WO2022124719A1 - Electrochromic element and electrochromic device including same - Google Patents

Abstract

According to an embodiment of the present application, an electrochromic module may be provided, the electrochromic module comprising an electrochromic element and a protective layer, wherein: the electrochromic element includes a substrate, a first electrode layer disposed on the substrate, an electrochromic medium disposed on the first electrode layer, and a second electrode layer disposed on the electrochromic medium; a lower surface of the substrate of the electrochromic element, an upper surface of the second electrode layer of the electrochromic element, and a side surface of the electrochromic element have boundary regions, respectively; the protective layer has a property of having a low moisture transmittance compared with the substrate, the first electrode layer, the second electrode layer, and the electrochromic medium; the substrate is transparent, and thus when viewed from the lower surface of the substrate, a change in optical properties of the electrochromic medium is identified; the protective layer is disposed, so as to prevent material movement between the electrochromic element and the external environment, on the upper surface of the second electrode layer and the side surface of the electrochromic element, excluding the lower surface of the substrate in the boundary region; and the substrate has the largest thickness among the first electrode layer, the second electrode layer, and the electrochromic medium.

Description

Electrochromic element and electrochromic device including same

The embodiment relates to an electrochromic device.

The embodiment relates to an electrochromic mirror.

The embodiment relates to an electrochromic window.

The embodiment relates to an electrochromic lens.

The embodiment relates to an electrochromic device.

Electrochromism is a phenomenon in which a color is changed based on a redox reaction induced by an applied power. The electrochromic material may be defined as an electrochromic material. The electrochromic material has no color when power is not applied from the outside. When power is applied, the electrochromic material takes on a color, or, conversely, has a color when power is not applied from the outside. The color disappears when power is applied. have characteristics.

Electrochromic devices including the electrochromic material have been used for various purposes. In particular, the electrochromic device is used to block the driver's view obstruction due to the strong light of the rear vehicle of the rear view mirror used in the vehicle, or to adjust the light transmittance or reflectivity of window glass for construction or automobile glass. has been

However, the conventional electrochromic technology used for vehicle mirrors or architectural window glass is yellow due to the outflow of color-changing ions contained in the electrochromic element over time, the color-changing efficiency is significantly reduced, or an electrical connection structure is formed. Discoloration does not occur well in the location, so problems in the form of sticking continue to arise, and it is a situation that requires a long period of technology development until the stage of actual commercialization.

An object of the present application is to provide an electrochromic module including a protective layer for preventing the movement of a material of an electrochromic element with an external environment.

Another object of the present application is to provide an electrochromic module having a simple manufacturing process and including an electrical connection part designed to improve electrochromic efficiency, and a manufacturing method thereof.

The problem to be solved by the present application is not limited to the above-mentioned problems, and the problems not mentioned will be clearly understood by those of ordinary skill in the art to which the present application belongs from the present specification and the accompanying drawings. .

According to an embodiment of the present application, in an electrochromic module including an electrochromic element and a protective layer, the electrochromic element includes a substrate, a first electrode layer positioned on the substrate, and the first electrode layer positioned on the first electrode layer. an electrochromic medium and a second electrode layer positioned on the electrochromic medium, wherein the lower surface of the substrate of the electrochromic element, the upper surface of the second electrode layer, and the side surface of the electrochromic element form a boundary region and, the protective layer has a property of having a low moisture transmittance compared to the substrate, the first electrode layer, the second electrode layer and the electrochromic medium, and the substrate is transparent, so that when viewed from the lower surface of the substrate, the electric A change in the optical properties of the color-changing medium is confirmed, and the protective layer includes an upper surface of the second electrode layer and the electric An electrochromic module may be provided, which is disposed on a side surface of the color-changing element, and wherein the substrate has the thickest thickness among the first electrode layer, the second electrode layer, and the electrochromic medium.

According to an embodiment of the present application, there is provided a manufacturing method of an electrochromic device in which optical properties are controlled based on a voltage difference between an upper electrode and a lower electrode, the method comprising: forming a first electrode layer on a substrate; forming a first insulating region by removing a partial region of the first electrode layer; applying a first bus bar to the first area and a second bus bar to the second area with respect to the first area and the second area of the first electrode layer divided by the first insulating area; forming an electrochromic medium on the first electrode layer, the first bus bar, and the second bus bar; and forming a second electrode layer on the electrochromic medium, wherein the first bus bar and the second bus bar protrude above the second electrode layer, and the first bus bar and the second bus bar A method of manufacturing an electrochromic device may be provided, wherein the bus bar has a contact surface with the electrochromic medium.

According to the present application, it is possible to provide an electrochromic module with enhanced storage of color-changing ions, maintaining electrochromic efficiency for a long period of time and improving product reliability.

According to the present application, there can be provided an electrochromic module and a method for manufacturing the same, in which the manufacturing process of the electrochromic module is simple, the manufacturing efficiency is improved, and the side of the conductor has a contact surface with the electrochromic medium to improve the electrochromic efficiency.

The effects of the present application are not limited to the above-described effects, and the effects not mentioned will be clearly understood by those of ordinary skill in the art to which the present application belongs from the present specification and the accompanying drawings.

1 is a view showing an electrochromic device according to an embodiment.

2 is a diagram illustrating a control module according to an embodiment.

3 is a diagram illustrating an electrochromic device according to an embodiment.

4 to 6 are diagrams illustrating a state change during coloring of an electrochromic device according to an embodiment.

7 to 9 are diagrams illustrating a state change when the electrochromic device according to the embodiment is discolored.

10 is a view for explaining an electrochromic module according to an embodiment of the present application.

11 and 12 are enlarged views of an edge region of the electrochromic module.

13 is a view for explaining the shapes of a protective layer and an electrochromic medium when a curved surface is formed on an edge of a substrate in the electrochromic module according to an embodiment of the present application.

14 is a view for explaining an electrochromic module according to an embodiment of the present application.

15 is a view for explaining an electrochromic module according to an embodiment of the present application.

16 to 18 are flowcharts for explaining a process of manufacturing the electrochromic module according to the first embodiment.

19 is a FIB (Focused Ion Beam) image in which a protective layer is formed on a side surface of a glass substrate.

20 is a view for explaining an electrochromic module according to an embodiment of the present application.

21 is an enlarged view of an edge region of an electrochromic module.

22 is a view for explaining an electrochromic module according to a modified example of FIG. 21 .

23 is a view for explaining an electrochromic module according to an embodiment of the present application.

24 is a flowchart for explaining a modified process in manufacturing the electrochromic module according to the second embodiment.

FIG. 25 is a view for explaining an example of an edge insulating area according to FIG. 24 .

26 is a view illustrating an upper surface of the electrochromic element, an insulating region, and a conductor in order to explain the electrochromic element including the electrical connection part according to the first embodiment.

27 is a cross-sectional view taken along line B-B' in order to explain the electrochromic device including the electrical connection part according to the first embodiment.

28 is a view illustrating an upper surface, an insulating region, and a conductor of the electrochromic element in order to explain the electrochromic element including the electrical connection part according to the second embodiment.

29 is a cross-sectional view taken along line B-B' in order to explain the electrochromic device including the electrical connection part according to the second embodiment.

30 is a flowchart for explaining a process of manufacturing the electrochromic device according to the first and/or second embodiments.

31 is a view for explaining an electrochromic module including an electrical connection part according to an embodiment of the present application.

32 is an enlarged view of the second insulating region and the periphery of the second insulating region in order to explain the protective layer formed on the second insulating region.

33 is a FIB (Focused View) of an electrochromic module including an electrochromic element and a protective layer for explaining the thickness of the protective layer on the first upper surface, the second upper surface, and the connection surface at positions having different thicknesses of the electrochromic element; Ion Beam) image.

34 is an enlarged view of the Conductor Upper Region (CUR) of FIG. 31 in order to explain the layers corresponding to the constituent materials of the first electrode layer, the electrochromic medium, and the second electrode layer formed on the conductor. .

35 is a FIB (Focused Ion Beam) image of an electrochromic module including an electrochromic element and an additional layer for explaining an additional layer formed on the upper surface of the conductor.

36 is a perspective view of an electrochromic module to which a circuit board is attached according to an embodiment.

37 is an exploded view of an electrochromic device to which a circuit board is attached according to an embodiment.

38 is a cross-sectional view taken along line B-B` of the electrochromic module to which a circuit board is attached.

39 is a flowchart of a process of forming an electrical connection structure according to an embodiment.

The above-described objects, features and advantages of the present application will become more apparent from the following detailed description in conjunction with the accompanying drawings. However, since the present application may have various changes and may have various embodiments, specific embodiments will be exemplified in the drawings and described in detail below.

In the drawings, the thicknesses of layers and regions are exaggerated for clarity, and also, an element or layer may be referred to as “on” or “on” another component or layer. What is referred to includes all cases in which another layer or other component is interposed in the middle as well as directly on top of another component or layer. Throughout the specification, like reference numerals refer to like elements in principle. In addition, components having the same function within the scope of the same idea shown in the drawings of each embodiment will be described using the same reference numerals.

If it is determined that a detailed description of a known function or configuration related to the present application may unnecessarily obscure the gist of the present application, the detailed description thereof will be omitted. In addition, numbers (eg, first, second, etc.) used in the description process of the present specification are only identification symbols for distinguishing one component from other components.

In addition, the suffixes "module" and "part" for components used in the following description are given or mixed in consideration of only the ease of writing the specification, and do not have distinct meanings or roles by themselves.

According to an embodiment of the present application, in an electrochromic module including an electrochromic element and a protective layer, the electrochromic element includes a substrate, a first electrode layer positioned on the substrate, and the first electrode layer positioned on the first electrode layer. an electrochromic medium and a second electrode layer positioned on the electrochromic medium, wherein the lower surface of the substrate of the electrochromic element, the upper surface of the second electrode layer, and the side surface of the electrochromic element form a boundary region and, the protective layer has a property of having a low moisture transmittance compared to the substrate, the first electrode layer, the second electrode layer and the electrochromic medium, and the substrate is transparent, so that when viewed from the lower surface of the substrate, the electric A change in the optical properties of the color-changing medium is confirmed, and the protective layer includes an upper surface of the second electrode layer and the electric An electrochromic module may be provided, which is disposed on a side surface of the color-changing element, and wherein the substrate has the thickest thickness among the first electrode layer, the second electrode layer, and the electrochromic medium.

The electrochromic medium, including an ion storage layer, an electrolyte layer and an electrochromic layer, may be provided with an electrochromic module.

The electrochromic medium may include an electrochromic module including a first region positioned on the first electrode layer and a second region positioned on a side surface of the first electrode layer.

The electrochromic module may be provided in which the protective layer is formed to surround the electrochromic element, and the protective layer located on a side surface of the electrochromic element covers the second region of the electrochromic medium.

In the electrochromic medium, the electrolyte layer is positioned on the ion storage layer, the electrochromic layer is positioned on the electrolyte layer, and an electrochromic module may be provided.

The ion storage layer is formed to surround the first electrode layer, the ion storage layer has a contact surface with the substrate, the electrolyte layer is formed to surround the ion storage layer, the electrolyte layer has a contact surface with the substrate, An electrochromic module may be provided in which the electrochromic layer is formed to surround the electrolyte layer, and the electrochromic layer has a contact surface with the substrate.

A first protective layer positioned on the second electrode layer and a second protective layer positioned on a side surface of the electrochromic element have substantially the same thickness, and a first point in the first region and a second protective layer in the second region The points may be provided with electrochromic modules having different thicknesses.

The first point is a point where the thickness of the electrochromic medium is greatest, the second point is a point where the thickness of the electrochromic medium is the smallest, and the thickness of the electrochromic medium at the first point is the An electrochromic module may be provided, which is larger than the thickness of the electrochromic medium at the second point.

A third point having the thickest thickness among the second areas is a point closest to the second electrode layer in the second area, and a thickness at the third point is smaller than a thickness at the first point, and Region 2 may be provided with an electrochromic module having a tapered shape from the third point to the second point.

The distance between the second point and the first electrode layer may be greater than the distance between the third point and the first electrode layer, and the electrochromic module may be provided.

Further comprising a; protective film positioned on the protective layer, wherein the protective film is fixed to the first protective layer positioned on the second electrode layer, the second protective layer positioned on the side of the electrochromic element Since it is not fixed, the movement of the material through the side surface of the electrochromic element is prevented through the protective layer, and the movement of the material through the upper surface of the second electrode layer, which has a larger area than the side surface of the electrochromic element, is An electrochromic module may be provided, which is prevented through the protective layer and the protective film, and the movement of the material includes the outflow of color-changing ions of the electrochromic element in the form of a compound.

The protective layer is formed through an ALD process, so that a gap between the protective layer and the second electrode layer is smaller than a gap between the protective film and the protective layer, and an electrochromic module may be provided.

The protective layer may include a first layer and a second layer, the first layer may include TiO 2 , and the second layer may include Al ₂ O ₃ , the electrochromic module may be provided.

The protective layer may include an electrochromic module in which the first layer and the second layer are repeatedly stacked.

The protective layer may include a first layer and a second layer, wherein the first layer is formed through a sputtering process, and the second layer is formed through an ALD process.

The first layer includes a SiN layer, an Al layer and a SiN layer, and the second layer includes a TiO ₂ layer, an Al ₂ O ₃ layer, a TiO ₂ layer, an Al ₂ O ₃ layer, a TiO ₂ layer, and an Al ₂ O ₃ layer. An electrochromic module comprising a layer may be provided.

An electrochromic module may be provided in which the substrate is a glass substrate, has at least one curved area, and the protective layer is positioned on the curved area.

The substrate includes a first curved surface and a second curved surface, the first curved surface is closer to the first electrode layer than the second curved surface, and a protective layer is positioned on the first curved surface and the second curved surface, electrochromic A module may be provided.

An electrochromic module may be provided in which the electrochromic medium is located on the first curved surface and the electrochromic medium is not located on the second curved surface.

The electrochromic element may include an insulating line formed to pass through at least the second electrode layer, and an electrochromic module in which the protective layer is formed in a space corresponding to the insulating line.

The insulating line penetrates through at least a partial region of the second electrode layer and the electrochromic medium, and the electrochromic element includes a first upper surface at a position having a first thickness and a second upper surface at a position having a second thickness; An electrochromic module may be provided, comprising a connection surface connecting the first upper surface and the second upper surface, wherein the first thickness is greater than the second thickness.

A protective layer is formed on the first upper surface, the second upper surface, and the connection surface, and the thickness of the protective layer at the intersection of the second upper surface and the connection surface is greater than the thickness of the protective layer formed on the second upper surface. A large, electrochromic module may be provided.

The second electrode layer may be a reflective layer, and an electrochromic module may be provided.

According to an embodiment of the present application, there is provided a manufacturing method of an electrochromic device in which optical properties are controlled based on a voltage difference between an upper electrode and a lower electrode, the method comprising: forming a first electrode layer on a substrate; forming a first insulating region by removing a partial region of the first electrode layer; applying a first bus bar to the first area and a second bus bar to the second area with respect to the first area and the second area of the first electrode layer divided by the first insulating area; forming an electrochromic medium on the first electrode layer, the first bus bar, and the second bus bar; and forming a second electrode layer on the electrochromic medium, wherein the first bus bar and the second bus bar protrude above the second electrode layer, and the first bus bar and the second bus bar A method of manufacturing an electrochromic device may be provided, wherein the bus bar has a contact surface with the electrochromic medium.

The forming of the electrochromic medium may include forming an electrochromic layer on the first electrode layer, forming an electrolyte layer on the electrochromic layer, and forming an ion storage layer on the electrolyte layer A method of manufacturing an electrochromic device, including a, may be provided.

The forming of the electrochromic medium may include forming an ion storage layer on the first electrode layer, forming an electrolyte layer on the ion storage layer, and forming an electrochromic layer on the electrolyte layer A method of manufacturing an electrochromic device, including a, may be provided.

There may be provided a method of manufacturing an electrochromic device, wherein at least one of the materials included in the ion storage layer, the electrolyte layer, and the electrochromic layer is positioned on the upper surface of the first bus bar and the upper surface of the second bus bar. have.

Ion storage on the first electrode layer through the steps of forming an ion storage layer on the first electrode layer, forming an electrolyte layer on the ion storage layer, and forming an electrochromic layer on the electrolyte layer When the layer, the electrolyte layer and the electrochromic layer are sequentially stacked, on the upper surface of the first bus bar and the second bus bar, the first layer composed of the material included in the ion storage layer, the electrolyte layer There may be provided a method of manufacturing an electrochromic device in which a second layer made of a material included in the electrochromic layer and a third layer made of a material included in the electrochromic layer are sequentially stacked.

Forming an electrical connection structure; further comprising, wherein the forming of the electrical connection structure may include penetrating a material positioned on an upper surface of the first bus bar to form an electrical connection with the first bus bar. 1 A method of manufacturing an electrochromic device, further comprising the step of placing a conductive medium on the upper surface of the bus bar and attaching it through post-treatment, wherein the post-treatment is caused by at least one of heat and pressure can be provided.

In the forming of the electrical connection structure, a conductive medium is placed on the upper surface of the second bus bar so that an electrical connection with the second bus bar is formed through the material located on the upper surface of the second bus bar, and then A method of manufacturing an electrochromic device may be provided, further comprising the step of attaching through treatment, wherein the post-treatment is caused by at least one of application of heat and application of pressure.

The step of forming the electrical connection structure may include: forming a circuit board on the conductive medium material, wherein the conductive medium material is an anisotropic conductive film (ACF). can

There may be provided a method of manufacturing an electrochromic device, further comprising a; subsequent to forming the second electrode layer, removing a partial region of the second electrode layer to form a second insulating region.

The forming of the second insulating region may be performed by removing a partial region of the second electrode layer and a partial region of the electrochromic medium.

The forming of the second insulating region may include forming the second insulating region at a position where the first insulating region is formed.

A part of the first insulating region may correspond to a part of the second insulating region, and a method of manufacturing an electrochromic device may be provided.

The first insulating region is formed by laser etching a region of the first electrode layer in the form of a closed curve so as to be divided into a first region and the second region of the first electrode layer. can

The first insulating region is formed by laser etching in a form in which one region of the first electrode layer is completely removed so as to be divided into a first region of the first electrode layer and a second region from which the first electrode layer is removed. A method of manufacturing the device may be provided.

Forming the protective layer; further comprising, wherein the protective layer has a lower moisture transmittance than the second electrode layer, the protective layer is formed on the second electrode layer, the method of manufacturing an electrochromic device is provided can be

The forming of the passivation layer may include sequentially forming a first passivation layer and a second passivation layer through an Atomic Layer Deposition (ALD) process.

The first protective layer may be TiO ₂ , and the second protective layer may include Al ₂ O ₃ , a method of manufacturing an electrochromic device may be provided.

The forming of the passivation layer may include repeatedly forming a first passivation layer and a second passivation layer through an atomic layer deposition (ALD) process.

The forming of the passivation layer may include sequentially forming a first passivation layer and a second passivation layer through a sputtering process, a method of manufacturing an electrochromic device may be provided.

The first protective layer may be SiN, and the second protective layer may include Al.

According to an embodiment of the present application, in an electrochromic device, a substrate; a first electrode layer positioned on the substrate; a second electrode layer positioned on the first electrode layer; and an electrochromic medium positioned between the first electrode layer and the second electrode layer. a first conductor having higher conductivity than at least one of the first electrode layer and the second electrode layer; and a second conductor having higher conductivity than at least one of the first electrode layer or the second electrode layer, wherein the first electrode layer has a first region and a second region separated by an insulating region, the The first conductor is positioned in the first region, the second conductor is positioned in the second region, and a side surface of the first conductor is surrounded by the electrochromic medium and has a contact surface, and the side surface of the second conductor is the It has a contact surface surrounded by an electrochromic medium, wherein the first conductor and the second conductor protrude above the second electrode layer, and according to electrical characteristics applied to the first conductor and the second conductor, , An electrochromic device may be provided in which the electrical properties between the first electrode layer and the second electrode layer are controlled to control the optical properties of the electrochromic medium.

An electrochromic element in which at least one of the materials included in the ion storage layer, the electrolyte layer, and the electrochromic layer is positioned on the upper surface of the first conductor and the upper surface of the second conductor may be provided.

On an upper surface of the first bus bar and an upper surface of the second bus bar, a first layer made of a material included in the ion storage layer, a second layer made of a material included in the electrolyte layer, and included in the electrochromic layer An electrochromic device may be provided, in which a third layer made of a material of the first electrode layer and a fourth layer made of a material included in the second electrode layer are formed.

A first conductive film is positioned on an upper surface of the first conductor, a second conductive film is positioned on an upper surface of the second conductor, a first circuit board is positioned on the first conductive film, and the second conductivity An electrochromic element on which the second circuit board is positioned may be provided on the film.

An electrochromic device may be provided in which the insulating region is formed at a position corresponding to a height of the first electrode layer with respect to the substrate.

An electrochromic element may be provided in which the second electrode layer has a third region and a fourth region divided by an edge insulating region, wherein the edge insulating region is formed through the second electrode layer and the electrochromic medium have.

According to an embodiment of the present application, in an electrochromic device, a substrate; a first electrode layer positioned on the substrate; a second electrode layer positioned on the first electrode layer; and an electrochromic medium positioned between the first electrode layer and the second electrode layer. a first conductor having higher conductivity than at least one of the first electrode layer and the second electrode layer; and a second conductor having higher conductivity than at least one of the first electrode layer or the second electrode layer, wherein the first electrode layer has a shape in which a partial region is removed, and has a smaller area compared to the substrate, The first conductor is positioned in one region of the first electrode layer, the second conductor is positioned in one region of the substrate without the first electrode layer, and a side surface of the first conductor is surrounded by the electrochromic medium to form a contact surface and a side surface of the second conductor is surrounded by the electrochromic medium and has a contact surface, wherein the first conductor and the second conductor protrude above the second electrode layer, and the first conductor and the An electrochromic device may be provided in which an electrical characteristic between the first electrode layer and the second electrode layer is controlled according to an electrical characteristic applied to the second conductor, and the optical characteristic of the electrochromic medium is adjusted.

Hereinafter, an "electrochromic device" according to an embodiment will be described.

The electrochromic device described in the present application may refer to a device having a characteristic in which transmittance according to a wavelength band of light can be adjusted due to the application of electric force. Illustratively, the electrochromic device described in the present application may be an electrochromic mirror or an electrochromic window. The electrochromic window described in the present application may be used for vehicle glass, architectural glass, glasses lens, camera lens, and the like.

1. Overview of electrochromic devices

1 is a view showing an electrochromic device according to an embodiment.

Referring to FIG. 1 , an electrochromic apparatus 1 according to an embodiment may include a control module 1000 and an electrochromic device 2000 .

The electrochromic device 1 may receive power from an external power source 2 .

The external power source 2 may supply power to the electrochromic device 1 . The external power source 2 may supply power to the control module 1000 . The external power source 2 may supply voltage and/or current to the control module 1000 . The external power source 2 may supply a DC voltage or an AC voltage to the control module 1000 .

The control module 1000 may control the electrochromic device 2000 . The control module 1000 may generate driving power based on the power input from the external power source 2 and supply it to the electrochromic device 2000 . The control module 1000 may drive the electrochromic device 2000 . The control module 1000 may change the state of the electrochromic device 2000 through the driving power. The control module 1000 may adjust the transmittance of the electrochromic device 2000 . The control module 1000 may adjust the reflectance of the electrochromic device 2000 . The control module 1000 may change the color of the electrochromic device 2000 . The control module 1000 may discolor or color the electrochromic device 2000 . The control module 1000 may control the electrochromic device 2000 to be discolored or colored.

The state of the electrochromic element 2000 may be changed by the control module 1000 . The state of the electrochromic device 2000 may be changed by the driving voltage. The electrochromic element 2000 may be discolored by the driving voltage. The electrochromic device 2000 may be discolored or colored by the driving voltage. Transmittance of the electrochromic device 2000 may be changed by the driving voltage. The reflectance of the electrochromic device 2000 may be changed by the driving voltage.

The electrochromic element 2000 may be a mirror. The color-changing element 2000 may be a window. When the electrochromic element 2000 is a mirror, the reflectance of the electrochromic element 2000 may be changed by the driving voltage. When the electrochromic element 2000 is a window, transmittance of the electrochromic element 2000 may be changed by the driving voltage.

When the electrochromic element 2000 is a mirror, when the electrochromic element 2000 is colored, the reflectance of the electrochromic element 2000 may decrease, and when the electrochromic element 2000 is discolored, the electrochromic element (2000) can increase the reflectivity.

When the electrochromic element 2000 is a window, when the electrochromic element 2000 is colored, the transmittance of the electrochromic element 2000 decreases, and when the electrochromic element 2000 is discolored, the electrochromic element 2000 ) may increase the transmittance.

2 is a diagram illustrating a control module according to an embodiment.

Referring to FIG. 2 , the control module 1000 according to the embodiment may include a control unit 1100 , a power conversion unit 1200 , an output unit 1300 , and a storage unit 1400 .

The control unit 1100 may control the power conversion unit 1200 , the output unit 1300 , and the storage unit 1400 .

The control unit 1100 may generate a control signal for changing the state of the electrochromic device 2000 and output it to the output unit 1300 to control the voltage output by the output unit 130 .

The control unit 1100 may operate by the voltage output from the external power source 2 or the power conversion unit 1200 .

When the control unit 1100 operates by the voltage output from the external power source 2 , the control unit 1100 may include a configuration capable of converting power. For example, when receiving an AC voltage from the external power source 2 , the controller 1100 may convert the AC voltage into a DC voltage and use it for operation. In addition, when receiving a DC voltage from the external power source 2 , the control unit 1100 may lower the DC voltage from the external power source 2 and use it for operation.

The power conversion unit 1200 may receive power from the external power source (2). The power conversion unit 1200 may receive current and/or voltage. The power conversion unit 1200 may receive a DC voltage or an AC voltage.

The power conversion unit 1200 may generate internal power based on the power supplied from the external power source 2 . The power conversion unit 1200 may convert the power supplied from the external power 2 to generate internal power. The power conversion unit 1200 may supply the internal power to each component of the control module 1000 . The power conversion unit 1200 may supply the internal power to the control unit 1100 , the output unit 1300 , and the storage unit 1400 . The internal power may be an operating power for operating each component of the control module 1000 . The control unit 1100 , the output unit 1300 , and the storage unit 1400 may operate by the internal power supply. When the power conversion unit 1200 supplies internal power to the control unit 1100 , the control unit 1100 may not receive power from the external power source 2 . In this case, the configuration for converting power to the control unit 1100 may be omitted.

The power conversion unit 1200 may change the level of power supplied from the external power source 2 . The power conversion unit 1200 may change the power supplied from the external power source 2 into DC power. The power conversion unit 1200 may change the power supplied from the external power source 2 into AC power.

For example, the power conversion unit 1200 may change the level after changing the power supplied from the external power source 2 to DC power. When the power conversion unit 1200 receives the AC voltage from the external power source 2 , the power conversion unit 1200 may change the DC voltage and then change the level of the changed DC voltage. In this case, the power conversion unit 1200 may include a regulator. The power conversion unit 1200 may include a linear regulator that directly adjusts the supplied power, generates a pulse based on the supplied power, and outputs an adjusted voltage by adjusting the amount of the pulse It may include a switching regulator (switching regulator).

As another example, when the power conversion unit 1200 receives a DC voltage from the external power source 2 , the power conversion unit 1200 may change the level of the supplied DC voltage.

The internal power output from the power conversion unit 1200 may include a plurality of voltage levels. The power conversion unit 1200 may generate internal power having a plurality of voltage levels required for each component of the control module 1000 to operate.

The output unit 1300 may generate a driving voltage. The output unit 1300 may generate a driving voltage based on the internal power. The output unit 1300 may generate a driving voltage under the control of the control unit 1100 . The output unit 1300 may apply the driving voltage to the electrochromic device 2000 . The output unit 1300 may output driving voltages having different levels under the control of the control unit 1100 . That is, the output unit 1300 may change the level of the driving voltage under the control of the control unit 1100 . The electrochromic element 2000 may be discolored by the driving voltage output from the output unit 1300 . The electrochromic device 200 may be colored or discolored by the driving voltage output from the output unit 1300 .

Coloring and discoloration of the electrochromic device 2000 may be determined by the range of the driving voltage. For example, when the driving voltage is above a specific level, the electrochromic device 2000 may be colored, and when the driving voltage is below a specific level, the electrochromic device 2000 may be discolored. Alternatively, when the driving voltage is equal to or higher than a specific level, the electrochromic device 2000 may be discolored, and when the driving voltage is lower than a specific level, the electrochromic device 2000 may be colored. When the specific level is 0, the electrochromic device 2000 may be changed to a colored or discolored state by the polarity of the driving voltage.

The degree of discoloration of the electrochromic device 2000 may be determined by the magnitude of the driving voltage. The degree of discoloration of the electrochromic device 2000 may correspond to the magnitude of the driving voltage. The degree of coloring or discoloration of the electrochromic device 2000 may be determined by the magnitude of the driving voltage. For example, when a driving voltage of a first level is applied to the electrochromic element 2000 , the electrochromic element 2000 may be colored to a first degree. When a driving voltage of a second level greater than the first level is applied to the electrochromic element 2000 , the electrochromic element 2000 may be colored to a second degree greater than the first level. That is, when a large level of voltage is supplied to the electrochromic element 2000 , the degree of coloring of the electrochromic element 2000 may be greater. When a larger voltage is applied to the electrochromic element 2000 when the electrochromic element 2000 is a mirror, the reflectance of the electrochromic element 2000 may decrease. When a larger voltage is supplied to the electrochromic element 2000 when the electrochromic element 2000 is a window, the transmittance of the electrochromic element 2000 may decrease.

The storage unit 1400 may store data related to the driving voltage. The storage unit 1400 may store a driving voltage corresponding to the degree of discoloration. The storage unit 1400 may store the driving voltage corresponding to the degree of discoloration in the form of a lookup table.

The control unit 1100 may receive a degree of discoloration from the outside, load a driving voltage corresponding thereto from the storage unit 1400 , and generate a driving voltage corresponding thereto by controlling the output unit 1300 . The control unit 1100 determines the degree of discoloration based on the external environment, loads a driving voltage corresponding thereto from the storage unit 1400, and controls the output unit 1300 to generate a driving voltage corresponding thereto. can

3 is a diagram illustrating an electrochromic device according to an embodiment.

Referring to FIG. 3 , the electrochromic device 2000 according to the embodiment includes a first electrode layer 2200 , an ion storage layer 2310 , an electrolyte layer 2320 , an electrochromic layer 2330 , and a second electrode layer 2400 ). may include

The first electrode layer 2200 and the second electrode layer 2400 may be positioned to face each other. An electrochromic layer 2330 may be positioned between the first electrode layer 2200 and the second electrode layer 2400 .

For example, the electrochromic layer 2330 may be a liquid-type electrochromic material layer. In other words, the electrochromic layer 2330 may have a form in which the liquid-type electrochromic material is encapsulated and located. As another example, the electrochromic layer 2330 may be a gel-type electrochromic material layer. In other words, the electrochromic layer 2330 may be formed by curing the gel-type electrochromic material. As another example, the electrochromic layer 2330 may be a solid-type electrochromic material layer. The electrochromic layer 2330 may be in the form of a single layer, or may be in the form of a multi-layer.

The electrochromic device 2000 may include a first electrode layer 2200 , a second electrode layer 2400 , an ion storage layer 2310 , an electrolyte layer 2320 , and an electrochromic layer 2330 .

According to an embodiment of the present application, the ion storage layer 2310 may be positioned between the electrochromic layer 2330 and the first electrode layer 2200 . The electrolyte layer 2320 may be positioned between the electrochromic layer 2330 and the ion storage layer 2310 .

According to another embodiment of the present application, the ion storage layer 2310 may be positioned between the electrochromic layer 2330 and the second electrode layer 2400 . The electrolyte layer 2320 may be positioned between the electrochromic layer 2330 and the ion storage layer 2310 .

The first electrode layer 2200 and the second electrode layer 2400 may transmit incident light. One of the first electrode layer 2200 and the second electrode layer 2400 may reflect the incident light, and the other may transmit the incident light.

When the electrochromic device 200 is a window, the first electrode layer 2200 and the second electrode layer 2400 may transmit incident light. When the electrochromic device 200 is a mirror, any one of the first electrode layer 2200 and the second electrode layer 2400 may reflect incident light.

When the electrochromic device 200 is a window, the first electrode layer 2200 and the second electrode layer 2400 may be formed of transparent electrodes. The first electrode layer 2200 and the second electrode layer 2400 may be formed of a transparent conductive material. The first electrode layer 2200 and the second electrode layer 2400 are doped with at least one of indium, tin, zinc, and/or oxide. Metal. may include For example, the first electrode layer 2200 and the second electrode layer 2400 may be formed of indium tin oxide (ITO), zinc oxide (ZnO), or indium zinc oxide (IZO).

When the electrochromic device 200 is a mirror, one of the first electrode layer 2200 and the second electrode layer 2400 may be a transparent electrode, and the other may be a reflective electrode. For example, the first electrode layer 2200 may be a reflective electrode, and the second electrode layer 2400 may be a transparent electrode. In this case, the first electrode layer 2200 may be formed of a metal material having a high reflectance. The first electrode layer 2200 may include at least one of aluminum (Al), copper (Cu), molybdenum (Mo), chromium (Cr), titanium (Ti), gold (Au), silver (Ag), and tungsten (W). may include The second electrode layer 2400 may be formed of a transparent conductive material.

The optical properties of the electrochromic layer 2330 may be changed by ions flowing into the electrochromic layer 2330 or flowing out from the electrochromic layer 2330 . The electrochromic layer 2330 may be discolored by ions flowing into the electrochromic layer 2330 or flowing out from the electrochromic layer 2330 .

Ions may be introduced into the electrochromic layer 2330 . When ions are introduced into the electrochromic layer 2330 , the optical properties of the electrochromic layer 2330 may be changed. When ions are introduced into the electrochromic layer 2330 , the electrochromic layer 2330 may be discolored. When ions are introduced into the electrochromic layer 2330 , the electrochromic layer 2330 may be colored or discolored. When ions are introduced into the electrochromic layer 2330 , the light transmittance and/or light absorption of the electrochromic layer 2330 may be changed. As ions are introduced into the electrochromic layer 2330, the electrochromic layer 2330 may be reduced. As ions are introduced into the electrochromic layer 2330 , the electrochromic layer 2330 may be reduced in color. As ions are introduced into the electrochromic layer 2330, the electrochromic layer 2330 may be reduced in color. Alternatively, when ions are introduced into the electrochromic layer 2330, the electrochromic layer 2330 may be reduced and decolorized.

Ions introduced into the electrochromic layer 2330 may be released. When ions of the electrochromic layer 2330 are released, optical properties of the electrochromic layer 2330 may be changed. When ions of the electrochromic layer 2330 are released, the electrochromic layer 2330 may be discolored. When ions of the electrochromic layer 2330 are released, the electrochromic layer 2330 may be colored or discolored. When the ions of the electrochromic layer 2330 are released, the light transmittance and/or the light absorption rate of the electrochromic layer 2330 may be changed. As ions of the electrochromic layer 2330 are released, the electrochromic layer 2330 may be oxidized. As ions of the electrochromic layer 2330 are released, the electrochromic layer 2330 may be oxidatively discolored. As ions of the electrochromic layer 2330 are released, the electrochromic layer 2330 may be oxidized. Alternatively, when ions of the electrochromic layer 2330 are released, the electrochromic layer 2330 may be oxidized and discolored.

The electrochromic layer 2330 may be formed of a material that is discolored by ion migration. The electrochromic layer 2330 is TiO, V ₂ O ₅ , Nb ₂ O ₅ , Cr ₂ O ₃ , MnO ₂ , FeO ₂ , CoO ₂ , NiO ₂ , RhO ₂ , Ta ₂ O ₅ , IrO ₂ and WO _{3 .} It may include at least one of oxides such as The electrochromic layer 2330 may have a physical internal structure.

The ion storage layer 2310 may store ions. The optical properties of the ion storage layer 2310 may be changed by ions flowing into the ion storage layer 2310 or flowing out from the ion storage layer 2310 . The ion storage layer 2310 may be discolored by ions flowing into the ion storage layer 2310 or flowing out from the ion storage layer 2310 .

Ions may be introduced into the ion storage layer 2310 . When ions are introduced into the ion storage layer 2310 , the optical properties of the ion storage layer 2310 may be changed. When ions are introduced into the ion storage layer 2310 , the ion storage layer 2310 may be discolored. When ions are introduced into the ion storage layer 2310 , the ion storage layer 2310 may be colored or discolored. When ions are introduced into the ion storage layer 2310 , the light transmittance and/or light absorption rate of the ion storage layer 2310 may be changed. As ions are introduced into the ion storage layer 2310 , the ion storage layer 2310 may be reduced. As ions are introduced into the ion storage layer 2310, the ion storage layer 2310 may be reduced in color. As ions are introduced into the ion storage layer 2310 , the ion storage layer 2310 may be reduced in color. Alternatively, when ions are introduced into the ion storage layer 2310, the ion storage layer 2310 may be reduced and decolorized.

The ions introduced into the ion storage layer 2310 may be released. When the ions of the ion storage layer 2310 are released, the optical properties of the ion storage layer 2310 may be changed. When ions of the ion storage layer 2310 are released, the ion storage layer 2310 may be discolored. When ions of the ion storage layer 2310 are released, the ion storage layer 2310 may be colored or discolored. When the ions of the ion storage layer 2310 are released, the light transmittance and/or the light absorption rate of the ion storage layer 2310 may be changed. As ions of the ion storage layer 2310 are released, the ion storage layer 2310 may be oxidized. As ions of the ion storage layer 2310 are released, the ion storage layer 2310 may be oxidatively discolored. As ions of the ion storage layer 2310 are released, the ion storage layer 2310 may be oxidized. Alternatively, when ions of the ion storage layer 2310 are released, the ion storage layer 2310 may be oxidized and discolored.

The ion storage layer 2310 may be formed of a material that is discolored by ion migration. The ion storage layer 2310, the electrochromic layer 2330 may include at least one of oxides such as IrO ₂ , NiO ₂ , MnO ₂ , CoO ₂ , iridium-magnesium oxide, nickel-magnesium oxide, and titanium-vanadium oxide. can The ion storage layer 2310 may have a physical internal structure. The physical internal structure of the ion storage layer 2310 may be different from the physical internal structure of the electrochromic layer 2330 .

The electrolyte layer 2320 may be a passage of ions between the electrochromic layer 2330 and the ion storage layer 2310 . The electrochromic layer 2330 and the ion storage layer 2310 may exchange ions through the electrolyte layer 2320 . The electrolyte layer 2320 may serve as a movement path for ions, whereas it may act as a barrier for electrons. That is, ions can move through the electrolyte layer 2320 but electrons cannot. In other words, the electrochromic layer 2330 and the ion storage layer 2310 can exchange ions through the electrolyte layer 2320, but cannot exchange electrons.

The electrolyte layer 2320 may include an insulating material. The electrolyte layer 2320 may be a solid. The electrolyte layer 2320 is SiO ₂ , Al ₂ O ₃ , Nb ₂ O ₃ , Ta ₂ O ₅ , LiTaO ₃ , LiNbO ₃ , La ₂ TiO ₇ , La ₂ TiO ₇ , SrZrO ₃ , ZrO ₂ , Y ₂ O ₃ , Nb ₂ O ₅ , La ₂ Ti ₂ O ₇ , LaTiO ₃ , and HfO ₂ may be included.

When the ions of the electrochromic layer 2330 are released, the released ions may flow into the ion storage layer 2310 , and when the ions of the ion storage layer 2310 are released, the separated ions are the electrochromic layer 2330 may be introduced. The ions may move through the electrolyte layer 2320 .

Chemical reactions occurring in the electrochromic layer 2330 and the ion storage layer 2310 may be different from each other. The electrochromic layer 2330 and the ion storage layer 2310 may have opposite chemical reactions. When the electrochromic layer 2330 is oxidized, the ion storage layer 2310 may be reduced. When the electrochromic layer 2330 is reduced, the ion storage layer 2310 may be oxidized.

Accordingly, the ion storage layer 2310 may serve as a counter electrode of the electrochromic layer 2330 .

The states of the electrochromic layer 2330 and the ion storage layer 2310 may be changed by movement of ions.

Corresponding optical state changes may be induced in the electrochromic layer 2330 and the ion storage layer 2310 . For example, when the electrochromic layer 2330 is colored, the ion storage layer 2310 may also be colored, and when the electrochromic layer 2330 is discolored, the ion storage layer 2310 may also be discolored. have. When the electrochromic layer 2330 is oxidatively colored, the ion storage layer 2310 may be reduced in color, and when the electrochromic layer 2330 is reduced in color, the ion storage layer 2310 may be oxidatively colored. have.

Different optical state changes may be induced in the electrochromic layer 2330 and the ion storage layer 2310 . For example, when the electrochromic layer 2330 is colored, the ion storage layer 2310 may be discolored, and when the electrochromic layer 2330 is discolored, the ion storage layer 2310 may be colored. have. When the electrochromic layer 2330 is oxidatively colored, the ion storage layer 2310 may be reduced and colored, and when the electrochromic layer 2330 is oxidized and colored, the ion storage layer 2310 may be reduced and colored. have. The electrochromic layer 2330 and the ion storage layer 2310 may have different transmittances. Since the electrochromic layer 2330 and the ion storage layer 2310 have different transmittances, the electrochromic device 2000 is also changed by different optical states of the electrochromic layer 2330 and the ion storage layer 2310 . ) can be adjusted.

For example, since the transmittance of the electrochromic device 2000 may be determined by the transmittance of a colored layer, the transmittance when the electrochromic layer 2330 is colored is the transmittance when the ion storage layer 2310 is colored. When smaller than that, when the electrochromic layer 2330 is colored, the transmittance of the electrochromic device 2000 may be smaller than the transmittance of the electrochromic device 2000 when the ion storage layer 2310 is colored. Accordingly, the transmittance of the electrochromic device 2000 may be controlled by changing the colored layer.

Hereinafter, a state change of the electrochromic device 1 will be described in detail with reference to FIGS. 4 to 9 .

In describing the state change of the electrochromic device 1, the electrochromic device 1 includes a first electrode layer 2200, an electrochromic layer 2330, an electrolyte layer 2320, an ion storage layer 2310, and a second electrode layer 2200. Although it is assumed that the two electrode layers 2400 are stacked in order, this is only one embodiment selected for ease of explanation. When the positions of the electrochromic layer 2330 and the ion storage layer 2310 are changed However, it is not intended to exclude the case of further including an additional layer from the scope of the present application.

4 to 6 are diagrams illustrating a state change during coloring of an electrochromic device according to an embodiment.

4 is a view showing an electrochromic device in an initial state (ie, in a discolored state).

Referring to FIG. 4 , the electrochromic device 2000 in the initial state of the embodiment is electrically connected to the control module 1000 .

The control module 1000 is electrically connected to the first electrode layer 2200 and the second electrode layer 2400 to control a specific voltage to be applied between the first electrode layer 2200 and the second electrode layer 2400. have.

A plurality of ions 6000 may be positioned in the ion storage layer 2310 . The plurality of ions 6000 may be implanted during the formation of the ion storage layer 2310 . The ion 6000 may be at least one of H+ and Li+.

Although the drawing shows that a plurality of ions 6000 are positioned in the ion storage layer 2310 , in an initial state, the ions may be positioned in at least one of the electrochromic layer 2330 and the electrolyte layer 2320 . That is, ions may be implanted in the process of forming the electrochromic layer 2330 and the electrolyte layer 2320 of the electrochromic device 200 .

A plurality of ions 6000 are located in the ion storage layer 2310, so that the ion storage layer 2310 may be in a reduced and decolorized state. The ion storage layer 2310 may be in a state capable of transmitting light.

Referring to FIG. 5 , the control module 1000 may apply a voltage to the electrochromic device 2000 .

The control module 1000 may control a specific voltage to be applied between the first electrode layer 2200 and the second electrode layer 2400 . The control module 1000 controls the first electrode layer 2200 to have a relatively low potential and the second electrode layer 2400 to have a relatively high potential, so that the first electrode layer 2200 and the second A potential difference may be controlled to occur between the electrode layers 2400 .

When a voltage is applied between the first electrode layer 2200 and the second electrode layer 2400 , electrons may flow into the first electrode layer 2200 . The electrons may move from the control module 1000 toward the first electrode layer 2200 . Since the control module 1000 and the first electrode layer 2200 are connected in a contact area on one side of the first electrode layer 2200, electrons moved to the contact area through the control module 1000 are transferred to the first electrode layer. It may move to the other side of the first electrode layer 2200 along a line 2200 . Electrons are disposed in the entire area of the first electrode layer 2200 by electron movement from one side of the first electrode layer 2200 to the other side.

Since the electrons have different polarities from the plurality of ions 6000 of the ion storage layer 2310, the electrons and the ions 6000 move in a direction closer to each other due to the attractive force between the electrons and the plurality of ions. can The electrons and the ions 6000 may move to the electrochromic layer 2330 by the attraction between the electrons and the ions. The electrons may move in the direction of the first electrode layer 2200 by attraction with the ions and may be introduced into the electrochromic layer 2330 . The ions 6000 may move in the direction of the first electrode layer 2200 by attraction with the electrons and may be introduced into the electrochromic layer 2330 . At this time, the electrolyte layer 2320 is used as a passage for the ions 6000 and prevents the movement of the electrons, so that the electrons and the ions 6000 can stay in the electrochromic layer 2330 . .

As the ions 6000 are introduced into the electrochromic layer 2330, the electrochromic layer 2330 in which ions are obtained may be reduced in color, and the ion storage layer 2310 in which ions are lost may be oxidized. That is, the electrochromic element 2000 may be discolored by the movement of the ions 6000 . More specifically, the electrochromic device 2000 may be colored by the movement of the ions 6000 . In the present specification, the ions 6000 capable of inducing coloring and/or discoloration of the electrochromic element 2000 may be referred to as color-changing ions.

The movement of the electrons in the horizontal direction in the first electrode layer 2200 and the movement in the vertical direction in the direction of the second electrode layer 2400 may occur simultaneously. That is, the electrons may move in the direction of the second electrode layer 2400 while moving in the horizontal direction of the first electrode layer 2200 to be introduced into the electrochromic layer 2330 . The ions 6000 positioned in the ion storage layer 2310 may also first move in the region where the electrons are introduced due to the combined movement of the electrons in the horizontal and vertical directions.

That is, ions in a region adjacent to a contact region electrically connected to the first electrode layer 2200 and the control module 1000 move to the electrochromic layer 2330 first, and the first electrode layer 2200 and the control Ions in a region spaced apart from the contact region to which the module 1000 is electrically connected may move later. Accordingly, the electrochromic device 2000 may be discolored first in an area adjacent to the contact area, and may be discolored later in an area separated from the contact area. For example, if the contact region is located in the outer region of the electrochromic device 2000, the electrochromic device 2000 may be discolored in order from the outer region to the central region. That is, the electrochromic device 2000 may be sequentially colored from the outer region to the central region.

The degree of discoloration of the electrochromic element 2000 may be proportional to the number of electrons introduced by the control module 1000 . The degree of discoloration of the electrochromic element 2000 may be proportional to the degree of discoloration of the electrochromic layer 2330 and the ion storage layer 2310 . The number of electrons introduced by the control module 1000 may be determined by the magnitude of the voltage applied between the first electrode layer 2200 and the second electrode 220 by the control module 1000 . The number of electrons introduced by the control module 1000 may be determined by a potential difference between the first electrode layer 2200 and the second electrode 220 . That is, the control module 1000 may control the degree of discoloration of the electrochromic element 2000 by adjusting the voltage level applied to the electrochromic element 2000 .

FIG. 6 is a diagram illustrating positions of ions when the color change of the electrochromic device 2000 is completed.

Referring to FIG. 6 , when electrons introduced by the control module 1000 and ions 6000 moved by electrons are introduced into the electrochromic layer 2330 and are in an electrical equilibrium state, the electrochromic device 2000 ) is maintained.

That is, the discoloration state of the electrochromic element 2000 is maintained, which may be referred to as a memory effect.

Even when no voltage is applied to the electrochromic device 2000 by the control module 1000 , ions present in the electrochromic layer 2330 remain in the electrochromic layer 2330 , and thus the electrochromic The discoloration state of the device 2000 may be maintained.

7 to 9 are diagrams illustrating a state change when the electrochromic device according to the embodiment is discolored.

7 is a view showing an electrochromic device in an initial state (ie, colored state).

Referring to FIG. 7 , the electrochromic device 2000 in the initial state of the embodiment is electrically connected to the control module 1000 .

Since the electrochromic element 2000 is in a colored state, a plurality of ions 6000 may be positioned in the electrochromic layer 2330 .

A plurality of ions 6000 are located in the electrochromic device 200 , so that the electrochromic layer 2330 may be in an oxidation-colored state, and the ion storage layer 2310 may be in a reduced-colored state.

Referring to FIG. 8 , the control module 1000 applies a voltage to the electrochromic device 2000 .

The control module 1000 may control a specific voltage to be applied between the first electrode layer 2200 and the second electrode layer 2400 . The control module 1000 controls the first electrode layer 2200 to have a relatively high potential and the second electrode layer 2400 to have a relatively low potential, so that the first electrode layer 2200 and the second A potential difference may be controlled to occur between the electrode layers 2400 .

The potential difference in the bleaching process may be opposite to the potential difference in the coloring process of FIG. 4 . That is, in the coloring process, the first electrode layer 2200 may have a lower potential than the second electrode layer 2400, and in the discoloring process, the first electrode layer 2200 may have a higher potential than the second electrode layer 2400. .

When a voltage is applied between the first electrode layer 2200 and the second electrode layer 2400 , electrons may be introduced into the second electrode layer 2400 . The electrons may move from the control module 1000 toward the second electrode layer 2400 . Since the control module 1000 and the second electrode layer 2400 are connected in a contact area on one side of the second electrode layer 2400 , electrons moved to the contact area through the control module 100 are transferred to the second electrode layer 2400 . It may move to the other side of the second electrode layer 2400 along the electrode layer 2400 . Electrons are disposed in the entire area of the second electrode layer 2400 due to electron movement from one side of the second electrode layer 2400 to the other side.

Since the electrons have different polarities from the plurality of ions 6000 of the electrochromic layer 2330, the electrons and the ions 6000 move in a direction closer to each other due to the attractive force between the electrons and the plurality of ions. can The ions 6000 may move to the ion storage layer 2310 by the attractive force between the electrons and the ions 6000 . The electrons may move toward the second electrode layer 2400 by attraction with the ions 6000 and may be introduced into the ion storage layer 2310 . The ions 6000 may move toward the second electrode layer 2400 by attraction with the electrons and may flow into the ion storage layer 2310 . At this time, the electrolyte layer 2320 is used as a movement path of the ions 6000 and prevents the movement of the electrons, so that the electrons and the ions 6000 can stay in the ion storage layer 2310 . .

As the ions 6000 are introduced into the ion storage layer 2310, the ion storage layer 2310, which has obtained ions, may be oxidized and decolorized, and the electrochromic layer 2330, which has lost ions, may be reduced and decolorized. That is, the electrochromic element 2000 may be discolored by the movement of the ions 6000 . More specifically, the electrochromic element 2000 may be discolored by the movement of the ions 6000 .

The movement of the electrons in the horizontal direction in the second electrode layer 2400 and the movement in the vertical direction in the direction of the first electrode layer 2200 may occur simultaneously. That is, the electrons may move in the direction of the first electrode layer 2200 while moving in the horizontal direction of the second electrode layer 2400 to be introduced into the ion storage layer 2310 . Due to the complex movement of the electrons in the horizontal and vertical directions, the ions 6000 located in the electrochromic layer 2330 may also first move in the region where the electrons are introduced.

That is, ions in a region adjacent to a contact region electrically connected to the second electrode layer 2400 and the control module 1000 move to the ion storage layer 2310 first, and the second electrode layer 2400 and the control Ions in a region spaced apart from the contact region to which the module 1000 is electrically connected may move later. Accordingly, the electrochromic device 2000 may be discolored first in an area adjacent to the contact area, and may be discolored later in an area separated from the contact area. For example, if the contact region is located in the outer region of the electrochromic device 2000, the electrochromic device 2000 may be discolored in order from the outer region to the central region. That is, the color may be sequentially discolored from the outer region of the electrochromic device 2000 to the central region.

9 is a view showing the positions of ions when the color change of the electrochromic device 2000 is completed.

Referring to FIG. 9 , when electrons introduced by the control module 100 and ions 6000 moved by electrons are introduced into the ion storage layer 2310 and are in an electrical equilibrium state, the electrochromic device 2000 ) is maintained.

That is, the electrochromic device 2000 may maintain a discolored state. Even if no voltage is applied to the electrochromic device 2000 by the control module 1000 , the ions present in the ion storage layer 2310 remain in the ion storage layer 2310 , and thus the electrochromic device 2000 . The discoloration state of the device 2000 may be maintained.

Hereinafter, the electrochromic device 2000 according to an embodiment of the present application will be described in detail.

2. Electrochromic module

As described above, the electrochromic element 2000 has a characteristic in which a change in optical properties is induced by movement of color-changing ions included in the electrochromic element 2000 . For example, in the electrochromic element 2000 , transmittance may be adjusted, reflectance may be adjusted, and color coordinate values may be adjusted according to movement of color-changing ions.

Accordingly, the color-changing ions included in the electrochromic element 2000 may play an important role in expressing the unique characteristics of the electrochromic element 2000 . Accordingly, the electrochromic device 2000 needs to be manufactured in the form of an electrochromic module 3000 including a protective layer 2500 formed to reduce the outflow of color-changing ions.

The electrochromic module 3000 includes a substrate 2100 , a first electrode layer 2200 , an ion storage layer 2310 , an electrolyte layer 2320 , an electrochromic layer 2330 , a second electrode layer 2400 , and a protective layer 2500 . ) may be included. The first electrode layer 2200 , the ion storage layer 2310 , the electrolyte layer 2320 , the electrochromic layer 2330 , and the second electrode layer 2400 have already been described in detail with reference to FIG. 3 , so the redundant description is omitted. decide to do

The substrate 2100 may be an object having a property through which light may be transmitted. The substrate 2100 may be a transparent substrate used for a sunroof, vehicle glass, architectural glass, or a head-up display (HUD). The substrate 2100 may be a transparent substrate used for glasses, sunglasses, or goggles. The substrate 2100 may be a transparent substrate used for a vehicle rearview mirror, a vehicle side mirror, or a smart mirror.

The material of the substrate 2100 may be various. For example, the substrate 2100 may be a transparent substrate formed of glass. As another example, the substrate 2100 may be a transparent substrate formed of plastic.

The shape of the substrate 2100 may vary. For example, the substrate 2100 may be a substrate having flat both sides, a substrate having one convex side, a substrate having one concave side, a substrate having one convex side and one concave side, and both convex sides. It may be a substrate having a , or may be a substrate having concave both surfaces, but is not limited thereto.

The shape of the substrate 2100 may vary. For example, the substrate 2100 may have a square shape or an elliptical shape, but is not limited thereto and may have an atypical shape.

The substrate 2100 may serve as a reference layer on which at least one of the first electrode layer 2200, the ion storage layer 2310, the electrolyte layer 2320, the electrochromic layer 2330, and the second electrode layer 2400 is formed. . For example, the first electrode layer 2200 may be positioned on the substrate 2100 in a form in which the first electrode layer 2200 is deposited on the substrate 2100 .

The protective layer 2500 may be an additional layer formed to prevent material movement between the electrochromic device 2000 and the external environment. The protective layer 2500 may be an additional layer formed to prevent leakage of color-changing ions included in the electrochromic device 2000 . In the present specification, "leaking out color-changing ions" refers to a concept including the release of the color-changing ions from the electrochromic device 2000 in the form of a compound by meeting other ions in addition to the outflow of the color-changing ions. In other words, in the present specification, "leaking out color-changing ions" does not mean that the color-changing ions directly escape from the electrochromic device 2000, but in the electrochromic device 2000 in a different form. This is a concept including indirectly reducing the number of color-changing ions stored in the electrochromic device 2000 after being released.

The protective layer 2500 may be an additional layer formed to inhibit the outflow of color-changing ions included in the electrochromic device 2000 . The protective layer 2500 may be an additional layer formed to block the outflow of color-changing ions included in the electrochromic device 2000 . The protective layer 2500 may be an additional layer formed to block the outflow of color-changing ions included in the electrochromic device 2000 .

The protective layer 2500 may have a relatively low moisture permeability. The protective layer 2500 may have a property of having a lower moisture transmittance than the substrate 2100 , the first electrode layer 2200 , the second electrode layer 2400 , and the electrochromic medium 2300 . The electrochromic medium 2300 may be a liquid-type electrochromic layer 2330 , or a gel-type electrochromic layer 2330 , including an ion storage layer 2310 and an electrochromic layer 2330 . It may be a -layer electrochromic medium 2300 or a 3-layer electrochromic medium 2300 including an ion storage layer 2310 , an electrolyte layer 2320 and an electrochromic layer 2330 .

The protective layer 2500 may be formed as a single layer. Alternatively, the protective layer 2500 may be formed of a multi-layer. Alternatively, the protective layer 2500 may be formed in a form in which two or more layers are repeatedly stacked. Alternatively, the protective layer 2500 may be formed to include at least one layer formed through a first process and at least one layer formed through a second process different from the first process.

The protective layer 2500 may include a metal layer. For example, the protective layer 2500 may include an Al layer. As another example, the protective layer 2500 may include a Cr layer. Since the color-changing ions do not pass through the metal layer well, lamination of the metal layer may generate an effect of blocking the outflow of the color-changing ions.

The protective layer 2500 may include silicon nitride and/or silicon oxide. For example, the passivation layer 2500 may include a SiN _x layer. As another example, the protective layer 2500 may include a SiO ₂ layer.

The protective layer 2500 may include a metal oxide. For example, the protective layer 2500 may include an Al ₂ O ₃ layer. As another example, the protective layer 2500 may include a TiO ₂ layer.

The protective layer 2500 may include a coating layer. For example, the protective layer 2500 may include an acrylate-based or urethane-based hard coating layer.

According to an embodiment of the present application, the passivation layer 2500 may include a first passivation layer, a second passivation layer, a third passivation layer, a fourth passivation layer, and an Nth passivation layer (N is a natural number).

As a specific example, the first protective layer may include SiO ₂ . The second protective layer may include Al ₂ O ₃ .

As another specific example, the first protective layer may include SiO ₂ . The second protective layer may include Al ₂ O ₃ . The third protective layer may include SiO ₂ again. The fourth protective layer may again include Al ₂ O ₃ . The fifth protective layer may include SiO ₂ again. The sixth protective layer may again include Al ₂ O ₃ . As such, the protective layer 2500 may be formed in a form in which at least two or more layers are repeatedly stacked. In this case, the number of repetitions may be selected in consideration of the thickness of the electrochromic element 2000 , an increase in sealing efficiency according to the number of stacked times, appropriateness of manufacturing cost, and the like.

As another specific example, the first protective layer may include SiN _x . The second passivation layer may include Al. The third passivation layer may include SiN _x again. When the protective layer 2500 includes a metal layer, the color-changing ions may be maintained inside the electrochromic device 2000 due to the property of inhibiting the outflow of the color-changing ions of the metal layer. However, the metal layer itself is difficult to form densely and has a characteristic. When the protective layer 2500 is formed, the metal layer and silicon nitride are placed in parallel to seal (retain) the color-changing ions inside the electrochromic device 2000. ) can improve efficiency. The fourth passivation layer may include TiO ₂ . The fifth protective layer may include Al ₂ O ₃ . The seventh passivation layer may again include TiO ₂ . The eighth protective layer may again include Al ₂ O ₃ . The ninth passivation layer may include TiO ₂ again. The tenth protective layer may again include Al ₂ O ₃ .

The protective layer 2500 may be formed through various processes. For example, the protective layer 2500 may be a layer formed through an ALD method. As another example, the passivation layer 2500 may include at least one passivation layer 2500 formed through an ALD method and at least one passivation layer 2500 formed through a sputtering process. As another example, the protective layer 2500 may include at least one protective layer 2500 formed by spin coating, dip coating, or line coating.

The electrochromic module 3000 according to an embodiment of the present application includes a substrate 2100 , a first electrode layer 2200 , an ion storage layer 2310 , an electrolyte layer 2320 , an electrochromic layer 2330 , and a second The electrode layer 2400 and the protective layer 2500 may be deposited in this order. The electrochromic module 3000 according to another embodiment of the present application includes a substrate 2100 , a first electrode layer 2200 , an electrochromic layer 2330 , an electrolyte layer 2320 , an ion storage layer 2310 , and a second The electrode layer 2400 and the protective layer 2500 may be deposited in this order. In addition, the present invention is not limited thereto, and the electrochromic module 3000 may include an additional layer or may be implemented in a form in which some layers are omitted.

So far, the configuration of the electrochromic module 3000 has been described in detail. Hereinafter, the electrochromic module 3000 according to various embodiments will be described in detail. However, in the description of the electrochromic module 3000 below, the electrochromic module 3000 includes a substrate 2100 , a first electrode layer 2200 , an ion storage layer 2310 , an electrolyte layer 2320 , and an electrochromic module. It is assumed that the layer 2330, the second electrode layer 2400, and the protective layer 2500 are deposited in this order.

This is only assuming one embodiment among various embodiments for convenience of description, and various embodiments described below include the substrate 2100 , the first electrode layer 2200 , the ion storage layer 2310 , and the electrolyte layer. (2320), the electrochromic layer 2330, the second electrode layer 2400, and the protective layer 2500 are not disclosed in a limiting sense, which is applied only to the electrochromic module 3000 stacked in this order, and the scope of the present application In interpreting the claims, the scope of the rights should be determined by the interpretation of the claims of the present application.

2.1 Electrochromic device according to the first embodiment

10 is a view for explaining the electrochromic module 3000 according to an embodiment of the present application.

The electrochromic module 3000 includes a substrate 2100, a first electrode layer 2200, an ion storage layer 2310, an electrolyte layer 2320, an electrochromic layer 2330, a second electrode layer 2400, and a protective layer ( 2500) may be included.

The protective layer 2500 described below may be a single layer. Here, the protective layer 2500 may be a multi-layer. As a specific example, the multi-layered protective layer 2500 may include a first protective layer 2500 , a second protective layer 2500 , and an N-th protective layer 2500 .

The protective layer 2500 described below may mean one protective layer 2500 included in the electrochromic module 3000 . The protective layer 2500 described below may mean a plurality of protective layers 2500 included in the electrochromic module 3000 . The protective layer 2500 described below may mean several protective layers 2500 included in the electrochromic module 3000 . The protective layer 2500 described below may mean all the protective layers 2500 included in the electrochromic module 3000 .

The protective layer 2500 may be located on the upper surface of the second electrode layer 2400 . However, in this case, there is a problem in that it is impossible to prevent the color-changing ions from leaking to the side of the electrochromic element 2000 . To solve this problem, the electrochromic module 3000 may be implemented in a form in which the protective layer 2500 is positioned on the upper surface of the electrochromic element 2000 and on the side of the electrochromic element 2000 .

As a specific example, the electrochromic device 2000 includes a substrate 2100 , a first electrode layer 2200 , an ion storage layer 2310 , an electrolyte layer 2320 , an electrochromic layer 2330 , and a second electrode layer 2400 ). When including, the lower surface of the substrate 2100 of the electrochromic element 2000, the upper surface of the second electrode layer 2400 and the side surface of the electrochromic element 2000 may be defined as a boundary region (BR). have.

The protective layer 2500 may be located in the boundary region BR of the electrochromic device 2000 . For example, the protective layer 2500 may be located in all regions defined as the boundary region BR of the electrochromic device 2000 . As another example, the protective layer 2500 may be located in a portion of the region defined as the boundary region BR of the electrochromic device 2000 .

As a specific example, the protective layer 2500 may be disposed on the upper surface of the second electrode layer 2400 and the side surface of the electrochromic device 2000 except for the lower surface of the substrate 2100 in the boundary region BR. . At this time, even if the protective layer 2500 is not formed on the lower surface of the substrate 2100, the substrate 2100 has the thickest thickness among the first electrode layer 2200, the second electrode layer 2400, and the electrochromic medium 2300. Thus, the outflow of color-changing ions included in the electrochromic device 2000 in a direction passing through the substrate 2100 may be prevented.

The protective layer 2500 may include a region formed on a side surface of the substrate 2100 . The protective layer 2500 may be formed on the side surface of the electrochromic device 2000 and positioned on both the side surface of the first electrode layer 2200 and the side surface of the substrate 2100 . The protective layer 2500 may be positioned as a continuous layer on the side surface of the first electrode layer 2200 and the side surface of the substrate 2100 . For this reason, the color-changing ions are prevented from flowing out through the gap formed on the contact surface of the substrate 2100 and the first electrode layer 2200, and the protective layer 2500 from the electrochromic element 2000 is also prevented. effect can be derived.

11 and 12 are enlarged views of an edge region (ER) of the electrochromic module 3000 .

In the edge region ER, the first electrode layer 2200, the electrochromic medium 2300, and the second electrode layer 2400 are formed in a vertical direction (hereinafter, referred to as a second direction) in the first direction in which the substrate 2100 is extended. If there is, it may be an edge region including the side surface of the substrate 2100 in the cross-section in the second direction of the substrate 2100, the first electrode layer 2200, the electrochromic medium 2300, and the second electrode layer 2400. have.

Referring to FIG. 11 , the protective layer 2500 may be disposed on the upper surface of the second electrode layer 2400 and on the side surface of the electrochromic device 2000 . The protective layer 2500 is formed on the upper surface of the second electrode layer 2400 , the side surface of the second electrode layer 2400 , the side surface of the electrochromic medium 2300 , the side surface of the first electrode layer 2200 , and the side surface of the substrate 2100 . can be The protective layer 2500 is on the upper surface of the second electrode layer 2400 , the side surface of the second electrode layer 2400 , the side surface of the electrochromic medium 2300 , the side surface of the first electrode layer 2200 , and the side surface of the substrate 2100 . can be formed.

The protective layer 2500 includes a first protective region PR1 positioned on the upper surface of the second electrode layer 2400 of the protective layer 2500 and a second protective layer 2500 positioned on the side of the electrochromic device 2000 of the protective layer 2500 . The protection region PR2 may be included. According to an embodiment of the present application, the first protective region PR1 may be a protective layer 2500 formed on the entire surface corresponding to the upper surface of the second electrode layer 2400 of the electrochromic device 2000 . The second protective region PR2 may be a protective layer 2500 formed on the entire surface corresponding to the side surface of the electrochromic device 2000 . If the extension direction of the side surface of the electrochromic device 2000 is the first direction, the second protection region PR2 may be a protection layer 2500 formed in a second direction perpendicular to the extension direction of the side surface.

The thickness of the protective layer 2500 of the region PR1 positioned on a partial region of the upper surface of the second electrode layer 2400 and the region PR2 positioned on a part of the side surface of the electrochromic device 2000 of the protective layer 2500 may be substantially the same. For example, the thickness of the first protection region PR1 and the second protection region PR2 may be substantially the same. The first protection region PR1 and the second protection region PR2 may be formed through an ALD process to have the same thickness. As a specific example, the first protection region PR1 and the second protection region PR2 may be formed through a process including deposition of a first material through an ALD process and deposition of a second material through an ALD process, which will be described below. can be formed.

The electrochromic medium 2300 may be disposed on the upper surface of the first electrode layer 2200 and the side surface of the electrochromic element 2000 . The electrochromic medium 2300 may be formed on the upper surface of the first electrode layer 2200 , the side surface of the substrate 2100 , and the side surface of the first electrode layer 2200 . Accordingly, it is possible to prevent the formation of a non-discoloration region due to process deviation. To explain with a specific example, when the sputtering process is performed by setting the deposition area so that the electrochromic medium 2300 corresponds to the upper surface of the substrate 2100, some regions of the upper surface of the substrate 2100 (eg, For example, since the electrochromic medium 2300 is not deposited on the edge region), there may be a problem in that a non-chromic region is formed even though it should be a color-changing region. However, if the electrochromic medium 2300 has a slightly larger area than the upper surface of the substrate 2100 and the sputtering process is performed, the electrochromic medium 2300 is also formed on the side surface, and in this case, even if a process deviation occurs, the substrate ( 2100), it is possible to manufacture the electrochromic device to reduce the problem of forming an uncolored area even though it should be a color-changing area. Through this, it is possible to minimize the amount of waste due to process errors and to derive the effect of improving process efficiency.

The electrochromic medium 2300 includes a first electrochromic region ECR1 positioned on the first electrode layer among the electrochromic media 2300 and a second electrochromic region ECR1 positioned on the side of the electrochromic element 2000 among the electrochromic media 2300 . It may include an electrochromic region ECR2. According to an embodiment of the present application, the first protective region PR1 may be a protective layer 2500 formed on the entire surface corresponding to the upper surface of the second electrode layer 2400 of the electrochromic device 2000 . The second protective region PR2 may be a protective layer 2500 formed on the entire surface corresponding to the side surface of the electrochromic device 2000 .

The protective layer 2500 may be formed to surround the electrochromic medium 2300 . The second protective region PR2 of the protective layer 2500 may be formed to cover the second electrochromic region ECR2 of the electrochromic medium 2300 . A contact area between the second protective region PR2 of the protective layer 2500 and the second electrode layer 2400 is a contact area between the second electrochromic region ECR2 of the electrochromic medium 2300 and the first electrode layer 2200 . may be larger than When viewed from the side direction of the substrate 2100 (that is, viewed in the first direction), the electrochromic medium 2300 so that the second electrochromic region ECR2 is covered by the second protective region PR2 and a protective layer 2500 may be formed.

Here, the meaning of being covered is that, when viewed from the side direction of the substrate 2100 , the second protective region PR2 is formed on the second electrochromic region ECR2 and is formed on the second electrochromic region ECR2 and the second electrochromic region ECR2. This is to prevent direct external contact, but does not mean that the second electrochromic region ECR2 is not visible by the second protective region PR2 because the second protective region PR2 has an opaque color.

The first electrochromic region ECR1 of the electrochromic medium 2300 may have substantially the same thickness. The second electrochromic region ECR2 of the electrochromic medium 2300 may include a thickness adjustment section. For example, the second electrochromic region ECR2 of the electrochromic medium 2300 may have a gradually decreasing thickness. In other words, the second electrochromic region ECR2 of the electrochromic medium 2300 may have a tapered shape as shown in FIG. 11 .

According to the present embodiment, virtual first points P1, second points P2, and third points P3 on the electrochromic medium 2300 may be defined. The first point P1 may be a point where the thickness of the electrochromic medium 2300 is greatest. The second point P2 may be a point where the thickness of the electrochromic medium 2300 is the smallest. The third point P3 may be a point closest to the second electrode layer 2400 in the second electrochromic region ECR2 . For example, the distance between the second point P2 and the first electrode layer 2200 may be greater than the distance between the third point P3 and the first electrode layer 2200 . It may have a tapered shape in which the thickness gradually decreases from the third point P3 to the second point P2.

The first point P1 , the second point P2 , and the third point P3 may have different thicknesses. Alternatively, the first point P1 and the second point P2 may have different thicknesses, and the first point P1 and the third point P3 may have substantially the same thickness. Alternatively, the first point P1 and the second point P2 may have different thicknesses, and the difference between the thicknesses of the second point P2 and the third point P3 may be insignificant. Alternatively, the thickness of the third point P3 may be smaller than that of the first point P1 , and the thickness of the second point P2 may be smaller than that of the third point P3 .

The first electrochromic region ECR1 and the second electrochromic region ECR2 may be formed through a sputtering process. As a specific example, the first electrochromic region ECR1 and the second electrochromic region ECR2 may be formed by depositing a first material through a sputtering process, depositing a second material through a sputtering process, and a third material, which will be described below. It can be formed through a process including deposition through a sputtering process of.

12 , the electrochromic medium 2300 may include an ion storage layer 2310 , an electrolyte layer 2320 , and an electrochromic layer 2330 . For example, the electrolyte layer 2320 may be positioned on the ion storage layer 2310 , and the electrochromic layer 2330 may be positioned on the electrolyte layer 2320 .

The first electrode layer 2200 may be formed not only on the upper surface of the substrate 2100 , but also on the side surface of the substrate 2100 to have a first contact surface C1 in contact with the substrate 2100 . The first electrode layer 2200 is formed to surround the substrate 2100 , and the electrochromic module 3000 may have a first contact surface C1 in which the substrate 2100 and the first electrode layer 2200 contact each other.

The ion storage layer 2310 may be formed not only on the upper surface of the first electrode layer 2200 , but also on the side surface of the first electrode layer 2200 . The ion storage layer 2310 may be formed on the side surface of the substrate 2100 as well as the side surface of the first electrode layer 2200 to have a second contact surface C2 in contact with the substrate 2100 . The ion storage layer 2310 is formed to surround the first electrode layer 2200, and the electrochromic module 3000 may have a second contact surface C2 in which the substrate 2100 and the ion storage layer 2310 contact each other. .

The electrolyte layer 2320 may be formed not only on the upper surface of the ion storage layer 2310 , but also on the side surface of the ion storage layer 2310 . The electrolyte layer 2320 is formed not only on the side surface of the ion storage layer 2310, but also on the side surface of the first electrode layer 2200 and the side surface of the substrate 2100, the third contact surface C3 in contact with the substrate 2100. can have The electrolyte layer 2320 is formed to surround the ion storage layer 2310 , and the electrochromic module 3000 may have a third contact surface C3 in which the substrate 2100 and the electrolyte layer 2320 contact each other.

The electrochromic layer 2330 may be formed not only on the upper surface of the electrolyte layer 2320 , but also on the side surface of the electrolyte layer 2320 . The electrochromic layer 2330 is formed not only on the side surface of the electrolyte layer 2320, but also on the side surface of the ion storage layer 2310, the side surface of the first electrode layer 2200, and the side surface of the substrate 2100, the substrate 2100 and It may have a fourth contact surface C4 in contact. The electrochromic layer 2330 is formed to surround the electrolyte layer 2320 , and the electrochromic module 3000 may have a fourth contact surface C4 in which the substrate 2100 and the electrochromic layer 2330 contact each other.

The second electrode layer 2400 may be formed not only on the top surface of the electrochromic layer 2330 , but also on the side surface of the electrochromic layer 2330 . The second electrode layer 2400 is not only a side surface of the electrochromic layer 2330 , but also a side surface of the electrolyte layer 2320 , a side surface of the ion storage layer 2310 , a side surface of the first electrode layer 2200 , and a side surface of the substrate 2100 . It may also have a fifth contact surface C5 in contact with the substrate 2100 . The second electrode layer 2400 is formed to surround the electrochromic layer 2330, and the electrochromic module 3000 may have a fifth contact surface C5 in which the substrate 2100 and the second electrode layer 2400 are in contact. .

The protective layer 2500 may be formed not only on the upper surface of the second electrode layer 2400 , but also on the side surface of the second electrode layer 2400 . The protective layer 2500 includes not only the side surface of the second electrode layer 2400 , but also the side surface of the electrochromic layer 2330 , the side surface of the electrolyte layer 2320 , the side surface of the ion storage layer 2310 , and the first electrode layer 2200 . It may be formed on the side surface and the side surface of the substrate 2100 to have a sixth contact surface C6 in contact with the substrate 2100 . The protective layer 2500 is formed to surround the second electrode layer 2400 , and the electrochromic module 3000 may have a sixth contact surface C6 in which the substrate 2100 and the protective layer 2500 contact each other.

The protective layer 2500 may be positioned as a continuous layer on the side surface of the first electrode layer 2200 and the side surface of the substrate 2100 . A region of the protective layer 2500 located on the side surface of the substrate 2100 and a region located on the side surface of the second electrode layer 2400 among the protective layer 2500 may be connected to each other to form one layer. A region located on the side of the substrate 2100 of the protective layer 2500 and a region located on the side of the second electrode layer 2400 among the protective layer 2500 are connected to form one form including a multi-layer. have. A region of the protective layer 2500 located on the side surface of the substrate 2100 and a region located on the side surface of the electrochromic medium 2300 among the protective layer 2500 may be connected to each other to form a single layer. Among the protective layer 2500, the region located on the side of the substrate 2100 and the region located on the side of the electrochromic medium 2300 among the protective layer 2500 are connected to form one shape including multi-layers. have. A region of the passivation layer 2500 located on the side surface of the substrate 2100 and a region of the passivation layer 2500 located on the side surface of the first electrode layer 2200 may be connected to each other to form a single layer. Among the protective layer 2500, the region located on the side of the substrate 2100 and the region located on the side of the first electrode layer 2200 of the protective layer 2500 are connected to form one form including multi-layers. have.

In the electrochromic device 2000 according to an embodiment of the present application, an edge of the substrate 2100 may have a curved surface through a chamfering process for user safety.

13 illustrates the shapes of the protective layer 2500 and the electrochromic medium 2300 when a curved surface is formed on the edge of the substrate 2100 in the electrochromic module 3000 according to an embodiment of the present application. is a drawing for

The substrate 2100 may be a transparent substrate. The substrate 2100 may be a glass substrate. The substrate 2100 may have at least one curved area formed through a chamfering process. The substrate 2100 may have a first curved surface CS1 formed on an edge of an upper surface and a second curved surface CS2 formed on an edge of a lower surface of the substrate 2100 . The first curved surface CS1 may be formed in an edge region of a surface in contact with the first electrode layer 2100 . The second curved surface CS2 may be formed in an edge region opposite to the surface in contact with the first electrode layer 2100 . The second curved surface CS2 may be formed on a lower surface of the substrate 2100 . The second curved surface CS2 may be formed on the lower surface side of the substrate 2100 on which a change in the optical properties of the electrochromic medium is confirmed.

The substrate 2100 may have at least one curved area formed through a chamfering process. A protective layer 2500 may be positioned on the at least one curved area. The electrochromic medium 2300 may be positioned on the at least one curved area. A first electrode layer 2200 may be positioned on the at least one curved area.

According to the exemplary embodiment of the present application, the protective layer 2500 may have a first curved surface CS1 and a second curved surface CS2 formed thereon. The protective layer 2500 may extend to the second curved surface CS2 to protect the electrochromic medium 2300 and the first electrode layer 2100 therein, and to prevent the outflow of color-changing ions. The electrochromic medium 2300 may be formed on the first curved surface CS1 . The electrochromic medium 2300 may extend to the side surface of the substrate 2100 , but may not be formed on the second curved surface CS2 and may be covered by the protective layer 2500 .

The first curved surface CS1 may be closer to the first electrode layer 2200 than the second curved surface CS2 . The first curved surface CS1 may contact the first electrode layer 2200 . The first curved surface CS1 may be closer to the second electrode layer 2400 than the second curved surface CS2 .

14 is a view for explaining the electrochromic module 3000 according to an embodiment of the present application.

As described above, the electrochromic module 3000 according to an embodiment of the present application may include a plurality of protective layers 2500 . According to an embodiment of the present application, a first passivation layer 2510 and a second passivation layer 2520 may be included.

Referring to FIG. 10 , a protective layer 2500 is formed on an upper surface of the electrochromic device 2000 and a side surface of the electrochromic device 2000 , and the protective layer 2500 includes a first protective layer 2510 and a second protective layer 2510 . layer 2520 . As a specific example, the passivation layer 2500 may include a first passivation layer 2510 , a second passivation layer 2520 , and an Nth passivation layer.

Referring to FIG. 14 , a first protective layer 2510 is formed on the upper surface of the electrochromic device 2000, and a second protective layer ( 2520) may be formed.

The first passivation layer 2510 may be a single layer. The first passivation layer 2510 may be multi-layered. As a specific example, the first passivation layer 2510 may include a passivation layer including a first material, a passivation layer including a second material, and a passivation layer including a first material.

The second passivation layer 2520 may be a single layer. The second passivation layer 2520 may be multi-layered. For example, the second protective layer 2520 may include a protective layer including a third material, a protective layer including a fourth material, a protective layer including a third material, a protective layer including a fourth material, and a second protective layer including a fourth material. It may include a protective layer including three materials and a protective layer including a fourth material.

According to an embodiment, the first passivation layer 2510 and the second passivation layer 2520 may be formed through the same process. According to another embodiment, the first passivation layer 2510 and the second passivation layer 2520 may be formed through different processes.

Referring to FIG. 14 , the second passivation layer 2520 may be formed on the first passivation layer 2510 . The second passivation layer 2520 may be formed on a side surface of the substrate 2100 on which the first passivation layer 2510 is not formed. For example, only the second passivation layer 2520 may be formed on the side surface of the substrate 2100 . As another example, the first passivation layer 2520 is formed on a portion of the side surface of the substrate 2100 , and the second passivation layer 2520 is formed on the side surface of the substrate 2100 on which the first passivation layer 2510 is not formed. can be formed.

The color-changing ions included in the electrochromic element 2000 may be prevented from leaking to the upper surface of the electrochromic element 2000 by the first protective layer 2510 and the second protective layer 2520 , and the electrochromic element The leakage to the side of (2000) may be prevented by the second protective layer 2520, and the leakage to the lower surface of the electrochromic device 2000 is the first electrode layer 2200, the ion storage layer 2310, and the electrolyte. This may be prevented by the thick substrate 2100 compared to the layer 2320 , the electrochromic layer 2330 , and the second electrode layer 2400 .

According to one embodiment of the present application, in the electrochromic module 3000 including the protective layer 2500 including the first protective layer 2510 and the second protective layer 2520, the first protective layer 2510 is Compared to the electrochromic module 3000 without it, the encapsulation is strengthened, and the effect of preventing the electrochromic element 2000 from being damaged due to deterioration that may occur due to the second protective layer 2520 may be derived.

15 is a view for explaining the electrochromic module 3000 according to an embodiment of the present application.

The electrochromic module 3000 according to an embodiment of the present application may include a protective film 2600 . According to an embodiment of the present application, an electrochromic module 3000 having a protective film 2600 attached thereon may be provided on the electrochromic module 3000 according to the first embodiment. For example, the protective film 2600 may be a conventional barrier film.

Referring to FIG. 15 , a protective film 2600 may be formed on the protective layer 2500 . The protective film 2600 may not be formed on the side surface of the protective layer 2500 . In the color-changing ions included in the electrochromic element 2000, leakage to the upper surface of the electrochromic element 2000 may be prevented by the protective layer 2500 and the protective film 2600, and the electrochromic element 2000 can be prevented by the protective layer 2500, and the outflow to the lower surface of the electrochromic element 2000 is the first electrode layer 2200, the ion storage layer 2310, the electrolyte layer 2320, The electrochromic layer 2330 and the second electrode layer 2400 may be prevented by the thicker substrate 2100 .

A gap between the protective layer 2500 and the second electrode layer 2400 may be smaller than a gap between the protective film 2600 and the protective layer 2500 . Since the gap between the protective layer 2500 and the second electrode layer 2400 is small, the protective layer 2500 primarily prevents the outflow of discoloration ions contained in the electrochromic device 2000 to a wide upper surface, and a protective film (2600) can be prevented auxiliary. Since the side surface of the electrochromic element 2000 has a small area, it is possible to prevent leakage of color-changing ions included in the electrochromic element 2000 through the protective layer 2500 .

16 to 18 are flowcharts for explaining a process of manufacturing the electrochromic module 3000 according to the first embodiment.

The manufacturing process ( S100 ) of the electrochromic module 3000 may include manufacturing the electrochromic device 2000 ( S1000 ) and forming a protective layer ( S2000 ).

The manufacturing process (S1000) of the electrochromic device 2000 includes preparing the substrate 2100 (S1100), forming the first electrode layer 2200 (S1200), forming the electrochromic medium 2300 (S1300), and the second electrode layer 2400 ) may include forming (S1400).

The formation of the protective layer ( S2000 ) may include formation of the protective layer ( S2100 ) and attaching the protective film ( S2200 ).

A first electrode layer 2200 may be formed on one surface of the substrate 2100 ( S1200 ). The first electrode layer 2200 may be formed by sputtering. The first electrode layer 2200 may be formed to cover the entire surface of the substrate 2100 .

An electrochromic medium 2300 may be formed on the first electrode layer 2200 ( S1300 ). For example, an ion storage layer 2310 , an electrolyte layer 2320 , and an electrochromic layer 2330 may be sequentially formed on the upper surface of the first electrode layer 2200 ( S1300 ). As another example, an electrochromic layer 2330 , an electrolyte layer 2320 , and an ion storage layer 2310 may be sequentially formed on the upper surface of the first electrode layer 2200 ( S1300 ). The ion storage layer 2310 , the electrolyte layer 2320 , and the electrochromic layer 2330 may be formed by sputtering. The ion storage layer 2310 , the electrolyte layer 2320 , and the electrochromic layer 2330 may be formed to cover the entire surface of the substrate 2100 .

A second electrode layer 2400 may be formed on the electrochromic medium 2300 ( S1400 ). The second electrode layer 2400 may be formed by sputtering. The second electrode layer 2400 may be formed to cover the entire surface of the substrate 2100 .

To explain with a more specific example, in order to manufacture the electrochromic device 2000, a glass substrate 2100 is prepared (S1100), and an ITO electrode layer is formed on the substrate 2100 as a first electrode layer 2200 (S1200). )can do. As a specific example, the ITO electrode layer may be formed on the substrate 2100 through a sputtering deposition process. An IrTaO _x layer may be formed as an ion storage layer 2310 on the ITO electrode layer 2200 ( S1300 ). As a specific example, the IrTaO _x layer may be formed on the ITO electrode layer 2200 through a sputtering deposition process. A TaO _y layer may be formed on the IrTaO _x layer 2310 as the electrolyte layer 2320 ( S1300 ). As a specific example, the TaO _y layer may be formed on the IrTaO _x layer 2310 through a sputtering deposition process. A WO _z layer may be formed as an electrochromic layer 2330 on the TaO _y layer 2320 ( S1300 ). As a specific example, the WO _z layer may be formed on the TaO _y layer 2320 through a sputtering deposition process. An ITO layer may be formed on the WO _z layer 2330 as the second electrode layer 2400 (S1400). As a specific example, the ITO layer may be formed on the WO _z layer 2330 through a sputtering deposition process. In this case, the electrochromic device 2000 may have a window characteristic. As another example, an Al layer may be formed on the WO _z layer 2330 as the second electrode layer 2400 ( S1400 ). As a specific example, the Al layer may be formed on the WO _z layer 2330 through a sputtering deposition process. In this case, the electrochromic device 2000 may have a mirror characteristic.

A protective layer 2500 may be formed on the electrochromic device 2000 ( S2100 ). The protective layer 2500 may be formed through a deposition process. The passivation layer 2500 may be formed through an ALD process. The protective layer 2500 may be formed through a sputtering process. The protective layer 2500 may be formed to cover the upper surface of the electrochromic device 2000 . The protective layer 2500 may be formed to cover the side surface of the electrochromic device 2000 .

As a more specific example, when describing the process of manufacturing the electrochromic module 3000 , the SiN layer may be formed as a protective layer 2500 on the second electrode layer 2400 ( S2100 ). As a specific example, the SiN layer may be formed on the second electrode layer 2400 through a sputtering deposition process. By the sputtering process, an Al layer may be formed on the SiN layer, and an SiN layer may be formed on the Al layer. The SiN layer, the Al layer, and the SiN layer may be formed as the protective layer 2500 ( S2100 ).

The TiO ₂ layer may be formed as a protective layer 2500 on the SiN layer (S2100). As a specific example, the TiO ₂ layer may be formed on the protective layer 2500 through an ALD deposition process. By the ALD deposition process, an Al ₂ O ₃ layer may be formed on the TiO ₂ layer, a TiO ₂ layer may be formed on the Al ₂ O ₃ layer, and the protective layer 2500 may be formed as a multilayer (S2100) can be

Here, each of the SiN layer, Al layer, SiN layer, TiO ₂ layer, Al ₂ O ₃ layer, TiO ₂ layer, Al ₂ O ₃ layer, TiO ₂ layer, and Al ₂ O ₃ layer may be a protective layer 2500 . . Here, the SiN layer, the Al layer, the SiN layer, the TiO ₂ layer, the Al ₂ O ₃ layer, the TiO ₂ layer, the Al ₂ O ₃ layer, the TiO ₂ layer, and the Al ₂ O ₃ layer may be the protective layer 2500 . Here, the SiN layer, the Al layer, and the SiN layer are the first protective layers 2510, the TiO ₂ layer, the Al ₂ O ₃ layer, the TiO ₂ layer, the Al ₂ O ₃ layer, the TiO ₂ layer, and the Al ₂ O ₃ layer are It may be the second protective layer 2520 .

A protective film 2600 may be attached (S2200) on the protective layer 2500. Alternatively, the protective film 2600 may not be attached on the protective layer 2500 .

According to an embodiment of the present application, in the electrochromic module 3000 including a protective layer 2500 including a first protective layer 2510 formed through sputtering and a second protective layer 2520 formed through ALD, By including the first protective layer 2510, encapsulation is strengthened, and the effect of preventing the electrochromic device 2000 from being damaged due to deterioration that may occur due to the second protective layer 2520 may be derived.

So far, a process of manufacturing the electrochromic module 3000 according to the first embodiment has been described with reference to FIGS. 16 to 18 . However, this has been described as an example so that those skilled in the art can repeat and reproduce it with reference to the present specification, and the technical idea of the present specification should not be limited to the electrochromic module 3000 manufactured through FIGS. , In the process described with reference to FIGS. 15 to 17 , one or more steps described above may be omitted or added, and it is also possible that the order between the steps is changed.

19 is a FIB (Focused Ion Beam) image in which the protective layer 2500 is formed on the side surface of the glass substrate 2100 .

The protective layer 2500 is formed on the side surface of the substrate 2100, so that it is possible to manufacture the electrochromic module 3000 according to the first embodiment. .

At least four or more protective layers 2500 were formed on the glass substrate 2100 . A SiN layer 2500 was deposited on the glass substrate 2100 through a sputtering process. An Al layer 2500 was deposited on the SiN layer 2500 through a sputtering process. A SiN layer 2500 was deposited on the Al layer 2500 through a sputtering process. A multi-layered protective layer 2500 was formed on the SiN layer 2500 through an ALD process.

An FIB image of the manufactured electrochromic module 3000 was taken.

In the target region TR on the FIB image, it was confirmed that at least four or more protective layers 2500 were each maintained in thickness, and the protective layer 2500 was formed on the side surface of the substrate 2100 .

Accordingly, as demonstrated herein, the protective layer 2500 may be sufficiently formed on the upper surface and the side surface of the electrochromic device 2000 , and is lost through the contact surface between the substrate 2100 and the first electrode layer 2200 . This can lead to the effect of reducing the outflow of discolored ions by blocking the

2.2 Electrochromic module according to the second embodiment

20 is a view for explaining the electrochromic module 3000 according to an embodiment of the present application.

The electrochromic module 3000 includes a substrate 2100, a first electrode layer 2200, an ion storage layer 2310, an electrolyte layer 2320, an electrochromic layer 2330, a second electrode layer 2400, and a protective layer ( 2500) may be included.

The protective layer 2500 described below may be a single layer. Here, the protective layer 2500 may be a multi-layer. As a specific example, the multi-layered protective layer 2500 may include a first protective layer 2500 , a second protective layer 2500 , and an N-th protective layer 2500 .

The protective layer 2500 described below may mean one protective layer 2500 included in the electrochromic module 3000 . The protective layer 2500 described below may mean a plurality of protective layers 2500 included in the electrochromic module 3000 . The protective layer 2500 described below may mean several protective layers 2500 included in the electrochromic module 3000 . The protective layer 2500 described below may mean all the protective layers 2500 included in the electrochromic module 3000 .

The protective layer 2500 may be implemented in a form positioned on the upper surface of the electrochromic element 2000 and the side surface of the electrochromic element 2000 . The protective layer 2500 may be formed on the upper surface of the second electrode layer 2400 , the second electrode layer 2400 , the electrochromic medium 2300 , the side surface of the first electrode layer 2200 , and the upper surface of the substrate 2100 . Optionally, the protective layer 2500 may include a region formed on a side surface of the substrate 2100 .

The protective layer 2500 may be positioned on both the upper surface of the substrate 2100 and the side surface of the first electrode layer 2200 . The protective layer 2500 may be disposed on both the upper surface and the side surface of the first electrode layer 2200 exposed by the absence of the electrochromic medium 2300 on the substrate 2100 . The protective layer 2500 may be disposed as a continuous layer on the upper surface of the substrate 2100 and the side surface of the first electrode layer 2200 . For this reason, the color-changing ions are prevented from flowing out through the gap formed on the contact surface of the substrate 2100 and the first electrode layer 2200, and the protective layer 2500 from the electrochromic element 2000 is also prevented. effect can be derived.

The protective layer 2500 may cover the electrochromic medium 2300 . The protective layer 2500 may cover the electrochromic medium 2300 so as to prevent leakage of color-changing ions through the side surface of the electrochromic medium 2300 and the side of the second electrode layer 2400 . In this regard, it will be described in detail with reference to FIG. 21 .

21 is an enlarged view of an edge region (ER) of the electrochromic module 3000 .

In the edge region ER, the first electrode layer 2200, the electrochromic medium 2300, and the second electrode layer 2400 are formed in a vertical direction (hereinafter, referred to as a second direction) in the first direction in which the substrate 2100 is extended. If there is, it may be an edge region including the side surface of the substrate 2100 in the cross-section in the second direction of the substrate 2100, the first electrode layer 2200, the electrochromic medium 2300, and the second electrode layer 2400. have.

The protective layer 2500 may be formed to surround the second electrode layer 2400 . The protective layer 2500 may be formed to cover the second electrode layer 2400 . A contact area between the protective layer 2500 and the second electrode layer 2400 may be larger than a contact area between the second electrode layer 2400 and the electrochromic medium 2300 . When viewed from the side direction of the substrate 2100 (that is, when viewed in the first direction), the second electrode layer 2400 and the protective layer ( 2500) may be formed.

The second electrode layer 2400 may be formed to surround the electrochromic medium 2300 . The second electrode layer 2400 may be formed to cover the electrochromic medium 2300 . A contact area between the second electrode layer 2400 and the electrochromic medium 2300 may be larger than a contact area between the electrochromic medium 2300 and the first electrode layer 2200 . When viewed from the side direction of the substrate 2100 (ie, viewed in the first direction), the electrochromic medium 2300 and the second electrochromic medium 2300 so that the electrochromic medium 2300 is covered by the second electrode layer 2400 . An electrode layer 2400 may be formed. When viewed from the side direction of the substrate 2100 (that is, when viewed in the first direction), the electrochromic medium 2300 and the protective layer ( 2500) may be formed.

The electrochromic medium 2300 may be formed to surround the first electrode layer 2200 . The electrochromic medium 2300 may be formed to cover the first electrode layer 2200 . A contact area between the electrochromic medium 2300 and the first electrode layer 2200 may be larger than a contact area between the first electrode layer 2200 and the substrate 2100 . When viewed from the side direction of the substrate 2100 (that is, viewed in the first direction), the first electrode layer 2200 and the electrochromic so that the first electrode layer 2200 is covered by the electrochromic medium 2300 . A medium 2300 may be formed. When viewed from the side direction of the substrate 2100 (ie, viewed in the first direction), the first electrode layer 2200 and the second electrode layer 2200 are covered by the second electrode layer 2400 . An electrode layer 2400 may be formed. When viewed from the side direction of the substrate 2100 (that is, when viewed in the first direction), the first electrode layer 2200 and the protective layer ( 2500) may be formed.

In the electrochromic module 3000 according to the present embodiment, the first electrode layer 2200 may have a thickness adjustment region, the electrochromic medium 2300 may have a thickness adjustment region, and the second electrode layer 2400 . may have a thickness adjustment region, and the protective layer 2500 may have a thickness adjustment region. In the electrochromic module 3000 according to an embodiment of the present application, the first electrode layer 2200 may have a thickness adjustment region, and in the electrochromic medium 2300 , the thickness adjustment region is the thickness of the first electrode layer 2200 . The thickness adjustment region of the second electrode layer 2400 may be formed on the thickness adjustment region of the electrochromic medium 2300 , and the thickness adjustment region of the protective layer 2500 is the second electrode layer 2400 . It may be formed on the thickness adjustment region of the electrode layer 2400 .

The thickness adjustment region according to an embodiment of the present application may include a region having a tapered shape in which the thickness gradually decreases.

In the tapered shape according to FIG. 21 , virtual P1 , P2 and P3 may be defined as described in FIG. 11 , but the embodiment according to FIG. 21 can be fully understood through FIG. 11 , so overlapping descriptions will be omitted. do.

FIG. 22 is a view for explaining the electrochromic module 3000 according to the modified example of FIG. 21 .

Referring to FIG. 22 , the protective layer 2500 is a tapered protective region (TPR) formed on the thickness adjustment region of the second electrode layer 2400 , and an upper surface formed on the upper surface of the second electrode layer 2400 . It may include an upper protective region (UPR) and a side protective region (SPR) formed on a side surface of the substrate 2100 .

In this case, the first electrode layer 2200 , the electrochromic medium 2300 , and the second electrode layer 2400 may not be formed on the side surface of the substrate 2100 . Alternatively, the first electrode layer 2200 , the electrochromic medium 2300 , and the second electrode layer 2400 may be formed on a portion of the side surface of the substrate 2100 .

In both cases, when viewed from the side direction of the substrate 2100 (ie, viewed in the first direction), the first electrode layer 2200, the electrochromic medium 2300 and the first electrode layer 2200 by the protective layer 2500 The second electrode layer 2400 may be covered.

23 is a view for explaining the electrochromic module 3000 according to an embodiment of the present application.

The electrochromic module 3000 according to an embodiment of the present application may include a protective film 2600 . According to an embodiment of the present application, an electrochromic module 3000 having a protective film 2600 attached thereon may be provided on the electrochromic module 3000 according to the second embodiment. For example, the protective film 2600 may be a conventional barrier film.

Referring to FIG. 23 , the protective film 2600 may be attached on the protective layer 2500 . The protective film 2600 may be attached on the protective layer 2500 corresponding to the upper surface of the second electrode layer 2400 . The protective film 2600 may be attached to the upper surface of the substrate 2100 . The protective film 2600 may be attached to the upper surface of the substrate 2100 on which the first electrode layer 2200 is not positioned.

The protective film 2600 may be attached on the protective layer 2500 formed on the side surface of the electrochromic device 2000 . Alternatively, the protective film 2600 is not attached on the protective layer 2500 formed on the side surface of the electrochromic device 2000 , but between the protective layer 2500 and the protective film 2600 attached to the upper surface of the substrate 2100 . is sealed through adhesion between the protective layer 2500 and the protective film 2600 corresponding to the upper surface of the second electrode layer 2400, and the leakage of discoloration ions through the side surface of the electrochromic element 2000 is prevented. it could be

The color-changing ions included in the electrochromic element 2000 can be prevented from leaking to the upper surface of the electrochromic element 2000 by the protective layer 2500 and the protective film 2600 , and The leakage to the side can be prevented by the protective layer 2500, and the leakage to the lower surface of the electrochromic element 2000 is the first electrode layer 2200, the ion storage layer 2310, the electrolyte layer 2320, the electricity This may be prevented by the substrate 2100 thicker than the discoloration layer 2330 and the second electrode layer 2400 .

The protective layer 2500 may primarily prevent leakage of color-changing ions included in the electrochromic device 2000 to the wide upper surface, and the protective film 2600 may supplementally prevent the leakage. The leakage of color-changing ions included in the electrochromic element 2000 of the electrochromic element 2000 may also be prevented through the protective layer 2500 and the protective film 2600 . The outflow through the contact surface between the substrate 2100 and the first electrode layer 2200 may be prevented through the protective layer 2500 . According to this embodiment, there is an advantage in that the protective film 2600 is attached to the substrate 2100 so that the fixing force of the film is improved.

24 is a flowchart for explaining a modified process in manufacturing the electrochromic module 3000 according to the second embodiment.

The manufacturing process ( S100 ) of the electrochromic module ( S3000 ) may further include forming an edge insulating region ( S4000 ).

For example, in manufacturing the electrochromic module S3000, the electrochromic device 2000 may be manufactured (S1000), the edge insulating region may be formed (S4000), and then a protective layer may be formed (S2000). As another example, in manufacturing the electrochromic module (S3000), the electrochromic device (2000) is manufactured (S1000), a protective layer is formed (S2000), and an edge insulation region is formed (S4000), and then the protective layer is formed It can be formed (S2000).

For a specific example, after preparing a substrate (S1100), forming a first electrode layer (S1200), forming an electrochromic medium (S1300), and forming a second electrode layer (S1400), an edge insulating region is formed ( S4000) can be done.

The edge isolated region (EIR) is a region from which at least one of the second electrode layer 2400, the electrochromic medium 2300, and the first electrode layer 2200 included in the electrochromic device 2000 is removed. can The edge insulating region EIR may be a region from which the second electrode layer 2400 , the electrochromic medium 2300 , and the first electrode layer 2200 are removed.

The edge insulating region EIR may be formed to correspond to the shape of the substrate 2100 (refer to FIG. 25 ). The edge insulating region EIR may be formed in the form of a line corresponding to the shape of the substrate 2100 . The edge insulating region EIR may be formed in a form in which all outer surfaces are removed based on a line corresponding to the shape of the substrate 2100 . The edge insulating region EIR may be a region in which at least one of the second electrode layer 2400, the electrochromic medium 2300, and the first electrode layer 2200 of a predetermined width is removed along the edge of the substrate 2100. have. The edge insulating region EIR may be a region formed by a laser patterning process.

An edge insulating region may be formed (S4000), and a protective layer 2500 may be formed (S2000). In operation S2000 , the protective layer 2500 may be formed on at least one of the edge insulating region EIR, the upper surface of the second electrode layer 2400 , and the side surface of the substrate 2100 . The protective layer 2500 may have a single-layer type or a multi-layer type. In step S2000 , a protective film 2600 may be formed on at least one of the edge insulating region EIR, the upper surface of the second electrode layer 2400 , and the side surface of the substrate 2100 .

As another specific example, preparing a substrate (S1100), forming a first electrode layer (S1200), forming an electrochromic medium (S1300), forming a second electrode layer (S1400), and a protective layer (S2000) After forming, the edge insulating region may be formed (S4000).

The edge insulating region EIR is formed by removing at least one of the protective layer 2500, the second electrode layer 2400, the electrochromic medium 2300, and the first electrode layer 2200 included in the electrochromic device 2000. It can be an area. The edge insulating region EIR may be a region from which the protective layer 2500 , the second electrode layer 2400 , the electrochromic medium 2300 , and the first electrode layer 2200 are removed.

The edge insulating region EIR may be formed to correspond to the shape of the substrate 2100 . The edge insulating region EIR may be formed in the form of a line corresponding to the shape of the substrate 2100 . The edge insulating region EIR may be formed in a form in which all outer surfaces are removed based on a line corresponding to the shape of the substrate 2100 . The edge insulating region EIR includes at least one of the protective layer 2500 , the second electrode layer 2400 , the electrochromic medium 2300 , and the first electrode layer 2200 having a predetermined width along the edge of the substrate 2100 . It may be a region from which the layer has been removed. The edge insulating region EIR may be a region formed by a laser patterning process.

An edge insulating region may be formed (S4000), and a protective layer 2500 may be formed (S2000). In operation S2000 , the protective layer 2500 may be formed on at least one of the edge insulating region EIR, the upper surface of the second electrode layer 2400 , and the side surface of the substrate 2100 . The protective layer 2500 may have a single-layer type or a multi-layer type. In step S2000 , a protective film 2600 may be formed on at least one of the edge insulating region EIR, the upper surface of the second electrode layer 2400 , and the side surface of the substrate 2100 .

As a specific example, the passivation layer 2500 formed before the formation of the edge insulating region ( S4000 ) may include a first passivation layer 2500 and a second passivation layer 2500 . The first passivation layer 2500 may be a SiN layer. The second passivation layer 2500 may be an Al layer. The second protective layer 2500 may be made of a metallic material and may have conductivity. In the forming of the edge insulating region ( S4000 ), the edge of the Al layer having conductivity is also removed to prevent short circuit of the electrochromic device 2000 due to the Al layer. The passivation layer 2500 formed after the formation of the edge insulating region ( S4000 ) may include a first passivation layer 2500 and a second passivation layer 2500 . The first passivation layer 2500 may be a SiN layer. The second passivation layer 2500 may be a passivation layer formed through ALD. The second passivation layer 2500 may be multi-layered. The second passivation layer 2500 may include a TiO ₂ layer, an Al ₂ O ₃ layer, a TiO ₂ layer, an Al ₂ O ₃ layer, a TiO ₂ layer, and an Al ₂ O ₃ layer.

A protective film 2600 may be attached (S2200) on the protective layer 2500. Alternatively, the protective film 2600 may not be attached on the protective layer 2500 .

So far, a process of manufacturing the electrochromic module 3000 according to the second embodiment has been described with reference to FIG. 24 . However, this has been described by way of example so that those skilled in the art can repeat and reproduce with reference to the present specification, and the technical spirit of the present specification should not be limited to the electrochromic module 3000 manufactured through FIG. 24 .

3. Electrical connection part of the electrochromic element

The electrochromic device 2000 according to the embodiment may have a characteristic in which optical properties are adjusted based on a voltage applied between the first electrode layer 2200 and the second electrode layer 2400 . For example, the transmittance of the electrochromic device 2000 may be adjusted based on a voltage applied between the first electrode layer 2200 and the second electrode layer 2400 . As another example, the color coordinate value of the electrochromic device 2000 may be adjusted based on a voltage applied between the first electrode layer 2200 and the second electrode layer 2400 . As another example, the reflectance of the electrochromic device 2000 may be adjusted based on a voltage applied between the first electrode layer 2200 and the second electrode layer 2400 .

Therefore, in order to adjust the optical characteristics of the electrochromic device 2000 , it is important to control the electrical characteristics between the first electrode layer 2200 and the second electrode layer 2400 . Accordingly, the formation of the electrical connection portion electrically connected to the first electrode layer 2200 and/or the second electrode layer 2400 occupies an important part in the quality of the electrochromic device 2000 . Hereinafter, an electrical connection part and a forming process of the electrochromic device 2000 (or the electrochromic module 3000) according to an embodiment of the present application will be described.

3.1 Electrical connection of electrochromic element

The electrochromic module 3000 according to an embodiment of the present application may include a first conductor 2810 and a second conductor 2820 .

The first conductor 2810 may be electrically connected to the first electrode layer 2200 . The second conductor 2820 may be electrically connected to the second electrode layer 2400 . The control module 1000 may control the power supplied to the first conductor 2810 and the second conductor 2820 to adjust optical characteristics of the electrochromic device 2000 .

The first conductor 2810 may have higher conductivity than at least one of the first electrode layer 2200 and the second electrode layer 2400 . For example, the first conductor 2810 may be formed of a conductive material such as silver (Ag), copper (Cu), gold (Au), or an alloy thereof.

The first conductor 2810 may be formed of a conductive paste. The first conductor 2810 may be formed by printing the conductive paste using an inkjet method. The first conductor 2810 may be formed by printing the conductive paste in a pad method.

The second conductor 2820 may have higher conductivity than at least one of the first electrode layer 2200 and the second electrode layer 2400 . For example, the second conductor 2820 may be formed of a conductive material such as silver (Ag), copper (Cu), gold (Au), or an alloy thereof.

The second conductor 2820 may be formed of a conductive paste. The second conductor 2820 may be formed by printing the conductive paste using an inkjet method. The second conductor 2820 may be formed by printing the conductive paste in a pad method.

The first conductor 2810 and the second conductor 2820 may be electrically connected to the control module 1000 . For example, an electrical connection path may be formed between the first conductor 2810 and the control module 1000 in the form of soldering a wire connected to the control module 1000 to the first conductor 2810 itself. can An electrical connection path may be formed between the second conductor 2820 and the control module 1000 in the form of soldering a wire connected to the control module 1000 to the second conductor 2820 itself.

As another example, a circuit board 2900 is placed between the first conductor 2810 and the control module 1000, and the control module 1000 is connected to the circuit board 2900 connected to the first conductor 2810. An electrical connection path may be formed in the form of soldering a wire connected to the . A circuit board 2900 is placed between the second conductor 2820 and the control module 1000 , and the wire connected to the control module 1000 is connected to the circuit board 2900 connected to the second conductor 2820 . An electrical connection path may be formed in the form of soldering. A detailed structure related thereto will be described in more detail below.

Through the first conductor 2810 and the second conductor 2820 , the control module 1000 may adjust the voltage between the first electrode layer 2200 and the second electrode layer 2400 . Through the first conductor 2810 and the second conductor 2820 , the control module 1000 may adjust the current between the first electrode layer 2200 and the second electrode layer 2400 .

The discoloration rate and discoloration homogeneity of the electrochromic device 2000 may be determined according to material properties, positions, lengths, areas, etc. of the first conductor 2810 and the second conductor 2820 . In other words, when the first conductor 26010 and the second conductor 2820 are formed in the preferred embodiment, the discoloration rate and/or discoloration homogeneity of the electrochromic device 2000 may be improved.

3.2 Electrochromic device including electrical connection part according to the first embodiment

26 is a view illustrating an upper surface, an insulating region, and a conductor of the electrochromic element 2000 in order to explain the electrochromic element 2000 including the electrical connection part according to the first embodiment. 27 is a cross-sectional view taken along line B-B' in order to explain the electrochromic device 2000 including the electrical connection part according to the first embodiment.

Referring to FIG. 27 , the first electrode layer 2200 may be positioned on the substrate 2100 . A first electrode layer 2200 arrangement region and a first insulating region FIR may be formed on the substrate 2100 . The first insulating region FIR may be a region without the first electrode layer 2200 . The first insulating region FIR may be a region on the substrate 2100 without the first electrode layer 2200 . The first electrode layer 2200 may include a first-first electrode layer 2200 ′ and a first-second electrode layer 2200″ divided by a first insulating region FIR. Referring to FIG. 27 , , the first electrode layer 2200 positioned between the first insulating regions FIR is a 1-2 electrode layer 2200 ″, and a first electrode layer positioned on the right side of the first insulating region FIR positioned on the relatively right side. Reference numeral 2200 may be the first-first electrode layer 2200'. Alternatively, referring to FIG. 26 , the first electrode layer is divided into two based on the first insulating region FIR, and the first electrode layer 2200 positioned inside the first insulating region FIR is The second electrode layer 2200 ″, and the first electrode layer 2200 positioned outside the first insulating region FIR may be the 1-1 electrode layer 2200 ′. Referring to FIG. 27 , the first electrode layer 2200 ' The first electrode layer 2200 positioned between the insulating regions FIR is a 1-2 electrode layer 2200 ″, and a first electrode layer excluding the first electrode layer 2200 positioned between the first insulating regions FIR. Reference numeral 2200 may be the first-first electrode layer 2200'.

The first electrode layer 2200 may be positioned on one region of the substrate 2100 and not on the other region of the substrate 2100 . In other words, the substrate 2100 may include a region in which the first electrode layer 2200 is disposed and a region in which the first electrode layer 2200 is not disposed.

A first conductor 2810 may be positioned on the 1-1 electrode layer 2200 ′. The first conductor 2810 may be positioned on the first-first electrode layer 2200 ′ to be in physical contact. A second conductor 2820 may be positioned on the 1-2 electrode layer 2200". The second conductor 2820 may be positioned in a form in physical contact with the 1-2 electrode layer 2200". can

The electrochromic medium 2300 may be positioned on the first electrode layer 2200 arrangement area. The electrochromic medium 2300 may be located on one area of the first electrode layer 2200 arrangement area and not on the other area of the first electrode layer 2200 arrangement area. In other words, the region on which the electrochromic medium 2300 is disposed and the region where the electrochromic medium 2300 is not disposed may be included on the region where the first electrode layer 2200 is disposed.

A region in which the electrochromic medium 2300 is disposed and a second insulating region SIR may be formed in the region where the first electrode layer 2200 is disposed. The second insulating region SIR may be a region without at least one layer of the electrochromic medium 2300 . The second insulating region SIR may be a region in which at least one layer of the electrochromic medium 2300 is absent on the first electrode layer 2200 .

In the first insulating region FIR, a region in which the electrochromic medium 2300 is disposed and a second insulating region SIR may be formed. The second insulating region SIR may be a region without at least one layer of the electrochromic medium 2300 . The second insulating region SIR includes a region without at least one of the electrochromic medium 2300 on the first electrode layer 2200 and at least one of the electrochromic medium 2300 on the first insulating region FIR. It may include regions without layers.

The first insulating region FIR and the second insulating region SIR may correspond to each other. The region in which the first insulating region FIR is formed and the region in which the second insulating region SIR is formed may include the same region. The first insulating region FIR and the second insulating region SIR may overlap. A second insulating region SIR may be formed in a portion of a position where the first insulating region FIR is formed. The first insulating region FIR may have an overlapping region with the second insulating region SIR. For example, the overlapping region may be a region in which a specific material is deposited on the first insulating region FIR formed through laser patterning, and the material deposited by the second insulating region SIR formed through laser patterning is removed again. have. The material removed by the second insulating region SIR may include a material constituting the second electrode layer 2400 . The material removed by the second insulating region SIR may include a material constituting the second electrode layer 2400 and a material constituting the electrochromic layer 2330 . The material removed by the second insulating region SIR may include a material constituting the second electrode layer 2400 , a material constituting the electrochromic layer 2330 , and a material constituting the electrolyte layer 2320 . . The material removed by the second insulating region SIR includes a material constituting the second electrode layer 2400, a material constituting the electrochromic layer 2330, a material constituting the electrolyte layer 2320, and an ion storage layer ( 2310) may be included.

Referring to FIG. 27 , the second insulating region SIR is formed through a laser patterning device set to remove up to the ion storage layer 2310 , and the second insulating region SIR does not overlap the first insulating region FIR. ) is removed to the ion storage layer 2310 and positioned on the first electrode layer 2200 , and the second insulating region SIR overlapping the first insulating region FIR flows into the first insulating region FIR. The ion storage layer 2310 may be removed and positioned on the substrate 2100 .

Alternatively, the second insulating region SIR is formed through a laser patterning device set to remove the upper material of the first electrode layer 2200 , so that the second insulating region SIR does not overlap the first insulating region FIR. The silver ion storage layer 2310 is removed, and the second insulating region SIR overlapping the first insulating region FIR leaves a portion of the ion storage layer 2310 flowing into the first insulating region FIR and the upper portion thereof. It may be formed in a form in which is removed.

The electrochromic medium 2300 may include a first electrochromic medium 2300' and a second electrochromic medium 2300" that are separated by a second insulating region SIR. Referring to FIG. 27 , , the electrochromic medium 2300 located between the second insulating regions SIR is the second electrochromic medium 2300 ″, and the electrochromic medium 2300 ″ is located on the right side of the second insulating region SIR located on the relatively right side. The medium 2300 may be the first electrochromic medium 2300'. Alternatively, referring to FIG. 26 , the electrochromic medium is divided into two based on the second insulating region SIR, and the electrochromic medium 2300 positioned inside the second insulating region SIR is the second electrochromic medium 2300 . The color-changing medium 2300", and the electrochromic medium 2300 positioned outside the second insulating region SIR may be the first electrochromic medium 2300'. Referring to FIG. 27, the second The electrochromic medium 2300 positioned between the insulating regions SIR is the second electrochromic medium 2300", and the electrochromic medium except for the electrochromic medium 2300 positioned between the second insulating regions SIR. Reference numeral 2300 may be the first electrochromic medium 2300'.

A 2-1 electrode layer 2400' may be positioned on the first electrochromic medium 2300'. A 2-2 electrode layer 2400 ″ may be positioned on the second electrochromic medium 2300 ″. The electrochromic medium 2300 and the second electrode layer 2400 may share the second insulating region SIR. For example, the second insulating region SIR is formed through a laser patterning process, and the electrochromic medium 2300 is formed by the formation of the second insulating region SIR so that the first electrochromic medium 2300' and the second electrochromic medium 2300' It is divided into a medium 2300", and the second electrode layer 2400 may be divided into a 2-1 electrode layer 2400' and a 2-2 electrode layer 2400". The 2-1 th electrode layer 2400 ′ may correspond to the first electrochromic medium 2300 ′. The upper surface of the first electrochromic medium 2300' and the lower surface of the 2-1 electrode layer 2400' are in contact, and the first electrochromic medium 2300' and the 2-1 electrode layer 2400' have the same upper surface area. can have

The first conductor 2810 positioned on the 1-1 electrode layer 2200 ′ penetrates the first electrochromic medium 2300 ′ and the 2-1 electrode layer 2400 ′ to form an upper portion of the second electrode layer 2400 . can protrude from The second conductor 2820 positioned on the 1-2th electrode layer 2200" penetrates the second electrochromic medium 2300" and the 2-2nd electrode layer 2400" to form an upper portion of the second electrode layer 2400. The first conductor 2810 may have a contact surface surrounded by the electrochromic medium 2300. A side surface of the first conductor 2810 is surrounded by the first electrochromic medium 2300' and has a contact surface. The second conductor 2820 may have a contact surface surrounded by the electrochromic medium 2300. A side surface of the second conductor 2820 is surrounded by the second electrochromic medium 2300" to form a contact surface. can have

According to an embodiment of the present application, a portion of the constituent materials of the electrochromic medium 2300 may be positioned in the first insulating region FIR. The ion storage layer 2310 may flow into the first insulating region FIR. A material constituting the ion storage layer 2310 may be filled in the first insulating region FIR. The ion storage layer 2310 may be formed to have a gradient due to the first insulating region FIR. As a specific example, the ion storage layer 2310 on the first electrode layer 2200 may be positioned higher than the ion storage layer 2310 filled in the first insulating region FIR. In other words, the ion storage layer 2310 on the first electrode layer 2200 may be located relatively farther from the substrate 2100 than the ion storage layer 2310 filled in the first insulating region FIR. According to the gradient formed in the ion storage layer 2310, a gradient may be formed in the electrolyte layer 2320, the electrochromic layer 2330, and the second electrode layer 2400 according to the line in which the first insulating region FIR is positioned. There is (see Fig. 27).

According to the exemplary embodiment of the present application, some of the constituent materials of the electrochromic medium 2300 are located in one region of the first insulating region FIR, and the electrochromic medium 2300 is located in another region of the first insulating region FIR. ), some of the constituent materials may not be located. The ion storage layer 2310 may flow into a region of the first insulating region FIR that does not correspond to the second insulating region SIR to be filled with a material constituting the ion storage layer 2310 . An electrolyte layer 2320 , an electrochromic layer 2330 , and a second electrode layer 2400 may also be sequentially disposed on the introduced ion storage layer 2310 .

The electrochromic medium 2300 including the electrochromic layer 2330 is removed from the region corresponding to the second insulating region SIR among the first insulating region FIR, and the ion storage layer is formed on the first insulating region FIR. The electrochromic module 3000 may be configured in a form in which a material corresponding to 2310 is present but the layer formed on the ion storage layer 2310 is removed.

Alternatively, the electrochromic medium 2300 including the ion storage layer 2310 is removed from the region corresponding to the second insulating region SIR of the first insulating region FIR, and the electrochromic medium 2300 corresponding to the electrochromic medium 2300 is removed. Substances may not be present or may be insignificant due to process errors (see FIG. 27 ).

According to another embodiment of the present application, none of the constituent materials of the electrochromic medium 2300 may be located in the first insulating region FIR. As a specific example, when the first insulating region FIR is formed by using a mask to cover a position corresponding to the first insulating region FIR and depositing the electrochromic medium 2300 and the second electrode layer 2400 , None of the constituent materials of the electrochromic medium 2300 may be located in the first insulating region FIR (not shown).

According to the electrical characteristics applied to the first conductor 2810 and the second conductor 2820 , the electrical characteristics between the first electrode layer 2200 and the second electrode layer 2400 are controlled, so that the electrochromic The optical properties of the medium 2300 may be adjusted. Depending on the electrical characteristics applied to the first conductor 2810 and the second conductor 2820 , the electrical characteristics between the first-first electrode layer 2200 ′ and the second second electrode layer 2400 ″ vary. Controlled, the optical properties of the electrochromic medium 2300 can be adjusted. Even when a voltage between the 1-1 electrode layer 2200' and the 2-2 electrode layer 2400" is applied, the first insulating region ( In the electrochromic medium 2300 on the FIR), some movement of ions in the transverse direction also occurs, so that the lower active region AR may also include an upper portion of the first insulating region FIR. According to an embodiment of the present application, when a voltage is applied to the electrochromic medium 2300 , the movement of ions in the vertical direction rather than movement of the ions in the horizontal direction occurs more actively, so that the first 1-1 of the active area AR A discoloration rate of an upper portion of the electrode layer 2200 ′ and an upper portion of the first insulating region FIR may be different.

According to the exemplary embodiment of the present application, a region divided by the second insulating region SIR and in which the second conductor 2820 is located may be defined as the active region AR. A region that is separated by the second insulating region SIR and where the second conductor 2820 is not located may be defined as the non-active region NAR. When viewed from the lower surface of the substrate 2100 , a degree of discoloration at a position corresponding to the active area AR may be significantly different from a degree of discoloration at a location corresponding to the non-active area NAR.

According to another embodiment of the present application, the second insulating region SIR may be formed in a form in which only a portion of the electrochromic layer 2330 of the electrochromic medium 2300 is removed. The second insulating region SIR may be formed to control only a portion of the electrochromic layer 2330 and the second electrode layer 2400 . In this case, the active region AR is divided by the second insulating region SIR and the second conductor 2820 is located, and the second insulating region SIR is divided by the second conductor 2820 . The non-active area NAR may show a slight difference in the degree of discoloration.

Referring back to FIG. 26 , the first insulating region FIR may be formed to have a closed shape when viewed from the top surface of the electrochromic device 2000 . The first insulating region FIR may be formed to form a closed curve when viewed from the top surface of the electrochromic device 2000 . The second insulating region SIR may be formed to have a closed shape when viewed from the top surface of the electrochromic device 2000 . The second insulating region SIR may be formed to form a closed curve when viewed from the top of the electrochromic device 2000 .

The first insulating region FIR may have an overlapping region with the second insulating region SIR. Referring to FIG. 26 , the first insulating region FIR and the second insulating region SIR may be formed so that the lower side of the first insulating region FIR coincides with the lower side of the second insulating region SIR. have. However, 10% of the entire region of the first insulating region FIR may overlap the second insulating region SIR, or 30% of the entire region of the first insulating region FIR may be the second insulating region SIR. ), 50% of the total area of the first insulating region FIR may overlap the second insulating region SIR, or 70% of the total area of the first insulating region FIR The second insulating region SIR may overlap, or 90% of the entire area of the first insulating region FIR may overlap the second insulating region SIR. In other words, when the first insulating region FIR has a quadrangular shape, one side of the first insulating region FIR may overlap the second insulating region SIR, or two sides of the first insulating region FIR It may overlap the second insulating region SIR, or three sides of the first insulating region FIR may overlap the second insulating region SIR, but is not limited thereto.

According to the exemplary embodiment of the present application, in order to prevent the color from being fixed in the region defined by the first insulating region FIR, a portion of the first insulating region FIR and the second insulating region SIR overlaps each other. can do it The above description only describes some examples for implementing the electrochromic module 3000 of this type, and does not mean that the invention of the present application is limited by the above description. The second insulating region SIR may correspond to the shape of the substrate 2100 . The second insulating region SIR may be formed in a line corresponding to the shape of the substrate 2100 . The first insulating region FIR may be positioned inside the closed shape in which the second insulating region SIR is formed. A second insulating region may be formed outside the closed shape formed by the first insulating region FIR.

The first conductor 2810 may be positioned outside the closed shape formed by the second insulating region SIR. The first conductor 2810 may be formed in a shape corresponding to the closed shape formed by the second insulating region SIR. Alternatively, the second conductor 2810 may be positioned outside the second insulating region SIR in the form of a bus bar line. The second conductor 2810 may be located inside the closed shape formed by the first insulating region FIR.

According to another embodiment of the present application, the second insulating region SIR may be formed in a shape having a closed shape and a region protruding toward one edge. For example, the second insulating region SIR may be formed to have a region protruding toward one edge of the substrate 2100 by a size corresponding to the first insulating region FIR. In this case, the upper side of the first insulating region FIR coincides with a line that is not a protruding region among the closed shapes of the second insulating region SIR, and the lower side of the first insulating region FIR has the second insulating region ( SIR) may coincide with a line that is a protruding region among the closed shapes. As a specific example, the second insulating region SIR may be formed to surround three sides of the first insulating region FIR. The other side of the first insulating region FIR may be located inside the closed shape of the second insulating region SIR.

3.3 Electrochromic device including electrical connection according to the second embodiment

28 is a diagram illustrating an upper surface, an insulating region, and a conductor of the electrochromic element 2000 in order to explain the electrochromic element 2000 including the electrical connection part according to the second embodiment. 29 is a cross-sectional view taken along line B-B' in order to explain the electrochromic device 2000 including the electrical connection part according to the second embodiment.

The electrochromic device 2000 including the electrical connection part according to the second embodiment is an example in which the shape of the first insulating region FIR of the electrochromic device 2000 including the electrical connection part according to the first embodiment is modified. can

Referring to FIG. 29 , the first electrode layer 2200 may be positioned on the substrate 2100 . A first electrode layer 2200 arrangement region and a first insulating region FIR may be formed on the substrate 2100 . The first insulating region FIR may be a region without the first electrode layer 2200 . The first insulating region FIR may be a region on the substrate 2100 without the first electrode layer 2200 . The first electrode layer 2200 may include a 1-1 electrode layer 2200 ′ divided by a first insulating region FIR and a region without the first electrode layer 2200 by the first insulating region FIR. have.

The first electrode layer 2200 may be positioned on one region of the substrate 2100 and not on the other region of the substrate 2100 . In other words, the substrate 2100 may include a region in which the first electrode layer 2200 is disposed and a region in which the first electrode layer 2200 is not disposed.

A first conductor 2810 may be positioned on the 1-1 electrode layer 2200 ′. The first conductor 2810 may be positioned on the first-first electrode layer 2200 ′ to be in physical contact. A second conductor 2820 may be positioned in the first insulating region FIR. The second conductor 2820 may be placed in physical contact with the upper surface of the substrate 2100 without the first electrode layer 2200 by the first insulating region FIR.

The electrochromic medium 2300 may be positioned on the first electrode layer 2200 arrangement area. The electrochromic medium 2300 may be located on one area of the first electrode layer 2200 arrangement area and not on the other area of the first electrode layer 2200 arrangement area. In other words, the region on which the electrochromic medium 2300 is disposed and the region where the electrochromic medium 2300 is not disposed may be included on the region where the first electrode layer 2200 is disposed.

A region in which the electrochromic medium 2300 is disposed and a second insulating region SIR may be formed in the region where the first electrode layer 2200 is disposed. The second insulating region SIR may be a region without at least one layer of the electrochromic medium 2300 . The second insulating region SIR may be a region in which at least one layer of the electrochromic medium 2300 is absent on the first electrode layer 2200 .

In the first insulating region FIR, a region in which the electrochromic medium 2300 is disposed and a second insulating region SIR may be formed. The second insulating region SIR may be a region without at least one layer of the electrochromic medium 2300 . The second insulating region SIR includes a region without at least one of the electrochromic medium 2300 on the first electrode layer 2200 and at least one of the electrochromic medium 2300 on the first insulating region FIR. It may include regions without layers.

The first insulating region FIR and the second insulating region SIR may correspond to each other. The region in which the first insulating region FIR is formed and the region in which the second insulating region SIR is formed may include the same region. The first insulating region FIR and the second insulating region SIR may overlap. A second insulating region SIR may be formed in a portion of a position where the first insulating region FIR is formed. The first insulating region FIR may have an overlapping region with the second insulating region SIR. For example, the overlapping region may be a region in which a specific material is deposited on the first insulating region FIR formed through laser patterning, and the material deposited by the second insulating region SIR formed through laser patterning is removed again. have. The material removed by the second insulating region SIR may include a material constituting the second electrode layer 2400 . The material removed by the second insulating region SIR may include a material constituting the second electrode layer 2400 and a material constituting the electrochromic layer 2330 . The material removed by the second insulating region SIR may include a material constituting the second electrode layer 2400 , a material constituting the electrochromic layer 2330 , and a material constituting the electrolyte layer 2320 . . The material removed by the second insulating region SIR includes a material constituting the second electrode layer 2400, a material constituting the electrochromic layer 2330, a material constituting the electrolyte layer 2320, and an ion storage layer ( 2310) may be included.

Referring to FIG. 29 , the second insulating region SIR is formed through a laser patterning device set to remove up to the ion storage layer 2310 , and the second insulating region SIR does not overlap the first insulating region FIR. ) is removed to the ion storage layer 2310 and positioned on the first electrode layer 2200 , and the second insulating region SIR overlapping the first insulating region FIR flows into the first insulating region FIR. The ion storage layer 2310 may be removed and positioned on the substrate 2100 .

Alternatively, the second insulating region SIR is formed through a laser patterning device set to remove the upper material of the first electrode layer 2200 , so that the second insulating region SIR does not overlap the first insulating region FIR. The silver ion storage layer 2310 is removed, and the second insulating region SIR overlapping the first insulating region FIR leaves a portion of the ion storage layer 2310 flowing into the first insulating region FIR and the upper portion thereof. It may be formed in a form in which is removed.

The electrochromic medium 2300 may include a first electrochromic medium 2300' and a second electrochromic medium 2300" divided by a second insulating region SIR. First electrochromic medium 2300 '), a 2-1-th electrode layer 2400' may be positioned. A second-second electrode layer 2400" may be positioned on the second electrochromic medium 2300". The electrochromic medium 2300 and The second electrode layer 2400 may share the second insulating region SIR.

The first conductor 2810 positioned on the 1-1 electrode layer 2200 ′ penetrates the first electrochromic medium 2300 ′ and the 2-1 electrode layer 2400 ′ to form an upper portion of the second electrode layer 2400 . can protrude from The second conductor 2820 positioned on the substrate 2100 without the first electrode layer 2200 penetrates the second electrochromic medium 2300" and the 2-2 electrode layer 2400" to penetrate the second electrode layer 2400. ) can protrude upwards. The first conductor 2810 may have a contact surface surrounded by the electrochromic medium 2300 . A side surface of the first conductor 2810 may have a contact surface surrounded by the first electrochromic medium 2300 ′. The second conductor 2820 may have a contact surface surrounded by the electrochromic medium 2300 . A side surface of the second conductor 2820 may have a contact surface surrounded by the second electrochromic medium 2300 ″.

According to an embodiment of the present application, a portion of the constituent materials of the electrochromic medium 2300 may be positioned in the first insulating region FIR. The ion storage layer 2310 may flow into the first insulating region FIR. A material constituting the ion storage layer 2310 may be filled in the first insulating region FIR. The ion storage layer 2310 may be formed to have a gradient due to the first insulating region FIR. As a specific example, the ion storage layer 2310 on the first electrode layer 2200 may be positioned higher than the ion storage layer 2310 filled in the first insulating region FIR. In other words, the ion storage layer 2310 on the first electrode layer 2200 may be located relatively farther from the substrate 2100 than the ion storage layer 2310 filled in the first insulating region FIR. According to the gradient formed in the ion storage layer 2310, a gradient may be formed in the electrolyte layer 2320, the electrochromic layer 2330, and the second electrode layer 2400 according to the line in which the first insulating region FIR is positioned. There is (see Fig. 29).

According to the exemplary embodiment of the present application, some of the constituent materials of the electrochromic medium 2300 are located in one region of the first insulating region FIR, and the electrochromic medium 2300 is located in another region of the first insulating region FIR. ), some of the constituent materials may not be located. The ion storage layer 2310 may flow into a region of the first insulating region FIR that does not correspond to the second insulating region SIR to be filled with a material constituting the ion storage layer 2310 . An electrolyte layer 2320 , an electrochromic layer 2330 , and a second electrode layer 2400 may also be sequentially disposed on the introduced ion storage layer 2310 .

The electrochromic medium 2300 including the electrochromic layer 2330 is removed from the region corresponding to the second insulating region SIR among the first insulating region FIR, and the ion storage layer is formed on the first insulating region FIR. The electrochromic module 3000 may be configured in a form in which a material corresponding to 2310 is present but the layer formed on the ion storage layer 2310 is removed (see FIG. 29 ).

Alternatively, the electrochromic medium 2300 including the ion storage layer 2310 is removed from the region corresponding to the second insulating region SIR of the first insulating region FIR, and the electrochromic medium 2300 corresponding to the electrochromic medium 2300 is removed. Substances may not be present or may be insignificant due to process errors.

According to another embodiment of the present application, none of the constituent materials of the electrochromic medium 2300 may be located in the first insulating region FIR. As a specific example, when the first insulating region FIR is formed by using a mask to cover a position corresponding to the first insulating region FIR and depositing the electrochromic medium 2300 and the second electrode layer 2400 , None of the constituent materials of the electrochromic medium 2300 may be located in the first insulating region FIR (not shown).

According to the electrical characteristics applied to the first conductor 2810 and the second conductor 2820 , the electrical characteristics between the first electrode layer 2200 and the second electrode layer 2400 are controlled, so that the electrochromic The optical properties of the medium 2300 may be adjusted. Depending on the electrical characteristics applied to the first conductor 2810 and the second conductor 2820 , the electrical characteristics between the first-first electrode layer 2200 ′ and the second second electrode layer 2400 ″ vary. Controlled, the optical properties of the electrochromic medium 2300 can be adjusted. Even when a voltage between the 1-1 electrode layer 2200' and the 2-2 electrode layer 2400" is applied, the first insulating region ( In the electrochromic medium 2300 on the FIR), some movement of ions in the transverse direction also occurs, so that the lower active region AR may also include an upper portion of the first insulating region FIR. According to an embodiment of the present application, when a voltage is applied to the electrochromic medium 2300 , the movement of ions in the vertical direction rather than movement of the ions in the horizontal direction occurs more actively, so that the first 1-1 of the active area AR A discoloration rate of an upper portion of the electrode layer 2200 ′ and an upper portion of the first insulating region FIR may be different.

According to the exemplary embodiment of the present application, a region divided by the second insulating region SIR and in which the second conductor 2820 is located may be defined as the active region AR. A region that is separated by the second insulating region SIR and where the second conductor 2820 is not located may be defined as the non-active region NAR. When viewed from the lower surface of the substrate 2100 , a degree of discoloration at a position corresponding to the active area AR may be significantly different from a degree of discoloration at a location corresponding to the non-active area NAR.

According to another embodiment of the present application, the second insulating region SIR may be formed in a form in which only a portion of the electrochromic layer 2330 of the electrochromic medium 2300 is removed. The second insulating region SIR may be formed to control only a portion of the electrochromic layer 2330 and the second electrode layer 2400 . In this case, the active region AR is divided by the second insulating region SIR and the second conductor 2820 is located, and the second insulating region SIR is divided by the second conductor 2820 . The non-active area NAR may show a slight difference in the degree of discoloration.

Referring back to FIG. 28 , the first insulating region FIR may be formed to have a closed shape when viewed from the top surface of the electrochromic device 2000 . The first insulating region FIR may be formed to form a closed curve when viewed from the top surface of the electrochromic device 2000 . The second insulating region SIR may be formed to have a closed shape when viewed from the top surface of the electrochromic device 2000 . The second insulating region SIR may be formed to form a closed curve when viewed from the top of the electrochromic device 2000 .

The first insulating region FIR may have an overlapping region with the second insulating region SIR. Referring to FIG. 28 , the first insulating region FIR and the second insulating region SIR may be formed so that the lower side of the first insulating region FIR coincides with the lower side of the second insulating region SIR. have. The second insulating region SIR may correspond to the shape of the substrate 2100 . The second insulating region SIR may be formed in a line corresponding to the shape of the substrate 2100 . The first insulating region FIR may be positioned inside the closed shape in which the second insulating region SIR is formed. A second insulating region may be formed outside the closed shape formed by the first insulating region FIR.

The first insulating region FIR may have a filled shape. For example, the first insulating region FIR may be a region formed by removing the ion storage layer 2310 in an internal space defined by the edge of the first insulating region FIR.

The first conductor 2810 may be positioned outside the closed shape formed by the second insulating region SIR. The first conductor 2810 may be formed in a shape corresponding to the closed shape formed by the second insulating region SIR. Alternatively, the second conductor 2810 may be positioned outside the second insulating region SIR in the form of a bus bar line. The second conductor 2810 may be located inside the closed shape formed by the first insulating region FIR.

According to another embodiment of the present application, the second insulating region SIR may be formed in a shape having a closed shape and a region protruding toward one edge. For example, the second insulating region SIR may be formed to have a region protruding toward one edge of the substrate 2100 by a size corresponding to the first insulating region FIR. In this case, the upper side of the first insulating region FIR coincides with a line that is not a protruding region among the closed shapes of the second insulating region SIR, and the lower side of the first insulating region FIR has the second insulating region ( SIR) may coincide with a line that is a protruding region among the closed shapes. As a specific example, the second insulating region SIR may be formed to surround three sides of the first insulating region FIR. The other side of the first insulating region FIR may be located inside the closed shape of the second insulating region SIR.

3.3 Manufacturing process of electrochromic device including electrical connection part

30 is a flowchart for explaining a process of manufacturing the electrochromic device 2000 according to the first and/or second embodiments.

Preparation of the electrochromic device 2000 includes preparing a substrate (S1100), forming a first electrode layer (S1200), forming a first insulating region (S1810), forming a first conductor and a second conductor (S1900), and forming an electrochromic medium ( S1300 ), forming a first electrode layer ( S1400 ), and forming a second insulating region ( S1820 ) may be included.

When the first electrode layer is formed on the substrate 2100 ( S1200 ) after the substrate 2100 is prepared ( S1100 ), a portion of the first electrode layer 2200 is removed to form a first insulating region FIR ( S1810 ). )can do. In operation S1810 , at least one first insulating region FIR may be formed.

For example, the first insulating region FIR may be formed to correspond to a closed edge line. The first insulating region FIR is formed by laser etching a region of the first electrode layer 2200 in the form of a closed curve so as to be divided into a 1-1 electrode layer 2200 ′ and a 1-2 electrode layer 2200 ″. As a specific example, the first insulating region FIR may be formed as shown in FIG.

As another example, the first insulating region FIR may be formed to correspond to a closed line and an internal space. The first insulating region FIR is such that the first electrode layer 2200 is divided into the 1-1 electrode layer 2200 ′ and the first insulating region FIR from which the first electrode layer 2200 is removed, the first electrode layer ( 2200) may be a region formed by laser etching in a form in which one region is completely removed. As a specific example, the first insulating region FIR may be formed as shown in FIG. 29 .

A first insulating region FIR may be formed ( S1810 ), and a first conductor 2810 and a second conductor 2820 may be formed ( S1900 ). The first conductor 2810 and the second conductor 2820 may be formed by applying Ag paste using an inkjet printing method.

For example, the first conductor 2810 may be formed on the first electrode layer 2200 . The second conductor 2810 may be formed on the first electrode layer 2200 . In step S1900, a first conductor 2810 is formed on the 1-1 electrode layer 2200' divided by the first insulating region FIR formed in step S1810, and on the 1-2 electrode layer 2200". A second conductor 2810 may be formed.

As another example, the first conductor 2810 may be formed on the first electrode layer 2200 . The second conductor 2810 may be formed on the substrate 2100 . In step S1900 , a first conductor 2810 is formed on the 1-1 electrode layer 2200 ′, which is divided by the first insulating region FIR formed in step S1810 , and the first conductor 2810 is formed by the first insulating region FIR. A second conductor 2820 may be formed on the substrate 2100 from which the first electrode layer 2200 has been removed.

According to an embodiment of the present application, after forming the first conductor and the second conductor ( S1900 ), it is also possible to form the first insulating region ( S1810 ).

An electrochromic medium may be formed (S1300). An electrochromic medium may be formed on the first electrode layer 2200 , the first conductor 2810 , and the second conductor 2820 ( S1300 ).

For example, the formation of the electrochromic medium ( S1300 ) may be performed by forming the ion storage layer 2310 , forming the electrolyte layer 2320 , and forming the electrochromic layer 2330 . As another example, the formation of the electrochromic medium ( S1300 ) may be performed by the formation of the electrochromic layer 2330 , the formation of the electrolyte layer 2320 , and the formation of the ion storage layer 2310 .

A second electrode layer 2400 may be formed on the electrochromic medium 2300 ( S1400 ). The second electrode layer 2400 may be formed on the electrochromic medium 2300 , the first conductor 2810 , and the second conductor 2820 .

According to an embodiment of the present application, when the electrochromic medium 2300 is formed (S1400), an additional layer 5000 to be described below may be formed. In other words, the ion storage layer 2310 is formed on the first electrode layer, the electrolyte layer 2320 is formed on the ion storage layer 2310 , and the electrochromic layer 2330 is formed on the electrolyte layer 2320 . When this forming step is performed, when the ion storage layer 2310, the electrolyte layer 2320, and the electrochromic layer 2330 are sequentially stacked on the first electrode layer 2200, the first conductor 2810 A first layer made of a material included in the ion storage layer 2310, a second layer made of a material included in the electrolyte layer 2320, and the electric A third layer made of a material included in the color-changing layer 2330 may be sequentially stacked.

A second insulating region SIR may be formed. A second insulating region SIR may be formed by removing a partial region of the second electrode layer 2400 . A second insulating region SIR may be formed by removing a partial region of the second electrode layer 2400 and a partial region of the electrochromic medium 2300 .

According to an embodiment of the present application, the second insulating region SIR may be formed to correspond to the first insulating region FIR. The second insulating region SIR may be formed to have a region overlapping the first insulating region FIR. When the second insulating region SIR is performed by laser patterning, the laser patterning of the second insulating region SIR is performed such that some of the first paths passed by the laser when the first insulating region FIR is formed. This can be done.

The first insulating region FIR may be formed such that the first electrode layer 2200 is removed, and the second insulating region SIR may be formed such that the first electrode layer 2200 is maintained. For example, the first insulating region FIR is formed such that the first electrode layer 2200 is removed, and the second insulating region SIR includes the second electrode layer 2400 , the electrochromic layer 2330 , and the electrolyte layer 2320 . and the ion storage layer 2310 may be removed.

For example, the second insulating region SIR may be formed to correspond to a closed-shaped edge line. The second insulating region SIR may be formed in a form in which a partial region of the second electrode layer 2400 is removed. Alternatively, the second insulating region SIR may be formed in a form in which partial regions of the second electrode layer 2400 and the electrochromic medium 2300 are removed. For example, the second insulating region SIR may be formed by removing a partial region of the electrochromic layer 2330 and a partial region of the second electrode layer 2400 . As another example, the second insulating region SIR may be formed by removing a partial region of the electrolyte layer 2320 , a partial region of the electrochromic layer 2330 , and a partial region of the second electrode layer 2400 . As another example, the second insulating region SIR includes a partial region of the ion storage layer 2310 , a partial region of the electrolyte layer 2320 , a partial region of the electrochromic layer 2330 , and a part of the second electrode layer 2400 . It may be formed in a form in which the region is removed.

4. Electrical connection part of electrochromic module

4.1 Electrical connection of electrochromic module

31 is a view for explaining an electrochromic module including an electrical connection part according to an embodiment of the present application.

A protective layer 2500 and/or a protective film 2600 may be formed on the electrochromic device including the above-described electrical connection part. The protective layer 2500 and/or the protective film 2600 may be formed on the electrochromic device including the electrical connection part according to the first embodiment, and protection is also provided on the electrochromic device including the electrical connection part according to the second embodiment. A layer 2500 and/or a protective film 2600 may be formed.

However, hereinafter, a specific structure and a method of forming the electrical connection structure will be described in detail, taking the case in which the protective layer 2500 is formed on the electrochromic device including the electrical connection part according to the first embodiment. This is because, in the description of the “protective layer 2500 ,” the electrochromic element including the electrical connection according to the first embodiment and the electrochromic element including the electrical connection according to the second embodiment are almost the same, and thus overlap description has been omitted.

Referring to FIG. 31 , when the protective layer 2500 is formed on the electrochromic device 2000 , the protective layer 2500 may also be formed in the second insulating region SIR. When the protective layer 2500 is formed on the electrochromic device 2000 , the protective layer 2500 may also be formed on the first conductor 2810 and the second conductor 2820 .

32 is an enlarged view of the second insulating region SIR and peripheral portions of the second insulating region SIR to explain the protective layer 2500 formed in the second insulating region SIR.

Due to the second insulating region SIR, the electrochromic device 2000 has at least a first upper surface (FUS) at a position having a first thickness and a second upper surface (SUS) at a position having a second thickness. Second Upper Surface). The first thickness may correspond to the sum of the thicknesses of the substrate 2100 , the first electrode layer 2200 , the electrochromic medium 2300 , and the second electrode layer 2400 . The second thickness may correspond to the sum of the thicknesses of the substrate 2100 and the first electrode layer 2200 . Alternatively, the second thickness is greater than the sum of the thicknesses of the substrate 2100 and the first electrode layer 2200, but the substrate 2100, the first electrode layer 2200, the electrochromic medium 2300, and the second electrode layer 2400) may be less than the sum of the thicknesses of The first thickness may be greater than the second thickness.

The first upper surface FUS and the second upper surface SUS may be connected by a connection surface. The connection surface may be a thickness adjustment section between the first upper surface FUS and the second upper surface SUS.

A protective layer 2500 may be formed on the upper surface of the electrochromic device 2000 and the second insulating region SIR. A protective layer 2500 may be formed on the first upper surface FUS, the second upper surface SUS, and the connection surface.

The protective layer 2500 may be formed to have substantially the same thickness. For example, the thickness of the passivation layer 2500 on the first upper surface FUS may be the same as the thickness of the passivation layer 2500 on the second upper surface SUS. The thickness of the protective layer 2500 on the first upper surface FUS may be the same as the thickness of the protective layer 2500 on the connection surface. The thickness of the protective layer 2500 on the second upper surface SUS may be the same as the thickness of the protective layer 2500 on the connection surface.

However, the protective layer 2500 may be formed to have a different thickness at the intersection point CSP. For example, the thickness of the protective layer 2500 at the intersection point CSP of the first upper surface FUS and the connection surface may be smaller than the thickness of the protective layer 2500 formed on the first upper surface FUS. have. A thickness of the protective layer 2500 at the intersection CSP of the second upper surface SUS and the connection surface may be greater than a thickness of the protective layer 2500 formed on the second upper surface SUS.

The protective layer 2500 is formed so that the thickness of the protective layer 2500 at the intersection point CSP of the second upper surface SUS and the connection surface has a relatively thick thickness, and at both ends of the thickness adjustment section. It is possible to more reliably prevent the outflow of discoloration ions.

33 is an electrochromic element 2000 and a protective layer ( 2500) is a FIB (Focused Ion Beam) image of the electrochromic module 3000 including.

A first electrode layer 2200 , an electrochromic layer 2330 , an electrolyte layer 2320 , an ion storage layer 2310 , and a second electrode layer 2400 are formed on the substrate 2100 , and a second electrode layer 2400 . A second insulating region SIR was formed by removing a partial region of the .

After the formation of the second insulating region (SIR), the protective layer 2500 is formed, and an FIB image of the corresponding electrochromic module 3000 is taken to determine the thickness of the protective layer 2500 at the intersection and the second upper surface. It was confirmed that the thickness of the protective layer 2500 of

Specifically, an ITO layer 2200, a WO _x layer 2330, a TaO _y layer 2320, an IrTaO _z layer 2310, and an Al layer 2400 are deposited on the glass substrate 2100 through a sputtering process. did Thereafter, a portion of the Al layer 2400 was laser etched to form a first top surface at a position where the electrochromic device 2000 had a relatively thicker thickness and a second top surface at a position where the thickness of the electrochromic device 2000 was relatively thin. Thereafter, a protective layer 2500 was formed on the electrochromic device 2000 in a multi-layered manner through an ALD process. Thereafter, an FIB image of the manufactured electrochromic module 3000 was taken.

In the target region TR on the FIB image, the thickness of the protective layer formed on the top surface (ie, the second top surface) of the IrTaO _z layer on which the Al layer is not formed is at the intersection point (ie, the IrTaO _z layer and the Al layer) It was confirmed that the protective layer formed at the intersection of the first upper surface and the connecting surface) was thinner than the thickness.

Accordingly, as demonstrated herein, the thickness of the protective layer 2500 at the intersection of the second upper surface and the connection surface may be thicker than the thickness of the protective layer 2500 on the second upper surface, and through this, the second insulation The effect of reducing the outflow of color-changing ions at the intersection formed by the region SIR may be derived.

FIG. 34 is an upper region (CUR, Conductor This is an enlarged view of the Upper Region.

In the case of the electrochromic device 2000 including an electrical connection portion for forming the first conductor 2810 and the second conductor 2820 first, and forming the electrochromic medium 2300, the first conductor 2810 And on the second conductor 2820 , a layer corresponding to the constituent materials of the first electrode layer 2200 , the electrochromic medium 2300 , and the second electrode layer 2400 may be formed.

Layers corresponding to the constituent materials of the first electrode layer 2200, the electrochromic medium 2300, and the second electrode layer 2400 described above may be formed on the first conductor 2810, and the second conductor ( 2820) may also be formed. However, hereinafter, an additional layer formed on the upper surface of the second conductor 2820 will be described with reference to FIG. 34 , which is an enlarged upper surface of the second conductor 2820 . This is because the shape formed on the top surface of the first conductor 2810 and the shape formed on the top surface of the second conductor 2820 are almost the same in describing the “additional layer 5000 ”, so the description is duplicated. is omitted.

Referring to FIG. 34 , an additional layer 5000 may be formed on the second conductor 2820 . The additional layer 5000 is formed on the first conductor 2810 and the second conductor 2820 by at least one of the constituent materials of the first electrode layer 2200 , the electrochromic medium 2300 , and the second electrode layer 2400 . may include For example, the additional layer 5000 may include one layer made of a material constituting the first electrode layer 2200 . For a specific example, if the first electrode layer 2200 is an ITO layer, the additional layer 5000 may include an ITO layer. As another example, the additional layer 5000 may include one layer made of a material constituting the electrochromic medium 2300 . As a specific example, when the electrochromic medium 2300 includes an IrTaO _x layer 2310 , a TaO _y layer 2320 and a WO _z layer 2330 , the additional layer 5000 may include an IrTaO _x layer. can As another example, the additional layer 5000 is a layer made of the constituent material of the first electrode layer 2200 , a layer made of the constituent material of the electrochromic medium 2300 , and a layer made of the constituent material of the second electrode layer 2400 . may include As a specific example, when the first electrode layer 2200 is ITO, the electrochromic medium 2300 is an IrTaO _x layer, a TaO _y layer, and a WO _z layer, and the second electrode layer 2400 is an Al layer, the additional layer 5000 ) may include an ITO layer, an IrTaO _x layer, a TaO _y layer, a WO _z layer and an Al layer.

The additional layer 5000 may correspond to the size of the upper surface of the second conductor 2820 . For example, the additional layer 5000 may be formed only on the upper surface of the second conductor 2820 . As another example, the additional layer 5000 may also be formed on the upper surface of the second conductor 2820 and the side surface of the second conductor 2820 . The additional layer 5000 may be located in a partial region of the second conductor 2820 protruding toward the second electrode layer 2400 .

A protective layer may also be formed on the electrochromic device 2000 on which the additional layer 5000 is formed. The protective layer 5000 is on the upper surface of the additional layer 5000 , the side surface of the additional layer 5000 , the side surface of the second conductor 2820 protruding toward the second electrode layer 2400 , and the upper surface of the second electrode layer 2400 . can be formed.

35 is a FIB (Focused Ion Beam) image of the electrochromic module 3000 including the electrochromic element 2000 and the additional layer 5000 to explain the additional layer 5000 formed on the upper surface of the conductor. .

On the substrate 2100, a conductor is first formed, an electrochromic medium 2300 is formed, and an FIB image of the upper surface of the conductor is taken, and the material of the electrochromic medium 2300 is corresponded to the upper surface of the conductor It was confirmed that the additional layer 5000 was formed.

Specifically, Ag paste is formed on the substrate 2100 by an inkjet method to form a conductor, and the WO _x layer 2330, TaO _y layer 2320, IrTaO _z is formed on the substrate 2100 including the conductor. Layer 2310 was deposited through a sputtering process. Thereafter, an FIB image of the conductor side of the substrate 2000 was taken.

In the target region TR on the FIB image, it was confirmed that the additional layer 5000 corresponding to the EC material was formed on the Ag paste (ie, the conductor). The additional layer 5000 is a portion deposited together with the electrochromic medium 2300, and includes the same layers having the same material.

Accordingly, as demonstrated herein, in the electrochromic device 2000 produced according to the process described with reference to FIG. 30 , the additional layer 5000 may be formed on the conductor.

4.2 Electrical connection structure using conductive film

As already described, the first conductor 2810 and the second conductor 2820 may be electrically connected to the control module 1000 .

At this time, an electrical connection path may be formed between the conductor and the control module 1000 in the form of soldering a wire connected to the control module 1000 to the conductor itself, but the conductor and the control module 1000 A circuit board 2900 is placed between the circuit board 2900 and the circuit board 2900 is connected with a conductor through a conductive medium (eg, a conductive film), and the control module 1000 and An electrical connection path may be formed in the form of soldering the connected wires.

By adopting this method, it is possible to prevent direct soldering to the conductor, and it is possible to prevent damage to elements adjacent to the conductor by soldering or the like.

36 is a perspective view of an electrochromic module to which a circuit board 2900 is attached according to an embodiment. 37 is an exploded view of an electrochromic device to which a circuit board 2900 is attached according to an embodiment.

A conductive film 2700 and a circuit board 2900 may be attached to the electrochromic module 3000 on which the first conductor 2810 and the second conductor 2820 are formed.

The conductive film 2700 may be in physical contact with one region of the first conductor 2810 and one region of the second conductor 2820 . The conductive film 2700 is in physical contact with the protrusion of the first conductor 2810 on the second electrode layer 2400 and the protrusion of the second conductor 2820 on the second electrode layer 2400 . can do.

The conductive film 2700 may contact one region of the first conductor 2810 and one region of the second conductor 2820 by an external force. The conductive film 2700 may be in contact with one region of the first conductor 2810 and one region of the second conductor 2820 by applying heat or pressure to penetrate the additional layer 5000 . . Heat or pressure is applied to the conductive film 2700 to penetrate the additional layer 5000 , and the protrusion of the first conductor 2810 onto the second electrode layer 2400 and the second conductor 2820 . may be in physical contact with the protrusion on the second electrode layer 2400 .

The circuit board 2900 may contact the conductive film 2700 . The circuit board 2900 may be electrically connected to the first conductor 2810 and the second conductor 2820 through the conductive film 2700 .

38 is a cross-sectional view taken along line B-B′ of the electrochromic module 3000 to which the circuit board 2900 is attached.

The conductive film 2700 may include a region having conductivity. The conductive film 2700 may be a conductor having conductivity in one direction, but insulation in another direction other than one direction. That is, the conductive film 2700 may be a kind of anisotropic conductor (ACF, Anistropic Conducting Film).

The conductive film 2700 may include a base 2710 and a plurality of conductive balls 2730 . The conductive ball 2730 may have conductivity. The base 2710 defines an external shape of the conductive film 2700 , and the conductive ball 2730 may be embedded in the base 2710 .

The conductive ball 2730 may have an insulating surface 2733 having insulation and a conductive interior 2731 having conductivity. For example, the conductive inner 2731 may include a conductive material such as gold, silver, nickel, and copper, and the insulating surface 2733 may include an insulating material such as an insulating organic polymer.

The conductive film 2700 may have a property of being electrically insulated in one direction, and may have a property of being electrically conductive in the other direction other than one direction. The conductive film 2700 may have conductivity in a first direction and insulation in a second direction. In this case, the first direction may be a direction that electrically connects the circuit board 2900 and the first conductor 2810 . The first direction may be a direction in which the first terminal 2811 of the circuit board 2900 and the first conductor 2810 are electrically connected. The first direction may be a direction in which the circuit board 2900 and the second conductor 2820 are electrically connected. The first direction may be a direction in which the second terminal 2813 of the circuit board 2900 and the second conductor 2820 are electrically connected. The second direction may be a direction connecting the conductive ball 2730 on the first conductor 2810 and the conductive ball 2730 on the second conductor 2820 .

The conductive balls 2730 may be randomly disposed on the base 2710 . Alternatively, the conductive ball 2730 may be uniformly positioned on the base 2710 .

The circuit board 2900 may be a board including at least a first terminal 2911 and a second terminal 2913 . The first terminal 2911 and the second terminal 2913 may perform a function of electrically connecting the control module 1000 and the electrochromic device 2000 . Specifically, the first terminal 2911 may perform a function of electrically connecting the control module 1000 and the first electrode layer 2200 of the electrochromic device 2000 . The second terminal 2913 may perform a function of electrically connecting the control module 1000 and the second electrode layer 2400 of the electrochromic device 2000 .

The circuit board 2900 may be a flexible printed circuit board (FPCB) made of a material having flexibility.

Although not shown, a third terminal electrically connected to the first terminal 2911 may be formed in one region of the circuit board 2900 . Since the first terminal 2911 is already connected to the first conductor 2810 , it is not easy to solder the wire connected to the control module 1000 , and the third terminal connects the first terminal 2911 to the first terminal 2911 . Instead, it can be used for soldering. A fourth terminal electrically connected to the second terminal 2913 may be formed in one region of the circuit board 2900 . Since the first terminal 2913 is already connected to the second conductor 2920 , it is not easy to solder the wire connected to the control module 1000 , and the fourth terminal connects the second terminal 2913 to the second terminal 2913 . Instead, it can be used for soldering.

The first conductor 2810 may be electrically connected to the first terminal 2911 of the circuit board 2900 through one region of the conductive film 2700 . The first conductor 2810 is to be electrically connected to the first terminal 2911 of the circuit board 2900 through a region in which the conductive balls 2730 of the conductive film 2700 form an electrical path between each other. can

The second conductor 2820 may be electrically connected to the second terminal 2913 of the circuit board 2900 through one region of the conductive film 2700 . The second conductor 2820 is to be electrically connected to the second terminal 2913 of the circuit board 2900 through a region in which the conductive balls 2730 of the conductive film 2700 form an electrical path between each other. can

The conductive ball 2730 to which the second conductor 2820 is electrically connected and the conductive ball 2730 to which the first conductor 2810 is electrically connected may be in different groups.

The control module 1000 may apply driving power through the first terminal 2911 and the second terminal 2913 . The control module 1000 may control a voltage applied between the first terminal 2911 and the second terminal 2913 . The control module 1000 may control the voltage applied between the third terminal and the fourth terminal of the circuit board 2900 . The control module 1000 may control the optical characteristics of the electrochromic device 2000 through the first terminal 2911 and the second terminal 2913 .

Even when the protective layer 2500 and the additional layer 5000 are formed on the first conductor 2810 and the second conductor 2820 , the pressure applied when the conductive film 2700 is attached Due to (and/or heat), an electrical path between 1) the first conductor 2810 and the second conductor 2820 and 2) the conductive film 2700 may be sufficiently formed.

39 is a flowchart of a process of forming an electrical connection structure according to an embodiment.

After the electrochromic device is manufactured ( S1000 ) and a protective layer is formed on the electrochromic device ( S2000 ), an electrical connection structure may be formed ( S3000 ).

A conductive film 2700 may be disposed 3100 on the electrochromic module 3000 . For example, the conductive film 2700 may be attached to the electrochromic module 3000 in a form of thermocompression bonding the conductive film 2700 on the upper portions of the first conductor 2810 and the second conductor 2820 . have. As another example, in the form of thermocompression bonding the first conductive film 2700 on the upper part of the first conductor 2810 and thermocompression bonding the second conductive film 2700 on the upper part of the second conductor 2820, the The conductive film 2700 may be attached to the electrochromic module 3000 .

Due to the pressure (and/or heat) applied to the conductive film 2700 , a contact between the conductive interior parts 2731 of the conductive balls 2730 may be induced. Due to the pressure (and/or heat) applied to the conductive film 2700 , a directional electrical path through the conductive ball 2730 may be formed.

An electrical connection between the conductive film 2700 and the first conductor 2810 may be formed by placing the conductive film 2700 on the upper surface of the first bus bar and post-processing. Due to the pressure (and/or heat) applied to the conductive film 2700 , it penetrates through the material (ie, the additional layer 5000 and the protective layer 2500 ) located on the upper surface of the first conductor 2810 , An electrical connection may be formed between the film 2700 and the first conductor 2810. The conductive film 2700 is placed on the upper surface of the second bus bar and the conductive film 2700 and the second conductive film 2700 are post-processed. It is possible to form an electrical connection between the two conductors 2820. Due to the pressure (and/or heat) applied to the conductive film 2700, a material (that is, on the upper surface of the second conductor 2820) An electrical connection between the conductive film 2700 and the second conductor 2820 may be formed through the additional layer 5000 and the protective layer 2500 .

After the conductive film 2700 is attached, the circuit board 2900 may be disposed ( S3300 ). For example, the circuit board 2900 may be thermocompressed onto the conductive film 2700 and attached to the electrochromic module 3000 through the conductive film 2700 .

The circuit board 2900 may be in physical contact with the conductive film 2700 . The first terminal 2911 of the circuit board 2900 may electrically contact the first conductor 2810 through the conductive film 2700 . The second terminal 2913 of the circuit board 2900 may electrically contact the second conductor 2820 through the conductive film 2700 .

In the above, the configuration and characteristics of the present application have been described based on the embodiments according to the present application, but the present application is not limited thereto, and it is understood that various changes or modifications can be made within the spirit and scope of the present application. It is intended that such changes or modifications will be apparent to those skilled in the art, and therefore fall within the scope of the appended claims.

As described above, in the best mode for carrying out the invention, related matters have been described.

Claims (23)

1. An electrochromic module comprising an electrochromic element and a protective layer, the electrochromic module comprising:

   The electrochromic element is

   A lower surface of the substrate of the electrochromic device, including a substrate, a first electrode layer positioned on the substrate, an electrochromic medium positioned on the first electrode layer, and a second electrode layer positioned on the electrochromic media; An upper surface of the second electrode layer and a side surface of the electrochromic element have a boundary region,

   The protective layer has a property of having a low moisture transmittance compared to the substrate, the first electrode layer, the second electrode layer, and the electrochromic medium,

   The substrate is transparent, and when viewed from the lower surface of the substrate, a change in the optical properties of the electrochromic medium is confirmed,

   The protective layer is disposed on an upper surface of the second electrode layer and a side surface of the electrochromic element, excluding the lower surface of the substrate, in the boundary region to prevent material movement between the electrochromic element and the external environment;

   The substrate has the thickest thickness among the first electrode layer, the second electrode layer, and the electrochromic medium,

   electrochromic module.
2. According to claim 1,

   The electrochromic medium includes an ion storage layer, an electrolyte layer and an electrochromic layer,

   electrochromic module.
3. 3. The method of claim 2,

   The electrochromic medium is

   a first region positioned on the first electrode layer and a second region positioned on a side surface of the first electrode layer;

   electrochromic module.
4. 4. The method of claim 3,

   The protective layer is formed to surround the electrochromic element, and the protective layer located on a side surface of the electrochromic element covers the second region of the electrochromic medium;

   electrochromic module.
5. 5. The method of claim 4,

   The electrochromic medium is

   The electrolyte layer is positioned on the ion storage layer, and the electrochromic layer is positioned on the electrolyte layer,

   electrochromic module.
6. 6. The method of claim 5,

   The ion storage layer is formed to surround the first electrode layer, the ion storage layer has a contact surface with the substrate,

   The electrolyte layer is formed to surround the ion storage layer, the electrolyte layer has a contact surface with the substrate,

   The electrochromic layer is formed to surround the electrolyte layer, the electrochromic layer having a contact surface with the substrate,

   electrochromic module.
7. 5. The method of claim 4,

   The first protective layer positioned on the second electrode layer and the second protective layer positioned on the side surface of the electrochromic element have substantially the same thickness;

   The first point of the first area and the second point of the second area have different thicknesses,

   electrochromic module.
8. 8. The method of claim 7,

   The first point is a point where the thickness of the electrochromic medium is greatest,

   The second point is a point where the thickness of the electrochromic medium is the smallest,

   a thickness of the electrochromic medium at the first point is greater than a thickness of the electrochromic medium at the second point;

   electrochromic module.
9. 9. The method of claim 8,

   A third point having the thickest thickness among the second regions is a point closest to the second electrode layer among the second regions,

   The thickness at the third point is smaller than the thickness at the first point,

   The second region has a tapered shape that decreases in thickness from the third point to the second point,

   electrochromic module.
10. 10. The method of claim 9,

    The distance between the second point and the first electrode layer is greater than the distance between the third point and the first electrode layer,

    electrochromic module.
11. According to claim 1,

    A protective film positioned on the protective layer; further comprising,

    The protective film is fixed to the first protective layer positioned on the second electrode layer, and is not fixed to the second protective layer positioned on the side surface of the electrochromic element,

    movement of the material through the side surface of the electrochromic element is inhibited through the protective layer;

    Movement of the material through the upper surface of the second electrode layer, which has a larger area than the side surface of the electrochromic element, is prevented through the protective layer and the protective film,

    The movement of the material includes the outflow of color-changing ions of the electrochromic element in the form of a compound,

    electrochromic module.
12. According to claim 1,

    The protective layer is formed through the ALD process, the gap (gap) between the protective layer and the second electrode layer is smaller than the gap between the protective film and the protective layer,

    electrochromic module.
13. According to claim 1,

    The protective layer includes a first layer and a second layer,

    The first layer comprises TiO2,

    wherein the second layer comprises Al2O3;

    electrochromic module.
14. 14. The method of claim 13,

    The protective layer is

    The first layer and the second layer are repeatedly laminated,

    electrochromic module.
15. According to claim 1,

    The protective layer includes a first layer and a second layer,

    The first layer is formed through a sputtering process,

    The second layer is formed through an ALD process,

    electrochromic module.
16. 17. The method of claim 16,

    The first layer comprises a SiN layer, an Al layer and a SiN layer,

    wherein the second layer comprises a TiO ₂ layer, an Al ₂ O ₃ layer, a TiO ₂ layer, an Al ₂ O ₃ layer, a TiO ₂ layer and an Al ₂ O ₃ layer,

    electrochromic module.
17. According to claim 1,

    wherein the substrate is a glass substrate and has at least one curved area, on which the protective layer is located;

    electrochromic module.
18. 18. The method of claim 17,

    The substrate includes a first curved surface and a second curved surface,

    The first curved surface is closer to the first electrode layer than the second curved surface,

    A protective layer is positioned on the first curved surface and the second curved surface,

    electrochromic module.
19. 19. The method of claim 18,

    The electrochromic medium is positioned on the first curved surface,

    The electrochromic medium is not located on the second curved surface,

    electrochromic module.
20. According to claim 1,

    The electrochromic element includes an insulating line formed to pass through at least the second electrode layer,

    The protective layer is formed in a space corresponding to the insulating line,

    electrochromic module.
21. 21. The method of claim 20,

    the insulating line passes through at least a portion of the second electrode layer and the electrochromic medium;

    The electrochromic element includes a first upper surface at a position having a first thickness, a second upper surface at a position having a second thickness, and a connection surface connecting the first upper surface and the second upper surface;

    the first thickness is greater than the second thickness;

    electrochromic module.
22. 22. The method of claim 21,

    A protective layer is formed on the first upper surface, the second upper surface, and the connection surface,

    The thickness of the protective layer at the intersection of the second upper surface and the connection surface is greater than the thickness of the protective layer formed on the second upper surface,

    electrochromic module.
23. According to claim 1,

    The second electrode layer is a reflective layer,

    electrochromic module.

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