WO2022039166A1 - Dustproof structure for alignment unit - Google Patents
Dustproof structure for alignment unit Download PDFInfo
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- WO2022039166A1 WO2022039166A1 PCT/JP2021/030064 JP2021030064W WO2022039166A1 WO 2022039166 A1 WO2022039166 A1 WO 2022039166A1 JP 2021030064 W JP2021030064 W JP 2021030064W WO 2022039166 A1 WO2022039166 A1 WO 2022039166A1
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- dust
- dustproof
- proof
- film
- frame body
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Definitions
- the present invention relates to a dustproof structure for an alignment unit.
- a mirror projection optical type exposure apparatus or the like As a batch exposure to such a large area, a mirror projection optical type exposure apparatus or the like has been put on the market.
- the basic configuration of a mirror projection optical exposure system consists of a large concave mirror, a small convex mirror, and a trapezoidal mirror manufactured with extreme processing accuracy.
- the photomask mounted on the upper part of the unit is irradiated with ultraviolet rays, and the circuit pattern on the photomask is transferred and exposed on the glass substrate after being reflected a plurality of times (for example, 5 times).
- AS method Alignment Scope method
- OAS method Off-axis Scope method
- the device that performs the above measurement by the AS method and / or the OAS method is called, for example, an alignment unit, and is used in combination with the exposure device.
- the measurement unit (lens unit) in the OAS method is located closer to the substrate stage than the measurement unit (lens unit) in the AS system, in the OAS system, when the exposure apparatus is driven (that is, the substrate stage). It is easily affected by dust generated during driving in the X and Y directions. Excessive influence of such dust causes a problem that accurate alignment becomes difficult. Therefore, for example, in the OAS method, it is conceivable to arrange a dustproof cover on the lens portion of the alignment unit. However, no suitable dustproof cover for the OAS type alignment unit has been proposed.
- the OAS alignment unit has different conditions such as spatial restrictions compared to the AS alignment and being affected by wind pressure due to the high-speed movement of the substrate stage.
- the pellicle to be used (a pellicle having a pellicle film on one side of the frame and an adhesive layer for masking on the other side) cannot be used as it is.
- the present invention has been proposed in view of such conventional circumstances, and an object of the present invention is to provide a dustproof structure suitable as a dustproof cover for an OAS type alignment unit.
- the frame that forms the opening and On one side of the frame, a dustproof film stretched and supported so as to cover the opening, It is a dustproof structure equipped with A dustproof structure for an alignment unit, comprising at least one of a fixing portion for mechanically fixing the dustproof structure to the alignment unit and a magnet for fixing the dustproof structure to the alignment unit.
- a dustproof structure for an alignment unit comprising at least one of a fixing portion for mechanically fixing the dustproof structure to the alignment unit and a magnet for fixing the dustproof structure to the alignment unit.
- the dust-proof film has a transmittance of 80% or more at an incident angle of ⁇ 10 ° to 10 ° for light having a wavelength of 440 to 780 nm.
- the dust-proof structure according to any one of [1] to [12], wherein the dust-proof film has a film thickness of 1.5 to 8.0 ⁇ m.
- the fixing portion includes the central axis of the screw assumed, and the cut plane view orthogonal to the dustproof film includes a region satisfying any one of the following (1) to (3).
- the dustproof structure according to any one of. (1) The width T1 of the portion where the dust-proof film is stretched and supported on the inner peripheral portion exceeds the thickness H1 of the inner peripheral portion (T1>H1> 0). (2) The thickness H2 of the outer portion is 1 ⁇ 2 or less (1/2 ⁇ H1 ⁇ H2> 0) of the thickness H1 of the inner peripheral portion.
- the ratio (T2 / T3) of the total width T2 of the peripheral portion and the outer portion is in the range of 1 to 13 [15].
- the dust-proof structure according to any one of [1] to [14], wherein the frame and the dust-proof film have different natural frequencies from each other.
- a dustproof structure for an alignment device which is suitable as a dustproof cover for an OAS type alignment device.
- FIG. 1A and 1B are views schematically showing a configuration example of a dustproof structure of the present embodiment, where FIG. 1A is a plan view and FIG. 1B is a cross-sectional view.
- the dust-proof structure 1 of the present embodiment is a dust-proof structure for an alignment unit, and is a dust-proof structure having an opening 2a and a dust-proof film stretched and supported on one side of the frame 2 so as to cover the opening 2a. 3 and a fixing portion for mechanically fixing the dustproof structure 1 to the alignment unit are provided.
- the dustproof structure 1 of the present embodiment is suitable as a dustproof cover for an OAS type alignment unit.
- an exposure apparatus provided with an OAS type alignment unit to which the dustproof structure 1 of the present embodiment is applied will be described.
- FIG. 2 and 3 are diagrams schematically showing an example of a configuration of an exposure apparatus, in which FIG. 2 mainly shows an exposure optical system, and FIG. 3 mainly shows an alignment optical system.
- the mask 11 on which the pattern 11a is formed, the mask stage 12 on which the mask 11 is mounted and movable in the X, Y, and ⁇ directions, and various patterns (for example, circuit patterns and pixel patterns) are photolithographic. It includes a substrate 13 formed by means, a substrate stage 14 that holds the substrate 13 and can move in the X, Y, and ⁇ directions, an illumination optical system 15, and a mirror projection system.
- the mask stage 12 and the substrate stage 14 are moved in the X and Y directions by motors (not shown), respectively.
- the illumination optical system 15 illuminates the mask 11 at the exposure position with light having a specific wavelength, and exposes the photosensitive layer 13a (resist) on the substrate 13 via the pattern 11a on the mask 11 to expose the mask 11 on the mask 11.
- Pattern 11a can be transferred to the substrate 13.
- the mirror projection system is composed of a combination of a concave mirror 16, a convex mirror 17, and a bending mirror 18 (trapezoidal mirror), and projects a pattern image of the mask 11 aligned at a predetermined position by the mask stage 12 on the substrate 13 at the same magnification. ..
- the pattern 11a drawn on the mask 11 is transferred to the photosensitive layer 13a (resist) on the substrate 13.
- the pattern is transferred to the entire surface of the substrate 13.
- the alignment optical system includes an alignment scope (AS: AlignmentScope) 20 and an off-axis alignment scope (OAS: Off-axisScope) 21 as shown in FIG.
- the AS 20 uses the exposure light emitted from the illumination optical system 15 and measures the overlapping state of the alignment marks of the mask 11 and the substrate 13 through the optical path of the exposure optical system.
- the OAS 21 includes an illumination unit 21a that irradiates an illumination light (non-exposure light) having a wavelength different from that of the exposure light on the alignment mark on the substrate 13, and an image pickup unit (not shown) that captures the reflected light.
- an illumination unit 21a that irradiates an illumination light (non-exposure light) having a wavelength different from that of the exposure light on the alignment mark on the substrate 13, and an image pickup unit (not shown) that captures the reflected light.
- the captured image is measured and processed by an image processing device (not shown) to acquire the position of the alignment mark. Then, each correction amount (shift component of X and Y, rotation component, magnification component of X and Y, squareness component of X and Y) is calculated from this measurement result.
- the control device (not shown) that controls the mask stage 12 and the substrate stage 14 corrects the magnification of the mirror projection system, the position / rotation of the substrate stage 14, and the synchronization deviation amount between the mask stage 12 and the substrate stage 14 according to the correction amount. While doing so, the exposure process is performed.
- the dustproof structure 1 of the present embodiment is used, for example, attached to the lower part of the OAS 21 in the exposure apparatus 10 as described above (see FIG. 3). Hereinafter, the dustproof structure 1 of the present embodiment will be described.
- the dust-proof structure 1 is a dust-proof structure for an alignment unit, and includes a frame body 2 forming an opening 2a and a dust-proof film 3 stretched and supported on one side of the frame body 2 so as to cover the opening 2a. , Equipped with.
- the dustproof structure 1 of the present embodiment includes a fixing portion for mechanically fixing the dustproof structure 1 to the alignment unit (OAS21).
- the frame body 2 extends and supports the dust-proof film 3, and also includes a fixing portion for attaching the dust-proof structure 1 to the alignment unit.
- the frame body 2 can have an arbitrary form such that the dustproof film 3 can be stretched on the frame body 2, and for example, when the frame body 2 is viewed from the front, it has a square shape, a polygonal shape, a circular shape, an elliptical shape, or the like. Can have the outer shape of.
- the square is a square, a rectangle, or the like, and can have both a case where the corners are right angles and a case where the corners are rounded.
- the polygon is a triangle, a trapezoid, a parallelogram, a pentagon, a hexagon, or the like.
- the frame body 2 has an edge portion.
- the edge portion can have a rod-shaped edge member extending linearly.
- the pair of edge members can be spaced parallel to each other, and similarly, the other pair of edge members can be spaced parallel to each other.
- the ends of the two rim members in contact can be connected so that they form a substantially right angle to each other. Then, the opening 2a is defined by the edge member connected to the closed shape.
- the frame 2 and its edge members are, for example, aluminum; aluminum alloy (for example, 5000 series, 6000 series, 7000 series, etc.); steel; stainless steel; magnesium alloy; ceramics (for example, SiC, AlN, Al 2 O 3 etc.); Composite materials of ceramics and metals (eg Al-SiC, Al-AlN, Al-Al 2 O 3 etc.); Engineering plastics such as PE, PA, PC, PEEK; Fiber composite materials such as GFRP, CFRP; or these It can be formed of a known material such as a combination of.
- an anodized film may be formed by alumite treatment.
- alumite generally include sulfuric acid alumite using a sulfuric acid bath and oxalic acid alumite using an oxalic acid bath as a treatment bath for electrolytic treatment, but those containing substantially no sulfuric acid (sulfuric acid-free). Is preferable.
- the sulfate ion contained in the frame 2 is preferably 0.3 ppm or less.
- the heat of the exposure light may generate ions and outgas from the photosensitive layer and the like. Further, the oxide film on the surface of the frame may be decomposed.
- the generated sulfate ion reacts with the above-mentioned ions, outgas, etc. (ammonia in the atmosphere, etc.) to cause fogging on the dustproof film 3, and alignment cannot be measured accurately and quickly. there is a possibility.
- the dustproof structure 1 of the present embodiment in which the sulfate ion contained in the frame 2 is 0.3 ppm or less can reduce the possibility that such a situation occurs.
- the sulfate ion as described above can be used. It is possible to suppress the generation of cloudiness and the decrease in haze due to the reaction between and ammonia.
- the size of the frame 2 and its opening 2a is determined according to the size of the OAS 21.
- the frame body 2 has a rectangular shape consisting of a pair of long sides and a pair of short sides in a front view
- the long side length is 300 mm to 1000 mm
- the short side length is 300 mm to 1000 mm
- the widths of the short sides can be 4.0 mm to 50.0 mm, respectively, and / or the height of the frame can be 1.5 mm to 12.0 mm.
- the ratio (t / w) of the thickness (indicated by t in FIG. 1) to the width (indicated by w in FIG. 1) is preferably 30% or less. Since there is a restriction on the thickness of the space where the dustproof structure 1 can be attached (for example, the gap between the members shown in s in FIG. 3), when the dustproof structure 1 is attached to the alignment unit by making the frame 2 thin. In addition to being able to clear the spatial restrictions of, it is also possible to ensure workability when mechanically fixing. Further, since the dustproof structure 1 is thin, the influence of the OAS 21 on the alignment accuracy can be suppressed to a small extent.
- the lower limit of the ratio of the thickness (t / w) to the width of the frame 2 is preferably 5% or more from the viewpoint of rigidity and suppression of strain.
- the ratio of the thickness (t / w) to the width on at least one side is within the above range.
- the flatness of the frame 2 is preferably more than 0 and 200 ⁇ m or less, and more preferably more than 0 and 150 ⁇ m or less.
- "flatness" is a measured value of swell from the stone surface plate of the frame body 2.
- the frame 2 is placed on a stone surface plate, a laser is emitted from the upper part of the frame 2 (opposite the stone surface plate), and the thickness is measured with a laser displacement meter.
- the stone surface plate as the zero point, the distance from the frame 2 on the incoming light side to the stone surface plate is measured.
- the number of measurements is set to 5 points on one side, points 20 mm from both ends of the side are measured, and measurements are made so that there are 3 points at equal intervals between them. This is performed on the four sides, and the difference in height between the highest point and the lowest point from the zero point on the four sides is the flatness.
- the dustproof structure has less bending when attached to the alignment unit.
- the dust-proof film 3 is a transparent thin film (pellicle) that prevents dust from adhering to the alignment unit without interfering with the optical function of the alignment unit. As shown in FIG. 1B, the dustproof film 3 is stretched, adhered and fixed on one side of the frame 2 so as to cover the opening 2a by an adhesive (not shown).
- the dustproof film 3 preferably has a transmittance of 80% or more at an incident angle of ⁇ 10 ° to 10 ° for light having a wavelength of 440 to 780 nm.
- the dust-proof film 3 preferably has a transmittance of 80% or more at an incident angle of ⁇ 10 ° to 10 ° for any light having a wavelength of 440 to 780 nm.
- the amount of hatameki of the dustproof film 3 is preferably ⁇ 3.0 mm to +3.0 mm.
- “the amount of Hatameki of the dustproof film 3” means the value which can be measured as follows. That is, as shown in FIG. 1, the frame has an outer diameter of 200 mm ⁇ 600 mm, the long side width is 10 mm, the short side width (w in FIG. 1B) is 10 mm, and the height (FIG. 1).
- a frame body 2 made of an aluminum alloy having an alumite-treated surface and having a thickness t) of 3 mm in (b) is prepared.
- a film adhesive is applied to one surface of the prepared aluminum alloy frame 2, and the dustproof film 3 is spread.
- a double-sided tape is attached to the opposite surface on which the dustproof film 3 is spread, and the double-sided tape is attached to an acrylic plate that is one size larger than the frame 2.
- the fan With the dustproof membrane 3 facing down, the fan is blown along the membrane in weak mode. It is the value measured by the laser displacement meter at the most bent part in the blown state.
- the negative value is based on the virtual surface (0 mm) that passes through the surface of the frame body 2 on which the dust-proof film 3 is spread, and the dust-proof film 3 is on the opening 2a side (the dust-proof structure is an acrylic plate).
- the amount of flutter that bends on the acrylic plate side when attached) is shown, and a positive value indicates the amount of flutter that the dustproof film 3 bends on the side opposite to the opening 2a.
- the OAS 21 is arranged on the upper part of the substrate 13 on which the photosensitive layer 13a (resist) is formed. Since the OAS 21 is arranged independently of the plate operation system, the OAS 21 itself does not move with respect to the movement of the substrate stage 14, but the substrate 13 arranged on the substrate stage 14 moves, and at this time, it is considerably fast. Move at speed. As shown by s in FIG. 3, the thickness of the space to which the dustproof structure 1 is attached is very small, and the distance between the dustproof structure 1 (dustproof film 3) and the photosensitive layer 13a (resist) on the surface of the substrate 13 is a number. There is only about mm. Therefore, the dustproof film 3 flutters due to the wind pressure generated by the high-speed movement of the substrate 13.
- the dust-proof film 3 may come into contact with the resist.
- the amount of the dust-proof film 3 it is possible to prevent the dust-proof film 3 from coming into contact with other members.
- the material constituting such a dustproof film 3 is not particularly limited as long as it is a transparent thin film, but for example, nitrocellulose, a cellulose derivative, and a fluoropolymer are preferable. As a result, the light emitted by the light source can be sufficiently transmitted in the OAS alignment, and the amount of fluttering can be reduced, for example, within the above range.
- the film thickness of the dustproof film 3 is preferably 1.5 ⁇ m to 8.0 ⁇ m.
- the frame body 2 and the dustproof film 3 have different natural frequencies from each other. This makes it possible to prevent the frame body 2 of the dustproof structure 1 and the dustproof film 3 from resonating due to the vibration of the alignment unit.
- the fixing portion is a means for mechanically fixing the dustproof structure 1 to the alignment unit, and is integrally formed with the frame body 2 in the present embodiment.
- the "fixing portion” is a frame body surface corresponding to the screws and clips when the dustproof structure 1 is fixed to the alignment unit by using screws, clips and the like.
- the screw or clip is not the fixed portion, but the frame surface that forms the screw hole or the frame surface to which the clip is attached is the "fixed portion”.
- the "mechanical fixing means” means a fixing means other than adhesive fixing by an adhesive, and the means thereof is not particularly limited.
- the dust-proof structure 1 can be surely attached to the alignment unit and the dust-proof structure 1 can be prevented from falling as compared with the fixing by the adhesive. Further, according to the mechanical fixing means, it is possible to avoid the situation where the adhesive component is scattered.
- the other surface side of the frame 2 is a non-adhesive surface on which an adhesive layer (layer containing an adhesive or an adhesive tape) is not formed.
- the frame body 2 is formed with a screw hole 4a and / or a screw groove 4b as a fixing portion, and the dustproof structure 1 is fixed to the OAS 21 by a screw.
- a plurality of screw holes 4a and screw grooves 4b are formed through the frame body 2, and a screw (male screw) is inserted through the screw holes 4a and the screw groove 4b to form a screw on the OAS side.
- the dustproof structure 1 is attached to the OAS 21 by screwing it into a hole (female screw) and a screw hole (female screw). According to the screw, the fixing force can be easily adjusted by adjusting the tightening strength, and the dustproof structure 1 can be prevented from falling.
- simple fixing temporary fixing at the time of installation is also possible.
- a screw groove 4b flat U-shaped shape
- the fixing portions facing each other across the opening 2a have the same structure. That is, when the frame body 2 has, for example, a rectangular shape having a long side and a short side, the fixed portion arranged on the short side portion and the fixed portion arranged on the long side portion have the same configuration. It is preferable to have.
- the fixing portion having the screw hole 4a (the fixing portion arranged on the short side portion) faces the opening 2a
- the fixing portion having the screw groove 4b (the fixing portion) (Fixed parts arranged on the long side) face each other.
- one surface side of the frame body 2 has a portion where the dustproof film 3 is arranged and a portion where the dustproof film 3 is not arranged, and the fixing portion is the one surface side of the frame body 2.
- the portion where the dustproof film 3 is not arranged That is, in the present embodiment, one side of the frame 2 has a portion where the dustproof film 3 is arranged and a portion where the dustproof film 3 is not arranged, and the one side of the frame 2 has a portion.
- a screw hole 4a and a screw groove 4b are provided so as to penetrate the portion where the dustproof film 3 is not arranged. According to this, it becomes easy to suppress the bending of the dustproof film 3 due to the work of fixing or loosening the screw.
- the thread groove 4b having the hole open has less force applied to the frame body 2 when tightened to the same extent.
- the dustproof structure 1 is securely fixed to the OAS 21. Therefore, from the viewpoint of securely fixing the dustproof structure 1 to the OAS 21 while reducing the distortion of the frame body 2, for example, when the frame body 2 has a rectangular shape having a long side and a short side, a screw hole 4a is provided. It is preferable that the fixing portion having the fixing portion is arranged on the short side portion and the fixing portion having the thread groove 4b is arranged on the long side portion.
- the fixed portions are arranged so as to face each other with the opening 2a interposed therebetween.
- the frame body 2 can have an outer shape such as a square, a polygon, a circle, or an ellipse when viewed from the front.
- the fixing portions are arranged so as to face each other with the opening 2a interposed therebetween, so that the dustproof structure 1 can be more preferably fixed to the OA21.
- the dustproof structure 1 preferably includes the same or different fixing portions in a range of 2 or more and 16 or less in total, and more preferably 4 or more and 10 or less in total.
- the dust-proof structure 1 of the present embodiment includes a total of eight fixing portions (screw holes 4a and / or screw grooves 4b), whereby the dust-proof structure 1 can be more preferably fixed to the OAS 21. ..
- the fixing portion includes a receiving portion for receiving the mechanical fixing means other than the screw.
- the receiving portion has at least a surface in contact with the frame body 2 (at least the mechanical fixing means other than the screw is the frame body). Concave and / or convex portions, including a shape corresponding to the surface in contact with the surface).
- FIG. 4 is a diagram for explaining a dustproof structure according to another embodiment of the present invention.
- all the fixing portions are configured as screw holes 4a.
- all the fixing portions are configured as screw grooves 4b.
- Any dust-proof structure is suitable as a dust-proof cover for an OAS type alignment unit, like the dust-proof structure 1.
- FIG. 5 is a diagram schematically showing a configuration example of a dustproof structure according to the second embodiment of the present invention.
- the frame body 2A of the dustproof structure 1A includes an inner frame body (inner peripheral portion) 2b forming an opening 2a and an outer frame body (outer frame portion) 2c arranged outside the inner frame body 2b. , Equipped with.
- the outer frame body 2c projects outward from a part of the side surface of the inner frame body 2b.
- the outer frame body 2c and the inner frame body 2b are integrally configured, and the thickness of the outer frame body 2c is thinner than the thickness of the inner frame body 2b. Then, the surface of the outer frame body 2c on the side attached to the alignment unit and the surface of the inner frame body 2b on the side attached to the alignment unit are continuously connected to each other on the side attached to the alignment unit in the dustproof structure 1A.
- the outer peripheral side surface of the inner frame body 2b is continuous between the surface of the inner frame body 2b on the dustproof film 3 side and the surface of the outer frame body 2c on the dustproof film 3 side.
- the outer frame body 2c can continuously surround the outer periphery of the inner frame body 2b, but it may not surround the outer frame body 2c.
- a plurality of outer frame bodies 2c are discontinuous from the inner frame body 2b to the outer peripheral side thereof at predetermined intervals along the outer peripheral direction of the inner frame body 2b.
- a shape that protrudes from the ground is constructed.
- the outer frame body 2c and the inner frame body 2b are integrally configured, but the outer frame body 2c and the inner frame body 2b may be configured separately. Having such a configuration also facilitates the realization of a suitable configuration as a dustproof cover for an OAS type alignment unit.
- the dust-proof film 3 is stretched and supported on the surface of the inner frame body 2b on the dust-proof film 3 side.
- the outer frame 2c has a fixing portion for defining a screw hole 4a and / or a screw groove 4b for mechanically fixing the dustproof structure 1A to the alignment unit.
- the screw holes 4a and the screw grooves 4b are provided so as to penetrate the outer frame body 2c in the height direction (direction along the thickness t in FIG. 1B). This makes it easier to realize a configuration suitable for a dustproof cover for an OAS type alignment unit.
- the screw hole 4a and the screw groove 4b are provided, but the screw hole 4a or the screw groove 4b may not be provided.
- the dustproof structure 1A according to the second embodiment has a suspension receiving portion including a step and / or an inclination that enables the dustproof structure 1A to be lifted.
- a suspension receiving portion including a step and / or an inclination that enables the dustproof structure 1A to be lifted.
- the recesses 5a are continuously formed, and here, the recesses 5a that go around the frame 2A in the circumferential direction are formed. This makes it easier to mechanically handle the dustproof structure 1A, for example, the jig or the like can be lifted or moved while being hooked on the recess 5a.
- the recess 5a can also be formed discontinuously on the outer peripheral side surface of the inner frame body 2b.
- the frame body 2A of the dustproof structure 1A has a plurality of discontinuous recesses 5a.
- the recesses (discontinuous recesses) 5a formed on the pair of short sides form the pair of recesses 5a
- the recesses) 5a preferably form a pair of recesses 5a. This also makes it easier to mechanically handle the dustproof structure 1A, for example, the jig or the like can be lifted or moved while being hooked on the recess 5a.
- the suspension receiving portion in the example shown in FIG. 6A, between the surface of the inner frame body 2b on the dustproof film 3 side and the surface of the outer frame body 2c on the dustproof film 3 side. At least a part of the surface (the outer peripheral side surface of the inner frame body 2b) is formed with a widening portion whose width increases as the distance from the outer frame body 2c increases.
- a tapered portion 5b whose width gradually increases as the distance from the outer frame body 2c increases is formed.
- a tapered portion 5b is formed that continuously goes around the frame body 2 in the circumferential direction.
- the widened portion also includes a staircase shape whose width increases discontinuously as the distance from the outer frame body 2c increases.
- a convex portion 5c protruding on the side opposite to the opening 2a is formed on the outer peripheral side surface of the body 2b).
- a convex portion 5c that continuously goes around the frame body 2A in the circumferential direction is formed.
- a recess 5d recessed in a stepped manner is formed on the opening 2a side.
- a recess 5d that continuously goes around the frame body 2A in the circumferential direction is formed.
- tapered portions 5b, convex portions 5c or concave portions 5d can also be discontinuously formed on the outer peripheral side surface of the inner frame body 2b.
- the tapered portion 5b, the convex portion 5c or the concave portion 5d (discontinuous tapered portion 5b, the convex portion 5c or the concave portion 5d) formed on the pair of short sides respectively has a pair of tapered portions 5b, the convex portion 5c or the concave portion 5d.
- the concave portion 5d, and the tapered portion 5b, the convex portion 5c or the concave portion 5d are continuous tapered portion 5b, the convex portion 5c or the concave portion 5d formed on each of the pair of long sides is paired. It is preferable to form the tapered portion 5b, the convex portion 5c or the concave portion 5d.
- the surface of the dustproof structure 1A on the side attached to the alignment unit (the surface on the outer frame body 2c on the side attached to the alignment unit and the surface on the inner frame body 2b on the side attached to the alignment unit), slides are made.
- a valley portion (not shown) may be formed.
- the alignment unit is formed with a slide ridge corresponding to the slide valley. The slide valley portion of the dustproof structure 1A can be guided to the slide mountain portion of the alignment unit, and if necessary, the dustproof structure 1A can be slid on the alignment unit. This facilitates the alignment of the dustproof structure 1A and the alignment unit, and facilitates mechanical fixing of both.
- a slide mountain portion may be provided on the dustproof structure 1A side, and a slide valley portion may be provided on the alignment unit side.
- the cut plane views including the central axis of the screw assumed by the fixing portion and orthogonal to the dustproof film 3 are as follows (1) to (3). ) Satisfying any of).
- the width T1 of the portion where the dustproof film 3 is stretched and supported by the inner frame body (inner peripheral portion) 2b exceeds the thickness H1 of the inner frame body (inner peripheral portion) 2b (T1>H1> 0).
- the thickness H2 of the outer frame body (outer portion) 2c is 1 ⁇ 2 or less (1/2 ⁇ H1 ⁇ H2> 0) of the thickness H1 of the inner frame body (inner peripheral portion) 2b.
- the ratio (T2 / T3) of the total width T2 of the inner frame body (inner peripheral portion) 2b and the outer frame body (outer portion) 2c to the screw receiving width T3 of the opening of the screw hole 4a or the screw groove 4b is 1. It is within the range of ⁇ 13.
- the dustproof structure 1A can be set while the alignment scope is arranged near the stage. The dustproof structure 1A can be set on the alignment scope even when space restrictions are severe.
- H1 Since H1 is large, the rigidity of the frame body 2A can be ensured. Further, since H2 is small, it is possible to secure a side surface on which the suspension receiving portion is formed. (3) When T2 / T3 is in the above range, the ratio of the portion where the fixing force acts to the mounting surface to the alignment unit can be balanced.
- the present invention is based on the premise that it belongs to a technical field in which extremely high flatness is indispensable, and in order to solve the problems peculiar to the alignment application, the above configuration makes it possible to have excellent handleability and a frame body, which are the problems peculiar to the alignment application.
- the purpose is to prevent distortion as a whole and suppress a decrease in rigidity.
- the screwing function of the dustproof structure 1A is intentionally separated from the inner frame body 2b, and the function is newly added. It is configured to be held in the outer frame body 2c.
- the guide of the lifting device of the dustproof structure 1A is arranged on the outer frame body 2c. I was able to add a function.
- all the fixing portions may be configured as screw holes 4a. Further, all the fixing portions may be configured as thread grooves 4b.
- FIG. 8 is a diagram schematically showing a configuration example of the dustproof structure according to the second embodiment of the present invention.
- the dustproof structure 1B of the present embodiment includes a magnet 6 for fixing the dustproof structure 1B to the alignment unit.
- the magnet 6 as a fixing portion is arranged on the frame body 2B, and the dustproof structure 1B is fixed to the OAS 21 by the magnet 6.
- the magnet 6 is formed so as to make a continuous circumference in the circumferential direction of the frame body 2B. According to the magnet, the fixing force can be easily adjusted by adjusting the strength of the magnetic force, and the dustproof structure 1 can be prevented from falling. In addition, the work at the time of installation is easy.
- the fixing portions facing each other with the opening 2a sandwiched have the same structure. That is, when the frame body 2B has, for example, a rectangular shape having a long side and a short side, the fixed portion arranged on the short side portion and the fixed portion arranged on the long side portion have the same configuration. It is preferable to have.
- magnets 6 can also be discontinuously arranged on the outer peripheral side surface of the inner frame body 2b. At this time, it is preferable that the magnets 6 (discontinuous magnets 6) arranged on the pair of short sides form the pair of magnets 6, and the magnets 6 (discontinuous magnets 6) arranged on the pair of long sides respectively. It is preferable that the continuous magnets 6) form a pair of magnets 6.
- the frame 2B provided with the magnet 6 according to the third embodiment may also be formed with a suspension receiving portion including a step and / or an inclination that enables the dustproof structure 1B to be lifted.
- the suspension receiving portion may have the same configuration as the concave portion 5a, the tapered portion 5b, the convex portion 5c, and the stepped concave portion 5d as described in the second embodiment.
- fixing with screws and fixing with magnets can be combined. That is, a screw hole 4a or a screw groove 4b may be formed in the frame body 2 (2A, 2B), and a magnet 6 may be arranged.
- the second embodiment, the third embodiment and other embodiments related thereto, and further other embodiments described above can be combined with each other.
- the surface between the surface on the dust-proof film side of the inner frame and the surface on the dust-proof film side of the outer frame is a concave portion, a convex portion, and a tapered portion (widening portion). And can have at least two at the same time.
- the second embodiment, the third embodiment and other embodiments related thereto, and further other embodiments described above can be combined with the above-described first embodiment.
- the dust-proof structure according to the present invention it becomes suitable as a dust-proof cover for an OAS type alignment unit, and can be widely used as a dust-proof structure for an alignment unit.
Abstract
Description
ミラー投影光学方式の露光装置の基本構成は、極限の加工精度で造られた大きな凹面ミラーと小さな凸面ミラー、および台形ミラーからなる。ユニット上部に装着されたフォトマスクに紫外線を照射し、複数回(例えば、5回)の反射を経てガラス基板上にフォトマスク上の回路パターンを転写露光する。 As a batch exposure to such a large area, a mirror projection optical type exposure apparatus or the like has been put on the market.
The basic configuration of a mirror projection optical exposure system consists of a large concave mirror, a small convex mirror, and a trapezoidal mirror manufactured with extreme processing accuracy. The photomask mounted on the upper part of the unit is irradiated with ultraviolet rays, and the circuit pattern on the photomask is transferred and exposed on the glass substrate after being reflected a plurality of times (for example, 5 times).
そこで、例えばOAS方式において、アライメントユニットのレンズ部に防塵カバーを配することが考えられる。しかしながら、OAS方式のアライメントユニット用の防塵カバーとして好適なものは提案されていなかった。OAS方式のアライメントユニットでは、AS方式に比べて空間的制約があることや、基板ステージの高速移動による風圧の影響を受けるなど、条件が異なることから、AS方式のアライメントユニットにおいて防塵等のために用いられるペリクル(枠体の一面側にペリクル膜を有し、他面側にマスク用粘着層を有するペリクル)をそのまま用いることはできない。 Since the measurement unit (lens unit) in the OAS method is located closer to the substrate stage than the measurement unit (lens unit) in the AS system, in the OAS system, when the exposure apparatus is driven (that is, the substrate stage). It is easily affected by dust generated during driving in the X and Y directions. Excessive influence of such dust causes a problem that accurate alignment becomes difficult.
Therefore, for example, in the OAS method, it is conceivable to arrange a dustproof cover on the lens portion of the alignment unit. However, no suitable dustproof cover for the OAS type alignment unit has been proposed. The OAS alignment unit has different conditions such as spatial restrictions compared to the AS alignment and being affected by wind pressure due to the high-speed movement of the substrate stage. The pellicle to be used (a pellicle having a pellicle film on one side of the frame and an adhesive layer for masking on the other side) cannot be used as it is.
開口を形成する枠体と、
前記枠体の一方面側に、前記開口を覆うように展張支持された防塵膜と、
を備えた防塵構造体であって、
前記防塵構造体をアライメントユニットに機械的に固定するための固定部と、前記防塵構造体をアライメントユニットに固定するための磁石と、の少なくとも一方を備える、アライメントユニット用の防塵構造体。
[2]
前記防塵膜は、波長440~780nmの光について、入射角-10°~10°における透過率が80%以上である、[1]に記載の防塵構造体。
[3]
前記防塵膜のハタメキ量が、-3.0mm~+3.0mmである、[1]または[2]に記載の防塵構造体。
[4]
前記枠体の一方面側は、前記防塵膜が配される部分と、前記防塵膜が配されていない部分と、を有し、
前記固定部は、前記枠体の一方面側における、前記防塵膜が配されていない部分に設けられる、[1]~[3]のいずれかに記載の防塵構造体。
[5]
前記枠体に含まれる硫酸イオンが0.3ppm以下である、[1]~[4]のいずれかに記載の防塵構造体。
[6]
前記枠体の他面側は、粘着層が形成されていない、非粘着面とされている、[1]~[5]のいずれかに記載の防塵構造体。
[7]
計2つ以上計16つ以下の前記固定部を備える、[1]~[6]のいずれかに記載の防塵構造体。
[8]
前記枠体は、前記開口を形成する内周部と、前記内周部の側面の一部から外側に突出する外側部と、を備える、[1]~[7]のいずれかに記載の防塵構造体。
[9]
前記外側部は、前記防塵構造体をアライメントユニットにネジ固定するためのネジ溝及び/又はネジ孔を画定する前記固定部を有する、[8]に記載の防塵構造体。
[10]
前記防塵構造体は、該防塵構造体を吊り上げ可能とする段差及び/又は傾斜を含む吊架受け部を有する、[1]~[7]のいずれかに記載の防塵構造体。
[11]
前記吊架受け部は、前記内周部における、前記外側部が形成された前記側面に設けられる、[10]に記載の防塵構造体。
[12]
前記枠体の平坦度が0超え200μm以下である、[1]~[11]のいずれかに記載の防塵構造体。
[13]
前記防塵膜の膜厚は、1.5~8.0μmである、[1]~[12]のいずれかに記載の防塵構造体。
[14]
前記固定部が想定するネジの中心軸を含み、かつ、前記防塵膜に直交する切断面視が、下記(1)~(3)のいずれかを満たす領域を含む、[1]~[13]のいずれかに記載の防塵構造体。
(1)前記防塵膜が前記内周部に展張支持された部分の幅T1が、前記内周部の厚みH1を超える(T1>H1>0)
(2)前記外側部の厚みH2が、前記内周部の厚みH1の1/2以下(1/2・H1≧H2>0)である
(3)前記開口のネジ受け幅T3に対する、前記内周部及び前記外側部の合計幅T2の比(T2/T3)が1~13の範囲内である
[15]
前記枠体と、前記防塵膜とは、互いに異なる固有振動数を有する、[1]~[14]のいずれかに記載の防塵構造体。 [1]
The frame that forms the opening and
On one side of the frame, a dustproof film stretched and supported so as to cover the opening,
It is a dustproof structure equipped with
A dustproof structure for an alignment unit, comprising at least one of a fixing portion for mechanically fixing the dustproof structure to the alignment unit and a magnet for fixing the dustproof structure to the alignment unit.
[2]
The dust-proof structure according to [1], wherein the dust-proof film has a transmittance of 80% or more at an incident angle of −10 ° to 10 ° for light having a wavelength of 440 to 780 nm.
[3]
The dust-proof structure according to [1] or [2], wherein the dust-proof film has a hatameki amount of −3.0 mm to +3.0 mm.
[4]
One surface side of the frame body has a portion where the dust-proof film is arranged and a portion where the dust-proof film is not arranged.
The dust-proof structure according to any one of [1] to [3], wherein the fixing portion is provided on one surface side of the frame body in a portion where the dust-proof film is not arranged.
[5]
The dust-proof structure according to any one of [1] to [4], wherein the sulfate ion contained in the frame is 0.3 ppm or less.
[6]
The dustproof structure according to any one of [1] to [5], wherein the other surface side of the frame is a non-adhesive surface on which an adhesive layer is not formed.
[7]
The dustproof structure according to any one of [1] to [6], comprising the fixing portions having a total of 2 or more and 16 or less in total.
[8]
The dustproof according to any one of [1] to [7], wherein the frame includes an inner peripheral portion forming the opening and an outer peripheral portion protruding outward from a part of the side surface of the inner peripheral portion. Structure.
[9]
The dust-proof structure according to [8], wherein the outer portion has the fixing portion for defining a screw groove and / or a screw hole for screw-fixing the dust-proof structure to the alignment unit.
[10]
The dust-proof structure according to any one of [1] to [7], wherein the dust-proof structure has a suspension receiving portion including a step and / or an inclination that enables the dust-proof structure to be lifted.
[11]
The dustproof structure according to [10], wherein the suspension receiving portion is provided on the side surface of the inner peripheral portion where the outer portion is formed.
[12]
The dustproof structure according to any one of [1] to [11], wherein the flatness of the frame is more than 0 and 200 μm or less.
[13]
The dust-proof structure according to any one of [1] to [12], wherein the dust-proof film has a film thickness of 1.5 to 8.0 μm.
[14]
[1] to [13], wherein the fixing portion includes the central axis of the screw assumed, and the cut plane view orthogonal to the dustproof film includes a region satisfying any one of the following (1) to (3). The dustproof structure according to any one of.
(1) The width T1 of the portion where the dust-proof film is stretched and supported on the inner peripheral portion exceeds the thickness H1 of the inner peripheral portion (T1>H1> 0).
(2) The thickness H2 of the outer portion is ½ or less (1/2 · H1 ≧ H2> 0) of the thickness H1 of the inner peripheral portion. The ratio (T2 / T3) of the total width T2 of the peripheral portion and the outer portion is in the range of 1 to 13 [15].
The dust-proof structure according to any one of [1] to [14], wherein the frame and the dust-proof film have different natural frequencies from each other.
以下、本発明を実施するための実施の形態(以下、「本実施形態」と称する)について詳細に説明する。
図1は、本実施形態の防塵構造体の一構成例を模式的に示す図であり、(a)は平面図、(b)は断面図である。
本実施形態の防塵構造体1は、アライメントユニット用の防塵構造体であり、開口2aを有する枠体2と、枠体2の一方面側に、開口2aを覆うように展張支持された防塵膜3と、防塵構造体1をアライメントユニットに機械的に固定するための固定部と、を備える。 (Embodiment 1)
Hereinafter, embodiments for carrying out the present invention (hereinafter referred to as “the present embodiment”) will be described in detail.
1A and 1B are views schematically showing a configuration example of a dustproof structure of the present embodiment, where FIG. 1A is a plan view and FIG. 1B is a cross-sectional view.
The dust-
本実施形態の防塵構造体1は、OAS方式のアライメントユニットの防塵カバーとして好適である。
まず、本実施形態の防塵構造体1が適用される、OAS方式のアライメントユニットを備えた露光装置について説明する。 <Exposure device>
The
First, an exposure apparatus provided with an OAS type alignment unit to which the
露光装置10は、パターン11aが形成されているマスク11、マスク11を搭載してX、Yおよびθ方向に移動可能なマスクステージ12、各種パターン(例えば、回路パターンや画素パターン)がフォトリソグラフィの手段で形成される基板13、基板13を保持してX、Yおよびθ方向に移動可能な基板ステージ14と、照明光学系15と、ミラー投影系とを備える。マスクステージ12および基板ステージ14は、それぞれ図示しないモータによりX,Y方向に移動される。 2 and 3 are diagrams schematically showing an example of a configuration of an exposure apparatus, in which FIG. 2 mainly shows an exposure optical system, and FIG. 3 mainly shows an alignment optical system.
In the
以下、本実施形態の防塵構造体1について説明する。 The
Hereinafter, the
防塵構造体1は、アライメントユニット用の防塵構造体であって、開口2aを形成する枠体2と、枠体2の一方面側に、開口2aを覆うように展張支持された防塵膜3と、を備える。そして、本実施形態の防塵構造体1は、防塵構造体1をアライメントユニット(OAS21)に機械的に固定するための固定部と、を備える。 <Dustproof structure>
The dust-
特に、本実施形態の防塵構造体1では、枠体2に含まれる硫酸イオンが0.3ppm以下であることが好ましい。 In the case of aluminum, an anodized film may be formed by alumite treatment. Examples of alumite generally include sulfuric acid alumite using a sulfuric acid bath and oxalic acid alumite using an oxalic acid bath as a treatment bath for electrolytic treatment, but those containing substantially no sulfuric acid (sulfuric acid-free). Is preferable.
In particular, in the
防塵構造体1を取り付けられる空間の厚み(例えば、図3中sで示す、部材間の隙間)に制約があるため、枠体2を薄くすることで、防塵構造体1をアライメントユニットに取り付ける際の空間的制約をクリアすることができるほか、機械的に固定する際の作業容易性も確保することができる。また、防塵構造体1の厚みが薄いことで、OAS21によるアライメント精度に与える影響も小さく抑えることができる。
なお、枠体2の幅に対する厚みの割合(t/w)の下限値としては、剛性や歪みの抑制などの観点から、5%以上であることが好ましい。
枠体2が、辺によって異なる幅を有する場合、少なくともいずれかの辺における幅に対する厚みの割合(t/w)が、上記の範囲内であることが好ましい。 In the
Since there is a restriction on the thickness of the space where the
The lower limit of the ratio of the thickness (t / w) to the width of the
When the
なお、本明細書において「平坦度」は、枠体2の石定盤からのうねりの測定値である。例えば、枠体2を石定盤に静置し、枠体2の上部(石定盤の反対側)からレーザーを入光させ、レーザー変位計にて厚みを測定する。石定盤をゼロ点とし、入光側の枠体2から石定盤までの距離を測定する。ここで、測定数は1辺で5点とし、辺の両端から20mmの点を各々測定し、更にその間を3点等間隔になるように測定する。これを4辺において行い、4辺においてゼロ点からの高さが一番高い点及び一番低い点の高さの差を平坦度とした値である。
枠体2の平坦度が上記範囲であることにより、アライメントユニットに取り付けたときに撓みが少ない防塵構造体となる。 The flatness of the
In the present specification, "flatness" is a measured value of swell from the stone surface plate of the
When the flatness of the
図1(b)に示すように、防塵膜3は、図示しない粘着剤により、枠体2の一方面側に、開口2aを覆うように展張され、接着及び固定されている。 The dust-
As shown in FIG. 1B, the
これにより、OASアライメント用光源が発する光を十分に透過させることができ、より迅速で正確なOASアライメントが可能になる。 The
As a result, the light emitted by the OAS alignment light source can be sufficiently transmitted, and faster and more accurate OAS alignment becomes possible.
ハタメキ量について、マイナスの数値は、枠体2における防塵膜3が展張される側の面を通過する仮想面を基準(0mm)として、防塵膜3が開口2a側(防塵構造体をアクリル板に張り付けた場合におけるアクリル板側)に撓んだハタメキ量を示し、プラスの数値は、防塵膜3が開口2aとは反対側に撓んだハタメキ量を示す。 The amount of hatameki of the
Regarding the amount of hatameki, the negative value is based on the virtual surface (0 mm) that passes through the surface of the
なお、本明細書において「固定部」とは、防塵構造体1をアライメントユニットにネジやクリップ等を用いて固定する際に、ネジやクリップに対応する枠体面である。言い換えると、ネジやクリップが固定部なのでなく、ネジ孔を形成する枠体面やクリップが付される枠体面が「固定部」である。
また、本明細書において「機械的固定手段」とは、粘着剤による接着固定以外の固定手段を意味し、その手段は特に限定されない。機械的固定手段によれば、粘着剤による固定に比べて、防塵構造体1をアライメントユニットに確実に取り付けることができ、防塵構造体1の落下を防止することができる。また、機械的固定手段によれば、粘着剤成分が飛散する状況を回避することができる。
本実施形態では、枠体2の他面側は、粘着層(粘着剤又は粘着テープを含む層)が形成されていない、非粘着面とされている。 The fixing portion is a means for mechanically fixing the
In the present specification, the "fixing portion" is a frame body surface corresponding to the screws and clips when the
Further, in the present specification, the "mechanical fixing means" means a fixing means other than adhesive fixing by an adhesive, and the means thereof is not particularly limited. According to the mechanical fixing means, the dust-
In the present embodiment, the other surface side of the
本発明の実施形態2に係る防塵構造体は、上記の実施形態1に係る防塵構造体と比べ、枠体の構造が異なる。実施形態1に係る防塵構造体と同一の構成を用いることができる部分については説明を省略しながら、実施形態2に係る防塵構造体について以下で説明する。
図5は、本発明の実施形態2に係る防塵構造体の一構成例を模式的に示す図である。 (Embodiment 2)
The dust-proof structure according to the second embodiment of the present invention has a different frame structure from the dust-proof structure according to the first embodiment. The dust-proof structure according to the second embodiment will be described below, while the description of the portion where the same configuration as that of the dust-proof structure according to the first embodiment can be used is omitted.
FIG. 5 is a diagram schematically showing a configuration example of a dustproof structure according to the second embodiment of the present invention.
例えば、図5に示す例では、内枠体2bにおける防塵膜3側の面と、外枠体2cにおける防塵膜3側の面との間の面(内枠体2bにおける、外枠体2cが形成された側面)には、吊架受け部として、開口2a側に凹んだ凹部5aが形成されている。凹部5aは連続的に形成されており、ここでは、枠体2Aの周方向に亘って一周する凹部5aが形成されている。これにより、治具等を凹部5aに引っ掛けながら持ち上げたり移動させたりすることができる等、機械的に防塵構造体1Aを扱い易くなる。 Further, the
For example, in the example shown in FIG. 5, the surface between the surface of the
(1)防塵膜3が内枠体(内周部)2bに展張支持された部分の幅T1が、内枠体(内周部)2bの厚みH1を超える(T1>H1>0)。
(2)外枠体(外側部)2cの厚みH2が、内枠体(内周部)2bの厚みH1の1/2以下(1/2・H1≧H2>0)である。
(3)ねじ孔4a又はねじ溝4bの開口のネジ受け幅T3に対する、内枠体(内周部)2b及び外枠体(外側部)2cの合計幅T2の比(T2/T3)が1~13の範囲内である。 As shown in FIG. 7, in the
(1) The width T1 of the portion where the
(2) The thickness H2 of the outer frame body (outer portion) 2c is ½ or less (1/2 · H1 ≧ H2> 0) of the thickness H1 of the inner frame body (inner peripheral portion) 2b.
(3) The ratio (T2 / T3) of the total width T2 of the inner frame body (inner peripheral portion) 2b and the outer frame body (outer portion) 2c to the screw receiving width T3 of the opening of the
(2)H1が大きいことにより、枠体2Aの剛性を確保できる。また、H2が小さいことにより、吊下受け部が形成される側面を確保できる。
(3)T2/T3が上記範囲であることにより、アライメントユニットへの取り付け面に対して、固定力が働く部分の割合のバランスをとることができる。 (1) Since the T1 is large, by securing the sticking area of the
(2) Since H1 is large, the rigidity of the
(3) When T2 / T3 is in the above range, the ratio of the portion where the fixing force acts to the mounting surface to the alignment unit can be balanced.
本実施形態では、上記課題に着目するからこそ、防塵膜3の展張機能を内枠体2bに持たせつつ、あえて防塵構造体1Aのねじ止め機能を内枠体2bから切り離し、該機能を新たな外枠体2cに持たせる構成とした。この構成としたことで初めて現れる「内枠体2bにおける、外枠体2cが形成された側面」に吊架受け部を配したことで、外枠体2cに防塵構造体1Aの吊り上げ装置のガイド機能も付与することができた。 The present invention is based on the premise that it belongs to a technical field in which extremely high flatness is indispensable, and in order to solve the problems peculiar to the alignment application, the above configuration makes it possible to have excellent handleability and a frame body, which are the problems peculiar to the alignment application. The purpose is to prevent distortion as a whole and suppress a decrease in rigidity.
In this embodiment, because the above-mentioned problems are focused on, while the
本発明の実施形態3に係る防塵構造体は、上記の実施形態1に係る防塵構造体と比べ、枠体の構造が異なる。実施形態1に係る防塵構造体と同一の構成を用いることができる部分については説明を省略しながら、実施形態3に係る防塵構造体について以下で説明する。
図8は、本発明の実施形態2に係る防塵構造体の一構成例を模式的に示す図である。 (Embodiment 3)
The dust-proof structure according to the third embodiment of the present invention has a different frame structure from the dust-proof structure according to the first embodiment. The dust-proof structure according to the third embodiment will be described below, while the description of the portion where the same configuration as that of the dust-proof structure according to the first embodiment can be used is omitted.
FIG. 8 is a diagram schematically showing a configuration example of the dustproof structure according to the second embodiment of the present invention.
本実施形態では、枠体2Bに固定部としての磁石6が配されており、防塵構造体1Bは、磁石6によりOAS21に固定される。ここでは、枠体2Bの周方向に亘って連続的に一周するように磁石6が形成されている。
磁石によれば、磁力の強さを調整することにより固定力の調節が容易であり、防塵構造体1の落下を防止することができる。また、取り付け時の作業も容易である。 The
In the present embodiment, the
According to the magnet, the fixing force can be easily adjusted by adjusting the strength of the magnetic force, and the
2、2A、2B:枠体
2a:開口
2b:内枠体(内周部)
2c:外枠体(外側部)
3:防塵膜
4a:ねじ孔
4b:ねじ溝
5a:凹部(吊架受け部)
5b:テーパー部(吊架受け部)
5c:凸部(吊架受け部)
5d:凹部(吊架受け部)
6:磁石
10:露光装置
11:マスク
11a:パターン
12:マスクステージ
13:基板
13a:感光層
14:基板ステージ
15:照明光学系
16:凹面鏡
17:凸面鏡
18:折曲げ鏡
20:AS(アライメントスコープ)
21:OAS(オフアクシスアライメントスコープ)
21a:照明部 1, 1A, 1B:
2c: Outer frame (outer part)
3:
5b: Taper part (suspension receiving part)
5c: Convex part (suspended receiving part)
5d: Recess (suspended receiving part)
6: Magnet 10: Exposure device 11:
21: OAS (Off Axis Alignment Scope)
21a: Lighting unit
Claims (15)
- 開口を形成する枠体と、
前記枠体の一方面側に、前記開口を覆うように展張支持された防塵膜と、
を備えた防塵構造体であって、
前記防塵構造体をアライメントユニットに機械的に固定するための固定部と、前記防塵構造体をアライメントユニットに固定するための磁石と、の少なくとも一方を備える、アライメントユニット用の防塵構造体。 The frame that forms the opening and
On one side of the frame, a dustproof film stretched and supported so as to cover the opening,
It is a dustproof structure equipped with
A dustproof structure for an alignment unit, comprising at least one of a fixing portion for mechanically fixing the dustproof structure to the alignment unit and a magnet for fixing the dustproof structure to the alignment unit. - 前記防塵膜は、波長440~780nmの光について、入射角-10°~10°における透過率が80%以上である、請求項1に記載の防塵構造体。 The dust-proof structure according to claim 1, wherein the dust-proof film has a transmittance of 80% or more at an incident angle of −10 ° to 10 ° for light having a wavelength of 440 to 780 nm.
- 前記防塵膜のハタメキ量が、-3.0mm~+3.0mmである、請求項1または2に記載の防塵構造体。 The dust-proof structure according to claim 1 or 2, wherein the dust-proof film has a hatameki amount of −3.0 mm to +3.0 mm.
- 前記枠体の一方面側は、前記防塵膜が配される部分と、前記防塵膜が配されていない部分と、を有し、
前記固定部は、前記枠体の一方面側における、前記防塵膜が配されていない部分に設けられる、請求項1~3のいずれか1項に記載の防塵構造体。 One surface side of the frame body has a portion where the dust-proof film is arranged and a portion where the dust-proof film is not arranged.
The dust-proof structure according to any one of claims 1 to 3, wherein the fixing portion is provided on one surface side of the frame body on a portion where the dust-proof film is not arranged. - 前記枠体に含まれる硫酸イオンが0.3ppm以下である、請求項1~4のいずれか1項に記載の防塵構造体。 The dustproof structure according to any one of claims 1 to 4, wherein the sulfate ion contained in the frame is 0.3 ppm or less.
- 前記枠体の他面側は、粘着層が形成されていない、非粘着面とされている、請求項1~5のいずれか1項に記載の防塵構造体。 The dustproof structure according to any one of claims 1 to 5, wherein the other surface side of the frame is a non-adhesive surface on which an adhesive layer is not formed.
- 計2つ以上計16つ以下の前記固定部を備える、請求項1~6のいずれか1項に記載の防塵構造体。 The dustproof structure according to any one of claims 1 to 6, further comprising the above-mentioned fixing portions having a total of 2 or more and 16 or less in total.
- 前記枠体は、前記開口を形成する内周部と、前記内周部の側面の一部から外側に突出する外側部と、を備える、請求項1~7のいずれか1項に記載の防塵構造体。 The dustproof according to any one of claims 1 to 7, wherein the frame includes an inner peripheral portion forming the opening and an outer peripheral portion protruding outward from a part of the side surface of the inner peripheral portion. Structure.
- 前記外側部は、前記防塵構造体をアライメントユニットにネジ固定するためのネジ溝及び/又はネジ孔を画定する前記固定部を有する、請求項8に記載の防塵構造体。 The dust-proof structure according to claim 8, wherein the outer portion has the fixing portion for defining a screw groove and / or a screw hole for screw-fixing the dust-proof structure to the alignment unit.
- 前記防塵構造体は、該防塵構造体を吊り上げ可能とする段差及び/又は傾斜を含む吊架受け部を有する、請求項1~7のいずれか1項に記載の防塵構造体。 The dust-proof structure according to any one of claims 1 to 7, wherein the dust-proof structure has a suspension receiving portion including a step and / or an inclination that enables the dust-proof structure to be lifted.
- 前記吊架受け部は、前記内周部における、前記外側部が形成された前記側面に設けられる、請求項10に記載の防塵構造体。 The dustproof structure according to claim 10, wherein the suspension receiving portion is provided on the side surface of the inner peripheral portion where the outer portion is formed.
- 前記枠体の平坦度が0超え200μm以下である、請求項1~11のいずれか1項に記載の防塵構造体。 The dustproof structure according to any one of claims 1 to 11, wherein the flatness of the frame is more than 0 and 200 μm or less.
- 前記防塵膜の膜厚は、1.5~8.0μmである、請求項1~12のいずれか1項に記載の防塵構造体。 The dust-proof structure according to any one of claims 1 to 12, wherein the dust-proof film has a film thickness of 1.5 to 8.0 μm.
- 前記固定部が想定するネジの中心軸を含み、かつ、前記防塵膜に直交する切断面視が、下記(1)~(3)のいずれかを満たす領域を含む、請求項1~13のいずれか1項に記載の防塵構造体。
(1)前記防塵膜が前記内周部に展張支持された部分の幅T1が、前記内周部の厚みH1を超える(T1>H1>0)
(2)前記外側部の厚みH2が、前記内周部の厚みH1の1/2以下(1/2・H1≧H2>0)である
(3)前記開口のネジ受け幅T3に対する、前記内周部及び前記外側部の合計幅T2の比(T2/T3)が1~13の範囲内である Any of claims 1 to 13, wherein the fixing portion includes the central axis of the screw assumed, and the cut plane orthogonal to the dustproof film includes a region satisfying any of the following (1) to (3). The dustproof structure according to item 1.
(1) The width T1 of the portion where the dust-proof film is stretched and supported on the inner peripheral portion exceeds the thickness H1 of the inner peripheral portion (T1>H1> 0).
(2) The thickness H2 of the outer portion is ½ or less (1/2 · H1 ≧ H2> 0) of the thickness H1 of the inner peripheral portion. The ratio (T2 / T3) of the total width T2 of the peripheral portion and the outer portion is in the range of 1 to 13. - 前記枠体と、前記防塵膜とは、互いに異なる固有振動数を有する、請求項1~14のいずれか1項に記載の防塵構造体。 The dust-proof structure according to any one of claims 1 to 14, wherein the frame and the dust-proof film have different natural frequencies from each other.
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JP2022543960A JP7375210B2 (en) | 2020-08-20 | 2021-08-17 | Dustproof structure for alignment unit |
KR1020237004088A KR20230035093A (en) | 2020-08-20 | 2021-08-17 | Anti-vibration structure for alignment unit |
CN202180050422.8A CN115956224A (en) | 2020-08-20 | 2021-08-17 | Dustproof structure for alignment unit |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07311157A (en) * | 1994-05-19 | 1995-11-28 | Hoya Corp | Inspection method and device for photomask |
JPH113854A (en) * | 1997-06-12 | 1999-01-06 | Nikon Corp | Aligner, exposure method and position sensing device |
JP2005203522A (en) * | 2004-01-14 | 2005-07-28 | Nikon Corp | Exposure method, aligner and device manufacturing method |
JP2006078346A (en) * | 2004-09-09 | 2006-03-23 | Mach Eng:Kk | Workpiece positioning device |
JP2013116518A (en) * | 2011-12-02 | 2013-06-13 | Disco Corp | Cutting device |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004093976A (en) * | 2002-08-30 | 2004-03-25 | Nsk Ltd | Alignment adjusting device |
JP2005116965A (en) | 2003-10-10 | 2005-04-28 | Canon Inc | Exposure system and its control method |
JP6376601B2 (en) * | 2015-05-18 | 2018-08-22 | 信越化学工業株式会社 | Pellicle support means, pellicle support apparatus and pellicle mounting method using the same |
-
2021
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- 2021-08-17 WO PCT/JP2021/030064 patent/WO2022039166A1/en active Application Filing
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07311157A (en) * | 1994-05-19 | 1995-11-28 | Hoya Corp | Inspection method and device for photomask |
JPH113854A (en) * | 1997-06-12 | 1999-01-06 | Nikon Corp | Aligner, exposure method and position sensing device |
JP2005203522A (en) * | 2004-01-14 | 2005-07-28 | Nikon Corp | Exposure method, aligner and device manufacturing method |
JP2006078346A (en) * | 2004-09-09 | 2006-03-23 | Mach Eng:Kk | Workpiece positioning device |
JP2013116518A (en) * | 2011-12-02 | 2013-06-13 | Disco Corp | Cutting device |
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JPWO2022039166A1 (en) | 2022-02-24 |
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