WO2021077482A1 - 彩膜基板及其制造方法 - Google Patents

彩膜基板及其制造方法 Download PDF

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Publication number
WO2021077482A1
WO2021077482A1 PCT/CN2019/117592 CN2019117592W WO2021077482A1 WO 2021077482 A1 WO2021077482 A1 WO 2021077482A1 CN 2019117592 W CN2019117592 W CN 2019117592W WO 2021077482 A1 WO2021077482 A1 WO 2021077482A1
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WIPO (PCT)
Prior art keywords
color resist
convex portion
color
groove
block
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Ceased
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PCT/CN2019/117592
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English (en)
French (fr)
Inventor
宋江江
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TCL China Star Optoelectronics Technology Co Ltd
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TCL China Star Optoelectronics Technology Co Ltd
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Priority to US16/626,526 priority Critical patent/US20210333453A1/en
Publication of WO2021077482A1 publication Critical patent/WO2021077482A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Definitions

  • the present invention relates to a color film substrate and a manufacturing method thereof, in particular to a color film substrate formed by using a halftone mask and a black photosensitive layer and a manufacturing method thereof.
  • liquid crystal display technology has become the mainstream of the actual industry.
  • Current liquid crystal display products include color filters, liquid crystal layers, array substrates, and backlight modules.
  • the current color filter includes a black matrix, a color layer, a transparent conductive layer and a spacer, and generally requires 5 yellow light manufacturing processes and 1 vacuum manufacturing process to complete.
  • the spacers are divided into main spacers and auxiliary spacers, which are usually made by using half-tone masks (Half-tone mask).
  • Half-tone masks Half-tone mask
  • the design of the half-tone mask and the corresponding The processing steps are more complicated. Generally, the more the number of process channels, the lower the corresponding yield rate. If the number of process channels can be reduced, the product yield rate will increase and the production time will be shortened.
  • the current color filter includes a black matrix, a color layer, a transparent conductive layer and a spacer, and generally requires 5 yellow light manufacturing processes and 1 vacuum manufacturing process to complete.
  • the spacers are divided into main spacers and auxiliary spacers, which are usually made by using half-tone masks (Half-tone mask).
  • Half-tone masks Half-tone mask
  • the design of the half-tone mask and the corresponding The processing steps are more complicated. Generally, the more the number of process channels, the lower the corresponding yield rate. If the number of process channels can be reduced, the product yield rate will increase and the production time will be shortened.
  • the main purpose of the present invention is to provide a color filter substrate and a manufacturing method thereof.
  • the color filter substrate has a plurality of protrusions formed by a black photosensitive layer, and a plurality of grooves are arranged at specific positions on a color resist layer, so that the plurality of protrusions have different heights and can be used as main spacers respectively And vice gap sub. Since the halftone mask can be used to manufacture multiple protrusions of different heights in one mask, the steps of manufacturing the black matrix can be omitted, and the difficulty of the manufacturing process can be reduced at the same time, and the product yield can be improved.
  • an embodiment of the present invention provides a color filter substrate, which includes: a transparent substrate; a color resist layer formed on the transparent substrate, wherein the color resist layer has at least one groove and at least A flat portion; a transparent conductive layer formed on the color resist layer; and a black photosensitive layer formed on the transparent conductive layer; wherein the black photosensitive layer includes a first convex portion and a second convex Portion, the first convex portion is disposed on the groove and extends into the groove, the second convex portion is disposed on the flat portion, and the height of the second convex portion is greater than that of the first convex portion.
  • the height of a convex part is provided.
  • the color resist layer includes a plurality of color resist blocks, and the groove is disposed at at least one boundary of the plurality of color resist blocks.
  • the color resist layer includes a first color resist block, a second color resist block, and a third color resist block, and the groove is disposed in the first color resist block and A first junction of the second color resist block, and the flat portion is disposed at a second junction of the second color resist block and the third color resist block.
  • the groove includes an edge portion of the color resist block, and the thickness of the edge portion is reduced by 0.8 to 1.5 micrometers compared to the maximum thickness of the color resist layer.
  • the groove includes an edge portion of the color resist block, and the width of the edge portion is 1/2 to 2/3 times the width of the first convex portion .
  • the height of the first protrusion is between 1.5 and 10 microns, and the height of the second protrusion is between 2 and 10.5 microns.
  • the height of the first convex portion is 0.3 to 0.8 ⁇ m smaller than the height of the second convex portion.
  • Another embodiment of the present invention provides a manufacturing method of a color filter substrate, wherein the manufacturing method includes the following steps: providing a transparent substrate; forming a color resist layer on the transparent substrate, wherein the color resist layer has at least A groove and at least one flat portion; forming a transparent conductive layer on the color resist layer; and using a half-tone mask to form a black photosensitive layer on the transparent conductive layer; wherein the black photosensitive layer includes A first convex portion and a second convex portion, the first convex portion is arranged corresponding to the groove and extends into the groove, and the second convex portion is arranged corresponding to the flat portion, The height of the second convex portion is greater than the height of the first convex portion.
  • the color resist layer includes a plurality of color resist blocks, and the groove is disposed at at least one boundary of the plurality of color resist blocks.
  • the color resist layer includes a first color resist block, a second color resist block, and a third color resist block, and the groove is disposed in the first color resist block and A first junction of the second color resist block, and the flat portion is disposed at a second junction of the second color resist block and the third color resist block.
  • the groove includes an edge portion of the color resist block, and the thickness of the edge portion is reduced by 0.8 to 1.5 micrometers compared to the maximum thickness of the color resist layer.
  • the groove includes an edge portion of the color resist block, and the width of the edge portion is 1/2 to 2/3 times the width of the first convex portion .
  • the height of the first protrusion is between 1.5 and 10 microns, and the height of the second protrusion is between 2 and 10.5 microns.
  • the height of the first convex portion is 0.3 to 0.8 ⁇ m smaller than the height of the second convex portion.
  • An embodiment of the present invention provides a color filter substrate and a manufacturing method thereof.
  • the color filter substrate has a plurality of protrusions formed by a black photosensitive layer, and a plurality of grooves are arranged at specific positions on a color resist layer, so that the plurality of protrusions have different heights and can be used as main spacers respectively And vice gap sub. Since the halftone mask can be used to manufacture multiple protrusions of different heights in one mask, the steps of manufacturing the black matrix can be omitted, and the difficulty of the manufacturing process can be reduced at the same time, and the product yield can be improved.
  • FIG. 1 is a top view of a color filter substrate according to an embodiment of the invention.
  • Fig. 2 is a cross-sectional view of the color filter substrate of Fig. 1 along A-A'.
  • 3A to 3E are schematic flowcharts of a manufacturing method of a color filter substrate according to an embodiment of the present invention.
  • the color filter substrate mainly includes: a transparent substrate 10; a color resist layer 20 formed on the transparent substrate 10, wherein the color resist layer 20 has at least one groove 21 and at least one flat portion 22; a transparent conductive layer
  • the layer 30 is formed on the color resist layer 20; and a black photosensitive layer 40 is formed on the transparent conductive layer 30; wherein the black photosensitive layer 40 includes a first protrusion 41 and a second protrusion 42.
  • the first convex portion 41 is disposed on the groove 21 and extends into the groove 21, and the second convex portion 42 is disposed on the flat portion 22.
  • the height h2 of the second convex portion 42 is greater than the height h1 of the first convex portion 41.
  • the black photosensitive layer 40 is disposed on the color resist layer 20 and divides the color resist layer 20 into a plurality of blocks. These areas can allow light to pass through. On the contrary, the light transmittance of the part covered by the black photosensitive layer 40 decreases.
  • the color resist layer 20 may include a plurality of color resist blocks, such as a first color resist block 20G, a second color resist block 20B, and a third color resist block.
  • Block 20R Preferably, the groove 21 is disposed at a first junction of the first color resist block 20G and the second color resist block 20B.
  • the flat portion 22 is disposed at a second junction between the second color resist block 20B and the third color resist block 20R.
  • the groove 21 includes an edge portion of the first color resist block 20G, and the thickness of the edge portion of the first color resist block 20G is greater than that of the color resist layer 20. The thickness is reduced by 0.8 to 1.5 microns.
  • the edge portion of the first color resist block 20G is thinner than the middle portion.
  • the groove 21 also includes an edge portion of the second color resist block 20B, the edge portion of the second color resist block 20B and the first color resist block 20G The edge portion constitutes the groove 21.
  • the groove 21 can accommodate the first convex portion 41, so that the height h1 of the first convex portion 41 is smaller than the height h2 of the second convex portion 42 located on the flat portion 22.
  • the height h1 of the first protrusion 41 is smaller than the height h2 of the second protrusion 42 by 0.3 to 0.8 micrometers.
  • the first protrusion 41 and the second protrusion 42 may serve as spacers.
  • the width of the edge portion of the first color resist block 20G and the width of the edge portion of the second color resist block 20B are both 1/ of the width of the first protrusion 41 2 to 2/3 times.
  • the width of the first convex portion 41 may be less than or equal to the width of the second convex portion 42.
  • the height h1 of the first protrusion 41 is between 1.5 and 10 microns, and the height h2 of the second protrusion 42 is between 2 and 10.5 microns.
  • Another embodiment of the present invention provides a method for manufacturing a color filter substrate.
  • the manufacturing method includes the following steps: (S1) providing a transparent substrate; (S2) forming a color resist layer on the transparent substrate; (S3) forming a transparent conductive layer on the color resist layer; and (S4) Using a halftone mask, a black photosensitive layer is formed on the transparent conductive layer.
  • the black photosensitive layer is a black photoresist material with photosensitive characteristics, which can be patterned by illumination, so that the black photosensitive layer has a specific shape.
  • the black photosensitive layer may be, for example, a photoresist whose main components are carbon black (or other black materials) and acrylic.
  • the steps (S1) and (S2) may include forming a plurality of first color resist blocks 20G on the transparent substrate 10, and then forming a plurality of first color resist blocks 20G on each of the first color resist blocks 20G.
  • a second color resist block 20B is formed on the right side, and finally a third color resist block 20R is formed on the right side of each second color resist block 20B.
  • the first color resist block 20G, the second color resist block 20B, and the third color resist block 20R are the green color resist block, the blue color resist block 20B, and the group of color resist blocks, but are not limited to these colors.
  • the first color resist block 20G, the second color resist block 20B, and the third color resist block 20R included in the color resist layer 20 may be respectively formed by yellow light processing.
  • the thickness of the right edge portion of the first color resist block 20G is reduced so as to be able to match the left edge portion of the second color resist block 20B later.
  • the parts are combined to form a groove 21.
  • the thickness of the left edge portion of the second color resist block 20B is also reduced when forming the second color resist block 20B.
  • another groove 21 ′ may be formed at the right edge portion of the third color resist block 20R and the left edge portion (ie, the junction) of the first color resist block 20G.
  • the boundary between the second color resist block 20B and the third color resist block 20R is not thinned to form a flat portion 22.
  • the groove 21' can be selectively formed or not formed, or the position of the groove 21 can be changed. The present invention is not particularly limited. Therefore, the position or number of the grooves can be adjusted according to actual needs.
  • the transparent conductive layer 30 is formed on the color resist layer 20.
  • the transparent conductive layer 30 may be deposited on the color resist layer 20 by means of physical vapor deposition (PVD), for example.
  • the material of the transparent conductive layer 30 may be, for example, transparent conductive materials such as indium tin oxide, indium zinc oxide, etc., but is not limited thereto.
  • the halftone mask 50 has a plurality of semi-transmissive regions 51 and a plurality of fully transparent regions 52, so the fully transparent regions 52 correspond to The groove 21, the groove 21', and the flat portion 22 can be exposed and developed to form a first convex portion 41, a second convex portion 42 and a third concave portion on the black photosensitive layer 40 43.
  • the semi-transmissive area 51 shields part of the light, so that the black photosensitive layer 40 does not fully react to the positions in these semi-transmissive areas 51. After development, most of the material is removed, and vice versa. The position of the full light-transmitting area 52 is relatively complete.
  • the black photosensitive layer 40 with high and low morphologies can be obtained through the halftone mask 50.
  • the arrangement of the first convex portion 41 is located on the groove 21 and extends into the groove 21, and the arrangement of the second convex portion 42 is located on the flat portion 22, so the second The height of the convex portion 42 is greater than the height of the first convex portion 41.
  • the third convex portion 43 is formed on the groove 21', and the height of the first convex portion 41 and the height of the third convex portion 43 are both smaller than the height of the second convex portion 42.
  • the height of the first protrusion 41 is smaller than the height of the second protrusion 42 by 0.3 to 0.8 micrometers.
  • the first convex portion 41, the second convex portion 42 and the third convex portion 43 can be used as spacers of the liquid crystal panel.
  • the second convex portion 42 has the highest height and serves as a main spacer, while the first convex portion 41 and/or the third convex portion 43 serves as a secondary spacer.
  • the width of the right edge portion of the first color resist block 20G and the width of the left edge portion of the second color resist block 20B are both the width of the first protrusion 41 1/2 to 2/3 times.
  • the width of the first convex portion 41 and the third convex portion 43 may be less than or equal to the width of the second convex portion 42, but if the first convex portion 41 or the third convex portion The width of the portion 43 is greater than the width of the second convex portion 42 and does not affect the function as a spacer.
  • the height of the first protrusion 41, the height of the second protrusion 42, and the height of the third protrusion 43 are all 2 to 4 microns.
  • the height h1 of the first protrusion 41 is between 1.5 and 10 micrometers, and the height h2 of the second protrusion 42 is between 2 and 10.5 micrometers.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

一种彩膜基板及其制造方法。所述彩膜基板包含一透明基板(10)；一色阻层(20)，形成于所述透明基板(10)上，其中所述色阻层(20)具有至少一凹槽(21)以及至少一平坦部(22)；一透明导电层(30)，形成于所述色阻层(20)上；以及一黑色感光层(40)，形成于所述透明导电层(30)上；其中所述黑色感光层(40)包含一第一凸部(41)以及一第二凸部(42)，所述第一凸部(41)设置于所述凹槽(21)上并延伸至所述凹槽(21)内，所述第二凸部(42)设置于所述平坦部(22)上，所述第二凸部(42)的高度大于所述第一凸部(41)的高度。

Description

彩膜基板及其制造方法 技术领域
本发明是有关于一种彩膜基板及其制造方法，特别是有关于一种利用半色调光罩及黑色感光层所形成的彩膜基板及其制造方法。
 背景技术
随着显示技术的发展，液晶显示技术已经成为现实行业的主流。现行液晶显示产品，包括彩色滤光片、液晶层、阵列基板、背光模组等组成。
现行的彩色滤光片包括黑色矩阵、色彩层、透明导电层和间隙子，一般需要5道黄光制程和1道真空制程来完成。间隙子分为主间隙子与副间隙子，通常使用半色调光罩（Half-tone mask）来制作，而为了形成不同高度的主副两种间隙子，在半色调光罩的设计及相应的处理步骤上较为复杂。通常制程道数越多，相应的良率越低，如果能够减少制程道数，产品的良率会提升，并且生产时间缩短。
故，有必要提供一种彩膜基板及其制造方法，以解决现有技术所存在的问题。
 技术问题
现行的彩色滤光片包括黑色矩阵、色彩层、透明导电层和间隙子，一般需要5道黄光制程和1道真空制程来完成。间隙子分为主间隙子与副间隙子，通常使用半色调光罩（Half-tone mask）来制作，而为了形成不同高度的主副两种间隙子，在半色调光罩的设计及相应的处理步骤上较为复杂。通常制程道数越多，相应的良率越低，如果能够减少制程道数，产品的良率会提升，并且生产时间缩短。
 技术解决方案
本发明的主要目的在于提供一种彩膜基板及其制造方法。所述彩膜基板具有一黑色感光层所形成的多个凸部，且在一色阻层上的特定位置设置多个凹槽，使得所述多个凸部具有不同高度，可分别作为主间隙子与副间隙子。由于使用半色调光罩即可在一道光罩制造不同高度的多个凸部，因此可省去制造黑色矩阵的步骤，同时降低了制程困难度，可提高产品良率。
为达上述目的，本发明的一实施例提供一种彩膜基板，其包含：一透明基板；一色阻层，形成于所述透明基板上，其中所述色阻层具有至少一凹槽以及至少一平坦部；一透明导电层，形成于所述色阻层上；以及一黑色感光层，形成于所述透明导电层上；其中所述黑色感光层包含一第一凸部以及一第二凸部，所述第一凸部设置于所述凹槽上并延伸至所述凹槽内，所述第二凸部设置于所述平坦部上，所述第二凸部的高度大于所述第一凸部的高度。
在本发明的一实施例中，所述色阻层包含多个色阻块，所述凹槽设置于所述多个色阻块的至少一个交界处。
在本发明的一实施例中，所述色阻层包含一第一色阻块、一第二色阻块以及一第三色阻块，所述凹槽设置于所述第一色阻块与所述第二色阻块的一第一交界处，并且所述平坦部设置于所述第二色阻块与所述第三色阻块的一第二交界处。
在本发明的一实施例中，所述凹槽包含所述色阻块的一边缘部份，所述边缘部份的厚度相较于所述色阻层的最大厚度减少0.8至1.5微米。
在本发明的一实施例中，所述凹槽包含所述色阻块的一边缘部份，所述边缘部份的宽度为所述第一凸部的宽度的1/2至2/3倍。
在本发明的一实施例中，所述第一凸部的高度介于1.5至10微米，所述第二凸部的高度介于2至10.5微米。
在本发明的一实施例中，所述第一凸部的高度比所述第二凸部的高度小0.3至0.8微米。
本发明的另一实施例提供一种彩膜基板的制造方法，其中所述制造方法包含下列步骤：提供一透明基板；形成一色阻层于所述透明基板上，其中所述色阻层具有至少一凹槽以及至少一平坦部；形成一透明导电层于所述色阻层上；以及使用一半色调光罩，将一黑色感光层形成于所述透明导电层上；其中所述黑色感光层包含一第一凸部以及一第二凸部，所述第一凸部设置对应于所述凹槽上并延伸至所述凹槽内，所述第二凸部设置对应于所述平坦部上，所述第二凸部的高度大于所述第一凸部的高度。
在本发明的一实施例中，所述色阻层包含多个色阻块，所述凹槽设置于所述多个色阻块的至少一个交界处。
在本发明的一实施例中，所述色阻层包含一第一色阻块、一第二色阻块以及一第三色阻块，所述凹槽设置于所述第一色阻块与所述第二色阻块的一第一交界处，并且所述平坦部设置于所述第二色阻块与所述第三色阻块的一第二交界处。
在本发明的一实施例中，所述凹槽包含所述色阻块的一边缘部份，所述边缘部份的厚度相较于所述色阻层的最大厚度减少0.8至1.5微米。
在本发明的一实施例中，所述凹槽包含所述色阻块的一边缘部份，所述边缘部份的宽度为所述第一凸部的宽度的1/2至2/3倍。
在本发明的一实施例中，所述第一凸部的高度介于1.5至10微米，所述第二凸部的高度介于2至10.5微米。
在本发明的一实施例中，所述第一凸部的高度比所述第二凸部的高度小0.3至0.8微米。
 有益效果
本发明一实施例所提供的一种彩膜基板及其制造方法。所述彩膜基板具有一黑色感光层所形成的多个凸部，且在一色阻层上的特定位置设置多个凹槽，使得所述多个凸部具有不同高度，可分别作为主间隙子与副间隙子。由于使用半色调光罩即可在一道光罩制造不同高度的多个凸部，因此可省去制造黑色矩阵的步骤，同时降低了制程困难度，可提高产品良率。
 附图说明
图1是本发明一实施例的一彩膜基板的俯视图。
图2是图1的所述彩膜基板沿A-A’的剖面图。
图3A至3E是本发明一实施例的一彩膜基板的制造方法的流程示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。再者，本发明所提到的方向用语，例如上、下、顶、底、前、后、左、右、内、外、侧面、周围、中央、水平、横向、垂直、纵向、轴向、径向、最上层或最下层等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
请参照图1及图2，其显示了本发明一实施例的一种彩膜基板的俯视图及剖面图。所述彩膜基板主要包含：一透明基板10；一色阻层20，形成于所述透明基板10上，其中所述色阻层20具有至少一凹槽21以及至少一平坦部22；一透明导电层30，形成于所述色阻层上20；以及一黑色感光层40，形成于所述透明导电层30上；其中所述黑色感光层40包含一第一凸部41以及一第二凸部42，所述第一凸部41设置于所述凹槽21上并延伸至所述凹槽21内，所述第二凸部42设置于所述平坦部22上。优选的，所述第二凸部42的高度h2大于所述第一凸部41的高度h1。
从图1来看，所述黑色感光层40是配置在所述色阻层20上，且将所述色阻层20分隔成多个区块。这些区块都是可允许光线通过的，相对的，被所述黑色感光层40覆盖的部份则光线透过率下降。
请继续参照图2，在本发明的一实施例中，所述色阻层20可包含多个色阻块，如一第一色阻块20G、一第二色阻块20B以及一第三色阻块20R。优选的，所述凹槽21是被设置于所述第一色阻块20G以及所述第二色阻块20B的一第一交界处。所述平坦部22则设置于所述第二色阻块20B与所述第三色阻块20R之间的一第二交界处。优选的，所述凹槽21包含所述第一色阻块20G的一边缘部份，所述第一色阻块20G的所述边缘部份的厚度相较于所述色阻层20的最大厚度减少0.8至1.5微米。也就是说，所述第一色阻块20G的所述边缘部份与其中间部份相较是较薄的。相似的，所述凹槽21也包含所述第二色阻块20B的一边缘部份，所述第二色阻块20B的所述边缘部份与所述第一色阻块20G的所述边缘部份构成了所述凹槽21。所述凹槽21可容纳所述第一凸部41，因此使得所述第一凸部41的高度h1小于位在所述平坦部22的所述第二凸部42的高度h2。在本发明的一实施例中，所述第一凸部41的高度h1比所述第二凸部42的高度h2小0.3至0.8微米。所述第一凸部41与所述第二凸部42可作为间隙子（spacer）。优选的，所述第一色阻块20G的所述边缘部份的宽度以及所述第二色阻块20B的所述边缘部份的宽度均为所述第一凸部41的宽度的1/2至2/3倍。优选的，所述第一凸部41的宽度可以小于或等于所述第二凸部42的宽度。在本发明的一实施例中，所述第一凸部41的高度h1介于1.5至10微米，所述第二凸部42的高度h2介于2至10.5微米。
本发明的另一实施例提供了一种彩膜基板的制造方法。所述制造方法包含下列步骤：(S1)提供一透明基板；(S2)形成一色阻层于所述透明基板上；(S3)形成一透明导电层于所述色阻层上；以及(S4)使用一半色调（halftone）光罩，将一黑色感光层形成于所述透明导电层上。所述黑色感光层是一种黑色且具有感光特性的光阻材料，可利用照光的方式来进行图案化的处理，使得所述黑色感光层具有特定的形状。所述黑色感光层可例如是一种光刻胶，其主要成份为碳黑（或其他黑色材料）和亚克力。
如图3A至3C所示，所述步骤(S1)及(S2)可以是在所述透明基板10上先形成多个第一色阻块20G，接着在每个所述第一色阻块20G右侧处形成一第二色阻块20B，最后在每个所述第二色阻块20B右侧形成一第三色阻块20R，如此即可形成所述色阻层20，具有依序排列的所述第一色阻块20G、第二色阻块20B以及第三色阻块20R，也就是绿色色阻块、蓝色色阻块20B以及组色色阻块，但不限于这些颜色。所述色阻层20所包含的所述第一色阻块20G、第二色阻块20B以及第三色阻块20R可以分别利用例如黄光处理方式来形成。在形成所述第一色阻块20G时，将所述第一色阻块20G的右侧边缘部份的厚度减薄，以在后续可与所述第二色阻块20B的左侧边缘部份组合形成一凹槽21。相同的，在形成所述第二色阻块20B时将其左侧边缘部份的厚度也减薄。由于所述色阻层20是由所述第一色阻块20G、所述第二色阻块20B以及所述第三色阻块20R以规律的顺序依次排布于所述透明基板10上，因此，优选的，也可以在所述第三色阻块20R的右侧边缘部份与所述第一色阻块20G的左侧边缘部份（即交界处）形成另一凹槽21’。但所述第二色阻块20B与所述第三色阻块20R的交界处则不进行厚度减薄，以形成一平坦部22。所述凹槽21’可选择性地形成或不形成，或所述凹槽21的位置可改变，本发明并不特别限定，因此可视实际情况需要来调整凹槽的位置或数目。
接着，如图3D所示，在所述步骤(S3)中，在所述色阻层20上形成所述透明导电层30。所述透明导电层30可例如是通过物理气相沉积（PVD）的方式沉积于所述色阻层20上。所述透明导电层30的材料可例如是氧化铟锡、氧化铟锌等透明导电材料，但不限于此。
请继续参照图3E，在所述步骤(S4)中，所述半色调光罩50具有多个半透光区51以及多个全透光区52，因此将所述全透光区52对应于所述凹槽21、所述凹槽21’以及所述平坦部22，可进行曝光显影而使所述黑色感光层40形成一第一凸部41、一第二凸部42以及一第三凹部43。所述半透光区51遮蔽了部份光线，因此使得所述黑色感光层40对位于这些半透光区51的位置反应不完全，经显影后大部份材料被移除，反之对位于所述全透光区52的位置反应较完全，因此可通过所述半色调光罩50来获得具有高低形貌的所述黑色感光层40。所述第一凸部41的设置对位于所述凹槽21上并延伸至所述凹槽21内，所述第二凸部42的设置对位于所述平坦部22上，因此所述第二凸部42的高度大于所述第一凸部41的高度。同样的，所述凹槽21’上形成所述第三凸部43，所述第一凸部41的高度与第三凸部43的高度均小于所述第二凸部42的高度。
在本发明的一实施例中，所述第一凸部41的高度比所述第二凸部42的高度小0.3至0.8微米。所述第一凸部41、所述第二凸部42及所述第三凸部43可作为液晶面板的间隙子（spacer）。所述第二凸部42的高度最高，作为主间隙子，而所述第一凸部41及/或所述第三凸部43则作为副间隙子。优选的，所述第一色阻块20G的所述右边边缘部份的宽度以及所述第二色阻块20B的所述左边边缘部份的宽度均为所述第一凸部41的宽度的1/2至2/3倍。优选的，所述第一凸部41、所述第三凸部43的宽度都可以小于或等于所述第二凸部42的宽度，但若所述第一凸部41或所述第三凸部43的宽度大于所述第二凸部42的宽度也不会影响作为间隙子的功能。在本发明的一实施例中，所述第一凸部41的高度、所述第二凸部42的高度以及所述第三凸部43的高度均为2至4微米。所述第一凸部41的高度h1介于1.5至10微米，所述第二凸部42的高度h2介于2至10.5微米。
本发明已由上述相关实施例加以描述，然而上述实施例仅为实施本发明的范例。必需指出的是，已公开的实施例并未限制本发明的范围。相反地，包含于权利要求书的精神及范围的修改及均等设置均包括于本发明的范围内。

Claims (13)

  1. 一种彩膜基板，其包含：
    一透明基板；
    一色阻层，形成于所述透明基板上，其中所述色阻层具有至少一凹槽以及至少一平坦部；
    一透明导电层，形成于所述色阻层上；以及
    一黑色感光层，形成于所述透明导电层上；
    其中所述色阻层包含多个色阻块，所述凹槽设置于所述多个色阻块的至少一个交界处；
    所述黑色感光层包含一第一凸部以及一第二凸部，所述第一凸部设置于所述凹槽上并延伸至所述凹槽内，所述第二凸部设置于所述平坦部上，所述第一凸部的高度比所述第二凸部的高度小0.3至0.8微米。
  2. 如权利要求1所述的彩膜基板，其中所述色阻层包含一第一色阻块、一第二色阻块以及一第三色阻块，所述凹槽设置于所述第一色阻块与所述第二色阻块的一第一交界处，并且所述平坦部设置于所述第二色阻块与所述第三色阻块的一第二交界处。
  3. 如权利要求1所述的彩膜基板，其中所述凹槽包含所述色阻块的一边缘部份，所述边缘部份的宽度为所述第一凸部的宽度的1/2至2/3倍。
  4. 一种彩膜基板，其包含：
    一透明基板；
    一色阻层，形成于所述透明基板上，其中所述色阻层具有至少一凹槽以及至少一平坦部；
    一透明导电层，形成于所述色阻层上；以及
    一黑色感光层，形成于所述透明导电层上；
    其中所述黑色感光层包含一第一凸部以及一第二凸部，所述第一凸部设置于所述凹槽上并延伸至所述凹槽内，所述第二凸部设置于所述平坦部上，所述第二凸部的高度大于所述第一凸部的高度。
  5. 如权利要求4所述的彩膜基板，其中所述色阻层包含多个色阻块，所述凹槽设置于所述多个色阻块的至少一个交界处。
  6. 如权利要求5所述的彩膜基板，其中所述色阻层包含一第一色阻块、一第二色阻块以及一第三色阻块，所述凹槽设置于所述第一色阻块与所述第二色阻块的一第一交界处，并且所述平坦部设置于所述第二色阻块与所述第三色阻块的一第二交界处。
  7. 如权利要求5所述的彩膜基板，其中所述凹槽包含所述色阻块的一边缘部份，所述边缘部份的宽度为所述第一凸部的宽度的1/2至2/3倍。
  8. 如权利要求4所述的彩膜基板，其中所述第一凸部的高度比所述第二凸部的高度小0.3至0.8微米。
  9. 一种彩膜基板的制造方法，其包含下列步骤：
    提供一透明基板；
    形成一色阻层于所述透明基板上，其中所述色阻层具有至少一凹槽以及至少一平坦部；
    形成一透明导电层于所述色阻层上；以及
    使用一半色调光罩，将一黑色感光层形成于所述透明导电层上；
    其中所述黑色感光层包含一第一凸部以及一第二凸部，所述第一凸部设置对应于所述凹槽上并延伸至所述凹槽内，所述第二凸部设置对应于所述平坦部上，所述第二凸部的高度大于所述第一凸部的高度。
  10. 如权利要求9所述的彩膜基板的制造方法，其中所述色阻层包含多个色阻块，所述凹槽设置于所述多个色阻块的至少一个交界处。
  11. 如权利要求10所述的彩膜基板的制造方法，其中所述色阻层包含一第一色阻块、一第二色阻块以及一第三色阻块，所述凹槽设置于所述第一色阻块与所述第二色阻块的一第一交界处，并且所述平坦部设置于所述第二色阻块与所述第三色阻块的一第二交界处。
  12. 如权利要求10所述的彩膜基板的制造方法，其中所述凹槽包含所述色阻块的一边缘部份，所述边缘部份的宽度为所述第一凸部的宽度的1/2至2/3倍。
  13. 如权利要求9所述的彩膜基板的制造方法，其中所述第一凸部的高度比所述第二凸部的高度小0.3至0.8微米。
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