WO2021153210A1 - Tire - Google Patents

Abstract

This tire is for a moving body, and comprises a sensor on the inside thereof. The sensor includes: a first insulating layer that has one side serving as a force input side and has the other side provided with a plurality of first resistance parts arranged thereon with a longitudinal direction facing a first direction; a second insulating layer that has one side provided with a plurality of second resistance parts arranged thereon with the longitudinal direction facing the first direction; and a member that is arranged between the other side of the first insulating layer and the one side of the second insulating layer and is elastically deformed in response to a force, wherein each of the first resistance parts and each of the second resistance parts are arranged to face each other with the member therebetween, a pair of electrodes are provided at both end portions of each of the first resistance parts and each of the second resistance parts, and the difference between a resistance value between the pair of electrodes of the first resistance parts and a resistance value between the pair of electrodes of the second resistance parts facing the first resistance parts continuously changes according to the elastic deformation of the member.

Description

tire

The present invention relates to a tire provided with a sensor.

A slip phenomenon occurs when tires with few grooves are used or when there is little friction between the tire and the road surface, but if the vehicle body slips even once, it will cause a major accident or catastrophe. It is very dangerous. Therefore, it is preferable to detect tire slippage and perform some control on the vehicle body based on the detection result.

Examples of the device for detecting the slip of the tire include a device for acquiring the contact state of the tire with respect to the road surface by embedding a strain sensor in the tread portion (see, for example, Patent Document 1).

Patent No. 4349151

However, with the conventional strain sensor, only partial strain of the tire can be detected, and it is difficult to detect the slip of the tire with high accuracy.

The present invention has been made in view of the above points, and an object of the present invention is to provide a tire equipped with a sensor capable of detecting slippage with high accuracy.

This tire is a tire for a moving body, and a sensor is provided inside the tire. One side of the sensor is a force input side, and the sensor is juxtaposed on the other side with the longitudinal direction facing the first direction. A first insulating layer having a plurality of first resistance portions, a second insulating layer having a plurality of second resistance portions juxtaposed on one side with the longitudinal direction facing the first direction, and the above. It has a member which is arranged between the other side of the first insulating layer and one side of the second insulating layer and elastically deforms in response to the force, and each of the first resistance portions and each of them. The second resistance portion is arranged so as to face each other via the member, and a pair of electrodes are provided at both ends of each of the first resistance portion and each of the second resistance portions, and the first resistance portion is provided. The difference between the resistance value between the pair of electrodes of the resistance portion and the resistance value between the pair of electrodes of the second resistance portion facing the first resistance portion is continuous according to the elastic deformation of the member. Change.

According to the disclosed technology, it is possible to provide a tire equipped with a sensor that can detect slippage with high accuracy.

It is sectional drawing (the 1) which illustrates the tire which concerns on 1st Embodiment. It is sectional drawing (the 2) which illustrates the tire which concerns on 1st Embodiment. It is a top view which illustrates the sensor which concerns on 1st Embodiment. It is sectional drawing (the 1) which illustrates the sensor which concerns on 1st Embodiment. It is sectional drawing (the 2) which illustrates the sensor which concerns on 1st Embodiment. It is a block diagram which illustrates the sensor module which concerns on 1st Embodiment. It is a block diagram which illustrates the control device of the sensor module which concerns on 1st Embodiment. It is sectional drawing which shows typically the state which the force was applied to the sensor. It is a top view (the 1) which illustrates the sensor which concerns on the modification 1 of the 1st Embodiment. It is sectional drawing (the 1) which illustrates the sensor which concerns on the modification 1 of the 1st Embodiment. It is a top view (No. 2) which illustrates the sensor which concerns on the modification 1 of 1st Embodiment. It is sectional drawing (the 2) which illustrates the sensor which concerns on the modification 1 of the 1st Embodiment. It is a top view which illustrates the sensor which concerns on the modification 2 of 1st Embodiment. It is sectional drawing which illustrates the sensor which concerns on the modification 2 of 1st Embodiment. It is a top view (the 1) which illustrates the sensor which concerns on the modification 3 of the 1st Embodiment. It is sectional drawing which illustrates the sensor which concerns on modification 3 of 1st Embodiment. It is a top view (No. 2) which illustrates the sensor which concerns on the modification 3 of the 1st Embodiment.

Hereinafter, a mode for carrying out the invention will be described with reference to the drawings. In each drawing, the same components may be designated by the same reference numerals and duplicate description may be omitted.

<First Embodiment>
FIG. 1 is a cross-sectional view (No. 1) illustrating the tire according to the first embodiment, and shows a cross section of the tire cut in the width direction. FIG. 2 is a cross-sectional view (No. 2) illustrating the tire according to the first embodiment, and shows a cross section of the tire cut at the center in the width direction in the direction perpendicular to the width direction. Note that FIG. 2 has a different scale from that of FIG. 1, and some of the components shown in FIG. 1 are omitted.

As shown in FIGS. 1 and 2, the tire 100 has a tread portion 110, left and right sidewall portions 120, and left and right bead portions 130. The tread portion 110 is a portion of the tire 100 in contact with the road surface. The sidewall portion 120 is a portion that becomes a side surface of the tire 100. The bead portion 130 is a portion for fixing the tire 100 to the rim of the wheel.

An inner liner 140 is provided inside the tire 100. The inner liner 140 is, for example, a layer made of rubber. On the outside of the inner liner 140, a carcass 150 extending between the left and right bead portions 130 through the tread portion 110 and the left and right sidewall portions 120 is provided. The carcass 150 is, for example, a layer in which fibers or steel is coated with rubber. Both ends of the carcass 150 are folded back so as to sandwich the bead core 160 and the bead filler 170. A plurality of belts 180 are provided on the outer peripheral side of the carcass 150 of the tread portion 110.

The sensor 1 is attached to the outer peripheral side of the inner liner 140 (the side far from the center of the tire 100). The sensor 1 is attached to the entire outer peripheral side of the inner liner 140 in the width direction and the entire circumferential direction, and is embedded between the outermost circumference (the surface in contact with the road surface) of the tire 100 and the outer side of the inner liner 140 for use.

The sensor 1 is provided to detect the strain of the tire 100 due to the force acting laterally on the tire 100 when the tire 100 is mounted on a moving body such as an automobile and traveling. That is, by monitoring the output of the sensor 1 while the moving body is traveling, the side slip of the tire 100 can be detected. The moving body refers to an object that can be moved by mounting the tire 100, such as an automobile, a motorcycle, or a robot.

FIG. 3 is a plan view illustrating the sensor according to the first embodiment. FIG. 4 is a cross-sectional view illustrating the sensor according to the first embodiment, and shows a cross-sectional view taken along the line AA of FIG.

3 and 4 show the state before the sensor 1 is arranged on the tire 100. Further, the X direction corresponds to the width direction of the tire 100, the Y direction corresponds to the circumferential direction of the tire 100, and the Z direction corresponds to the radial direction of the tire 100.

With reference to FIGS. 3 and 4, the sensor 1 has base materials 11 and 12, resistance portions 31 and 32, terminal portions 41 and 42, and a member 51. The sensor 1 is arranged on the tire 100 with the longitudinal direction (Y direction) of the plurality of juxtaposed resistance portions 31 and 32 facing the circumferential direction of the tire 100. Here, it is assumed that the base material 11 side of the sensor 1 is arranged so as to face the inner liner 140 side.

In the present embodiment, for convenience, in the sensor 1, the side of the base material 11 where the resistance portion 31 is not provided is the upper side or one side, and the side of the base material 12 where the resistance portion 32 is not provided is the lower side or. The other side. Further, the surface of the base material 11 of each portion on which the resistance portion 31 is not provided is defined as one surface or upper surface, and the surface of the base material 12 on which the resistance portion 32 is not provided is defined as the other surface or lower surface. .. However, the sensor 1 can be used in an upside-down state, or can be arranged at an arbitrary angle. Further, the plan view means that the object is viewed from the normal direction of the upper surface 11a of the base material 11, and the planar shape refers to the shape of the object viewed from the normal direction of the upper surface 11a of the base material 11. And.

In the sensor 1, the base material 11 having the resistance portion 31 formed on the lower surface 11b and the base material 12 having the resistance portion 32 formed on the upper surface 12a form a member 51 elastically deformable between the lower surface 11b and the upper surface 12a. It is a structure that is sandwiched and laminated. The respective resistance portions 31 and the respective resistance portions 32 are arranged so as to face each other via the member 51. Terminals 41, which are a pair of electrodes, are provided at both ends of each resistance portion 31, and terminal portions 42, which are a pair of electrodes, are provided at both ends of each resistance portion 32.

In the sensor 1, when the upper surface 11a of the base material 11 becomes the input side of the force (shearing force or compressive force) and the force acting on the tire 100 is applied to the base material 11, the member 51 responds to the force applied to the base material 11. Elastically deforms. Here, the shearing force is a force in the direction parallel to the upper surface 11a of the base material 11, and the compressive force is a force in the direction perpendicular to the upper surface 11a of the base material 11.

The difference between the resistance value between the pair of terminal portions 41 of the resistance portion 31 and the resistance value between the pair of terminal portions 42 of the resistance portion 32 facing the resistance portion 31 depends on the elastic deformation of the member 51 due to the shearing force. And change continuously. The side slip (slip in the X direction) of the tire 100 can be detected based on the change in the difference in resistance values.

Further, the sum of the resistance value between the pair of terminal portions 41 of the resistance portion 31 and the resistance value between the pair of terminal portions 42 of the resistance portion 32 facing the resistance portion 31 is the elastic deformation of the member 51 due to the compressive force. It changes continuously according to. Based on the change in the sum of the resistance values, the magnitude of the pressing force received by the base material 11 from the inner liner 140 can be detected. Each component will be described in detail below.

The base material 11 is an insulating member that serves as a base layer for forming the resistance portion 31 and the like, and has flexibility. The thickness of the base material 11 is not particularly limited and may be appropriately selected depending on the intended purpose, but may be, for example, about 5 μm to 500 μm. In particular, when the thickness of the base material 11 is 5 μm to 200 μm, the strain sensitivity error of the resistance portion 31 can be reduced, which is preferable.

The plurality of resistance portions 31 are thin films juxtaposed in the X direction at predetermined intervals with the longitudinal direction facing the Y direction on the lower surface 11b of the base material 11 which is an insulating layer, and are continuous according to the elastic deformation of the member 51. It is a sensitive part whose resistance value changes. The resistance portion 31 may be formed directly on the lower surface 11b of the base material 11, or may be formed on the lower surface 11b of the base material 11 via another layer. In FIG. 3, for convenience, the resistance portion 31 is shown in a satin pattern.

The base material 12 is an insulating member that serves as a base layer for forming the resistance portion 32 and the like, and has flexibility. The thickness of the base material 12 is not particularly limited and may be appropriately selected depending on the intended purpose, but may be, for example, about 5 μm to 500 μm. In particular, when the thickness of the base material 12 is 5 μm to 200 μm, the strain sensitivity error of the resistance portion 32 can be reduced, which is preferable.

The plurality of resistance portions 32 are thin films juxtaposed in the X direction at predetermined intervals with the longitudinal direction facing the Y direction on the upper surface 12a of the base material 12 which is an insulating layer, and the respective resistance portions 31 are arranged via the member 51. It is arranged facing the. Each resistance portion 32 is a sensitive portion whose resistance value continuously changes according to the elastic deformation of the member 51, but even if the member 51 is elastically deformed by the shearing force, the resistance portion 32 is hardly distorted and is a resistance portion. The resistance value of 32 hardly changes. The resistance portion 32 may be formed directly on the upper surface 12a of the base material 12, or may be formed on the upper surface 12a of the base material 12 via another layer.

The base materials 11 and 12 are, for example, PI (polyetherketone) resin, epoxy resin, PEEK (polyetheretherketone) resin, PEN (polyetherketone) resin, PET (polyethylene terephthalate) resin, PPS (polyphenylene sulfide) resin, and polyolefin. It can be formed from an insulating resin film such as resin. The film refers to a member having a thickness of about 500 μm or less and having flexibility.

Here, "forming from an insulating resin film" does not prevent the base materials 11 and 12 from containing fillers, impurities, etc. in the insulating resin film. The base materials 11 and 12 may be formed from, for example, an insulating resin film containing a filler such as silica or alumina.

Materials other than the resins of the base materials 11 and 12 include, for example, SiO ₂ , ZrO ₂ (including YSZ), Si, Si ₂ N ₃ , Al ₂ O ₃ (including sapphire), ZnO, and perovskite ceramics (CaTIO). _3. Crystalline materials such as BaTIO ₃ ) can be mentioned, and amorphous glass and the like can be mentioned in addition to the above. Further, as the material of the base materials 11 and 12, metals such as aluminum, aluminum alloy (duralumin), and titanium may be used. In this case, for example, an insulating film is formed on the metal substrates 11 and 12.

The resistance portions 31 and 32 can be formed from, for example, a material containing Cr (chromium), a material containing Ni (nickel), or a material containing both Cr and Ni. That is, the resistance portions 31 and 32 can be formed from a material containing at least one of Cr and Ni. Examples of the material containing Cr include a Cr mixed phase film. Examples of the material containing Ni include Cu—Ni (copper nickel). Examples of the material containing both Cr and Ni include Ni—Cr (nickel chromium).

Here, the Cr multiphase film, Cr, CrN, Cr ₂ N or the like is film multiphase. The Cr mixed phase film may contain unavoidable impurities such as chromium oxide.

The thicknesses of the resistance portions 31 and 32 are not particularly limited and can be appropriately selected depending on the intended purpose, but can be, for example, about 0.05 μm to 2 μm. In particular, when the thickness of the resistance portions 31 and 32 is 0.1 μm or more, the crystallinity of the crystals constituting the resistance portions 31 and 32 (for example, the crystallinity of α-Cr) is improved, which is preferable. Further, when the thickness of the resistance portions 31 and 32 is 1 μm or less, cracks in the film due to internal stress of the films constituting the resistance portions 31 and 32 and warpage from the base material 11 and the base material 12 can be reduced. Is even more preferable.

The widths of the resistance portions 31 and 32 are not particularly limited and can be appropriately selected depending on the intended purpose, but can be, for example, about 0.1 μm to 1000 μm (1 mm). The pitches of the adjacent resistance portions 31 and 32 are not particularly limited and may be appropriately selected depending on the intended purpose, but may be, for example, about 1 mm to 100 mm. In addition, about several hundred to several thousand resistance portions 31 and 32 are actually provided.

For example, when the resistance portions 31 and 32 are Cr mixed-phase films, the temperature coefficient of the resistance portions 31 and 32 can be stabilized or applied by using α-Cr (alpha chromium), which is a stable crystal phase, as a main component. It is possible to improve the sensitivity of the resistance portions 31 and 32 to the applied force. Here, the main component means that the target substance occupies 50% by mass or more of all the substances constituting the resistance portion. From the viewpoint of stabilizing the temperature coefficient of the resistance portions 31 and 32 and improving the sensitivity of the resistance portions 31 and 32 to the sliding force, the resistance portions 31 and 32 preferably contain 80% by weight or more of α-Cr. It is more preferable to contain 90% by weight or more. In addition, α-Cr is Cr of a bcc structure (body-centered cubic lattice structure).

When the resistance portions 31 and 32 are Cr mixed-phase films, the Cr _{N and Cr 2} N contained in the Cr mixed-phase film are preferably 20% by weight or less. _{When Cr N and Cr 2} N contained in the Cr mixed phase film are 20% by weight or less, a decrease in the gauge ratio can be suppressed.

Further, it is preferable that the proportion of Cr ₂ N in CrN and Cr ₂ N is less than 80 wt% to 90 wt%, more preferably less than 90 wt% to 95 wt%. _{When the ratio of Cr 2} N in Cr N and Cr ₂ N is 90% by weight or more and less than 95% by weight, the decrease in TCR (negative TCR) becomes more remarkable due _{to Cr 2 N having semiconducting properties.} .. Further, by reducing the ceramicization, brittle fracture is reduced.

On the other hand, when a small amount of N ₂ or atomic N is mixed and present in the film, the film stress changes when they escape to the outside of the film due to an external environment (for example, in a high temperature environment). By creating chemically stable CrN, a stable strain gauge can be obtained without generating the unstable N.

The terminal portion 41 extends from both ends of the respective resistance portions 31 on the lower surface 11b of the base material 11, and is wider than the resistance portion 31 and formed in a substantially rectangular shape in a plan view. The terminal portion 41 is a pair of electrodes for outputting a change in the resistance value of the resistance portion 31 caused by elastic deformation of the member 51 to the outside. For example, a flexible substrate for external connection, a lead wire, or the like is joined. .. The upper surface of the terminal portion 41 may be coated with a metal having better solderability than the terminal portion 41. Although the resistance portion 31 and the terminal portion 41 have different reference numerals for convenience, they can be integrally formed of the same material in the same process.

The terminal portion 42 extends from both ends of each resistance portion 32 on the upper surface 12a of the base material 12, and is wider than the resistance portion 32 and formed in a substantially rectangular shape in a plan view. The terminal portion 42 is a pair of electrodes for outputting a change in the resistance value of the resistance portion 32 to the outside, and for example, a flexible substrate for external connection, a lead wire, or the like is joined. The upper surface of the terminal portion 42 may be coated with a metal having better solderability than the terminal portion 42. Although the resistance portion 32 and the terminal portion 42 have different reference numerals for convenience, they can be integrally formed of the same material in the same process.

It should be noted that a through wiring (through hole) penetrating the base material 11 and the base material 12 may be provided, and the terminal portions 41 and 42 may be moved to the upper surface 11a side of the base material 11 or the lower surface 12b side of the base material 12.

A cover layer (insulating resin layer) may be provided on the lower surface 11b of the base material 11 so as to cover the resistance portion 31 and expose the terminal portion 41. Further, a cover layer (insulating resin layer) may be provided on the upper surface 12a of the base material 12 so as to cover the resistance portion 32 and expose the terminal portion 42. By providing the cover layer, it is possible to prevent mechanical damage or the like from occurring in the resistance portions 31 and 32. Further, by providing the cover layer, the resistance portions 31 and 32 can be protected from moisture and the like. The cover layer may be provided so as to cover the entire portion excluding the terminal portions 41 and 42.

The cover layer can be formed of, for example, an insulating resin such as PI resin, epoxy resin, PEEK resin, PEN resin, PET resin, PPS resin, and composite resin (for example, silicone resin and polyolefin resin). The cover layer may contain a filler or a pigment. The thickness of the cover layer is not particularly limited and may be appropriately selected depending on the intended purpose, but can be, for example, about 2 μm to 30 μm.

The member 51 is arranged between the lower surface 11b side of the base material 11 and the upper surface 12a side of the base material 12, and when a force is applied to the base material 11, the member 51 elastically deforms according to the force applied to the base material 11. be. Examples of the material of the member 51 include silicone rubber, acrylic rubber, urethane rubber and the like. The thickness of the member 51 is not particularly limited and may be appropriately selected depending on the intended purpose, but may be, for example, about 5 μm to 500 μm.

In order to manufacture the sensor 1, first, the base material 11 is prepared, and the planar resistance portion 31 and the terminal portion 41 shown in FIG. 3 are formed on the lower surface 11b of the base material 11. The materials and thicknesses of the resistance portion 31 and the terminal portion 41 are as described above. The resistance portion 31 and the terminal portion 41 can be integrally formed of the same material.

The resistance portion 31 and the terminal portion 41 can be formed, for example, by forming a film by a magnetron sputtering method targeting a raw material capable of forming the resistance portion 31 and the terminal portion 41 and patterning the resistance portion 31 and the terminal portion 41 by photolithography. The resistance portion 31 and the terminal portion 41 may be formed by a reactive sputtering method, a vapor deposition method, an arc ion plating method, a pulse laser deposition method, or the like, instead of the magnetron sputtering method.

From the viewpoint of stabilizing the temperature coefficient of the resistance portion 31 and improving the sensitivity of the resistance portion 31 to the applied force, a predetermined film thickness is used as the base layer before the resistance portion 31 and the terminal portion 41 are formed. It is preferable to form a vacuum film on the functional layer of. The functional layer can be formed by, for example, a conventional sputtering method. After forming the resistance portion 31 and the terminal portion 41 on the entire upper surface of the functional layer, the functional layer is patterned together with the resistance portion 31 and the terminal portion 41 in the planar shape shown in FIG. 3, for example, by photolithography.

In the present application, the functional layer refers to a layer having a function of promoting crystal growth of at least an upper resistance portion. It is preferable that the functional layer further has a function of preventing oxidation of the resistance portion by oxygen and moisture contained in the base material 11 and a function of improving the adhesion between the base material 11 and the resistance portion. The functional layer may further have other functions.

Since the insulating resin film constituting the base material 11 contains oxygen and water, especially when the resistance portion contains Cr, Cr forms a self-oxidizing film, so that the functional layer has a function of preventing oxidation of the resistance portion. Is valid.

The material of the functional layer is not particularly limited as long as it has a function of promoting crystal growth of at least the upper resistance portion, and can be appropriately selected depending on the intended purpose. For example, Cr (chromium) and Ti (tungsten). ), V (vanadium), Nb (niobium), Ta (tantalum), Ni (nickel), Y (ittrium), Zr (zylonium), Hf (hafnium), Si (silicon), C (carbon), Zn (zinc) ), Cu (copper), Bi (bismus), Fe (iron), Mo (molybdenum), W (tungsten), Ru (ruthenium), Rh (rodium), Re (renium), Os (osmium), Ir (iridium) ), Pt (platinum), Pd (palladium), Ag (silver), Au (gold), Co (cobalt), Mn (manganese), Al (aluminum). , Alloys of any metal in this group, or compounds of any metal in this group.

Examples of the above alloy include FeCr, TiAl, FeNi, NiCr, CrCu and the like. Examples of the above-mentioned compounds include TiN, TaN, Si ₃ N ₄ , TiO ₂ , Ta ₂ O ₅ , SiO _{2, and the} like.

When the functional layer is formed of a conductive material such as metal or alloy, the film thickness of the functional layer is preferably 1/20 or less of the film thickness of the resistance portion. Within such a range, the crystal growth of α—Cr can be promoted, and a part of the current flowing through the resistance portion can be prevented from flowing to the functional layer to reduce the strain detection sensitivity.

When the functional layer is formed of a conductive material such as metal or alloy, the film thickness of the functional layer is more preferably 1/50 or less of the film thickness of the resistance portion. Within such a range, the crystal growth of α-Cr can be promoted, and a part of the current flowing through the resistance portion can be prevented from flowing to the functional layer to further prevent the strain detection sensitivity from being lowered.

When the functional layer is formed of a conductive material such as metal or alloy, the film thickness of the functional layer is more preferably 1/100 or less of the film thickness of the resistance portion. Within such a range, it is possible to further prevent a part of the current flowing through the resistance portion from flowing to the functional layer and the strain detection sensitivity from being lowered.

When the functional layer is formed from an insulating material such as an oxide or a nitride, the film thickness of the functional layer is preferably 1 nm to 1 μm. Within such a range, the crystal growth of α—Cr can be promoted, and a film can be easily formed without cracking in the functional layer.

When the functional layer is formed from an insulating material such as an oxide or a nitride, the film thickness of the functional layer is preferably 1 nm to 0.8 μm. Within such a range, the crystal growth of α-Cr can be promoted, and the functional layer can be more easily formed without cracks.

When the functional layer is formed from an insulating material such as an oxide or a nitride, the film thickness of the functional layer is more preferably 1 nm to 0.5 μm. Within such a range, the crystal growth of α—Cr can be promoted, and the film can be formed more easily without cracking the functional layer.

The planar shape of the functional layer is patterned substantially the same as the planar shape of the resistance portion shown in FIG. 3, for example. However, the planar shape of the functional layer is not limited to the case where it is substantially the same as the planar shape of the resistance portion. When the functional layer is formed of an insulating material, it does not have to be patterned in the same shape as the planar shape of the resistance portion. In this case, the functional layer may be formed in a solid shape at least in the region where the resistance portion is formed. Alternatively, the functional layer may be formed in a solid shape on the entire upper surface of the base material 10.

Further, when the functional layer is formed from an insulating material, the thickness and surface area of the functional layer can be increased by forming the functional layer relatively thick so as to be 50 nm or more and 1 μm or less and forming the functional layer in a solid shape. Since it increases, the heat generated when the resistance portion generates heat can be dissipated to the base material 10 side. As a result, in the sensor 1, it is possible to suppress a decrease in measurement accuracy due to self-heating of the resistance portion.

For example, the functional layer can be vacuum-deposited by a conventional sputtering method in which Ar (argon) gas is introduced into the chamber, targeting a raw material capable of forming the functional layer. By using the conventional sputtering method, the functional layer is formed while etching the lower surface 11b of the base material 11 with Ar, so that the film forming amount of the functional layer can be minimized and the adhesion improving effect can be obtained.

However, this is an example of a method for forming a functional layer, and the functional layer may be formed by another method. For example, the effect of improving adhesion is obtained by activating the lower surface 11b of the base material 11 by plasma treatment using Ar or the like before the film formation of the functional layer, and then the functional layer is vacuum-deposited by the magnetron sputtering method. You may use the method of

The combination of the material of the functional layer and the material of the resistance portion 31 and the terminal portion 41 is not particularly limited and can be appropriately selected according to the purpose. For example, Ti can be used as the functional layer, and a Cr mixed phase film containing α-Cr (alpha chromium) as a main component can be formed as the resistance portion 31 and the terminal portion 41.

In this case, for example, the resistance portion 31 and the terminal portion 41 can be formed by a magnetron sputtering method in which Ar gas is introduced into the chamber by targeting a raw material capable of forming a Cr mixed phase film. Alternatively, pure Cr may be targeted, an appropriate amount of nitrogen gas may be introduced into the chamber together with Ar gas, and the resistance portion 31 and the terminal portion 41 may be formed by a reactive sputtering method. At this time, by adjusting the heating temperature provided that and heating step of changing the introduction amount and pressure of nitrogen gas (nitrogen partial pressure), the proportion of CrN and Cr 2 _N contained in Cr multiphase film, and CrN and Cr Cr ₂ N ratio of in ₂ N can be adjusted.

In these methods, the growth surface of the Cr mixed-phase film is defined by the functional layer made of Ti, and a Cr mixed-phase film containing α-Cr as a main component, which has a stable crystal structure, can be formed. Further, by diffusing Ti constituting the functional layer in the Cr mixed phase film, it is possible to stabilize the temperature coefficient of the resistance portion 31 and improve the sensitivity of the resistance portion 31 to the applied force. When the functional layer is made of Ti, the Cr mixed phase film may contain Ti or TiN (titanium nitride).

When the resistance portion 31 is a Cr mixed-phase film, the functional layer made of Ti has a function of promoting crystal growth of the resistance portion 31 and a function of preventing oxidation of the resistance portion 31 by oxygen or moisture contained in the base material 11. , And all the functions of improving the adhesion between the base material 11 and the resistance portion 31. The same applies when Ta, Si, Al, or Fe is used as the functional layer instead of Ti.

By providing the functional layer under the resistance portion 31 in this way, the crystal growth of the resistance portion 31 can be promoted, and the resistance portion 31 composed of a stable crystal phase can be produced. As a result, in the sensor 1, the temperature coefficient of the resistance portion 31 can be stabilized and the sensitivity of the resistance portion 31 to the applied force can be improved. Further, by diffusing the material constituting the functional layer into the resistance portion 31, it is possible to stabilize the temperature coefficient of the resistance portion 31 and improve the sensitivity of the resistance portion 31 to the applied force in the sensor 1.

Next, the base material 12 is prepared, and the resistance portion 32 and the terminal portion 42 are formed on the upper surface 12a of the base material 12. The resistance portion 32 and the terminal portion 42 can be formed in the same manner as the resistance portion 31 and the terminal portion 41. Similarly, it is preferable to form a functional layer on the upper surface 12a of the base material 12 as a base layer before forming the resistance portion 32 and the terminal portion 42.

After forming the resistance portion 31 and the terminal portion 41 and the resistance portion 32 and the terminal portion 42, a cover layer may be provided on the lower surface 11b of the base material 11 to cover the resistance portion 31 and expose the terminal portion 41, if necessary. Further, the upper surface 12a of the base material 12 may be provided with a cover layer that covers the resistance portion 32 and exposes the terminal portion 42.

The cover layer can be produced, for example, by coating the lower surface 11b of the base material 11 with the resistance portion 31 and laminating a thermosetting insulating resin film in a semi-cured state so as to expose the terminal portion 41, and heating and curing the cover layer. .. Further, the cover layer is, for example, laminated with a thermosetting insulating resin film in a semi-cured state so as to cover the upper surface 12a of the base material 12 with the resistance portion 32 and expose the terminal portion 42, and heat and cure the cover layer. Can be made. The cover layer may be produced by applying a liquid or paste-like thermosetting insulating resin instead of laminating the insulating resin film, and heating and curing the cover layer.

Next, the elastically deformable member 51 is prepared. Then, the base material 12 provided with the resistance portion 32 is arranged below the member 51 with the resistance portion 32 facing upward, and the base material 11 provided with the resistance portion 31 is placed with the resistance portion 31 facing downward. Place on top of. Then, the base materials 11 and 12 and the member 51 are adhered to each other. As a result, the sensor 1 is completed.

The base materials 11 and 12 and the member 51 can be adhered to each other via, for example, an adhesive layer. The adhesive layer is not particularly limited and may be appropriately selected depending on the intended purpose. For example, an epoxy resin, a modified epoxy resin, a silicone resin, a modified silicone resin, a urethane resin, a modified urethane resin or the like can be used.

When a functional layer is provided on the lower surface 11b of the base material 11 as a base layer of the resistance portion 31 and the terminal portion 41, and a functional layer is provided on the upper surface 12a of the base material 12 as a base layer of the resistance portion 32 and the terminal portion 42. The sensor 1 has the cross-sectional shape shown in FIG. The layers indicated by reference numerals 20a and 20b are functional layers. The planar shape of the sensor 1 when the functional layers 20a and 20b are provided is the same as that in FIG.

As shown in FIG. 6, the sensor module 8 can be realized by the sensor 1 and the control device 7. In the sensor module 8, each of the terminal portions 41 and 42 of the sensor 1 is connected to the control device 7 by using, for example, a flexible substrate or a lead wire.

The control device 7 can detect the coordinates of the position of the strain generated in the tire 100 and the skid caused in the tire 100 based on the information obtained via the terminal portions 41 and 42 of the sensor 1. For example, the resistance portions 31 and 32 of the sensor 1 can be used to detect the X coordinate.

As shown in FIG. 7, the control device 7 can be configured to include, for example, an analog front end unit 71 and a signal processing unit 72.

The analog front end unit 71 includes, for example, an input signal selection switch, a bridge circuit, an amplifier, an analog / digital conversion circuit (A / D conversion circuit), and the like. The analog front end portion 71 may include a temperature compensation circuit.

In the analog front end unit 71, for example, all the terminal units 41 and 42 of the sensor 1 are connected to the input signal selection switch, and a pair of electrodes is selected by the input signal selection switch. The pair of electrodes selected by the input signal selection switch is connected to the bridge circuit.

That is, one side of the bridge circuit is composed of a resistance portion between a pair of electrodes selected by the input signal selection switch, and the other three sides are composed of a fixed resistor. As a result, as the output of the bridge circuit, a voltage (analog signal) corresponding to the resistance value of the resistance portion between the pair of electrodes selected by the input signal selection switch can be obtained. The input signal selection switch can be controlled from the signal processing unit 72.

The voltage output from the bridge circuit is amplified by the amplifier, converted into a digital signal by the A / D conversion circuit, and sent to the signal processing unit 72. When the analog front end unit 71 includes a temperature compensation circuit, a temperature-compensated digital signal is sent to the signal processing unit 72. By switching the input signal selection switch at high speed, a digital signal corresponding to the resistance values of all the terminal units 41 and 42 of the sensor 1 can be sent to the signal processing unit 72 in an extremely short time.

The signal processing unit 72 can detect the coordinates of the position of the strain generated in the tire 100 and the skid caused in the tire 100 based on the information sent from the analog front end unit 71. Specifically, the signal processing unit 72 can detect the skid caused by the tire 100 by calculating the difference between the resistance values of the resistance units 31 and the resistance units 32 facing each other. Further, the signal processing unit 72 calculates the sum of the resistance values of the resistance units 31 and the resistance units 32 facing each other to obtain the magnitude of the force in the Z direction when the force in the Z direction is applied to the tire 100. be able to.

The signal processing unit 72 can be configured to include, for example, a CPU (Central Processing Unit), a ROM (Read Only Memory), a RAM (Random Access Memory), a main memory, and the like.

In this case, various functions of the signal processing unit 72 can be realized by reading the program recorded in the ROM or the like into the main memory and executing it by the CPU. However, a part or all of the signal processing unit 72 may be realized only by hardware. Further, the signal processing unit 72 may be physically composed of a plurality of devices or the like.

The control device 7 may be provided with an integrated circuit or the like that wirelessly transmits the detection result by the signal processing unit 72. The detection result by the signal processing unit 72 may be wirelessly transmitted to, for example, an ECU (Electronic Control Unit) mounted on an automobile. The ECU that wirelessly obtains information on the sideslip of the tire 100 from the control device 7 can control various safety devices such as the sideslip prevention device, allow the automobile to run safely, and prevent accidents.

FIG. 8 is a cross-sectional view schematically showing how a force is applied to the sensor. As shown in FIG. 8, when a force F (shearing force) is applied to the sensor 1 in the direction of the arrow, the base material 11 side of the member 51 near the portion where the force F is applied is deformed in the direction of the force F, but the member 51 The base material 12 side of the above is hardly deformed.

That is, the resistance value of the resistance portion 31 located in the region A changes, but the resistance value of the resistance portion 32 located in the region B hardly changes. The resistance portion 31 located in the region A and the resistance portion 32 located in the region B are arranged so as to face each other via the member 51 in a state where the force F is not applied.

The slip of the tire 100 can be calculated by calculating the difference between the resistance values of the resistance portions 31 and the resistance portions 32 that face each other. For example, the difference in resistance value between the resistance portion 31 on the left side of the region A and the resistance portion 32 on the left side of the region B, the difference in the resistance value between the resistance portion 31 in the center of the region A and the resistance portion 32 in the center of the region B, and the region. The difference between the resistance values of the resistance portion 31 on the right side of A and the resistance portion 32 on the right side of the region B is calculated. This makes it possible to know the magnitude and distribution of slippage.

Here, the difference between the resistance values of the resistance portion 31 and the resistance portion 32 is taken in order to remove the component generated when the sensor 1 is pressed in the thickness direction (Z direction). That is, when the sensor 1 is pressed in the thickness direction, the resistance portion 31 and the resistance portion 32 are pressed in the same manner and distorted, and the resistance value of the resistance portion 31 and the resistance value of the resistance portion 32 become the same in the same direction. Since it changes, the pressing component can be removed by taking the difference between the resistance values of the resistance portion 31 and the resistance portion 32. As a result, the slip component can be detected accurately.

When there is a request to calculate the pressing component in addition to the sliding component, the pressing component of the tire 100 can be calculated by calculating the sum of the resistance values of the resistance portions 31 and the resistance portions 32 that face each other. .. That is, the sensor 1 can also have a function as a tactile sensor.

In this way, when a force is applied to the sensor 1, the member 51 elastically deforms according to the force applied to the sensor. Then, when the member 51 is elastically deformed, the resistance value between the terminal portions 41, which are a pair of electrodes of the resistance portions 31 arranged so as to face each other via the member 51, and the terminals, which are a pair of electrodes of the resistance portion 32, are formed. The difference from the resistance value between the portions 42 continuously changes according to the elastic deformation of the member 51 due to the shearing force. The skid caused by the tire 100 can be detected based on the change in the difference in resistance values. By taking the difference between the resistance values of the resistance portion 31 and the resistance portion 32, it is possible to remove the change in the resistance values of the resistance portions 31 and 32 due to the elastic deformation of the member 51 due to the compressive force, which occurs in the tire 100. It is possible to detect skidding with high accuracy.

In particular, when the resistance portions 31 and 32 are formed of a Cr mixed-phase film, the sensitivity of the resistance value to force (same) as compared with the case where the resistance portions 31 and 32 are formed of Cu—Ni or Ni—Cr. The amount of change in the resistance values of the resistance portions 31 and 32 with respect to the force) is significantly improved. When the resistance portions 31 and 32 are formed of a Cr mixed-phase film, the sensitivity of the resistance value to the force is approximately 5 to 10 as compared with the case where the resistance portions 31 and 32 are formed of Cu—Ni or Ni—Cr. It will be about double. Therefore, by forming the resistance portions 31 and 32 from the Cr mixed phase film, the skidding generated in the tire 100 can be detected with particularly high sensitivity.

Further, due to the high sensitivity of the resistance value to the force, when it is detected that the slip is small, a predetermined operation is performed, and when it is detected that the slip is in progress, another operation is performed and the slip is performed. When it is detected that the value is large, it is possible to realize a control that performs another operation. Alternatively, it is possible to realize a control in which no operation is performed when it is detected that the slip is small or medium, and a predetermined operation is performed only when it is detected that the slip is large.

Also, if the sensitivity of the resistance value to force is high, a signal with a high S / N can be obtained. Therefore, the signal can be detected with high accuracy even if the number of times of averaging is reduced in the A / D conversion circuit of the analog front end unit 71. By reducing the number of times of averaging in the A / D conversion circuit, the time required for one A / D conversion can be shortened, so that the input signal selection switch can be switched at a higher speed. As a result, the fast movement input to the sensor 1 can also be detected.

Further, in particular, when the resistance portions 31 and 32 are formed of a Cr mixed-phase film, the resistance portions 31 and 32 are 1/10 or less in a plan view as compared with the case where the resistance portions 31 and 32 are formed of Cu—Ni or Ni—Cr. Can be miniaturized. As a result, a small sensor 1 can be realized.

If it is desired to detect slippage in the circumferential direction of the tire 100, the sensor 1 may be arranged on the tire 100 so that the longitudinal directions of the plurality of juxtaposed resistance portions 31 and 32 face the width direction of the tire 100. ..

<Modification 1 of the first embodiment>
Deformation example 1 of the first embodiment shows an example of a sensor in which an elastically deformable member is easily deformed in a specific direction. In the first modification of the first embodiment, the description of the same component as that of the above-described embodiment may be omitted.

FIG. 9 is a plan view illustrating the sensor according to the first modification of the first embodiment. FIG. 10 is a cross-sectional view illustrating the sensor according to the first modification of the first embodiment, and shows a cross-sectional view taken along the line BB of FIG.

Referring to FIGS. 9 and 10, in the sensor 1A, the region located on both sides of each resistance portion 31 of the member 51 is recessed from the surface of the member 51 on the base material 11 side toward the surface of the base material 12 side. A recess 51x is provided. In a plan view, each recess 51x is provided along the longitudinal direction (Y direction) of the resistance portion 31. Further, recesses 51y that are recessed from the surface of the member 51 on the base material 12 side toward the surface of the base material 11 are provided in the regions located on both sides of each of the resistance portions 32 of the member 51. In a plan view, each recess 51y is provided along the longitudinal direction (Y direction) of the resistance portion 32.

As described above, in the sensor 1A, by providing the recesses 51x and 51y in the regions located on both sides of the resistance portions 31 and 32 of the member 51, when a force is applied to the sensor 1A, the member 51 is in the X direction. The amount of deformation increases. As a result, the detection sensitivity of the slip of the sensor 1A in the X direction can be improved.

Note that, as in the sensor 1B shown in the plan view of FIG. 11, a plurality of recesses 51x and 51y may be arranged intermittently with respect to one length of the resistance portions 31 and 32.

Further, as in the sensor 1C shown in the cross-sectional view of FIG. 12, only the recess 51x may be provided without providing the recess 51y. In this case, the depth of the recess 51x may be at least half the thickness of the member 51. Further, in a plan view, one recess 51x may be arranged for each length of the resistance portion 31 as shown in FIG. 9, or one length of the resistance portion 31 may be arranged as shown in FIG. A plurality of recesses 51x may be arranged intermittently with respect to the contact.

Further, in any of the cases of FIGS. 9 to 12, a through hole may be used instead of the concave portion.

In the case of the sensor 1B shown in FIG. 11 and the sensor 1C shown in FIG. 12, the detection sensitivity of slippage in the X direction can be improved as in the case of the sensor 1A shown in FIGS. 9 and 10.

<Modification 2 of the first embodiment>
In the second modification of the first embodiment, an example of a sensor capable of detecting XY coordinates is shown. In the second modification of the first embodiment, the description of the same component as that of the above-described embodiment may be omitted.

FIG. 13 is a plan view illustrating the sensor according to the second modification of the first embodiment. FIG. 14 is a cross-sectional view illustrating the sensor according to the second modification of the first embodiment, and shows a cross-sectional view taken along the line CC of FIG.

Referring to FIGS. 13 and 14, in the sensor 1D, in addition to the structure of the sensor 1, a plurality of resistance portions 33 are juxtaposed in the Y direction at predetermined intervals with the longitudinal direction facing the X direction on the lower surface 12b of the base material 12. Is formed. Further, the sensor 1D has a base material 13 in which resistance portions 34 arranged in the Y direction at predetermined intervals with the longitudinal direction facing the X direction formed on the upper surface 13a, and an elastically deformable member 52. .. The member 52 is laminated between the lower surface 11b of the base material 12 and the upper surface 13a of the base material 13.

Each resistance portion 33 and each resistance portion 34 are arranged so as to face each other via the member 52. Terminal portions 43, which are a pair of electrodes, are provided at both ends of each resistance portion 33, and terminal portions 44, which are a pair of electrodes, are provided at both ends of each resistance portion 34.

The difference between the resistance value between the pair of terminal portions 43 of the resistance portion 33 and the resistance value between the pair of terminal portions 44 of the resistance portion 34 facing the resistance portion 33 depends on the elastic deformation of the member 52 due to the shearing force. And change continuously. Based on the change in the difference in resistance values, the slip in the traveling direction (slip in the Y direction) that occurs in the tire 100 can be detected.

Further, the sum of the resistance value between the pair of terminal portions 43 of the resistance portion 33 and the resistance value between the pair of terminal portions 44 of the resistance portion 34 facing the resistance portion 33 is the elastic deformation of the member 52 due to the compressive force. It changes continuously according to. Based on the change in the sum of the resistance values, the magnitude of the pressing force received by the base material 11 can be detected.

The material, thickness, and manufacturing method of the resistance portions 33 and 34 can be the same as those of the resistance portions 31 and 32. The material and thickness of the member 52 can be the same as that of the member 51. The resistance portions 31 and 32 and the resistance portions 33 and 34 do not have to be orthogonal to each other in a plan view, and may intersect with each other.

As described above, in the sensor 1D, in addition to the resistance portions 31 and 32 having the longitudinal direction in the Y direction, the resistance portions 33 and 34 having the longitudinal direction in the X direction are provided. As a result, in the sensor 1D, the slip in the X direction can be calculated from the difference between the resistance values of the resistance portions 31 and the resistance portions 32 facing each other, and the slip in the Y direction can be calculated from the difference between the resistance values of the resistance portions 33 and the resistance portions 34 facing each other. Can be calculated. In addition, it is possible to detect the XY coordinates of the position where the slip occurs.

Note that the recesses shown in FIGS. 9 to 12 may be provided along the resistance portions 31 and 32 of the member 51. Similarly, the recesses shown in FIGS. 9 to 12 may be provided along the resistance portions 33 and 34 of the member 52. As a result, the sensor 1D can improve the detection sensitivity of slip in the X direction and the detection sensitivity of slip in the Y direction.

<Modification 3 of the first embodiment>
Modification 3 of the first embodiment shows another example of a sensor capable of detecting XY coordinates. In the third modification of the first embodiment, the description of the same component as that of the above-described embodiment may be omitted.

FIG. 15 is a plan view illustrating the sensor according to the third modification of the first embodiment. FIG. 16 is a cross-sectional view illustrating the sensor according to the modified example 3 of the first embodiment, and shows a cross-sectional view taken along the line DD of FIG.

Referring to FIGS. 15 and 16, in the sensor 1E, in addition to the structure of the sensor 1, a base material 15 which is an insulating layer having a plurality of resistance portions 33 between the base material 11 and the member 51 is added, and the base material 15 is added. A plurality of resistance portions 34 are provided on the lower surface 12b of the material 12. The material and thickness of the base material 15 can be, for example, the same as that of the base material 11.

The plurality of resistance portions 33 are juxtaposed on the lower surface 15b of the base material 15 in the Y direction at predetermined intervals with the longitudinal direction facing the X direction. Terminal portions 43, which are a pair of electrodes, are provided at both ends of each resistance portion 33.

The upper surface 15a side of the base material 15 is arranged on the lower surface 11b side of the base material 11 via the resistance portion 31. The member 51 is arranged between the lower surface 15b side of the base material 15 and the upper surface 12a side of the base material 12.

The plurality of resistance portions 34 are juxtaposed on the lower surface 12b of the base material 12 in the Y direction at predetermined intervals with the longitudinal direction facing the X direction. Terminal portions 44, which are a pair of electrodes, are provided at both ends of each resistance portion 34. The respective resistance portions 34 and the respective resistance portions 33 are arranged so as to face each other via the base material 12 and the member 51.

The difference between the resistance value between the pair of terminal portions 41 of the resistance portion 31 and the resistance value between the pair of terminal portions 42 of the resistance portion 32 facing the resistance portion 31 depends on the elastic deformation of the member 51 due to the shearing force. And change continuously. Based on the change in the difference in resistance value, the slip in the X direction generated in the tire 100 can be detected.

Further, the sum of the resistance value between the pair of terminal portions 41 of the resistance portion 31 and the resistance value between the pair of terminal portions 42 of the resistance portion 32 facing the resistance portion 31 is the elastic deformation of the member 51 due to the compressive force. It changes continuously according to. Based on the change in the sum of the resistance values, the magnitude of the pressing force received by the base material 11 can be detected.

Further, the difference between the resistance value between the pair of terminal portions 43 of the resistance portion 33 and the resistance value between the pair of terminal portions 44 of the resistance portion 34 facing the resistance portion 33 is the elastic deformation of the member 51 due to the shearing force. It changes continuously according to. Based on the change in the difference in resistance value, the slip in the Y direction generated in the tire 100 can be detected.

Further, the sum of the resistance value between the pair of terminal portions 43 of the resistance portion 33 and the resistance value between the pair of terminal portions 44 of the resistance portion 34 facing the resistance portion 33 is the elastic deformation of the member 51 due to the compressive force. It changes continuously according to. Based on the change in the sum of the resistance values, the magnitude of the pressing force received by the base material 11 can be detected.

The material, thickness, and manufacturing method of the resistance portions 33 and 34 can be the same as those of the resistance portions 31 and 32. The resistance portions 31 and 32 and the resistance portions 33 and 34 do not have to be orthogonal to each other in a plan view, and may intersect with each other.

As described above, in the sensor 1E, in addition to the resistance portions 31 and 32 having the longitudinal direction in the Y direction, the resistance portions 33 and 34 having the longitudinal direction in the X direction are provided. As a result, in the sensor 1E, the slip in the X direction can be calculated from the difference between the resistance values of the resistance portions 31 and the resistance portions 32 facing each other, and the slip in the Y direction can be calculated from the difference between the resistance values of the resistance portions 33 and the resistance portions 34 facing each other. Can be calculated. In addition, it is possible to detect the XY coordinates of the position where the slip occurs.

Further, since the sensor 1E can reduce the number of elastically deformed members by one as compared with the sensor 1D, there is an advantage from the viewpoint of miniaturization and low profile.

For example, as shown in FIG. 17, the surface of the member 51 on the base material 15 side is located in a region located on both sides of each resistance portion 31 of the member 51 and located on both sides of each resistance portion 33 of the member 51. A recess 51x that is recessed from the surface toward the surface of the base material 12 may be provided. Further, in a region located on both sides of each resistance portion 32 of the member 51 and located on both sides of each resistance portion 34 of the member 51, the member 51 faces the surface of the member 51 from the surface of the base material 12 side to the surface of the base material 15 side. A recess 51y that is recessed may be provided. Alternatively, the recess 51y may not be provided and only the recess 51x may be provided. In either case, the sensor 1E can improve the detection sensitivity of slip in the X direction and the detection sensitivity of slip in the Y direction.

Although the preferred embodiments and the like have been described in detail above, they are not limited to the above-described embodiments and the like, and various modifications and substitutions are made to the above-mentioned embodiments and the like without departing from the scope of claims. Can be added.

This international application claims priority based on Japanese Patent Application No. 2020-011063 filed on January 27, 2020, and the entire contents of Japanese Patent Application No. 2020-011063 are incorporated into this international application. ..

1, 1A, 1B, 1C, 1D, 1E, 1F sensor, 7 control device, 8 sensor module, 11, 12, 13, 15 base material, 11a, 12a, 13a, 15a top surface of base material, 11b, 12b, 13b , 15b bottom surface of base material, 20a, 20b functional layer, 31, 32, 33, 34 resistance part, 41, 42, 43, 44 terminal part, 51, 52 member, 51x, 51y recess, 71 analog front end part, 72 Signal processing unit, 100 tires, 110 tread part, 120 sidewall part, 130 bead part, 140 inner liner, 150 carcass, 160 bead core, 170 bead filler, 180 belt

Claims (18)

1. Tires for mobiles
   A sensor is provided inside the tire.
   The sensor is
   A first insulating layer having a plurality of first resistance portions juxtaposed with one side serving as a force input side and the other side facing the first direction in the longitudinal direction.
   A second insulating layer provided with a plurality of second resistance portions juxtaposed on one side with the longitudinal direction facing the first direction.
   It has a member that is arranged between the other side of the first insulating layer and one side of the second insulating layer and elastically deforms in response to the force.
   Each of the first resistance portions and each of the second resistance portions are arranged so as to face each other via the member.
   A pair of electrodes are provided at both ends of each of the first resistance portions and each of the second resistance portions.
   The difference between the resistance value between the pair of electrodes of the first resistance portion and the resistance value between the pair of electrodes of the second resistance portion facing the first resistance portion is the elastic deformation of the member. Tires that change continuously according to the situation.
2. The tire according to claim 1, wherein the first direction is the circumferential direction of the tire.
3. The tire according to claim 1 or 2, wherein the sensor is attached or embedded in the entire width direction and the entire circumferential direction of the inner peripheral side of the tire.
4. The sum of the resistance value between the pair of electrodes of the first resistance portion and the resistance value between the pair of electrodes of the second resistance portion facing the first resistance portion is the sum of the resistance values of the member due to the compressive force. The tire according to any one of claims 1 to 3, which continuously changes according to elastic deformation.
5. A claim in which recesses are provided in regions of each of the members located on both sides of the first resistance portion so as to be recessed from the surface of the member on the first insulating layer side toward the surface of the second insulating layer. The tire according to any one of 1 to 4.
6. A claim in which recesses are provided in regions of each of the members located on both sides of the second resistance portion so as to be recessed from the surface of the member on the second insulating layer side toward the surface of the first insulating layer. The tire according to 5.
7. A plurality of third resistance portions juxtaposed with the longitudinal direction intersecting the first direction in the second direction are formed on the other side of the second insulating layer.
   A third insulating layer provided with a plurality of fourth resistance portions juxtaposed on one side with the longitudinal direction facing the second direction.
   It has a second member that is arranged between the other side of the second insulating layer and one side of the third insulating layer and elastically deforms in response to the force.
   Each of the third resistance portions and each of the fourth resistance portions are arranged so as to face each other via the second member.
   A pair of electrodes are provided at both ends of each of the third resistance portions and each of the fourth resistance portions.
   The difference between the resistance value between the pair of electrodes of the third resistance portion and the resistance value between the pair of electrodes of the fourth resistance portion facing the third resistance portion is the second difference due to the shearing force. The tire according to any one of claims 1 to 6, which continuously changes according to the elastic deformation of the member.
8. The sum of the resistance value between the pair of electrodes of the third resistance portion and the resistance value between the pair of electrodes of the fourth resistance portion facing the third resistance portion is the second due to the compressive force. The tire according to claim 7, which continuously changes according to the elastic deformation of the member.
9. In the regions located on both sides of the third resistance portion of each of the second members, recesses are provided that are recessed from the surface of the second member on the second insulating layer side toward the surface of the third insulating layer. The tire according to claim 7 or 8.
10. In the regions located on both sides of the fourth resistance portion of each of the second members, recesses are provided that are recessed from the surface of the second member on the third insulating layer side toward the surface of the second insulating layer. The tire according to claim 9.
11. It has a third insulating layer having a plurality of third resistance portions juxtaposed on the other side so that the longitudinal direction intersects the first direction in the second direction.
    One side of the third insulating layer is arranged on the other side of the first insulating layer via the first resistance portion.
    The member is arranged between the other side of the third insulating layer and one side of the second insulating layer.
    A plurality of fourth resistance portions juxtaposed with the longitudinal direction facing the second direction are formed on the other side of the second insulating layer.
    Each of the third resistance portions and each of the fourth resistance portions are arranged so as to face each other via the member.
    A pair of electrodes are provided at both ends of each of the third resistance portions and each of the fourth resistance portions.
    The difference between the resistance value between the pair of electrodes of the third resistance portion and the resistance value between the pair of electrodes of the fourth resistance portion facing the third resistance portion is the difference between the resistance value of the member due to the shearing force. The tire according to any one of claims 1 to 4, which continuously changes according to elastic deformation.
12. The sum of the resistance value between the pair of electrodes of the third resistance portion and the resistance value between the pair of electrodes of the fourth resistance portion facing the third resistance portion is the sum of the resistance values of the member due to the compressive force. The tire according to claim 11, which continuously changes according to elastic deformation.
13. The second insulation from the surface of the member on the third insulating layer side in a region located on both sides of the first resistance portion of each of the members and located on both sides of the third resistance portion of each of the members. The tire according to claim 11 or 12, which is provided with a recess that is recessed toward the layer side surface.
14. The third insulation from the surface of the member on the second insulating layer side in a region located on both sides of the second resistance portion of each of the members and located on both sides of the fourth resistance portion of each of the members. The tire according to claim 13, wherein a recess is provided so as to be recessed toward the layer side surface.
15. The tire according to the third resistance portion and said fourth resistor section, alpha-Cr as main components Cr, CrN, and claims 7 to 14 any one is formed from a film containing Cr 2 _N ..
16. Wherein the first resistor portion and the second resistor portion, Cr mainly composed of α-Cr, CrN, according to any one of claims 1 to 15 is formed and a film containing Cr 2 _N tire.
17. A functional layer formed of a metal, an alloy, or a compound of a metal is provided under the film.
    The tire according to claim 15 or 16, wherein the functional layer has a function of promoting crystal growth of the α-Cr and forming a film containing the α-Cr as a main component.
18. The tire according to any one of claims 15 to 17, wherein the film contains 80% by weight or more of the α-Cr.

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