WO2021258957A1 - Texture recognition apparatus and electronic apparatus - Google Patents

Abstract

A texture recognition apparatus and an electronic apparatus. The texture recognition apparatus is provided with a touch side surface (S), and comprises a light source array, an image sensor array and a light-shielding matrix, wherein the light source array comprises a plurality of light sources (101); the image sensor array comprises a plurality of image sensors (102), and the plurality of image sensors (102) are configured to receive light which is emitted from the plurality of light sources (101) and is reflected, by means of a texture, to the plurality of image sensors (102), so as to be used for texture image collection; and the light-shielding matrix is located on a light incident side of the image sensor array, and comprises a plurality of light-shielding patterns (103) arranged in an array. Each of the plurality of image sensors (102) comprises a photosensitive element (1021); in a direction perpendicular to the touch side surface (S), the plurality of light sources (101) do not overlap with the plurality of light-shielding patterns (103); and the photosensitive element (1021) of each of the plurality of image sensors (102) at least partially overlaps with at least one of the plurality of light-shielding patterns (103). A light-shielding matrix in the texture recognition apparatus can block ambient light to prevent an image sensor (102) from being interfered with by the ambient light, and the texture recognition apparatus can thus obtain a clear and accurate texture image.

Description

Pattern recognition device and electronic device

This application claims the priority of the Chinese patent application No. 202010578730.5 filed on June 23, 2020. For all purposes, the disclosure of the above-mentioned Chinese patent application is quoted here in full as a part of this application.

Technical field

The embodiments of the present disclosure relate to a pattern recognition device and an electronic device.

Background technique

With the increasing popularity of mobile terminals, more and more users use mobile terminals for identity verification, electronic payment and other operations. Due to the uniqueness of skin textures, such as fingerprint patterns or palmprint patterns, fingerprint recognition technology combined with optical imaging is gradually adopted by mobile electronic devices for identity verification, electronic payment, and the like. How to design a more optimized pattern recognition device is the focus of attention in this field.

Summary of the invention

At least one embodiment of the present disclosure provides a pattern recognition device. The pattern recognition device has a touch side surface and includes a light source array, an image sensor array, and a light shielding matrix. The light source array includes a plurality of light sources; the image sensor array includes a plurality of image sensors, wherein , The plurality of image sensors are configured to receive light emitted from the plurality of light sources and reflected to the plurality of image sensors through the pattern for pattern image collection; the light-shielding matrix is on the light incident side of the image sensor array , Including a plurality of light-shielding patterns arranged in an array, wherein each of the plurality of image sensors includes a photosensitive element, and in a direction perpendicular to the touch side surface, the plurality of light sources and the plurality of light-shielding patterns The patterns do not overlap, and the photosensitive element of each of the plurality of image sensors at least partially overlaps with at least one of the plurality of light-shielding patterns.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the photosensitive element of each of the plurality of image sensors at least partially overlaps with one of the plurality of light-shielding patterns, and for a correspondingly arranged light-shielding pattern and A photosensitive element of an image sensor, the orthographic projection of the photosensitive element on the plane where the shading pattern is located inside the shading pattern.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, in a first direction parallel to the touch side surface, the length of the shading pattern is D, the length of the photosensitive element is d1, and the length is perpendicular to In the direction of the touch side surface, the distance from the shading pattern to the photosensitive element is h, then:

D=d1+2h×tanθ1,

Among them, θ1 is the minimum critical angle of the optical path for pattern recognition.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the planar shape of the photosensitive element is a square or a rectangle, and the side length of the square or the length or width of the rectangle extends along the first direction, so that The side length of the square or the length or width of the rectangle is d1, and 10 μm≦d1≦20 μm.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the range of the distance h from the shading pattern to the photosensitive element is: 3 μm≦h≦5 μm.

For example, the pattern recognition device provided by at least one embodiment of the present disclosure further includes a light-shielding layer between the light-shielding matrix and the image sensor array, wherein the light-shielding layer includes a plurality of first openings perpendicular to the In the direction of touching the side surface, the photosensitive element of each of the plurality of image sensors at least partially overlaps with at least one of the plurality of first openings, and the plurality of light-shielding patterns overlap with the plurality of first openings. The openings correspond one-to-one and at least partially overlap.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, for a correspondingly arranged photosensitive element and at least one first opening, the orthographic projection of the at least one first opening on the plane where the photosensitive element is located is located at the Inside the photosensitive element.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the photosensitive element of each of the plurality of image sensors at least partially overlaps with one of the plurality of first openings, and the plurality of light-shielding patterns Correspond to the plurality of first openings one-to-one and at least partially overlap; for one light-shielding pattern and one first opening correspondingly arranged, the length of the light-shielding pattern in the first direction parallel to the touch side surface is D. The length of the first opening is d2, and the distance from the light-shielding pattern to the light-shielding layer in the direction perpendicular to the touch side surface is H, then:

D=d2+2H×tanθ1,

Among them, θ1 is the minimum critical angle of the optical path for pattern recognition.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the photosensitive element of each of the plurality of image sensors at least partially overlaps with at least two of the plurality of first openings, and the plurality of The light-shielding patterns correspond to the plurality of first openings one-to-one and at least partially overlap; for one photosensitive element, at least two first openings, and at least two light-shielding patterns that are arranged correspondingly, the first opening parallel to the touch side surface In the direction, the length of the light-shielding pattern is D, the distance between two adjacent light-shielding patterns is P, the length of the first opening is d2, and in the direction perpendicular to the touch side surface, the light-shielding pattern The distance from the pattern to the light-shielding layer is H, then:

D=d2+2H×tanθ1,

P=H×(tanθ1+tanθ2),

Among them, θ1 is the minimum critical angle of the light path for pattern recognition, and θ2 is the maximum critical angle of the light path for pattern recognition.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the planar shape of the first opening is a circle, a square, or a rectangle; when the planar shape of the first opening is a circle, the circle The diameter of the shape is d2, and 2μm≤d2≤12.8μm; or, when the planar shape of the first opening is a square or a rectangle, the side length of the square or the length or width of the rectangle is along the It extends in the first direction, so that the side length of the square or the length or width of the rectangle has a dimension d2, and 2 μm≦d2≦12.8 μm.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the range of the distance H from the shading pattern to the shading layer is: 4 μm≦H≦6 μm.

For example, the pattern recognition device provided by at least one embodiment of the present disclosure further includes a display panel, wherein the display panel includes an array substrate, the array substrate includes a base substrate and a sub-pixel array provided on the base substrate, so The sub-pixel array includes a plurality of sub-pixels, the light source array includes the sub-pixel array, and the plurality of light sources include the plurality of sub-pixels.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, each of the plurality of sub-pixels includes a pixel drive circuit disposed on the base substrate, the pixel drive circuit includes a thin film transistor, and the multiple Each of the image sensors further includes a switching transistor arranged on the base substrate, and the thin film transistor is arranged in the same layer as the switching transistor.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the photosensitive element is disposed on a side of the switching transistor away from the base substrate, and includes a first electrode, a second electrode, and the first electrode The semiconductor layer between the semiconductor layer and the second electrode, the first electrode is electrically connected to the switching transistor; the array substrate further includes a planarization layer disposed on the side of the photosensitive element away from the base substrate , The planarization layer has a first via hole and a second via hole; each of the plurality of sub-pixels further includes a light emitting device, and the light emitting device is disposed on the planarization layer away from the base substrate On one side, the light-emitting device includes a first light-emitting driving electrode, a second light-emitting driving electrode, and a light-emitting layer between the first light-emitting driving electrode and the second light-emitting driving electrode, and the first light-emitting driving electrode is at least It is electrically connected to the thin film transistor through the first via hole; the array substrate further includes a connection trace provided on the same layer as the first light-emitting drive electrode, and the connection trace is connected to the thin film transistor through the second via hole. The second electrode of the photosensitive element is electrically connected.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the array substrate further includes a pixel defining layer disposed on a side of the first light-emitting drive electrode and the connection trace away from the base substrate, so The pixel defining layer has a second opening exposing the first light-emitting driving electrode, the light-emitting layer and the second light-emitting driving electrode are respectively at least partially formed in the second opening; the light-shielding matrix is arranged in the The side of the pixel defining layer away from the base substrate.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the pixel defining layer is configured to filter light with a wavelength greater than 600 nm.

For example, in the pattern recognition device provided by at least one embodiment of the present disclosure, the planarization layer is configured to include the light-shielding layer, or the pixel defining layer is configured to include the light-shielding layer, or the planarization layer and the The pixel defining layers are all configured to include the light shielding layer.

At least one embodiment of the present disclosure further provides an electronic device, which includes any of the above-mentioned pattern recognition devices.

Description of the drawings

In order to explain the technical solutions of the embodiments of the present disclosure more clearly, the following will briefly introduce the drawings of the embodiments. Obviously, the drawings in the following description only refer to some embodiments of the present disclosure, and do not limit the present disclosure. .

Figure 1A is a schematic diagram of fingerprint imaging;

Figure 1B is a schematic diagram of the imaging range of a point light source;

Figure 1C is a schematic diagram of the imaging range of a line light source;

2 is a schematic cross-sectional view of a pattern recognition device provided by at least one embodiment of the present disclosure;

3 is a schematic plan view of a light-shielding pattern and a photosensitive element in a pattern recognition device provided by at least one embodiment of the present disclosure;

4 is a schematic diagram of a pattern recognition light path in a pattern recognition device provided by at least one embodiment of the present disclosure;

5 is a schematic cross-sectional view of another pattern recognition device provided by at least one embodiment of the present disclosure;

6 is a schematic diagram of a pattern recognition light path in another pattern recognition device provided by at least one embodiment of the present disclosure;

7 is a schematic cross-sectional view of still another pattern recognition device provided by at least one embodiment of the present disclosure;

8 is a schematic diagram of a pattern recognition light path in still another pattern recognition device provided by at least one embodiment of the present disclosure;

9 is a schematic cross-sectional view of a display device provided by at least one embodiment of the present disclosure;

10A is a schematic plan view of a sub-pixel array and an image sensor array in a display device provided by at least one embodiment of the present disclosure;

10B is a schematic plan view of a sub-pixel array and a light-shielding matrix in a display device provided by at least one embodiment of the present disclosure;

11 is a schematic cross-sectional view of another display device provided by at least one embodiment of the present disclosure;

12 is a schematic cross-sectional view of still another display device provided by at least one embodiment of the present disclosure;

FIG. 13 is a schematic cross-sectional view of still another display device provided by at least one embodiment of the present disclosure;

14A is a schematic plan view of a sub-pixel array and an image sensor array in a display device provided by at least one embodiment of the present disclosure;

14B is a schematic plan view of a sub-pixel array, an image sensor array, and a light shielding layer in a display device provided by at least one embodiment of the present disclosure;

14C is a schematic plan view of a sub-pixel array, an image sensor array, a light-shielding layer, and a light-shielding matrix in a display device provided by at least one embodiment of the present disclosure; and

15 is a schematic plan view of a photosensitive element, a light-shielding layer, and a light-shielding pattern between adjacent sub-pixels in a display device provided by at least one embodiment of the present disclosure.

detailed description

In order to make the objectives, technical solutions, and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be described clearly and completely in conjunction with the accompanying drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by a person of ordinary skill in the art without creative labor are within the protection scope of the present disclosure.

Unless otherwise defined, the technical or scientific terms used in the present disclosure shall have the usual meanings understood by those with ordinary skills in the field to which this disclosure belongs. The "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "include" and other similar words mean that the element or item appearing before the word covers the element or item listed after the word and their equivalents, but does not exclude other elements or items. Similar words such as "connected" or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "Down", "Left", "Right", etc. are only used to indicate the relative position relationship. When the absolute position of the described object changes, the relative position relationship may also change accordingly.

At present, narrow bezels have gradually become the mainstream of display device design and manufacturing, especially for portable display devices such as mobile phones. One of the means to realize the narrow frame is to integrate the image sensor with fingerprint recognition function into the display device, realize the fingerprint recognition mode under the screen, increase the area of the display area of the display device, and then increase the screen-to-body ratio.

For example, a point light source, a line light source, or a light source with a certain pattern can be used as the photosensitive light source of the image sensor to perform fingerprint recognition. In addition, the light source and the image sensor can be arranged in a variety of ways. For example, the light source can be arranged on the side of the image sensor close to the fingerprint touch, or the light source can be arranged in the same plane as the image sensor, or the light source can also be arranged On the side of the image sensor away from the fingerprint touch. The setting method of the light source and image sensor can be selected and set according to different needs.

The following takes a point light source as the photosensitive light source of the image sensor and the light source is arranged on the side of the image sensor close to the fingerprint touch as an example to introduce the principle of fingerprint recognition, but this does not limit the embodiments of the present disclosure.

In a reflective optical fingerprint identification device, in the fingerprint identification process, as shown in Figure 1A, when the point light source L1 emits light, the light emitted by it illuminates the fingerprint pressing interface (such as the outer surface of the glass screen) at different angles. ), due to the effect of the total reflection of the fingerprint pressing interface, the part of these lights whose incident angle is greater than or equal to the critical angle θ of total reflection will have the effect of total reflection. Reflective area. Correspondingly, the part of these lights whose incident angle is smaller than the critical angle θ of total reflection emerges from the fingerprint pressing interface. Therefore, the texture image can be collected by the light reflected by the total reflection area. For example, a clear texture image is formed at B1 of the fingerprint imaging interface where the image sensor is located. The texture image corresponds to the part of the fingerprint located at F1, and F1 is The total reflection area, B1 is the imaging area.

Specifically, when, for example, the fingerprint of the user's finger is pressed to the total reflection area F1, the ridge of the fingerprint touches the surface of the total reflection area F1, so the total reflection condition of the position corresponding to the fingerprint ridge is destroyed, so the light will be there. The corresponding position is emitted, so that the original reflection path is changed, and the valley of the fingerprint will not touch the surface of the total reflection area F1. Therefore, the total reflection condition of the position corresponding to the valley of the fingerprint is not destroyed, so the light will be there. The corresponding position is still totally reflected, so that the original reflection path is not changed. In this way, the light in the total reflection area due to the different effects of the valleys and ridges of the fingerprint on the total reflection conditions, so that the light incident on the fingerprint imaging interface forms a bright and dark pattern image at different positions.

In addition, due to the interference caused by the light emitted from the fingerprint pressing interface and reflected by fingerprints, or the light emitted by the light source is reflected by other functional layers to the fingerprint imaging interface before reaching the fingerprint pressing interface, the A1 of the fingerprint imaging interface becomes the detection Invalid area, this area cannot form a valid texture image. In the invalid area A1, the light emitted by the light source L1 is reflected by other functional layers to the fingerprint imaging interface before reaching the fingerprint pressing interface, and the part that is almost vertically reflected by the fingerprint pressing interface has a higher brightness, which is basically located in the invalid area A1. In the center position, a high-brightness area is formed. The high-brightness area generates relatively large photoelectric signals in the corresponding part of the image sensor array due to the high brightness of the light.

For example, FIG. 1B shows an imaging range diagram of a point light source. As shown in FIG. 1B, in the light-sensitive range of the point light source, the effective imaging range is annular, that is, in FIG. The imaging area B1 corresponding to the total reflection area F1; the area within the inner circle 11 of the ring (hereinafter referred to as the ring center 10) is an invalid imaging area, which corresponds to the invalid area A1 in FIG. 1A; a partial area inside the ring center 10 The (shaded area) 13 is a highlight area (after-image area), which is likely to cause after-image in the image sensor array during the imaging process.

Similarly, FIG. 1C shows an imaging range diagram of a linear light source. As shown in FIG. 1C, the effective imaging range of a line light source is a racetrack-shaped annular area or an oblong annular area between the inner circle 21 and the outer circle 22, the ring center 20 is the invalid imaging area, and the part inside the ring center 10 The area (shaded area) 23 is a highlight area (after-image area) that is likely to cause an afterimage in the image sensor array during imaging.

In addition, in the process of fingerprint recognition, in addition to the light emitted by the light source which can be sensed by the image sensor, the image sensor may also sense the ambient light incident through the finger or the like. Since the image sensor is passive in receiving light, it will not actively distinguish the light emitted by the light source array from the ambient light. Therefore, the ambient light may interfere with the fingerprint recognition of the image sensor, resulting in blurry texture imaging or even failure to image. In some embodiments, a light-blocking element can be provided in the texture imaging device to block ambient light and avoid strong light from affecting the pattern recognition of the image sensor. However, the light-blocking element can also affect the use of ambient light while filtering out ambient light. For the signal light for pattern recognition, it is difficult to take care of the two at the same time, while ensuring the intensity of the signal light while the filtering effect of the ambient light is limited.

At least one embodiment of the present disclosure provides a pattern recognition device. The pattern recognition device has a touch side surface and includes a light source array, an image sensor array, and a light shielding matrix. The light source array includes a plurality of light sources; the image sensor array includes a plurality of image sensors. Each image sensor is configured to receive light emitted from multiple light sources and reflected to multiple image sensors through the pattern for pattern image collection; the light-shielding matrix is on the light incident side of the image sensor array and includes multiple light-shielding patterns arranged in an array, Each of the plurality of image sensors includes a photosensitive element, and in a direction perpendicular to the touch side surface, the plurality of light sources and the plurality of light-shielding patterns do not overlap, and the photosensitive element of each of the plurality of image sensors and the plurality of light-shielding patterns At least one of at least partially overlaps. The shading matrix in the pattern recognition device can shield the ambient light to prevent ambient light from entering the image sensor and affecting the normal operation of the image sensor, and the shading matrix basically does not shield the signal light used for the pattern collection, thereby improving the image sensor The texture collection effect.

At least one embodiment of the present disclosure further provides an electronic device, which includes the above-mentioned pattern recognition device.

Hereinafter, the pattern recognition device and the electronic device of the present disclosure will be exemplarily described through several specific embodiments.

At least one embodiment of the present disclosure provides a pattern recognition device, and FIG. 2 shows a schematic cross-sectional view of the pattern recognition device.

As shown in FIG. 2, the pattern recognition device has a touch side surface S, which includes a light source array, an image sensor array, and a light shielding matrix. For example, the touch sensor of the pattern recognition device has a protective cover 104, such as a glass cover, and the surface of the protective cover 104 is formed as a touch side surface S. When an operating body with lines such as fingers and palms touches the touch side surface S, the line recognition device can collect and recognize lines such as fingerprints or palm prints.

For example, the light source array includes a plurality of light sources 101, and the plurality of light sources 101 are arranged in an array in a predetermined area. The image sensor array includes a plurality of image sensors 102, and the plurality of image sensors 102 are arranged in an array in a predetermined area. The plurality of image sensors 102 are configured to receive light emitted from the plurality of light sources 101 and reflected to the plurality of image sensors 102 through the texture for the texture image collection.

For example, the light-shielding matrix is on the light incident side of the image sensor array, that is, the side of the image sensor array close to the touch measurement surface S, shown as the upper side of the image sensor array in the figure, and includes a plurality of light-shielding patterns 103 arranged in an array. Each of the plurality of image sensors 102 includes a photosensitive element 1021. In a direction perpendicular to the touch side surface S, that is, in the vertical direction in the figure, the plurality of light sources 101 and the plurality of light shielding patterns 103 do not overlap, and the plurality of images The photosensitive element 1021 of each sensor 102 at least partially overlaps with at least one of the plurality of light-shielding patterns 102, that is, the photosensitive element 1021 of each image sensor 102 is provided with at least one light-shielding pattern 103 correspondingly.

Therefore, the light-shielding matrix can light-shield the ambient light on the incident side of the image sensor array to prevent ambient light from entering the image sensor and affect the normal operation of the image sensor, and the light-shielding matrix basically does not shield the signal light used for grain collection ( This will be described in detail later), thereby improving the texture collection effect of the image sensor.

For example, when an operating body with a pattern such as a finger touches the touch side surface S of the pattern recognition device, the light emitted by the light source 101 may be reflected by the operating body and reach the image sensor 102 through the gaps between the light shielding patterns 103. Sensing these rays of light can collect the texture image of the operating body.

As described above, the operating body with lines can be a hand, and the lines recognized by the image sensor 102 are skin lines, such as fingerprints, palm prints, etc.; in addition, the operating body with lines can also be non-biological objects with certain lines. For example, an object with a certain texture made of materials such as resin, which is not specifically limited in the embodiments of the present disclosure.

For example, as shown in FIG. 2, the photosensitive element 1021 of each of the plurality of image sensors 102 at least partially overlaps with one of the plurality of light-shielding patterns 103, as shown in FIG. The photosensitive element 1021 of the image sensor 102, and the orthographic projection 1021P of the photosensitive element 1021 on the plane where the light-shielding pattern 103 is located is located inside the light-shielding pattern 103.

For example, in some embodiments, as shown in FIG. 4, in the first direction parallel to the touch side surface S, such as the horizontal direction in FIG. 2, the length of the light shielding pattern 103 is D, and the length of the photosensitive element 1021 is d1, in the direction S perpendicular to the touch side surface, the distance between the light shielding pattern 103 and the photosensitive element 1021 is h, then:

D=d1+2h×tanθ1,

Among them, θ1 is the minimum critical angle of the optical path for pattern recognition. In addition, the optical path for pattern recognition also has a maximum critical angle θ2. When the light emitted from the multiple light sources 101 is reflected by the pattern to the multiple image sensors 102, the angle range of the signal light incident on the image sensor 102 is θ1-θ2 due to the refraction of the protective cover 104 and the internal structure of the pattern recognition device. For example, θ1 is determined by the refractive index of the protective cover 104, and θ1 is the critical angle of total reflection of the protective cover 104; for example, in one example, the refractive index of the protective cover 104 is about 1.53, and the critical angle of total reflection θ1 is about It is 41°-42°. For example, θ2 is determined by the signal light intensity and the responsivity of the image sensor 102. For example, in some examples, θ2 is 60°-80°, such as 70°. In addition, due to the effects of the protective cover 104 and the refraction of the internal structure of the pattern recognition device, the maximum angle of ambient light incident on the image sensor 102 is θ3. In some examples, θ3 is approximately calculated from the refractive index of the protective cover 104 and the like. 41°-42°, in order to ensure that the ambient light does not irradiate the photosensitive element 1021 of the image sensor 102, θ1 ≥ θ3, so that the size relationship of D, h, and d1 can be obtained according to the above formula.

For example, in some embodiments, as shown in FIG. 3, the planar shape of the photosensitive element 1021 of the image sensor 102 is a square or a rectangle, and the side length of the square or the length or width of the rectangle extends along the above-mentioned first direction, so that the sides of the square The length or width of the length or rectangle is d1, and 10 μm≦d1≦20 μm, for example, d1 is 13 μm, 15 μm, or 18 μm. Therefore, the photosensitive element 1021 of the image sensor 102 has a surface large enough to receive the light emitted from the multiple light sources 101 and reflected to the multiple image sensors 102 by the lines.

For example, in some embodiments, in order to facilitate the arrangement of devices inside the pattern recognition device and form the signal light path for pattern recognition, the range of the distance h between the shading pattern 103 and the photosensitive element 1021 may be: 3μm≤h≤5μm, for example, h is 3μm or 4μm, etc.

For example, the planar shape of the light shielding pattern 103 is the same as the planar shape of the photosensitive element 1021. In some examples, the planar shape of the photosensitive element 1021 is a square, the range of its side length d1 is 10μm≤d1≤20μm, and the distance h from the light-shielding pattern 103 to the photosensitive element 1021 is 3μm. The light-shielding pattern 103 is calculated according to the above formula. The range of the side length D of is 17.2μm≤D≤27.2μm.

For example, in an example, the side length d1 of the photosensitive element 1021 is 18 μm, and the distance h from the light shielding pattern 103 to the photosensitive element 1021 is 3 μm. According to the above formula, the side length D of the light shielding pattern 103 is 25.4 μm.

The optical simulation test of the pattern recognition device in the above example shows that when the simulated ambient light ^{enters the pattern recognition device at an intensity of 1W/mm 2} , the light intensity detected by the photosensitive element of the image sensor is 0.001W/mm ² , Visible ambient light is basically completely blocked; when there is no shading matrix, the signal light emitted from the multiple light sources 101 and reflected by the pattern to the multiple image sensors 102 is simulated. At this time, the intensity of the signal light detected by the photosensitive element of the image sensor is 1W/mm ² , when the shading matrix is set, the intensity of the signal light detected by the photosensitive element of the image sensor is still 1W/mm ² , and it can be seen that the shading matrix does not block the signal light. It can be concluded that the light shielding matrix does not shield the signal light while avoiding the interference of ambient light, thereby ensuring the intensity of the signal light.

For example, in other embodiments, as shown in FIG. 5, the pattern recognition device may further include a light-shielding layer 105 between the light-shielding matrix and the image sensor array. The light-shielding layer 105 includes a plurality of first openings 1051 that are perpendicular to the touch screen. In the direction of the side surface S, that is, in the vertical direction in the figure, the photosensitive element 1021 of each of the plurality of image sensors 102 at least partially overlaps with at least one of the plurality of first openings 1051, and the plurality of light shielding patterns 103 Corresponding to the plurality of first openings 1051 one-to-one and at least partially overlapping. That is, the photosensitive element 1021 of each image sensor 102 is correspondingly provided with the same number of light shielding patterns 103 and first openings 1051. In this way, the light shielding layer 105 can further shield the ambient light, and the signal light can be incident on the photosensitive element 1021 of the image sensor 102 through the plurality of first openings 1051 to be used for pattern collection.

For example, in some embodiments, for the correspondingly disposed one photosensitive element 1021 and at least one first opening 1051, the orthographic projection of the at least one first opening 1051 on the plane where the photosensitive element 1021 is located is inside the photosensitive element 1021, that is, perpendicular to the In the direction of touching the side surface S, the at least one first opening 1051 exposes the photosensitive element 1021 so that the signal light passing through the at least one first opening 1051 can sufficiently irradiate the photosensitive element 1021.

For example, in some embodiments, the photosensitive element 1021 of each of the plurality of image sensors 102 at least partially overlaps with one of the plurality of first openings 1051, and the plurality of light shielding patterns 103 and the plurality of first openings 1051 are one-to-one. Corresponds and at least partially overlaps; as shown in FIG. 6, for a correspondingly arranged light-shielding pattern 103 and a first opening 1051, in the first direction parallel to the touch side surface S, the length of the light-shielding pattern 103 is D, the first The length of the opening 1051 is d2. In the direction perpendicular to the touch side surface S, the distance from the light shielding pattern 103 to the light shielding layer 105 is H, then:

D=d2+2H×tanθ1,

Among them, θ1 is the minimum critical angle of the light path for pattern recognition, and the specific introduction and examples of θ1 can be referred to the above-mentioned embodiments, which will not be repeated here. Therefore, the dimensional relationship between D, d2 and H can be obtained according to the above formula.

For example, in some embodiments, the planar shape of the first opening 1051 is a circle, a square, or a rectangle; when the planar shape of the first opening 1051 is a circle, the diameter of the circle is d2, and 2μm≤d2≤ 12.8μm, for example, d2 is 2μm, 4μm, 7μm or 10μm, etc.; or, when the planar shape of the first opening 1051 is a square or a rectangle, the side length of the square or the length or width of the rectangle extends along the above-mentioned first direction, Therefore, the side length of the square or the length or width of the rectangle is d2, and 2 μm≦d2≦12.8 μm, for example, d2 is 2 μm, 4 μm, 7 μm, or 10 μm. Within the above-mentioned size range of the first opening 1051, the first opening 1051 can sufficiently transmit the signal light.

For example, in some embodiments, in order to facilitate the arrangement of the devices inside the pattern recognition device and the formation of the signal light path for the pattern recognition, the range of the distance H from the light shielding pattern 103 to the light shielding layer 105 is: 4μm≤H≤6μm, for example, H is 4μm or 5μm, etc. For example, in some examples, the size range of the first opening 1051 is 2 μm≦d2≦12.8 μm, and H is 4 μm, then the length range of the light shielding pattern 103 at this time is 9.2 μm≦D≦20 μm.

For example, in other embodiments, as shown in FIG. 7, the photosensitive element 1021 of each of the plurality of image sensors 102 and at least two of the plurality of first openings 1051 (two shown in the figure) are at least Partially overlapped, and the plurality of light-shielding patterns 103 correspond to the plurality of first openings 1051 one-to-one and at least partially overlap. As shown in FIG. 8, for one photosensitive element 1021, at least two first openings 1051, and at least two light shielding patterns 103 correspondingly arranged, the length of the light shielding pattern 103 is D in the first direction parallel to the touch side surface S , The distance between two adjacent light-shielding patterns 103 (that is, the distance between the centers of two adjacent light-shielding patterns 103) is P, the length of the first opening 1051 is d2, in the direction perpendicular to the touch side surface S , The distance from the shading pattern 103 to the shading layer 105 is H, then:

D=d2+2H×tanθ1,

P=H×(tanθ1+tanθ2),

Among them, θ1 is the minimum critical angle of the light path for pattern recognition, and θ2 is the maximum critical angle of the light path for pattern recognition. For specific introductions and examples of θ1 and θ2, reference may be made to the above-mentioned embodiment, which will not be repeated here. Therefore, the dimensional relationship between D, d2, P, and H can be obtained according to the above formula.

For example, in some embodiments, the planar shape of the first opening 1051 is a circle, a square, or a rectangle; when the planar shape of the first opening 1051 is a circle, the diameter of the circle is d2, and 2μm≤d2≤ 12.8μm, for example, d2 is 2μm, 4μm, 7μm or 10μm, etc.; or, when the planar shape of the first opening 1051 is a square or a rectangle, the side length of the square or the length or width of the rectangle extends along the above-mentioned first direction, Therefore, the side length of the square or the length or width of the rectangle is d2, and 2 μm≦d2≦12.8 μm, for example, d2 is 2 μm, 4 μm, 7 μm, or 10 μm. Within the above-mentioned size range of the first opening 1051, the first opening 1051 can sufficiently transmit the signal light.

For example, in some embodiments, in order to facilitate the arrangement of the devices inside the pattern recognition device and form the signal light path for the pattern recognition, the range of the distance H from the shading pattern 103 to the shading layer 105 is: 4μm≤H≤6μm, for example, H is 4μm Or 5μm and so on.

For example, in some examples, if the size range of the first opening 1051 is 2μm≤d2≤12.8μm, and H is 4μm, the length range of the light shielding pattern 103 is 9.2μm≤D≤20μm, and one of the two adjacent light shielding patterns 103 The distance P between them is 14.6 μm. At this time, the size of the photosensitive element 1021 of the image sensor 102 can be set to be larger, for example, the side length is 100 μm-200 μm, so as to fully receive the signal light to form a larger pattern image.

For example, in an example, the size of the first opening 1051 is 2 μm, H is 4 μm, the length of the light shielding pattern 103 is 9.2 μm, and the distance P between two adjacent light shielding patterns 103 is 14.6 μm.

The optical simulation test of the pattern recognition device in the above example shows that when the simulated ambient light ^{is injected into the pattern recognition device at an intensity of 1W/mm 2} , the light intensity detected by the photosensitive element of the image sensor is 0, and the visible ambient light is all Blocked; when the light-shielding matrix and the light-shielding layer are not provided, the signal light from the multiple light sources 101 reflected by the lines to the multiple image sensors 102 is simulated. At this time, the intensity of the signal light detected by the photosensitive element of the image sensor is 1W/ mm ² , when the light-shielding matrix and the light-shielding layer are set, the intensity of the signal light detected by the photosensitive element of the image sensor is still 1W/mm ² , and it can be seen that the light-shielding matrix and the light-shielding layer do not block the signal light. It can be concluded that the light shielding matrix and the light shielding layer do not shield the signal light while avoiding the interference of ambient light, thereby ensuring the intensity of the signal light.

For example, in some embodiments, the pattern recognition device is, for example, a display device with an under-screen pattern recognition function, and accordingly includes a display panel. Figure 9 shows a schematic partial cross-sectional view of the display device, Figure 10A shows a partial schematic plan view of the display device, and Figure 10B shows a partial schematic plan view of the display device after a light-shielding matrix is provided. For example, Figure 9 is Cut along the line AA in Fig. 10B.

For example, as shown in FIG. 9, FIG. 10A and FIG. 10B, the display panel includes an array substrate, the array substrate includes a base substrate 110 and a sub-pixel array provided on the base substrate 110, and the sub-pixel array includes a plurality of sub-pixels 111. For example, the light source array includes a sub-pixel array, and the multiple light sources include multiple sub-pixels 111, whereby the sub-pixel array is multiplexed into a light source array, and the multiple sub-pixels 111 are multiplexed into multiple light sources. That is, at least part of the sub-pixels 111 of the display panel are multiplexed as the light source 101, so the compactness of the display device can be improved, and the difficulty of arranging each functional structure can be reduced.

For example, one or more of the plurality of sub-pixels 111 may be simultaneously lit (emitting light) to form a light-sensitive light source having a certain shape, such as a point light source, a linear light source, or other patterned light sources. For example, in some examples, a plurality of sub-pixels 111 arranged in an array of 7×7 (that is, the array is arranged in 7 rows and 7 columns) can be illuminated at the same time to form a point-shaped photosensitive light source; for example, the array array A plurality of sub-pixels 111 arranged in 8×8 (that is, the array is arranged in 8 rows and 8 columns) can be illuminated at intervals to form a point-shaped photosensitive light source with lower brightness; for another example, the array arrangement is 3× 7 (that is, a plurality of sub-pixels 111 arranged in 3 rows and 7 columns) can be illuminated at the same time to form a linear photosensitive light source, etc. The embodiments of the present disclosure light up the plurality of sub-pixels 111 to form a photosensitive light source. The specific method is not limited.

For example, the sub-pixels 111 in the entire display area of the display panel can be controlled to be multiplexed as the light source 101, and the image sensor array can also be arranged under the entire display area accordingly, thereby realizing full-screen texture recognition.

For example, in other embodiments, a display device with under-screen pattern recognition function includes a display panel and a separately provided light-emitting element as a photosensitive light source for realizing pattern recognition. These light-emitting elements are, for example, arranged in adjacent sub-pixels in the sub-pixel array. Between pixels, or overlapping with sub-pixels, the embodiment of the present disclosure does not limit this.

For example, as shown in FIGS. 10A and 10B, the plurality of sub-pixels 111 include a plurality of sub-pixels of different colors. The pixel R, one blue sub-pixel B and two green sub-pixels G form a pixel unit, and the two green sub-pixels G are separately arranged and arranged between adjacent red sub-pixels R and blue sub-pixels B. For example, as shown in FIG. 10A, the photosensitive element 1021 of each image sensor 102 is arranged between adjacent sub-pixels. As shown in FIG. , The multiple light-shielding patterns 103 respectively shield the photosensitive elements 1021 of the multiple image sensors 102, so that the multiple light-shielding patterns 103 are also correspondingly arranged between the adjacent sub-pixels 111.

For example, as shown in FIG. 9, each of the plurality of sub-pixels 111 includes a pixel driving circuit provided on the base substrate 110, the pixel driving circuit includes a thin film transistor 111B, and each of the plurality of image sensors 102 further includes The switching transistor 1022, the thin film transistor 111B and the switching transistor 1022 on the base substrate 110 are arranged in the same layer.

For example, the thin film transistor 111B includes an active layer, a gate, source and drain structures, and the switching transistor 1022 also includes an active layer, a gate, and source and drain structures. For example, the active layer, gate, and drain of the thin film transistor 111B The source and drain are arranged in the same layer with the active layer, gate and source and drain of the switching transistor 1022 in a one-to-one correspondence, or at least part of the functional layers of the thin film transistor 111B and the switching transistor 1022 are arranged in the same layer to simplify the manufacturing process of the display substrate.

It should be noted that in the embodiments of the present disclosure, "same-layer arrangement" means that the two functional layers or structural layers are formed in the same layer and with the same material in the hierarchical structure of the display substrate, that is, in the preparation process, the two functional layers The layer or structure layer can be formed of the same material layer, and the required pattern and structure can be formed through the same patterning process.

For example, the active layer may be an amorphous silicon layer, a polysilicon layer, or a metal oxide semiconductor layer. For example, the polysilicon may be high temperature polysilicon or low temperature polysilicon, and the oxide semiconductor may be indium gallium zinc oxide (IGZO), indium zinc oxide (IZO), zinc oxide (ZnO), gallium zinc oxide (GZO), or the like. Each gate can be made of copper (Cu), aluminum (Al), titanium (Ti) or other metal materials or alloy materials, for example, formed into a single-layer metal layer structure or a multi-layer metal layer structure, such as multiple layers of titanium/aluminum/titanium Metal layer structure. The source and drain electrodes can be made of copper (Cu), aluminum (Al), titanium (Ti) and other metal materials or alloy materials, for example, formed into a single-layer metal layer structure or a multi-layer metal layer structure, such as titanium/aluminum/titanium, etc. Layer metal layer structure.

For example, as shown in FIG. 9, the photosensitive element 1021 is disposed on the side of the switching transistor 1022 away from the base substrate 110, and includes a first electrode 1021A, a second electrode 1021B, and a semiconductor between the first electrode 1021A and the second electrode 1021B. In the layer 1021C, the first electrode 1021A is electrically connected to the switching transistor 1022, so that the switching transistor 1022 can control the voltage applied to the first electrode 1021A, thereby controlling the working state of the photosensitive element 1021.

For example, the photosensitive element 1021 may be a PN photodiode or a PIN photodiode. In this case, the semiconductor layer 1021C includes a stacked P-type semiconductor layer and an N-type semiconductor layer (for example, an N-type Si layer), or includes stacked layers. A P-type semiconductor layer (for example, a P-type Si layer), an intrinsic semiconductor layer (for example, an intrinsic Si layer), and an N-type semiconductor layer (for example, an N-type Si layer). For example, the second electrode 1021B is a transparent electrode, and transparent metal oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), gallium zinc oxide (GZO), and other materials can be used. The first electrode 1021A is a metal electrode, and uses metal materials or alloy materials such as copper (Cu), aluminum (Al), and titanium (Ti).

For example, the array substrate further includes a planarization layer 112 disposed on the side of the photosensitive element 1021 away from the base substrate 110, and the planarization layer 112 has a first via hole V1 and a second via hole V2. Each of the plurality of sub-pixels 111 further includes a light emitting device 111A, and the light emitting device 111A is disposed on a side of the planarization layer 112 away from the base substrate 110. The light emitting device 111A includes a first light emitting driving electrode E1, a second light emitting driving electrode E2, and a light emitting layer EM between the first light emitting driving electrode E1 and the second light emitting driving electrode E2, and the first light emitting driving electrode E1 passes through at least the first via hole. V1 is electrically connected to the thin film transistor 111B. The array substrate further includes a connecting wire CL provided on the same layer as the first light-emitting driving electrode E1, and the connecting wire CL is electrically connected to the second electrode 1021B of the photosensitive element 1021 through the second via V2.

For example, the planarization layer 112 can be made of organic insulating materials such as polyimide and resin, and the first light-emitting driving electrode E1 can be made of transparent metals such as indium tin oxide (ITO), indium zinc oxide (IZO), and gallium zinc oxide (GZO). The oxide, the second light-emitting driving electrode E2 can be made of metal materials such as lithium (Li), aluminum (Al), magnesium (Mg), silver (Ag), etc.

For example, the array substrate further includes a connecting electrode E3. The connecting electrode E3 and the first electrode 1021A of the photosensitive element 1021 are arranged in the same layer. The transistor 111B is electrically connected to realize the electrical connection between the first light-emitting driving electrode E1 and the thin film transistor 111B.

For example, the array substrate further includes a pixel defining layer 113 disposed on the side of the first light-emitting driving electrode E1 and the connecting trace CL away from the base substrate 110, and the pixel defining layer 113 has a second opening 113A exposing the first light-emitting driving electrode E1. The light emitting layer EM and the second light emitting driving electrode E2 are respectively at least partially formed in the second opening 113A. For example, the light shielding matrix is arranged on the side of the pixel defining layer 113 away from the base substrate 110.

For example, the multiple light-shielding patterns 103 included in the light-shielding matrix can also realize the function of spacers in the display panel, that is, the light-shielding matrix realizes the functions of light shielding and spacers at the same time, so that no additional spacers can be provided in the display panel. Simplify the structure and manufacturing process of the display panel. For example, the light-shielding matrix may be a black matrix, including organic resin materials doped with black pigments.

For example, when ambient light is irradiated directly above the finger, the ambient light can pass through the finger and stimulate the biological tissues in the finger to emit pigment light, which may interfere with fingerprint recognition. Through detection, the pigment light mainly includes light with a wavelength above 600 nm.

For example, in some embodiments, the pixel defining layer 113 is configured to filter light with a wavelength greater than 600nm, for example, filter light with a wavelength of 600nm-900nm, that is, prevent light with a wavelength of 600nm-900nm from passing through. For example, the material of the pixel defining layer 113 includes an organic resin material doped with colored dyes, so that the pixel defining layer 113 has a certain filtering effect on light with a wavelength of 600 nm to 900 nm. The colored dye includes, for example, bromamine acid derivatives and the like. Therefore, through the cooperation of the light-shielding matrix and the pixel defining layer 113, it is possible to ensure the passage of signal light, avoid the influence of ambient light on the image sensor, and improve the accuracy of pattern recognition.

For example, in some embodiments, when the display device further has a light shielding layer 105 similar to that shown in FIG. 5, the planarization layer 112 on the array substrate may be configured to include the light shielding layer 105. For example, as shown in FIG. 11, the planarization layer 112 can be made as a light shielding layer as a whole. For example, the planarization layer 112 uses an organic resin material doped with black pigments to form a light-shielding layer.

As shown in FIG. 11, the planarization layer 112 has a first opening 1051 above the photosensitive element 1021 of the image sensor 102 to transmit signal light. For example, in some examples, the surface of the photosensitive element 1021 is also covered with a passivation layer 114, and the passivation layer 114 is made of a transparent insulating material, so the propagation of signal light will not be affected.

For example, the first opening 1051 is filled with a transparent insulating material. For example, the transparent insulating material may be the same as the material of the pixel defining layer 113, so the transparent insulating material filling the first opening 1051 may be formed at the same time as the pixel defining layer 113 is formed. For example, the transparent insulating material is a transparent organic material such as polyimide and resin.

Alternatively, in some embodiments, as shown in FIG. 12, the pixel defining layer 113 is configured to include a light shielding layer 105. For example, the pixel defining layer 113 can be made as a light shielding layer as a whole. For example, the pixel defining layer 113 uses an organic resin material doped with black pigments to form a light-shielding layer.

As shown in FIG. 12, the pixel defining layer 113 has a first opening 1051 above the photosensitive element 1021 of the image sensor 102 to transmit signal light. For example, a spacer insulating layer 1131 is further provided on the pixel defining layer 113 to separate the pixel defining layer 113 from the light shielding pattern 103 by a certain distance.

For example, the spacer insulating layer 1131 uses a transparent insulating material, and the material of the spacer insulating layer 1131 is filled in the first opening 1051. For example, the transparent insulating material is a transparent organic material such as polyimide and resin.

Alternatively, in some embodiments, as shown in FIG. 13, both the planarization layer 112 and the pixel defining layer 113 are configured to include a light-shielding layer. For example, both the planarization layer 112 and the pixel defining layer 113 use organic resin materials doped with black pigments to form a light-shielding layer.

As shown in FIG. 13, the planarization layer 112 and the pixel defining layer 113 have first openings 1051 penetrating each other above the photosensitive element 1021 of the image sensor 102 to transmit signal light. For example, a spacer insulating layer 1131 is further provided on the pixel defining layer 113 to separate the pixel defining layer 113 from the light shielding pattern 103 by a certain distance.

For example, FIG. 14A shows a schematic plan view of a plurality of sub-pixels and an image sensor array, FIG. 14B shows a schematic plan view after a light shielding layer is provided on the image sensor array, and FIG. 14C shows a plan view after a light shielding matrix is provided on the light shielding layer. Schematic. In FIGS. 14A-14C, in this example, the photosensitive element 1021 of each image sensor 102 is rectangular, and one photosensitive element 1021 is provided with two first openings 1051 and two light-shielding patterns 103 correspondingly. In a plan view, the first opening 1051 and the light shielding pattern 103 are both square, and the photosensitive element 1021, the first opening 1051 and the light shielding pattern 103 are all disposed between adjacent sub-pixels 111, so as not to affect the display of the sub-pixel array Effect.

For example, in other embodiments, the photosensitive elements 1021 of the sensor 102 between adjacent sub-pixels 111 may also be square. For example, in the example shown in FIG. 15, one photosensitive element 1021 is arranged in an array corresponding to 9 There are two first openings 1051 and nine light-shielding patterns 103. Both the first opening 1051 and the light-shielding patterns 103 are arranged in a square shape.

For example, the size of the photosensitive element 1021, the size d2 of the first opening 1051, and the size D of the light-shielding pattern 103 in each display device in FIGS. 9 to 15 can all be referred to the embodiment shown in FIGS. 2-8. I won't repeat it here.

For example, the display panel included in the display device may be an Organic Light Emitting Diode (OLED) display panel or a Quantum Dot Light Emitting Diode (QLED) display panel, etc. The embodiments of the present disclosure do not deal with this. Specific restrictions. The OLED display panel may be a flexible OLED display panel, for example. For example, OLED display panels and QLED display panels have self-luminous characteristics, and the light emission of their display pixel units can also be controlled or modulated as required, thereby facilitating texture collection and helping to improve the integration of the device.

For example, in addition to the sub-pixel array, the display panel also includes signal lines (including gate lines, data lines, detection lines, etc.) for providing electrical signals (including scan signals, data signals, detection signals, etc.). For example, The driving circuit controls the light-emitting state of the light-emitting device to realize the lighting of the sub-pixels. For example, the display panel also has functional layers such as an encapsulation layer 106 and a touch control layer. For these functional layers, reference may be made to related technologies, which will not be repeated here.

At least one embodiment of the present disclosure further provides an electronic device, which includes any of the above-mentioned pattern recognition devices. The electronic device may be any product or component with a pattern recognition function, such as a mobile phone, a tablet computer, a display, a notebook computer, etc., which is not specifically limited in the embodiments of the present disclosure.

The following points need to be explained:

(1) The drawings of the embodiments of the present disclosure only refer to the structures related to the embodiments of the present disclosure, and other structures can refer to the usual design.

(2) For the sake of clarity, in the drawings used to describe the embodiments of the present disclosure, the thicknesses of layers or regions are enlarged or reduced, that is, these drawings are not drawn according to actual scale. It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "under" another element, the element can be "directly" on or "under" the other element or There may be intermediate elements.

(3) In the case of no conflict, the embodiments of the present disclosure and the features in the embodiments can be combined with each other to obtain a new embodiment.

The above are only specific implementations of the present disclosure, but the protection scope of the present disclosure is not limited thereto, and the protection scope of the present disclosure should be subject to the protection scope of the claims.

Claims (18)

1. A pattern recognition device with a touch side surface, including:

   Light source array, including multiple light sources;

   An image sensor array, including a plurality of image sensors, wherein the plurality of image sensors are configured to receive light emitted from the plurality of light sources and reflected to the plurality of image sensors by the lines for image collection of the lines;

   The light-shielding matrix includes a plurality of light-shielding patterns arranged in an array on the light incident side of the image sensor array,

   Wherein, each of the plurality of image sensors includes a photosensitive element, and in a direction perpendicular to the touch side surface, the plurality of light sources and the plurality of light-shielding patterns do not overlap, and the plurality of image sensors The photosensitive element of each of at least partially overlaps with at least one of the plurality of light-shielding patterns.
2. The pattern recognition device according to claim 1, wherein the photosensitive element of each of the plurality of image sensors at least partially overlaps with one of the plurality of light-shielding patterns,

   For a correspondingly arranged light-shielding pattern and a photosensitive element of an image sensor, the orthographic projection of the light-sensitive element on the plane where the light-shielding pattern is located is located inside the light-shielding pattern.
3. The pattern recognition device according to claim 2, wherein, in a first direction parallel to the touch side surface, the light-shielding pattern has a length D, and the photosensitive element has a length d1, which is perpendicular to the In the direction of the touch side surface, the distance from the shading pattern to the photosensitive element is h, then:

   D=d1+2h×tanθ1,

   Among them, θ1 is the minimum critical angle of the optical path for pattern recognition.
4. The pattern recognition device according to claim 3, wherein the planar shape of the photosensitive element is a square or a rectangle,

   The side length of the square or the length or width of the rectangle extends along the first direction, so that the side length of the square or the length or width of the rectangle has a dimension d1, and

   10μm≤d1≤20μm.
5. The pattern recognition device according to claim 3 or 4, wherein the range of the distance h from the light shielding pattern to the photosensitive element is: 3 μm≦h≦5 μm.
6. The pattern recognition device according to any one of claims 1 to 5, further comprising a light shielding layer between the light shielding matrix and the image sensor array, wherein:

   The light shielding layer includes a plurality of first openings,

   In a direction perpendicular to the touch side surface, the photosensitive element of each of the plurality of image sensors at least partially overlaps with at least one of the plurality of first openings, and the plurality of light-shielding patterns overlap with each other. The plurality of first openings are in one-to-one correspondence and at least partially overlap.
7. The pattern recognition device according to claim 6, wherein for the correspondingly provided one photosensitive element and at least one first opening, the orthographic projection of the at least one first opening on the plane where the photosensitive element is located is located on the photosensitive element internal.
8. The pattern recognition device according to claim 7, wherein the photosensitive element of each of the plurality of image sensors at least partially overlaps with one of the plurality of first openings, and the plurality of light-shielding patterns and the The plurality of first openings are in one-to-one correspondence and at least partially overlap;

   For a correspondingly set light-shielding pattern and a first opening, in the first direction parallel to the touch side surface, the length of the light-shielding pattern is D, and the length of the first opening is d2, which is perpendicular to the In the direction of the touch side surface, the distance from the light shielding pattern to the light shielding layer is H, then:

   D=d2+2H×tanθ1,

   Among them, θ1 is the minimum critical angle of the optical path for pattern recognition.
9. 8. The pattern recognition device according to claim 7, wherein the photosensitive element of each of the plurality of image sensors at least partially overlaps with at least two of the plurality of first openings, and the plurality of light-shielding patterns Correspond to the plurality of first openings one-to-one and at least partially overlap;

   For one photosensitive element, at least two first openings and at least two light-shielding patterns correspondingly arranged, in the first direction parallel to the touch side surface, the length of the light-shielding pattern is D, and there are two adjacent light-shielding patterns The distance between is P, the length of the first opening is d2, and the distance from the light-shielding pattern to the light-shielding layer in the direction perpendicular to the touch side surface is H, then:

   D=d2+2H×tanθ1,

   P=H×(tanθ1+tanθ2),

   Among them, θ1 is the minimum critical angle of the light path for pattern recognition, and θ2 is the maximum critical angle of the light path for pattern recognition.
10. The pattern recognition device according to claim 8 or 9, wherein the planar shape of the first opening is a circle, a square or a rectangle;

    In the case where the planar shape of the first opening is a circle, the diameter of the circle is d2, and 2μm≤d2≤12.8μm; or,

    In the case where the planar shape of the first opening is a square or a rectangle, the side length of the square or the length or width of the rectangle extends along the first direction, so that the side length of the square or the rectangle The dimension of length or width is d2, and 2μm≤d2≤12.8μm.
11. The pattern recognition device according to any one of claims 8-10, wherein the range of the distance H from the light-shielding pattern to the light-shielding layer is: 4 μm≦H≦6 μm.
12. The pattern recognition device according to any one of claims 1-11, further comprising a display panel, wherein the display panel comprises an array substrate, the array substrate comprises a base substrate and a sub-pixel array provided on the base substrate , The sub-pixel array includes a plurality of sub-pixels,

    The light source array includes the sub-pixel array, and the plurality of light sources includes the plurality of sub-pixels.
13. The pattern recognition device according to claim 12, wherein each of the plurality of sub-pixels includes a pixel driving circuit provided on the base substrate, the pixel driving circuit includes a thin film transistor, and the plurality of images Each of the sensors further includes a switching transistor provided on the base substrate,

    The thin film transistor and the switching transistor are arranged in the same layer.
14. The pattern recognition device according to claim 13, wherein the photosensitive element is disposed on a side of the switching transistor away from the base substrate, and includes a first electrode, a second electrode, and the first electrode and the The semiconductor layer between the second electrodes, the first electrode is electrically connected to the switching transistor;

    The array substrate further includes a planarization layer disposed on a side of the photosensitive element away from the base substrate, and the planarization layer has a first via hole and a second via hole;

    Each of the plurality of sub-pixels further includes a light-emitting device disposed on a side of the planarization layer away from the base substrate, and the light-emitting device includes a first light-emitting drive electrode, a second light-emitting device, and a second light-emitting device. A driving electrode and a light-emitting layer between the first light-emitting driving electrode and the second light-emitting driving electrode, the first light-emitting driving electrode is electrically connected to the thin film transistor at least through the first via;

    The array substrate further includes a connection trace provided on the same layer as the first light-emitting drive electrode, and the connection trace is electrically connected to the second electrode of the photosensitive element through the second via hole.
15. 14. The pattern recognition device according to claim 14, wherein the array substrate further comprises a pixel defining layer disposed on a side of the first light-emitting drive electrode and the connection trace away from the base substrate,

    The pixel defining layer has a second opening exposing the first light-emitting driving electrode, and the light-emitting layer and the second light-emitting driving electrode are respectively at least partially formed in the second opening;

    The light shielding matrix is arranged on a side of the pixel defining layer away from the base substrate.
16. 15. The pattern recognition device according to claim 15, wherein the pixel defining layer is configured to filter light with a wavelength greater than 600 nm.
17. The pattern recognition device according to claim 15, wherein the planarization layer is configured to include a light-shielding layer, or

    The pixel defining layer is configured to include a light-shielding layer, or

    Both the planarization layer and the pixel defining layer are configured to include a light shielding layer.
18. An electronic device, comprising the pattern recognition device according to any one of claims 1-17.

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