WO2021217048A1 - Method of preparing iodosilanes and compositions therefrom - Google Patents

Method of preparing iodosilanes and compositions therefrom Download PDF

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WO2021217048A1
WO2021217048A1 PCT/US2021/028916 US2021028916W WO2021217048A1 WO 2021217048 A1 WO2021217048 A1 WO 2021217048A1 US 2021028916 W US2021028916 W US 2021028916W WO 2021217048 A1 WO2021217048 A1 WO 2021217048A1
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sih
formula
aluminum
compound
hsi
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PCT/US2021/028916
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French (fr)
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Scott A. Laneman
Thomas M. Cameron
David KUIPER
David M. Ermert
Thomas H. Baum
Jonathan W. DUBE
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Entegris, Inc.
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Priority to KR1020227040410A priority Critical patent/KR20230003543A/en
Priority to CN202180034469.5A priority patent/CN115605432A/en
Priority to JP2022564199A priority patent/JP7495995B2/en
Priority to EP21793607.9A priority patent/EP4139250A4/en
Publication of WO2021217048A1 publication Critical patent/WO2021217048A1/en

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10773—Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C07F7/123—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-halogen linkages

Definitions

  • This invention belongs to the field of chemistry. It relates to methodology for preparing certain iodosilanes from the corresponding chloro- or bromo-silanes using an aluminum-mediated halide exchange process.
  • Background of the Invention [0002] Halosilanes are useful as precursors in the manufacturing of microelectronic devices. In particular, halosilanes such as H 2 SiI 2 and HSiI 3 are useful as precursor compounds for the deposition of silicon-containing films used in the manufacture of microelectronic devices.
  • arylsilane-based methods for preparing halosilanes typically generate product contaminated with iodine and/or hydrogen iodide, which are deleterious to the desired iodosilane product, so often antimony, silver, or copper are utilized to stabilize the iodosilane product.
  • U.S. Patent No.10,106,425 teaches the use of an arylsilane, (CH 3 C 6 H 4 )SiH 3 , as reactant. The process as disclosed generates toluene as a by-product and is thus claimed as a less hazardous alternative to the Keinan method which generates benzene from Phenyl-SiH 3 .
  • Patent No.10,384,944 describes a halide exchange between, for example, LiI and SiH 2 Cl 2 , thereby generating LiCl and SiH 2 I 2 in a Finkelstein--like reaction.
  • Summary of the Invention [0006]
  • the invention provides certain complexes useful in the conversion of chloro- and bromo-silanes to highly-desired iodosilanes such as H2SiI2 and HSiI3, via a halide exchange reaction.
  • the species which mediates this reaction is an iodide reactant comprising aluminum.
  • the iodide reactant comprising aluminum is a compound having the formula (A): [M +q ] z [Al(X) 3 I w ] q (A), wherein z is 0 or 1, w is 0 or 1, M is chosen from (i) Group 1 metal cations chosen from Li + , Na + , K + , Rb + , and Cs + ; (ii) Group 2 metal cations chosen from Mg 2+ , Ca 2+ , Sr 2+ , and Ba 2+ ; and (iii) ammonium or C 1 -C 6 alkyl or benzyl ammonium cations; q is the valence of M and is 1 or 2, and X is chloro, bromo, or iodo, provided that when z and w are zero, X is iodo.
  • Examples of such iodide reactants includes, for example, LiAl(I) 4 , NaAl(I) 4 , KAl(I)4, Mg[Al(I)4] 2 , Ca[Al(I)4] 2 , LiAl(Cl)3I, LiAlCl(I)3, NaAl(Cl)3I, NaAlCl(I)3, KAl(Cl)3I, KAlCl(I)3, Mg[Al(Cl)3I] 2 , Mg[Al(Cl)(I)3] 2 , Ca[Al(Cl)3I] 2 , Ca[Al(Cl)3]2, NH4Al(I)4, NH 4 Al(Cl) 3 I, NH 4 Al(Cl)(I) 3 , NaAl 2 I 7 , NaAl 3 I 10 , and Al(I) 3 .
  • Figure 1 is an 27 Al NMR spectrum of aluminates, of the form LiAl(I)x(Cl)y, in solution during conversion of SiH 2 Cl 2 to SiH 2 I 2 using in situ generated aluminate reagent.
  • the aluminate was generated by combining three equivalents each of AlCl3 and LiI with respect to SiH 2 Cl 2 .
  • the reaction was heated at 60 °C for 1 hour and NMR data was acquired. See Example 8 for further details.
  • the invention provides a method for preparing an iodosilane having the formula (I) or (II) SiRxIy (I), or I y R x Si-Si R x I y (II), wherein x is 1, or 2, y is an integer of from 1 to 3, and wherein the sum of x plus y is 4 in formula (I) and 3 in formula (II) at each Si center, and wherein R is hydrogen or a C1-C6 alkyl group; which comprises contacting a halosilane having the formula SiR x D y or D y R x Si-SiR x D y , wherein D is chloro or bromo, with an iodide reactant comprising aluminum.
  • the halosilane reactant in order to form an iodosilane of formula (I), the halosilane reactant will necessarily be a compound of the formula SiRxDy. Similarly, in order to form an iodosilane of formula (II), the halosilane reactant will be a compound of the formula: D y R x Si-SiR x D y .
  • Exemplary iodosilanes as contemplated above include SiHI 3 , SiH 2 I 2 , SiH 3 I, SiH 2 CH 3 I, SiH 2 (CH 2 CH 3 )I, SiH 2 (CH 2 CH 2 CH 3 )I, SiH 2 ((CH 3 ) 2 CH)I, SiH 2 (CH 2 CH 2 CH 2 CH3)I, SiH 2 ((CH 3 ) 3 C)I, SiHCH 3 I 2 , SiH(CH 2 CH 3 )I 2 , SiH(CH 2 CH 2 CH 3 )I 2 , SiH((CH 3 ) 2 CH)I 2 , SiH(CH 2 CH 2 CH 2 CH 3 )I 2 , SiH((CH 3 ) 3 C)I 2 , SiCH 3 I 3 , Si(CH 2 CH 3 )I 3 , Si(CH 2 CH 2 CH 3 )I 3, Si((CH 3 ) 2 CH)I 3 , Si(CH 2 CH 2 CH 3 )I 3 , Si(CH
  • the iodosilane of the formula (I) is H 2 SiI 2 .
  • the iodide reactant comprising aluminum is a compound having the formula (A): [M +q ] z [Al(X) 3 I w ] q (A) wherein z is 0 or 1, w is 0 or 1, M is chosen from (i) Group 1 metal cations chosen from Li + , Na + , K + , Rb + , and Cs + ; (ii) Group 2 metal cations chosen from Mg 2+ , Ca 2+ , Sr 2+ , and Ba 2+ ; and (iii) ammonium, C 1 -C 6 alkyl ammonium, or benzyl ammonium cations; q is the valence of M and is 1 or 2, and X is chloro, bromo, or iodo, provided that when z and w are zero, X is io
  • M is chosen from cations such as (CH 3 ) 4 N + , (CH 3 CH 2 ) 4 N + , (CH3CH2CH2)4N +, and (CH3CH2CH2CH2)4N + .
  • z is 1 and w is 1, depending on the valence of the cation, M.
  • the anionic portion of compounds of formula (A), i.e., [Al(X)3Iw]q can be referred to as aluminates and can be generated by reaction of the parent components in solution or in the solid state using 1:1 molar ratios of reactants (or 2:1 in the case of divalent Group 2 metal cations).
  • an LiAl(I)4 aluminate can be prepared by mixing LiI and Al(I) 3 in solution or by reaction at high temperature when combined in a 1:1 molar ratio.
  • the aluminates can be isolated easily from such reactions.
  • the aluminates are isolable compounds and can thus be added to reaction mixtures to effect transformation of chloro- and bromosilanes to iodosilanes as described herein.
  • the above-mentioned aluminates can be prepared in situ and subsequently used for conversion of chloro- and bromosilanes to iodosilanes of formula (I) and (II) as set forth above.
  • Examples of compounds of the formula (A) wherein z is 1 include aluminates such as LiAl(I)4, NaAl(I)4, KAl(I)4, Mg[Al(I)4]2, Ca[Al(I)4]2, LiAl(Cl)3I, LiAlCl(I) 3 , NaAl(Cl) 3 I, NaAlCl(I) 3 , KAl(Cl) 3 I, KAlCl(I) 3 , Mg[Al(Cl) 3 I] 2 , Mg[Al(Cl)(I) 3 ] 2 , Ca[Al(Cl)3I]2, Ca[Al(Cl)(I)3]2, NH4Al(I)4, NH4Al(Cl)3I, NH4Al(Cl)(I)3, NaAl2I7, NaAl3I10, and the like.
  • aluminates such as LiAl(I)4, Na
  • the iodide reactant comprising aluminum is aluminum triiodide (i.e., z and w are zero in formula (A)).
  • aluminum triiodide can be used directly as the iodide reactant set forth herein or can be generated in situ by the reaction of aluminum metal with iodine.
  • Al(I) 3 (and AlCl 3 ) are known to exist as tetrahedral based dimers but will be represented herein as monomeric species for the sake of simplicity.
  • the invention provides a method for preparing a compound of the formula H 2 SiI 2 , which comprises contacting a compound of the formula H2SiCl2 with Al(I)3.
  • the Al(I)3 so utilized is generated in situ from elemental aluminum and iodine.
  • Al(X)3, when X is chloro, bromo, (or iodo) can be utilized in conjunction with a Group I or Group 2 iodide.
  • the aluminate species can be generated in situ by reacting, for example AlCl3 with MgI2, the latter of which can be formed in situ by the reaction of magnesium metal with iodine.
  • the 27 Al NMR spectrum of the reaction mixture ( Figure1) shows the aluminate species in the reaction responsible for the transformation of SiH2Cl2 to SiH2I2.
  • the iodide reactant is a compound of the formula MAl m I n , wherein M is an alkali metal, and (i) m is 2 and n is 7, or (ii) m is 3 and n is 10.
  • the iodide reactant can be a compound having the formula NaAl 2 I 7 or NaAl3I10. These compounds may be prepared as taught in Boef, G.; Brins Slot, H.; Van Leeuwen, R.A.W.; Wessels, H.; Van Spronsen, Johannes W., Zeitschrift fuer Anorganische undcommune Chemie (1967), 353(1-2), 93-102.
  • aluminate species exist in the form wherein the aluminate anion is present as (AlX4)- and are synthesized by reaction of an aluminum halide, AlX3, and a corresponding metal halide, M +q I q , (wherein “q” represents valence of the metal cation, and the total number of anionic species necessary to provide an uncharged formula) in a 1:1 molar ratio for the Group 1 congeners.
  • the literature refers to the system as a 0.5:0.5/AlX3:M +q Iq system wherein the actual chemical species that exists is M +q [AlX4]q.
  • LiAl(I) 4 can be generated from reaction of equimolar amounts of LiI and Al(I)3.
  • the above-mentioned aluminates can also exist when the reactants are combined in molar ratios that vary from the 1:1 example given.
  • the literature describes such systems as AlX 3 :M +q I q systems that are either AlX 3 rich or M +q I q rich.
  • the NaAl2I7 or NaAl3I10 compounds discussed above are examples where in both cases the systems are rich in Al(I)3.
  • An analogous situation also exists for the divalent Group 2 metal cation- based aluminates.
  • AlX 3 rich and the M +q I q rich variations of the iodide reactant can also mediate the transformation of halosilane to iodosilane when the AlX 3 :M +v I v system is present in any ratios between 0.999:0.001 to 0.001:0.999.
  • Al(X)3 (X is chloro or iodo) can be utilized as a precursor for the conversion of chloro- and bromosilanes to iodosilanes.
  • the chloro- or bromosilanes are converted to iodosilanes.
  • the AlX3 and M +q Iq react to form an aluminate species.
  • the reaction of Al(X) 3 with M +q I q need not be in a 1:1 stoichiometric proportion.
  • the aluminate can mediate the transformation of chloro- or bromosilane to iodosilane and the needed Al-I functionality is regenerated by reaction between the aluminate and M +q Iq.
  • the iodide reactant comprising aluminum can be added to the reaction as discrete materials or generated in situ where possible.
  • the iodide reactant comprising aluminum is generated in situ from a. AlX 3 and M +q X q ; b. Al o , X2, and M +q Xq; c. AlX 3 , M o , and X 2 ; or d.
  • the methodology of the invention can be practiced neat or in the presence of an aprotic solvent which is non-reactive with the starting materials or iodosilane products.
  • solvents include hydrocarbon solvents which are devoid of moieties such as oxygen, esters, carboxy groups, and ketones. Examples include benzene, toluene, hexane, cyclohexane, tetralin, decalin, mesitylene and the like.
  • the method for preparing the precursor compounds of the invention can be conducted in standard batch or continuous mode reactors.
  • the invention provides a precursor composition comprising a compound of the formula SiH 2 I 2 , having less than 1 ppm (parts per million) of antimony, silver, or copper impurities and less than about 1 ppm of sodium or lithium impurities.
  • the invention provides a precursor composition comprising a compound of the formula SiH2I2, having less than about 10 ppb (parts per billion) or less than about 5 ppb aluminum impurities.
  • Compounds of the formulae (I) and (II) are useful as precursors in the formation of silicon-containing films on the surface of a microelectronic device by methods such as atomic layer deposition. See for example, U.S. Patent Nos.
  • Compounds (I) and (II) can be introduced into a deposition chamber for the purposes of thermal CVD or ALD, or for the purposes of performing plasma-enhanced ALD or CVD.
  • a co-reactant gas can be introduced to deposit an SiO2 film, via oxidation in an oxidizing environment with O2, O3, N2O, or mixtures thereof.
  • compounds (I) and (II) can be introduced into a deposition chamber for the purposes of thermal CVD or ALD, or for the purposes of performing plasma-enhanced ALD or CVD.
  • a co-reactant gas can be introduced to deposit an SN film, via nitridation with N 2 , NH 3 , hydrazine or alkylhydrazine containing mixtures.
  • the deposited films serve as dielectric layers within the microelectronic device.
  • Example 1 To LiAl(I)4 (0.13g, 0.25 mmol) was added a solution of SiH2Cl2 in xylenes and benzene-d6 (0.025 g SiH 2 Cl 2 , 0.25 mmol SiH 2 Cl 2 , 1.0 ml benzene-d6, 0.075 g xylenes). The mixture was stirred at 60 °C for 45 minutes. The liquid was decanted from the solid ppt and placed in an NMR tube. Conversion of SiH2Cl2 to SiH2I2 was determined by analysis of the 1 H NMR spectrum of the reaction mixture.
  • Example 3 In situ generation of LiAl(I)4: To a 3.0 ml quantity of benzened6 was added Al° (0.050 g, 1.85 mmol), I 2 (0.375 g, 1.5 mmol), and LiI (0.13 g, 1 mmol) to afford a dark red colored mixture. The mixture was stirred at 60 °C. After one hour the initial red color of the mixture dissipated and gave a colorless mixture. To the in situ generated LiAl(I) 4 was added a solution of SiH2Cl2 in xylenes (0.10 g SiH2Cl2, 1.0 mmol SiH2Cl2, 0.30 g xylenes). The mixture was stirred at 60 °C.
  • the percent conversion to diiodosilane was determined by analysis of 1 H NMR spectra of the reaction mixtures.
  • Table 1 Example 8 [0039] A summary of reactions and conditions generating diiodosilane from dichorosilane with various reagents is presented in Table 2. The reactions were carried out by addition of a 25% dichlorosilane/xylene solution to the indicated iodide source in benzene- d6. The reaction time and temperatures are indicated and the percent conversion to diiodosilane was determined by 1 H NMR spectroscopy. The indicated equivalents (eq) of reagent used are with respect to using one equivalent of dichlorosilane in each reaction presented.
  • Example 9 A summary of reaction conditions for conversion of trichlorsilane to triiodosilane using Al(I) 3 or aluminate reagents is presented in Table 3. Reactions were carried out in C6D6 at 100°C in sealed containers for 16 hours. The percent distribution of silane products was determined by 1 H NMR spectroscopy. The indicated equivalents (eq) of reagent used are with respect to using one equivalent of dichlorosilane in each reaction. Table 3
  • Example 10 A summary of reaction conditions for conversion of trichlorsilane to triiodosilane using various in situ generated aluminates is shown in Table 4 with relevant reaction conditions.
  • Example 12 [0043] In a typical procedure used to generate SiH2I2 iodine (335 grams, 1.32 mol) was charged into a flask and toluene was added to make a concentrated solution. To a separate flask was charged aluminum (25 grams, 0.926 mol, 20-40 mesh) and toluene was added to make a slurry. At an internal temperature of 45°C the iodine solution was slowly added to the aluminum over 3 hours, maintaining an internal temperature of 45-55°C. The residual undissolved iodine was dissolved in toluene and charged into the reaction mixture repeatedly until no iodine remained.
  • reaction mixture was stirred at 45-50°C for 2 hours, followed by stirring for 12 hours at room temperature. The volatiles were removed in vacuo at 40°C to leave a concentrated mixture. Hexanes were added to the mixture to further precipitate the solid Al(I)3. The solid Al(I)3 was rinsed with hexanes twice and resuspended in hexanes to give an Al(I) 3 suspension. To the Al(I) 3 suspension was added SiH2Cl2 (135 grams, 1.33 mol) over 5 minutes. The reaction mixture was stirred at 20°C for 1 hour, and then was heated to 35°C for 3 hours. The reaction mixture was cooled to 20°C and filtered.

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Abstract

Provided are complexes useful in the conversion of chloro- and bromo-silanes to highly desired iodosilanes such as H2SiI2 and HSiI3, via a halide exchange reaction. The species which mediates this reaction is an iodide reactant comprising aluminum.

Description

METHOD OF PREPARING IODOSILANES AND COMPOSITIONS THEREFROM Field of the Invention [0001] This invention belongs to the field of chemistry. It relates to methodology for preparing certain iodosilanes from the corresponding chloro- or bromo-silanes using an aluminum-mediated halide exchange process. Background of the Invention [0002] Halosilanes are useful as precursors in the manufacturing of microelectronic devices. In particular, halosilanes such as H2SiI2 and HSiI3 are useful as precursor compounds for the deposition of silicon-containing films used in the manufacture of microelectronic devices. Current solution-based synthetic methodology describes the synthesis of H2SiI2 and other select iodosilanes from i) aryl silanes (Keinan et al. J. Org. Chem., Vol.52, No.22, 1987, pp.4846-4851; Kerrigan et. al. U.S. Patent No. 10,106,425 or ii) halosilanes such as SiH2Cl2 (U.S. Patent No.10,384,944). [0003] Keinan et al. describe a synthetic method towards SiH2I2 formation that employs stoichiometric treatment of Phenyl-SiH3, an arylsilane, with iodine in the presence of a catalyst such as ethyl acetate. The reaction by-products are the aromatic function from the arylsilane, liberated as benzene, and a complicated by-product mixture resulting from ethyl acetate decomposition. Tedious separation of the reaction by-products from the desired SiH2I2 complicates the process. In addition, arylsilane-based methods for preparing halosilanes typically generate product contaminated with iodine and/or hydrogen iodide, which are deleterious to the desired iodosilane product, so often antimony, silver, or copper are utilized to stabilize the iodosilane product. [0004] U.S. Patent No.10,106,425 teaches the use of an arylsilane, (CH3C6H4)SiH3, as reactant. The process as disclosed generates toluene as a by-product and is thus claimed as a less hazardous alternative to the Keinan method which generates benzene from Phenyl-SiH3. [0005] U.S. Patent No.10,384,944 describes a halide exchange between, for example, LiI and SiH2Cl2, thereby generating LiCl and SiH2I2 in a Finkelstein--like reaction. Summary of the Invention [0006] In summary, the invention provides certain complexes useful in the conversion of chloro- and bromo-silanes to highly-desired iodosilanes such as H2SiI2 and HSiI3, via a halide exchange reaction. The species which mediates this reaction is an iodide reactant comprising aluminum. In certain embodiments, the iodide reactant comprising aluminum is a compound having the formula (A): [M+q]z[Al(X)3Iw]q (A), wherein z is 0 or 1, w is 0 or 1, M is chosen from (i) Group 1 metal cations chosen from Li+, Na+, K+, Rb+, and Cs+; (ii) Group 2 metal cations chosen from Mg2+, Ca2+, Sr2+, and Ba2+; and (iii) ammonium or C1-C6 alkyl or benzyl ammonium cations; q is the valence of M and is 1 or 2, and X is chloro, bromo, or iodo, provided that when z and w are zero, X is iodo. [0007] Examples of such iodide reactants includes, for example, LiAl(I)4, NaAl(I)4, KAl(I)4, Mg[Al(I)4]2, Ca[Al(I)4]2, LiAl(Cl)3I, LiAlCl(I)3, NaAl(Cl)3I, NaAlCl(I)3, KAl(Cl)3I, KAlCl(I)3, Mg[Al(Cl)3I]2, Mg[Al(Cl)(I)3]2, Ca[Al(Cl)3I]2, Ca[Al(Cl)(I)3]2, NH4Al(I)4, NH4Al(Cl)3I, NH4Al(Cl)(I)3, NaAl2I7, NaAl3I10, and Al(I)3. Brief Description of the Drawings [0008] Figure 1 is an 27Al NMR spectrum of aluminates, of the form LiAl(I)x(Cl)y, in solution during conversion of SiH2Cl2 to SiH2I2 using in situ generated aluminate reagent. The aluminate was generated by combining three equivalents each of AlCl3 and LiI with respect to SiH2Cl2. The reaction was heated at 60 °C for 1 hour and NMR data was acquired. See Example 8 for further details. Detailed Description of the Invention [0009] In a first aspect, the invention provides a method for preparing an iodosilane having the formula (I) or (II) SiRxIy (I), or IyRxSi-Si RxIy (II), wherein x is 1, or 2, y is an integer of from 1 to 3, and wherein the sum of x plus y is 4 in formula (I) and 3 in formula (II) at each Si center, and wherein R is hydrogen or a C1-C6 alkyl group; which comprises contacting a halosilane having the formula SiRxDy or DyRxSi-SiRxDy, wherein D is chloro or bromo, with an iodide reactant comprising aluminum. [0010] It should be appreciated that in this method, in order to form an iodosilane of formula (I), the halosilane reactant will necessarily be a compound of the formula SiRxDy. Similarly, in order to form an iodosilane of formula (II), the halosilane reactant will be a compound of the formula: DyRxSi-SiRxDy. [0011] Exemplary iodosilanes as contemplated above include SiHI3, SiH2I2, SiH3I, SiH2CH3I, SiH2(CH2CH3)I, SiH2(CH2CH2CH3)I, SiH2((CH3)2CH)I, SiH2(CH2CH2CH2CH3)I, SiH2((CH3)3C)I, SiHCH3I2, SiH(CH2CH3)I2, SiH(CH2CH2CH3)I2, SiH((CH3)2CH)I2, SiH(CH2CH2CH2CH3)I2, SiH((CH3)3C)I2, SiCH3I3, Si(CH2CH3)I3, Si(CH2CH2CH3)I3, Si((CH3)2CH)I3, Si(CH2CH2CH2CH3)I3, Si((CH3)3C)I3, I3Si-SiI3. I2CH3Si-SiCH3I2, I2(CH3CH2)Si-Si(CH2CH3)I2, I2(CH3CH2CH2)Si-Si(CH2CH2CH3)I2, I2((CH3)2CH)Si-Si((CH3)2CH)I2, I2(CH3CH2CH2CH2)Si-Si(CH2CH2CH2CH3)I2, I2((CH3)3C)Si-Si((CH3)3C)I2, ICH3HSi-SiHCH3I, I(CH2CH3)HSi-SiH(CH2CH3)I, I(CH2CH2CH3)HSi-SiH(CH2CH2CH3)I, I((CH3)2CH)HSi-SiH((CH3)2CH)I, I(CH2CH2CH2CH3)HSi-SiH(CH2CH2CH2CH3)I, and I((CH3)3C)HSi-SiH((CH3)3C)I. In one embodiment, the iodosilane of the formula (I) is H2SiI2. [0012] In one embodiment, the iodide reactant comprising aluminum is a compound having the formula (A): [M+q]z[Al(X)3Iw]q (A) wherein z is 0 or 1, w is 0 or 1, M is chosen from (i) Group 1 metal cations chosen from Li+, Na+, K+, Rb+, and Cs+; (ii) Group 2 metal cations chosen from Mg2+, Ca2+, Sr2+, and Ba2+; and (iii) ammonium, C1-C6 alkyl ammonium, or benzyl ammonium cations; q is the valence of M and is 1 or 2, and X is chloro, bromo, or iodo, provided that when z and w are zero, X is iodo. [0013] In one embodiment, M is chosen from cations such as (CH3)4N+, (CH3CH2)4N+, (CH3CH2CH2)4N+, and (CH3CH2CH2CH2)4N+. [0014] In another embodiment, z is 1 and w is 1, depending on the valence of the cation, M. In such cases, the anionic portion of compounds of formula (A), i.e., [Al(X)3Iw]q, can be referred to as aluminates and can be generated by reaction of the parent components in solution or in the solid state using 1:1 molar ratios of reactants (or 2:1 in the case of divalent Group 2 metal cations). By way of example, an LiAl(I)4 aluminate can be prepared by mixing LiI and Al(I)3 in solution or by reaction at high temperature when combined in a 1:1 molar ratio. The aluminates can be isolated easily from such reactions. The aluminates are isolable compounds and can thus be added to reaction mixtures to effect transformation of chloro- and bromosilanes to iodosilanes as described herein. Alternately, the above-mentioned aluminates can be prepared in situ and subsequently used for conversion of chloro- and bromosilanes to iodosilanes of formula (I) and (II) as set forth above. The properties and solid-state structure of the above described aluminates have been discussed in the literature by Braunstein (Braunstein, J. Advances in Molten Salt Chemistry, Volume 1, 1971) and Prömper and Frank (Prömper S. W. and Frank, W. Acta Cryst.2017, E73, 1426). [0015] Accordingly, in one embodiment, in the compounds of formula (A), z is 1, indicating “M” is present. Examples of compounds of the formula (A) wherein z is 1 include aluminates such as LiAl(I)4, NaAl(I)4, KAl(I)4, Mg[Al(I)4]2, Ca[Al(I)4]2, LiAl(Cl)3I, LiAlCl(I)3, NaAl(Cl)3I, NaAlCl(I)3, KAl(Cl)3I, KAlCl(I)3, Mg[Al(Cl)3I]2, Mg[Al(Cl)(I)3]2, Ca[Al(Cl)3I]2, Ca[Al(Cl)(I)3]2, NH4Al(I)4, NH4Al(Cl)3I, NH4Al(Cl)(I)3, NaAl2I7, NaAl3I10, and the like. [0016] In one embodiment, the iodide reactant comprising aluminum is aluminum triiodide (i.e., z and w are zero in formula (A)). In this regard, we have found that the displacement reaction occurs in the presence of aluminum triiodide alone; such aluminum triiodide can be used directly as the iodide reactant set forth herein or can be generated in situ by the reaction of aluminum metal with iodine. Al(I)3 (and AlCl3) are known to exist as tetrahedral based dimers but will be represented herein as monomeric species for the sake of simplicity. [0017] Accordingly, in one embodiment, the invention provides a method for preparing a compound of the formula H2SiI2, which comprises contacting a compound of the formula H2SiCl2 with Al(I)3. In another embodiment, the Al(I)3 so utilized is generated in situ from elemental aluminum and iodine. [0018] Additionally, Al(X)3, when X is chloro, bromo, (or iodo) can be utilized in conjunction with a Group I or Group 2 iodide. In such cases, the aluminate species can be generated in situ by reacting, for example AlCl3 with MgI2, the latter of which can be formed in situ by the reaction of magnesium metal with iodine. [0019] In these cases, multinuclear NMR analysis supports the hypothesis that the species formed is indeed an aluminate complex having the empirical formula MzAl(X)3I, as depicted above, which is believed to be the reactive species in this aluminum-mediated halogen displacement reaction. The aluminate species present in such reactions have been identified by 27Al NMR spectroscopy. In a specific example SiH2Cl2 was treated with three equivalents of an aluminate reactant formed in situ from reaction of AlCl3 and LiI. In this reaction SiH2I2 was generated with a 59% conversion as summarized in Example 8. The 27Al NMR spectrum of the reaction mixture (Figure1) shows the aluminate species in the reaction responsible for the transformation of SiH2Cl2 to SiH2I2. [0020] While not wishing to be bound by theory, we believe that this aluminate structure serves to mediate the displacement of the chlorine atoms on the silane to provide the desired iodosilanes. [0021] In another embodiment, the iodide reactant is a compound of the formula MAlmIn, wherein M is an alkali metal, and (i) m is 2 and n is 7, or (ii) m is 3 and n is 10. In this embodiment, the iodide reactant can be a compound having the formula NaAl2I7 or NaAl3I10. These compounds may be prepared as taught in Boef, G.; Brins Slot, H.; Van Leeuwen, R.A.W.; Wessels, H.; Van Spronsen, Johannes W., Zeitschrift fuer Anorganische und Allgemeine Chemie (1967), 353(1-2), 93-102. [0022] In general, aluminate species exist in the form wherein the aluminate anion is present as (AlX4)- and are synthesized by reaction of an aluminum halide, AlX3, and a corresponding metal halide, M+qIq, (wherein “q” represents valence of the metal cation, and the total number of anionic species necessary to provide an uncharged formula) in a 1:1 molar ratio for the Group 1 congeners. In these cases, the literature refers to the system as a 0.5:0.5/AlX3:M+qIq system wherein the actual chemical species that exists is M+q[AlX4]q. Accordingly, and as an example, LiAl(I)4 can be generated from reaction of equimolar amounts of LiI and Al(I)3. [0023] However, the above-mentioned aluminates can also exist when the reactants are combined in molar ratios that vary from the 1:1 example given. In these cases, the literature describes such systems as AlX3:M+qIq systems that are either AlX3 rich or M+qIq rich. The NaAl2I7 or NaAl3I10 compounds discussed above are examples where in both cases the systems are rich in Al(I)3. An analogous situation also exists for the divalent Group 2 metal cation- based aluminates. In this embodiment of the invention the AlX3 rich and the M+qIq rich variations of the iodide reactant can also mediate the transformation of halosilane to iodosilane when the AlX3:M+vIv system is present in any ratios between 0.999:0.001 to 0.001:0.999. [0024] In another embodiment, Al(X)3 (X is chloro or iodo) can be utilized as a precursor for the conversion of chloro- and bromosilanes to iodosilanes. In this embodiment, equimolar mixtures of chloro- or bromosilane and M+qIq (q = oxidation state of M; e.g., MgI2, q=+2) can be treated with 5-25 mol% of Al(X)3. When so treated the chloro- or bromosilanes are converted to iodosilanes. In these cases, the AlX3 and M+qIq react to form an aluminate species. In this regard, the reaction of Al(X)3 with M+qIq need not be in a 1:1 stoichiometric proportion. The aluminate can mediate the transformation of chloro- or bromosilane to iodosilane and the needed Al-I functionality is regenerated by reaction between the aluminate and M+qIq. As described above, the iodide reactant comprising aluminum can be added to the reaction as discrete materials or generated in situ where possible. [0025] Thus, in a further embodiment, the iodide reactant comprising aluminum is generated in situ from a. AlX3 and M+qXq; b. Alo, X2, and M+qXq; c. AlX3, Mo, and X2; or d. Alo, Mo, and X2, wherein q represents the valence of M and X. [0026] The methodology of the invention can be practiced neat or in the presence of an aprotic solvent which is non-reactive with the starting materials or iodosilane products. Such solvents include hydrocarbon solvents which are devoid of moieties such as oxygen, esters, carboxy groups, and ketones. Examples include benzene, toluene, hexane, cyclohexane, tetralin, decalin, mesitylene and the like. [0027] The method for preparing the precursor compounds of the invention can be conducted in standard batch or continuous mode reactors. One of ordinary skill in the art would recognize the scale and type of reactors which could be utilized in the context of the reagents and products so produced. [0028] Insofar as the methodology of the present invention generates neither iodine or hydrogen iodide, there is no need to utilize copper, antimony or silver compounds to stabilize the resulting iodosilane product. Additionally, in those cases where the iodide reactant does not comprise an alkali metal cation, such as is the case with Al(I)3, ammonium iodide, or alkylammonium iodides, the resulting iodosilane product will thus necessarily also be free of alkali metal impurities. Accordingly, in a second aspect, the invention provides a precursor composition comprising a compound of the formula SiH2I2, having less than 1 ppm (parts per million) of antimony, silver, or copper impurities and less than about 1 ppm of sodium or lithium impurities. In a further aspect, the invention provides a precursor composition comprising a compound of the formula SiH2I2, having less than about 10 ppb (parts per billion) or less than about 5 ppb aluminum impurities. [0029] Compounds of the formulae (I) and (II) are useful as precursors in the formation of silicon-containing films on the surface of a microelectronic device by methods such as atomic layer deposition. See for example, U.S. Patent Nos. 10,580,645 and 10,424,477, incorporated herein by reference. [0030] Compounds (I) and (II) can be introduced into a deposition chamber for the purposes of thermal CVD or ALD, or for the purposes of performing plasma-enhanced ALD or CVD. In these cases, a co-reactant gas can be introduced to deposit an SiO2 film, via oxidation in an oxidizing environment with O2, O3, N2O, or mixtures thereof. Similarly, compounds (I) and (II) can be introduced into a deposition chamber for the purposes of thermal CVD or ALD, or for the purposes of performing plasma-enhanced ALD or CVD. In these cases, a co-reactant gas can be introduced to deposit an SN film, via nitridation with N2, NH3, hydrazine or alkylhydrazine containing mixtures. The deposited films serve as dielectric layers within the microelectronic device. Examples [0031] This invention can be further illustrated by the following examples of certain embodiments thereof, although it will be understood that these examples are included merely for purposes of illustration and are not intended to limit the scope of the invention unless otherwise specifically indicated. All manipulations were carried out under inert atmosphere. Example 1 [0032] To LiAl(I)4 (0.13g, 0.25 mmol) was added a solution of SiH2Cl2 in xylenes and benzene-d6 (0.025 g SiH2Cl2, 0.25 mmol SiH2Cl2, 1.0 ml benzene-d6, 0.075 g xylenes). The mixture was stirred at 60 °C for 45 minutes. The liquid was decanted from the solid ppt and placed in an NMR tube. Conversion of SiH2Cl2 to SiH2I2 was determined by analysis of the 1H NMR spectrum of the reaction mixture. After 45 minutes of reaction time the distribution of reaction products was 92.4% SiH2I2 with 0.6% SiH2Cl2. There was also 7% of the monosubstituted product SiH2(Cl)(I) in the reaction mixture as determined by 1H NMR spectroscopy. Example 2 [0033] To a solid mixture of Al(I)3 (0.02 g, 0.05 mmol) and MgI2 (0.275 g, 1.0 mmol) was added a solution of SiH2Cl2 in xylenes and benzene-d6 (0.10 g SiH2Cl2, 1.0 mmol SiH2Cl2, 1.0 ml benzene-d6, 0.30 g xylenes). The mixture was stirred for 50 minutes at 60 C°. The liquid was decanted from the solid ppt and placed in an NMR tube. Conversion of SiH2Cl2 to SiH2I2 was determined by analysis of the 1H NMR spectrum of the reaction mixture. After 50 minutes of reaction time the distribution of reaction products was 92.3% SiH2I2 with 0.7% SiH2Cl2. There was also 7% of the monosubstituted product SiH2(Cl)(I) in the reaction mixture as determined by 1H NMR spectroscopy. Example 3 [0034] In situ generation of LiAl(I)4: To a 3.0 ml quantity of benzened6 was added Al° (0.050 g, 1.85 mmol), I2 (0.375 g, 1.5 mmol), and LiI (0.13 g, 1 mmol) to afford a dark red colored mixture. The mixture was stirred at 60 °C. After one hour the initial red color of the mixture dissipated and gave a colorless mixture. To the in situ generated LiAl(I)4 was added a solution of SiH2Cl2 in xylenes (0.10 g SiH2Cl2, 1.0 mmol SiH2Cl2, 0.30 g xylenes). The mixture was stirred at 60 °C. Conversion of SiH2Cl2 to SiH2I2 was determined by analysis of the 1H NMR spectrum of the reaction mixture. After 60 minutes of reaction time the distribution of reaction products was 90% SiH2I2 with 1% SiH2Cl2. There was also 8.6 % of the monosubstituted product SiH2(Cl)(I) in the reaction mixture as determined by 1H NMR spectroscopy. Example 4 [0035] In situ generation of Al(I)3: To a 2.0 ml quantity of benzened6 was added Al° (0.030 g, 1.1 mmol) and I2 (0.375 g, 1.5 mmol) to afford a dark red colored mixture. After stirring at 70 °C for 1.5 hours the color dissipated to afford a colorless mixture. To the in situ generated Al(I)3 was added a solution of SiH2Cl2 in xylenes (0.025 g SiH2Cl2, 0.25 mmol SiH2Cl2, 0.075 g xylenes). The mixture was stirred at 60 °C for one hour. Conversion of SiH2Cl2 to SiH2I2 was determined by analysis of the 1H NMR spectrum of the reaction mixture. After 60 minutes of reaction time the distribution of reaction products was 91% SiH2I2 with 0.5 % SiH2Cl2. There was also 7% of the monosubstituted product SiH2(Cl)(I) in the reaction mixture as determined by 1H NMR spectroscopy. Example 5 [0036] To Al(I)3 (0.10 g, 0.25 mmol) was added a solution of SiH2Cl2 in xylenes and benzene-d6 (0.025 g SiH2Cl2, 0.25 mmol SiH2Cl2, 1.0 ml benzene-d6, 0.075 g xylenes). The mixture was stirred at 60 °C for 35 minutes. The mixture was placed in an NMR tube. Conversion of SiH2Cl2 to SiH2I2 was determined by analysis of the 1H NMR spectrum of the reaction mixture. After 35 minutes of reaction time the distribution of reaction products was 79% SiH2I2 with 5% SiH2Cl2. There was also 16% of the monosubstituted product SiH2(Cl)(I) in the reaction mixture as determined by 1H NMR spectroscopy. Example 6 [0037] To LiAl(I)4 (0.40 g, 0.74 mmol) in 1.0 ml benzene-d6 was added SiHCl3 (0.10 g SiHCl3, 0.74 mmol SiHCl3). The mixture was stirred at 60 °C for 45 minutes. The mixture was placed in an NMR tube and there was insoluble material present. Conversion of SiHCl3 to SiHI3 was determined by analysis of the 1H NMR spectrum of the reaction mixture. After 45 minutes of reaction time the distribution of reaction products was 61% SiHI3 with 23.3% SiHCl3. There were also mixed ligand species present in the following amounts: 6.9% SiH(Cl)2(I) and 8.8% SiH(Cl)(I)2. Example 7 [0038] A summary of reactions and conditions generating diiodosilane from dichorosilane with aluminate coreactants are presented in Table 1. The reactions were carried out by addition of one equivalent of dichlorosilane to two equivalents of the indicated, in situ generated, iodoaluminate under the conditions described. The percent conversion to diiodosilane was determined by analysis of 1H NMR spectra of the reaction mixtures. Table 1
Figure imgf000013_0001
Example 8 [0039] A summary of reactions and conditions generating diiodosilane from dichorosilane with various reagents is presented in Table 2. The reactions were carried out by addition of a 25% dichlorosilane/xylene solution to the indicated iodide source in benzene- d6. The reaction time and temperatures are indicated and the percent conversion to diiodosilane was determined by 1H NMR spectroscopy. The indicated equivalents (eq) of reagent used are with respect to using one equivalent of dichlorosilane in each reaction presented.
Table 2
Figure imgf000014_0001
Example 9 [0040] A summary of reaction conditions for conversion of trichlorsilane to triiodosilane using Al(I)3 or aluminate reagents is presented in Table 3. Reactions were carried out in C6D6 at 100°C in sealed containers for 16 hours. The percent distribution of silane products was determined by 1H NMR spectroscopy. The indicated equivalents (eq) of reagent used are with respect to using one equivalent of dichlorosilane in each reaction. Table 3
Figure imgf000015_0001
Example 10 [0041] A summary of reaction conditions for conversion of trichlorsilane to triiodosilane using various in situ generated aluminates is shown in Table 4 with relevant reaction conditions. An equimolar ratio of reactants was used and the percent conversion to the indicated silanes was determined by 1H NMR spectroscopy. Table 4
Figure imgf000015_0002
Example 11 [0042] A summary of reaction parameters for the conversion of trichlorsilane to triiodosilane using MgI2, CaI2, ZnI2, and AlI3 as the ‘sole’ reactants in solution. The indicated percent conversions were determined by 1H NMR spectroscopy. The indicated equivalents (eq) of iodine-containing reagent used are relative to using one equivalent of dichlorosilane in each reaction. Only AlI3 reagent yields SiHI3 under these reaction conditions. Table 5
Figure imgf000016_0001
Example 12 [0043] In a typical procedure used to generate SiH2I2 iodine (335 grams, 1.32 mol) was charged into a flask and toluene was added to make a concentrated solution. To a separate flask was charged aluminum (25 grams, 0.926 mol, 20-40 mesh) and toluene was added to make a slurry. At an internal temperature of 45°C the iodine solution was slowly added to the aluminum over 3 hours, maintaining an internal temperature of 45-55°C. The residual undissolved iodine was dissolved in toluene and charged into the reaction mixture repeatedly until no iodine remained. After the complete addition of iodine, the reaction mixture was stirred at 45-50°C for 2 hours, followed by stirring for 12 hours at room temperature. The volatiles were removed in vacuo at 40°C to leave a concentrated mixture. Hexanes were added to the mixture to further precipitate the solid Al(I)3. The solid Al(I)3 was rinsed with hexanes twice and resuspended in hexanes to give an Al(I)3 suspension. To the Al(I)3 suspension was added SiH2Cl2 (135 grams, 1.33 mol) over 5 minutes. The reaction mixture was stirred at 20°C for 1 hour, and then was heated to 35°C for 3 hours. The reaction mixture was cooled to 20°C and filtered. The solids were rinsed three times with hexanes and the filtrates were combined. The filtrate was analyzed and revealed 75% conversion to SiH2I2. The volatiles were removed in a distillation system at 50-300torr and an internal temperature of 35-50°C. The product was distilled at 45-50°C at 8-20 Torr to afford 192 grams of SiH2I2 in 52% yield. [0044] The invention has been described in detail with particular reference to certain embodiments thereof, but it will be understood that variations and modifications can be affected within the spirit and scope of the invention. Having thus described several illustrative embodiments of the present disclosure, those of skill in the art will readily appreciate that yet other embodiments may be made and used within the scope of the claims hereto attached. Numerous advantages of the disclosure covered by this document have been set forth in the foregoing description. It will be understood, however, that this disclosure is, in many respects, only illustrative. Changes may be made in details, particularly in matters of shape, size, and arrangement of parts without exceeding the scope of the disclosure. The disclosure’s scope is, of course, defined in the language in which the appended claims are expressed

Claims

Claims 1. A method for preparing an iodosilane having the formula (I) or (II) SiRxIy (I), or IyRxSi-Si RxIy (II), wherein x is 1, or 2, y is an integer of from 1 to 3, and wherein the sum of x plus y is 4 in formula (I) and 3 in formula (II) at each Si center, and wherein R is hydrogen or a C1-C6 alkyl group; which comprises contacting a halosilane having the formula SiRxDy or DyRxSi-SiRxDy, wherein D is chloro or bromo, with an iodide reactant comprising aluminum.
2. The method of claim 1, wherein y is 2.
3. The method of claim 1, wherein the iodide reactant comprising aluminum is a compound having the formula (A): [M+q]z[Al(X)3Iw]q (A), wherein z is 0 or 1, w is 0 or 1, M is chosen from (i) Group 1 metal cations chosen from Li+, Na+, K+, Rb+, and Cs+; (ii) Group 2 metal cations chosen from Mg2+, Ca2+, Sr2+, and Ba2+; and (iii) ammonium, C1-C6 alkyl, or benzyl ammonium cations; q is the valence of M and is 1 or 2, and X is chloro, bromo, or iodo, provided that when z and w are zero, X is iodo.
4. The method of claim 3, wherein z is 1 and w is 1.
5. The method of claim 4, wherein M is Li+ or Na+.
6. The method of claim 4, wherein M is chosen from NH4+, (CH3)4N+, (CH3CH2)4N+, (CH3CH2CH2)4N+, and (CH3CH2CH2CH2)4N+.
7. The method of claim 3 wherein M is Mg+2 or Ca+2.
8. The method of claim 1, wherein the iodide reactant comprising aluminum is aluminum triiodide.
9. The method of claim 8, wherein the aluminum triiodide is generated in situ from aluminum metal and iodine.
10. The method of claim 3, wherein the compound of formula (A) is chosen from LiAl(I)4, NaAl(I)4, KAl(I)4, Mg[Al(I)4]2, Ca[Al(I)4]2, LiAl(Cl)3I, LiAlCl(I)3, NaAl(Cl)3I, NaAlCl(I)3, KAl(Cl)3I, KAlCl(I)3, Mg[Al(Cl)3I]2, Mg[Al(Cl)(I)3]2, Ca[Al(Cl)3I]2, Ca[Al(Cl)(I)3]2, NH4Al(I)4, NH4Al(Cl)3I, NH4Al(Cl)(I)3, NaAl2I7, NaAl3I10, and Al(I)3.
11. The method of claim 1, wherein the iodide reactant comprising aluminum is a compound of the formula MAlmIn, wherein M is an alkali metal, and m is 2 and n is 7, or m is 3 and n is 10.
12. The method of claim 11, wherein the iodide reactant is a compound of the formula NaAl2I7.
13. The method of claim 11, wherein the iodide reactant is a compound of the formula NaAl3I10.
14. The method of claim 3, wherein the iodide reactant comprising aluminum is generated in situ from a. AlX3 and M+qXq; b. Alo, X2, and M+qXq; c. AlX3, Mo, and X2; or d. Alo, Mo, and X2, wherein q represents the valence of M.
15. The method of claim 1, wherein the compound of formula (I) is chosen from SiHI3, SiH2I2, SiH3I, SiH2CH3I, SiH2(CH2CH3)I, SiH2(CH2CH2CH3)I, SiH2((CH3)2CH)I, SiH2(CH2CH2CH2CH3)I, SiH2((CH3)3C)I, SiHCH3I2, SiH(CH2CH3)I2, SiH(CH2CH2CH3)I2, SiH((CH3)2CH)I2, SiH(CH2CH2CH2CH3)I2, SiH((CH3)3C)I2, SiCH3I3, Si(CH2CH3)I3, Si(CH2CH2CH3)I3, Si((CH3)2CH)I3, Si(CH2CH2CH2CH3)I3, Si((CH3)3C)I3, I3Si-SiI3. I2CH3Si-SiCH3I2, I2(CH3CH2)Si-Si(CH2CH3)I2, I2(CH3CH2CH2)Si-Si(CH2CH2CH3)I2, I2((CH3)2CH)Si-Si((CH3)2CH)I2, I2(CH3CH2CH2CH2)Si-Si(CH2CH2CH2CH3)I2, I2((CH3)3C)Si-Si((CH3)3C)I2, ICH3HSi-SiHCH3I, I(CH2CH3)HSi-SiH(CH2CH3)I, I(CH2CH2CH3)HSi-SiH(CH2CH2CH3)I, I((CH3)2CH)HSi-SiH((CH3)2CH)I, I(CH2CH2CH2CH3)HSi-SiH(CH2CH2CH2CH3)I, and I((CH3)3C)HSi-SiH((CH3)3C)I.
16. The method of claim 1, wherein the compound of formula (I) is H2SiI2.
17. The method of claim 16, wherein the iodide reactant comprising aluminum is Al(I)3.
18. The compound of claim 1, wherein the compound of formula (I) is HSiI3.
19. A precursor composition comprising a compound of the formula SiH2I2, having less than 1 ppm of antimony, silver, or copper impurities and less than about 1 ppm of sodium or lithium impurities.
20. A precursor composition comprising a compound of the formula SiH2I2, having less than about 10 ppb (parts per billion) of aluminum impurities.
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