WO2020228595A1 - 投影镜头及激光投影设备 - Google Patents

投影镜头及激光投影设备 Download PDF

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Publication number
WO2020228595A1
WO2020228595A1 PCT/CN2020/089122 CN2020089122W WO2020228595A1 WO 2020228595 A1 WO2020228595 A1 WO 2020228595A1 CN 2020089122 W CN2020089122 W CN 2020089122W WO 2020228595 A1 WO2020228595 A1 WO 2020228595A1
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Prior art keywords
lens
galvanometer
projection
light
group
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Ceased
Application number
PCT/CN2020/089122
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English (en)
French (fr)
Inventor
阴亮
李晓平
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Qingdao Hisense Laser Display Co Ltd
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Qingdao Hisense Laser Display Co Ltd
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Publication of WO2020228595A1 publication Critical patent/WO2020228595A1/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/142—Adjusting of projection optics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
    • G02B13/0055—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras employing a special optical element
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
    • G02B13/0055—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras employing a special optical element
    • G02B13/0065—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras employing a special optical element having a beam-folding prism or mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/16—Cooling; Preventing overheating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings

Definitions

  • This application relates to the field of laser projection, in particular to a projection lens and laser projection equipment.
  • a projection device is a device that can project an image onto a screen.
  • projection equipment usually includes: a light source, an optical machine, and a projection lens.
  • the light source is used to provide illumination for the light machine.
  • the light source can be a monochromatic laser light source to excite the fluorescent wheel to generate three-color light, or it can be a three-color laser light source.
  • the core component of the light machine is a light valve, which is a light modulation element.
  • the light beam emitted by the light source passes through The illuminating light path of the light engine is shaped into a beam conforming to the predetermined incident angle and shape and then irradiated on the surface of the light valve.
  • the light valve is a DMD digital micro-mirror array
  • the DMD is a reflective light valve element.
  • the reflected light beam is incident on the projection lens for imaging.
  • an embodiment of the present application provides a projection lens, including: a galvanometer, and a refraction system and a reflection system arranged in sequence along the direction in which the image beam is incident and transmitted, the galvanometer and the refraction system are located in the The same side of the reflection system;
  • the galvanometer is used to perform offset processing on the image beam
  • the refraction system is used to refract the image beam entering the refraction system to the reflection system;
  • the reflection system is used to reflect and image the image beam entering the reflection system to a projection screen.
  • the embodiment of the present application also provides a projection lens, including: a first mirror group, a reflective galvanometer and a second mirror group, the reflective galvanometer is located between the first mirror group and the second mirror group;
  • the first mirror group is used to receive the light emitted by the light valve and direct the light to the reflective galvanometer;
  • the reflective galvanometer is used to reflect the light emitted from the first mirror group to the reflective galvanometer to the second mirror group, and deflect the light through vibration;
  • the second mirror group is used to shoot the light from the reflective galvanometer to the second mirror group toward the screen.
  • Fig. 1 is a schematic structural diagram of a laser projection device provided in the related art
  • FIG. 2 is a schematic diagram of the displacement of pixels in the projected image at the light valve end when the optical lens in the galvanometer is swung to different positions;
  • Fig. 3 is a schematic structural diagram of a projection lens provided by an embodiment of the present application.
  • FIG. 4 is a schematic diagram of a scene in which a galvano mirror performs offset processing on an image beam according to an embodiment of the present application
  • FIG. 5 is a schematic diagram of a scene where another galvanometer performs offset processing on an image beam according to an embodiment of the present application
  • FIG. 6 is a schematic diagram of a scene in which another galvanometer performs offset processing on an image beam according to an embodiment of the present application
  • FIG. 7 is a schematic structural diagram of another projection lens provided by an embodiment of the present application.
  • FIG. 8 is a schematic structural diagram of another projection lens provided by an embodiment of the present application.
  • FIG. 9 is a schematic structural diagram of still another projection lens provided by an embodiment of the present application.
  • FIG. 10 is a schematic structural diagram of still another projection lens provided by an embodiment of the present application.
  • FIG. 11 is a schematic structural diagram of still another projection lens provided by an embodiment of the present application.
  • FIG. 12 is a schematic structural diagram of a laser projection device provided by an embodiment of the present application.
  • FIG. 13 is a schematic structural diagram of another laser projection device provided by an embodiment of the present application.
  • FIG. 14 is a schematic structural diagram of an ultra-short throw laser projection device provided by an embodiment of the present application.
  • the display screen of laser display products can reach 4K resolution.
  • 4K resolution means that the pixel value of each line in the display screen is greater than or equal to 3840, usually referring to the resolution of 3840 ⁇ 2160.
  • the laser display product may be a laser TV.
  • a low-resolution light valve and a galvanometer are usually used in laser projection equipment to achieve a high-resolution display effect.
  • a light valve with 2K or 3K resolution is used in conjunction with a galvanometer, and the galvanometer is used to displace the beam to achieve the effect of improving the definition, so as to achieve a display effect close to 4K resolution.
  • the galvanometer usually includes an optical lens and an electromagnetic driver. The electromagnetic driver is used to drive the optical lens to swing at a specified angle, and the specified angle is the deflection angle of the optical lens in the galvanometer.
  • Fig. 1 is a schematic structural diagram of a laser projection device provided in the related art.
  • the laser projection device 1 includes a light valve 10, a TIR prism 11, a galvanometer 12, and a projection lens 13 arranged in sequence.
  • the light valve 10 is used to generate an image beam when illuminated.
  • the light valve may be a digital micro mirror device (English: digital micro mirror device, DMD for short).
  • the TIR prism 11 is used to reflect the image beam to the galvanometer.
  • the galvanometer 12 is used to perform offset processing on the image beam output from the light valve 10 and transmit the offset image beam to the projection lens 13.
  • the projection lens 13 is used to reflect and/or refract the image beam, and then project the image beam onto the projection screen.
  • the projection lens may be a 4K ultra-short throw projection lens.
  • FIG. 2 is a schematic diagram of the displacement of pixels in the projected image at the light valve end when the optical lens in the galvanometer is swung to different positions.
  • M1 is the equivalent position of the pixels in the projected image at the light valve end
  • M2 is when the optical lens is swung to the second position
  • the pixels in the projected image are at the light valve end. Equivalent position.
  • the displacement distance of the pixels of the projected image is determined according to the pixel size of the light valve. In practical applications, if the shift distance m of the pixels of the projected image has a shift tolerance g, the shift tolerance range is (m-g) to (m+g).
  • the optical lens is driven to rapidly swing at a specified angle through the electromagnetic driver to realize the offset processing of the image beam by the galvanometer.
  • the offset processing means that the light valve converts the high-resolution image received by the laser projection device, such as a 4K display image, into two or four frame projection images, and the optical lens can project the two or four frames
  • the pixels of the image are relatively shifted, so that the imaging images of the two or four frames of projected images on the projection screen are not completely overlapped.
  • the two or four frames of projected images can be equivalent to one frame Depending on the picture. Since the imaging images of the two or four frames of projection images on the projection screen do not completely overlap, the resolution of the visual image is greater than the resolution of each frame of the projected image, thereby realizing the high-resolution display effect of the laser TV.
  • the visual picture refers to the picture perceived by the human eye.
  • the frequency of the light valve is the same as the frequency of the galvanometer, and the frequency of the visual image is half of the frequency of the light valve.
  • the input frequency of the display image of the laser projection device is 60Hz
  • the input 4K display image with a resolution of 3840 ⁇ 2160 is converted into two frames of projection images with a resolution of 2716 ⁇ 1528.
  • the light valve and the optical lens in the galvanometer The frequency of the two frames of projection images is 120Hz, and the optical lens relatively shifts the pixels of the two frames of projected images, so that the imaging images of the two frames of projected images on the projection screen are not completely overlapped.
  • the frequency of the visual image is 60 Hz.
  • the galvanometer is arranged between the light valve and the projection lens, the distance between the light valve and the projection lens in the laser projection equipment needs to be left to accommodate the galvanometer structure, which results in a large rear working distance of the lens. That is, the back focus of the projection lens is long, which causes the laser projection device to be large in size and difficult to compress, which is not conducive to the miniaturization of the laser projection device.
  • the galvanometer will generate a large amount of heat energy during the working process, and the space between the light valve and the projection lens is highly airtight, it is difficult to dissipate heat, resulting in a high temperature in the space.
  • the temperature of the space can reach 70°C (degrees Celsius) to 80°C. Excessive temperature may affect the normal operation of the light valve, galvanometer and projection lens. Therefore, when designing laser projection equipment, it is necessary to consider factors such as the back working distance and heat dissipation of the galvanometer, which increases the difficulty of designing the laser projection equipment.
  • the light valve will generate on light and off light when it receives light.
  • on light refers to the light beam generated by the light valve and transmitted to the projection lens, that is, the image light beam
  • off light refers to the light beam generated by the light valve that is not transmitted to the projection lens. Since the off light needs to avoid entering the projection lens during transmission, the off light usually avoids the transmission of the optical lens in the galvanometer.
  • the off light may irradiate the electromagnetic drive in the galvanometer, and the electromagnetic drive in the electromagnetic drive
  • the coil is highly sensitive to light and heat. When the off light is irradiated on the electromagnetic coil, it will affect the normal operation of the electromagnetic coil, resulting in poor working stability of the galvanometer.
  • FIG. 3 is a schematic structural diagram of a projection lens provided by an embodiment of the present application.
  • the projection lens 20 includes a galvanometer 201, and a refraction system 202 and a reflection system 203 arranged in sequence along the direction X in which the image beam is incident and transmitted.
  • the galvanometer 201 and the refraction system 202 are located on the same side of the reflection system 203.
  • the galvanometer 201 is located between the refraction system 202 and the reflection system 203 as an example for description.
  • the galvanometer may also be located inside the refraction system, which is not limited in the embodiment of the present application.
  • the galvanometer 201 is used to offset the image beam.
  • the galvanometer includes an optical lens and a driving component; the driving component is used to drive the optical lens to swing at a specified angle according to the target frequency.
  • the driving component may be an electromagnetic driver.
  • the refraction system 202 is used to refract the image beam entering the refraction system 202 to the reflection system 203.
  • the reflection system 203 is used to reflect and image the image beam entering the reflection system 203 to the projection screen.
  • the galvanometer is arranged in the projection lens, compared with related technologies, the distance from the light valve to the projection lens in the laser projection device can be shortened, thereby reducing the laser projection
  • the volume of the device simplifies the structure of the laser projection device, which is conducive to miniaturization of the laser projection device.
  • the galvanometer is placed between the TIR prism and the projection lens in the related art, the temperature of the galvanometer is relatively high, and the galvanometer is a heating element, which will cause the temperature of the rear group of the projection lens to be too high, thereby affecting Projection lens analysis. If the galvanometer is placed in the projection lens, heat dissipation is easier, and a heat source is reduced at the rear group of the projection lens, which reduces the temperature at the rear group of the projection lens, which is beneficial to the analysis of the projection lens.
  • the galvanometer proposed in the embodiment of this application is placed in the projection lens, which avoids the temperature affecting the normal operation of the galvanometer and the projection lens, and reduces the cost of the projection lens. Design difficulty.
  • the electromagnetic coil will not generate additional heat due to light, and compared with related technologies, it can reduce the heat generated by the galvanometer during the working process.
  • the specified angle of the swing of the optical lens is negatively related to the incident angle of the image beam on the light incident surface of the optical lens.
  • the incident angle is less than 16°.
  • the image beam incident on the galvanometer is a parallel beam (that is, the incident angle of each light in the image beam is the same)
  • the image The displacement distance of each pixel of the projected image corresponding to the light beam is equal, so that the offset of each field of view in the projection lens to the projection screen is consistent, which can ensure the high-resolution display of the visual image.
  • the offset of the field of view refers to the actual displacement distance of the field of view.
  • the angles of the image beams incident on the galvanometer in each field of view are different, so that the offset of each field of view to the projection screen is different.
  • the position of the galvanometer in the projection lens can be set so that the incident angle of the image beam on the light incident surface of the optical lens is smaller than the specified angle threshold, so that when the optical lens swings, the difference between different pixels in the projected image corresponding to the image beam The deviation of the shift distance is small, and the offset of each field of view in the projection lens is within the tolerance range, which meets the high-resolution display requirements of the visual image.
  • the specified angle of the swing of the optical lens of the galvanometer is also related to the magnification of the part of the projection lens between the galvanometer and the light valve, that is, it is related to the position of the galvanometer in the projection lens.
  • the process of determining the specified angle of the swing of the optical lens in the galvanometer and the setting position of the galvanometer in the projection lens includes: setting the galvanometer in the projection lens where the image beam is close to the parallel beam ; Calculate the specified angle of the optical lens swing in the galvanometer based on the specific light in the image beam; calculate the predicted displacement distance of the pixels of the projection image corresponding to the image beam according to the specified angle; when the absolute value of the predicted displacement distance is in the target When the shift distance is within the shift tolerance range, it is determined that the position can be used to set the galvanometer.
  • the above-mentioned specific light may be the chief light of the near-center field of view (referring to the field of view transmitted along the optical axis), and the target displacement distance is determined by the pixel size of the light valve.
  • the galvanometer is a transmissive lens as an example for description in conjunction with the drawings.
  • 4 and 5 are respectively schematic diagrams of scenes in which a galvano mirror performs offset processing on an image beam according to an embodiment of the present application.
  • the specified angle of the optical lens swing in the galvanometer is ⁇
  • the thickness of the optical lens is D.
  • the refractive index of the optical lens is n
  • the magnification of the part of the projection lens between the galvanometer and the projection screen is ⁇
  • the magnification of the projection lens is ⁇ 0
  • the transmission direction of the specific light incident on the optical lens is the same as that of the projection lens.
  • the included angle of the optical axis direction is ⁇ as an example, and the process of determining the specified angle of the swing of the optical lens in the galvanometer and the setting position of the galvanometer in the projection lens will be described.
  • the first step is to calculate the specified angle of swing of the optical lens in the galvanometer according to the specific light in the image beam.
  • the incident angle of the specific light on the optical lens is ⁇ + ⁇
  • the refraction angle corresponds to the displacement of the specific light after passing through the optical lens
  • the displacement of the specific light ray refers to the distance between the incident position of the specific light ray on the optical lens and the exit position of the specific light ray on the optical lens on a plane perpendicular to the optical axis of the projection lens.
  • the refractive index n of the optical lens in the galvanometer the thickness D of the optical lens, the magnification ⁇ of the part of the projection lens between the galvanometer and the projection screen, and the magnification ⁇ 0 of the projection lens are all known values, it can be based on the above The formula calculates the specified angle ⁇ of the optical lens swing.
  • the second step is to calculate the predicted displacement distance of the pixel of the projected image corresponding to the image beam according to the specified angle.
  • the maximum incident angle of the light in the image beam on the optical lens is q.
  • the optical lens swings to the second position the dotted line in Figure 5 indicates the position
  • the incident angle of the light on the optical lens q1 q+ ⁇
  • the angle of refraction correspondingly, the displacement of the light after passing through the optical lens
  • FIG. 6 is a schematic diagram of a scene in which another galvanometer performs offset processing on an image beam according to an embodiment of the present application.
  • the deflection angle tolerance of the optical lens in the galvanometer is ⁇ .
  • ⁇ 0.05°, for example, ⁇ 0.03°.
  • the predicted displacement distance of the pixel corresponding to the light in the image beam at the screen end is h6 ⁇ .
  • the relationship between the absolute value of the predicted shift distance and the shift tolerance range of the target shift distance can be determined.
  • determine the position can be used to set the galvanometer, when the absolute value of the predicted shift distance is not within the shift tolerance range of the target shift distance , Change the setting position of the galvanometer and repeat the above steps until the position that can be used to set the galvanometer is determined.
  • an optical lens with a certain thickness may be selected according to the position of the galvanometer in the projection lens.
  • the thickness of the optical lens is D ⁇ 3mm.
  • the transmittance of the optical lens is ⁇ 97%.
  • the incident angle of the image beam in the projection lens on the light incident surface of the optical lens of the galvanometer lens may be less than 16°.
  • FIG. 7 is a schematic structural diagram of another projection lens provided by an embodiment of the present application.
  • the refraction system 202 includes a first lens group 2021, a relay lens group 2022, and a second lens group 2023 that are sequentially arranged along the direction X in which the image beam is incident and transmitted.
  • the galvanometer 201 is located between the relay lens group 2022 and the second lens group 2023.
  • the specified angle of the optical lens in the galvanometer 201 is 1°.
  • a unit composed of multiple lenses is usually regarded as a group, and it can be intuitively moved as a unit as a whole. For example, there are a total of 10 lenses in the lens, and 5 lenses.
  • the group is divided into two groups. Each of these two groups as a small whole can be displaced relative to each other. The displacement here can be the tolerance adjustment during assembly, or it can be matched with the lens zoom to achieve the difference between the groups.
  • the distance changes while changing the focal length of the lens.
  • the relative position of the lenses within each group does not change, and each group has its own focal length parameter.
  • the first lens group, the relay lens group, and the second lens group can be divided into three groups.
  • the first lens group can be called the rear group group
  • the relay lens group is called the middle group group
  • the second lens group is called the front group group.
  • the relay lens group and the second lens group may be divided into one group, and the embodiment of the present application does not limit the group division manner of the lens group.
  • the first lens group may include: a plurality of lenses sequentially arranged along the direction in which the image light beam is incident and transmitted.
  • the first lens group 2021 may include nine lenses arranged in sequence along the direction in which the image beam is incident and transmitted, including: a first lens a1, a second lens a2, a third lens a3, and a fourth lens a4. , Fifth lens a5, sixth lens a6, seventh lens a7, eighth lens a8 and ninth lens a9.
  • the relay lens group may include one or more relay lenses.
  • the relay lens has a positive lens characteristic, that is, it has the ability to condense light.
  • the relay lens may be a positive power lens.
  • the second lens group may include: a plurality of lenses sequentially arranged along the direction in which the image light beam is incident and transmitted.
  • the second lens group 2023 may include three lenses sequentially arranged along the direction in which the image beam is incident and transmitted, including: a tenth lens b1, an eleventh lens b2, and a twelfth lens b3.
  • the second lens group can be used to correct the distortion of the projection lens.
  • the refraction system 202 further includes an aperture 2024, and the aperture 2024 is located in the first lens group 2021.
  • the stop 2024 may be located between the fifth lens a5 and the sixth lens a6.
  • the galvanometer can be arranged away from the diaphragm.
  • the incident angle of the image incident on the light incident surface of the optical lens is large, after the galvanometer performs the offset processing on the image beam, it will cause the shift distance deviation between the different pixels of the projected image corresponding to the image beam Larger, affect the projection imaging effect of the projection lens.
  • the divergence angle of the image beam near the diaphragm is usually larger. Therefore, the galvanometer is usually set far away from the diaphragm, so that the shift distance between different pixels of the projection image corresponding to the image beam after the galvanometer shift processing is relatively large. Small, to ensure the projection imaging effect of the projection lens, and then realize the high-resolution display of the visual image.
  • the galvanometer can also be arranged at other positions far away from the aperture, for example, see FIG. 3, and the galvanometer 201 can also be arranged between the reflection system 203 and the refraction system 202, or, FIG. 8 is provided by an embodiment of the present application.
  • FIG. 8 is provided by an embodiment of the present application.
  • the galvanometer 201 may also be arranged in the second lens group 2023, which is not limited in the embodiment of the present application.
  • the galvanometer is arranged in the projection lens, compared with related technologies, the distance from the light valve to the projection lens in the laser projection device can be shortened, thereby reducing the laser projection
  • the volume of the device simplifies the structure of the laser projection device, which is conducive to miniaturization of the laser projection device.
  • the galvanometer is placed between the TIR prism and the projection lens in the related art, the temperature of the galvanometer is relatively high, and the galvanometer is a heating element, which will cause the temperature of the rear group of the projection lens to be too high, thereby affecting Projection lens analysis. If the galvanometer is placed in the projection lens, heat dissipation is easier, and a heat source is reduced at the rear group of the projection lens, which reduces the temperature at the rear group of the projection lens, which is beneficial to the analysis of the projection lens.
  • the galvanometer proposed in the embodiment of the application is placed in the projection lens, which avoids the temperature affecting the normal operation of the galvanometer and the projection lens, and reduces The design difficulty of the projection lens.
  • the embodiment of the application provides a laser projection device, because the projection lens can be a telecentric design structure (that is, the optical path of the projection lens is a telecentric optical path) or a non-telescopic design structure (that is, the optical path of the projection lens is It is a non-telecentric optical path). Therefore, the laser projection device can be divided into a telecentric architecture and a non-telecentric architecture when matched with lenses of different structures.
  • FIG. 12 is a schematic structural diagram of a laser projection device provided by an embodiment of the present application.
  • the laser projection device 2 includes: a light valve 21 and any projection lens 20 provided in the foregoing embodiments.
  • the light valve 21 is used to generate an image beam when illuminated.
  • the light valve may be a DMD
  • the projection lens is a 4K ultra-short throw projection lens.
  • the resolution of the DMD is less than the resolution of the image to be projected.
  • the resolution of the image to be projected is 4K
  • the resolution of the DMD is less than 4K.
  • the resolution is higher, such as 8K, the same DMD resolution is also less than 8K, which requires the use of galvanometer to achieve high-definition image display through image superposition.
  • the resolution ability of the ultra-short throw projection lens is also corresponding Can achieve higher resolution display.
  • FIG. 13 is a schematic structural diagram of another laser projection device provided by an embodiment of the present application.
  • the laser projection device 2 further includes a TIR prism 23, and the TIR prism 23 is located between the light valve 21 and the projection lens 20.
  • the TIR prism 23 is used to reflect the image beam to the projection lens.
  • the TIR prism may be a total reflection prism.
  • the image beam emitted from the same point on the light valve does not change with the change of the light valve position, which avoids the projection parallax caused by the inaccurate focus of the projection lens or the existence of the depth of field.
  • the projection lens with a non-telecentric design structure has better image quality and higher uniformity of the projected image. Therefore, in practical applications, the projection lens mostly adopts a telecentric design structure, and the laser projection equipment also adopts a telecentric structure.
  • the laser projection equipment because the galvanometer is arranged in the projection lens, can meet the beam shift requirement with a small vibration amplitude, and further reduce the volume occupied by the galvanometer, and ,
  • the galvanometer can also be set between different groups, because there is usually a certain gap between different groups, so that you can also place the galvanometer without changing the arrangement of the optical lenses in the lens, thus, although the lens is added
  • the galvanometer component but has little or no effect on the volume of the lens.
  • the structure can be more compact.
  • the rear working distance of the projection lens is not necessarily too long. Therefore, compared with related technologies, the spatial distance between the lens and the light valve can also be shortened, which is beneficial to the optics of the laser projection equipment.
  • the structure and compactness are also conducive to the miniaturization of the laser projection equipment.
  • the galvanometer is placed between the TIR prism and the projection lens in the related art, the temperature of the galvanometer is relatively high, and the galvanometer is a heating element, which will cause the temperature of the rear group of the projection lens to be too high, thereby affecting Projection lens analysis. If the galvanometer is placed in the projection lens, heat dissipation is easier, and a heat source is reduced at the rear group of the projection lens, which reduces the temperature at the rear group of the projection lens, which is beneficial to the analysis of the projection lens.
  • the galvanometer proposed in the embodiment of the application is placed in the projection lens, which avoids the temperature affecting the normal operation of the galvanometer and the projection lens, and reduces The design difficulty of the projection lens.
  • TIR prisms located between the light valve and the projection lens are all described using TIR prisms as an example, because the function of the prism is to guide the illumination beam into the light valve and guide the light beam reflected by the light valve to the lens Therefore, as long as it can guide the beam, it is not limited to a TIR prism, and it can also be an RTIR prism.
  • FIGS. 9 to 11 show projection lenses of another idea.
  • the galvanometer in the following embodiments is a reflective galvanometer, and the driving of the reflective galvanometer works
  • the principle and working process are similar to the transmissive galvanometer in the above-mentioned embodiment. It is achieved by vibrating during the reflection process to change the reflection angle of the beam to complete the beam at different moments in different positions in space. It can also realize the misalignment and superposition of the spot. The working principle of the beam will not be repeated.
  • the projection lens and the laser projection device with a reflective galvanometer will be described below in conjunction with the drawings.
  • FIG. 9 is a schematic structural diagram of a projection lens and a projection device shown in an embodiment of the present application.
  • the projection lens 20 is applied to the projection device 30 as an example.
  • the projection lens 20 may include:
  • the first mirror group 21, the reflective galvanometer 22 and the second mirror group 23, and the reflective galvanometer 22 is located between the first mirror group 21 and the second mirror group 23.
  • the first mirror group 21 is used to receive the light emitted from the light valve 31 and project the light to the reflective galvanometer 22.
  • the reflective galvanometer 22 is used to reflect the light emitted from the first mirror group 21 to the reflective galvanometer 22 to the second mirror group 23, and deflect the light through vibration.
  • the second mirror group 23 is used to direct the light from the reflective galvanometer 22 to the second mirror group 23 toward the screen 32.
  • the light valve 31 may not be included in the projection lens.
  • the reflective galvanometer 22 is arranged between the first mirror group 21 and the second mirror group 23. Because the reflective galvanometer 22 can change the light source route through reflection, the two mirror groups The optical axis is not on the same straight line, so that the length of the projection lens can be reduced, and the reflective galvanometer 22 can also increase the resolution of the galvanometer, so as to achieve a high-definition projected image higher than the DMD resolution. Therefore, the present application can form a high-resolution picture while reducing the difficulty of lens design.
  • FIG. 10 shows a schematic structural diagram of another projection lens and laser projection device provided by an embodiment of the present application.
  • the projection lens may include:
  • the first mirror group 21 includes a first refraction mirror group
  • the second mirror group 23 includes a second refraction mirror group 231 and a curved mirror 232.
  • the first refractive lens group may include a plurality of lenses, and the plurality of lenses may include a plurality of lenses with a positive refractive power, a plurality of lenses with a negative refractive power, a spherical lens, and an aspheric lens.
  • the first refracting lens group receives the light source emitted by the light valve 31 and is incident on the reflective galvanometer 22 to realize the turning of the light path.
  • a reflector is an optical element that can use the principle of light reflection to divert the light path in a predetermined direction.
  • the reflector can be divided into a flat reflector and a curved reflector.
  • the second mirror group 23 includes a curved reflector 232.
  • the mirror 232 can realize the function of magnification and distortion adjustment.
  • the light source emitted by the light valve 31 enters the first refraction lens group to form a preliminary image.
  • the preliminary imaged light beam enters the reflective galvanometer 22 along the optical axis length direction 50 of the first mirror group, and is reflected With the reflection of the galvanometer 22, the route direction of the light source changes, and the light source with the changed direction enters the second refractor group 231, and then enters the curved mirror 232 from the second refractor group 231.
  • FIG. 11 is a schematic structural diagram of another projection lens provided by an embodiment of the application.
  • the first mirror group 21 is a refracting mirror group
  • the second mirror group 23 includes a curved mirror 232.
  • the second lens group 23 of this kind of projection lens does not include the second refraction lens group.
  • the curved mirror 232 and the reflective galvanometer 22 are relatively close, and the reflective galvanometer 22 can be directly received. Reflected light source.
  • the reflective galvanometer 22 is located on the imaging surface of the refractive lens group.
  • the reflective galvanometer 22 When the reflective galvanometer 22 is located on the imaging surface of the refracting lens group, that is, between the curved mirror and the closest refracting lens group, the reflective galvanometer is on the imaging surface, and each field of view of the image plane is incident on the reflective mirror.
  • the angle on the galvanometer tends to be the same, so the degree of influence on each field of view tends to be the same.
  • the specific setting method of the second mirror group 23 can be selected according to actual requirements, which is not limited in the embodiment of the present application.
  • FIG. 14 a schematic structural diagram of an ultra-short-throw laser projection device is schematically shown, wherein the lens 20 can be applied to the projection lens in the above-mentioned multiple embodiments, and the lens 20 is an ultra-short-throw projection lens , The projection beam is imaged on the projection screen 40.
  • a projection lens and a laser projection device are provided, wherein the projection lens includes a first mirror group, a reflective galvanometer and a second mirror group, and the reflective galvanometer is located in the first mirror group and the second mirror group.
  • the first mirror group receives the light emitted by the light valve and directs the light to the reflective galvanometer
  • the reflective galvanometer reflects the light from the first mirror group to the reflective galvanometer to the second mirror
  • the light is deflected by vibration
  • the second mirror group directs the reflective galvanometer to the light of the second mirror group toward the screen.
  • the reflective galvanometer is arranged between the first mirror group and the second mirror group.
  • the optical axes of the two mirror groups are not located on the same straight line. Shorten the length of the projection lens along the main optical axis. The problem of long length of the projection imaging system in the related art is solved, and the effect of reducing the length of the projection imaging system is achieved. At the same time, the distance from the light valve to the lens can be shortened, and the light collection requirement of the first lens element of the lens is reduced, which also helps reduce the difficulty of lens design.

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Abstract

本申请涉及一种投影镜头及激光投影设备，属于激光投影领域。所述投影镜头包括：振镜，以及沿着影像光束入射传输的方向依次排布的折射系统和反射系统，所述振镜与所述折射系统位于所述反射系统的同侧；所述振镜用于对影像光束进行偏移处理；所述折射系统用于将进入所述折射系统的影像光束折射至所述反射系统中；所述反射系统用于将进入所述反射系统的影像光束反射成像至投影屏幕。本申请可以实现激光投影设备的小型化。

Description

投影镜头及激光投影设备
本申请要求于2019年5月14日提交中国专利局、申请号为201910398141.6，申请名称为“投影镜头及投影成像系统”，以及2020年3月13日提交中国专利局、申请号为：202010177880.5,申请名称为“投影镜头和投影设备”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及激光投影领域，特别涉及一种投影镜头及激光投影设备。
背景技术
投影设备是一种能够将图像投射到屏幕上的设备。
目前，投影设备通常包括：光源、光机和投影镜头。光源用于为光机提供照明，光源可以为单色激光光源激发荧光轮产生三色光，也可以是三色激光光源，光机的核心部件为光阀，为光调制元件，光源发出的光束经过光机的照明光路整形成符合预定入射角度和形状的光束后照射到光阀的表面，在DLP投影系统中，光阀为DMD数字微镜阵列，DMD为反射式光阀元件，经DMD光阀反射的光束入射至投影镜头成像。
申请内容
一方面，本申请实施例提供了一种投影镜头，包括：振镜，以及沿着影像光束入射传输的方向依次排布的折射系统和反射系统，所述振镜与所述折射系统位于所述反射系统的同侧；
所述振镜用于对影像光束进行偏移处理；
所述折射系统用于将进入所述折射系统的影像光束折射至所述反射系统中；
所述反射系统用于将进入所述反射系统的影像光束反射成像至投影屏幕。
另一方面，本申请实施例还提供了一种投影镜头，包括：第一镜组、反射式振镜和第二镜组，反射式振镜位于第一镜组和第二镜组之间；
第一镜组用于接收光阀射出的光，并将光射向反射式振镜；
反射式振镜用于将第一镜组射向反射式振镜的光反射向第二镜组，并通过振动将光进行偏转；
第二镜组用于将反射式振镜射向第二镜组的光射向屏幕。
附图说明
为了更清楚地说明本申请的实施例，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是相关技术中提供的一种激光投影设备的结构示意图；
图2是振镜中的光学镜片摆动至不同位置时，投影图像中的像素在光阀端的移位示意图；
图3是本申请实施例提供的一种投影镜头的结构示意图；
图4是本申请实施例提供的一种振镜对影像光束进行偏移处理的场景示意图；
图5是本申请实施例提供的另一种振镜对影像光束进行偏移处理的场景示意图；
图6是本申请实施例提供的又一种振镜对影像光束进行偏移处理的场景示意图；
图7是本申请实施例提供的另一种投影镜头的结构示意图；
图8是本申请实施例提供的又一种投影镜头的结构示意图；
图9是本申请实施例提供的再一种投影镜头的结构示意图；
图10是本申请实施例提供的再一种投影镜头的结构示意图；
图11是本申请实施例提供的再一种投影镜头的结构示意图；
图12是本申请实施例提供的一种激光投影设备的结构示意图；
图13是本申请实施例提供的另一种激光投影设备的结构示意图。
图14是本申请实施例提供的一种超短焦激光投影设备的结构示意图。
此处的附图被并入说明书中并构成本说明书的一部分，示出了符合本申请的实施例，并与说明书一起用于解释本申请的原理。
具体实施方式
为了使本申请的目的、技术方案和优点更加清楚，下面将结合附图对本申请作进一步地详细描述，显然，所描述的实施例仅仅是本申请一部份实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其它实施例，都属于本申请保护的范围。
近年来，随着激光投影显示技术的迅速发展，应用该技术的激光显示产品的显示画面的分辨率越来越高。例如，激光显示产品的显示画面可以达到4K分辨率。其中，4K分辨率指显示画面中每行像素值大于等于3840个，通常指3840×2160的分辨率。示例的，该激光显示产品可以是激光电视机。
目前的激光电视机包括激光投影设备和投影屏幕。相关技术中通常在激光投影设备中采用低分辨率的光阀配合振镜，达到高分辨率的显示效果。例如采用2K或3K分辨率的光阀配合振镜，利用振镜将光束错位叠加达到提高清晰度的效果，来达到接近4K分辨率的显示效果。振镜通常包括光学镜片和电磁驱动器，电磁驱动器用于驱动光学镜片以指定角度摆动，该指定角度为振镜中光学镜片的偏转角度。
图1是相关技术中提供的一种激光投影设备的结构示意图。如图1所示，该激光投影设备1包括依次排列的光阀10、TIR棱镜11、振镜12和投影镜头 13。光阀10用于在受到光照时产生影像光束。示例的，光阀可以是数字微镜器件(英文：digital micro mirror device，简称：DMD)。TIR棱镜11用于将影像光束反射至振镜。振镜12用于对光阀10输出的影像光束进行偏移处理，并将偏移处理后的影像光束传输至投影镜头13。投影镜头13用于对影像光束进行反射和/或折射后，将影像光束投影至投影屏幕。示例的，该投影镜头可以是4K超短焦投影镜头。
图2是振镜中的光学镜片摆动至不同位置时，投影图像中的像素在光阀端的移位示意图。如图2所示，M1为光学镜片摆动至第一位置时，投影图像中的像素在光阀端的等效位置，M2为光学镜片摆动至第二位置时，投影图像中的像素在光阀端的等效位置。可选地，根据光阀的像素尺寸确定投影图像的像素的移位距离。实际应用中，若投影图像的像素的移位距离m具有移位公差g，则移位公差范围为(m‐g)至(m+g)。示例性的，当光阀的像素尺寸为5.4μm(微米)时，投影图像的像素的移位距离m为2.7μm，移位公差g为0.3μm，则移位公差范围为2.4μm～3.0μm。在激光投影设备的成像过程中，通过电磁驱动器驱动光学镜片以指定角度快速摆动，以实现振镜对影像光束的偏移处理。该偏移处理指的是，光阀将激光投影设备接收的为高分辨率图像，比如4K显示图像，分解转换成两帧或者四帧投影图像后，光学镜片可以将该两帧或四帧投影图像的像素发生相对移位，使该两帧或四帧投影图像在投影屏幕上的成像画面不完全重叠，借助人眼的视觉反应，该两帧或四帧投影图像可以等效为一帧目视画面。由于该两帧或四帧投影图像在投影屏幕上的成像画面不完全重叠，因此该目视画面的分辨率大于每帧投影图像的分辨率，进而实现了激光电视机的高分辨率显示效果。其中，目视画面指人眼视觉所感知到的画面。需要说明的是，光阀的频率与振镜的频率相同，目视画面的频率为光阀的频率的一半。示例的，激光投影设备的显示图像的输入频率为60Hz，将输入的分辨率为3840×2160的4K显示图像转换成两帧分辨率为2716×1528的投影图像，光阀与振镜中光学镜片的频率均为120Hz，光学镜片将该两帧投影图像的像素发生相对移 位，使该两帧投影图像在投影屏幕上的成像画面不完全重叠，借助人眼的视觉反应，该两帧投影图像等效为一帧目视画面，则该目视画面的频率为60Hz。
但是，由于振镜设置在光阀与投影镜头之间，从而要求激光投影设备中光阀与投影镜头之间的距离需要留出容纳振镜结构的距离，从而导致镜头的后工作距离较大，也就是投影镜头的背焦较长，进而导致该激光投影设备的体积较大，难以压缩，不利于激光投影设备的小型化。
另外，由于振镜在工作过程中会产生大量的热能，而光阀与投影镜头之间的空间密闭性较高，散热较难，导致该空间的温度较高。实验证明，该空间的温度可达到70℃(摄氏度)至80℃。过高的温度可能影响光阀、振镜和投影镜头等的正常工作。因此，在设计激光投影设备时，需要考虑后工作距离和振镜的散热问题等因素，增加激光投影设备的设计难度。
进一步的，光阀在受到光照会产生开启(on)光和关闭(off)光。其中，on光指的是光阀产生的传输至投影镜头的光束，也即是影像光束；off光指的是光阀产生的未传输至投影镜头的光束。由于off光在传输时需避免进入投影镜头，因此off光通常会避开振镜中的光学镜片传输，此时该off光可能会照射到振镜中的电磁驱动器上，而电磁驱动器中的电磁线圈对光和热的敏感度较高，当off光照射到电磁线圈上时，会影响电磁线圈的正常工作，导致振镜的工作稳定性较差。
图3是本申请实施例提供的一种投影镜头的结构示意图。如图3所示，该投影镜头20包括：振镜201，以及沿着影像光束入射传输的方向X依次排布的折射系统202和反射系统203。该振镜201与折射系统202位于反射系统203的同侧。
图3中以振镜201位于折射系统202与反射系统203之间为例进行说明。可选地，振镜还可以位于折射系统内部，本申请实施例对此不做限定。
振镜201用于对影像光束进行偏移处理。
可选地，振镜包括光学镜片和驱动组件；驱动组件用于驱动光学镜片按照 目标频率以指定角度摆动。其中，驱动组件可以为电磁驱动器。
折射系统202用于将进入折射系统202的影像光束折射至反射系统203中。
反射系统203用于将进入反射系统203的影像光束反射成像至投影屏幕。
综上所述，本申请实施例提供的投影镜头，由于振镜设置在投影镜头中，因此与相关技术相比，可以缩短激光投影设备中光阀到投影镜头的距离，进而可以减小激光投影设备的体积，简化了激光投影设备的架构，有利于实现激光投影设备的小型化。
另外，由于相关技术中振镜放置于TIR棱镜与投影镜头之间，因振镜所处区域的温度较高，且振镜又是发热元部件，会导致投影镜头后群温度过高，从而影响投影镜头解析。如果振镜放置在投影镜头中，散热较容易，且使得投影镜头后群处减少一个热源，降低了该投影镜头后群处的温度，从而有利于投影镜头解析。与振镜放置于TIR棱镜和投影镜头之间相比，本申请实施例提出的将振镜放置在投影镜头中，避免了温度影响振镜和投影镜头等的正常工作，同时降低了投影镜头的设计难度。
需要说明的是，由于投影镜头中不存在off光，因此可以避免光阀出射的off光照射至电磁驱动器上而影响电磁驱动器中电磁线圈的正常工作，保证了振镜的工作稳定性。同时，电磁线圈也不会因光照而产生额外的热量，与相关技术相比，可以降低振镜在工作过程中产生的热能。
可选地，光学镜片摆动的指定角度与影像光束在该光学镜片的入光面上的入射角负相关。可选地，该入射角小于16°。
需要说明的是，当入射至振镜上的影像光束为平行光束(即影像光束中的每条光线的入射角相同)时，振镜中的光学镜片从一个位置摆动至另一个位置后，影像光束对应的投影图像的每个像素的移位距离均相等，使得投影镜头中各视场到投影屏幕的偏移量一致，这样可以保证目视画面的高分辨率显示。其中，视场的偏移量指的是视场的实际移位距离。在本申请实施例中，由于振镜放置在投影镜头中，使得各视场入射在振镜上的影像光束的角度不同，从而每 个视场到投影屏幕上的偏移量不同。可以通过设置振镜在投影镜头中的位置，使影像光束在光学镜片的入光面上的入射角小于指定角度阈值，以使光学镜片摆动时，影像光束对应的投影图像中不同像素之间的移位距离偏差较小，投影镜头中各视场的偏移量在公差范围之内，满足目视画面的高分辨率显示要求。
本申请实施例中，振镜的光学镜片摆动的指定角度还和振镜与光阀之间的部分投影镜头的放大倍率有关，也即是与振镜在投影镜头中的位置有关。
在本申请实施例中，确定振镜中的光学镜片摆动的指定角度以及振镜在投影镜头中的设置位置的过程包括：将振镜设置在投影镜头中影像光束趋近于平行光束的位置处；根据影像光束中的特定光线计算振镜中的光学镜片摆动的指定角度；根据该指定角度计算影像光束对应的投影图像的像素的预测移位距离；当该预测移位距离的绝对值在目标移位距离的移位公差范围内时，确定该位置可用于设置振镜。其中，上述特定光线可以是近中心视场(指光线沿光轴方向传输的视场)的主光线，该目标移位距离由光阀的像素尺寸所决定。
示例地，以振镜为透射式镜片为例结合附图进行说明。图4和图5分别是本申请实施例提供的一种振镜对影像光束进行偏移处理的场景示意图。如图4和图5所示，振镜中光学镜片摆动的指定角度为θ，光学镜片的厚度为D。假设光学镜片的折射率为n，振镜与投影屏幕之间的部分投影镜头的放大倍率为β，投影镜头的放大倍率为β0，且以入射至光学镜片的特定光线的传输方向与投影镜头的光轴方向的夹角为γ为例，对确定振镜中的光学镜片摆动的指定角度以及振镜在投影镜头中的设置位置的过程进行说明。
第一步，根据影像光束中的特定光线计算振镜中的光学镜片摆动的指定角度。
当光学镜片摆动至第一位置(图4中的实线示意位置)时，特定光线在光学镜片上的入射角为γ，折射角
Figure PCTCN2020089122-appb-000001
该特定光线穿过光学镜片后其移位量为h0＝D×tanI0。当光学镜片摆动至第二位置(图4中的虚线示意位置) 时，该特定光线在光学镜片上的入射角为γ+θ，折射角
Figure PCTCN2020089122-appb-000002
相应的，该特定光线穿过光学镜片后其移位量
Figure PCTCN2020089122-appb-000003
其中，特定光线的移位量指在垂直于投影镜头的光轴的平面上，该特定光线在光学镜片上的入射位置与该特定光线在光学镜片上的出射位置之间的距离。
因此，当光学镜片从第一位置摆动至第二位置，该特定光线在光学镜片上的实际移位距离h0-h1。由于从光学镜片出射的影像光束被放大β倍后入射至投影屏幕，因此，影像光束中的该特定光线对应的像素在屏幕端(也即是在投影屏幕上)的实际移位距离为(h0-h1)×β。假设光阀的像素尺寸为5.4μm，光阀端的投影图像的像素的目标移位距离为2.7μm，则使像素在屏幕端的实际移位距离满足目标移位距离，也即是使(h0-h1)×β＝2.7×10 -3×β0mm。由于振镜中光学镜片的折射率n、光学镜片的厚度D、振镜与投影屏幕之间的部分投影镜头的放大倍率β，投影镜头的放大倍率为β0均为已知值，因此可根据上述公式计算得到光学镜片摆动的指定角度θ。
第二步，根据上述指定角度计算影像光束对应的投影图像的像素的预测移位距离。
示例地，假设影像光束中的光线在光学镜片上的最大入射角为q。当光学镜片摆动至第一位置(图5中的实线示意位置)时，入射至光学镜片上的影像光束中具有最大入射角q的光线在光学镜片上的折射角
Figure PCTCN2020089122-appb-000004
该光线穿过光学镜片后其位移量h2＝D×tanQ。当光学镜片摆动至第二位置(图5中的虚线示意位置)时，该光线在光学镜片上的入射角q1＝q+θ，折射角
Figure PCTCN2020089122-appb-000005
相应的，该光线穿过光学镜片后其位移量
Figure PCTCN2020089122-appb-000006
因此，当光学镜片从第一位置摆动至第二位置，该光线在光学镜片上的预测移位距离h4＝h2-h3，由于从光学镜片出射的影像光束被放大β倍后入射至投影屏幕，因此，影像光束中的该光线对应的像素在屏幕端的预测移位距离为 h4×β。
由于光学镜片在摆动时存在偏转角度公差，该偏转角度公差会导致光线的实际移位距离大于预测移位距离。因此，在实际应用中，需要考虑光学镜片的偏转角度公差对光线的移位距离的影响。图6是本申请实施例提供的又一种振镜对影像光束进行偏移处理的场景示意图。如图6所示，振镜中光学镜片摆动的偏转角度公差为α。示例的，|α|≤0.05°，例如α＝0.03°。
在考虑光学镜片的偏转角度公差的情况下，当光学镜片摆动至第二位置(图6中的示意位置A)时，影像光束中，最大入射角对应的光线在光学镜片上的入射角为q2＝q+θ+α，折射角
Figure PCTCN2020089122-appb-000007
相应的，该光线穿过光学镜片后其位移量
Figure PCTCN2020089122-appb-000008
因此，当光学镜片从第一位置(图6中实线示意位置)摆动至第二位置，该光线在光学镜片上的预测移位距离h6＝h3-h5，由于从光学镜片出射的影像光束被放大β倍后入射至投影屏幕，因此，影像光束中的该光线对应的像素在屏幕端的预测移位距离为h6×β。
第三步，当预测移位距离的绝对值在目标移位距离的移位公差范围内时，确定该位置可用于设置振镜。
在计算得到像素在屏幕端的预测移位距离后，可以确定预测移位距离的绝对值与目标移位距离的移位公差范围的关系。当预测移位距离的绝对值在目标移位距离的移位公差范围内时，确定该位置可用于设置振镜，当预测移位距离的绝对值不在目标移位距离的移位公差范围内时，更换振镜的设置位置，重复执行上述步骤，直至确定可用于设置振镜的位置。
示例地，当目标移位距离的移位公差范围为(2.7×10 -3×β0)-g至(2.7×10 -3×β0)+g，考虑到光学镜片的偏转角度公差，当2.7×10 -3×β0≤|h4×β+h6×β|≤(2.7×10 -3×β0)+g时，确定该位置可用于 设置振镜；当2.7×10 -3×β0＜|h4×β+h6×β|，或者，|h4×β+h6×β|＞(2.7×10 -3×β0)+g时，更换振镜的设置位置，重复上述步骤。
在本申请实施例中，确定可用于设置振镜的位置后，还可以通过上述方法继续确定可以设置振镜的其他位置，比较所有可以设置振镜的位置对应的预测移位距离与目标移位距离的差值，将该差值最小的位置，确定为振镜的设置位置。
可选地，本申请实施例中可以根据振镜在投影镜头中的位置选取一定厚度的光学镜片。通常光学镜片的厚度D≤3mm。光学镜片的透过率≥97％。
由上述移位距离公式可知，在振镜中光学镜片的入射光线一定的情况下，偏转角度θ越大，该光线在光学镜片上的预测移位距离越大，对应的该光线对应的像素在屏幕端的移位距离越大。可选地，投影镜头中影像光束在振镜的光学镜片的入光面上的入射角可以小于16°。这样，受到偏转角度公差的影响，当光学镜片的实际的最大偏转角度略大于理论的最大偏转角度，且从光学镜片输出的影像光束趋近于平行时，像素在屏幕端的移位距离在目标移位距离的公差范围内。
图7是本申请实施例提供的另一种投影镜头的结构示意图。如图7所示，折射系统202包括沿着影像光束入射传输的方向X依次排布的第一透镜组2021、中继透镜组2022和第二透镜组2023。振镜201位于中继透镜组2022与第二透镜组2023之间。
需要说明的是，通常设计的投影镜头的折射系统中，中继透镜组和第二透镜组之间具有空隙，将振镜设置在该空隙内，无需改变投影镜头中各个镜片的相对位置关系，即无需重新设计投影镜头的结构，可实现性高。
示例的，参见图7，当振镜201位于中继透镜组2022和第二透镜组2023之间时，振镜201中光学镜片摆动的指定角度为1°。
需要说明的是，在镜头光学设计时，通常将多个镜片组成的一个单位视为一个群组，直观上可以将其作为一个单位整体进行移动，比如，镜头中共有10 个镜片，5个一组，分为两个群组，这两个群组各自作为一个小的整体，可以彼此相对位移，此处的位移可以是装配时的公差调整，也可以是配合镜头变焦实现群组之间的距离变化，而改变镜头的焦距。而每个群组内部的镜片之间相对位置不改变，每个群组有自身的焦距参数。
示例地，第一透镜组、中继透镜组和第二透镜组可划分为三个群组。根据该三个群组在投影镜头中的位置，可将第一透镜组称为后群群组，将中继透镜组称为中群群组，将第二透镜组称为前群群组。或者，中继透镜组和第二透镜组可划分至一个群组中，本申请实施例对透镜组的群组划分方式不做限定。
可选地，第一透镜组可以包括：沿着影像光束入射传输的方向依次排布的多个透镜。例如参见图7，第一透镜组2021可以包括沿着影像光束入射传输的方向依次排布的九个透镜，分别包括：第一透镜a1、第二透镜a2、第三透镜a3、第四透镜a4、第五透镜a5、第六透镜a6、第七透镜a7、第八透镜a8和第九透镜a9。
可选地，中继透镜组可以包括一片或多片中继透镜。该中继透镜具有正透镜特性，即具有会聚光的能力。例如，中继透镜可以是正光焦度透镜。
可选地，第二透镜组可以包括：沿着影像光束入射传输的方向依次排布的多个透镜。例如参见图7，第二透镜组2023可以包括沿着影像光束入射传输的方向依次排布的三个透镜，分别包括：第十透镜b1、第十一透镜b2和第十二透镜b3。该第二透镜组可以用于校正该投影镜头的畸变。
可选地，请继续参见图7，折射系统202还包括光阑2024，光阑2024位于第一透镜组2021中。示例的，光阑2024可以位于第五透镜a5和第六透镜a6之间。
需要说明的是，通过将振镜设置在中继透镜组与第二透镜组之间，将光阑设置在第一透镜组中，可以使得振镜远离光阑设置。由于当入射至光学镜片的入光面上的影像入射角较大时，振镜对该影像光束进行偏移处理后，会导致该影像光束对应的投影图像的不同像素之间的移位距离偏差较大，影响投影镜头 的投影成像效果。而光阑附近的影像光束的发散角通常较大，因此，振镜通常远离光阑设置，使得经过振镜偏移处理后的影像光束对应的投影图像的不同像素之间的移位距离偏差较小，保证投影镜头的投影成像效果，进而实现目视画面的高分辨率显示。
可选地，振镜还可以设置在其他远离光阑的位置，例如参见图3，振镜201还可以设置在反射系统203与折射系统202之间，或者，图8是本申请实施例提供的又一种投影镜头的结构示意图，请参见图8，振镜201还可以设置在第二透镜组2023内，本申请实施例对此不做限定。
综上所述，本申请实施例提供的投影镜头，由于振镜设置在投影镜头中，因此与相关技术相比，可以缩短激光投影设备中光阀到投影镜头的距离，进而可以减小激光投影设备的体积，简化了激光投影设备的架构，有利于实现激光投影设备的小型化。
另外，由于相关技术中振镜放置于TIR棱镜与投影镜头之间，因振镜所处区域的温度较高，且振镜又是发热元部件，会导致投影镜头后群温度过高，从而影响投影镜头解析。如果振镜放置在投影镜头中，散热较容易，且使得投影镜头后群处减少一个热源，降低了该投影镜头后群处的温度，从而有利于投影镜头解析。与相同技术中振镜放置于TIR棱镜和投影镜头之间相比，本申请实施例提出的将振镜放置在投影镜头中，避免了温度影响振镜和投影镜头等的正常工作，同时降低了投影镜头的设计难度。
本申请实施例提供了一种激光投影设备，由于投影镜头可以是远心设计结构(也即是该投影镜头的光路为远心光路)也可以是非远设计结构(也即是该投影镜头的光路为非远心光路)，因此，该激光投影设备配合不同结构的镜头也可以分为远心架构和非远心架构。
图12本申请实施例提供的一种激光投影设备的结构示意图。当该激光投影设备为非远心架构时，如图12所示，该激光投影设备2包括：光阀21以及上述实施例提供的任一种投影镜头20。其中，该光阀21用于在受到光照时产生 影像光束。示例的，该光阀可以是DMD，该投影镜头为4K超短焦投影镜头。
需要说明的是，本申请实施例的激光投影设备中，DMD的分辨率小于待投影图像的分辨率，当待投影图像的分辨率为4K时，DMD的分辨率小于4K，当待投影图像的分辨率为更高，比如8K时，同样DMD的分辨率也小于8K，从而需要借助振镜通过图像叠加来实现高清晰度图像的显示，此时，超短焦投影镜头的解析能力也相应的可以实现更高分辨率的显示。
图13是本申请实施例提供的另一种激光投影设备的结构示意图。当该激光投影设备为远心架构时，如图13所示，该激光投影设备2还包括：TIR棱镜23，TIR棱镜23位于光阀21与投影镜头20之间。该TIR棱镜23用于将影像光束反射至投影镜头。示例的，该TIR棱镜可以是1个全反射棱镜。由于远心设计结构的投影镜头中，光阀上同一点发出的影像光束不随光阀位置的变化而变化，这样避免了由于投影镜头调焦不准或者景深存在所产生的投影视差，相较于非远心设计结构的投影镜头像质更好，投影图像的均匀性更高，因此，实际应用中，投影镜头多采用远心设计结构，则激光投影设备也多采用远心架构。
综上所述，本申请实施例提供的激光投影设备，由于振镜设置在投影镜头中，可以以较小的振动幅度满足光束偏移要求，进而也可以减小振镜所占的体积，以及，振镜还可以设置在不同群组之间，因为不同群组之间通常具有一定的间隙，这样不需要改变镜头中光学镜片的排布也可以放置振镜，从而，虽然在镜头中增设了振镜部件，但对镜头的体积增加很小或者不影响体积，而相对于整个激光投影设备而言，光阀与投影镜头之间不需要预留特定的空间放置振镜，结构可以更为紧凑，同时，给予不考虑预置空间的限制，投影镜头的后工作距离就不必要太长，因此，与相关技术相比，镜头和光阀之间的空间距离也可以缩短，从而利于激光投影设备光学架构和紧凑化，也利于激光投影设备整机的小型化。
另外，由于相关技术中振镜放置于TIR棱镜与投影镜头之间，因振镜所处区域的温度较高，且振镜又是发热元部件，会导致投影镜头后群温度过高，从 而影响投影镜头解析。如果振镜放置在投影镜头中，散热较容易，且使得投影镜头后群处减少一个热源，降低了该投影镜头后群处的温度，从而有利于投影镜头解析。与相同技术中振镜放置于TIR棱镜和投影镜头之间相比，本申请实施例提出的将振镜放置在投影镜头中，避免了温度影响振镜和投影镜头等的正常工作，同时降低了投影镜头的设计难度。
需要说明的是，上述位于光阀和投影镜头之间的棱镜均以TIR棱镜为例进行说明，由于棱镜的作用是为了引导照明光束进入光阀，并将光阀反射后的光束引导射向镜头，因此只要能够起到对光束引导的作用均可，并不限定于TIR棱镜，也可以为RTIR棱镜。
以及，图9至图11给出了另一思路的投影镜头，具体地，与上述实施例中不同的是，以下实施例中的振镜为反射式振镜，该反射式振镜的驱动工作原理和工作过程与上述实施例中透射式振镜相似，是通过在反射过程中振动，从而改变光束的反射角度来完成不同时刻光束射向空间不同的位置，也可以实现光斑的错位叠加，其对光束的工作原理不再赘述。下面将结合附图来对具有反射式振镜的投影镜头及激光投影设备进行说明。
图9是本申请实施例示出的一种投影镜头和投影设备的结构示意图，本实施例以投影镜头20应用于该投影设备30中来举例说明。该投影镜头20可以包括：
第一镜组21、反射式振镜22和第二镜组23，反射式振镜22位于第一镜组21和第二镜组23之间。
第一镜组21用于接收光阀31的射出的光，并将光射向反射式振镜22。
反射式振镜22用于将第一镜组21射向反射式振镜22的光反射向第二镜组23，并通过振动将光进行偏转。
第二镜组23用于将反射式振镜22射向第二镜组23的光射向屏幕32。
其中光阀31可以不包括在投影镜头中。
具体地，如图9所示，将反射式振镜22设置在第一镜组21和第二镜组23 之间，由于反射式振镜22可以通过反射改变光源路线，使得两个镜组的光轴不位于同一条直线上，如此便能够缩小投影镜头的长度，且反射式振镜22同时可以起到振镜增加分辨率的效果，以达到高于DMD分辨率的高清晰度投影图像，因此本申请可以在减小镜头设计难度的同时形成高分辨率的画面。
以及，请参考图10，其示出了本申请实施例提供的另一种投影镜头和激光投影设备的结构示意图。该投影镜头可以包括：
可选的，第一镜组21包括第一折射镜组，第二镜组23包括第二折射镜组231和曲面反射镜232。第一折射镜组可以包括多个透镜，多个透镜中可以包括多个屈光度为正的透镜、多个屈光度为负的透镜、球面透镜和非球面透镜。第一折射镜组接收光阀31发射出的光源，入射到反射式振镜22上，实现光路转折。反射镜是一种可以利用光线反射原理按预定方向转折光路的光学元件，反射镜可以分为平面反射镜和曲面反射镜，本申请实施例中，第二镜组23包括曲面反射镜232，曲面反射镜232可以实现放大畸变调整的功能。如图10所示，光阀31发射出的光源进入第一折射镜组后形成初步成像，该初步成像的光束沿第一镜组的光轴长度方向50射入反射式振镜22，通过反射式振镜22的反射，光源的路线方向发生变化，变化方向的光源进入第二折射镜组231，再从第二折射镜组231射入曲面反射镜232。
以及，图11为本申请实施例提供的另一种投影镜头的结构示意图。
在本示例中，第一镜组21为折射镜组，第二镜组23包括曲面反射镜232。如图4所示，该种投影镜头的第二镜组23不包括第二折射镜组，此时曲面反射镜232与反射式振镜22的距离较近，可以直接接收到反射式振镜22反射出的光源。在一具体实施中，反射式振镜22位于折射镜组的成像面。当反射式振镜22位于折射镜组的成像面时，即位于曲面反射镜和距离其最近的一片折射镜组之间时，反射式振镜位于成像面上，像面各个视场入射到反射式振镜上的角度趋近一致，从而对各个视场的影响程度趋向一致。
以及，具体第二镜组23的设置方式可以根据实际要求进行选择，本申请实 施例在此不作限定。
以及，如图14所示，示意性的给出了一种超短焦激光投影设备的结构示意图，其中，镜头20可以应用上述多个实施例中的投影镜头，镜头20为超短焦投影镜头，投射光束成像于投影屏幕40上。
综上所述的多个实施例，提供的一种投影镜头和激光投影设备，其中投影镜头包括第一镜组、反射式振镜和第二镜组，反射式振镜位于第一镜组和第二镜组之间，第一镜组接收光阀射出的光，并将光射向反射式振镜，反射式振镜将第一镜组射向反射式振镜的光反射向第二镜组，并通过振动将光进行偏转，第二镜组将反射式振镜射向第二镜组的光射向屏幕。本申请通过将反射式振镜设置在第一镜组和第二镜组之间，由于反射式振镜可以通过反射改变光源路线，使得两个镜组的光轴不位于同一条直线上，能够缩短投影镜头沿主光轴方向的长度。解决了相关技术中投影成像系统的长度较长的问题，达到了缩小投影成像系统的长度的效果。同时还可以缩短光阀到镜头的距离，对镜头第一片镜片的收光要求降低，也利于降低镜头的设计难度。
以上所述仅为本发明的可选实施例，并不用以限制本发明，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (13)

  1. 一种投影镜头，其特征在于，包括：振镜，以及沿着影像光束入射传输的方向依次排布的折射系统和反射系统，所述振镜与所述折射系统位于所述反射系统的同侧；
    所述振镜用于对所述影像光束进行偏移处理；
    所述折射系统用于将进入所述折射系统的影像光束折射至所述反射系统中；
    所述反射系统用于将进入所述反射系统的影像光束反射成像至投影屏幕。
  2. 根据权利要求1所述的投影镜头，其特征在于，所述折射系统包括沿着所述影像光束入射传输的方向依次排布的第一透镜组、中继透镜组和第二透镜组；所述振镜位于所述中继透镜组和所述第二透镜组之间。
  3. 根据权利要求2所述的投镜镜头，其特征在于，所述折射系统还包括光阑，所述光阑位于所述第一透镜组中。
  4. 根据权利要求1至3任一所述的投影镜头，其特征在于，所述振镜包括光学镜片和驱动组件；
    所述驱动组件用于驱动所述光学镜片按照目标频率以指定角度摆动。
  5. 根据权利要求4所述的投影镜头，其特征在于，所述指定角度与所述影像光束在所述光学镜片的入光面上的入射角负相关。
  6. 根据权利要求5所述的投影镜头，其特征在于，所述入射角小于16°。
  7. 根据权利要求1-6任一所述的投影镜头，其特征在于，所述影像光束透射通过所述振镜。
  8. 一种投影镜头，其特征在于，所述投影镜头包括：
    第一镜组、反射式振镜和第二镜组，所述反射式振镜位于所述第一镜组和所 述第二镜组之间；
    所述第一镜组用于接收光阀的射出的光，并将所述光射向所述反射式振镜；
    所述反射式振镜用于将所述第一镜组射向所述反射式振镜的光反射向所述第二镜组，并通过振动将光进行偏转；
    所述第二镜组用于将所述反射式振镜射向所述第二镜组的光射向屏幕。
  9. 根据权利要求8所述的投影镜头，其特征在于，所述第一镜组包括第一折射镜组，所述第二镜组包括第二折射镜组和曲面反射镜。
  10. 根据权利要求8所述的投影镜头，其特征在于，所述第一镜组为折射镜组，所述第二镜组包括曲面反射镜。
  11. 根据权利要求10所述的投影镜头，其特征在于，所述反射式振镜位于所述折射镜组的成像面。
  12. 一种投影设备，其特征在于，包括光阀和如权利要求1至7任一所述投影镜头。
  13. 一种投影设备，其特征在于，包括光阀和如权利要求8至11任一所述投影镜头。
PCT/CN2020/089122 2019-05-14 2020-05-08 投影镜头及激光投影设备 Ceased WO2020228595A1 (zh)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115524901A (zh) * 2021-06-24 2022-12-27 中强光电股份有限公司 致动器装置、投影装置以及投影方法
CN116299331A (zh) * 2023-03-16 2023-06-23 蔚来汽车科技(安徽)有限公司 扩散单元、发射系统、激光雷达及车辆

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112764300B (zh) * 2021-03-05 2022-03-22 深圳市火乐科技发展有限公司 光机模组角度调节机构及投影机
CN115236850B (zh) * 2021-04-23 2024-03-15 成都极米科技股份有限公司 一种控制振镜实现2倍和4倍像素点提升的方法及投影仪
CN113721415B (zh) * 2021-08-30 2022-10-28 歌尔光学科技有限公司 投影光机

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1797179A (zh) * 2004-12-28 2006-07-05 精碟科技股份有限公司 投影镜头组及其振动装置
US7184218B1 (en) * 2004-11-15 2007-02-27 Arthur Berman Method and apparatus for increasing quality and resolution of a projected image
US20070091410A1 (en) * 2005-10-24 2007-04-26 Scott Lerner Projection assembly
JP2008009180A (ja) * 2006-06-29 2008-01-17 Toshiba Corp 表示装置
CN108710194A (zh) * 2018-07-17 2018-10-26 安徽仁和光电科技有限公司 投影镜头
CN109270682A (zh) * 2016-08-17 2019-01-25 海信集团有限公司 一种激光投影设备

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100584589B1 (ko) * 2003-12-23 2006-05-30 삼성전자주식회사 투사 광학계 및 이를 채용한 프로젝션 시스템
CN107065420B (zh) * 2017-05-23 2018-10-26 海信集团有限公司 一种投影系统

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7184218B1 (en) * 2004-11-15 2007-02-27 Arthur Berman Method and apparatus for increasing quality and resolution of a projected image
CN1797179A (zh) * 2004-12-28 2006-07-05 精碟科技股份有限公司 投影镜头组及其振动装置
US20070091410A1 (en) * 2005-10-24 2007-04-26 Scott Lerner Projection assembly
JP2008009180A (ja) * 2006-06-29 2008-01-17 Toshiba Corp 表示装置
CN109270682A (zh) * 2016-08-17 2019-01-25 海信集团有限公司 一种激光投影设备
CN108710194A (zh) * 2018-07-17 2018-10-26 安徽仁和光电科技有限公司 投影镜头

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115524901A (zh) * 2021-06-24 2022-12-27 中强光电股份有限公司 致动器装置、投影装置以及投影方法
CN116299331A (zh) * 2023-03-16 2023-06-23 蔚来汽车科技(安徽)有限公司 扩散单元、发射系统、激光雷达及车辆

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