WO2023066491A1 - Vitrage à faible émissivité et procédés de production associés - Google Patents

Vitrage à faible émissivité et procédés de production associés Download PDF

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Publication number
WO2023066491A1
WO2023066491A1 PCT/EP2021/079252 EP2021079252W WO2023066491A1 WO 2023066491 A1 WO2023066491 A1 WO 2023066491A1 EP 2021079252 W EP2021079252 W EP 2021079252W WO 2023066491 A1 WO2023066491 A1 WO 2023066491A1
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Prior art keywords
alloying agent
sputter target
alloy
concentration region
content
Prior art date
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PCT/EP2021/079252
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English (en)
Inventor
Asim AIJAZ
John Viktor ELOFSSON
Rickard Tim GUNNARSSON
Sankara PILLAY
Konstantinos SARAKINOS
Original Assignee
Mimsi Materials Ab
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Application filed by Mimsi Materials Ab filed Critical Mimsi Materials Ab
Priority to PCT/EP2021/079252 priority Critical patent/WO2023066491A1/fr
Publication of WO2023066491A1 publication Critical patent/WO2023066491A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3647—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer in combination with other metals, silver being more than 50%
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C03C17/366—Low-emissivity or solar control coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
    • C03C17/3673—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use in heating devices for rear window of vehicles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3694—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer having a composition gradient through its thickness
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/91—Coatings containing at least one layer having a composition gradient through its thickness
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/944—Layers comprising zinc oxide

Definitions

  • the present disclosure relates to a glazing for use as window glass or vehicle glass and a method of producing a glazing.
  • Background Glazings with a high visible transmittance and high infrared (IR) reflectance are desirable in many applications, allowing light in the visible portion of the electromagnetic spectrum to pass through the glazing while reflecting IR radiation to reduce heat transfer through the glazing.
  • Common types of glazings that are used in architectural applications include clear and tinted float glass, tempered glass, laminated glass as well as a variety of coated glasses, all of which can be glazed singly or as double, or even triple, glazing units.
  • the most efficient type of coating comprises at least one functional metal layer, which typically is made of silver (Ag) owing to its high IR reflectivity characteristics.
  • the high IR reflectivity typically yields a low emissivity of the coatings and they are commonly referred to as low emissivity (low-e) coatings.
  • the functional metal layers are deposited in between anti-reflective layers which each typically include at least one dielectric layer for tuning the optical properties of the glazing. These anti-reflective layers also provide some protection of the functional metal layers from chemical attack and/or mechanical stress.
  • conventional low-e coatings that include Ag as the functional metal layer have problems associated with mechanical durability of the coatings.
  • a glazing in the form of a window glass or vehicle glass, comprising a transparent glass substrate, and a coating, comprising, in order outward from the transparent glass substrate optionally, a diffusion barrier layer, a first anti-reflective layer, optionally, a first seed layer, a first composition modulated functional metal layer, optionally, at least a first blocker layer, a second anti-reflective layer, optionally, a top layer, wherein each anti-reflective layer has at least one dielectric layer, wherein the first composition modulated functional metal layer comprises a first Ag alloy consisting essentially of Ag and a first alloying agent, and wherein the content of the first alloying agent varies in the direction outward from the transparent glass substrate.
  • the glazing may be transparent.
  • transparent herein meant a glazing having visible light transmittance typically of the order of 30-90 %.
  • the glazing may be a sheet. Such a sheet may be planar, single curved or double curved.
  • the glazing can be used as a glass component of a building’s facade or internal surfaces (such as the glass panes in an insulated glass unit), and is also used to refer to the glass used in transport and utility vehicles (such as windshields and panoramic roofs).
  • transparent glass substrate is herein meant a substrate having a visible light transmittance typically of the order of 30-95 %.
  • the transparent glass substrate may be substantially planar.
  • composition modulated functional metal layer consists essentially of, or consists of, Ag and an alloying agent.
  • the Ag alloy layer contains substantially only elemental Ag and the alloying agent, but may contain insubstantial or incidental amounts of impurities ordinarily associated with Ag and the alloying agent, and may also contain incidental insubstantial or substantial amounts of materials that do not materially affect the basic and novel characteristics of the composition modulated functional metal layer.
  • the composition modulated functional metal layer may contain less than 0.1 wt.%, preferably less than 0.05 wt.%, most preferably less than 0.01 wt.% of other components, such as incidental impurites.
  • the alloying agent content is herein calculated as a ratio of the alloying agent to the sum of the amounts of the silver and the alloying agent. This means that possible incidental impurities are not included in the alloying agent content.
  • the term “varies” means that the ratio of Ag to alloying agent varies along a thickness direction of the first composition modulated functional metal layer. Preferably, the composition varies substantially continuously along said direction outwards from the transparent glass substrate.
  • the first alloying agent may have an entalphy of oxide formation that is lower than that of Ag.
  • the choice of the first alloying agent and the content of the first alloying agent may depend on the material in the adjacent layers. By having a varied content of the first alloying agent in the composition modulated functional metal layer, said alloying agent may have a higher concentration in a region close to one of the interfaces between the composition modulated functional metal layer and the adjacent layers, in comparison to the concentration of the first alloying agent at a region close to the other interface.
  • the composition modulated functional metal layer may comprise, in order outward from the transparent glass substrate a first alloy concentration region, a first transition region, a second alloy concentration region, and wherein the content of the first alloying agent in the first alloy concentration region is different from the content of the first alloying agent in the second alloy concentration region.
  • a region is a layer portion and will thus have a certain thickness, over which the content of the first alloying agent varies. In directions perpendicular to the thickness direction, i.e., parallel with the substrate surface, the content of the first alloying agent will be substantially constant.
  • a transition region is a region which connects the first and second alloy concentration areas, and in which the content of the first alloying agent varies more than in the first and second alloy concentration regions.
  • the first alloy concentration region may be a region of the layer in which the highest concentration of the first alloying agent is found.
  • the second alloy concentration region may be a region of the layer in which the lowest concentration of the first alloying agent is found.
  • a maximum content of the first alloying agent in the first alloy concentration region may be higher than a minimum content of the first alloying agent in the second alloy concentration region.
  • the maximum content of the first alloying agent in the first alloy concentration region may be at least 2 times higher, preferably at least 4 times higher than the minimum content of the first alloying agent in the second alloy concentration region.
  • the content of the first alloying agent in the first alloy concentration region may vary less than 50 %, preferably less than 40 %, more preferably less than 30 %, from an average content of the first alloying agent in the first alloy concentration region.
  • the first alloy concentration region may extend over a thickness portion of less than 10 nm, preferably less than 8 nm, more preferably less than 6 nm.
  • the maximum content of the first alloying agent in the first alloy concentration region may be 0.06-3.00 at.%, preferably 0.10-1.50 at.% of the first Ag alloy, the rest being Ag.
  • the maximum content of the first alloying agent in the first alloy concentration region may be selected from a group consisting of 0.06-0.08 at.%, 0.08-0.10 at.%, 0.10-0.12 at.%, 0.12-0.14 at.%, 0.14-0.16 at.%, 0.16-0.18 at.%, 0.18-0.20 at.%, 0.20- 0.22 at.%, 0.22-0.24 at.%, 0.24-0.26 at.%, 0.26-0.28 at.%, 0.28-0.30 at.%, 0.30-0.32 at.%, 0.32-0.34 at.%, 0.34-0.36 at.%, 0.36-0.38 at.%, 0.38-0.40 at.%, 0.40-0.42 at.%, 0.42-0.44 at.%, 0.44-0.46 at.%, 0.46-0.48 at.%, 0.48-0.50 at.%, 0.50-0.52 at.%, 0.52- 0.54 at.%, 0.54-0.56 at.%, 0.56-0.
  • the maximum content of the first alloying agent in the second alloy concentration region may be higher than the minimum content of the first alloying agent in the first alloy concentration region.
  • the maximum content of the first alloying agent in the second alloy concentration region may be at least 2 times higher, preferably at least 4 times higher, than the minimum content of the first alloying agent in the first alloy concentration region.
  • the content of the first alloying agent in the second alloy concentration region may vary less than 50 %, preferably less than 40 %, more preferably less than 30 %, from an average content of the first alloying agent in the second alloy concentration region.
  • the second alloy concentration region may extend over a thickness portion of less than 10 nm, preferably less than 8 nm, more preferably less than 6 nm.
  • the maximum content of the first alloying agent in the second alloy concentration region may be 0.06-3.00 at.%, preferably 0.10-1.50 at.% of the first Ag alloy, the rest being Ag.
  • the maximum content of the first alloying agent in the second alloy concentration region may be selected from a group consisting of 0.06-0.08 at.%, 0.08-0.10 at.%, 0.10-0.12 at.%, 0.12-0.14 at.%, 0.14-0.16 at.%, 0.16-0.18 at.%, 0.18- 0.20 at.%, 0.20-0.22 at.%, 0.22-0.24 at.%, 0.24-0.26 at.%, 0.26-0.28 at.%, 0.28-0.30 at.%, 0.30-0.32 at.%, 0.32-0.34 at.%, 0.34-0.36 at.%, 0.36-0.38 at.%, 0.38-0.40 at.%, 0.40-0.42 at.%, 0.42-0.44 at.%, 0.44-0.46 at.%,
  • the first Ag alloy may further comprise a second alloying agent, and the content of the second alloying agent may vary in the direction outward from the transparent glass substrate.
  • the second alloying agent may have an entalphy of oxide formation that is lower than that of Ag.
  • the purpose being to increase the bond strength of the composition modulated functional metal layer with any one of the adjacent layers, such as the first anti-reflective layer, the first seed layer, the at least a first blocker layer, and/or the second anti-reflective layer, in the coating that may be an oxide.
  • the choice of the second alloying agent and the content of the second alloying agent may depend on the material in the adjacent layers.
  • the first alloying agent may have a higher concentration in a region close to one of the interfaces between the composition modulated functional metal layer and the adjacent layers
  • the second alloying agent may have a higher concentration in a region close to the other interface between the composition modulated functional metal layer and the adjacent layers, compared to the concentration of said alloying agents in the centre of the composition modulated functional metal layer. This increases the bond strength at the interfaces between the composition modulated functional metal layer and the adjacent layers while minimizing any negative effects on the electrical and/or optical properties typically associated with alloying Ag.
  • the composition modulated functional metal layer may comprise, in order outward from the transparent glass substrate a first alloy concentration region, a first transition region, a second alloy concentration region, a second transition region, a third alloy concentration region, wherein the content of the first alloying agent in the first alloy concentration region may be different from the content of the first alloying agent in the second alloy concentration region, and wherein the content of the second alloying agent in the third alloy concentration region may be different from the content of the second alloying agent in the second alloy concentration region.
  • the maximum content of the first alloying agent in the first alloy concentration region may be higher than the minimum content of the first alloying agent in the second alloy concentration region, and the maximum content of the second alloying agent in the third alloy concentration region may be higher than the minimum content of the second alloying agent in the second alloy concentration region.
  • the maximum content of the first alloying agent in the first alloy concentration region may be at least 2 times higher, preferably at least 4 times higher, than the minimum content of the first alloying agent in the second alloy concentration region, and the maximum content of the second alloying agent in the third alloy concentration region may be at least 2 times higher, preferably at least 4 times higher, than the minimum content of the second alloying agent in the second alloy concentration region.
  • the content of the first alloying agent in the first alloy concentration region may vary less than 50 %, preferably less than 40 %, more preferably less than 30 %, from an average content of the first alloying agent in the first alloy concentration region, and the content of the second alloying agent in the third alloy concentration region may vary less than 50 %, preferably less than 40 %, more preferably less than 30 %, from an average content of the second alloying agent in the third alloy concentration region.
  • the first alloy concentration region and the third alloy concentration region may each extend over a thickness portion of less than about 6 nm, preferably less than about 5 nm, more preferably less than about 4 nm.
  • the first alloying agent and the second alloying agent may be the same.
  • the maximum content of the first alloying agent in the first alloy concentration area and the maximum content of the second alloying agent in the third alloy concentration area may be substantially the same.
  • the maximum content of the first alloying agent in the first alloy concentration region may be 0.06-3.00 at.%, preferably 0.10-1.50 at.% of the first Ag alloy, the rest being Ag.
  • the maximum content of the first alloying agent in the first alloy concentration region may be selected from a group consisting of 0.06-0.08 at.%, 0.08-0.10 at.%, 0.10-0.12 at.%, 0.12-0.14 at.%, 0.14-0.16 at.%, 0.16-0.18 at.%, 0.18-0.20 at.%, 0.20- 0.22 at.%, 0.22-0.24 at.%, 0.24-0.26 at.%, 0.26-0.28 at.%, 0.28-0.30 at.%, 0.30-0.32 at.%, 0.32-0.34 at.%, 0.34-0.36 at.%, 0.36-0.38 at.%, 0.38-0.40 at.%, 0.40-0.42 at.%, 0.42-0.44 at.%, 0.44-0.46 at.%, 0.46-0.48 at.%, 0.48-0.50 at.%, 0.50-0.52 at.%, 0.52- 0.54 at.%, 0.54-0.56 at.%, 0.56-0.
  • the maximum content of the second alloying agent in the third alloy concentration region may be 0.06-3.00 at.%, preferably 0.10-1.50 at.% of the first Ag alloy, the rest being Ag.
  • the maximum content of the second alloying agent in the third alloy concentration region may be selected from a group consisting of 0.06-0.08 at.%, 0.08-0.10 at.%, 0.10-0.12 at.%, 0.12-0.14 at.%, 0.14-0.16 at.%, 0.16-0.18 at.%, 0.18- 0.20 at.%, 0.20-0.22 at.%, 0.22-0.24 at.%, 0.24-0.26 at.%, 0.26-0.28 at.%, 0.28-0.30 at.%, 0.30-0.32 at.%, 0.32-0.34 at.%, 0.34-0.36 at.%, 0.36-0.38 at.%, 0.38-0.40 at.%, 0.40-0.42 at.%, 0.42-0.44 at.%, 0.44-0.46 at.%,
  • the first alloying agent may be selected from a group consisting of Li, C, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Rh, In, Sn, Sb, Hf, Ta, and W.
  • the second alloying agent may be selected from a group consisting of Li, C, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Rh, In, Sn, Sb, Hf, Ta, and W.
  • a method of producing a glazing in the form of window glass or vehicle glass comprising translating a transparent glass substrate in a translation direction, applying, by Physical Vapor Deposition, in order outward from the transparent glass substrate: optionally, a diffusion barrier layer, a first anti-reflective layer, optionally, a first seed layer, a first composition modulated functional metal layer, optionally, at least one first blocker layer, a second anti-reflective layer, optionally, a top layer, such that each anti- reflective layer has at least one dielectric layer, such that the first composition modulated functional metal layer comprises a first Ag alloy consisting essentially of Ag and a first alloying agent, such that the content of the first alloying agent varies in the direction outward from the transparent glass substrate.
  • the first composition modulated functional metal layer is provided by a first planar sputter target, comprising at least a first sputter target segment and a second sputter target segment.
  • the first sputter target segment comprises a first sputter target Ag alloy consisting essentially of Ag and the first alloying agent, and the second sputter target segment consists essentially of Ag.
  • a sputter target is a body of material that is to be sputtered.
  • the sputter target may comprise two or more sputter target segments.
  • the sputter target segments may be bonded to a backing plate using a bonding element, such as, e.g., In, Ag epoxy or an elastomer, to hold them into position.
  • the backing plate consists essentially of Cu.
  • the sputter target segments may be fastened where they are to be sputtered by other means, such as by clamping or screwing, which may be performed individually for each sputter target segment or together for the sputter target segments combined.
  • the sputter target segments may present a respective active sputter surface, which is elongated with a major direction and a minor direction, and the first sputter target segment and the second sputter target segment may be juxtaposed along the major direction.
  • An “active sputter surface” is a surface of the sputter target which is to face the substrate and from which material is to be released to be transferred towards the substrate.
  • the minor direction of the first planar sputter target may be parallel to the translation direction of the transparent glass substrate.
  • the sputter target segments may be arranged, in the translation direction of the transparent glass substrate taken in order of increasing distance translated by the transparent glass substrate, as follows: the first sputter target segment, and the second sputter target segment.
  • the sputter target segments may be arranged, in the translation direction of the transparent glass substrate taken in order of increasing distance translated by the transparent glass substrate, as follows: the second sputter target segment, and the first sputter target segment.
  • the first Ag alloy may further comprise a second alloying agent, such that the content of the second alloying agent varies in the direction outward from the transparent glass substrate.
  • the composition modulated functional metal layer may be provided by a second planar sputter target, comprising at least a third sputter target segment and a fourth sputter target segment, wherein the third sputter target segment consists essentially of Ag, and wherein the fourth sputter target segment comprises a second sputter target Ag alloy consisting essentially of Ag and the second alloying agent.
  • the sputter target segments may present a respective active sputter surface, which is elongated with a major direction and a minor direction, wherein the first sputter target segment and the second sputter target segment are juxtaposed along the major direction, and wherein the third sputter target segment and the fourth sputter target segment are juxtaposed along the major direction.
  • the second planar sputter target may be spaced from the first planar sputter target and arranged with the major direction of the third and fourth sputter target segments parallel to the major direction of the first and second sputter target segments.
  • the minor direction of the first planar sputter target and the minor direction of the second planar sputter target may be parallel to the translation direction of the transparent glass substrate.
  • the sputter target segments may be arranged, in the translation direction of the transparent glass substrate taken in order of increasing distance translated by the transparent glass substrate, as follows: the first sputter target segment, the second sputter target segment, the third sputter target segment, and the fourth sputter target segment.
  • a method of producing a glazing in the form of window glass or vehicle glass comprising translating a transparent glass substrate in a translation direction, applying, by Physical Vapor Deposition, in order outward from the transparent glass substrate: optionally, a diffusion barrier layer, a first anti-reflective layer, optionally, a first seed layer, a first composition modulated functional metal layer, optionally, at least one first blocker layer, a second anti-reflective layer, optionally, a top layer, such that each anti-reflective layer has at least one dielectric layer, such that the first composition modulated functional metal layer comprises a first Ag alloy consisting essentially of Ag and a first alloying agent, such that the content of the first alloying agent varies in the direction outward from the transparent glass substrate.
  • the first composition modulated functional metal layer is provided by a separate sputter target arrangement, comprising at least a first separate sputter target, wherein the first separate sputter target comprises a first sputter target Ag alloy consisting essentially of Ag and the first alloying agent, and a second separate sputter target, wherein the second separate sputter target consists essentially of Ag.
  • the first separate sputter target and the second separate sputter target are spaced from each other.
  • a “separate sputter target” is a sputter target which is formed as one body of material, in the sense that it is not physically connected or otherwise physically attached to any sputter target of any other material.
  • the separate sputter targets may be arranged, in the translation direction of the transparent glass substrate taken in order of increasing distance translated by the transparent glass substrate, as follows: the first separate sputter target, and the second separate sputter target.
  • the separate sputter targets may be arranged, in the translation direction of the transparent glass substrate taken in order of increasing distance translated by the transparent glass substrate, as follows: the second separate sputter target, and the first separate sputter target.
  • the first Ag alloy may further comprise a second alloying agent, such that the content of the second alloying agent varies in the direction outward from the transparent glass substrate.
  • the separate sputter target arrangement may further comprise a third separate sputter target, wherein the third separate sputter target is spaced from the first and second separate sputter targets, and wherein the third separate sputter target comprises a second sputter target Ag alloy consisting essentially of Ag and the second alloying agent.
  • the separate sputter targets may be arranged, in the translation direction of the transparent glass substrate taken in order of increasing distance translated by the transparent glass substrate, as follows: the first separate sputter target, the second separate sputter target, and the third separate sputter target. At least one of the separate sputter targets may be a planar sputter target.
  • the planar sputter target may present an active sputter surface, which is elongated with a major direction and a minor direction, and wherein the minor direction of the planar sputter target is parallel to the translation direction of the transparent glass substrate.
  • At least one of the separate sputter targets may be a rotatable sputter target.
  • the rotatable target may be tubular having a longitudinal axis along the center of the tube presenting an active sputter surface on the outer most surface of the tubular target, and wherein the longitudinal axis is perpendicular to the translation direction of the transparent glass substrate.
  • the first alloying agent may be selected from a group consisting of Li, C, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Rh, In, Sn, Sb, Hf, Ta, and W.
  • a first alloying agent content may be 0.06-3.00 at.%, preferably 0.10-1.50 at.% of the first sputter target Ag alloy, the rest being Ag.
  • the first alloying agent content may be selected from a group consisting of 0.06-0.08 at.%, 0.08-0.10 at.%, 0.10-0.12 at.%, 0.12-0.14 at.%, 0.14-0.16 at.%, 0.16- 0.18 at.%, 0.18-0.20 at.%, 0.20-0.22 at.%, 0.22-0.24 at.%, 0.24-0.26 at.%, 0.26-0.28 at.%, 0.28-0.30 at.%, 0.30-0.32 at.%, 0.32-0.34 at.%, 0.34-0.36 at.%, 0.36-0.38 at.%, 0.38-0.40 at.%, 0.40-0.42 at.%, 0.42-0.44 at.%, 0.44-0.46 at.%, 0.46-0.48 at.%, 0.48- 0.50 at.%, 0.50-0.52 at.%, 0.52-0.54 at.%, 0.54-0.56 at.%, 0.56-0.58 at.%, 0.58-0.6
  • the second alloying agent may be selected from a group consisting of Li, C, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Rh, In, Sn, Sb, Hf, Ta, and W.
  • a second alloying agent content may be 0.06-3.00 at.%, preferably 0.10-1.50 at.% of the second sputter target Ag alloy, the rest being Ag.
  • the second alloying agent content may be selected from a group consisting of 0.06-0.08 at.%, 0.08-0.10 at.%, 0.10-0.12 at.%, 0.12-0.14 at.%, 0.14-0.16 at.%, 0.16- 0.18 at.%, 0.18-0.20 at.%, 0.20-0.22 at.%, 0.22-0.24 at.%, 0.24-0.26 at.%, 0.26-0.28 at.%, 0.28-0.30 at.%, 0.30-0.32 at.%, 0.32-0.34 at.%, 0.34-0.36 at.%, 0.36-0.38 at.%, 0.38-0.40 at.%, 0.40-0.42 at.%, 0.42-0.44 at.%, 0.44-0.46 at.%, 0.46-0.48 at.%, 0.48- 0.50 at.%, 0.50-0.52 at.%, 0.52-0.54 at.%, 0.54-0.56 at.%, 0.56-0.58 at.%, 0.58-0.6
  • Fig.1 schematically illustrates an example of a glazing structure.
  • Fig.2 schematically illustrates an example of a part of a glazing structure with a composition modulated functional metal layer comprising three alloy concentration regions.
  • Fig.3 schematically illustrates an example of a part of a glazing structure with a composition modulated functional metal layer comprising five alloy concentration regions.
  • Fig.4 illustrates a non-limiting example of the alloying content of a composition modulated functional metal layer.
  • Fig.5 illustrates a non-limiting example of the alloying content of a composition modulated functional metal layer.
  • Fig.6a-6b schematically illustrate a non-limiting example of a planar sputter target used to sputter a layer on a substrate.
  • Fig.7a-7b schematically illustrate a non-limiting example of two planar sputter targets used to sputter a layer on a substrate.
  • Fig.8a-8c schematically illustrate a non-limiting example of two sputter targets used to sputter a layer on a substrate.
  • Fig.9a-9c schematically illustrate a non-limiting example of three sputter targets used to sputter a layer on a substrate.
  • the glazing 1 comprises a transparent glass substrate 11 and a coating 10 comprising multiple layers of thin film materials.
  • the coating 10 comprises an optional diffusion barrier layer 12, a first anti- reflective layer 13, an optional first seed layer 14, a first composition modulated functional metal layer 15, an optional at least a first blocker layer 16, a second anti- reflective layer 17 and an optional top layer 18.
  • the transparent glass substrate 11 may be a glass substrate, such as a soda- lime glass substrate.
  • the substrate may be homogeneous or laminated, comprising one or more glass layers and, e.g., one or more polymer films.
  • an outwardly exposed surface, on which the coating is deposited is made of glass.
  • the dimension of the transparent glass substrate 11 may range from over- sized glass panes, which, e.g., may be 3300 x 6000 mm or 3210 x 15000 mm or larger, down to small structures, e.g., 200 x 200 mm.
  • the described glazing is, however, not limited to any specific size of the substrate.
  • the thickness of the transparent glass substrate may be about 0.3 mm to 25 mm, or about 2 mm to 8 mm or 3 mm to 6 mm.
  • the described coating is, however, not limited to any thickness of the substrate 11.
  • An optional diffusion barrier layer 12 may be formed on the transparent glass substrate 11.
  • the diffusion barrier layer 12 may be a layer consisting essentially of aluminum oxide, silicon nitride or zinc stannate.
  • the diffusion barrier layer 12 may act as a barrier layer and the purpose of the diffusion barrier layer is to prevent sodium ions from diffusing from the glass into the other layers, such as the composition modulated functional metal layer 15, of the coating 10. Diffusion into the composition modulated functional metal layer 15 may have detrimental effects on said layer.
  • the first anti-reflective layer 13 may be formed either directly on the transparent glass substrate 11 or on the optional diffusion barrier layer 12.
  • the first anti-reflective layer 13 may comprise at least one dielectric layer consisting essentially of a metal oxide, such as tin oxide, zinc oxide, zinc tin oxide, titanium oxide, silicon oxide, niobium oxide or zirconium oxide, or a metal nitride, such as silicon nitride or titanium nitride, or combinations thereof.
  • the purpose of the first anti-reflective layer 13 is to tune the optical properties of the glazing 1 by tailoring the thickness of the at least one dielectric layer.
  • the first anti-reflective layer 13 may also protect the composition modulated functional metal layer 15 from chemical attack and/or mechanical stress.
  • the thickness of the first anti-reflective layer 13 may be about 5 to 120 nm, or about 15 to 100 nm, or about 20 nm to 90 nm.
  • a first seed layer 14 may be formed on top of the first anti-reflective layer 13, a first seed layer 14 may be formed.
  • the first seed layer 14 may be a layer consisting essentially of zinc oxide or zinc oxide doped by an additional element, such as aluminum.
  • the purpose of the first seed layer 14 is to improve the quality of the composition modulated functional metal layer 15.
  • composition modulated functional metal layer 15 may impose an epitaxial relationship to the composition modulated functional metal layer 15 so that the crystallites in the composition modulated functional metal layer 15 favour to grow with a (111) out-of-plane oriented texture and in that way increases electrical conductivity of the composition modulated functional metal layer 15.
  • the first seed layer 14 may also confer mechanical support to the composition modulated functional metal layer 15.
  • the thickness of the first seed layer 14 may be about 2 to 25 nm, or about 3 to 15 nm.
  • the composition modulated functional metal layer 15 may be formed onto the seed layer 14 or directly on the first anti-reflective layer 13.
  • the composition modulated functional metal layer 15 may have a first Ag alloy based on Ag and a first alloying agent, in which the content of the first alloying agent varies with the thickness of the composition modulated functional metal layer 15.
  • the first alloying agent content may be dived into a first alloy concentration region 19 and a second alloy concentration region 21.
  • the first alloy concentration region 19 and the second alloy concentration region 21 are separated and connected by a first transistion region 20, in which the content of the first alloying agent changes substantially continously.
  • the maximum content of the first alloying agent in the first alloy concentration region 19 may be higher than the minimum content of the first alloying agent in the second alloy concentration region 21, or the maximum content of the first alloying agent in the second alloy concentration region 21 may be higher than the minimum content of the first alloying agent in the first alloy concentration region 19.
  • a non-limiting example of the variation of the first alloying agent content in the composition modulated functional metal layer 15 is shown in Fig.4.
  • the thickness of each of the first alloy concentration region 19 and the second alloy concentration region 21 is less than 10 nm, preferably less than 8 nm, more preferably less than 6 nm.
  • the first Ag alloy may also have a second alloying agent.
  • the composition modulated functional metal layer 15 may be dived into a first alloy concentration region 19, a second alloy concentration region 21, and a third alloy concentration region 23.
  • the first alloy concentration region 19 and the second alloy concentration region 21 are separated from and connected to each other by a first transition region 20, in which the alloying agent changes substantially continously, and the third alloy concentration area 23 and the second alloy concentration area 21 are separated from and connected to each other by a second transition region 22, in which the alloying agent changes substantially continously.
  • the first alloying agent content in the first alloy concentration region 19 and the second alloy concentration region 21 differs from each other, and the second alloying agent content in the third alloy concentration region 23 and the second alloy concentration region 21 differs from each other.
  • the first alloying agent and the second alloying agent may be different to each other, alternatively the first alloying agent and the second alloying agent are the same. Preferably, the first alloying agent and the second alloying agent are the same.
  • the maximum content of the first alloying agent in the first alloy concentration region 19 may be higher than the minimum content of the first alloying agent in the second alloy concentration region 21, and the maximum content of the second alloying agent in the third alloy concentration region 23 may be higher than the minimum content of the second alloying agent in the second alloy concentration region 21.
  • the maximum content of the first alloying agent in the first alloy concentration region 19 may be substantially the same as the maximum content of the second alloying agent in the third alloy concentration region 23, alternatively the maximum content of the first alloying agent in the first alloy concentration region 19 is higher as compared to the maximum content of the second alloying agent in the third alloy concentration region 23, or alternatively the maximum content of the first alloying agent in the first alloy concentration region 19 is lower as compared to the maximum content of the second alloying agent in the third alloy concentration region 23.
  • the thickness of each of the first alloy concentration region 19 and the third alloy concentration region 23 may be less than 6 nm, preferably less than 5 nm, more preferably less than 4 nm.
  • a non-limiting example of the variation of the content of the first alloying agent and the second alloying agent in the composition modulated functional metal layer is provided in Fig.5.
  • the first alloying agent and the second alloying agent are the same and the maximum content of the first alloying agent in the first alloy concentration region 19 is substantially the same as the maximum content of the second alloying agent in the third alloy concentration region 23.
  • the first Ag alloy may be Ag alloyed with a first alloying agent.
  • the first alloying agent may be Li, C, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Rh, In, Sn, Sb, Hf, Ta, and W.
  • the first Ag alloy may further be alloyed with a second alloying agent.
  • the second alloying agent may be Li, C, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Rh, In, Sn, Sb, Hf, Ta, and W.
  • the composition modulated functional metal layer 15 may have high IR reflectivity characteristics.
  • the thickness of the composition modulated functional metal layer 15 may be about 4 to 20 nm, or about 5 to 15 nm, or about 6 nm to 12 nm.
  • the glazing 1 may further comprise an at least a first optional blocker layer 16 formed on top of the composition modulated functional metal layer 15.
  • the at least a first blocker layer 16 may be an oxidized metal layer, based on nickel chrome, nickel, chrome, niobium, titanium, aluminum or zinc, or a metal nitride layer, based on nickel chrome or chrome, or combinations thereof.
  • the purpose of the at least a first blocker layer 16 is to improve the quality of the composition modulated functional metal layer 15 by protecting the composition modulated functional metal layer 15 during deposition of a subsequent layer, such as the second anti-reflective layer 17.
  • the thickness of the at least a first blocker layer 16 may be about 0.5 to 6 nm, or about 1 to 4 nm.
  • the second anti-reflective layer 17 may then be formed on the at least a first blocker layer 16 or directly on the composition modulated functional metal layer 15.
  • the second anti-reflective layer 17 may comprise at least one dielectric layer consisting essentially of a metal oxide, such as tin oxide, zinc oxide, zinc tin oxide, titanium oxide, silicon oxide, niobium oxide or zirconium oxide, or a metal nitride, such as silicon nitride or titanium nitride, or combinations thereof.
  • the purpose of the second anti-reflective layer 17 is to tune the optical properties of the glazing 1 by tailoring the thickness of the at least one dielectric layer.
  • the second anti-reflective layer 17 may also protect the composition modulated functional metal layer 15 from chemical attack and/or mechanical stress.
  • the thickness of the second anti-reflective layer 17 may be about 5 to 120 nm, or about 15 to 100 nm, or about 20 nm to 90 nm.
  • An optional top layer 18 may be formed on the second anti-reflective layer 17.
  • the optional top layer 18 may comprise a nitride, e.g., silicon nitride, or an oxide, e.g., aluminum oxide or titanium oxide.
  • the purpose of the optional top layer 18 is to protect the underlying layers from mechanical damage, e.g., scratches, and chemical attacks.
  • the coating 10 may be used as a so-called low-emissivity coating or a solar control coating.
  • the emissivity of such a coating is typically ⁇ 0.15, preferably ⁇ 0.10, more preferaby ⁇ 0.08.
  • the main purpose of a low-emissivity coating is to reflect heat (long wavelength IR radiation, such as 5 – 50 ⁇ m) back into the interior of, e.g., a building such that the heat is not lost to the outside of the building.
  • a solar control coating The main purpose of a solar control coating is to reflect solar heat (near wavelength IR radiation, such as 780 – 2500 nm) such that the interior of, e.g., a building or a vehicle is not heated by the sun.
  • solar heat near wavelength IR radiation, such as 780 – 2500 nm
  • two, three or four functional metal layers may be combined in a coating layer structure to form a glazing.
  • the layer structure of a glazing comprising two functional metal layers may be glass/anti-reflective layer/functional metal layer/anti-reflective layer/functional metal layer/anti-reflective layer.
  • a layer structure of a glazing comprising three functional metal layers may be glass/anti-reflective layer/functional metal layer/anti-reflective layer/functional metal layer/anti-reflective layer/functional metal layer/anti-reflective layer.
  • a layer structure of a glazing comprising four functional metal layers may be glass/anti-reflective layer/functional metal layer/anti-reflective layer/functional metal layer/anti-reflective layer/functional metal layer/anti-reflective layer/functional metal layer/anti-reflective layer/ functional metal layer/anti-reflective layer.
  • At least one of the functional metal layers may be the composition modulated functional metal layer 15, alternatively at least two of the functional metal layers may be the composition modulated functional metal layer 15, alternatively at least three of the functional metal layers may be the composition modulated functional metal layer 15, or four of the functional metal layers may be the composition modulated functional metal layer 15.
  • Functional metal layers in the layer stack that may not be the composition modulated functional metal layer 15 may be other metal layers that may have high IR reflectivity characteristics, such as Ag.
  • a solar control coating comprising two composition modulated functional metal layers 15 may be, excluding the optional layers, glass/a first anti-reflective layer/a first composition modulated functional metal layer/a second anti-reflective layer/a second composition modulated functional metal layer/a third anti-reflective layer.
  • the first Ag alloy in the first composition modulated functional metal layer and the second Ag alloy in the second functional metal layer may be different to each other, alternatively the first Ag alloy in the first composition modulated functional metal layer and the second Ag alloy in the second functional metal layer may be the same.
  • Each of the layers of the coating 10 in Fig.1 is formed by Physical Vapor Deposition (PVD), such as magnetron sputtering, evaporation, arc evaporation, pulsed laser deposition and combinations thereof.
  • PVD Physical Vapor Deposition
  • the layers are deposited by magnetron sputtering.
  • the layers of the coating 10 may be deposited one layer at a time.
  • the different layers may be deposited in the same or in different sputter zones.
  • the sputter zones may be spatially separated. Alternatively, the sputter zones may be completely or partially overlapping sputtering zones.
  • the sputter zones may be stationary and the transparent glass substrate may be moveable.
  • the transparent glass substrate may be passed through a sputter zone or between successive sputter zones by means of translation, and/or rotation of the substrate in relation to the sputter zones.
  • the dimensions of the sputtering zones may depend on the application and on the size of the substrate to be coated.
  • the deposition sources may be so-called sputtering targets. There may be different deposition sources used for each deposited layer. Alternatively, the same deposition source may be used for deposition of a number of different layers.
  • the composition modulated functional metal layer 15 may be deposited from a first planar sputtering target 101 that may have at least two sputter target segments as schematically illustrated in Fig.6a-6b.
  • the first sputter target segment 111 may have a first sputter target Ag alloy.
  • the first sputter target Ag alloy may be Ag alloyed with a first alloying agent.
  • the second sputter target segment 112 may be Ag.
  • material may first be deposited on to the transparent glass substrate 11 substanatially from the first sputter target segment 111, and subsequently substantially from the second sputter target segment 112. This causes the content of the first alloying agent in the composition modulated functional metal layer 15 to vary in the direction outward from the transparent glass substrate 11 in accordance with Fig.4.
  • first sputter target segment 111 and the second sputter target segment 112 may be interchanged, such that material may first be sputtered substanatially from the second sputter target segment 112 and subsequently substantially from the first sputter target segment 111.
  • this causes the region with the maximum alloying agent content to instead occur close to the thicker part of the layer, and correspondingly causes the region with the minimum alloying agent content to instead occur close to the initial part of the layer.
  • the region where the maximum content of the first alloying agent of the composition modulated functional metal layer 15 may be desired can be chosen.
  • the composition modulated functional metal layer 15 may be deposited from a first planar sputtering target 101, that may have at least a first sputter target segment 111 and a second sputter target segment 112, and a second planar sputtering target 102, that may have at least a third sputter target segment 113 and a fourth sputter target segment 114, as schematically illustrated in Fig.7a-7b.
  • the first sputter target segment 111 may have a first sputter target Ag alloy.
  • the first sputter target Ag alloy may be Ag alloyed with a first alloying agent.
  • the second sputter target segment 112 and the third sputter target segment 113 may be Ag.
  • the fourth sputter target segment 114 may have a second sputter target Ag alloy.
  • the second sputter target Ag alloy may be Ag alloyed with a second alloying agent.
  • the first alloying agent and the second alloying agent may be the same, alternatively the first alloying agent and the second alloying agent are different to each other.
  • the first alloying agent and the second alloying agent are the same.
  • the first alloying agent content and the second alloying agent content may be the same, alternatively the first alloying agent content and the second alloying agent content may be different to each other.
  • material may first be deposited on to the transparent glass substrate 11 substantially from the first sputter target segment 111, subsequently from the second sputter target segment 112, subsequently from the third sputter target segment 113, and finally from the fourth sputter target segment 114.
  • a non-limiting example of the corresponding alloying agent content in the composition modulated functional metal layer 15 is shown in the direction outward from the transparent glass substrate 11 for the case that the first alloying agent and the second alloying agent are the same, and that the content of the first alloying agent and the content of the second alloying agent are the same.
  • the sputter target segments 111, 112, 113, 114 may each be a homogeneous body of material.
  • the first sputter target segment 111 and the second sputter target segment 112 may be juxtaposed to each other.
  • the third sputter target segment 113 and the fourth sputter target segment 114 may be juxtaposed to each other.
  • the juxtaposed sputter target segments may be mounted in different ways to conform with the requirements of the coating machine.
  • the juxtaposed sputter target segments may be bonded to a backing plate that may consist essentially of Cu prior to being secured to the cathode inside the coating machine, or the juxtaposed sputter target segments may be clamped or screwed into position on the cathode inside the coating machine.
  • the dimensions of the planar sputter targets 101, 102 may range from smaller dimensions, such as, e.g., 488 mm x 88 mm x 15 mm, to larger sizes suitable for, e.g., jumbo coaters, such as 152 inches x 11 inches x 1.3 inches.
  • the described planar sputter targets 101, 102 are, however, not limited to any specific dimensions.
  • the composition modulated functional metal layer 15 may be deposited from a separate sputter target arrangement that may have at least a first separate sputter target 115 and a second separate sputter target 116 as schematically illustrated in Fig.8a-8c.
  • the first separate sputter target 115 may have a first sputter target Ag alloy.
  • the first sputter target Ag alloy may be Ag alloyed with a first alloying agent.
  • the second separate sputter target 116 may be Ag.
  • material may first be deposited on to the transparent glass substrate 11 substanatially from the first separate sputter target 115, and subsequently substantially from the second separate sputter target 116.
  • first alloying agent in the composition modulated functional metal layer 15 This causes the content of the first alloying agent in the composition modulated functional metal layer 15 to vary in the direction outward from the transparent glass substrate 11 in accordance with Fig.4.
  • the order of the first separate sputter target 115 and the second separate sputter target 116 may be interchanged, such that material may first be sputtered substanatially from the second separate sputter target 116 and subsequently substantially from the first separate sputter target 115.
  • this causes the region with the maximum alloying agent content to instead occur close to the thicker part of the layer, and correspondingly causes the region with the minimum alloying agent content to instead occur close to the initial part of the layer.
  • the composition modulated functional metal layer 15 may be deposited from a separate sputter target arrangement that may have at least a first separate sputter target 115, a second sputter target 116, and a third separate sputter target 116 as schematically illustrated in Fig.9a-9c.
  • the first separate sputter target 115 may have a first sputter target Ag alloy.
  • the first sputter target Ag alloy may be Ag alloyed with a first alloying agent.
  • the second separate sputter target 116 may be Ag.
  • the third separate sputter target 117 may have a second sputter target Ag alloy.
  • the second sputter target Ag alloy may be Ag alloyed with a second alloying agent.
  • the first alloying agent and the second alloying agent may be the same, alternatively the first alloying agent and the second alloying agent are different to each other.
  • the first alloying agent and the second alloying agent are the same.
  • the first alloying agent content and the second alloying agent content may be the same, alternatively the first alloying agent content and the second alloying agent content may be different to each other.
  • material may first be deposited on to the transparent glass substrate substanatially from the first separate sputter target 115, subsequently substantially from the second separate sputter target 116, and finally substantially from the third separate sputter target 117.
  • a non-limiting example of the corresponding alloying agent content in the composition modulated functional metal layer 15 is shown in the direction outward from the transparent glass substrate 11 for the case that the first alloying agent and the second alloying agent are the same, and that the content of the first alloying agent and the content of the second alloying agent are the same.
  • the separate sputter targets 115, 116, 117 may each be their own body of material that may be spaced from each other.
  • the distance in between the first separate sputter target 115 and the second separate sputter target 116, and the distance in between the second separate sputter target 116 and the third separate sputter target 117 may preferably be of the order of about 1-1000 mm, more preferably about 5-500 mm, and most preferably about 10-100 mm.
  • the described arrangement is, however, not limited to any specific distance between the separate sputter targets 115, 116, 117.
  • the first alloying agent of the first sputter target Ag alloy may be Li, C, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Rh, In, Sn, Sb, Hf, Ta, and W.
  • the second alloying agent of the second sputter target Ag alloy may be Li, C, Na, Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ge, Sr, Y, Zr, Nb, Mo, Rh, In, Sn, Sb, Hf, Ta, and W.
  • At least one of the separate sputter targets 115, 116, 117 may be a planar target as schematically illustrated in Fig.8b and 9b, alternatively at least one of the separate sputter targets 115, 116, 117 may be a rotatable target as schematically illustrated in Fig.8c and 9c.
  • Each of the deposited layers may, but need not, form a continuous layer onto the previous layer or onto the substrate.
  • additional layers Prior to deposition of the composition modulated functional metal layer 15, additional layers may be deposited onto the substrate. Examples of such layers are a diffusion barrier layer 12, an anti-reflective layer 13 and/or a seed layer 14. Additional layers may be deposited onto the composition modulated functional metal layer 15.
  • the PVD system in which the deposition of layers take place may have a base pressure of about 10 -2 Pa or below.
  • a typical pressure in the PVD system when using a sputtering gas, such as Ar, is typically in the range of 0.1 to 2 Pa.
  • the substrate is not intentionally heated during deposition of the layers of the coating.

Abstract

L'invention concerne un vitrage (1) qui se présente sous la forme d'une vitre ou d'un verre de véhicule, qui comprend un substrat en verre transparent (11), et un revêtement (10), comprenant, dans l'ordre vers l'extérieur à partir du substrat en verre transparent (11) : éventuellement, une couche barrière de diffusion (12), une première couche antireflet (13), éventuellement une première couche de germe (14), une première couche métallique fonctionnelle modulée en composition (15), éventuellement, au moins une première couche de blocage (16), une deuxième couche antireflet (17), éventuellement, une couche supérieure (18). Chaque couche antireflet (13, 17) possède au moins une couche diélectrique. La première couche métallique fonctionnelle modulée en composition (15) comprend un premier alliage d'Ag constitué essentiellement d'Ag et d'un premier agent d'alliage. La teneur en premier agent d'alliage varie dans la direction vers l'extérieur à partir du substrat de verre transparent (11). L'invention concerne également des procédés de production d'un tel vitrage.
PCT/EP2021/079252 2021-10-21 2021-10-21 Vitrage à faible émissivité et procédés de production associés WO2023066491A1 (fr)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3068742A1 (fr) * 2013-11-15 2016-09-21 Saint-Gobain Glass France Vitrage comprenant un substrat revetu d'un empilement comprenant au moins une couche fonctionnelle a base d'argent dope par du zinc
US20180251886A1 (en) * 2017-03-01 2018-09-06 Guardian Glass, LLC Coated article with low-e coating having protective doped silver layer for protecting silver based ir reflecting layer(s), and method of making same
WO2020083873A1 (fr) * 2018-10-22 2020-04-30 Mimsi Materials Ab Vitrification et procédé destiné à sa production
EP3862459A1 (fr) * 2018-10-03 2021-08-11 Mitsubishi Materials Corporation Film multicouche et cible de pulvérisation en alliage d'ag
WO2021214109A1 (fr) * 2020-04-21 2021-10-28 Mimsi Materials Ab Vitrage à commande solaire et procédé de production associé
WO2021214108A1 (fr) * 2020-04-21 2021-10-28 Mimsi Materials Ab Vitrage à faible émissivité et procédé de production associé
WO2021214107A1 (fr) * 2020-04-21 2021-10-28 Mimsi Materials Ab Vitrage solaire et son procédé de production
WO2021214110A1 (fr) * 2020-04-21 2021-10-28 Mimsi Materials Ab Vitrage à faible émissitivé et procédé de production associé

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3068742A1 (fr) * 2013-11-15 2016-09-21 Saint-Gobain Glass France Vitrage comprenant un substrat revetu d'un empilement comprenant au moins une couche fonctionnelle a base d'argent dope par du zinc
US20180251886A1 (en) * 2017-03-01 2018-09-06 Guardian Glass, LLC Coated article with low-e coating having protective doped silver layer for protecting silver based ir reflecting layer(s), and method of making same
EP3862459A1 (fr) * 2018-10-03 2021-08-11 Mitsubishi Materials Corporation Film multicouche et cible de pulvérisation en alliage d'ag
WO2020083873A1 (fr) * 2018-10-22 2020-04-30 Mimsi Materials Ab Vitrification et procédé destiné à sa production
WO2021214109A1 (fr) * 2020-04-21 2021-10-28 Mimsi Materials Ab Vitrage à commande solaire et procédé de production associé
WO2021214108A1 (fr) * 2020-04-21 2021-10-28 Mimsi Materials Ab Vitrage à faible émissivité et procédé de production associé
WO2021214107A1 (fr) * 2020-04-21 2021-10-28 Mimsi Materials Ab Vitrage solaire et son procédé de production
WO2021214110A1 (fr) * 2020-04-21 2021-10-28 Mimsi Materials Ab Vitrage à faible émissitivé et procédé de production associé

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