WO2022039166A1 - Dustproof structure for alignment unit - Google Patents

Dustproof structure for alignment unit Download PDF

Info

Publication number
WO2022039166A1
WO2022039166A1 PCT/JP2021/030064 JP2021030064W WO2022039166A1 WO 2022039166 A1 WO2022039166 A1 WO 2022039166A1 JP 2021030064 W JP2021030064 W JP 2021030064W WO 2022039166 A1 WO2022039166 A1 WO 2022039166A1
Authority
WO
WIPO (PCT)
Prior art keywords
dust
dustproof
proof
film
frame body
Prior art date
Application number
PCT/JP2021/030064
Other languages
French (fr)
Japanese (ja)
Inventor
政勝 平野
健一 黒川
Original Assignee
旭化成株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 旭化成株式会社 filed Critical 旭化成株式会社
Priority to JP2022543960A priority Critical patent/JP7375210B2/en
Priority to KR1020237004088A priority patent/KR20230035093A/en
Priority to CN202180050422.8A priority patent/CN115956224A/en
Publication of WO2022039166A1 publication Critical patent/WO2022039166A1/en

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Definitions

  • the present invention relates to a dustproof structure for an alignment unit.
  • a mirror projection optical type exposure apparatus or the like As a batch exposure to such a large area, a mirror projection optical type exposure apparatus or the like has been put on the market.
  • the basic configuration of a mirror projection optical exposure system consists of a large concave mirror, a small convex mirror, and a trapezoidal mirror manufactured with extreme processing accuracy.
  • the photomask mounted on the upper part of the unit is irradiated with ultraviolet rays, and the circuit pattern on the photomask is transferred and exposed on the glass substrate after being reflected a plurality of times (for example, 5 times).
  • AS method Alignment Scope method
  • OAS method Off-axis Scope method
  • the device that performs the above measurement by the AS method and / or the OAS method is called, for example, an alignment unit, and is used in combination with the exposure device.
  • the measurement unit (lens unit) in the OAS method is located closer to the substrate stage than the measurement unit (lens unit) in the AS system, in the OAS system, when the exposure apparatus is driven (that is, the substrate stage). It is easily affected by dust generated during driving in the X and Y directions. Excessive influence of such dust causes a problem that accurate alignment becomes difficult. Therefore, for example, in the OAS method, it is conceivable to arrange a dustproof cover on the lens portion of the alignment unit. However, no suitable dustproof cover for the OAS type alignment unit has been proposed.
  • the OAS alignment unit has different conditions such as spatial restrictions compared to the AS alignment and being affected by wind pressure due to the high-speed movement of the substrate stage.
  • the pellicle to be used (a pellicle having a pellicle film on one side of the frame and an adhesive layer for masking on the other side) cannot be used as it is.
  • the present invention has been proposed in view of such conventional circumstances, and an object of the present invention is to provide a dustproof structure suitable as a dustproof cover for an OAS type alignment unit.
  • the frame that forms the opening and On one side of the frame, a dustproof film stretched and supported so as to cover the opening, It is a dustproof structure equipped with A dustproof structure for an alignment unit, comprising at least one of a fixing portion for mechanically fixing the dustproof structure to the alignment unit and a magnet for fixing the dustproof structure to the alignment unit.
  • a dustproof structure for an alignment unit comprising at least one of a fixing portion for mechanically fixing the dustproof structure to the alignment unit and a magnet for fixing the dustproof structure to the alignment unit.
  • the dust-proof film has a transmittance of 80% or more at an incident angle of ⁇ 10 ° to 10 ° for light having a wavelength of 440 to 780 nm.
  • the dust-proof structure according to any one of [1] to [12], wherein the dust-proof film has a film thickness of 1.5 to 8.0 ⁇ m.
  • the fixing portion includes the central axis of the screw assumed, and the cut plane view orthogonal to the dustproof film includes a region satisfying any one of the following (1) to (3).
  • the dustproof structure according to any one of. (1) The width T1 of the portion where the dust-proof film is stretched and supported on the inner peripheral portion exceeds the thickness H1 of the inner peripheral portion (T1>H1> 0). (2) The thickness H2 of the outer portion is 1 ⁇ 2 or less (1/2 ⁇ H1 ⁇ H2> 0) of the thickness H1 of the inner peripheral portion.
  • the ratio (T2 / T3) of the total width T2 of the peripheral portion and the outer portion is in the range of 1 to 13 [15].
  • the dust-proof structure according to any one of [1] to [14], wherein the frame and the dust-proof film have different natural frequencies from each other.
  • a dustproof structure for an alignment device which is suitable as a dustproof cover for an OAS type alignment device.
  • FIG. 1A and 1B are views schematically showing a configuration example of a dustproof structure of the present embodiment, where FIG. 1A is a plan view and FIG. 1B is a cross-sectional view.
  • the dust-proof structure 1 of the present embodiment is a dust-proof structure for an alignment unit, and is a dust-proof structure having an opening 2a and a dust-proof film stretched and supported on one side of the frame 2 so as to cover the opening 2a. 3 and a fixing portion for mechanically fixing the dustproof structure 1 to the alignment unit are provided.
  • the dustproof structure 1 of the present embodiment is suitable as a dustproof cover for an OAS type alignment unit.
  • an exposure apparatus provided with an OAS type alignment unit to which the dustproof structure 1 of the present embodiment is applied will be described.
  • FIG. 2 and 3 are diagrams schematically showing an example of a configuration of an exposure apparatus, in which FIG. 2 mainly shows an exposure optical system, and FIG. 3 mainly shows an alignment optical system.
  • the mask 11 on which the pattern 11a is formed, the mask stage 12 on which the mask 11 is mounted and movable in the X, Y, and ⁇ directions, and various patterns (for example, circuit patterns and pixel patterns) are photolithographic. It includes a substrate 13 formed by means, a substrate stage 14 that holds the substrate 13 and can move in the X, Y, and ⁇ directions, an illumination optical system 15, and a mirror projection system.
  • the mask stage 12 and the substrate stage 14 are moved in the X and Y directions by motors (not shown), respectively.
  • the illumination optical system 15 illuminates the mask 11 at the exposure position with light having a specific wavelength, and exposes the photosensitive layer 13a (resist) on the substrate 13 via the pattern 11a on the mask 11 to expose the mask 11 on the mask 11.
  • Pattern 11a can be transferred to the substrate 13.
  • the mirror projection system is composed of a combination of a concave mirror 16, a convex mirror 17, and a bending mirror 18 (trapezoidal mirror), and projects a pattern image of the mask 11 aligned at a predetermined position by the mask stage 12 on the substrate 13 at the same magnification. ..
  • the pattern 11a drawn on the mask 11 is transferred to the photosensitive layer 13a (resist) on the substrate 13.
  • the pattern is transferred to the entire surface of the substrate 13.
  • the alignment optical system includes an alignment scope (AS: AlignmentScope) 20 and an off-axis alignment scope (OAS: Off-axisScope) 21 as shown in FIG.
  • the AS 20 uses the exposure light emitted from the illumination optical system 15 and measures the overlapping state of the alignment marks of the mask 11 and the substrate 13 through the optical path of the exposure optical system.
  • the OAS 21 includes an illumination unit 21a that irradiates an illumination light (non-exposure light) having a wavelength different from that of the exposure light on the alignment mark on the substrate 13, and an image pickup unit (not shown) that captures the reflected light.
  • an illumination unit 21a that irradiates an illumination light (non-exposure light) having a wavelength different from that of the exposure light on the alignment mark on the substrate 13, and an image pickup unit (not shown) that captures the reflected light.
  • the captured image is measured and processed by an image processing device (not shown) to acquire the position of the alignment mark. Then, each correction amount (shift component of X and Y, rotation component, magnification component of X and Y, squareness component of X and Y) is calculated from this measurement result.
  • the control device (not shown) that controls the mask stage 12 and the substrate stage 14 corrects the magnification of the mirror projection system, the position / rotation of the substrate stage 14, and the synchronization deviation amount between the mask stage 12 and the substrate stage 14 according to the correction amount. While doing so, the exposure process is performed.
  • the dustproof structure 1 of the present embodiment is used, for example, attached to the lower part of the OAS 21 in the exposure apparatus 10 as described above (see FIG. 3). Hereinafter, the dustproof structure 1 of the present embodiment will be described.
  • the dust-proof structure 1 is a dust-proof structure for an alignment unit, and includes a frame body 2 forming an opening 2a and a dust-proof film 3 stretched and supported on one side of the frame body 2 so as to cover the opening 2a. , Equipped with.
  • the dustproof structure 1 of the present embodiment includes a fixing portion for mechanically fixing the dustproof structure 1 to the alignment unit (OAS21).
  • the frame body 2 extends and supports the dust-proof film 3, and also includes a fixing portion for attaching the dust-proof structure 1 to the alignment unit.
  • the frame body 2 can have an arbitrary form such that the dustproof film 3 can be stretched on the frame body 2, and for example, when the frame body 2 is viewed from the front, it has a square shape, a polygonal shape, a circular shape, an elliptical shape, or the like. Can have the outer shape of.
  • the square is a square, a rectangle, or the like, and can have both a case where the corners are right angles and a case where the corners are rounded.
  • the polygon is a triangle, a trapezoid, a parallelogram, a pentagon, a hexagon, or the like.
  • the frame body 2 has an edge portion.
  • the edge portion can have a rod-shaped edge member extending linearly.
  • the pair of edge members can be spaced parallel to each other, and similarly, the other pair of edge members can be spaced parallel to each other.
  • the ends of the two rim members in contact can be connected so that they form a substantially right angle to each other. Then, the opening 2a is defined by the edge member connected to the closed shape.
  • the frame 2 and its edge members are, for example, aluminum; aluminum alloy (for example, 5000 series, 6000 series, 7000 series, etc.); steel; stainless steel; magnesium alloy; ceramics (for example, SiC, AlN, Al 2 O 3 etc.); Composite materials of ceramics and metals (eg Al-SiC, Al-AlN, Al-Al 2 O 3 etc.); Engineering plastics such as PE, PA, PC, PEEK; Fiber composite materials such as GFRP, CFRP; or these It can be formed of a known material such as a combination of.
  • an anodized film may be formed by alumite treatment.
  • alumite generally include sulfuric acid alumite using a sulfuric acid bath and oxalic acid alumite using an oxalic acid bath as a treatment bath for electrolytic treatment, but those containing substantially no sulfuric acid (sulfuric acid-free). Is preferable.
  • the sulfate ion contained in the frame 2 is preferably 0.3 ppm or less.
  • the heat of the exposure light may generate ions and outgas from the photosensitive layer and the like. Further, the oxide film on the surface of the frame may be decomposed.
  • the generated sulfate ion reacts with the above-mentioned ions, outgas, etc. (ammonia in the atmosphere, etc.) to cause fogging on the dustproof film 3, and alignment cannot be measured accurately and quickly. there is a possibility.
  • the dustproof structure 1 of the present embodiment in which the sulfate ion contained in the frame 2 is 0.3 ppm or less can reduce the possibility that such a situation occurs.
  • the sulfate ion as described above can be used. It is possible to suppress the generation of cloudiness and the decrease in haze due to the reaction between and ammonia.
  • the size of the frame 2 and its opening 2a is determined according to the size of the OAS 21.
  • the frame body 2 has a rectangular shape consisting of a pair of long sides and a pair of short sides in a front view
  • the long side length is 300 mm to 1000 mm
  • the short side length is 300 mm to 1000 mm
  • the widths of the short sides can be 4.0 mm to 50.0 mm, respectively, and / or the height of the frame can be 1.5 mm to 12.0 mm.
  • the ratio (t / w) of the thickness (indicated by t in FIG. 1) to the width (indicated by w in FIG. 1) is preferably 30% or less. Since there is a restriction on the thickness of the space where the dustproof structure 1 can be attached (for example, the gap between the members shown in s in FIG. 3), when the dustproof structure 1 is attached to the alignment unit by making the frame 2 thin. In addition to being able to clear the spatial restrictions of, it is also possible to ensure workability when mechanically fixing. Further, since the dustproof structure 1 is thin, the influence of the OAS 21 on the alignment accuracy can be suppressed to a small extent.
  • the lower limit of the ratio of the thickness (t / w) to the width of the frame 2 is preferably 5% or more from the viewpoint of rigidity and suppression of strain.
  • the ratio of the thickness (t / w) to the width on at least one side is within the above range.
  • the flatness of the frame 2 is preferably more than 0 and 200 ⁇ m or less, and more preferably more than 0 and 150 ⁇ m or less.
  • "flatness" is a measured value of swell from the stone surface plate of the frame body 2.
  • the frame 2 is placed on a stone surface plate, a laser is emitted from the upper part of the frame 2 (opposite the stone surface plate), and the thickness is measured with a laser displacement meter.
  • the stone surface plate as the zero point, the distance from the frame 2 on the incoming light side to the stone surface plate is measured.
  • the number of measurements is set to 5 points on one side, points 20 mm from both ends of the side are measured, and measurements are made so that there are 3 points at equal intervals between them. This is performed on the four sides, and the difference in height between the highest point and the lowest point from the zero point on the four sides is the flatness.
  • the dustproof structure has less bending when attached to the alignment unit.
  • the dust-proof film 3 is a transparent thin film (pellicle) that prevents dust from adhering to the alignment unit without interfering with the optical function of the alignment unit. As shown in FIG. 1B, the dustproof film 3 is stretched, adhered and fixed on one side of the frame 2 so as to cover the opening 2a by an adhesive (not shown).
  • the dustproof film 3 preferably has a transmittance of 80% or more at an incident angle of ⁇ 10 ° to 10 ° for light having a wavelength of 440 to 780 nm.
  • the dust-proof film 3 preferably has a transmittance of 80% or more at an incident angle of ⁇ 10 ° to 10 ° for any light having a wavelength of 440 to 780 nm.
  • the amount of hatameki of the dustproof film 3 is preferably ⁇ 3.0 mm to +3.0 mm.
  • “the amount of Hatameki of the dustproof film 3” means the value which can be measured as follows. That is, as shown in FIG. 1, the frame has an outer diameter of 200 mm ⁇ 600 mm, the long side width is 10 mm, the short side width (w in FIG. 1B) is 10 mm, and the height (FIG. 1).
  • a frame body 2 made of an aluminum alloy having an alumite-treated surface and having a thickness t) of 3 mm in (b) is prepared.
  • a film adhesive is applied to one surface of the prepared aluminum alloy frame 2, and the dustproof film 3 is spread.
  • a double-sided tape is attached to the opposite surface on which the dustproof film 3 is spread, and the double-sided tape is attached to an acrylic plate that is one size larger than the frame 2.
  • the fan With the dustproof membrane 3 facing down, the fan is blown along the membrane in weak mode. It is the value measured by the laser displacement meter at the most bent part in the blown state.
  • the negative value is based on the virtual surface (0 mm) that passes through the surface of the frame body 2 on which the dust-proof film 3 is spread, and the dust-proof film 3 is on the opening 2a side (the dust-proof structure is an acrylic plate).
  • the amount of flutter that bends on the acrylic plate side when attached) is shown, and a positive value indicates the amount of flutter that the dustproof film 3 bends on the side opposite to the opening 2a.
  • the OAS 21 is arranged on the upper part of the substrate 13 on which the photosensitive layer 13a (resist) is formed. Since the OAS 21 is arranged independently of the plate operation system, the OAS 21 itself does not move with respect to the movement of the substrate stage 14, but the substrate 13 arranged on the substrate stage 14 moves, and at this time, it is considerably fast. Move at speed. As shown by s in FIG. 3, the thickness of the space to which the dustproof structure 1 is attached is very small, and the distance between the dustproof structure 1 (dustproof film 3) and the photosensitive layer 13a (resist) on the surface of the substrate 13 is a number. There is only about mm. Therefore, the dustproof film 3 flutters due to the wind pressure generated by the high-speed movement of the substrate 13.
  • the dust-proof film 3 may come into contact with the resist.
  • the amount of the dust-proof film 3 it is possible to prevent the dust-proof film 3 from coming into contact with other members.
  • the material constituting such a dustproof film 3 is not particularly limited as long as it is a transparent thin film, but for example, nitrocellulose, a cellulose derivative, and a fluoropolymer are preferable. As a result, the light emitted by the light source can be sufficiently transmitted in the OAS alignment, and the amount of fluttering can be reduced, for example, within the above range.
  • the film thickness of the dustproof film 3 is preferably 1.5 ⁇ m to 8.0 ⁇ m.
  • the frame body 2 and the dustproof film 3 have different natural frequencies from each other. This makes it possible to prevent the frame body 2 of the dustproof structure 1 and the dustproof film 3 from resonating due to the vibration of the alignment unit.
  • the fixing portion is a means for mechanically fixing the dustproof structure 1 to the alignment unit, and is integrally formed with the frame body 2 in the present embodiment.
  • the "fixing portion” is a frame body surface corresponding to the screws and clips when the dustproof structure 1 is fixed to the alignment unit by using screws, clips and the like.
  • the screw or clip is not the fixed portion, but the frame surface that forms the screw hole or the frame surface to which the clip is attached is the "fixed portion”.
  • the "mechanical fixing means” means a fixing means other than adhesive fixing by an adhesive, and the means thereof is not particularly limited.
  • the dust-proof structure 1 can be surely attached to the alignment unit and the dust-proof structure 1 can be prevented from falling as compared with the fixing by the adhesive. Further, according to the mechanical fixing means, it is possible to avoid the situation where the adhesive component is scattered.
  • the other surface side of the frame 2 is a non-adhesive surface on which an adhesive layer (layer containing an adhesive or an adhesive tape) is not formed.
  • the frame body 2 is formed with a screw hole 4a and / or a screw groove 4b as a fixing portion, and the dustproof structure 1 is fixed to the OAS 21 by a screw.
  • a plurality of screw holes 4a and screw grooves 4b are formed through the frame body 2, and a screw (male screw) is inserted through the screw holes 4a and the screw groove 4b to form a screw on the OAS side.
  • the dustproof structure 1 is attached to the OAS 21 by screwing it into a hole (female screw) and a screw hole (female screw). According to the screw, the fixing force can be easily adjusted by adjusting the tightening strength, and the dustproof structure 1 can be prevented from falling.
  • simple fixing temporary fixing at the time of installation is also possible.
  • a screw groove 4b flat U-shaped shape
  • the fixing portions facing each other across the opening 2a have the same structure. That is, when the frame body 2 has, for example, a rectangular shape having a long side and a short side, the fixed portion arranged on the short side portion and the fixed portion arranged on the long side portion have the same configuration. It is preferable to have.
  • the fixing portion having the screw hole 4a (the fixing portion arranged on the short side portion) faces the opening 2a
  • the fixing portion having the screw groove 4b (the fixing portion) (Fixed parts arranged on the long side) face each other.
  • one surface side of the frame body 2 has a portion where the dustproof film 3 is arranged and a portion where the dustproof film 3 is not arranged, and the fixing portion is the one surface side of the frame body 2.
  • the portion where the dustproof film 3 is not arranged That is, in the present embodiment, one side of the frame 2 has a portion where the dustproof film 3 is arranged and a portion where the dustproof film 3 is not arranged, and the one side of the frame 2 has a portion.
  • a screw hole 4a and a screw groove 4b are provided so as to penetrate the portion where the dustproof film 3 is not arranged. According to this, it becomes easy to suppress the bending of the dustproof film 3 due to the work of fixing or loosening the screw.
  • the thread groove 4b having the hole open has less force applied to the frame body 2 when tightened to the same extent.
  • the dustproof structure 1 is securely fixed to the OAS 21. Therefore, from the viewpoint of securely fixing the dustproof structure 1 to the OAS 21 while reducing the distortion of the frame body 2, for example, when the frame body 2 has a rectangular shape having a long side and a short side, a screw hole 4a is provided. It is preferable that the fixing portion having the fixing portion is arranged on the short side portion and the fixing portion having the thread groove 4b is arranged on the long side portion.
  • the fixed portions are arranged so as to face each other with the opening 2a interposed therebetween.
  • the frame body 2 can have an outer shape such as a square, a polygon, a circle, or an ellipse when viewed from the front.
  • the fixing portions are arranged so as to face each other with the opening 2a interposed therebetween, so that the dustproof structure 1 can be more preferably fixed to the OA21.
  • the dustproof structure 1 preferably includes the same or different fixing portions in a range of 2 or more and 16 or less in total, and more preferably 4 or more and 10 or less in total.
  • the dust-proof structure 1 of the present embodiment includes a total of eight fixing portions (screw holes 4a and / or screw grooves 4b), whereby the dust-proof structure 1 can be more preferably fixed to the OAS 21. ..
  • the fixing portion includes a receiving portion for receiving the mechanical fixing means other than the screw.
  • the receiving portion has at least a surface in contact with the frame body 2 (at least the mechanical fixing means other than the screw is the frame body). Concave and / or convex portions, including a shape corresponding to the surface in contact with the surface).
  • FIG. 4 is a diagram for explaining a dustproof structure according to another embodiment of the present invention.
  • all the fixing portions are configured as screw holes 4a.
  • all the fixing portions are configured as screw grooves 4b.
  • Any dust-proof structure is suitable as a dust-proof cover for an OAS type alignment unit, like the dust-proof structure 1.
  • FIG. 5 is a diagram schematically showing a configuration example of a dustproof structure according to the second embodiment of the present invention.
  • the frame body 2A of the dustproof structure 1A includes an inner frame body (inner peripheral portion) 2b forming an opening 2a and an outer frame body (outer frame portion) 2c arranged outside the inner frame body 2b. , Equipped with.
  • the outer frame body 2c projects outward from a part of the side surface of the inner frame body 2b.
  • the outer frame body 2c and the inner frame body 2b are integrally configured, and the thickness of the outer frame body 2c is thinner than the thickness of the inner frame body 2b. Then, the surface of the outer frame body 2c on the side attached to the alignment unit and the surface of the inner frame body 2b on the side attached to the alignment unit are continuously connected to each other on the side attached to the alignment unit in the dustproof structure 1A.
  • the outer peripheral side surface of the inner frame body 2b is continuous between the surface of the inner frame body 2b on the dustproof film 3 side and the surface of the outer frame body 2c on the dustproof film 3 side.
  • the outer frame body 2c can continuously surround the outer periphery of the inner frame body 2b, but it may not surround the outer frame body 2c.
  • a plurality of outer frame bodies 2c are discontinuous from the inner frame body 2b to the outer peripheral side thereof at predetermined intervals along the outer peripheral direction of the inner frame body 2b.
  • a shape that protrudes from the ground is constructed.
  • the outer frame body 2c and the inner frame body 2b are integrally configured, but the outer frame body 2c and the inner frame body 2b may be configured separately. Having such a configuration also facilitates the realization of a suitable configuration as a dustproof cover for an OAS type alignment unit.
  • the dust-proof film 3 is stretched and supported on the surface of the inner frame body 2b on the dust-proof film 3 side.
  • the outer frame 2c has a fixing portion for defining a screw hole 4a and / or a screw groove 4b for mechanically fixing the dustproof structure 1A to the alignment unit.
  • the screw holes 4a and the screw grooves 4b are provided so as to penetrate the outer frame body 2c in the height direction (direction along the thickness t in FIG. 1B). This makes it easier to realize a configuration suitable for a dustproof cover for an OAS type alignment unit.
  • the screw hole 4a and the screw groove 4b are provided, but the screw hole 4a or the screw groove 4b may not be provided.
  • the dustproof structure 1A according to the second embodiment has a suspension receiving portion including a step and / or an inclination that enables the dustproof structure 1A to be lifted.
  • a suspension receiving portion including a step and / or an inclination that enables the dustproof structure 1A to be lifted.
  • the recesses 5a are continuously formed, and here, the recesses 5a that go around the frame 2A in the circumferential direction are formed. This makes it easier to mechanically handle the dustproof structure 1A, for example, the jig or the like can be lifted or moved while being hooked on the recess 5a.
  • the recess 5a can also be formed discontinuously on the outer peripheral side surface of the inner frame body 2b.
  • the frame body 2A of the dustproof structure 1A has a plurality of discontinuous recesses 5a.
  • the recesses (discontinuous recesses) 5a formed on the pair of short sides form the pair of recesses 5a
  • the recesses) 5a preferably form a pair of recesses 5a. This also makes it easier to mechanically handle the dustproof structure 1A, for example, the jig or the like can be lifted or moved while being hooked on the recess 5a.
  • the suspension receiving portion in the example shown in FIG. 6A, between the surface of the inner frame body 2b on the dustproof film 3 side and the surface of the outer frame body 2c on the dustproof film 3 side. At least a part of the surface (the outer peripheral side surface of the inner frame body 2b) is formed with a widening portion whose width increases as the distance from the outer frame body 2c increases.
  • a tapered portion 5b whose width gradually increases as the distance from the outer frame body 2c increases is formed.
  • a tapered portion 5b is formed that continuously goes around the frame body 2 in the circumferential direction.
  • the widened portion also includes a staircase shape whose width increases discontinuously as the distance from the outer frame body 2c increases.
  • a convex portion 5c protruding on the side opposite to the opening 2a is formed on the outer peripheral side surface of the body 2b).
  • a convex portion 5c that continuously goes around the frame body 2A in the circumferential direction is formed.
  • a recess 5d recessed in a stepped manner is formed on the opening 2a side.
  • a recess 5d that continuously goes around the frame body 2A in the circumferential direction is formed.
  • tapered portions 5b, convex portions 5c or concave portions 5d can also be discontinuously formed on the outer peripheral side surface of the inner frame body 2b.
  • the tapered portion 5b, the convex portion 5c or the concave portion 5d (discontinuous tapered portion 5b, the convex portion 5c or the concave portion 5d) formed on the pair of short sides respectively has a pair of tapered portions 5b, the convex portion 5c or the concave portion 5d.
  • the concave portion 5d, and the tapered portion 5b, the convex portion 5c or the concave portion 5d are continuous tapered portion 5b, the convex portion 5c or the concave portion 5d formed on each of the pair of long sides is paired. It is preferable to form the tapered portion 5b, the convex portion 5c or the concave portion 5d.
  • the surface of the dustproof structure 1A on the side attached to the alignment unit (the surface on the outer frame body 2c on the side attached to the alignment unit and the surface on the inner frame body 2b on the side attached to the alignment unit), slides are made.
  • a valley portion (not shown) may be formed.
  • the alignment unit is formed with a slide ridge corresponding to the slide valley. The slide valley portion of the dustproof structure 1A can be guided to the slide mountain portion of the alignment unit, and if necessary, the dustproof structure 1A can be slid on the alignment unit. This facilitates the alignment of the dustproof structure 1A and the alignment unit, and facilitates mechanical fixing of both.
  • a slide mountain portion may be provided on the dustproof structure 1A side, and a slide valley portion may be provided on the alignment unit side.
  • the cut plane views including the central axis of the screw assumed by the fixing portion and orthogonal to the dustproof film 3 are as follows (1) to (3). ) Satisfying any of).
  • the width T1 of the portion where the dustproof film 3 is stretched and supported by the inner frame body (inner peripheral portion) 2b exceeds the thickness H1 of the inner frame body (inner peripheral portion) 2b (T1>H1> 0).
  • the thickness H2 of the outer frame body (outer portion) 2c is 1 ⁇ 2 or less (1/2 ⁇ H1 ⁇ H2> 0) of the thickness H1 of the inner frame body (inner peripheral portion) 2b.
  • the ratio (T2 / T3) of the total width T2 of the inner frame body (inner peripheral portion) 2b and the outer frame body (outer portion) 2c to the screw receiving width T3 of the opening of the screw hole 4a or the screw groove 4b is 1. It is within the range of ⁇ 13.
  • the dustproof structure 1A can be set while the alignment scope is arranged near the stage. The dustproof structure 1A can be set on the alignment scope even when space restrictions are severe.
  • H1 Since H1 is large, the rigidity of the frame body 2A can be ensured. Further, since H2 is small, it is possible to secure a side surface on which the suspension receiving portion is formed. (3) When T2 / T3 is in the above range, the ratio of the portion where the fixing force acts to the mounting surface to the alignment unit can be balanced.
  • the present invention is based on the premise that it belongs to a technical field in which extremely high flatness is indispensable, and in order to solve the problems peculiar to the alignment application, the above configuration makes it possible to have excellent handleability and a frame body, which are the problems peculiar to the alignment application.
  • the purpose is to prevent distortion as a whole and suppress a decrease in rigidity.
  • the screwing function of the dustproof structure 1A is intentionally separated from the inner frame body 2b, and the function is newly added. It is configured to be held in the outer frame body 2c.
  • the guide of the lifting device of the dustproof structure 1A is arranged on the outer frame body 2c. I was able to add a function.
  • all the fixing portions may be configured as screw holes 4a. Further, all the fixing portions may be configured as thread grooves 4b.
  • FIG. 8 is a diagram schematically showing a configuration example of the dustproof structure according to the second embodiment of the present invention.
  • the dustproof structure 1B of the present embodiment includes a magnet 6 for fixing the dustproof structure 1B to the alignment unit.
  • the magnet 6 as a fixing portion is arranged on the frame body 2B, and the dustproof structure 1B is fixed to the OAS 21 by the magnet 6.
  • the magnet 6 is formed so as to make a continuous circumference in the circumferential direction of the frame body 2B. According to the magnet, the fixing force can be easily adjusted by adjusting the strength of the magnetic force, and the dustproof structure 1 can be prevented from falling. In addition, the work at the time of installation is easy.
  • the fixing portions facing each other with the opening 2a sandwiched have the same structure. That is, when the frame body 2B has, for example, a rectangular shape having a long side and a short side, the fixed portion arranged on the short side portion and the fixed portion arranged on the long side portion have the same configuration. It is preferable to have.
  • magnets 6 can also be discontinuously arranged on the outer peripheral side surface of the inner frame body 2b. At this time, it is preferable that the magnets 6 (discontinuous magnets 6) arranged on the pair of short sides form the pair of magnets 6, and the magnets 6 (discontinuous magnets 6) arranged on the pair of long sides respectively. It is preferable that the continuous magnets 6) form a pair of magnets 6.
  • the frame 2B provided with the magnet 6 according to the third embodiment may also be formed with a suspension receiving portion including a step and / or an inclination that enables the dustproof structure 1B to be lifted.
  • the suspension receiving portion may have the same configuration as the concave portion 5a, the tapered portion 5b, the convex portion 5c, and the stepped concave portion 5d as described in the second embodiment.
  • fixing with screws and fixing with magnets can be combined. That is, a screw hole 4a or a screw groove 4b may be formed in the frame body 2 (2A, 2B), and a magnet 6 may be arranged.
  • the second embodiment, the third embodiment and other embodiments related thereto, and further other embodiments described above can be combined with each other.
  • the surface between the surface on the dust-proof film side of the inner frame and the surface on the dust-proof film side of the outer frame is a concave portion, a convex portion, and a tapered portion (widening portion). And can have at least two at the same time.
  • the second embodiment, the third embodiment and other embodiments related thereto, and further other embodiments described above can be combined with the above-described first embodiment.
  • the dust-proof structure according to the present invention it becomes suitable as a dust-proof cover for an OAS type alignment unit, and can be widely used as a dust-proof structure for an alignment unit.

Abstract

Provided is a dustproof structure for an alignment unit, which is suitable as a dustproof cover for an OAS type alignment unit. This dustproof structure for an alignment unit comprises a frame that forms an opening and a dustproof film that is stretched and supported on one side of the frame so as to cover the opening, and also comprises a securing portion for mechanically securing the dustproof structure to the alignment unit and/or a magnet for securing the dustproof structure to the alignment unit.

Description

アライメントユニット用の防塵構造体Dustproof structure for alignment unit
 本発明は、アライメントユニット用の防塵構造体に関するものである。 The present invention relates to a dustproof structure for an alignment unit.
 フォトリソグラフィの世界では、半導体のICチップのような小面積への露光に加え、液晶ディスプレイなどのフラットパネルディスプレイのような、より広い面積への一括露光技術が開発されている。 In the world of photolithography, in addition to exposure to a small area such as a semiconductor IC chip, batch exposure technology to a wider area such as a flat panel display such as a liquid crystal display has been developed.
 このような大面積への一括露光として、ミラー投影光学方式の露光装置等が上市されている。
 ミラー投影光学方式の露光装置の基本構成は、極限の加工精度で造られた大きな凹面ミラーと小さな凸面ミラー、および台形ミラーからなる。ユニット上部に装着されたフォトマスクに紫外線を照射し、複数回(例えば、5回)の反射を経てガラス基板上にフォトマスク上の回路パターンを転写露光する。
As a batch exposure to such a large area, a mirror projection optical type exposure apparatus or the like has been put on the market.
The basic configuration of a mirror projection optical exposure system consists of a large concave mirror, a small convex mirror, and a trapezoidal mirror manufactured with extreme processing accuracy. The photomask mounted on the upper part of the unit is irradiated with ultraviolet rays, and the circuit pattern on the photomask is transferred and exposed on the glass substrate after being reflected a plurality of times (for example, 5 times).
 近年、フラットパネル業界では、スマートフォンやタブレット端末等向けにパターンの高精細化が進んでいる。そして、高精細化を実現するための手法の一つとして、露光装置内での露光光の焦点位置を露光基板の面位置と一致させてスキャン露光させることが望まれている。この場合、より迅速で正確なアライメント技術の開発も必要とされる。しかし、ガラス基板は熱処理などを経ると基板の絶対寸法自体が変化してしまうことがあるため、前工程で形成されたパターン座標にはさまざまな歪みが生じており、この歪みの状態を正確に把握するために多くの基準点の位置計測が必要となる。 In recent years, in the flat panel industry, high-definition patterns are progressing for smartphones, tablet terminals, and the like. Then, as one of the methods for realizing high definition, it is desired to perform scan exposure by matching the focal position of the exposure light in the exposure apparatus with the surface position of the exposure substrate. In this case, it is also necessary to develop a faster and more accurate alignment technique. However, since the absolute dimensions of the glass substrate may change after heat treatment, the pattern coordinates formed in the previous process are distorted in various ways, and the state of this distortion is accurate. It is necessary to measure the position of many reference points in order to grasp.
 従来は、実際のミラー光学系の光路を通してフォトマスクと基板のアライメントマークの重なり状態を計測する方式(AS方式:Alignment Scope方式)が採用されていたが、近年では、光路を通さずに基板の近くで直接マークを観測し、間接的に位置合わせをする新たな計測方式(OAS方式:Off-axis Scope方式)が導入されている(例えば、特許文献1)。AS方式及び/又はOAS方式により上記の計測を行う装置は、例えばアライメントユニットと呼ばれ、露光装置と組み合わせて用いられる。 In the past, a method (AS method: Alignment Scope method) was adopted in which the overlapping state of the photomask and the alignment mark on the substrate was measured through the optical path of the actual mirror optical system, but in recent years, the substrate has not passed through the optical path. A new measurement method (OAS method: Off-axis Scope method) that directly observes a mark in the vicinity and indirectly aligns the mark has been introduced (for example, Patent Document 1). The device that performs the above measurement by the AS method and / or the OAS method is called, for example, an alignment unit, and is used in combination with the exposure device.
特開2005-116965号公報Japanese Unexamined Patent Publication No. 2005-116965
 OAS方式での計測部(レンズ部)は、AS方式での計測部(レンズ部)よりも基板ステージに近い位置に配されるため、OAS方式では、露光装置の駆動時(すなわち、基板ステージのX,Y方向への駆動時)に発生する塵埃の影響を受け易い。かかる塵埃の影響を過度に受けると、正確なアライメントが困難になる問題が生じる。
 そこで、例えばOAS方式において、アライメントユニットのレンズ部に防塵カバーを配することが考えられる。しかしながら、OAS方式のアライメントユニット用の防塵カバーとして好適なものは提案されていなかった。OAS方式のアライメントユニットでは、AS方式に比べて空間的制約があることや、基板ステージの高速移動による風圧の影響を受けるなど、条件が異なることから、AS方式のアライメントユニットにおいて防塵等のために用いられるペリクル(枠体の一面側にペリクル膜を有し、他面側にマスク用粘着層を有するペリクル)をそのまま用いることはできない。
Since the measurement unit (lens unit) in the OAS method is located closer to the substrate stage than the measurement unit (lens unit) in the AS system, in the OAS system, when the exposure apparatus is driven (that is, the substrate stage). It is easily affected by dust generated during driving in the X and Y directions. Excessive influence of such dust causes a problem that accurate alignment becomes difficult.
Therefore, for example, in the OAS method, it is conceivable to arrange a dustproof cover on the lens portion of the alignment unit. However, no suitable dustproof cover for the OAS type alignment unit has been proposed. The OAS alignment unit has different conditions such as spatial restrictions compared to the AS alignment and being affected by wind pressure due to the high-speed movement of the substrate stage. The pellicle to be used (a pellicle having a pellicle film on one side of the frame and an adhesive layer for masking on the other side) cannot be used as it is.
 本発明は、このような従来の実情に鑑みて提案されたものであり、本発明の目的は、OAS方式のアライメントユニット用の防塵カバーとして好適な、防塵構造体を提供することにある。 The present invention has been proposed in view of such conventional circumstances, and an object of the present invention is to provide a dustproof structure suitable as a dustproof cover for an OAS type alignment unit.
[1]
 開口を形成する枠体と、
 前記枠体の一方面側に、前記開口を覆うように展張支持された防塵膜と、
を備えた防塵構造体であって、
 前記防塵構造体をアライメントユニットに機械的に固定するための固定部と、前記防塵構造体をアライメントユニットに固定するための磁石と、の少なくとも一方を備える、アライメントユニット用の防塵構造体。
[2]
 前記防塵膜は、波長440~780nmの光について、入射角-10°~10°における透過率が80%以上である、[1]に記載の防塵構造体。
[3]
 前記防塵膜のハタメキ量が、-3.0mm~+3.0mmである、[1]または[2]に記載の防塵構造体。
[4]
 前記枠体の一方面側は、前記防塵膜が配される部分と、前記防塵膜が配されていない部分と、を有し、
 前記固定部は、前記枠体の一方面側における、前記防塵膜が配されていない部分に設けられる、[1]~[3]のいずれかに記載の防塵構造体。
[5]
 前記枠体に含まれる硫酸イオンが0.3ppm以下である、[1]~[4]のいずれかに記載の防塵構造体。
[6]
 前記枠体の他面側は、粘着層が形成されていない、非粘着面とされている、[1]~[5]のいずれかに記載の防塵構造体。
[7]
 計2つ以上計16つ以下の前記固定部を備える、[1]~[6]のいずれかに記載の防塵構造体。
[8]
 前記枠体は、前記開口を形成する内周部と、前記内周部の側面の一部から外側に突出する外側部と、を備える、[1]~[7]のいずれかに記載の防塵構造体。
[9]
 前記外側部は、前記防塵構造体をアライメントユニットにネジ固定するためのネジ溝及び/又はネジ孔を画定する前記固定部を有する、[8]に記載の防塵構造体。
[10]
 前記防塵構造体は、該防塵構造体を吊り上げ可能とする段差及び/又は傾斜を含む吊架受け部を有する、[1]~[7]のいずれかに記載の防塵構造体。
[11]
 前記吊架受け部は、前記内周部における、前記外側部が形成された前記側面に設けられる、[10]に記載の防塵構造体。
[12]
 前記枠体の平坦度が0超え200μm以下である、[1]~[11]のいずれかに記載の防塵構造体。
[13]
 前記防塵膜の膜厚は、1.5~8.0μmである、[1]~[12]のいずれかに記載の防塵構造体。
[14]
 前記固定部が想定するネジの中心軸を含み、かつ、前記防塵膜に直交する切断面視が、下記(1)~(3)のいずれかを満たす領域を含む、[1]~[13]のいずれかに記載の防塵構造体。
(1)前記防塵膜が前記内周部に展張支持された部分の幅T1が、前記内周部の厚みH1を超える(T1>H1>0)
(2)前記外側部の厚みH2が、前記内周部の厚みH1の1/2以下(1/2・H1≧H2>0)である
(3)前記開口のネジ受け幅T3に対する、前記内周部及び前記外側部の合計幅T2の比(T2/T3)が1~13の範囲内である
[15]
 前記枠体と、前記防塵膜とは、互いに異なる固有振動数を有する、[1]~[14]のいずれかに記載の防塵構造体。
[1]
The frame that forms the opening and
On one side of the frame, a dustproof film stretched and supported so as to cover the opening,
It is a dustproof structure equipped with
A dustproof structure for an alignment unit, comprising at least one of a fixing portion for mechanically fixing the dustproof structure to the alignment unit and a magnet for fixing the dustproof structure to the alignment unit.
[2]
The dust-proof structure according to [1], wherein the dust-proof film has a transmittance of 80% or more at an incident angle of −10 ° to 10 ° for light having a wavelength of 440 to 780 nm.
[3]
The dust-proof structure according to [1] or [2], wherein the dust-proof film has a hatameki amount of −3.0 mm to +3.0 mm.
[4]
One surface side of the frame body has a portion where the dust-proof film is arranged and a portion where the dust-proof film is not arranged.
The dust-proof structure according to any one of [1] to [3], wherein the fixing portion is provided on one surface side of the frame body in a portion where the dust-proof film is not arranged.
[5]
The dust-proof structure according to any one of [1] to [4], wherein the sulfate ion contained in the frame is 0.3 ppm or less.
[6]
The dustproof structure according to any one of [1] to [5], wherein the other surface side of the frame is a non-adhesive surface on which an adhesive layer is not formed.
[7]
The dustproof structure according to any one of [1] to [6], comprising the fixing portions having a total of 2 or more and 16 or less in total.
[8]
The dustproof according to any one of [1] to [7], wherein the frame includes an inner peripheral portion forming the opening and an outer peripheral portion protruding outward from a part of the side surface of the inner peripheral portion. Structure.
[9]
The dust-proof structure according to [8], wherein the outer portion has the fixing portion for defining a screw groove and / or a screw hole for screw-fixing the dust-proof structure to the alignment unit.
[10]
The dust-proof structure according to any one of [1] to [7], wherein the dust-proof structure has a suspension receiving portion including a step and / or an inclination that enables the dust-proof structure to be lifted.
[11]
The dustproof structure according to [10], wherein the suspension receiving portion is provided on the side surface of the inner peripheral portion where the outer portion is formed.
[12]
The dustproof structure according to any one of [1] to [11], wherein the flatness of the frame is more than 0 and 200 μm or less.
[13]
The dust-proof structure according to any one of [1] to [12], wherein the dust-proof film has a film thickness of 1.5 to 8.0 μm.
[14]
[1] to [13], wherein the fixing portion includes the central axis of the screw assumed, and the cut plane view orthogonal to the dustproof film includes a region satisfying any one of the following (1) to (3). The dustproof structure according to any one of.
(1) The width T1 of the portion where the dust-proof film is stretched and supported on the inner peripheral portion exceeds the thickness H1 of the inner peripheral portion (T1>H1> 0).
(2) The thickness H2 of the outer portion is ½ or less (1/2 · H1 ≧ H2> 0) of the thickness H1 of the inner peripheral portion. The ratio (T2 / T3) of the total width T2 of the peripheral portion and the outer portion is in the range of 1 to 13 [15].
The dust-proof structure according to any one of [1] to [14], wherein the frame and the dust-proof film have different natural frequencies from each other.
 本発明によれば、OAS方式のアライメント装置用の防塵カバーとして好適な、アライメント装置用の防塵構造体を提供することができる。 According to the present invention, it is possible to provide a dustproof structure for an alignment device, which is suitable as a dustproof cover for an OAS type alignment device.
本発明の防塵構造体の一構成例を模式的に示す図である。It is a figure which shows typically one structural example of the dustproof structure of this invention. 露光装置において、露光用光学系を模式的に示す図である。It is a figure which shows typically the optical system for exposure in an exposure apparatus. 露光装置において、アライメント用光学系を模式的に示す図である。It is a figure which shows typically the optical system for alignment in an exposure apparatus. 本発明の防塵構造体の他の一構成例を模式的に示す図である。It is a figure which shows typically another structural example of the dustproof structure of this invention. 本発明の防塵構造体の他の一構成例を模式的に示す図である。It is a figure which shows typically another structural example of the dustproof structure of this invention. 本発明の防塵構造体の他の一構成例を模式的に示す図である。It is a figure which shows typically another structural example of the dustproof structure of this invention. 本発明の防塵構造体の他の一構成例を模式的に示す図である。It is a figure which shows typically another structural example of the dustproof structure of this invention. 本発明の防塵構造体の他の一構成例を模式的に示す図である。It is a figure which shows typically another structural example of the dustproof structure of this invention.
(実施形態1)
 以下、本発明を実施するための実施の形態(以下、「本実施形態」と称する)について詳細に説明する。
 図1は、本実施形態の防塵構造体の一構成例を模式的に示す図であり、(a)は平面図、(b)は断面図である。
 本実施形態の防塵構造体1は、アライメントユニット用の防塵構造体であり、開口2aを有する枠体2と、枠体2の一方面側に、開口2aを覆うように展張支持された防塵膜3と、防塵構造体1をアライメントユニットに機械的に固定するための固定部と、を備える。
(Embodiment 1)
Hereinafter, embodiments for carrying out the present invention (hereinafter referred to as “the present embodiment”) will be described in detail.
1A and 1B are views schematically showing a configuration example of a dustproof structure of the present embodiment, where FIG. 1A is a plan view and FIG. 1B is a cross-sectional view.
The dust-proof structure 1 of the present embodiment is a dust-proof structure for an alignment unit, and is a dust-proof structure having an opening 2a and a dust-proof film stretched and supported on one side of the frame 2 so as to cover the opening 2a. 3 and a fixing portion for mechanically fixing the dustproof structure 1 to the alignment unit are provided.
<露光装置>
 本実施形態の防塵構造体1は、OAS方式のアライメントユニットの防塵カバーとして好適である。
 まず、本実施形態の防塵構造体1が適用される、OAS方式のアライメントユニットを備えた露光装置について説明する。
<Exposure device>
The dustproof structure 1 of the present embodiment is suitable as a dustproof cover for an OAS type alignment unit.
First, an exposure apparatus provided with an OAS type alignment unit to which the dustproof structure 1 of the present embodiment is applied will be described.
 図2および図3は、露光装置の一構成例を模式的に示す図であり、図2では主に露光用光学系を示し、図3ではアライメント用光学系を主に示している。
 露光装置10は、パターン11aが形成されているマスク11、マスク11を搭載してX、Yおよびθ方向に移動可能なマスクステージ12、各種パターン(例えば、回路パターンや画素パターン)がフォトリソグラフィの手段で形成される基板13、基板13を保持してX、Yおよびθ方向に移動可能な基板ステージ14と、照明光学系15と、ミラー投影系とを備える。マスクステージ12および基板ステージ14は、それぞれ図示しないモータによりX,Y方向に移動される。
2 and 3 are diagrams schematically showing an example of a configuration of an exposure apparatus, in which FIG. 2 mainly shows an exposure optical system, and FIG. 3 mainly shows an alignment optical system.
In the exposure apparatus 10, the mask 11 on which the pattern 11a is formed, the mask stage 12 on which the mask 11 is mounted and movable in the X, Y, and θ directions, and various patterns (for example, circuit patterns and pixel patterns) are photolithographic. It includes a substrate 13 formed by means, a substrate stage 14 that holds the substrate 13 and can move in the X, Y, and θ directions, an illumination optical system 15, and a mirror projection system. The mask stage 12 and the substrate stage 14 are moved in the X and Y directions by motors (not shown), respectively.
 照明光学系15は、特定の波長の光で露光位置にあるマスク11を照明し、マスク11上のパターン11aを介して基板13上の感光層13a(レジスト)を露光することにより、マスク11上のパターン11aを基板13に転写可能とする。ミラー投影系は、凹面鏡16、凸面鏡17および折曲げ鏡18(台形ミラー)との組み合わせにより構成され、マスクステージ12によって所定位置にアライメントされたマスク11のパターン像を基板13上に等倍投影する。 The illumination optical system 15 illuminates the mask 11 at the exposure position with light having a specific wavelength, and exposes the photosensitive layer 13a (resist) on the substrate 13 via the pattern 11a on the mask 11 to expose the mask 11 on the mask 11. Pattern 11a can be transferred to the substrate 13. The mirror projection system is composed of a combination of a concave mirror 16, a convex mirror 17, and a bending mirror 18 (trapezoidal mirror), and projects a pattern image of the mask 11 aligned at a predetermined position by the mask stage 12 on the substrate 13 at the same magnification. ..
 マスクステージ12と基板ステージ14とを同期スキャン制御することにより、マスク11に描画されているパターン11aが基板13上の感光層13a(レジスト)に転写される。この同期スキャン制御による転写露光処理を、基板ステージ14をステップ移動させながら繰り返し行うことにより、基板13の全面にパターンが転写される。 By synchronously scanning and controlling the mask stage 12 and the substrate stage 14, the pattern 11a drawn on the mask 11 is transferred to the photosensitive layer 13a (resist) on the substrate 13. By repeating the transfer exposure process by the synchronous scan control while moving the substrate stage 14 in steps, the pattern is transferred to the entire surface of the substrate 13.
 露光装置10において、アライメント用光学系は、図3に示すように、アライメントスコープ(AS:Alignment Scope)20と、オフアクシスアライメントスコープ(OAS:Off-axis Scope)21とを備える。 In the exposure apparatus 10, the alignment optical system includes an alignment scope (AS: AlignmentScope) 20 and an off-axis alignment scope (OAS: Off-axisScope) 21 as shown in FIG.
 AS20は、照明光学系15から照射される露光光を用い、露光用光学系の光路を通してマスク11と基板13のアライメントマークの重なり状態を計測する。 The AS 20 uses the exposure light emitted from the illumination optical system 15 and measures the overlapping state of the alignment marks of the mask 11 and the substrate 13 through the optical path of the exposure optical system.
 OAS21は、露光光とは異なる波長の照明光(非露光光)を、基板13上のアライメントマークに照射する照明部21aと、反射光を撮像する撮像部(図示略)とを備える。 The OAS 21 includes an illumination unit 21a that irradiates an illumination light (non-exposure light) having a wavelength different from that of the exposure light on the alignment mark on the substrate 13, and an image pickup unit (not shown) that captures the reflected light.
 撮像された画像は、画像処理装置(図示略)で計測処理されてアライメントマークの位置が取得される。そして、この計測結果から各補正量(X,Yのシフト成分、回転成分、X,Yの倍率成分、XとYの直角度成分)が計算される。 The captured image is measured and processed by an image processing device (not shown) to acquire the position of the alignment mark. Then, each correction amount (shift component of X and Y, rotation component, magnification component of X and Y, squareness component of X and Y) is calculated from this measurement result.
 マスクステージ12及び基板ステージ14の制御を行なう制御装置(図示略)は、該補正量に従ってミラー投影系の倍率及び基板ステージ14の位置・回転及びマスクステージ12と基板ステージ14の同期偏差量を補正しながら、露光処理を行なう。 The control device (not shown) that controls the mask stage 12 and the substrate stage 14 corrects the magnification of the mirror projection system, the position / rotation of the substrate stage 14, and the synchronization deviation amount between the mask stage 12 and the substrate stage 14 according to the correction amount. While doing so, the exposure process is performed.
 本実施形態の防塵構造体1は、例えば、上述したような露光装置10において、OAS21の下部に取り付けられて用いられる(図3参照)。
 以下、本実施形態の防塵構造体1について説明する。
The dustproof structure 1 of the present embodiment is used, for example, attached to the lower part of the OAS 21 in the exposure apparatus 10 as described above (see FIG. 3).
Hereinafter, the dustproof structure 1 of the present embodiment will be described.
<防塵構造体>
 防塵構造体1は、アライメントユニット用の防塵構造体であって、開口2aを形成する枠体2と、枠体2の一方面側に、開口2aを覆うように展張支持された防塵膜3と、を備える。そして、本実施形態の防塵構造体1は、防塵構造体1をアライメントユニット(OAS21)に機械的に固定するための固定部と、を備える。
<Dustproof structure>
The dust-proof structure 1 is a dust-proof structure for an alignment unit, and includes a frame body 2 forming an opening 2a and a dust-proof film 3 stretched and supported on one side of the frame body 2 so as to cover the opening 2a. , Equipped with. The dustproof structure 1 of the present embodiment includes a fixing portion for mechanically fixing the dustproof structure 1 to the alignment unit (OAS21).
 枠体2は、防塵膜3を展張支持するとともに、防塵構造体1をアライメントユニットに取り付ける際の固定部を備える。 The frame body 2 extends and supports the dust-proof film 3, and also includes a fixing portion for attaching the dust-proof structure 1 to the alignment unit.
 枠体2は、防塵膜3を枠体2に張設することができるような任意の形態を有することができ、例えば、枠体2の正面視では、方形、多角形、円形、楕円形等の外形を有することができる。方形は、正方形、長方形等であり、角が直角の場合と、角が丸みを帯びている略方形の場合と、の両方を有することができる。多角形は、三角形、台形、平行四辺形、五角形、六角形等である。 The frame body 2 can have an arbitrary form such that the dustproof film 3 can be stretched on the frame body 2, and for example, when the frame body 2 is viewed from the front, it has a square shape, a polygonal shape, a circular shape, an elliptical shape, or the like. Can have the outer shape of. The square is a square, a rectangle, or the like, and can have both a case where the corners are right angles and a case where the corners are rounded. The polygon is a triangle, a trapezoid, a parallelogram, a pentagon, a hexagon, or the like.
 図1に示されるように、枠体2は、縁部を有する。縁部は、直線状に延びる棒状の縁部材を有することができる。一対の縁部材は、互いに間隔を空けて平行に配置されることができ、同様に、他の一対の縁部材も互いに間隔を空けて平行に配置されることができる。接触している2つの縁部材は、互いに略直角を成すように端部が接続されることができる。そして閉じられた形状に接続された縁部材によって開口2aが画成される。 As shown in FIG. 1, the frame body 2 has an edge portion. The edge portion can have a rod-shaped edge member extending linearly. The pair of edge members can be spaced parallel to each other, and similarly, the other pair of edge members can be spaced parallel to each other. The ends of the two rim members in contact can be connected so that they form a substantially right angle to each other. Then, the opening 2a is defined by the edge member connected to the closed shape.
 枠体2及びその縁部材は、例えば、アルミニウム;アルミニウム合金(例えば5000系、6000系、7000系等);鉄鋼;ステンレス鋼;マグネシウム合金;セラミックス(例えばSiC、AlN、Al23等);セラミックスと金属との複合材料(例えば、Al-SiC、Al-AlN、Al-Al23等);PE、PA、PC、PEEK等のエンジニアリングプラスチック;GFRP、CFRP等の繊維複合材料;又はこれらの組み合わせ等の既知の材料で形成されることができる。 The frame 2 and its edge members are, for example, aluminum; aluminum alloy (for example, 5000 series, 6000 series, 7000 series, etc.); steel; stainless steel; magnesium alloy; ceramics (for example, SiC, AlN, Al 2 O 3 etc.); Composite materials of ceramics and metals (eg Al-SiC, Al-AlN, Al-Al 2 O 3 etc.); Engineering plastics such as PE, PA, PC, PEEK; Fiber composite materials such as GFRP, CFRP; or these It can be formed of a known material such as a combination of.
 アルミニウムの場合、アルマイト処理により陽極酸化皮膜が形成されていてもよい。アルマイトには、一般的に、電解処理の処理浴として硫酸浴を用いた硫酸アルマイトや、シュウ酸浴を用いたシュウ酸アルマイトなどが挙げられるが、硫酸を実質的に含まないもの(硫酸フリー)であることが好ましい。
 特に、本実施形態の防塵構造体1では、枠体2に含まれる硫酸イオンが0.3ppm以下であることが好ましい。
In the case of aluminum, an anodized film may be formed by alumite treatment. Examples of alumite generally include sulfuric acid alumite using a sulfuric acid bath and oxalic acid alumite using an oxalic acid bath as a treatment bath for electrolytic treatment, but those containing substantially no sulfuric acid (sulfuric acid-free). Is preferable.
In particular, in the dustproof structure 1 of the present embodiment, the sulfate ion contained in the frame 2 is preferably 0.3 ppm or less.
 露光光の熱で感光層等からイオンやアウトガスなどが発生する可能性がある。さらに、枠体表面の酸化被膜が分解するおそれがある。特に、硫酸アルマイトの場合、発生した硫酸イオンが上記で発生したイオンやアウトガス等など(雰囲気中のアンモニアなど)と反応することで防塵膜3に曇りが生じ、アライメントの計測が正確に迅速にできない可能性がある。枠体2に含まれる硫酸イオンが0.3ppm以下である本実施形態の防塵構造体1は、このような状況が生じる可能性を低減することができる。 The heat of the exposure light may generate ions and outgas from the photosensitive layer and the like. Further, the oxide film on the surface of the frame may be decomposed. In particular, in the case of alumite sulfate, the generated sulfate ion reacts with the above-mentioned ions, outgas, etc. (ammonia in the atmosphere, etc.) to cause fogging on the dustproof film 3, and alignment cannot be measured accurately and quickly. there is a possibility. The dustproof structure 1 of the present embodiment in which the sulfate ion contained in the frame 2 is 0.3 ppm or less can reduce the possibility that such a situation occurs.
 アルマイト以外であっても、硫酸イオンの含有量が低い材料や枠体を塗膜で被膜するなど、すなわち、硫酸イオンが0.3ppm以下である材料を用いることで、上記のような、硫酸イオンとアンモニアとが反応することによる曇りの発生や、ヘイズの低下などを抑制することができる。 Even if it is not alumite, by coating a material with a low sulfate ion content or a frame with a coating film, that is, by using a material having a sulfate ion of 0.3 ppm or less, the sulfate ion as described above can be used. It is possible to suppress the generation of cloudiness and the decrease in haze due to the reaction between and ammonia.
 枠体2及びその開口2aのサイズは、OAS21のサイズに応じて定められる。枠体2が、正面視において一対の長辺と一対の短辺からなる長方形状である場合には、長辺長が300mm~1000mmであり、短辺長が300mm~1000mmであり、長辺と短辺の幅が、それぞれ4.0mm~50.0mmであり、かつ/又は枠の高さが1.5mm~12.0mmであることができる。 The size of the frame 2 and its opening 2a is determined according to the size of the OAS 21. When the frame body 2 has a rectangular shape consisting of a pair of long sides and a pair of short sides in a front view, the long side length is 300 mm to 1000 mm, the short side length is 300 mm to 1000 mm, and the long side and the frame body 2. The widths of the short sides can be 4.0 mm to 50.0 mm, respectively, and / or the height of the frame can be 1.5 mm to 12.0 mm.
 枠体2において、幅(図1中wで示す)に対する厚み(図1中tで示す)の割合(t/w)が30%以下であることが好ましい。
 防塵構造体1を取り付けられる空間の厚み(例えば、図3中sで示す、部材間の隙間)に制約があるため、枠体2を薄くすることで、防塵構造体1をアライメントユニットに取り付ける際の空間的制約をクリアすることができるほか、機械的に固定する際の作業容易性も確保することができる。また、防塵構造体1の厚みが薄いことで、OAS21によるアライメント精度に与える影響も小さく抑えることができる。
 なお、枠体2の幅に対する厚みの割合(t/w)の下限値としては、剛性や歪みの抑制などの観点から、5%以上であることが好ましい。
 枠体2が、辺によって異なる幅を有する場合、少なくともいずれかの辺における幅に対する厚みの割合(t/w)が、上記の範囲内であることが好ましい。
In the frame 2, the ratio (t / w) of the thickness (indicated by t in FIG. 1) to the width (indicated by w in FIG. 1) is preferably 30% or less.
Since there is a restriction on the thickness of the space where the dustproof structure 1 can be attached (for example, the gap between the members shown in s in FIG. 3), when the dustproof structure 1 is attached to the alignment unit by making the frame 2 thin. In addition to being able to clear the spatial restrictions of, it is also possible to ensure workability when mechanically fixing. Further, since the dustproof structure 1 is thin, the influence of the OAS 21 on the alignment accuracy can be suppressed to a small extent.
The lower limit of the ratio of the thickness (t / w) to the width of the frame 2 is preferably 5% or more from the viewpoint of rigidity and suppression of strain.
When the frame 2 has different widths depending on the sides, it is preferable that the ratio of the thickness (t / w) to the width on at least one side is within the above range.
 枠体2の平坦度は、0超え200μm以下であることが好ましく、0超え150μm以下であることがより好ましい。
 なお、本明細書において「平坦度」は、枠体2の石定盤からのうねりの測定値である。例えば、枠体2を石定盤に静置し、枠体2の上部(石定盤の反対側)からレーザーを入光させ、レーザー変位計にて厚みを測定する。石定盤をゼロ点とし、入光側の枠体2から石定盤までの距離を測定する。ここで、測定数は1辺で5点とし、辺の両端から20mmの点を各々測定し、更にその間を3点等間隔になるように測定する。これを4辺において行い、4辺においてゼロ点からの高さが一番高い点及び一番低い点の高さの差を平坦度とした値である。
 枠体2の平坦度が上記範囲であることにより、アライメントユニットに取り付けたときに撓みが少ない防塵構造体となる。
The flatness of the frame 2 is preferably more than 0 and 200 μm or less, and more preferably more than 0 and 150 μm or less.
In the present specification, "flatness" is a measured value of swell from the stone surface plate of the frame body 2. For example, the frame 2 is placed on a stone surface plate, a laser is emitted from the upper part of the frame 2 (opposite the stone surface plate), and the thickness is measured with a laser displacement meter. With the stone surface plate as the zero point, the distance from the frame 2 on the incoming light side to the stone surface plate is measured. Here, the number of measurements is set to 5 points on one side, points 20 mm from both ends of the side are measured, and measurements are made so that there are 3 points at equal intervals between them. This is performed on the four sides, and the difference in height between the highest point and the lowest point from the zero point on the four sides is the flatness.
When the flatness of the frame 2 is within the above range, the dustproof structure has less bending when attached to the alignment unit.
 防塵膜3は、アライメントユニットの光学的機能を妨げずに、アライメントユニットに塵埃が付着するのを防止する、透明な薄膜(ペリクル)である。
 図1(b)に示すように、防塵膜3は、図示しない粘着剤により、枠体2の一方面側に、開口2aを覆うように展張され、接着及び固定されている。
The dust-proof film 3 is a transparent thin film (pellicle) that prevents dust from adhering to the alignment unit without interfering with the optical function of the alignment unit.
As shown in FIG. 1B, the dustproof film 3 is stretched, adhered and fixed on one side of the frame 2 so as to cover the opening 2a by an adhesive (not shown).
 防塵膜3は、波長440~780nmの光について入射角-10°~10°における透過率が80%以上であることが好ましい。言い換えれば、防塵膜3は、波長440~780nmのいずれかの光について、入射角-10°~10°における透過率が80%以上であることが好ましい。
 これにより、OASアライメント用光源が発する光を十分に透過させることができ、より迅速で正確なOASアライメントが可能になる。
The dustproof film 3 preferably has a transmittance of 80% or more at an incident angle of −10 ° to 10 ° for light having a wavelength of 440 to 780 nm. In other words, the dust-proof film 3 preferably has a transmittance of 80% or more at an incident angle of −10 ° to 10 ° for any light having a wavelength of 440 to 780 nm.
As a result, the light emitted by the OAS alignment light source can be sufficiently transmitted, and faster and more accurate OAS alignment becomes possible.
 防塵膜3のハタメキ量が、-3.0mm~+3.0mmであることが好ましい。なお、本明細書において、「防塵膜3のハタメキ量」とは、下記のように測定することができる値を言う。すなわち、図1のように、200mm×600mmの外径を有する枠体であって、長辺幅が10mm、かつ短辺幅(図1(b)におけるw)が10mm、そして高さ(図1(b)における厚みt)が3mmの、表面がアルマイト処理されたアルミ合金製の枠体2を用意する。用意したアルミ合金製の枠体2の一方面に膜接着剤を塗布し防塵膜3を展張する。防塵膜3が展張された反対側の面に両面テープを貼付け、枠体2より一回り大きいアクリル板に張り付ける。防塵膜3を下にした状態で扇風機を弱モードで膜に沿って送風する。その送風した状態で、一番撓んだ部分をレーザー変位計で測定した値のことをいう。
 ハタメキ量について、マイナスの数値は、枠体2における防塵膜3が展張される側の面を通過する仮想面を基準(0mm)として、防塵膜3が開口2a側(防塵構造体をアクリル板に張り付けた場合におけるアクリル板側)に撓んだハタメキ量を示し、プラスの数値は、防塵膜3が開口2aとは反対側に撓んだハタメキ量を示す。
The amount of hatameki of the dustproof film 3 is preferably −3.0 mm to +3.0 mm. In addition, in this specification, "the amount of Hatameki of the dustproof film 3" means the value which can be measured as follows. That is, as shown in FIG. 1, the frame has an outer diameter of 200 mm × 600 mm, the long side width is 10 mm, the short side width (w in FIG. 1B) is 10 mm, and the height (FIG. 1). A frame body 2 made of an aluminum alloy having an alumite-treated surface and having a thickness t) of 3 mm in (b) is prepared. A film adhesive is applied to one surface of the prepared aluminum alloy frame 2, and the dustproof film 3 is spread. A double-sided tape is attached to the opposite surface on which the dustproof film 3 is spread, and the double-sided tape is attached to an acrylic plate that is one size larger than the frame 2. With the dustproof membrane 3 facing down, the fan is blown along the membrane in weak mode. It is the value measured by the laser displacement meter at the most bent part in the blown state.
Regarding the amount of hatameki, the negative value is based on the virtual surface (0 mm) that passes through the surface of the frame body 2 on which the dust-proof film 3 is spread, and the dust-proof film 3 is on the opening 2a side (the dust-proof structure is an acrylic plate). The amount of flutter that bends on the acrylic plate side when attached) is shown, and a positive value indicates the amount of flutter that the dustproof film 3 bends on the side opposite to the opening 2a.
 図3に示したように、OAS21は、感光層13a(レジスト)が形成された基板13の上部に配置される。OAS21はプレート動作系とは独立して配置されているため、基板ステージ14の移動に対してもOAS21自体は移動しないが、基板ステージ14上に配された基板13は動き、このとき、かなり早いスピードで動く。図3中sで示すように、防塵構造体1が取り付けられる空間の厚みは非常に小さく、防塵構造体1(防塵膜3)と、基板13表面の感光層13a(レジスト)との距離は数mm程度しかない。このため、基板13の高速移動で発生する風圧により、防塵膜3がはためいてしまう。 As shown in FIG. 3, the OAS 21 is arranged on the upper part of the substrate 13 on which the photosensitive layer 13a (resist) is formed. Since the OAS 21 is arranged independently of the plate operation system, the OAS 21 itself does not move with respect to the movement of the substrate stage 14, but the substrate 13 arranged on the substrate stage 14 moves, and at this time, it is considerably fast. Move at speed. As shown by s in FIG. 3, the thickness of the space to which the dustproof structure 1 is attached is very small, and the distance between the dustproof structure 1 (dustproof film 3) and the photosensitive layer 13a (resist) on the surface of the substrate 13 is a number. There is only about mm. Therefore, the dustproof film 3 flutters due to the wind pressure generated by the high-speed movement of the substrate 13.
 防塵膜3のハタメキ量が大きいと、防塵膜3がレジストに接触してしまうおそれがある。防塵膜3のハタメキ量を上記範囲にすることで、防塵膜3が他の部材に接触することを防止することができる。 If the dust-proof film 3 has a large amount of fluff, the dust-proof film 3 may come into contact with the resist. By setting the amount of the dust-proof film 3 to the above range, it is possible to prevent the dust-proof film 3 from coming into contact with other members.
 このような防塵膜3を構成する材料は、透明な薄膜であれば特に限定されないが、例えば、ニトロセルロース、セルロース誘導体、フッ素ポリマーが好ましい。これにより、OASアライメントにおいて光源が発する光を十分に透過させることができるとともに、ハタメキ量を小さく、例えば上記範囲に抑えることができる。 The material constituting such a dustproof film 3 is not particularly limited as long as it is a transparent thin film, but for example, nitrocellulose, a cellulose derivative, and a fluoropolymer are preferable. As a result, the light emitted by the light source can be sufficiently transmitted in the OAS alignment, and the amount of fluttering can be reduced, for example, within the above range.
 防塵膜3の膜厚は1.5μm~8.0μmであることが好ましい。これにより、OASアライメントにおいて光源が発する光を十分に透過させることができるとともに、ハタメキ量を小さく、例えば上記範囲に抑えることができる。 The film thickness of the dustproof film 3 is preferably 1.5 μm to 8.0 μm. As a result, the light emitted by the light source can be sufficiently transmitted in the OAS alignment, and the amount of fluttering can be reduced, for example, within the above range.
 枠体2と、防塵膜3とは、互いに異なる固有振動数を有することが好ましい。これにより、アライメントユニットの振動によって防塵構造体1の枠体2と防塵膜3とが共振してしまうことを防止できる。 It is preferable that the frame body 2 and the dustproof film 3 have different natural frequencies from each other. This makes it possible to prevent the frame body 2 of the dustproof structure 1 and the dustproof film 3 from resonating due to the vibration of the alignment unit.
 固定部は、防塵構造体1をアライメントユニットに機械的に固定するための手段であり、本実施形態では、枠体2と一体的に形成されている。
 なお、本明細書において「固定部」とは、防塵構造体1をアライメントユニットにネジやクリップ等を用いて固定する際に、ネジやクリップに対応する枠体面である。言い換えると、ネジやクリップが固定部なのでなく、ネジ孔を形成する枠体面やクリップが付される枠体面が「固定部」である。
 また、本明細書において「機械的固定手段」とは、粘着剤による接着固定以外の固定手段を意味し、その手段は特に限定されない。機械的固定手段によれば、粘着剤による固定に比べて、防塵構造体1をアライメントユニットに確実に取り付けることができ、防塵構造体1の落下を防止することができる。また、機械的固定手段によれば、粘着剤成分が飛散する状況を回避することができる。
 本実施形態では、枠体2の他面側は、粘着層(粘着剤又は粘着テープを含む層)が形成されていない、非粘着面とされている。
The fixing portion is a means for mechanically fixing the dustproof structure 1 to the alignment unit, and is integrally formed with the frame body 2 in the present embodiment.
In the present specification, the "fixing portion" is a frame body surface corresponding to the screws and clips when the dustproof structure 1 is fixed to the alignment unit by using screws, clips and the like. In other words, the screw or clip is not the fixed portion, but the frame surface that forms the screw hole or the frame surface to which the clip is attached is the "fixed portion".
Further, in the present specification, the "mechanical fixing means" means a fixing means other than adhesive fixing by an adhesive, and the means thereof is not particularly limited. According to the mechanical fixing means, the dust-proof structure 1 can be surely attached to the alignment unit and the dust-proof structure 1 can be prevented from falling as compared with the fixing by the adhesive. Further, according to the mechanical fixing means, it is possible to avoid the situation where the adhesive component is scattered.
In the present embodiment, the other surface side of the frame 2 is a non-adhesive surface on which an adhesive layer (layer containing an adhesive or an adhesive tape) is not formed.
 本実施形態では、枠体2に固定部としてのねじ孔4a及び/又はねじ溝4bが形成されており、防塵構造体1は、ねじによりOAS21に固定される。 In the present embodiment, the frame body 2 is formed with a screw hole 4a and / or a screw groove 4b as a fixing portion, and the dustproof structure 1 is fixed to the OAS 21 by a screw.
 本実施形態では、枠体2に複数のねじ孔4a及びねじ溝4bが貫通形成されており、このねじ孔4a及びねじ溝4bにねじ(雄ねじ)が貫通挿入され、OAS側に形成されたねじ孔(雌ねじ)及びねじ孔(雌ねじ)と螺合させることにより、防塵構造体1はOAS21に取り付けられる。ねじによれば、その締め付け強さを調整することにより固定力の調節が容易であり、防塵構造体1の落下を防止することができる。また、取り付け時の簡易固定(仮止め)も可能である。なお、図1に示す例では、ねじ固定による防塵構造体1の歪みを吸収するために、一部のねじ孔4aと組み合わせて、ねじ溝4b(平面U字状の形状)が用いられている。 In the present embodiment, a plurality of screw holes 4a and screw grooves 4b are formed through the frame body 2, and a screw (male screw) is inserted through the screw holes 4a and the screw groove 4b to form a screw on the OAS side. The dustproof structure 1 is attached to the OAS 21 by screwing it into a hole (female screw) and a screw hole (female screw). According to the screw, the fixing force can be easily adjusted by adjusting the tightening strength, and the dustproof structure 1 can be prevented from falling. In addition, simple fixing (temporary fixing) at the time of installation is also possible. In the example shown in FIG. 1, a screw groove 4b (flat U-shaped shape) is used in combination with a part of the screw holes 4a in order to absorb the distortion of the dustproof structure 1 due to screw fixing. ..
 ねじ固定による防塵構造体1の歪みを吸収し易くする観点から、開口2aを挟んで対向する固定部は、それぞれ同種の構成を有することが好ましい。すなわち、枠体2が、例えば、長辺と短辺を有する長方形状である場合、短辺部分に配される固定部と、長辺部分に配される固定部とは、それぞれ同種の構成を有することが好ましい。本実施形態の防塵構造体1では、開口2aを挟んで、ねじ孔4aを有する固定部(短辺部分に配される固定部)が対向しており、また、ねじ溝4bを有する固定部(長辺部分に配される固定部)が対向している。 From the viewpoint of facilitating the absorption of the strain of the dustproof structure 1 due to screw fixing, it is preferable that the fixing portions facing each other across the opening 2a have the same structure. That is, when the frame body 2 has, for example, a rectangular shape having a long side and a short side, the fixed portion arranged on the short side portion and the fixed portion arranged on the long side portion have the same configuration. It is preferable to have. In the dustproof structure 1 of the present embodiment, the fixing portion having the screw hole 4a (the fixing portion arranged on the short side portion) faces the opening 2a, and the fixing portion having the screw groove 4b (the fixing portion) (Fixed parts arranged on the long side) face each other.
 本実施形態では、枠体2の一方面側は、防塵膜3が配される部分と、防塵膜3が配されていない部分と、を有し、固定部は、枠体2の一方面側における、防塵膜3が配されていない部分に設けられている。すなわち、本実施形態では、枠体2の一方面側は、防塵膜3が配される部分と、防塵膜3が配されていない部分と、を有し、枠体2の一方面側における、防塵膜3が配されていない部分を貫通するように、ねじ孔4a及びねじ溝4bを備えている。これによれば、ねじを固定する又は緩める作業に伴って防塵膜3に撓みが生じることを抑制し易くなる。 In the present embodiment, one surface side of the frame body 2 has a portion where the dustproof film 3 is arranged and a portion where the dustproof film 3 is not arranged, and the fixing portion is the one surface side of the frame body 2. Is provided in the portion where the dustproof film 3 is not arranged. That is, in the present embodiment, one side of the frame 2 has a portion where the dustproof film 3 is arranged and a portion where the dustproof film 3 is not arranged, and the one side of the frame 2 has a portion. A screw hole 4a and a screw groove 4b are provided so as to penetrate the portion where the dustproof film 3 is not arranged. According to this, it becomes easy to suppress the bending of the dustproof film 3 due to the work of fixing or loosening the screw.
 ねじ孔4aとねじ溝4bを比較すると、孔が解放されているねじ溝4bの方が、同程度で締め付けた時に枠体2に掛かる力が少ない場合が多い。他方、防塵構造体1はOAS21に確実に固定されることが望ましい。そのため、枠体2の歪を低減しつつ、防塵構造体1をOAS21に確実に固定する観点から、枠体2が、例えば、長辺と短辺を有する長方形状である場合、ねじ孔4aを有する固定部を短辺部分に配し、ねじ溝4bを有する固定部を長辺部分に配することが好ましい。 Comparing the screw hole 4a and the thread groove 4b, it is often the case that the thread groove 4b having the hole open has less force applied to the frame body 2 when tightened to the same extent. On the other hand, it is desirable that the dustproof structure 1 is securely fixed to the OAS 21. Therefore, from the viewpoint of securely fixing the dustproof structure 1 to the OAS 21 while reducing the distortion of the frame body 2, for example, when the frame body 2 has a rectangular shape having a long side and a short side, a screw hole 4a is provided. It is preferable that the fixing portion having the fixing portion is arranged on the short side portion and the fixing portion having the thread groove 4b is arranged on the long side portion.
 固定部は、開口2aを挟んで、対向して配されることが好ましい。上記のとおり、枠体2は、正面視では方形、多角形、円形、楕円形等の外形を有することができる。いずれの形状でも、固定部は、開口2aを挟んで、対向して配されることで、より好適に、防塵構造体1をOA21に固定することができる。 It is preferable that the fixed portions are arranged so as to face each other with the opening 2a interposed therebetween. As described above, the frame body 2 can have an outer shape such as a square, a polygon, a circle, or an ellipse when viewed from the front. In any shape, the fixing portions are arranged so as to face each other with the opening 2a interposed therebetween, so that the dustproof structure 1 can be more preferably fixed to the OA21.
 防塵構造体1は、同一又は異なる固定部を、計2つ以上計16つ以下の範囲で備えることが好ましく、計4つ以上計10つ以下の範囲で備えることがより好ましい。本実施形態の防塵構造体1は、計8つの固定部(ねじ孔4a及び/又はねじ溝4b)を備えており、これにより、より好適に、防塵構造体1をOAS21に固定することができる。 The dustproof structure 1 preferably includes the same or different fixing portions in a range of 2 or more and 16 or less in total, and more preferably 4 or more and 10 or less in total. The dust-proof structure 1 of the present embodiment includes a total of eight fixing portions (screw holes 4a and / or screw grooves 4b), whereby the dust-proof structure 1 can be more preferably fixed to the OAS 21. ..
 ねじ以外の機械的固定手段としては、例えば、リベット、ボルト・ナット、各種ファスナー材(例えば、クイックファスナー等)による固定手段が挙げられる。ねじ以外の機械的固定手段が用いられる場合、固定部としては、ねじ以外の機械的固定手段を受け止めるための受け部を含んで構成される。受け部は、例えば、ねじ以外の機械的固定手段を用いて防塵構造体1をアライメントユニットに機械的に固定するとき、少なくとも枠体2に接する面(ねじ以外の機械的固定手段が少なくとも枠体に接する面)に対応する形状を含む、凹部及び/又は凸部が挙げられる。 Examples of mechanical fixing means other than screws include fixing means using rivets, bolts and nuts, and various fastener materials (for example, quick fasteners). When a mechanical fixing means other than a screw is used, the fixing portion includes a receiving portion for receiving the mechanical fixing means other than the screw. When the dustproof structure 1 is mechanically fixed to the alignment unit by using, for example, a mechanical fixing means other than the screw, the receiving portion has at least a surface in contact with the frame body 2 (at least the mechanical fixing means other than the screw is the frame body). Concave and / or convex portions, including a shape corresponding to the surface in contact with the surface).
 以上、本発明の実施の形態について説明してきたが、本発明はこれに限定されるものではなく、発明の趣旨を逸脱しない範囲で適宜変更可能である。 Although the embodiments of the present invention have been described above, the present invention is not limited to this, and can be appropriately changed without departing from the spirit of the invention.
 例えば、図4は、本発明の他の実施形態に係る防塵構造体を説明するための図である。このうち、図4(a)は、図1に示した防塵構造体1と比べ、全ての固定部がねじ孔4aとして構成されている。また、図4(b)は、防塵構造体1と比べ、全ての固定部がねじ溝4bとして構成されている。いずれの防塵構造体も、防塵構造体1と同様に、OAS方式のアライメントユニット用の防塵カバーとして好適である。 For example, FIG. 4 is a diagram for explaining a dustproof structure according to another embodiment of the present invention. Of these, in FIG. 4A, as compared with the dustproof structure 1 shown in FIG. 1, all the fixing portions are configured as screw holes 4a. Further, in FIG. 4B, as compared with the dustproof structure 1, all the fixing portions are configured as screw grooves 4b. Any dust-proof structure is suitable as a dust-proof cover for an OAS type alignment unit, like the dust-proof structure 1.
(実施形態2)
 本発明の実施形態2に係る防塵構造体は、上記の実施形態1に係る防塵構造体と比べ、枠体の構造が異なる。実施形態1に係る防塵構造体と同一の構成を用いることができる部分については説明を省略しながら、実施形態2に係る防塵構造体について以下で説明する。
 図5は、本発明の実施形態2に係る防塵構造体の一構成例を模式的に示す図である。
(Embodiment 2)
The dust-proof structure according to the second embodiment of the present invention has a different frame structure from the dust-proof structure according to the first embodiment. The dust-proof structure according to the second embodiment will be described below, while the description of the portion where the same configuration as that of the dust-proof structure according to the first embodiment can be used is omitted.
FIG. 5 is a diagram schematically showing a configuration example of a dustproof structure according to the second embodiment of the present invention.
 実施形態2に係る防塵構造体1Aの枠体2Aは、開口2aを形成する内枠体(内周部)2bと、内枠体2bの外側に配される外枠体(外側部)2cと、を備える。外枠体2cは、内枠体2bの側面の一部から外側に突出している。外枠体2cと内枠体2bとは一体に構成されており、外枠体2cの厚みは内枠体2bの厚みより薄い。そして、外枠体2cにおけるアライメントユニットに取り付けられる側の面と、内枠体2bにおけるアライメントユニットに取り付けられる側の面と、が連続して、防塵構造体1Aにおける、アライメントユニットに取り付けられる側の面を構成している。すなわち、内枠体2bの厚み(図1(b)の厚みtに相当)が外枠体2cの厚みより大きい分、内枠体2bにおける防塵膜3側の面と、外枠体2cにおける防塵膜3側の面と、の間に段差が形成されている。内枠体2bにおける防塵膜3側の面と、外枠体2cにおける防塵膜3側の面との間は、内枠体2bにおける外周側面が連続している。このような構成を有することにより、OAS方式のアライメントユニット用の防塵カバーとして好適な構成を実現し易くなる。 The frame body 2A of the dustproof structure 1A according to the second embodiment includes an inner frame body (inner peripheral portion) 2b forming an opening 2a and an outer frame body (outer frame portion) 2c arranged outside the inner frame body 2b. , Equipped with. The outer frame body 2c projects outward from a part of the side surface of the inner frame body 2b. The outer frame body 2c and the inner frame body 2b are integrally configured, and the thickness of the outer frame body 2c is thinner than the thickness of the inner frame body 2b. Then, the surface of the outer frame body 2c on the side attached to the alignment unit and the surface of the inner frame body 2b on the side attached to the alignment unit are continuously connected to each other on the side attached to the alignment unit in the dustproof structure 1A. It constitutes a surface. That is, since the thickness of the inner frame body 2b (corresponding to the thickness t of FIG. 1B) is larger than the thickness of the outer frame body 2c, the surface of the inner frame body 2b on the dustproof film 3 side and the dustproof surface of the outer frame body 2c. A step is formed between the surface on the film 3 side and the surface. The outer peripheral side surface of the inner frame body 2b is continuous between the surface of the inner frame body 2b on the dustproof film 3 side and the surface of the outer frame body 2c on the dustproof film 3 side. By having such a configuration, it becomes easy to realize a configuration suitable as a dustproof cover for an OAS type alignment unit.
 外枠体2cは、内枠体2bの外周を連続して囲むことができるが、囲まないこともできる。外枠体2cが内枠体2bの外周を囲まない場合、内枠体2bからその外周側に、内枠体2bの外周方向に沿って所定の間隔で、複数の外枠体2cが不連続的に突出する形状が構成される。上記では、外枠体2cと内枠体2bとは一体に構成されたが、外枠体2cと内枠体2bとは別体に構成されることもできる。このような構成を有することによっても、OAS方式のアライメントユニット用の防塵カバーとして好適な構成を実現し易くなる。 The outer frame body 2c can continuously surround the outer periphery of the inner frame body 2b, but it may not surround the outer frame body 2c. When the outer frame body 2c does not surround the outer periphery of the inner frame body 2b, a plurality of outer frame bodies 2c are discontinuous from the inner frame body 2b to the outer peripheral side thereof at predetermined intervals along the outer peripheral direction of the inner frame body 2b. A shape that protrudes from the ground is constructed. In the above, the outer frame body 2c and the inner frame body 2b are integrally configured, but the outer frame body 2c and the inner frame body 2b may be configured separately. Having such a configuration also facilitates the realization of a suitable configuration as a dustproof cover for an OAS type alignment unit.
 防塵膜3は、内枠体2bにおける防塵膜3側の面に展張支持されている。そして、外枠体2cに、防塵構造体1Aをアライメントユニットに機械的に固定するためのねじ孔4a及び/又はねじ溝4bを画定する固定部を有している。具体的に、外枠体2cを高さ方向(図1(b)の厚みtに沿った方向)に貫通するように、ねじ孔4a及びねじ溝4bが設けられている。これにより、OAS方式のアライメントユニット用の防塵カバーとして好適な構成を実現し易くなる。ここでは、ねじ孔4a及びねじ溝4bが設けられているが、ねじ孔4a又はねじ溝4bが設けられていなくてもよい。 The dust-proof film 3 is stretched and supported on the surface of the inner frame body 2b on the dust-proof film 3 side. The outer frame 2c has a fixing portion for defining a screw hole 4a and / or a screw groove 4b for mechanically fixing the dustproof structure 1A to the alignment unit. Specifically, the screw holes 4a and the screw grooves 4b are provided so as to penetrate the outer frame body 2c in the height direction (direction along the thickness t in FIG. 1B). This makes it easier to realize a configuration suitable for a dustproof cover for an OAS type alignment unit. Here, the screw hole 4a and the screw groove 4b are provided, but the screw hole 4a or the screw groove 4b may not be provided.
 また、実施形態2に係る防塵構造体1Aは、防塵構造体1Aを吊り上げ可能とする段差及び/又は傾斜を含む吊架受け部を有する。
 例えば、図5に示す例では、内枠体2bにおける防塵膜3側の面と、外枠体2cにおける防塵膜3側の面との間の面(内枠体2bにおける、外枠体2cが形成された側面)には、吊架受け部として、開口2a側に凹んだ凹部5aが形成されている。凹部5aは連続的に形成されており、ここでは、枠体2Aの周方向に亘って一周する凹部5aが形成されている。これにより、治具等を凹部5aに引っ掛けながら持ち上げたり移動させたりすることができる等、機械的に防塵構造体1Aを扱い易くなる。
Further, the dustproof structure 1A according to the second embodiment has a suspension receiving portion including a step and / or an inclination that enables the dustproof structure 1A to be lifted.
For example, in the example shown in FIG. 5, the surface between the surface of the inner frame body 2b on the dustproof film 3 side and the surface of the outer frame body 2c on the dustproof film 3 side (the outer frame body 2c in the inner frame body 2b is A recess 5a recessed on the opening 2a side is formed on the formed side surface) as a suspension receiving portion. The recesses 5a are continuously formed, and here, the recesses 5a that go around the frame 2A in the circumferential direction are formed. This makes it easier to mechanically handle the dustproof structure 1A, for example, the jig or the like can be lifted or moved while being hooked on the recess 5a.
 凹部5aは、内枠体2bにおける外周側面に、不連続的に形成されることもできる。この場合、防塵構造体1Aの枠体2Aは、不連続的な凹部5aを複数有することが好ましい。このとき、一対の短辺にそれぞれ形成された凹部(不連続的な凹部)5aが、一対の凹部5aを形成することが好ましく、また、一対の長辺にそれぞれ形成された凹部(不連続的な凹部)5aが、一対の凹部5aを形成することが好ましい。これによっても、治具等を凹部5aに引っ掛けながら持ち上げたり移動させたりすることができる等、機械的に防塵構造体1Aを扱い易くなる。 The recess 5a can also be formed discontinuously on the outer peripheral side surface of the inner frame body 2b. In this case, it is preferable that the frame body 2A of the dustproof structure 1A has a plurality of discontinuous recesses 5a. At this time, it is preferable that the recesses (discontinuous recesses) 5a formed on the pair of short sides form the pair of recesses 5a, and the recesses (discontinuous) formed on the pair of long sides respectively. The recesses) 5a preferably form a pair of recesses 5a. This also makes it easier to mechanically handle the dustproof structure 1A, for example, the jig or the like can be lifted or moved while being hooked on the recess 5a.
 なお、吊架受け部の他の形態として、図6(a)に示す例では、内枠体2bにおける防塵膜3側の面と、外枠体2cにおける防塵膜3側の面との間の面(内枠体2bにおける外周側面)の少なくとも一部に、外枠体2cから遠ざかるにつれて、その幅が大きくなる拡幅部が形成されている。ここでは、拡幅部として、外枠体2cから遠ざかるにつれて、その幅が次第に大きくなるテーパー部5bが形成されている。ここでは、枠体2の周方向に亘って連続的に一周するテーパー部5bが形成されている。なお、拡幅部には、外枠体2cから遠ざかるにつれて、その幅が不連続的に大きくなる階段形状も含まれる。 As another form of the suspension receiving portion, in the example shown in FIG. 6A, between the surface of the inner frame body 2b on the dustproof film 3 side and the surface of the outer frame body 2c on the dustproof film 3 side. At least a part of the surface (the outer peripheral side surface of the inner frame body 2b) is formed with a widening portion whose width increases as the distance from the outer frame body 2c increases. Here, as the widening portion, a tapered portion 5b whose width gradually increases as the distance from the outer frame body 2c increases is formed. Here, a tapered portion 5b is formed that continuously goes around the frame body 2 in the circumferential direction. The widened portion also includes a staircase shape whose width increases discontinuously as the distance from the outer frame body 2c increases.
 また、図6(b)に示す例では、吊架受け部として、内枠体2bにおける防塵膜3側の面と、外枠体2cにおける防塵膜3側の面との間の面(内枠体2bにおける外周側面)に、開口2aとは反対側に突出した凸部5cが形成されている。ここでは、枠体2Aの周方向に亘って連続的に一周する凸部5cが形成されている。 Further, in the example shown in FIG. 6B, the surface (inner frame) between the surface of the inner frame body 2b on the dustproof film 3 side and the surface of the outer frame body 2c on the dustproof film 3 side as the suspension receiving portion. A convex portion 5c protruding on the side opposite to the opening 2a is formed on the outer peripheral side surface of the body 2b). Here, a convex portion 5c that continuously goes around the frame body 2A in the circumferential direction is formed.
 また、図6(c)に示す例では、吊架受け部として、内枠体2bにおける防塵膜3側の面と、外枠体2cにおける防塵膜3側の面との間の面(内枠体2bにおける外周側面)に、開口2a側に階段状に凹んだ凹部5dが形成されている。ここでは、枠体2Aの周方向に亘って連続的に一周する凹部5dが形成されている。 Further, in the example shown in FIG. 6C, the surface (inner frame) between the surface of the inner frame body 2b on the dustproof film 3 side and the surface of the outer frame body 2c on the dustproof film 3 side as the suspension receiving portion. On the outer peripheral side surface of the body 2b), a recess 5d recessed in a stepped manner is formed on the opening 2a side. Here, a recess 5d that continuously goes around the frame body 2A in the circumferential direction is formed.
 これにより、治具等をテーパー部5b、凸部5c又は凹部5dに引っ掛けながら持ち上げたり移動させたりすることができる等、機械的に防塵構造体1Aを扱い易くなる。これらのテーパー部5b、凸部5c及び凹部5dは、断面形状が異なるだけで、上述した凹部5aと同様に配されることができる。 This makes it easier to mechanically handle the dustproof structure 1A, for example, the jig or the like can be lifted or moved while being hooked on the tapered portion 5b, the convex portion 5c or the concave portion 5d. These tapered portions 5b, convex portions 5c, and concave portions 5d can be arranged in the same manner as the concave portions 5a described above, except that the cross-sectional shapes are different.
 これらのテーパー部5b、凸部5c又は凹部5dは、内枠体2bにおける外周側面に、不連続的に形成されることもできる。このとき、一対の短辺にそれぞれ形成されたテーパー部5b、凸部5c又は凹部5d(不連続的なテーパー部5b、凸部5c又は凹部5d)が、一対のテーパー部5b、凸部5c又は凹部5dを形成することが好ましく、また、一対の長辺にそれぞれ形成されたテーパー部5b、凸部5c又は凹部5d(不連続的なテーパー部5b、凸部5c又は凹部5d)が、一対のテーパー部5b、凸部5c又は凹部5dを形成することが好ましい。 These tapered portions 5b, convex portions 5c or concave portions 5d can also be discontinuously formed on the outer peripheral side surface of the inner frame body 2b. At this time, the tapered portion 5b, the convex portion 5c or the concave portion 5d (discontinuous tapered portion 5b, the convex portion 5c or the concave portion 5d) formed on the pair of short sides respectively has a pair of tapered portions 5b, the convex portion 5c or the concave portion 5d. It is preferable to form the concave portion 5d, and the tapered portion 5b, the convex portion 5c or the concave portion 5d (discontinuous tapered portion 5b, the convex portion 5c or the concave portion 5d) formed on each of the pair of long sides is paired. It is preferable to form the tapered portion 5b, the convex portion 5c or the concave portion 5d.
 また、防塵構造体1Aにおける、アライメントユニットに取り付けられる側の面(外枠体2cにおけるアライメントユニットに取り付けられる側の面と、内枠体2bにおけるアライメントユニットに取り付けられる側の面)には、スライド谷部(図示略)が形成されていてもよい。他方、アライメントユニットには、上記のスライド谷部に対応するスライド山部が形成されている。防塵構造体1Aのスライド谷部を、アライメントユニットのスライド山部にガイドさせることができ、必要により、防塵構造体1Aをアライメントユニット上で摺動させることができる。これにより、防塵構造体1Aとアライメントユニットとの位置合わせが容易になり、両者を機械的固定し易くなる。なお、防塵構造体1A側にスライド山部が設けられ、アライメントユニット側にスライド谷部が設けられてもよい。互いに対応するスライド谷部とスライド山部とが、防塵構造体1A側とアライメントユニット側とにそれぞれ設けられることで、上記の効果が得られ易くなる。 Further, on the surface of the dustproof structure 1A on the side attached to the alignment unit (the surface on the outer frame body 2c on the side attached to the alignment unit and the surface on the inner frame body 2b on the side attached to the alignment unit), slides are made. A valley portion (not shown) may be formed. On the other hand, the alignment unit is formed with a slide ridge corresponding to the slide valley. The slide valley portion of the dustproof structure 1A can be guided to the slide mountain portion of the alignment unit, and if necessary, the dustproof structure 1A can be slid on the alignment unit. This facilitates the alignment of the dustproof structure 1A and the alignment unit, and facilitates mechanical fixing of both. A slide mountain portion may be provided on the dustproof structure 1A side, and a slide valley portion may be provided on the alignment unit side. By providing the slide valley portion and the slide mountain portion corresponding to each other on the dustproof structure 1A side and the alignment unit side, respectively, the above effect can be easily obtained.
 図7に示すように、実施形態2に係る防塵構造体1Aにおいて、固定部が想定するネジの中心軸を含み、かつ、防塵膜3に直交する切断面視が、下記(1)~(3)のいずれかを満たす領域を含むことが好ましい。
(1)防塵膜3が内枠体(内周部)2bに展張支持された部分の幅T1が、内枠体(内周部)2bの厚みH1を超える(T1>H1>0)。
(2)外枠体(外側部)2cの厚みH2が、内枠体(内周部)2bの厚みH1の1/2以下(1/2・H1≧H2>0)である。
(3)ねじ孔4a又はねじ溝4bの開口のネジ受け幅T3に対する、内枠体(内周部)2b及び外枠体(外側部)2cの合計幅T2の比(T2/T3)が1~13の範囲内である。
As shown in FIG. 7, in the dustproof structure 1A according to the second embodiment, the cut plane views including the central axis of the screw assumed by the fixing portion and orthogonal to the dustproof film 3 are as follows (1) to (3). ) Satisfying any of).
(1) The width T1 of the portion where the dustproof film 3 is stretched and supported by the inner frame body (inner peripheral portion) 2b exceeds the thickness H1 of the inner frame body (inner peripheral portion) 2b (T1>H1> 0).
(2) The thickness H2 of the outer frame body (outer portion) 2c is ½ or less (1/2 · H1 ≧ H2> 0) of the thickness H1 of the inner frame body (inner peripheral portion) 2b.
(3) The ratio (T2 / T3) of the total width T2 of the inner frame body (inner peripheral portion) 2b and the outer frame body (outer portion) 2c to the screw receiving width T3 of the opening of the screw hole 4a or the screw groove 4b is 1. It is within the range of ~ 13.
 (1)T1が大きいことにより、防塵膜3の貼り付け面積を確保することで、ステージの高速移動や振動に対しても、防塵膜3のハタメキを抑えやすくなる。また、H1が小さいことにより、アライメントスコープをステージ近くに配したまま防塵構造体1Aをセットできる。空間的制約が厳しいなかでもアライメントスコープに防塵構造体1Aをセットできる。
 (2)H1が大きいことにより、枠体2Aの剛性を確保できる。また、H2が小さいことにより、吊下受け部が形成される側面を確保できる。
 (3)T2/T3が上記範囲であることにより、アライメントユニットへの取り付け面に対して、固定力が働く部分の割合のバランスをとることができる。
(1) Since the T1 is large, by securing the sticking area of the dustproof film 3, it becomes easy to suppress the fluttering of the dustproof film 3 even against high-speed movement and vibration of the stage. Further, since H1 is small, the dustproof structure 1A can be set while the alignment scope is arranged near the stage. The dustproof structure 1A can be set on the alignment scope even when space restrictions are severe.
(2) Since H1 is large, the rigidity of the frame body 2A can be ensured. Further, since H2 is small, it is possible to secure a side surface on which the suspension receiving portion is formed.
(3) When T2 / T3 is in the above range, the ratio of the portion where the fixing force acts to the mounting surface to the alignment unit can be balanced.
 本願発明は、極めて高い平坦性が必須な技術分野に属することを前提に、アライメント用途に特有の課題を解決すべく、上記構成により、アライメント用途に特有の課題の、優れたハンドリング性、枠体全体の歪み防止、剛性低下の抑制を図るものである。
 本実施形態では、上記課題に着目するからこそ、防塵膜3の展張機能を内枠体2bに持たせつつ、あえて防塵構造体1Aのねじ止め機能を内枠体2bから切り離し、該機能を新たな外枠体2cに持たせる構成とした。この構成としたことで初めて現れる「内枠体2bにおける、外枠体2cが形成された側面」に吊架受け部を配したことで、外枠体2cに防塵構造体1Aの吊り上げ装置のガイド機能も付与することができた。
The present invention is based on the premise that it belongs to a technical field in which extremely high flatness is indispensable, and in order to solve the problems peculiar to the alignment application, the above configuration makes it possible to have excellent handleability and a frame body, which are the problems peculiar to the alignment application. The purpose is to prevent distortion as a whole and suppress a decrease in rigidity.
In this embodiment, because the above-mentioned problems are focused on, while the inner frame body 2b has the spreading function of the dustproof film 3, the screwing function of the dustproof structure 1A is intentionally separated from the inner frame body 2b, and the function is newly added. It is configured to be held in the outer frame body 2c. By arranging the suspension receiving portion on the "side surface of the inner frame body 2b where the outer frame body 2c is formed" that appears for the first time with this configuration, the guide of the lifting device of the dustproof structure 1A is arranged on the outer frame body 2c. I was able to add a function.
 図5に示した実施形態2に係る防塵構造体1Aにおいて、全ての固定部がねじ孔4aとして構成されていてもよい。また、全ての固定部がねじ溝4bとして構成されていてもよい。 In the dustproof structure 1A according to the second embodiment shown in FIG. 5, all the fixing portions may be configured as screw holes 4a. Further, all the fixing portions may be configured as thread grooves 4b.
(実施形態3)
 本発明の実施形態3に係る防塵構造体は、上記の実施形態1に係る防塵構造体と比べ、枠体の構造が異なる。実施形態1に係る防塵構造体と同一の構成を用いることができる部分については説明を省略しながら、実施形態3に係る防塵構造体について以下で説明する。
 図8は、本発明の実施形態2に係る防塵構造体の一構成例を模式的に示す図である。
(Embodiment 3)
The dust-proof structure according to the third embodiment of the present invention has a different frame structure from the dust-proof structure according to the first embodiment. The dust-proof structure according to the third embodiment will be described below, while the description of the portion where the same configuration as that of the dust-proof structure according to the first embodiment can be used is omitted.
FIG. 8 is a diagram schematically showing a configuration example of the dustproof structure according to the second embodiment of the present invention.
 本実施形態の防塵構造体1Bは、該防塵構造体1Bをアライメントユニットに固定するための磁石6を備える。
 本実施形態では、枠体2Bに固定部としての磁石6が配されており、防塵構造体1Bは、磁石6によりOAS21に固定される。ここでは、枠体2Bの周方向に亘って連続的に一周するように磁石6が形成されている。
 磁石によれば、磁力の強さを調整することにより固定力の調節が容易であり、防塵構造体1の落下を防止することができる。また、取り付け時の作業も容易である。
The dustproof structure 1B of the present embodiment includes a magnet 6 for fixing the dustproof structure 1B to the alignment unit.
In the present embodiment, the magnet 6 as a fixing portion is arranged on the frame body 2B, and the dustproof structure 1B is fixed to the OAS 21 by the magnet 6. Here, the magnet 6 is formed so as to make a continuous circumference in the circumferential direction of the frame body 2B.
According to the magnet, the fixing force can be easily adjusted by adjusting the strength of the magnetic force, and the dustproof structure 1 can be prevented from falling. In addition, the work at the time of installation is easy.
 磁石固定による防塵構造体1Bの歪みを吸収し易くする観点から、開口2aを挟んで対向する固定部は、それぞれ同種の構成を有することが好ましい。すなわち、枠体2Bが、例えば、長辺と短辺を有する長方形状である場合、短辺部分に配される固定部と、長辺部分に配される固定部とは、それぞれ同種の構成を有することが好ましい。 From the viewpoint of facilitating the absorption of the strain of the dustproof structure 1B due to the magnet fixing, it is preferable that the fixing portions facing each other with the opening 2a sandwiched have the same structure. That is, when the frame body 2B has, for example, a rectangular shape having a long side and a short side, the fixed portion arranged on the short side portion and the fixed portion arranged on the long side portion have the same configuration. It is preferable to have.
 これらの磁石6は、内枠体2bにおける外周側面に、不連続的に配されることもできる。このとき、一対の短辺にそれぞれ配された磁石6(不連続的な磁石6)が、一対の磁石6を形成することが好ましく、また、一対の長辺にそれぞれ配された磁石6(不連続的な磁石6)が、一対の磁石6を形成することが好ましい。 These magnets 6 can also be discontinuously arranged on the outer peripheral side surface of the inner frame body 2b. At this time, it is preferable that the magnets 6 (discontinuous magnets 6) arranged on the pair of short sides form the pair of magnets 6, and the magnets 6 (discontinuous magnets 6) arranged on the pair of long sides respectively. It is preferable that the continuous magnets 6) form a pair of magnets 6.
 実施形態3に係る、磁石6を備えた枠体2Bにも、防塵構造体1Bを吊り上げ可能とする段差及び/又は傾斜を含む吊架受け部が形成されていてもよい。吊架受け部としては実施形態2で挙げたような凹部5a、テーパー部5b、凸部5c、及び階段状凹部5dと同様の構成とすることができる。 The frame 2B provided with the magnet 6 according to the third embodiment may also be formed with a suspension receiving portion including a step and / or an inclination that enables the dustproof structure 1B to be lifted. The suspension receiving portion may have the same configuration as the concave portion 5a, the tapered portion 5b, the convex portion 5c, and the stepped concave portion 5d as described in the second embodiment.
 本実施形態の防塵構造体1では、ねじによる固定と、磁石による固定とを、組み合わせることもきる。すなわち、枠体2(2A,2B)には、ねじ孔4a又はねじ溝4bが形成されるとともに、磁石6が配されていてもよい。 In the dustproof structure 1 of the present embodiment, fixing with screws and fixing with magnets can be combined. That is, a screw hole 4a or a screw groove 4b may be formed in the frame body 2 (2A, 2B), and a magnet 6 may be arranged.
 以上説明した、実施形態2、実施形態3及びこれに関する他の実施形態、並びに更に他の実施形態は、互いに組み合わせることができる。例えば、内枠体における防塵膜側の面と、外枠体における防塵膜側の面との間の面(内枠体における外周側面)は、凹部と、凸部と、テーパー部(拡幅部)と、の少なくとも二つを同時に有することができる。また、以上説明した、実施形態2、実施形態3及びこれに関する他の実施形態、並びに更に他の実施形態は、上記の実施形態1とも組み合わせることもできる。 The second embodiment, the third embodiment and other embodiments related thereto, and further other embodiments described above can be combined with each other. For example, the surface between the surface on the dust-proof film side of the inner frame and the surface on the dust-proof film side of the outer frame (the outer peripheral side surface of the inner frame) is a concave portion, a convex portion, and a tapered portion (widening portion). And can have at least two at the same time. Further, the second embodiment, the third embodiment and other embodiments related thereto, and further other embodiments described above can be combined with the above-described first embodiment.
 本発明による防塵構造体を用いることで、OAS方式のアライメントユニット用の防塵カバーとして好適なものとなり、アライメントユニット用の防塵構造体として広く利用することができる。 By using the dust-proof structure according to the present invention, it becomes suitable as a dust-proof cover for an OAS type alignment unit, and can be widely used as a dust-proof structure for an alignment unit.
 1、1A、1B:防塵構造体
 2、2A、2B:枠体
 2a:開口
 2b:内枠体(内周部)
 2c:外枠体(外側部)
 3:防塵膜
 4a:ねじ孔
 4b:ねじ溝
 5a:凹部(吊架受け部)
 5b:テーパー部(吊架受け部)
 5c:凸部(吊架受け部)
 5d:凹部(吊架受け部)
 6:磁石
 10:露光装置
 11:マスク
 11a:パターン
 12:マスクステージ
 13:基板
 13a:感光層
 14:基板ステージ
 15:照明光学系
 16:凹面鏡
 17:凸面鏡
 18:折曲げ鏡
 20:AS(アライメントスコープ)
 21:OAS(オフアクシスアライメントスコープ)
 21a:照明部
1, 1A, 1B: Dustproof structure 2, 2A, 2B: Frame body 2a: Opening 2b: Inner frame body (inner peripheral part)
2c: Outer frame (outer part)
3: Dustproof film 4a: Screw hole 4b: Thread groove 5a: Recess (suspended receiving part)
5b: Taper part (suspension receiving part)
5c: Convex part (suspended receiving part)
5d: Recess (suspended receiving part)
6: Magnet 10: Exposure device 11: Mask 11a: Pattern 12: Mask stage 13: Substrate 13a: Photosensitive layer 14: Substrate stage 15: Illumination optical system 16: Concave mirror 17: Convex mirror 18: Folding mirror 20: AS (Alignment scope) )
21: OAS (Off Axis Alignment Scope)
21a: Lighting unit

Claims (15)

  1.  開口を形成する枠体と、
     前記枠体の一方面側に、前記開口を覆うように展張支持された防塵膜と、
    を備えた防塵構造体であって、
     前記防塵構造体をアライメントユニットに機械的に固定するための固定部と、前記防塵構造体をアライメントユニットに固定するための磁石と、の少なくとも一方を備える、アライメントユニット用の防塵構造体。
    The frame that forms the opening and
    On one side of the frame, a dustproof film stretched and supported so as to cover the opening,
    It is a dustproof structure equipped with
    A dustproof structure for an alignment unit, comprising at least one of a fixing portion for mechanically fixing the dustproof structure to the alignment unit and a magnet for fixing the dustproof structure to the alignment unit.
  2.  前記防塵膜は、波長440~780nmの光について、入射角-10°~10°における透過率が80%以上である、請求項1に記載の防塵構造体。 The dust-proof structure according to claim 1, wherein the dust-proof film has a transmittance of 80% or more at an incident angle of −10 ° to 10 ° for light having a wavelength of 440 to 780 nm.
  3.  前記防塵膜のハタメキ量が、-3.0mm~+3.0mmである、請求項1または2に記載の防塵構造体。 The dust-proof structure according to claim 1 or 2, wherein the dust-proof film has a hatameki amount of −3.0 mm to +3.0 mm.
  4.  前記枠体の一方面側は、前記防塵膜が配される部分と、前記防塵膜が配されていない部分と、を有し、
     前記固定部は、前記枠体の一方面側における、前記防塵膜が配されていない部分に設けられる、請求項1~3のいずれか1項に記載の防塵構造体。
    One surface side of the frame body has a portion where the dust-proof film is arranged and a portion where the dust-proof film is not arranged.
    The dust-proof structure according to any one of claims 1 to 3, wherein the fixing portion is provided on one surface side of the frame body on a portion where the dust-proof film is not arranged.
  5.  前記枠体に含まれる硫酸イオンが0.3ppm以下である、請求項1~4のいずれか1項に記載の防塵構造体。 The dustproof structure according to any one of claims 1 to 4, wherein the sulfate ion contained in the frame is 0.3 ppm or less.
  6.  前記枠体の他面側は、粘着層が形成されていない、非粘着面とされている、請求項1~5のいずれか1項に記載の防塵構造体。 The dustproof structure according to any one of claims 1 to 5, wherein the other surface side of the frame is a non-adhesive surface on which an adhesive layer is not formed.
  7.  計2つ以上計16つ以下の前記固定部を備える、請求項1~6のいずれか1項に記載の防塵構造体。 The dustproof structure according to any one of claims 1 to 6, further comprising the above-mentioned fixing portions having a total of 2 or more and 16 or less in total.
  8.  前記枠体は、前記開口を形成する内周部と、前記内周部の側面の一部から外側に突出する外側部と、を備える、請求項1~7のいずれか1項に記載の防塵構造体。 The dustproof according to any one of claims 1 to 7, wherein the frame includes an inner peripheral portion forming the opening and an outer peripheral portion protruding outward from a part of the side surface of the inner peripheral portion. Structure.
  9.  前記外側部は、前記防塵構造体をアライメントユニットにネジ固定するためのネジ溝及び/又はネジ孔を画定する前記固定部を有する、請求項8に記載の防塵構造体。 The dust-proof structure according to claim 8, wherein the outer portion has the fixing portion for defining a screw groove and / or a screw hole for screw-fixing the dust-proof structure to the alignment unit.
  10.  前記防塵構造体は、該防塵構造体を吊り上げ可能とする段差及び/又は傾斜を含む吊架受け部を有する、請求項1~7のいずれか1項に記載の防塵構造体。 The dust-proof structure according to any one of claims 1 to 7, wherein the dust-proof structure has a suspension receiving portion including a step and / or an inclination that enables the dust-proof structure to be lifted.
  11.  前記吊架受け部は、前記内周部における、前記外側部が形成された前記側面に設けられる、請求項10に記載の防塵構造体。 The dustproof structure according to claim 10, wherein the suspension receiving portion is provided on the side surface of the inner peripheral portion where the outer portion is formed.
  12.  前記枠体の平坦度が0超え200μm以下である、請求項1~11のいずれか1項に記載の防塵構造体。 The dustproof structure according to any one of claims 1 to 11, wherein the flatness of the frame is more than 0 and 200 μm or less.
  13.  前記防塵膜の膜厚は、1.5~8.0μmである、請求項1~12のいずれか1項に記載の防塵構造体。 The dust-proof structure according to any one of claims 1 to 12, wherein the dust-proof film has a film thickness of 1.5 to 8.0 μm.
  14.  前記固定部が想定するネジの中心軸を含み、かつ、前記防塵膜に直交する切断面視が、下記(1)~(3)のいずれかを満たす領域を含む、請求項1~13のいずれか1項に記載の防塵構造体。
    (1)前記防塵膜が前記内周部に展張支持された部分の幅T1が、前記内周部の厚みH1を超える(T1>H1>0)
    (2)前記外側部の厚みH2が、前記内周部の厚みH1の1/2以下(1/2・H1≧H2>0)である
    (3)前記開口のネジ受け幅T3に対する、前記内周部及び前記外側部の合計幅T2の比(T2/T3)が1~13の範囲内である
    Any of claims 1 to 13, wherein the fixing portion includes the central axis of the screw assumed, and the cut plane orthogonal to the dustproof film includes a region satisfying any of the following (1) to (3). The dustproof structure according to item 1.
    (1) The width T1 of the portion where the dust-proof film is stretched and supported on the inner peripheral portion exceeds the thickness H1 of the inner peripheral portion (T1>H1> 0).
    (2) The thickness H2 of the outer portion is ½ or less (1/2 · H1 ≧ H2> 0) of the thickness H1 of the inner peripheral portion. The ratio (T2 / T3) of the total width T2 of the peripheral portion and the outer portion is in the range of 1 to 13.
  15.  前記枠体と、前記防塵膜とは、互いに異なる固有振動数を有する、請求項1~14のいずれか1項に記載の防塵構造体。 The dust-proof structure according to any one of claims 1 to 14, wherein the frame and the dust-proof film have different natural frequencies from each other.
PCT/JP2021/030064 2020-08-20 2021-08-17 Dustproof structure for alignment unit WO2022039166A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2022543960A JP7375210B2 (en) 2020-08-20 2021-08-17 Dustproof structure for alignment unit
KR1020237004088A KR20230035093A (en) 2020-08-20 2021-08-17 Anti-vibration structure for alignment unit
CN202180050422.8A CN115956224A (en) 2020-08-20 2021-08-17 Dustproof structure for alignment unit

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020139630 2020-08-20
JP2020-139630 2020-08-20

Publications (1)

Publication Number Publication Date
WO2022039166A1 true WO2022039166A1 (en) 2022-02-24

Family

ID=80350439

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2021/030064 WO2022039166A1 (en) 2020-08-20 2021-08-17 Dustproof structure for alignment unit

Country Status (5)

Country Link
JP (1) JP7375210B2 (en)
KR (1) KR20230035093A (en)
CN (1) CN115956224A (en)
TW (1) TWI784668B (en)
WO (1) WO2022039166A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07311157A (en) * 1994-05-19 1995-11-28 Hoya Corp Inspection method and device for photomask
JPH113854A (en) * 1997-06-12 1999-01-06 Nikon Corp Aligner, exposure method and position sensing device
JP2005203522A (en) * 2004-01-14 2005-07-28 Nikon Corp Exposure method, aligner and device manufacturing method
JP2006078346A (en) * 2004-09-09 2006-03-23 Mach Eng:Kk Workpiece positioning device
JP2013116518A (en) * 2011-12-02 2013-06-13 Disco Corp Cutting device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004093976A (en) * 2002-08-30 2004-03-25 Nsk Ltd Alignment adjusting device
JP2005116965A (en) 2003-10-10 2005-04-28 Canon Inc Exposure system and its control method
JP6376601B2 (en) * 2015-05-18 2018-08-22 信越化学工業株式会社 Pellicle support means, pellicle support apparatus and pellicle mounting method using the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07311157A (en) * 1994-05-19 1995-11-28 Hoya Corp Inspection method and device for photomask
JPH113854A (en) * 1997-06-12 1999-01-06 Nikon Corp Aligner, exposure method and position sensing device
JP2005203522A (en) * 2004-01-14 2005-07-28 Nikon Corp Exposure method, aligner and device manufacturing method
JP2006078346A (en) * 2004-09-09 2006-03-23 Mach Eng:Kk Workpiece positioning device
JP2013116518A (en) * 2011-12-02 2013-06-13 Disco Corp Cutting device

Also Published As

Publication number Publication date
CN115956224A (en) 2023-04-11
KR20230035093A (en) 2023-03-10
TW202212991A (en) 2022-04-01
TWI784668B (en) 2022-11-21
JP7375210B2 (en) 2023-11-07
JPWO2022039166A1 (en) 2022-02-24

Similar Documents

Publication Publication Date Title
KR100925939B1 (en) Defect inspection apparatus and defect inspection method
KR101476871B1 (en) Projection optical system, exposure apparatus and method of manufacturing a device
TW201333638A (en) Substrate processing device, device manufacturing system and device manufacturing method
KR101121029B1 (en) Projection optical system, exposure apparatus and method of manufacturing a device
JP2008164729A (en) Light irradiator, light irradiation apparatus, and exposure method
KR20120000404A (en) Optical system for projection display apparatus
TWI663480B (en) Lithographic apparatus and method for exposing an exposure region on a substrate using said lithographic apparatus
JP3200244B2 (en) Scanning exposure equipment
WO2022039166A1 (en) Dustproof structure for alignment unit
WO2012058830A1 (en) Linewidth measuring device
JPH10142555A (en) Projection exposure device
US7863588B2 (en) Lighting optical apparatus and sample inspection apparatus
US9733567B2 (en) Reticle transmittance measurement method, and projection exposure method using the same
KR20200088529A (en) Inspection system for extreme ultra violet lithography pellicle
KR100689816B1 (en) Exposure apparatus and method of measuring the reticle arrangement
JPH10335242A (en) Apparatus and method for exposure
JP2006184889A (en) Alignment adjustment method, method for forming alignment mark, base material, and method for manufacturing transmissive optical element
US8749758B2 (en) Exposure apparatus and method of manufacturing device
WO2016155426A1 (en) Optical system for measurement of illumination pupil polarization state of mask aligner
TW201250377A (en) Photomask substrate, photomask, and pattern transfer method
JP2008139761A (en) Exposure method and exposure device
JP5147618B2 (en) Evaluation method and exposure apparatus
KR101578385B1 (en) Proximity exposure device, proximity exposure method and illumination optical system
JP2004354230A (en) Position detection device, exposure apparatus and exposure method
JP2022162408A (en) Foreign substance inspection device, exposure device, and method for manufacturing items

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21858310

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2022543960

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 20237004088

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 21858310

Country of ref document: EP

Kind code of ref document: A1