては、例えば、
(a)R及びRが水素原子であり、Rが1個以上の置換基を有していてもよい炭化水素基である組合せ、
(b)R及びRが水素原子であり、Rが1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基である組合せ、
(c)R及びRが水素原子であり、Rが1個以上の置換基を有していてもよいアルキル基又は1個以上の置換基を有していてもよいアリール基である組合せ、
(d)R及びRの一方が水素原子であり、他方がヒドロキシル基を有していてもよい炭化水素基、-OR、-COOR、-NR、-NH-COR、又は-NH-COORであり、Rが水素原子である組合せ、
(e)R及びRの一方が水素原子であり、他方が1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいアリール基、1個以上の置換基を有していてもよいアラルキル基、1個以上の置換基を有していてもよいヒドロキシアルキル基、-OR、-COOR、-NR、-NH-COR、又は-NH-COORであり、Rが水素原子である組合せ、
(f)R及びRの一方が水素原子であり、他方が1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいアリール基、1個以上の置換基を有していてもよいヒドロキシアルキル基、-OR、-COOR、-NR、-NH-COR、又は-NH-COORであり、Rが水素原子である組合せ、
(g)R、R、及びRが水素原子である組合せ
等が挙げられる。
Suitable combinations of R 1 , R 2 and R 3 include, for example,
(a) a combination in which R 1 and R 2 are hydrogen atoms and R 3 is a hydrocarbon group optionally having one or more substituents;
(b) R 1 and R 2 are hydrogen atoms, and R 3 is an alkyl group optionally having one or more substituents, an aryl group optionally having one or more substituents, or a combination that is an aralkyl group optionally having one or more substituents,
(c) R 1 and R 2 are hydrogen atoms, and R 3 is an alkyl group optionally having one or more substituents or an aryl group optionally having one or more substituents combination,
(d) one of R 1 and R 2 is a hydrogen atom and the other is a hydrocarbon group optionally having a hydroxyl group, -OR A , -COOR A , -NR B R C , -NH-COR A , or a combination of —NH—COOR A and R 3 is a hydrogen atom,
(e) one of R 1 and R 2 is a hydrogen atom and the other is an alkyl group optionally having one or more substituents, an aryl group optionally having one or more substituents, aralkyl group optionally having one or more substituents, hydroxyalkyl group optionally having one or more substituents, -OR A , -COOR A , -NR B R C , -NH- COR A , or a combination of —NH—COOR A and R 3 is a hydrogen atom;
(f) one of R 1 and R 2 is a hydrogen atom and the other is an alkyl group optionally having one or more substituents, an aryl group optionally having one or more substituents, a hydroxyalkyl group optionally having one or more substituents, -OR A , -COOR A , -NR B R C , -NH-COR A , or -NH-COOR A , and R 3 is hydrogen combinations that are atoms,
(g) Combinations in which R 1 , R 2 and R 3 are hydrogen atoms, and the like.
 Rは、1個以上の置換基を有していてもよい炭化水素基(例:C1-12炭化水素基)であり、好ましくは1個以上の置換基を有していてもよいアルキル基(例:C1-12アルキル基)、1個以上の置換基を有していてもよいアリール基(例:C6-12アリール基)、又は1個以上の置換基を有していてもよいアラルキル基(例:C7-12アラルキル基)である。 R A is a hydrocarbon group optionally having one or more substituents (eg, C 1-12 hydrocarbon group), preferably alkyl optionally having one or more substituents group (eg, C 1-12 alkyl group), aryl group optionally having one or more substituents (eg, C 6-12 aryl group), or having one or more substituents aralkyl group (eg, C 7-12 aralkyl group).
 R及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基(例:C1-12炭化水素基)であり、好ましくは水素原子、1個以上の置換基を有していてもよいアルキル基(例:C1-12アルキル基)、1個以上の置換基を有していてもよいアリール基(例:C6-12アリール基)、又は1個以上の置換基を有していてもよいアラルキル基(例:C7-12アラルキル基)である。R及びRは、互いに結合して隣接する窒素原子と共に環を形成していてもよい。当該環としては、例えば、ピロール、ピペリジン、1,3-ジオキソイソインドリン等が挙げられる。 R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents (eg, a C 1-12 hydrocarbon group), preferably a hydrogen atom, Alkyl groups optionally having one or more substituents (eg C 1-12 alkyl groups), aryl groups optionally having one or more substituents (eg C 6-12 aryl groups ), or an aralkyl group optionally having one or more substituents (eg, a C 7-12 aralkyl group). R B and R C may combine with each other to form a ring together with the adjacent nitrogen atoms. Examples of the ring include pyrrole, piperidine, 1,3-dioxoisoindoline and the like.
 EWGは電子求引基である。EWGは、-COOR、-COR、-SO、-CONR、-PO(OR)(OR10)、又はシアノ基であることが好ましく、-COOR、-CONR、-SO、-PO(OR)(OR10)、又はシアノ基であることがより好ましく、-COOR、-CONR、又はシアノ基であることが更に好ましい。このようなEWGを有する式(1)で表される化合物に対して、式(2)で表される化合物の1,4-付加反応を選択的に進行させることができ、1,2-付加反応を部分的又は完全に抑制することができる。 EWG is an electron withdrawing group. EWG is preferably —COOR 6 , —COR 6 , —SO n R 6 , —CONR 7 R 8 , —PO(OR 9 )(OR 10 ), or a cyano group, and —COOR 6 , —CONR 7 R 8 , —SO n R 6 , —PO(OR 9 )(OR 10 ), or a cyano group is more preferred, and —COOR 6 , —CONR 7 R 8 , or a cyano group is even more preferred. The 1,4-addition reaction of the compound represented by the formula (2) can be selectively allowed to proceed with respect to the compound represented by the formula (1) having such an EWG, and the 1,2-addition The reaction can be partially or completely inhibited.
 一実施形態において、Rは1個以上の置換基を有していてもよいC1-12炭化水素基であることが好ましい。
 別の実施形態において、Rは1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいシクロアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基であることが好ましい。
 更に別の実施形態において、Rは1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基であることがより好ましく、1個以上の置換基を有していてもよいC1-12アルキル基、1個以上の置換基を有していてもよいC6-12アリール基、又は1個以上の置換基を有していてもよいC7-12アラルキル基であることが更に好ましい。
In one embodiment, R 6 is preferably a C 1-12 hydrocarbon group optionally having one or more substituents.
In another embodiment, R 6 is an alkyl group optionally having one or more substituents, a cycloalkyl group optionally having one or more substituents, It is preferably an aryl group which may have one or more substituents, or an aralkyl group which may have one or more substituents.
In yet another embodiment, R 6 is an alkyl group optionally having one or more substituents, an aryl group optionally having one or more substituents, or one or more substituents It is more preferably an aralkyl group optionally having one or more substituents, a C 1-12 alkyl group optionally having one or more substituents, a C 6 optionally having one or more substituents -12 aryl group or C 7-12 aralkyl group optionally having one or more substituents is more preferable.
 一実施形態において、R及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基であることが好ましい。
 別の実施形態において、R及びRは、それぞれ独立して、水素原子、1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいシクロアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基であることが好ましく、水素原子、1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基であることがより好ましく、水素原子、1個以上の置換基を有していてもよいC1-12アルキル基、1個以上の置換基を有していてもよいC6-12アリール基、又は1個以上の置換基を有していてもよいC7-12アラルキル基であることが更に好ましい。
In one embodiment, R 7 and R 8 are each independently preferably a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents.
In another embodiment, R 7 and R 8 are each independently a hydrogen atom, an alkyl group optionally having one or more substituents, optionally having one or more substituents A cycloalkyl group, an aryl group optionally having one or more substituents, or an aralkyl group optionally having one or more substituents is preferable, and a hydrogen atom, one or more substituents more preferably an alkyl group optionally having a group, an aryl group optionally having one or more substituents, or an aralkyl group optionally having one or more substituents, hydrogen atom, C 1-12 alkyl group optionally having one or more substituents, C 6-12 aryl group optionally having one or more substituents, or one or more substituents It is more preferably a C 7-12 aralkyl group optionally having
 一実施形態において、R及びR10は、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基であることが好ましい。
 別の実施形態において、R及びR10は、それぞれ独立して、水素原子、1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいシクロアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基であることが好ましく、水素原子、1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基であることがより好ましく、水素原子、1個以上の置換基を有していてもよいC1-12アルキル基、1個以上の置換基を有していてもよいC6-12アリール基、又は1個以上の置換基を有していてもよいC7-12アラルキル基であることが更に好ましい。
In one embodiment, R 9 and R 10 are each independently preferably a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents.
In another embodiment, R 9 and R 10 are each independently a hydrogen atom, an alkyl group optionally having one or more substituents, optionally having one or more substituents A cycloalkyl group, an aryl group optionally having one or more substituents, or an aralkyl group optionally having one or more substituents is preferable, and a hydrogen atom, one or more substituents more preferably an alkyl group optionally having a group, an aryl group optionally having one or more substituents, or an aralkyl group optionally having one or more substituents, hydrogen atom, C 1-12 alkyl group optionally having one or more substituents, C 6-12 aryl group optionally having one or more substituents, or one or more substituents It is more preferably a C 7-12 aralkyl group optionally having
 R、R、R、及びEWGのうち任意の2つ、例えば、R(又はR)及びEWGは、互いに結合して環を形成していてもよい。例えば、式(1)で表される化合物は、R(又はR)及びEWGが互いに結合して環を形成し、下記式(1-1)~(1-5)のいずれかで表される化合物であってもよい。
Figure JPOXMLDOC01-appb-C000019
Any two of R 1 , R 2 , R 3 , and EWG, for example, R 1 (or R 2 ) and EWG, may combine with each other to form a ring. For example, the compound represented by formula (1) has R 1 (or R 2 ) and EWG bound together to form a ring, represented by any of the following formulas (1-1) to (1-5). It may be a compound that is
Figure JPOXMLDOC01-appb-C000019
 式(1)で表される化合物は、下記式(1-6)~(1-15)のいずれかで表される化合物であることが好ましい。
Figure JPOXMLDOC01-appb-C000020
(式中、
33、R34、R35、R36、及びR37は、水素原子、ハロゲン原子、アルキル基、又はフルオロアルキル基(好ましくはトリフルオロメチル基)であり、
62、R63、R64、R65、R66、R67、R68、R、R、R、R、及びRは、アルキル基、シクロアルキル基、アリール基、又はアラルキル基であり、R72及びR82は、それぞれ独立して、水素原子、アルキル基、アリール基、又はアラルキル基であり、
91及びR101は、それぞれ独立して、水素原子、アルキル基、アリール基、又はアラルキル基である。)
The compound represented by formula (1) is preferably a compound represented by any one of the following formulas (1-6) to (1-15).
Figure JPOXMLDOC01-appb-C000020
(In the formula,
R 33 , R 34 , R 35 , R 36 and R 37 are a hydrogen atom, a halogen atom, an alkyl group, or a fluoroalkyl group (preferably a trifluoromethyl group),
R 62 , R 63 , R 64 , R 65 , R 66 , R 67 , R 68 , RD , RE , RF , RG and RH are alkyl, cycloalkyl, aryl or aralkyl a group, and R 72 and R 82 are each independently a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group;
R91 and R101 are each independently a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. )
式(2)で表される化合物
 R及びRは、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基である。R及びRは、それぞれ独立して、1個以上の置換基を有していてもよいフルオロアルキル基、1個以上の置換基を有していてもよいフルオロアルコキシ基、1個以上の置換基を有していてもよいフルオロアルコキシフルオロアルキル基、又は1個以上の置換基を有していてもよいフルオロアルコキシフルオロアルコキシ基であることが好ましく、1個以上の置換基を有していてもよいフルオロアルキル基又は1個以上の置換基を有していてもよいフルオロアルコキシ基であることがより好ましく、1個以上の置換基を有していてもよいフルオロC1-10アルキル基又は1個以上の置換基を有していてもよいフルオロC1-10アルコキシ基であることが更に好ましく、これらの基が置換基を有しない態様も好ましい。
Compounds R 4 and R 5 represented by formula (2) each independently may have one or more substituents, and a fluoroalkyl group optionally containing an oxygen atom between carbon atoms , or a fluoroalkoxy group which may have one or more substituents and which may contain an oxygen atom between carbon atoms. R 4 and R 5 are each independently a fluoroalkyl group optionally having one or more substituents, a fluoroalkoxy group optionally having one or more substituents, one or more It is preferably a fluoroalkoxyfluoroalkyl group which may have a substituent or a fluoroalkoxyfluoroalkoxy group which may have one or more substituents, and has one or more substituents. more preferably a fluoroalkyl group optionally having one or more substituents or a fluoroalkoxy group optionally having one or more substituents, and a fluoroC 1-10 alkyl group optionally having one or more substituents or a fluoro-C 1-10 alkoxy group optionally having one or more substituents, and an aspect in which these groups have no substituents is also preferred.
 R及びRの好適な組合せとしては、R及びRが1個以上の置換基を有していてもよいフルオロアルキル基である組合せが好ましく、R及びRが1個以上の置換基を有していてもよいフルオロC1-10アルキル基である組合せが更に好ましい。 A preferred combination of R 4 and R 5 is a combination in which R 4 and R 5 are fluoroalkyl groups optionally having one or more substituents, and R 4 and R 5 are one or more A combination of optionally substituted fluoro-C 1-10 alkyl groups is more preferred.
 R及びRは互いに結合して環を形成していてもよい。当該環は、例えば、4員環、5員環、又は6員環であることができる。当該環を有する式(2)で表される化合物は、下記式(2-1)~(2-7)のいずれかで表される化合物であることが好ましい。
Figure JPOXMLDOC01-appb-C000021
R 4 and R 5 may combine with each other to form a ring. The ring can be, for example, a 4-membered ring, a 5-membered ring, or a 6-membered ring. The compound represented by formula (2) having the ring is preferably a compound represented by any one of the following formulas (2-1) to (2-7).
Figure JPOXMLDOC01-appb-C000021
 式(2)で表される化合物の好適な例としては、例えば、1,1,1,2,3,3,3-ヘプタフルオロプロパン等が挙げられる。 Suitable examples of the compound represented by formula (2) include 1,1,1,2,3,3,3-heptafluoropropane and the like.
 式(1)で表される化合物と式(2)で表される化合物のような付加反応における1,2-付加反応と1,4-付加反応の選択性は、式(2)で表される化合物のR及びRが立体的に嵩高いほど、1,4-付加反応の選択性が向上すると考えられる。選択的な1,4-付加反応の進行の観点から、R及びRは、トリフルオロメチル基(CF-)のような短鎖置換基でもよいし、CFCFCFCFO-のようなCF-よりも嵩高い長鎖置換基でもよい。 The selectivity of the 1,2-addition reaction and the 1,4-addition reaction in addition reactions such as the compound represented by formula (1) and the compound represented by formula (2) is represented by formula (2). It is believed that the more sterically bulky R 4 and R 5 of the compound, the better the selectivity of the 1,4-addition reaction. From the viewpoint of selective 1,4-addition reaction, R 4 and R 5 may be short chain substituents such as trifluoromethyl group (CF 3 —) or CF 3 CF 2 CF 2 CF 2 It may also be a long-chain substituent that is bulkier than CF 3 —, such as O—.
 式(2)で表される化合物の使用量は、特に制限されないが、例えば、式(1)で表される化合物1モルに対して、1モル以上、1.5モル以上、又は2モル以上であることが好ましく、20モル以下、15モル以下、又は10モル以下であることが好ましい。前記式(2)で表される化合物の使用量は、前記下限及び前記上限を任意に組み合わせた範囲にすることができる。 The amount of the compound represented by formula (2) is not particularly limited, but for example, 1 mol or more, 1.5 mol or more, or 2 mol or more per 1 mol of the compound represented by formula (1) is preferably 20 mol or less, 15 mol or less, or 10 mol or less. The amount of the compound represented by formula (2) to be used can be within a range in which the above lower limit and the above upper limit are arbitrarily combined.
塩基
 塩基としては、特に制限されず、任意の塩基を使用することができる。塩基としては、例えば、N,N-ジイソプロピルエチルアミン(DIPEA)等の鎖状3級アミン;1,4-ジアザビシクロ[2.2.2]オクタン(DABCO)、1,8-ビス(ジメチルアミノナフタレン)等の環状アミン;ジアザビシクロウンデセン(DBU)、ジアザビシクロノネン(DBN)等の環状アミジン塩基の他、第4級アンモニウム塩、MH(Z)(ここで、Mは金属であり、Zはハロゲンであり、pは原子価に対応する数である。)、M(Z)(ここで、Mは金属であり、Zはハロゲンであり、kは金属の価数に応じた数である。)等が挙げられる。塩基のカチオン部位に嵩高い基が存在することにより反応を効率よく進行させることができる。
Base The base is not particularly limited, and any base can be used. Examples of bases include linear tertiary amines such as N,N-diisopropylethylamine (DIPEA); 1,4-diazabicyclo[2.2.2]octane (DABCO) and 1,8-bis(dimethylaminonaphthalene). cyclic amines such as diazabicycloundecene (DBU), diazabicyclononene (DBN) and other cyclic amidine bases, as well as quaternary ammonium salts, MH(Z) p (where M is a metal, Z is a halogen and p is a number corresponding to the valence), M(Z) k (where M is a metal, Z is a halogen, and k is a number corresponding to the valence of the metal ) and the like. The presence of a bulky group in the cationic site of the base allows the reaction to proceed efficiently.
 前記第4級アンモニウム塩としては、例えば、下記式(6):
Figure JPOXMLDOC01-appb-C000022
(式中、Q~Qは、それぞれ独立して、1個以上の置換基を有していてもよい炭化水素基であり、Q~Qのうち任意の2つは互いに結合して環を形成していてもよく、Xはハロゲン、OH、HSO、SO 2-、BH、BF、ClO、NO、又はPFである。)
で表される化合物又はその水和物、ジフルオロトリメチルケイ酸トリス(ジメチルアミノ)スルホニウム(TASF)等が挙げられる。
Examples of the quaternary ammonium salt include the following formula (6):
Figure JPOXMLDOC01-appb-C000022
(In the formula, Q 1 to Q 4 are each independently a hydrocarbon group optionally having one or more substituents, and any two of Q 1 to Q 4 are bonded to each other. may form a ring, and X is halogen, OH, HSO 4 , SO 4 2- , BH 4 , BF 4 , ClO 4 , NO 3 or PF 6 .)
or a hydrate thereof, tris(dimethylamino)sulfonium difluorotrimethylsilicate (TASF), and the like.
 Q~Qは、それぞれ独立して、1個以上の置換基を有していてもよいアルキル基、1個以上の置換基を有していてもよいシクロアルキル基、1個以上の置換基を有していてもよいアリール基、又は1個以上の置換基を有していてもよいアラルキル基であることが好ましく、1個以上の置換基を有していてもよいアルキル基又は1個以上の置換基を有していてもよいアリール基であることがより好ましく、1個以上の置換基を有していてもよいアルキル基であることが更に好ましく、C1-4アルキル基であることが特に好ましい。なお、前記置換基としては、ハロゲン原子、ヒドロキシル基、メルカプト基等が挙げられるが、これらに限定されない。 Q 1 to Q 4 are each independently an alkyl group optionally having one or more substituents, a cycloalkyl group optionally having one or more substituents, one or more substituents It is preferably an aryl group which may have a group or an aralkyl group which may have one or more substituents, an alkyl group which may have one or more substituents or 1 It is more preferably an aryl group optionally having one or more substituents, more preferably an alkyl group optionally having one or more substituents, and a C 1-4 alkyl group. It is particularly preferred to have In addition, although a halogen atom, a hydroxyl group, a mercapto group, etc. are mentioned as said substituent, it is not limited to these.
 Q~Qの任意の2つが互いに結合して形成される環としては、例えば、ピロリジン、ピペリジン、モルホリン等の5又は6員環等が挙げられるが、これらに限定されない。 Examples of the ring formed by combining any two of Q 1 to Q 4 include, but are not limited to, 5- or 6-membered rings of pyrrolidine, piperidine, morpholine, and the like.
 Xで表されるハロゲンは、フッ素、塩素、臭素、又はヨウ素であり、フッ素であることが好ましい。 The halogen represented by X is fluorine, chlorine, bromine or iodine, preferably fluorine.
 Xは、ハロゲン又はOHであることが好ましく、フッ素又はOHであることが更に好ましい。 X is preferably halogen or OH, more preferably fluorine or OH.
 式(6)で表される化合物の好適な例としては、例えば、テトラブチルアンモニウムフルオリド、テトラブチルアンモニウムヒドロキシド、テトラメチルアンモニウムフルオリド、テトラメチルアンモニウムヒドロキシド等が挙げられる。 Suitable examples of the compound represented by formula (6) include tetrabutylammonium fluoride, tetrabutylammonium hydroxide, tetramethylammonium fluoride, tetramethylammonium hydroxide and the like.
 前記MH(Z)及びM(Z)において、Mは、アルカリ金属又はアルカリ土類金属であることが好ましく、アルカリ金属であることがより好ましく、Na、K、又はCsであることが更に好ましい。Zは、フッ素であることが好ましい。前記MH(Z)はMHF(ここで、MはNa、K、又はCsであり、pは原子価に対応する数である。)であることが好ましく、前記M(Z)はMF(ここで、MはNa、K、又はCsである。)であることが好ましい。 In MH(Z) p and M(Z) k , M is preferably an alkali metal or an alkaline earth metal, more preferably an alkali metal, and further preferably Na, K, or Cs. preferable. Z is preferably fluorine. The MH(Z) p is preferably MHF p (where M is Na, K, or Cs, and p is a number corresponding to the valence), and the M(Z) k is MF (where M is Na, K, or Cs).
 塩基は、1種を単独で又は2種以上を組み合わせて使用することができる。一実施形態において、塩基は、第4級アンモニウム塩、MHF(ここで、MはNa、K、又はCsであり、pは原子価に対応する数である。)、及びMF(ここで、MはNa、K、又はCsである。)からなる群より選択される少なくとも一種を含むことが好ましく、第4級アンモニウム塩を含むことがさらに好ましい。当該実施形態において、第4級アンモニウム塩は、テトラブチルアンモニウムフルオリド、テトラブチルアンモニウムヒドロキシド、テトラメチルアンモニウムフルオリド、及びテトラメチルアンモニウムヒドロキシドからなる群より選択される少なくとも一種であることが好ましい。 A base can be used individually by 1 type or in combination of 2 or more types. In one embodiment, the base is a quaternary ammonium salt, MHF p (where M is Na, K, or Cs and p is a number corresponding to the valence), and MF (where M is Na, K, or Cs.) preferably contains at least one selected from the group consisting of, more preferably a quaternary ammonium salt. In this embodiment, the quaternary ammonium salt is preferably at least one selected from the group consisting of tetrabutylammonium fluoride, tetrabutylammonium hydroxide, tetramethylammonium fluoride, and tetramethylammonium hydroxide. .
 塩基のpKaの下限は、例えば10、好ましくは11、更に好ましくは12である。塩基のpKaの上限は、例えば20、好ましくは16、更に好ましくは15である。塩基のpKaは、例えば10~20の範囲内であり、好ましくは10~15の範囲内である。塩基のpKaの値は、例えば、化学便覧(基礎編)改訂6版、日本化学会 編(丸善出版)等を参照することができる。 The lower limit of the pKa of the base is, for example, 10, preferably 11, more preferably 12. The upper limit of the pKa of the base is, for example, 20, preferably 16, more preferably 15. The pKa of the base is, for example, within the range of 10-20, preferably within the range of 10-15. For pKa values of bases, reference can be made to, for example, Kagaku Binran (Fundamentals) Revised 6th Edition, The Chemical Society of Japan (Maruzen Publishing), and the like.
 塩基の使用量は、特に制限されないが、例えば、式(1)で表される化合物1モルに対して、0.5モル以上、0.75モル以上、又は1モル以上であることが好ましく、5モル以下、4モル以下、3モル以下、又は2モル以下であることが好ましい。前記塩基の使用量は、前記下限及び前記上限を任意に組み合わせた範囲にすることができる。 The amount of the base to be used is not particularly limited. It is preferably 5 mol or less, 4 mol or less, 3 mol or less, or 2 mol or less. The amount of the base to be used can be within a range in which the above lower limit and the above upper limit are arbitrarily combined.
溶媒
 工程Aの反応は、溶媒中で実施してもよい。当該溶媒は、例えば、非極性溶媒であっても非プロトン性極性溶媒であってもプロトン性極性溶媒であってもよい。当該溶媒としては、特に制限されないが、例えば、次の溶媒が挙げられる。
・炭化水素系溶媒[例:n-ヘキサン等の鎖状炭化水素、ベンゼン、トルエン、p-キシレン等の芳香族炭化水素]
・ハロゲン系溶媒[例:ジクロロメタン、ジクロロエタン、パーフルオロヘキサン等のハロアルカン;クロロベンゼン等のハロアレーン;トリフルオロトルエン、ヘキサフルオロメタキシレン等のハロアルキルアレーン]
・ニトリル系溶媒[例:アセトニトリル、プロピオニトリル、アクリロニトリル等の鎖状ニトリル;ベンゾニトリル等の環状ニトリル]
・アミド系溶媒[例:カルボン酸アミド(例:ホルムアミド、N-メチルホルムアミド、N,N-ジメチルホルムアミド等の鎖状アミド、N-メチルピロリドン等の環状アミド)、リン酸アミド(例:ヘキサメチルリン酸アミド)]
・エーテル系溶媒[例:ジエチルエーテル、エチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル、トリエチレングリコールジメチルエーテル等の鎖状エーテル、テトラヒドロフラン(THF)、ジオキサン等の環状エーテル]
・ウレア系溶媒[例:N,N-ジメチルプロピレンウレア]
・エステル系溶媒[例:酢酸エステル]
・スルホキシド系溶媒[例:ジメチルスルホキシド(DMSO)]
・ニトロ系溶媒[例:ニトロメタン、ニトロベンゼン]
・ケトン系溶媒[例:アセトン、メチルエチルケトン]
・これら2種以上の混合溶媒
The reaction of solvent step A may be carried out in a solvent. The solvent may be, for example, a nonpolar solvent, an aprotic polar solvent, or a protic polar solvent. Examples of the solvent include, but are not limited to, the following solvents.
・Hydrocarbon solvents [Examples: chain hydrocarbons such as n-hexane, aromatic hydrocarbons such as benzene, toluene, and p-xylene]
・Halogen-based solvents [Examples: Haloalkanes such as dichloromethane, dichloroethane, and perfluorohexane; Haloarenes such as chlorobenzene; Haloalkylarenes such as trifluorotoluene and hexafluorometaxylene]
・Nitrile-based solvents [e.g. chain nitriles such as acetonitrile, propionitrile and acrylonitrile; cyclic nitriles such as benzonitrile]
- Amide solvents [e.g. carboxylic acid amides (e.g. chain amides such as formamide, N-methylformamide, N,N-dimethylformamide, cyclic amides such as N-methylpyrrolidone), phosphoric acid amides (e.g. hexamethyl phosphate amide)]
Ether-based solvents [Examples: chain ethers such as diethyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, and triethylene glycol dimethyl ether; cyclic ethers such as tetrahydrofuran (THF) and dioxane]
・Urea-based solvent [Example: N,N-dimethylpropylene urea]
・Ester-based solvent [Example: Acetate ester]
・ Sulfoxide solvent [Example: dimethyl sulfoxide (DMSO)]
・Nitro-based solvents [e.g. nitromethane, nitrobenzene]
・Ketone solvent [Example: acetone, methyl ethyl ketone]
・Mixed solvent of two or more of these
 溶媒としては、炭化水素系溶媒、エーテル系溶媒、アミド系溶媒、スルホキシド系溶媒、及びニトリル系溶媒からなる群より選択される少なくとも一種が好ましい。 The solvent is preferably at least one selected from the group consisting of hydrocarbon solvents, ether solvents, amide solvents, sulfoxide solvents, and nitrile solvents.
 溶媒の使用量は、特に制限されないが、例えば、式(1)で表される化合物1mmolに対して、0.1mL以上、0.5mL以上、又は1mL以上であることが好ましく、100mL以下、50mL以下、又は30mL以下であることが好ましい。前記溶媒の使用量は、前記下限及び前記上限を任意に組み合わせた範囲にすることができる。 The amount of the solvent used is not particularly limited, but for example, it is preferably 0.1 mL or more, 0.5 mL or more, or 1 mL or more, 100 mL or less, or 50 mL with respect to 1 mmol of the compound represented by formula (1). or less, or preferably 30 mL or less. The amount of the solvent used can be within a range in which the above lower limit and the above upper limit are arbitrarily combined.
乾燥剤
 工程Aの反応は、水の存在下又非存在下で実施することができる。水の存在下で実施する場合、水分量は、反応液100質量部に対して、例えば、5質量部以下であってもよい。水分量を低減するため、工程Aの反応は、乾燥剤の存在下で実施してもよい。乾燥剤としては、例えば、ゼオライト等が挙げられる。ゼオライトとしては、例えば、モレキュラーシーブ3A、4A、及び5A(ユニオン昭和社)、ゼオラム3A及び4A(東ソー社)等が挙げられる。
The drying agent step A reaction can be carried out in the presence or absence of water. When implemented in the presence of water, the amount of water may be, for example, 5 parts by mass or less with respect to 100 parts by mass of the reaction liquid. To reduce the water content, the reaction of step A may be carried out in the presence of a drying agent. Examples of desiccants include zeolite and the like. Examples of zeolites include molecular sieves 3A, 4A, and 5A (Union Showa), Zeolum 3A and 4A (Tosoh), and the like.
金属酸化物
 工程Aの反応は、金属酸化物の存在下又は非存在下で実施することができる。金属酸化物としては、前記乾燥剤の例として挙げられたゼオライト、シリカ、アルミナ等が挙げられる。金属酸化物の使用量は、例えば、式(1)で表される化合物100質量部に対して、100質量部以上、200質量部以上、又は300質量部以上であることが好ましく、35000質量部以下、30000質量部以下、又は25000質量部以下であることが好ましい。前記金属酸化物の使用量は、前記下限及び前記上限を任意に組み合わせた範囲にすることができる。
The reaction of metal oxide step A can be carried out in the presence or absence of a metal oxide. Examples of metal oxides include zeolite, silica, and alumina, which are mentioned as examples of the desiccant. The amount of the metal oxide used is, for example, 100 parts by mass or more, 200 parts by mass or more, or preferably 300 parts by mass or more with respect to 100 parts by mass of the compound represented by formula (1), and 35000 parts by mass. Below, it is preferably 30,000 parts by mass or less, or 25,000 parts by mass or less. The amount of the metal oxide used can be within a range in which the lower limit and the upper limit are arbitrarily combined.
反応温度
 工程Aの反応温度は、反応が進行する限り特に制限されない。当該反応温度の下限は、例えば-20℃以上、好ましくは0℃以上、さらに好ましくは10℃以上である。当該反応温度の上限は、例えば150℃以下、好ましくは120℃以下、さらに好ましくは100℃以下である。当該反応温度は、前記下限及び前記上限を任意に組み合わせた範囲にすることができる。
Reaction temperature The reaction temperature in step A is not particularly limited as long as the reaction proceeds. The lower limit of the reaction temperature is, for example, −20° C. or higher, preferably 0° C. or higher, and more preferably 10° C. or higher. The upper limit of the reaction temperature is, for example, 150° C. or lower, preferably 120° C. or lower, and more preferably 100° C. or lower. The reaction temperature can be in any combination of the lower limit and the upper limit.
反応時間
 工程Aの反応時間は、反応が進行する限り特に制限されない。当該反応時間の下限は、例えば0.1時間以上、好ましくは0.5時間以上、さらに好ましくは1時間以上である。当該反応時間の上限は、例えば72時間以下、好ましくは50時間以下である。当該反応時間は、前記下限及び前記上限を任意に組み合わせた範囲にすることができる。
Reaction time The reaction time of step A is not particularly limited as long as the reaction proceeds. The lower limit of the reaction time is, for example, 0.1 hour or longer, preferably 0.5 hour or longer, and more preferably 1 hour or longer. The upper limit of the reaction time is, for example, 72 hours or less, preferably 50 hours or less. The reaction time can be within a range in which the above lower limit and the above upper limit are arbitrarily combined.
式(3)で表される化合物
 R、R、R、R、R、及びEWGは「式(1)で表される化合物」及び「式(2)で表される化合物」に記載した通りである。
Compounds R 1 , R 2 , R 3 , R 4 , R 5 and EWG represented by formula (3) are “compounds represented by formula (1)” and “compounds represented by formula (2)”. It is as described in
 R、R、R、R、R、及びEWGの好適な組合せとしては、例えば、次の表1に示される組合せ等が挙げられる。
Figure JPOXMLDOC01-appb-T000023
Suitable combinations of R 1 , R 2 , R 3 , R 4 , R 5 and EWG include, for example, combinations shown in Table 1 below.
Figure JPOXMLDOC01-appb-T000023
 式(3)で表される化合物の製造方法は、工程Aに加えて、任意の工程、例えば、ろ過、抽出、蒸留、カラムクロマトグラフィー、洗浄等の精製工程を含むことができる。 In addition to step A, the method for producing the compound represented by formula (3) can include optional steps, for example, purification steps such as filtration, extraction, distillation, column chromatography, and washing.
式(4)で表される化合物
 式(4)のR11、R12、R13、R14、R15、及びR16は、それぞれ、式(1)~(3)のR、R、R、R、R、及びEWGに対応してもよい。式(4)で表される化合物は、工程Aの反応の副生物に相当し得る。
R 11 , R 12 , R 13 , R 14 , R 15 and R 16 in the compound formula (4) represented by the formula (4) are respectively R 1 and R 2 in the formulas (1) to ( 3 ) , R 3 , R 4 , R 5 , and EWG. Compounds of formula (4) can represent by-products of the step A reaction.
 式(4)において、例えば、
11、R12、及びR13は、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基(例:C1-12炭化水素基)であり、
16は-COOR17、-CONR1819 又はシアノ基であり、
17は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
18及びR19は、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
11、R12、R13、及びR16のうち任意の2つは互いに結合して環を形成していてもよく、
14及びR15は、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、R14及びR15は互いに結合して環を形成していてもよい。
In formula (4), for example,
R 11 , R 12 and R 13 are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents (eg, a C 1-12 hydrocarbon group),
R 16 is —COOR 17 , —CONR 18 R 19 , or a cyano group;
R 17 is a C 1-12 hydrocarbon group optionally having one or more substituents,
R 18 and R 19 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
Any two of R 11 , R 12 , R 13 and R 16 may be bonded to each other to form a ring,
R 14 and R 15 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may have an oxygen atom between the carbon atoms, and R 14 and R 15 may combine with each other to form a ring.
 mは2又は3であることが好ましい。 It is preferable that m is 2 or 3.
組成物
 組成物は、式(3)で表される化合物及び式(4)で表される化合物を含有する。
Composition The composition contains the compound represented by Formula (3) and the compound represented by Formula (4).
 式(4)で表される化合物の含有量の上限は、式(3)で表される化合物100質量部に対して、例えば300質量部、好ましくは250質量部、更に好ましくは200質量部である。式(4)で表される化合物の含有量の下限は、式(3)で表される化合物100質量部に対して、例えば0.0001質量部、0.0005質量部、0.001質量部、0.005質量部、又は0.01質量部である。 The upper limit of the content of the compound represented by formula (4) is, for example, 300 parts by mass, preferably 250 parts by mass, more preferably 200 parts by mass with respect to 100 parts by mass of the compound represented by formula (3). be. The lower limit of the content of the compound represented by formula (4) is, for example, 0.0001 parts by mass, 0.0005 parts by mass, or 0.001 parts by mass with respect to 100 parts by mass of the compound represented by formula (3). , 0.005 parts by weight, or 0.01 parts by weight.
 式(4)で表される化合物の含有量の上限は、式(3)で表される化合物1モルに対して、例えば9モル、8モル、7モル、又は6モルであってもよく、好ましくは5モル、4モル、3モル、又は2モルであってもよく、更に好ましくは1モルである。式(4)で表される化合物の含有量の下限は、式(3)で表される化合物1モルに対して、例えば0.0001モル、0.0005モル、0.001モル、0.005モル、又は0.01モルである。前記式(4)で表される化合物の含有量は、前記下限及び前記上限を任意に組み合わせた範囲にすることができる。 The upper limit of the content of the compound represented by formula (4) may be, for example, 9 mol, 8 mol, 7 mol, or 6 mol with respect to 1 mol of the compound represented by formula (3), It may be preferably 5 mol, 4 mol, 3 mol or 2 mol, more preferably 1 mol. The lower limit of the content of the compound represented by formula (4) is, for example, 0.0001 mol, 0.0005 mol, 0.001 mol, 0.005, per 1 mol of the compound represented by formula (3). mol, or 0.01 mol. The content of the compound represented by the formula (4) can be within a range in which the lower limit and the upper limit are arbitrarily combined.
 式(4)で表される化合物の含有量の定量方法としては、NMR法、HPLC法、IR法、GC法、GC/MS法、LC/MS法などが挙げられる。これらの中で、GC/MS法がより微量成分を定量するのに好適である。 Methods for quantifying the content of the compound represented by formula (4) include NMR, HPLC, IR, GC, GC/MS, and LC/MS methods. Among these, the GC/MS method is more suitable for quantifying trace components.
 組成物は、下記式(5):
Figure JPOXMLDOC01-appb-C000024
(式中、
21、R22、及びR23は、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
は、1個以上の置換基を有していてもよい炭化水素基であり、
及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であり、
21、R22、及びR23のうち任意の2つは互いに結合して環を形成していてもよく、
24及びR25は、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、R24及びR25は互いに結合して環を形成していてもよく、
26は-OR27又は-NR2829であり、
27は1個以上の置換基を有していてもよい炭化水素基であり、
28及びR29は、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基である。)
で表される化合物を含有してもよい。
The composition has the following formula (5):
Figure JPOXMLDOC01-appb-C000024
(In the formula,
R 21 , R 22 and R 23 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
RA is a hydrocarbon group optionally having one or more substituents,
R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents,
Any two of R 21 , R 22 , and R 23 may combine with each other to form a ring,
R 24 and R 25 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may contain an oxygen atom between the carbon atoms, and R 24 and R 25 may be bonded to each other to form a ring,
R 26 is —OR 27 or —NR 28 R 29 ;
R 27 is a hydrocarbon group optionally having one or more substituents,
R 28 and R 29 are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents. )
It may contain a compound represented by.
 式(5)のR21、R22、R23、R24、及びR25は、それぞれ、式(1)~(3)のR、R、R、R、及びRに対応してもよい。-OR27又は-NR2829は、それぞれ、式(1)~(3)の-OR及び-NRに対応してもよい。式(5)で表される化合物は、EWGが-COOR又は-CONRである式(1)で表される化合物に対して、式(2)で表される化合物が1,2-付加した化合物に相当し得る。 R 21 , R 22 , R 23 , R 24 and R 25 in formula (5) correspond to R 1 , R 2 , R 3 , R 4 and R 5 in formulas (1) to (3) respectively You may —OR 27 or —NR 28 R 29 may correspond to —OR 6 and —NR 7 R 8 in formulas (1)-(3), respectively. The compound represented by the formula (5) is a compound represented by the formula (2) with respect to the compound represented by the formula (1) in which EWG is —COOR 6 or —CONR 7 R 8 . - may correspond to an adduct compound.
 式(5)で表される化合物の含有量は、式(3)で表される化合物100質量部に対して、例えば50質量部以下、好ましくは45質量部以下、より好ましくは40質量部以下、更に好ましくは35質量部以下、特に好ましくは30質量部以下である。式(5)で表される化合物の含有量は、式(3)で表される化合物100質量部に対して、例えば0質量部超、0.0001質量部以上、0.001質量部以上、又は0.01質量部以上であることができる。前記式(5)で表される化合物の含有量は、前記下限及び前記上限を任意に組み合わせた範囲にすることができる。 The content of the compound represented by formula (5) is, for example, 50 parts by mass or less, preferably 45 parts by mass or less, more preferably 40 parts by mass or less with respect to 100 parts by mass of the compound represented by formula (3). , more preferably 35 parts by mass or less, particularly preferably 30 parts by mass or less. The content of the compound represented by formula (5) is, for 100 parts by mass of the compound represented by formula (3), for example, more than 0 parts by mass, 0.0001 parts by mass or more, 0.001 parts by mass or more, Or it can be 0.01 parts by mass or more. The content of the compound represented by the formula (5) can be within a range in which the lower limit and the upper limit are arbitrarily combined.
 式(5)で表される化合物の含有量は、例えば、式(4)で表される化合物の含有量の定量方法と同じ方法により定量することができる。 The content of the compound represented by formula (5) can be quantified, for example, by the same method as the method for quantifying the content of the compound represented by formula (4).
 本開示の式(3)で表される化合物の製造方法は、EWGが-COOR又は-CONRである式(1)で表される化合物に対して、式(2)で表される化合物の1,4-付加を選択的に進行させることができ、1,2-付加を部分的又は完全に抑制することができる。したがって、本開示は、式(5)で表される化合物を含有しない(又は検出限界以下の式(5)で表される化合物を含有する)組成物も提供することができる。 The method for producing the compound represented by formula (3) of the present disclosure is represented by formula (2) for the compound represented by formula (1) in which EWG is —COOR 6 or —CONR 7 R 8 The 1,4-addition of the compound can be selectively allowed to proceed, and the 1,2-addition can be partially or completely suppressed. Accordingly, the present disclosure can also provide compositions that do not contain a compound of formula (5) (or that contain a compound of formula (5) below the detection limit).
 以下、実施例によって本開示の一実施態様を更に詳細に説明するが、本開示はこれに限定されるものではない。
 各実施例において質量分析はGC/MS測定法で分析を行った。
Hereinafter, one embodiment of the present disclosure will be described in more detail by way of examples, but the present disclosure is not limited thereto.
In each example, mass spectrometry analysis was performed by the GC/MS measurement method.
[実施例1]
 20mLオートクレーブに、アクリル酸ベンジル(41 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラブチルアンモニウムフルオリドの1.0 M THF溶液(0.25 mL、0.25 mmol)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸ベンジルの収率は41%であり、2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジベンジルの収率は3%であった(当該収率(%)は原料(アクリル酸ベンジル)のmolを基準とする単位である)。
[Example 1]
A 20 mL autoclave was charged with benzyl acrylate (41 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), and a 1.0 M solution of tetrabutylammonium fluoride in THF (0.25 mL, 0.25 mmol) at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 41%, and 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl The yield of dibenzyl)propyl)glutarate was 3% (the yield (%) is a unit based on mol of the raw material (benzyl acrylate)).
[実施例2]
 20mLオートクレーブに、アクリル酸ベンジル(41 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス3A (300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸ベンジルの収率は50%であった。2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジベンジルの収率は40%であった。
[実施例2A]
 モレキュラーシーブス3Aを使用しない点を除き、実施例2と同様に操作したところ、4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸ベンジルの収率は54%であり、2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジベンジルの収率は34%であった。
[実施例2B]
 モレキュラーシーブス3A (300mg)の代わりに、(i)モレキュラーシーブス4A (300mg)、(ii)モレキュラーシーブス5A (300mg)、(iii)不活性化モレキュラーシーブス4A (300mg)、(iv)Al2O3 (300 mg)を使用する点を除き、実施例2と同様に操作したところ、4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸ベンジルの収率は、それぞれ、(i)58%、(ii)49%、(iii)52%、(iv)13%であり、2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジベンジルの収率は、それぞれ、(i)50%、(ii)40%、(iii)45%、(iv)5%であった。
[Example 2]
In a 20 mL autoclave, benzyl acrylate (41 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 50%. The yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 40%.
[Example 2A]
By the same procedure as in Example 2 except that molecular sieves 3A were not used, the yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 54%. The yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 34%.
[Example 2B]
(i) molecular sieves 4A (300 mg), (ii) molecular sieves 5A (300 mg), (iii) inactivated molecular sieves 4A (300 mg), (iv) Al2O3 instead of molecular sieves 3A (300 mg). (300 mg) was operated in the same manner as in Example 2, the yields of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate were, respectively, ( i) 58%, (ii) 49%, (iii) 52%, (iv) 13%, 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutaric acid The yields of dibenzyl were (i) 50%, (ii) 40%, (iii) 45% and (iv) 5%, respectively.
[実施例3]
 20mLオートクレーブに、アクリル酸ベンジル(41 mg、0.25 mmol)、DMSO(2 mL)、テトラブチルアンモニウムフルオリドの1.0 M THF溶液(0.25 mL、0.25 mmol)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸ベンジルの収率は20%であった。2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジベンジルの収率は5%であった。
[Example 3]
A 20 mL autoclave was charged with benzyl acrylate (41 mg, 0.25 mmol), DMSO (2 mL), tetrabutylammonium fluoride in 1.0 M THF (0.25 mL, 0.25 mmol) at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 20%. The yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 5%.
[実施例4]
 20mLオートクレーブに、アクリル酸ベンジル(41 mg、0.25 mmol)、1,4-ジオキサン(2 mL)、テトラブチルアンモニウムフルオリドの1.0 M THF溶液(0.25 mL、0.25 mmol)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸ベンジルの収率は17%であった。2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジベンジルの収率は1%であった。
[Example 4]
A 20 mL autoclave was charged with benzyl acrylate (41 mg, 0.25 mmol), 1,4-dioxane (2 mL), tetrabutylammonium fluoride in 1.0 M THF (0.25 mL, 0.25 mmol) at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 17%. The yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 1%.
[実施例5]
 20mLオートクレーブに、N-ベンジル-N-メチルアクリルアミド(44 mg、0.25 mmol)、N,N-ジメチルホルムアミド(1 mL)、テトラブチルアンモニウムフルオリドの1.0 M THF溶液(0.25 mL、0.25 mmol)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で15時間反応させた。15時間後、除圧しオートクレーブを開放し19FNMR測定及び質量分析を行いN-ベンジル-4,5,5,5-テトラフルオロ-N-メチル-4-(トリフルオロメチル)ペンタンアミドの存在を確認した。
[Example 5]
N-benzyl-N-methylacrylamide (44 mg, 0.25 mmol), N,N-dimethylformamide (1 mL), and 1.0 M THF solution of tetrabutylammonium fluoride (0.25 mL, 0.25 mmol) were added to a 20 mL autoclave at room temperature. I put it in. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 15 hours. After 15 hours, the pressure was released, the autoclave was opened, and 19 FNMR measurement and mass spectrometry were performed to confirm the presence of N-benzyl-4,5,5,5-tetrafluoro-N-methyl-4-(trifluoromethyl)pentanamide. bottom.
[実施例6]
 20mLオートクレーブに、ベンジルメタクリレート(44 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス4A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で15時間反応させた。15時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-2-メチル-4-(トリフルオロメチル)ペンタン酸ベンジルの収率は19%であった。
[実施例6A]
 テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)の代わりにテトラブチルアンモニウムフルオリドの1.0 M THF溶液(0.25 mL、0.25 mmol)を使用した点を除き、実施例6と同様に操作したところ、4,5,5,5-テトラフルオロ-2-メチル-4-(トリフルオロメチル)ペンタン酸ベンジルの収率は9%であった。
[Example 6]
Benzyl methacrylate (44 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 4A (300 mg) were added to a 20 mL autoclave. Put in at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 15 hours. After 15 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-2-methyl-4-(trifluoromethyl)pentanoate was 19%.
[Example 6A]
As in Example 6, except that tetrabutylammonium fluoride in 1.0 M THF (0.25 mL, 0.25 mmol) was used instead of tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol). The work-up gave a 9% yield of benzyl 4,5,5,5-tetrafluoro-2-methyl-4-(trifluoromethyl)pentanoate.
[実施例7]
 20mLオートクレーブに、アクリロニトリル(13 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス3A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタンニトリルの収率は56%であった。
[Example 7]
Acrylonitrile (13 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg) were added to a 20 mL autoclave at room temperature. I put it in. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanenitrile was 56%.
[実施例8]
 20mLオートクレーブに、けい皮酸ニトリル(32 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス3A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-3-フェニル-4-(トリフルオロメチル)ペンタンニトリルの収率は8%であった。
[Example 8]
In a 20 mL autoclave, cinnamate nitrile (32 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg ) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 4,5,5,5-tetrafluoro-3-phenyl-4-(trifluoromethyl)pentanenitrile was 8%.
[実施例9]
 20mLオートクレーブに、フェニルビニルスルホン(42 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス3A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。((3,4,4,4-テトラフルオロ-3-(トリフルオロメチル)ブチル)スルホニル)ベンゼンの収率は48%であった。
[実施例9A]
 モレキュラーシーブス3Aを使用せず、反応時間を15時間に変更した点を除き、実施例9と同様に操作したところ、((3,4,4,4-テトラフルオロ-3-(トリフルオロメチル)ブチル)スルホニル)ベンゼンの収率は89%であった。
[Example 9]
Phenylvinylsulfone (42 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg) were added to a 20 mL autoclave. was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of ((3,4,4,4-tetrafluoro-3-(trifluoromethyl)butyl)sulfonyl)benzene was 48%.
[Example 9A]
((3,4,4,4-tetrafluoro-3-(trifluoromethyl) The yield of butyl)sulfonyl)benzene was 89%.
[実施例10]
 20mLオートクレーブに、フェニルビニルスルホキシド(38 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス3A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で20時間反応させた。20時間後、除圧しオートクレーブを開放し分析を行った。((3,4,4,4-テトラフルオロ-3-(トリフルオロメチル)ブチル)スルフィニル)ベンゼンの収率は23%であった。
[Example 10]
In a 20 mL autoclave, phenyl vinyl sulfoxide (38 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg). was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 20 hours. After 20 hours, the pressure was released and the autoclave was opened for analysis. The yield of ((3,4,4,4-tetrafluoro-3-(trifluoromethyl)butyl)sulfinyl)benzene was 23%.
[実施例11]
 20mLオートクレーブに、ベンジリデンマロン酸ジエチル(62 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス3A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。2-(2,3,3,3-テトラフルオロ-1-フェニル-2-(トリフルオロメチル)プロピル)マロン酸ジエチルの収率は33%であった。
[Example 11]
In a 20 mL autoclave, diethyl benzylidenemalonate (62 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg ) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of diethyl 2-(2,3,3,3-tetrafluoro-1-phenyl-2-(trifluoromethyl)propyl)malonate was 33%.
[実施例12]
 20mLオートクレーブに、ビニルホスホン酸ジエチル(41 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス3A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。(3,4,4,4-テトラフルオロ-3-(トリフルオロメチル)ブチル)ホスホン酸ジエチルの収率は20%であった。
[Example 12]
In a 20 mL autoclave, diethyl vinylphosphonate (41 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 3A (300 mg ) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of diethyl (3,4,4,4-tetrafluoro-3-(trifluoromethyl)butyl)phosphonate was 20%.
[実施例13]
 20mLオートクレーブに、アクリル酸ベンジル(41 mg、0.25 mmol)、N,N-ジメチルアセトアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸ベンジルの収率は47%であった。2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジベンジルの収率は39%であった。
[Example 13]
A 20 mL autoclave was charged with benzyl acrylate (41 mg, 0.25 mmol), N,N-dimethylacetamide (2 mL), and tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of benzyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 47%. The yield of dibenzyl 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 39%.
[実施例14]
 20mLオートクレーブに、アクリル酸2-フェニルプロパン-2-イル(47.5 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸2-フェニルプロパン-2-イルの収率は60%であった。
[実施例14A]
 N,N-ジメチルホルムアミドの量を0.5 mL、1 mL、5 mLに変更した点を除き、実施例14と同様に操作したところ、収率は、それぞれ、23%、48%、43%であった。
[実施例14B]
 反応時間を10時間に変更した点を除き、実施例14と同様に操作したところ、収率は50%であった。
[Example 14]
In a 20 mL autoclave, 2-phenylpropan-2-yl acrylate (47.5 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 2-phenylpropan-2-yl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 60%.
[Example 14A]
The same procedure as in Example 14 was performed except that the amount of N,N-dimethylformamide was changed to 0.5 mL, 1 mL, and 5 mL. The yields were 23%, 48%, and 43%, respectively. rice field.
[Example 14B]
The yield was 50% by the same procedure as in Example 14, except that the reaction time was changed to 10 hours.
[実施例15]
 20mLオートクレーブに、アクリル酸1-フェニルエチル(44 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス4A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸1-フェニルエチルの収率は43%であった。2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジ(1-フェニルエチル)の収率は40%であった。
[実施例15A]
 モレキュラーシーブス4Aを使用しない点を除き、実施例15と同様に操作したところ、4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸1-フェニルエチルの収率は45%であり、2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジ(1-フェニルエチル)の収率は26%であった。
[Example 15]
In a 20 mL autoclave, 1-phenylethyl acrylate (44 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol), molecular sieves 4A. (300 mg) was added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 43%. The yield of di(1-phenylethyl) 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 40%.
[Example 15A]
By the same procedure as in Example 15 except that molecular sieves 4A were not used, the yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 45%. and the yield of di(1-phenylethyl) 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 26%.
[実施例16]
 20mLオートクレーブに、アクリル酸2-フェニルプロパン-2-イル(47.5 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス4A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸2-フェニルプロパン-2-イルの収率は78%であった。
[Example 16]
In a 20 mL autoclave, 2-phenylpropan-2-yl acrylate (47.5 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) , molecular sieves 4A (300 mg) were added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 2-phenylpropan-2-yl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 78%.
[実施例17]
 20mLオートクレーブに、アクリル酸(3s,5s,7s)-アダマンタン-1-イル(51.5 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス4A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸(3s,5s,7s)-アダマンタン-1-イルの収率は64%であった。2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジ((3s,5s,7s)-アダマンタン-1-イル)の収率は18%であった。
[実施例17A]
 モレキュラーシーブス4Aを使用しない点を除き、実施例17と同様に操作したところ、4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸(3s,5s,7s)-アダマンタン-1-イルの収率は26%であり、2-(2,3,3,3-テトラフルオロ-2-(トリフルオロメチル)プロピル)グルタル酸ジ((3s,5s,7s)-アダマンタン-1-イル)の収率は6%であった。
[Example 17]
In a 20 mL autoclave, (3s,5s,7s)-adamantan-1-yl acrylate (51.5 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) and molecular sieves 4A (300 mg) were added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of (3s,5s,7s)-adamantan-1-yl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 64%. The yield of di((3s,5s,7s)-adamantan-1-yl) 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate was 18%. .
[Example 17A]
By the same procedure as in Example 17 except that molecular sieves 4A was not used, 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoic acid (3s,5s,7s)-adamantane- The yield of 1-yl was 26%, and 2-(2,3,3,3-tetrafluoro-2-(trifluoromethyl)propyl)glutarate di((3s,5s,7s)-adamantane-1 -yl) was 6%.
[実施例18]
 20mLオートクレーブに、アクリル酸2,4,4-トリメチルペンタン-2-イル(46 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス4A(300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸2,4,4-トリメチルペンタン-2-イルの収率は64%であった。
[Example 18]
In a 20 mL autoclave, 2,4,4-trimethylpentan-2-yl acrylate (46 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg , 0.25 mmol) and molecular sieves 4A (300 mg) were added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 2,4,4-trimethylpentan-2-yl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 64%.
[実施例19]
 20mLオートクレーブに、アクリル酸2-フェニルプロパン-2-イル(47.5 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、N,N-ジイソプロピルエチルアミン(32.3 mg、0.25 mmol)、モレキュラーシーブス4A (300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸1-フェニルエチルの収率は80%であった。
[実施例19A]
 モレキュラーシーブス4Aを使用しない点を除き、実施例19と同様に操作したところ、4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸1-フェニルエチルの収率は37%であった。
[実施例19B]
 N,N-ジイソプロピルエチルアミン(32.3 mg、0.25 mmol)をジアザビシクロウンデセン(38.1 mg、0.25 mmol)に変更した点を除き、実施例19と同様に操作したところ、4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸1-フェニルエチルの収率は44%であった。
[実施例19C]
 N,N-ジイソプロピルエチルアミン(32.3 mg、0.25 mmol)を1,8-ビス(ジメチルアミノ)ナフタレン(53.6 mg、0.25 mmol)に変更した点を除き、実施例19と同様に操作したところ、4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸1-フェニルエチルの収率は86%であった。
[実施例19D]
 N,N-ジイソプロピルエチルアミン(32.3 mg、0.25 mmol)を1,8-ビス(ジメチルアミノ)ナフタレン(53.6 mg、0.25 mmol)に変更し、モレキュラーシーブス4Aを使用しない点を除き、実施例19と同様に操作したところ、4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸1-フェニルエチルの収率は56%であった。
[実施例19E]
 N,N-ジイソプロピルエチルアミン(32.3 mg、0.25 mmol)を1,4-ジアザビシクロ[2.2.2]オクタン(28.0 mg、0.25 mmol)に変更した以外は、実施例19と同様に操作したところ、4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸1-フェニルエチルの収率は83%であった。
[Example 19]
In a 20 mL autoclave, 2-phenylpropan-2-yl acrylate (47.5 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride tetrahydrate (41 mg, 0.25 mmol) , N,N-diisopropylethylamine (32.3 mg, 0.25 mmol), molecular sieves 4A (300 mg) were charged at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 80%.
[Example 19A]
By the same procedure as in Example 19 except that molecular sieves 4A were not used, the yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 37%. Met.
[Example 19B]
By the same procedure as in Example 19 except that N,N-diisopropylethylamine (32.3 mg, 0.25 mmol) was changed to diazabicycloundecene (38.1 mg, 0.25 mmol), 4,5,5,5 The yield of 1-phenylethyl-tetrafluoro-4-(trifluoromethyl)pentanoate was 44%.
[Example 19C]
By the same procedure as in Example 19, except that N,N-diisopropylethylamine (32.3 mg, 0.25 mmol) was changed to 1,8-bis(dimethylamino)naphthalene (53.6 mg, 0.25 mmol), 4, The yield of 1-phenylethyl 5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 86%.
[Example 19D]
Same as Example 19 except N,N-diisopropylethylamine (32.3 mg, 0.25 mmol) was replaced with 1,8-bis(dimethylamino)naphthalene (53.6 mg, 0.25 mmol) and no molecular sieves 4A was used. The yield of 1-phenylethyl 4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 56%.
[Example 19E]
In the same manner as in Example 19, except that N,N-diisopropylethylamine (32.3 mg, 0.25 mmol) was changed to 1,4-diazabicyclo[2.2.2]octane (28.0 mg, 0.25 mmol), 4, The yield of 1-phenylethyl 5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 83%.
[実施例20]
 20mLオートクレーブに、2-(1,3-ジオキソイソインドリン-2-イル)アクリル酸メチル(58 mg、0.25 mmol)、N,N-ジメチルホルムアミド(2 mL)、テトラメチルアンモニウムフルオリド・4水和物(41 mg, 0.25 mmol)、モレキュラーシーブス4A (300mg)を室温で入れた。2H-ヘプタフルオロプロパンを1.6 mmol添加した。室温で5時間反応させた。5時間後、除圧しオートクレーブを開放し分析を行った。2-(1,3-ジオキソイソインドリン-2-イル)-4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸メチルの収率は63%であった。
[Example 20]
In a 20 mL autoclave, methyl 2-(1,3-dioxoisoindolin-2-yl)acrylate (58 mg, 0.25 mmol), N,N-dimethylformamide (2 mL), tetramethylammonium fluoride/4 water. Hydrate (41 mg, 0.25 mmol) and molecular sieves 4A (300 mg) were added at room temperature. 1.6 mmol of 2H-heptafluoropropane was added. The reaction was allowed to proceed at room temperature for 5 hours. After 5 hours, the pressure was released and the autoclave was opened for analysis. The yield of methyl 2-(1,3-dioxoisoindolin-2-yl)-4,5,5,5-tetrafluoro-4-(trifluoromethyl)pentanoate was 63%.
[実施例21A]
 モレキュラーシーブス4Aを使用しない点を除き、実施例20と同様に操作したところ、2-(1,3-ジオキソイソインドリン-2-イル)-4,5,5,5-テトラフルオロ-4-(トリフルオロメチル)ペンタン酸メチルの収率は75%であった。
[Example 21A]
By the same procedure as in Example 20 except that molecular sieves 4A was not used, 2-(1,3-dioxoisoindolin-2-yl)-4,5,5,5-tetrafluoro-4- The yield of methyl (trifluoromethyl)pentanoate was 75%.

Claims (19)

  1. 下記式(3):
    Figure JPOXMLDOC01-appb-C000001
    (式中、
    、R、及びRは、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
    は、1個以上の置換基を有していてもよい炭化水素基であり、
    及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であるか、R及びRは、互いに結合して隣接する窒素原子と共に環を形成していてもよく、
    EWGは電子求引基であり、
    、R、R、及びEWGのうち任意の2つは互いに結合して環を形成していてもよく、
    及びRは、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、
    及びRは互いに結合して環を形成していてもよい。)
    で表される化合物の製造方法であって、
    下記式(1):
    Figure JPOXMLDOC01-appb-C000002
    (式中、R、R、R、及びEWGは前記と同じである。)
    で表される化合物と、下記式(2):
    Figure JPOXMLDOC01-appb-C000003
    (式中、R及びRは前記と同じである。)
    で表される化合物とを、塩基の存在下で反応させる工程を含む製造方法。
    Formula (3) below:
    Figure JPOXMLDOC01-appb-C000001
    (In the formula,
    R 1 , R 2 , and R 3 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
    RA is a hydrocarbon group optionally having one or more substituents,
    R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with
    EWG is an electron withdrawing group,
    Any two of R 1 , R 2 , R 3 , and EWG may combine with each other to form a ring,
    R 4 and R 5 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents and a fluoroalkoxy group which may contain an oxygen atom between carbon atoms,
    R 4 and R 5 may combine with each other to form a ring. )
    A method for producing a compound represented by
    Formula (1) below:
    Figure JPOXMLDOC01-appb-C000002
    (Wherein, R 1 , R 2 , R 3 , and EWG are the same as above.)
    and a compound represented by the following formula (2):
    Figure JPOXMLDOC01-appb-C000003
    (In the formula, R 4 and R 5 are the same as above.)
    A production method comprising the step of reacting a compound represented by in the presence of a base.
  2. 前記塩基のpKaが10~20の範囲内である、請求項1に記載の製造方法。 The production method according to claim 1, wherein the pKa of said base is in the range of 10-20.
  3. 前記塩基が第4級アンモニウム塩、MHF(ここで、MはNa、K、又はCsであり、pは原子価に対応する数である。)、及びMF(ここで、MはNa、K、又はCsである。)からなる群より選択される少なくとも一種を含む、請求項1又は2に記載の製造方法。 The base is a quaternary ammonium salt, MHF p (where M is Na, K, or Cs and p is a number corresponding to the valence), and MF (where M is Na, K , or Cs).
  4. 前記塩基が第4級アンモニウム塩を含む、請求項1~3のいずれか一項に記載の製造方法。 The production method according to any one of claims 1 to 3, wherein the base comprises a quaternary ammonium salt.
  5. 前記第4級アンモニウム塩が、テトラブチルアンモニウムフルオリド、テトラブチルアンモニウムヒドロキシド、テトラメチルアンモニウムフルオリド、及びテトラメチルアンモニウムヒドロキシドからなる群より選択される少なくとも一種である、請求項3又は4に記載の製造方法。 5. The method according to claim 3 or 4, wherein the quaternary ammonium salt is at least one selected from the group consisting of tetrabutylammonium fluoride, tetrabutylammonium hydroxide, tetramethylammonium fluoride, and tetramethylammonium hydroxide. Method of manufacture as described.
  6. 前記式(1)及び(3)において、
    EWGは-COOR、-COR、-SO、-CONR、-PO(OR)(OR10)、又はシアノ基であり、
    は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
    及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
    及びR10は、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
    nは1又は2である、
    請求項1~5のいずれか一項に記載の製造方法。
    In the above formulas (1) and (3),
    EWG is —COOR 6 , —COR 6 , —SO n R 6 , —CONR 7 R 8 , —PO(OR 9 )(OR 10 ), or a cyano group;
    R 6 is a C 1-12 hydrocarbon group optionally having one or more substituents,
    R 7 and R 8 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
    R 9 and R 10 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
    n is 1 or 2;
    The production method according to any one of claims 1 to 5.
  7. 前記式(1)及び(3)において、
    、R、及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよいC1-12炭化水素基である
    請求項1~6のいずれか一項に記載の製造方法。
    In the above formulas (1) and (3),
    any one of claims 1 to 6, wherein R 1 , R 2 and R 3 are each independently a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents; The manufacturing method described in the paragraph.
  8. 前記式(2)及び(3)において、
    及びRは、それぞれ独立して、フルオロC1-10アルキル基、又はフルオロC1-10アルコキシ基である、
    請求項1~7のいずれか一項に記載の製造方法。
    In the above formulas (2) and (3),
    R 4 and R 5 are each independently a fluoroC 1-10 alkyl group or a fluoroC 1-10 alkoxy group;
    The production method according to any one of claims 1 to 7.
  9. 前記式(2)で表される化合物が1,1,1,2,3,3,3-ヘプタフルオロプロパンである、請求項1~8のいずれか一項に記載の製造方法。 The production method according to any one of claims 1 to 8, wherein the compound represented by formula (2) is 1,1,1,2,3,3,3-heptafluoropropane.
  10. 前記反応を溶媒中で実施する、請求項1~9のいずれか一項に記載の製造方法。 The production method according to any one of claims 1 to 9, wherein the reaction is carried out in a solvent.
  11. 前記溶媒は、炭化水素系溶媒、エーテル系溶媒、アミド系溶媒、スルホキシド系溶媒、及びニトリル系溶媒からなる群より選択される少なくとも一種である、請求項10に記載の製造方法。 The production method according to claim 10, wherein the solvent is at least one selected from the group consisting of hydrocarbon solvents, ether solvents, amide solvents, sulfoxide solvents, and nitrile solvents.
  12. 下記式(3A):
    Figure JPOXMLDOC01-appb-C000004
    [式中、
    31は水素原子、又は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
    61は1個以上の置換基を有していてもよいC1-12アルキル基、1個以上の置換基を有していてもよいシクロアルキル基、又は1個以上の置換基を有していてもよいアリール基である。(但し、R61が1個以上の置換基を有していてもよいCアルキル基である場合、当該Cアルキル基は分岐鎖状Cアルキル基である。)]
    で表される化合物。
    Formula (3A) below:
    Figure JPOXMLDOC01-appb-C000004
    [In the formula,
    R 31 is a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
    R 61 is a C 1-12 alkyl group optionally having one or more substituents, a cycloalkyl group optionally having one or more substituents, or having one or more substituents is an aryl group that may be (However, when R61 is a C4 alkyl group optionally having one or more substituents, the C4 alkyl group is a branched C4 alkyl group.)]
    A compound represented by
  13. 下記式(3B):
    Figure JPOXMLDOC01-appb-C000005
    [式中、
    32は水素原子、又は1個以上の置換基を有していてもよいC1-12炭化水素基であり、
    71及びR81は、それぞれ独立して、1個以上の置換基を有していてもよいC1-12アルキル基、又は1個以上の置換基を有していてもよいアリール基である。(但し、R71及びR81は同時に1個以上の置換基を有していてもよいCアルキル基ではない。)]
    で表される化合物。
    The following formula (3B):
    Figure JPOXMLDOC01-appb-C000005
    [In the formula,
    R 32 is a hydrogen atom or a C 1-12 hydrocarbon group optionally having one or more substituents,
    R 71 and R 81 are each independently a C 1-12 alkyl group optionally having one or more substituents, or an aryl group optionally having one or more substituents . (However, R 71 and R 81 are not C2 alkyl groups optionally having one or more substituents at the same time.)]
    A compound represented by
  14. 下記式(4):
    Figure JPOXMLDOC01-appb-C000006
    (式中、
    11、R12、及びR13は、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
    は、1個以上の置換基を有していてもよい炭化水素基であり、
    及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であるか、R及びRは、互いに結合して隣接する窒素原子と共に環を形成していてもよく、
    16は電子求引基であり、
    11、R12、R13、及びR16のうち任意の2つは互いに結合して環を形成していてもよく、
    14及びR15は、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、R14及びR15は互いに結合して環を形成していてもよく、
    mは2又は3である。)
    で表される化合物。
    Formula (4) below:
    Figure JPOXMLDOC01-appb-C000006
    (In the formula,
    R 11 , R 12 and R 13 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
    RA is a hydrocarbon group optionally having one or more substituents,
    R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with
    R 16 is an electron withdrawing group,
    Any two of R 11 , R 12 , R 13 and R 16 may be bonded to each other to form a ring,
    R 14 and R 15 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may contain an oxygen atom between the carbon atoms, and R 14 and R 15 may be bonded to each other to form a ring,
    m is 2 or 3; )
    A compound represented by
  15. 下記式(3):
    Figure JPOXMLDOC01-appb-C000007
    (式中、
    、R、及びRは、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
    は、1個以上の置換基を有していてもよい炭化水素基であり、
    及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であり、
    EWGは電子求引基であり、
    、R、R、及びEWGのうち任意の2つは互いに結合して環を形成していてもよく、
    及びRは、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、
    及びRは互いに結合して環を形成していてもよい。)
    で表される化合物と、
    下記式(4):
    Figure JPOXMLDOC01-appb-C000008
    (式中、
    11、R12、及びR13は、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
    は、1個以上の置換基を有していてもよい炭化水素基であり、
    及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であるか、R及びRは、互いに結合して隣接する窒素原子と共に環を形成していてもよく、
    16は電子求引基であり、
    11、R12、R13、及びR16のうち任意の2つは互いに結合して環を形成していてもよく、
    14及びR15は、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、R14及びR15は互いに結合して環を形成していてもよく、
    mは2又は3である。)
    で表される化合物とを含有する組成物。
    Formula (3) below:
    Figure JPOXMLDOC01-appb-C000007
    (In the formula,
    R 1 , R 2 , and R 3 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
    RA is a hydrocarbon group optionally having one or more substituents,
    R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents,
    EWG is an electron withdrawing group,
    Any two of R 1 , R 2 , R 3 , and EWG may combine with each other to form a ring,
    R 4 and R 5 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents and a fluoroalkoxy group which may contain an oxygen atom between carbon atoms,
    R 4 and R 5 may combine with each other to form a ring. )
    A compound represented by
    Formula (4) below:
    Figure JPOXMLDOC01-appb-C000008
    (In the formula,
    R 11 , R 12 and R 13 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
    RA is a hydrocarbon group optionally having one or more substituents,
    R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with
    R 16 is an electron withdrawing group,
    Any two of R 11 , R 12 , R 13 and R 16 may be bonded to each other to form a ring,
    R 14 and R 15 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may contain an oxygen atom between the carbon atoms, and R 14 and R 15 may be bonded to each other to form a ring,
    m is 2 or 3; )
    A composition containing a compound represented by
  16. 前記式(3)で表される化合物100質量部に対して前記式(4)で表される化合物を0.0001~150質量部含有する、請求項15に記載の組成物。 16. The composition according to claim 15, containing 0.0001 to 150 parts by mass of the compound represented by formula (4) with respect to 100 parts by mass of the compound represented by formula (3).
  17. 前記式(3)で表される化合物100質量部に対して前記式(4)で表される化合物を0.0001~100質量部含有する、請求項15又は16に記載の組成物。 The composition according to claim 15 or 16, containing 0.0001 to 100 parts by mass of the compound represented by formula (4) per 100 parts by mass of the compound represented by formula (3).
  18. 前記式(3)で表される化合物100質量部に対して前記式(4)で表される化合物を0.0001~50質量部含有する、請求項15~17のいずれか一項に記載の組成物。 0.0001 to 50 parts by mass of the compound represented by the formula (4) with respect to 100 parts by mass of the compound represented by the formula (3), according to any one of claims 15 to 17 Composition.
  19. 下記式(5):
    Figure JPOXMLDOC01-appb-C000009
    (式中、
    21、R22、及びR23は、それぞれ独立して、水素原子、ハロゲン原子、ヒドロキシル基、1個以上の置換基を有していてもよい炭化水素基、-OR、-COR、-COOR、-CONR、-NR、-NH-COR、又は-NH-COORであり、
    は、1個以上の置換基を有していてもよい炭化水素基であり、
    及びRは、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基であるか、R及びRは、互いに結合して隣接する窒素原子と共に環を形成していてもよく、
    21、R22、及びR23のうち任意の2つは互いに結合して環を形成していてもよく、
    24及びR25は、それぞれ独立して、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルキル基、又は、1個以上の置換基を有していてもよく、炭素原子間に酸素原子を含んでいてもよいフルオロアルコキシ基であり、R24及びR25は互いに結合して環を形成していてもよく、
    26は-OR27又は-NR2829であり、
    27は1個以上の置換基を有していてもよい炭化水素基であり、
    28及びR29は、それぞれ独立して、水素原子又は1個以上の置換基を有していてもよい炭化水素基である。)
    で表される化合物を含有しない、又は前記式(3)で表される化合物100質量部に対して前記式(5)で表される化合物を0質量部超50質量部以下含有する、請求項15~18のいずれか一項に記載の組成物。
    Formula (5) below:
    Figure JPOXMLDOC01-appb-C000009
    (In the formula,
    R 21 , R 22 and R 23 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a hydrocarbon group optionally having one or more substituents, —OR A , —COR A , -COOR A , -CONR B R C , -NR B R C , -NH-COR A , or -NH-COOR A ;
    RA is a hydrocarbon group optionally having one or more substituents,
    R B and R C are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents, or R B and R C are adjacent nitrogen atoms bound to each other may form a ring with
    Any two of R 21 , R 22 , and R 23 may combine with each other to form a ring,
    R 24 and R 25 each independently optionally have one or more substituents, a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or one or more substituents is a fluoroalkoxy group which may contain an oxygen atom between the carbon atoms, and R 24 and R 25 may be bonded to each other to form a ring,
    R 26 is —OR 27 or —NR 28 R 29 ;
    R 27 is a hydrocarbon group optionally having one or more substituents,
    R 28 and R 29 are each independently a hydrogen atom or a hydrocarbon group optionally having one or more substituents. )
    Does not contain the compound represented by, or contains more than 0 parts by mass and 50 parts by mass or less of the compound represented by the formula (5) with respect to 100 parts by mass of the compound represented by the formula (3) 19. The composition according to any one of 15-18.
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JPS63152342A (en) * 1986-07-11 1988-06-24 Sagami Chem Res Center Production of fluorine-containing carboxylic acid ester
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