WO2020153353A1 - Purification device - Google Patents

Purification device Download PDF

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Publication number
WO2020153353A1
WO2020153353A1 PCT/JP2020/001941 JP2020001941W WO2020153353A1 WO 2020153353 A1 WO2020153353 A1 WO 2020153353A1 JP 2020001941 W JP2020001941 W JP 2020001941W WO 2020153353 A1 WO2020153353 A1 WO 2020153353A1
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WO
WIPO (PCT)
Prior art keywords
gas
photocatalyst
region
housing
flow path
Prior art date
Application number
PCT/JP2020/001941
Other languages
French (fr)
Japanese (ja)
Inventor
俊一 中井
誠 吉成
勉 武智
孝一 武内
Original Assignee
有限会社マロニエ技術研究所
日本製鉄株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 有限会社マロニエ技術研究所, 日本製鉄株式会社 filed Critical 有限会社マロニエ技術研究所
Priority to JP2020568156A priority Critical patent/JPWO2020153353A1/en
Publication of WO2020153353A1 publication Critical patent/WO2020153353A1/en

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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00Disinfection, sterilisation or deodorisation of air
    • A61L9/16Disinfection, sterilisation or deodorisation of air using physical phenomena
    • A61L9/18Radiation
    • A61L9/20Ultra-violet radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/92Chemical or biological purification of waste gases of engine exhaust gases
    • B01D53/94Chemical or biological purification of waste gases of engine exhaust gases by catalytic processes

Definitions

  • Embodiments of the present invention relate to a purification device.
  • a device using a photocatalyst is known as a device for purifying gas such as air (see, for example, Patent Documents 1 and 2). Since the photocatalyst has an antibacterial effect, a deodorizing effect and a cleaning effect, it is used in equipment such as an air cleaning device or an exhaust gas cleaning device.
  • a device such as supporting the photocatalyst on a porous or sponge-like substrate is made in order to increase the contact area between the photocatalyst and the gas.
  • the photocatalyst is activated by irradiation with ultraviolet rays (UV). Therefore, in the case of purifying gas by utilizing the properties of the photocatalyst, it is known that it is useful to use irradiation of ultraviolet rays together.
  • UV ultraviolet rays
  • the present invention aims to improve the ability to purify gases such as air using a photocatalyst activated by ultraviolet rays.
  • a purification device is a casing that forms a flow path of gas to be purified, and at least a part of a plate-like member whose surface on the flow path side is coated with a photocatalyst.
  • a light source that purifies the gas that has flowed into the housing and irradiates ultraviolet light for activating the photocatalyst, and the gas in the housing is the ultraviolet light regardless of the photocatalyst. Is formed into a first region and a second region in which the gas is purified by the ultraviolet rays and the photocatalyst activated by the ultraviolet rays, and is formed in the first region and the second region.
  • a discharge port for discharging the gas after purification is provided only in a part of the region or the second region.
  • FIG. 2 is a horizontal cross-sectional view of the purification device shown in FIG. 1 at a position AA.
  • the right view of the housing shown in FIG. The left side view of the housing
  • FIG. 6 is a partially enlarged vertical cross-sectional view of a housing showing an example in which a gas outlet is provided only in a second region where gas is purified by ultraviolet rays and a photocatalyst.
  • FIG. 8 is a transverse cross-sectional view of the purification device shown in FIG. 7 at a position BB.
  • FIG. 8 is a right side view of the housing shown in FIG. 7. The left side view of the housing
  • the block diagram of the purification apparatus which concerns on the 3rd Embodiment of this invention.
  • FIG. 12 is a transverse cross-sectional view of the purification device shown in FIG. 11 at position CC.
  • FIG. 12 is a right side view of the housing shown in FIG. 11.
  • casing shown in FIG. The longitudinal section surface showing the composition of the purification device concerning a 4th embodiment of the present invention.
  • Fig. 16 is a left side view of the purification device shown in Fig. 15.
  • the longitudinal section surface showing the composition of the purification device concerning a 5th embodiment of the present invention.
  • the right view of the purification apparatus shown in FIG. The figure which shows an example of the shape which looked at the partition plate shown in FIG. 17 from the lower surface direction.
  • FIG. 18 is a vertical cross-sectional surface showing a modified example of the purification device shown in FIG. 17.
  • FIG. 22 is a right side view of the purification device shown in FIG. 21.
  • FIG. 23 is a vertical cross-sectional surface showing a modification of the purification device shown in FIG. 21.
  • the longitudinal cross-sectional surface which shows the structure of the purification
  • FIG. 25 is a right side view of the purification device shown in FIG. 24.
  • FIG. 25 is a vertical cross-sectional surface showing a modified example of the purification device shown in FIG. 24. Sectional drawing for demonstrating the structure of the purification
  • FIG. 1 is a configuration diagram of a purification device according to a first embodiment of the present invention
  • FIG. 2 is a transverse cross-sectional view of the purification device shown in FIG. 1 at a position AA.
  • the purifying device 1 is a device for purifying the gas G to be purified.
  • Typical examples of the gas G to be purified are air in a space that is hermetically sealed for a long time, such as air inside a car, exhaust gas from a device equipped with a combustion engine such as a car, and volatile organic compounds (VOC: Volatile Organic Compounds).
  • VOC volatile organic compounds
  • Gas containing harmful substances such as formaldehyde, acetaldehyde or ammonia, and gas containing harmful substances such as influenza virus and bacteria.
  • Formaldehyde and acetaldehyde are considered to be the causes of sick house syndrome and chemical hypersensitivity, like VOC, and thus may be classified as VOC. Therefore, the purification device 1 is a device for removing harmful substances such as harmful substances and pathogens contained in the gas G to be purified.
  • the purification device 1 is configured by accommodating a plate-shaped member 3 whose surface is at least partially coated with a photocatalyst 2 and a lamp 4 for irradiating the photocatalyst 2 with ultraviolet rays (UV) in a cylindrical casing 5. It A flow path 6 for forming a flow of the gas G is formed inside the cylindrical casing 5.
  • the plate-shaped member 3 is arranged inside the housing 5 so that the flow of the gas G is continuously or intermittently formed along the photocatalyst 2. That is, the plate-shaped member 3 is arranged so that the surface of the plate-shaped member 3 coated with the photocatalyst 2 is on the side of the flow path 6 of the gas G. Therefore, it is preferable to arrange the plate member 3 so that the plate thickness direction of the plate member 3 is perpendicular to the traveling direction of the gas G.
  • the rectangular plate-shaped member 3 is placed on the bottom surface inside the rectangular tubular housing 5 having a rectangular cross section. Then, the upper surface side of the rectangular plate-shaped member 3 which is the inner side of the housing 5 is coated with the photocatalyst 2.
  • a part of the housing 5 may be constituted by the plate-like member 3 whose surface is at least partially coated with the photocatalyst 2. Therefore, the housing 5 has a structure in which at least a part of the surface of the gas G on the flow path 6 side is coated with the photocatalyst 2 in at least a part thereof.
  • the plate-shaped member 3 can be made of a desired material that is not porous, such as metal, ceramic, or resin. However, if the plate-shaped member 3 is made of a metal plate, it is suitable for mass production because it has good workability and is inexpensive. Titanium and aluminum are examples of metal plates that are highly practical in terms of price, processability, and availability.
  • titanium dioxide TiO 2
  • TiO 2 titanium dioxide
  • a titanium dioxide film can be formed on the surface of the metal plate by the anodic oxidation method.
  • any manufacturing method can be adopted depending on the materials of the plate member 3 and the photocatalyst 2.
  • the powder of the photocatalyst 2 may be dispersed in a solution and applied to the plate-like member 3 by spraying or painting with a brush.
  • the lamp 4 is a light source that irradiates the gas G and the photocatalyst 2 flowing into the housing 5 with ultraviolet rays.
  • the ultraviolet rays emitted from the lamp 4 are positively used not only for activating the photocatalyst 2 but also for purifying the gas G flowing into the housing 5. That is, harmful substances such as organic substances contained in the gas G can be directly or indirectly decomposed by a byproduct by irradiation of ultraviolet rays.
  • the photocatalyst 2 can be activated by irradiation with ultraviolet rays. Further, the activated photocatalyst 2 can decompose the harmful substances contained in the gas G flowing in the vicinity of the photocatalyst 2 and the harmful substances that can be secondarily generated by the irradiation of the ultraviolet rays.
  • the lamp 4 is installed at a position where it can irradiate ultraviolet rays toward both the gas G flowing into the housing 5 and the plate-shaped member 3.
  • the relative position between the lamp 4 and the plate-like member 3 is set in both the first region R1 where the gas G is purified by ultraviolet rays regardless of the photocatalyst 2 and the photocatalyst 2 activated by ultraviolet rays and ultraviolet rays.
  • the second region R2 in which the gas G is purified is determined to be formed in the single and common housing 5. Therefore, the shape of the housing 5 is also determined so that the first region R1 and the second region R2 can be formed.
  • a first region R1 in which the gas G is purified directly or indirectly by only the ultraviolet rays without depending on the photocatalyst 2 and a second region in which the gas G is purified by both the ultraviolet rays and the photocatalyst 2 activated by the ultraviolet rays.
  • R2 in the flow path 6 in the housing 5 it is necessary to irradiate ultraviolet rays with the lamp 4 even outside the range where the photocatalyst 2 can decompose harmful substances contained in the gas G. good.
  • the width of the flow path 6 formed in the housing 5 is made wider than the range in which the photocatalyst 2 can decompose the harmful substances contained in the gas G, and the photocatalyst 2 decomposes the harmful substances.
  • the ultraviolet ray may be irradiated to the outside of the range where
  • the range in which the photocatalyst 2 forming the surface layer of the plate-like member 3 can decompose harmful substances contained in the gas G changes depending on the conditions such as the photocatalyst 2 and the type of ultraviolet rays.
  • the distance from 2 is in the range of about several mm (specifically, 2 to 6 mm). Therefore, if the width of the flow path 6 and the relative position between the lamp 4 and the plate-shaped member 3 are determined so that the distance between the lamp 4 and the photocatalyst 2 is longer than several mm, the lamp 4 and the photocatalyst 2 are determined.
  • a first region R1 for purifying the gas G by only the ultraviolet rays and a second region R2 for purifying the gas G by the ultraviolet rays and the photocatalyst 2 activated by the ultraviolet rays can be formed between the two.
  • the lamp 4 is provided so that ultraviolet rays can be irradiated from above the plate-shaped member 3 toward the gas G and the plate-shaped member 3 with the flow path 6 of the gas G formed inside the housing 5 interposed therebetween. It is arranged. Further, the gas G flowing above the lamp 4 on which the plate-shaped member 3 is not arranged can also be irradiated with ultraviolet rays. Therefore, the region within a few millimeters from the surface of the photocatalyst 2 becomes the second region R2 for purifying the gas G with the ultraviolet light and the photocatalyst 2, and the other region in the housing 5 that does not become the shadow of the ultraviolet light is only the ultraviolet light. Thus, the first region R1 for purifying the gas G is formed.
  • the first region R1 in which the gas G is purified by only the ultraviolet rays and the second region R2 in which the gas G is purified by the ultraviolet rays and the photocatalyst 2 activated by the ultraviolet rays are included in the common and single housing 5.
  • the first region R1 is formed at a position separated from the photocatalyst 2 and the second region R2 is formed at a position adjacent to the photocatalyst 2 at different positions in the width direction of the flow path 6.
  • UV rays are classified into UV-A band, UV-B band and UV-C band depending on the wavelength.
  • the UV-A band, UV-B band, and UV-C band ultraviolet rays are ultraviolet rays having wavelengths of 315 nm to 400 nm, 280 nm to 315 nm, and less than 280 nm, respectively.
  • ultraviolet rays in the UV-C band have a high effect of decomposing and sterilizing organic substances.
  • ultraviolet rays in the UV-C band cause diseases and are dangerous to the human body. Therefore, the type of ultraviolet rays can be determined according to the usage environment of the purification device 1.
  • the purification ability of the gas G is prioritized over the safety
  • the purification is performed with a photocatalyst 2 that is activated by UV rays in the UV-C band and a lamp 4 that emits UV rays in the UV-C band.
  • the device 1 can be constructed.
  • the photocatalyst 2 which is activated by UV in the UV-A band or UV-B band and the UV in the UV-A band or UV-B band are used.
  • the purifying device 1 can be configured with the lamp 4 for irradiation.
  • a configuration may be used in which one or more lamps 4 for irradiating UV rays in the UV-A band, UV-B band, and UV-C band are used in one housing 5.
  • a lamp 4 for irradiating ultraviolet rays in the UV-C band which is highly effective in decomposing and sterilizing organic substances, is arranged near the entrance of the gas G, and near the exit of the gas G, there are UC-A band and UV-B band UV lamps.
  • a configuration in which at least one of the lamps 4 for irradiating ultraviolet rays is arranged can be exemplified.
  • the plate-shaped member 3 is made of a metal plate, deterioration due to irradiation of ultraviolet rays can be reduced as compared with the case where it is made of another material. Therefore, from the viewpoint of reducing the deterioration of the plate-shaped member 3, it is preferable to configure the plate-shaped member 3 with a metal plate.
  • UV LED germicidal lamp
  • black light semiconductor laser
  • mercury lamp mercury lamp
  • xenon lamp metal halide lamp
  • metal halide lamp can be used as long as it can irradiate ultraviolet rays having a wavelength and illuminance determined according to the required purification ability of the gas G.
  • Any lamp 4 such as a halogen lamp or a cold cathode discharge tube can be used.
  • the inflow port 8A can be provided in the plate member 7A.
  • the inflow port 8A of the gas G may be locally provided in the plate-shaped member 7A so as to be in the vicinity of the photocatalyst 2 so that the gas G flowing into the housing 5 is guided to the vicinity of the photocatalyst 2.
  • FIG. 3 is a right side view of the housing 5 shown in FIG. 1
  • FIG. 4 is a left side view of the housing 5 shown in FIG.
  • a slit having a length corresponding to the width of the plate-shaped member 3 is gas.
  • the G inflow port 8A can be locally provided in the plate member 7A so as to be in the vicinity of the photocatalyst 2. As a result, the gas G flowing into the housing 5 can be guided as close to the surface of the plate-shaped member 3 coated with the photocatalyst 2 as possible.
  • a slit having a length corresponding to the width of the plate member 3 is locally provided on the plate member 7B as a discharge port 8B of the gas G so as to be in the vicinity of the photocatalyst 2. be able to.
  • the gas G containing the gas G purified by the photocatalyst 2 as much as possible can be selectively discharged from the flow path 6 as the gas G after purification.
  • the position of the discharge port 8 is determined so that a straight line passing through the surface of the photocatalyst 2 and parallel to the discharge direction of the gas G passes through the inner surface of the discharge port 8B.
  • the position of the discharge port 8 may be determined so that a straight line passing through the surface of the photocatalyst 2 and parallel to the discharge direction of the gas G passes through the discharge port 8B.
  • the amount of the gas G purified by the photocatalyst 2 contained in the gas G after purification discharged from the outlet 8B can be adjusted by the size of the outlet 8B.
  • FIG. 5 is a partially enlarged vertical cross-sectional view of the housing 5 showing an example in which the gas G discharge port 8B is provided only in the second region R2 where the gas G is purified by the ultraviolet rays and the photocatalyst 2.
  • the gas G is purified by the photocatalyst 2.
  • the discharge port 8B for the gas G can be connected only to the region R2. In this case, only the gas G purified by the photocatalyst 2 can be selectively discharged from the discharge port 8B of the housing 5. Therefore, the purification performance can be improved.
  • FIG. 6 shows a partial region of the gas G extending over the first region R1 where the gas G is purified by ultraviolet rays regardless of the photocatalyst 2 and the second region R2 where the gas G is purified by the ultraviolet rays and the photocatalyst 2.
  • FIG. 6 is a partially enlarged vertical cross-sectional view of the housing 5 showing an example in which a discharge port 8B is provided.
  • the width B of the discharge port 8B in the direction perpendicular to the surface of the photocatalyst 2 is made larger than a few mm so that the first region R1 in the flow path 6 formed in the housing 5 is
  • the discharge port 8B for the gas G may be provided in a part of the region extending over the second region R2.
  • the gas G discharged from the discharge port 8B of the housing 5 includes not only the gas G purified by the photocatalyst 2 in the second region R2 but also the gas G discharged from the first region R1.
  • the cross-sectional area of the discharge port 8B provided in a part of the first region R1 and the second region R2 is limited to the second region R2 as shown in FIG. It can be made larger than the cross-sectional area of the discharge port 8B provided. Therefore, if the gas G discharge port 8B is formed in a part of the region extending over the first region R1 and the second region R2, the gas G discharge port 8B is formed only in the second region R2. In comparison with the above, the flow rate of the gas G discharged from the discharge port 8B of the housing 5 can be increased.
  • a narrowed gas G discharge port 8B is formed in a part of the region extending over the first region R1 and the second region R2, the end portion of the housing 5 is formed into a plate.
  • the proportion of the gas G purified by the photocatalyst 2 in the second region R2, which is contained in the gas G discharged from the discharge port 8B, is dramatically increased as compared with the case where the opening end is not closed by the shape member 7B. Can be increased.
  • the discharge port 8B is locally formed in a region extending over the first region R1 and the second region R2, or only in the second region R2 as shown in FIG. Regardless of whether the discharge port 8B is locally formed, if the discharge port 8B of the housing 5 is locally formed near the photocatalyst 2, the gas G discharged from the second region R2 is discharged from the discharge port 8B. It can be included in the discharged gas G after purification.
  • the width B of the discharge port 8B in the direction perpendicular to the surface of the photocatalyst 2 is 6 mm or less, the gas G discharged from the second region R2 should be included in the gas G after purification in a significant amount. Therefore, it was confirmed that the purification effect by the photocatalyst 2 and ultraviolet rays can be obtained. Therefore, the width of the flow path 6 formed in the housing 5 is made larger than the width of the discharge port 8B for discharging the gas G from the housing 5, and the width B in the direction perpendicular to the surface of the photocatalyst 2 is set. If the discharge port 8B is formed in the vicinity of the photocatalyst 2 so as to have a length of 6 mm or less, the gas G can be purified by the purification effect of the photocatalyst 2 and ultraviolet rays.
  • the width B of the discharge port 8B in the direction perpendicular to the surface of the photocatalyst 2 is 3 mm or less, the gas G discharged from the second region R2 can be included in the gas G after purification in a predominant ratio. Therefore, it was also confirmed that the purification performance can be further improved.
  • the width B of the outlet 8B in the direction perpendicular to the surface of the photocatalyst 2 is set to 2 mm or more and 6 mm or less, and when purifying the purifying performance further, the surface of the photocatalyst 2 is It is considered appropriate that the width B of the discharge port 8B in the direction perpendicular to is 2 mm or more and 3 mm or less.
  • the decomposition performance of harmful substances can be improved as compared with the case where the shape of the discharge port 8B is a circular through hole.
  • the shape of the discharge port 8B is a slit, a larger amount of the gas G flowing near the surface of the photocatalyst 2 can be discharged from the discharge port 8B, and the photocatalyst 2 and the gas G are formed, compared with the case where the shape is a circular through hole. It is considered that this is because it is possible to form a more preferable flow of the gas G from the viewpoint of ensuring the contact opportunity.
  • the shape of the discharge port 8B is a slit.
  • the discharge port 8B having an arbitrary shape is formed in the housing 5 according to the use environment and the purpose of use of the purification device 1. You can
  • the exhaust port 8B of the housing 5 is formed in the vicinity of the photocatalyst 2, the effect that the residence time of the gas G in the housing 5 can be lengthened is also obtained. That is, if the exhaust port 8B of the housing 5 is formed in the vicinity of the photocatalyst 2, part of the gas G that has flowed into the housing 5 is in the vicinity of the photocatalyst 2 unless the flow of the gas G in the housing 5 is a laminar flow. Part of the gas G that has flowed continuously or intermittently in the flow path 6 toward the discharge port 8B is discharged from the housing 5, while flowing in the flow path 6 toward the discharge port 8B. The remaining part of the gas G and the gas G that did not flow toward the discharge port 8B remain in the housing 5.
  • the flow of the gas G becomes a laminar flow when the discharge port 8B is narrowed, but even when the flow of the gas G is a laminar flow, the flow path in the housing 5 is small. Since the cross-sectional area of 6 is larger than the cross-sectional area of the discharge port 8B, the flow in the case 5 is smaller than that in the case where the cross-sectional area of the flow path 6 in the case 5 is the same as the cross-sectional area of the discharge port 8B. The flow velocity of the gas G flowing through the passage 6 decreases.
  • the discharge port 8B of the housing 5 is locally formed in the vicinity of the photocatalyst 2, not only the gas G discharged from the second region R can be included in the gas G after purification, but also the housing 5 It is also possible to obtain the effect of guiding the gas G flowing into the first region R1. Then, harmful substances can be decomposed by ultraviolet rays in the first region R1.
  • the amount of harmful substances decomposed by ultraviolet rays temporally and spatially can be reduced. That is, the amount of harmful substances to be divided by the photocatalyst 2 per unit time can be kept within the range of the purifying ability determined by the type and surface area of the photocatalyst 2.
  • the outlet 8B of the housing 5 has a surface continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5).
  • the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
  • the gas G inlet 8A is provided at one end of the casing 5 and the gas G outlet 8B is provided at the other end, the inlet 8A and the outlet 8B are on a straight line parallel to the axial direction of the casing 5. Are preferably formed.
  • each of the inflow port 8A and the exhaust port 8B of the housing 5 has a surface continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5). Moreover, it is preferable that the photocatalyst 2 is continuously formed between the inflow port 8A and the exhaust port 8B of the housing 5 without interruption. This makes it possible to make the flow of the gas G passing through the second region R2 a laminar flow, and further to secure a chance of contact between the photocatalyst 2 and the gas G.
  • the decomposition amount of the harmful substances by the photocatalyst 2 can be kept within the allowable range. .. Further, even if a harmful substance adheres to the surface of the photocatalyst 2, it can be limited to such an amount that it can be decomposed by ultraviolet rays. As a result, even if the amount of harmful substances to be decomposed per unit time is large, such as when the flow rate of the gas G is high or the concentration of harmful substances contained in the gas G is high, the purification of the photocatalyst 2 is performed. It is possible to fully exert the ability and decompose harmful substances contained in the gas G.
  • the gas G flowing near the photocatalyst 2 is preferentially discharged from the discharge port 8B of the housing 5. Therefore, the gas G in which harmful substances are decomposed by both the ultraviolet rays and the photocatalyst 2 can be preferentially discharged from the discharge port 8B of the housing 5.
  • the gas G inflow port 8A is locally located so as to be always near the photocatalyst 2. Need not be placed in
  • the gas G that has flowed into the housing 5 is guided to both the first region R1 and the second region R2 and finally flows to the vicinity of the photocatalyst 2 while being exposed to ultraviolet rays, and flows near the photocatalyst 2. It is essential to form an inlet 8A and an outlet 8B for the gas G in the housing 5 so that the gas G is preferentially discharged from the housing 5. Therefore, the discharge port 8B of the gas G is narrowed to the vicinity of the photocatalyst 2 as described above.
  • the inflow port 8A for the gas G is shielded by the first shielding portion 9A having a box structure having a rectangular cross section.
  • the outlet 8B for the gas G is shielded by the second shield 9B having a box structure with a rectangular cross section.
  • UV-C band ultraviolet rays it is possible to reliably avoid a situation in which the user is exposed to UV-C band ultraviolet rays.
  • the first shielding portion 9A and the second shielding portion 9B are shielded by the first shielding portion 9A and the second shielding portion 9B, respectively.
  • the first shielding portion It is necessary to form the inflow port 10A for the gas G in 9A and the exhaust port 10B for the gas G in the second shielding portion 9B.
  • the inlet 10A for the gas G to the first shielding portion 9A is formed at a position where there is no leakage of ultraviolet rays to the outside and the gas G to be purified can be efficiently taken in from the purification target area. Is appropriate.
  • the outlet 10B for the gas G from the second shield 9B is located at a position where there is no leakage of ultraviolet rays to the outside and the gas G after purification can be efficiently supplied to the purification target area. It is suitable to form.
  • an inlet 10A for the gas G is formed on the side surface of the first shield 9A, while an outlet 10B for the gas G is formed on the side surface of the second shield 9B.
  • a fan (blower) 11 can be provided inside.
  • the fan 11 is arranged inside the first shielding portion 9A on the intake side of the gas G.
  • the fan 11 may be arranged inside the second shield 9B that is on the discharge side of the gas G, or the fan 11 may be arranged on both the first shield 9A and the second shield 9B. good.
  • At least one of the first shielding unit 9A and the second shielding unit 9B can also be used as a casing of circuits necessary for driving the purification device 1.
  • the inverter board 12 for converting the DC current supplied from the DC power supply into the AC current and supplying the AC current to the lamp 4, and the switch board 13 for adjusting the strength of the fan 11 are the second shield part. It is stored inside 9B.
  • an adjustment switch for adjusting the strength of the fan 11 is provided outside the end surface of the second shielding unit 9B. 15 are provided.
  • the rotation speed of the fan 11 is increased to increase the intake flow rate of the gas G, while the vibration and noise of the fan 11 are reduced. If desired, it is possible to make an adjustment such as reducing the rotation speed of the fan 11.
  • the purification capability of the gas G by the purification device 1 changes depending on conditions such as the ability of the photocatalyst 2 to decompose harmful substances, the wavelength and illuminance of ultraviolet rays, and the residence time of the gas G in the housing 5 as described above. Therefore, it is appropriate to set the flow rate of the gas G to an appropriate flow rate in accordance with the purification capability of the gas G by the purification device 1 and the concentration of harmful substances contained in the gas G. That is, the flow rate of the gas G can be increased as the photocatalyst 2 and the ultraviolet ray purification capability are high and the residence time of the gas G in the housing 5 is long.
  • the type and surface area of the photocatalyst 2, the wavelength and illuminance of ultraviolet rays, and the inflow port 8A and the exhaust port 10B of the gas G are sufficiently decomposed so that a harmful substance having a predetermined concentration contained in the gas G having a desired flow rate can be sufficiently decomposed. It is important to determine the shape of the housing 5 including the position, size and shape of the.
  • the purification device 1 as described above purifies the gas G by only ultraviolet rays as the first step in the first region R1 formed in the housing 5, while the second region R2 formed in the housing 5 is used.
  • the gas G is purified by the action of both the photocatalyst 2 activated by the ultraviolet ray and the ultraviolet ray, and the gas G purified by the action of both the photocatalyst 2 and the ultraviolet ray is selectively or It is designed to be discharged preferentially.
  • FIG. 7 is a configuration diagram of a purifying device according to a second embodiment of the present invention
  • FIG. 8 is a cross-sectional view of the purifying device shown in FIG. 7 at a position BB.
  • a plurality of plate-shaped members 3 coated with the photocatalyst 2 are arranged in a housing 5, and a UV light is emitted to each plate-shaped member 3 by a common lamp 4.
  • a common lamp 4 Is different from the purification device 1 in the first embodiment.
  • the other configurations and operations of the purifying device 1A in the second embodiment are substantially the same as those of the purifying device 1 in the first embodiment, and therefore, the same or corresponding configurations will be denoted by the same reference numerals and will not be described. Omit it.
  • each plate-like member 3 can be arranged in a casing 5 having a rectangular cross section. That is, the plate-shaped member 3 can be fixed to each surface in the housing 5.
  • the rod-shaped lamp 4 is arranged in the center of the cylindrical casing 5, the photocatalyst 2 coating each plate-like member 3 with one lamp 4 can be irradiated with ultraviolet rays.
  • the shape of the cross section of the housing 5 is not limited to a rectangle, but it may be a polygon or a shape drawn by a closed line connecting a curved line and a straight line.
  • the flow path 6 for the gas G is formed inside the housing 5 having a tubular cross section, and an arbitrary number of plate-shaped members 3 whose surfaces are coated with the photocatalyst 2 are arranged to form a tubular shape.
  • the rod-shaped lamp 4 can be arranged inside the housing 5.
  • FIG. 9 is a right side view of the housing 5 shown in FIG. 7, and FIG. 10 is a left side view of the housing 5 shown in FIG.
  • the gas G inflow port 8A and the gas G discharge port 8B are respectively set in accordance with the number and position of the plate members 3. It is suitable to provide the member 7A and the plate member 7B. Specifically, as shown in FIG. 9, a plurality of slits each having a length corresponding to the width of each plate-shaped member 3 are used as the inflow port 8A of the gas G, and the plate-shaped member 7A is located near the photocatalyst 2. Can be provided. Similarly, as shown in FIG.
  • a plurality of slits having a length corresponding to the width of each plate-shaped member 3 are provided on the plate-shaped member 7B so as to be in the vicinity of the photocatalyst 2 as the discharge port 8B of the gas G. be able to.
  • the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5).
  • the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
  • the gas G is guided to the vicinity of the surface of the plate-like member 3 coated with the photocatalyst 2 in the housing 5, while the gas G flowing near the photocatalyst 2 is selectively or preferentially discharged from the housing 5.
  • the common and single housing 5 can be provided as in the first embodiment.
  • a first region R1 for decomposing harmful substances by ultraviolet rays and a second region R2 for decomposing harmful substances by the action of both the photocatalyst 2 activated by ultraviolet rays and ultraviolet rays are respectively provided in Can be formed at different positions.
  • the area where the harmful substances can be decomposed by the action of the activated photocatalyst 2 is within a certain range from the surface of the photocatalyst 2 exposed to ultraviolet rays. Therefore, when the plate member 3 is fixed to each surface of the housing 5 as illustrated in FIGS. 8 to 10, the second region R2 is a substantially cylindrical region.
  • the first region R1 that decomposes harmful substances only by the ultraviolet rays is also a substantially cylindrical region. That is, the cylindrical first region R1 is formed inside the lamp 4, and the cylindrical second region R2 is formed outside the first region R1. Further, the four corner regions where ultraviolet rays reach but the reaction by the activated photocatalyst 2 does not sufficiently occur can function as the first region R1 that decomposes harmful substances only by ultraviolet rays.
  • each discharge port 8 is determined such that a straight line passing through the surface of each photocatalyst 2 and parallel to each discharge direction of the gas G passes through the inner surface of each discharge port 8B.
  • a straight line that passes through the surface of the photocatalyst 2 and that is parallel to each discharge direction of the gas G passes through each discharge port 8B it can be made to be near the photocatalyst 2.
  • the surface area of the photocatalyst 2 can be increased as compared with the first embodiment. Therefore, the volume of the gas G that can be purified per unit time can be increased.
  • FIG. 11 is a configuration diagram of a purifying device according to a third embodiment of the present invention
  • FIG. 12 is a transverse cross-sectional view of the purifying device shown in FIG. 11 at a position CC.
  • the plate-shaped member 3 is formed in a tubular shape, and the inner surface of the plate-shaped member 3 is coated with the photocatalyst 2.
  • the purification device according to the first embodiment Different from 1.
  • the other configurations and operations of the purifying device 1B in the third embodiment are substantially the same as those of the purifying device 1 in the first embodiment, and therefore, the same or corresponding components are designated by the same reference numerals and described. Omit it.
  • the inside of the plate-shaped member 3 formed in the tubular shape is used as the flow path 6 for the gas G.
  • the shape of the cross section of the plate-like member 3 may be a rectangular tube shape such as a square tube shape or a hexagonal tube shape, but it is efficient to make ultraviolet rays effective as a cylindrical shape as illustrated in FIGS. 11 and 12. It is preferable from the viewpoint of irradiation to That is, if the plate-shaped member 3 is formed in a cylindrical shape and the rod-shaped lamp 4 is arranged at the center position inside the cylindrical plate-shaped member 3, each part of the photocatalyst 2 can be uniformly irradiated with ultraviolet rays. .. Further, it becomes easy to utilize the reflected light of the ultraviolet ray again for purifying the gas G and activating the photocatalyst 2.
  • FIG. 13 is a right side view of the housing 5 shown in FIG. 11, and FIG. 14 is a left side view of the housing 5 shown in FIG.
  • the plate-shaped member 3 When the plate-shaped member 3 is formed in a cylindrical shape, it is reasonable to form the housing 5 in a cylindrical shape from the viewpoint of facilitating the installation of the plate-shaped member 3.
  • the plate-shaped member 7A and the plate-shaped member 7B that support the rod-shaped lamp 4 at both ends and close both ends of the housing 5 have a disk shape.
  • the position, shape and number of the gas G inlet 8A to be formed in the plate member 7A and the gas G outlet 8B to be formed in the plate member 7B are the same as those in the first and second embodiments.
  • the gas G flowing into the passage 6 is guided to the vicinity of the photocatalyst 2, while the gas G flowing near the photocatalyst 2 is selectively or preferentially discharged from the housing 5, and the gas G remains in the housing 5. It is appropriate to decide that the time will be long.
  • the gas G may be guided to the vicinity of the photocatalyst 2 in a direction parallel to the surface of the photocatalyst 2.
  • the gas G may be discharged from the housing 5 in the vicinity of the photocatalyst 2.
  • the flow path 6 of the gas G formed in the housing 5 and the plate-shaped member 3 is larger than the cross-sectional area of the discharge port 8B of the gas G. The cross-sectional area should be increased.
  • a plurality of circular through holes arranged on the same circle are locally formed at the position of the plate-shaped member 7A in the vicinity of the photocatalyst 2 as the gas G inlet 8A. be able to.
  • a plurality of circular through holes arranged on the same circle are locally formed at the position of the plate member 7B in the vicinity of the photocatalyst 2 as the discharge port 8B of the gas G. can do.
  • a plurality of elliptical through holes or slits curved in an arc shape may be formed on the same circle.
  • the first region R1 in which the substance is decomposed is formed as a cylindrical region adjacent to the lamp 4, and the second region R2 in which the harmful substance is decomposed by the action of the ultraviolet ray and the activated photocatalyst 2 is the first region R1. It is formed as a tubular region outside the region R1 and adjacent to the photocatalyst 2. Therefore, if the photocatalyst 2 has a cylindrical shape, the gas G discharge port 8B is provided in the annular area of the plate member 7B so that the gas G is selectively or preferentially discharged from the cylindrical second area R2. Will be formed.
  • the structure of the first shielding portion 9A and the second shielding portion 9B for preventing leakage of ultraviolet rays can also be a cylindrical box structure. Therefore, the inflow port 10A and the exhaust port 10B for the gas G can be formed on the curved side surfaces of the first shielding unit 9A and the second shielding unit 9B, respectively. In the example shown in FIG. 11, a plurality of circular through holes arranged on the same circle are provided as the gas G inlet 10A and the gas outlet 10B.
  • the photocatalyst 2 can be efficiently irradiated with ultraviolet rays if the plate-shaped member 3 is formed in a cylindrical shape. It will be possible. Therefore, the volume of the gas G that can be purified per unit time can be further increased.
  • the inner surface of the cylindrical plate-like member 3 is covered with the photocatalyst 2 which is obtained by mixing silica oxide and titanium dioxide so that the weight of titanium dioxide is 2 times or more and 5 times or less the weight of silica oxide.
  • a prototype of the purifying device 1B which is formed and irradiates the inner surface of the cylindrical photocatalyst 2 with ultraviolet rays in the UV-C band, was manufactured.
  • two types of purifying devices 1B were prototyped by changing the size and shape of the outlet 8B, and the outlet 8B of one of the purifying devices 1B had a circular through hole with a diameter of 5 mm as illustrated in FIG. It is assumed that they are arranged on the same circle, and the discharge port 8B of the other purification device 1B is an arcuate slit having a width of 3 mm.
  • the gas G is purified at a practical level by performing primary purification by ultraviolet rays and squeezing the discharged gas G near the photocatalyst 2. It was confirmed that it was possible.
  • the decomposing performance of the purifying device 1B having an arc-shaped slit having a width of 3 mm as the discharge port 8B is further improved as compared with the decomposing performance of the purifying device 1B having a circular through hole as the discharge port 8B. It was confirmed that each of them could be decomposed and removed in about 30 minutes. It was also confirmed that the influenza virus could be rendered harmless in 20 minutes by using the purifying device 1B in which the discharge opening 8B was an arc-shaped slit having a width of 3 mm.
  • the housing 5 can be configured by the plate-shaped member 3 as described in the first embodiment.
  • the thickness of the plate member 3 in order to secure the strength of the housing 5, it is necessary to make the thickness of the plate member 3 sufficient.
  • the titanium plate that is a candidate for the material forming the plate-shaped member 3 has high strength, and the thicker the plate, the more difficult the forming process becomes.
  • the casing 5 that bears the strength is made of a material such as aluminum which is easy to form even if the plate thickness is made thick, while it is made thin when an expensive titanium plate is used as the plate-shaped member 3. If you can bend it easily, it will lead to effective use of the material.
  • FIG. 15 is a vertical cross-sectional view showing the configuration of the purification device according to the fourth embodiment of the present invention
  • FIG. 16 is a left side view of the purification device shown in FIG.
  • the second region R2 in which harmful substances are decomposed by both actions is located at different positions in the longitudinal direction of the flow path 6 so that the first region R1 is on the upstream side and the second region R2 is on the downstream side.
  • the formed points are different from the purification devices 1, 1A, and 1B in the first to third embodiments described above.
  • the first region R1 in which harmful substances are directly or indirectly decomposed only by ultraviolet rays is changed to the second region R2 in which harmful substances are decomposed by the photocatalyst 2 activated by ultraviolet rays. It can also be provided upstream. That is, the first flow path 6A forms the first region R1 while the second flow path 6B forms the second region R2, and the second flow path is provided downstream of the first flow path 6A. 6B can be placed. Also in this case, it is preferable that the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5).
  • the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
  • the first flow path 6A forming the first region R1 and the second flow path 6B forming the second region R2 may be formed in separate housings. Therefore, a plurality of lamps 4 may be arranged in the length direction of the flow path 6.
  • the distance between the photocatalyst 2 and the lamp 4 is determined within a few mm so that the distance is equal to or less than the reaction area of the photocatalyst 2. It is possible to form the discharge port 8B serving as an outlet without throttling. That is, even if the ring-shaped opening end of the casing 5 is used as the discharge port 8B as it is, only the gas G flowing in the vicinity of the photocatalyst 2 can be discharged.
  • the photocatalyst 2 has a cylindrical shape.
  • the photocatalyst 2 has a cylindrical shape whose cross section is not circular, or a single or a plurality of flat plates, the vicinity of the photocatalyst 2 is necessary.
  • the discharge port 8B may be formed only in the above. That is, the first region R1 can be formed not only at a position different from the second region R2 in the length direction of the flow channel 6 but also at a position different from the second region R2 in the width direction of the flow channel 6. In other words, not only the first region R1 is formed in the first channel 6A, but both the first region R1 and the second region R2 are formed in the second channel 6B. good.
  • the gas G flowing into the inflow port 8A of the housing 5 flows through the first flow channel 6A forming the first region R1 and the photocatalyst. After being exposed to the ultraviolet rays without coming into contact with 2, it flows into the second flow path 6B forming the second region R2, flows near the photocatalyst 2, and is discharged from the discharge port 8B.
  • the fourth embodiment it is possible to obtain the same effects as those of the first to third embodiments described above depending on the arrangement method of the photocatalyst 2. Further, the width of the housing 5 can be reduced, and the structure of the housing 5 can be simplified.
  • FIG. 17 is a vertical cross-sectional view showing the configuration of the purification device according to the fifth embodiment of the present invention
  • FIG. 18 is a right side view of the purification device shown in FIG.
  • the purifying apparatus 1D by arranging the partition plate 20 in the single housing 5, the first region R1 is provided in the single housing 5.
  • the purification device 1C in the fourth embodiment described above is different in that the first flow path 6A to be formed and the second flow path 6B to form the second region R2 are formed.
  • Other configurations and operations of the purifying device 1D in the fifth embodiment are substantially the same as those of the purifying device 1C in the fourth embodiment, and therefore only the configuration inside the housing 5 is shown, and the same or corresponding configuration is shown. The same symbols are attached to the configuration and the description thereof is omitted.
  • a partition plate 20 partially divides a space formed in the single housing 5 to form a first region R1 in the single housing 5. It is possible to form the first flow path 6A that forms the second flow path 6B and the second flow path 6B that forms the second region R2. More specifically, the lamp 4 can be arranged in the space on the upstream side partitioned by the partition plate 20, and the plate-shaped member 3 coated with the photocatalyst 2 can be arranged in the space on the downstream side.
  • the partition plate 20 is arranged between the lamp 4 and the photocatalyst 2 so that the distance between the partition plate 20 and the photocatalyst 2 is equal to or less than the distance at which the photocatalyst 2 can decompose harmful substances. be able to.
  • the partition plate 20 can be made of a known material such as a polymer compound that transmits ultraviolet rays.
  • the gas G is purified only by the ultraviolet rays in the upstream first flow channel 6A partitioned by the partition plate 20, the ultraviolet ray that passes through the partition plate 20 and the partition plate in the downstream second flow channel 6B.
  • the gas G can be purified by both of the photocatalysts 2 activated by the ultraviolet rays passing through 20.
  • the surface of the partition plate 20 may be provided with a coating layer for preventing dirt. As a result, the partition plate 20 is less likely to get dirty and maintenance is reduced.
  • the material of the coating layer is not limited, but a photocatalyst that is thin enough to transmit ultraviolet rays can be used.
  • the first flow channel 6A forming the first region R1 and the second flow channel 6B forming the second region R2 are formed in different directions on both sides sandwiching the partition plate 20. To be done. Then, the gas G flows from the first flow path 6A to the second flow path 6B while changing the flow direction in a portion not partitioned by the partition plate 20. Also in this case, it is preferable that the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5).
  • the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
  • the gas G that has passed through the first flow path 6A is the first flow path.
  • the direction of the flow is changed at the end of the partition plate 20 forming the outlet of 6A, and typically flows in the second flow path 6B while making a U-turn.
  • FIG. 19 is a diagram showing an example of the shape of the partition plate 20 shown in FIG. 17 as seen from the lower surface direction.
  • the shape of the tip of the partition plate 20 can be zigzag. This allows the gas G to flow into the second flow path 6B while changing the flow direction of the gas G at different positions in the width direction and the length direction of the partition plate 20. That is, it is possible to prevent the gas G from making a U-turn at a position on the same straight line.
  • the size of the partition plate 20 and the length in the flow direction can be optimized according to conditions such as the type of the photocatalyst 2, the type of the lamp 4, the illuminance and the flow velocity of the gas G. ..
  • FIG. 20 is a vertical cross-sectional view showing a modified example of the purification device 1D shown in FIG.
  • a pipe for flowing the gas G into the gas G inlet 8A formed in the plate-shaped member 7A as illustrated in FIG. By connecting 21 to each other, the gas G can be guided to the upstream side of the first flow path 6A.
  • the number and size of the gas inlet 8A and the pipes 21 can be arbitrarily determined according to the flow rate of the gas G to be introduced into the housing 5.
  • the gas G can flow in and out from the same direction of the housing 5, as shown in FIG. 20, the flow of the gas G to the plate-shaped member 7B forming the gas G outlet 8B.
  • the inlet 8A As well, the gas G can flow into the upstream side of the first flow path 6A.
  • the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5).
  • the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
  • the first region R1 and the second region R2 can be formed in series according to the standardized length of the lamp 4.
  • the first region R1 and the second region R2 are formed at different positions in the width direction of the channel 6 formed in the housing 5, and the first region R1 and the second region R2 are formed. It can also be said that the partition plate 20 physically separates it from the region R2.
  • FIG. 21 is a vertical cross-sectional view showing the configuration of the purification device according to the sixth embodiment of the present invention
  • FIG. 22 is a right side view of the purification device shown in FIG. 21
  • FIG. 23 is a modification of the purification device shown in FIG. It is a longitudinal section surface shown.
  • a plurality of plate-shaped members 3 coated with the photocatalyst 2 are arranged in the housing 5, and the common lamp 4 serves as each plate-shaped member. 3 is different from the purification device 1D in the fifth embodiment in that ultraviolet rays can be irradiated.
  • the other configurations and operations of the purifying device 1E in the sixth embodiment are substantially the same as those of the purifying device 1D in the fifth embodiment, so only the configuration inside the housing 5 is shown, and the same or corresponding configurations are shown. The same symbols are attached to the configuration and the description thereof is omitted.
  • the lamp 4 is surrounded by the cylindrical partition plate 20 so that the distance between the partition plate 20 and the photocatalyst 2 is equal to or less than the distance at which the photocatalyst 2 can decompose harmful substances.
  • the four plate-shaped members 3 coated with the photocatalyst 2 have gaps so that the gas G always passes near the photocatalyst 2 outside the cylindrical partition plate 20. It is laid out to have a tubular structure so that
  • the end portion of the partition plate 20 serving as the outlet of the first flow path 6A can be provided with unevenness as illustrated in FIG. In that case, the gas G can be prevented from making a U-turn at a position on the same plane, so that the contamination of the photocatalyst 2 by harmful substances can be dispersed.
  • a pipe 21 for flowing the gas G is connected to an inlet 8A of the gas G formed in the plate member 7A.
  • G can be guided to the upstream side of the first flow path 6A.
  • the gas G inflow port 8A is formed in the plate member 7B forming the gas G exhaust port 8B.
  • the gas G can be made to flow into the upstream side of the first flow path 6A.
  • the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5).
  • the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
  • the surface area of the photocatalyst 2 can be increased as compared with the fifth embodiment. Therefore, the volume of the gas G that can be purified per unit time can be increased.
  • FIG. 24 is a vertical cross-sectional view showing the configuration of the purification device according to the seventh embodiment of the present invention
  • FIG. 25 is a right side view of the purification device shown in FIG. 24
  • FIG. 26 is a modification of the purification device shown in FIG. It is a longitudinal section surface shown.
  • the plate-shaped member 3 is formed in a tubular shape, and the inner surface of the plate-shaped member 3 is coated with the photocatalyst 2 in the fifth embodiment.
  • the purifying device 1D is substantially the same as those of the purifying device 1D in the fifth embodiment, and therefore only the configuration inside the housing 5 is shown, and the same or corresponding configuration is shown. The same symbols are attached to the configuration and the description thereof is omitted.
  • the partition plate 20 that transmits ultraviolet rays should be arranged.
  • the first flow path 6A forming the first region R1 and the second flow path 6B forming the second region R2 can be formed in the single housing 5.
  • the lamp 4 is surrounded by the cylindrical partition plate 20 so that the distance between the partition plate 20 and the photocatalyst 2 is equal to or less than the distance at which the photocatalyst 2 can decompose harmful substances.
  • the plate-shaped member 3 coated with the photocatalyst 2 has a cylindrical shape. Therefore, a plurality of arcs are formed so that the gas G is discharged from the second flow path 6B having a circular cross section formed so that the gas G passes near the photocatalyst 2 forming the inner surface of the cylinder. Is provided in the plate-shaped member 7B forming the end surface of the housing 5 as a gas G outlet 8B.
  • the end portion of the partition plate 20 which is the outlet of the first flow path 6A is provided with unevenness as illustrated in FIG. Can be provided.
  • the gas G can be prevented from making a U-turn at a position on the same circle or on the same plane, so that the contamination of the photocatalyst 2 by the harmful substances can be dispersed.
  • a pipe 21 for flowing the gas G is connected to an inlet 8A of the gas G formed in the plate member 7A.
  • G can be guided to the upstream side of the first flow path 6A.
  • the gas G inflow port 8A is formed in the plate member 7B forming the gas G exhaust port 8B.
  • the gas G can be made to flow into the upstream side of the first flow path 6A.
  • the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5).
  • the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
  • the seventh embodiment not only the surface area of the photocatalyst 2 can be increased as compared with the fifth embodiment, but also if the plate-shaped member 3 is formed in a cylindrical shape, ultraviolet rays can be efficiently emitted. It becomes possible to irradiate the photocatalyst 2 selectively. Therefore, the volume of the gas G that can be purified per unit time can be further increased.
  • FIG. 27 is a sectional view for explaining the configuration of the purification device according to the eighth embodiment of the present invention.
  • the unevenness 30 is provided on at least a part of the wall surface of the flow path 6, and the purification devices 1, 1A, 1B, 1C in the other embodiments. Different from 1D, 1E, and 1F. Since the other configurations and operations of the purifying device 1G in the eighth embodiment are substantially the same as those of the purifying devices 1, 1A, 1B, 1C, 1D, 1E, 1F in the other embodiments, the unevenness 30 is provided. Only the wall surface of the flow path 6 is shown, and the same or corresponding components are designated by the same reference numerals and the description thereof is omitted.
  • the surface of the flow path 6 can be provided with irregularities 30 for generating at least one of turbulent flow and swirl flow in the gas G flowing in the vicinity of the photocatalyst 2.
  • irregularities 30 for generating at least one of turbulent flow and swirl flow in the gas G flowing in the vicinity of the photocatalyst 2.
  • the unevenness 30 may be provided on the plate-like member 3 coated with the photocatalyst 2, or may be provided on the surface of the partition plate 20 or the inner surface of the housing 5.
  • the unevenness 30 is provided on the plate member 3, the photocatalyst 2 itself has the unevenness 30. Therefore, the smooth unevenness 30 may be formed so that harmful substances are not locally deposited on the photocatalyst 2.
  • the unevenness 30 is provided on the surface other than the photocatalyst 2, the unevenness 30 having various shapes is provided at an appropriate position so that preferable turbulent flow or swirl flow is easily generated in the gas G flowing in the vicinity of the photocatalyst 2.
  • FIG. 27 shows an example in which the concavities and convexities 30 are formed on the inner surface of the housing 5 in which harmful substances are not likely to accumulate.
  • the eighth embodiment it is possible to improve the chance of the gas G coming into contact with the photocatalyst 2 as compared with the other embodiments. Therefore, the volume of the gas G that can be purified per unit time can be further increased.
  • the second region R2 purified by the photocatalyst 2 can be expanded to a maximum of 40 mm, and further to a maximum of 50 mm, the width of the discharge port 8B can be increased and the flow rate of the gas G can be increased. It is possible to improve the purification efficiency.
  • the size of the second region R2 depends on the flow and flow rate of the turbulent and swirling gas. This embodiment can be applied to other embodiments.

Abstract

A purification device according to the present invention is provided with: a housing that forms a flow path for gas to be purified and has, on at least a portion thereof, a plate-like member in which at least the flow path-side portion of a surface is coated with a photocatalyst; and a light source that purifies the gas having flowed into the housing and emits an ultraviolet ray for activating the photocatalyst, wherein there are formed, in the housing, a first region for purifying the gas with the ultraviolet ray without depending on the photocatalyst and a second region for purifying the gas with the ultraviolet ray and the photocatalyst activated by the ultraviolet ray, and there is provided a discharge port for discharging the gas after the purification on a portion straddle between the first region and the second region or only in the second region. The purification device according to the present invention can improve the purification capability of gas such as air by using a photocatalyst activated by an ultraviolet ray.

Description

浄化装置Purification device
 本発明の実施形態は、浄化装置に関する。 Embodiments of the present invention relate to a purification device.
 従来、空気等の気体(ガス)を浄化する装置として光触媒を利用した装置が知られている(例えば特許文献1及び特許文献2参照)。光触媒には、抗菌効果、消臭効果及び清浄効果があるため、空気清浄装置或いは排ガス浄化装置等の機器に用いられている。光触媒の性質を利用して気体を浄化する場合には、光触媒と気体との接触面積を大きくするために、多孔質又はスポンジ状の基体に光触媒を担持させるといった工夫がなされる場合が多い。これに対して、光触媒を利用した空気浄化機能付の加湿器において、フィルタの目詰まりを回避する観点から金属板を光触媒でコーティングする技術も提案されている(例えば特許文献3参照)。 Conventionally, a device using a photocatalyst is known as a device for purifying gas such as air (see, for example, Patent Documents 1 and 2). Since the photocatalyst has an antibacterial effect, a deodorizing effect and a cleaning effect, it is used in equipment such as an air cleaning device or an exhaust gas cleaning device. In the case of purifying gas by utilizing the property of the photocatalyst, in many cases, a device such as supporting the photocatalyst on a porous or sponge-like substrate is made in order to increase the contact area between the photocatalyst and the gas. On the other hand, in a humidifier with an air purifying function using a photocatalyst, a technique of coating a metal plate with a photocatalyst has been proposed from the viewpoint of avoiding clogging of the filter (see, for example, Patent Document 3).
 また、光触媒は、紫外線(UV:ultraviolet)の照射によって活性化される。このため、光触媒の性質を利用して気体を浄化する場合には、紫外線の照射を併用することが有用であることが知られている。 Also, the photocatalyst is activated by irradiation with ultraviolet rays (UV). Therefore, in the case of purifying gas by utilizing the properties of the photocatalyst, it is known that it is useful to use irradiation of ultraviolet rays together.
特開2014-104371号公報JP, 2014-104371, A 特開2015-006220号公報JP, 2005-006220, A 特開2013-230344号公報JP, 2013-230344, A
 本発明は、紫外線で活性化させた光触媒を利用した空気等の気体の浄化能力を向上させることを目的とする。 The present invention aims to improve the ability to purify gases such as air using a photocatalyst activated by ultraviolet rays.
 本発明の実施形態に係る浄化装置は、浄化対象となる気体の流路を形成する筐体であって、前記流路側における表面の少なくとも一部が光触媒でコーティングされた板状部材を少なくとも一部に有する筐体と、前記筐体に流入した前記気体を浄化させ、かつ前記光触媒を活性化するための紫外線を照射する光源とを備え、前記筐体内に前記光触媒に依らず前記紫外線で前記気体が浄化される第1の領域と、前記紫外線と前記紫外線で活性化された前記光触媒で前記気体が浄化される第2の領域とを形成し、前記第1の領域と前記第2の領域に跨る一部の領域又は前記第2の領域のみに浄化後における前記気体を排出するための排出口を設けたものである。 A purification device according to an embodiment of the present invention is a casing that forms a flow path of gas to be purified, and at least a part of a plate-like member whose surface on the flow path side is coated with a photocatalyst. And a light source that purifies the gas that has flowed into the housing and irradiates ultraviolet light for activating the photocatalyst, and the gas in the housing is the ultraviolet light regardless of the photocatalyst. Is formed into a first region and a second region in which the gas is purified by the ultraviolet rays and the photocatalyst activated by the ultraviolet rays, and is formed in the first region and the second region. A discharge port for discharging the gas after purification is provided only in a part of the region or the second region.
本発明の第1の実施形態に係る浄化装置の構成図。The block diagram of the purification|cleaning apparatus which concerns on the 1st Embodiment of this invention. 図1に示す浄化装置の位置A-Aにおける横断面図。FIG. 2 is a horizontal cross-sectional view of the purification device shown in FIG. 1 at a position AA. 図1に示す筐体の右側面図。The right view of the housing shown in FIG. 図1に示す筐体の左側面図。The left side view of the housing|casing shown in FIG. 紫外線と光触媒で気体が浄化される第2の領域のみに気体の排出口を設けた例を示す筐体の部分拡大縦断面図。FIG. 6 is a partially enlarged vertical cross-sectional view of a housing showing an example in which a gas outlet is provided only in a second region where gas is purified by ultraviolet rays and a photocatalyst. 光触媒に依らず紫外線で気体が浄化される第1の領域と、紫外線と光触媒で気体が浄化される第2の領域に跨る一部の領域に気体の排出口を設けた例を示す筐体の部分拡大縦断面図。A casing showing an example in which a gas outlet is provided in a partial region extending over a first region where gas is purified by ultraviolet rays without depending on a photocatalyst and a second region where gas is purified by ultraviolet rays and a photocatalyst FIG. 本発明の第2の実施形態に係る浄化装置の構成図。The block diagram of the purification apparatus which concerns on the 2nd Embodiment of this invention. 図7に示す浄化装置の位置B-Bにおける横断面図。FIG. 8 is a transverse cross-sectional view of the purification device shown in FIG. 7 at a position BB. 図7に示す筐体の右側面図。FIG. 8 is a right side view of the housing shown in FIG. 7. 図7に示す筐体の左側面図。The left side view of the housing|casing shown in FIG. 本発明の第3の実施形態に係る浄化装置の構成図。The block diagram of the purification apparatus which concerns on the 3rd Embodiment of this invention. 図11に示す浄化装置の位置C-Cにおける横断面図。FIG. 12 is a transverse cross-sectional view of the purification device shown in FIG. 11 at position CC. 図11に示す筐体の右側面図。FIG. 12 is a right side view of the housing shown in FIG. 11. 図11に示す筐体の左側面図。The left side view of the housing|casing shown in FIG. 本発明の第4の実施形態に係る浄化装置の構成を示す縦断面面。The longitudinal section surface showing the composition of the purification device concerning a 4th embodiment of the present invention. 図15に示す浄化装置の左側面図。Fig. 16 is a left side view of the purification device shown in Fig. 15. 本発明の第5の実施形態に係る浄化装置の構成を示す縦断面面。The longitudinal section surface showing the composition of the purification device concerning a 5th embodiment of the present invention. 図17に示す浄化装置の右側面図。The right view of the purification apparatus shown in FIG. 図17に示す仕切り板を下面方向から見た形状の一例を示す図。The figure which shows an example of the shape which looked at the partition plate shown in FIG. 17 from the lower surface direction. 図17に示す浄化装置の変形例を示す縦断面面。FIG. 18 is a vertical cross-sectional surface showing a modified example of the purification device shown in FIG. 17. 本発明の第6の実施形態に係る浄化装置の構成を示す縦断面面。The longitudinal cross-sectional surface which shows the structure of the purification|cleaning apparatus which concerns on the 6th Embodiment of this invention. 図21に示す浄化装置の右側面図。FIG. 22 is a right side view of the purification device shown in FIG. 21. 図21に示す浄化装置の変形例を示す縦断面面。FIG. 23 is a vertical cross-sectional surface showing a modification of the purification device shown in FIG. 21. 本発明の第7の実施形態に係る浄化装置の構成を示す縦断面面。The longitudinal cross-sectional surface which shows the structure of the purification|cleaning apparatus which concerns on the 7th Embodiment of this invention. 図24に示す浄化装置の右側面図。FIG. 25 is a right side view of the purification device shown in FIG. 24. 図24に示す浄化装置の変形例を示す縦断面面。FIG. 25 is a vertical cross-sectional surface showing a modified example of the purification device shown in FIG. 24. 本発明の第8の実施形態に係る浄化装置の構成を説明するための断面図。Sectional drawing for demonstrating the structure of the purification|cleaning apparatus which concerns on the 8th Embodiment of this invention.
 本発明の実施形態に係る浄化装置について添付図面を参照して説明する。 A purification device according to an embodiment of the present invention will be described with reference to the accompanying drawings.
(第1の実施形態)
(構成及び機能)
 図1は本発明の第1の実施形態に係る浄化装置の構成図であり、図2は図1に示す浄化装置の位置A-Aにおける横断面図である。
(First embodiment)
(Structure and function)
FIG. 1 is a configuration diagram of a purification device according to a first embodiment of the present invention, and FIG. 2 is a transverse cross-sectional view of the purification device shown in FIG. 1 at a position AA.
 浄化装置1は、浄化対象となる気体Gを浄化する装置である。浄化対象となる気体Gの代表例としては、自動車内等の長時間密閉される空間における空気、自動車等の燃焼機関を備えた装置からの排気ガス、揮発性有機化合物(VOC:Volatile Organic Compounds)、ホルムアルデヒド、アセトアルデヒド又はアンモニア等の有害物質を含む気体、インフルエンザウイルスや細菌等の有害物を含む気体が挙げられる。尚、ホルムアルデヒド及びアセトアルデヒドは、VOCと同様にシックハウス症候群や化学物質過敏症の原因と考えられているため、VOCに分類される場合もある。従って、浄化装置1は、浄化対象となる気体Gに含まれる有害物質や病原体等の有害物を除去する装置である。 The purifying device 1 is a device for purifying the gas G to be purified. Typical examples of the gas G to be purified are air in a space that is hermetically sealed for a long time, such as air inside a car, exhaust gas from a device equipped with a combustion engine such as a car, and volatile organic compounds (VOC: Volatile Organic Compounds). , Gas containing harmful substances such as formaldehyde, acetaldehyde or ammonia, and gas containing harmful substances such as influenza virus and bacteria. Formaldehyde and acetaldehyde are considered to be the causes of sick house syndrome and chemical hypersensitivity, like VOC, and thus may be classified as VOC. Therefore, the purification device 1 is a device for removing harmful substances such as harmful substances and pathogens contained in the gas G to be purified.
 浄化装置1は、光触媒2で表面の少なくとも一部がコーティングされた板状部材3と、光触媒2に紫外線(UV)を照射するランプ4とを、筒状の筐体5に収納して構成される。筒状の筐体5の内部には、気体Gの流れを形成するための流路6が形成される。 The purification device 1 is configured by accommodating a plate-shaped member 3 whose surface is at least partially coated with a photocatalyst 2 and a lamp 4 for irradiating the photocatalyst 2 with ultraviolet rays (UV) in a cylindrical casing 5. It A flow path 6 for forming a flow of the gas G is formed inside the cylindrical casing 5.
 板状部材3は、気体Gの流れが光触媒2に沿って連続的又は断続的に形成されるように、筐体5の内部に配置される。すなわち、光触媒2でコーティングされた板状部材3の表面が気体Gの流路6側となるように板状部材3が配置される。従って、板状部材3の板厚方向が、気体Gの進行方向に対して垂直となるように板状部材3を配置することが好適である。 The plate-shaped member 3 is arranged inside the housing 5 so that the flow of the gas G is continuously or intermittently formed along the photocatalyst 2. That is, the plate-shaped member 3 is arranged so that the surface of the plate-shaped member 3 coated with the photocatalyst 2 is on the side of the flow path 6 of the gas G. Therefore, it is preferable to arrange the plate member 3 so that the plate thickness direction of the plate member 3 is perpendicular to the traveling direction of the gas G.
 図示された例では、横断面が矩形の角筒状の筐体5内部の底面に、矩形の板状部材3が載置されている。そして、筐体5の内部側となる矩形の板状部材3の上面側が光触媒2でコーティングされている。 In the illustrated example, the rectangular plate-shaped member 3 is placed on the bottom surface inside the rectangular tubular housing 5 having a rectangular cross section. Then, the upper surface side of the rectangular plate-shaped member 3 which is the inner side of the housing 5 is coated with the photocatalyst 2.
 尚、表面の少なくとも一部が光触媒2でコーティングされた板状部材3で筐体5の一部を構成するようにしても良い。従って、筐体5は、気体Gの流路6側における表面の少なくとも一部が光触媒2でコーティングされた板状部材3を少なくとも一部に有する構成となる。 Incidentally, a part of the housing 5 may be constituted by the plate-like member 3 whose surface is at least partially coated with the photocatalyst 2. Therefore, the housing 5 has a structure in which at least a part of the surface of the gas G on the flow path 6 side is coated with the photocatalyst 2 in at least a part thereof.
 板状部材3は、金属、セラミック又は樹脂等の多孔質でない所望の材料で構成することができる。但し、金属板で板状部材3を構成すれば、加工性が良く、安価であることから量産に適している。価格、加工性及び入手容易性等の観点から実用性が高い金属板としてはチタンやアルミニウムが挙げられる。 The plate-shaped member 3 can be made of a desired material that is not porous, such as metal, ceramic, or resin. However, if the plate-shaped member 3 is made of a metal plate, it is suitable for mass production because it has good workability and is inexpensive. Titanium and aluminum are examples of metal plates that are highly practical in terms of price, processability, and availability.
 一方、板状部材3をコーティングする光触媒2の代表的な材料としては、二酸化チタン(TiO)が知られている。金属板の表面の一部又は全部を二酸化チタンでコーティングする場合には、陽極酸化法によって金属板の表面に二酸化チタンの膜を形成することができる。但し、板状部材3及び光触媒2の材質に応じて任意の製法を採用することができる。例えば、光触媒2の粉末を溶液中に分散させてスプレーや刷毛による塗装によって板状部材3に塗布することもできる。 On the other hand, titanium dioxide (TiO 2 ) is known as a typical material of the photocatalyst 2 that coats the plate-shaped member 3. When a part or all of the surface of the metal plate is coated with titanium dioxide, a titanium dioxide film can be formed on the surface of the metal plate by the anodic oxidation method. However, any manufacturing method can be adopted depending on the materials of the plate member 3 and the photocatalyst 2. For example, the powder of the photocatalyst 2 may be dispersed in a solution and applied to the plate-like member 3 by spraying or painting with a brush.
 ランプ4は、筐体5に流入した気体G及び光触媒2に向けて紫外線を照射する光源である。ランプ4から照射される紫外線は、光触媒2の活性化のみならず、筐体5に流入した気体Gの浄化にも積極的に使用される。すなわち、紫外線の照射によって気体Gに含まれる有機物等の有害物を直接的又は副次的な生成物によって間接的に分解することができる。加えて、紫外線の照射によって光触媒2の活性化を行うことができる。更に、活性化された光触媒2によって、光触媒2近傍を流れる気体Gに含まれる有害物と、紫外線の照射によって副次的に生成され得る有害物の分解を行うことができる。 The lamp 4 is a light source that irradiates the gas G and the photocatalyst 2 flowing into the housing 5 with ultraviolet rays. The ultraviolet rays emitted from the lamp 4 are positively used not only for activating the photocatalyst 2 but also for purifying the gas G flowing into the housing 5. That is, harmful substances such as organic substances contained in the gas G can be directly or indirectly decomposed by a byproduct by irradiation of ultraviolet rays. In addition, the photocatalyst 2 can be activated by irradiation with ultraviolet rays. Further, the activated photocatalyst 2 can decompose the harmful substances contained in the gas G flowing in the vicinity of the photocatalyst 2 and the harmful substances that can be secondarily generated by the irradiation of the ultraviolet rays.
 このため、ランプ4は、筐体5に流入した気体G及び板状部材3の双方に向けて紫外線を照射できる位置に設置される。特に、ランプ4と板状部材3との間における相対位置は、光触媒2に依らず紫外線で気体Gが浄化される第1の領域R1と、紫外線と紫外線で活性化された光触媒2の双方で気体Gが浄化される第2の領域R2が、単一かつ共通の筐体5内に形成されるように決定される。従って、筐体5の形状も、第1の領域R1と第2の領域R2を形成できるように決定される。 Therefore, the lamp 4 is installed at a position where it can irradiate ultraviolet rays toward both the gas G flowing into the housing 5 and the plate-shaped member 3. In particular, the relative position between the lamp 4 and the plate-like member 3 is set in both the first region R1 where the gas G is purified by ultraviolet rays regardless of the photocatalyst 2 and the photocatalyst 2 activated by ultraviolet rays and ultraviolet rays. The second region R2 in which the gas G is purified is determined to be formed in the single and common housing 5. Therefore, the shape of the housing 5 is also determined so that the first region R1 and the second region R2 can be formed.
 光触媒2に依らず紫外線のみで気体Gが直接的又は間接的に浄化される第1の領域R1と、紫外線と紫外線で活性化された光触媒2の双方で気体Gが浄化される第2の領域R2を筐体5内の流路6に形成するためには、光触媒2で気体Gに含まれる有害物を分解することが可能な範囲の外側にもランプ4で紫外線を照射するようにすれば良い。すなわち、筐体5内に形成される流路6の幅を、光触媒2で気体Gに含まれる有害物を分解することが可能な範囲よりも広くし、かつ光触媒2で有害物を分解することが可能な範囲外まで紫外線を照射できるようにすればよい。 A first region R1 in which the gas G is purified directly or indirectly by only the ultraviolet rays without depending on the photocatalyst 2, and a second region in which the gas G is purified by both the ultraviolet rays and the photocatalyst 2 activated by the ultraviolet rays. In order to form R2 in the flow path 6 in the housing 5, it is necessary to irradiate ultraviolet rays with the lamp 4 even outside the range where the photocatalyst 2 can decompose harmful substances contained in the gas G. good. That is, the width of the flow path 6 formed in the housing 5 is made wider than the range in which the photocatalyst 2 can decompose the harmful substances contained in the gas G, and the photocatalyst 2 decomposes the harmful substances. The ultraviolet ray may be irradiated to the outside of the range where
 板状部材3の表面層を形成する光触媒2で気体Gに含まれる有害物を分解することが可能な範囲は、光触媒2や紫外線の種類等の条件にも依存して変化するが、概ね光触媒2からの距離が数mm程度(具体的には2~6mm)の範囲である。従って、ランプ4と光触媒2との間における距離が数mmよりも長くなるように、流路6の幅並びにランプ4と板状部材3との間における相対位置を決定すれば、ランプ4と光触媒2との間に、紫外線のみで気体Gを浄化する第1の領域R1と、紫外線と紫外線で活性化された光触媒2で気体Gを浄化する第2の領域R2を形成することができる。 The range in which the photocatalyst 2 forming the surface layer of the plate-like member 3 can decompose harmful substances contained in the gas G changes depending on the conditions such as the photocatalyst 2 and the type of ultraviolet rays. The distance from 2 is in the range of about several mm (specifically, 2 to 6 mm). Therefore, if the width of the flow path 6 and the relative position between the lamp 4 and the plate-shaped member 3 are determined so that the distance between the lamp 4 and the photocatalyst 2 is longer than several mm, the lamp 4 and the photocatalyst 2 are determined. A first region R1 for purifying the gas G by only the ultraviolet rays and a second region R2 for purifying the gas G by the ultraviolet rays and the photocatalyst 2 activated by the ultraviolet rays can be formed between the two.
 図示された例では、筐体5の内部に形成される気体Gの流路6を挟んで板状部材3の上方から気体G及び板状部材3に向かって紫外線を照射できるようにランプ4が配置されている。また、板状部材3が配置されていないランプ4の上方を流れる気体Gにも紫外線を照射することができる。従って、光触媒2の表面から数ミリ程度の範囲にある領域が、紫外線と光触媒2で気体Gを浄化する第2の領域R2となり、紫外線の影とならないその他の筐体5内の領域が紫外線のみで気体Gを浄化する第1の領域R1となる。 In the illustrated example, the lamp 4 is provided so that ultraviolet rays can be irradiated from above the plate-shaped member 3 toward the gas G and the plate-shaped member 3 with the flow path 6 of the gas G formed inside the housing 5 interposed therebetween. It is arranged. Further, the gas G flowing above the lamp 4 on which the plate-shaped member 3 is not arranged can also be irradiated with ultraviolet rays. Therefore, the region within a few millimeters from the surface of the photocatalyst 2 becomes the second region R2 for purifying the gas G with the ultraviolet light and the photocatalyst 2, and the other region in the housing 5 that does not become the shadow of the ultraviolet light is only the ultraviolet light. Thus, the first region R1 for purifying the gas G is formed.
 すなわち、共通かつ単一の筐体5内に紫外線のみで気体Gが浄化される第1の領域R1と、紫外線と紫外線で活性化された光触媒2で気体Gが浄化される第2の領域R2が、第1の領域R1が光触媒2から離れた位置となり、第2の領域R2が光触媒2に隣接する位置となるように流路6の幅方向の異なる位置に形成される。 That is, the first region R1 in which the gas G is purified by only the ultraviolet rays and the second region R2 in which the gas G is purified by the ultraviolet rays and the photocatalyst 2 activated by the ultraviolet rays are included in the common and single housing 5. However, the first region R1 is formed at a position separated from the photocatalyst 2 and the second region R2 is formed at a position adjacent to the photocatalyst 2 at different positions in the width direction of the flow path 6.
 紫外線は、波長によりUV-A帯、UV-B帯及びUV-C帯に分類される。UV-A帯、UV-B帯及びUV-C帯の紫外線は、それぞれ波長が315nmから400nm、280nmから315nm及び280nm未満の紫外線である。このうち、UV-C帯の紫外線は、有機物の分解効果や殺菌効果が高いことが知られている。しかしながら、UV-C帯の紫外線は疾患の原因となり、人体に危険であることが知られている。このため、浄化装置1の使用環境に応じて紫外線の種類を決定することができる。 UV rays are classified into UV-A band, UV-B band and UV-C band depending on the wavelength. The UV-A band, UV-B band, and UV-C band ultraviolet rays are ultraviolet rays having wavelengths of 315 nm to 400 nm, 280 nm to 315 nm, and less than 280 nm, respectively. Among them, it is known that ultraviolet rays in the UV-C band have a high effect of decomposing and sterilizing organic substances. However, it is known that ultraviolet rays in the UV-C band cause diseases and are dangerous to the human body. Therefore, the type of ultraviolet rays can be determined according to the usage environment of the purification device 1.
 実用的な具体例として、安全性よりも気体Gの浄化能力を優先する場合には、UV-C帯の紫外線で活性化する光触媒2と、UV-C帯の紫外線を照射するランプ4で浄化装置1を構成することができる。逆に、気体Gの浄化能力よりも安全性を優先する場合には、UV-A帯又はUV-B帯の紫外線で活性化する光触媒2と、UV-A帯又はUV-B帯の紫外線を照射するランプ4で浄化装置1を構成することができる。また、1つの筐体5内でUV-A帯、UV-B帯及びUV-C帯の紫外線を照射するランプ4を1種以上用いる構成でもよい。例えば、気体Gの入口近傍に、有機物の分解効果や殺菌効果が高いUV―C帯の紫外線を照射するランプ4を配置し、気体Gの出口近傍に、UC-A帯及びUV-B帯の少なくとも一方の紫外線を照射するランプ4を配置した構成を例示することができる。 As a practical example, when the purification ability of the gas G is prioritized over the safety, the purification is performed with a photocatalyst 2 that is activated by UV rays in the UV-C band and a lamp 4 that emits UV rays in the UV-C band. The device 1 can be constructed. On the contrary, when safety is prioritized over the purification ability of the gas G, the photocatalyst 2 which is activated by UV in the UV-A band or UV-B band and the UV in the UV-A band or UV-B band are used. The purifying device 1 can be configured with the lamp 4 for irradiation. Further, a configuration may be used in which one or more lamps 4 for irradiating UV rays in the UV-A band, UV-B band, and UV-C band are used in one housing 5. For example, a lamp 4 for irradiating ultraviolet rays in the UV-C band, which is highly effective in decomposing and sterilizing organic substances, is arranged near the entrance of the gas G, and near the exit of the gas G, there are UC-A band and UV-B band UV lamps. A configuration in which at least one of the lamps 4 for irradiating ultraviolet rays is arranged can be exemplified.
 また、板状部材3を金属板で構成すれば、他の材料で構成する場合に比べて、紫外線の照射による劣化を低減させることができる。従って、板状部材3の劣化を低減させる観点からは、板状部材3を金属板で構成することが好適である。 Further, if the plate-shaped member 3 is made of a metal plate, deterioration due to irradiation of ultraviolet rays can be reduced as compared with the case where it is made of another material. Therefore, from the viewpoint of reducing the deterioration of the plate-shaped member 3, it is preferable to configure the plate-shaped member 3 with a metal plate.
 一方、ランプ4としては、要求される気体Gの浄化能力に合わせて決定された波長と照度を有する紫外線を照射できれば、UV LED、殺菌灯、ブラックライト、半導体レーザ、水銀灯、キセノンランプ、メタルハライドランプ、ハロゲンランプ、冷陰極放電管等の任意のランプ4を用いることができる。 On the other hand, as the lamp 4, UV LED, germicidal lamp, black light, semiconductor laser, mercury lamp, xenon lamp, metal halide lamp can be used as long as it can irradiate ultraviolet rays having a wavelength and illuminance determined according to the required purification ability of the gas G. Any lamp 4 such as a halogen lamp or a cold cathode discharge tube can be used.
 矩形の光触媒2の隅々まで紫外線を照射できるようにする観点からは、図示されるように棒状のランプ4を用いることが合理的である。その場合、棒状のランプ4の両端を支持するために筒状の筐体5の両端を板状部材7A、7Bで閉塞し、筐体5の両端を閉塞する板状部材7A、7Bに形成した貫通孔に棒状のランプ4のソケット部分を挿入することができる。これにより、ランプ4の発光部分を筐体5内部に固定することができる。 From the perspective of being able to irradiate ultraviolet rays to every corner of the rectangular photocatalyst 2, it is rational to use a rod-shaped lamp 4 as shown in the figure. In that case, in order to support both ends of the rod-shaped lamp 4, both ends of the tubular casing 5 are closed by plate members 7A and 7B, and plate members 7A and 7B that close both ends of the casing 5 are formed. The socket portion of the rod-shaped lamp 4 can be inserted into the through hole. As a result, the light emitting portion of the lamp 4 can be fixed inside the housing 5.
 ランプ4を板状部材7A、7Bに固定するか否かを問わず、気体Gの上流側における筐体5の一端を板状部材7Aで閉塞して上流側の端面を形成し、気体Gの流入口8Aを板状部材7Aに設けることができる。気体Gの流入口8Aは、筐体5内に流入した気体Gが光触媒2近傍に導かれるように板状部材7Aに光触媒2近傍となるように局所的に設けるようにしても良い。 Regardless of whether or not the lamp 4 is fixed to the plate-shaped members 7A and 7B, one end of the casing 5 on the upstream side of the gas G is closed by the plate-shaped member 7A to form the upstream end surface. The inflow port 8A can be provided in the plate member 7A. The inflow port 8A of the gas G may be locally provided in the plate-shaped member 7A so as to be in the vicinity of the photocatalyst 2 so that the gas G flowing into the housing 5 is guided to the vicinity of the photocatalyst 2.
 他方、気体Gの下流側における筐体5の他端についても、板状部材7Bで閉塞して下流側の端面を形成し、気体Gの排出口8Bを板状部材7Bに設けることができる。但し、気体Gの排出口8Bのサイズと位置については、必ず光触媒2で浄化された気体Gをできるだけ多く含む気体Gが選択的に流路6から排出されるように決定される。 On the other hand, the other end of the casing 5 on the downstream side of the gas G can also be closed by the plate member 7B to form an end face on the downstream side, and the discharge port 8B for the gas G can be provided on the plate member 7B. However, the size and the position of the discharge port 8B of the gas G are determined so that the gas G containing the gas G purified by the photocatalyst 2 as much as possible is selectively discharged from the flow path 6.
 図3は図1に示す筐体5の右側面図であり、図4は図1に示す筐体5の左側面図である。 FIG. 3 is a right side view of the housing 5 shown in FIG. 1, and FIG. 4 is a left side view of the housing 5 shown in FIG.
 光触媒2でコーティングされた矩形の板状部材3が筐体5内に配置される場合には、例えば、図3に示すように、板状部材3の幅に対応する長さを有するスリットを気体Gの流入口8Aとして、光触媒2の近傍となるように板状部材7Aに局所的に設けることができる。これにより、筐体5内に流入した気体Gを光触媒2でコーティングされた板状部材3の表面付近にできるだけ導くことができる。 When the rectangular plate-shaped member 3 coated with the photocatalyst 2 is arranged in the housing 5, for example, as shown in FIG. 3, a slit having a length corresponding to the width of the plate-shaped member 3 is gas. The G inflow port 8A can be locally provided in the plate member 7A so as to be in the vicinity of the photocatalyst 2. As a result, the gas G flowing into the housing 5 can be guided as close to the surface of the plate-shaped member 3 coated with the photocatalyst 2 as possible.
 他方、例えば、図4に示すように、板状部材3の幅に対応する長さを有するスリットを気体Gの排出口8Bとして板状部材7Bに光触媒2の近傍となるように局所的に設けることができる。これにより、光触媒2で浄化された気体Gをできるだけ多く含む気体Gを、浄化後における気体Gとして選択的に流路6から排出することができる。 On the other hand, for example, as shown in FIG. 4, a slit having a length corresponding to the width of the plate member 3 is locally provided on the plate member 7B as a discharge port 8B of the gas G so as to be in the vicinity of the photocatalyst 2. be able to. As a result, the gas G containing the gas G purified by the photocatalyst 2 as much as possible can be selectively discharged from the flow path 6 as the gas G after purification.
 図示された例では、光触媒2の表面を通り、気体Gの排出方向に平行な直線が排出口8Bの内面を通るように排出口8の位置が決定されている。尚、光触媒2の表面を通り、気体Gの排出方向に平行な直線が排出口8Bを通るように排出口8の位置を決定するようにしても良い。 In the illustrated example, the position of the discharge port 8 is determined so that a straight line passing through the surface of the photocatalyst 2 and parallel to the discharge direction of the gas G passes through the inner surface of the discharge port 8B. The position of the discharge port 8 may be determined so that a straight line passing through the surface of the photocatalyst 2 and parallel to the discharge direction of the gas G passes through the discharge port 8B.
 排出口8Bから排出される浄化後における気体Gに光触媒2で浄化された気体Gがどの程度含まれるかは、排出口8Bのサイズによって調整することができる。 The amount of the gas G purified by the photocatalyst 2 contained in the gas G after purification discharged from the outlet 8B can be adjusted by the size of the outlet 8B.
 図5は、紫外線と光触媒2で気体Gが浄化される第2の領域R2のみに気体Gの排出口8Bを設けた例を示す筐体5の部分拡大縦断面図である。 FIG. 5 is a partially enlarged vertical cross-sectional view of the housing 5 showing an example in which the gas G discharge port 8B is provided only in the second region R2 where the gas G is purified by the ultraviolet rays and the photocatalyst 2.
 図1乃至図5に例示されるように、光触媒2の表面に垂直な方向における排出口8Bの幅Bを数mm未満となるように小さくすれば、光触媒2で気体Gが浄化される第2の領域R2のみに気体Gの排出口8Bを連結することができる。この場合、筐体5の排出口8Bからは、光触媒2で浄化された気体Gのみを選択的に排出することが可能である。このため、浄化性能を向上させることができる。 As illustrated in FIGS. 1 to 5, if the width B of the discharge port 8B in the direction perpendicular to the surface of the photocatalyst 2 is reduced to less than several mm, the gas G is purified by the photocatalyst 2. The discharge port 8B for the gas G can be connected only to the region R2. In this case, only the gas G purified by the photocatalyst 2 can be selectively discharged from the discharge port 8B of the housing 5. Therefore, the purification performance can be improved.
 図6は、光触媒2に依らず紫外線で気体Gが浄化される第1の領域R1と、紫外線と光触媒2で気体Gが浄化される第2の領域R2に跨る一部の領域に気体Gの排出口8Bを設けた例を示す筐体5の部分拡大縦断面図である。 FIG. 6 shows a partial region of the gas G extending over the first region R1 where the gas G is purified by ultraviolet rays regardless of the photocatalyst 2 and the second region R2 where the gas G is purified by the ultraviolet rays and the photocatalyst 2. FIG. 6 is a partially enlarged vertical cross-sectional view of the housing 5 showing an example in which a discharge port 8B is provided.
 図6に示すように、光触媒2の表面に垂直な方向における排出口8Bの幅Bを数mmよりも大きくし、筐体5内に形成される流路6のうち、第1の領域R1と、第2の領域R2に跨る一部の領域に気体Gの排出口8Bを設けるようにしても良い。この場合には、筐体5の排出口8Bから排出される気体Gに、第2の領域R2において光触媒2で浄化された気体Gのみならず第1の領域R1から排出される気体Gも含まれることになるが、気体Gの流量を多くすることが可能である。このため、単位時間当たりに浄化さできる気体Gの流量を多くすることができる。 As shown in FIG. 6, the width B of the discharge port 8B in the direction perpendicular to the surface of the photocatalyst 2 is made larger than a few mm so that the first region R1 in the flow path 6 formed in the housing 5 is The discharge port 8B for the gas G may be provided in a part of the region extending over the second region R2. In this case, the gas G discharged from the discharge port 8B of the housing 5 includes not only the gas G purified by the photocatalyst 2 in the second region R2 but also the gas G discharged from the first region R1. However, it is possible to increase the flow rate of the gas G. Therefore, the flow rate of the gas G that can be purified per unit time can be increased.
 すなわち、図6に示すように第1の領域R1と、第2の領域R2に跨る一部の領域に設けられる排出口8Bの断面積は、図5に示すように第2の領域R2のみに設けられる排出口8Bの断面積よりも大きくすることができる。このため、第1の領域R1と、第2の領域R2に跨る一部の領域に気体Gの排出口8Bを形成すれば、第2の領域R2のみに気体Gの排出口8Bを形成する場合に比べて、筐体5の排出口8Bから排出される気体Gに流量を多くすることができる。 That is, as shown in FIG. 6, the cross-sectional area of the discharge port 8B provided in a part of the first region R1 and the second region R2 is limited to the second region R2 as shown in FIG. It can be made larger than the cross-sectional area of the discharge port 8B provided. Therefore, if the gas G discharge port 8B is formed in a part of the region extending over the first region R1 and the second region R2, the gas G discharge port 8B is formed only in the second region R2. In comparison with the above, the flow rate of the gas G discharged from the discharge port 8B of the housing 5 can be increased.
 また、図6に示すように、第1の領域R1と第2の領域R2に跨る一部の領域に、絞られた気体Gの排出口8Bを形成すれば、筐体5の端部を板状部材7Bで閉塞せずに開口端とする場合に比べて、排出口8Bから排出される気体Gに含まれる、第2の領域R2において光触媒2で浄化された気体Gの割合を飛躍的に増加させることができる。 Further, as shown in FIG. 6, if a narrowed gas G discharge port 8B is formed in a part of the region extending over the first region R1 and the second region R2, the end portion of the housing 5 is formed into a plate. The proportion of the gas G purified by the photocatalyst 2 in the second region R2, which is contained in the gas G discharged from the discharge port 8B, is dramatically increased as compared with the case where the opening end is not closed by the shape member 7B. Can be increased.
 従って、図6に例示されるように第1の領域R1と第2の領域R2に跨る領域に排出口8Bを局所的に形成するか図5に例示されるように第2の領域R2のみに排出口8Bを局所的に形成するかに関わらず、筐体5の排出口8Bを光触媒2の近傍に局所的に形成すれば、第2の領域R2から排出される気体Gを排出口8Bから排出される浄化後における気体Gに含めることができる。 Therefore, as shown in FIG. 6, the discharge port 8B is locally formed in a region extending over the first region R1 and the second region R2, or only in the second region R2 as shown in FIG. Regardless of whether the discharge port 8B is locally formed, if the discharge port 8B of the housing 5 is locally formed near the photocatalyst 2, the gas G discharged from the second region R2 is discharged from the discharge port 8B. It can be included in the discharged gas G after purification.
 試験の結果、光触媒2の表面に垂直な方向における排出口8Bの幅Bを6mm以下とすれば、第2の領域R2から排出される気体Gを有意な量で浄化後における気体Gに含めることができるため、光触媒2と紫外線による浄化効果が得られることが確認された。従って、筐体5内に形成される流路6の幅を、筐体5から気体Gを排出するための排出口8Bの幅よりも大きくし、光触媒2の表面に垂直な方向における幅Bが6mm以下となるように排出口8Bを光触媒2の近傍に形成すれば、光触媒2と紫外線による浄化効果によって気体Gを浄化することができる。 As a result of the test, if the width B of the discharge port 8B in the direction perpendicular to the surface of the photocatalyst 2 is 6 mm or less, the gas G discharged from the second region R2 should be included in the gas G after purification in a significant amount. Therefore, it was confirmed that the purification effect by the photocatalyst 2 and ultraviolet rays can be obtained. Therefore, the width of the flow path 6 formed in the housing 5 is made larger than the width of the discharge port 8B for discharging the gas G from the housing 5, and the width B in the direction perpendicular to the surface of the photocatalyst 2 is set. If the discharge port 8B is formed in the vicinity of the photocatalyst 2 so as to have a length of 6 mm or less, the gas G can be purified by the purification effect of the photocatalyst 2 and ultraviolet rays.
 更に、光触媒2の表面に垂直な方向における排出口8Bの幅Bを3mm以下とすれば、第2の領域R2から排出される気体Gを浄化後における気体Gに支配的な割合で含めることができるため、一層浄化性能を改善できることも確認された。 Further, if the width B of the discharge port 8B in the direction perpendicular to the surface of the photocatalyst 2 is 3 mm or less, the gas G discharged from the second region R2 can be included in the gas G after purification in a predominant ratio. Therefore, it was also confirmed that the purification performance can be further improved.
 このため、気体Gの流量を確保する観点からは、光触媒2の表面に垂直な方向における排出口8Bの幅Bを2mm以上6mm以下とし、更に浄化性能を追求する場合には、光触媒2の表面に垂直な方向における排出口8Bの幅Bを2mm以上3mm以下とすることが適切であると考えられる。 Therefore, from the viewpoint of securing the flow rate of the gas G, the width B of the outlet 8B in the direction perpendicular to the surface of the photocatalyst 2 is set to 2 mm or more and 6 mm or less, and when purifying the purifying performance further, the surface of the photocatalyst 2 is It is considered appropriate that the width B of the discharge port 8B in the direction perpendicular to is 2 mm or more and 3 mm or less.
 また、排出口8Bの形状を図4に例示されるようにスリットとすると、排出口8Bの形状を円形の貫通孔とする場合に比べて、有害物の分解性能を向上できることも確認された。これは、排出口8Bの形状をスリットとすると、円形の貫通孔とする場合に比べて光触媒2の表面近傍を流れた気体Gをより多く排出口8Bから排出でき、かつ光触媒2と気体Gとの接触機会を確保する観点からより好ましい気体Gの流れを形成できるためであると考えられる。 It was also confirmed that if the shape of the discharge port 8B is a slit as illustrated in FIG. 4, the decomposition performance of harmful substances can be improved as compared with the case where the shape of the discharge port 8B is a circular through hole. This is because, when the shape of the discharge port 8B is a slit, a larger amount of the gas G flowing near the surface of the photocatalyst 2 can be discharged from the discharge port 8B, and the photocatalyst 2 and the gas G are formed, compared with the case where the shape is a circular through hole. It is considered that this is because it is possible to form a more preferable flow of the gas G from the viewpoint of ensuring the contact opportunity.
 このため、有害物の分解性能を向上させる観点からは、排出口8Bの形状をスリットにすることが好ましい。但し、例えば、排出口8Bから排出される気体Gを拡散させることが好ましい場合のように、浄化装置1の使用環境や使用目的に応じて任意形状の排出口8Bを筐体5に形成することができる。 Therefore, from the viewpoint of improving the decomposition performance of harmful substances, it is preferable that the shape of the discharge port 8B is a slit. However, for example, as in the case where it is preferable to diffuse the gas G discharged from the discharge port 8B, the discharge port 8B having an arbitrary shape is formed in the housing 5 according to the use environment and the purpose of use of the purification device 1. You can
 筐体5の排出口8Bを光触媒2の近傍に形成すると、筐体5内における気体Gの滞留時間を長くすることができるという効果も得られる。すなわち、筐体5の排出口8Bを光触媒2の近傍に形成すれば、筐体5内における気体Gの流れが層流でない限り、筐体5内に流入した気体Gの一部が光触媒2近傍を連続的又は断続的に流れ、かつ流路6内を排出口8Bに向かって流れた気体Gの一部が筐体5から排出される一方、流路6内を排出口8Bに向かって流れた気体Gの残りの一部と、排出口8Bに向かって流れなかった気体Gは筐体5内に留まることになる。 If the exhaust port 8B of the housing 5 is formed in the vicinity of the photocatalyst 2, the effect that the residence time of the gas G in the housing 5 can be lengthened is also obtained. That is, if the exhaust port 8B of the housing 5 is formed in the vicinity of the photocatalyst 2, part of the gas G that has flowed into the housing 5 is in the vicinity of the photocatalyst 2 unless the flow of the gas G in the housing 5 is a laminar flow. Part of the gas G that has flowed continuously or intermittently in the flow path 6 toward the discharge port 8B is discharged from the housing 5, while flowing in the flow path 6 toward the discharge port 8B. The remaining part of the gas G and the gas G that did not flow toward the discharge port 8B remain in the housing 5.
 一方、排出口8Bを絞った場合に気体Gの流れが層流になるのは稀である可能性があるが、気体Gの流れが層流である場合においても、筐体5内における流路6の断面積が排出口8Bの断面積よりも大きくなるため、筐体5内における流路6の断面積が排出口8Bの断面積と同じである場合に比べて、筐体5内における流路6を流れる気体Gの流速が低下する。 On the other hand, it may be rare that the flow of the gas G becomes a laminar flow when the discharge port 8B is narrowed, but even when the flow of the gas G is a laminar flow, the flow path in the housing 5 is small. Since the cross-sectional area of 6 is larger than the cross-sectional area of the discharge port 8B, the flow in the case 5 is smaller than that in the case where the cross-sectional area of the flow path 6 in the case 5 is the same as the cross-sectional area of the discharge port 8B. The flow velocity of the gas G flowing through the passage 6 decreases.
 つまり、気体Gが層流であるか乱流であるかを問わず、筐体5内における流路6の断面積よりも排出口8Bの断面積を小さくすることによって、筐体5内における流路6の断面積と排出口8Bの断面積とが同じである場合に比べて、筐体5内における気体の滞留時間、すなわち流入口8Aを通って筐体5内に気体Gが流入してから排出口8Bを通って筐体5から気体Gが排出されるまでの時間を長くすることができる。筐体5内における気体Gの滞留時間を長くすることができれば、気体Gへの紫外線の照射時間が長くなり、紫外線による有害物の分解量を増加させることができる。 That is, regardless of whether the gas G is a laminar flow or a turbulent flow, by making the cross-sectional area of the discharge port 8B smaller than the cross-sectional area of the flow path 6 in the housing 5, the flow in the housing 5 is reduced. Compared with the case where the cross-sectional area of the passage 6 and the cross-sectional area of the discharge port 8B are the same, the residence time of the gas in the housing 5, that is, the gas G flows into the housing 5 through the inflow port 8A. It is possible to lengthen the time from when the gas G is discharged from the housing 5 through the discharge port 8B. If the residence time of the gas G in the housing 5 can be lengthened, the irradiation time of the gas G with ultraviolet rays can be increased, and the amount of decomposition of harmful substances due to ultraviolet rays can be increased.
 加えて、筐体5の排出口8Bを光触媒2の近傍に局所的に形成すれば、第2の領域Rから排出される気体Gを浄化後における気体Gに含められるのみならず、筐体5に流入した気体Gを第1の領域R1に導く効果も得られる。そして、第1の領域R1において紫外線による有害物の分解を行うことができる。 In addition, if the discharge port 8B of the housing 5 is locally formed in the vicinity of the photocatalyst 2, not only the gas G discharged from the second region R can be included in the gas G after purification, but also the housing 5 It is also possible to obtain the effect of guiding the gas G flowing into the first region R1. Then, harmful substances can be decomposed by ultraviolet rays in the first region R1.
 つまり、排出口8Bの適切な配置と第1の領域R1の形成によって時間的及び空間的に紫外線で分解される有害物の量を増加させることができる。その結果、光触媒2による有害物の分解量を低減することができる。すなわち、単位時間当たりに光触媒2で分割すべき有害物の量を、光触媒2の種類や表面積等で決定される浄化能力の範囲に留めることができる。 That is, it is possible to increase the amount of harmful substances decomposed by ultraviolet rays temporally and spatially by appropriately disposing the discharge port 8B and forming the first region R1. As a result, the amount of harmful substances decomposed by the photocatalyst 2 can be reduced. That is, the amount of harmful substances to be divided by the photocatalyst 2 per unit time can be kept within the range of the purifying ability determined by the type and surface area of the photocatalyst 2.
 ここで、筐体5の排出口8Bは、光触媒2の表面(筐体5内に露出した面)と連続的に接続された面を備えることが好ましい。これによって、気体Gは、すなわち、筐体5の排出口8Bから所定の距離間、第2の領域R2を通過することになり、浄化の最終段階において光触媒2と気体Gとの接触機会を確保することが可能となる。また、筐体5の一端に気体Gの流入口8Aを、他端に気体Gの排出口8Bを設ける場合には、流入口8Aおよび排出口8Bが筐体5の軸方向に平行な一直線上に形成されることが好ましい。この場合において、筐体5の流入口8Aおよび排出口8Bは、いずれも光触媒2の表面(筐体5内に露出した面)と連続的に接続された面を備えることが好ましい。また、光触媒2は、筐体5の流入口8Aから排出口8Bまでの間、途切れることなく連続的に形成されていることが好ましい。これにより、第2の領域R2を通過する気体Gの流れを層流にすることができ、さらに光触媒2と気体Gとの接触機会を確保することが可能となる。 Here, it is preferable that the outlet 8B of the housing 5 has a surface continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5). As a result, the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do. When the gas G inlet 8A is provided at one end of the casing 5 and the gas G outlet 8B is provided at the other end, the inlet 8A and the outlet 8B are on a straight line parallel to the axial direction of the casing 5. Are preferably formed. In this case, it is preferable that each of the inflow port 8A and the exhaust port 8B of the housing 5 has a surface continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5). Moreover, it is preferable that the photocatalyst 2 is continuously formed between the inflow port 8A and the exhaust port 8B of the housing 5 without interruption. This makes it possible to make the flow of the gas G passing through the second region R2 a laminar flow, and further to secure a chance of contact between the photocatalyst 2 and the gas G.
特に、光触媒2において単位時間当たりに分解すべき有害物の量が限界を超えると、光触媒2の表面に有害物が堆積し、視認できない程度の僅かな厚さを有する汚染層が形成されてしまうという現象が試験によって確認された。これは、光触媒2による有害物の分解速度が、気体G中に含まれる有害物の供給速度に追いつかないためであると考えられる。光触媒2の表面に有害物の汚染層が形成されると、汚染層によって紫外線が光触媒2の表面に十分な強度で届かなくなり、光触媒2の浄化作用が十分に得られなくなる。 In particular, when the amount of harmful substances to be decomposed per unit time in the photocatalyst 2 exceeds the limit, the harmful substances are deposited on the surface of the photocatalyst 2 and a contaminated layer having a small thickness that cannot be visually recognized is formed. The phenomenon was confirmed by the test. It is considered that this is because the decomposition rate of the harmful substances by the photocatalyst 2 cannot keep up with the supply rate of the harmful substances contained in the gas G. When a polluted layer of harmful substances is formed on the surface of the photocatalyst 2, ultraviolet rays cannot reach the surface of the photocatalyst 2 with sufficient intensity due to the polluted layer, and the purifying action of the photocatalyst 2 cannot be sufficiently obtained.
 このため、気体Gへの紫外線の照射時間を十分に確保し、気体Gに含まれる有害物を紫外線で十分に分解することによって光触媒2による有害物の分解量を許容範囲内に収めることができる。また、光触媒2の表面に有害物が付着したとしても紫外線で分解できる程度の付着量に留めることができる。その結果、気体Gの流量が多い場合や気体Gに含まれる有害物の濃度が高い場合のように、単位時間当たりに分解すべき有害物の量が多い場合であっても、光触媒2の浄化能力を十分に発揮させ、気体Gに含まれる有害物を分解することが可能となる。 Therefore, by sufficiently securing the irradiation time of the ultraviolet rays to the gas G and sufficiently decomposing the harmful substances contained in the gas G with the ultraviolet rays, the decomposition amount of the harmful substances by the photocatalyst 2 can be kept within the allowable range. .. Further, even if a harmful substance adheres to the surface of the photocatalyst 2, it can be limited to such an amount that it can be decomposed by ultraviolet rays. As a result, even if the amount of harmful substances to be decomposed per unit time is large, such as when the flow rate of the gas G is high or the concentration of harmful substances contained in the gas G is high, the purification of the photocatalyst 2 is performed. It is possible to fully exert the ability and decompose harmful substances contained in the gas G.
 しかも、光触媒2近傍を流れた気体Gが優先的に筐体5の排出口8Bから排出される。このため、紫外線と光触媒2の双方によって有害物が分解された気体Gを筐体5の排出口8Bから優先的に排出することができる。 Moreover, the gas G flowing near the photocatalyst 2 is preferentially discharged from the discharge port 8B of the housing 5. Therefore, the gas G in which harmful substances are decomposed by both the ultraviolet rays and the photocatalyst 2 can be preferentially discharged from the discharge port 8B of the housing 5.
 尚、筐体5内において気体Gの光触媒2への接触機会が十分に確保できることが流体シミュレーションや流体実験等によって確認できれば、気体Gの流入口8Aを必ずしも光触媒2の近傍となるように局所的に配置しなくても良い。 If it is confirmed by a fluid simulation, a fluid experiment, or the like that a sufficient chance of contacting the gas G with the photocatalyst 2 can be ensured in the housing 5, the gas G inflow port 8A is locally located so as to be always near the photocatalyst 2. Need not be placed in
 すなわち、筐体5に流入した気体Gが第1の領域R1及び第2の領域R2に双方に導かれて最終的には紫外線に曝されながら光触媒2の近傍を流れ、光触媒2近傍を流れた気体Gが優先的に筐体5から排出されるように、筐体5に気体Gの流入口8Aと排出口8Bを形成することが肝要である。従って、気体Gの排出口8Bについては、上述したように光触媒2近傍に絞られることになる。 That is, the gas G that has flowed into the housing 5 is guided to both the first region R1 and the second region R2 and finally flows to the vicinity of the photocatalyst 2 while being exposed to ultraviolet rays, and flows near the photocatalyst 2. It is essential to form an inlet 8A and an outlet 8B for the gas G in the housing 5 so that the gas G is preferentially discharged from the housing 5. Therefore, the discharge port 8B of the gas G is narrowed to the vicinity of the photocatalyst 2 as described above.
 気体Gの流入口8A及び排出口8Bを筐体5の両端に形成する場合、紫外線が気体Gの流入口8A及び排出口8Bから漏れる可能性がある。そこで、気体Gの流入口8A及び排出口8Bから漏れる紫外線を外部から遮蔽する遮蔽部9A、9Bを設けることができる。図示された例では、横断面が矩形のボックス構造を有する第1の遮蔽部9Aで気体Gの流入口8Aが遮蔽されている。同様に、横断面が矩形のボックス構造を有する第2の遮蔽部9Bで気体Gの排出口8Bが遮蔽されている。 When the gas G inlet 8A and the gas outlet 8B are formed at both ends of the housing 5, ultraviolet rays may leak from the gas G inlet 8A and the gas outlet 8B. Therefore, it is possible to provide shielding portions 9A and 9B that shield ultraviolet rays leaking from the gas inlet 8A and the gas outlet 8B from the outside. In the illustrated example, the inflow port 8A for the gas G is shielded by the first shielding portion 9A having a box structure having a rectangular cross section. Similarly, the outlet 8B for the gas G is shielded by the second shield 9B having a box structure with a rectangular cross section.
 これにより、ユーザの安全性を確保することができる。特に、UV-C帯の紫外線を使用する場合には、UV-C帯の紫外線にユーザが曝される事態を確実に回避することができる。 This will ensure the safety of the user. In particular, when using UV-C band ultraviolet rays, it is possible to reliably avoid a situation in which the user is exposed to UV-C band ultraviolet rays.
 筐体5への気体Gの流入口8A及び筐体5からの気体Gの排出口8Bをそれぞれ第1の遮蔽部9A及び第2の遮蔽部9Bで遮蔽する場合には、第1の遮蔽部9Aに気体Gの流入口10Aを形成する一方、第2の遮蔽部9Bに気体Gの排出口10Bを形成することが必要となる。 When the inlet 8A of the gas G to the housing 5 and the outlet 8B of the gas G from the housing 5 are shielded by the first shielding portion 9A and the second shielding portion 9B, respectively, the first shielding portion It is necessary to form the inflow port 10A for the gas G in 9A and the exhaust port 10B for the gas G in the second shielding portion 9B.
 第1の遮蔽部9Aへの気体Gの流入口10Aは、外部への紫外線の漏れが無く、かつ浄化対象となる気体Gを浄化対象エリアから効率的に取込むことが可能な位置に形成することが適切である。同様に、第2の遮蔽部9Bからの気体Gの排出口10Bは、外部への紫外線の漏れが無く、かつ浄化後における気体Gを浄化対象エリアに効率的に供給することが可能な位置に形成することが適切である。 The inlet 10A for the gas G to the first shielding portion 9A is formed at a position where there is no leakage of ultraviolet rays to the outside and the gas G to be purified can be efficiently taken in from the purification target area. Is appropriate. Similarly, the outlet 10B for the gas G from the second shield 9B is located at a position where there is no leakage of ultraviolet rays to the outside and the gas G after purification can be efficiently supplied to the purification target area. It is suitable to form.
 このため、具体例として、図示されるように第1の遮蔽部9Aの側面に気体Gの流入口10Aを形成する一方、第2の遮蔽部9Bの側面に気体Gの排出口10Bを形成することができる。 Therefore, as a specific example, as shown in the drawing, an inlet 10A for the gas G is formed on the side surface of the first shield 9A, while an outlet 10B for the gas G is formed on the side surface of the second shield 9B. be able to.
 第1の遮蔽部9A及び第2の遮蔽部9Bの少なくとも一方の構造をボックス構造とする場合には、内部にファン(送風機)11を設けることができる。換言すれば、第1の遮蔽部9A及び第2の遮蔽部9Bの少なくとも一方を、ファン11のケーシングとして利用することができる。図示された例では、気体Gの吸気側である第1の遮蔽部9Aの内部にファン11が配置されている。もちろん、気体Gの排出側に当たる第2の遮蔽部9Bの内部にファン11を配置しても良いし、第1の遮蔽部9A及び第2の遮蔽部9Bの双方にファン11を配置しても良い。 When the structure of at least one of the first shield 9A and the second shield 9B is a box structure, a fan (blower) 11 can be provided inside. In other words, at least one of the first shield 9A and the second shield 9B can be used as the casing of the fan 11. In the illustrated example, the fan 11 is arranged inside the first shielding portion 9A on the intake side of the gas G. Of course, the fan 11 may be arranged inside the second shield 9B that is on the discharge side of the gas G, or the fan 11 may be arranged on both the first shield 9A and the second shield 9B. good.
 第1の遮蔽部9A及び第2の遮蔽部9Bの少なくとも一方は、浄化装置1の駆動に必要な回路類のケーシングとしても利用することができる。図示された例では、直流電源から供給される直流電流を交流電流に変換してランプ4に供給するインバータ基板12と、ファン11の強弱を調節するためのスイッチ基板13が、第2の遮蔽部9Bの内部に収納されている。また、第2の遮蔽部9Bの端面の外部には、浄化装置1の動作をオン状態とオフ状態との間で切換えるための電源スイッチ14の他、ファン11の強弱を調整するための調整スイッチ15が設けられている。 At least one of the first shielding unit 9A and the second shielding unit 9B can also be used as a casing of circuits necessary for driving the purification device 1. In the illustrated example, the inverter board 12 for converting the DC current supplied from the DC power supply into the AC current and supplying the AC current to the lamp 4, and the switch board 13 for adjusting the strength of the fan 11 are the second shield part. It is stored inside 9B. In addition to the power switch 14 for switching the operation of the purifying device 1 between the ON state and the OFF state, an adjustment switch for adjusting the strength of the fan 11 is provided outside the end surface of the second shielding unit 9B. 15 are provided.
 このため、ユーザは、単位時間当たりの気体Gの浄化能力を増加させたい場合には、ファン11の回転数を増加させて気体Gの取込流量を増やす一方、ファン11の振動や騒音を低減させたい場合には、ファン11の回転数を低減させるといった調節を行うことができる。 Therefore, when the user wants to increase the purification capacity of the gas G per unit time, the rotation speed of the fan 11 is increased to increase the intake flow rate of the gas G, while the vibration and noise of the fan 11 are reduced. If desired, it is possible to make an adjustment such as reducing the rotation speed of the fan 11.
 浄化装置1による気体Gの浄化能力は、上述したように光触媒2による有害物の分解能力、紫外線の波長及び照度並びに気体Gの筐体5内における滞留時間等の条件に依存して変化する。このため、浄化装置1による気体Gの浄化能力と、気体Gに含まれる有害物の濃度に応じて、気体Gの流量を適切な流量に設定することが適切である。すなわち、光触媒2及び紫外線の浄化能力が高く、筐体5内における気体Gの滞留時間が長い程、気体Gの流量を増加させることができる。逆に、目的とする流量の気体Gに含まれる所定の濃度の有害物を十分に分解できるように、光触媒2の種類及び表面積、紫外線の波長及び照度並びに気体Gの流入口8Aと排出口10Bの位置、サイズ及び形状を含む筐体5の形状等を決定することが重要である。 The purification capability of the gas G by the purification device 1 changes depending on conditions such as the ability of the photocatalyst 2 to decompose harmful substances, the wavelength and illuminance of ultraviolet rays, and the residence time of the gas G in the housing 5 as described above. Therefore, it is appropriate to set the flow rate of the gas G to an appropriate flow rate in accordance with the purification capability of the gas G by the purification device 1 and the concentration of harmful substances contained in the gas G. That is, the flow rate of the gas G can be increased as the photocatalyst 2 and the ultraviolet ray purification capability are high and the residence time of the gas G in the housing 5 is long. On the contrary, the type and surface area of the photocatalyst 2, the wavelength and illuminance of ultraviolet rays, and the inflow port 8A and the exhaust port 10B of the gas G are sufficiently decomposed so that a harmful substance having a predetermined concentration contained in the gas G having a desired flow rate can be sufficiently decomposed. It is important to determine the shape of the housing 5 including the position, size and shape of the.
 以上のような浄化装置1は、筐体5内に形成される第1の領域R1において第1段階として紫外線のみで気体Gを浄化する一方、筐体5内に形成される第2の領域R2において第2段階として紫外線で活性化した光触媒2と紫外線での双方の作用で気体Gを浄化するようにし、光触媒2と紫外線の双方の作用で浄化された気体Gを筐体5から選択的又は優先的に排出するようにしたものである。 The purification device 1 as described above purifies the gas G by only ultraviolet rays as the first step in the first region R1 formed in the housing 5, while the second region R2 formed in the housing 5 is used. In the second step, the gas G is purified by the action of both the photocatalyst 2 activated by the ultraviolet ray and the ultraviolet ray, and the gas G purified by the action of both the photocatalyst 2 and the ultraviolet ray is selectively or It is designed to be discharged preferentially.
(効果)
 上述した浄化装置1によれば、気体Gに分解対象となる有害物が多く含まれている場合であっても、有害物の一部は紫外線で分解されるため、光触媒2によって分解対象となる有害物の量を減らすことができる。このため、光触媒2の表面に有害物が付着して汚染層が形成され、光触媒2による気体Gの浄化作用が滅失するといった事態を回避し、光触媒2の性能を十分発揮させることができる。その結果、気体Gの浄化能力を向上させることができる。
(effect)
According to the above-described purification apparatus 1, even when the gas G contains a large amount of harmful substances to be decomposed, a part of the harmful substances is decomposed by the ultraviolet rays, and therefore the photocatalyst 2 becomes a decomposition target. The amount of harmful substances can be reduced. For this reason, it is possible to avoid the situation in which harmful substances adhere to the surface of the photocatalyst 2 to form a contaminated layer and the purifying action of the gas G by the photocatalyst 2 is lost, and the performance of the photocatalyst 2 can be sufficiently exhibited. As a result, the purification capability of the gas G can be improved.
 しかも、光触媒2は板状部材3にコーティングされるため、多孔質のフィルタ内に気体を導く場合に生じるフィルタの目詰まりが無い。このため、メンテナンスが非常に容易である。 Moreover, since the photocatalyst 2 is coated on the plate-like member 3, there is no clogging of the filter that occurs when introducing gas into the porous filter. Therefore, maintenance is very easy.
(第2の実施形態)
 図7は本発明の第2の実施形態に係る浄化装置の構成図であり、図8は図7に示す浄化装置の位置B-Bにおける横断面図である。
(Second embodiment)
FIG. 7 is a configuration diagram of a purifying device according to a second embodiment of the present invention, and FIG. 8 is a cross-sectional view of the purifying device shown in FIG. 7 at a position BB.
 図7に示された第2の実施形態における浄化装置1Aでは、光触媒2でコーティングされた板状部材3を筐体5内に複数枚配置し、共通のランプ4で各板状部材3に紫外線を照射できるようにした点が第1の実施形態における浄化装置1と相違する。第2の実施形態における浄化装置1Aの他の構成及び作用については第1の実施形態における浄化装置1と実質的に異ならないため同一の構成又は対応する構成については同符号を付して説明を省略する。 In the purifying apparatus 1A according to the second embodiment shown in FIG. 7, a plurality of plate-shaped members 3 coated with the photocatalyst 2 are arranged in a housing 5, and a UV light is emitted to each plate-shaped member 3 by a common lamp 4. Is different from the purification device 1 in the first embodiment. The other configurations and operations of the purifying device 1A in the second embodiment are substantially the same as those of the purifying device 1 in the first embodiment, and therefore, the same or corresponding configurations will be denoted by the same reference numerals and will not be described. Omit it.
 図7及び図8に例示されるように横断面の形状が矩形の筐体5内に4枚の板状部材3を配置することができる。すなわち、筐体5内の各面に板状部材3を固定することができる。この場合、筒状の筐体5内の中心に棒状のランプ4を配置すれば、1つのランプ4で各板状部材3をコーティングする光触媒2に紫外線を照射することができる。 As illustrated in FIGS. 7 and 8, four plate-like members 3 can be arranged in a casing 5 having a rectangular cross section. That is, the plate-shaped member 3 can be fixed to each surface in the housing 5. In this case, if the rod-shaped lamp 4 is arranged in the center of the cylindrical casing 5, the photocatalyst 2 coating each plate-like member 3 with one lamp 4 can be irradiated with ultraviolet rays.
 もちろん、筐体5の横断面の形状は矩形に限らず、多角形としたり、曲線と直線を連結した閉じた線で描かれる形状とすることも可能である。そして、横断面の形状が筒状である筐体5の内部に気体Gの流路6を形成するとともに、光触媒2で表面がコーティングされた任意数の板状部材3を配置し、筒状の筐体5の内部に棒状のランプ4を配置することができる。 Of course, the shape of the cross section of the housing 5 is not limited to a rectangle, but it may be a polygon or a shape drawn by a closed line connecting a curved line and a straight line. Then, the flow path 6 for the gas G is formed inside the housing 5 having a tubular cross section, and an arbitrary number of plate-shaped members 3 whose surfaces are coated with the photocatalyst 2 are arranged to form a tubular shape. The rod-shaped lamp 4 can be arranged inside the housing 5.
 図9は図7に示す筐体5の右側面図であり、図10は図7に示す筐体5の左側面図である。 FIG. 9 is a right side view of the housing 5 shown in FIG. 7, and FIG. 10 is a left side view of the housing 5 shown in FIG.
 横断面が矩形の筐体5内の各面に板状部材3が固定される場合には、板状部材3の数及び位置に合わせて気体Gの流入口8A及び排出口8Bを、それぞれ板状部材7A及び板状部材7Bに設けることが適切である。具体的には、図9に示すように、各板状部材3の幅に対応する長さを有する複数のスリットを気体Gの流入口8Aとして、光触媒2の近傍となるように板状部材7Aに設けることができる。同様に、図10に示すように、各板状部材3の幅に対応する長さを有する複数のスリットを気体Gの排出口8Bとして、光触媒2の近傍となるように板状部材7Bに設けることができる。この場合においても、筐体5の排出口8Bは、光触媒2の表面(筐体5内に露出した面)と連続的に接続された面を備えることが好ましい。これによって、気体Gは、すなわち、筐体5の排出口8Bから所定の距離間、第2の領域R2を通過することになり、浄化の最終段階において光触媒2と気体Gとの接触機会を確保することが可能となる。 When the plate member 3 is fixed to each surface of the housing 5 having a rectangular cross section, the gas G inflow port 8A and the gas G discharge port 8B are respectively set in accordance with the number and position of the plate members 3. It is suitable to provide the member 7A and the plate member 7B. Specifically, as shown in FIG. 9, a plurality of slits each having a length corresponding to the width of each plate-shaped member 3 are used as the inflow port 8A of the gas G, and the plate-shaped member 7A is located near the photocatalyst 2. Can be provided. Similarly, as shown in FIG. 10, a plurality of slits having a length corresponding to the width of each plate-shaped member 3 are provided on the plate-shaped member 7B so as to be in the vicinity of the photocatalyst 2 as the discharge port 8B of the gas G. be able to. Also in this case, it is preferable that the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5). As a result, the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
 これにより、筐体5内において気体Gを光触媒2でコーティングされた板状部材3の表面付近に導く一方、光触媒2近傍を流れた気体Gを選択的又は優先的に筐体5から排出することができる。加えて、排出口8Bを絞って局所的に形成することによって、排出口8Bを絞らない場合に比べて筐体5内に流入した気体Gの滞留時間を長くすることができる。 As a result, the gas G is guided to the vicinity of the surface of the plate-like member 3 coated with the photocatalyst 2 in the housing 5, while the gas G flowing near the photocatalyst 2 is selectively or preferentially discharged from the housing 5. You can In addition, by narrowing the discharge port 8B and locally forming it, the residence time of the gas G flowing into the housing 5 can be made longer than in the case where the discharge port 8B is not narrowed.
 また、光触媒2で気体Gに含まれる有害物を分解することが可能な距離よりも離れた位置にランプ4を配置することによって、第1の実施形態と同様に共通かつ単一の筐体5の内部に紫外線で有害物を分解する第1の領域R1と、紫外線で活性化した光触媒2と紫外線での双方の作用で有害物を分解する第2の領域R2をそれぞれ流路6の幅方向の異なる位置に形成することができる。 Further, by disposing the lamp 4 at a position farther than the distance at which the photocatalyst 2 can decompose harmful substances contained in the gas G, the common and single housing 5 can be provided as in the first embodiment. A first region R1 for decomposing harmful substances by ultraviolet rays and a second region R2 for decomposing harmful substances by the action of both the photocatalyst 2 activated by ultraviolet rays and ultraviolet rays are respectively provided in Can be formed at different positions.
 活性化した光触媒2の作用で有害物を分解できる領域は、紫外線に曝される光触媒2の表面から一定の範囲内となる。このため、図8乃至図10に例示されるように筐体5内の各面に板状部材3が固定される場合には、第2の領域R2は概ね筒状の領域となる。他方、紫外線はランプ4の周囲360度方向に照射されるため、紫外線のみで有害物を分解する第1の領域R1も概ね筒状の領域となる。すなわち、ランプ4を中心として内側に筒状の第1の領域R1が形成され、第1の領域R1の外側に筒状の第2の領域R2が形成される。また、紫外線が届くが活性化した光触媒2による反応が十分に起きない4隅の領域についても、紫外線のみで有害物を分解する第1の領域R1として機能し得る。 The area where the harmful substances can be decomposed by the action of the activated photocatalyst 2 is within a certain range from the surface of the photocatalyst 2 exposed to ultraviolet rays. Therefore, when the plate member 3 is fixed to each surface of the housing 5 as illustrated in FIGS. 8 to 10, the second region R2 is a substantially cylindrical region. On the other hand, since the ultraviolet rays are irradiated in the direction of 360 degrees around the lamp 4, the first region R1 that decomposes harmful substances only by the ultraviolet rays is also a substantially cylindrical region. That is, the cylindrical first region R1 is formed inside the lamp 4, and the cylindrical second region R2 is formed outside the first region R1. Further, the four corner regions where ultraviolet rays reach but the reaction by the activated photocatalyst 2 does not sufficiently occur can function as the first region R1 that decomposes harmful substances only by ultraviolet rays.
 各排出口8の位置についても第1の実施形態と同様に、各光触媒2の表面を通り、気体Gの各排出方向に平行な直線がそれぞれ各排出口8Bの内面を通るように決定したり、或いは、光触媒2の表面を通り、気体Gの各排出方向に平行な直線がそれぞれ各排出口8Bを通るように決定することによって、それぞれ光触媒2の近傍とすることができる。 Similarly to the first embodiment, the position of each discharge port 8 is determined such that a straight line passing through the surface of each photocatalyst 2 and parallel to each discharge direction of the gas G passes through the inner surface of each discharge port 8B. Alternatively, by determining that a straight line that passes through the surface of the photocatalyst 2 and that is parallel to each discharge direction of the gas G passes through each discharge port 8B, it can be made to be near the photocatalyst 2.
 以上のような第2の実施形態によれば、第1の実施形態と比較して光触媒2の表面積を大きくすることができる。このため、単位時間当たりに浄化することが可能な気体Gの体積を増加することができる。 According to the second embodiment as described above, the surface area of the photocatalyst 2 can be increased as compared with the first embodiment. Therefore, the volume of the gas G that can be purified per unit time can be increased.
(第3の実施形態)
 図11は本発明の第3の実施形態に係る浄化装置の構成図であり、図12は図11に示す浄化装置の位置C-Cにおける横断面図である。
(Third Embodiment)
11 is a configuration diagram of a purifying device according to a third embodiment of the present invention, and FIG. 12 is a transverse cross-sectional view of the purifying device shown in FIG. 11 at a position CC.
 図11に示された第3の実施形態における浄化装置1Bでは、板状部材3を筒状に形成し、板状部材3の内面を光触媒2でコーティングした点が第1の実施形態における浄化装置1と相違する。第3の実施形態における浄化装置1Bの他の構成及び作用については第1の実施形態における浄化装置1と実質的に異ならないため同一の構成又は対応する構成については同符号を付して説明を省略する。 In the purification device 1B according to the third embodiment shown in FIG. 11, the plate-shaped member 3 is formed in a tubular shape, and the inner surface of the plate-shaped member 3 is coated with the photocatalyst 2. The purification device according to the first embodiment. Different from 1. The other configurations and operations of the purifying device 1B in the third embodiment are substantially the same as those of the purifying device 1 in the first embodiment, and therefore, the same or corresponding components are designated by the same reference numerals and described. Omit it.
 図11に示すように板状部材3を筒状に形成して内面を光触媒2でコーティングする場合には、筒状に形成された板状部材3の内部を気体Gの流路6とすることができる。また、筒状に形成された板状部材3の内部に棒状のランプ4を配置することによって、共通のランプ4で板状部材3の内面をコーティングする光触媒2の各部分に紫外線を照射することができる。 As shown in FIG. 11, when the plate-shaped member 3 is formed in a tubular shape and the inner surface is coated with the photocatalyst 2, the inside of the plate-shaped member 3 formed in the tubular shape is used as the flow path 6 for the gas G. You can Also, by arranging the rod-shaped lamp 4 inside the plate-shaped member 3 formed in a cylindrical shape, each part of the photocatalyst 2 that coats the inner surface of the plate-shaped member 3 with the common lamp 4 is irradiated with ultraviolet rays. You can
 板状部材3の横断面の形状は、四角筒状や六角筒状のような角筒状としても良いが、図11及び図12に例示されるように円筒状とすることが紫外線を効率的に照射する観点から好ましい。すなわち、板状部材3を円筒状に形成し、円筒状の板状部材3の内部の中心位置に棒状のランプ4を配置すれば、光触媒2の各部分に均一に紫外線を照射することができる。また、紫外線の反射光を再び気体Gの浄化及び光触媒2の活性化に利用することも容易となる。 The shape of the cross section of the plate-like member 3 may be a rectangular tube shape such as a square tube shape or a hexagonal tube shape, but it is efficient to make ultraviolet rays effective as a cylindrical shape as illustrated in FIGS. 11 and 12. It is preferable from the viewpoint of irradiation to That is, if the plate-shaped member 3 is formed in a cylindrical shape and the rod-shaped lamp 4 is arranged at the center position inside the cylindrical plate-shaped member 3, each part of the photocatalyst 2 can be uniformly irradiated with ultraviolet rays. .. Further, it becomes easy to utilize the reflected light of the ultraviolet ray again for purifying the gas G and activating the photocatalyst 2.
 図13は図11に示す筐体5の右側面図であり、図14は図11に示す筐体5の左側面図である。 FIG. 13 is a right side view of the housing 5 shown in FIG. 11, and FIG. 14 is a left side view of the housing 5 shown in FIG.
 板状部材3を円筒状に形成する場合には、筐体5についても円筒状に形成することが板状部材3の設置を容易にする観点から合理的である。この場合、棒状のランプ4を両端で支持しつつ筐体5の両端を閉塞する板状部材7A及び板状部材7Bの構造は円盤状となる。 When the plate-shaped member 3 is formed in a cylindrical shape, it is reasonable to form the housing 5 in a cylindrical shape from the viewpoint of facilitating the installation of the plate-shaped member 3. In this case, the plate-shaped member 7A and the plate-shaped member 7B that support the rod-shaped lamp 4 at both ends and close both ends of the housing 5 have a disk shape.
 板状部材7Aに形成すべき気体Gの流入口8A及び板状部材7Bに形成すべき気体Gの排出口8Bの位置、形状及び数は、第1及び第2の実施形態と同様に、流路6に流入した気体Gが光触媒2の近傍に導かれる一方、光触媒2の近傍を流れた気体Gが選択的又は優先的に筐体5から排出され、かつ筐体5内における気体Gの滞留時間が長くなるように決定することが適切である。 The position, shape and number of the gas G inlet 8A to be formed in the plate member 7A and the gas G outlet 8B to be formed in the plate member 7B are the same as those in the first and second embodiments. The gas G flowing into the passage 6 is guided to the vicinity of the photocatalyst 2, while the gas G flowing near the photocatalyst 2 is selectively or preferentially discharged from the housing 5, and the gas G remains in the housing 5. It is appropriate to decide that the time will be long.
 円筒状の板状部材3の内面を形成する光触媒2の近傍に気体Gを導くためには、気体Gを光触媒2の表面に平行な向きで光触媒2の近傍に導くようにすればよい。他方、光触媒2の近傍を流れた気体Gを選択的又は優先的に筐体5から排出するためには、光触媒2の近傍で気体Gを筐体5から排出すれば良い。また、筐体5内における気体Gの滞留時間を長くするためには、気体Gの排出口8Bの断面積よりも筐体5及び板状部材3内に形成される気体Gの流路6の断面積を大きくすれば良い。 In order to guide the gas G to the vicinity of the photocatalyst 2 forming the inner surface of the cylindrical plate-shaped member 3, the gas G may be guided to the vicinity of the photocatalyst 2 in a direction parallel to the surface of the photocatalyst 2. On the other hand, in order to selectively or preferentially discharge the gas G flowing in the vicinity of the photocatalyst 2 from the housing 5, the gas G may be discharged from the housing 5 in the vicinity of the photocatalyst 2. Further, in order to prolong the residence time of the gas G in the housing 5, the flow path 6 of the gas G formed in the housing 5 and the plate-shaped member 3 is larger than the cross-sectional area of the discharge port 8B of the gas G. The cross-sectional area should be increased.
 そこで、例えば図13に例示されるように同一円上に配置された複数の円形の貫通孔を気体Gの流入口8Aとして光触媒2の近傍となる板状部材7Aの位置に局所的に形成することができる。同様に、例えば図14に例示されるように同一円上に配置された複数の円形の貫通孔を気体Gの排出口8Bとして光触媒2の近傍となる板状部材7Bの位置に局所的に形成することができる。或いは、同一円上に配置された複数の円形の貫通孔に代えて、同一円上に複数の円弧状に湾曲した長円形の貫通孔又はスリットを形成するようにしてもよい。 Therefore, for example, as illustrated in FIG. 13, a plurality of circular through holes arranged on the same circle are locally formed at the position of the plate-shaped member 7A in the vicinity of the photocatalyst 2 as the gas G inlet 8A. be able to. Similarly, for example, as shown in FIG. 14, a plurality of circular through holes arranged on the same circle are locally formed at the position of the plate member 7B in the vicinity of the photocatalyst 2 as the discharge port 8B of the gas G. can do. Alternatively, instead of the plurality of circular through holes arranged on the same circle, a plurality of elliptical through holes or slits curved in an arc shape may be formed on the same circle.
 光触媒2及び光触媒2で囲まれた流路6が円筒状又は角筒状のように筒状である場合には、図12乃至図14に例示されるように紫外線のみで直接又は間接的に有害物が分解される第1の領域R1がランプ4に隣接する筒状の領域として形成され、紫外線と活性化された光触媒2の作用で有害物が分解される第2の領域R2が第1の領域R1の外側で、かつ光触媒2に隣接する筒状の領域として形成される。従って、光触媒2が円筒状であれば、円筒状の第2の領域R2から選択的又は優先的に気体Gが排出されるように、板状部材7Bの環状の領域に気体Gの排出口8Bが形成されることになる。 When the photocatalyst 2 and the flow path 6 surrounded by the photocatalyst 2 have a cylindrical shape such as a cylindrical shape or a rectangular tubular shape, as shown in FIGS. The first region R1 in which the substance is decomposed is formed as a cylindrical region adjacent to the lamp 4, and the second region R2 in which the harmful substance is decomposed by the action of the ultraviolet ray and the activated photocatalyst 2 is the first region R1. It is formed as a tubular region outside the region R1 and adjacent to the photocatalyst 2. Therefore, if the photocatalyst 2 has a cylindrical shape, the gas G discharge port 8B is provided in the annular area of the plate member 7B so that the gas G is selectively or preferentially discharged from the cylindrical second area R2. Will be formed.
 筐体5が円筒状である場合には、紫外線の漏れを防止するための第1の遮蔽部9A及び第2の遮蔽部9Bの構造についても円筒状のボックス構造とすることができる。このため、第1の遮蔽部9A及び第2の遮蔽部9Bの湾曲した側面にそれぞれ気体Gの流入口10A及び排出口10Bを形成することができる。尚、図11に示す例では、同一円上に配置された複数の円形の貫通孔が気体Gの流入口10A及び排出口10Bとして設けられている。 When the housing 5 is cylindrical, the structure of the first shielding portion 9A and the second shielding portion 9B for preventing leakage of ultraviolet rays can also be a cylindrical box structure. Therefore, the inflow port 10A and the exhaust port 10B for the gas G can be formed on the curved side surfaces of the first shielding unit 9A and the second shielding unit 9B, respectively. In the example shown in FIG. 11, a plurality of circular through holes arranged on the same circle are provided as the gas G inlet 10A and the gas outlet 10B.
 以上のような第3の実施形態によれば、光触媒2の表面積を大きくすることができるのみならず、板状部材3を円筒状に形成すれば紫外線を効率的に光触媒2に照射することが可能となる。このため、単位時間当たりに浄化することが可能な気体Gの体積を一層増加することができる。 According to the third embodiment as described above, not only the surface area of the photocatalyst 2 can be increased, but also the photocatalyst 2 can be efficiently irradiated with ultraviolet rays if the plate-shaped member 3 is formed in a cylindrical shape. It will be possible. Therefore, the volume of the gas G that can be purified per unit time can be further increased.
 実際に、珪酸化物と二酸化チタンとを、二酸化チタンの重量が珪酸化物の重量の2倍以上5倍以下の重量となるように混合して成る光触媒2で円筒状の板状部材3の内面を形成し、円筒状の光触媒2の内面にUV-C帯の紫外線を照射する浄化装置1Bを試作した。また、排出口8Bのサイズと形状を変えて2種類の浄化装置1Bを試作し、一方の浄化装置1Bの排出口8Bについては図14に例示されるように直径が5mmの円形の貫通孔を同一円上に配置したものとし、他方の浄化装置1Bの排出口8Bについては幅が3mmの円弧状のスリットとした。 Actually, the inner surface of the cylindrical plate-like member 3 is covered with the photocatalyst 2 which is obtained by mixing silica oxide and titanium dioxide so that the weight of titanium dioxide is 2 times or more and 5 times or less the weight of silica oxide. A prototype of the purifying device 1B, which is formed and irradiates the inner surface of the cylindrical photocatalyst 2 with ultraviolet rays in the UV-C band, was manufactured. Also, two types of purifying devices 1B were prototyped by changing the size and shape of the outlet 8B, and the outlet 8B of one of the purifying devices 1B had a circular through hole with a diameter of 5 mm as illustrated in FIG. It is assumed that they are arranged on the same circle, and the discharge port 8B of the other purification device 1B is an arcuate slit having a width of 3 mm.
 そして、試作した浄化装置1Bを用いて濃度が25~30ppmのアセトアルデヒドを含む気体Gと、濃度が25~30ppmのホルムアルデヒドを含む気体Gの浄化試験を行った。その結果、いずれの浄化装置1Bでもアセトアルデヒド及びホルムアルデヒドを分解除去できることが確認された。また、インフルエンザウイルスを含む気体Gを対象とする試験も行ったところ、いずれの浄化装置1Bでもインフルエンザウイルスを無害化できることが確認された。 Then, using the prototype purification device 1B, a purification test was performed on the gas G containing acetaldehyde with a concentration of 25 to 30 ppm and the gas G containing formaldehyde with a concentration of 25 to 30 ppm. As a result, it was confirmed that acetaldehyde and formaldehyde can be decomposed and removed by any of the purification devices 1B. Further, when a test was conducted on the gas G containing the influenza virus, it was confirmed that the influenza virus could be rendered harmless by any of the purification devices 1B.
 すなわち、気体Gが凹凸の無い光触媒2の近傍を通過するのみでも、紫外線による一次的な浄化と、排出される気体Gを光触媒2の近傍に絞ることによって、実用的なレベルで気体Gを浄化できることが確認された。 That is, even if the gas G only passes near the photocatalyst 2 having no unevenness, the gas G is purified at a practical level by performing primary purification by ultraviolet rays and squeezing the discharged gas G near the photocatalyst 2. It was confirmed that it was possible.
 特に、幅が3mmの円弧状のスリットを排出口8Bとする浄化装置1Bの分解性能は円形の貫通孔を排出口8Bとする浄化装置1Bの分解性能に比べて一層改善され、アセトアルデヒド及びホルムアルデヒドのいずれについても30分程度で分解除去できることが確認された。また、、幅が3mmの円弧状のスリットを排出口8Bとする浄化装置1Bを用いると、インフルエンザウイルスを20分で無害化できることも確認された。この結果からも、排出口8Bの形状をスリットにすると円形の貫通孔とする場合に比べて有害物の分解性能を向上できるという性質と、排出口8Bの幅Bを小さくすると有害物の分解性能を向上できるという性質を確認することができる。 In particular, the decomposing performance of the purifying device 1B having an arc-shaped slit having a width of 3 mm as the discharge port 8B is further improved as compared with the decomposing performance of the purifying device 1B having a circular through hole as the discharge port 8B. It was confirmed that each of them could be decomposed and removed in about 30 minutes. It was also confirmed that the influenza virus could be rendered harmless in 20 minutes by using the purifying device 1B in which the discharge opening 8B was an arc-shaped slit having a width of 3 mm. From these results, the property that the discharge port 8B can be improved in the performance of decomposing harmful substances as compared with the case where the shape of the discharge port 8B is formed as a circular through hole, and the property of decomposing the harmful substance when the width B of the discharge port 8B is reduced. It can be confirmed that the property can improve.
 尚、第3の実施形態において、第1の実施形態において説明したように板状部材3で筐体5を構成することもできる。但し、筐体5としての強度を確保するためには、板状部材3の厚さを十分な厚さとすることが必要になる。しかしながら板状部材3を構成する素材の候補となるチタン板は強度が高く、板厚が厚くなる程、成形加工が困難となる。このため、強度を担う筐体5については板厚を厚くしても成形加工が容易なアルミニウム等の材料を用いて構成する一方、板状部材3として高価なチタン板を用いる場合には薄型にして容易に曲げられるようにした方が、素材の有効利用に繋がる。 In addition, in the third embodiment, the housing 5 can be configured by the plate-shaped member 3 as described in the first embodiment. However, in order to secure the strength of the housing 5, it is necessary to make the thickness of the plate member 3 sufficient. However, the titanium plate that is a candidate for the material forming the plate-shaped member 3 has high strength, and the thicker the plate, the more difficult the forming process becomes. For this reason, the casing 5 that bears the strength is made of a material such as aluminum which is easy to form even if the plate thickness is made thick, while it is made thin when an expensive titanium plate is used as the plate-shaped member 3. If you can bend it easily, it will lead to effective use of the material.
(第4の実施形態)
 図15は本発明の第4の実施形態に係る浄化装置の構成を示す縦断面面であり、図16は図15に示す浄化装置の左側面図である。
(Fourth Embodiment)
FIG. 15 is a vertical cross-sectional view showing the configuration of the purification device according to the fourth embodiment of the present invention, and FIG. 16 is a left side view of the purification device shown in FIG.
 図15及び図16に示された第4の実施形態における浄化装置1Cでは、光触媒2に依らず紫外線の作用によって有害物が分解される第1の領域R1と、紫外線と活性化した光触媒2の双方の作用によって有害物が分解される第2の領域R2とを、第1の領域R1が上流側となり第2の領域R2が下流側となるように流路6の長さ方向の異なる位置に形成した点が上述した第1乃至第3の実施形態における浄化装置1、1A、1Bと相違する。第4の実施形態における浄化装置1Cの他の構成及び作用については第1乃至第3の実施形態における浄化装置1、1A、1Bと実質的に異ならないため筐体5の内部における構成のみ図示し、同一の構成又は対応する構成については同符号を付して説明を省略する。 In the purifying apparatus 1C according to the fourth embodiment shown in FIGS. 15 and 16, the first region R1 in which harmful substances are decomposed by the action of ultraviolet rays regardless of the photocatalyst 2 and the photocatalyst 2 activated by ultraviolet rays. The second region R2 in which harmful substances are decomposed by both actions is located at different positions in the longitudinal direction of the flow path 6 so that the first region R1 is on the upstream side and the second region R2 is on the downstream side. The formed points are different from the purification devices 1, 1A, and 1B in the first to third embodiments described above. Other configurations and operations of the purifying device 1C in the fourth embodiment are substantially the same as those of the purifying devices 1, 1A, 1B in the first to third embodiments, so only the configuration inside the housing 5 is shown. The same or corresponding components are designated by the same reference numerals and the description thereof will be omitted.
 図15及び図16に例示されるように、紫外線のみで有害物を直接又は間接的に分解する第1の領域R1を、紫外線と活性化した光触媒2で有害物を分解する第2の領域R2の上流側に設けることもできる。すなわち、第1の流路6Aで第1の領域R1を形成する一方、第2の流路6Bで第2の領域R2を形成し、第1の流路6Aの下流側に第2の流路6Bを配置することができる。この場合においても、筐体5の排出口8Bは、光触媒2の表面(筐体5内に露出した面)と連続的に接続された面を備えることが好ましい。これによって、気体Gは、すなわち、筐体5の排出口8Bから所定の距離間、第2の領域R2を通過することになり、浄化の最終段階において光触媒2と気体Gとの接触機会を確保することが可能となる。 As illustrated in FIGS. 15 and 16, the first region R1 in which harmful substances are directly or indirectly decomposed only by ultraviolet rays is changed to the second region R2 in which harmful substances are decomposed by the photocatalyst 2 activated by ultraviolet rays. It can also be provided upstream. That is, the first flow path 6A forms the first region R1 while the second flow path 6B forms the second region R2, and the second flow path is provided downstream of the first flow path 6A. 6B can be placed. Also in this case, it is preferable that the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5). As a result, the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
 尚、図15及び図16に示す例では、単一の筐体5内に第1の領域R1を形成する第1の流路6Aと、第2の領域R2を形成する第2の流路6Bが形成されているが別々の筐体内に第1の領域R1を形成する第1の流路6Aと、第2の領域R2を形成する第2の流路6Bを形成しても良い。従って、流路6の長さ方向に複数のランプ4を配置するようにしても良い。 In the example shown in FIGS. 15 and 16, the first flow passage 6A forming the first region R1 and the second flow passage 6B forming the second region R2 in the single housing 5. However, the first flow path 6A forming the first region R1 and the second flow path 6B forming the second region R2 may be formed in separate housings. Therefore, a plurality of lamps 4 may be arranged in the length direction of the flow path 6.
 また、図15及び図16に示す例では、光触媒2とランプ4との間における距離が光触媒2の反応エリア以下となるように数mm以内に決定されているため、第2の流路6Bの出口となる排出口8Bを絞らずに形成することができる。すなわち、筐体5のリング状の開口端をそのまま排出口8Bとしても、光触媒2近傍を流れた気体Gのみを排出することが可能である。 In addition, in the example shown in FIGS. 15 and 16, the distance between the photocatalyst 2 and the lamp 4 is determined within a few mm so that the distance is equal to or less than the reaction area of the photocatalyst 2. It is possible to form the discharge port 8B serving as an outlet without throttling. That is, even if the ring-shaped opening end of the casing 5 is used as the discharge port 8B as it is, only the gas G flowing in the vicinity of the photocatalyst 2 can be discharged.
 図15及び図16に示す例では、光触媒2が円筒状となっているが、横断面が円形でない筒状や単一又は複数の平板状である場合には、必要に応じて光触媒2の近傍のみに排出口8Bを形成するようにしても良い。すなわち、第1の領域R1を、第2の領域R2に対して流路6の長さ方向に異なる位置に加えて、流路6の幅方向に異なる位置にも形成することができる。換言すれば、第1の流路6Aで第1の領域R1を形成するのみならず、第2の流路6Bに第1の領域R1と第2の領域R2の双方を形成するようにしても良い。 In the example shown in FIGS. 15 and 16, the photocatalyst 2 has a cylindrical shape. However, when the photocatalyst 2 has a cylindrical shape whose cross section is not circular, or a single or a plurality of flat plates, the vicinity of the photocatalyst 2 is necessary. The discharge port 8B may be formed only in the above. That is, the first region R1 can be formed not only at a position different from the second region R2 in the length direction of the flow channel 6 but also at a position different from the second region R2 in the width direction of the flow channel 6. In other words, not only the first region R1 is formed in the first channel 6A, but both the first region R1 and the second region R2 are formed in the second channel 6B. good.
 第1の領域R1を第2の領域R2の上流側に配置すると、筐体5の流入口8Aに流入した気体Gは、第1の領域R1を形成する第1の流路6Aを流れて光触媒2と接触せずに紫外線に曝された後、第2の領域R2を形成する第2の流路6Bに流入し、光触媒2近傍を流れて排出口8Bから排出されることになる。 When the first region R1 is arranged on the upstream side of the second region R2, the gas G flowing into the inflow port 8A of the housing 5 flows through the first flow channel 6A forming the first region R1 and the photocatalyst. After being exposed to the ultraviolet rays without coming into contact with 2, it flows into the second flow path 6B forming the second region R2, flows near the photocatalyst 2, and is discharged from the discharge port 8B.
 このため、第4の実施形態によれば、光触媒2の配置方法に応じて上述した第1乃至第3の実施形態と同様な効果を得ることができる。また、筐体5の幅を小さくしたり、筐体5の構造を簡易にすることができる。 Therefore, according to the fourth embodiment, it is possible to obtain the same effects as those of the first to third embodiments described above depending on the arrangement method of the photocatalyst 2. Further, the width of the housing 5 can be reduced, and the structure of the housing 5 can be simplified.
(第5の実施形態)
 図17は本発明の第5の実施形態に係る浄化装置の構成を示す縦断面面であり、図18は図17に示す浄化装置の右側面図である。
(Fifth Embodiment)
FIG. 17 is a vertical cross-sectional view showing the configuration of the purification device according to the fifth embodiment of the present invention, and FIG. 18 is a right side view of the purification device shown in FIG.
 図17及び図18に示された第5の実施形態における浄化装置1Dでは、単一の筐体5内に仕切り板20を配置することによって単一の筐体5内に第1の領域R1を形成する第1の流路6Aと第2の領域R2を形成する第2の流路6Bとを形成した点が上述した第4の実施形態における浄化装置1Cと相違する。第5の実施形態における浄化装置1Dの他の構成及び作用については第4の実施形態における浄化装置1Cと実質的に異ならないため筐体5の内部における構成のみ図示し、同一の構成又は対応する構成については同符号を付して説明を省略する。 In the purifying apparatus 1D according to the fifth embodiment shown in FIGS. 17 and 18, by arranging the partition plate 20 in the single housing 5, the first region R1 is provided in the single housing 5. The purification device 1C in the fourth embodiment described above is different in that the first flow path 6A to be formed and the second flow path 6B to form the second region R2 are formed. Other configurations and operations of the purifying device 1D in the fifth embodiment are substantially the same as those of the purifying device 1C in the fourth embodiment, and therefore only the configuration inside the housing 5 is shown, and the same or corresponding configuration is shown. The same symbols are attached to the configuration and the description thereof is omitted.
 図17及び図18に例示されるように単一の筐体5内に形成される空間を仕切り板20で部分的に区切ることによって、単一の筐体5内に第1の領域R1を形成する第1の流路6Aと、第2の領域R2を形成する第2の流路6Bとを形成することができる。より具体的には、仕切り板20で仕切った上流側の空間にランプ4を配置し、下流側の空間に光触媒2でコーティングされた板状部材3を配置することができる。逆に、仕切り板20と光触媒2との間における距離が光触媒2によって有害物を分解することが可能な距離以下となるように、ランプ4と光触媒2との間に、仕切り板20を配置することができる。加えて、仕切り板20を紫外線を透過させる高分子化合物等の公知の素材で構成することができる。 As illustrated in FIGS. 17 and 18, a partition plate 20 partially divides a space formed in the single housing 5 to form a first region R1 in the single housing 5. It is possible to form the first flow path 6A that forms the second flow path 6B and the second flow path 6B that forms the second region R2. More specifically, the lamp 4 can be arranged in the space on the upstream side partitioned by the partition plate 20, and the plate-shaped member 3 coated with the photocatalyst 2 can be arranged in the space on the downstream side. On the contrary, the partition plate 20 is arranged between the lamp 4 and the photocatalyst 2 so that the distance between the partition plate 20 and the photocatalyst 2 is equal to or less than the distance at which the photocatalyst 2 can decompose harmful substances. be able to. In addition, the partition plate 20 can be made of a known material such as a polymer compound that transmits ultraviolet rays.
 そうすると、仕切り板20で仕切った上流側の第1の流路6Aでは気体Gを紫外線のみで浄化する一方、下流側の第2の流路6Bでは、仕切り板20を透過する紫外線と、仕切り板20を透過する紫外線で活性化した光触媒2の双方で気体Gを浄化することができる。また、仕切り板20の表面には、汚れを防止するためのコーティング層を設けてもよい。これにより、仕切り板20が汚れにくくなり、手入れが軽減される。コーティング層の材質には制限はないが、紫外線を透過する程度に薄い光触媒を用いることができる。 Then, while the gas G is purified only by the ultraviolet rays in the upstream first flow channel 6A partitioned by the partition plate 20, the ultraviolet ray that passes through the partition plate 20 and the partition plate in the downstream second flow channel 6B. The gas G can be purified by both of the photocatalysts 2 activated by the ultraviolet rays passing through 20. Further, the surface of the partition plate 20 may be provided with a coating layer for preventing dirt. As a result, the partition plate 20 is less likely to get dirty and maintenance is reduced. The material of the coating layer is not limited, but a photocatalyst that is thin enough to transmit ultraviolet rays can be used.
 仕切り板20を配置すると、仕切り板20を挟む両側に第1の領域R1を形成する第1の流路6Aと、第2の領域R2を形成する第2の流路6Bが互いに異なる向きで形成される。そして、仕切り板20で区切られていない部分で気体Gが第1の流路6Aから第2の流路6Bに流れ方向を変化させながら流入することになる。この場合においても、筐体5の排出口8Bは、光触媒2の表面(筐体5内に露出した面)と連続的に接続された面を備えることが好ましい。これによって、気体Gは、すなわち、筐体5の排出口8Bから所定の距離間、第2の領域R2を通過することになり、浄化の最終段階において光触媒2と気体Gとの接触機会を確保することが可能となる。 When the partition plate 20 is arranged, the first flow channel 6A forming the first region R1 and the second flow channel 6B forming the second region R2 are formed in different directions on both sides sandwiching the partition plate 20. To be done. Then, the gas G flows from the first flow path 6A to the second flow path 6B while changing the flow direction in a portion not partitioned by the partition plate 20. Also in this case, it is preferable that the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5). As a result, the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
 具体例として、図17及び図18に例示されるように仕切り板20の端部を第1の流路6Aの出口とすると、第1の流路6Aを通過した気体Gが第1の流路6Aの出口を形成する仕切り板20の端部において流れの向きを変えて、典型的にはUターンしながら第2の流路6Bに流入することになる。 As a specific example, when the end of the partition plate 20 is used as the outlet of the first flow path 6A as illustrated in FIGS. 17 and 18, the gas G that has passed through the first flow path 6A is the first flow path. The direction of the flow is changed at the end of the partition plate 20 forming the outlet of 6A, and typically flows in the second flow path 6B while making a U-turn.
 気体Gと気体Gに含まれる有害物との間には比重差があるため、気体Gの流れの向きが極端に変化すると、遠心力によって有害物が遠心力が働く方向に集まりやすくなる。気体Gが概ね円弧状の軌跡を描いてUターンする場合であれば、有害物の濃度はより外側において高くなると考えられる。このため、図17及び図18に例示されるように仕切り板20の端部においてUターンした気体Gが光触媒2に接触する場合、流れの向きが局所的に変化して気体Gが光触媒2に接触する部分に局所的に有害物が堆積する恐れがある。 Since there is a difference in specific gravity between the gas G and the harmful substances contained in the gas G, if the direction of the flow of the gas G changes extremely, the harmful substances tend to gather in the direction in which the centrifugal force acts due to the centrifugal force. If the gas G makes a U-turn in a generally arcuate trajectory, it is considered that the concentration of harmful substances becomes higher outside. Therefore, when the gas G that makes a U-turn at the end of the partition plate 20 contacts the photocatalyst 2 as illustrated in FIGS. 17 and 18, the flow direction locally changes, and the gas G moves to the photocatalyst 2. Hazardous substances may be locally deposited on the contact area.
 そこで、第1の流路6Aの出口を形成する仕切り板20の端部に凹凸を設けることができる。そうすると、気体Gが第1の流路6AからUターンしながら第2の流路6Bに流入して光触媒2に接触する位置を、仕切り板20の幅方向に変化させることができる。その結果、光触媒2の表面に付着する有害物を分散することができる。更に、仕切り板20を光触媒3とは逆の方向、すなわち筐体5の内側方向に湾曲させることによって、気体GがUターンした時の流速を低下させて遠心力を抑制し、光触媒3に有害物質が堆積する部分を広げることで、局所的に有害物が堆積することを抑制することもできる。 Therefore, unevenness can be provided at the end of the partition plate 20 forming the outlet of the first flow path 6A. Then, the position where the gas G flows into the second flow path 6B and makes contact with the photocatalyst 2 while making a U-turn from the first flow path 6A can be changed in the width direction of the partition plate 20. As a result, harmful substances attached to the surface of the photocatalyst 2 can be dispersed. Further, by curving the partition plate 20 in the direction opposite to the photocatalyst 3, that is, inward of the housing 5, the flow velocity of the gas G when it makes a U-turn is reduced to suppress the centrifugal force, which is harmful to the photocatalyst 3. By widening the portion where the substance is deposited, it is possible to suppress the deposition of harmful substances locally.
 図19は図17に示す仕切り板20を下面方向から見た形状の一例を示す図である。 FIG. 19 is a diagram showing an example of the shape of the partition plate 20 shown in FIG. 17 as seen from the lower surface direction.
 図19に例示されるように仕切り板20の先端における形状をジグザグにすることができる。これにより、仕切り板20の幅方向及び長さ方向において異なる位置で気体Gの流れの向きを変えながら気体Gを第2の流路6Bに流入させることができる。すなわち、気体Gが同一直線上の位置でUターンしないようにすることができる。 As illustrated in FIG. 19, the shape of the tip of the partition plate 20 can be zigzag. This allows the gas G to flow into the second flow path 6B while changing the flow direction of the gas G at different positions in the width direction and the length direction of the partition plate 20. That is, it is possible to prevent the gas G from making a U-turn at a position on the same straight line.
 言うまでもないことであるが、仕切り板20の大きさや流れ方向の長さは、光触媒2の種類、ランプ4の種類や照度並びに気体Gの流速等の条件に応じて最適なものとすることができる。 Needless to say, the size of the partition plate 20 and the length in the flow direction can be optimized according to conditions such as the type of the photocatalyst 2, the type of the lamp 4, the illuminance and the flow velocity of the gas G. ..
 図20は図17に示す浄化装置1Dの変形例を示す縦断面面である。 FIG. 20 is a vertical cross-sectional view showing a modified example of the purification device 1D shown in FIG.
 気体Gを筐体5の一方側から流入させ、他方側から排出させる場合には、図17に例示されるように板状部材7Aに形成される気体Gの流入口8Aに気体Gを流す配管21を連結することによって、気体Gを第1の流路6Aの上流側に導くことができる。尚、気体Gの流入口8A及び配管21の数とサイズは、筐体5に流入させるべき気体Gの流量に応じて任意に決定することができる。 When the gas G is introduced from one side of the housing 5 and discharged from the other side, a pipe for flowing the gas G into the gas G inlet 8A formed in the plate-shaped member 7A as illustrated in FIG. By connecting 21 to each other, the gas G can be guided to the upstream side of the first flow path 6A. The number and size of the gas inlet 8A and the pipes 21 can be arbitrarily determined according to the flow rate of the gas G to be introduced into the housing 5.
 これに対して、気体Gを筐体5の同じ方向から流入及び排出できる場合には、図20に例示されるように、気体Gの排出口8Bを形成する板状部材7Bに気体Gの流入口8Aも形成することによって、気体Gを第1の流路6Aの上流側に流入させることができる。この場合においても、筐体5の排出口8Bは、光触媒2の表面(筐体5内に露出した面)と連続的に接続された面を備えることが好ましい。これによって、気体Gは、すなわち、筐体5の排出口8Bから所定の距離間、第2の領域R2を通過することになり、浄化の最終段階において光触媒2と気体Gとの接触機会を確保することが可能となる。 On the other hand, when the gas G can flow in and out from the same direction of the housing 5, as shown in FIG. 20, the flow of the gas G to the plate-shaped member 7B forming the gas G outlet 8B. By forming the inlet 8A as well, the gas G can flow into the upstream side of the first flow path 6A. Also in this case, it is preferable that the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5). As a result, the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
 以上の第5の実施形態によれば、規格化されたランプ4の長さに合わせて第1の領域R1と第2の領域R2を直列に形成することが可能となる。尚、第5の実施形態は、筐体5内に形成される流路6の幅方向の異なる位置に第1の領域R1と第2の領域R2を形成し、第1の領域R1と第2の領域R2との間を仕切り板20で物理的に区切った構成と言うこともできる。 According to the fifth embodiment described above, the first region R1 and the second region R2 can be formed in series according to the standardized length of the lamp 4. In the fifth embodiment, the first region R1 and the second region R2 are formed at different positions in the width direction of the channel 6 formed in the housing 5, and the first region R1 and the second region R2 are formed. It can also be said that the partition plate 20 physically separates it from the region R2.
(第6の実施形態)
 図21は本発明の第6の実施形態に係る浄化装置の構成を示す縦断面面、図22は図21に示す浄化装置の右側面図、図23は図21に示す浄化装置の変形例を示す縦断面面である。
(Sixth Embodiment)
21 is a vertical cross-sectional view showing the configuration of the purification device according to the sixth embodiment of the present invention, FIG. 22 is a right side view of the purification device shown in FIG. 21, and FIG. 23 is a modification of the purification device shown in FIG. It is a longitudinal section surface shown.
 図21乃至図23に示された第6の実施形態における浄化装置1Eでは、光触媒2でコーティングされた板状部材3を筐体5内に複数枚配置し、共通のランプ4で各板状部材3に紫外線を照射できるようにした点が第5の実施形態における浄化装置1Dと相違する。第6の実施形態における浄化装置1Eの他の構成及び作用については第5の実施形態における浄化装置1Dと実質的に異ならないため筐体5の内部における構成のみ図示し、同一の構成又は対応する構成については同符号を付して説明を省略する。 In the purifying apparatus 1E according to the sixth embodiment shown in FIG. 21 to FIG. 23, a plurality of plate-shaped members 3 coated with the photocatalyst 2 are arranged in the housing 5, and the common lamp 4 serves as each plate-shaped member. 3 is different from the purification device 1D in the fifth embodiment in that ultraviolet rays can be irradiated. The other configurations and operations of the purifying device 1E in the sixth embodiment are substantially the same as those of the purifying device 1D in the fifth embodiment, so only the configuration inside the housing 5 is shown, and the same or corresponding configurations are shown. The same symbols are attached to the configuration and the description thereof is omitted.
 図21及び図22に示すように光触媒2でコーティングされた複数の板状部材3を単一の筐体5内に配置する場合においても、紫外線を透過する仕切り板20を配置することによって単一の筐体5内に第1の領域R1を形成する第1の流路6Aと、第2の領域R2を形成する第2の流路6Bとを形成することができる。 Even when a plurality of plate-shaped members 3 coated with the photocatalyst 2 are arranged in a single housing 5 as shown in FIGS. 21 and 22, by arranging the partition plate 20 that transmits ultraviolet rays, It is possible to form a first flow channel 6A forming the first region R1 and a second flow channel 6B forming the second region R2 in the housing 5.
 実用的な例として、仕切り板20と光触媒2との間における距離が光触媒2によって有害物を分解することが可能な距離以下となるように、ランプ4を筒状の仕切り板20で囲んで内部を第1の流路6Aとし、外部を第2の流路6Bとすることができる。尚、図21及び図22に示す例では、筒状の仕切り板20の外部において気体Gが必ず光触媒2の近傍を通るように、光触媒2でコーティングされた4枚の板状部材3が、隙間が生じないように筒状構造となるように敷き詰められている。 As a practical example, the lamp 4 is surrounded by the cylindrical partition plate 20 so that the distance between the partition plate 20 and the photocatalyst 2 is equal to or less than the distance at which the photocatalyst 2 can decompose harmful substances. Can be used as the first flow path 6A and the outside can be used as the second flow path 6B. In the examples shown in FIGS. 21 and 22, the four plate-shaped members 3 coated with the photocatalyst 2 have gaps so that the gas G always passes near the photocatalyst 2 outside the cylindrical partition plate 20. It is laid out to have a tubular structure so that
 仕切り板20を筒状とする場合においても、第1の流路6Aの出口となる仕切り板20の端部には、図19に例示されるような凹凸を設けることができる。その場合、気体Gが同一平面上の位置でUターンしないようにすることができるため、有害物による光触媒2の汚染を分散させることができる。 Even when the partition plate 20 is formed in a tubular shape, the end portion of the partition plate 20 serving as the outlet of the first flow path 6A can be provided with unevenness as illustrated in FIG. In that case, the gas G can be prevented from making a U-turn at a position on the same plane, so that the contamination of the photocatalyst 2 by harmful substances can be dispersed.
 また、気体Gを筐体5の一方側から流入させ、他方側から排出させる場合には、板状部材7Aに形成される気体Gの流入口8Aに気体Gを流す配管21を連結することによって、気体Gを第1の流路6Aの上流側に導くことができる。逆に、気体Gを筐体5の同じ方向から流入及び排出できる場合には、図23に例示されるように、気体Gの排出口8Bを形成する板状部材7Bに気体Gの流入口8Aも形成することによって、気体Gを第1の流路6Aの上流側に流入させることができる。この場合においても、筐体5の排出口8Bは、光触媒2の表面(筐体5内に露出した面)と連続的に接続された面を備えることが好ましい。これによって、気体Gは、すなわち、筐体5の排出口8Bから所定の距離間、第2の領域R2を通過することになり、浄化の最終段階において光触媒2と気体Gとの接触機会を確保することが可能となる。 When the gas G is introduced from one side of the housing 5 and discharged from the other side, a pipe 21 for flowing the gas G is connected to an inlet 8A of the gas G formed in the plate member 7A. , G can be guided to the upstream side of the first flow path 6A. On the contrary, when the gas G can flow in and out from the same direction of the housing 5, as illustrated in FIG. 23, the gas G inflow port 8A is formed in the plate member 7B forming the gas G exhaust port 8B. By also forming, the gas G can be made to flow into the upstream side of the first flow path 6A. Also in this case, it is preferable that the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5). As a result, the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
 以上のような第6の実施形態によれば、第5の実施形態と比較して光触媒2の表面積を大きくすることができる。このため、単位時間当たりに浄化することが可能な気体Gの体積を増加することができる。 According to the sixth embodiment as described above, the surface area of the photocatalyst 2 can be increased as compared with the fifth embodiment. Therefore, the volume of the gas G that can be purified per unit time can be increased.
(第7の実施形態)
 図24は本発明の第7の実施形態に係る浄化装置の構成を示す縦断面面、図25は図24に示す浄化装置の右側面図、図26は図24に示す浄化装置の変形例を示す縦断面面である。
(Seventh embodiment)
24 is a vertical cross-sectional view showing the configuration of the purification device according to the seventh embodiment of the present invention, FIG. 25 is a right side view of the purification device shown in FIG. 24, and FIG. 26 is a modification of the purification device shown in FIG. It is a longitudinal section surface shown.
 図24乃至図26に示された第7の実施形態における浄化装置1Fでは、板状部材3を筒状に形成し、板状部材3の内面を光触媒2でコーティングした点が第5の実施形態における浄化装置1Dと相違する。第7の実施形態における浄化装置1Fの他の構成及び作用については第5の実施形態における浄化装置1Dと実質的に異ならないため筐体5の内部における構成のみ図示し、同一の構成又は対応する構成については同符号を付して説明を省略する。 In the purifying apparatus 1F according to the seventh embodiment shown in FIGS. 24 to 26, the plate-shaped member 3 is formed in a tubular shape, and the inner surface of the plate-shaped member 3 is coated with the photocatalyst 2 in the fifth embodiment. Of the purifying device 1D. The other configurations and operations of the purifying device 1F in the seventh embodiment are substantially the same as those of the purifying device 1D in the fifth embodiment, and therefore only the configuration inside the housing 5 is shown, and the same or corresponding configuration is shown. The same symbols are attached to the configuration and the description thereof is omitted.
 図24及び図26に示すように内面が光触媒2でコーティングされた筒状の板状部材3を単一の筐体5内に配置する場合においても、紫外線を透過する仕切り板20を配置することによって単一の筐体5内に第1の領域R1を形成する第1の流路6Aと、第2の領域R2を形成する第2の流路6Bとを形成することができる。実用的な例として、仕切り板20と光触媒2との間における距離が光触媒2によって有害物を分解することが可能な距離以下となるように、ランプ4を筒状の仕切り板20で囲んで内部を第1の流路6Aとし、外部を第2の流路6Bとすることができる。 As shown in FIGS. 24 and 26, even when the cylindrical plate-shaped member 3 whose inner surface is coated with the photocatalyst 2 is arranged in the single housing 5, the partition plate 20 that transmits ultraviolet rays should be arranged. Thus, the first flow path 6A forming the first region R1 and the second flow path 6B forming the second region R2 can be formed in the single housing 5. As a practical example, the lamp 4 is surrounded by the cylindrical partition plate 20 so that the distance between the partition plate 20 and the photocatalyst 2 is equal to or less than the distance at which the photocatalyst 2 can decompose harmful substances. Can be used as the first flow path 6A and the outside can be used as the second flow path 6B.
 図24及び図25に示す例では、光触媒2でコーティングされた板状部材3が円筒状となっている。このため、円筒状の内面を形成する光触媒2の近傍を気体Gが通過するように形成された横断面が環状の第2の流路6Bから気体Gが排出されるように、複数の円弧状のスリットが気体Gの排出口8Bとして筐体5の端面を形成する板状部材7Bに設けられている。 In the example shown in FIGS. 24 and 25, the plate-shaped member 3 coated with the photocatalyst 2 has a cylindrical shape. Therefore, a plurality of arcs are formed so that the gas G is discharged from the second flow path 6B having a circular cross section formed so that the gas G passes near the photocatalyst 2 forming the inner surface of the cylinder. Is provided in the plate-shaped member 7B forming the end surface of the housing 5 as a gas G outlet 8B.
 仕切り板20を角筒状とする場合はもちろん、円筒状とする場合においても、第1の流路6Aの出口となる仕切り板20の端部には、図19に例示されるような凹凸を設けることができる。その場合、気体Gが同一円上又は同一平面上の位置でUターンしないようにすることができるため、有害物による光触媒2の汚染を分散させることができる。 Not only when the partition plate 20 is formed into a rectangular tube shape but also when it is formed into a cylindrical shape, the end portion of the partition plate 20 which is the outlet of the first flow path 6A is provided with unevenness as illustrated in FIG. Can be provided. In that case, the gas G can be prevented from making a U-turn at a position on the same circle or on the same plane, so that the contamination of the photocatalyst 2 by the harmful substances can be dispersed.
 また、気体Gを筐体5の一方側から流入させ、他方側から排出させる場合には、板状部材7Aに形成される気体Gの流入口8Aに気体Gを流す配管21を連結することによって、気体Gを第1の流路6Aの上流側に導くことができる。逆に、気体Gを筐体5の同じ方向から流入及び排出できる場合には、図26に例示されるように、気体Gの排出口8Bを形成する板状部材7Bに気体Gの流入口8Aも形成することによって、気体Gを第1の流路6Aの上流側に流入させることができる。この場合においても、筐体5の排出口8Bは、光触媒2の表面(筐体5内に露出した面)と連続的に接続された面を備えることが好ましい。これによって、気体Gは、すなわち、筐体5の排出口8Bから所定の距離間、第2の領域R2を通過することになり、浄化の最終段階において光触媒2と気体Gとの接触機会を確保することが可能となる。 When the gas G is introduced from one side of the housing 5 and discharged from the other side, a pipe 21 for flowing the gas G is connected to an inlet 8A of the gas G formed in the plate member 7A. , G can be guided to the upstream side of the first flow path 6A. On the contrary, when the gas G can flow in and out from the same direction of the housing 5, as shown in FIG. 26, the gas G inflow port 8A is formed in the plate member 7B forming the gas G exhaust port 8B. By also forming, the gas G can be made to flow into the upstream side of the first flow path 6A. Also in this case, it is preferable that the discharge port 8B of the housing 5 has a surface that is continuously connected to the surface of the photocatalyst 2 (the surface exposed in the housing 5). As a result, the gas G passes through the second region R2 for a predetermined distance from the discharge port 8B of the housing 5, so that the photocatalyst 2 and the gas G can be contacted with each other in the final stage of purification. It becomes possible to do.
 以上のような第7の実施形態によれば、第5の実施形態と比較して光触媒2の表面積を大きくすることができるのみならず、板状部材3を円筒状に形成すれば紫外線を効率的に光触媒2に照射することが可能となる。このため、単位時間当たりに浄化することが可能な気体Gの体積を一層増加することができる。 According to the seventh embodiment as described above, not only the surface area of the photocatalyst 2 can be increased as compared with the fifth embodiment, but also if the plate-shaped member 3 is formed in a cylindrical shape, ultraviolet rays can be efficiently emitted. It becomes possible to irradiate the photocatalyst 2 selectively. Therefore, the volume of the gas G that can be purified per unit time can be further increased.
(第8の実施形態)
 図27は本発明の第8の実施形態に係る浄化装置の構成を説明するための断面図である。
(Eighth Embodiment)
FIG. 27 is a sectional view for explaining the configuration of the purification device according to the eighth embodiment of the present invention.
 第8の実施形態における浄化装置1Gでは、図27に示すように流路6の少なくとも一部の壁面に凹凸30を設けた点が他の各実施形態における浄化装置1、1A、1B、1C、1D、1E、1Fと相違する。第8の実施形態における浄化装置1Gの他の構成及び作用については他の各実施形態における浄化装置1、1A、1B、1C、1D、1E、1Fと実質的に異ならないため凹凸30を設けた流路6の壁面のみ図示し、同一の構成又は対応する構成については同符号を付して説明を省略する。 In the purification device 1G in the eighth embodiment, as shown in FIG. 27, the unevenness 30 is provided on at least a part of the wall surface of the flow path 6, and the purification devices 1, 1A, 1B, 1C in the other embodiments. Different from 1D, 1E, and 1F. Since the other configurations and operations of the purifying device 1G in the eighth embodiment are substantially the same as those of the purifying devices 1, 1A, 1B, 1C, 1D, 1E, 1F in the other embodiments, the unevenness 30 is provided. Only the wall surface of the flow path 6 is shown, and the same or corresponding components are designated by the same reference numerals and the description thereof is omitted.
 流路6の表面には、光触媒2の近傍を流れる気体Gに乱流及び旋回流の少なくとも一方を発生させるための凹凸30を設けることができる。光触媒2の近傍を流れる気体Gに乱流及び旋回流の少なくとも一方を発生させると、気体Gが光触媒2と接触する機会を向上させることができる。 The surface of the flow path 6 can be provided with irregularities 30 for generating at least one of turbulent flow and swirl flow in the gas G flowing in the vicinity of the photocatalyst 2. When at least one of the turbulent flow and the swirling flow is generated in the gas G flowing in the vicinity of the photocatalyst 2, the opportunity for the gas G to contact the photocatalyst 2 can be improved.
 凹凸30は光触媒2でコーティングされる板状部材3に設けても良いし、仕切り板20の表面や筐体5の内面に設けても良い。板状部材3に凹凸30を設ける場合には、光触媒2自体が凹凸30を有することになる。このため、光触媒2に局所的に有害物が堆積しないように滑らかな凹凸30を形成しても良い。一方、光触媒2以外の表面に凹凸30を設ける場合には、光触媒2の近傍を流れる気体Gに好ましい乱流又は旋回流が起きやすくなるように様々な形状の凹凸30を適切な位置に設けることができる。尚、図27は有害物が堆積する恐れが無い筐体5の内面に凹凸30を形成した例を示している。 The unevenness 30 may be provided on the plate-like member 3 coated with the photocatalyst 2, or may be provided on the surface of the partition plate 20 or the inner surface of the housing 5. When the unevenness 30 is provided on the plate member 3, the photocatalyst 2 itself has the unevenness 30. Therefore, the smooth unevenness 30 may be formed so that harmful substances are not locally deposited on the photocatalyst 2. On the other hand, when the unevenness 30 is provided on the surface other than the photocatalyst 2, the unevenness 30 having various shapes is provided at an appropriate position so that preferable turbulent flow or swirl flow is easily generated in the gas G flowing in the vicinity of the photocatalyst 2. You can Note that FIG. 27 shows an example in which the concavities and convexities 30 are formed on the inner surface of the housing 5 in which harmful substances are not likely to accumulate.
 以上のような第8の実施形態によれば、他の実施形態と比較して気体Gが光触媒2と接触する機会を向上させることができる。このため、単位時間当たりに浄化することが可能な気体Gの体積を一層増加することができる。この実施形態においては、光触媒2によって浄化される第2の領域R2を最大40mm、さらには最大50mmに広げることができるため、排出口8Bの幅を大きくすることができ、気体Gの流量を増加でき、浄化効率を向上することが可能である。なお、第2の領域R2の広さは、乱流及び旋回流の気体の流れ方や流量によって異なる。この実施形態は、他の実施形態にも適用することができる。 According to the eighth embodiment as described above, it is possible to improve the chance of the gas G coming into contact with the photocatalyst 2 as compared with the other embodiments. Therefore, the volume of the gas G that can be purified per unit time can be further increased. In this embodiment, since the second region R2 purified by the photocatalyst 2 can be expanded to a maximum of 40 mm, and further to a maximum of 50 mm, the width of the discharge port 8B can be increased and the flow rate of the gas G can be increased. It is possible to improve the purification efficiency. The size of the second region R2 depends on the flow and flow rate of the turbulent and swirling gas. This embodiment can be applied to other embodiments.
(他の実施形態)
 以上、特定の実施形態について記載したが、記載された実施形態は一例に過ぎず、発明の範囲を限定するものではない。ここに記載された新規な方法及び装置は、様々な他の様式で具現化することができる。また、ここに記載された方法及び装置の様式において、発明の要旨から逸脱しない範囲で、種々の省略、置換及び変更を行うことができる。添付された請求の範囲及びその均等物は、発明の範囲及び要旨に包含されているものとして、そのような種々の様式及び変形例を含んでいる。
(Other embodiments)
Although the specific embodiments have been described above, the described embodiments are merely examples and do not limit the scope of the invention. The novel methods and apparatus described herein can be implemented in various other ways. In addition, various omissions, substitutions, and changes can be made in the method and apparatus modes described herein without departing from the spirit of the invention. The appended claims and their equivalents are intended to cover all such variations and modifications as fall within the scope and spirit of the invention.
1、1A、1B、1C、1D、1E、1F、1G 浄化装置
2 光触媒
3 板状部材
4 ランプ
5 筐体
6 流路
6A 第1の流路
6B 第2の流路
7A、7B 板状部材
8A 流入口
8B 排出口
9A 第1の遮蔽部
9B 第2の遮蔽部
10A 流入口
10B 排出口
11 ファン(送風機)
12 インバータ基板
13 スイッチ基板
14 電源スイッチ
15 調整スイッチ
20 仕切り板
21 配管
G 気体
R1 第1の領域
R2 第2の領域
B 排出口の幅
1, 1A, 1B, 1C, 1D, 1E, 1F, 1G Purification device 2 Photocatalyst 3 Plate-shaped member 4 Lamp 5 Housing 6 Flow path 6A First flow path 6B Second flow path 7A, 7B Plate-shaped member 8A Inlet port 8B Exhaust port 9A First shielding part 9B Second shielding part 10A Inlet port 10B Exhaust port 11 Fan (blower)
12 Inverter board 13 Switch board 14 Power switch 15 Adjustment switch 20 Partition plate 21 Pipe G Gas R1 First area R2 Second area B Width of outlet

Claims (13)

  1.  浄化対象となる気体の流路を形成する筐体であって、前記流路側における表面の少なくとも一部が光触媒でコーティングされた板状部材を少なくとも一部に有する筐体と、
     前記筐体に流入した前記気体を浄化させ、かつ前記光触媒を活性化するための紫外線を照射する光源と、
    を備え、
     前記筐体内に前記光触媒に依らず前記紫外線で前記気体が浄化される第1の領域と、前記紫外線と前記紫外線で活性化された前記光触媒で前記気体が浄化される第2の領域とを形成し、前記第1の領域と前記第2の領域に跨る一部の領域又は前記第2の領域のみに浄化後における前記気体を排出するための排出口を設けた浄化装置。
    A case that forms a flow path of gas to be purified, at least a part of the surface on the flow path side having a plate-shaped member coated with a photocatalyst in at least a part,
    A light source that purifies the gas that has flowed into the housing and that irradiates ultraviolet rays for activating the photocatalyst;
    Equipped with
    A first region in which the gas is purified by the ultraviolet light regardless of the photocatalyst and a second region in which the gas is purified by the photocatalyst activated by the ultraviolet light are formed in the housing. However, the purification device is provided with a discharge port for discharging the gas after purification only in a part of the region extending over the first region and the second region or only in the second region.
  2.  横断面の形状が筒状である前記筐体の内部に前記気体の流路を形成し、前記筒状の筐体の内部に棒状の前記光源を配置した請求項1記載の浄化装置。 The purifying device according to claim 1, wherein the gas flow path is formed inside the casing having a tubular cross section, and the rod-shaped light source is disposed inside the tubular casing.
  3.  単一の前記筐体内に前記第1の領域と前記第2の領域を形成し、前記筐体に流入した前記気体が前記第1の領域に導かれる一方、前記第2の領域から排出される前記気体が前記浄化後における前記気体に含まれるように前記排出口を前記光触媒の近傍に形成した請求項1又は2記載の浄化装置。 The first region and the second region are formed in a single casing, and the gas flowing into the casing is guided to the first region and discharged from the second region. The purification device according to claim 1, wherein the exhaust port is formed in the vicinity of the photocatalyst so that the gas is contained in the gas after the purification.
  4.  前記第1の領域と前記第2の領域を、前記第1の領域が前記光触媒から離れた位置となり、前記第2の領域が前記光触媒に隣接する位置となるように前記流路の幅方向の異なる位置に形成した請求項1乃至3のいずれか1項に記載の浄化装置。 In the width direction of the flow path, the first region and the second region are arranged such that the first region is located at a position distant from the photocatalyst and the second region is located at a position adjacent to the photocatalyst. The purification device according to any one of claims 1 to 3, which is formed at different positions.
  5.  前記流路内を前記排出口に向かって流れた気体の一部が前記筐体から排出される一方、前記流路内を前記排出口に向かって流れた気体の残りの一部が前記筐体内に留まるように前記排出口を前記光触媒の近傍に局所的に形成した請求項4記載の浄化装置。 A part of the gas flowing in the flow path toward the discharge port is discharged from the housing, while the remaining part of the gas flowing in the flow path toward the discharge port is in the housing. 5. The purifying apparatus according to claim 4, wherein the discharge port is locally formed in the vicinity of the photocatalyst so as to remain in the area.
  6.  前記筐体内に流入した前記気体が前記光触媒の近傍に導かれるように、前記流入口を前記光触媒の近傍に局所的に設けた請求項4又は5記載の浄化装置。 The purification device according to claim 4 or 5, wherein the inflow port is locally provided in the vicinity of the photocatalyst so that the gas flowing into the housing is guided to the vicinity of the photocatalyst.
  7.  前記第1の領域と前記第2の領域を、前記第1の領域が上流側となり前記第2の領域が下流側となるように前記流路の長さ方向の異なる位置に形成した請求項1乃至3のいずれか1項に記載の浄化装置。 The first region and the second region are formed at different positions in the length direction of the flow path so that the first region is on the upstream side and the second region is on the downstream side. The purifying device according to any one of 1 to 3.
  8.  単一の前記筐体内に仕切り板を配置することによって前記単一の筐体内に前記第1の領域を形成する前記第1の流路と前記第2の領域を形成する前記第2の流路とを形成した請求項7記載の浄化装置。 The first flow path forming the first region and the second flow path forming the second region in the single housing by disposing a partition plate in the single housing. The purification device according to claim 7, wherein
  9.  前記仕切り板を前記紫外線を透過させる素材で構成し、前記仕切り板を透過する前記紫外線で前記光触媒を活性化するようにした請求項8記載の浄化装置。 The purifying apparatus according to claim 8, wherein the partition plate is made of a material that transmits the ultraviolet rays, and the ultraviolet rays that pass through the partition plate activate the photocatalyst.
  10.  前記第1の流路を通過した前記気体が流れの向きを変えて前記第2の流路に流入するように前記仕切り板を配置し、前記第1の流路の出口を形成する前記仕切り板の端部に凹凸を設けた請求項9記載の浄化装置。 The partition plate is arranged so that the gas passing through the first flow channel changes its flow direction and flows into the second flow channel, and forms the outlet of the first flow channel. 10. The purifying device according to claim 9, wherein the end portion of the is provided with irregularities.
  11.  前記流路の少なくとも一部の壁面に凹凸を設けることによって、前記光触媒の近傍を流れる前記気体に乱流及び旋回流の少なくとも一方又は両方を発生させるようにした請求項1乃至10のいずれか1項に記載の浄化装置。 11. At least one or both of a turbulent flow and a swirling flow are generated in the gas flowing in the vicinity of the photocatalyst by providing unevenness on the wall surface of at least a part of the flow path. Purification device according to item.
  12.  前記排出口が、前記光触媒の表面と連続的に接続された面を備える請求項1乃至11のいずれか1項に記載の浄化装置。 The purification device according to any one of claims 1 to 11, wherein the outlet has a surface continuously connected to the surface of the photocatalyst.
  13.  浄化対象となる気体の流路を形成する筐体であって、前記流路側における表面の少なくとも一部が光触媒でコーティングされた板状部材を少なくとも一部に有する筐体と、
     前記筐体に流入した前記気体を浄化させ、かつ前記光触媒を活性化するための紫外線を照射する光源と、
    を備え、
     前記筐体内に形成される前記流路の幅を、前記筐体から前記気体を排出するための排出口の幅よりも大きくし、前記光触媒の表面に垂直な方向における幅が6mm以下となるように前記排出口を前記光触媒の近傍に形成した浄化装置。
    A case that forms a flow path of gas to be purified, at least a part of the surface on the flow path side having a plate-shaped member coated with a photocatalyst in at least a part,
    A light source that purifies the gas that has flowed into the housing and that irradiates ultraviolet rays for activating the photocatalyst,
    Equipped with
    The width of the flow path formed in the housing is made larger than the width of the discharge port for discharging the gas from the housing, and the width in the direction perpendicular to the surface of the photocatalyst is 6 mm or less. A purifying device in which the discharge port is formed in the vicinity of the photocatalyst.
PCT/JP2020/001941 2019-01-22 2020-01-21 Purification device WO2020153353A1 (en)

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JP2022088282A (en) * 2020-12-02 2022-06-14 Jsw株式会社 Air purification device and room air purification method
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