WO2022029200A1 - Device for disinfecting and/or sterilising a gas flowing through a pipe - Google Patents

Device for disinfecting and/or sterilising a gas flowing through a pipe Download PDF

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Publication number
WO2022029200A1
WO2022029200A1 PCT/EP2021/071812 EP2021071812W WO2022029200A1 WO 2022029200 A1 WO2022029200 A1 WO 2022029200A1 EP 2021071812 W EP2021071812 W EP 2021071812W WO 2022029200 A1 WO2022029200 A1 WO 2022029200A1
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WO
WIPO (PCT)
Prior art keywords
mirror
mirrors
radiation
advantageously
lateral
Prior art date
Application number
PCT/EP2021/071812
Other languages
French (fr)
Inventor
Olivier Perraud
Original Assignee
Ingenica Management Holding
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR2008292A external-priority patent/FR3113250A1/en
Application filed by Ingenica Management Holding filed Critical Ingenica Management Holding
Publication of WO2022029200A1 publication Critical patent/WO2022029200A1/en

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Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00—Disinfection, sterilisation or deodorisation of air
    • A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
    • A61L9/18—Radiation
    • A61L9/20—Ultra-violet radiation
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2209/00—Aspects relating to disinfection, sterilisation or deodorisation of air
    • A61L2209/10—Apparatus features
    • A61L2209/11—Apparatus for controlling air treatment
    • A61L2209/111—Sensor means, e.g. motion, brightness, scent, contaminant sensors

Definitions

  • the present invention relates to the technical field of ultraviolet sterilization and/or disinfection.
  • It relates in particular to devices for the disinfection and/or sterilization of a gas in a conduit, in particular of the air traveling in a conduit.
  • the ventilation of an interior space contributes to comfort and air quality by evacuating pollutants (odors, humidity, combustion products from heating appliances, microorganisms, etc.). It also contributes to preserving this interior space by avoiding disorders due to insufficient ventilation (condensation and development of mould).
  • the circulating air is however likely to contain pathogenic microorganisms (viruses, bacteria, etc.). These are then likely to be transported and disseminated in the ambient air of the interior space via the ventilation system.
  • pathogenic microorganisms viruses, bacteria, etc.
  • One of the solutions consists in the implementation of a device for the disinfection and/or sterilization of the air circulating in the ducts.
  • UV Disinfection / sterilization by ultraviolet radiation
  • the deactivation of the microorganisms is obtained by subjecting them to a sufficient dose of germicidal type UV radiation.
  • This dose corresponds to the cumulative radiation received by each microorganism during its stay in the irradiation zone. This dose is therefore directly proportional to the intensity of the radiation and the residence time in the radiation field.
  • the radiation from lamps is diffuse in all directions, thus generating radiation whose intensity decreases very rapidly with distance.
  • the devices usually used require the installation of a large number of individual lamps in the ducts so as to ensure sufficient irradiation efficiency.
  • Such a configuration creates pressure drops, a great complexity of installation and maintenance; it also requires a detailed study of each location.
  • the present invention proposes a treatment device for the disinfection and/or sterilization of a gas (air for example) traveling in a conduit.
  • the processing device comprises:
  • At least one radiating source also called “light source”
  • UV radiation preferably IIV-C radiation
  • the combination of mirrors comprises at least two side mirrors which are located on either side of a passage through which the gas to be treated is intended to flow.
  • Said at least two side mirrors are configured to reflect at least a portion of said UV radiation in the form of directional beams of UV radiation which are directed between said at least two side mirrors and which pass through said passage in both directions.
  • At least one of said two side mirrors consists of a reflector mirror which is coupled to said at least one radiating source to produce a directional beam of UV radiation, advantageously a parallel directional beam, which is oriented towards another side mirror.
  • the passage is thus crossed, among other things, by a combination of directional beams of UV radiation, advantageously parallel, offering optimum efficiency for the deactivation of the microorganisms traveling through the passage.
  • This combination of mirrors offers optimum efficiency for said at least one radiating source.
  • said combination of mirrors offers optimum efficiency for said at least one radiating source, all the higher in the presence of parallel radiation (advantageously oriented perpendicular to the mirrors). In the presence of such parallel radiation, the radiation decreases little with the distance traveled, and thus it is advantageously reflected alternately from one mirror to the other, a large number of times, multiplying the efficiency of the radiation with each passage.
  • the reflecting mirror has a concave profile, advantageously with a parabolic or semi-elliptical section.
  • said at least two side mirrors are configured to reflect at least a portion of said UV radiation in the form of two directional beams of UV rays which are directed between said at least two side mirrors and which each pass through said passage in one direction, opposite to each other.
  • the processing device comprises:
  • said processing device comprises:
  • a first side mirror consisting of a reflector mirror which is coupled to said radiating source to produce a directional beam of UV radiation, advantageously parallel, which is oriented towards a second side mirror, and
  • said second side mirror consisting of a plane mirror, located facing said first side mirror, to generate a directional beam of UV radiation which is reflected towards said first side mirror, which plane mirror defines a general plane which is perpendicular to an optical plane of said first side mirror.
  • the width of the plane mirror is advantageously greater than or equal to the width of the longitudinal opening of the reflector mirror.
  • said processing device comprises:
  • a first side mirror consisting of a reflector mirror which is coupled to said radiating source to produce a directional beam of UV radiation, advantageously parallel, which is oriented towards a second side mirror,
  • At least one additional first side mirror located at least on one side of said first side mirror, advantageously on one side of said first side mirror or on either side of said first side mirror, and
  • said second lateral mirror located opposite said first lateral mirror, advantageously a flat central reflector mirror (case where said at least one first additional lateral mirror is located on one side of said first lateral mirror) or a central dihedral reflector mirror (case where said at least one first additional side mirror is located on either side of said first side mirror), to produce a directional beam of UV radiation, advantageously parallel, which is oriented towards at least one first additional side mirror, - At least one second additional side mirror, located at least on one side of said second side mirror, advantageously on one side of said second side mirror or on either side of said second side mirror.
  • said at least one first additional side mirror and said at least one second additional side mirror are configured to reflect at least a portion of said UV radiation in the form of directional beams of UV radiation which are directed between said at least one first additional side mirror and said at least one second additional side mirror and which cross said passage in both directions, according to a zigzag trajectory.
  • Said at least one first additional lateral mirror and said at least one second additional lateral mirror are advantageously plane lateral mirrors, preferably in the form of simple parallel mirrors or in the form of dihedral mirrors.
  • said processing device comprises a combination of mirrors chosen from:
  • first additional side mirrors flat or dihedral, located on one side of said first side mirror
  • the first dihedral reflector mirrors and the second dihedral reflector mirrors advantageously comprise several juxtaposed dihedral mirrors
  • each dihedral mirror is arranged so that its bisector plane extends parallel to the optical plane of the first lateral mirror and to the bisector plane of the other dihedral mirrors; each plane reflector also extends parallel to the longitudinal axis passing through the center of the radiating source;
  • the first dihedral reflector mirrors and the second dihedral reflector mirrors are identical with respect to each other;
  • Two adjoining dihedral mirrors of the second lateral mirror form a pair of primary planar reflectors, convex, which is located and centered facing the primary reflector mirror;
  • the first dihedral reflector mirrors and/or the second dihedral reflector mirrors carry an end plane reflector which is provided to reflect the directional beam coming from an end plane reflector.
  • said combination of mirrors also comprises at least one source mirror, concave profile with section in an arc of a circle, partially enveloping said radiating source.
  • the source mirror includes:
  • the source mirror advantageously extends over an angular sector of at least 170°, or even 175°, or even 180°.
  • the source mirror advantageously extends over an optical angular sector of the radiating source, advantageously complementary to that received from said reflector mirror.
  • Said at least one radiating source and said at least one source mirror are advantageously located, at least partially, in the size of the reflector mirror defined by a plane passing through its longitudinal opening.
  • said combination of mirrors further comprises at least two transverse mirrors, parallel to each other and framing the side mirrors; these two mirrors transverse, in the presence of lamps and reflector mirrors with rectilinear generators, offer the advantage of returning the flat parallel beam towards the center of the passage, thus avoiding losses in the plane of the radiation:
  • At least one radiating source consists of at least one tubular IIV-C lamp; preferably, the surface of said at least one radiating source is cylindrical and said at least one source mirror is adjacent to the surface of said at least one radiating source;
  • said processing device advantageously comprises sensor means suitable for sensing the intensity of the radiation within the passage;
  • said processing device comprises control means, suitable for controlling the power of said at least one radiant source and, preferably, which control means comprise at least one module chosen from among a control module suitable for adjusting the power said at least one radiant source taking into account a radiation intensity setpoint (also called “radiant intensity”) and the radiation intensity collected by the sensor means and/or a control module adapted to adjust the power of said at least one radiant source taking into account the speed of the gas flow through said passage.
  • control means suitable for controlling the power of said at least one radiant source and, preferably, which control means comprise at least one module chosen from among a control module suitable for adjusting the power said at least one radiant source taking into account a radiation intensity setpoint (also called "radiant intensity") and the radiation intensity collected by the sensor means and/or a control module adapted to adjust the power of said at least one radiant source taking into account the speed of the gas flow through said passage.
  • the present invention also relates to the ventilation system, for example for a room, a building or a machine, comprising at least one duct provided with a treatment device according to the invention.
  • the processing device forms a section of said duct or is attached to a section of said duct.
  • FIG. 1 is a general perspective view of a processing device according to the invention, in the form of a first embodiment comprising two radiating source/reflecting mirror pairs;
  • FIG. 2 is a side view of the processing device according to FIG. 1;
  • FIG. 3 is a sectional view along the plane III-III illustrated in Figure 2;
  • FIG. 4 is a sectional and enlarged view of a radiating source associated with a source mirror
  • FIG. 5 is a general perspective view of a processing device according to the invention, in the form of a second embodiment comprising a radiating source/reflecting mirror pair in combination with a plane mirror;
  • FIG. 6 is a sectional view of the processing device according to FIG. 5;
  • FIG. 7 is a general view in section of a processing device according to the invention, in the form of a third embodiment comprising several dihedral mirrors;
  • FIG. 8 is a general sectional view of a processing device according to the invention, in the form of a fourth embodiment comprising a combination of mirrors;
  • FIG. 9 is a general perspective view of a variant of the treatment device according to FIG. 1, in which the longitudinal axis of the radiating sources is parallel to the airflow.
  • FIGS 1 and following thus illustrate a treatment device 1 according to the invention, which is suitable for the disinfection and/or sterilization, by ultraviolet radiation, of a gas traveling in a conduit.
  • the invention described below relates, for example, to the treatment of air.
  • the present invention can also be applied to other gases.
  • sterilization by ultraviolet radiation is a sterilization method (destruction of all microorganisms) based on the sensitivity of microorganisms to exposure to low ultraviolet wavelengths.
  • Disinfection by ultraviolet radiation is a method of disinfection (reduction of the number of living microorganisms) also based on the sensitivity of microorganisms to exposure to low ultraviolet wavelengths.
  • UV-C Ultraviolet
  • the treatment device 1 according to the invention is advantageously intended to equip a duct which forms part of an aeration system, advantageously conventional in itself.
  • Such a ventilation system is advantageously designed for the general renewal of air in an interior space, for example for a room, a building or a machine.
  • This ventilation system in fact ensures an inlet of new air (sometimes mixed with part of the stale air extracted from the building) and an outlet of stale air, thanks to a natural or mechanical device.
  • the ventilation system therefore comprises at least one duct (not shown), advantageously for the fresh air inlet and/or for the stale air outlet (or even a mixture of new and stale air), provided of the processing device 1 according to the invention.
  • duct advantageously encompasses the ducts, and other volumes, adapted to a circulation of gas, for example air.
  • duct we advantageously include ducts, and other volumes, suitable for air circulation.
  • duct we advantageously include ducts, and other volumes, suitable for air circulation.
  • duct is still commonly called, without being limiting, "duct” or “ventilation duct” or “ventilation chamber” or “air handling unit”.
  • the circulation of air in this duct is advantageously ensured by a fan module intended to regulate the speed at which the air flow travels.
  • the treatment device 1 advantageously forms a section of the duct; this treatment device 1 is therefore interposed/connected (hermetically to gases, in particular to air) between two sections of duct.
  • the processing device 1 is attached to (or within) a section of the duct (advantageously conventional in itself).
  • the processing device 1 comprises:
  • At least one radiant source 2 for the production of UV radiation, preferably UV-C radiation, and
  • Said at least one radiating source 2 advantageously consists of a lamp which is designed to emit the aforementioned UV radiation.
  • said at least one radiating source 2 consists of at least one tubular UV-C lamp.
  • the surface 21 of this radiating source 2 is then advantageously cylindrical (FIG. 4).
  • the radiating source 2 also advantageously comprises a center 2', here corresponding to the longitudinal axis of the tubular lamp (FIG. 4).
  • the longitudinal axis of the radiating source 2 is designated by the same reference 2' for the sake of simplification.
  • the longitudinal axis 2' of the radiating source 2 is advantageously:
  • the mirrors 3 are adapted and intended to reflect the UV radiation generated by said at least one radiating source 2.
  • the mirrors 3 in question consist for example, and in a conventional manner per se, of polished metal surfaces, or any other surface offering a good quality of radiation reflection.
  • the material is advantageously aluminum (offering a good quality of reflection).
  • this material will advantageously be treated by anodization supplemented by a treatment restoring the gloss lost following said anodization.
  • the combination of mirrors 3 is configured to reflect at least a portion of said UV radiation in the form of directional beams F1, F2, F3 of UV radiation which are directed between said mirrors 3 and which laterally cross said passage 6 in both directions.
  • Said combination of mirrors 3 is advantageously provided to reflect at least part of the UV radiation in the form of two directional beams F1, F2 of UV radiation, advantageously parallel, opposite to each other (the beams are illustrated very schematically in Figures 2 and 6).
  • the combination of mirrors 3 comprises at least two side mirrors 4, 5, 45, 46, 55, 58 (two or more in number) which are located on either side of a passage 6 through which the gases to be treated are intended to circulate.
  • Each of the side mirrors 4, 5, 45, 46, 55, 58 is configured to reflect at least part of the UV radiation (emitted by said at least one radiating source 2), advantageously in the direction of a side mirror 4, 5, 45, 46, 55, 58 opposite.
  • the passage 6 is thus advantageously crossed laterally by the directional beams F1, F2, F3 of UV radiation, preferably in the same direction but in two opposite directions with respect to each other.
  • Directional beam advantageously means a beam of radiation, advantageously parallel (or at least approximately parallel), in which the UV radiation is oriented in a single general direction.
  • the directional beams F1, F2, F3 of UV radiation are thus advantageously merged (or superimposed) and directed between said at least two lateral mirrors 4, 5, 45, 46, 55, 58.
  • the two directional beams F1, F2 have general directions which pass through said at least two side mirrors 4, 5, 45, 46, 55, 58 and which are coaxial.
  • the directional beams F1, F2, F3 of UV radiation are also advantageously oriented in opposite directions relative to each other (FIGS. 2 and 6).
  • said at least two side mirrors 4, 5 are configured to advantageously generate two directional beams F1, F2 of UV radiation:
  • each directional beam F1, F2 of UV radiation can come from a radiating source 2 (also called “incident beam”), as described below in relation to FIGS. 1 to 4.
  • a first directional beam F1 of UV radiation can come from a radiating source 2 (also called “incident beam”) and the second directional beam F2 of UV radiation (also called “reflected beam”), in the opposite direction , may consist of a beam obtained by reflection of said first directional beam F1 of UV radiation.
  • one at least two side mirrors 4 consists of a reflector mirror 4 which is coupled to said at least one radiating source 2 to produce a directional beam F1 of UV radiation (also called “incident beam”) which is oriented towards the other side mirror 4, 5.
  • the reflector mirror 4 in question (coupled to said at least one radiating source 2) is advantageously adapted to produce a directional beam F1, F2 of parallel UV radiation (whose rays which constitute it are parallel).
  • the reflector mirror 4 advantageously has the property of reflecting/converting (after reflection) the radiation coming from the "multidirectional" radiating source 2 into a so-called “parallel” beam (advantageously when the radiating source 2 is placed in its optical focus).
  • a parallel beam advantageously has the particularity of keeping a radiant intensity (also called “radiation intensity”) constant, whatever the distance from the radiating source 2.
  • the parallel beam advantageously comprises rays which are all parallel to the same plane, in this case the master plane 4' (also called “optical axis” or “optical plane”) of the reflector mirror 4.
  • the reflecting mirror 4 advantageously has a concave profile, advantageously with a parabolic or semi-elliptical section.
  • Such a reflecting mirror 4 advantageously comprises:
  • the longitudinal opening 41 advantageously has, without being limiting, a width which extends over an optical angular sector equal to that received by said reflector mirror 4 (corresponding to the optical angular sector emitted by the radiating source 2, advantageously in combination with a source mirror described later).
  • said processing device 1 comprises:
  • the two side mirrors 4 are advantageously identical with respect to each other. They are also advantageously symmetrical with respect to a median transverse plane which is oriented perpendicular to the optical plane P.
  • the two side mirrors 4 comprise optical planes 4' (also called “optical axes”) which advantageously coincide.
  • Each reflector mirror 4 is coupled to one of said radiating sources 2 to each produce a directional beam F1, F2 of UV radiation (also known as the "incident beam"), advantageously parallel, which is oriented towards the other side mirror 4 and which are opposite to each other.
  • a directional beam F1, F2 of UV radiation also known as the "incident beam”
  • Passage 6 is thus crossed by two directional beams F1, F2 of UV radiation, in opposite directions to one another, which are each produced by one of the two radiating sources 2.
  • These two directional beams F1, F2 of radiation U are advantageously oriented in the same direction, coinciding with the optical plane P, but in opposite directions relative to each other.
  • the two radiating sources 2 thus form a curtain or an optical blade of UV radiation in the passage 6, advantageously extending over its entire width, through which the gases to be treated will circulate.
  • Figure 9 illustrates a variant embodiment of this Figure 1, in which the longitudinal axis 2' of the radiating sources 2 is oriented parallel to the gas flow.
  • said processing device 1 comprises at least one module, or even two or more than two juxtaposed modules, each comprising:
  • the two side mirrors 4 are advantageously identical with respect to each other. They are also advantageously symmetrical with respect to a median transverse plane which is oriented perpendicular to the optical plane P.
  • the two side mirrors 4 comprise optical planes 4' (also called “optical axes”) which advantageously coincide.
  • Each reflector mirror 4 is coupled to one of said radiating sources 2 to each produce a directional beam F1, F2 of UV radiation (also known as the "incident beam"), advantageously parallel, which is oriented towards the other side mirror 4 and which are opposite to each other.
  • Passage 6 is thus crossed by two directional beams F1, F2 of UV radiation, in opposite directions to one another, which are each produced by one of the two radiating sources 2.
  • these two directional beams F1, F2 of UV radiation are advantageously oriented in the same direction, coinciding with the optical plane P, but in opposite directions relative to each other.
  • the two radiating sources 2 thus form a curtain or an optical blade of UV radiation in the passage 6, advantageously extending over part of the width, through which the gases to be treated will circulate.
  • the juxtaposed modules thus form a curtain or an optical blade of UV radiation in the passage 6, advantageously extending over the entire width, through which the gases to be treated will circulate.
  • the processing device 1 comprises:
  • a first lateral mirror 4 consisting of a reflector mirror 4 which is coupled to said radiating source 2 to produce a first directional beam F1 of UV radiation (also called an "incident beam"), advantageously parallel, which is oriented towards a second lateral mirror 5, and
  • said second lateral mirror 5 consisting of a plane mirror, located facing said first lateral mirror 4, to generate a second directional beam F2 of UV radiation (also called "reflected beam"), advantageously parallel, which reflects the first directional beam F1 towards said first side mirror 4.
  • the plane mirror 5 defines a general plane 5' which is perpendicular to the optical plane 4' of the first lateral mirror 4 (FIG. 6).
  • the width of the plane mirror 5 is preferably greater than or equal to the width of the longitudinal opening 41 of the reflector mirror 4.
  • the plane mirror 5 and the reflector mirror 4 are again advantageously arranged so that the optical plane 4' of the reflector mirror 4 passes through the center line of the plane mirror 5.
  • the combination of mirrors 3 is configured to reflect at least part of said UV radiation in the form of directional beams F3 of UV radiation which are directed between said mirrors 3, on either side of a first lateral mirror 4, and which cross the passage 6 laterally in both directions, along a zigzag trajectory.
  • such a said processing device 1 advantageously comprises:
  • first side mirror 4 consisting of a reflector mirror 4 which is coupled to said radiating source 2 to produce a directional beam F1 of UV radiation, advantageously parallel, which is directed towards a second side mirror 5,
  • first additional side mirror 45, 46 located at least on one side of said first side mirror 4, advantageously on one side of said first side mirror 4 or on either side of said first side mirror 4,
  • said second lateral mirror 5 advantageously a central dihedral reflector mirror or a central plane reflector mirror, located facing said first lateral mirror 4, to produce a directional beam F2 of UV radiation, advantageously parallel, which is oriented towards at least a first additional side mirror 45, 46, and
  • said second side mirror 5, said at least one first additional side mirror 45, 46 and said at least one second additional side mirror 55, 58 are configured to reflect at least a portion of said UV radiation in the form of directional beams F3 of radiation UV which are directed between said at least one first additional side mirror 45, 46 and said at least one second additional side mirror 55, 58 and which pass through said passage 6 in both directions, according to a zigzag trajectory.
  • the directional beam F1 of UV radiation from the first side mirror 4 is here split into beams F3 by the second side mirror 5.
  • These beams F3 are then intended to travel on either side of this first side mirror 4, between said at least one first additional side mirror 45, 46 and said at least one second additional side mirror 55, 58.
  • the processing device 1 comprises:
  • a first lateral mirror 4 consisting of a reflector mirror 4 which is coupled to said radiating source 2 to produce a directional beam F1 of UV radiation (also called “incident beam”), advantageously parallel, which is oriented towards a second lateral mirror 5 ,
  • the first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral are configured to reflect at least a portion of said UV radiation in the form of directional beams F3 of UV radiation which are directed between the first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral and which each cross said passage 6 in two directions, in a zigzag trajectory.
  • Such a system then makes it possible to generate a homogeneous fluence of UV radiation in the volume of the treatment device 1 from a single radiating source 2.
  • the directional beam F1 of UV radiation from the first side mirror 4 is here split into beams F3 by the second side mirror 5, intended to travel on either side of this first side mirror 4 (here in a form general in crenel).
  • the first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral advantageously comprise several dihedral mirrors 44, 55 juxtaposed (in series).
  • the first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral extend respectively in two general planes, parallel to one another.
  • dihedral mirror is advantageously meant a dihedral reflector 45, 55 which consists of two plane reflectors 45a, 55a (also called “plane mirrors” or “conductive planes”) defining between them an angle (in V), for example an orthogonal angle (90°).
  • These dihedral mirrors 45, 55 thus advantageously form 45° prism reflectors.
  • Each dihedral mirror 45, 55 is advantageously arranged so that its bisector plane 45', 55' extends parallel to the optical plane 4' of the first lateral mirror 4 and to the bisector plane 45', 55' of the other dihedral mirrors 45, 55 .
  • Each plane reflector 45a, 55a also extends parallel to the longitudinal axis passing through the center 2' of the radiating source 2.
  • first dihedral additional side mirrors 45 and the second dihedral additional side mirrors 55 are advantageously identical with respect to each other.
  • the first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral are here reversed on either side of the passage 6: a dihedral mirror 45, 55 located on one side of the passage 6 is here located facing a couple of planar reflectors 45a, 55a, convex, belonging to two adjoining dihedral mirrors 45, 55 located on another side of passage 6.
  • the second lateral mirror 5 advantageously a central dihedral reflector mirror, advantageously forms a pair of primary flat reflectors 5a, convex, which is located and centered facing the primary reflector mirror 4.
  • This second lateral mirror 5, convex is identical to the width of the longitudinal opening 41 of the primary reflector mirror 4.
  • the first additional side mirrors 45 or the second additional side mirrors 55 also advantageously carry an end plane reflector 56 which is provided to reflect in the opposite direction the directional beam coming from an end plane reflector 55a.
  • This end plane reflector 56 therefore extends here parallel to the optical plane 4' of the first lateral mirror 4 and to the bisector plane 45', 55' of the other dihedral mirrors 45, 55.
  • Said combination of mirrors 3 is thus adapted to reflect at least part of the UV radiation in the form of directional beams F1, F2 of UV radiation, traveling in two opposite directions with respect to each other.
  • the first lateral mirror 4 is advantageously pivotable with respect to the first dihedral reflector mirrors 45, so as to facilitate access to the radiating source 2 (in particular for maintenance operations).
  • This first lateral mirror 4 is thus movable between:
  • the processing device 1 comprises:
  • first lateral mirror 4 consisting of a reflector mirror 4 which is coupled to said radiating source 2 to produce a directional beam F1 of radiation U (also called “incident beam”), advantageously parallel, which is oriented towards a second lateral mirror 5 ,
  • first additional lateral mirrors 46 planes located on either side of said first lateral mirror 4, and
  • the first additional 46-plane side mirrors and the second additional 58-plane side mirrors are configured to reflect at least a portion of said UV radiation in the form of directional beams F3 of UV radiation which are directed between the first additional side mirrors 45 inclined and second additional side mirrors 58 planes and which each cross said passage 6 in both directions.
  • the directional beam F1 of UV radiation coming from the first lateral mirror 4 is here split into beams F3 by the second mirror 5, intended to travel on either side of this first lateral mirror 4 (here according to a trajectory in zigzag in the general shape of sawtooth).
  • the second side mirror 5 is in the form of a central dihedral reflector mirror.
  • dihedral reflector mirror is advantageously meant a dihedral reflector which consists of two plane reflectors 5a (also called “plane mirrors” or “conductive planes”) defining between them a convex angle (V-shaped), for example an angle ranging from from 2 to 30°.
  • the central dihedral reflector mirror 5 is advantageously arranged so that its bisector plane 5' extends coaxially to the optical plane 4' of the first lateral mirror 4.
  • This central dihedral reflector mirror 5, convex, is located and centered opposite the primary reflector mirror 4.
  • This convex central dihedral reflector mirror 5 is identical to the width of the longitudinal opening 41 of the primary reflector mirror 4.
  • the first additional side mirrors 46 planes and the second additional side mirrors 58 planes consisting of simple plane mirrors which are here inclined and advantageously extend parallel to each other and parallel to the two plane reflectors 5a of the second side mirror 5 .
  • first additional side mirrors 46 planes and the second additional side mirrors 58 planes are advantageously identical with respect to each other.
  • the first additional side mirrors 46 planes and the second additional side mirrors 58 planes are here inclined in the opposite direction on either side of the passage 6.
  • first additional lateral mirrors 46 planes and the second additional lateral mirrors 58 planes are installed according to at least one pair comprising a first additional lateral mirror 46 plane and a second additional lateral mirror 58 plane.
  • first additional lateral mirror 46 plane and the second additional lateral mirror 58 plane are arranged, one with respect to the other, according to a central symmetry.
  • a first additional side mirror 46 plane is advantageously inclined towards the optical plane 4' of the first side mirror 4 (its normal line converges towards the optical plane 4' of the first side mirror 4);
  • a second additional lateral plane mirror 58 is advantageously inclined in the opposite direction, opposite said optical plane 4' (its normal line diverges with respect to the optical plane 4' of the first lateral mirror 4).
  • a first additional side mirror 46 plane is advantageously inclined to generate a reflected ray parallel to the optical plane 4' of the first side mirror 4; a second additional side mirror 58 plane is advantageously inclined to generate a reflected ray inclined with respect to the optical plane 4' of the first side mirror, in the direction of a first additional side mirror 46 plane.
  • the combination of mirrors 3 comprises a single pair first additional lateral mirror 46 plane / additional lateral mirror 58 plane.
  • Each first additional lateral mirror 46 plane and each second additional lateral mirror 58 plane also extends parallel to the longitudinal axis passing through the center 2' of the radiating source 2.
  • the second side mirrors 58 also advantageously comprise an end plane reflector 581 which is provided to reflect in the opposite direction the directional beam coming from a first additional side mirror 46 end plane.
  • This end plane reflector 581 extends for this here perpendicular to the optical plane 4' of the first lateral mirror 4.
  • the mirror combination 3 thus advantageously comprises an end pair composed of an end plane reflector 581 and a first additional side mirror 46 end plane.
  • Said combination of mirrors 3 is thus adapted to reflect at least part of the UV radiation in the form of directional beams F1, F2, F3 of UV radiation, traveling in two opposite directions relative to each other.
  • the combination of mirrors comprises:
  • first additional side mirrors 45 flat or dihedral, located on one side of said first side mirror 4, and
  • said combination of mirrors 3 further comprises at least one source mirror 8 partially enveloping said radiating source 2 (FIG. 4).
  • Such a source mirror 8 is intended to direct the radiation from the associated radiating source 2 to the associated reflector mirror 4 as much as possible.
  • this source mirror 8 here consists of a concave profile, with a circular arc section.
  • the source mirror 8 also advantageously comprises: - a longitudinal opening 81, oriented towards the associated reflector mirror 4, and
  • the longitudinal opening 81 is advantageously centered with respect to the optical plane 4' of the reflector mirror 4.
  • the source mirror 8 advantageously extends over an angular sector of at least 170°, or even 175°, or even 180°.
  • Source mirror 8 advantageously extends over an optical angular sector of radiating source 2, advantageously complementary to that received from said reflector mirror 4.
  • the source mirror 8 is adjacent to the cylindrical surface 21 of the radiating source 2.
  • joining is advantageously meant a distance ranging from 0 to 10 mm, or even from 0 to 5 mm (or even chosen from 1, 2, 3, 4, 5, 6, 7, 8, 9, 10 mm), between the source mirror 8 and the cylindrical surface 21 of the radiating source 2.
  • the size of the reflector mirror 4 is defined in particular by a plane 41' which passes through its longitudinal opening 41 (FIG. 3 in particular).
  • said at least one radiating source 2 and/or said at least one source mirror 8 are located, at least partially, in the size of the reflector mirror 4 .
  • said at least one radiating source 2 and/or the combination of mirrors 3 are located on either side of the passage 6, so as in particular to limit the obstacles to the circulation of gases in this passage 6.
  • said combination of mirrors 3 further comprises at least two transverse mirrors 9, advantageously parallel to each other, framing the side mirrors 4, 5.
  • the transverse mirrors 9 are advantageously connected with the side edges of the side mirrors 4, 5.
  • the transverse mirrors 9 define, in association with the side mirrors 4, 5, a chassis or frame which delimits the passage 6.
  • transverse mirrors 9 participate in reflecting/maintaining UV radiation within passage 6.
  • Each directional beam F1, F2, F3 of UV radiation thus advantageously extends over the width of the passage 6 which is delimited by the transverse mirrors 9.
  • the processing device 1 further comprises control means 10 which are suitable for controlling the power of said at least one radiating source 2.
  • the control means 10 comprise, for example, conventional electronic means per se, for example of the microcontroller type integrating a computer program comprising program code means executed by said microcontroller.
  • the processing device 1 advantageously comprises sensor means 11 suitable for sensing the radiant intensity (in UV radiation) within the passage 6.
  • the monitoring of this measurement makes it possible in particular to detect a drop in efficiency of the treatment device 1 , requiring for example cleaning or replacement of said at least one radiant source 2 .
  • the sensor means 11 comprise at least one UV radiometer, which allows the measurement of the radiation intensity actually emitted in the passage 6.
  • the sensor means 11 are advantageously distributed over the transverse mirrors 9.
  • the control means 10 then comprise a control module 101 adapted to adjust the power of said at least one radiant source 2 taking into account a radiant intensity setpoint.
  • a decrease in the radiant intensity (in UV radiation) within the passage 6 is then compensated by an increase in the power of said at least one radiant source 2.
  • control means 10 may include a control module 102 adapted to adjust the power of said at least one radiating source 2 taking into account the speed of the gas flow through said passage 6.
  • An increase in the speed of the air flow within the passage 6 is then compensated by an increase in the power of said at least one radiating source 2.
  • control means 10 control said at least one radiating source 2 to produce UV radiation.
  • these UV rays are reflected in the form of the two directional beams F1, F2 of UV rays which are directed between the side mirrors 4, 5.
  • the directional beams F3 of UV radiation are directed between the first dihedral reflector mirrors 45 and the second dihedral reflector mirrors 55 and pass through the passage 6 in two directions, opposite to each other. another, here forming a flux of UV radiation in the general form of a slot.
  • the flow of gas passes through these directional beams F1, F2, F3 of UV radiation, subjecting any microorganisms to a sufficient dose of germicidal type UV radiation.

Abstract

The present invention relates to a treatment device, for disinfecting and/or sterilising a gas flowing through a pipe, which treatment device (1) comprises: (i) at least one radiating source (2) for producing UV radiation, preferably UV-C radiation, (ii) a combination of mirrors (3), associated with the at least one radiating source (2) and intended to reflect the UV radiation. The combination of mirrors (3) comprises at least two side mirrors (4, 5) which are located on either side of a passageway (6) through which the gases to be treated flow. The at least two side mirrors (4, 5) are configured to reflect at least one portion of the UV radiation in the form of directional beams (F1, F2) of UV radiation which are directed between the at least two side mirrors (4, 5) and which pass through the passageway (6) in both directions. And at least one of the two side mirrors (4, 5) comprises a reflecting mirror (4) which is coupled to the at least one radiating source to produce a directional beam (F1, F2) of UV radiation, advantageously a parallel directional beam, which is oriented towards the other side mirror (4, 5).

Description

Description Description
Dispositif pour la désinfection et/ou la stérilisation d’un gaz dans un conduitDevice for disinfection and/or sterilization of a gas in a conduit
Domaine technique de l'invention Technical field of the invention
La présente invention concerne le domaine technique de la stérilisation et/ou désinfection aux ultraviolets. The present invention relates to the technical field of ultraviolet sterilization and/or disinfection.
Elle concerne en particulier les dispositifs pour la désinfection et/ou la stérilisation d’un gaz dans un conduit, en particulier de l’air cheminant dans un conduit. It relates in particular to devices for the disinfection and/or sterilization of a gas in a conduit, in particular of the air traveling in a conduit.
Etat de la technique State of the art
La ventilation d’un espace intérieur contribue au confort et à la qualité de l’air en évacuant les polluants (odeurs, humidité, produits de combustion des appareils de chauffage, microorganismes, etc.). Elle participe également à préserver cet espace intérieur en évitant les désordres dus à une aération insuffisante (condensation et développement de moisissures). The ventilation of an interior space contributes to comfort and air quality by evacuating pollutants (odors, humidity, combustion products from heating appliances, microorganisms, etc.). It also contributes to preserving this interior space by avoiding disorders due to insufficient ventilation (condensation and development of mould).
L’air circulant est toutefois susceptible de contenir des microorganismes pathogènes (virus, bactéries, etc.). Ces derniers sont alors susceptibles d’être transportés et disséminés dans l'air ambiant de l’espace intérieur via le système de ventilation. The circulating air is however likely to contain pathogenic microorganisms (viruses, bacteria, etc.). These are then likely to be transported and disseminated in the ambient air of the interior space via the ventilation system.
Cette présence de microorganismes dangereux pour la santé, transportés par l’air circulant, peut nécessiter de prendre les mesures nécessaires pour éradiquer ces agents pathogènes. This presence of microorganisms dangerous to health, transported by circulating air, may require taking the necessary measures to eradicate these pathogens.
Une des solutions consiste en la mise en œuvre d’un dispositif pour la désinfection et/ou la stérilisation de l’air circulant dans les conduits. One of the solutions consists in the implementation of a device for the disinfection and/or sterilization of the air circulating in the ducts.
La désinfection / stérilisation par rayonnement ultraviolet (désigné UV ci-après) est une réponse à ce problème. La désactivation des microorganismes est obtenue en les soumettant à une dose suffisante de rayonnement UV de type germicide. Disinfection / sterilization by ultraviolet radiation (referred to as UV hereafter) is a response to this problem. The deactivation of the microorganisms is obtained by subjecting them to a sufficient dose of germicidal type UV radiation.
Cette dose correspond au cumul du rayonnement reçu par chaque microorganisme au cours de son séjour dans la zone d’irradiation. Cette dose est donc directement proportionnelle à l’intensité du rayonnement et au temps de séjour dans le champ du rayonnement. This dose corresponds to the cumulative radiation received by each microorganism during its stay in the irradiation zone. This dose is therefore directly proportional to the intensity of the radiation and the residence time in the radiation field.
Or le rayonnement des lampes est diffus, dans toutes les directions, générant ainsi un rayonnement dont l’intensité diminue très rapidement avec la distance. However, the radiation from lamps is diffuse in all directions, thus generating radiation whose intensity decreases very rapidly with distance.
De ce fait, les dispositifs habituellement utilisés nécessitent l’installation d’une grande quantité de lampes individuelles dans les conduits de manière à assurer une efficacité d’irradiation suffisante. Une telle configuration créée des pertes de charges, une grande complexité d’installation et de maintenance ; elle nécessite en outre d’étudier en détail chaque implantation. As a result, the devices usually used require the installation of a large number of individual lamps in the ducts so as to ensure sufficient irradiation efficiency. Such a configuration creates pressure drops, a great complexity of installation and maintenance; it also requires a detailed study of each location.
Il existe ainsi un intérêt à disposer de dispositifs pour la désinfection et/ou la stérilisation d’un gaz cheminant dans un conduit, en particulier de l’air cheminant dans un conduit, dont l’efficacité est améliorée. Présentation de l'invention There is thus an interest in having devices for the disinfection and/or sterilization of a gas traveling in a conduit, in particular of the air traveling in a conduit, the effectiveness of which is improved. Presentation of the invention
Afin de remédier à l’inconvénient précité de l’état de la technique, la présente invention propose un dispositif de traitement pour la désinfection et/ou la stérilisation d’un gaz (air par exemple) cheminant dans un conduit. In order to remedy the aforementioned drawback of the state of the art, the present invention proposes a treatment device for the disinfection and/or sterilization of a gas (air for example) traveling in a conduit.
Le dispositif de traitement selon l’invention comprend : The processing device according to the invention comprises:
(i) au moins une source rayonnante (dite encore « source lumineuse »), pour la production de rayonnements UV, de préférence des rayonnements IIV-C, (i) at least one radiating source (also called “light source”), for the production of UV radiation, preferably IIV-C radiation,
(ii) une combinaison de miroirs, associés à ladite au moins une source rayonnante et destinés à réfléchir lesdits rayonnements UV. (ii) a combination of mirrors, associated with said at least one radiating source and intended to reflect said UV radiation.
La combinaison de miroirs comprend au moins deux miroirs latéraux qui sont implantés de part et d’autre d’un passage au travers duquel le gaz à traiter est destiné à circuler. The combination of mirrors comprises at least two side mirrors which are located on either side of a passage through which the gas to be treated is intended to flow.
Lesdits au moins deux miroirs latéraux sont configurés pour réfléchir au moins une partie desdits rayonnements UV sous la forme de faisceaux directionnels de rayonnements UV qui sont dirigés entre lesdits au moins deux miroirs latéraux et qui traversent ledit passage dans les deux sens. Said at least two side mirrors are configured to reflect at least a portion of said UV radiation in the form of directional beams of UV radiation which are directed between said at least two side mirrors and which pass through said passage in both directions.
Et l’un au moins desdits deux miroirs latéraux consiste en un miroir réflecteur qui est couplé à ladite au moins une source rayonnante pour produire un faisceau directionnel de rayonnements UV, avantageusement un faisceau directionnel parallèle, qui est orienté vers un autre miroir latéral. And at least one of said two side mirrors consists of a reflector mirror which is coupled to said at least one radiating source to produce a directional beam of UV radiation, advantageously a parallel directional beam, which is oriented towards another side mirror.
Dans la présente invention, le passage est ainsi traversé, entre autre, par une combinaison de faisceaux directionnels de rayonnements UV, avantageusement parallèles, offrant une efficacité optimale pour la désactivation des microorganismes cheminant au travers du passage. In the present invention, the passage is thus crossed, among other things, by a combination of directional beams of UV radiation, advantageously parallel, offering optimum efficiency for the deactivation of the microorganisms traveling through the passage.
Cette combinaison de miroirs offre un rendement optimal pour ladite au moins une source rayonnante. This combination of mirrors offers optimum efficiency for said at least one radiating source.
Sans être limité par une quelconque théorie, ladite combinaison de miroirs offre un rendement optimal pour ladite au moins une source rayonnante, d’autant plus élevé en présence d’un rayonnement parallèle (avantageusement orienté perpendiculairement aux miroirs). En présence d’un tel rayonnement parallèle, le rayonnement diminue peu avec la distance parcourue, et ainsi il est avantageusement réfléchi alternativement d’un miroir vers l’autre, un grand nombre de fois, multipliant l’efficacité du rayonnement à chaque passage. Without being limited by any theory, said combination of mirrors offers optimum efficiency for said at least one radiating source, all the higher in the presence of parallel radiation (advantageously oriented perpendicular to the mirrors). In the presence of such parallel radiation, the radiation decreases little with the distance traveled, and thus it is advantageously reflected alternately from one mirror to the other, a large number of times, multiplying the efficiency of the radiation with each passage.
De préférence, le miroir réflecteur présente un profilé concave, avantageusement à section parabolique ou semi-elliptique. Preferably, the reflecting mirror has a concave profile, advantageously with a parabolic or semi-elliptical section.
Le miroir réflecteur comporte avantageusement : The reflecting mirror advantageously comprises:
- une ouverture longitudinale orientée vers l’autre miroir latéral, et/ou - a longitudinal opening facing the other side mirror, and/or
- un foyer optique confondu avec le centre de ladite au moins une source rayonnante.- An optical focal point coinciding with the center of said at least one radiating source.
De manière générale, lesdits au moins deux miroirs latéraux sont configurés pour réfléchir au moins une partie desdits rayonnements UV sous la forme de deux faisceaux directionnels de rayonnements UV qui sont dirigés entre lesdits au moins deux miroirs latéraux et qui traversent chacun ledit passage dans un sens, inverses l’un par rapport à l’autre. Generally, said at least two side mirrors are configured to reflect at least a portion of said UV radiation in the form of two directional beams of UV rays which are directed between said at least two side mirrors and which each pass through said passage in one direction, opposite to each other.
Selon un premier mode de réalisation préféré, le dispositif de traitement comprend : According to a first preferred embodiment, the processing device comprises:
- deux sources rayonnantes, implantées avantageusement sur un même plan optique, de part et d’autre dudit passage, et - two radiating sources, advantageously located on the same optical plane, on either side of said passage, and
- deux miroirs latéraux consistant en des miroirs réflecteurs, avantageusement identiques l’un par rapport à l’autre, qui sont chacun couplés à l’une desdites sources rayonnantes pour produire chacun un faisceau directionnel de rayonnements UV, avantageusement parallèle, qui est orienté vers l’autre miroir latéral, en sens inverse l’un par rapport à l’autre. - two side mirrors consisting of reflector mirrors, advantageously identical with respect to each other, which are each coupled to one of said radiating sources to each produce a directional beam of UV radiation, advantageously parallel, which is oriented towards the other side mirror, in the opposite direction relative to each other.
Selon un second mode de réalisation préféré, ledit dispositif de traitement comprend :According to a second preferred embodiment, said processing device comprises:
- une source rayonnante, - a radiant source,
- un premier miroir latéral consistant en un miroir réflecteur qui est couplé à ladite source rayonnante pour produire un faisceau directionnel de rayonnements UV, avantageusement parallèle, qui est orienté vers un second miroir latéral, et - a first side mirror consisting of a reflector mirror which is coupled to said radiating source to produce a directional beam of UV radiation, advantageously parallel, which is oriented towards a second side mirror, and
- ledit second miroir latéral consistant en un miroir plan, implanté en regard dudit premier miroir latéral, pour générer un faisceau directionnel de rayonnements UV qui est réfléchi vers ledit premier miroir latéral, lequel miroir plan définit un plan général qui est perpendiculaire à un plan optique dudit premier miroir latéral. - said second side mirror consisting of a plane mirror, located facing said first side mirror, to generate a directional beam of UV radiation which is reflected towards said first side mirror, which plane mirror defines a general plane which is perpendicular to an optical plane of said first side mirror.
La largeur du miroir plan est avantageusement supérieure, ou égale, à la largeur de l’ouverture longitudinale du miroir réflecteur. The width of the plane mirror is advantageously greater than or equal to the width of the longitudinal opening of the reflector mirror.
Encore selon un autre mode de réalisation, ledit dispositif de traitement comprend : Yet according to another embodiment, said processing device comprises:
- une source rayonnante, - a radiant source,
- un premier miroir latéral consistant en un miroir réflecteur qui est couplé à ladite source rayonnante pour produire un faisceau directionnel de rayonnements UV, avantageusement parallèle, qui est orienté vers un second miroir latéral, - a first side mirror consisting of a reflector mirror which is coupled to said radiating source to produce a directional beam of UV radiation, advantageously parallel, which is oriented towards a second side mirror,
- au moins un premier miroir latéral additionnel, implanté au moins d’un côté dudit premier miroir latéral, avantageusement d’un côté dudit premier miroir latéral ou de part et d’autre dudit premier miroir latéral, et - at least one additional first side mirror, located at least on one side of said first side mirror, advantageously on one side of said first side mirror or on either side of said first side mirror, and
- ledit second miroir latéral, implanté en regard dudit premier miroir latéral, avantageusement un miroir réflecteur central plan (cas où ledit au moins un premier miroir latéral additionnel est implanté d’un côté dudit premier miroir latéral) ou un miroir réflecteur diédrique central (cas où ledit au moins un premier miroir latéral additionnel est implanté de part et d’autre dudit premier miroir latéral), pour produire un faisceau directionnel de rayonnements UV, avantageusement parallèle, qui est orienté vers au moins un premier miroir latéral additionnel, - au moins un second miroir latéral additionnel, implanté au moins d’un côté dudit second miroir latéral, avantageusement d’un côté dudit second miroir latéral ou de part et d’autre dudit second miroir latéral. - said second lateral mirror, located opposite said first lateral mirror, advantageously a flat central reflector mirror (case where said at least one first additional lateral mirror is located on one side of said first lateral mirror) or a central dihedral reflector mirror (case where said at least one first additional side mirror is located on either side of said first side mirror), to produce a directional beam of UV radiation, advantageously parallel, which is oriented towards at least one first additional side mirror, - At least one second additional side mirror, located at least on one side of said second side mirror, advantageously on one side of said second side mirror or on either side of said second side mirror.
Ledit second miroir latéral, ledit au moins un premier miroir latéral additionnel et ledit au moins un second miroir latéral additionnel sont configurés pour réfléchir au moins une partie desdits rayonnements UV sous la forme de faisceaux directionnels de rayonnements UV qui sont dirigés entre ledit au moins un premier miroir latéral additionnel et ledit au moins un second miroir latéral additionnel et qui traversent ledit passage dans les deux sens, selon une trajectoire en zigzag. Said second side mirror, said at least one first additional side mirror and said at least one second additional side mirror are configured to reflect at least a portion of said UV radiation in the form of directional beams of UV radiation which are directed between said at least one first additional side mirror and said at least one second additional side mirror and which cross said passage in both directions, according to a zigzag trajectory.
Ledit au moins un premier miroir latéral additionnel et ledit au moins un second miroir latéral additionnel sont avantageusement des miroirs latéraux plans, de préférence sous la forme de miroirs simples parallèles ou sous la forme de miroirs diédriques. Said at least one first additional lateral mirror and said at least one second additional lateral mirror are advantageously plane lateral mirrors, preferably in the form of simple parallel mirrors or in the form of dihedral mirrors.
De préférence, ledit dispositif de traitement comprend une combinaison de miroirs choisie parmi : Preferably, said processing device comprises a combination of mirrors chosen from:
(i) une première combinaison de miroirs comprenant : (i) a first combination of mirrors comprising:
- ledit second miroir latéral, implanté en regard dudit premier miroir latéral, formant un miroir réflecteur diédrique central, - said second lateral mirror, located facing said first lateral mirror, forming a central dihedral reflector mirror,
- des premiers miroirs latéraux additionnels diédriques, implantés de part et d’autre dudit premier miroir latéral, et - first additional dihedral side mirrors, located on either side of said first side mirror, and
- des seconds miroirs latéraux additionnels diédriques, implantés de part et d’autre dudit second miroir latéral, ou - second additional dihedral side mirrors, located on either side of said second side mirror, or
(ii) une seconde combinaison de miroirs comprenant : (ii) a second combination of mirrors comprising:
- ledit second miroir latéral, implanté en regard dudit premier miroir latéral, formant un miroir réflecteur diédrique central, - said second lateral mirror, located facing said first lateral mirror, forming a central dihedral reflector mirror,
- des premiers miroirs latéraux additionnels plans, implantés de part et d’autre dudit premier miroir latéral, et - first additional plane side mirrors, located on either side of said first side mirror, and
- des seconds miroirs latéraux additionnels plans, implantés de part et d’autre dudit second miroir latéral, ou - second additional flat side mirrors, located on either side of said second side mirror, or
(iii) une troisième combinaison de miroirs comprenant : (iii) a third combination of mirrors comprising:
- ledit second miroir latéral, implanté en regard dudit premier miroir latéral, formant un miroir réflecteur plan central, - said second lateral mirror, located facing said first lateral mirror, forming a central plane reflector mirror,
- des premiers miroirs latéraux additionnels, plans ou diédriques, implantés d’un côté dudit premier miroir latéral, et - first additional side mirrors, flat or dihedral, located on one side of said first side mirror, and
- des seconds miroirs latéraux additionnels, plans ou diédriques, implantés d’un côté dudit second miroir latéral. D’autres caractéristiques non limitatives et avantageuses de la première combinaison conforme à l’invention, prises individuellement ou selon toutes les combinaisons techniquement possibles, sont les suivantes : - Second additional side mirrors, flat or dihedral, located on one side of said second side mirror. Other non-limiting and advantageous characteristics of the first combination in accordance with the invention, taken individually or according to all the technically possible combinations, are the following:
- les premiers miroirs réflecteurs diédriques et les seconds miroirs réflecteurs diédriques comprennent avantageusement plusieurs miroirs diédriques juxtaposés ; - the first dihedral reflector mirrors and the second dihedral reflector mirrors advantageously comprise several juxtaposed dihedral mirrors;
- chaque miroir diédrique est agencé de sorte que son plan bissecteur s’étend parallèlement au plan optique du premier miroir latéral et au plan bissecteur des autres miroirs diédriques ; chaque réflecteur plan s’étend en plus parallèlement à l’axe longitudinal passant par le centre de la source rayonnante ; - each dihedral mirror is arranged so that its bisector plane extends parallel to the optical plane of the first lateral mirror and to the bisector plane of the other dihedral mirrors; each plane reflector also extends parallel to the longitudinal axis passing through the center of the radiating source;
- les premiers miroirs réflecteurs diédriques et les seconds miroirs réflecteurs diédriques sont identiques les uns par rapport aux autres ; - the first dihedral reflector mirrors and the second dihedral reflector mirrors are identical with respect to each other;
- les premiers miroirs réflecteurs diédriques et les seconds miroirs réflecteurs diédriques sont inversés de part et d’autre du passage ; - the first dihedral reflector mirrors and the second dihedral reflector mirrors are reversed on either side of the passage;
- deux miroirs diédriques attenants du second miroir latéral forment un couple de réflecteurs plans primaires, convexe, qui est implanté et centré en regard du miroir réflecteur primaire ; - Two adjoining dihedral mirrors of the second lateral mirror form a pair of primary planar reflectors, convex, which is located and centered facing the primary reflector mirror;
- les premiers miroirs réflecteurs diédriques et/ou les seconds miroirs réflecteurs diédriques portent un réflecteur plan d’extrémité qui est prévu pour réfléchir le faisceau directionnel issu d’un réflecteur plan d’extrémité. - the first dihedral reflector mirrors and/or the second dihedral reflector mirrors carry an end plane reflector which is provided to reflect the directional beam coming from an end plane reflector.
De manière générale, ladite combinaison de miroirs comprend encore au moins un miroir source, profilé concave à section en arc de cercle, enveloppant partiellement ladite source rayonnante. In general, said combination of mirrors also comprises at least one source mirror, concave profile with section in an arc of a circle, partially enveloping said radiating source.
Le miroir source comporte : The source mirror includes:
- une ouverture longitudinale, orientée vers le miroir réflecteur, et - a longitudinal opening, oriented towards the reflecting mirror, and
- un foyer optique, avantageusement confondu avec le centre de ladite source rayonnante et avec le foyer optique dudit miroir réflecteur. - an optical focal point, advantageously coinciding with the center of said radiating source and with the optical focal point of said reflecting mirror.
Le miroir source s’étend avantageusement sur un secteur angulaire d’au moins 170°, voire de 175°, voire encore de 180°. The source mirror advantageously extends over an angular sector of at least 170°, or even 175°, or even 180°.
Le miroir source s’étend avantageusement sur un secteur angulaire optique de la source rayonnante, avantageusement complémentaire à celui reçu dudit miroir réflecteur. The source mirror advantageously extends over an optical angular sector of the radiating source, advantageously complementary to that received from said reflector mirror.
Ladite au moins une source rayonnante et ledit au moins un miroir source sont avantageusement implantés, au moins partiellement, dans l’encombrement du miroir réflecteur défini par un plan passant par son ouverture longitudinale. Said at least one radiating source and said at least one source mirror are advantageously located, at least partially, in the size of the reflector mirror defined by a plane passing through its longitudinal opening.
D’autres caractéristiques non limitatives et avantageuses du produit/procédé conforme à l’invention, prises individuellement ou selon toutes les combinaisons techniquement possibles, sont les suivantes : Other non-limiting and advantageous characteristics of the product/process in accordance with the invention, taken individually or in all technically possible combinations, are the following:
- ladite combinaison de miroirs comprend encore au moins deux miroirs transversaux, parallèles l’un par rapport à l’autre et encadrant les miroirs latéraux ; ces deux miroirs transversaux, en présence de lampes et de miroirs réflecteurs à génératrices rectilignes, offrent l’avantage de renvoyer le faisceau parallèle plan vers le centre du passage, évitant ainsi les déperditions dans le plan du rayonnement : - said combination of mirrors further comprises at least two transverse mirrors, parallel to each other and framing the side mirrors; these two mirrors transverse, in the presence of lamps and reflector mirrors with rectilinear generators, offer the advantage of returning the flat parallel beam towards the center of the passage, thus avoiding losses in the plane of the radiation:
- ladite au moins une source rayonnante consiste en au moins une lampe IIV-C tubulaire ; de préférence, la surface de ladite au moins une source rayonnante est cylindrique et ledit au moins un miroir source est attenant de la surface de ladite au moins une source rayonnante ; - Said at least one radiating source consists of at least one tubular IIV-C lamp; preferably, the surface of said at least one radiating source is cylindrical and said at least one source mirror is adjacent to the surface of said at least one radiating source;
- ledit dispositif de traitement comprend avantageusement des moyens capteurs adaptés à capter l’intensité du rayonnement au sein du passage ; - said processing device advantageously comprises sensor means suitable for sensing the intensity of the radiation within the passage;
- ledit dispositif de traitement comporte des moyens de commande, adaptés à la commande de la puissance de ladite au moins une source rayonnante et, de préférence, lesquels moyens de commande comportent au moins un module choisi parmi un module de pilotage adapté à ajuster la puissance de ladite au moins une source rayonnante tenant compte d’une consigne d’intensité de rayonnement (dit encore « intensité rayonnante ») et de l’intensité de rayonnement collectée par les moyens capteurs et/ou un module de pilotage adapté à ajuster la puissance de ladite au moins une source rayonnante tenant compte de la vitesse du flux des gaz au travers dudit passage. - said processing device comprises control means, suitable for controlling the power of said at least one radiant source and, preferably, which control means comprise at least one module chosen from among a control module suitable for adjusting the power said at least one radiant source taking into account a radiation intensity setpoint (also called "radiant intensity") and the radiation intensity collected by the sensor means and/or a control module adapted to adjust the power of said at least one radiant source taking into account the speed of the gas flow through said passage.
La présente invention concerne encore le système d’aération, par exemple pour un local, un bâtiment ou un engin, comprenant au moins un conduit muni d’un dispositif de traitement selon l’invention. The present invention also relates to the ventilation system, for example for a room, a building or a machine, comprising at least one duct provided with a treatment device according to the invention.
Le dispositif de traitement forme un tronçon dudit conduit ou est rapporté sur un tronçon dudit conduit. The processing device forms a section of said duct or is attached to a section of said duct.
Bien entendu, les différentes caractéristiques, variantes et formes de réalisation de l'invention peuvent être associées les unes avec les autres selon diverses combinaisons dans la mesure où elles ne sont pas incompatibles ou exclusives les unes des autres. Of course, the different characteristics, variants and embodiments of the invention can be associated with each other in various combinations insofar as they are not incompatible or exclusive of each other.
Description détaillée de l'invention Detailed description of the invention
De plus, diverses autres caractéristiques de l'invention ressortent de la description annexée effectuée en référence aux dessins qui illustrent des formes, non limitatives, de réalisation de l'invention et où : In addition, various other characteristics of the invention emerge from the appended description made with reference to the drawings which illustrate non-limiting forms of embodiment of the invention and where:
[Fig. 1] est une vue générale et en perspective d’un dispositif de traitement selon l’invention, sous la forme d’un premier mode de réalisation comprenant deux couples source rayonnante / miroir réflecteur ; [Fig. 1] is a general perspective view of a processing device according to the invention, in the form of a first embodiment comprising two radiating source/reflecting mirror pairs;
[Fig. 2] est une vue de côté du dispositif de traitement selon la figure 1 ; [Fig. 2] is a side view of the processing device according to FIG. 1;
[Fig. 3] est une vue en coupe selon le plan lll-lll illustré sur la figure 2 ; [Fig. 3] is a sectional view along the plane III-III illustrated in Figure 2;
[Fig. 4] est une vue en coupe et agrandie d’une source rayonnante associée à un miroir source ; [Fig. 5] est une vue générale et en perspective d’un dispositif de traitement selon l’invention, sous la forme d’un second mode de réalisation comprenant un couple source rayonnante / miroir réflecteur en combinaison avec un miroir plan ; [Fig. 4] is a sectional and enlarged view of a radiating source associated with a source mirror; [Fig. 5] is a general perspective view of a processing device according to the invention, in the form of a second embodiment comprising a radiating source/reflecting mirror pair in combination with a plane mirror;
[Fig. 6] est une vue en coupe du dispositif de traitement selon la figure 5 ; [Fig. 6] is a sectional view of the processing device according to FIG. 5;
[Fig. 7] est une vue générale et en coupe d’un dispositif de traitement selon l’invention, sous la forme d’un troisième mode de réalisation comprenant plusieurs miroirs diédriques ; [Fig. 7] is a general view in section of a processing device according to the invention, in the form of a third embodiment comprising several dihedral mirrors;
[Fig. 8] est une vue générale et en coupe d’un dispositif de traitement selon l’invention, sous la forme d’un quatrième mode de réalisation comprenant une combinaison de miroirs ; [Fig. 8] is a general sectional view of a processing device according to the invention, in the form of a fourth embodiment comprising a combination of mirrors;
[Fig. 9] est une vue générale et en perspective d’une variante du dispositif de traitement selon la figure 1 , dans laquelle l’axe longitudinal des sources rayonnantes est parallèle au flux d’air. [Fig. 9] is a general perspective view of a variant of the treatment device according to FIG. 1, in which the longitudinal axis of the radiating sources is parallel to the airflow.
Il est à noter que, sur ces figures, les éléments structurels et/ou fonctionnels communs aux différentes variantes peuvent présenter les mêmes références. It should be noted that, in these figures, the structural and/or functional elements common to the different variants may have the same references.
Les figures 1 et suivantes illustrent ainsi un dispositif de traitement 1 selon l’invention, qui est adapté à la désinfection et/ou la stérilisation, par rayonnement ultraviolet, d’un gaz cheminant dans un conduit. Figures 1 and following thus illustrate a treatment device 1 according to the invention, which is suitable for the disinfection and/or sterilization, by ultraviolet radiation, of a gas traveling in a conduit.
L’invention décrite ci-après concerne par exemple le traitement de l’air. La présente invention peut également s’appliquer à d’autres gaz. The invention described below relates, for example, to the treatment of air. The present invention can also be applied to other gases.
De manière générale, la stérilisation par rayonnement ultraviolet (connue en soi) est une méthode de stérilisation (destruction de la totalité des microorganismes) reposant sur la sensibilité des microorganismes à l'exposition aux basses longueurs d'onde des ultraviolets. In general, sterilization by ultraviolet radiation (known per se) is a sterilization method (destruction of all microorganisms) based on the sensitivity of microorganisms to exposure to low ultraviolet wavelengths.
La désinfection par rayonnement ultraviolet (également connue en soi) est une méthode de désinfection (réduction du nombre de microorganismes vivants) reposant également sur la sensibilité des microorganismes à l'exposition aux basses longueurs d'onde des ultraviolets. Disinfection by ultraviolet radiation (also known per se) is a method of disinfection (reduction of the number of living microorganisms) also based on the sensitivity of microorganisms to exposure to low ultraviolet wavelengths.
Par « ultraviolets », on entend avantageusement les UV-C, ayant une longueur d’onde allant de 100 à 280 nm et utilisés classiquement en laboratoire de biologie pour les effets germicides. “Ultraviolet” is advantageously understood to mean UV-C, having a wavelength ranging from 100 to 280 nm and conventionally used in the biology laboratory for germicidal effects.
Le dispositif de traitement 1 selon l’invention est avantageusement destiné à équiper un conduit qui fait partie d’un système d’aération, avantageusement classique en soi. The treatment device 1 according to the invention is advantageously intended to equip a duct which forms part of an aeration system, advantageously conventional in itself.
Un tel système d’aération est avantageusement conçu pour le renouvellement général d’air dans un espace intérieur, par exemple pour un local, un bâtiment ou un engin. Such a ventilation system is advantageously designed for the general renewal of air in an interior space, for example for a room, a building or a machine.
Ce système d’aération assure en effet une entrée d’air neuf (parfois mélangé avec une partie de l’air vicié extrait du bâtiment) et une sortie d’air vicié, grâce à un dispositif naturel ou mécanique. This ventilation system in fact ensures an inlet of new air (sometimes mixed with part of the stale air extracted from the building) and an outlet of stale air, thanks to a natural or mechanical device.
Le système d’aération comprend donc au moins un conduit (non représenté), avantageusement pour l’entrée d’air neuf et/ou pour la sortie d’air vicié (voire d’un mélange d’air neuf et vicié), muni du dispositif de traitement 1 selon l’invention. De manière générale, par « conduit », on englobe avantageusement les conduits, et autres volumes, adaptés à une circulation de gaz, par exemple l’air. The ventilation system therefore comprises at least one duct (not shown), advantageously for the fresh air inlet and/or for the stale air outlet (or even a mixture of new and stale air), provided of the processing device 1 according to the invention. In general, the term “duct” advantageously encompasses the ducts, and other volumes, adapted to a circulation of gas, for example air.
Par « conduit », on englobe avantageusement les conduits, et autres volumes, adaptés à une circulation d’air. Un tel conduit est encore couramment appelé, sans être limitatif, « gaine » ou « conduit de ventilation » ou « chambre d’aération » ou « centrale de traitement d’air ». By "duct", we advantageously include ducts, and other volumes, suitable for air circulation. Such a duct is still commonly called, without being limiting, "duct" or "ventilation duct" or "ventilation chamber" or "air handling unit".
La circulation de l’air dans ce conduit est avantageusement assurée par un module ventilateur destiné à réguler la vitesse de cheminement du flux d’air. The circulation of air in this duct is advantageously ensured by a fan module intended to regulate the speed at which the air flow travels.
Le dispositif de traitement 1 selon l’invention forme avantageusement un tronçon du conduit ; ce dispositif de traitement 1 est pour cela interposé / raccordé (hermétiquement aux gaz, en particulier à l’air) entre deux tronçons de conduit. De manière alternative, le dispositif de traitement 1 est rapporté sur (ou au sein de) un tronçon du conduit (avantageusement classique en soi). The treatment device 1 according to the invention advantageously forms a section of the duct; this treatment device 1 is therefore interposed/connected (hermetically to gases, in particular to air) between two sections of duct. Alternatively, the processing device 1 is attached to (or within) a section of the duct (advantageously conventional in itself).
Selon l’invention, le dispositif de traitement 1 comprend : According to the invention, the processing device 1 comprises:
- au moins une source rayonnante 2, pour la production de rayonnements UV, de préférence des rayonnements UV-C, et - at least one radiant source 2, for the production of UV radiation, preferably UV-C radiation, and
- une combinaison de miroirs 3, associés à ladite au moins une source rayonnante 2.- a combination of mirrors 3, associated with said at least one radiating source 2.
Ladite au moins une source rayonnante 2 consiste avantageusement en une lampe qui est conçue pour émettre les rayonnements UV précités. Said at least one radiating source 2 advantageously consists of a lamp which is designed to emit the aforementioned UV radiation.
De préférence, ladite au moins une source rayonnante 2 consiste en au moins une lampe UV-C tubulaire. Preferably, said at least one radiating source 2 consists of at least one tubular UV-C lamp.
La surface 21 de cette source rayonnante 2 est alors avantageusement cylindrique (figure 4). The surface 21 of this radiating source 2 is then advantageously cylindrical (FIG. 4).
La source rayonnante 2 comporte encore avantageusement un centre 2’, correspondant ici à l’axe longitudinal de la lampe tubulaire (figure 4). The radiating source 2 also advantageously comprises a center 2', here corresponding to the longitudinal axis of the tubular lamp (FIG. 4).
L’axe longitudinal de la source rayonnante 2 est désignée par le même repère 2’ dans un souci de simplification. The longitudinal axis of the radiating source 2 is designated by the same reference 2' for the sake of simplification.
De manière général, l’axe longitudinal 2’ de la source rayonnante 2 est avantageusement :In general, the longitudinal axis 2' of the radiating source 2 is advantageously:
- perpendiculaire au flux d’air (figure 1 notamment), ou - perpendicular to the air flow (figure 1 in particular), or
- parallèle au flux d’air (figure 9). - parallel to the air flow (figure 9).
Les miroirs 3 sont adaptés et destinés à réfléchir les rayonnements UV générés par ladite au moins une source rayonnante 2. The mirrors 3 are adapted and intended to reflect the UV radiation generated by said at least one radiating source 2.
Les miroirs 3 en question consistent par exemple, et de manière classique en soi, en des surfaces métalliques polies, ou tout autre surface offrant une bonne qualité de réflexion des rayonnements. The mirrors 3 in question consist for example, and in a conventional manner per se, of polished metal surfaces, or any other surface offering a good quality of radiation reflection.
Pour un rayonnement UV-C, le matériau est avantageusement l’aluminium (offrant une bonne qualité de réflexion). Afin de garantir une tenue dans le temps de la qualité réflectrice de l’aluminium, on traitera avantageusement ce matériau par anodisation complété par un traitement redonnant le brillant perdu suite à ladite anodisation. For UV-C radiation, the material is advantageously aluminum (offering a good quality of reflection). In order to guarantee that the reflective quality of the aluminum is held over time, this material will advantageously be treated by anodization supplemented by a treatment restoring the gloss lost following said anodization.
Pour une efficacité optimale des rayonnements UV émis par ladite au moins une source rayonnante 2, la combinaison de miroirs 3 est configurée pour réfléchir au moins une partie desdits rayonnements UV sous la forme de faisceaux directionnels F1 , F2, F3 de rayonnements UV qui sont dirigés entre lesdits miroirs 3 et qui traversent latéralement ledit passage 6 dans les deux sens. For optimum efficiency of the UV radiation emitted by said at least one radiating source 2, the combination of mirrors 3 is configured to reflect at least a portion of said UV radiation in the form of directional beams F1, F2, F3 of UV radiation which are directed between said mirrors 3 and which laterally cross said passage 6 in both directions.
Ladite combinaison de miroirs 3 est avantageusement prévue pour réfléchir au moins une partie des rayonnements UV sous la forme de deux faisceaux directionnels F1 , F2 de rayonnements UV, avantageusement parallèles, inverses l’un par rapport à l’autre (les faisceaux sont illustrés très schématiquement sur les figures 2 et 6). Said combination of mirrors 3 is advantageously provided to reflect at least part of the UV radiation in the form of two directional beams F1, F2 of UV radiation, advantageously parallel, opposite to each other (the beams are illustrated very schematically in Figures 2 and 6).
Pour cela, la combinaison de miroirs 3 comprend au moins deux miroirs latéraux 4, 5, 45, 46, 55, 58 (au nombre de deux ou plus) qui sont implantés de part et d’autre d’un passage 6 au travers duquel les gaz à traiter sont destinés à circuler. For this, the combination of mirrors 3 comprises at least two side mirrors 4, 5, 45, 46, 55, 58 (two or more in number) which are located on either side of a passage 6 through which the gases to be treated are intended to circulate.
Chacun des miroirs latéraux 4, 5, 45, 46, 55, 58 est configuré pour réfléchir au moins une partie des rayonnements UV (émis par ladite au moins une source rayonnante 2), avantageusement en direction d’un miroir latéral 4, 5, 45, 46, 55, 58 opposé. Each of the side mirrors 4, 5, 45, 46, 55, 58 is configured to reflect at least part of the UV radiation (emitted by said at least one radiating source 2), advantageously in the direction of a side mirror 4, 5, 45, 46, 55, 58 opposite.
Le passage 6 est ainsi avantageusement traversé latéralement par les faisceaux directionnels F1 , F2, F3 de rayonnements UV, de préférence selon une même direction mais dans deux sens inverses l’un par rapport à l’autre. The passage 6 is thus advantageously crossed laterally by the directional beams F1, F2, F3 of UV radiation, preferably in the same direction but in two opposite directions with respect to each other.
Par « faisceau directionnel », on entend avantageusement un faisceau de rayonnements, avantageusement parallèle (ou au moins approximativement parallèle), dans lequel les rayonnements UV sont orientés dans une seule direction générale. “Directional beam” advantageously means a beam of radiation, advantageously parallel (or at least approximately parallel), in which the UV radiation is oriented in a single general direction.
Les faisceaux directionnels F1 , F2, F3 de rayonnements UV sont avantageusement ainsi confondus (ou superposés) et dirigés entre lesdits au moins deux miroirs latéraux 4, 5, 45, 46, 55, 58. En d’autres termes, les deux faisceaux directionnels F1 , F2 comportent des directions générales qui passent par lesdits au moins deux miroirs latéraux 4, 5, 45, 46, 55, 58 et qui sont coaxiales. The directional beams F1, F2, F3 of UV radiation are thus advantageously merged (or superimposed) and directed between said at least two lateral mirrors 4, 5, 45, 46, 55, 58. In other words, the two directional beams F1, F2 have general directions which pass through said at least two side mirrors 4, 5, 45, 46, 55, 58 and which are coaxial.
Les faisceaux directionnels F1 , F2, F3 de rayonnements UV sont en plus avantageusement orientés en sens inverses l’un par rapport à l’autre (figures 2 et 6). The directional beams F1, F2, F3 of UV radiation are also advantageously oriented in opposite directions relative to each other (FIGS. 2 and 6).
En d’autres termes, lesdits au moins deux miroirs latéraux 4, 5 sont configurés pour générer avantageusement deux faisceaux directionnels F1 , F2 de rayonnements UV : In other words, said at least two side mirrors 4, 5 are configured to advantageously generate two directional beams F1, F2 of UV radiation:
- un premier faisceau directionnel F1 de rayonnements UV dirigé depuis un premier miroir latéral 4 vers un second miroir latéral 4, 5 (de gauche à droite sur les figures), et - a first directional beam F1 of UV radiation directed from a first side mirror 4 to a second side mirror 4, 5 (from left to right in the figures), and
- un second faisceau directionnel F2 de rayonnements UV dirigé depuis ledit second miroir latéral 4, 5 vers ledit premier miroir latéral 4 (de droite à gauche sur les figures). En l’espèce, chaque faisceau directionnel F1 , F2 de rayonnements UV peut être issu d’une source rayonnante 2 (dit encore « faisceau incident »), tel que décrit ci-après en relation avec les figures 1 à 4. - A second directional beam F2 of UV radiation directed from said second side mirror 4, 5 to said first side mirror 4 (from right to left in the figures). In this case, each directional beam F1, F2 of UV radiation can come from a radiating source 2 (also called “incident beam”), as described below in relation to FIGS. 1 to 4.
De manière alternative, un premier faisceau directionnel F1 de rayonnements UV peut être issu d’une source rayonnante 2 (dit encore « faisceau incident ») et le second faisceau directionnel F2 de rayonnements UV (dit encore « faisceau réfléchi »), en sens inverse, peut consister en un faisceau obtenu par réflexion dudit premier faisceau directionnel F1 de rayonnements UV. Alternatively, a first directional beam F1 of UV radiation can come from a radiating source 2 (also called "incident beam") and the second directional beam F2 of UV radiation (also called "reflected beam"), in the opposite direction , may consist of a beam obtained by reflection of said first directional beam F1 of UV radiation.
Toujours selon l’invention, tel qu’illustré sur les figures, l’un au moins deux miroirs latéraux 4 consiste en un miroir réflecteur 4 qui est couplé à ladite au moins une source rayonnante 2 pour produire un faisceau directionnel F1 de rayonnements UV (dit encore « faisceau incident ») qui est orienté vers l’autre miroir latéral 4, 5. Still according to the invention, as illustrated in the figures, one at least two side mirrors 4 consists of a reflector mirror 4 which is coupled to said at least one radiating source 2 to produce a directional beam F1 of UV radiation ( also called "incident beam") which is oriented towards the other side mirror 4, 5.
Pour une efficacité optimale, le miroir réflecteur 4 en question (couplé à ladite au moins une source rayonnante 2) est avantageusement adapté à produire un faisceau directionnel F1 , F2 de rayonnements UV parallèle (dont les rayons qui le constituent sont parallèles). For optimum efficiency, the reflector mirror 4 in question (coupled to said at least one radiating source 2) is advantageously adapted to produce a directional beam F1, F2 of parallel UV radiation (whose rays which constitute it are parallel).
En d’autres termes, le miroir réflecteur 4 a avantageusement la propriété de refléter / convertir (après réflexion) les rayonnements issus de la source rayonnante 2 « multidirectionnelle » en un faisceau dit « parallèle » (avantageusement lorsque la source rayonnante 2 est placée en son foyer optique). In other words, the reflector mirror 4 advantageously has the property of reflecting/converting (after reflection) the radiation coming from the "multidirectional" radiating source 2 into a so-called "parallel" beam (advantageously when the radiating source 2 is placed in its optical focus).
Un faisceau parallèle présente avantageusement la particularité de conserver une intensité rayonnante (dit encore « intensité de rayonnement ») constante, quel que soit la distance de la source rayonnante 2. A parallel beam advantageously has the particularity of keeping a radiant intensity (also called “radiation intensity”) constant, whatever the distance from the radiating source 2.
Le faisceau parallèle comprend avantageusement des rayons qui sont tous parallèles à un même plan, en l’occurrence le plan directeur 4’ (dit encore « axe optique » ou « plan optique ») du miroir réflecteur 4. The parallel beam advantageously comprises rays which are all parallel to the same plane, in this case the master plane 4' (also called "optical axis" or "optical plane") of the reflector mirror 4.
Ce principe permet ainsi d’assurer un rayonnement d’intensité très homogène et très concentré dans le passage 6. This principle thus makes it possible to ensure radiation of very homogeneous and very concentrated intensity in passage 6.
Pour cela, le miroir réflecteur 4 présente avantageusement un profilé concave, avantageusement à section parabolique ou semi-elliptique. For this, the reflecting mirror 4 advantageously has a concave profile, advantageously with a parabolic or semi-elliptical section.
Un tel miroir réflecteur 4 comporte avantageusement : Such a reflecting mirror 4 advantageously comprises:
- une ouverture longitudinale 41 orientée vers l’autre miroir latéral 4, 5, et/ou - a longitudinal opening 41 facing the other side mirror 4, 5, and/or
- un foyer optique 42 confondu avec le centre 2’ de ladite au moins une source rayonnante 2. - an optical focus 42 coinciding with the center 2' of said at least one radiating source 2.
L’ouverture longitudinale 41 présente avantageusement, sans être limitatif, une largeur qui s’étend sur un secteur angulaire optique égal à celui reçu par ledit miroir réflecteur 4 (correspondant au secteur angulaire optique émis par la source rayonnante 2, avantageusement en combinaison avec un miroir source décrit par la suite). Des modes de réalisation selon l’invention, non limitatifs, sont décrits ci-après en relation avec les figures. The longitudinal opening 41 advantageously has, without being limiting, a width which extends over an optical angular sector equal to that received by said reflector mirror 4 (corresponding to the optical angular sector emitted by the radiating source 2, advantageously in combination with a source mirror described later). Non-limiting embodiments according to the invention are described below in relation to the figures.
Selon un premier mode de réalisation décrit ci-après en relation avec les figures 1 à 4, ledit dispositif de traitement 1 comprend : According to a first embodiment described below in relation to FIGS. 1 to 4, said processing device 1 comprises:
- deux sources rayonnantes 2, implantées avantageusement sur un même plan optique P, de préférence de part et d’autre du passage 6 (figure 3), et - two radiating sources 2, advantageously located on the same optical plane P, preferably on either side of the passage 6 (FIG. 3), and
- deux miroirs latéraux 4 consistant chacun en un miroir réflecteur 4. - two side mirrors 4 each consisting of a reflector mirror 4.
Les deux miroirs latéraux 4 sont avantageusement identiques l’un par rapport à l’autre. Ils sont en outre avantageusement symétriques par rapport à un plan transversal médian qui est orienté perpendiculairement au plan optique P. The two side mirrors 4 are advantageously identical with respect to each other. They are also advantageously symmetrical with respect to a median transverse plane which is oriented perpendicular to the optical plane P.
Les deux miroirs latéraux 4 comportent des plans optiques 4’ (dits encore « axes optiques ») qui sont avantageusement confondus. The two side mirrors 4 comprise optical planes 4' (also called "optical axes") which advantageously coincide.
Chaque miroir réflecteur 4 est couplé à l’une desdites sources rayonnantes 2 pour produire chacun un faisceau directionnel F1 , F2 de rayonnements UV (dit encore « faisceau indicent »), avantageusement parallèle, qui est orienté vers l’autre miroir latéral 4 et qui sont en sens inverses l’un par rapport à l’autre. Each reflector mirror 4 is coupled to one of said radiating sources 2 to each produce a directional beam F1, F2 of UV radiation (also known as the "incident beam"), advantageously parallel, which is oriented towards the other side mirror 4 and which are opposite to each other.
Le passage 6 est ainsi traversé par deux faisceaux directionnels F1 , F2 de rayonnements UV, en sens inverses l’un par rapport à l’autre, qui sont produits chacun par l’une des deux sources rayonnantes 2. Passage 6 is thus crossed by two directional beams F1, F2 of UV radiation, in opposite directions to one another, which are each produced by one of the two radiating sources 2.
Ces deux faisceaux directionnels F1 , F2 de rayonnements U sont orientés avantageusement selon une même direction, confondue avec le plan optique P, mais en sens inverses l’un par rapport à l’autre. These two directional beams F1, F2 of radiation U are advantageously oriented in the same direction, coinciding with the optical plane P, but in opposite directions relative to each other.
Les deux sources rayonnantes 2 forment ainsi un rideau ou une lame optique de rayonnements UV dans le passage 6, s’étendant avantageusement sur toute sa largeur, au travers duquel vont circuler les gaz à traiter. The two radiating sources 2 thus form a curtain or an optical blade of UV radiation in the passage 6, advantageously extending over its entire width, through which the gases to be treated will circulate.
La figure 9 illustre une variante de réalisation de cette figure 1 , dans laquelle l’axe longitudinal 2’ des sources rayonnantes 2 est orienté parallèlement au flux gazeux. Figure 9 illustrates a variant embodiment of this Figure 1, in which the longitudinal axis 2' of the radiating sources 2 is oriented parallel to the gas flow.
Selon cette variante, ledit dispositif de traitement 1 comprend au moins un module, voire deux ou plus de deux modules juxtaposés, comportant chacun : According to this variant, said processing device 1 comprises at least one module, or even two or more than two juxtaposed modules, each comprising:
- deux sources rayonnantes 2, implantées avantageusement sur un même plan optique P, de préférence de part et d’autre du passage 6 (figure 3), et - two radiating sources 2, advantageously located on the same optical plane P, preferably on either side of the passage 6 (FIG. 3), and
- deux miroirs latéraux 4 consistant chacun en un miroir réflecteur 4. - two side mirrors 4 each consisting of a reflector mirror 4.
Là encore, au sein de chaque module, les deux miroirs latéraux 4 sont avantageusement identiques l’un par rapport à l’autre. Ils sont en outre avantageusement symétriques par rapport à un plan transversal médian qui est orienté perpendiculairement au plan optique P. Here again, within each module, the two side mirrors 4 are advantageously identical with respect to each other. They are also advantageously symmetrical with respect to a median transverse plane which is oriented perpendicular to the optical plane P.
Les deux miroirs latéraux 4 comportent des plans optiques 4’ (dits encore « axes optiques ») qui sont avantageusement confondus. Chaque miroir réflecteur 4 est couplé à l’une desdites sources rayonnantes 2 pour produire chacun un faisceau directionnel F1 , F2 de rayonnements UV (dit encore « faisceau indicent »), avantageusement parallèle, qui est orienté vers l’autre miroir latéral 4 et qui sont en sens inverses l’un par rapport à l’autre. The two side mirrors 4 comprise optical planes 4' (also called “optical axes”) which advantageously coincide. Each reflector mirror 4 is coupled to one of said radiating sources 2 to each produce a directional beam F1, F2 of UV radiation (also known as the "incident beam"), advantageously parallel, which is oriented towards the other side mirror 4 and which are opposite to each other.
Le passage 6 est ainsi traversé par deux faisceaux directionnels F1 , F2 de rayonnements UV, en sens inverses l’un par rapport à l’autre, qui sont produits chacun par l’une des deux sources rayonnantes 2. Passage 6 is thus crossed by two directional beams F1, F2 of UV radiation, in opposite directions to one another, which are each produced by one of the two radiating sources 2.
Au sein de chaque module, ces deux faisceaux directionnels F1 , F2 de rayonnements UV sont orientés avantageusement selon une même direction, confondue avec le plan optique P, mais en sens inverses l’un par rapport à l’autre. Within each module, these two directional beams F1, F2 of UV radiation are advantageously oriented in the same direction, coinciding with the optical plane P, but in opposite directions relative to each other.
Au sein de chaque module, les deux sources rayonnantes 2 forment ainsi un rideau ou une lame optique de rayonnements UV dans le passage 6, s’étendant avantageusement sur une partie de la largeur, au travers duquel vont circuler les gaz à traiter. Within each module, the two radiating sources 2 thus form a curtain or an optical blade of UV radiation in the passage 6, advantageously extending over part of the width, through which the gases to be treated will circulate.
Les modules juxtaposés forment ainsi un rideau ou une lame optique de rayonnements UV dans le passage 6, s’étendant avantageusement sur toute la largeur, au travers duquel vont circuler les gaz à traiter. The juxtaposed modules thus form a curtain or an optical blade of UV radiation in the passage 6, advantageously extending over the entire width, through which the gases to be treated will circulate.
Selon un second mode de réalisation décrit ci-après en relation avec les figures 5 et 6, le dispositif de traitement 1 comprend : According to a second embodiment described below in relation to FIGS. 5 and 6, the processing device 1 comprises:
- une source rayonnante 2, unique, - a single radiating source 2,
- un premier miroir latéral 4 consistant en un miroir réflecteur 4 qui est couplé à ladite source rayonnante 2 pour produire un premier faisceau directionnel F1 de rayonnements UV (dit encore « faisceau indicent »), avantageusement parallèle, qui est orienté vers un second miroir latéral 5, et - a first lateral mirror 4 consisting of a reflector mirror 4 which is coupled to said radiating source 2 to produce a first directional beam F1 of UV radiation (also called an "incident beam"), advantageously parallel, which is oriented towards a second lateral mirror 5, and
- ledit second miroir latéral 5 consistant en un miroir plan, implanté en regard dudit premier miroir latéral 4, pour générer un second faisceau directionnel F2 de rayonnements UV (dit encore « faisceau réfléchi »), avantageusement parallèle, qui réfléchit le premier faisceau directionnel F1 vers ledit premier miroir latéral 4. - said second lateral mirror 5 consisting of a plane mirror, located facing said first lateral mirror 4, to generate a second directional beam F2 of UV radiation (also called "reflected beam"), advantageously parallel, which reflects the first directional beam F1 towards said first side mirror 4.
Pour assurer cette réflexion, le miroir plan 5 définit un plan général 5’ qui est perpendiculaire au plan optique 4’ du premier miroir latéral 4 (figure 6). To ensure this reflection, the plane mirror 5 defines a general plane 5' which is perpendicular to the optical plane 4' of the first lateral mirror 4 (FIG. 6).
La largeur du miroir plan 5 est de préférence supérieure, ou égale, à la largeur de l’ouverture longitudinale 41 du miroir réflecteur 4. The width of the plane mirror 5 is preferably greater than or equal to the width of the longitudinal opening 41 of the reflector mirror 4.
Le miroir plan 5 et le miroir réflecteur 4 sont encore avantageusement agencés de sorte que le plan optique 4’ du miroir réflecteur 4 passe par la ligne médiane du miroir plan 5. The plane mirror 5 and the reflector mirror 4 are again advantageously arranged so that the optical plane 4' of the reflector mirror 4 passes through the center line of the plane mirror 5.
Selon les modes de réalisation décrits ci-après en relation avec les figures 7 et 8, la combinaison de miroirs 3 est configurée pour réfléchir au moins une partie desdits rayonnements UV sous la forme de faisceaux directionnels F3 de rayonnements UV qui sont dirigés entre lesdits miroirs 3, de part et d’autre d’un premier miroir latéral 4, et qui traversent latéralement le passage 6 dans les deux sens, selon une trajectoire en zigzag. According to the embodiments described below in relation to FIGS. 7 and 8, the combination of mirrors 3 is configured to reflect at least part of said UV radiation in the form of directional beams F3 of UV radiation which are directed between said mirrors 3, on either side of a first lateral mirror 4, and which cross the passage 6 laterally in both directions, along a zigzag trajectory.
De manière générale, un tel ledit dispositif de traitement 1 comprend avantageusement :In general, such a said processing device 1 advantageously comprises:
- une source rayonnante 2, - a radiant source 2,
- un premier miroir latéral 4 consistant en un miroir réflecteur 4 qui est couplé à ladite source rayonnante 2 pour produire un faisceau directionnel F1 de rayonnements UV, avantageusement parallèle, qui est orienté vers un second miroir latéral 5, - a first side mirror 4 consisting of a reflector mirror 4 which is coupled to said radiating source 2 to produce a directional beam F1 of UV radiation, advantageously parallel, which is directed towards a second side mirror 5,
- au moins un premier miroir latéral additionnel 45, 46, implanté au moins d’un côté dudit premier miroir latéral 4, avantageusement d’un côté dudit premier miroir latéral 4 ou de part et d’autre dudit premier miroir latéral 4, - at least one first additional side mirror 45, 46, located at least on one side of said first side mirror 4, advantageously on one side of said first side mirror 4 or on either side of said first side mirror 4,
- ledit second miroir latéral 5, avantageusement un miroir réflecteur diédrique central ou un miroir réflecteur plan central, implanté en regard dudit premier miroir latéral 4, pour produire un faisceau directionnel F2 de rayonnements UV, avantageusement parallèle, qui est orienté vers au moins un premier miroir latéral additionnel 45, 46, et - said second lateral mirror 5, advantageously a central dihedral reflector mirror or a central plane reflector mirror, located facing said first lateral mirror 4, to produce a directional beam F2 of UV radiation, advantageously parallel, which is oriented towards at least a first additional side mirror 45, 46, and
- au moins un second miroir latéral additionnel 55, 58, implanté au moins d’un côté dudit second miroir latéral 5, avantageusement d’un côté dudit second miroir latéral 5 ou de part et d’autre dudit second miroir latéral 5. - at least one second additional side mirror 55, 58, located at least on one side of said second side mirror 5, advantageously on one side of said second side mirror 5 or on either side of said second side mirror 5.
Et ledit second miroir latéral 5, ledit au moins un premier miroir latéral additionnel 45, 46 et ledit au moins un second miroir latéral additionnel 55, 58 sont configurés pour réfléchir au moins une partie desdits rayonnements UV sous la forme de faisceaux directionnels F3 de rayonnements UV qui sont dirigés entre ledit au moins un premier miroir latéral additionnel 45, 46 et ledit au moins un second miroir latéral additionnel 55, 58 et qui traversent ledit passage 6 dans les deux sens, selon une trajectoire en zigzag. And said second side mirror 5, said at least one first additional side mirror 45, 46 and said at least one second additional side mirror 55, 58 are configured to reflect at least a portion of said UV radiation in the form of directional beams F3 of radiation UV which are directed between said at least one first additional side mirror 45, 46 and said at least one second additional side mirror 55, 58 and which pass through said passage 6 in both directions, according to a zigzag trajectory.
De préférence, le faisceau directionnel F1 de rayonnements UV issu du premier miroir latéral 4 est ici scindé en des faisceaux F3 par le second miroir latéral 5. Preferably, the directional beam F1 of UV radiation from the first side mirror 4 is here split into beams F3 by the second side mirror 5.
Ces faisceaux F3 sont ensuite destinés à cheminer de part et d’autre de ce premier miroir latéral 4, entre ledit au moins un premier miroir latéral additionnel 45, 46 et ledit au moins un second miroir latéral additionnel 55, 58. These beams F3 are then intended to travel on either side of this first side mirror 4, between said at least one first additional side mirror 45, 46 and said at least one second additional side mirror 55, 58.
Dans ce cadre, selon un troisième mode de réalisation décrit ci-après en relation avec la figure 7, le dispositif de traitement 1 comprend : In this context, according to a third embodiment described below in relation to FIG. 7, the processing device 1 comprises:
- une source rayonnante 2, - a radiant source 2,
- un premier miroir latéral 4 consistant en un miroir réflecteur 4 qui est couplé à ladite source rayonnante 2 pour produire un faisceau directionnel F1 de rayonnements UV (dit encore « faisceau indicent »), avantageusement parallèle, qui est orienté vers un second miroir latéral 5,- a first lateral mirror 4 consisting of a reflector mirror 4 which is coupled to said radiating source 2 to produce a directional beam F1 of UV radiation (also called "incident beam"), advantageously parallel, which is oriented towards a second lateral mirror 5 ,
- ledit second miroir latéral 5, implanté en regard dudit premier miroir latéral 4, formant un miroir réflecteur diédrique central, - des premiers miroirs latéraux additionnels 45 diédriques, implantés de part et d’autre dudit premier miroir latéral 4, et - said second lateral mirror 5, located facing said first lateral mirror 4, forming a central dihedral reflector mirror, - first additional side mirrors 45 dihedral, located on either side of said first side mirror 4, and
- des seconds miroirs latéraux additionnels 55 diédriques, implantés de part et d’autre dudit second miroir latéral 5. - second additional side mirrors 55 dihedral, located on either side of said second side mirror 5.
Les premiers miroirs latéraux additionnels 45 diédriques et les seconds miroirs latéraux additionnels 55 diédriques sont configurés pour réfléchir au moins une partie desdits rayonnements UV sous la forme de faisceaux directionnels F3 de rayonnements UV qui sont dirigés entre les premiers miroirs latéraux additionnels 45 diédriques et les seconds miroirs latéraux additionnels 55 diédriques et qui traversent chacun ledit passage 6 dans deux sens, selon une trajection en zigzag. The first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral are configured to reflect at least a portion of said UV radiation in the form of directional beams F3 of UV radiation which are directed between the first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral and which each cross said passage 6 in two directions, in a zigzag trajectory.
Un tel système permet alors de générer une fluence homogène de rayonnements UV dans le volume du dispositif de traitement 1 à partir d’une seule source rayonnante 2. Such a system then makes it possible to generate a homogeneous fluence of UV radiation in the volume of the treatment device 1 from a single radiating source 2.
En particulier, le faisceau directionnel F1 de rayonnements UV issu du premier miroir latéral 4 est ici scindé en des faisceaux F3 par le second miroir latéral 5, destinés à cheminer de part et d’autre de ce premier miroir latéral 4 (ici selon une forme générale en créneau). In particular, the directional beam F1 of UV radiation from the first side mirror 4 is here split into beams F3 by the second side mirror 5, intended to travel on either side of this first side mirror 4 (here in a form general in crenel).
Pour cela, en l’espèce, les premiers miroirs latéraux additionnels 45 diédriques et les seconds miroirs latéraux additionnels 55 diédriques comprennent avantageusement plusieurs miroirs diédriques 44, 55 juxtaposés (en série). For this, in this case, the first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral advantageously comprise several dihedral mirrors 44, 55 juxtaposed (in series).
Les premiers miroirs latéraux additionnels 45 diédriques et les seconds miroirs latéraux additionnels 55 diédriques s’étendent respectivement dans deux plans généraux, parallèles l’un par rapport à l’autre. The first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral extend respectively in two general planes, parallel to one another.
Par « miroir diédrique », on entend avantageusement un réflecteur diédrique 45, 55 qui se compose de deux réflecteurs plans 45a, 55a (dits encore « miroirs plans » ou « plans conducteurs ») définissant entre eux un angle (en Vé), par exemple un angle orthogonal (à 90°). By “dihedral mirror”, is advantageously meant a dihedral reflector 45, 55 which consists of two plane reflectors 45a, 55a (also called “plane mirrors” or “conductive planes”) defining between them an angle (in V), for example an orthogonal angle (90°).
Ces miroirs diédriques 45, 55 forment ainsi avantageusement des réflecteurs prisme à 45°.These dihedral mirrors 45, 55 thus advantageously form 45° prism reflectors.
Chaque miroir diédrique 45, 55 est avantageusement agencé de sorte que son plan bissecteur 45’, 55’ s’étend parallèlement au plan optique 4’ du premier miroir latéral 4 et au plan bissecteur 45’, 55’ des autres miroirs diédriques 45, 55. Each dihedral mirror 45, 55 is advantageously arranged so that its bisector plane 45', 55' extends parallel to the optical plane 4' of the first lateral mirror 4 and to the bisector plane 45', 55' of the other dihedral mirrors 45, 55 .
Chaque réflecteur plan 45a, 55a s’étend en plus parallèlement à l’axe longitudinal passant par le centre 2’ de la source rayonnante 2. Each plane reflector 45a, 55a also extends parallel to the longitudinal axis passing through the center 2' of the radiating source 2.
En outre, les premiers miroirs latéraux additionnels 45 diédriques et les seconds miroirs latéraux additionnels 55 diédriques sont avantageusement identiques les uns par rapport aux autres. In addition, the first dihedral additional side mirrors 45 and the second dihedral additional side mirrors 55 are advantageously identical with respect to each other.
Les premiers miroirs latéraux additionnels 45 diédriques et les seconds miroirs latéraux additionnels 55 diédriques sont ici inversés du part et d’autre du passage 6 : un miroir diédrique 45, 55 situé d’un côté du passage 6 est ici implanté en regard d’un couple de réflecteurs plans 45a, 55a, convexes, appartenant à deux miroirs diédriques 45, 55 attenants situés d’un autre côté du passage 6. The first additional side mirrors 45 dihedral and the second additional side mirrors 55 dihedral are here reversed on either side of the passage 6: a dihedral mirror 45, 55 located on one side of the passage 6 is here located facing a couple of planar reflectors 45a, 55a, convex, belonging to two adjoining dihedral mirrors 45, 55 located on another side of passage 6.
De plus, le second miroir latéral 5, avantageusement un miroir réflecteur diédrique central, forme avantageusement un couple de réflecteurs plans 5a primaires, convexe, qui est implanté et centré en regard du miroir réflecteur primaire 4. In addition, the second lateral mirror 5, advantageously a central dihedral reflector mirror, advantageously forms a pair of primary flat reflectors 5a, convex, which is located and centered facing the primary reflector mirror 4.
La largeur de ce second miroir latéral 5, convexe, est identique à la largeur de l’ouverture longitudinale 41 du miroir réflecteur primaire 4. The width of this second lateral mirror 5, convex, is identical to the width of the longitudinal opening 41 of the primary reflector mirror 4.
Les premiers miroirs latéraux additionnels 45 ou les seconds miroirs latéraux additionnels 55 portent encore avantageusement un réflecteur plan d’extrémité 56 qui est prévu pour réfléchir en sens inverse le faisceau directionnel issu d’un réflecteur plan 55a d’extrémité. The first additional side mirrors 45 or the second additional side mirrors 55 also advantageously carry an end plane reflector 56 which is provided to reflect in the opposite direction the directional beam coming from an end plane reflector 55a.
Ce réflecteur plan d’extrémité 56 s’étend pour cela ici parallèlement au plan optique 4’ du premier miroir latéral 4 et au plan bissecteur 45’, 55’ des autres miroirs diédriques 45, 55. This end plane reflector 56 therefore extends here parallel to the optical plane 4' of the first lateral mirror 4 and to the bisector plane 45', 55' of the other dihedral mirrors 45, 55.
Ladite combinaison de miroirs 3 est ainsi adapté à réfléchir au moins une partie des rayonnements UV sous la forme de faisceaux directionnels F1 , F2 de rayonnements UV, cheminant dans deux sens inverses l’un par rapport à l’autre. Said combination of mirrors 3 is thus adapted to reflect at least part of the UV radiation in the form of directional beams F1, F2 of UV radiation, traveling in two opposite directions with respect to each other.
Le premier miroir latéral 4 est avantageusement pivotant par rapport aux premiers miroirs réflecteurs diédriques 45, de sorte à faciliter l’accès à la source rayonnante 2 (notamment pour les opérations de maintenance). The first lateral mirror 4 is advantageously pivotable with respect to the first dihedral reflector mirrors 45, so as to facilitate access to the radiating source 2 (in particular for maintenance operations).
Ce premier miroir latéral 4 est ainsi mobile entre : This first lateral mirror 4 is thus movable between:
- une position déployée, pour produire le faisceau directionnel F1 de rayonnements UV qui est orienté vers un second miroir latéral 5, et - a deployed position, to produce the directional beam F1 of UV radiation which is oriented towards a second lateral mirror 5, and
- une position escamotée, pour libérer un accès à la source rayonnante 2. - a retracted position, to free access to the radiating source 2.
Selon un quatrième mode de réalisation décrit ci-après en relation avec la figure 8, le dispositif de traitement 1 comprend : According to a fourth embodiment described below in relation to FIG. 8, the processing device 1 comprises:
- une source rayonnante 2, - a radiant source 2,
- un premier miroir latéral 4 consistant en un miroir réflecteur 4 qui est couplé à ladite source rayonnante 2 pour produire un faisceau directionnel F1 de rayonnements U (dit encore « faisceau indicent »), avantageusement parallèle, qui est orienté vers un second miroir latéral 5,- a first lateral mirror 4 consisting of a reflector mirror 4 which is coupled to said radiating source 2 to produce a directional beam F1 of radiation U (also called "incident beam"), advantageously parallel, which is oriented towards a second lateral mirror 5 ,
- ledit second miroir latéral 5, implanté en regard dudit premier miroir latéral 4, formant un miroir réflecteur diédrique central 5, - said second lateral mirror 5, located facing said first lateral mirror 4, forming a central dihedral reflector mirror 5,
- des premiers miroirs latéraux additionnels 46 plans, implantés de part et d’autre dudit premier miroir latéral 4, et - first additional lateral mirrors 46 planes, located on either side of said first lateral mirror 4, and
- des seconds miroirs latéraux additionnels 58 plans, implantés de part et d’autre dudit second miroir latéral 5. - second additional side mirrors 58 planes, located on either side of said second side mirror 5.
Les premiers miroirs latéraux additionnels 46 plans et les seconds miroirs latéraux additionnels 58 plans sont configurés pour réfléchir au moins une partie desdits rayonnements UV sous la forme de faisceaux directionnels F3 de rayonnements UV qui sont dirigés entre les premiers miroirs latéraux additionnels 45 inclinés et les seconds miroirs latéraux additionnels 58 plans et qui traversent chacun ledit passage 6 dans les deux sens. The first additional 46-plane side mirrors and the second additional 58-plane side mirrors are configured to reflect at least a portion of said UV radiation in the form of directional beams F3 of UV radiation which are directed between the first additional side mirrors 45 inclined and second additional side mirrors 58 planes and which each cross said passage 6 in both directions.
Là encore, un tel système permet alors de générer une fluence homogène de rayonnements UV dans le volume du dispositif de traitement 1 à partir d’une seule source rayonnante 2. Here again, such a system then makes it possible to generate a homogeneous fluence of UV radiation in the volume of the treatment device 1 from a single radiating source 2.
En particulier, le faisceau directionnel F1 de rayonnements UV issu du premier miroir latéral 4 est ici scindé en des faisceaux F3 par le second miroir 5, destinés à cheminer de part et d’autre de ce premier miroir latéral 4 (ici selon une trajectoire en zigzag en forme générale de dents de scie). In particular, the directional beam F1 of UV radiation coming from the first lateral mirror 4 is here split into beams F3 by the second mirror 5, intended to travel on either side of this first lateral mirror 4 (here according to a trajectory in zigzag in the general shape of sawtooth).
Pour cela, en l’espèce, le second miroir latéral 5 se présente sous la forme d’un miroir réflecteur diédrique central. For this, in this case, the second side mirror 5 is in the form of a central dihedral reflector mirror.
Par « miroir réflecteur diédrique », on entend avantageusement un réflecteur diédrique qui se compose de deux réflecteurs plans 5a (dits encore « miroirs plans » ou « plans conducteurs ») définissant entre eux un angle (en Vé) convexe, par exemple un angle allant de 2 à 30°. By “dihedral reflector mirror”, is advantageously meant a dihedral reflector which consists of two plane reflectors 5a (also called “plane mirrors” or “conductive planes”) defining between them a convex angle (V-shaped), for example an angle ranging from from 2 to 30°.
Le miroir réflecteur diédrique central 5 est avantageusement agencé de sorte que son plan bissecteur 5’ s’étend coaxialement au plan optique 4’ du premier miroir latéral 4. The central dihedral reflector mirror 5 is advantageously arranged so that its bisector plane 5' extends coaxially to the optical plane 4' of the first lateral mirror 4.
Ce miroir réflecteur diédrique central 5, convexe, est implanté et centré en regard du miroir réflecteur primaire 4. This central dihedral reflector mirror 5, convex, is located and centered opposite the primary reflector mirror 4.
La largeur de ce miroir réflecteur diédrique central 5, convexe, est identique à la largeur de l’ouverture longitudinale 41 du miroir réflecteur primaire 4. The width of this convex central dihedral reflector mirror 5 is identical to the width of the longitudinal opening 41 of the primary reflector mirror 4.
Les premiers miroirs latéraux additionnels 46 plans et les seconds miroirs latéraux additionnels 58 plans, consistant en des miroirs plans simples qui sont ici inclinés et s’étendent avantageusement parallèlement les uns par rapport aux autres et parallèlement aux deux réflecteurs plans 5a du second miroir latéral 5. The first additional side mirrors 46 planes and the second additional side mirrors 58 planes, consisting of simple plane mirrors which are here inclined and advantageously extend parallel to each other and parallel to the two plane reflectors 5a of the second side mirror 5 .
En outre, les premiers miroirs latéraux additionnels 46 plans et les seconds miroirs latéraux additionnels 58 plans sont avantageusement identiques les uns par rapport aux autres. Furthermore, the first additional side mirrors 46 planes and the second additional side mirrors 58 planes are advantageously identical with respect to each other.
Les premiers miroirs latéraux additionnels 46 plans et les seconds miroirs latéraux additionnels 58 plans sont ici inclinés en sens inverse du part et d’autre du passage 6. The first additional side mirrors 46 planes and the second additional side mirrors 58 planes are here inclined in the opposite direction on either side of the passage 6.
En d’autres termes, les premiers miroirs latéraux additionnels 46 plans et les seconds miroirs latéraux additionnels 58 plans sont implantés selon au moins un couple comprenant un premier miroir latéral additionnel 46 plan et un second miroir latéral additionnel 58 plan. In other words, the first additional lateral mirrors 46 planes and the second additional lateral mirrors 58 planes are installed according to at least one pair comprising a first additional lateral mirror 46 plane and a second additional lateral mirror 58 plane.
Et, au sein d’un couple, le premier miroir latéral additionnel 46 plan et le second miroir latéral additionnel 58 plan sont agencés, l’un par rapport à l’autre, selon une symétrie centrale. And, within a couple, the first additional lateral mirror 46 plane and the second additional lateral mirror 58 plane are arranged, one with respect to the other, according to a central symmetry.
En outre, un premier miroir latéral additionnel 46 plan est avantageusement incliné vers le plan optique 4’ du premier miroir latéral 4 (sa droite normale converge vers le plan optique 4’ du premier miroir latéral 4) ; un second miroir latéral additionnel 58 plan est avantageusement incliné en sens inverse, à l’opposé dudit plan optique 4’ (sa droite normale diverge par rapport au plan optique 4’ du premier miroir latéral 4). Furthermore, a first additional side mirror 46 plane is advantageously inclined towards the optical plane 4' of the first side mirror 4 (its normal line converges towards the optical plane 4' of the first side mirror 4); a second additional lateral plane mirror 58 is advantageously inclined in the opposite direction, opposite said optical plane 4' (its normal line diverges with respect to the optical plane 4' of the first lateral mirror 4).
Un premier miroir latéral additionnel 46 plan est avantageusement incliné pour générer un rayon réfléchi parallèle au plan optique 4’ du premier miroir latéral 4 ; un second miroir latéral additionnel 58 plan est avantageusement incliné pour générer un rayon réfléchi incliné par rapport au plan optique 4’ du premier miroir latéral, en direction d’un premier miroir latéral additionnel 46 plan. A first additional side mirror 46 plane is advantageously inclined to generate a reflected ray parallel to the optical plane 4' of the first side mirror 4; a second additional side mirror 58 plane is advantageously inclined to generate a reflected ray inclined with respect to the optical plane 4' of the first side mirror, in the direction of a first additional side mirror 46 plane.
En l’espèce, la combinaison de miroirs 3 comprend un seul couple premier miroir latéral additionnel 46 plan / miroir latéral additionnel 58 plan. In this case, the combination of mirrors 3 comprises a single pair first additional lateral mirror 46 plane / additional lateral mirror 58 plane.
Chaque premier miroir latéral additionnel 46 plan et chaque second miroir latéral additionnel 58 plan s’étend en plus parallèlement à l’axe longitudinal passant par le centre 2’ de la source rayonnante 2. Each first additional lateral mirror 46 plane and each second additional lateral mirror 58 plane also extends parallel to the longitudinal axis passing through the center 2' of the radiating source 2.
Les seconds miroirs latéraux 58 comprennent encore avantageusement un réflecteur plan d’extrémité 581 qui est prévu pour réfléchir en sens inverse le faisceau directionnel issu d’un premier miroir latéral additionnel 46 plan terminal. The second side mirrors 58 also advantageously comprise an end plane reflector 581 which is provided to reflect in the opposite direction the directional beam coming from a first additional side mirror 46 end plane.
Ce réflecteur plan d’extrémité 581 s’étend pour cela ici perpendiculairement au plan optique 4’ du premier miroir latéral 4. This end plane reflector 581 extends for this here perpendicular to the optical plane 4' of the first lateral mirror 4.
La combinaison de miroir 3 comprend ainsi avantageusement un couple terminal composé d’un réflecteur plan d’extrémité 581 et d’un premier miroir latéral additionnel 46 plan terminal. The mirror combination 3 thus advantageously comprises an end pair composed of an end plane reflector 581 and a first additional side mirror 46 end plane.
Ladite combinaison de miroirs 3 est ainsi adapté à réfléchir au moins une partie des rayonnements UV sous la forme de faisceaux directionnels F1 , F2, F3 de rayonnements UV, cheminant dans deux sens inverses l’un par rapport à l’autre. Said combination of mirrors 3 is thus adapted to reflect at least part of the UV radiation in the form of directional beams F1, F2, F3 of UV radiation, traveling in two opposite directions relative to each other.
Selon encore une variante de réalisation, non représentée, la combinaison de miroirs comprend : According to yet another variant embodiment, not shown, the combination of mirrors comprises:
- ledit second miroir latéral 5, implanté en regard dudit premier miroir latéral 4, formant un miroir réflecteur plan central, - said second side mirror 5, located opposite said first side mirror 4, forming a central plane reflector mirror,
- des premiers miroirs latéraux additionnels 45, plans ou diédriques, implantés d’un côté dudit premier miroir latéral 4, et - first additional side mirrors 45, flat or dihedral, located on one side of said first side mirror 4, and
- des seconds miroirs latéraux additionnels 55, 58, plans ou diédriques, implantés d’un côté dudit second miroir latéral 4. - second additional side mirrors 55, 58, flat or dihedral, located on one side of said second side mirror 4.
De manière générale, encore selon l’invention, ladite combinaison de miroirs 3 comprend encore au moins un miroir source 8 enveloppant partiellement ladite source rayonnante 2 (figure 4). Generally, still according to the invention, said combination of mirrors 3 further comprises at least one source mirror 8 partially enveloping said radiating source 2 (FIG. 4).
Un tel miroir source 8 est destiné à diriger au maximum les rayonnements de la source rayonnante 2 associée vers le miroir réflecteur 4 associé. Such a source mirror 8 is intended to direct the radiation from the associated radiating source 2 to the associated reflector mirror 4 as much as possible.
Pour cela, ce miroir source 8 consiste ici en un profilé concave, à section en arc de cercle.For this, this source mirror 8 here consists of a concave profile, with a circular arc section.
Le miroir source 8 comporte encore avantageusement : - une ouverture longitudinale 81 , orientée vers le miroir réflecteur 4 associé, etThe source mirror 8 also advantageously comprises: - a longitudinal opening 81, oriented towards the associated reflector mirror 4, and
- un foyer optique 82, avantageusement confondu avec le centre 2’ de la source rayonnante 2 associée et avec le foyer optique 42 du miroir réflecteur 4. - an optical focal point 82, advantageously merged with the center 2' of the associated radiating source 2 and with the optical focal point 42 of the reflecting mirror 4.
L’ouverture longitudinale 81 est avantageusement centrée par rapport au plan optique 4’ du miroir réflecteur 4. The longitudinal opening 81 is advantageously centered with respect to the optical plane 4' of the reflector mirror 4.
Le miroir source 8 s’étend avantageusement sur un secteur angulaire d’au moins 170°, voire de 175°, voire encore de 180°. The source mirror 8 advantageously extends over an angular sector of at least 170°, or even 175°, or even 180°.
Le miroir source 8 s’étend avantageusement sur un secteur angulaire optique de la source rayonnante 2, avantageusement complémentaire de celui reçu dudit miroir réflecteur 4. Source mirror 8 advantageously extends over an optical angular sector of radiating source 2, advantageously complementary to that received from said reflector mirror 4.
De préférence, le miroir source 8 est attenant de la surface 21 cylindrique de la source rayonnante 2. Preferably, the source mirror 8 is adjacent to the cylindrical surface 21 of the radiating source 2.
Par « attenant », on entend avantageusement une distance allant de 0 à 10 mm, voire de 0 à 5 mm (voire choisie parmi 1 , 2, 3, 4, 5, 6, 7, 8, 9, 10 mm), entre le miroir source 8 et la surface 21 cylindrique de la source rayonnante 2. By “adjoining”, is advantageously meant a distance ranging from 0 to 10 mm, or even from 0 to 5 mm (or even chosen from 1, 2, 3, 4, 5, 6, 7, 8, 9, 10 mm), between the source mirror 8 and the cylindrical surface 21 of the radiating source 2.
Encore de manière générale, l’encombrement du miroir réflecteur 4 est défini notamment par un plan 41’ qui passe par son ouverture longitudinale 41 (figure 3 notamment). Still generally, the size of the reflector mirror 4 is defined in particular by a plane 41' which passes through its longitudinal opening 41 (FIG. 3 in particular).
Et, pour limiter les obstacles à la circulation d’un gaz dans le passage 6, ladite au moins une source rayonnante 2 et/ou ledit au moins un miroir source 8 sont implantés, au moins partiellement, dans l’encombrement du miroir réflecteur 4. And, to limit the obstacles to the circulation of a gas in the passage 6, said at least one radiating source 2 and/or said at least one source mirror 8 are located, at least partially, in the size of the reflector mirror 4 .
Encore de manière générale, ladite au moins une source rayonnante 2 et/ou la combinaison de miroirs 3 sont implantés de part et d’autre du passage 6, de sorte notamment à limiter les obstacles à la circulations des gaz dans ce passage 6. Still generally, said at least one radiating source 2 and/or the combination of mirrors 3 are located on either side of the passage 6, so as in particular to limit the obstacles to the circulation of gases in this passage 6.
Toujours de manière générale, ladite combinaison de miroirs 3 comprend encore au moins deux miroirs transversaux 9, avantageusement parallèles l’un par rapport à l’autre, encadrant les miroirs latéraux 4, 5. Still generally, said combination of mirrors 3 further comprises at least two transverse mirrors 9, advantageously parallel to each other, framing the side mirrors 4, 5.
Les miroirs transversaux 9 sont avantageusement raccordés avec les bordures latérales des miroirs latéraux 4, 5. The transverse mirrors 9 are advantageously connected with the side edges of the side mirrors 4, 5.
Les miroirs transversaux 9 définissent, en association avec les miroirs latéraux 4, 5, un châssis ou cadre qui délimite le passage 6. The transverse mirrors 9 define, in association with the side mirrors 4, 5, a chassis or frame which delimits the passage 6.
Ces miroirs transversaux 9 participent à réfléchir / maintenir les rayonnements UV au sein du passage 6. These transverse mirrors 9 participate in reflecting/maintaining UV radiation within passage 6.
Chaque faisceau directionnel F1 , F2, F3 de rayonnements UV s’étend ainsi avantageusement sur la largeur du passage 6 qui est délimitée par les miroirs transversaux 9. Each directional beam F1, F2, F3 of UV radiation thus advantageously extends over the width of the passage 6 which is delimited by the transverse mirrors 9.
Encore de manière générale, le dispositif de traitement 1 comporte encore des moyens de commande 10 qui sont adaptés à la commande de la puissance de ladite au moins une source rayonnante 2. Les moyens de commande 10 comprennent par exemple des moyens électroniques classiques en soi, par exemple du type microcontrôleur intégrant un programme d’ordinateur comportant des moyens de code de programme exécutés par ledit microcontrôleur. Still generally, the processing device 1 further comprises control means 10 which are suitable for controlling the power of said at least one radiating source 2. The control means 10 comprise, for example, conventional electronic means per se, for example of the microcontroller type integrating a computer program comprising program code means executed by said microcontroller.
Dans ce contexte, le dispositif de traitement 1 comprend avantageusement des moyens capteurs 11 adaptés à capter l’intensité rayonnante (en rayonnements UV) au sein du passage 6. In this context, the processing device 1 advantageously comprises sensor means 11 suitable for sensing the radiant intensity (in UV radiation) within the passage 6.
La surveillance de cette mesure permet notamment de détecter une baisse d’efficacité du dispositif de traitement 1 , nécessitant par exemple un nettoyage ou un remplacement de ladite au moins une source rayonnante 2. The monitoring of this measurement makes it possible in particular to detect a drop in efficiency of the treatment device 1 , requiring for example cleaning or replacement of said at least one radiant source 2 .
De préférence, les moyens capteurs 11 comprennent au moins un radiomètre UV, qui permet la mesure de l’intensité de rayonnement effectivement émise dans le passage 6. Preferably, the sensor means 11 comprise at least one UV radiometer, which allows the measurement of the radiation intensity actually emitted in the passage 6.
Par « intensité de rayonnement » (dite encore « intensité rayonnante »), on attend avantageusement une valeur exprimée en J / cm2. By “radiation intensity” (also called “radiant intensity”), a value expressed in J/cm 2 is advantageously expected.
En l’espèce, les moyens capteurs 11 sont avantageusement répartis sur les miroirs transversaux 9. In this case, the sensor means 11 are advantageously distributed over the transverse mirrors 9.
Les moyens de commande 10 comportent alors un module de pilotage 101 adapté à ajuster la puissance de ladite au moins une source rayonnante 2 tenant compte d’une consigne d’intensité rayonnante. The control means 10 then comprise a control module 101 adapted to adjust the power of said at least one radiant source 2 taking into account a radiant intensity setpoint.
Une diminution de l’intensité rayonnante (en rayonnements UV) au sein du passage 6 est alors compensée par une augmentation de la puissance de ladite au moins une source rayonnante 2. A decrease in the radiant intensity (in UV radiation) within the passage 6 is then compensated by an increase in the power of said at least one radiant source 2.
Par ailleurs, les moyens de commande 10 peuvent comporter un module de pilotage 102 adapté à ajuster la puissance de ladite au moins une source rayonnante 2 tenant compte de la vitesse du flux de gaz au travers dudit passage 6. Furthermore, the control means 10 may include a control module 102 adapted to adjust the power of said at least one radiating source 2 taking into account the speed of the gas flow through said passage 6.
Une augmentation de la vitesse du flux d’air au sein du passage 6 est alors compensée par une augmentation de la puissance de ladite au moins une source rayonnante 2. An increase in the speed of the air flow within the passage 6 is then compensated by an increase in the power of said at least one radiating source 2.
En pratique, les moyens de commande 10 pilotent ladite au moins une source rayonnante 2 pour produire des rayonnements UV. In practice, the control means 10 control said at least one radiating source 2 to produce UV radiation.
Par le jeu de miroirs 3, ces rayonnements UV sont réfléchis sous la forme des deux faisceaux directionnels F1 , F2 de rayonnements UV qui sont dirigés entre les miroirs latéraux 4, 5. By the set of mirrors 3, these UV rays are reflected in the form of the two directional beams F1, F2 of UV rays which are directed between the side mirrors 4, 5.
Ces faisceaux directionnels F1 , F2 de rayonnements UV traversent chacun le passage 6 dans un sens, inverses l’un par rapport à l’autre. These directional beams F1, F2 of UV radiation each pass through passage 6 in one direction, opposite to each other.
De même, dans le troisième mode de réalisation, les faisceaux directionnels F3 de rayonnements UV sont dirigés entre les premiers miroirs réflecteurs diédriques 45 et les seconds miroirs réflecteurs diédriques 55 et traversent le passage 6 dans deux sens, inverses l’un par rapport à l’autre, formant ici un flux de rayonnements UV en forme général de créneau. Le flux de gaz traverse ces faisceaux directionnels F1 , F2, F3 de rayonnements UV, soumettant les éventuels microorganismes à une dose suffisante de rayonnement UV de type germicide. Similarly, in the third embodiment, the directional beams F3 of UV radiation are directed between the first dihedral reflector mirrors 45 and the second dihedral reflector mirrors 55 and pass through the passage 6 in two directions, opposite to each other. another, here forming a flux of UV radiation in the general form of a slot. The flow of gas passes through these directional beams F1, F2, F3 of UV radiation, subjecting any microorganisms to a sufficient dose of germicidal type UV radiation.
Bien entendu, diverses autres modifications peuvent être apportées à l’invention dans le cadre des revendications annexées. Of course, various other modifications may be made to the invention within the scope of the appended claims.

Claims

Revendications Claims
[Revendication 1] Dispositif de traitement, pour la désinfection et/ou la stérilisation d’un gaz cheminant dans un conduit, lequel dispositif de traitement (1) comprend : [Claim 1] Treatment device, for the disinfection and/or sterilization of a gas flowing in a conduit, which treatment device (1) comprises:
(i) au moins une source rayonnante (2), pour la production de rayonnements UV, de préférence des rayonnements IIV-C, (i) at least one radiant source (2), for the production of UV radiation, preferably IIV-C radiation,
(ii) une combinaison de miroirs (3), associés à ladite au moins une source rayonnante (2) et destinés à réfléchir lesdits rayonnements UV, caractérisé en ce que ladite combinaison de miroirs (3) comprend au moins deux miroirs latéraux (4, 5, 45, 46, 55, 58) qui sont implantés de part et d’autre d’un passage (6) au travers duquel les gaz à traiter sont destinés à circuler, en ce que en ce que lesdits au moins deux miroirs latéraux (4, 5, 45, 46, 55, 58) sont configurés pour réfléchir au moins une partie desdits rayonnements UV sous la forme de faisceaux directionnels (F1 , F2, F3) de rayonnements UV qui sont dirigés entre lesdits au moins deux miroirs latéraux (4, 5, 45, 46, 55, 58) et qui traversent ledit passage (6) dans les deux sens, et en ce que l’un au moins desdits au moins deux miroirs latéraux (4, 5, 45, 46, 55, 58) consiste en un miroir réflecteur (4) qui est couplé à ladite au moins une source rayonnante pour produire un faisceau directionnel (F1 , F2) de rayonnements UV, avantageusement un faisceau directionnel parallèle, qui est orienté vers un autre miroir latéral (4, 5). (ii) a combination of mirrors (3), associated with said at least one radiating source (2) and intended to reflect said UV radiation, characterized in that said combination of mirrors (3) comprises at least two lateral mirrors (4, 5, 45, 46, 55, 58) which are located on either side of a passage (6) through which the gases to be treated are intended to circulate, in that in that said at least two lateral mirrors (4, 5, 45, 46, 55, 58) are configured to reflect at least a portion of said UV radiation in the form of directional beams (F1, F2, F3) of UV radiation which are directed between said at least two side mirrors (4, 5, 45, 46, 55, 58) and which pass through said passage (6) in both directions, and in that at least one of said at least two side mirrors (4, 5, 45, 46, 55, 58) consists of a reflector mirror (4) which is coupled to said at least one radiant source to produce a directional beam (F1, F2) of UV radiation, forward ntage a parallel directional beam, which is oriented towards another side mirror (4, 5).
[Revendication 2] Dispositif de traitement, selon la revendication 1 , caractérisé en ce que ledit miroir réflecteur (4) présente un profilé concave, avantageusement à section parabolique ou semi-elliptique, lequel miroir réflecteur (4) comporte avantageusement : [Claim 2] Processing device, according to claim 1, characterized in that said reflector mirror (4) has a concave profile, advantageously with a parabolic or semi-elliptical section, which reflector mirror (4) advantageously comprises:
- une ouverture longitudinale (41) orientée vers l’autre miroir latéral (4, 5), et/ou - a longitudinal opening (41) facing the other side mirror (4, 5), and/or
- un foyer optique (42) confondu avec le centre (2’) de ladite au moins une source rayonnante (2). - an optical focus (42) coinciding with the center (2') of said at least one radiating source (2).
[Revendication 3] Dispositif de traitement, selon l’une quelconque des revendications 1 ou 2, caractérisé en ce que lesdits au moins deux miroirs latéraux (4, 5, 45, 46, 55, 58) sont configurés pour réfléchir au moins une partie desdits rayonnements UV sous la forme de deux faisceaux directionnels (F1 , F2) de rayonnements UV qui sont dirigés entre lesdits au moins deux miroirs latéraux (4, 5, 45, 46, 55, 58) et qui traversent chacun ledit passage (6) dans un sens, inverses l’un par rapport à l’autre. [Claim 3] Processing device, according to any one of Claims 1 or 2, characterized in that the said at least two side mirrors (4, 5, 45, 46, 55, 58) are configured to reflect at least a part said UV radiation in the form of two directional beams (F1, F2) of UV radiation which are directed between said at least two side mirrors (4, 5, 45, 46, 55, 58) and which each pass through said passage (6) in one direction, inverse to each other.
[Revendication 4] Dispositif de traitement, selon la revendication 3, caractérisé en ce que ledit dispositif de traitement (1) comprend : - deux sources rayonnantes (2), implantées avantageusement sur un même plan optique (P), de part et d’autre dudit passage (6), et [Claim 4] Processing device, according to claim 3, characterized in that said processing device (1) comprises: - two radiating sources (2), advantageously located on the same optical plane (P), on either side of said passage (6), and
- deux miroirs latéraux (4) consistant en des miroirs réflecteurs, avantageusement identiques l’un par rapport à l’autre, qui sont chacun couplés à l’une desdites sources rayonnantes (2) pour produire chacun un faisceau directionnel (F1 , F2) de rayonnements UV, avantageusement parallèle, qui est orienté vers l’autre miroir latéral, en sens inverses l’un par rapport à l’autre.- two side mirrors (4) consisting of reflector mirrors, advantageously identical with respect to each other, which are each coupled to one of said radiating sources (2) to each produce a directional beam (F1, F2) of UV radiation, advantageously parallel, which is oriented towards the other side mirror, in opposite directions relative to each other.
[Revendication 5] Dispositif de traitement, selon la revendication 3, caractérisé en ce que ledit dispositif de traitement (1) comprend : [Claim 5] Processing device, according to claim 3, characterized in that said processing device (1) comprises:
- une source rayonnante (2), - a radiant source (2),
- un premier miroir latéral (4) consistant en un miroir réflecteur (4) qui est couplé à ladite source rayonnante (2) pour produire un faisceau directionnel (F1) de rayonnements UV, avantageusement parallèle, qui est orienté vers un second miroir latéral (5), et - a first side mirror (4) consisting of a reflector mirror (4) which is coupled to said radiating source (2) to produce a directional beam (F1) of UV radiation, advantageously parallel, which is oriented towards a second side mirror ( 5), and
- ledit second miroir latéral (5) consistant en un miroir plan (5), implanté en regard dudit premier miroir latéral (4), pour générer un faisceau directionnel (F2) de rayonnements UV qui est réfléchi vers ledit premier miroir latéral (4), lequel miroir plan (5) définit un plan général qui est perpendiculaire à un plan optique (4’) dudit premier miroir latéral (4). - said second lateral mirror (5) consisting of a plane mirror (5), located facing said first lateral mirror (4), to generate a directional beam (F2) of UV radiation which is reflected towards said first lateral mirror (4) , which plane mirror (5) defines a general plane which is perpendicular to an optical plane (4') of said first side mirror (4).
[Revendication 6] Dispositif de traitement, selon l’une quelconque des revendications 1 à 3, caractérisé en ce que ledit dispositif de traitement (1) comprend : [Claim 6] Processing device, according to any one of Claims 1 to 3, characterized in that the said processing device (1) comprises:
- une source rayonnante (2), - a radiant source (2),
- un premier miroir latéral (4) consistant en un miroir réflecteur (4) qui est couplé à ladite source rayonnante (2) pour produire un faisceau directionnel (F1) de rayonnements UV, avantageusement parallèle, qui est orienté vers un second miroir latéral (5), - a first side mirror (4) consisting of a reflector mirror (4) which is coupled to said radiating source (2) to produce a directional beam (F1) of UV radiation, advantageously parallel, which is oriented towards a second side mirror ( 5),
- au moins un premier miroir latéral additionnel (45, 46), avantageusement plan, implanté au moins d’un côté dudit premier miroir latéral (4), avantageusement de part et d’autre dudit premier miroir latéral (4), et - at least one first additional lateral mirror (45, 46), advantageously flat, located at least on one side of said first lateral mirror (4), advantageously on either side of said first lateral mirror (4), and
- ledit second miroir latéral (5), implanté en regard dudit premier miroir latéral (4), avantageusement un miroir réflecteur diédrique central, pour produire un faisceau directionnel (F2) de rayonnements UV, avantageusement parallèle, qui est orienté vers au moins un premier miroir latéral additionnel (45, 46), - said second lateral mirror (5), located facing said first lateral mirror (4), advantageously a central dihedral reflector mirror, to produce a directional beam (F2) of UV radiation, advantageously parallel, which is oriented towards at least a first additional side mirror (45, 46),
- au moins un second miroir latéral additionnel (55, 58), avantageusement plan, implanté au moins d’un côté dudit second miroir latéral (5), avantageusement de part et d’autre dudit second miroir latéral (5), lequel second miroir latéral (5), lequel au moins un premier miroir latéral additionnel (45, 46) et lequel au moins un second miroir latéral additionnel (55, 58) sont configurés pour réfléchir au moins une partie desdits rayonnements UV sous la forme de faisceaux directionnels (F3) de rayonnements UV qui sont dirigés entre ledit au moins un premier miroir latéral additionnel (45, 46) et ledit au moins un second miroir latéral additionnel (55, 58) et qui traversent ledit passage (6) dans les deux sens, selon une trajectoire en zigzag. - at least one second additional lateral mirror (55, 58), advantageously flat, located at least on one side of said second lateral mirror (5), advantageously on either side of said second lateral mirror (5), which second side mirror (5), which at least one first additional side mirror (45, 46) and which at least one second additional side mirror (55, 58) are configured to reflect at least a part of said UV radiation in the form of directional beams (F3) of UV radiation which are directed between said at least one first additional side mirror (45, 46) and said at least one second additional side mirror (55, 58) and which pass through said passage (6) in both direction, following a zigzag trajectory.
[Revendication 7] Dispositif de traitement, selon la revendication 6, caractérisé en ce que ledit dispositif de traitement (1) comprend une combinaison de miroirs (3) choisie parmi : [Claim 7] Processing device, according to claim 6, characterized in that said processing device (1) comprises a combination of mirrors (3) chosen from:
(i) une première combinaison de miroirs (3) comprenant : (i) a first combination of mirrors (3) comprising:
- ledit second miroir latéral (5), implanté en regard dudit premier miroir latéral (4), formant un miroir réflecteur diédrique central (5), - said second lateral mirror (5), located facing said first lateral mirror (4), forming a central dihedral reflector mirror (5),
- des premiers miroirs latéraux additionnels (45) diédriques, implantés de part et d’autre dudit premier miroir latéral (4), et - first additional side mirrors (45) dihedral, located on either side of said first side mirror (4), and
- des seconds miroirs latéraux additionnels (55) diédriques, implantés de part et d’autre dudit second miroir latéral (5), ou - second additional side mirrors (55) dihedral, located on either side of said second side mirror (5), or
(ii) une seconde combinaison de miroirs (3) comprenant : (ii) a second combination of mirrors (3) comprising:
- ledit second miroir latéral (5), implanté en regard dudit premier miroir latéral (4), formant un miroir réflecteur diédrique central, - said second lateral mirror (5), located facing said first lateral mirror (4), forming a central dihedral reflector mirror,
- des premiers miroirs latéraux additionnels (45) plans, implantés de part et d’autre dudit premier miroir latéral (4), et - first additional side mirrors (45) planes, located on either side of said first side mirror (4), and
- des seconds miroirs latéraux additionnels (58) plans, implantés de part et d’autre dudit second miroir latéral (5), ou - second additional side mirrors (58) planes, located on either side of said second side mirror (5), or
(iii) une troisième combinaison de miroirs comprenant : (iii) a third combination of mirrors comprising:
- ledit second miroir latéral (5), implanté en regard dudit premier miroir latéral (4), formant un miroir réflecteur plan central, - said second lateral mirror (5), located opposite said first lateral mirror (4), forming a central plane reflector mirror,
- des premiers miroirs latéraux additionnels (45), plans ou diédriques, implantés d’un côté dudit premier miroir latéral (4), et - first additional side mirrors (45), flat or dihedral, located on one side of said first side mirror (4), and
- des seconds miroirs latéraux additionnels (55, 58), plans ou diédriques, implantés d’un côté dudit second miroir latéral (4). - additional second lateral mirrors (55, 58), flat or dihedral, located on one side of said second lateral mirror (4).
[Revendication 8] Dispositif de traitement, selon l’une quelconque des revendications 1 à 7, caractérisé en ce que ladite combinaison de miroirs (3) comprend encore au moins un miroir source (8), profilé concave à section en arc de cercle, enveloppant partiellement ladite source rayonnante (2), lequel miroir source (8) comporte : [Claim 8] Processing device, according to any one of Claims 1 to 7, characterized in that the said combination of mirrors (3) further comprises at least one mirror source (8), concave profile with section in an arc of a circle, partially enveloping said radiating source (2), which source mirror (8) comprises:
- une ouverture longitudinale (81), orientée vers le miroir réflecteur (4), et - a longitudinal opening (81), oriented towards the reflecting mirror (4), and
- un foyer optique (82), avantageusement confondu avec le centre (2’) de ladite source rayonnante (2) et avec le foyer optique (42) dudit miroir réflecteur (4). - an optical focal point (82), advantageously coinciding with the center (2') of said radiating source (2) and with the optical focal point (42) of said reflecting mirror (4).
[Revendication 9] Dispositif de traitement, selon l’une quelconque des revendications 1 à 8, caractérisé en ce que ladite au moins une source rayonnante (2), et le cas échéant ledit au moins un miroir source (8), sont implantés, au moins partiellement, dans l’encombrement du miroir réflecteur (4) défini par un plan passant par son ouverture longitudinale (41). [Claim 9] Processing device, according to any one of claims 1 to 8, characterized in that said at least one radiating source (2), and where appropriate said at least one source mirror (8), are implanted, at least partially, within the size of the reflecting mirror (4) defined by a plane passing through its longitudinal opening (41).
[Revendication 10] Dispositif de traitement, selon l’une quelconque des revendications 1 à 9, caractérisé en ce que ladite combinaison de miroirs (3) comprend encore au moins deux miroirs transversaux (9), avantageusement parallèles l’un par rapport à l’autre, encadrant les miroirs latéraux (4, 5). [Claim 10] Processing device, according to any one of claims 1 to 9, characterized in that said combination of mirrors (3) further comprises at least two transverse mirrors (9), advantageously parallel to one another. another, framing the side mirrors (4, 5).
[Revendication 11] Dispositif de traitement, selon l’une quelconque des revendications 1 à 10, caractérisé en ce que ladite au moins une source rayonnante (2) consiste en au moins une lampe UV-C tubulaire. [Claim 11] Treatment device according to any one of Claims 1 to 10, characterized in that the said at least one radiant source (2) consists of at least one tubular UV-C lamp.
[Revendication 12] Dispositif de traitement, selon l’une quelconque des revendications 1 à 11 , caractérisé en ce que ledit dispositif de traitement (1) comprend des moyens capteurs (11) adaptés à capter l’intensité de rayonnement au sein du passage (6). [Claim 12] Processing device, according to any one of claims 1 to 11, characterized in that said processing device (1) comprises sensor means (11) adapted to sense the intensity of radiation within the passage ( 6).
[Revendication 13] Dispositif de traitement, selon l’une quelconque des revendications 1 à 12, caractérisé en ce que ledit dispositif de traitement (1) comporte des moyens de commande (10), adaptés à la commande de la puissance de ladite au moins une source rayonnante (2), et, de préférence, lesquels moyens de commande (10) comportent au moins un module choisi parmi : [Claim 13] Processing device, according to any one of Claims 1 to 12, characterized in that the said processing device (1) comprises control means (10), suitable for controlling the power of the said at least a radiating source (2), and, preferably, which control means (10) comprise at least one module chosen from:
- en combinaison avec la revendication 9, un module de pilotage (101) adapté à ajuster la puissance de ladite au moins une source rayonnante (2) tenant compte d’une consigne d’intensité de rayonnement et de l’intensité de rayonnement collectée par les moyens capteurs (11),- in combination with claim 9, a control module (101) adapted to adjust the power of said at least one radiant source (2) taking into account a radiation intensity setpoint and the radiation intensity collected by the sensor means (11),
- un module de pilotage (102) adapté à ajuster la puissance de ladite au moins une source rayonnante (2) tenant compte de la vitesse du flux des gaz au travers dudit passage (6). - a control module (102) adapted to adjust the power of said at least one radiant source (2) taking into account the speed of the flow of gases through said passage (6).
[Revendication 14] Système d’aération, par exemple pour un local, un bâtiment ou un engin, comprenant au moins un conduit muni d’un dispositif de traitement (1) selon l’une quelconque des revendications 1 à 13, lequel dispositif de traitement (1) forme un tronçon dudit conduit ou est rapporté sur un tronçon dudit conduit. [Claim 14] Ventilation system, for example for a room, a building or a machine, comprising at least one duct provided with a treatment device (1) according to any one of Claims 1 to 13, which processing device (1) forms a section of said pipe or is attached to a section of said pipe.
PCT/EP2021/071812 2020-08-05 2021-08-04 Device for disinfecting and/or sterilising a gas flowing through a pipe WO2022029200A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
FR2008292A FR3113250A1 (en) 2020-08-05 2020-08-05 Device for disinfection and/or sterilization of a gas in a conduit
FRFR2008292 2020-08-05
FRFR2106183 2021-06-11
FR2106183A FR3113251A1 (en) 2020-08-05 2021-06-11 Device for disinfection and/or sterilization of a gas in a conduit

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997007831A1 (en) * 1995-08-30 1997-03-06 Katz, Janyce, C. Method and apparatus for killing microorganisms
US6228327B1 (en) * 1998-07-09 2001-05-08 Molecucare, Inc. Apparatus and method for simultaneously germicidally cleansing air and water
DE102012022326A1 (en) * 2012-11-15 2014-05-15 Schott Ag Compact UV disinfection system with high homogeneity of the radiation field
EP3378501A1 (en) * 2016-01-07 2018-09-26 Mitsubishi Electric Corporation Ultraviolet sterilization device and air conditioner using same
WO2019045778A1 (en) * 2017-08-31 2019-03-07 Krosney Mark D Uv sterilization apparatus, system, and method for forced-air patient heating systems

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997007831A1 (en) * 1995-08-30 1997-03-06 Katz, Janyce, C. Method and apparatus for killing microorganisms
US6228327B1 (en) * 1998-07-09 2001-05-08 Molecucare, Inc. Apparatus and method for simultaneously germicidally cleansing air and water
DE102012022326A1 (en) * 2012-11-15 2014-05-15 Schott Ag Compact UV disinfection system with high homogeneity of the radiation field
EP3378501A1 (en) * 2016-01-07 2018-09-26 Mitsubishi Electric Corporation Ultraviolet sterilization device and air conditioner using same
WO2019045778A1 (en) * 2017-08-31 2019-03-07 Krosney Mark D Uv sterilization apparatus, system, and method for forced-air patient heating systems

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