WO2021131505A1 - Optical laminate and image display device - Google Patents

Optical laminate and image display device Download PDF

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Publication number
WO2021131505A1
WO2021131505A1 PCT/JP2020/044453 JP2020044453W WO2021131505A1 WO 2021131505 A1 WO2021131505 A1 WO 2021131505A1 JP 2020044453 W JP2020044453 W JP 2020044453W WO 2021131505 A1 WO2021131505 A1 WO 2021131505A1
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WO
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Prior art keywords
group
meth
sensitive adhesive
optical laminate
adhesive layer
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PCT/JP2020/044453
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French (fr)
Japanese (ja)
Inventor
亨 神野
悠司 淺津
白石 貴志
Original Assignee
住友化学株式会社
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Application filed by 住友化学株式会社 filed Critical 住友化学株式会社
Priority to KR1020227024867A priority Critical patent/KR20220116272A/en
Priority to CN202080089016.8A priority patent/CN114846375A/en
Publication of WO2021131505A1 publication Critical patent/WO2021131505A1/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G02B5/3041Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • C09J201/02Adhesives based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/8791Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K59/8792Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers

Definitions

  • the present invention relates to an optical laminate and a display device.
  • Polarizing plates made by laminating and laminating a protective film on one or both sides of a polarizer are used for image display devices such as liquid crystal display devices such as mobile televisions and organic electroluminescence (organic EL) display devices, especially in recent years. It is an optical member widely used in various mobile devices such as telephones, smartphones, and tablet terminals.
  • the polarizing plate is often used by being bonded to an image display element (liquid crystal cell, organic EL display element, etc.) via an adhesive layer (for example, Japanese Patent Application Laid-Open No. 2010-229321 (Patent Document 1)). Therefore, the polarizing plate may be marketed in the form of a polarizing plate with an adhesive layer in which an adhesive layer is previously provided on one surface of the polarizing plate.
  • Patent Document 2 by increasing the boric acid content in the polarizer, by generating many borate crosslinked, present in high stability I 3 complex is highly oriented It is described that the occurrence of blue leak is suppressed and a polarizer having excellent low-temperature and high-humidity durability can be obtained.
  • An object of the present invention is to provide a novel optical laminate in which color loss is suppressed at the end of a polarizer under high temperature and high humidity.
  • the present invention provides an optical laminate illustrated below and an image display device using the same.
  • An optical laminate having a polarizer and a light selective absorbing pressure-sensitive adhesive layer laminated in contact with the polarizer. Iodine is adsorbed and oriented in the polarizer, and the boron content is 5.0% by mass or less.
  • the pressure-sensitive adhesive composition forming the light-selective-absorbing pressure-sensitive adhesive layer is an optical laminate containing a light-selective-absorbing polymer.
  • the optical laminate according to [1] further comprising a protective film laminated on the side of the polarizer opposite to the light selective absorption pressure-sensitive adhesive layer side.
  • the content of the structural unit having the structure represented by the chemical formula (1) is 0.01 part by mass or more and 50 parts by mass or less with respect to 100 parts by mass of all the structural units. , [3].
  • the pressure-sensitive adhesive composition does not contain a light selective absorber, or the content of the light selective absorber is 0.1 parts by mass or less with respect to 100 parts by mass of all resin components, [1] to [ 5] The optical laminate according to any one of the items.
  • an optical laminate in which color loss is suppressed at an end portion of a polarizer in a high temperature and high humidity environment, and an image display device including the same.
  • the optical laminate of the present invention has a polarizer and a light selective absorbing pressure-sensitive adhesive layer laminated in contact with the polarizer.
  • An example of the layer structure of the optical laminate of the present invention is shown in FIGS. 1 and 2.
  • FIG. 1 is a schematic cross-sectional view of an example of the optical laminate of the present invention.
  • the optical laminate 100 shown in FIG. 1 has a protective film 11, a polarizer 10, and a light selective absorbing pressure-sensitive adhesive layer 20 in this order.
  • FIG. 2 is a schematic cross-sectional view of an example of the optical laminate of the present invention.
  • the optical laminate 200 shown in FIG. 2 has an optical laminate 100 shown in FIG. 1 and a retardation laminate 300 laminated on the light selective absorption adhesive layer 20 side of the optical laminate 100.
  • the retardation laminate 300 includes a first retardation layer 30, an adhesive layer 33, a second retardation layer 31, and a second adhesive in order from the light selective absorption pressure-sensitive adhesive layer 20 side of the optical laminate 100. It has a layer 32 and.
  • the thicknesses of the optical laminates 100 and 200 are not particularly limited because they differ depending on the functions required of the optical laminate and the application of the optical laminate, but for example, they may be 5 ⁇ m or more and 200 ⁇ m or less, and 10 ⁇ m or more and 150 ⁇ m or less. It may be 120 ⁇ m or less.
  • the light selective absorption pressure-sensitive adhesive layer contains a light selective absorption polymer.
  • at least the light selective absorption pressure-sensitive adhesive layer has light selective absorption performance, so that the optical laminate as a whole also has light selective absorption performance.
  • the light selective absorption performance refers to a property of easily absorbing light having a specific wavelength, and has at least one absorption maximum in the ultraviolet wavelength region to the visible light region.
  • the optical laminate arranged on the image display element has a function of protecting the image display element from ultraviolet rays.
  • the optical laminate of the present invention may have a structure including a layer having light selective absorption performance in addition to the light selective absorption pressure-sensitive adhesive layer.
  • Examples of the other layer include the protective film 11.
  • the light selective absorption adhesive layer has the light selective absorption performance and contributes to the development of the light selective absorption performance of the entire optical laminate, so that the light selective absorption performance of the other layers can be improved.
  • the degree of design freedom can be improved.
  • the protective film 11 may need to be designed to be thicker in order to improve the light selective absorption performance, but the protective film 11 has a high degree of freedom in designing the light selective absorption performance. It becomes easy to make a thin film.
  • the light selective absorption pressure-sensitive adhesive layer has a structure in which the light selective absorption polymer has light selective absorption performance and contributes to the development of the light selective absorption performance of the light selective absorption pressure-sensitive adhesive layer.
  • the adhesive layer can be configured not to contain a light selective absorber or to reduce the content of the light selective absorber to suppress color loss at the ends of the polarizer under high temperature and high humidity. Can be done.
  • the present inventors have found that there is a correlation between the content of the light selective absorber contained in the pressure-sensitive adhesive layer and the degree of color loss at the end of the polarizer under high temperature and high humidity. .. Based on this finding, when a light selective absorber having a relatively low molecular weight is used, the light selective absorber in the pressure-sensitive adhesive layer tends to migrate to the polarizer side under high temperature and high humidity, and such migration tends to occur in color. It is considered to be one of the factors that cause omission. The present inventors have conducted further diligent studies, and imparted the light selective absorption performance to the pressure-sensitive adhesive layer by a method of containing a light selective absorption polymer instead of a method of adding a light selective absorption agent.
  • the present invention has been made by finding that color loss at the end of a polarizer under high temperature and high humidity can be suppressed. Since the photoselective absorptive polymer has a relatively large molecular weight, it is considered that the transfer to the polarizer is suppressed and the color loss at the end of the polarizer is suppressed.
  • the polarizer has a property of absorbing linearly polarized light having a vibration plane parallel to its absorption axis and transmitting linearly polarized light having a vibration plane orthogonal to the absorption axis (parallel to the transmission axis).
  • the polarizer 10 in the optical laminate of the present invention has iodine adsorbed and oriented, and has a boron content of 5.0% by mass or less. With a structure in which the boron content is 5.0% by mass or less, preferably 4.5% by mass or less, shrinkage caused by heating can be suppressed.
  • the content of boron is preferably 0.5% by mass or more, and more preferably 1% by mass or more.
  • Boron in the polarizer 10 improves the degree of cross-linking of the polarizer 10 and contributes to stably retaining iodine in the polarizer 10. Therefore, when the boron content is low, iodine is stably retained. It is considered that it cannot be held and color loss occurs. In the present invention, even if the boron content of the polarizer 10 is 5.0% by mass or less, color loss under high temperature and high humidity can be suppressed.
  • Examples of the polarizer 10 include a stretched film or a stretched layer on which a dichroic dye having absorption anisotropy is adsorbed, a cured product of a polymerizable liquid crystal compound, and a liquid crystal cured layer containing a dichroic dye.
  • the dichroic dye refers to a dye having a property in which the absorbance in the major axis direction and the absorbance in the minor axis direction of the molecule are different, and iodine is preferably used as the dye.
  • the polarizer which is a stretched film on which a dye having absorption anisotropy is adsorbed, is usually obtained by uniaxially stretching a polyvinyl alcohol-based resin film or dyeing the polyvinyl alcohol-based resin film with a dichroic dye such as iodine. , The step of adsorbing the dichroic dye, the step of treating the polyvinyl alcohol-based resin film on which the dichroic dye is adsorbed with an aqueous boric acid solution, and the step of washing with water after the treatment with the aqueous boric acid solution can be produced. ..
  • the thickness of the polarizer is usually 30 ⁇ m or less, preferably 15 ⁇ m or less, more preferably 13 ⁇ m or less, further preferably 10 ⁇ m or less, and particularly preferably 8 ⁇ m or less.
  • the thickness of the polarizer is usually 2 ⁇ m or more, preferably 3 ⁇ m or more, and may be, for example, 5 ⁇ m or more.
  • the polyvinyl alcohol-based resin is obtained by saponifying the polyvinyl acetate-based resin.
  • the polyvinyl acetate-based resin in addition to polyvinyl acetate which is a homopolymer of vinyl acetate, a copolymer of vinyl acetate and another monomer copolymerizable therewith is used.
  • examples of other monomers copolymerizable with vinyl acetate include unsaturated carboxylic acid compounds, olefin compounds, vinyl ether compounds, unsaturated sulfone compounds, and (meth) acrylamide compounds having an ammonium group. ..
  • the saponification degree of the polyvinyl alcohol-based resin is usually about 85 mol% or more and 100 mol% or less, preferably 98 mol% or more.
  • the polyvinyl alcohol-based resin may be modified, and polyvinyl formal, polyvinyl acetal, and the like modified with aldehydes can also be used.
  • the degree of polymerization of the polyvinyl alcohol-based resin is usually 1000 or more and 10000 or less, preferably 1500 or more and 5000 or less.
  • the polarizer which is a stretched layer on which a dye having absorption anisotropy is adsorbed, is usually a step of applying a coating liquid containing the polyvinyl alcohol-based resin on a base film, and a step of uniaxially stretching the obtained laminated film.
  • the base film used for forming the polarizer may be used as the protective film 11. If necessary, the base film may be peeled off from the polarizer.
  • the material and thickness of the base film may be the same as the material and thickness of the protective film 11
  • the protective film 11 is made of an optically transparent thermoplastic resin such as a cyclic polyolefin resin; a cellulose acetate resin composed of a resin such as triacetyl cellulose or diacetyl cellulose; a resin such as polyethylene terephthalate, polyethylene naphthalate, or polybutylene terephthalate. Polyester resin; Polycarbonate resin; (meth) acrylic resin; Polypropylene resin, a coating layer or film composed of one or a mixture of two or more of these.
  • the protective film 11 may contain a light selective absorber described later. Since the light selective absorber contained in the protective film 11 is held in the protective film 11, it is unlikely that the light selective absorber will be transferred to the polarizer.
  • a hard coat layer may be formed on the protective film 11.
  • the hard coat layer may be formed on one surface of the protective film 11 or may be formed on both sides. By providing the hard coat layer, the protective film 11 having improved hardness and scratchability can be obtained.
  • the hard coat layer may be, for example, a cured layer such as an acrylic resin, a silicone resin, a polyester resin, a urethane resin, an amide resin, or an epoxy resin.
  • the hard coat layer may contain additives to improve strength. Additives are not limited and include inorganic fine particles, organic fine particles, or mixtures thereof.
  • the hard coat layer is, for example, a cured layer of an ultraviolet curable resin. Examples of the ultraviolet curable resin include acrylic resin, silicone resin, polyester resin, urethane resin, amide resin, epoxy resin and the like.
  • the thickness of the protective film 11 is usually 1 ⁇ m or more and 100 ⁇ m or less, preferably 5 ⁇ m or more and 80 ⁇ m or less, more preferably 8 ⁇ m or more and 60 ⁇ m or less, and 12 ⁇ m or more and 45 ⁇ m or less from the viewpoint of strength and handleability. Is more preferable.
  • the resin film which is the protective film 11, is attached to the polarizer 10 via, for example, an adhesive layer.
  • the adhesive forming the adhesive layer include a water-based adhesive, an active energy ray-curable adhesive, and a thermosetting adhesive, and a water-based adhesive and an active energy ray-curable adhesive can be used. preferable.
  • the two opposing surfaces bonded via the adhesive layer may be subjected to corona treatment, plasma treatment, flame treatment or the like in advance, or may have a primer layer or the like.
  • the photoselective absorbent pressure-sensitive adhesive layer 20 can be formed by applying a diluent in which a pressure-sensitive adhesive composition containing a light-selective absorbent polymer is dissolved or dispersed in an organic solvent onto a substrate and drying it.
  • a plastic film is preferable as the base material, and specific examples thereof include a release film that has been subjected to a mold release treatment.
  • the release film include those in which one surface of a film made of a resin such as polyethylene terephthalate, polybutylene terephthalate, polycarbonate, or polyarylate is subjected to a mold release treatment such as silicone treatment.
  • the thickness of the light selective absorption pressure-sensitive adhesive layer is, for example, 0.1 ⁇ m or more and 150 ⁇ m or less.
  • the thickness of the light selective absorption adhesive layer is usually 8 ⁇ m or more and 60 ⁇ m or less, and in terms of thinning, it is 30 ⁇ m or less, further 25 ⁇ m or less, and particularly 20 ⁇ m or less. Is preferable.
  • the thickness of the light selective absorption pressure-sensitive adhesive layer is usually 2 ⁇ m or more and 30 ⁇ m or less, preferably 25 ⁇ m or less, more preferably 20 ⁇ m or less, particularly. It is preferably 18 ⁇ m or less, preferably 3 ⁇ m or more, for example, 10 ⁇ m or more, but in terms of further thinning, 10 ⁇ m or less, particularly 7 ⁇ m or less is preferable.
  • the light selective absorbing pressure-sensitive adhesive layer 20 preferably has an absorbance of 0.1 or more and 1.6 or less at a wavelength of 410 nm. This is because the light selective absorption pressure-sensitive adhesive layer 20 having such an absorbance makes it easy to form the entire optical laminate in a thin shape while exhibiting desired light selective absorption performance as the entire optical laminate.
  • the light selective absorbing pressure-sensitive adhesive layer usually has an absorbance at a wavelength of 390 nm of 5.0 or less, and may be 4.5 or less.
  • the light selective absorbing pressure-sensitive adhesive layer usually has an absorbance at a wavelength of 400 nm of 5.0 or less, and may be 4.5 or less.
  • the light selective absorbing pressure-sensitive adhesive layer has an absorbance at a wavelength of 420 nm of usually 1.00 or less, preferably 0.60 or less, more preferably 0.40 or less, and 0.00 or more.
  • the light selective absorbing pressure-sensitive adhesive layer has an absorbance at a wavelength of 430 nm, usually less than 0.20, preferably 0.18 or less, more preferably 0.10 or less, particularly preferably 0.05 or less, and 0.00 or more. is there.
  • the light selective absorbing pressure-sensitive adhesive layer has an absorbance at a wavelength of 440 nm, usually less than 0.10, preferably 0.05 or less, and 0.00 or more.
  • the absorbance at each wavelength is in the above range, the light in the visible light region can be transmitted as it is while sufficiently absorbing the light in the ultraviolet region.
  • the light selective absorption pressure-sensitive adhesive layer is preferably a pressure-sensitive adhesive layer satisfying the following formula (3), and more preferably a pressure-sensitive adhesive layer satisfying the formula (4).
  • a (405) ⁇ 0.5 (3) [In formula (3), A (405) represents the absorbance at a wavelength of 405 nm. ]
  • a (405) / A (440) ⁇ 5 (4) [In the formula (4), A (405) represents the absorbance at a wavelength of 405 nm, and A (440) represents the absorbance at a wavelength of 440 nm. ]
  • the value of A (405) is less than 0.5, the absorption at a wavelength of 405 nm is low, and the deterioration of members (for example, display devices such as organic EL elements and liquid crystal retardation films) that are easily deteriorated by light near 400 nm is deteriorated. It is easy to happen.
  • the value of A (405) is preferably 0.6 or more, more preferably 0.8 or more, and particularly preferably 1.0 or more. There is no particular upper limit, but it is usually 10 or less.
  • the value of A (405) / A (440) represents the magnitude of absorption at a wavelength of 405 nm with respect to the magnitude of absorption at a wavelength of 440 nm, and the larger this value is, the more specific absorption is in the wavelength region near 405 nm. Represent.
  • the value of A (405) / A (440) is preferably 10 or more, more preferably 30 or more, further preferably 75 or more, and particularly preferably 100 or more.
  • the pressure-sensitive adhesive composition comprises a light-selective absorbent polymer.
  • the light selective absorption polymer is a polymer having light selective absorption performance.
  • the light selective absorption polymer can preferably absorb light having a wavelength in the region of 360 nm to 420 nm.
  • the photoselective absorptive polymer contains a photoselective absorptive structural unit having a moiety having a light selective absorption performance.
  • the light selective absorption structural unit preferably has a portion having a light selective absorption performance in the side chain. Examples of the site having the light selective absorption performance include a benzophenone group, a benzotriazole group, and a structure represented by the following chemical formula (1).
  • the resin (A) may have a merocyanine structure in the main chain or a side chain.
  • the resin (A) more preferably contains a structural unit having a merocyanine structure in the side chain.
  • the glass transition temperature (Tg) of the resin (A) is 40 ° C. or lower, preferably 20 ° C. or lower, more preferably 10 ° C. or lower, and even more preferably 0 ° C. or lower.
  • the glass transition temperature of the resin (A) is usually ⁇ 80 ° C. or higher, preferably ⁇ 60 ° C. or higher, more preferably ⁇ 50 ° C. or higher, and even more preferably ⁇ 45 ° C. or higher. , -30 ° C or higher is particularly preferable.
  • the glass transition temperature of the resin (A) is 40 ° C.
  • the glass transition temperature of the resin (A) is ⁇ 80 ° C. or higher, the durability of the light selective absorbing pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition containing the resin (A) (appearance defects during a high temperature test). : Advantageous in improving coagulation failure, etc.).
  • the glass transition temperature can be measured by a differential scanning calorimeter (DSC).
  • the structural unit having a merocyanine structure in the side chain is not particularly limited, but is preferably a structural unit derived from a compound having a polymerizable group and a merocyanine structure.
  • the compound having a polymerizable group and a merocyanine structure preferably satisfies the following formula (1-a), and more preferably satisfies the formula (2-a).
  • ⁇ (405) ⁇ 5 (1-a) [In formula (1-a), ⁇ (405) represents the gram absorption coefficient of a compound having a polymerizable group and a merocyanine structure at a wavelength of 405 nm. The unit of the gram extinction coefficient is L / (g ⁇ cm).
  • ⁇ (405) represents the gram extinction coefficient of a compound having a polymerizable group and a merocyanine structure at a wavelength of 405 nm
  • ⁇ (440) represents a polymerizable group and a merocyanine structure at a wavelength of 440 nm. Represents the gram extinction coefficient of the compound.
  • the compound having a polymerizable group and a merocyanine structure preferably has a value of ⁇ (405) of 5 L / (g ⁇ cm) or more, more preferably 10 L / (g ⁇ cm) or more, and 20 L / (g ⁇ cm) or more. It is more preferably (g ⁇ cm) or more, further preferably 30 L / (g ⁇ cm) or more, and usually 500 L / (g ⁇ cm) or less.
  • a compound having a larger value of ⁇ (405) is more likely to absorb light having a wavelength of 405 nm, and is more likely to exhibit a function of suppressing deterioration due to ultraviolet rays or visible light having a short wavelength.
  • the compound having a polymerizable group and a merocyanine structure preferably has a value of ⁇ (405) / ⁇ (440) of 20 or more, more preferably 40 or more, further preferably 70 or more, and even more preferably 80 or more. Is particularly preferable.
  • the resin containing a compound having a large value of ⁇ (405) / ⁇ (440) absorbs light in the vicinity of 405 nm without disturbing the color expression of the display device, and the light of a display device such as a retardation film or an organic EL element. Deterioration can be suppressed.
  • R 1 , R 2 , R 3 , R 4 and R 5 are aliphatic hydrocarbons having 1 to 25 carbon atoms which may independently have a hydrogen atom and a substituent. It represents an aromatic hydrocarbon group having 6 to 15 carbon atoms, a heterocyclic group or an ethylenically unsaturated group which may have a group or a substituent, and is contained in the aliphatic hydrocarbon group or the aromatic hydrocarbon group.
  • -CH 2- may be replaced with -NR 1A- , -SO 2- , -CO-, -O- or S-.
  • R 6 and R 7 independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, an electron-withdrawing group, or an ethylenically unsaturated group.
  • R 1A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
  • R 1 and R 2 may be connected to each other to form a ring structure,
  • R 2 and R 3 may be connected to each other to form a ring structure, and
  • R 2 and R 4 may be connected to each other to form a ring structure.
  • R 3 and R 6 may be connected to each other to form a ring structure,
  • R 5 and R 7 may be connected to each other to form a ring structure, and
  • R 6 and R 7 may be formed. May be connected to each other to form a ring structure.
  • one of R 1 to R 7 is an ethylenically unsaturated group]
  • Examples of the aliphatic hydrocarbon group having 1 to 25 carbon atoms represented by R 1 to R 5 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group and a sec-butyl group.
  • n-pentyl group isopentyl group, n-hexyl group, isohexyl group, n-octyl group, isooctyl group, n-nonyl group, isononyl group, n-decyl group, isodecyl group, n-dodecyl group, isododecyl group, Linear or branched alkyl group having 1 to 25 carbon atoms such as undecyl group, lauryl group, myristyl group, cetyl group and stearyl group: 3 to 25 carbon atoms such as cyclopropyl group, cyclobutyl group, cyclopentyl group and cyclohexyl group.
  • Cycloalkyl group A cycloalkylalkyl group having 4 to 25 carbon atoms such as a cyclohexylmethyl group, and an alkyl group having 4 to 25 carbon atoms is preferable.
  • substituent that the aliphatic hydrocarbon group having 1 to 25 carbon atoms represented by R 1 to R 5 may have include a hydroxy group, a cyano group, a halogen atom, a mercapto group, an amino group, a nitro group and the like.
  • the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • Examples of the aromatic hydrocarbon group having 6 to 15 carbon atoms represented by R 1 to R 5 include an aryl group having 6 to 15 carbon atoms such as a phenyl group, a naphthyl group, an anthracenyl group and a biphenyl group; a benzyl group and a phenylethyl group. Examples thereof include an aralkyl group having 7 to 15 carbon atoms such as a group, a naphthylmethyl group and phenyl.
  • Examples of the substituent that the aromatic hydrocarbon group having 6 to 15 carbon atoms represented by R 1 to R 5 may have include a hydroxy group, a cyano group, a halogen atom, a mercapto group, an amino group and a nitro group.
  • it represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms
  • R 4A represents an alkyl group having 1 to 6 carbon atoms.
  • halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • alkoxy group examples include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, an octyloxy group, a 2-ethylhexyloxy group, a nonyloxy group, a decyloxy group, an undecyloxy group and a dodecyloxy group.
  • Alkoxy groups having 1 to 12 carbon atoms can be mentioned.
  • alkylthio group examples include an alkylthio group having 1 to 12 carbon atoms such as a methylthio group, an ethylthio group, a propylthio group and a butylthio group.
  • acyl group examples include an acyl group having 2 to 13 carbon atoms such as an acetyl group, a propionyl group and a butyryl group.
  • acyloxy group examples include a methylcarbonyloxy group, an ethylcarbonyloxy group, an n-propylcarbonyloxy group, an isopropylcarbonyloxy group, an n-butylcarbonyloxy group, a sec-butylcarbonyloxy group, a tert-butylcarbonyloxy group, and a pentylcarbonyl.
  • acyloxy groups having 2 to 13 carbon atoms such as an oxy group, a hexylcarbonyloxy group, an octylcarbonyloxy group and a 2-ethylhexylcarbonyloxy group.
  • alkoxycarbonyl group examples include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group, a pentyloxycarbonyl group, a hexyloxycarbonyl group, an octyloxycarbonyl group, a 2-ethylhexyloxycarbonyl group, a nonyloxycarbonyl group, and a decyl.
  • alkoxycarbonyl groups having 2 to 13 carbon atoms such as an oxycarbonyl group, an undecyloxycarbonyl group, and a dodecyloxycarbonyl group.
  • the -CONR 3A R 3B aminocarbonyl group, methylaminocarbonyl group, dimethylaminocarbonyl group, ethylaminocarbonyl group, and the like methyl aminocarbonyl group.
  • Examples of -C (NR 2A ) R 2B include a methylimino group, a dimethylimino group, a methylethylimino group and the like.
  • Examples of -SO 2 R 4A include a methyl sulfonyl group and an ethyl sulfonyl group.
  • Examples of the alkyl group having 1 to 6 carbon atoms represented by R 1A and R 1B include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group, a sec-butyl group and the like. Can be mentioned.
  • Examples of the heterocyclic group represented by R 1 to R 5 include a pyrrolidine ring group, a pyrolin ring group, an imidazolidine ring group, an imidazoline ring group, an oxazoline ring group, a thiazolin ring group, a piperidine ring group, a morpholine ring group, and a piperazine ring.
  • An aliphatic heterocyclic group having 4 to 20 carbon atoms or an aliphatic heterocyclic group having 3 to 20 carbon atoms such as a group, an indole ring group, an isoindole ring group, a quinoline ring group, a thiophene ring group, a pyrrol ring group, a thiazolin ring group and a furan ring group.
  • Examples include aromatic heterocyclic groups.
  • Alkyl groups having 1 to 25 carbon atoms represented by R 6 and R 7 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, tert-butyl group, sec-butyl group and n.
  • -Pentyl group isopentyl group, n-hexyl group, isohexyl group, n-octyl group, isooctyl group, n-nonyl group, isononyl group, n-decyl group, isodecil group, n-dodecyl group, isododecyl group, undecyl group, Examples thereof include linear or branched alkyl groups having 1 to 25 carbon atoms such as lauryl group, myristyl group, cetyl group and stearyl group.
  • Examples of the electron-withdrawing group represented by R 6 and R 7 include a cyano group, a nitro group, a halogen atom, an alkyl group substituted with a halogen atom, and a group represented by the formula (I-1). .. [In the formula, R 111 represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms, and at least one of the methylene groups contained in the alkyl group may be substituted with an oxygen atom.
  • X 1 is, -CO- * 1, -COO- * 1 , -CS- * 1, -CSS- * 1, -CSNR 112 - * 1, -CONR 113 - * 1, -CNR 114 - * 1 or SO Represents 2- * 1.
  • R 112 , R 113 and R 114 independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a phenyl group.
  • * 1 represents a bond with R 111.
  • halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • Alkyl groups substituted with halogen atoms include, for example, trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl group, perfluorotert-butyl group, perfluoropentyl group and Examples thereof include a perfluoroalkyl group such as a perfluorohexyl group.
  • the number of carbon atoms of the alkyl group substituted with the halogen atom is usually 1 to 25.
  • Examples of the hydrocarbon group having 1 to 25 carbon atoms represented by R 111 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group, a sec-butyl group and an n-pentyl group.
  • a linear or branched alkyl group having 1 to 25 carbon atoms such as a myristyl group, a cetyl group and a stearyl group: a cycloalkyl group having 3 to 25 carbon atoms such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group; Cycloalkylalkyl group having 4 to 25 carbon atoms such as cyclopropylmethyl group and cyclohexylmethyl group; ary
  • Examples thereof include an aralkyl group having 7 to 25 carbon atoms such as a naphthylmethyl group and phenyl.
  • Examples of the alkyl group having 1 to 6 carbon atoms represented by R 112, R 113 and R 114 include the same alkyl group having 1 to 6 carbon atoms represented by R 1A.
  • R 111 is preferably an alkyl group having 4 to 25 carbon atoms, and more preferably an alkyl group having 4 to 12 carbon atoms.
  • X 1 is preferably ⁇ CO ⁇ * 1 and COO ⁇ * 1.
  • the electron-withdrawing groups represented by R 6 and R 7 are preferably cyano groups and groups represented by the formula (I-1), respectively.
  • the ring structure formed by bonding R 1 and R 2 to each other is a nitrogen-containing ring structure containing a nitrogen atom to which R 1 and R 2 are bonded, and is, for example, a 4-membered ring to a 10-membered ring.
  • a nitrogen-containing heterocycle can be mentioned.
  • the ring structure formed by connecting R 1 and R 2 to each other may be monocyclic or polycyclic.
  • a pyrrolidine ring examples thereof include a pyrrolidine ring, a pyrroline ring, an imidazolidine ring, an imidazoline ring, an oxazoline ring, a thiazolin ring, a piperidine ring, a morpholine ring, a piperazine ring, an indole ring, and an isoindole ring.
  • the ring formed by bonding R 1 and R 2 to each other may have a substituent, and the substituent may have a carbon number of 1 such as a methyl group, an ethyl group, a propyl group, a butyl group, and an isobutyl group.
  • Alkyl groups of to 12; alkoxy groups having 1 to 12 carbon atoms such as methoxy group, ethoxy group, propoxy group, butoxy group and the like can be mentioned.
  • the ring structure formed by bonding R 2 and R 3 to each other is a nitrogen-containing ring structure containing a nitrogen atom to which R 2 is bonded, and is, for example, a nitrogen-containing heterocycle having a 4-membered ring to a 10-membered ring. Ring is mentioned.
  • the ring structure formed by connecting R 2 and R 3 to each other may be monocyclic or polycyclic.
  • a pyrrolidine ring a pyrroline ring, an imidazolidine ring, an imidazoline ring, an oxazoline ring, a thiazolin ring, a piperidine ring, a morpholine ring, a piperazine ring, an indol ring, an isoindole ring and the following formula (I-3).
  • Ring structure can be mentioned.
  • X represents a nitrogen atom, an oxygen atom, and a sulfur atom.
  • Ring W 1 represents a ring having a nitrogen atom and X as constituent elements.
  • Ring W 1 is preferably a 5-membered ring or a 6-membered ring having a nitrogen atom and X as constituent elements.
  • Specific examples of the ring structure represented by the formula (I-3) include the following rings.
  • the ring structure formed by bonding R 2 and R 3 to each other may have a substituent, and the substituent may be a carbon such as a methyl group, an ethyl group, a propyl group, a butyl group or an isobutyl group.
  • Alkyl group of number 1 to 12; alkoxy group having 1 to 12 carbon atoms such as methoxy group, ethoxy group, propoxy group, butoxy group and the like can be mentioned.
  • the ring structure formed by bonding R 2 and R 3 to each other is preferably a ring structure represented by the following formula (I-4).
  • R 11 has the same meaning as above.
  • m2 represents an integer from 1 to 7.
  • R 11a , R 11b , R 11c and R 11d each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. * Represents a bond with a carbon atom.
  • m2 is preferably 2 or 3, more preferably 2.
  • Examples of the ring structure formed by bonding R 2 and R 4 to each other include a nitrogen-containing ring structure having a 4-membered ring to a 10-membered ring, and a nitrogen-containing ring structure having a 5-membered ring to a 9-membered ring is preferable.
  • the ring structure formed by bonding R 2 and R 4 to each other may be monocyclic or polycyclic. These rings may have substituents. Examples of such a ring structure include a pyrrole ring, an indole ring, a pyrimidine ring, and the rings described below.
  • the ring structure formed by bonding R 2 and R 4 to each other may have a substituent, and the substituent may have a number of carbon atoms such as a methyl group, an ethyl group, a propyl group, a butyl group and an isobutyl group.
  • R 22A and R 22B each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms); 1 to 12 carbon atoms such as a methyl thio group, an ethyl thio group, a propyl thio group, a butyl thio group, a pentyl thio group, etc.
  • Alkylthio group examples thereof include a heterocyclic group having 4 to 9 carbon atoms such as a pyrrolidinyl group, a piperidinyl group and a morpholinyl group.
  • a phenyl group and the like can be mentioned.
  • Examples of the ring structure formed by connecting R 5 and R 7 to each other include the ring structures described below.
  • the ring structure formed by bonding R 5 and R 7 to each other may have a substituent, and the substituent may have a number of carbon atoms such as a methyl group, an ethyl group, a propyl group, a butyl group and an isobutyl group.
  • Alkyl groups of 1 to 12; alkoxy groups having 1 to 12 carbon atoms such as methoxy group, ethoxy group, propoxy group, butoxy group and the like can be mentioned.
  • Examples of the ring structure formed by connecting R 6 and R 7 to each other include the ring structure described below.
  • the ring structure formed by bonding R 6 and R 7 to each other may have substituents (R 1 to R 16 in the following formula), and the substituents include a methyl group, an ethyl group and a propyl group.
  • An alkyl group having 1 to 12 carbon atoms such as a group, a butyl group and an isobutyl group; an alkoxy group having 1 to 12 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group and a butoxy group; Be done.
  • * represents a bond with a carbon atom.
  • Examples of the ethylenically unsaturated group represented by R 1 to R 7 include a vinyl group, an ⁇ -methyl vinyl group, an acryloyl group, a metaacryloyl group, an allyl group, a styryl group and a group represented by the formula (I-2). Can be mentioned.
  • X 2 represents a vinyl group, an acryloyl group or a meta-acryloyl group.
  • R 115 represents a divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms, and -CH 2- contained in the aliphatic hydrocarbon group is -O-, -CO-, -CS- or NR 116. It may be replaced with-.
  • R 116 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. * Represents a bond with a carbon atom or a nitrogen atom.
  • Examples of the divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms represented by R 115 include a methylene group, an ethylene group, a propane-1,3-diyl group, a propane-1,2-diyl group and butane-1.
  • the ethylenically unsaturated groups represented by R 1 to R 7 are preferably vinyl groups, acryloyl groups, metaacryloyl groups, and groups represented by the formula (I-2), respectively.
  • any one of R 6 and R 7 is an electron-withdrawing group. It is preferable that either one of R 6 and R 7 is an ethylenically unsaturated group.
  • the structural unit derived from the compound represented by the formula (I) is preferably a structural unit derived from the compound represented by the formula (II).
  • R 11 , R 12 , R 13 , R 14 and R 15 are aliphatic hydrocarbons having 1 to 25 carbon atoms which may independently have a hydrogen atom and a substituent. Represents an aromatic hydrocarbon group or a heterocyclic group having 6 to 15 carbon atoms which may have a group or a substituent, and —CH 2 ⁇ contained in the aliphatic hydrocarbon group or the aromatic hydrocarbon group is It may be substituted with -NR 11A- , -SO 2- , -CO-, -O- or S-.
  • R 16 and R 17 independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, an electron-withdrawing group, or an ethylenically unsaturated group.
  • R 11A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
  • R 12 and R 13 may be connected to each other to form a ring structure, and R 12 and R 14 may be connected to each other to form a ring structure.
  • either one of R 16 or R 17 is an ethylenically unsaturated group.
  • R 11 ⁇ The substituent may have a number of 1 to 25 aliphatic carbon hydrocarbon groups represented by R 15, carbon atoms 1 may have a substituent represented by R 1 ⁇ The same as the 25 aliphatic hydrocarbon groups can be mentioned.
  • the aromatic hydrocarbon group having 6 to 15 carbon atoms which may have a substituent represented by R 11 to R 15 may have a substituent represented by R 1 and has 6 carbon atoms.
  • the same as the aromatic hydrocarbon groups of ⁇ 15 can be mentioned.
  • Examples of the heterocycle represented by R 11 to R 15 include the same heterocycle represented by R 1.
  • Examples of the alkyl group having 1 to 25 carbon atoms represented by R 16 and R 17 include the same alkyl group having 1 to 25 carbon atoms represented by R 6.
  • Examples of the electron-withdrawing group represented by R 16 and R 17 include the same as the electron-withdrawing group represented by R 6.
  • Examples of the alkyl group having 1 to 6 carbon atoms represented by R 11A and R 11B include the same alkyl group having 1 to 6 carbon atoms represented by R 1A.
  • Examples of the ring structure in which R 12 and R 13 can be formed by connecting with each other include the same ring structure in which R 2 and R 3 can be formed by connecting with each other.
  • the ring structure that can be formed by connecting R 12 and R 13 to each other is preferably a monocyclic structure.
  • Examples of the ring structure in which R 12 and R 14 can be formed by connecting with each other include the same ring structure in which R 2 and R 4 can be formed by connecting with each other.
  • the ring structure that can be formed by connecting R 12 and R 14 to each other is preferably a monocyclic structure.
  • the ring structure formed by connecting R 12 and R 14 to each other is preferably an aromatic ring, and more preferably a pyrimidine ring structure.
  • R 11 , R 13 and R 15 are preferably aliphatic hydrocarbon groups having 1 to 25 carbon atoms, which may independently have a substituent, and may have a substituent. It is more preferably an alkyl group having 1 to 25 carbon atoms, and further preferably an alkyl group having 1 to 12 carbon atoms which may have a substituent.
  • R 11 is preferably an aliphatic hydrocarbon group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, and even more preferably a methyl group.
  • R 12 and R 14 are independently aliphatic hydrocarbon groups having 1 to 25 carbon atoms which may have substituents, or R 12 and R 14 are linked to each other to form a ring structure.
  • R 12 and R 13 are preferably connected to each other to form a ring structure, and more preferably a ring structure represented by the above formula (I-4).
  • the ring structures represented by the formula (I-4) the ring structure represented by the formula (I-4-1) or the ring structure represented by the formula (I-4-2) is particularly preferable. It is preferably a ring structure represented by the formula (I-4-1). It is preferable that one of R 16 and R 17 is an ethylenically unsaturated group and the other is an electron-withdrawing group.
  • the electron-withdrawing groups represented by R 16 and R 17 may be independently represented by a cyano group, a nitro group, a fluoro group, a trifluoromethyl group, and a group represented by the formula (I-1). preferable. Particularly preferably, it is a cyano group.
  • the ethylenically unsaturated groups represented by R 16 and R 17 are preferably vinyl groups, acryloyl groups, metaacryloyl groups, and groups represented by the formula (I-2), respectively.
  • the compound represented by the formula (II) in which R 12 and R 13 are connected to each other to form a ring structure is a compound represented by the formula (II-A-1) or a compound represented by the formula (II-A-2). ) Is preferable.
  • the compound represented by the formula (II) in which R 12 and R 14 are linked to each other to form a ring structure is preferably a compound represented by the formula (II-B-1). [In formula (II-A-1), formula (II-A-2) and formula (II-B-1), R 11 , R 14 , R 15 , R 16 and R 17 , respectively have the same meaning as above. Represents.
  • R 11e , R 11f , R 11g , R 11h , R 11k , R 11m , and R 11n each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.
  • R 11q and R 11p are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, and a group represented by -NR 22A R 22B (R 22A and R 22B are each independently a hydrogen atom or a hydrogen atom or a group. Represents an alkyl group having 1 to 6 carbon atoms) or a heterocycle. ]
  • the compound represented by the formula (II) in which the electron-withdrawing group is a cyano group is obtained by reacting the compound represented by the following formula (I') with the compound represented by the formula (L).
  • R 222 represents a divalent linking group and X 2 represents a polymerizable group.
  • the reaction between the compound represented by the formula (I') and the compound represented by the formula (L) can be carried out under any conditions used for general Knephener gel condensation. For example, it is preferable to carry out in the presence of a base or a carboxylic acid anhydride.
  • Examples of the base include triethylamine, N, N-diisopropylethylamine, pyridine, piperidine, pyrrolidine, proline, N, N-dimethylaminopyridine, imidazole, sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium hydrogen carbonate. , Potassium hydrogen carbonate, potassium hydroxide butoxide, sodium hydroxide, sodium hydrogen and the like.
  • Examples of the carboxylic acid anhydride include acetic anhydride, succinic anhydride, phthalic anhydride, maleic anhydride, benzoic anhydride and the like.
  • the amount of the base used is preferably 0.1 to 10 mol with respect to 1 mol of the compound represented by the formula (I').
  • the amount of acetic anhydride used is preferably 0.2 to 5 mol with respect to 1 mol of the compound represented by the formula (I').
  • the reaction between the compound represented by the formula (I') and the compound represented by the formula (L) is preferably carried out in an organic solvent.
  • the organic solvent include toluene, acetonitrile, dichloromethane, trichloromethane and the like.
  • the reaction between the compound represented by the formula (I') and the compound represented by the formula (L) is to mix the compound represented by the formula (I') and the compound represented by the formula (L). It will be carried out at.
  • the reaction temperature of the compound represented by the formula (I') and the compound represented by the formula (L) is preferably ⁇ 40 to 130 ° C., and the reaction time is usually preferably 1 to 24 hours.
  • the compound represented by the formula (I') can be synthesized, for example, according to the method described in JP-A-2014-194508.
  • the compound represented by the formula (L) can be obtained, for example, by reacting cyanoacetic acid with a hydroxyalkyl acrylate.
  • the amount of cyanoacetic acid used is preferably 0.5 to 3 mol with respect to 1 mol of the hydroxyalkyl acrylate.
  • the reaction between cyanoacetic acid and hydroxyalkyl acrylate can be carried out using any esterification catalyst used in general esterification reactions, but is preferably carried out in the presence of a base and a carbodiimide condensing agent.
  • Examples of the base include triethylamine, diisopropylethylamine, pyridine, piperidine, pyrrolidine, proline, N, N-dimethylaminopyridine, imidazole, sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate. , Potassium hydroxide, sodium hydroxide, sodium hydrogen and the like.
  • Examples of the carbodiimide condensing agent include N, N-dicyclohexylcarbodiimide, N, N-diisopropylcarbodiimide, 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride and the like.
  • the amount of the base used is preferably 0.5 to 5 mol with respect to 1 mol of cyanoacetic acid.
  • the reaction between cyanoacetic acid and hydroxyalkyl acrylate is preferably carried out in an organic solvent.
  • the organic solvent include acetonitrile, isopropanol, toluene, trichloromethane, dichloromethane and the like.
  • the reaction between cyanoacetic acid and hydroxyalkyl acrylate is carried out by mixing cyanoacetic acid and hydroxyalkyl acrylate.
  • the reaction temperature of cyanoacetic acid and hydroxyalkyl acrylate is preferably ⁇ 40 to 130 ° C., and the reaction time is usually preferably 1 to 24 hours.
  • Examples of the compound having a polymerizable group and a merocyanine structure include the compounds described below.
  • the resin (A) may be a homopolymer of a structural unit having a merocyanine structure in the side chain, or a copolymer containing a structural unit having a merocyanine structure in the side chain and other structural units.
  • the resin (A) is preferably a copolymer.
  • Examples of the structural unit that the resin (A) may contain in addition to the structural unit having a merocyanine structure in the side chain include the structural units described in the following group A.
  • Group A Structural unit derived from (meth) acrylic acid ester, structural unit derived from styrene-based monomer, structural unit derived from vinyl-based monomer, structural unit represented by the formula (a), formula ( The structural unit represented by b) and the structural unit represented by the formula (c).
  • Ra1 represents a divalent hydrocarbon group.
  • R b1 and R b2 independently represent a hydrogen atom or a hydrocarbon group.
  • R c1 and R c2 each independently represent a divalent hydrocarbon group.
  • Examples of the (meth) acrylic acid ester include methyl (meth) acrylic acid, ethyl (meth) acrylic acid, n-propyl (meth) acrylic acid, n-butyl (meth) acrylic acid, n-pentyl (meth) acrylic acid, and the like.
  • Linear alkyl esters of (meth) acrylic acids such as n-dodecyl, lauryl (meth) acrylate, stearyl (meth) acrylate; i-propyl (meth) acrylate, i-butyl (meth) acrylate, T-butyl (meth) acrylic acid, i-pentyl (meth) acrylic acid, i-hexyl (meth) acrylic acid, 2-ethylhexyl (meth) acrylic acid, i-octyl (meth) acrylic acid, (meth) acrylic acid Branched alkyl esters of (meth) acrylic acids such as i-nony
  • a substituent-containing (meth) acrylic acid alkyl ester in which a substituent is introduced into the alkyl group in the (meth) acrylic acid alkyl ester can also be mentioned.
  • the substituent of the substituent-containing (meth) acrylic acid alkyl ester is a group that substitutes a hydrogen atom of the alkyl group, and specific examples thereof include a phenyl group, an alkoxy group, and a phenoxy group.
  • substituent-containing (meth) acrylic acid alkyl ester examples include (meth) acrylic acid 2-methoxyethyl, (meth) acrylic acid ethoxymethyl, (meth) acrylic acid phenoxyethyl, and (meth) acrylic acid 2-.
  • substituent-containing (meth) acrylic acid alkyl ester examples include (2-phenoxyethoxy) ethyl, phenoxydiethylene glycol (meth) acrylate, and phenoxypoly (ethylene glycol) (meth) acrylate.
  • Each of these (meth) acrylic acid esters can be used alone, or a plurality of different ones may be used.
  • the resin (A) of the present invention is a structural unit derived from the (meth) acrylic acid alkyl ester (a1) in which the glass transition temperature Tg of the homopolymer is less than 0 ° C. among the (meth) acrylic acid alkyl esters, and the homopolymer. It preferably contains a structural unit derived from the (meth) acrylic acid alkyl ester (a2) having a Tg of 0 ° C. or higher. This is advantageous in increasing the high temperature durability of the pressure-sensitive adhesive layer.
  • Tg of the homopolymer of the (meth) acrylic acid alkyl ester a literature value such as POLYMER HANDBOOK (Wiley-Interscience) can be adopted.
  • (meth) acrylic acid alkyl ester (a1) examples include ethyl acrylate, n- and i-propyl acrylate, n- and i-butyl acrylate, n-pentyl acrylate, n- and i- acrylate. Hexyl, n-heptyl acrylate, n- and i-octyl acrylate, 2-ethylhexyl acrylate, n- and i-nonyl acrylate, n- and i-decyl acrylate, n-dodecyl acrylate, etc. Contains a (meth) acrylic acid alkyl ester having about 2 to 12 carbon atoms in the alkyl group of.
  • (meth) acrylic acid alkyl ester (a1) only one type may be used, or two or more types may be used in combination. Of these, n-butyl acrylate, n-octyl acrylate, 2-ethylhexyl acrylate and the like are preferable from the viewpoint of followability and reworkability when laminated on an optical film.
  • the (meth) acrylic acid alkyl ester (a2) is a (meth) acrylic acid alkyl ester other than the (meth) acrylic acid alkyl ester (a1).
  • Specific examples of the (meth) acrylic acid alkyl ester (a2) include methyl acrylate, cyclohexyl acrylate, isobolonyl acrylate, stearyl acrylate, t-butyl acrylate and the like.
  • the (meth) acrylic acid alkyl ester (a2) only one type may be used, or two or more types may be used in combination. Among them, from the viewpoint of high temperature durability, the (meth) acrylic acid alkyl ester (a2) preferably contains methyl acrylate, cyclohexyl acrylate, isobolonyl acrylate and the like, and more preferably contains methyl acrylate.
  • the structural unit derived from the (meth) acrylic acid ester a structural unit derived from the (meth) acrylic acid ester having a polar functional group can also be mentioned.
  • the (meth) acrylic acid ester monomer having a polar functional group include (meth) acrylic acid 1-hydroxymethyl, (meth) acrylic acid 1-hydroxyethyl, (meth) acrylic acid 1-hydroxyheptyl, and (meth).
  • styrene-based monomer examples include styrene; methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, triethylstyrene, propylstyrene, butylstyrene, hexylstyrene, heptylstyrene, octylstyrene and other alkylstyrenes; fluorostyrene, Examples thereof include halogenated styrenes such as chlorostyrene, bromostyrene, dibromostyrene and iodostyrene; nitrostyrene; acetylstyrene; methoxystyrene; and divinylbenzene.
  • halogenated styrenes such as chlorostyrene, bromostyrene, dibromostyren
  • vinyl-based monomer examples include fatty acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl 2-ethylhexanoate and vinyl laurate; vinyl halides such as vinyl chloride and vinyl bromide; vinylidene chloride and the like.
  • vinylidene halide nitrogen-containing heteroaromatic vinyl such as vinylpyridine, vinylpyrrolidone and vinylcarbazole; conjugated diene such as butadiene, isoprene and chloroprene; and unsaturated nitriles such as acrylonitrile and methacrylonitrile.
  • the compound that derives the structural unit represented by the formula (a) can be synthesized, for example, by reacting a diisocyanate compound with a polyol.
  • the compound that derives the structural unit represented by the formula (b) can be synthesized, for example, by reacting a silane halide or a silane having a hydroxy group.
  • the compound that derives the structural unit represented by the formula (c) can be synthesized, for example, by reacting a polycarboxylic acid with a polyol.
  • the structural unit selected from the structural units described in group A is preferably a structural unit derived from (meth) acrylic acid ester.
  • the structural unit derived from the (meth) acrylic acid ester is preferably a (meth) acrylic acid alkyl ester and a (meth) acrylic acid alkyl ester having a hydroxy group.
  • the resin (A) of the present invention may contain yet another structural unit (sometimes referred to as a structural unit (aa)).
  • a structural unit derived from a (meth) acrylamide-based monomer a structural unit derived from a monomer having a carboxyl group, a structural unit derived from a monomer having a heterocyclic group, substituted or unsubstituted. Examples thereof include structural units derived from monomers having an amino group.
  • Examples of the (meth) acrylamide-based monomer include N-methylol (meth) acrylamide, N- (2-hydroxyethyl) (meth) acrylamide, N- (3-hydroxypropyl) (meth) acrylamide, and N- (4-).
  • N- (methoxymethyl) acrylamide N- (ethoxymethyl) acrylamide, N- (propoxymethyl) acrylamide, N- (butoxymethyl) acrylamide and N- (2-methylpropoxymethyl) acrylamide are preferable.
  • Examples of the monomer having a carboxyl group include (meth) acrylic acid, carboxyalkyl (meth) acrylate (for example, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate), maleic acid, maleic anhydride, fumaric acid, and the like. Examples thereof include crotonic acid, and acrylic acid is preferable.
  • Examples of the monomer having a heterocyclic group include acryloyl morpholine, vinyl caprolactam, N-vinyl-2-pyrrolidone, vinyl pyridine, tetrahydrofurfuryl (meth) acrylate, caprolactone-modified tetrahydrofurfuryl acrylate, and 3,4-epoxycyclohexylmethyl. Examples thereof include (meth) acrylate, glycidyl (meth) acrylate, and 2,5-dihydrofuran.
  • Examples of the monomer having a substituted or unsubstituted amino group include aminoethyl (meth) acrylate, N, N-dimethylaminoethyl (meth) acrylate, and dimethylaminopropyl (meth) acrylate.
  • the structural unit (aa) other than the structural unit having a merocyanine structure and the structural unit selected from group A is preferably a monomer having a carboxyl group.
  • the content of the structural unit having a merocyanine structure in the side chain is preferably 0.01 to 50 parts by mass, preferably 0.1 to 20 parts by mass, based on 100 parts by mass of all the structural units contained in the resin (A).
  • the amount is more preferably 0.5 to 10 parts by mass.
  • the content of at least one structural unit selected from the structural units described in group A is preferably 50 parts by mass or more, preferably 60 to 99.99 parts by mass, based on 100 parts by mass of all structural units of the resin (A). More preferably, it is by mass.
  • the resin (A) contains the structural unit (aa), it is preferably 20 parts by mass or less, more preferably 0.5 parts by mass or more and 15 parts by mass with respect to 100 parts by mass of all the structural units of the resin (A).
  • it is more preferably 0.5 parts by mass or more and 10 parts by mass or less, and particularly preferably 1 part by mass or more and 7 parts by mass or less.
  • the content of the structural unit is preferably based on 100 parts by mass of the total structural unit of the resin (A). Is 20 parts by mass or less, more preferably 0.5 parts by mass or more and 15 parts by mass or less, further preferably 0.5 parts by mass or more and 10 parts by mass or less, and particularly preferably 1 part by mass or more and 7 parts by mass or less. From the viewpoint of preventing the peeling power of the separate film that can be laminated on the outer surface of the pressure-sensitive adhesive layer from being enhanced, it is preferable that the monomer having an amino group is substantially not contained. Here, substantially not contained means that the amount is 0.1 parts by mass or less out of 100 parts by mass of all the constituent units constituting the resin (A).
  • the resin (A) is a structural unit derived from a (meth) acrylic acid alkyl ester having a hydroxy group or a monomer having a carboxyl group. It is preferable to include a structural unit derived from the structural unit, and it is more preferable to include both a structural unit derived from a (meth) acrylic acid alkyl ester having a hydroxy group and a structural unit derived from a monomer having a carboxyl group.
  • (meth) acrylic acid alkyl ester having a hydroxy group 2-hydroxyethyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 5-hydroxypentyl acrylate, and 6-hydroxyhexyl acrylate are preferable. .. In particular, good durability can be obtained by using 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate and 5-hydroxypentyl acrylate.
  • Acrylic acid is preferably used as the monomer having a carboxyl group.
  • the weight average molecular weight (Mw) of the resin (A) is preferably 300,000 to 2.5 million, and more preferably 500,000 to 2.5 million.
  • the weight average molecular weight is 300,000 or more, the durability of the pressure-sensitive adhesive layer in a high temperature environment is improved, and the floating and peeling between the adherend and the light-selective absorbing pressure-sensitive adhesive layer and the light-selective absorbing pressure-sensitive adhesive are observed. It is easy to suppress defects such as cohesive failure of layers.
  • the weight average molecular weight is 2.5 million or less, it is advantageous from the viewpoint of coatability when the pressure-sensitive adhesive composition is processed into, for example, a sheet (coating on a base material).
  • the weight average molecular weight is preferably 600,000 to 1.8 million, more preferably 700,000 to 1.7 million. Particularly preferably, it is 1 million to 1.6 million.
  • the molecular weight distribution (Mw / Mn) represented by the ratio of the weight average molecular weight (Mw) to the number average molecular weight (Mn) is usually 2 to 10, preferably 3 to 8.
  • the weight average molecular weight can be analyzed by gel permeation chromatography and is a value in terms of standard polystyrene.
  • the viscosity at 25 ° C. is preferably 20 Pa ⁇ s or less, and more preferably 0.1 to 15 Pa ⁇ s. preferable.
  • a viscosity in this range is advantageous from the viewpoint of coatability when the pressure-sensitive adhesive composition is applied to the substrate.
  • the viscosity can be measured with a Brookfield viscometer.
  • the resin (A) of the present invention can be produced by a known method such as a solution polymerization method, a bulk polymerization method, a suspension polymerization method, or an emulsion polymerization method, and the solution polymerization method is particularly preferable.
  • a solution polymerization method for example, a monomer and an organic solvent are mixed, a thermal polymerization initiator is added under a nitrogen atmosphere, and the temperature conditions are 40 to 90 ° C., preferably 50 to 80 ° C., 3 to 15 A method of stirring for about an hour can be mentioned.
  • monomers and thermal polymerization initiators may be added continuously or intermittently during the polymerization. The monomer and the heat initiator may be in a state of being added to an organic solvent.
  • the polymerization initiator a thermal polymerization initiator, a photopolymerization initiator, or the like is used.
  • the photopolymerization initiator include 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone.
  • thermal polymerization initiator examples include 2,2'-azobisisobutyronitrile, 2,2'-azobis (2-methylbutyronitrile), 1,1'-azobis (cyclohexane-1-carbonitrile), and 2 , 2'-azobis (2,4-dimethylvaleronitrile), 2,2'-azobis (2,4-dimethyl-4-methoxyvaleronitrile), dimethyl-2,2'-azobis (2-methylpropionate) ), 2,2'-Azobis (2-hydroxymethylpropionitrile) and other azo compounds; lauryl peroxide, t-butyl hydroperoxide, benzoyl peroxide, t-butyl peroxybenzoate, cumene hydroperoxide, Organic peroxides such as diisopropylperoxydicarbonate, dipropylperoxydicarbonate, t-butylperoxyneodecanoate, t-butylperoxypivalate, (3,5,5-
  • the ratio of the polymerization initiator is about 0.001 to 5 parts by mass with respect to 100 parts by mass of the total amount of the monomers constituting the resin (A).
  • a polymerization method using active energy rays for example, ultraviolet rays may be used.
  • Organic solvents include aromatic hydrocarbons such as toluene and xylene; esters such as ethyl acetate and butyl acetate; fatty alcohols such as propyl alcohol and isopropyl alcohol; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone. Can be mentioned.
  • the resin (A) is preferably a resin satisfying the following formula (1), and more preferably a resin satisfying the following formula (2).
  • ⁇ (405) ⁇ 0.02 (1)
  • ⁇ (405) represents the gram extinction coefficient of the resin at a wavelength of 405 nm.
  • the unit of the gram extinction coefficient is L / (g ⁇ cm).
  • ⁇ (405) represents the gram extinction coefficient of the resin at a wavelength of 405 nm
  • ⁇ (440) represents the gram extinction coefficient of the resin at a wavelength of 440 nm.
  • the gram absorbance coefficient of the resin (A) can be measured by the method described in Examples.
  • the pressure-sensitive adhesive composition containing the resin (A) is applied to a display device (FPD: flat panel display) such as an organic electroluminescence display (organic EL display device) or a liquid crystal display device, the resin (A) ⁇ (405) ) Is 0.02 L / (g ⁇ cm) or more, the absorption performance of visible light in the vicinity of 400 nm is good. Deterioration of the organic EL light emitting element due to visible light can be suppressed.
  • the resin (A) can selectively absorb light having a wavelength near 400 nm as the value of ⁇ (405) / ⁇ (440) increases.
  • the value of ⁇ (405) / ⁇ (440) is preferably 5 or more, more preferably 50 or more, further preferably 75 or more, and particularly preferably 100 or more.
  • ⁇ (405) / ⁇ (440) of the resin (A) is 5 or more, the pressure-sensitive adhesive composition containing the resin (A) is displayed on a display device (FPD: flat panel) such as an organic EL display device or a liquid crystal display device. When applied to a display), it can absorb light in the vicinity of 405 nm and suppress photodeterioration of a retardation film, an organic EL element, or the like without disturbing the color expression of the display device.
  • FPD flat panel
  • the pressure-sensitive adhesive composition may further contain a cross-linking agent (B), a silane compound (D), an antistatic agent, a light selective absorber, a resin other than the resin (A), and the like.
  • the content of the resin (A) is usually 60% by mass to 99.99% by mass, preferably 70% by mass to 99.9% by mass, more preferably 70% by mass, based on 100% by mass of the solid content of the pressure-sensitive adhesive composition. Is 80% by mass to 99.7% by mass.
  • the pressure-sensitive adhesive composition can contain a cross-linking agent (B).
  • a cross-linking agent (B) examples include an isocyanate-based cross-linking agent, an epoxy-based cross-linking agent, an aziridine-based cross-linking agent, a metal chelate-based cross-linking agent, and the like. From the viewpoint of speed and the like, an isocyanate-based cross-linking agent is preferable.
  • isocyanate-based compound a compound having at least two isocyanato groups (-NCO) in the molecule is preferable, and for example, an aliphatic isocyanate-based compound (for example, hexamethylene diisocyanate) and an alicyclic isocyanate-based compound (for example, isophorone diisocyanate) are preferable.
  • an aliphatic isocyanate-based compound for example, hexamethylene diisocyanate
  • an alicyclic isocyanate-based compound for example, isophorone diisocyanate
  • Hydrogenated diphenylmethane diisocyanate, hydrogenated xylylene diisocyanate), aromatic isocyanate-based compounds for example, tolylene diisocyanate, xylylene diisocyanate diphenylmethane diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, etc.
  • aromatic isocyanate-based compounds for example, tolylene diisocyanate, xylylene diisocyanate diphenylmethane diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, etc.
  • the cross-linking agent (B) is an adduct (adduct) of the isocyanate compound made of a polyhydric alcohol compound [for example, an adduct made of glycerol, trimethylolpropane, etc.], an isocyanurate, a burette-type compound, a polyether polyol, or a polyester. It may be a derivative such as a urethane prepolymer type isocyanate compound which has been subjected to an addition reaction with a polyol, an acrylic polyol, a polybutadiene polyol, a polyisoprene polyol or the like.
  • the cross-linking agent (B) can be used alone or in combination of two or more.
  • aromatic isocyanate compounds eg, tolylene diisocyanate, xylylene diisocyanate
  • aliphatic isocyanate compounds eg, hexamethylene diisocyanate
  • their polyhydric alcohol compounds eg, glycerol, trimethylolpropane.
  • isocyanurates Is it because the cross-linking agent (B) is an adduct of an aromatic isocyanate compound and / or a polyhydric alcohol compound thereof, or an isocyanurate compound, which is advantageous for forming an optimum cross-linking density (or cross-linking structure)?
  • the durability of the adhesive layer can be improved.
  • an adduct made of a tolylene diisocyanate compound and / or a polyhydric alcohol compound thereof can improve durability even when, for example, an adhesive layer is applied to a polarizing plate.
  • the content of the cross-linking agent (B) is usually 0.01 to 15 parts by weight, preferably 0.05 to 10 parts by weight, and more preferably 0.1 parts by weight with respect to 100 parts by weight of the resin (A). ⁇ 5 parts by weight.
  • the pressure-sensitive adhesive composition may further contain the silane compound (D).
  • the silane compound (D) include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, and 3 -Glysidoxypropylmethyldimethoxysilane, 3-glycidoxypropylethoxydimethylsilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, Examples thereof include 3-methacryloyloxypropyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane.
  • the silane compound (D) may be a silicone oligomer. Specific examples of the silicone oligomer
  • 3-Acryloyloxypropyltriethoxysilane-tetraethoxysilane oligomer 3-acryloyloxypropylmethyldimethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropylmethyldimethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropylmethyldi Acryloyloxypropyl group-containing oligomers such as ethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropylmethyldiethoxysilane-tetraethoxysilane oligomer; vinyltrimethoxysilane-tetramethoxysilane oligomer, vinyltrimethoxysilane-tetraethoxysilane oligomer , Vinyl Triethoxysilane-Tetramethoxysilane oligomer, Vinyltriethoxy
  • the silane compound (D) may be a silane compound represented by the following formula (d1).
  • A represents an alkanediyl group having 1 to 20 carbon atoms or a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, and constitutes the alkanediyl group and the alicyclic hydrocarbon group.
  • -CH 2- may be replaced with -O- or -CO-
  • R 41 represents an alkyl group having 1 to 5 carbon atoms
  • R 42 , R 43 , R 44 , R 45 and R 46 are.
  • Examples of the alkanediyl group having 1 to 20 carbon atoms represented by A include a methylene group, a 1,2-ethanediyl group, a 1,3-propanediyl group, a 1,4-butandyl group, a 1,5-pentanediyl group and 1 , 6-Hexanediyl group, 1,7-heptandyl group, 1,8-octanediyl group, 1,9-nonandyl group, 1,10-decandyl group, 1,12-dodecandyl group, 1,14-tetradecandyl group , 1,16-Hexadecandyl group, 1,18-octadecandyl group and 1,20-icosandyl group.
  • Examples of the divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms include a 1,3-cyclopentanediyl group and a 1,4-cyclohexanediyl group.
  • -CH 2- instead of -O- or -CO- constituting the alcandiyl group and the alicyclic hydrocarbon group is replaced with -CH 2 CH 2- O-CH 2 CH 2- , -CH 2 CH 2- O-CH 2 CH 2- O-CH 2 CH 2- , -CH 2 CH 2- O-CH 2 CH 2- O-CH 2 CH 2- O-CH 2 CH 2- , -CH 2 CH 2- CO-O-CH 2 CH 2- , -CH 2 CH 2- O-CH 2 CH 2- CO-O-CH 2 CH 2- , -CH 2 CH 2 CH 2 CH 2- O-CH 2 CH 2- and CH 2 CH 2 CH 2 CH 2- O-CH 2 CH 2 CH 2- .
  • Examples of the alkyl group having 1 to 5 carbon atoms represented by R 41 to R 45 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group and a pentyl group.
  • the 42-C 1-5 alkoxy group represented by R 45 a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, and a tert- butoxy and pentyloxy groups.
  • silane compound represented by the formula (d1) examples include (trimethoxysilyl) methane, 1,2-bis (trimethoxysilyl) ethane, 1,2-bis (triethoxysilyl) ethane, and 1,3-.
  • (Trimethoxysilyl) hexane and 1,8-bis (trimethoxysilyl) octane are preferable.
  • the content of the silane compound (D) is usually 0.01 to 10 parts by mass, preferably 0.03 to 5 parts by mass, and more preferably 0.05 with respect to 100 parts by mass of the resin (A). It is about 2 parts by mass, more preferably 0.1 to 1 part by mass.
  • the pressure-sensitive adhesive composition may further contain an antistatic agent.
  • the antistatic agent include a surfactant, a siloxane compound, a conductive polymer, an ionic compound and the like, and an ionic compound is preferable.
  • the ionic compound include conventional ones.
  • the cation component constituting the ionic compound include organic cations and inorganic cations.
  • the organic cation include pyridinium cation, pyrrolidinium cation, piperidinium cation, imidazolium cation, ammonium cation, sulfonium cation, phosphonium cation and the like.
  • the inorganic cation examples include alkali metal cations such as lithium cation, potassium cation, sodium cation and cesium cation, and alkaline earth metal cations such as magnesium cation and calcium cation.
  • alkali metal cations such as lithium cation, potassium cation, sodium cation and cesium cation
  • alkaline earth metal cations such as magnesium cation and calcium cation.
  • pyridinium cations, imidazolium cations, pyrrolidinium cations, lithium cations, and potassium cations are preferable from the viewpoint of compatibility with (meth) acrylic resins.
  • the anion component constituting the ionic compound may be either an inorganic anion or an organic anion, but an anion component containing a fluorine atom is preferable from the viewpoint of antistatic performance.
  • anion component containing a fluorine atom examples include hexafluorophosphate anion (PF 6- ), bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-], and bis (fluorosulfonyl) imide anion [(FSO). 2 ) 2 N-], tetra (pentafluorophenyl) borate anion [(C 6 F 5 ) 4 B-] and the like.
  • PF 6- hexafluorophosphate anion
  • bis (trifluoromethanesulfonyl) imide anion (CF 3 SO 2 ) 2 N-]
  • tetra (pentafluorophenyl) borate anion [(C 6 F 5 ) 4 B-] examples of the anion component containing a fluorine atom.
  • bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-], bis (fluorosulfonyl) imide anion [(FSO 2 ) 2 N-], tetra (pentafluorophenyl) borate anion [(C) 6 F 5 ) 4 B-] is preferable.
  • An ionic compound that is solid at room temperature is preferable in terms of the stability over time of the antistatic performance of the light selective absorbing pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition.
  • the content of the antistatic agent is, for example, 0.01 to 20 parts by mass, preferably 0.1 to 10 parts by mass, and more preferably 1 to 7 parts by mass with respect to 100 parts by mass of the resin (A).
  • the pressure-sensitive adhesive composition contains the resin (A) which is a light-selective absorbent polymer, and may or may not contain a light-selective absorbent.
  • the pressure-sensitive adhesive composition preferably does not contain a light selective absorber.
  • the light selective absorber selectively absorbs light having a specific wavelength, and preferably contains a compound having at least one absorption maximum at a wavelength of 360 nm to 420 nm, and preferably contains a compound having an absorption maximum at 380 nm to 410 nm. It is more preferable to include it.
  • the content of the light selective absorber is preferably 0.1 part by mass or less with respect to 100 parts by mass of all the resin components.
  • the content of the light selective absorber is 0 from the viewpoint of suppressing color loss. It is preferably 1 part by mass or less.
  • the photoselective absorber is not particularly limited, but for example, an oxybenzophenone-based photoselective absorber, a benzotriazole-based photoselective absorber, a salicylate ester-based photoselective absorber, a benzophenone-based photoselective absorber, and a cyanoacrylate-based light selective absorber.
  • Organic light selective absorbers such as triazine light selective absorbers.
  • the light selective absorber a commercially available product may be used.
  • a triazine-based light selective absorber "Kemisorb 102" manufactured by Chemipro Kasei Co., Ltd., "ADEKA STAB LA46", “ADEKA STAB LAF70” manufactured by ADEKA Corporation, etc.
  • BASF Japan's “Chinubin 109", “Chinubin 171", “Chinubin 234", “Chinubin 326", “Chinubin 327", “Chinubin 328", “Chinubin 928", “Chinubin 400", “Chinubin 460”, Examples thereof include “Chinubin 405" and "Chinubin 477".
  • Benzotriazole-based photoselective absorbers include “ADEKA STAB LA31” and “ADEKA STAB LA36” manufactured by ADEKA Corporation, and “Sumisorb 200", “Sumisorb 250", “Sumisorb 300", and “Sumisorb 340” manufactured by Sumika Chemtex Co., Ltd. And “Sumisorb 350”, “Kemisorb 74", “Kemisorb 79” and “Kemisorb 279” made by Chemipro Kasei Co., Ltd., "TINUVIN 99-2", “TINUVIN 900” and “TINUVIN 928” made by BASF, etc. Be done.
  • the light selective absorber may be an inorganic light selective absorber.
  • the inorganic light selective absorber include titanium oxide, zinc oxide, indium oxide, tin oxide, talc, kaolin, calcium carbonate, titanium oxide-based composite oxide, zinc oxide-based composite oxide, ITO (tin-doped indium oxide), and the like.
  • ATO antimonated tin oxide
  • the titanium oxide-based composite oxide include silica and zinc oxide doped with alumina.
  • the pressure-sensitive adhesive composition can contain one or more additives such as a solvent, a cross-linking catalyst, a tack fire, a plasticizer, a softening agent, a pigment, a rust preventive, an inorganic filler, and light-scattering fine particles.
  • additives such as a solvent, a cross-linking catalyst, a tack fire, a plasticizer, a softening agent, a pigment, a rust preventive, an inorganic filler, and light-scattering fine particles.
  • the optical laminate of the present invention may further include a retardation layer laminated on the opposite side of the light selective absorbing pressure-sensitive adhesive layer to the polarizer.
  • the retardation layer may be one layer or two or more layers.
  • the optical laminate 200 shown in FIG. 2 includes a first retardation layer 30 and a second retardation layer 31.
  • the retardation layer is an optical film that exhibits optical anisotropy.
  • the optical film exhibiting optical anisotropy include polyvinyl alcohol, polycarbonate, polyester, polyarylate, polyimide, polyolefin, polycycloolefin, polystyrene, polysulfone, polyether sulfone, polyvinylidene fluoride / polymethylmethacrylate, and acetyl.
  • Examples thereof include a stretched film obtained by stretching a polymer film made of cellulose, an ethylene-vinyl acetate copolymer saponified product, polyvinyl chloride, etc. about 1.01 to 6 times.
  • the retardation layer may be a retardation layer made of a cured product of the polymerizable liquid crystal compound, which exhibits optical anisotropy by coating and orienting the polymerizable liquid crystal compound on a base material.
  • the retardation layer includes a retardation layer having zero retardation, and also includes a film called a uniaxial retardation film, a low photoelastic modulus retardation film, a wide viewing angle retardation film, and the like. ..
  • the zero retardation retardation layer is an optically isotropic film in which both the front retardation Re and the thickness direction retardation Rth are -15 to 15 nm.
  • the zero retardation film include a resin film made of a cellulose resin, a polyolefin resin (chain polyolefin resin, polycycloolefin resin, etc.) or a polyethylene terephthalate resin, and the retardation value can be easily controlled and can be obtained.
  • a cellulose-based resin or a polyolefin-based resin is preferable because it is easy.
  • the zero retardation film can also be used as a protective film.
  • Zero retardation films include "Z-TAC” (trade name) sold by FUJIFILM Corporation, "Zero Tuck (registered trademark)” sold by Konica Minolta Opto Co., Ltd., and Zeon Corporation. Examples include “ZF-14" (trade name) sold by.
  • the retardation layer is preferably a retardation layer which is a cured product of a polymerizable liquid crystal compound.
  • the retardation layer which is a cured product of the polymerizable liquid crystal compound, include the first form to the fifth form.
  • First form a retardation layer in which the rod-shaped liquid crystal compound is oriented horizontally with respect to the supporting base material
  • Second form a retardation layer in which the rod-shaped liquid crystal compound is oriented in the direction perpendicular to the supporting base material
  • Third form A retardation layer in which the direction of orientation of the rod-shaped liquid crystal compound changes spirally in the plane
  • Fourth form A retardation layer in which the disk-shaped liquid crystal compound is obliquely oriented
  • Fifth form The disk-shaped liquid crystal compound Biaxial retardation layer oriented perpendicular to the supporting substrate
  • the first form, the second form, and the fifth form are preferably used. Be done.
  • the retardation layers of these forms may be laminated and used.
  • the retardation layer When the retardation layer is a layer made of a polymer in the oriented state of the polymerizable liquid crystal compound (hereinafter, may be referred to as an “optical anisotropic layer”), the retardation layer may have anti-wavelength dispersibility. preferable.
  • the inverse wavelength dispersibility is an optical characteristic in which the in-plane retardation value of the liquid crystal alignment at a short wavelength is smaller than the in-plane retardation value of the liquid crystal alignment at a long wavelength. (7) and equation (8) are satisfied.
  • Re ( ⁇ ) represents an in-plane retardation value with respect to light having a wavelength of ⁇ nm.
  • the retardation layer has the first form and anti-wavelength dispersibility
  • Examples thereof include the above-mentioned polymerizable liquid crystal compounds.
  • Examples of the method for producing the retardation layer from the polymer in the oriented state of the polymerizable liquid crystal compound include the methods described in JP-A-2010-31223.
  • the thickness of the retardation layer which is a liquid crystal cured layer obtained by curing a polymerizable liquid crystal compound, is, for example, 0.1 ⁇ m or more and 10 ⁇ m or less, preferably 0.5 ⁇ m or more and 8 ⁇ m or less, and more preferably 1 ⁇ m or more and 6 ⁇ m or less. is there.
  • a retardation layer that develops optical anisotropy by coating and orientation of a liquid crystal compound and a retardation layer that develops optical anisotropy by coating an inorganic layered compound are called temperature-compensated retardation films.
  • VAC film "(trade name; biaxially oriented film) and the like can be mentioned.
  • the retardation layer is a ⁇ / 4 retardation layer that imparts a phase difference of 1/4 wavelength to transmitted light, a ⁇ / 2 retardation layer that imparts a phase difference of 1/2 wavelength to transmitted light, and a positive A plate. , And can be a positive C plate.
  • the combination of the first retardation layer 30 and the second retardation layer 31 is the ⁇ / 2 position. Examples thereof include a combination of a retardation layer and a ⁇ / 4 retardation layer, a combination of a ⁇ / 4 retardation layer and a positive C layer, and the like.
  • the optical laminate of the present invention may be configured as a circularly polarizing plate having a ⁇ / 4 retardation layer.
  • the circular polarizing plate can be used as an antireflection polarizing plate.
  • the optical laminate of the present invention can include a laminating layer for joining the two layers.
  • the bonding layer include an adhesive layer and a pressure-sensitive adhesive layer (hereinafter, also referred to as “second pressure-sensitive adhesive layer”).
  • the optical laminate 200 shown in FIG. 2 has an adhesive layer 33 that is interposed between the first retardation layer 30 and the second retardation layer 31 and joins them, and an adhesive layer of the second retardation layer 31. It includes a second pressure-sensitive adhesive layer 32 laminated on the surface opposite to 33.
  • the adhesive layer a water-based adhesive, an active energy ray-curable adhesive, a thermosetting adhesive, or the like is used.
  • the thickness of the adhesive layer is, for example, 10 nm or more and 20 ⁇ m or less, preferably 100 nm or more and 10 ⁇ m or less, and more preferably 500 nm or more and 5 ⁇ m or less.
  • the second pressure-sensitive adhesive layer may be composed of the same pressure-sensitive adhesive composition as the pressure-sensitive adhesive composition forming the above-mentioned light-selective absorbing pressure-sensitive adhesive layer, and may be composed of (meth) acrylic-based, rubber-based, urethane-based, or the like. It may be composed of a pressure-sensitive adhesive composition (hereinafter, also referred to as “second pressure-sensitive adhesive composition”) containing a resin as a main component, such as an ester-based, a silicone-based, or a polyvinyl ether-based resin.
  • a pressure-sensitive adhesive composition using a (meth) acrylic resin having excellent transparency, weather resistance, heat resistance and the like as a base polymer is suitable.
  • the second pressure-sensitive adhesive composition may be an active energy ray-curable type or a thermosetting type.
  • the thickness of the second pressure-sensitive adhesive layer is usually 0.1 ⁇ m or more and 150 ⁇ m or less, for example, 8 ⁇ m or more and 60 ⁇ m or less, preferably 30 ⁇ m or less, and more preferably 20 ⁇ m or less from the viewpoint of thinning.
  • the optical laminates 100 and 200 can be manufactured by a method including a step of laminating layers constituting the laminate 100 via a laminating layer.
  • a surface activation treatment such as a corona treatment on one or both of the bonding surfaces in order to improve the adhesion.
  • the optical laminate of the present invention has a planar shape, and its area is, for example, 30 mm ⁇ 30 mm to 180 mm ⁇ 90 mm.
  • the optical laminate of the present invention may be a rectangle such as a rectangle or a square, a shape having a notch portion in which a part of the side constituting the rectangle is cut out, a semicircular shape, or a through hole in the plane. It may be a so-called irregular shape such as a shape having.
  • the absorption axis of the polarizer constituting the optical laminate may be parallel to the side, orthogonal to the side, or diagonally, for example. They may intersect at an angle of 45 °.
  • the slow-phase axis and the absorption axis of the polarizer constituting the optical laminate intersect at 45 °. It may intersect at 15 °, or at 75 °.
  • the optical laminates 100 and 200 are arranged on the front surface (visual side) of the image display panel and can be used as a component of the image display device.
  • the optical laminate which is a circularly polarizing plate, can also be used as an antireflection polarizing plate that imparts an antireflection function in an image display device.
  • the image display device is not particularly limited, and examples thereof include an image display device such as an organic electroluminescence (organic EL) display device, an inorganic electroluminescence (inorganic EL) display device, a liquid crystal display device, and an electric field emission display device.
  • aqueous boric acid solution 1 containing 5.5 parts by weight of boric acid and 15 parts by weight of potassium iodide per 100 parts by weight of water at 64 ° C. for 110 seconds.
  • boric acid aqueous solution 2 containing 5.5 parts by weight of boric acid and 15 parts by weight of potassium iodide per 100 parts by weight of water at 67 ° C. for 30 seconds.
  • the thickness of the obtained polarizer was 8 ⁇ m, and the boron content was 4.3% by weight.
  • the protective film A a film having a hard coat layer having a thickness of 3 ⁇ m formed on a stretched film made of a norbornene resin having a thickness of 25 ⁇ m (manufactured by Nippon Paper Industries, Ltd., trade name “COP25ST-HC”) was used.
  • the release film B a triacetyl cellulose film (manufactured by FUJIFILM Corporation, "TD80UL”) was used.
  • the thickness of the release film is 80 [mu] m, the moisture permeability was 502g / m 2 ⁇ 24hr.
  • the produced polarizer was continuously conveyed, the protective film A was continuously unwound from the roll of the protective film A, and the release film B was continuously unwound from the roll of the release film B.
  • a water-based adhesive is injected between the polarizer and the corona-treated protective film A, and pure water is injected between the polarizer and the release film B, and the film is passed through a bonding roll to adhere the protective film A / water-based adhesive.
  • a laminated film composed of an agent / polarizer / pure water / release film B was obtained. The laminated film is transported and heat-treated at 80 ° C.
  • a single-sided protective polarizing plate with a release film was obtained.
  • the release film B was peeled from the single-sided protective polarizing plate with a release film to obtain a single-sided protective polarizing plate.
  • First liquid crystal cured layer As the first liquid crystal cured layer (first retardation layer), a layer formed by curing a nematic liquid crystal compound, an alignment film, and a transparent substrate, which gives a phase difference of ⁇ / 4, was used. The total thickness of the cured layer and the oriented layer of the nematic liquid crystal compound was 2 ⁇ m.
  • composition for forming an oriented layer 10.0 parts by mass of polyethylene glycol di (meth) acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., A-600) and trimethylolpropan triacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) 10.0 parts by mass of A-TMPT) and 10.0 parts by mass of 1,6-hexanediol di (meth) acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-HD-N), and Irgacure as a photopolymerization initiator. 1.50 parts by mass of 907 (Irg-907, manufactured by BASF) was dissolved in 70.0 parts by mass of the solvent methyl ethyl ketone to prepare a coating liquid for forming an orientation layer.
  • 907 Irg-907, manufactured by BASF
  • a long cyclic olefin resin (COP) film (manufactured by Nippon Zeon Corporation) with a thickness of 20 ⁇ m is prepared as a base film, and a coating liquid for forming an alignment layer is applied to one side of the base film with a bar coater. did.
  • COP cyclic olefin resin
  • the coating layer after coating is heat-treated at a temperature of 80 ° C. for 60 seconds, it is irradiated with ultraviolet rays (UVB) at 220 mJ / cm 2 to polymerize and cure the composition for forming an orientation layer to form a base film.
  • UVB ultraviolet rays
  • a photopolymerizable nematic liquid crystal compound (RMM28B, manufactured by Merck) as a composition for forming a retardation layer
  • 1.0 mass by Irgacure 907 (Irg-907, manufactured by BASF) as a photopolymerization initiator.
  • the parts were dissolved in 80.0 parts by mass of the solvent propylene glycol monomethyl ether acetate to prepare a coating liquid for forming a retardation layer.
  • a coating liquid for forming a retardation layer was applied onto the previously obtained alignment layer, and the coating layer was heat-treated at a temperature of 80 ° C. for 60 seconds. Then, it was irradiated with ultraviolet rays (UVB) at 220 mJ / cm 2 to polymerize and cure the composition for forming a retardation layer to form a retardation layer having a thickness of 0.7 ⁇ m on the alignment layer. In this way, a second liquid crystal cured layer (second retardation layer) having a thickness of 3 ⁇ m composed of an alignment layer and a retardation layer was obtained on the base film.
  • UVB ultraviolet rays
  • the first liquid crystal layer and the second liquid crystal layer were bonded to each other with an ultraviolet curable adhesive (thickness 1 ⁇ m) so that the respective liquid crystal layer surfaces (the surface opposite to the base film) were bonded surfaces.
  • the ultraviolet curable adhesive was cured by irradiating with ultraviolet rays to prepare a retardation laminate including two retardation layers, a first liquid crystal curing layer and a second liquid crystal curing layer.
  • the thickness of the retardation laminate including the first liquid crystal cured layer, the ultraviolet curable adhesive layer, and the second liquid crystal cured layer was 6 ⁇ m.
  • the obtained crude product was recrystallized from isopropanol to obtain 10 parts of the compound represented by UVA-01.
  • the obtained compound represented by UVA-01 was identified by LC-MS and 1 H-NMR.
  • a total amount of a solution prepared by dissolving 0.4 part of azobisisobutyronitrile (polymerization initiator) in 10 parts of ethyl acetate was added.
  • the obtained mixture was held at 60 ° C. for 1 hour, and then ethyl acetate was continuously added into the reaction vessel at an addition rate of 17.3 parts / hr while maintaining the internal temperature at 50 to 70 ° C. to increase the concentration of the acrylic resin.
  • the concentration reached 35% the addition of ethyl acetate was stopped, and the internal temperature was kept at 50 to 70 ° C. until 12 hours had passed from the start of the addition of ethyl acetate.
  • Ethyl acetate was added to the obtained mixture of the photoselective absorbent polymer (A-1) to adjust the concentration of the resin component to 20%, and the ethyl acetate of the photoselective absorbent polymer (A-1) was adjusted.
  • the solution was prepared.
  • the photoselective absorbent polymer (A-1) had a polystyrene-equivalent weight average molecular weight Mw of 500,000 and Mw / Mn of 7.5 by GPC.
  • the glass transition temperature by DSC was ⁇ 48.4 ° C.
  • Adhesive Composition (Preparation of Adhesive Composition and Adhesive Layer) (A) Preparation of Adhesive Composition A cross-linking agent (Coronate L,) was added to an ethyl acetate solution (resin concentration: 20%) of the photoselective absorbent polymer (A-1) with respect to 100 parts of the solid content of the solution. Mix 0.5 parts of solid content 75% (manufactured by Toso) and 0.5 part of silane compound (manufactured by Shinetsu Chemical Industry: KBM-403), and add 2-butanone so that the solid content concentration becomes 14%. The pressure-sensitive adhesive composition (1) was obtained. The blending amount of the cross-linking agent (Coronate L) is the number of parts by mass as the active ingredient.
  • the agent composition was applied using an applicator so that the thickness of the pressure-sensitive adhesive layer after drying was 5 ⁇ m, and dried at 100 ° C. for 1 minute to prepare a pressure-sensitive adhesive layer.
  • the obtained pressure-sensitive adhesive layer was designated as a pressure-sensitive adhesive layer (1).
  • the pressure-sensitive adhesive layer (2) was prepared in the same manner as the pressure-sensitive adhesive layer (1) of Example 1.
  • the photoselective absorbent polymer (A-2) contains 95 parts by mass of BA and the amount of the photoselective absorbent monomer represented by UVA-01 in the preparation of the photoselective absorbent polymer (A-1). The only difference is that it is 2 parts by mass.
  • the photoselective absorbent polymer (A-2) had a polystyrene-equivalent weight average molecular weight Mw of 500,000 and Mw / Mn of 6.3 according to GPC.
  • the pressure-sensitive adhesive layer (3) was prepared in the same manner as the pressure-sensitive adhesive layer (1) of Example 1.
  • the photoselective absorbent polymer (A-3) contains 93 parts by mass of BA and the amount of the photoselective absorbent monomer represented by UVA-01 in the preparation of the photoselective absorbent polymer (A-1). The only difference is that it is 4 parts by mass.
  • the photoselective absorbent polymer (A-3) had a polystyrene-equivalent weight average molecular weight Mw of 600,000 and Mw / Mn of 7.0 according to GPC.
  • ⁇ Adhesive layer (4) used in the optical laminate of Comparative Example 1> (Adjustment of acrylic resin (A-4))
  • A-4 acrylic resin
  • 61.9 parts of butyl acrylate and 1.9 parts of 2-hydroxyethyl acrylate and 86.4 parts of ethyl acetate as a solvent were added.
  • the mixed solution was charged, and the internal temperature was raised to 60 ° C. while replacing the air in the apparatus with nitrogen gas to make it oxygen-free.
  • acrylic resin (A-4) had a polystyrene-equivalent weight average molecular weight Mw of 600,000 and Mw / Mn of 7.0 by GPC. This is referred to as acrylic resin (A-4).
  • the glass transition temperature by DSC was ⁇ 52.9 ° C.
  • the pressure-sensitive adhesive layer (5) used in the optical laminate of Comparative Example 2 was prepared by the same method as the preparation of the pressure-sensitive adhesive layer (4) except that the blending amount of the light selective absorber was 3.7 parts.
  • the pressure-sensitive adhesive layer was prepared by the same method as in the preparation of the pressure-sensitive adhesive layer (4) except that the blending amount of the light selective absorber was 2.5 parts and the thickness of the pressure-sensitive adhesive layer was 17 ⁇ m. (6) was prepared.
  • the pressure-sensitive adhesive composition (7) is applied to the release-treated surface of the separator used for producing the light-selective absorbing pressure-sensitive adhesive layer using an applicator so that the thickness of the pressure-sensitive adhesive layer after drying is 15 ⁇ m or 25 ⁇ m. Then, it was dried at 100 ° C. for 1 minute to prepare a second pressure-sensitive adhesive layer.
  • Example 1 The pressure-sensitive adhesive layer (1) was attached to the polarizer side of the prepared single-sided protective polarizing plate, and the separator was peeled off. The surface from which the separator of the pressure-sensitive adhesive layer (1) was peeled off was bonded to the first liquid crystal cured layer side of the produced retardation laminate, and the base film of the second liquid crystal cured layer was peeled off. A second pressure-sensitive adhesive layer with a separator having the thickness shown in Table 1 was attached to the surface from which the base film was peeled off.
  • the optical laminate of Example 1 had a configuration as shown in FIG.
  • Examples 2 and 3, Comparative Examples 1 to 3 By the same method as the optical laminate of Example 1, the adhesive layer (2) was used instead of the adhesive layer (1) of Example 1, and the optical laminate of Example 2 was subjected to the adhesive layer (3).
  • the optical laminate of Example 3 was used, the optical laminate of Comparative Example 1 was used with the pressure-sensitive adhesive layer (4), and the optical laminate of Comparative Example 2 was used with the pressure-sensitive adhesive layer (5).
  • the optical laminate of Comparative Example 3 was prepared using the layer (6).
  • the pressure-sensitive adhesive layer (6) is bonded to the glass from the pressure-sensitive adhesive layer (1), the separator is peeled off, and then a cycloolefin polymer (COP) film (ZF-14 manufactured by Nippon Zeon Corporation) is attached to the pressure-sensitive adhesive layer. Then, a laminate for evaluating the pressure-sensitive adhesive layer was prepared.
  • the laminate for evaluating the pressure-sensitive adhesive layer was set on a spectrophotometer UV-2450 (manufactured by Shimadzu Corporation), and the absorbance was measured in the wavelength range of 300 to 800 nm in 1 nm steps by the double beam method. Table 1 shows the absorbance of the prepared pressure-sensitive adhesive layer at a wavelength of 410 nm.
  • the absorbance of the glass and the absorbance of the COP film at a wavelength of 410 nm are both 0.
  • the weight average molecular weight (Mw) of the photoselective absorbent polymers (A-1), (A-2), (A-3) and the acrylic resin (A-4) is defined as the polystyrene-equivalent number average molecular weight (Mn).
  • Tetrahydrofuran was used as the mobile phase, and it was determined by the following size exclusion chromatography (SEC).
  • SEC size exclusion chromatography
  • the (meth) acrylic polymer to be measured was dissolved in tetrahydrofuran at a concentration of about 0.05% by mass, and 10 ⁇ L was injected into SEC.
  • the mobile phase was flowed at a flow rate of 1.0 mL / min.
  • PLgel MIXED-B manufactured by Polymer Laboratories
  • a UV-VIS detector (trade name: Agilent GPC) was used as the detector.
  • FIG. 4 shows an example of the converted data.
  • the midpoint between the color loss region 51 and the non-color loss region 52 (middle of the color loss gradation) in the gradation profile in the direction perpendicular to the end 50 of the optical laminate (arrow in FIG. 3) is the color loss of the optical laminate.
  • FIG. 4 shows an example of the converted data.
  • the distance ( ⁇ m) from the end portion 50 of the optical laminate to the color loss end portion was measured as the color loss distance.
  • Table 1 shows the color loss distance of the optical laminate. The smaller the color loss distance, the narrower the color loss range and the better the moisture resistance and heat resistance.
  • Example 1 and Comparative Example 1, Example 2 and Comparative Example 2, and Example 3 and Comparative Example 3 were compared, and the difference and the difference.
  • Table 1 shows the improvement rate of the color loss distance ((absolute value of difference / color loss distance of Comparative Examples 1 to 3) ⁇ 100).
  • Polarizer 10 Polarizer, 11 Protective film, 20 Light selective absorption adhesive layer, 30 First retardation layer, 31 Second retardation layer, 32 Second adhesive layer, 33 Adhesive layer, 50 Edge of optical laminate , 51 color loss area, 52 non-color loss area, 100, 200 optical laminate, 300 retardation laminate.

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Abstract

[Problem] To provide a novel optical laminate in which color defects are suppressed in end sections of a polarizer at high temperature and high humidity. [Solution] An optical laminate having a polarizer and a selectively light-absorbing pressure-sensitive adhesive layer that is laminated in contact with the polarizer, the optical laminate being such that: iodine in the polarizer is oriented in an adsorption orientation, and the boron content of the polarizer is 5.0 mass% or less; and a pressure-sensitive adhesive composition for forming the selectively light-absorbing pressure-sensitive adhesive layer contains a selectively light-absorbing polymer.

Description

光学積層体および画像表示装置Optical laminate and image display device
 本発明は、光学積層体および表示装置に関する。 The present invention relates to an optical laminate and a display device.
 偏光子の片面又は両面に保護フィルムを積層貼合してなる偏光板は、モバイル・テレビをはじめとする液晶表示装置や有機エレクトロルミネッセンス(有機EL)表示装置等の画像表示装置、とりわけ近年では携帯電話やスマートフォン、タブレット型端末のような各種モバイル機器に広く用いられている光学部材である。
 偏光板は、粘着剤層を介して画像表示素子(液晶セルや有機EL表示素子等)に貼合して用いられることが多い(例えば、特開2010-229321号公報(特許文献1))。このため、偏光板は、その一方の面に予め粘着剤層が設けられた粘着剤層付偏光板の形態で市場流通されることがある。
Polarizing plates made by laminating and laminating a protective film on one or both sides of a polarizer are used for image display devices such as liquid crystal display devices such as mobile televisions and organic electroluminescence (organic EL) display devices, especially in recent years. It is an optical member widely used in various mobile devices such as telephones, smartphones, and tablet terminals.
The polarizing plate is often used by being bonded to an image display element (liquid crystal cell, organic EL display element, etc.) via an adhesive layer (for example, Japanese Patent Application Laid-Open No. 2010-229321 (Patent Document 1)). Therefore, the polarizing plate may be marketed in the form of a polarizing plate with an adhesive layer in which an adhesive layer is previously provided on one surface of the polarizing plate.
 また、モバイル機器は高温高湿の過酷な環境下で使われることも多く、偏光子としては高い耐久性が求められている。特開2013-105036号公報(特許文献2)には、偏光子中のホウ酸含有量を高くして、ホウ酸架橋を多く生成させることにより、I錯体が高配向で高い安定性で存在することになり、ブルーリークの発生が抑えられ低温高湿耐久性に優れた偏光子が得られることが記載されている。 In addition, mobile devices are often used in harsh environments of high temperature and high humidity, and high durability is required as a polarizer. The JP 2013-105036 (Patent Document 2), by increasing the boric acid content in the polarizer, by generating many borate crosslinked, present in high stability I 3 complex is highly oriented It is described that the occurrence of blue leak is suppressed and a polarizer having excellent low-temperature and high-humidity durability can be obtained.
特開2010-229321号公報Japanese Unexamined Patent Publication No. 2010-229321 特開2013-105036号公報Japanese Unexamined Patent Publication No. 2013-105036
 偏光板において、高温高湿の環境下では偏光子の端部において色抜けが生じやすいという問題があった。かかる問題は、偏光子の片面のみに保護フィルムが積層貼合されてなる構成において顕著であった。偏光子中のホウ素含有量を高くすることにより偏光子の色抜けを抑制する方法が知られているものの、かかる方法によると、加熱によって収縮しやすいという問題があった。 In the polarizing plate, there was a problem that color loss was likely to occur at the end of the polarizer in a high temperature and high humidity environment. Such a problem was remarkable in the configuration in which the protective film was laminated and laminated on only one side of the polarizer. Although a method of suppressing color loss of the polarizer by increasing the boron content in the polarizer is known, there is a problem that the method tends to shrink due to heating.
 本発明は、高温高湿下で偏光子の端部において色抜けが抑制された新規の光学積層体を提供することを目的とする。 An object of the present invention is to provide a novel optical laminate in which color loss is suppressed at the end of a polarizer under high temperature and high humidity.
 本発明は、以下に例示する光学積層体およびそれを用いた画像表示装置を提供する。
 〔1〕 偏光子と、前記偏光子に接して積層された光選択吸収性粘着剤層と、を有する光学積層体であって、
 前記偏光子は、ヨウ素が吸着配向され、ホウ素の含有量が5.0質量%以下であり、
 前記光選択吸収性粘着剤層を形成する粘着剤組成物は、光選択吸収性重合体を含む、光学積層体。
 〔2〕 前記偏光子の前記光選択吸収性粘着剤層側とは反対側に積層された保護フィルムをさらに有する、〔1〕に記載の光学積層体。
 〔3〕 前記光選択吸収性重合体は、下記化学式(1):
 >N-C=C-C=C<  (1)
[ただし、化学式(1)を構成する1個のN原子および4個のC原子の全てが芳香族複素環の一部または全部を構成することはない。]
 で示される構造を有する構造単位を含有し、ガラス転移温度が40℃以下である樹脂である、〔1〕または〔2〕に記載の光学積層体。
 〔4〕 前記光選択吸収性重合体は、全構造単位100質量部に対して前記化学式(1)で示される構造を有する構造単位の含有量は0.01質量部以上50質量部以下である、〔3〕に記載の光学積層体。
 〔5〕 前記光選択吸収性重合体は、重量平均分子量が30万以上である、請求項〔1〕~〔4〕のいずれか1項に記載の光学積層体。
 〔6〕 前記粘着剤組成物は、光選択吸収剤を含まない、または全樹脂成分100質量部に対して光選択吸収剤の含有量が0.1質量部以下である、〔1〕~〔5〕のいずれか1項に記載の光学積層体。
 〔7〕 前記光選択吸収性粘着剤層の前記偏光子とは反対側に積層されたλ/4位相差層をさらに有する、〔1〕~〔6〕のいずれか1項に記載の光学積層体。
 〔8〕 反射防止用偏光板である、〔1〕~〔7〕のいずれか1項に記載の光学積層体。
 〔9〕 画像表示パネルと、前記画像表示パネルの前面に配置された〔8〕に記載の光学積層体とを含む、画像表示装置。
 〔10〕 有機EL表示装置である、〔9〕に記載の画像表示装置。
The present invention provides an optical laminate illustrated below and an image display device using the same.
[1] An optical laminate having a polarizer and a light selective absorbing pressure-sensitive adhesive layer laminated in contact with the polarizer.
Iodine is adsorbed and oriented in the polarizer, and the boron content is 5.0% by mass or less.
The pressure-sensitive adhesive composition forming the light-selective-absorbing pressure-sensitive adhesive layer is an optical laminate containing a light-selective-absorbing polymer.
[2] The optical laminate according to [1], further comprising a protective film laminated on the side of the polarizer opposite to the light selective absorption pressure-sensitive adhesive layer side.
[3] The photoselective absorbent polymer has the following chemical formula (1):
> NC = CC = C <(1)
[However, not all of one N atom and four C atoms constituting the chemical formula (1) form a part or all of the aromatic heterocycle. ]
The optical laminate according to [1] or [2], which is a resin containing a structural unit having the structure shown by and having a glass transition temperature of 40 ° C. or lower.
[4] In the photoselective absorbent polymer, the content of the structural unit having the structure represented by the chemical formula (1) is 0.01 part by mass or more and 50 parts by mass or less with respect to 100 parts by mass of all the structural units. , [3].
[5] The optical laminate according to any one of claims [1] to [4], wherein the photoselective absorbent polymer has a weight average molecular weight of 300,000 or more.
[6] The pressure-sensitive adhesive composition does not contain a light selective absorber, or the content of the light selective absorber is 0.1 parts by mass or less with respect to 100 parts by mass of all resin components, [1] to [ 5] The optical laminate according to any one of the items.
[7] The optical lamination according to any one of [1] to [6], further comprising a λ / 4 retardation layer laminated on the side of the light selective absorbing pressure-sensitive adhesive layer opposite to the polarizer. body.
[8] The optical laminate according to any one of [1] to [7], which is an antireflection polarizing plate.
[9] An image display device including an image display panel and the optical laminate according to [8] arranged in front of the image display panel.
[10] The image display device according to [9], which is an organic EL display device.
 本発明によれば、高温高湿の環境下では偏光子の端部において色抜けが抑制された光学積層体およびこれを含む画像表示装置を提供することができる。 According to the present invention, it is possible to provide an optical laminate in which color loss is suppressed at an end portion of a polarizer in a high temperature and high humidity environment, and an image display device including the same.
本発明の光学積層体の一例を示す概略断面図である。It is the schematic sectional drawing which shows an example of the optical laminated body of this invention. 本発明の光学積層体の他の一例を示す概略断面図である。It is the schematic sectional drawing which shows another example of the optical laminated body of this invention. 光学顕微鏡での観察画像の一例を示す図である。It is a figure which shows an example of the observation image with an optical microscope. 観察画像を白黒256階調に変換したデータの一例を示す図である。It is a figure which shows an example of the data which converted the observation image into black-and-white 256 gradations.
 以下、図面を参照しつつ本発明の実施形態を説明するが、本発明は以下の実施形態に限定されるものではない。以下の全ての図面においては、各構成要素を理解し易くするために縮尺を適宜調整して示しており、図面に示される各構成要素の縮尺と実際の構成要素の縮尺とは必ずしも一致しない。 Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited to the following embodiments. In all the drawings below, the scale is appropriately adjusted to make it easier to understand each component, and the scale of each component shown in the drawings does not necessarily match the scale of the actual component.
 <光学積層体>
 本発明の光学積層体は、偏光子と、前記偏光子に接して積層された光選択吸収性粘着剤層と、を有する。本発明の光学積層体の層構成の一例を、図1、図2に示す。
 図1は、本発明の光学積層体の一例の概略断面図である。図1に示す光学積層体100は、保護フィルム11と、偏光子10と、光選択吸収性粘着剤層20とをこの順に有する。
<Optical laminate>
The optical laminate of the present invention has a polarizer and a light selective absorbing pressure-sensitive adhesive layer laminated in contact with the polarizer. An example of the layer structure of the optical laminate of the present invention is shown in FIGS. 1 and 2.
FIG. 1 is a schematic cross-sectional view of an example of the optical laminate of the present invention. The optical laminate 100 shown in FIG. 1 has a protective film 11, a polarizer 10, and a light selective absorbing pressure-sensitive adhesive layer 20 in this order.
 図2は、本発明の光学積層体の一例の概略断面図である。図2に示す光学積層体200は、図1に示す光学積層体100と、光学積層体100の光選択吸収性粘着剤層20の側に積層された位相差積層体300とを有する。位相差積層体300は、光学積層体100の光選択吸収性粘着剤層20側から順に、第1位相差層30と、接着剤層33と、第2位相差層31と、第2粘着剤層32とを有する。 FIG. 2 is a schematic cross-sectional view of an example of the optical laminate of the present invention. The optical laminate 200 shown in FIG. 2 has an optical laminate 100 shown in FIG. 1 and a retardation laminate 300 laminated on the light selective absorption adhesive layer 20 side of the optical laminate 100. The retardation laminate 300 includes a first retardation layer 30, an adhesive layer 33, a second retardation layer 31, and a second adhesive in order from the light selective absorption pressure-sensitive adhesive layer 20 side of the optical laminate 100. It has a layer 32 and.
 光学積層体100、200の厚みは、光学積層体に求められる機能および光学積層体の用途等に応じて異なるため特に限定されないが、例えば5μm以上200μm以下であり、10μm以上150μm以下であってもよく、120μm以下であってもよい。 The thicknesses of the optical laminates 100 and 200 are not particularly limited because they differ depending on the functions required of the optical laminate and the application of the optical laminate, but for example, they may be 5 μm or more and 200 μm or less, and 10 μm or more and 150 μm or less. It may be 120 μm or less.
 光選択吸収性粘着剤層は、光選択吸収性重合体を含む。本発明の光学積層体は、少なくとも光選択吸収性粘着剤層が光選択吸収性能を有することにより、光学積層体全体としても光選択吸収性能を有する。光選択吸収性能とは、特定の波長の光を吸収しやすい性質をいい、紫外線波長領域から可視光領域に少なくとも1つの吸収極大を有する。例えば、光選択吸収性粘着剤層が紫外線吸収能を有している場合、画像表示素子上に配置された光学積層体は、画像表示素子を紫外線から保護する機能を有する。 The light selective absorption pressure-sensitive adhesive layer contains a light selective absorption polymer. In the optical laminate of the present invention, at least the light selective absorption pressure-sensitive adhesive layer has light selective absorption performance, so that the optical laminate as a whole also has light selective absorption performance. The light selective absorption performance refers to a property of easily absorbing light having a specific wavelength, and has at least one absorption maximum in the ultraviolet wavelength region to the visible light region. For example, when the light selective absorption pressure-sensitive adhesive layer has an ultraviolet absorbing ability, the optical laminate arranged on the image display element has a function of protecting the image display element from ultraviolet rays.
 本発明の光学積層体は、光選択吸収性粘着剤層以外にも、光選択吸収性能を有する層を含む構成であってもよい。他の層としては、例えば、保護フィルム11が挙げられる。本発明においては、光選択吸収性粘着剤層が光選択吸収性能を有し、光学積層体全体の光選択吸収性能の発現に寄与する構成であることにより、他の層における光選択吸収性能の設計の自由度を向上させることができる。例えば、保護フィルム11は、光選択吸収性能を向上させるためにはその厚みを厚くする設計が必要となる場合があるが、光選択吸収性能の設計の自由度が高いことにより、保護フィルム11の薄膜化が容易となる。 The optical laminate of the present invention may have a structure including a layer having light selective absorption performance in addition to the light selective absorption pressure-sensitive adhesive layer. Examples of the other layer include the protective film 11. In the present invention, the light selective absorption adhesive layer has the light selective absorption performance and contributes to the development of the light selective absorption performance of the entire optical laminate, so that the light selective absorption performance of the other layers can be improved. The degree of design freedom can be improved. For example, the protective film 11 may need to be designed to be thicker in order to improve the light selective absorption performance, but the protective film 11 has a high degree of freedom in designing the light selective absorption performance. It becomes easy to make a thin film.
 光選択吸収性粘着剤層は、光選択吸収性重合体が光選択吸収性能を有し、光選択吸収性粘着剤層の光選択吸収性能の発現に寄与する構成であることにより、光選択吸収性粘着剤層について光選択吸収剤を含まない構成、または光選択吸収剤の含有量を低減させる構成とすることができ、高温高湿下での偏光子の端部における色抜けを抑制することができる。 The light selective absorption pressure-sensitive adhesive layer has a structure in which the light selective absorption polymer has light selective absorption performance and contributes to the development of the light selective absorption performance of the light selective absorption pressure-sensitive adhesive layer. The adhesive layer can be configured not to contain a light selective absorber or to reduce the content of the light selective absorber to suppress color loss at the ends of the polarizer under high temperature and high humidity. Can be done.
 本発明者らは、粘着剤層に含まれる光選択吸収剤の含有量と、高温高湿下での偏光子の端部における色抜けの程度との間に相関があるとの知見を得た。かかる知見に基づくと、比較的低分子量の光選択吸収剤を用いた場合には、高温高湿下では、粘着剤層中の光選択吸収剤が偏光子側に移行しやすく、かかる移行が色抜けを生じさせる要因の一つであると考えられる。本発明者らは、さらに鋭意検討を重ね、粘着剤層への光選択吸収性能の付与を、光選択吸収剤の添加による方法ではなく、光選択吸収性重合体を含有させる方法によることにより、高温高湿下での偏光子の端部における色抜けを抑制できることを見出し、本発明に至ったものである。光選択吸収性重合体は分子量が比較的大きいので、偏光子への移行が抑制され、偏光子端部における色抜けが抑制されるものと考えられる。 The present inventors have found that there is a correlation between the content of the light selective absorber contained in the pressure-sensitive adhesive layer and the degree of color loss at the end of the polarizer under high temperature and high humidity. .. Based on this finding, when a light selective absorber having a relatively low molecular weight is used, the light selective absorber in the pressure-sensitive adhesive layer tends to migrate to the polarizer side under high temperature and high humidity, and such migration tends to occur in color. It is considered to be one of the factors that cause omission. The present inventors have conducted further diligent studies, and imparted the light selective absorption performance to the pressure-sensitive adhesive layer by a method of containing a light selective absorption polymer instead of a method of adding a light selective absorption agent. The present invention has been made by finding that color loss at the end of a polarizer under high temperature and high humidity can be suppressed. Since the photoselective absorptive polymer has a relatively large molecular weight, it is considered that the transfer to the polarizer is suppressed and the color loss at the end of the polarizer is suppressed.
 [偏光子]
 偏光子は、その吸収軸に平行な振動面をもつ直線偏光を吸収し、吸収軸に直交する(透過軸と平行な)振動面をもつ直線偏光を透過する性質を有する。本発明の光学積層体における偏光子10は、ヨウ素が吸着配向され、ホウ素の含有量が5.0質量%以下である。
ホウ素の含有量が5.0質量%以下であり、好ましくは4.5質量%以下である構成により、加熱により生じる収縮を抑制することができる。ホウ素の含有量は0.5質量%以上であることが好ましく、1質量%以上であることがより好ましい。偏光子10において、ホウ素の含有量が少なくなるほど、高温高湿下での偏光子の端部における色抜けが生じやすくなる。偏光子10中のホウ素は、偏光子10の架橋度を向上させ、偏光子10中にヨウ素を安定的に保持するのに寄与しているため、ホウ素の含有量が少なくなるとヨウ素を安定的に保持することができなくなり、色抜けを生じさせることになると考えられる。本発明においては、偏光子10について、ホウ素の含有量が5.0質量%以下であっても、高温高湿下での色抜けを抑制することができる。
[Polarizer]
The polarizer has a property of absorbing linearly polarized light having a vibration plane parallel to its absorption axis and transmitting linearly polarized light having a vibration plane orthogonal to the absorption axis (parallel to the transmission axis). The polarizer 10 in the optical laminate of the present invention has iodine adsorbed and oriented, and has a boron content of 5.0% by mass or less.
With a structure in which the boron content is 5.0% by mass or less, preferably 4.5% by mass or less, shrinkage caused by heating can be suppressed. The content of boron is preferably 0.5% by mass or more, and more preferably 1% by mass or more. In the polarizer 10, the smaller the boron content, the more likely it is that color loss will occur at the ends of the polarizer under high temperature and high humidity. Boron in the polarizer 10 improves the degree of cross-linking of the polarizer 10 and contributes to stably retaining iodine in the polarizer 10. Therefore, when the boron content is low, iodine is stably retained. It is considered that it cannot be held and color loss occurs. In the present invention, even if the boron content of the polarizer 10 is 5.0% by mass or less, color loss under high temperature and high humidity can be suppressed.
 偏光子10は、吸収異方性を有する二色性色素を吸着させた延伸フィルムまたは延伸層、重合性液晶化合物の硬化物および二色性色素を含む液晶硬化層等が挙げられる。二色性色素は、分子の長軸方向における吸光度と短軸方向における吸光度とが異なる性質を有する色素をいい、色素としてはヨウ素が好適に用いられる。 Examples of the polarizer 10 include a stretched film or a stretched layer on which a dichroic dye having absorption anisotropy is adsorbed, a cured product of a polymerizable liquid crystal compound, and a liquid crystal cured layer containing a dichroic dye. The dichroic dye refers to a dye having a property in which the absorbance in the major axis direction and the absorbance in the minor axis direction of the molecule are different, and iodine is preferably used as the dye.
 吸収異方性を有する色素を吸着させた延伸フィルムである偏光子は、通常、ポリビニルアルコール系樹脂フィルムを一軸延伸する工程、ポリビニルアルコール系樹脂フィルムをヨウ素等の二色性色素で染色することにより、その二色性色素を吸着させる工程、二色性色素が吸着されたポリビニルアルコール系樹脂フィルムをホウ酸水溶液で処理する工程、およびホウ酸水溶液による処理後に水洗する工程を経て製造することができる。 The polarizer, which is a stretched film on which a dye having absorption anisotropy is adsorbed, is usually obtained by uniaxially stretching a polyvinyl alcohol-based resin film or dyeing the polyvinyl alcohol-based resin film with a dichroic dye such as iodine. , The step of adsorbing the dichroic dye, the step of treating the polyvinyl alcohol-based resin film on which the dichroic dye is adsorbed with an aqueous boric acid solution, and the step of washing with water after the treatment with the aqueous boric acid solution can be produced. ..
 偏光子の厚みは、通常30μm以下であり、好ましくは15μm以下であり、より好ましくは13μm以下であり、さらに好ましくは10μm以下であり、特に好ましくは8μm以下である。偏光子の厚みは、通常2μm以上であり、3μm以上であることが好ましく、例えば5μm以上であってよい。 The thickness of the polarizer is usually 30 μm or less, preferably 15 μm or less, more preferably 13 μm or less, further preferably 10 μm or less, and particularly preferably 8 μm or less. The thickness of the polarizer is usually 2 μm or more, preferably 3 μm or more, and may be, for example, 5 μm or more.
 ポリビニルアルコール系樹脂は、ポリ酢酸ビニル系樹脂をケン化することによって得られる。ポリ酢酸ビニル系樹脂としては、酢酸ビニルの単独重合体であるポリ酢酸ビニルのほか、酢酸ビニルとそれに共重合可能な他の単量体との共重合体が用いられる。酢酸ビニルに共重合可能な他の単量体としては、例えば不飽和カルボン酸系化合物、オレフィン系化合物、ビニルエーテル系化合物、不飽和スルホン系化合物、アンモニウム基を有する(メタ)アクリルアミド系化合物が挙げられる。 The polyvinyl alcohol-based resin is obtained by saponifying the polyvinyl acetate-based resin. As the polyvinyl acetate-based resin, in addition to polyvinyl acetate which is a homopolymer of vinyl acetate, a copolymer of vinyl acetate and another monomer copolymerizable therewith is used. Examples of other monomers copolymerizable with vinyl acetate include unsaturated carboxylic acid compounds, olefin compounds, vinyl ether compounds, unsaturated sulfone compounds, and (meth) acrylamide compounds having an ammonium group. ..
 ポリビニルアルコール系樹脂のケン化度は、通常85モル%以上100モル%以下程度であり、好ましくは98モル%以上である。ポリビニルアルコール系樹脂は変性されていてもよく、アルデヒド類で変性されたポリビニルホルマール、ポリビニルアセタール等も使用することができる。ポリビニルアルコール系樹脂の重合度は、通常1000以上10000以下であり、好ましくは1500以上5000以下である。 The saponification degree of the polyvinyl alcohol-based resin is usually about 85 mol% or more and 100 mol% or less, preferably 98 mol% or more. The polyvinyl alcohol-based resin may be modified, and polyvinyl formal, polyvinyl acetal, and the like modified with aldehydes can also be used. The degree of polymerization of the polyvinyl alcohol-based resin is usually 1000 or more and 10000 or less, preferably 1500 or more and 5000 or less.
 吸収異方性を有する色素を吸着させた延伸層である偏光子は、通常、上記ポリビニルアルコール系樹脂を含む塗布液を基材フィルム上に塗布する工程、得られた積層フィルムを一軸延伸する工程、一軸延伸された積層フィルムのポリビニルアルコール系樹脂層をヨウ素等の二色性色素で染色することにより、二色性色素を吸着させて偏光子とする工程、二色性色素が吸着されたフィルムをホウ酸水溶液で処理する工程、およびホウ酸水溶液による処理後に水洗する工程を経て製造することができる。偏光子を形成するために用いる基材フィルムは、保護フィルム11として用いてもよい。必要に応じて、基材フィルムを偏光子から剥離除去してもよい。基材フィルムの材料および厚みは、後述する保護フィルム11の材料および厚みと同様であってよい。 The polarizer, which is a stretched layer on which a dye having absorption anisotropy is adsorbed, is usually a step of applying a coating liquid containing the polyvinyl alcohol-based resin on a base film, and a step of uniaxially stretching the obtained laminated film. , A step of adsorbing a dichroic dye to form a polarizer by dyeing a polyvinyl alcohol-based resin layer of a uniaxially stretched laminated film with a dichroic dye such as iodine, a film on which the dichroic dye is adsorbed. Can be produced through a step of treating with an aqueous boric acid solution and a step of washing with water after the treatment with the aqueous boric acid solution. The base film used for forming the polarizer may be used as the protective film 11. If necessary, the base film may be peeled off from the polarizer. The material and thickness of the base film may be the same as the material and thickness of the protective film 11 described later.
 [保護フィルム]
 保護フィルム11は、光学的に透明な熱可塑性樹脂、例えば環状ポリオレフィン系樹脂;トリアセチルセルロース、ジアセチルセルロース等の樹脂からなる酢酸セルロース系樹脂;ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンテレフタレート等の樹脂からなるポリエステル系樹脂;ポリカーボネート系樹脂;(メタ)アクリル系樹脂;ポリプロピレン系樹脂、これらのうち1種または2種以上の混合物からなるコーティング層またはフィルムとすることができる。保護フィルム11は、後述する光選択吸収剤を含んでいてもよい。なお、保護フィルム11に含まれる光選択吸収剤は、保護フィルム11内に保持されるため偏光子への移行は生じにくい。
[Protective film]
The protective film 11 is made of an optically transparent thermoplastic resin such as a cyclic polyolefin resin; a cellulose acetate resin composed of a resin such as triacetyl cellulose or diacetyl cellulose; a resin such as polyethylene terephthalate, polyethylene naphthalate, or polybutylene terephthalate. Polyester resin; Polycarbonate resin; (meth) acrylic resin; Polypropylene resin, a coating layer or film composed of one or a mixture of two or more of these. The protective film 11 may contain a light selective absorber described later. Since the light selective absorber contained in the protective film 11 is held in the protective film 11, it is unlikely that the light selective absorber will be transferred to the polarizer.
 保護フィルム11上にハードコート層が形成されていてもよい。ハードコート層は、保護フィルム11の一方の面に形成されていてもよいし、両面に形成されていてもよい。ハードコート層を設けることにより、硬度およびスクラッチ性を向上させた保護フィルム11とすることができる。ハードコート層は、例えばアクリル系樹脂、シリコーン系樹脂、ポリエステル系樹脂、ウレタン系樹脂、アミド系樹脂、エポキシ系樹脂等の硬化層であってよい。ハードコート層は、強度を向上させるために、添加剤を含んでいてもよい。添加剤は限定されることはなく、無機系微粒子、有機系微粒子、またはこれらの混合物が挙げられる。ハードコート層は、例えば紫外線硬化型樹脂の硬化層である。紫外線硬化型樹脂としては、例えばアクリル系樹脂、シリコーン系樹脂、ポリエステル系樹脂、ウレタン系樹脂、アミド系樹脂、エポキシ系樹脂等が挙げられる。 A hard coat layer may be formed on the protective film 11. The hard coat layer may be formed on one surface of the protective film 11 or may be formed on both sides. By providing the hard coat layer, the protective film 11 having improved hardness and scratchability can be obtained. The hard coat layer may be, for example, a cured layer such as an acrylic resin, a silicone resin, a polyester resin, a urethane resin, an amide resin, or an epoxy resin. The hard coat layer may contain additives to improve strength. Additives are not limited and include inorganic fine particles, organic fine particles, or mixtures thereof. The hard coat layer is, for example, a cured layer of an ultraviolet curable resin. Examples of the ultraviolet curable resin include acrylic resin, silicone resin, polyester resin, urethane resin, amide resin, epoxy resin and the like.
 保護フィルム11の厚みは、通常1μm以上100μm以下であり、強度及び取扱性等の観点からは、5μm以上80μm以下であることが好ましく、8μm以上60μm以下であることがより好ましく、12μm以上45μm以下であることがさらに好ましい。 The thickness of the protective film 11 is usually 1 μm or more and 100 μm or less, preferably 5 μm or more and 80 μm or less, more preferably 8 μm or more and 60 μm or less, and 12 μm or more and 45 μm or less from the viewpoint of strength and handleability. Is more preferable.
 保護フィルム11である樹脂フィルムは、例えば接着剤層を介して偏光子10に貼合される。接着剤層を形成する接着剤としては、水系接着剤、活性エネルギー線硬化性接着剤、または熱硬化性接着剤を挙げることができ、水系接着剤、活性エネルギー線硬化性接着剤を用いることが好ましい。接着剤層を介して貼合される対向する二つの表面は、予めコロナ処理、プラズマ処理、火炎処理等を行ってもよく、プライマー層等を有していてもよい。 The resin film, which is the protective film 11, is attached to the polarizer 10 via, for example, an adhesive layer. Examples of the adhesive forming the adhesive layer include a water-based adhesive, an active energy ray-curable adhesive, and a thermosetting adhesive, and a water-based adhesive and an active energy ray-curable adhesive can be used. preferable. The two opposing surfaces bonded via the adhesive layer may be subjected to corona treatment, plasma treatment, flame treatment or the like in advance, or may have a primer layer or the like.
 [光選択吸収性粘着剤層]
 光選択吸収性粘着剤層20は、光選択吸収性重合体を含む粘着剤組成物を、有機溶剤に溶解または分散した希釈液を基材上に塗布し、乾燥させることで形成できる。基材としては、プラスチックフィルムが好適であり、具体的には、離型処理が施された剥離フィルムが挙げられる。剥離フィルムとしては、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリカーボネート、ポリアリレート等の樹脂からなるフィルムの一方の面に、シリコーン処理等の離型処理が施されたものが挙げられる。
[Light selective absorption adhesive layer]
The photoselective absorbent pressure-sensitive adhesive layer 20 can be formed by applying a diluent in which a pressure-sensitive adhesive composition containing a light-selective absorbent polymer is dissolved or dispersed in an organic solvent onto a substrate and drying it. A plastic film is preferable as the base material, and specific examples thereof include a release film that has been subjected to a mold release treatment. Examples of the release film include those in which one surface of a film made of a resin such as polyethylene terephthalate, polybutylene terephthalate, polycarbonate, or polyarylate is subjected to a mold release treatment such as silicone treatment.
 光選択吸収性粘着剤層の厚みは、例えば0.1μm以上150μm以下である。画像表示パネルと積層する場合には、光選択吸収性粘着剤層の厚みは通常、8μm以上60μm以下であり、薄型化の点では、30μm以下、更には25μm以下、特には20μm以下であることが好ましい。他の光学フィルム、例えばλ/4位相差層と積層する場合には、光選択吸収性粘着剤層の厚みは、通常2μm以上30μm以下であり、好ましくは25μm以下、更に好ましくは20μm以下、特に好ましくは18μm以下であり、好ましくは3μm以上であり、例えば10μm以上であってもよいが、更なる薄型化の点では10μm以下、とりわけ7μm以下が好ましい。 The thickness of the light selective absorption pressure-sensitive adhesive layer is, for example, 0.1 μm or more and 150 μm or less. When laminated with an image display panel, the thickness of the light selective absorption adhesive layer is usually 8 μm or more and 60 μm or less, and in terms of thinning, it is 30 μm or less, further 25 μm or less, and particularly 20 μm or less. Is preferable. When laminated with another optical film, for example, a λ / 4 retardation layer, the thickness of the light selective absorption pressure-sensitive adhesive layer is usually 2 μm or more and 30 μm or less, preferably 25 μm or less, more preferably 20 μm or less, particularly. It is preferably 18 μm or less, preferably 3 μm or more, for example, 10 μm or more, but in terms of further thinning, 10 μm or less, particularly 7 μm or less is preferable.
 光選択吸収性粘着剤層20は、波長410nmにおける吸光度が0.1以上1.6以下であることが好ましい。光選択吸収性粘着剤層20がこのような吸光度を有することにより、光学積層体全体として所望の光選択吸収性能を発現しつつ、光学積層体全体を薄型に構成しやすくなるからである。 The light selective absorbing pressure-sensitive adhesive layer 20 preferably has an absorbance of 0.1 or more and 1.6 or less at a wavelength of 410 nm. This is because the light selective absorption pressure-sensitive adhesive layer 20 having such an absorbance makes it easy to form the entire optical laminate in a thin shape while exhibiting desired light selective absorption performance as the entire optical laminate.
 光選択吸収性粘着剤層は、波長390nmにおける吸光度が通常5.0以下であり、4.5以下であってもよい。
 光選択吸収性粘着剤層は、波長400nmにおける吸光度が通常5.0以下であり、4.5以下であってもよい。
 光選択吸収性粘着剤層は、波長420nmにおける吸光度が通常1.00以下、好ましくは0.60以下、更に好ましくは0.40以下であり、0.00以上である。
 光選択吸収性粘着剤層は、波長430nmにおける吸光度が通常0.20未満、好ましくは0.18以下、更に好ましくは0.10以下、特に好ましくは0.05以下であり、0.00以上である。
 光選択吸収性粘着剤層は、波長440nmにおける吸光度が通常0.10未満、好ましくは0.05以下であり、0.00以上である。それぞれの波長における吸光度が上記範囲にあることにより、紫外線領域の光を十分に吸収しつつ、可視光領域の光はそのまま透過することができる。
The light selective absorbing pressure-sensitive adhesive layer usually has an absorbance at a wavelength of 390 nm of 5.0 or less, and may be 4.5 or less.
The light selective absorbing pressure-sensitive adhesive layer usually has an absorbance at a wavelength of 400 nm of 5.0 or less, and may be 4.5 or less.
The light selective absorbing pressure-sensitive adhesive layer has an absorbance at a wavelength of 420 nm of usually 1.00 or less, preferably 0.60 or less, more preferably 0.40 or less, and 0.00 or more.
The light selective absorbing pressure-sensitive adhesive layer has an absorbance at a wavelength of 430 nm, usually less than 0.20, preferably 0.18 or less, more preferably 0.10 or less, particularly preferably 0.05 or less, and 0.00 or more. is there.
The light selective absorbing pressure-sensitive adhesive layer has an absorbance at a wavelength of 440 nm, usually less than 0.10, preferably 0.05 or less, and 0.00 or more. When the absorbance at each wavelength is in the above range, the light in the visible light region can be transmitted as it is while sufficiently absorbing the light in the ultraviolet region.
 光選択吸収性粘着剤層は、下記式(3)を満たす粘着剤層であることが好ましく、さらに式(4)を満たす粘着剤層であることがより好ましい。
 A(405)≧0.5  (3)
[式(3)中、A(405)は波長405nmにおける吸光度を表す。]
 A(405)/A(440)≧5  (4)
[式(4)中、A(405)は波長405nmにおける吸光度を表し、A(440)は波長440nmにおける吸光度を表す。]
The light selective absorption pressure-sensitive adhesive layer is preferably a pressure-sensitive adhesive layer satisfying the following formula (3), and more preferably a pressure-sensitive adhesive layer satisfying the formula (4).
A (405) ≥ 0.5 (3)
[In formula (3), A (405) represents the absorbance at a wavelength of 405 nm. ]
A (405) / A (440) ≧ 5 (4)
[In the formula (4), A (405) represents the absorbance at a wavelength of 405 nm, and A (440) represents the absorbance at a wavelength of 440 nm. ]
 A(405)の値が大きいほど波長405nmにおける吸収が高いことを表す。A(405)の値が0.5未満であると波長405nmにおける吸収が低く、400nm付近の光により劣化しやすい部材(例えば有機EL素子等の表示装置や液晶系位相差フィルム等)の劣化が起こりやすい。A(405)の値は、好ましくは0.6以上であり、より好ましくは0.8以上であり、特に好ましくは1.0以上である。上限は特にないが、通常は10以下である。 The larger the value of A (405), the higher the absorption at the wavelength of 405 nm. When the value of A (405) is less than 0.5, the absorption at a wavelength of 405 nm is low, and the deterioration of members (for example, display devices such as organic EL elements and liquid crystal retardation films) that are easily deteriorated by light near 400 nm is deteriorated. It is easy to happen. The value of A (405) is preferably 0.6 or more, more preferably 0.8 or more, and particularly preferably 1.0 or more. There is no particular upper limit, but it is usually 10 or less.
 A(405)/A(440)の値は、波長440nmにおける吸収の大きさに対する波長405nmの吸収の大きさを表し、この値が大きいほど405nm付近の波長域に特異的な吸収があることを表す。A(405)/A(440)の値は10以上であることが好ましく、30以上であることがより好ましく、75以上であることがさらに好ましく、100以上であることが特に好ましい。 The value of A (405) / A (440) represents the magnitude of absorption at a wavelength of 405 nm with respect to the magnitude of absorption at a wavelength of 440 nm, and the larger this value is, the more specific absorption is in the wavelength region near 405 nm. Represent. The value of A (405) / A (440) is preferably 10 or more, more preferably 30 or more, further preferably 75 or more, and particularly preferably 100 or more.
 [粘着剤組成物]
 (光選択吸収性重合体)
 粘着剤組成物は、光選択吸収性重合体を含む。光選択吸収性重合体は、光選択吸収性能を有する重合体である。光選択吸収性重合体は、好ましくは波長360nm~420nm領域の波長の光を吸収できる。光選択吸収性重合体は、光選択吸収性能を有する部位を有する光選択吸収性構造単位を含む。光選択吸収性構造単位は、側鎖に光選択吸収性能を有する部位を有することが好ましい。光選択吸収性能を有する部位としては、ベンゾフェノン基、ベンゾトリアゾール基、下記化学式(1)で示される構造等が例示される。
[Adhesive composition]
(Light selective absorbent polymer)
The pressure-sensitive adhesive composition comprises a light-selective absorbent polymer. The light selective absorption polymer is a polymer having light selective absorption performance. The light selective absorption polymer can preferably absorb light having a wavelength in the region of 360 nm to 420 nm. The photoselective absorptive polymer contains a photoselective absorptive structural unit having a moiety having a light selective absorption performance. The light selective absorption structural unit preferably has a portion having a light selective absorption performance in the side chain. Examples of the site having the light selective absorption performance include a benzophenone group, a benzotriazole group, and a structure represented by the following chemical formula (1).
 光選択吸収性重合体は、好ましくは下記化学式(1):
 >N-C=C-C=C<  (1)
[ただし、化学式(1)を構成する1個のN原子および4個のC原子の全てが芳香族複素環の一部または全部を構成することはない。]
 で示される構造(以下、「メロシアニン構造」という。)を有する構造単位を光選択吸収性構造単位として含有し、ガラス転移温度が40℃以下である樹脂(A)である。
 樹脂(A)はメロシアニン構造を主鎖に有していてもよいし、側鎖に有していてもよい。樹脂(A)は、側鎖にメロシアニン構造を有する構造単位を含むことがより好ましい。
The photoselective absorptive polymer is preferably composed of the following chemical formula (1):
> NC = CC = C <(1)
[However, not all of one N atom and four C atoms constituting the chemical formula (1) form a part or all of the aromatic heterocycle. ]
A resin (A) containing a structural unit having a structure represented by (hereinafter referred to as “merocyanine structure”) as a photoselective absorbing structural unit and having a glass transition temperature of 40 ° C. or lower.
The resin (A) may have a merocyanine structure in the main chain or a side chain. The resin (A) more preferably contains a structural unit having a merocyanine structure in the side chain.
 樹脂(A)のガラス転移温度(Tg)は、40℃以下であるが、20℃以下であることが好ましく、10℃以下であることがより好ましく、0℃以下であることがさらに好ましい。また、樹脂(A)のガラス転移温度は通常-80℃以上であり、-60℃以上であることが好ましく、-50℃以上であることがより好ましく、-45℃以上であることがさらに好ましく、-30℃以上であることが特に好ましい。樹脂(A)のガラス転移温度が40℃以下であると、樹脂(A)を含む粘着剤組成物から形成される光選択吸収性粘着剤層の被着体に対する密着性の向上に有利である。また、樹脂(A)のガラス転移温度が-80℃以上であると、樹脂(A)を含む粘着剤組成物から形成される光選択吸収性粘着剤層の耐久性(高温試験時の外観不具合:凝集破壊等)の向上に有利である。なお、ガラス転移温度は示差走査熱量計(DSC)により測定できる。 The glass transition temperature (Tg) of the resin (A) is 40 ° C. or lower, preferably 20 ° C. or lower, more preferably 10 ° C. or lower, and even more preferably 0 ° C. or lower. The glass transition temperature of the resin (A) is usually −80 ° C. or higher, preferably −60 ° C. or higher, more preferably −50 ° C. or higher, and even more preferably −45 ° C. or higher. , -30 ° C or higher is particularly preferable. When the glass transition temperature of the resin (A) is 40 ° C. or lower, it is advantageous to improve the adhesion of the light selective absorption pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition containing the resin (A) to the adherend. .. Further, when the glass transition temperature of the resin (A) is −80 ° C. or higher, the durability of the light selective absorbing pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition containing the resin (A) (appearance defects during a high temperature test). : Advantageous in improving coagulation failure, etc.). The glass transition temperature can be measured by a differential scanning calorimeter (DSC).
 側鎖にメロシアニン構造を有する構造単位としては、特に限定はされないが、重合性基とメロシアニン構造とを有する化合物に由来の構造単位であることが好ましい。 The structural unit having a merocyanine structure in the side chain is not particularly limited, but is preferably a structural unit derived from a compound having a polymerizable group and a merocyanine structure.
 重合性基とメロシアニン構造とを有する化合物は、下記式(1-a)を満たすことが好ましく、さらに式(2-a)を満たすことがより好ましい。
 ε(405)≧5  (1-a)
[式(1-a)中、ε(405)は波長405nmにおける重合性基とメロシアニン構造とを有する化合物のグラム吸光係数を表す。グラム吸光係数の単位はL/(g・cm)である。]
 ε(405)/ε(440)≧20  (2-a)
[式(2-a)中、ε(405)は波長405nmにおける重合性基とメロシアニン構造とを有する化合物のグラム吸光係数を表し、ε(440)は波長440nmにおける重合性基とメロシアニン構造とを有する化合物のグラム吸光係数を表す。]
The compound having a polymerizable group and a merocyanine structure preferably satisfies the following formula (1-a), and more preferably satisfies the formula (2-a).
ε (405) ≧ 5 (1-a)
[In formula (1-a), ε (405) represents the gram absorption coefficient of a compound having a polymerizable group and a merocyanine structure at a wavelength of 405 nm. The unit of the gram extinction coefficient is L / (g · cm). ]
ε (405) / ε (440) ≧ 20 (2-a)
[In formula (2-a), ε (405) represents the gram extinction coefficient of a compound having a polymerizable group and a merocyanine structure at a wavelength of 405 nm, and ε (440) represents a polymerizable group and a merocyanine structure at a wavelength of 440 nm. Represents the gram extinction coefficient of the compound. ]
 重合性基とメロシアニン構造とを有する化合物は、ε(405)の値が5L/(g・cm)以上であることが好ましく、10L/(g・cm)以上であることがより好ましく、20L/(g・cm)以上であることがさらに好ましく、30L/(g・cm)以上であることがさらにより好ましく、通常500L/(g・cm)以下である。ε(405)の値が大きい化合物ほど波長405nmの光を吸収しやすく、紫外線や短波長の可視光による劣化抑制機能を発現しやすい。
 重合性基とメロシアニン構造とを有する化合物は、ε(405)/ε(440)の値が20以上であることが好ましく、40以上であることがより好ましく、70以上がさらにより好ましく、80以上が特により好ましい。ε(405)/ε(440)の値が大きい化合物を含む樹脂は、表示装置の色彩表現を阻害することなく、405nm付近の光を吸収し位相差フィルムや有機EL素子等の表示装置の光劣化を抑制することができる。
The compound having a polymerizable group and a merocyanine structure preferably has a value of ε (405) of 5 L / (g · cm) or more, more preferably 10 L / (g · cm) or more, and 20 L / (g · cm) or more. It is more preferably (g · cm) or more, further preferably 30 L / (g · cm) or more, and usually 500 L / (g · cm) or less. A compound having a larger value of ε (405) is more likely to absorb light having a wavelength of 405 nm, and is more likely to exhibit a function of suppressing deterioration due to ultraviolet rays or visible light having a short wavelength.
The compound having a polymerizable group and a merocyanine structure preferably has a value of ε (405) / ε (440) of 20 or more, more preferably 40 or more, further preferably 70 or more, and even more preferably 80 or more. Is particularly preferable. The resin containing a compound having a large value of ε (405) / ε (440) absorbs light in the vicinity of 405 nm without disturbing the color expression of the display device, and the light of a display device such as a retardation film or an organic EL element. Deterioration can be suppressed.
 側鎖にメロシアニン構造を有する構造単位としては、例えば式(I)で表される化合物に由来する構造単位等が挙げられる。
Figure JPOXMLDOC01-appb-C000001
 [式(I)中、R、R、R、RおよびRは、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~25の脂肪族炭化水素基、置換基を有していてもよい炭素数6~15の芳香族炭化水素基、複素環基またはエチレン性不飽和基を表し、該脂肪族炭化水素基または芳香族炭化水素基に含まれる-CH-は、-NR1A-、-SO-、-CO-、-O-またはS-に置換されていてもよい。
 RおよびRは、それぞれ独立して、水素原子、炭素数1~25のアルキル基、電子吸引性基またはエチレン性不飽和基を表す。
 R1Aは、水素原子または炭素数1~6のアルキル基を表す。
 RおよびRは互いに連結して環構造を形成してもよく、RおよびRは互いに連結して環構造を形成してもよく、RおよびRは互いに連結して環構造を形成してもよく、RおよびRは互いに連結して環構造を形成してもよく、RおよびRは互いに連結して環構造を形成してもよく、RおよびRは互いに連結して環構造を形成してもよい。
 ただし、R~Rのいずれかのうち1つはエチレン性不飽和基である]
Examples of the structural unit having a merocyanine structure in the side chain include a structural unit derived from the compound represented by the formula (I).
Figure JPOXMLDOC01-appb-C000001
[In formula (I), R 1 , R 2 , R 3 , R 4 and R 5 are aliphatic hydrocarbons having 1 to 25 carbon atoms which may independently have a hydrogen atom and a substituent. It represents an aromatic hydrocarbon group having 6 to 15 carbon atoms, a heterocyclic group or an ethylenically unsaturated group which may have a group or a substituent, and is contained in the aliphatic hydrocarbon group or the aromatic hydrocarbon group. -CH 2- may be replaced with -NR 1A- , -SO 2- , -CO-, -O- or S-.
R 6 and R 7 independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, an electron-withdrawing group, or an ethylenically unsaturated group.
R 1A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
R 1 and R 2 may be connected to each other to form a ring structure, R 2 and R 3 may be connected to each other to form a ring structure, and R 2 and R 4 may be connected to each other to form a ring structure. R 3 and R 6 may be connected to each other to form a ring structure, R 5 and R 7 may be connected to each other to form a ring structure, and R 6 and R 7 may be formed. May be connected to each other to form a ring structure.
However, one of R 1 to R 7 is an ethylenically unsaturated group]
 R~Rで表される炭素数1~25の脂肪族炭化水素基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、tert-ブチル基、sec-ブチル基、n-ペンチル基、イソペンチル基、n-ヘキシル基、イソヘキシル基、n-オクチル基、イソオクチル基、n-ノニル基、イソノニル基、n-デシル基、イソデシル基、n-ドデシル基、イソドデシル基、ウンデシル基、ラウリル基、ミリスチル基、セチル基、ステアリル基等の炭素数1~25の直鎖または分岐鎖のアルキル基:シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等の炭素数3~25のシクロアルキル基;シクロヘキシルメチル基等の炭素数4~25のシクロアルキルアルキル基等が挙げられ、炭素数4~25のアルキル基であることが好ましい。
 R~Rで表される炭素数1~25の脂肪族炭化水素基が有していてもよい置換基としては、ヒドロキシ基、シアノ基、ハロゲン原子、メルカプト基、アミノ基、ニトロ基等が挙げられる。
 ハロゲン原子としては、フッ素原子、塩素原子、臭素原子およびヨウ素原子が挙げられる。
Examples of the aliphatic hydrocarbon group having 1 to 25 carbon atoms represented by R 1 to R 5 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group and a sec-butyl group. Group, n-pentyl group, isopentyl group, n-hexyl group, isohexyl group, n-octyl group, isooctyl group, n-nonyl group, isononyl group, n-decyl group, isodecyl group, n-dodecyl group, isododecyl group, Linear or branched alkyl group having 1 to 25 carbon atoms such as undecyl group, lauryl group, myristyl group, cetyl group and stearyl group: 3 to 25 carbon atoms such as cyclopropyl group, cyclobutyl group, cyclopentyl group and cyclohexyl group. Cycloalkyl group: A cycloalkylalkyl group having 4 to 25 carbon atoms such as a cyclohexylmethyl group, and an alkyl group having 4 to 25 carbon atoms is preferable.
Examples of the substituent that the aliphatic hydrocarbon group having 1 to 25 carbon atoms represented by R 1 to R 5 may have include a hydroxy group, a cyano group, a halogen atom, a mercapto group, an amino group, a nitro group and the like. Can be mentioned.
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
 R~Rで表される炭素数6~15の芳香族炭化水素基としては、フェニル基、ナフチル基、アントラセニル基、ビフェニル基等の炭素数6~15のアリール基;ベンジル基、フェニルエチル基、ナフチルメチル基、フェニル等の炭素数7~15のアラルキル基等が挙げられる。
 R~Rで表される炭素数6~15の芳香族炭化水素基が有していてもよい置換基としては、ヒドロキシ基、シアノ基、ハロゲン原子、メルカプト基、アミノ基、ニトロ基、アルコキシ基、アルキルチオ基、アルコキシカルボニル基、アシル基、アシルオキシ基、-C(NR2A)R2B、-CONR3A3B、-SO4A(R2A、R2B、R3AおよびR3Bはそれぞれ独立して水素原子または炭素数1~6のアルキル基を表し、R4Aは炭素数1~6のアルキル基を表す。)等が挙げられる。
Examples of the aromatic hydrocarbon group having 6 to 15 carbon atoms represented by R 1 to R 5 include an aryl group having 6 to 15 carbon atoms such as a phenyl group, a naphthyl group, an anthracenyl group and a biphenyl group; a benzyl group and a phenylethyl group. Examples thereof include an aralkyl group having 7 to 15 carbon atoms such as a group, a naphthylmethyl group and phenyl.
Examples of the substituent that the aromatic hydrocarbon group having 6 to 15 carbon atoms represented by R 1 to R 5 may have include a hydroxy group, a cyano group, a halogen atom, a mercapto group, an amino group and a nitro group. Alkoxy group, alkylthio group, alkoxycarbonyl group, acyl group, acyloxy group, -C (NR 2A ) R 2B , -CONR 3A R 3B , -SO 2 R 4A (R 2A , R 2B , R 3A and R 3B , respectively. Independently, it represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and R 4A represents an alkyl group having 1 to 6 carbon atoms.)
 ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられる。
 アルコキシ基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基、ペンチルオキシ基、ヘキシルオキシ基、オクチルオキシ基、2-エチルヘキシルオキシ基、ノニルオキシ基、デシルオキシ基、ウンデシルオキシ基、ドデシルオキシ基等の炭素数1~12のアルコキシ基が挙げられる。
 アルキルチオ基としては、メチルチオ基、エチルチオ基、プロピルチオ基、ブチルチオ基等の炭素数1~12のアルキルチオ基が挙げられる。
 アシル基としては、アセチル基、プロピオニル基およびブチリル基等の炭素数2~13のアシル基が挙げられる。
 アシルオキシ基としては、メチルカルボニルオキシ基、エチルカルボニルオキシ基、n-プロピルカルボニルオキシ基、イソプロピルカルボニルオキシ基、n-ブチルカルボニルオキシ基、sec-ブチルカルボニルオキシ基、tert-ブチルカルボニルオキシ基、ペンチルカルボニルオキシ基、ヘキシルカルボニルオキシ基、オクチルカルボニルオキシ基および2-エチルヘキシルカルボニルオキシ基等の炭素数2~13のアシルオキシ基が挙げられる。
 アルコキシカルボニル基としては、メトキシカルボニル基、エトキシカルボニル基、プロポキシカルボニル基、ブトキシカルボニル基、ペンチルオキシカルボニル基、ヘキシルオキシカルボニル基、オクチルオキシカルボニル基、2-エチルヘキシルオキシカルボニル基、ノニルオキシカルボニル基、デシルオキシカルボニル基、ウンデシルオキシカルボニル基、ドデシルオキシカルボニル基等の炭素数2~13のアルコキシカルボニル基が挙げられる。
 -CONR3A3Bとしては、アミノカルボニル基、メチルアミノカルボニル基、ジメチルアミノカルボニル基、エチルアミノカルボニル基、メチルメチルアミノカルボニル基等が挙げられる。
 -C(NR2A)R2Bとしては、メチルイミノ基、ジメチルイミノ基、メチルエチルイミノ基等が挙げられる。
 -SO4Aとしては、メチルスルホニル基、エチルスルホニル基等が挙げられる。
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, an octyloxy group, a 2-ethylhexyloxy group, a nonyloxy group, a decyloxy group, an undecyloxy group and a dodecyloxy group. Alkoxy groups having 1 to 12 carbon atoms can be mentioned.
Examples of the alkylthio group include an alkylthio group having 1 to 12 carbon atoms such as a methylthio group, an ethylthio group, a propylthio group and a butylthio group.
Examples of the acyl group include an acyl group having 2 to 13 carbon atoms such as an acetyl group, a propionyl group and a butyryl group.
Examples of the acyloxy group include a methylcarbonyloxy group, an ethylcarbonyloxy group, an n-propylcarbonyloxy group, an isopropylcarbonyloxy group, an n-butylcarbonyloxy group, a sec-butylcarbonyloxy group, a tert-butylcarbonyloxy group, and a pentylcarbonyl. Examples thereof include acyloxy groups having 2 to 13 carbon atoms such as an oxy group, a hexylcarbonyloxy group, an octylcarbonyloxy group and a 2-ethylhexylcarbonyloxy group.
Examples of the alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group, a pentyloxycarbonyl group, a hexyloxycarbonyl group, an octyloxycarbonyl group, a 2-ethylhexyloxycarbonyl group, a nonyloxycarbonyl group, and a decyl. Examples thereof include alkoxycarbonyl groups having 2 to 13 carbon atoms such as an oxycarbonyl group, an undecyloxycarbonyl group, and a dodecyloxycarbonyl group.
The -CONR 3A R 3B, aminocarbonyl group, methylaminocarbonyl group, dimethylaminocarbonyl group, ethylaminocarbonyl group, and the like methyl aminocarbonyl group.
Examples of -C (NR 2A ) R 2B include a methylimino group, a dimethylimino group, a methylethylimino group and the like.
Examples of -SO 2 R 4A include a methyl sulfonyl group and an ethyl sulfonyl group.
 R1AおよびR1Bで表される炭素数1~6のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、tert-ブチル基、sec-ブチル基等が挙げられる。 Examples of the alkyl group having 1 to 6 carbon atoms represented by R 1A and R 1B include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group, a sec-butyl group and the like. Can be mentioned.
 R~Rで表される複素環基としては、ピロリジン環基、ピロリン環基、イミダゾリジン環基、イミダゾリン環基、オキサゾリン環基、チアゾリン環基、ピペリジン環基、モルホリン環基、ピペラジン環基、インドール環基、イソインドール環基、キノリン環基、チオフェン環基、ピロール環基、チアゾリン環基およびフラン環基等の炭素数4~20の脂肪族複素環基または炭素数3~20の芳香族複素環基等が挙げられる。 Examples of the heterocyclic group represented by R 1 to R 5 include a pyrrolidine ring group, a pyrolin ring group, an imidazolidine ring group, an imidazoline ring group, an oxazoline ring group, a thiazolin ring group, a piperidine ring group, a morpholine ring group, and a piperazine ring. An aliphatic heterocyclic group having 4 to 20 carbon atoms or an aliphatic heterocyclic group having 3 to 20 carbon atoms such as a group, an indole ring group, an isoindole ring group, a quinoline ring group, a thiophene ring group, a pyrrol ring group, a thiazolin ring group and a furan ring group. Examples include aromatic heterocyclic groups.
 RおよびRで表される炭素数1~25のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、tert-ブチル基、sec-ブチル基、n-ペンチル基、イソペンチル基、n-ヘキシル基、イソヘキシル基、n-オクチル基、イソオクチル基、n-ノニル基、イソノニル基、n-デシル基、イソデシル基、n-ドデシル基、イソドデシル基、ウンデシル基、ラウリル基、ミリスチル基、セチル基、ステアリル基等の炭素数1~25の直鎖または分岐鎖のアルキル基等が挙げられる。 Alkyl groups having 1 to 25 carbon atoms represented by R 6 and R 7 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, tert-butyl group, sec-butyl group and n. -Pentyl group, isopentyl group, n-hexyl group, isohexyl group, n-octyl group, isooctyl group, n-nonyl group, isononyl group, n-decyl group, isodecil group, n-dodecyl group, isododecyl group, undecyl group, Examples thereof include linear or branched alkyl groups having 1 to 25 carbon atoms such as lauryl group, myristyl group, cetyl group and stearyl group.
 RおよびRで表される電子吸引性基としては、例えば、シアノ基、ニトロ基、ハロゲン原子、ハロゲン原子で置換されたアルキル基、式(I-1)で表される基が挙げられる。
Figure JPOXMLDOC01-appb-C000002
[式中、R111は、水素原子または炭素数1~25の炭化水素基を表し、該アルキル基に含まれるメチレン基の少なくとも1つは酸素原子に置換されていてもよい。
 Xは、-CO-*、-COO-*、-CS-*、-CSS-*、-CSNR112-*、-CONR113-*、-CNR114-*またはSO-*を表す。
 R112、R113およびR114は、それぞれ独立して、水素原子、炭素数1~6のアルキル基またはフェニル基を表す。
 *はR111との結合手を表す。
 *は炭素原子との結合手を表す。]
Examples of the electron-withdrawing group represented by R 6 and R 7 include a cyano group, a nitro group, a halogen atom, an alkyl group substituted with a halogen atom, and a group represented by the formula (I-1). ..
Figure JPOXMLDOC01-appb-C000002
[In the formula, R 111 represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms, and at least one of the methylene groups contained in the alkyl group may be substituted with an oxygen atom.
X 1 is, -CO- * 1, -COO- * 1 , -CS- * 1, -CSS- * 1, -CSNR 112 - * 1, -CONR 113 - * 1, -CNR 114 - * 1 or SO Represents 2- * 1.
R 112 , R 113 and R 114 independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a phenyl group.
* 1 represents a bond with R 111.
* Represents a bond with a carbon atom. ]
 ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられる。
 ハロゲン原子で置換されたアルキル基としては、例えば、トリフルオロメチル基、ペルフルオロエチル基、ペルフルオロプロピル基、ペルフルオロイソプロピル基、ペルフルオロブチル基、ペルフルオロsec-ブチル基、ペルフルオロtert-ブチル基、ペルフルオロペンチル基およびペルフルオロヘキシル基等のパーフルオロアルキル基等が挙げられる。ハロゲン原子で置換されたアルキル基の炭素数としては、通常1~25である。
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Alkyl groups substituted with halogen atoms include, for example, trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl group, perfluorotert-butyl group, perfluoropentyl group and Examples thereof include a perfluoroalkyl group such as a perfluorohexyl group. The number of carbon atoms of the alkyl group substituted with the halogen atom is usually 1 to 25.
 R111で表される炭素数1~25の炭化水素基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、tert-ブチル基、sec-ブチル基、n-ペンチル基、イソペンチル基、n-ヘキシル基、イソヘキシル基、n-オクチル基、イソオクチル基、n-ノニル基、イソノニル基、n-デシル基、イソデシル基、n-ドデシル基、イソドデシル基、ウンデシル基、ラウリル基、ミリスチル基、セチル基、ステアリル基等の炭素数1~25の直鎖または分岐鎖のアルキル基:シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等の炭素数3~25のシクロアルキル基;シクロプロピルメチル基、シクロヘキシルメチル基等の炭素数4~25のシクロアルキルアルキル基;フェニル基、ナフチル基、アントラセニル基、ビフェニル基等の炭素数6~25のアリール基;ベンジル基、フェニルエチル基、ナフチルメチル基、フェニル等の炭素数7~25のアラルキル基が挙げられる。
 R112、R113およびR114で表される炭素数1~6のアルキル基としては、R1Aで表される炭素数1~6のアルキル基と同じものが挙げられる。
Examples of the hydrocarbon group having 1 to 25 carbon atoms represented by R 111 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group, a sec-butyl group and an n-pentyl group. Group, isopentyl group, n-hexyl group, isohexyl group, n-octyl group, isooctyl group, n-nonyl group, isononyl group, n-decyl group, isodecyl group, n-dodecyl group, isododecyl group, undecyl group, lauryl group , A linear or branched alkyl group having 1 to 25 carbon atoms such as a myristyl group, a cetyl group and a stearyl group: a cycloalkyl group having 3 to 25 carbon atoms such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group; Cycloalkylalkyl group having 4 to 25 carbon atoms such as cyclopropylmethyl group and cyclohexylmethyl group; aryl group having 6 to 25 carbon atoms such as phenyl group, naphthyl group, anthracenyl group and biphenyl group; benzyl group, phenylethyl group, etc. Examples thereof include an aralkyl group having 7 to 25 carbon atoms such as a naphthylmethyl group and phenyl.
Examples of the alkyl group having 1 to 6 carbon atoms represented by R 112, R 113 and R 114 include the same alkyl group having 1 to 6 carbon atoms represented by R 1A.
 R111は、炭素数4~25のアルキル基であることが好ましく、炭素数4~12のアルキル基であることがより好ましい。
 Xは、-CO-*およびCOO-*であることが好ましい。
R 111 is preferably an alkyl group having 4 to 25 carbon atoms, and more preferably an alkyl group having 4 to 12 carbon atoms.
X 1 is preferably −CO− * 1 and COO− * 1.
 RおよびRで表される電子吸引性基は、それぞれ独立して、シアノ基および式(I-1)で表される基であることが好ましい。 The electron-withdrawing groups represented by R 6 and R 7 are preferably cyano groups and groups represented by the formula (I-1), respectively.
 RおよびRが互いに結合して形成される環構造としては、RおよびRが結合している窒素原子を含む含窒素環構造であって、例えば、4員環~10員環の含窒素複素環が挙げられる。RおよびRが互いに連結して形成される環構造は、単環であってもよいし、多環であってもよい。具体的には、ピロリジン環、ピロリン環、イミダゾリジン環、イミダゾリン環、オキサゾリン環、チアゾリン環、ピペリジン環、モルホリン環、ピペラジン環、インドール環、イソインドール環等が挙げられる。RおよびRが互いに結合して形成される環は置換基を有していてもよく、該置換基としては、メチル基、エチル基、プロピル基、ブチル基、イソブチル基等の炭素数1~12のアルキル基;メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等の炭素数1~12のアルコキシ基等が挙げられる。 The ring structure formed by bonding R 1 and R 2 to each other is a nitrogen-containing ring structure containing a nitrogen atom to which R 1 and R 2 are bonded, and is, for example, a 4-membered ring to a 10-membered ring. A nitrogen-containing heterocycle can be mentioned. The ring structure formed by connecting R 1 and R 2 to each other may be monocyclic or polycyclic. Specific examples thereof include a pyrrolidine ring, a pyrroline ring, an imidazolidine ring, an imidazoline ring, an oxazoline ring, a thiazolin ring, a piperidine ring, a morpholine ring, a piperazine ring, an indole ring, and an isoindole ring. The ring formed by bonding R 1 and R 2 to each other may have a substituent, and the substituent may have a carbon number of 1 such as a methyl group, an ethyl group, a propyl group, a butyl group, and an isobutyl group. Alkyl groups of to 12; alkoxy groups having 1 to 12 carbon atoms such as methoxy group, ethoxy group, propoxy group, butoxy group and the like can be mentioned.
 RおよびRが互いに結合して形成される環構造としては、Rが結合している窒素原子を含む含窒素環構造であって、例えば、4員環~10員環の含窒素複素環が挙げられる。RおよびRが互いに連結して形成される環構造は、単環であってもよいし、多環であってもよい。具体的には、ピロリジン環、ピロリン環、イミダゾリジン環、イミダゾリン環、オキサゾリン環、チアゾリン環、ピペリジン環、モルホリン環、ピペラジン環、インドール環、イソインドール環および下記式(I-3)で表される環構造が挙げられる。
Figure JPOXMLDOC01-appb-C000003
[式(I-3)中、Xは、窒素原子、酸素原子、硫黄原子を表す。
 環Wは、窒素原子とXとを構成要素とする環を表す。]
The ring structure formed by bonding R 2 and R 3 to each other is a nitrogen-containing ring structure containing a nitrogen atom to which R 2 is bonded, and is, for example, a nitrogen-containing heterocycle having a 4-membered ring to a 10-membered ring. Ring is mentioned. The ring structure formed by connecting R 2 and R 3 to each other may be monocyclic or polycyclic. Specifically, it is represented by a pyrrolidine ring, a pyrroline ring, an imidazolidine ring, an imidazoline ring, an oxazoline ring, a thiazolin ring, a piperidine ring, a morpholine ring, a piperazine ring, an indol ring, an isoindole ring and the following formula (I-3). Ring structure can be mentioned.
Figure JPOXMLDOC01-appb-C000003
[In formula (I-3), X represents a nitrogen atom, an oxygen atom, and a sulfur atom.
Ring W 1 represents a ring having a nitrogen atom and X as constituent elements. ]
 環Wは、窒素原子とXとを構成要素とする5員環または6員環であることが好ましい。
 式(I-3)で表される環構造としては、具体的には以下の環が挙げられる。
Figure JPOXMLDOC01-appb-C000004
Ring W 1 is preferably a 5-membered ring or a 6-membered ring having a nitrogen atom and X as constituent elements.
Specific examples of the ring structure represented by the formula (I-3) include the following rings.
Figure JPOXMLDOC01-appb-C000004
 RおよびRが互いに結合して形成される環構造は、置換基を有していてもよく、該置換基としては、メチル基、エチル基、プロピル基、ブチル基、イソブチル基等の炭素数1~12のアルキル基;メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等の炭素数1~12のアルコキシ基等が挙げられる。 The ring structure formed by bonding R 2 and R 3 to each other may have a substituent, and the substituent may be a carbon such as a methyl group, an ethyl group, a propyl group, a butyl group or an isobutyl group. Alkyl group of number 1 to 12; alkoxy group having 1 to 12 carbon atoms such as methoxy group, ethoxy group, propoxy group, butoxy group and the like can be mentioned.
 RおよびRが互いに結合して形成される環構造は、下記式(I-4)で表される環構造であることが好ましい。
Figure JPOXMLDOC01-appb-C000005
[式(I-4)中、R11は上記と同じ意味を表す。m2は、1~7の整数を表す。
 R11a、R11b、R11cおよびR11dは、それぞれ独立して、水素原子または炭素数1~12のアルキル基を表す。
 *は、炭素原子との結合手を表す。]
 m2は、2または3であることが好ましく、2であることがより好ましい。
The ring structure formed by bonding R 2 and R 3 to each other is preferably a ring structure represented by the following formula (I-4).
Figure JPOXMLDOC01-appb-C000005
[In formula (I-4), R 11 has the same meaning as above. m2 represents an integer from 1 to 7.
R 11a , R 11b , R 11c and R 11d each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.
* Represents a bond with a carbon atom. ]
m2 is preferably 2 or 3, more preferably 2.
 RおよびRが互いに結合して形成される環構造としては、4員環~10員環の含窒素環構造が挙げられ、5員環~9員環の含窒素環構造が好ましい。RおよびRが互いに結合して形成される環構造は、単環であってもよいし、多環であってもよい。これらの環は置換基を有していてもよい。このような環構造としては、ピロール環、インドール環、ピリミジン環、下記に記載の環が挙げられる。
Figure JPOXMLDOC01-appb-C000006
Examples of the ring structure formed by bonding R 2 and R 4 to each other include a nitrogen-containing ring structure having a 4-membered ring to a 10-membered ring, and a nitrogen-containing ring structure having a 5-membered ring to a 9-membered ring is preferable. The ring structure formed by bonding R 2 and R 4 to each other may be monocyclic or polycyclic. These rings may have substituents. Examples of such a ring structure include a pyrrole ring, an indole ring, a pyrimidine ring, and the rings described below.
Figure JPOXMLDOC01-appb-C000006
 RおよびRが互いに結合して形成される環構造は置換基を有していてもよく、該置換基としては、メチル基、エチル基、プロピル基、ブチル基、イソブチル基等の炭素数1~12のアルキル基;メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等の炭素数1~12のアルコキシ基;アミノ基、メチルアミノ基、ジメチルアミノ基等の-NR22A22Bで表される基(R22AおよびR22Bは、それぞれ独立して、水素原子または炭素数1~6のアルキル基を表す);メチルチオ基、エチルチオ基、プロピルチオ基、ブチルチオ基、ペンチルチオ基等の炭素数1~12のアルキルチオ基;ピロリジニル基、ピペリジニル基、モルホリニル基等の炭素数4~9の複素環基等が挙げられる。 The ring structure formed by bonding R 2 and R 4 to each other may have a substituent, and the substituent may have a number of carbon atoms such as a methyl group, an ethyl group, a propyl group, a butyl group and an isobutyl group. Alkyl group of 1 to 12; alkoxy group having 1 to 12 carbon atoms such as methoxy group, ethoxy group, propoxy group and butoxy group; -NR 22AR 22B such as amino group, methylamino group and dimethylamino group. Groups (R 22A and R 22B each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms); 1 to 12 carbon atoms such as a methyl thio group, an ethyl thio group, a propyl thio group, a butyl thio group, a pentyl thio group, etc. Alkylthio group; Examples thereof include a heterocyclic group having 4 to 9 carbon atoms such as a pyrrolidinyl group, a piperidinyl group and a morpholinyl group.
 RおよびRが互いに連結して形成される環構造としては、R-C=C-C=C-Rが環の骨格を形成する環構造である。例えば、フェニル基等が挙げられる。 As a ring structure formed by connecting R 3 and R 6 to each other, R 3 -C = CC = C-R 6 is a ring structure forming a ring skeleton. For example, a phenyl group and the like can be mentioned.
 RおよびRが互いに連結して形成される環構造としては、以下に記載の環構造が挙げられる。RおよびRが互いに結合して形成される環構造は置換基を有していてもよく、該置換基としては、メチル基、エチル基、プロピル基、ブチル基、イソブチル基等の炭素数1~12のアルキル基;メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等の炭素数1~12のアルコキシ基等が挙げられる。
Figure JPOXMLDOC01-appb-C000007
Examples of the ring structure formed by connecting R 5 and R 7 to each other include the ring structures described below. The ring structure formed by bonding R 5 and R 7 to each other may have a substituent, and the substituent may have a number of carbon atoms such as a methyl group, an ethyl group, a propyl group, a butyl group and an isobutyl group. Alkyl groups of 1 to 12; alkoxy groups having 1 to 12 carbon atoms such as methoxy group, ethoxy group, propoxy group, butoxy group and the like can be mentioned.
Figure JPOXMLDOC01-appb-C000007
 RおよびRは互いに連結して形成される環構造としては、下記に記載の環構造等が挙げられる。RおよびRが互いに結合して形成される環構造は置換基(下記式中のR~R16)を有していてもよく、該置換基としては、メチル基、エチル基、プロピル基、ブチル基、イソブチル基等の炭素数1~12のアルキル基;メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等の炭素数1~12のアルコキシ基;後述のエチレン性不飽和基等が挙げられる。
Figure JPOXMLDOC01-appb-C000008
[式中、*は、炭素原子との結合手を表す。]
Examples of the ring structure formed by connecting R 6 and R 7 to each other include the ring structure described below. The ring structure formed by bonding R 6 and R 7 to each other may have substituents (R 1 to R 16 in the following formula), and the substituents include a methyl group, an ethyl group and a propyl group. An alkyl group having 1 to 12 carbon atoms such as a group, a butyl group and an isobutyl group; an alkoxy group having 1 to 12 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group and a butoxy group; Be done.
Figure JPOXMLDOC01-appb-C000008
[In the formula, * represents a bond with a carbon atom. ]
 R~Rで表されるエチレン性不飽和基としては、ビニル基、α―メチルビニル基、アクリロイル基、メタアクリロイル基、アリル基、スチリル基および式(I-2)で表される基が挙げられる。
Figure JPOXMLDOC01-appb-C000009
[式(I-2)中、Xは、ビニル基、アクリロイル基またはメタアクリロイル基を表す。
 R115は、炭素数1~18の2価の脂肪族炭化水素基を表し、該脂肪族炭化水素基に含まれる-CH-は、-O-、-CO-、-CS-またはNR116-に置き換わっていてもよい。
 R116は、水素原子または炭素数1~6のアルキル基を表す。
 *は炭素原子または窒素原子との結合手を表す。]
Examples of the ethylenically unsaturated group represented by R 1 to R 7 include a vinyl group, an α-methyl vinyl group, an acryloyl group, a metaacryloyl group, an allyl group, a styryl group and a group represented by the formula (I-2). Can be mentioned.
Figure JPOXMLDOC01-appb-C000009
[In formula (I-2), X 2 represents a vinyl group, an acryloyl group or a meta-acryloyl group.
R 115 represents a divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms, and -CH 2- contained in the aliphatic hydrocarbon group is -O-, -CO-, -CS- or NR 116. It may be replaced with-.
R 116 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
* Represents a bond with a carbon atom or a nitrogen atom. ]
 R115で表される炭素数1~18の2価の脂肪族炭化水素基としては、メチレン基、エチレン基、プロパン-1,3-ジイル基、プロパン-1,2-ジイル基、ブタン-1,4-ジイル基、ペンタン-1,5-ジイル基、ヘキサン-1,6-ジイル基、ブタン-1,3-ジイル基、2-メチルプロパン-1,3-ジイル基、2-メチルプロパン-1,2-ジイル基、ペンタン-1,4-ジイル基および2-メチルブタン-1,4-ジイル基等の炭素数1~18のアルカンジイル基:シクロプロパンジイル基、シクロブタンジイル基、シクロペンタンジイル基、シクロヘキサンジイル基等の炭素数3~18のシクロアルカンジイル基が挙げられ、炭素数1~12の2価の脂肪族炭化水素基であることが好ましい。
 R116で表される炭素数1~6のアルキル基としては、R1Aで表される炭素数1~6のアルキル基と同じものが挙げられる。
Examples of the divalent aliphatic hydrocarbon group having 1 to 18 carbon atoms represented by R 115 include a methylene group, an ethylene group, a propane-1,3-diyl group, a propane-1,2-diyl group and butane-1. , 4-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, butane-1,3-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane- Alcandiyl groups having 1 to 18 carbon atoms such as 1,2-diyl group, pentane-1,4-diyl group and 2-methylbutane-1,4-diyl group: cyclopropanediyl group, cyclobutanediyl group, cyclopentanediyl Examples thereof include a cycloalkandyl group having 3 to 18 carbon atoms such as a group and a cyclohexanediyl group, and a divalent aliphatic hydrocarbon group having 1 to 12 carbon atoms is preferable.
Examples of the alkyl group having 1 to 6 carbon atoms represented by R 116 include the same alkyl groups having 1 to 6 carbon atoms represented by R 1A.
 R~Rで表されるエチレン性不飽和基は、それぞれ独立して、ビニル基、アクリロイル基、メタアクリロイル基、および式(I-2)で表される基であることが好ましい。 The ethylenically unsaturated groups represented by R 1 to R 7 are preferably vinyl groups, acryloyl groups, metaacryloyl groups, and groups represented by the formula (I-2), respectively.
 RおよびRのうちいずれか一方が電子吸引性基であることが好ましい。
 RおよびRのうちいずれか一方がエチレン性不飽和基であることが好ましい。
It is preferable that any one of R 6 and R 7 is an electron-withdrawing group.
It is preferable that either one of R 6 and R 7 is an ethylenically unsaturated group.
 式(I)で表される化合物に由来する構造単位は、式(II)で表される化合物に由来の構造単位であることが好ましい。
Figure JPOXMLDOC01-appb-C000010
[式(II)中、R11、R12、R13、R14およびR15は、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~25の脂肪族炭化水素基、置換基を有していてもよい炭素数6~15の芳香族炭化水素基または複素環基を表し、該脂肪族炭化水素基または芳香族炭化水素基に含まれる-CH-は、-NR11A-、-SO-、-CO-、-O-またはS-に置換されていてもよい。
 R16およびR17は、それぞれ独立して、水素原子、炭素数1~25のアルキル基、電子吸引性基またはエチレン性不飽和基を表す。
 R11Aは、水素原子または炭素数1~6のアルキル基を表す。
 R12およびR13は互いに連結して環構造を形成してもよく、R12およびR14は互いに連結して環構造を形成してもよい。
 ただし、R16またはR17のいずれかのうち1つはエチレン性不飽和基である。]
The structural unit derived from the compound represented by the formula (I) is preferably a structural unit derived from the compound represented by the formula (II).
Figure JPOXMLDOC01-appb-C000010
[In formula (II), R 11 , R 12 , R 13 , R 14 and R 15 are aliphatic hydrocarbons having 1 to 25 carbon atoms which may independently have a hydrogen atom and a substituent. Represents an aromatic hydrocarbon group or a heterocyclic group having 6 to 15 carbon atoms which may have a group or a substituent, and —CH 2 − contained in the aliphatic hydrocarbon group or the aromatic hydrocarbon group is It may be substituted with -NR 11A- , -SO 2- , -CO-, -O- or S-.
R 16 and R 17 independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, an electron-withdrawing group, or an ethylenically unsaturated group.
R 11A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
R 12 and R 13 may be connected to each other to form a ring structure, and R 12 and R 14 may be connected to each other to form a ring structure.
However, either one of R 16 or R 17 is an ethylenically unsaturated group. ]
 R11~R15で表される置換基を有していてもよい炭素数1~25脂肪族炭化水素基としては、Rで表される置換基を有していてもよい炭素数1~25の脂肪族炭化水素基と同じものが挙げられる。
 R11~R15で表される置換基を有していてもよい炭素数6~15の芳香族炭化水素基としては、Rで表される置換基を有していてもよい炭素数6~15の芳香族炭化水素基と同じものが挙げられる。
 R11~R15で表される複素環としては、Rで表される複素環と同じものが挙げられる。
R 11 ~ The substituent may have a number of 1 to 25 aliphatic carbon hydrocarbon groups represented by R 15, carbon atoms 1 may have a substituent represented by R 1 ~ The same as the 25 aliphatic hydrocarbon groups can be mentioned.
The aromatic hydrocarbon group having 6 to 15 carbon atoms which may have a substituent represented by R 11 to R 15 may have a substituent represented by R 1 and has 6 carbon atoms. The same as the aromatic hydrocarbon groups of ~ 15 can be mentioned.
Examples of the heterocycle represented by R 11 to R 15 include the same heterocycle represented by R 1.
 R16およびR17で表される炭素数1~25のアルキル基としては、Rで表される炭素数1~25のアルキル基と同じものが挙げられる。
 R16およびR17で表される電子吸引性基としては、Rで表される電子吸引性基と同じものが挙げられる。
 R11AおよびR11Bで表される炭素数1~6のアルキル基としては、R1Aで表される炭素数1~6のアルキル基と同じものが挙げられる。
Examples of the alkyl group having 1 to 25 carbon atoms represented by R 16 and R 17 include the same alkyl group having 1 to 25 carbon atoms represented by R 6.
Examples of the electron-withdrawing group represented by R 16 and R 17 include the same as the electron-withdrawing group represented by R 6.
Examples of the alkyl group having 1 to 6 carbon atoms represented by R 11A and R 11B include the same alkyl group having 1 to 6 carbon atoms represented by R 1A.
 R12およびR13が互いに連結して形成できる環構造としては、RおよびRが互いに連結して形成できる環構造と同じものが挙げられる。R12およびR13が互いに連結して形成できる環構造は、単環構造であることが好ましい。 Examples of the ring structure in which R 12 and R 13 can be formed by connecting with each other include the same ring structure in which R 2 and R 3 can be formed by connecting with each other. The ring structure that can be formed by connecting R 12 and R 13 to each other is preferably a monocyclic structure.
 R12およびR14が互いに連結して形成できる環構造としては、RおよびRが互いに連結して形成できる環構造と同じものが挙げられる。R12およびR14が互いに連結して形成できる環構造は、単環構造であることが好ましい。R12およびR14が互いに連結して形成できる環構造は、芳香族環であることが好ましく、ピリミジン環構造であることがさらに好ましい。 Examples of the ring structure in which R 12 and R 14 can be formed by connecting with each other include the same ring structure in which R 2 and R 4 can be formed by connecting with each other. The ring structure that can be formed by connecting R 12 and R 14 to each other is preferably a monocyclic structure. The ring structure formed by connecting R 12 and R 14 to each other is preferably an aromatic ring, and more preferably a pyrimidine ring structure.
 R11、R13およびR15は、それぞれ独立して、置換基を有していてもよい炭素数1~25の脂肪族炭化水素基であることが好ましく、置換基を有していてもよい炭素数1~25のアルキル基であることがより好ましく、置換基を有していてもよい炭素数1~12のアルキル基であることがさらに好ましい。
 とりわけR11としては、炭素数1~10の脂肪族炭化水素基であることが好ましく、炭素数1~10のアルキル基であることがより好ましく、メチル基であることがさらに好ましい。
 R12およびR14は、それぞれ独立して、置換基を有していてもよい炭素数1~25の脂肪族炭化水素基であるか、R12およびR14が互いに連結して環構造を形成することが好ましい。
 R12およびR13は互いに連結して環構造を形成することが好ましく、さらに好ましくは上述した式(I-4)で表される環構造である。式(I-4)で表される環構造の中でも好ましくは、式(I-4-1)で表される環構造または式(I-4-2)で表される環構造であり、特に好ましくは式(I-4-1)で表される環構造である。
Figure JPOXMLDOC01-appb-C000011
 R16およびR17のうちいずれか一方はエチレン性不飽和基であり、もう一方は電子吸引性基であることが好ましい。
 R16およびR17で表される電子吸引性基は、それぞれ独立して、シアノ基、ニトロ基、フルオロ基、トリフルオロメチル基、および式(I-1)で表される基であることが好ましい。特に好ましくはシアノ基である。
 R16およびR17で表されるエチレン性不飽和基は、それぞれ独立して、ビニル基、アクリロイル基、メタアクリロイル基、および式(I-2)で表される基であることが好ましい。さらに好ましくは*-CO-O-(CH)n-X、(Xはビニル基、アクリロイル基またはメタアクリロイル基を表し、n=1~10の整数(好ましくはn=2~6の整数)を表す。)である。
R 11 , R 13 and R 15 are preferably aliphatic hydrocarbon groups having 1 to 25 carbon atoms, which may independently have a substituent, and may have a substituent. It is more preferably an alkyl group having 1 to 25 carbon atoms, and further preferably an alkyl group having 1 to 12 carbon atoms which may have a substituent.
In particular, R 11 is preferably an aliphatic hydrocarbon group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, and even more preferably a methyl group.
R 12 and R 14 are independently aliphatic hydrocarbon groups having 1 to 25 carbon atoms which may have substituents, or R 12 and R 14 are linked to each other to form a ring structure. It is preferable to do so.
R 12 and R 13 are preferably connected to each other to form a ring structure, and more preferably a ring structure represented by the above formula (I-4). Among the ring structures represented by the formula (I-4), the ring structure represented by the formula (I-4-1) or the ring structure represented by the formula (I-4-2) is particularly preferable. It is preferably a ring structure represented by the formula (I-4-1).
Figure JPOXMLDOC01-appb-C000011
It is preferable that one of R 16 and R 17 is an ethylenically unsaturated group and the other is an electron-withdrawing group.
The electron-withdrawing groups represented by R 16 and R 17 may be independently represented by a cyano group, a nitro group, a fluoro group, a trifluoromethyl group, and a group represented by the formula (I-1). preferable. Particularly preferably, it is a cyano group.
The ethylenically unsaturated groups represented by R 16 and R 17 are preferably vinyl groups, acryloyl groups, metaacryloyl groups, and groups represented by the formula (I-2), respectively. More preferably, * -CO-O- (CH 2 ) n-X 2 , (X 2 represents a vinyl group, an acryloyl group or a meta-acryloyl group, and is an integer of n = 1 to 10 (preferably n = 2 to 6). It represents an integer).
 R12およびR13は互いに連結して環構造を形成している式(II)で表される化合物としては、式(II-A-1)で表される化合物または式(II-A-2)で表される化合物であることが好ましい。R12およびR14は互いに連結して環構造を形成している式(II)で表される化合物としては、式(II-B-1)で表される化合であることが好ましい。
Figure JPOXMLDOC01-appb-C000012
 [式(II-A-1)、式(II-A-2)および式(II-B-1)中、R11、R14、R15、R16およびR17は、それぞれ上記と同じ意味を表す。
 R11e、R11f、R11g、R11h、R11k、R11m、R11nは、それぞれ独立して、水素原子または炭素数1~12のアルキル基を表す。
 R11qおよびR11pは、それぞれ独立して、水素原子、炭素数1~12のアルキル基、-NR22A22Bで表される基(R22AおよびR22Bは、それぞれ独立して、水素原子または炭素数1~6のアルキル基を表す)または複素環を表す。]
The compound represented by the formula (II) in which R 12 and R 13 are connected to each other to form a ring structure is a compound represented by the formula (II-A-1) or a compound represented by the formula (II-A-2). ) Is preferable. The compound represented by the formula (II) in which R 12 and R 14 are linked to each other to form a ring structure is preferably a compound represented by the formula (II-B-1).
Figure JPOXMLDOC01-appb-C000012
[In formula (II-A-1), formula (II-A-2) and formula (II-B-1), R 11 , R 14 , R 15 , R 16 and R 17 , respectively have the same meaning as above. Represents.
R 11e , R 11f , R 11g , R 11h , R 11k , R 11m , and R 11n each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.
R 11q and R 11p are each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, and a group represented by -NR 22A R 22B (R 22A and R 22B are each independently a hydrogen atom or a hydrogen atom or a group. Represents an alkyl group having 1 to 6 carbon atoms) or a heterocycle. ]
 例えば、電子吸引性基がシアノ基である式(II)で表される化合物は、下記式(I’)で表される化合物と式(L)で表される化合物とを反応させることで得ることができる。
Figure JPOXMLDOC01-appb-C000013
[式中、R222は2価の連結基を表し、Xは重合性基を表す。]
 式(I’)で表される化合物と式(L)で表される化合物との反応は、一般的なクネフェナーゲル縮合に用いられる任意の条件により進めることができる。例えば、塩基やカルボン酸無水物の存在下で行うことが好ましい。塩基としては、例えば、トリエチルアミン、N,N-ジイソプロピルエチルアミン、ピリジン、ピペリジン、ピロリジン、プロリン、N,N-ジメチルアミノピリジン、イミダゾール、水酸化ナトリウム、水酸化カリウム、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム、炭酸水素カリウム、カリウムターシャーリーブトキシド、ナトリウムターシャリーブトキシド、水素ナトリウム等が挙げられる。カルボン酸無水物としては、無水酢酸、無水コハク酸、無水フタル酸、無水マレイン酸、無水安息香酸等が挙げられる。塩基の使用量は、式(I’)で表される化合物1モルに対して、0.1~10モルであることが好ましい。無水酢酸の使用量は、式(I’)で表される化合物1モルに対して、0.2~5モルであることが好ましい。
 式(I’)で表される化合物と式(L)で表される化合物との反応は、有機溶媒中で行うことが好ましい。有機溶媒としては、トルエン、アセトニトリル、ジクロロメタン、トリクロロメタン等が挙げられる。
For example, the compound represented by the formula (II) in which the electron-withdrawing group is a cyano group is obtained by reacting the compound represented by the following formula (I') with the compound represented by the formula (L). be able to.
Figure JPOXMLDOC01-appb-C000013
[In the formula, R 222 represents a divalent linking group and X 2 represents a polymerizable group. ]
The reaction between the compound represented by the formula (I') and the compound represented by the formula (L) can be carried out under any conditions used for general Knephener gel condensation. For example, it is preferable to carry out in the presence of a base or a carboxylic acid anhydride. Examples of the base include triethylamine, N, N-diisopropylethylamine, pyridine, piperidine, pyrrolidine, proline, N, N-dimethylaminopyridine, imidazole, sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium hydrogen carbonate. , Potassium hydrogen carbonate, potassium hydroxide butoxide, sodium hydroxide, sodium hydrogen and the like. Examples of the carboxylic acid anhydride include acetic anhydride, succinic anhydride, phthalic anhydride, maleic anhydride, benzoic anhydride and the like. The amount of the base used is preferably 0.1 to 10 mol with respect to 1 mol of the compound represented by the formula (I'). The amount of acetic anhydride used is preferably 0.2 to 5 mol with respect to 1 mol of the compound represented by the formula (I').
The reaction between the compound represented by the formula (I') and the compound represented by the formula (L) is preferably carried out in an organic solvent. Examples of the organic solvent include toluene, acetonitrile, dichloromethane, trichloromethane and the like.
 式(I’)で表される化合物と式(L)で表される化合物との反応は、式(I’)で表される化合物と式(L)で表される化合物とを混合することで実施される。
 式(I’)で表される化合物と式(L)で表される化合物との反応温度は-40~130℃であることが好ましく、反応時間は通常1~24時間であることが好ましい。
The reaction between the compound represented by the formula (I') and the compound represented by the formula (L) is to mix the compound represented by the formula (I') and the compound represented by the formula (L). It will be carried out at.
The reaction temperature of the compound represented by the formula (I') and the compound represented by the formula (L) is preferably −40 to 130 ° C., and the reaction time is usually preferably 1 to 24 hours.
 式(I’)で表される化合物は、例えば、特開2014-194508号公報に記載の方法に準じて合成できる。 The compound represented by the formula (I') can be synthesized, for example, according to the method described in JP-A-2014-194508.
 式(L)で表される化合物は、例えば、シアノ酢酸とヒドロキシアルキルアクリレートとを反応させることで得ることができる。
 シアノ酢酸の使用量は、ヒドロキシアルキルアクリレート1モルに対して0.5~3モルであることが好ましい。
 シアノ酢酸とヒドロキシアルキルアクリレートとの反応は、一般的なエステル化反応に用いられる任意のエステル化触媒を用いることができるが、塩基およびカルボジイミド縮合剤の存在下で行うことが好ましい。塩基としては、例えば、トリエチルアミン、ジイソプロピルエチルアミン、ピリジン、ピペリジン、ピロリジン、プロリン、N,N-ジメチルアミノピリジン、イミダゾール、水酸化ナトリウム、水酸化カリウム、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム、炭酸水素カリウム、カリウムターシャーリーブトキシド、ナトリウムターシャリーブトキシド、水素ナトリウム等が挙げられる。カルボジイミド縮合剤としては、N,N-ジシクロヘキシルカルボジイミド、N,N-ジイソプロピルカルボジイミド、1-エチルー3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩等が挙げられる。塩基の使用量は、シアノ酢酸1モルに対して、0.5~5モルであることが好ましい。
 シアノ酢酸とヒドロキシアルキルアクリレートとの反応は、有機溶媒中で行うことが好ましい。有機溶媒としては、アセトニトリル、イソプロパノール、トルエン、トリクロロメタン、ジクロロメタン等が挙げられる。
The compound represented by the formula (L) can be obtained, for example, by reacting cyanoacetic acid with a hydroxyalkyl acrylate.
The amount of cyanoacetic acid used is preferably 0.5 to 3 mol with respect to 1 mol of the hydroxyalkyl acrylate.
The reaction between cyanoacetic acid and hydroxyalkyl acrylate can be carried out using any esterification catalyst used in general esterification reactions, but is preferably carried out in the presence of a base and a carbodiimide condensing agent. Examples of the base include triethylamine, diisopropylethylamine, pyridine, piperidine, pyrrolidine, proline, N, N-dimethylaminopyridine, imidazole, sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate. , Potassium hydroxide, sodium hydroxide, sodium hydrogen and the like. Examples of the carbodiimide condensing agent include N, N-dicyclohexylcarbodiimide, N, N-diisopropylcarbodiimide, 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride and the like. The amount of the base used is preferably 0.5 to 5 mol with respect to 1 mol of cyanoacetic acid.
The reaction between cyanoacetic acid and hydroxyalkyl acrylate is preferably carried out in an organic solvent. Examples of the organic solvent include acetonitrile, isopropanol, toluene, trichloromethane, dichloromethane and the like.
 シアノ酢酸とヒドロキシアルキルアクリレートとの反応は、シアノ酢酸とヒドロキシアルキルアクリレートとを混合することで実施される。
 シアノ酢酸とヒドロキシアルキルアクリレートとの反応温度は-40~130℃であることが好ましく、反応時間は通常1~24時間であることが好ましい。
The reaction between cyanoacetic acid and hydroxyalkyl acrylate is carried out by mixing cyanoacetic acid and hydroxyalkyl acrylate.
The reaction temperature of cyanoacetic acid and hydroxyalkyl acrylate is preferably −40 to 130 ° C., and the reaction time is usually preferably 1 to 24 hours.
 重合性基とメロシアニン構造とを有する化合物としては、以下に記載の化合物が挙げられる。
Figure JPOXMLDOC01-appb-C000014
Examples of the compound having a polymerizable group and a merocyanine structure include the compounds described below.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
 樹脂(A)は、側鎖にメロシアニン構造を有する構造単位のホモポリマーであってもよいし、側鎖にメロシアニン構造を有する構造単位およびその他の構造単位を含むコポリマーであってもよい。樹脂(A)はコポリマーであることが好ましい。
 樹脂(A)が側鎖にメロシアニン構造を有する構造単位以外に含んでいてもよい構造単位としては、例えば、下記群Aに記載の構造単位が挙げられる。
 群A:(メタ)アクリル酸エステルに由来する構造単位、スチレン系単量体に由来する構造単位、ビニル系単量体に由来する構造単位、式(a)で表される構造単位、式(b)で表される構造単位および式(c)で表される構造単位
Figure JPOXMLDOC01-appb-C000021
[式中、Ra1は2価の炭化水素基を表す。
 Rb1およびRb2は、それぞれ独立して、水素原子または炭化水素基を表す。
 Rc1およびRc2は、それぞれ独立して、2価の炭化水素基を表す。]
The resin (A) may be a homopolymer of a structural unit having a merocyanine structure in the side chain, or a copolymer containing a structural unit having a merocyanine structure in the side chain and other structural units. The resin (A) is preferably a copolymer.
Examples of the structural unit that the resin (A) may contain in addition to the structural unit having a merocyanine structure in the side chain include the structural units described in the following group A.
Group A: Structural unit derived from (meth) acrylic acid ester, structural unit derived from styrene-based monomer, structural unit derived from vinyl-based monomer, structural unit represented by the formula (a), formula ( The structural unit represented by b) and the structural unit represented by the formula (c).
Figure JPOXMLDOC01-appb-C000021
[In the formula, Ra1 represents a divalent hydrocarbon group.
R b1 and R b2 independently represent a hydrogen atom or a hydrocarbon group.
R c1 and R c2 each independently represent a divalent hydrocarbon group. ]
 (メタ)アクリル酸エステルとしては、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n-プロピル、(メタ)アクリル酸n-ブチル、(メタ)アクリル酸n-ペンチル、(メタ)アクリル酸n-ヘキシル、(メタ)アクリル酸n-ヘプチル、(メタ)アクリル酸n-オクチル、(メタ)アクリル酸n-ノニル、(メタ)アクリル酸n-デシル、(メタ)アクリル酸n-ドデシル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸ステアリル、等の(メタ)アクリル酸の直鎖状アルキルエステル;(メタ)アクリル酸i-プロピル、(メタ)アクリル酸i-ブチル、(メタ)アクリル酸t-ブチル、(メタ)アクリル酸i-ペンチル、(メタ)アクリル酸i-ヘキシル、(メタ)アクリル酸2-エチルヘキシル、(メタ)アクリル酸i-オクチル、(メタ)アクリル酸i-ノニル、(メタ)アクリル酸i-ステアリル、(メタ)アクリル酸i-アミル、等の(メタ)アクリル酸の分枝状アルキルエステル;(メタ)アクリル酸シクロへキシル、(メタ)アクリル酸イソボロニル、(メタ)アクリル酸アダマンチル、(メタ)アクリル酸ジシクロペンタニル、(メタ)アクリル酸シクロドデシル、(メタ)アクリル酸メチルシクロヘキシル、(メタ)アクリル酸トリメチルシクロヘキシル、(メタ)アクリル酸tert-ブチルシクロヘキシル、α-エトキシアクリル酸シクロヘキシル、等の(メタ)アクリル酸の脂環骨格含有アルキルエステル;(メタ)アクリル酸フェニル等の(メタ)アクリル酸の芳香環骨格含有エステル;等が挙げられる。 Examples of the (meth) acrylic acid ester include methyl (meth) acrylic acid, ethyl (meth) acrylic acid, n-propyl (meth) acrylic acid, n-butyl (meth) acrylic acid, n-pentyl (meth) acrylic acid, and the like. N-hexyl (meth) acrylic acid, n-heptyl (meth) acrylic acid, n-octyl (meth) acrylic acid, n-nonyl (meth) acrylic acid, n-decyl (meth) acrylic acid, (meth) acrylic acid Linear alkyl esters of (meth) acrylic acids such as n-dodecyl, lauryl (meth) acrylate, stearyl (meth) acrylate; i-propyl (meth) acrylate, i-butyl (meth) acrylate, T-butyl (meth) acrylic acid, i-pentyl (meth) acrylic acid, i-hexyl (meth) acrylic acid, 2-ethylhexyl (meth) acrylic acid, i-octyl (meth) acrylic acid, (meth) acrylic acid Branched alkyl esters of (meth) acrylic acids such as i-nonyl, i-stearyl (meth) acrylic acid, i-amyl (meth) acrylic acid; cyclohexyl (meth) acrylic acid, (meth) acrylic acid Isobolonyl, adamantyl (meth) acrylate, dicyclopentanyl (meth) acrylate, cyclododecyl (meth) acrylate, methylcyclohexyl (meth) acrylate, trimethylcyclohexyl (meth) acrylate, tert- (meth) acrylate Examples thereof include alicyclic skeleton-containing alkyl esters of (meth) acrylic acid such as butylcyclohexyl and α-ethoxyacrylic acid cyclohexyl; and aromatic ring skeleton-containing esters of (meth) acrylic acid such as phenyl (meth) acrylic acid.
 (メタ)アクリル酸エステルに由来する構造単位としては、(メタ)アクリル酸アルキルエステルにおけるアルキル基に置換基が導入された置換基含有(メタ)アクリル酸アルキルエステルを挙げることもできる。置換基含有(メタ)アクリル酸アルキルエステルの置換基は、アルキル基の水素原子を置換する基であり、その具体例はフェニル基、アルコキシ基、フェノキシ基を含む。置換基含有(メタ)アクリル酸アルキルエステルとして、具体的には、(メタ)アクリル酸2-メトキシエチル、(メタ)アクリル酸エトキシメチル、(メタ)アクリル酸フェノキシエチル、(メタ)アクリル酸2-(2-フェノキシエトキシ)エチル、(メタ)アクリル酸フェノキシジエチレングリコール、(メタ)アクリル酸フェノキシポリ(エチレングリコール)等が挙げられる。 As the structural unit derived from the (meth) acrylic acid ester, a substituent-containing (meth) acrylic acid alkyl ester in which a substituent is introduced into the alkyl group in the (meth) acrylic acid alkyl ester can also be mentioned. The substituent of the substituent-containing (meth) acrylic acid alkyl ester is a group that substitutes a hydrogen atom of the alkyl group, and specific examples thereof include a phenyl group, an alkoxy group, and a phenoxy group. Specific examples of the substituent-containing (meth) acrylic acid alkyl ester include (meth) acrylic acid 2-methoxyethyl, (meth) acrylic acid ethoxymethyl, (meth) acrylic acid phenoxyethyl, and (meth) acrylic acid 2-. Examples thereof include (2-phenoxyethoxy) ethyl, phenoxydiethylene glycol (meth) acrylate, and phenoxypoly (ethylene glycol) (meth) acrylate.
 これらの(メタ)アクリル酸エステルは、それぞれ単独で用いることができるほか、異なる複数のものを用いてもよい。 Each of these (meth) acrylic acid esters can be used alone, or a plurality of different ones may be used.
 本発明の樹脂(A)は、(メタ)アクリル酸アルキルエステルの中でもホモポリマーのガラス転移温度Tgが0℃未満である(メタ)アクリル酸アルキルエステル(a1)由来の構成単位、およびホモポリマーのTgが0℃以上である(メタ)アクリル酸アルキルエステル(a2)由来の構成単位を含有することが好ましい。このことは、粘着剤層の高温耐久性を高めるうえで有利である。(メタ)アクリル酸アルキルエステルのホモポリマーのTgは、例えばPOLYMER HANDBOOK(Wiley-Interscience)などの文献値を採用することができる。 The resin (A) of the present invention is a structural unit derived from the (meth) acrylic acid alkyl ester (a1) in which the glass transition temperature Tg of the homopolymer is less than 0 ° C. among the (meth) acrylic acid alkyl esters, and the homopolymer. It preferably contains a structural unit derived from the (meth) acrylic acid alkyl ester (a2) having a Tg of 0 ° C. or higher. This is advantageous in increasing the high temperature durability of the pressure-sensitive adhesive layer. As the Tg of the homopolymer of the (meth) acrylic acid alkyl ester, a literature value such as POLYMER HANDBOOK (Wiley-Interscience) can be adopted.
 (メタ)アクリル酸アルキルエステル(a1)の具体例は、アクリル酸エチル、アクリル酸n-およびi-プロピル、アクリル酸n-およびi-ブチル、アクリル酸n-ペンチル、アクリル酸n-およびi-へキシル、アクリル酸n-ヘプチル、アクリル酸n-およびi-オクチル、アクリル酸2-エチルへキシル、アクリル酸n-およびi-ノニル、アクリル酸n-およびi-デシル、アクリル酸n-ドデシル等のアルキル基の炭素数が2~12程度の(メタ)アクリル酸アルキルエステルを含む。 Specific examples of the (meth) acrylic acid alkyl ester (a1) include ethyl acrylate, n- and i-propyl acrylate, n- and i-butyl acrylate, n-pentyl acrylate, n- and i- acrylate. Hexyl, n-heptyl acrylate, n- and i-octyl acrylate, 2-ethylhexyl acrylate, n- and i-nonyl acrylate, n- and i-decyl acrylate, n-dodecyl acrylate, etc. Contains a (meth) acrylic acid alkyl ester having about 2 to 12 carbon atoms in the alkyl group of.
 (メタ)アクリル酸アルキルエステル(a1)は、1種のみを用いてもよいし2種以上を併用してもよい。なかでも、光学フィルムに積層した際の追従性やリワーク性の観点から、アクリル酸n-ブチル、アクリル酸n-オクチル、アクリル酸2-エチルへキシルなどが好ましい。 As the (meth) acrylic acid alkyl ester (a1), only one type may be used, or two or more types may be used in combination. Of these, n-butyl acrylate, n-octyl acrylate, 2-ethylhexyl acrylate and the like are preferable from the viewpoint of followability and reworkability when laminated on an optical film.
 (メタ)アクリル酸アルキルエステル(a2)は、(メタ)アクリル酸アルキルエステル(a1)以外の(メタ)アクリル酸アルキルエステルである。(メタ)アクリル酸アルキルエステル(a2)の具体例は、アクリル酸メチル、アクリル酸シクロヘキシル、アクリル酸イソボロニル、アクリル酸ステアリル、アクリル酸t-ブチル等を含む。 The (meth) acrylic acid alkyl ester (a2) is a (meth) acrylic acid alkyl ester other than the (meth) acrylic acid alkyl ester (a1). Specific examples of the (meth) acrylic acid alkyl ester (a2) include methyl acrylate, cyclohexyl acrylate, isobolonyl acrylate, stearyl acrylate, t-butyl acrylate and the like.
 (メタ)アクリル酸アルキルエステル(a2)は、1種のみを用いてもよいし2種以上を併用してもよい。中でも、高温耐久性の観点から、(メタ)アクリル酸アルキルエステル(a2)は、アクリル酸メチル、アクリル酸シクロヘキシル、アクリル酸イソボロニル等を含むことが好ましく、アクリル酸メチルを含むことがより好ましい。 As the (meth) acrylic acid alkyl ester (a2), only one type may be used, or two or more types may be used in combination. Among them, from the viewpoint of high temperature durability, the (meth) acrylic acid alkyl ester (a2) preferably contains methyl acrylate, cyclohexyl acrylate, isobolonyl acrylate and the like, and more preferably contains methyl acrylate.
 また、(メタ)アクリル酸エステルに由来の構造単位としては、極性官能基を有する(メタ)アクリル酸エステルに由来する構造単位も挙げられる。
 極性官能基を有する(メタ)アクリル酸エステル単量体としては、(メタ)アクリル酸1-ヒドロキシメチル、(メタ)アクリル酸1-ヒドロキシエチル、(メタ)アクリル酸1-ヒドロキシヘプチル、(メタ)アクリル酸1-ヒドロキシブチル、(メタ)アクリル酸1-ヒドロキシペンチル、(メタ)アクリル酸2-ヒドロキシエチル、(メタ)アクリル酸2-ヒドロキシプロピル、(メタ)アクリル酸2-ヒドロキシブチル、(メタ)アクリル酸2-ヒドロキシペンチル、(メタ)アクリル酸2-ヒドロキシヘキシル、(メタ)アクリル酸3-ヒドロキシプロピル、(メタ)アクリル酸3-ヒドロキシブチル、(メタ)アクリル酸3-ヒドロキシペンチル、(メタ)アクリル酸3-ヒドロキシヘキシル、(メタ)アクリル酸3-ヒドロキシヘプチル、(メタ)アクリル酸4-ヒドロキシブチル、(メタ)アクリル酸4-ヒドロキシペンチル、(メタ)アクリル酸4-ヒドロキシヘキシル、(メタ)アクリル酸4-ヒドロキシヘプチル、(メタ)アクリル酸4-ヒドロキシオクチル、(メタ)アクリル酸2-クロロ-2-ヒドロキシプロピル、(メタ)アクリル酸3-クロロ-2-ヒドロキシプロピル、(メタ)アクリル酸2-ヒドロキシー3-フェノキシプロピル、(メタ)アクリル酸5-ヒドロキシペンチル、(メタ)アクリル酸5-ヒドロキシヘキシル、(メタ)アクリル酸5-ヒドロキシヘプチル、(メタ)アクリル酸5-ヒドロキシオクチル、(メタ)アクリル酸5-ヒドロキシノニル、(メタ)アクリル酸6-ヒドロキシヘキシル、(メタ)アクリル酸6-ヒドロキシヘプチル、(メタ)アクリル酸6-ヒドロキシオクチル、(メタ)アクリル酸6-ヒドロキシノニル、(メタ)アクリル酸6-ヒドロキシデシル、(メタ)アクリル酸7-ヒドロキシヘプチル、(メタ)アクリル酸7-ヒドロキシオクチル、(メタ)アクリル酸7-ヒドロキシノニル、(メタ)アクリル酸7-ヒドロキシデシル、(メタ)アクリル酸7-ヒドロキシウンデシル、(メタ)アクリル酸8-ヒドロキシオクチル、(メタ)アクリル酸8-ヒドロキシノニル、(メタ)アクリル酸8-ヒドロキシデシル、(メタ)アクリル酸8-ヒドロキシウンデシル、(メタ)アクリル酸8-ヒドロキシドデシル、(メタ)アクリル酸9-ヒドロキシノニル、(メタ)アクリル酸9-ヒドロキシデシル、(メタ)アクリル酸9-ヒドロキシウンデシル、(メタ)アクリル酸9-ヒドロキシドデシル、(メタ)アクリル酸9-ヒドロキシトリデシル、(メタ)アクリル酸10-ヒドロキシデシル、(メタ)アクリル酸10-ヒドロキシウンデシル、(メタ)アクリル酸10-ヒドロキシドデシル、アクリル酸10-ヒドロキシトリデシル、(メタ)アクリル酸10-ヒドロキシテトラデシル、(メタ)アクリル酸11-ヒドロキシウンデシル、(メタ)アクリル酸11-ヒドロキシドデシル、(メタ)アクリル酸11-ヒドロキシトリデシル、(メタ)アクリル酸11-ヒドロキシテトラデシル、(メタ)アクリル酸11-ヒドロキシペンタデシル、(メタ)アクリル酸12-ヒドロキシドデシル、(メタ)アクリル酸12-ヒドロキシトリデシル、(メタ)アクリル酸12-ヒドロキシテトラデシル、(メタ)アクリル酸13-ヒドロキシペンタデシル、(メタ)アクリル酸13-ヒドロキシテトラデシル、(メタ)アクリル酸13-ヒドロキシペンタデシル、(メタ)アクリル酸14-ヒドロキシテトラデシル、(メタ)アクリル酸14-ヒドロキシペンタデシル、(メタ)アクリル酸15-ヒドロキシペンタデシル、(メタ)アクリル酸15-ヒドロキシヘプタデシル等のヒドロキシ基を有する(メタ)アクリル酸アルキルエステル等が挙げられる。
Further, as the structural unit derived from the (meth) acrylic acid ester, a structural unit derived from the (meth) acrylic acid ester having a polar functional group can also be mentioned.
Examples of the (meth) acrylic acid ester monomer having a polar functional group include (meth) acrylic acid 1-hydroxymethyl, (meth) acrylic acid 1-hydroxyethyl, (meth) acrylic acid 1-hydroxyheptyl, and (meth). 1-Hydroxybutyl acrylate, 1-hydroxypentyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, (meth) 2-Hydroxypentyl acrylate, 2-hydroxyhexyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 3-hydroxybutyl (meth) acrylate, 3-hydroxypentyl (meth) acrylate, (meth) 3-Hydroxyhexyl acrylate, 3-hydroxyheptyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 4-hydroxypentyl (meth) acrylate, 4-hydroxyhexyl (meth) acrylate, (meth) 4-Hydroxyheptyl acrylate, 4-hydroxyoctyl (meth) acrylate, 2-chloro-2-hydroxypropyl (meth) acrylate, 3-chloro-2-hydroxypropyl (meth) acrylate, (meth) acrylate 2-Hydroxy-3-phenoxypropyl, 5-hydroxypentyl (meth) acrylate, 5-hydroxyhexyl (meth) acrylate, 5-hydroxyheptyl (meth) acrylate, 5-hydroxyoctyl (meth) acrylate, (meth) ) 5-Hydroxyhexyl acrylate, 6-hydroxyhexyl (meth) acrylate, 6-hydroxyheptyl (meth) acrylate, 6-hydroxyoctyl (meth) acrylate, 6-hydroxynonyl (meth) acrylate, (meth) ) 6-Hydroxydecyl acrylate, 7-hydroxyheptyl (meth) acrylate, 7-hydroxyoctyl (meth) acrylate, 7-hydroxynonyl (meth) acrylate, 7-hydroxydecyl (meth) acrylate, (meth) ) 7-Hydroxyundesyl acrylate, 8-hydroxyoctyl (meth) acrylate, 8-hydroxynonyl (meth) acrylate, 8-hydroxydecyl (meth) acrylate, 8-hydroxyundecyl (meth) acrylate, 8-Hydroxydodecyl (meth) acrylate, 9-hydroxynonyl (meth) acrylate, 9-hydroxydecyl (meth) acrylate, 9-hydroxyunde (meth) acrylate Syl, 9-hydroxydodecyl (meth) acrylate, 9-hydroxytridecyl (meth) acrylate, 10-hydroxydecyl (meth) acrylate, 10-hydroxyundecyl (meth) acrylate, 10 (meth) acrylate -Hydroxydodecyl, 10-hydroxytridecyl acrylate, 10-hydroxytetradecyl (meth) acrylate, 11-hydroxyundecyl (meth) acrylate, 11-hydroxydodecyl (meth) acrylate, 11 (meth) acrylate -Hydroxytridecyl, 11-hydroxytetradecyl (meth) acrylate, 11-hydroxypentadecyl (meth) acrylate, 12-hydroxydodecyl (meth) acrylate, 12-hydroxytridecyl (meth) acrylate, (meth) ) 12-Hydroxytetradecyl acrylate, 13-hydroxypentadecyl (meth) acrylate, 13-hydroxytetradecyl (meth) acrylate, 13-hydroxypentadecyl (meth) acrylate, 14-hydroxy (meth) acrylate (Meta) acrylic acid alkyl esters having a hydroxy group such as tetradecyl, (meth) acrylic acid 14-hydroxypentadecyl, (meth) acrylic acid 15-hydroxypentadecyl, (meth) acrylic acid 15-hydroxyheptadecyl, etc. Can be mentioned.
 スチレン系単量体としては、スチレン;メチルスチレン、ジメチルスチレン、トリメチルスチレン、エチルスチレン、ジエチルスチレン、トリエチルスチレン、プロピルスチレン、ブチルスチレン、ヘキシルスチレン、ヘプチルスチレン、オクチルスチレン等のアルキルスチレン;フルオロスチレン、クロロスチレン、ブロモスチレン、ジブロモスチレン、ヨードスチレン等のハロゲン化スチレン;ニトロスチレン;アセチルスチレン;メトキシスチレン;およびジビニルベンゼンが挙げられる。 Examples of the styrene-based monomer include styrene; methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, triethylstyrene, propylstyrene, butylstyrene, hexylstyrene, heptylstyrene, octylstyrene and other alkylstyrenes; fluorostyrene, Examples thereof include halogenated styrenes such as chlorostyrene, bromostyrene, dibromostyrene and iodostyrene; nitrostyrene; acetylstyrene; methoxystyrene; and divinylbenzene.
 ビニル系単量体としては、酢酸ビニル、プロピオン酸ビニル、酪酸ビニル、2-エチルヘキサン酸ビニル、ラウリン酸ビニル等の脂肪酸ビニルエステル;塩化ビニル、臭化ビニル等のハロゲン化ビニル;塩化ビニリデン等のハロゲン化ビニリデン;ビニルピリジン、ビニルピロリドン、ビニルカルバゾール等の含窒素複素芳香族ビニル;ブタジエン、イソプレン、クロロプレン等の共役ジエン;および、アクリロニトリル、メタクリロニトリル等の不飽和ニトリルが挙げられる。 Examples of the vinyl-based monomer include fatty acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl 2-ethylhexanoate and vinyl laurate; vinyl halides such as vinyl chloride and vinyl bromide; vinylidene chloride and the like. Examples thereof include vinylidene halide; nitrogen-containing heteroaromatic vinyl such as vinylpyridine, vinylpyrrolidone and vinylcarbazole; conjugated diene such as butadiene, isoprene and chloroprene; and unsaturated nitriles such as acrylonitrile and methacrylonitrile.
 式(a)で表される構造単位を導く化合物は、例えば、ジイソシアネート化合物とポリオールとの反応によって合成することができる。
 式(b)で表される構造単位を導く化合物は、例えば、ハロゲン化シランやヒドロキシ基を持つシランを反応されることで合成することができる。
 式(c)で表される構造単位を導く化合物は、例えば、ポリカルボン酸とポリオールとの反応などによって合成することができる。
The compound that derives the structural unit represented by the formula (a) can be synthesized, for example, by reacting a diisocyanate compound with a polyol.
The compound that derives the structural unit represented by the formula (b) can be synthesized, for example, by reacting a silane halide or a silane having a hydroxy group.
The compound that derives the structural unit represented by the formula (c) can be synthesized, for example, by reacting a polycarboxylic acid with a polyol.
 群Aに記載の構造単位から選ばれる構造単位は、(メタ)アクリル酸エステルに由来する構造単位であることが好ましい。(メタ)アクリル酸エステルに由来する構造単位は、(メタ)アクリル酸アルキルエステルおよびヒドロキシ基を有する(メタ)アクリル酸アルキルエステルであることが好ましい。 The structural unit selected from the structural units described in group A is preferably a structural unit derived from (meth) acrylic acid ester. The structural unit derived from the (meth) acrylic acid ester is preferably a (meth) acrylic acid alkyl ester and a (meth) acrylic acid alkyl ester having a hydroxy group.
 本発明の樹脂(A)は、さらに別の構造単位(構造単位(aa)という場合がある)を含んでいてもよい。具体的には、(メタ)アクリルアミド系単量体に由来の構造単位、カルボキシル基を有する単量体に由来の構造単位、複素環基を有する単量体に由来の構造単位、置換もしくは無置換アミノ基を有する単量体に由来の構造単位等が挙げられる。 The resin (A) of the present invention may contain yet another structural unit (sometimes referred to as a structural unit (aa)). Specifically, a structural unit derived from a (meth) acrylamide-based monomer, a structural unit derived from a monomer having a carboxyl group, a structural unit derived from a monomer having a heterocyclic group, substituted or unsubstituted. Examples thereof include structural units derived from monomers having an amino group.
 (メタ)アクリルアミド系単量体としては、N-メチロール(メタ)アクリルアミド、N-(2-ヒドロキシエチル)(メタ)アクリルアミド、N-(3-ヒドロキシプロピル)(メタ)アクリルアミド、N-(4-ヒドロキシブチル)(メタ)アクリルアミド、N-(5-ヒドロキシペンチル)(メタ)アクリルアミド、N-(6-ヒドロキシヘキシル)(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド、N,N-ジエチル(メタ)アクリルアミド、N-イソプロピル(メタ)アクリルアミド、N-(3-ジメチルアミノプロピル)(メタ)アクリルアミド、N-(1,1-ジメチル-3-オキソブチル)(メタ)アクリルアミド、N-〔2-(2-オキソ-1-イミダゾリジニル)エチル〕(メタ)アクリルアミド、2-アクリロイルアミノ-2-メチル-1-プロパンスルホン酸、N-(メトキシメチル)アクリルアミド、N-(エトキシメチル)(メタ)アクリルアミド、N-(プロポキシメチル)(メタ)アクリルアミド、N-(1-メチルエトキシメチル)(メタ)アクリルアミド、N-(1-メチルプロポキシメチル)(メタ)アクリルアミド、N-(2-メチルプロポキシメチル)(メタ)アクリルアミド、N-(ブトキシメチル)(メタ)アクリルアミド、N-(1,1-ジメチルエトキシメチル)(メタ)アクリルアミド、N-(2-メトキシエチル)(メタ)アクリルアミド、N-(2-エトキシエチル)(メタ)アクリルアミド、N-(2-プロポキシエチル)(メタ)アクリルアミド、N-〔2-(1-メチルエトキシ)エチル〕(メタ)アクリルアミド、N-〔2-(1-メチルプロポキシ)エチル〕(メタ)アクリルアミド、N-〔2-(2-メチルプロポキシ)エチル〕(メタ)アクリルアミド、N-(2-ブトキシエチル)(メタ)アクリルアミド、N-〔2-(1,1-ジメチルエトキシ)エチル〕(メタ)アクリルアミドなどが挙げられる。なかでも、N-(メトキシメチル)アクリルアミド、N-(エトキシメチル)アクリルアミド、N-(プロポキシメチル)アクリルアミド、N-(ブトキシメチル)アクリルアミドおよびN-(2-メチルプロポキシメチル)アクリルアミドが好ましい。 Examples of the (meth) acrylamide-based monomer include N-methylol (meth) acrylamide, N- (2-hydroxyethyl) (meth) acrylamide, N- (3-hydroxypropyl) (meth) acrylamide, and N- (4-). Hydroxybutyl) (meth) acrylamide, N- (5-hydroxypentyl) (meth) acrylamide, N- (6-hydroxyhexyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl ( Meta) acrylamide, N-isopropyl (meth) acrylamide, N- (3-dimethylaminopropyl) (meth) acrylamide, N- (1,1-dimethyl-3-oxobutyl) (meth) acrylamide, N- [2-( 2-Oxo-1-imidazolidinyl) ethyl] (meth) acrylamide, 2-acrylloylamino-2-methyl-1-propanesulfonic acid, N- (methoxymethyl) acrylamide, N- (ethoxymethyl) (meth) acrylamide, N -(Prooxymethyl) (meth) acrylamide, N- (1-methylethoxymethyl) (meth) acrylamide, N- (1-methylpropoxymethyl) (meth) acrylamide, N- (2-methylpropoxymethyl) (meth) Acrylamide, N- (butoxymethyl) (meth) acrylamide, N- (1,1-dimethylethoxymethyl) (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N- (2-ethoxyethyl) (Meta) acrylamide, N- (2-propoxyethyl) (meth) acrylamide, N- [2- (1-methylethoxy) ethyl] (meth) acrylamide, N- [2- (1-methylpropoxy) ethyl] ( Meta) acrylamide, N- [2- (2-methylpropoxy) ethyl] (meth) acrylamide, N- (2-butoxyethyl) (meth) acrylamide, N- [2- (1,1-dimethylethoxy) ethyl] Examples include (meth) acrylamide. Of these, N- (methoxymethyl) acrylamide, N- (ethoxymethyl) acrylamide, N- (propoxymethyl) acrylamide, N- (butoxymethyl) acrylamide and N- (2-methylpropoxymethyl) acrylamide are preferable.
 カルボキシル基を有する単量体としては、(メタ)アクリル酸、カルボキシアルキル(メタ)アクリレート(例えば、カルボキシエチル(メタ)アクリレート、カルボキシペンチル(メタ)アクリレート)、マレイン酸、無水マレイン酸、フマル酸、クロトン酸等が挙げられ、好ましくはアクリル酸である。 Examples of the monomer having a carboxyl group include (meth) acrylic acid, carboxyalkyl (meth) acrylate (for example, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate), maleic acid, maleic anhydride, fumaric acid, and the like. Examples thereof include crotonic acid, and acrylic acid is preferable.
 複素環基を有する単量体としては、アクリロイルモルホリン、ビニルカプロラクタム、N-ビニル-2-ピロリドン、ビニルピリジン、テトラヒドロフルフリル(メタ)アクリレート、カプロラクトン変性テトラヒドロフルフリルアクリレート、3,4-エポキシシクロヘキシルメチル(メタ)アクリレート、グリシジル(メタ)アクリレート、2,5-ジヒドロフラン等が挙げられる。 Examples of the monomer having a heterocyclic group include acryloyl morpholine, vinyl caprolactam, N-vinyl-2-pyrrolidone, vinyl pyridine, tetrahydrofurfuryl (meth) acrylate, caprolactone-modified tetrahydrofurfuryl acrylate, and 3,4-epoxycyclohexylmethyl. Examples thereof include (meth) acrylate, glycidyl (meth) acrylate, and 2,5-dihydrofuran.
 置換もしくは無置換アミノ基を有する単量体としては、アミノエチル(メタ)アクリレート、N,N-ジメチルアミノエチル(メタ)アクリレート、ジメチルアミノプロピル(メタ)アクリレート等が挙げられる。 Examples of the monomer having a substituted or unsubstituted amino group include aminoethyl (meth) acrylate, N, N-dimethylaminoethyl (meth) acrylate, and dimethylaminopropyl (meth) acrylate.
 メロシアニン構造を有する構造単位および群Aから選ばれる構造単位以外の構造単位(aa)としては、カルボキシル基を有する単量体であることが好ましい。 The structural unit (aa) other than the structural unit having a merocyanine structure and the structural unit selected from group A is preferably a monomer having a carboxyl group.
 側鎖にメロシアニン構造を有する構造単位の含有量は、樹脂(A)に含まれる全構造単位100質量部に対して、0.01~50質量部であることが好ましく、0.1~20質量部であることがより好ましく、さらに好ましくは0.5~10質量部である。
 群Aに記載の構造単位から選ばれる少なくとも1つの構造単位の含有量は、樹脂(A)の全構造単位100質量部に対して、50質量部以上であることが好ましく、60~99.99質量部であることがより好ましい。
The content of the structural unit having a merocyanine structure in the side chain is preferably 0.01 to 50 parts by mass, preferably 0.1 to 20 parts by mass, based on 100 parts by mass of all the structural units contained in the resin (A). The amount is more preferably 0.5 to 10 parts by mass.
The content of at least one structural unit selected from the structural units described in group A is preferably 50 parts by mass or more, preferably 60 to 99.99 parts by mass, based on 100 parts by mass of all structural units of the resin (A). More preferably, it is by mass.
 樹脂(A)が構造単位(aa)を含有する場合、樹脂(A)の全構造単位100質量部に対して、好ましくは20質量部以下、より好ましくは、0.5質量部以上15質量部以下、さらに好ましくは0.5質量部以上10質量部以下、特に好ましくは1質量部以上7質量部以下である。 When the resin (A) contains the structural unit (aa), it is preferably 20 parts by mass or less, more preferably 0.5 parts by mass or more and 15 parts by mass with respect to 100 parts by mass of all the structural units of the resin (A). Hereinafter, it is more preferably 0.5 parts by mass or more and 10 parts by mass or less, and particularly preferably 1 part by mass or more and 7 parts by mass or less.
 樹脂(A)がヒドロキシ基を有する(メタ)アクリル酸アルキルエステルに由来の構造単位を含有する場合、該構造単位の含有量は、樹脂(A)の全構造単位100質量部に対して、好ましくは20質量部以下、より好ましくは、0.5質量部以上15質量部以下、さらに好ましくは0.5質量部以上10質量部以下、特に好ましくは1質量部以上7質量部以下である。
 粘着剤層の外面に積層することができるセパレートフィルムの剥離力亢進を防ぐ観点から、アミノ基を有する単量体を実質的に含まないことが好ましい。ここで実質的に含まないとは、樹脂(A)を構成する全構成単位100質量部中、0.1質量部以下であることをいう。
When the resin (A) contains a structural unit derived from a (meth) acrylic acid alkyl ester having a hydroxy group, the content of the structural unit is preferably based on 100 parts by mass of the total structural unit of the resin (A). Is 20 parts by mass or less, more preferably 0.5 parts by mass or more and 15 parts by mass or less, further preferably 0.5 parts by mass or more and 10 parts by mass or less, and particularly preferably 1 part by mass or more and 7 parts by mass or less.
From the viewpoint of preventing the peeling power of the separate film that can be laminated on the outer surface of the pressure-sensitive adhesive layer from being enhanced, it is preferable that the monomer having an amino group is substantially not contained. Here, substantially not contained means that the amount is 0.1 parts by mass or less out of 100 parts by mass of all the constituent units constituting the resin (A).
 樹脂(A)と後述する架橋剤(B)との反応性の点で、樹脂(A)はヒドロキシ基を有する(メタ)アクリル酸アルキルエステルに由来の構造単位またはカルボキシル基を有する単量体に由来の構造単位を含むこと好ましく、ヒドロキシ基を有する(メタ)アクリル酸アルキルエステルに由来の構造単位およびカルボキシル基を有する単量体に由来の構造単位のいずれもを含むことがより好ましい。ヒドロキシ基を有する(メタ)アクリル酸アルキルエステルとしては、アクリル酸2-ヒドロキシエチル、アクリル酸3-ヒドロキシプロピル、アクリル酸4-ヒドロキシブチル、アクリル酸5-ヒドロキシペンチル、アクリル酸6-ヒドロキシヘキシルが好ましい。特に、アクリル酸2-ヒドロキシエチル、アクリル酸4-ヒドロキシブチルおよびアクリル酸5-ヒドロキシペンチルを使用することで良好な耐久性を得ることができる。カルボキシル基を有する単量体としては、アクリル酸を用いることが好ましい。 In terms of reactivity between the resin (A) and the cross-linking agent (B) described later, the resin (A) is a structural unit derived from a (meth) acrylic acid alkyl ester having a hydroxy group or a monomer having a carboxyl group. It is preferable to include a structural unit derived from the structural unit, and it is more preferable to include both a structural unit derived from a (meth) acrylic acid alkyl ester having a hydroxy group and a structural unit derived from a monomer having a carboxyl group. As the (meth) acrylic acid alkyl ester having a hydroxy group, 2-hydroxyethyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 5-hydroxypentyl acrylate, and 6-hydroxyhexyl acrylate are preferable. .. In particular, good durability can be obtained by using 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate and 5-hydroxypentyl acrylate. Acrylic acid is preferably used as the monomer having a carboxyl group.
 樹脂(A)の重量平均分子量(Mw)は、好ましくは、30万~250万であり、より好ましくは50万~250万である。重量平均分子量が30万以上であると、高温環境における粘着剤層の耐久性が向上し、被着体と光選択吸収性粘着剤層との間の浮き剥れや、光選択吸収性粘着剤層の凝集破壊などの不具合を抑制しやすい。重量平均分子量が250万以下であると、粘着剤組成物を例えばシート状に加工(基材に塗工する)際の塗工性の観点で有利である。光選択吸収性粘着剤層の耐久性および粘着剤組成物の塗工性の両立の観点から、重量平均分子量は好ましくは60万~180万であり、より好ましくは70万~170万であり、特に好ましくは100万~160万である。また、重量平均分子量(Mw)と数平均分子量(Mn)との比で表される分子量分布(Mw/Mn)は、通常2~10、好ましくは3~8である。重量平均分子量は、ゲルパーミエーションクロマトグラフィにより分析でき、標準ポリスチレン換算の値である。 The weight average molecular weight (Mw) of the resin (A) is preferably 300,000 to 2.5 million, and more preferably 500,000 to 2.5 million. When the weight average molecular weight is 300,000 or more, the durability of the pressure-sensitive adhesive layer in a high temperature environment is improved, and the floating and peeling between the adherend and the light-selective absorbing pressure-sensitive adhesive layer and the light-selective absorbing pressure-sensitive adhesive are observed. It is easy to suppress defects such as cohesive failure of layers. When the weight average molecular weight is 2.5 million or less, it is advantageous from the viewpoint of coatability when the pressure-sensitive adhesive composition is processed into, for example, a sheet (coating on a base material). From the viewpoint of achieving both the durability of the light selective absorption pressure-sensitive adhesive layer and the coatability of the pressure-sensitive adhesive composition, the weight average molecular weight is preferably 600,000 to 1.8 million, more preferably 700,000 to 1.7 million. Particularly preferably, it is 1 million to 1.6 million. The molecular weight distribution (Mw / Mn) represented by the ratio of the weight average molecular weight (Mw) to the number average molecular weight (Mn) is usually 2 to 10, preferably 3 to 8. The weight average molecular weight can be analyzed by gel permeation chromatography and is a value in terms of standard polystyrene.
 樹脂(A)は、酢酸エチルに溶解させ、濃度20質量%の溶液としたとき、25℃における粘度が、20Pa・s以下であることが好ましく、0.1~15Pa・sであることがより好ましい。該範囲の粘度であると、粘着剤組成物を基材に塗工する際の塗工性の観点から有利である。なお、粘度は、ブルックフィールド粘度計により測定できる。 When the resin (A) is dissolved in ethyl acetate to prepare a solution having a concentration of 20% by mass, the viscosity at 25 ° C. is preferably 20 Pa · s or less, and more preferably 0.1 to 15 Pa · s. preferable. A viscosity in this range is advantageous from the viewpoint of coatability when the pressure-sensitive adhesive composition is applied to the substrate. The viscosity can be measured with a Brookfield viscometer.
 本発明の樹脂(A)は、例えば、溶液重合法、塊状重合法、懸濁重合法、乳化重合法などの公知の方法によって製造することができ、特に溶液重合法が好ましい。溶液重合法としては、例えば、単量体および有機溶媒を混合し、窒素雰囲気下、熱重合開始剤を添加し、40~90℃、好ましくは50~80℃程度の温度条件下、3~15時間程度攪拌する方法が挙げられる。反応制御のため、重合中、連続的または間歇的に単量体や熱重合開始剤を添加してもよい。該単量体や熱開始剤は有機溶媒に添加した状態であってもよい。 The resin (A) of the present invention can be produced by a known method such as a solution polymerization method, a bulk polymerization method, a suspension polymerization method, or an emulsion polymerization method, and the solution polymerization method is particularly preferable. As a solution polymerization method, for example, a monomer and an organic solvent are mixed, a thermal polymerization initiator is added under a nitrogen atmosphere, and the temperature conditions are 40 to 90 ° C., preferably 50 to 80 ° C., 3 to 15 A method of stirring for about an hour can be mentioned. For reaction control, monomers and thermal polymerization initiators may be added continuously or intermittently during the polymerization. The monomer and the heat initiator may be in a state of being added to an organic solvent.
 重合開始剤としては、熱重合開始剤や光重合開始剤等が用いられる。光重合開始剤としては、4-(2-ヒドロキシエトキシ)フェニル(2-ヒドロキシ-2-プロピル)ケトンなどが挙げられる。熱重合開始剤としては、2,2’-アゾビスイソブチロニトリル、2,2’-アゾビス(2-メチルブチロニトリル)、1,1’-アゾビス(シクロヘキサン-1-カルボニトリル)、2,2’-アゾビス(2,4-ジメチルバレロニトリル)、2,2’-アゾビス(2,4-ジメチル-4-メトキシバレロニトリル)、ジメチル-2,2’-アゾビス(2-メチルプロピオネート)、2,2’-アゾビス(2-ヒドロキシメチルプロピオニトリル)などのアゾ系化合物;ラウリルパーオキサイド、t-ブチルハイドロパーオキサイド、過酸化ベンゾイル、t-ブチルパーオキシベンゾエート、クメンハイドロパーオキサイド、ジイソプロピルパーオキシジカーボネート、ジプロピルパーオキシジカーボネート、t-ブチルパーオキシネオデカノエート、t-ブチルパーオキシピバレート、(3,5,5-トリメチルヘキサノイル)パーオキサイドなどの有機過酸化物;過硫酸カリウム、過硫酸アンモニウム、過酸化水素などの無機過酸化物などが挙げられる。また、過酸化物と還元剤とを併用したレドックス系開始剤なども使用できる。 As the polymerization initiator, a thermal polymerization initiator, a photopolymerization initiator, or the like is used. Examples of the photopolymerization initiator include 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone. Examples of the thermal polymerization initiator include 2,2'-azobisisobutyronitrile, 2,2'-azobis (2-methylbutyronitrile), 1,1'-azobis (cyclohexane-1-carbonitrile), and 2 , 2'-azobis (2,4-dimethylvaleronitrile), 2,2'-azobis (2,4-dimethyl-4-methoxyvaleronitrile), dimethyl-2,2'-azobis (2-methylpropionate) ), 2,2'-Azobis (2-hydroxymethylpropionitrile) and other azo compounds; lauryl peroxide, t-butyl hydroperoxide, benzoyl peroxide, t-butyl peroxybenzoate, cumene hydroperoxide, Organic peroxides such as diisopropylperoxydicarbonate, dipropylperoxydicarbonate, t-butylperoxyneodecanoate, t-butylperoxypivalate, (3,5,5-trimethylhexanoyl) peroxide ; Examples include inorganic peroxides such as potassium persulfate, ammonium persulfate, and hydrogen peroxide. In addition, a redox-based initiator in which a peroxide and a reducing agent are used in combination can also be used.
 重合開始剤の割合は、樹脂(A)を構成する単量体の総量100質量部に対して、0.001~5質量部程度である。樹脂(A)の重合は、活性エネルギー線(例えば紫外線など)による重合法を使用してもよい。 The ratio of the polymerization initiator is about 0.001 to 5 parts by mass with respect to 100 parts by mass of the total amount of the monomers constituting the resin (A). For the polymerization of the resin (A), a polymerization method using active energy rays (for example, ultraviolet rays) may be used.
 有機溶媒としては、トルエン、キシレンなどの芳香族炭化水素類;酢酸エチル、酢酸ブチルなどのエステル類;プロピルアルコール、イソプロピルアルコールなどの脂肪族アルコール類;アセトン、メチルエチルケトン、メチルイソブチルケトンなどのケトン類などが挙げられる。 Organic solvents include aromatic hydrocarbons such as toluene and xylene; esters such as ethyl acetate and butyl acetate; fatty alcohols such as propyl alcohol and isopropyl alcohol; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone. Can be mentioned.
 樹脂(A)は、下記式(1)を満たす樹脂であることが好ましく、さらに下記式(2)を満たす樹脂であることがより好ましい。
 ε(405)≧0.02  (1)
[式(1)中、ε(405)は波長405nmにおける樹脂のグラム吸光係数を表す。グラム吸光係数の単位はL/(g・cm)である。]
 ε(405)/ε(440)≧5  (2)
[式(2)中、ε(405)は波長405nmにおける樹脂のグラム吸光係数を表し、ε(440)は波長440nmにおける樹脂のグラム吸光係数を表す。]
 なお、樹脂(A)のグラム吸光度係数は、実施例に記載の方法で測定できる。
The resin (A) is preferably a resin satisfying the following formula (1), and more preferably a resin satisfying the following formula (2).
ε (405) ≧ 0.02 (1)
[In formula (1), ε (405) represents the gram extinction coefficient of the resin at a wavelength of 405 nm. The unit of the gram extinction coefficient is L / (g · cm). ]
ε (405) / ε (440) ≧ 5 (2)
[In formula (2), ε (405) represents the gram extinction coefficient of the resin at a wavelength of 405 nm, and ε (440) represents the gram extinction coefficient of the resin at a wavelength of 440 nm. ]
The gram absorbance coefficient of the resin (A) can be measured by the method described in Examples.
 樹脂(A)は、ε(405)の値が大きいほど波長405nmの光を吸収しやすく、ε(405)の値は0.02L/(g・cm)以上であることが好ましく、0.1L/(g・cm)以上であることがより好ましく、0.2L/(g・cm)以上であることがさらにより好ましく、通常10L/(g・cm)以下である。
 樹脂(A)を含む粘着剤組成物を有機エレクトロルミネッセンスディスプレイ(有機EL表示装置)や液晶表示装置等の表示装置(FPD:フラットパネルディスプレイ)に適用した場合に、樹脂(A)のε(405)が0.02L/(g・cm)以上であると、400nm付近の可視光の吸収性能が良好であることから、有機EL表示装置や液晶表示装置等の表示装置に用いられる位相差フィルムや有機EL発光素子の可視光による劣化を抑制することができる。
The larger the value of ε (405), the easier it is for the resin (A) to absorb light having a wavelength of 405 nm, and the value of ε (405) is preferably 0.02 L / (g · cm) or more, preferably 0.1 L. It is more preferably / (g · cm) or more, further preferably 0.2 L / (g · cm) or more, and usually 10 L / (g · cm) or less.
When the pressure-sensitive adhesive composition containing the resin (A) is applied to a display device (FPD: flat panel display) such as an organic electroluminescence display (organic EL display device) or a liquid crystal display device, the resin (A) ε (405) ) Is 0.02 L / (g · cm) or more, the absorption performance of visible light in the vicinity of 400 nm is good. Deterioration of the organic EL light emitting element due to visible light can be suppressed.
 樹脂(A)は、ε(405)/ε(440)の値が大きいほど400nm付近の波長の光を選択的に吸収することができる。ε(405)/ε(440)の値は5以上が好ましく、50以上がより好ましく、75以上がさらに好ましく、100以上が特に好ましい。
 樹脂(A)のε(405)/ε(440)が5以上であると、樹脂(A)を含有する粘着剤組成物を有機EL表示装置や液晶表示装置等の表示装置(FPD:フラットパネルディスプレイ)に適用した場合に、表示装置の色彩表現を阻害することなく、405nm付近の光を吸収し位相差フィルムや有機EL素子等の光劣化を抑制することができる。
The resin (A) can selectively absorb light having a wavelength near 400 nm as the value of ε (405) / ε (440) increases. The value of ε (405) / ε (440) is preferably 5 or more, more preferably 50 or more, further preferably 75 or more, and particularly preferably 100 or more.
When ε (405) / ε (440) of the resin (A) is 5 or more, the pressure-sensitive adhesive composition containing the resin (A) is displayed on a display device (FPD: flat panel) such as an organic EL display device or a liquid crystal display device. When applied to a display), it can absorb light in the vicinity of 405 nm and suppress photodeterioration of a retardation film, an organic EL element, or the like without disturbing the color expression of the display device.
 (粘着剤組成物に含まれるその他の成分)
 粘着剤組成物は、さらに、架橋剤(B)、シラン化合物(D)、帯電防止剤、光選択吸収剤、樹脂(A)以外の他の樹脂等を含んでいてもよい。
 樹脂(A)の含有量は、粘着剤組成物の固形分100質量%中、通常60質量%~99.99質量%であり、好ましくは70質量%~99.9質量%であり、より好ましくは80質量%~99.7質量%である。
(Other ingredients contained in the pressure-sensitive adhesive composition)
The pressure-sensitive adhesive composition may further contain a cross-linking agent (B), a silane compound (D), an antistatic agent, a light selective absorber, a resin other than the resin (A), and the like.
The content of the resin (A) is usually 60% by mass to 99.99% by mass, preferably 70% by mass to 99.9% by mass, more preferably 70% by mass, based on 100% by mass of the solid content of the pressure-sensitive adhesive composition. Is 80% by mass to 99.7% by mass.
 粘着剤組成物は、架橋剤(B)を含むことができる。
 架橋剤(B)としては、イソシアネート系架橋剤、エポキシ系架橋剤、アジリジン系架橋剤、金属キレート系架橋剤等が挙げられ、特に粘着剤組成物のポットライフおよび粘着剤層の耐久性、架橋速度などの観点から、イソシアネート系架橋剤であることが好ましい。
The pressure-sensitive adhesive composition can contain a cross-linking agent (B).
Examples of the cross-linking agent (B) include an isocyanate-based cross-linking agent, an epoxy-based cross-linking agent, an aziridine-based cross-linking agent, a metal chelate-based cross-linking agent, and the like. From the viewpoint of speed and the like, an isocyanate-based cross-linking agent is preferable.
 イソシアネート系化合物としては、分子内に少なくとも2個のイソシアナト基(-NCO)を有する化合物が好ましく、例えば、脂肪族イソシアネート系化合物(例えばヘキサメチレンジイソシアネートなど)、脂環族イソシアネート系化合物(例えばイソホロンジイソシアネート、水添ジフェニルメタンジイソシアネート、水添キシリレンジイソシアネート)、芳香族イソシアネート系化合物(例えばトリレンジイソシアネート、キシリレンジイソシアネートジフェニルメタンジイソシアネート、ナフタレンジイソシアネート、トリフェニルメタントリイソシアネート等)などが挙げられる。また架橋剤(B)は、前記イソシアネート化合物の多価アルコール化合物による付加体(アダクト体)[例えば、グリセロール、トリメチロールプロパンなどによる付加体]、イソシアヌレート化物、ビュレット型化合物、ポリエーテルポリオール、ポリエステルポリオール、アクリルポリオール、ポリブタジエンポリオール、ポリイソプレンポリオール等と付加反応させたウレタンプレポリマー型のイソシアネート化合物などの誘導体であってもよい。架橋剤(B)は単独または二種以上組み合わせて使用できる。これらのうち、代表的には芳香族イソシアネート系化合物(例えばトリレンジイソシアネート、キシリレンジイソシアネート)、脂肪族イソシアネート系化合物(例えばヘキサメチレンジイソシアネート)またはこれらの多価アルコール化合物(例えば、グリセロール、トリメチロールプロパン)による付加体、またはイソシアヌレート体が挙げられる。架橋剤(B)が、芳香族イソシアネート系化合物および/またはこれらの多価アルコール化合物、またはイソシアヌレート体による付加体であると、最適な架橋密度(または架橋構造)の形成に有利なためか、粘着剤層の耐久性を向上できる。特に、トリレンジイソシアネート系化合物および/またはこれらの多価アルコール化合物による付加体であると、例えば粘着剤層を偏光板に適用した場合等であっても耐久性を向上することができる。 As the isocyanate-based compound, a compound having at least two isocyanato groups (-NCO) in the molecule is preferable, and for example, an aliphatic isocyanate-based compound (for example, hexamethylene diisocyanate) and an alicyclic isocyanate-based compound (for example, isophorone diisocyanate) are preferable. , Hydrogenated diphenylmethane diisocyanate, hydrogenated xylylene diisocyanate), aromatic isocyanate-based compounds (for example, tolylene diisocyanate, xylylene diisocyanate diphenylmethane diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, etc.) and the like. The cross-linking agent (B) is an adduct (adduct) of the isocyanate compound made of a polyhydric alcohol compound [for example, an adduct made of glycerol, trimethylolpropane, etc.], an isocyanurate, a burette-type compound, a polyether polyol, or a polyester. It may be a derivative such as a urethane prepolymer type isocyanate compound which has been subjected to an addition reaction with a polyol, an acrylic polyol, a polybutadiene polyol, a polyisoprene polyol or the like. The cross-linking agent (B) can be used alone or in combination of two or more. Of these, typically aromatic isocyanate compounds (eg, tolylene diisocyanate, xylylene diisocyanate), aliphatic isocyanate compounds (eg, hexamethylene diisocyanate) or their polyhydric alcohol compounds (eg, glycerol, trimethylolpropane). ), Or isocyanurates. Is it because the cross-linking agent (B) is an adduct of an aromatic isocyanate compound and / or a polyhydric alcohol compound thereof, or an isocyanurate compound, which is advantageous for forming an optimum cross-linking density (or cross-linking structure)? The durability of the adhesive layer can be improved. In particular, an adduct made of a tolylene diisocyanate compound and / or a polyhydric alcohol compound thereof can improve durability even when, for example, an adhesive layer is applied to a polarizing plate.
 架橋剤(B)の含有量は、樹脂(A)100重量部に対して、通常0.01~15質量部であり、好ましくは0.05~10重量部であり、より好ましくは0.1~5重量部である。 The content of the cross-linking agent (B) is usually 0.01 to 15 parts by weight, preferably 0.05 to 10 parts by weight, and more preferably 0.1 parts by weight with respect to 100 parts by weight of the resin (A). ~ 5 parts by weight.
 粘着剤組成物は、さらにシラン化合物(D)を含有していてもよい。
 シラン化合物(D)としては、例えば、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリス(2-メトキシエトキシ)シラン、3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルトリエトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、3-グリシドキシプロピルエトキシジメチルシラン、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、3-クロロプロピルメチルジメトキシシラン、3-クロロプロピルトリメトキシシラン、3-メタクリロイルオキシプロピルトリメトキシシラン、3-メルカプトプロピルトリメトキシシラン等が挙げられる。
 シラン化合物(D)は、シリコーンオリゴマーであってもよい。シリコーンオリゴマーの具体例を、モノマー同士の組み合わせの形で表記すると次のとおりである。
The pressure-sensitive adhesive composition may further contain the silane compound (D).
Examples of the silane compound (D) include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, and 3 -Glysidoxypropylmethyldimethoxysilane, 3-glycidoxypropylethoxydimethylsilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, Examples thereof include 3-methacryloyloxypropyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane.
The silane compound (D) may be a silicone oligomer. Specific examples of the silicone oligomer are as follows in the form of a combination of the monomers.
 3-メルカプトプロピルトリメトキシシラン-テトラメトキシシランオリゴマー、3-メルカプトプロピルトリメトキシシラン-テトラエトキシシランオリゴマー、3-メルカプトプロピルトリエトキシシラン-テトラメトキシシランオリゴマー、3-メルカプトプロピルトリエトキシシラン-テトラエトキシシランオリゴマー等のメルカプトプロピル基含有オリゴマー;メルカプトメチルトリメトキシシラン-テトラメトキシシランオリゴマー、メルカプトメチルトリメトキシシラン-テトラエトキシシランオリゴマー、メルカプトメチルトリエトキシシラン-テトラメトキシシランオリゴマー、メルカプトメチルトリエトキシシラン-テトラエトキシシランオリゴマー等のメルカプトメチル基含有オリゴマー;3-グリジドキシプロピルトリメトキシシラン-テトラメトキシシランコポリマー、3-グリジドキシプロピルトリメトキシシラン-テトラエトキシシランコポリマー、3-グリジドキシプロピルトリエトキシシラン-テトラメトキシシランコポリマー、3-グリジドキシプロピルトリエトキシシラン-テトラエトキシシランコポリマー、3-グリジドキシプロピルメチルジメトキシシラン-テトラメトキシシランコポリマー、3-グリジドキシプロピルメチルジメトキシシラン-テトラエトキシシランコポリマー、3-グリジドキシプロピルメチルジエトキシシラン-テトラメトキシシランコポリマー、3-グリジドキシプロピルメチルジエトキシシラン-テトラエトキシシランコポリマー等の3-グリジドキシプロピル基含有のコポリマー;3-メタクリロイルオキシプロピルトリメトキシシラン-テトラメトキシシランオリゴマー、3-メタクリロイルオキシプロピルトリメトキシシラン-テトラエトキシシランオリゴマー、3-メタクリロイルオキシプロピルトリエトキシシラン-テトラメトキシシランオリゴマー、3-メタクリロイルオキシプロピルトリエトキシシラン-テトラエトキシシランオリゴマー、3-メタクリロイルオキシプロピルメチルジメトキシシラン-テトラメトキシシランオリゴマー、3-メタクリロイルオキシプロピルメチルジメトキシシラン-テトラエトキシシランオリゴマー、3-メタクリロイルオキシプロピルメチルジエトキシシラン-テトラメトキシシランオリゴマー、3-メタクリロイルオキシプロピルメチルジエトキシシラン-テトラエトキシシランオリゴマー等のメタクリロイルオキシプロピル基含有オリゴマー;3-アクリロイルオキシプロピルトリメトキシシラン-テトラメトキシシランオリゴマー、3-アクリロイルオキシプロピルトリメトキシシラン-テトラエトキシシランオリゴマー、3-アクリロイルオキシプロピルトリエトキシシラン-テトラメトキシシランオリゴマー、3-アクリロイルオキシプロピルトリエトキシシラン-テトラエトキシシランオリゴマー、3-アクリロイルオキシプロピルメチルジメトキシシラン-テトラメトキシシランオリゴマー、3-アクリロイルオキシプロピルメチルジメトキシシラン-テトラエトキシシランオリゴマー、3-アクリロイルオキシプロピルメチルジエトキシシラン-テトラメトキシシランオリゴマー、3-アクリロイルオキシプロピルメチルジエトキシシラン-テトラエトキシシランオリゴマー等のアクリロイルオキシプロピル基含有オリゴマー;ビニルトリメトキシシラン-テトラメトキシシランオリゴマー、ビニルトリメトキシシラン-テトラエトキシシランオリゴマー、ビニルトリエトキシシラン-テトラメトキシシランオリゴマー、ビニルトリエトキシシラン-テトラエトキシシランオリゴマー、ビニルメチルジメトキシシラン-テトラメトキシシランオリゴマー、ビニルメチルジメトキシシラン-テトラエトキシシランオリゴマー、ビニルメチルジエトキシシラン-テトラメトキシシランオリゴマー、ビニルメチルジエトキシシラン-テトラエトキシシランオリゴマー等のビニル基含有オリゴマー;3-アミノプロピルトリメトキシシラン-テトラメトキシシランコポリマー、3-アミノプロピルトリメトキシシラン-テトラエトキシシランコポリマー、3-アミノプロピルトリエトキシシラン-テトラメトキシシランコポリマー、3-アミノプロピルトリエトキシシラン-テトラエトキシシランコポリマー、3-アミノプロピルメチルジメトキシシラン-テトラメトキシシランコポリマー、3-アミノプロピルメチルジメトキシシラン-テトラエトキシシランコポリマー、3-アミノプロピルメチルジエトキシシラン-テトラメトキシシランコポリマー、3-アミノプロピルメチルジエトキシシラン-テトラエトキシシランコポリマー等のアミノ基含有のコポリマーなど。 3-Mercaptopropyltrimethoxysilane-tetramethoxysilane oligomer, 3-mercaptopropyltrimethoxysilane-tetraethoxysilane oligomer, 3-mercaptopropyltriethoxysilane-tetramethoxysilane oligomer, 3-mercaptopropyltriethoxysilane-tetraethoxysilane Mercaptopropyl group-containing oligomers such as oligomers; mercaptomethyltrimethoxysilane-tetramethoxysilane oligomer, mercaptomethyltrimethoxysilane-tetraethoxysilane oligomer, mercaptomethyltriethoxysilane-tetramethoxysilane oligomer, mercaptomethyltriethoxysilane-tetraethoxy Mercaptomethyl group-containing oligomers such as silane oligomers; 3-glycidoxypropyltrimethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropyltrimethoxysilane-tetraethoxysilane copolymer, 3-glycidoxypropyltriethoxysilane- Tetramethoxysilane copolymer, 3-Glydoxypropyltriethoxysilane-Tetraethoxysilane copolymer, 3-Glydoxypropylmethyldimethoxysilane-Tetramethoxysilane copolymer, 3-Glydoxypropylmethyldimethoxysilane-Tetraethoxysilane copolymer, 3-Glydoxypropyl group-containing copolymers such as 3-glycidoxypropylmethyldiethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropylmethyldiethoxysilane-tetraethoxysilane copolymer; 3-methacryloyloxypropyltri Methoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropyltrimethoxysilane-tetraethoxysilane oligomer, 3-methacryloyloxypropyltriethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropyltriethoxysilane-tetraethoxysilane oligomer, 3-methacryloyloxypropylmethyldimethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropylmethyldimethoxysilane-tetraethoxysilane oligomer, 3-methacryloyloxypropylmethyldiethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropylmethyldi Ethoxysilane-tetraethoxysilane oligomer And other methacryloyloxypropyl group-containing oligomers; 3-acryloyloxypropyltrimethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropyltrimethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropyltriethoxysilane-tetramethoxysilane oligomer. , 3-Acryloyloxypropyltriethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropylmethyldimethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropylmethyldimethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropylmethyldi Acryloyloxypropyl group-containing oligomers such as ethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropylmethyldiethoxysilane-tetraethoxysilane oligomer; vinyltrimethoxysilane-tetramethoxysilane oligomer, vinyltrimethoxysilane-tetraethoxysilane oligomer , Vinyl Triethoxysilane-Tetramethoxysilane oligomer, Vinyltriethoxysilane-Tetraethoxysilane oligomer, Vinylmethyldimethoxysilane-Tetramethoxysilane oligomer, Vinylmethyldimethoxysilane-Tetraethoxysilane oligomer, Vinylmethyldiethoxysilane-Tetramethoxysilane Vinyl group-containing oligomers such as oligomers and vinylmethyldiethoxysilane-tetraethoxysilane oligomers; 3-aminopropyltrimethoxysilane-tetramethoxysilane copolymer, 3-aminopropyltrimethoxysilane-tetraethoxysilane copolymer, 3-aminopropyltri Ethoxysilane-tetramethoxysilane copolymer, 3-aminopropyltriethoxysilane-tetraethoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetramethoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetraethoxysilane copolymer, 3-amino Amino group-containing copolymers such as propylmethyldiethoxysilane-tetramethoxysilane copolymer and 3-aminopropylmethyldiethoxysilane-tetraethoxysilane copolymer.
 シラン化合物(D)は、下記式(d1)で表されるシラン化合物であってもよい。
Figure JPOXMLDOC01-appb-C000022
(式中、Aは、炭素数1~20のアルカンジイル基または炭素数3~20の二価の脂環式炭化水素基を表し、該アルカンジイル基および該脂環式炭化水素基を構成する-CH-は、-O-または-CO-に置き換わっていてもよく、R41は、炭素数1~5のアルキル基を表し、R42、R43、R44、R45およびR46は、それぞれ独立して、炭素数1~5のアルキル基または炭素数1~5のアルコキシ基を表す。)
The silane compound (D) may be a silane compound represented by the following formula (d1).
Figure JPOXMLDOC01-appb-C000022
(In the formula, A represents an alkanediyl group having 1 to 20 carbon atoms or a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, and constitutes the alkanediyl group and the alicyclic hydrocarbon group. -CH 2- may be replaced with -O- or -CO-, R 41 represents an alkyl group having 1 to 5 carbon atoms, and R 42 , R 43 , R 44 , R 45 and R 46 are. , Each independently represents an alkyl group having 1 to 5 carbon atoms or an alkoxy group having 1 to 5 carbon atoms.)
 Aで表される炭素数1~20のアルカンジイル基としては、メチレン基、1,2-エタンジイル基、1,3-プロパンジイル基、1,4-ブタンジイル基、1,5-ペンタンジイル基、1,6-ヘキサンジイル基、1,7-ヘプタンジイル基、1,8-オクタンジイル基、1,9-ノナンジイル基、1,10-デカンジイル基、1,12-ドデカンジイル基、1,14-テトラデカンジイル基、1,16-ヘキサデカンジイル基、1,18-オクタデカンジイル基および1,20-イコサンジイル基が挙げられる。炭素数3~20の二価の脂環式炭化水素基としては、1,3-シクロペンタンジイル基および1,4-シクロヘキサンジイル基が挙げられる。該アルカンジイル基および該脂環式炭化水素基を構成する-CH-が-O-または-CO-に置き換わった基としては、-CHCH-O-CHCH-、-CHCH-O-CHCH-O-CHCH-、-CHCH-O-CHCH-O-CHCH-O-CHCH-、-CHCH-CO-O-CHCH-、-CHCH-O-CHCH-CO-O-CHCH-、-CHCHCHCH-O-CHCH-およびCHCHCHCH-O-CHCHCHCH-が挙げられる。 Examples of the alkanediyl group having 1 to 20 carbon atoms represented by A include a methylene group, a 1,2-ethanediyl group, a 1,3-propanediyl group, a 1,4-butandyl group, a 1,5-pentanediyl group and 1 , 6-Hexanediyl group, 1,7-heptandyl group, 1,8-octanediyl group, 1,9-nonandyl group, 1,10-decandyl group, 1,12-dodecandyl group, 1,14-tetradecandyl group , 1,16-Hexadecandyl group, 1,18-octadecandyl group and 1,20-icosandyl group. Examples of the divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms include a 1,3-cyclopentanediyl group and a 1,4-cyclohexanediyl group. As the group in which -CH 2- instead of -O- or -CO- constituting the alcandiyl group and the alicyclic hydrocarbon group is replaced with -CH 2 CH 2- O-CH 2 CH 2- , -CH 2 CH 2- O-CH 2 CH 2- O-CH 2 CH 2- , -CH 2 CH 2- O-CH 2 CH 2- O-CH 2 CH 2- O-CH 2 CH 2- , -CH 2 CH 2- CO-O-CH 2 CH 2- , -CH 2 CH 2- O-CH 2 CH 2- CO-O-CH 2 CH 2- , -CH 2 CH 2 CH 2 CH 2- O-CH 2 CH 2- and CH 2 CH 2 CH 2 CH 2- O-CH 2 CH 2 CH 2 CH 2- .
 R41~R45で表される炭素数1~5のアルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基およびペンチル基が挙げられ、R42~R45で表される炭素数1~5のアルコキシ基としては、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基、イソブトキシ基、tert-ブトキシ基およびペンチルオキシ基が挙げられる。 Examples of the alkyl group having 1 to 5 carbon atoms represented by R 41 to R 45 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group and a pentyl group. the 42-C 1-5 alkoxy group represented by R 45, a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, and a tert- butoxy and pentyloxy groups.
 式(d1)で表されるシラン化合物としては、例えば、(トリメトキシシリル)メタン、1,2-ビス(トリメトキシシリル)エタン、1,2-ビス(トリエトキシシリル)エタン、1,3-ビス(トリメトキシシリル)プロパン、1,3-ビス(トリエトキシシリル)プロパン、1,4-ビス(トリメトキシシリル)ブタン、1,4-ビス(トリエトキシシリル)ブタン、1,5-ビス(トリメトキシシリル)ペンタン、1,5-ビス(トリエトキシシリル)ペンタン、1,6-ビス(トリメトキシシリル)ヘキサン、1,6-ビス(トリエトキシシリル)ヘキサン、1,6-ビス(トリプロポキシシリル)ヘキサン、1,8-ビス(トリメトキシシリル)オクタン、1,8-ビス(トリエトキシシリル)オクタン、1,8-ビス(トリプロポキシシリル)オクタンなどのビス(トリC1-5アルコキシシリル)C1-10アルカン;ビス(ジメトキシメチルシリル)メタン、1,2-ビス(ジメトキシメチルシリル)エタン、1,2-ビス(ジメトキシエチルシリル)エタン、1,4-ビス(ジメトキシメチルシリル)ブタン、1,4-ビス(ジメトキシエチルシリル)ブタン、1,6-ビス(ジメトキシメチルシリル)ヘキサン、1,6-ビス(ジメトキシエチルシリル)ヘキサン、1,8-ビス(ジメトキシメチルシリル)オクタン、1,8-ビス(ジメトキシエチルシリル)オクタンなどのビス(ジC1-5アルコキシC1-5アルキルシリル)C1-10アルカン;1,6-ビス(メトキシジメチルシリル)ヘキサン、1,8-ビス(メトキシジメチルシリル)オクタンなどのビス(モノC1-5アルコキシ-ジC1-5アルキルシリル)C1-10アルカンなどが挙げられる。これらのうち、1,2-ビス(トリメトキシシリル)エタン、1,3-ビス(トリメトキシシリル)プロパン、1,4-ビス(トリメトキシシリル)ブタン、1,5-ビス(トリメトキシシリル)ペンタン、1,6-ビス(トリメトキシシリル)ヘキサン、1,8-ビス(トリメトキシシリル)オクタンなどのビス(トリC1-3アルコキシシリル)C1-10アルカンが好ましく、特に、1,6-ビス(トリメトキシシリル)ヘキサン、1,8-ビス(トリメトキシシリル)オクタンが好ましい。 Examples of the silane compound represented by the formula (d1) include (trimethoxysilyl) methane, 1,2-bis (trimethoxysilyl) ethane, 1,2-bis (triethoxysilyl) ethane, and 1,3-. Bis (trimethoxysilyl) propane, 1,3-bis (triethoxysilyl) propane, 1,4-bis (trimethoxysilyl) butane, 1,4-bis (triethoxysilyl) butane, 1,5-bis ( Trimethoxysilyl) pentane, 1,5-bis (triethoxysilyl) pentane, 1,6-bis (trimethoxysilyl) hexane, 1,6-bis (triethoxysilyl) hexane, 1,6-bis (tripropoxy) Bis (tri-C1-5 alkoxysilyl) such as silyl) hexane, 1,8-bis (trimethoxysilyl) octane, 1,8-bis (triethoxysilyl) octane, 1,8-bis (tripropoxysilyl) octane. C1-10 alkanes; bis (dimethoxymethylsilyl) methane, 1,2-bis (dimethoxymethylsilyl) ethane, 1,2-bis (dimethoxyethylsilyl) ethane, 1,4-bis (dimethoxymethylsilyl) butane, 1 , 4-bis (dimethoxyethylsilyl) butane, 1,6-bis (dimethoxymethylsilyl) hexane, 1,6-bis (dimethoxyethylsilyl) hexane, 1,8-bis (dimethoxymethylsilyl) octane, 1,8 -Bis (dimethoxyethylsilyl) octane and other bis (diC1-5 alkoxy C1-5 alkylsilyl) C1-10 alkanes; 1,6-bis (methoxydimethylsilyl) hexane, 1,8-bis (methoxydimethylsilyl) Examples thereof include bis (mono C1-5 alkoxy-di C1-5 alkylsilyl) C1-10 alkane such as octane. Of these, 1,2-bis (trimethoxysilyl) ethane, 1,3-bis (trimethoxysilyl) propane, 1,4-bis (trimethoxysilyl) butane, 1,5-bis (trimethoxysilyl) Bis (tri-C1-3 alkoxysilyl) C1-10 alkanes such as pentane, 1,6-bis (trimethoxysilyl) hexane, and 1,8-bis (trimethoxysilyl) octane are preferable, and 1,6-bis is particularly preferable. (Trimethoxysilyl) hexane and 1,8-bis (trimethoxysilyl) octane are preferable.
 シラン化合物(D)の含有量は、樹脂(A)100質量部に対して、通常0.01~10質量部であり、好ましくは0.03~5質量部であり、より好ましくは0.05~2質量部であり、さらに好ましくは0.1~1質量部である。 The content of the silane compound (D) is usually 0.01 to 10 parts by mass, preferably 0.03 to 5 parts by mass, and more preferably 0.05 with respect to 100 parts by mass of the resin (A). It is about 2 parts by mass, more preferably 0.1 to 1 part by mass.
 粘着剤組成物は、さらに帯電防止剤を含有していてもよい。
 帯電防止剤としては、界面活性剤、シロキサン化合物、導電性高分子、イオン性化合物等が挙げられ、イオン性化合物であることが好ましい。イオン性化合物としては、慣用のものが挙げられる。イオン性化合物を構成するカチオン成分としては、有機カチオン、無機カチオンなどが挙げられる。有機カチオンとしては、例えばピリジニウムカチオン、ピロリジニウムカチオン、ピペリジニウムカチオン、イミダゾリウムカチオン、アンモニウムカチオン、スルホニウムカチオン、ホスホニウムカチオンなどが挙げられる。無機カチオンとしては、例えばリチウムカチオン、カリウムカチオン、ナトリウムカチオン、セシウムカチオンなどのアルカリ金属カチオン、マグネシウムカチオン、カルシウムカチオンなどのアルカリ土類金属カチオンなどが挙げられる。特に(メタ)アクリル系樹脂との相溶性の観点からピリジニウムカチオン、イミダゾリウムカチオン、ピロリジニウムカチオン、リチウムカチオン、カリウムカチオンが好ましい。イオン性化合物を構成するアニオン成分としては、無機アニオンおよび有機アニオンのいずれでもよいが、帯電防止性能の点で、フッ素原子を含むアニオン成分が好ましい。フッ素原子を含むアニオン成分としては、例えばヘキサフルオロホスフェートアニオン(PF-)、ビス(トリフルオロメタンスルホニル)イミドアニオン[(CFSON-]、ビス(フルオロスルホニル)イミドアニオン[(FSON-]、テトラ(ペンタフルオロフェニル)ボレートアニオン[(CB-]などが挙げられる。これらのイオン性化合物は単独または二種以上組み合わせて使用できる。特に、ビス(トリフルオロメタンスルホニル)イミドアニオン[(CFSON-]、ビス(フルオロスルホニル)イミドアニオン[(FSON-]、テトラ(ペンタフルオロフェニル)ボレートアニオン[(CB-]が好ましい。
 粘着剤組成物から形成される光選択吸収性粘着剤層の帯電防止性能の経時安定性の点で、室温で固体であるイオン性化合物が好ましい。
The pressure-sensitive adhesive composition may further contain an antistatic agent.
Examples of the antistatic agent include a surfactant, a siloxane compound, a conductive polymer, an ionic compound and the like, and an ionic compound is preferable. Examples of the ionic compound include conventional ones. Examples of the cation component constituting the ionic compound include organic cations and inorganic cations. Examples of the organic cation include pyridinium cation, pyrrolidinium cation, piperidinium cation, imidazolium cation, ammonium cation, sulfonium cation, phosphonium cation and the like. Examples of the inorganic cation include alkali metal cations such as lithium cation, potassium cation, sodium cation and cesium cation, and alkaline earth metal cations such as magnesium cation and calcium cation. In particular, pyridinium cations, imidazolium cations, pyrrolidinium cations, lithium cations, and potassium cations are preferable from the viewpoint of compatibility with (meth) acrylic resins. The anion component constituting the ionic compound may be either an inorganic anion or an organic anion, but an anion component containing a fluorine atom is preferable from the viewpoint of antistatic performance. Examples of the anion component containing a fluorine atom include hexafluorophosphate anion (PF 6- ), bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-], and bis (fluorosulfonyl) imide anion [(FSO). 2 ) 2 N-], tetra (pentafluorophenyl) borate anion [(C 6 F 5 ) 4 B-] and the like. These ionic compounds can be used alone or in combination of two or more. In particular, bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-], bis (fluorosulfonyl) imide anion [(FSO 2 ) 2 N-], tetra (pentafluorophenyl) borate anion [(C) 6 F 5 ) 4 B-] is preferable.
An ionic compound that is solid at room temperature is preferable in terms of the stability over time of the antistatic performance of the light selective absorbing pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition.
 帯電防止剤の含有量は、樹脂(A)100質量部に対して、例えば、0.01~20質量部、好ましくは0.1~10質量部、さらに好ましくは1~7質量部である。 The content of the antistatic agent is, for example, 0.01 to 20 parts by mass, preferably 0.1 to 10 parts by mass, and more preferably 1 to 7 parts by mass with respect to 100 parts by mass of the resin (A).
 粘着剤組成物は、光選択吸収性重合体である樹脂(A)を含み、これに加えて光選択吸収剤を含まなくてもよく、または含んでいてもよい。粘着剤組成物は、光選択吸収剤を含まないことが好ましい。光選択吸収剤は、特定の波長の光を選択的に吸収するものであり、波長360nm~420nmに少なくとも1つの吸収極大を有する化合物を含むことが好ましく、380nm~410nmに吸収極大を有する化合物を含むことがより好ましい。光選択吸収剤を含む場合、光選択吸収剤の含有量は、全樹脂成分100質量部に対して0.1質量部以下であることが好ましい。光選択吸収剤の含有量と高温高湿下での偏光子の端部における色抜けの程度との間に相関があるので、色抜けを抑制する観点から光選択吸収剤の含有量は0.1質量部以下であることが好ましい。 The pressure-sensitive adhesive composition contains the resin (A) which is a light-selective absorbent polymer, and may or may not contain a light-selective absorbent. The pressure-sensitive adhesive composition preferably does not contain a light selective absorber. The light selective absorber selectively absorbs light having a specific wavelength, and preferably contains a compound having at least one absorption maximum at a wavelength of 360 nm to 420 nm, and preferably contains a compound having an absorption maximum at 380 nm to 410 nm. It is more preferable to include it. When the light selective absorber is contained, the content of the light selective absorber is preferably 0.1 part by mass or less with respect to 100 parts by mass of all the resin components. Since there is a correlation between the content of the light selective absorber and the degree of color loss at the ends of the polarizer under high temperature and high humidity, the content of the light selective absorber is 0 from the viewpoint of suppressing color loss. It is preferably 1 part by mass or less.
 光選択吸収剤としては特に限定されないが、例えばオキシベンゾフェノン系光選択吸収剤、ベンゾトリアゾール系光選択吸収剤、サリチル酸エステル系光選択吸収剤、ベンゾフェノン系光選択吸収剤、シアノアクリレート系光選択吸収剤、トリアジン系光選択吸収剤等の有機系光選択吸収剤が挙げられる。より具体的には、例えば5-クロロ-2-(3,5-ジ-sec-ブチル-2-ヒドロキシルフェニル)-2H-ベンゾトリアゾール、(2-2H-ベンゾトリアゾール-2-イル)-6-(直鎖及び側鎖ドデシル)-4-メチルフェノール、2-ヒドロキシ-4-ベンジルオキシベンゾフェノン、2,4-ベンジルオキシベンゾフェノン等が挙げられる。これらの有機系光選択吸収剤は1種類又は2種類以上を併用してもよい。 The photoselective absorber is not particularly limited, but for example, an oxybenzophenone-based photoselective absorber, a benzotriazole-based photoselective absorber, a salicylate ester-based photoselective absorber, a benzophenone-based photoselective absorber, and a cyanoacrylate-based light selective absorber. , Organic light selective absorbers such as triazine light selective absorbers. More specifically, for example, 5-chloro-2- (3,5-di-sec-butyl-2-hydroxylphenyl) -2H-benzotriazole, (2-2H-benzotriazole-2-yl) -6- (Linear and side chain dodecyl) -4-methylphenol, 2-hydroxy-4-benzyloxybenzophenone, 2,4-benzyloxybenzophenone and the like can be mentioned. These organic light selective absorbers may be used alone or in combination of two or more.
 光選択吸収剤は、市販品を用いてもよく、例えば、トリアジン系光選択吸収剤として、ケミプロ化成株式会社製の「Kemisorb 102」、株式会社ADEKA製の「アデカスタブ LA46」、「アデカスタブ LAF70」、BASFジャパン社製の「チヌビン109」、「チヌビン171」、「チヌビン234」、「チヌビン326」、「チヌビン327」、「チヌビン328」、「チヌビン928」、「チヌビン400」、「チヌビン460」、「チヌビン405」、「チヌビン477」等が挙げられる。ベンゾトリアゾール系光選択吸収剤としては、株式会社ADEKA製の「アデカスタブ LA31」および「アデカスタブ LA36」、住化ケムテックス株式会社製の「スミソーブ 200」、「スミソーブ 250」、「スミソーブ 300」、「スミソーブ 340」および「スミソーブ 350」、ケミプロ化成株式会社製の「Kemisorb 74」、「Kemisorb 79」および「Kemisorb 279」、BASF社製の「TINUVIN 99-2」、「TINUVIN 900」および「TINUVIN928」等が挙げられる。 As the light selective absorber, a commercially available product may be used. For example, as a triazine-based light selective absorber, "Kemisorb 102" manufactured by Chemipro Kasei Co., Ltd., "ADEKA STAB LA46", "ADEKA STAB LAF70" manufactured by ADEKA Corporation, etc. BASF Japan's "Chinubin 109", "Chinubin 171", "Chinubin 234", "Chinubin 326", "Chinubin 327", "Chinubin 328", "Chinubin 928", "Chinubin 400", "Chinubin 460", Examples thereof include "Chinubin 405" and "Chinubin 477". Benzotriazole-based photoselective absorbers include "ADEKA STAB LA31" and "ADEKA STAB LA36" manufactured by ADEKA Corporation, and "Sumisorb 200", "Sumisorb 250", "Sumisorb 300", and "Sumisorb 340" manufactured by Sumika Chemtex Co., Ltd. And "Sumisorb 350", "Kemisorb 74", "Kemisorb 79" and "Kemisorb 279" made by Chemipro Kasei Co., Ltd., "TINUVIN 99-2", "TINUVIN 900" and "TINUVIN 928" made by BASF, etc. Be done.
 光選択吸収剤は無機系光選択吸収剤であってもよい。無機系光選択吸収剤としては、酸化チタン、酸化亜鉛、酸化インジウム、酸化錫、タルク、カオリン、炭酸カルシウム、酸化チタン系複合酸化物、酸化亜鉛系複合酸化物、ITO(錫ドープ酸化インジウム)、ATO(アンチモンドープ酸化錫)等が挙げられる。酸化チタン系複合酸化物としては、例えばシリカ、アルミナをドープした酸化亜鉛等が挙げられる。これらの無機系光選択吸収剤は1種類または2種類以上併用して用いることができる。有機系光選択吸収剤と無機系光選択吸収剤とを併用してもかまわない。 The light selective absorber may be an inorganic light selective absorber. Examples of the inorganic light selective absorber include titanium oxide, zinc oxide, indium oxide, tin oxide, talc, kaolin, calcium carbonate, titanium oxide-based composite oxide, zinc oxide-based composite oxide, ITO (tin-doped indium oxide), and the like. ATO (antimonated tin oxide) and the like can be mentioned. Examples of the titanium oxide-based composite oxide include silica and zinc oxide doped with alumina. These inorganic light selective absorbers can be used alone or in combination of two or more. An organic light selective absorber and an inorganic light selective absorber may be used in combination.
 粘着剤組成物は、溶剤、架橋触媒、タッキファイヤー、可塑剤、軟化剤、顔料、防錆剤、無機フィラー、光散乱性微粒子等の添加剤を1種または2種以上含有することができる。 The pressure-sensitive adhesive composition can contain one or more additives such as a solvent, a cross-linking catalyst, a tack fire, a plasticizer, a softening agent, a pigment, a rust preventive, an inorganic filler, and light-scattering fine particles.
 [位相差層]
 本発明の光学積層体は、光選択吸収性粘着剤層の偏光子とは反対側に積層された位相差層をさらに含んでもよい。位相差層は1層または2層以上であってもよい。図2に示す光学積層体200は、第1位相差層30と第2位相差層31を含む。
[Phase difference layer]
The optical laminate of the present invention may further include a retardation layer laminated on the opposite side of the light selective absorbing pressure-sensitive adhesive layer to the polarizer. The retardation layer may be one layer or two or more layers. The optical laminate 200 shown in FIG. 2 includes a first retardation layer 30 and a second retardation layer 31.
 位相差層は、光学異方性を示す光学フィルムである。光学異方性を示す光学フィルムとしては、例えば、ポリビニルアルコール、ポリカーボネート、ポリエステル、ポリアリレート、ポリイミド、ポリオレフィン、ポリシクロオレフィン、ポリスチレン、ポリサルホン、ポリエーテルサルホン、ポリビニリデンフルオライド/ポリメチルメタクリレート、アセチルセルロース、エチレン-酢酸ビニル共重合体ケン化物、ポリ塩化ビニルなどからなる高分子フィルムを1.01~6倍程度に延伸することにより得られる延伸フィルムなどが挙げられる。延伸フィルムの中でも、アセチルセルロース、ポリエステル、ポリカーボネートフィルムやシクロオレフィン系樹脂フィルムを一軸延伸または二軸延伸した高分子フィルムであることが好ましい。また、位相差層は、重合性液晶化合物を基材に塗布・配向によって光学異方性を発現させた、重合性液晶化合物の硬化物からなる位相差層であってもよい。 The retardation layer is an optical film that exhibits optical anisotropy. Examples of the optical film exhibiting optical anisotropy include polyvinyl alcohol, polycarbonate, polyester, polyarylate, polyimide, polyolefin, polycycloolefin, polystyrene, polysulfone, polyether sulfone, polyvinylidene fluoride / polymethylmethacrylate, and acetyl. Examples thereof include a stretched film obtained by stretching a polymer film made of cellulose, an ethylene-vinyl acetate copolymer saponified product, polyvinyl chloride, etc. about 1.01 to 6 times. Among the stretched films, a polymer film obtained by uniaxially stretching or biaxially stretching an acetyl cellulose, polyester, polycarbonate film or cycloolefin resin film is preferable. Further, the retardation layer may be a retardation layer made of a cured product of the polymerizable liquid crystal compound, which exhibits optical anisotropy by coating and orienting the polymerizable liquid crystal compound on a base material.
 なお、本明細書において、位相差層は、ゼロレタデーションである位相差層を含み、一軸性位相差フィルム、低光弾性率位相差フィルム、広視野角位相差フィルムなどと称されるフィルムも含む。
 ゼロレタデーションである位相差層とは、正面レタデーションReと厚み方向のレタデーションRthとが、ともに-15~15nmであり、光学的に等方なフィルムをいう。
ゼロレタデーションフィルムとしては、セルロース系樹脂、ポリオレフィン系樹脂(鎖状ポリオレフィン系樹脂、ポリシクロオレフィン系樹脂など)またはポリエチレンテレフタレート系樹脂からなる樹脂フィルムが挙げられ、レタデーション値の制御が容易で、入手も容易であるという点で、セルロース系樹脂またはポリオレフィン系樹脂が好ましい。ゼロレタデーションフィルムは、保護フィルムとしても用いることができる。ゼロレタデーションフィルムとしては、富士フイルム(株)から販売されている“Z-TAC”(商品名)、コニカミノルタオプト(株)から販売されている“ゼロタック(登録商標)”、日本ゼオン(株)から販売されている“ZF-14”(商品名)などが挙げられる。
In the present specification, the retardation layer includes a retardation layer having zero retardation, and also includes a film called a uniaxial retardation film, a low photoelastic modulus retardation film, a wide viewing angle retardation film, and the like. ..
The zero retardation retardation layer is an optically isotropic film in which both the front retardation Re and the thickness direction retardation Rth are -15 to 15 nm.
Examples of the zero retardation film include a resin film made of a cellulose resin, a polyolefin resin (chain polyolefin resin, polycycloolefin resin, etc.) or a polyethylene terephthalate resin, and the retardation value can be easily controlled and can be obtained. A cellulose-based resin or a polyolefin-based resin is preferable because it is easy. The zero retardation film can also be used as a protective film. Zero retardation films include "Z-TAC" (trade name) sold by FUJIFILM Corporation, "Zero Tuck (registered trademark)" sold by Konica Minolta Opto Co., Ltd., and Zeon Corporation. Examples include "ZF-14" (trade name) sold by.
 本発明の光学積層体において、位相差層は、重合性液晶化合物の硬化物である位相差層が好ましい。
 重合性液晶化合物の硬化物である位相差層としては、第一の形態~第五の形態が挙げられる。
 第一の形態:棒状液晶化合物が支持基材に対して水平方向に配向した位相差層
 第二の形態:棒状液晶化合物が支持基材に対して垂直方向に配向した位相差層
 第三の形態:棒状液晶化合物が面内で螺旋状に配向の方向が変化している位相差層
 第四の形態:円盤状液晶化合物が傾斜配向している位相差層
 第五の形態:円盤状液晶化合物が支持基材に対して垂直方向に配向した二軸性の位相差層
 たとえば、有機エレクトロルミネッセンスディスプレイに用いられる光学フィルムとしては、第一の形態、第二の形態、第五の形態が好適に用いられる。またはこれらの形態の位相差層を積層させて用いてもよい。
In the optical laminate of the present invention, the retardation layer is preferably a retardation layer which is a cured product of a polymerizable liquid crystal compound.
Examples of the retardation layer, which is a cured product of the polymerizable liquid crystal compound, include the first form to the fifth form.
First form: a retardation layer in which the rod-shaped liquid crystal compound is oriented horizontally with respect to the supporting base material Second form: a retardation layer in which the rod-shaped liquid crystal compound is oriented in the direction perpendicular to the supporting base material Third form : A retardation layer in which the direction of orientation of the rod-shaped liquid crystal compound changes spirally in the plane Fourth form: A retardation layer in which the disk-shaped liquid crystal compound is obliquely oriented Fifth form: The disk-shaped liquid crystal compound Biaxial retardation layer oriented perpendicular to the supporting substrate For example, as an optical film used for an organic electroluminescence display, the first form, the second form, and the fifth form are preferably used. Be done. Alternatively, the retardation layers of these forms may be laminated and used.
 位相差層が、重合性液晶化合物の配向状態における重合体からなる層(以下、「光学異方性層」と称する場合がある)である場合、位相差層は逆波長分散性を有することが好ましい。逆波長分散性とは、短波長での液晶配向面内位相差値の方が長波長での液晶配向面内位相差値よりも小さくなる光学特性であり、好ましくは、位相差フィルムが下記式(7)および式(8)を満たすことである。なお、Re(λ)は波長λnmの光に対する面内位相差値を表す。
 Re(450)/Re(550)≦1   (7)
 1≦Re(630)/Re(550)   (8)
 本発明の光学積層体において、位相差層が第一の形態でかつ逆波長分散性を有する場合、表示装置での黒表示時の着色が低減するため好ましく、前記式(7)において0.82≦Re(450)/Re(550)≦0.93であればより好ましい。さらに120≦Re(550)≦150が好ましい。
When the retardation layer is a layer made of a polymer in the oriented state of the polymerizable liquid crystal compound (hereinafter, may be referred to as an “optical anisotropic layer”), the retardation layer may have anti-wavelength dispersibility. preferable. The inverse wavelength dispersibility is an optical characteristic in which the in-plane retardation value of the liquid crystal alignment at a short wavelength is smaller than the in-plane retardation value of the liquid crystal alignment at a long wavelength. (7) and equation (8) are satisfied. Re (λ) represents an in-plane retardation value with respect to light having a wavelength of λ nm.
Re (450) / Re (550) ≤ 1 (7)
1 ≦ Re (630) / Re (550) (8)
In the optical laminate of the present invention, when the retardation layer has the first form and anti-wavelength dispersibility, it is preferable because coloring at the time of black display on the display device is reduced, and 0.82 in the above formula (7). More preferably, ≤Re (450) / Re (550) ≤0.93. Further, 120 ≦ Re (550) ≦ 150 is preferable.
 位相差層の形成に用いられる重合性液晶化合物としては、液晶便覧(液晶便覧編集委員会編、丸善(株)平成12年10月30日発行)の「3.8.6 ネットワーク(完全架橋型)」、「6.5.1 液晶材料 b.重合性ネマチック液晶材料」に記載された化合物の中で重合性基を有する化合物、並びに、特開2010-31223号公報、特開2010-270108号公報、特開2011-6360号公報、特開2011-207765号公報、特開2011-162678号公報、特開2016-81035号公報、国際公開第2017/043438号及び特表2011-207765号公報に記載の重合性液晶化合物等が挙げられる。
 重合性液晶化合物の配向状態における重合体から位相差層を製造する方法は、例えば、特開2010-31223号公報に記載の方法等が挙げられる。
As a polymerizable liquid crystal compound used for forming a retardation layer, "3.8.6 network (completely crosslinked type)" of the Liquid Crystal Handbook (edited by the Liquid Crystal Handbook Editorial Committee, published on October 30, 2000 by Maruzen Co., Ltd.) ) ”,“ 6.5.1 Liquid crystal material b. Polymerizable nematic liquid crystal material ”, compounds having a polymerizable group, and JP-A-2010-31223, JP-A-2010-270108. In Japanese Patent Application Laid-Open No. 2011-6360, Japanese Patent Application Laid-Open No. 2011-207765, Japanese Patent Application Laid-Open No. 2011-162678, Japanese Patent Application Laid-Open No. 2016-81035, International Publication No. 2017/043438, and Japanese Patent Application Laid-Open No. 2011-207765. Examples thereof include the above-mentioned polymerizable liquid crystal compounds.
Examples of the method for producing the retardation layer from the polymer in the oriented state of the polymerizable liquid crystal compound include the methods described in JP-A-2010-31223.
 重合性液晶化合物を硬化してなる液晶硬化層である位相差層の厚みは、例えば0.1μm以上10μm以下であり、好ましくは0.5μm以上8μm以下であり、より好ましくは1μm以上6μm以下である。 The thickness of the retardation layer, which is a liquid crystal cured layer obtained by curing a polymerizable liquid crystal compound, is, for example, 0.1 μm or more and 10 μm or less, preferably 0.5 μm or more and 8 μm or less, and more preferably 1 μm or more and 6 μm or less. is there.
 液晶性化合物の塗布・配向によって光学異方性を発現させた位相差層や、無機層状化合物の塗布によって光学異方性を発現させた位相差層としては、温度補償型位相差フィルムと称されるフィルム、JX日鉱日石エネルギー(株)から販売されている“NHフィルム”(商品名;棒状液晶が傾斜配向したフィルム)、富士フイルム(株)から販売されている“WVフィルム”(商品名;円盤状液晶が傾斜配向したフィルム)、住友化学(株)から販売されている“VACフィルム”(商品名;完全二軸配向型のフィルム)、住友化学(株)から販売されている“new VACフィルム”(商品名;二軸配向型のフィルム)などが挙げられる。 A retardation layer that develops optical anisotropy by coating and orientation of a liquid crystal compound and a retardation layer that develops optical anisotropy by coating an inorganic layered compound are called temperature-compensated retardation films. Film, "NH film" (trade name; film with tilted rod-shaped liquid crystal) sold by JX Nikko Nisseki Energy Co., Ltd., "WV film" (trade name) sold by FUJIFILM Corporation. ; "VAC film" (trade name; completely biaxially oriented film) sold by Sumitomo Chemical Co., Ltd., "new" sold by Sumitomo Chemical Co., Ltd. VAC film "(trade name; biaxially oriented film) and the like can be mentioned.
 位相差層は、透過光に1/4波長分の位相差を付与するλ/4位相差層、透過光に1/2波長分の位相差を付与するλ/2位相差層、ポジティブAプレート、およびポジティブCプレートであることができる。図2に示す光学積層体200のように、第1位相差層30と第2位相差層31を含む場合、第1位相差層30と第2位相差層31の組合せとして、λ/2位相差層とλ/4位相差層の組合わせ、λ/4位相差層とポジティブC層の組合せ等が挙げられる。 The retardation layer is a λ / 4 retardation layer that imparts a phase difference of 1/4 wavelength to transmitted light, a λ / 2 retardation layer that imparts a phase difference of 1/2 wavelength to transmitted light, and a positive A plate. , And can be a positive C plate. When the first retardation layer 30 and the second retardation layer 31 are included as in the optical laminate 200 shown in FIG. 2, the combination of the first retardation layer 30 and the second retardation layer 31 is the λ / 2 position. Examples thereof include a combination of a retardation layer and a λ / 4 retardation layer, a combination of a λ / 4 retardation layer and a positive C layer, and the like.
 本発明の光学積層体は、λ/4位相差層を有する円偏光板として構成してもよい。円偏光板は、反射防止用偏光板として用いることができる。 The optical laminate of the present invention may be configured as a circularly polarizing plate having a λ / 4 retardation layer. The circular polarizing plate can be used as an antireflection polarizing plate.
 [貼合層]
 本発明の光学積層体は、2つの層を接合するための貼合層を含むことができる。貼合層としては、接着剤層、粘着剤層(以下、「第2粘着剤層」ともいう)等が挙げられる。図2に示す光学積層体200は、第1位相差層30と第2位相差層31との間に介在してこれらを接合する接着剤層33と、第2位相差層31の接着剤層33とは反対側の表面に積層された第2粘着剤層32とを含む。
[Lated layer]
The optical laminate of the present invention can include a laminating layer for joining the two layers. Examples of the bonding layer include an adhesive layer and a pressure-sensitive adhesive layer (hereinafter, also referred to as “second pressure-sensitive adhesive layer”). The optical laminate 200 shown in FIG. 2 has an adhesive layer 33 that is interposed between the first retardation layer 30 and the second retardation layer 31 and joins them, and an adhesive layer of the second retardation layer 31. It includes a second pressure-sensitive adhesive layer 32 laminated on the surface opposite to 33.
 接着剤層には、水系接着剤、活性エネルギー線硬化性接着剤、または熱硬化性接着剤等が用いられる。接着剤層の厚みは、例えば10nm以上20μm以下、好ましくは100nm以上10μm以下、より好ましくは500nm以上5μm以下である。 For the adhesive layer, a water-based adhesive, an active energy ray-curable adhesive, a thermosetting adhesive, or the like is used. The thickness of the adhesive layer is, for example, 10 nm or more and 20 μm or less, preferably 100 nm or more and 10 μm or less, and more preferably 500 nm or more and 5 μm or less.
 第2粘着剤層は、上記した光選択吸収性粘着剤層を形成する粘着剤組成物と同様の粘着剤組成物から構成されてもよいし、(メタ)アクリル系、ゴム系、ウレタン系、エステル系、シリコーン系、ポリビニルエーテル系のような樹脂を主成分とする粘着剤組成物(以下、「第2粘着剤組成物」ともいう)で構成されてもよい。第2粘着剤組成物としては、透明性、耐候性、耐熱性等に優れる(メタ)アクリル系樹脂をベースポリマーとする粘着剤組成物が好適である。第2粘着剤組成物は、活性エネルギー線硬化型、熱硬化型であってもよい。第2粘着剤層の厚みは、通常0.1μm以上150μm以下であり、例えば8μm以上60μm以下であり、薄型化の観点からは30μm以下であることが好ましく、20μm以下であることがより好ましい。 The second pressure-sensitive adhesive layer may be composed of the same pressure-sensitive adhesive composition as the pressure-sensitive adhesive composition forming the above-mentioned light-selective absorbing pressure-sensitive adhesive layer, and may be composed of (meth) acrylic-based, rubber-based, urethane-based, or the like. It may be composed of a pressure-sensitive adhesive composition (hereinafter, also referred to as “second pressure-sensitive adhesive composition”) containing a resin as a main component, such as an ester-based, a silicone-based, or a polyvinyl ether-based resin. As the second pressure-sensitive adhesive composition, a pressure-sensitive adhesive composition using a (meth) acrylic resin having excellent transparency, weather resistance, heat resistance and the like as a base polymer is suitable. The second pressure-sensitive adhesive composition may be an active energy ray-curable type or a thermosetting type. The thickness of the second pressure-sensitive adhesive layer is usually 0.1 μm or more and 150 μm or less, for example, 8 μm or more and 60 μm or less, preferably 30 μm or less, and more preferably 20 μm or less from the viewpoint of thinning.
 <光学積層体の製造方法>
 光学積層体100、200は、貼合層を介して積層体100を構成する層同士を貼合する工程を含む方法によって製造することができる。貼合層を介して層同士を貼合する場合には、密着性を高めるために、貼合面の一方または両方に対して、例えばコロナ処理等の表面活性化処理を施すことが好ましい。
<Manufacturing method of optical laminate>
The optical laminates 100 and 200 can be manufactured by a method including a step of laminating layers constituting the laminate 100 via a laminating layer. When the layers are bonded to each other via the bonding layer, it is preferable to perform a surface activation treatment such as a corona treatment on one or both of the bonding surfaces in order to improve the adhesion.
 <光学積層体>
 本発明の光学積層体は、平面状であり、その面積は例えば30mm×30mm~180mm×90mmである。
 本発明の光学積層体は長方形、正方形などの矩形であってもよいし、矩形を構成する辺の一部が切り欠かれた切欠き部を有する形状や、半円形状、面内に貫通孔を有する形状などの、いわゆる異形形状であってもよい。
 光学積層体を構成する偏光子の吸収軸は、光学積層体の外形が直線の辺を有する場合には、その辺に平行であってもよいし、直交していてもよいし、斜め、例えば45°の角度で交差していてもよい。
 光学積層体が位相差層を有し、この位相差層が面内に遅相軸を有する場合、この遅相軸と、光学積層体を構成する偏光子の吸収軸とは45°で交わっていてもよいし、15°で交わっていてもよいし、75°で交わっていてもよい。
<Optical laminate>
The optical laminate of the present invention has a planar shape, and its area is, for example, 30 mm × 30 mm to 180 mm × 90 mm.
The optical laminate of the present invention may be a rectangle such as a rectangle or a square, a shape having a notch portion in which a part of the side constituting the rectangle is cut out, a semicircular shape, or a through hole in the plane. It may be a so-called irregular shape such as a shape having.
When the outer shape of the optical laminate has a straight side, the absorption axis of the polarizer constituting the optical laminate may be parallel to the side, orthogonal to the side, or diagonally, for example. They may intersect at an angle of 45 °.
When the optical laminate has a retardation layer and the retardation layer has an in-plane slow-phase axis, the slow-phase axis and the absorption axis of the polarizer constituting the optical laminate intersect at 45 °. It may intersect at 15 °, or at 75 °.
 <画像表示装置>
 光学積層体100、200は、画像表示パネルの前面(視認側)に配置されて、画像表示装置の構成要素として用いることができる。円偏光板である光学積層体は、画像表示装置において反射防止機能を付与する反射防止用偏光板として用いることもできる。画像表示装置は特に限定されず、例えば有機エレクトロルミネッセンス(有機EL)表示装置、無機エレクトロルミネッセンス(無機EL)表示装置、液晶表示装置、電界発光表示装置等の画像表示装置が挙げられる。
<Image display device>
The optical laminates 100 and 200 are arranged on the front surface (visual side) of the image display panel and can be used as a component of the image display device. The optical laminate, which is a circularly polarizing plate, can also be used as an antireflection polarizing plate that imparts an antireflection function in an image display device. The image display device is not particularly limited, and examples thereof include an image display device such as an organic electroluminescence (organic EL) display device, an inorganic electroluminescence (inorganic EL) display device, a liquid crystal display device, and an electric field emission display device.
 以下、実施例を挙げて本発明をより詳細に説明するが、本発明はこれらに限定されるものではない。実施例および比較例中の「%」および「部」は、特記しない限り、「質量%」および「質量部」である。 Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited thereto. Unless otherwise specified, "%" and "parts" in Examples and Comparative Examples are "% by mass" and "parts by mass".
 [片面保護偏光板の作製]
 (偏光子の作製)
 厚み20μm、重合度2400、ケン化度99%以上のポリビニルアルコールフィルムを、熱ロール上で延伸倍率4.1倍に一軸延伸し、緊張状態を保ったまま、水100重量部あたりヨウ素0.05重量部およびヨウ化カリウム5重量部を含有する染色浴に28℃で60秒間浸漬した。
[Manufacturing of single-sided protective polarizing plate]
(Making a polarizer)
A polyvinyl alcohol film having a thickness of 20 μm, a degree of polymerization of 2400, and a degree of saponification of 99% or more was uniaxially stretched on a thermal roll at a stretching ratio of 4.1 times, and while maintaining a tense state, iodine was 0.05 per 100 parts by weight of water. It was immersed in a dyeing bath containing 5 parts by weight of potassium iodide and 5 parts by weight at 28 ° C. for 60 seconds.
 次いで、水100重量部あたりホウ酸5.5重量部およびヨウ化カリウム15重量部を含有するホウ酸水溶液1に、64℃で110秒間浸漬した。次いで、水100重量部あたりホウ酸5.5重量部およびヨウ化カリウム15重量部を含有するホウ酸水溶液2に、67℃で30秒間浸漬した。その後、10℃の純水を用いて水洗し、乾燥して、偏光子を得た。得られた偏光子の厚みは8μmであり、ホウ素含有量は4.3重量%であった。 Next, it was immersed in an aqueous boric acid solution 1 containing 5.5 parts by weight of boric acid and 15 parts by weight of potassium iodide per 100 parts by weight of water at 64 ° C. for 110 seconds. Then, it was immersed in boric acid aqueous solution 2 containing 5.5 parts by weight of boric acid and 15 parts by weight of potassium iodide per 100 parts by weight of water at 67 ° C. for 30 seconds. Then, it was washed with pure water at 10 ° C. and dried to obtain a polarizer. The thickness of the obtained polarizer was 8 μm, and the boron content was 4.3% by weight.
 (水系接着剤の調整)
 水100重量部に対し、カルボキシル基変性ポリビニルアルコール(株式会社クラレ、商品名「KL-318」)を3質量部溶解し、その水溶液に水溶性エポキシ樹脂であるポリアミドエポキシ系添加剤(田岡化学工業株式会社、商品名「スミレーズレジン(登録商標)650(30)、固形分濃度30重量%の水溶液)を1.5質量部添加して、水系接着剤を調製した。
(Adjustment of water-based adhesive)
In 100 parts by weight of water, 3 parts by mass of carboxyl group-modified polyvinyl alcohol (Kurare Co., Ltd., trade name "KL-318") is dissolved, and a polyamide epoxy additive (Taoka Chemical Industry Co., Ltd.), which is a water-soluble epoxy resin, is dissolved in the aqueous solution. A water-based adhesive was prepared by adding 1.5 parts by mass of a trade name "Smiley's Resin (registered trademark) 650 (30), an aqueous solution having a solid content concentration of 30% by weight).
 (保護フィルムAおよび剥離フィルムB)
 保護フィルムAとして、厚み25μmのノルボルネン系樹脂からなる延伸フィルムに、厚み3μmのハードコート層を形成したフィルム(日本製紙株式会社製、商品名「COP25ST-HC」)を用いた。
 剥離フィルムBとして、トリアセチルセルロースフィルム(富士フイルム株式会社製、「TD80UL」)を用いた。剥離フィルムの厚みは80μmであり、透湿度は502g/m・24hrであった。
(Protective film A and release film B)
As the protective film A, a film having a hard coat layer having a thickness of 3 μm formed on a stretched film made of a norbornene resin having a thickness of 25 μm (manufactured by Nippon Paper Industries, Ltd., trade name “COP25ST-HC”) was used.
As the release film B, a triacetyl cellulose film (manufactured by FUJIFILM Corporation, "TD80UL") was used. The thickness of the release film is 80 [mu] m, the moisture permeability was 502g / m 2 · 24hr.
 (片面保護偏光板の作製)
 作製した偏光子を連続的に搬送するとともに保護フィルムAのロールから保護フィルムAを連続的に巻出し、また、剥離フィルムBのロールから剥離フィルムBを連続で巻きだした。偏光子とコロナ処理した保護フィルムAとの間に水系接着剤を注入するとともに、偏光子と剥離フィルムBとの間に純水を注入し、貼合ロールに通して、保護フィルムA/水系接着剤/偏光子/純水/剥離フィルムBからなる積層フィルムを得た。積層フィルムを搬送し、乾燥炉で80℃、300秒の加熱処理を行うことにより、水系接着剤を乾燥させるとともに、偏光子と剥離フィルムBとの間に介在する純水を揮発除去して、剥離フィルム付片面保護偏光板を得た。剥離フィルム付片面保護偏光板から剥離フィルムBを剥離し、片面保護偏光板を得た。
(Manufacturing of single-sided protective polarizing plate)
The produced polarizer was continuously conveyed, the protective film A was continuously unwound from the roll of the protective film A, and the release film B was continuously unwound from the roll of the release film B. A water-based adhesive is injected between the polarizer and the corona-treated protective film A, and pure water is injected between the polarizer and the release film B, and the film is passed through a bonding roll to adhere the protective film A / water-based adhesive. A laminated film composed of an agent / polarizer / pure water / release film B was obtained. The laminated film is transported and heat-treated at 80 ° C. for 300 seconds in a drying furnace to dry the water-based adhesive and volatilize and remove the pure water interposed between the polarizer and the release film B. A single-sided protective polarizing plate with a release film was obtained. The release film B was peeled from the single-sided protective polarizing plate with a release film to obtain a single-sided protective polarizing plate.
 [位相差積層体の作製]
 (第1液晶硬化層)
 第1液晶硬化層(第1位相差層)として、ネマチック液晶化合物が硬化した層と、配向膜と、透明基材とからなるλ/4の位相差を与える層を用いた。なお、ネマチック液晶化合物が硬化した層、配向層の合計の厚みは2μmであった。
[Manufacturing of retardation laminate]
(First liquid crystal cured layer)
As the first liquid crystal cured layer (first retardation layer), a layer formed by curing a nematic liquid crystal compound, an alignment film, and a transparent substrate, which gives a phase difference of λ / 4, was used. The total thickness of the cured layer and the oriented layer of the nematic liquid crystal compound was 2 μm.
 (第2液晶硬化層の作製)
 配向層形成用の組成物として、ポリエチレングリコールジ(メタ)アクリレート(新中村化学工業株式会社製、A-600)10.0質量部と、トリメチロールプロパントリアクリレート(新中村化学工業株式会社製、A-TMPT)10.0質量部と、1,6-ヘキサンジオールジ(メタ)アクリレート(新中村化学工業株式会社製、A-HD-N)10.0質量部と、光重合開始剤としてイルガキュア907(BASF社製、Irg-907)1.50質量部とを、溶媒メチルエチルケトン70.0質量部中で溶解させ、配向層形成用塗工液を調整した。
(Preparation of second liquid crystal cured layer)
As a composition for forming an oriented layer, 10.0 parts by mass of polyethylene glycol di (meth) acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., A-600) and trimethylolpropan triacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) 10.0 parts by mass of A-TMPT) and 10.0 parts by mass of 1,6-hexanediol di (meth) acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-HD-N), and Irgacure as a photopolymerization initiator. 1.50 parts by mass of 907 (Irg-907, manufactured by BASF) was dissolved in 70.0 parts by mass of the solvent methyl ethyl ketone to prepare a coating liquid for forming an orientation layer.
 基材フィルムとして厚み20μmの長尺状の環状オレフィン系樹脂(COP)フィルム(日本ゼオン株式会社製)を準備し、基材フィルムの片面に、配向層形成用塗工液をバーコーターにて塗布した。 A long cyclic olefin resin (COP) film (manufactured by Nippon Zeon Corporation) with a thickness of 20 μm is prepared as a base film, and a coating liquid for forming an alignment layer is applied to one side of the base film with a bar coater. did.
 塗工後の塗布層に温度80℃で60秒間の熱処理を施した後、紫外線(UVB)を220mJ/cm照射し、配向層形成用の組成物を重合し、硬化させて、基材フィルム上に厚み2.3μmの配向層を形成した。 After the coating layer after coating is heat-treated at a temperature of 80 ° C. for 60 seconds, it is irradiated with ultraviolet rays (UVB) at 220 mJ / cm 2 to polymerize and cure the composition for forming an orientation layer to form a base film. An oriented layer having a thickness of 2.3 μm was formed on the top.
 位相差層形成用の組成物として、光重合性ネマチック液晶化合物(メルク社製、RMM28B)20.0質量部と、光重合開始剤としてイルガキュア907(BASF社製、Irg-907)1.0質量部とを、溶媒プロピレングリコールモノメチルエーテルアセテート80.0質量部中に溶解させ、位相差層形成用塗工液を調整した。 20.0 parts by mass of a photopolymerizable nematic liquid crystal compound (RMM28B, manufactured by Merck) as a composition for forming a retardation layer, and 1.0 mass by Irgacure 907 (Irg-907, manufactured by BASF) as a photopolymerization initiator. The parts were dissolved in 80.0 parts by mass of the solvent propylene glycol monomethyl ether acetate to prepare a coating liquid for forming a retardation layer.
 先に得られた配向層上に位相差層形成用塗工液を塗布し、塗布層に温度80℃で60秒間の熱処理を施した。その後、紫外線(UVB)を220mJ/cm照射し、位相差層形成用の組成物を重合し、硬化させて、配向層上に厚み0.7μmの位相差層を形成した。この様にして基材フィルム上に配向層と位相差層とからなる厚み3μmの第2液晶硬化層(第2位相差層)を得た。 A coating liquid for forming a retardation layer was applied onto the previously obtained alignment layer, and the coating layer was heat-treated at a temperature of 80 ° C. for 60 seconds. Then, it was irradiated with ultraviolet rays (UVB) at 220 mJ / cm 2 to polymerize and cure the composition for forming a retardation layer to form a retardation layer having a thickness of 0.7 μm on the alignment layer. In this way, a second liquid crystal cured layer (second retardation layer) having a thickness of 3 μm composed of an alignment layer and a retardation layer was obtained on the base film.
 (位相差積層体の作製)
 第1液晶層と第2液晶層とを、紫外線硬化型接着剤(厚み1μm)により、それぞれの液晶層面(基材フィルムとは反対側の面)が貼合面となるように貼り合わせた。次いで、紫外線を照射して紫外線硬化型接着剤を硬化させて、第1液晶硬化層と第2液晶硬化層の2層の位相差層を含む位相差積層体を作製した。第1液晶硬化層と、紫外線硬化型接着剤層と、第2液晶硬化層を含む位相差積層体の厚みは6μmであった。
(Manufacturing of retardation laminate)
The first liquid crystal layer and the second liquid crystal layer were bonded to each other with an ultraviolet curable adhesive (thickness 1 μm) so that the respective liquid crystal layer surfaces (the surface opposite to the base film) were bonded surfaces. Next, the ultraviolet curable adhesive was cured by irradiating with ultraviolet rays to prepare a retardation laminate including two retardation layers, a first liquid crystal curing layer and a second liquid crystal curing layer. The thickness of the retardation laminate including the first liquid crystal cured layer, the ultraviolet curable adhesive layer, and the second liquid crystal cured layer was 6 μm.
 [光選択吸収性粘着剤層の作製]
 <実施例1の光学積層体に用いられる粘着剤層(1)>
 (光選択吸収性モノマーの合成)
 ジムロート冷却管及び温度計を設置した300mL-四ツ口フラスコ内を窒素雰囲気とし、2-ヒドロキシエチルアクリレート10部、シアノ酢酸8.1部、N,N―ジメチル―4―アミノピリジン1.1部、ジブチルヒドロキシトルエン0.95部、トルエン50部を仕込み、マグネチックスターラーで攪拌した。氷浴で冷却し内温10℃になったことを確認したのち、N,N―ジイソプロピルカルボジイミド12部を1時間かけて滴下し、滴下終了後に内温0~10℃にてさらに2時間保温した。その後、不溶成分を減圧濾過で取り除き、UVA-M-02で表される化合物を含む濾液70部を得た。
Figure JPOXMLDOC01-appb-C000023
[Preparation of light-selective absorbent adhesive layer]
<Adhesive layer (1) used for the optical laminate of Example 1>
(Synthesis of light selective absorption monomer)
The inside of a 300 mL-four-necked flask equipped with a Dimroth condenser and a thermometer is set to a nitrogen atmosphere, and 10 parts of 2-hydroxyethyl acrylate, 8.1 parts of cyanoacetic acid, and 1.1 parts of N, N-dimethyl-4-aminopyridine are used. , 0.95 part of dibutylhydroxytoluene and 50 parts of toluene were charged and stirred with a magnetic stirrer. After cooling in an ice bath and confirming that the internal temperature reached 10 ° C., 12 parts of N, N-diisopropylcarbodiimide was added dropwise over 1 hour, and after the addition was completed, the internal temperature was kept at 0 to 10 ° C. for another 2 hours. .. Then, the insoluble component was removed by filtration under reduced pressure to obtain 70 parts of a filtrate containing a compound represented by UVA-M-02.
Figure JPOXMLDOC01-appb-C000023
 ジムロート冷却管及び温度計を設置した300mL-四ツ口フラスコ内を窒素雰囲気とし、特開2014-194508号公報を参考に合成したUVA-M-01で表される化合物20部、無水酢酸7.1部、UVA-M-02を含む濾液70部及びアセトニトリル40部を仕込み、マグネチックスターラーで攪拌した。内温25℃にて、得られた混合物にN,N-ジイソプロピルエチルアミン9部を1時間かけて滴下した。得られた混合物を内温25℃にて2時間保温した。得られた混合物に氷水200gを加えて撹拌し、析出した組成生物を減圧濾過にて取り出した。得られた粗生成物をイソプロパノールで再結晶してUVA-01で表される化合物10部を得た。得られたUVA-01で表される化合物を、LC-MSとH-NMRより同定した。
Figure JPOXMLDOC01-appb-C000024
2. 20 parts of the compound represented by UVA-M-01 synthesized with reference to JP-A-2014-194508, with the inside of a 300 mL-four-necked flask equipped with a Dimroth condenser and a thermometer as a nitrogen atmosphere, acetic anhydride 7. 1 part, 70 parts of a flask containing UVA-M-02 and 40 parts of acetonitrile were charged and stirred with a magnetic stirrer. At an internal temperature of 25 ° C., 9 parts of N, N-diisopropylethylamine was added dropwise to the obtained mixture over 1 hour. The obtained mixture was kept warm at an internal temperature of 25 ° C. for 2 hours. 200 g of ice water was added to the obtained mixture, and the mixture was stirred, and the precipitated composition organisms were taken out by vacuum filtration. The obtained crude product was recrystallized from isopropanol to obtain 10 parts of the compound represented by UVA-01. The obtained compound represented by UVA-01 was identified by LC-MS and 1 H-NMR.
Figure JPOXMLDOC01-appb-C000024
 (光選択吸収性重合体(A-1)の調整)
 冷却管、窒素導入管、温度計および攪拌機を備えた反応容器に、アクリル酸ブチル(表1において「BA」とする。)96質量部、アクリル酸2-ヒドロキシエチル(表1において「HEA」とする。)3質量部、およびUVA-01で表される光選択吸収性モノマー1質量部(固形分合計100質量部)と、溶媒としての酢酸エチル135質量部と、を混合し、窒素ガスで装置内の空気を置換して酸素不含としながら内温を60℃に上げた。
得られた混合物に、アゾビスイソブチロニトリル(重合開始剤)0.4部を酢酸エチル10部に溶かした溶液を全量添加した。得られた混合物を60℃で1時間保持し、次いで内温を50~70℃に保ちながら酢酸エチルを添加速度17.3部/hrで反応容器内へ連続的に加え、アクリル樹脂の濃度が35%となった時点で酢酸エチルの添加を止め、さらに酢酸エチルの添加開始から12時間経過するまで内温を50~70℃で保温した。得られた光選択吸収性重合体(A-1)の混合物に酢酸エチルを加えて樹脂成分の濃度が20%となるように調節し、光選択吸収性重合体(A-1)の酢酸エチル溶液を調製した。光選択吸収性重合体(A-1)は、GPCによるポリスチレン換算の重量平均分子量Mwが50万、Mw/Mnが7.5であった。DSCによるガラス転移温度は-48.4℃であった。
(Adjustment of light selective absorption polymer (A-1))
In a reaction vessel equipped with a cooling tube, a nitrogen introduction tube, a thermometer and a stirrer, 96 parts by mass of butyl acrylate (referred to as "BA" in Table 1) and 2-hydroxyethyl acrylate (referred to as "HEA" in Table 1). ) 3 parts by mass, 1 part by mass of the light selective absorption monomer represented by UVA-01 (total solid content 100 parts by mass), and 135 parts by mass of ethyl acetate as a container are mixed and mixed with nitrogen gas. The internal temperature was raised to 60 ° C. while replacing the air in the apparatus to make it oxygen-free.
To the obtained mixture, a total amount of a solution prepared by dissolving 0.4 part of azobisisobutyronitrile (polymerization initiator) in 10 parts of ethyl acetate was added. The obtained mixture was held at 60 ° C. for 1 hour, and then ethyl acetate was continuously added into the reaction vessel at an addition rate of 17.3 parts / hr while maintaining the internal temperature at 50 to 70 ° C. to increase the concentration of the acrylic resin. When the concentration reached 35%, the addition of ethyl acetate was stopped, and the internal temperature was kept at 50 to 70 ° C. until 12 hours had passed from the start of the addition of ethyl acetate. Ethyl acetate was added to the obtained mixture of the photoselective absorbent polymer (A-1) to adjust the concentration of the resin component to 20%, and the ethyl acetate of the photoselective absorbent polymer (A-1) was adjusted. The solution was prepared. The photoselective absorbent polymer (A-1) had a polystyrene-equivalent weight average molecular weight Mw of 500,000 and Mw / Mn of 7.5 by GPC. The glass transition temperature by DSC was −48.4 ° C.
 (粘着剤組成物及び粘着剤層の作製)
 (a)粘着剤組成物の調製
 光選択吸収性重合体(A-1)の酢酸エチル溶液(樹脂濃度:20%)に、該溶液の固形分100部に対して、架橋剤(コロネートL、固形分75%:東ソー製)0.5部およびシラン化合物(信越化学工業製:KBM-403)0.5部を混合し、さらに固形分濃度が14%となるように2-ブタノンを添加して粘着剤組成物(1)を得た。なお、上記架橋剤(コロネートL)の配合量は、有効成分としての質量部数である。
(Preparation of Adhesive Composition and Adhesive Layer)
(A) Preparation of Adhesive Composition A cross-linking agent (Coronate L,) was added to an ethyl acetate solution (resin concentration: 20%) of the photoselective absorbent polymer (A-1) with respect to 100 parts of the solid content of the solution. Mix 0.5 parts of solid content 75% (manufactured by Toso) and 0.5 part of silane compound (manufactured by Shinetsu Chemical Industry: KBM-403), and add 2-butanone so that the solid content concentration becomes 14%. The pressure-sensitive adhesive composition (1) was obtained. The blending amount of the cross-linking agent (Coronate L) is the number of parts by mass as the active ingredient.
 (b)粘着剤層の作製
 離型処理が施されたポリエチレンテレフタレートフィルム(リンテック社製SP-PLR382050、以下、「セパレーター」と略記する)の離型処理面に、上記(a)で調製した粘着剤組成物を、乾燥後の粘着剤層の厚みが5μmとなるようにアプリケーターを用いて塗布し、100℃で1分間乾燥させて粘着剤層を作製した。得られた粘着剤層を粘着剤層(1)とした。
(B) Preparation of Adhesive Layer Adhesive prepared in (a) above on the release-treated surface of a polyethylene terephthalate film (SP-PLR382050 manufactured by Lintec Corporation, hereinafter abbreviated as "separator") that has been subjected to a release treatment. The agent composition was applied using an applicator so that the thickness of the pressure-sensitive adhesive layer after drying was 5 μm, and dried at 100 ° C. for 1 minute to prepare a pressure-sensitive adhesive layer. The obtained pressure-sensitive adhesive layer was designated as a pressure-sensitive adhesive layer (1).
 <実施例2の光学積層体に用いられる粘着剤層(2)>
 光選択吸収性重合体(A-2)を用いて、実施例1の粘着剤層(1)と同様にして粘着剤層(2)を作製した。光選択吸収性重合体(A-2)は、光選択吸収性重合体(A-1)の調製において、BAを95質量部、UVA-01で表される光選択吸収性モノマーの配合量を2質量部とした点のみ異なる。光選択吸収性重合体(A-2)は、GPCによるポリスチレン換算の重量平均分子量Mwが50万、Mw/Mnが6.3であった。
<Adhesive layer (2) used for the optical laminate of Example 2>
Using the photoselective absorbent polymer (A-2), the pressure-sensitive adhesive layer (2) was prepared in the same manner as the pressure-sensitive adhesive layer (1) of Example 1. The photoselective absorbent polymer (A-2) contains 95 parts by mass of BA and the amount of the photoselective absorbent monomer represented by UVA-01 in the preparation of the photoselective absorbent polymer (A-1). The only difference is that it is 2 parts by mass. The photoselective absorbent polymer (A-2) had a polystyrene-equivalent weight average molecular weight Mw of 500,000 and Mw / Mn of 6.3 according to GPC.
 <実施例3の光学積層体に用いられる粘着剤層(3)>
 光選択吸収性重合体(A-3)を用いて、実施例1の粘着剤層(1)と同様にして粘着剤層(3)を作製した。光選択吸収性重合体(A-3)は、光選択吸収性重合体(A-1)の調製において、BAを93質量部、UVA-01で表される光選択吸収性モノマーの配合量を4質量部とした点のみ異なる。光選択吸収性重合体(A-3)は、GPCによるポリスチレン換算の重量平均分子量Mwが60万、Mw/Mnが7.0であった。
<Adhesive layer (3) used for the optical laminate of Example 3>
Using the photoselective absorbent polymer (A-3), the pressure-sensitive adhesive layer (3) was prepared in the same manner as the pressure-sensitive adhesive layer (1) of Example 1. The photoselective absorbent polymer (A-3) contains 93 parts by mass of BA and the amount of the photoselective absorbent monomer represented by UVA-01 in the preparation of the photoselective absorbent polymer (A-1). The only difference is that it is 4 parts by mass. The photoselective absorbent polymer (A-3) had a polystyrene-equivalent weight average molecular weight Mw of 600,000 and Mw / Mn of 7.0 according to GPC.
 <比較例1の光学積層体に用いられる粘着剤層(4)>
 (アクリル樹脂(A-4)の調整)
 冷却管、窒素導入管、温度計および攪拌機を備えた反応容器に、アクリル酸ブチル61.9部およびアクリル酸2-ヒドロキシエチル1.9部と、溶媒としての酢酸エチル86.4部と、の混合溶液を仕込み、窒素ガスで装置内の空気を置換して酸素不含としながら内温を60℃に上げた。その後、アゾビスイソブチロニトリル(重合開始剤)0.4部を酢酸エチル10部に溶かした溶液を全量添加した。得られた混合物を60℃で1時間保持し、次いで内温を50~70℃に保ちながら酢酸エチルを添加速度17.3部/hrで反応容器内へ連続的に加え、アクリル樹脂の濃度が35%となった時点で酢酸エチルの添加を止め、さらに酢酸エチルの添加開始から12時間経過するまでこの温度で保温した。最後に酢酸エチルを加えてアクリル樹脂の濃度が20%となるように調節し、アクリル樹脂の酢酸エチル溶液を調製した。得られたアクリル樹脂は、GPCによるポリスチレン換算の重量平均分子量Mwが60万、Mw/Mnが7.0であった。これをアクリル樹脂(A-4)とする。DSCによるガラス転移温度は-52.9℃であった。
<Adhesive layer (4) used in the optical laminate of Comparative Example 1>
(Adjustment of acrylic resin (A-4))
In a reaction vessel equipped with a cooling tube, a nitrogen introduction tube, a thermometer and a stirrer, 61.9 parts of butyl acrylate and 1.9 parts of 2-hydroxyethyl acrylate and 86.4 parts of ethyl acetate as a solvent were added. The mixed solution was charged, and the internal temperature was raised to 60 ° C. while replacing the air in the apparatus with nitrogen gas to make it oxygen-free. Then, a total amount of a solution prepared by dissolving 0.4 part of azobisisobutyronitrile (polymerization initiator) in 10 parts of ethyl acetate was added. The obtained mixture was held at 60 ° C. for 1 hour, and then ethyl acetate was continuously added into the reaction vessel at an addition rate of 17.3 parts / hr while maintaining the internal temperature at 50 to 70 ° C. to increase the concentration of the acrylic resin. When the concentration reached 35%, the addition of ethyl acetate was stopped, and the temperature was kept at this temperature until 12 hours had passed from the start of the addition of ethyl acetate. Finally, ethyl acetate was added to adjust the concentration of the acrylic resin to 20%, and an ethyl acetate solution of the acrylic resin was prepared. The obtained acrylic resin had a polystyrene-equivalent weight average molecular weight Mw of 600,000 and Mw / Mn of 7.0 by GPC. This is referred to as acrylic resin (A-4). The glass transition temperature by DSC was −52.9 ° C.
 (粘着剤組成物及び粘着剤層の作製)
 (a)粘着剤組成物の調製
 アクリル樹脂(A-4)の酢酸エチル溶液(樹脂濃度:20%)に、該溶液の固形分100部に対して、架橋剤(コロネートL、固形分75%:東ソー製)0.5部、シラン化合物(信越化学工業製:KBM-403)0.5部および特開2019-007001号公報の段落[0142]に記載の合成例2に光選択吸収化合物(2)として記載されている下記式(aa2)で表される化合物(光選択吸収剤)2.5部を混合し、さらに固形分濃度が14%となるように2-ブタノンを添加し、粘着剤組成物(4)を得た。なお、上記架橋剤(コロネートL)の配合量は、有効成分としての質量部数である。
Figure JPOXMLDOC01-appb-C000025
(Preparation of Adhesive Composition and Adhesive Layer)
(A) Preparation of Adhesive Composition In an ethyl acetate solution (resin concentration: 20%) of acrylic resin (A-4), a cross-linking agent (coronate L, solid content 75%) was added to 100 parts of the solid content of the solution. : 0.5 parts of Toso Co., Ltd., 0.5 parts of silane compound (manufactured by Shinetsu Chemical Industry Co., Ltd .: KBM-403) and the light selective absorption compound (Synthesis Example 2) described in paragraph [0142] of JP-A-2019-007001 2.5 parts of the compound (photoselective absorber) represented by the following formula (aa2) described as 2) is mixed, and 2-butanone is further added so that the solid content concentration becomes 14%, and the adhesive is adhered. The agent composition (4) was obtained. The blending amount of the cross-linking agent (Coronate L) is the number of parts by mass as the active ingredient.
Figure JPOXMLDOC01-appb-C000025
 (b)粘着剤層の作製
 実施例1と同様の方法によって、粘着剤組成物から粘着剤層(4)を作製した。
(B) Preparation of Adhesive Layer A pressure-sensitive adhesive layer (4) was prepared from the pressure-sensitive adhesive composition by the same method as in Example 1.
 <比較例2の光学積層体に用いられる粘着剤層(5)>
 粘着剤組成物の調整において、光選択吸収剤の配合量を3.7部とした以外は粘着剤層(4)の作製と同様の方法によって、粘着剤層(5)を作製した。
<Adhesive layer (5) used in the optical laminate of Comparative Example 2>
In the preparation of the pressure-sensitive adhesive composition, the pressure-sensitive adhesive layer (5) was prepared by the same method as the preparation of the pressure-sensitive adhesive layer (4) except that the blending amount of the light selective absorber was 3.7 parts.
 <比較例3の光学積層体に用いられる粘着剤層(6)>
 粘着剤組成物の調整において、光選択吸収剤の配合量を2.5部とし、粘着剤層の厚みを17μmとした以外は粘着剤層(4)の作製と同様の方法によって、粘着剤層(6)を作製した。
<Adhesive layer (6) used in the optical laminate of Comparative Example 3>
In the preparation of the pressure-sensitive adhesive composition, the pressure-sensitive adhesive layer was prepared by the same method as in the preparation of the pressure-sensitive adhesive layer (4) except that the blending amount of the light selective absorber was 2.5 parts and the thickness of the pressure-sensitive adhesive layer was 17 μm. (6) was prepared.
 [第2粘着剤層の作製]
 上記アクリル樹脂(A-4)の酢酸エチル溶液(樹脂濃度:20%)に、架橋剤(コロネートL、固形分75%:東ソー製)0.5部およびシラン化合物(信越化学工業製:KBM-403)0.5部を混合し、さらに固形分濃度が14%となるように2-ブタノンを添加して粘着剤組成物(7)を得た。なお、上記架橋剤(コロネートL)の配合量は、有効成分としての質量部数である。
[Preparation of second adhesive layer]
In an ethyl acetate solution (resin concentration: 20%) of the above acrylic resin (A-4), 0.5 part of a cross-linking agent (coronate L, solid content 75%: manufactured by Tosoh) and a silane compound (manufactured by Shin-Etsu Chemical Industry: KBM-) 403) 0.5 parts were mixed, and 2-butanone was further added so that the solid content concentration became 14% to obtain a pressure-sensitive adhesive composition (7). The blending amount of the above-mentioned cross-linking agent (Coronate L) is the number of parts by mass as an active ingredient.
 光選択吸収性粘着剤層の作製に用いたセパレーターの離型処理面に、粘着剤組成物(7)を、乾燥後の粘着剤層の厚みが15μmまたは25μmとなるようにアプリケーターを用いて塗布し、100℃で1分間乾燥させて第2粘着剤層を作製した。 The pressure-sensitive adhesive composition (7) is applied to the release-treated surface of the separator used for producing the light-selective absorbing pressure-sensitive adhesive layer using an applicator so that the thickness of the pressure-sensitive adhesive layer after drying is 15 μm or 25 μm. Then, it was dried at 100 ° C. for 1 minute to prepare a second pressure-sensitive adhesive layer.
 [光学積層体の作製]
 (実施例1)
 作製した片面保護偏光板の偏光子側に粘着剤層(1)を貼合し、セパレーターを剥離した。粘着剤層(1)のセパレーターを剥離した面と作製した位相差積層体の第1液晶硬化層側とを貼合し、第2液晶硬化層の基材フィルムを剥離した。基材フィルムを剥離した面に、表1に記載の厚みを有するセパレーター付き第2粘着剤層を貼合した。実施例1の光学積層体は、図2に示すような構成を有していた。
[Preparation of optical laminate]
(Example 1)
The pressure-sensitive adhesive layer (1) was attached to the polarizer side of the prepared single-sided protective polarizing plate, and the separator was peeled off. The surface from which the separator of the pressure-sensitive adhesive layer (1) was peeled off was bonded to the first liquid crystal cured layer side of the produced retardation laminate, and the base film of the second liquid crystal cured layer was peeled off. A second pressure-sensitive adhesive layer with a separator having the thickness shown in Table 1 was attached to the surface from which the base film was peeled off. The optical laminate of Example 1 had a configuration as shown in FIG.
 (実施例2および3、比較例1~3)
 実施例1の光学積層体と同様の方法により、実施例1の粘着剤層(1)に代えて粘着剤層(2)を用いて実施例2の光学積層体を、粘着剤層(3)を用いて実施例3の光学積層体を、粘着剤層(4)を用いて比較例1の光学積層体を、粘着剤層(5)を用いて比較例2の光学積層体を、粘着剤層(6)を用いて比較例3の光学積層体をそれぞれ作製した。
(Examples 2 and 3, Comparative Examples 1 to 3)
By the same method as the optical laminate of Example 1, the adhesive layer (2) was used instead of the adhesive layer (1) of Example 1, and the optical laminate of Example 2 was subjected to the adhesive layer (3). The optical laminate of Example 3 was used, the optical laminate of Comparative Example 1 was used with the pressure-sensitive adhesive layer (4), and the optical laminate of Comparative Example 2 was used with the pressure-sensitive adhesive layer (5). The optical laminate of Comparative Example 3 was prepared using the layer (6).
 [粘着剤層の吸光度測定]
 粘着剤層(1)から粘着剤層(6)をそれぞれガラスに貼合し、セパレーターを剥離した後、粘着剤層にシクロオレフィンポリマー(COP)フィルム(日本ゼオン株式会社製ZF-14)を貼合し、粘着剤層評価用積層体を作製した。粘着剤層評価用積層体を分光光度計UV-2450(株式会社島津製作所製)にセットし、ダブルビーム法により1nmステップ300~800nmの波長範囲で吸光度を測定した。作製した粘着剤層の波長410nmにおける吸光度を表1に示す。なお、波長410nmにおける、ガラスの吸光度及びCOPフィルムの吸光度はいずれも0である。
[Measurement of absorbance of adhesive layer]
The pressure-sensitive adhesive layer (6) is bonded to the glass from the pressure-sensitive adhesive layer (1), the separator is peeled off, and then a cycloolefin polymer (COP) film (ZF-14 manufactured by Nippon Zeon Corporation) is attached to the pressure-sensitive adhesive layer. Then, a laminate for evaluating the pressure-sensitive adhesive layer was prepared. The laminate for evaluating the pressure-sensitive adhesive layer was set on a spectrophotometer UV-2450 (manufactured by Shimadzu Corporation), and the absorbance was measured in the wavelength range of 300 to 800 nm in 1 nm steps by the double beam method. Table 1 shows the absorbance of the prepared pressure-sensitive adhesive layer at a wavelength of 410 nm. The absorbance of the glass and the absorbance of the COP film at a wavelength of 410 nm are both 0.
 [重量平均分子量(Mw)の測定]
 光選択吸収性重合体(A-1)、(A-2)、(A-3)及びアクリル樹脂(A-4)の重量平均分子量(Mw)は、ポリスチレン換算の数平均分子量(Mn)として、移動相にテトラヒドロフランを用い、下記のサイズエクスクルージョンクロマトグラフィー(SEC)により求めた。測定する(メタ)アクリル系ポリマーを約0.05質量%の濃度でテトラヒドロフランに溶解させ、SECに10μL注入した。移動相は、1.0mL/分の流量で流した。カラムとして、PLgel MIXED-B(ポリマーラボラトリーズ製)を用いた。検出器にはUV-VIS検出器(商品名:Agilent GPC)を用いた。
[Measurement of weight average molecular weight (Mw)]
The weight average molecular weight (Mw) of the photoselective absorbent polymers (A-1), (A-2), (A-3) and the acrylic resin (A-4) is defined as the polystyrene-equivalent number average molecular weight (Mn). , Tetrahydrofuran was used as the mobile phase, and it was determined by the following size exclusion chromatography (SEC). The (meth) acrylic polymer to be measured was dissolved in tetrahydrofuran at a concentration of about 0.05% by mass, and 10 μL was injected into SEC. The mobile phase was flowed at a flow rate of 1.0 mL / min. PLgel MIXED-B (manufactured by Polymer Laboratories) was used as a column. A UV-VIS detector (trade name: Agilent GPC) was used as the detector.
 [ホウ素含有量の測定]
 偏光子0.2gを1.9wt%マンニトール水溶液200gに溶解した。得られた水溶液を1mol/L NaOH水溶液で滴定し、中和に要したNaOH液の量と検量線の比較により、偏光子のホウ素含有量を算出した。
[Measurement of boron content]
0.2 g of the polarizer was dissolved in 200 g of a 1.9 wt% mannitol aqueous solution. The obtained aqueous solution was titrated with a 1 mol / L NaOH aqueous solution, and the boron content of the polarizer was calculated by comparing the amount of the NaOH solution required for neutralization with the calibration curve.
 [耐湿熱試験および色抜けの観察]
 実施例1~3および比較例1~3で得られた光学積層体のセパレーターを剥離し、無アルカリガラス板に貼合した後、温度65℃、湿度90%RHの環境下に500時間放置した。その後、試験した光学積層体とは逆の無アルカリガラス面にクロスニコルの関係になる偏光板を貼合し、光学顕微鏡にて観察し、観察画像を保存した。光学顕微鏡は、株式会社キーエンス製の「VHX-500」を用いた。図3は、光学顕微鏡での観察画像の一例を示す。図3において、光学積層体の端部50から内側方向に矢印に示す直線(端部50から垂直方向に延在する直線)に沿って観察すると、色抜け領域51と色抜けが生じていない領域(非色抜け領域)52とがあることがわかる。
[Moisture resistance test and observation of color loss]
The separators of the optical laminates obtained in Examples 1 to 3 and Comparative Examples 1 to 3 were peeled off, bonded to a non-alkali glass plate, and then left to stand in an environment of a temperature of 65 ° C. and a humidity of 90% RH for 500 hours. .. Then, a polarizing plate having a cross-nicol relationship was attached to a non-alkali glass surface opposite to the tested optical laminate, observed with an optical microscope, and the observed image was stored. As the optical microscope, "VHX-500" manufactured by KEYENCE CORPORATION was used. FIG. 3 shows an example of an observation image with an optical microscope. In FIG. 3, when observed along the straight line indicated by the arrow inward from the end 50 of the optical laminate (the straight line extending vertically from the end 50), the color loss region 51 and the region where no color loss occurs. It can be seen that there is (non-color loss region) 52.
 [画像処理による色抜け量の測定]
 顕微鏡での観察画像を、画像解析ソフト「ImageJ(フリーソフト)」を使用し、白黒256階調(0~255)に変換した。白黒256階調(0~255)に変換する方法は、RGB値の平均をとる方法を使用した。図4は変換後のデータの一例を示す。光学積層体の端部50に対して垂直方向(図3中矢印)の階調プロファイルにおける色抜け領域51と非色抜け領域52の中間点(色抜けグラデーションの中間)を光学積層体の色抜け端部とし(図4)、光学積層体の端部50から色抜け端部の距離(μm)を色抜け距離として測定した。光学積層体の色抜け距離を表1に示す。色抜け距離が小さいほど、色抜け範囲が狭く、耐湿熱性に優れる。
[Measurement of color loss by image processing]
The image observed with a microscope was converted into black-and-white 256 gradations (0 to 255) using image analysis software "ImageJ (free software)". As a method of converting to black and white 256 gradations (0 to 255), a method of averaging RGB values was used. FIG. 4 shows an example of the converted data. The midpoint between the color loss region 51 and the non-color loss region 52 (middle of the color loss gradation) in the gradation profile in the direction perpendicular to the end 50 of the optical laminate (arrow in FIG. 3) is the color loss of the optical laminate. As the end portion (FIG. 4), the distance (μm) from the end portion 50 of the optical laminate to the color loss end portion was measured as the color loss distance. Table 1 shows the color loss distance of the optical laminate. The smaller the color loss distance, the narrower the color loss range and the better the moisture resistance and heat resistance.
 同じ吸光度を示す粘着剤層を用いた光学積層体同士(実施例1と比較例1、実施例2と比較例2、実施例3と比較例3)の色抜け距離を比較し、その差および色抜け距離の改善率((差の絶対値/比較例1~3の色抜け距離)×100)を表1に示す。 The color loss distances of the optical laminates using the pressure-sensitive adhesive layers showing the same absorbance (Example 1 and Comparative Example 1, Example 2 and Comparative Example 2, and Example 3 and Comparative Example 3) were compared, and the difference and the difference. Table 1 shows the improvement rate of the color loss distance ((absolute value of difference / color loss distance of Comparative Examples 1 to 3) × 100).
Figure JPOXMLDOC01-appb-T000026
Figure JPOXMLDOC01-appb-T000026
 10 偏光子、11 保護フィルム、20 光選択吸収性粘着剤層、30 第1位相差層、31 第2位相差層、32 第2粘着剤層、33 接着剤層、50 光学積層体の端部、51 色抜け領域、52 非色抜け領域、100,200 光学積層体、300 位相差積層体。 10 Polarizer, 11 Protective film, 20 Light selective absorption adhesive layer, 30 First retardation layer, 31 Second retardation layer, 32 Second adhesive layer, 33 Adhesive layer, 50 Edge of optical laminate , 51 color loss area, 52 non-color loss area, 100, 200 optical laminate, 300 retardation laminate.

Claims (10)

  1.  偏光子と、前記偏光子に接して積層された光選択吸収性粘着剤層と、を有する光学積層体であって、
     前記偏光子は、ヨウ素が吸着配向され、ホウ素の含有量が5.0質量%以下であり、
     前記光選択吸収性粘着剤層を形成する粘着剤組成物は、光選択吸収性重合体を含む、光学積層体。
    An optical laminate having a polarizer and a light selective absorbing pressure-sensitive adhesive layer laminated in contact with the polarizer.
    Iodine is adsorbed and oriented in the polarizer, and the boron content is 5.0% by mass or less.
    The pressure-sensitive adhesive composition forming the light-selective-absorbing pressure-sensitive adhesive layer is an optical laminate containing a light-selective-absorbing polymer.
  2.  前記偏光子の前記光選択吸収性粘着剤層側とは反対側に積層された保護フィルムをさらに有する、請求項1に記載の光学積層体。 The optical laminate according to claim 1, further comprising a protective film laminated on the side of the polarizer opposite to the light selective absorbing pressure-sensitive adhesive layer side.
  3.  前記光選択吸収性重合体は、下記化学式(1):
     >N-C=C-C=C<  (1)
    [ただし、化学式(1)を構成する1個のN原子および4個のC原子の全てが芳香族複素環の一部または全部を構成することはない。]
     で示される構造を有する構造単位を含有し、ガラス転移温度が40℃以下である樹脂である、請求項1または2に記載の光学積層体。
    The photoselective absorbent polymer has the following chemical formula (1):
    > NC = CC = C <(1)
    [However, not all of one N atom and four C atoms constituting the chemical formula (1) form a part or all of the aromatic heterocycle. ]
    The optical laminate according to claim 1 or 2, which is a resin containing a structural unit having the structure shown by and having a glass transition temperature of 40 ° C. or lower.
  4.  前記光選択吸収性重合体は、全構造単位100質量部に対して前記化学式(1)で示される構造を有する構造単位の含有量は0.01質量部以上50質量部以下である、請求項3に記載の光学積層体。 The claim that the light selective absorption polymer has a content of a structural unit having a structure represented by the chemical formula (1) of 0.01 parts by mass or more and 50 parts by mass or less with respect to 100 parts by mass of all structural units. The optical laminate according to 3.
  5.  前記光選択吸収性重合体は、重量平均分子量が30万以上である、請求項1~4のいずれか1項に記載の光学積層体。 The optical laminate according to any one of claims 1 to 4, wherein the light selective absorption polymer has a weight average molecular weight of 300,000 or more.
  6.  前記粘着剤組成物は、光選択吸収剤を含まない、または全樹脂成分100質量部に対して光選択吸収剤の含有量が0.1質量部以下である、請求項1~5のいずれか1項に記載の光学積層体。 Any of claims 1 to 5, wherein the pressure-sensitive adhesive composition does not contain a light selective absorber, or the content of the light selective absorber is 0.1 parts by mass or less with respect to 100 parts by mass of all resin components. The optical laminate according to item 1.
  7.  前記光選択吸収性粘着剤層の前記偏光子とは反対側に積層されたλ/4位相差層をさらに有する、請求項1~6のいずれか1項に記載の光学積層体。 The optical laminate according to any one of claims 1 to 6, further comprising a λ / 4 retardation layer laminated on the opposite side of the light selective absorbing pressure-sensitive adhesive layer to the polarizer.
  8.  反射防止用偏光板である、請求項1~7のいずれか1項に記載の光学積層体。 The optical laminate according to any one of claims 1 to 7, which is an antireflection polarizing plate.
  9.  画像表示パネルと、前記画像表示パネルの前面に配置された請求項8に記載の光学積層体とを含む、画像表示装置。 An image display device including the image display panel and the optical laminate according to claim 8 arranged in front of the image display panel.
  10.  有機EL表示装置である、請求項9に記載の画像表示装置。 The image display device according to claim 9, which is an organic EL display device.
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JP2013148806A (en) * 2012-01-23 2013-08-01 Sumitomo Chemical Co Ltd Polarizing film and manufacturing method thereof and polarizer
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JP2013148806A (en) * 2012-01-23 2013-08-01 Sumitomo Chemical Co Ltd Polarizing film and manufacturing method thereof and polarizer
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