WO2020155176A1 - Light-emitting apparatus - Google Patents

Light-emitting apparatus Download PDF

Info

Publication number
WO2020155176A1
WO2020155176A1 PCT/CN2019/074690 CN2019074690W WO2020155176A1 WO 2020155176 A1 WO2020155176 A1 WO 2020155176A1 CN 2019074690 W CN2019074690 W CN 2019074690W WO 2020155176 A1 WO2020155176 A1 WO 2020155176A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
layer
emitting device
led chip
substrate
Prior art date
Application number
PCT/CN2019/074690
Other languages
French (fr)
Chinese (zh)
Inventor
徐宸科
余长治
黄兆武
时军朋
黄永特
Original Assignee
泉州三安半导体科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 泉州三安半导体科技有限公司 filed Critical 泉州三安半导体科技有限公司
Priority to PCT/CN2019/074690 priority Critical patent/WO2020155176A1/en
Priority to CN201980000864.4A priority patent/CN110178230A/en
Publication of WO2020155176A1 publication Critical patent/WO2020155176A1/en
Priority to US17/360,956 priority patent/US11978839B2/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • H01L33/46Reflective coating, e.g. dielectric Bragg reflector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls

Definitions

  • the present invention relates to the field of semiconductor devices, specifically a light emitting device.
  • Light-emitting diodes are widely used as solid-state lighting sources. Compared with traditional incandescent bulbs and fluorescent lamps, light-emitting diodes have the advantages of low power consumption and long life. Therefore, light-emitting diodes have gradually replaced traditional light sources and are used in various fields, such as traffic signs, backlight modules, street lighting, Medical equipment, etc. Summary of the invention
  • a light emitting device includes: a bracket having a mounting surface for mounting a light-emitting diode chip, and a first wire bonding area and a second wire bonding area, the first bonding The wire area and the second wire bonding area are electrically isolated from each other; the LED chip, mounted on the mounting surface of the bracket, includes a substrate, and a first electrode, a second electrode, and an epitaxial stack located thereon.
  • the epitaxial stack Having opposite upper and lower surfaces; a layer of packaging material for sealing the LED chip on the support; the first electrode and the second electrode are formed on the substrate and located on the epitaxial laminate On the one hand, it forms an electrical connection with the lower surface of the epitaxial laminate, and on the other hand, it is connected to the first wire bonding area and the second wire bonding area of the bracket respectively through leads.
  • a light emitting device includes: a bracket having a mounting surface for mounting a light emitting diode chip, and a first wire bonding area and a second wire bonding area, the first bonding The wire area and the second wire bonding area are electrically isolated from each other;
  • the LED chip, mounted on the mounting surface of the bracket includes a substrate, and a first electrode, a second electrode, an electrical connection layer, and an epitaxial stack on the substrate,
  • the epitaxial laminate has opposite upper and lower surfaces; a layer of packaging material for sealing the LED chip on the support; on the one hand, the first electrode and the second electrode are separated from the The lower surface of the epitaxial laminate is led out toward the upper surface of the epitaxial laminate, and on the other hand, it is respectively connected to the first wire bonding area of the support through leads And the second wire bonding area.
  • a light emitting device includes: a bracket having a mounting surface for mounting an LED chip; and an LED chip, including a substrate and an epitaxial laminate, mounted on the mounting surface of the bracket , Having opposite upper and lower surfaces, where the upper surface is the light-emitting surface; a packaging material layer covering the surface of the LED chip, sealing the LED chip on the support.
  • the light emitting device further includes a first metal reflective layer and a second metal reflective layer, the thickness of the LED chip is defined as T, and the distances from the first and second metal reflective layers to the light-emitting surface of the LED chip are respectively H1 and H3, criz_l ⁇ H2 ⁇ H/2.
  • a light emitting device includes: a bracket having a mounting surface for mounting an LED chip; and an LED chip, including a transparent substrate and an epitaxial laminate, and mounted on the mounting surface of the bracket On; a layer of packaging material covering the surface of the LED chip to seal the LED chip on the bracket.
  • a first reflective layer is provided above the transparent substrate, and a second reflective layer is provided below the transparent substrate.
  • the light emitted by the LED chip enters the packaging material layer, and part of the light enters after being reflected or scattered.
  • the transparent substrate is reflected by the first and second reflective layers and then exits the substrate.
  • a light emitting device includes: a bracket having a mounting surface for mounting LED chips; two or more LED chips mounted on the mounting surface of the bracket; packaging material The layer covers the surface of the LED chip and seals the LED chip on the support.
  • the light-emitting angle of the LED chip is less than or equal to 120°, and the upper surface of the LED chip is the light-emitting surface.
  • the LED chip includes a first electrode, a second electrode, and a reflective layer. The first and second electrodes face upward, and the reflective layer is connected to the reflective layer. The distance of the light emitting surface is less than 10 microns.
  • FIG. 1 is a schematic diagram illustrating the structure of a conventional light emitting diode package.
  • FIG. 2 is a schematic diagram illustrating the structure of a conventional light emitting diode package.
  • FIG. 3 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 4 is a schematic diagram illustrating the LED chip structure of the light-emitting device of some embodiments.
  • FIG. 5 is a schematic diagram illustrating the LED chip structure of the light-emitting device of some embodiments.
  • FIG. 6 is a schematic diagram illustrating the LED chip structure of the light-emitting device of some embodiments.
  • FIG. 7 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 8 is a schematic diagram illustrating part of the light path of the light emitting device shown in FIG. 7.
  • FIG. 9 is a schematic diagram illustrating light emitting devices of some examples of the present invention.
  • FIG. 10 is a schematic diagram illustrating the LED chip structure of the light emitting device according to some embodiments.
  • FIG. 11 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 12 is a schematic diagram illustrating the LED chip structure of the light emitting device according to some embodiments.
  • FIG. 13 is a schematic diagram illustrating the LED chip structure of the light emitting device according to some embodiments.
  • FIG. 14 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 15 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 16 is a schematic diagram illustrating the LED chip structure of the light emitting device according to some embodiments.
  • FIG. 17 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 18 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 19 is a schematic diagram illustrating light emitting devices of some examples of the present invention.
  • FIG. 20 is a schematic diagram illustrating light emitting devices of some examples of the present invention.
  • FIG. 21 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 22 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 23 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIGS. 24 and 25 are a schematic plan view and a partial side sectional view, respectively, illustrating light-emitting devices of some examples of the present invention
  • FIG. 26 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
  • FIG. 1 shows a conventional LED light-emitting device, including a packaging support 110, an LED chip 120 and a packaging material layer 130, wherein the support 110 includes a bottom 111 and side walls 112, wherein the upper surface of the bottom is provided with a chip mounting area 1101
  • the p and n electrodes are located on the light-emitting surface, and are respectively connected to the first wire bonding area 1102 and the second wire bonding area 1103 of the bracket 110 through the leads 141 and 142, and the encapsulation layer 130 seals the chip 120 on the bracket 110.
  • the package support 110 may include a bottom 111 and a side wall 112, and the two form a space for accommodating the LED chip 120.
  • the electrodes of the LED chip 120 are located on the light-emitting surface, and have light-shielding and/or light-absorbing effects.
  • the electrode is located on the epitaxial laminate, and the wire bonding process may cause damage to the epitaxial laminate.
  • FIG. 2 shows another conventional LED lighting device.
  • the LED chip 120 used in the light-emitting device has a flip-chip structure, and its electrodes face the bottom surface 111 of the support.
  • the light-emitting device can solve the problem of light-shielding and absorption of light on the light-emitting surface of the light-emitting device shown in FIG. 1.
  • the flip chip is mounted on the bracket, special equipment and alignment are required.
  • FIG. 3 shows a light emitting device implemented in accordance with the present invention.
  • the light emitting device includes: a bracket 210, an LED chip 220, and a packaging material layer 230.
  • the bracket 210 includes a bottom portion 211 and a wall portion 212 to form a cup structure.
  • the upper surface of the bottom portion 211 is provided with a chip mounting area 2101, a first wire bonding area 2102, and a second wire bonding area 2103.
  • the area 2102 and the second wire bonding area 2103 are electrically isolated from each other.
  • LED chip 22 0 is installed on the mounting area 2101 of the bracket with the light emitting surface facing upward, and its p and n electrodes are respectively connected to the first wire bonding area 2102 and the second wire bonding area 2103 of the bracket 210 through the leads 241 and 242.
  • the packaging material layer encapsulates the LED chip on the support.
  • FIG. 4 shows the structure of an LED chip 220 used in the light-emitting device shown in FIG. 3, the LED chip sequentially comprising from top to bottom: an epitaxial laminate 2210, a first electrode 2221, a second electrode 2222, electricity The layer 2240 and the substrate 2230 are connected.
  • the epitaxial stack of the LED chip is supported by the substrate 2230, and the upper surface S11 of the epitaxial stack 2210 serves as the light-emitting surface without a growth substrate.
  • no growth substrate means that the growth substrate used for growth is removed from the epitaxial stack or at least greatly thinned if necessary.
  • the epitaxial stack 2210 has an upper surface S11 and a lower surface S12 opposite to each other, wherein the upper surface S11 serves as a light-emitting surface and includes a first semiconductor layer 2211, an active layer 2212, and a second semiconductor layer 2212.
  • the semiconductor layer 2211 and the second semiconductor layer 2213 may be a p-type semiconductor layer and an n-type semiconductor layer, respectively.
  • the first semiconductor layer and the second semiconductor layer can be expressed by the chemical formula Al x In y Ga (1-xy) N (where 0 ⁇ x ⁇ l, 0 ⁇ y ⁇ l, (Kx+y ⁇ l) Nitride semiconductor is formed, but is not limited to this, GaAs-based semiconductor or GaP-based AlGalnP semiconductor material may also be used.
  • the active layer 2212 may have a nitride-based multiple quantum well structure (MQW), such as InGaN/GaN, GaN/ AlGaN, but not limited to this, other semiconductors, such as Galas/AlGaAs, InGaP/GaP, GaP/AlGaP, etc. can also be used.
  • MQW nitride-based multiple quantum well structure
  • the electrical connection layer 2240 is formed on the lower surface S12 of the epitaxial stack, and includes a first electrical connection layer 2241 and a second electrical connection layer 2242. Both ends of the first electrical connection layer 2241 are respectively connected to the first semiconductor layer 2211 and Both ends of the first electrode 2221 and the second electrical connection layer 2241 are respectively connected to the second semiconductor layer 2213 and the second electrode 2222.
  • the materials of the first electrical connection layer 2241 and the second electrical connection layer 2242 may be the same or different.
  • the material of the first electrical connection layer 2241 can be Ag, Au, Ti, Al, Cr, Pt, TiW, Ni or any combination of the above, wherein Ag and Al are suitable as metal reflective materials, and TiW is suitable as metal coating materials, To prevent metal diffusion, Cr, Ni, and Au are suitable as ohmic contact materials.
  • a transparent current spreading layer is also added between the first electrical connection layer 2241 and the first semiconductor layer 2211.
  • the second electrical connection layer includes an ohmic contact layer having good electrical connection performance with the second semiconductor layer 2213, such as Cr, Ni, Au, Al, and the like.
  • the material of the second electrical connection layer can be Ag, Au, Ti, Al, Cr, Pt, TiW, Ni, or any combination of the above, wherein Ag, Al are suitable as metal reflective materials, and TiW is suitable as a metal coating material to prevent Metal diffusion, Cr, Ni, Au are suitable for It is an ohmic contact material.
  • the first electrode 2221 and the second electrode 2222 are located outside the epitaxial laminate 2210, that is, the projection of the first electrode 2221 and the second electrode 2222 on the surface of the substrate 2230 is outside the area of the epitaxial laminate 2210.
  • the first electrode and the second electrode are led out from the lower surface S12 of the epitaxial laminate 2210 through the electrical connection layer 2240 and face the upper surface S11 of the epitaxial laminate, so as to be suitable for electrically contacting the body of the light emitting diode chip from the positive side.
  • the upper surfaces of the first electrode and the second electrode are located at the same height.
  • the substrate 2230 is used to support the epitaxial stack 2210, and its thickness is preferably 50 or more and 200 or less.
  • the thickness of the substrate 2230 may be 50-100 [xm, for example, 90 [xm; in some embodiments, the thickness of the substrate 2230 may also be 100 to 150 1, such as 120 1, or 130 1; In some embodiments, the thickness of the substrate 2230 may also be 150-20Vm, for example, 18Vm.
  • the substrate 2230 preferably uses an insulating material, which may be a transparent material, such as a sapphire substrate, a ceramic substrate, etc., and may also be highly reflective. Material.
  • the first electrode and the second electrode are located on the side of the epitaxial stack, which can prevent the first electrode and/or the second electrode from being arranged above the epitaxial stack to shield radiation and reduce Radiation efficiency, and convenient to make wire bonding.
  • the substrate 2230 may be made of a material with good heat dissipation properties, such as a Si substrate, a Cu substrate or a ceramic substrate.
  • the electrical connection layer 2240 is connected to the heat dissipation substrate 2230 and the second semiconductor layer 2213, respectively.
  • a good heat conduction channel is formed to guide heat from the second type semiconductor layer to the heat dissipation substrate. Since the excitation radiation of the multiple quantum well is emitted through the second semiconductor layer, heat is easily accumulated on the second semiconductor layer 2213, and the electrical connection layer 2242 can well draw the heat from the second semiconductor layer to the heat dissipation substrate.
  • FIG. 5 shows the structure of an LED chip 220 used in the light emitting device shown in FIG. 3.
  • the electrical connection layer 2240 is arranged in multiple layers in the vertical direction, and is electrically isolated by the insulating layer 2260.
  • a third electrical connection layer 2244, an insulating layer 2260, a first conductive conductor 2241, and a second electrical connection layer 2242 are sequentially arranged from bottom to top between the substrate 2230 and the epitaxial stack 2210.
  • the third electrical connection layer 2244 It has a first extension portion 2243 and a second extension portion 2245 facing the epitaxial stack.
  • the first extension portion 2243 penetrates the first semiconductor layer 2221 and the active layer 2222, and is electrically connected to the second semiconductor layer 2213 through the opening 2271,
  • the second extension portion 2245 is electrically connected to the second electrical connection layer 2242 through the opening 2272.
  • the first electrical connection layer 2241 and the second electrical connection layer 2242 have the same thickness and material, and are patterned in It is formed in the same step, so it can have the same height, which facilitates subsequent production of the first electrode and the second electrode with the same height.
  • the portion where the first electrical connection layer 2241 contacts the first electrode 2221, and the portion where the second electrical connection layer 2242 contacts the second electrode 2222 are Ti, Pt, and Au with relatively stable performance. , Cr, Ti W alloy and other materials.
  • the first electrical connection layer 2241 located under the light-emitting area includes a highly reflective metal material (such as Ag, Al, etc.) that sequentially reflects the light emitted from the light-emitting area, and is used to prevent the diffusion of the aforementioned materials.
  • Metal materials such as Ti, Pt, Au, Cr or TiW, etc.).
  • the third electrical connection layer 2244 includes an extension portion 2243 extending toward the light-emitting surface and connected to the second semiconductor layer 2213, and its material preferably includes reflective materials such as Al, Cr, or Ag. Further, the side of the third electrical connection layer 2244 in contact with the substrate 2230 may include a bonding layer for bonding the substrate. More preferably, the bonding layer is made of a metal material, which can be used as a heat dissipation layer at the same time, so that the heat accumulated on the second semiconductor layer is quickly drawn to the substrate 2230. On the other hand, the substrate 2230 is in contact with the entire surface of the epitaxial laminate, ensuring the integrity of the physical structure.
  • the epitaxial stack 2210 of the LED chip 220 removes the growth substrate to form a thin film structure
  • the first electrical connection layer 2241 may include a reflective layer M1, so the distance D1 from the reflective layer M1 to the light-emitting surface S11 of the LED chip is 1 (within Vm, for example, 4-8 pm, and the distance D3 to the light-emitting layer is: 1 pm
  • the path of light inside the LED chip is shortened, and the ratio of light emitted from the active layer 2212 from the light-emitting surface S11 is increased.
  • the light-emitting angle is preferably 150° or less, and more preferably, the light-emitting angle is less than or equal to 120. °, such as 120-110°, in a specific embodiment, the light-emitting angle of the LED chip may be 113°, or 115°, or 118°.
  • the third electrical connection layer 2244 may include a reflective layer M2, the reflective layer M2 is located on the substrate 2230, and the distance from the light emitting surface S11 is preferably 2 (Vm or less, much less than half of the thickness T of the LED chip, More preferably, it is 7 ⁇ 12 [ xm, for example, it can be 8 [ xm, or 9 [ xm, or [ xm.
  • FIG. 6 shows the structure of an LED chip 220 used in the light emitting device shown in FIG.
  • the third electrical connection layer 2244 includes a plurality of extensions 2243 extending toward the light exit surface, and the plurality of extensions 2243 penetrate the first semiconductor layer 2211, the active layer 2212, and The second semiconductor layer 2213 is connected.
  • the plurality of extensions 2243 are preferably evenly distributed, so that they have better current expandability and heat dissipation characteristics, and are suitable for applications under high current density.
  • the total contact area between the third electrical connection layer 2244 and the second semiconductor layer 2213 is larger than that of the second semiconductor layer. 1.5% of the area of layer 2213.
  • the contact area between the third electrical connection layer 2243 and the second semiconductor layer 2213 can be designed according to requirements, for example, 2.3% ⁇ 2.8%, 2.8% ⁇ 4%, or 4% ⁇ 6% can be selected.
  • increasing the direct contact area between the third electrical connection layer 2244 and the second semiconductor layer 2213 can solve the heat dissipation problem of high-power products, such as large-size chips or high-voltage chips.
  • the diameter of the extension 2243 is 15 pm or more. Although ensuring the total contact area of the third electrical connection layer 2244 and the second semiconductor layer 2213 can improve the heat dissipation characteristics, if the diameter of the extension portion 2243 is small, the thinner extension portion 2243 has a thermal resistance exceeding a linear ratio. Therefore, in some embodiments, the diameter of the extension part 2243 is designed to be 32 ⁇ m ⁇ 4 ⁇ m, which has better heat dissipation effect. As a preferred embodiment, when the diameter of the extension part 2243 is 34 ⁇ m ⁇ 36 ⁇ m, the extension The number of parts 2243 is set to 20-25.
  • the first electrical connection layer 2241 and the second electrical connection layer 2242 adopt the same structural layer, including the metal reflective layer M1, and the side of the third electrical connection layer 2244 close to the epitaxial stack can be Including the metal reflective layer M2, the lower surface S12 of the epitaxial stack 2210 is basically covered by the metal reflective layers M1, M2, and the downward light emitted by the active layer 2212 is directly reflected and will not pass through the substrate to cause part of the light to be absorbed.
  • the first electrical connection layer 2241 and the second electrical connection layer 2242 may include an Ag metal layer as the first reflective layer M1, and the third electrical connection layer 2244 may include an Al metal layer.
  • the layer 2 213 forms an ohmic contact.
  • the second reflective layer M2 it covers as much as possible the area of the lower surface S 12 of the epitaxial stack that is not covered by the first electrical connection layer 2241 and the second electrical connection layer 2242.
  • the growth substrate of the LED chip 220 is removed, and a rough surface 2210a may be provided on the light emitting surface S11.
  • FIG. 7 simply illustrates a light emitting device implemented according to the present invention.
  • the light-emitting device is provided with at least two reflective layers: M2 and M3, including: a bracket 210, an LED chip 220, and a packaging material layer 230.
  • the bracket 210 includes a bottom portion 211 and a wall portion 212, which form a cup structure
  • the surface of the chip mounting area 2101 may be plated with a reflective layer M3
  • the LED chip 220 is mounted in the cup through the bonding layer 250
  • the packaging material The layer 230 fills the bowl to seal the LED chip 220.
  • the reflective layer M3 provided on the surface of the support 210 may be a metal reflective layer (such as Ag, Al and other high-reflectivity materials), or an insulating reflective layer (such as DBR), or a reflective adhesive material (such as white glue). ), the thickness is preferably 5 pm or less.
  • the bonding layer 250 is a transparent material, and the light transmittance is preferably 70% or more, more preferably It is more than 80%.
  • the LED chip 220 has a transparent substrate 2230, and the upper surface of the substrate 2230 is provided with a reflective layer M2.
  • the transparent substrate 2230 has a visible light transmittance of more than 80%, preferably more than 90%, and its material can be sapphire, transparent ceramics, glass, and the like.
  • the LED chip may refer to the structure shown in FIG. 4.
  • the substrate of the LED chip is a transparent substrate, and the first electrical connection layer 2241 may serve as the reflective layer M2.
  • the first electrical connection layer 2241 may be formed by stacking multiple layers, including a highly reflective material layer, for example, a highly reflective metal material such as aluminum.
  • the thickness of the material layer of the highly reflective layer is preferably 50 nm or less.
  • the LED chip 220 also adopts the structure shown in FIG. 5 or FIG. 6, wherein the substrate 2230 is made of a transparent material, and the third electrical connection layer 2243 on the upper surface thereof can be used as the light-reflecting layer M2.
  • the third electrical connection layer 2243 is made of a metal material and has a reflectivity of more than 70%. In this case, it can be directly used as a reflective layer.
  • the third electrical connection layer 2243 is formed by stacking multiple layers, wherein the side in contact with the substrate 2230 includes a material layer with higher reflection, for example, a highly reflective metal material such as aluminum. The thickness of the material layer is preferably 50 nm or less.
  • the size of the substrate of the LED chip 220 shown in FIGS. 4 to 6 is generally larger than that of the epitaxial stack 2210 (the area of its cross-section is greater than that of the epitaxial stack 2210), and the thickness is much larger than that of other structural layers. Thickness, taking a GaN-based LED chip as an example, the thickness of the epitaxial laminate 2210 is generally not more than 10—, for example, it can be 4 ⁇ 8 pm.
  • the total thickness of the substrate is generally not more than 5pm, for example, 3 ⁇ 5pm, and the substrate 2230 is usually above 50pm, such as 50 [ xm, or 100 [ xm, or 120 [ xm, or 150 [ xm, or 180 [ xm], so
  • the light emitted by the active layer is easily incident on the inside of the substrate 2230 through the reflection of the sidewall of the support or the scattering and reflection of the packaging material layer, and may be absorbed by the metal above the substrate 2230 or the metal on the support.
  • the packaging material layer 230 encapsulating the LED chip 220 contains particles 231, and part of the light emitted by the LED chip 220 will be reflected or scattered to the side of the transparent substrate. There is a reflective layer underneath, so light will be emitted from the other end without being absorbed by the bonding layer metal or the metal of the bracket.
  • the LED chip is covered with phosphor powder around and above, and part of the light emitted by the LED chip 220 will be reflected or scattered to the side of the transparent substrate, because there are reflective layers on and under the transparent substrate 210 , So the light will be emitted from the other end without being absorbed by the bonding layer metal or the metal of the bracket.
  • the phosphor is covered below the plane where the reflective layer M2 is located.
  • the transparent substrate 2230 cooperates with the upper and lower reflective layers, which can significantly reduce the reflection or reflection of the light emitted by the LED chip 220. Scattered into the substrate and absorbed.
  • FIG. 9 simply illustrates a light emitting device implemented according to the present invention.
  • the light emitting device also has at least two reflective layers M2 and M3, and the adopted LED chip 220 has a transparent substrate 2230.
  • the difference from the light-emitting device shown in FIG. 7 is that the reflective layer M3 under the transparent substrate 2230 is directly formed on the back of the substrate 2230, and its material can be a metal reflective layer (such as Ag, Al, and other high-reflectivity materials), or an insulating reflective layer.
  • Tier e.g. DB
  • FIG. 10 shows the structure of an LED chip 220 used in the light-emitting device shown in FIG. 9, which is basically the same as the LED chip shown in FIG. 5, except that: a transparent substrate 2230 is selected, and the transparent substrate 2230 Reflective layer M3 is provided on the back of the device.
  • the structure shown in FIG. 4 or FIG. 6 may also be adopted.
  • a reflective layer M3 is provided on the back of the substrate 2230 of the LED chip 220 shown in FIG. 4 or FIG.
  • FIG. 11 simply illustrates a light emitting device implemented according to the present invention.
  • the light-emitting device includes a bracket 210, an LED chip 220 is mounted on the bracket 210 through a bonding layer 250, a packaging material layer 230 covers the LED chip 220, and the LED chip 220 is sealed on the bracket.
  • the LED chip includes an epitaxial laminate 2210, a substrate 2230, and a bonding layer 2280 connecting the two.
  • a first reflective layer M21 (or M1) and a second reflective layer M22 are provided above and below the bonding layer 2280.
  • FIG. 12 shows a structure of an LED chip 220 used in the light-emitting device shown in FIG. 9. From top to bottom, the LED chip includes: an epitaxial stack 2210, a first electrode 2221 / a second electrode 2222, a first electrical connection layer 224 1 / a second electrical connection layer, an insulating layer 2260, a third electrical connection layer 2244, The bonding layer 2280, the reflective layer 2290, and the substrate 2230.
  • the first reflective layer may be the first electrical connection layer 2241 and/or the third electrical connection layer 2244.
  • the third electrical connection layer 2244 electrically connects the second semiconductor layer 2213 and the first electrical connection layer 2242 on the one hand, and on the other hand, serves as the first reflective layer M21 and includes reflective materials such as Al, Cr, or Ag.
  • the bonding layer 2280 is used to combine the epitaxial stack 2210 and the substrate 2230, and its material can be a metal material or a non-metal material as required.
  • the light-emitting device is applied to a high current density (for example, the current density A/mm 2 , which may be 2/111111 2 or 3/111111 2 ), and the bonding layer 2280 preferably uses a metal bonding material
  • the reflective layer 2290 preferably also uses a highly reflective metal material (such as aluminum, silver and other metals), so that a heat dissipation channel can be formed, which is beneficial to pass the heat accumulated on the second semiconductor layer 2213 through the third conductive layer 2244 and the bonding layer. 2280, the reflective layer 2290, and the substrate 2230 are led to the support 210 and led out from the support 210.
  • the bonding layer 2280 of the light-emitting device may also be an insulating layer.
  • the reflective layer 2290 may be a metal reflective layer or an insulating reflective layer.
  • FIG. 13 shows the structure of an LED chip 220 used in the light emitting device shown in FIG.
  • the difference from the structure of the LE D chip shown in FIG. 12 is that the sidewall 2281 of the bonding layer 2280 is covered with a reflective layer.
  • the light emitted by the LED chip 220 is reflected by the side wall of the bracket 210 or reflected and/or scattered by the packaging material layer 230, and is incident on the bonding layer 2280, and is covered on the side wall of the bonding layer
  • the reflective layer of 2281 reflects directly to prevent light from entering and entering the interior 2280 of the bonding layer.
  • FIG. 14 simply illustrates a light emitting device implemented according to the present invention.
  • the difference from the light-emitting device shown in FIG. 11 is that a reflective layer 260 is provided on the surface of the chip mounting area 2101 of the bracket 210, and the LED chip 220 is mounted on the reflective layer 260 through the bonding layer 250.
  • the substrate 2230 is made of a transparent material.
  • the light transmittance of is preferably 70% or more.
  • the structure of the LED chip can refer to the structure shown in Figures 12 and 13.
  • the first reflective layer is disposed above the bonding layer 2280 and may be M1.
  • M21 which is mainly used to directly reflect the light emitted downward from the active layer of the LED chip, and the distance between it and the light-emitting surface S11 of the LED chip is l (below Vm, for example, 4 ⁇ 8 pm, and the second reflective layer M22 is provided
  • the distance between the bonding layer 2280 and the transparent substrate 2230 and the light-emitting surface S11 of the LED chip is 20—below, for example, 7 ⁇ 10 ⁇ m, or 10 ⁇ 15 pm
  • the third reflective layer M3 is disposed on the transparent substrate 2230 and The distance between the brackets 210 and the light-emitting surface S11 of L is more than 50 pm.
  • the second reflective layer M22, the third reflective layer M3 and the transparent substrate 2230 form a light transmission channel.
  • the light emitted by the LED chip 220 is due to the side wall of the bracket 210 Part of the light caused by the reflection is incident into the transparent substrate 2230, and the light will be emitted from the other end of the transparent substrate 2230, reducing absorption by the bonding layer 2280 or the bracket 210.
  • FIG. 15 simply illustrates a light emitting device implemented according to the present invention.
  • the light-emitting device also includes at least three reflective layers, a first reflective layer, a second reflective layer M22, and a third reflective layer M3, which are similar to the light-emitting device shown in FIG. The difference is that the third reflective layer M3 is located between the bonding layer 250 and the transparent substrate 2230.
  • FIG. 16 shows the structure of an LED chip 220 used in the light emitting device shown in FIG. 15, and the third reflective layer M3 is formed on the back surface of the transparent substrate 2230.
  • FIG. 17 simply illustrates a light emitting device implemented according to the present invention.
  • the LED chip 220 of the light-emitting device has a reflective substrate 2230, the reflectivity is preferably more than 90%, and can be white ceramic, and the bonding layer 250 for fixing the LED chip 220 is preferably a reflective material
  • the reflectivity is preferably above 80%, and it can be a white solid crystal glue.
  • the substrate 2230 is a reflective substrate, and the side of the third electrical connection layer 2244 adjacent to the substrate includes a bonding layer 2280.
  • the reflective layer M1 and/or M21 is arranged above the bonding layer 2280, so the downward light emitted by the active layer is directly reflected, and part of the light will not be absorbed by the bonding layer. At the same time, part of the light emitted by the LED chip 220 of the light-emitting device irradiates the surface of the reflective substrate 2230 due to the reflection of the side wall of the support, and can be directly reflected to reduce the light absorption of the substrate 2230 or the support 210.
  • the encapsulation material layer 230 encapsulating the LED chip 220 contains particles 231, and part of the light emitted by the LED chip 220 will be reflected or scattered, hit the side of the reflective substrate 2230, and be directly reflected.
  • the LED chip is covered with phosphor powder around and above, and part of the light emitted by the LED chip 220 will be reflected or scattered to the side of the reflective substrate and be directly reflected.
  • FIG. 18 simply illustrates a modification of the light emitting device shown in FIG. 17.
  • the substrate of the LED chip 220 of the light-emitting device is not limited to the reflective substrate, and it can be a transparent substrate (such as a sapphire substrate, a glass substrate, etc.) or a light-absorbing substrate (such as a silicon substrate, etc.), and a reflective layer 2231 is formed on the sidewall of the substrate.
  • FIG. 19 simply illustrates a light emitting device implemented according to the present invention.
  • the same parts as the light-emitting device shown in FIG. 3 will not be repeated here.
  • the difference is that a reflective material layer 231 is provided under the packaging material layer 230, which surrounds the outer side surface S13 of the LED chip 220, but does not cover the LED chip ⁇ surface S11.
  • the reflective material can be silicone, epoxy, or a silicone-epoxide mixed material, such as white glue.
  • the upper surface S21 of the reflective material layer 231 is preferably not lower than the upper surface S14 of the substrate 2230 of the LED chip.
  • the thickness of the LED chip 220 mainly depends on the thickness of the substrate 2230.
  • the thickness of the substrate is generally more than 50, such as 10 ⁇ m. Therefore, when the light-emitting device is working, the LED chip 220 emits light.
  • the side is incident on the inside of the substrate, and absorbed by the inside of the substrate, bracket or LED chip.
  • the light-emitting device shown in FIG. 19 is filled with a reflective material layer 231 between the packaging material layer and the bracket around the LED chip.
  • the reflective material layer 231 is not lower than the upper surface S14 of the substrate 2230, so it can effectively prevent the light emitted by the LED chip from being emitted. After entering the packaging material layer 230, it is reflected or scattered into the substrate 2230.
  • the distance H1 between the upper surface S21 of the reflective material layer and the light-emitting surface S11 of the LED chip is preferably within 20 pm, and more preferably within 1 (Vm).
  • the reflective material The material layer 231 surrounds the LED core 220 to reach the upper surface S14 of the substrate 2230.
  • the reflective material layer 231 surrounds the LED core 220 and reaches to cover the electrodes of the LED chip, as shown in Figure 20.
  • the reflective material layer 231 surrounds the LED core 220 until it is flush with the upper surface of the LED chip, as shown in FIG. 21.
  • FIG. 22 simply illustrates a light emitting device implemented according to the present invention.
  • the support 210 of the light-emitting device does not have a cup structure, such as a flat plate structure, and the packaging material layer 230 covers the LED chips and leads.
  • the packaging material layer 230 corresponds to the lens structure 232 formed above the LED chip 220.
  • the lens structure 232 and the packaging material layer 230 can be made of the same material or different materials.
  • FIG. 23 simply illustrates a light emitting device implemented according to the present invention.
  • the difference from the light-emitting device shown in FIG. 22 is that a reflective material 231 surrounding the LED chip 220 is provided between the bracket 210 and the packaging material layer 230.
  • the reflective material 231 may be flush with the light-emitting surface S11 of the LED chip, or lower than The light-emitting surface S11.
  • FIGS. 24 and 25 schematically illustrate a light emitting device implemented according to the present invention.
  • the light-emitting device includes a bracket 210, at least two LED chips 220 mounted on the bracket, and a packaging material layer (not shown in the figure).
  • a plurality of LED chips 220 are installed in the same bracket 210, and there is a problem of blocking light between adjacent LED chips 220.
  • OL as the overlapping length of two adjacent LED chips 220
  • L is the length of the LED chip
  • W is the width of the LED chip
  • P is the perimeter of the LED chip 220, that is, 2x(L+W)
  • T is the The thickness of the LED chip 220
  • G is the distance between adjacent LED chips 220
  • the light blocking between the LED chips is mainly related to the thickness T of the chip, the gap G between the chips, and the overlapping length of the adjacent LED chips Specifically: It is proportional to the thickness T of the LED chip, inversely proportional to the gap G between the LED chips, and proportional to the ratio of the area overlapping adjacent LED chips to the total area of the side surface of the chip (OL/P) , Therefore define the light blocking factors F1 and F2, where FlcxT/G, F2cxOL/P, define the light blocking
  • the light-emitting device uses the LED chip shown in FIG. 5 or 6, which has a reflective layer M1 or M21 between the epitaxial laminate 2210 and the substrate 2230, and the reflective layer reaches the light-emitting surface S11 of the LED chip.
  • the distance D1 can reach l(Vm or less, and the distance D2 to the active layer can reach 5— or less. Therefore, the light-emitting angle of the LED chip is small, preferably equal to or less than 120°, for example, 110 ⁇ 120°, the active layer
  • the light emitted by 2212 is mainly emitted from the light-emitting surface S11, so the side light blocking between the LED chips has little effect.
  • the distance G between adjacent chips can be 15 Vm, preferably 50 ⁇ 12 Vm, which can take into account the blocking Light influence and package size, correspondingly, the light blocking coefficient R is preferably a value above 0.2, which can make full use of space, and at the same time, reduce the package size or increase the chip size under the same package size under the same light effect. Therefore, the light efficiency is improved.
  • the light blocking coefficient R is preferably 0.2-2.
  • a wavelength conversion layer may be provided as required, and the wavelength conversion layer may directly incorporate phosphor into the packaging material layer or adopt a wavelength conversion sheet.
  • the wavelength conversion layer is formed above the plane where the upper surface of the LED chip is located.
  • the wavelength conversion layer is only provided on the light-emitting surface of the LED chip.
  • FIG. 26 simply shows a light-emitting device.
  • the light-emitting device includes a bracket and at least three LED chips located on the bracket, and the multiple LED chips emit different spectra. For example, three lights of red, blue and green are emitted respectively, and the support can be a flat structure or a bowl structure.
  • L m) The chip can be any of the LED chips shown in Figures 4-6.
  • the light-emitting device requires a high current density of 4 A/mm 2 or even 5 A/mm 2.
  • the LED chip shown in FIG. 6 is preferably used at this time.
  • the substrate 2230 preferably adopts an insulating substrate with good heat dissipation, such as a ceramic substrate, which can realize a thermoelectric separation structure, provides a good foundation for high current density driving, and can quickly guide the heat generated by the epitaxial stack to the support Derive; further, the light-emitting angle of the LED chip is less than or equal to 120°, for example, 120 to 110°, under the condition that the light effect remains unchanged, It can effectively reduce the package size, or increase the chip area under the same package size.
  • the light emitting device is applied to a stage light, and includes four LED chips A, B, C, and D, which emit white light, red light, blue light, and green light, respectively.
  • the light emitting surface of the white light LED chip is coated with phosphor powder for emitting white light.
  • the spacing between each LED chip is 50 to 150 microns.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Led Device Packages (AREA)

Abstract

Disclosed is a light-emitting apparatus. In some implementations, the light-emitting apparatus comprises: a bracket having a mounting surface for mounting a light-emitting diode chip, and a first bonding wire region and a second bonding wire region, wherein the first bonding wire region and the second bonding wire region are electrically isolated from each other; an LED chip mounted on the mounting surface of the bracket and containing a substrate, and a first electrode, a second electrode and an epitaxial laminated layer located on the substrate, wherein the epitaxial laminated layer has an upper surface and a lower surface opposite each other; and a packaging material layer for sealing the LED chip on the bracket. The first electrode and the second electrode are formed on the substrate and located on an outer side of the epitaxial laminated layer, and the first electrode and the second electrode are electrically connected to the lower surface of the epitaxial laminated layer, and also are respectively connected to the first bonding wire region and the second bonding wire region of the bracket through leads.

Description

发光装置 技术领域 Light emitting device Technical field
[0001] 本发明涉及半导体器件领域, 具体为一种发光装置。 [0001] The present invention relates to the field of semiconductor devices, specifically a light emitting device.
背景技术 Background technique
[0002] 发光二极管被广泛地用于固态照明光源。 相较于传统的白炽灯泡和荧光灯, 发 光二极管具有耗电量低以及寿命长等优点, 因此发光二极管已逐渐取代传统光 源, 并且应用于各种领域, 如交通号志、 背光模块、 路灯照明、 医疗设备等。 发明概述 [0002] Light-emitting diodes are widely used as solid-state lighting sources. Compared with traditional incandescent bulbs and fluorescent lamps, light-emitting diodes have the advantages of low power consumption and long life. Therefore, light-emitting diodes have gradually replaced traditional light sources and are used in various fields, such as traffic signs, backlight modules, street lighting, Medical equipment, etc. Summary of the invention
技术问题 technical problem
问题的解决方案 The solution to the problem
技术解决方案 Technical solutions
[0003] 根据本发明的第一个方面, 一种发光装置, 包括: 支架, 具有用于安装发光二 极管芯片的安装表面, 及第一焊线区和第二焊线区, 所述第一焊线区和第二焊 线区彼此电性隔离; LED芯片, 安装于所述支架的安装表面上, 包含基板、 及位 于其上的第一电极、 第二电极和外延叠层, 该外延叠层具有相对的上表面和下 表面; 封装材料层, 用于将所述 LED芯片密封于所述支架上; 所述第一电极和第 二电极形成于所述基板之上并位于所述外延叠层的外侧, 一方面与所述外延叠 层的下表面形成电性连接, 另一方面通过引线分别连接到所述支架的第一焊线 区和第二焊线区。 [0003] According to a first aspect of the present invention, a light emitting device includes: a bracket having a mounting surface for mounting a light-emitting diode chip, and a first wire bonding area and a second wire bonding area, the first bonding The wire area and the second wire bonding area are electrically isolated from each other; the LED chip, mounted on the mounting surface of the bracket, includes a substrate, and a first electrode, a second electrode, and an epitaxial stack located thereon. The epitaxial stack Having opposite upper and lower surfaces; a layer of packaging material for sealing the LED chip on the support; the first electrode and the second electrode are formed on the substrate and located on the epitaxial laminate On the one hand, it forms an electrical connection with the lower surface of the epitaxial laminate, and on the other hand, it is connected to the first wire bonding area and the second wire bonding area of the bracket respectively through leads.
[0004] 根据本发明的第二个方面, 一种发光装置, 包括: 支架, 具有用于安装发光二 极管芯片的安装表面, 及第一焊线区和第二焊线区, 所述第一焊线区和第二焊 线区彼此电性隔离; LED芯片, 安装于所述支架的安装表面上, 包含基板、 及位 于其上的第一电极、 第二电极、 电连接层和外延叠层, 该外延叠层具有相对的 上表面和下表面; 封装材料层, 用于将所述 LED芯片密封于所述支架上; 所述第 一电极和第二电极一方面通过该电连接层从所述外延叠层的下表面引出, 朝向 所述外延叠层的上表面, 另一方面通过引线分别连接到所述支架的第一焊线区 和第二焊线区。 [0004] According to a second aspect of the present invention, a light emitting device includes: a bracket having a mounting surface for mounting a light emitting diode chip, and a first wire bonding area and a second wire bonding area, the first bonding The wire area and the second wire bonding area are electrically isolated from each other; the LED chip, mounted on the mounting surface of the bracket, includes a substrate, and a first electrode, a second electrode, an electrical connection layer, and an epitaxial stack on the substrate, The epitaxial laminate has opposite upper and lower surfaces; a layer of packaging material for sealing the LED chip on the support; on the one hand, the first electrode and the second electrode are separated from the The lower surface of the epitaxial laminate is led out toward the upper surface of the epitaxial laminate, and on the other hand, it is respectively connected to the first wire bonding area of the support through leads And the second wire bonding area.
[0005] 根据本发明的第三个方面, 一种发光装置, 包括: 支架, 具有用于安装 LED芯 片的安装表面; LED芯片, 包含基板和外延叠层, 安装于所述支架的安装表面上 , 具有相对的上表面和下表面, 其中上表面为出光面; 封装材料层, 覆盖于所 述 LED芯片的表面, 将所述 LED芯片密封于所述支架上。 [0005] According to a third aspect of the present invention, a light emitting device includes: a bracket having a mounting surface for mounting an LED chip; and an LED chip, including a substrate and an epitaxial laminate, mounted on the mounting surface of the bracket , Having opposite upper and lower surfaces, where the upper surface is the light-emitting surface; a packaging material layer covering the surface of the LED chip, sealing the LED chip on the support.
[0006] 进一步的, 发光装置还包括第一金属反射层和第二金属反射层, 定义 LED芯片 的厚度为 T, 该第一、 第二金属反射层到该 LED芯片的出光面的距离分别为 H1和 H3 , 贝 _l<H2<H/2。 [0006] Further, the light emitting device further includes a first metal reflective layer and a second metal reflective layer, the thickness of the LED chip is defined as T, and the distances from the first and second metal reflective layers to the light-emitting surface of the LED chip are respectively H1 and H3, bei_l<H2<H/2.
[0007] 根据本发明的第四个方面, 一种发光装置, 包括: 支架, 具有用于安装 LED芯 片的安装表面; LED芯片, 包含透明基板和外延叠层, 安装于所述支架的安装表 面上; 封装材料层, 覆盖于所述 LED芯片的表面上, 将所述 LED芯片密封于所述 支架上。 [0007] According to a fourth aspect of the present invention, a light emitting device includes: a bracket having a mounting surface for mounting an LED chip; and an LED chip, including a transparent substrate and an epitaxial laminate, and mounted on the mounting surface of the bracket On; a layer of packaging material covering the surface of the LED chip to seal the LED chip on the bracket.
[0008] 进一步, 所述透明基板的上方设有第一反射层, 下方设有第二反射层, 所述 LE D芯片发射的光线射入所述封装材料层, 部分光线经反射或散射后入射至该透明 基板, 由第一、 第二反射层反射后射出该基板。 [0008] Further, a first reflective layer is provided above the transparent substrate, and a second reflective layer is provided below the transparent substrate. The light emitted by the LED chip enters the packaging material layer, and part of the light enters after being reflected or scattered. The transparent substrate is reflected by the first and second reflective layers and then exits the substrate.
[0009] 根据本发明的第五个方面, 一种发光装置, 包括: 支架, 具有用于安装 LED芯 片的安装表面; 两个以上的 LED芯片, 安装于所述支架的安装表面上; 封装材料 层, 覆盖于所述 LED芯片的表面, 将所述 LED芯片密封于所述支架上。 所述 LED 芯片的出光角小于或等于 120°, 其上表面为出光面, 该 LED芯片包含第一电极、 第二电极和反射层, 该第一、 第二电极朝上, 该反射层与该出光面的距离为 10 微米以下。 [0009] According to a fifth aspect of the present invention, a light emitting device includes: a bracket having a mounting surface for mounting LED chips; two or more LED chips mounted on the mounting surface of the bracket; packaging material The layer covers the surface of the LED chip and seals the LED chip on the support. The light-emitting angle of the LED chip is less than or equal to 120°, and the upper surface of the LED chip is the light-emitting surface. The LED chip includes a first electrode, a second electrode, and a reflective layer. The first and second electrodes face upward, and the reflective layer is connected to the reflective layer. The distance of the light emitting surface is less than 10 microns.
发明的有益效果 The beneficial effects of the invention
有益效果 Beneficial effect
[0010] 本发明的其它特征和优点将在随后的说明书中阐述, 并且, 部分地从说明书中 变得显而易见, 或者通过实施本发明而了解。 本发明的目的和其他优点可通过 在说明书、 权利要求书以及附图中所特别指出的结构来实现和获得。 [0010] Other features and advantages of the present invention will be described in the following description, and partly become obvious from the description, or understood by implementing the present invention. The purpose and other advantages of the present invention can be realized and obtained through the structures specifically pointed out in the specification, claims and drawings.
对附图的简要说明 Brief description of the drawings
附图说明 [0011] 附图用来提供对本发明的进一步理解, 并且构成说明书的一部分, 与本发明的 实施例一起用于解释本发明, 并不构成对本发明的限制。 此外, 附图数据是描 述概要, 不是按比例绘制。 Description of the drawings [0011] The accompanying drawings are used to provide a further understanding of the present invention, and constitute a part of the specification, and are used to explain the present invention together with the embodiments of the present invention, and do not constitute a limitation to the present invention. In addition, the data in the drawings is a description summary, not drawn to scale.
[0012] 图 1是一个示意图, 说明一个习知的发光二极管封装体的结构。 [0012] FIG. 1 is a schematic diagram illustrating the structure of a conventional light emitting diode package.
[0013] 图 2是一个示意图, 说明一个习知的发光二极管封装体的结构。 [0013] FIG. 2 is a schematic diagram illustrating the structure of a conventional light emitting diode package.
[0014] 图 3是一个示意图, 说明本发明一些实例的发光装置。 [0014] FIG. 3 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0015] 图 4是一个示意图, 说明一些实施例的发光装置的 LED芯片结构。 [0015] FIG. 4 is a schematic diagram illustrating the LED chip structure of the light-emitting device of some embodiments.
[0016] 图 5是一个示意图, 说明一些实施例的发光装置的 LED芯片结构。 [0016] FIG. 5 is a schematic diagram illustrating the LED chip structure of the light-emitting device of some embodiments.
[0017] 图 6是一个示意图, 说明一些实施例的发光装置的 LED芯片结构。 [0017] FIG. 6 is a schematic diagram illustrating the LED chip structure of the light-emitting device of some embodiments.
[0018] 图 7是一个示意图, 说明本发明一些实例的发光装置。 [0018] FIG. 7 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0019] 图 8是一个示意图, 说明图 7所示发光装置的部分光路径。 [0019] FIG. 8 is a schematic diagram illustrating part of the light path of the light emitting device shown in FIG. 7.
[0020] 图 9是一个示意图, 说明本发明一些实例的发光装置。 [0020] FIG. 9 is a schematic diagram illustrating light emitting devices of some examples of the present invention.
[0021] 图 10是一个示意图, 说明一些实施的例发光装置的 LED芯片结构。 [0021] FIG. 10 is a schematic diagram illustrating the LED chip structure of the light emitting device according to some embodiments.
[0022] 图 11是一个示意图, 说明本发明一些实例的发光装置。 [0022] FIG. 11 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0023] 图 12是一个示意图, 说明一些实施的例发光装置的 LED芯片结构。 [0023] FIG. 12 is a schematic diagram illustrating the LED chip structure of the light emitting device according to some embodiments.
[0024] 图 13是一个示意图, 说明一些实施的例发光装置的 LED芯片结构。 [0024] FIG. 13 is a schematic diagram illustrating the LED chip structure of the light emitting device according to some embodiments.
[0025] 图 14是一个示意图, 说明本发明一些实例的发光装置。 [0025] FIG. 14 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0026] 图 15是一个示意图, 说明本发明一些实例的发光装置。 [0026] FIG. 15 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0027] 图 16是一个示意图, 说明一些实施的例发光装置的 LED芯片结构。 [0027] FIG. 16 is a schematic diagram illustrating the LED chip structure of the light emitting device according to some embodiments.
[0028] 图 17是一个示意图, 说明本发明一些实例的发光装置。 [0028] FIG. 17 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0029] 图 18是一个示意图, 说明本发明一些实例的发光装置。 [0029] FIG. 18 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0030] 图 19是一个示意图, 说明本发明一些实例的发光装置。 [0030] FIG. 19 is a schematic diagram illustrating light emitting devices of some examples of the present invention.
[0031] 图 20是一个示意图, 说明本发明一些实例的发光装置。 [0031] FIG. 20 is a schematic diagram illustrating light emitting devices of some examples of the present invention.
[0032] 图 21是一个示意图, 说明本发明一些实例的发光装置。 [0032] FIG. 21 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0033] 图 22是一个示意图, 说明本发明一些实例的发光装置。 [0033] FIG. 22 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0034] 图 23是一个示意图, 说明本发明一些实例的发光装置。 [0034] FIG. 23 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
[0035] 图 24和 25分别是平面示意图和局部侧面剖视图, 说明本发明一些实例的发光装 置 [0036] 图 26是一个示意图, 说明本发明一些实例的发光装置。 [0035] FIGS. 24 and 25 are a schematic plan view and a partial side sectional view, respectively, illustrating light-emitting devices of some examples of the present invention [0036] FIG. 26 is a schematic diagram illustrating light-emitting devices of some examples of the present invention.
发明实施例 Invention embodiment
本发明的实施方式 Embodiments of the invention
[0037] 下面结合示意图对本发明的发光二极管芯片及其制作方法进行详细的描述, 在 进一步介绍本发明之前, 应当理解, 由于可以对特定的实施例进行改造, 因此 , 本发明并不限于下述的特定实施例。 还应当理解, 由于本发明的范围只由所 附权利要求限定, 因此所采用的实施例只是介绍性的, 而不是限制性的。 除非 另有说明, 否则这里所用的所有技术和科学用语与本领域的普通技术人员所普 遍理解的意义相同。 [0037] The light-emitting diode chip of the present invention and the manufacturing method thereof will be described in detail below with reference to the schematic diagram. Before further introducing the present invention, it should be understood that since specific embodiments can be modified, the present invention is not limited to the following The specific embodiment. It should also be understood that since the scope of the present invention is only limited by the appended claims, the embodiments adopted are only introductory rather than restrictive. Unless otherwise specified, all technical and scientific terms used herein have the same meaning as commonly understood by those of ordinary skill in the art.
[0038] 在以下的说明内容中, 类似或相同的组件将以相同的编号来表示。 [0038] In the following description, similar or identical components will be represented by the same numbers.
[0039] 图 1显示了一种习知的 LED发光装置, 包括封装支架 110、 LED芯片 120和封装 材料层 130, 其中支架 110包含底部 111和侧壁 112, 其中底部上表面设置芯片安 装区 1101、 第一焊线区 1102和第二焊线区 1103, 其中第一焊线区 1102和第二焊 线区 1103彼此电性隔离, LED芯片 120采用水平结构, 安装于该芯片安装区 1101 上, p、 n电极位于出光面上, 通过引线 141、 142分别连接至支架 110的第一焊线 区 1102和第二焊线区 1103, 封装层 130将该芯片 120密封于该支架 110上。 进一步 的, 封装支架 110可以包括底部 111和侧壁 112, 两者形成一个空间用于容纳该 LE D芯片 120。 在该发光装置中, LED芯片 120的电极位于出光面上, 具有遮光和 / 或吸光的效应。 另一方面, 电极位于外延叠层上, 打线过线过程有可能会对外 延叠层造成破坏。 [0039] FIG. 1 shows a conventional LED light-emitting device, including a packaging support 110, an LED chip 120 and a packaging material layer 130, wherein the support 110 includes a bottom 111 and side walls 112, wherein the upper surface of the bottom is provided with a chip mounting area 1101 The first wire bonding area 1102 and the second wire bonding area 1103, wherein the first wire bonding area 1102 and the second wire bonding area 1103 are electrically isolated from each other, and the LED chip 120 adopts a horizontal structure and is mounted on the chip mounting area 1101, The p and n electrodes are located on the light-emitting surface, and are respectively connected to the first wire bonding area 1102 and the second wire bonding area 1103 of the bracket 110 through the leads 141 and 142, and the encapsulation layer 130 seals the chip 120 on the bracket 110. Further, the package support 110 may include a bottom 111 and a side wall 112, and the two form a space for accommodating the LED chip 120. In the light-emitting device, the electrodes of the LED chip 120 are located on the light-emitting surface, and have light-shielding and/or light-absorbing effects. On the other hand, the electrode is located on the epitaxial laminate, and the wire bonding process may cause damage to the epitaxial laminate.
[0040] 图 2显示了另一种习知的 LED发光装置。 该发光装置采用的 LED芯片 120为倒装 结构, 其电极朝向支架的底面 111。 该发光装置可以解决图 1所示的发光装置中 出光面上电极遮光、 吸光的问题。 然而, 倒装芯片安装于支架时需要特殊的设 备, 且需进行对位。 [0040] FIG. 2 shows another conventional LED lighting device. The LED chip 120 used in the light-emitting device has a flip-chip structure, and its electrodes face the bottom surface 111 of the support. The light-emitting device can solve the problem of light-shielding and absorption of light on the light-emitting surface of the light-emitting device shown in FIG. 1. However, when the flip chip is mounted on the bracket, special equipment and alignment are required.
[0041] 图 3显示了根据本发明实施的一种发光装置。 该发光装置包括: 支架 210、 LED 芯片 220、 封装材料层 230。 具体的, 支架 210包含底部 211和壁部 212, 形成碗杯 结构, 其中底部 211的上表面设置有芯片安装区域 2101、 第一焊线区 2102和第二 焊线区 2103, 其中第一焊线区 2102和第二焊线区 2103彼此电性隔离。 LED芯片 22 0安装于支架的安装区 2101上, 且出光面朝上, 其 p、 n电极通过引线 241、 242分 别连接至支架 210的第一焊线区 2102和第二焊线区 2103。 封装材料层将 LED芯片 封装于该支架上。 [0041] FIG. 3 shows a light emitting device implemented in accordance with the present invention. The light emitting device includes: a bracket 210, an LED chip 220, and a packaging material layer 230. Specifically, the bracket 210 includes a bottom portion 211 and a wall portion 212 to form a cup structure. The upper surface of the bottom portion 211 is provided with a chip mounting area 2101, a first wire bonding area 2102, and a second wire bonding area 2103. The area 2102 and the second wire bonding area 2103 are electrically isolated from each other. LED chip 22 0 is installed on the mounting area 2101 of the bracket with the light emitting surface facing upward, and its p and n electrodes are respectively connected to the first wire bonding area 2102 and the second wire bonding area 2103 of the bracket 210 through the leads 241 and 242. The packaging material layer encapsulates the LED chip on the support.
[0042] 图 4显示了用于图 3所示发光装置的一种 LED芯片 220的结构, 该 LED芯片从上 到下依次包含: 外延叠层 2210、 第一电极 2221、 第二电极 2222、 电连接层 2240 和基板 2230。 该 LED芯片的外延叠层由基板 2230支撑, 外延叠层 2210的上表面 S 11作为出光面, 没有生长衬底。 在此, “没有生长衬底”表示必要时为了生长而使 用的生长衬底被从外延叠层去除或者至少被大大薄化。 [0042] FIG. 4 shows the structure of an LED chip 220 used in the light-emitting device shown in FIG. 3, the LED chip sequentially comprising from top to bottom: an epitaxial laminate 2210, a first electrode 2221, a second electrode 2222, electricity The layer 2240 and the substrate 2230 are connected. The epitaxial stack of the LED chip is supported by the substrate 2230, and the upper surface S11 of the epitaxial stack 2210 serves as the light-emitting surface without a growth substrate. Here, "no growth substrate" means that the growth substrate used for growth is removed from the epitaxial stack or at least greatly thinned if necessary.
[0043] 具体的, 外延叠层 2210具有相对的上表面 S11和下表面 S12, 其中上表面 S11作 为出光面, 包含第一半导体层 2211、 有源层 2212和第二半导体层 2212, 该第一 半导体层 2211和第二半导体层 2213可分别为 p型半导体层和 n型半导体层。 例如 , 该第一半导体层和第二半导体层可由通过化学式 Al xIn yGa (1-x-y)N (其中, 0<x<l , 0<y<l , (Kx+y^l)表达的氮化物半导体形成, 但是不限于此, 也可以使用基于 GaAs的半导体或者基于 GaP的 AlGalnP半导体材料。 有源层 2212可具有基于氮化 物的多量子阱结构 (MQW) , 诸如 InGaN/GaN、 GaN/AlGaN等, 但是不限于此 , 也可以使用其它半导体, 诸如 Galas/AlGaAs、 InGaP/GaP, GaP/AlGaP等。 [0043] Specifically, the epitaxial stack 2210 has an upper surface S11 and a lower surface S12 opposite to each other, wherein the upper surface S11 serves as a light-emitting surface and includes a first semiconductor layer 2211, an active layer 2212, and a second semiconductor layer 2212. The semiconductor layer 2211 and the second semiconductor layer 2213 may be a p-type semiconductor layer and an n-type semiconductor layer, respectively. For example, the first semiconductor layer and the second semiconductor layer can be expressed by the chemical formula Al x In y Ga (1-xy) N (where 0<x<l, 0<y<l, (Kx+y^l) Nitride semiconductor is formed, but is not limited to this, GaAs-based semiconductor or GaP-based AlGalnP semiconductor material may also be used. The active layer 2212 may have a nitride-based multiple quantum well structure (MQW), such as InGaN/GaN, GaN/ AlGaN, but not limited to this, other semiconductors, such as Galas/AlGaAs, InGaP/GaP, GaP/AlGaP, etc. can also be used.
[0044] 电连接层 2240形成在外延叠层的下表面 S12之上, 包括第一电连接层 2241和第 二电连接层 2242, 第一电连接层 2241两端分别连接第一半导体层 2211和第一电 极 2221, 第二电连接层 2241的两端分别连接第二半导体层 2213和第二电极 2222 。 第一电连接层 2241和第二电连接层 2242的材料可以相同也可以不同。 其中第 一电连接层 2241的材料可以为 Ag、 Au、 Ti、 Al、 Cr、 Pt、 TiW、 Ni或以上的任 意组合, 其中 Ag、 A1适合作为金属反射材料, TiW适合作为金属包覆材料, 防 止金属扩散, Cr、 Ni、 Au适合作为欧姆接触材料。 为了降低第一电连接层 2241 与第一半导体层 2211之间的电阻, 也会在第一电连接层 2241和第一半导体层 221 1之间增加透明电流扩展层。 第二电连接层包括与第二半导体层 2213具有良好电 连接性能的欧姆接触层, 比如 Cr、 Ni、 Au、 A1等。 第二电连接层的材料可以为 A g、 Au、 Ti、 Al、 Cr、 Pt、 TiW、 Ni或以上的任意组合, 其中 Ag、 A1适合作为金 属反射材料, TiW适合作为金属包覆材料, 防止金属扩散, Cr、 Ni、 Au适合作 为欧姆接触材料。 [0044] The electrical connection layer 2240 is formed on the lower surface S12 of the epitaxial stack, and includes a first electrical connection layer 2241 and a second electrical connection layer 2242. Both ends of the first electrical connection layer 2241 are respectively connected to the first semiconductor layer 2211 and Both ends of the first electrode 2221 and the second electrical connection layer 2241 are respectively connected to the second semiconductor layer 2213 and the second electrode 2222. The materials of the first electrical connection layer 2241 and the second electrical connection layer 2242 may be the same or different. The material of the first electrical connection layer 2241 can be Ag, Au, Ti, Al, Cr, Pt, TiW, Ni or any combination of the above, wherein Ag and Al are suitable as metal reflective materials, and TiW is suitable as metal coating materials, To prevent metal diffusion, Cr, Ni, and Au are suitable as ohmic contact materials. In order to reduce the resistance between the first electrical connection layer 2241 and the first semiconductor layer 2211, a transparent current spreading layer is also added between the first electrical connection layer 2241 and the first semiconductor layer 2211. The second electrical connection layer includes an ohmic contact layer having good electrical connection performance with the second semiconductor layer 2213, such as Cr, Ni, Au, Al, and the like. The material of the second electrical connection layer can be Ag, Au, Ti, Al, Cr, Pt, TiW, Ni, or any combination of the above, wherein Ag, Al are suitable as metal reflective materials, and TiW is suitable as a metal coating material to prevent Metal diffusion, Cr, Ni, Au are suitable for It is an ohmic contact material.
[0045] 第一电极 2221、 第二电极 2222位于外延叠层 2210的外侧, 即第一电极 2221、 第 二电极 2222在基板 2230表面上的投影位于外延叠层 2210的区域外。 该第一电极 和第二电极通过电连接层 2240从外延叠层 2210的下表面 S12引出, 朝向外延叠层 的上表面 S11, 从而适于从正侧电接触发光二极管芯片的本体。 优选的, 第一电 极和第二电极的上表面位于同一高度。 [0045] The first electrode 2221 and the second electrode 2222 are located outside the epitaxial laminate 2210, that is, the projection of the first electrode 2221 and the second electrode 2222 on the surface of the substrate 2230 is outside the area of the epitaxial laminate 2210. The first electrode and the second electrode are led out from the lower surface S12 of the epitaxial laminate 2210 through the electrical connection layer 2240 and face the upper surface S11 of the epitaxial laminate, so as to be suitable for electrically contacting the body of the light emitting diode chip from the positive side. Preferably, the upper surfaces of the first electrode and the second electrode are located at the same height.
[0046] 基板 2230用于支撑外延叠层 2210, 其厚度优选为 50 以上、 200 1以下。 在一 些实施例, 该基板 2230的厚度可以为 50~100[xm, 例如 90[xm; 在一些实施例, 该 基板 2230的厚度也可以为 100~150 1, 例如 120 1, 或者 130 1; 在一些实施例 中, 该基板 2230的厚度还可以为 150~20(Vm, 例如 18(Vm。 基板 2230优选采用绝 缘材料, 可以为透明材料, 例如蓝宝石衬底、 陶瓷基板等, 还可以选用高反射 材料。 [0046] The substrate 2230 is used to support the epitaxial stack 2210, and its thickness is preferably 50 or more and 200 or less. In some embodiments, the thickness of the substrate 2230 may be 50-100 [xm, for example, 90 [xm; in some embodiments, the thickness of the substrate 2230 may also be 100 to 150 1, such as 120 1, or 130 1; In some embodiments, the thickness of the substrate 2230 may also be 150-20Vm, for example, 18Vm. The substrate 2230 preferably uses an insulating material, which may be a transparent material, such as a sapphire substrate, a ceramic substrate, etc., and may also be highly reflective. Material.
[0047] 在上述发光装置中, 第一电极和第二电极位于外延叠层的侧部, 既避免第一电 极和 /或第二电极设置在外延叠层的上方而造成对辐射的遮挡, 降低辐射效率, 又方便制作打线。 [0047] In the above-mentioned light-emitting device, the first electrode and the second electrode are located on the side of the epitaxial stack, which can prevent the first electrode and/or the second electrode from being arranged above the epitaxial stack to shield radiation and reduce Radiation efficiency, and convenient to make wire bonding.
[0048] 在一些实施例中, 基板 2230可以采用具有良好的散热性材料, 例如 Si基板、 Cu 基板或者陶瓷基板, 此时电连接层 2240分别与散热基板 2230和第二半导体层 221 3连接, 构成良好的导热通道, 将热量从第二类型半导体层引向散热基板。 由于 多量子阱的激发辐射经由第二半导体层射出, 热量容易在第二半导体层 2213堆 积, 电连接层 2242将热量很好地从第二半导体层引出至散热基板。 [0048] In some embodiments, the substrate 2230 may be made of a material with good heat dissipation properties, such as a Si substrate, a Cu substrate or a ceramic substrate. At this time, the electrical connection layer 2240 is connected to the heat dissipation substrate 2230 and the second semiconductor layer 2213, respectively. A good heat conduction channel is formed to guide heat from the second type semiconductor layer to the heat dissipation substrate. Since the excitation radiation of the multiple quantum well is emitted through the second semiconductor layer, heat is easily accumulated on the second semiconductor layer 2213, and the electrical connection layer 2242 can well draw the heat from the second semiconductor layer to the heat dissipation substrate.
[0049] 图 5显示了用于图 3所示发光装置的一种 LED芯片 220的结构。 在该 LED芯片中 , 电连接层 2240在竖直方向上多层设置, 并通过绝缘层 2260进行电性隔离。 具 体的, 基板 2230与外延叠层 2210之间从下到上依次设有第三电连接层 2244、 绝 缘层 2260、 第一导电导 2241和第二电连接层 2242, 该第三电连接层 2244具有朝 向外延叠层的第一延伸部 2243和第二延伸部 2245, 第一延伸部 2243贯穿了第一 半导体层 2221、 有源层 2222, 通过开口 2271与第二半导体层 2213形成电性连接 , 第二延伸部 2245通过开口 2272与第二电连接层 2242形成电性连接。 优选的, 第一电连接层 2241和第二电连接层 2242具有相同的厚度、 材料, 采用图形化在 同一步骤中形成, 如此可以具有相有的高度, 方便后续制作具有相同高度的第 一电极和第二电极。 [0049] FIG. 5 shows the structure of an LED chip 220 used in the light emitting device shown in FIG. 3. In the LED chip, the electrical connection layer 2240 is arranged in multiple layers in the vertical direction, and is electrically isolated by the insulating layer 2260. Specifically, a third electrical connection layer 2244, an insulating layer 2260, a first conductive conductor 2241, and a second electrical connection layer 2242 are sequentially arranged from bottom to top between the substrate 2230 and the epitaxial stack 2210. The third electrical connection layer 2244 It has a first extension portion 2243 and a second extension portion 2245 facing the epitaxial stack. The first extension portion 2243 penetrates the first semiconductor layer 2221 and the active layer 2222, and is electrically connected to the second semiconductor layer 2213 through the opening 2271, The second extension portion 2245 is electrically connected to the second electrical connection layer 2242 through the opening 2272. Preferably, the first electrical connection layer 2241 and the second electrical connection layer 2242 have the same thickness and material, and are patterned in It is formed in the same step, so it can have the same height, which facilitates subsequent production of the first electrode and the second electrode with the same height.
[0050] 在一个具体的实施例中, 第一电连接层 2241与第一电极 2221接触的部分、 第二 电连接层 2242与第二电极 2222接触的部分为性能较为稳定的 Ti、 Pt、 Au、 Cr、 Ti W合金等材料, 位于发光区域下方的第一电连接层 2241包含依次对发光区域出光 进行反射的高反射性金属材料 (例如 Ag、 A1等) 、 用于防止前述材料扩散的稳 定金属材料 (例如 Ti、 Pt、 Au、 Cr或 TiW等) 。 第三电连接层 2244包含了朝向出 光面延伸并与第二半导体层 2213连接的延伸部 2243, 其材料优选包括 Al、 Cr或 者 Ag等反射材料。 进一步的, 该第三电连接层 2244与基板 2230接触的一侧可以 包含结合层, 用于结合基板。 更佳的, 该结合层为金属材料, 可以同时作为散 热层, 从而快速将堆积在第二半导体层的热量引出至基板 2230。 另一方面, 基 板 2230与外延叠层的整面接触, 保证了物理结构的完整性。 [0050] In a specific embodiment, the portion where the first electrical connection layer 2241 contacts the first electrode 2221, and the portion where the second electrical connection layer 2242 contacts the second electrode 2222 are Ti, Pt, and Au with relatively stable performance. , Cr, Ti W alloy and other materials. The first electrical connection layer 2241 located under the light-emitting area includes a highly reflective metal material (such as Ag, Al, etc.) that sequentially reflects the light emitted from the light-emitting area, and is used to prevent the diffusion of the aforementioned materials. Metal materials (such as Ti, Pt, Au, Cr or TiW, etc.). The third electrical connection layer 2244 includes an extension portion 2243 extending toward the light-emitting surface and connected to the second semiconductor layer 2213, and its material preferably includes reflective materials such as Al, Cr, or Ag. Further, the side of the third electrical connection layer 2244 in contact with the substrate 2230 may include a bonding layer for bonding the substrate. More preferably, the bonding layer is made of a metal material, which can be used as a heat dissipation layer at the same time, so that the heat accumulated on the second semiconductor layer is quickly drawn to the substrate 2230. On the other hand, the substrate 2230 is in contact with the entire surface of the epitaxial laminate, ensuring the integrity of the physical structure.
[0051] 在一些实施例中, 该 LED芯片 220的外延叠层 2210去除生长衬底, 为薄膜结构 [0051] In some embodiments, the epitaxial stack 2210 of the LED chip 220 removes the growth substrate to form a thin film structure
, 同时第一电连接层 2241可以包括反射层 Ml, 因此反射层 Ml到 LED芯片的出光 面 S11的距离 D1为 l(Vm以内, 例如可以为 4~8pm, 到发光层的距离 D3为: Ipm以 下, 如此缩短了光在 LED芯片内部的路径, 同时增加了有源层 2212发射的光线从 出光面 S11射出的比率, 其发光角优选为 150°以下, 更佳的发光角为小于或者等 于 120°, 例如 120~110°, 在一个具体的实施例中, 该 LED芯片的发光角可以为 11 3°, 或者 115°, 或者 118°。 At the same time, the first electrical connection layer 2241 may include a reflective layer M1, so the distance D1 from the reflective layer M1 to the light-emitting surface S11 of the LED chip is 1 (within Vm, for example, 4-8 pm, and the distance D3 to the light-emitting layer is: 1 pm Hereinafter, the path of light inside the LED chip is shortened, and the ratio of light emitted from the active layer 2212 from the light-emitting surface S11 is increased. The light-emitting angle is preferably 150° or less, and more preferably, the light-emitting angle is less than or equal to 120. °, such as 120-110°, in a specific embodiment, the light-emitting angle of the LED chip may be 113°, or 115°, or 118°.
[0052] 进一步的, 第三电连接层 2244可以包含反射层 M2, 该反射层 M2位于基板 2230 上, 其到出光面 S11的距离优选为 2(Vm以下, 远小于 LED芯片厚度 T的一半, 更 佳的, 为 7~12[xm, 例如可以为 8[xm, 或者 9[xm, 或者 [xm。 [0052] Further, the third electrical connection layer 2244 may include a reflective layer M2, the reflective layer M2 is located on the substrate 2230, and the distance from the light emitting surface S11 is preferably 2 (Vm or less, much less than half of the thickness T of the LED chip, More preferably, it is 7~12 [ xm, for example, it can be 8 [ xm, or 9 [ xm, or [ xm.
[0053] 图 6显示了用于图 3所示发光装置的一种 LED芯片 220的结构。 与图 5所示 LED芯 片不同的是, 该第三电连接层 2244包含了多个朝向出光面延伸的延伸部 2243, 该多个延伸部 2243贯彻第一半导体层 2211、 有源层 2212, 与第二半导体层 2213 连接。 该多个延伸部 2243优选均匀分布, 如此具有更佳的电流扩展性和散热特 性, 适用于大电流密度下的应用。 [0053] FIG. 6 shows the structure of an LED chip 220 used in the light emitting device shown in FIG. The difference between the LED chip shown in FIG. 5 is that the third electrical connection layer 2244 includes a plurality of extensions 2243 extending toward the light exit surface, and the plurality of extensions 2243 penetrate the first semiconductor layer 2211, the active layer 2212, and The second semiconductor layer 2213 is connected. The plurality of extensions 2243 are preferably evenly distributed, so that they have better current expandability and heat dissipation characteristics, and are suitable for applications under high current density.
[0054] 优选的, 第三电连接层 2244与第二半导体层 2213的总接触面积大于第二半导体 层 2213面积的 1.5%。 可以根据需求设计第三电连接层 2243与第二半导体层 2213 的接触面积, 例如可以选择 2.3%~2.8%、 2.8%~4%、 或者 4%~6%。 在一些实施例 中, 增加第三电连接层 2244和第二半导体层 2213的直接接触面积, 可以解决高 功率产品的散热问题, 例如大尺寸芯片或者高压芯片等。 [0054] Preferably, the total contact area between the third electrical connection layer 2244 and the second semiconductor layer 2213 is larger than that of the second semiconductor layer. 1.5% of the area of layer 2213. The contact area between the third electrical connection layer 2243 and the second semiconductor layer 2213 can be designed according to requirements, for example, 2.3%~2.8%, 2.8%~4%, or 4%~6% can be selected. In some embodiments, increasing the direct contact area between the third electrical connection layer 2244 and the second semiconductor layer 2213 can solve the heat dissipation problem of high-power products, such as large-size chips or high-voltage chips.
[0055] 在一些实施例中, 该延伸部 2243的直径为 15pm以上。 尽管保证第三电连接层 2 244与第二半导体层 2213的总接触面积, 可以提高散热特性, 但如果延伸部 2243 直径较小的情况下, 较细的延伸部 2243具有超过线性比例的热阻, 因此在一些 实施例中, 延伸部 2243的直径设计为 32pm~4(Vm, 其散热效果更佳。 作为一种 较佳实施方式, 当延伸部 2243的直径为 34pm~36^im时, 延伸部 2243的数量设置 为 20~25个。 [0055] In some embodiments, the diameter of the extension 2243 is 15 pm or more. Although ensuring the total contact area of the third electrical connection layer 2244 and the second semiconductor layer 2213 can improve the heat dissipation characteristics, if the diameter of the extension portion 2243 is small, the thinner extension portion 2243 has a thermal resistance exceeding a linear ratio. Therefore, in some embodiments, the diameter of the extension part 2243 is designed to be 32 μm~4 μm, which has better heat dissipation effect. As a preferred embodiment, when the diameter of the extension part 2243 is 34 μm~36 μm, the extension The number of parts 2243 is set to 20-25.
[0056] 在一些实施例中, 第一电连接层 2241和第二电连接层 2242采用具有相同的结构 层, 包含金属反射层 Ml, 第三电连接层 2244之靠近外延叠层的一侧可以包含金 属反射层 M2, 外延叠层 2210的下表面 S12基本被金属反射层 Ml、 M2覆盖, 有源 层 2212发出的向下的光直接被反射, 不会再经过基板导致部分光被吸收。 例如 , 第一电连接层 2241和第二电连接层 2242可以包含 Ag金属层作为第一反射层 Ml , 第三电连接层 2244包含了 A1金属层, 该 A1金属层一方面可以与第二半导体层 2 213形成欧姆接触, 另一方面作为第二反射层 M2, 尽可能的覆盖外延叠层的下表 面 S 12之未被第一电连接层 2241和第二电连接层 2242覆盖的区域。 [0056] In some embodiments, the first electrical connection layer 2241 and the second electrical connection layer 2242 adopt the same structural layer, including the metal reflective layer M1, and the side of the third electrical connection layer 2244 close to the epitaxial stack can be Including the metal reflective layer M2, the lower surface S12 of the epitaxial stack 2210 is basically covered by the metal reflective layers M1, M2, and the downward light emitted by the active layer 2212 is directly reflected and will not pass through the substrate to cause part of the light to be absorbed. For example, the first electrical connection layer 2241 and the second electrical connection layer 2242 may include an Ag metal layer as the first reflective layer M1, and the third electrical connection layer 2244 may include an Al metal layer. The layer 2 213 forms an ohmic contact. On the other hand, as the second reflective layer M2, it covers as much as possible the area of the lower surface S 12 of the epitaxial stack that is not covered by the first electrical connection layer 2241 and the second electrical connection layer 2242.
[0057] 优选的, 该 LED芯片 220去除了生长衬底, 在出光面 S11可以设置粗糙面 2210a [0057] Preferably, the growth substrate of the LED chip 220 is removed, and a rough surface 2210a may be provided on the light emitting surface S11.
[0058] 图 7简单示意了根据本发明实施的一种发光装置。 该发光装置至少设有两个反 射层: M2和 M3, 包括: 支架 210、 LED芯片 220、 封装材料层 230。 其中, 支架 2 10包含底部 211和壁部 212, 两者形成碗杯结构, 其芯片安装区域 2101的表面可 以镀有反射层 M3, LED芯片 220通过结合层 250安装于该碗杯内, 封装材料层 230 填充该碗杯对 LED芯片 220进行密封。 [0058] FIG. 7 simply illustrates a light emitting device implemented according to the present invention. The light-emitting device is provided with at least two reflective layers: M2 and M3, including: a bracket 210, an LED chip 220, and a packaging material layer 230. Wherein, the bracket 210 includes a bottom portion 211 and a wall portion 212, which form a cup structure, the surface of the chip mounting area 2101 may be plated with a reflective layer M3, the LED chip 220 is mounted in the cup through the bonding layer 250, and the packaging material The layer 230 fills the bowl to seal the LED chip 220.
[0059] 具体的, 设置支架 210表面上的反射层 M3可以为金属反射层 (如 Ag、 A1等高反 射率的材料) , 或者绝缘反射层 (例如 DBR) , 或者反光胶材 (例如白胶) , 其厚度优选为 5pm以下。 结合层 250为透明材料, 透光率优选为 70%以上, 更佳 为 80%以上。 LED芯片 220具有透明基板 2230, 该基板 2230的上表面一侧设有反 射层 M2。 该透明基板 2230对于可见光透光率 80%以上, 较佳为 90%以上, 其材 料可以为蓝宝石、 透明陶瓷、 玻璃等。 [0059] Specifically, the reflective layer M3 provided on the surface of the support 210 may be a metal reflective layer (such as Ag, Al and other high-reflectivity materials), or an insulating reflective layer (such as DBR), or a reflective adhesive material (such as white glue). ), the thickness is preferably 5 pm or less. The bonding layer 250 is a transparent material, and the light transmittance is preferably 70% or more, more preferably It is more than 80%. The LED chip 220 has a transparent substrate 2230, and the upper surface of the substrate 2230 is provided with a reflective layer M2. The transparent substrate 2230 has a visible light transmittance of more than 80%, preferably more than 90%, and its material can be sapphire, transparent ceramics, glass, and the like.
[0060] 在一些实施例中, 该 LED芯片可以参考图 4所示的结构, 此时 LED芯片的基板 采用透明基板, 第一电连接层 2241可以作为反射层 M2。 该第一电连接层 2241可 以由多层堆叠而成, 包含高反射的材料层, 例如可以为铝等高反射金属材料, 该高反射层的材料层的厚度优选为 50纳米以下。 [0060] In some embodiments, the LED chip may refer to the structure shown in FIG. 4. At this time, the substrate of the LED chip is a transparent substrate, and the first electrical connection layer 2241 may serve as the reflective layer M2. The first electrical connection layer 2241 may be formed by stacking multiple layers, including a highly reflective material layer, for example, a highly reflective metal material such as aluminum. The thickness of the material layer of the highly reflective layer is preferably 50 nm or less.
[0061] 该 LED芯片 220也采用图 5或者图 6所示的结构, 其中基板 2230选用透明材料, 其上表面的第三电连接层 2243可以作为反光层 M2。 在一些实施例中, 该第三电 连接层 2243为金属材料, 反射率为 70%以上, 此时可以直接作为反射层。 在一些 实施例中, 该第三电连接层 2243由多层堆叠而成, 其中与基板 2230接触的一侧 包含较高反射的材料层, 例如可以为铝等高反射金属材料, 该高反射层的材料 层的厚度优选为 50纳米以下。 [0061] The LED chip 220 also adopts the structure shown in FIG. 5 or FIG. 6, wherein the substrate 2230 is made of a transparent material, and the third electrical connection layer 2243 on the upper surface thereof can be used as the light-reflecting layer M2. In some embodiments, the third electrical connection layer 2243 is made of a metal material and has a reflectivity of more than 70%. In this case, it can be directly used as a reflective layer. In some embodiments, the third electrical connection layer 2243 is formed by stacking multiple layers, wherein the side in contact with the substrate 2230 includes a material layer with higher reflection, for example, a highly reflective metal material such as aluminum. The thickness of the material layer is preferably 50 nm or less.
[0062] 图 4至 6所示的 LED芯片 220的基板尺寸一般大于外延叠层 2210的尺寸 (其横截 面的面积大于外延叠层 2210的横截面的面积) , 且厚度远大于其他结构层的厚 度, 以 GaN基 LED芯片为例, 外延叠层 2210的厚度一般不超过 10—, 例如可以 为 4~8pm, 位于外延叠层 2210与基板 2230之间的电连接层、 绝缘层、 结合层等的 总厚度一般不超过 5pm, 例如可以为 3~5pm, 而基板 2230的通常为 50pm以上, 例如 50[xm, 或者 100[xm, 或者 120[xm, 或者 150[xm, 或者 180[xm, 因此有源层发 出的光线经由支架侧壁的反射或者封装材料层的散射、 反射, 容易入射到基板 2 230的内部, 可能被基板 2230上方的金属或者支架上的金属吸收。 图 7所示发光 装置中, LED芯片 220发出的光线由于碗杯的反射造成的部分光入射到透明基板 2 230内, 透明基板 210的上方和下方均有反射层, 因此光会从另一端射出, 减少 被结合层金属或者支架 210的金属吸收, 如图 8所示。 [0062] The size of the substrate of the LED chip 220 shown in FIGS. 4 to 6 is generally larger than that of the epitaxial stack 2210 (the area of its cross-section is greater than that of the epitaxial stack 2210), and the thickness is much larger than that of other structural layers. Thickness, taking a GaN-based LED chip as an example, the thickness of the epitaxial laminate 2210 is generally not more than 10—, for example, it can be 4~8 pm. The electrical connection layer, insulating layer, bonding layer, etc. between the epitaxial laminate 2210 and the substrate 2230 The total thickness of the substrate is generally not more than 5pm, for example, 3~5pm, and the substrate 2230 is usually above 50pm, such as 50 [ xm, or 100 [ xm, or 120 [ xm, or 150 [ xm, or 180 [ xm], so The light emitted by the active layer is easily incident on the inside of the substrate 2230 through the reflection of the sidewall of the support or the scattering and reflection of the packaging material layer, and may be absorbed by the metal above the substrate 2230 or the metal on the support. In the light-emitting device shown in FIG. 7, part of the light emitted by the LED chip 220 due to the reflection of the bowl is incident into the transparent substrate 2 230, and the transparent substrate 210 has reflective layers above and below, so the light will be emitted from the other end , Reduce the metal absorption by the bonding layer metal or the metal of the bracket 210, as shown in FIG. 8.
[0063] 在一些实施例中, 封装该 LED芯片 220的封装材料层 230中含有颗粒 231, LED 芯片 220发出的部分光线会被反射或者散射, 射至透明基板侧面, 由于透明基板 210的上、 下方均有反射层, 因此光会从另一端射出而不会被结合层金属或者支 架的金属吸收。 [0064] 在一些实施例中, LED芯片的周围和上方覆盖有荧光粉, LED芯片 220发出的 部分光线会被反射或者散射照到透明基板侧面, 由于透明基板 210的上、 下方均 有反射层, 因此光会从另一端射出而不会被结合层金属或者支架的金属吸收。 优选地, 为了发光装置的光色的均匀性, 荧光粉覆盖至反射层 M2所在的平面的 下方, 此时透明基板 2230配合上、 下反射层, 可以明显减少 LED芯片 220发出的 光线经反射或散射而射入基板内部被吸收。 [0063] In some embodiments, the packaging material layer 230 encapsulating the LED chip 220 contains particles 231, and part of the light emitted by the LED chip 220 will be reflected or scattered to the side of the transparent substrate. There is a reflective layer underneath, so light will be emitted from the other end without being absorbed by the bonding layer metal or the metal of the bracket. [0064] In some embodiments, the LED chip is covered with phosphor powder around and above, and part of the light emitted by the LED chip 220 will be reflected or scattered to the side of the transparent substrate, because there are reflective layers on and under the transparent substrate 210 , So the light will be emitted from the other end without being absorbed by the bonding layer metal or the metal of the bracket. Preferably, for the uniformity of the light color of the light-emitting device, the phosphor is covered below the plane where the reflective layer M2 is located. At this time, the transparent substrate 2230 cooperates with the upper and lower reflective layers, which can significantly reduce the reflection or reflection of the light emitted by the LED chip 220. Scattered into the substrate and absorbed.
[0065] 图 9简单示意了根据本发明实施的一种发光装置。 该发光装置同样具有至少两 个反射层 M2和 M3, 采用的 LED芯片 220具有透明基板 2230。 与图 7所示发光装置 不同的是, 透明基板 2230下方的反射层 M3直接形成在基板 2230的背面, 其材料 可以为金属反射层 (如 Ag、 A1等高反射率的材料) , 或者绝缘反射层 (例如 DB [0065] FIG. 9 simply illustrates a light emitting device implemented according to the present invention. The light emitting device also has at least two reflective layers M2 and M3, and the adopted LED chip 220 has a transparent substrate 2230. The difference from the light-emitting device shown in FIG. 7 is that the reflective layer M3 under the transparent substrate 2230 is directly formed on the back of the substrate 2230, and its material can be a metal reflective layer (such as Ag, Al, and other high-reflectivity materials), or an insulating reflective layer. Tier (e.g. DB
R) 。 R).
[0066] 图 10显示了用于图 9所示发光装置的一种 LED芯片 220的结构, 该结构与图 5所 示的 LED芯片基本相同, 区别在于: 选用透明基板 2230, 并在透明基板 2230的背 面设置反射层 M3。 在一些实施例中, 也可以采用图 4或图 6所示的结构, 同样的 在图 4或者图 6所示的 LED芯片 220的基板 2230背面设置反射层 M3。 [0066] FIG. 10 shows the structure of an LED chip 220 used in the light-emitting device shown in FIG. 9, which is basically the same as the LED chip shown in FIG. 5, except that: a transparent substrate 2230 is selected, and the transparent substrate 2230 Reflective layer M3 is provided on the back of the device. In some embodiments, the structure shown in FIG. 4 or FIG. 6 may also be adopted. Similarly, a reflective layer M3 is provided on the back of the substrate 2230 of the LED chip 220 shown in FIG. 4 or FIG.
[0067] 图 11简单示意了根据本发明实施的一种发光装置。 该发光装置包括: 支架 210 、 LED芯片 220通过接合层 250安装于支架 210上、 封装材料层 230覆盖该 LED芯片 220以该 LED芯片 220密封于该支架上。 其中 LED芯片包括外延叠层 2210、 基板 22 30及连接两者的接合层 2280, 其中该接合层 2280的上、 下方设有第一反射层 M21 (或者 Ml) 和第二反射层 M22。 [0067] FIG. 11 simply illustrates a light emitting device implemented according to the present invention. The light-emitting device includes a bracket 210, an LED chip 220 is mounted on the bracket 210 through a bonding layer 250, a packaging material layer 230 covers the LED chip 220, and the LED chip 220 is sealed on the bracket. The LED chip includes an epitaxial laminate 2210, a substrate 2230, and a bonding layer 2280 connecting the two. A first reflective layer M21 (or M1) and a second reflective layer M22 are provided above and below the bonding layer 2280.
[0068] 图 12显示了用于图 9所示发光装置的一种 LED芯片 220的结构。 该 LED芯片从上 到下依次包含: 外延叠层 2210、 第一电极 2221/第二电极 2222、 第一电连接层 224 1/第二电连接层、 绝缘层 2260、 第三电连接层 2244、 接合层 2280、 反射层 2290和 基板 2230。 其中第一反射层可以为第一电连接层 2241和 /或第三电连接层 2244。 优选的, 第三电连接层 2244—方面电连接第二半导体层 2213与第一电连接层 224 2, 另一方面作为第一反射层 M21, 包括 Al、 Cr或者 Ag等反射材料。 接合层 2280 用于结合外延叠层 2210和基板 2230, 其材料可以根据需要选用金属材料或者非 金属材料。 [0069] 在一些实施例中, 该发光装置应用于大电流密度下 (例如电流密度 A/mm 2 , 可以为2 /111111 2或者3 /111111 2) , 该接合层 2280优选采用金属键合材料, 此时 反射层 2290优选也采用高反射的金属材料 (例如铝、 银等金属) , 如此可以形 成散热通道, 有利于将堆积在第二半导体层 2213的热量通过第三导电层 2244、 接合层 2280、 反射层 2290、 基板 2230引至支架 210上, 从支架 210导出。 在一些 实施例中, 该发光装置的接合层 2280也可以采用绝缘层, 此时反射层 2290可以 为金属反射层也可以为绝缘反射层。 [0068] FIG. 12 shows a structure of an LED chip 220 used in the light-emitting device shown in FIG. 9. From top to bottom, the LED chip includes: an epitaxial stack 2210, a first electrode 2221 / a second electrode 2222, a first electrical connection layer 224 1 / a second electrical connection layer, an insulating layer 2260, a third electrical connection layer 2244, The bonding layer 2280, the reflective layer 2290, and the substrate 2230. The first reflective layer may be the first electrical connection layer 2241 and/or the third electrical connection layer 2244. Preferably, the third electrical connection layer 2244 electrically connects the second semiconductor layer 2213 and the first electrical connection layer 2242 on the one hand, and on the other hand, serves as the first reflective layer M21 and includes reflective materials such as Al, Cr, or Ag. The bonding layer 2280 is used to combine the epitaxial stack 2210 and the substrate 2230, and its material can be a metal material or a non-metal material as required. [0069] In some embodiments, the light-emitting device is applied to a high current density (for example, the current density A/mm 2 , which may be 2/111111 2 or 3/111111 2 ), and the bonding layer 2280 preferably uses a metal bonding material At this time, the reflective layer 2290 preferably also uses a highly reflective metal material (such as aluminum, silver and other metals), so that a heat dissipation channel can be formed, which is beneficial to pass the heat accumulated on the second semiconductor layer 2213 through the third conductive layer 2244 and the bonding layer. 2280, the reflective layer 2290, and the substrate 2230 are led to the support 210 and led out from the support 210. In some embodiments, the bonding layer 2280 of the light-emitting device may also be an insulating layer. In this case, the reflective layer 2290 may be a metal reflective layer or an insulating reflective layer.
[0070] 图 13显示了用于图 9所示发光装置的一种 LED芯片 220的结构。 与图 12所示的 LE D芯片的结构不同的是, 接合层 2280的侧壁 2281由反射层包覆。 安装有该 LED芯 片 220的发光装置中, LED芯片 220发出的光线经由支架 210侧壁的反射或者封装 材料层 230的反射和 /或散射, 射至接合层 2280, 包覆在接合层的侧壁 2281的反 射层直接反射, 避免光线进入射入接合层内部 2280。 [0070] FIG. 13 shows the structure of an LED chip 220 used in the light emitting device shown in FIG. The difference from the structure of the LE D chip shown in FIG. 12 is that the sidewall 2281 of the bonding layer 2280 is covered with a reflective layer. In the light-emitting device mounted with the LED chip 220, the light emitted by the LED chip 220 is reflected by the side wall of the bracket 210 or reflected and/or scattered by the packaging material layer 230, and is incident on the bonding layer 2280, and is covered on the side wall of the bonding layer The reflective layer of 2281 reflects directly to prevent light from entering and entering the interior 2280 of the bonding layer.
[0071] 图 14简单示意了根据本发明实施的一种发光装置。 与图 11所示发光装置不同的 是, 支架 210的芯片安装区域 2101表面上设置有反射层 260, LED芯片 220通过结 合层 250安装于该反射层 260上, 其中基板 2230为透明材料, 其中基板的透光性 优选为 70%以上。 LED芯片结构可以参考图 12和 13所示结构。 [0071] FIG. 14 simply illustrates a light emitting device implemented according to the present invention. The difference from the light-emitting device shown in FIG. 11 is that a reflective layer 260 is provided on the surface of the chip mounting area 2101 of the bracket 210, and the LED chip 220 is mounted on the reflective layer 260 through the bonding layer 250. The substrate 2230 is made of a transparent material. The light transmittance of is preferably 70% or more. The structure of the LED chip can refer to the structure shown in Figures 12 and 13.
[0072] 在该发光装置中, 至少包括了三个反射层: 第一反射层、 第二反射层 M22和第 三反射层 M3, 其中第一反射层设置于结合层 2280的上方, 可以为 Ml或者 M21, 主要用于直接反射 LED芯片的有源层向下发射的光线, 其与 LED芯片的出光面 S1 1的距离为 l(Vm以下, 例如可以为 4~8pm, 第二反射层 M22设置在结合层 2280与 透明基板 2230之间, 与 LED芯片的出光面 S11的距离为 20—以下, 例如可以为 7~ lO^im, 或者 10~15pm, 第三反射层 M3设置于透明基板 2230与支架 210之间, 与 L 的出光面 S11的距离为 50pm以上, 该第二反射层 M22、 第三反射层 M3和 透明基板 2230形成一个光传输通道, LED芯片 220发出的光线由于支架 210侧壁的 反射造成的部分光入射到透明基板 2230内, 光会从透明基板 2230的另一端射出 , 减少被结合层 2280或者支架 210吸收。 [0072] In the light-emitting device, at least three reflective layers are included: a first reflective layer, a second reflective layer M22, and a third reflective layer M3. The first reflective layer is disposed above the bonding layer 2280 and may be M1. Or M21, which is mainly used to directly reflect the light emitted downward from the active layer of the LED chip, and the distance between it and the light-emitting surface S11 of the LED chip is l (below Vm, for example, 4~8 pm, and the second reflective layer M22 is provided The distance between the bonding layer 2280 and the transparent substrate 2230 and the light-emitting surface S11 of the LED chip is 20—below, for example, 7~10 μm, or 10~15 pm, and the third reflective layer M3 is disposed on the transparent substrate 2230 and The distance between the brackets 210 and the light-emitting surface S11 of L is more than 50 pm. The second reflective layer M22, the third reflective layer M3 and the transparent substrate 2230 form a light transmission channel. The light emitted by the LED chip 220 is due to the side wall of the bracket 210 Part of the light caused by the reflection is incident into the transparent substrate 2230, and the light will be emitted from the other end of the transparent substrate 2230, reducing absorption by the bonding layer 2280 or the bracket 210.
[0073] 图 15简单示意了根据本发明实施的一种发光装置。 该发光装置同样包含了至少 三个反射层第一反射层、 第二反射层 M22和第三反射层 M3 , 与图 14所示发光装 置不同的是, 第三反射层 M3位于结合层 250与透明基板 2230之间。 图 16显示了用 于图 15所示发光装置的一种 LED芯片 220的结构, 该第三反射层 M3形成在透明基 板 2230的背面。 [0073] FIG. 15 simply illustrates a light emitting device implemented according to the present invention. The light-emitting device also includes at least three reflective layers, a first reflective layer, a second reflective layer M22, and a third reflective layer M3, which are similar to the light-emitting device shown in FIG. The difference is that the third reflective layer M3 is located between the bonding layer 250 and the transparent substrate 2230. FIG. 16 shows the structure of an LED chip 220 used in the light emitting device shown in FIG. 15, and the third reflective layer M3 is formed on the back surface of the transparent substrate 2230.
[0074] 图 17简单示意了根据本发明实施的一种发光装置。 与图 11所示发光装置不同的 是, 该发光装置的 LED芯片 220具有反射基板 2230, 反射率优选为 90%以上, 可 以为白色陶瓷, 用于固定 LED芯片 220的结合层 250优选为反射材料, 其反射率较 佳为 80%以上, 可以为白色固晶胶。 LED芯片 220的具体结构可以参考图 5或图 6 所示结构, 基板 2230为反射基板, 第三电连接层 2244邻近基板的一侧包含结合 层 2280。 结合层 2280上方设置有反射层 Ml和 /或 M21, 因此有源层发出的向下的 光直接被反射, 不会再经过结合层导致部分光被吸收。 同时, 在该发光装置的 L ED芯片 220发出的光线由于支架侧壁的反射造成的部分光照射到反射基板 2230的 表面, 可以直接进行反射, 减少基板 2230或者支架 210的吸光。 [0074] FIG. 17 simply illustrates a light emitting device implemented according to the present invention. The difference from the light-emitting device shown in FIG. 11 is that the LED chip 220 of the light-emitting device has a reflective substrate 2230, the reflectivity is preferably more than 90%, and can be white ceramic, and the bonding layer 250 for fixing the LED chip 220 is preferably a reflective material The reflectivity is preferably above 80%, and it can be a white solid crystal glue. For the specific structure of the LED chip 220, refer to the structure shown in FIG. 5 or FIG. 6. The substrate 2230 is a reflective substrate, and the side of the third electrical connection layer 2244 adjacent to the substrate includes a bonding layer 2280. The reflective layer M1 and/or M21 is arranged above the bonding layer 2280, so the downward light emitted by the active layer is directly reflected, and part of the light will not be absorbed by the bonding layer. At the same time, part of the light emitted by the LED chip 220 of the light-emitting device irradiates the surface of the reflective substrate 2230 due to the reflection of the side wall of the support, and can be directly reflected to reduce the light absorption of the substrate 2230 or the support 210.
[0075] 在一些实施例中, 封装该 LED芯片 220的封装材料层 230中含有颗粒 231, LED 芯片 220发出的部分光线会被反射或者散射, 射至反射基板 2230侧面, 直接被反 射。 [0075] In some embodiments, the encapsulation material layer 230 encapsulating the LED chip 220 contains particles 231, and part of the light emitted by the LED chip 220 will be reflected or scattered, hit the side of the reflective substrate 2230, and be directly reflected.
[0076] 在一些实施例中, LED芯片的周围和上方覆盖有荧光粉, LED芯片 220发出的 部分光线会被反射或者散射照到反射基板侧面, 直接被反射。 [0076] In some embodiments, the LED chip is covered with phosphor powder around and above, and part of the light emitted by the LED chip 220 will be reflected or scattered to the side of the reflective substrate and be directly reflected.
[0077] 图 18简单示意了图 17所示发光装置的一种变形。 该发光装置的 LED芯片 220之 基板并不限于反射基板, 其可以为透明基板 (例如蓝宝石基板、 玻璃基板等) 或者吸光基板 (例如硅基板等) , 在基板的侧壁形成反射层 2231。 [0077] FIG. 18 simply illustrates a modification of the light emitting device shown in FIG. 17. The substrate of the LED chip 220 of the light-emitting device is not limited to the reflective substrate, and it can be a transparent substrate (such as a sapphire substrate, a glass substrate, etc.) or a light-absorbing substrate (such as a silicon substrate, etc.), and a reflective layer 2231 is formed on the sidewall of the substrate.
[0078] 图 19简单示意了根据本发明实施的一种发光装置。 与图 3所示发光装置相同之 处不再赘述, 不同之处在于: 在封装材料层 230的下方设有反射性材料层 231, 其围绕 LED芯片 220的外侧面 S 13, 但不覆盖 LED芯片的出光面 S11。 该反射材料 可以为硅树脂、 环氧化物或者硅树脂-环氧化物混合材料, 例如白胶。 优选的, 该反光材料层 231的上表面 S21优选不低于 LED芯片的基板 2230上表面 S 14。 [0078] FIG. 19 simply illustrates a light emitting device implemented according to the present invention. The same parts as the light-emitting device shown in FIG. 3 will not be repeated here. The difference is that a reflective material layer 231 is provided under the packaging material layer 230, which surrounds the outer side surface S13 of the LED chip 220, but does not cover the LED chip的光出surface S11. The reflective material can be silicone, epoxy, or a silicone-epoxide mixed material, such as white glue. Preferably, the upper surface S21 of the reflective material layer 231 is preferably not lower than the upper surface S14 of the substrate 2230 of the LED chip.
[0079] 图 3所示该发光装置中, LED芯片 220的厚度主要取决于基板 2230的厚度, 该基 板厚度一般达 50 以上, 例如 10(Vm, 因此当该发光装置工作是, LED芯片 220 发射的光线射入封装材料层 230时, 部分光线经反射或散射, 容易从基板 2230的 侧面入射入基板内部, 被基板、 支架或者 LED芯片内部吸收。 图 19所示发光装置 在封装材料层与支架之间围绕 LED芯片的周围填充反射材料层 231, 该反射材料 层 231不低于基板 2230的上表面 S14, 因此可以有效防止 LED芯片发射的光线射 入封装材料层 230后经反射或散射后射入基板 2230。 [0079] In the light-emitting device shown in FIG. 3, the thickness of the LED chip 220 mainly depends on the thickness of the substrate 2230. The thickness of the substrate is generally more than 50, such as 10 μm. Therefore, when the light-emitting device is working, the LED chip 220 emits light. When the light enters the packaging material layer 230, part of the light is reflected or scattered, and it is easy to escape from the substrate 2230 The side is incident on the inside of the substrate, and absorbed by the inside of the substrate, bracket or LED chip. The light-emitting device shown in FIG. 19 is filled with a reflective material layer 231 between the packaging material layer and the bracket around the LED chip. The reflective material layer 231 is not lower than the upper surface S14 of the substrate 2230, so it can effectively prevent the light emitted by the LED chip from being emitted. After entering the packaging material layer 230, it is reflected or scattered into the substrate 2230.
[0080] 在一些实施例中, 该反射材料层的上表面 S21与 LED芯片的出光面 S11的距离 H 1优先为 20pm以内, 更佳为 l(Vm以内。 在一个具体的实施例中, 反光材料层 231 环绕 LED芯 220周围达到直至基板 2230的上表面 S14。 在一些实施例中, 该反光 材料层 231环绕 LED芯 220周围达到直至覆盖 LED芯片的电极, 如图 20所示。 在一 些实施例中, 该反光材料层 231环绕 LED芯 220周围达到直至与 LED芯片的上表面 齐平, 如图 21所示。 [0080] In some embodiments, the distance H1 between the upper surface S21 of the reflective material layer and the light-emitting surface S11 of the LED chip is preferably within 20 pm, and more preferably within 1 (Vm). In a specific embodiment, the reflective material The material layer 231 surrounds the LED core 220 to reach the upper surface S14 of the substrate 2230. In some embodiments, the reflective material layer 231 surrounds the LED core 220 and reaches to cover the electrodes of the LED chip, as shown in Figure 20. In some implementations In an example, the reflective material layer 231 surrounds the LED core 220 until it is flush with the upper surface of the LED chip, as shown in FIG. 21.
[0081] 图 22简单示意了根据本发明实施的一种发光装置。 与图 3所示发光装置不同的 是, 该发光装置的支架 210不具有碗杯结构, 例如为平板结构, 封装材料层 230 覆盖 LED芯片及引线。 在一些较佳实施例中, 封装材料层 230对应于 LED芯片 220 的上方形成透镜结构 232, 该透镜结构 232可以和封装材料层 230采用相同的材料 , 也可以采用不同的材料。 [0081] FIG. 22 simply illustrates a light emitting device implemented according to the present invention. The difference from the light-emitting device shown in FIG. 3 is that the support 210 of the light-emitting device does not have a cup structure, such as a flat plate structure, and the packaging material layer 230 covers the LED chips and leads. In some preferred embodiments, the packaging material layer 230 corresponds to the lens structure 232 formed above the LED chip 220. The lens structure 232 and the packaging material layer 230 can be made of the same material or different materials.
[0082] 图 23简单示意了根据本发明实施的一种发光装置。 与图 22所示发光装置不同的 是, 在支架 210与封装材料层 230之间设有环绕 LED芯片 220的反射材料 231, 该反 射材料 231可以与 LED芯片的出光面 S11齐平, 或者低于该出光面 S11。 [0082] FIG. 23 simply illustrates a light emitting device implemented according to the present invention. The difference from the light-emitting device shown in FIG. 22 is that a reflective material 231 surrounding the LED chip 220 is provided between the bracket 210 and the packaging material layer 230. The reflective material 231 may be flush with the light-emitting surface S11 of the LED chip, or lower than The light-emitting surface S11.
[0083] 图 24和 25简单示意了根据本发明实施的一种发光装置。 该发光装置包括支架 21 0和安装于支架上的至少两个的 LED芯片 220及封装材料层 (图中没有示出) 。 [0083] FIGS. 24 and 25 schematically illustrate a light emitting device implemented according to the present invention. The light-emitting device includes a bracket 210, at least two LED chips 220 mounted on the bracket, and a packaging material layer (not shown in the figure).
[0084] 在该发光装置中, 多个 LED芯片 220安装于同一支架 210内里, 相邻的 LED芯片 220之间存在相互挡光的问题。 定义 OL为相邻的两个 LED芯片 220交叠的长度, L 为 LED芯片的长度, W为 LED芯片的宽度, P为该 LED芯片 220的周长, 即 2x(L+ W), T是该 LED芯片 220的厚度, G是相邻的 LED芯片 220之间的间距, LED芯片 间的挡光主要与芯片的厚度 T、 芯片之间的间隙 G、 及相邻的 LED芯片交叠的长 度有关, 具体为: 与 LED芯片的厚度 T成正比, 与 LED芯片之间的间隙 G成反比 , 与相邻的 LED芯片交叠的区域占芯片的侧表面总面积的比例 (OL/P) 成正比 , 因此定义挡光因子 F1和 F2, 其中 FlcxT/G, F2cxOL/P, 定义挡光系数为11= FlxF2, R越大, 该 LED芯片之间的侧挡光影响越大。 在本实施例中, 该发光装 置采用图 5或 6所示的 LED芯片, 其在外延叠层 2210与基板 2230之间设有反射层 M 1或 M21, 该反射层到 LED芯片的出光面 S11的距离 D1可以达 l(Vm以下, 到有源 层的距离 D2可以达 5—以下, 因此 LED芯片的发光角较小, 优选等于或小于 120° , 例如可以为 110~120°, 有源层 2212发射的光线主要从出光面 S11射出, 因此 LE D芯片之间的侧挡光影响较小, 相邻芯片的间距 G可以为 15(Vm, 较佳值为 50~12 (Vm, 可以兼顾挡光影响及封装体尺寸, 对应的, 挡光系数 R优选取 0.2以上的数 值, 这样可以更加充分的利用空间, 同时在光效不变情况下, 缩小封装尺寸, 或者相同封装尺寸下增大芯片的面积, 从而提升光效。 较佳的, 该挡光系数 R的 较佳取值为 0.2~2。 [0084] In the light-emitting device, a plurality of LED chips 220 are installed in the same bracket 210, and there is a problem of blocking light between adjacent LED chips 220. Define OL as the overlapping length of two adjacent LED chips 220, L is the length of the LED chip, W is the width of the LED chip, P is the perimeter of the LED chip 220, that is, 2x(L+W), T is the The thickness of the LED chip 220, G is the distance between adjacent LED chips 220, the light blocking between the LED chips is mainly related to the thickness T of the chip, the gap G between the chips, and the overlapping length of the adjacent LED chips Specifically: It is proportional to the thickness T of the LED chip, inversely proportional to the gap G between the LED chips, and proportional to the ratio of the area overlapping adjacent LED chips to the total area of the side surface of the chip (OL/P) , Therefore define the light blocking factors F1 and F2, where FlcxT/G, F2cxOL/P, define the light blocking coefficient as 11= The greater the FlxF2, R, the greater the influence of the side light blocking between the LED chips. In this embodiment, the light-emitting device uses the LED chip shown in FIG. 5 or 6, which has a reflective layer M1 or M21 between the epitaxial laminate 2210 and the substrate 2230, and the reflective layer reaches the light-emitting surface S11 of the LED chip. The distance D1 can reach l(Vm or less, and the distance D2 to the active layer can reach 5— or less. Therefore, the light-emitting angle of the LED chip is small, preferably equal to or less than 120°, for example, 110~120°, the active layer The light emitted by 2212 is mainly emitted from the light-emitting surface S11, so the side light blocking between the LED chips has little effect. The distance G between adjacent chips can be 15 Vm, preferably 50~12 Vm, which can take into account the blocking Light influence and package size, correspondingly, the light blocking coefficient R is preferably a value above 0.2, which can make full use of space, and at the same time, reduce the package size or increase the chip size under the same package size under the same light effect. Therefore, the light efficiency is improved. Preferably, the light blocking coefficient R is preferably 0.2-2.
[0085] 在一个实施例中, LED芯片的尺寸如下: 长度 L为 HXXVm, 宽度 W为 50(Vm, 高度 T为 150—, 相邻 LED芯片之间的交叠长度 OL为 50(Vm, 间距 G为 100—, 则 R=0.25。 在另一个实施例中, LED芯片的尺寸不变, 相邻 LED芯片之间的交叠 长度 OL为 100(Vm, 间距 G为 10(Vm, 则 R=0.5。 在另一个实施例中, LED芯片的 尺寸不变, 交叠长度 OL为 100(Vm, 间距 G为 50—, 则 R=l。 [0085] In one embodiment, the dimensions of the LED chips are as follows: the length L is HXXVm, the width W is 50 (Vm, the height T is 150—, and the overlapping length OL between adjacent LED chips is 50 (Vm, spacing G is 100—, then R=0.25. In another embodiment, the size of the LED chip remains unchanged, the overlap length OL between adjacent LED chips is 100 (Vm, and the spacing G is 10 (Vm, then R= 0.5. In another embodiment, the size of the LED chip is unchanged, the overlap length OL is 100 (Vm, the spacing G is 50—, then R=1.
[0086] 在一些具体的实施样态中, 可以根据需要设置波长转换层, 该波长转换层可以 直接在封装材料层中掺入荧光粉或者采用波长转换薄片。 优选的, 该波长转换 层形成在 LED芯片的上表面所在平面以上, 较佳的, 仅在 LED芯片的出光面上设 置波长转换层。 [0086] In some specific implementations, a wavelength conversion layer may be provided as required, and the wavelength conversion layer may directly incorporate phosphor into the packaging material layer or adopt a wavelength conversion sheet. Preferably, the wavelength conversion layer is formed above the plane where the upper surface of the LED chip is located. Preferably, the wavelength conversion layer is only provided on the light-emitting surface of the LED chip.
[0087] 图 26简单显示了一种发光装置, 与图 24所示发光装置不同的是, 该发光装置包 括支架和位于支架之上的至少三个 LED芯片, 该多个 LED芯片发射的光谱不同, 例如分别发射红、 蓝和绿三种光线, 同时支架可以为平板结构或者碗杯结构。 L m)芯片可以采用图 4~6所示的任意一种 LED芯片。 [0087] FIG. 26 simply shows a light-emitting device. The difference from the light-emitting device shown in FIG. 24 is that the light-emitting device includes a bracket and at least three LED chips located on the bracket, and the multiple LED chips emit different spectra. For example, three lights of red, blue and green are emitted respectively, and the support can be a flat structure or a bowl structure. L m) The chip can be any of the LED chips shown in Figures 4-6.
[0088] 在一些实施例中, 该发光装置要求在 4A/mm 2甚至 5A/mm 2的高电流密度下, 例 如此时优选采用图 6所示的 LED芯片。 具体的, 该基板 2230优选采用散热性佳的 绝缘基板, 例如陶瓷基板, 可以实现了热电分离的结构, 为高电流密度驱动提 供良好基础, 同时可以快速将外延叠层产生的热量引至支架并导出; 进一步地 , 该 LED芯片的发光角小于或等于 120°, 例如为 120~110°, 在光效不变情况下, 可以有效缩小封装尺寸, 或者相同封装尺寸下增大芯片的面积。 在一具实施例 中, 该发光装置应用于舞台灯, 包括了 A、 B、 C、 D四个 LED芯片, 分别发射白 光、 红光、 蓝光和绿光。 其中白光 LED芯片的出光面涂布有荧光粉, 用于发射白 光。 每个 LED芯片之间的间距为 50~150微米。 [0088] In some embodiments, the light-emitting device requires a high current density of 4 A/mm 2 or even 5 A/mm 2. For example, the LED chip shown in FIG. 6 is preferably used at this time. Specifically, the substrate 2230 preferably adopts an insulating substrate with good heat dissipation, such as a ceramic substrate, which can realize a thermoelectric separation structure, provides a good foundation for high current density driving, and can quickly guide the heat generated by the epitaxial stack to the support Derive; further, the light-emitting angle of the LED chip is less than or equal to 120°, for example, 120 to 110°, under the condition that the light effect remains unchanged, It can effectively reduce the package size, or increase the chip area under the same package size. In one embodiment, the light emitting device is applied to a stage light, and includes four LED chips A, B, C, and D, which emit white light, red light, blue light, and green light, respectively. Among them, the light emitting surface of the white light LED chip is coated with phosphor powder for emitting white light. The spacing between each LED chip is 50 to 150 microns.
[0089] 以上所述仅是本发明的优选实施方式, 应当指出, 对于本技术领域的技术人员 , 在不脱离本发明原理的前提下, 还可以做出若干改进和润饰, 这些改进和润 饰也应视为本发明的保护范围。 [0089] The above are only the preferred embodiments of the present invention. It should be noted that for those skilled in the art, without departing from the principle of the present invention, several improvements and modifications can be made, and these improvements and modifications are also It should be regarded as the protection scope of the present invention.

Claims

权利要求书 Claims
[权利要求 1] 一种发光装置, 包括: [Claim 1] A light emitting device, comprising:
支架, 具有用于安装发光二极管芯片的安装表面, 及第一焊线区和第 二焊线区, 所述第一焊线区和第二焊线区彼此电性隔离; A bracket having a mounting surface for mounting the light-emitting diode chip, and a first wire bonding area and a second wire bonding area, the first wire bonding area and the second wire bonding area are electrically isolated from each other;
LED芯片, 安装于所述支架的安装表面上, 包含基板、 及位于其上的 第一电极、 第二电极和外延叠层, 该外延叠层具有相对的上表面和下 表面; The LED chip is mounted on the mounting surface of the bracket and includes a substrate, and a first electrode, a second electrode, and an epitaxial stack on the substrate, the epitaxial stack having opposite upper and lower surfaces;
封装材料层, 用于将所述 LED芯片密封于所述支架上; A layer of packaging material for sealing the LED chip on the bracket;
其特征在于: 所述第一电极和第二电极形成于所述基板之上并位于所 述外延叠层的外侧, 一方面与所述外延叠层的下表面形成电性连接, 另一方面通过引线分别连接到所述支架的第一焊线区和第二焊线区。 It is characterized in that: the first electrode and the second electrode are formed on the substrate and located outside the epitaxial laminate, on the one hand they are electrically connected to the lower surface of the epitaxial laminate, and on the other hand through The leads are respectively connected to the first wire bonding area and the second wire bonding area of the bracket.
[权利要求 2] 一种发光装置, 包括: [Claim 2] A light emitting device, comprising:
支架, 具有用于安装发光二极管芯片的安装表面, 及第一焊线区和第 二焊线区, 所述第一焊线区和第二焊线区彼此电性隔离; A bracket having a mounting surface for mounting the light-emitting diode chip, and a first wire bonding area and a second wire bonding area, the first wire bonding area and the second wire bonding area are electrically isolated from each other;
LED芯片, 安装于所述支架的安装表面上, 包含基板、 及位于其上的 第一电极、 第二电极、 电连接层和外延叠层, 该外延叠层具有相对的 上表面和下表面; The LED chip is mounted on the mounting surface of the bracket and includes a substrate, and a first electrode, a second electrode, an electrical connection layer, and an epitaxial laminate on the substrate, the epitaxial laminate having opposite upper and lower surfaces;
封装材料层, 用于将所述 LED芯片密封于所述支架上; A layer of packaging material for sealing the LED chip on the bracket;
其特征在于: 所述第一电极和第二电极一方面通过该电连接层从所述 外延叠层的下表面引出, 朝向所述外延叠层的上表面, 另一方面通过 引线分别连接到所述支架的第一焊线区和第二焊线区。 It is characterized in that: the first electrode and the second electrode are led out from the lower surface of the epitaxial laminate through the electrical connection layer on the one hand, and face the upper surface of the epitaxial laminate; The first wire bonding area and the second wire bonding area of the bracket.
[权利要求 3] 根据权利要求 1或 2所述的发光装置, 其特征在于: 所述外延叠层去除 生长衬底, 其上表面为出光面, 从下到上依次包含第一半导体层、 有 源层和第二半导体层。 [Claim 3] The light-emitting device according to claim 1 or 2, characterized in that: the growth substrate is removed from the epitaxial stack, and the upper surface of the epitaxial stack is the light-emitting surface, which includes the first semiconductor layer, Source layer and second semiconductor layer.
[权利要求 4] 根据权利要求 3所述的发光装置, 其特征在于: 所述 LED芯片还包含 第一电连接和第二电连接层, 其中该第一电连接层电连接第一半导体 层和第一电极, 第二电连接层电连接第二半导体层和第二电极。 [Claim 4] The light-emitting device of claim 3, wherein the LED chip further comprises a first electrical connection and a second electrical connection layer, wherein the first electrical connection layer is electrically connected to the first semiconductor layer and The first electrode and the second electrical connection layer are electrically connected to the second semiconductor layer and the second electrode.
[权利要求 5] 根据权利要求 4所述的发光装置, 其特征在于: 所述第一电连接层包 括一反射层。 [Claim 5] The light-emitting device according to claim 4, wherein: the first electrical connection layer includes Includes a reflective layer.
[权利要求 6] 根据权利要求 4所述的发光装置, 其特征在于: 还包括第三电连接层 , 其位于第一、 第二电连接层的下方, 具有至少一个第一延伸部和一 个第二延伸部, 其中第一延伸部贯穿第一半导体层、 有源层, 与第二 半导体层接触, 第二延伸部与第二电连接层接触。 [Claim 6] The light-emitting device according to claim 4, further comprising a third electrical connection layer, which is located below the first and second electrical connection layers, and has at least one first extension and a first Two extension parts, wherein the first extension part penetrates the first semiconductor layer and the active layer and is in contact with the second semiconductor layer, and the second extension part is in contact with the second electrical connection layer.
[权利要求 7] 根据权利要求 6所述的发光装置, 其特征在于: 所述第三电连接层包 含反射层和结合层。 [Claim 7] The light-emitting device of claim 6, wherein the third electrical connection layer includes a reflective layer and a bonding layer.
[权利要求 8] 根据权利要求 6所述的发光装置, 其特征在于: 所述第一、 第二电连 接层具有相同的结构层和厚度。 [Claim 8] The light-emitting device according to claim 6, characterized in that: the first and second electrical connection layers have the same structural layer and thickness.
[权利要求 9] 根据权利要求 6所述的发光装置, 其特征在于: 当该发光装置工作时 , 所述第三电连接层、 基板形成散热通道, 将堆积在第二半导体层内 的热量引到支架并导出。 [Claim 9] The light-emitting device according to claim 6, characterized in that: when the light-emitting device is working, the third electrical connection layer and the substrate form a heat dissipation channel to guide the heat accumulated in the second semiconductor layer To the bracket and export.
[权利要求 10] 根据权利要求 1或 2所述的发光装置, 其特征在于: 所述支架具有一凹 槽结构, 所述 LED芯片位于所述凹槽内, 所述封装材料层同时覆盖所 述 LED芯片的上表面和侧表面。 [Claim 10] The light-emitting device according to claim 1 or 2, characterized in that: the bracket has a groove structure, the LED chip is located in the groove, and the packaging material layer simultaneously covers the The upper and side surfaces of the LED chip.
[权利要求 11] 根据权利要求 1或 2所述的发光装置, 其特征在于: 所述外延叠层从上 至下依次包括 n型半导体层、 有源层和 p型半导体层。 [Claim 11] The light-emitting device according to claim 1 or 2, characterized in that: the epitaxial stack includes an n-type semiconductor layer, an active layer, and a p-type semiconductor layer in order from top to bottom.
[权利要求 12] 根据权利要求 1或 2所述的发光装置, 其特征在于: 所述 LED芯片还包 含一设于所述外延叠层与基板之间的第一反射层。 [Claim 12] The light-emitting device of claim 1 or 2, wherein the LED chip further comprises a first reflective layer provided between the epitaxial laminate and the substrate.
[权利要求 13] 根据权利要求 12所述的发光装置, 其特征在于: 所述 LED芯片的上表 面为出光面, 所述第一反射层与所述 LED芯片的出光面之间的距离为 20[xm以下。 [Claim 13] The light-emitting device according to claim 12, wherein the upper surface of the LED chip is a light-emitting surface, and the distance between the first reflective layer and the light-emitting surface of the LED chip is 20 [ xm or less.
[权利要求 14] 根据权利要求 13所述的发光装置, 其特征在于: 所述第一反射层与所 述 LED芯片的出光面之间的距离为 4~8pm。 [Claim 14] The light emitting device of claim 13, wherein the distance between the first reflective layer and the light-emitting surface of the LED chip is 4-8 pm.
[权利要求 15] 根据权利要求 12所述的发光装置, 其特征在于: 所述外延叠层包含第 一半导体层、 有源层和第二半导体层, 所述第一反射层与所述有源层 之间的距离为 5pm以下。 [Claim 15] The light-emitting device of claim 12, wherein: the epitaxial stack includes a first semiconductor layer, an active layer, and a second semiconductor layer, and the first reflective layer and the active layer The distance between the layers is less than 5pm.
[权利要求 16] 根据权利要求 15所述的发光装置, 其特征在于: 所述第一反射层与所 述有源层之间的距离为: Lpm以下。 [Claim 16] The light-emitting device of claim 15, wherein: the first reflective layer and the The distance between the active layers is: Lpm or less.
[权利要求 17] 根据权利要求 12所述的发光装置, 其特征在于: 还包括一设于所述第 一反射层与基板之间的第二反射层。 [Claim 17] The light-emitting device of claim 12, further comprising a second reflective layer provided between the first reflective layer and the substrate.
[权利要求 18] 根据权利要求 17所述的发光装置, 其特征在于: 所述 LED芯片还包含 一设于第二反射层与基板之间的结合层。 [Claim 18] The light-emitting device of claim 17, wherein the LED chip further comprises a bonding layer provided between the second reflective layer and the substrate.
[权利要求 19] 根据权利要求 18所述的发光装置, 其特征在于: 还包括一第三反射层 , 其位于该结合层与基板之间。 [Claim 19] The light-emitting device of claim 18, further comprising a third reflective layer, which is located between the bonding layer and the substrate.
[权利要求 20] 根据权利要求 17所述的发光装置, 其特征在于: 所述 LED芯片还包含 一设于所述第一反射层与第二反射层之间的结合层。 [Claim 20] The light-emitting device of claim 17, wherein the LED chip further comprises a bonding layer provided between the first reflective layer and the second reflective layer.
[权利要求 21] 根据权利要求 12所述的发光装置, 其特征在于: 在所述第一反射层与 基板之间设有一金属材料的结合层。 [Claim 21] The light-emitting device of claim 12, wherein: a bonding layer of a metal material is provided between the first reflective layer and the substrate.
[权利要求 22] 根据权利要求 21所述的发光装置, 其特征在于: 所述结合层的上、 下 方均设有反射层。 [Claim 22] The light-emitting device according to claim 21, wherein a reflective layer is provided on both the upper and lower sides of the bonding layer.
[权利要求 23] 根据权利要求 1或 2所述的发光装置, 其特征在于: 所述外延叠层与所 述基板之间设有第一反射层, 所述基板与所述支架之间设有第二反射 层。 [Claim 23] The light-emitting device according to claim 1 or 2, characterized in that: a first reflective layer is provided between the epitaxial laminate and the substrate, and a first reflective layer is provided between the substrate and the support. The second reflective layer.
[权利要求 24] 根据权利要求 23所述的发光装置, 其特征在于: 所述 LED芯片的上表 面为出光面, 所述第一反射层与 LED芯片的出光面的距离为 l(Vm以 下。 [Claim 24] The light-emitting device of claim 23, wherein: the upper surface of the LED chip is a light-emitting surface, and the distance between the first reflective layer and the light-emitting surface of the LED chip is 1 (Vm or less).
[权利要求 25] 根据权利要求 1或者 2所述的发光装置, 其特征在于: 所述基板为透明 基板, 该透明基板的上方设有第一反射层, 下方设有第二反射层, 所 述 LED芯片发射的光线射入所述封装材料层, 部分光线经反射或散射 后入射至该透明基板, 由第一、 第二反射层反射后射出该基板。 [Claim 25] The light-emitting device according to claim 1 or 2, wherein the substrate is a transparent substrate, a first reflective layer is provided above the transparent substrate, and a second reflective layer is provided below the transparent substrate. The light emitted by the LED chip enters the packaging material layer, part of the light is reflected or scattered and then enters the transparent substrate, and is reflected by the first and second reflective layers and then exits the substrate.
[权利要求 26] 根据权利要求 25所述的发光装置, 其特征在于: 所述封装材料层覆盖 所述 LED芯片的上表面及侧面, 其中位于该 LED芯片上方的封装材料 层包含荧光粉。 [Claim 26] The light-emitting device according to claim 25, wherein the packaging material layer covers the upper surface and side surfaces of the LED chip, and the packaging material layer above the LED chip contains phosphor.
[权利要求 27] 根据权利要求 26所述的发光装置, 其特征在于: 所述封装材料层之环 绕所述 LED芯片的侧面的部分含有荧光粉。 [Claim 27] The light-emitting device of claim 26, wherein: the portion of the packaging material layer surrounding the side surface of the LED chip contains phosphor.
[权利要求 28] 根据权利要求 1或者 2所述的发光装置, 其特征在于: 所述基板为高反 射基板, 其为反射率为 90%以上。 [Claim 28] The light-emitting device of claim 1 or 2, wherein the substrate is a highly reflective substrate with a reflectivity of 90% or more.
[权利要求 29] 根据权利要求 1或者 2所述的发光装置, 其特征在于: 还包括一反光胶 , 该反光胶位于该支架和封装材料层之间, 并围绕该 LED芯片的周围 [Claim 29] The light-emitting device according to claim 1 or 2, further comprising a reflective adhesive, the reflective adhesive is located between the bracket and the packaging material layer and surrounds the LED chip
[权利要求 30] 根据权利要求 29所述的发光装置, 其特征在于: 该反光胶环绕所述 L [Claim 30] The light-emitting device of claim 29, wherein: the reflective glue surrounds the L
ED芯的周围达到直至达到所述基板的上表面, 或者高于所述基板上 表面所在的平面。 The periphery of the ED core reaches until it reaches the upper surface of the substrate, or is higher than the plane where the upper surface of the substrate is located.
[权利要求 31] 根据权利要求 30所述的发光装置, 其特征在于: 该反光胶完全覆盖所 述 LED芯的侧面, 裸露出外延叠层的上表面。 [Claim 31] The light-emitting device of claim 30, wherein the reflective glue completely covers the side surface of the LED core, and exposes the upper surface of the epitaxial laminate.
[权利要求 32] 根据权利要求 1或者 2所述的发光装置, 其特征在于: 所述发光装置的 发光角小于或等于 120°。 [Claim 32] The light emitting device according to claim 1 or 2, characterized in that: the light emitting angle of the light emitting device is less than or equal to 120°.
[权利要求 33] 根据权利要求 1或者 2所述的发光装置, 其特征在于: 所述 LED芯片的 发光角度为 110~120°。 [Claim 33] The light-emitting device according to claim 1 or 2, characterized in that: the light-emitting angle of the LED chip is 110-120°.
PCT/CN2019/074690 2019-02-03 2019-02-03 Light-emitting apparatus WO2020155176A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
PCT/CN2019/074690 WO2020155176A1 (en) 2019-02-03 2019-02-03 Light-emitting apparatus
CN201980000864.4A CN110178230A (en) 2019-02-03 2019-02-03 Light emitting device
US17/360,956 US11978839B2 (en) 2019-02-03 2021-06-28 Light-emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2019/074690 WO2020155176A1 (en) 2019-02-03 2019-02-03 Light-emitting apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/092364 Continuation-In-Part WO2020155529A1 (en) 2019-02-03 2019-06-21 Light-emitting device

Related Child Applications (2)

Application Number Title Priority Date Filing Date
PCT/CN2019/092368 Continuation-In-Part WO2020155532A1 (en) 2019-02-03 2019-06-21 Light emitting device
US17/360,956 Continuation-In-Part US11978839B2 (en) 2019-02-03 2021-06-28 Light-emitting device

Publications (1)

Publication Number Publication Date
WO2020155176A1 true WO2020155176A1 (en) 2020-08-06

Family

ID=67700068

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/074690 WO2020155176A1 (en) 2019-02-03 2019-02-03 Light-emitting apparatus

Country Status (2)

Country Link
CN (1) CN110178230A (en)
WO (1) WO2020155176A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114883473A (en) * 2020-01-02 2022-08-09 厦门市三安光电科技有限公司 Light emitting device and light emitting apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170018679A1 (en) * 2015-07-15 2017-01-19 Southern Taiwan University Of Science And Technology Light emitting diode and data transmission and reception apparatus
CN108231968A (en) * 2017-12-11 2018-06-29 厦门市三安光电科技有限公司 Micro- light emitting diode and its transfer method
CN108417682A (en) * 2018-03-22 2018-08-17 厦门市三安光电科技有限公司 A kind of miniature light-emitting component and preparation method thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW567618B (en) * 2002-07-15 2003-12-21 Epistar Corp Light emitting diode with adhesive reflection layer and manufacturing method thereof
TW201029226A (en) * 2009-01-22 2010-08-01 Arima Optoelectronics Corp Barrier layer structure of wafer bonding light emitting diode
US8207547B2 (en) * 2009-06-10 2012-06-26 Brudgelux, Inc. Thin-film LED with P and N contacts electrically isolated from the substrate
KR101039999B1 (en) * 2010-02-08 2011-06-09 엘지이노텍 주식회사 Semiconductor light emitting device and fabrication method thereof
EP2442374B1 (en) * 2010-10-12 2016-09-21 LG Innotek Co., Ltd. Light emitting device
CN104979441B (en) * 2014-04-02 2018-03-20 四川新力光源股份有限公司 A kind of LED chip and preparation method thereof and LED display
CN105702821B (en) * 2016-03-29 2018-01-30 苏州晶湛半导体有限公司 Light emitting semiconductor device and its manufacture method
CN108933187B (en) * 2018-08-22 2024-02-09 南昌大学 LED chip with luminous surface in specific plane geometric figure and preparation method thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170018679A1 (en) * 2015-07-15 2017-01-19 Southern Taiwan University Of Science And Technology Light emitting diode and data transmission and reception apparatus
CN108231968A (en) * 2017-12-11 2018-06-29 厦门市三安光电科技有限公司 Micro- light emitting diode and its transfer method
CN108417682A (en) * 2018-03-22 2018-08-17 厦门市三安光电科技有限公司 A kind of miniature light-emitting component and preparation method thereof

Also Published As

Publication number Publication date
CN110178230A (en) 2019-08-27

Similar Documents

Publication Publication Date Title
US8097896B2 (en) Light emitting device package and method for manufacturing the same
US10043955B2 (en) Light emitting diode chip having wavelength converting layer and method of fabricating the same, and package having the light emitting diode chip and method of fabricating the same
WO2020155530A1 (en) Light-emitting device
WO2020155532A1 (en) Light emitting device
TWI550910B (en) Semiconductor light emitting device
WO2020155529A1 (en) Light-emitting device
US8207552B2 (en) Thin film light emitting diode
US8179039B2 (en) Light emitting device, method of manufacturing the same, light emitting device package, and illumination system
WO2007102534A1 (en) Chip type semiconductor light emitting element
JP2009088299A (en) Light-emitting element and light-emitting device provided with the element
KR102252994B1 (en) Light emitting device package and fluorescent film for the same
KR20160149827A (en) Light emitting device including multiple wavelength conversion units and method of making the same
TW201445774A (en) Phosphor and light emitting device package including the same
KR20220004002A (en) Light emitting device
WO2021134748A1 (en) Light-emitting apparatus and light-emitting device
WO2020155176A1 (en) Light-emitting apparatus
WO2020210945A1 (en) Light-emitting device and manufacture method therefor
US8455882B2 (en) High efficiency LEDs
KR101722623B1 (en) Light-emitting element and Light-emitting element package
KR20210019897A (en) Light emitting device and light emitting device package
KR20130053591A (en) Light emitting devcie and method of fabricating the same
KR20120130853A (en) A light emitting device and a light emitting device package

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19914021

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19914021

Country of ref document: EP

Kind code of ref document: A1