WO2020253104A1 - Carbon nano tube preparation device and method - Google Patents
Carbon nano tube preparation device and method Download PDFInfo
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- WO2020253104A1 WO2020253104A1 PCT/CN2019/120827 CN2019120827W WO2020253104A1 WO 2020253104 A1 WO2020253104 A1 WO 2020253104A1 CN 2019120827 W CN2019120827 W CN 2019120827W WO 2020253104 A1 WO2020253104 A1 WO 2020253104A1
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- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/16—Preparation
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/16—Preparation
- C01B32/162—Preparation characterised by catalysts
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- the invention belongs to the technical field of new materials, and relates to a nano carbon material, in particular to a carbon nano tube preparation device and method.
- Carbon nanotubes are tubular nanomaterials composed of sp 2 hybrid carbon-carbon covalent bonds. They have a series of advantages such as light weight, high strength, high thermal conductivity, large surface area, and stable structure. They have been widely used since their birth. Attention, leading the hot spot of nano-material technology, has broad application prospects in the fields of structural composite materials, energy, catalysis and functional devices.
- the preparation methods of carbon nanotubes mainly include: chemical vapor deposition, arc ablation, laser, plasma, etc., of which chemical vapor deposition is a relatively mature process route and has been industrialized.
- chemical vapor deposition due to the inherent low reaction temperature of the chemical vapor deposition method, the low degree of crystallization of carbon nanotubes caused by the chemical vapor deposition method results in a high defect content of carbon nanotubes prepared by the chemical vapor deposition method.
- the surface defects are high, which causes their electrical conductivity to be greatly restricted and cannot be compared with carbon nanotubes prepared by high-temperature methods.
- Chinese invention patent CN200710098478.2 discloses a method and device for the continuous production of carbon nanotubes, which adopts a multi-stage countercurrent reactor and utilizes a fluidized bed chemical vapor deposition process to achieve continuous production of carbon nanotubes.
- Chinese invention patent 201010234322.4 discloses a method for preparing single-walled carbon nanotubes with a controllable diameter, which uses a high-temperature arc ablation method to fill carbon powder and a metal catalyst into a carbon electrode, and prepare carbon nanotubes by direct ablation of the arc.
- Chinese invention patent 201110315452.5 discloses a method for preparing carbon nanotubes.
- a metal salt solution is loaded on a molybdenum or zirconium substrate and placed on a deposition table in the cavity of a DC plasma jet chemical vapor deposition equipment.
- the DC arc forms high temperature plasma
- the metal salt is used to decompose and reduce to generate a Ni/MgO catalyst, and then the hydrocarbon gas is passed in for high-temperature cracking to form carbon nanotubes.
- the main purpose of the present invention is to provide a carbon nanotube preparation device and method to overcome the shortcomings in the prior art.
- a carbon nanotube preparation device which includes a catalyst evaporation chamber, a chemical vapor deposition chamber, and a gas-solid separation chamber.
- the device passes the catalyst evaporation chamber through The pipeline chemical vapor deposition chamber is sealed and connected to realize the combination of high-temperature physical evaporation and chemical vapor deposition, so that the catalyst enters the chemical vapor deposition chamber directly through the connecting channel, and the gas path system separates the carrier gas and carbon source gas from the catalyst evaporation chamber and chemical vapor deposition chamber.
- the deposition chamber is opened to make the catalyst react with the high-temperature cracked organic carbon source to generate carbon nanotubes, which are then separated and collected through the gas-solid separation chamber.
- the structure of the carbon nanotube preparation device is as follows: the catalyst evaporation chamber, the chemical vapor deposition chamber and the gas-solid separation chamber are sealed and connected in sequence from left to right;
- An organic carbon source mixed gas inlet is provided at the junction of the catalyst evaporation chamber and the chemical vapor deposition chamber; the other end of the catalyst evaporation chamber is provided with a carrier gas inlet and a high temperature evaporation spray gun;
- the vacuum system is connected to the gas-solid separation chamber; the gas path system is connected to the organic carbon source mixed gas inlet and the carrier gas inlet respectively; the cooling system is arranged on the side wall of the chemical vapor deposition chamber, and the power supply system provides power supply.
- the catalyst evaporation chamber is a high-temperature physical evaporation method
- the high-temperature physical evaporation method is a high-temperature arc, a high-temperature radio frequency plasma or a high-temperature microwave plasma
- the catalyst evaporation chamber is a double-layer water-cooled stainless steel lined with a high-temperature heat insulation layer
- the shell is lined with a high temperature insulation layer made of porous ceramics, ceramic fiber felt, graphite or graphite felt.
- the chemical vapor deposition chamber is a quartz tube furnace.
- the separation method adopted in the gas-solid separation chamber is any one of centrifugal separation, cyclone separation and filtration separation.
- Another object of the present invention is to provide a method for preparing carbon nanotubes by using the above-mentioned carbon nanotube preparation device.
- the method specifically includes the following steps:
- the catalyst in S1) is a metal catalyst, and the metal catalyst includes any one or more of iron, cobalt, and nickel; and the carrier gas is any one of nitrogen, argon, and helium.
- the temperature in S2) is 500-1500°C.
- the maximum temperature of the high-temperature evaporation spray gun in S3) is >2000°C, and the power is >10kW.
- the organic carbon source gas mixture in S4) includes organic carbon source gas, inert carrier gas and hydrogen; wherein the volume of the organic carbon source gas is 5-80%; the volume of hydrogen is 0.1-10%, and the rest It is an inert carrier gas.
- the organic carbon source gas is one or more of methane, ethane, ethylene, ethanol, and methanol.
- the advantages of the present invention include:
- the catalyst is prepared by high-temperature physical evaporation process, so that the metal is directly evaporated in a gaseous state, and ultra-fine-scale catalyst particles can be obtained, which is beneficial to the effective preparation of ultra-fine diameter carbon nanotubes and even single-walled carbon nanotubes;
- the whole set of equipment integrates catalyst preparation, carbon nanotube preparation and separation and collection functions, which can realize continuous preparation, and has the characteristics of high production efficiency and simple process.
- Fig. 1 is a schematic structural diagram of a carbon nanotube preparation device of the present invention.
- Example 2 is a schematic diagram of a scanning electron microscope of the carbon nanotube product prepared in Example 1 of the method of the present invention.
- Example 3 is a schematic diagram of a scanning electron microscope of a carbon nanotube product prepared in Example 2 of the method of the present invention.
- Catalyst evaporation chamber 1.
- Carrier gas inlet 3.
- High temperature evaporation spray gun 4.
- Catalyst 5.
- Organic carbon source mixed gas inlet 6.
- Chemical vapor deposition chamber 7. Gas-solid separation chamber.
- a carbon nanotube preparation device of the present invention includes a catalyst evaporation chamber, a chemical vapor deposition chamber, and a gas-solid separation chamber.
- the device seals the catalyst evaporation chamber through a pipeline chemical vapor deposition chamber.
- the gas path system passes the carrier gas and carbon source gas into the catalyst evaporation chamber and the chemical vapor deposition chamber respectively, so that The catalyst reacts with the high-temperature cracked organic carbon source to generate carbon nanotubes, which are then separated and collected through a gas-solid separation chamber.
- the structure of the carbon nanotube preparation device is as follows: the catalyst evaporation chamber, the chemical vapor deposition chamber and the gas-solid separation chamber are sealed and connected in sequence from left to right;
- An organic carbon source mixed gas inlet is provided at the junction of the catalyst evaporation chamber and the chemical vapor deposition chamber; the other end of the catalyst evaporation chamber is provided with a carrier gas inlet and a high temperature evaporation spray gun;
- the vacuum system is connected to the gas-solid separation chamber; the gas path system is connected to the organic carbon source mixed gas inlet and the carrier gas inlet respectively; the cooling system is arranged on the side wall of the chemical vapor deposition chamber, and the power supply system provides power supply.
- the catalyst evaporation chamber is a high-temperature physical evaporation method
- the high-temperature physical evaporation method is a high-temperature arc, a high-temperature radio frequency plasma or a high-temperature microwave plasma
- the catalyst evaporation chamber is a double-layer water-cooled stainless steel lined with a high-temperature heat insulation layer
- the shell is lined with a high temperature insulation layer made of porous ceramics, ceramic fiber felt, graphite or graphite felt.
- the chemical vapor deposition chamber is a quartz tube furnace.
- the separation method adopted in the gas-solid separation chamber is any one of centrifugal separation, cyclone separation and filtration separation.
- Another object of the present invention is to provide a process method for preparing carbon nanotubes by using the above-mentioned carbon nanotube preparation device.
- the method specifically includes the following steps:
- the catalyst in S1) is a metal catalyst, and the metal catalyst includes any one or more of iron, cobalt, and nickel; and the carrier gas is any one of nitrogen, argon, and helium.
- the temperature in S2) is 500-1500°C.
- the maximum temperature of the high-temperature evaporation spray gun in S3) is >2000°C, and the power is >10kW.
- the organic carbon source gas mixture in S4) includes organic carbon source gas, inert carrier gas and hydrogen; wherein the volume of the organic carbon source gas is 5-80%; the volume of hydrogen is 0.1-10%, and the rest It is an inert carrier gas.
- the organic carbon source gas is one or more of methane, ethane, ethylene, ethanol, and methanol.
- the carbon nanotube preparation device consists of a catalyst evaporation chamber, a chemical vapor deposition chamber, and a gas-solid separation chamber in series.
- the catalyst evaporation chamber is a high-temperature arc device with a power of 20kW.
- the outer layer is made of a double-layer water-cooled stainless steel shell lined with a graphite high-temperature heat insulation layer Composition;
- the chemical vapor deposition chamber is a quartz tube furnace;
- the gas-solid separation chamber is a cyclone separation device. With iron as the metal catalyst, the catalyst is first placed in the catalyst evaporation chamber, and after evacuating to remove air, the inert gas carrier gas helium is switched.
- the chemical vapor deposition chamber is heated to 1200° C., and then the high-temperature arc generated by the arc device is turned on to vaporize the iron atoms and the carrier gas helium gas is passed into the chemical vapor deposition chamber through the pipeline.
- the temperature of the chemical vapor deposition chamber is controlled at 1200°C, and the organic carbon source mixed gas is methane (45%), helium (50%) and hydrogen (5%), which are injected into the chemical vapor deposition chamber through the organic carbon source mixed gas inlet.
- the carbon source is catalytically cracked to grow carbon nanotubes at a high temperature, and the back end is connected to a cyclone separation device for gas-solid separation to achieve continuous preparation and collection, and the morphology of the carbon nanotube product scanned by an electron microscope is obtained (as shown in Figure 2).
- the carbon nanotube preparation device consists of a catalyst evaporation chamber, a chemical vapor deposition chamber and a gas-solid separation chamber in series.
- the catalyst evaporation chamber is a high-temperature radio frequency plasma with a power of 25kW.
- the outer layer is made of double-layer water-cooled stainless steel lined with a porous ceramic high-temperature insulation layer The shell is composed; the chemical vapor deposition chamber is a quartz tube furnace; the gas-solid separation chamber is a cyclone separation device. Using iron as the metal catalyst, first put the catalyst in the catalyst evaporation chamber, evacuating vacuum to remove air, then switch to inert gas carrier gas argon.
- the chemical vapor deposition chamber is heated to 1300°C, and then the high-temperature arc generated by the arc device is turned on to vaporize the iron atoms and then the carrier gas argon gas is passed into the chemical vapor deposition chamber through the pipeline.
- the temperature of the chemical vapor deposition chamber is controlled at 1300°C, and the organic carbon source mixed gas is ethylene (5%), argon (85%) and hydrogen (10%), which are injected into the chemical vapor deposition chamber through the organic carbon source mixed gas inlet.
- the carbon source is catalytically cracked to grow carbon nanotubes at high temperature, and the back end is connected to a cyclone separation device for gas-solid separation to achieve continuous preparation and collection, and the morphology of the carbon nanotube product through electron microscope scanning is obtained (as shown in Figure 3)
- the carbon nanotube preparation device consists of a catalyst evaporation chamber, a chemical vapor deposition chamber, and a gas-solid separation chamber in series.
- the catalyst evaporation chamber is a high-temperature microwave plasma with a power of 25kW.
- the outer layer is double-layer water-cooled with a ceramic fiber felt high-temperature insulation layer. It is composed of a stainless steel shell; the chemical vapor deposition chamber is a quartz tube furnace; the gas-solid separation chamber is a cyclone separation device. With iron as the metal catalyst, the catalyst is first placed in the catalyst evaporation chamber, and after evacuating to remove air, the inert gas carrier gas helium is switched.
- the chemical vapor deposition chamber is heated to 500° C., and then the high-temperature arc generated by the arc device is turned on to vaporize the iron atoms and pass the carrier gas helium into the chemical vapor deposition chamber through the pipeline.
- the temperature of the chemical vapor deposition chamber is controlled at 500°C, and the organic carbon source mixed gas is methanol (80%), nitrogen (15%) and hydrogen (5%), which are injected into the chemical vapor deposition chamber through the organic carbon source mixed gas inlet.
- the carbon source is catalytically cracked to grow carbon nanotubes under high temperature, and the back end is connected with a cyclone separation device for gas-solid separation to realize continuous preparation and collection.
- the carbon nanotube preparation device consists of a catalyst evaporation chamber, a chemical vapor deposition chamber, and a gas-solid separation chamber in series.
- the catalyst evaporation chamber is a high-temperature arc device with a power of 20kW.
- the outer layer is made of a double-layer water-cooled stainless steel shell lined with a graphite high-temperature heat insulation layer Composition;
- the chemical vapor deposition chamber is a quartz tube furnace;
- the gas-solid separation chamber is a cyclone separation device. With iron as the metal catalyst, the catalyst is first placed in the catalyst evaporation chamber, and after evacuating to remove air, the inert gas carrier gas helium is switched.
- the chemical vapor deposition chamber is heated to 1500° C., and then the high-temperature arc generated by the arc device is turned on to vaporize the iron atoms and the carrier gas helium is passed into the chemical vapor deposition chamber through the pipeline.
- the temperature of the chemical vapor deposition chamber is controlled at 1500°C, and the organic carbon source mixture is ethanol (45%), helium (54.9%) and hydrogen (0.1%), which are injected into the chemical vapor deposition chamber through the organic carbon source mixture inlet.
- the carbon source is catalytically cracked to grow carbon nanotubes under high temperature, and the back end is connected with a cyclone separation device for gas-solid separation to realize continuous preparation and collection.
- the carbon nanotube preparation device consists of a catalyst evaporation chamber, a chemical vapor deposition chamber and a gas-solid separation chamber in series.
- the catalyst evaporation chamber is a high-temperature arc device with a power of 20kW.
- the outer layer is made of a double-layer water-cooled stainless steel shell lined with a graphite high-temperature heat insulation layer Composition;
- the chemical vapor deposition chamber is a quartz tube furnace;
- the gas-solid separation chamber is a cyclone separation device.
- the chemical vapor deposition chamber is heated to 1200° C., and then the high-temperature arc generated by the arc device is turned on to vaporize the iron atoms and the carrier gas helium gas is passed into the chemical vapor deposition chamber through the pipeline.
- the temperature of the chemical vapor deposition chamber is controlled at 1200°C, and the organic carbon source mixture is ethane (45%), helium (45%) and hydrogen (5%), which are injected into the chemical vapor deposition chamber through the organic carbon source mixture inlet.
- the carbon source is catalytically cracked to grow carbon nanotubes under high temperature, and the back end is connected with a filter device for gas-solid separation to realize continuous preparation and collection.
- the carbon nanotube preparation device consists of a catalyst evaporation chamber, a chemical vapor deposition chamber and a gas-solid separation chamber in series.
- the catalyst evaporation chamber is a high-temperature arc device with a power of 50kW.
- the outer layer is made of a double-layer water-cooled stainless steel shell lined with a graphite high-temperature heat insulation layer Composition;
- the chemical vapor deposition chamber is a quartz tube furnace;
- the gas-solid separation chamber is a cyclone separation device.
- the chemical vapor deposition chamber is heated to 1200° C., and then the high-temperature arc generated by the arc device is turned on to vaporize the iron atoms and the carrier gas helium gas is passed into the chemical vapor deposition chamber through the pipeline.
- the temperature of the chemical vapor deposition chamber is controlled at 1200°C, and the organic carbon source mixture is methane (45%), helium (45%) and hydrogen (5%), which are injected into the chemical vapor deposition chamber through the organic carbon source mixture inlet.
- the carbon source is catalytically cracked to grow carbon nanotubes at high temperature, and the back end is connected with a cyclone separation device for gas-solid separation to realize continuous preparation and collection.
- the carbon nanotube preparation device consists of a catalyst evaporation chamber, a chemical vapor deposition chamber and a gas-solid separation chamber in series.
- the catalyst evaporation chamber is a high-temperature arc device with a power of 50kW.
- the outer layer is made of a double-layer water-cooled stainless steel shell lined with a graphite high-temperature heat insulation layer Composition;
- the chemical vapor deposition chamber is a quartz tube furnace;
- the gas-solid separation chamber is a cyclone separation device.
- iron and cobalt as metal catalysts, the catalyst is first placed in the catalyst evaporation chamber, and after vacuuming to remove air, the inert gas carrier gas helium is switched.
- the chemical vapor deposition chamber is heated to 1200°C, and then the high-temperature arc generated by the arc device is turned on to vaporize the iron atoms and the carrier gas helium is passed into the chemical vapor deposition chamber through the pipeline.
- the temperature of the chemical vapor deposition chamber is controlled at 1200°C, and the organic carbon source mixture is methane (45%), helium (45%) and hydrogen (5%), which are injected into the chemical vapor deposition chamber through the organic carbon source mixture inlet.
- the carbon source is catalytically cracked to grow carbon nanotubes under high temperature, and the back end is connected with a cyclone separation device for gas-solid separation to realize continuous preparation and collection.
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Abstract
Description
Claims (10)
- 一种碳纳米管制备装置,所述碳纳米管制备装置包括催化剂蒸发腔、化学气相沉积腔和气固分离腔,其特征在于,该装置将催化剂蒸发腔通过管道化学气相沉积腔密封连接,实现高温物理蒸发与化学气相沉积联用,使催化剂直接通过连接通道进入化学气相沉积腔,同时气路系统将载气和碳源气分别由催化剂蒸发腔和化学气相沉积腔通入,使催化剂与高温裂解的有机碳源发生反应,生成碳纳米管,进而通过气固分离腔分离收集。A carbon nanotube preparation device. The carbon nanotube preparation device includes a catalyst evaporation chamber, a chemical vapor deposition chamber, and a gas-solid separation chamber. The device is characterized in that the device seals the catalyst evaporation chamber through the pipeline chemical vapor deposition chamber to achieve high temperature. Physical evaporation and chemical vapor deposition are combined to make the catalyst directly enter the chemical vapor deposition chamber through the connecting channel. At the same time, the gas path system passes the carrier gas and carbon source gas into the catalyst vaporization chamber and the chemical vapor deposition chamber respectively to make the catalyst and high temperature cracking The organic carbon source reacts to produce carbon nanotubes, which are then separated and collected through the gas-solid separation chamber.
- 根据权利要求1所述的碳纳米管制备装置,其特征在于,所述的碳纳米管制备装置结构为:所述催化剂蒸发腔、化学气相沉积腔和气固分离腔从左到右依次密封连接;The carbon nanotube preparation device according to claim 1, wherein the structure of the carbon nanotube preparation device is: the catalyst evaporation chamber, the chemical vapor deposition chamber, and the gas-solid separation chamber are sealed and connected in sequence from left to right;所述催化剂蒸发腔和化学气相沉积腔的连接处设置有有机碳源混合气入口;所述催化剂蒸发腔另一端设有载气入口和高温蒸发喷枪;An organic carbon source mixed gas inlet is provided at the junction of the catalyst evaporation chamber and the chemical vapor deposition chamber; the other end of the catalyst evaporation chamber is provided with a carrier gas inlet and a high temperature evaporation spray gun;真空系统与所述气固分离腔连接;所述气路系统分别与所述有机碳源混合气入口和载气入口连接;冷却系统设置在所述化学气相沉积腔的侧壁上,电源系统提供电源。The vacuum system is connected to the gas-solid separation chamber; the gas path system is connected to the organic carbon source mixed gas inlet and the carrier gas inlet respectively; the cooling system is arranged on the side wall of the chemical vapor deposition chamber, and the power supply system provides power supply.
- 根据权利要求2所述的碳纳米管制备装置,其特征在于,所述催化剂蒸发腔为高温物理蒸发方式;所述高温物理蒸发方式为高温电弧、高温射频等离子体或高温微波等离子体;所述催化剂蒸发腔为内衬高温隔热层的双层水冷不锈钢壳体,内衬高温保温层为多孔陶瓷、陶瓷纤维毡、石墨或石墨毡。The carbon nanotube preparation device according to claim 2, wherein the catalyst evaporation chamber is a high-temperature physical evaporation method; the high-temperature physical evaporation method is a high-temperature arc, a high-temperature radio frequency plasma, or a high-temperature microwave plasma; The catalyst evaporation chamber is a double-layer water-cooled stainless steel shell lined with a high-temperature heat insulation layer, and the high-temperature heat insulation layer is lined with porous ceramics, ceramic fiber felt, graphite or graphite felt.
- 根据权利要求2所述的装置,其特征在于:所述化学气相沉积腔为石英管式炉;所述气固分离腔采用的分离方式为:离心分离、旋风分离和过滤分离方式的任意一种。The device according to claim 2, wherein the chemical vapor deposition chamber is a quartz tube furnace; the separation method used in the gas-solid separation chamber is any one of centrifugal separation, cyclone separation and filtration separation .
- 一种采用如权利要求1-4任意一项所述的碳纳米管制备装置制备碳纳米管的方法,其特征在于:所述方法具体包括以下步骤:A method for preparing carbon nanotubes by using the carbon nanotube preparation device according to any one of claims 1 to 4, wherein the method specifically includes the following steps:S1)将催化剂置于催化剂蒸发腔内,启动真空系统将催化剂蒸发腔内的空气排出后,启动气路系统切换通入惰性气体载气;S1) Put the catalyst in the catalyst evaporation chamber, start the vacuum system to exhaust the air in the catalyst evaporation chamber, start the gas path system to switch and pass the inert gas carrier gas;S2)开启化学气相沉积腔加热升温,将温度升至指定温度;S2) Turn on the chemical vapor deposition chamber to heat up and increase the temperature to the specified temperature;S3)随后开启高温蒸发喷枪将催化剂蒸发腔内的催化剂蒸发出来,通过管路连接随载气进入化学气相沉积腔;S3) Then turn on the high-temperature evaporation spray gun to evaporate the catalyst in the catalyst evaporation chamber, and enter the chemical vapor deposition chamber with the carrier gas through the pipeline connection;S4)接着在化学气相沉积腔中引入有机碳源气体混合气,生成的产物通过连 接管道,随载气进入气固分离腔,分离后获得最终产物。S4) Then, the organic carbon source gas mixture is introduced into the chemical vapor deposition chamber, and the resulting product enters the gas-solid separation chamber with the carrier gas through the connecting pipe, and the final product is obtained after separation.
- 根据权利要求5所述的方法,其特征在于:所述S1)中催化剂为金属催化剂,所述金属催化剂包括铁、钴、镍的任意一种或多种;所述载气是氮气、氩气和氦气的任意一种。The method according to claim 5, wherein the catalyst in S1) is a metal catalyst, and the metal catalyst includes any one or more of iron, cobalt, and nickel; and the carrier gas is nitrogen or argon. And helium.
- 根据权利要求5所述的方法,其特征在于:所述S2)中的温度为500-1500℃。The method according to claim 5, wherein the temperature in S2) is 500-1500°C.
- 根据权利要求5所述的方法,其特征在于:所述S3)中的高温蒸发喷枪最高温度>2000℃,功率>10kW。The method according to claim 5, characterized in that the highest temperature of the high-temperature evaporation spray gun in S3) is >2000°C and the power is >10kW.
- 根据权利要求5所述的方法,其特征在于:所述S4)中有机碳源气体混合气包括机碳源气体、惰性载气和氢气;其中,所述机碳源气体的体积为5-80%;氢气体积为0.1-10%,其余为惰性载气。The method according to claim 5, wherein the organic carbon source gas mixture in S4) includes organic carbon source gas, inert carrier gas and hydrogen; wherein the volume of the organic carbon source gas is 5-80 %; The volume of hydrogen is 0.1-10%, and the rest is inert carrier gas.
- 根据权利要求9所述的方法,其特征在于:所述有机碳源气体为甲烷、乙烷、乙烯、乙醇、甲醇中的一种或多种。The method according to claim 9, wherein the organic carbon source gas is one or more of methane, ethane, ethylene, ethanol, and methanol.
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