WO2022267730A1 - Method for synthesizing molecular glass, and use thereof as high-frequency low-dielectric-constant material - Google Patents
Method for synthesizing molecular glass, and use thereof as high-frequency low-dielectric-constant material Download PDFInfo
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- WO2022267730A1 WO2022267730A1 PCT/CN2022/092261 CN2022092261W WO2022267730A1 WO 2022267730 A1 WO2022267730 A1 WO 2022267730A1 CN 2022092261 W CN2022092261 W CN 2022092261W WO 2022267730 A1 WO2022267730 A1 WO 2022267730A1
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- Prior art keywords
- group
- substituted
- unsubstituted
- alkyl
- halogen
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- 239000011521 glass Substances 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title claims abstract description 18
- 239000000463 material Substances 0.000 title claims abstract description 16
- 230000002194 synthesizing effect Effects 0.000 title abstract 2
- 239000000178 monomer Substances 0.000 claims abstract description 62
- 239000011347 resin Substances 0.000 claims abstract description 29
- 229920005989 resin Polymers 0.000 claims abstract description 29
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000011159 matrix material Substances 0.000 claims abstract description 7
- 239000005022 packaging material Substances 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims description 57
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 54
- 229910052736 halogen Inorganic materials 0.000 claims description 41
- 150000002367 halogens Chemical group 0.000 claims description 41
- 125000001424 substituent group Chemical group 0.000 claims description 39
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 33
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 32
- -1 C1 -C6 alkyl Chemical group 0.000 claims description 29
- 238000006467 substitution reaction Methods 0.000 claims description 29
- 239000002994 raw material Substances 0.000 claims description 27
- 239000012442 inert solvent Substances 0.000 claims description 25
- 229910052739 hydrogen Inorganic materials 0.000 claims description 23
- 239000001257 hydrogen Substances 0.000 claims description 23
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 18
- 238000006243 chemical reaction Methods 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 16
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 claims description 15
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 12
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 claims description 12
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 12
- 125000000041 C6-C10 aryl group Chemical group 0.000 claims description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 11
- 125000005103 alkyl silyl group Chemical group 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 11
- 125000006650 (C2-C4) alkynyl group Chemical group 0.000 claims description 10
- 238000004132 cross linking Methods 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 8
- 239000003960 organic solvent Substances 0.000 claims description 7
- 125000005504 styryl group Chemical group 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 125000000171 (C1-C6) haloalkyl group Chemical group 0.000 claims description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052794 bromium Inorganic materials 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 239000008096 xylene Substances 0.000 claims description 4
- 239000012046 mixed solvent Substances 0.000 claims description 2
- 229960001701 chloroform Drugs 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 abstract description 12
- 238000004891 communication Methods 0.000 abstract description 11
- 230000009477 glass transition Effects 0.000 abstract description 9
- 238000004377 microelectronic Methods 0.000 abstract description 4
- 238000002844 melting Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000001723 curing Methods 0.000 description 42
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 14
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- 238000004440 column chromatography Methods 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- 239000002904 solvent Substances 0.000 description 8
- 125000003118 aryl group Chemical group 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 239000003444 phase transfer catalyst Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 6
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 238000013007 heat curing Methods 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 230000035484 reaction time Effects 0.000 description 5
- 150000003384 small molecules Chemical class 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 5
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 4
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 238000003747 Grignard reaction Methods 0.000 description 4
- 239000007818 Grignard reagent Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 230000008054 signal transmission Effects 0.000 description 4
- 238000002791 soaking Methods 0.000 description 4
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 4
- 230000000930 thermomechanical effect Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 150000000182 1,3,5-triazines Chemical class 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000001548 drop coating Methods 0.000 description 3
- 125000003709 fluoroalkyl group Chemical group 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229920006125 amorphous polymer Polymers 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 2
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 2
- 239000000920 calcium hydroxide Substances 0.000 description 2
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- 238000001938 differential scanning calorimetry curve Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- SHFJWMWCIHQNCP-UHFFFAOYSA-M hydron;tetrabutylazanium;sulfate Chemical compound OS([O-])(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC SHFJWMWCIHQNCP-UHFFFAOYSA-M 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 description 2
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 2
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 description 1
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- ZBTMRBYMKUEVEU-UHFFFAOYSA-N 1-bromo-4-methylbenzene Chemical compound CC1=CC=C(Br)C=C1 ZBTMRBYMKUEVEU-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 125000003601 C2-C6 alkynyl group Chemical group 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- QPRWVVKDICKUHE-UHFFFAOYSA-M [Br-].C1=CC2=C1C=CC(=C2)[Mg+] Chemical compound [Br-].C1=CC2=C1C=CC(=C2)[Mg+] QPRWVVKDICKUHE-UHFFFAOYSA-M 0.000 description 1
- NFSMTXPGEBBLLV-UHFFFAOYSA-M [Br-].CC1=CC=CC([Mg+])=C1 Chemical compound [Br-].CC1=CC=CC([Mg+])=C1 NFSMTXPGEBBLLV-UHFFFAOYSA-M 0.000 description 1
- GYEDYCXSVDFAGA-UHFFFAOYSA-M [Br-].C[Si](C)(C)C1=CC=C([Mg+])C=C1 Chemical compound [Br-].C[Si](C)(C)C1=CC=C([Mg+])C=C1 GYEDYCXSVDFAGA-UHFFFAOYSA-M 0.000 description 1
- YBPFQOFSPMWGKA-UHFFFAOYSA-M [Cl-].CC1=CC=C([Mg+])C=C1 Chemical compound [Cl-].CC1=CC=C([Mg+])C=C1 YBPFQOFSPMWGKA-UHFFFAOYSA-M 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 1
- 150000001924 cycloalkanes Chemical class 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000012812 general test Methods 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- BVUQKCCKUOSAEV-UHFFFAOYSA-M magnesium;methylbenzene;bromide Chemical compound [Mg+2].[Br-].CC1=CC=[C-]C=C1 BVUQKCCKUOSAEV-UHFFFAOYSA-M 0.000 description 1
- GSGLQNHTMFEZOC-UHFFFAOYSA-M magnesium;propan-2-ylbenzene;bromide Chemical compound [Mg+2].[Br-].CC(C)C1=CC=[C-]C=C1 GSGLQNHTMFEZOC-UHFFFAOYSA-M 0.000 description 1
- JFWSITPEDQPZNZ-UHFFFAOYSA-M magnesium;tert-butylbenzene;bromide Chemical compound [Mg+2].[Br-].CC(C)(C)C1=CC=[C-]C=C1 JFWSITPEDQPZNZ-UHFFFAOYSA-M 0.000 description 1
- XKBGEWXEAPTVCK-UHFFFAOYSA-M methyltrioctylammonium chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC XKBGEWXEAPTVCK-UHFFFAOYSA-M 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 229930015698 phenylpropene Natural products 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000006462 rearrangement reaction Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000010129 solution processing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/22—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to two ring carbon atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F112/34—Monomers containing two or more unsaturated aliphatic radicals
Definitions
- the invention relates to the field of high-performance low-permittivity thermosetting resin materials, in particular to a directly thermally curable "molecular glass” monomer, its preparation method and its application as a high-frequency low-permittivity material.
- 5G communication technology will rely more on new materials than any previous generation, mainly because of the high signal transmission speed (about 10Gbps) and low signal delay ( ⁇ 1ms) of 5G communication. And features such as multi-user access.
- sub-6GHz and millimeter waves will be used for signal transmission.
- millimeter wave frequency when the electric field passes through the medium, the heat loss due to the alternating polarization of the medium molecules and the back and forth collision of the lattice will be intensified.
- the signal transmission loss in communication technology mainly includes conductor loss (T LC ) and dielectric loss (T LD ), and the dielectric loss T LD is related to the dielectric constant (D k ) and dielectric loss (D f ) of the dielectric material.
- D k dielectric constant
- D f dielectric loss
- K represents the coefficient
- f represents the frequency
- c represents the speed of light. Therefore, in high-frequency communication, in order to reduce signal transmission loss, the Dk and Df values of dielectric materials must be reduced as much as possible.
- these dielectric materials are also required to have high mechanical strength, high Young's modulus, high breakdown voltage, low leakage, high thermal stability, good bond strength with conductors, low water absorption and good Processing performance.
- materials widely used in 5G communication technology include polytetrafluoroethylene (PTFE), modified polyphenylene ether (MPPE), modified polyimide (MPI), LCP, etc. Due to the low elastic modulus, poor conductor adhesion and high linear thermal expansion coefficient of PTFE, its application in ultra-thin circuit boards is limited. MPPE substrate has excellent dielectric properties, but its thermal stability and dimensional stability are poor, making it difficult to meet high material processing requirements. Therefore, there is an urgent need to develop new high-frequency low-dielectric constant materials to meet the application requirements of 5G communications.
- film-forming property is a key performance parameter.
- polymer materials with an amorphous state are generally used, and uniform and dense thin films can be formed by solution processing methods, but polymers have The disadvantages of uncontrollable synthesis and difficult purification.
- Small molecular compounds can well solve the problems of uncontrollable synthesis and difficult purification, but because the molecular weight of general small molecular compounds is not large enough, the formed thin film is thermally unstable and prone to aggregation and crystallization. Therefore, preparing a compound that is easy to purify and can form an amorphous film can effectively solve this problem.
- Molecular glass is a class of small molecular compounds with relatively large molecular weight and amorphous characteristics like polymers at room temperature. It has the characteristics of controllable small molecule synthesis, easy purification and amorphous polymer. When it is solidified at high temperature, it will not melt and flow like ordinary small molecule monomers, which will affect the performance of the film, and has excellent processing advantages. Therefore, the development of molecular glasses that can be used as low dielectric constant materials has important application value.
- the object of the present invention is to provide a "molecular glass" monomer with excellent processability and its preparation method, and a resin with excellent high frequency and low dielectric properties prepared from the monomer and its application.
- Each R is independently selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein the substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the following groups: halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or 1-3 hydrogen atoms on the benzene ring are substituted by a substituent selected from the following group: halogen, C1-C4 alkyl;
- Each R is independently selected from the group consisting of C3 - C8 benzocycloalkenyl, C2-C6 alkenylphenyl;
- R 3 and R 4 are each independently selected from the following group: hydrogen, substituted or unsubstituted C1-C6 alkyl, substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one or more Each hydrogen atom is replaced by a substituent selected from the group consisting of halogen, C1-C4 alkyl.
- the halogen is fluorine
- each R 1 is the same or different, preferably the same.
- each R 1 is independently located at the meta or para position of the carbon atom on the benzene ring connected to the triazine, preferably the para position.
- each R 2 is the same or different, preferably the same.
- R 3 and R 4 are the same or different, preferably the same.
- each R1 is independently selected from the following group: hydrogen, halogen, C1 -C6 alkyl, C1-C6 haloalkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1 -C15 alkylsilyl;
- Each R is independently selected from the group consisting of: C3 - C6 benzocycloalkenyl, C2-C4 alkenylphenyl;
- R 3 and R 4 are the same or different. When they are the same, they are selected from the following groups: hydrogen, C1-C6 alkyl, C1-C6 haloalkyl, substituted or unsubstituted C6-C10 aryl; when they are different, R 3 and One of R 4 is C1-C6 alkyl and C1-C6 haloalkyl, and the other of R 3 and R 4 is substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one or Multiple hydrogen atoms are substituted by substituents selected from the group consisting of halogen, C1-C4 alkyl.
- each R1 is independently selected from the following group: hydrogen, fluorine, C1 -C4 alkyl, C1-C4 fluoroalkyl, C1-C12 alkylsilyl;
- Each R 2 is independently selected from the group consisting of benzocyclobutenyl, styryl;
- R 3 and R 4 are the same or different. When they are the same, they are selected from the following groups: hydrogen, C1-C4 alkyl, C1-C4 fluoroalkyl, and substituted phenyl; when they are different, one of R 3 and R 4 C1-C4 alkyl and C1- C4 fluoroalkyl, the other of R3 and R4 is a substituted phenyl group, wherein the substitution means that one or more hydrogen atoms on the group are selected from the following group Substituent substitution: fluorine, C1-C4 alkyl.
- each R1 is independently selected from the following group: hydrogen, fluorine, methyl, ethyl, isopropyl, tert-butyl, trimethylsilyl, triethylsilyl, triiso Propylsilyl, Tributylsilyl, Trifluoromethyl.
- benzocyclobutenyl is N-(2-aminoethyl)-2-aminoethyl
- the styryl is N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N
- R 3 and R 4 are the same or different, and when they are the same, they are selected from the following groups: hydrogen, trifluoromethyl, methyl, and substituted phenyl; when they are different, they are methyl and substituted phenyl , trifluoromethyl and substituted phenyl groups.
- the substitution means that the group is substituted by one or more substituents selected from the following substituents: C1-C4 alkyl and fluorine atoms.
- each group is a specific group described in each compound of the embodiment.
- the monomer is selected from the following group:
- the glass transition temperature of the monomer is 50-100°C, preferably 70-90°C.
- R is selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein said Substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the group consisting of halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or benzene ring 1-3 hydrogen atoms are substituted by substituents selected from the following phenyl group: halogen, C1-C4 alkyl;
- R is selected from the group consisting of: C3 - C8 benzocycloalkenyl, C2-C6 alkenylphenyl;
- R 3 and R 4 are each independently selected from the following group: hydrogen, substituted or unsubstituted C1-C6 alkyl, substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one or more Each hydrogen atom is replaced by a substituent selected from the group consisting of halogen, C1-C4 alkyl.
- R 1 , R 2 , R 3 , and R 4 are as defined in the first aspect of the present invention.
- R is selected from the following group: C1 -C4 alkyl, C2-C4 alkenyl, C1-C12 alkylsilyl;
- R 2 is selected from the group consisting of benzocyclobutenyl, styryl;
- R 3 and R 4 are the same or different. When they are the same, they are selected from the following groups: hydrogen, C1-C4 alkyl, C1-C4 haloalkyl, substituted phenyl; when they are different, one of R 3 and R 4 is C1 -C4 alkyl and C1- C4 haloalkyl, the other of R3 and R4 is a substituted phenyl group, wherein the substitution means that one or more hydrogen atoms on the group are replaced by a substituent selected from the following group: Fluorine, C1-C4 alkyl.
- the molar ratio of the compound of formula II to the compound of formula III is 1:0.2-2, preferably 1:0.4-0.1, more preferably 1:0.5-0.6.
- the first inert solvent is a mixed solvent of an organic solvent and water, wherein the organic solvent is selected from the group consisting of dichloromethane, chloroform, dichloroethane, toluene, xylene, or a combination thereof.
- the volume ratio of the organic solvent to water in the first inert solvent is 1:1.0-10.0, preferably 1:1.0-2.0, for example 1:1.5.
- the molar volume ratio of the compound of formula II to the first inert solvent is 0.05-0.3mol/L, preferably 0.06-0.2mol/L, such as 0.1mol/L, 0.12mol/L, 0.15mol /L, 0.2mol/L.
- the method is carried out in a water-oil two-phase system.
- the method is carried out in the presence of a phase transfer catalyst.
- the phase transfer catalyst is selected from the group consisting of benzyltriethylammonium chloride, tetrabutylammonium bromide, tetrabutylammonium chloride, tetrabutylammonium bisulfate, trioctyl Methylammonium chloride, dodecyltrimethylammonium chloride, cetyltrimethylammonium bromide, or combinations thereof.
- the molar ratio of the phase transfer catalyst to the compound of formula III is 0.001 to 0.1, such as 0.005, 0.01, 0.05, 0.08.
- the base is an inorganic base selected from the group consisting of sodium hydroxide, potassium hydroxide, calcium hydroxide, potassium carbonate, cesium carbonate, or a combination thereof.
- the molar ratio of the inorganic base to the compound of formula II is 1.0-5.0:1, such as 2:1, 3:1, 4:1.
- step (a) includes:
- the aqueous phase includes a compound of formula III, an alkali and water;
- the oil phase includes a compound of formula II, an organic solvent and a phase transfer catalyst
- the step (a) includes: first adding the compound of formula III, alkali and water; then adding the compound of formula II, an organic solvent and a phase transfer catalyst, heating and stirring for reaction to obtain the compound of formula I.
- step (a) is carried out at 0-100°C, preferably at 20-80°C, more preferably at 30-60°C.
- reaction time of step (a) is 2-24h, preferably 4-16h, more preferably 6-16h.
- the compound of formula I is obtained by extraction, drying, desolventization under reduced pressure, and column chromatography.
- R is selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein said Substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the group consisting of halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or benzene ring 1-3 hydrogen atoms are substituted by substituents selected from the following phenyl group: halogen, C1-C4 alkyl;
- R 2 is selected from the group consisting of C3-C8 benzocycloalkenyl, C2-C6 alkenylphenyl.
- R 1 and R 2 are as defined in the first aspect of the present invention.
- R 1 is located at the meta or para position of the carbon atom on the benzene ring connected to the triazine, preferably the para position.
- R is selected from the following group: C1 -C4 alkyl, C2-C4 alkenyl, C1-C12 alkylsilyl;
- R 2 is selected from the group consisting of benzocyclobutenyl, styryl.
- the compound is N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl
- a method for preparing a triazine compound as described in the third aspect of the present invention comprising the following steps:
- the compound of formula A is used to perform a substitution reaction with a compound of formula B, and then with a compound of formula C to obtain a compound of formula II; or
- R is selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein said Substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the group consisting of halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or benzene ring 1-3 hydrogen atoms are substituted by substituents selected from the following phenyl group: halogen, C1-C4 alkyl;
- R is selected from the group consisting of: C3 - C8 benzocycloalkenyl, C2-C6 alkenylphenyl;
- X 1 and X 2 are each independently halogen, preferably Cl or Br.
- said step (1) includes the following steps:
- the intermediate 1 is obtained by performing a substitution reaction with a compound of formula A and a compound of formula B;
- R 1 and R 2 are as defined in the first aspect of the present invention.
- the inert gas is selected from the group consisting of nitrogen and argon.
- the compound of formula B is selected from the group consisting of 4-methylphenylmagnesium bromide, 4-methylphenylmagnesium chloride, 3-methylphenylmagnesium bromide, 4-isopropyl Phenylmagnesium bromide, 4-tert-butylphenylmagnesium bromide, 4-trimethylsilylphenylmagnesium bromide, or combinations thereof.
- the molar ratio of the compound of formula A to the compound of formula B is 1:1-5, such as 1:1, 1:1.5, 1:2.
- step (a1) is carried out at -20-10°C, preferably -10-5°C, more preferably -5-0°C.
- reaction time of step (a1) is 10-30h, preferably 15-25h.
- the step (a1) includes: adding the compound of formula B to the compound of formula A dropwise under the protection of an inert gas to react to obtain intermediate 1.
- step (a1) after the quenching of the reaction in step (a1), extraction is performed, the solvent is removed by concentration, and intermediate 1 is obtained by column chromatography.
- the compound of formula C is selected from the group consisting of 4-benzocyclobutenylmagnesium bromide, 4-styrylmagnesium bromide, or combinations thereof.
- the molar ratio of the intermediate 1 to the compound of formula C is 1:0.5-3, such as 1:1, 1:1.5, 1:2, 1:3.
- the second inert solvent is selected from the group consisting of chloroform, toluene, acetone, tetrahydrofuran, dioxane, or combinations thereof, preferably tetrahydrofuran.
- step (b1) is carried out at 5-60°C, preferably 10-50°C, more preferably 10-45°C.
- reaction time of step (b1) is 2-15h, preferably 5-10h, more preferably 6-8h.
- step (b1) includes: adding dropwise a solution of the compound of formula C in the second inert solvent to the solution of intermediate 1 in the second inert solvent to obtain the compound of formula II.
- the concentration of the intermediate in the solution of the intermediate 1 in the second inert solvent is 0.1-0.8mol/L, preferably 0.2-0.6mol/L, such as 0.3mol/L, 0.35mol/L L, 0.4mol/L, 0.5mol/L.
- the concentration of the compound of formula C in the solution of the compound of formula C in the second inert solvent is 0.3-1.2mol/L, preferably 0.5-1mol/L, such as 0.6mol/L, 0.7mol/L L, 0.8mol/L, 0.9mol/L.
- step (b1) after the reaction in step (b1), the solvent is removed under reduced pressure, and the compound of formula II is obtained by column chromatography.
- said step (2) includes the following steps:
- R 1 and R 2 are as defined in the first aspect of the present invention.
- reaction conditions of step (b1) are the same as those of step (a2); the reaction conditions of step (b2) are the same as those of step (a1).
- the preparation method of the compound of formula III comprises the following steps:
- R 3 and R 4 are each independently selected from the following group: hydrogen, substituted or unsubstituted C1-C6 alkyl, substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one of the or multiple hydrogen atoms are substituted by substituents selected from the following group: halogen, C1-C4 alkyl;
- Y is halogen, preferably Cl, Br.
- R 3 and R 4 are the same or different, and when they are the same, they are selected from the following groups: hydrogen, trifluoromethyl, methyl, and substituted phenyl; when they are different, they are methyl and substituted phenyl , trifluoromethyl and substituted phenyl groups.
- the substitution means that the group is substituted by one or more substituents selected from the following substituents: C1-C4 alkyl and fluorine atoms.
- R 3 and R 4 are as defined in the first aspect of the present invention.
- the compound of formula D is a bisphenol compound substituted by R 3 and R 4 , preferably bisphenol A or bisphenol AF.
- the molar ratio of the compound of formula D to the compound of formula E is 3-5:1.
- the third inert solvent is selected from the group consisting of chloroform, toluene, acetone, tetrahydrofuran, dioxane, or combinations thereof, preferably acetone.
- the molar volume ratio of the compound of formula D to the third inert solvent is 0.1-1 mol/L, such as 0.1 mol/L, 0.2 mol/L, 0.3 mol/L, 0.4 mol/L, 0.5 mol/L.
- the base is selected from the group consisting of sodium hydroxide, potassium hydroxide, calcium hydroxide, potassium carbonate, sodium carbonate, or combinations thereof, preferably potassium carbonate.
- the molar ratio of the compound of formula D to the base is 0.1-1, preferably 0.2-0.5, such as 0.2, 0.3, 0.4, 0.5.
- step (1) is carried out at 40-100°C, preferably at 50-80°C, more preferably at 60-70°C.
- reaction time of step (1) is 6-48h, preferably 12-24h.
- the heating temperature in step (2) is 160-250°C.
- reaction time of the reaction is 6-48h, preferably 9-24h.
- the compound of formula III is obtained by rectifying under reduced pressure and separated by column chromatography.
- a cured product is provided, the cured product is formed by cross-linking reaction of cured raw materials;
- the curing raw material includes the "molecular glass” monomer described in the first aspect of the present invention.
- the cured product is formed by cross-linking the cured raw material through a D-A reaction between double bonds and cycloolefins.
- the curing raw material includes the "molecular glass” monomer described in the first aspect of the present invention and other thermally curable monomers or polymers.
- the curing raw material is the "molecular glass” monomer described in the first aspect of the present invention, or a blend of the "molecular glass” monomer and other thermally curable monomers or polymers .
- the curing raw material also includes a thermally curable monomer comprising an R2 group in the structure ;
- R 2 is selected from the group consisting of C3-C8 benzocycloalkenyl, C2-C6 alkenylphenyl, preferably benzocyclobutenyl, styryl.
- the thermally curable monomer containing the R2 group in the structure is selected from the group consisting of benzocycloalkenes, alkenylbenzenes, acrylates, or combinations thereof, preferably benzocycloalkenes Butylene, Styrene, Allylbenzene, Methyl Acrylate, Ethyl Acrylate.
- the curing raw material further includes thermally curable low-dielectric polymers, such as low-dielectric polyimide, polyphenylene ether, polytetrafluoroethylene, and the like.
- thermally curable low-dielectric polymers such as low-dielectric polyimide, polyphenylene ether, polytetrafluoroethylene, and the like.
- the mole fraction of "molecular glass" monomer in the curing raw material is 10%-100%, preferably 30%-100%, more preferably 50%-100%.
- the curing raw material is the "molecular glass" monomer described in the first aspect of the present invention.
- the cured product is obtained by cross-linking the "molecular glass" monomer described in the first aspect of the present invention.
- the cured product is a three-dimensional structure obtained by a cross-linking reaction, which is a polymer.
- the cured product is a resin.
- the degree of crosslinking of the cured product is 50%-100%, preferably 70%-100%.
- the cured product is insoluble and infusible, has excellent low dielectric properties, excellent thermomechanical properties, low water absorption and excellent surface smoothness, especially high frequency and low dielectric properties.
- the cured product has one or more of the following characteristics:
- glass transition temperature is 250 ⁇ 500 °C, preferably 300 ⁇ 400 °C, more preferably 330 ⁇ 250 °C;
- the dielectric loss is 0.5 to 3 ⁇ 10 -3 (in the range of 5-10GHz), preferably 1 to 2.5 ⁇ 10 -3 , more preferably 1.0 to 2.3 ⁇ 10 -3 ;
- the coefficient of thermal expansion is 40-80ppm/°C (in the range of room temperature to 300°C), preferably 60-70ppm/°C;
- a method for preparing a cured product according to the fifth aspect of the present invention comprising the steps of: heating and curing the curing raw material to obtain a cured product;
- the curing raw material includes the "molecular glass” monomer described in the first aspect of the present invention.
- the curing raw material is as described in the fifth aspect of the present invention.
- the curing raw material is cured directly or in the form of a solution dissolved in a fourth inert solvent, so as to obtain a cured product.
- the fourth inert solvent is selected from the group consisting of toluene, xylene, trimethylbenzene, chlorobenzene, dichlorobenzene, diphenyl ether, cyclohexanone, chloroform, acetone, N,N -Dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide, N-methylpyrrolidone, triethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, or combinations thereof .
- the method for preparing the cured product is a method for curing raw materials.
- the curing is cross-linking and curing by heating (ie heat curing).
- the curing is performed under the protection of an inert gas, wherein the inert gas is selected from the group consisting of nitrogen and argon.
- the heat curing is carried out at 100-350°C, preferably 150-300°C.
- the heat curing is temperature programmed curing.
- the heat curing includes: curing at 170-190°C for 1-6 hours, then curing at 210-240°C for 3-8 hours, and then curing at 250-300°C for 0.25-2 hours.
- the heat curing includes: curing at 170-190° C. for 1-3 hours, then curing at 210-240° C. for 3-6 hours, and then curing at 250-300° C. for 0.25-1 hour.
- the heating and curing temperature is determined by the DSC curve of the curing raw material.
- the heating and curing time is determined by the structure, quality and shape of the curing raw material.
- the heating and curing further includes: before the heating and curing, slowly heating and/or mechanically vibrating the curing raw material, so as to remove air bubbles and form a dense liquid; preferably, the The temperature rise is from room temperature to 170-190°C.
- a product which contains the cured product as described in the fifth aspect of the present invention, the "molecular glass” monomer as described in the first aspect of the present invention;
- the article is prepared by using the cured product as described in the fifth aspect of the present invention, the "molecular glass” monomer as described in the first aspect of the present invention.
- the product is a high-frequency low-dielectric constant material, preferably a low-dielectric film substrate material, a low-dielectric film, a low-dielectric matrix resin, and a low-dielectric packaging material.
- the product includes: a substrate, and a film containing the cured product according to the fifth aspect of the present invention coated on the substrate.
- the product is prepared by the following method: molding with the curing raw material as described in the fifth aspect of the present invention to obtain a preform, and then heating and curing the preform, The product described is obtained.
- the forming is carried out by a forming process selected from the following group: pouring, solution spin coating, or solution drop coating.
- the solution spin coating or solution drop coating includes the step of: dissolving the curing raw material or the prepolymer of the curing raw material as described in the fifth aspect of the present invention in a fourth inert solvent to form a solution , followed by spin coating or drop coating;
- the prepolymer is an oligomer obtained by dissolving curing raw materials in a fourth inert solvent and heating and crosslinking.
- the prepolymer still maintains good solubility in the solution and has good processability.
- the degree of crosslinking of the prepolymer is 0.1%-50%, preferably 5%-30%.
- the fourth inert solvent is selected from the group consisting of toluene, xylene, trimethylbenzene, chlorobenzene, dichlorobenzene, diphenyl ether, cyclohexanone, chloroform, acetone, N,N -Dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide, N-methylpyrrolidone, triethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, or combinations thereof .
- the product is selected from the group consisting of low dielectric film substrate material, low dielectric film, low dielectric constant matrix resin, Low dielectric packaging materials, high frequency low dielectric constant materials.
- Figure 1 shows the DSC curves of molecular glass monomers M1 and M2 (heating rate 10°C/min).
- Figure 2 shows the DMA curves of the resin sample strips cured by the molecular glass monomers M1 and M2 (heating rate 5°C/min).
- Figure 3 shows the CTE curves of the resin sample strips cured by the molecular glass monomers M1 and M2 (heating rate 5°C/min).
- the inventor unexpectedly developed a "molecular glass” monomer and the resin obtained after curing for the first time.
- the "molecular glass” monomer has a rigid aryl group, a heat-curable group and a flexible allyl group.
- the structural characteristics of "rigid and flexible” make it have excellent processing performance and maintain an amorphous state at room temperature.
- the synthesis method of this monomer is simple, the conditions are mild, and the yield is high.
- the resin obtained by curing the "molecular glass” monomer exhibits excellent high-frequency dielectric properties (the dielectric constant is 2.53 at 10 GHz, and the dielectric loss is 1.93 ⁇ 10 -3 ), and the glass transition temperature is high (T g >339°C), low thermal expansion coefficient (25-300°C, CTE as low as 63.0ppm/°C), low water absorption (as low as 0.19%), can be used as high-performance matrix resin or packaging material for high-frequency communication, large Scale integrated circuits, microelectronics industry and aerospace and other fields.
- 'molecular glass' monomer and “molecular glass” are used interchangeably, and refer to the reaction of disubstituted 1,3,5-triazine and bisphenol as shown in formula (I). molecular compound.
- C3-C8 benzocycloalkenyl refers to a group formed by a polycyclic benzocycloalkane composed of a benzene ring and a cycloalkane with 3-8 carbon atoms when a hydrogen atom is lost on the benzene ring, For example, benzocyclobutenyl, benzocyclopentenyl, benzocyclohexenyl and the like.
- benzocyclobutenyl refers to a group formed by losing a hydrogen atom on the benzene ring of benzocyclobutene, for example or similar groups.
- C2-C6 alkenylphenyl refers to a group formed by the loss of a hydrogen atom on the benzene ring, such as styryl, 1- propenylphenyl, 1-butenylphenyl, etc.
- C1-C15 alkylsilyl means Wherein R 1 , R 2 , and R 3 are each independently the following C1-C6 alkyl groups, such as trimethylsilyl, triethylsilyl, triisopropylsilyl, tributylsilyl, etc.
- halogen refers to F, Cl, Br or I.
- C1-C6 alkyl refers to a linear or branched alkyl group comprising 1-6 carbon atoms, such as methyl, ethyl, propyl, isopropyl, butyl, iso Butyl, tert-butyl, neopentyl, tertyl, or similar groups.
- C1-C4 alkyl has a similar meaning.
- C2-C6 alkenyl refers to a straight-chain or branched alkenyl group with 2-6 carbon atoms containing a double bond, including non-limiting ethenyl, propenyl, butenyl , Isobutenyl, Pentenyl and Hexenyl etc.
- C2-C4 alkenyl has a similar meaning.
- C2-C4 alkynyl refers to a straight-chain or branched-chain alkynyl group with 2-4 carbon atoms containing a triple bond, including without limitation ethynyl, propynyl, butynyl base, isobutynyl, etc.
- aromatic ring or “aryl” has the same meaning, preferably “C6-C10 aryl”.
- C6-C10 aryl refers to an aromatic ring group having 6-10 carbon atoms without heteroatoms in the ring, such as phenyl, naphthyl and the like.
- substituted means that one or more hydrogen atoms on a specific group are replaced by a specific substituent.
- the specific substituents are the corresponding substituents described above, or the substituents appearing in each embodiment.
- a substituted group may have a substituent selected from a specific group at any substitutable position of the group, and the substituents may be the same or different at each position.
- substituents contemplated by this invention are those that are stable or chemically feasible.
- the substituents are for example (but not limited to): halogen, hydroxyl, carboxyl (-COOH), C1-C6 alkyl, C2-C6 alkenyl, C2-C6 alkynyl, C3-C8 cycloalkyl, 3- to 12-membered heterocyclic group, aryl group, heteroaryl group, C1-C8 aldehyde group, C2-C10 acyl group, C2-C10 ester group, amino group, C1-C6 alkoxy group, C1-C10 sulfonyl group, etc.
- the term 1-6 refers to 1, 2, 3, 4, 5 or 6. Other similar terms have similar meanings.
- Molecular glass is a small molecular compound with relatively large molecular weight. It exhibits the same amorphous characteristics as polymers at room temperature. It has the characteristics of controllable synthesis of small molecules, easy purification and amorphous polymers. It is soluble in solvents It has good film-forming properties and can be directly coated on a glass plate to form a thin film. It will not melt and flow like ordinary small molecule monomers when it is cured at high temperature, and has excellent processing performance.
- the present invention utilizes the characteristics of strong modifiability, good thermal stability and excellent dielectric properties of triazine ring, and introduces aryl group and curable group through Grignard reaction to form a rigid glass.
- the three-dimensional structure has a large free volume, which can effectively reduce the dielectric constant and prevent the dense packing between molecules to form crystals.
- diallyl bisphenol compound is used as a linker to connect two molecules of disubstituted triazine monomers to increase the molecular weight.
- the introduction of flexible allyl groups can reduce the crystallinity of molecules and increase the crosslinking density.
- the bisphenol structure is linked by the sp carbon, and the chemical bond distribution of the tetrahedron can further increase the disorder of the molecule.
- the structure design of molecular glass monomer is ingenious, the synthesis steps are simple, and the raw materials are easy to obtain, so it has a good application prospect.
- the resin formed by the molecular glass of the present invention is infusible and insoluble after solidification, has excellent heat resistance and low water absorption, and especially exhibits very low dielectric constant and dielectric loss at high frequencies. It exhibits low dielectric constant and dielectric loss at 10GHz, and has high modulus, low thermal expansion coefficient, low water absorption and good heat resistance. It can be used as a low dielectric constant matrix resin or packaging material for high In the fields of frequency communication, microelectronics industry and aerospace.
- the "molecular glass” monomer of the present invention contains rigid aryl groups and thermosetting groups, as well as flexible acrylic groups, which will not crystallize like small molecules while reducing dielectric loss;
- the "molecular glass" monomer of the present invention has excellent processing properties. After being dissolved in a solution, it can be directly spin-coated or drip-coated, and then thermally cured to obtain a resin. The processing technology is extremely advantageous.
- the "molecular glass" monomer of the present invention can be used as an excellent high-frequency dielectric material after curing, showing high heat resistance, low water absorption (as low as 0.19%), and a high glass transition temperature (T g >339°C), low thermal expansion coefficient (25-300°C, CTE as low as 63.0ppm/°C) and exhibits excellent dielectric properties at 10GHz high frequency (dielectric constant as low as 2.53, dielectric loss as low as 1.93 ⁇ 10 -3 ).
- a new type of high-temperature curing resin can be obtained after curing the "molecular glass" monomer of the present invention, which can be used as a high-performance matrix resin or packaging material for high-frequency communication, large-scale integrated circuits, microelectronics industry, aerospace, etc. in the field.
- DMA Dynamic thermomechanical analysis
- the dielectric constant and dielectric loss were measured by a separate dielectric resonator (QWED) at room temperature at a frequency of 5/10 GHz.
- the cured resin sheet was dried under vacuum at 100°C to a constant weight, and then soaked in boiling water for several days. Calculate the water absorption rate according to the weight increase of the cured resin sheet after soaking.
- Embodiment 1 Synthesis of double substituted 1,3,5-triazine S1
- Embodiment 2 Synthesis of Molecular Glass Monomer M1
- the tube furnace is a semi-closed system filled with high-purity nitrogen gas with a constant flow rate of 0.3L/min.
- the temperature is raised to 190°C for 2 hours, and then solidified at 240°C. Cured for 4 hours, and cured for 0.5 hours at 260°C to obtain cured resin P1.
- the glass transition temperature of the monomer M1 measured by DSC is 69° C., and the results are shown in FIG. 1 . Grind the cured sample into a uniform disc, and test its dielectric properties.
- Example 6 The curing of "molecular glass” monomer M2 and the performance research of its corresponding resin
- the target monomer M2 prepared in Example 4 was put into a tube furnace, and the temperature was raised to 190° C. for 2 hours, 240° C. for 4 hours, and 260° C. for 0.5 hours to obtain cured resin P2.
- the glass transition temperature of the monomer M2 measured by DSC is 84° C., and the results are shown in FIG. 1 .
- the cured resin sample was polished into a uniform disk, and its dielectric properties were tested. The results showed that the dielectric constant was 2.57 at 5 GHz, and the dielectric loss was 1.08 ⁇ 10 -3 ; the dielectric constant was 2.53 at 10 GHz, The dielectric loss was 1.93 ⁇ 10 -3 .
- the DMA test results show that the glass transition temperature of cured resin P2 is 343°C.
- P2 has good dimensional stability, and its coefficient of thermal expansion is 67.1ppm/°C in the range from room temperature to 300°C. After soaking P1 in boiling water for 72 hours, its water absorption rate was tested to be 0.19%.
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Abstract
The present invention provides a method for synthesizing molecular glass, and the use thereof as a high-frequency low-dielectric-constant material. Specifically, the present invention provides a molecular glass monomer, which has a molecular structure as shown in formula (I) below. The molecular glass monomer has excellent processability and can form an infusible and insoluble resin after a high-temperature treatment; and such molecular glass only displays a glass transition but no melting point when heated, which is similar to an amorphous state. In the present invention, the resin obtained after the molecular glass is cured has high heat resistance and low water absorption, especially shows an excellent dielectric constant and dielectric loss at a high frequency, and can be widely used as a low-dielectric-constant matrix resin or packaging material in fields including high-frequency communication, the microelectronic industry, aerospace, etc.
Description
本发明涉及高性能低介电常数热固性树脂材料领域,具体涉及一种可直接热固化的“分子玻璃”单体及其制备方法以及其作为高频低介电常数材料的应用。The invention relates to the field of high-performance low-permittivity thermosetting resin materials, in particular to a directly thermally curable "molecular glass" monomer, its preparation method and its application as a high-frequency low-permittivity material.
随着高频通信技术的高速发展,5G通讯技术对于新材料的依赖程度将超过以往的任何一代,这主要是因为5G通讯高的信号传输速度(约10Gbps)、低的信号延迟(<1ms)以及多用户接入等特点。现有5G技术中,将采用亚6GHz以及毫米波进行信号传输,在毫米波频内,当电场通过介质时,由于介质分子交替极化和晶格来回碰撞而产生的热损耗将加剧。研究表明,通讯技术中的信号传输损耗主要包括导体损耗(T
LC)和介质损耗(T
LD),而介质损耗T
LD与介质材料的介电常数(D
k)以及介电损耗(D
f)存在如下式关系:
K代表系数;f代表频率;c代表光速。因此在高频通讯中,为了降低信号传输损耗,必须尽可能降低介质材料的D
k和D
f值。
With the rapid development of high-frequency communication technology, 5G communication technology will rely more on new materials than any previous generation, mainly because of the high signal transmission speed (about 10Gbps) and low signal delay (<1ms) of 5G communication. And features such as multi-user access. In the existing 5G technology, sub-6GHz and millimeter waves will be used for signal transmission. In the millimeter wave frequency, when the electric field passes through the medium, the heat loss due to the alternating polarization of the medium molecules and the back and forth collision of the lattice will be intensified. Studies have shown that the signal transmission loss in communication technology mainly includes conductor loss (T LC ) and dielectric loss (T LD ), and the dielectric loss T LD is related to the dielectric constant (D k ) and dielectric loss (D f ) of the dielectric material. There is the following relationship: K represents the coefficient; f represents the frequency; c represents the speed of light. Therefore, in high-frequency communication, in order to reduce signal transmission loss, the Dk and Df values of dielectric materials must be reduced as much as possible.
除了低介电特性,还要求这些介质材料具有高机械强度、高杨氏模量、高击穿电压、低漏电、高热稳定性、与导体之间良好的粘结强度、低吸水性和良好的加工性能。目前在5G通讯技术中应用较多的材料包括聚四氟乙烯(PTFE)、改性聚苯醚(MPPE)、改性聚酰亚胺(MPI)、LCP等。PTFE由于弹性模量低,和导体粘结性差,线性热膨胀系数高等缺陷,限制了其在超薄线路板中的应用。MPPE基板的介电性能优异,但它的热稳定性和尺寸稳定较差,难以满足较高的材料加工要求。因此,迫切需要开发新型的高频低介电常数材料以满足5G通讯的应用需求。In addition to low dielectric properties, these dielectric materials are also required to have high mechanical strength, high Young's modulus, high breakdown voltage, low leakage, high thermal stability, good bond strength with conductors, low water absorption and good Processing performance. At present, materials widely used in 5G communication technology include polytetrafluoroethylene (PTFE), modified polyphenylene ether (MPPE), modified polyimide (MPI), LCP, etc. Due to the low elastic modulus, poor conductor adhesion and high linear thermal expansion coefficient of PTFE, its application in ultra-thin circuit boards is limited. MPPE substrate has excellent dielectric properties, but its thermal stability and dimensional stability are poor, making it difficult to meet high material processing requirements. Therefore, there is an urgent need to develop new high-frequency low-dielectric constant materials to meet the application requirements of 5G communications.
在低介电薄膜基板材料方面,成膜性是十分关键的性能参数,目前普遍采用的都是具有无定形态的聚合物材料,可以使用溶液加工的方法形成均匀致密的薄膜,但是聚合物具有合成不可控、难以纯化的缺点。小分子化合物则可以很好的解决合成不可控和不易纯化的问题,但一般的小分子化合物由于分子量不够大,所形成的的薄膜热不稳定易发生聚集结晶析出。因此,制备一种容易纯化且能形成无定形膜的化合物可以有效解决这一问题。分子玻璃是一类分子 量较大并在常温下呈现聚合物一样无定形特性的小分子化合物。它兼具了小分子合成可控、容易纯化和聚合物无定形的特点,高温固化时不会像普通的小分子单体一样发生熔化进而流淌,从而影响薄膜性能,具有极佳的加工优势。所以,发展可作为低介电常数材料的分子玻璃具有重要的应用价值。In terms of low-dielectric thin-film substrate materials, film-forming property is a key performance parameter. At present, polymer materials with an amorphous state are generally used, and uniform and dense thin films can be formed by solution processing methods, but polymers have The disadvantages of uncontrollable synthesis and difficult purification. Small molecular compounds can well solve the problems of uncontrollable synthesis and difficult purification, but because the molecular weight of general small molecular compounds is not large enough, the formed thin film is thermally unstable and prone to aggregation and crystallization. Therefore, preparing a compound that is easy to purify and can form an amorphous film can effectively solve this problem. Molecular glass is a class of small molecular compounds with relatively large molecular weight and amorphous characteristics like polymers at room temperature. It has the characteristics of controllable small molecule synthesis, easy purification and amorphous polymer. When it is solidified at high temperature, it will not melt and flow like ordinary small molecule monomers, which will affect the performance of the film, and has excellent processing advantages. Therefore, the development of molecular glasses that can be used as low dielectric constant materials has important application value.
发明内容Contents of the invention
本发明的目的就是提供加工性能优异的“分子玻璃”单体及其制备方法,和由该单体制备的具有优异的高频低介电性能的树脂及其应用。The object of the present invention is to provide a "molecular glass" monomer with excellent processability and its preparation method, and a resin with excellent high frequency and low dielectric properties prepared from the monomer and its application.
在本发明的第一方面,提供了一种“分子玻璃”单体,所述单体具有如下式(I)所示的分子结构:In the first aspect of the present invention, a kind of " molecular glass " monomer is provided, and described monomer has the molecular structure shown in following formula (I):
其中,in,
各个R
1各自独立地选自下组:氢、卤素、取代或未取代的C1-C6烷基、取代或未取代的C2-C6烯基、取代或未取代的C1-C15烷基硅基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基、C2-C4烯基、C2-C4炔基、未取代的或苯环上的1-3个氢原子被选自下组的取代基取代的苯基:卤素、C1-C4烷基;
Each R is independently selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, Wherein the substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the following groups: halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or 1-3 hydrogen atoms on the benzene ring are substituted by a substituent selected from the following group: halogen, C1-C4 alkyl;
各个R
2各自独立地选自下组:C3-C8苯并环烯基、C2-C6烯基苯基;
Each R is independently selected from the group consisting of C3 - C8 benzocycloalkenyl, C2-C6 alkenylphenyl;
R
3、R
4各自独立地选自下组:氢、取代或未取代的C1-C6烷基、取代或未取代的C6-C10芳基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基。
R 3 and R 4 are each independently selected from the following group: hydrogen, substituted or unsubstituted C1-C6 alkyl, substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one or more Each hydrogen atom is replaced by a substituent selected from the group consisting of halogen, C1-C4 alkyl.
在另一优选例中,所述卤素为氟。In another preferred example, the halogen is fluorine.
在另一优选例中,各个R
1相同或不同,优选相同。
In another preferred example, each R 1 is the same or different, preferably the same.
在另一优选例中,各个R
1各自独立地位于与三嗪相连的苯环上的碳原子的间位或对位,优选对位。
In another preferred example, each R 1 is independently located at the meta or para position of the carbon atom on the benzene ring connected to the triazine, preferably the para position.
在另一优选例中,各个R
2相同或不同,优选相同。
In another preferred example, each R 2 is the same or different, preferably the same.
在另一优选例中,R
3、R
4相同或不同,优选相同。
In another preferred example, R 3 and R 4 are the same or different, preferably the same.
在另一优选例中,各个R
1各自独立地选自下组:氢、卤素、C1-C6烷基、C1-C6卤代烷基、取代或未取代C2-C6烯基、取代或未取代的C1-C15烷基硅基;
In another preferred embodiment, each R1 is independently selected from the following group: hydrogen, halogen, C1 -C6 alkyl, C1-C6 haloalkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1 -C15 alkylsilyl;
各个R
2各自独立地选自下组:C3-C6苯并环烯基、C2-C4烯基苯基;
Each R is independently selected from the group consisting of: C3 - C6 benzocycloalkenyl, C2-C4 alkenylphenyl;
R
3、R
4相同或不同,相同时,选自如下基团:氢、C1-C6烷基、C1-C6卤代烷基、取代或未取代的C6-C10芳基;不相同时,R
3和R
4中之一为C1-C6烷基和C1-C6卤代烷基,R
3和R
4中另一个为取代或未取代的C6-C10芳基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基。
R 3 and R 4 are the same or different. When they are the same, they are selected from the following groups: hydrogen, C1-C6 alkyl, C1-C6 haloalkyl, substituted or unsubstituted C6-C10 aryl; when they are different, R 3 and One of R 4 is C1-C6 alkyl and C1-C6 haloalkyl, and the other of R 3 and R 4 is substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one or Multiple hydrogen atoms are substituted by substituents selected from the group consisting of halogen, C1-C4 alkyl.
在另一优选例中,各个R
1各自独立地选自下组:氢、氟、C1-C4烷基、C1-C4氟代烷基、C1-C12烷基硅基;
In another preferred example, each R1 is independently selected from the following group: hydrogen, fluorine, C1 -C4 alkyl, C1-C4 fluoroalkyl, C1-C12 alkylsilyl;
各个R
2各自独立地选自下组:苯并环丁烯基、苯乙烯基;
Each R 2 is independently selected from the group consisting of benzocyclobutenyl, styryl;
R
3、R
4相同或不同,相同时,选自如下基团:氢、C1-C4烷基、C1-C4氟代烷基、取代苯基;不相同时,R
3和R
4中之一为C1-C4烷基和C1-C4氟代烷基,R
3和R
4中另一个为取代苯基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:氟、C1-C4烷基。
R 3 and R 4 are the same or different. When they are the same, they are selected from the following groups: hydrogen, C1-C4 alkyl, C1-C4 fluoroalkyl, and substituted phenyl; when they are different, one of R 3 and R 4 C1-C4 alkyl and C1- C4 fluoroalkyl, the other of R3 and R4 is a substituted phenyl group, wherein the substitution means that one or more hydrogen atoms on the group are selected from the following group Substituent substitution: fluorine, C1-C4 alkyl.
在另一优选例中,各个R
1各自独立地选自下组:氢、氟、甲基、乙基、异丙基、叔丁基、三甲基硅基、三乙基硅基、三异丙基硅基、三丁基硅基、三氟甲基。
In another preferred example, each R1 is independently selected from the following group: hydrogen, fluorine, methyl, ethyl, isopropyl, tert-butyl, trimethylsilyl, triethylsilyl, triiso Propylsilyl, Tributylsilyl, Trifluoromethyl.
在另一优选例中,R
3、R
4相同或不同,相同时,选自如下基团:氢、三氟甲基、甲基,取代苯基;不相同时,为甲基和取代苯基,三氟甲基和取代苯基。所述的取代是指基团被一个或多个选自如下所述的取代基所取代:C1-C4的烷基和氟原子。
In another preferred example, R 3 and R 4 are the same or different, and when they are the same, they are selected from the following groups: hydrogen, trifluoromethyl, methyl, and substituted phenyl; when they are different, they are methyl and substituted phenyl , trifluoromethyl and substituted phenyl groups. The substitution means that the group is substituted by one or more substituents selected from the following substituents: C1-C4 alkyl and fluorine atoms.
在另一优选例中,各基团是实施例各化合物中所记载的具体基团。In another preferred example, each group is a specific group described in each compound of the embodiment.
在另一优选例中,所述单体选自下组:In another preferred embodiment, the monomer is selected from the following group:
在另一优选例中,所述单体的玻璃化转变温度50-100℃,优选70-90℃。In another preferred example, the glass transition temperature of the monomer is 50-100°C, preferably 70-90°C.
在本发明的第二方面,提供了一种如本发明第一方面所述的“分子玻璃”单体的制备方法,包括步骤:In the second aspect of the present invention, there is provided a method for preparing the "molecular glass" monomer as described in the first aspect of the present invention, comprising the steps of:
(a)在第一惰性溶剂中,在碱存在下,将式II化合物和式III化合物反应得到式I化合物;(a) in the first inert solvent, in the presence of a base, the compound of formula II and the compound of formula III are reacted to obtain the compound of formula I;
其中,in,
R
1选自下组:氢、卤素、取代或未取代的C1-C6烷基、取代或未取代的C2-C6烯基、取代或未取代的C1-C15烷基硅基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基、C2-C4烯基、C2-C4炔基、未取代的或苯环上的1-3个氢原子被选自下组的取代基取代的苯基:卤素、C1-C4烷基;
R is selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein said Substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the group consisting of halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or benzene ring 1-3 hydrogen atoms are substituted by substituents selected from the following phenyl group: halogen, C1-C4 alkyl;
R
2选自下组:C3-C8苯并环烯基、C2-C6烯基苯基;
R is selected from the group consisting of: C3 - C8 benzocycloalkenyl, C2-C6 alkenylphenyl;
R
3、R
4各自独立地选自下组:氢、取代或未取代的C1-C6烷基、取代或未取代的C6-C10芳基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基。
R 3 and R 4 are each independently selected from the following group: hydrogen, substituted or unsubstituted C1-C6 alkyl, substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one or more Each hydrogen atom is replaced by a substituent selected from the group consisting of halogen, C1-C4 alkyl.
在另一优选例中,R
1、R
2、R
3、R
4如本发明第一方面定义。
In another preferred example, R 1 , R 2 , R 3 , and R 4 are as defined in the first aspect of the present invention.
在另一优选例中,R
1选自下组:C1-C4烷基、C2-C4烯基、C1-C12烷基硅基;
In another preferred embodiment, R is selected from the following group: C1 -C4 alkyl, C2-C4 alkenyl, C1-C12 alkylsilyl;
R
2选自下组:苯并环丁烯基、苯乙烯基;
R 2 is selected from the group consisting of benzocyclobutenyl, styryl;
R
3、R
4相同或不同,相同时,选自如下基团:氢、C1-C4烷基、C1-C4卤代烷基、取代苯基;不相同时,R
3和R
4中之一为C1-C4烷基和C1-C4卤代烷基,R
3和R
4中另一个为取代苯基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:氟、C1-C4烷基。
R 3 and R 4 are the same or different. When they are the same, they are selected from the following groups: hydrogen, C1-C4 alkyl, C1-C4 haloalkyl, substituted phenyl; when they are different, one of R 3 and R 4 is C1 -C4 alkyl and C1- C4 haloalkyl, the other of R3 and R4 is a substituted phenyl group, wherein the substitution means that one or more hydrogen atoms on the group are replaced by a substituent selected from the following group: Fluorine, C1-C4 alkyl.
在另一优选例中,所述式II化合物和式III化合物的摩尔比为1:0.2~2,优选1:0.4~0.1,更优选1:0.5~0.6。In another preferred example, the molar ratio of the compound of formula II to the compound of formula III is 1:0.2-2, preferably 1:0.4-0.1, more preferably 1:0.5-0.6.
在另一优选例中,所述第一惰性溶剂为有机溶剂和水的混合溶剂,其中所述有机溶剂选自下组:二氯甲烷、三氯甲烷、二氯乙烷、甲苯、二甲苯,或其组合。In another preferred example, the first inert solvent is a mixed solvent of an organic solvent and water, wherein the organic solvent is selected from the group consisting of dichloromethane, chloroform, dichloroethane, toluene, xylene, or a combination thereof.
在另一优选例中,所述第一惰性溶剂中有机溶剂和水的体积比为1:1.0~10.0,优选1:1.0~2.0,例如1:1.5。In another preferred example, the volume ratio of the organic solvent to water in the first inert solvent is 1:1.0-10.0, preferably 1:1.0-2.0, for example 1:1.5.
在另一优选例中,所述式II化合物和第一惰性溶剂的摩尔体积比为0.05-0.3mol/L,优选0.06-0.2mol/L,例如0.1mol/L、0.12mol/L、0.15mol/L、0.2mol/L。In another preferred example, the molar volume ratio of the compound of formula II to the first inert solvent is 0.05-0.3mol/L, preferably 0.06-0.2mol/L, such as 0.1mol/L, 0.12mol/L, 0.15mol /L, 0.2mol/L.
在另一优选例中,所述方法在水油两相体系中进行。In another preferred example, the method is carried out in a water-oil two-phase system.
在另一优选例中,所述方法在相转移催化剂存在下进行。In another preferred example, the method is carried out in the presence of a phase transfer catalyst.
在另一优选例中,所述相转移催化剂选自下组:苄基三乙基氯化铵、四丁基溴化铵、四丁基氯化铵、四丁基硫酸氢铵、三辛基甲基氯化铵、十二烷基三甲基氯化铵、十六烷基三甲基溴化铵,或其组合。In another preferred example, the phase transfer catalyst is selected from the group consisting of benzyltriethylammonium chloride, tetrabutylammonium bromide, tetrabutylammonium chloride, tetrabutylammonium bisulfate, trioctyl Methylammonium chloride, dodecyltrimethylammonium chloride, cetyltrimethylammonium bromide, or combinations thereof.
在另一优选例中,所述相转移催化剂与式III化合物的摩尔比为0.001至0.1,例如0.005、0.01、0.05、0.08。In another preferred embodiment, the molar ratio of the phase transfer catalyst to the compound of formula III is 0.001 to 0.1, such as 0.005, 0.01, 0.05, 0.08.
在另一优选例中,所述碱为无机碱,选自下组:氢氧化钠、氢氧化钾、氢氧化钙、碳酸钾、碳酸铯,或其组合。In another preferred embodiment, the base is an inorganic base selected from the group consisting of sodium hydroxide, potassium hydroxide, calcium hydroxide, potassium carbonate, cesium carbonate, or a combination thereof.
在另一优选例中,所述无机碱与式II化合物的摩尔比为1.0~5.0:1,例如2:1、3:1、4:1。In another preferred example, the molar ratio of the inorganic base to the compound of formula II is 1.0-5.0:1, such as 2:1, 3:1, 4:1.
在另一优选例中,步骤(a)包括:In another preference, step (a) includes:
(a1)提供水相:所述水相包括式III化合物、碱和水;(a1) providing an aqueous phase: the aqueous phase includes a compound of formula III, an alkali and water;
(a2)提供油相:所述油相包括式II化合物、有机溶剂和相转移催化剂;(a2) providing an oil phase: the oil phase includes a compound of formula II, an organic solvent and a phase transfer catalyst;
(a3)将油相加入水相,升温搅拌进行反应,得到式I化合物。(a3) adding the oil phase to the water phase, raising the temperature and stirring to react to obtain the compound of formula I.
在另一优选例中,步骤(a)包括:先加入式III化合物、碱和水;再加入式II化合物、有机溶剂和相转移催化剂,升温搅拌进行反应,得到式I化合物。In another preferred embodiment, the step (a) includes: first adding the compound of formula III, alkali and water; then adding the compound of formula II, an organic solvent and a phase transfer catalyst, heating and stirring for reaction to obtain the compound of formula I.
在另一优选例中,步骤(a)在0-100℃下进行,较佳地20-80℃,更佳地30-60℃。In another preferred embodiment, step (a) is carried out at 0-100°C, preferably at 20-80°C, more preferably at 30-60°C.
在另一优选例中,步骤(a)的反应时间为2-24h,较佳地4-16h,更佳地6-16h。In another preferred example, the reaction time of step (a) is 2-24h, preferably 4-16h, more preferably 6-16h.
在另一优选例中,步骤(a)的反应结束后,萃取,干燥,减压除溶剂,柱层析得到式I化合物。In another preferred embodiment, after the reaction in step (a), the compound of formula I is obtained by extraction, drying, desolventization under reduced pressure, and column chromatography.
在本发明的第三方面,提供了一种如式(II)所示的三嗪化合物:In a third aspect of the present invention, a triazine compound as shown in formula (II) is provided:
其中,in,
R
1选自下组:氢、卤素、取代或未取代的C1-C6烷基、取代或未取代的C2-C6烯基、取代或未取代的C1-C15烷基硅基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基、C2-C4烯基、C2-C4炔基、未取代的或苯环上的1-3个氢原子被选自下组的取代基取代的苯基:卤素、C1-C4烷基;
R is selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein said Substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the group consisting of halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or benzene ring 1-3 hydrogen atoms are substituted by substituents selected from the following phenyl group: halogen, C1-C4 alkyl;
R
2选自下组:C3-C8苯并环烯基、C2-C6烯基苯基。
R 2 is selected from the group consisting of C3-C8 benzocycloalkenyl, C2-C6 alkenylphenyl.
在另一优选例中,R
1、R
2如本发明第一方面定义。
In another preferred example, R 1 and R 2 are as defined in the first aspect of the present invention.
在另一优选例中,R
1位于与三嗪相连的苯环上的碳原子的间位或对位,优选对位。
In another preferred example, R 1 is located at the meta or para position of the carbon atom on the benzene ring connected to the triazine, preferably the para position.
在另一优选例中,R
1选自下组:C1-C4烷基、C2-C4烯基、C1-C12烷基硅基;
In another preferred embodiment, R is selected from the following group: C1 -C4 alkyl, C2-C4 alkenyl, C1-C12 alkylsilyl;
R
2选自下组:苯并环丁烯基、苯乙烯基。
R 2 is selected from the group consisting of benzocyclobutenyl, styryl.
在本发明的第四方面,提供了一种如本发明第三方面所述的三嗪化合物的制备方法,包括以下步骤:In a fourth aspect of the present invention, there is provided a method for preparing a triazine compound as described in the third aspect of the present invention, comprising the following steps:
(1)在惰性气体保护下,在第二惰性溶剂中,用式A化合物先与式B化合物进行取代反应,再与式C化合物进行取代反应,得到式II化合物;或(1) Under the protection of an inert gas, in a second inert solvent, the compound of formula A is used to perform a substitution reaction with a compound of formula B, and then with a compound of formula C to obtain a compound of formula II; or
(2)在惰性气体保护下,在第二惰性溶剂中,用式A化合物先与式C化合物进行取代反应,再与式B化合物进行取代反应,得到式II化合物;(2) Under the protection of an inert gas, in a second inert solvent, the compound of formula A is used to perform a substitution reaction with the compound of formula C, and then with the compound of formula B to perform a substitution reaction to obtain the compound of formula II;
其中,in,
R
1选自下组:氢、卤素、取代或未取代的C1-C6烷基、取代或未取代的C2-C6烯基、取代或未取代的C1-C15烷基硅基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基、C2-C4烯基、C2-C4炔基、未取代的或苯环上的1-3个氢原子被选自下组的取代基取代的苯基:卤素、C1-C4烷基;
R is selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein said Substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the group consisting of halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or benzene ring 1-3 hydrogen atoms are substituted by substituents selected from the following phenyl group: halogen, C1-C4 alkyl;
R
2选自下组:C3-C8苯并环烯基、C2-C6烯基苯基;
R is selected from the group consisting of: C3 - C8 benzocycloalkenyl, C2-C6 alkenylphenyl;
X
1、X
2各自独立地为卤素,优选Cl、Br。
X 1 and X 2 are each independently halogen, preferably Cl or Br.
在另一优选例中,所述步骤(1)包括以下步骤:In another preferred example, said step (1) includes the following steps:
(a1)在惰性气体保护下,用式A化合物和式B化合物进行取代反应得到中间体1;(a1) Under the protection of an inert gas, the intermediate 1 is obtained by performing a substitution reaction with a compound of formula A and a compound of formula B;
(b1)在第二惰性溶剂中,将中间体1与式C化合物进行取代反应得到式II化合物;(b1) In a second inert solvent, the intermediate 1 is subjected to a substitution reaction with the compound of formula C to obtain the compound of formula II;
其中,R
1、R
2如本发明第一方面所定义。
Wherein, R 1 and R 2 are as defined in the first aspect of the present invention.
在另一优选例中,所述惰性气体选自下组:氮气、氩气。In another preferred embodiment, the inert gas is selected from the group consisting of nitrogen and argon.
在另一优选例中,所述式B化合物选自下组:4-甲基苯基溴化镁、4-甲基苯基氯化镁、3-甲基苯基溴化镁、4-异丙基苯基溴化镁、4-叔丁基苯基溴化镁、4-三甲基硅基苯基溴化镁,或其组合。In another preferred example, the compound of formula B is selected from the group consisting of 4-methylphenylmagnesium bromide, 4-methylphenylmagnesium chloride, 3-methylphenylmagnesium bromide, 4-isopropyl Phenylmagnesium bromide, 4-tert-butylphenylmagnesium bromide, 4-trimethylsilylphenylmagnesium bromide, or combinations thereof.
在另一优选例中,所述式A化合物和式B化合物的摩尔比为1:1~5,例如1:1、1:1.5、1:2。In another preferred example, the molar ratio of the compound of formula A to the compound of formula B is 1:1-5, such as 1:1, 1:1.5, 1:2.
在另一优选例中,步骤(a1)在-20-10℃下进行,优选-10-5℃,更优选-5-0℃。In another preferred example, step (a1) is carried out at -20-10°C, preferably -10-5°C, more preferably -5-0°C.
在另一优选例中,步骤(a1)的反应时间为10-30h,优选15-25h。In another preferred example, the reaction time of step (a1) is 10-30h, preferably 15-25h.
在另一优选例中,步骤(a1)包括:在惰性气体保护下,将式B化合物滴加至式A化合物中,反应得到中间体1。In another preferred example, the step (a1) includes: adding the compound of formula B to the compound of formula A dropwise under the protection of an inert gas to react to obtain intermediate 1.
在另一优选例中,步骤(a1)反应淬灭结束后,萃取,浓缩除溶剂,柱层析得到中间体1。In another preferred embodiment, after the quenching of the reaction in step (a1), extraction is performed, the solvent is removed by concentration, and intermediate 1 is obtained by column chromatography.
在另一优选例中,所述式C化合物选自下组:4-苯并环丁烯基溴化镁、4-苯乙烯基溴化镁,或其组合。In another preferred embodiment, the compound of formula C is selected from the group consisting of 4-benzocyclobutenylmagnesium bromide, 4-styrylmagnesium bromide, or combinations thereof.
在另一优选例中,所述中间体1和式C化合物的摩尔比为1:0.5~3,例如1:1、1:1.5、1:2、1:3。In another preferred example, the molar ratio of the intermediate 1 to the compound of formula C is 1:0.5-3, such as 1:1, 1:1.5, 1:2, 1:3.
在另一优选例中,所述第二惰性溶剂选自下组:氯仿、甲苯、丙酮、四氢呋喃、二氧六环,或其组合,优选四氢呋喃。In another preferred example, the second inert solvent is selected from the group consisting of chloroform, toluene, acetone, tetrahydrofuran, dioxane, or combinations thereof, preferably tetrahydrofuran.
在另一优选例中,步骤(b1)在5-60℃下进行,优选10-50℃,更优选10-45℃。In another preferred example, step (b1) is carried out at 5-60°C, preferably 10-50°C, more preferably 10-45°C.
在另一优选例中,步骤(b1)的反应时间为2-15h,优选5-10h,更优选6-8h。In another preferred example, the reaction time of step (b1) is 2-15h, preferably 5-10h, more preferably 6-8h.
在另一优选例中,步骤(b1)包括:向中间体1在第二惰性溶剂中的溶液中滴加式C化合物在第二惰性溶剂中的溶液,得到式II化合物。In another preferred example, step (b1) includes: adding dropwise a solution of the compound of formula C in the second inert solvent to the solution of intermediate 1 in the second inert solvent to obtain the compound of formula II.
在另一优选例中,所述中间体1在第二惰性溶剂中的溶液的中间体的浓度为0.1-0.8mol/L,优选0.2-0.6mol/L,例如0.3mol/L、0.35mol/L、0.4mol/L、0.5mol/L。In another preferred example, the concentration of the intermediate in the solution of the intermediate 1 in the second inert solvent is 0.1-0.8mol/L, preferably 0.2-0.6mol/L, such as 0.3mol/L, 0.35mol/L L, 0.4mol/L, 0.5mol/L.
在另一优选例中,所述式C化合物在第二惰性溶剂中的溶液的式C化合物的浓度为0.3-1.2mol/L,优选0.5-1mol/L,例如0.6mol/L、0.7mol/L、0.8mol/L、0.9mol/L。In another preferred example, the concentration of the compound of formula C in the solution of the compound of formula C in the second inert solvent is 0.3-1.2mol/L, preferably 0.5-1mol/L, such as 0.6mol/L, 0.7mol/L L, 0.8mol/L, 0.9mol/L.
在另一优选例中,步骤(b1)反应结束后,减压除溶剂,柱层析得到式II化合物。In another preferred embodiment, after the reaction in step (b1), the solvent is removed under reduced pressure, and the compound of formula II is obtained by column chromatography.
在另一优选例中,所述步骤(2)包括以下步骤:In another preference, said step (2) includes the following steps:
(a2)在第二惰性溶剂中,用式A化合物和式C化合物进行格氏反应得到中间体2;(a2) In a second inert solvent, carry out a Grignard reaction with a compound of formula A and a compound of formula C to obtain intermediate 2;
(b2)在惰性气体保护下,将中间体2与式B化合物进行格氏反应得到式II化合物;(b2) Under the protection of an inert gas, the intermediate 2 is subjected to a Grignard reaction with the compound of formula B to obtain the compound of formula II;
其中,R
1、R
2如本发明第一方面所定义。
Wherein, R 1 and R 2 are as defined in the first aspect of the present invention.
在另一优选例中,步骤(b1)的反应条件同步骤(a2);步骤(b2)的反应条件同步骤(a1)。In another preferred example, the reaction conditions of step (b1) are the same as those of step (a2); the reaction conditions of step (b2) are the same as those of step (a1).
在另一优选例中,所述式III化合物的制备方法包括以下步骤:In another preference, the preparation method of the compound of formula III comprises the following steps:
(1)在第三惰性溶剂中,在碱存在下,将式D化合物和式E化合物进行水解反应,得到中间体3;(1) In a third inert solvent, in the presence of a base, the compound of formula D and the compound of formula E are hydrolyzed to obtain intermediate 3;
(2)在惰性气体保护下,将中间体3加热,进行重排反应,得到式III化合物;(2) Under the protection of an inert gas, intermediate 3 is heated to carry out a rearrangement reaction to obtain a compound of formula III;
其中,R
3、R
4各自独立地选自下组:氢、取代或未取代的C1-C6烷基、取代或未取代的C6-C10芳基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基;
Wherein, R 3 and R 4 are each independently selected from the following group: hydrogen, substituted or unsubstituted C1-C6 alkyl, substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one of the or multiple hydrogen atoms are substituted by substituents selected from the following group: halogen, C1-C4 alkyl;
Y为卤素,优选Cl、Br。Y is halogen, preferably Cl, Br.
在另一优选例中,R
3、R
4相同或不同,相同时,选自如下基团:氢、三氟甲基、甲基,取代苯基;不相同时,为甲基和取代苯基,三氟甲基和取代苯基。所述的取代是指基团被一个或多个选自如下所述的取代基所取代:C1-C4的烷基和氟原子。
In another preferred example, R 3 and R 4 are the same or different, and when they are the same, they are selected from the following groups: hydrogen, trifluoromethyl, methyl, and substituted phenyl; when they are different, they are methyl and substituted phenyl , trifluoromethyl and substituted phenyl groups. The substitution means that the group is substituted by one or more substituents selected from the following substituents: C1-C4 alkyl and fluorine atoms.
在另一优选例中,R
3、R
4如本发明第一方面所定义。
In another preferred example, R 3 and R 4 are as defined in the first aspect of the present invention.
在另一优选例中,所述式D化合物为被R
3、R
4取代的双酚化合物,优选双酚A、双酚AF。
In another preferred example, the compound of formula D is a bisphenol compound substituted by R 3 and R 4 , preferably bisphenol A or bisphenol AF.
在另一优选例中,所述式D化合物和式E化合物的摩尔比为3~5:1。In another preferred example, the molar ratio of the compound of formula D to the compound of formula E is 3-5:1.
在另一优选例中,所述第三惰性溶剂选自下组:氯仿、甲苯、丙酮、四氢呋喃、二氧六环,或其组合,优选丙酮。In another preferred example, the third inert solvent is selected from the group consisting of chloroform, toluene, acetone, tetrahydrofuran, dioxane, or combinations thereof, preferably acetone.
在另一优选例中,所述式D化合物和第三惰性溶剂的摩尔体积比为0.1-1mol/L,例如0.1mol/L、0.2mol/L、0.3mol/L、0.4mol/L、0.5mol/L。In another preferred example, the molar volume ratio of the compound of formula D to the third inert solvent is 0.1-1 mol/L, such as 0.1 mol/L, 0.2 mol/L, 0.3 mol/L, 0.4 mol/L, 0.5 mol/L.
在另一优选例中,所述碱选自下组:氢氧化钠、氢氧化钾、氢氧化钙、碳酸钾、碳酸钠,或其组合,优选碳酸钾。In another preferred example, the base is selected from the group consisting of sodium hydroxide, potassium hydroxide, calcium hydroxide, potassium carbonate, sodium carbonate, or combinations thereof, preferably potassium carbonate.
在另一优选例中,所述式D化合物和碱的摩尔比为0.1-1,优选0.2-0.5,例如0.2、0.3、0.4、0.5。In another preferred example, the molar ratio of the compound of formula D to the base is 0.1-1, preferably 0.2-0.5, such as 0.2, 0.3, 0.4, 0.5.
在另一优选例中,步骤(1)在40~100℃下进行,优选50~80℃,更优选60~70℃。In another preferred example, step (1) is carried out at 40-100°C, preferably at 50-80°C, more preferably at 60-70°C.
在另一优选例中,步骤(1)的反应时间为6-48h,优选12-24h。In another preferred example, the reaction time of step (1) is 6-48h, preferably 12-24h.
在另一优选例中,步骤(2)的加热温度为160-250℃。In another preferred example, the heating temperature in step (2) is 160-250°C.
在另一优选例中,所述反应的反应时间为6-48h,优选9-24h。In another preferred example, the reaction time of the reaction is 6-48h, preferably 9-24h.
在另一优选例中,所述反应结束后,减压精馏,柱层析分离得到式III化合物。In another preferred example, after the reaction is completed, the compound of formula III is obtained by rectifying under reduced pressure and separated by column chromatography.
在本发明的第五方面,提供了一种固化产物,所述固化产物通过固化原料经交联反应形成;In the fifth aspect of the present invention, a cured product is provided, the cured product is formed by cross-linking reaction of cured raw materials;
其中,所述固化原料包括本发明第一方面所述的“分子玻璃”单体。Wherein, the curing raw material includes the "molecular glass" monomer described in the first aspect of the present invention.
在另一优选例中,所述固化产物通过固化原料经双键和环烯之间的D-A反应进行交联形成。In another preferred embodiment, the cured product is formed by cross-linking the cured raw material through a D-A reaction between double bonds and cycloolefins.
在另一优选例中,所述固化原料包括本发明第一方面所述的“分子玻璃”单体和其他可热固化单体或聚合物。In another preferred example, the curing raw material includes the "molecular glass" monomer described in the first aspect of the present invention and other thermally curable monomers or polymers.
在另一优选例中,所述固化原料为本发明第一方面所述的“分子玻璃”单体,或所述“分子玻璃”单体和其他可热固化单体或聚合物的共混物。In another preferred example, the curing raw material is the "molecular glass" monomer described in the first aspect of the present invention, or a blend of the "molecular glass" monomer and other thermally curable monomers or polymers .
在另一优选例中,所述固化原料还包括结构中包含R
2基团的可热固化单体;
In another preferred example, the curing raw material also includes a thermally curable monomer comprising an R2 group in the structure ;
其中,in,
R
2选自下组:C3-C8苯并环烯基、C2-C6烯基苯基,优选苯并环丁烯基、苯乙烯基。
R 2 is selected from the group consisting of C3-C8 benzocycloalkenyl, C2-C6 alkenylphenyl, preferably benzocyclobutenyl, styryl.
在另一优选例中,所述结构中包含R
2基团的可热固化单体选自下组:苯并环烯类、烯基苯类、丙烯酸酯类,或其组合,优选苯并环丁烯、苯乙烯、烯丙苯、丙烯酸甲酯、丙烯酸乙酯。
In another preferred example, the thermally curable monomer containing the R2 group in the structure is selected from the group consisting of benzocycloalkenes, alkenylbenzenes, acrylates, or combinations thereof, preferably benzocycloalkenes Butylene, Styrene, Allylbenzene, Methyl Acrylate, Ethyl Acrylate.
在另一优选例中,所述固化原料还包括可热固化的低介电聚合物,例如低介电聚酰亚胺、聚苯醚、聚四氟乙烯等。In another preferred embodiment, the curing raw material further includes thermally curable low-dielectric polymers, such as low-dielectric polyimide, polyphenylene ether, polytetrafluoroethylene, and the like.
在另一优选例中,所述固化原料中“分子玻璃”单体的摩尔分数为10%-100%,优选30%-100%,更优选50%-100%。In another preferred example, the mole fraction of "molecular glass" monomer in the curing raw material is 10%-100%, preferably 30%-100%, more preferably 50%-100%.
在另一优选例中,所述固化原料为本发明第一方面所述的“分子玻璃”单体。In another preferred example, the curing raw material is the "molecular glass" monomer described in the first aspect of the present invention.
在另一优选例中,所述固化产物由本发明第一方面所述的“分子玻璃”单体交联得到。In another preferred example, the cured product is obtained by cross-linking the "molecular glass" monomer described in the first aspect of the present invention.
在另一优选例中,所述固化产物是一种由交联反应得到的三维结构,为聚合物。In another preferred embodiment, the cured product is a three-dimensional structure obtained by a cross-linking reaction, which is a polymer.
在另一优选例中,所述固化产物是树脂。In another preferred example, the cured product is a resin.
在另一优选例中,所述固化产物的交联度为50%-100%,优选70%-100%。In another preferred example, the degree of crosslinking of the cured product is 50%-100%, preferably 70%-100%.
在另一优选例中,所述固化产物不溶不熔,具有优异的低介电性能,优异的热机械性能,低吸水率和极好的表面平整性,尤其是高频低介电性能。In another preferred example, the cured product is insoluble and infusible, has excellent low dielectric properties, excellent thermomechanical properties, low water absorption and excellent surface smoothness, especially high frequency and low dielectric properties.
在另一优选例中,所述固化产物具有如下的一个或多个特征:In another preference, the cured product has one or more of the following characteristics:
(i)玻璃化转变温度为250~500℃,优选300~400℃,更优选330~250℃;(i) glass transition temperature is 250~500 ℃, preferably 300~400 ℃, more preferably 330~250 ℃;
(ii)介电常数为2.0~3.0(5-10GHz范围内),优选2.4~2.7,更优选2.5~2.7;(ii) a dielectric constant of 2.0 to 3.0 (in the range of 5-10 GHz), preferably 2.4 to 2.7, more preferably 2.5 to 2.7;
(iii)介电损耗为0.5~3×10
-3(5-10GHz范围内),优选1~2.5×10
-3,更优选1.0~2.3×10
-3;
(iii) The dielectric loss is 0.5 to 3×10 -3 (in the range of 5-10GHz), preferably 1 to 2.5×10 -3 , more preferably 1.0 to 2.3×10 -3 ;
(iv)热膨胀系数为40~80ppm/℃(室温至300℃范围内),优选60~70ppm/℃;(iv) The coefficient of thermal expansion is 40-80ppm/°C (in the range of room temperature to 300°C), preferably 60-70ppm/°C;
(v)吸水率为0.15~0.4%(沸水中浸泡24~96h后)。(v) The water absorption rate is 0.15-0.4% (after soaking in boiling water for 24-96 hours).
在本发明的第六方面,提供了一种如本发明第五方面所述的固化产物的制备方法,所述方法包括步骤:对固化原料进行加热固化,从而得到固化产物;In the sixth aspect of the present invention, there is provided a method for preparing a cured product according to the fifth aspect of the present invention, the method comprising the steps of: heating and curing the curing raw material to obtain a cured product;
其中,所述固化原料包括本发明第一方面所述的“分子玻璃”单体。Wherein, the curing raw material includes the "molecular glass" monomer described in the first aspect of the present invention.
在另一优选例中,所述固化原料如本发明第五方面所述。In another preferred example, the curing raw material is as described in the fifth aspect of the present invention.
在另一优选例中,所述固化原料直接进行固化或以溶解于第四惰性溶剂的溶液形式进行固化,从而得到固化产物。In another preferred embodiment, the curing raw material is cured directly or in the form of a solution dissolved in a fourth inert solvent, so as to obtain a cured product.
在另一优选例中,所述第四惰性溶剂选自下组:甲苯、二甲苯、三甲苯、氯苯、二氯苯、二苯醚、环己酮、三氯甲烷、丙酮、N,N-二甲基甲酰胺、N,N-二甲基乙酰胺、二甲基亚砜、N-甲基吡咯烷酮、三缩乙二醇二甲醚、四缩乙二醇二甲醚,或其 组合。In another preferred example, the fourth inert solvent is selected from the group consisting of toluene, xylene, trimethylbenzene, chlorobenzene, dichlorobenzene, diphenyl ether, cyclohexanone, chloroform, acetone, N,N -Dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide, N-methylpyrrolidone, triethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, or combinations thereof .
在另一优选例中,所述固化产物的制备方法为固化原料的固化方法。In another preferred example, the method for preparing the cured product is a method for curing raw materials.
在另一优选例中,所述固化是通过加热进行交联固化(即加热固化)。In another preferred example, the curing is cross-linking and curing by heating (ie heat curing).
在另一优选例中,所述固化在惰性气体保护下进行,其中所述惰性气体选自下组:氮气、氩气。In another preferred embodiment, the curing is performed under the protection of an inert gas, wherein the inert gas is selected from the group consisting of nitrogen and argon.
在另一优选例中,所述加热固化在100-350℃下进行,优选150-300℃。In another preferred example, the heat curing is carried out at 100-350°C, preferably 150-300°C.
在另一优选例中,所述加热固化为程序升温固化。In another preferred example, the heat curing is temperature programmed curing.
在另一优选例中,所述加热固化包括:在170~190℃下固化1~6h,然后在210~240℃下固化3~8h,再在250~300℃固化0.25~2h。In another preferred example, the heat curing includes: curing at 170-190°C for 1-6 hours, then curing at 210-240°C for 3-8 hours, and then curing at 250-300°C for 0.25-2 hours.
在另一优选例中,所述加热固化包括:在170~190℃下固化1~3h,然后在210~240℃下固化3~6h,再在250~300℃固化0.25~1h。In another preferred example, the heat curing includes: curing at 170-190° C. for 1-3 hours, then curing at 210-240° C. for 3-6 hours, and then curing at 250-300° C. for 0.25-1 hour.
在另一优选例中,所述加热固化温度由所述固化原料的DSC曲线确定。In another preferred example, the heating and curing temperature is determined by the DSC curve of the curing raw material.
在另一优选例中,所述加热固化时间由所述固化原料的结构、质量、形态决定。In another preferred example, the heating and curing time is determined by the structure, quality and shape of the curing raw material.
在另一优选例中,所述的加热固化还包括:在所述加热固化之前,对所述固化原料进行缓慢升温和/或机械振动,从而除去气泡,形成致密液体;优选地,所述的升温为由室温升温至170~190℃。In another preferred example, the heating and curing further includes: before the heating and curing, slowly heating and/or mechanically vibrating the curing raw material, so as to remove air bubbles and form a dense liquid; preferably, the The temperature rise is from room temperature to 170-190°C.
在本发明的第七方面,提供了一种制品,所述制品含有如本发明第五方面所述的固化产物、如本发明第一方面所述的“分子玻璃”单体;In the seventh aspect of the present invention, a product is provided, which contains the cured product as described in the fifth aspect of the present invention, the "molecular glass" monomer as described in the first aspect of the present invention;
或所述制品是用如本发明第五方面所述的固化产物、如本发明第一方面所述的“分子玻璃”单体制备的。Or the article is prepared by using the cured product as described in the fifth aspect of the present invention, the "molecular glass" monomer as described in the first aspect of the present invention.
在另一优选例中,所述制品为高频低介电常数材料,优选低介电薄膜基板材料、低介电薄膜、低介电常数基体树脂、低介电封装材料。In another preferred example, the product is a high-frequency low-dielectric constant material, preferably a low-dielectric film substrate material, a low-dielectric film, a low-dielectric matrix resin, and a low-dielectric packaging material.
在另一优选例中,所述的制品包括:基材,以及涂覆于基材之上的含有如本发明第五方面所述的固化产物的薄膜。In another preferred embodiment, the product includes: a substrate, and a film containing the cured product according to the fifth aspect of the present invention coated on the substrate.
在另一优选例中,所述的制品是通过以下方法制备的:用如本发明第五方面所述的固化原料进行成型,得到预成型体,然后对所述的预成型体进行加热固化,得到所述的制品。In another preferred example, the product is prepared by the following method: molding with the curing raw material as described in the fifth aspect of the present invention to obtain a preform, and then heating and curing the preform, The product described is obtained.
在另一优选例中,所述的成型是通过选自下组的成型工艺进行的:灌模,溶液 旋涂,或溶液滴涂。In another preferred embodiment, the forming is carried out by a forming process selected from the following group: pouring, solution spin coating, or solution drop coating.
在另一优选例中,所述溶液旋涂或溶液滴涂包括步骤:将如本发明第五方面所述的固化原料或所述固化原料的预聚体溶于第四惰性溶剂中配成溶液,然后进行旋涂或滴涂;In another preferred example, the solution spin coating or solution drop coating includes the step of: dissolving the curing raw material or the prepolymer of the curing raw material as described in the fifth aspect of the present invention in a fourth inert solvent to form a solution , followed by spin coating or drop coating;
其中,所述预聚体为固化原料溶解在第四惰性溶剂中加热交联得到的寡聚物。Wherein, the prepolymer is an oligomer obtained by dissolving curing raw materials in a fourth inert solvent and heating and crosslinking.
在另一优选例中,所述预聚体在溶液中仍保持较好的溶解度,具有良好的加工性能。In another preferred example, the prepolymer still maintains good solubility in the solution and has good processability.
在另一优选例中,所述预聚体的交联度为0.1%-50%,优选5%-30%。In another preferred example, the degree of crosslinking of the prepolymer is 0.1%-50%, preferably 5%-30%.
在另一优选例中,所述第四惰性溶剂选自下组:甲苯、二甲苯、三甲苯、氯苯、二氯苯、二苯醚、环己酮、三氯甲烷、丙酮、N,N-二甲基甲酰胺、N,N-二甲基乙酰胺、二甲基亚砜、N-甲基吡咯烷酮、三缩乙二醇二甲醚、四缩乙二醇二甲醚,或其组合。In another preferred example, the fourth inert solvent is selected from the group consisting of toluene, xylene, trimethylbenzene, chlorobenzene, dichlorobenzene, diphenyl ether, cyclohexanone, chloroform, acetone, N,N -Dimethylformamide, N,N-dimethylacetamide, dimethyl sulfoxide, N-methylpyrrolidone, triethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, or combinations thereof .
在本发明的第八方面,提供了一种如本发明第七方面所述的制品,所述制品选自下组:低介电薄膜基板材料、低介电薄膜、低介电常数基体树脂、低介电封装材料、高频低介电常数材料。In the eighth aspect of the present invention, there is provided a product as described in the seventh aspect of the present invention, the product is selected from the group consisting of low dielectric film substrate material, low dielectric film, low dielectric constant matrix resin, Low dielectric packaging materials, high frequency low dielectric constant materials.
应理解,在本发明范围内中,本发明的上述各技术特征和在下文(如实施例)中具体描述的各技术特征之间都可以互相组合,从而构成新的或优选的技术方案。限于篇幅,在此不再一一累述。It should be understood that within the scope of the present invention, the above-mentioned technical features of the present invention and the technical features specifically described in the following (such as embodiments) can be combined with each other to form new or preferred technical solutions. Due to space limitations, we will not repeat them here.
图1显示了分子玻璃单体M1和M2的DSC曲线(升温速率10℃/min)。Figure 1 shows the DSC curves of molecular glass monomers M1 and M2 (heating rate 10°C/min).
图2显示了分子玻璃单体M1和M2固化后的树脂样条的DMA曲线(升温速率5℃/min)。Figure 2 shows the DMA curves of the resin sample strips cured by the molecular glass monomers M1 and M2 (heating rate 5°C/min).
图3显示了分子玻璃单体M1和M2固化后的树脂样条的CTE曲线(升温速率5℃/min)。Figure 3 shows the CTE curves of the resin sample strips cured by the molecular glass monomers M1 and M2 (heating rate 5°C/min).
本发明人经过广泛而深入的研究,首次意外地开发了一种“分子玻璃”单 体及其固化后得到的树脂。该“分子玻璃”单体具有刚性的芳基和可热固化基团以及柔性的烯丙基,“刚柔并济”的结构特点使其具有优异的加工性能、在常温下保持无定形状态,此外这种单体的合成方法简单、条件温和、产率高。由该“分子玻璃”单体固化后得到的树脂表现出优异的高频介电性能(10GHz下介电常数为2.53,介电损耗为1.93×10
-3),且玻璃化转变温度高(T
g>339℃),热膨胀系数低(25-300℃,CTE低至63.0ppm/℃),吸水率低(低至0.19%),可作为高性能基体树脂或封装材料用于高频通讯、大规模集成电路、微电子工业和航空航天等领域中。
After extensive and in-depth research, the inventor unexpectedly developed a "molecular glass" monomer and the resin obtained after curing for the first time. The "molecular glass" monomer has a rigid aryl group, a heat-curable group and a flexible allyl group. The structural characteristics of "rigid and flexible" make it have excellent processing performance and maintain an amorphous state at room temperature. In addition, the synthesis method of this monomer is simple, the conditions are mild, and the yield is high. The resin obtained by curing the "molecular glass" monomer exhibits excellent high-frequency dielectric properties (the dielectric constant is 2.53 at 10 GHz, and the dielectric loss is 1.93×10 -3 ), and the glass transition temperature is high (T g >339℃), low thermal expansion coefficient (25-300℃, CTE as low as 63.0ppm/℃), low water absorption (as low as 0.19%), can be used as high-performance matrix resin or packaging material for high-frequency communication, large Scale integrated circuits, microelectronics industry and aerospace and other fields.
术语the term
在本发明中,除非特别指出,所用术语具有本领域技术人员公知的一般含义。In the present invention, unless otherwise specified, the terms used have the usual meanings known to those skilled in the art.
术语“‘分子玻璃’单体”、“分子玻璃”可互换使用,是指如式(I)所示的二取代1,3,5-三嗪和双酚反应得到的分子量较大的小分子化合物。The terms "'molecular glass' monomer" and "molecular glass" are used interchangeably, and refer to the reaction of disubstituted 1,3,5-triazine and bisphenol as shown in formula (I). molecular compound.
术语“C3-C8苯并环烯基”是指由一个苯环和一个具有3-8个碳原子的环烷烃组成的多环苯并环烷烃在苯环上失去一个氢原子形成的基团,例如苯并环丁烯基、苯并环戊烯基、苯并环己烯基等。The term "C3-C8 benzocycloalkenyl" refers to a group formed by a polycyclic benzocycloalkane composed of a benzene ring and a cycloalkane with 3-8 carbon atoms when a hydrogen atom is lost on the benzene ring, For example, benzocyclobutenyl, benzocyclopentenyl, benzocyclohexenyl and the like.
术语“苯并环丁烯基”是指苯并环丁烯的苯环上失去一个氢原子形成的基团,例如
或类似基团。
The term "benzocyclobutenyl" refers to a group formed by losing a hydrogen atom on the benzene ring of benzocyclobutene, for example or similar groups.
术语“C2-C6烯基苯基”是指苯取代具有2-6个碳原子的烯烃的一个氢原子形成的化合物在苯环上失去一个氢原子形成的基团,例如苯乙烯基、1-丙烯基苯基、1-丁烯基苯基等。The term "C2-C6 alkenylphenyl" refers to a group formed by the loss of a hydrogen atom on the benzene ring, such as styryl, 1- propenylphenyl, 1-butenylphenyl, etc.
术语“C1-C15烷基硅基”是指
其中R
1、R
2、R
3各自独立地为下述C1-C6烷基,例如三甲基硅基、三乙基硅基、三异丙基硅基、三丁基硅基等。
The term "C1-C15 alkylsilyl" means Wherein R 1 , R 2 , and R 3 are each independently the following C1-C6 alkyl groups, such as trimethylsilyl, triethylsilyl, triisopropylsilyl, tributylsilyl, etc.
在本发明中,术语“卤素”指F、Cl、Br或I。In the present invention, the term "halogen" refers to F, Cl, Br or I.
在本发明中,术语“C1-C6烷基”是指包括1-6个碳原子的直链或支链的烷基,例如甲基、乙基、丙基、异丙基、丁基、异丁基、叔丁基、新戊基、特戊基、或类似基团。“C1-C4烷基”具有类似的含义。In the present invention, the term "C1-C6 alkyl" refers to a linear or branched alkyl group comprising 1-6 carbon atoms, such as methyl, ethyl, propyl, isopropyl, butyl, iso Butyl, tert-butyl, neopentyl, tertyl, or similar groups. "C1-C4 alkyl" has a similar meaning.
在本发明中,术语“C2-C6烯基”是指具有2-6个碳原子的含有一个双键 的直链或支链烯基,非限制性地包括乙烯基、丙烯基、丁烯基、异丁烯基、戊烯基和己烯基等。“C2-C4烯基”具有类似的含义。In the present invention, the term "C2-C6 alkenyl" refers to a straight-chain or branched alkenyl group with 2-6 carbon atoms containing a double bond, including non-limiting ethenyl, propenyl, butenyl , Isobutenyl, Pentenyl and Hexenyl etc. "C2-C4 alkenyl" has a similar meaning.
在本发明中,术语“C2-C4炔基”是指具有2-4个碳原子的含有一个三键的直链或支链炔基,非限制性地包括乙炔基、丙炔基、丁炔基、异丁炔基等。In the present invention, the term "C2-C4 alkynyl" refers to a straight-chain or branched-chain alkynyl group with 2-4 carbon atoms containing a triple bond, including without limitation ethynyl, propynyl, butynyl base, isobutynyl, etc.
在本发明中,术语“芳环”或“芳基”具有相同的含义,优选为“C6-C10芳基”。术语“C6-C10芳基”是指在环上不含杂原子的具有6-10个碳原子的芳香族环基,如苯基、萘基等。In the present invention, the term "aromatic ring" or "aryl" has the same meaning, preferably "C6-C10 aryl". The term "C6-C10 aryl" refers to an aromatic ring group having 6-10 carbon atoms without heteroatoms in the ring, such as phenyl, naphthyl and the like.
在本发明中,术语“取代”指特定的基团上的一个或多个氢原子被特定的取代基所取代。特定的取代基为在前文中相应描述的取代基,或各实施例中所出现的取代基。除非特别说明,某个取代的基团可以在该基团的任何可取代的位点上具有一个选自特定组的取代基,所述的取代基在各个位置上可以是相同或不同的。本领域技术人员应理解,本发明所预期的取代基的组合是那些稳定的或化学上可实现的组合。所述取代基例如(但并不限于):卤素、羟基、羧基(-COOH)、C1-C6烷基、C2-C6烯基、C2-C6炔基、C3-C8环烷基、3-至12元杂环基、芳基、杂芳基、C1-C8醛基、C2-C10酰基、C2-C10酯基、氨基、C1-C6烷氧基、C1-C10磺酰基等。In the present invention, the term "substituted" means that one or more hydrogen atoms on a specific group are replaced by a specific substituent. The specific substituents are the corresponding substituents described above, or the substituents appearing in each embodiment. Unless otherwise specified, a substituted group may have a substituent selected from a specific group at any substitutable position of the group, and the substituents may be the same or different at each position. Those skilled in the art will appreciate that combinations of substituents contemplated by this invention are those that are stable or chemically feasible. The substituents are for example (but not limited to): halogen, hydroxyl, carboxyl (-COOH), C1-C6 alkyl, C2-C6 alkenyl, C2-C6 alkynyl, C3-C8 cycloalkyl, 3- to 12-membered heterocyclic group, aryl group, heteroaryl group, C1-C8 aldehyde group, C2-C10 acyl group, C2-C10 ester group, amino group, C1-C6 alkoxy group, C1-C10 sulfonyl group, etc.
在本发明中,术语1-6指1、2、3、4、5或6。其他类似术语具有类似含义。In the present invention, the term 1-6 refers to 1, 2, 3, 4, 5 or 6. Other similar terms have similar meanings.
术语“多个”指1、2、3、4、5或6个。The term "plurality" refers to 1, 2, 3, 4, 5 or 6.
分子玻璃molecular glass
分子玻璃是一种具有较大分子量的小分子化合物,其在常温下呈现聚合物一样的无定形特性,它兼具了小分子合成可控、容易纯化和聚合物无定形的特点,溶于溶剂后具有良好的成膜性,能直接涂在玻璃板上形成薄膜,在高温固化时不会像普通的小分子单体一样发生熔化进而流淌,具有极佳的加工性能。Molecular glass is a small molecular compound with relatively large molecular weight. It exhibits the same amorphous characteristics as polymers at room temperature. It has the characteristics of controllable synthesis of small molecules, easy purification and amorphous polymers. It is soluble in solvents It has good film-forming properties and can be directly coated on a glass plate to form a thin film. It will not melt and flow like ordinary small molecule monomers when it is cured at high temperature, and has excellent processing performance.
本发明在进行分子玻璃的分子设计的过程中利用三嗪环可修饰性强、热稳定好、介电性能优异的特点,通过格氏反应引入芳基和可固化基团,形成一种刚性的三维结构,具有大的自由体积,它能有效降低介电常数,同时防止分子间的致密堆积形成晶体。之后用二烯丙基双酚化合物作为linker,将两分子二取代三嗪单体连接起来提高分子量,引入柔性的烯丙基可以降低分子的结晶性,同时提高交联密度。另外,双酚结构通过sp
3碳连接,四面体的化学键分布能 够进一步增加分子的无序性。总的来说,分子玻璃单体的结构设计巧妙,合成步骤简单,原料易得,具有很好的应用前景。
In the process of molecular design of molecular glass, the present invention utilizes the characteristics of strong modifiability, good thermal stability and excellent dielectric properties of triazine ring, and introduces aryl group and curable group through Grignard reaction to form a rigid glass. The three-dimensional structure has a large free volume, which can effectively reduce the dielectric constant and prevent the dense packing between molecules to form crystals. After that, diallyl bisphenol compound is used as a linker to connect two molecules of disubstituted triazine monomers to increase the molecular weight. The introduction of flexible allyl groups can reduce the crystallinity of molecules and increase the crosslinking density. In addition, the bisphenol structure is linked by the sp carbon, and the chemical bond distribution of the tetrahedron can further increase the disorder of the molecule. In general, the structure design of molecular glass monomer is ingenious, the synthesis steps are simple, and the raw materials are easy to obtain, so it has a good application prospect.
分子玻璃固化树脂Molecular vitrified resin
本发明的分子玻璃在固化后形成的树脂不熔不溶,具有优异的耐热性和低吸水率,尤其是在高频下表现出很低的介电常数和介电损耗。其在10GHz下表现出低的介电常数和介电损耗,同时具有高模量、低热膨胀系数、低吸水率和良好的耐热性,可作为低介电常数基体树脂或封装材料应用于高频通讯、微电子工业和航空航天等领域中。The resin formed by the molecular glass of the present invention is infusible and insoluble after solidification, has excellent heat resistance and low water absorption, and especially exhibits very low dielectric constant and dielectric loss at high frequencies. It exhibits low dielectric constant and dielectric loss at 10GHz, and has high modulus, low thermal expansion coefficient, low water absorption and good heat resistance. It can be used as a low dielectric constant matrix resin or packaging material for high In the fields of frequency communication, microelectronics industry and aerospace.
本发明的主要优点包括:The main advantages of the present invention include:
1)本发明所述的“分子玻璃”单体制备过程简单,从简单易得的原料出发,通过简单的格氏反应即可得到三嗪中间体,再通过直接水解聚合得到具有热交联基团的“分子玻璃”单体,合成步骤简单,条件温和,产率较高。1) The preparation process of the "molecular glass" monomer described in the present invention is simple. Starting from simple and easy-to-obtain raw materials, a triazine intermediate can be obtained through a simple Grignard reaction, and then obtained by direct hydrolysis polymerization. A group of "molecular glass" monomers, the synthesis steps are simple, the conditions are mild, and the yield is high.
2)本发明所述的“分子玻璃”单体包含刚性的芳基和热固性基团,以及柔性的丙烯基,在减少介电损耗的同时不会像小分子一样结晶;2) The "molecular glass" monomer of the present invention contains rigid aryl groups and thermosetting groups, as well as flexible acrylic groups, which will not crystallize like small molecules while reducing dielectric loss;
3)本发明所述的“分子玻璃”单体具有优异的加工性能,溶于溶液后可以直接进行旋涂或滴涂,然后热固化得到树脂,加工工艺极具优势。3) The "molecular glass" monomer of the present invention has excellent processing properties. After being dissolved in a solution, it can be directly spin-coated or drip-coated, and then thermally cured to obtain a resin. The processing technology is extremely advantageous.
4)本发明所述的“分子玻璃”单体固化后可作为优异的高频介电材料,表现出高耐热性,低吸水率(低至0.19%),高玻璃化转变温度(T
g>339℃),低热膨胀系数(25-300℃,CTE低至63.0ppm/℃)并且在10GHz高频条件下表现出优异的介电性能(介电常数低至2.53,介电损耗低至1.93×10
-3)。
4) The "molecular glass" monomer of the present invention can be used as an excellent high-frequency dielectric material after curing, showing high heat resistance, low water absorption (as low as 0.19%), and a high glass transition temperature (T g >339℃), low thermal expansion coefficient (25-300℃, CTE as low as 63.0ppm/℃) and exhibits excellent dielectric properties at 10GHz high frequency (dielectric constant as low as 2.53, dielectric loss as low as 1.93 ×10 -3 ).
5)本发明所述的“分子玻璃”单体固化后得到一种新型高温固化树脂,可作为高性能基体树脂或封装材料用于高频通讯、大规模集成电路、微电子工业和航空航天等领域中。5) A new type of high-temperature curing resin can be obtained after curing the "molecular glass" monomer of the present invention, which can be used as a high-performance matrix resin or packaging material for high-frequency communication, large-scale integrated circuits, microelectronics industry, aerospace, etc. in the field.
下面结合具体实施例,进一步阐述本发明。应理解,这些实施例仅用于说明本发明而不用于限制本发明的范围。下列实施例中未注明具体条件的实验方法,通常按照常规条件,例如按照制造厂商所建议的条件。除非另外说明,否则百分比和份数是重量百分比和重量份数。Below in conjunction with specific embodiment, further illustrate the present invention. It should be understood that these examples are only used to illustrate the present invention and are not intended to limit the scope of the present invention. For the experimental methods not indicated in the following examples, the specific conditions are usually in accordance with conventional conditions, for example, in accordance with the conditions suggested by the manufacturer. Percentages and parts are by weight unless otherwise indicated.
通用测试方法General Test Method
DMA测试(即动态热机械分析)DMA testing (i.e. dynamic thermomechanical analysis)
动态热机械分析(DMA)由DMA/Q800仪器在加热速率为5℃/min的氮气氛围下测试。Dynamic thermomechanical analysis (DMA) was tested by a DMA/Q800 instrument under a nitrogen atmosphere with a heating rate of 5 °C/min.
介电性能测试Dielectric performance test
介电常数和介电损耗由分离介质谐振器(QWED)在频率为5/10GHz的室温条件下测试。The dielectric constant and dielectric loss were measured by a separate dielectric resonator (QWED) at room temperature at a frequency of 5/10 GHz.
吸水率测试Water absorption test
将固化后的树脂片在100℃真空条件下干燥至重量恒定,然后在沸水中浸泡数天。根据固化树脂片浸泡后重量的增加来计算其吸水率。The cured resin sheet was dried under vacuum at 100°C to a constant weight, and then soaked in boiling water for several days. Calculate the water absorption rate according to the weight increase of the cured resin sheet after soaking.
实施例1.双取代1,3,5-三嗪S1的合成 Embodiment 1. Synthesis of double substituted 1,3,5-triazine S1
在氮气气体保护下,向250mL干燥的三口烧瓶加入180mmol镁屑、100mL四氢呋喃和一粒碘(约40mg),再缓慢滴加120mmol 4-溴甲苯,使溶液保持微沸,回流搅拌1h制得4-甲基苯格氏试剂。Under the protection of nitrogen gas, add 180mmol of magnesium chips, 100mL of tetrahydrofuran and a grain of iodine (about 40mg) to a 250mL dry three-necked flask, then slowly add 120mmol of 4-bromotoluene dropwise to keep the solution slightly boiling, and stir at reflux for 1h to obtain 4 - Methylphenyl Grignard reagent.
另取500mL干燥的三口烧瓶,在氮气保护下加入80mmol 2,4,6-三氯-1,3,5-三嗪,滴加120mmol 4-甲基苯格氏试剂,在-5℃下搅拌反应19小时。氯化铵淬灭,乙酸乙酯萃取,浓缩除去溶剂后柱层析,得到白色固体化合物1共16.97g,收率为88%。
1H NMR(CDCl
3,400MHz),δ(ppm)8.37(d,J=8.1Hz,2H),7.31(d,J=8.1Hz,2H),2.44(s,3H).
13C NMR(CDCl
3,126MHz),δ(ppm)174.74,171.85,146.07,129.99,129.86,21.93.
Take another 500mL dry three-necked flask, add 80mmol 2,4,6-trichloro-1,3,5-triazine under nitrogen protection, add 120mmol 4-methylbenzene Grignard reagent dropwise, and stir at -5°C Reacted for 19 hours. Quenched with ammonium chloride, extracted with ethyl acetate, concentrated to remove the solvent and followed by column chromatography to obtain 16.97 g of white solid compound 1 with a yield of 88%. 1 H NMR (CDCl 3 , 400MHz), δ (ppm) 8.37 (d, J = 8.1Hz, 2H), 7.31 (d, J = 8.1Hz, 2H), 2.44 (s, 3H). 13 C NMR (CDCl 3 ,126MHz), δ(ppm)174.74,171.85,146.07,129.99,129.86,21.93.
向500mL干燥的三口烧瓶中加入68mmol化合物1、200mL无水四氢呋喃,在室温下,滴加102mmol预制(制备方法与前述4-甲基苯格氏试剂相同)溶于150mL无水四氢呋喃的4-溴苯并环丁烯格氏试剂。滴加完成后,室温下搅拌7.5小时。减压除去溶剂,柱层析得到白色二取代1,3,5-三嗪中间体S1,产率为73%。Add 68mmol of compound 1 and 200mL of anhydrous tetrahydrofuran to a 500mL dry three-necked flask, and add dropwise 102mmol of preformed (preparation method is the same as the aforementioned 4-methylbenzene Grignard reagent) dissolved in 150mL of anhydrous tetrahydrofuran 4-bromo Benzocyclobutene Grignard reagent. After the dropwise addition was completed, the mixture was stirred at room temperature for 7.5 hours. The solvent was removed under reduced pressure, and the white disubstituted 1,3,5-triazine intermediate S1 was obtained by column chromatography with a yield of 73%.
1H NMR(CDCl
3,400MHz),δ(ppm)8.52(d,J=7.2Hz,1H),8.49(d,J=8.1Hz,2H),8.28(s,1H),7.32(d,J=8.1Hz,2H),7.20(d,J=7.8Hz,1H),3.26(s,4H),2.45(s,3H).
1 H NMR (CDCl 3 , 400MHz), δ(ppm) 8.52(d, J=7.2Hz, 1H), 8.49(d, J=8.1Hz, 2H), 8.28(s, 1H), 7.32(d, J =8.1Hz, 2H), 7.20(d, J=7.8Hz, 1H), 3.26(s, 4H), 2.45(s, 3H).
13C NMR(CDCl
3,126MHz),δ(ppm)173.92,173.15,171.87,152.62,146.36,144.33,133.24,131.80,129.56,129.38,128.77,123.38,122.87,30.07,29.40,21.82.
13 C NMR (CDCl 3 , 126MHz), δ (ppm) 173.92, 173.15, 171.87, 152.62, 146.36, 144.33, 133.24, 131.80, 129.56, 129.38, 128.77, 123.38, 122.87, 30.07, 219.82.
实施例2.分子玻璃单体M1的合成 Embodiment 2. Synthesis of Molecular Glass Monomer M1
取500mL单口瓶,加入13.2mmol中间体S2,48.0mmol NaOH和80mL H
2O,在室温下搅拌0.5h。继续加入120mL CHCl
3,24mmol中间体S1和0.13mmol相转移催化剂十六烷基三甲基溴化铵。升温至60℃,剧烈搅拌下反应14h。停止反应后用二氯甲烷萃取,干燥,减压除去溶剂,柱层析得到白色无定形“分子玻璃”单体M1 7.70g,收率:75%。
Take a 500 mL single-necked flask, add 13.2 mmol of intermediate S2, 48.0 mmol of NaOH and 80 mL of H 2 O, and stir at room temperature for 0.5 h. Continue to add 120 mL of CHCl 3 , 24 mmol of intermediate S1 and 0.13 mmol of phase transfer catalyst cetyltrimethylammonium bromide. Raise the temperature to 60°C and react for 14h under vigorous stirring. After stopping the reaction, it was extracted with dichloromethane, dried, and the solvent was removed under reduced pressure. Column chromatography gave 7.70 g of white amorphous "molecular glass" monomer M1, yield: 75%.
1H NMR(500MHz,CDCl
3)δ8.33(dd,J=11.6,8.3Hz,6H),8.10(s,2H),7.19(dd,J=15.0,5.0Hz,6H),7.13(dd,J=8.4,2.0Hz,2H),7.06(dd,J=16.1,8.1Hz,4H),5.80(ddt,J=13.0,10.0,6.5Hz,2H),4.99–4.76(m,4H),3.31(d,J=6.3Hz,4H),3.11(s,8H),2.31(s,6H),1.72(s,6H).
1 H NMR (500MHz, CDCl 3 ) δ8.33(dd, J=11.6, 8.3Hz, 6H), 8.10(s, 2H), 7.19(dd, J=15.0, 5.0Hz, 6H), 7.13(dd, J=8.4,2.0Hz,2H),7.06(dd,J=16.1,8.1Hz,4H),5.80(ddt,J=13.0,10.0,6.5Hz,2H),4.99–4.76(m,4H),3.31 (d,J=6.3Hz,4H),3.11(s,8H),2.31(s,6H),1.72(s,6H).
13C NMR(CDCl
3,126MHz),δ(ppm)174.55,173.79,171.83,151.70,148.46,148.29,146.05,143.42,136.08,134.30,132.84,131.51,129.33,129.08,128.68,128.38,126.08,123.14,122.61,121.88,116.19,42.71,34.77,31.09,29.94,29.39,21.74.
13 C NMR(CDCl 3 ,126MHz),δ(ppm)174.55,173.79,171.83,151.70,148.46,148.29,146.05,143.42,136.08,134.30,132.84,131.51,129.33,129.08,128.68,128.38,126.08,123.14, 122.61, 121.88, 116.19, 42.71, 34.77, 31.09, 29.94, 29.39, 21.74.
实施例3.中间体S2’的合成Embodiment 3. the synthesis of intermediate S2'
取250mL封管,加入50mL丙酮,25mmol K
2CO
3,10mmol双酚AF,先在室温下搅拌30min,继续加入S2,升温至70℃反应一夜。停止反应后抽滤除去 不溶杂质,旋干溶剂得到二烯丙基取代的目标中间体4.11g,为无色透明液体,收率:98.9%。后将得到中间体直接置入50mL单口烧瓶中,置换氮气3次,在210℃下反应9h,停止反应后柱层析分离,得到淡黄色液体3.771g,产率:91.7%。
Take 250mL sealed tube, add 50mL acetone, 25mmol K 2 CO 3 , 10mmol bisphenol AF, first stir at room temperature for 30min, continue to add S2, heat up to 70°C for overnight reaction. After the reaction was stopped, the insoluble impurities were removed by suction filtration, and the solvent was spin-dried to obtain 4.11 g of the diallyl-substituted target intermediate as a colorless transparent liquid with a yield of 98.9%. The obtained intermediate was directly placed into a 50 mL single-necked flask, nitrogen was replaced 3 times, and reacted at 210° C. for 9 h. After the reaction was stopped, column chromatography was separated to obtain 3.771 g of light yellow liquid, yield: 91.7%.
1H NMR(CDCl
3,400MHz)δ(ppm)δ7.16(d,J=8.8Hz,2H),7.11(s,2H),6.80(d,J=8.5Hz,2H),5.97(m,2H),5.55(s,2H,OH),5.12(dd,J=12.0,10.3Hz,4H),3.38(d,J=6.2Hz,4H).
19F NMR(CDCl
3,376MHz)δ(ppm)-63.96(s,6F).
1 H NMR (CDCl 3 , 400MHz) δ(ppm) δ7.16(d, J=8.8Hz, 2H), 7.11(s, 2H), 6.80(d, J=8.5Hz, 2H), 5.97(m, 2H), 5.55(s, 2H, OH), 5.12(dd, J=12.0, 10.3Hz, 4H), 3.38(d, J=6.2Hz, 4H). 19 F NMR (CDCl 3 , 376MHz) δ (ppm )-63.96(s,6F).
实施例4.分子玻璃单体M2的合成Example 4. Synthesis of Molecular Glass Monomer M2
取500mL单口瓶,加入7.2mmol单体S2’,26.0mmol NaOH和60mL H
2O,在室温下搅拌0.5h。继续加入80mL CHCl
3,13.0mmol单体S1和0.07mmol相转移催化剂十六烷基三甲基溴化铵。升温至60℃,剧烈搅拌下反应12.5h。停止反应后用二氯甲烷萃取,干燥,减压除去溶剂,柱层析得到白色无定形“分子玻璃”单体M2 4.54g,收率:73%。
Take a 500mL single-necked bottle, add 7.2mmol monomer S2', 26.0mmol NaOH and 60mL H 2 O, and stir at room temperature for 0.5h. Continue to add 80 mL of CHCl 3 , 13.0 mmol of monomer S1 and 0.07 mmol of phase transfer catalyst cetyltrimethylammonium bromide. Raise the temperature to 60°C and react for 12.5h under vigorous stirring. After the reaction was stopped, it was extracted with dichloromethane, dried, and the solvent was removed under reduced pressure. Column chromatography gave 4.54 g of white amorphous "molecular glass" monomer M2, yield: 73%.
1H NMR(CDCl
3,400MHz),δ(ppm)8.41–8.29(m,6H),8.11(s,2H),7.36(d,J=7.6Hz,4H),7.25–7.16(m,6H),7.08(d,J=7.7Hz,2H),5.76(ddt,J=16.6,10.0,6.4Hz,2H),4.90–4.84(m,4H),3.33(d,J=6.4Hz,4H),3.15(s,8H),2.35(s,6H).
1 H NMR (CDCl 3 , 400MHz), δ (ppm) 8.41–8.29 (m, 6H), 8.11 (s, 2H), 7.36 (d, J=7.6Hz, 4H), 7.25–7.16 (m, 6H) ,7.08(d,J=7.7Hz,2H),5.76(ddt,J=16.6,10.0,6.4Hz,2H),4.90–4.84(m,4H),3.33(d,J=6.4Hz,4H), 3.15(s,8H),2.35(s,6H).
13C NMR(CDCl
3,126MHz),δ174.67,173.92,171.57,151.93,151.11,146.15,143.66,135.17,134.14,132.68,132.64,132.57,130.97,129.39,129.12,128.42,127.74-120.89(q),123.16,122.67,122.49,116.84,77.34,77.08,76.83,67.49-57.87(m),34.46,29.97,29.38,21.73.
13 C NMR(CDCl 3 ,126MHz),δ174.67,173.92,171.57,151.93,151.11,146.15,143.66,135.17,134.14,132.68,132.64,132.57,130.97,129.39,129.12,128.42,127.74-120.89(q),123.16 ,122.67,122.49,116.84,77.34,77.08,76.83,67.49-57.87(m),34.46,29.97,29.38,21.73.
实施例5.分子玻璃单体M1的固化及其相应树脂的性能研究Example 5. Research on the curing of molecular glass monomer M1 and its corresponding resin properties
取实施例2中制备的目标单体M1放入管式炉内,管式炉为半封闭系统,内部充有流量恒定为0.3L/min的高纯氮气,升温至190℃固化2h,240℃固 化4h,260℃固化0.5h,得到固化树脂P1。利用DSC测试单体M1的玻璃化转变温度为69℃,结果如图1所示。将固化后的样块打磨成均匀圆片,测试其介电性能,结果表明,在5GHz下介电常数为2.70,介电损耗为1.82×10
-3,在10GHz下介电常数为2.67,介电损耗为2.22×10
-3。如图2所示,DMA(动态热机械分析)测试结果表明,固化树脂P1的玻璃化转变温度为339℃。如图3所示,通过CTE(热膨胀系数)测试发现,P1具有良好的尺寸稳定性,在室温至300℃范围内热膨胀系数为62.6ppm/℃。将P1在沸水中浸泡72h后,测试其吸水率为0.36%。
Take the target monomer M1 prepared in Example 2 and put it into a tube furnace. The tube furnace is a semi-closed system filled with high-purity nitrogen gas with a constant flow rate of 0.3L/min. The temperature is raised to 190°C for 2 hours, and then solidified at 240°C. Cured for 4 hours, and cured for 0.5 hours at 260°C to obtain cured resin P1. The glass transition temperature of the monomer M1 measured by DSC is 69° C., and the results are shown in FIG. 1 . Grind the cured sample into a uniform disc, and test its dielectric properties. The results show that the dielectric constant is 2.70 at 5 GHz, the dielectric loss is 1.82×10 -3 , and the dielectric constant is 2.67 at 10 GHz. The electrical loss is 2.22×10 -3 . As shown in Figure 2, DMA (Dynamic Thermomechanical Analysis) test results show that the glass transition temperature of cured resin P1 is 339°C. As shown in Figure 3, it is found through the CTE (coefficient of thermal expansion) test that P1 has good dimensional stability, and the thermal expansion coefficient is 62.6ppm/°C in the range from room temperature to 300°C. After soaking P1 in boiling water for 72 hours, its water absorption rate was tested to be 0.36%.
实施例6.“分子玻璃”单体M2的固化及其相应树脂的性能研究Example 6. The curing of "molecular glass" monomer M2 and the performance research of its corresponding resin
取实施例4中制备的目标单体M2放入管式炉内,升温至190℃固化2h,240℃固化4h,260℃固化0.5h,得到固化树脂P2。利用DSC测试单体M2的玻璃化转变温度为84℃,结果如图1所示。将固化后的树脂样条打磨成均匀圆片,测试其介电性能,结果表明,在5GHz下介电常数为2.57,介电损耗为1.08×10
-3;在10GHz下介电常数为2.53,介电损耗为1.93×10
-3。如图2所示,DMA测试结果表明,固化树脂P2的玻璃化转变温度为343℃。如图3所示,通过CTE测试发现,P2具有良好的尺寸稳定性,在室温至300℃范围内热膨胀系数为67.1ppm/℃。将P1在沸水中浸泡72h后,测试其吸水率为0.19%。
The target monomer M2 prepared in Example 4 was put into a tube furnace, and the temperature was raised to 190° C. for 2 hours, 240° C. for 4 hours, and 260° C. for 0.5 hours to obtain cured resin P2. The glass transition temperature of the monomer M2 measured by DSC is 84° C., and the results are shown in FIG. 1 . The cured resin sample was polished into a uniform disk, and its dielectric properties were tested. The results showed that the dielectric constant was 2.57 at 5 GHz, and the dielectric loss was 1.08×10 -3 ; the dielectric constant was 2.53 at 10 GHz, The dielectric loss was 1.93×10 -3 . As shown in Figure 2, the DMA test results show that the glass transition temperature of cured resin P2 is 343°C. As shown in Figure 3, it is found through CTE testing that P2 has good dimensional stability, and its coefficient of thermal expansion is 67.1ppm/°C in the range from room temperature to 300°C. After soaking P1 in boiling water for 72 hours, its water absorption rate was tested to be 0.19%.
在本发明提及的所有文献都在本申请中引用作为参考,就如同每一篇文献被单独引用作为参考那样。此外应理解,在阅读了本发明的上述讲授内容之后,本领域技术人员可以对本发明作各种改动或修改,这些等价形式同样落于本申请所附权利要求书所限定的范围。All documents mentioned in this application are incorporated by reference in this application as if each were individually incorporated by reference. In addition, it should be understood that after reading the above teaching content of the present invention, those skilled in the art can make various changes or modifications to the present invention, and these equivalent forms also fall within the scope defined by the appended claims of the present application.
Claims (10)
- 一种“分子玻璃”单体,其特征在于,所述单体具有如下式(I)所示的分子结构:A kind of " molecular glass " monomer, is characterized in that, described monomer has the molecular structure shown in following formula (I):其中,in,各个R 1各自独立地选自下组:氢、卤素、取代或未取代的C1-C6烷基、取代或未取代的C2-C6烯基、取代或未取代的C1-C15烷基硅基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基、C2-C4烯基、C2-C4炔基、未取代的或苯环上的1-3个氢原子被选自下组的取代基取代的苯基:卤素、C1-C4烷基; Each R is independently selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, Wherein the substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the following groups: halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or 1-3 hydrogen atoms on the benzene ring are substituted by a substituent selected from the following group: halogen, C1-C4 alkyl;各个R 2各自独立地选自下组:C3-C8苯并环烯基、C2-C6烯基苯基; Each R is independently selected from the group consisting of C3 - C8 benzocycloalkenyl, C2-C6 alkenylphenyl;R 3、R 4各自独立地选自下组:氢、取代或未取代的C1-C6烷基、取代或未取代的C6-C10芳基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基。 R 3 and R 4 are each independently selected from the following group: hydrogen, substituted or unsubstituted C1-C6 alkyl, substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one or more Each hydrogen atom is replaced by a substituent selected from the group consisting of halogen, C1-C4 alkyl.
- 如权利要求1所述的“分子玻璃”单体,其特征在于,"Molecular glass" monomer as claimed in claim 1, characterized in that,各个R 1各自独立地选自下组:氢、卤素、C1-C6烷基、C1-C6卤代烷基、取代或未取代C2-C6烯基、取代或未取代的C1-C15烷基硅基;其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基、C2-C4烯基、C2-C4炔基、未取代的或苯环上的1-3个氢原子被选自下组的取代基取代的苯基:卤素、C1-C4烷基; Each R is independently selected from the group consisting of hydrogen, halogen, C1 -C6 alkyl, C1-C6 haloalkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl; Wherein the substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the following groups: halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or 1-3 hydrogen atoms on the benzene ring are substituted by a substituent selected from the following group: halogen, C1-C4 alkyl;各个R 2各自独立地选自下组:苯并环丁烯基、苯乙烯基; Each R 2 is independently selected from the group consisting of benzocyclobutenyl, styryl;R 3、R 4相同或不同,相同时,选自如下基团:氢、C1-C6烷基、C1-C6卤代烷基、取代或未取代的C6-C10芳基;不相同时,R 3和R 4中之一为C1-C6烷基和C1-C6卤代烷基,R 3和R 4中另一个为取代或未取代的C6-C10芳基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基。 R 3 and R 4 are the same or different. When they are the same, they are selected from the following groups: hydrogen, C1-C6 alkyl, C1-C6 haloalkyl, substituted or unsubstituted C6-C10 aryl; when they are different, R 3 and One of R 4 is C1-C6 alkyl and C1-C6 haloalkyl, and the other of R 3 and R 4 is substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one or Multiple hydrogen atoms are substituted by substituents selected from the group consisting of halogen, C1-C4 alkyl.
- 如权利要求1所述的“分子玻璃”单体的制备方法,其特征在于,包括步骤:The preparation method of "molecular glass" monomer as claimed in claim 1, is characterized in that, comprises the steps:(a)在第一惰性溶剂中,在碱存在下,将式II化合物和式III化合物反应得到式I化合物;(a) in the first inert solvent, in the presence of a base, the compound of formula II and the compound of formula III are reacted to obtain the compound of formula I;其中,in,R 1选自下组:氢、卤素、取代或未取代的C1-C6烷基、取代或未取代的C2-C6烯基、取代或未取代的C1-C15烷基硅基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基、C2-C4烯基、C2-C4炔基、未取代的或苯环上的1-3个氢原子被选自下组的取代基取代的苯基:卤素、C1-C4烷基; R is selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein said Substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the group consisting of halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or benzene ring 1-3 hydrogen atoms are substituted by substituents selected from the following phenyl group: halogen, C1-C4 alkyl;R 2选自下组:C3-C8苯并环烯基、C2-C6烯基苯基; R is selected from the group consisting of: C3 - C8 benzocycloalkenyl, C2-C6 alkenylphenyl;R 3、R 4各自独立地选自下组:氢、取代或未取代的C1-C6烷基、取代或未取代的C6-C10芳基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基。 R 3 and R 4 are each independently selected from the following group: hydrogen, substituted or unsubstituted C1-C6 alkyl, substituted or unsubstituted C6-C10 aryl, wherein the substitution refers to one or more Each hydrogen atom is replaced by a substituent selected from the group consisting of halogen, C1-C4 alkyl.
- 如权利要求3所述的制备方法,其特征在于,所述第一惰性溶剂为有机溶剂和水的混合溶剂,其中所述有机溶剂选自下组:二氯甲烷、三氯甲烷、二氯乙烷、甲苯、二甲苯,或其组合。The preparation method according to claim 3, wherein the first inert solvent is a mixed solvent of an organic solvent and water, wherein the organic solvent is selected from the group consisting of dichloromethane, trichloromethane, dichloroethane alkanes, toluene, xylene, or combinations thereof.
- 一种如式(II)所示的三嗪化合物:A triazine compound as shown in formula (II):其中,in,R 1选自下组:氢、卤素、取代或未取代的C1-C6烷基、取代或未取代的C2-C6烯基、取代或未取代的C1-C15烷基硅基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基、C2-C4烯基、C2-C4炔基、未取代的或苯环上的1-3个氢原子被选自下组的取代基取代的苯基:卤素、C1- C4烷基; R is selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein said Substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the group consisting of halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or benzene ring 1-3 hydrogen atoms are substituted by substituents selected from the following phenyl group: halogen, C1-C4 alkyl;R 2选自下组:C3-C8苯并环烯基、C2-C6烯基苯基。 R 2 is selected from the group consisting of C3-C8 benzocycloalkenyl, C2-C6 alkenylphenyl.
- 如权利要求5所述的三嗪化合物的制备方法,其特征在于,包括以下步骤:The preparation method of triazine compound as claimed in claim 5, is characterized in that, comprises the following steps:(1)在惰性气体保护下,在第二惰性溶剂中,用式A化合物先与式B化合物进行取代反应,再与式C化合物进行取代反应,得到式II化合物;或(1) Under the protection of an inert gas, in a second inert solvent, the compound of formula A is used to perform a substitution reaction with a compound of formula B, and then with a compound of formula C to obtain a compound of formula II; or(2)在惰性气体保护下,在第二惰性溶剂中,用式A化合物先与式C化合物进行取代反应,再与式B化合物进行取代反应,得到式II化合物;(2) Under the protection of an inert gas, in a second inert solvent, the compound of formula A is used to perform a substitution reaction with the compound of formula C, and then with the compound of formula B to perform a substitution reaction to obtain the compound of formula II;其中,in,R 1选自下组:氢、卤素、取代或未取代的C1-C6烷基、取代或未取代的C2-C6烯基、取代或未取代的C1-C15烷基硅基,其中所述的取代指基团上的一个或多个氢原子被选自下组的取代基取代:卤素、C1-C4烷基、C2-C4烯基、C2-C4炔基、未取代的或苯环上的1-3个氢原子被选自下组的取代基取代的苯基:卤素、C1-C4烷基; R is selected from the group consisting of hydrogen, halogen, substituted or unsubstituted C1 -C6 alkyl, substituted or unsubstituted C2-C6 alkenyl, substituted or unsubstituted C1-C15 alkylsilyl, wherein said Substitution means that one or more hydrogen atoms on the group are replaced by substituents selected from the group consisting of halogen, C1-C4 alkyl, C2-C4 alkenyl, C2-C4 alkynyl, unsubstituted or benzene ring 1-3 hydrogen atoms are substituted by substituents selected from the following phenyl group: halogen, C1-C4 alkyl;R 2选自下组:C3-C8苯并环烯基、C2-C6烯基苯基; R is selected from the group consisting of: C3 - C8 benzocycloalkenyl, C2-C6 alkenylphenyl;X 1、X 2各自独立地为卤素,优选Cl、Br。 X 1 and X 2 are each independently halogen, preferably Cl or Br.
- 一种固化产物,其特征在于,所述固化产物通过固化原料经交联反应形成;A cured product, characterized in that, the cured product is formed by curing raw materials through a crosslinking reaction;其中,所述固化原料包括权利要求1所述的“分子玻璃”单体。Wherein, the solidified raw material comprises the "molecular glass" monomer as claimed in claim 1.
- 如权利要求7所述的固化产物的制备方法,其特征在于,所述方法包括步骤:对固化原料进行加热固化,从而得到固化产物;The method for preparing a cured product according to claim 7, wherein the method comprises the steps of: heating and curing the curing raw material to obtain a cured product;其中,所述固化原料包括权利要求1所述的“分子玻璃”单体。Wherein, the solidified raw material comprises the "molecular glass" monomer as claimed in claim 1.
- 一种制品,其特征在于,所述制品含有如权利要求7所述的固化产物、如权利要求1所述的“分子玻璃”单体;A product, characterized in that the product contains the cured product as claimed in claim 7, the "molecular glass" monomer as claimed in claim 1;或所述制品是用如权利要求7所述的固化产物、如权利要求1所述的“分子玻璃”单体制备的。Or the article is prepared with the cured product as claimed in claim 7, the "molecular glass" monomer as claimed in claim 1.
- 如权利要求9所述的制品,其特征在于,所述制品选自下组:低介电薄膜基板材料、低介电薄膜、低介电常数基体树脂、低介电封装材料、高频低介电常数材料。The product according to claim 9, wherein the product is selected from the group consisting of low dielectric film substrate material, low dielectric film, low dielectric constant matrix resin, low dielectric packaging material, high frequency low dielectric electric constant material.
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