WO2020251030A1 - Device sealing adhesive sheet - Google Patents

Device sealing adhesive sheet Download PDF

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Publication number
WO2020251030A1
WO2020251030A1 PCT/JP2020/023259 JP2020023259W WO2020251030A1 WO 2020251030 A1 WO2020251030 A1 WO 2020251030A1 JP 2020023259 W JP2020023259 W JP 2020023259W WO 2020251030 A1 WO2020251030 A1 WO 2020251030A1
Authority
WO
WIPO (PCT)
Prior art keywords
adhesive layer
adhesive sheet
release film
adhesive
cyclic ether
Prior art date
Application number
PCT/JP2020/023259
Other languages
French (fr)
Japanese (ja)
Inventor
健太 西嶋
樹 長谷川
Original Assignee
リンテック株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/JP2019/023655 external-priority patent/WO2019240261A1/en
Application filed by リンテック株式会社 filed Critical リンテック株式会社
Priority to JP2021526163A priority Critical patent/JPWO2020251030A1/ja
Priority to KR1020217039393A priority patent/KR20220021923A/en
Priority to CN202080043523.8A priority patent/CN113993958B/en
Publication of WO2020251030A1 publication Critical patent/WO2020251030A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/10Adhesives in the form of films or foils without carriers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/35Heat-activated
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/844Encapsulations

Definitions

  • the present invention relates to an adhesive sheet for device encapsulation, which has an adhesive layer and a release film having excellent adhesiveness at room temperature (referred to as 23 ° C., the same applies hereinafter) and has excellent release property of the release film.
  • an organic EL element has attracted attention as a light emitting element capable of high-luminance light emission by low-voltage direct current drive.
  • the organic EL element has a problem that the light emitting characteristics such as the light emitting brightness, the light emitting efficiency, and the light emitting uniformity tend to deteriorate with the passage of time. It is considered that oxygen, water, etc. infiltrate into the inside of the organic EL element and deteriorate the electrode and the organic layer as a cause of the problem of deterioration of the light emitting characteristics. Therefore, it has been proposed to form a sealing material by using an adhesive layer or an adhesive layer having excellent moisture blocking properties to solve this problem.
  • Patent Document 1 describes a sheet-like sealing material containing a specific epoxy resin, a specific alicyclic epoxy compound, a thermal cationic polymerization initiator, a photocationic polymerization initiator, and a specific sensitizer. ing.
  • the sealing material formed by using the sheet-shaped sealing material described in Patent Document 1 has low oxygen permeability and water permeability, and has good sealing performance.
  • a sheet-shaped sealing material utilizing the reactivity of a cyclic ether group has been suitably used as a material for forming a sealing material.
  • some of such sheet-shaped sealing materials are inferior in stickability at room temperature, and some of them need to be heated to soften the surface when sticking to the object to be sealed.
  • some of the sheet-shaped sealing materials having good stickability at room temperature were inferior in workability at the time of sticking. That is, when the sheet-shaped sealing material (hereinafter, sometimes referred to as "adhesive layer”) sandwiched between the two release films is cut into a predetermined shape, the adhesive layer is deformed by pushing the punching blade. In some cases, the release film could not be peeled off efficiently because the adhesive adhered to the unpeeled portion (cut surface) of the end portion of the release film.
  • the present invention has been made in view of the above circumstances, and provides an adhesive sheet for device encapsulation, which has an adhesive layer having excellent adhesiveness at room temperature and a release film, and has excellent releaseability of the release film. With the goal.
  • the present inventors have two release films and an adhesive layer sandwiched between these release films, and the adhesive layer contains a compound having a cyclic ether group.
  • the adhesive sheet with the film has excellent peelability of the release film.
  • the present invention has been completed.
  • An adhesive sheet for device encapsulation having a first release film and a second release film and an adhesive layer sandwiched between the first release film and the second release film, and the following requirement (I). And an adhesive sheet for device encapsulation that meets requirement (II).
  • Requirement (II): The storage elastic modulus of the adhesive layer at 23 ° C. is 9.5 ⁇ 10 5 Pa or more and 3.0 ⁇ 10 7 Pa or less.
  • the adhesive layer contains a binder resin, and at least one of the binder resins is a binder resin having a glass transition temperature (Tg) of 60 ° C. or higher.
  • Adhesive sheet for device encapsulation according to any one.
  • the device sealing adhesive sheet according to any one of [1] to [10], which is used for forming a sealing material in an optical device.
  • an adhesive sheet for device encapsulation which has an adhesive layer and a release film having excellent adhesiveness at room temperature and has excellent release property of the release film.
  • the device-sealing adhesive sheet of the present invention is a device-sealing adhesive sheet having a first release film and a second release film and an adhesive layer sandwiched between the first release film and the second release film. Therefore, the above requirements (I) and (II) are satisfied.
  • the "first release film” refers to a release film that is peeled off after the "second release film” when the adhesive sheet for device encapsulation is used
  • the “second release film” refers to the device encapsulation.
  • a release film that is peeled off first when the adhesive sheet for use is used. Therefore, when the peeling forces of the two release films are different, the “first release film” usually refers to the one having the highest release force among the two release films, and the “second release film” is two sheets.
  • the “adhesive layer” is a coating film of a curable adhesive, and is a layer having curability and adhesiveness.
  • the "adhesive layer” is a layer in an uncured state.
  • the "layer obtained by curing the adhesive layer” may be referred to as an "adhesive cured product layer”.
  • This adhesive cured product layer is used as a sealing material.
  • curing means that the cyclic ether groups contained in the adhesive layer react with each other to increase the cohesive force and storage elastic modulus of the layer.
  • the adhesive layer contains one or more compounds having a cyclic ether group (hereinafter, may be referred to as "cyclic ether compound (A)").
  • cyclic ether compound (A) By curing the adhesive layer containing the cyclic ether compound (A), it is possible to form a sealing material having high adhesive strength and excellent water vapor blocking property.
  • the cyclic ether compound (A) refers to a compound having at least one, preferably two or more cyclic ether groups in the molecule.
  • the phenoxy resin described later is not included in the cyclic ether compound (A).
  • the molecular weight of the cyclic ether compound (A) is usually 100 to 5,000, preferably 200 to 3,000.
  • the cyclic ether equivalent of the cyclic ether compound (A) is preferably 50 to 1000 g / eq, more preferably 100 to 800 g / eq.
  • the cyclic ether group examples include an oxylan group (epoxy group), an oxetane group (oxetanyl group), a tetrahydrofuryl group, a tetrahydropyranyl group and the like.
  • the cyclic ether group is preferably an oxylan group or an oxetane group, and more preferably an oxylan group, from the viewpoint of being able to form a sealing material having higher adhesive strength.
  • the cyclic ether compound (A) preferably has two or more oxylan groups or oxetane groups in the molecule, and more preferably has two or more oxylan groups in the molecule.
  • Examples of the compound having an oxylan group in the molecule include an aliphatic epoxy compound (excluding an alicyclic epoxy compound), an aromatic epoxy compound, and an alicyclic epoxy compound.
  • Examples of the aliphatic epoxy compound include monofunctional epoxy compounds such as glycidyl etherified products of aliphatic alcohols and glycidyl esters of alkylcarboxylic acids; Examples thereof include polyglycidyl etherified products of aliphatic polyhydric alcohols or alkylene oxide adducts thereof, and polyfunctional epoxy compounds such as polyglycidyl esters of aliphatic long-chain polybasic acids.
  • Representative compounds of these aliphatic epoxy compounds include alkenyl glycidyl ethers such as allyl glycidyl ethers; alkyl glycidyl ethers such as butyl glycidyl ethers, 2-ethylhexyl glycidyl ethers, and C12-13 mixed alkyl glycidyl ethers; 1,4- Butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, triglycidyl ether of glycerin, triglycidyl ether of trimethylolpropane, tetraglycidyl ether of sorbitol, hexaglycidyl ether of dipentaerythritol, diglycidyl ether of polyethylene glycol, polypropylene glycol Glycidyl ethers of polyhydric alcohols such as diglycidyl ethers
  • Polyglycidyl ethers diglycidyl esters of aliphatic long-chain dibasic acids; monoglycidyl ethers of aliphatic higher alcohols, glycidyl esters of higher fatty acids, epoxidized soybean oil, octyl epoxidate stearate, butyl epoxy stearate, epoxidized polybutadiene; And so on.
  • a commercially available product can also be used as the aliphatic epoxy compound.
  • Commercially available products include Denacol EX-121, Denacol EX-171, Denacol EX-192, Denacol EX-211, Denacol EX-212, Denacol EX-313, Denacol EX-314, Denacol EX-321, Denacol EX-411, Denacol EX-421, Denacol EX-512, Denacol EX-521, Denacol EX-611, Denacol EX-612, Denacol EX-614, Denacol EX-622, Denacol EX-810, Denacol EX-811, Denacol EX-850, Denacol EX-851, Denacol EX-821, Denacol EX-830, Denacol EX-832, Denacol EX-841, Denacol EX-861, Denacol EX-911, Denacol EX-941, Denacol EX-920, Denacol EX-9
  • aromatic epoxy compound examples include phenols having at least one aromatic ring such as phenol, cresol, and butylphenol, or a mono / polyglycidyl etherified product of an alkylene oxide adduct thereof; an epoxy compound having an aromatic heterocycle; and the like. Can be mentioned.
  • Typical compounds of these aromatic epoxy compounds include bisphenol A, bisphenol F, or glycidyl etherified compounds or epoxy novolac resins obtained by further adding alkylene oxide to these compounds; Mono / polyglycidyl etherified compounds of aromatic compounds with two or more phenolic hydroxyl groups such as resorcinol, hydroquinone, catechol; A glycidyl etherified product of an aromatic compound having two or more alcoholic hydroxyl groups such as phenyldimethanol, phenyldiethanol, and phenyldibutanol; Glysidyl ester of a polybasic acid aromatic compound having two or more carboxylic acids such as phthalic acid, terephthalic acid and trimellitic acid, glycidyl ester of benzoic acid, styrene oxide or epoxidized product of divinylbenzene; Epoxy compounds having a triazine skeleton such as 2,4,6-tri (glycidyloxy
  • a commercially available product can also be used as the aromatic epoxy compound.
  • Commercially available products include Denacol EX-146, Denacol EX-147, Denacol EX-201, Denacol EX-203, Denacol EX-711, Denacol EX-721, On-Coat EX-1020, On-Coat EX-1030, On-Coat EX.
  • On-Coat EX-1050, On-Coat EX-1051, On-Coat EX-1010, On-Coat EX-1011, On-Coat 1012 (all manufactured by Nagase ChemteX); Ogsol PG-100, Ogsol EG-200, Ogsol EG-210, Ogsol EG-250 (all manufactured by Osaka Gas Chemical Co., Ltd.); HP4032, HP4032D, HP4700 (all manufactured by DIC Corporation); ESN-475V (above, manufactured by Nippon Steel & Sumikin Co., Ltd.); jER YX8800 (above, manufactured by Mitsubishi Chemical Corporation); Maproof G-0105SA, Maproof G-0130SP (all manufactured by NOF CORPORATION); Epicron N-665, Epicron HP-7200 (all manufactured by DIC Corporation); EOCN-1020, EOCN-102S, EOCN-103S, EOCN-104S, XD-1000, NC-3000, EPPN-501H
  • the alicyclic epoxy compound includes a polyglycidyl etherified product of a polyhydric alcohol having at least one alicyclic structure, or cyclohexene oxide or cyclopentene obtained by epoxidizing a cyclohexene or cyclopentene ring-containing compound with an oxidizing agent. Examples include oxide-containing compounds. Typical compounds of these alicyclic epoxy compounds are hydrogenated bisphenol A diglycidyl ether, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, and 3,4-epoxy-1-methylcyclohexyl.
  • a commercially available product can also be used as the alicyclic epoxy compound.
  • Commercially available products include celoxide 2021P, celoxide 2081, celoxide 2000, celoxide 3000 (above, manufactured by Daicel); Epolite 4000 (manufactured by Kyoeisha Chemical Co., Ltd.); jER YX8000, jER YX8034 (above, manufactured by Mitsubishi Chemical Corporation); ADEKA REGIN EP- 4088S, Adeka Resin EP-4088L, Adeka Resin EP-4080E (all manufactured by ADEKA Corporation); and the like.
  • an epoxy compound having both an alicyclic structure and an aromatic ring in one molecule can be mentioned.
  • examples of such a compound include Epicron HP-7200 (manufactured by DIC Corporation).
  • an alicyclic epoxy resin is preferable as the compound having an oxylan group from the viewpoint of lowering the dielectric constant of the cured adhesive layer and easily forming the cured adhesive layer having excellent colorless transparency.
  • the adhesive layer contains a cationic polymerization initiator
  • the alicyclic epoxy resin is preferable from the viewpoint of avoiding excessively slow progress of the cationic polymerization because the reactivity of the cationic polymerization is high.
  • the compound having an oxylan group is preferably a compound having a glycidyl ether group. Cationic polymerization reactions involving glycidyl ether groups tend to proceed relatively gently.
  • the manufacturing process of the adhesive layer includes a step of heating the composition containing the components constituting the adhesive layer (for example, a step of heating to 90 ° C. or higher), the polymerization reaction of the glycidyl ether group is difficult to proceed. , It is easy to keep the storage elastic modulus of the adhesive layer low at 23 ° C.
  • the content of the compound having a glycidyl ether group is preferably 70% by mass or more, and preferably 90% by mass or more, based on the whole compound having a cyclic ether group. Further, when the content of the compound having a glycidyl ether group is 90% by mass or more with respect to the entire compound having a cyclic ether group, the storage stability of the adhesive layer can be improved.
  • Compounds having an oxetane group in the molecule include 3,7-bis (3-oxetanyl) -5-oxa-nonane, 1,4-bis [(3-ethyl-3-oxetanylmethoxy) methyl] benzene, 1, 2-Bis [(3-ethyl-3-oxetanylmethoxy) methyl] ethane, 1,3-bis [(3-ethyl-3-oxetanylmethoxy) methyl] propane, ethylene glycol bis (3-ethyl-3-oxetanylmethyl) ) Ether, triethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, tetraethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, 1,4-bis (3-ethyl-3-oxetanylmethoxy) Bifunctional aliphatic oxetane compounds such as butane
  • a commercially available product can also be used.
  • Commercially available products include 2-hydroxyethyl vinyl ether, diethylene glycol monovinyl ether, and 4-hydroxybutyl vinyl ether (manufactured by Maruzen Petrochemical Co., Ltd.); Aron Oxetane OXT-121, OXT-221, EXOH, POX, OXA, OXT-101, OXT-221, OXT-212 (all manufactured by Toagosei); Etanacol OXBP, OXTP (above, manufactured by Ube Industries, Ltd.); and the like.
  • cyclic ether compounds (A) can be used alone or in combination of two or more.
  • the content of the cyclic ether compound (A) in the adhesive layer (the total amount thereof when two or more kinds of cyclic ether compounds (A) are contained) is preferably 53 to 80 mass by mass with respect to the entire adhesive layer. %, More preferably 57 to 75% by mass.
  • At least one of the cyclic ether compounds (A) in the adhesive layer is preferably a compound (cyclic ether compound (AL)) that is liquid at 25 ° C.
  • the liquid is one of the aggregated states of substances, which has a substantially constant volume but does not have a unique shape.
  • the cyclic ether compound (AL) preferably has a viscosity of 2 to 10000 mPa ⁇ s measured at 25 ° C. and 1.0 rpm using an E-type viscometer.
  • the cyclic ether equivalent of the cyclic ether compound (AL) is preferably 150 to 1000 g / eq, more preferably 240 to 900 g / eq.
  • the content of the cyclic ether compound (AL) in the adhesive layer (the total amount thereof when two or more compounds are contained) is preferably 53% by mass or more, more preferably 57, based on the entire adhesive layer. It is mass% or more.
  • the content of the cyclic ether compound (AL) is 53% by mass or more with respect to the entire adhesive layer, it becomes easy to obtain an adhesive layer having sufficient adhesive strength at room temperature and excellent adhesiveness.
  • a cured adhesive layer having a high storage elastic modulus at 90 ° C. can be easily obtained.
  • the content of the cyclic ether compound (AL) in the adhesive layer (the total amount thereof when two or more compounds are contained) is preferably 70% by mass or less, more preferably 68, based on the entire adhesive layer. It is less than mass%.
  • the content of the cyclic ether compound (AL) is 70% by mass or less with respect to the entire adhesive layer, it becomes easy to obtain an adhesive sheet for device encapsulation having excellent peelability of the release film.
  • the adhesive layer may contain a binder resin (B).
  • the adhesive layer containing the binder resin (B) has excellent shape retention and handleability.
  • the weight average molecular weight (Mw) of the binder resin (B) is not particularly limited, but is preferably 10,000 or more, more preferably 10,000 or more because it is excellent in compatibility with the cyclic ether compound (A) and also excellent in shape retention. Is 10,000 to 150,000, more preferably 10,000 to 100,000.
  • the weight average molecular weight (Mw) of the binder resin (B) can be determined as a standard polystyrene-equivalent value by performing gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
  • the content of the binder resin (B) (when two or more kinds of binder resins (B) are contained, the total amount of these) is applied to the entire adhesive layer.
  • It is preferably 20 to 46% by mass, and more preferably 23 to 44% by mass.
  • the content of the binder resin (B) is within the above range, it becomes easy to obtain an adhesive layer having excellent shape retention and sufficient adhesive strength.
  • a resin having a glass transition temperature (Tg) of 60 ° C. or higher is preferable, a resin having a glass transition temperature (Tg) of 90 ° C. or higher is more preferable, and a resin having a glass transition temperature (Tg) of 110 ° C. or higher is further preferable.
  • glass transition temperature (Tg) used 60 ° C. or more resins it is easy to storage modulus at 90 ° C. of the cured adhesive layer to more than 1 ⁇ 10 8 Pa. Further, since the glass transition temperature (Tg) of the binder resin (B) is 90 ° C. or higher, the storage elastic modulus of the adhesive layer at 23 ° C.
  • the glass transition temperature (Tg) of the binder resin (B) can be measured according to JIS K 7121 using a differential scanning calorimeter.
  • binder resin (B) examples include phenoxy resin, polyimide resin, polyamide-imide resin, polyvinyl butyral resin, polycarbonate resin, acrylic resin, urethane resin, modified olefin resin and the like. These resins can be used alone or in combination of two or more.
  • the binder resin (B) is preferably at least one selected from the group consisting of phenoxy-based resins and modified olefin-based resins, and is phenoxy-based from the viewpoint of increasing the storage elastic modulus of the cured adhesive layer at 90 ° C. It is preferably a resin.
  • the phenoxy resin generally corresponds to a high molecular weight epoxy resin and has a degree of polymerization of about 100 or more.
  • the phenoxy resin preferably has a weight average molecular weight (Mw) of 10,000 to 150,000, and more preferably 10,000 to 100,000.
  • the weight average molecular weight (Mw) of the phenoxy resin can be determined as a standard polystyrene-equivalent value by performing gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
  • GPC gel permeation chromatography
  • THF tetrahydrofuran
  • the phenoxy-based resin corresponding to such a high molecular weight epoxy resin has excellent heat-resistant deformability.
  • the epoxy equivalent of the phenoxy resin is preferably 5,000 or more, more preferably 7,000 or more.
  • the epoxy equivalent of the phenoxy resin can be measured according to JIS K7236.
  • phenoxy resins include bisphenol A type, bisphenol F type, bisphenol S type phenoxy resin, bisphenol A type and bisphenol F type copolymer type phenoxy resin, distilled products thereof, naphthalene type phenoxy resin, novolac type phenoxy resin, and biphenyl type. Examples thereof include phenoxy resin and cyclopentadiene type phenoxy resin. These phenoxy resins can be used alone or in combination of two or more.
  • the phenoxy resin can be obtained by a method of reacting a bifunctional phenol and epihalohydrin to a high molecular weight, or by a double addition reaction of a bifunctional epoxy resin and a bifunctional phenol.
  • a bifunctional epoxy resin and a bifunctional phenol can be obtained by reacting bifunctional phenols and epihalohydrin in the presence of an alkali metal hydroxide in an inert solvent at a temperature of 40 to 120 ° C.
  • the bifunctional epoxy resin and the bifunctional phenols are mixed with an amide solvent or an ether solvent having a boiling point of 120 ° C. or higher in the presence of a catalyst such as an alkali metal compound, an organic phosphorus compound or a cyclic amine compound.
  • It can also be obtained by performing a heavy addition reaction by heating to 50 to 200 ° C. with a reaction solid content concentration of 50% by weight or less in an organic solvent such as a ketone solvent, a lactone solvent, or an alcohol solvent.
  • the bifunctional phenols are not particularly limited as long as they are compounds having two phenolic hydroxyl groups.
  • monocyclic bifunctional phenols such as hydroquinone, 2-bromohydroquinone, resorcinol, catechol; bisphenols such as bisphenol A, bisphenol F, bisphenol AD, bisphenol S; dihydroxybiphenyls such as 4,4'-dihydroxybiphenyl; Dihydroxyphenyl ethers such as bis (4-hydroxyphenyl) ethers; and linear alkyl groups, branched alkyl groups, aryl groups, methylol groups, allyl groups, cyclic aliphatic groups, halogens (aryl groups) on the aromatic rings of these phenol skeletons.
  • Tetrabromobisphenol A, etc. Tetrabromobisphenol A, etc.), nitro group, etc. introduced; linear alkyl group, branched alkyl group, allyl group, allyl group with substituent, cyclic aliphatic group in the carbon atom in the center of these bisphenol skeletons Polycyclic bifunctional phenols into which a group, an alkoxycarbonyl group, etc. have been introduced; and the like can be mentioned.
  • epichlorohydrin examples include epichlorohydrin, epibrom hydrin, and epiiodohydrin.
  • a commercially available product can also be used as the phenoxy resin.
  • trade names manufactured by Mitsubishi Chemical Co., Ltd . YX7200 (glass transition temperature: 150 ° C.), YX6954 (bisphenol acetophenone skeleton-containing phenoxy resin, glass transition temperature: 130 ° C.), YL7553, YL6794, YL7213, YL7290, YL7482, YX8100 (bisphenol).
  • S skeleton-containing phenoxy resin S skeleton-containing phenoxy resin
  • Toto Kasei Co., Ltd. trade names: FX280, FX293, FX293S (fluorene skeleton-containing phenoxy resin), Mitsubishi Chemical Co., Ltd.
  • jER1256, jER4250 glass transition temperature: less than 85 ° C
  • jER4275 Glass transition temperature: 75 ° C
  • Examples thereof include bisphenol A skeleton / bisphenol F skeleton copolymer phenoxy resin, glass transition temperature: less than 85 ° C., ZX-1356-2 (glass transition temperature: 72 ° C.), and the like. For those for which the glass transition temperature is known, the glass transition temperature is shown.
  • the modified olefin resin is an olefin resin having a functional group introduced, which is obtained by subjecting an olefin resin as a precursor to a modification treatment using a modifier.
  • the olefin resin refers to a polymer containing a repeating unit derived from an olefin monomer.
  • the olefin-based resin may be a polymer consisting of only repeating units derived from the olefin-based monomer, or the repeating units derived from the olefin-based monomer and a monomer copolymerizable with the olefin-based monomer. It may be a polymer composed of a repeating unit of origin.
  • olefin-based monomer ⁇ -olefin having 2 to 8 carbon atoms is preferable, ethylene, propylene, 1-butene, isobutylene, or 1-hexene is more preferable, and ethylene or propylene is further preferable.
  • These olefin-based monomers may be used alone or in combination of two or more.
  • the monomer copolymerizable with the olefin-based monomer include vinyl acetate, (meth) acrylic acid ester, and styrene.
  • (meth) acrylic acid means acrylic acid or methacrylic acid (the same shall apply hereinafter).
  • monomer copolymerizable with these olefin-based monomers one type can be used alone, or two or more types can be used in combination.
  • the olefin resin examples include ultra-low density polyethylene (VLDPE), low density polyethylene (LDPE), medium density polyethylene (MDPE), high density polyethylene (HDPE), linear low density polyethylene, polypropylene (PP), and ethylene-propylene.
  • VLDPE ultra-low density polyethylene
  • LDPE low density polyethylene
  • MDPE medium density polyethylene
  • HDPE high density polyethylene
  • PP polypropylene
  • ethylene-propylene examples include copolymers, olefin-based elastomers (TPO), ethylene-vinyl acetate copolymers (EVA), ethylene- (meth) acrylic acid copolymers, and ethylene- (meth) acrylic acid ester copolymers.
  • the modifier used for the modification treatment of the olefin resin is a compound having a functional group in the molecule.
  • Functional groups include carboxyl group, carboxylic acid anhydride group, carboxylic acid ester group, hydroxyl group, epoxy group, amide group, ammonium group, nitrile group, amino group, imide group, isocyanate group, acetyl group, thiol group and ether group. , Thioether group, sulfone group, phosphone group, nitro group, urethane group, alkoxysilyl group, silanol group, halogen atom and the like.
  • the compound having a functional group may have two or more kinds of functional groups in the molecule.
  • the weight average molecular weight (Mw) of the modified olefin resin is preferably 10,000 to 150,000, more preferably 30,000 to 100,000.
  • the weight average molecular weight (Mw) of the modified olefin resin can be determined as a standard polystyrene-equivalent value by performing gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
  • an acid modified olefin resin is preferable.
  • the acid-modified olefin-based resin refers to an olefin-based resin graft-modified with an acid or an acid anhydride.
  • an unsaturated carboxylic acid or an unsaturated carboxylic acid anhydride hereinafter, may be referred to as "unsaturated carboxylic acid”
  • an olefin resin is reacted with an olefin resin to introduce a carboxyl group or a carboxylic acid anhydride group (graft). Denatured).
  • the amount of unsaturated carboxylic acid or the like to be reacted with the olefin resin is preferably 0.1 to 5 parts by mass, more preferably 0.2 to 3 parts by mass, and further preferably 0 with respect to 100 parts by mass of the olefin resin. .2 to 1 part by mass.
  • the method for introducing the unsaturated carboxylic acid unit or the unsaturated carboxylic acid anhydride unit into the olefin resin is not particularly limited.
  • a radical generator such as an organic peroxide or an azonitrile, or an olefin.
  • the unsaturated carboxylic acid or the like is graft-copolymerized with the olefin resin by a method of heating, stirring and reacting in the presence of a radical generator.
  • the method can be mentioned.
  • a commercially available product can also be used as the acid-modified olefin resin.
  • Examples of commercially available products include Admer (registered trademark) (Mitsui Chemicals), Unistor (registered trademark) (Mitsui Chemicals), BondyRam (Polyram), orevac (registered trademark) (ARKEMA), and the like.
  • Modic registered trademark (manufactured by Mitsubishi Chemical Corporation) and the like can be mentioned.
  • the adhesive layer may contain a curing agent.
  • the curing agent is not particularly limited as long as it initiates the curing reaction, but from the viewpoint that it may be difficult or should be avoided to cure the adhesive layer with energy rays such as ultraviolet rays. From the viewpoint that it is not necessary to introduce an energy ray irradiation device, a device that starts the curing reaction by heating is preferably used.
  • the curing agent include a thermal cationic polymerization initiator and other curing agents.
  • curing agent other than the thermal cationic polymerization initiator examples include tertiary amines such as benzylmethylamine and 2,4,6-trisdimethylaminomethylphenol; 2-methylimidazole, 2-ethyl-4-methylimidazole, and 2-hepta.
  • tertiary amines such as benzylmethylamine and 2,4,6-trisdimethylaminomethylphenol
  • 2-methylimidazole 2-ethyl-4-methylimidazole
  • 2-hepta examples include imidazole compounds such as decylimidazole; Lewis acids such as boron trifluoride / monoethylamine complex and boron trifluoride / piperazine complex;
  • the curing agent one type can be used alone, or two or more types can be used in combination.
  • the content of the curing agent is not particularly limited, but is preferably 0.1 to 15 parts by mass, more preferably 1 to 1 to 100 parts by mass with respect to 100 parts by mass of the cyclic ether compound (A). It is 10 parts by mass, more preferably 1 to 5 parts by mass.
  • the adhesive layer preferably contains a thermal cationic polymerization initiator as at least one of the curing agents.
  • a thermal cationic polymerization initiator By using the thermal cationic polymerization initiator, the curability of the adhesive layer can be controlled more accurately.
  • the thermal cationic polymerization initiator is a compound capable of generating a cationic species that initiates polymerization by heating.
  • Examples of the thermal cationic polymerization initiator include sulnifoam salt, quaternary ammonium salt, phosphonium salt, diazonium salt, iodonium salt and the like.
  • sulfonium salt examples include triphenylsulfonium tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, triphenylsulfonium hexafluoroalcinate, tris (4-methoxyphenyl) sulfonium hexafluoroalcinate, and diphenyl (4-phenylthiophenyl) sulfonium.
  • Hexafluoroalcinate (4-acetoxyphenyl) methyl (2-methylbenzyl) sulfonium tetrakis (pentafluorophenyl) borate, (4-hydroxyphenyl) methyl (4-methylbenzyl) sulfonium tetrakis (pentafluorophenyl) borate, ( Examples thereof include 4-acetoxyphenyl) benzyl (methyl) sulfonium tetrakis (pentafluorophenyl) borate, benzyl (4-hydroxyphenyl) (methyl) sulfonium tetrakis (pentafluorophenyl) borate and the like.
  • a commercially available product can also be used as the sulfonium salt.
  • Commercially available products include Adeca Opton SP-150, Adeka Opton SP-170, Adeka Opton CP-66, Adeka Opton CP-77 (all manufactured by Asahi Denka Co., Ltd.), Sun Aid SI-60L, Sun Aid SI-80L, Sun Aid SI-100L, Sun Aid SI.
  • Examples of the quaternary ammonium salt include tetrabutylammonium tetrafluoroborate, tetrabutylammonium hexafluorophosphate, tetrabutylammonium hydrogen sulfate, tetraethylammonium tetrafluoroborate, tetraethylammonium p-toluenesulfonate, N, N-dimethyl-N-.
  • Benzylanilinium Hexafluoroammonate N, N-dimethyl-N-benzylanilinium tetrafluoroborate, N, N-dimethyl-N-benzylpyridinium hexafluoroantimonate, N, N-diethyl-N-benzyltrifluoromethanesulfonate , N, N-Dimethyl-N- (4-methoxybenzyl) pyridinium hexafluoroammonate, N, N-diethyl-N- (4-methoxybenzyl) toluidinium hexafluoroammonate and the like.
  • Examples of the phosphonium salt include ethyltriphenylphosphonium hexafluoroantimonate and tetrabutylphosphonium hexafluoroantimonate.
  • diazonium salt examples include AMERICURE (manufactured by American Can) and ULTRASET (manufactured by Asahi Denka Co., Ltd.).
  • iodonium salt examples include diphenyl iodonium hexafluoroalcinate, bis (4-chlorophenyl) iodonium hexafluoroalcinate, bis (4-bromophenyl) iodonium hexafluoroalcinate, and phenyl (4-methoxyphenyl) iodonium hexafluoroalcinate. Can be mentioned.
  • UV-9310C manufactured by Toshiba Silicone
  • Photoinitiator 2074 manufactured by Rhone-Poulenc
  • UVE series products manufactured by General Electric
  • FC series products Minnesota Mining and Manufacturing
  • the thermal cationic polymerization initiator can be used alone or in combination of two or more.
  • the adhesive sheet for device encapsulation of the present invention it is preferable that all of the curing agents contained in the adhesive layer are thermal cationic polymerization initiators. If a curing agent other than the thermal cationic polymerization initiator is used, the adhesive layer may be colored or the transparency of the adhesive layer may be lowered. On the other hand, when a thermal cationic polymerization initiator is used, such a problem is unlikely to occur. Therefore, since all the curing agents contained in the adhesive layer are thermal cationic polymerization initiators, an adhesive layer having excellent colorless transparency can be obtained. It can be formed efficiently.
  • the adhesive layer may contain a silane coupling agent.
  • silane coupling agent By curing the adhesive layer containing the silane coupling agent, it is possible to form a sealing material having better moist heat durability.
  • silane coupling agent a known silane coupling agent can be used. Of these, an organosilicon compound having at least one alkoxysilyl group in the molecule is preferable.
  • silane coupling agent examples include 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane, and 3-acryloxypropyltri.
  • a silane coupling agent having a vinyl group such as vinyltrimethoxysilane, vinyltriethoxysilane, dimethoxymethylvinylsilane, diethoxymethylvinylsilane, trichlorovinylsilane, vinyltris (2-methoxyethoxy) silane, and 7-octenyltrimethoxysilane; 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, 8-glycid A silane coupling agent having an epoxy group such as xioctyltrimethoxysilane;
  • a long-chain spacer type silane coupling agent having a linear alkyl group having 6 or more carbon atoms examples include 8-methacryloxyoctyltrimethoxysilane, 7-octenyltrimethoxysilane, 8-glycidoxyoctyltrimethoxysilane, and N.
  • silane coupling agents may be used alone or in combination of two or more.
  • the content of the silane coupling agent is preferably 0.01 to 5% by mass, more preferably 0.05 to 1% by mass in the entire adhesive layer. ..
  • the adhesive layer may contain other components as long as the effects of the present invention are not impaired.
  • other components include additives such as ultraviolet absorbers, antistatic agents, light stabilizers, antioxidants, resin stabilizers, fillers, pigments, bulking agents, softeners, and tackifiers. These can be used alone or in combination of two or more. When the adhesive layer contains these additives, the content thereof can be appropriately determined according to the purpose.
  • the shape, size, etc. of the adhesive layer are not particularly limited. Further, it may be a strip-shaped one or a long one.
  • the "long shape” means a shape having a length of 5 times or more with respect to the width, preferably having a length of 10 times or more, and specifically being wound in a roll shape.
  • the upper limit of the ratio of the length to the width of the film is not particularly limited, but may be, for example, 100,000 times or less.
  • the thickness of the adhesive layer is usually 1 to 50 ⁇ m, preferably 1 to 25 ⁇ m, and more preferably 5 to 25 ⁇ m.
  • An adhesive layer having a thickness within the above range is suitably used as a material for forming a sealing material.
  • the thickness of the adhesive layer can be measured according to JIS K 7130 (1999) using a known thickness meter.
  • the adhesive layer may have a single-layer structure or may have a multi-layer structure (a plurality of adhesive layers are laminated).
  • the adhesive layer may have a uniform component or a non-uniform component (for example, in the above-mentioned adhesive layer having a multi-layer structure, both components are mixed at the interface between the two adhesive layers. , It may have a single-layer structure in appearance).
  • the storage elastic modulus of the adhesive layer at 23 ° C. is 9.5 ⁇ 10 5 Pa or more and 3.0 ⁇ 10 7 Pa or less, preferably 9.9 ⁇ 10 5 Pa or more and 2.0 ⁇ 10 7 Pa or less. is there. Further, since it is possible to reduce the pressure applied at the time of sticking the adhesive layer to be sealed was storage modulus at 23 ° C. of the adhesive layer is preferably not more than 1.3 ⁇ 10 7 Pa, more preferably Is 1.1 ⁇ 10 7 Pa or less, more preferably 1.0 ⁇ 10 7 Pa or less.
  • the storage elastic modulus of the adhesive layer at 23 ° C. is 9.5 ⁇ 10 5 Pa or more
  • the adhesive layer is punched without being significantly deformed.
  • the blade can be pushed into the device sealing adhesive sheet. Therefore, it is possible to prevent the adhesive from adhering to the portion of the release film that has not been peeled off, and the release film can be efficiently peeled off.
  • An adhesive layer having a storage elastic modulus of 9.5 ⁇ 10 5 Pa or more at 23 ° C. can be easily obtained by using, for example, a cyclic ether compound (A) having a large cyclic ether equivalent.
  • the storage elastic modulus of the adhesive layer at 23 ° C. can be reduced. Further, by using a relatively rigid resin such as a phenoxy resin, the storage elastic modulus at 23 ° C. is 9. even when the content of the cyclic ether compound (AL) in the adhesive layer is large. It is easy to obtain an adhesive layer of 5 ⁇ 10 5 Pa or more.
  • the adhesive layer has sufficient adhesive strength at normal temperature, and is excellent in sticking resistance.
  • Storage modulus at 23 ° C. is 3.0 ⁇ 10 7 Pa or less of the adhesive layer, for example, easily obtained by increasing the amount of cyclic ether compound (AL).
  • the cyclic ether compound (A) is a compound having a glycidyl ether group, so that the adhesive layer is stored at 23 ° C. lowering the elastic modulus, easily than 3.0 ⁇ 10 7 Pa.
  • the storage elastic modulus of the adhesive layer can be measured using a known dynamic viscoelasticity measuring device. Specifically, it can be measured by the method described in Examples.
  • the adhesive layer is curable. That is, by performing a predetermined curing treatment on the adhesive layer, the cyclic ether groups in the cyclic ether compound (A) react, and the adhesive layer is cured to become an adhesive cured product layer.
  • the curing treatment include heat treatment and light irradiation treatment. These can be appropriately determined according to the properties of the adhesive layer.
  • the storage elastic modulus of the cured adhesive layer at 90 ° C. is preferably 1 ⁇ 10 8 Pa or more, and more preferably 1 ⁇ 10 9 to 1 ⁇ 10 11 Pa.
  • An adhesive cured product layer having a storage elastic modulus of 1 ⁇ 10 8 Pa or more at 90 ° C. is more suitable as a sealing material because it has excellent sealing properties. Further, in the step performed for manufacturing the device encapsulant after the adhesive cured product layer is formed, the adhesive cured product layer is easily prevented from being broken or peeled off.
  • the storage elastic modulus of the cured adhesive layer can be measured using a known dynamic viscoelasticity measuring device. Specifically, it can be measured by the method described in Examples.
  • the adhesive cured product layer has excellent adhesive strength.
  • the adhesive strength of the cured adhesive layer is usually 1 to 20 N / 25 mm, preferably 2.5 to 15 N / 25 mm when a 180 ° peeling test is performed under the conditions of a temperature of 23 ° C. and a relative humidity of 50%. ..
  • This 180 ° peeling test can be performed, for example, under the conditions of a temperature of 23 ° C. and a relative humidity of 50% according to the method for measuring the adhesive strength described in JIS Z0237: 2009.
  • the adhesive sheet for device encapsulation of the present invention is used to form an encapsulant in an optical device such as a light emitting device, a light receiving device, or a display device
  • the adhesive cured product layer is excellent in colorless transparency. Is preferable.
  • the total light transmittance of the cured adhesive layer having a thickness of 15 ⁇ m is preferably 85% or more, more preferably 90% or more. There is no particular upper limit to the total light transmittance, but it is usually 99% or less.
  • the total light transmittance can be measured according to JIS K7361-1: 1997.
  • the water vapor permeability of the cured adhesive layer is usually 0.1 to 200 g ⁇ m -2 ⁇ day -1 , preferably 1 to 150 g ⁇ m -2 ⁇ day -1 .
  • the water vapor permeability can be measured using a known gas permeability measuring device.
  • the device sealing adhesive sheet of the present invention has a first release film and a second release film.
  • the release film is usually peeled off.
  • the second release film is peeled off and removed before the first release film. Since the second release film can be efficiently peeled off and removed, it is preferable that the release force of the second release film is lower than the release force of the first release film.
  • the "first release film” and the “second release film” may not be distinguished and may be simply referred to as "release film”.
  • the release film functions as a support in the manufacturing process of the adhesive sheet for device encapsulation, and also functions as a protective sheet for the adhesive layer until the adhesive sheet for device encapsulation is used.
  • the release film a conventionally known one can be used. For example, those having a release layer on a substrate for a release film can be mentioned.
  • the release layer can be formed by using a known release agent.
  • the base material for the release film paper base materials such as glassin paper, coated paper, and high-quality paper; laminated paper obtained by laminating a thermoplastic resin such as polyethylene on these paper base materials; polyethylene terephthalate resin, polybutylene terephthalate resin, etc. Plastic films such as polyethylene naphthalate resin, polypropylene resin, and polyethylene resin; and the like.
  • the release agent include rubber-based elastomers such as silicone-based resins, olefin-based resins, isoprene-based resins, and butadiene-based resins, long-chain alkyl-based resins, alkyd-based resins, and fluorine-based resins.
  • the thickness of the release film is not particularly limited, but is usually about 20 to 250 ⁇ m.
  • the adhesive sheet for sealing a device of the present invention has the first release film and the second release film, and the adhesive layer sandwiched between the release films.
  • Examples of the adhesive sheet for sealing the device of the present invention include a three-layer structure of a first release film / adhesive layer / second release film.
  • the method for manufacturing the adhesive sheet for device encapsulation of the present invention is not particularly limited.
  • a casting method can be used to produce an adhesive sheet for device encapsulation.
  • the adhesive sheet for device encapsulation When the adhesive sheet for device encapsulation is manufactured by the casting method, for example, it can be manufactured by the following method. Two release films having a release layer (release film (A) and release film (B)) and a coating liquid containing components constituting the adhesive layer are prepared. An adhesive layer is formed by applying a coating liquid to the release layer surface of the release film (A) using a known method and drying the obtained coating film. Next, the adhesive sheet for device encapsulation can be obtained by stacking the release film (B) on the adhesive layer so that the release layer surface of the release film (B) is in contact with the adhesive layer.
  • the solvent used for preparing the coating liquid is an aromatic hydrocarbon solvent such as benzene or toluene; an ester such as ethyl acetate or butyl acetate. System solvent; Ketone solvent such as acetone, methyl ethyl ketone, methyl isobutyl ketone; aliphatic hydrocarbon solvent such as n-pentane, n-hexane, n-heptane; alicyclic hydrocarbon such as cyclopentane, cyclohexane, methylcyclohexane System solvent; and the like.
  • aromatic hydrocarbon solvent such as benzene or toluene
  • an ester such as ethyl acetate or butyl acetate.
  • System solvent Ketone solvent such as acetone, methyl ethyl ketone, methyl isobutyl ketone
  • aliphatic hydrocarbon solvent such as n-pentane, n-hexan
  • Examples of the method of applying the coating liquid include a spin coating method, a spray coating method, a bar coating method, a knife coating method, a roll coating method, a blade coating method, a die coating method, and a gravure coating method.
  • Examples of the method of volatilizing the solvent in the coating film to dry the coating film include conventionally known drying methods such as hot air drying, hot roll drying, and infrared irradiation.
  • the conditions for drying the coating film are, for example, 80 to 150 ° C. for 30 seconds to 5 minutes, and more preferably 90 to 120 ° C. for 1 minute to 4 minutes.
  • the method for manufacturing the device encapsulant using the device encapsulation adhesive sheet of the present invention is not particularly limited. For example, by performing the following steps (a1) to (a5) and steps (b1) to (b5), the object to be sealed (device) can be sealed and a device sealed body can be manufactured.
  • Step (a1) The second release film of the device sealing adhesive sheet is peeled off to obtain an intermediate for device sealing.
  • Step (a3) The first release film is further peeled off from the device encapsulating intermediate.
  • Step (b1) The second release film of the device sealing adhesive sheet is peeled off to obtain an intermediate for device sealing.
  • the adhesive layer is attached to the object to be sealed or the substrate at room temperature from the viewpoint of convenience of work and productivity. It is preferable to carry out in an environment (15 to 35 ° C., the same below). Similarly, the step (b4) is preferably performed in a room temperature environment.
  • the punching blade can be pushed into the device sealing adhesive sheet without significantly deforming the adhesive layer when cutting into a predetermined shape. Therefore, it is possible to prevent the adhesive from adhering to the portion of the release film that has not been peeled off, and the release film can be efficiently peeled off.
  • the cured adhesive layer formed by using the adhesive layer constituting the adhesive sheet for sealing the device of the present invention is excellent in adhesive strength and water vapor blocking property. Therefore, the adhesive sheet for device encapsulation of the present invention is suitably used as a material for forming a sealing material in a device encapsulant.
  • the device encapsulant is not particularly limited.
  • the device sealant include light-related devices such as a light emitting device, a light receiving device, and a display device.
  • the adhesive sheet for device encapsulation of the present invention is preferably used as a material for forming a sealing material in an optical device encapsulant.
  • organic EL devices such as organic EL displays and organic EL lighting; liquid crystal displays; electronic paper; solar cells such as inorganic solar cells and organic thin-film solar cells;
  • the device sealing adhesive sheet of the present invention is an organic EL display, an organic EL lighting, or the like. It is suitably used as a material for forming a sealing material in devices such as liquid crystal displays and electronic papers.
  • -Cyclic ether compound (AL1) Hydrogenated bisphenol A type glycidyl ether epoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: YX8000, liquid at 25 ° C., epoxy equivalent: 205 g / eq)
  • -Cyclic ether compound (AL2) Hydrogenated bisphenol A type glycidyl ether epoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: YX8034, liquid at 25 ° C., epoxy equivalent: 270 g / eq)
  • C1 Thermal cationic polymerization initiator: Benzyl (4-hydroxyphenyl) (methyl) Sulfonium tetrakis (pentafluor
  • Example 1 130 parts by mass of the cyclic ether compound (AL1), 100 parts by mass of the binder resin (B1), 3.8 parts by mass of the curing agent (C1), and 0.2 parts by mass of the silane coupling agent (D1) are dissolved in methyl ethyl ketone and coated. The solution was prepared. This coating liquid is applied onto the peeling surface of the release film (E1) (first release film), and the obtained coating film is dried at 100 ° C. for 2 minutes to form an adhesive layer having a thickness of 15 ⁇ m. did. The peeling-treated surface of the release film (E2) (second release film) was bonded onto this adhesive layer to obtain an adhesive sheet for device encapsulation.
  • A1 cyclic ether compound
  • B1 binder resin
  • C1 curing agent
  • D1 silane coupling agent
  • Example 2 Comparative Examples 1 and 2
  • An adhesive sheet for device encapsulation was obtained in the same manner as in Example 1 except that the types and amounts of the components constituting the adhesive layer were changed to those shown in Table 1.
  • the adhesive layer of the adhesive sheet for device encapsulation obtained in Example or Comparative Example was laminated at 23 ° C. to a thickness of about 1 mm using a laminator, and obtained.
  • the storage elastic modulus was measured using the laminate as a measurement sample. That is, for this measurement sample, a storage elastic modulus measuring device (manufactured by Antonio Par, trade name: Physica MCR301) was used under the conditions of a frequency of 1 Hz, a strain of 1%, and a temperature rise rate of 3 ° C./min.
  • the storage elastic modulus in the temperature range of + 150 ° C. was measured.
  • the measurement results at 23 ° C. are shown in Table 1.
  • the device-sealing adhesive sheet obtained in Examples and Comparative Examples was cut to obtain a test piece having a width of 50 mm and a length of 150 mm.
  • the adhesive layer exposed by peeling off the second release film of the obtained test piece was laminated on non-alkali glass under the conditions of a temperature of 23 ° C. and a relative humidity of 50%, and further, using a pressure-bonding roll, 0.5 MPa. Pressure was applied.
  • the state of floating of the adhesive layer from the non-alkali glass was observed, and the one without floating was evaluated as A, and the one with floating was evaluated as B.
  • the adhesive sheet for device encapsulation obtained in Examples and Comparative Examples was cut to a size of 150 mm in length and 165 mm in width by using an air-type sample cutting device. Specifically, the adhesive sheet for device encapsulation was cut by pushing a punching blade of the above size from the second release film side of the adhesive sheet for device encapsulation to obtain a test piece. The second release film of the obtained test piece was peeled off. At this time, if the adhesive layer is not peeled off from the first release film, the adhesive layer adheres to the edge of the second release film, and the adhesive layer peels off from the first release film. Was evaluated as B.
  • the adhesive layer of the device sealing adhesive sheet obtained in Examples 1 and 2 has excellent adhesiveness at 23 ° C. Further, these adhesive sheets for sealing the device are also excellent in cutting processability, and the release film can be efficiently peeled off and removed.
  • the adhesive layer of the adhesive sheet for device encapsulation obtained in Comparative Example 1 has excellent adhesiveness at 23 ° C, but the storage elastic modulus of the adhesive layer at 23 ° C is too low, so that the device is sealed.
  • the adhesive sheet for stopping is inferior in cutting workability. Further, the adhesive layer of the adhesive sheet for device encapsulation obtained in Comparative Example 2 is inferior in stickability because the storage elastic modulus at 23 ° C. is too high.

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Abstract

The present invention provides a device sealing adhesive sheet that has a first release film, a second release film, and an adhesive layer that is held between the first release film and the second release film, said device sealing adhesive sheet satisfying a requirement (I) and a requirement (II). A device sealing adhesive sheet according to the present invention has an adhesive layer having a superior stickability at a normal temperature and release films and is superior in terms of the peelability of the release films. Requirement (I): the adhesive layer contains one or more types of compounds having a cyclic ether group. Requirement (II): the storage modulus of the adhesive layer at 23ºC is 9.5×105 to 3.0×107 Pa.

Description

デバイス封止用接着シートAdhesive sheet for device encapsulation
 本発明は、常温(23℃のことをいう。以下同じ)での貼付性に優れる接着剤層と剥離フィルムとを有し、前記剥離フィルムの剥離性に優れるデバイス封止用接着シートに関する。 The present invention relates to an adhesive sheet for device encapsulation, which has an adhesive layer and a release film having excellent adhesiveness at room temperature (referred to as 23 ° C., the same applies hereinafter) and has excellent release property of the release film.
 近年、有機EL素子は、低電圧直流駆動による高輝度発光が可能な発光素子として注目されている。
 しかし、有機EL素子には、時間の経過とともに、発光輝度、発光効率、発光均一性等の発光特性が低下し易いという問題があった。
 この発光特性の低下の問題の原因として、酸素や水分等が有機EL素子の内部に浸入し、電極や有機層を劣化させることが考えられた。このため、水分遮断性に優れる粘着剤層や接着剤層を用いて封止材を形成し、この問題を解決することが提案されている。
In recent years, an organic EL element has attracted attention as a light emitting element capable of high-luminance light emission by low-voltage direct current drive.
However, the organic EL element has a problem that the light emitting characteristics such as the light emitting brightness, the light emitting efficiency, and the light emitting uniformity tend to deteriorate with the passage of time.
It is considered that oxygen, water, etc. infiltrate into the inside of the organic EL element and deteriorate the electrode and the organic layer as a cause of the problem of deterioration of the light emitting characteristics. Therefore, it has been proposed to form a sealing material by using an adhesive layer or an adhesive layer having excellent moisture blocking properties to solve this problem.
 例えば、特許文献1には、特定のエポキシ樹脂、特定の脂環式エポキシ化合物、熱カチオン重合開始剤、光カチオン重合開始剤、及び、特定の増感剤を含有するシート状シール材が記載されている。
 特許文献1に記載のシート状シール材を用いて形成された封止材は、酸素透過性や水分透過性が低く、良好な封止性能を有している。
For example, Patent Document 1 describes a sheet-like sealing material containing a specific epoxy resin, a specific alicyclic epoxy compound, a thermal cationic polymerization initiator, a photocationic polymerization initiator, and a specific sensitizer. ing.
The sealing material formed by using the sheet-shaped sealing material described in Patent Document 1 has low oxygen permeability and water permeability, and has good sealing performance.
特開2018-95679号公報JP-A-2018-95679
 特許文献1に記載されるように、環状エーテル基の反応性を利用するシート状シール材は、封止材の形成材料として好適に用いられてきた。
 しかしながら、そのようなシート状シール材の中には常温での貼付性に劣るものがあり、被封止物に貼付する際に加熱して表面を軟化させる必要があるものがあった。
 一方、常温で良好な貼付性を有するシート状シール材の中には、貼付時の作業性に劣るものがあった。
 すなわち、2枚の剥離フィルムに挟持されたシート状シール材(以下、「接着剤層」ということがある。)を所定の形状に裁断加工する際、打抜き刃の押し込みによって接着剤層が変形し、剥離フィルムの端部の剥離処理がされていない部分(切断面)に接着剤が付着することで、剥離フィルムを効率よく剥離できないことがあった。
As described in Patent Document 1, a sheet-shaped sealing material utilizing the reactivity of a cyclic ether group has been suitably used as a material for forming a sealing material.
However, some of such sheet-shaped sealing materials are inferior in stickability at room temperature, and some of them need to be heated to soften the surface when sticking to the object to be sealed.
On the other hand, some of the sheet-shaped sealing materials having good stickability at room temperature were inferior in workability at the time of sticking.
That is, when the sheet-shaped sealing material (hereinafter, sometimes referred to as "adhesive layer") sandwiched between the two release films is cut into a predetermined shape, the adhesive layer is deformed by pushing the punching blade. In some cases, the release film could not be peeled off efficiently because the adhesive adhered to the unpeeled portion (cut surface) of the end portion of the release film.
 本発明は、上記実情に鑑みてなされたものであり、常温での貼付性に優れる接着剤層と剥離フィルムとを有し、剥離フィルムの剥離性に優れるデバイス封止用接着シートを提供することを目的とする。 The present invention has been made in view of the above circumstances, and provides an adhesive sheet for device encapsulation, which has an adhesive layer having excellent adhesiveness at room temperature and a release film, and has excellent releaseability of the release film. With the goal.
 本発明者らは上記課題を解決すべく、2枚の剥離フィルムと、これらの剥離フィルムに挟持された接着剤層とを有し、前記接着剤層が環状エーテル基を有する化合物を含有するものである封止用接着シートについて鋭意検討した。
 その結果、
(a)23℃における貯蔵弾性率が所定の値以下の接着剤層は、常温での貼付性に優れること、及び
(b)23℃における貯蔵弾性率が所定の値以上の接着剤層と剥離フィルムとを有する接着シートは、剥離フィルムの剥離性に優れること、
を見出し、本発明を完成するに至った。
In order to solve the above problems, the present inventors have two release films and an adhesive layer sandwiched between these release films, and the adhesive layer contains a compound having a cyclic ether group. We diligently examined the adhesive sheet for sealing.
as a result,
(A) The adhesive layer having a storage elastic modulus at 23 ° C. or less is excellent in stickability at room temperature, and (b) peeling from the adhesive layer having a storage elastic modulus at 23 ° C. of a predetermined value or more. The adhesive sheet with the film has excellent peelability of the release film.
The present invention has been completed.
 かくして本発明によれば、下記〔1〕~〔10〕のデバイス封止用接着シートが提供される。 Thus, according to the present invention, the following adhesive sheets for sealing devices [1] to [10] are provided.
〔1〕第1剥離フィルム及び第2剥離フィルムと、前記第1剥離フィルム及び第2剥離フィルムに挟持された接着剤層とを有するデバイス封止用接着シートであって、以下の要件(I)及び要件(II)を満たすデバイス封止用接着シート。
要件(I):前記接着剤層は、環状エーテル基を有する化合物を1種又は2種以上含有する層である。
要件(II):前記接着剤層の23℃における貯蔵弾性率が、9.5×10Pa以上3.0×10Pa以下である。
〔2〕前記環状エーテル基を有する化合物の少なくとも1種が、25℃で液体の化合物である、〔1〕に記載のデバイス封止用接着シート。
〔3〕25℃で液体の、環状エーテル基を有する化合物の含有量が、前記接着剤層全体に対して53質量%以上である、〔2〕に記載のデバイス封止用接着シート。
〔4〕25℃で液体の、環状エーテル基を有する化合物の含有量が、前記接着剤層全体に対して65質量%以下である、〔2〕又は〔3〕に記載のデバイス封止用接着シート。
〔5〕前記接着剤層が、さらに硬化剤を含有するものであって、硬化剤の少なくとも1種が熱カチオン重合開始剤である、〔1〕~〔4〕のいずれかに記載のデバイス封止用接着シート。
〔6〕前記硬化剤の全てが熱カチオン重合開始剤である、〔5〕に記載のデバイス封止用接着シート。
〔7〕前記環状エーテル基を有する化合物の少なくとも1種が、グリシジルエーテル基を有する化合物である、〔5〕又は〔6〕に記載のデバイス封止用接着シート。
〔8〕前記環状エーテル基を有する化合物の少なくとも1種が、脂環式エポキシ樹脂である、〔5〕~〔7〕のいずれかに記載のデバイス封止用接着シート。
〔9〕前記接着剤層がバインダー樹脂を含有するものであって、バインダー樹脂の少なくとも1種が、ガラス転移温度(Tg)が60℃以上のバインダー樹脂である、〔1〕~〔8〕のいずれかに記載のデバイス封止用接着シート。
〔10〕前記接着剤層を硬化させて得られる層の90℃における貯蔵弾性率が、1×10Pa以上である、〔1〕~〔9〕のいずれかに記載のデバイス封止用接着シート。
〔11〕光関連デバイス中の封止材の形成に用いられる、〔1〕~〔10〕のいずれかに記載のデバイス封止用接着シート。
[1] An adhesive sheet for device encapsulation having a first release film and a second release film and an adhesive layer sandwiched between the first release film and the second release film, and the following requirement (I). And an adhesive sheet for device encapsulation that meets requirement (II).
Requirement (I): The adhesive layer is a layer containing one or more compounds having a cyclic ether group.
Requirement (II): The storage elastic modulus of the adhesive layer at 23 ° C. is 9.5 × 10 5 Pa or more and 3.0 × 10 7 Pa or less.
[2] The adhesive sheet for device encapsulation according to [1], wherein at least one of the compounds having a cyclic ether group is a compound that is liquid at 25 ° C.
[3] The adhesive sheet for device encapsulation according to [2], wherein the content of the compound having a cyclic ether group, which is liquid at 25 ° C., is 53% by mass or more with respect to the entire adhesive layer.
[4] The device-sealing adhesive according to [2] or [3], wherein the content of the compound having a cyclic ether group, which is liquid at 25 ° C., is 65% by mass or less with respect to the entire adhesive layer. Sheet.
[5] The device seal according to any one of [1] to [4], wherein the adhesive layer further contains a curing agent, and at least one of the curing agents is a thermal cationic polymerization initiator. Adhesive sheet for stopping.
[6] The adhesive sheet for device encapsulation according to [5], wherein all of the curing agents are thermal cationic polymerization initiators.
[7] The adhesive sheet for device encapsulation according to [5] or [6], wherein at least one of the compounds having a cyclic ether group is a compound having a glycidyl ether group.
[8] The adhesive sheet for device encapsulation according to any one of [5] to [7], wherein at least one of the compounds having a cyclic ether group is an alicyclic epoxy resin.
[9] Of [1] to [8], wherein the adhesive layer contains a binder resin, and at least one of the binder resins is a binder resin having a glass transition temperature (Tg) of 60 ° C. or higher. Adhesive sheet for device encapsulation according to any one.
[10] The device-sealing adhesive according to any one of [1] to [9], wherein the layer obtained by curing the adhesive layer has a storage elastic modulus of 1 × 10 8 Pa or more at 90 ° C. Sheet.
[11] The device sealing adhesive sheet according to any one of [1] to [10], which is used for forming a sealing material in an optical device.
 本発明によれば、常温での貼付性に優れる接着剤層と剥離フィルムとを有し、剥離フィルムの剥離性に優れるデバイス封止用接着シートが提供される。 According to the present invention, there is provided an adhesive sheet for device encapsulation which has an adhesive layer and a release film having excellent adhesiveness at room temperature and has excellent release property of the release film.
 本発明のデバイス封止用接着シートは、第1剥離フィルム及び第2剥離フィルムと、前記第1剥離フィルム及び第2剥離フィルムに挟持された接着剤層とを有するデバイス封止用接着シートであって、上記の要件(I)及び要件(II)を満たすものである。 The device-sealing adhesive sheet of the present invention is a device-sealing adhesive sheet having a first release film and a second release film and an adhesive layer sandwiched between the first release film and the second release film. Therefore, the above requirements (I) and (II) are satisfied.
 本発明において、「第1剥離フィルム」は、デバイス封止用接着シートの使用の際に「第2剥離フィルム」よりも後に剥がされる剥離フィルムをいい、「第2剥離フィルム」は、デバイス封止用接着シートの使用の際に先に剥がされる剥離フィルムをいう。
 したがって、2枚の剥離フィルムの剥離力が異なる場合、通常、「第1剥離フィルム」は、2枚の剥離フィルムの中で剥離力が高いものをいい、「第2剥離フィルム」は、2枚の剥離フィルムの中で剥離力が低いものをいう。
 「接着剤層」とは、硬化性接着剤を塗膜化したものであって、硬化性、及び粘着性を有する層である。すなわち、「接着剤層」は、未硬化の状態の層である。
 本明細書において、「接着剤層を硬化させて得られる層」を「接着剤硬化物層」ということがある。この接着剤硬化物層は、封止材として利用される。
 本発明において、「硬化」とは、接着剤層中に含まれる環状エーテル基が反応することで、層の凝集力や貯蔵弾性率が高くなることをいう。
In the present invention, the "first release film" refers to a release film that is peeled off after the "second release film" when the adhesive sheet for device encapsulation is used, and the "second release film" refers to the device encapsulation. A release film that is peeled off first when the adhesive sheet for use is used.
Therefore, when the peeling forces of the two release films are different, the "first release film" usually refers to the one having the highest release force among the two release films, and the "second release film" is two sheets. A release film with a low release force.
The "adhesive layer" is a coating film of a curable adhesive, and is a layer having curability and adhesiveness. That is, the "adhesive layer" is a layer in an uncured state.
In the present specification, the "layer obtained by curing the adhesive layer" may be referred to as an "adhesive cured product layer". This adhesive cured product layer is used as a sealing material.
In the present invention, "curing" means that the cyclic ether groups contained in the adhesive layer react with each other to increase the cohesive force and storage elastic modulus of the layer.
〔接着剤層〕
(環状エーテル基を有する化合物)
 接着剤層は、環状エーテル基を有する化合物(以下、「環状エーテル化合物(A)」ということがある。)を1種又は2種以上含有する。
 環状エーテル化合物(A)を含有する接着剤層を硬化させることで、接着強度が高く、水蒸気遮断性に優れる封止材を形成することができる。
[Adhesive layer]
(Compound having a cyclic ether group)
The adhesive layer contains one or more compounds having a cyclic ether group (hereinafter, may be referred to as "cyclic ether compound (A)").
By curing the adhesive layer containing the cyclic ether compound (A), it is possible to form a sealing material having high adhesive strength and excellent water vapor blocking property.
 環状エーテル化合物(A)とは、分子内に少なくとも1個、好ましくは2個以上の環状エーテル基を有する化合物をいう。なお、本発明においては、後述するフェノキシ樹脂は、環状エーテル化合物(A)には含まれないものとする。 The cyclic ether compound (A) refers to a compound having at least one, preferably two or more cyclic ether groups in the molecule. In the present invention, the phenoxy resin described later is not included in the cyclic ether compound (A).
 環状エーテル化合物(A)の分子量は、通常100~5,000、好ましくは200~3,000である。
 環状エーテル化合物(A)の環状エーテル当量は、好ましくは50~1000g/eq、より好ましくは100~800g/eqである。
 環状エーテル当量が上記範囲にある環状エーテル化合物(A)を含有する接着剤層を硬化させることで、接着強度がより高く、水分遮断性により優れる封止材をより効率よく形成することができる。
 本発明における環状エーテル当量とは、分子量を環状エーテル基数で除した値を意味する。
The molecular weight of the cyclic ether compound (A) is usually 100 to 5,000, preferably 200 to 3,000.
The cyclic ether equivalent of the cyclic ether compound (A) is preferably 50 to 1000 g / eq, more preferably 100 to 800 g / eq.
By curing the adhesive layer containing the cyclic ether compound (A) having a cyclic ether equivalent in the above range, it is possible to more efficiently form a sealing material having higher adhesive strength and better moisture blocking property.
The cyclic ether equivalent in the present invention means a value obtained by dividing the molecular weight by the number of cyclic ether groups.
 環状エーテル基としては、オキシラン基(エポキシ基)、オキセタン基(オキセタニル基)、テトラヒドロフリル基、テトラヒドロピラニル基等が挙げられる。これらの中でも、接着強度がより高い封止材を形成することができるという観点から、環状エーテル基としては、オキシラン基又はオキセタン基が好ましく、オキシラン基がより好ましい。
 また、同様の理由により、環状エーテル化合物(A)は、分子内に2個以上のオキシラン基又はオキセタン基を有することが好ましく、分子内に2個以上のオキシラン基を有することがより好ましい。
Examples of the cyclic ether group include an oxylan group (epoxy group), an oxetane group (oxetanyl group), a tetrahydrofuryl group, a tetrahydropyranyl group and the like. Among these, the cyclic ether group is preferably an oxylan group or an oxetane group, and more preferably an oxylan group, from the viewpoint of being able to form a sealing material having higher adhesive strength.
Further, for the same reason, the cyclic ether compound (A) preferably has two or more oxylan groups or oxetane groups in the molecule, and more preferably has two or more oxylan groups in the molecule.
 分子内にオキシラン基を有する化合物としては、例えば、脂肪族エポキシ化合物(脂環式エポキシ化合物を除く)、芳香族エポキシ化合物、脂環式エポキシ化合物等が挙げられる。
 脂肪族エポキシ化合物としては、脂肪族アルコールのグリシジルエーテル化物、アルキルカルボン酸のグリシジルエステル等の単官能エポキシ化合物;
脂肪族多価アルコール、又はそのアルキレンオキサイド付加物のポリグリシジルエーテル化物、脂肪族長鎖多塩基酸のポリグリシジルエステル等の多官能エポキシ化合物;が挙げられる。
Examples of the compound having an oxylan group in the molecule include an aliphatic epoxy compound (excluding an alicyclic epoxy compound), an aromatic epoxy compound, and an alicyclic epoxy compound.
Examples of the aliphatic epoxy compound include monofunctional epoxy compounds such as glycidyl etherified products of aliphatic alcohols and glycidyl esters of alkylcarboxylic acids;
Examples thereof include polyglycidyl etherified products of aliphatic polyhydric alcohols or alkylene oxide adducts thereof, and polyfunctional epoxy compounds such as polyglycidyl esters of aliphatic long-chain polybasic acids.
 これらの脂肪族エポキシ化合物の代表的な化合物としては、アリルグリシジルエーテル等のアルケニルグリシジルエーテル;ブチルグリシジルエーテル、2-エチルヘキシルグリシジルエーテル、C12~13混合アルキルグリシジルエーテル等のアルキルグリシジルエーテル;1,4-ブタンジオールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、グリセリンのトリグリシジルエーテル、トリメチロールプロパンのトリグリシジルエーテル、ソルビトールのテトラグリシジルエーテル、ジペンタエリスリトールのヘキサグリシジルエーテル、ポリエチレングリコールのジグリシジルエーテル、ポリプロピレングリコールのジグリシジルエーテル等の多価アルコールのグリシジルエーテル;プロピレングリコール、トリメチロールプロパン、グリセリン等の脂肪族多価アルコールに1種、又は2種以上のアルキレンオキサイドを付加することによって得られるポリエーテルポリオールのポリグリシジルエーテル化物;脂肪族長鎖二塩基酸のジグリシジルエステル;脂肪族高級アルコールのモノグリシジルエーテル、高級脂肪酸のグリシジルエステル、エポキシ化大豆油、エポキシステアリン酸オクチル、エポキシステアリン酸ブチル、エポキシ化ポリブタジエン;等が挙げられる。 Representative compounds of these aliphatic epoxy compounds include alkenyl glycidyl ethers such as allyl glycidyl ethers; alkyl glycidyl ethers such as butyl glycidyl ethers, 2-ethylhexyl glycidyl ethers, and C12-13 mixed alkyl glycidyl ethers; 1,4- Butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, triglycidyl ether of glycerin, triglycidyl ether of trimethylolpropane, tetraglycidyl ether of sorbitol, hexaglycidyl ether of dipentaerythritol, diglycidyl ether of polyethylene glycol, polypropylene glycol Glycidyl ethers of polyhydric alcohols such as diglycidyl ethers; polyether polyols obtained by adding one or more alkylene oxides to aliphatic polyhydric alcohols such as propylene glycol, trimethylolpropane and glycerin. Polyglycidyl ethers; diglycidyl esters of aliphatic long-chain dibasic acids; monoglycidyl ethers of aliphatic higher alcohols, glycidyl esters of higher fatty acids, epoxidized soybean oil, octyl epoxidate stearate, butyl epoxy stearate, epoxidized polybutadiene; And so on.
 また、脂肪族エポキシ化合物として、市販品を用いることもできる。市販品としては、デナコールEX-121、デナコールEX-171、デナコールEX-192、デナコールEX-211、デナコールEX-212、デナコールEX-313、デナコールEX-314、デナコールEX-321、デナコールEX-411、デナコールEX-421、デナコールEX-512、デナコールEX-521、デナコールEX-611、デナコールEX-612、デナコールEX-614、デナコールEX-622、デナコールEX-810、デナコールEX-811、デナコールEX-850、デナコールEX-851、デナコールEX-821、デナコールEX-830、デナコールEX-832、デナコールEX-841、デナコールEX-861、デナコールEX-911、デナコールEX-941、デナコールEX-920、デナコールEX-931(以上、ナガセケムテックス社製);
エポライトM-1230、エポライト40E、エポライト100E、エポライト200E、エポライト400E、エポライト70P、エポライト200P、エポライト400P、エポライト1500NP、エポライト1600、エポライト80MF、エポライト100MF(以上、共栄社化学社製);
アデカグリシロールED-503、アデカグリシロールED-503G、アデカグリシロールED-506、アデカグリシロールED-523T(以上、ADEKA社製);が挙げられる。
A commercially available product can also be used as the aliphatic epoxy compound. Commercially available products include Denacol EX-121, Denacol EX-171, Denacol EX-192, Denacol EX-211, Denacol EX-212, Denacol EX-313, Denacol EX-314, Denacol EX-321, Denacol EX-411, Denacol EX-421, Denacol EX-512, Denacol EX-521, Denacol EX-611, Denacol EX-612, Denacol EX-614, Denacol EX-622, Denacol EX-810, Denacol EX-811, Denacol EX-850, Denacol EX-851, Denacol EX-821, Denacol EX-830, Denacol EX-832, Denacol EX-841, Denacol EX-861, Denacol EX-911, Denacol EX-941, Denacol EX-920, Denacol EX-931 ( (Made by Nagase ChemteX);
Epolite M-1230, Epolite 40E, Epolite 100E, Epolite 200E, Epolite 400E, Epolite 70P, Epolite 200P, Epolite 400P, Epolite 1500NP, Epolite 1600, Epolite 80MF, Epolite 100MF (all manufactured by Kyoeisha Kagakusha);
ADEKA Glycyrrol ED-503, Adeka Glycyrrol ED-503G, Adeka Glycyrrol ED-506, Adeka Glycyrrol ED-523T (all manufactured by ADEKA);
 芳香族エポキシ化合物としては、フェノール、クレゾール、ブチルフェノール等の、芳香族環を少なくとも1個有するフェノール類、又はそのアルキレンオキサイド付加物のモノ/ポリグリシジルエーテル化物;芳香族複素環を有するエポキシ化合物;等が挙げられる。
 これらの芳香族エポキシ化合物の代表的な化合物としては、ビスフェノールA、ビスフェノールF、又はこれらにさらにアルキレンオキサイドを付加した化合物のグリシジルエーテル化物やエポキシノボラック樹脂;
レゾルシノールやハイドロキノン、カテコール等の2個以上のフェノール性水酸基を有する芳香族化合物のモノ/ポリグリシジルエーテル化物;
フェニルジメタノールやフェニルジエタノール、フェニルジブタノール等のアルコール性水酸基を2個以上有する芳香族化合物のグリシジルエーテル化物;
フタル酸、テレフタル酸、トリメリット酸等の2個以上のカルボン酸を有する多塩基酸芳香族化合物のグリシジルエステル、安息香酸のグリシジルエステル、スチレンオキサイド又はジビニルベンゼンのエポキシ化物;
2,4,6-トリ(グリシジルオキシ)-1,3,5-トリアジン等のトリアジン骨格を有するエポキシ化合物;等が挙げられる。
Examples of the aromatic epoxy compound include phenols having at least one aromatic ring such as phenol, cresol, and butylphenol, or a mono / polyglycidyl etherified product of an alkylene oxide adduct thereof; an epoxy compound having an aromatic heterocycle; and the like. Can be mentioned.
Typical compounds of these aromatic epoxy compounds include bisphenol A, bisphenol F, or glycidyl etherified compounds or epoxy novolac resins obtained by further adding alkylene oxide to these compounds;
Mono / polyglycidyl etherified compounds of aromatic compounds with two or more phenolic hydroxyl groups such as resorcinol, hydroquinone, catechol;
A glycidyl etherified product of an aromatic compound having two or more alcoholic hydroxyl groups such as phenyldimethanol, phenyldiethanol, and phenyldibutanol;
Glysidyl ester of a polybasic acid aromatic compound having two or more carboxylic acids such as phthalic acid, terephthalic acid and trimellitic acid, glycidyl ester of benzoic acid, styrene oxide or epoxidized product of divinylbenzene;
Epoxy compounds having a triazine skeleton such as 2,4,6-tri (glycidyloxy) -1,3,5-triazine; and the like.
 また、芳香族エポキシ化合物として、市販品を用いることもできる。市販品としては、デナコールEX-146、デナコールEX-147、デナコールEX-201、デナコールEX-203、デナコールEX-711、デナコールEX-721、オンコートEX-1020、オンコートEX-1030、オンコートEX-1040、オンコートEX-1050、オンコートEX-1051、オンコートEX-1010、オンコートEX-1011、オンコート1012(以上、ナガセケムテックス社製);
オグソールPG-100、オグソールEG-200、オグソールEG-210、オグソールEG-250(以上、大阪ガスケミカル社製);
HP4032、HP4032D、HP4700(以上、DIC社製);
ESN-475V(以上、日鉄ケミカル&マテリアル社製);
jER YX8800(以上、三菱ケミカル社製);
マープルーフG-0105SA、マープルーフG-0130SP(以上、日油(株)社製);
エピクロンN-665、エピクロンHP-7200(以上、DIC社製);
EOCN-1020、EOCN-102S、EOCN-103S、EOCN-104S、XD-1000、NC-3000、EPPN-501H、EPPN-501HY、EPPN-502H、NC-7000L(以上、日本化薬社製);
アデカレジンEP-4000、アデカレジンEP-4005、アデカレジンEP-4100、アデカレジンEP-4901(以上、ADEKA社製);
TECHMORE VG-3101L(以上、プリンテック社製);
TEPIC-FL、TEPIC-PAS、TEPIC-UC(以上、日産化学社製);等が挙げられる。
A commercially available product can also be used as the aromatic epoxy compound. Commercially available products include Denacol EX-146, Denacol EX-147, Denacol EX-201, Denacol EX-203, Denacol EX-711, Denacol EX-721, On-Coat EX-1020, On-Coat EX-1030, On-Coat EX. -1040, On-Coat EX-1050, On-Coat EX-1051, On-Coat EX-1010, On-Coat EX-1011, On-Coat 1012 (all manufactured by Nagase ChemteX);
Ogsol PG-100, Ogsol EG-200, Ogsol EG-210, Ogsol EG-250 (all manufactured by Osaka Gas Chemical Co., Ltd.);
HP4032, HP4032D, HP4700 (all manufactured by DIC Corporation);
ESN-475V (above, manufactured by Nippon Steel & Sumikin Co., Ltd.);
jER YX8800 (above, manufactured by Mitsubishi Chemical Corporation);
Maproof G-0105SA, Maproof G-0130SP (all manufactured by NOF CORPORATION);
Epicron N-665, Epicron HP-7200 (all manufactured by DIC Corporation);
EOCN-1020, EOCN-102S, EOCN-103S, EOCN-104S, XD-1000, NC-3000, EPPN-501H, EPPN-501HY, EPPN-502H, NC-7000L (all manufactured by Nippon Kayaku Co., Ltd.);
Adeka Resin EP-4000, Adeka Resin EP-4005, Adeka Resin EP-4100, Adeka Resin EP-4901 (all manufactured by ADEKA);
TECHMORE VG-3101L (above, manufactured by Printec);
Examples thereof include TEPIC-FL, TEPIC-PAS, TEPIC-UC (all manufactured by Nissan Chemical Industries, Ltd.).
 脂環式エポキシ化合物としては、少なくとも1個以上の脂環式構造を有する多価アルコールのポリグリシジルエーテル化物、又はシクロヘキセンやシクロペンテン環含有化合物を酸化剤でエポキシ化することによって得られるシクロヘキセンオキサイドやシクロペンテンオキサイド含有化合物が挙げられる。
 これらの脂環式エポキシ化合物の代表的な化合物としては、水素添加ビスフェノールAジグリシジルエーテル、3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-1-メチルシクロヘキシル-3,4-エポキシ-1-メチルヘキサンカルボキシレート、6-メチル-3,4-エポキシシクロヘキシルメチル-6-メチル-3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-3-メチルシクロヘキシルメチル-3,4-エポキシ-3-メチルシクロヘキサンカルボキシレート、3,4-エポキシ-5-メチルシクロヘキシルメチル-3,4-エポキシ-5-メチルシクロヘキサンカルボキシレート、ビス(3,4-エポキシシクロヘキシルメチル)アジペート、3,4-エポキシ-6-メチルシクロヘキサンカルボキシレート、メチレンビス(3,4-エポキシシクロヘキサン)、プロパン-2,2-ジイル-ビス(3,4-エポキシシクロヘキサン)、2,2-ビス(3,4-エポキシシクロヘキシル)プロパン、ジシクロペンタジエンジエポキサイド、ジシクロペンタジエンジメタノールジグリシジルエーテル、エチレンビス(3,4-エポキシシクロヘキサンカルボキシレート)、エポキシヘキサヒドロフタル酸ジオクチル、エポキシヘキサヒドロフタル酸ジ-2-エチルヘキシル、1-エポキシエチル-3,4-エポキシシクロヘキサン、1,2-エポキシ-2-エポキシエチルシクロヘキサン、α-ピネンオキシド、リモネンジオキシド等が挙げられる。
The alicyclic epoxy compound includes a polyglycidyl etherified product of a polyhydric alcohol having at least one alicyclic structure, or cyclohexene oxide or cyclopentene obtained by epoxidizing a cyclohexene or cyclopentene ring-containing compound with an oxidizing agent. Examples include oxide-containing compounds.
Typical compounds of these alicyclic epoxy compounds are hydrogenated bisphenol A diglycidyl ether, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, and 3,4-epoxy-1-methylcyclohexyl. -3,4-Epoxy-1-methylhexanecarboxylate, 6-Methyl-3,4-Epoxycyclohexylmethyl-6-methyl-3,4-Epoxycyclohexanecarboxylate, 3,4-Epoxy-3-methylcyclohexylmethyl -3,4-epoxy-3-methylcyclohexanecarboxylate, 3,4-epoxy-5-methylcyclohexylmethyl-3,4-epoxy-5-methylcyclohexanecarboxylate, bis (3,4-epoxycyclohexylmethyl) adipate , 3,4-Epoxy-6-methylcyclohexanecarboxylate, Methylenebis (3,4-Epoxycyclohexane), Propane-2,2-Diyl-bis (3,4-Epoxycyclohexane), 2,2-Bis (3,3) 4-epoxycyclohexyl) propane, dicyclopentadiene diepoxyside, dicyclopentadiene dimethanol diglycidyl ether, ethylenebis (3,4-epoxycyclohexanecarboxylate), dioctyl epoxyhexahydrophthalate, di-2 epoxyhexahydrophthalate -Epoxyhexyl, 1-epoxyethyl-3,4-epoxycyclohexane, 1,2-epoxy-2-epoxyethylcyclohexane, α-pinenooxide, limonendioxide and the like can be mentioned.
 また、脂環式エポキシ化合物として、市販品を用いることもできる。市販品としては、セロキサイド2021P、セロキサイド2081、セロキサイド2000、セロキサイド3000(以上、ダイセル社製);エポライト4000(共栄社化学社製);jER YX8000、jER YX8034(以上、三菱ケミカル社製);アデカレジンEP-4088S、アデカレジンEP-4088L、アデカレジンEP-4080E(以上、ADEKA社製);等が挙げられる。 A commercially available product can also be used as the alicyclic epoxy compound. Commercially available products include celoxide 2021P, celoxide 2081, celoxide 2000, celoxide 3000 (above, manufactured by Daicel); Epolite 4000 (manufactured by Kyoeisha Chemical Co., Ltd.); jER YX8000, jER YX8034 (above, manufactured by Mitsubishi Chemical Corporation); ADEKA REGIN EP- 4088S, Adeka Resin EP-4088L, Adeka Resin EP-4080E (all manufactured by ADEKA Corporation); and the like.
 また、分子内にオキシラン基を有する化合物として、一分子中に脂環構造及び芳香環の両方を有するエポキシ化合物も挙げられる。このような化合物として、例えば、エピクロンHP-7200(DIC社製)が挙げられる。 Further, as a compound having an oxylan group in the molecule, an epoxy compound having both an alicyclic structure and an aromatic ring in one molecule can be mentioned. Examples of such a compound include Epicron HP-7200 (manufactured by DIC Corporation).
 これらの中でも、接着剤硬化物層の誘電率を低下させる観点、無色透明性に優れる接着剤硬化物層を形成し易い観点から、オキシラン基を有する化合物としては、脂環式エポキシ樹脂が好ましい。また、接着剤層がカチオン重合開始剤を含有する場合には、脂環式エポキシ樹脂はカチオン重合の反応性が高く、カチオン重合の進行が過度に遅くなることを回避する観点から好ましい。
 また、後述する硬化剤として熱カチオン重合開始剤を用いる場合、オキシラン基を有する化合物は、グリシジルエーテル基を有する化合物であることが好ましい。グリシジルエーテル基が関与するカチオン重合反応は比較的穏やかに進行する傾向がある。そのため、接着剤層の製造工程に、接着剤層を構成する成分を含む組成物を加熱する工程(例えば、90℃以上に加熱する工程)がある場合に、グリシジルエーテル基の重合反応が進みにくく、接着剤層の23℃における貯蔵弾性率を低く維持することが容易である。環状エーテル基を有する化合物の全体に対して、グリシジルエーテル基を有する化合物の含有量が、70質量%以上であることが好ましく、90質量%以上であることが好ましい。また、環状エーテル基を有する化合物の全体に対して、グリシジルエーテル基を有する化合物の含有量が90質量%以上であると、接着剤層の保存安定性を向上させることができる。
Among these, an alicyclic epoxy resin is preferable as the compound having an oxylan group from the viewpoint of lowering the dielectric constant of the cured adhesive layer and easily forming the cured adhesive layer having excellent colorless transparency. Further, when the adhesive layer contains a cationic polymerization initiator, the alicyclic epoxy resin is preferable from the viewpoint of avoiding excessively slow progress of the cationic polymerization because the reactivity of the cationic polymerization is high.
When a thermal cationic polymerization initiator is used as the curing agent described later, the compound having an oxylan group is preferably a compound having a glycidyl ether group. Cationic polymerization reactions involving glycidyl ether groups tend to proceed relatively gently. Therefore, when the manufacturing process of the adhesive layer includes a step of heating the composition containing the components constituting the adhesive layer (for example, a step of heating to 90 ° C. or higher), the polymerization reaction of the glycidyl ether group is difficult to proceed. , It is easy to keep the storage elastic modulus of the adhesive layer low at 23 ° C. The content of the compound having a glycidyl ether group is preferably 70% by mass or more, and preferably 90% by mass or more, based on the whole compound having a cyclic ether group. Further, when the content of the compound having a glycidyl ether group is 90% by mass or more with respect to the entire compound having a cyclic ether group, the storage stability of the adhesive layer can be improved.
 分子内にオキセタン基を有する化合物としては、3,7-ビス(3-オキセタニル)-5-オキサ-ノナン、1,4-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]ベンゼン、1,2-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]エタン、1,3-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]プロパン、エチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、トリエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、テトラエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、1,4-ビス(3-エチル-3-オキセタニルメトキシ)ブタン、1,6-ビス(3-エチル-3-オキセタニルメトキシ)ヘキサン等の二官能脂肪族オキセタン化合物、3-エチル-3-[(フェノキシ)メチル]オキセタン、3-エチル-3-(ヘキシロキシメチル)オキセタン、3-エチル-3-(2-エチルヘキシロキシメチル)オキセタン、3-エチル-3-(ヒドロキシメチル)オキセタン、3-エチル-3-(クロロメチル)オキセタン等の一官能オキセタン化合物等が挙げられる。 Compounds having an oxetane group in the molecule include 3,7-bis (3-oxetanyl) -5-oxa-nonane, 1,4-bis [(3-ethyl-3-oxetanylmethoxy) methyl] benzene, 1, 2-Bis [(3-ethyl-3-oxetanylmethoxy) methyl] ethane, 1,3-bis [(3-ethyl-3-oxetanylmethoxy) methyl] propane, ethylene glycol bis (3-ethyl-3-oxetanylmethyl) ) Ether, triethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, tetraethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, 1,4-bis (3-ethyl-3-oxetanylmethoxy) Bifunctional aliphatic oxetane compounds such as butane, 1,6-bis (3-ethyl-3-oxetanylmethoxy) hexane, 3-ethyl-3-[(phenoxy) methyl] oxetane, 3-ethyl-3- (hexyloxy) Monofunctional oxetane compounds such as methyl) oxetane, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3- (hydroxymethyl) oxetane, 3-ethyl-3- (chloromethyl) oxetane, etc. Can be mentioned.
 分子内にオキセタン基を有する化合物としては、市販品を用いることもできる。市販品としては、2-ヒドロキシエチルビニルエーテル、ジエチレングリコールモノビニルエーテル、4-ヒドロキシブチルビニルエーテル(以上、丸善石油化学社製);
アロンオキセタンOXT-121、OXT-221、EXOH、POX、OXA、OXT-101、OXT-211、OXT-212(以上、東亞合成社製);
エタナコールOXBP、OXTP(以上、宇部興産社製);等が挙げられる。
As the compound having an oxetane group in the molecule, a commercially available product can also be used. Commercially available products include 2-hydroxyethyl vinyl ether, diethylene glycol monovinyl ether, and 4-hydroxybutyl vinyl ether (manufactured by Maruzen Petrochemical Co., Ltd.);
Aron Oxetane OXT-121, OXT-221, EXOH, POX, OXA, OXT-101, OXT-221, OXT-212 (all manufactured by Toagosei);
Etanacol OXBP, OXTP (above, manufactured by Ube Industries, Ltd.); and the like.
 これらの環状エーテル化合物(A)は、1種単独で、あるいは2種以上を組み合わせて用いることができる。 These cyclic ether compounds (A) can be used alone or in combination of two or more.
 接着剤層中の環状エーテル化合物(A)の含有量(2種以上の環状エーテル化合物(A)を含むときはこれらの合計量)は、接着剤層全体に対して、好ましくは53~80質量%、より好ましくは57~75質量%である。
 環状エーテル化合物(A)の含有量を上記範囲内にすることで、90℃における貯蔵弾性率が高い接着剤硬化物層が得られやすくなる。
The content of the cyclic ether compound (A) in the adhesive layer (the total amount thereof when two or more kinds of cyclic ether compounds (A) are contained) is preferably 53 to 80 mass by mass with respect to the entire adhesive layer. %, More preferably 57 to 75% by mass.
By keeping the content of the cyclic ether compound (A) within the above range, it becomes easy to obtain an adhesive cured product layer having a high storage elastic modulus at 90 ° C.
 接着剤層中の環状エーテル化合物(A)の少なくとも1種は、25℃で液体の化合物(環状エーテル化合物(AL))であることが好ましい。ここで、液体とは、物質の集合状態の一つであって、ほぼ一定の体積を有するが、固有の形を有さない状態のものをいう。
 環状エーテル化合物(AL)は、E型粘度計を用いて、25℃、1.0rpmにて測定した粘度が、2~10000mPa・sであることが好ましい。
 環状エーテル化合物(AL)を用いることで、接着剤層の23℃における貯蔵弾性率が高くなり過ぎるのを抑制することができる。このため、常温で十分な粘着力を有し、貼付性に優れる接着剤層が得られ易くなる。
At least one of the cyclic ether compounds (A) in the adhesive layer is preferably a compound (cyclic ether compound (AL)) that is liquid at 25 ° C. Here, the liquid is one of the aggregated states of substances, which has a substantially constant volume but does not have a unique shape.
The cyclic ether compound (AL) preferably has a viscosity of 2 to 10000 mPa · s measured at 25 ° C. and 1.0 rpm using an E-type viscometer.
By using the cyclic ether compound (AL), it is possible to prevent the storage elastic modulus of the adhesive layer from becoming too high at 23 ° C. Therefore, it becomes easy to obtain an adhesive layer having sufficient adhesive strength at room temperature and excellent adhesiveness.
 接着剤層の23℃における貯蔵弾性率を調節する観点から、環状エーテル化合物(AL)の環状エーテル当量は、好ましくは150~1000g/eq、より好ましくは240~900g/eqである。 From the viewpoint of adjusting the storage elastic modulus of the adhesive layer at 23 ° C., the cyclic ether equivalent of the cyclic ether compound (AL) is preferably 150 to 1000 g / eq, more preferably 240 to 900 g / eq.
 接着剤層中の環状エーテル化合物(AL)の含有量(2種以上の化合物を含むときはこれらの合計量)は、接着剤層全体に対して、好ましくは53質量%以上、より好ましくは57質量%以上である。環状エーテル化合物(AL)の含有量が接着剤層全体に対して53質量%以上であることで、常温で十分な粘着力を有し、貼付性に優れる接着剤層が得られ易くなる。加えて、90℃における貯蔵弾性率が高い接着剤硬化物層が得られやすくなる。 The content of the cyclic ether compound (AL) in the adhesive layer (the total amount thereof when two or more compounds are contained) is preferably 53% by mass or more, more preferably 57, based on the entire adhesive layer. It is mass% or more. When the content of the cyclic ether compound (AL) is 53% by mass or more with respect to the entire adhesive layer, it becomes easy to obtain an adhesive layer having sufficient adhesive strength at room temperature and excellent adhesiveness. In addition, a cured adhesive layer having a high storage elastic modulus at 90 ° C. can be easily obtained.
 接着剤層中の環状エーテル化合物(AL)の含有量(2種以上の化合物を含むときはこれらの合計量)は、接着剤層全体に対して、好ましくは70質量%以下、より好ましくは68質量%以下である。環状エーテル化合物(AL)の含有量が接着剤層全体に対して70質量%以下であることで、剥離フィルムの剥離性に優れるデバイス封止用接着シートが得られ易くなる。 The content of the cyclic ether compound (AL) in the adhesive layer (the total amount thereof when two or more compounds are contained) is preferably 70% by mass or less, more preferably 68, based on the entire adhesive layer. It is less than mass%. When the content of the cyclic ether compound (AL) is 70% by mass or less with respect to the entire adhesive layer, it becomes easy to obtain an adhesive sheet for device encapsulation having excellent peelability of the release film.
(バインダー樹脂)
 接着剤層は、バインダー樹脂(B)を含有してもよい。バインダー樹脂(B)を含有する接着剤層は、形状保持性及び取り扱い性に優れたものとなる。
(Binder resin)
The adhesive layer may contain a binder resin (B). The adhesive layer containing the binder resin (B) has excellent shape retention and handleability.
 バインダー樹脂(B)の重量平均分子量(Mw)は特に限定されないが、環状エーテル化合物(A)との相溶性により優れ、さらに、形状保持性に優れることから、好ましくは10,000以上、より好ましくは10,000~150,000、さらに好ましくは10,000~100,000である。
 バインダー樹脂(B)の重量平均分子量(Mw)は、テトラヒドロフラン(THF)を溶媒として用いてゲル・パーミエーション・クロマトグラフィー(GPC)を行い、標準ポリスチレン換算値として求めることができる。
The weight average molecular weight (Mw) of the binder resin (B) is not particularly limited, but is preferably 10,000 or more, more preferably 10,000 or more because it is excellent in compatibility with the cyclic ether compound (A) and also excellent in shape retention. Is 10,000 to 150,000, more preferably 10,000 to 100,000.
The weight average molecular weight (Mw) of the binder resin (B) can be determined as a standard polystyrene-equivalent value by performing gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
 接着剤層がバインダー樹脂(B)を含有するとき、バインダー樹脂(B)の含有量(2種以上のバインダー樹脂(B)を含むときはこれらの合計量)は、接着剤層全体に対して、好ましくは20~46質量%、より好ましくは23~44質量%である。
 バインダー樹脂(B)の含有量が、上記範囲内であることで、形状保持性に優れ、かつ、十分な粘着力を有する接着剤層が得られ易くなる。
When the adhesive layer contains the binder resin (B), the content of the binder resin (B) (when two or more kinds of binder resins (B) are contained, the total amount of these) is applied to the entire adhesive layer. , It is preferably 20 to 46% by mass, and more preferably 23 to 44% by mass.
When the content of the binder resin (B) is within the above range, it becomes easy to obtain an adhesive layer having excellent shape retention and sufficient adhesive strength.
 バインダー樹脂(B)としては、ガラス転移温度(Tg)が60℃以上の樹脂が好ましく、90℃以上の樹脂がより好ましく、110℃以上の樹脂が更に好ましい。ガラス転移温度(Tg)が60℃以上の樹脂を用いることで、接着剤硬化物層の90℃における貯蔵弾性率を1×10Pa以上にすることが容易になる。
 また、バインダー樹脂(B)のガラス転移温度(Tg)が、90℃以上であることで、環状エーテル化合物(AL)を多く含む場合でも、接着剤層の23℃における貯蔵弾性率を後述する9.5×10Pa以上の範囲とすることが容易である。
 バインダー樹脂(B)のガラス転移温度(Tg)は、示差走査熱量分析計を用い、JIS K 7121に準じて測定することができる。
As the binder resin (B), a resin having a glass transition temperature (Tg) of 60 ° C. or higher is preferable, a resin having a glass transition temperature (Tg) of 90 ° C. or higher is more preferable, and a resin having a glass transition temperature (Tg) of 110 ° C. or higher is further preferable. By glass transition temperature (Tg) used 60 ° C. or more resins, it is easy to storage modulus at 90 ° C. of the cured adhesive layer to more than 1 × 10 8 Pa.
Further, since the glass transition temperature (Tg) of the binder resin (B) is 90 ° C. or higher, the storage elastic modulus of the adhesive layer at 23 ° C. will be described later even when a large amount of the cyclic ether compound (AL) is contained. It is easy to set the range to .5 × 10 5 Pa or more.
The glass transition temperature (Tg) of the binder resin (B) can be measured according to JIS K 7121 using a differential scanning calorimeter.
 バインダー樹脂(B)としては、フェノキシ系樹脂、ポリイミド系樹脂、ポリアミドイミド系樹脂、ポリビニルブチラール系樹脂、ポリカーボネート系樹脂、アクリル系樹脂、ウレタン系樹脂、変性オレフィン系樹脂等が挙げられる。
 これらの樹脂は、1種単独で、あるいは2種以上を組み合わせて用いることができる。
Examples of the binder resin (B) include phenoxy resin, polyimide resin, polyamide-imide resin, polyvinyl butyral resin, polycarbonate resin, acrylic resin, urethane resin, modified olefin resin and the like.
These resins can be used alone or in combination of two or more.
 バインダー樹脂(B)としては、フェノキシ系樹脂及び変性オレフィン系樹脂からなる群から選ばれる少なくとも一種であることが好ましく、接着剤硬化物層の90℃における貯蔵弾性率を高くする観点から、フェノキシ系樹脂であることが好ましい。 The binder resin (B) is preferably at least one selected from the group consisting of phenoxy-based resins and modified olefin-based resins, and is phenoxy-based from the viewpoint of increasing the storage elastic modulus of the cured adhesive layer at 90 ° C. It is preferably a resin.
 フェノキシ系樹脂は、一般に、高分子量のエポキシ樹脂に該当し、重合度が100程度以上のものをいう。 The phenoxy resin generally corresponds to a high molecular weight epoxy resin and has a degree of polymerization of about 100 or more.
 フェノキシ系樹脂は、重量平均分子量(Mw)が10,000~150,000のものが好ましく、10,000~100,000であることがより好ましい。フェノキシ系樹脂の重量平均分子量(Mw)は、テトラヒドロフラン(THF)を溶媒として用いてゲル・パーミエーション・クロマトグラフィー(GPC)を行い、標準ポリスチレン換算値として求めることができる。
 このような高分子量のエポキシ樹脂に該当するフェノキシ系樹脂は、耐熱変形性に優れる。
 フェノキシ系樹脂のエポキシ当量は、好ましくは5,000以上、より好ましくは7,000以上である。フェノキシ系樹脂のエポキシ当量は、JIS K7236に準じて測定することができる。
The phenoxy resin preferably has a weight average molecular weight (Mw) of 10,000 to 150,000, and more preferably 10,000 to 100,000. The weight average molecular weight (Mw) of the phenoxy resin can be determined as a standard polystyrene-equivalent value by performing gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
The phenoxy-based resin corresponding to such a high molecular weight epoxy resin has excellent heat-resistant deformability.
The epoxy equivalent of the phenoxy resin is preferably 5,000 or more, more preferably 7,000 or more. The epoxy equivalent of the phenoxy resin can be measured according to JIS K7236.
 フェノキシ系樹脂としては、ビスフェノールA型、ビスフェノールF型、ビスフェノールS型フェノキシ樹脂、ビスフェノールA型とビスフェノールF型の共重合体型フェノキシ樹脂、その蒸留品、ナフタレン型フェノキシ樹脂、ノボラック型フェノキシ樹脂、ビフェニル型フェノキシ樹脂、シクロペンタジエン型フェノキシ樹脂等が挙げられる。
 これらのフェノキシ系樹脂は、1種単独で、あるいは2種以上を組み合わせて使用することができる。
Examples of phenoxy resins include bisphenol A type, bisphenol F type, bisphenol S type phenoxy resin, bisphenol A type and bisphenol F type copolymer type phenoxy resin, distilled products thereof, naphthalene type phenoxy resin, novolac type phenoxy resin, and biphenyl type. Examples thereof include phenoxy resin and cyclopentadiene type phenoxy resin.
These phenoxy resins can be used alone or in combination of two or more.
 フェノキシ系樹脂は、二官能フェノール類とエピハロヒドリンとを高分子量まで反応させる方法、又は、二官能エポキシ樹脂と二官能フェノール類を重付加反応により得ることができる。
 例えば、二官能フェノール類とエピハロヒドリンとをアルカリ金属水酸化物の存在下で、不活性溶媒中、40~120℃の温度で反応させることにより得ることができる。また、二官能エポキシ樹脂と二官能フェノール類とを、アルカリ金属化合物、有機リン系化合物、環状アミン系化合物等の触媒の存在下で、沸点が120℃以上の、アミド系溶媒、エーテル系溶媒、ケトン系溶媒、ラクトン系溶媒、アルコール系溶媒等の有機溶剤中で、反応固形分濃度が50重量%以下で50~200℃に加熱して重付加反応させて得ることもできる。
The phenoxy resin can be obtained by a method of reacting a bifunctional phenol and epihalohydrin to a high molecular weight, or by a double addition reaction of a bifunctional epoxy resin and a bifunctional phenol.
For example, it can be obtained by reacting bifunctional phenols and epihalohydrin in the presence of an alkali metal hydroxide in an inert solvent at a temperature of 40 to 120 ° C. Further, the bifunctional epoxy resin and the bifunctional phenols are mixed with an amide solvent or an ether solvent having a boiling point of 120 ° C. or higher in the presence of a catalyst such as an alkali metal compound, an organic phosphorus compound or a cyclic amine compound. It can also be obtained by performing a heavy addition reaction by heating to 50 to 200 ° C. with a reaction solid content concentration of 50% by weight or less in an organic solvent such as a ketone solvent, a lactone solvent, or an alcohol solvent.
 二官能フェノール類は、2個のフェノール性水酸基をもつ化合物であれば、特に限定されない。例えば、ハイドロキノン、2-ブロモハイドロキノン、レゾルシノール、カテコールなどの単環二官能フェノール類;ビスフェノールA、ビスフェノールF、ビスフェノールAD、ビスフェノールS等のビスフェノール類;4,4’-ジヒドロキシビフェニルなどのジヒドロキシビフェニル類;ビス(4-ヒドロキシフェニル)エーテルなどのジヒドロキシフェニルエーテル類;及びこれらのフェノール骨格の芳香環に直鎖アルキル基、分枝アルキル基、アリール基、メチロール基、アリル基、環状脂肪族基、ハロゲン(テトラブロモビスフェノールA等)、ニトロ基等を導入したもの;これらのビスフェノール骨格の中央にある炭素原子に直鎖アルキル基、分枝アルキル基、アリル基、置換基のついたアリル基、環状脂肪族基、アルコキシカルボニル基等を導入した多環二官能フェノール類;等が挙げられる。 The bifunctional phenols are not particularly limited as long as they are compounds having two phenolic hydroxyl groups. For example, monocyclic bifunctional phenols such as hydroquinone, 2-bromohydroquinone, resorcinol, catechol; bisphenols such as bisphenol A, bisphenol F, bisphenol AD, bisphenol S; dihydroxybiphenyls such as 4,4'-dihydroxybiphenyl; Dihydroxyphenyl ethers such as bis (4-hydroxyphenyl) ethers; and linear alkyl groups, branched alkyl groups, aryl groups, methylol groups, allyl groups, cyclic aliphatic groups, halogens (aryl groups) on the aromatic rings of these phenol skeletons. Tetrabromobisphenol A, etc.), nitro group, etc. introduced; linear alkyl group, branched alkyl group, allyl group, allyl group with substituent, cyclic aliphatic group in the carbon atom in the center of these bisphenol skeletons Polycyclic bifunctional phenols into which a group, an alkoxycarbonyl group, etc. have been introduced; and the like can be mentioned.
 エピハロヒドリンとしては、エピクロルヒドリン、エピブロムヒドリン、エピヨードヒドリンなどが挙げられる。 Examples of epichlorohydrin include epichlorohydrin, epibrom hydrin, and epiiodohydrin.
 また、本発明においては、フェノキシ系樹脂として、市販品を用いることもできる。例えば、三菱ケミカル社製の商品名:YX7200(ガラス転移温度:150℃)、YX6954(ビスフェノールアセトフェノン骨格含有フェノキシ樹脂、ガラス転移温度:130℃)、YL7553、YL6794、YL7213、YL7290、YL7482、YX8100(ビスフェノールS骨格含有フェノキシ樹脂)、東都化成社製の商品名:FX280、FX293、FX293S(フルオレン骨格含有フェノキシ樹脂)、三菱ケミカル社製の商品名:jER1256、jER4250(ガラス転移温度:85℃未満)、jER4275(ガラス転移温度:75℃)、日鉄ケミカル&マテリアル社製の商品名:YP-50(ガラス転移温度:84℃)、YP-50S(いずれもビスフェノールA骨格含有フェノキシ樹脂)、YP-70(ビスフェノールA骨格/ビスフェノールF骨格共重合型フェノキシ樹脂、ガラス転移温度:85℃未満)、ZX-1356-2(ガラス転移温度:72℃)等が挙げられる。なお、ガラス転移温度が判明しているものについては、ガラス転移温度を示した。 Further, in the present invention, a commercially available product can also be used as the phenoxy resin. For example, trade names manufactured by Mitsubishi Chemical Co., Ltd .: YX7200 (glass transition temperature: 150 ° C.), YX6954 (bisphenol acetophenone skeleton-containing phenoxy resin, glass transition temperature: 130 ° C.), YL7553, YL6794, YL7213, YL7290, YL7482, YX8100 (bisphenol). S skeleton-containing phenoxy resin), Toto Kasei Co., Ltd. trade names: FX280, FX293, FX293S (fluorene skeleton-containing phenoxy resin), Mitsubishi Chemical Co., Ltd. trade names: jER1256, jER4250 (glass transition temperature: less than 85 ° C), jER4275 (Glass transition temperature: 75 ° C), trade name manufactured by Nittetsu Chemical & Materials Co., Ltd .: YP-50 (glass transition temperature: 84 ° C), YP-50S (all bisphenol A skeleton-containing phenoxy resin), YP-70 ( Examples thereof include bisphenol A skeleton / bisphenol F skeleton copolymer phenoxy resin, glass transition temperature: less than 85 ° C., ZX-1356-2 (glass transition temperature: 72 ° C.), and the like. For those for which the glass transition temperature is known, the glass transition temperature is shown.
 変性オレフィン系樹脂は、前駆体としてのオレフィン系樹脂に、変性剤を用いて変性処理を施して得られる、官能基が導入されたオレフィン系樹脂である。 The modified olefin resin is an olefin resin having a functional group introduced, which is obtained by subjecting an olefin resin as a precursor to a modification treatment using a modifier.
 オレフィン系樹脂とは、オレフィン系単量体由来の繰り返し単位を含む重合体をいう。オレフィン系樹脂は、オレフィン系単量体由来の繰り返し単位のみからなる重合体であってもよいし、オレフィン系単量体由来の繰り返し単位と、オレフィン系単量体と共重合可能な単量体由来の繰り返し単位とからなる重合体であってもよい。 The olefin resin refers to a polymer containing a repeating unit derived from an olefin monomer. The olefin-based resin may be a polymer consisting of only repeating units derived from the olefin-based monomer, or the repeating units derived from the olefin-based monomer and a monomer copolymerizable with the olefin-based monomer. It may be a polymer composed of a repeating unit of origin.
 オレフィン系単量体としては、炭素数2~8のα-オレフィンが好ましく、エチレン、プロピレン、1-ブテン、イソブチレン、又は1-ヘキセンがより好ましく、エチレン又はプロピレンがさらに好ましい。これらのオレフィン系単量体は、1種を単独で、あるいは2種以上を組み合わせて用いることができる。
 オレフィン系単量体と共重合可能な単量体としては、酢酸ビニル、(メタ)アクリル酸エステル、スチレン等が挙げられる。ここで、「(メタ)アクリル酸」は、アクリル酸又はメタクリル酸の意味である(以下にて同じ。)。
 これらのオレフィン系単量体と共重合可能な単量体は、1種を単独で、あるいは2種以上を組み合わせて用いることができる。
As the olefin-based monomer, α-olefin having 2 to 8 carbon atoms is preferable, ethylene, propylene, 1-butene, isobutylene, or 1-hexene is more preferable, and ethylene or propylene is further preferable. These olefin-based monomers may be used alone or in combination of two or more.
Examples of the monomer copolymerizable with the olefin-based monomer include vinyl acetate, (meth) acrylic acid ester, and styrene. Here, "(meth) acrylic acid" means acrylic acid or methacrylic acid (the same shall apply hereinafter).
As the monomer copolymerizable with these olefin-based monomers, one type can be used alone, or two or more types can be used in combination.
 オレフィン系樹脂としては、超低密度ポリエチレン(VLDPE)、低密度ポリエチレン(LDPE)、中密度ポリエチレン(MDPE)、高密度ポリエチレン(HDPE)、直鎖状低密度ポリエチレン、ポリプロピレン(PP)、エチレン-プロピレン共重合体、オレフィン系エラストマー(TPO)、エチレン-酢酸ビニル共重合体(EVA)、エチレン-(メタ)アクリル酸共重合体、エチレン-(メタ)アクリル酸エステル共重合体などが挙げられる。 Examples of the olefin resin include ultra-low density polyethylene (VLDPE), low density polyethylene (LDPE), medium density polyethylene (MDPE), high density polyethylene (HDPE), linear low density polyethylene, polypropylene (PP), and ethylene-propylene. Examples thereof include copolymers, olefin-based elastomers (TPO), ethylene-vinyl acetate copolymers (EVA), ethylene- (meth) acrylic acid copolymers, and ethylene- (meth) acrylic acid ester copolymers.
 オレフィン系樹脂の変性処理に用いる変性剤は、分子内に、官能基を有する化合物である。
 官能基としては、カルボキシル基、カルボン酸無水物基、カルボン酸エステル基、水酸基、エポキシ基、アミド基、アンモニウム基、ニトリル基、アミノ基、イミド基、イソシアネート基、アセチル基、チオール基、エーテル基、チオエーテル基、スルホン基、ホスホン基、ニトロ基、ウレタン基、アルコキシシリル基、シラノール基、ハロゲン原子等が挙げられる。官能基を有する化合物は、分子内に2種以上の官能基を有していてもよい。
The modifier used for the modification treatment of the olefin resin is a compound having a functional group in the molecule.
Functional groups include carboxyl group, carboxylic acid anhydride group, carboxylic acid ester group, hydroxyl group, epoxy group, amide group, ammonium group, nitrile group, amino group, imide group, isocyanate group, acetyl group, thiol group and ether group. , Thioether group, sulfone group, phosphone group, nitro group, urethane group, alkoxysilyl group, silanol group, halogen atom and the like. The compound having a functional group may have two or more kinds of functional groups in the molecule.
 変性オレフィン系樹脂の重量平均分子量(Mw)は好ましくは10,000~150,000、より好ましくは、30,000~100,000である。
 変性オレフィン系樹脂の重量平均分子量(Mw)は、テトラヒドロフラン(THF)を溶媒として用いてゲルパーミエーションクロマトグラフィー(GPC)を行い、標準ポリスチレン換算値として求めることができる。
The weight average molecular weight (Mw) of the modified olefin resin is preferably 10,000 to 150,000, more preferably 30,000 to 100,000.
The weight average molecular weight (Mw) of the modified olefin resin can be determined as a standard polystyrene-equivalent value by performing gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
 変性オレフィン系樹脂としては、酸変性オレフィン系樹脂が好ましい。酸変性オレフィン系樹脂とは、オレフィン系樹脂に対して酸又は酸無水物でグラフト変性したものをいう。例えば、オレフィン樹脂に、不飽和カルボン酸又は不飽和カルボン酸無水物(以下、「不飽和カルボン酸等」ということがある。)を反応させて、カルボキシル基又はカルボン酸無水物基を導入(グラフト変性)したものが挙げられる。 As the modified olefin resin, an acid modified olefin resin is preferable. The acid-modified olefin-based resin refers to an olefin-based resin graft-modified with an acid or an acid anhydride. For example, an unsaturated carboxylic acid or an unsaturated carboxylic acid anhydride (hereinafter, may be referred to as "unsaturated carboxylic acid") is reacted with an olefin resin to introduce a carboxyl group or a carboxylic acid anhydride group (graft). Denatured).
 オレフィン系樹脂に反応させる不飽和カルボン酸等としては、マレイン酸、フマル酸、イタコン酸、シトラコン酸、グルタコン酸、テトラヒドロフタル酸、アコニット酸等の不飽和カルボン酸;無水マレイン酸、無水イタコン酸、無水グルタコン酸、無水シトラコン酸、無水アコニット酸、ノルボルネンジカルボン酸無水物、テトラヒドロフタル酸無水物等の不飽和カルボン酸無水物;が挙げられる。
 これらは、1種を単独で、あるいは2種以上を組み合わせて用いることができる。これらの中でも、接着強度がより高い封止材が得られ易いことから、無水マレイン酸が好ましい。
Examples of unsaturated carboxylic acids that react with olefinic resins include unsaturated carboxylic acids such as maleic acid, fumaric acid, itaconic acid, citraconic acid, glutaconic acid, tetrahydrophthalic acid, and aconitic acid; Unsaturated carboxylic acid anhydrides such as glutaconic anhydride, citraconic anhydride, aconitic anhydride, norbornene dicarboxylic acid anhydride, and tetrahydrophthalic acid anhydride;
These can be used individually by 1 type or in combination of 2 or more types. Among these, maleic anhydride is preferable because it is easy to obtain a sealing material having higher adhesive strength.
 オレフィン系樹脂に反応させる不飽和カルボン酸等の量は、オレフィン系樹脂100質量部に対して、好ましくは0.1~5質量部、より好ましくは0.2~3質量部、さらに好ましくは0.2~1質量部である。このようにして得られた酸変性オレフィン系樹脂を含有する接着剤層を硬化させることで、接着強度がより高い封止材を形成することができる。 The amount of unsaturated carboxylic acid or the like to be reacted with the olefin resin is preferably 0.1 to 5 parts by mass, more preferably 0.2 to 3 parts by mass, and further preferably 0 with respect to 100 parts by mass of the olefin resin. .2 to 1 part by mass. By curing the adhesive layer containing the acid-modified olefin resin thus obtained, a sealing material having higher adhesive strength can be formed.
 不飽和カルボン酸単位又は不飽和カルボン酸無水物単位をオレフィン系樹脂へ導入する方法は、特に限定されない。例えば、有機過酸化物類又はアゾニトリル類等のラジカル発生剤の存在下で、オレフィン系樹脂と不飽和カルボン酸等とを、オレフィン系樹脂の融点以上に加熱溶融して反応させる方法、あるいは、オレフィン系樹脂と不飽和カルボン酸等とを有機溶剤に溶解させた後、ラジカル発生剤の存在下で加熱、攪拌して反応させる方法等により、オレフィン系樹脂に不飽和カルボン酸等をグラフト共重合する方法が挙げられる。 The method for introducing the unsaturated carboxylic acid unit or the unsaturated carboxylic acid anhydride unit into the olefin resin is not particularly limited. For example, a method in which an olefin resin and an unsaturated carboxylic acid are heated and melted above the melting point of the olefin resin to react in the presence of a radical generator such as an organic peroxide or an azonitrile, or an olefin. After dissolving the system resin and unsaturated carboxylic acid or the like in an organic solvent, the unsaturated carboxylic acid or the like is graft-copolymerized with the olefin resin by a method of heating, stirring and reacting in the presence of a radical generator. The method can be mentioned.
 酸変性オレフィン系樹脂としては、市販品を用いることもできる。市販品としては、例えば、アドマー(登録商標)(三井化学社製)、ユニストール(登録商標)(三井化学社製)、BondyRam(Polyram社製)、orevac(登録商標)(ARKEMA社製)、モディック(登録商標)(三菱ケミカル社製)等が挙げられる。 A commercially available product can also be used as the acid-modified olefin resin. Examples of commercially available products include Admer (registered trademark) (Mitsui Chemicals), Unistor (registered trademark) (Mitsui Chemicals), BondyRam (Polyram), orevac (registered trademark) (ARKEMA), and the like. Modic (registered trademark) (manufactured by Mitsubishi Chemical Corporation) and the like can be mentioned.
〔硬化剤〕
 接着剤層は硬化剤を含有してもよい。接着剤層が硬化剤を含有することで、接着剤層の硬化性がより高められる。
 硬化剤としては、硬化反応を開始させるものであれば特に限定されないが、接着剤層を紫外線等のエネルギー線により硬化させることが困難であったり、避けるべきであったりする場合があるという観点や、エネルギー線照射装置の導入の必要がないという観点から、加熱により硬化反応を開始させるものが好ましく用いられる。
 硬化剤としては、熱カチオン重合開始剤や、それ以外の硬化剤が挙げられる。
 熱カチオン重合開始剤以外の硬化剤としては、ベンジルメチルアミン、2,4,6-トリスジメチルアミノメチルフェノール等の3級アミン;2-メチルイミダゾール、2-エチル-4-メチルイミダゾール、2-ヘプタデシルイミダゾール等のイミダゾール化合物;三フッ化ホウ素・モノエチルアミン錯体、三フッ化ホウ素・ピペラジン錯体などのルイス酸;等が挙げられる。
[Curing agent]
The adhesive layer may contain a curing agent. When the adhesive layer contains a curing agent, the curability of the adhesive layer is further enhanced.
The curing agent is not particularly limited as long as it initiates the curing reaction, but from the viewpoint that it may be difficult or should be avoided to cure the adhesive layer with energy rays such as ultraviolet rays. From the viewpoint that it is not necessary to introduce an energy ray irradiation device, a device that starts the curing reaction by heating is preferably used.
Examples of the curing agent include a thermal cationic polymerization initiator and other curing agents.
Examples of the curing agent other than the thermal cationic polymerization initiator include tertiary amines such as benzylmethylamine and 2,4,6-trisdimethylaminomethylphenol; 2-methylimidazole, 2-ethyl-4-methylimidazole, and 2-hepta. Examples thereof include imidazole compounds such as decylimidazole; Lewis acids such as boron trifluoride / monoethylamine complex and boron trifluoride / piperazine complex;
 硬化剤は、1種を単独で、あるいは2種以上を組み合わせて用いることができる。
 接着剤層が硬化剤を含有するとき、硬化剤の含有量は特に制限されないが、環状エーテル化合物(A)100質量部に対して、好ましくは0.1~15質量部、より好ましくは1~10質量部、さらに好ましくは1~5質量部である。
As the curing agent, one type can be used alone, or two or more types can be used in combination.
When the adhesive layer contains a curing agent, the content of the curing agent is not particularly limited, but is preferably 0.1 to 15 parts by mass, more preferably 1 to 1 to 100 parts by mass with respect to 100 parts by mass of the cyclic ether compound (A). It is 10 parts by mass, more preferably 1 to 5 parts by mass.
 接着剤層は、硬化剤の少なくとも1種として熱カチオン重合開始剤を含有するものが好ましい。
 熱カチオン重合開始剤を用いることで、接着剤層の硬化性をより正確に制御することができる。
The adhesive layer preferably contains a thermal cationic polymerization initiator as at least one of the curing agents.
By using the thermal cationic polymerization initiator, the curability of the adhesive layer can be controlled more accurately.
 熱カチオン重合開始剤は、加熱によって重合を開始させるカチオン種を発生しうる化合物である。
 熱カチオン重合開始剤としては、スルニホウム塩、第四級アンモニウム塩、ホスホニウム塩、ジアゾニウム塩、ヨードニウム塩等が挙げられる。
The thermal cationic polymerization initiator is a compound capable of generating a cationic species that initiates polymerization by heating.
Examples of the thermal cationic polymerization initiator include sulnifoam salt, quaternary ammonium salt, phosphonium salt, diazonium salt, iodonium salt and the like.
 スルホニウム塩としては、トリフェニルスルホニウムテトラフルオロボレート、トリフェニルスルホニウムヘキサフルオロアンチモネート、トリフェニルスルホニウムヘキサフルオロアルシネート、トリス(4-メトキシフェニル)スルホニウムヘキサフルオロアルシネート、ジフェニル(4-フェニルチオフェニル)スルホニウムヘキサフルオロアルシネート、(4-アセトキシフェニル)メチル(2-メチルベンジル)スルホニウムテトラキス(ペンタフルオロフェニル)ボレート、(4-ヒドロキシフェニル)メチル(4-メチルベンジル)スルホニウムテトラキス(ペンタフルオロフェニル)ボレート、(4-アセトキシフェニル)ベンジル(メチル)スルホニウムテトラキス(ペンタフルオロフェニル)ボレート、ベンジル(4-ヒドロキシフェニル)(メチル)スルホニウムテトラキス(ペンタフルオロフェニル)ボレート等が挙げられる。 Examples of the sulfonium salt include triphenylsulfonium tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, triphenylsulfonium hexafluoroalcinate, tris (4-methoxyphenyl) sulfonium hexafluoroalcinate, and diphenyl (4-phenylthiophenyl) sulfonium. Hexafluoroalcinate, (4-acetoxyphenyl) methyl (2-methylbenzyl) sulfonium tetrakis (pentafluorophenyl) borate, (4-hydroxyphenyl) methyl (4-methylbenzyl) sulfonium tetrakis (pentafluorophenyl) borate, ( Examples thereof include 4-acetoxyphenyl) benzyl (methyl) sulfonium tetrakis (pentafluorophenyl) borate, benzyl (4-hydroxyphenyl) (methyl) sulfonium tetrakis (pentafluorophenyl) borate and the like.
 スルホニウム塩として、市販品を用いることもできる。市販品としては、アデカオプトンSP-150、アデカオプトンSP-170、アデカオプトンCP-66、アデカオプトンCP-77(以上、旭電化社製)、サンエイドSI-60L、サンエイドSI-80L、サンエイドSI-100L、サンエイドSI-B2A、サンエイドSI-B7、サンエイドSI―B3A、サンエイドSI-B3(以上、三新化学社製)、CYRACURE UVI-6974、CYRACURE UVI-6990(以上、ユニオン・カーバイド社製)、UVI-508、UVI-509(以上、ゼネラル・エレクトリック社製)、FC-508、FC-509(以上、ミネソタ・マイニング・アンド・マニュファクチュアリング社製)、CD-1010、CD-1011(以上、サーストマー社製)、CIシリーズの製品(日本曹達社製)等が挙げられる。 A commercially available product can also be used as the sulfonium salt. Commercially available products include Adeca Opton SP-150, Adeka Opton SP-170, Adeka Opton CP-66, Adeka Opton CP-77 (all manufactured by Asahi Denka Co., Ltd.), Sun Aid SI-60L, Sun Aid SI-80L, Sun Aid SI-100L, Sun Aid SI. -B2A, Sun Aid SI-B7, Sun Aid SI-B3A, Sun Aid SI-B3 (above, manufactured by Sanshin Chemical Co., Ltd.), CYRACURE UVI-6974, CYRACURE UVI-6990 (above, manufactured by Union Carbide), UVI-508, UVI-509 (above, General Electric), FC-508, FC-509 (above, Minnesota Mining and Manufacturing), CD-1010, CD-1011 (above, Thirstmer), Examples include CI series products (manufactured by Nippon Soda Co., Ltd.).
 第四級アンモニウム塩としては、テトラブチルアンモニウムテトラフルオロボレート、テトラブチルアンモニウムヘキサフルオロホスフェート、テトラブチルアンモニウムハイドロジェンサルフェート、テトラエチルアンモニウムテトラフルオロボレート、テトラエチルアンモニウムp-トルエンスルホネート、N,N-ジメチル-N-ベンジルアニリニウムヘキサフルオロアンチモネート、N,N-ジメチル-N-ベンジルアニリニウムテトラフルオロボレート、N,N-ジメチル-N-ベンジルピリジニウムヘキサフルオロアンチモネート、N,N-ジエチル-N-ベンジルトリフルオロメタンスルホネート、N,N-ジメチル-N-(4-メトキシベンジル)ピリジニウムヘキサフルオロアンチモネート、N,N-ジエチル-N-(4-メトキシベンジル)トルイジニウムヘキサフルオロアンチモネート等が挙げられる。 Examples of the quaternary ammonium salt include tetrabutylammonium tetrafluoroborate, tetrabutylammonium hexafluorophosphate, tetrabutylammonium hydrogen sulfate, tetraethylammonium tetrafluoroborate, tetraethylammonium p-toluenesulfonate, N, N-dimethyl-N-. Benzylanilinium Hexafluoroammonate, N, N-dimethyl-N-benzylanilinium tetrafluoroborate, N, N-dimethyl-N-benzylpyridinium hexafluoroantimonate, N, N-diethyl-N-benzyltrifluoromethanesulfonate , N, N-Dimethyl-N- (4-methoxybenzyl) pyridinium hexafluoroammonate, N, N-diethyl-N- (4-methoxybenzyl) toluidinium hexafluoroammonate and the like.
 ホスホニウム塩としては、エチルトリフェニルホスホニウムヘキサフルオロアンチモネート、テトラブチルホスホニウムヘキサフルオロアンチモネート等が挙げられる。 Examples of the phosphonium salt include ethyltriphenylphosphonium hexafluoroantimonate and tetrabutylphosphonium hexafluoroantimonate.
 ジアゾニウム塩としては、AMERICURE(アメリカン・キャン社製)、ULTRASET(旭電化社製)等が挙げられる。 Examples of the diazonium salt include AMERICURE (manufactured by American Can) and ULTRASET (manufactured by Asahi Denka Co., Ltd.).
 ヨードニウム塩としては、ジフェニルヨードニウムヘキサフルオロアルシネート、ビス(4-クロロフェニル)ヨードニウムヘキサフルオロアルシネート、ビス(4-ブロモフェニル)ヨードニウムヘキサフルオロアルシネート、フェニル(4-メトキシフェニル)ヨードニウムヘキサフルオロアルシネート等が挙げられる。また、市販品として、UV-9310C(東芝シリコーン社製)、Photoinitiator2074(ローヌ・プーラン社製)、UVEシリーズの製品(ゼネラル・エレクトリック社製)、FCシリーズの製品(ミネソタ・マイニング・アンド・マニュファクチュアリング社製)なども用いることができる。 Examples of the iodonium salt include diphenyl iodonium hexafluoroalcinate, bis (4-chlorophenyl) iodonium hexafluoroalcinate, bis (4-bromophenyl) iodonium hexafluoroalcinate, and phenyl (4-methoxyphenyl) iodonium hexafluoroalcinate. Can be mentioned. In addition, as commercial products, UV-9310C (manufactured by Toshiba Silicone), Photoinitiator 2074 (manufactured by Rhone-Poulenc), UVE series products (manufactured by General Electric), FC series products (Minnesota Mining and Manufacturing) (Manufactured by the company) can also be used.
 熱カチオン重合開始剤は、1種を単独で、あるいは2種以上を組み合わせて用いることができる。 The thermal cationic polymerization initiator can be used alone or in combination of two or more.
 本発明のデバイス封止用接着シートは、接着剤層に含まれる硬化剤の全てが熱カチオン重合開始剤であることが好ましい。
 熱カチオン重合開始剤以外の硬化剤を用いると、接着剤層が着色したり、接着剤層の透明性が低下したりするおそれがある。
 一方、熱カチオン重合開始剤を用いる場合はそのような問題が生じにくいため、接着剤層に含まれる硬化剤の全てが熱カチオン重合開始剤であることで、無色透明性に優れる接着剤層を効率よく形成することができる。
In the adhesive sheet for device encapsulation of the present invention, it is preferable that all of the curing agents contained in the adhesive layer are thermal cationic polymerization initiators.
If a curing agent other than the thermal cationic polymerization initiator is used, the adhesive layer may be colored or the transparency of the adhesive layer may be lowered.
On the other hand, when a thermal cationic polymerization initiator is used, such a problem is unlikely to occur. Therefore, since all the curing agents contained in the adhesive layer are thermal cationic polymerization initiators, an adhesive layer having excellent colorless transparency can be obtained. It can be formed efficiently.
(シランカップリング剤)
 接着剤層は、シランカップリング剤を含有してもよい。シランカップリング剤を含有する接着剤層を硬化させることで、湿熱耐久性により優れる封止材を形成することができる。
(Silane coupling agent)
The adhesive layer may contain a silane coupling agent. By curing the adhesive layer containing the silane coupling agent, it is possible to form a sealing material having better moist heat durability.
 シランカップリング剤としては、公知のシランカップリング剤を用いることができる。なかでも、分子内にアルコキシシリル基を少なくとも1個有する有機ケイ素化合物が好ましい。 As the silane coupling agent, a known silane coupling agent can be used. Of these, an organosilicon compound having at least one alkoxysilyl group in the molecule is preferable.
 シランカップリング剤としては、3-メタクリロキシプロピルメチルジメトキシシラン、3-メタクリロキシプロピルトリメトキシシラン、3-メタクリロキシプロピルメチルジエトキシシラン、3-メタクリロキシプロピルトリエトキシシラン、3-アクリロキシプロピルトリメトキシシラン、8-メタクリロキシオクチルトリメトキシシラン等の(メタ)アクリロイル基を有するシランカップリング剤;
ビニルトリメトキシシラン、ビニルトリエトキシシラン、ジメトキシメチルビニルシラン、ジエトキシメチルビニルシラン、トリクロロビニルシラン、ビニルトリス(2-メトキシエトキシ)シラン、7-オクテニルトリメトキシシラン等のビニル基を有するシランカップリング剤;
2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルメチルジエトキシシラン、3-グリシドキシプロピルトリエトキシシラン、8-グリシドキシオクチルトリメトキシシラン等のエポキシ基を有するシランカップリング剤;
p-スチリルトリメトキシシラン、p-スチリルトリエトキシシラン等のスチリル基を有するシランカップリング剤;
Examples of the silane coupling agent include 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane, and 3-acryloxypropyltri. A silane coupling agent having a (meth) acryloyl group such as methoxysilane and 8-methacryloxyoctyltrimethoxysilane;
A silane coupling agent having a vinyl group such as vinyltrimethoxysilane, vinyltriethoxysilane, dimethoxymethylvinylsilane, diethoxymethylvinylsilane, trichlorovinylsilane, vinyltris (2-methoxyethoxy) silane, and 7-octenyltrimethoxysilane;
2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, 8-glycid A silane coupling agent having an epoxy group such as xioctyltrimethoxysilane;
Silane coupling agent having a styryl group such as p-styryltrimethoxysilane and p-styryltriethoxysilane;
N-(2-アミノエチル)-3-アミノプロピルメチルジメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリエトキシシラン、3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、3-トリエトキシシリル-N-(1,3-ジメチル・ブチリデン)プロピルアミン、N-フェニル-3-アミノプロピルトリメトキシシラン、N-(ビニルベンジル)-2-アミノエチル-3-アミノプロピルトリメトキシシランの塩酸塩、N-(2-アミノエチル)-8-アミノオクチルトリメトキシシラン等のアミノ基を有するシランカップリング剤;
3-ウレイドプロピルトリメトキシシラン、3-ウレイドプロピルトリエトキシシラン等のウレイド基を有するシランカップリング剤;
3-クロロプロピルトリメトキシシラン、3-クロロプロピルトリエトキシシラン等のハロゲン原子を有するシランカップリング剤;
3-メルカプトプロピルメチルジメトキシシラン、3-メルカプトプロピルトリメトキシシラン等のメルカプト基を有するシランカップリング剤;
ビス(トリメトキシシリルプロピル)テトラスルフィド、ビス(トリエトキシシリルプロピル)テトラスルフィド等のスルフィド基を有するシランカップリング剤;
3-イソシアネートプロピルトリメトキシシラン、3-イソシアネートプロピルトリエトキシシラン等のイソシアネート基を有するシランカップリング剤;
アリルトリクロロシラン、アリルトリエトキシシラン、アリルトリメトキシシラン等のアリル基を有するシランカップリング剤;
3-ヒドキシプロピルトリメトキシシラン、3-ヒドキシプロピルトリエトキシシラン等の水酸基を有するシランカップリング剤;等が挙げられる。
 これらの中でも、接着剤層の被着体への接着性向上の観点から、炭素数6以上の直鎖アルキル基を有する長鎖スペーサー型シランカップリング剤を用いることが好ましい。炭素数6以上の直鎖アルキル基を有する長鎖スペーサー型シランカップリング剤としては、8-メタクリロキシオクチルトリメトキシシラン、7-オクテニルトリメトキシシラン、8-グリシドキシオクチルトリメトキシシラン、N-(2-アミノエチル)-8-アミノオクチルトリメトキシシラン等が挙げられ、8-グリシドキシオクチルトリメトキシシランを用いることが好ましい。
 これらのシランカップリング剤は、1種を単独で、あるいは2種以上を組み合わせて用いることができる。
N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropyltriethoxysilane , 3-Aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-triethoxysilyl-N- (1,3-dimethylbutylidene) propylamine, N-phenyl-3-aminopropyltrimethoxysilane, N -A silane coupling agent having an amino group such as hydrochloride of (vinylbenzyl) -2-aminoethyl-3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -8-aminooctyltrimethoxysilane;
Silane coupling agent having a ureido group such as 3-ureidopropyltrimethoxysilane and 3-ureidopropyltriethoxysilane;
Silane coupling agent having halogen atoms such as 3-chloropropyltrimethoxysilane and 3-chloropropyltriethoxysilane;
Silane coupling agent having a mercapto group such as 3-mercaptopropylmethyldimethoxysilane and 3-mercaptopropyltrimethoxysilane;
Silane coupling agent having a sulfide group such as bis (trimethoxysilylpropyl) tetrasulfide and bis (triethoxysilylpropyl) tetrasulfide;
Silane coupling agent having an isocyanate group such as 3-isocyanatepropyltrimethoxysilane and 3-isocyanatepropyltriethoxysilane;
A silane coupling agent having an allyl group such as allyltrichlorosilane, allyltriethoxysilane, and allyltrimethoxysilane;
Examples thereof include a silane coupling agent having a hydroxyl group such as 3-hydroxypropyltrimethoxysilane and 3-hydroxypropyltriethoxysilane; and the like.
Among these, from the viewpoint of improving the adhesiveness of the adhesive layer to the adherend, it is preferable to use a long-chain spacer type silane coupling agent having a linear alkyl group having 6 or more carbon atoms. Examples of the long-chain spacer-type silane coupling agent having a linear alkyl group having 6 or more carbon atoms include 8-methacryloxyoctyltrimethoxysilane, 7-octenyltrimethoxysilane, 8-glycidoxyoctyltrimethoxysilane, and N. -(2-Aminoethyl) -8-aminooctyltrimethoxysilane and the like can be mentioned, and 8-glycidoxyoctyltrimethoxysilane is preferably used.
These silane coupling agents may be used alone or in combination of two or more.
 接着剤層がシランカップリング剤を含有するとき、シランカップリング剤の含有量は、接着剤層全体中、好ましくは0.01~5質量%、より好ましくは0.05~1質量%である。 When the adhesive layer contains a silane coupling agent, the content of the silane coupling agent is preferably 0.01 to 5% by mass, more preferably 0.05 to 1% by mass in the entire adhesive layer. ..
(その他の成分)
 接着剤層は、本発明の効果を妨げない範囲で、その他の成分を含有してもよい。
 その他の成分としては、紫外線吸収剤、帯電防止剤、光安定剤、酸化防止剤、樹脂安定剤、充填剤、顔料、増量剤、軟化剤、粘着付与剤等の添加剤が挙げられる。
 これらは1種単独で、あるいは2種以上を組み合わせて用いることができる。
 接着剤層がこれらの添加剤を含有する場合、その含有量は、目的に合わせて適宜決定することができる。
(Other ingredients)
The adhesive layer may contain other components as long as the effects of the present invention are not impaired.
Examples of other components include additives such as ultraviolet absorbers, antistatic agents, light stabilizers, antioxidants, resin stabilizers, fillers, pigments, bulking agents, softeners, and tackifiers.
These can be used alone or in combination of two or more.
When the adhesive layer contains these additives, the content thereof can be appropriately determined according to the purpose.
(接着剤層)
 接着剤層の形状、大きさ等は特に限定されない。また、短冊状のものであっても、長尺状のものであってもよい。本明細書において「長尺状」とは、幅に対して5倍以上の長さを有する形状をいい、好ましくは10倍若しくはそれ以上の長さを有し、具体的にはロール状に巻き取られて保管又は運搬される程度の長さを有するフィルムの形状をいう。フィルムの幅に対する長さの割合の上限は、特に限定されないが、例えば100,000倍以下としうる。
(Adhesive layer)
The shape, size, etc. of the adhesive layer are not particularly limited. Further, it may be a strip-shaped one or a long one. In the present specification, the "long shape" means a shape having a length of 5 times or more with respect to the width, preferably having a length of 10 times or more, and specifically being wound in a roll shape. The shape of a film that is long enough to be taken, stored, or transported. The upper limit of the ratio of the length to the width of the film is not particularly limited, but may be, for example, 100,000 times or less.
 接着剤層の厚みは、通常1~50μmであり、好ましくは1~25μm、より好ましくは5~25μmである。厚みが上記範囲内にある接着剤層は、封止材の形成材料として好適に用いられる。
 接着剤層の厚みは、公知の厚み計を用いて、JIS K 7130(1999)に準じて測定することができる。
The thickness of the adhesive layer is usually 1 to 50 μm, preferably 1 to 25 μm, and more preferably 5 to 25 μm. An adhesive layer having a thickness within the above range is suitably used as a material for forming a sealing material.
The thickness of the adhesive layer can be measured according to JIS K 7130 (1999) using a known thickness meter.
 接着剤層は、単層構造を有するものであってよいし、多層構造を有するもの(複数の接着剤層が積層されてなるもの)であってもよい。
 接着剤層は、成分が均一なものであってもよいし、成分が不均一なもの(例えば、上記の多層構造を有する接着剤層において、2つの接着剤層の界面で両成分が混ざり合い、見かけ上単層構造になったもの)であってもよい。
The adhesive layer may have a single-layer structure or may have a multi-layer structure (a plurality of adhesive layers are laminated).
The adhesive layer may have a uniform component or a non-uniform component (for example, in the above-mentioned adhesive layer having a multi-layer structure, both components are mixed at the interface between the two adhesive layers. , It may have a single-layer structure in appearance).
 接着剤層の23℃における貯蔵弾性率は、9.5×10Pa以上3.0×10Pa以下であり、好ましくは9.9×10Pa以上2.0×10Pa以下である。また、接着剤層を被封止物に貼付する際にかける圧力を小さくすることができることから、接着剤層の23℃における貯蔵弾性率は、好ましくは1.3×10Pa以下、より好ましくは1.1×10Pa以下、さらに好ましくは1.0×10Pa以下である。 The storage elastic modulus of the adhesive layer at 23 ° C. is 9.5 × 10 5 Pa or more and 3.0 × 10 7 Pa or less, preferably 9.9 × 10 5 Pa or more and 2.0 × 10 7 Pa or less. is there. Further, since it is possible to reduce the pressure applied at the time of sticking the adhesive layer to be sealed was storage modulus at 23 ° C. of the adhesive layer is preferably not more than 1.3 × 10 7 Pa, more preferably Is 1.1 × 10 7 Pa or less, more preferably 1.0 × 10 7 Pa or less.
 接着剤層の23℃における貯蔵弾性率が9.5×10Pa以上であることで、デバイス封止用接着シートを所定の形状に裁断する際、接着剤層を大きく変形させることなく、打抜き刃をデバイス封止用接着シートに押し込むことができる。このため、剥離フィルムの端部の剥離処理がされていない部分に接着剤が付着することが避けられ、剥離フィルムを効率よく剥離することができる。
 23℃における貯蔵弾性率が9.5×10Pa以上の接着剤層は、例えば、環状エーテル化合物(A)として、環状エーテル当量が大きいものを用いることで得られ易くなる。また、環状エーテル化合物(AL)の接着剤層中における含有量を低減することで、接着剤層の23℃における貯蔵弾性率を低下させ得る。さらに、フェノキシ系樹脂のように、比較的剛直な樹脂を用いることで、接着剤層中における環状エーテル化合物(AL)の含有量が多い場合であっても、23℃における貯蔵弾性率が9.5×10Pa以上の接着剤層が得られ易い。
Since the storage elastic modulus of the adhesive layer at 23 ° C. is 9.5 × 10 5 Pa or more, when the adhesive sheet for device encapsulation is cut into a predetermined shape, the adhesive layer is punched without being significantly deformed. The blade can be pushed into the device sealing adhesive sheet. Therefore, it is possible to prevent the adhesive from adhering to the portion of the release film that has not been peeled off, and the release film can be efficiently peeled off.
An adhesive layer having a storage elastic modulus of 9.5 × 10 5 Pa or more at 23 ° C. can be easily obtained by using, for example, a cyclic ether compound (A) having a large cyclic ether equivalent. Further, by reducing the content of the cyclic ether compound (AL) in the adhesive layer, the storage elastic modulus of the adhesive layer at 23 ° C. can be reduced. Further, by using a relatively rigid resin such as a phenoxy resin, the storage elastic modulus at 23 ° C. is 9. even when the content of the cyclic ether compound (AL) in the adhesive layer is large. It is easy to obtain an adhesive layer of 5 × 10 5 Pa or more.
 接着剤層の23℃における貯蔵弾性率が3.0×10Pa以下であることで、その接着剤層は常温で十分な粘着力を有し、貼付性に優れたものとなる。
 23℃における貯蔵弾性率が3.0×10Pa以下の接着剤層は、例えば、環状エーテル化合物(AL)の量を増やすことで得られ易くなる。また、上述したとおり、接着剤層が熱カチオン系重合開始剤を含有する場合には、環状エーテル化合物(A)が、グリシジルエーテル基を有する化合物であることで、接着剤層の23℃における貯蔵弾性率を低下させ、3.0×10Pa以下とし易くなる。
 接着剤層の貯蔵弾性率は、公知の動的粘弾性測定装置を用いて測定することができる。
 具体的には、実施例に記載の方法により測定することができる。
By storage modulus at 23 ° C. of the adhesive layer is not more than 3.0 × 10 7 Pa, the adhesive layer has sufficient adhesive strength at normal temperature, and is excellent in sticking resistance.
Storage modulus at 23 ° C. is 3.0 × 10 7 Pa or less of the adhesive layer, for example, easily obtained by increasing the amount of cyclic ether compound (AL). Further, as described above, when the adhesive layer contains a thermal cationic polymerization initiator, the cyclic ether compound (A) is a compound having a glycidyl ether group, so that the adhesive layer is stored at 23 ° C. lowering the elastic modulus, easily than 3.0 × 10 7 Pa.
The storage elastic modulus of the adhesive layer can be measured using a known dynamic viscoelasticity measuring device.
Specifically, it can be measured by the method described in Examples.
 接着剤層は硬化性を有する。すなわち、接着剤層に対して所定の硬化処理を行うことにより、環状エーテル化合物(A)中の環状エーテル基が反応し、接着剤層が硬化して接着剤硬化物層になる。
 硬化処理としては、加熱処理や光照射処理等が挙げられる。これらは、接着剤層の性質に合わせて適宜決定することができる。
The adhesive layer is curable. That is, by performing a predetermined curing treatment on the adhesive layer, the cyclic ether groups in the cyclic ether compound (A) react, and the adhesive layer is cured to become an adhesive cured product layer.
Examples of the curing treatment include heat treatment and light irradiation treatment. These can be appropriately determined according to the properties of the adhesive layer.
 接着剤硬化物層の90℃における貯蔵弾性率は、好ましくは1×10Pa以上であり、より好ましくは1×10~1×1011Paである。90℃における貯蔵弾性率が1×10Pa以上の接着剤硬化物層は封止性に優れるため、封止材としてより適している。また、接着剤硬化物層形成後に、デバイス封止体の製造のために実施される工程において、接着剤硬化物層の破壊、剥離が防止されやすくなる。
 接着剤硬化物層の貯蔵弾性率は、公知の動的粘弾性測定装置を用いて測定することができる。
 具体的には、実施例に記載の方法により測定することができる。
The storage elastic modulus of the cured adhesive layer at 90 ° C. is preferably 1 × 10 8 Pa or more, and more preferably 1 × 10 9 to 1 × 10 11 Pa. An adhesive cured product layer having a storage elastic modulus of 1 × 10 8 Pa or more at 90 ° C. is more suitable as a sealing material because it has excellent sealing properties. Further, in the step performed for manufacturing the device encapsulant after the adhesive cured product layer is formed, the adhesive cured product layer is easily prevented from being broken or peeled off.
The storage elastic modulus of the cured adhesive layer can be measured using a known dynamic viscoelasticity measuring device.
Specifically, it can be measured by the method described in Examples.
 接着剤硬化物層は接着強度に優れる。接着剤硬化物層の接着強度は、温度23℃、相対湿度50%の条件下で180°剥離試験を行った場合、通常、1~20N/25mm、好ましくは2.5~15N/25mmである。この180°剥離試験は、例えば、温度23℃、相対湿度50%の条件下でJIS Z0237:2009に記載の粘着力の測定方法に準じて行うことができる。 The adhesive cured product layer has excellent adhesive strength. The adhesive strength of the cured adhesive layer is usually 1 to 20 N / 25 mm, preferably 2.5 to 15 N / 25 mm when a 180 ° peeling test is performed under the conditions of a temperature of 23 ° C. and a relative humidity of 50%. .. This 180 ° peeling test can be performed, for example, under the conditions of a temperature of 23 ° C. and a relative humidity of 50% according to the method for measuring the adhesive strength described in JIS Z0237: 2009.
 本発明のデバイス封止用接着シートを用いて、発光デバイス、受光デバイス、表示デバイス等の光関連デバイス中の封止材を形成する場合には、接着剤硬化物層は無色透明性に優れることが好ましい。厚さが15μmの接着剤硬化物層の全光線透過率は、好ましくは85%以上、より好ましくは90%以上である。全光線透過率の上限は特にないが、通常は、99%以下である。
 全光線透過率は、JIS K7361-1:1997に準拠して測定することができる。
When the adhesive sheet for device encapsulation of the present invention is used to form an encapsulant in an optical device such as a light emitting device, a light receiving device, or a display device, the adhesive cured product layer is excellent in colorless transparency. Is preferable. The total light transmittance of the cured adhesive layer having a thickness of 15 μm is preferably 85% or more, more preferably 90% or more. There is no particular upper limit to the total light transmittance, but it is usually 99% or less.
The total light transmittance can be measured according to JIS K7361-1: 1997.
 接着剤硬化物層の水蒸気透過率は、通常0.1~200g・m-2・day-1、好ましくは1~150g・m-2・day-1である。
 水蒸気透過率は、公知のガス透過率測定装置を使用して測定することができる。
The water vapor permeability of the cured adhesive layer is usually 0.1 to 200 g · m -2 · day -1 , preferably 1 to 150 g · m -2 · day -1 .
The water vapor permeability can be measured using a known gas permeability measuring device.
〔剥離フィルム〕
 本発明のデバイス封止用接着シートは、第1剥離フィルムと第2剥離フィルムとを有する。
 本発明のデバイス封止用接着シートを使用する際は、通常、剥離フィルムは剥離除去される。このとき、第1剥離フィルムよりも先に第2剥離フィルムが剥離除去される。第2剥離フィルムを効率よく剥離除去し得ることから、第1剥離フィルムの剥離力よりも、第2剥離フィルムの剥離力が低いことが好ましい。
 以下の説明においては、「第1剥離フィルム」と「第2剥離フィルム」を区別せず、単に、「剥離フィルム」と記載することがある。
[Release film]
The device sealing adhesive sheet of the present invention has a first release film and a second release film.
When using the device sealing adhesive sheet of the present invention, the release film is usually peeled off. At this time, the second release film is peeled off and removed before the first release film. Since the second release film can be efficiently peeled off and removed, it is preferable that the release force of the second release film is lower than the release force of the first release film.
In the following description, the "first release film" and the "second release film" may not be distinguished and may be simply referred to as "release film".
 剥離フィルムは、デバイス封止用接着シートの製造工程においては支持体として機能するとともに、デバイス封止用接着シートを使用するまでの間は、接着剤層の保護シートとして機能する。 The release film functions as a support in the manufacturing process of the adhesive sheet for device encapsulation, and also functions as a protective sheet for the adhesive layer until the adhesive sheet for device encapsulation is used.
 剥離フィルムとしては、従来公知のものを使用することができる。例えば、剥離フィルム用の基材上に剥離層を有するものが挙げられる。剥離層は、公知の剥離剤を用いて形成することができる。 As the release film, a conventionally known one can be used. For example, those having a release layer on a substrate for a release film can be mentioned. The release layer can be formed by using a known release agent.
 剥離フィルム用の基材としては、グラシン紙、コート紙、上質紙等の紙基材;これらの紙基材にポリエチレン等の熱可塑性樹脂をラミネートしたラミネート紙;ポリエチレンテレフタレート樹脂、ポリブチレンテレフタレート樹脂、ポリエチレンナフタレート樹脂、ポリプロピレン樹脂、ポリエチレン樹脂等のプラスチックフィルム;等が挙げられる。
 剥離剤としては、シリコーン系樹脂、オレフィン系樹脂、イソプレン系樹脂、ブタジエン系樹脂等のゴム系エラストマー、長鎖アルキル系樹脂、アルキド系樹脂、フッ素系樹脂等が挙げられる。
 剥離フィルムの厚みは、特に制限はないが、通常20~250μm程度である。
As the base material for the release film, paper base materials such as glassin paper, coated paper, and high-quality paper; laminated paper obtained by laminating a thermoplastic resin such as polyethylene on these paper base materials; polyethylene terephthalate resin, polybutylene terephthalate resin, etc. Plastic films such as polyethylene naphthalate resin, polypropylene resin, and polyethylene resin; and the like.
Examples of the release agent include rubber-based elastomers such as silicone-based resins, olefin-based resins, isoprene-based resins, and butadiene-based resins, long-chain alkyl-based resins, alkyd-based resins, and fluorine-based resins.
The thickness of the release film is not particularly limited, but is usually about 20 to 250 μm.
〔デバイス封止用接着シート〕
 本発明のデバイス封止用接着シートは、前記第1剥離フィルム及び第2剥離フィルムと、これらの剥離フィルムに挟持された前記接着剤層とを有する。
 本発明のデバイス封止用接着シートとしては、第1剥離フィルム/接着剤層/第2剥離フィルム、の3層構造のものが挙げられる。
[Adhesive sheet for device encapsulation]
The adhesive sheet for sealing a device of the present invention has the first release film and the second release film, and the adhesive layer sandwiched between the release films.
Examples of the adhesive sheet for sealing the device of the present invention include a three-layer structure of a first release film / adhesive layer / second release film.
 本発明のデバイス封止用接着シートの製造方法は特に限定されない。例えば、キャスト法を用いて、デバイス封止用接着シートを製造することができる。 The method for manufacturing the adhesive sheet for device encapsulation of the present invention is not particularly limited. For example, a casting method can be used to produce an adhesive sheet for device encapsulation.
 デバイス封止用接着シートをキャスト法により製造する場合、例えば、以下の方法により製造することができる。
 剥離層を有する2枚の剥離フィルム(剥離フィルム(A)と剥離フィルム(B))と、接着剤層を構成する成分を含有する塗工液を用意する。公知の方法を用いて、塗工液を剥離フィルム(A)の剥離層面に塗工し、得られた塗膜を乾燥することで、接着剤層を形成する。次いで、剥離フィルム(B)の剥離層面が接着剤層に接触するように、剥離フィルム(B)を接着剤層上に重ねることで、デバイス封止用接着シートを得ることができる。
When the adhesive sheet for device encapsulation is manufactured by the casting method, for example, it can be manufactured by the following method.
Two release films having a release layer (release film (A) and release film (B)) and a coating liquid containing components constituting the adhesive layer are prepared. An adhesive layer is formed by applying a coating liquid to the release layer surface of the release film (A) using a known method and drying the obtained coating film. Next, the adhesive sheet for device encapsulation can be obtained by stacking the release film (B) on the adhesive layer so that the release layer surface of the release film (B) is in contact with the adhesive layer.
 接着剤層を構成する成分を希釈して塗工液を調製する場合、塗工液の調製に用いる溶剤としては、ベンゼン、トルエンなどの芳香族炭化水素系溶媒;酢酸エチル、酢酸ブチルなどのエステル系溶媒;アセトン、メチルエチルケトン、メチルイソブチルケトンなどのケトン系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタンなどの脂肪族炭化水素系溶媒;シクロペンタン、シクロヘキサン、メチルシクロヘキサンなどの脂環式炭化水素系溶媒;等が挙げられる。
 これらの溶媒は、1種単独で、あるいは2種以上を組み合わせて用いることができる。
 溶媒の含有量は、塗工性等を考慮して適宜決定することができる。
When the coating liquid is prepared by diluting the components constituting the adhesive layer, the solvent used for preparing the coating liquid is an aromatic hydrocarbon solvent such as benzene or toluene; an ester such as ethyl acetate or butyl acetate. System solvent; Ketone solvent such as acetone, methyl ethyl ketone, methyl isobutyl ketone; aliphatic hydrocarbon solvent such as n-pentane, n-hexane, n-heptane; alicyclic hydrocarbon such as cyclopentane, cyclohexane, methylcyclohexane System solvent; and the like.
These solvents can be used alone or in combination of two or more.
The content of the solvent can be appropriately determined in consideration of coatability and the like.
 塗工液を塗工する方法としては、例えば、スピンコート法、スプレーコート法、バーコート法、ナイフコート法、ロールコート法、ブレードコート法、ダイコート法、グラビアコート法等が挙げられる。 Examples of the method of applying the coating liquid include a spin coating method, a spray coating method, a bar coating method, a knife coating method, a roll coating method, a blade coating method, a die coating method, and a gravure coating method.
 塗膜中の溶剤を揮発させ、塗膜を乾燥する方法としては、熱風乾燥、熱ロール乾燥、赤外線照射等、従来公知の乾燥方法が挙げられる。
 塗膜を乾燥するときの条件としては、例えば、80~150℃で30秒から5分間であり、より好ましくは、90~120℃で1分間から4分間である。塗膜を90℃以上で乾燥することにより、5分間以下の乾燥時間でも塗膜を乾燥することが容易であり、生産性に優れる。
Examples of the method of volatilizing the solvent in the coating film to dry the coating film include conventionally known drying methods such as hot air drying, hot roll drying, and infrared irradiation.
The conditions for drying the coating film are, for example, 80 to 150 ° C. for 30 seconds to 5 minutes, and more preferably 90 to 120 ° C. for 1 minute to 4 minutes. By drying the coating film at 90 ° C. or higher, it is easy to dry the coating film even with a drying time of 5 minutes or less, and the productivity is excellent.
 本発明のデバイス封止用接着シートを使用して、デバイス封止体を製造する方法は特に限定されない。例えば、以下の工程(a1)~(a5)や、工程(b1)~(b5)を行うことで、被封止物(デバイス)を封止し、デバイス封止体を製造することができる。 The method for manufacturing the device encapsulant using the device encapsulation adhesive sheet of the present invention is not particularly limited. For example, by performing the following steps (a1) to (a5) and steps (b1) to (b5), the object to be sealed (device) can be sealed and a device sealed body can be manufactured.
工程(a1):デバイス封止用接着シートの第2剥離フィルムを剥離除去し、デバイス封止用中間体を得る。
工程(a2):工程(a1)を行うことで露出した接着剤層を被封止物(デバイス)に貼り付ける。
工程(a3):デバイス封止用中間体から、さらに第1剥離フィルムを剥離除去する。
工程(a4):工程(a3)を行うことで露出した接着剤層を基板(ガラス板、ガスバリアフィルム等)に貼り付ける。
工程(a5):接着剤層を、所定の手段により硬化させ、接着剤硬化物層を形成する。
Step (a1): The second release film of the device sealing adhesive sheet is peeled off to obtain an intermediate for device sealing.
Step (a2): The adhesive layer exposed by performing the step (a1) is attached to the object to be sealed (device).
Step (a3): The first release film is further peeled off from the device encapsulating intermediate.
Step (a4): The adhesive layer exposed by performing the step (a3) is attached to a substrate (glass plate, gas barrier film, etc.).
Step (a5): The adhesive layer is cured by a predetermined means to form an adhesive cured product layer.
工程(b1):デバイス封止用接着シートの第2剥離フィルムを剥離除去し、デバイス封止用中間体を得る。
工程(b2):工程(b1)を行うことで露出した接着剤層を基板(ガラス板、ガスバリアフィルム等)に貼り付ける。
工程(b3):デバイス封止用中間体から、さらに第1剥離フィルムを剥離除去する。
工程(b4):工程(b3)を行うことで露出した接着剤層を被封止物(デバイス)に貼り付ける。
工程(b5):接着剤層を、所定の手段により硬化させ、接着剤硬化物層を形成する。
Step (b1): The second release film of the device sealing adhesive sheet is peeled off to obtain an intermediate for device sealing.
Step (b2): The adhesive layer exposed by performing the step (b1) is attached to a substrate (glass plate, gas barrier film, etc.).
Step (b3): The first release film is further peeled off from the device sealing intermediate.
Step (b4): The adhesive layer exposed by performing the step (b3) is attached to the object to be sealed (device).
Step (b5): The adhesive layer is cured by a predetermined means to form an adhesive cured product layer.
 上記のデバイス封止体を製造する方法において、工程(a2)又は工程(b2)において、接着剤層の被封止物又は基板への貼付けは、作業の簡便性、生産性の観点から、室温(15~35℃、以下にて同じ)環境下で行うことが好ましい。同様に、工程(b4)も室温環境下で行うことが好ましい。 In the above method for manufacturing a device encapsulant, in the step (a2) or the step (b2), the adhesive layer is attached to the object to be sealed or the substrate at room temperature from the viewpoint of convenience of work and productivity. It is preferable to carry out in an environment (15 to 35 ° C., the same below). Similarly, the step (b4) is preferably performed in a room temperature environment.
 本発明のデバイス封止用接着シートにおいては、所定の形状に裁断する際、接着剤層を大きく変形させることなく、打抜き刃をデバイス封止用接着シートに押し込むことができる。このため、剥離フィルムの端部の剥離処理がされていない部分に接着剤が付着することが避けられ、剥離フィルムを効率よく剥離することができる。
 さらに、本発明のデバイス封止用接着シートを構成する接着剤層を用いて形成された接着剤硬化物層は、接着強度及び水蒸気遮断性に優れる。このため、本発明のデバイス封止用接着シートは、デバイス封止体中の封止材の形成材料として好適に用いられる。
In the device sealing adhesive sheet of the present invention, the punching blade can be pushed into the device sealing adhesive sheet without significantly deforming the adhesive layer when cutting into a predetermined shape. Therefore, it is possible to prevent the adhesive from adhering to the portion of the release film that has not been peeled off, and the release film can be efficiently peeled off.
Further, the cured adhesive layer formed by using the adhesive layer constituting the adhesive sheet for sealing the device of the present invention is excellent in adhesive strength and water vapor blocking property. Therefore, the adhesive sheet for device encapsulation of the present invention is suitably used as a material for forming a sealing material in a device encapsulant.
 デバイス封止体は特に限定されない。デバイス封止体としては、発光デバイス、受光デバイス、表示デバイス等の光関連デバイスが挙げられる。接着剤層の透光性が高い場合には、本発明のデバイス封止用接着シートは、光関連デバイス封止体中の封止材の形成材料として用いられることが好ましい。これらの具体例としては、有機ELディスプレイ、有機EL照明等の有機ELデバイス;液晶ディスプレイ;電子ペーパー;無機太陽電池、有機薄膜太陽電池等の太陽電池等;が挙げられる。 The device encapsulant is not particularly limited. Examples of the device sealant include light-related devices such as a light emitting device, a light receiving device, and a display device. When the adhesive layer has high translucency, the adhesive sheet for device encapsulation of the present invention is preferably used as a material for forming a sealing material in an optical device encapsulant. Specific examples of these include organic EL devices such as organic EL displays and organic EL lighting; liquid crystal displays; electronic paper; solar cells such as inorganic solar cells and organic thin-film solar cells;
 本発明のデバイス封止用接着シートを構成する接着剤層から得られる接着剤硬化物層が透明である場合には、本発明のデバイス封止用接着シートは、有機ELディスプレイ、有機EL照明、液晶ディスプレイ、電子ペーパー等のデバイス中の封止材の形成材料として好適に用いられる。 When the adhesive cured product layer obtained from the adhesive layer constituting the device sealing adhesive sheet of the present invention is transparent, the device sealing adhesive sheet of the present invention is an organic EL display, an organic EL lighting, or the like. It is suitably used as a material for forming a sealing material in devices such as liquid crystal displays and electronic papers.
 以下、実施例を挙げて本発明を更に詳細に説明する。但し、本発明は、以下の実施例になんら限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to the following examples.
〔実施例又は比較例で使用した化合物〕
・環状エーテル化合物(AL1):水添ビスフェノールA型グリシジルエーテル系エポキシ樹脂(三菱ケミカル社製、商品名:YX8000、25℃で液体、エポキシ当量:205g/eq)
・環状エーテル化合物(AL2):水添ビスフェノールA型グリシジルエーテル系エポキシ樹脂(三菱ケミカル社製、商品名:YX8034、25℃で液体、エポキシ当量:270g/eq)
・バインダー樹脂(B1):(フェノキシ樹脂、三菱ケミカル社製、商品名:YX7200B35、ガラス転移温度(Tg):150℃)
・硬化剤(C1):熱カチオン重合開始剤:ベンジル(4-ヒドロキシフェニル)(メチル)スルホニウムテトラキス(ペンタフルオロフェニル)ボレート(三新化学社製、商品名:サンエイドSI-B3)
・硬化剤(C2):イミダゾール系硬化剤(四国化成工業社製、商品名:キュアゾール2E4MZ)
・シランカップリング剤(D1):8-グリシドキシオクチルトリメトキシシラン(信越化学工業社製、商品名:KBM4803)
・剥離フィルム(E1):リンテック株式会社製、商品名:SP-PET752150
・剥離フィルム(E2):リンテック株式会社製、商品名:SP-PET381130
[Compounds used in Examples or Comparative Examples]
-Cyclic ether compound (AL1): Hydrogenated bisphenol A type glycidyl ether epoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: YX8000, liquid at 25 ° C., epoxy equivalent: 205 g / eq)
-Cyclic ether compound (AL2): Hydrogenated bisphenol A type glycidyl ether epoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: YX8034, liquid at 25 ° C., epoxy equivalent: 270 g / eq)
Binder resin (B1): (Phenoxy resin, manufactured by Mitsubishi Chemical Corporation, trade name: YX7200B35, glass transition temperature (Tg): 150 ° C.)
-Curing agent (C1): Thermal cationic polymerization initiator: Benzyl (4-hydroxyphenyl) (methyl) Sulfonium tetrakis (pentafluorophenyl) borate (manufactured by Sanshin Chemical Co., Ltd., trade name: Sun Aid SI-B3)
-Curing agent (C2): Imidazole-based curing agent (manufactured by Shikoku Chemicals Corporation, trade name: Curesol 2E4MZ)
-Silane coupling agent (D1): 8-glycidoxyoctyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KBM4803)
-Release film (E1): manufactured by Lintec Corporation, trade name: SP-PET752150
-Release film (E2): manufactured by Lintec Corporation, trade name: SP-PET381130
〔実施例1〕
 環状エーテル化合物(AL1)130質量部、バインダー樹脂(B1)100質量部、硬化剤(C1)3.8質量部、シランカップリング剤(D1)0.2質量部をメチルエチルケトンに溶解し、塗工液を調製した。
 この塗工液を剥離フィルム(E1)(第1剥離フィルム)の剥離処理面上に塗工し、得られた塗膜を100℃で2分間乾燥し、厚さが15μmの接着剤層を形成した。この接着剤層の上に、剥離フィルム(E2)(第2剥離フィルム)の剥離処理面を貼り合わせてデバイス封止用接着シートを得た。
[Example 1]
130 parts by mass of the cyclic ether compound (AL1), 100 parts by mass of the binder resin (B1), 3.8 parts by mass of the curing agent (C1), and 0.2 parts by mass of the silane coupling agent (D1) are dissolved in methyl ethyl ketone and coated. The solution was prepared.
This coating liquid is applied onto the peeling surface of the release film (E1) (first release film), and the obtained coating film is dried at 100 ° C. for 2 minutes to form an adhesive layer having a thickness of 15 μm. did. The peeling-treated surface of the release film (E2) (second release film) was bonded onto this adhesive layer to obtain an adhesive sheet for device encapsulation.
〔実施例2、比較例1、2〕
 接着剤層を構成する各成分の種類及び量を第1表に記載のものに変更したこと以外は、実施例1と同様にしてデバイス封止用接着シートを得た。
[Example 2, Comparative Examples 1 and 2]
An adhesive sheet for device encapsulation was obtained in the same manner as in Example 1 except that the types and amounts of the components constituting the adhesive layer were changed to those shown in Table 1.
 実施例1、2、比較例1、2で得たデバイス封止用接着シートについて、以下の試験を行った。結果を第1表に示す。 The following tests were performed on the device sealing adhesive sheets obtained in Examples 1 and 2 and Comparative Examples 1 and 2. The results are shown in Table 1.
(1)接着剤層の貯蔵弾性率
 実施例又は比較例で得たデバイス封止用接着シートの接着剤層を、ラミネーターを用いて23℃で厚さ約1mmとなるまで積層し、得られた積層体を測定用試料として用いて、その貯蔵弾性率を測定した。
 すなわち、この測定用試料について、貯蔵弾性率測定装置(Anton Paar社製、商品名:Physica MCR301)を使用し、周波数1Hz、ひずみ1%、昇温速度3℃/分の条件で、-20~+150℃の温度範囲の貯蔵弾性率を測定した。23℃における測定結果を第1表に示す。
(1) Storage Elastic Modulus of Adhesive Layer The adhesive layer of the adhesive sheet for device encapsulation obtained in Example or Comparative Example was laminated at 23 ° C. to a thickness of about 1 mm using a laminator, and obtained. The storage elastic modulus was measured using the laminate as a measurement sample.
That is, for this measurement sample, a storage elastic modulus measuring device (manufactured by Antonio Par, trade name: Physica MCR301) was used under the conditions of a frequency of 1 Hz, a strain of 1%, and a temperature rise rate of 3 ° C./min. The storage elastic modulus in the temperature range of + 150 ° C. was measured. The measurement results at 23 ° C. are shown in Table 1.
(2)接着剤硬化物層の貯蔵弾性率
 実施例又は比較例で得たデバイス封止用接着シートの接着剤層を、ラミネーターを用いて23℃で厚さ200μmとなるまで積層し、得られた積層体を110℃で1時間加熱して、その硬化物を得た。この硬化物を測定用試料として用いて、その貯蔵弾性率を測定した。
 すなわち、この測定用試料について、貯蔵弾性率測定装置(TAインスツルメント社製、商品名:DMAQ800)を使用し、周波数11Hz、振幅5μm、昇温速度3℃/分の条件で、-20℃~+150℃の温度範囲の貯蔵弾性率を測定した。90℃における測定結果を第1表に示す。
(2) Storage Elastic Modulus of Cured Adhesive Layer The adhesive layer of the adhesive sheet for device encapsulation obtained in Example or Comparative Example was laminated at 23 ° C. to a thickness of 200 μm using a laminator, and obtained. The laminated body was heated at 110 ° C. for 1 hour to obtain a cured product thereof. This cured product was used as a measurement sample, and its storage elastic modulus was measured.
That is, for this measurement sample, a storage elastic modulus measuring device (manufactured by TA Instruments, trade name: DMAQ800) was used, and the temperature was -20 ° C. The storage elastic modulus in the temperature range of ~ + 150 ° C. was measured. The measurement results at 90 ° C. are shown in Table 1.
(3)接着剤層の被封止物への貼付適性評価
 実施例、比較例で得たデバイス封止用接着シートを裁断し、幅50mm長さ150mmの試験片を得た。得られた試験片の第2剥離フィルムを剥がして露出させた接着剤層を、温度23℃、相対湿度50%の条件下で無アルカリガラスに重ね、さらに圧着ロールを用いて、0.5MPaの圧力を加えた。接着剤層の無アルカリガラスからの浮きの状態を観察し、浮きが無いものをA、浮きが発生したものをBと評価した。
(3) Evaluation of Adhesive Layer Adhesive Adhesiveness to Enclosed Material The device-sealing adhesive sheet obtained in Examples and Comparative Examples was cut to obtain a test piece having a width of 50 mm and a length of 150 mm. The adhesive layer exposed by peeling off the second release film of the obtained test piece was laminated on non-alkali glass under the conditions of a temperature of 23 ° C. and a relative humidity of 50%, and further, using a pressure-bonding roll, 0.5 MPa. Pressure was applied. The state of floating of the adhesive layer from the non-alkali glass was observed, and the one without floating was evaluated as A, and the one with floating was evaluated as B.
(4)デバイス封止用接着シートの裁断加工性評価
 実施例、比較例で得たデバイス封止用接着シートを、エアー式試料裁断装置を用いて、縦150mm横165mmのサイズに裁断した。
 具体的には、デバイス封止用接着シートの第2剥離フィルム側から、上記サイズの打ち抜き刃を押し込むことにより、デバイス封止用接着シートを裁断し、試験片を得た。
 得られた試験片の第2剥離フィルムを剥離除去した。このとき、接着剤層の第1剥離フィルムからの剥がれが無いものをA、第2剥離フィルムの端部への接着剤層の付着が発生し、接着剤層が第1剥離フィルムから剥がれてしまったものをBと評価した。
(4) Evaluation of Cutability of Adhesive Sheet for Device Encapsulation The adhesive sheet for device encapsulation obtained in Examples and Comparative Examples was cut to a size of 150 mm in length and 165 mm in width by using an air-type sample cutting device.
Specifically, the adhesive sheet for device encapsulation was cut by pushing a punching blade of the above size from the second release film side of the adhesive sheet for device encapsulation to obtain a test piece.
The second release film of the obtained test piece was peeled off. At this time, if the adhesive layer is not peeled off from the first release film, the adhesive layer adheres to the edge of the second release film, and the adhesive layer peels off from the first release film. Was evaluated as B.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 第1表から以下のことが分かる。
 実施例1、2で得られたデバイス封止用接着シートの接着剤層は、23℃における貼付性に優れている。
 さらに、これらのデバイス封止用接着シートは裁断加工性にも優れており、剥離フィルムを効率よく剥離除去することができる。
 一方、比較例1で得られたデバイス封止用接着シートの接着剤層は、23℃における貼付性に優れているが、接着剤層の23℃における貯蔵弾性率が低すぎるため、このデバイス封止用接着シートは裁断加工性に劣っている。
 また、比較例2で得られたデバイス封止用接着シートの接着剤層は、23℃における貯蔵弾性率が高すぎるため、貼付性に劣っている。
The following can be seen from Table 1.
The adhesive layer of the device sealing adhesive sheet obtained in Examples 1 and 2 has excellent adhesiveness at 23 ° C.
Further, these adhesive sheets for sealing the device are also excellent in cutting processability, and the release film can be efficiently peeled off and removed.
On the other hand, the adhesive layer of the adhesive sheet for device encapsulation obtained in Comparative Example 1 has excellent adhesiveness at 23 ° C, but the storage elastic modulus of the adhesive layer at 23 ° C is too low, so that the device is sealed. The adhesive sheet for stopping is inferior in cutting workability.
Further, the adhesive layer of the adhesive sheet for device encapsulation obtained in Comparative Example 2 is inferior in stickability because the storage elastic modulus at 23 ° C. is too high.

Claims (11)

  1.  第1剥離フィルム及び第2剥離フィルムと、前記第1剥離フィルム及び第2剥離フィルムに挟持された接着剤層とを有するデバイス封止用接着シートであって、以下の要件(I)及び要件(II)を満たすデバイス封止用接着シート。
    要件(I):前記接着剤層は、環状エーテル基を有する化合物を1種又は2種以上含有する層である。
    要件(II):前記接着剤層の23℃における貯蔵弾性率が、9.5×10Pa以上3.0×10Pa以下である。
    An adhesive sheet for device encapsulation having a first release film and a second release film and an adhesive layer sandwiched between the first release film and the second release film, wherein the following requirements (I) and requirements (I) Adhesive sheet for device encapsulation that satisfies II).
    Requirement (I): The adhesive layer is a layer containing one or more compounds having a cyclic ether group.
    Requirement (II): The storage elastic modulus of the adhesive layer at 23 ° C. is 9.5 × 10 5 Pa or more and 3.0 × 10 7 Pa or less.
  2.  前記環状エーテル基を有する化合物の少なくとも1種が、25℃で液体の化合物である、請求項1に記載のデバイス封止用接着シート。 The adhesive sheet for device encapsulation according to claim 1, wherein at least one of the compounds having a cyclic ether group is a compound that is liquid at 25 ° C.
  3.  25℃で液体の、環状エーテル基を有する化合物の含有量が、前記接着剤層全体に対して53質量%以上である、請求項2に記載のデバイス封止用接着シート。 The adhesive sheet for device encapsulation according to claim 2, wherein the content of the compound having a cyclic ether group, which is liquid at 25 ° C., is 53% by mass or more with respect to the entire adhesive layer.
  4.  25℃で液体の、環状エーテル基を有する化合物の含有量が、前記接着剤層全体に対して65質量%以下である、請求項2又は3に記載のデバイス封止用接着シート。 The adhesive sheet for device encapsulation according to claim 2 or 3, wherein the content of the compound having a cyclic ether group, which is liquid at 25 ° C., is 65% by mass or less with respect to the entire adhesive layer.
  5.  前記接着剤層が、さらに硬化剤を含有するものであって、硬化剤の少なくとも1種が熱カチオン重合開始剤である、請求項1~4のいずれかに記載のデバイス封止用接着シート。 The adhesive sheet for device encapsulation according to any one of claims 1 to 4, wherein the adhesive layer further contains a curing agent, and at least one of the curing agents is a thermal cationic polymerization initiator.
  6.  前記硬化剤の全てが熱カチオン重合開始剤である、請求項5に記載のデバイス封止用接着シート。 The adhesive sheet for device encapsulation according to claim 5, wherein all of the curing agents are thermal cationic polymerization initiators.
  7.  前記環状エーテル基を有する化合物の少なくとも1種が、グリシジルエーテル基を有する化合物である、請求項5又は6に記載のデバイス封止用接着シート。 The adhesive sheet for device encapsulation according to claim 5 or 6, wherein at least one of the compounds having a cyclic ether group is a compound having a glycidyl ether group.
  8.  前記環状エーテル基を有する化合物の少なくとも1種が、脂環式エポキシ樹脂である、請求項5~7のいずれかに記載のデバイス封止用接着シート。 The adhesive sheet for device encapsulation according to any one of claims 5 to 7, wherein at least one of the compounds having a cyclic ether group is an alicyclic epoxy resin.
  9.  前記接着剤層がバインダー樹脂を含有するものであって、バインダー樹脂の少なくとも1種が、ガラス転移温度(Tg)が60℃以上のバインダー樹脂である、請求項1~8のいずれかに記載のデバイス封止用接着シート。 The invention according to any one of claims 1 to 8, wherein the adhesive layer contains a binder resin, and at least one of the binder resins is a binder resin having a glass transition temperature (Tg) of 60 ° C. or higher. Adhesive sheet for device encapsulation.
  10.  前記接着剤層を硬化させて得られる層の90℃における貯蔵弾性率が、1×10Pa以上である、請求項1~9のいずれかに記載のデバイス封止用接着シート。 The adhesive sheet for device encapsulation according to any one of claims 1 to 9, wherein the layer obtained by curing the adhesive layer has a storage elastic modulus at 90 ° C. of 1 × 10 8 Pa or more.
  11.  光関連デバイス中の封止材の形成に用いられる、請求項1~10のいずれかに記載のデバイス封止用接着シート。 The device sealing adhesive sheet according to any one of claims 1 to 10, which is used for forming a sealing material in an optical device.
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