WO2020218667A1

WO2020218667A1 - Optical objective lens alignment mount for sample chamber, light-reflecting mirror having electron through-hole and mounted on mount, and correlative light and electron microscope having spectrometer and comprising same

Info

Publication number: WO2020218667A1
Application number: PCT/KR2019/006109
Authority: WO
Inventors: 박인용; 조복래
Original assignee: 한국표준과학연구원
Priority date: 2019-04-23
Filing date: 2019-05-22
Publication date: 2020-10-29
Also published as: KR102168726B1

Abstract

The present invention relates to a technology regarding a correlative light and electron microscope having a spectrometer, wherein a light-reflecting mirror is mounted on an optical objective lens alignment mount capable of making precise alignment inside and outside a sample chamber while maintaining vacuum such that an electron beam is allowed to pass through a rectangular pyramid-shaped through-hole, while an optical beam is reflected, and an optical microscope imaging system and a cathodoluminescence spectrometer path unit are installed on the optical objective lens. The light-reflecting mirror having an electron through-hole according to the present invention has the shape of a quadrangular pyramid, the bottom surface of which is rectangular, and thus can secure a space through which an electron beam can pass while minimizing the area of an opening through a light-reflecting surface such that maximum optical reflection occurs when the light-reflecting mirror is slanted by 45º with regard to the direction of propagation of the electron beam. The optical objective lens alignment mount for a correlative light-and-electron microscope sample chamber, on which the light-reflecting mirror is mounted, can coaxially align an electron beam and an optical beam precisely. In addition, the present invention provides a system wherein an optical microscope system and a spectrometer are all disposed around a through-hole mirror in a light path along which light is emitted from and reflected by a sample, thereby analyzing the wavelength of light produced or reflected by the sample.

Description

Optical objective lens alignment mount for sample chamber, optical-reflecting mirror with electron through-hole mounted on the mount, and optical-electron fusion microscope with spectroscope including these

The present invention relates to an optical objective lens alignment mount for an optical-electron fusion microscope sample chamber and a light reflecting mirror provided in the mount, and more particularly, to an optical objective lens alignment capable of fine alignment across the inside and outside of the sample chamber while maintaining a vacuum. Equipped with a light-reflecting mirror that allows electron beams to pass through and reflects optical beams on the mount, and a spectrometer equipped with an optical microscope imaging system and a cathodoluminescence spectrometer path to the optical objective lens. Optical-electron fusion microscope technology It is about.

When observing defects in the device, luminous bodies such as organic EL, LED, and quantum dots are mainly observed with an optical microscope due to their luminescence characteristics, but the defect causes an abnormality in luminescence or to observe the luminous part in detail. In many cases, it is difficult to find out the cause of the defect or observe it with high resolution with a general optical microscope because the observation site is less than the microscale. As described above, in order to observe an observation object or fine defect that exceeds the detection limit of an optical microscope, it must be analyzed with an electron microscope having a resolution of nanometers or less than nanometers. Light and electron beams provide complementary information not only to light-emitting devices, but also to defect inspection of biological samples and semiconductors, so by integrating the optical system of an electron microscope and an optical microscope, the sample is observed with near-ultraviolet or visible light, and the region of interest is viewed with an electron microscope. There is a need to develop a fusion microscope that expands and investigates.

A fusion microscope in a broader sense involves manufacturing the sample holder of the optical microscope to be shared with the electron microscope, and then finding the coordinates of the part observed in the optical microscope with a separate electron microscope to obtain a high magnification image. However, various attempts have been made to develop an integrated optical-electron fusion microscope (Correlative Light and Electron Microscope) due to problems such as the hassle and time consuming of moving the sample.

Republic of Korea Patent Registration No. 10-1857046 relates to "optical-electron fusion microscope light reflecting mirror having a square pyramid-shaped through hole and a method for manufacturing the same", and the through hole becomes narrower from one side to the other so that the light reflecting mirror is inclined. Disclosed is a technology capable of minimizing light loss by arranging narrow through-holes in the incident direction of light. However, when the light reflecting mirror of the above technology is mounted, it is inclined at 45 degrees to the traveling direction of the electron beam, so the electron beam passage path does not become square when observed with an electron microscope, so there is a problem that it is difficult to obtain an efficient image when fused with an optical microscope image. . In addition, secondary electron images and optical images can be observed due to the structure of the sample chamber in which the light reflecting mirrors are arranged, but there is a problem that it is difficult to install a spectrometer to analyze a cathodoluminescence signal by an electron beam. In the previous patent, an electron microscope image and an optical microscope image could be obtained at the same time, but the fusion microscope did not include a spectral function, so it was impossible to accurately analyze the wavelength generated or reflected from the sample.

[Prior technical literature]

[Patent Literature]

(Patent Document 1) Korean Patent Registration No. 10-1857046, “Opto-electronic fusion microscope light reflecting mirror having a through hole in the shape of a square pyramid and its manufacturing method”

The present invention aims to solve the above problems, and minimizes the opening area of the light reflection surface so that light reflection is maximized when the optical reflection mirror is tilted 45 degrees with respect to the electron beam traveling direction, while securing a space through which the electron beam can pass. It is intended to provide a light-reflecting mirror for an optical-electron fusion microscope that can be used, and a fusion photoelectron microscope sample chamber system in which the light-reflecting mirror is mounted on an optical objective lens mount that precisely aligns the electron beam and the optical beam. In addition, it is intended to provide a system capable of analyzing the wavelength of light generated or reflected from the sample by irradiating light from the sample and arranging both the optical microscope system and the spectroscope in the reflected light path centering on the through-hole mirror.

The present invention provides an optical-electronic fusion microscope optical objective lens alignment mount for a sample chamber, the alignment mount comprising: a body portion for fixing the optical objective lens through which incident light, reflected light, and cathodoluminescence signal pass; A vacuum holding unit having a motor and an O-ring so as to mount the body part over the inside and outside of the sample chamber and maintain a vacuum while moving in a direction parallel or perpendicular to the optical path; And a light-reflecting mirror mounting part so that a light-reflecting mirror having an electron through-hole having a rectangular pyramid shape having a rectangular bottom surface comes to a position where the light path meets the sample incident electron beam, and an optical objective lens for an optical-electron fusion microscope sample chamber Provides an alignment mount.

In the present invention, the light reflecting mirror may include a single crystal silicon plate having a thickness of 0.5 to 1 mm; A through hole in the shape of a square pyramid having a rectangular bottom surface formed in the center of the plate; A double-layer reflective thin film coated on both sides of the plate; And a silicon oxide film (SiO ₂ ) 50 to 100 nm thick coating layer for surface protection and oxidation prevention on the double-layer reflective thin film, wherein each side of the square pyramid shape along the crystal direction of the single crystal silicon is on the bottom surface. The plate is formed at an angle of 50 to 60 degrees, the plate has at least one cut surface parallel to the side of the bottom of the square pyramid shape, the cross-sectional area of the bottom surface of the square pyramid shape is 400 to 500 μm ² , and the double layer reflective thin film Silver (Ag) thin film coated with a thickness of 100 to 200 nm on a chromium (Cr) thin film coated with a thickness of 15 to 25 nm, or aluminum coated with a thickness of 100 to 200 nm on a titanium (Ti) thin film coated with a thickness of 15 to 25 nm ( It provides an optical objective lens alignment mount for Al) thin film, optical-electron fusion microscope sample chamber.

In the present invention, the through hole is formed in the center of the plate, and in the plate, the cut surface except for the cut surface parallel to the short side of the rectangle, which is the bottom surface of the square pyramid shape, is a curved surface or a square, an optical-electron fusion microscope sample chamber Provides an optical objective lens alignment mount for use.

The present invention also provides an optical-electron fusion microscope equipped with a spectroscope, the fusion microscope comprising: a sample chamber having an optical objective lens alignment mount for the sample chamber of any one of claims 1 to 3; An electron microscope unit including an electron beam focusing tube for scanning electron beams into the sample chamber; An optical microscope unit including an illumination system for irradiating light to the optical objective lens and an imaging system for imaging reflected light; A sample stage for adjusting a sample position so that the light reflected by the light reflecting mirror passing through the optical objective lens and the focused beam passing through the through hole of the light reflecting mirror are directed; An optical mode adjustment mirror for adjusting an optical path to be changed at a right angle between the optical objective lens and the imaging system; And it provides an optical-electron fusion microscope equipped with a spectroscope, comprising a spectroscope for analyzing a signal reflected from a sample or cathodoluminescence passing through the optical mode control mirror in the optical objective lens.

The present invention also provides an optical-electron fusion microscope equipped with a spectroscope, wherein the optical mode control mirror is adjusted to one of 50-50 reflection transmission modes, reflection modes, and transmission modes.

The light reflecting mirror having an electron through hole of the present invention has a rectangular pyramid-shaped bottom surface in a rectangular shape, so that the light reflection is maximized when the light reflection mirror is inclined at 45 degrees with respect to the electron beam traveling direction, while minimizing the opening area of the light reflecting surface. The space through which this can pass can be secured, and the optical objective lens alignment mount for the optical-electron fusion microscope sample chamber equipped with the light reflecting mirror enables precise coaxial alignment of the electron beam and the optical beam. In addition, it provides a system capable of analyzing the wavelength of light generated or reflected from the sample by irradiating light from the sample and arranging both the optical microscope system and the spectroscope in the reflected light path centered on the through-hole mirror.

1 is a conceptual diagram of an optical-electron fusion microscope equipped with a spectroscope including an optical objective lens alignment mount for a sample chamber in an optical-electron fusion microscope equipped with a light reflecting mirror having an electron through hole according to an embodiment of the present invention.

2 is a conceptual diagram of a light reflecting mirror having an electron through-hole having a curved surface and a straight line according to an embodiment of the present invention.

3 is a conceptual diagram of a light reflecting mirror having an electron through hole having a square cut surface according to an embodiment of the present invention.

4 is a conceptual diagram of a single crystal silicon wafer having a light reflecting mirror having an electron through hole having a curved surface and a straight line according to an embodiment of the present invention.

5 is a conceptual diagram of a single crystal silicon wafer in which a light reflecting mirror having an electron through hole having a square cut surface is formed according to an embodiment of the present invention.

6 is a conceptual diagram of an optical objective lens alignment mount for a sample chamber of an optical-electron fusion microscope equipped with a light reflection mirror having an electron through hole according to an embodiment of the present invention.

7 is a conceptual diagram illustrating a light reflection path of a light reflection mirror having an electron through hole mounted on an optical objective lens alignment mount for an optical-electron fusion microscope sample chamber according to an embodiment of the present invention.

FIG. 8 is obtained when a cathodoluminescence signal is generated in an optical-electron fusion microscope equipped with a spectrometer including an optical objective lens alignment mount for a sample chamber in an optical-electronic fusion microscope equipped with a light reflecting mirror having an electron through hole according to an embodiment of the present invention. First, it is an electron microscope image, an electron beam scan area image, and a spectral graph of the signal.

Prior to the detailed description of the present invention, terms or words used in the present specification and claims to be described below should not be construed as being limited to their conventional or dictionary meanings. Accordingly, the embodiments described in the present specification and the configurations shown in the drawings are only the most preferred embodiments of the present invention, and do not represent all the technical spirit of the present invention, and thus various alternatives that can be substituted for them at the time of application It should be understood that there may be equivalents and variations. Here, in all drawings for explaining the embodiment of the present invention, those having the same function are denoted by the same reference numerals, and detailed descriptions thereof will be omitted.

1A is an optical-electronic fusion microscope equipped with an optical-electron fusion microscope equipped with

light reflecting mirrors

100 and 101 having an electron through hole according to an embodiment of the present invention; an optical-electron fusion microscope equipped with a spectrometer including an optical objective lens alignment mount for a sample chamber It is a conceptual diagram of. 1B shows an optical mode adjustment mirror 200 described below. In one embodiment of the present invention, the optical-electron fusion microscope equipped with a spectroscope includes: a sample chamber 40 having an optical objective lens alignment mount for a sample chamber; An electron microscope unit 10 including an electron beam focusing tube for scanning electron beams into the sample chamber; An optical microscope unit 20 having an illumination system 21 for irradiating light to the optical objective lens and an imaging system 22 for imaging reflected light; A sample stage (45) for adjusting a sample position so that the light reflected from the light reflecting mirror passing through the optical objective lens and the focused beam passing through the through hole of the light reflecting mirror are directed; An optical mode adjustment mirror 200 for adjusting an optical path to be changed at a right angle between the optical objective lens and the imaging system; And a spectrometer 30 for analyzing cathodoluminescence passing through the optical mode control mirror 200 and the beam splitter and fluorescence filter 500 in the optical objective lens or a signal reflected from the sample. The electron beam focused by the electron beam focusing tube of the electron microscope unit 10 passes through the electron beam through holes of the

light reflecting mirrors

100 and 101 having the electron through holes along the electron beam path (a) and is directed toward the sample. The cathodoluminescence signal generated by the electron beam from the sample is reflected from the

light reflection mirrors

100 and 101 with electron through holes along the spectral optical path (b), passes through the objective lens 52, the light mode control mirror 200, the beam splitter, and It passes through the fluorescent filter 500 and is directed to the spectrometer 30. The light emitted from the illumination system 21 is reflected by the illumination light reflecting mirror 400, the dichromic mirror 300, and the light mode mirror along the illumination light path c, and has an electron through hole. , 101) is reached and reflected toward the specimen. The light reflected from the sample is reflected from the

light reflecting mirrors

100 and 101 having the electron through-hole along the fluorescence optical path (d), passing through the objective lens 52, and reflected from the light mode adjusting mirror 200. After that, the image is formed toward the imaging system by passing through the dichromic mirror 300.

The conventional photo-electron fusion microscope (CLEM: Correlative Light and Electron Microscope) fused an electron microscope and an optical microscope to obtain a double image. However, the photo-electron fusion microscope equipped with a spectroscope proposed in the present invention has an electron microscope function and an optical microscope. It is a system incorporating a microscope function with a fluorescence microscope as well as a spectrometer 30 capable of wavelength analysis of an optical signal (chathodoluminescence) generated from a sample. In the case of obtaining a general optical microscope image or a fluorescence microscope image with the optical-electron fusion microscope equipped with a spectroscope of the present invention, the beam splitter and the fluorescence filter 200 may be changed to suit the purpose.

The sample chamber and the electron microscope unit including the electron beam focusing tube maintain a vacuum with a vacuum pump (not shown). That is, the vacuum view port 53 may move while maintaining the degree of vacuum while transmitting external light into the vacuum chamber. Through the above configuration, it is possible to observe an electron microscope image where precise observation is required among locations observed at low magnification with an optical microscope image, and cathodoluminescence analysis through a spectroscope during the electron microscope observation process is possible.

In one embodiment of the present invention, the light mode adjusting mirror 200 is adjusted to one of 50-50 reflection transmission mode, reflection mode, and transmission mode. The light mode control mirror 200 is located in front of the spectrometer 30 in the path of light, and is passed through the 50-50 reflection transmission mode mirror 220, the reflection mode mirror 230, and the transmission mode through hole 210. By adjusting in the incoming optical beam path, the mode can be changed to suit various signal acquisition conditions, and electron microscope images can be acquired by default in all modes. Specifically, the transmission mode is used when analyzing a spectral signal exclusively for a cathodoluminescence signal, which is an optical signal generated by an electron beam. In this case, the cathodoluminescence generation signal enters the spectrometer without loss, so it is a very suitable mode when the amount of light is small. The 50-50 reflection transmission mode is suitable for acquiring the scanning area image of the electron beam at the same time as the wavelength spectroscopic analysis of the signal generated by cathodoluminescence. In addition, the reflection mode is a mode suitable for simultaneously observing the electron microscope and the optical microscope, and can be used when the optical microscope image of the sample is obtained brightly or the fluorescence signal is weak.

2 is a conceptual diagram of a light reflecting mirror 100 having an electron through hole 110 having a curved surface and a straight line in a cut surface according to an embodiment of the present invention, and FIG. 3 is a rectangular cut surface according to an embodiment of the present invention. It is a conceptual diagram of a light reflecting mirror 101 having a phosphorus electron through hole 110. 2A and 3A are perspective views of the mirror, and FIGS. 2B and 3B are front views, and FIGS. 2C and 3C are cross-sectional views of AA connection lines shown in the front view. In one embodiment of the present invention, the light-reflecting mirror is manufactured using crystal properties of silicon in order to improve the conventional method of making small holes in a mirror made of metal or glass so that the electron beam passes and the optical beam reflects. Provides a light reflecting mirror. A silicon light reflecting mirror according to an embodiment of the present invention includes a single crystal silicon plate having a thickness of 0.5 to 1 mm; A through hole formed in the plate and having a rectangular pyramid shape having a rectangular bottom surface; And a double-layer reflective thin film coated on both sides of the plate. In one embodiment of the present invention, the through hole is manufactured to be formed in the center of the photon beam path when installed in the fusion microscope, and in the plate, the cut surface except for the cut surface parallel to the short side of the rectangle which is the bottom surface of the square pyramid shape is curved. Or square. In one embodiment of the present invention, the through hole may be formed along the crystal direction of the single crystal silicon. In one embodiment of the present invention, each side of the quadrangular pyramid is formed at an angle of 50 to 60 degrees with respect to the bottom surface according to the silicon single crystal structure characteristics, and a preferred angle is 54.74 degrees. In one embodiment of the present invention, the plate has at least one cut surface parallel to the side of the bottom surface of the square pyramid, and the cross-sectional area of the bottom surface of the square pyramid shape is 400 to 500 μm ² , and the preferred area is 0.9 * 0.487 = It is 0.4383 mm ² . The double-layer reflective thin film has a thickness of 100 to 200 nm on a thin film of silver (Ag) coated with a thickness of 100 to 200 nm on a thin film of chromium (Cr) coated with a thickness of 15 to 25 nm, or a thin film of titanium (Ti) coated with a thickness of 15 to 20 nm. It is a coated aluminum (Al) thin film. In addition, in order to protect the surface of silver and aluminum and prevent oxidation, an oxide film (eg, SiO ₂ ) is coated with a thickness of 50 to 100 nm. The light reflecting mirror having a through hole in the shape of a square pyramid having a rectangular bottom surface enables a square image to be obtained when observing an electron microscope image while inclined at 45 degrees. By doing this, there is an advantage that it becomes convenient to align and synthesize the image of the optical microscope and the image of the electron microscope. In one embodiment of the present invention, the length of the long side is in the range of 1.8 to 2.0 mm, and the length of the short side is in the range of 1.4 to 1.6 mm, preferably 1.9 mm and 1.5 mm, respectively.

In one embodiment of the present invention, in order to solve the problem of a gold (Au) layer that does not reflect light of a wavelength of less than 500 nm as a light reflecting layer, silver (Ag) or aluminum that reflects not only long wavelength light but also ultraviolet light well (Al) is used. This is because the cathodoluminescence generated by the electron beam is also generated in the ultraviolet region. In one embodiment of the present invention, when silver is deposited, chromium (Cr) is used as an adhesion layer, and when aluminum is deposited, titanium (Ti) is used as an adhesion layer. Since the silicon substrate has a thin thickness of less than 1 mm, it is advantageous in that a through hole does not need to be largely drilled when manufactured for use as a right angle mirror. In another embodiment of the present invention, any type of coating of different metal thin films in two layers or coating of a single metal film may be used as long as it reflects light and prevents charging. It can be deposited in various thicknesses according to the state of the electron beam.

4 is a conceptual diagram of a single crystal silicon wafer 1000 in which a light reflecting mirror 100 having an electron through hole 110 having a curved surface and a straight line is formed according to an embodiment of the present invention, and FIG. 5 is an exemplary embodiment of the present invention. A conceptual diagram of a single crystal silicon wafer 1001 having a light reflecting mirror 101 having an electron through hole 110 having a square cut surface according to an embodiment is formed. In one embodiment of the present invention, the light reflection mirror is arranged on an 8-inch or larger silicon wafer in order to manufacture the light reflection mirror. Cutting the substrate into a plate unit including one through hole in the light reflecting mirror manufactured using a silicon wet process, wherein the substrate has at least one cut surface parallel to the side of the bottom of the square pyramid shape Including, there is an economical effect that it is possible to obtain a large amount of the light reflecting mirror. In one embodiment of the present invention, the cross-sectional area of the bottom surface of the square-pyramidal through-hole is 400 to 500 μm ² , but its size can be changed. The through hole is large enough to pass the electron beam, and is formed small so that reflection loss of the optical beam hardly occurs. Since the present invention uses anisotropic etching of the crystal structure due to the nature of the single crystal silicon wet process, the through hole is etched at 54.7°, which is an angle between the <111> and <100> surfaces, and the through hole becomes narrower from one side to the other (Tapering ), when the light reflecting mirror is arranged inclined at 45°, interference with the electron beam coming down from the top is reduced. At this time, the light reflecting mirror having a through hole in the shape of a square pyramid having a rectangular bottom surface enables a square image to be obtained when observing the electron microscope image while inclined at 45 degrees.

6 is a conceptual diagram of an optical objective lens alignment mount 50 for a sample chamber of an optical-electron fusion microscope equipped with a light reflecting mirror having an electron through hole according to an embodiment of the present invention. 6A is a perspective view of the alignment mount, FIG. 6B is a front view, and FIG. 6C shows a view port 53 that can be seen from the outside when the mount is mounted in the sample chamber. 6D is a cross-sectional view connecting line A-A of FIG. 6C. The mount is an objective lens alignment mount manufactured to enable precise alignment while maintaining the vacuum degree of the optical objective lens 52 installed inside the vacuum chamber in order to obtain an image of a sample and a fluorescence signal inside the vacuum equipment. In one embodiment of the present invention, the alignment mount includes: a body part 50 for fixing the optical objective lens 52 through which incident light, reflected light, and cathodoluminescence signal pass; A vacuum holding moving part including a motor (not shown) and an O-ring 51 to mount the body part over the inside and outside of the sample chamber and maintain a vacuum while moving in a direction parallel or perpendicular to the optical path; And a light reflection mirror mounting portion 55 such that a light reflection mirror having an electron through hole having a rectangular pyramid shape having a rectangular bottom surface comes to a position where the light path meets the sample incident electron beam. In one embodiment of the present invention, the optical objective lens alignment mount for the sample chamber mounts the body part 50 for fixing the objective lens over the inside and outside of the sample chamber 40, and in a direction parallel or perpendicular to the optical path ( xyz, 3-axis) includes a vacuum holding moving unit having a motor and an O-ring 51 to maintain a vacuum while moving. In one embodiment of the present invention, an optical objective lens is installed inside the vacuum chamber to obtain an image of an optical microscope or a cathodoluminescence signal. Optical objective lens alignment using O-ring and view port 53 so that the objective lens and the light-reflecting mirror with electron through-holes in the shape of a rectangular pyramid can be finely aligned at the same time while maintaining a vacuum. Install the mount.

7 is a conceptual diagram illustrating a light reflection path of a light reflection mirror 100 having an electron through hole mounted on an optical objective lens alignment mount 50 for an optical-electron fusion microscope sample chamber according to an embodiment of the present invention. The light focused through the optical objective lens proceeds to the incident optical path α toward the light reflecting mirror. If there is no light reflection mirror, it will go straight to the progress light path γ, but it is reflected by the light reflection mirror and proceeds toward the sample through the reflection light path β. In one embodiment of the present invention, the size of the light reflecting mirror having an electron through hole may be manufactured to a minimum size in consideration of the numerical aperture of a corresponding optical objective lens. This is because it is possible to shorten the working distance of the objective lens. As shown in the optical path diagram shown in FIG. 5, it is preferable to design the size of the mirror so that all optical paths can be reflected so that there is no light loss due to the aperture angle of the optical objective lens.

FIG. 8 is obtained when a cathodoluminescence signal is generated in an optical-electron fusion microscope equipped with a spectrometer including an optical objective lens alignment mount for a sample chamber in an optical-electronic fusion microscope equipped with a light reflecting mirror having an electron through hole according to an embodiment of the present invention. One is an electron microscope image (a), an electron beam scan area image (b), and a spectral graph (c) of the signal. In one embodiment of the present invention, the cathodoluminescence signal generated by electron beam scanning can be analyzed by a spectroscope, and at this time, it is possible to observe a cathodoluminescence region generated by scanning of an electron beam in an optical microscope in a full field microscope method.

Although the exemplary embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concept of the present invention defined in the following claims are also present. It is within the scope of the invention.

All technical terms used in the present invention, unless otherwise defined, are used in the same sense as those of ordinary skill in the art generally understand in the related field of the present invention. The contents of all publications referred to herein by reference are incorporated into the present invention.

Claims

An optical objective lens alignment mount for an optical-electronic fusion microscope sample chamber, wherein the alignment mount comprises:

A body portion for fixing the optical objective lens through which incident light, reflected light and cathodoluminescence signal pass;

A vacuum holding unit having a motor and an O-ring so as to mount the body part over the inside and outside of the sample chamber and maintain a vacuum while moving in a direction parallel or perpendicular to the optical path; And

Including a light reflection mirror mounting portion so that the light reflection mirror having an electron through hole of a rectangular pyramid shape having a rectangular bottom surface comes to a position where the light path meets the sample incident electron beam,

Optical objective lens alignment mount for the sample chamber of the optical-electronic fusion microscope.
The method of claim 1,

The light reflecting mirror,

A single crystal silicon plate with a thickness ranging from 0.5 to 1 mm;

A through hole in the shape of a square pyramid having a rectangular bottom surface formed in the center of the plate;

A double-layer reflective thin film coated on both sides of the plate; And

A silicon oxide film (SiO 2 ) for surface protection and oxidation prevention on the double-layer reflective thin film includes a coating layer having a thickness of 50 to 100 nm,

The through hole is formed at an angle of 50 to 60 degrees with respect to the bottom surface of each side of the square pyramid along the crystal direction of the single crystal silicon,

The plate has at least one cut surface parallel to the side of the bottom of the quadrangular pyramid, and the cross-sectional area of the bottom of the through hole of the quadrangular pyramid is 400 to 500 μm 2 ,

The double-layer reflective thin film is a silver (Ag) thin film coated with a thickness of 100 to 200 nm on a chromium (Cr) thin film coated with a thickness of 15 to 25 nm, or a thickness of 100 to 200 nm on a titanium (Ti) thin film coated with a thickness of 15 to 25 nm. Coated aluminum (Al) thin film,

Optical objective lens alignment mount for the sample chamber of the optical-electronic fusion microscope.
The method of claim 2,

The through hole is formed in the center of the plate,

In the plate, the cut surface except for the cut surface parallel to the short side of the rectangle, which is the base of the square pyramid shape, is a curved surface or a square,

Optical objective lens alignment mount for the sample chamber of the optical-electronic fusion microscope.
Photo-electron fusion microscope equipped with a spectroscope,

The fusion microscope includes: a sample chamber having an optical objective lens alignment mount for the sample chamber of any one of claims 1 to 3;

An electron microscope unit including an electron beam focusing tube for scanning electron beams into the sample chamber;

An optical microscope unit including an illumination system for irradiating light to the optical objective lens and an imaging system for imaging reflected light;

A sample stage for adjusting a sample position so that the light reflected by the light reflecting mirror passing through the optical objective lens and the focused beam passing through the through hole of the light reflecting mirror are directed;

An optical mode adjustment mirror for adjusting an optical path to be changed at a right angle between the optical objective lens and the imaging system; And

Including a spectroscope for analyzing a signal reflected from a sample or cathodoluminescence passing through the optical mode control mirror in the optical objective lens,

Photo-electron fusion microscope equipped with a spectroscope.
The method of claim 4,

The optical mode adjustment mirror,

Adjusted to one of 50-50 reflection transmission mode, reflection mode, and transmission mode,

Photo-electron fusion microscope equipped with a spectroscope.