WO2020125672A1 - 死锁判断方法及半导体设备 - Google Patents
死锁判断方法及半导体设备 Download PDFInfo
- Publication number
- WO2020125672A1 WO2020125672A1 PCT/CN2019/126274 CN2019126274W WO2020125672A1 WO 2020125672 A1 WO2020125672 A1 WO 2020125672A1 CN 2019126274 W CN2019126274 W CN 2019126274W WO 2020125672 A1 WO2020125672 A1 WO 2020125672A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- deadlock
- resource
- total capacity
- directed graph
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Program-control systems
- G05B19/02—Program-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0612—Production flow monitoring, e.g. for increasing throughput
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G43/00—Control devices, e.g. for safety, warning or fault-correcting
- B65G43/08—Control devices operated by article or material being fed, conveyed or discharged
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
- H10P72/0452—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the layout of the process chambers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
- H10P72/0461—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the presence of two or more transfer chambers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
- H10P72/0466—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the construction of the load-lock chamber
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32229—Repair fault product by replacing fault parts
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/34—Director, elements to supervisory
- G05B2219/34336—Avoid deadlock, lock-up
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45032—Wafer manufacture; interlock, load-lock module
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Definitions
- R is the number of resources corresponding to the same process step, and R is an integer of 2; C after the resource is a new combined, the total capacity of the process steps; C until the original resource is combined, the process steps total capacity.
- the method further includes:
- the method further includes:
- the process steps are four steps, which are the first step to the fourth step, respectively, wherein the resources of the first step are capable of transmitting two at the same time
- the atmospheric manipulator of the material the total capacity of the first step is 2
- the resources of the second step are two sets of chamber groups, each of the chamber groups includes 2 LL chambers, and the second step
- the total capacity is 4
- the resource of the third step is a vacuum manipulator capable of transferring 4 materials at the same time, the total capacity of the third step is 4
- the three resources corresponding to the second step of the directed graph supporting single material transmission are selected to be combined into one resource, and the total capacity of the first step is changed to 1.
- Atmospheric manipulator used to transfer materials between the loading platform and the LL chamber
- both the atmospheric manipulator and the vacuum manipulator can transfer at least one material in one step.
- the vacuum manipulator has two arms capable of transferring N/2 materials in one step;
- each reaction chamber has N/2 stations.
- At least one process step with multiple resources is selected from all process steps in a directed graph supporting single material transfer, and each process selected The multiple resources corresponding to the steps are combined, and the total capacity of each process step is changed according to the process step.
- a new directed graph that supports the transmission of multiple materials can be constructed; then, based on the new directed graph, whether the material scheduling deadlock occurs In this way, it is possible to judge whether a semiconductor device that transmits multiple materials in a single step is deadlocked.
- FIG. 2 is a flowchart of a deadlock determination method provided by a first embodiment of the present invention
- FIG. 3B is a directed graph after merging resources used in the first embodiment of the present invention.
- 4A is a directed graph before resource merging adopted in the second embodiment of the present invention.
- each loading station has multiple stations, for example 25;
- Atmospheric Manipulator for transferring materials between the loading table and the LL chamber
- Atmospheric Vacuum Manipulator has two arms that can transfer one material in one step, ie, there are two arms, each arm has one finger ;
- FIG. 1 shows only two LL chambers (LL1 ⁇ LL2), the remaining two LL chambers (LL3 ⁇ LL4 ) Located in the lower layer of the LL chamber (LL1 ⁇ LL2); every two LL chambers (upper and lower LL chambers) form a group of chambers, each LL chamber has a station;
- stations refer to the positions for placing materials in the equipment at each process step, and one station is used to place one material.
- the deadlock determination method provided in this embodiment is based on the semiconductor device described above, but the present invention is not limited to this. In practical applications, the deadlock determination method provided in this embodiment can be applied to single-step transmission of a material or Judgment of deadlock for semiconductor devices that transmit more than two materials in a single step.
- the deadlock determination method includes:
- New directed graph construction steps in a directed graph that supports single material transfer, select at least one process step with multiple resources from all process steps, and merge multiple resources corresponding to the selected process steps, And change the total capacity of each process step according to the merged result to construct a new directed graph that supports the transmission of multiple materials;
- the deadlock judgment step judges whether a material scheduling deadlock occurs based on the new directed graph.
- R is the number of resources in the same process step corresponds to, and R is an integer of 2; C after new resource combined, the total capacity of process steps; C formerly before the resource were combined, the total capacity of process steps; total capacity The sum of the number of stations of all resources corresponding to the process step.
- the so-called directed graph (Wait Relation Graph, WRG, referred to as G) is composed of a set of resources (each process step corresponds to a resource r) and a set of directed edges, where any material is processed according to a predetermined path
- WRG Wide Relation Graph
- the transfer process of materials from one resource to another resource can be represented by a directed edge, for example, the directed edge from resource r 1 to resource r 2 is expressed as:
- the process steps are four steps, which are the first step to the fourth step, respectively, wherein the equipment performing the first step is an atmospheric manipulator capable of transmitting 2 materials at the same time , Which corresponds to a resource r 1 and the total capacity of the first step is 2; the equipment for the second step is two sets of chamber groups, each of the chamber groups includes 2 LL chambers, and the two sets of chamber groups are Two resources (r 2 , r 3 ) corresponding to the same process step, the capacity of each chamber group is 2, then the total capacity of the second step is 4; the equipment for the third step is capable of transmitting 4 materials at the same time
- the vacuum manipulator corresponds to one resource r 4 and the total capacity of the third step is 4; the equipment for performing the fourth step is a reaction chamber, which corresponds to one
- the material transmission path is:
- the second step corresponds to two resources (r 2 , r 3 ).
- C new C original /R, that is, the total capacity of each of the first to fourth steps is halved.
- the sub-path a 1 is represented as (r 2 /r 3 ) ⁇ r 4 , which can move two materials at the same time. If the resource and the resource r 2 r 3 each present a material, into the resource r Judai 4, since the material 1 upon completion of sub-path a, will occupy two stations resource r 4, while the resource and resource r 2 r 3 Free one station each.
- the sub-path a 6 represents r 23 ⁇ r 1 , and its one movement is equivalent to two movements of the actual device, that is, r 2 ⁇ r 1 and r 3 ⁇ r 1. Therefore, the first step The total capacity is halved. Therefore, compared with the original directed graph, the total capacity of each step of the new directed graph is halved.
- the R resources corresponding to the selected process steps are combined into one resource, and the total capacity of each process step is halved.
- the present invention is not limited to this. In practical applications, other merge methods can also be used according to different directed graphs, and the total capacity of each process step can be adaptively changed.
- the method further includes:
- a deadlock judgment step can be performed by simulating a one-step process step of moving the material.
- the situation of materials occupying resources includes:
- the resource r 1 corresponding to the first step has no material or one piece of material; the two resources r 2 and r 3 corresponding to the second step both have one piece of material, and will enter the third step;
- the resource r 1 corresponding to the first step has no material or two pieces of material; the first resource r 2 corresponding to the second step has no material; the second resource r 3 corresponding to the second step has one piece of material, And to enter the first step or the third step.
- the resource r 1 corresponding to the first step has a piece of material
- the second resource r 3 corresponding to the second step is to be entered
- the second resource r 3 corresponding to the second step has no material
- the second step corresponds to The first resource r 2 has a piece of material, and will enter the third step
- the resource r 1 corresponding to the first step has a piece of material and is located at the end of the path from the second step to the first step, that is, at the end of a 5 ; the first resource r 2 corresponding to the second step There is no material; the second resource r 3 corresponding to the second step has a piece of material, and is to enter the first step.
- the material in the first step is transferred to the second resource r 3 corresponding to the second step; if the position of the material occupying the resource conforms to the above In six cases, the material in the first step is transferred to the first resource r 2 corresponding to the second step; if the position of the material occupies the resource meets the seventh situation above, the second corresponding to the second step The material in the resource r 3 is passed to the first step; if the position of the material occupying the resource meets the above eighth situation, the material in the first resource r 2 corresponding to the second step is passed to the first step.
- the above deadlock determination step includes:
- Step 101 Obtain all simple circuits from the new directed graph.
- One of the steps in the material transfer path can be represented by one or more directed edges, where multiple directed edges represent parallel paths. Divide a directed graph into multiple subgraphs. If there are two paths from the first resource to the second resource and from the second resource to the first resource in any two resources of the subgraph, the subgraph is a loop If the circuit does not contain other circuits, it is a simple circuit.
- any one of the process steps has multiple directional edges, it is a parallel path; if the simple loop contains any directional edge of the parallel path, it is the selection loop.
- the simple circuit C 1 includes the path r 1 ⁇ r 2 ; the simple circuit C 2 includes the path r 1 ⁇ r 3 . If the other loops do not contain the above two parallel paths, then the directed graph has only two simple loops, and the union of the two is called a selection loop.
- Step 103 Determine whether the attribute flags of all simple loops are Broken or non-Broken.
- Step 104 Mark all attributes as non-Broken simple loops and all selection loops to form a first loop set.
- Step 105 Combine M circuits in the first circuit set to form a second circuit set including N circuits,
- Step 106 Determine whether there is a loop C 1 in the second loop set that includes other loops C 2. If it exists, delete the included other loop C 2 and form the third loop that is not deleted in the second loop set into the third Loop collection.
- Step 107 Obtain the number of idle stations Slack and the total number of nodes Knot based on the loop information in the third loop set; in multiple interconnected loops, the number of resource stations at the connection is 1, the connection The node is Knot.
- step 107 specifically includes:
- Step 1071 Obtain loop information from the third loop set, the loop information includes the total number of stations of the resource Capacity and the number of occupied stations of the resource Commit;
- Step 1072 Obtain the number of idle stations Slack by calculating the difference between the total number of stations of the resource Capacity and the number of occupied stations Commit
- Step 1073 Find the node Knot from the third loop set, and calculate the total number ⁇ O(Knot) of the node Knot.
- the deadlock judgment method provided by the second embodiment of the present invention uses a semiconductor device that transmits three materials in one step as an example to perform deadlock judgment.
- the specific structure of the semiconductor device still takes the semiconductor device shown in FIG. 1 as an example.
- a process step having at least one R resource in the above directed graph is selected, and R number of selected process steps are selected.
- the second step corresponds to three resources (r 2 , r 3 , r 6 ).
- the deadlock determination method provided by the present invention can be applied to the deadlock determination of semiconductor devices that transfer two, three, or more materials from a single material by using a new directed graph construction step.
- each loading station may have multiple stations, such as 25.
- LL chambers are also called transition chambers.
- N LL chambers There are N LL chambers, and each LL chamber has one station.
- every two LL chambers form a group of chamber groups, and the two LL chambers in the same group of chamber groups are arranged according to the upper and lower layers, so that N LL chambers can be divided into N/2 groups Chamber group, where N is an even number greater than or equal to 4.
- the number of LL chambers N 4.
- N can also be equal to 6.
- the atmospheric manipulator is used to transfer materials between the loading table and the LL chamber.
- the atmospheric manipulator has N/2 arms capable of transferring one material in one step, and can simultaneously send one of the LL chambers in the N/2 group of chambers. Convey materials.
- the atmospheric manipulator has two arms, so as to be able to perform a pick-and-place operation on one of the LL chambers (upper chamber or lower chamber) in the two chamber groups at the same time.
- the atmospheric manipulator has three arms, so that it can simultaneously pick and place a piece of LL chamber (upper chamber or lower chamber) in one of the three chamber groups.
- the vacuum manipulator is used to transfer materials between the LL chamber and the process chamber.
- the vacuum manipulator has two arms that can transfer N/2 materials in a single step to complete the pick and place operation of the process chamber. For example, when there are 4 LL chambers, the vacuum manipulator has two arms, and each arm can transfer 2 materials in a single step. As another example, when there are 6 LL chambers, the vacuum robot manipulator has two arms, and each arm can transfer 3 materials in one step.
- the deadlock determination device is used to determine whether a deadlock occurs in the scheduling process of the semiconductor device by using the deadlock determination methods provided by the foregoing embodiments of the present invention.
- the deadlock determination device may be integrated in the dispatch system of the semiconductor device.
- the semiconductor device provided by the invention can realize the single-step transmission of multiple materials, and at the same time can judge whether a deadlock occurs.
Landscapes
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
- General Factory Administration (AREA)
Abstract
一种死锁判断方法及半导体设备,该死锁判断方法包括:新有向图构造步骤,在支持单个物料传输的有向图中,从所有工艺步骤中选择至少一步具有多个资源的工艺步骤,且将所选择的各工艺步骤对应的多个资源进行合并,并根据合并结果更改每步工艺步骤的总容量,以构造出支持多个物料传输的新有向图;死锁判断步骤,基于新有向图判断是否发生物料调度死锁;其中,资源为进行工艺步骤的设备;总容量为每步工艺步骤对应的所有资源的工位数量之和。该死锁判断方法可以对单步传输多个物料的半导体设备是否发生死锁进行判断。
Description
本发明涉及半导体技术领域,具体地,涉及一种死锁判断方法及应用其的半导体设备。
由于半导体领域集簇设备中存在并行路径和资源共享的问题,如果物料调度得过快或者调度序列不合理,可能会使集簇设备的调度系统发生调度死锁的现象。具体地,所谓死锁(Deadlock),是指多个进程在运行过程中,因争夺资源而造成的一种僵局,在这种情况下,若无外力作用,它们都将无法再向前推进。例如,常规的集簇设备包括:三个工艺腔室,每个工艺腔室中有两个工位;一个真空机械手,其具有两个手臂,每个手臂上有两个手指,即,每个手臂可以从工艺腔室中同时取放两个物料。对于该集簇设备来说,有可能出现三个工艺腔室均放满了物料,而真空机械手的两个手臂上有四个物料正在等待传入工艺腔室,这样调度系统就会发生死锁,导致整个调度系统瘫痪,从而影响产能。
虽然可以利用死锁判断方法来避免发生死锁,但是,现有的死锁判断方法只适用于单步传输一个物料的设备,而无法适用于单步传输多个物料的设备。
发明内容
本发明旨在至少解决现有技术中存在的技术问题之一,提出了一种死锁判断方法及半导体设备,其可以对单步传输多个物料的半导体设备是否发生死锁进行判断。
为实现本发明的目的而提供一种死锁判断方法,包括:
新有向图构造步骤,在支持单个物料传输的有向图中,从所有工艺步骤中选择至少一步具有多个资源的工艺步骤,且将所选择的各所述工艺步骤对应的多个资源进行合并,并根据合并结果更改每步所述工艺步骤的总容量,以构造出支持多个物料传输的新有向图;
死锁判断步骤,基于所述新有向图判断是否发生物料调度死锁;
其中,所述资源为进行工艺步骤的设备;所述总容量为每步所述工艺步骤对应的所有资源的工位数量之和。
可选的,在所述新有向图构造步骤中,将所选择的各所述工艺步骤对应的R个资源合并为一个资源,并更改每步所述工艺步骤的总容量,且使C
新=C
原/R,
其中,R为同一所述工艺步骤对应的资源数量,且R为大于等于2的整数;C
新为资源合并之后,所述工艺步骤的总容量;C
原为资源合并之前,所述工艺步骤的总容量。
可选的,在所述新有向图构造步骤之后,且在所述死锁判断步骤之前,还包括:
判断所述物料的当前状态是否符合需要进行物料调度死锁判断的情况;
若符合,则进行所述死锁判断步骤;
若不符合,则模拟移动物料,使之自当前工艺步骤移动至下一步工艺步骤,然后进行所述死锁判断步骤。
可选的,在所述死锁判断步骤之后,还包括:
若发生物料调度死锁,则流程结束;
若未发生物料调度死锁,则模拟移动物料,使之自当前工艺步骤移动至下一步工艺步骤,并返回所述判断物料的当前状态是否符合需要进行物料调度死锁判断的情况的步骤。
可选的,所述死锁判断步骤,具体包括:
从所述新有向图中获取所有的简单回路;
从所述新有向图中获取所有的选择回路,并组成选择回路集合;所述选择回路的属性标志是非Broken;
判断所有的所述简单回路的属性标志是Broken,还是非Broken;
将所有的属性标志为非Broken的所述简单回路与所有的所述选择回路组成第一回路集合;
判断所述第二回路集合中是否有回路包括其他回路的情况,若存在,则将被包括的所述其他回路删除,且将所述第二回路集合中未删除的回路组成第三回路集合;
基于所述第三回路集合中的回路信息获取所述资源的空闲工位数量和结点的总数;在相互连接的多个回路中,位于连接处的所述资源的工位数量为1,该连接处为所述结点;
计算所述空闲工位数量与所述结点的总数的差值,并判断该差值是否大于0,若该差值大于0,则未发生物料调度死锁;若该差值小于或者等于0,则发生物料调度死锁。
可选的,在所述支持单个物料传输的有向图中,所述工艺步骤为四步,分别为第一步骤至第四步骤,其中,所述第一步骤的资源为能够同时传输2个物料的大气机械手,所述第一步骤的总容量为2;所述第二步骤的资源为两组腔室组,每组所述腔室组包括2个LL腔室,所述第二步骤的总容量为4;所述第三步骤的资源为能够同时传输4个物料的真空机械手,所述第三步骤的总容量为4;所述第四步骤的资源为反应腔室,所述第四步骤的总容量为2;
在所述新有向图构造步骤中,选择将所述支持单个物料传输的有向图中 所述第二步骤对应的2个资源合并为一个资源;将所述第一步骤的总容量更改为1;将所述第二步骤的总容量更改为2;将所述第三步骤的总容量更改为2;将所述第四步骤的总容量更改为1。
可选的,在所述支持单个物料传输的有向图中,所述工艺步骤为四步,分别为第一步骤至第四步骤,其中,所述第一步骤的资源为能够同时传输3个物料的大气机械手,所述第一步骤的总容量为3;所述第二步骤的资源为三组腔室组,每组所述腔室组包括2个LL腔室,所述第二步骤的总容量为6;所述第三步骤的资源为能够同时传输3个物料的真空机械手,所述第三步骤的总容量为3;所述第四步骤的资源为反应腔室,所述第四步骤的总容量为3;
在所述新有向图构造步骤中,选择所述支持单个物料传输的有向图中所述第二步骤对应的3个资源合并为一个资源,并将所述第一步骤的总容量更改为1;将所述第二步骤的总容量更改为2;将所述第三步骤的总容量更改为1;将所述第四步骤的总容量更改为1。
作为另一个技术方案,本发明还提供一种半导体设备,其包括:
装载台;
LL腔室;
工艺腔室;
大气机械手,用于在所述装载台和所述LL腔室之间传输物料;
真空机械手,用于在所述LL腔室和所述工艺腔室之间传输物料;
死锁判断装置,用于采用本发明提供的上述死锁判断方法判断所述半导体设备的调度过程是否发生死锁;
其中,所述大气机械手和所述真空机械手均能够单步传输至少一个物料。
可选的,所述LL腔室为N个,每个所述LL腔室具有一个工位;每两个所述LL腔室组成一组腔室组;N为大于或等于4的偶数;
所述大气机械手具有N/2个能够单步传输一个物料的手臂;并且,所述大气机械手能够同时向N/2组所述腔室组中的其中一个LL腔室输送物料;
所述真空机械手具有两个能够单步传输N/2个物料的手臂;
所述反应腔室为至少一个,每个所述反应腔室具有N/2个工位。
可选的,所述N=4;或者所述N=6。
本发明具有以下有益效果:
本发明提供的死锁判断方法及半导体设备的技术方案中,通过在支持单个物料传输的有向图中从所有工艺步骤中选择至少一步具有多个资源的工艺步骤,且将所选择的各工艺步骤对应的多个资源进行合并,并根据工艺步骤更改每步工艺步骤的总容量,可以构造出支持多个物料传输的新有向图;然后,基于新有向图判断是否发生物料调度死锁,从而可以实现对单步传输多个物料的半导体设备是否发生死锁进行判断。
图1为本发明第一实施例采用的半导体设备的结构图;
图2为本发明第一实施例提供的死锁判断方法的流程框图;
图3A为本发明第一实施例采用的资源合并之前的有向图;
图3B为本发明第一实施例采用的资源合并之后的有向图;
图4A为本发明第二实施例采用的资源合并之前的有向图;
图4B为本发明第二实施例采用的资源合并之后的有向图。
为使本领域的技术人员更好地理解本发明的技术方案,下面结合附图来对本发明提供的死锁判断方法进行详细描述。
请参阅图1,本发明第一实施例提供的半导体设备包括:
3个装载台(LoadPort1~3),每个装载台具有多个工位,例如25个;
1个大气机械手(ATR),用于在装载台和LL腔室之间传输物料;大气真空机械手具有两个能够单步传输一个物料的手臂,即,共有两个手臂,每个手臂具有一个手指;
4个LoadLock腔室(简称LL腔室,4个LL腔室分别为LL1~LL4),图1仅示出了两个LL腔室(LL1~LL2),其余两个LL腔室(LL3~LL4)位于LL腔室(LL1~LL2)下层;每两个LL腔室(上、下两层LL腔室)组成一组腔室组,每个LL腔室具有一个工位;
1个真空机械手(VTR),用于在LL腔室和工艺腔室之间传输物料;并且,真空机械手具有两个能够单步传输两个物料的手臂,即,共有两个手臂,每个手臂具有两个手指;
3个工艺腔室(PM1~PM3),每个工艺腔室中有两个工位。
需要说明的是,上述工位是指各步工艺步骤的设备中用于放置物料的位置,一个工位用于放置一个物料。
上述半导体设备可以单步传输一个物料,或者也可以单步传输两个以上的物料。该半导体设备包括进行各步工艺步骤的设备,这些设备以下称为资源,即,资源为真空机械手、LL腔室和工艺腔室等的设备。
本实施例提供的死锁判断方法是基于上述半导体设备而进行的,但是本发明并不局限于此,在实际应用中,本实施例提供的死锁判断方法可以应用于单步传输一个物料或者单步传输两个以上的物料的半导体设备的死锁判断。
具体地,请参阅图2,本实施例提供的死锁判断方法包括:
新有向图构造步骤,在支持单个物料传输的有向图中,从所有工艺步骤中选择至少一步具有多个资源的工艺步骤,且将所选择的各工艺步骤对应的多个资源进行合并,并根据合并结果更改每步工艺步骤的总容量,以构造出支持多个物料传输的新有向图;
死锁判断步骤,基于新有向图判断是否发生物料调度死锁。
在本实施例中,在新有向图构造步骤中,将所选择的各工艺步骤对应的R个资源合并为一个资源,并更改每步工艺步骤的总容量,且使C
新=C
原/R。其中,R为同一工艺步骤对应的资源数量,且R为大于等于2的整数;C
新为资源合并之后,工艺步骤的总容量;C
原为资源合并之前,工艺步骤的总容量;总容量为工艺步骤对应的所有资源的工位数量之和。
所谓有向图(Wait Relation Graph,WRG,简称G),是由资源集合(每步工艺步骤对应一个资源r)和有向边集合组成,其中,任意一个物料按照预先设定的路径进行工艺加工,在该路径中,物料从其中一个资源向另一个资源的传输过程可以由有向边来表示,例如,自资源r
1至资源r
2的有向边表示为:
a=r
1r
2
基于上述定义,以图3A示出的支持单个物料传输的有向图为例,对本实施例提供的死锁判断方法进行详细描述。具体地,图3A示出的有向图在资源合并之前,工艺步骤为四步,分别为第一步骤至第四步骤,其中,进行第一步骤的设备为能够同时传输2个物料的大气机械手,其对应一个资源r
1,且该第一步骤的总容量为2;进行第二步骤的设备为两组腔室组,每组腔室组包括2个LL腔室,两组腔室组为同一工艺步骤对应的两个资源(r
2,r
3),每组腔室组的容量为2,则第二步骤的总容量为4;进行第三步骤的设备为能够同时传输4个物料的真空机械手,其对应一个资源r
4,且该第三步骤的总容量为4;进行第四步骤的设备为反应腔室,其对应一个资源r
5,该第四步骤的总容量为2。
在上述有向图中,物料传输路径为:
r
1→(r
2/r
3)→r
4→r
5→r
4→(r
2/r
3)→r
1
请参阅图3B,本实施例提供的死锁判断方法的新有向图构造步骤中, 选择将上述有向图中至少一步具有R个资源的工艺步骤,将所选择的工艺步骤的R个资源合并为一个资源,并更改每步工艺步骤的总容量,且使C
新=C
原/R。
具体地,由于第二步骤对应了两个资源(r
2,r
3)。在这种情况下,可以选择将两个资源(r
2,r
3)视为一个资源r
23,即,将第二步骤对应的两个资源(r
2,r
3)合并为一个资源r
23。然后,更改每步工艺步骤的总容量,且使C
新=C
原/R,即,第一步骤至第四步骤各自的总容量均减半。由此,构造出支持两个物料传输的新有向图,该有向图如图3B所示。
需要将每步工艺步骤的总容量减半的具体原因是:如图3A所示,子路径a
1表示为(r
2/r
3)→r
4,其可以同时移动两个物料。如果资源r
2和资源r
3中各存在一个物料,且待进入资源r
4,由于物料在完成子路径a
1时,会占用资源r
4的两个工位,同时资源r
2和资源r
3各释放一个工位。因此,在新有向图中,在资源r
4的闲置工位数量减半,而第三步骤的总容量减半;资源r
23的闲置工位数量与资源r
2或者资源r
3的工位数量相同,而第二步骤的总容量(资源r
2和资源r
3的工位数量之和)减半。子路径a
2~a
5表示图3A中r
1与r
2及r
1与r
3之间一个物料的移动。而对于新有向图,子路径a
6表示r
23→r
1,其一次移动相当于实际设备的两次移动,即,r
2→r
1和r
3→r
1,因此,第一步骤的总容量减半。因此,新有向图相对于原来的有向图,每步工艺步骤的总容量减半。
如果当资源r
2和资源r
3中只存在一个物料待进入资源r
4,且第一步骤对应一个资源r
1中也不会有物料进入资源r
2或资源r
3时,物料在完成子路径a
1时,只占用资源r
4的一个工位,但是基于新有向图,仍然视为占用资源r
4的两个工位,同时资源r
2和资源r
3各释放一个工位。因此,该情况同样适用新有向图。
由上可知,借助上述新有向图构造步骤构造出支持两步传输的新有向 图,可以实现对单步传输两个物料的半导体设备是否发生死锁进行判断。
需要说明的是,在本实施例中,将所选择的各工艺步骤对应的R个资源合并为一个资源,并使各工艺步骤的总容量减半,但是,本发明并不局限于此,在实际应用中,还可以根据不同的有向图采用其他合并方式,并适应性的改变各工艺步骤的总容量。
可选的,在上述新有向图构造步骤之后,且在死锁判断步骤之前,还包括:
判断物料的当前状态是否符合需要进行物料调度死锁判断的情况;
若符合,则进行死锁判断步骤;
若不符合,则模拟移动物料,使之自当前工艺步骤移动至下一步工艺步骤,以使移动后的物料的状态符合需要进行物料调度死锁判断的情况,然后进行死锁判断步骤。
所谓模拟移动物料,是指物料的当前进程“视为”已经移动至下一步工艺步骤,而实际中物料的当前进程仍未移动至下一步工艺步骤。
根据物料的当前状态的不同,可能存在调度系统一定不会发生死锁的情况,此时则不需要进行物料调度死锁判断。但是,在物料进入下一步工艺步骤时,则调度系统可能会发生死锁,此时则需要进行死锁判断步骤。基于此,在物料处于调度系统一定不会发生死锁的情况所对应的状态时,通过模拟移动物料一步工艺步骤,可以进行死锁判断步骤。
以图1示出的半导体设备为例,物料占用资源的工位情况包括:
第一种情况,第一步骤对应的资源r
1无物料或者有一片物料;第二步骤对应的两个资源r
2和r
3均有一片物料,且待进入第三步骤;
第二种情况,第一步骤对应的资源r
1无物料或者有一片物料;第二步骤对应的两个资源r
2和r
3均有一片物料,且待进入第一步骤;
第三种情况,第一步骤对应的资源r
1无物料或者有两片物料;第二步骤 对应的两个资源r
2和r
3均无物料;
第四种情况,第一步骤对应的资源r
1无物料或者有两片物料;第二步骤对应的第一个资源r
2无物料;第二步骤对应的第二个资源r
3有一片物料,且待进入第一步骤或者第三步骤。
上述四种情况均符合需要进行物料调度死锁判断的情况。除了前述四种情况之外,物料占用所述资源的工位情况还包括下述四种情况:
第五种情况,第一步骤对应的资源r
1有一片物料,且待进入第二步骤对应的第一个资源r
2;第二步骤对应的第一个资源r
2无物料;第二步骤对应的第二个资源r
3有一片物料,且待进入第三步骤;
第六种情况,第一步骤对应的资源r
1有一片物料,且待进入第二步骤对应的第二个资源r
3;第二步骤对应的第二个资源r
3无物料;第二步骤对应的第一个资源r
2有一片物料,且待进入第三步骤;
第七种情况,第一步骤对应的资源r
1有一片物料,且位于自第二步骤向第一步骤的路径的终端,即位于a
5的终点;第二步骤对应的第二个资源r
3无物料;第二步骤对应的第一个资源r
2有一片物料,且待进入第一步骤;
第八种情况,第一步骤对应的资源r
1有一片物料,且位于自第二步骤向第一步骤的路径的终端,即位于a
5的终点;第二步骤对应的第一个资源r
2无物料;第二步骤对应的第二个资源r
3有一片物料,且待进入第一步骤。
这四种情况一定不会出现物料调度死锁,此时模拟移动物料任意一步,即可将物料存在状态转换为前述四种情况,从而使物料状态转换为符合需要进行物料调度死锁判断的情况。
例如,若物料占用资源的工位情况符合上述第五种情况,则将第一步骤中的物料传入第二步骤对应的第二个资源r
3;若物料占用资源的工位情况符合上述第六种情况,则将第一步骤中的物料传入第二步骤对应的第一个资源r
2;若物料占用资源的工位情况符合上述第七种情况,则将第二步骤对应的 第二个资源r
3中的物料传入第一步骤;若物料占用资源的工位情况符合上述第八种情况,则将第二步骤对应的第一个资源r
2中的物料传入第一步骤。
可选的,在死锁判断步骤之后,还包括:
若发生物料调度死锁,则流程结束;
若未发生物料调度死锁,则模拟移动物料,使之自当前工艺步骤移动至下一步工艺步骤,并返回判断物料的当前状态是否符合需要进行物料调度死锁判断的情况的步骤。
下面以图3B示出的新有向图为例,对上述死锁判断步骤的具体实施方式进行详细描述。具体地,上述死锁判断步骤包括:
步骤101、从新有向图中获取所有的简单回路。
物料传输路径中的其中一个步骤可以用一条或者多条有向边表示,其中,多条有向边表示的是并行路径。将有向图划分为多个子图,在子图的任意两个资源中,若存在自第一资源向第二资源及自第二资源向第一资源的两个路径,则该子图为回路,若该回路不包含其他回路,则为简单回路。
步骤102、从新有向图中获取所有的选择回路,并组成选择回路集合;该选择回路的属性标志是非Broken。
若任意一步工艺步骤具有多条有向边,则为并行路径;若所述简单回路中包含有该并行路径的任何一条有向边,则为所述选择回路。
例如,在图3A示出的有向图中,存在并行路径r
1→r
2和r
1→r
3,并且存在简单回路C
1(r
1→r
2→r
4→r
1)和简单回路C
2(r
1→r
3→r
5→r
1),简单回路C
1包括路径r
1→r
2;简单回路C
2括路径r
1→r
3。如果其他回路均不包含上述两个并行路径,那么该有向图只有两个简单回路,二者的并集称为一个选择回路。
步骤103、判断所有的简单回路的属性标志是Broken,还是非Broken。
步骤104、将所有的属性标志为非Broken的简单回路与所有的选择回路 组成第一回路集合。
步骤106、判断第二回路集合中是否有回路C
1包括其他回路C
2的情况,若存在,则将被包括的其他回路C
2删除,且将第二回路集合中未删除的回路组成第三回路集合。
步骤107、基于第三回路集合中的回路信息获取资源的空闲工位数量Slack和结点Knot的总数;在多个相互连接的回路中,位于连接处的资源的工位数量为1,该连接处为结点Knot。
可选的,步骤107具体包括:
步骤1071、从第三回路集合中获取回路信息,该回路信息包括资源的总工位数量Capacity,资源的被占用工位数量Commit;
步骤1072、通过计算资源的总工位数量Capacity与资源的被占用工位数量Commit的差值,获得空闲工位数量Slack;
步骤1073、从第三回路集合中寻找结点Knot,并计算结点Knot的总数∑O(Knot)。
步骤108、计算空闲工位数量Slack与结点的总数∑O(Knot)的差值,并判断该差值是否大于0,若该差值大于0,则未发生物料调度死锁;若该差值小于或者等于0,则发生物料调度死锁。
由此,基于新有向图判断是否发生物料调度死锁,可以实现对单个物料传输多个物料的半导体设备是否发生死锁进行判断。
本发明第二实施例提供的死锁判断方法,其是以单步传输三个物料的半导体设备为例进行死锁判断。该半导体设备的具体结构仍然以图1示出的半导体设备为例。
请参阅图4A,支持单个物料传输的有向图在资源合并之前,工艺步骤 为四步,分别为第一步骤至第四步骤,其中,进行第一步骤的设备为能够同时传输3个物料的大气机械手,其对应一个资源r
1,且该第一步骤的总容量为3;进行第二步骤的设备为三组腔室组,每组腔室组包括2个LL腔室,三组腔室组为同一工艺步骤对应的三个资源(r
2,r
3,r
6),每组腔室组的容量为3,则第二步骤的总容量为6;进行第三步骤的设备为能够同时传输3个物料的真空机械手,其对应一个资源r
4,且该第三步骤的总容量为3;进行第四步骤的设备为反应腔室,其对应一个资源r
5,该第四步骤的总容量为3。
请参阅图4B,在本实施例提供的死锁判断方法的新有向图构造步骤中,选择将上述有向图中至少一步具有R个资源的工艺步骤,将所选择的工艺步骤的R个资源合并为一个资源,并更改每步工艺步骤的总容量,且使C
新=C
原/R。
具体地,由于第二步骤对应了三个资源(r
2,r
3,r
6)。在这种情况下,可以选择将三个资源(r
2,r
3,r
6)视为一个资源r
236,即,将支持单个物料传输的有向图中第二步骤对应的三个资源(r
2,r
3,r
6)合并为一个资源r
236。同时,更改每步工艺步骤的总容量,且使C
新=C
原/R,即,第一步骤至第四步骤各自的总容量均减半,具体地,将第一步骤的总容量更改为1;将第二步骤的总容量更改为2;将第三步骤的总容量更改为1;将第四步骤的总容量更改为1,从而构造出支持三个物料传输的新有向图。
由上可知,本发明提供的死锁判断方法通过借助新有向图构造步骤,可以适用于单个物料传输两个、三个或者更多的物料的半导体设备的死锁判断。
作为另一个技术方案,本发明还提供一种半导体设备,其包括装载台、LL腔室(即,LoadLock腔室)、工艺腔室、大气机械手、真空机械手和死锁判断装置。
具体的,装载台有三个,每个装载台可以具有多个工位,例如25个。LL腔室又称过渡腔室,该LL腔室为N个,每个LL腔室具有一个工位。在 实际应用中,每两个LL腔室组成一组腔室组,且同组腔室组中的两个LL腔室按上、下层设置,这样,N个LL腔室可以分成N/2组腔室组,其中,N为大于或等于4的偶数。例如,以图1示出的半导体设备为例,LL腔室的数量N=4。可选的,N也可以等于6。
大气机械手用于在装载台和LL腔室之间传输物料,该大气机械手具有N/2个能够单步传输一个物料的手臂,能够同时向N/2组腔室组中的其中一个LL腔室输送物料。例如,当LL腔室为4个时,大气机械手具有2个手臂,以能够同时对两组腔室组中的其中一个LL腔室(上层腔室或下层腔室)进行取放片操作。又如,当LL腔室为6个时,大气机械手具有3个手臂,以能够同时对三组腔室组中的其中一个LL腔室(上层腔室或下层腔室)进行取放片操作。
真空机械手用于在LL腔室和工艺腔室之间传输物料。该真空机械手具有两个能够单步传输N/2个物料的手臂,以能够完成工艺腔室的取放片操作。例如,当LL腔室为4个时,真空机机械手具有两个手臂,每个手臂能够单步传输2个物料。又如,当LL腔室为6个时,真空机机械手具有两个手臂,每个手臂能够单步传输3个物料。
死锁判断装置用于采用本发明上述各个实施例提供的死锁判断方法判断上述半导体设备的调度过程是否发生死锁。可选的,该死锁判断装置可以集成在半导体设备的调度系统中。
本发明提供的半导体设备,其可以实现单步传输多个物料,同时能够对于是否发生死锁进行判断。
可以理解的是,以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式,然而本发明并不局限于此。对于本领域内的普通技术人员而言,在不脱离本发明的精神和实质的情况下,可以做出各种变型和改进,这些变型和改进也视为本发明的保护范围。
Claims (10)
- 一种死锁判断方法,其特征在于,包括:新有向图构造步骤,在支持单个物料传输的有向图中,从所有工艺步骤中选择至少一步具有多个资源的工艺步骤,且将所选择的各所述工艺步骤对应的多个资源进行合并,并根据合并结果更改每步所述工艺步骤的总容量,以构造出支持多个物料传输的新有向图;死锁判断步骤,基于所述新有向图判断是否发生物料调度死锁;其中,所述资源为进行工艺步骤的设备;所述总容量为每步所述工艺步骤对应的所有资源的工位数量之和。
- 根据权利要求1所述的死锁判断方法,其特征在于,在所述新有向图构造步骤中,将所选择的各所述工艺步骤对应的R个资源合并为一个资源,并更改每步所述工艺步骤的总容量,且使C 新=C 原/R,其中,R为同一所述工艺步骤对应的资源数量,且R为大于等于2的整数;C 新为资源合并之后,所述工艺步骤的总容量;C 原为资源合并之前,所述工艺步骤的总容量。
- 根据权利要求1所述的死锁判断方法,其特征在于,在所述新有向图构造步骤之后,且在所述死锁判断步骤之前,还包括:判断所述物料的当前状态是否符合需要进行物料调度死锁判断的情况;若符合,则进行所述死锁判断步骤;若不符合,则模拟移动物料,使之自当前工艺步骤移动至下一步工艺步骤,然后进行所述死锁判断步骤。
- 根据权利要求3所述的死锁判断方法,其特征在于,在所述死锁判断步骤之后,还包括:若发生物料调度死锁,则流程结束;若未发生物料调度死锁,则模拟移动物料,使之自当前工艺步骤移动至下一步工艺步骤,并返回所述判断物料的当前状态是否符合需要进行物料调度死锁判断的情况的步骤。
- 根据权利要求1-4任意一项所述的死锁判断方法,其特征在于,所述死锁判断步骤,具体包括:从所述新有向图中获取所有的简单回路;从所述新有向图中获取所有的选择回路,并组成选择回路集合;所述选择回路的属性标志是非Broken;判断所有的所述简单回路的属性标志是Broken,还是非Broken;将所有的属性标志为非Broken的所述简单回路与所有的所述选择回路组成第一回路集合;判断所述第二回路集合中是否有回路包括其他回路的情况,若存在,则将被包括的所述其他回路删除,且将所述第二回路集合中未删除的回路组成第三回路集合;基于所述第三回路集合中的回路信息获取所述资源的空闲工位数量和结点的总数;在相互连接的多个回路中,位于连接处的所述资源的工位数量为1,该连接处为所述结点;计算所述空闲工位数量与所述结点的总数的差值,并判断该差值是否大于0,若该差值大于0,则未发生物料调度死锁;若该差值小于或者等于0,则发生物料调度死锁。
- 根据权利要求1-4任意一项所述的死锁判断方法,其特征在于,在所 述支持单个物料传输的有向图中,所述工艺步骤为四步,分别为第一步骤至第四步骤,其中,所述第一步骤的资源为能够同时传输2个物料的大气机械手,所述第一步骤的总容量为2;所述第二步骤的资源为两组腔室组,每组所述腔室组包括2个LL腔室,所述第二步骤的总容量为4;所述第三步骤的资源为能够同时传输4个物料的真空机械手,所述第三步骤的总容量为4;所述第四步骤的资源为反应腔室,所述第四步骤的总容量为2;在所述新有向图构造步骤中,选择将所述支持单个物料传输的有向图中所述第二步骤对应的2个资源合并为一个资源;将所述第一步骤的总容量更改为1;将所述第二步骤的总容量更改为2;将所述第三步骤的总容量更改为2;将所述第四步骤的总容量更改为1。
- 根据权利要求1-4任意一项所述的死锁判断方法,其特征在于,在所述支持单个物料传输的有向图中,所述工艺步骤为四步,分别为第一步骤至第四步骤,其中,所述第一步骤的资源为能够同时传输3个物料的大气机械手,所述第一步骤的总容量为3;所述第二步骤的资源为三组腔室组,每组所述腔室组包括2个LL腔室,所述第二步骤的总容量为6;所述第三步骤的资源为能够同时传输3个物料的真空机械手,所述第三步骤的总容量为3;所述第四步骤的资源为反应腔室,所述第四步骤的总容量为3;在所述新有向图构造步骤中,选择所述支持单个物料传输的有向图中所述第二步骤对应的3个资源合并为一个资源,并将所述第一步骤的总容量更改为1;将所述第二步骤的总容量更改为2;将所述第三步骤的总容量更改为1;将所述第四步骤的总容量更改为1。
- 一种半导体设备,其特征在于,包括:装载台;LL腔室;工艺腔室;大气机械手,用于在所述装载台和所述LL腔室之间传输物料;真空机械手,用于在所述LL腔室和所述工艺腔室之间传输物料;死锁判断装置,用于采用权利要求1-7任意一项死锁判断方法判断所述半导体设备的调度过程是否发生死锁;其中,所述大气机械手和所述真空机械手均能够单步传输至少一个物料。
- 根据权利要求8所述的半导体设备,其特征在于,所述LL腔室为N个,每个所述LL腔室具有一个工位;每两个所述LL腔室组成一组腔室组;N为大于或等于4的偶数;所述大气机械手具有N/2个能够单步传输一个物料的手臂;并且,所述大气机械手能够同时向N/2组所述腔室组中的其中一个LL腔室输送物料;所述真空机械手具有两个能够单步传输N/2个物料的手臂;所述反应腔室为至少一个,每个所述反应腔室具有N/2个工位。
- 根据权利要求9所述的半导体设备,其特征在于,所述N=4;或者所述N=6。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/350,900 US11211268B2 (en) | 2018-12-20 | 2021-06-17 | Deadlock determination method and semiconductor apparatus |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811567168.5 | 2018-12-20 | ||
| CN201811567168.5A CN111354654B (zh) | 2018-12-20 | 2018-12-20 | 死锁判断方法及半导体设备 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US17/350,900 Continuation US11211268B2 (en) | 2018-12-20 | 2021-06-17 | Deadlock determination method and semiconductor apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2020125672A1 true WO2020125672A1 (zh) | 2020-06-25 |
Family
ID=71102501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/CN2019/126274 Ceased WO2020125672A1 (zh) | 2018-12-20 | 2019-12-18 | 死锁判断方法及半导体设备 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11211268B2 (zh) |
| CN (1) | CN111354654B (zh) |
| TW (1) | TWI716224B (zh) |
| WO (1) | WO2020125672A1 (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114864456B (zh) * | 2022-07-08 | 2022-09-13 | 埃克斯工业(广东)有限公司 | 半导体清洗设备调度方法、系统、装置及存储介质 |
| CN116069514B (zh) * | 2023-01-10 | 2023-08-22 | 南通大学 | 一种含不可靠资源的柔性制造系统的死锁避免方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6466835B1 (en) * | 1997-09-10 | 2002-10-15 | Tokyo Electron Limited | Deadlock avoidance method and treatment system for object to be treated |
| CN101607634A (zh) * | 2008-06-20 | 2009-12-23 | 株式会社Ihi | 处理设备、输送控制装置以及输送控制方法 |
| CN102814813A (zh) * | 2011-05-05 | 2012-12-12 | 范努克机器人技术美国有限公司 | 在多机器人系统中自动防止死锁的方法和系统 |
| CN108363362A (zh) * | 2017-01-26 | 2018-08-03 | 台湾积体电路制造股份有限公司 | 半导体机台产能模拟方法及半导体机台产能模拟系统 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5444632A (en) * | 1994-04-28 | 1995-08-22 | Texas Instruments Incorporated | Apparatus and method for controlling and scheduling processing machines |
| US5801945A (en) * | 1996-06-28 | 1998-09-01 | Lam Research Corporation | Scheduling method for robotic manufacturing processes |
| US6122566A (en) * | 1998-03-03 | 2000-09-19 | Applied Materials Inc. | Method and apparatus for sequencing wafers in a multiple chamber, semiconductor wafer processing system |
| US6336204B1 (en) * | 1998-05-07 | 2002-01-01 | Applied Materials, Inc. | Method and apparatus for handling deadlocks in multiple chamber cluster tools |
| US6519498B1 (en) * | 2000-03-10 | 2003-02-11 | Applied Materials, Inc. | Method and apparatus for managing scheduling in a multiple cluster tool |
| US6418350B1 (en) * | 2000-06-09 | 2002-07-09 | Brooks Automation Inc. | Periodic scheduler for dual-arm robots in cluster tools with process-module residency constraints |
| US6868298B2 (en) * | 2001-12-28 | 2005-03-15 | Texas Instruments Incorporated | Method and apparatus for bottleneck feed factor based scheduling |
| US6856847B2 (en) * | 2002-06-19 | 2005-02-15 | Taiwan Semiconductor Manufacturing Co., Ltd | Method of identifying bottlenecks and improving throughput in wafer processing equipment |
| US7142937B1 (en) * | 2005-05-12 | 2006-11-28 | Systems On Silicon Manufacturing Company Pte. Ltd. | Capacity management in a wafer fabrication plant |
| US7489982B2 (en) * | 2006-09-15 | 2009-02-10 | Wafertech, Llc | Method and software for conducting efficient lithography WPH / lost time analysis in semiconductor manufacturing |
| TWI322454B (en) * | 2006-11-20 | 2010-03-21 | Pochun Chang | Monitoring system for manufacturing semiconductor wafers |
| US8051421B2 (en) * | 2007-03-30 | 2011-11-01 | Sap Ag | Method and system for estimating resource provisioning |
| US8073559B2 (en) * | 2008-06-19 | 2011-12-06 | Varian Semiconductor Equipment Associates, Inc. | Material transport systems using autonomous controls |
| US10509658B2 (en) * | 2012-07-06 | 2019-12-17 | Nvidia Corporation | System, method, and computer program product for simultaneously determining settings for a plurality of parameter variations |
| CN103150219B (zh) * | 2013-04-03 | 2016-08-10 | 重庆大学 | 在异构资源系统上避免死锁的快速任务分配方法 |
| US9618929B2 (en) * | 2014-11-26 | 2017-04-11 | Wafertech, Llc | Method and priority system for inventory management in semiconductor manufacturing |
| AU2015100137A4 (en) * | 2015-01-12 | 2015-03-05 | Macau University Of Science And Technology | Optimization of Start-up Transient Processes for Dual-Armed Cluster Tools with Wafer Revisiting |
| KR20170015047A (ko) * | 2015-07-31 | 2017-02-08 | 삼성전자주식회사 | 반도체 제조 장치의 처리량 측정 방법 및 시스템 |
| US20170083000A1 (en) * | 2015-09-20 | 2017-03-23 | Macau University Of Science And Technology | Petri Net-based Scheduling of Time Constrained Single-arm Cluster Tools with Wafer Revisiting |
| CN106898572B (zh) * | 2015-12-17 | 2019-07-05 | 北京北方华创微电子装备有限公司 | 基于设备实时状态的物料调度方法及系统 |
| US10520914B2 (en) * | 2016-09-19 | 2019-12-31 | Macau University Of Science And Technology | Multi cluster tool system and a method of controlling a multi tool cluster system |
-
2018
- 2018-12-20 CN CN201811567168.5A patent/CN111354654B/zh active Active
-
2019
- 2019-12-17 TW TW108146294A patent/TWI716224B/zh active
- 2019-12-18 WO PCT/CN2019/126274 patent/WO2020125672A1/zh not_active Ceased
-
2021
- 2021-06-17 US US17/350,900 patent/US11211268B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6466835B1 (en) * | 1997-09-10 | 2002-10-15 | Tokyo Electron Limited | Deadlock avoidance method and treatment system for object to be treated |
| CN101607634A (zh) * | 2008-06-20 | 2009-12-23 | 株式会社Ihi | 处理设备、输送控制装置以及输送控制方法 |
| CN102814813A (zh) * | 2011-05-05 | 2012-12-12 | 范努克机器人技术美国有限公司 | 在多机器人系统中自动防止死锁的方法和系统 |
| CN108363362A (zh) * | 2017-01-26 | 2018-08-03 | 台湾积体电路制造股份有限公司 | 半导体机台产能模拟方法及半导体机台产能模拟系统 |
Non-Patent Citations (1)
| Title |
|---|
| 黄忠华 (HUANG, ZHONGHUA): "自动制造系统的无死锁调度与控制 (Deadlock-free scheduling and control for automated manufacturing systems)", 中国博士学位论文全文数据库 (信息科技辑), 2007年第4期 (CHINA DOCTORAL DISSERTATIONS FULL-TEXT DATABASE (INFORMATION SCIENCE & TECHNOLOGY), 2007, NO. 4), 15 April 2007 (2007-04-15), DOI: 20200226092545A * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20210313203A1 (en) | 2021-10-07 |
| TWI716224B (zh) | 2021-01-11 |
| US11211268B2 (en) | 2021-12-28 |
| CN111354654A (zh) | 2020-06-30 |
| CN111354654B (zh) | 2022-10-21 |
| TW202034266A (zh) | 2020-09-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10015056B2 (en) | System, method and apparatus for improving the performance of collective operations in high performance computing | |
| US20120151292A1 (en) | Supporting Distributed Key-Based Processes | |
| US9852932B2 (en) | Method for processing semiconductor wafer | |
| CN105022377B (zh) | 一种基于Petri网的自动制造系统的控制方法 | |
| TW202546571A (zh) | 調度方法、半導體製程調度設備及電腦可讀儲存介質 | |
| US11211268B2 (en) | Deadlock determination method and semiconductor apparatus | |
| CN112613266B (zh) | 具有网络拓扑结构的片上系统、路由路径确定方法、装置及电子设备 | |
| CN116540656A (zh) | 一种基于数字孪生的制造车间多agv无冲突路径调度方法 | |
| WO2025001376A1 (zh) | 用于多个计算节点之间的数据路由的系统、方法及装置 | |
| US10091280B2 (en) | Data transfer control apparatus that control transfer of data between nodes and parallel computing system | |
| CN105005505A (zh) | 空中多目标轨迹预测的并行处理方法 | |
| CN114496846A (zh) | 一种半导体工艺设备的调度控制方法和半导体工艺设备 | |
| CN106648851A (zh) | 一种多控存储中io管理的方法和装置 | |
| CN114695220B (zh) | 晶圆的传输方法、装置及半导体工艺设备 | |
| Balamohan et al. | Exploring an unknown dangerous graph with a constant number of tokens | |
| CN110471779A (zh) | 用于实现锁资源处理的方法和装置 | |
| CN106298604A (zh) | 一种晶片传输方法和装置 | |
| CN114633979A (zh) | 货物码放方法、装置、电子设备和计算机可读介质 | |
| CN106356325A (zh) | 一种应用于热处理设备晶圆传输调度的装置及方法 | |
| CN119211106A (zh) | 用于多个计算节点之间的数据路由的系统、方法及装置 | |
| WO2021022441A1 (zh) | 数据传输方法、装置、电子设备及可读存储介质 | |
| CN106897137A (zh) | 一种基于虚拟机热迁移的物理机与虚拟机映射转换方法 | |
| CN115720211A (zh) | 网算一体的芯粒间路由器及数据包聚合方法 | |
| CN116708198B (zh) | 确定性信令的实现方法、装置、电子设备及存储介质 | |
| CN117184732B (zh) | 货物拣选方法、装置、电子设备和计算机可读介质 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 19898431 Country of ref document: EP Kind code of ref document: A1 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 19898431 Country of ref document: EP Kind code of ref document: A1 |